AT276936B - Verfahren zur Herstellung eines lichtempfindlichen Kopiermaterials - Google Patents

Verfahren zur Herstellung eines lichtempfindlichen Kopiermaterials

Info

Publication number
AT276936B
AT276936B AT9267A AT9267A AT276936B AT 276936 B AT276936 B AT 276936B AT 9267 A AT9267 A AT 9267A AT 9267 A AT9267 A AT 9267A AT 276936 B AT276936 B AT 276936B
Authority
AT
Austria
Prior art keywords
preparation
copying material
photosensitive copying
photosensitive
copying
Prior art date
Application number
AT9267A
Other languages
English (en)
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Application granted granted Critical
Publication of AT276936B publication Critical patent/AT276936B/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT9267A 1966-01-07 1967-01-04 Verfahren zur Herstellung eines lichtempfindlichen Kopiermaterials AT276936B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK0058083 1966-01-07

Publications (1)

Publication Number Publication Date
AT276936B true AT276936B (de) 1969-12-10

Family

ID=7228536

Family Applications (1)

Application Number Title Priority Date Filing Date
AT9267A AT276936B (de) 1966-01-07 1967-01-04 Verfahren zur Herstellung eines lichtempfindlichen Kopiermaterials

Country Status (5)

Country Link
US (1) US3497353A (de)
AT (1) AT276936B (de)
DE (1) DE1572061C3 (de)
FR (1) FR1507529A (de)
GB (1) GB1164024A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5129947B2 (de) * 1972-08-05 1976-08-28
US4113497A (en) * 1973-06-11 1978-09-12 American Can Company Compositions with organohalogen compound and diazonium salts as photoinitiators of epoxy compounds in photo-polymerization
US4046567A (en) * 1976-08-02 1977-09-06 E. I. Du Pont De Nemours And Company Christiansen cells containing epoxy gelling agents
US4546067A (en) * 1983-01-26 1985-10-08 Ciba Geigy Corporation Image production utilizing multifunctional light sensitive compounds
EP0255989B1 (de) * 1986-08-06 1990-11-22 Ciba-Geigy Ag Negativ-Photoresist auf Basis von Polyphenolen und Epoxidverbindungen oder Vinylethern
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
JP2010533233A (ja) * 2007-07-11 2010-10-21 エンゾン ファーマシューティカルズ，インコーポレーテッド 芳香族アリル酸を含むポリマー性薬剤送達システム
CN115974859B (zh) * 2022-12-13 2024-11-05 南京林业大学 一种呋喃基缩水甘油醚及其制备方法和应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3410824A (en) * 1965-03-19 1968-11-12 Ralph B. Atkinson Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer

Also Published As

Publication number Publication date
DE1572061B2 (de) 1974-04-04
GB1164024A (en) 1969-09-10
US3497353A (en) 1970-02-24
DE1572061C3 (de) 1974-11-07
DE1572061A1 (de) 1970-01-02
FR1507529A (fr) 1967-12-29

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee