WO2025007634A1 - 干燥装置 - Google Patents

干燥装置 Download PDF

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Publication number
WO2025007634A1
WO2025007634A1 PCT/CN2024/091337 CN2024091337W WO2025007634A1 WO 2025007634 A1 WO2025007634 A1 WO 2025007634A1 CN 2024091337 W CN2024091337 W CN 2024091337W WO 2025007634 A1 WO2025007634 A1 WO 2025007634A1
Authority
WO
WIPO (PCT)
Prior art keywords
lower cavity
cavity
rotating mechanism
drying device
rotate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2024/091337
Other languages
English (en)
French (fr)
Inventor
孙璎南
贺斌
王晖
陶晓峰
杨配贤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ACM Research Shanghai Inc
Original Assignee
ACM Research Shanghai Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ACM Research Shanghai Inc filed Critical ACM Research Shanghai Inc
Priority to KR1020267003648A priority Critical patent/KR20260032621A/ko
Publication of WO2025007634A1 publication Critical patent/WO2025007634A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B11/00—Machines or apparatus for drying solid materials or objects with movement which is non-progressive
    • F26B11/18—Machines or apparatus for drying solid materials or objects with movement which is non-progressive on or in moving dishes, trays, pans, or other mainly-open receptacles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
    • F26B25/02—Applications of driving mechanisms, not covered by another subclass
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B25/00—Details of general application not covered by group F26B21/00 or F26B23/00
    • F26B25/06—Chambers, containers, or receptacles
    • F26B25/14—Chambers, containers, receptacles of simple construction
    • F26B25/18—Chambers, containers, receptacles of simple construction mainly open, e.g. dish, tray, pan, rack
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring

Definitions

  • the invention relates to the technical field of semiconductor manufacturing, and in particular to a drying device.
  • the substrate needs to be dried after wet etching or cleaning process.
  • a supercritical fluid with zero surface tension can be used to dry the substrate.
  • a substrate covered with IPA is transferred from a cleaning chamber to a drying device, and the upper and lower cavities of the drying device are closed to form a closed chamber.
  • a supercritical fluid is supplied to the closed chamber to dissolve the IPA on the surface of the substrate into the supercritical fluid to form a mixture of IPA and supercritical fluid.
  • the closed chamber As the closed chamber is continuously supplied with supercritical fluid and the mixture of IPA and supercritical fluid is continuously discharged, the replacement between the supercritical fluid and the IPA covering the surface of the substrate is completed, thereby achieving the purpose of removing IPA from the substrate. Then, the supercritical fluid is vaporized and discharged, and the closed chamber is opened after the pressure in the closed chamber returns to atmospheric pressure, and finally the substrate after drying is taken out.
  • the closed chamber formed by locking the upper and lower chambers should be able to maintain the high pressure required during the substrate drying process to keep the supercritical fluid in a supercritical state. Therefore, how to lock the upper and lower chambers to form a pressure-resistant closed chamber is particularly important.
  • the purpose of the present invention is to solve the problem in the prior art of how to lock the upper cavity and the lower cavity to form a closed chamber.
  • an embodiment of the present invention provides a drying device, comprising:
  • the upper cavity has a first locking portion
  • a lower cavity is disposed below the upper cavity, and has a second locking portion adapted to match the first locking portion
  • a substrate tray is disposed in the lower cavity and is used to carry the substrate
  • the rotating mechanism is used to drive at least one of the upper cavity and the lower cavity to rotate, so that the upper cavity and the lower cavity are tightened through the first locking part and the second locking part to form a pressure-resistant closed chamber.
  • the drying device provided by the present invention has a first locking part on the upper cavity and a second screwing part matched with the first locking part on the lower cavity. After the upper cavity and the lower cavity are close to each other, at least one of the upper cavity and the lower cavity is driven to rotate by a rotating mechanism, so that the first locking part and the second locking part are locked with each other, and the upper cavity and the lower cavity form a pressure-resistant closed chamber to meet the high pressure requirements required in the substrate drying process, so that the supercritical fluid is in a supercritical state to dry the substrate.
  • FIG1 is a schematic diagram of the three-dimensional structure of a drying device provided in Example 1 of the present invention.
  • FIG2 is a schematic diagram of the three-dimensional structure of the closed chamber of the drying device provided in Example 1 of the present invention when it is opened;
  • Example 3 is a schematic diagram of the three-dimensional structure of the lower cavity and the upper cavity of the drying device provided in Example 1 of the present invention when they are closed and not tightened;
  • FIG4 is a schematic diagram of the three-dimensional structure of the lower cavity and the upper cavity of the drying device provided in Example 1 of the present invention after being screwed together;
  • FIG5 is a partial schematic diagram of a drying device provided in Example 1 of the present invention.
  • Example 6 is a schematic cross-sectional view of the lower cavity and the upper cavity of the drying device provided in Example 1 of the present invention after being screwed together;
  • FIG7 is a schematic diagram of the three-dimensional structure of the upper cavity provided in Example 1 of the present invention.
  • FIG8 is a schematic diagram of the three-dimensional structure of the lower cavity provided in Example 1 of the present invention.
  • FIG9 is a schematic diagram of the three-dimensional structure of the lifting mechanism, the rotating mechanism and the supporting member provided in Example 1 of the present invention.
  • FIG10 is a schematic structural diagram of a lifting mechanism and a rotating mechanism provided in Example 2 of the present invention.
  • FIG11 is a schematic diagram of the three-dimensional structure of the lower cavity and the upper cavity of the drying device provided in Example 2 of the present invention after being screwed together;
  • FIG12 is a bottom view of the structure of the lower cavity provided in Example 2 of the present invention.
  • FIG13 is a schematic diagram of the three-dimensional structure of the lower cavity and the upper cavity of the drying device provided in Example 3 of the present invention after being screwed together;
  • FIG14 is a schematic structural diagram of a lifting mechanism and a rotating mechanism provided in Example 4 of the present invention.
  • FIG15 is a schematic structural diagram of the lifting mechanism and the rotating mechanism provided in Embodiment 4 of the present invention from another perspective.
  • FIG16 is a schematic diagram of the three-dimensional structure of the drying device provided in Example 4 of the present invention when the sealed chamber is opened.
  • the terms “installed”, “connected”, and “connected” should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components.
  • installed should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • this embodiment 1 provides a drying device for drying a cleaned substrate.
  • the surface of the cleaned substrate is covered with a layer of IPA (isopropyl alcohol).
  • the drying device includes a frame 100, an upper cavity 200, a lower cavity 300, a substrate tray 400, a lifting mechanism 500 and a rotating mechanism 600.
  • the upper cavity 200 is fixed to the frame 100 and has a first locking portion 210.
  • the lower cavity 300 is disposed below the upper cavity 200 and has a second locking portion 310 adapted to the first locking portion 210.
  • the substrate tray 400 is disposed in the lower cavity 300 and is used to carry the substrate.
  • the lower cavity 300 moves relative to the upper cavity 200 in the vertical direction driven by the lifting mechanism 500, and the rotating mechanism 600 is used to drive the lower cavity 300 to rotate around the axis direction O of the lower cavity 300, for example, rotating in the clockwise direction R1, so that the first locking portion 210 and the second locking portion 310 are locked with each other, and the upper cavity 200 and the lower cavity 300 are tightened to form a closed chamber 233 (combined with reference to FIG. 6) to dry the substrate covered with IPA on the surface.
  • the rotating mechanism 600 drives the lower cavity 300 to rotate in an angle range of 10° to 40°, preferably, the rotating mechanism 600 drives the lower cavity 300 to rotate in an angle range of 20° to 30°.
  • the rotating mechanism 600 When the sealed chamber 233 is to be opened, the rotating mechanism 600 first drives the lower chamber 300 to rotate around the axis direction O of the lower chamber 300, for example, in the counterclockwise direction R2, so that the first locking portion 210 and the second locking portion 310 are mutually unlocked, that is, separated from each other. Then, the lifting mechanism 500 drives the lower chamber 300 to move downward in the vertical direction, so that the lower chamber 300 and the upper chamber 200 are separated from each other, and the sealed chamber 233 is opened.
  • the lower cavity 300 may be fixed to the frame, and the lifting mechanism drives the upper cavity 200 to move in the vertical direction.
  • the rotating mechanism 600 drives the upper cavity The upper cavity 200 rotates around the axis of the upper cavity 200.
  • two lifting mechanisms and two rotating mechanisms may be provided, wherein one lifting mechanism drives the upper cavity 200 to move in the vertical direction, and the other lifting mechanism drives the lower cavity 300 to move in the vertical direction, so that the upper cavity 200 and the lower cavity 300 move relative to each other in the vertical direction.
  • One rotating mechanism drives the upper cavity 200 to rotate in a first direction
  • the other rotating mechanism drives the lower cavity 300 to rotate in a second direction, the first direction being opposite to the second direction, so that the upper cavity 200 and the lower cavity 300 rotate simultaneously and are tightened to form a closed chamber.
  • the drying device provided in the present application has an upper cavity 200 and a lower cavity 300 which are respectively circular in shape, a hollow portion of the enclosed chamber 233 is circular, the first locking portion 210 is integrally formed with the upper cavity 200 , and the second locking portion 310 is integrally formed with the lower cavity 300 .
  • the first locking portion 210 of the upper cavity 200 includes a plurality of upper teeth, which are evenly spaced along the circumference of the upper cavity 200.
  • the second locking portion 310 includes a plurality of lower teeth, which are evenly spaced along the circumference of the lower cavity 300, and the plurality of upper teeth are matched with the plurality of lower teeth, and correspond one to one.
  • the plurality of lower teeth extend outward along the radial direction of the lower cavity 300 on the side wall of the lower cavity 300 in a convex shape, and the upper surface of the lower teeth is flush with the upper surface of the lower cavity 300 and is lower than the upper surface of the substrate tray 400.
  • the plurality of upper teeth extend downward along the side wall of the upper cavity 200, and are provided with grooves 211 for matching with the lower teeth.
  • the upper teeth are in an "L" shape.
  • a closed chamber 233 is formed between the upper cavity 200 and the lower cavity 300 (as shown in FIG. 6 ).
  • the closed chamber 233 is to be opened, the lower cavity 300 is first rotated to rotate the lower teeth out of the groove 211 of the upper teeth, that is, the lower teeth and the upper teeth are unlocked from each other, and then the lower cavity 300 is moved downward in the vertical direction to separate from the upper cavity 200 to open the closed chamber 233.
  • the closed chamber 233 is in the open state (as shown in FIG. 2 )
  • the distance between the upper cavity 200 and the lower cavity 300 meets the requirements for taking and placing the substrate.
  • the shapes of the upper teeth and the lower teeth can be interchangeable, that is, the upper teeth can be arranged to extend radially outward along the upper cavity 200 in a convex shape, and the lower teeth are arranged to form grooves that match the upper teeth.
  • the upper cavity 200 and the lower cavity 300 are screwed together by the upper teeth and the lower teeth to form a closed chamber.
  • the drying device provided in the present application has the upper cavity 200 and the lower cavity 300 preferably in circular shape, and the upper teeth and the lower teeth are evenly spaced along the circumference of the upper cavity 200 and the lower cavity 300, respectively. Therefore, the upper cavity 200 and the lower cavity 300 in the present application are subjected to more uniform force under high temperature and high pressure conditions, and as a pressure vessel that is frequently opened and closed, it has a longer service life and is more in line with the requirements of the present invention. Comply with the design standards for pressure vessels.
  • a plurality of upper teeth are integrally formed with the upper cavity 200
  • a plurality of lower teeth are integrally formed with the lower cavity 300
  • the locking structure of the upper teeth and the lower teeth is simple, making the locking process simple.
  • the locking structure of the upper teeth and the lower teeth also has the advantage of making the overall weight of the upper cavity 200 and the lower cavity 300 lighter after tightening.
  • the lifting mechanism 500 includes a lifting platform 510, a driving device 520 and a transmission device.
  • the driving device 520 drives the lifting platform 510 to move up and down in the vertical direction through the transmission device.
  • the transmission device includes a screw rod 531, a synchronous pulley and a synchronous belt 532, and the driving device 520 can be a servo motor.
  • the output end of the servo motor is connected to a synchronous pulley, and is connected to the synchronous pulley at one end of the screw rod 531 through the synchronous belt 532, and the other end of the screw rod 531 is connected to the lifting platform 510.
  • the servo motor drives the screw rod 531 to move linearly through the synchronous pulley and the synchronous belt 532 to realize the lifting and lowering of the lifting platform 510.
  • the rotating mechanism 600 includes a first rotating mechanism 610 and a second rotating mechanism 620.
  • the first rotating mechanism 610 is arranged on the lifting mechanism 500, and the second rotating mechanism 620 is used to drive the first rotating mechanism 610 to drive the lower cavity 300 to rotate.
  • the first rotating mechanism 610 includes a guide rail 611, a slider 612 and a driven gear 613 (in conjunction with reference to FIG8).
  • the guide rail 611 is fixed to the lifting platform 510 of the lifting mechanism 500 and extends around the axial direction O of the lower cavity 300.
  • the slider 612 is slidably connected to the guide rail 611, and the slider 612 is also fixedly connected to the bottom of the lower cavity 300 (in conjunction with reference to FIG4).
  • the slider 612 can be fixed to the lower cavity 300 by a fixing member, such as a screw or a bolt.
  • the first rotating mechanism 610 includes two symmetrically arranged guide rails 611, each guide rail 611 is provided with two sliders 612, and each slider 612 is fixedly connected to the bottom of the lower cavity 300.
  • the guide rails 611 are arc-shaped, and limit blocks can be installed at both ends of each guide rail 611 to limit the slider 612 so that the rotation angle of the lower cavity 300 is limited to a predetermined rotation angle range.
  • the guide rails 611 can also be in a full circle, which can meet the rotation direction and rotation angle of the lower cavity 300.
  • the driven gear 613 is fixedly connected to the lower cavity 300.
  • the driven gear 613 is in the shape of an arc, and its circumference is sufficient to allow the lower cavity 300 to rotate by a predetermined rotation angle.
  • the second rotating mechanism 620 includes a rotating drive unit 621 and a driving gear 622.
  • the rotating drive unit 621 includes a servo motor 6211 and a reducer 6212.
  • the servo motor 6211 drives the driving gear 622 to rotate through the reducer 6212, and the driving gear 622 drives the driven gear 613 to rotate through meshing.
  • the driven gear 613 is fixedly connected to the lower cavity 300, and the lower cavity 300 is also fixedly connected to the slider 612, the driven gear 613 When rotating, the lower cavity 300 on the slider 612 is driven to rotate along the direction of the guide rail 611 , so that the lower cavity 300 and the upper cavity 200 are tightened to form a closed chamber.
  • the rotating mechanism 600 further includes a fixed frame 630, a mounting plate 640 and an adjusting assembly.
  • the rotating driving part 621 and the driving gear 622 of the second rotating mechanism 620 are fixed to the mounting plate 640, and the mounting plate 640 is movably mounted to the fixed frame 630 by a fastener 641, and the fixed frame 630 is fixedly connected to the lifting platform 510 of the lifting mechanism 500.
  • the mounting plate 640 and the driving gear 622 are located above the fixed frame 630, and the rotating driving part 621 is located below the fixed frame 630, and is connected to the driving gear 622 through the fixed frame 630 and the mounting plate 640.
  • the fixed frame 630 carries the rotating driving part 621 and the driving gear 622 and rises and falls simultaneously with the lifting platform 510, and during this lifting process, the rotating driving part 621 is in a suspended state.
  • the adjustment assembly and the mounting plate 640 are mounted on the same mounting surface of the fixing frame 630.
  • the adjustment assembly is used to adjust the displacement of the mounting plate 640 on the fixing frame 630 so that the center distance between the driving gear 622 and the driven gear 613 is reduced or increased.
  • the adjustment assembly includes an adjustment block 651 and a screw (not shown in the figure).
  • a threaded hole 652 is provided in the adjustment block 651, and the screw is threadedly connected with the threaded hole 652.
  • the fastener 641 is loosened to make the mounting plate 640 movable, and then the screw in the adjustment block 651 is rotated to increase the length of the screw extending out of the adjustment block 651, so that the screw pushes against the mounting plate 640, and then the mounting plate 640 carries the driving gear 622 and the rotation drive part 621 together to move toward the driven gear 613 fixed to the lower cavity 300, so as to reduce the center distance between the driving gear 622 and the driven gear 613, until the driving gear 622 is meshed with the driven gear 613.
  • the fastener 641 on the mounting plate 640 is loosened to make the mounting plate 640 movable, and then the screw in the adjustment block 651 is turned to return the screw to the predetermined position in the adjustment block 651, and then the mounting plate 640 is manually pulled back to make the mounting plate 640 move with the driving gear 622 and the rotation drive unit 621 away from the driven gear 613 to increase the center distance between the driving gear 622 and the driven gear 613.
  • the fixing frame 630 is provided with a guide groove for the mounting plate 640 to move with the rotation drive unit 621 and the driving gear 622.
  • the drying device further includes two sets of symmetrically arranged support members 700, which can be lifted and lowered and moved horizontally, and are used to lift the substrate and place it on the substrate tray 400, or to remove the substrate from the substrate tray 400.
  • the two sets of support members 700 are respectively provided with weighing sensors 710, which are used to weigh the substrate to determine whether the amount of IPA on the surface of the substrate needs to be supplemented. If supplementation is required, the IPA can be replenished by
  • the IPA replenishment device of the drying device is used to replenish IPA on the substrate surface.
  • the IPA replenishment device can be a replenishment IPA device in an existing drying device.
  • the drying device further includes a first fluid supply pipe 810, a second fluid supply pipe 820, a fluid discharge pipe 830, and a vacuum line 840.
  • the first fluid supply pipe 810 and the vacuum line 840 are arranged at intervals on the top wall of the upper cavity 200, and the second fluid supply pipe 820 and the fluid discharge pipe 830 are respectively arranged on two opposite side walls of the upper cavity 200.
  • the vacuum line 840 is used to perform vacuuming through the vacuum groove 240 of the upper cavity 200 (see FIG. 7 ).
  • Two circles of annular grooves 320 and 330 for placing sealing rings are sequentially arranged around the substrate tray 400 of the lower cavity 300 (see FIG. 8 ). When the upper cavity 200 and the lower cavity are tightened to form a closed chamber, the vacuum groove 240 is located between the two annular grooves 320 and 330.
  • the two sets of support members 700 are first raised from the initial position to a predetermined height, and then the two sets of support members 700 move toward the substrate tray 400 to the minimum stroke; then the robot transfers the substrate to between the upper cavity 200 and the lower cavity 300, and places the substrate on the support member 700 and withdraws.
  • the weighing sensor 710 on the support member 700 weighs the substrate to detect the amount of IPA on the surface of the substrate. After that, the two sets of support members 700 carry the substrate and descend to the initial position, place the substrate on the substrate tray 400, move backward to the maximum stroke, and withdraw from the lower cavity 300.
  • the lifting mechanism 500 lifts the lower cavity 300 and moves it upward in the vertical direction until the lower cavity 300 and the upper cavity 200 are closed, and the rotating mechanism 600 drives the lower cavity 300 to rotate a predetermined angle, so that the upper cavity 200 and the lower cavity 300 are locked by the upper teeth and the lower teeth to form a closed chamber 233.
  • the slider 612 and the lower cavity 300 are fixedly connected by a fixing member, after the upper cavity 200 and the lower cavity 300 are tightened to form the closed chamber 233, the lifting platform 510 of the lifting mechanism 500 can be kept in the lower cavity 300 during the operation of the drying device.
  • the vacuum groove 240 of the upper cavity 200 is evacuated through the vacuum line 840.
  • the pressure in the vacuum line 840 is detected to be within the target pressure range, it means that the sealing is completed and supercritical fluid can be supplied to the closed chamber 233.
  • the first fluid supply pipe 810 is closed to stop supplying the supercritical fluid from the top of the sealed chamber 233.
  • the supercritical fluid is supplied from one side of the sealed chamber 233 through the second fluid supply pipe 820, and the supercritical fluid dries the substrate inside the sealed chamber 233.
  • the fluid discharged from the fluid discharge pipe 830 is the supercritical fluid.
  • the second fluid supply pipe 820 is closed, and the fluid inside the closed chamber 233 is continuously discharged through the fluid discharge pipe 830, which reduces the internal pressure of the closed chamber 233, so that the supercritical fluid inside the closed chamber 233 becomes gas, and is discharged from the closed chamber 233 through the fluid discharge pipe 830, and the vacuum line 840 is closed, and the vacuum groove 240 of the upper cavity 200 is kept in a vacuum state.
  • the rotating mechanism 600 drives the lower cavity 300 to rotate in the opposite direction by a predetermined angle, and the upper teeth and the lower teeth unlock each other.
  • the lifting mechanism 500 drives the lower cavity 300 to move downward in the vertical direction, and the closed chamber 233 is opened.
  • the two groups of support members 700 move toward each other from the maximum stroke to the minimum stroke, and the substrate after the drying process is lifted from the substrate tray 400, and finally the drying device is taken out by the robot.
  • the supercritical fluid is supercritical carbon dioxide.
  • Embodiment 2 is a diagrammatic representation of Embodiment 1:
  • the driven gear 613A of the first rotating mechanism 610A in this embodiment is in the shape of a disc.
  • the driven gear 613A connects the slider 612A and the lower cavity 300A, the bottom of the driven gear 613A is fixedly connected to the slider 612A, and the top of the driven gear 613A is detachably connected to the lower cavity 300A.
  • the driven gear 613A includes a gear body 6101A, an upper support plate 6102A and a lower support plate 6103A.
  • the upper support plate 6102A is fixed to the upper side of the gear body 6101A.
  • the lower support plate 6103A is fixed to the lower side of the gear body 6101A and is fixedly connected to the slider 612A.
  • a plurality of fixing pins 6104A are provided on the top of the upper support plate 6102A, and the driven gear 613A lifts the lower cavity 300A through the fixing pins 6104A.
  • a fixing groove 340A (with reference to FIG. 12) is provided at the bottom of the lower cavity 300A, and the fixing groove 340A is adapted to the fixing pin 6104A.
  • the fixing pin 6104A is inserted into the fixing groove 340A at the bottom of the lower cavity 300A, so that the lower cavity 300A is installed on the upper support plate 6102A, so that the driven gear 613A drives the lower cavity 300 to rotate, and is screwed with the upper cavity 200 to form a closed chamber.
  • the driven gear 613A fixed on the slider 612A drives the lower cavity 300A to rotate together, so that the lower cavity 300A and the upper cavity 200A are screwed together to form a closed chamber (please refer to the closed chamber 233 in Figure 6 of Example 1).
  • the lifting platform 510A moves downward, the fixing pin 6104A is separated from the fixing groove 340A at the bottom of the lower cavity 300A, and the lifting platform 510A and the rotating mechanism 600A are evacuated from the lower cavity 300A.
  • the deformation force generated by the upper cavity 200A and the lower cavity 300A will not be applied to the rotating mechanism 600A and the lifting mechanism 500A.
  • the lifting platform 510A and the rotating mechanism 600A are evacuated from the lower cavity 300A, the upper cavity 200A is still fixed on the frame (please refer to the frame 100 in Example 1), and the lower cavity 300A is in a suspended state, suspended on the upper cavity 200A.
  • Embodiment 3 is a diagrammatic representation of Embodiment 3
  • FIG. 13 another drying device is provided in this embodiment 3.
  • the lifting mechanism includes a six-degree-of-freedom robot platform.
  • the six-degree-of-freedom robot platform includes an upper platform 510B, a lower platform 541B, a telescopic cylinder 542B and a Hooke's hinge 543B.
  • the second rotating mechanism 620B is fixed to the upper platform 510B through a fixed frame 630B, and rises and falls synchronously with the upper platform 510B.
  • the arrangement of the second rotating mechanism 620B on the fixed frame 630B is the same as the arrangement of the second rotating mechanism 620 on the fixed frame 630 in Example 1, which will not be repeated here.
  • the guide rail 611B of the first rotating mechanism 610B is fixed to the upper platform 510B.
  • the guide rail 611B can be fixed to the upper platform 510B through a base 670B.
  • the guide rail 611B can be directly fixed to the upper platform 510B.
  • the upper platform 510B and the lower platform 541B are connected by six telescopic cylinders 542B and a Hooke's hinge 543B.
  • the Hooke's hinge 543B is located at the connection between the telescopic cylinder 542B and the upper platform 510B and the lower platform 541B.
  • Embodiment 4 is a diagrammatic representation of Embodiment 4:
  • this embodiment 4 another drying device is provided in this embodiment 4.
  • the difference between this embodiment 4 and embodiment 2 is that the structures and arrangement modes of the first rotating mechanism and the lifting mechanism are different, and the fixing modes of the second rotating mechanism and the lifting mechanism are different.
  • the first rotating mechanism 610C of the rotating mechanism includes a driven gear 613C.
  • the wheel 613C is cylindrical.
  • the second rotating mechanism 620C of the rotating mechanism includes a rotating driving part 621C and a driving gear 622C.
  • the rotating driving part 621C includes a servo motor and a reducer. The servo motor drives the driving gear 622C to rotate through the reducer, and the driving gear 622C drives the driven gear 613C to rotate through meshing.
  • the lifting mechanism 500C is a gear screw transmission mechanism, which includes a lifting platform 510C, a driving device 520C, a lifting driving wheel 521C, a lifting driven wheel 522C, a screw 523C, a nut 524C and a base 525C.
  • the driving device 520C is connected to the lifting driving wheel 521C, the lifting driving wheel 521C is meshed with the lifting driven wheel 522C, the lifting driven wheel 522C is fixedly connected to the lead screw 523C, the lead screw 523C is threadedly connected to the nut 524C, the nut 524C is fixedly connected to the lower part of the driven gear 613C, the upper part of the driven gear 613C is fixed with the lifting platform 510C, the lifting platform 510C has a fixing pin 511C, the fixing pin 511C is inserted into the fixing groove at the bottom of the lower cavity 300C (please refer to the fixing groove 340A of Figure 12 in Example 2), so that the lower cavity 300C is fixed on the lifting platform 510C (combined with reference to Figure 16).
  • the second rotating mechanism 620C is installed on the fixing frame 630C, the fixing frame 630C is fixed to the base 525C, and the second rotating mechanism 620C does not rise and fall with the lifting platform 510C.
  • the driving device 520C of the gear-screw transmission mechanism drives the lifting active wheel 521C to rotate, and the lifting active wheel 521C drives the lifting driven wheel 522C to rotate through engagement, the screw 523C rotates with the lifting driven wheel 522C, and the driven gear 613C moves linearly upward on the screw 523C along with the nut 524C, and the lifting platform 510C rises with the driven gear 613C.
  • the rotating driving part 621C of the second rotating mechanism 620C drives the driving gear 622C to rotate, and the driving gear 622C drives the driven gear 613C to rotate through meshing, and the lifting platform 510C rotates with the driven gear 613C, and drives the lower cavity 300C to rotate, so that the first locking part 210C and the second locking part 310C are locked with each other, and the upper cavity 200C and the lower cavity 300C are locked to form a closed chamber.
  • the gear screw transmission mechanism drives the lifting mechanism 500C to descend and evacuate the lower cavity 300C.

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Abstract

本发明公开了一种干燥装置，包括上腔体、下腔体、基板托盘和旋转机构，上腔体具有第一锁紧部；下腔体设置于上腔体的下方，下腔体具有用于与第一锁紧部相适配的第二锁紧部；基板托盘设置于下腔体，用于承载基板；旋转机构用于带动上腔体和下腔体至少其中之一旋转，以使上腔体与下腔体通过第一锁紧部和第二锁紧部旋紧形成耐压的密闭腔室。本发明通过旋紧的方式将上腔体和下腔体旋紧形成密闭腔室，以在该密闭腔室内使用超临界流体对基板进行干燥处理。

Description

干燥装置 技术领域
本发明涉及半导体制造技术领域，尤其涉及一种干燥装置。
背景技术
在集成电路制造过程中，基板在进行湿法刻蚀或清洗工艺后需要进行干燥处理。已知可采用表面张力为零的超临界流体对基板进行干燥处理。例如，将覆盖有IPA(Isopropyl alcohol，异丙醇)的基板从清洗腔转运至干燥装置，使干燥装置的上腔体和下腔体闭合，以形成密闭腔室，然后向密闭腔室供应超临界流体，使基板表面上的IPA溶解到超临界流体，形成IPA和超临界流体的混合物。随着密闭腔室不断供应超临界流体，以及IPA和超临界流体的混合物不断排出，完成超临界流体与基板表面覆盖的IPA之间的置换，达到从基板上去除IPA的目的。接着气化并排出超临界流体，待密闭腔室内压力返回到大气压力后打开密闭腔室，最后将干燥处理后的基板取出。
鉴于上述说明，上腔体和下腔体锁紧形成的密闭腔室应可以保持基板干燥处理过程中所需的高压，以使超临界流体处于超临界状态。因此，如何将上腔体和下腔体锁紧以形成耐压的密闭腔室显得尤为重要。
发明内容
本发明的目的在于解决现有技术中如何将上腔体和下腔体锁紧形成密闭腔室的问题。
为解决上述问题，本发明的实施方式提出一种干燥装置，包括：
上腔体，具有第一锁紧部；
下腔体，设置于上腔体的下方，下腔体具有用于与所述第一锁紧部相适配的第二锁紧部；
基板托盘，设置于下腔体，用于承载基板；
旋转机构，用于带动上腔体和下腔体至少其中之一旋转，以使所述上腔体与所述下腔体通过第一锁紧部和第二锁紧部旋紧形成耐压的密闭腔室。
本发明提供的干燥装置，在上腔体具有第一锁紧部，在下腔体具有与第一锁紧部相适配的第二旋紧部，上腔体和下腔体相互靠近后，通过旋转机构带动上腔体和下腔体至少其中之一旋转，使得第一锁紧部与第二锁紧部相互锁紧，上腔体和下腔体形成耐压的密闭腔室，以满足基板干燥处理过程中所需的高压要求，使得超临界流体处于超临界状态，以对基板进行干燥处理。
本发明其他特征和相应的有益效果在说明书的后面部分进行阐述说明，且应当理解，至少部分有益效果从本发明说明书中的记载变的显而易见。
附图概述
本发明的特征、性能由以下的实施例及其附图进一步描述。
图1为本发明实施例1中提供的干燥装置的立体结构示意图；
图2为本发明实施例1中提供的干燥装置的密闭腔室打开时的立体结构示意图；
图3为本发明实施例1中提供的干燥装置的下腔体与上腔体闭合后未旋紧时的立体结构示意图；
图4为本发明实施例1中提供的干燥装置的下腔体与上腔体旋紧后的立体结构示意图；
图5为本发明实施例1中提供的干燥装置的局部示意图；
图6为本发明实施例1中提供的干燥装置的下腔体与上腔体旋紧后的剖面结构示意图；
图7为本发明实施例1中提供的上腔体的立体结构示意图；
图8为本发明实施例1中提供的下腔体的立体结构示意图；
图9为本发明实施例1中提供的举升机构、旋转机构和支撑件的立体结构示意图；
图10为本发明实施例2中提供的举升机构和旋转机构的结构示意图；
图11为本发明实施例2中提供的干燥装置的下腔体与上腔体旋紧后的立体结构示意图；
图12为本发明实施例2中提供的下腔体的仰视结构示意图；
图13为本发明实施例3中提供的干燥装置的下腔体与上腔体旋紧后的立体结构示意图；
图14为本发明实施例4中提供的举升机构和旋转机构的结构示意图；
图15为本发明实施例4中提供的举升机构和旋转机构的另一视角的结构示意图；以及
图16为本发明实施例4中提供的干燥装置的密闭腔室打开时的立体结构示意图。
本发明的较佳实施方式
以下由特定的具体实施例说明本发明的实施方式，本领域技术人员可由本说明书所揭示的内容轻易地了解本发明的其他优点及功效。虽然本发明的描述将结合较佳实施例一起介绍，但这并不代表此发明的特征仅限于该实施方式。恰恰相反，结合实施方式作发明介绍的目的是为了覆盖基于本发明的权利要求而有可能延伸出的其它选择或改造。为了提供对本发明的深度了解，以下描述中将包含许多具体的细节。本发明也可以不使用这些细节实施。此外，为了避免混乱或模糊本发明的重点，有些具体细节将在描述中被省略。需要说明的是，在不冲突的情况下，本发明中的实施例及实施例中的特征可以相互组合。
应注意的是，在本说明书中，相似的标号和字母在下面的附图中表示类似项，因此，一旦某一项在一个附图中被定义，则在随后的附图中不需要对其进行进一步定义和解释。
下面将结合附图对本发明的技术方案进行清楚、完整地描述，显然，所描述的实施例是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
在本发明的描述中，需要说明的是，术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作， 因此不能理解为对本发明的限制。此外，术语“第一”、“第二”、“第三”仅用于描述目的，而不能理解为指示或暗示相对重要性。
在本发明的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本发明中的具体含义。
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明的实施方式作进一步地详细描述。
实施例1：
结合图1至图5，本实施例1提出一种干燥装置，用于对清洗后的基板进行干燥处理。在本实施例1中，清洗后的基板表面覆盖有一层IPA(异丙醇)。
干燥装置包括框架100、上腔体200、下腔体300、基板托盘400、举升机构500和旋转机构600。上腔体200固定于框架100，并具有第一锁紧部210。下腔体300设置于上腔体200的下方，并具有用于与第一锁紧部210相适配的第二锁紧部310。基板托盘400设置于下腔体300，用于承载基板。下腔体300在举升机构500的带动下沿竖直方向与上腔体200相对运动，旋转机构600用于带动下腔体300绕下腔体300的轴线方向O旋转，例如沿顺时针方向R1旋转，使得第一锁紧部210与第二锁紧部310相互锁紧，上腔体200与下腔体300旋紧形成密闭腔室233(结合参考图6)，以对表面覆盖有IPA的基板进行干燥处理。旋转机构600带动下腔体300旋转的角度范围为10°至40°，较佳地，旋转机构600带动下腔体300旋转的角度范围为20°至30°。
当要打开密闭腔室233时，首先旋转机构600带动下腔体300绕下腔体300的轴线方向O回转，例如沿逆时针方向R2旋转，使得第一锁紧部210与第二锁紧部310相互解锁，即相互分离开。然后举升机构500带动下腔体300沿竖直方向向下运动，使得下腔体300与上腔体200相互远离，打开密闭腔室233。
在一些实施例中，可以是下腔体300固定于框架，举升机构带动上腔体200沿竖直方向运动，当上腔体200与下腔体300闭合时，旋转机构600带动上腔 体200绕上腔体200的轴线方向旋转。在一些实施例中，还可以设置两个举升机构和两个旋转机构，其中，一个举升机构带动上腔体200沿竖直方向运动，另一个举升机构带动下腔体300沿竖直方向运动，从而使得上腔体200与下腔体300沿竖直方向相对运动。一个旋转机构带动上腔体200沿第一方向旋转，另一个旋转机构带动下腔体300沿第二方向旋转，第一方向与第二方向相反，从而使得上腔体200与下腔体300同时旋转并旋紧形成密闭腔室。
结合图7和图8，本申请提供的干燥装置，其上腔体200和下腔体300的形状分别为圆形，密闭腔室233的中空部分为圆形，第一锁紧部210与上腔体200一体成型，第二锁紧部310与下腔体300一体成型。
具体地，如图7所示，上腔体200的第一锁紧部210包括多个上齿牙，多个上齿牙沿上腔体200的外周方向均匀间隔分布。如图8所示，第二锁紧部310包括多个下齿牙，多个下齿牙沿下腔体300的外周方向均匀间隔分布，多个上齿牙与多个下齿牙相适配，且一一对应。其中，多个下齿牙在下腔体300的侧壁上沿下腔体300的径向向外延伸，呈凸起状，下齿牙的上表面与下腔体300的上表面齐平，且低于基板托盘400的上表面。多个上齿牙沿上腔体200的侧壁向下延伸，并设置有用于与下齿牙相适配的凹槽211。上齿牙呈“L”形。上齿牙与下齿牙相互锁紧时(如图5所示)，上腔体200与下腔体300之间形成密闭腔室233(如图6所示)。当要打开密闭腔室233时，先旋转下腔体300，将下齿牙从上齿牙的凹槽211中旋出，即下齿牙与上齿牙相互解锁，然后再使下腔体300沿竖直方向向下运动，与上腔体200分离开，打开密闭腔室233。当密闭腔室233为打开状态时(如图2所示)，上腔体200与下腔体300之间的间距满足基板的取放要求即可。
在其它实施例中，上齿牙与下齿牙的形状可以互换，即上齿牙可以设置为沿上腔体200的径向向外延伸，呈凸起状，下齿牙设置用于与上齿牙相适配的凹槽，上腔体200和下腔体300通过该上齿牙和下齿牙旋紧形成密闭腔室。
本申请提供的干燥装置，由于上腔体200和下腔体300的外部形状分别优选为圆形，而且多个上齿牙和多个下齿牙分别沿上腔体200和下腔体300的周向均匀间隔分布。因此本申请中的上腔体200和下腔体300在高温高压的工况下受力更为均匀，作为频繁开启闭合的压力容器，具有较长的使用寿命，更符 合压力容器的设计标准。
另外，本申请中多个上齿牙与上腔体200一体成型，多个下齿牙与下腔体300一体成型，并且上齿牙和下齿牙这种锁紧结构简单，使得锁紧过程简便。对于相同体积的密闭腔室233，上齿牙和下齿牙这种锁紧结构还具有使得旋紧后的上腔体200和下腔体300的整体重量更轻便的优点。
参见图9，举升机构500包括举升平台510、驱动装置520和传动装置。驱动装置520通过传动装置驱动举升平台510沿竖直方向上下运动。传动装置包括丝杆531、同步带轮和同步带532，驱动装置520可以是伺服电机。具体地，伺服电机输出端连接一同步带轮，并通过同步带532与丝杆531一端的同步带轮相连，丝杆531的另一端与举升平台510连接，伺服电机通过同步带轮和同步带532驱动丝杆531进行直线运动，实现举升平台510的升降。
旋转机构600包括第一旋转机构610和第二旋转机构620，第一旋转机构610设置于举升机构500，第二旋转机构620用于驱动第一旋转机构610带动下腔体300旋转。具体地，第一旋转机构610包括导轨611、滑块612和从动齿轮613(结合参考图8)。导轨611固定于举升机构500的举升平台510，并围绕下腔体300的轴线方向O延伸。滑块612滑动连接于导轨611，滑块612还与下腔体300的底部固定连接(结合参考图4)。滑块612可以通过固定件，例如螺钉或螺栓与下腔体300固定。本实施例中，如图9所示，第一旋转机构610包括两个对称设置的导轨611，每个导轨611上设有两个滑块612，每个滑块612与下腔体300的底部固定连接。导轨611呈弧形，每个导轨611的两端可以安装限位块，以对滑块612进行限位，使得下腔体300的旋转角度限制在预定的旋转角度范围内。在其它实施例中，导轨611也可以呈整圆形，能够满足下腔体300的旋转方向和旋转角度即可。
结合图8和图9，从动齿轮613与下腔体300固定连接。从动齿轮613呈一段弧形状，其周长满足下腔体300能够旋转预定的旋转角度即可。如图9所示，第二旋转机构620包括旋转驱动部621和主动齿轮622，旋转驱动部621包括伺服电机6211和减速机6212，伺服电机6211通过减速机6212驱动主动齿轮622旋转，主动齿轮622通过啮合带动从动齿轮613旋转。因从动齿轮613与下腔体300固定连接，而下腔体300还与滑块612固定连接，故从动齿轮613 旋转时带动滑块612上的下腔体300沿导轨611的方向旋转，使得下腔体300与上腔体200旋紧形成密闭腔室。
如图9所示，旋转机构600还包括固定架630、安装板640和调节组件。第二旋转机构620的旋转驱动部621和主动齿轮622共同固定于安装板640，安装板640通过紧固件641可移动地安装于固定架630，固定架630与举升机构500的举升平台510固定连接。安装板640和主动齿轮622位于固定架630的上方，旋转驱动部621位于固定架630的下方，且通过固定架630和安装板640与主动齿轮622连接。当举升平台510沿竖直方向上下运动时，固定架630携带旋转驱动部621和主动齿轮622随举升平台510同时升降，在此升降过程中，旋转驱动部621处于悬挂状态。调节组件和安装板640安装于固定架630的同一安装面，调节组件用于调节安装板640在固定架630上的位移，使得主动齿轮622和从动齿轮613的中心距减小或增大。调节组件包括调节块651和螺钉(图未示出)，调节块651内设置有螺纹孔652，螺钉与螺纹孔652螺纹连接。当需要减小主动齿轮622和从动齿轮613的中心距时，松开紧固件641，使得安装板640处于可移动状态，然后转动调节块651中的螺钉，以增加螺钉伸出调节块651的长度，使得螺钉顶向安装板640，进而安装板640携带主动齿轮622和旋转驱动部621一起朝向固定在下腔体300的从动齿轮613移动，以减小主动齿轮622和从动齿轮613的中心距，直至主动齿轮622与从动齿轮613啮合。当需要增大主动齿轮622和从动齿轮613的中心距时，松开安装板640上的紧固件641，使得安装板640处于可移动状态，然后转动调节块651中的螺钉，使得螺钉返回调节块651内至预定位置，接着手动拨回安装板640，使得安装板640携带主动齿轮622和旋转驱动部621一起背向从动齿轮613移动，以增大主动齿轮622和从动齿轮613的中心距。需要说明的是，安装板640在固定架630上移动时，固定架630开设有用于安装板640携带旋转驱动部621和主动齿轮622移动的导向槽。
另外，如图2所示，干燥装置还包括两组对称设置的支撑件700，两组支撑件700可以升降和水平运动，用于将基板托起放置于基板托盘400上，或从基板托盘400上取走基板。两组支撑件700上分别设置有称重传感器710，用于对基板进行称重，以确定是否需要补充基板表面的IPA量。若需补充，可使 用干燥装置的补充IPA装置对基板表面补充IPA。补充IPA装置可采用现有干燥装置中的补充IPA装置。
干燥装置还包括第一流体供应管810、第二流体供应管820和流体排出管830以及抽真空管路840。第一流体供应管810和抽真空管路840间隔设置于上腔体200的顶壁，第二流体供应管820和流体排出管830分别设置于上腔体200的相对两个侧壁。抽真空管路840用于通过上腔体200的真空槽240(结合参考图7)进行抽真空。下腔体300的基板托盘400的周围依次环绕设置有两圈用于放置密封圈的环形凹槽320、330(结合参考图8)。当上腔体200与下腔体旋紧形成密闭腔室时，真空槽240位于两个环形凹槽320、330之间。
本实施例提供的干燥装置对基板进行干燥处理的工作流程如下：
干燥装置开始工作时，首先将两组支撑件700从初始位置上升到预定高度，随后两组支撑件700朝向基板托盘400相向移动至最小行程；接着机械手将基板转运至上腔体200和下腔体300之间，并将基板放在支撑件700上后撤出。支撑件700上的称重传感器710对基板进行称重，以检测基板表面的IPA量。之后，两组支撑件700携带基板下降至初始位置，将基板放置于基板托盘400上后背向移动至最大行程，退出下腔体300。
然后举升机构500托举下腔体300沿竖直方向向上运动，直至下腔体300与上腔体200闭合，旋转机构600带动下腔体300旋转预定角度，使得上腔体200与下腔体300之间通过上齿牙和下齿牙锁紧，形成密闭腔室233。本实施例中，因为滑块612与下腔体300是通过固定件固定连接的，所以待上腔体200与下腔体300旋紧形成密闭腔室233后，举升机构500的举升平台510在干燥装置工作的过程中可以不撤离于下腔体300。
形成密闭腔室233后，通过抽真空管路840对上腔体200的真空槽240抽真空，当检测到抽真空管路840内的压力在目标压力范围内时代表密封完成，可向密闭腔室233内供应超临界流体。
打开第一流体供应管810从密闭腔室233的上方供应超临界流体，随着超临界流体的供应，密闭腔室233内部的空气和流体通过流体排出管830排出密闭腔室233，使得密闭腔室233内部的空气全部被置换为流体，并不断增加超临界流体的供应量，使得密闭腔室233内部的压力升高至临界压力以上。
密闭腔室233内部达到超临界状态后，关闭第一流体供应管810，停止从密闭腔室233上方供应超临界流体。通过第二流体供应管820从密闭腔室233的一侧供应超临界流体，超临界流体对密闭腔室233内部的基板进行干燥处理，此时，流体排出管830排出的流体为超临界流体。
干燥处理结束后，关闭第二流体供应管820，密闭腔室233内部的流体通过流体排出管830不断排出，降低了密闭腔室233的内部压力，使得密闭腔室233内部的超临界流体变为气体，通过流体排出管830排出密闭腔室233，关闭抽真空管路840，上腔体200的真空槽240内保持真空状态。待密闭腔室233内压力达到大气压时，旋转机构600带动下腔体300反向回转预定角度，上齿牙和下齿牙相互解锁。举升机构500带动下腔体300沿竖直方向向下运动，密闭腔室233打开。
最后，两组支撑件700从最大行程相向移动至最小行程，将干燥处理后的基板从基板托盘400上托起，最后由机械手取出干燥装置。
在本实施例中，超临界流体为超临界二氧化碳。
实施例2：
结合图10至图12，本实施例2提供了另一种干燥装置。本实施例2与实施例1之间的区别在于：从动齿轮的结构不同，以及从动齿轮、下腔体和滑块之间的连接关系不同。
结合图10和图11，本实施例中第一旋转机构610A的从动齿轮613A的形状呈圆盘状。从动齿轮613A连接滑块612A和下腔体300A，从动齿轮613A的底部与滑块612A固定连接，从动齿轮613A的顶部与下腔体300A可分离式连接。具体地，如图10所示，从动齿轮613A包括齿轮本体6101A、上托板6102A和下托板6103A。上托板6102A固定在齿轮本体6101A的上侧。下托板6103A固定在齿轮本体6101A的下侧，并与滑块612A固定连接。上托板6102A的顶部设置有多个固定销6104A，从动齿轮613A通过固定销6104A托举下腔体300A，下腔体300A的底部设置有固定槽340A(结合参考图12)，固定槽340A与固定销6104A相适配。通过固定销6104A插入下腔体300A底部的固定槽340A中，使得下腔体300A安装在上托板6102A上，以便从动齿轮613A带动下腔体300旋转，并与上腔体200旋紧形成密闭腔室。
第二旋转机构620A驱动从动齿轮613A旋转时，固定在滑块612A上的从动齿轮613A带动下腔体300A一起旋转，使得下腔体300A与上腔体200A旋紧形成密闭腔室(请参考实施例1中图6的密闭腔室233)。形成密闭腔室后，举升平台510A向下运动，固定销6104A脱离出下腔体300A底部的固定槽340A，举升平台510A和旋转机构600A撤离下腔体300A，这样在密闭腔室内对基板进行干燥处理时，上腔体200A和下腔体300A产生的变形力不会施加到旋转机构600A和举升机构500A。当举升平台510A和旋转机构600A撤离下腔体300A后，上腔体200A依然固定在框架(请参考实施例1中的框架100)上，下腔体300A呈悬挂状态，悬挂在上腔体200A上。
实施例3：
参见图13，本实施例3提供了另一种干燥装置。本实施例3与实施例2之间的区别在于：举升机构包括六自由度机器人平台。
本实施例中，六自由度机器人平台包括上平台510B、下平台541B、伸缩缸542B和虎克铰543B。第二旋转机构620B通过固定架630B固定于上平台510B，与上平台510B同步升降。第二旋转机构620B安装在固定架630B上的设置方式与实施例1中第二旋转机构620安装在固定架630上的设置方式相同，在此不再赘述。
第一旋转机构610B的导轨611B固定于上平台510B。在一些实施例中，导轨611B可以通过一底座670B固定于上平台510B。在一些实施例中，导轨611B可以直接固定于上平台510B。上平台510B和下平台541B通过六个伸缩缸542B及虎克铰543B连接，虎克铰543B位于伸缩缸542B连接上平台510B和下平台541B的连接处，通过六个伸缩缸542B的协同动作，实现下腔体300B沿竖直方向的升降，当下腔体300B与上腔体200B旋紧形成密闭腔室后，六自由度机器人和旋转机构600B撤离下腔体300B。
实施例4：
结合图14至图16，本实施例4提供了另一种干燥装置。本实施例4与实施例2之间的区别在于：第一旋转机构和举升机构的结构和设置方式不相同，以及第二旋转机构与举升机构之间的固定方式不同。
本实施例中，旋转机构的第一旋转机构610C包括从动齿轮613C，从动齿 轮613C呈圆筒状。旋转机构的第二旋转机构620C包括旋转驱动部621C和主动齿轮622C。旋转驱动部621C包括伺服电机和减速机，伺服电机通过减速机驱动主动齿轮622C旋转，主动齿轮622C通过啮合带动从动齿轮613C旋转。
下面结合举升机构500C的结构和设置方式说明从动齿轮613C的结构和设置方式。
结合图14和图15，举升机构500C为齿轮丝杠传动机构，齿轮丝杠传动机构包括举升平台510C、驱动装置520C、升降主动轮521C、升降从动轮522C、丝杠523C、丝母524C和底座525C。驱动装置520C与升降主动轮521C连接，升降主动轮521C与升降从动轮522C相互啮合，升降从动轮522C与丝杠523C固定连接，丝杠523C与丝母524C螺纹连接，丝母524C与从动齿轮613C的下部固定连接，从动齿轮613C的上部固定有举升平台510C，举升平台510C具有固定销511C，固定销511C插入下腔体300C底部的固定槽(请参考实施例2中图12的固定槽340A)，从而使下腔体300C固定在举升平台510C上(结合参考图16)。另外，第二旋转机构620C安装于固定架630C，固定架630C固定于底座525C，第二旋转机构620C不随举升平台510C升降。
下面说明齿轮丝杠传动机构和第二旋转机构620C带动下腔体300C上升和旋转的工作原理：
当齿轮丝杠传动机构驱动下腔体300上升时，齿轮丝杠传动机构的驱动装置520C驱动升降主动轮521C旋转，升降主动轮521C通过啮合带动升降从动轮522C旋转，丝杠523C随升降从动轮522C旋转，从动齿轮613C随丝母524C在丝杠523C上作直线上升运动，举升平台510C随从动齿轮613C上升。
待举升平台510C上的下腔体300C与上腔体200C接触时，第二旋转机构620C的旋转驱动部621C驱动主动齿轮622C旋转，主动齿轮622C通过啮合带动从动齿轮613C旋转，举升平台510C随从动齿轮613C旋转，并带动下腔体300C旋转，使得第一锁紧部210C与第二锁紧部310C相互锁紧，上腔体200C与下腔体300C锁紧形成密闭腔室。之后，齿轮丝杠传动机构驱动举升机构500C下降，撤离下腔体300C。
最后应说明的是：以上各实施例仅用以说明本发明的技术方案，而非对其限制；尽管参照前述各实施例对本发明进行了详细的说明，本领域的普通技术 人员应当理解：其依然可以对前述各实施例所记载的技术方案进行修改，或者对其中部分或者全部技术特征进行等同替换；而这些修改或者替换，并不使相应技术方案的本质脱离本发明各实施例技术方案的范围。

Claims (18)

  1. 一种干燥装置，其特征在于，包括：
    上腔体，具有第一锁紧部；
    下腔体，设置于所述上腔体的下方，所述下腔体具有用于与所述第一锁紧部相适配的第二锁紧部；
    基板托盘，设置于所述下腔体，用于承载基板；
    旋转机构，用于带动所述上腔体和所述下腔体至少其中之一旋转，以使所述上腔体与所述下腔体通过所述第一锁紧部和所述第二锁紧部旋紧形成耐压的密闭腔室。
  2. 根据权利要求1所述的干燥装置，其特征在于，所述第一锁紧部包括多个上齿牙，所述多个上齿牙沿所述上腔体的外周方向间隔分布，所述第二锁紧部包括多个下齿牙，所述多个下齿牙沿所述下腔体的外周方向间隔分布，所述多个上齿牙分别与所述多个下齿牙对应且适配。
  3. 根据权利要求2所述的干燥装置，其特征在于，所述多个下齿牙沿所述下腔体的径向向外延伸，呈凸起状，所述多个上齿牙设置有用于与所述多个下齿牙相匹配的凹槽。
  4. 根据权利要求1所述的干燥装置，其特征在于，所述旋转机构带动所述上腔体和所述下腔体至少其中之一旋转的角度范围为10°至40°。
  5. 根据权利要求1所述的干燥装置，其特征在于，所述上腔体和所述下腔体的形状分别为圆形，所述密闭腔室的中空部分为圆形。
  6. 根据权利要求1所述的干燥装置，其特征在于，所述第一锁紧部与所述上腔体一体成型，所述第二锁紧部与所述下腔体一体成型。
  7. 根据权利要求1所述的干燥装置，其特征在于，还包括：
    举升机构，用于带动所述上腔体和所述下腔体至少其中之一沿竖直方向运动，以使所述上腔体与所述下腔体相对运动；
    当所述上腔体与所述下腔体相互靠近时，所述旋转机构带动所述上腔体和所述下腔体至少其中之一旋转，使得所述上腔体与所述下腔体通过所述第一锁紧部和所述第二锁紧部旋紧形成所述密闭腔室。
  8. 根据权利要求7所述的干燥装置，其特征在于，所述举升机构用于带动所 述下腔体沿竖直方向运动，所述旋转机构用于带动所述下腔体旋转。
  9. 根据权利要求8所述的干燥装置，其特征在于，所述举升机构包括举升平台、驱动装置和传动装置，所述举升平台用于托举所述下腔体，所述驱动装置通过所述传动装置驱动所述举升平台沿竖直方向运动。
  10. 根据权利要求8所述的干燥装置，其特征在于，所述举升机构包括六自由度机器人平台或者齿轮丝杠传动机构。
  11. 根据权利要求8所述的干燥装置，其特征在于，所述旋转机构包括：
    第一旋转机构，设置于所述举升机构；
    第二旋转机构，用于驱动所述第一旋转机构带动所述下腔体旋转。
  12. 根据权利要求11所述的干燥装置，其特征在于，所述第一旋转机构包括：
    导轨，固定于所述举升机构；
    滑块，滑动连接于所述导轨，且与所述下腔体固定连接；
    从动齿轮，与所述下腔体固定连接；
    当所述第二旋转机构驱动所述第一旋转机构带动所述下腔体旋转时，所述第二旋转机构驱动所述从动齿轮旋转，所述从动齿轮带动所述滑块上的所述下腔体沿所述导轨的方向旋转。
  13. 根据权利要求11所述的干燥装置，其特征在于，所述第一旋转机构包括：
    导轨，固定于所述举升机构；
    滑块，滑动连接于所述导轨；
    从动齿轮，连接在所述滑块和所述下腔体之间；
    当所述第二旋转机构驱动所述第一旋转机构带动所述下腔体旋转时，所述第二旋转机构驱动所述从动齿轮旋转，所述从动齿轮在所述滑块上带动所述下腔体沿所述导轨的方向旋转。
  14. 根据权利要求13所述的干燥装置，其特征在于，所述从动齿轮的底部与所述滑块固定连接，所述从动齿轮的顶部设置有固定销；
    所述下腔体的底部设置有固定槽；其中，
    所述固定销用于插入所述固定槽中，以使所述下腔体安装在所述从动齿轮上。
  15. 根据权利要求11所述的干燥装置，其特征在于，所述第一旋转机构包括：
    从动齿轮，可旋转地设置于所述举升机构，所述第二旋转机构通过驱动所述从 动齿轮带动所述下腔体旋转。
  16. 根据权利要求12～15任一项所述的干燥装置，其特征在于，所述第二旋转机构包括旋转驱动部和主动齿轮，所述旋转驱动部通过驱动所述主动齿轮旋转，使得所述主动齿轮带动所述从动齿轮旋转。
  17. 根据权利要求16所述的干燥装置，其特征在于，所述旋转机构还包括固定架，所述固定架与所述举升机构固定连接，所述旋转驱动部和所述主动齿轮共同安装于所述固定架。
  18. 根据权利要求17所述干燥装置，其特征在于，所述旋转机构还包括：
    安装板，可移动地安装于所述固定架，所述旋转驱动部和所述主动齿轮通过所述安装板共同安装于所述固定架；
    调节组件，通过调节所述安装板在所述固定架上的位移，使得所述主动齿轮和所述从动齿轮的中心距减小或增大。
PCT/CN2024/091337 2023-07-05 2024-05-07 干燥装置 Ceased WO2025007634A1 (zh)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110080950A (ko) * 2010-01-07 2011-07-13 세메스 주식회사 초임계 유체를 이용한 기판 처리 장치
US20110214694A1 (en) * 2010-03-05 2011-09-08 Tokyo Electron Limited Supercritical processing apparatus and supercritical processing method
KR20210004382A (ko) * 2019-07-04 2021-01-13 세메스 주식회사 기판 건조 장치
CN114068364A (zh) * 2021-11-04 2022-02-18 上海至临半导体技术有限公司 一种搭配超临界流体干燥的湿法设备
CN115704648A (zh) * 2021-08-09 2023-02-17 盛美半导体设备(上海)股份有限公司 基于超临界流体的干燥装置及方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110080950A (ko) * 2010-01-07 2011-07-13 세메스 주식회사 초임계 유체를 이용한 기판 처리 장치
US20110214694A1 (en) * 2010-03-05 2011-09-08 Tokyo Electron Limited Supercritical processing apparatus and supercritical processing method
KR20210004382A (ko) * 2019-07-04 2021-01-13 세메스 주식회사 기판 건조 장치
CN115704648A (zh) * 2021-08-09 2023-02-17 盛美半导体设备(上海)股份有限公司 基于超临界流体的干燥装置及方法
CN114068364A (zh) * 2021-11-04 2022-02-18 上海至临半导体技术有限公司 一种搭配超临界流体干燥的湿法设备

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