CN109487216A - Source application and OLED evaporator - Google Patents
Source application and OLED evaporator Download PDFInfo
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- CN109487216A CN109487216A CN201811634379.6A CN201811634379A CN109487216A CN 109487216 A CN109487216 A CN 109487216A CN 201811634379 A CN201811634379 A CN 201811634379A CN 109487216 A CN109487216 A CN 109487216A
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- Prior art keywords
- crucible
- cavity
- line source
- deflector
- source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The application provides a kind of source application and OLED evaporator comprising line source mechanism and at least two crucible mechanisms, line source mechanism include a line source cavity；Each crucible mechanism is arranged at the outside of line source mechanism, and each crucible mechanism includes a crucible cavity and connection valve；Connection valve is arranged between crucible cavity and line source cavity, and for separating or being connected to crucible cavity with line source cavity.The application passes through the setting of at least two crucible mechanisms, improves the service efficiency of equipment, reduces equipment feed time.
Description
Technical field
This application involves a kind of ORGANIC ELECTROLUMINESCENCE DISPLAYS technology, in particular to a kind of source application and OLED evaporator.
Background technique
OLED (Organic Light Emitting Diode, Organic Light Emitting Diode) display processing procedure key is exactly will
Luminous organic material is filled into TFT (Thin Film Transistor, thin film transistor (TFT)) substrate pixel, and volume production is universal at present
The vacuum evaporation mode of use, i.e., for drop organic material heating evaporation to TFT substrate pixel, volume production vapor deposition is red green under vacuum conditions
The luminous film material of indigo plant usually uses linear evaporation source and linear crucible, and line source and crucible are integrated design in rectangular shape, most
Outside is linear sources, and loaded on line source the inside, organic material loaded on inside crucible, crucible adds crucible cover for interior design heater strip, crucible,
There is nozzle on crucible cover, organic material is uniformly evaporated by heating sublimation from nozzle and TFT substrate.
Organic material needs periodically begin to speak to add in vapor deposition processing procedure, since vapor deposition environment is high vacuum environment, add every time
Material needs vacuum breaker, takes out crucible added material, then close cavity vacuumizes, and downtime is long, and body of beginning to speak is easy pollution chamber
Body all has an impact to process rate and equipment mobility.
Summary of the invention
The embodiment of the present application provides a kind of efficient source application and OLED evaporator, is existed with solving existing source application
During vacuum evaporation, when adding evaporation material, time-consuming and begins to speak to be easy the technical issues of polluting when body.
The embodiment of the present application provides a kind of source application comprising:
One line source mechanism, for by gaseous state organic material spraying plating to TFT substrate, the line source mechanism to include a line source chamber
Body；And
At least two crucible mechanisms, for providing gaseous state organic material, each crucible mechanism is arranged at the line
The outside of source mechanism, each crucible mechanism include a crucible cavity and connection valve；
The connection valve is arranged between the crucible cavity and the line source cavity, and for by the crucible cavity and
The line source cavity is separated or is connected to.
In the source application of the application, the line source mechanism includes multiple nozzles, and the multiple nozzle is connected to described
Line source cavity and the side for being located at the line source cavity, the other side of the line source cavity offers at least two openings, described
Opening and the crucible mechanism correspond, and each crucible mechanism is corresponding to be fixed at the opening.
In the source application of the application, the multiple nozzle is arranged in array, and the nozzle between adjacent rows is staggered
Setting.
In the source application of the application, the line source mechanism further includes at least two deflectors, and described at least two lead
Flowing plate is spaced apart from each other setting and is arranged between the nozzle and the opening；
Through-hole is offered on each deflector, the through-hole is for leading the gaseous state organic material in the crucible mechanism
It flow to the nozzle；
Wherein the through-hole between the adjacent deflector is staggered setting；And from a side of the opening to the nozzle
Side, the decreasing pore size of through-hole on the deflector.
In the source application of the application, from a side of the opening to the side of the nozzle, lead on the deflector
The density in hole is incremented by.
In the source application of the application, the line source mechanism include at least two primary heaters, each described first
Heater is for heating a deflector；Each primary heater includes heating wire, is opened up on each deflector
There is channel, the heating wire is arranged in the channel；
The heating wire extends to the other end from one end of the deflector, and there are two heating for the primary heater setting
End, two fire ends are located at the both ends of the same deflector and are connected to the heating wire.
In the source application of the application, each crucible mechanism further includes secondary heater, crucible and vacuum pump；Institute
It states secondary heater to be arranged on the crucible cavity, the crucible is arranged in the crucible cavity, the vacuum pump setting
In the outside of the crucible cavity, the vacuum pump is for vacuumizing the crucible cavity or inflating to the crucible cavity.
In the source application of the application, the line source mechanism further includes the first cooling layer and first thermal insulation layer, the earthenware
Crucible mechanism further includes the second cooling layer and second thermal insulation layer；
First cooling layer is arranged on the outer wall of the line source cavity, and the first thermal insulation layer is arranged described first
Between cooling layer and the line source cavity；Second cooling layer is arranged on the outer wall of the crucible cavity, described second every
Thermosphere is arranged between second cooling layer and the crucible cavity.
The application further relates to a kind of OLED evaporator comprising:
One vapor deposition cavity, for OLED operation to be deposited；And
One source application, for spraying gaseous state organic material, the source application includes:
One line source mechanism is arranged in the vapor deposition cavity and is used for gaseous state organic material spraying plating to TFT substrate, institute
Stating line source mechanism includes a line source cavity；And
At least two crucible mechanisms are arranged on the outside of the vapor deposition cavity, each described for providing gaseous state organic material
Crucible mechanism is arranged at the outside of the line source mechanism, and each crucible mechanism includes a crucible cavity and a connection
Valve；
The connection valve is arranged between the crucible cavity and the line source cavity, and for by the crucible cavity and
The line source cavity is separated or is connected to.
In the OLED evaporator of the application, the line source mechanism includes multiple nozzles, and the multiple nozzle is connected to institute
It states line source cavity and is located at the side of the line source cavity, the other side of the line source cavity offers at least two openings, institute
It states opening and the crucible mechanism corresponds, each crucible mechanism is corresponding to be fixed at the opening.
In the OLED evaporator of the application, the multiple nozzle is arranged in array, and the nozzle phase between adjacent rows
Mistake setting.
In the OLED evaporator of the application, the line source mechanism further includes at least two deflectors, and described at least two
Deflector is spaced apart from each other setting and is arranged between the nozzle and the opening；
Through-hole is offered on each deflector, the through-hole is for leading the gaseous state organic material in the crucible mechanism
It flow to the nozzle；
Wherein the through-hole between the adjacent deflector is staggered setting；And from a side of the opening to the nozzle
Side, the decreasing pore size of through-hole on the deflector.
In the OLED evaporator of the application, from a side of the opening to the side of the nozzle, on the deflector
The density of through-hole is incremented by.
In the OLED evaporator of the application, the line source mechanism includes at least two primary heaters, and each described the
One heater is for heating a deflector；Each primary heater includes heating wire, is opened on each deflector
Equipped with channel, the heating wire is arranged in the channel；
The heating wire extends to the other end from one end of the deflector, and there are two heating for the primary heater setting
End, two fire ends are located at the both ends of the same deflector and are connected to the heating wire.
In the OLED evaporator of the application, each crucible mechanism further includes secondary heater, crucible and vacuum pump；
The secondary heater is arranged on the crucible cavity, and the crucible is arranged in the crucible cavity, and the vacuum pump is set
It sets in the outside of the crucible cavity, the vacuum pump is for vacuumizing the crucible cavity or filling to the crucible cavity
Gas.
In the OLED evaporator of the application, the line source mechanism further includes the first cooling layer and first thermal insulation layer, described
Crucible mechanism further includes the second cooling layer and second thermal insulation layer；
First cooling layer is arranged on the outer wall of the line source cavity, and the first thermal insulation layer is arranged described first
Between cooling layer and the line source cavity；Second cooling layer is arranged on the outer wall of the crucible cavity, described second every
Thermosphere is arranged between second cooling layer and the crucible cavity.
Source application and OLED evaporator compared to the prior art, the source application and OLED evaporator of the application pass through
The setting of at least two crucible mechanisms, so that one of crucible mechanism works, other crucible mechanisms are in working condition, this
The setting of sample improves the service efficiency of equipment, reduces equipment feed time；In addition, in OLED evaporator, by crucible machine
Structure is provided with outside vapor deposition cavity, when carrying out replacement crucible mechanism work, be can avoid opening vapor deposition cavity, is reduced vapor deposition
The intracorporal pollution of chamber, improves production yield；And in OLED evaporator, when needing to add organic material, only need to open
There is no the crucible mechanism of material, cavity is deposited without opening, begins to speak the time to reduce and save the gentle energy of electricity.Solution
Existing source application determined during vacuum evaporation, when adding evaporation material, time-consuming and begins to speak to be easy pollution when body
Technical problem.
Detailed description of the invention
In order to illustrate the technical solutions in the embodiments of the present application or in the prior art more clearly, below to required in embodiment
Attached drawing to be used is briefly described.The accompanying drawings in the following description is only the section Example of the application, general for this field
For logical technical staff, without creative efforts, other attached drawings can also be obtained according to these attached drawings.
Fig. 1 is the structural schematic diagram of the embodiment of the source application of the application；
Fig. 2 is the deflector of the embodiment of the source application of the application and the structural schematic diagram of heater；
Fig. 3 is the structural schematic diagram of the embodiment of the OLED evaporator of the application.
Specific embodiment
The schema in attached drawing is please referred to, wherein identical component symbol represents identical component.The following description is to be based on
Illustrated by the application specific embodiment, be not construed as limitation the application other specific embodiments not detailed herein.
Fig. 1 is please referred to, Fig. 1 is the structural schematic diagram of the embodiment of the source application of the application.The line of the embodiment of the present application
Source device 100 comprising a line source mechanism 10 and at least two crucible mechanisms 20.
Line source mechanism 10 is used for gaseous state organic material spraying plating to external TFT substrate.Line source mechanism 10 includes a line source
Cavity 11.Crucible mechanism 20 is for providing gaseous state organic material.Each crucible mechanism 20 is arranged at the outside of line source mechanism 10.
Each crucible mechanism 20 includes a crucible cavity 21 and connection valve 22.
Connection valve 22 is arranged between crucible cavity 21 and line source cavity 11, and is used for crucible cavity 21 and line source cavity
11 separate or are connected to.
In the present embodiment, when source application 100 is in running order, one of crucible mechanism 20 and line source mechanism
10 connections are simultaneously in running order, other crucible mechanisms 20 are isolated with line source mechanism 10 and in working condition.And works as and be in
After the organic material of the crucible mechanism 20 of working condition is finished, the crucible mechanism 20 can be closed, make itself and line source mechanism 10 every
From.Another crucible mechanism 20 is then turned on, is connected to it with line source mechanism 10, and start to work.And organic material is finished
Crucible mechanism 20 begin to speak and carry out the addition of organic material, and source application 100 works simultaneously.Such setting improves
The service efficiency of equipment, reduces equipment feed time.
In addition, avoiding the feelings that line source mechanism 10 begins to speak because lacking material in such a way that crucible mechanism 20 works alternatively
Condition, and then the line source cavity 11 for reducing line source mechanism 10 is contaminated.
It should be noted that the present embodiment is illustrated for two crucible mechanisms 20 are arranged, but it is not limited to this.
In the embodiment of source application 100, line source mechanism 10 includes multiple nozzles 12.Multiple nozzles 12 are connected to line source
Cavity 11 and the side for being located at line source cavity 11.The other side of line source cavity 11 offers at least two openings 13.Be open 13 Hes
Crucible mechanism 20 corresponds.Each crucible mechanism 20 is corresponding to be fixed at opening 13.
Crucible mechanism 20 is arranged in the opposite side of nozzle 12, is on the one hand convenient for for crucible mechanism 20 being arranged in external vapor deposition
Except the vapor deposition cavity of machine, and it can make the setting of line source mechanism 10 in vapor deposition cavity；On the other hand, such setting is shortened
Crucible mechanism 20 arrives the distance of nozzle 12, to improve the spray efficiency of gaseous state organic material.
In the embodiment of source application 100, multiple nozzles 12 are arranged in array, and 12 phase of nozzle between adjacent rows
Mistake setting.Such setting, in short-range OLED spraying process, the problem of due to mobile accuracy, avoid adjacent column it
Between nozzle 12 repeat to spray the same OLED device so that organic film the phenomenon that there are thickness difference and out-of-flatnesses.I.e. in this way
Setting, improve the homogeneity of organic film.
In the embodiment of source application 100, line source mechanism 10 further includes at least two deflectors 14.At least two water conservancy diversion
Plate 14 is spaced apart from each other setting and setting between nozzle 12 and opening 13.In the present embodiment, there are two the settings of deflector 14, and
The quantity of deflector 14 is not limited to this in some embodiments.
Through-hole 141 is offered on each deflector 14.Through-hole 141 is used for the gaseous state organic material in crucible mechanism 20
It is guided to nozzle 12.
Wherein the through-hole 141 between adjacent deflector 14 is staggered setting.And from a side of opening 13 to the one of nozzle 12
Side, the decreasing pore size of through-hole 141 on deflector 14.
In the present embodiment, close to the deflector 14 of crucible mechanism 20, the mesh of guidance gaseous state organic material is on the one hand played
's；On the other hand, it in conjunction with the setting that the through-hole of two deflectors 14 is staggered, plays buffering gaseous state organic material and nozzle 12 is rushed
The effect hit.In addition, the aperture setting that will be close to the through-hole 141 of the deflector 14 of crucible mechanism 20 is big, it is convenient for the organic material of gaseous state
Material largely passes through the deflector.The aperture setting that will be close to the deflector 14 of nozzle 12 is small, convenient for control gaseous state organic material
Spray volume, and then convenient for control film forming homogeneity.
Based on above-mentioned structure, from a side of opening 13 to the side of nozzle 12, the density of through-hole 141 is passed on deflector 14
Increase.Such setting, improves the air tightness that goes out of the deflector 14 close to nozzle 12, and then buffers the flowing speed of gaseous state organic material
Degree, while the flow for making gaseous state organic material reach nozzle 12 is more balanced.And then improve the homogeneity of film forming.
In some embodiments, the quantity of deflector is greater than two, and the quantity for working as deflector is more, then the organic material of gaseous state
Expect that flow up to nozzle is more balanced and the discharging time of gaseous state organic material is longer.Therefore in some embodiments,
The quantity of deflector is between two to four.
Referring to figure 2., Fig. 2 is the deflector of the embodiment of the source application of the application and the structural schematic diagram of heater.
In the embodiment of source application 100, line source mechanism 10 includes at least two primary heaters, and each primary heater is for adding
A hot deflector 14.Each primary heater includes heating wire 151.Channel is offered on each deflector 14.Heating wire 151 is set
It sets in channel.
Heating wire 151 extends to the other end from one end of deflector 14.There are two fire ends 152 for primary heater setting.
Two fire ends 152 are located at the both ends of same deflector 14 and are connected to heating wire 151.
The setting of primary heater causes to have so that deflector 14 has certain temperature so as to avoid temperature is too low
Machine material is adhered to the case where deflector 14 or blocking through-hole 141.Wherein, it by using the setting of two fire ends, improves and leads
The homogeneity of 14 temperature of flowing plate, avoid causes the through-hole 141 far from fire end by organic material because the temperature of deflector 14 is different
Material blocking.
In addition, in the present embodiment, line source mechanism 10 further includes third heater, third heater be used for nozzle 12 into
Row heating, avoids organic material plug nozzle 12.Third heater can be to be arranged in the form of heating wire winding nozzle, can also
To be that the form that heating sheet is mounted on nozzle is arranged.
In some embodiments, the fire end of primary heater is also possible to one or greater than two.
In the present embodiment, the material of nozzle 12 and deflector 14 can be selected metal alloy, and it is with high temperature resistant, constant
Shape and the small feature of thermal expansion coefficient.
In the embodiment of source application 100, each crucible mechanism 20 further includes secondary heater 23, crucible 24 and vacuum
Pump 25.Secondary heater 23 is arranged on crucible cavity 21.Crucible 24 is arranged in crucible cavity 21.Vacuum pump 25 is arranged in earthenware
The outside of crucible cavity 21.Vacuum pump 25 is for vacuumizing crucible cavity 21 or inflating to crucible cavity 21.
Wherein, crucible 24 uses alloy material, when being not limited to this.Secondary heater 23 is set according to material evaporating temperature
It is fixed, it is ensured that the stability of evaporation rate.Vacuum pump 25 is mainly to vacuumize use after the charging of crucible cavity 21 is maintained, and vacuum is extracted into
Until suitable with evaporator chamber vacuum degree.
In the embodiment of source application 100, line source mechanism 10 further includes the first cooling layer 16 and first thermal insulation layer 17.Earthenware
Crucible mechanism 20 further includes the second cooling layer 26 and second thermal insulation layer 27.
First cooling layer 16 is arranged on the outer wall of online source chamber body 11.First thermal insulation layer 17 is arranged in 16 He of the first cooling layer
Between line source cavity 11.Second cooling layer 26 is arranged on the outer wall of crucible cavity 21.The setting of second thermal insulation layer 27 is cold second
But between layer 26 and crucible cavity 21.
Wherein the first cooling layer 16 and the second cooling layer 26 can be coldplate, be provided with pipelined channel in coldplate, lead to
The mode for crossing water cooling is cooled down.
Since the evaporating temperature of organic material is up to 400~500 degrees Celsius, the first cooling layer 16 and the second cooling layer
26 setting, active control unit adverse effect caused by surrounding enviroment or cavity and device.
The operating process of the embodiment of this source application 100 is:
Source application 100 is set in OLED evaporator first, and line source mechanism 10 is arranged in the vapor deposition of evaporator
In cavity, by the setting of crucible mechanism 20 outside vapor deposition cavity, crucible mechanism 20 is in a closed state.
Then, respectively to vapor deposition cavity and any crucible mechanism 20 (by taking the first crucible mechanism as an example, another crucible mechanism
For the second crucible mechanism) carry out vacuumize process: wherein in the first crucible mechanism, open vacuum pump 25 to crucible cavity 21 into
Row vacuumize process, when vacuum is extracted into suitable with the vapor deposition vacuum degree of cavity, connection valve 22 is opened, crucible cavity 21, line source chamber
Body 11 is connected to vapor deposition cavity, and is in high vacuum state simultaneously.
At this moment, heat the first crucible mechanism finished, gaseous state organic material from 21 flow line source chamber body 11 of crucible cavity, and
Enter nozzle 12 by the through-hole 141 of deflector 14, subsequent gaseous state organic material is sprayed from nozzle 12, is applied to OLED device
On.
Finally, second in the second crucible mechanism 20 adds when the organic material in the first crucible mechanism 20 runs out of fastly
Hot device 23 finishes the heating of crucible cavity 21 under vacuum state, and organic material is evaporated to gaseous state organic material；
Then, the connection valve 22 of the first crucible mechanism 20 is closed, the connection valve 22 of the second crucible mechanism 20, the second earthenware are opened
Crucible mechanism 20 starts to work；First crucible mechanism 20 inflates vacuum breaker, opens crucible cavity door, takes out crucible 24, adds organic
Material, closing crucible cavity 11 take out 11 vacuum of crucible cavity, and heating crucible cavity 11 makes organic material become the organic material of gaseous state
Material, it is rear in working condition.
The operating process of the present embodiment is just completed in this way.
Referring to figure 3., Fig. 3 is the structural schematic diagram of the embodiment of the OLED evaporator of the application.The application further relates to one
Kind OLED evaporator 1000 comprising a vapor deposition cavity 200 and a source application 100.Vapor deposition cavity 200 is for being deposited OLED work
Industry.Source application 100 is for spraying gaseous state organic material.Source application 100 includes a line source mechanism 10 and at least two crucibles
Mechanism 20.
The setting of line source mechanism 10 is in vapor deposition cavity 200 and is used for gaseous state organic material spraying plating to external TFT substrate.
Line source mechanism 10 includes a line source cavity 11.The setting of crucible mechanism 20 is in 200 outside of vapor deposition cavity, for providing gaseous state organic material
Material.Each crucible mechanism 20 is arranged at the outside of line source mechanism 10.Each crucible mechanism 20 includes 21 He of a crucible cavity
One connection valve 22.
The embodiment of the application OLED evaporator 1000 passes through the setting of at least two crucible mechanisms 20, so that one of them
Crucible mechanism 20 works, other crucible mechanisms 20 are in working condition, and such setting improves the service efficiency of equipment, subtracts
Equipment feed time is lacked.In addition, crucible mechanism 20 is provided with outside vapor deposition cavity 200, in OLED evaporator 1000 when need
When carrying out the replacement work of crucible mechanism 20, it can avoid opening vapor deposition cavity 200, reduce the pollution in vapor deposition cavity 200, mention
High production yield.And in OLED evaporator 1000, when needing to add organic material, the earthenware of not material need to be only opened
Cavity 2000 is deposited without opening in crucible mechanism 20, begins to speak the time to reduce and saves the gentle energy of electricity.
The wherein structure one of the source application of the source application 100 and above-described embodiment of 1000 embodiment of OLED evaporator
It causes, specifically please refers to the content of above-described embodiment, details are not described herein.
The operating process of the source application of the operating process and above-described embodiment of OLED evaporator 1000 is similar or identical, tool
Body please refers to the content of above-described embodiment, also repeats no more herein.
Source application and OLED evaporator compared to the prior art, the source application and OLED evaporator of the application pass through
The setting of at least two crucible mechanisms, so that one of crucible mechanism works, other crucible mechanisms are in working condition, this
The setting of sample improves the service efficiency of equipment, reduces equipment feed time；In addition, in OLED evaporator, by crucible machine
Structure is provided with outside vapor deposition cavity, when carrying out replacement crucible mechanism work, be can avoid opening vapor deposition cavity, is reduced vapor deposition
The intracorporal pollution of chamber, improves production yield；And in OLED evaporator, when needing to add organic material, only need to open
There is no the crucible mechanism of material, cavity is deposited without opening, begins to speak the time to reduce and save the gentle energy of electricity.Solution
Existing source application determined during vacuum evaporation, when adding evaporation material, time-consuming and begins to speak to be easy pollution when body
Technical problem.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the appended right of the present invention
It is required that protection scope.
Claims (10)
1. a kind of source application characterized by comprising
One line source mechanism, for by gaseous state organic material spraying plating to TFT substrate, the line source mechanism to include a line source cavity；
And
At least two crucible mechanisms, for providing gaseous state organic material, each crucible mechanism is arranged at the line source machine
The outside of structure, each crucible mechanism include a crucible cavity and connection valve；
The connection valve is arranged between the crucible cavity and the line source cavity, and for by the crucible cavity and described
Line source cavity is separated or is connected to.
2. source application according to claim 1, which is characterized in that the line source mechanism includes multiple nozzles, described more
A nozzle be connected to the line source cavity and be located at the line source cavity side, the other side of the line source cavity offer to
Few two openings, the opening and the crucible mechanism correspond, and each crucible mechanism is corresponding to be fixed at institute
State opening.
3. source application according to claim 2, which is characterized in that the multiple nozzle is arranged in array, and adjacent
Nozzle between row is staggered setting.
4. source application according to claim 2, which is characterized in that the line source mechanism further includes at least two water conservancy diversion
Plate, at least two deflector are spaced apart from each other setting and are arranged between the nozzle and the opening；
Through-hole is offered on each deflector, the through-hole is for the gaseous state organic material in the crucible mechanism to be guided to
The nozzle；
Wherein the through-hole between the adjacent deflector is staggered setting；And from a side of the opening to the one of the nozzle
Side, the decreasing pore size of through-hole on the deflector.
5. source application according to claim 4, which is characterized in that from a side of the opening to the one of the nozzle
Side, the density of through-hole is incremented by the deflector.
6. source application according to claim 4, which is characterized in that the line source mechanism includes at least two first heating
Device, each primary heater is for heating a deflector；Each primary heater includes heating wire, Mei Gesuo
It states and offers channel on deflector, the heating wire is arranged in the channel；
The heating wire extends to the other end from one end of the deflector, and the primary heater is arranged there are two fire end,
Two fire ends are located at the both ends of the same deflector and are connected to the heating wire.
7. source application according to claim 1, which is characterized in that each crucible mechanism further includes the second heating
Device, crucible and vacuum pump；The secondary heater is arranged on the crucible cavity, and the crucible is arranged in the crucible cavity
Interior, the vacuum pump is arranged in the outside of the crucible cavity, the vacuum pump for the crucible cavity is vacuumized or to
The crucible cavity inflation.
8. source application according to claim 1, which is characterized in that the line source mechanism further includes the first cooling layer and
One thermal insulation layer, the crucible mechanism further include the second cooling layer and second thermal insulation layer；
First cooling layer is arranged on the outer wall of the line source cavity, and the first thermal insulation layer setting is cooling described first
Between layer and the line source cavity；Second cooling layer is arranged on the outer wall of the crucible cavity, the second thermal insulation layer
It is arranged between second cooling layer and the crucible cavity.
9. a kind of OLED evaporator characterized by comprising
One vapor deposition cavity, for OLED operation to be deposited；And
One source application, for spraying gaseous state organic material, the source application includes:
One line source mechanism is arranged in the vapor deposition cavity and is used for gaseous state organic material spraying plating to TFT substrate, the line
Source mechanism includes a line source cavity；And
At least two crucible mechanisms are arranged on the outside of the vapor deposition cavity, for providing gaseous state organic material, each crucible
Mechanism is arranged at the outside of the line source mechanism, and each crucible mechanism includes a crucible cavity and a connection valve；
The connection valve is arranged between the crucible cavity and the line source cavity, and for by the crucible cavity and described
Line source cavity is separated or is connected to.
10. OLED evaporator according to claim 9, which is characterized in that the line source mechanism includes multiple nozzles, described
Multiple nozzles are connected to the line source cavity and are located at the side of the line source cavity, and the other side of the line source cavity offers
At least two openings, the opening and the crucible mechanism correspond, and each crucible mechanism is corresponding to be fixed at
The opening.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811634379.6A CN109487216A (en) | 2018-12-29 | 2018-12-29 | Source application and OLED evaporator |
| PCT/CN2019/077019 WO2020133686A1 (en) | 2018-12-29 | 2019-03-05 | Line source device and oled evaporator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811634379.6A CN109487216A (en) | 2018-12-29 | 2018-12-29 | Source application and OLED evaporator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109487216A true CN109487216A (en) | 2019-03-19 |
Family
ID=65713295
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811634379.6A Pending CN109487216A (en) | 2018-12-29 | 2018-12-29 | Source application and OLED evaporator |
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| CN (1) | CN109487216A (en) |
| WO (1) | WO2020133686A1 (en) |
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| CN109898059A (en) * | 2019-04-15 | 2019-06-18 | 湖畔光电科技（江苏）有限公司 | A kind of novel vapor deposition crucible device |
| CN111471967A (en) * | 2020-05-22 | 2020-07-31 | Tcl华星光电技术有限公司 | Evaporation crucible, evaporation equipment and evaporation method |
| CN112030111A (en) * | 2020-08-04 | 2020-12-04 | 福建华佳彩有限公司 | Vacuum cavity structure |
| CN112553577A (en) * | 2019-09-26 | 2021-03-26 | 宝山钢铁股份有限公司 | Vacuum coating device for improving vacuum coating yield |
| CN112553578A (en) * | 2019-09-26 | 2021-03-26 | 宝山钢铁股份有限公司 | Vacuum coating device with flow-inhibiting nozzle |
| CN113957392A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device adopting uniform mixing buffer structure to uniformly distribute metal steam |
| CN113957390A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device with air cushion buffer cavity |
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| CN113957389A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device with porous noise reduction and uniform distribution of metal steam |
| WO2022017422A1 (en) * | 2020-07-21 | 2022-01-27 | 宝山钢铁股份有限公司 | Vacuum coating device for uniformly distributing metal steam by using guide plate type structure |
| CN114318241A (en) * | 2022-02-15 | 2022-04-12 | 福建华佳彩有限公司 | Visual line source crucible device and material monitoring method thereof |
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| CN109898059A (en) * | 2019-04-15 | 2019-06-18 | 湖畔光电科技（江苏）有限公司 | A kind of novel vapor deposition crucible device |
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| CN112553577A (en) * | 2019-09-26 | 2021-03-26 | 宝山钢铁股份有限公司 | Vacuum coating device for improving vacuum coating yield |
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| WO2021057921A1 (en) * | 2019-09-26 | 2021-04-01 | 宝山钢铁股份有限公司 | Vacuum plating device |
| JP2022549906A (en) * | 2019-09-26 | 2022-11-29 | バオシャン アイアン アンド スティール カンパニー リミテッド | vacuum coating device |
| CN111471967A (en) * | 2020-05-22 | 2020-07-31 | Tcl华星光电技术有限公司 | Evaporation crucible, evaporation equipment and evaporation method |
| CN113957391A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device adopting core rod heating structure to uniformly distribute metal steam |
| CN113957390A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device with air cushion buffer cavity |
| CN113957389A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device with porous noise reduction and uniform distribution of metal steam |
| WO2022017425A1 (en) * | 2020-07-21 | 2022-01-27 | 宝山钢铁股份有限公司 | Vacuum coating apparatus for uniformly distributing metal vapor using uniform mixing buffer structure |
| WO2022017422A1 (en) * | 2020-07-21 | 2022-01-27 | 宝山钢铁股份有限公司 | Vacuum coating device for uniformly distributing metal steam by using guide plate type structure |
| CN113957392B (en) * | 2020-07-21 | 2022-09-20 | 宝山钢铁股份有限公司 | Vacuum coating device adopting uniform mixing buffer structure to uniformly distribute metal steam |
| CN113957392A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device adopting uniform mixing buffer structure to uniformly distribute metal steam |
| CN113957389B (en) * | 2020-07-21 | 2023-08-11 | 宝山钢铁股份有限公司 | Vacuum coating device with porous noise reduction and uniform distribution of metal vapor |
| CN113957391B (en) * | 2020-07-21 | 2023-09-12 | 宝山钢铁股份有限公司 | Vacuum coating device adopting core rod heating structure to uniformly distribute metal vapor |
| CN113957390B (en) * | 2020-07-21 | 2024-03-08 | 宝山钢铁股份有限公司 | Vacuum coating device with air cushion buffer cavity |
| CN112030111A (en) * | 2020-08-04 | 2020-12-04 | 福建华佳彩有限公司 | Vacuum cavity structure |
| CN114318241A (en) * | 2022-02-15 | 2022-04-12 | 福建华佳彩有限公司 | Visual line source crucible device and material monitoring method thereof |
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