JPS5773741A - Photomask - Google Patents
PhotomaskInfo
- Publication number
- JPS5773741A JPS5773741A JP14895880A JP14895880A JPS5773741A JP S5773741 A JPS5773741 A JP S5773741A JP 14895880 A JP14895880 A JP 14895880A JP 14895880 A JP14895880 A JP 14895880A JP S5773741 A JPS5773741 A JP S5773741A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- light shielding
- photomask
- chromium oxide
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/46—Antireflective coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To provide a high light shielding property to a light shielding layer with a 3-layer structure, to increase the adhesion of the layer to a substrate and to prevent peeling during use by adding a little chromium oxide to the chromium layer of the light shielding layer together with merallic Cr. CONSTITUTION:A low reflection layer 3 is formed on a transparent substrate 4, and on the layer 3 a metallic Cr layer 6 contg. a little chromium oxide is formed in >=800Angstrom thickness by vapor deposition or other method using a mixture of metallic Cr with chromium oxide in a prescribed ratio. A low reflection layer 2 is further formed to manufacture a photomask having a light shielding layer with the 3-layer structure. The light shielding layer has a high light shielding property with >=4 transmission density and high adhesion to the substrate, and peeling is not caused even if the photomask is used repeatedly. Accordingly, this photomask is used as a photomask with high durability and high resolution for manufacturing a precise pattern for a semiconductor integrated circuit, etc.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14895880A JPS5773741A (en) | 1980-10-24 | 1980-10-24 | Photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14895880A JPS5773741A (en) | 1980-10-24 | 1980-10-24 | Photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5773741A true JPS5773741A (en) | 1982-05-08 |
JPS623415B2 JPS623415B2 (en) | 1987-01-24 |
Family
ID=15464457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14895880A Granted JPS5773741A (en) | 1980-10-24 | 1980-10-24 | Photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5773741A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59119353A (en) * | 1982-12-27 | 1984-07-10 | Hoya Corp | Photomask blank |
JPS61235819A (en) * | 1985-04-12 | 1986-10-21 | Hitachi Ltd | Liquid crystal display element |
JPS6229139A (en) * | 1985-07-31 | 1987-02-07 | Hitachi Ltd | Pattern transfer mask and application thereof |
JPS62293511A (en) * | 1986-06-12 | 1987-12-21 | Sumitomo Special Metals Co Ltd | Magnetic recording medium |
US4758085A (en) * | 1985-10-16 | 1988-07-19 | Bertin & Cie | Optical fiber spectrometer/colorimeter apparatus |
JP2022171587A (en) * | 2021-04-30 | 2022-11-11 | エスケーシー ソルミックス カンパニー,リミテッド | Photomask blank, photomask, and manufacturing method of semiconductor element |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5323277A (en) * | 1976-08-14 | 1978-03-03 | Konishiroku Photo Ind Co Ltd | Photomasking material and photomask |
-
1980
- 1980-10-24 JP JP14895880A patent/JPS5773741A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5323277A (en) * | 1976-08-14 | 1978-03-03 | Konishiroku Photo Ind Co Ltd | Photomasking material and photomask |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59119353A (en) * | 1982-12-27 | 1984-07-10 | Hoya Corp | Photomask blank |
JPS6230624B2 (en) * | 1982-12-27 | 1987-07-03 | Hoya Corp | |
JPS61235819A (en) * | 1985-04-12 | 1986-10-21 | Hitachi Ltd | Liquid crystal display element |
JPS6229139A (en) * | 1985-07-31 | 1987-02-07 | Hitachi Ltd | Pattern transfer mask and application thereof |
US4758085A (en) * | 1985-10-16 | 1988-07-19 | Bertin & Cie | Optical fiber spectrometer/colorimeter apparatus |
JPS62293511A (en) * | 1986-06-12 | 1987-12-21 | Sumitomo Special Metals Co Ltd | Magnetic recording medium |
JP2022171587A (en) * | 2021-04-30 | 2022-11-11 | エスケーシー ソルミックス カンパニー,リミテッド | Photomask blank, photomask, and manufacturing method of semiconductor element |
Also Published As
Publication number | Publication date |
---|---|
JPS623415B2 (en) | 1987-01-24 |
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