CN102445279A - Device and method for measuring wave lengths of interferometer - Google Patents
Device and method for measuring wave lengths of interferometer Download PDFInfo
- Publication number
- CN102445279A CN102445279A CN2010105072205A CN201010507220A CN102445279A CN 102445279 A CN102445279 A CN 102445279A CN 2010105072205 A CN2010105072205 A CN 2010105072205A CN 201010507220 A CN201010507220 A CN 201010507220A CN 102445279 A CN102445279 A CN 102445279A
- Authority
- CN
- China
- Prior art keywords
- interferometer
- wavelength
- measuring
- measuring beam
- work stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Abstract
The invention discloses a device for measuring wave lengths of an interferometer of a workpiece table, comprising a first interferometer and a second interferometer which are respectively arranged at two opposite sides of the workpiece table, first measurement light beams and second measurement light beams emitted from the first interferometer and the second interferometer respectively form a wave length measurement shaft, and a computing module for computing the theory length and practical length of the wave length measurement shaft and computing the practical wave length of the first measurement light beams and the second measurement light beams, so as to perform real-time computation to the wave length of the light beams measured by the interferometer by the first interferometer, the second interferometer and the computing module. The invention also discloses a method for measuring wave lengths of an interferometer of a workpiece table.
Description
Technical field
The present technique scheme relates to interferometer, relates in particular to the device and method that a kind of real-time Laser Measurement is interfered wavelength.
Background technology
The interferometer of fringe count formula is that benchmark carries out linear measure longimetry with the wavelength, and its measuring principle can be expressed as simply:
In the formula, λ is the wavelength of laser in measurement environment, λ
0Be laser wavelength in a vacuum, N is a fringe number.Have only and measure air refraction n or the wavelength X of laser in measurement environment in real time, could accurately calculate length to be measured, otherwise interferometer will not known where to begin to the measurement of the Subnano-class precision of space length.
In the current application, mainly contain two kinds of methods and confirm optical maser wavelength.
First kind is to calculate current air refraction by the Elden formula.Optical maser wavelength mainly receives the atmospheric pressure and the temperature effect of environment, therefore through measuring the atmospheric pressure and the temperature of environment of living in, can calculate clearancen and refractive index
P wherein
AirAnd T
AirBe airborne pressure and temperature, a, b, c are constant.
Another kind is the Wavelength Tracker (wavelength tracker) of a kind of special monitoring environment wavelength of providing like Agilent company, and is as shown in fig. 1.It utilizes the optical cavity of a regular length as benchmark, measures the length of this cavity in real time by interferometer, thereby learns the variation of current optical maser wavelength through the length variations of interferometer measurement.
Because the restriction of test philosophy, more than the real work position of two kinds of methods position of measuring refractive index or wavelength and interferometer not in same place, so the wavelength that measures can exist different with the wavelength of interferometer real work position.Because the measuring object of interferometer often requires to move within the specific limits,,, perhaps tilt around the Y axle around the rotation of Z axle as along X, the translation of Y direction.The Wavelength Tracker that Agilent company provides can only be positioned over from measuring beam bundle larger distance usually.And interferometer is a relative position measurement system, at the beginning of this Wavelength-tracking device carries out operate as normal, need carry out one to the preliminary examination value of wavelength and demarcate comparatively accurately, and the design of measuring cavity makes it can not accomplish this function comparatively satisfactorily.When adopting the Elden formula to calculate air refraction,, also receive the factor affecting such as measuring error of air pressure and temperature easily owing to be the wavelength of measuring beam indirectly.
In addition, Chinese patent CN99814090.2 is disclosed to be improved in the method for measurement of interferometer, and through measuring the influence of confirming environment along the velocity of sound of measuring route direct of travel simultaneously, this method has increased equipment cost undoubtedly; In the structure of the dual wavelength heterodyne ineterferometer of the disclosed make-up air disturbance of Chinese patent CN99118742.3; Optical path length through measuring two or more wavelength is obtained refractive index; This method needs two and separates far measurement wavelength (normally multiple relation), and laser instrument has been proposed new requirement.
Summary of the invention
The present invention is directed to existing above-mentioned shortcoming in the prior art scheme, a kind of device and method of measuring workpieces platform interferometer wavelength is provided, in order to the measuring beam wavelength of real-time stellar interferometer.
For realizing above-mentioned and other purposes; The present invention provides a kind of device of measuring workpieces platform interferometer wavelength; Comprise: first interferometer and second interferometer; This first, second interferometer lays respectively at the relative both sides of this work stage; Second measuring beam that first measuring beam that this first interferometer is sent and this second interferometer are sent is formed a wavelength measurement axle, and this first, second interferometer obtains first light path and second light path of this first, second measuring beam respectively, the light wave of this first, second this first, second measuring beam of interferometer measurement with respect to one measuring period initial time cycle change number; And computing module; The theoretical length that calculates this wavelength measurement axle in order to first light path that obtains according to this first, second interferometer and second light path; And calculate the physical length of this wavelength measurement axle according to the kinematic parameter of the theoretical length of this wavelength measurement axle, this work stage; And change number according to the light wave of the physical length of this wavelength measurement axle, this first, second measuring beam with respect to cycle of initial time, and should measuring period the initial wavelength of this first, second measuring beam of initial time calculate the actual wavelength of this first, second measuring beam.
The kinematic parameter of this work stage comprises: the anglec of rotation of this work stage and/or the angle of inclination of this work stage.
This first measuring beam and second measuring beam are located along the same line.
The present invention also provides a kind of method of measuring workpieces platform interferometer wavelength; Comprise first light path and second light path that utilize first interferometer be positioned at these relative both sides of work stage and second interferometer to obtain first, second measuring beam that this first, second interferometer sends respectively respectively, this first measuring beam and second measuring beam are formed a wavelength measurement axle; The light wave that utilizes this first, second this first, second measuring beam of interferometer measurement with respect to one measuring period initial time cycle change number; Calculate the theoretical length of this wavelength measurement axle according to this first light path and second light path; Calculate the physical length of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage; And change number according to the light wave of the physical length of this wavelength measurement axle, this first, second measuring beam with respect to cycle of initial time, and should measuring period the initial wavelength of this first, second measuring beam of initial time calculate the actual wavelength of this first, second measuring beam.
This first measuring beam and second measuring beam are located along the same line.
This, initial wavelength of this first, second measuring beam of initial time was to see through following method to obtain measuring period: when utilizing a location device to carry out two markers align, this first, second interferometer measurement is along this wavelength measurement axial mean change cycle (this mean change cycle of PLSCONFM be whose mean change cycle); And according to these two standoff distance and the initial wavelength of this this first, second measuring beam of mean change computation of Period that are marked on this wavelength measurement direction of principal axis.
This locating device is alignment system or Hall element.
Compared with prior art, the present invention has following advantage:
The device and method of the disclosed measuring workpieces platform of the present invention laser interference wavelength through measuring beam is arranged in the interfering meter measuring device, directly and has effectively been measured wavelength, and it is more accurate to measure; Light path and relevant apparatus that stellar interferometer is measured need not the special measuring equipment of extra increase, and structure is simpler, and cost is cheaper; By the alignment system of litho machine, this measurement scheme can be passed through regular calibration, thereby eliminates systematic error.The device and method of measuring workpieces platform laser interference wavelength provided by the present invention had both gone for the double frequency interferometer, again applicable to the single-frequency interferometer.
Description of drawings
Can graphicly further be understood through following detailed Description Of The Invention and appended about advantage of the present invention and spirit.
Fig. 1 is an interferometer application mode of utilizing wavelength tracker monitoring of environmental wavelength in the prior art;
Fig. 2 is the structural representation that utilizes interferometer to come the measuring workpieces platform to move in the prior art;
Fig. 3 is the structural representation of the device of the disclosed stellar interferometer wavelength of the present invention;
Fig. 4 is that work stage is in rotation or the structural representation during heeling condition;
Embodiment
Specify specific embodiment of the present invention below in conjunction with accompanying drawing.
Shown in Fig. 1 is the structural representation that interferometer comes the measuring workpieces platform to move in the prior art.This figure with the interferometer measurement structure of employed typical measuring workpieces platform position in the litho machine as signal.This interferometer is positioned at the X and the Y direction of work stage, it the X of work stage to Y to being respectively arranged with some measuring beams.Measuring beam is through being installed on plane side's mirror reflection of work stage side, thus the length variations of interferometer through measuring beam the change in location of work stage.According to the structure arrangement of interferometer measurement light beam, the six-freedom degree of measuring workpieces platform at most in real time.
Fig. 2 is the structural representation that utilizes interferometer to come the measuring workpieces platform to move in the prior art.As shown in Figure 2, among Fig. 2 along the X of work stage 102 to Y to, on the infrastructural frame (not shown) of lithographic equipment, place three interferometers respectively, comprise along X to the 101a and the 101c that are provided with, along Y to the 101b that is provided with.Be not provided with some measuring beams among interferometer 101a and the interferometer 101b.This measuring beam is through being installed on the plane side mirror (not shown) reflection of work stage 102 sides, thus the length variations of interferometer through measuring beam the change in location of work stage.Yet; Because interferometer environmental parameter of living in; The for example variation of environment temperature, pressure etc., the wavelength of the measuring beam that interferometer sent also can receive the influence of environmental parameter and change, if can't measure the wavelength of measuring beam effectively in real time; Just the moving situation of interferometer measurement work stage can't be seen through effectively, and then work stage can't be effectively located.
Fig. 3 is the structural representation of the device of the disclosed measuring workpieces platform of the present invention interferometer wavelength.As shown in Figure 3, increase by two measuring light 1 and measuring light 2 among interferometer 101a and the interferometer 101c respectively, and measuring light 1 and measuring light 2 are referred to as the wavelength measurement axle.Shown in figure, measuring light 1 is located along the same line with measuring light 2, i.e. interferometer 101a, and work stage 102 is located along the same line with interferometer 101c three.In the present embodiment, the wavelength measurement axle by along X to the measuring beam that interferometer sent form, but in actual use, equally can the wavelength measurement axle be set to form along the measuring beam that interferometer sent of Y direction setting.Wavelength measurement axle (be measuring beam 1 with measuring beam 2) can have one or two measuring beams and other measurement axis shared, that is, the wavelength measurement axle can also be simultaneously other measurement logic axle.
In the present invention, interferometer 101a, 101c measure light path (being the length of measuring beam 1,2) L1, the L2 of the measuring beam 1,2 that it sent respectively., and the light wave of measuring measuring beam bundle 1,2 with respect to one measuring period initial time cycle change number δ i, carry out corresponding calculated for the present invention's computing module (for diagram) according to the measurement result of interferometer.
This computing module is according to the measuring beam journey L1 of measuring beam 1,2, the theoretical length L0=L1+L2 that L2 calculates this wavelength measurement axle.This computing module calculates the physical length L of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage 102 (for example the work stage anglec of rotation, work stage angle of inclination) afterwards; And this computing module according to the light wave of the physical length of this wavelength measurement axle, measuring beam 1,2 with respect to this measuring period initial time cycle change number, and should measuring period the initial wavelength of measuring beam 1,2 of initial time calculate the actual wavelength of measuring beam 1,2:
Wherein,
By two measuring beams 1,2 the light wave number of cycles altogether of process light path, λ
0The initial wavelength of measuring beam 1,2 for this of initial time measuring period.
K is the length of work stage along this wavelength measurement direction of principal axis (promptly along directions X shown in Figure 3).Initial wavelength X
0The acquisition mode, hereinafter be described in detail.
What need to specify is, in apparatus of the present invention, because the wavelength measurement axle, the interferometer 101a and the 101c that promptly send measuring beam 1 and measuring beam 2 all are positioned on the infrastructural frame of lithographic equipment, and interferometer 101a, 101c relative position are fixed.In the process of litho machine work; When work stage 102 can take place along X shown in Figure 3 to or Y during to displacement; Because the not change of size of work stage 102; Therefore measuring beam 1 is a fixed value with the light path sum of 2 processes of measuring beam, the physical length L=L0 of above-mentioned wavelength measurement axle under this kind situation.There is mirror so, has variation, show that then the wavelength of measuring beam 1,2 changes if the striped of interferometer 101a and 101c changes sum.
According to the number that striped changes, can measure current measuring beam wavelength:
So, in the practical work process of litho machine, work stage 102 except the needs level to moving, also need in time rotate and tilt.When there is rotation in work stage or tilts, the length of forming the measuring light of wavelength measurement axle will change, promptly this moment measurement axis physical length L ≠ L0.As shown in Figure 4; When work stage had rotation and angle of inclination Rx, Ry, Rz angle, the physical length of wavelength measurement axle
K was that work stage is along the axial length of this wavelength measurement.
Below will specify the embodiment of the method for the disclosed measuring workpieces platform of the present invention interferometer wavelength.
At first in step 1, utilize interferometer 101a and interferometer 101c to obtain light path L1, the L2 of measuring beam 1,2 respectively, and the light wave of measuring measuring beam bundle 1,2 with respect to one measuring period initial time cycle change number δ i.
In step 2, this computing module calculates the theoretical length L0=L1+L2 of the wavelength measurement axle of measuring beam 1,2 compositions according to light path L1, the L2 of the measuring beam 1,2 of interferometer 101a, 101c acquisition.
In step 3, this computing module calculates (kinematic parameter comprises the work stage anglec of rotation, angle of inclination etc.) physical length
of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage
In step 4, this computing module changes number δ i according to the light wave of the physical length L of this wavelength measurement axle, measuring beam 1,2 with respect to cycle of initial time, and should measuring period the initial wavelength X of measuring beam 1,2 of initial time
0Calculate the actual wavelength of this first, second measuring beam
What need to specify is, in the present invention's the method, because the wavelength measurement axle, the interferometer 101a and the 101c that promptly send measuring beam 1 and measuring beam 2 all are positioned on the infrastructural frame of lithographic equipment, and interferometer 101a, 101c relative position are fixed.In the process of litho machine work; When work stage 102 can take place along X shown in Figure 3 to or Y during to displacement; Because the not change of size of work stage 102; Therefore measuring beam 1 is a fixed value with the light path sum of 2 processes of measuring beam, the physical length L=L0 of the wavelength measurement axle that calculates in the above-mentioned steps 3 under this kind situation.There is mirror so, has variation, show that then the wavelength of measuring beam 1,2 changes if the striped of interferometer 101a and 101c changes sum.
According to the number that striped changes, can measure current measuring beam wavelength:
So, in the practical work process of litho machine, work stage 102 except the needs level to moving, also need in time rotate and tilt.When there is rotation in work stage or tilts, the length of forming the measuring light of wavelength measurement axle will change, the physical length L ≠ L0 of the wavelength measurement axle that promptly calculates in the above-mentioned steps 3 this moment.For example shown in Fig. 4; When work stage had rotation and angle of inclination Rx, Ry, Rz angle, the physical length of the wavelength measurement axle that above-mentioned steps 3 calculates
K was that work stage is along the axial length of this wavelength measurement.
Below explanation is in the initial wavelength X of the above-mentioned measuring beam 1,2 of initial time measuring period
0Preparation method.
In the present technique scheme, because having adopted, this embodiment utilize interferometer to come the measuring workpieces platform to move in the lithographic equipment as setting forth, therefore can realize through the alignment function in the middle of the litho machine.Alignment function in the litho machine is realized by alignment system that mainly the alignment function in the litho machine mainly refers to, through reference mark being set on the work stage or alignment mark being set to realize mask-silicon chip coordinate position relation accurately on silicon chip.Owing to how to realize the composition of alignment function and alignment system, in the photoetching machine technique field, belonged to the common-sense technology of comparatively knowing, and the present invention do not relate to the improvement to alignment function or alignment system, so locate to skip over.
Please with reference to Fig. 3, initial wavelength X
0Acquisition realize by means of the alignment mark on reference mark on the work stage 102 103,104 or the benchmark silicon chip 106 105,106.When work stage 102 is moved under the control of interferometer; Suppose that two reference marks 103,104 are Δ x at the wavelength measurement direction of principal axis of forming along measuring beam 1,2 (be shown in Figure 3 X to) standoff distance; And the alignment system of litho machine is aimed at these two marks 103,104 successively; Is Δ i aiming at measured two measuring beams 1,2 of interferometer 101a constantly, 101c along mean change cycle of wavelength measurement direction of principal axis (be shown in Figure 3 X to), and then measuring beam 1,2 initial wavelength are
Likewise, when the present invention is applied in litho machine and other lathe or the instrument, can adopt other system that possesses positioning function to obtain initial wavelength, such as the location that Hall element is used for work stage or lathe is installed in the fixed position.
When present embodiment is applied in the lithographic equipment, can be by means of the alignment system of litho machine as its locating device, and can accurately proofread and correct the wavelength measurement value termly voluntarily.
See through the present invention, the wavelength of the real-time calculating interferometer measurement light beam in the time of effectively, and then can effectively measure the work stage moving situation through interferometer, realize work stage is accurately located.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to explain technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within scope of the present invention under this invention's idea through the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (7)
1. the device of a measuring workpieces platform interferometer wavelength comprises:
First interferometer and second interferometer; This first, second interferometer lays respectively at the relative both sides of this work stage; Second measuring beam that first measuring beam that this first interferometer is sent and this second interferometer are sent is formed a wavelength measurement axle; This first, second interferometer obtains first light path and second light path of this first, second measuring beam respectively, the light wave of this first, second this first, second measuring beam of interferometer measurement with respect to one measuring period initial time cycle change number; And
Computing module; The theoretical length that calculates this wavelength measurement axle in order to first light path that obtains according to this first, second interferometer and second light path; And calculate the physical length of this wavelength measurement axle according to the kinematic parameter of the theoretical length of this wavelength measurement axle, this work stage; And according to the light wave of the physical length of this wavelength measurement axle, this first, second measuring beam with respect to this measuring period initial time cycle change number, and should measuring period the initial wavelength of this first, second measuring beam of initial time calculate the actual wavelength of this first, second measuring beam.
2. the device of stellar interferometer wavelength as claimed in claim 1 is characterized in that, the kinematic parameter of this work stage comprises: the anglec of rotation of this work stage and/or the angle of inclination of this work stage.
3. the device of stellar interferometer wavelength as claimed in claim 1 is characterized in that, this first measuring beam bundle and second measuring beam are located along the same line.
4. the method for a measuring workpieces platform interferometer wavelength comprises:
First interferometer and second interferometer that utilization is positioned at these relative both sides of work stage obtains first light path and second light path of first, second measuring beam that this first, second interferometer sends respectively respectively, and this first measuring beam and second measuring beam are formed a wavelength measurement axle;
The light wave that utilizes this first, second this first, second measuring beam of interferometer measurement with respect to one measuring period initial time cycle change number;
Calculate the theoretical length of this wavelength measurement axle according to this first light path and second light path;
Calculate the physical length of this wavelength measurement axle according to the theoretical length of this wavelength measurement axle, the kinematic parameter of this work stage; And
Change number according to the light wave of the physical length of this wavelength measurement axle, this first, second measuring beam with respect to cycle of initial time, and should measuring period the initial wavelength of this first, second measuring beam of initial time calculate the actual wavelength of this first, second measuring beam.
5. the method for stellar interferometer wavelength as claimed in claim 4 is characterized in that, this first measuring beam and second measuring beam are located along the same line.
6. the method for measuring workpieces platform interferometer wavelength as claimed in claim 4 is characterized in that, this, initial wavelength of this first, second measuring beam of initial time was to see through following method to obtain measuring period:
When utilizing a location device to carry out two markers align, this first, second measuring light of this first, second interferometer measurement is along this wavelength measurement axial mean change cycle; And
Be marked at standoff distance and this first, second measuring beam on this wavelength measurement direction of principal axis along the initial wavelength of this first, second measuring beam of the axial mean change computation of Period of this wavelength measurement according to these two.
7. the method for work stage stellar interferometer wavelength as claimed in claim 6 is characterized in that, this locating device is alignment system or Hall element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105072205A CN102445279B (en) | 2010-10-14 | 2010-10-14 | Device and method for measuring wave lengths of interferometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105072205A CN102445279B (en) | 2010-10-14 | 2010-10-14 | Device and method for measuring wave lengths of interferometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102445279A true CN102445279A (en) | 2012-05-09 |
| CN102445279B CN102445279B (en) | 2013-11-13 |
Family
ID=46007994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105072205A Active CN102445279B (en) | 2010-10-14 | 2010-10-14 | Device and method for measuring wave lengths of interferometer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102445279B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105277118A (en) * | 2015-11-27 | 2016-01-27 | 成都信息工程大学 | Laser wavelength correction-type corner reflector laser interferometer and wavelength correction method |
| CN108088501A (en) * | 2017-12-15 | 2018-05-29 | 中交基础设施养护集团有限公司 | A kind of initial wavelength automatic correcting method of fibre optical sensor |
| CN108898559A (en) * | 2018-06-20 | 2018-11-27 | 中国科学院光电技术研究所 | Atmospheric dispersion modification method based on image deconvolution |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1990014582A1 (en) * | 1989-05-23 | 1990-11-29 | Kabushiki Kaisha Komatsu Seisakusho | Wavelength detector |
| JPH10281884A (en) * | 1997-04-07 | 1998-10-23 | Nec Corp | Wavelength measuring apparatus and wavelength controller with the wavelength measuring apparatus |
| CN1260474A (en) * | 1999-01-08 | 2000-07-19 | 惠普公司 | Structure of double wavelength heterodyne interferometer for compensating air disturbance |
-
2010
- 2010-10-14 CN CN2010105072205A patent/CN102445279B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1990014582A1 (en) * | 1989-05-23 | 1990-11-29 | Kabushiki Kaisha Komatsu Seisakusho | Wavelength detector |
| JPH10281884A (en) * | 1997-04-07 | 1998-10-23 | Nec Corp | Wavelength measuring apparatus and wavelength controller with the wavelength measuring apparatus |
| CN1260474A (en) * | 1999-01-08 | 2000-07-19 | 惠普公司 | Structure of double wavelength heterodyne interferometer for compensating air disturbance |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105277118A (en) * | 2015-11-27 | 2016-01-27 | 成都信息工程大学 | Laser wavelength correction-type corner reflector laser interferometer and wavelength correction method |
| CN105277118B (en) * | 2015-11-27 | 2018-03-27 | 成都信息工程大学 | A kind of optical maser wavelength modification method using optical maser wavelength amendment type corner reflector laser interferometer |
| CN108088501A (en) * | 2017-12-15 | 2018-05-29 | 中交基础设施养护集团有限公司 | A kind of initial wavelength automatic correcting method of fibre optical sensor |
| CN108088501B (en) * | 2017-12-15 | 2021-01-26 | 中交基础设施养护集团有限公司 | Method for automatically correcting initial wavelength of optical fiber sensor |
| CN108898559A (en) * | 2018-06-20 | 2018-11-27 | 中国科学院光电技术研究所 | Atmospheric dispersion modification method based on image deconvolution |
| CN108898559B (en) * | 2018-06-20 | 2021-11-19 | 中国科学院光电技术研究所 | Atmospheric dispersion correction method based on image deconvolution |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102445279B (en) | 2013-11-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Gao et al. | Measurement technologies for precision positioning | |
| JP2008051696A (en) | Optical axis deviation type laser interferometer, its calibration method, correction method, and measuring method | |
| CN110455226B (en) | Calibration system and method for laser collimation transceiving integrated straightness measurement | |
| CN103278110A (en) | Compensation method for coupling error of guide rail | |
| CN103528499B (en) | Morphology compensation type double-optical-axis linear displacement laser interferometer calibration method and device | |
| CN104215181A (en) | Large-length laser interferometer measurement system for eliminating Abbe error | |
| CN110530296A (en) | A kind of line laser fix error angle determines method | |
| CN107250714A (en) | Method and apparatus for interfering detection | |
| Iwasawa et al. | Development of a measuring method for several types of programmed tool paths for NC machine tools using a laser displacement interferometer and a rotary encoder | |
| KR20130089191A (en) | Position-measuring device and system having a plurality of position-measuring devices | |
| CN110081823A (en) | A kind of lathe five degree of freedom geometric moving error measuring system | |
| CN103528526B (en) | Morphology compensation type three-optical-axis linear displacement laser interferometer calibration method and device | |
| CN105352453B (en) | Aspherical mirror vertex curvature radius measuring method in nonzero digit interference detecting system | |
| CN111238337B (en) | Step gauge calibration method and system capable of eliminating Abbe errors based on laser interference | |
| CN102445279B (en) | Device and method for measuring wave lengths of interferometer | |
| CN107367219B (en) | Lorentz force motor-direct-drive type inductance sensor calibrating installation | |
| CN103424069A (en) | Optical device, interference system and optical measuring method used for measuring multiple geometric errors | |
| CN113091653B (en) | Device and method for measuring angle freedom degree error of linear guide rail based on pentaprism | |
| CN103439868B (en) | Device and method for measuring numerical aperture of projection objective | |
| Li et al. | Method for simultaneously and directly measuring all six-DOF motion errors of a rotary axis | |
| CN101245984A (en) | Laser interfering contrast and calibration device | |
| CN209706746U (en) | A kind of lathe five degree of freedom geometric moving error measuring system | |
| JP7361166B2 (en) | Multi-axis laser interferometer and displacement detection method | |
| CN103134428A (en) | Distributed rapid precise plane six-degree of freedom pose measuring device and measuring method | |
| JP2008286598A (en) | Wavelength estimation method of tracking laser interferometer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 1525 Zhang Dong Road, Zhangjiang hi tech park, Pudong District, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |