CN108103447A - A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus - Google Patents
A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus Download PDFInfo
- Publication number
- CN108103447A CN108103447A CN201711486713.3A CN201711486713A CN108103447A CN 108103447 A CN108103447 A CN 108103447A CN 201711486713 A CN201711486713 A CN 201711486713A CN 108103447 A CN108103447 A CN 108103447A
- Authority
- CN
- China
- Prior art keywords
- crucible
- styled
- self
- air outlet
- outlet pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to a kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus, including:Crucible(1), air outlet pipe is equipped with above crucible(5), air outlet pipe upper end is equipped with conical valve(6), air outlet pipe upper end connecting gas transmission pipe(8)Leading portion(8A), the back segment of appendix(8B)One group of nozzle of middle setting(9), the back segment of appendix(8B)It is arranged in the vacuum chamber of coating wire;It is characterized in that:Cone valve(6)Air outlet pipe between crucible(5)In be equipped with self-styled sealed valve body(7), for preventing the deposition film metal film in continuous film plating machine sealing valve.Advantageous effect of the invention is:The mobility of the producing line equipment performance performance assessment criteria important as one, and such mode evaporation coating is used, equipment downtime can be greatly reduced, improves equipment mobility, improves production efficiency, saves production cost, adapts to large-scale continuous production.
Description
Technical field
The present invention relates to the field of vacuum coating in being produced for solar film battery, more particularly to a kind of self-styled anti-
Leak low boiling point material thermal evaporation coating apparatus.
Background technology
Thermal evaporation coating method be heated in vacuum environment using electric current, electron beam heating or laser heat the methods of make
Evaporation material become cluster, molecule or atom, nearly free movement is made with larger free path, when these free movements molecule or
Atomic collision just condenses, deposition, which is covered on substrate, forms film to the relatively low substrate of temperature on substrate.Thermal evaporation is plated
Embrane method has the advantages that purity height, advantages of good crystallization, is usually used in the life of metallic film, semiconductive thin film, thin-film solar cells material
Production makes.
In production, the size of substrate is usually larger, so General Production Lines are all equal using multiple thermal evaporation sources nozzles
With or be distributed in substrate one side in order, substrate is deposited, and such mode can because evaporation source air outlet pipe it is poorly sealed,
Evaporation raw material carries out recharging that raw material has operating difficulties, inefficiency after being finished, it is difficult to carry out continuous production.
The content of the invention
The technical issues of for the purpose of the present invention being exactly in order to more than solving, the present invention provides a kind of self-styled leakproof low boiling point
Material thermal evaporation coating apparatus, can real continuous production, the equipment not stopped production due to raw material inadequate problem.
The present invention is achieved by the following technical solutions:
A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus, including:
The crucible of the double-layer structure of evaporation material is loaded, crucible internal layer is equipped with heating component, outer layer is equipped with cooling water pipe;
Crucible side is equipped with feed inlet, is equipped with evaporation gas outlet above, and evaporation gas outlet is equipped with air outlet pipe, and air outlet pipe upper end is set
There is conical valve;
The leading portion of air outlet pipe upper end connecting gas transmission pipe sets one group of nozzle 9, appendix in the back segment of appendix using the linear alignment
Back segment be arranged in the vacuum chamber of coating wire;
Crucible is equipped with the vacuum suction device being connected with interlayer and is filled for being quickly cooled down the nitrogen of crucible and gas pipeline
It puts;
It is characterized in that:Self-styled sealed valve body is equipped in air outlet pipe between cone valve and crucible, for preventing in continuous coating
Deposition film metal film in machine sealing valve;
The self-styled sealing valve is loop component, and including outer layer insulating tube and internal layer heating dish, outer layer insulating tube and internal layer add
The interlayer unicom of gap and air outlet pipe is equipped between hot plate, one group of taper with outlet tube cavity unicom is evenly distributed in internal layer heating dish
Hole, internal layer heating dish periphery are equipped with one group of cooling tube, and cooling tube is equipped with safety valve.
Further prioritization scheme is that using two times that the area of air inlet is outlet open area, total goes out self-styled sealing valve
Gas area is equal with the cross-sectional area of air outlet pipe, and air inlet is located at crucible one side, gas outlet and is located at cone valve one side.So
Design can both ensure the stability of steam stream overall flow.Again can be in the state of cooling, air inlet makes evaporation due to cooling
Material forms solid-state, achievees the purpose that sealing, and when crucible carries out filler operation, the pressure at both sides caused due to broken sky is poor, makes
Self-styled sealing valve has better seal effect.
The beneficial effects of the invention are as follows:The mobility of producing line(Refer to the production quantity and possibility of a machinery equipment reality
Production quantity ratio)The equipment performance performance assessment criteria important as one, and such mode evaporation coating is used, Ke Yi great
Big reduction equipment downtime improves equipment mobility, improves production efficiency.Save production cost.It adapts to extensive continuous
Production.
Description of the drawings
Fig. 1 thermal evaporation coating system schematic diagrames;
Fig. 2 is the structure diagram of continuous coating apparatus;
Fig. 3 is the structure diagram that self-styled sealed valve body is mounted in air outlet pipe;
Fig. 4 is the bottom view of the self-styled sealed valve body in Fig. 3.
Specific embodiment
In order to make the foregoing objectives, features and advantages of the present invention clearer and more comprehensible, below in conjunction with the accompanying drawings to the present invention
Specific embodiment be described in detail.
1st, as shown in Figure 1, evaporation source A and B of the present invention is mounted in traditional continuous coating producing line, vacuum is included
Coating chamber, transition chamber one, transition chamber two, chip automatic feed platform, chip automatic blanking platform, vaporizing-source system A, evaporation source
System B, the pumped vacuum systems of each room.Evaporation source A and evaporation source B is distributed in the same side of coating chamber, gas pipeline B respectively
It is interior vertical with substrate transfer direction holding to extend into coating chamber, for nozzle above chip, jet hole is vertical with chip holding.It is defeated
Tracheae back segment B is arranged in vacuum coating room, appendix leading portion A connection crucibles.
2nd, as shown in Fig. 2, a kind of continuous coating apparatus for preventing sealing valve deposited metal film of the present invention, including:
The crucible 1 of the double-layer structure of evaporation material is loaded, crucible internal layer is equipped with heating component 2, outer layer is equipped with cooling water pipe 3;Crucible side
Face is equipped with feed inlet 4, is equipped with evaporation gas outlet 5a above, and evaporation gas outlet is equipped with air outlet pipe 5 with dissection, in air outlet pipe
End is equipped with conical valve 6, it has Serve Motor Control;The leading portion 8A of air outlet pipe upper end connect band appendix 8 with dissection, gas transmission
One group of fumarole is set using the linear alignment in the back segment 8B of pipe, each fumarole, which uses, is threadedly coupled nozzle 9, after appendix
Section 8B is arranged in the vacuum chamber of coating wire.
Crucible 1 is equipped with the vacuum suction device being connected with interlayer and the nitrogen for being quickly cooled down crucible and gas pipeline
Device of air;
As shown in Figures 3 and 4, self-styled sealed valve body 7 is equipped in the air outlet pipe 5 between cone valve 6 and crucible, for preventing even
Deposition film metal film in continuous coating machine sealing valve;The self-styled sealing valve is loop component, including outer layer insulating tube 7a and interior
Layer heating dish 7b, is equipped with the interlayer unicom of gap and air outlet pipe 5 between outer layer insulating tube and internal layer heating dish, in internal layer heating dish
One group of bellmouth 7h with air outlet pipe unicom is evenly distributed with, internal layer heating dish periphery is equipped with one group of cooling tube 7c, and cooling tube is equipped with
Safety valve 7d is so designed that in order to when self-styled sealing valve does not enable, because of expansion inside heating status, cooling water pipe
And there are one safe releases for the pressure generated.It ensure that the security used.
Further prioritization scheme is that self-styled sealing valve uses two times that the area of air inlet 7f is gas outlet 7g areas, always
Outlet area it is equal with the cross-sectional area of air outlet pipe 5, and air inlet 7f is located at crucible one side, gas outlet 7g is located at cone valve
6 one sides.The stability of steam stream overall flow can both be ensured by being so designed that.Again can be in the state of cooling, air inlet is because cold
But evaporation is made to expect to form solid-state, achievees the purpose that sealing, and when crucible carries out filler operation, the both sides of cause due to broken sky
Pressure differential makes self-styled sealing valve have better seal effect.
Self-styled sealed valve body material is the easy heat conduction of red copper, and along 24 groups of cooling tube 7c of annular spread, being so designed that can be to certainly
Envelope valve body is quickly and effectively cooled down.Cooling tube outer end is equipped with safety valve 7d, is so designed that not enable in self-styled sealing valve
When, there are one safe releases for the pressure generated inside heating status, cooling water pipe due to expansion.It ensure that is used
Security.
The nozzle uses same connection diameter different-diameter outlet mode, facilitates later stage various technique adjustments, preferably
Improve the large-area uniformity problem of evaporation coating.
Valve between cone valve and crucible using self-styled sealing means, perfectly solve under high temperature tradition ORING because
Leakage caused by poorly sealed and problem of aging, because this position of cone valve is in the point that heating operates repeatedly with cooling,
So the easy aging of traditional butyronitrile sealing ring, cracking cause gas leakage.Because this position of cone valve is in heating with cooling down repeatedly
The point of operation, so the easy aging of traditional butyronitrile sealing ring, cracking cause gas leakage.
3rd, heating component is distributed between crucible ectonexine, between gas pipeline and the ectonexine of crucible by exhaust pipe into
Row connection, switch control is carried out by valve, and aspiration pump, one end connection nitrogen supply (NS) system are connected by three-way connection one end.
As an optimization, crucible uses double layer design, and outside uses water-cooling pattern, can be carried out when needs are shut down and are reloaded
It is quickly cooled down, while it is to vacuumize state that double-layer inner, which just makes during operation, can be carried out quickly by being passed through nitrogen when shutdown
Cooling, saving is reloaded the time, and ensure that the safety problem of crucible in special circumstances.
It designs as an optimization, crucible is designed using twoport, is made feeding mouth and evaporation gas outlet different position, is so designed that and removes
Convenient for addition raw material, the sealing effect of gas outlet and feeding mouth is also ensured.
It designing as an optimization, appendix back segment B is in a manner that three sections of heating measure control respectively, with Resistant heating,
Intermediate one section of heater strip length accounts for integrated piping length 3/5, and both ends heater strip length respectively accounts for total pipeline length 1/5, it is so designed that
About each section temperature and evaporation rate can be preferably controlled in late stage process adjustment, preferably ensure that large area thin evaporated film
Homogeneity question.
It designs as an optimization, gas pipeline is so designed that all using double-layer structure, and vacuumized in normal use
The sealing security performance of appendix can preferably be improved.And heat radiation is reduced, it is energy saving.
During present invention normal work, evaporation raw material is put into crucible, and crucible is heated by heating component, raw material evaporation
By gas pipeline and front end nozzle after into gas, it is agglomerated to formation film on the relatively low substrate of temperature and reaches deposition purpose.
Vaporizing-source system A raw materials evaporate, and close cone valve, self-styled sealed valve body is cooled down, at this time evaporation material
It is set in self-styled sealed valve body passage when being cooled, when in certain time, after self-styled sealed valve body passage is fully sealed, closing
Crucible heating component opens vaporizing-source system B and continues hydatogenesis progress continuous production.
Nitrogen is passed through between the crucible ectonexine of vaporizing-source system A to be cooled down within five minutes, is then evacuated, then qi of chong channel ascending adversely, it takes out
Gas so cycles, and until crucible temperature is less than 30 degrees Celsius, opening crucible feeding mouth is filled raw material operation, has filled
Finish, seal feeding mouth, to being vacuumized between crucible ectonexine, pumping half an hour, heated, it is stand-by, wait evaporation
Source system B, evaporates, switches over, to achieve the purpose that continuous coating produces.
The above is only the preferred embodiment of this patent, it is noted that for the ordinary skill people of the art
For member, on the premise of the art of this patent principle is not departed from, several improvement and replacement can also be made, these improve and replace
Also it should be regarded as the protection domain of this patent.
Claims (2)
1. a kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus, including:
Load the crucible of the double-layer structure of evaporation material(1), crucible internal layer is equipped with heating component(2), outer layer be equipped with cooling water pipe
(3);
Crucible side is equipped with feed inlet(4), above be equipped with evaporation gas outlet(5a), evaporation gas outlet is equipped with air outlet pipe(5), go out
Tracheae upper end is equipped with conical valve(6);
Air outlet pipe upper end connecting gas transmission pipe(8)Leading portion(8A), the back segment of appendix(8B)It is middle to set one group using the linear alignment
Nozzle(9), the back segment of appendix(8B)It is arranged in the vacuum chamber of coating wire;
Crucible is equipped with the vacuum suction device being connected with its interlayer and is filled for being quickly cooled down the nitrogen of crucible and gas pipeline
It puts;
It is characterized in that:Cone valve(6)Air outlet pipe between crucible(5)In be equipped with self-styled sealed valve body(7), for preventing
Deposition film metal film in continuous film plating machine sealing valve;
The self-styled sealing valve is loop component, including outer layer insulating tube(7a)And internal layer heating dish(7b), outer layer insulating tube
And gap and air outlet pipe are equipped between internal layer heating dish(5)Interlayer unicom, in internal layer heating dish uniformly distributed one group in air outlet pipe
The bellmouth of chamber unicom(7h), internal layer heating dish periphery is equipped with one group of cooling tube(7c), cooling tube is equipped with safety valve(7d).
2. a kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus according to claim 1, it is characterised in that self-styled
Sealing valve air inlet(7f)Area be gas outlet(7g)Two times of area, total outlet area and air outlet pipe(5)Cross section
Product is equal, and air inlet(7f)Positioned at crucible one side, gas outlet(7g)Positioned at cone valve(6)One side.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711486713.3A CN108103447A (en) | 2017-12-30 | 2017-12-30 | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201711486713.3A CN108103447A (en) | 2017-12-30 | 2017-12-30 | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108103447A true CN108103447A (en) | 2018-06-01 |
Family
ID=62215151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711486713.3A Pending CN108103447A (en) | 2017-12-30 | 2017-12-30 | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN108103447A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111549330A (en) * | 2020-05-08 | 2020-08-18 | 北京中材人工晶体研究院有限公司 | Method and equipment for continuously depositing diamond film |
CN114134465A (en) * | 2021-11-24 | 2022-03-04 | 成都中建材光电材料有限公司 | Method and device for improving utilization rate of evaporation equipment for photovoltaic module |
CN114622163A (en) * | 2020-12-10 | 2022-06-14 | 中国科学院大连化学物理研究所 | Simple and controllable molecular evaporation method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103361607A (en) * | 2012-03-28 | 2013-10-23 | 日立造船株式会社 | Vacuum evaporation apparatus and method for replacing crucibles in vacuum evaporation apparatus |
CN106927433A (en) * | 2017-04-18 | 2017-07-07 | 昆明鼎邦科技股份有限公司 | A kind of impure selenium slag wet feed vacuum smelting equipment |
CN208151467U (en) * | 2017-12-30 | 2018-11-27 | 凯盛光伏材料有限公司 | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus |
-
2017
- 2017-12-30 CN CN201711486713.3A patent/CN108103447A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103361607A (en) * | 2012-03-28 | 2013-10-23 | 日立造船株式会社 | Vacuum evaporation apparatus and method for replacing crucibles in vacuum evaporation apparatus |
CN106927433A (en) * | 2017-04-18 | 2017-07-07 | 昆明鼎邦科技股份有限公司 | A kind of impure selenium slag wet feed vacuum smelting equipment |
CN208151467U (en) * | 2017-12-30 | 2018-11-27 | 凯盛光伏材料有限公司 | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111549330A (en) * | 2020-05-08 | 2020-08-18 | 北京中材人工晶体研究院有限公司 | Method and equipment for continuously depositing diamond film |
CN114622163A (en) * | 2020-12-10 | 2022-06-14 | 中国科学院大连化学物理研究所 | Simple and controllable molecular evaporation method |
CN114622163B (en) * | 2020-12-10 | 2022-12-27 | 中国科学院大连化学物理研究所 | Simple and controllable molecular evaporation method |
CN114134465A (en) * | 2021-11-24 | 2022-03-04 | 成都中建材光电材料有限公司 | Method and device for improving utilization rate of evaporation equipment for photovoltaic module |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN108103447A (en) | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus | |
CN102312199B (en) | Scanning coating device and scan coating assembly | |
WO2021008057A1 (en) | Hfcvd device used for continuous preparation of diamond thin film, and coating method thereof | |
CN104445986A (en) | Method for coating carbon on quartz ampoule for growing crystals | |
CN207958482U (en) | A kind of continuous low boiling point material thermal evaporation coating apparatus | |
CN112626465A (en) | External selenium source structure of CIGS co-evaporation method | |
CN208151467U (en) | A kind of self-styled leakproof low boiling point material thermal evaporation coating apparatus | |
CN104716222B (en) | The method that radio frequency cracks selenium steam production CIGS thin-film | |
CN203440096U (en) | Device for preparing polycrystalline silicon through coupling of electron-beam smelting technology and crystal growing technology | |
JP5869714B1 (en) | Steam circulation regeneration system | |
CN106517163B (en) | A kind of cold hearth and continuous producing method preparing graphene for CVD method | |
CN107299322A (en) | A kind of vertical low temperature evaporation beam source stove | |
CN108103448A (en) | A kind of continuous low boiling point material thermal evaporation coating apparatus | |
CN111139456A (en) | Glow area gas circuit arrangement method and gas circuit device for improving vacuum coating atmosphere uniformity | |
CN110318035A (en) | The more hot filament deposit method and devices of the discrete of alloy cpd film | |
CN108286036B (en) | In-situ oxygen supplement type scanning electron beam vapor deposition (IOC-SEVD) device and method thereof | |
WO2022017425A1 (en) | Vacuum coating apparatus for uniformly distributing metal vapor using uniform mixing buffer structure | |
CN110273139B (en) | High-temperature cracking furnace for vacuum coating | |
CN201655827U (en) | Device for manufacturing CIGS optical absorbing layer in non-vacuum way | |
CN202322985U (en) | Equipment for depositing conducting film or semiconductor material on substrate | |
CN207227534U (en) | Vertical low temperature evaporation beam source stove | |
CN101838790A (en) | Evaporation equipment | |
CN207072970U (en) | Reinforced graphite alkene coating thin film equipment based on PECVD | |
CN105551933A (en) | Selenium source fragmentation rectifying device for manufacturing CIGS battery | |
CN111074240A (en) | Gas path arrangement method for improving vacuum coating atmosphere uniformity |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination |