WO2024070624A1 - Storage system - Google Patents

Storage system Download PDF

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Publication number
WO2024070624A1
WO2024070624A1 PCT/JP2023/033003 JP2023033003W WO2024070624A1 WO 2024070624 A1 WO2024070624 A1 WO 2024070624A1 JP 2023033003 W JP2023033003 W JP 2023033003W WO 2024070624 A1 WO2024070624 A1 WO 2024070624A1
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WO
WIPO (PCT)
Prior art keywords
container
crane
track
ceiling
storage system
Prior art date
Application number
PCT/JP2023/033003
Other languages
French (fr)
Japanese (ja)
Inventor
裕之 島田
浩二 増田
泰斗 上野山
弘章 三橋
修 坪井
光哉 徳本
世志紀 隅田
貴志 吉村
Original Assignee
村田機械株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 村田機械株式会社 filed Critical 村田機械株式会社
Publication of WO2024070624A1 publication Critical patent/WO2024070624A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G1/00Storing articles, individually or in orderly arrangement, in warehouses or magazines
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G1/00Storing articles, individually or in orderly arrangement, in warehouses or magazines
    • B65G1/02Storage devices
    • B65G1/04Storage devices mechanical
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/07Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for semiconductor wafers Not used, see H01L21/677
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations

Definitions

  • the present invention relates to a storage system.
  • semiconductor wafers which are items, are stored in a first container, and an overhead transport vehicle transports the first container.
  • the semiconductor wafers may be stored in a storage system for reasons of the manufacturing process.
  • a known configuration of this storage system is one in which a transfer device removes the semiconductor wafers from the transported first container, and the removed semiconductor wafers are transferred to a second container that stores semiconductor wafers at a higher density than the first container, and then stored in the storage device (see, for example, Patent Document 1).
  • the objective of the present invention is to provide a storage system that can store items at a high density while ensuring a large amount of free floor space.
  • a storage system includes a port on which a first container for storing items is placed, a transfer device for transferring items from the first container placed on the port to a second container that stores items at a higher density than the first container, and a storage device that is suspended from the ceiling and has a shelf on which the second container with the transferred items is placed.
  • the storage system according to the above aspect allows items to be stored in the second container at a high density, and furthermore, because the storage device that stores the second container is suspended from the ceiling, the storage device does not occupy the floor, and a large amount of free space on the floor can be secured. As a result, passage space and work space for workers can be secured on the floor, and many processing devices, etc. can be installed within the building.
  • the port and the transfer device may be arranged in a state of being suspended from the ceiling.
  • the port on which the first container is placed and the transfer device that transfers the item from the first container to the second container are suspended from the ceiling, so that the area required for the installation of the port and the transfer device is reduced from the floor surface, and more free floor space can be secured.
  • the height from the floor surface to the bottom end of the port, the transfer device, and the storage device may be set to a predetermined height that allows workers to pass through or allows devices to be installed. According to this configuration, the area below the port, the transfer device, and the storage device can be used for workers to pass through or for installing devices, so that the floor surface can be used effectively.
  • the storage device includes a crane, a crane ceiling track along which the crane travels while suspended, and a platform on which the second container to which the item has been transferred by the transfer device is placed, and the crane travels along the crane ceiling track to transport the second container and includes a transfer section for transferring the second container to each of the shelf and the platform, and the shelf may be arranged along the crane ceiling track.
  • the second container can be efficiently transferred to each of the shelf and the platform by using a crane that travels along the crane ceiling track.
  • the shelf may be provided in multiple stages in the vertical direction and multiple rows in the horizontal direction below and to the side of the crane ceiling track. According to this configuration, since multiple shelves are provided in the vertical and horizontal directions, many second containers can be stored in the storage device.
  • a plurality of cranes may be arranged on the overhead crane track. According to this configuration, by using a plurality of cranes, the second container can be transported efficiently.
  • the overhead crane track may be provided to include a circular track that surrounds the storage device in a plan view. According to this configuration, by having the crane move around the circular track, the crane can be moved in a circular motion in addition to moving back and forth on the track, and when a plurality of cranes are used, interference between the cranes can be prevented.
  • the overhead track for the crane may be provided including a lift track that allows the crane to be raised and lowered while suspended. According to this configuration, maintenance of the crane, replacement of the crane, etc. can be easily performed by placing the crane on the lift track and lowering the lift track. Furthermore, in the storage system according to the above aspect, multiple sets of ports and transfer devices may be arranged along the overhead track for the crane. According to this configuration, since multiple sets of ports and transfer devices are arranged, the work of transferring items from the first container to the second container can be performed in multiple locations, and the work of transferring items can be performed efficiently.
  • the storage system may include a ceiling transport vehicle that delivers the first container to the port, and a ceiling track for the transport vehicle along which the ceiling transport vehicle runs while suspended, the ceiling track for the transport vehicle having a plurality of intrabay tracks corresponding to the destinations of the first container and an interbay track connecting the intrabay tracks, and a set of a port and a transfer device may be provided corresponding to each of the plurality of intrabay tracks.
  • the ceiling transport vehicle can deliver the first container from any of the plurality of intrabay tracks.
  • FIG. 2 is a diagram showing an example of a storage system according to an embodiment, as viewed from the X direction.
  • FIG. 13 is a diagram showing an example of a storage device as viewed from the X direction.
  • FIG. 13 is a diagram showing an example of a storage system as viewed from the Z direction.
  • FIG. 2 is a diagram showing an example of an overhead track for a crane and an overhead track for a transport vehicle.
  • FIG. 2 is a diagram showing an example of a first container.
  • FIG. 2 is a diagram illustrating an example of a ceiling transport vehicle.
  • FIG. 4 is a diagram showing an example of a second container.
  • FIG. 4 is a diagram showing an example of a configuration of a second container.
  • FIG. 13 shows the second container in an open state.
  • FIG. 1 illustrates an example of a robot hand.
  • FIG. 1 is a diagram illustrating an example of a crane.
  • 13 is a diagram showing a state in which the first container has been delivered from the ceiling transport vehicle to the port.
  • FIG. 13 shows a state in which an article is handed over from the first container to the aligner.
  • FIG. 13 shows the state in which the article has been transferred from the aligner to the second container.
  • 13 is a diagram showing the state in which the second container is transferred from the placement table to the shelf by the crane.
  • FIG. 13A and 13B are diagrams showing other examples of an overhead track for a crane and an overhead track for a transport vehicle.
  • the direction perpendicular to the XY plane is represented as the Z direction.
  • the X, Y, and Z directions will be explained assuming that the direction indicated by the arrow in the figure is the + direction, and the direction opposite to the direction indicated by the arrow is the - direction.
  • FIG. 1 is a view of an example of a storage system 100 according to an embodiment, as viewed from the X direction.
  • FIG. 2 is a view of an example of a storage device 50, as viewed from the X direction.
  • FIG. 3 is a view of an example of a storage system 100, as viewed from the Z direction.
  • FIG. 4 is a diagram showing an example of an overhead track 53 for a crane and an overhead track R for a transport vehicle.
  • the storage system 100 comprises a port 10, a transfer device 30, and a storage device 50.
  • Each of the transfer device 30 and the storage device 50 is arranged in a state of being suspended from the ceiling C of a building such as a factory by a hanging bracket 5.
  • the port 10, the transfer device 30, and the storage device 50 have a predetermined height H from the floor surface F to their respective bottom ends that is set to a height that is greater than or equal to the height at which workers can pass through or at which equipment can be installed. Therefore, the space below the port 10, the transfer device 30, and the storage device 50 can be used for workers to pass through or for equipment installation, and the building floor surface F can be used effectively.
  • the port 10 and the transfer device 30 are arranged in a state where they are suspended from the ceiling C, but this is not limited to this form. At least one of the port 10 and the transfer device 30 may be placed on the floor surface F, for example.
  • the port 10 is used to place the first container 11 for storing items.
  • the port 10 is used to transfer the first container 11 between the ceiling transport vehicle 20 or the worker and the transfer device 30.
  • the port 10 is suspended from the ceiling C by being provided via a support 10a fixed to the frame 30a of the transfer device 30.
  • the port 10 may be suspended from the ceiling C by a hanging bracket 5 separate from the transfer device 30.
  • two ports 10 are provided for the transfer device 30, but this is not limited to this configuration and one or three or more ports may be provided.
  • the first container 11 can store a plurality of semiconductor wafers W as an article.
  • the semiconductor wafers W are an example of an article.
  • the first container 11 is, for example, a FOUP (Front Opening Unified Pod) or a FOSB (Front Opening Shipping Box).
  • FOUP Front Opening Unified Pod
  • FOSB Front Opening Shipping Box
  • the first container 11 may be any container capable of storing semiconductor wafers W, and is not limited to a FOUP or FOSB.
  • a single first container 11 contains semiconductor wafers W that have been subjected to the same process or unprocessed semiconductor wafers W, but a single first container 11 may contain semiconductor wafers W that have been subjected to different processes.
  • the processes performed on the semiconductor wafers W include, for example, surface treatments on the semiconductor wafers W, such as film formation, exposure, etching, and grinding.
  • the first container 11 includes a support portion 111, an opening 112, a lid portion 113, and a flange portion 114.
  • a plurality of support portions 111 are arranged vertically so as to protrude inward from the side wall of the first container 11.
  • the opposing support portions 111 are used as a set to form a slot 115 that supports a part of the outer periphery of the semiconductor wafer W.
  • a plurality of slots 115 are formed so as to hold the semiconductor wafer W at regular intervals in the vertical direction.
  • the opening 112 is provided on the side wall of the first container 11 to a size that allows the semiconductor wafer W to be inserted and removed.
  • the lid portion 113 is provided, for example, detachably on the opening 112.
  • the flange portion 114 is provided on the top of the first container 11 and is gripped during transport by the ceiling transport vehicle 20.
  • the first container 11 can accommodate a semiconductor wafer W in each of the plurality of slots 115.
  • the ceiling transport vehicle 20 travels along a ceiling track R for transport vehicles that is provided near the ceiling C.
  • the ceiling track R for transport vehicles is arranged in a state where it is suspended from the ceiling C by a hanging bracket 5.
  • the ceiling transport vehicle 20 also delivers a first container 11 to the port 10.
  • the first container 11 is transported by the ceiling transport vehicle 20 and placed on the port 10.
  • the first container 11 placed on the port 10 is also transported from the port 10 to another location by the ceiling transport vehicle 20.
  • FIG. 6 is a diagram showing an example of a ceiling transport vehicle 20.
  • the ceiling transport vehicle 20 has a running section 21 and a main body section 22.
  • the running section 21 is equipped with a running drive section and multiple drive wheels 21a (not shown), and runs along the ceiling track R for the transport vehicle.
  • the running drive section may be, for example, an electric motor provided on the running section 21 for driving the drive wheels 21a, or a linear motor provided using the ceiling track R for the transport vehicle.
  • the operation of the running section 21 is controlled, for example, by a control device (not shown) provided on the main body section 22.
  • the ceiling transport vehicle 20 is controlled to run in one direction on the ceiling track R for the transport vehicle.
  • the main body 22 is suspended from the bottom of the running section 21 via the mounting section 22a.
  • the main body 22 has a holding section 23 that holds the first container 11, a lifting drive section 24 that suspends and raises the holding section 23, a side-moving mechanism 25 that moves the lifting drive section 24 from the main body 22 to the side (horizontal direction) of the ceiling track R for the transport vehicle, and a cover 26.
  • the holding section 23 holds the first container 11 in a suspended state by grasping and holding the flange section 114 of the first container 11 from above.
  • the holding section 23 is, for example, a chuck having multiple claw sections 23a that can advance and retreat horizontally, and holds the first container 11 in a suspended state by inserting the claw sections 23a below the flange section 114 of the first container 11 and raising the holding section 23.
  • the holding unit 23 moves up and down while suspended from the lifting drive unit 24 by a hanging member 23b such as a wire or belt.
  • the lifting drive unit 24 is, for example, a hoist, which lowers the holding unit 23 by paying out the hanging member 23b, and raises the holding unit 23 by winding up the hanging member 23b.
  • the lifting drive unit 24 is controlled by a control device (not shown) or the like, and lowers or raises the holding unit 23 at a predetermined speed.
  • the lifting drive unit 24 is also controlled by a control device or the like, and holds the holding unit 23 at a target height.
  • the side-pushing mechanism 25 has movable plates 25a arranged, for example, in a vertical direction.
  • the movable plates 25a can move to the side of the traveling direction of the traveling part 21 (in a direction perpendicular to the traveling direction).
  • the lifting drive part 24 is attached to the lowermost movable plate 25a.
  • the main body part 22 has a guide (not shown) that guides the side-pushing mechanism 25, and a drive part (not shown) that drives the side-pushing mechanism 25.
  • the side-pushing mechanism 25 moves the lifting drive part 24 along the guide between the side-pushing position and the storage position by the driving force from a drive part such as an electric motor.
  • the side-pushing position is a position where the holding part 23 protrudes laterally from the main body part 22.
  • the storage position is a position where the holding part 23 is stored in the main body part 22.
  • a rotation mechanism for rotating the lifting drive part 24 (holding part 23) around an axis in the vertical direction may be provided between the side-pushing mechanism 25 and the lifting drive part 24.
  • the cover 26 surrounds the holding part 23, the lifting drive part 24, and the side-extending mechanism 25, and is provided by cutting out the part that allows the side-extending mechanism 25 to extend the movable plate 25a to the side.
  • the cover 26 is provided so as to surround the first container 11 held by the holding part 23 when the side-extending mechanism 25 places the lifting drive part 24 in the storage position.
  • the ceiling transport vehicle 20 can raise and lower the first container 11 using the lifting drive unit 24, and transfer the first container 11 between either of the two ports 10.
  • the ceiling transport vehicle 20 places the first container 11 on the port 10 by lowering the holding unit 23 using the lifting drive unit 24 while the lifting drive unit 24 is extended laterally above the port 10 using the lateral extension mechanism 25.
  • the ceiling transport vehicle 20 also holds the first container 11 placed on the port 10 with the holding unit 23, and receives the first container 11 by raising the holding unit 23 using the lifting drive unit 24.
  • the transfer device 30 transfers the semiconductor wafers W from the first container 11 placed on the port 10 to the second container 12.
  • the transfer device 30 also transfers the semiconductor wafers W from the second container 12 to the first container 11 placed on the port 10.
  • the second container 12 stores the semiconductor wafers W at a higher density than the first container 11. Details of the high density (high density) will be described later.
  • the transfer device 30 is provided as one set (one group) with one or more ports 10. In the example shown in FIG. 3, one transfer device 30 and two ports 10 form one set. However, this is not limited to this form, and one set may be one transfer device 30 and one port 10, or three or more transfer devices 30 and one port 10 may form one set.
  • a plurality of sets of ports 10 and transfer devices 30 may be arranged along the overhead track R for the transport vehicle and the overhead track 53 for the crane.
  • the transfer device 30 transports the semiconductor wafer W between the first container 11 placed on the port 10 and the second container 12 placed on the placement table 51.
  • the transfer device 30 is, for example, an EFEM (Equipment Front End Module).
  • the transfer device 30 removes the semiconductor wafer W contained in the first container 11 and places it in the second container 12 placed on the placement table 51.
  • the transfer device 30 also removes the semiconductor wafer W contained in the second container 12 and places it in the first container 11 placed on the port 10. Details of the storage device 50 will be described later.
  • the second container 12 stores the semiconductor wafers W transported by the transfer device 30.
  • the second container 12 stores the semiconductor wafers W at a higher density than the first container 11.
  • the density is expressed by the weight (or number) of the semiconductor wafers W relative to the volume of the container. Therefore, in the second container 12, the intervals between the semiconductor wafers W arranged vertically are narrower than in the first container 11, so that the number of semiconductor wafers W per unit volume is greater than that of the first container 11. In other words, the second container 12 can store the semiconductor wafers W at a higher density than the first container 11.
  • FIG. 7 is a schematic perspective view showing an example of the configuration of the second container 12.
  • the second container 12 includes a bottom 121, a lid 122, and a plurality of supports 123.
  • the multiple supports 123 are arranged between the bottom 121 and the lid 122.
  • Each support 123 is capable of supporting a semiconductor wafer W.
  • the support 123 constituting the second container 12, where (A) is a diagram showing the first support 123A and (B) is a diagram showing the second support 123B.
  • the support 123 includes a plurality of first supports 123A and a plurality of second supports 123B.
  • the first supports 123A and the second supports 123B are stacked alternately in the vertical direction (Z direction).
  • the first supports 123A and the second supports 123B have the same or almost the same outer edge shape in a planar view. Note that a planar view is synonymous with a view from above (+Z direction) or below (-Z direction).
  • the first support 123A has a frame 124A and a first holding portion 125A.
  • the first holding portion 125A is provided so as to extend upward from a plurality of points (for example, four points) of the frame 124A and then curve downward, and supports the semiconductor wafer W at its tip portion.
  • the second support 123B has a frame 124B and a second holding portion 125B, and supports the semiconductor wafer W by the second holding portion 125B.
  • the first holding portion 125A and the second holding portion 125B are arranged so that they do not overlap in a plan view. Furthermore, when stacked, the first holding portion 125A of the first support 123A penetrates the frame 124B of the second support 123B that is stacked on top of the first support 123A. Similarly, when stacked, the second holding portion 125B of the second support 123B penetrates the frame 124A of the first support 123A that is stacked on top of the second support 123B.
  • the second container 12 is transported between the placement platform 51 and the shelf 55 of the storage device 50 by the crane 52.
  • the second container 12 is removed from the shelf 55 by the crane 52 and placed on the placement platform 51.
  • the second container 12 is also removed from the placement platform 51 by the crane 52 and placed on the shelf 55.
  • the placement platform 51 is suspended from the ceiling C by being fixed to the frame 30a of the transfer device 30.
  • the placement platform 51 may be suspended from the ceiling C by a hanging bracket 5 separate from the transfer device 30 or the storage device 50.
  • one placement platform 51 is provided for the transfer device 30, but this is not limited to this configuration and two or more may be provided.
  • the opening and closing devices 54 open and close the second container 12, and when opened, make it possible to insert and remove the semiconductor wafer W.
  • the opening and closing devices 54 are arranged on the +X side and -X side of the mounting table 51.
  • the opening and closing devices 54 lift either the multiple first supports 123A or the multiple second supports 123B of the second container 12, making it possible to insert and remove the semiconductor wafer W.
  • the opening and closing devices 54 are provided corresponding to the mounting table 51, and when multiple mounting tables 51 are provided, one is provided for each mounting table 51.
  • the opening and closing devices 54 are arranged on the +X side and -X side of the mounting table 51.
  • FIG. 9 is a diagram showing the state in which the second container 12 is opened by the opening/closing device 54.
  • the opening/closing device 54 includes a support 56, a first support piece 57, and a second support piece 58.
  • the first support piece 57 and the second support piece 58 can advance and retreat between the multiple supports 123 by a drive unit (not shown), and can also move vertically along the support 56. Note that the first support piece 57 and the second support piece 58 are not in contact with the semiconductor wafer W during the opening and closing operation of the second container 12.
  • the first support piece 57 can lift, for example, the second support 123B, and the second support piece 58 can lift, for example, the first support 123A.
  • the first support piece 57 supports and lifts the second support 123B above the first support 123A, which is the object of transfer of the semiconductor wafer W.
  • the second support piece 58 supports and lifts the first support 123A, which is the object of transfer of the semiconductor wafer W.
  • the distance between the first support piece 57 and the second support piece 58 is set to a distance that forms a space D for the transfer of the semiconductor wafer W by the transfer unit 31 relative to the first support 123A. Note that by lifting the first support 123A with the second support piece 58, interference with the second support 123B below can be avoided when transferring the semiconductor wafer W.
  • the transfer device 30 includes a transport unit 31 and an aligner 32.
  • FIG. 10 is a diagram showing an example of the configuration of the transport unit 31.
  • the transport unit 31 includes a base 33, a lifting shaft 34, and a support unit 35.
  • the base 33 is fixed to the bottom of the frame 30a (see FIG. 1) of the transfer device 30.
  • the base 33 may be provided so as to be movable in the X direction by a travel drive unit (not shown) along an X direction rail provided on the frame 30a.
  • the lifting shaft 34 extends upward (in the +Z direction) from the top surface of the base 33, and is raised and lowered (moves in the Z direction) by a lifting drive unit (not shown).
  • the support unit 35 is provided at the upper end of the lifting shaft 34, and is raised and lowered together with the lifting shaft 34.
  • the support section 35 is provided with a first arm section 41, a second arm section 42, and a hand section 43, which constitute a robot arm (horizontal articulated robot).
  • One end of the first arm section 41 is provided on the upper surface of the support section 35 so as to be rotatable by a drive section (not shown).
  • One end of the second arm section 42 is provided on the other end of the first arm section 41 so as to be rotatable by a drive section (not shown).
  • One end of the hand section 43 is provided on the other end of the second arm section 42 so as to be rotatable by a drive section (not shown).
  • the other end of the hand section 43 is an end effector equipped with a suction pad capable of suctioning, for example, the bottom or top surface of the semiconductor wafer W.
  • the hand portion 43 is not particularly limited in the manner in which it holds the semiconductor wafer W, as long as it is capable of holding the semiconductor wafer W.
  • the support portion 35 is provided with a set of a first arm portion 41, a second arm portion 42, and a hand portion 43, but this is not limited to the manner.
  • the support portion 35 may also be provided with multiple sets of first arm portions 41, etc. In this case, the support portion 35 may be provided to be rotatable around an axis in the vertical direction.
  • the transport unit 31 which has the first arm 41, the second arm 42, and the hand 43, can remove the semiconductor wafer W from the first container 11 placed on the port 10, and is formed with dimensions capable of accommodating the semiconductor wafer W in the second container 12 placed on the mounting table 51. Therefore, the transport unit 31 can, for example, scoop up and remove the semiconductor wafer W from the first container 11, and place the removed semiconductor wafer W on the first support 123A or the second support 123B of the second container 12 placed on the mounting table 51.
  • the configuration of the transport unit 31 is not limited to the above-mentioned form.
  • the transport unit 31 is not limited to using a horizontal articulated robot composed of the first arm 41, etc., and may be configured using, for example, an expandable member, etc.
  • the aligner 32 is used to detect the amount of misalignment of the semiconductor wafer W transported by the transport unit 31.
  • the aligner 32 is installed in the frame 30a of the transfer device 30.
  • the aligner 32 rotates the semiconductor wafer W placed by the transport unit 31 and detects the edge of the semiconductor wafer W to detect the amount of misalignment in the planar direction and the rotational direction relative to a reference position.
  • the aligner 32 may have any configuration, and any configuration capable of detecting the misalignment of the semiconductor wafer W relative to a reference position may be applied.
  • the transfer device 30 does not have to be equipped with the aligner 32.
  • the storage device 50 has a mounting table 51, a crane 52, an overhead track for the crane 53, an opening/closing device 54, and a shelf 55.
  • the storage device 50 stores the second container 12 containing the semiconductor wafers W.
  • the second container 12 is transported from the shelf 55 to the mounting table 51 by the crane 52, and is also transported from the mounting table 51 to the shelf 55 by the crane 52.
  • a plurality of cranes 52 may be arranged on the overhead track for the crane 53. By using a plurality of cranes 52, the second container 12 can be efficiently transported between the mounting table 51 and the shelf 55.
  • FIG. 11 is a diagram showing an example of the configuration of the crane 52.
  • the crane 52 includes a traveling cart 61, two masts 62, a lifting platform 63, and a transfer unit 64.
  • the traveling cart 61 travels in the X direction along the crane ceiling track 53 suspended from the ceiling C by the hanging bracket 5 by a travel drive unit (not shown).
  • the traveling cart 61 is controlled so as to be capable of reciprocating movement (movement in one direction and the opposite direction) on the crane ceiling track 53.
  • the two masts 62 are provided in the vertical direction with a gap between them on the +X side and -Y side of the traveling cart 61.
  • the lifting platform 63 is disposed between the two masts 62 and moves up and down along the masts 62 by a lifting drive unit (not shown).
  • the lifting platform 63 is provided with a transfer unit 64 for transferring the second container 12.
  • the transfer unit 64 is, for example, a robot arm, and supports the underside of the bottom 121 of the second container 12.
  • the crane 52 can transport the second container 12 placed on the platform 51 to the shelf 55, and can also transport the second container 12 placed on the shelf 55 to the platform 51.
  • the opening/closing device 54 forms a space D in the second container 12, enabling the transfer unit 31 to transfer the semiconductor wafer W. After the transfer unit 31 stores the semiconductor wafer W in the second container 12 via the space D, the opening/closing device 54 lowers the first support piece 57 and the second support piece 58, and overlaps the first support 123A and the second support 123B to close the second container 12.
  • the crane 52 scoops up the closed second container 12 from the mounting table 51, supports it, and transfers it in this state.
  • the shelves 55 store multiple second containers 12. As shown in Figures 2 and 3, the shelves 55 are arranged in multiple vertical stages and multiple horizontal rows in a frame 55a suspended from the ceiling C by the hanging brackets 5.
  • the size of the frame 55a is arbitrary, and for example, the size is set to match the straight portion of the crane overhead track 53 in a plan view.
  • the lower end of the frame 55a is set to be equal to or higher than a predetermined height H (see Figure 1).
  • the shelves 55 may be arranged to correspond to the curved portion of the crane overhead track 53 in a plan view.
  • the shelves 55 may also be arranged on the +X and -X sides of the mounting platform 51 as shown in Figure 3.
  • Each shelf 55 is provided with a size that allows one second container 12 to be placed thereon.
  • Each shelf 55 may be provided with a gas supply mechanism (not shown) that supplies an inert gas such as nitrogen gas to the placed second container 12.
  • the shelves 55 are arranged along the crane ceiling track 53. Specifically, as shown in FIG. 2 and FIG. 4, the shelves 55 are provided in multiple vertical stages and multiple horizontal rows below and to the side of the crane ceiling track 53. Since multiple shelves 55 are provided in the vertical and horizontal directions, many second containers 12 can be stored in the storage device 50. The vertical spacing of the shelves 55 is wider than the height of the second storage container 12 but narrower than the height of the first storage container 11.
  • the storage device 50 realizes space-efficient storage of many semiconductor wafers W by allowing the second container 12 to store semiconductor wafers W at a higher density than the first container 11, as described above, and by narrowing the vertical spacing of the shelves 55.
  • the crane overhead track 53 includes circulating tracks 53A and 53B, a connecting track 53C, and a lifting track 53D.
  • the circulating track 53B is provided inside the circulating track 53A.
  • the circulating tracks 53A and 53B are provided so as to surround the shelves 55 of the storage device 50 in a plan view.
  • the shelves 55 are also provided outside the circulating track 53A.
  • the connecting track 53C connects the orbital tracks 53A and 53B.
  • the crane 52 can move from the orbital tracks 53A to 53B via the connecting track 53C, and from the orbital tracks 53B to 53A via the connecting track 53C.
  • the crane 52 is equipped with an obstacle sensor, and if there is, for example, a stopped crane 52 ahead in the traveling direction, the crane 52 stops traveling based on the detection result of the obstacle sensor. In this way, even when multiple cranes 52 are operating on the crane overhead track 53, interference between the cranes 52 is prevented.
  • the lifting track 53D is provided by branching off from a part of the circular track 53A.
  • the lifting track 53D can be raised and lowered with the crane 52 suspended from it.
  • the crane 52 can be lowered to the vicinity of the floor surface F. Therefore, by lowering the lifting track 53D from which the crane 52 is suspended, maintenance of the crane 52 and replacement of the crane 52 can be easily performed.
  • the lifting track 53D and the track part that branches off from the circular track 53A and connects to the lifting track 53D can also be used as a waiting track for the crane 52. For example, when some of the multiple cranes 52 are not in operation, the crane 52 can be kept waiting on the lifting track 53D, etc., to prevent the non-operating crane 52 from running wastefully.
  • the overhead track R for the transport vehicle may be provided with a buffer 60 on which the first container 11 can be temporarily placed.
  • the buffer 60 is provided, for example, in a state suspended from the ceiling C, and is provided in a position where the first container 11 can be handed over by the ceiling transport vehicle 20.
  • FIGS. 12 to 15 are diagrams showing an example of the operation of the storage system 100.
  • the operation of the storage system 100 is controlled by a control device (not shown).
  • the ceiling transport vehicle 20 travels along the ceiling track R for the transport vehicle with the first container 11 stored in the storage position of the main body 22.
  • the control device instructs the ceiling transport vehicle 20 to deliver the first container 11 to the port 10.
  • the ceiling transport vehicle 20 travels along the ceiling track R for the transport vehicle with the first container 11 held by the holding part 23, moves to the side of the port 10 and stops, and protrudes the side-discharge mechanism 25 to position the first container 11 above the port 10.
  • the lifting drive part 24 is driven to lower the holding part 23 and the first container 11, so that the first container 11 is delivered from the holding part 23 to the port 10 as shown in FIG. 12.
  • the transport unit 31 removes the semiconductor wafer W contained in the first container 11 as shown in FIG. 13, and transports the removed semiconductor wafer W to the aligner 32.
  • the aligner 32 receives the semiconductor wafer W from the transport unit 31 and detects the position of the received semiconductor wafer W.
  • the aligner 32 calculates the amount of positional deviation between the detected position of the semiconductor wafer W and a preset reference position.
  • the aligner 32 transmits the calculation result to the transport unit 31.
  • the transport unit 31 receives the semiconductor wafer W from the aligner 32 with the positional deviation corrected, and transports it.
  • the second container 12 is placed on the mounting table 51 by the crane 52.
  • the opening and closing device 54 opens the second container 12 placed on the mounting table 51 to form a space D.
  • the transport unit 31 causes the semiconductor wafer W to enter the space D of the second container 12, and places the semiconductor wafer W on the first support 123A or the second support 123B of the second container 12.
  • a control device (not shown) has acquired storage destination information regarding the storage destination of the semiconductor wafer W in the second container 12 in advance, and controls the transport unit 31 to transport the semiconductor wafer W to the designated storage destination. After the semiconductor wafer W is stored, the opening and closing device 54 closes the second container 12.
  • the crane 52 travels on the crane ceiling track 53 and stops to the side of the mounting table 51. Then, as shown in FIG. 15, the crane 52 receives the second container 12 placed on the mounting table 51 and transports it to a predetermined shelf 55. In this way, the semiconductor wafers W in the first container 11 are stored by the storage device 50 while being stored in the second container 12. Note that when the semiconductor wafers W stored in the second container 12 in the storage device 50 are transferred to the first container 11, the above procedure is reversed.
  • FIG. 16 is a diagram showing another example of the ceiling track 53 for the crane and the ceiling track R for the transport vehicle.
  • the ceiling track R for the transport vehicle has multiple intrabay tracks R1 and interbay tracks R2 in a plan view.
  • the intrabay tracks R1 are provided corresponding to the various processing devices and ports 10 to which the first container 11 is transported.
  • the interbay tracks R2 connect the multiple intrabay tracks R1 together.
  • the ceiling transport vehicle 20 can enter any of the multiple intrabay tracks R1 from the interbay track R2, and can also enter the interbay track R2 from the intrabay track R1.
  • the crane ceiling track 53 is arranged to orbit around the area sandwiched between multiple intrabay tracks R1.
  • Multiple cranes 52 (three in the example shown in Figure 16) are arranged on the crane ceiling track 53.
  • a set of ports 10 and transfer devices 30 is arranged in the area sandwiched between the intrabay track R1 and the crane ceiling track 53 in a plan view.
  • the storage device 50 is also provided along the crane ceiling track 53, inside and outside the crane ceiling track 53, which is a circular track.
  • the ceiling transport vehicle 20 can deliver the first container 11 to the port 10 on any of the multiple intra-bay tracks R1.
  • the crane 52 can deliver the second container 12 on any of the multiple loading platforms 51 or any of the multiple shelves 55 by traveling on the crane ceiling track 53.
  • semiconductor wafers W can be stored at high density in the second container 12, and further, since the storage device 50 that stores the second container 12 is suspended from the ceiling C, the storage device 50 does not occupy the floor surface F, and a large amount of free space on the floor surface F can be secured. As a result, it is possible to secure passage space and working space for workers on the floor surface F, or it is possible to install many processing devices, etc. on the floor surface F.
  • each operation shown in the embodiment can be realized in any order as long as the result of the previous operation is not used in the subsequent operation. Furthermore, even if the operations in the above-mentioned embodiments are described using "first,” “next,” “followed,” etc. for convenience, it is not necessary to perform them in this order.
  • C ceiling H: predetermined height
  • F floor
  • ceiling track for transport vehicle R1: intrabay track
  • W semiconductor wafer (item) 5... Suspension fitting 10... Port 11... First container 12... Second container 20... Ceiling transport vehicle 30... Transfer device 31... Transport section 32... Aligner 40... Transport device 50... Storage device 51... Placement platform 52... Crane 53... Ceiling track for crane 53A, 53B... Circulating track 53D... Lifting track 54... Opening/closing device 55... Shelf 64... Transfer section 100, 100A... Storage system

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Abstract

[Problem] To provide a storage system capable of broadly ensuring available floor space while densely storing products. [Solution] A storage system 100 which is equipped with: a port 10 in which a first container 11 for storing a semiconductor wafer W is positioned; a transfer device 30 for transferring the semiconductor wafer W from the first container 11 positioned in the port 10 to a second container 12 which stores semiconductor wafers W more densely than does the first container 11; and a storage device 50 which is hung from the ceiling C and has a shelf 55 on which the second container 12 to which the semiconductor wafer W was transferred is placed.

Description

保管システムStorage System
 本発明は、保管システムに関する。 The present invention relates to a storage system.
 例えば、半導体製造設備では、物品である半導体ウエハが第1容器内に格納され、天井搬送車が第1容器を搬送している。また、半導体製造設備において、半導体ウエハは、製造工程の都合等により保管システムに保管される場合がある。この保管システムとしては、搬送された第1容器から半導体ウエハを移載装置が取り出し、取り出された半導体ウエハを、第1容器よりも半導体ウエハを高密度に格納する第2容器に移し替えて保管装置に保管する構成が知られている(例えば、特許文献1参照)。 For example, in a semiconductor manufacturing facility, semiconductor wafers, which are items, are stored in a first container, and an overhead transport vehicle transports the first container. In addition, in a semiconductor manufacturing facility, the semiconductor wafers may be stored in a storage system for reasons of the manufacturing process. A known configuration of this storage system is one in which a transfer device removes the semiconductor wafers from the transported first container, and the removed semiconductor wafers are transferred to a second container that stores semiconductor wafers at a higher density than the first container, and then stored in the storage device (see, for example, Patent Document 1).
国際公開第2021/044791号International Publication No. 2021/044791
 半導体製造設備が設置される建屋においては、床面において作業者の通行スペース、作業スペースを確保すること、及び多くの処理装置等を建屋内に配置できることが望まれている。上記したように、半導体ウエハを第1容器から第2容器に移し替えたとしても、第2容器を保管する保管装置、移載装置が建屋の床面に設置されると、この保管装置等によって床面が占有されてしまうため、好ましくない。そこで、床面の占有面積を小さくするため、保管装置を小型化する構成が考えられる。しかし、当該構成では第2容器の保管数が少なくなり、保管できる半導体ウエハの数が少なくなるため、製造工程に支障が生じる場合がある。 In buildings in which semiconductor manufacturing equipment is installed, it is desirable to ensure sufficient passage and work space for workers on the floor, and to be able to place many processing devices, etc. within the building. As mentioned above, even if semiconductor wafers are transferred from the first container to the second container, if a storage device and transfer device for storing the second container are installed on the floor of the building, the floor space will be occupied by this storage device, etc., which is undesirable. Therefore, a configuration that miniaturizes the storage device can be considered to reduce the occupied floor space. However, with this configuration, the number of second containers that can be stored will be reduced, and the number of semiconductor wafers that can be stored will be reduced, which may cause problems in the manufacturing process.
 本発明は、物品を高密度に保管しつつ、床面の空きスペースを広く確保することが可能な保管システムを提供することを目的とする。 The objective of the present invention is to provide a storage system that can store items at a high density while ensuring a large amount of free floor space.
 本発明の態様に係る保管システムは、物品を格納する第1容器が載置されるポートと、ポートに載置された第1容器から、第1容器よりも物品を高密度に格納する第2容器に物品を移載する移載装置と、天井から吊り下げられた状態で配置され、物品が移載された第2容器が載置される棚を有する保管装置と、を備える。 A storage system according to an embodiment of the present invention includes a port on which a first container for storing items is placed, a transfer device for transferring items from the first container placed on the port to a second container that stores items at a higher density than the first container, and a storage device that is suspended from the ceiling and has a shelf on which the second container with the transferred items is placed.
 上記態様に係る保管システムによれば、第2容器に高密度に物品を格納することができ、さらに、第2容器を保管する保管装置が天井から吊り下げられるので、保管装置が床面を占有せず、床面の空きスペースを広く確保することができる。その結果、床面において作業者の通行スペース、作業スペースを確保することができ、多くの処理装置等を建屋内に設置することができる。 The storage system according to the above aspect allows items to be stored in the second container at a high density, and furthermore, because the storage device that stores the second container is suspended from the ceiling, the storage device does not occupy the floor, and a large amount of free space on the floor can be secured. As a result, passage space and work space for workers can be secured on the floor, and many processing devices, etc. can be installed within the building.
 また、上記態様に係る保管システムにおいて、ポート及び移載装置は、天井から吊り下げられた状態で配置されてもよい。この構成によれば、第1容器が載置されるポートと、物品を第1容器から第2容器に移し替える移載装置とが天井に吊り下げられるため、ポート及び移載装置の設置に必要な面積を床面から削減し、床面積の空きスペースをより一層広く確保することができる。また、上記態様に係る保管システムにおいて、ポート、移載装置、及び保管装置は、床面からそれぞれの下端までの高さが作業者の通行可能又は装置を設置可能な所定高さに設定されてもよい。この構成によれば、ポート、移載装置、及び保管装置の下方が、作業者の通行又は装置の設置などに利用可能となるため、床面を有効に活用することができる。 Furthermore, in the storage system according to the above aspect, the port and the transfer device may be arranged in a state of being suspended from the ceiling. According to this configuration, the port on which the first container is placed and the transfer device that transfers the item from the first container to the second container are suspended from the ceiling, so that the area required for the installation of the port and the transfer device is reduced from the floor surface, and more free floor space can be secured. Furthermore, in the storage system according to the above aspect, the height from the floor surface to the bottom end of the port, the transfer device, and the storage device may be set to a predetermined height that allows workers to pass through or allows devices to be installed. According to this configuration, the area below the port, the transfer device, and the storage device can be used for workers to pass through or for installing devices, so that the floor surface can be used effectively.
 また、上記態様に係る保管システムにおいて、保管装置は、クレーンと、クレーンが吊り下げられた状態で走行するためのクレーン用天井軌道と、移載装置により物品が移載された第2容器を載置する載置台と、を備え、クレーンは、クレーン用天井軌道を走行して第2容器を搬送し、棚及び載置台のそれぞれに対して第2容器を受け渡す移載部を備え、棚は、クレーン用天井軌道に沿って配置されてもよい。この構成によれば、クレーン用天井軌道を走行するクレーンを用いることにより、第2容器を棚及び載置台のそれぞれに対して効率よく受け渡すことができる。また、上記態様に係る保管システムにおいて、棚は、クレーン用天井軌道の下方かつ側方において上下方向に複数段、及び水平方向に複数列にわたって設けられてもよい。この構成によれば、棚が上下方向及び水平方向に複数設けられるので、保管装置に多くの第2容器を保管することができる。 In addition, in the storage system according to the above aspect, the storage device includes a crane, a crane ceiling track along which the crane travels while suspended, and a platform on which the second container to which the item has been transferred by the transfer device is placed, and the crane travels along the crane ceiling track to transport the second container and includes a transfer section for transferring the second container to each of the shelf and the platform, and the shelf may be arranged along the crane ceiling track. According to this configuration, the second container can be efficiently transferred to each of the shelf and the platform by using a crane that travels along the crane ceiling track. Also, in the storage system according to the above aspect, the shelf may be provided in multiple stages in the vertical direction and multiple rows in the horizontal direction below and to the side of the crane ceiling track. According to this configuration, since multiple shelves are provided in the vertical and horizontal directions, many second containers can be stored in the storage device.
 また、上記態様に係る保管システムにおいて、クレーンは、クレーン用天井軌道において複数台配置されてもよい。この構成によれば、複数台のクレーンが用いられることにより、第2容器を効率よく搬送することができる。また、上記態様に係る保管システムにおいて、クレーン用天井軌道は、平面視で保管装置を囲む周回軌道を含んで設けられてもよい。この構成によれば、クレーンが周回軌道を周回することで、クレーンを軌道において往復移動させることに加えて、周回移動させることもでき、複数のクレーンが用いられる場合において、クレーン同士の干渉を防止できる。 Furthermore, in the storage system according to the above aspect, a plurality of cranes may be arranged on the overhead crane track. According to this configuration, by using a plurality of cranes, the second container can be transported efficiently. Furthermore, in the storage system according to the above aspect, the overhead crane track may be provided to include a circular track that surrounds the storage device in a plan view. According to this configuration, by having the crane move around the circular track, the crane can be moved in a circular motion in addition to moving back and forth on the track, and when a plurality of cranes are used, interference between the cranes can be prevented.
 また、上記態様に係る保管システムにおいて、クレーン用天井軌道は、クレーンを吊り下げた状態で昇降可能な昇降軌道を含んで設けられてもよい。この構成によれば、昇降軌道にクレーンを配置して昇降軌道を下降させることで、クレーンのメンテナンス、クレーンの交換等を容易に行うことができる。また、上記態様に係る保管システムにおいて、ポート及び移載装置のセットは、クレーン用天井軌道に沿って複数セット配置されてもよい。この構成によれば、ポート及び移載装置が複数セット配置されるので、物品を第1容器から第2容器に移し替える作業を複数カ所で行うことができ、物品の移し替え作業を効率よく行うことができる。 Furthermore, in the storage system according to the above aspect, the overhead track for the crane may be provided including a lift track that allows the crane to be raised and lowered while suspended. According to this configuration, maintenance of the crane, replacement of the crane, etc. can be easily performed by placing the crane on the lift track and lowering the lift track. Furthermore, in the storage system according to the above aspect, multiple sets of ports and transfer devices may be arranged along the overhead track for the crane. According to this configuration, since multiple sets of ports and transfer devices are arranged, the work of transferring items from the first container to the second container can be performed in multiple locations, and the work of transferring items can be performed efficiently.
 また、上記態様に係る保管システムにおいて、ポートに対して第1容器を受け渡す天井搬送車と、天井搬送車が吊り下げられた状態で走行するための搬送車用天井軌道と、を備え、搬送車用天井軌道は、第1容器の搬送先に対応する複数のイントラベイ軌道と、イントラベイ軌道同士を接続するインターベイ軌道とを有し、ポート及び移載装置のセットは、複数のイントラベイ軌道のそれぞれに対応して設けられてもよい。この構成によれば、天井搬送車は、複数のイントラベイ軌道のいずれからも第1容器を受け渡すことができる。 In addition, the storage system according to the above aspect may include a ceiling transport vehicle that delivers the first container to the port, and a ceiling track for the transport vehicle along which the ceiling transport vehicle runs while suspended, the ceiling track for the transport vehicle having a plurality of intrabay tracks corresponding to the destinations of the first container and an interbay track connecting the intrabay tracks, and a set of a port and a transfer device may be provided corresponding to each of the plurality of intrabay tracks. According to this configuration, the ceiling transport vehicle can deliver the first container from any of the plurality of intrabay tracks.
実施形態に係る保管システムの一例をX方向から見た図である。FIG. 2 is a diagram showing an example of a storage system according to an embodiment, as viewed from the X direction. 保管装置の一例をX方向から見た図である。FIG. 13 is a diagram showing an example of a storage device as viewed from the X direction. 保管システムの一例をZ方向から見た図である。FIG. 13 is a diagram showing an example of a storage system as viewed from the Z direction. クレーン用天井軌道及び搬送車用天井軌道の一例を示す図である。FIG. 2 is a diagram showing an example of an overhead track for a crane and an overhead track for a transport vehicle. 第1容器の一例を示す図である。FIG. 2 is a diagram showing an example of a first container. 天井搬送車の一例を示す図である。FIG. 2 is a diagram illustrating an example of a ceiling transport vehicle. 第2容器の一例を示す図である。FIG. 4 is a diagram showing an example of a second container. 第2容器の構成の一例を示す図である。FIG. 4 is a diagram showing an example of a configuration of a second container. 第2容器を開いた状態を示す図である。FIG. 13 shows the second container in an open state. ロボットハンドの一例を示す図である。FIG. 1 illustrates an example of a robot hand. クレーンの一例を示す図である。FIG. 1 is a diagram illustrating an example of a crane. 天井搬送車からポートに第1容器を渡した状態を示す図である。13 is a diagram showing a state in which the first container has been delivered from the ceiling transport vehicle to the port. FIG. 第1容器から物品をアライナに渡した状態を示す図である。FIG. 13 shows a state in which an article is handed over from the first container to the aligner. アライナから物品を第2容器に渡した状態を示す図である。FIG. 13 shows the state in which the article has been transferred from the aligner to the second container. クレーンにより載置台から第2容器を棚に移載した状態を示す図である。13 is a diagram showing the state in which the second container is transferred from the placement table to the shelf by the crane. FIG. クレーン用天井軌道及び搬送車用天井軌道の他の例を示す図である。13A and 13B are diagrams showing other examples of an overhead track for a crane and an overhead track for a transport vehicle.
 以下、本発明の実施形態について図面を参照しながら説明する。ただし、本発明は以下に説明する内容に限定されない。また、図面においては実施形態を説明するため、一部分を大きく又は強調して記載するなど適宜縮尺を変更して表現しており、実際の製品とは形状、寸法等が異なる場合がある。以下の各図において、XYZ座標系を用いて図中の方向を説明する。このXYZ座標系においては、水平面に平行な平面をXY平面とする。このXY平面において天井搬送車20及びクレーン52の走行方向をX方向と表記し、X方向に直交する方向をY方向と表記する。また、XY平面に垂直な方向はZ方向と表記する。X方向、Y方向及びZ方向のそれぞれは、図中の矢印の指す方向が+方向であり、矢印の指す方向とは反対の方向が-方向であるとして説明する。 Below, an embodiment of the present invention will be described with reference to the drawings. However, the present invention is not limited to the contents described below. In addition, in order to explain the embodiment in the drawings, some parts are enlarged or emphasized, and the scale is appropriately changed, and the shape, dimensions, etc. may differ from the actual product. In each of the following figures, the directions in the figures will be explained using the XYZ coordinate system. In this XYZ coordinate system, a plane parallel to the horizontal plane is the XY plane. In this XY plane, the traveling direction of the ceiling transport vehicle 20 and the crane 52 is represented as the X direction, and the direction perpendicular to the X direction is represented as the Y direction. In addition, the direction perpendicular to the XY plane is represented as the Z direction. The X, Y, and Z directions will be explained assuming that the direction indicated by the arrow in the figure is the + direction, and the direction opposite to the direction indicated by the arrow is the - direction.
 図1は、実施形態に係る保管システム100の一例をX方向から見た図である。図2は、保管装置50の一例をX方向から見た図である。図3は、保管システム100の一例をZ方向から見た図である。図4は、クレーン用天井軌道53及び搬送車用天井軌道Rの一例を示す図である。図1から図4に示すように、保管システム100は、ポート10と、移載装置30と、保管装置50とを備える。移載装置30及び保管装置50のそれぞれは、工場等の建屋の天井Cから吊り金具5により吊り下げられた状態で配置される。 FIG. 1 is a view of an example of a storage system 100 according to an embodiment, as viewed from the X direction. FIG. 2 is a view of an example of a storage device 50, as viewed from the X direction. FIG. 3 is a view of an example of a storage system 100, as viewed from the Z direction. FIG. 4 is a diagram showing an example of an overhead track 53 for a crane and an overhead track R for a transport vehicle. As shown in FIGS. 1 to 4, the storage system 100 comprises a port 10, a transfer device 30, and a storage device 50. Each of the transfer device 30 and the storage device 50 is arranged in a state of being suspended from the ceiling C of a building such as a factory by a hanging bracket 5.
 ポート10、移載装置30、及び保管装置50は、床面Fからそれぞれの下端までの所定高さHが作業者の通行可能又は装置を設置可能な高さ以上に設定される。従って、ポート10、移載装置30、及び保管装置50の下方が、作業者の通行又は装置の設置などに利用可能となるため、建屋の床面Fを有効に活用することができる。なお、本実施形態では、ポート10及び移載装置30を天井Cから吊り下げた状態で配置されているが、この形態に限定されない。ポート10及び移載装置30の少なくとも一方は、例えば、床面Fに載置される形態であってもよい。 The port 10, the transfer device 30, and the storage device 50 have a predetermined height H from the floor surface F to their respective bottom ends that is set to a height that is greater than or equal to the height at which workers can pass through or at which equipment can be installed. Therefore, the space below the port 10, the transfer device 30, and the storage device 50 can be used for workers to pass through or for equipment installation, and the building floor surface F can be used effectively. Note that in this embodiment, the port 10 and the transfer device 30 are arranged in a state where they are suspended from the ceiling C, but this is not limited to this form. At least one of the port 10 and the transfer device 30 may be placed on the floor surface F, for example.
 ポート10は、物品を格納する第1容器11が載置される。ポート10は、天井搬送車20又は作業者と移載装置30との間で、第1容器11の受け渡しを行うために用いられる。ポート10は、移載装置30のフレーム30aに固定された支持部10aを介して設けられることで、天井Cから吊り下げた状態となっている。なお、ポート10は、移載装置30とは別の吊り金具5により天井Cから吊り下げられる形態であってもよい。ポート10は、図3に示すように、移載装置30に対して2つ設けられているが、この形態に限定されず、1つ又は3つ以上設けられてもよい。 The port 10 is used to place the first container 11 for storing items. The port 10 is used to transfer the first container 11 between the ceiling transport vehicle 20 or the worker and the transfer device 30. The port 10 is suspended from the ceiling C by being provided via a support 10a fixed to the frame 30a of the transfer device 30. The port 10 may be suspended from the ceiling C by a hanging bracket 5 separate from the transfer device 30. As shown in FIG. 3, two ports 10 are provided for the transfer device 30, but this is not limited to this configuration and one or three or more ports may be provided.
 第1容器11は、物品として複数の半導体ウエハWを収容可能である。なお、半導体ウエハWは、物品の一例である。第1容器11は、例えば、FOUP(Front Opening Unified Pod)又はFOSB(Front Opening Shipping Box)である。ただし、第1容器11は、半導体ウエハWを収納できる容器であればよく、FOUP又はFOSBに限定されない。 The first container 11 can store a plurality of semiconductor wafers W as an article. The semiconductor wafers W are an example of an article. The first container 11 is, for example, a FOUP (Front Opening Unified Pod) or a FOSB (Front Opening Shipping Box). However, the first container 11 may be any container capable of storing semiconductor wafers W, and is not limited to a FOUP or FOSB.
 1つの第1容器11には、同一の処理が行われた半導体ウエハW、又は未処理の半導体ウエハWがまとめて収容されるが、1つの第1容器11に異なる処理が行われた半導体ウエハWが収容されてもよい。ここで、半導体ウエハWに行われる処理としては、例えば、半導体ウエハWに対する表面処理であり、成膜処理、露光処理、エッチング処理、研削処理などがある。 A single first container 11 contains semiconductor wafers W that have been subjected to the same process or unprocessed semiconductor wafers W, but a single first container 11 may contain semiconductor wafers W that have been subjected to different processes. Here, the processes performed on the semiconductor wafers W include, for example, surface treatments on the semiconductor wafers W, such as film formation, exposure, etching, and grinding.
 図5は、第1容器11の構成の一例を示す図である。図5に示すように、第1容器11は、支持部111と、開口部112と、蓋部113と、フランジ部114とを備える。支持部111は、第1容器11の側壁から内側に突出するように、上下方向に並べて複数設けられる。支持部111は、対向する支持部111で一組として用いられ、半導体ウエハWの外周の一部を支持するスロット115を形成する。スロット115は、半導体ウエハWを上下方向に一定間隔で保持するように複数形成される。開口部112は、第1容器11の側壁に半導体ウエハWの出し入れが可能な大きさに設けられる。蓋部113は、例えば、開口部112に着脱可能に設けられる。フランジ部114は、第1容器11の天頂部に設けられ、天井搬送車20による搬送時に把持される。第1容器11は、複数のスロット115のそれぞれに半導体ウエハWを収容可能である。 5 is a diagram showing an example of the configuration of the first container 11. As shown in FIG. 5, the first container 11 includes a support portion 111, an opening 112, a lid portion 113, and a flange portion 114. A plurality of support portions 111 are arranged vertically so as to protrude inward from the side wall of the first container 11. The opposing support portions 111 are used as a set to form a slot 115 that supports a part of the outer periphery of the semiconductor wafer W. A plurality of slots 115 are formed so as to hold the semiconductor wafer W at regular intervals in the vertical direction. The opening 112 is provided on the side wall of the first container 11 to a size that allows the semiconductor wafer W to be inserted and removed. The lid portion 113 is provided, for example, detachably on the opening 112. The flange portion 114 is provided on the top of the first container 11 and is gripped during transport by the ceiling transport vehicle 20. The first container 11 can accommodate a semiconductor wafer W in each of the plurality of slots 115.
 天井搬送車20は、天井C近傍に設けられた搬送車用天井軌道Rに沿って走行する。搬送車用天井軌道Rは、天井Cから吊り金具5により吊り下げられた状態で配置される。また、天井搬送車20は、ポート10に対して第1容器11を受け渡す。第1容器11は、天井搬送車20により搬送され、ポート10に載置される。また、ポート10に載置された第1容器11は、天井搬送車20によりポート10から他に搬送される。 The ceiling transport vehicle 20 travels along a ceiling track R for transport vehicles that is provided near the ceiling C. The ceiling track R for transport vehicles is arranged in a state where it is suspended from the ceiling C by a hanging bracket 5. The ceiling transport vehicle 20 also delivers a first container 11 to the port 10. The first container 11 is transported by the ceiling transport vehicle 20 and placed on the port 10. The first container 11 placed on the port 10 is also transported from the port 10 to another location by the ceiling transport vehicle 20.
 図6は、天井搬送車20の一例を示す図である。天井搬送車20は、走行部21と、本体部22とを有する。走行部21は、不図示の走行駆動部及び複数の駆動輪21aを備え、搬送車用天井軌道Rに沿って走行する。走行駆動部としては、例えば、走行部21に備えられて駆動輪21aを駆動する電動モータであってもよいし、搬送車用天井軌道Rを用いて設けられたリニアモータであってもよい。走行部21の動作は、例えば、本体部22に設けられた不図示の制御装置等によって制御される。天井搬送車20は、搬送車用天井軌道Rにおいて一方向に向けて走行するように制御される。 FIG. 6 is a diagram showing an example of a ceiling transport vehicle 20. The ceiling transport vehicle 20 has a running section 21 and a main body section 22. The running section 21 is equipped with a running drive section and multiple drive wheels 21a (not shown), and runs along the ceiling track R for the transport vehicle. The running drive section may be, for example, an electric motor provided on the running section 21 for driving the drive wheels 21a, or a linear motor provided using the ceiling track R for the transport vehicle. The operation of the running section 21 is controlled, for example, by a control device (not shown) provided on the main body section 22. The ceiling transport vehicle 20 is controlled to run in one direction on the ceiling track R for the transport vehicle.
 本体部22は、取付部22aを介して走行部21の下部に吊り下げられている。本体部22は、第1容器11を保持する保持部23と、保持部23を吊り下げて昇降させる昇降駆動部24と、本体部22から昇降駆動部24を搬送車用天井軌道Rの側方(横方向)に移動させる横出し機構25と、カバー26とを有する。保持部23は、第1容器11のフランジ部114を上方から掴んで保持することにより、第1容器11を吊り下げて保持する。保持部23は、例えば、水平方向に進退可能な複数の爪部23aを有するチャックであり、爪部23aを第1容器11のフランジ部114の下方に進入させ、保持部23を上昇させることにより第1容器11を吊り下げた状態で保持する。保持部23は、ワイヤ又はベルトなどの吊り下げ部材23bにより昇降駆動部24から吊り下げられた状態で昇降する。 The main body 22 is suspended from the bottom of the running section 21 via the mounting section 22a. The main body 22 has a holding section 23 that holds the first container 11, a lifting drive section 24 that suspends and raises the holding section 23, a side-moving mechanism 25 that moves the lifting drive section 24 from the main body 22 to the side (horizontal direction) of the ceiling track R for the transport vehicle, and a cover 26. The holding section 23 holds the first container 11 in a suspended state by grasping and holding the flange section 114 of the first container 11 from above. The holding section 23 is, for example, a chuck having multiple claw sections 23a that can advance and retreat horizontally, and holds the first container 11 in a suspended state by inserting the claw sections 23a below the flange section 114 of the first container 11 and raising the holding section 23. The holding unit 23 moves up and down while suspended from the lifting drive unit 24 by a hanging member 23b such as a wire or belt.
 昇降駆動部24は、例えばホイストであり、吊り下げ部材23bを繰り出すことにより保持部23を下降させ、吊り下げ部材23bを巻き取ることにより保持部23を上昇させる。昇降駆動部24は、不図示の制御装置等に制御され、所定の速度で保持部23を下降あるいは上昇させる。また、昇降駆動部24は、制御装置等により制御され、保持部23を目標の高さに保持する。 The lifting drive unit 24 is, for example, a hoist, which lowers the holding unit 23 by paying out the hanging member 23b, and raises the holding unit 23 by winding up the hanging member 23b. The lifting drive unit 24 is controlled by a control device (not shown) or the like, and lowers or raises the holding unit 23 at a predetermined speed. The lifting drive unit 24 is also controlled by a control device or the like, and holds the holding unit 23 at a target height.
 横出し機構25は、例えば上下方向に重ねて配置された可動板25aを有する。可動板25aは、走行部21の走行方向の側方(走行方向に直交する方向)に移動可能である。最下部の可動板25aには、昇降駆動部24が取り付けられている。本体部22は、横出し機構25を案内する不図示のガイド、及び横出し機構25を駆動する不図示の駆動部などを有する。横出し機構25は、電動モータ等の駆動部からの駆動力によって、昇降駆動部24をガイドに沿って、横出し位置と格納位置との間で移動させる。横出し位置は、本体部22から保持部23を側方に突出する位置である。格納位置は、本体部22内に保持部23を格納する位置である。なお、横出し機構25と昇降駆動部24との間には、昇降駆動部24(保持部23)を上下方向の軸周りに回転させるための回転機構が設けられてもよい。 The side-pushing mechanism 25 has movable plates 25a arranged, for example, in a vertical direction. The movable plates 25a can move to the side of the traveling direction of the traveling part 21 (in a direction perpendicular to the traveling direction). The lifting drive part 24 is attached to the lowermost movable plate 25a. The main body part 22 has a guide (not shown) that guides the side-pushing mechanism 25, and a drive part (not shown) that drives the side-pushing mechanism 25. The side-pushing mechanism 25 moves the lifting drive part 24 along the guide between the side-pushing position and the storage position by the driving force from a drive part such as an electric motor. The side-pushing position is a position where the holding part 23 protrudes laterally from the main body part 22. The storage position is a position where the holding part 23 is stored in the main body part 22. Note that a rotation mechanism for rotating the lifting drive part 24 (holding part 23) around an axis in the vertical direction may be provided between the side-pushing mechanism 25 and the lifting drive part 24.
 カバー26は、保持部23、昇降駆動部24、及び横出し機構25を囲み、かつ、横出し機構25により可動板25aを横出しする部分を切り欠いて設けられる。カバー26は、横出し機構25が昇降駆動部24を格納位置に配置させる場合、保持部23により保持する第1容器11を囲むように設けられている。 The cover 26 surrounds the holding part 23, the lifting drive part 24, and the side-extending mechanism 25, and is provided by cutting out the part that allows the side-extending mechanism 25 to extend the movable plate 25a to the side. The cover 26 is provided so as to surround the first container 11 held by the holding part 23 when the side-extending mechanism 25 places the lifting drive part 24 in the storage position.
 天井搬送車20は、昇降駆動部24により第1容器11を昇降させて、2つポート10のいずれかとの間で第1容器11を受け渡し可能である。天井搬送車20は、横出し機構25により昇降駆動部24をポート10の上方に横出しした状態で、昇降駆動部24により保持部23を下降させることで、ポート10に第1容器11を載置する。また、ポート10に載置された第1容器11を保持部23で保持し、昇降駆動部24により保持部23を上昇させることで第1容器11を受け取る。 The ceiling transport vehicle 20 can raise and lower the first container 11 using the lifting drive unit 24, and transfer the first container 11 between either of the two ports 10. The ceiling transport vehicle 20 places the first container 11 on the port 10 by lowering the holding unit 23 using the lifting drive unit 24 while the lifting drive unit 24 is extended laterally above the port 10 using the lateral extension mechanism 25. The ceiling transport vehicle 20 also holds the first container 11 placed on the port 10 with the holding unit 23, and receives the first container 11 by raising the holding unit 23 using the lifting drive unit 24.
 移載装置30は、ポート10に載置された第1容器11から第2容器12に半導体ウエハWを移載する。また、移載装置30は、第2容器12からポート10に載置された第1容器11に半導体ウエハWを移載する。第2容器12は、第1容器11よりも半導体ウエハWを高密度に格納する。なお、高密度(高い密度)の詳細については後述する。移載装置30は、1つ又は複数のポート10と1セット(1組)として設けられる。図3に示す例では、1つの移載装置30と、2つのポート10とを1セットとしている。ただし、この形態に限定されず、1つの移載装置30と1つのポート10とを1セットとする形態であってもよいし、3つ以上の移載装置30と1つのポート10とを1セットとする形態であってもよい。なお、ポート10及び移載装置30のセットは、搬送車用天井軌道R及びクレーン用天井軌道53に沿って複数セット配置されてもよい。 The transfer device 30 transfers the semiconductor wafers W from the first container 11 placed on the port 10 to the second container 12. The transfer device 30 also transfers the semiconductor wafers W from the second container 12 to the first container 11 placed on the port 10. The second container 12 stores the semiconductor wafers W at a higher density than the first container 11. Details of the high density (high density) will be described later. The transfer device 30 is provided as one set (one group) with one or more ports 10. In the example shown in FIG. 3, one transfer device 30 and two ports 10 form one set. However, this is not limited to this form, and one set may be one transfer device 30 and one port 10, or three or more transfer devices 30 and one port 10 may form one set. A plurality of sets of ports 10 and transfer devices 30 may be arranged along the overhead track R for the transport vehicle and the overhead track 53 for the crane.
 移載装置30は、ポート10に載置された第1容器11と、載置台51に載置された第2容器12との間で半導体ウエハWを搬送する。移載装置30は、例えば、EFEM(Equipment Front End Module)である。移載装置30は、第1容器11に収容されている半導体ウエハWを取り出して、載置台51に載置されている第2容器12に収容する。また、移載装置30は、第2容器12に収容されている半導体ウエハWを取り出して、ポート10に載置されている第1容器11に収容する。なお、保管装置50の詳細については後述する。 The transfer device 30 transports the semiconductor wafer W between the first container 11 placed on the port 10 and the second container 12 placed on the placement table 51. The transfer device 30 is, for example, an EFEM (Equipment Front End Module). The transfer device 30 removes the semiconductor wafer W contained in the first container 11 and places it in the second container 12 placed on the placement table 51. The transfer device 30 also removes the semiconductor wafer W contained in the second container 12 and places it in the first container 11 placed on the port 10. Details of the storage device 50 will be described later.
 第2容器12は、移載装置30によって搬送される半導体ウエハWを格納する。第2容器12は、第1容器11よりも半導体ウエハWを高密度に格納する。ここで、密度は、容器の体積に対する半導体ウエハWの重量(又は枚数)で表される。従って、第2容器12では、上下に並んだ半導体ウエハWの間隔を第1容器11より狭く配置しているので、単位体積当たりの半導体ウエハWの枚数が第1容器11より多い。つまり、第2容器12は、第1容器11よりも高密度に半導体ウエハWを格納できる。例えば、1つの第2容器12に第1容器11と同数の半導体ウエハWを格納可能とする場合、第2容器12の高さ(上下方向の長さ)は、第1容器11の高さより低くなる。図7は、第2容器12の構成の一例を示す概略斜視図である。図7に示すように、第2容器12は、底部121と、蓋部122と、複数の支持体123とを備える。複数の支持体123は、底部121と蓋部122とに挟まれて配置される。各支持体123は、それぞれ半導体ウエハWを載せて支持可能である。 The second container 12 stores the semiconductor wafers W transported by the transfer device 30. The second container 12 stores the semiconductor wafers W at a higher density than the first container 11. Here, the density is expressed by the weight (or number) of the semiconductor wafers W relative to the volume of the container. Therefore, in the second container 12, the intervals between the semiconductor wafers W arranged vertically are narrower than in the first container 11, so that the number of semiconductor wafers W per unit volume is greater than that of the first container 11. In other words, the second container 12 can store the semiconductor wafers W at a higher density than the first container 11. For example, if one second container 12 can store the same number of semiconductor wafers W as the first container 11, the height (length in the vertical direction) of the second container 12 is lower than the height of the first container 11. FIG. 7 is a schematic perspective view showing an example of the configuration of the second container 12. As shown in FIG. 7, the second container 12 includes a bottom 121, a lid 122, and a plurality of supports 123. The multiple supports 123 are arranged between the bottom 121 and the lid 122. Each support 123 is capable of supporting a semiconductor wafer W.
 図8は、第2容器12を構成する支持体123の一例を示し、(A)は第1支持体123Aを示す図であり、(B)は第2支持体123Bを示す図である。支持体123は、図8に示すように、複数の第1支持体123Aと、複数の第2支持体123Bと、を含む。第1支持体123Aと第2支持体123Bとは、上下方向(Z方向)に交互に積み重ねられている。第1支持体123Aと第2支持体123Bとは、平面視において外縁形状が同一又はほぼ同一である。なお、平面視とは、上方(+Z方向)又は下方(-Z方向)から見た場合と同義である。第1支持体123Aは、枠体124Aと、第1保持部125Aとを有する。第1保持部125Aは、枠体124Aの複数カ所(例えば4カ所)から上方へ向かうように延びた後に下方へ向かうように湾曲して設けられ、先端部分で半導体ウエハWを支持する。同様に、第2支持体123Bは、枠体124Bと、第2保持部125Bとを有し、第2保持部125Bにより半導体ウエハWを支持する。 8 shows an example of the support 123 constituting the second container 12, where (A) is a diagram showing the first support 123A and (B) is a diagram showing the second support 123B. As shown in FIG. 8, the support 123 includes a plurality of first supports 123A and a plurality of second supports 123B. The first supports 123A and the second supports 123B are stacked alternately in the vertical direction (Z direction). The first supports 123A and the second supports 123B have the same or almost the same outer edge shape in a planar view. Note that a planar view is synonymous with a view from above (+Z direction) or below (-Z direction). The first support 123A has a frame 124A and a first holding portion 125A. The first holding portion 125A is provided so as to extend upward from a plurality of points (for example, four points) of the frame 124A and then curve downward, and supports the semiconductor wafer W at its tip portion. Similarly, the second support 123B has a frame 124B and a second holding portion 125B, and supports the semiconductor wafer W by the second holding portion 125B.
 第1支持体123Aと第2支持体123Bとの積層時は、平面視において、第1保持部125Aと第2保持部125Bとは重ならないように設けられている。また、積層時には、第1支持体123Aの第1保持部125Aは、この第1支持体123Aの上側に重ねられた第2支持体123Bの枠体124Bを貫通している。同様に、積層時には、第2支持体123Bの第2保持部125Bは、この第2支持体123Bの上側に重ねられた第1支持体123Aの枠体124Aを貫通している。 When the first support 123A and the second support 123B are stacked, the first holding portion 125A and the second holding portion 125B are arranged so that they do not overlap in a plan view. Furthermore, when stacked, the first holding portion 125A of the first support 123A penetrates the frame 124B of the second support 123B that is stacked on top of the first support 123A. Similarly, when stacked, the second holding portion 125B of the second support 123B penetrates the frame 124A of the first support 123A that is stacked on top of the second support 123B.
 第2容器12は、クレーン52により載置台51と、保管装置50の棚55との間を搬送される。第2容器12は、クレーン52により棚55から取り出されて載置台51に載置される。また、第2容器12は、クレーン52により載置台51から取り出されて棚55に載置される。載置台51は、移載装置30のフレーム30aに固定されることで、天井Cから吊り下げた状態となっている。なお、載置台51は、移載装置30又は保管装置50とは別の吊り金具5により天井Cから吊り下げられる形態であってもよい。載置台51は、図3に示すように、移載装置30に対して1つ設けられているが、この形態に限定されず、2つ以上設けられてもよい。 The second container 12 is transported between the placement platform 51 and the shelf 55 of the storage device 50 by the crane 52. The second container 12 is removed from the shelf 55 by the crane 52 and placed on the placement platform 51. The second container 12 is also removed from the placement platform 51 by the crane 52 and placed on the shelf 55. The placement platform 51 is suspended from the ceiling C by being fixed to the frame 30a of the transfer device 30. The placement platform 51 may be suspended from the ceiling C by a hanging bracket 5 separate from the transfer device 30 or the storage device 50. As shown in FIG. 3, one placement platform 51 is provided for the transfer device 30, but this is not limited to this configuration and two or more may be provided.
 開閉装置54は、第2容器12を開閉させ、開いた際に半導体ウエハWを出し入れ可能な状態にする。開閉装置54は、載置台51の+X側及び-X側に配置される。開閉装置54は、第2容器12の複数の第1支持体123A又は第2支持体123Bのいずれかを持ち上げることで半導体ウエハWを出し入れ可能とする。開閉装置54は、載置台51に対応して設けられており、載置台51が複数設けられる場合は、載置台51ごとに設けられる。開閉装置54は、載置台51の+X側及び-X側に配置される。 The opening and closing devices 54 open and close the second container 12, and when opened, make it possible to insert and remove the semiconductor wafer W. The opening and closing devices 54 are arranged on the +X side and -X side of the mounting table 51. The opening and closing devices 54 lift either the multiple first supports 123A or the multiple second supports 123B of the second container 12, making it possible to insert and remove the semiconductor wafer W. The opening and closing devices 54 are provided corresponding to the mounting table 51, and when multiple mounting tables 51 are provided, one is provided for each mounting table 51. The opening and closing devices 54 are arranged on the +X side and -X side of the mounting table 51.
 図9は、開閉装置54により第2容器12を開いた状態を示す図である。図9に示すように、開閉装置54は、支柱56と、第1支持片57と、第2支持片58とを備える。第1支持片57及び第2支持片58は、不図示の駆動部により複数の支持体123間に進退可能であり、さらに、支柱56に沿って上下方向に移動可能である。なお、第1支持片57及び第2支持片58は、第2容器12の開閉動作時において半導体ウエハWとは非接触である。 FIG. 9 is a diagram showing the state in which the second container 12 is opened by the opening/closing device 54. As shown in FIG. 9, the opening/closing device 54 includes a support 56, a first support piece 57, and a second support piece 58. The first support piece 57 and the second support piece 58 can advance and retreat between the multiple supports 123 by a drive unit (not shown), and can also move vertically along the support 56. Note that the first support piece 57 and the second support piece 58 are not in contact with the semiconductor wafer W during the opening and closing operation of the second container 12.
 第1支持片57は、例えば第2支持体123Bを持ち上げ可能であり、第2支持片58は、例えば第1支持体123Aを持ち上げ可能である。第1支持片57は、半導体ウエハWの受け渡し対象である第1支持体123Aの上側の第2支持体123Bを支持して持ち上げる。第2支持片58は、半導体ウエハWの受け渡し対象である第1支持体123Aを支持して持ち上げる。第1支持片57と第2支持片58との間隔は、第1支持体123Aに対して搬送部31による半導体ウエハWの受け渡しを行うための空間Dを形成させる間隔に設定される。なお、第2支持片58で第1支持体123Aを持ち上げることで、半導体ウエハWの受け渡し時に下側の第2支持体123Bと干渉することを回避できる。 The first support piece 57 can lift, for example, the second support 123B, and the second support piece 58 can lift, for example, the first support 123A. The first support piece 57 supports and lifts the second support 123B above the first support 123A, which is the object of transfer of the semiconductor wafer W. The second support piece 58 supports and lifts the first support 123A, which is the object of transfer of the semiconductor wafer W. The distance between the first support piece 57 and the second support piece 58 is set to a distance that forms a space D for the transfer of the semiconductor wafer W by the transfer unit 31 relative to the first support 123A. Note that by lifting the first support 123A with the second support piece 58, interference with the second support 123B below can be avoided when transferring the semiconductor wafer W.
 移載装置30は、搬送部31と、アライナ32とを備える。図10は、搬送部31の構成の一例を示す図である。図10に示すように、搬送部31は、基台33と、昇降軸34と、支持部35と、を備える。基台33は、移載装置30のフレーム30a(図1参照)の底部に固定される。なお、基台33は、フレーム30aに設けられたX方向のレールに沿って、不図示の走行駆動部によりX方向に走行可能に設けられてもよい。昇降軸34は、基台33の上面から上方(+Z方向)に延びて設けられ、不図示の昇降駆動部により昇降する(Z方向に移動する)。支持部35は、昇降軸34の上端に設けられ、昇降軸34とともに昇降する。 The transfer device 30 includes a transport unit 31 and an aligner 32. FIG. 10 is a diagram showing an example of the configuration of the transport unit 31. As shown in FIG. 10, the transport unit 31 includes a base 33, a lifting shaft 34, and a support unit 35. The base 33 is fixed to the bottom of the frame 30a (see FIG. 1) of the transfer device 30. The base 33 may be provided so as to be movable in the X direction by a travel drive unit (not shown) along an X direction rail provided on the frame 30a. The lifting shaft 34 extends upward (in the +Z direction) from the top surface of the base 33, and is raised and lowered (moves in the Z direction) by a lifting drive unit (not shown). The support unit 35 is provided at the upper end of the lifting shaft 34, and is raised and lowered together with the lifting shaft 34.
 支持部35には、ロボットアーム(水平多関節ロボット)を構成する第1アーム部41と、第2アーム部42と、ハンド部43とが設けられる。第1アーム部41は、一端が支持部35の上面に、不図示の駆動部により回転可能に設けられる。第2アーム部42は、一端が第1アーム部41の他端に、不図示の駆動部により回転可能に設けられる。ハンド部43は、一端が第2アーム部42の他端に、不図示の駆動部により回転可能に設けられる。ハンド部43の他端側は、例えば、半導体ウエハWの下面又は上面を吸着可能な吸着パッドを備えるエンドエフェクタである。 The support section 35 is provided with a first arm section 41, a second arm section 42, and a hand section 43, which constitute a robot arm (horizontal articulated robot). One end of the first arm section 41 is provided on the upper surface of the support section 35 so as to be rotatable by a drive section (not shown). One end of the second arm section 42 is provided on the other end of the first arm section 41 so as to be rotatable by a drive section (not shown). One end of the hand section 43 is provided on the other end of the second arm section 42 so as to be rotatable by a drive section (not shown). The other end of the hand section 43 is an end effector equipped with a suction pad capable of suctioning, for example, the bottom or top surface of the semiconductor wafer W.
 なお、ハンド部43は、半導体ウエハWを保持できればよく、その保持する形態は特に限定されない。また、本実施形態では、支持部35に1組の第1アーム部41、第2アーム部42、及びハンド部43を備えているが、この形態に限定されない。支持部35に複数組の第1アーム部41等が設けられる形態であってもよい。この場合、支持部35は、上下方向の軸まわりに回転可能に設けられてもよい。 The hand portion 43 is not particularly limited in the manner in which it holds the semiconductor wafer W, as long as it is capable of holding the semiconductor wafer W. In addition, in this embodiment, the support portion 35 is provided with a set of a first arm portion 41, a second arm portion 42, and a hand portion 43, but this is not limited to the manner. The support portion 35 may also be provided with multiple sets of first arm portions 41, etc. In this case, the support portion 35 may be provided to be rotatable around an axis in the vertical direction.
 第1アーム部41、第2アーム部42、及びハンド部43を有する搬送部31は、ポート10に載置された第1容器11から半導体ウエハWを取り出し可能であり、さらに、載置台51に載置されている第2容器12に半導体ウエハWを収容可能な寸法に形成されている。従って、搬送部31は、例えば、第1容器11から半導体ウエハWをすくい上げて取り出し、取り出した半導体ウエハWを、載置台51に載置された第2容器12の第1支持体123A又は第2支持体123Bに載置させることが可能である。なお、搬送部31の構成は、上記した形態に限定されない。搬送部31は、第1アーム部41等で構成する水平多関節ロボットを用いることに限定されず、例えば、伸縮する部材等を用いて構成される形態であってもよい。 The transport unit 31, which has the first arm 41, the second arm 42, and the hand 43, can remove the semiconductor wafer W from the first container 11 placed on the port 10, and is formed with dimensions capable of accommodating the semiconductor wafer W in the second container 12 placed on the mounting table 51. Therefore, the transport unit 31 can, for example, scoop up and remove the semiconductor wafer W from the first container 11, and place the removed semiconductor wafer W on the first support 123A or the second support 123B of the second container 12 placed on the mounting table 51. The configuration of the transport unit 31 is not limited to the above-mentioned form. The transport unit 31 is not limited to using a horizontal articulated robot composed of the first arm 41, etc., and may be configured using, for example, an expandable member, etc.
 アライナ32は、搬送部31が搬送する半導体ウエハWに対するズレ量の検出に用いられる。アライナ32は、図3に示すように、移載装置30のフレーム30a内に設置される。アライナ32は、例えば、搬送部31により載置された半導体ウエハWを回転させ、半導体ウエハWのエッジを検出することで、基準位置に対する平面方向におけるズレ量、及び回転方向におけるズレ量を検出する。なお、アライナ32の構成は任意であり、半導体ウエハWの基準位置に対するズレを検出可能な任意の構成を適用可能である。また、移載装置30がアライナ32を備えるか否かは任意である。移載装置30は、アライナ32を備えなくてもよい。 The aligner 32 is used to detect the amount of misalignment of the semiconductor wafer W transported by the transport unit 31. As shown in FIG. 3, the aligner 32 is installed in the frame 30a of the transfer device 30. For example, the aligner 32 rotates the semiconductor wafer W placed by the transport unit 31 and detects the edge of the semiconductor wafer W to detect the amount of misalignment in the planar direction and the rotational direction relative to a reference position. The aligner 32 may have any configuration, and any configuration capable of detecting the misalignment of the semiconductor wafer W relative to a reference position may be applied. In addition, it is optional whether or not the transfer device 30 is equipped with the aligner 32. The transfer device 30 does not have to be equipped with the aligner 32.
 保管装置50は、図1に示すように、載置台51と、クレーン52と、クレーン用天井軌道53と、開閉装置54と、棚55とを有する。保管装置50は、半導体ウエハWを収容した第2容器12を保管する。第2容器12は、クレーン52により棚55から載置台51に搬送され、また、クレーン52により載置台51から棚55に搬送される。クレーン52は、クレーン用天井軌道53において複数台配置されてもよい。複数台のクレーン52が用いられることにより、第2容器12を載置台51と棚55との間において効率よく搬送することができる。 As shown in FIG. 1, the storage device 50 has a mounting table 51, a crane 52, an overhead track for the crane 53, an opening/closing device 54, and a shelf 55. The storage device 50 stores the second container 12 containing the semiconductor wafers W. The second container 12 is transported from the shelf 55 to the mounting table 51 by the crane 52, and is also transported from the mounting table 51 to the shelf 55 by the crane 52. A plurality of cranes 52 may be arranged on the overhead track for the crane 53. By using a plurality of cranes 52, the second container 12 can be efficiently transported between the mounting table 51 and the shelf 55.
 図11は、クレーン52の構成の一例を示す図である。図11に示すように、クレーン52は、走行台車61と、2本のマスト62と、昇降台63と、移載部64とを備える。走行台車61は、吊り金具5により天井Cから吊り下げられたクレーン用天井軌道53に沿って、不図示の走行駆動部によりX方向に走行する。走行台車61は、クレーン用天井軌道53において、往復移動(一方向及びその逆方向への移動)が可能に制御される。2本のマスト62は、走行台車61の+X側及び-Y側に間隔をあけた状態で上下方向に設けられている。昇降台63は、2本のマスト62の間に配置され、不図示の昇降駆動部によってマスト62に沿って昇降する。昇降台63には、第2容器12を移載するための移載部64が設けられている。 FIG. 11 is a diagram showing an example of the configuration of the crane 52. As shown in FIG. 11, the crane 52 includes a traveling cart 61, two masts 62, a lifting platform 63, and a transfer unit 64. The traveling cart 61 travels in the X direction along the crane ceiling track 53 suspended from the ceiling C by the hanging bracket 5 by a travel drive unit (not shown). The traveling cart 61 is controlled so as to be capable of reciprocating movement (movement in one direction and the opposite direction) on the crane ceiling track 53. The two masts 62 are provided in the vertical direction with a gap between them on the +X side and -Y side of the traveling cart 61. The lifting platform 63 is disposed between the two masts 62 and moves up and down along the masts 62 by a lifting drive unit (not shown). The lifting platform 63 is provided with a transfer unit 64 for transferring the second container 12.
 移載部64は、例えばロボットアームが用いられ、第2容器12の底部121の下面を支持する。クレーン52は、走行台車61、昇降台63、及び移載部64を用いることにより、載置台51に載置されている第2容器12を棚55に搬送可能であり、また、棚55に載置されている第2容器12を載置台51に搬送可能である。 The transfer unit 64 is, for example, a robot arm, and supports the underside of the bottom 121 of the second container 12. By using the traveling cart 61, the lifting platform 63, and the transfer unit 64, the crane 52 can transport the second container 12 placed on the platform 51 to the shelf 55, and can also transport the second container 12 placed on the shelf 55 to the platform 51.
 開閉装置54は、上記したように、第2容器12に空間Dを形成させ、搬送部31による半導体ウエハWの受け渡しが可能な状態にする。搬送部31により空間Dを介して第2容器12に半導体ウエハWが格納された後、開閉装置54は、第1支持片57及び第2支持片58を下降させ、第1支持体123Aと第2支持体123Bとを重ねることで第2容器12を閉じることができる。クレーン52は、閉じた状態の第2容器12を載置台51からすくい上げて支持し、この状態で搬送する。 As described above, the opening/closing device 54 forms a space D in the second container 12, enabling the transfer unit 31 to transfer the semiconductor wafer W. After the transfer unit 31 stores the semiconductor wafer W in the second container 12 via the space D, the opening/closing device 54 lowers the first support piece 57 and the second support piece 58, and overlaps the first support 123A and the second support 123B to close the second container 12. The crane 52 scoops up the closed second container 12 from the mounting table 51, supports it, and transfers it in this state.
 棚55は、複数の第2容器12を保管する。棚55は、図2及び図3に示すように、吊り金具5により天井Cから吊り下げられたフレーム55a内において、上下方向に複数段、及び水平方向に複数列にわたって設けられている。フレーム55aの大きさは任意であり、例えば、平面視においてクレーン用天井軌道53の直線部分に合わせた寸法に設けられる。また、フレーム55aの下端は、所定高さH(図1参照)以上となるように設けられる。なお、棚55は、平面視においてクレーン用天井軌道53の曲線部分に対応して設けられてもよい。また、棚55は、図3に示すように、載置台51の+X及び-X側に設けられてもよい。 The shelves 55 store multiple second containers 12. As shown in Figures 2 and 3, the shelves 55 are arranged in multiple vertical stages and multiple horizontal rows in a frame 55a suspended from the ceiling C by the hanging brackets 5. The size of the frame 55a is arbitrary, and for example, the size is set to match the straight portion of the crane overhead track 53 in a plan view. The lower end of the frame 55a is set to be equal to or higher than a predetermined height H (see Figure 1). The shelves 55 may be arranged to correspond to the curved portion of the crane overhead track 53 in a plan view. The shelves 55 may also be arranged on the +X and -X sides of the mounting platform 51 as shown in Figure 3.
 1つの棚55は、1つの第2容器12を載置可能な寸法に設けられている。各棚55は、載置された第2容器12に対して窒素ガスなどの不活性ガスを供給する不図示のガス供給機構を備えていてもよい。棚55は、クレーン用天井軌道53に沿って配置される。具体的には、棚55は、図2及び図4に示すように、クレーン用天井軌道53の下方かつ側方において上下方向に複数段、及び水平方向に複数列にわたって設けられる。棚55が上下方向及び水平方向に複数設けられるので、保管装置50に多くの第2容器12を保管することができる。棚55の上下方向の間隔は、第2保管容器12の高さよりも広いが、第1保管容器11の高さよりも狭い。本実施形態とは異なり、例えば棚55に第1保管容器11を保管するために棚55の上下方向の間隔を第1保管容器11の高さよりも広くすると、第2保管容器12と同数の第1保管容器11を保管するには保管装置50の大型化を招くことになる。つまり、本実施形態の保管装置50は、上記したように第2容器12が第1容器11よりも高密度に半導体ウエハWを格納できることと、棚55の上下方向の間隔を狭くできることで、多くの半導体ウエハWをスペース効率よく保管することを実現している。 Each shelf 55 is provided with a size that allows one second container 12 to be placed thereon. Each shelf 55 may be provided with a gas supply mechanism (not shown) that supplies an inert gas such as nitrogen gas to the placed second container 12. The shelves 55 are arranged along the crane ceiling track 53. Specifically, as shown in FIG. 2 and FIG. 4, the shelves 55 are provided in multiple vertical stages and multiple horizontal rows below and to the side of the crane ceiling track 53. Since multiple shelves 55 are provided in the vertical and horizontal directions, many second containers 12 can be stored in the storage device 50. The vertical spacing of the shelves 55 is wider than the height of the second storage container 12 but narrower than the height of the first storage container 11. Unlike the present embodiment, for example, if the vertical spacing of the shelves 55 is wider than the height of the first storage container 11 in order to store the first storage container 11 on the shelf 55, the storage device 50 will become larger in size in order to store the same number of first storage containers 11 as the second storage containers 12. In other words, the storage device 50 of this embodiment realizes space-efficient storage of many semiconductor wafers W by allowing the second container 12 to store semiconductor wafers W at a higher density than the first container 11, as described above, and by narrowing the vertical spacing of the shelves 55.
 クレーン用天井軌道53は、図4に示すように、周回軌道53A、53Bと、接続軌道53Cと、昇降軌道53Dとを含んで設けられる。周回軌道53Bは、周回軌道53Aの内側に設けられている。周回軌道53A、53Bは、平面視で保管装置50の棚55を囲むように設けられる。また、棚55は、周回軌道53Aの外側にも設けられている。周回軌道53A、53Bを有することで、クレーン52をクレーン用天井軌道53において往復移動させることに加えて、周回移動させることも可能となり、複数のクレーン52が用いられる場合において、クレーン52同士の干渉を防止できる。 As shown in FIG. 4, the crane overhead track 53 includes circulating tracks 53A and 53B, a connecting track 53C, and a lifting track 53D. The circulating track 53B is provided inside the circulating track 53A. The circulating tracks 53A and 53B are provided so as to surround the shelves 55 of the storage device 50 in a plan view. The shelves 55 are also provided outside the circulating track 53A. By having the circulating tracks 53A and 53B, the crane 52 can be moved in a circular motion in addition to moving back and forth on the crane overhead track 53, and when multiple cranes 52 are used, interference between the cranes 52 can be prevented.
 接続軌道53Cは、周回軌道53Aと周回軌道53Bとを接続する。クレーン52は、接続軌道53Cを介して周回軌道53Aから周回軌道53Bに移動可能であり、接続軌道53Cを介して周回軌道53Bから周回軌道53Aに移動可能である。なお、クレーン52は、障害物センサが設けられており、走行方向の前方に例えば停止しているクレーン52が存在すると障害物センサの検出結果に基づいて走行を停止する。このように、クレーン用天井軌道53において複数台のクレーン52が稼働する場合であっても、クレーン52同士の干渉を防止している。 The connecting track 53C connects the orbital tracks 53A and 53B. The crane 52 can move from the orbital tracks 53A to 53B via the connecting track 53C, and from the orbital tracks 53B to 53A via the connecting track 53C. The crane 52 is equipped with an obstacle sensor, and if there is, for example, a stopped crane 52 ahead in the traveling direction, the crane 52 stops traveling based on the detection result of the obstacle sensor. In this way, even when multiple cranes 52 are operating on the crane overhead track 53, interference between the cranes 52 is prevented.
 昇降軌道53Dは、周回軌道53Aの一部から分岐して設けられる。昇降軌道53Dは、クレーン52を吊り下げた状態で昇降可能である。昇降軌道53Dにクレーン52を配置して昇降軌道53Dを下降させることで、クレーン52を床面F近傍まで下すことができる。従って、クレーン52を吊り下げた昇降軌道53Dを下降させることで、クレーン52のメンテナンス、クレーン52の交換等を容易に行うことができる。また、昇降軌道53D、及び周回軌道53Aから分岐して昇降軌道53Dに繋がる部分の軌道は、クレーン52の待機用軌道として用いることも可能である。例えば、複数台のクレーン52の一部を稼働しない場合、昇降軌道53D等にクレーン52を待機させることで、稼働しないクレーン52を無駄に走行させることを防止できる。 The lifting track 53D is provided by branching off from a part of the circular track 53A. The lifting track 53D can be raised and lowered with the crane 52 suspended from it. By placing the crane 52 on the lifting track 53D and lowering the lifting track 53D, the crane 52 can be lowered to the vicinity of the floor surface F. Therefore, by lowering the lifting track 53D from which the crane 52 is suspended, maintenance of the crane 52 and replacement of the crane 52 can be easily performed. In addition, the lifting track 53D and the track part that branches off from the circular track 53A and connects to the lifting track 53D can also be used as a waiting track for the crane 52. For example, when some of the multiple cranes 52 are not in operation, the crane 52 can be kept waiting on the lifting track 53D, etc., to prevent the non-operating crane 52 from running wastefully.
 ポート10及び移載装置30(載置台51を含む)のセットは、平面視において搬送車用天井軌道Rとクレーン用天井軌道53との間に複数配置される。ポート10及び移載装置30が複数セット配置されるので、半導体ウエハWを第1容器11から第2容器12に移し替える作業を複数カ所で行うことができ、物品の移し替え作業を効率よく行うことができる。また、図4に示すように、搬送車用天井軌道Rには、第1容器11を一時的に載置可能なバッファ60が設けられてもよい。バッファ60は、例えば、天井Cから吊り下げられた状態で設けられ、天井搬送車20によって第1容器11を受け渡し可能な位置に設けられる。 Multiple sets of ports 10 and transfer devices 30 (including the mounting platform 51) are arranged between the overhead track R for the transport vehicle and the overhead track 53 for the crane in a plan view. Since multiple sets of ports 10 and transfer devices 30 are arranged, the work of transferring the semiconductor wafers W from the first container 11 to the second container 12 can be performed in multiple locations, and the work of transferring items can be performed efficiently. In addition, as shown in FIG. 4, the overhead track R for the transport vehicle may be provided with a buffer 60 on which the first container 11 can be temporarily placed. The buffer 60 is provided, for example, in a state suspended from the ceiling C, and is provided in a position where the first container 11 can be handed over by the ceiling transport vehicle 20.
 次に、本実施形態に係る保管システム100の動作について説明する。図12から図15は、保管システム100の動作の一例を示す図である。保管システム100の動作は、不図示の制御装置によって制御される。天井搬送車20は、第1容器11を本体部22の格納位置に収容した状態で搬送車用天井軌道Rを走行する。制御装置は、ポート10に第1容器11を渡すように天井搬送車20を指示する。天井搬送車20は、保持部23により第1容器11を保持した状態で搬送車用天井軌道Rに沿って走行し、ポート10の側方まで移動して停止し、横出し機構25を突出させて第1容器11をポート10の上方に配置させる。続いて、昇降駆動部24を駆動して保持部23及び第1容器11を下降させることにより、第1容器11は、図12に示すように、保持部23からポート10に渡される。 Next, the operation of the storage system 100 according to this embodiment will be described. FIGS. 12 to 15 are diagrams showing an example of the operation of the storage system 100. The operation of the storage system 100 is controlled by a control device (not shown). The ceiling transport vehicle 20 travels along the ceiling track R for the transport vehicle with the first container 11 stored in the storage position of the main body 22. The control device instructs the ceiling transport vehicle 20 to deliver the first container 11 to the port 10. The ceiling transport vehicle 20 travels along the ceiling track R for the transport vehicle with the first container 11 held by the holding part 23, moves to the side of the port 10 and stops, and protrudes the side-discharge mechanism 25 to position the first container 11 above the port 10. Next, the lifting drive part 24 is driven to lower the holding part 23 and the first container 11, so that the first container 11 is delivered from the holding part 23 to the port 10 as shown in FIG. 12.
 続いて、移載装置30において、搬送部31は、図13に示すように、第1容器11に収容される半導体ウエハWを取り出し、取り出した半導体ウエハWをアライナ32に搬送する。アライナ32は、搬送部31から半導体ウエハWを受け取り、受け取った半導体ウエハWの位置を検出する。アライナ32は、検出した半導体ウエハWの位置と予め設定された基準位置との位置ズレ量を算出する。アライナ32は、算出結果を搬送部31に送信する。 Next, in the transfer device 30, the transport unit 31 removes the semiconductor wafer W contained in the first container 11 as shown in FIG. 13, and transports the removed semiconductor wafer W to the aligner 32. The aligner 32 receives the semiconductor wafer W from the transport unit 31 and detects the position of the received semiconductor wafer W. The aligner 32 calculates the amount of positional deviation between the detected position of the semiconductor wafer W and a preset reference position. The aligner 32 transmits the calculation result to the transport unit 31.
 続いて、搬送部31は、位置ズレを補正した状態で、アライナ32から半導体ウエハWを受け取って搬送する。なお、載置台51には、クレーン52により第2容器12が載置されている。開閉装置54は、載置台51に載置された第2容器12を開いて空間Dを形成する。搬送部31は、図14に示すように、第2容器12の空間Dに半導体ウエハWを進入させて、第2容器12の第1支持体123A又は第2支持体123Bに半導体ウエハWを載置する。不図示の制御装置は、第2容器12において半導体ウエハWの格納先に関する格納先情報を予め取得しており、半導体ウエハWを指定された格納先に搬送するように搬送部31を制御する。半導体ウエハWが格納された後、開閉装置54は、第2容器12を閉じる。 Then, the transport unit 31 receives the semiconductor wafer W from the aligner 32 with the positional deviation corrected, and transports it. The second container 12 is placed on the mounting table 51 by the crane 52. The opening and closing device 54 opens the second container 12 placed on the mounting table 51 to form a space D. As shown in FIG. 14, the transport unit 31 causes the semiconductor wafer W to enter the space D of the second container 12, and places the semiconductor wafer W on the first support 123A or the second support 123B of the second container 12. A control device (not shown) has acquired storage destination information regarding the storage destination of the semiconductor wafer W in the second container 12 in advance, and controls the transport unit 31 to transport the semiconductor wafer W to the designated storage destination. After the semiconductor wafer W is stored, the opening and closing device 54 closes the second container 12.
 続いて、クレーン52は、クレーン用天井軌道53を走行して載置台51の側方で停止する。続いて、図15に示すように、クレーン52は、載置台51に載置されている第2容器12を受け取り、予め決められた棚55に搬送する。このように、第1容器11の半導体ウエハWは、第2容器12に格納された状態で保管装置50により保管される。なお、保管装置50の第2容器12に格納された半導体ウエハWを第1容器11に移載する場合は、上記とは逆の手順により実行される。 Then, the crane 52 travels on the crane ceiling track 53 and stops to the side of the mounting table 51. Then, as shown in FIG. 15, the crane 52 receives the second container 12 placed on the mounting table 51 and transports it to a predetermined shelf 55. In this way, the semiconductor wafers W in the first container 11 are stored by the storage device 50 while being stored in the second container 12. Note that when the semiconductor wafers W stored in the second container 12 in the storage device 50 are transferred to the first container 11, the above procedure is reversed.
 図16は、クレーン用天井軌道53及び搬送車用天井軌道Rの他の例を示す図である。図16に示すように、保管システム100Aにおいて、搬送車用天井軌道Rは、平面視で複数のイントラベイ軌道R1と、インターベイ軌道R2とを有する。イントラベイ軌道R1は、第1容器11の搬送先である各種処理装置、及びポート10に対応して設けられている。インターベイ軌道R2は、複数のイントラベイ軌道R1同士を接続する。天井搬送車20は、インターベイ軌道R2から複数のイントラベイ軌道R1のいずれかに進入することができ、また、イントラベイ軌道R1からインターベイ軌道R2に進入することができる。 FIG. 16 is a diagram showing another example of the ceiling track 53 for the crane and the ceiling track R for the transport vehicle. As shown in FIG. 16, in the storage system 100A, the ceiling track R for the transport vehicle has multiple intrabay tracks R1 and interbay tracks R2 in a plan view. The intrabay tracks R1 are provided corresponding to the various processing devices and ports 10 to which the first container 11 is transported. The interbay tracks R2 connect the multiple intrabay tracks R1 together. The ceiling transport vehicle 20 can enter any of the multiple intrabay tracks R1 from the interbay track R2, and can also enter the interbay track R2 from the intrabay track R1.
 クレーン用天井軌道53は、複数のイントラベイ軌道R1に挟まれた領域を含んで周回するように設けられる。クレーン52は、クレーン用天井軌道53において複数台(図16に示す例では3台)配置されている。ポート10及び移載装置30のセットは、平面視においてイントラベイ軌道R1とクレーン用天井軌道53とに挟まれた部分に配置される。図16に示す例では、イントラベイ軌道R1とクレーン用天井軌道53とに挟まれた部分が4カ所あり、それぞれにポート10及び移載装置30が配置されている。すなわち、ポート10及び移載装置30が4セット配置されているが、この形態に限定されず、3セット以下であってもよい。 The crane ceiling track 53 is arranged to orbit around the area sandwiched between multiple intrabay tracks R1. Multiple cranes 52 (three in the example shown in Figure 16) are arranged on the crane ceiling track 53. A set of ports 10 and transfer devices 30 is arranged in the area sandwiched between the intrabay track R1 and the crane ceiling track 53 in a plan view. In the example shown in Figure 16, there are four areas sandwiched between the intrabay track R1 and the crane ceiling track 53, and a port 10 and transfer device 30 are arranged in each of them. That is, four sets of ports 10 and transfer devices 30 are arranged, but this is not limited to the form and there may be three sets or less.
 また、保管装置50は、周回軌道であるクレーン用天井軌道53の内側及び外側において、クレーン用天井軌道53に沿って設けられる。この構成によれば、天井搬送車20は、複数のイントラベイ軌道R1のいずれにおいてもポート10に対して第1容器11を受け渡すことができる。また、クレーン52は、クレーン用天井軌道53を走行することで、複数の載置台51のいずれにおいても、又は複数の棚55のいずれにおいても、第2容器12を受け渡すことができる。 The storage device 50 is also provided along the crane ceiling track 53, inside and outside the crane ceiling track 53, which is a circular track. With this configuration, the ceiling transport vehicle 20 can deliver the first container 11 to the port 10 on any of the multiple intra-bay tracks R1. Furthermore, the crane 52 can deliver the second container 12 on any of the multiple loading platforms 51 or any of the multiple shelves 55 by traveling on the crane ceiling track 53.
 このように、本実施形態に係る保管システム100によれば、第2容器12に高密度に半導体ウエハWを格納することができ、さらに、第2容器12を保管する保管装置50が天井Cから吊り下げられるので、保管装置50が床面Fを占有せず、床面Fの空きスペースを広く確保することができる。その結果、床面Fにおいて作業者の通行スペース、作業スペースを確保することができ、又は多くの処理装置等を床面Fに設置することができる。 In this way, according to the storage system 100 of this embodiment, semiconductor wafers W can be stored at high density in the second container 12, and further, since the storage device 50 that stores the second container 12 is suspended from the ceiling C, the storage device 50 does not occupy the floor surface F, and a large amount of free space on the floor surface F can be secured. As a result, it is possible to secure passage space and working space for workers on the floor surface F, or it is possible to install many processing devices, etc. on the floor surface F.
 以上、本発明の実施形態について説明したが、本発明の技術的範囲は、上記した実施形態に限定されない。上記した実施形態に、多様な変更又は改良を加えることが可能であることは当業者において明らかである。また、そのような変更又は改良を加えた形態も本発明の技術的範囲に含まれる。上記した実施形態で説明した要件の1つ以上は、省略されることがある。また、上記した実施形態で説明した要件は、適宜組み合わせることができる。さらに、法律で許可される範囲内で、日本特許出願番号2022-153343および上記の実施形態で引用された全ての文献の開示は、本文の記載の一部として参照されることとする。また、実施形態において示した各動作の実行順序は、前の動作の結果を後の動作で用いない限り、任意の順序で実現可能である。また、上記した実施形態における動作に関して、便宜上「先ず」、「次に」、「続いて」等を用いて説明したとしても、この順序で実施することが必須ではない。 Although the embodiments of the present invention have been described above, the technical scope of the present invention is not limited to the above-mentioned embodiments. It is clear to those skilled in the art that various modifications or improvements can be made to the above-mentioned embodiments. Furthermore, forms with such modifications or improvements are also included in the technical scope of the present invention. One or more of the requirements described in the above-mentioned embodiments may be omitted. Furthermore, the requirements described in the above-mentioned embodiments may be combined as appropriate. Furthermore, to the extent permitted by law, the disclosures of Japanese Patent Application No. 2022-153343 and all documents cited in the above-mentioned embodiments are to be referred to as part of the description in this document. Furthermore, the execution order of each operation shown in the embodiment can be realized in any order as long as the result of the previous operation is not used in the subsequent operation. Furthermore, even if the operations in the above-mentioned embodiments are described using "first," "next," "followed," etc. for convenience, it is not necessary to perform them in this order.
C・・・天井
H・・・所定高さ
F・・・床面
R・・・搬送車用天井軌道
R1・・・イントラベイ軌道
R2・・・インターベイ軌道
W・・・半導体ウエハ(物品)
5・・・吊り金具
10・・・ポート
11・・・第1容器
12・・・第2容器
20・・・天井搬送車
30・・・移載装置
31・・・搬送部
32・・・アライナ
40・・・搬送装置
50・・・保管装置
51・・・載置台
52・・・クレーン
53・・・クレーン用天井軌道
53A、53B・・・周回軌道
53D・・・昇降軌道
54・・・開閉装置
55・・・棚
64・・・移載部
100、100A・・・保管システム
C: ceiling H: predetermined height F: floor R: ceiling track for transport vehicle R1: intrabay track R2: interbay track W: semiconductor wafer (item)
5... Suspension fitting 10... Port 11... First container 12... Second container 20... Ceiling transport vehicle 30... Transfer device 31... Transport section 32... Aligner 40... Transport device 50... Storage device 51... Placement platform 52... Crane 53... Ceiling track for crane 53A, 53B... Circulating track 53D... Lifting track 54... Opening/closing device 55... Shelf 64... Transfer section 100, 100A... Storage system

Claims (10)

  1.  物品を格納する第1容器が載置されるポートと、
     前記ポートに載置された前記第1容器から、前記第1容器よりも前記物品を高密度に格納する第2容器に前記物品を移載する移載装置と、
     天井から吊り下げられた状態で配置され、前記物品が移載された前記第2容器が載置される棚を有する保管装置と、を備える保管システム。
    a port on which a first container for storing an item is placed;
    a transfer device that transfers the object from the first container placed on the port to a second container that stores the object at a higher density than the first container;
    a storage device arranged in a suspended state from a ceiling and having a shelf on which the second container to which the item has been transferred is placed.
  2.  前記ポート及び前記移載装置は、前記天井から吊り下げられた状態で配置される、請求項1に記載の保管システム。 The storage system according to claim 1, wherein the port and the transfer device are arranged in a suspended state from the ceiling.
  3.  前記ポート、前記移載装置、及び前記保管装置は、床面からそれぞれの下端までの高さが作業者の通行可能又は装置を設置可能な所定高さに設定される、請求項2に記載の保管システム。 The storage system according to claim 2, wherein the height from the floor surface to the bottom end of the port, the transfer device, and the storage device is set to a predetermined height that allows workers to pass through or allows devices to be installed.
  4.  前記保管装置は、
     クレーンと、
     前記クレーンが吊り下げられた状態で走行するためのクレーン用天井軌道と、
     前記移載装置により前記物品が移載された前記第2容器を載置する載置台と、を備え、
     前記クレーンは、前記クレーン用天井軌道を走行して前記第2容器を搬送し、前記棚及び前記載置台のそれぞれに対して前記第2容器を受け渡す移載部を備え、
     前記棚は、前記クレーン用天井軌道に沿って配置される、請求項1に記載の保管システム。
    The storage device includes:
    A crane and
    A crane overhead track along which the crane travels while suspended;
    a placement table for placing the second container to which the article has been transferred by the transfer device,
    The crane includes a transfer unit that travels along the crane overhead track to transport the second container and transfers the second container to each of the shelf and the placement table,
    The storage system of claim 1 , wherein the shelves are positioned along the crane overhead track.
  5.  前記棚は、前記クレーン用天井軌道の下方かつ側方において上下方向に複数段、及び水平方向に複数列にわたって設けられる、請求項4に記載の保管システム。 The storage system according to claim 4, wherein the shelves are arranged in multiple vertical stages and multiple horizontal rows below and to the sides of the crane overhead track.
  6.  前記クレーンは、前記クレーン用天井軌道において複数台配置される、請求項4に記載の保管システム。 The storage system according to claim 4, wherein a plurality of the cranes are arranged on the overhead crane track.
  7.  前記クレーン用天井軌道は、平面視で前記保管装置を囲む周回軌道を含んで設けられる、請求項4に記載の保管システム。 The storage system according to claim 4, wherein the crane overhead track includes a circular track that surrounds the storage device in a plan view.
  8.  前記クレーン用天井軌道は、前記クレーンを吊り下げた状態で昇降可能な昇降軌道を含んで設けられる、請求項4に記載の保管システム。 The storage system according to claim 4, wherein the crane ceiling track includes a lift track that allows the crane to be raised and lowered while suspended.
  9.  前記ポート及び前記移載装置のセットは、前記クレーン用天井軌道に沿って複数セット配置される、請求項4に記載の保管システム。 The storage system according to claim 4, wherein a plurality of sets of the port and the transfer device are arranged along the overhead track for the crane.
  10.  前記ポートに対して前記第1容器を受け渡す天井搬送車と、
     前記天井搬送車が吊り下げられた状態で走行するための搬送車用天井軌道と、を備え、
     前記搬送車用天井軌道は、前記第1容器の搬送先に対応する複数のイントラベイ軌道と、前記イントラベイ軌道同士を接続するインターベイ軌道とを有し、
     前記ポート及び前記移載装置の前記セットは、前記複数のイントラベイ軌道のそれぞれに対応して設けられる、請求項9に記載の保管システム。
    a ceiling transport vehicle for delivering the first container to the port;
    a ceiling track for the overhead transport vehicle along which the overhead transport vehicle runs in a suspended state;
    The overhead track for the transport vehicle includes a plurality of intra-bay tracks corresponding to the transport destinations of the first container and an inter-bay track connecting the intra-bay tracks,
    The storage system according to claim 9 , wherein the set of the port and the transfer device is provided corresponding to each of the plurality of intrabay tracks.
PCT/JP2023/033003 2022-09-27 2023-09-11 Storage system WO2024070624A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020153039A1 (en) * 2019-01-25 2020-07-30 村田機械株式会社 Storage system
WO2020153041A1 (en) * 2019-01-25 2020-07-30 村田機械株式会社 Transport system
WO2021044791A1 (en) * 2019-09-02 2021-03-11 村田機械株式会社 Wafer delivery device, wafer storage container, and wafer storage system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020153039A1 (en) * 2019-01-25 2020-07-30 村田機械株式会社 Storage system
WO2020153041A1 (en) * 2019-01-25 2020-07-30 村田機械株式会社 Transport system
WO2021044791A1 (en) * 2019-09-02 2021-03-11 村田機械株式会社 Wafer delivery device, wafer storage container, and wafer storage system

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