AT182608B - Lichtempfindliches Material für photomechanische Reproduktion und Verfahren zur Herstellung von Druckformen mit diesem Material - Google Patents

Lichtempfindliches Material für photomechanische Reproduktion und Verfahren zur Herstellung von Druckformen mit diesem Material

Info

Publication number
AT182608B
AT182608B AT182608DA AT182608B AT 182608 B AT182608 B AT 182608B AT 182608D A AT182608D A AT 182608DA AT 182608 B AT182608 B AT 182608B
Authority
AT
Austria
Prior art keywords
printing forms
producing printing
photosensitive material
photomechanical reproduction
photomechanical
Prior art date
Application number
Other languages
English (en)
Original Assignee
Kalle & Co Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle & Co Ag filed Critical Kalle & Co Ag
Application granted granted Critical
Publication of AT182608B publication Critical patent/AT182608B/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D471/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/10Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D231/14Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D231/18One oxygen or sulfur atom
    • C07D231/20One oxygen atom attached in position 3 or 5
    • C07D231/22One oxygen atom attached in position 3 or 5 with aryl radicals attached to ring nitrogen atoms
    • C07D231/24One oxygen atom attached in position 3 or 5 with aryl radicals attached to ring nitrogen atoms having sulfone or sulfonic acid radicals in the molecule
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D235/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/22Benzimidazoles; Hydrogenated benzimidazoles with hetero atoms directly attached to ring nitrogen atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
AT182608D 1952-08-16 1953-07-21 Lichtempfindliches Material für photomechanische Reproduktion und Verfahren zur Herstellung von Druckformen mit diesem Material AT182608B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK15170A DE943209C (de) 1952-08-16 1952-08-16 Lichtempfindliches Material fuer photomechanische Reproduktionen

Publications (1)

Publication Number Publication Date
AT182608B true AT182608B (de) 1955-07-25

Family

ID=7214518

Family Applications (1)

Application Number Title Priority Date Filing Date
AT182608D AT182608B (de) 1952-08-16 1953-07-21 Lichtempfindliches Material für photomechanische Reproduktion und Verfahren zur Herstellung von Druckformen mit diesem Material

Country Status (8)

Country Link
US (1) US2773765A (de)
AT (1) AT182608B (de)
BE (1) BE521631A (de)
CH (1) CH319604A (de)
DE (1) DE943209C (de)
FR (1) FR1086894A (de)
GB (1) GB725773A (de)
NL (2) NL179697B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL188856B (nl) * 1953-07-01 Koa Oil Co Ltd Inrichting voor het bereiden van mesofase koolstof.
US2958599A (en) * 1958-02-14 1960-11-01 Azoplate Corp Diazo compounds and printing plates manufactured therefrom
JP3545461B2 (ja) * 1993-09-10 2004-07-21 エーザイ株式会社 二環式ヘテロ環含有スルホンアミド誘導体
US5908936A (en) * 1997-05-13 1999-06-01 Merck & Co., Inc. Process for synthesizing carbapenem intermediates
CA2287931A1 (en) * 1997-05-13 1998-11-19 Merck & Co., Inc. Process for synthesizing carbapenem intermediates
US6221914B1 (en) * 1997-11-10 2001-04-24 Array Biopharma Inc. Sulfonamide bridging compounds that inhibit tryptase activity

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA470026A (en) * 1950-12-12 General Aniline And Film Corporation Light-sensitive diazotype materials
AT145850B (de) * 1934-01-19 1936-05-25 Kalle & Co Ag Verfahren zur Herstellung von Gerbbildern.
US2179239A (en) * 1935-04-10 1939-11-07 Agfa Ansco Corp Color photography
BE455215A (de) * 1943-01-14
DE879055C (de) * 1943-04-03 1953-06-08 Kalle & Co Ag Verfahren zur Herstellung von Druckformen
DE838548C (de) * 1948-10-09 1952-05-08 Kalle & Co Ag Herstellung von Papierdruckfolien fuer Flach- und Offsetdruck mit Hilfe von lichtempfindlichen Diazoverbindungen und Material zur Durchfuehrung des Verfahrens
NL80569C (de) * 1949-07-23
DE875437C (de) * 1949-07-30 1953-05-04 Kalle & Co Ag Verfahren zur Herstellung von Druckformen mit Hilfe von Diazoverbindungen

Also Published As

Publication number Publication date
NL179697B (nl)
DE943209C (de) 1956-05-17
NL89894C (de)
GB725773A (en) 1955-03-09
FR1086894A (fr) 1955-02-16
CH319604A (de) 1957-02-28
BE521631A (de)
US2773765A (en) 1956-12-11

Similar Documents

Publication Publication Date Title
CH325121A (de) Lichtempfindliches Material für die photomechanische Herstellung von Druckplatten
CH422515A (de) Verfahren zur Herstellung von Druckformen
AT185686B (de) Verfahren zur photomechanischen Herstellung von Flachdruckformen und lichtempfindliches Material dafür
CH322661A (de) Verfahren und Vorrichtung zur Herstellung und Zurichtung von Druckstöcken
CH337598A (de) Schreibmittel und Verfahren zur Herstellung desselben
AT182608B (de) Lichtempfindliches Material für photomechanische Reproduktion und Verfahren zur Herstellung von Druckformen mit diesem Material
CH342084A (de) Verfahren zur Herstellung planographischer Drucke und lichtempfindliches Blatt zur Durchführung dieses Verfahrens
CH297443A (de) Verfahren zur photomechanischen Herstellung von Bildern und Druckformen.
CH330160A (de) Photomechanisches Verfahren zur Herstellung von Druckformen
CH300626A (de) Verfahren zur Herstellung von Lichtpausmaterial.
CH349885A (de) Verfahren zur Herstellung von Offsetdrucken
CH342085A (de) Verfahren zur Herstellung von Druckformen und lichtempfindliches Rasterblatt zur Ausführung dieses Verfahrens
CH329758A (de) Verfahren zur Herstellung von photographischen Bildern
CH319262A (de) Verfahren zur Herstellung eines farbenphotographischen Materials
CH316026A (de) Verfahren zur Herstellung von in 3-Stellung substituierten 4-Oxy-cumarinen
CH323344A (de) Verfahren zur Herstellung von lichtempfindlichem Diazotypmaterial und nach diesem Verfahren hergestelltes Diazotypmaterial.
CH335943A (de) Verfahren zur photomechanischen Herstellung von Druckplatten
CH314941A (de) Verfahren zur Herstellung von Lichtpausmaterial
AT190386B (de) Verfahren zur Herstellung von Lichtpausmaterial
AT177786B (de) Verfahren zur Herstellung von Plakaten
CH318211A (de) Verfahren zur Herstellung von Gerbbildern
AT195942B (de) Verfahren zur Herstellung von Druckplatten und dafür bestimmtes lichtempfindliches Material
CH327308A (de) Verfahren zur Herstellung von Offsetdruckfolien
AT179295B (de) Material zur Herstellung von kopierfähigen Original-Aufzeichnungen
CH329069A (de) Verfahren zur Herstellung von Masken in farbphotographischem Mehrschichtenmaterial