HK1189427A1 - Semiconductor devices with back surface isolation - Google Patents
Semiconductor devices with back surface isolationInfo
- Publication number
- HK1189427A1 HK1189427A1 HK14102494.1A HK14102494A HK1189427A1 HK 1189427 A1 HK1189427 A1 HK 1189427A1 HK 14102494 A HK14102494 A HK 14102494A HK 1189427 A1 HK1189427 A1 HK 1189427A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- back surface
- semiconductor devices
- surface isolation
- isolation
- semiconductor
- Prior art date
Links
- 238000002955 isolation Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/74—Making of localized buried regions, e.g. buried collector layers, internal connections substrate contacts
- H01L21/743—Making of internal connections, substrate contacts
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- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
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- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76283—Lateral isolation by refilling of trenches with dielectric material
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- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US42315710P | 2010-12-15 | 2010-12-15 | |
PCT/US2011/064803 WO2012082840A1 (en) | 2010-12-15 | 2011-12-14 | Semiconductor devices with back surface isolation |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1189427A1 true HK1189427A1 (en) | 2014-06-06 |
Family
ID=46233211
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK14102494.1A HK1189427A1 (en) | 2010-12-15 | 2014-03-12 | Semiconductor devices with back surface isolation |
Country Status (8)
Country | Link |
---|---|
US (3) | US9607876B2 (en) |
JP (1) | JP2014504013A (en) |
KR (1) | KR20130126948A (en) |
CN (1) | CN103329256B (en) |
DE (1) | DE112011104408T5 (en) |
HK (1) | HK1189427A1 (en) |
TW (1) | TWI572037B (en) |
WO (1) | WO2012082840A1 (en) |
Families Citing this family (60)
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CN103329256B (en) | 2010-12-15 | 2016-09-21 | 宜普电源转换公司 | There is the semiconductor device of rear surface isolation |
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JP2014056938A (en) * | 2012-09-12 | 2014-03-27 | Fujitsu Semiconductor Ltd | Semiconductor device and manufacturing method of the same |
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CN103329256A (en) | 2013-09-25 |
CN103329256B (en) | 2016-09-21 |
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