SE0201019D0 - A mask blank and a method for producing the same - Google Patents

A mask blank and a method for producing the same

Info

Publication number
SE0201019D0
SE0201019D0 SE0201019A SE0201019A SE0201019D0 SE 0201019 D0 SE0201019 D0 SE 0201019D0 SE 0201019 A SE0201019 A SE 0201019A SE 0201019 A SE0201019 A SE 0201019A SE 0201019 D0 SE0201019 D0 SE 0201019D0
Authority
SE
Sweden
Prior art keywords
mask blank
producing
same
substrate
present
Prior art date
Application number
SE0201019A
Other languages
English (en)
Inventor
Torbjoern Sandstroem
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE0201019A priority Critical patent/SE0201019D0/sv
Publication of SE0201019D0 publication Critical patent/SE0201019D0/sv
Priority to EP03719277A priority patent/EP1490657A1/en
Priority to US10/510,059 priority patent/US20050221199A1/en
Priority to AU2003223150A priority patent/AU2003223150A1/en
Priority to PCT/SE2003/000519 priority patent/WO2003085362A1/en
Priority to JP2003582503A priority patent/JP2005521915A/ja
Priority to CNA038075148A priority patent/CN1646884A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
SE0201019A 2002-04-04 2002-04-04 A mask blank and a method for producing the same SE0201019D0 (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE0201019A SE0201019D0 (sv) 2002-04-04 2002-04-04 A mask blank and a method for producing the same
EP03719277A EP1490657A1 (en) 2002-04-04 2003-04-01 A mask blank and a method for producing the same
US10/510,059 US20050221199A1 (en) 2002-04-04 2003-04-01 Mask blank and a method for producing the same
AU2003223150A AU2003223150A1 (en) 2002-04-04 2003-04-01 A mask blank and a method for producing the same
PCT/SE2003/000519 WO2003085362A1 (en) 2002-04-04 2003-04-01 A mask blank and a method for producing the same
JP2003582503A JP2005521915A (ja) 2002-04-04 2003-04-01 マスク・ブランク及びそれを製造する方法
CNA038075148A CN1646884A (zh) 2002-04-04 2003-04-01 掩模板及其制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0201019A SE0201019D0 (sv) 2002-04-04 2002-04-04 A mask blank and a method for producing the same

Publications (1)

Publication Number Publication Date
SE0201019D0 true SE0201019D0 (sv) 2002-04-04

Family

ID=20287484

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0201019A SE0201019D0 (sv) 2002-04-04 2002-04-04 A mask blank and a method for producing the same

Country Status (7)

Country Link
US (1) US20050221199A1 (sv)
EP (1) EP1490657A1 (sv)
JP (1) JP2005521915A (sv)
CN (1) CN1646884A (sv)
AU (1) AU2003223150A1 (sv)
SE (1) SE0201019D0 (sv)
WO (1) WO2003085362A1 (sv)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI424264B (zh) * 2005-09-30 2014-01-21 Hoya Corp A mask blank and its manufacturing method, manufacturing method of a mask, and manufacturing method of a semiconductor device
US20100081065A1 (en) * 2008-10-01 2010-04-01 Taiwan Semiconductor Manufacturing Company, Ltd. Photomask and method of fabricating a photomask
CN101382742B (zh) * 2008-10-15 2011-10-05 清溢精密光电（深圳）有限公司 掩膜版的显影方法
CN102005619A (zh) * 2010-10-09 2011-04-06 合肥锂鑫能源材料有限公司 用于锂离子电池抗过充混合添加剂中的氧化还原对
EP2781968A1 (fr) * 2013-03-19 2014-09-24 Nivarox-FAR S.A. Résonateur moins sensible aux variations climatiques
JP6258151B2 (ja) * 2013-09-25 2018-01-10 信越化学工業株式会社 フォトマスクブランクおよびその製造方法
US10401724B2 (en) * 2017-11-07 2019-09-03 Globalfoundries Inc. Pellicle replacement in EUV mask flow
US11111176B1 (en) * 2020-02-27 2021-09-07 Applied Materials, Inc. Methods and apparatus of processing transparent substrates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4617252A (en) * 1983-07-01 1986-10-14 Philip A. Hunt Chemical Corporation Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
JPS61232457A (ja) * 1985-04-09 1986-10-16 Asahi Glass Co Ltd 改良されたフオトマスクブランク及びフオトマスク
AU6417499A (en) * 1998-10-08 2000-04-26 Rochester Institute Of Technology Photomask for projection lithography at or below about 160 nm and a method
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
US6632281B2 (en) * 2000-02-01 2003-10-14 Tokyo Electron Limited Substrate processing apparatus and substrate processing method
JP3410707B2 (ja) * 2000-04-19 2003-05-26 松下電器産業株式会社 パターン形成材料及びパターン形成方法
US6380067B1 (en) * 2000-05-31 2002-04-30 Advanced Micro Devices, Inc. Method for creating partially UV transparent anti-reflective coating for semiconductors
US6645677B1 (en) * 2000-09-18 2003-11-11 Micronic Laser Systems Ab Dual layer reticle blank and manufacturing process
US6605394B2 (en) * 2001-05-03 2003-08-12 Applied Materials, Inc. Organic bottom antireflective coating for high performance mask making using optical imaging

Also Published As

Publication number Publication date
CN1646884A (zh) 2005-07-27
WO2003085362A1 (en) 2003-10-16
AU2003223150A1 (en) 2003-10-20
JP2005521915A (ja) 2005-07-21
EP1490657A1 (en) 2004-12-29
US20050221199A1 (en) 2005-10-06

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