CN201670871U - Novel high-efficient coater - Google Patents
Novel high-efficient coater Download PDFInfo
- Publication number
- CN201670871U CN201670871U CN2010201829211U CN201020182921U CN201670871U CN 201670871 U CN201670871 U CN 201670871U CN 2010201829211 U CN2010201829211 U CN 2010201829211U CN 201020182921 U CN201020182921 U CN 201020182921U CN 201670871 U CN201670871 U CN 201670871U
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- coating chamber
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- vacuum
- magnetron sputtering
- vacuum coating
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Abstract
The utility model provides a novel high-efficient coater, which comprises a vacuum coating chamber, wherein the inner wall of the vacuum coating chamber is provided with a heat-insulating shielding layer, and the outer wall of the vacuum coating chamber is connected with a vacuum pumping system. One or more magnetron sputtering targets are mounted in the vacuum coating chamber, and are positioned along a circumference which is at a certain distance away from the center of the vacuum coating chamber. One or more work rests are mounted along a circumference between the circumference with the magnetron sputtering targets and the center of the vacuum coating chamber. Likewise, one or more work rests are also mounted along a circumference between the circumference with the magnetron sputtering targets and the inner wall of the vacuum coating chamber. Since the utility model arranges the inner and the outer circles of work rest structures in the vacuum coating chamber, the number of coated products per batch can be increased, the quality of coating is guaranteed as well, moreover, the internal space of the vacuum coating chamber can be effectively and reasonably utilized, and thereby energy consumption is greatly reduced.
Description
Technical field
The utility model relates to a kind of new and effective film coating apparatus, belongs to technical field of vacuum plating.
Background technology
In the prior art, vacuum coating technology is for scientific research and the novel process that provides rete to apply is provided, for wide application field such as optical research, semiconductor electronics, Surface Science, decoration industry provide new technique means.Along with the develop rapidly of vacuum coating technology, with and the continuous extension and the expansion of Application Areas, the design and the manufacture level that drive domestic vacuum coating film equipment are greatly improved, shortened in many aspects and developed country between gap.
Existing magnetic control sputtering film plating device is many to be installed in magnetron sputtering target on the center or inwall of vacuum film coating chamber.No matter to be installed in the center of vacuum film coating chamber still be on the inwall to magnetron sputtering target, the indoor workpiece pivoted frame of vacuum plating only may be installed a circle, although such layout can realize better and quickly being coated with rete, but will cause the waste of space and resource for the bigger vacuum film coating chamber of size, be unfavorable for reducing production costs to realize large-scale commercial production.
The utility model content
Given this, the purpose of this utility model is to provide a kind of new and effective film coating apparatus, it adopts in that vacuum plating is indoor and is provided with inside and outside two circle workpiece pivoted frame structures, can improve the quantity of every stove plated film product and guarantee coating quality, but also can utilize the internal space of vacuum film coating chamber, thereby the consumption of having saved the energy effective and reasonablely.
For achieving the above object, the technical scheme that the utility model provides is: a kind of new and effective film coating apparatus, comprise a vacuum film coating chamber, and on this vacuum plating chamber interior walls, be provided with the thermal stabilization shield layer, be connected to vacuum-pumping system on the outer wall.
Described vacuum plating is indoor to be equipped with one or more magnetron sputtering targets, and magnetron sputtering target is positioned at one on the circumference of vacuum film coating chamber center certain distance.
On the circumference between above-mentioned magnetron sputtering target place circumference and the vacuum film coating chamber center, one or more work rests are installed.
On the circumference between above-mentioned magnetron sputtering target place circumference and the vacuum plating chamber interior walls, one or more work rests are installed equally.
Described work rest all can drive workpiece and realize rotation and revolution.
Described magnetron sputtering target can be the fixed planar target, also can be the post target that can rotate.
Technique effect of the present utility model is: the indoor magnetron sputtering target of the vacuum plating in the utility model installation site is circle-shaped distribution, and inside and outside magnetron sputtering target distribution circumference, be provided with two circle workpiece pivoted frame structures, such layout both can increase the quantity of every stove plated film product and guarantee coating quality, can utilize the internal space of vacuum film coating chamber again effective and reasonablely, thereby greatly save energy consumption.
Description of drawings
Fig. 1 is the utility model preferred embodiment vertical view.
Embodiment
As shown in Figure 1, the utility model preferred embodiment has a vacuum film coating chamber 1, and thermal stabilization shield layer 2 is housed on the wall within it, is connected to vacuum-pumping system 3 on the outer wall.Vacuum film coating chamber 1 can adopt vertical, horizontal cylindrical housings, also can adopt square casing.Described vacuum-pumping system 3 is made up of mechanical pump, lobe pump, molecular pump, valve and connecting tube.
One or more magnetron sputtering targets 10 are installed in vacuum film coating chamber 1, and described magnetron sputtering target 10 is positioned at one on the circumference A of vacuum film coating chamber 1 center certain distance, and in this preferred embodiment, circumference A is about 512.5mm apart from the distance at vacuum film coating chamber 1 center.Magnetron sputtering target 10 can be the fixed planar target, also can be the post target that can rotate.On the circumference B between above-mentioned magnetron sputtering target 10 place circumference A and vacuum film coating chamber 1 center one or more work rests 20 are installed, in this preferred embodiment, the radial distance between circumference A, the B is about 172.5mm.Equally, on the circumference C between above-mentioned magnetron sputtering target 10 place circumference A and vacuum film coating chamber 1 inwall one or more work rests 20 are installed also, in this preferred embodiment, the radial distance between circumference A, the C is about 172.5mm equally.The instrument that above-mentioned work rest 20 makes workpiece turn round for holding workpiece simultaneously, it adopts chain drive system to realize the rotation of workpiece and revolve round the sun two kinds moving, to reach the purpose that thin-film-coating evenly reaches non-stop run.When magnetron sputtering target 10 was started working, sputter material can be splashed to circumference B simultaneously and circumference C goes up the workpiece surface that rotates.And can guarantee that by magneticstrength and the field direction of adjusting magnetron sputtering target 10 inner ring circumference B and outer ring circumference C go up the coating quality uniformity of workpiece.
The installation site of magnetron sputtering target 10 is circle-shaped distribution in the vacuum film coating chamber 1 of the utility model preferred embodiment, and adopt inside and outside two circle workpiece pivoted frame structures, such layout both can increase the quantity of every stove plated film product and guarantee coating quality, can utilize the internal space of vacuum film coating chamber 1 again effective and reasonablely, thereby greatly save energy consumption.
The ordinary person in present technique field should be realized that; above embodiment just is used for illustrating the utility model; and be not with opposing qualification of the present utility model; as long as within connotation scope of the present utility model, appropriate change and the variation that above embodiment did all dropped within the claimed scope of the utility model.
Claims (3)
1. a new and effective film coating apparatus comprises a vacuum film coating chamber, is provided with the thermal stabilization shield layer on this vacuum plating chamber interior walls, is connected to vacuum-pumping system on the outer wall, it is characterized in that:
Described vacuum plating is indoor to be equipped with one or more magnetron sputtering targets, and described magnetron sputtering target is positioned at one on the circumference of vacuum film coating chamber center certain distance;
On the circumference between above-mentioned magnetron sputtering target place circumference and the vacuum film coating chamber center, one or more work rests are installed;
On the circumference between above-mentioned magnetron sputtering target place circumference and the vacuum plating chamber interior walls, one or more work rests are installed equally.
2. new and effective film coating apparatus according to claim 1 is characterized in that, described work rest all can drive workpiece and realize rotation and revolution.
3. new and effective film coating apparatus according to claim 1 is characterized in that, described magnetron sputtering target can be the fixed planar target, also can be the post target that can rotate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201829211U CN201670871U (en) | 2010-04-01 | 2010-04-01 | Novel high-efficient coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201829211U CN201670871U (en) | 2010-04-01 | 2010-04-01 | Novel high-efficient coater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201670871U true CN201670871U (en) | 2010-12-15 |
Family
ID=43328283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201829211U Expired - Lifetime CN201670871U (en) | 2010-04-01 | 2010-04-01 | Novel high-efficient coater |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201670871U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102994960A (en) * | 2011-09-14 | 2013-03-27 | 鸿富锦精密工业（深圳）有限公司 | Arc ion coating device |
| CN103820766A (en) * | 2014-03-22 | 2014-05-28 | 沈阳中北真空设备有限公司 | Magnetron coating apparatus for neodymium-iron-boron rare-earth permanent magnet devices, and manufacturing method thereof |
| CN103820765A (en) * | 2014-03-22 | 2014-05-28 | 沈阳中北真空设备有限公司 | Composite coating equipment and manufacturing method for neodymium iron boron rare-earth permanent magnetic device |
| CN110387525A (en) * | 2019-08-15 | 2019-10-29 | 常州机电职业技术学院 | A kind of medical apparatus surface titanizing processing unit and processing method |
| CN112195447A (en) * | 2020-10-26 | 2021-01-08 | 天长市石峰玻璃有限公司 | Vacuum coating machine for glass bottle based on automatic control |
-
2010
- 2010-04-01 CN CN2010201829211U patent/CN201670871U/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102994960A (en) * | 2011-09-14 | 2013-03-27 | 鸿富锦精密工业（深圳）有限公司 | Arc ion coating device |
| CN103820766A (en) * | 2014-03-22 | 2014-05-28 | 沈阳中北真空设备有限公司 | Magnetron coating apparatus for neodymium-iron-boron rare-earth permanent magnet devices, and manufacturing method thereof |
| CN103820765A (en) * | 2014-03-22 | 2014-05-28 | 沈阳中北真空设备有限公司 | Composite coating equipment and manufacturing method for neodymium iron boron rare-earth permanent magnetic device |
| CN103820766B (en) * | 2014-03-22 | 2016-04-06 | 沈阳中北真空设备有限公司 | A kind of magnetic control film coating equipment of neodymium iron boron rare earth permanent magnet device and manufacture method |
| CN110387525A (en) * | 2019-08-15 | 2019-10-29 | 常州机电职业技术学院 | A kind of medical apparatus surface titanizing processing unit and processing method |
| CN112195447A (en) * | 2020-10-26 | 2021-01-08 | 天长市石峰玻璃有限公司 | Vacuum coating machine for glass bottle based on automatic control |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: TRITREE METAL (SHENZHEN) CO., LTD. Free format text: FORMER OWNER: SHENZHEN SENFUNG VACUUM PLATING CO., LTD. Effective date: 20110217 Free format text: FORMER OWNER: TRITREE METAL (SHENZHEN) CO., LTD. |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 518101 8/F, YINJIN INDUSTRY BUILDING, LIUXIAN ROAD 1, AREA 71, BAOAN DISTRICT, SHENZHEN CITY, GUANGDONG PROVINCE TO: 518106 BUILDING 7, SHIGUAN INDUSTRIAL PARK, GONGMING SUBDISTRICT OFFICE, GUANGMING NEW DISTRICT, SHENZHEN CITY, GUANGDONG PROVINCE |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20110217 Address after: 518106, Shenzhen, Guangming District, Guangdong province Gongming Street Stone Industry Park seventh Patentee after: Tritree Metal (Shenzhen) Co.,Ltd. Address before: Shenzhen City, Guangdong province Baoan District 518101 District 71 Liuxian road Arts crafts emporium eighth introduction Co-patentee before: Tritree Metal (Shenzhen) Co.,Ltd. Patentee before: SenFung Vacuum Plating Co., Ltd. |
|
| CX01 | Expiry of patent term |
Granted publication date: 20101215 |
|
| CX01 | Expiry of patent term |