JP2013020347A - Touch panel and touch panel manufacturing method - Google Patents

Touch panel and touch panel manufacturing method Download PDF

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JP2013020347A
JP2013020347A JP2011151794A JP2011151794A JP2013020347A JP 2013020347 A JP2013020347 A JP 2013020347A JP 2011151794 A JP2011151794 A JP 2011151794A JP 2011151794 A JP2011151794 A JP 2011151794A JP 2013020347 A JP2013020347 A JP 2013020347A
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touch panel
cover sheet
wiring
jumper
film
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Michi Ogata
道 尾形
Hideki Cho
英樹 張
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a projection-type capacitive touch panel, through easy manufacturing processes, that is used by being overlaid on a display screen of a flat-panel display device, has a transparent cover sheet integrated therewith, and is excellent in performance.SOLUTION: A touch panel integrated with a transparent cover sheet 2 is provided on a visible side of a flat-panel display device with a sensor electrode side facing the flat-panel display device. A touch panel 1 includes: plural transparent conductive film patterns serving as sensor electrodes 3 disposed two-dimensionally; jumper parts 4 electrically connecting the transparent conductive film patterns with one another; insulation parts 5 for preventing electrical short circuits between layers at the jumper parts; and wiring parts 6 for guiding wiring from the sensor electrodes to a terminal part. The jumper parts and the wiring parts are configured by laminating plural layers including a good conductor metal layer 8 and having the same configuration and by lowering the reflectivity of the interface between the transparent cover sheet and the plural layers.

Description

本発明は、カバーシートと一体化して形成したタッチパネルに関する。   The present invention relates to a touch panel formed integrally with a cover sheet.

タッチパネルは、表示画面上の透明な面を操作者が指またはペンでタッチすることにより、接触した位置を検出してデータ入力できる入力装置の構成要素となるものであって、キー入力より直接的、かつ直感的な入力を可能とする。このため、近年、携帯電話機や、携帯情報端末、カーナビゲーションシステムを始め、様々な電子機器の操作部に多用されるようになってきた。   The touch panel is a component of an input device that allows the operator to touch a transparent surface on the display screen with a finger or a pen to detect a touched position and input data. Intuitive input is possible. For this reason, in recent years, it has come to be frequently used in operation units of various electronic devices such as mobile phones, portable information terminals, and car navigation systems.

前記タッチパネルは、液晶パネル等の平面型表示装置の表示画面上に、入力装置として貼り合わせて使用することができる。このようなタッチパネルは、入力指示等に利用する定型画像や額縁等の装飾と表面保護とを兼ねて加飾ガラスを用いた透明カバーシートに合体したものが多く、平面型表示装置の表示画面上に貼り合わせるに当たって、優れた表示品位を確保するための工夫がなされてきた(特許文献1および特許文献2参照)。   The touch panel can be used as an input device on a display screen of a flat display device such as a liquid crystal panel. Many of such touch panels are combined with a transparent cover sheet using decorative glass, which is used for input instructions, etc., and is used for decoration and surface protection such as a frame and on the display screen of a flat display device. At the time of bonding to each other, contrivances have been made to ensure excellent display quality (see Patent Document 1 and Patent Document 2).

なお、タッチパネルの検出方式には、抵抗式、静電容量式、超音波式、光学式等多種あり、その構造は多様となる。抵抗式は、製造コストと検出精度の点で比較的優れており、広く使用されているが、2枚の透明導電膜の間に空気層を設ける構造を有する抵抗式タッチパネルは、光学特性(透過率)が低く、耐久性や動作温度特性においても充分とは言えないため、改良が求められてきた。また、可動部分を有しない静電容量式タッチパネルは、光学特性(透過率)が高く、耐久性や動作温度特性においても抵抗式より優れているため、特に車載用を始めとする高信頼性用途に向けて開発が進んでいる。   There are various touch panel detection methods such as a resistance type, a capacitance type, an ultrasonic type, and an optical type, and the structures thereof are various. The resistance type is relatively excellent in terms of manufacturing cost and detection accuracy, and is widely used. However, a resistance type touch panel having a structure in which an air layer is provided between two transparent conductive films has optical characteristics (transmission). However, the durability and the operating temperature characteristics are not sufficient, so that improvement has been demanded. Capacitive touch panels that do not have moving parts have high optical characteristics (transmittance) and superior durability and operating temperature characteristics compared to resistance types. Development is progressing toward

静電容量式タッチパネルは、表面型と投影型とに大別でき、10型(画面対角25.4cmサイズ)以上の大型品に表面型が、携帯機器向けの6型以下の小型品に投影型が使われることが多い。静電容量式タッチパネル用の電極板として、複雑なパターンが不要で構造が単純な表面型は、透明基板と透明導電膜と簡単な端子電極パターンと絶縁膜とから成り、大型化し易いが、2点以上の接触点を同時に検知することは困難である。一方、静電容量式タッチパネル用の電極板の構造が、透明基板に第一の透明電極パターン層と第一の絶縁層と第二の透明電極パターン層と端子電極となる金属電極パターン層と第二の絶縁層との積層構造で、各層が一般にこの順に形成される投影型もある。投影型は、構造が複雑になり、小型用に適するが、2点以上の接触点を同時に検知することが可能である。   Capacitive touch panels can be broadly classified into surface types and projection types. Surface types can be projected onto large items of size 10 and above (screen diagonal 25.4 cm size) or larger, and can be projected onto small items of size 6 or less for portable devices. A type is often used. As an electrode plate for a capacitive touch panel, a surface type that does not require a complicated pattern and has a simple structure is composed of a transparent substrate, a transparent conductive film, a simple terminal electrode pattern, and an insulating film. It is difficult to simultaneously detect contact points that are greater than or equal to a point. On the other hand, the structure of the electrode plate for the capacitive touch panel is such that the first transparent electrode pattern layer, the first insulating layer, the second transparent electrode pattern layer, and the metal electrode pattern layer serving as the terminal electrode are formed on the transparent substrate. There is also a projection type in which each layer is generally formed in this order in a laminated structure with two insulating layers. The projection type has a complicated structure and is suitable for a small size, but can detect two or more contact points simultaneously.

また、投影型の静電容量式タッチパネルを平面型表示装置の表示画面上に重ねて使用する形態は、図3のタッチパネル付き平面型表示装置の構成模式図に示すとおり、図3(a)のタッチパネル独立型とは別に、図3(b)のカバーガラス一体型もあり、後者は、簡易な構成により全体を薄型化することができる。すなわち、図3(a)では、液晶23、TFT素子基板22、カラーフィルタ基板24と、偏光板21、25とからなる平面型表示装置の表示面側にエアギャップ26を介して、独立型のタッチパネル12を貼り合わせ、さらにその前面に額縁16等の加飾パターンを有して表面を保護するためのカバーガラス(前面板)15に代表される透明カバーシートを設ける。
一方、図3(b)に示すカバーガラス一体型では、前者と同様の構成からなる平面型表示装置の表示面側に同様のエアギャップ26を介して、カバーガラス一体型タッチパネル13を貼り合わせる。なお、タッチパネルを構成する電極や端子、配線等のパターンの向きは、パターンを直接支持する基板の位置が、図3(a)と(b)とでは逆の関係になるので、視認側10からの向きが反対になることに留意する。
Moreover, as shown in the schematic diagram of the configuration of the flat display device with a touch panel in FIG. 3, the form in which the projected capacitive touch panel is used on the display screen of the flat display device is as shown in FIG. Apart from the touch panel independent type, there is also a cover glass integrated type shown in FIG. 3B, and the latter can be thinned as a whole with a simple configuration. That is, in FIG. 3A, an independent type is provided on the display surface side of the flat display device including the liquid crystal 23, the TFT element substrate 22, the color filter substrate 24, and the polarizing plates 21 and 25 via the air gap 26. The touch panel 12 is bonded, and a transparent cover sheet represented by a cover glass (front plate) 15 for providing a decorative pattern such as a frame 16 on the front surface to protect the surface is provided.
On the other hand, in the cover glass integrated type shown in FIG. 3B, the cover glass integrated touch panel 13 is bonded to the display surface side of the flat display device having the same configuration as the former through the same air gap 26. In addition, since the position of the board | substrate which directly supports a pattern has the reverse relationship in FIG. 3A and FIG. Note that the direction of is opposite.

投影型の静電容量式タッチパネルの電極構造は、簡略化するための改良が進み、図2(a)のカバーガラス一体型で代表される透明カバーシート一体型の例で示すように、透明カバーシート2の同一平面上に2次元配置したセンサ電極3である複数の透明導電膜パターンと、透明導電膜パターン間を電気的に接続するジャンパ部41と、ジャンパ部での層間の電気的短絡を防ぐ絶縁部5と、センサ電極から配線を導いて端子部に至る配線部61とから構成されるようになった。上記構成部分の内、平面型表示装置の表示画面の有効領域に重ねて使用するタッチパネルの操作平面領域は、できるだけ透明であることが望ましいので、前記ジャンパ部41と絶縁部5には透明材料を用いる。例えば、ジャンパ部41をセンサ電極3と同じITO(インジウム錫酸化物)等の透明導電膜を用い、透明絶縁部形成後に別途形成する。一方、表示有効領域外に配線を導いて端子部に至る配線部は、透明性より導電性を重視するので、ITOより導電性の良好な金属材料を用いる。具体的には、透明カバーシート2の表面から順に、モリブデン膜71/アルミニウム膜81/モリブデン膜91の3層構成からなる薄膜積層材料を使用する。   The electrode structure of the projected capacitive touch panel has been improved for simplification. As shown in the example of the transparent cover sheet integrated type represented by the cover glass integrated type in FIG. A plurality of transparent conductive film patterns which are two-dimensionally arranged sensor electrodes 3 on the same plane of the sheet 2, a jumper portion 41 for electrically connecting the transparent conductive film patterns, and an electrical short circuit between the layers at the jumper portion The insulating part 5 for preventing and the wiring part 61 that leads the wiring from the sensor electrode to the terminal part are configured. Of the above components, the operation plane area of the touch panel used over the effective area of the display screen of the flat display device is preferably as transparent as possible. Therefore, a transparent material is used for the jumper portion 41 and the insulating portion 5. Use. For example, the jumper portion 41 is formed separately using a transparent conductive film such as ITO (indium tin oxide), which is the same as the sensor electrode 3, after the transparent insulating portion is formed. On the other hand, since the wiring part leading to the terminal part outside the effective display area and reaching the terminal part places importance on conductivity rather than transparency, a metal material having better conductivity than ITO is used. Specifically, a thin film laminated material having a three-layer structure of molybdenum film 71 / aluminum film 81 / molybdenum film 91 is used in order from the surface of the transparent cover sheet 2.

前記端子部や端子部に至る配線部を構成するモリブデン膜/アルミニウム膜/モリブデン膜の3層構成を図2(b)に示す。平面型表示装置の表示画面に相対して設けることになる予定の、カバーガラスを用いることの多い透明カバーシートの表示装置側にあたる片側表面上に、透明カバーシートと2層目の金属との密着性を向上し、薄膜としての各種環境への耐性を補強する保護金属層としての下層モリブデン膜71を1層目とし、導電性が良好で微細パターニングに適したアルミニウム膜81を2層目とし、機械的強度の向上と各種環境への耐性を補強する保護金属層としての最上層モリブデン膜91を3層目として積層し、フォトリソグラフィー法によるレジストパターン形成とエッチングにより配線パターンを形成する。   FIG. 2B shows a three-layer structure of molybdenum film / aluminum film / molybdenum film constituting the terminal part and the wiring part leading to the terminal part. Adhesion between the transparent cover sheet and the second layer of metal on the surface of one side corresponding to the display device side of the transparent cover sheet, which is often used as a cover glass, which is to be provided relative to the display screen of the flat display device The lower layer molybdenum film 71 as a protective metal layer that improves the properties and reinforces the resistance to various environments as a thin film is the first layer, the aluminum film 81 that has good conductivity and is suitable for fine patterning is the second layer, The uppermost molybdenum film 91 as a protective metal layer that reinforces mechanical strength and resistance to various environments is laminated as the third layer, and a wiring pattern is formed by forming a resist pattern by photolithography and etching.

特開2007−178758号公報JP 2007-178758 A 特開2009−069321号公報JP 2009-069321 A

前述のように、静電容量式タッチパネルにおいて、電極構造を簡略化するための改良を施したり、タッチパネル一体型として全体の簡略化を図る等により、良好な性能のタッチパネルを簡単な製造工程で作るための技術が進展してきたが、同一平面上に規則的に配置するセンサ電極を立体的につなぐための絶縁部とジャンパ部との構造が不可欠なので、その製造工程の簡略化が行き詰まっている。   As mentioned above, a touch panel with good performance can be made in a simple manufacturing process by making improvements to simplify the electrode structure in the capacitive touch panel or by simplifying the entire touch panel integrated type. However, since the structure of the insulating part and the jumper part for three-dimensionally connecting the sensor electrodes regularly arranged on the same plane is indispensable, the manufacturing process has been simplified.

本発明は、前記の問題点に鑑みて提案するものであり、本発明が解決しようとする課題は、平面型表示装置の表示画面上に重ねて使用し、透明カバーシート一体型の投影型の静電容量式タッチパネルにおいて、優れた性能のタッチパネルを簡単な製造工程で提供することである。   The present invention is proposed in view of the above-mentioned problems, and the problem to be solved by the present invention is that it is used by being superimposed on a display screen of a flat display device, and is a projection type integrated with a transparent cover sheet. In the capacitive touch panel, it is to provide a touch panel with excellent performance by a simple manufacturing process.

上記の課題を解決するための手段として、請求項1に記載の発明は、平面型表示装置の視認側に、透明カバーシートと一体化して、センサ電極側を平面型表示装置に相対して設けるタッチパネルであって、タッチパネルが、2次元配置したセンサ電極である複数の透明導電膜パターンと、透明導電膜パターン間を電気的に接続するジャンパ部と、ジャンパ部での層間の電気的短絡を防ぐ絶縁部と、センサ電極から配線を導いて端子部に至る配線部とから構成され、ジャンパ部と配線部とが、良導電体金属層を含む同一構成の多層を積
層し、透明カバーシートと多層との界面を低反射率化してなることを特徴とするタッチパネルである。
As a means for solving the above-mentioned problems, in the invention described in claim 1, the sensor electrode side is provided on the viewing side of the flat display device so as to be integrated with the transparent cover sheet and relative to the flat display device. A touch panel, wherein the touch panel prevents a plurality of transparent conductive film patterns that are two-dimensionally arranged sensor electrodes, a jumper portion that electrically connects between the transparent conductive film patterns, and an electrical short circuit between layers in the jumper portion It consists of an insulating part and a wiring part that leads the wiring from the sensor electrode to the terminal part, and the jumper part and the wiring part are laminated with the same configuration including a good conductive metal layer, and the transparent cover sheet and the multilayer It is a touch panel characterized by having a low reflectance at the interface.

また、請求項2に記載の発明は、同一構成の多層が、透明カバーシート側から順に保護金属酸化層、良導電体金属層、保護金属層の3層からなることを特徴とする請求項1に記載のタッチパネルである。   The invention described in claim 2 is characterized in that a multilayer having the same configuration is composed of three layers of a protective metal oxide layer, a good conductor metal layer, and a protective metal layer in order from the transparent cover sheet side. It is a touchscreen as described in.

また、請求項3に記載の発明は、保護金属酸化層、良導電体金属層、保護金属層が、それぞれモリブデン酸化膜、アルミニウム膜、モリブデン膜からなることを特徴とする請求項2に記載のタッチパネルである。   The invention according to claim 3 is characterized in that the protective metal oxide layer, the good conductor metal layer, and the protective metal layer are each composed of a molybdenum oxide film, an aluminum film, and a molybdenum film. It is a touch panel.

また、請求項4に記載の発明は、透明カバーシートの片側表面に、ジャンパ部と配線部とを構成する層を積層して成膜した後に、フォトリソグラフィー法とエッチング法とにより両部を一括して形成することを特徴とする請求項1〜3のいずれかに記載のタッチパネルの製造方法である。   According to the invention described in claim 4, after the layers constituting the jumper part and the wiring part are laminated on one surface of the transparent cover sheet, both parts are collectively formed by photolithography and etching. It is formed, It is a manufacturing method of the touch panel in any one of Claims 1-3 characterized by the above-mentioned.

また、請求項5に記載の発明は、請求項4に記載のタッチパネルの製造方法であって、ジャンパ部と配線部とを一括して形成する工程、絶縁部を形成する工程、透明導電膜パターンを形成する工程をこの順に行うことを特徴とするタッチパネルの製造方法である。   The invention according to claim 5 is the touch panel manufacturing method according to claim 4, wherein the step of forming the jumper portion and the wiring portion at once, the step of forming the insulating portion, the transparent conductive film pattern This is a method for manufacturing a touch panel, characterized in that the steps of forming are performed in this order.

本発明は、平面型表示装置の視認側に、透明カバーシートと一体化して、センサ電極側を平面型表示装置に相対して設けるタッチパネルの各部の構成において、ジャンパ部と配線部とが、良導電体金属層を含む同一構成の多層を積層し、透明カバーシートと多層との界面を低反射率化してなるので、
平面型表示装置の表示画面上に重ねて使用し、透明カバーシート一体型の投影型の静電容量式タッチパネルにおいて、優れた性能のタッチパネルを簡単な製造工程で提供できる。
In the configuration of each part of the touch panel in which the sensor electrode side is provided so as to be opposed to the flat display device by integrating the transparent cover sheet on the viewing side of the flat display device, the jumper portion and the wiring portion are good. Since the multilayer of the same configuration including the conductor metal layer is laminated, and the interface between the transparent cover sheet and the multilayer is reduced in reflectance,
A projection type capacitive touch panel integrated with a transparent cover sheet, which is used by being superimposed on the display screen of a flat display device, can provide a touch panel with excellent performance in a simple manufacturing process.

本発明のタッチパネルの一例の構成を説明するための模式図であって、(a)は、主要部の一部を拡大した平面図を示し、(b)は、ジャンパ部と配線部との同一構成の断面図を示す。It is a schematic diagram for demonstrating the structure of an example of the touchscreen of this invention, Comprising: (a) shows the top view which expanded a part of main part, (b) is the same with a jumper part and a wiring part. A cross-sectional view of the configuration is shown. 従来のタッチパネルの一例の構成を説明するための模式図であって、(a)は、主要部の一部を拡大した平面図を示し、(b)は、配線部の構成の断面図を示す。It is a schematic diagram for demonstrating the structure of an example of the conventional touch panel, Comprising: (a) shows the top view which expanded a part of main part, (b) shows sectional drawing of the structure of a wiring part. . 2種類のタッチパネル付き平面型表示装置の構成を比較するための構成模式図であって、(a)はタッチパネル独立型、(b)はカバーガラス一体型を示す。It is a structure schematic diagram for comparing the structure of two types of flat display devices with a touch panel, (a) is a touch panel independent type, (b) shows a cover glass integrated type. 本発明のタッチパネルの製造方法の一例を説明するための工程順模式図であって、(a)は、ジャンパ部と配線部とを一括して形成する工程、(b)は、絶縁部を追加形成する工程、(c)は、センサ電極である透明導電膜パターンを追加形成する工程を示す。BRIEF DESCRIPTION OF THE DRAWINGS It is a process order schematic diagram for demonstrating an example of the manufacturing method of the touchscreen of this invention, (a) is the process of forming a jumper part and a wiring part collectively, (b) is adding an insulation part. Step (c) of forming shows a step of additionally forming a transparent conductive film pattern which is a sensor electrode. 従来のタッチパネルの製造方法の一例を説明するための工程順模式図であって、(a)は、配線部をパターン形成する工程、(b)は、センサ電極である透明導電膜パターンを追加形成する工程、(c)は、絶縁部を追加形成する工程、(d)は、ジャンパ部を追加形成する工程を示す。It is process order schematic diagram for demonstrating an example of the manufacturing method of the conventional touch panel, Comprising: (a) is the process of pattern-forming a wiring part, (b) is forming the transparent conductive film pattern which is a sensor electrode additionally (C) shows a step of additionally forming an insulating portion, and (d) shows a step of additionally forming a jumper portion. 本発明の構成における多層膜の低反射率化の効果を従来例と比較するための分光反射率の測定結果のグラフである。It is a graph of the measurement result of the spectral reflectance for comparing the effect of low reflectance of the multilayer film in the composition of the present invention with the conventional example. 分光反射率の測定方法を示す概念図であって、(a)は、リファレンスの決め方、(b)は、従来の多層膜の測定方法、(c)は、本発明を構成する多層膜の測定方法である。It is a conceptual diagram which shows the measuring method of a spectral reflectance, Comprising: (a) is how to determine a reference, (b) is the measuring method of the conventional multilayer film, (c) is the measurement of the multilayer film which comprises this invention Is the method.

以下、図面に従って、本発明を実施するための形態について説明する。
図1は、本発明のタッチパネルの一例の構成を説明するための模式図であって、(a)は、主要部の一部を拡大した平面図を示し、(b)は、ジャンパ部と配線部との同一構成の断面図を示す。
Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.
1A and 1B are schematic views for explaining a configuration of an example of a touch panel according to the present invention. FIG. 1A is a plan view showing an enlarged part of a main part, and FIG. 1B is a jumper part and wiring. Sectional drawing of the same structure as a part is shown.

本発明は、平面型表示装置の視認側に、透明カバーシート2と一体化して、センサ電極側を平面型表示装置に相対して設けるタッチパネルであって、タッチパネル1が、2次元のマトリクス状に配置したセンサ電極3である複数の透明導電膜パターンと、図で横方向の透明導電膜パターン間を立体的に電気的に接続するジャンパ部4と、ジャンパ部での層間の電気的短絡を防ぐ絶縁部5と、センサ電極からの配線を縦横方向の周辺部に導いて端子部(図示せず)に至る配線部6とから構成され、ジャンパ部4と配線部6とが、良導電体金属層8を含む同一構成の多層を積層し、透明カバーシートと多層との界面を低反射率化してなることを特徴とする。   The present invention is a touch panel that is integrated with a transparent cover sheet 2 on the viewing side of a flat display device and has a sensor electrode side facing the flat display device, and the touch panel 1 is formed in a two-dimensional matrix. A plurality of transparent conductive film patterns which are the arranged sensor electrodes 3, a jumper portion 4 for electrically connecting three-dimensionally between the transparent conductive film patterns in the horizontal direction in the figure, and an electrical short circuit between layers in the jumper portion are prevented. The insulating part 5 and the wiring part 6 which leads the wiring from the sensor electrode to the peripheral part in the vertical and horizontal directions and reaches the terminal part (not shown) are configured. The jumper part 4 and the wiring part 6 are made of a good conductor metal. A multilayer having the same configuration including the layer 8 is laminated, and the interface between the transparent cover sheet and the multilayer is reduced in reflectance.

前記同一構成の多層は、配線部6における導電性を大きくするとともに、ジャンパ部4における視認性を小さくする構成に相当する。導電性を大きくするための方策として、前記同一構成の多層に、良導電体金属層8を含むことで効果があり、視認性を小さくするための方策として、視認側から見た際の反射率を小さくすることで効果があるからである。視認側から見た際の反射率を小さくするには、反射率を高くする金属層8と透明カバーシートとの間に金属酸化層7を設けることにより、光の干渉効果により達成できる。   The multilayer having the same configuration corresponds to a configuration in which the conductivity in the wiring portion 6 is increased and the visibility in the jumper portion 4 is decreased. As a measure for increasing the conductivity, it is effective to include the good conductive metal layer 8 in the multilayer having the same configuration, and as a measure for reducing the visibility, the reflectance when viewed from the viewing side is effective. This is because it is effective to reduce the size. Reducing the reflectance when viewed from the viewing side can be achieved by the light interference effect by providing the metal oxide layer 7 between the metal layer 8 and the transparent cover sheet that increase the reflectance.

図2に示した従来の配線部61において、カバーガラスを用いることの多い透明カバーシート2の表示装置側にあたる片側表面上に、透明カバーシート2と2層目の金属との密着性を向上し、薄膜としての各種環境への耐性を補強する保護金属層71を設けた。それに対して、本例では、透明カバーシート2を通して見た際の反射率を小さくする機能も上記の機能に追加することを狙って、保護金属層71に代えて、保護金属酸化層7を設ける。また、従来の配線部61に設けた良導電体金属層81と保護金属層91とは、本例でも同様に、良好な導電性を目的とする良導電体金属層8と、機械的強度の向上と各種環境への耐性を補強する保護金属層9として、多層形成することができ、しかも、本例では、配線部6に加えてジャンパ部4にも共通に形成できる。すなわち、上記各層の積層は、透明カバーシート側から順に保護金属酸化層7、良導電体金属層8、保護金属層9の3層とすることができる。なお、本発明は、上記3層以外に例えば密着力の更なる向上やパターニング形状の向上等のために中間層を挟むことを排除しない。   In the conventional wiring part 61 shown in FIG. 2, the adhesiveness between the transparent cover sheet 2 and the second layer metal is improved on one surface corresponding to the display device side of the transparent cover sheet 2 that often uses a cover glass. A protective metal layer 71 that reinforces resistance to various environments as a thin film is provided. On the other hand, in this example, instead of the protective metal layer 71, a protective metal oxide layer 7 is provided in order to add a function of reducing the reflectance when viewed through the transparent cover sheet 2 to the above function. . Also, the good conductor metal layer 81 and the protective metal layer 91 provided in the conventional wiring part 61 are the same as the good conductor metal layer 8 for good conductivity and the mechanical strength. The protective metal layer 9 that reinforces the improvement and resistance to various environments can be formed in multiple layers, and in this example, it can be formed in the jumper portion 4 in addition to the wiring portion 6. That is, the above layers can be laminated in three layers of the protective metal oxide layer 7, the good conductor metal layer 8, and the protective metal layer 9 in order from the transparent cover sheet side. In addition to the above three layers, the present invention does not exclude the sandwiching of an intermediate layer, for example, for further improvement of adhesion and patterning shape.

また、本発明は、前記保護金属酸化層7、良導電体金属層8、保護金属層9の3層が、それぞれモリブデン酸化膜、アルミニウム膜、モリブデン膜であるように構成することができる。前述の各層が有するべき特性を、これらの具体的な膜がその特性上備えている上に、膜形成がスパッタリング法等の真空成膜技術により容易に高品質に実施でき、フォトリソグラフィー法とエッチング法とによるパターニング手段を好適に採用できる。   Further, the present invention can be configured such that the three layers of the protective metal oxide layer 7, the good conductor metal layer 8, and the protective metal layer 9 are a molybdenum oxide film, an aluminum film, and a molybdenum film, respectively. These specific films have the characteristics that each of the above-mentioned layers should have, and the film formation can be easily performed with high quality by a vacuum film forming technique such as sputtering, and photolithography and etching. Patterning means based on the method can be suitably employed.

なお、本発明は、使用する具体的な膜として、上記モリブデン酸化膜、アルミニウム膜、モリブデン膜に限定されるものではないが、保護金属酸化層7と保護金属層9とは、共通の金属をベースに用いた方が製造上、好ましい。
本例において、モリブデン酸化膜7、アルミニウム膜8、モリブデン膜9の3層からなる多層の膜形成をスパッタリング法で行う場合は、スパッターターゲットをモリブデンとアルミニウムの2元で準備して、酸化膜の成膜時には定量の酸素ガスを導入する反応性スパッタリングにより、ソース電源を増結することなく可能である。
The present invention is not limited to the molybdenum oxide film, the aluminum film, and the molybdenum film as specific films to be used, but the protective metal oxide layer 7 and the protective metal layer 9 are made of a common metal. Use in the base is preferable in terms of production.
In this example, when forming a multilayer film composed of three layers of the molybdenum oxide film 7, the aluminum film 8, and the molybdenum film 9 by the sputtering method, a sputtering target is prepared by two elements of molybdenum and aluminum, and the oxide film is formed. Reactive sputtering in which a certain amount of oxygen gas is introduced during film formation is possible without adding a source power source.

また、本発明のタッチパネルの製造方法は、透明カバーシート2の片側表面に、ジャン
パ部4と配線部6とを構成する層を積層して成膜した後に、フォトリソグラフィー法とエッチング法とにより両部を一括して形成することを特徴とする。従来は、ジャンパ部4と配線部6とに異なる層を設けて、別途パターン形成していたが、本発明により、製造工程を短縮できる。
In addition, the touch panel manufacturing method of the present invention is formed by laminating the layers constituting the jumper portion 4 and the wiring portion 6 on the surface of one side of the transparent cover sheet 2, and then performing both by the photolithography method and the etching method. The portion is formed in a lump. Conventionally, different layers are provided in the jumper portion 4 and the wiring portion 6 and a separate pattern is formed. However, according to the present invention, the manufacturing process can be shortened.

図4は、本発明のタッチパネルの製造方法の一例を説明するための工程順模式図であって、(a)は、ジャンパ部4と配線部6とを一括して形成する工程、(b)は、絶縁部5を追加形成する工程、(c)は、センサ電極である透明導電膜パターン3を追加形成する工程を、それぞれ透明カバーシート2の片面に位置合わせして形成する順に示す。また、比較のために示す図5は、従来のタッチパネルの製造方法の一例を説明するための工程順模式図であって、(a)は、配線部61をパターン形成する工程、(b)は、センサ電極である透明導電膜パターン3を追加形成する工程、(c)は、絶縁部5を追加形成する工程、(d)は、ジャンパ部41を第二の透明導電膜パターンとして追加形成する工程を、それぞれ透明カバーシート2の片面に位置合わせして形成する順に示す。
なお、図示していないが、上記本発明の方法および従来の方法のいずれも、最終工程として、透明樹脂等による全面均一な保護膜を塗布形成することができる。
4A and 4B are schematic views in order of steps for explaining an example of the touch panel manufacturing method of the present invention. FIG. 4A is a step of forming the jumper portion 4 and the wiring portion 6 in a lump; FIG. 5C shows the step of additionally forming the insulating portion 5, and FIG. 5C shows the step of additionally forming the transparent conductive film pattern 3 that is a sensor electrode in the order of forming each in alignment with one side of the transparent cover sheet 2. Further, FIG. 5 shown for comparison is a schematic diagram in order of steps for explaining an example of a conventional method for manufacturing a touch panel, in which (a) is a step of patterning the wiring part 61, and (b) is , A step of additionally forming the transparent conductive film pattern 3 as the sensor electrode, (c) a step of additionally forming the insulating portion 5, and (d) a step of additionally forming the jumper portion 41 as the second transparent conductive film pattern. The steps are shown in the order in which the steps are aligned with one side of the transparent cover sheet 2.
Although not shown, both the above-described method of the present invention and the conventional method can apply and form a uniform protective film with a transparent resin or the like as the final step.

図4に示すとおり、本発明のタッチパネルの製造方法は、(a)ジャンパ部4と配線部6とを一括して形成する工程、(b)絶縁部5を形成する工程、(c)透明導電膜パターン3を形成する工程を、この順に行うことを特徴とする。一連の成膜または塗布による膜形成とフォトリソグラフィー法を用いるパターン形成とを一組の大きな工程としてみると、図5に示す製造方法と比較して、4工程から3工程に短縮される。また、タッチパネルを構成する各部位の形成順が変化する。つまり、本例では、センサ電極である透明導電膜パターン3の形成より前にジャンパ部4の形成を行う。上記の理由は、本例でジャンパ部4と配線部6とを一括して形成するために、透明導電膜パターン3の形成より先行して行うというだけではなく、モリブデン酸化膜を用いた保護金属酸化層7のパターンの全体が、透明カバーシート2上に直接成膜されている方が、部分的に透明導電膜を間に挟む領域が混在するより、良導電体金属層の高反射率を均一に抑制して、視認性を均一に小さくすることができるので好ましいからである。   As shown in FIG. 4, the touch panel manufacturing method of the present invention includes (a) a step of forming the jumper portion 4 and the wiring portion 6 in a lump, (b) a step of forming the insulating portion 5, and (c) a transparent conductive material. The step of forming the film pattern 3 is performed in this order. If a film formation by a series of film formation or coating and a pattern formation using a photolithographic method are viewed as a set of large steps, the number of steps is reduced from four to three compared to the manufacturing method shown in FIG. Moreover, the formation order of each part which comprises a touch panel changes. That is, in this example, the jumper portion 4 is formed before the formation of the transparent conductive film pattern 3 that is a sensor electrode. The reason for this is that, in this example, in order to form the jumper portion 4 and the wiring portion 6 in a lump, not only is performed prior to the formation of the transparent conductive film pattern 3, but also a protective metal using a molybdenum oxide film. When the entire pattern of the oxide layer 7 is formed directly on the transparent cover sheet 2, the high reflectivity of the good conductive metal layer is higher than the area where the transparent conductive film is partially sandwiched. This is because the visibility can be reduced uniformly and the visibility can be reduced uniformly.

本発明のタッチパネルの製造方法をさらに具体的に説明すると、(a)ジャンパ部4と配線部6とを構成するための前述の同一構成の多層成膜を行い、フォトレジストの塗布、露光、現像、を含むフォトリソグラフィー法とその後のエッチングと残留レジストの除去を経て、一括形成する。次に、(b)絶縁部5を形成するための感光性樹脂材料を塗布し、フォトリソグラフィー法により、前記ジャンパ部4と位置合わせしてパターン形成する。次に、(c)センサ電極である透明導電膜パターン3を、例えばITOの成膜後に、前工程のパターン位置との合わせを前提として、フォトリソグラフィー法によるフォトレジストのパターニングを行い、その後のエッチングと残留レジストの除去を経て形成することができる。   The touch panel manufacturing method of the present invention will be described in more detail. (A) The multilayer film formation of the same configuration described above for forming the jumper section 4 and the wiring section 6 is performed, and the photoresist is applied, exposed and developed. , A subsequent photolithography method, and subsequent etching and removal of residual resist. Next, (b) a photosensitive resin material for forming the insulating portion 5 is applied, and a pattern is formed by aligning with the jumper portion 4 by photolithography. Next, (c) the transparent conductive film pattern 3 which is a sensor electrode is subjected to photo resist patterning by photolithography on the premise of alignment with the pattern position of the previous process after the ITO film is formed, for example, and then etched And can be formed through removal of residual resist.

図6は、本発明の構成における多層膜の低反射率化の効果を従来例と比較するための分光反射率の測定結果のグラフである。また、図7は、分光反射率の測定方法を示す概念図であって、(a)は、リファレンスの決め方、(b)は、従来の多層膜の測定方法、(c)は、本発明を構成する多層膜の測定方法である。   FIG. 6 is a graph of spectral reflectance measurement results for comparing the effect of lowering the reflectance of a multilayer film in the configuration of the present invention with a conventional example. FIG. 7 is a conceptual diagram showing a spectral reflectance measurement method, where (a) shows how to determine a reference, (b) shows a conventional multilayer film measurement method, and (c) shows the present invention. It is a measuring method of the multilayer film to comprise.

分光反射率の測定は、市販の分光光度計を利用して可能である。原理的な概念図の図7に示すように、光源(モノクロメータ)からの分光された照射光(実線表示)が測定試料、図7(a)ではアルミニウム単層膜80に照射され、鏡面反射された光(実線矢印表示)を受光部32で受光して光の強度を測定する。モノクロメータからの分光照射光の波長を連続的に変化させて分光反射率を測定する。測定におけるリファレンスをアルミニウム単層膜80とする。すなわち、以後の各測定試料における100%の基準をアルミニウム単層膜80で得られた強度とする。図7(b)に示すように、従来の多層膜の例として、透明カバーシート2に成膜したモリブデン膜71、アルミニウム膜81、モリブデン膜91からなる多層膜を、透明カバーシート2の成膜されていない面から測定し、次に、図7(c)に示すように、本発明を構成する多層膜の例として、透明カバーシート2に成膜したモリブデン酸化膜7、アルミニウム膜8、モリブデン膜9からなる多層膜を、透明カバーシート2の成膜されていない面から測定する。   The spectral reflectance can be measured using a commercially available spectrophotometer. As shown in FIG. 7 of the conceptual conceptual diagram, the radiated light (solid line display) from the light source (monochromator) is irradiated to the measurement sample, and in FIG. The received light (indicated by solid arrows) is received by the light receiving unit 32 and the intensity of the light is measured. Spectral reflectance is measured by continuously changing the wavelength of spectral irradiation light from the monochromator. A reference in measurement is an aluminum single layer film 80. That is, 100% of the reference for each measurement sample thereafter is the strength obtained with the aluminum single layer film 80. As shown in FIG. 7B, as an example of a conventional multilayer film, a multilayer film composed of a molybdenum film 71, an aluminum film 81, and a molybdenum film 91 formed on the transparent cover sheet 2 is formed on the transparent cover sheet 2. Next, as shown in FIG. 7C, as an example of a multilayer film constituting the present invention, a molybdenum oxide film 7, an aluminum film 8 and a molybdenum film formed on the transparent cover sheet 2 are measured. The multilayer film composed of the film 9 is measured from the surface where the transparent cover sheet 2 is not formed.

図6に示すとおり、本発明を構成する多層膜は、従来の多層膜と比較して、可視光域の全域で反射率を小さくすることができる。波長400nm未満の紫外域の測定結果は、本測定結果において正確な値を示さないため参照しない。金属酸化層と金属層との間での光の干渉効果により低反射率化する本発明の構成になる多層膜による分光反射率曲線の形は、使用する金属酸化層の屈折率特性や膜厚によって変動するが、従来の多層膜の反射率より低くできる。   As shown in FIG. 6, the multilayer film constituting the present invention can reduce the reflectance in the entire visible light region as compared with the conventional multilayer film. The measurement result in the ultraviolet region with a wavelength of less than 400 nm is not referred to because it does not show an accurate value in this measurement result. The shape of the spectral reflectance curve by the multilayer film according to the present invention, which has a low reflectance due to the light interference effect between the metal oxide layer and the metal layer, is determined by the refractive index characteristics and film thickness of the metal oxide layer used. However, it can be made lower than the reflectance of the conventional multilayer film.

次に、本発明を構成する多層膜を、従来の多層膜と総合的に比較した結果を、(表1)に示す。各評価項目別に、判定基準に対しての良否判定を○×で表中に示す。本発明を構成する多層膜が、500〜600nmの波長における平均反射率で代表させて比較すると、反射率において、従来の多層膜より顕著な改善を示す一方、エッチング時間、シート抵抗値、下地との密着性の諸項目に関しては、同等であることが分かる。   Next, Table 1 shows the result of comprehensive comparison of the multilayer film constituting the present invention with the conventional multilayer film. For each evaluation item, the pass / fail judgments with respect to the judgment criteria are shown in the table by ○ ×. When the multilayer film constituting the present invention is represented by an average reflectance at a wavelength of 500 to 600 nm and compared, the reflectance shows a marked improvement over the conventional multilayer film, while the etching time, sheet resistance value, It can be seen that the various items of adhesion are equivalent.

本発明は、透明な基材と多層膜の配線パターンとの界面を簡単な方法で低反射率化して、透明な基材の多層膜を設けていない面からの配線パターンに対する視認性を小さくすることができる。同様な方策によって、他の電子部品等の表示性能に関係する特性品質を高めることが容易に考えられる。例えば、透明導電膜をさらに低抵抗化するための金属層を含む補助配線パターンの視認性を小さくすることができる。また、一般に表示装置に関係する配線を始めとして、電子部品における各種配線パターンに金属層を適用できる範囲を拡大することができ、製品設計の自由度を大幅に高めることが可能になる。   The present invention lowers the reflectance of the interface between a transparent substrate and a multilayer film wiring pattern by a simple method, and reduces the visibility of the wiring pattern from the surface where the transparent substrate multilayer film is not provided. be able to. A similar measure can be easily considered to improve the characteristic quality related to the display performance of other electronic components and the like. For example, the visibility of the auxiliary wiring pattern including a metal layer for further reducing the resistance of the transparent conductive film can be reduced. In addition, the range in which the metal layer can be applied to various wiring patterns in electronic components, including wiring related to display devices in general, can be expanded, and the degree of freedom in product design can be greatly increased.

1、11・・・タッチパネル
2・・・透明カバーシート
3・・・センサ電極(透明導電膜パターン)
4、41・・・ジャンパ部
5・・・絶縁部
6、61・・・配線部
7・・・保護金属酸化層(モリブデン酸化膜)
71・・・保護金属層(モリブデン膜)
8、81・・・良導電体金属層(アルミニウム膜)
9、91・・・保護金属層(モリブデン膜)
10・・・視認側
12・・・独立型タッチパネル
13・・・カバーガラス一体型タッチパネル
15・・・カバーガラス(前面板)
16・・・額縁
21、25・・・偏光板
22・・・TFT素子基板
23・・・液晶
24・・・カラーフィルタ基板
26・・・エアギャップ
31・・・光源(モノクロメータ)
32・・・受光部
80・・・アルミニウム単層膜
DESCRIPTION OF SYMBOLS 1, 11 ... Touch panel 2 ... Transparent cover sheet 3 ... Sensor electrode (transparent conductive film pattern)
4, 41 ... Jumper part 5 ... Insulating part 6, 61 ... Wiring part 7 ... Protective metal oxide layer (molybdenum oxide film)
71 ... Protective metal layer (molybdenum film)
8, 81 ... good conductor metal layer (aluminum film)
9, 91 ... Protective metal layer (molybdenum film)
DESCRIPTION OF SYMBOLS 10 ... Viewing side 12 ... Independent touch panel 13 ... Cover glass integrated touch panel 15 ... Cover glass (front plate)
16 ... Frame 21, 25 ... Polarizing plate 22 ... TFT element substrate 23 ... Liquid crystal 24 ... Color filter substrate 26 ... Air gap 31 ... Light source (monochromator)
32... Light receiving portion 80... Aluminum single layer film

Claims (5)

平面型表示装置の視認側に、透明カバーシートと一体化して、センサ電極側を平面型表示装置に相対して設けるタッチパネルであって、
タッチパネルが、2次元配置したセンサ電極である複数の透明導電膜パターンと、透明導電膜パターン間を電気的に接続するジャンパ部と、ジャンパ部での層間の電気的短絡を防ぐ絶縁部と、センサ電極から配線を導いて端子部に至る配線部とから構成され、ジャンパ部と配線部とが、良導電体金属層を含む同一構成の多層を積層し、透明カバーシートと多層との界面を低反射率化してなることを特徴とするタッチパネル。
A touch panel that is integrated with the transparent cover sheet on the viewing side of the flat display device and the sensor electrode side is provided relative to the flat display device,
A touch panel having a plurality of transparent conductive film patterns that are two-dimensionally arranged sensor electrodes, a jumper portion that electrically connects the transparent conductive film patterns, an insulating portion that prevents an electrical short circuit between layers in the jumper portion, and a sensor It consists of a wiring part that leads the wiring from the electrode to the terminal part, and the jumper part and the wiring part are laminated with a multilayer of the same configuration including a good conductor metal layer, and the interface between the transparent cover sheet and the multilayer is reduced. A touch panel characterized by having a reflectivity.
同一構成の多層が、透明カバーシート側から順に保護金属酸化層、良導電体金属層、保護金属層の3層からなることを特徴とする請求項1に記載のタッチパネル。   The touch panel according to claim 1, wherein the multilayer having the same configuration includes three layers of a protective metal oxide layer, a good conductor metal layer, and a protective metal layer in order from the transparent cover sheet side. 保護金属酸化層、良導電体金属層、保護金属層が、それぞれモリブデン酸化膜、アルミニウム膜、モリブデン膜からなることを特徴とする請求項2に記載のタッチパネル。   The touch panel according to claim 2, wherein the protective metal oxide layer, the good conductor metal layer, and the protective metal layer are each composed of a molybdenum oxide film, an aluminum film, and a molybdenum film. 透明カバーシートの片側表面に、ジャンパ部と配線部とを構成する層を積層して成膜した後に、フォトリソグラフィー法とエッチング法とにより両部を一括して形成することを特徴とする請求項1〜3のいずれかに記載のタッチパネルの製造方法。   The layer comprising the jumper part and the wiring part is laminated on one side surface of the transparent cover sheet, and then both parts are collectively formed by a photolithography method and an etching method. The manufacturing method of the touchscreen in any one of 1-3. 請求項4に記載のタッチパネルの製造方法であって、
ジャンパ部と配線部とを一括して形成する工程、絶縁部を形成する工程、透明導電膜パターンを形成する工程をこの順に行うことを特徴とするタッチパネルの製造方法。
It is a manufacturing method of the touch panel according to claim 4,
A method for manufacturing a touch panel, wherein a step of collectively forming a jumper portion and a wiring portion, a step of forming an insulating portion, and a step of forming a transparent conductive film pattern are performed in this order.
JP2011151794A 2011-07-08 2011-07-08 Touch panel and touch panel manufacturing method Withdrawn JP2013020347A (en)

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CN105448385A (en) * 2014-07-18 2016-03-30 深圳欧菲光科技股份有限公司 Transparent conductive film and electronic equipment
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JP2015225383A (en) * 2014-05-26 2015-12-14 日本航空電子工業株式会社 Touch panel and method for manufacturing the same
CN105448385A (en) * 2014-07-18 2016-03-30 深圳欧菲光科技股份有限公司 Transparent conductive film and electronic equipment
JP2017126209A (en) * 2016-01-14 2017-07-20 株式会社ジャパンディスプレイ Cover member and display including the same
US10628650B2 (en) 2016-01-14 2020-04-21 Japan Display Inc. Cover member and display device
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EP3467140A1 (en) 2017-10-06 2019-04-10 Plansee SE Target material for deposition of molybdenum oxide layers
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US11862444B2 (en) 2017-10-06 2024-01-02 Plansee Se Target material for deposition of molybdenum oxide layers
EP3715497A1 (en) 2019-03-29 2020-09-30 Plansee SE Sputtering target for producing layers containing molybdenum oxide
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US11927878B2 (en) 2020-07-06 2024-03-12 Beijing Boe Display Technology Co., Ltd. Projection screen, manufacturing method, and display system having nanoparticle layers

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