WO2024070694A1

WO2024070694A1 - Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound

Info

Publication number: WO2024070694A1
Application number: PCT/JP2023/033368
Authority: WO
Inventors: 彰宏原; 季彦松村; 恭平荒山
Original assignee: 富士フイルム株式会社
Priority date: 2022-09-26
Filing date: 2023-09-13
Publication date: 2024-04-04

Abstract

Provided is a composition comprising a compound represented by formula (1) and a curable compound. Provided are a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module, each of which uses the composition. This compound is represented by formula (1).　(1): (PM)(Z)_m wherein: PM represents an anion represented by formula (PM1); Z represents a cation having a valency of two or more; and m represents a number exceeding 0 and necessary for neutralization of the charge of PM.

Description

Composition, film, optical filter, solid-state imaging device, image display device, infrared sensor, camera module and compound

The present invention relates to a polymethine compound and a composition containing the same. The present invention also relates to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module that use a composition containing a polymethine compound.

　Video cameras, digital still cameras, mobile phones with cameras, and other devices use solid-state color image sensors such as CCDs (charge-coupled devices) and CMOS (complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light receiving section. For this reason, infrared-cut filters are sometimes used to correct visibility.

Infrared cut filters are manufactured using a composition that contains an infrared absorbing agent. Polymethine compounds are known examples of infrared absorbing agents.

Patent Document 1 describes the production of infrared cut filters and the like using a composition containing a specific polymethine compound.

JP 2021-134350 A

However, polymethine compounds tend to have low light resistance and heat resistance. For this reason, there is room for further improvement in the light resistance of films obtained using compositions containing these compounds.

Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent light resistance and heat resistance. In addition, the present invention is to provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

The inventors conducted extensive research into polymethine compounds and discovered that a salt of an anion represented by formula (PM1) with a divalent or higher cation is a compound with excellent heat resistance and light resistance, leading to the completion of the present invention. Thus, the present invention provides the following:

<1> A composition comprising a compound represented by formula (1) and a curable compound;
(PM) (Z) _m ... (1)
In formula (1), PM represents an anion represented by formula (PM1):
Z represents a divalent or higher cation;
m is a number greater than 0 and represents the number required to neutralize the charge of PM;
In formula (PM1), Rpm ¹ to Rpm ⁵ each independently represent a hydrogen atom or a substituent;
n represents an integer of 1 or more;
any two of Rpm ² to Rpm ⁴ may be bonded to form a ring, Rpm ¹ and T ¹ may be bonded to form a ring, and Rpm ⁵ and T ² may be bonded to form a ring;
T ¹ is a group represented by formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ¹ to Rpm ⁵ , T ¹ and T ² contains an anionic group;
In the formula, X ¹ to X ⁶ each independently represent an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR ^X1 -, where R ^X1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heterocyclic group;
R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ each independently represent a hydrogen atom, an alkyl group, a halogen atom, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR ^L1 , -C(=O)R ^L1 , -C(=O)OR ^L1 , -OC(=O)R ^L1 , -NR ^L1 R ^L2 , -NHC(=O)R ^L1 , -C(=O)NR ^L1 R ^L2 , -NHC(=O)OR ^L1 , -OC(=O)NR ^L1 R ^L2 , -NHC(=O)NR ^L1 R ^L2 , -SR ^L1 , _-S (=O) _2R ^L1 , -S(=O)2OR ^L1 , -NHS(=O) ₂ R ^L1 represents -S(=O) ₂ NR ^L1 R ^L2 or an anionic group, and R ^L1 and R ^L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group;
Adjacent two of R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ may be bonded to each other to form a ring.
<2> The composition according to <1>, wherein X ¹ to X ⁶ each independently represent an oxygen atom or a sulfur atom.
<3> The composition according to <1>, wherein PM in the formula (1) is an anion represented by formula (PM2), formula (PM3) or formula (PM4);
In formula (PM2), Rpm ¹¹ to Rpm ¹⁵ each independently represent a hydrogen atom or a substituent;
Rpm ¹² and Rpm ¹⁴ may be bonded to form a ring;
Rpm ¹¹ and T ¹ may be bonded to form a ring, and Rpm ¹⁵ and T ² may be bonded to form a ring;
T ¹ is a group represented by the above formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by the above formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ¹¹ to Rpm ¹⁵ , T ¹ and T ² contains an anionic group;
In formula (PM3), Rpm ²¹ to Rpm ²⁷ each independently represent a hydrogen atom or a substituent;
Rpm ²³ and Rpm ²⁵ may be bonded to form a ring;
Rpm ²¹ and ^T1 may be bonded to form a ring, Rpm ²⁷ and ^T2 may be bonded to form a ring,
T ¹ is a group represented by the above formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by the above formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ²¹ to Rpm ²⁷ , T ¹ and T ² contains an anionic group;
In formula (PM4), Rpm ³¹ to Rpm ³⁹ each independently represent a hydrogen atom or a substituent;
Rpm ³⁴ and Rpm ³⁶ may be bonded to form a ring;
Rpm ³¹ and ^T1 may be bonded to form a ring, and Rpm ³⁹ and ^T2 may be bonded to form a ring;
T ¹ is a group represented by the above formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by the above formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ³¹ to Rpm ³⁹ , T ¹ and T ² contains an anionic group.
<4> The composition according to any one of <1> to <3>, further comprising an infrared absorbing agent other than the compound represented by formula (1).
<5> A film obtained by using the composition according to any one of <1> to <4>.
<6> An optical filter having the film according to <5>.
<7> A solid-state imaging device having the film according to <5>.
<8> An image display device having the film according to <5>.
<9> An infrared sensor having the film according to <5>.
<10> A camera module having the film according to <5>.
<11> A compound represented by formula (1);
(PM) (Z) _m ... (1)
In formula (1), PM represents an anion represented by formula (PM1):
Z represents a divalent or higher cation;
m is a number greater than 0 and represents the number required to neutralize the charge of PM;
In formula (PM1), Rpm ¹ to Rpm ⁵ each independently represent a hydrogen atom or a substituent;
n represents an integer of 1 or more;
any two of Rpm ² to Rpm ⁴ may be bonded to form a ring, Rpm ¹ and T ¹ may be bonded to form a ring, and Rpm ⁵ and T ² may be bonded to form a ring;
T ¹ is a group represented by formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ¹ to Rpm ⁵ , T ¹ and T ² contains an anionic group;
In the formula, X ¹ to X ⁶ each independently represent an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR ^X1 -, where R ^X1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heterocyclic group;
R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ each independently represent a hydrogen atom, an alkyl group, a halogen atom, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR ^L1 , -C(=O)R ^L1 , -C(=O)OR ^L1 , -OC(=O)R ^L1 , -NR ^L1 R ^L2 , -NHC(=O)R ^L1 , -C(=O)NR ^L1 R ^L2 , -NHC(=O)OR ^L1 , -OC(=O)NR ^L1 R ^L2 , -NHC(=O)NR ^L1 R ^L2 , -SR ^L1 , _-S (=O) _2R ^L1 , -S(=O)2OR ^L1 , -NHS(=O) ₂ R ^L1 represents -S(=O) ₂ NR ^L1 R ^L2 or an anionic group, and R ^L1 and R ^L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group;
Adjacent two of R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ may be bonded to each other to form a ring.

The present invention can provide a composition capable of forming a film having excellent light resistance and heat resistance. The present invention can also provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor.

The present invention will be described in detail below.
In this specification, the use of "to" means that the numerical values before and after it are included as the lower limit and upper limit.
In the description of groups (atomic groups) in this specification, when there is no indication of whether they are substituted or unsubstituted, the term encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups that have no substituents (unsubstituted alkyl groups) but also alkyl groups that have substituents (substituted alkyl groups).
In this specification, unless otherwise specified, the term "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light represented by an excimer laser, extreme ultraviolet light (EUV light), X-rays, active rays or radiation such as electron beams.
In this specification, "(meth)acrylate" refers to both or either of acrylate and methacrylate, "(meth)acrylic" refers to both or either of acrylic and methacrylic, and "(meth)acryloyl" refers to both or either of acryloyl and methacryloyl.
In this specification, the weight average molecular weight and the number average molecular weight are defined as values calculated in terms of polystyrene as measured by gel permeation chromatography (GPC).
In this specification, Me in the chemical formulae represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.
In this specification, infrared rays refer to light (electromagnetic waves) with a wavelength of 700 to 2500 nm.
In this specification, the total solids content refers to the total mass of all components of the composition excluding the solvent.
In this specification, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

<Composition>
The composition of the present invention is characterized by containing a compound represented by formula (1) and a curable compound.

The compound represented by formula (1) contained in the composition of the present invention has excellent heat resistance and light resistance, and the composition of the present invention containing such a compound can form a film having excellent light resistance and heat resistance.

The composition of the present invention can be used as a composition for an optical filter. Types of optical filters include infrared cut filters and infrared transmission filters. Since the compound represented by formula (1) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

The components used in the composition of the present invention are explained below.

<<Specific Compound (Compound Represented by Formula (1)>>
The composition of the present invention contains a compound represented by formula (1). The compound represented by formula (1) is also a compound of the present invention. Hereinafter, the compound represented by formula (1) is also referred to as a specific compound.

(PM) (Z) _m ... (1)
In formula (1), PM represents an anion represented by formula (PM1):
Z represents a divalent or higher cation;
m is a number greater than 0 and represents the number required to neutralize the charge of PM.

-About Z-
The divalent or higher cation represented by Z in formula (1) may be an organic cation or an inorganic cation. In the case of an inorganic cation, the dispersibility in a hydrophilic solvent is excellent. In the case of an organic cation, the dispersibility in a hydrophobic solvent is excellent.

In formula (1), Z is preferably a divalent, trivalent or tetravalent cation, and more preferably a divalent or trivalent cation.

The types of divalent or higher cations represented by Z include (1) divalent or higher metal cations, and (2) divalent or higher cations having two or more cations in one molecule, such as pyridinium cations, ammonium cations, imidazolium cations, oxazolium cations, thiazolium cations, pyrrolidinium cations, piperidinium cations, and phosphonium cations.

The divalent or higher metal cation is preferably a cation of an element selected from the group consisting of periodic elements, 4th period elements, 5th period elements, 6th period elements, 7th period elements, and rare earth elements, and more preferably a cation of an element selected from the group consisting of periodic elements, 4th period elements, 5th period elements, and rare earth elements. Specifically, magnesium cation, aluminum cation, calcium cation, scandium cation, titanium cation, vanadium cation, chromium cation, manganese cation, iron cation, cobalt cation, nickel cation, copper cation, zinc cation, gallium cation, strontium cation, yttrium cation, zirconium cation, ruthenium cation, rhodium cation, palladium cation, indium cation, tin cation, barium cation, hafnium cation, tantalum cation, rhenium cation, iridium cation, platinum cation, or a cation of a rare earth element is preferable, and magnesium cation, aluminum cation, calcium cation, scandium cation, titanium cation, vanadium cation, chromium cation, manganese cation, iron cation, cobalt cation, nickel cation, copper cation, zinc cation, gallium cation, strontium cation, barium cation, hafnium cation, radium cation, or a cation of a rare earth element is preferable. and more preferably, magnesium cation, aluminum cation, calcium cation, scandium cation, titanium cation, vanadium cation, chromium cation, manganese cation, iron cation, cobalt cation, nickel cation, copper cation, zinc cation, gallium cation, strontium cation, barium cation, hafnium cation, radium cation, lanthanum cation, cerium cation, praseodymium cation, neodymium cation, samarium cation, europium cation, gadolinium cation, terbium cation, thulium cation, ytterbium cation, or lutetium cation. Magnesium cation, aluminum cation, calcium cation, titanium cation, iron cation, copper cation, zinc cation, gallium cation, strontium cation, barium cation, hafnium cation, lanthanum cation, cerium cation, neodymium cation, samarium cation, europium cation, or gadolinium cation is particularly preferred.

Specific examples of cations other than metal cations include cations having the structures shown below: In the following structural formulas, Me represents a methyl group, Et represents an ethyl group, and Ph represents a phenyl group.

About -m-
In formula (1), m is a number greater than 0 and represents a number necessary to neutralize the charge of the PM of formula (1). That is, in formula (1), m is a number that satisfies the following relationship.
m × (valence of cation represented by Z in formula (1)) = valence of anion represented by PM in formula (1) For example, when the valence of anion represented by PM in formula (1) is 1 and the cation represented by Z is a divalent Mg (magnesium) cation, m is 1/2. In formula (1), m is expressed as the number of moles of cation represented by Z relative to 1 mole of anion represented by PM. Therefore, in the above case, m is expressed as a fraction, but it means that the compound represented by formula (1) has 1 mole of anion represented by Z relative to 2 moles of anion represented by PM.

--Regarding the anion represented by formula (PM1)--
PM in formula (1) represents an anion represented by formula (PM1).

In formula (PM1), Rpm ¹ to Rpm ⁵ each independently represent a hydrogen atom or a substituent;
n represents an integer of 1 or more;
any two of Rpm ² to Rpm ⁴ may be bonded to form a ring, Rpm ¹ and T ¹ may be bonded to form a ring, and Rpm ⁵ and T ² may be bonded to form a ring;
T ¹ is a group represented by formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ¹ to Rpm ⁵ , T ¹ and T ² contains an anionic group.

In the formula, X ¹ to X ⁶ each independently represent an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR ^X1 -, where R ^X1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heterocyclic group;
R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ each independently represent a hydrogen atom, an alkyl group, a halogen atom, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR ^L1 , -C(=O)R ^L1 , -C(=O)OR ^L1 , -OC(=O)R ^L1 , -NR ^L1 R ^L2 , -NHC(=O)R ^L1 , -C(=O)NR ^L1 R ^L2 , -NHC(=O)OR ^L1 , -OC(=O)NR ^L1 R ^L2 , -NHC(=O)NR ^L1 R ^L2 , -SR ^L1 , _-S (=O) _2R ^L1 , -S(=O)2OR ^L1 , -NHS(=O) ₂ R ^L1 represents -S(=O) ₂ NR ^L1 R ^L2 or an anionic group, and R ^L1 and R ^L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group;
Adjacent two of R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ may be bonded to each other to form a ring.

Examples of the substituents represented by Rpm ¹ to Rpm ⁵ include the groups exemplified as the substituent T described below, and anionic groups.

Among the substituents represented by Rpm ¹ to Rpm ⁵ , examples of the substituents other than the anionic group include a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR ^L1 , -C(=O)R ^L1 , -C(=O)OR ^L1 , -OC(=O)R ^L1 , -NR ^L1 R ^L2 , -NHC(=O)R ^L1 , -C(=O)NR ^L1 R ^L2 , -NHC(=O)OR ^L1 , -OC(=O)NR ^L1 R ^L2 , -NHC(=O)NR ^L1 R ^L2 , -SR ^L1 , -S(=O) _2R ^L1 , -S(=O) _2OR ^L1 , -NHS(=O) _2R ^L1 or -S(=O) ₂ NR ^L1 R ^L2 is preferred, where R ^L1 and R ^L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
The number of carbon atoms in the alkyl group is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, and particularly preferably 1 to 5. The alkyl group may be linear, branched, or cyclic.
The number of carbon atoms in the alkenyl group is preferably from 2 to 20, more preferably from 2 to 15, still more preferably from 2 to 10, and particularly preferably from 2 to 5. The alkenyl group may be either linear or branched.
The aryl group preferably has 6 to 20 carbon atoms, and more preferably has 6 to 12 carbon atoms.
The heterocyclic group is preferably a monocyclic or fused ring heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic or fused ring heterocyclic group having 2 to 4 fused rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. Examples of the heteroatoms constituting the ring of the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom, and the nitrogen atom is preferred. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 20, more preferably 1 to 18, and more preferably 1 to 12. The heterocyclic group is preferably a 5-membered or 6-membered heterocyclic group.
The alkyl group, alkenyl group, aryl group and heterocyclic group may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described later.

The anionic group includes a group represented by the formula (AN-1) and a group represented by the formula (AN-2).

In formula (AN-1), L ^AN1 represents a single bond or a p+1-valent linking group.
^An1 represents _-SO3- ^, ^-COO- , _-PO3H- , ^-CON ^- ^SO2Ran1 , _-SO2N ^- ^SO2Ran1 or _-SO2N ^- ^CORan1 , ^{where Ran1} _represents an alkyl group or an aryl group, and p represents an integer of ₁ to 4.

In formula (AN-2), L ^AN2 and L ^AN4 each independently represent a single bond or a divalent linking group.
L ^AN3 represents -CON ^- SO ₂ -, -SO ₂ N ^- SO ₂ - or -SO ₂ N ^- CO-;
R ^AN1 and R ^AN2 each independently represent an alkylene group or an arylene group;
An ² represents -SO ₃ ^- , -COO ^- or -PO ₃ H ^- .

Examples of the p+1-valent linking group represented by L ^AN1 in formula (AN-1) include an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, -O-, -CO-, -NH-, -COO-, -OCO-, -CONH-, -NHCO-, -SO ₂ -, -SO ₂ NH-, -NHSO ₂ -, -S-, and groups consisting of a combination of two or more of these groups.
The number of carbon atoms in the aliphatic hydrocarbon group is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, and particularly preferably 1 to 5. The aliphatic hydrocarbon group may be linear, branched, or cyclic.
The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, and more preferably has 6 to 12 carbon atoms.
The heterocyclic group is preferably a monocyclic or fused ring heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic or fused ring heterocyclic group having 2 to 4 fused rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. Examples of the heteroatoms constituting the ring of the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom, and the nitrogen atom is preferred. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 20, more preferably 1 to 18, and more preferably 1 to 12. The heterocyclic group is preferably a 5-membered or 6-membered heterocyclic group.
The aliphatic hydrocarbon group, aromatic hydrocarbon group and heterocyclic group may have a substituent. Examples of the substituent include the substituent T described below.

In formula (AN-1), An ¹ represents -SO ₃ ^- , -COO ^- , -PO ₃ H ^- , -CON ^- SO ₂ R ^an1 , -SO ₂ N ^- SO ₂ R ^an1 or -SO ₂ N ^- COR ^an1 , where R ^an1 represents an alkyl group or an aryl group. An ¹ is preferably -SO ₃ ^- , -COO ^- , -CON ^- SO ₂ R ^an1 , -SO ₂ N ^- SO ₂ R ^an1 or -SO ₂ N ^- COR ^an1 , and more preferably -SO ₃ ^- , -COO ^- or -SO ₂ N ^- SO ₂ R ^an1 .

The number of carbon atoms in the alkyl group represented by R ^an1 is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkoxy group, and an aryloxy group. The alkyl group may have a plurality of substituents. The alkyl group represented by R ^an1 is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent.
The number of carbon atoms of the aryl group represented by R ^an1 is preferably 6 to 20, and more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, and an aryloxy group. The number of substituents may be multiple. The aryl group represented by R ^an1 is preferably an aryl group having a halogen atom as a substituent, and more preferably an aryl group having a fluorine atom as a substituent.

L ^AN2 and L ^AN4 in formula (AN-2) each independently represent a single bond or a divalent linking group.
Examples of the divalent linking group represented by L ^AN2 and L ^AN4 include an alkylene group, an arylene group, a heterocyclic group, -O-, -CO-, -NH-, -COO-, -OCO-, -CONH-, -NHCO-, -SO ₂ -, -SO ₂ NH-, -NHSO ₂ -, -S-, and groups formed by combining two or more of these groups.
The number of carbon atoms in the alkylene group is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, and particularly preferably 1 to 5. The alkylene group may be linear, branched, or cyclic.
The arylene group preferably has 6 to 20 carbon atoms, and more preferably has 6 to 12 carbon atoms.
The heterocyclic group is preferably a monocyclic or fused ring heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic or fused ring heterocyclic group having 2 to 4 fused rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. Examples of the heteroatoms constituting the ring of the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom, and the nitrogen atom is preferred. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 20, more preferably 1 to 18, and more preferably 1 to 12. The heterocyclic group is preferably a 5-membered or 6-membered heterocyclic group.
The alkylene group, the arylene group and the heterocyclic group may have a substituent. Examples of the substituent include the substituent T described below.

L ^AN3 in the formula (AN-2) represents -CON ^- SO ₂ -, -SO ₂ N ^- SO ₂ - or -SO ₂ N ^- CO-, and is preferably -SO ₂ N ^- SO ₂ -.

In formula (1), R ^AN1 and R ^AN2 each independently represent an alkylene group or an arylene group.
The number of carbon atoms in the alkylene group represented by R ^AN1 and R ^AN2 is preferably 1 to 15, more preferably 1 to 10, and even more preferably 1 to 5. The alkylene group may be linear, branched, or cyclic. The alkylene group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkoxy group, and an aryloxy group. There may be multiple substituents.
The alkylene group represented by R ^AN2 is preferably an alkylene group having a halogen atom as a substituent, and more preferably an alkylene group having a fluorine atom as a substituent.
The number of carbon atoms in the arylene group represented by R ^AN1 and R ^AN2 is preferably 6 to 20, and more preferably 6 to 12. The arylene group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, and an aryloxy group. The number of substituents may be multiple. The arylene group represented by ^{R AN2} is preferably an arylene group having a halogen atom as a substituent, and more preferably an arylene group having a fluorine atom as a substituent.

An ² in formula (AN-2) represents -SO ₃ ^- , -COO ^- or -PO ₃ H ^- , preferably -SO ₃ ^- or -COO ^- , and more preferably -SO ₃ ^- .

In formula (PM1), any two of Rpm ² to Rpm ⁴ may be bonded to form a ring, Rpm ¹ and T ¹ may be bonded to form a ring, and Rpm ⁵ and T ² may be bonded to form a ring.
The ring formed is preferably a 5-membered or 6-membered ring. The ring formed may have a substituent. Examples of the substituent include the groups listed as the substituent T described below and anionic groups. Examples of the anionic group include the groups represented by the above formula (AN-1) and formula (AN-2).

In formula (PM1), n represents an integer of 1 or more, and is preferably an integer of 1 to 3.

In formula (1), ^T1 is a group represented by formula ( ^T1A ), formula ( ^T1B ) or formula ( ^T1C ), and ^T2 is a group represented by formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ).

In formulae (T ^1A ), (T ^1B ), (T ^1C ), (T ^2A ), (T ^2B ) and (T ^2C ), X ¹ to X ⁶ each independently represent an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom or -NR ^X1 -, where R ^X1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group or a heterocyclic group.

Examples of the halogen atom represented by R ^X1 include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
The number of carbon atoms in the alkyl group represented by R ^X1 is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, and particularly preferably 1 to 5. The alkyl group may be linear, branched, or cyclic.
The aryl group represented by R ^{3 X1} preferably has 6 to 20 carbon atoms, and more preferably has 6 to 12 carbon atoms.
The heterocyclic group represented by R ^X1 is preferably a monocyclic or fused ring heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic or fused ring heterocyclic group having 2 to 4 fused rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. Examples of the heteroatoms constituting the ring of the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom, and are preferably a nitrogen atom. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 20, more preferably 1 to 18, and more preferably 1 to 12. The heterocyclic group is preferably a 5-membered or 6-membered heterocyclic group.
The alkyl group, aryl group and heterocyclic group represented by R ^X1 may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described below.

In formula (T ^1A ), formula (T ^1B ), formula (T ^1C ), formula (T ^2A ), formula (T ^2B ) and formula (T ^2C ), X ¹ to X ⁶ are each preferably independently an oxygen atom or a sulfur atom, more preferably an oxygen atom. According to this embodiment, the heat resistance and light resistance can be further improved.

In formulae (T ^1A ), (T ^1B ), (T ^1C ), (T ^2A ), (T ^2B ) and (T ^2C ), R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ each independently represent a hydrogen atom, an alkyl group, a halogen atom, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR ^L1 , -C(═O)R ^L1 , -C(═O)OR ^L1 , -OC(═O)R ^L1 , -NR ^L1 R ^L2 , -NHC(═O)R ^L1 , -C(═O)NR ^L1 R ^L2 , -NHC(═O)OR ^L1 , -OC(═O)NR ^L1 R ^L2 , -NHC(═O)NR ^L1 R ^L2 , -SR ^L1 , -S(=O) ₂ R ^L1 , -S(=O) ₂ OR ^L1 , -NHS(=O) ₂ R ^L1 , -S(=O) ₂ NR ^L1 R ^L2 or an anionic group, and R ^L1 and R ^L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group.

Examples of the anionic group represented by R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ include the groups represented by the above-mentioned formula (AN-1) and formula (AN-2).

Examples of the halogen atom represented by R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

The number of carbon atoms in the alkyl group represented by R ¹ to R ¹⁶ , R ³¹ to R ⁴⁶ , R ^L1 and R ^L2 is preferably 1 to 20, more preferably 1 to 15, still more preferably 1 to 10, and particularly preferably 1 to 5. The alkyl group may be linear, branched or cyclic.
The number of carbon atoms in the alkenyl group represented by R ¹ to R ¹⁶ , R ³¹ to R ⁴⁶ , R ^L1 and R ^L2 is preferably 2 to 20, more preferably 2 to 15, still more preferably 2 to 10, and particularly preferably 2 to 5. The alkenyl group may be either linear or branched.
The aryl group represented by R ¹ to R ¹⁶ , R ³¹ to R ⁴⁶ , R ^L1 and R ^L2 preferably has 6 to 20 carbon atoms, and more preferably has 6 to 12 carbon atoms.
The heterocyclic group represented by R ¹ to R ¹⁶ , R ³¹ to R ⁴⁶ , R ^L1 and R ^L2 is preferably a monocyclic or fused ring heterocyclic group having 2 to 8 fused rings, more preferably a monocyclic or fused ring heterocyclic group having 2 to 4 fused rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. Examples of the heteroatom constituting the ring of the heterocyclic group include a nitrogen atom, an oxygen atom and a sulfur atom, and the nitrogen atom is preferable. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 20, more preferably 1 to 18, and more preferably 1 to 12. The heterocyclic group is preferably a 5-membered or 6-membered heterocyclic group.
The alkyl group, alkenyl group, aryl group and heterocyclic group may have a substituent. Examples of the substituent include the groups exemplified as the substituent T described later.

Any two adjacent groups among R ¹ to R ¹⁶ and R ³¹ to R ⁴⁶ may be bonded to each other to form a ring. The ring formed is preferably a 5-membered or 6-membered ring. The ring formed may have a substituent. Examples of the substituent include the groups listed as the substituent T described below and anionic groups. Examples of the anionic group include the groups represented by the formula (AN-1) and the groups represented by the formula (AN-2) described above.

In formula (PM1), at least one of Rpm ¹ to Rpm ⁵ , T ¹ and T ² contains an anionic group. It is preferable that at least one of T ¹ and T ² contains an anionic group, and it is more preferable that each of T ¹ and T ² contains an anionic group.

In addition, when ^T1 contains an anionic group, it means that ^T1 is a group represented by formula ( ^T1A ) in which at least one of ^R1 to ^R6 is a group containing an anionic group, ^T1 is a group represented by formula ( ^T1B ) in which at least one of ^R7 to ^R12 is a group containing an anionic group, or ^T1 is a group represented by formula ( ^T1C ) in which at least one of ^R13 to ^R16 is a group containing an anionic group.
Furthermore, when ^T2 contains an anionic group, it means that ^T2 is a group represented by formula ( ^T2A ) in which at least one of ^R31 to ^R36 is a group containing an anionic group, ^T2 is a group represented by formula ( ^T2B ) in which at least one of ^R37 to ^R42 is a group containing an anionic group, or ^T2 is a group represented by formula ( ^T2C ) in which at least one of ^R43 to ^R46 is a group containing an anionic group.

In formula (PM1), the total number of anions contained in Rpm ¹ to Rpm ⁵ , T ¹ and T ² is preferably 2-20, more preferably 2-15, and even more preferably 2-10.

The anion represented by formula (PM1) is preferably a 1-19 valent anion, more preferably a 1-14 valent anion, and even more preferably a 1-9 valent anion.

PM in formula (1) is preferably an anion represented by formula (PM2), formula (PM3) or formula (PM4), and more preferably an anion represented by formula (PM2) or formula (PM3).

In formula (PM2), Rpm ¹¹ to Rpm ¹⁵ each independently represent a hydrogen atom or a substituent;
Rpm ¹² and Rpm ¹⁴ may be bonded to form a ring;
Rpm ¹¹ and T ¹ may be bonded to form a ring, and Rpm ¹⁵ and T ² may be bonded to form a ring;
T ¹ is a group represented by the above formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by the above formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ¹¹ to Rpm ¹⁵ , T ¹ and T ² contains an anionic group;
In formula (PM3), Rpm ²¹ to Rpm ²⁷ each independently represent a hydrogen atom or a substituent;
Rpm ²³ and Rpm ²⁵ may be bonded to form a ring;
Rpm ²¹ and ^T1 may be bonded to form a ring, Rpm ²⁷ and ^T2 may be bonded to form a ring,
T ¹ is a group represented by the above formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by the above formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ²¹ to Rpm ²⁷ , T ¹ and T ² contains an anionic group;
In formula (PM4), Rpm ³¹ to Rpm ³⁹ each independently represent a hydrogen atom or a substituent;
Rpm ³⁴ and Rpm ³⁶ may be bonded to form a ring;
Rpm ³¹ and ^T1 may be bonded to form a ring, and Rpm ³⁹ and ^T2 may be bonded to form a ring;
T ¹ is a group represented by the above formula (T ^1A ), formula (T ^1B ) or formula (T ^1C );
^T2 is a group represented by the above formula ( ^T2A ), formula ( ^T2B ) or formula ( ^T2C ),
At least one of Rpm ³¹ to Rpm ³⁹ , T ¹ and T ² contains an anionic group.

Examples of the substituents represented by Rpm ¹¹ to Rpm ¹⁵ in formula (PM2), the substituents represented by Rpm ²¹ to Rpm ²⁷ in formula (PM3), and the substituents represented by Rpm ³¹ to Rpm ³⁹ in formula (PM4) include the groups exemplified as the substituent T described later, and anionic groups.

The substituent other than the anionic group is preferably the group given as the preferred examples of the substituent other than the anionic group represented by Rpm ¹ to Rpm ⁵ in the above formula (PM1).

Examples of the anionic group include the group represented by the above formula (AN-1) and the group represented by the formula (AN-2).

In formula (PM2), Rpm ¹² and Rpm ¹⁴ may be bonded to form a ring, Rpm ¹¹ and T ¹ may be bonded to form a ring, and Rpm ¹⁵ and T ² may be bonded to form a ring.
In formula (PM3), Rpm ²³ and Rpm ²⁵ may be bonded to form a ring, Rpm ²¹ and ^T1 may be bonded to form a ring, and Rpm ²⁷ and ^T2 may be bonded to form a ring.
In formula (PM4), Rpm ³⁴ and Rpm ³⁶ may be bonded to form a ring, Rpm ³¹ and ^T1 may be bonded to form a ring, and Rpm ³⁹ and ^T2 may be bonded to form a ring.
The ring formed by bonding the above groups together is preferably a 5-membered or 6-membered ring. The ring formed may have a substituent. Examples of the substituent include the groups listed as the substituent T described below and anionic groups. Examples of the anionic group include the group represented by the above formula (AN-1) and the group represented by the formula (AN-2).

In formula (PM2), at least one of Rpm ¹¹ to Rpm ¹⁵ , T ¹ and T ² contains an anionic group. It is preferable that at least one of T ¹ and T ² contains an anionic group, and it is more preferable that each of T ¹ and T ² contains an anionic group.
In formula (PM2), the total number of anions contained in Rpm ¹¹ to Rpm ¹⁵ , T ¹ and T ² is preferably 2-20, more preferably 2-15, and even more preferably 2-10.
The anion represented by formula (PM2) is preferably a 1- to 19-valent anion, more preferably a 1- to 14-valent anion, and even more preferably a 1- to 9-valent anion.

In formula (PM3), at least one of Rpm ²¹ to Rpm ²⁷ , T ¹ and T ² contains an anionic group. It is preferable that at least one of T ¹ and T ² contains an anionic group, and it is more preferable that each of T ¹ and T ² contains an anionic group.
In formula (PM3), the total number of anions contained in Rpm ²¹ to Rpm ²⁷ , T ¹ and T ² is preferably 2-20, more preferably 2-15, and even more preferably 2-10.
The anion represented by formula (PM3) is preferably a 1- to 19-valent anion, more preferably a 1- to 14-valent anion, and even more preferably a 1- to 9-valent anion.

In formula (PM4), at least one of Rpm ³¹ to Rpm ³⁹ , T ¹ and T ² contains an anionic group. It is preferable that at least one of T ¹ and T ² contains an anionic group, and it is more preferable that each of T ¹ and T ² contains an anionic group.
In formula (PM4), the total number of anions contained in Rpm ³¹ to Rpm ³⁹ , T ¹ and T ² is preferably 2-20, more preferably 2-15, and even more preferably 2-10.
The anion represented by formula (PM4) is preferably a 1- to 19-valent anion, more preferably a 1- to 14-valent anion, and even more preferably a 1- to 9-valent anion.

-Regarding the Substituent T-
Examples of the substituent T include the following groups: a halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heterocyclic group (preferably a heterocyclic group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxy ... an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), a heterocyclic oxycarbonyl group (preferably a heterocyclic oxycarbonyl group having 2 to 30 carbon atoms), an acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), an acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), an aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), a sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), a sulfamoylamino group (preferably represents a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heterocyclic thio group (preferably a heterocyclic thio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heterocyclic sulfonyl group (preferably a heterocyclic sulfonyl group having 1 to 30 carbon atoms), Ring sulfonylamino group (preferably a heterocyclic sulfonylamino group having 1 to 30 carbon atoms), alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), heterocyclic sulfinyl group (preferably a heterocyclic sulfinyl group having 1 to 30 carbon atoms), ureido group (preferably a ureido group having 1 to 30 carbon atoms), hydroxy group, nitro group, carboxy group, sulfo group, phosphoric acid group, carboxylic acid amide group, sulfonic acid amide group, imido group, phosphino group, mercapto group, cyano group, alkylsulfino group, arylsulfino group, arylazo group, heterocyclic azo group, phosphinyl group, phosphinyloxy group, phosphinylamino group, silyl group, hydrazino group, imino group. When these groups are further substitutable groups, they may further have a substituent. Examples of the substituent include the groups described above for the substituent T.

- Specific examples -
Specific examples of the specific compound include compounds having the structures shown below. Resonance structures of these compounds are also specific examples of the specific compound. In the structural formulas shown below, Me is a methyl group, and Ph is a phenyl group. In the specific examples, the number of moles of cations is expressed as a value relative to 1 mole of dye anion, taking into account the respective charges of the dye anion and the cation. For example, A-1 indicates that there is 1 mole of cations for 2 moles of dye anion, and A-3 indicates that there are 3 moles of cations for 2 moles of dye anion.

The maximum absorption wavelength of the specific compound is preferably at least 650 nm, more preferably in the wavelength range of 650 to 1500 nm, even more preferably in the wavelength range of 700 to 1200 nm, and particularly preferably in the wavelength range of 700 to 1000 nm.

The specific compound is preferably used as an infrared absorber.

The content of the specific compound (compound represented by formula (1)) in the total solid content of the composition is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, even more preferably 3 mass% or more, and particularly preferably 5 mass% or more. The upper limit of the content of the infrared absorber is preferably 50 mass% or less, more preferably 40 mass% or less, and even more preferably 30 mass% or less. The composition of the present invention may contain only one type of specific compound, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is in the above range.

<<Curable Compound>>
The composition of the present invention contains a curable compound. Examples of the curable compound include polymerizable compounds and resins. The resin may be a non-polymerizable resin (a resin having no polymerizable group) or a polymerizable resin (a resin having a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group, with the (meth)allyl group, the (meth)acryloyl group, and the (meth)acryloyloxy group being preferred, and the (meth)acryloyloxy group being more preferred. Examples of the cyclic ether group include an epoxy group and an oxetanyl group, with the epoxy group being preferred.

The curable compound preferably contains at least a resin. When the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

(Polymerizable compound)
The polymerizable compound may include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, a compound having an alkoxymethyl group, etc. The compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. In addition, the compound having a cyclic ether group can be preferably used as a cationic polymerizable compound.

Examples of resin-type polymerizable compounds include resins that contain repeating units with polymerizable groups.

The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2,000,000. The upper limit of the weight average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3- to 15-functional (meth)acrylate compound, and more preferably a 3- to 6-functional (meth)acrylate compound. Specific examples include compounds described in paragraphs 0095 to 0108 of JP 2009-288705 A, paragraph 0227 of JP 2013-029760 A, paragraphs 0254 to 0257 of JP 2008-292970 A, paragraphs 0034 to 0038 of JP 2013-253224 A, paragraph 0477 of JP 2012-208494 A, JP 2017-048367 A, Japanese Patent No. 6057891 A, Japanese Patent No. 6031807 A, and Japanese Patent No. 2017-194662 A, the contents of which are incorporated herein by reference.

Examples of compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product is KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product is KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product is KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products are KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and/or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer Corporation). In addition, examples of compounds having an ethylenically unsaturated bond-containing group include diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available product is M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., NK Ester A-TMMT), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.), and light acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.).

In addition, as compounds having an ethylenically unsaturated bond-containing group, it is also preferable to use trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide modified tri(meth)acrylate, isocyanuric acid ethylene oxide modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

The compound having an ethylenically unsaturated bond-containing group may further have an acid group such as a carboxy group, a sulfo group, or a phosphate group. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

As a compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available as a series from Nippon Kayaku Co., Ltd.

As a compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and/or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a trifunctional to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

As a compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorene skeleton can also be used. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

As a compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a compound that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

Examples of compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, and compounds having an epoxy group are preferred. Examples of compounds having an epoxy group include compounds having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

The compound having a cyclic ether group may be a low molecular weight compound (e.g., molecular weight less than 1000) or a high molecular weight compound (macromolecule) (e.g., molecular weight 1000 or more, in the case of a polymer, weight average molecular weight 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

As compounds having a cyclic ether group, the compounds described in JP 2013-011869 A, paragraphs 0034 to 0036, the compounds described in JP 2014-043556 A, paragraphs 0147 to 0156, the compounds described in JP 2014-089408 A, paragraphs 0085 to 0092, and the compounds described in JP 2017-179172 A can also be used.

Commercially available compounds with cyclic ether groups include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC -3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by DAICEL Corporation), CYCLOMER P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z30 0, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), ADEKA GLYCILOR ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), MARPROOF G-0150M, G-0105SA, G-0 Examples include 130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (epoxy group-containing polymers manufactured by NOF Corporation), OXT-101, OXT-121, OXT-212, and OXT-221 (oxetanyl group-containing monomers manufactured by Toagosei Co., Ltd.), and OXE-10 and OXE-30 (oxetanyl group-containing monomers manufactured by Osaka Organic Chemical Industry Co., Ltd.).

Examples of compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs 0134 to 0147 of JP 2004-295116 A and paragraphs 0095 to 0126 of JP 2014-089408 A can also be used.

(resin)
The composition of the present invention can use a resin as a curable compound. It is preferable to use a curable compound that contains at least a resin. The resin is blended, for example, for dispersing pigments in the composition or for use as a binder. In addition, a resin that is mainly used for dispersing pigments in the composition is also called a dispersant. However, such uses of the resin are only examples, and the resin can also be used for purposes other than such uses. In addition, a resin having a polymerizable group also falls under the category of a polymerizable compound.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

The resins include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. One of these resins may be used alone, or two or more may be mixed and used. As the cyclic olefin resin, norbornene resin is preferred from the viewpoint of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, as the resin, there are resins described in paragraphs 0091 to 0099 of WO 2022/065215, blocked polyisocyanate resins described in JP 2016-222891 A, resins described in JP 2020-122052 A, resins described in JP 2020-111656 A, resins described in JP 2020-139021 A, resins having a ring structure in the main chain and a biphenyl group in the side chain described in JP 2017-138503 A, and resins described in paragraphs 0199 to 0233 of JP 2020-186373 A Resins described in the above, alkali-soluble resins described in JP 2020-186325 A, resins represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339 A, copolymers containing epoxy groups and acid groups described in WO 2022/030445 A, resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, alkali-soluble resins described in JP 2020-186325 A, resins represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339 A, and resins described in JP 2021-134350 A can also be used. In addition, resins having a fluorene skeleton can also be preferably used as the resin. Examples of resins having a fluorene skeleton include resins described in U.S. Patent Application Publication No. 2017/0102610 A.

As the resin, it is preferable to use a resin having an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of only one type, or of two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, even more preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

As the resin, it is also preferable to use a resin having a polymerizable group. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol% or more when the total amount of the acid groups and the basic groups is 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. The basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups is greater than the amount of acid groups when the total amount of the acid groups and the basic groups is 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

It is also preferable that the resin used as the dispersant is a graft resin. For details on graft resins, please refer to the description in paragraphs 0025 to 0094 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

The resin used as the dispersant is preferably a polyimine-based dispersant containing nitrogen atoms in at least one of the main chain and side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less, a side chain with 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and side chain. There are no particular restrictions on the basic nitrogen atom, so long as it is a nitrogen atom that exhibits basicity. For details of polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

The resin used as the dispersant is preferably one having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962A.

The resin used as the dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol % or more of the total repeating units of the resin, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %.

As dispersants, resins described in JP 2018-087939 A, block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6,432,077 A, polyethyleneimine having polyester side chains described in WO 2016/104803 A, block copolymers described in WO 2019/125940 A, block polymers having acrylamide structural units described in JP 2020-066687 A, block polymers having acrylamide structural units described in JP 2020-066688 A, and the like can also be used.

Dispersants are also available as commercially available products, and specific examples include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Nippon, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP2012-137564A and the products described in paragraph 0235 of JP2017-194662A can also be used as dispersants.

The content of the curable compound in the total solid content of the composition is preferably 1 to 95 mass%. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, even more preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 94 mass% or less, more preferably 90 mass% or less, even more preferably 85 mass% or less, and particularly preferably 80 mass% or less.

When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 85 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, and more preferably 70 mass% or less.

When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 50 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 30 mass% or less, and more preferably 20 mass% or less.

When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 70 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 65 mass% or less, and more preferably 60 mass% or less.

When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 70 mass% or less, and even more preferably 60 mass% or less.

When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85 mass%. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, even more preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 75 mass% or less, even more preferably 70 mass% or less, and particularly preferably 40 mass% or less.

When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the composition is preferably 0.1 to 40 mass%. The upper limit is preferably 25 mass% or less, and more preferably 20 mass% or less. The lower limit is preferably 0.5 mass% or more, and more preferably 1 mass% or more. The content of the resin as a dispersant is preferably 1 to 100 mass parts per 100 mass parts of pigment. The upper limit is preferably 80 mass parts or less, and more preferably 75 mass parts or less. The lower limit is preferably 2.5 mass parts or more, and more preferably 5 mass parts or more.

The composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more types of curable compounds are contained, it is preferable that the total amount thereof is within the above range.

<<Solvent>>
The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, and organic solvents are preferred. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details, refer to paragraph 0223 of International Publication No. 2015/166779, the contents of which are incorporated herein by reference. In addition, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol dimethyl ether, butyl acetate ... Examples of the diacetate include ethylene glycol monomethyl ether acetate, 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol and 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol. However, there are cases where it is better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons, etc. (for example, the amount can be 50 ppm (parts per million) by mass or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

In the present invention, it is preferable to use an organic solvent with a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per billion) or less. If necessary, an organic solvent with a mass ppt (parts per trillion) level may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The filter used for filtration preferably has a pore size of 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

The organic solvent may contain isomers (compounds with the same number of atoms but different structures). In addition, the organic solvent may contain only one type of isomer, or multiple types of isomers.

The peroxide content in the organic solvent is preferably 0.8 mmol/L or less, and more preferably substantially free of peroxide.

The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, even more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Other infrared absorbing agents>>
The composition of the present invention may contain an infrared absorbing agent (another infrared absorbing agent) other than the above-mentioned specific compound. By further containing another infrared absorbing agent, a film capable of shielding infrared rays in a wider wavelength range can be formed. The other infrared absorbing agent may be a dye or a pigment (particle). Examples of the other infrared absorbing agent include pyrrolopyrrole compounds, polymethine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, etc., and it is preferable that the other infrared absorbing agent is at least one selected from squarylium compounds and phthalocyanine compounds.

Examples of pyrrolopyrrole compounds include compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614, compounds described in paragraphs 0037 to 0052 of JP-A-2011-068731, and compounds described in paragraphs 0010 to 0033 of WO 2015/166873. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP-A-2011-208101, compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, compounds described in paragraphs 0040 of WO 2016/181987, compounds described in JP-A-2015-176046, and compounds described in paragraph 0072 of WO 2016/190162. Compounds, compounds described in paragraphs 0196 to 0228 of JP-A-2016-074649, compounds described in paragraph 0124 of JP-A-2017-067963, compounds described in WO 2017/135359, compounds described in JP-A-2017-114956, compounds described in Japanese Patent No. 6197940, compounds described in WO 2016/120166, and the like. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP-A-2009-108267, compounds described in paragraphs 0026 to 0030 of JP-A-2002-194040, compounds described in JP-A-2015-172004, compounds described in JP-A-2015-172102, compounds described in JP-A-2008-088426, compounds described in paragraph 0090 of WO 2016/190162, compounds described in JP-A-2017-031394, compounds described in JP-A-2021-134350, compounds described in WO 2021/085372, and the like. Examples of croconium compounds include compounds described in JP-A-2017-082029. Examples of the iminium compound include compounds described in JP-T-2008-528706, compounds described in JP-A-2012-012399, compounds described in JP-A-2007-092060, and compounds described in paragraphs 0048 to 0063 of WO 2018/043564. Examples of the phthalocyanine compound include compounds described in paragraph 0093 of JP-A-2012-077153, oxytitanium phthalocyanine described in JP-A-2006-343631, compounds described in paragraphs 0013 to 0029 of JP-A-2013-195480, vanadium phthalocyanine compounds described in Japanese Patent No. 6081771, and compounds described in WO 2020/071470. Examples of the naphthalocyanine compound include the compounds described in paragraph 0093 of JP 2012-077153 A. Examples of the dithiolene metal complex include the compounds described in Japanese Patent No. 5733804 A. Examples of the metal oxide include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details of tungsten oxide, refer to paragraph 0080 of JP 2016-006476 A, the contents of which are incorporated herein by reference. Examples of the metal boride include lanthanum boride. Examples of commercially available lanthanum boride include LaB ₆ -F (manufactured by Japan New Metals Co., Ltd.). In addition, compounds described in WO 2017/119394 A can also be used as the metal boride. An example of a commercially available indium tin oxide product is F-ITO (manufactured by Dowa Hightec Co., Ltd.).

As infrared absorbents, squarylium compounds described in JP 2017-197437 A, squarylium compounds described in JP 2017-025311 A, squarylium compounds described in WO 2016/154782 A, squarylium compounds described in Japanese Patent No. 5884953 A, squarylium compounds described in Japanese Patent No. 6036689 A, squarylium compounds described in Japanese Patent No. 5810604 A, squarylium compounds described in paragraphs 0090 to 0107 of WO 2017/213047 A, pyrrole ring-containing compounds described in paragraphs 0019 to 0075 of JP 2018-054760 A, pyrrole ring-containing compounds described in paragraphs 0078 to 0082 of JP 2018-040955 A, and squarylium compounds described in paragraphs 002773 to 0030 of JP 2018-002773 A are examples of the squarylium compounds described in WO 2017/213047 A. Pyrrole ring-containing compounds described in JP 2018-041047 A, squarylium compounds having an aromatic ring at the amide α-position described in paragraphs 0024 to 0086, amide-linked squarylium compounds described in JP 2017-179131 A, compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP 2017-141215 A, dihydrocarbazole bis-type squarylium compounds described in JP 2017-082029 A, asymmetric compounds described in paragraphs 0027 to 0114 of JP 2017-068120 A, pyrrole ring-containing compounds (carbazole type) described in JP 2017-067963 A, and phthalocyanine compounds described in Japanese Patent No. 6251530 can also be used.

As another infrared absorbing agent, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used.
M ¹ _a M ² _b W _c O _d (P (O) _n R _m ) _e
M ¹ and M ² each represent an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

The content of the other infrared absorbent is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass, relative to 100 parts by mass of the specific compound.
The total content of the specific compound and the other infrared absorbing agent is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more, based on the total solid content of the composition. The upper limit of the total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.

<<Pigment derivatives>>
The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material for enhancing the dispersibility of a pigment in a composition.

Pigment derivatives include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

The above dye structures include squarylium dye structures, pyrrolopyrrole dye structures, diketopyrrolopyrrole dye structures, quinacridone dye structures, anthraquinone dye structures, dianthraquinone dye structures, benzoisoindole dye structures, thiazine indigo dye structures, azo dye structures, quinophthalone dye structures, phthalocyanine dye structures, naphthalocyanine dye structures, dioxazine dye structures, perylene dye structures, perinone dye structures, benzimidazolone dye structures, benzothiazole dye structures, benzimidazole dye structures, and benzoxazole dye structures. Squarylium dye structures, pyrrolopyrrole dye structures, diketopyrrolopyrrole dye structures, phthalocyanine dye structures, quinacridone dye structures, and benzimidazolone dye structures are preferred, and squarylium dye structures and pyrrolopyrrole dye structures are more preferred.

Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imide acid group, and salts thereof. Examples of atoms or atomic groups constituting the salt include an alkali metal ion (Li ⁺ , Na ⁺ , K ⁺ , etc.), an alkaline earth metal ion (Ca ²⁺ , Mg ²⁺ , etc.), an ammonium ion, an imidazolium ion, a pyridinium ion, and a phosphonium ion. A preferred example of the carboxylic acid amide group is a group represented by -NHCOR ^X1 . A preferred example of the sulfonic acid amide group is a group represented by -NHSO ₂ R ^X2 . A preferred example of the imide acid group is a group represented by -SO ₂ NHSO ₂ R ^X3 , -CONHSO ₂ R ^X4 , -CONHCOR ^X5 , or -SO ₂ NHCOR ^X6 , and -SO ₂ NHSO ₂ R ^X3 is more preferred. R ^x1 to R ^x6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^x1 to R ^x6 may have a substituent. The substituent is preferably a halogen atom, and more preferably a fluorine atom.

Basic groups contained in pigment derivatives include amino groups, pyridinyl groups and their salts, salts of ammonium groups, and phthalimidomethyl groups. Atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

Specific examples of pigment derivatives include the compounds described in paragraphs 0037 to 0054 of WO 2016/035695, the compounds described in paragraphs 0061 to 0086 of WO 2017/146092, the compounds described in paragraphs 0017 to 0068 of WO 2018/230387, the compounds described in paragraphs 0085 to 0099 of WO 2020/054718, the compounds described in paragraph 0099 of WO 2020/054718, the compounds described in paragraph 0124 of WO 2022/085485, the benzimidazolone compounds or salts thereof described in JP 2018-168244 A, and the compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6,996,282.

The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

<<Photopolymerization initiator>>
When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator.The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators.For example, a compound having photosensitivity to light rays in the ultraviolet range to the visible range is preferable.The photopolymerization initiator is preferably a photoradical polymerization initiator.

Photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound. In addition, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, and the compounds described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, photopolymerization initiators described in WO 2018/221177, photopolymerization initiators described in WO 2018/110179, photopolymerization initiators described in JP 2019-043864 A, photopolymerization initiators described in JP 2019-044030 A, peroxide-based initiators described in JP 2019-167313 A, aminoacetophenone-based initiators having an oxazolidine group described in JP 2020-055992 A, oxime-based photopolymerization initiators described in JP 2013-190459 A, polymerization initiators described in JP 2020-172619 A Examples of the compound include compounds represented by formula 1 described in WO 2020/152120, compounds described in JP 2021-181406 A, photopolymerization initiators described in JP 2022-013379 A, compounds represented by formula (1) described in JP 2022-015747 A, fluorine-containing fluorene oxime ester photoinitiators described in JP 2021-507058 A, initiators described in China Patent Application Publication No. 110764367, initiators described in JP 2022-518535 A, and initiators described in WO 2021/175855, the contents of which are incorporated herein by reference.

Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (all manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

Examples of oxime compounds include the compound described in paragraph 0142 of WO 2022/085485, the compound described in Japanese Patent No. 5,430,746, the compound described in Japanese Patent No. 5,647,738, the compound represented by general formula (1) and the compounds described in paragraphs 0022 to 0024 of JP 2021-173858 A, the compound represented by general formula (1) and the compounds described in paragraphs 0117 to 0120 of JP 2021-170089 A, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use a compound that is not colorable or a compound that is highly transparent and does not easily discolor as the oxime compound. Commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022/085485 can also be used.

Specific examples of oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited to these.

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. From the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1000 to 300,000, even more preferably 2000 to 300,000, and particularly preferably 5000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferable to measure using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g/L using ethyl acetate as a solvent.

As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, and improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022/065215.

The content of the photopolymerization initiator is preferably 0.1 to 40 mass% of the total solid content of the composition, more preferably 0.5 to 35 mass%, and even more preferably 1 to 30 mass%. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Curing agent>>
When the composition of the present invention contains a compound having a cyclic ether group, it is preferable that the composition further contains a curing agent. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis (3-mercaptopropionate). The curing agent may be a compound described in paragraphs 0072 to 0078 of JP-A-2016-075720 or a compound described in JP-A-2017-036379. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, relative to 100 parts by mass of the compound having a cyclic ether group.

<<Chromatic colorants>>
The composition of the present invention may contain a chromatic colorant. Examples of the chromatic colorant include a red colorant, a green colorant, a blue colorant, a yellow colorant, a purple colorant, and an orange colorant. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. As the pigment, a material in which an inorganic pigment or an organic-inorganic pigment is partially substituted with an organic chromophore may also be used. By substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore, it is possible to easily design the hue.

The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, the primary particles of the pigment refer to independent particles that are not aggregated.

The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments include the following.

Color Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 13 8, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine type), 233 (quinoline type), 234 (aminoketone type), 235 (aminoketone type), 236 (aminoketone type) etc. (all yellow pigments),
C.I. Pigment Orange 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73, etc. (orange pigments)
C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 52: 1, 52: 2, 53: 1, 57: 1, 60: 1, 63: 1, 66, 67, 81: 1, 81: 2, 81: 3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthene type, Organo Ultramarine, Bluish Red), 295 (monoazo type), 296 (diazo type), 297 (aminoketone type) and the like (all red pigments),
C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type) etc. (all green pigments),
C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type) etc. (all purple pigments),
C. I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can also be used. Specific examples include the compounds described in WO 2015/118720. In addition, as a green colorant, a compound described in paragraph 0029 of WO 2022/085485, an aluminum phthalocyanine compound described in JP 2020-070426 A, a diarylmethane compound described in JP 2020-504758 A, and the like can also be used.

Aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

As yellow colorants, the compounds described in paragraphs 0031 to 0033 of WO 2022/085485, the methine dyes described in JP 2019-073695 A, and the methine dyes described in JP 2019-073696 A can be used.

As a red colorant, the compound described in paragraph 0034 of WO 2022/085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. For example, pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, pyrromethene dyes, and the like can be mentioned. In addition, the thiazole compounds described in JP-A-2012-158649, the azo compounds described in JP-A-2011-184493, and the azo compounds described in JP-A-2011-145540 can also be used as dyes.

As chromatic colorants, there are used triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Publication No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020/174991, isoindoline compounds or salts thereof described in Japanese Patent Publication No. 2020-160279, and compounds of formula 1 described in Korean Patent Publication No. 10-2020-0069442. A compound represented by the formula 1 described in Korean Patent Publication No. 10-2020-0069730, a compound represented by the formula 1 described in Korean Patent Publication No. 10-2020-0069070, a compound represented by the formula 1 described in Korean Patent Publication No. 10-2020-0069067, a compound represented by the formula 1 described in Korean Patent Publication No. 10-2020-0069062, a halogenated compound described in Japanese Patent No. 6809649 Zinc phthalocyanine pigments, isoindoline compounds described in JP 2020-180176 A, phenothiazine compounds described in JP 2021-187913 A, halogenated zinc phthalocyanines described in WO 2022/004261 A, halogenated zinc phthalocyanines described in WO 2021/250883 A, quinophthalone compounds represented by formula 1 in Korean Patent Publication No. 10-2020-0030759 A , polymer dyes described in Korean Patent Publication No. 10-2020-0061793, colorants described in JP 2022-029701, isoindoline compounds described in WO 2022/014635, aluminum phthalocyanine compounds described in WO 2022/024926, compounds described in JP 2022-045895, and compounds described in WO 2022/050051 can also be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, may be used in the rod-shaped structure, or may be used in both structures.

When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention is substantially free of chromatic colorants. Note that when the composition of the present invention is substantially free of chromatic colorants, this means that the content of chromatic colorants in the total solid content of the composition is 0.5% by mass or less, preferably 0.1% by mass or less, and more preferably free of chromatic colorants.

<<Coloring material that transmits infrared rays but blocks visible light>>
The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter, also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

The coloring material that blocks visible light is preferably a coloring material that absorbs light in the purple to red wavelength region. Also, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Also, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
(A): Two or more types of chromatic colorants are included, and black is formed by a combination of two or more types of chromatic colorants.
(B): Contains an organic black colorant.

Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-T-2010-534726, JP-T-2012-515233, and JP-T-2012-515234, and are available as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of azomethine compounds include those described in JP-A-01-170601 and JP-A-02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichi Seika Chemicals Co., Ltd.

When black is formed by combining two or more chromatic colorants, the combination of chromatic colorants may be, for example, the following embodiments (1) to (8).
(1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant.
(2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant.
(3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant.
(4) An embodiment containing a yellow colorant and a purple colorant.
(5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant.
(6) An embodiment containing a purple colorant and an orange colorant.
(7) An embodiment containing a green colorant, a purple colorant, and a red colorant.
(8) An embodiment containing a green colorant and a red colorant.

When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass%. The lower limit is preferably 5 mass% or more, more preferably 10 mass% or more, even more preferably 20 mass% or more, and particularly preferably 30 mass% or more.

When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention does not substantially contain a coloring material that blocks visible light. Note that when the composition of the present invention does not substantially contain a coloring material that blocks visible light, this means that the content of the coloring material that blocks visible light in the total solid content of the composition is 0.5 mass % or less, preferably 0.1 mass % or less, and it is more preferable that the composition does not contain a coloring material that blocks visible light.

<<Surfactants>>
The composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015/166779, the contents of which are incorporated herein by reference.

As fluorosurfactants, the compounds described in paragraphs 0167 to 0173 of WO 2022/085485 can be used.

Nonionic surfactants include the compounds described in paragraph 0174 of WO 2022/085485.

Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie), etc. As the silicone surfactant, a compound having the following structure can also be used.

The content of the surfactant in the total solid content of the composition is preferably 0.001 to 1 mass%, more preferably 0.001 to 0.5 mass%, and even more preferably 0.001 to 0.2 mass%. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Polymerization inhibitor>>
The composition of the present invention may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Silane coupling agents>>
The composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, and an alkoxy group is preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, and an (meth)acryloyl group and an epoxy group are preferred. Examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP-A-2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP-A-2009-242604. The content of the silane coupling agent in the total solid content of the composition is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, the total amount thereof is preferably within the above range.

<<Ultraviolet absorbing agent>>
The composition of the present invention may contain an ultraviolet absorbing agent, such as a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or a dibenzoyl compound. Specific examples of such compounds include the compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, 0052 to 0072 of JP 2012-208374 A, 0317 to 0334 of JP 2013-068814 A, 0061 to 0080 of JP 2016-162946 A, 0052 and 0074 of WO 2021/131355 A, and 0022 to 0024 of WO 2021/132247 A, the contents of which are incorporated herein. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF Corporation. In addition, examples of the benzotriazole compound include the MYUA series manufactured by Miyoshi Oil & Fat (The Chemical Daily, February 1, 2016). As the ultraviolet absorber, the compounds described in the examples described later, the compounds described in paragraphs 0049-0059 of Japanese Patent No. 6268967, and paragraphs 0059-0076 of International Publication No. 2016/181987 can also be used. The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Antioxidants>>
The composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenol-based antioxidants, amine-based antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of the phenol-based antioxidant include hindered phenol compounds. The phenol-based antioxidant is preferably a compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxy group. The aforementioned substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, ADK STAB HP-10 (all manufactured by ADEKA CORPORATION), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. WO 2017/006600, a compound described in International Publication No. WO 2017/164024, or a compound described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass. The composition may contain only one type of antioxidant, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Other ingredients>>
The composition of the present invention may contain, as necessary, a sensitizer, a filler, a heat curing accelerator, a plasticizer, and other auxiliaries (e.g., conductive particles, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension regulators, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film properties can be adjusted. As these components, the compounds described in paragraph 0182 of WO 2022/085485 can be used.

<Containment container>
The container for storing the composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022/085485 can be used as the container.

<Method of preparing the composition>
The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all the components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the components are appropriately mixed may be prepared in advance, and these may be mixed at the time of use (at the time of application) to prepare the composition.

The preparation of the composition may include a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. In addition, when grinding pigments in a sand mill (bead mill), it is preferable to use beads with a small diameter and increase the bead packing rate to perform processing under conditions that increase the grinding efficiency. In addition, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the grinding process. In addition, the process and dispersing machine for dispersing the pigment may be suitably used as described in "Dispersion Technology Encyclopedia, published by Information Technology Co., Ltd., July 15, 2005" or "Dispersion Technology and Industrial Application Practice Focusing on Suspension (Solid/Liquid Dispersion System) - Comprehensive Data Collection, published by Management Development Center Publishing Department, October 10, 1978", and in paragraph number 0022 of JP 2015-157893 A. In addition, in the process for dispersing the pigment, the pigment may be subjected to a fine treatment in a salt milling process. For the materials, equipment, processing conditions, etc. used in the salt milling process, the descriptions in, for example, JP 2015-194521 A and JP 2012-046629 A may be referred to. Examples of materials for the beads used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of inorganic compounds with a Mohs hardness of 2 or more. The composition may contain 1 to 10,000 ppm of the above beads.

When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter and reducing defects. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022/085485.

<Membrane>
Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples thereof include an infrared cut filter and an infrared transmission filter. Examples of infrared cut filters include an infrared cut filter on the light receiving side of a solid-state imaging element (for example, an infrared cut filter for a wafer level lens), an infrared cut filter on the back side (opposite to the light receiving side) of a solid-state imaging element, and an infrared cut filter for an environmental light sensor (for example, an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, and a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light receiving side of a solid-state imaging element. Examples of infrared transmission filters include a filter that can block visible light and selectively transmit infrared rays of a specific wavelength or more.

The film of the present invention may have a pattern, or may be a film without a pattern (flat film). The film of the present invention may be laminated on a support, or may be peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates, and transparent substrates.

A charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, etc. may be formed on the semiconductor substrate used as a support. A black matrix that isolates each pixel may also be formed on the semiconductor substrate. If necessary, an undercoat layer may be provided on the semiconductor substrate to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the substrate surface.

The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. For example, substrates made of materials such as glass and resin can be used. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, norbornene resin, acrylic resins such as polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda lime glass, borosilicate glass, alkali-free glass, quartz glass, and glass containing copper. Examples of glass containing copper include phosphate glass containing copper and fluorophosphate glass containing copper. Commercially available glass containing copper can also be used. Commercially available glass containing copper includes NF-50 (manufactured by AGC Technoglass Co., Ltd.).

The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

When the film of the present invention is used as an infrared cut filter, it is preferred that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm).
Furthermore, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less.
The average transmittance in the wavelength range of 420 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more.
In addition, the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably a wavelength range of 660 to 1200 nm, more preferably a wavelength range of 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less.
Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 420 to 550 nm is preferably less than 0.030, and more preferably less than 0.025.

When the film of the present invention is used as an infrared transmission filter, the film of the present invention preferably has, for example, any one of the following spectral characteristics (i1) to (i3).
(i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength of more than 950 nm.
(i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength of more than 1050 nm.
(i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength of more than 1150 nm.

The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be manufactured using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that a color filter is arranged on the optical path of the film of the present invention. For example, it is preferable to use the film of the present invention and a color filter as a laminate by laminating them. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs (complementary metal-oxide semiconductors), infrared sensors, and image display devices.

<Membrane manufacturing method>
The film of the present invention can be produced through a process of applying the composition of the present invention.

The support may be any of those mentioned above. A known method such as spin coating may be used as a method for applying the composition. For example, the application method described in paragraph 0207 of WO 2022/085485 may be used.

The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or less, more preferably 120°C or less, and even more preferably 110°C or less. The lower limit can be, for example, 50°C or more, and can also be 80°C or more. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, oven, etc.

The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferred. When the film of the present invention is used as a flat film, the pattern forming step does not need to be performed. The pattern forming step will be described in detail below.

(When forming a pattern by photolithography)
The pattern forming method by photolithography preferably includes a step of exposing the composition layer formed by applying the composition of the present invention to light in a pattern (exposure step), and a step of developing and removing the composition layer in the unexposed area to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

In the exposure process, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine or a scanner exposure machine to expose the layer through a mask having a specific mask pattern. This allows the exposed parts to harden.

Radiation (light) that can be used for exposure includes g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wavelength light sources of 300 nm or more can also be used.

In addition, during exposure, light may be applied continuously or in pulses (pulse exposure). Pulse exposure is an exposure method in which light is applied and paused repeatedly in short cycles (e.g., milliseconds or less).

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , more preferably 0.05 to 1.0 J/cm ^2. The oxygen concentration during exposure can be appropriately selected, and in addition to being performed under air, exposure may be performed under a low-oxygen atmosphere with an oxygen concentration of 19 volume% or less (e.g., 15 volume%, 5 volume%, or substantially oxygen-free), or under a high-oxygen atmosphere with an oxygen concentration of more than 21 volume% (e.g., 22 volume%, 30 volume%, or 50 volume%). The exposure illuminance can be appropriately set, and can usually be selected from the range of 1000 W/m ² to 100,000 W/m ² (e.g., 5,000 W/m ² , 15,000 W/m ² , or 35,000 W/m ² ). The oxygen concentration and exposure illuminance may be appropriately combined. For example, the oxygen concentration can be 10% by volume and the illuminance can be 10,000 W/m ² , and the oxygen concentration can be 35% by volume and the illuminance can be 20,000 W/m ² .

Next, the composition layer in the unexposed parts of the composition layer after exposure is developed and removed to form a pattern. The composition layer in the unexposed parts can be developed and removed using a developer. As a result, the composition layer in the unexposed parts in the exposure process dissolves into the developer, and only the photocured parts remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, in order to improve the removability of residues, the process of shaking off the developer every 60 seconds and then supplying new developer may be repeated several times.

The developer may be an organic solvent or an alkaline developer, with an alkaline developer being preferred. The developer and the washing (rinsing) method after development may be as described in paragraph 0214 of WO 2022/085485.

After development and drying, it is preferable to perform additional exposure processing or heating processing (post-baking). Additional exposure processing and post-baking are curing processing after development to complete curing. The heating temperature in post-baking is preferably, for example, 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater to heat the developed film to the above conditions. When additional exposure processing is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. In addition, additional exposure processing may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

(When forming a pattern by dry etching)
The pattern formation by the dry etching method can be performed by a method in which the composition layer formed by applying the composition on a support is cured to form a cured layer, a patterned photoresist layer is formed on the cured layer, and then the patterned photoresist layer is used as a mask to dry etch the cured layer using an etching gas. In forming the photoresist layer, it is preferable to perform a pre-bake treatment. For the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents thereof are incorporated herein.

<Optical filter>
The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

The optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc., in addition to the above-mentioned film of the present invention. Examples of the ultraviolet absorbing layer include the absorbing layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. Examples of the dielectric multilayer film include the dielectric multilayer film described in paragraphs 0255 to 0259 of JP 2014-041318 A. Examples of the copper-containing layer include a glass substrate (copper-containing glass substrate) made of glass containing copper, and a layer containing a copper complex (copper complex-containing layer). Examples of the copper-containing glass substrate include copper-containing phosphate glass and copper-containing fluorophosphate glass. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott Co., Ltd.), CD5000 (manufactured by HOYA Co., Ltd.), etc.

<Solid-state imaging element>
The solid-state imaging device of the present invention has the above-mentioned film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

The solid-state imaging device has a support on which a plurality of photodiodes constituting the light receiving area of the solid-state imaging element and a transfer electrode made of polysilicon or the like are disposed, a light shielding film made of tungsten or the like with only the light receiving portion of the photodiode opened on the photodiode and the transfer electrode, a device protection film made of silicon nitride or the like formed on the light shielding film so as to cover the entire light shielding film and the light receiving portion of the photodiode, and a film of the present invention on the device protection film. Furthermore, the device protection film may have a light collecting means (e.g., a microlens, etc., the same below) on the device protection film and below the film of the present invention (on the side closer to the support), or a light collecting means on the film of the present invention. The color filter may have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a lattice shape by partition walls. In this case, it is preferable that the partition walls have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in JP 2012-227478 A and JP 2014-179577 A.

<Image display device>
The image display device of the present invention has the film of the present invention. Examples of the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device. The definition and details of the image display device are described in, for example, "Electronic Display Device (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990)" and "Display Device (written by Junsho Ibuki, published by Sangyo Tosho Co., Ltd. in 1989)". The liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device may have a white organic EL element. The white organic EL element is preferably a tandem structure. The tandem structure of the organic EL element is described in, for example, JP 2003-045676 A and Akiyoshi Mikami (ed.), "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, Know-How Collection", Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). More preferably, the spectrum has a maximum emission peak in the red region (650-700 nm) in addition to these emission peaks.

<Infrared sensor>
The infrared sensor of the present invention has the above-mentioned film of the present invention. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

In FIG. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on the imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter in which pixels that transmit and absorb light of specific wavelengths in the visible range are formed, and is not particularly limited, and a conventionally known color filter for forming pixels can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification can be incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

In the infrared sensor shown in FIG. 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and/or a dielectric multilayer film. Details of these are as described above. Also, a dual bandpass filter may be used as the other infrared cut filter.

<Camera module>
The camera module of the present invention has the above-mentioned film of the present invention. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, the camera module may have a configuration having a solid-state image sensor, a lens, and a circuit for processing an image obtained from the solid-state image sensor. The lens used in the camera module and the circuit for processing an image obtained from the solid-state image sensor may be a known one. As examples of the camera module, the camera modules described in JP 2016-006476 A and JP 2014-197190 A can be referred to, and the contents of these are incorporated herein.

The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, processing contents, processing procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. In the structural formula shown below, Me is a methyl group, and Et is an ethyl group.

<Synthesis Example>
Synthesis Example 1 Synthesis of Compound A-1 Compound A-1 was synthesized according to the following scheme.

In a flask, 5.0 g of compound a-1 synthesized with reference to the method described in WO 2019/067180, 2.4 g of compound b-1, and 27.3 g of isopropanol were added, and the mixture was stirred at 20 ° C. for 10 minutes, and then 5.2 g of acetic anhydride and 3.5 g of triethylamine were added and stirred at 20 ° C. for 4 hours. 3.7 g of magnesium acetate tetrahydrate, 3.9 g of water, and 6.7 g of methanol were added to the obtained reaction solution. The crystals precipitated in the reaction solution were filtered to obtain 4.4 g of compound A-1.
The MS spectrum (Posi) of the obtained compound A-1 was 649.2 (M-1/2Mg+2H).
Compound A-1 was decomposed by wet ashing using UltraWAVE (Milestone General) under the condition of adding 70% nitric acid, and the decomposition product was measured using an ICP (inductively coupled plasma) mass spectrometer (Agilent Technologies, Agilent 7700s). The magnesium content of compound A-1 was quantified by the absolute calibration curve method.
Since the theoretical value of the magnesium content contained in compound A-1 and the measured value of the magnesium content obtained by an ICP mass spectrometer were in agreement, it was confirmed that the counter cation of compound A-1 was magnesium.

Synthesis Example 2 Synthesis of Compound A-5 Compound A-5 was synthesized in the same manner as in Synthesis Example 1, except that compound a-5 was used instead of compound a-1, compound b-5 was used instead of compound b-1, and barium acetate was used instead of magnesium acetate tetrahydrate.
The MS spectrum (Posi) of the obtained compound A-5 was 891.3 (M-1/2Ba+2H).
The barium content of the obtained compound A-5 was quantified in the same manner as for compound A-1. As a result, the theoretical value of the barium content contained in compound A-5 and the measured value of the barium content obtained by an ICP mass spectrometer were in good agreement, confirming that the counter cation of compound A-5 was barium.

Synthesis Example 3 Synthesis of Compound A-11 Compound A-11 was synthesized in the same manner as in Synthesis Example 1, except that compound a-11 was used instead of compound a-1 and compound b-1 was used instead of compound b-1.
The MS spectrum (Posi) of the obtained compound A-11 was 765.2 (M-1/2Mg+2H).
The magnesium content of the obtained compound A-11 was quantified in the same manner as for compound A-1. As a result, the theoretical value of the magnesium content contained in compound A-11 and the measured value of the magnesium content obtained by an ICP mass spectrometer were in good agreement, confirming that the counter cation of compound A-11 was magnesium.

Synthesis Example 4 Synthesis of Compound A-15 Compound A-15 was synthesized in the same manner as in Synthesis Example 1, except that compound a-15 was used instead of compound a-1 and compound b-1 was used instead of compound b-1.
The MS spectrum (Posi) of the obtained compound A-15 was 1023.1 (M-3/2Mg+4H).
The magnesium content of the obtained compound A-15 was quantified in the same manner as for compound A-1. As a result, the theoretical value of the magnesium content contained in compound A-15 and the measured value of the magnesium content obtained by an ICP mass spectrometer were in good agreement, confirming that the counter cation of compound A-15 was magnesium.

Synthesis Example 5 Synthesis of Compound A-18 Compound A-18 was synthesized in the same manner as in Synthesis Example 1, except that compound c-18 was used instead of magnesium acetate tetrahydrate.
The MS spectrum (Posi) of the obtained compound A-18 was 649.2 (M-4C-11H-N+2H).
In addition, as a result of measuring ^{the 1} H NMR (d6DMSO) of the obtained compound A-18, it was confirmed that the molar ratio of the cationic moiety to the anionic moiety of compound A-18 was 1:2, and therefore it was confirmed that the counter cation of compound A-18 was the counter cation having the indicated structure.

<Preparation of Dispersion>
The infrared absorbing agent, pigment derivative, dispersing resin, and solvent of the types shown in the table below were mixed in the parts by mass shown in the table below, and 117 parts by mass of zirconia beads having a diameter of 0.3 mm were further added, and a dispersion liquid was produced by dispersing for 5 hours using a paint shaker, and the beads were separated by filtration. Note that the infrared absorbing agent used had been subjected to a kneading and grinding treatment under the following conditions.

(Kneading and polishing treatment conditions)
10.6 parts by mass of infrared absorber, 149.4 parts by mass of grinding agent and 28 parts by mass of binder were added to a Labo Plastomill (manufactured by Toyo Seiki Seisakusho Co., Ltd.), and the temperature of the kneaded material in the device was controlled to 70° C., and kneaded for 2 hours. Neutral anhydrous Glauber's salt E (average particle size (volume-based 50% diameter (D50)) = 20 μm, manufactured by Mitajiri Chemical Industry Co., Ltd.) was used as the grinding agent, and diethylene glycol was used as the binder. After kneading and polishing, the kneaded material was washed with 20 L of water at 24° C. to remove the grinding agent and binder, and then treated in a heating oven at 80° C. for 24 hours.

(Infrared absorber)
A-1 to A-29: Compounds A-1 to A-29 listed as specific examples of the compound represented by formula (1) (specific compound)

(Dispersion Resin)
D-1: Resin having the following structure (acid value = 99.1 mg KOH/g, weight average molecular weight = 38,000). The numbers attached to the main chain indicate the molar ratio of the repeating unit, and the numbers attached to the side chain indicate the number of repeating units.
D-2: Resin having the following structure (acid value = 87.0 mg KOH/g, weight average molecular weight = 18,000). The numbers attached to the main chain indicate the molar ratio of the repeating unit, and the numbers attached to the side chain indicate the number of repeating units.
D-3: Resin having the following structure (acid value = 85.0 mg KOH/g, weight average molecular weight = 22000). The numbers attached to the main chain indicate the molar ratio of the repeating unit, and the numbers attached to the side chain indicate the number of repeating units.
D-4: Resin having the following structure (acid value = 43 mg KOH/g, weight average molecular weight = 9000). The numbers added to the side chains indicate the molar ratio of the repeating units.
D-5: Block type resin having the following structure (amine value = 90 mg KOH/g, quaternary ammonium salt value = 30 mg KOH/g, weight average molecular weight = 9800). The values added to the main chain indicate the molar ratio of the repeating unit.
D-6: Resin having the following structure (acid value = 32.3 mg KOH/g, amine value = 45.0 mg KOH/g, weight average molecular weight = 22900). The numbers attached to the main chain indicate the molar ratio of the repeating unit, and the numbers attached to the side chain indicate the number of repeating units.

(solvent)
S-1: Propylene glycol monomethyl ether acetate (PGMEA)

<Production of Composition>
(Examples 1 to 62, Comparative Example 1)
The components shown in the table below were mixed in the parts by weight shown in the table below to prepare compositions.

(Examples 101 to 149, Comparative Example 101)
The materials were mixed in the ratios shown below to prepare a composition.
(Prescription)
Infrared absorber listed in the table below ... parts by weight listed in the table Epoxy compound listed in the table below ... 9.3 parts by weight Curing agent listed in the table below (if specified in the table) ... 1.6 parts by weight Surfactant listed in the table below ... 0.01 parts by weight Antioxidant listed in the table below ... 2.0 parts by weight Solvent listed in the table below ... parts by weight listed in the table

(Examples 201 to 249, Comparative Example 201)
The materials were mixed in the ratios shown below to prepare compositions.
(Prescription)
Infrared absorber listed in the table below ... parts by weight listed in the table Epoxy compound listed in the table below ... 9.3 parts by weight Ultraviolet absorber listed in the table below (if listed in the table) ... 1.6 parts by weight Surfactant listed in the table below ... 0.01 parts by weight Antioxidant listed in the table below ... 2.0 parts by weight Solvent listed in the table below ... parts by weight listed in the table

(Examples 301 to 349, Comparative Example 301)
The materials were mixed in the ratios shown below to prepare compositions.
(Prescription)
Infrared absorbing agent shown in the table below ... parts by weight shown in the table Resin shown in the table below ... 10.9 parts by weight Antioxidant shown in the table below ... 2.0 parts by weight Solvent shown in the table below ... parts by weight shown in the table

Details of the materials indicated by the abbreviations in the table are as follows:

(Dispersion liquid, infrared absorber)
Dispersions 1 to 29: Dispersions 1 to 29 described above
D-Pc-1 to D-Pc-3: Compounds having the following structures (phthalocyanine compounds, infrared absorbers)
D-SQ-1 to D-SQ-4: Compounds having the following structures (squarylium compounds, infrared absorbers)
PPM-r1: Compound having the following structure (comparative compound, infrared absorber)

(resin)
B001: Resin having the following structure (the numbers added to the main chain are the molar ratios of repeating units, weight average molecular weight 17,000, dispersity 2.3)
B002: Resin having the following structure (the numbers added to the main chain are the molar ratios of repeating units, weight average molecular weight 9700, dispersity 1.8)
B003: Resin having the following structure (the numbers attached to the main chain are the molar ratios of repeating units, weight average molecular weight 10100, dispersity 1.7)
B004: Resin having the following structure (the numbers added to the main chain are the molar ratios of repeating units, weight average molecular weight 25,000, dispersity 2.2)
B005: Resin having the following structure (weight average molecular weight 137,000, number average molecular weight 32,000, glass transition temperature 165° C.)
B006: Resin having the following structure (weight average molecular weight 188,000, number average molecular weight 75,000, glass transition temperature 285° C.)
B007: Resin having the following structure (glass transition temperature 310°C, inherent viscosity 0.87)

(Photopolymerization initiator)
C-1 to C-3, C-7, C-22, C-23: Compounds having the following structures

(Polymerizable compound)
M-1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate)
M-3: Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid modified acrylic oligomer)

(Surfactant)
F-1: FTX-218D (manufactured by Neos Co., Ltd., fluorine-based surfactant)
F-2: Compound having the following structure (weight average molecular weight: 14,000, the percentages indicating the proportions of repeating units are mol%)
F-3: Megafac F-554 (manufactured by DIC Corporation, fluorosurfactant)

(Polymerization inhibitor)
G-1: p-Methoxyphenol

(Antioxidant)
U-1 to U-6: Compounds having the following structures

(Epoxy Compound)
E-1: Resin having the following structure (the numerical values of the repeating units are mass ratios, weight average molecular weight 20,000, number average molecular weight 8,300, epoxy equivalent 284 g/eq, acid value 130 mgKOH/g, glass transition temperature 136° C.)
E-2: Resin having the following structure (the numerical values of the repeating units are mass ratios, weight average molecular weight 26100, number average molecular weight 8600, epoxy equivalent 355 g/eq, acid value 163 mgKOH/g, glass transition temperature 133° C.)
E-3: Resin having the following structure (the numerical values of the repeating units are mass ratios, weight average molecular weight 21100, number average molecular weight 8500, epoxy equivalent 355 g/eq, acid value 130 mgKOH/g, glass transition temperature 157° C.)
E-4: Resin having the following structure (the numerical values of the repeating units are mass ratios, weight average molecular weight 18300, number average molecular weight 9100, epoxy equivalent 284 g/eq, acid value 98 mgKOH/g, glass transition temperature 134° C.)
E-5: Resin having the following structure (the numerical values of the repeating units are mass ratios, weight average molecular weight 22900, number average molecular weight 8800, epoxy equivalent 316 g/eq, acid value 130 mgKOH/g, glass transition temperature 124° C.)

(Hardening agent)
P-1: Trimellitic acid P-2: 2-ethyl-4-methylimidazole P-3: Methyltetrahydrophthalic anhydride

(Ultraviolet absorber)
UV-1: Uvinul 3050 (manufactured by BASF, compound having the following structure)
UV-2: Tinuvin 477 (manufactured by BASF, hydroxyphenyltriazine-based ultraviolet absorber)
UV-3: Tinuvin 326 (manufactured by BASF, compound having the following structure)
UV-4: Compound having the following structure

(solvent)
S-1: Propylene glycol monomethyl ether acetate (PGMEA)
S-2: Propylene glycol monomethyl ether (PGME)
S-3: Cyclopentanone S-4: Cyclohexanone S-5: Dichloromethane S-6: Dimethylacetamide S-7: Methyl 3-methoxypropionate

<Membrane Production>
(Production Example 1) Production method of film using the composition of Examples 1 to 62 and Comparative Example 1 Each composition was applied to a glass substrate by spin coating, and heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed to light at an exposure dose of 1000 mJ/ ^cm2 using an i-line stepper exposure device FPA-3000i5+ (Canon Corporation). Next, the layer was heated at 180°C for 5 minutes using a hot plate to produce a film having a thickness of 1.0 μm.

(Production Example 2) Method for producing a film using the composition of Examples 101 to 149, 201 to 249, and Comparative Examples 101 and 201 Each composition was applied onto a glass substrate by spin coating, heated at 100° C. for 2 minutes using a hot plate, and then heated at 200° C. for 8 minutes for hardening treatment to obtain a film having a thickness of 1.0 μm.

(Production Example 3) Production method of film using the composition of Examples 301 to 349 and Comparative Example 301 Each composition was cast on a glass substrate, dried at 20° C. for 8 hours, and then peeled off from the glass substrate. The peeled coating film was further dried at 100° C. under reduced pressure for 8 hours to obtain a film having a thickness of 1.0 μm, a length of 60 mm, and a width of 60 mm.

<Evaluation of Light Fastness>
The obtained film was irradiated with light at 100,000 Lux for 30 hours using a xenon arc lamp type light resistance tester. The spectral transmittance of the film was measured before and after the light irradiation, and the spectral fluctuation rate ΔT was calculated using the following formula, and the light resistance was evaluated according to the following criteria.
Spectral fluctuation rate ΔT = ((T02 - T12) / T02) x 100
T02: Spectral transmittance at the maximum absorption wavelength of the film before light irradiation,
T12: Spectral transmittance at the maximum absorption wavelength of the film after light irradiation - Evaluation criteria -
A: The spectral fluctuation rate ΔT is less than 5%. B: The spectral fluctuation rate ΔT is 5% or more and less than 10%. C: The spectral fluctuation rate ΔT is 10% or more and less than 15%. D: The spectral fluctuation rate ΔT is 15% or more.

<Evaluation of heat resistance>
The obtained film was placed in a thermostatic chamber at 150°C and stored for 6 months to carry out a heat resistance test. The ΔEab value of the color difference of the film before and after the heat resistance test was measured using a colorimeter MCPD-1000 (manufactured by Otsuka Electronics Co., Ltd.), and the heat resistance was evaluated according to the following criteria. The smaller the ΔEab value, the better the heat resistance. The ΔEab value is a value calculated from the following color difference formula according to the CIE1976 (L*, a*, b*) spatial color system (New Color Science Handbook (1985), edited by the Color Science Association of Japan, p. 266).
ΔEab={(ΔL*) ² +(Δa*) ² +(Δb*) ² } ^1/2
-Evaluation criteria-
A: ΔEab value < 5
B: 5≦ΔEab value<10
C: 10≦ΔEab value<15
D: 15≦ΔEab value

As shown in the table above, the examples were rated as superior in light resistance and heat resistance to the comparative examples.

<Production of infrared absorbing composition>
In Example 201 described in WO 2020/189458, the curable composition of Example 105 was changed to the compositions of Examples 47 to 55, 101 to 110, 201 to 210, and 301 to 310 described herein. An infrared absorbing composition was produced in the same manner as in Example 201 described in WO 2020/189458.
The obtained infrared absorbing composition was spin-coated on a glass substrate so that the film thickness after film formation was 1.0 μm, and a film was formed by any of the methods of Production Examples 1 to 3 described above (Production Example 1 when the composition of Examples 47 to 55 was used, Production Example 2 when the composition of Examples 101 to 110, 201 to 210 was used, and Production Example 3 when the composition of Examples 301 to 310 was used). The obtained film shielded light with a wavelength in the visible light region and transmitted at least a part of light with a wavelength in the infrared region (infrared light). When the heat resistance and light resistance of the obtained films were evaluated by the same method as above, all of them were rated as A.

110: Solid-state image sensor, 111: Infrared cut filter, 112: Color filter, 114: Infrared transmission filter, 115: Microlens, 116: Flattening layer

Claims

A composition comprising a compound represented by formula (1) and a curable compound;
(PM) (Z) m ... (1)
In formula (1), PM represents an anion represented by formula (PM1):
Z represents a divalent or higher cation;
m is a number greater than 0 and represents the number required to neutralize the charge of PM;
In formula (PM1), Rpm 1 to Rpm 5 each independently represent a hydrogen atom or a substituent;
n represents an integer of 1 or more;
any two of Rpm 2 to Rpm 4 may be bonded to form a ring, Rpm 1 and T 1 may be bonded to form a ring, and Rpm 5 and T 2 may be bonded to form a ring;
T 1 is a group represented by formula (T 1A ), formula (T 1B ) or formula (T 1C );
T2 is a group represented by formula ( T2A ), formula ( T2B ) or formula ( T2C ),
At least one of Rpm 1 to Rpm 5 , T 1 and T 2 contains an anionic group;
In the formula, X 1 to X 6 each independently represent an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR X1 -, where R X1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heterocyclic group;
R 1 to R 16 and R 31 to R 46 each independently represent a hydrogen atom, an alkyl group, a halogen atom, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR L1 , -C(=O)R L1 , -C(=O)OR L1 , -OC(=O)R L1 , -NR L1 R L2 , -NHC(=O)R L1 , -C(=O)NR L1 R L2 , -NHC(=O)OR L1 , -OC(=O)NR L1 R L2 , -NHC(=O)NR L1 R L2 , -SR L1 , -S (=O) 2R L1 , -S(=O)2OR L1 , -NHS(=O) 2 R L1 represents -S(=O) 2 NR L1 R L2 or an anionic group, and R L1 and R L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group;
Adjacent two of R 1 to R 16 and R 31 to R 46 may be bonded to each other to form a ring.
The composition according to claim 1, wherein X 1 to X 6 are each independently an oxygen atom or a sulfur atom.
The composition according to claim 1, wherein PM in the formula (1) is an anion represented by the formula (PM2), the formula (PM3), or the formula (PM4);
In formula (PM2), Rpm 11 to Rpm 15 each independently represent a hydrogen atom or a substituent;
Rpm 12 and Rpm 14 may be bonded to form a ring;
Rpm 11 and T 1 may be bonded to form a ring, and Rpm 15 and T 2 may be bonded to form a ring;
T 1 is a group represented by the formula (T 1A ), (T 1B ) or (T 1C );
T2 is a group represented by the formula ( T2A ), ( T2B ) or ( T2C );
At least one of Rpm 11 to Rpm 15 , T 1 and T 2 contains an anionic group;
In formula (PM3), Rpm 21 to Rpm 27 each independently represent a hydrogen atom or a substituent;
Rpm 23 and Rpm 25 may be bonded to form a ring;
Rpm 21 and T1 may be bonded to form a ring, Rpm 27 and T2 may be bonded to form a ring,
T 1 is a group represented by the formula (T 1A ), (T 1B ) or (T 1C );
T2 is a group represented by the formula ( T2A ), ( T2B ) or ( T2C );
At least one of Rpm 21 to Rpm 27 , T 1 and T 2 contains an anionic group;
In formula (PM4), Rpm 31 to Rpm 39 each independently represent a hydrogen atom or a substituent;
Rpm 34 and Rpm 36 may be bonded to form a ring;
Rpm 31 and T1 may be bonded to form a ring, and Rpm 39 and T2 may be bonded to form a ring;
T 1 is a group represented by the formula (T 1A ), (T 1B ) or (T 1C );
T2 is a group represented by the formula ( T2A ), ( T2B ) or ( T2C );
At least one of Rpm 31 to Rpm 39 , T 1 and T 2 contains an anionic group.
The composition according to any one of claims 1 to 3, which contains an infrared absorbing agent other than the compound represented by formula (1).
A film obtained using the composition according to any one of claims 1 to 3.
An optical filter having the film according to claim 5.
A solid-state imaging device having the film according to claim 5.
An image display device having the film according to claim 5.
An infrared sensor having the film according to claim 5.
A camera module having the film according to claim 5.
A compound represented by formula (1);
(PM) (Z) m ... (1)
In formula (1), PM represents an anion represented by formula (PM1):
Z represents a divalent or higher cation;
m is a number greater than 0 and represents the number required to neutralize the charge of PM;
In formula (PM1), Rpm 1 to Rpm 5 each independently represent a hydrogen atom or a substituent;
n represents an integer of 1 or more;
any two of Rpm 2 to Rpm 4 may be bonded to form a ring, Rpm 1 and T 1 may be bonded to form a ring, and Rpm 5 and T 2 may be bonded to form a ring;
T 1 is a group represented by formula (T 1A ), formula (T 1B ) or formula (T 1C );
T2 is a group represented by formula ( T2A ), formula ( T2B ) or formula ( T2C ),
At least one of Rpm 1 to Rpm 5 , T 1 and T 2 contains an anionic group;
In the formula, X 1 to X 6 each independently represent an oxygen atom, a sulfur atom, a selenium atom, a tellurium atom, or -NR X1 -, where R X1 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, or a heterocyclic group;
R 1 to R 16 and R 31 to R 46 each independently represent a hydrogen atom, an alkyl group, a halogen atom, an alkenyl group, an aryl group, a heterocyclic group, a nitro group, a cyano group, -OR L1 , -C(=O)R L1 , -C(=O)OR L1 , -OC(=O)R L1 , -NR L1 R L2 , -NHC(=O)R L1 , -C(=O)NR L1 R L2 , -NHC(=O)OR L1 , -OC(=O)NR L1 R L2 , -NHC(=O)NR L1 R L2 , -SR L1 , -S (=O) 2R L1 , -S(=O)2OR L1 , -NHS(=O) 2 R L1 represents -S(=O) 2 NR L1 R L2 or an anionic group, and R L1 and R L2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an aryl group or a heterocyclic group;
Adjacent two of R 1 to R 16 and R 31 to R 46 may be bonded to each other to form a ring.