WO2024114438A1 - Cell electrofusion chip device based on bilateral flow field pairing structure array and preparation method therefor - Google Patents

Cell electrofusion chip device based on bilateral flow field pairing structure array and preparation method therefor Download PDF

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WO2024114438A1
WO2024114438A1 PCT/CN2023/132862 CN2023132862W WO2024114438A1 WO 2024114438 A1 WO2024114438 A1 WO 2024114438A1 CN 2023132862 W CN2023132862 W CN 2023132862W WO 2024114438 A1 WO2024114438 A1 WO 2024114438A1
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flow field
double
pdms
device based
field pairing
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王雪峰
柏亚七
胡宁
杨军
张小玲
郑小林
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重庆大学
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Abstract

The present invention relates to the field of cell electrofusion chips. Disclosed are a cell electrofusion chip device based on a bilateral flow field pairing structure array and a preparation method therefor. The cell electrofusion chip device comprises a patterned ITO interdigital electrode layer and a flow path control module. The patterned ITO interdigital electrode layer is connected to an external cell electrofusion instrument. The patterned ITO interdigital electrode layer comprises a substrate layer, an ITO electrode layer, and a PDMS bilateral flow field pairing structure layer which are sequentially arranged. The PDMS bilateral flow field pairing structure layer comprises a bilateral flow field pairing structure and a channel, and the bilateral flow field pairing structure and the channel are symmetrically arranged. According to the present invention, efficient electrofusion of cells can be realized.

Description

一种基于双侧流场配对结构阵列的细胞电融合芯片装置及制备方法A cell electrofusion chip device based on a double-sided flow field pairing structure array and a preparation method thereof 技术领域Technical Field
本发明涉及细胞电融合芯片领域,具体涉及一种基于双侧流场配对结构阵列的细胞电融合芯片装置及制备方法。The present invention relates to the field of cell electrofusion chips, and in particular to a cell electrofusion chip device based on a double-sided flow field pairing structure array and a preparation method thereof.
背景技术Background technique
电融合技术是上世纪80年代建立起来的一种新型促融合技术。当细胞置于非常高的电场中,细胞膜就变得具有通透性,能让外界的分子扩散进细胞内,这一现象称为电融合,又叫电穿孔。运用这一技术,许多物质,包括DNA、RNA、蛋白质、药物、抗体和荧光探针都能载入细胞。与其他常用的导入外源物质的方法相比,电融合具有很多有点:一、电融合不必象显微注射那样使用玻璃针,不需要技术培训和昂贵的设备,可以一次对成百万的细胞进行注射;二、与用化学物质相比,电融合几乎没有生物或化学副作用;三、因为电融合是一种物理方法,较少依赖细胞类型,因而应用广泛。Electrofusion technology is a new type of fusion-promoting technology established in the 1980s. When cells are placed in a very high electric field, the cell membrane becomes permeable, allowing external molecules to diffuse into the cell. This phenomenon is called electrofusion, also known as electroporation. Using this technology, many substances, including DNA, RNA, proteins, drugs, antibodies and fluorescent probes, can be loaded into cells. Compared with other commonly used methods of introducing exogenous substances, electrofusion has many advantages: First, electrofusion does not require the use of glass needles like microinjection, does not require technical training and expensive equipment, and can be injected into millions of cells at a time; second, compared with the use of chemical substances, electrofusion has almost no biological or chemical side effects; third, because electrofusion is a physical method, it is less dependent on cell types and is therefore widely used.
尽管细胞电融合技术在育种、杂交研究和细胞克隆方面得到了成功应用,但是还存在一些问题。传统细胞合技术由于依赖于待融合细胞的随机接触,这就造成了同种细胞自融合现象,大大降低了融合的效率,造成了珍贵细胞资源的浪费;而且待融合细胞如果尺度差异较大,那么由于跨膜电位的巨大差异最终也会使得融合效率极低。本技术方案主要聚焦于提高细胞电融合中异源细胞的配对效率问题。Although cell electrofusion technology has been successfully applied in breeding, hybridization research and cell cloning, there are still some problems. Traditional cell fusion technology relies on random contact of cells to be fused, which causes the self-fusion of cells of the same species, greatly reducing the efficiency of fusion and causing a waste of precious cell resources; and if the cells to be fused have large differences in scale, the huge difference in transmembrane potential will eventually make the fusion efficiency extremely low. This technical solution mainly focuses on improving the pairing efficiency of heterologous cells in cell electrofusion.
发明内容Summary of the invention
本发明意在提供一种基于双侧流场配对结构阵列的细胞电融合芯片装置及制备方法,以解决现有技术中细胞融合时因随机接触导致的配对效率低的问题。The present invention aims to provide a cell electrofusion chip device based on a double-sided flow field pairing structure array and a preparation method thereof, so as to solve the problem of low pairing efficiency caused by random contact during cell fusion in the prior art.
为达到上述目的,本发明采用如下技术方案:一种基于双侧流场配对结构阵列的细胞电融合芯片装置,包括图案化ITO叉指电极层和流路控制模块,图案化ITO叉指电极层连接有外细胞电融合仪,图案化ITO叉指电极层包括依次设置的基底层、ITO电极层和PDMS双侧流场配对结构层,PDMS双侧流场配对结构层包括双侧流场配对结构和通道,且双侧流场配对结构和通道均设置有多个并呈双侧对称设置。 To achieve the above-mentioned purpose, the present invention adopts the following technical scheme: a cell electrofusion chip device based on a double-sided flow field pairing structure array, comprising a patterned ITO interdigitated electrode layer and a flow path control module, the patterned ITO interdigitated electrode layer is connected to an external cell electrofusion instrument, the patterned ITO interdigitated electrode layer comprises a base layer, an ITO electrode layer and a PDMS double-sided flow field pairing structure layer arranged in sequence, the PDMS double-sided flow field pairing structure layer comprises a double-sided flow field pairing structure and a channel, and both the double-sided flow field pairing structure and the channel are provided in plurality and are bilaterally symmetrically arranged.
另一方面,本技术方案还已提供一种基于双侧流场配对结构阵列的细胞电融合芯片装置的制备方法,包括如下步骤:On the other hand, the present technical solution also provides a method for preparing a cell electrofusion chip device based on a double-sided flow field pairing structure array, comprising the following steps:
步骤一、采用湿法刻蚀法加工图案化ITO叉指电极层;Step 1: Processing a patterned ITO interdigital electrode layer using a wet etching method;
步骤二、构建PDMS双侧流场配对结构,利用PDMS多聚物通过软光刻工艺和倒模构建;Step 2: construct a PDMS double-sided flow field pairing structure using PDMS polymer through soft lithography and reverse molding;
步骤三、制备PDMS融合结构芯片,通过软光刻工艺和倒模构建;Step 3: Prepare a PDMS fusion structure chip by soft lithography and reverse molding;
步骤四、等离子清洗;Step 4: plasma cleaning;
步骤五、键合。Step 5: Bonding.
本方案的原理及优点是:实际应用时,针对现有技术中细胞融合(尤其是异源细胞融合)由于随机接触与膜电位差异导致的融合效率低的问题,发明人聚焦于提高细胞电融合中异源细胞的配对效率,并针对融合芯片的结构(尤其是配对结构)进行了设计。采用微流控芯片技术,通过对微尺度流动腔道以及流动控制、电场控制,达到精确控制细胞运动的目的;同时结合微流体控制、介电电泳等手段,在微结构、微电极等辅助下,有效控制同源或异源细胞精确配对。本方案的芯片结构,待融合的细胞沿两侧通道分别进入捕获结构内后,图案化ITO叉指电极层通过与外细胞电融合仪形成连接,外界电信号将引入到ITO叉指电极上,相邻的微电极间将形成足够强度的电场,实现芯片内部的细胞的高效电融合。通过流路控制模块可实现细胞的进样、捕获配对和出样。The principle and advantages of this scheme are: in practical application, in view of the problem of low fusion efficiency caused by random contact and membrane potential difference in cell fusion (especially heterologous cell fusion) in the prior art, the inventor focuses on improving the pairing efficiency of heterologous cells in cell electrofusion, and designs the structure of the fusion chip (especially the pairing structure). Microfluidic chip technology is adopted to achieve the purpose of accurately controlling cell movement through microscale flow channels, flow control, and electric field control; at the same time, combined with microfluidic control, dielectrophoresis and other means, with the assistance of microstructures, microelectrodes, etc., the precise pairing of homologous or heterologous cells is effectively controlled. In the chip structure of this scheme, after the cells to be fused enter the capture structure along the channels on both sides, the patterned ITO interdigital electrode layer is connected to the external cell electrofusion instrument, and the external electrical signal will be introduced into the ITO interdigital electrode, and an electric field of sufficient strength will be formed between adjacent microelectrodes to achieve efficient electrofusion of cells inside the chip. The flow control module can realize the sampling, capture pairing and sampling of cells.
优选的,作为一种改进,ITO电极层上设置有叉指电极阵列,叉指电极阵列整体呈梳齿结构,且叉指电极阵列包括若干叉指电极。Preferably, as an improvement, an interdigital electrode array is provided on the ITO electrode layer, the interdigital electrode array is in a comb-teeth structure as a whole, and the interdigital electrode array includes a plurality of interdigital electrodes.
本技术方案中,通过将叉指电极设置为阵列的梳齿状结构,在将外界电信号将引入到ITO叉指电极上后,相邻的微电极间将形成足够强度的电场,实现芯片内部的细胞的高效电融合。In this technical solution, by setting the interdigitated electrodes into a comb-tooth structure of an array, after the external electrical signal is introduced into the ITO interdigitated electrodes, an electric field of sufficient strength will be formed between adjacent microelectrodes to achieve efficient electrical fusion of cells inside the chip.
优选的,作为一种改进,叉指电极的宽度均为150~200μm,相邻两个叉指电极的距离为60~80μm。Preferably, as an improvement, the width of the interdigital electrodes is 150-200 μm, and the distance between two adjacent interdigital electrodes is 60-80 μm.
本技术方案中,叉指电极的宽度的优化既要能使得其在实验所给定的低电压条件下满足细胞穿孔所需的电场强度,又要在实验室能够达到的制作工艺条件;上述的宽度范围为经过试验验证的较优范围,相邻两个叉指电极之间的距离太大,则要达到细胞穿孔所需要施加的 电压就越大,对于外界电气的要求变高;而太窄则可能在现有的工艺条件下无法将电极刻蚀出来,且施加很小的电压便有可能将细胞击穿电死,难以探究合适的实验参数。In this technical solution, the optimization of the width of the interdigital electrodes must be able to meet the electric field strength required for cell perforation under the low voltage conditions given in the experiment, and also meet the manufacturing process conditions that can be achieved in the laboratory; the above width range is the preferred range verified by the experiment. If the distance between two adjacent interdigital electrodes is too large, the electric field strength required for cell perforation will be too large. The greater the voltage, the higher the requirements for external electrical equipment; if it is too narrow, the electrode may not be etched out under the existing process conditions, and applying a very small voltage may cause the cells to be electrocuted and killed, making it difficult to explore suitable experimental parameters.
优选的,作为一种改进,通道呈蛇形结构,蛇形通道的长度为300~400μm,宽度为40~50μm,高度为20~30μm。Preferably, as an improvement, the channel has a serpentine structure, and the length of the serpentine channel is 300-400 μm, the width is 40-50 μm, and the height is 20-30 μm.
本技术方案中,通过将通道设置为蛇形结构,能够提高空间利用率,在有限的空间下能够延伸更长的长度;蛇形通道方便多个捕获单元的集成,提高通量;蛇行通道的长度及宽度、高度等是基于实验选用细胞进行的针对性设计,能够满足高效配对的需求。In the present technical solution, by setting the channel into a serpentine structure, the space utilization rate can be improved, and a longer length can be extended in a limited space; the serpentine channel facilitates the integration of multiple capture units and improves the flux; the length, width, height, etc. of the serpentine channel are targeted designs based on the cells selected for the experiment, which can meet the needs of efficient pairing.
优选的,作为一种改进,通道内设置有若干重复捕获单元,重复捕获单元均包括蛇行通道段、捕获位点结构和流阻调节微通道,捕获位点结构为直径9~11μm的圆形结构,相邻两个捕获位点的距离为75~150μm;流阻调节微通道长度为4~6μm,宽度为4~6μm,高度为20~30μm;所述捕获位点结构均设置有7μm开口,用于实现双侧通道的连通,构成一对配对结构。Preferably, as an improvement, a number of repeated capture units are arranged in the channel, and the repeated capture units all include a serpentine channel segment, a capture site structure and a flow resistance regulating microchannel, the capture site structure is a circular structure with a diameter of 9 to 11 μm, and the distance between two adjacent capture sites is 75 to 150 μm; the flow resistance regulating microchannel has a length of 4 to 6 μm, a width of 4 to 6 μm, and a height of 20 to 30 μm; the capture site structures are all provided with 7 μm openings for realizing the connectivity of the channels on both sides, forming a pair of matching structures.
本技术方案中,通道整体呈蛇形结构,在蛇形结构的每一重复回转结构单元即为蛇行通道段,本方案在每个蛇行通道段上均设置捕获位点和流阻调节通道,能够实现芯片的高通量,而且通过在捕获位点处设置开孔,能够实现两侧通道的连通,进而实现异源细胞的配对和融合。In the present technical solution, the channel as a whole has a serpentine structure, and each repeated rotation structural unit in the serpentine structure is a serpentine channel segment. In the present solution, capture sites and flow resistance adjustment channels are arranged on each serpentine channel segment, which can achieve high throughput of the chip, and by setting openings at the capture sites, the channels on both sides can be connected, thereby realizing the pairing and fusion of heterologous cells.
优选的,作为一种改进,流路控制模块包括PDMS融合结构芯片和导管,PDMS融合结构芯片上设置有两个进样口、两个出样口、微通道和四个储样池,微通道的结构部分和储样池均设置在PDMS融合结构芯片的底部,进样口和出样口分别设置在对应储样池的垂直正上方,微通道结构部分设置在四个储样池之间。Preferably, as an improvement, the flow control module includes a PDMS fusion structure chip and a catheter, and the PDMS fusion structure chip is provided with two sample inlets, two sample outlets, a microchannel and four sample storage pools, the structural part of the microchannel and the sample storage pool are both arranged at the bottom of the PDMS fusion structure chip, the sample inlet and the sample outlet are respectively arranged vertically above the corresponding sample storage pool, and the microchannel structural part is arranged between the four sample storage pools.
本技术方案中,储样池为待融合细胞存储提供空间,待融合的细胞经过微通道沿进样口进样到芯片内部,实现捕获和融合,结构设计合理。In this technical solution, the sample storage pool provides space for storing cells to be fused, and the cells to be fused are injected into the chip along the injection port through the microchannel to achieve capture and fusion, and the structural design is reasonable.
优选的,作为一种改进,进样口与出样口的直径均为2~5mm。Preferably, as an improvement, the diameters of the sample inlet and the sample outlet are both 2-5 mm.
本技术方案中,进出样口的大小主要是为了匹配实验所需要的外接压力泵管道而设计的。In this technical solution, the sizes of the sample inlet and outlet are mainly designed to match the external pressure pump pipeline required for the experiment.
优选的,作为一种改进,步骤二、步骤三中,软光刻工艺和倒模工艺具体包括如下步骤:Preferably, as an improvement, in step 2 and step 3, the soft lithography process and the reverse molding process specifically include the following steps:
(1)利用软光刻工艺,加工厚度为20~35μm的模具; (1) Using soft lithography technology, a mold with a thickness of 20 to 35 μm is processed;
(2)将模具固定于一亚克力模具上;(2) Fixing the mold on an acrylic mold;
(3)倒入PDMS混合胶,静止后抽真空;(3) Pour in the PDMS mixed glue and let it stand for a while before vacuuming;
(4)置于加烘箱中60~80℃加热固化;(4) Place in an oven and heat at 60-80°C for curing;
(5)倒模。(5) Mold making.
优选的,作为一种改进,步骤四中,等离子清洗的条件为清洗时间10~15秒;步骤五中,键合工艺为热键和,键合温度为100~150℃。。Preferably, as an improvement, in step 4, the plasma cleaning condition is 10 to 15 seconds; in step 5, the bonding process is hot bonding and the bonding temperature is 100 to 150°C.
本技术方案中,等离子清洗的时间主要影响芯片和ITO电极的键合效果,清洗时间过长则会导致键合太紧,细胞液不易进入结构,清洗时间过短则会导致键合不紧容易漏液。此外,通过验证,上述的键合温度为较适宜温度,能够保证键合的效果达到预期要求。In this technical solution, the plasma cleaning time mainly affects the bonding effect between the chip and the ITO electrode. If the cleaning time is too long, the bonding will be too tight and the cell fluid will not easily enter the structure. If the cleaning time is too short, the bonding will be loose and leak easily. In addition, through verification, the above bonding temperature is a more suitable temperature, which can ensure that the bonding effect meets the expected requirements.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1是本发明实施例中整个芯片的结构示意图。FIG. 1 is a schematic diagram of the structure of the entire chip in an embodiment of the present invention.
图2是图1中一对配对结构放大示意图。FIG. 2 is an enlarged schematic diagram of a pair of matching structures in FIG. 1 .
图3是本发明实施例中叉指电极平面示意图.Figure 3 is a schematic plan view of the interdigitated electrodes in an embodiment of the present invention.
图4为本发明实施例中单细胞捕获白光图。FIG. 4 is a white light image of single cell capture in an embodiment of the present invention.
图5为本发明实施例中单细胞捕获荧光图。FIG. 5 is a fluorescence image of a single cell captured in an embodiment of the present invention.
图6为本发明实施例中细胞配对白光图。FIG. 6 is a white light image of cell pairing in an embodiment of the present invention.
图7为本发明实施例中细胞配对荧光叠加图。FIG. 7 is a fluorescence overlay image of cell pairs in an embodiment of the present invention.
图8为本发明实施例中细胞融合前后白光图及荧光图。FIG8 is a white light image and a fluorescence image of cells before and after cell fusion in an embodiment of the present invention.
具体实施方式Detailed ways
下面通过具体实施方式进一步详细说明,但本发明的实施方式不限于此。若未特别指明,下述实施方式所用的技术手段为本领域技术人员所熟知的常规手段;所用的实验方法均为常规方法;所用的材料、试剂等,均可从商业途径得到。The following is further described in detail through specific implementations, but the implementations of the present invention are not limited thereto. Unless otherwise specified, the technical means used in the following implementations are conventional means well known to those skilled in the art; the experimental methods used are all conventional methods; the materials, reagents, etc. used can all be obtained from commercial channels.
说明书附图中的附图标记包括:双侧流场配对结构1、通道2、捕获位点结构3、进口储样池I4、进口储样池II5、微通道结构部分6、出口储样池I7、出口储样池II8、ITO叉指电极9。The figure marks in the drawings of the specification include: bilateral flow field pairing structure 1, channel 2, capture site structure 3, inlet sample storage pool I4, inlet sample storage pool II5, microchannel structure part 6, outlet sample storage pool I7, outlet sample storage pool II8, ITO interdigital electrode 9.
实施例基本如附图1-3所示:一种基于双侧流场配对结构阵列的细胞电融合芯片装置,包括图案化ITO叉指电极层和流路控制模块,图案化ITO叉指电极层通过导电胶带与外细 胞电融合仪形成连接,外界电信号将引入到ITO叉指电极9上,相邻的微电极间将形成足够强度的电场,实现芯片内部的细胞的高效电融合。流路控制模块主要功能在于实现细胞缓冲液在上述结构的进样、捕获配对和出样,流路控制模块包括PDMS融合结构芯片和导管。The embodiment is basically as shown in Figures 1-3: a cell electrofusion chip device based on a double-sided flow field pairing structure array, comprising a patterned ITO interdigital electrode layer and a flow path control module, wherein the patterned ITO interdigital electrode layer is connected to an external cell by a conductive tape. The cell electrofusion instrument forms a connection, and the external electrical signal will be introduced into the ITO interdigital electrode 9, and an electric field of sufficient strength will be formed between adjacent microelectrodes to achieve efficient electrofusion of cells inside the chip. The main function of the flow control module is to realize the injection, capture pairing and sample output of the cell buffer in the above structure. The flow control module includes a PDMS fusion structure chip and a catheter.
基于双侧流场配对结构阵列的细胞电融合芯片装置,从下至上依次为ITO电极层和PDMS双侧流场配对结构层。A cell electrofusion chip device based on a double-sided flow field pairing structure array comprises, from bottom to top, an ITO electrode layer and a PDMS double-sided flow field pairing structure layer.
ITO电极层,采用ITO玻璃作为基底,在ITO玻璃上利用湿法刻蚀出图案化的叉指电极阵列。叉指电极阵列的梳齿距离控制在60~80μm范围内,以保证良好的导通性与可靠性;梳齿的宽度在150~200μm范围内,实际使用时可根据微电极阵列的密度确定。The ITO electrode layer uses ITO glass as a substrate, and a patterned interdigital electrode array is etched on the ITO glass by wet etching. The comb tooth distance of the interdigital electrode array is controlled within the range of 60 to 80 μm to ensure good conductivity and reliability; the width of the comb teeth is within the range of 150 to 200 μm, which can be determined according to the density of the microelectrode array in actual use.
结合图2所示,PDMS双侧流场配对结构层包括利用PDMS多聚物构建的双侧流场配对结构1和通道2,双侧流场配对结构1呈上、下双侧对称设置,并通过中间长7μm、宽1μm的开口实现连通和配对细胞的接触。PDMS双侧流场配对结构层内通道2的高度为25-30μm,通道2呈蛇形结构设置,且通道2的整体长度为300~400μm,宽度为40~50μm,高度为20~30μm。单侧通道2内设置有若干重复捕获单元,重复捕获单元均包括蛇行通道段(即蛇行通道的一个回转单元)、捕获位点结构3和流阻调节微通道(窄通道,可实现流阻的调节),捕获位点结构3为直径9~11μm的圆形结构,相邻两个单元的捕获位点结构3之间的距离为75~150μm;流阻调节微通道长度为4~6μm,宽度为4~6μm,高度为20~30μm;捕获位点结构3均设置有7μm、宽1μm的开口,用于实现双侧通道的连通,构成一对配对结构。位于两侧的对称通道通过捕获位点的7μm开口实现连接,构成一对配对结构,即位于两侧的重复捕获单元连通构成一个配对单元。As shown in FIG2 , the PDMS double-sided flow field pairing structure layer includes a double-sided flow field pairing structure 1 and a channel 2 constructed using a PDMS polymer. The double-sided flow field pairing structure 1 is symmetrically arranged on the upper and lower sides, and is connected and the contact of paired cells is achieved through an opening with a length of 7 μm and a width of 1 μm in the middle. The height of the channel 2 in the PDMS double-sided flow field pairing structure layer is 25-30 μm, and the channel 2 is arranged in a serpentine structure, and the overall length of the channel 2 is 300-400 μm, the width is 40-50 μm, and the height is 20-30 μm. Several repeated capture units are arranged in the single-sided channel 2, and the repeated capture units all include a serpentine channel section (i.e., a turning unit of the serpentine channel), a capture site structure 3, and a flow resistance adjustment microchannel (a narrow channel that can adjust the flow resistance). The capture site structure 3 is a circular structure with a diameter of 9 to 11 μm, and the distance between the capture site structures 3 of two adjacent units is 75 to 150 μm; the flow resistance adjustment microchannel is 4 to 6 μm long, 4 to 6 μm wide, and 20 to 30 μm high; the capture site structure 3 is provided with a 7 μm opening with a width of 1 μm, which is used to achieve the connection between the two-sided channels, forming a pair of paired structures. The symmetrical channels on both sides are connected through the 7 μm opening of the capture site to form a pair of paired structures, that is, the repeated capture units on both sides are connected to form a paired unit.
PDMS融合结构芯片上设置有两个进样口、两个出样口、微通道结构部分和储样池。进样口与出样口的直径均为3mm,具体应用时该直径可以根据实际需要具体选择。两个进样口分别为进样口I和进样口II,进样口I与进样口II均竖向贯穿PDMS融合芯片,且底部分别设置有进口储样池I4和进口储样池II5。两个出样口包括出样口I和出样口II,出样口I和出样口II均竖向贯穿PDMS融合芯片,且底部分别设置有出口储样池I7和出口储样池II8。进口储样池I4和进口储样池II5、出口储样池I7和出口储样池II8以及微通道结构部分6均设置在PDMS融合结构芯片的底部,且从左到右依次为进口储样池I4、出口储样池II8、微通道结构部分6、进口储样池II5和出口储样池I7。微通道设置有多个,且分别连通在进样 口/出样口与储样池之间。通过PDMS融合结构芯片上集成的进样口、出样口和储样池,结合连通的微通道能够实现细胞悬浮液的进样,控制细胞在芯片内部的流动,以及融合后细胞悬浮液的出样。The PDMS fusion structure chip is provided with two sample inlets, two sample outlets, a microchannel structure part and a sample storage pool. The diameters of the sample inlet and the sample outlet are both 3mm, and the diameter can be specifically selected according to actual needs during specific applications. The two sample inlets are respectively sample inlet I and sample inlet II, and the sample inlet I and sample inlet II both vertically penetrate the PDMS fusion chip, and the bottom is respectively provided with an import sample storage pool I4 and an import sample storage pool II5. The two sample outlets include a sample outlet I and a sample outlet II, and the sample outlet I and sample outlet II both vertically penetrate the PDMS fusion chip, and the bottom is respectively provided with an export sample storage pool I7 and an export sample storage pool II8. The import sample storage pool I4 and the import sample storage pool II5, the export sample storage pool I7 and the export sample storage pool II8, and the microchannel structure part 6 are all arranged at the bottom of the PDMS fusion structure chip, and from left to right are the import sample storage pool I4, the export sample storage pool II8, the microchannel structure part 6, the import sample storage pool II5 and the export sample storage pool I7. There are multiple microchannels, which are connected to the injection port. The sample inlet/outlet and the sample storage pool. The sample inlet, sample outlet and sample storage pool integrated on the PDMS fusion structure chip, combined with the connected microchannels, can realize the injection of cell suspension, control the flow of cells inside the chip, and discharge the cell suspension after fusion.
一种基于双侧流场配对结构阵列的细胞电融合芯片装置的制备方法,包括如下步骤:A method for preparing a cell electrofusion chip device based on a double-sided flow field pairing structure array comprises the following steps:
步骤一、加工ITO电极阵列:采用湿法刻蚀工艺实现,具体包括:Step 1: Processing ITO electrode array: using wet etching process, specifically including:
S1、选用ITO玻璃作为加工芯片的基片;S1. Select ITO glass as the substrate for processing chips;
S2、在ITO玻璃上旋涂一层5μm SU-8 3005光刻胶;S2, spin-coat a 5μm layer of SU-8 3005 photoresist on the ITO glass;
S3、通过光刻和湿法刻蚀的方式在ITO层上刻蚀出叉指微阵列结构。S3. Etching a cross-finger microarray structure on the ITO layer by photolithography and wet etching.
步骤二、构建PDMS双侧流场配对结构:利用PDMS多聚物构建双侧流场配对结构和通道结构,具体包括:Step 2: Constructing a PDMS double-sided flow field pairing structure: Using PDMS polymer to construct a double-sided flow field pairing structure and a channel structure, specifically including:
(1)利用软光刻工艺,加工结构高度厚度为30μm的模具,模具结构为细胞悬浮液储样池和微通道阵列结构;(1) Using soft lithography technology, a mold with a structure height and thickness of 30 μm was processed, and the mold structure was a cell suspension sample storage pool and a microchannel array structure;
(2)将模具固定于一亚克力模具上;(2) Fixing the mold on an acrylic mold;
(3)倒入混合好的PDMS混合胶,静止后抽真空;(3) Pour the mixed PDMS glue and let it stand for a while before vacuuming;
(4)置于加烘箱中65℃固化;(4) Place in an oven at 65°C for curing;
(5)揭下固化后PDMS,根据ITO叉指电极形状适配剪裁,并从储样池垂直上方打出贯穿PDMS的进样口、出样口即可。(5) Peel off the cured PDMS, cut it according to the shape of the ITO interdigital electrode, and punch out the inlet and outlet that penetrate the PDMS vertically from above the sample reservoir.
步骤四、等离子清洗,清洗时间10~15秒;Step 4: plasma cleaning, cleaning time 10 to 15 seconds;
步骤五、键合,将PDMS双侧流场配对结构PDMS芯片反扣置于ITO电极上,采用热键合工艺,与芯片形成一密闭腔体,仅通过进样口和出样口进行细胞悬浮液的进出样,键合温度为100~150℃。Step 5: Bonding: Place the PDMS double-sided flow field matching structure PDMS chip upside down on the ITO electrode, and use a thermal bonding process to form a closed cavity with the chip. The cell suspension is only sampled in and out through the sample inlet and outlet, and the bonding temperature is 100-150°C.
采用荧光显微镜分别对利用芯片捕获配对的细胞进行白光和荧光的拍摄,然后用细胞电融合仪加电,加电后再次拍摄细胞在白光和荧光下的图像,比较加电前后的细胞白光和荧光图像。图4-图8为本技术方案细胞配对及融合前后的荧光图片,经本技术方案的芯片结构,能够实现异源细胞的高效配对与融合。The cells captured and paired using the chip were photographed under white light and fluorescence using a fluorescence microscope, and then powered on using the cell electrofusion instrument. After powering on, the images of the cells under white light and fluorescence were photographed again, and the white light and fluorescence images of the cells before and after powering on were compared. Figures 4 to 8 are fluorescence images of the cell pairing and fusion before and after the fusion of the technical solution. The chip structure of the technical solution can achieve efficient pairing and fusion of heterologous cells.
以上所述的仅是本发明的实施例,方案中公知的具体技术方案和/或特性等常识在此未作过多描述。应当指出,对于本领域的技术人员来说,在不脱离本发明技术方案的前提下, 还可以作出若干变形和改进,这些也应该视为本发明的保护范围,这些都不会影响本发明实施的效果和专利的实用性。本申请要求的保护范围应当以其权利要求的内容为准,说明书中的具体实施方式等记载可以用于解释权利要求的内容。 The above is only an embodiment of the present invention, and the known specific technical solutions and/or characteristics in the solution are not described in detail here. It should be pointed out that for those skilled in the art, without departing from the technical solution of the present invention, Several modifications and improvements may be made, which should also be considered as the protection scope of the present invention, and these will not affect the effect of the implementation of the present invention and the practicality of the patent. The protection scope required by this application shall be based on the content of its claims, and the specific implementation methods and other records in the specification can be used to interpret the content of the claims.

Claims (10)

  1. 一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:包括图案化ITO叉指电极层和流路控制模块,所述图案化ITO叉指电极层连接有外细胞电融合仪,图案化ITO叉指电极层包括依次设置的基底层、ITO电极层和PDMS双侧流场配对结构层,所述PDMS双侧流场配对结构层包括双侧流场配对结构和通道,且双侧流场配对结构和通道均设置有多个并呈双侧对称设置。A cell electrofusion chip device based on a double-sided flow field pairing structure array is characterized in that it includes a patterned ITO interdigital electrode layer and a flow path control module, wherein the patterned ITO interdigital electrode layer is connected to an external cell electrofusion instrument, the patterned ITO interdigital electrode layer includes a substrate layer, an ITO electrode layer and a PDMS double-sided flow field pairing structure layer arranged in sequence, the PDMS double-sided flow field pairing structure layer includes a double-sided flow field pairing structure and a channel, and both the double-sided flow field pairing structure and the channel are provided in plurality and are bilaterally symmetrically arranged.
  2. 根据权利要求1所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:所述ITO电极层上设置有叉指电极阵列,叉指电极阵列整体呈梳齿结构,且叉指电极阵列包括若干叉指电极。According to the cell electrofusion chip device based on the double-sided flow field pairing structure array described in claim 1, it is characterized in that: an interdigitated electrode array is arranged on the ITO electrode layer, the interdigitated electrode array is a comb-tooth structure as a whole, and the interdigitated electrode array includes a plurality of interdigitated electrodes.
  3. 根据权利要求2所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:所述叉指电极的宽度均为150~200μm,相邻两个叉指电极的距离为60~80μm。According to the cell electrical fusion chip device based on the double-sided flow field pairing structure array as described in claim 2, it is characterized in that the width of the interdigital electrodes is 150-200 μm, and the distance between two adjacent interdigital electrodes is 60-80 μm.
  4. 根据权利要求3所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:所述通道呈蛇形结构,蛇形的通道的长度为300~400μm,宽度为40~50μm,高度为20~30μm。According to claim 3, a cell electrofusion chip device based on a double-sided flow field pairing structure array is characterized in that the channel has a serpentine structure, and the length of the serpentine channel is 300-400 μm, the width is 40-50 μm, and the height is 20-30 μm.
  5. 根据权利要求4所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:所述通道内设置有若干重复捕获单元,重复捕获单元均包括蛇行通道段、捕获位点结构和流阻调节微通道,所述捕获位点结构为直径9~11μm的圆形结构,相邻两个捕获位点的距离为75~150μm;流阻调节微通道长度为4~6μm,宽度为4~6μm,高度为20~30μm;所述捕获位点结构均设置有7μm开口,用于实现双侧通道的连通,构成一对配对结构。According to claim 4, a cell electrofusion chip device based on a double-sided flow field pairing structure array is characterized in that: a plurality of repeated capture units are arranged in the channel, and the repeated capture units all include a serpentine channel section, a capture site structure and a flow resistance adjustment microchannel, the capture site structure is a circular structure with a diameter of 9 to 11 μm, and the distance between two adjacent capture sites is 75 to 150 μm; the flow resistance adjustment microchannel has a length of 4 to 6 μm, a width of 4 to 6 μm, and a height of 20 to 30 μm; the capture site structures are all provided with 7 μm openings for realizing the connectivity of the double-sided channels to form a pair of pairing structures.
  6. 根据权利要求5所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:所述流路控制模块包括PDMS融合结构芯片和导管,所述PDMS融合结构芯片上设置有两个进样口、两个出样口、微通道和四个储样池,微通道的结构部分和储样池均设置在PDMS融合结构芯片的底部,进样口和出样口分别设置在对应储样池的垂直正上方,微通道结构部分设置在四个储样池之间。According to claim 5, a cell electrofusion chip device based on a double-sided flow field pairing structure array is characterized in that: the flow path control module includes a PDMS fusion structure chip and a catheter, and the PDMS fusion structure chip is provided with two sample inlets, two sample outlets, a microchannel and four sample storage pools, the structural part of the microchannel and the sample storage pool are both arranged at the bottom of the PDMS fusion structure chip, the sample inlet and the sample outlet are respectively arranged vertically above the corresponding sample storage pool, and the microchannel structural part is arranged between the four sample storage pools.
  7. 根据权利要求6所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置,其特征在于:所述进样口与出样口的直径均为2~5mm。According to claim 6, a cell electrofusion chip device based on a double-sided flow field pairing structure array is characterized in that the diameters of the sample inlet and the sample outlet are both 2 to 5 mm.
  8. 根据权利要求1-7任一所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装 置的制备方法,其特征在于,包括如下步骤:A cell electrofusion chip device based on a double-sided flow field pairing structure array according to any one of claims 1 to 7 The preparation method of the device is characterized in that it comprises the following steps:
    步骤一、采用湿法刻蚀法加工图案化ITO叉指电极层;Step 1: Processing a patterned ITO interdigital electrode layer using a wet etching method;
    步骤二、构建PDMS双侧流场配对结构,利用PDMS多聚物通过软光刻工艺和倒模构建;Step 2: construct a PDMS double-sided flow field pairing structure using PDMS polymer through soft lithography and reverse molding;
    步骤三、制备PDMS融合结构芯片,通过软光刻工艺和倒模构建;Step 3: Prepare a PDMS fusion structure chip by soft lithography and reverse molding;
    步骤四、等离子清洗;Step 4: plasma cleaning;
    步骤五、键合。Step 5: Bonding.
  9. 根据权利要求8所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置的制备方法,其特征在于:步骤二、步骤三中,软光刻工艺和倒模工艺具体包括如下步骤:The method for preparing a cell electrofusion chip device based on a double-sided flow field pairing structure array according to claim 8 is characterized in that: in step 2 and step 3, the soft lithography process and the reverse molding process specifically include the following steps:
    (1)利用软光刻工艺,加工结构高度为20~35μm的模具;(1) Using soft lithography technology, molds with a structure height of 20 to 35 μm are processed;
    (2)将模具固定于一亚克力模具上;(2) Fixing the mold on an acrylic mold;
    (3)倒入PDMS混合胶,静止后抽真空;(3) Pour in the PDMS mixed glue and let it stand for a while before vacuuming;
    (4)置于加烘箱中60~80℃加热固化;(4) Place in an oven and heat at 60-80°C for curing;
    (5)倒模。(5) Mold making.
  10. 根据权利要求9所述的一种基于双侧流场配对结构阵列的细胞电融合芯片装置的制备方法,其特征在于:步骤四中,等离子清洗的条件为清洗时间10~15秒;步骤五中,键合工艺为热键和,键合温度为100~150℃。 According to the method for preparing a cell electrofusion chip device based on a double-sided flow field pairing structure array as described in claim 9, it is characterized in that: in step 4, the plasma cleaning condition is a cleaning time of 10 to 15 seconds; in step 5, the bonding process is hot bonding and the bonding temperature is 100 to 150°C.
PCT/CN2023/132862 2022-11-30 2023-11-21 Cell electrofusion chip device based on bilateral flow field pairing structure array and preparation method therefor WO2024114438A1 (en)

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