JP3534220B2 - Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium - Google Patents

Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium

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Publication number
JP3534220B2
JP3534220B2 JP35754596A JP35754596A JP3534220B2 JP 3534220 B2 JP3534220 B2 JP 3534220B2 JP 35754596 A JP35754596 A JP 35754596A JP 35754596 A JP35754596 A JP 35754596A JP 3534220 B2 JP3534220 B2 JP 3534220B2
Authority
JP
Japan
Prior art keywords
glass substrate
magnetic
manufacturing
magnetic disk
chemical strengthening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP35754596A
Other languages
Japanese (ja)
Other versions
JPH10194786A (en
Inventor
浩二 高橋
勝俊 大野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP35754596A priority Critical patent/JP3534220B2/en
Priority to MYPI97006400A priority patent/MY123825A/en
Priority to US08/999,479 priority patent/US6119483A/en
Publication of JPH10194786A publication Critical patent/JPH10194786A/en
Priority to US09/571,049 priority patent/US6427489B1/en
Priority to US09/881,627 priority patent/US6430965B2/en
Application granted granted Critical
Publication of JP3534220B2 publication Critical patent/JP3534220B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は情報処理機器の記録媒体
として使用される情報記録媒体、及びその基板の製造方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an information recording medium used as a recording medium for information processing equipment and a method for manufacturing a substrate thereof.

【0002】[0002]

【従来の技術】この種の情報記録媒体の一つとして磁気
ディスクがある。磁気ディスクは、基板上に磁性層等の
薄膜を形成して構成されたものであり、その基板として
はアルミやガラス基板が用いられてきた。しかし、最近
では、高記録密度化の追求に呼応して、アルミと較べて
磁気ヘッドと磁気記録媒体との間隔をより狭くすること
が可能なガラス基板の占める比率が次第に高くなってき
ている。
2. Description of the Related Art A magnetic disk is one of the information recording media of this type. A magnetic disk is constructed by forming a thin film such as a magnetic layer on a substrate, and an aluminum or glass substrate has been used as the substrate. However, in recent years, in response to the pursuit of higher recording density, the ratio of the glass substrate that can make the distance between the magnetic head and the magnetic recording medium narrower than that of aluminum is gradually increasing.

【0003】このように増加の傾向にあるガラス基板
は、磁気ディスクドライバーに装着された際の衝撃に耐
えるように一般的に強度を増すために化学強化されて製
造されている。又、ガラス基板表面は磁気ヘッドの浮上
高さを極力下げることができるように、高精度に研磨し
て高記録密度化を実現している。他方、ガラス基板だけ
ではなく、磁気ヘッドも薄膜ヘッドから磁気抵抗(MR
ヘッド)に推移し、高記録密度化にこたえている。
The glass substrate, which tends to increase in number, is generally chemically strengthened so as to increase its strength so as to withstand impact when mounted on a magnetic disk driver. In addition, the surface of the glass substrate is highly accurately polished so that the flying height of the magnetic head can be lowered as much as possible to realize a high recording density. On the other hand, not only the glass substrate but also the magnetic head can be connected to the magnetic resistance (MR
Head) and is responding to higher recording densities.

【0004】[0004]

【発明が解決しようとする課題】上述したように高記録
密度化にとって必要な低フライングハイト化のために磁
気ディスク表面の高い平坦性は必要不可欠である。加え
て、MRヘッドを用いた場合,TA(サーマル・アスフ
ェリティー)の問題からも磁気記録媒体の表面には高い
平坦性が必要となる。このサーマル・アスフェリティー
は、磁気ディスクの表面上に突起があると、この突起に
MRヘッドが影響をうけてMRヘッドに熱が発生し、こ
の熱によってヘッドの抵抗値が変動し電磁変換に誤動作
を引き起こす現象である。
As described above, high flatness of the magnetic disk surface is indispensable for achieving the low flying height required for high recording density. In addition, when an MR head is used, high flatness is required on the surface of the magnetic recording medium due to the problem of TA (thermal asperity). In this thermal asperity, if there is a protrusion on the surface of the magnetic disk, the MR head is affected by the protrusion and heat is generated in the MR head. This heat changes the resistance value of the head and causes electromagnetic conversion. This is a phenomenon that causes a malfunction.

【0005】このように、低フライングハイト化にとっ
ても、サーマル・アスフェリティーの発生防止のために
も磁気ディスク表面の高い平坦性の要請は日増に高まっ
てきている。このような、磁気ディスク表面の高い平坦
性を得るためには結局高い平坦性の基板表面が求められ
ることになるが、もはや、高精度に基板表面を研磨する
だけでは、磁気ディスクの高記録密度化を実現できない
段階まで来ている。つまり、いくら、高精度に研磨して
も基板上に異物が付着していては高い平坦性は得られな
い。勿論、従来から異物の除去はなされていたが、従来
では許容されていた基板上の異物が、今日の高密度化の
レベルでは問題視される状況にある。
As described above, the demand for high flatness of the surface of the magnetic disk is increasing day by day both for lowering the flying height and for preventing the occurrence of thermal asperity. In order to obtain such a high flatness of the magnetic disk surface, a highly flat substrate surface is eventually required, but it is no longer necessary to polish the substrate surface with high accuracy. Is reaching the stage where it cannot be realized. In other words, no matter how highly accurately polished, high flatness cannot be obtained even if foreign matter adheres to the substrate. Of course, although foreign substances have been removed from the past, the foreign substances on the substrate, which have been allowed in the past, are now regarded as a problem at the level of high density.

【0006】この種の異物としては、例えば、通常の洗
浄では除去できない極めて微小な鉄粉、ステンレス片、
ガラスチップ等が挙げられる。これらの鉄粉等のパーテ
ィクルがガラス基板上に付着した状態で磁性膜等の薄膜
を積層すると、磁気ディスク表面に突部が形成され、低
フライング・ハイト化や、サーマル・アスフェリティー
の防止の阻害要因になる。
Examples of this type of foreign matter include extremely fine iron powder, stainless steel pieces, which cannot be removed by ordinary washing,
Examples thereof include glass chips. When a thin film such as a magnetic film is laminated with these particles of iron powder or the like adhering to the glass substrate, a protrusion is formed on the surface of the magnetic disk, which reduces flying height and thermal asperity. It becomes an obstacle.

【0007】本発明は、このような微小な鉄粉等のパー
ティクルのガラス基板への付着を防止することを目的と
する。
An object of the present invention is to prevent such particles of fine iron powder or the like from adhering to a glass substrate.

【0008】[0008]

【課題を解決するための手段】本発明は、上述した目的
を鑑みてなされたものであり、微小な鉄粉、ガラスチッ
プ、ステンレス片がガラス基板に付着する原因を、鋭意
究明したところ、化学強化処理液に化学強化処理装置の
周囲に配置されている、種々の製造装置あるいは建設設
備から発塵する鉄粉が化学強化処理液中に混入し、ガラ
ス基板を化学強化している最中に混入した鉄粉等の金属
片がガラス基板に付着してしまうことが判った。
Means for Solving the Problems The present invention has been made in view of the above-mentioned objects, and when the cause of adhesion of fine iron powder, glass chips, and stainless steel pieces to a glass substrate is earnestly investigated, chemical During the chemical strengthening of the glass substrate, the iron powder generated from various manufacturing equipment or construction equipment, which is placed around the chemical strengthening processing equipment in the strengthening processing liquid, is mixed into the chemical strengthening processing liquid. It was found that the mixed metal powder such as iron powder adheres to the glass substrate.

【0009】本発明の第1の構成は、ガラス基板を化学
強化処理液に接触させることにより、ガラス基板の中に
含まれる一部のイオンを、そのイオンより大きなイオン
径の処理液中のイオンに置換することによりガラス基板
を強化する化学強化工程を含む磁気記録媒体用ガラス基
板の製造方法において、前記化学強化処理液に存在する
微小なパーティクルを捕捉する手段を設けたことを特徴
とする情報記録媒体用ガラス基板の製造方法。
The first structure of the present invention is to bring some of the ions contained in the glass substrate into contact with the chemical strengthening treatment liquid so that some of the ions in the treatment liquid have an ion diameter larger than that of the ions. In a method for manufacturing a glass substrate for a magnetic recording medium, which comprises a chemical strengthening step of strengthening a glass substrate by substituting into, a means for trapping minute particles present in the chemical strengthening treatment liquid is provided. Manufacturing method of glass substrate for recording medium.

【0010】本発明の第2の構成は、微小な金属片を捕
捉する手段が、循環する化学強化処理液を濾過するフィ
ルターであることを特徴とする前記構成1記載の情報記
録媒体用ガラス基板の製造方法。
A second structure of the present invention is the glass substrate for an information recording medium according to the above structure 1, characterized in that the means for capturing the minute metal pieces is a filter for filtering the circulating chemical strengthening treatment liquid. Manufacturing method.

【0011】本発明の第3の構成は、微小な金属片が微
小鉄粉であり、捕捉手段が化学強化処理液に接触するよ
うに配置された磁石であることを特徴とする前記構成1
記載の情報記録媒体用ガラス基板の製造方法。
A third structure of the present invention is characterized in that the minute metal piece is minute iron powder and the capturing means is a magnet arranged so as to come into contact with the chemical strengthening treatment liquid.
A method for producing the glass substrate for an information recording medium described.

【0012】本発明の第4の構成は情報記録媒体用ガラ
ス基板が磁気ディスク用ガラス基板であることを特徴と
する前記構成1〜3に記載の情報記録媒体用ガラス基板
の製造方法。本発明の第5の構成は、磁気ディスク用ガ
ラス基板が磁気抵抗型ヘッド用磁気ディスクに用いられ
るガラス基板であることを特徴とする前記構成4記載の
情報記録媒体用ガラス基板の製造方法。
A fourth structure of the present invention is the method for manufacturing a glass substrate for an information recording medium according to the above structures 1 to 3, wherein the glass substrate for an information recording medium is a glass substrate for a magnetic disk. A fifth structure of the present invention is the method for manufacturing a glass substrate for an information recording medium according to the structure 4, wherein the glass substrate for a magnetic disk is a glass substrate used for a magnetic disk for a magnetoresistive head.

【0013】本発明の第6の構成は、前記構成1〜5の
何れかに記載の情報記録媒体用ガラス基板の製造方法に
よって得られたガラス基板上に少なくとも記録層を形成
することを特徴とする情報記録媒体の製造方法。
A sixth structure of the present invention is characterized in that at least a recording layer is formed on a glass substrate obtained by the method for manufacturing a glass substrate for an information recording medium according to any one of the structures 1 to 5. Method for manufacturing information recording medium.

【0014】本発明の第7の構成は記録層が磁性層であ
ることを特徴とする前記構成6記載の情報記録媒体の製
造方法。
A seventh structure of the present invention is the method for manufacturing an information recording medium according to the structure 6, wherein the recording layer is a magnetic layer.

【0015】本発明の化学強化方法としては、ガラス転
移温度を超えない領域でイオン交換を行う低温型化学強
化が好ましい。化学強化処理溶液として用いるアルカリ
溶融塩としては、硝酸カリウム、硝酸ナトリウム、ある
いはそれらを混合した硝酸塩などが使用できる。又、ガ
ラス基板としてはジルコニアを含んだアルミノシリケー
トガラス、ソーダライムガラス、結晶化ガラスが使用で
きる。
As the chemical strengthening method of the present invention, low temperature type chemical strengthening in which ion exchange is carried out in a region not exceeding the glass transition temperature is preferable. As the alkali molten salt used as the chemical strengthening treatment solution, potassium nitrate, sodium nitrate, nitrate mixed with these, or the like can be used. Further, as the glass substrate, aluminosilicate glass containing zirconia, soda lime glass, or crystallized glass can be used.

【0016】パーティクルとしては、鉄粉、ステンレス
等の金属片や金属酸化物、ガラスチップがある。そして
これらのパーティクルはサイズが数ミクロン以上のもの
を好適に除去できれば効果的である。
The particles include metal particles such as iron powder and stainless steel, metal oxides, and glass chips. It is effective that these particles can be suitably removed if they have a size of several microns or more.

【0017】本発明の微小なパーティクルを捕捉する手
段としては、フィルター等がある。フィルターとしては
化学強化処理液を濾過して供給できるものであれば良
く、例えばマイクローシーブ(エッチングで孔を開けた
金網)などが使用できる。この場合、化学強化処理液は
高温に加熱されるので、耐食性に優れたマルテンサイト
系又は、オーステナイト系のステンレス合金が好まし
い。又、他のパーティクルを捕捉する手段としては、特
に、パーティクルが微小鉄粉の場合は化学強化処理溶液
に接触するように磁石等を配置しても良い。又、捕捉手
段は固定しても、移動させても何れでも良い。本発明の
製造方法に係る情報記録媒体用ガラス基板には、磁気記
録媒体用ガラス基板、光記録媒体用ガラス基板、光磁気
記録媒体用ガラス基板等がある。特に磁気抵抗型ヘッド
用磁気ディスク及びその基板の製造方法に顕著な効果を
奏する。
A filter or the like is used as a means for capturing the minute particles of the present invention. Any filter can be used as long as it can supply the chemically strengthened treatment liquid by filtration, and for example, a micro-sieve (a wire net having holes formed by etching) can be used. In this case, since the chemical strengthening treatment liquid is heated to a high temperature, a martensitic or austenitic stainless alloy having excellent corrosion resistance is preferable. Further, as a means for capturing other particles, a magnet or the like may be arranged so as to come into contact with the chemical strengthening treatment solution, particularly when the particles are fine iron powder. Further, the capturing means may be fixed or may be moved. The information recording medium glass substrate according to the manufacturing method of the present invention includes a magnetic recording medium glass substrate, an optical recording medium glass substrate, a magneto-optical recording medium glass substrate, and the like. In particular, the magnetic disk for a magnetoresistive head and the method for manufacturing the substrate thereof have remarkable effects.

【0018】次に、本発明の磁気記録媒体について説明
する。本発明の磁気記録媒体は、上記本発明の磁気記録
媒体用ガラス基板上に、少なくとも磁性層を形成したも
のである。
Next, the magnetic recording medium of the present invention will be described. The magnetic recording medium of the present invention comprises at least a magnetic layer formed on the glass substrate for a magnetic recording medium of the present invention.

【0019】本発明では、サーマル・アスフェリティー
あるいはヘッドクラッシュの原因となるパーティクルが
付着することがないので、ガラス基板上に磁性層等を形
成して磁気記録媒体を製造する際にガラス基板の主表面
にサーマル・アスフェリティーの原因となるパーティク
ルによって形成される凸部が発生せず、より高いレベル
でヘッドクラッシュを防止できる。特に、磁気抵抗型ヘ
ッドによって再生を行う磁気記録媒体にとって、磁気抵
抗型ヘッドの機能を十分に引き出すことができる。ま
た、磁気抵抗型ヘッドに好適に使用することができるC
oPt系等の磁気記録媒体としてもその性能を十分に引
き出すことができる。
According to the present invention, particles that cause thermal asperity or head crash do not adhere, so that when a magnetic recording medium is manufactured by forming a magnetic layer or the like on a glass substrate, No protrusions formed on the main surface due to particles that cause thermal aspherity occur, and head crashes can be prevented at a higher level. In particular, for a magnetic recording medium that is reproduced by a magnetoresistive head, the function of the magnetoresistive head can be sufficiently obtained. Further, C which can be suitably used for a magnetoresistive head
The performance of the magnetic recording medium such as the oPt system can be sufficiently obtained.

【0020】同様に、磁気記録媒体の記録・再生面にお
いてもサーマル・アスフェリティーの原因となるパーテ
ィクルによって形成される凸部が発生せず、より高いレ
ベルでヘッドクラッシュを防止できる。
Similarly, even on the recording / reproducing surface of the magnetic recording medium, a convex portion formed by particles that cause thermal asperity does not occur, and head crash can be prevented at a higher level.

【0021】また、サーマル・アスフェリティーの原因
となるパーティクルによって、磁性層等の膜に欠陥が発
生しエラーの原因となるということもない。
Further, particles that cause thermal aspherity do not cause defects in the film such as the magnetic layer and cause errors.

【0022】磁気記録媒体は、通常、所定の平坦度、表
面粗さを有し、必要に応じ表面の化学強化処理を施した
磁気ディスク用ガラス基板上に、下地層、磁性層、保護
層、潤滑層を順次積層して製造する。
The magnetic recording medium usually has a predetermined flatness and surface roughness, and on the glass substrate for a magnetic disk, the surface of which is chemically strengthened if necessary, an underlayer, a magnetic layer, a protective layer, The lubricating layer is sequentially laminated to manufacture.

【0023】本発明の磁気記録媒体における下地層は、
磁性層に応じて選択される。
The underlayer in the magnetic recording medium of the present invention is
It is selected according to the magnetic layer.

【0024】下地層としては、例えば、Cr、Mo、T
a、Ti、W、V、B、Alなどの非磁性金属から選ば
れる少なくとも一種以上の材料からなる下地層等が挙げ
られる。Coを主成分とする磁性層の場合には、磁気特
性向上等の観点からCr単体やCr合金であることが好
ましい。また、下地層は単層とは限らず、同一又は異種
の層を積層した複数層構造とすることもできる。例え
ば、Cr/Cr、Cr/CrMo、Cr/CrV、Cr
V/CrV、Al/Cr/CrMo、Al/Cr/C
r、Al/Cr/CrV、Al/CrV/CrV等の多
層下地層等が挙げられる。
As the underlayer, for example, Cr, Mo, T
Examples thereof include an underlayer made of at least one material selected from nonmagnetic metals such as a, Ti, W, V, B and Al. In the case of the magnetic layer containing Co as a main component, it is preferable to use Cr alone or a Cr alloy from the viewpoint of improving the magnetic characteristics. The base layer is not limited to a single layer, and may have a multi-layer structure in which the same or different layers are laminated. For example, Cr / Cr, Cr / CrMo, Cr / CrV, Cr
V / CrV, Al / Cr / CrMo, Al / Cr / C
Examples include multilayer underlayers such as r, Al / Cr / CrV, and Al / CrV / CrV.

【0025】本発明の磁気記録媒体における磁性層の材
料は特に制限されない。
The material of the magnetic layer in the magnetic recording medium of the present invention is not particularly limited.

【0026】磁性層としては、例えば、Coを主成分と
するCoPt、CoCr、CoNi、CoNiCr、C
oCrTa、CoPtCr、CoNiPtや、CoNi
CrPt、CoNiCrTa、CoCrTaPt、Co
CrPtSiOなどの磁性薄膜が挙げられる。磁性層
は、磁性膜を非磁性膜(例えば、Cr、CrMo、Cr
Vなど)で分割してノイズの低減を図った多層構成(例
えば、CoPtCr/CrMo/CoPtCr、CoC
rTaPt/CrMo/CoCrTaPtなど)として
もよい。
As the magnetic layer, for example, CoPt, CoCr, CoNi, CoNiCr, C containing Co as a main component is used.
oCrTa, CoPtCr, CoNiPt, CoNi
CrPt, CoNiCrTa, CoCrTaPt, Co
Examples include magnetic thin films such as CrPtSiO. The magnetic layer includes a magnetic film and a non-magnetic film (for example, Cr, CrMo, Cr
Multi-layer structure (for example, CoPtCr / CrMo / CoPtCr, CoC) divided by V etc. to reduce noise
rTaPt / CrMo / CoCrTaPt, etc.).

【0027】磁気抵抗型ヘッド(MRヘッド)又は大型
磁気抵抗型ヘッド(GMRヘッド)対応の磁性層として
は、Co系合金に、Y、Si、希土類元素、Hf、G
e、Sn、Znから選択される不純物元素、又はこれら
の不純物元素の酸化物を含有させたものなども含まれ
る。
As a magnetic layer for a magnetoresistive head (MR head) or a large magnetoresistive head (GMR head), a Co alloy is used, and Y, Si, rare earth elements, Hf, and G are used.
Also included are impurity elements selected from e, Sn, and Zn, or those containing oxides of these impurity elements.

【0028】また、磁性層としては、上記の他、フェラ
イト系、鉄−希土類系や、SiO2、BNなどからなる非
磁性膜中にFe、Co、FeCo、CoNiPt等の磁
性粒子が分散された構造のグラニュラーなどであっても
よい。また、磁性層は、内面型、垂直型のいずれの記録
形式であってもよい。
In addition to the above, the magnetic layer has a structure in which magnetic particles such as Fe, Co, FeCo and CoNiPt are dispersed in a non-magnetic film made of ferrite, iron-rare earth, SiO2, BN or the like. It may be a granular material or the like. Further, the magnetic layer may be in either an inner surface type or a vertical type recording format.

【0029】本発明の磁気記録媒体における保護層は特
に制限されない。
The protective layer in the magnetic recording medium of the present invention is not particularly limited.

【0030】保護層としては、例えば、Cr膜、Cr合
金膜、カーボン膜、ジルコニア膜、シリカ膜等が挙げら
れる。これらの保護膜は、下地層、磁性層等とともにイ
ンライン型スパッタ装置で連続して形成できる。また、
これらの保護膜は、単層としてもよく、あるいは、同一
又は異種の膜からなる多層構成としてもよい。
Examples of the protective layer include a Cr film, a Cr alloy film, a carbon film, a zirconia film, and a silica film. These protective films can be continuously formed with an underlayer, a magnetic layer and the like by an in-line type sputtering device. Also,
These protective films may be a single layer, or may be a multi-layer structure composed of the same or different types of films.

【0031】本発明では、上記保護層上に、あるいは上
記保護層に替えて、他の保護層を形成してもよい。例え
ば、上記保護層に替えて、Cr膜の上にテトラアルコキ
シランをアルコール系の溶媒で希釈した中に、コロイダ
ルシリカ微粒子を分散して塗布し、さらに焼成して酸化
ケイ素(SiO2)膜を形成してもよい。
In the present invention, another protective layer may be formed on the protective layer or in place of the protective layer. For example, instead of the above protective layer, tetraalkoxylane is diluted with an alcoholic solvent on a Cr film, colloidal silica fine particles are dispersed and applied, and further baked to form a silicon oxide (SiO2) film. You may.

【0032】本発明の磁気記録媒体における潤滑層は特
に制限されない。
The lubricating layer in the magnetic recording medium of the present invention is not particularly limited.

【0033】潤滑層は、例えば、液体潤滑剤であるパー
フロロポリエーテル(PFPE)をフレオン系などの溶
媒で希釈し、媒体表面にディッピング法、スピンコート
法、スプレイ法によって塗布し、必要に応じ加熱処理を
行って形成する。
The lubricating layer is prepared by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon, and coating it on the surface of the medium by a dipping method, a spin coating method or a spraying method, and if necessary. It is formed by heat treatment.

【0034】[0034]

【実施例】以下、実施例に基づき本発明をさらに具体的
に説明する。
EXAMPLES The present invention will be described in more detail below with reference to examples.

【0035】実施例1 Example 1

【0036】(1)荒ずり工程 まず、ダウンドロー法で形成したシートガラスから、研
削砥石で直径96mmφ、厚さ3mmの円盤状に切り出
したアルミノシリケイトガラスからなるガラス基板を、
比較的粗いダイヤモンド砥石で研削加工して、直径96
mmφ、厚さ1.5mmに成形した。この場合、ダウン
ドロー法の代わりに、溶融ガラスを、上型、下型、胴型
を用いてダイレクト・プレスして、円盤状のガラス体を
得てもよい。又、フロート法で形成しても良い。
(1) Roughing Step First, a glass substrate made of aluminosilicate glass cut out from a sheet glass formed by the downdraw method into a disc shape having a diameter of 96 mmφ and a thickness of 3 mm with a grinding wheel,
Diameter 96 with a relatively coarse diamond wheel
It was molded into mmφ and a thickness of 1.5 mm. In this case, instead of the downdraw method, the molten glass may be directly pressed using an upper die, a lower die and a barrel die to obtain a disc-shaped glass body. Alternatively, it may be formed by the float method.

【0037】なお、アルミノシリケイトガラスとして
は、モル%表示で、SiO2を57〜74%、ZnO2を
0〜2.8%、Al2O3を3〜15%、LiO2を7〜
16%、Na2Oを4〜14%、を主成分として含有す
る化学強化用ガラス(例えば、モル%表示で、SiO2:
67.0%、ZnO2:1.0%、Al2O3:9.0%、
LiO2:12.0%、Na2O:10.0%を主成分と
して含有する化学強化用ガラス)を使用した。
As an aluminosilicate glass, SiO2 is 57 to 74%, ZnO2 is 0 to 2.8%, Al2O3 is 3 to 15%, and LiO2 is 7 to 7 in mol%.
Glass for chemical strengthening containing 16% as a main component and 4% to 14% Na2O (eg, SiO2:
67.0%, ZnO2: 1.0%, Al2O3: 9.0%,
A glass for chemical strengthening containing LiO2: 12.0% and Na2O: 10.0% as main components was used.

【0038】次いで、上記砥石よりも粒度の細かいダイ
ヤモンド砥石で上記ガラス基板の両面を片面ずつ研削加
工した。このときの荷重は100kg程度とした。これ
により、ガラス基板両面の表面粗さをRmax(JIS
B 0601で測定)で10μm程度に仕上げた。
Then, both sides of the glass substrate were ground one by one with a diamond grindstone having a finer grain size than that of the grindstone. The load at this time was about 100 kg. As a result, the surface roughness of both surfaces of the glass substrate is Rmax (JIS
(Measured with B 0601) to a thickness of about 10 μm.

【0039】次に、円筒状の砥石を用いてガラス基板の
中央部分に孔を開けるとともに、外周端面も研削して直
径を95mmφとした後、外周端面及び内周面に所定の
面取り加工を施した。このときのガラス基板端面の表面
粗さは、Rmaxで4μm程度であった。
Next, a hole is made in the central portion of the glass substrate using a cylindrical grindstone, the outer peripheral end face is also ground to a diameter of 95 mmφ, and then the outer peripheral end face and the inner peripheral face are subjected to predetermined chamfering. did. At this time, the surface roughness of the end surface of the glass substrate was about 4 μm in Rmax.

【0040】(2)端面鏡面加工工程 次いで、ブラシ研磨により、ガラス基板を回転させなが
らガラス基板の端面の表面粗さを、Rmaxで1μm、
Raで0.3μm程度に研磨した。
(2) End face mirror surface finishing step Next, the surface roughness of the end face of the glass substrate is 1 μm as Rmax by brush polishing while rotating the glass substrate.
It was polished to about 0.3 μm with Ra.

【0041】上記端面鏡面加工を終えたガラス基板の表
面を水洗浄した。
The surface of the glass substrate which had been subjected to the above-mentioned end face mirror finishing was washed with water.

【0042】(3)砂掛け(ラッピング)工程 次に、ガラス基板に砂掛け加工を施した。この砂掛け工
程は、寸法精度及び形状精度の向上を目的としている。
砂掛け加工は、ラッピング装置を用いて行い、砥粒の粒
度を#400、#1000と替えて2回行った。
(3) Sanding (Wrapping) Step Next, the glass substrate was sanded. This sanding step aims to improve dimensional accuracy and shape accuracy.
The sanding process was performed using a lapping device, and was performed twice by changing the grain size of the abrasive grains to # 400 and # 1000.

【0043】詳しくは、はじめに、粒度#400のアル
ミナ砥粒を用い、荷重Lを100kg程度に設定して、
内転ギアと外転ギアを回転させることによって、キャリ
ア内に収納したガラス基板の両面を面精度0〜1μm、
表面粗さ(Rmax)6μm程度にラッピングした。
Specifically, first, using alumina abrasive grains having a grain size of # 400, the load L is set to about 100 kg,
By rotating the adder gear and the adder gear, the surface precision of both surfaces of the glass substrate housed in the carrier is 0 to 1 μm,
Lapping was performed so that the surface roughness (Rmax) was about 6 μm.

【0044】次いで、アルミナ砥粒の粒度を#1000
に替えてラッピングを行い、表面粗さ(Rmax)2μ
m程度とした。
Next, the grain size of the alumina abrasive grains was adjusted to # 1000.
The surface roughness (Rmax) 2μ
It was about m.

【0045】上記砂掛け加工を終えたガラス基板を、中
性洗剤、水の各洗浄槽に順次浸漬して、洗浄した。
The glass substrate that had been sanded was washed by sequentially immersing it in a washing bath of neutral detergent and water.

【0046】(4)第一研磨工程 次に、第一研磨工程を施した。この第一研磨工程は、上
述した砂掛け工程で残留したキズや歪みの除去を目的と
するもので、研磨装置を用いて行った。
(4) First Polishing Step Next, a first polishing step was performed. This first polishing step is intended to remove the scratches and strains remaining in the sanding step described above, and was performed using a polishing apparatus.

【0047】詳しくは、ポリシャ(研磨粉)として硬質
ポリシャ(セリウムパッドMHC15:スピードファム
社製)を用い、以下の研磨条件で第一研磨工程を実施し
た。
More specifically, a hard polisher (cerium pad MHC15: manufactured by Speedfam) was used as a polisher (polishing powder), and the first polishing step was carried out under the following polishing conditions.

【0048】研磨液:酸化セリウム+水 荷重:300g/cm2(L=238kg) 研磨時間:15分 除去量:30μm 下定盤回転数:40 rpm 上定盤回転数:35 rpm 内ギア回転数:14 rpm 外ギア回転数:29 rpmPolishing liquid: cerium oxide + water load: 300 g / cm 2 (L = 238 kg) Polishing time: 15 minutes Removal amount: 30 μm Lower surface plate rotation speed: 40 rpm Upper surface plate rotation speed: 35 rpm Inner gear rotation speed: 14 rpm Outer gear rotation speed: 29 rpm

【0049】上記第一研磨工程を終えたガラス基板を、
中性洗剤、純水、純水、IPA(イソプロピルアルコー
ル)、IPA(蒸気乾燥)の各洗浄槽に順次浸漬して、
洗浄した。
The glass substrate which has undergone the first polishing step is
Immerse in each cleaning bath of neutral detergent, pure water, pure water, IPA (isopropyl alcohol), IPA (steam drying),
Washed.

【0050】(5)第二研磨工程 次に、第一研磨工程で使用した研磨装置を用い、ポリシ
ャを硬質ポリシャから軟質ポリシャ(ポリラックス:ス
ピードファム社製)に替えて、第二研磨工程を実施し
た。研磨条件は、荷重を100g/cm2、研磨時間を
5分、除去量を5μmとしたこと以外は、第一研磨工程
と同様とした。
(5) Second Polishing Step Next, using the polishing apparatus used in the first polishing step, the polisher was changed from a hard polisher to a soft polisher (Porelax: manufactured by Speed Fam Co.), and the second polishing step was performed. Carried out. The polishing conditions were the same as in the first polishing step, except that the load was 100 g / cm 2 , the polishing time was 5 minutes, and the removal amount was 5 μm.

【0051】上記第二研磨工程を終えたガラス基板を、
中性洗剤、中性洗剤、純水、純水、IPA(イソプロピ
ルアルコール)、IPA(蒸気乾燥)の各洗浄槽に順次
浸漬して、洗浄した。なお、各洗浄槽には超音波を印加
した。
The glass substrate that has undergone the second polishing step is
It was washed by sequentially immersing it in each of a neutral detergent, a neutral detergent, pure water, pure water, IPA (isopropyl alcohol) and IPA (steam drying). Ultrasonic waves were applied to each cleaning tank.

【0052】(6)化学強化工程 次に、上記研削、研磨、洗浄工程を終えたガラス基板に
化学強化を施した。化学強化は化学強化処理液を化学強
化処理槽に収納し、ガラス基板を保持した保持手段を化
学強化処理槽に浸漬して行う。このとき化学強化処理槽
の処理液ははポンプによって循環しており、その循環経
路の途中に設けられた、1ミクロン程度のメッシュのス
テンレス網によって濾過されて清浄な状態で処理槽に供
給されている。このフィルターであるステンレス網によ
って、製造装置や建設設備から発塵し、雰囲気中に浮遊
し化学処理槽に落下した鉄粉、ステンレス片、あるい
は、ガラス基板の擦過によって発生したガラスチップが
ガラス基板に付着することを防止できる。
(6) Chemical Strengthening Step Next, the glass substrate which has undergone the grinding, polishing and cleaning steps is subjected to chemical strengthening. The chemical strengthening is performed by storing the chemical strengthening treatment liquid in the chemical strengthening treatment tank and immersing the holding means holding the glass substrate in the chemical strengthening treatment tank. At this time, the treatment liquid in the chemical strengthening treatment tank is circulated by a pump, and is filtered in a clean state by a stainless mesh of about 1 micron mesh provided in the middle of the circulation path and is supplied to the treatment tank in a clean state. There is. This filter, a stainless steel net, generates dust from manufacturing equipment and construction equipment, iron powder that floats in the atmosphere and falls into the chemical treatment tank, stainless steel pieces, or glass chips generated by rubbing the glass substrate onto the glass substrate. It can be prevented from adhering.

【0053】このような環境下で以下の通り化学強化を
行った。硝酸カリウム(60%)と硝酸ナトリウム(4
0%)を混合した化学強化溶液を用意し、この化学強化
溶液を化学強化処理槽で400℃に加熱し、300℃に
予熱された洗浄済みのガラス基板を約3時間浸漬して行
った。この浸漬の際に、ガラス基板の表面全体が化学強
化されるようにするため、複数のガラス基板が端面で保
持されるようにホルダーに収納した状態で行った。
Under such an environment, chemical strengthening was performed as follows. Potassium nitrate (60%) and sodium nitrate (4
(0%) was prepared, the chemical strengthening solution was heated to 400 ° C. in the chemical strengthening treatment tank, and the cleaned glass substrate preheated to 300 ° C. was immersed for about 3 hours. At the time of this immersion, in order to chemically strengthen the entire surface of the glass substrate, a plurality of glass substrates were housed in a holder so as to be held by the end faces.

【0054】このように、化学強化溶液に浸漬処理する
ことによって、ガラス基板表層のリチウムイオン、ナト
リウムイオンは、化学強化溶液中のナトリウムイオン、
カリウムイオンにそれぞれ置換されガラス基板は強化さ
れる。
As described above, by performing the immersion treatment in the chemical strengthening solution, the lithium ion and the sodium ion in the surface layer of the glass substrate are converted into the sodium ion in the chemical strengthening solution,
The glass substrate is strengthened by being replaced with potassium ions.

【0055】ガラス基板の表層に形成された圧縮応力層
の厚さは、約100〜200μmであった。
The thickness of the compressive stress layer formed on the surface layer of the glass substrate was about 100 to 200 μm.

【0056】上記化学強化を終えたガラス基板を、20
℃の水槽に浸漬して急冷し約10分間維持した。
The glass substrate after the above-mentioned chemical strengthening is
It was immersed in a water bath at 0 ° C., rapidly cooled and maintained for about 10 minutes.

【0057】上記急冷を終えたガラス基板を、約40℃
に加熱した硫酸に浸漬し、超音波をかけながら洗浄を行
った。
After the quenching, the glass substrate is heated to about 40.degree.
It was dipped in sulfuric acid heated to, and washed while applying ultrasonic waves.

【0058】上記の工程を経て得られたガラス基板の表
面粗さRaは0.5〜1nmであった。さらに、ガラス
表面を精密検査したところサーマル・アスフェリティー
の原因となるパーティクルは認められなかった。特に、
3〜5ミクロン以上の鉄粉は全く認められなかった。
The surface roughness Ra of the glass substrate obtained through the above steps was 0.5 to 1 nm. Further, when the glass surface was closely inspected, no particles causing the thermal aspherity were found. In particular,
No iron powder of 3-5 microns or more was observed.

【0059】(7)磁気ディスク製造工程 上述した工程を経て得られた磁気ディスク用ガラス基板
の両面に、インライン式のスパッタリング装置を用い
て、AlNのスパッタによるテクスチャー層、Cr下地
層、CrMo下地層、CoPtCrTa磁性層、C保護
層を順次成膜して磁気ディスクを得た。
(7) Magnetic Disk Manufacturing Process A texture layer, a Cr underlayer, and a CrMo underlayer formed by sputtering of AlN are formed on both surfaces of the glass substrate for a magnetic disk obtained through the above-mentioned steps by using an in-line type sputtering device. , CoPtCrTa magnetic layer and C protective layer were sequentially formed to obtain a magnetic disk.

【0060】得られた磁気ディスクについてグライドテ
ストを実施したところ、ヒット(ヘッドが磁気ディスク
表面の突起にかすること)やクラッシュ(ヘッドが磁気
ディスク表面の突起に衝突すること)は認められなかっ
た。また、サーマル・アスフェリティーの原因となるパ
ーティクルによって、磁性層等の膜に欠陥が発生してい
ないことも確認できた。
A glide test was carried out on the obtained magnetic disk, and no hits (the head scratched the projections on the magnetic disk surface) or crashes (the head collided with the projections on the magnetic disk surface) were not observed. . It was also confirmed that particles causing the thermal asperity did not cause defects in the film such as the magnetic layer.

【0061】なお、本発明のように清浄な化学強化処理
液で化学強化した本実施例と、捕捉手段を用いないで化
学強化した比較例と、比較のためグライドテストを実施
したところ、本実施例の方がはるかに不良品が少ないこ
とが判明した。
Incidentally, a glide test was carried out for comparison with this embodiment, which was chemically strengthened with a clean chemical strengthening treatment liquid as in the present invention, and a comparative example, which was chemically strengthened without using a trapping means. It turned out that the example had far fewer defectives.

【0062】また、グライドテストを終えた本実施例の
磁気ディスクについて、磁気抵抗型ヘッドで再生試験を
行ったが、複数のサンプル(500枚)の全数について
サーマル・アスフェリティーによる再生の誤動作は認め
られなかった。
A reproduction test was conducted on the magnetic disk of the present example which had completed the glide test, using a magnetoresistive head. It was confirmed that the reproduction error due to the thermal asperity occurred for all of a plurality of samples (500 sheets). I was not able to admit.

【0063】実施例2〜3 アルミノシリケートガラスの代わりにソーダライムガラ
ス(実施例2)、ソーダアルミノケイ酸ガラス(実施例
3)を用いたこと以外は実施例1と同様にして、磁気デ
ィスク用ガラス基板及び磁気ディスクを得た。
Examples 2 to 3 Glass for magnetic disk was prepared in the same manner as in Example 1 except that soda lime glass (Example 2) and soda aluminosilicate glass (Example 3) were used in place of the aluminosilicate glass. A substrate and a magnetic disk were obtained.

【0064】その結果、実施例1と同様のことが確認さ
れた。。
As a result, the same thing as in Example 1 was confirmed. .

【0065】実施例4 実施例1で得られた磁気ディスク用ガラス基板の両面
に、Al(膜厚50オングストローム)/Cr(100
0オングストローム)/CrMo(100オングストロ
ーム)からなる下地層、CoPtCr(120オングス
トローム)/CrMo(50オングストローム)/Co
PtCr(120オングストローム)からなる磁性層、
Cr(50オングストローム)保護層をインライン型ス
パッタ装置で形成した。
Example 4 Al (film thickness 50 Å) / Cr (100) was formed on both surfaces of the magnetic disk glass substrate obtained in Example 1.
0 angstrom) / CrMo (100 angstrom) underlayer, CoPtCr (120 angstrom) / CrMo (50 angstrom) / Co
A magnetic layer made of PtCr (120 Å),
A Cr (50 Å) protective layer was formed by an in-line type sputtering device.

【0066】上記基板を、シリカ微粒子(粒経100オ
ングストローム)を分散した有機ケイ素化合物溶液(水
とIPAとテトラエトキシシランとの混合液)に浸し、
焼成することによってSiO2からなるテクスチャー機
能を持った保護層を形成し、さらに、この保護層上をパ
ーフロロポリエーテルからなる潤滑剤でディップ処理し
て潤滑層を形成して、MRヘッド用磁気ディスクを得
た。
The above substrate was dipped in an organic silicon compound solution (mixture of water, IPA and tetraethoxysilane) in which fine silica particles (grain size 100 Å) were dispersed,
A protective layer made of SiO2 having a texture function is formed by firing, and the protective layer is further subjected to a dip treatment with a lubricant made of perfluoropolyether to form a lubricating layer. Got

【0067】得られた磁気ディスクについてグライドテ
ストを実施したところ、ヒットやクラッシュは認められ
なかった。また、磁性層等の膜に欠陥が発生していない
ことも確認できた。さらに、磁気抵抗型ヘッドによる再
生試験の結果、サーマル・アスフェリティーによる再生
の誤動作は認められなかった。
When a glide test was conducted on the obtained magnetic disk, no hit or crush was observed. It was also confirmed that no defect was generated in the film such as the magnetic layer. Furthermore, as a result of a reproduction test using a magnetoresistive head, no malfunction of reproduction due to thermal asperity was observed.

【0068】実施例5 下地層をAl/Cr/Crとし、磁性層をCoNiCr
Taとしたこと以外は実施例4と同様にして薄膜ヘッド
用磁気ディスクを得た。
Example 5 Al / Cr / Cr was used as the underlayer and CoNiCr was used as the magnetic layer.
A magnetic disk for a thin film head was obtained in the same manner as in Example 4 except that Ta was used.

【0069】上記磁気ディスクについて実施例4と同様
のことが確認された。
It was confirmed that the magnetic disk was the same as in Example 4.

【0070】以上好ましい実施例を挙げて本発明を説明
したが、本発明は必ずしも上記実施例に限定されるもの
ではない。
Although the present invention has been described with reference to the preferred embodiments, the present invention is not necessarily limited to the above embodiments.

【0071】化学強化処理液中のパーティクルを捕捉す
る手段としてフィルターを用いたが、例えば鉄粉のみを
捕捉するのであれば、化学強化処理液中に磁石等を配置
したり、化学強化槽の内壁に内接又は埋設しても良い。
A filter was used as a means for trapping particles in the chemical strengthening treatment liquid. For example, if only iron powder is trapped, a magnet or the like is placed in the chemical strengthening treatment liquid or the inner wall of the chemical strengthening tank. It may be inscribed in or embedded in.

【0072】[0072]

【発明の効果】以上説明したように本発明では、化学強
化中にガラス基板に鉄粉等の金属片又は金属酸化物片が
付着することを防止しているので、ヘッドクラッシュ
や、サーマル・アスフェリティーの原因となるパーティ
クルが発生することがなく、サーマル・アスフェリティ
ーによる再生機能の低下を防止することができる。
As described above, according to the present invention, it is possible to prevent metal pieces such as iron powder or metal oxide pieces from adhering to the glass substrate during the chemical strengthening. Particles that cause ferritity are not generated, and it is possible to prevent deterioration of the reproduction function due to thermal aspherity.

【0073】また、サーマル・アスフェリティーの原因
となるパーティクルに起因する不良を回避でき、より高
品質の磁気記録媒体が高歩留まりで得られる。
Further, it is possible to avoid defects due to particles that cause thermal aspherity, and it is possible to obtain a higher quality magnetic recording medium with a high yield.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平5−32431(JP,A) 特開 平7−155712(JP,A) 特開 平8−64572(JP,A) 特開 平4−162627(JP,A) 特開 昭62−237991(JP,A)   ─────────────────────────────────────────────────── ─── Continued front page       (56) Reference JP-A-5-32431 (JP, A)                 JP-A-7-155712 (JP, A)                 JP-A-8-64572 (JP, A)                 JP-A-4-162627 (JP, A)                 JP 62-237991 (JP, A)

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ガラス基板を化学強化処理液に接触させ
ることにより、ガラス基板の中に含まれる一部のイオン
を、そのイオンより大きなイオン径の処理液中のイオン
に置換することによりガラス基板を強化する化学強化工
程を含む磁気ディスク用ガラス基板の製造方法におい
て、サーマル・アスフェリティー(TA:Thermal Asperit
y)による再生機能の低下を防止するためサーマル・
アスフェリティー(TA:Thermal Asperity)の原因と
なるパーティクルのガラス基板への付着を防止するよう
、前記化学強化処理液に存在する微小なパーティクル
を捕捉する手段を設けたことを特徴とする磁気抵抗型ヘ
ッドで再生される磁気ディスクに使用される磁気ディス
用ガラス基板の製造方法。
1. A glass substrate by bringing a glass substrate into contact with a chemical strengthening treatment liquid to replace some of the ions contained in the glass substrate with ions in the treatment liquid having an ion diameter larger than the ions. In a method of manufacturing a glass substrate for a magnetic disk , which includes a chemical strengthening step for strengthening a thermal asperity (TA: Thermal Asperit
To prevent degradation of the playback function by y), thermal
Causes of asperity (TA: Thermal Asperity)
To prevent the adhered particles from sticking to the glass substrate
, The magnetoresistive f, characterized in that a means for capturing fine particles present in the chemical strengthening treatment solution
Magnetic disk used for magnetic discs
Method of manufacturing a glass substrate for a click.
【請求項2】 微小なパーティクルを捕捉する手段が、
循環する化学強化処理液を濾過するフィルターであるこ
とを特徴とする請求項1記載の磁気抵抗型ヘッドで再生
される磁気ディスクに使用される磁気ディスク用ガラス
基板の製造方法。
2. A means for capturing fine particles comprises:
2. The magnetoresistive head according to claim 1, which is a filter for filtering the circulating chemical strengthening treatment liquid.
For manufacturing a glass substrate for a magnetic disk used for a magnetic disk .
【請求項3】 微小なパーティクルの一つである微小な
金属片が微小鉄粉であり、捕捉手段が化学強化処理液に
接触するように配置された磁石であることを特徴とする
請求項1記載の磁気抵抗型ヘッドで再生される磁気ディ
スクに使用される磁気ディスク用ガラス基板の製造方
法。
3. A fine metal piece, which is one of the fine particles, is fine iron powder, and the capturing means is a magnet arranged so as to come into contact with the chemical strengthening treatment liquid. The magnetic disk reproduced by the described magnetoresistive head.
A method of manufacturing a glass substrate for a magnetic disk used for a disk .
【請求項4】 請求項1〜の何れかに記載の磁気ディ
スク用ガラス基板の製造方法によって得られたガラス基
板上に少なくとも磁性層を形成することを特徴とする
気抵抗型ヘッドで再生される磁気ディスクに使用される
磁気ディスクの製造方法。
4. A magnetic Di according to any one of claims 1 to 3
Magnetic, which comprises forming at least a magnetic layer on a glass substrate obtained by the manufacturing method of a glass substrate for disk
Used for magnetic disks reproduced by air resistance type heads
Manufacturing method of magnetic disk .
JP35754596A 1996-12-30 1996-12-30 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium Expired - Lifetime JP3534220B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP35754596A JP3534220B2 (en) 1996-12-30 1996-12-30 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium
MYPI97006400A MY123825A (en) 1996-12-30 1997-12-29 Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate.
US08/999,479 US6119483A (en) 1996-12-30 1997-12-29 Process for producing glass substrate for information recording medium
US09/571,049 US6427489B1 (en) 1996-12-30 2000-05-15 Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate
US09/881,627 US6430965B2 (en) 1996-12-30 2001-06-14 Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35754596A JP3534220B2 (en) 1996-12-30 1996-12-30 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium

Publications (2)

Publication Number Publication Date
JPH10194786A JPH10194786A (en) 1998-07-28
JP3534220B2 true JP3534220B2 (en) 2004-06-07

Family

ID=18454684

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Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3534220B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY157029A (en) 1999-03-31 2016-04-15 Hoya Corp Method of manufacturing glass substrate and information recording medium
JP2005108306A (en) * 2003-09-29 2005-04-21 Hoya Corp Chemical reinforcement treatment method of glass substrate for magnetic disk, manufacturing method of chemically reinforced glass substrate for magnetic disk, and manufacturing method of magnetic disk
JP2007012247A (en) * 2005-06-03 2007-01-18 Hoya Corp Method of manufacturing glass substrate for magnetic disk and method of manufacturing magnetic disk
JP2007207393A (en) * 2006-02-06 2007-08-16 Hoya Corp Method for manufacturing glass substrate for magnetic disk, glass substrate for magnetic disk, and method for manufacturing magnetic disk

Also Published As

Publication number Publication date
JPH10194786A (en) 1998-07-28

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