EP1373331A4 - Thermally cured underlayer for lithographic application - Google Patents
Thermally cured underlayer for lithographic applicationInfo
- Publication number
- EP1373331A4 EP1373331A4 EP02733834A EP02733834A EP1373331A4 EP 1373331 A4 EP1373331 A4 EP 1373331A4 EP 02733834 A EP02733834 A EP 02733834A EP 02733834 A EP02733834 A EP 02733834A EP 1373331 A4 EP1373331 A4 EP 1373331A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- thermally cured
- cured underlayer
- lithographic application
- lithographic
- application
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Chemical & Material Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US27552801P | 2001-03-13 | 2001-03-13 | |
US275528P | 2001-03-13 | ||
PCT/US2002/007136 WO2002073307A2 (en) | 2001-03-13 | 2002-03-07 | Thermally cured underlayer for lithographic application |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1373331A2 EP1373331A2 (en) | 2004-01-02 |
EP1373331A4 true EP1373331A4 (en) | 2007-01-17 |
Family
ID=23052692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02733834A Withdrawn EP1373331A4 (en) | 2001-03-13 | 2002-03-07 | Thermally cured underlayer for lithographic application |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1373331A4 (en) |
JP (1) | JP2004534107A (en) |
KR (1) | KR100709330B1 (en) |
TW (1) | TW574234B (en) |
WO (1) | WO2002073307A2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4798938B2 (en) * | 2003-04-11 | 2011-10-19 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | Photoresist system |
KR20070029157A (en) * | 2004-03-12 | 2007-03-13 | 후지필름 일렉트로닉 머티리얼스 유.에스.에이., 아이엔씨. | Thermally cured undercoat for lithographic application |
EP2196851A1 (en) | 2008-12-12 | 2010-06-16 | Eastman Kodak Company | Negative working lithographic printing plate precursors comprising a reactive binder containing aliphatic bi- or polycyclic moieties |
WO2013054702A1 (en) * | 2011-10-12 | 2013-04-18 | Jsr株式会社 | Composition for forming resist underlayer film, method for manufacturing same, pattern forming method, and resist underlayer film |
DE102015119939A1 (en) | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Crosslinkable polymeric materials for dielectric layers in electronic components |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0292215A2 (en) * | 1987-05-19 | 1988-11-23 | Hitachi Chemical Co., Ltd. | Method for production of methacrylate ester |
JPH0539399A (en) * | 1991-08-02 | 1993-02-19 | Nok Corp | Transparent acrylic rubber composition |
JPH0593022A (en) * | 1991-09-30 | 1993-04-16 | Nok Corp | Transparent acrylic rubber composition |
EP0813114A2 (en) * | 1996-06-11 | 1997-12-17 | Shipley Company LLC | Antireflective coating compositions |
EP0942331A1 (en) * | 1997-10-08 | 1999-09-15 | Clariant International Ltd. | Antireflection or light-absorbing coating composition and polymer therefor |
EP0987600A1 (en) * | 1998-09-15 | 2000-03-22 | Shipley Company LLC | Antireflective coating compositions |
WO2000054105A1 (en) * | 1999-03-12 | 2000-09-14 | Arch Specialty Chemicals, Inc. | Hydroxy-amino thermally cured undercoat for 193 nm lithography |
EP1211271A1 (en) * | 1999-09-03 | 2002-06-05 | Nippon Soda Co., Ltd. | Alkenylphenol copolymer and process for producing the same |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2520686B2 (en) * | 1988-03-18 | 1996-07-31 | 富士写真フイルム株式会社 | No dampening water required Photosensitive lithographic printing plate |
-
2002
- 2002-03-07 JP JP2002572501A patent/JP2004534107A/en active Pending
- 2002-03-07 EP EP02733834A patent/EP1373331A4/en not_active Withdrawn
- 2002-03-07 WO PCT/US2002/007136 patent/WO2002073307A2/en active Search and Examination
- 2002-03-07 KR KR1020037011930A patent/KR100709330B1/en not_active IP Right Cessation
- 2002-03-12 TW TW91104609A patent/TW574234B/en not_active IP Right Cessation
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0292215A2 (en) * | 1987-05-19 | 1988-11-23 | Hitachi Chemical Co., Ltd. | Method for production of methacrylate ester |
JPH0539399A (en) * | 1991-08-02 | 1993-02-19 | Nok Corp | Transparent acrylic rubber composition |
JPH0593022A (en) * | 1991-09-30 | 1993-04-16 | Nok Corp | Transparent acrylic rubber composition |
EP0813114A2 (en) * | 1996-06-11 | 1997-12-17 | Shipley Company LLC | Antireflective coating compositions |
EP0942331A1 (en) * | 1997-10-08 | 1999-09-15 | Clariant International Ltd. | Antireflection or light-absorbing coating composition and polymer therefor |
EP0987600A1 (en) * | 1998-09-15 | 2000-03-22 | Shipley Company LLC | Antireflective coating compositions |
WO2000054105A1 (en) * | 1999-03-12 | 2000-09-14 | Arch Specialty Chemicals, Inc. | Hydroxy-amino thermally cured undercoat for 193 nm lithography |
EP1211271A1 (en) * | 1999-09-03 | 2002-06-05 | Nippon Soda Co., Ltd. | Alkenylphenol copolymer and process for producing the same |
Non-Patent Citations (1)
Title |
---|
DATABASE WPI Week 199320, Derwent World Patents Index; AN 1993-162141, XP002410588 * |
Also Published As
Publication number | Publication date |
---|---|
WO2002073307A2 (en) | 2002-09-19 |
TW574234B (en) | 2004-02-01 |
WO2002073307A3 (en) | 2002-11-21 |
EP1373331A2 (en) | 2004-01-02 |
JP2004534107A (en) | 2004-11-11 |
KR20040024853A (en) | 2004-03-22 |
KR100709330B1 (en) | 2007-04-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20030714 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: BIAFORE, JOHN, JOSEPH Inventor name: FOSTER, PATRICK Inventor name: BINOD, B., DE Inventor name: SLATER, SIDNEY, GEORGE Inventor name: MALIK, SANJAY Inventor name: BLAKENEY, ANDREW, J. Inventor name: SPAZIANO, GREGORY, DOMINIC Inventor name: STEINHAUSLER, THOMAS |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: FUJIFILM ELECTRONIC MATERIALS USA, INC. |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: FUJIFILM ELECTRONIC MATERIALS USA, INC. |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20061219 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: G03F 7/09 20060101AFI20061211BHEP |
|
17Q | First examination report despatched |
Effective date: 20070829 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20090911 |