ZA791680B - A method of and apparatus for the measurement of high precision etched elements - Google Patents

A method of and apparatus for the measurement of high precision etched elements

Info

Publication number
ZA791680B
ZA791680B ZA791680A ZA791680A ZA791680B ZA 791680 B ZA791680 B ZA 791680B ZA 791680 A ZA791680 A ZA 791680A ZA 791680 A ZA791680 A ZA 791680A ZA 791680 B ZA791680 B ZA 791680B
Authority
ZA
South Africa
Prior art keywords
measurement
high precision
etched elements
precision etched
elements
Prior art date
Application number
ZA791680A
Inventor
H Michel
W Glashauser
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of ZA791680B publication Critical patent/ZA791680B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/28—Measuring arrangements characterised by the use of optical techniques for measuring areas
    • G01B11/285—Measuring arrangements characterised by the use of optical techniques for measuring areas using photoelectric detection means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
ZA791680A 1978-04-10 1979-04-09 A method of and apparatus for the measurement of high precision etched elements ZA791680B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782815373 DE2815373A1 (en) 1978-04-10 1978-04-10 METHOD AND DEVICE FOR TESTING HIGH-PRECISION FORMAT PARTS

Publications (1)

Publication Number Publication Date
ZA791680B true ZA791680B (en) 1980-04-30

Family

ID=6036555

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA791680A ZA791680B (en) 1978-04-10 1979-04-09 A method of and apparatus for the measurement of high precision etched elements

Country Status (7)

Country Link
EP (1) EP0004615A1 (en)
JP (1) JPS54139752A (en)
AU (1) AU4583079A (en)
BR (1) BR7902168A (en)
DE (1) DE2815373A1 (en)
GB (1) GB2018983A (en)
ZA (1) ZA791680B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8411673D0 (en) * 1984-05-08 1984-06-13 Binns I D Assessing power coatings
JP4179585B2 (en) 2002-03-29 2008-11-12 ユニ・チャーム株式会社 Printed biodegradable plastic film

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3419446A (en) * 1965-02-15 1968-12-31 Chemcut Corp Method and means for continuous control of etching rate
US3503817A (en) * 1966-01-24 1970-03-31 Fmc Corp Process for controlling metal etching operation
US3663724A (en) * 1969-11-14 1972-05-16 Chemcut Corp Built-in type speed control for conveyorized continuous etcher
US3669771A (en) * 1970-01-28 1972-06-13 Zenith Radio Corp Process of etching a shadow mask
US3664942A (en) * 1970-12-31 1972-05-23 Ibm End point detection method and apparatus for sputter etching

Also Published As

Publication number Publication date
AU4583079A (en) 1979-10-18
BR7902168A (en) 1979-12-04
EP0004615A1 (en) 1979-10-17
JPS54139752A (en) 1979-10-30
GB2018983A (en) 1979-10-24
DE2815373A1 (en) 1979-10-11

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