WO2002073307A3 - Thermally cured underlayer for lithographic application - Google Patents

Thermally cured underlayer for lithographic application Download PDF

Info

Publication number
WO2002073307A3
WO2002073307A3 PCT/US2002/007136 US0207136W WO02073307A3 WO 2002073307 A3 WO2002073307 A3 WO 2002073307A3 US 0207136 W US0207136 W US 0207136W WO 02073307 A3 WO02073307 A3 WO 02073307A3
Authority
WO
WIPO (PCT)
Prior art keywords
substituted
aryl
thermally cured
unsubstituted
hydroxyl
Prior art date
Application number
PCT/US2002/007136
Other languages
French (fr)
Other versions
WO2002073307A2 (en
Inventor
B De Binod
Sanjay Malik
Gregory Dominic Spaziano
John Joseph Biafore
Patrick Foster
Sidney George Slater
Thomas Steinhausler
Andrew J Blakeney
Original Assignee
Arch Spec Chem Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arch Spec Chem Inc filed Critical Arch Spec Chem Inc
Priority to JP2002572501A priority Critical patent/JP2004534107A/en
Priority to EP02733834A priority patent/EP1373331A4/en
Priority to KR1020037011930A priority patent/KR100709330B1/en
Publication of WO2002073307A2 publication Critical patent/WO2002073307A2/en
Publication of WO2002073307A3 publication Critical patent/WO2002073307A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

Thermally cured undercoat for use in lithography of a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator, wherein the hydroxyl containing polymer is a polymer comprising units m, n and o of the formula (I) wherein R1 is H or methyl; R2 is a substituted or unsubstituted C¿6?-C14 aryl acrylate or C6-C14 aryl methacrylate group wherein the substituted groups may be phenyl, Cl-4 alkyl or C1-4 alkoxy; R?3¿ is a hydroxyl functionalized C¿l?-C8 alkyl acrylate, methacrylate or C6-C14 aryl group, R?4¿ is a C¿1?-C10 linear or branched alkylene; p is an integer of from 1 to 5 with the proviso that there are no more than thirty carbon atoms in the [-R?4¿O-]p ; R5 is a C¿l?-C10 linear, branched or cyclic alkyl, substituted or unsubstituted C6-Cl4 aryl, or substituted or unsubstituted C7-Cl5 alicyclic hydrocarbon; and m is about 40 to 70, n is about 15 to 35 and o is about 15 to 25.
PCT/US2002/007136 2001-03-13 2002-03-07 Thermally cured underlayer for lithographic application WO2002073307A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002572501A JP2004534107A (en) 2001-03-13 2002-03-07 Thermoset underlayer for lithographic applications
EP02733834A EP1373331A4 (en) 2001-03-13 2002-03-07 Thermally cured underlayer for lithographic application
KR1020037011930A KR100709330B1 (en) 2001-03-13 2002-03-07 Thermally cured underlayer for lithographic application

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27552801P 2001-03-13 2001-03-13
US60/275,528 2001-03-13

Publications (2)

Publication Number Publication Date
WO2002073307A2 WO2002073307A2 (en) 2002-09-19
WO2002073307A3 true WO2002073307A3 (en) 2002-11-21

Family

ID=23052692

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/007136 WO2002073307A2 (en) 2001-03-13 2002-03-07 Thermally cured underlayer for lithographic application

Country Status (5)

Country Link
EP (1) EP1373331A4 (en)
JP (1) JP2004534107A (en)
KR (1) KR100709330B1 (en)
TW (1) TW574234B (en)
WO (1) WO2002073307A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4798938B2 (en) * 2003-04-11 2011-10-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Photoresist system
WO2005089150A2 (en) 2004-03-12 2005-09-29 Fujifilm Electronic Materials Usa Inc. Thermally cured undercoat for lithographic application
EP2196851A1 (en) 2008-12-12 2010-06-16 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties
WO2013054702A1 (en) * 2011-10-12 2013-04-18 Jsr株式会社 Composition for forming resist underlayer film, method for manufacturing same, pattern forming method, and resist underlayer film
DE102015119939A1 (en) 2015-11-18 2017-05-18 ALTANA Aktiengesellschaft Crosslinkable polymeric materials for dielectric layers in electronic components

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874686A (en) * 1988-03-18 1989-10-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic plate necessitating no dampening water
US6323287B1 (en) * 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4916255A (en) * 1987-05-19 1990-04-10 Hitachi, Ltd. Method for production of methacrylate ester
JPH0539399A (en) * 1991-08-02 1993-02-19 Nok Corp Transparent acrylic rubber composition
JPH0593022A (en) * 1991-09-30 1993-04-16 Nok Corp Transparent acrylic rubber composition
US5886102A (en) * 1996-06-11 1999-03-23 Shipley Company, L.L.C. Antireflective coating compositions
JP4053631B2 (en) * 1997-10-08 2008-02-27 Ａｚエレクトロニックマテリアルズ株式会社 Composition for antireflection film or light absorption film and polymer used therefor
US6410209B1 (en) * 1998-09-15 2002-06-25 Shipley Company, L.L.C. Methods utilizing antireflective coating compositions with exposure under 200 nm
US6743861B1 (en) * 1999-09-03 2004-06-01 Nippon Soda Co. Ltd. Alkenylphenol copolymer and process for producing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4874686A (en) * 1988-03-18 1989-10-17 Fuji Photo Film Co., Ltd. Photosensitive lithographic plate necessitating no dampening water
US6323287B1 (en) * 1999-03-12 2001-11-27 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 NM lithography
US20020007018A1 (en) * 1999-03-12 2002-01-17 Arch Specialty Chemicals, Inc. Hydroxy-amino thermally cured undercoat for 193 nm lithography

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1373331A4 *

Also Published As

Publication number Publication date
TW574234B (en) 2004-02-01
KR20040024853A (en) 2004-03-22
EP1373331A2 (en) 2004-01-02
WO2002073307A2 (en) 2002-09-19
KR100709330B1 (en) 2007-04-20
EP1373331A4 (en) 2007-01-17
JP2004534107A (en) 2004-11-11

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