AT322107B - PROCESS FOR THE PRODUCTION OF NEW HALOGENATED CEPHALOSPORIC ACID COMPOUNDS - Google Patents

PROCESS FOR THE PRODUCTION OF NEW HALOGENATED CEPHALOSPORIC ACID COMPOUNDS

Info

Publication number
AT322107B
AT322107B AT1104672A AT1104672A AT322107B AT 322107 B AT322107 B AT 322107B AT 1104672 A AT1104672 A AT 1104672A AT 1104672 A AT1104672 A AT 1104672A AT 322107 B AT322107 B AT 322107B
Authority
AT
Austria
Prior art keywords
production
acid compounds
new halogenated
cephalosporic acid
cephalosporic
Prior art date
Application number
AT1104672A
Other languages
German (de)
Original Assignee
Lilly Co Eli
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lilly Co Eli filed Critical Lilly Co Eli
Priority to AT161374*1A priority Critical patent/AT326269B/en
Application granted granted Critical
Publication of AT322107B publication Critical patent/AT322107B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/0061Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof characterized by the use of several polymeric components
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/26Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group
    • C07D501/28Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group with the 7-amino radical acylated by an aliphatic carboxylic acid, which is substituted by hetero atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D501/00Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/207-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/247-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/36Methylene radicals, substituted by sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/4009Two or more macromolecular compounds not provided for in one single group of groups C08G18/42 - C08G18/64
    • C08G18/4072Mixtures of compounds of group C08G18/63 with other macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42Block-or graft-polymers containing polysiloxane sequences
    • C08G77/46Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2375/00Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
    • C08J2375/04Polyurethanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2483/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Cephalosporin Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Silicon Polymers (AREA)
AT1104672A 1971-12-27 1972-12-27 PROCESS FOR THE PRODUCTION OF NEW HALOGENATED CEPHALOSPORIC ACID COMPOUNDS AT322107B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT161374*1A AT326269B (en) 1971-12-27 1974-02-27 PROCESS FOR THE PRODUCTION OF NEW HALOGENPHENYLTHIOACETAMIDO-CEPHALOSPORIN DERIVATIVES

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US21273971A 1971-12-27 1971-12-27

Publications (1)

Publication Number Publication Date
AT322107B true AT322107B (en) 1975-05-12

Family

ID=22792241

Family Applications (1)

Application Number Title Priority Date Filing Date
AT1104672A AT322107B (en) 1971-12-27 1972-12-27 PROCESS FOR THE PRODUCTION OF NEW HALOGENATED CEPHALOSPORIC ACID COMPOUNDS

Country Status (19)

Country Link
JP (2) JPS4885592A (en)
AR (1) AR195312A1 (en)
AT (1) AT322107B (en)
AU (2) AU466218B2 (en)
BE (1) BE793310A (en)
CA (1) CA986099A (en)
CH (1) CH558383A (en)
DE (1) DE2263430C2 (en)
ES (1) ES410248A1 (en)
FR (1) FR2166080B1 (en)
GB (1) GB1405798A (en)
HU (1) HU167747B (en)
IE (1) IE37028B1 (en)
IL (1) IL41161A (en)
NL (1) NL7217699A (en)
PH (1) PH13639A (en)
SE (1) SE417209B (en)
YU (1) YU36043B (en)
ZA (2) ZA729115B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6329363B1 (en) 1997-12-12 2001-12-11 Eli Lilly And Company Cephalosporin antibiotics
DE102006061351A1 (en) * 2006-12-22 2008-06-26 Evonik Goldschmidt Gmbh Process for the preparation of SiOC-linked, linear polydimethylsiloxane-polyoxyalkylene block copolymers and their use
JP4954845B2 (en) * 2007-11-05 2012-06-20 瑞乾 高 Holder for hand tools
JP6810251B2 (en) 2017-04-04 2021-01-06 旭化成株式会社 Photosensitive resin composition for flexographic printing plate, flexo printing original plate, flexographic printing plate, and copolymer

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1321704A (en) * 1962-04-03 1963-03-22 Lilly Co Eli Process for preparing 7- (s-substituted mercapto-acylamido) derivatives of cephalosporins c and novel compounds thus prepared
US3335136A (en) * 1965-12-27 1967-08-08 Lilly Co Eli Halophenylmercaptomethyl cephalosporins

Also Published As

Publication number Publication date
FR2166080B1 (en) 1977-01-28
DE2263430C2 (en) 1983-09-22
IE37028L (en) 1973-06-27
AU466218B2 (en) 1975-10-23
CA986099A (en) 1976-03-23
YU324672A (en) 1981-02-28
DE2263430A1 (en) 1973-07-05
AU5054472A (en) 1974-07-04
SE417209B (en) 1981-03-02
FR2166080A1 (en) 1973-08-10
IE37028B1 (en) 1977-04-13
IL41161A0 (en) 1973-02-28
ZA729115B (en) 1974-08-28
AU463521B2 (en) 1975-07-31
GB1405798A (en) 1975-09-10
HU167747B (en) 1975-12-25
CH558383A (en) 1975-01-31
JPS541840B2 (en) 1979-01-30
BE793310A (en) 1973-06-27
AR195312A1 (en) 1973-09-28
AU5054372A (en) 1974-07-04
JPS4885592A (en) 1973-11-13
JPS50105996A (en) 1975-08-21
ES410248A1 (en) 1976-04-01
PH13639A (en) 1980-08-18
NL7217699A (en) 1973-06-29
YU36043B (en) 1981-11-13
IL41161A (en) 1975-10-15
ZA729116B (en) 1974-08-28

Similar Documents

Publication Publication Date Title
AT320152B (en) Process for the production of new penicillins
AT328105B (en) PROCESS FOR THE PRODUCTION OF NEW PROSTANOIC ACID DERIVATIVES
AT321462B (en) Process for the production of new penicillins
AT318804B (en) Process for the production of new 3-methylencephalosporins
AT314555B (en) Process for the production of new guanidines
AT308764B (en) Process for the production of new N-phosphonomethyl-acrylamides
AT320154B (en) Process for the preparation of new cephalosporin compounds
AT311344B (en) Process for the production of new fluorine compounds
AT327376B (en) PROCESS FOR THE PRODUCTION OF NEW 7-ACYLAMIDO-7-METHOXY-CEPHEMCARBONIC ACID DERIVATIVES
AT322107B (en) PROCESS FOR THE PRODUCTION OF NEW HALOGENATED CEPHALOSPORIC ACID COMPOUNDS
AT325046B (en) PROCESS FOR PREPARING NEW PYRIDINESSIC ACID COMPOUNDS
AT318140B (en) Process for the production of new penicillins
AT323325B (en) PROCESS FOR THE PRODUCTION OF NEW 3-OXYIMINOMETHYLCEPHALOSPORINE COMPOUNDS
AT313918B (en) Process for the production of new phosphorus-containing perfluorocompounds
AT326924B (en) PROCESS FOR THE PRODUCTION OF NEW SULPHIC ACID SALT
AT310187B (en) Process for the production of new phosphorus compounds
AT300775B (en) Process for the production of new halogenated benzylphenols
AT312804B (en) Process for the production of new penicillins
AT313299B (en) Process for the production of new 2-fluoro-5-halophenylureas
AT312802B (en) Process for the production of new penicilloic acid derivatives
AT313915B (en) Process for the production of new guanidinomercaptocarboxylic acids
AT323184B (en) PROCESS FOR THE PRODUCTION OF NEW DIBENZOXIRENAZEPINE DERIVATIVES
AT315148B (en) Process for the preparation of new substituted 3-phenyl-2-halogen-thiopropionic acid esters
AT324317B (en) PROCESS FOR THE PRODUCTION OF NEW DIPHENYLCYCLOPENTYLAMINE COMPOUNDS
AT320669B (en) Process for the production of new organotin compounds

Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee