ZA200900302B - Composition, article, its manufacture and use - Google Patents

Composition, article, its manufacture and use

Info

Publication number
ZA200900302B
ZA200900302B ZA200900302A ZA200900302A ZA200900302B ZA 200900302 B ZA200900302 B ZA 200900302B ZA 200900302 A ZA200900302 A ZA 200900302A ZA 200900302 A ZA200900302 A ZA 200900302A ZA 200900302 B ZA200900302 B ZA 200900302B
Authority
ZA
South Africa
Prior art keywords
article
manufacture
composition
Prior art date
Application number
ZA200900302A
Other languages
English (en)
Inventor
Peter Andrew Reath Bennett
Roberto Massimo Allegrini
Original Assignee
Imagichem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imagichem Ltd filed Critical Imagichem Ltd
Publication of ZA200900302B publication Critical patent/ZA200900302B/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/16—Halogen-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/04—Printing plates or foils; Materials therefor metallic
    • B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/54—Quaternary phosphonium compounds
    • C07F9/5456—Arylalkanephosphonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/30—Sulfur-, selenium- or tellurium-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/32—Phosphorus-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/12—Preparation of material for subsequent imaging, e.g. corona treatment, simultaneous coating, pre-treatments
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
ZA200900302A 2006-06-30 2009-01-14 Composition, article, its manufacture and use ZA200900302B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0612984A GB2439734A (en) 2006-06-30 2006-06-30 Coating for a lithographic precursor and use thereof

Publications (1)

Publication Number Publication Date
ZA200900302B true ZA200900302B (en) 2010-01-27

Family

ID=36888365

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA200900302A ZA200900302B (en) 2006-06-30 2009-01-14 Composition, article, its manufacture and use

Country Status (16)

Country Link
US (1) US20100233444A1 (enExample)
EP (1) EP2035231A2 (enExample)
JP (1) JP5078999B2 (enExample)
KR (1) KR20090024151A (enExample)
CN (1) CN101495312B (enExample)
AU (1) AU2007263607B2 (enExample)
BR (1) BRPI0713208A2 (enExample)
CA (1) CA2656340A1 (enExample)
GB (1) GB2439734A (enExample)
MY (1) MY146634A (enExample)
NZ (1) NZ573590A (enExample)
RU (1) RU2008152236A (enExample)
SG (1) SG173335A1 (enExample)
TN (1) TNSN08500A1 (enExample)
WO (1) WO2008001127A2 (enExample)
ZA (1) ZA200900302B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012023474A1 (ja) * 2010-08-20 2012-02-23 Jsr株式会社 着色剤、着色組成物、カラーフィルタ及び表示素子
JP5705969B2 (ja) * 2011-03-28 2015-04-22 富士フイルム株式会社 平版印刷版の製版方法
RU2497785C2 (ru) * 2011-06-30 2013-11-10 Юрий Ильич Реутов Способ получения удобрений пролонгированного действия
JP5866829B2 (ja) * 2011-07-04 2016-02-24 日清紡ホールディングス株式会社 イオン液体
CN102845315A (zh) * 2012-09-16 2013-01-02 李理 一种喂料器的吸入式喂料装置
CN105818562B (zh) * 2015-01-05 2018-06-15 中国科学院化学研究所 一种水性油墨用版材及其制备方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3022473A1 (de) 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
US4708925A (en) * 1984-12-11 1987-11-24 Minnesota Mining And Manufacturing Company Photosolubilizable compositions containing novolac phenolic resin
US5372915A (en) 1993-05-19 1994-12-13 Eastman Kodak Company Method of making a lithographic printing plate containing a resole resin and a novolac resin in the radiation sensitive layer
JP2964874B2 (ja) * 1994-06-10 1999-10-18 信越化学工業株式会社 化学増幅ポジ型レジスト材料
US5554664A (en) * 1995-03-06 1996-09-10 Minnesota Mining And Manufacturing Company Energy-activatable salts with fluorocarbon anions
IL122318A (en) * 1996-04-23 2001-01-28 Horsell Graphic Ind Ltd Lithographic printing forms
BR9810668A (pt) * 1997-07-05 2001-09-04 Kodak Polychrome Graphics Co Processos para formação de moldes e materiais sensìveis a radiação
GB9722861D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Improvements in relation to the manufacture of lithographic printing forms
GB9722862D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
US6153353A (en) 1998-03-14 2000-11-28 Agfa-Gevaert, N.V. Method for making positive working printing plates from a heat mode sensitive imaging element
JP3791187B2 (ja) * 1998-06-03 2006-06-28 コニカミノルタホールディングス株式会社 画像形成材料及びそれを用いる画像形成方法
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
TWI250379B (en) 1998-08-07 2006-03-01 Az Electronic Materials Japan Chemical amplified radiation-sensitive composition which contains onium salt and generator
US5985514A (en) * 1998-09-18 1999-11-16 Eastman Kodak Company Imaging member containing heat sensitive thiosulfate polymer and methods of use
BR9915407A (pt) * 1998-11-16 2001-07-24 Mitsubishi Chem Corp Placa de impressão litográfica fotossensìvel positiva sensìvel a raios infravermelhos proximos; método de produzila e método para formar uma imagem positiva
US6163353A (en) * 1998-12-03 2000-12-19 Industrial Technology Research Institute Method for fabricating a reflective liquid crystal display panel having a reflector with an inclined surface and devices made
US6254955B1 (en) 1999-07-20 2001-07-03 Taiwan Hopax Chems. Mfg. Co., Ltd. Self-stick writing note
US6706466B1 (en) 1999-08-03 2004-03-16 Kodak Polychrome Graphics Llc Articles having imagable coatings
US6391524B2 (en) * 1999-11-19 2002-05-21 Kodak Polychrome Graphics Llc Article having imagable coatings
JP2002318452A (ja) * 2001-04-23 2002-10-31 Mitsubishi Chemicals Corp ポジ型感光性組成物、ポジ型感光性平版印刷版及びそれを用いたポジ画像形成方法
US6772687B2 (en) * 2001-06-15 2004-08-10 Agfa-Gevaert Method for the preparation of a lithographic printing plate
JP3917422B2 (ja) * 2001-07-26 2007-05-23 富士フイルム株式会社 画像形成材料
JP4102603B2 (ja) * 2002-03-08 2008-06-18 富士フイルム株式会社 自動現像装置の補充液補充方法
US6841333B2 (en) 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
US7160667B2 (en) * 2003-01-24 2007-01-09 Fuji Photo Film Co., Ltd. Image forming material
JP4054264B2 (ja) * 2003-01-24 2008-02-27 富士フイルム株式会社 ポジ型画像形成材料
JP2004233854A (ja) * 2003-01-31 2004-08-19 Fuji Photo Film Co Ltd 画像形成材料
EP1543959B1 (en) * 2003-12-18 2009-07-15 Agfa Graphics N.V. Heat-sensitive lithographic printing plate precursor.
JP2006011152A (ja) * 2004-06-28 2006-01-12 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP2006058430A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006091766A (ja) * 2004-09-27 2006-04-06 Fuji Photo Film Co Ltd 平版印刷版原版

Also Published As

Publication number Publication date
JP2009543105A (ja) 2009-12-03
CN101495312B (zh) 2014-08-20
AU2007263607A1 (en) 2008-01-03
RU2008152236A (ru) 2010-08-10
AU2007263607B2 (en) 2012-06-28
NZ573590A (en) 2012-12-21
CA2656340A1 (en) 2008-01-03
GB0612984D0 (en) 2006-08-09
JP5078999B2 (ja) 2012-11-21
EP2035231A2 (en) 2009-03-18
SG173335A1 (en) 2011-08-29
US20100233444A1 (en) 2010-09-16
WO2008001127A2 (en) 2008-01-03
CN101495312A (zh) 2009-07-29
GB2439734A (en) 2008-01-09
MY146634A (en) 2012-09-14
BRPI0713208A2 (pt) 2012-04-10
WO2008001127A3 (en) 2008-05-02
TNSN08500A1 (en) 2010-04-14
KR20090024151A (ko) 2009-03-06

Similar Documents

Publication Publication Date Title
IL230759A0 (en) Converted acyl anilide, the pharmaceutical composition containing it and its uses
PL2046405T3 (pl) Biomateriały, ich wytwarzanie i zastosowanie
TWI561237B (en) Substituted dihydropyrazolones and their use
IL210722A0 (en) Benzazepine derivatives, compositions comprising the same and uses thereof
PL2271725T3 (pl) Kompozycje zawierające 2,3,3,3-tetrafluoropropen i 1,1,1-trifluoropropen
ZA200810323B (en) Fkbp-l and uses thereof
IL212836A0 (en) Azaquinolinone derivatives, compositions comprising the same and uses thereof
PL2207835T3 (pl) Kompozycje i wytworzone z nich wyroby
PL2064327T3 (pl) Dbait i ich zastosowania
IL212278A0 (en) Morpholinopurine derivatives, compositions comprising the same and uses thereof
GB0706077D0 (en) Methods, Compositions and uses thereof
ZA200903906B (en) Carboranylporphyrins and uses thereof
GB0601143D0 (en) Uses, methods and compositions
EP2340297A4 (en) COMPOSITION, ITS MANUFACTURING METHOD AND USE
GB0717376D0 (en) Composition and manufacture thereof
ZA200900302B (en) Composition, article, its manufacture and use
GB0819432D0 (en) Compound, composition and use
WO2008021135A8 (en) Syneretic composition, associated method and article
PL2099862T3 (pl) Nowa kompozycja termoplastyczna i jej zastosowanie
AP2010005388A0 (en) Pupicidal and larvicidal composition.
GB2435262B (en) Method, composition and articles
PT2150507T (pt) Composição cimentícia antimicrobiana, método e artigo
GB0601247D0 (en) Article
GB0607562D0 (en) Method, composition and use
GB2461611B (en) Composition and use thereof