JPS57147634A - Photomask blank - Google Patents

Photomask blank

Info

Publication number
JPS57147634A
JPS57147634A JP3243581A JP3243581A JPS57147634A JP S57147634 A JPS57147634 A JP S57147634A JP 3243581 A JP3243581 A JP 3243581A JP 3243581 A JP3243581 A JP 3243581A JP S57147634 A JPS57147634 A JP S57147634A
Authority
JP
Japan
Prior art keywords
photomask blank
light shielding
ordinary
ultraviolet rays
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3243581A
Other languages
Japanese (ja)
Other versions
JPS6217744B2 (en
Inventor
Osamu Nagarekawa
Shigekazu Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Hoya Electronics Corp
Original Assignee
Hoya Corp
Hoya Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Corp filed Critical Hoya Corp
Priority to JP3243581A priority Critical patent/JPS57147634A/en
Publication of JPS57147634A publication Critical patent/JPS57147634A/en
Publication of JPS6217744B2 publication Critical patent/JPS6217744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To apply an ordinary etching process to form a pattern and facilitate alignment, by using a chromium nitride as a light shielding film in a photomask blank. CONSTITUTION:The layer of a chromium nitride having a low transmittance for ultraviolet rays and a high intermittance for visible rays is formed on a transparent substrate in an atmosphere including nitrogen by vacuum vapor- deposition, sputtering, or iron plating to make a photomask blank. Thus, the same light shielding effect as the conventional photomask blank consisting of silicon or iron oxide is obtained for ultraviolet rays with a film thinner than this conventional photomask, and a sharp pattern is obtained easily by an ordinary chromium etching liquid. Further, this photomask blank shows a sufficient transmittance for visible rays, and alignment is facilitated.
JP3243581A 1981-03-09 1981-03-09 Photomask blank Granted JPS57147634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3243581A JPS57147634A (en) 1981-03-09 1981-03-09 Photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3243581A JPS57147634A (en) 1981-03-09 1981-03-09 Photomask blank

Publications (2)

Publication Number Publication Date
JPS57147634A true JPS57147634A (en) 1982-09-11
JPS6217744B2 JPS6217744B2 (en) 1987-04-20

Family

ID=12358867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3243581A Granted JPS57147634A (en) 1981-03-09 1981-03-09 Photomask blank

Country Status (1)

Country Link
JP (1) JPS57147634A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (en) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd Raw material of photomask
JPS6090336A (en) * 1983-10-24 1985-05-21 Toppan Printing Co Ltd Production of chromium mask blank
JPS60154254A (en) * 1984-01-24 1985-08-13 Hoya Corp Photomask blank and photomask
EP0203563A3 (en) * 1985-05-28 1988-01-07 Asahi Glass Company Ltd. Photomask blank and photomask

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140874A (en) * 1974-10-04 1976-04-06 Toppan Printing Co Ltd

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5140874A (en) * 1974-10-04 1976-04-06 Toppan Printing Co Ltd

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831336A (en) * 1981-08-19 1983-02-24 Konishiroku Photo Ind Co Ltd Raw material of photomask
JPS6090336A (en) * 1983-10-24 1985-05-21 Toppan Printing Co Ltd Production of chromium mask blank
JPH041339B2 (en) * 1983-10-24 1992-01-10 Toppan Printing Co Ltd
JPS60154254A (en) * 1984-01-24 1985-08-13 Hoya Corp Photomask blank and photomask
JPS6319854B2 (en) * 1984-01-24 1988-04-25 Hoya Corp
EP0203563A3 (en) * 1985-05-28 1988-01-07 Asahi Glass Company Ltd. Photomask blank and photomask

Also Published As

Publication number Publication date
JPS6217744B2 (en) 1987-04-20

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