JP2001300451A - Ultraviolet irradiation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance the efficiency of cleaning, and modifying a material to be treated by an ultraviolet irradiation device. SOLUTION: This ultraviolet irradiation device 10 has a light, transmission window 20 for irradiating the material to be treated W with ultraviolet light from a lamp house 14 which houses a dielectric barrier excimer lamp 12. The lamp house 14 is filled with an inert gas such as nitrogen introduced therein and the light transmission window 20 has an opening 22 formed for conducting the flow of the inert gas into a space between the material W and the window 20. When the material W is irradiated with the ultra-violet light, the inert gas present in the lamp house 14 finds its way out through the opening 22 and consequently, the surface atmosphere of the material W is filled with the inert gas during irradiating the material W with the ultraviolet light. Thus the attenuation of the ultraviolet light in the region of the atmosphere is inhibited.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet light irradiation apparatus used for cleaning or modifying the surface of a semiconductor wafer or a glass substrate by using the synergistic action of ultraviolet light and ozone.

[0002]

2. Description of the Related Art In recent years, techniques for cleaning or modifying the surface of an object to be processed, such as a metal, a semiconductor material, or glass, by utilizing the cooperative action of ultraviolet light and ozone have been widely studied. This technique is commonly known as the UV ozone method. According to the UV ozone method, there is an advantage that the organic contaminants adhering to the surface can be removed and an oxide film layer can be formed on the surface without damaging the object.

In the UV ozone method, 185 nm light, which is ultraviolet light emitted from a low-pressure mercury lamp, is irradiated on air containing oxygen or oxygen gas to generate ozone. This ozone generates active oxygen species, which is a decomposition gas of ozone, and brings it into contact with the surface of the object. In the cleaning of the object to be treated by the UV ozone method, the organic contaminants adhered to the surface of the object to be treated are oxidized by this contact, converted into low molecular oxides such as carbon dioxide and water, and removed from the surface. Is done. As a result, the surface of the workpiece can be dry-precisely cleaned. For details of the cleaning or reforming of the object to be treated by the UV ozone method, see "New technology using ozone" (Miyu Shobo, issued November 20, 1986).
Familiar with.

On the other hand, low-pressure mercury lamps have greatly contributed to the spread of the above-mentioned UV ozone cleaning method because of their characteristic bright lines. However, in recent years, a dielectric barrier excimer has been used as a light source capable of performing more efficient UV ozone cleaning. Lamps have become known and replacement of conventional low-pressure mercury lamps as UV ozone cleaning light sources is in progress. Dielectric barrier excimer lamps eliminate the drawbacks of low-pressure mercury lamps, such as heat radiation to substrates and lighting performance. There is an advantage that generation can be performed more efficiently.

FIG. 3 shows an example of the configuration of a conventional ultraviolet light irradiation device using a dielectric barrier excimer lamp. As shown in the figure, the lamp device 60 includes an excimer lamp 62 in a metal container 61. In the excimer lamp 62, a discharge gas 63 such as xenon is sealed in a space between an inner tube 62a and an outer tube 62b made of quartz glass, and electrodes 62c and 62d (outside electrodes) provided inside and outside thereof by an AC power supply 64. A high voltage is applied between the electrodes (mesh-like), thereby emitting ultraviolet light. That is, quartz glass, which is a dielectric to which a high voltage is applied, causes dielectric barrier discharge (silent discharge).
A small discharge is generated, and the energy thereof excites and combines the discharge gas 63 enclosed therein, and emits light having a wavelength specific to the gas in the process of returning the excited gas molecules to the ground state. .

The metal container 61 of the lamp device 60 is provided with a light transmitting window 65 made of synthetic quartz glass, and the ultraviolet light radiated from the excimer lamp 62 is transmitted therethrough to irradiate the workpiece W. . An inert gas such as nitrogen is constantly introduced into the metal container 61 at a rate of several liters per minute, so that the attenuation of the ultraviolet light from the excimer lamp 62 is minimized. The ultraviolet light that has exited from the container through the light transmission window 65 generates ozone and characteristic oxygen species by a photochemical reaction in an oxygen-containing atmosphere in which the object W is placed, and generates the ozone and the characteristic oxygen species on the surface of the object W. , And the object is irradiated with the ultraviolet light directly, and the cleaning or modification of the surface of the object is achieved by the cooperative operation.

[0007]

However, the conventional ultraviolet light irradiation apparatus has the following problems.

(1) Since the space inside the metal container 61 is filled with an inert gas, the attenuation of the ultraviolet light is suppressed in the metal container, but the space between the light transmitting window 65 and the workpiece W is not increased. The space between them is in the atmosphere, in which ultraviolet light is absorbed and attenuated by oxygen. As a result, the effect of cleaning or modifying the surface of the workpiece by direct irradiation with ultraviolet light is reduced.

(2) Light transmitting window 65 made of the synthetic quartz
The so-called solarization, in which a color center is generated due to slight impurities such as iron and manganese due to irradiation of ultraviolet light, and blackening occurs. The amount of transmitted ultraviolet light is attenuated by the solarization, and as a result, the effect of cleaning or modifying the surface of the object to be treated is reduced.

(3) In order to enhance the effect of cleaning or reforming by the excimer lamp, it is preferable to bring the excimer lamp 62 as close to the workpiece W as possible.
Since the light transmission window 65 having a predetermined thickness intervenes between them, the distance is limited.

(4) In the UV ozone method, as described above, the object to be processed is cleaned or modified by the cooperative action of direct irradiation of ozone and ultraviolet light, but the effect of cleaning by direct irradiation of ultraviolet light is achieved. When the distance between the light transmitting window and the object to be processed is reduced to increase the efficiency, the efficiency of ozone generation decreases. On the other hand, when the distance is increased, the irradiation efficiency of ultraviolet light decreases as described above. is there.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide an ultraviolet light irradiation apparatus for irradiating a surface to be processed of an object with ultraviolet light to perform the processing, thereby solving the above-mentioned conventional problems and improving the efficiency of the processing And to shorten the processing time.

Another object of the present invention is to achieve the above object by a relatively simple device configuration.

Still another object of the present invention is to improve the efficiency of ozone generation and the efficiency of direct irradiation of ultraviolet light,
It is an object of the present invention to provide an ultraviolet light irradiation device capable of realizing efficient cleaning or modification of an object to be processed by these cooperative actions.

[0015]

To achieve the above object, an ultraviolet light irradiating apparatus according to the present invention comprises an ultraviolet light irradiating light source, preferably comprising a dielectric barrier excimer lamp, which emits ultraviolet light, and the ultraviolet light irradiating light source. And an inert gas supply means for introducing an inert gas such as nitrogen into the housing; and a light provided from the ultraviolet light irradiation light source provided in the housing and disposed outside the housing. A light-transmitting window that enables irradiation of the object to be processed, wherein the inert gas introduced into the housing flows out into a space between the light-transmitting window and the object to be processed. A gas outlet opening.

In the ultraviolet light irradiating apparatus, when the object to be processed is irradiated with ultraviolet light, the inert gas in the housing flows out of the inert gas outflow opening. Thus, during the irradiation of the object to be processed with the ultraviolet light, the atmosphere on the surface of the object to be processed is filled with the inert gas, and the attenuation of the ultraviolet light in this region is suppressed.

In the present invention, the inert gas outflow opening is formed in a region of the light transmitting window between the ultraviolet light irradiation light source and the object to be processed, whereby light from the ultraviolet light irradiation light source is formed. It is preferable that a part of the material is irradiated directly onto the surface of the object to be processed through the inert gas outlet.

In implementing the present invention, a relatively small inert gas outflow opening is formed in the light transmission window, and most of the ultraviolet light from the ultraviolet light irradiation light source passes through the light transmission window and is given to the object to be processed. However, by directly irradiating a part of the ultraviolet light to the object according to the above configuration, the efficiency of the cleaning or the modification by the direct irradiation of the ultraviolet light is remarkably improved.

In this case, the ultraviolet light irradiation light source has a cylindrical shape, and the inert gas outflow opening has a substantially rectangular shape having an opening region extending in a radial direction and an axial direction of the cylindrical ultraviolet light irradiation light source. It is preferably of a shape.

Further, the ultraviolet light irradiation light source is disposed so as to cover the inert gas outflow opening, whereby between the ultraviolet light irradiation light source and the light transmission window on both sides of the inert gas outflow opening. The present invention can be configured to form the flow path of the inert gas.

The inert gas flow path allows the inert gas in the housing to flow into the target area with directivity.

In the present invention, a region of the light transmitting window facing the ultraviolet light irradiating light source is formed thinner than other regions, and the ultraviolet light irradiating light source is arranged close to the light transmitting window. Is preferred.

By adopting such a configuration,
The approach distance between the ultraviolet light irradiation light source and the surface of the processing object can be further reduced, and the processing efficiency is further improved by the ultraviolet light irradiation apparatus.

The ultraviolet light irradiation apparatus of the present invention also includes a housing having a first chamber and a second chamber separated by a light transmitting window, and an ultraviolet light housed in the first chamber of the housing. An ultraviolet irradiation light source that emits light, inert gas supply means for introducing an inert gas into the first chamber of the housing, and oxygen supply means for supplying oxygen to the second chamber of the housing. Provided in the housing, while allowing the light from the ultraviolet light irradiation light source to irradiate the object to be processed placed outside the housing, the inert gas introduced into the first chamber, An inert gas outflow opening that flows out into a space between the light transmitting window and the processing object, and ozone generated in the second chamber by light from the ultraviolet light irradiation light source, to generate ozone in the processing object. An ozone outflow opening that allows the ozone to flow out onto the surface to be processed.

In the ultraviolet light irradiating apparatus having the above structure, ozone is generated by the oxygen supplied into the room and the ultraviolet light from the ultraviolet light irradiating light source, and is supplied to the surface of the processing object from the ozone outflow opening. . By the supply of the ozone, the ozone concentration on the surface of the object to be treated is improved, and the cleaning and the modification are performed more efficiently.

In the ultraviolet light irradiation apparatus, the present invention also provides a base for enabling the object to be supported at a predetermined close distance with respect to the light transmitting window, and a predetermined position between the base and the light transmitting window. It is preferable to include a moving unit that relatively moves the base and the housing in the radial direction of the ultraviolet light irradiation light source while maintaining the approach distance.

In this case, it is preferable that the ozone outlet is located downstream of the inert gas outlet in the moving direction of the object.

In the UV ozone method, chemical bonds are broken by irradiating an organic compound on the surface of an object with ultraviolet light, and these are scattered and removed by the oxidizing power of ozone and active oxygen species. According to the ultraviolet light irradiation device according to this configuration, the organic compound cut and separated by the irradiation of the ultraviolet light at the position below the inert gas outflow opening is moved to a position below the ozone outflow opening on the downstream side thereof. Are scattered and removed here.

Further, in the present invention, the chamber may be formed on both sides of the ultraviolet light irradiation light source, and the ozone outflow opening may be formed on both sides of the inert gas outflow opening in the moving direction of the workpiece. good.

[0030]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on one embodiment shown in the drawings. Hereinafter, the present invention will be described with an example of an ultraviolet light irradiation apparatus that irradiates a glass substrate for liquid crystal as an object to be processed with ultraviolet light to remove organic contaminants on the surface thereof. FIG. 1 is a schematic side sectional view of an ultraviolet light irradiation device according to a first embodiment of the present invention. As shown in the drawing, the ultraviolet light irradiation device 10 of the present invention has a lamp house 14 having an excimer lamp 12 inside. The excimer lamp 12 installed in the lamp house 14 has a substantially cylindrical outer shape, and emits ultraviolet light from a circumferential surface thereof. In one embodiment, the fill gas in the lamp tube is xenon,
Irradiate with 72 nm ultraviolet light. In the present invention, however, other gas such as neon fluoride (108 nm), argon (126 nm), krypton (146 nm), fluorine (154 nm), argon chloride (175 nm), and argon fluoride (193 nm) are used as the sealing gas. Or the like may be used, and krypton chloride (222 nm), krypton fluoride (2
48 nm), xenon chloride (308 nm), xenon fluoride (351 nm), or the like may be used. The excimer lamp 12 can be excited by any one of a dielectric barrier discharge, a high-frequency discharge, a microwave, and an electron beam.

The lamp house 14 also has a reflection mirror 16 made of, for example, mirror-finished aluminum inside thereof. The reflection mirror 16 covers the upper part and the side part of the excimer lamp 12, and condenses the light irradiated above and to the side of the excimer lamp 12 downward, that is, toward the workpiece W. The reflecting mirror 16 can be replaced by mirror-finishing the inner wall surface of the lamp house 14.

The lamp house 14 is a substantially closed container into which an inert gas is introduced. This suppresses the extent to which the ultraviolet light from the excimer lamp 12 is attenuated in the lamp house 14 by oxygen. As an inert gas,
Although nitrogen, argon, helium, neon, or the like, which does not easily absorb light, can be used, nitrogen gas is preferably used in consideration of cost. The ultraviolet light irradiation device 10 has an inert gas introduction device (not shown) for introducing the inert gas into the lamp house 14. The lamp house 14 has a gas inlet 18 for introducing an inert gas.
The inert gas is introduced into the lamp house from here during at least the irradiation period of the ultraviolet light. The inert gas introduction device can be configured to include, for example, a gas supply source such as a gas cylinder, a mass flow controller that controls the flow rate of the supplied inert gas, and an electromagnetic valve provided at the gas inlet 18. In this case, the flow rate of the inert gas from the gas supply source is controlled by a mass flow controller,
The solenoid valve is controlled to open and close, and is guided from the gas inlet 18 into the lamp house 14.

A light transmitting window 20 is provided on the lower surface of the lamp house 14.
Is provided, and the ultraviolet light radiated from the excimer lamp 12 passes through the light transmission window 20 and irradiates the surface of the workpiece W. As the light transmission window 20, it is preferable to use water-containing synthetic quartz glass having excellent light transmittance in a wide wavelength range. When a gas that irradiates ultraviolet light having a wavelength shorter than that of xenon gas is used in the excimer lamp 12, calcium fluoride, magnesium fluoride, lithium fluoride, sapphire, or the like that has a small attenuation of transmittance is used as the window material. be able to. The light transmission window 20 has an inert gas outflow opening 22 through which an inert gas inside the housing flows out onto the surface of the workpiece W.

The inert gas outflow opening 22 is formed in the region of the light transmission window 20 immediately below the excimer lamp 12,
It is a substantially rectangular shape that extends in the radial and axial directions of the lamp. As shown in the figure, the region of the lower surface of the excimer lamp 12 is exposed to the outside of the lamp house 14 by the inert gas outflow opening 22, and the excimer lamp 1
A portion of the ultraviolet light of the second
Irradiates the surface of the processing object W without passing through. At the same time, the inert gas introduced into the lamp house 14 flows out from the inert gas outflow opening 22 toward the surface of the workpiece W.

As shown in the figure, the excimer lamp 12
An area of the light transmission window 20 which is disposed close to the inert gas outlet opening 22 so as to cover the inert gas outlet opening 22 from the inside thereof and defines opposite sides of the inert gas outlet opening 22,
The inside thereof, that is, the surface facing the excimer lamp 12 is obliquely edge-processed.
Inert gas passages 24 are formed between the light transmission window 20 and the edge-processed region of the light transmission window 20. The inert gas in the lamp house 14 is jetted from the inert gas outlet 22 to the surface of the workpiece W with directivity by the flow path 24. Due to the inert gas ejected from the inert gas outflow opening 22, a predetermined area on the surface of the workpiece W (the area immediately below the inert gas outflow opening and its surrounding area)
Ultraviolet light that is filled with the atmosphere and illuminates this region (most of which is directly illuminated through the inert gas outlet 22) is not attenuated by oxygen.

The ultraviolet light irradiating apparatus 10 further includes a transport device 26 for placing and fixing the workpiece W so as to be transportable below the lamp house 14. The transfer device 26 transfers the rectangular workpiece W in the horizontal direction, and the excimer lamp 12
Is a mechanism for passing the ultraviolet light irradiation range. The transfer device 26 includes a mounting table 28 on which the object to be processed is stably mounted and moved together with the object. The height position of the mounting table is such that the distance between the upper surface of the object W to be mounted thereon, ie, the surface to be processed, and the bottom of the lamp house 14, ie, the light transmitting window 20, is 10 mm or less, preferably 5 to 1 mm. Is set to be within the range. It will be apparent to those skilled in the art that by shortening the distance between the lamp device and the surface to be treated, the efficiency of cleaning or reforming is improved.

Although not shown in the drawing, it is preferable that at least the mounting table 28 and the workpiece W mounted thereon are disposed in a closed processing chamber. This is to prevent the ozone gas or the like generated by the irradiation of the object W with ultraviolet light from leaking to the outside and to ensure the safety thereof. In addition, a gas inlet into the processing chamber is provided, and a wall of the processing chamber is covered with a fluorine resin material such as a Teflon (registered trademark) sheet, so that a corrosive gas such as a chlorine gas or a fluorine gas containing no oxygen fluid is provided. May be filled in the processing chamber.

Next, the operation when the object to be processed W is cleaned by the ultraviolet light irradiation apparatus 10 having the above-described configuration will be described. At the time of cleaning, the workpiece W is fixed on the mounting table 28 and passes below the lamp house 14 while being transported by the transport device 26 in the direction of the arrow in FIG.
Process. Prior to the lighting of the excimer lamp 12, an inert gas is introduced into the lamp house 14 from the gas inlet 18 and a part thereof is ejected from the inert gas outflow opening 22 onto the surface of the workpiece W immediately below the same. You.

When the excimer lamp 12 is turned on, a part of the ultraviolet light, that is, the ultraviolet light emitted from the region on the lower surface of the excimer lamp 12 is turned into the inert gas outflow opening 22.
From the surface of the workpiece W. At this time, since the ultraviolet light irradiated through the opening 22 is not affected by the attenuation by oxygen or the light transmission window, the ultraviolet light efficiently reaches the surface of the processing target W and the organic light adhering to the surface. The chemical bond of the compound is broken. The inert gas outlet opening 22
The area of the workpiece W that has been processed by the ultraviolet light immediately below the area is moved below the light transmission window 20 by the transport of the transport device 26. At this position, the ultraviolet light from the excimer lamp 12 reaches the outside of the lamp house 14 through the light transmission window 20 and reaches the region of the workpiece W which has been processed at the position of the inert gas outlet 22 previously. I do. At this time,
In the space between the light transmission window 20 and the workpiece W, the concentration of the inert gas flowing out from the inert gas outflow opening 22 is low. Ozone and active oxygen species are generated by ultraviolet light. The organic compound previously cut from the processing object W by the irradiation of the ultraviolet light through the opening 22 is scattered and removed by the oxidizing power of the ozone and the active oxygen species, and is effectively cleaned.

As described above, in the ultraviolet light irradiation device 10 according to the present embodiment, the organic compound cut from the processing object W at the position of the inert gas outflow opening 22 is positioned at the position of the light transmission window 20 downstream thereof. Then, it is scattered and removed by ozone and active oxygen species. In this embodiment, ozone and active oxygen species are also generated on the upstream side of the inert gas outflow opening 22, so that the workpiece W is also cleaned in this region.

Next, a second embodiment of the present invention will be described. FIG. 2 is a schematic side sectional view of an ultraviolet light irradiation device according to a second embodiment of the present invention. Schematically, the ultraviolet light irradiation device 30 according to the present embodiment includes an ozone generation chamber 38 partitioned by a light transmission window 34 in a lamp house 32, and the light transmission window 20 and the workpiece W in the previous embodiment. Ozone and active oxygen species generated in the space between the target and the target object W are generated in the ozone generation chamber 38 and supplied to the surface of the workpiece W.

As shown in the figure, an ultraviolet light irradiation device 30 of this embodiment comprises a lamp house 32 in a lamp house 32 partitioned by a light transmitting window 34 and two ozone generating chambers 3 on both sides thereof.
8, 38 are provided. An excimer lamp 40 is disposed in the lamp chamber 36 as in the previous embodiment, and an inert gas is introduced from the gas inlet 42 by an introduction device (not shown). On the lower surface of the lamp chamber 36, instead of the light transmitting window in the above embodiment, a light-transmissive lower plate 4 is provided.
4 wherein an inert gas outlet opening 46 is formed. Therefore, in the present embodiment, the ultraviolet light from the excimer lamp 40 is blocked at a certain position of the lower surface plate 44 and is applied to the workpiece W only from the position of the inert gas outlet 46.

In the two ozone generating chambers 38, 38,
The oxygen inlets 48 and 48 are formed, and the excimer lamp 40 is formed.
Oxygen is introduced from here during the irradiation of ultraviolet light.
That is, an oxygen introducing device (not shown) including an oxygen supply source, a mass flow controller, and an electromagnetic valve is connected to the oxygen introducing port 48, and oxygen whose flow rate is limited at a predetermined timing is supplied to the ozone generating chamber 38. You. Ultraviolet light from an excimer lamp 40 is irradiated into each of the ozone generation chambers 38 through the light transmission window 34 and reacts with the supplied oxygen, where ozone and active oxygen species are generated. An ozone outlet 5 is provided on the lower surface of each ozone generating chamber 38.
0 is formed, and the generated ozone and active oxygen species are ejected from here onto the surface of the workpiece W. In the present embodiment, the ozone generation chamber 38 (further, the ozone outflow opening 50) is connected to the lamp chamber 36 (further, the inert gas outflow opening 4) with respect to the moving direction of the workpiece W by the transfer device 52.
6) are arranged on the upstream side and the downstream side.

In the ultraviolet light irradiating apparatus 30 according to the present embodiment, similarly to the previous embodiment, the light of the excimer lamp 40 passes directly through the inert gas outflow opening 46 to the surface of the workpiece W in the central region, as in the previous embodiment. Then, the cleaning is efficiently performed, and the same region is repeatedly cleaned with ozone ejected from the ozone outlet 50 before and after this processing. According to the present embodiment, the amount of ozone generated in the two ozone generation chambers 38 can be controlled to a desired value, so that the object can be more effectively cleaned.

In this embodiment, the lamp chamber 36
The lower surface is formed by the light-transmissive lower plate 44, but may be formed by a light-transmitting window as in the previous embodiment.
In practicing the present invention, the ozone generation chamber 38 may be formed only on the downstream side of the lamp chamber 36 (that is, the object to be processed is subjected to the treatment by the direct irradiation of the ultraviolet light and then to the treatment with the ozone. To do).

The embodiment of the present invention has been described with reference to the drawings. However, it is apparent that the present invention is not limited to the matters described in the above embodiments, and that changes, improvements, and the like can be made based on the description in the claims. For example, in the above-described embodiment, the inert gas is caused to flow out through the inert gas outflow opening onto the surface of the object to be processed, and the inert gas is relatively emitted from the opening such that the ultraviolet light directly irradiates the object to be processed. Widely configured. However, a relatively small inert gas outflow opening may be formed so that most of the ultraviolet light passes through the light transmission window and is given to the object to be processed.

[0047]

As described above, according to the present invention, an inert gas is efficiently supplied also between the light transmitting window and the object to be processed, thereby improving the efficiency of ultraviolet light reaching the object to be processed. And
Therefore, the efficiency of processing by the ultraviolet light irradiation device is improved, and the processing time can be shortened.

Further, according to the present invention, the object to be processed can be directly irradiated with ultraviolet light from the inert gas outflow opening without passing through the light transmission window, and the ultraviolet light source for the object to be processed can be brought closer. Since they can be arranged in the same manner, further processing efficiency can be expected.

Further, in the present invention, ozone is generated using an ultraviolet light irradiation light source and the ozone is supplied to the surface of the object to be processed, so that the processing efficiency is further improved.

The ultraviolet light irradiation device constructed according to the present invention has a relatively simple structure, and can achieve the above effects at the same cost as the conventional device.

[Brief description of the drawings]

FIG. 1 is a schematic side sectional view of an ultraviolet light irradiation device according to a first embodiment of the present invention.

FIG. 2 is a schematic side sectional view of an ultraviolet light irradiation device according to a second embodiment of the present invention.

FIG. 3 is a diagram showing a configuration example of a conventional ultraviolet light irradiation device using a dielectric barrier excimer lamp.

[Explanation of symbols]

 W Object to be processed 10 Ultraviolet light irradiation device 12 Excimer lamp 14 Lamp house 16 Reflector mirror 18 Gas inlet 20 Light transmission window 22 Inert gas outflow opening 24 Flow path 26 Transport device 28 Mounting table 30 Ultraviolet light irradiation device 32 Lamp house 34 Light transmission window 36 Lamp chamber 38 Ozone generation chamber 40 Excimer lamp 42 Gas inlet 44 Lower plate 46 Inert gas outlet 48 Oxygen inlet 50 Ozone outlet 52 Transfer device 54 Mounting table

Claims (11)

[Claims] 1. An ultraviolet light irradiation apparatus for irradiating an object to be treated with ultraviolet light by irradiating the object with ultraviolet light, comprising: an ultraviolet light irradiation light source that emits ultraviolet light; A housing for accommodating, an inert gas supply means for introducing an inert gas into the housing, and a cover provided on the housing and receiving light from the ultraviolet light source outside the housing. A light transmission window that enables irradiation of a processing object, and an inert gas outflow opening that allows an inert gas introduced into the housing to flow out into a space between the light transmission window and the processing object. And an ultraviolet light irradiation device comprising: 2. The method according to claim 1, wherein the inert gas outflow opening is formed in a region of the light transmission window sandwiched between the ultraviolet light irradiation light source and the object, so that a part of the light from the ultraviolet light irradiation light source is formed. The ultraviolet light irradiation apparatus according to claim 1, wherein the surface of the object to be processed is irradiated directly through the inert gas outlet. 3. The ultraviolet light irradiating light source is cylindrical, and the inert gas outflow opening has a substantially rectangular shape having an opening region extending in a radial direction and an axial direction of the cylindrical ultraviolet light irradiating light source. The ultraviolet light irradiation device according to claim 1, wherein the ultraviolet light irradiation device is a device. 4. The ultraviolet light irradiation light source is disposed so as to cover the inert gas outflow opening, whereby between the ultraviolet light irradiation light source and the light transmission window on both sides of the inert gas outflow opening, The ultraviolet light irradiation device according to claim 3, wherein a flow path of the inert gas is formed. 5. The apparatus according to claim 4, wherein a region of the light transmission window facing the ultraviolet light irradiation light source is formed thinner than another region, and the ultraviolet light irradiation light source is arranged close to the light transmission window. The ultraviolet light irradiation device as described in the above. 6. A base capable of supporting the object to be processed at a predetermined close distance to the light transmitting window; and a base while maintaining a predetermined distance between the object to be processed and the light transmitting window. The ultraviolet light irradiation device according to any one of claims 1 to 5, further comprising a moving unit that relatively moves the table and the housing in a radial direction of the ultraviolet light irradiation light source. 7. An ultraviolet light irradiation apparatus for irradiating an object to be processed with ultraviolet light by irradiating the surface with the ultraviolet light, wherein the first chamber and the second chamber separated by a light transmitting window are provided. A housing having: an ultraviolet light irradiation light source that emits ultraviolet light accommodated in a first room of the housing; and an inert gas supply unit for introducing an inert gas into the first room of the housing. Oxygen supply means for supplying oxygen into the second chamber of the housing; and irradiating light from the ultraviolet light irradiation light source provided on the housing to the object placed outside the housing. And an inert gas outflow opening for allowing the inert gas introduced into the first chamber to flow out into the space between the light transmitting window and the object to be processed; Causing ozone generated in the second chamber by light to flow out onto the surface of the object to be processed; And an ozone outflow opening. 8. The ultraviolet light irradiation light source has a cylindrical shape, and the inert gas outflow opening has a substantially rectangular shape having an opening region extending in a radial direction and an axial direction of the cylindrical ultraviolet light irradiation light source. The ultraviolet light irradiation device according to claim 7, wherein the ultraviolet light irradiation device is used. 9. A base for supporting the object to be processed at a predetermined close distance to the light transmitting window; and a base while maintaining a predetermined close distance between the object to be processed and the light transmitting window. 9. The ultraviolet light irradiation device according to claim 7, further comprising a moving unit that relatively moves the table and the housing in a radial direction of the ultraviolet light irradiation light source. 10. 10. The ultraviolet light irradiation apparatus according to claim 9, wherein the ozone outflow opening is located downstream of the inert gas outflow opening in the moving direction of the workpiece. 11. The second chamber is formed on both sides of the ultraviolet light irradiation light source, and the ozone outflow opening is formed on both sides of the inert gas outflow opening in the moving direction of the processing object. 10. The ultraviolet light irradiation device according to 9.