JP2001079387A - Ultraviolet ray irradiation device and method thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an ultraviolet ray irradiation device and a method thereof capable of highly efficiently cleaning or reforming a large sized material to be worked with the small number of dielectric excimer lamp. SOLUTION: The ultraviolet irradiation device is provided with an ultraviolet irradiation light source 11, a moving means 14 for linearly and relatively moving the material W to be worked to the ultraviolet ray irradiation light source in the width direction to cross the irradiation range of the ultraviolet ray and a control means 15 for controlling the moving means to be equal to or below aP/J ((a) represents the width of the ultraviolet irradiation light source, P represents an average quantity of light and J represents an accumulated quantity of light per the unit area required for cleaning and reforming of the material W to be worked) in the relative moving speed of the material W to be worked in the irradiation range of the ultraviolet ray and to relatively move the material W to be worked in one direction to the ultraviolet ray irradiation light source.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

TECHNICAL FIELD The present invention relates to a semiconductor, glass,
The present invention relates to an ultraviolet light irradiation apparatus using a dielectric excimer lamp or the like for cleaning or modifying the surface of a substrate such as a metal or a polymer compound.
The present invention relates to an ultraviolet irradiation apparatus suitable for cleaning or modifying a rectangular substrate surface used in a panel (Panel) or a field emission display (FED).

[0002]

2. Description of the Related Art In recent years, an ultraviolet light irradiation apparatus using a dielectric excimer lamp or the like has attracted attention for cleaning or modifying the surface of a glass substrate for display or a silicon wafer. A dielectric excimer lamp fills a discharge vessel with a discharge gas such as xenon or krypton bromide which forms excimer molecules, forms excimer molecules by silent discharge, and extracts light emitted from the excimer molecules. is there. Synthetic quartz glass or the like is used for the dielectric. Dielectric excimer lamps emit short-wave ultraviolet light of 175 nm or less and selectively and efficiently generate light of a single wavelength close to the line spectrum, so that conventional low-pressure mercury lamps and high-pressure arc discharge lamps It does not have various features.

For example, when a gas containing xenon is used for a dielectric excimer lamp, xenon atoms are excited to be in an excimer state, and when the excimer state is separated again into xenon atoms, light having a wavelength of about 172 nm is generated. I do. When the light having the wavelength of 172 nm is applied to the atmosphere, oxygen in the atmosphere absorbs the light and generates ozone from the oxygen. The generated ozone is decomposed to generate active oxygen species and oxidize organic substances. Further, light of 172 nm has a high photon energy of 7.2 eV, which exceeds the binding energy of many organic compounds and breaks the bond. From this action, effects such as cleaning or modification can be obtained. Regarding the dielectric excimer lamp, for example, JP-A-2-7353,
It is disclosed in U.S. Pat. No. 4,837,484.

FIG. 9 shows a schematic configuration of a dielectric excimer lamp. A dielectric excimer lamp 90 includes an excimer gas 92 such as xenon inside a double tube 91 made of synthetic quartz.
Is enclosed under 1 atm. An outer electrode 93 is arranged on the outer periphery of the double tube 91, and an inner electrode 94 is arranged on the inner periphery.
Is arranged. As the external electrode 93, a mesh electrode is used to transmit light from the dielectric excimer lamp. An inert gas 95 such as nitrogen or argon gas flows into the inside of the internal electrode 94 of the double tube 91, thereby suppressing heat generation of the dielectric excimer lamp.

FIG. 10A is a schematic configuration diagram of a lamp device including the dielectric excimer lamp 90. The housing of the lamp device 100 is a sealed container, and the inside thereof is filled with an inert gas such as nitrogen or argon which hardly absorbs light. As a result, the extent to which the ultraviolet light from the dielectric excimer lamp 90 is attenuated in the lamp device 100 is suppressed. On the lower surface of the lamp device 100, a light transmitting member 101 made of synthetic quartz glass or the like is provided as a light extraction window, and ultraviolet light emitted from the dielectric excimer lamp 90 passes through the light transmitting member 101, The workpiece is irradiated. The lamp device 100 also includes a reflecting mirror 102 therein, which is a dielectric excimer lamp 90.
, And the light emitted upward and laterally is focused downward, that is, toward the workpiece. FIG. 2B shows the light emission amount distribution in the width direction of the lamp device 100. As is clear from this graph, the light amount becomes maximum immediately below the dielectric excimer lamp, and attenuates toward the periphery.

Conventionally, when cleaning or modifying a large glass substrate such as a liquid crystal or a PDP using the dielectric excimer lamp, a plurality of dielectric excimer lamps are arranged in parallel.
2. Description of the Related Art A so-called multi-lamp collective surface irradiation method for performing collective irradiation on a surface to be processed is performed. FIG. 11 shows a schematic configuration diagram of a multi-lamp collective surface irradiation method. The lamp device 110 includes a plurality of dielectric excimer lamps 111 arranged in parallel therein. The pitch between the dielectric excimer lamps 111 is set to be approximately two to three times the diameter of the dielectric excimer lamps 111 so that the amount of light emitted from the dielectric excimer lamps by the reflecting mirrors 112 is as uniform as possible. I have. On the lower surface side of the lamp device 110, the dielectric excimer lamp 11 is provided.
A light transmitting member 113 made of synthetic quartz or the like is provided over the entire area in order to transmit the light from 1 to irradiate the workpiece.

[0007]

However, when cleaning or reforming is performed by the conventional multi-lamp collective surface irradiation method, there are several problems as described below. (1) As shown in FIG. 10B, each of the dielectric excimer lamps has a non-uniform light emission amount in the width direction, and even if the arrangement of the adjacent dielectric excimer lamps is optimized, The light amount between the dielectric excimer lamps is smaller than the light amount immediately below the dielectric excimer lamp. As a result, when the workpiece is irradiated with ultraviolet light for a certain period of time by this method, a large difference occurs in the integrated light amount, and this causes variation in cleaning or reforming of the workpiece. (2) In an apparatus that needs to irradiate a large glass substrate or the like with ultraviolet light, it is necessary to install a considerable number of dielectric excimer lamps (and a driving circuit for each lamp) in order to perform the batch surface irradiation. . For example, the size of the glass substrate is 680 m
In the case of mx 880 mm, it is usually necessary to prepare 13 dielectric excimer lamps in the multi-lamp simultaneous surface irradiation method. Also, relatively expensive synthetic quartz glass must be made large. As a result, there are problems that the manufacturing cost and the running cost of the device are increased, and the size of the device is increased. Furthermore, the increased number of dielectric excimer lamps increases the possibility of failure and reduces the reliability of the device.

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to solve the above-mentioned conventional problems and to provide an ultraviolet light irradiation apparatus and method capable of uniformly irradiating ultraviolet light over a large workpiece. .

Another object of the present invention is to provide an ultraviolet light irradiation apparatus and a method capable of cleaning or modifying a large workpiece by using as few dielectric excimer lamps as possible. is there.

Still another object of the present invention is to provide an ultraviolet light irradiation apparatus and method which can clean or modify a large workpiece and occupy a small area.

[0011]

SUMMARY OF THE INVENTION The present invention relates to an ultraviolet light irradiation apparatus for irradiating a work surface of a work with ultraviolet light to clean or modify the work surface. The apparatus of the present invention is an ultraviolet light irradiation light source, a moving means for linearly moving the workpiece relative to the ultraviolet light irradiation light source so as to cross the irradiation range of the ultraviolet light in a width direction thereof, The relative moving speed of the workpiece in the ultraviolet light irradiation range is a
P / J (a is the width of the ultraviolet light irradiation light source, P is the average amount of light per unit area, J is the integrated amount of light per unit area required for cleaning or modifying the work), and And control means for controlling the moving means so as to move in one direction relative to the ultraviolet light irradiation light source.

[0012] In this case, the control means may determine that the relative movement speed of the workpiece in the irradiation range of the ultraviolet light is 2 aP / J or less, and that the workpiece is moved relative to the ultraviolet light irradiation light source in a reciprocating direction. The moving means may be configured to move so as to move.

[0013] The ultraviolet light irradiation apparatus of the present invention further comprises an N number of ultraviolet light irradiation light sources arranged in parallel and close to each other, and irradiating the workpiece with the ultraviolet light in the direction in which the ultraviolet light irradiation light sources are arranged. A moving means for linearly moving relative to each other across the range, and a relative moving speed of the workpiece in the ultraviolet light irradiation range is aPN / J (a is the width of the ultraviolet light irradiation light source, and P is a unit area per unit area thereof). And the moving means so that the workpiece relatively moves in one direction with respect to the ultraviolet light irradiation light source when the average light quantity J is equal to or less than the integrated light quantity per unit area required for cleaning or modifying the workpiece. And control means for controlling the above.

[0014] In this case, the control means may be arranged such that the relative movement speed of the workpiece in the ultraviolet light irradiation range is 2 aPN / J or less, and the workpiece is moved relative to the ultraviolet light irradiation light source in the reciprocating direction. The moving means may be configured to move so as to move.

Further, the ultraviolet light irradiation apparatus according to the present invention comprises N ultraviolet light irradiation light sources arranged in parallel, wherein the pitch between the ultraviolet light irradiation light sources is (L + a) / N (where L is the workpiece And the length of a is the width of the ultraviolet light irradiation light source), and the workpiece is traversed from the length direction thereof in the direction in which it is arranged with respect to the ultraviolet light irradiation light source so as to cross the irradiation range of the ultraviolet light. A moving means for relatively moving linearly, and a relative moving distance of the workpiece in an irradiation range of the ultraviolet light is (L +
a) control means for controlling the moving means so as to satisfy / N.

In this case, the control means determines that the relative movement speed of the workpiece in the ultraviolet light irradiation range is aP / J (P is the average light amount per unit area, and J is the cleaning or cleaning of the workpiece. The moving means may be configured to control the moving means so that the workpiece relatively moves in one direction with respect to the ultraviolet light irradiation light source when the integrated light amount per unit area required for the reforming is less than or equal to the above.

[0017] The control means may control the relative movement speed of the workpiece in the irradiation range of the ultraviolet light to be 2 aP / J.
(P is the average light quantity per unit area, J is the integrated light quantity per unit area required for cleaning or reforming the workpiece)
The moving means may be configured to control the moving means so that the workpiece relatively moves in the reciprocating direction with respect to the ultraviolet light irradiation light source.

In the ultraviolet light irradiation device according to the present invention, the ultraviolet light irradiation light source is preferably a dielectric excimer lamp.

The present invention also relates to an ultraviolet light irradiation method for irradiating a work surface of a work with ultraviolet light to clean or modify the work surface. The ultraviolet light irradiation method of the present invention, the step of starting irradiation of ultraviolet light by an ultraviolet light irradiation light source, the workpiece, the ultraviolet light irradiation light source so as to cross the irradiation range of the ultraviolet light in the width direction of the light source. Relative movement speed of the workpiece in the ultraviolet light irradiation range is aP / J (a is the width of the ultraviolet light irradiation light source, and P is the average light amount per unit area thereof). , J is an integrated light amount per unit area required for cleaning or modifying the workpiece) or less, and the workpiece is controlled so as to relatively move in one direction with respect to the ultraviolet light irradiation light source. It is composed.

Further, in the ultraviolet light irradiation method of the present invention, the step of starting irradiation of ultraviolet light by an ultraviolet light irradiation light source, and irradiating the workpiece with the ultraviolet light irradiation light source in the width direction thereof with respect to the ultraviolet light irradiation light source. A relative movement speed linearly moving across the range, wherein the relative movement speed of the workpiece in the ultraviolet light irradiation range is 2aP / J (a is the width of the ultraviolet light irradiation light source, and P is the unit area thereof. The average amount of light per unit, J is less than or equal to the integrated amount of light per unit area required for cleaning or modifying the workpiece, and the workpiece was controlled so as to move relative to the ultraviolet light source in the reciprocating direction. It can also be configured to include

Further, in the ultraviolet light irradiation method of the present invention, there is provided a step of starting irradiation of ultraviolet light by N ultraviolet light irradiation light sources arranged in parallel and close to each other; A step of linearly moving the workpiece in a linear manner so as to cross the irradiation range of the ultraviolet light in the arrangement direction, wherein the relative movement speed of the workpiece in the irradiation range of the ultraviolet light is aPN / J (a is the ultraviolet light irradiation; The width of the light source, P is the average amount of light per unit area, J is the integrated amount of light per unit area required for cleaning or modifying the work, and Controlled to relatively move in the direction.

Further, in the ultraviolet light irradiation method of the present invention, a step of starting irradiation of ultraviolet light by N ultraviolet light irradiation light sources arranged in parallel and close to each other, and applying the workpiece to the ultraviolet light irradiation light source On the other hand, it is a step of linearly moving relative to the irradiation direction of the ultraviolet light linearly in the arrangement direction,
The relative movement speed of the workpiece in the ultraviolet light irradiation range is 2aPN / J (a is the width of the ultraviolet light irradiation light source, P is the average light amount per unit area, and J is for cleaning or modifying the workpiece. (A required integrated light amount per unit area) or less, and the workpiece is controlled to relatively move in the reciprocating direction with respect to the ultraviolet light irradiation light source.

Further, the ultraviolet light irradiation method of the present invention comprises N ultraviolet light irradiation light sources arranged in parallel, wherein the pitch between the ultraviolet light irradiation light sources is (L + a) / N (L is The length of the object, a is the width of the ultraviolet light irradiation light source), and irradiating the workpiece with the ultraviolet light by aligning the length direction with the arrangement direction of the ultraviolet light irradiation light source. Disposing under the light source, starting irradiation of ultraviolet light by the N ultraviolet light irradiation light sources, and irradiating the workpiece with the ultraviolet light in the direction in which the ultraviolet light irradiation light sources are arranged. In which the relative movement distance of the workpiece in the irradiation range of the ultraviolet light is controlled to be (L + a) / N. be able to.

In this case, it is preferable that, in the step of arranging the workpiece, the tip of the workpiece in the moving direction is positioned in front of the ultraviolet light source located farthest in the moving direction. .

In the step of relatively moving the workpiece, the relative movement speed of the workpiece in the ultraviolet light irradiation range is aP / J (where P is the average amount of light per unit area, and J is the workpiece It can be controlled so that the workpiece relatively moves in one direction with respect to the ultraviolet light irradiation light source when the integrated light quantity per unit area required for cleaning or modifying the workpiece is equal to or less.

Further, in the step of relatively moving the work, the relative movement speed of the work in the ultraviolet light irradiation range is 2aP / J (P is the average light amount per unit area, and J is the work It is possible to control the workpiece so as to relatively move in the reciprocating direction with respect to the ultraviolet light irradiation light source when the integrated light quantity per unit area required for cleaning or modifying the workpiece is equal to or less than the above.

In the ultraviolet light irradiation method according to the present invention, the ultraviolet light irradiation light source is preferably a dielectric excimer lamp.

[0028]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on one embodiment shown in the drawings. FIG. 1 is a configuration block diagram of an ultraviolet light irradiation device according to an embodiment of the present invention. As shown in the figure, the ultraviolet light irradiation device 10 includes a lamp device 11 having a built-in dielectric excimer lamp, a power control unit 12 and a cooling unit 13 of the lamp device 11, a transport unit 14 for transporting a workpiece W, and a transport unit. A transport control unit 15 of the unit 14 is provided.

The lamp device 11 preferably includes a plurality of dielectric excimer lamps. Each of the dielectric excimer lamps is arranged in parallel and close to each other, and realizes surface irradiation of the workpiece W immediately below them with ultraviolet light. In the present invention, the lamp device 11 can be realized by arranging a plurality of lamp devices including a single dielectric excimer lamp in parallel, and including a plurality of dielectric excimer lamps in a single lamp device. May be used. However,
The lamp device 11 may be configured to include only a single dielectric excimer lamp. In the embodiment described later,
The lamp device 11 is configured by arranging three lamp devices each including a single dielectric excimer lamp in parallel. The dielectric excimer lamp included in the lamp device 11 is preferably of a water-cooled type. The water-cooled dielectric excimer lamp can irradiate ultraviolet light with higher efficiency than the air-cooled dielectric excimer lamp shown in FIG. The air-cooled dielectric excimer lamp will be described later.

The power control unit 12 controls on / off of the dielectric excimer lamp. The power supply controller 12 may be configured to control the power so as to substantially turn off the cleaning or reforming function by reducing the power supplied to the dielectric excimer lamp to 20% or less. The circuit configuration of the power control unit 12 will be described later. Cooling unit 13
The present invention provides a structure for cooling each of the water-cooled dielectric excimer lamps and improving the irradiation light amount. That is, cooling water having a conductivity of 2 micro Siemens or less is circulated in the tube of each dielectric excimer lamp.

The transport unit 14 is a mechanism for transporting a rectangular workpiece W such as a glass substrate in the horizontal direction and passing the ultraviolet light irradiation range of the lamp unit 11. The transport unit 14 includes a mounting table (not shown) on which the workpiece is stably mounted and moved together with the workpiece. The height position of the mounting table
The upper surface of the workpiece to be mounted thereon, that is, the distance between the workpiece surface and the bottom of the lamp device 11 is set to be 10 mm or less, preferably 5 to 2 mm. It will be apparent to those skilled in the art that by shortening the distance between the lamp device and the work surface, the efficiency of cleaning or reforming is improved.

The transfer controller 15 controls the transfer speed, transfer distance (ie, transfer start point and end point), and transfer operation (ie, one-way movement or reciprocal movement) of the workpiece by the transfer section 14. Control. The user can provide desired setting values for these values to the transport control unit 15, and the transport control unit 15 controls the transport unit 14 according to the provided set values.

An ultraviolet light irradiating apparatus 10 having the above-described respective structures
Is provided with a closed casing (not shown) in which a stable atmosphere is maintained, and realizes irradiation of ultraviolet light by the lamp device 11 while transporting the workpiece W therein.

FIG. 2 shows a dielectric excimer lamp used in the lamp device. The dielectric excimer lamp used in the present embodiment is of a water-cooled type that achieves its cooling by cooling water. The water-cooled dielectric excimer lamp 20 includes a double tube 21 as a discharge vessel made of synthetic quartz glass filled with a discharge gas 22 such as xenon gas. A mesh-shaped external electrode 23 is arranged on the outer periphery of the double tube 21, and a coil-shaped internal electrode 24 is arranged on the inner periphery. Cooling water 25 having a conductivity of 2 micro Siemens or less is flown inside the double pipe 21 by the circulation mechanism of the cooling unit 13. The cooling water absorbs heat generated from the dielectric excimer lamp 20.

In the air-cooled dielectric excimer lamp shown in FIG. 9, when a power of 2 W / cm or more is applied per its length, it becomes difficult to absorb the calorific value, and the luminous efficiency of the excimer gas decreases. , A sufficient amount of vacuum ultraviolet light could not be obtained. In the water-cooled dielectric excimer lamp as shown in FIG. 2, since the cooling water 25 flows through the inside of the double tube, even if a large driving power is applied, it is possible to prevent heat generation exceeding a certain level, Can be improved. In one embodiment, the power that can be supplied per unit length of the dielectric excimer lamp was 15 W / cm, and the irradiation light amount was more than five times that of the air cooling system.

FIG. 3 is a block diagram showing a specific configuration of the power supply control unit 12 shown in FIG. In the figure, an oscillator 31 oscillates at a driving frequency of 200 to 300 KHz, which gain is obtained by a pre-amplifier 23. The amplified drive frequency and the external rectangular signal 34 are input to the mixer 33, where they are multiplexed. The multiplexed signal passes through a main amplifier 35 to obtain a large gain, is amplified in power by a high-frequency high-voltage transformer 36, and is supplied to a dielectric excimer lamp 37. The external rectangular signal 34 is a digital signal of 1 to several tens KHz, and is FM-modulated in the mixer 33. The output of the dielectric excimer lamp 37 can be varied by varying the pulse width of the external rectangular signal (changing the pulse duty ratio). By using the high-output water-cooled dielectric excimer lamp, such output variation can be easily performed.

FIG. 4 is a conceptual diagram showing a specific method of cleaning or modifying a workpiece by the ultraviolet light irradiation device 10. In the present embodiment, an example is shown in which three lamp devices 40A to 40C each including a single dielectric excimer lamp are arranged close to each other to configure the lamp device 11 shown in FIG. The transport unit 14 and the transport control unit 15
In the present embodiment, the rectangular workpiece W is moved in one direction (from left to right in the figure) and passes through the ultraviolet light irradiation range of the lamp device 11.

The workpiece W is placed on the mounting table of the transport unit by a handling device (not shown). Prior to the transfer of the workpiece W, the dielectric excimer lamps of the lamp devices 40A to 40C are turned on. The transport unit 14 is driven according to the control signal of the transport control unit 15, and the workpiece W is moved such that the workpiece surface crosses the irradiation range of the ultraviolet light. When the entire area of the surface to be processed exceeds the ultraviolet light irradiation area, the transport by the transport unit 14 is stopped, and the lamp devices 40A to 40A
C is turned off. Through this step, the cleaning or the modification of the workpiece W is completed. Note that the position of the workpiece W with respect to the irradiation range of the ultraviolet light can be detected by a known detection method using a microswitch, an optical sensor, or the like.

Here, the moving speed of the workpiece W in the ultraviolet light irradiation area is controlled by the transport control unit 15.
The transport control unit 15 realizes the movement of the workpiece W at a suitable speed for completing the cleaning or the reforming by one pass. In the present embodiment, the moving speed V of the workpiece W in the ultraviolet light irradiation region is calculated based on the following equation.

V = aPN / J (1)

Here, a is the lamp devices 40A to 40C.
, P is the average amount of light per unit area, N is the number of dielectric excimer lamps, and J is the integrated amount of light per unit area required for cleaning or modifying the workpiece.

If the length of the workpiece W in the feed direction is L and the width is b, the integrated light amount required to process the entire surface of the workpiece W is J (L × b). The light quantity of the N lamp devices is PN (a × b). Therefore, the time t required to process the entire area of the workpiece W is

T = J (L × b) / PN (a × b) = JL / aPN Accordingly, the moving speed V for processing the workpiece W having the length L,

V = L / t = aPN / J is obtained. For example, in an ultraviolet light irradiation device in which three lamp devices having a width a = 75 mm and an average unit area irradiation light amount P = 20 mW / cm ² are arranged close to each other, an integrated light amount J per unit area required for processing is set to 100 mJ / cm ^2. , L = 8
When processing a workpiece of 80 mm, the moving speed V is:

V = 75 · 20 · 3/100 = 45 mm / s When the workpiece W passes through the ultraviolet light irradiation region, by maintaining the speed below this constant speed, necessary and sufficient processing is uniformly performed over the entire surface of the workpiece.
Note that the initial position of the workpiece W is actually determined by the ramp device 40A in consideration of the acceleration distance until the moving speed of the workpiece W reaches the constant speed. Move it slightly forward.

FIG. 5 is a conceptual diagram showing an embodiment in which the workpiece W is reciprocated in the ultraviolet light irradiation range. In the present embodiment, the workpiece W is reciprocated across the ultraviolet light irradiation range to complete the cleaning or the modification. That is, the workpiece W disposed before the lamp device 11 (the left side in the figure) is sent toward the irradiation range of the ultraviolet light by the lamp device 11, and the entire area of the processing surface completely covers the irradiation range. It is stopped once at the passing point. Then
It is sent in the opposite direction, passes through the ultraviolet irradiation range again, returns to the initial position, and stops.

In this embodiment, the workpiece W passes under the lamp device 11 twice. Therefore, in order to give the same integrated light amount to the workpiece as in the case of FIG.
The workpiece may be moved at a speed twice as high as the above speed. That is, in the case of the present embodiment, the moving speed of the workpiece W in the ultraviolet light irradiation range can be set to V = 2aPN / J or less.

FIG. 6 is a conceptual diagram showing a method of irradiating ultraviolet light according to still another embodiment of the present invention. The irradiation method according to the present embodiment is effective in an environment where the required floor area of the apparatus needs to be smaller than the processing speed. In realizing the irradiation method according to the present embodiment, the three lamp devices 40A to 40C in the above embodiment are arranged at equal intervals. When the length in the moving direction of the workpiece W is L, the pitch between the lamp devices 40A to 40C is:
It is determined based on (L + a) / N. Here, a is the width of each lamp device, and N is the number of lamp devices. In the present embodiment, three lamp devices are used, and the pitch is (L + a) / 3.

In such an arrangement of the lamp devices, the workpiece W is placed with its tip A in front of the lamp device (the lamp device 40C in the figure) installed at the innermost position in the moving direction. The three lamp devices 40A to 40C are turned on in accordance with the start of the movement of the workpiece W. As the workpiece W moves, each lamp device 40A
-40C irradiates and processes the front area, the center area, and the rear area of the surface to be processed. When the rear end B of the workpiece W exceeds the irradiation range of the foremost lamp device (the lamp device 40A in the figure), the irradiation of the entire surface to be processed with the ultraviolet light is completed. The moving distance of the workpiece W is (L + a) / N, which is the same as the pitch of the lamp.

In the same manner as in the above-described embodiment, based on the integrated light amount necessary for giving sufficient processing to each region of the surface to be processed,
The moving speed of the workpiece W is determined. Since irradiation of each region with ultraviolet light is performed by one dielectric excimer lamp, the moving speed V can be calculated from the above equation (1).
aP / J or less. For example, in an ultraviolet light irradiation device using a lamp device having a width a = 75 mm and an average unit area irradiation light amount P = 20 mW / cm ² , the integrated light amount J per unit area required for processing is set to 100 mJ / cm ^2, and L = 88
When processing a workpiece of 0 mm, the moving speed V is V =
75 · 20/100 = 15 mm / s, and the pitch between the lamp devices and the moving distance of the workpiece W are:
From (L + a) / N = (880 + 75) / 3, approximately 3
18.3 mm. Thus, the processing time of the workpiece W (the time from the start to the end of the movement) is t = 318.3.
From / 15, it is about 21.2 seconds.

FIG. 7 shows the workpiece W in the above embodiment.
FIG. 7 is a diagram showing a time change of an integrated light quantity distribution to the time. Here, for the sake of simplicity, the illuminance distribution by one lamp device is an equilateral triangle. The distribution of the integrated light amount is shown for each distance of 1/4 of the width a of the lamp device. From this figure, it is understood that the amount of light is accumulated in each region of the work surface as the work W moves. Due to the triangular illuminance distribution from each of the lamp devices 40A to 40C, the distribution of the integrated light amount on the surface to be processed is initially non-uniform depending on the location, but the rear end B of the workpiece W is the first lamp device 40A. When it exceeds, that is, when the movement distance becomes (L + a) / 3, the irradiation light amount in the entire area becomes uniform.

FIG. 8 shows an embodiment in which the workpiece W is reciprocated with the same arrangement of the lamp device as in the above embodiment. In the present embodiment, as in the case of the preceding one-way movement, the workpiece W is moved to the farthest lamp device 4.
Install before 0C. After turning on the lamp devices 40A to 40C, the workpiece W is moved rightward in the drawing to perform processing. When the rear end B of the workpiece W exceeds the ramp device 40A on the near side, that is, when the moving distance becomes (L + a) / 3, the feeding is temporarily stopped, and then the feeding is performed in the opposite direction. Then, when the workpiece W returns to the initial position, it is stopped, and the process is completed. In this case, since each area of the processing surface passes through the irradiation range of the same lamp device twice, the irradiation light amount per unit time may be half that of the above embodiment. That is, in the present embodiment,
The moving speed V of the workpiece W can be set to V = 2aP / J or less.

In the embodiment shown in FIGS. 6 and 8, the moving range of the workpiece W can be made extremely small. Therefore, an apparatus for realizing the irradiation method can be made extremely small in comparison with the size of the workpiece.

The embodiment of the present invention has been described with reference to the drawings. However, it is apparent that the present invention is not limited to the matters described in the above embodiments, and that changes, improvements, and the like can be made based on the description in the claims. In the present invention, a gas containing xenon, krypton bromide is used as a discharge gas to be filled in a discharge vessel of a dielectric excimer lamp.
Gas with (KrBr), gas with argon fluoride, gas with argon chloride, gas with argon bromide (ArBr), gas with fluorine, gas with krypton,
A gas containing argon or the like can be used.

Further, the ultraviolet light irradiation light source used in the present invention is not limited to the above-mentioned dielectric excimer lamp, but may be a light source utilizing ultraviolet emission by exciting various excimer gases by microwaves, or an excitation of various excimer gases by electrons. It is also possible to use one utilizing ultraviolet light emission by the above method.

Further, in the above-described embodiment, an example is shown in which a lamp device including three dielectric excimer lamps is used. However, the number of dielectric excimer lamps is not limited to this, and the number is one. There may be. The workpiece to be cleaned or modified by the present invention is not necessarily limited to a rectangular workpiece, but may be a circular workpiece such as a semiconductor wafer.

[0057]

As described above, according to the present invention, a large workpiece can be uniformly irradiated with ultraviolet light over the entire area, and the quality of cleaning or modification can be improved.

Further, the number of light sources for irradiating ultraviolet light required for cleaning or modifying a large workpiece can be extremely reduced, thereby lowering the manufacturing cost and running cost of the apparatus. Can be reduced in size. Furthermore, by reducing the number of light sources, the possibility of failure is reduced and the reliability of the device is improved.

Further, in the present invention in which a plurality of ultraviolet light irradiation light sources are divided and arranged, the moving distance of the workpiece can be extremely reduced, so that the apparatus can be further miniaturized.

[Brief description of the drawings]

FIG. 1 is a configuration block diagram of an ultraviolet light irradiation device according to an embodiment of the present invention.

2 is a front and side sectional view of a water-cooled dielectric excimer lamp used in the lamp device of FIG. 1;

FIG. 3 is a specific configuration block diagram of a power supply control unit in FIG. 1;

FIG. 4 is a conceptual diagram showing an embodiment in which a workpiece is moved in one direction within an ultraviolet light irradiation range.

FIG. 5 is a conceptual diagram illustrating an embodiment in which a workpiece is reciprocated within an ultraviolet light irradiation range.

FIG. 6 is a conceptual diagram showing an ultraviolet light irradiation method according to another embodiment of the present invention in which a lamp device is divided and arranged.

FIG. 7 is a diagram showing a time change of an integrated light quantity distribution on a workpiece in the embodiment of FIG. 6;

FIG. 8 is a conceptual diagram showing an embodiment in which a workpiece is reciprocated with the same arrangement of the lamp device as the embodiment of FIG. 6;

FIG. 9 is a front and side sectional view of an air-cooled dielectric excimer lamp.

FIG. 10A is a schematic configuration diagram of a lamp device including a dielectric excimer lamp, and FIG. 10B is a diagram illustrating a light emission amount distribution in a width direction of the lamp device.

FIG. 11 is a schematic configuration diagram of a conventional multi-lamp collective surface irradiation method.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 Ultraviolet light irradiation device 11 Lamp device 12 Power control unit 13 Cooling unit 14 Transport unit 15 Transport control unit 20 Dielectric excimer lamp 21 Double tube 22 Discharge gas 23 External electrode 24 Internal electrode 25 Cooling water 31 Oscillator 32 Preamplifier 33 Mixer 34 External rectangular signal 35 Main amplifier 36 High frequency high voltage transformer 37 Dielectric excimer lamp 40A-40C Lamp device W Workpiece

Claims (17)

[Claims] 1. An ultraviolet light irradiation apparatus for irradiating a processing surface of a workpiece with ultraviolet light to clean or modify the ultraviolet light, comprising: an ultraviolet light irradiation light source; A moving means for linearly moving the light irradiation light source linearly across the irradiation range of the ultraviolet light in the width direction thereof, and a relative movement speed of the workpiece in the irradiation range of the ultraviolet light is aP / J (a Is the width of the ultraviolet light irradiation light source, P is the average light amount per unit area, J is the integrated light amount per unit area required for cleaning or modifying the work piece) or less, and the work piece is irradiated with the ultraviolet light. Control means for controlling the moving means so as to relatively move in one direction with respect to the light source. 2. The apparatus according to claim 1, wherein the relative movement speed of the workpiece in the irradiation range of the ultraviolet light is 2 aP / J or less, and the workpiece relatively moves in a reciprocating direction with respect to the ultraviolet light irradiation light source. And controlling the moving means.
The ultraviolet light irradiation device as described in the above. 3. An ultraviolet light irradiation apparatus for irradiating a work surface of a work with ultraviolet light for cleaning or modifying the work, comprising: N ultraviolet light irradiation light sources arranged in parallel and close to each other; A moving means for linearly moving the workpiece relative to the ultraviolet light irradiation light source so as to cross the ultraviolet light irradiation range in the direction in which the ultraviolet light irradiation light source is arranged, and moving the workpiece in the ultraviolet light irradiation range. The relative moving speed is not more than aPN / J (a is the width of the ultraviolet light irradiation light source, P is the average light amount per unit area, J is the integrated light amount per unit area required for cleaning or modifying the workpiece), Control means for controlling the moving means so that the workpiece relatively moves in one direction with respect to the ultraviolet light irradiation light source. 4. The control means moves the workpiece relative to the ultraviolet light source in a reciprocating direction with a relative movement speed of the workpiece in an irradiation range of the ultraviolet light of 2aPN / J or less. 4. The ultraviolet light irradiation device according to claim 3, wherein said moving means is controlled. 5. An ultraviolet light irradiation apparatus for irradiating a surface to be processed of a workpiece with ultraviolet light to clean or modify the surface, wherein N light sources for irradiating ultraviolet light are arranged in parallel. The pitch between the ultraviolet light irradiation light sources is (L + a) / N (L is the length of the workpiece, a is the width of the ultraviolet light irradiation light source); Moving means for linearly moving relative to the ultraviolet light irradiation light source in the direction in which the ultraviolet light irradiation light source crosses the ultraviolet light irradiation range; and a relative moving distance of the workpiece in the ultraviolet light irradiation range is ( Control means for controlling the moving means so as to satisfy L + a) / N. 6. The control means, wherein the relative movement speed of the workpiece in the range of irradiation of the ultraviolet light is aP / J (P is an average light amount per unit area, J is cleaning or reforming of the workpiece). 6. The ultraviolet light irradiation device according to claim 5, wherein the moving means is controlled so that the workpiece relatively moves in one direction with respect to the ultraviolet light irradiation light source when the integrated light amount per unit area required for the operation is equal to or less. 7. The controller according to claim 1, wherein the relative moving speed of the workpiece in the irradiation range of the ultraviolet light is 2 aP / J (P
Is the average light quantity per unit area, J is the integrated light quantity per unit area required for cleaning or modifying the work), and the work relatively moves in the reciprocating direction with respect to the ultraviolet light irradiation light source. 6. The ultraviolet light irradiation apparatus according to claim 5, wherein said moving means is controlled. 8. The ultraviolet light irradiation device according to claim 1, wherein the ultraviolet light irradiation light source is a dielectric excimer lamp. 9. An ultraviolet light irradiation method for irradiating a surface to be processed of an object with ultraviolet light to clean or modify the surface, comprising: starting irradiation of ultraviolet light by an ultraviolet light irradiation light source; A step of linearly moving the workpiece relative to the ultraviolet light irradiation light source in a width direction thereof so as to cross the ultraviolet light irradiation range, wherein the workpiece in the ultraviolet light irradiation range Is aP / J (a is the width of the ultraviolet light irradiation light source, P is the average amount of light per unit area,
J is an integrated light amount per unit area required for cleaning or modifying the workpiece) or less, and the workpiece is controlled to move in one direction relative to the ultraviolet light irradiation light source. UV light irradiation method. 10. An ultraviolet light irradiation method for irradiating a work surface of a work with ultraviolet light to clean or modify the work surface, the method comprising: starting irradiation of ultraviolet light by an ultraviolet light irradiation light source; A step of linearly moving the workpiece relative to the ultraviolet light irradiation light source in a width direction thereof so as to cross the ultraviolet light irradiation range, wherein the workpiece in the ultraviolet light irradiation range Is less than or equal to 2aP / J (a is the width of the ultraviolet light irradiation light source, P is the average light amount per unit area, J is the integrated light amount per unit area necessary for cleaning or reforming the workpiece). Controlled so that the workpiece relatively moves in a reciprocating direction with respect to the ultraviolet light irradiation light source. 11. An ultraviolet light irradiation method for irradiating a surface to be processed of an object with ultraviolet light to clean or modify the surface, comprising: N light sources arranged in parallel and close to each other; A step of starting irradiation of ultraviolet light; anda step of linearly moving the workpiece linearly relative to the ultraviolet light irradiation light source so as to cross the irradiation range of the ultraviolet light in a direction in which the light sources are arranged. The relative movement speed of the workpiece in the light irradiation range is aPN / J (a
Is the width of the ultraviolet light irradiation light source, P is the average light amount per unit area, J is the integrated light amount per unit area required for cleaning or modifying the work piece) or less, and the work piece is irradiated with the ultraviolet light. One controlled to move relative to the light source in one direction;
An ultraviolet light irradiation method comprising: 12. An ultraviolet light irradiation method for irradiating a surface to be processed of an object with ultraviolet light to clean or modify the surface, comprising: N ultraviolet light irradiation light sources arranged in parallel and close to each other. A step of starting irradiation of ultraviolet light; anda step of linearly moving the workpiece linearly relative to the ultraviolet light irradiation light source so as to cross the irradiation range of the ultraviolet light in a direction in which the light sources are arranged. The relative movement speed of the workpiece in the light irradiation range is 2aPN / J
(A is the width of the ultraviolet light irradiation light source, P is the average amount of light per unit area, J is the integrated amount of light per unit area required for cleaning or reforming the work). Controlled to move relative to a light irradiation light source in a reciprocating direction. 13. An ultraviolet light irradiation method for irradiating a work surface of a work with ultraviolet light to clean or modify the work surface, wherein the N ultraviolet light irradiation light sources are arranged in parallel. A step of preparing a material in which the pitch between the ultraviolet light irradiation light sources is (L + a) / N (L is the length of the workpiece and a is the width of the ultraviolet light source); Arranging the length direction thereof under the ultraviolet light irradiation light source so as to coincide with the arrangement direction of the ultraviolet light irradiation light source, and starting irradiation of ultraviolet light by the N ultraviolet light irradiation light sources; The step of linearly moving the workpiece relative to the ultraviolet light irradiation light source so as to cross the irradiation range of the ultraviolet light in the direction in which the workpieces are arranged, and the relative position of the workpiece in the irradiation range of the ultraviolet light. Moving distance is (L + a) / N
Which is controlled so as to satisfy the following conditions. 14. The step of arranging the workpiece, wherein the tip of the workpiece in the moving direction is positioned in front of the deepest ultraviolet light source in the moving direction. UV light irradiation method. 15. The method according to claim 15, wherein the relative movement speed of the workpiece in the ultraviolet light irradiation range is aP / J (where P is the average light amount per unit area, and J is the workpiece 2. The apparatus according to claim 1, wherein the workpiece is controlled so as to move in one direction relative to the ultraviolet light irradiation light source when the integrated light quantity per unit area required for cleaning or modifying the workpiece is equal to or less.
15. The ultraviolet light irradiation method according to 3 or 14. 16. The step of relative moving the workpiece includes the step of controlling the relative movement speed of the workpiece in the irradiation range of the ultraviolet light to 2aP / J (where P is the average amount of light per unit area, and J is the workpiece). 15. The ultraviolet light according to claim 13, wherein the workpiece is controlled to move relative to the ultraviolet light irradiation light source in a reciprocating direction when the integrated light quantity per unit area required for cleaning or modifying the workpiece is equal to or less than 15. Irradiation method. 17. The ultraviolet light irradiation method according to claim 9, wherein the ultraviolet light irradiation light source is a dielectric excimer lamp.