JP3172107B2 - Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium - Google Patents

Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium

Info

Publication number
JP3172107B2
JP3172107B2 JP35754496A JP35754496A JP3172107B2 JP 3172107 B2 JP3172107 B2 JP 3172107B2 JP 35754496 A JP35754496 A JP 35754496A JP 35754496 A JP35754496 A JP 35754496A JP 3172107 B2 JP3172107 B2 JP 3172107B2
Authority
JP
Japan
Prior art keywords
glass substrate
chemical strengthening
manufacturing
strengthening treatment
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP35754496A
Other languages
Japanese (ja)
Other versions
JPH10198954A (en
Inventor
伸二 江田
潤 小澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP35754496A priority Critical patent/JP3172107B2/en
Priority to MYPI97006400A priority patent/MY123825A/en
Priority to US08/999,479 priority patent/US6119483A/en
Publication of JPH10198954A publication Critical patent/JPH10198954A/en
Priority to US09/571,049 priority patent/US6427489B1/en
Application granted granted Critical
Publication of JP3172107B2 publication Critical patent/JP3172107B2/en
Priority to US09/881,627 priority patent/US6430965B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Surface Treatment Of Glass (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は情報処理機器の記録媒体
として使用される情報記録媒体、及びその基板を用いた
情報記録媒体の製造方法等に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an information recording medium used as a recording medium of an information processing apparatus, a method of manufacturing an information recording medium using the substrate, and the like.

【0002】[0002]

【従来の技術】この種の情報記録媒体の一つとして磁気
ディスクがある。磁気ディスクは、基板上に磁性層等の
薄膜を形成して構成されたものであり、その基板として
はアルミやガラス基板が用いられてきた。しかし、最近
では、高記録密度化の追求に呼応して、アルミと較べて
磁気ヘッドと磁気記録媒体との間隔をより狭くすること
が可能なガラス基板の占める比率が次第に高くなってき
ている。このように増加の傾向にあるガラス基板は、磁
気ディスクドライバーに装着された際の衝撃に耐えるよ
うに一般的に強度を増すために化学強化されて製造され
ている。又、ガラス基板表面は磁気ヘッドの浮上高さを
極力下げることができるように、高精度に研磨して高記
録密度化を実現している。
2. Description of the Related Art A magnetic disk is one of such information recording media. A magnetic disk is formed by forming a thin film such as a magnetic layer on a substrate, and an aluminum or glass substrate has been used as the substrate. However, in recent years, in response to the pursuit of higher recording density, the proportion of the glass substrate that can make the distance between the magnetic head and the magnetic recording medium smaller than that of aluminum has been gradually increasing. The glass substrate, which tends to increase in this manner, is generally manufactured by chemically strengthening it to increase the strength so as to withstand the impact when mounted on a magnetic disk driver. In addition, the glass substrate surface is polished with high precision to achieve a high recording density so that the flying height of the magnetic head can be reduced as much as possible.

【0003】他方、ガラス基板だけではなく、磁気ヘッ
ドも薄膜ヘッドから磁気抵抗(MRヘッド)に推移し、
高記録密度化にこたえている。
On the other hand, not only the glass substrate but also the magnetic head changes from a thin film head to a magnetic resistance (MR head).
Responding to high recording density.

【0004】[0004]

【発明が解決しようとする課題】上述したように高記録
密度化にとって必要な低フライングハイト化のために磁
気ディスク表面の高い平坦性は必要不可欠である。加え
て、MRヘッドを用いた場合,TA(サーマル・アスフ
ェリティー)の問題からも磁気記録媒体の表面には高い
平坦性が必要となる。このサーマル・アスフェリティー
は、磁気ディスクの表面上に突起があると、この突起に
MRヘッドが影響をうけてMRヘッドに熱が発生し、こ
の熱によってヘッドの抵抗値が変動し電磁変換に誤動作
を引き起こす現象である。
As described above, high flatness of the surface of a magnetic disk is indispensable for a low flying height required for a high recording density. In addition, when an MR head is used, a high flatness is required on the surface of the magnetic recording medium due to the problem of TA (thermal asperity). The thermal asperity is such that when a protrusion is present on the surface of a magnetic disk, the protrusion is affected by the MR head, and heat is generated in the MR head. This is a phenomenon that causes malfunction.

【0005】このように、低フライングハイト化にとっ
ても、サーマル・アスフェリティーの発生防止のために
も磁気ディスク表面の高い平坦性の要請は日増に高まっ
てきている。このような、磁気ディスク表面の高い平坦
性を得るためには結局高い平坦性の基板表面が求められ
ることになるが、もはや、高精度に基板表面を研磨する
だけでは、磁気ディスクの高記録密度化を実現できない
段階まで来ている。つまり、いくら、高精度に研磨して
も基板上に異物が付着していては高い平坦性は得られな
い。勿論、従来から異物の除去はなされていたが、従来
では許容されていた基板上の異物が、今日の高密度化の
レベルでは問題視される状況にある。
As described above, the demand for high flatness of the surface of the magnetic disk has been increasing day by day to reduce the flying height and to prevent the occurrence of thermal asperity. In order to obtain such high flatness of the magnetic disk surface, a substrate surface with high flatness is ultimately required. However, if the substrate surface is no longer polished with high precision, the high recording density of the magnetic disk can no longer be obtained. We have reached the stage where we cannot realize the realization. In other words, no matter how high the polishing accuracy, high flatness cannot be obtained if foreign matter adheres to the substrate. Of course, foreign matter has been conventionally removed, but foreign matter on the substrate, which has been conventionally allowed, is considered to be a problem at today's high-density level.

【0006】この種の異物としては、例えば、通常の洗
浄では除去できない極めて微小な鉄粉が挙げられる。こ
の鉄粉がガラス基板上に付着した状態で磁性膜等の薄膜
を積層すると、磁気ディスク表面に突部が形成され、低
フライング・ハイト化や、サーマル・アスフェリティー
の防止の阻害要因になる。本発明は、このような微小な
鉄粉等の金属片がガラス基板に付着することの防止を目
的とする。
[0006] Examples of this kind of foreign matter include extremely fine iron powder which cannot be removed by ordinary washing. When a thin film such as a magnetic film is laminated with the iron powder adhered to the glass substrate, a protrusion is formed on the surface of the magnetic disk, which causes a reduction in flying height and prevention of thermal asperity. . An object of the present invention is to prevent such a small piece of metal such as iron powder from adhering to a glass substrate.

【0007】[0007]

【課題を解決するための手段】本発明は、上述した目的
を鑑みてなされたものであり、微小な鉄粉がガラス基板
に付着する原因を、鋭意究明したところ、化学強化中
に、化学強化処理液を収納している化学強化処理槽ある
いは、化学強化処理液にガラス基板を沈めるときにガラ
ス基板を保持する保持手段から鉄粉等の金属又は金属酸
化物がガラス基板に直接又は化学強化処理液を介して間
接的に付着することが判った。特に化学強化処理は、高
温(例えば、350〜450度)で行うので、ステンレ
ス合金でも特定のステンレス合金を使用しないと、清浄
な表面を持った化学強化ガラス基板が得られないことが
わかった。
DISCLOSURE OF THE INVENTION The present invention has been made in view of the above-mentioned object, and has ascertained the cause of the adhesion of fine iron powder to a glass substrate. A metal or metal oxide such as iron powder is directly or chemically treated on a glass substrate from a chemical strengthening treatment tank containing a treating solution or a holding means for holding the glass substrate when the glass substrate is immersed in the chemical strengthening treating solution. It was found to adhere indirectly through the liquid. In particular, since the chemical strengthening treatment is performed at a high temperature (for example, 350 to 450 degrees), it has been found that a chemically strengthened glass substrate having a clean surface cannot be obtained unless a specific stainless steel alloy is used.

【0008】本発明の第1の構成は、保持手段に保持さ
れたガラス基板を化学強化処理液に接触させることによ
り、ガラス基板の中に含まれる一部のイオンを、そのイ
オンより大きなイオン径の処理液中のイオンに置換する
ことによりガラス基板を強化する化学強化工程を含む情
報記録媒体用ガラス基板の製造方法において、前記化学
強化処理液を収納する化学強化処理槽の少なくとも処理
液と接する壁面及び/又はガラス基板を保持する保持手
段を、化学強化処理液の加熱温度の高温域で耐食性を有
するステンレス合金で構成することを特徴とする情報記
録媒体用ガラス基板の製造方法。
According to a first configuration of the present invention, the glass substrate held by the holding means is brought into contact with a chemical strengthening treatment liquid, so that some of the ions contained in the glass substrate have an ion diameter larger than the ions. In the method for manufacturing a glass substrate for an information recording medium, the method includes a chemical strengthening step of strengthening the glass substrate by substituting the glass substrate with ions in the processing solution of (1). A method for manufacturing a glass substrate for an information recording medium, wherein the holding means for holding the wall surface and / or the glass substrate is made of a stainless steel alloy having corrosion resistance in a high temperature range of the heating temperature of the chemical strengthening treatment liquid.

【0009】本発明の第2の構成は、保持手段に保持さ
れたガラス基板を化学強化処理液に接触させることによ
り、ガラス基板の中に含まれる一部のイオンを、そのイ
オンより大きなイオン径の処理液中のイオンに置換する
ことによりガラス基板を強化する化学強化工程を含む情
報記録媒体用ガラス基板の製造方法において、前記化学
強化処理液を収納する化学強化処理槽の少なくとも処理
液と接する壁面及び/又はガラス基板を保持する保持手
段を、マルテンサイト系又はオーステナイト系のステン
レス合金から構成することを特徴とする情報記録媒体用
ガラス基板の製造方法。
According to a second configuration of the present invention, the glass substrate held by the holding means is brought into contact with a chemical strengthening treatment liquid to convert some of the ions contained in the glass substrate into an ion having a larger ion diameter than the ions. In the method for manufacturing a glass substrate for an information recording medium, the method includes a chemical strengthening step of strengthening the glass substrate by substituting the glass substrate with ions in the processing solution of (1). A method for manufacturing a glass substrate for an information recording medium, wherein the holding means for holding the wall surface and / or the glass substrate is made of a martensitic or austenitic stainless steel alloy.

【0010】本発明の第3の構成は、情報記録媒体用ガ
ラス基板が磁気ディスク用ガラス基板であることを特徴
とする前記構成1又は2記載の情報記録媒体用ガラス基
板の製造方法。本発明の第4の構成は、情報記録媒体用
ガラス基板が磁気抵抗型ヘッド用ガラス基板であること
を特徴とする前記構成3記載の情報記録媒体用ガラス基
板の製造方法。
A third aspect of the present invention is the method of manufacturing a glass substrate for an information recording medium according to the first or second aspect, wherein the glass substrate for the information recording medium is a glass substrate for a magnetic disk. A fourth aspect of the present invention is the method for manufacturing a glass substrate for an information recording medium according to the third aspect, wherein the glass substrate for the information recording medium is a glass substrate for a magnetoresistive head.

【0011】本発明の第5の構成は、前記構成1〜4記
載の情報記録媒体用ガラス基板の製造方法によって得ら
れたガラス基板上に少なくとも記録層を形成することを
特徴とする情報記録媒体の製造方法。
According to a fifth aspect of the present invention, there is provided an information recording medium wherein at least a recording layer is formed on a glass substrate obtained by the method for producing a glass substrate for an information recording medium according to any one of the first to fourth aspects. Manufacturing method.

【0012】本発明の第6の構成は、記録層が磁性層で
あることを特徴とする前記第5の構成記載の情報記録媒
体の製造方法。
According to a sixth aspect of the present invention, in the method for manufacturing an information recording medium according to the fifth aspect, the recording layer is a magnetic layer.

【0013】ガラス基板の保持手段としては、種々の形
態が考えられるが、要は、ガラス基板に化学強化処理液
が所定の状態で接触することが可能であり、液ダレを起
こさないものが好ましい。マルテンサイト系又はオース
テナイト系ステンレス合金にするのは、化学強化槽とガ
ラス基板の保持手段の両方が好ましいが、何れか一方で
も良い。又、化学強化槽あるいはガラス基板保持手段の
全体をマルテンサイト系又はオーステナイト系ステンレ
ス合金で構成するのが好ましいが、化学強化処理液と接
触する部分だけでも良い。これらのマルテンサイト系又
はオーステナイト系ステンレス合金は高温域における耐
食性が優れているので金属片の発塵を防止できる。
Various means are conceivable as means for holding the glass substrate. In short, it is preferable that the chemical strengthening treatment liquid can come into contact with the glass substrate in a predetermined state and does not cause liquid dripping. . The martensitic or austenitic stainless alloy is preferably provided by both the chemical strengthening bath and the means for holding the glass substrate, but either one may be used. Further, it is preferable that the whole of the chemical strengthening tank or the glass substrate holding means is made of a martensitic or austenitic stainless steel alloy, but only a portion that comes into contact with the chemical strengthening treatment liquid may be used. These martensitic or austenitic stainless alloys have excellent corrosion resistance in a high temperature range, so that dust of metal pieces can be prevented.

【0014】化学強化処理液の加熱温度は200〜50
0℃ぐらいが予定される。
The heating temperature of the chemical strengthening treatment liquid is 200 to 50.
Around 0 ° C is planned.

【0015】ガラス基板の種類、サイズ、厚さ等は特に
制限されない。ガラス基板の材質としては、例えば、ア
ルミノシリケートガラス、ソーダライムガラス、ソーダ
アルミノケイ酸ガラス、アルミノボロシリケートガラ
ス、ボロシリケートガラス、石英ガラス、チェーンシリ
ケートガラス、又は、結晶化ガラス等のガラスセラミッ
クなどが挙げられる。
The type, size, thickness and the like of the glass substrate are not particularly limited. Examples of the material of the glass substrate include aluminosilicate glass, soda lime glass, soda aluminosilicate glass, aluminoborosilicate glass, borosilicate glass, quartz glass, chain silicate glass, and glass ceramics such as crystallized glass. Can be

【0016】アルミノシリケートガラスとしては、Si
2:62〜75重量%、Al23:5〜15重量%、
Li2O:4〜10重量%、Na2O:4〜12重量%、
ZrO2:5.5〜15重量%を主成分として含有する
とともに、Na2O/ZrO2の重量比が0.5〜2.
0、Al23/ZrO2の重量比が0.4〜2.5であ
る化学強化用ガラス等が好ましい。また、ZrO2の未
溶解物が原因で生じるガラス基板表面の突起をなくすた
めには、モル%表示で、SiO2を57〜74%、Zn
2を0〜2.8%、Al23を3〜15%、LiO2
7〜16%、Na2Oを4〜14%含有する化学強化用
ガラス等を使用することが好ましい。このような組成の
アルミノシリケートガラス等は、化学強化することによ
って、抗折強度が増加し、圧縮応力層の深さも深く、ヌ
ープ硬度にも優れる。
As the aluminosilicate glass, Si
O 2 : 62 to 75% by weight, Al 2 O 3 : 5 to 15% by weight,
Li 2 O: 4 to 10% by weight, Na 2 O: 4 to 12% by weight,
ZrO 2: 5.5 to 15 with containing by weight% as the main component, the weight ratio of Na 2 O / ZrO 2 is 0.5 to 2.
0, Al 2 O 3 / weight ratio of ZrO 2 of glass for chemical strengthening is 0.4 to 2.5 is preferred. In order to eliminate projections on the glass substrate surface caused by undissolved ZrO 2 , 57% to 74% of SiO 2 , Zn
O 2 and 0 to 2.8%, the Al 2 O 3 3 to 15% of LiO 2 7 to 16% it is preferred to use chemical strengthening glass containing Na 2 O 4~14%. The aluminosilicate glass or the like having such a composition increases the transverse rupture strength by chemical strengthening, has a deep compressive stress layer, and is excellent in Knoop hardness.

【0017】本発明では、耐衝撃性や耐振動性等の向上
を目的として、ガラス基板の表面に低温イオン交換法に
よる化学強化処理を施す。
In the present invention, the surface of the glass substrate is subjected to a chemical strengthening treatment by a low-temperature ion exchange method for the purpose of improving impact resistance, vibration resistance and the like.

【0018】ここで、化学強化方法としては、従来より
公知の化学強化法であれば特に制限されないが、例え
ば、ガラス転移点の観点から転移温度を超えない領域で
イオン交換を行う低温型化学強化などが好ましい。化学
強化に用いるアルカリ溶融塩としては、硝酸カリウム、
硝酸ナトリウム、あるいは、それらを混合した硝酸塩な
どが挙げられる。
Here, the chemical strengthening method is not particularly limited as long as it is a conventionally known chemical strengthening method. For example, a low-temperature type chemical strengthening method in which ion exchange is performed in a region not exceeding a transition temperature from the viewpoint of a glass transition point. Are preferred. Potassium nitrate,
Examples thereof include sodium nitrate, and a nitrate obtained by mixing them.

【0019】上記本発明の製造方法に係る情報記録媒体
用ガラス基板は、磁気記録媒体用のガラス基板、光磁気
ディスク用のガラス基板、光ディスクなどの電子光学用
ディスク基板として利用できる。特に、磁気抵抗型(大
型磁気抵抗型ヘッドも含む)ヘッドで記録再生する磁気
抵抗型ヘッド用の磁気ディスク基板、及びそれを用いた
情報記録媒体の製造方法に好適に利用できる。
The glass substrate for an information recording medium according to the manufacturing method of the present invention can be used as a glass substrate for a magnetic recording medium, a glass substrate for a magneto-optical disk, and a disk substrate for an electro-optical disk such as an optical disk. In particular, the present invention can be suitably applied to a magnetic disk substrate for a magnetoresistive head for recording and reproducing with a magnetoresistive head (including a large-sized magnetoresistive head) and a method for manufacturing an information recording medium using the same.

【0020】次に、本発明の磁気記録媒体について説明
する。
Next, the magnetic recording medium of the present invention will be described.

【0021】本発明の磁気記録媒体は、上記本発明の磁
気記録媒体用ガラス基板上に、少なくとも磁性層を形成
したものである。
The magnetic recording medium of the present invention is obtained by forming at least a magnetic layer on the glass substrate for a magnetic recording medium of the present invention.

【0022】本発明では、サーマル・アスフェリティー
あるいはヘッドクラッシュの原因となるパーティクルが
発生することがないので、ガラス基板上に磁性層等を形
成して磁気記録媒体を製造する際にガラス基板の主表面
にサーマル・アスフェリティーの原因となるパーティク
ルによって形成される凸部が発生せず、より高いレベル
でヘッドクラッシュを防止できる。特に、磁気抵抗型ヘ
ッドによって再生を行う磁気記録媒体にとって、磁気抵
抗型ヘッドの機能を十分に引き出すことができる。ま
た、磁気抵抗型ヘッドに好適に使用することができるC
oPt系等の磁気記録媒体としてもその性能を十分に引
き出すことができる。
In the present invention, since particles which cause thermal asperity or head crash are not generated, a magnetic layer or the like is formed on a glass substrate to manufacture a magnetic recording medium. There is no protrusion formed on the main surface by particles that cause thermal asperity, and head crash can be prevented at a higher level. In particular, the function of the magnetoresistive head can be fully exploited for a magnetic recording medium that performs reproduction with the magnetoresistive head. Further, C which can be suitably used for a magnetoresistive head can be used.
The performance of a magnetic recording medium such as an oPt system can be sufficiently brought out.

【0023】同様に、磁気記録媒体の記録・再生面にお
いてもサーマル・アスフェリティーの原因となるパーテ
ィクルによって形成される凸部が発生せず、より高いレ
ベルでヘッドクラッシュを防止できる。
Similarly, on the recording / reproducing surface of the magnetic recording medium, there is no projection formed by particles that cause thermal asperity, and a head crash can be prevented at a higher level.

【0024】また、サーマル・アスフェリティーの原因
となるパーティクルによって、磁性層等の膜に欠陥が発
生しエラーの原因となるということもない。
Further, there is no possibility that a particle such as a thermal asperity causes a defect in a film such as a magnetic layer to cause an error.

【0025】磁気記録媒体は、通常、所定の平坦度、表
面粗さを有し、必要に応じ表面の化学強化処理を施した
磁気ディスク用ガラス基板上に、下地層、磁性層、保護
層、潤滑層を順次積層して製造する。
A magnetic recording medium usually has a predetermined flatness and surface roughness, and is provided with an underlayer, a magnetic layer, a protective layer, It is manufactured by sequentially laminating a lubricating layer.

【0026】本発明の磁気記録媒体における下地層は、
磁性層に応じて選択される。
The underlayer in the magnetic recording medium of the present invention comprises:
It is selected according to the magnetic layer.

【0027】下地層としては、例えば、Cr、Mo、T
a、Ti、W、V、B、Alなどの非磁性金属から選ば
れる少なくとも一種以上の材料からなる下地層等が挙げ
られる。Coを主成分とする磁性層の場合には、磁気特
性向上等の観点からCr単体やCr合金であることが好
ましい。また、下地層は単層とは限らず、同一又は異種
の層を積層した複数層構造とすることもできる。例え
ば、Cr/Cr、Cr/CrMo、Cr/CrV、Cr
V/CrV、Al/Cr/CrMo、Al/Cr/C
r、Al/Cr/CrV、Al/CrV/CrV等の多
層下地層等が挙げられる。
As the underlayer, for example, Cr, Mo, T
a, an underlayer made of at least one material selected from nonmagnetic metals such as Ti, W, V, B, and Al. In the case of a magnetic layer containing Co as a main component, it is preferable to use Cr alone or a Cr alloy from the viewpoint of improving magnetic properties. The underlayer is not limited to a single layer, and may have a multilayer structure in which the same or different layers are stacked. For example, Cr / Cr, Cr / CrMo, Cr / CrV, Cr
V / CrV, Al / Cr / CrMo, Al / Cr / C
r, a multilayer base layer of Al / Cr / CrV, Al / CrV / CrV and the like.

【0028】本発明の磁気記録媒体における磁性層の材
料は特に制限されない。
The material of the magnetic layer in the magnetic recording medium of the present invention is not particularly limited.

【0029】磁性層としては、例えば、Coを主成分と
するCoPt、CoCr、CoNi、CoNiCr、C
oCrTa、CoPtCr、CoNiPtや、CoNi
CrPt、CoNiCrTa、CoCrTaPt、Co
CrPtSiOなどの磁性薄膜が挙げられる。磁性層
は、磁性膜を非磁性膜(例えば、Cr、CrMo、Cr
Vなど)で分割してノイズの低減を図った多層構成(例
えば、CoPtCr/CrMo/CoPtCr、CoC
rTaPt/CrMo/CoCrTaPtなど)として
もよい。
As the magnetic layer, for example, CoPt, CoCr, CoNi, CoNiCr, C
oCrTa, CoPtCr, CoNiPt, CoNi
CrPt, CoNiCrTa, CoCrTaPt, Co
A magnetic thin film such as CrPtSiO may be used. The magnetic layer is made of a non-magnetic film (for example, Cr, CrMo, Cr).
V, etc. to reduce noise (for example, CoPtCr / CrMo / CoPtCr, CoC
rTaPt / CrMo / CoCrTaPt).

【0030】磁気抵抗型ヘッド(MRヘッド)又は大型
磁気抵抗型ヘッド(GMRヘッド)対応の磁性層として
は、Co系合金に、Y、Si、希土類元素、Hf、G
e、Sn、Znから選択される不純物元素、又はこれら
の不純物元素の酸化物を含有させたものなども含まれ
る。
As a magnetic layer corresponding to a magnetoresistive head (MR head) or a large magnetoresistive head (GMR head), Y, Si, rare earth elements, Hf, G
An impurity element selected from e, Sn, and Zn, or an element containing an oxide of these impurity elements is also included.

【0031】また、磁性層としては、上記の他、フェラ
イト系、鉄−希土類系や、SiO2、BNなどからなる
非磁性膜中にFe、Co、FeCo、CoNiPt等の
磁性粒子が分散された構造のグラニュラーなどであって
もよい。また、磁性層は、内面型、垂直型のいずれの記
録形式であってもよい。
As the magnetic layer, in addition to the above, magnetic particles such as Fe, Co, FeCo, and CoNiPt are dispersed in a non-magnetic film made of ferrite, iron-rare earth, SiO 2 , BN, or the like. It may be a granular structure or the like. Further, the magnetic layer may have any of an inner surface type and a perpendicular type recording format.

【0032】本発明の磁気記録媒体における保護層は特
に制限されない。
The protective layer in the magnetic recording medium of the present invention is not particularly limited.

【0033】保護層としては、例えば、Cr膜、Cr合
金膜、カーボン膜、ジルコニア膜、シリカ膜等が挙げら
れる。これらの保護膜は、下地層、磁性層等とともにイ
ンライン型スパッタ装置で連続して形成できる。また、
これらの保護膜は、単層としてもよく、あるいは、同一
又は異種の膜からなる多層構成としてもよい。
Examples of the protective layer include a Cr film, a Cr alloy film, a carbon film, a zirconia film, and a silica film. These protective films can be continuously formed with an underlayer, a magnetic layer, and the like by an in-line type sputtering apparatus. Also,
These protective films may have a single-layer structure or a multilayer structure composed of the same or different films.

【0034】本発明では、上記保護層上に、あるいは上
記保護層に替えて、他の保護層を形成してもよい。例え
ば、上記保護層に替えて、Cr膜の上にテトラアルコキ
シランをアルコール系の溶媒で希釈した中に、コロイダ
ルシリカ微粒子を分散して塗布し、さらに焼成して酸化
ケイ素(SiO2)膜を形成してもよい。
In the present invention, another protective layer may be formed on the protective layer or in place of the protective layer. For example, instead of the above-mentioned protective layer, colloidal silica fine particles are dispersed and applied to a Cr film after diluting tetraalkoxylan with an alcohol-based solvent, and then fired to form a silicon oxide (SiO 2 ) film. It may be formed.

【0035】本発明の磁気記録媒体における潤滑層は特
に制限されない。
The lubricating layer in the magnetic recording medium of the present invention is not particularly limited.

【0036】潤滑層は、例えば、液体潤滑剤であるパー
フロロポリエーテル(PFPE)をフレオン系などの溶
媒で希釈し、媒体表面にディッピング法、スピンコート
法、スプレイ法によって塗布し、必要に応じ加熱処理を
行って形成する。
The lubricating layer is prepared, for example, by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon, and applying the diluent to the medium surface by dipping, spin coating, or spraying. It is formed by performing heat treatment.

【0037】[0037]

【実施例】以下、実施例にもとづき本発明をさらに具体
的に説明する。
EXAMPLES The present invention will be described below more specifically based on examples.

【0038】実施例1 Embodiment 1

【0039】(1)荒ずり工程 まず、ダウンドロー法で形成したシートガラスから、研
削砥石で直径96mmφ、厚さ3mmの円盤状に切り出
したアルミノシリケイトガラスからなるガラス基板を、
比較的粗いダイヤモンド砥石で研削加工して、直径96
mmφ、厚さ1.5mmに成形した。この場合、ダウン
ドロー法の代わりに、溶融ガラスを、上型、下型、胴型
を用いてダイレクト・プレスして、円盤状のガラス体を
得てもよい。又、フロート法で形成しても良い。
(1) Roughing Step First, a glass substrate made of an aluminosilicate glass having a diameter of 96 mmφ and a thickness of 3 mm cut out from a sheet glass formed by a down-draw method with a grinding wheel is used.
Grinding with a relatively rough diamond wheel
It was molded to a diameter of 1.5 mm and a thickness of 1.5 mm. In this case, instead of the downdraw method, the molten glass may be directly pressed using an upper mold, a lower mold, and a body mold to obtain a disk-shaped glass body. Further, it may be formed by a float method.

【0040】なお、アルミノシリケイトガラスとして
は、モル%表示で、SiO2を57〜74%、ZnO2
0〜2.8%、Al23を3〜15%、LiO2を7〜
16%、Na2Oを4〜14%、を主成分として含有す
る化学強化用ガラス(例えば、モル%表示で、Si
2:67.0%、ZnO2:1.0%、Al23:9.
0%、LiO2:12.0%、Na2O:10.0%を主
成分として含有する化学強化用ガラス)を使用した。
As the aluminosilicate glass, in terms of mol%, SiO 2 is 57 to 74%, ZnO 2 is 0 to 2.8%, Al 2 O 3 is 3 to 15%, and LiO 2 is 7 to 74%.
Glass for chemical strengthening containing 16% and 4 to 14% of Na 2 O as main components (for example, Si
O 2 : 67.0%, ZnO 2 : 1.0%, Al 2 O 3 : 9.
Glass for chemical strengthening containing 0%, LiO 2 : 12.0%, and Na 2 O: 10.0% as main components) was used.

【0041】次いで、上記砥石よりも粒度の細かいダイ
ヤモンド砥石で上記ガラス基板の両面を片面ずつ研削加
工した。このときの荷重は100kg程度とした。これ
により、ガラス基板両面の表面粗さをRmax(JIS
B 0601で測定)で10μm程度に仕上げた。
Next, both surfaces of the glass substrate were ground one by one with a diamond grindstone having a finer grain size than the grindstone. The load at this time was about 100 kg. As a result, the surface roughness of both surfaces of the glass substrate can be reduced to Rmax (JIS
B 0601) (about 10 μm).

【0042】次に、円筒状の砥石を用いてガラス基板の
中央部分に孔を開けるとともに、外周端面も研削して直
径を95mmφとした後、外周端面及び内周面に所定の
面取り加工を施した。このときのガラス基板端面の表面
粗さは、Rmaxで4μm程度であった。
Next, a hole is made in the center of the glass substrate using a cylindrical grindstone, and the outer peripheral end surface is also ground to a diameter of 95 mmφ. Then, the outer peripheral end surface and the inner peripheral surface are subjected to predetermined chamfering. did. At this time, the surface roughness of the end face of the glass substrate was about 4 μm in Rmax.

【0043】(2)端面鏡面加工工程 次いで、ブラシ研磨により、ガラス基板を回転させなが
らガラス基板の端面の表面粗さを、Rmaxで1μm、
Raで0.3μm程度に研磨した。
(2) Mirror Processing of End Surface Next, the surface roughness of the end surface of the glass substrate is set to 1 μm in Rmax while rotating the glass substrate by brush polishing.
Polished to about 0.3 μm with Ra.

【0044】上記端面鏡面加工を終えたガラス基板の表
面を水洗浄した。
The surface of the glass substrate which had been subjected to the above-mentioned mirror polishing of the end face was washed with water.

【0045】(3)砂掛け(ラッピング)工程 次に、ガラス基板に砂掛け加工を施した。この砂掛け工
程は、寸法精度及び形状精度の向上を目的としている。
砂掛け加工は、ラッピング装置を用いて行い、砥粒の粒
度を#400、#1000と替えて2回行った。
(3) Sanding (Wrapping) Step Next, the glass substrate was sanded. This sanding step aims at improving dimensional accuracy and shape accuracy.
The sanding process was performed using a lapping device, and was performed twice while changing the grain size of the abrasive grains to # 400 and # 1000.

【0046】詳しくは、はじめに、粒度#400のアル
ミナ砥粒を用い、荷重Lを100kg程度に設定して、
内転ギアと外転ギアを回転させることによって、キャリ
ア内に収納したガラス基板の両面を面精度0〜1μm、
表面粗さ(Rmax)6μm程度にラッピングした。
More specifically, first, a load L was set to about 100 kg using alumina abrasive grains having a grain size of # 400.
By rotating the internal rotation gear and the external rotation gear, both sides of the glass substrate housed in the carrier are surface-accurate 0-1 μm,
Lapping was performed to a surface roughness (Rmax) of about 6 μm.

【0047】次いで、アルミナ砥粒の粒度を#1000
に替えてラッピングを行い、表面粗さ(Rmax)2μ
m程度とした。
Next, the particle size of the alumina abrasive grains was changed to # 1000.
Perform lapping instead of surface roughness (Rmax) 2μ
m.

【0048】上記砂掛け加工を終えたガラス基板を、中
性洗剤、水の各洗浄槽に順次浸漬して、洗浄した。
The glass substrate that had been subjected to the above sanding process was washed by sequentially immersing it in a washing tank of a neutral detergent and water.

【0049】(4)第一研磨工程 次に、第一研磨工程を施した。この第一研磨工程は、上
述した砂掛け工程で残留したキズや歪みの除去を目的と
するもので、研磨装置を用いて行った。
(4) First Polishing Step Next, a first polishing step was performed. This first polishing step is intended to remove scratches and distortion remaining in the above sanding step, and was performed using a polishing apparatus.

【0050】詳しくは、ポリシャ(研磨粉)として硬質
ポリシャ(セリウムパッドMHC15:スピードファム
社製)を用い、以下の研磨条件で第一研磨工程を実施し
た。
More specifically, the first polishing step was performed under the following polishing conditions using a hard polisher (cerium pad MHC15: manufactured by Speed Fam) as a polisher (polishing powder).

【0051】研磨液:酸化セリウム+水 荷重:300g/cm2(L=238kg) 研磨時間:15分 除去量:30μm 下定盤回転数:40 rpm 上定盤回転数:35 rpm 内ギア回転数:14 rpm 外ギア回転数:29 rpmPolishing liquid: cerium oxide + water Load: 300 g / cm 2 (L = 238 kg) Polishing time: 15 minutes Removal amount: 30 μm Lower platen rotation speed: 40 rpm Upper platen rotation speed: 35 rpm Gear rotation speed in the inner part: 14 rpm Outer gear rotation speed: 29 rpm

【0052】上記第一研磨工程を終えたガラス基板を、
中性洗剤、純水、純水、IPA(イソプロピルアルコー
ル)、IPA(蒸気乾燥)の各洗浄槽に順次浸漬して、
洗浄した。
The glass substrate after the first polishing step is
Immerse in each washing tank of neutral detergent, pure water, pure water, IPA (isopropyl alcohol), IPA (steam drying) sequentially,
Washed.

【0053】(5)第二研磨工程 次に、第一研磨工程で使用した研磨装置を用い、ポリシ
ャを硬質ポリシャから軟質ポリシャ(ポリラックス:ス
ピードファム社製)に替えて、第二研磨工程を実施し
た。研磨条件は、荷重を100g/cm2、研磨時間を
5分、除去量を5μmとしたこと以外は、第一研磨工程
と同様とした。
(5) Second Polishing Step Next, using the polishing apparatus used in the first polishing step, the polisher was changed from a hard polisher to a soft polisher (Polyak: manufactured by Speed Fam), and the second polishing step was performed. Carried out. The polishing conditions were the same as in the first polishing step, except that the load was 100 g / cm 2 , the polishing time was 5 minutes, and the removal amount was 5 μm.

【0054】上記第二研磨工程を終えたガラス基板を、
中性洗剤、中性洗剤、純水、純水、IPA(イソプロピ
ルアルコール)、IPA(蒸気乾燥)の各洗浄槽に順次
浸漬して、洗浄した。なお、各洗浄槽には超音波を印加
した。
The glass substrate after the second polishing step is
Washing was performed by sequentially immersing in a washing tank of a neutral detergent, a neutral detergent, pure water, pure water, IPA (isopropyl alcohol), and IPA (steam drying). In addition, ultrasonic waves were applied to each cleaning tank.

【0055】(6)化学強化工程 次に、上記研削、研磨、洗浄工程を終えたガラス基板に
化学強化を施した。化学強化は、化学強化処理液を化学
強化処理槽に入れ、保持部材に保持したガラス基板を化
学強化処理液に浸漬して行う。尚、ガラス基板の保持部
材は、ガラス基板の配列方向に等間隔でV溝を複数個形
成した3本の支柱を、その両端面で連結部材で連結して
形成されている。複数のガラス基板は、各ガラス基板が
3本の支柱の同一平面内にあるV溝によって3点支持さ
れて保持され、支柱の延在する方向に複数枚配列されて
いる。
(6) Chemical Strengthening Step Next, the glass substrate after the grinding, polishing and cleaning steps was chemically strengthened. The chemical strengthening is performed by putting the chemical strengthening treatment liquid into the chemical strengthening treatment tank and immersing the glass substrate held by the holding member in the chemical strengthening treatment liquid. In addition, the holding member of the glass substrate is formed by connecting three pillars having a plurality of V-grooves formed at equal intervals in the arrangement direction of the glass substrates by connecting members at both end surfaces thereof. The plurality of glass substrates are supported and held at three points by V-grooves in the same plane of the three columns, and are arranged in the direction in which the columns extend.

【0056】本実施例の保持部材の各支柱と連結部材は
高温域での耐食性に優れたオーステナイト系ステンレス
合金であるSUS316で構成している。又、化学強化
処理槽は,オーステナイト系ステンレス合金のSUS3
04で構成している。化学強化処理槽と保持手段の材料
は、同種でも異種でも良い。他のステンレス合金として
は、例えば、SUS316Lなどが好適である。化学強
化の具体的方法は、硝酸カリウム(60%)と硝酸ナト
リウム(40%)を混合した化学強化溶液を用意し、こ
の化学強化溶液を400℃に加熱し、300℃に予熱さ
れた洗浄済みのガラス基板を約3時間浸漬して行った。
この浸漬の際に、ガラス基板の表面全体が化学強化され
るようにするため、複数のガラス基板が端面で保持され
るように保持部材で保持して行った。
Each support and connecting member of the holding member of this embodiment is made of SUS316, which is an austenitic stainless steel alloy having excellent corrosion resistance in a high temperature range. The chemical strengthening treatment tank is made of austenitic stainless alloy SUS3.
04. The materials of the chemical strengthening treatment tank and the holding means may be the same or different. As another stainless steel alloy, for example, SUS316L is suitable. A specific method of chemical strengthening is to prepare a chemical strengthening solution in which potassium nitrate (60%) and sodium nitrate (40%) are mixed, and heat the chemical strengthening solution to 400 ° C., and wash the pre-heated 300 ° C. The glass substrate was immersed for about 3 hours.
At the time of this immersion, in order to chemically strengthen the entire surface of the glass substrate, a plurality of glass substrates were held by holding members so as to be held at end faces.

【0057】このように、化学強化溶液に浸漬処理する
ことによって、ガラス基板表層のリチウムイオン、ナト
リウムイオンは、化学強化溶液中のナトリウムイオン、
カリウムイオンにそれぞれ置換されガラス基板は強化さ
れる。
As described above, by performing the immersion treatment in the chemical strengthening solution, the lithium ions and the sodium ions on the surface layer of the glass substrate become the sodium ions and the sodium ions in the chemical strengthening solution.
The glass substrate is strengthened by being respectively substituted by potassium ions.

【0058】ガラス基板の表層に形成された圧縮応力層
の厚さは、約100〜200μmであった。又、化学強
化の際、高温の化学強化処理液に接触する化学強化処理
槽とガラス基板の保持部材を化学的耐久性に優れたオー
ステナイト系ステンレス合金で構成したので、化学強化
の際、鉄粉、クロム等の金属片や金属酸化物がガラス基
板に付着することを防止できた。
The thickness of the compressive stress layer formed on the surface of the glass substrate was about 100 to 200 μm. In addition, during chemical strengthening, the chemical strengthening treatment tank and the holding member for the glass substrate that are in contact with the high-temperature chemical strengthening treatment solution are made of an austenitic stainless steel alloy with excellent chemical durability. Thus, it was possible to prevent metal pieces such as chromium and metal oxides from adhering to the glass substrate.

【0059】上記化学強化を終えたガラス基板を、20
℃の水槽に浸漬して急冷し約10分間維持した。
The glass substrate which has been chemically strengthened is
It was immersed in a water bath at a temperature of 10 ° C., rapidly cooled, and maintained for about 10 minutes.

【0060】上記急冷を終えたガラス基板を、約40℃
に加熱した硫酸に浸漬し、超音波をかけながら洗浄を行
った。
The quenched glass substrate is heated to about 40 ° C.
The substrate was immersed in heated sulfuric acid and washed while applying ultrasonic waves.

【0061】上記の工程を経て得られたガラス基板の主
表面の表面粗さRaは0.5〜1nmであった。さら
に、ガラス表面を精密検査したところサーマル・アスフ
ェリティーの原因となるパーティクルは認められなかっ
た。特に3〜5ミクロン以上の微小鉄粉は全く認められ
なかった。
The surface roughness Ra of the main surface of the glass substrate obtained through the above steps was 0.5 to 1 nm. Further, upon close inspection of the glass surface, no particles causing thermal asperity were found. In particular, no fine iron powder of 3 to 5 microns or more was observed at all.

【0062】(7)磁気ディスク製造工程 上述した工程を経て得られた磁気ディスク用ガラス基板
の両面に、インライン式のスパッタリング装置を用い
て、AlNのスパッタによるテクスチャー層、Cr下地
層、CrMo下地層、CoPtCrTa磁性層、C保護
層を順次成膜して磁気ディスクを得た。
(7) Magnetic Disk Manufacturing Process A texture layer, a Cr underlayer, and a CrMo underlayer are formed on both surfaces of the magnetic disk glass substrate obtained through the above-described steps by using an in-line type sputtering apparatus by sputtering AlN. , A CoPtCrTa magnetic layer and a C protective layer were sequentially formed to obtain a magnetic disk.

【0063】得られた磁気ディスクについてグライドテ
ストを実施したところ、ヒット(ヘッドが磁気ディスク
表面の突起にかすること)やクラッシュ(ヘッドが磁気
ディスク表面の突起に衝突すること)は認められなかっ
た。また、サーマル・アスフェリティーの原因となるパ
ーティクルによって、磁性層等の膜に欠陥が発生してい
ないことも確認できた。
A glide test was performed on the obtained magnetic disk. As a result, no hit (the head touches a protrusion on the surface of the magnetic disk) or crash (the head collides with the protrusion on the surface of the magnetic disk) was not recognized. . In addition, it was confirmed that no defect was generated in the film such as the magnetic layer due to the particles causing the thermal asperity.

【0064】なお、本発明のように化学強化処理液に接
触する槽や保持部材を耐食性の高いステンレス合金で構
成した実施例と、SUS430(フェライト系ステンレ
ス合金)のように耐食性がさほど高くないステンレス合
金で保持部材や槽を構成した比較例とを比較したとこ
ろ、比較例のものは、ガラス基板の表面上に10ミクロ
ン〜80ミクロンの微小鉄粉が数多く認められた。この
ように本実施例のほうが鉄等の異物が顕著に少なかっ
た。
The embodiment in which the tank and the holding member that come into contact with the chemical strengthening treatment liquid are made of a stainless steel having high corrosion resistance as in the present invention, and the stainless steel whose corrosion resistance is not so high like SUS430 (ferritic stainless alloy). When a comparison was made between the alloy and the comparative example in which the holding member and the tank were formed, in the comparative example, many fine iron powders of 10 μm to 80 μm were found on the surface of the glass substrate. As described above, in this example, the amount of foreign matters such as iron was significantly reduced.

【0065】また、グライドテストを終えた本実施例の
磁気ディスクについて、磁気抵抗型ヘッドで再生試験を
行ったが、複数のサンプル(500枚)の全数について
サーマル・アスフェリティーによる再生の誤動作は認め
られなかった。
A reproduction test was performed on the magnetic disk of this embodiment after the glide test with a magnetoresistive head. However, a malfunction of reproduction due to thermal asperity was observed for all of a plurality of samples (500 sheets). I was not able to admit.

【0066】実施例2〜3 アルミノシリケートガラスの代わりにソーダライムガラ
ス(実施例2)、ソーダアルミノケイ酸ガラス(実施例
3)を用いたこと以外は実施例1と同様にして、磁気デ
ィスク用ガラス基板及び磁気ディスクを得た。
[0066] soda-lime glass in place of Examples 2-3 aluminosilicate glass (Example 2), except for the use of soda aluminosilicate glass (Example 3) in the same manner as in Example 1, a glass for a magnetic disk A substrate and a magnetic disk were obtained.

【0067】その結果、実施例1と同様に表面に鉄粉等
の金属片がない化学強化ガラスが得られた。
As a result, similarly to Example 1, a chemically strengthened glass having no metal pieces such as iron powder on the surface was obtained.

【0068】次に、化学強化槽と保持部材の材料をオー
ステナイト系ステンレス合金から、マルテンサイト系ス
テンレス合金に変えて実施例1〜3と同じ硝種のガラス
基板の化学強化を行ったが、オーステナイト系ステンレ
ス合金の場合と同様の効果が得られた。
Next, the same glass type glass substrate as in Examples 1 to 3 was chemically strengthened by changing the material of the chemical strengthening tank and the holding member from an austenitic stainless alloy to a martensitic stainless alloy. The same effect as in the case of the stainless alloy was obtained.

【0069】実施例4 実施例1で得られた磁気ディスク用ガラス基板の両面
に、Al(膜厚50オングストローム)/Cr(100
0オングストローム)/CrMo(100オングストロ
ーム)からなる下地層、CoPtCr(120オングス
トローム)/CrMo(50オングストローム)/Co
PtCr(120オングストローム)からなる磁性層、
Cr(50オングストローム)保護層をインライン型ス
パッタ装置で形成した。
Example 4 Al (50 angstrom film thickness) / Cr (100
0 Å / CrMo (100 Å), CoPtCr (120 Å) / CrMo (50 Å) / Co
A magnetic layer made of PtCr (120 Å),
A Cr (50 Å) protective layer was formed by an in-line type sputtering apparatus.

【0070】上記基板を、シリカ微粒子(粒経100オ
ングストローム)を分散した有機ケイ素化合物溶液(水
とIPAとテトラエトキシシランとの混合液)に浸し、
焼成することによってSiO2からなるテクスチャー機
能を持った保護層を形成し、さらに、この保護層上をパ
ーフロロポリエーテルからなる潤滑剤でディップ処理し
て潤滑層を形成して、MRヘッド用磁気ディスクを得
た。
The above substrate is immersed in an organic silicon compound solution (a mixed solution of water, IPA and tetraethoxysilane) in which fine silica particles (particle size: 100 Å) are dispersed,
A protective layer having a texture function made of SiO 2 is formed by firing, and a dip treatment is performed on the protective layer with a lubricant made of perfluoropolyether to form a lubricating layer. Got a disc.

【0071】得られた磁気ディスクについてグライドテ
ストを実施したところ、ヒットやクラッシュは認められ
なかった。また、磁性層等の膜に欠陥が発生していない
ことも確認できた。さらに、磁気抵抗型ヘッドによる再
生試験の結果、サーマル・アスフェリティーによる再生
の誤動作は認められなかった。
When a glide test was conducted on the obtained magnetic disk, no hit or crash was recognized. It was also confirmed that no defect occurred in the film such as the magnetic layer. Furthermore, as a result of a reproduction test using a magnetoresistive head, no reproduction malfunction due to thermal asperity was recognized.

【0072】実施例5 下地層をAl/Cr/Crとし、磁性層をCoNiCr
Taとしたこと以外は実施例4と同様にして薄膜ヘッド
用磁気ディスクを得た。
Example 5 The underlayer was made of Al / Cr / Cr, and the magnetic layer was made of CoNiCr.
A magnetic disk for a thin film head was obtained in the same manner as in Example 4 except that Ta was used.

【0073】上記磁気ディスクについて実施例4と同様
のことが確認された。
The same thing as Example 4 was confirmed for the above magnetic disk.

【0074】以上好ましい実施例を挙げて本発明を説明
したが、本発明は必ずしも上記実施例に限定されるもの
ではない。
Although the present invention has been described with reference to the preferred embodiments, the present invention is not necessarily limited to the above embodiments.

【0075】例えば、ガラス基板の種類や磁性層の種類
は実施例のものに限定されない。
For example, the type of the glass substrate and the type of the magnetic layer are not limited to those of the embodiment.

【0076】[0076]

【発明の効果】以上説明したように本発明では、ガラス
基板上に金属又は金属酸化物等の異物が付着しないの
で、ヘッドクラッシュや、サーマル・アスフェリティー
の原因となるパーティクルが発生することがなく、サー
マル・アスフェリティーによる再生機能の低下を防止す
ることができる。
As described above, according to the present invention, since particles such as metal or metal oxide do not adhere to the glass substrate, particles which cause head crash or thermal asperity may be generated. In addition, it is possible to prevent the reproduction function from deteriorating due to thermal asperity.

【0077】また、サーマル・アスフェリティーの原因
となるパーティクルに起因する不良を回避でき、より高
品質の磁気記録媒体が高歩留まりで得られる。
Further, it is possible to avoid defects caused by particles that cause thermal asperity, and to obtain a higher quality magnetic recording medium with a higher yield.

フロントページの続き (58)調査した分野(Int.Cl.7,DB名) G11B 5/84 B01J 19/00 C03C 21/00 C22C 38/00 Continuation of the front page (58) Field surveyed (Int. Cl. 7 , DB name) G11B 5/84 B01J 19/00 C03C 21/00 C22C 38/00

Claims (7)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 保持手段に保持されたガラス基板を化学
強化処理液に接触させることにより、ガラス基板の中に
含まれる一部のイオンを、そのイオンより大きなイオン
径の処理液中のイオンに置換することによりガラス基板
を強化する化学強化工程を含む磁気抵抗ヘッド用磁気デ
ィスク用ガラス基板の製造方法において、 前記化学強化処理液を収納する化学強化処理槽の少なく
とも処理液と接する壁面及び/又はガラス基板を保持す
る保持手段を、化学強化処理液の加熱温度の高温域で
属片の発塵を防止できる耐食性を有するステンレス合金
で構成することを特徴とする磁気抵抗ヘッド用磁気ディ
スク用ガラス基板の製造方法。
1. By contacting a glass substrate held by a holding means with a chemical strengthening treatment liquid, some ions contained in the glass substrate are converted into ions in the treatment liquid having an ion diameter larger than that of the glass substrate. Magnetic head for magnetoresistive head including chemical strengthening process to strengthen glass substrate by replacement
In a method for manufacturing a disk substrate for a disk , at least a wall surface of a chemical strengthening treatment tank containing the chemical strengthening treatment solution and / or a holding means for holding the glass substrate is held in a high temperature range of a heating temperature of the chemical strengthening treatment solution. In gold
A magnetic disk for a magnetoresistive head , comprising a corrosion-resistant stainless steel alloy capable of preventing dust generation of metal fragments.
A method of manufacturing a glass substrate for a disc .
【請求項2】 保持手段に保持されたガラス基板を化学
強化処理液に接触させることにより、ガラス基板の中に
含まれる一部のイオンを、そのイオンより大きなイオン
径の処理液中のイオンに置換することによりガラス基板
を強化する化学強化工程を含む磁気抵抗ヘッド用磁気デ
ィスク用ガラス基板の製造方法において、前記化学強化処理液を収納する化学強化処理槽の少なく
とも処理液と接する壁面及び/又はガラス基板を保持す
る保持手段を、化学強化処理液の加熱温度の高温域で金
属片の発塵を防止できる耐食性を有するステンレス合金
であって、フェライト系ステンレス合金を除くステンレ
ス合金で構成することを特徴とする磁気抵抗ヘッド用磁
気ディスク用ガラス基板の製造方法
2. A method in which a glass substrate held by a holding means is brought into contact with a chemical strengthening treatment liquid to convert some of the ions contained in the glass substrate into ions in the treatment liquid having an ion diameter larger than that of the glass substrate. In the method for manufacturing a magnetic disk glass substrate for a magnetoresistive head including a chemical strengthening step of strengthening the glass substrate by replacing, the number of chemical strengthening treatment tanks containing the chemical strengthening treatment liquid is reduced.
Hold the wall and / or glass substrate in contact with the processing liquid
The holding means in the high temperature range of the heating temperature of the chemical strengthening treatment liquid.
Corrosion-resistant stainless steel alloy that can prevent dust generation from metal fragments
Stainless steel excluding ferritic stainless steel alloy
Magnetic material for a magnetoresistive head, comprising a magnetic alloy
A method for manufacturing a glass substrate for a gas disk .
【請求項3】 保持手段に保持されたガラス基板を化学
強化処理液に接触させることにより、ガラス基板の中に
含まれる一部のイオンを、そのイオンより大きなイオン
径の処理液中のイオンに置換することによりガラス基板
を強化する化学強化工程を含む磁気抵抗ヘッド用磁気デ
ィスク用ガラス基板の製造方法において、前記化学強化処理液を収納する化学強化処理槽の少なく
とも処理液と接する壁面及びガラス基板を保持する保持
手段を、化学強化処理液の加熱温度の高温域で金属片の
発塵を防止できる耐食性を有するステンレス合金で構成
することを特徴とする磁気抵抗ヘッド用磁気ディスク用
ガラス基板の製造方法
3. A glass substrate held by a holding means is brought into contact with a chemical strengthening treatment liquid to convert some of the ions contained in the glass substrate into ions in the treatment liquid having an ion diameter larger than that of the glass substrate. In the method for manufacturing a magnetic disk glass substrate for a magnetoresistive head including a chemical strengthening step of strengthening the glass substrate by replacing, the number of chemical strengthening treatment tanks containing the chemical strengthening treatment liquid is reduced.
Holds both the wall surface and the glass substrate in contact with the processing liquid
The means must be used to remove metal fragments in the high
Constructed of corrosion-resistant stainless steel alloy that can prevent dust generation
For magnetic disks for magnetoresistive heads
A method for manufacturing a glass substrate .
【請求項4】 保持手段に保持されたガラス基板を化学
強化処理液に接触させることにより、ガラス基板の中に
含まれる一部のイオンを、そのイオンより大きなイオン
径の処理液中のイオンに置換することによりガラス基板
を強化する化学強化工程を含む磁気抵抗ヘッド用磁気デ
ィスク用ガラス基板の製造方法において、 前記化学強化処理液を収納する化学強化処理槽の少なく
とも処理液と接する壁面及び/又はガラス基板を保持す
る保持手段を、マルテンサイト系又はオーステナイト系
のステンレス合金から構成することを特徴とする磁気抵
抗ヘッド用磁気ディスク用ガラス基板の製造方法。
4. By contacting the glass substrate held by the holding means with the chemical strengthening treatment liquid, some ions contained in the glass substrate are converted into ions in the treatment liquid having an ion diameter larger than that of the glass substrate. Magnetic head for magnetoresistive head including chemical strengthening process to strengthen glass substrate by replacement
In the method of manufacturing a glass substrate for a disc, the holding means for holding at least the wall surface and / or the glass substrate of the chemical strengthening treatment tank that accommodates the chemical strengthening treatment solution and / or the glass substrate is made of a martensitic or austenitic stainless alloy. Magnetic resistor
A method of manufacturing a glass substrate for a magnetic disk for an anti-head .
【請求項5】 保持手段に保持されたガラス基板を化学
強化処理液に接触させることにより、ガラス基板の中に
含まれる一部のイオンを、そのイオンより大きなイオン
径の処理液中のイオンに置換することによりガラス基板
を強化する化学強化工程を含む磁気抵抗ヘッド用磁気デ
ィスク用ガラス基板の製造方法において、前記化学強化処理液を収納する化学強化処理槽の少なく
とも処理液と接する壁面及びガラス基板を保持する保持
手段を、マルテンサイト系又はオーステナイト系のステ
ンレス合金から構成することを特徴とする磁気抵抗ヘッ
ド用磁気ディスク用ガラス基板の製造方法
5. By contacting the glass substrate held by the holding means with the chemical strengthening treatment solution, some ions contained in the glass substrate are converted into ions in the treatment solution having an ion diameter larger than the ions. In the method for manufacturing a magnetic disk glass substrate for a magnetoresistive head including a chemical strengthening step of strengthening the glass substrate by replacing, the number of chemical strengthening treatment tanks containing the chemical strengthening treatment liquid is reduced.
Holds both the wall surface and the glass substrate in contact with the processing liquid
The means should be a martensitic or austenitic stainless steel.
A magnetoresistive head characterized by being made of a stainless steel alloy.
Of manufacturing a glass substrate for a magnetic disk .
【請求項6】 前記化学強化処理槽あるいは前記ガラス
基板を保持する保持手段の全体をマルテンサイト系又は
オーステナイト系ステンレス合金で構成することを特徴
とする請求項5記載の磁気抵抗ヘッド用磁気ディスク用
ガラス基板の製造方法。
6. The magnetic disk for a magnetoresistive head according to claim 5, wherein the whole of the chemical strengthening treatment tank or the holding means for holding the glass substrate is made of a martensitic or austenitic stainless steel alloy. A method for manufacturing a glass substrate.
【請求項7】 請求項1乃至6のいずれかに記載の製造
方法によって得られたガラス基板上に少なくとも磁性層
を形成することを特徴とする磁気抵抗ヘッド用磁気ディ
スクの製造方法。
7. A method for manufacturing a magnetic disk for a magnetoresistive head, comprising forming at least a magnetic layer on a glass substrate obtained by the method according to claim 1.
JP35754496A 1996-12-30 1996-12-30 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium Expired - Lifetime JP3172107B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP35754496A JP3172107B2 (en) 1996-12-30 1996-12-30 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium
MYPI97006400A MY123825A (en) 1996-12-30 1997-12-29 Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate.
US08/999,479 US6119483A (en) 1996-12-30 1997-12-29 Process for producing glass substrate for information recording medium
US09/571,049 US6427489B1 (en) 1996-12-30 2000-05-15 Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate
US09/881,627 US6430965B2 (en) 1996-12-30 2001-06-14 Process for producing glass substrate for information recording medium and process for producing recording medium using said glass substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35754496A JP3172107B2 (en) 1996-12-30 1996-12-30 Method for manufacturing glass substrate for information recording medium and method for manufacturing information recording medium

Publications (2)

Publication Number Publication Date
JPH10198954A JPH10198954A (en) 1998-07-31
JP3172107B2 true JP3172107B2 (en) 2001-06-04

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Country Link
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008068997A1 (en) 2006-12-04 2008-06-12 Konica Minolta Opto, Inc. Process for producing glass substrate for recording medium, glass substrate for recording medium, recording medium, and holding jig

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