AU2002217867A1 - Crosslinked polyethylene polishing pad for chemical-mechnical polishing, polishing apparatus and polishing method - Google Patents
Crosslinked polyethylene polishing pad for chemical-mechnical polishing, polishing apparatus and polishing methodInfo
- Publication number
- AU2002217867A1 AU2002217867A1 AU2002217867A AU1786702A AU2002217867A1 AU 2002217867 A1 AU2002217867 A1 AU 2002217867A1 AU 2002217867 A AU2002217867 A AU 2002217867A AU 1786702 A AU1786702 A AU 1786702A AU 2002217867 A1 AU2002217867 A1 AU 2002217867A1
- Authority
- AU
- Australia
- Prior art keywords
- polishing
- chemical
- mechnical
- crosslinked polyethylene
- pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US25029900P | 2000-11-29 | 2000-11-29 | |
US60250299 | 2000-11-29 | ||
US30437501P | 2001-07-10 | 2001-07-10 | |
US60304375 | 2001-07-10 | ||
US10/000,101 US6846225B2 (en) | 2000-11-29 | 2001-10-24 | Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor |
PCT/US2001/044177 WO2002043922A1 (en) | 2000-11-29 | 2001-11-27 | Crosslinked polyethylene polishing pad for chemical-mechnical polishing, polishing apparatus and polishing method |
USNOTGIVEN | 2002-04-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002217867A1 true AU2002217867A1 (en) | 2002-06-11 |
Family
ID=27356605
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002217867A Abandoned AU2002217867A1 (en) | 2000-11-29 | 2001-11-27 | Crosslinked polyethylene polishing pad for chemical-mechnical polishing, polishing apparatus and polishing method |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1345734B1 (en) |
CN (1) | CN1484566A (en) |
AU (1) | AU2002217867A1 (en) |
DE (1) | DE60118963T2 (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI510328B (en) * | 2010-05-03 | 2015-12-01 | Iv Technologies Co Ltd | Base layer, polishing pad including the same and polishing method |
CN102554764A (en) * | 2012-02-15 | 2012-07-11 | 蔡桂芳 | Machine and method for grinding and polishing ultra-long and ultra-thin quartz plate |
US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
KR102436416B1 (en) | 2014-10-17 | 2022-08-26 | 어플라이드 머티어리얼스, 인코포레이티드 | Cmp pad construction with composite material properties using additive manufacturing processes |
US10946495B2 (en) * | 2015-01-30 | 2021-03-16 | Cmc Materials, Inc. | Low density polishing pad |
KR20240015161A (en) | 2016-01-19 | 2024-02-02 | 어플라이드 머티어리얼스, 인코포레이티드 | Porous chemical mechanical polishing pads |
US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
US20180134918A1 (en) * | 2016-11-11 | 2018-05-17 | Jh Rhodes Company, Inc. | Soft polymer-based material polishing media |
KR101945874B1 (en) * | 2017-08-07 | 2019-02-11 | 에스케이씨 주식회사 | Surface treated window for polishing pad and polishing pad comprising the same |
CN116749093B (en) * | 2023-08-11 | 2023-11-07 | 太原理工大学 | Preparation process of magnetic grinding tool and slender tube internal polishing device based on magnetic grinding tool |
-
2001
- 2001-11-27 CN CNA018215505A patent/CN1484566A/en active Pending
- 2001-11-27 DE DE60118963T patent/DE60118963T2/en not_active Expired - Fee Related
- 2001-11-27 AU AU2002217867A patent/AU2002217867A1/en not_active Abandoned
- 2001-11-27 EP EP01998427A patent/EP1345734B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1345734A1 (en) | 2003-09-24 |
EP1345734B1 (en) | 2006-04-19 |
CN1484566A (en) | 2004-03-24 |
DE60118963D1 (en) | 2006-05-24 |
DE60118963T2 (en) | 2006-12-21 |
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