JPH07336054A - Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board - Google Patents

Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board

Info

Publication number
JPH07336054A
JPH07336054A JP6437595A JP6437595A JPH07336054A JP H07336054 A JPH07336054 A JP H07336054A JP 6437595 A JP6437595 A JP 6437595A JP 6437595 A JP6437595 A JP 6437595A JP H07336054 A JPH07336054 A JP H07336054A
Authority
JP
Japan
Prior art keywords
resin
interlayer insulating
epoxy resin
copper foil
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6437595A
Other languages
Japanese (ja)
Inventor
Chiyuu Hayai
宙 早井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP6437595A priority Critical patent/JPH07336054A/en
Publication of JPH07336054A publication Critical patent/JPH07336054A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an interlayer insulating resin material for a multilayer printed circuit board in which two-stage curings of light and heat are executed by using specific quantities of epoxy resin curing agent and optical curable resin for epoxy resin and a specific quantity of photopolymerization initiator for optically curable resin. CONSTITUTION:Epoxy resin is preferably bisphenol A epoxy resin having a mean molecular weight of 300-500. Optically curable resin is preferably liquid acrylic resin and contains 1-100 pts.wt. in 100 pts.wt. of the epoxy resin. Epoxy resin curing agent is preferably imidazole, and its using quantity is 1-30 pts.wt. in 100 pts.wt. of the epoxy resin. The mixing quantity of the initiator is 1-10 pts.wt. in 100 pts.wt. of the curable resin. After the roughed inner layer circuit surface is coated with the interlayer insulating resin and once optically cured, when a copper foil is adhered, it is laminated by a heated roller, etc., thereby remelting the resin.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、多層プリント配線板の
層間絶縁樹脂材料に関するものであり、特に光と熱の二
段階硬化が可能な、新しいタイプの光・熱硬化型層間絶
縁樹脂材料を提供するものであり、更に、この層間絶縁
樹脂材料を用いた多層プリント配線板の製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an interlayer insulating resin material for a multilayer printed wiring board, and more particularly to a new type of photo-thermosetting interlayer insulating resin material capable of two-step curing of light and heat. The present invention further provides a method for manufacturing a multilayer printed wiring board using the interlayer insulating resin material.

【0002】[0002]

【従来の技術】これまでの多層プリント配線板の製造方
法としては、まずエッチングにより両面銅張板に回路を
形成し、回路表面を粗化し、その上にガラスクロス基材
にエポキシ樹脂を含浸して半硬化させたプリプレグシー
トを1枚以上重ね、更にその上に銅箔または片面銅張板
を積層し、加熱プレスにて加熱一体化する工程であっ
た。この工程では、プリプレグシートをつくるためガラ
スクロス基材にエポキシ樹脂を含浸して一度半硬化させ
なければならず、またプレスにて加熱加圧成形を行うた
め、膨大な設備と長い時間が必要であった。また、パタ
ーニングされた内層材の銅箔残存率がそれぞれ異なるた
め、層間厚さの調整のために樹脂量、溶融挙動の違う多
種類のプリプレグを用意しなければならず、しかもプリ
プレグシートにガラスクロス基材を用いるため、層間厚
さの極薄化が困難かつ高コストであり、電気特性につい
ても、ガラスクロスのために誘電率が高くなってしまう
問題があった。
2. Description of the Related Art As a conventional manufacturing method for a multilayer printed wiring board, a circuit is first formed on a double-sided copper clad board by etching, the circuit surface is roughened, and a glass cloth base material is impregnated with an epoxy resin. One or more sheets of semi-cured prepreg sheets were superposed, a copper foil or a single-sided copper clad plate was further laminated thereon, and they were integrated by heating with a heating press. In this process, the glass cloth base material must be impregnated with epoxy resin and semi-cured once in order to make a prepreg sheet, and since heat and pressure molding is performed with a press, enormous equipment and a long time are required. there were. In addition, since the copper foil residual rate of the patterned inner layer material is different, it is necessary to prepare various kinds of prepregs with different resin amounts and melting behaviors to adjust the interlayer thickness, and moreover, glass cloth is used for the prepreg sheet. Since a base material is used, it is difficult and expensive to make the interlayer thickness extremely thin, and there is a problem in that the dielectric constant becomes high due to the glass cloth in electrical characteristics.

【0003】これらの問題を解決するため、近年、層間
絶縁層にガラスクロス基材を用いない技術が数々報告さ
れている。例えば熱硬化性のエポキシ樹脂コーティング
剤またはフィルムやポリイミド樹脂コーティング剤また
はフィルム、熱可塑性耐熱樹脂フィルム、光硬化型のエ
ポキシ層間絶縁フィルムを用いた方法などがある。
In order to solve these problems, many techniques have recently been reported which do not use a glass cloth base material for the interlayer insulating layer. For example, a method using a thermosetting epoxy resin coating agent or film, a polyimide resin coating agent or film, a thermoplastic heat resistant resin film, or a photocurable epoxy interlayer insulating film can be used.

【0004】[0004]

【発明が解決しようとする課題】まず上記方法におい
て、層間絶縁材料にフィルムタイプのものを用いた場
合、内層回路板にはパターン加工された回路の凹凸が存
在するため、気泡の残存を皆無にするためには、フィル
ムラミネートを減圧の環境下で行わなければならず、大
がかりな設備が必要となってくる。また、フィルムが回
路の凹凸に追従するため、表面平滑が得られず、パター
ン加工時のエッチングドライフィルムの剥離や部品実装
時の半田付け不良などの原因となる。
First, in the above method, when a film-type insulating material is used as the interlayer insulating material, the inner layer circuit board has unevenness of the patterned circuit, so that no bubbles remain. In order to do so, film lamination must be performed under a reduced pressure environment, and large-scale equipment is required. Further, since the film follows the irregularities of the circuit, the surface smoothness cannot be obtained, which causes peeling of the etching dry film at the time of pattern processing and defective soldering at the time of mounting components.

【0005】次に層間絶縁材料に熱硬化性樹脂コーティ
ング剤を用いた場合、スクリーン印刷などの場合は片面
ずつの処理となるため、樹脂の硬化収縮により基板に反
りが生じ、極薄板などの加工は困難となる。また、ディ
ップ方式の様な両面同時処理においては、ある程度反り
を抑えることは可能となるが、いずれの場合も加熱硬化
に長時間を要す。
Next, when a thermosetting resin coating agent is used for the interlayer insulating material, the processing is performed one by one in the case of screen printing and the like, so that the substrate is warped due to curing shrinkage of the resin, and processing of an ultra-thin plate is performed. Will be difficult. Further, in the simultaneous double-sided treatment such as the dip method, it is possible to suppress warpage to some extent, but in both cases, heat curing requires a long time.

【0006】本発明は液状の光・熱硬化型の層間絶縁樹
脂材料を用いるため、コア材の銅箔回路間隙に気泡を残
すことなく簡単に充填することができ、いったん光照射
により仮硬化させて基板の反りを抑えることができ、そ
の後接着剤付き銅箔または銅箔を加熱されたロールまた
は熱盤でラミネートないしプレスして層間絶縁樹脂材料
を再溶融させて、表面を平滑にすることができる。しか
もその後、加熱硬化させることにより、仮硬化状態であ
った層間絶縁樹脂材料と接着剤付き銅箔または銅箔との
密着力を高めることが可能となる。
Since the present invention uses a liquid photo-thermosetting type interlayer insulating resin material, the copper foil circuit gap of the core material can be easily filled without leaving air bubbles, and is temporarily cured by light irradiation. Warp of the substrate can be suppressed, and then the copper foil with adhesive or copper foil can be laminated or pressed with a heated roll or hot plate to remelt the interlayer insulating resin material and smooth the surface. it can. In addition, thereafter, by heat-curing, it is possible to increase the adhesive force between the inter-layer insulating resin material in the temporarily cured state and the adhesive-attached copper foil or the copper foil.

【0007】特に接着剤付き銅箔をラミネートまたはプ
レスする場合、仮硬化された層間絶縁樹脂材料を流動化
させて、回路の凹部のみに充填させるようにすれば、板
厚精度は接着剤付き銅箔の接着剤層の厚さだけで正確に
容易にコントロールすることができ、そのため層間厚さ
も極薄にすることができる。また、銅箔を直接ラミネー
トする場合は、光硬化後の樹脂表面にタック性を持たせ
ることにより、作業を簡略化し、後の熱硬化によって銅
箔との密着力も高めることができる。
Particularly when laminating or pressing a copper foil with an adhesive, the provisionally cured interlayer insulating resin material is fluidized so that it is filled only in the concave portion of the circuit. The thickness of the adhesive layer of the foil can be precisely and easily controlled, so that the interlayer thickness can be made extremely thin. When the copper foil is directly laminated, the resin surface after photocuring has tackiness, so that the work can be simplified and the adhesion with the copper foil can be enhanced by the subsequent heat curing.

【0008】[0008]

【課題を解決するための手段】本発明は、エポキシ樹脂
100重量部に対して、エポキシ樹脂硬化剤1〜30重
量部、光硬化型樹脂1〜100重量部、及び光硬化型樹
脂100重量部に対して光重合開始剤1〜10重量部か
らなることを特徴とする光・熱硬化型樹脂材料、及びこ
れを層間絶縁層に用いた多層プリント配線板の製造方法
に関するものである。上記において、光硬化型樹脂がエ
ポキシ系であるものは、エポキシ樹脂との相溶性が優れ
ており、かつエポキシ樹脂と光硬化型樹脂がともに液状
である場合は、溶剤を必要とせず、簡単に短時間で混合
することができ、プリント配線基板としての信頼性も高
いので、本発明において好ましいものである。また、無
溶剤系にすることにより、加熱後の硬化収縮量を抑え、
コア材の銅箔回路パターンに依存することなく、表面平
滑性を保つことが極めて容易となる。
According to the present invention, 1 to 30 parts by weight of an epoxy resin curing agent, 1 to 100 parts by weight of a photocurable resin, and 100 parts by weight of a photocurable resin are used with respect to 100 parts by weight of an epoxy resin. On the other hand, the present invention relates to a photo-thermosetting resin material comprising 1 to 10 parts by weight of a photopolymerization initiator, and a method for producing a multilayer printed wiring board using the photo-thermosetting resin material as an interlayer insulating layer. In the above, the photocurable resin is an epoxy-based, excellent compatibility with the epoxy resin, and when the epoxy resin and the photocurable resin are both liquid, it does not require a solvent and can be easily It is preferable in the present invention because it can be mixed in a short time and has high reliability as a printed wiring board. Also, by using a solvent-free system, the amount of curing shrinkage after heating is suppressed,
It becomes extremely easy to maintain the surface smoothness without depending on the copper foil circuit pattern of the core material.

【0009】ここに用いるエポキシ樹脂は、平均分子量
300〜500のビスフェノールA型エポキシ樹脂が好
ましく、平均分子量が500より大きくなると高粘度
化、または固形化するため取扱いの上で好ましくない。
また光硬化型樹脂は、液状のアクリレート樹脂が好まし
いものであり、中でも、ビスフェノールA型エポキシア
クリレート、ビスフェノールF型エポキシアクリレー
ト、ノボラック型エポキシアクリレート、またはウレタ
ンアクリレート類などがより好ましく、エポキシ樹脂1
00重量部に対して、1〜100重量部で構成される。
アクリレート樹脂の平均分子量は500〜1500が好
ましく、分子量がそれ以上になるとエポキシ樹脂と同じ
ように、高粘度化、固形化してしまう。光硬化後の樹脂
表面のタック性、硬度などはアクリレートの量で調整
し、アクリレート樹脂の量が100重量部より多くなる
と、機械的特性、耐熱性、耐薬品性が劣化し、好ましく
ない。
The epoxy resin used here is preferably a bisphenol A type epoxy resin having an average molecular weight of 300 to 500, and when the average molecular weight is more than 500, the viscosity becomes high or solidifies, which is not preferable in handling.
Further, the photocurable resin is preferably a liquid acrylate resin, and among them, bisphenol A type epoxy acrylate, bisphenol F type epoxy acrylate, novolac type epoxy acrylate, urethane acrylates and the like are more preferable, and epoxy resin 1
1 to 100 parts by weight with respect to 00 parts by weight.
The average molecular weight of the acrylate resin is preferably from 500 to 1500, and when the molecular weight is higher than that, the acrylate resin becomes highly viscous and solidified like the epoxy resin. The tackiness and hardness of the resin surface after photocuring are adjusted by the amount of acrylate, and if the amount of the acrylate resin is more than 100 parts by weight, mechanical properties, heat resistance and chemical resistance deteriorate, which is not preferable.

【0010】エポキシ樹脂硬化剤には、熱速硬化性に優
れたイミダゾール系が好ましく、具体的には液状の2−
エチル−4−メチルイミダゾールやマイクロカプセル化
2−メチルイミダゾールなどが使用できる。かかるエポ
キシ樹脂硬化剤の使用量はエポキシ樹脂100重量部に
対して1〜30重量部である。1重量部以下ではその配
合効果が殆どなく、30重量部以上では硬化後の架橋密
度が高くなり過ぎて、層間絶縁層として硬く脆くなる傾
向がある。光重合開始剤はラジカル重合開始剤であり、
ベンゾインエーテル系、ベンゾフェノン系、ケタール
系、アセトフェノン系、チオキサンソン系などが使用で
き、特に成形性、硬化物特性に優れた1−ヒドロキシシ
クロヘキシルアセトフェノンや2,2−ジメトキシ−1,
2−ジフェニルエタン−1−オンが好ましい。この光重
合開始剤の配合量は光硬化型樹脂100重量部に対して
1〜10重量部である。1重量部以下であるとその配合
効果が小さく、10重量部以上では硬化後の特性低下の
原因となる。
The epoxy resin curing agent is preferably an imidazole type which is excellent in heat-hardening property, and more specifically, it is liquid 2-
Ethyl-4-methylimidazole or microencapsulated 2-methylimidazole can be used. The amount of the epoxy resin curing agent used is 1 to 30 parts by weight based on 100 parts by weight of the epoxy resin. If it is 1 part by weight or less, there is almost no effect of the compounding, and if it is 30 parts by weight or more, the crosslink density after curing becomes too high, and it tends to be hard and brittle as an interlayer insulating layer. The photopolymerization initiator is a radical polymerization initiator,
Benzoin ether-based, benzophenone-based, ketal-based, acetophenone-based, thioxanthone-based, etc. can be used, and particularly 1-hydroxycyclohexylacetophenone and 2,2-dimethoxy-1, which are excellent in moldability and cured product characteristics,
2-diphenylethan-1-one is preferred. The amount of the photopolymerization initiator compounded is 1 to 10 parts by weight based on 100 parts by weight of the photocurable resin. If it is 1 part by weight or less, the compounding effect will be small, and if it is 10 parts by weight or more, it will cause deterioration of properties after curing.

【0011】以上のエポキシ樹脂、アクリレート樹脂、
エポキシ樹脂硬化剤、光重合開始剤から成る光・熱硬化
型層間絶縁樹脂を粗化処理された内層回路表面に塗布す
る際、スクリーン印刷、ローラーコーター、カーテンコ
ーターなどを使用し、片面あるいは両面をコートした
後、UV照射コンベアなどの露光機にていったん光硬化
させる。その後、光硬化させた表面に接着剤付き銅箔あ
るいは銅箔を接着させるが、この時加熱された硬質ロー
ル等でラミネートすることにより、樹脂を再溶融させ、
表面平滑性を得ることができる。光硬化させた樹脂は、
その後の熱硬化にて完全硬化され、接着剤付き銅箔また
は銅箔と強固に接着する。
The above epoxy resin, acrylate resin,
When applying a photo / thermosetting interlayer insulation resin consisting of an epoxy resin curing agent and a photopolymerization initiator to the surface of the roughened inner layer circuit, use screen printing, a roller coater, a curtain coater, etc. After coating, it is once photocured by an exposure device such as a UV irradiation conveyor. Then, a copper foil or copper foil with an adhesive is adhered to the photo-cured surface, but by laminating with a hard roll heated at this time, the resin is re-melted,
Surface smoothness can be obtained. The photo-cured resin is
It is completely cured by the subsequent heat curing and firmly adheres to the copper foil with an adhesive or the copper foil.

【0012】[0012]

【作用】本発明の光・熱硬化型の層間絶縁樹脂材料を用
いることにより、従来のコーティング設備を使用して、
気泡を残存させることなく、加熱ラミネートまたはプレ
スによって、表面平滑性を向上させた層間絶縁層を形成
することができる。これは、液状のエポキシ樹脂とアク
リレート樹脂を無溶剤で用いることにより、回路間の充
填性を高め同時に熱硬化後の収縮量を極小化させたため
である。更に接着剤付き銅箔または銅箔を強固に接着す
ることができるのは、光硬化が半硬化処理であり、その
後の熱硬化により二層間を完全に一体化させることがで
きるためである。特に銅箔ラミネートの場合は、新たな
層間接着剤を必要とせず、短いプロセスで多層プリント
配線板を製造することができる。
By using the light / thermosetting type interlayer insulating resin material of the present invention, conventional coating equipment can be used.
An interlayer insulating layer having improved surface smoothness can be formed by heating lamination or pressing without leaving bubbles. This is because the liquid epoxy resin and the acrylate resin are used without solvent to enhance the filling property between circuits and at the same time minimize the shrinkage amount after thermosetting. Further, the reason why the copper foil with an adhesive or the copper foil can be firmly adhered is that the photo-curing is a semi-curing treatment and the two layers can be completely integrated by the subsequent heat curing. In particular, in the case of copper foil laminate, a new interlayer adhesive is not required and a multilayer printed wiring board can be manufactured by a short process.

【0013】[0013]

【実施例】以下、本発明を実施例に基づき詳細に説明す
る。 (実施例1)ビスフェノールA型エポキシ樹脂(油化シ
ェルエポキシ製:エピコート828)100重量部、ビ
スフェノールA型エポキシアクリレート樹脂(昭和高分
子製:リポキシSP−1507)10重量部、エポキシ
樹脂硬化剤(油化シェルエポキシ製:EMI−24−C
N)10重量部及び光重合開始剤(チバガイギー製:イ
ルガキュア184)0.5重量部からなる組成をホモミ
キサーにて充分撹拌し、50℃で真空脱泡した。
EXAMPLES The present invention will now be described in detail based on examples. (Example 1) 100 parts by weight of bisphenol A-type epoxy resin (Oilized Shell Epoxy: Epicoat 828), 10 parts by weight of bisphenol A-type epoxy acrylate resin (Showa Polymer: Lipoxy SP-1507), epoxy resin curing agent ( Made of oiled shell epoxy: EMI-24-C
N) 10 parts by weight and a composition comprising 0.5 parts by weight of a photopolymerization initiator (manufactured by Ciba Geigy: Irgacure 184) were sufficiently stirred with a homomixer, and degassed under vacuum at 50 ° C.

【0014】基材厚0.1mm、銅箔厚35μmのガラ
スエポキシ両面銅張積層板をパターン加工し内層回路板
を作成した。次いで、亜塩素酸ナトリウム31g/l,
水酸化ナトリウム15g/l,りん酸ナトリウム12g
/lからなるアルカリ水溶液で95℃2分間処理し、回
路表面を粗化し、その上に上記混合樹脂をカーテンコー
ターにより約50μm塗布し、UVコンベア機にて80
W/cm高圧水銀灯2本で約2J/cmの条件で紫外線
照射し、光硬化させた。
A glass epoxy double-sided copper clad laminate having a substrate thickness of 0.1 mm and a copper foil thickness of 35 μm was patterned to prepare an inner layer circuit board. Then, sodium chlorite 31 g / l,
Sodium hydroxide 15g / l, sodium phosphate 12g
/ L in an alkaline aqueous solution at 95 ° C for 2 minutes to roughen the circuit surface, and apply the above mixed resin on the surface with a curtain coater to a thickness of about 50 µm.
Two W / cm high-pressure mercury lamps were used to irradiate ultraviolet rays under the conditions of about 2 J / cm to photo-cure.

【0015】ビスフェノールA型エポキシ樹脂(エポキ
シ当量6400、重量平均分子量30000)100重
量部とビスフェノールF型エポキシ樹脂(エポキシ当量
175、大日本インキ株式会社製:エピクロン830)
80重量部をMEKに撹拌しながら溶解し、そこへ硬化
剤としてジシアンジアミド15重量部、硬化促進剤とし
てマイクロカプセル化2−イミダゾール10重量部及び
シランカップリング剤(日本ユニカー製:A−187)
5重量部を添加して接着剤ワニスを調製した。次に、こ
のワニスを厚さ18μmの銅箔アンカー面に、厚みが5
0μmとなるようにローラーコーターにて塗布、乾燥し
た。これを上述の内層回路板表面の光硬化した樹脂の上
に100℃でロールラミネートし、180℃、20分間
加熱硬化させ、多層プリント配線板を作製した。
100 parts by weight of bisphenol A type epoxy resin (epoxy equivalent: 6400, weight average molecular weight: 30,000) and bisphenol F type epoxy resin (epoxy equivalent: 175, manufactured by Dainippon Ink and Chemicals: Epicron 830)
Dissolve 80 parts by weight in MEK while stirring, and then add 15 parts by weight of dicyandiamide as a curing agent, 10 parts by weight of microencapsulated 2-imidazole as a curing accelerator, and a silane coupling agent (manufactured by Nippon Unicar: A-187).
An adhesive varnish was prepared by adding 5 parts by weight. Next, this varnish was applied to a copper foil anchor surface having a thickness of 18 μm with a thickness of 5
It was coated with a roller coater so as to have a thickness of 0 μm and dried. This was roll-laminated on the photo-cured resin on the surface of the inner layer circuit board described above at 100 ° C. and heat-cured at 180 ° C. for 20 minutes to prepare a multilayer printed wiring board.

【0016】(実施例2)内層回路板を作製するための
基材厚0.1mmのガラスエポキシ両面銅張積層板とし
て、予め両面粗化された厚さ35μmの銅箔を用いた両
面粗化銅張積層板を使用した以外は、実施例1と全く同
様にして層間絶縁樹脂を塗布、光硬化させ、その上に接
着剤付き銅箔をラミネートし、加熱硬化させた。
Example 2 As a glass epoxy double-sided copper clad laminate having a substrate thickness of 0.1 mm for producing an inner layer circuit board, a double-sided roughening using a copper foil having a thickness of 35 μm, which was previously roughened on both sides, was used. An interlayer insulating resin was applied and light-cured in exactly the same manner as in Example 1 except that a copper-clad laminate was used, and a copper foil with an adhesive was laminated thereon and heat-cured.

【0017】(実施例3)実施例1と同様にして、ガラ
スエポキシ両面銅張積層板から得た内層回路板に層間絶
縁樹脂材料を塗布、光硬化させた後、その上に厚さ18
μmの銅箔をロールラミネートし、180℃、20分間
加熱硬化させた。
(Example 3) In the same manner as in Example 1, an interlayer insulating resin material was applied to an inner layer circuit board obtained from a glass epoxy double-sided copper clad laminate and light-cured, and then a thickness of 18 was applied thereon.
A copper foil having a thickness of μm was roll-laminated and cured by heating at 180 ° C. for 20 minutes.

【0018】(比較例)溶剤系のアンダーコート用ポリ
イミド樹脂(樹脂分70%)を実施例1と同様にして内
層回路板の上に塗布し、180℃、60分間加熱硬化さ
せ、その上に実施例1で作製した接着剤付き銅箔をラミ
ネートし、180℃、20分間更に加熱硬化させた。
(Comparative Example) A solvent-based undercoat polyimide resin (resin content 70%) was applied onto an inner layer circuit board in the same manner as in Example 1, and cured by heating at 180 ° C for 60 minutes. The copper foil with an adhesive produced in Example 1 was laminated and further cured by heating at 180 ° C. for 20 minutes.

【0019】このようにして得られた各多層プリント配
線板は次表に示すような特性を有している。
The multilayer printed wiring boards thus obtained have the characteristics shown in the following table.

【0020】 ────────────────────────────── 実施例1 実施例2 実施例3 比較例 ────────────────────────────── 表面平滑性(μm) 3.0 3.0 5.0 25.0 ピール強度(KN/m) − − 2.1 − 吸湿半田耐熱性 ○ ○ ○ ○ ──────────────────────────────────────────────────────────── Example 1 Example 2 Example 3 Comparative Example ──────────────────────── Surface smoothness (μm) 3.0 3.0 5.0 25.0 Peel strength (KN / m) − − 2.1 − Moisture absorption solder heat resistance ○ ○ ○ ○ ──────────────────────────────

【0021】(測定方法) 1.表面平滑性:JIS B 0601 R(max) 2.ピール強度:JIS C 6486による 3.吸湿半田耐熱試験: 吸湿条件 プレッシャークッカー処理 125℃、30
分 試験条件 n=5で、すべてのものが280℃で120
秒以上で 膨れが無かったものを○とした
(Measurement method) 1. Surface smoothness: JIS B 0601 R (max) 2. Peel strength: According to JIS C 6486 3. Moisture absorption solder heat resistance test: Moisture absorption condition Pressure cooker treatment 125 ° C, 30
Min Test conditions n = 5, all 120 at 280 ° C
Those that did not swell for more than a second were rated as ○.

【0022】[0022]

【発明の効果】以上述べたように、回路表面を粗化処理
された両面銅張板の両面に、絶縁樹脂層を形成し、その
上に接着剤付き銅箔または銅箔をラミネートする多層プ
リント配線板の製造方法において、層間絶縁樹脂を光と
熱の二段階硬化型にしたことにより、塗布した直後、光
による速硬化が可能となり、熱ストレスが無いため、極
薄基板でも反りやねじれがない状態で接着剤付き銅箔ま
たは銅箔をラミネートすることができる。また、接着剤
付き銅箔または銅箔をラミネートする際に、加熱された
硬質ロールやプレスで表面を平滑にすることができ、加
熱によって完全硬化させるため、層間絶縁樹脂と接着剤
付き銅箔または銅箔との密着力を高めることが可能とな
る。
As described above, a multilayer print in which an insulating resin layer is formed on both surfaces of a double-sided copper clad board whose circuit surface has been roughened, and a copper foil with an adhesive or a copper foil is laminated thereon. In the method of manufacturing a wiring board, the interlayer insulating resin is a two-step curing type of light and heat, which allows rapid curing by light immediately after coating and no thermal stress, so warping or twisting can occur even on an extremely thin substrate. Copper foil with adhesive or copper foil can be laminated without it. Also, when laminating the copper foil with the adhesive or the copper foil, the surface can be smoothed by a heated hard roll or press, and because it is completely cured by heating, the interlayer insulating resin and the copper foil with the adhesive or It is possible to increase the adhesion with the copper foil.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 1/03 610 L 7511−4E 3/38 B 7511−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location H05K 1/03 610 L 7511-4E 3/38 B 7511-4E

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂100重量部に対して、エ
ポキシ樹脂硬化剤1〜30重量部、光硬化型樹脂1〜1
00重量部、及び光硬化型樹脂100重量部に対して光
重合開始剤1〜10重量部からなることを特徴とする多
層プリント配線板用光・熱硬化型層間絶縁樹脂材料。
1. An epoxy resin curing agent of 1 to 30 parts by weight and a photocurable resin of 1 to 1 with respect to 100 parts by weight of the epoxy resin.
00 parts by weight and 1 to 10 parts by weight of a photopolymerization initiator with respect to 100 parts by weight of the photocurable resin, a photo-thermosetting interlayer insulating resin material for a multilayer printed wiring board.
【請求項2】 エポキシ樹脂が平均分子量300〜50
0の液状ビスフェノールA型エポキシ樹脂からなること
を特徴とする請求項1記載の多層プリント配線板用光・
熱硬化型層間絶縁樹脂材料。
2. The epoxy resin has an average molecular weight of 300 to 50.
2. A light for a multilayer printed wiring board according to claim 1, which is made of a liquid bisphenol A type epoxy resin of 0.
Thermosetting interlayer insulating resin material.
【請求項3】 光硬化型樹脂が平均分子量500〜15
00のアクリレート樹脂からなることを特徴とする請求
項1記載の多層プリント配線板用光・熱硬化型層間絶縁
樹脂材料。
3. The photocurable resin has an average molecular weight of 500 to 15
2. An optical / thermosetting interlayer insulating resin material for a multilayer printed wiring board according to claim 1, which is made of an acrylate resin of No. 00.
【請求項4】 下記の工程(A)〜(D)からなる多層
プリント配線板の製造方法。 (A)両面銅張板をエッチングし、内層回路を形成する
工程、(B)内層回路表面を粗化する工程、(C)内層
回路基板の両面または片面に請求項1記載の光・熱硬化
型層間絶縁樹脂材料を塗布した後、光照射して硬化する
工程、(D)該層間絶縁樹脂上に、接着剤付き銅箔また
は銅箔をラミネートないしプレスし、加熱硬化して一体
化する工程、
4. A method for manufacturing a multilayer printed wiring board comprising the following steps (A) to (D). The photo-thermosetting according to claim 1, wherein (A) a step of etching a double-sided copper clad board to form an inner layer circuit, (B) a step of roughening the inner layer circuit surface, and (C) both sides or one side of the inner layer circuit board. A step of applying a mold interlayer insulating resin material and then curing by irradiating with light, (D) a step of laminating or pressing an adhesive-attached copper foil or a copper foil on the interlayer insulating resin, and heat curing to integrate them. ,
【請求項5】 下記の工程(A)〜(C)からなる多層
プリント配線板の製造方法。 (A)あらかじめ両面粗化された銅箔を用いて積層成形
して得られる両面粗化銅張板をエッチングし、内層回路
を形成する工程、(B)内層回路基板の両面または片面
に請求項1記載の光・熱硬化型層間絶縁樹脂材料を塗布
した後、光照射して硬化する工程、(C)該層間絶縁樹
脂上に、接着剤付き銅箔または銅箔をラミネートないし
プレスし、加熱硬化して一体化する工程、
5. A method for manufacturing a multilayer printed wiring board comprising the following steps (A) to (C). (A) a step of etching a double-sided roughened copper clad plate obtained by laminating and forming using a copper foil roughened on both sides in advance to form an inner layer circuit; and (B) claiming on both sides or one side of the inner layer circuit board. A step of applying the light / thermosetting interlayer insulating resin material according to 1 and then curing by irradiating light, (C) laminating or pressing an adhesive-attached copper foil or a copper foil on the interlayer insulating resin, and heating. Curing and integrating,
JP6437595A 1994-04-14 1995-03-23 Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board Pending JPH07336054A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6437595A JPH07336054A (en) 1994-04-14 1995-03-23 Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7590394 1994-04-14
JP6-75903 1994-04-14
JP6437595A JPH07336054A (en) 1994-04-14 1995-03-23 Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board

Publications (1)

Publication Number Publication Date
JPH07336054A true JPH07336054A (en) 1995-12-22

Family

ID=26405490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6437595A Pending JPH07336054A (en) 1994-04-14 1995-03-23 Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board

Country Status (1)

Country Link
JP (1) JPH07336054A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09181456A (en) * 1995-12-27 1997-07-11 Nec Corp Multilayer printed wiring board manufacturing method
WO2006115231A1 (en) * 2005-04-22 2006-11-02 Three Bond Co., Ltd. Curable resin composition and process for producing bonded part obtained with the same
JP2006303398A (en) * 2005-04-18 2006-11-02 Sanei Kagaku Kk Hole-filled multilayered printed wiring board and manufacturing method thereof, and two-stage curing type resin composition used for manufacturing method thereof
CN114449776A (en) * 2022-01-25 2022-05-06 铜川光速芯材科技有限公司 Metal-based circuit board and preparation method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09181456A (en) * 1995-12-27 1997-07-11 Nec Corp Multilayer printed wiring board manufacturing method
JP2006303398A (en) * 2005-04-18 2006-11-02 Sanei Kagaku Kk Hole-filled multilayered printed wiring board and manufacturing method thereof, and two-stage curing type resin composition used for manufacturing method thereof
JP4735815B2 (en) * 2005-04-18 2011-07-27 山栄化学株式会社 Hole-filled multilayer printed wiring board and manufacturing method thereof
WO2006115231A1 (en) * 2005-04-22 2006-11-02 Three Bond Co., Ltd. Curable resin composition and process for producing bonded part obtained with the same
CN114449776A (en) * 2022-01-25 2022-05-06 铜川光速芯材科技有限公司 Metal-based circuit board and preparation method thereof

Similar Documents

Publication Publication Date Title
JP3084352B2 (en) Insulating resin composition for copper foil lamination type build-up and method for producing multilayer printed wiring board using the same
US5806177A (en) Process for producing multilayer printed circuit board
JP2883029B2 (en) Undercoat agent for multilayer printed wiring boards
EP0858725B1 (en) Multilayer printed circuit board and process for producing the same
JP2000104033A (en) Inter layer insulation adhesive for multi-layer printed wiring board and preparation of multi-layer printed- wiring board
JPH07336054A (en) Interlayer insulating resin material for multilayer board printed circuit board and manufacture of the same board
JP3003922B2 (en) 4-layer printed wiring board
JP2908258B2 (en) Light / thermosetting undercoat material and method for manufacturing multilayer printed wiring board
JP3084351B2 (en) Interlayer insulating adhesive for multilayer printed wiring boards
JP3046196B2 (en) Manufacturing method of multilayer printed wiring board
JP3046201B2 (en) Method for manufacturing multilayer printed wiring board
JPH11186725A (en) Manufacturing multilayered printed wiring board
JP2911778B2 (en) Manufacturing method of multilayer printed wiring board
JP3095115B2 (en) Light / thermosetting undercoat agent for multilayer printed wiring board and method for manufacturing multilayer printed wiring board
JP3328122B2 (en) Manufacturing method of multilayer printed wiring board
JPH1022639A (en) Manufacture of plastic flow sheet for multilayer printed wiring board and manufacture of multilayer wiring board using the sheet
JPH0971762A (en) Interlaminar insulating adhesive for multilayered printed circuit board
JP3003921B2 (en) Manufacturing method of multilayer printed wiring board
JP3287746B2 (en) 4-layer printed wiring board
JP3056676B2 (en) Method for manufacturing four-layer printed wiring board
JP2820648B2 (en) Manufacturing method of multilayer printed wiring board
JPH11186724A (en) Manufacturing multilayered printed wiring board
JP2826091B2 (en) Insulating adhesive for multilayer printed wiring boards
JPH09130039A (en) Manufacture of multilayer printed circuit board
JP3056666B2 (en) Manufacturing method of multilayer printed wiring board