WO2024066176A1 - 偏振薄膜及其制作方法、光波导镜片、显示装置 - Google Patents

偏振薄膜及其制作方法、光波导镜片、显示装置 Download PDF

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Publication number
WO2024066176A1
WO2024066176A1 PCT/CN2023/077336 CN2023077336W WO2024066176A1 WO 2024066176 A1 WO2024066176 A1 WO 2024066176A1 CN 2023077336 W CN2023077336 W CN 2023077336W WO 2024066176 A1 WO2024066176 A1 WO 2024066176A1
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WIPO (PCT)
Prior art keywords
polarizing film
transparent substrate
light
optical waveguide
grating
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Ceased
Application number
PCT/CN2023/077336
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English (en)
French (fr)
Inventor
罗明辉
周振
乔文
陈林森
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Suzhou University
SVG Tech Group Co Ltd
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Suzhou University
SVG Tech Group Co Ltd
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Priority to KR1020257009307A priority Critical patent/KR20250048589A/ko
Priority to JP2025518168A priority patent/JP2025532882A/ja
Publication of WO2024066176A1 publication Critical patent/WO2024066176A1/zh
Priority to US19/091,801 priority patent/US20250251538A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/126—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind using polarisation effects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers

Definitions

  • the present invention relates to the field of display technology, and in particular to a polarizing film and a manufacturing method thereof, an optical waveguide lens, and a display device.
  • Polarizing film is a very important optical component used in systems such as liquid crystal display, optical measurement and optical communication. It is very suitable for applications that require high contrast polarization, such as micro-projectors, polarization beam splitters, and display devices such as head-up displays. These systems require polarizing films to have high extinction ratios, a wide range of incident angles, and very compact volumes. Polarizing films are designed to transmit the desired polarization state while reflecting the unwanted state, and can achieve spectral flatness performance at incident angles up to 45°, so they are widely used as polarization beam splitters. In addition, polarizing reflective films based on metal wire grids can achieve durability in high temperature or high humidity environments, and can also provide excellent polarization beam splitting performance in the visible and near-infrared spectral ranges from 400nm to 1200nm.
  • a polarizing film comprising:
  • a grating layer located on the transparent substrate, the grating layer comprising a dielectric grating and a metal layer periodically arranged in a direction parallel to the surface of the transparent substrate;
  • the protective layer covers the grating layer.
  • the period of the dielectric grating is 50 nm to 150 nm
  • the duty cycle of the dielectric grating is 0.25 to 0.75
  • the thickness of the dielectric grating is 60 nm to 200 nm.
  • the material of the dielectric grating is a resin-based curing adhesive, and the dielectric grating and the metal layer have the same thickness.
  • the refractive index of the transparent substrate is 1.4-2
  • the refractive index of the dielectric grating is 1.4 ⁇ 2.
  • the transparent substrate is a flexible substrate.
  • the material of the flexible substrate is selected from at least one of polycarbonate, polyvinyl chloride, polyethylene terephthalate, polymethyl methacrylate, polypropylene and triacetyl cellulose.
  • the thickness of the transparent substrate is 0.01 mm to 1 mm.
  • the refractive index of the protective layer is 1.3-1.8, and the thickness of the protective layer is 50 nm-200 nm.
  • the material of the protective layer is selected from at least one of SiO 2 , MgF 2 and SiON.
  • the material of the metal layer is selected from at least one of gold, silver, copper, aluminum and tungsten.
  • the present invention provides a polarizing film with a novel structure.
  • the grating structure is an alternating arrangement of dielectric gratings and metal layers. Due to the different refractive indices of the dielectric grating and the metal layer, the equivalent refractive index values of S light and P light are different.
  • S light irradiates the grating structure
  • the electrons in the metal layer form enhanced free oscillations in the grating line direction, so that the S light forms enhanced reflection;
  • P light irradiates the electron oscillation is hindered in the grating line direction, and the transmission of P light is enhanced.
  • the polarizing film of the present invention has the optical properties of reducing absorption loss and improving extinction ratio.
  • the polarizing film designed by the present invention has a large angle tolerance, which has good applicability for large-angle application scenarios. Therefore, it can take into account the optical properties of low absorption loss, high extinction ratio and wide incident angle, which is conducive to wide application.
  • the present invention also provides a method for manufacturing a polarizing film, comprising the following steps:
  • the grating layer comprises a dielectric grating and a metal layer periodically arranged in a direction parallel to a surface of the transparent substrate, and the dielectric grating and the metal layer have the same thickness;
  • a protective layer is formed on the grating layer to obtain a polarizing film.
  • the operation of forming a grating layer on a transparent substrate is:
  • a metal layer precursor is formed on the dielectric grating by a coating process, and then the metal layer precursor on the side of the dielectric grating away from the transparent substrate is removed, and the metal layer precursor in the groove is retained to obtain a metal layer.
  • the operation of forming a dielectric grating spaced apart in a direction parallel to the surface of the transparent substrate on a transparent substrate by nanoimprinting is as follows: the transparent substrate is fitted with an imprinting template, an imprinting glue is coated between the transparent substrate and the imprinting template, and then the transparent substrate and the imprinting template are squeezed, and after the imprinting glue is solidified, the imprinting template is demolded from the imprinting glue, so that the dielectric grating spaced apart in a direction parallel to the surface of the transparent substrate is formed on the transparent substrate.
  • the operation of forming the protective layer on the dielectric grating and the metal layer is:
  • the coating process forms a protective layer on the dielectric grating and the metal layer.
  • the polarizing film manufacturing method described above can be used to manufacture a polarizing film of a novel structure of the present invention.
  • Experimental verification shows that the polarizing film can have the optical properties of low absorption loss, high extinction ratio and wide incident angle, which is conducive to wide application.
  • a display device comprises any one of the above polarizing films.
  • the display device is a projector, a polarization beam splitter prism or a head-up display.
  • An optical waveguide lens comprising:
  • an optical waveguide having a light receiving surface for receiving light and a backlight surface located on the other side of the light receiving surface
  • any of the above polarizing films wherein the polarizing film is located on the backlight surface of the optical waveguide, and the transparent substrate of the polarizing film is arranged away from the optical waveguide;
  • the transmittance of the polarizing film to S-polarized light is less than 5%, and the transmittance of the polarizing film to P-polarized light is greater than or equal to 60%.
  • the distance between the optical waveguide and the polarizing film is 1 ⁇ m to 5 cm.
  • the polarizing film is fixed to the optical waveguide by means of an adhesive, and the adhesive is located at the edge of the polarizing film and the optical waveguide.
  • the optical waveguide lens further includes a rigid substrate for supporting the polarizing film, and the rigid substrate is attached to a side of the polarizing film away from the optical waveguide.
  • the polarizing film can take into account the optical performance of lower absorption loss, higher extinction ratio and wide incident angle, thereby improving the performance of display devices and optical waveguide lenses using the polarizing film, making the display devices and optical waveguide lenses conducive to wide application.
  • FIG1 is a schematic diagram of optical properties of a polarizing film according to an embodiment of the present invention.
  • FIG2 is a schematic structural diagram of a polarizing film according to an embodiment of the present invention.
  • FIG3 is a flow chart of a method for manufacturing a polarizing film according to an embodiment of the present invention.
  • FIG4 is an overall schematic diagram of an optical waveguide lens according to an embodiment of the present invention.
  • FIG5 is a schematic diagram of light rays of an optical waveguide lens according to an embodiment of the present invention.
  • FIG6 is a transmittance spectrum diagram of the polarizing film of Example 1 of the present invention when P light and S light are incident normally;
  • FIG7 is a transmittance spectrum diagram of P light and S light of the polarizing film of Example 1 of the present invention at different incident angles;
  • FIG8 is a reflectance spectrum diagram of P light and S light of the polarizing film of Example 1 of the present invention.
  • FIG9 is a transmittance spectrum diagram of the polarizing films of Examples 2 to 6 of the present invention at 0 degree incidence for P light and S light in the visible light band;
  • FIG10 is a transmittance spectrum diagram of the polarizing films of Examples 7 to 11 of the present invention at 0 degrees of incidence for P light and S light in the visible light band;
  • FIG11 is a transmittance spectrum diagram of the polarizing films of Examples 12 to 16 of the present invention at 0 degree incidence for P light and S light in the visible light band;
  • FIG12 is a transmittance spectrum diagram of the polarizing films of Examples 1 and 17 to 20 of the present invention at 0 degree incidence for P light and S light in the visible light band;
  • FIG13 is a transmittance spectrum diagram of the polarizing film of Example 17 of the present invention when P light and S light are incident normally;
  • FIG14 is a transmittance spectrum diagram of the polarizing film of Example 18 of the present invention when P light and S light are incident normally;
  • FIG15 is a transmittance spectrum diagram of the polarizing film of Example 19 of the present invention when P light and S light are incident normally;
  • FIG16 is a transmittance spectrum diagram of the polarizing film of Example 20 of the present invention when P light and S light are incident normally;
  • FIG17 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 17 of the present invention.
  • FIG18 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 18 of the present invention.
  • FIG19 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 19 of the present invention.
  • FIG20 is a transmittance spectrum diagram of P light and S light of the polarizing film of Example 20 of the present invention at different incident angles;
  • FIG21 is a transmittance spectrum diagram of the polarizing films of Examples 1 and 21 to 24 of the present invention at 0 degree incidence for P light and S light in the visible light band;
  • FIG22 is a transmittance spectrum diagram of the polarizing film of Example 21 of the present invention when P light and S light are incident normally;
  • FIG23 is a transmittance spectrum diagram of the polarizing film of Example 22 of the present invention when P light and S light are incident normally;
  • FIG24 is a transmittance spectrum diagram of the polarizing film of Example 23 of the present invention when P light and S light are incident normally;
  • FIG25 is a transmittance spectrum diagram of the polarizing film of Example 24 of the present invention when P light and S light are incident normally;
  • FIG26 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 21 of the present invention.
  • FIG27 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 22 of the present invention.
  • FIG28 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 23 of the present invention.
  • FIG29 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 24 of the present invention.
  • FIG30 is a transmittance spectrum diagram of the polarizing films of Examples 1 and 25 to 28 of the present invention at 0 degree incidence for P light and S light in the visible light band;
  • FIG31 is a transmittance spectrum diagram of the polarizing film of Example 25 of the present invention when P light and S light are incident normally;
  • FIG32 is a transmittance spectrum diagram of the polarizing film of Example 26 of the present invention when P light and S light are incident normally;
  • FIG33 is a transmittance spectrum diagram of the polarizing film of Example 27 of the present invention when P light and S light are incident normally;
  • FIG34 is a transmittance spectrum diagram of the polarizing film of Example 28 of the present invention when P light and S light are incident normally;
  • FIG35 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 25 of the present invention.
  • FIG36 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 26 of the present invention.
  • FIG37 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 27 of the present invention.
  • FIG38 is a transmittance spectrum diagram of P light and S light at different incident angles of the polarizing film of Example 28 of the present invention.
  • FIG. 39 is a transmittance spectrum diagram of P light and S light in the visible light band of the polarizing films of Examples 29 to 33 of the present invention at an incidence of 0 degrees.
  • FIG. 1 is a schematic diagram of the optical properties of the polarizing film of the present invention.
  • the P light When incident light including S light and P light enters the polarizing film, the P light has a higher transmittance Tp and the S light has a lower transmittance Ts. At the same time, the P light has a lower reflectivity Rp and the S light has a higher reflectivity Rs.
  • a polarizing film 100 includes a transparent substrate 110, a grating layer 120, and a protective layer 130.
  • the grating layer 120 is located on the transparent substrate 110, and includes a dielectric grating 121 and a metal layer 122 that are periodically arranged in a direction parallel to the surface of the transparent substrate 110.
  • the dielectric grating 121 and the metal layer 122 have the same thickness h2. In other embodiments, the dielectric grating 121 and the metal layer 122 may have different thickness h2.
  • the protective layer 130 covers the grating layer 120.
  • the transparent substrate 110 provides support for the grating layer 120 and the protective layer 130 located on the upper layer, and the transmittance of the transparent substrate 110 under visible light is greater than 80%.
  • the protective layer 130 is used to protect the transparent substrate 110 and the grating layer 120, and can Prevent oxidation of the metal layer 122.
  • the period of the dielectric grating 121 is 50nm-150nm
  • the duty cycle of the dielectric grating 121 is 0.25-0.75
  • the thickness of the dielectric grating 121 is 60nm-200nm.
  • the period of the dielectric grating 121 may be, for example, 50 nm, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm or 150 nm
  • the duty cycle of the dielectric grating 121 may be, for example, 0.25, 0.30, 0.35, 0.40, 0.45, 0.50, 0.55, 0.60, 0.65, 0.70 or 0.75
  • the thickness of the dielectric grating 121 may be, for example, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm or 200 nm. It is understood that in the polarizing film of the present invention, the period of the dielectric grating, the duty cycle of the dielectric grating
  • the thickness of the metal layer 122 also ranges from 60 nm to 200 nm. Specifically, the thickness of the metal layer 122 may be, for example, 60 nm, 70 nm, 80 nm, 90 nm, 100 nm, 110 nm, 120 nm, 130 nm, 140 nm, 150 nm, 160 nm, 170 nm, 180 nm, 190 nm or 200 nm.
  • the duty cycle of the dielectric grating refers to the ratio of the width of the dielectric grating to the period.
  • the refractive index N1 of the transparent substrate 110 is 1.4-2
  • the refractive index N2 of the dielectric grating 121 is 1.4-2.
  • the refractive index N1 of the transparent substrate 110 can be, for example, 1.4, 1.5, 1.6, 1.7, 1.8, 1.9 or 2
  • the refractive index N2 of the dielectric grating 121 can be, for example, 1.4, 1.5, 1.6, 1.7, 1.8, 1.9 or 2.
  • the refractive index N1 of the transparent substrate and the refractive index N2 of the dielectric grating are not limited thereto, and can also be other values.
  • the transparent substrate 110 is a flexible substrate.
  • the transparent substrate 110 is a flexible substrate, it can be applied to the flexible manufacturing of polarizing films and applied to some scenes requiring flexible polarizing films, thus expanding the application range of polarizing films.
  • the material of the flexible substrate is selected from at least one of polycarbonate (PC), polyvinyl chloride (PVC), polyethylene terephthalate (PET), polymethyl methacrylate (PMMA), polypropylene (PP) and triacetyl cellulose (TAC).
  • PC polycarbonate
  • PVC polyvinyl chloride
  • PET polyethylene terephthalate
  • PMMA polymethyl methacrylate
  • PP polypropylene
  • TAC triacetyl cellulose
  • the thickness of the transparent substrate 110 is 10 micrometers to 1 millimeter.
  • the material of the dielectric grating 121 is a resin curing adhesive.
  • the resin curing adhesive can be a UV adhesive, and of course, it can also be other resin curing adhesives.
  • the refractive index N3 of the protective layer 130 is 1.3-1.8, and the thickness of the protective layer 130 is 50nm-200nm.
  • the refractive index N3 of the protective layer 130 can be, for example, 1.3, 1.4, 1.5, 1.6, 1.7 or 1.8.
  • the refractive index N3 of the protective layer is not limited thereto, and can also be other feasible values.
  • the material of the protection layer 130 is selected from at least one of SiO 2 , MgF 2 and SiON.
  • the material of the metal layer 122 is selected from at least one of gold, silver, copper, aluminum and tungsten.
  • the type of the polarizing film of the present invention is not limited, and it can be a reflective film, a transmissive film, or a diffractive film.
  • the polarizing film of the present invention has a grating structure in which a dielectric grating and a metal layer are alternately arranged. Due to the different refractive indices of the dielectric grating and the metal layer, the equivalent refractive indices of S light and P light are different.
  • S light irradiates the grating structure, the electrons in the metal layer form enhanced free oscillations in the direction of the grating lines, so that the S light forms enhanced reflection; when P light irradiates, the electron oscillation is hindered in the direction of the grating lines, and the transmission of P light is enhanced. Therefore, the polarizing film of the present invention has the optical properties of reducing absorption loss and improving extinction ratio.
  • the polarizing film designed by the present invention has a large angle tolerance, which has good applicability for large-angle application scenarios. Therefore, it can take into account the optical properties of low absorption loss, high extinction ratio and wide incident angle, which is conducive to wide application.
  • a method for manufacturing a polarizing film according to an embodiment of the present invention comprises the following steps:
  • a grating layer on a transparent substrate, wherein the grating layer includes a dielectric grating and a metal layer periodically arranged in a direction parallel to a surface of the transparent substrate, and the dielectric grating and the metal layer have the same thickness.
  • step S10 the operation of forming a grating layer on the transparent substrate is:
  • a dielectric grating is formed on a transparent substrate by a nanoimprint method, and the dielectric gratings are arranged in a direction parallel to the surface of the transparent substrate, and a groove is formed between two adjacent dielectric gratings;
  • a metal layer precursor is formed on the dielectric grating through a coating process, and then the metal layer precursor on the side of the dielectric grating away from the transparent substrate is removed, and the metal layer precursor in the groove is retained to obtain a metal layer.
  • the operation of forming a dielectric grating spaced apart in a direction parallel to the surface of the transparent substrate on a transparent substrate by nanoimprinting is as follows: the transparent substrate is attached to an imprinting template, an imprinting adhesive is coated between the transparent substrate and the imprinting template, and then the transparent substrate and the imprinting template are squeezed, and after the imprinting adhesive is solidified, the imprinting template is demoulded from the imprinting adhesive, that is, the dielectric grating spaced apart in a direction parallel to the surface of the transparent substrate is formed on the transparent substrate.
  • the imprinting template is a hard master template with a groove structure, and the groove structure matches the structure and size of the dielectric grating.
  • an embossing glue is coated on the transparent substrate or the embossing template.
  • the coating process may be an electron beam evaporation process.
  • the specific operation of the coating process is: use a high-temperature tape to attach the transparent substrate and the dielectric grating to the fixture, then put them into the coating equipment together, then evacuate, introduce O 2 and Ar 2 , set the coating parameters (including coating type, coating time, coating rate, etc.), and form a metal layer on the dielectric grating after the coating is completed.
  • the metal layer precursor on the side of the dielectric grating away from the transparent substrate can be removed by a polishing process.
  • a chemical mechanical polishing (CMP) method is used, and the polishing parameters are as follows: the film layer is Al, the film thickness is 100nm to 200nm, the grinding time is 10min to 40min, the polishing liquid for aluminum is selected, the polishing disk speed is 40r/min, the sample speed is 60r/min, the uniformity is ⁇ 5%, and the surface roughness is 1nm to 10nm.
  • CMP chemical mechanical polishing
  • step S20 forming a protective layer on the grating layer obtained in step S10 to obtain a polarizing film.
  • step S20 the operation of forming a protective layer on the dielectric grating and the metal layer is: forming the protective layer on the dielectric grating and the metal layer by a coating process.
  • the coating process may be a thermal evaporation process.
  • the coating parameters are as follows: SiO 2 coating, coating thickness of 5nm-200nm, coating rate of 0.1A/S-10A/S, working vacuum of 5E-6Torr, coating time of 1min-60min.
  • the polarizing film manufacturing method described above can be used to manufacture a polarizing film of a novel structure of the present invention.
  • Experimental verification shows that the polarizing film can have the optical properties of low absorption loss, high extinction ratio and wide incident angle, which is conducive to wide application.
  • a display device (not shown) according to an embodiment of the present invention includes any one of the above polarizing films.
  • the display device is a projector, a polarization beam splitter prism or a head-up display. More specifically, the display device can be, for example, a projection optical system, an AR/VR system, a television, a computer, a consumer electronic display device or polarized glasses.
  • the polarizing film can take into account the optical properties of low absorption loss, high extinction ratio and wide incident angle, thereby improving the performance of the display device using the polarizing film, making the display device conducive to wide application.
  • An optical waveguide lens according to an embodiment of the present invention comprises any of the above-mentioned polarizing films.
  • an optical waveguide lens 200 according to an embodiment of the present invention comprises an optical waveguide 210 and the above-mentioned polarizing film 100.
  • the optical waveguide 210 has a light receiving surface 211 for receiving light and a backlight surface 212 located on the other side of the light receiving surface 211.
  • the polarizing film 100 is used to reflect S polarized light and transmit P polarized light; the polarizing film 100 is located on the backlight surface 212 of the optical waveguide 210, and the transparent substrate of the polarizing film 100 is arranged away from the optical waveguide 210; there is a gap 230 between the optical waveguide 210 and the polarizing film 100.
  • the optical waveguide 210 includes an optical waveguide body 213, and there are two functional areas on the surface of the optical waveguide body 213, namely, the coupling-in area 214 and the coupling-out area 215.
  • the light beam is first projected into the coupling-in area 214, and after the grating diffraction and waveguide total reflection, the coupling light beam enters the coupling-out area 215, and outputs the light beam to the human eye in a certain direction, thereby realizing the augmented reality display of the holographic diffraction waveguide lens.
  • the image light is incident from the coupling-in area 214 of the waveguide lens, and is emitted from the coupling-out area 215, thereby realizing the expansion of the field of view in the horizontal direction.
  • the shapes of the above two functional areas can be circular, rectangular, conical, etc., and are not limited to the above shapes.
  • the function of the polarizing film 100 is to block the light emitted from the optical waveguide 210 to the backlight surface 112.
  • the polarizing film 100 has a polarization splitting function, and has a lower transmittance for S polarized light, so the front projection light cannot be received through the polarizing film 100; and has a higher transmittance for P polarized light, so the P polarized light in the ambient light can be received by the observer through the polarizing film 100, so that the observer's observation of the real space will not be affected. between.
  • the gap 230 there is a gap 230 between the optical waveguide 210 and the polarizing film 100, which can prevent the polarizing film from affecting the imaging of the optical waveguide.
  • the gap 230 is filled with air.
  • the gap 230 can also be filled with other gases that do not affect the imaging of the optical waveguide.
  • the transmittance of the polarizing film 100 to S polarized light is less than 5%, and the transmittance of the polarizing film 100 to P polarized light is greater than or equal to 60%.
  • the polarizing film 100 has a very low transmittance to S polarized light, so the front projection light cannot be received through the polarizing film 100; while it has a higher transmittance to P polarized light, so the P polarized light in the ambient light can be received by the observer through the polarizing film 100, so it will not affect the observer's observation of the real space.
  • the distance between the optical waveguide 210 and the polarizing film 100 (ie, the width of the gap between the optical waveguide 210 and the polarizing film 100) is 1 ⁇ m to 5 cm. At this time, the polarizing film 100 will not affect the imaging of the optical waveguide 210, ensuring the final imaging effect.
  • the polarizing film 100 is fixed on the optical waveguide 210 by means of adhesive 240, and the adhesive is located at the edge of the polarizing film 100 and the optical waveguide 210.
  • the adhesive 240 can be OCA adhesive or other similar adhesives.
  • the optical waveguide lens further includes a rigid substrate (not shown) for supporting the polarizing film 100, and the rigid substrate is attached to the side of the polarizing film 100 away from the optical waveguide 210.
  • the rigid substrate is used to support the polarizing film 100, and provides a rigid support for the polarizing film 100, so as to prevent the polarizing film 100 from being completely attached to the optical waveguide 210 and affecting the imaging effect.
  • the light guide lens 200 of the above embodiment can avoid front projection, improve the privacy of display, and is conducive to wide application.
  • the polarizing film can take into account the optical properties of low absorption loss, high extinction ratio and wide incident angle, thereby improving the performance of the optical waveguide lens using the polarizing film, making the optical waveguide lens conducive to wide application.
  • the structures of the polarizing films 100 of Examples 1 to 33 are shown in FIG2 , and the related structural parameters are shown in Table 1.
  • the transparent substrate 110 is made of polycarbonate (PC)
  • the dielectric grating 121 is made of UV glue
  • the metal layer 122 is made of aluminum
  • the protective layer 130 is made of SiO 2 .
  • the method for preparing the polarizing film of Example 1 is as follows:
  • coating rate is 10A/S
  • evaporation power is 60%
  • working vacuum is 5E-6Torr
  • temperature is 30°C
  • the metal layer precursor on the side of the dielectric grating away from the transparent substrate can be removed by polishing.
  • the metal layer precursor on the side of the dielectric grating away from the transparent substrate is polished by chemical mechanical polishing (CMP).
  • CMP chemical mechanical polishing
  • the polishing parameters are as follows: the film layer is Al, the film thickness is 150nm, the grinding time is 30min, the polishing liquid for aluminum is selected, the polishing disk speed is 40r/min, the sample speed is 60r/min, the uniformity is ⁇ 5%, and the surface roughness is 5nm.
  • a protective layer was deposited by thermal evaporation, and the deposition parameters were as follows: rate 5A/S, working vacuum: 5E-6Torr, and deposition time 30 min.
  • the polarizing films 100 of Examples 2 to 33 are obtained by fitting a 3D structural model.
  • the polarizing film 100 of Example 1 is brought into the 3D structural model (hereinafter referred to as the "model") and the parameters are calibrated, and then the transmittance of P light and S light at normal incidence is simulated and calculated based on the strict coupled wave theory, as shown in Figure 6.
  • the transmittance of P light in the 400nm-800nm band is 70% on average, with a maximum of 80%; the transmittance of S light in the 400nm-800nm band is 0.28% on average.
  • the corresponding extinction ratio values can be calculated, as shown in Table 2. From the data in Table 2, it can be seen that the extinction ratio of the polarizing film 100 of Example 1 is 38.91dB at a wavelength of 450nm. The value is 39.64 dB at a wavelength of 550 nm and 39.25 dB at a wavelength of 650 nm. The above experimental data show that the polarizing film 100 of Example 1 has lower absorption loss and higher extinction ratio.
  • the polarizing film 100 of Example 1 is irradiated at different incident angles (0-60°) to obtain transmittance spectra of P light and S light at different incident angles, as shown in Figure 7.
  • Figure 7 when the incident angle changes from 0 to 60°, the transmittance spectra of P light and S light in the visible light band are not greatly affected, indicating that the polarizing film designed by the present invention has a large angle tolerance, which is very suitable for large-angle application scenarios.
  • Example 1 The above indicates that the polarizing film 100 of Example 1 is suitable for a wider incident angle.
  • the polarizing film 100 of Example 1 is brought into the model to simulate and calculate the reflectivity of P light and S light, as shown in Figure 8.
  • the reflectivity of P light in the 400nm-800nm band is 2% on average; the reflectivity of S light in the 400nm-800nm band is 80% on average, with a maximum of 88%.
  • the polarizing film 100 of Example 1 has lower absorption loss and higher extinction ratio.
  • the polarizing films 100 of Examples 2 to 6 were brought into the model for simulation, and the transmittance spectra of P light and S light in the visible light band at 0 degree incidence were obtained, as shown in Figure 9.
  • Figure 9 when the refractive index of N1 changes between 1.4 and 2, it has little effect on the transmittance spectra of P light and S light in the visible light band.
  • the polarizing films 100 of Examples 7 to 11 were brought into the model for simulation, and the transmittance spectra of P light and S light in the visible light band at 0 degree incidence were obtained, as shown in Figure 10.
  • Figure 10 when the refractive index of N2 changes between 1.4 and 2, the transmittance spectrum of P light in the visible light band is not greatly affected, and the transmittance of S light in the visible light band changes smoothly with the increase of the refractive index, and the overall amplitude does not change much.
  • the polarizing films 100 of Examples 12 to 16 were brought into the model for simulation, and the transmittance spectra of P light and S light in the visible light band at 0 degree incidence were obtained, as shown in FIG11.
  • the refractive index of N3 changes between 1.3 and 1.8
  • the transmittance spectrum of P light in the visible light band is not greatly affected, and the transmittance of S light in the visible light band increases with the increase of the refractive index.
  • the changes are gentle and the overall amplitude does not change much.
  • the corresponding extinction ratio values can be calculated, as shown in Table 3. From the data in Table 3, it can be seen that the polarizing film 100 of Example 15 has lower absorption loss and higher extinction ratio.
  • the polarizing films 100 of Examples 1 and 17 to 20 were brought into the model for simulation, and the transmittance spectra of P light and S light in the visible light band under 0 degree incidence were obtained, as shown in Figure 12.
  • Figure 12 when the period p changes between 50nm and 150nm, the transmittance of P light in the visible light band gradually decreases, and the decrease is limited; the transmittance of S light in the visible light band increases with the increase of period p, and the increase is not large.
  • the polarizing films 100 of Examples 17 to 20 are brought into the model to simulate and calculate the transmittance of P light and S light at normal incidence, as shown in Figures 13 to 16. As can be seen from Figures 13 to 16, the average transmittance of P light in the 400nm to 800nm band is relatively high; the average transmittance of S light in the 400nm to 800nm band is relatively low. This indicates that the polarizing films 100 of Examples 17 to 20 have relatively low absorption losses.
  • the Tp and Tc of the polarizing films 100 of Examples 17 to 20 at wavelengths of 450 nm, 550 nm, and 650 nm, as well as the calculated extinction ratio values are shown in Table 4. From the data in Table 4, it can be seen that the polarizing films 100 of Examples 17 to 20 have a relatively high extinction ratio.
  • the polarizing films 100 of Examples 17 to 20 were irradiated at different incident angles (0 to 60°) to obtain transmittance spectra of P light and S light at different incident angles, as shown in Figures 17 to 20.
  • the incident angle changes from 0 to 60°
  • the transmittance spectra of P light and S light in the visible light band are not greatly affected, indicating that the polarizing films 100 of Examples 17 to 20 are suitable for a wider incident angle.
  • the polarizing films 100 of Examples 1 and 21 to 24 were brought into the model for simulation, and the transmittance spectra of P light and S light in the visible light band at 0 degree incidence were obtained, as shown in Figure 21.
  • the duty cycle f changes between 0.25 and 0.75
  • the transmittance of P light in the visible light band gradually increases
  • the transmittance of S light in the visible light band increases with the increase of the duty cycle f.
  • the polarizing films 100 of Examples 21 to 24 are brought into the model to simulate and calculate the transmittance of P light and S light at normal incidence, as shown in Figures 22 to 25. As can be seen from Figures 22 to 25, the average transmittance of P light in the 400nm to 800nm band is relatively high; the average transmittance of S light in the 400nm to 800nm band is relatively low. This indicates that the polarizing films 100 of Examples 21 to 24 have relatively low absorption losses.
  • the Tp and Tc of the polarizing films 100 of Examples 21 to 24 at wavelengths of 450 nm, 550 nm, and 650 nm, as well as the calculated extinction ratio values are shown in Table 5. From the data in Table 5, it can be seen that the polarizing films 100 of Examples 21 to 24 have a relatively high extinction ratio.
  • the polarizing films 100 of Examples 21 to 24 were irradiated at different incident angles (0 to 60°) to obtain transmittance spectra of P light and S light at different incident angles, as shown in Figures 26 to 29. As can be seen from Figures 26 to 29, when the incident angle changes from 0 to 60°, the transmittance spectra of P light and S light in the visible light band are not greatly affected, indicating that the polarizing films 100 of Examples 21 to 24 are suitable for a wider incident angle.
  • the polarizing films 100 of Examples 1 and 25 to 28 were brought into the model for simulation, and the influence of the transmittance spectra of P light and S light in the visible light band at 0 degree incidence was obtained, as shown in Figure 30.
  • Figure 30 when the ridge thickness h2 of the dielectric grating changes between 60nm and 200nm, the transmittance of P light in the visible light band changes in a limited range; the transmittance of S light in the visible light band decreases significantly with the increase of the depth h1, and the decrease is obvious.
  • the polarizing films 100 of Examples 25 to 28 are brought into the model to simulate and calculate the transmittance of P light and S light at normal incidence, as shown in Figures 31 to 34.
  • the average transmittance of P light in the 400nm to 800nm band is relatively high; the average transmittance of S light in the 400nm to 800nm band is relatively low. This indicates that the polarizing films 100 of Examples 25 to 28 have relatively low absorption losses.
  • the Tp and Tc of the polarizing films 100 of Examples 25 to 28 at wavelengths of 450 nm, 550 nm, and 650 nm, as well as the calculated extinction ratio values are shown in Table 6. From the data in Table 6, it can be seen that the polarizing films 100 of Examples 25 to 28 have a relatively high extinction ratio.
  • the polarizing films 100 of Examples 25 to 28 were irradiated at different incident angles (0 to 60°) to obtain transmittance spectra of P light and S light at different incident angles, as shown in Figures 35 to 38. As can be seen from Figures 35 to 38, when the incident angle changes from 0 to 60°, the transmittance spectra of P light and S light in the visible light band are not greatly affected, indicating that the polarizing films 100 of Examples 25 to 28 are suitable for a wider incident angle.
  • the polarizing films 100 of Examples 29 to 33 were brought into the model for simulation, and the influence of the transmittance spectra of P light and S light in the visible light band at 0 degree incidence was obtained, as shown in Figure 39.
  • the thickness h3 of the protective layer changes between 50nm and 200nm, the transmittance of P light in the visible light band does not change much; the transmittance of S light in the visible light band does not change much with the increase of the depth h2.
  • the corresponding extinction ratio values can be calculated, as shown in Table 7. From the data in Table 7, it can be seen that the polarizing film 100 of Example 33 has lower absorption loss and higher extinction ratio.
  • the polarizing film of the present invention has a grating structure in which a dielectric grating and a metal layer are alternately arranged. Due to the different refractive indices of the dielectric grating and the metal layer, the equivalent refractive indices of S light and P light are different.
  • S light irradiates the grating structure, the electrons in the metal layer form enhanced free oscillations in the direction of the grating lines, so that the S light forms enhanced reflection; when P light irradiates, the electron oscillation is hindered in the direction of the grating lines, and the transmission of P light is enhanced. Therefore, the polarizing film of the present invention has the optical properties of reducing absorption loss and improving extinction ratio.
  • the polarizing film designed by the present invention has a large angle tolerance, which has good applicability for large-angle application scenarios. Therefore, it can take into account the optical properties of low absorption loss, high extinction ratio and wide incident angle, which is conducive to wide application.

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Abstract

一种偏振薄膜及其制作方法、光波导镜片、显示装置。偏振薄膜包括：透明基底（110）；光栅层（120），位于透明基底（110）上，光栅层（120）包括沿平行于透明基底（110）表面的方向周期性间隔设置的介质光栅（121）和金属层（122），介质光栅（121）和金属层（122）的厚度相同；以及保护层（130），覆盖光栅层（120），通过对光栅层（120）和保护层（130）的结构进行优化设计，能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，有利于广泛应用。

Description

偏振薄膜及其制作方法、光波导镜片、显示装置 技术领域
本发明涉及显示技术领域，特别是涉及一种偏振薄膜及其制作方法、光波导镜片、显示装置。
背景技术
偏振薄膜是液晶显示、光学测量和光通信等系统中使用的一种非常重要的光学组件，非常适用于需要高对比度偏振的应用，例如微型投影机、偏振分光棱镜以及平视显示器等显示装置。这些系统中要求偏振薄膜具有高消光比、宽广的入射角度范围和非常紧凑的体积。偏振薄膜设计用于传输所需的偏振状态同时又可反射不需要的状态，同时可在高达45°的入射角中实现频谱平坦性能，因此广泛作为偏振分光棱镜使用。此外，基于金属线栅的偏振反射薄膜可在高温或高湿度环境中实现耐久性，同时也可在400nm至1200nm的可见与近红外光谱范围中提供出色偏振分束性能。
然而，传统的偏振薄膜无法兼顾低吸收损耗、高消光比和广入射角度等光学性能，不利于广泛应用。
发明内容
基于此，有必要针对如何兼顾低吸收损耗、高消光比和广入射角度的光学性能的问题，提供一种能够兼顾低吸收损耗、高消光比和广入射角度的光学性能的偏振薄膜及其制作方法、光波导镜片、显示装置。
一种偏振薄膜，所述偏振薄膜包括：
透明基底；
光栅层，位于所述透明基底上，所述光栅层包括沿平行于所述透明基底表面的方向周期性间隔设置的介质光栅和金属层；以及
保护层，覆盖所述光栅层。
在一个可行的实现方式中，所述介质光栅的周期为50nm～150nm，所述介质光栅的占空比为0.25～0.75，所述介质光栅的厚度为60nm～200nm。
在一个可行的实现方式中，所述介质光栅的材质为树脂类固化胶，所述介质光栅和所述金属层的厚度相同。
在一个可行的实现方式中，所述透明基底的折射率为1.4～2，所述介质光栅的折射率为 1.4～2。
在一个可行的实现方式中，所述透明基底为柔性基底。
在一个可行的实现方式中，所述柔性基底的材质选自聚碳酸酯、聚氯乙烯、聚对苯二甲酸乙二醇酯、聚甲基丙烯酸甲酯、聚丙烯和三醋酸纤维素中的至少一种。
在一个可行的实现方式中，所述透明基底的厚度为0.01mm～1mm。
在一个可行的实现方式中，所述保护层的折射率为1.3～1.8，所述保护层的厚度为50nm～200nm。
在一个可行的实现方式中，所述保护层的材质选自SiO2、MgF2和SiON中的至少一种。
在一个可行的实现方式中，所述金属层的材质选自金、银、铜、铝和钨中的至少一种。
本发明提供了一种新型结构的偏振薄膜，通过对光栅层和保护层的结构进行上述优化设计，其光栅结构为介质光栅和金属层交替设置，由于介质光栅和金属层不同的折射率，导致S光和P光的等效折射率的值不一样，当S光照射光栅结构时，金属层的电子在栅线方向形成增强自由振荡，使得S光形成增强反射；当P光照射时，电子振荡通过栅线方向受到阻碍，此时P光透射增强，因而本发明的偏振薄膜具备降低吸收损耗，提高消光比的光学性能。此外本发明设计的偏振薄膜具备较大的角度宽容性，这对于大角度的应用场景具备很好的适用性。因此能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，有利于广泛应用。
本发明还提供一种偏振薄膜的制作方法，包括如下步骤：
在透明基底上形成光栅层，所述光栅层包括沿平行于所述透明基底表面的方向周期性间隔设置的介质光栅和金属层，所述介质光栅和所述金属层的厚度相同；以及
在所述光栅层上上形成保护层，得到偏振薄膜。
在一个可行的实现方式中，在透明基底上形成光栅层的操作为：
通过纳米压印法在透明基底上形成沿平行于所述透明基底表面的方向间隔设置的介质光栅，相邻两个介质光栅之间为沟槽；
通过镀膜工艺在所述介质光栅上形成金属层前体，之后去除所述介质光栅远离所述透明基底一侧的金属层前体，并保留所述沟槽内的金属层前体，得到金属层。
在一个可行的实现方式中，通过纳米压印法在透明基底上形成沿平行于所述透明基底表面的方向间隔设置的介质光栅的操作为：将透明基底与压印模板贴合，所述透明基底与所述压印模板之间涂覆有压印胶，之后挤压所述透明基底与所述压印模板，待所述压印胶固化之后将所述压印模板从所述压印胶上脱模，即在所述透明基底上形成沿平行于所述透明基底表面的方向间隔设置的介质光栅。
在一个可行的实现方式中，在所述介质光栅和所述金属层上形成保护层的操作为：通过 镀膜工艺在所述介质光栅和所述金属层上形成保护层。
采用上述偏振薄膜的制作方法能够制作得到本发明新型结构的偏振薄膜，经过试验验证，上述偏振薄膜能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，有利于广泛应用。
一种显示装置，包括上述任一的偏振薄膜。
在一个可行的实现方式中，所述显示装置为投影机、偏振分光棱镜或者平视显示器。
一种光波导镜片，包括：
光波导，所述光波导具有用以接收光线的受光面和位于所述受光面另一侧的背光面；以及
上述任一的偏振薄膜，所述偏振薄膜位于所述光波导的背光面上，且所述偏振薄膜的透明基底远离所述光波导设置；
其中，所述光波导与所述偏振薄膜之间具有空隙。
在一个可行的实现方式中，所述偏振薄膜对S偏振光的透过率小于5％，所述偏振薄膜对P偏振光的透过率大于等于60％。
在一个可行的实现方式中，所述光波导与所述偏振薄膜之间的距离为1μm～5cm。
在一个可行的实现方式中，所述偏振薄膜通过粘结胶固定于所述光波导上，所述粘结胶位于所述偏振薄膜和所述光波导的边缘位置。
在一个可行的实现方式中，所述光波导镜片还包括用以支撑所述偏振薄膜的刚性衬底，所述刚性衬底贴合于所述偏振薄膜远离所述光波导的一侧。
经过试验验证，上述偏振薄膜能够兼顾更低吸收损耗、更高消光比和广入射角度的光学性能，从而提升了采用上述偏振薄膜的显示装置和光波导镜片的性能，使得上述显示装置和光波导镜片有利于广泛应用。
附图说明
图1为本发明实施方式的偏振薄膜的光学特性示意图；
图2为本发明一实施方式的偏振薄膜的结构示意图；
图3为本发明一实施方式的偏振薄膜的制作方法的流程图；
图4为本发明一实施方式的光波导镜片的整体示意图；
图5为本发明一实施方式的光波导镜片的光线示意图；
图6为本发明实施例1的偏振薄膜在P光和S光正入射时的透过率光谱图；
图7为本发明实施例1的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图8为本发明实施例1的偏振薄膜的P光和S光的反射率光谱图；
图9为本发明实施例2～6的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图；
图10为本发明实施例7～11的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图；
图11为本发明实施例12～16的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图；
图12为本发明实施例1和17～20的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图；
图13为本发明实施例17的偏振薄膜在P光和S光正入射时的透过率光谱图；
图14为本发明实施例18的偏振薄膜在P光和S光正入射时的透过率光谱图；
图15为本发明实施例19的偏振薄膜在P光和S光正入射时的透过率光谱图；
图16为本发明实施例20的偏振薄膜在P光和S光正入射时的透过率光谱图；
图17为本发明实施例17的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图18为本发明实施例18的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图19为本发明实施例19的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图20为本发明实施例20的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图21为本发明实施例1和21～24的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图；
图22为本发明实施例21的偏振薄膜在P光和S光正入射时的透过率光谱图；
图23为本发明实施例22的偏振薄膜在P光和S光正入射时的透过率光谱图；
图24为本发明实施例23的偏振薄膜在P光和S光正入射时的透过率光谱图；
图25为本发明实施例24的偏振薄膜在P光和S光正入射时的透过率光谱图；
图26为本发明实施例21的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图27为本发明实施例22的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图28为本发明实施例23的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图29为本发明实施例24的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图30为本发明实施例1和25～28的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图；
图31为本发明实施例25的偏振薄膜在P光和S光正入射时的透过率光谱图；
图32为本发明实施例26的偏振薄膜在P光和S光正入射时的透过率光谱图；
图33为本发明实施例27的偏振薄膜在P光和S光正入射时的透过率光谱图；
图34为本发明实施例28的偏振薄膜在P光和S光正入射时的透过率光谱图；
图35为本发明实施例25的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图36为本发明实施例26的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图37为本发明实施例27的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图38为本发明实施例28的偏振薄膜在不同入射角度的P光和S光的透过率光谱图；
图39为本发明实施例29～33的偏振薄膜在0度入射下P光和S光可见光波段透过率光谱图。
具体实施方式
为使本发明的上述目的、特征和优点能够更加明显易懂，下面结合附图对本发明的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本发明。但是本发明能够以很多不同于在此描述的其它方式来实施，本领域技术人员可以在不违背本发明内涵的情况下做类似改进，因此本发明不受下面公开的具体实施例的限制。
需要说明的是，当元件被称为“固定于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“左”、“右”以及类似的表述只是为了说明的目的。
除非另有定义，本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的，不是旨在于限制本发明。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。
图1为本发明的偏振薄膜的光学特性示意图，当包含S光和P光的入射光入射偏振薄膜时，可令P光具备较高的透过率Tp，S光具备较低的透过率Ts；同时，P光具备较低的反射率Rp，S光具备较高的反射率Rs。
请参见图2，本发明一实施方式的偏振薄膜100包括透明基底110、光栅层120和保护层130。其中，光栅层120位于透明基底110上，光栅层120包括沿平行于透明基底110表面的方向周期性间隔设置的介质光栅121和金属层122，在一较佳实施例中，介质光栅121和金属层122的厚度h2相同，在其他实施例中，介质光栅121和金属层122的厚度h2也可以不同。其中，保护层130覆盖光栅层120。
上述实施方式中，透明基底110为位于上层的光栅层120和保护层130提供支撑，透明基底110在可见光下的透过率大于80％。
上述实施方式中，保护层130用于对透明基底110和光栅层120起到保护作用，并能够 防止金属层122氧化。在前述实施方式的基础上，介质光栅121的周期为50nm～150nm，介质光栅121的占空比为0.25～0.75，介质光栅121的厚度为60nm～200nm。其中，介质光栅121的周期例如可以为50nm、60nm、70nm、80nm、90nm、100nm、110nm、120nm、130nm、140nm或者150nm，介质光栅121的占空比例如可以为0.25、0.30、0.35、0.40、0.45、0.50、0.55、0.60、0.65、0.70或者0.75，介质光栅121的厚度例如可以为60nm、70nm、80nm、90nm、100nm、110nm、120nm、130nm、140nm、150nm、160nm、170nm、180nm、190nm或者200nm。可以理解的是，本发明的偏振薄膜中，介质光栅的周期、介质光栅的占空比以及介质光栅的厚度均不限于此。
金属层122的厚度范围亦为60nm～200nm。具体的，金属层122的厚度例如可以为60nm、70nm、80nm、90nm、100nm、110nm、120nm、130nm、140nm、150nm、160nm、170nm、180nm、190nm或者200nm。
其中，介质光栅的占空比指的是介质光栅宽度与周期的比值。
在前述实施方式的基础上，透明基底110的折射率N1为1.4～2，介质光栅121的折射率N2为1.4～2。其中，透明基底110的折射率N1例如可以为1.4、1.5、1.6、1.7、1.8、1.9或者2；介质光栅121的折射率N2例如可以为1.4、1.5、1.6、1.7、1.8、1.9或者2。当然，本发明的偏振薄膜中，透明基底的折射率N1和介质光栅的折射率N2均不限于此，还可以为其他数值。
在前述实施方式的基础上，透明基底110为柔性基底。当透明基底110为柔性基底时，能够适用于偏振薄膜的柔性制造，应用于一些需要柔性偏振薄膜的场景，拓展了偏振薄膜的应用范围。
在前述实施方式的基础上，柔性基底的材质选自聚碳酸酯(PC)、聚氯乙烯(PVC)、聚对苯二甲酸乙二醇酯(PET)、聚甲基丙烯酸甲酯(PMMA)、聚丙烯(PP)和三醋酸纤维素(TAC)中的至少一种。这些种类材质的柔性基底不仅具有一定的柔性，还具有较高的透光率，适用于本发明的偏振薄膜。
在前述实施方式的基础上，透明基底110的厚度为10微米～1毫米。
在前述实施方式的基础上，介质光栅121的材质为树脂类固化胶。具体的，树脂类固化胶可以为UV胶，当然，还可以为其他树脂类固化胶。
在前述实施方式的基础上，保护层130的折射率N3为1.3～1.8，保护层130的厚度为50nm～200nm。其中，保护层130的折射率N3例如可以为1.3、1.4、1.5、1.6、1.7或者1.8。当然，本发明的偏振薄膜中，保护层的折射率N3不限于此，还可以为其他可行的数值。
在前述实施方式的基础上，保护层130的材质选自SiO2、MgF2和SiON中的至少一种。
在前述实施方式的基础上，金属层122的材质选自金、银、铜、铝和钨中的至少一种。
本发明的偏振薄膜的类型不限，可以为反射薄膜、透射薄膜或者衍射薄膜等。
本发明的偏振薄膜，其光栅结构为介质光栅和金属层交替设置，由于介质光栅和金属层不同的折射率，导致S光和P光的等效折射率的值不一样，当S光照射光栅结构时，金属层的电子在栅线方向形成增强自由振荡，使得S光形成增强反射；当P光照射时，电子振荡通过栅线方向受到阻碍，此时P光透射增强，因而本发明的偏振薄膜具备降低吸收损耗，提高消光比的光学性能。此外本发明设计的偏振薄膜具备较大的角度宽容性，这对于大角度的应用场景具备很好的适用性。因此能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，有利于广泛应用。
请参见图3，本发明一实施方式的偏振薄膜的制作方法，包括如下步骤：
S10、在透明基底上形成光栅层，光栅层包括沿平行于透明基底表面的方向周期性间隔设置的介质光栅和金属层，介质光栅和金属层的厚度相同。
步骤S10中，在透明基底上形成光栅层的操作为：
通过纳米压印法在透明基底上形成沿平行于透明基底表面的方向间隔设置的介质光栅，相邻两个介质光栅之间为沟槽；
通过镀膜工艺在介质光栅上形成金属层前体，之后去除介质光栅远离透明基底一侧的金属层前体，并保留沟槽内的金属层前体，得到金属层。
在一个可行的实现方式中，通过纳米压印法在透明基底上形成沿平行于透明基底表面的方向间隔设置的介质光栅的操作为：将透明基底与压印模板贴合，透明基底与压印模板之间涂覆有压印胶，之后挤压透明基底与所述压印模板，待压印胶固化之后将压印模板从压印胶上脱模，即在透明基底上形成沿平行于透明基底表面的方向间隔设置的介质光栅。其中，压印模板为具有刻槽结构的硬质母模板，且刻槽结构与介质光栅的结构和尺寸相匹配。
此外，将透明基底与压印模板贴合之前，在透明基底或者压印模板上涂覆压印胶。
当然，还可以采用其他可行的方法在透明基底上形成介质光栅。
其中，镀膜工艺可以为电子束蒸发工艺。镀膜工艺的具体操作为：利用高温胶带将透明基底和介质光栅贴合至治具上，之后共同放入镀膜设备中，之后抽真空，通入O2和Ar2，设置镀膜参数(包括镀膜种类、镀膜时间、镀膜速率等)，镀膜完成后在介质光栅上形成金属层。
在一个可行的实现方式中，可以通过抛光工艺去除介质光栅远离透明基底一侧的金属层前体。具体的，采用化学机械抛光方式(CMP)，抛光参数如下：膜层为Al，膜厚为100nm～200nm，研磨时长为10min～40min，选择铝用抛光液，抛光盘转速为40r/min，样品转速为60r/min，均匀性＜5％，表面粗糙度为1nm～10nm。
S20、在步骤S10得到的光栅层上形成保护层，得到偏振薄膜。
步骤S20中，在介质光栅和金属层上形成保护层的操作为：通过镀膜工艺在介质光栅和金属层上形成保护层。
其中，镀膜工艺可以为热蒸发工艺。在一个可行的实现方式中，镀膜参数如下：镀SiO2，镀膜厚度为5nm～200nm，镀膜速率为0.1A/S～10A/S，工作真空为5E-6Torr，镀膜时间为1min-60min。
采用上述偏振薄膜的制作方法能够制作得到本发明新型结构的偏振薄膜，经过试验验证，上述偏振薄膜能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，有利于广泛应用。
本发明一实施方式的显示装置(未图示)，包括上述任一的偏振薄膜。
在前述实施方式的基础上，显示装置为投影机、偏振分光棱镜或者平视显示器。更具体的，显示装置例如可以为投影光学系统、ar/vr系统、电视、电脑、消费类电子显示器件或者偏光眼镜。
经过试验验证，上述偏振薄膜能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，从而提升了采用上述偏振薄膜的显示装置的性能，使得上述显示装置有利于广泛应用。
本发明一实施方式的光波导镜片，包括上述任一的偏振薄膜。请一并参见图4和图5，本发明一实施方式的光波导镜片200包括光波导210和上述偏振薄膜100。其中，光波导210具有用以接收光线的受光面211和位于受光面211另一侧的背光面212。其中，偏振薄膜100用于反射S偏振光且透射P偏振光；偏振薄膜100位于光波导210的背光面212上，且偏振薄膜100的透明基底远离光波导210设置；其中，光波导210与偏振薄膜100之间具有空隙230。
上述实施方式的光波导镜片200中，光波导210包括光波导本体213，光波导本体213的表面存在两个功能性区域，分别为耦入区域214和耦出区域215。光束先投射到耦入区域214，经光栅衍射和波导全反射作用，耦合光束进耦出区域215，以一定方向输出光束至人眼，实现全息衍射波导镜片的增强现实显示。另外，图像光从波导镜片耦入区域214入射，耦出区域215出射，实现水平方向视场扩大。其中，上述两个功能性区域的形状可以为圆形、矩形、锥形等，且不局限于上述形状。此外需要说明的是，光波导本体213的表面还可以存在其他功能性区域，具体可以根据实际需求进行设置。
上述实施方式的光波导镜片中，偏振薄膜100的作用是阻止从光波导210出射至背光面112的光线，具体的，偏振薄膜100具备偏振分束功能，针对S偏振光具备较低的透过率，因而正面投影光线无法透过偏振薄膜100被接收；而针对P偏振光具备较高的透过率，因而环境光中的P偏振光可以透过偏振薄膜100被观察者接收，从而不会影响观察者观察现实空 间。
上述实施方式的光波导镜片中，光波导210与偏振薄膜100之间具有空隙230，能够避免偏振薄膜影响光波导成像。其中，空隙230的内部为空气。当然，空隙230的内部亦可以填充其他不影响光波导成像的气体。
在前述实施方式的基础上，偏振薄膜100对S偏振光的透过率小于5％，偏振薄膜100对P偏振光的透过率大于等于60％。此时，偏振薄膜100针对S偏振光具备极低的透过率，因而正面投影光线无法透过偏振薄膜100被接收；而针对P偏振光具备较高的透过率，因而环境光中的P偏振光可以透过偏振薄膜100被观察者接收，从而不会影响观察者观察现实空间。
在前述实施方式的基础上，光波导210与偏振薄膜100之间的距离(即光波导210与偏振薄膜100之间空隙的宽度)为1μm～5cm。此时，偏振薄膜100不会影响光波导210成像，保证最终的成像效果。
在前述实施方式的基础上，偏振薄膜100通过粘结胶240固定于光波导210上，所述粘结胶位于偏振薄膜100和光波导210的边缘位置。粘接胶240可以为OCA胶或者其他类似粘接胶。
在前述实施方式的基础上，光波导镜片还包括用以支撑偏振薄膜100的刚性衬底(未图示)，刚性衬底贴合于偏振薄膜100远离光波导210的一侧。刚性衬底用以支撑偏振薄膜100，为偏振薄膜100提供刚性支撑作用，避免偏振薄膜100完全贴合于光波导210上而影响成像效果。
应用上述实施方式的光波导镜片200，能够避免正面投影，提高了显示的隐私性，有利于广泛应用。
经过试验验证，上述偏振薄膜能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，从而提升了采用上述偏振薄膜的光波导镜片的性能，使得上述光波导镜片有利于广泛应用。
参照上述实施内容，为了使得本申请的技术方案更加具体清楚、易于理解，现对本申请技术方案进行举例，但是需要说明的是，本申请所要保护的内容不限于以下实施例1～33。
实施例1～实施例33
实施例1～实施例33的偏振薄膜100的结构如图2，相关结构参数见表1。其中，实施例1的偏振薄膜100中，透明基底110的材质为聚碳酸酯(PC)，介质光栅121的材质为UV胶，金属层122的材质均为铝，保护层130的材质为SiO2。
实施例1的偏振薄膜的制作方法如下：
提供透明基底和压印模板；
在透明基底上涂覆压印胶，之后将透明基底与压印模板贴合，之后通过辊筒挤压透明基底与压印模板，之后对压印胶进行紫外光照射，待压印胶固化之后揭开透明基底，将压印模板从压印胶上脱模，即在透明基底上形成沿平行于透明基底表面的方向间隔设置的介质光栅；
利用高温胶带将透明基底和介质光栅贴合至治具上，之后共同放入镀膜设备中，之后抽真空，设置镀膜的工艺参数：镀膜速率为10A/S，蒸发功率为60％，工作真空为5E-6Torr，温度为30℃；镀膜完成后即在介质光栅上形成金属层前体；
可以通过抛光工艺去除介质光栅远离透明基底一侧的金属层前体。采用化学机械抛光方式(CMP)，将介质光栅远离透明基底一侧的金属层前体抛光。抛光参数如下：膜层为Al，膜厚为150nm，研磨时长为30min，选择铝用抛光液，抛光盘转速为40r/min，样品转速为60r/min，均匀性＜5％，表面粗糙度为5nm。
随后，通过热蒸发方式镀保护层，镀膜参数如下：速率为5A/S，工作真空：5E-6Torr，镀膜时间30min。
实施例2～实施例33的偏振薄膜100通过3D结构模型拟合得到。
表1实施例1～33的偏振薄膜的结构参数表

性能测试：
(1)透过率
将实施例1的偏振薄膜100带入3D结构模型(以下简称“模型”)并标定参数后基于严格耦合波理论进行仿真计算P光和S光正入射时的透过率，如图6所示。从图6可以看到，P光在400nm～800nm波段的透过率平均在70％，最高处80％；S光在400nm～800nm波段的透过率平均在0.28％。
通过计算波长450nm、550nm、650nm处的Tp和Tc，可以计算得到对应的消光比数值，见表2。从表2的数据可以看出，实施例1的偏振薄膜100的消光比在波长450nm处为38.91dB， 在波长550nm处为39.64dB，在波长650nm处为39.25dB。上述实验数据表明实施例1的偏振薄膜100具有较低的吸收损耗和较高的消光比。
表2实施例1的偏振薄膜100的测试数据表
(2)入射角度变化
对实施例1的偏振薄膜100进行不同入射角度(0～60°)的照射，得到不同入射角度的P光和S光的透过率光谱图，如图7所示。从图7可以看到，入射角度从0～60°变化时，对于P光和S光在可见光波段范围的透过率光谱影响不大，说明本发明设计的偏振薄膜具备较大的角度宽容性，这对于大角度的应用场景具备很好的适用性。
上述表明实施例1的偏振薄膜100适用于较广的入射角度。
(3)反射率
将实施例1的偏振薄膜100带入模型进行仿真计算P光和S光的反射率，如图8所示。从图8可以看到，P光在400nm～800nm波段的反射率平均在2％；S光在400nm～800nm波段的反射率平均在80％，最高为88％。这表明实施例1的偏振薄膜100具有较低的吸收损耗和较高的消光比。
(4)透明基底的折射率N1变化
将实施例2～6的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱，如图9所示。从图9可以看到，当N1折射率在1.4～2之间变化，对于P光和S光在可见光波段范围的透过率光谱影响不大。
(5)介质光栅的折射率N2变化
将实施例7～11的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱，如图10所示。从图10可以看到，当N2折射率在1.4～2之间变化，P光在可见光波段范围的透过率光谱影响不大，S光在可见光波段范围的透过率随着折射率增加而平缓变化，整体幅度变化不大。
(6)保护层的折射率N3变化
将实施例12～16的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱，如图11所示。从图11可以看到，当N3折射率在1.3～1.8之间变化，P光在可见光波段范围的透过率光谱影响不大，S光在可见光波段范围的透过率随着折射率增加 而平缓变化，整体幅度变化不大。
通过计算实施例15的偏振薄膜100在波长450nm、550nm、650nm处的Tp和Tc，可以计算得到对应的消光比数值，见表3。从表3的数据可以看出，实施例15的偏振薄膜100具有较低的吸收损耗和较高的消光比。
表3实施例15的偏振薄膜100的测试数据表
(7)介质光栅的周期p变化
将实施例1和17～20的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱，如图12所示。从图12可以看到，当周期p在50nm～150nm之间变化，P光在可见光波段范围的透过率逐渐降低，降低幅度有限；S光在可见光波段范围的透过率随着周期p增加而增加，增幅不大。
将实施例17～20的偏振薄膜100带入模型进行仿真计算P光和S光正入射时的透过率，依次如图13～16所示。从图13～16可以看出，P光在400nm～800nm波段的平均透过率较高；S光在400nm～800nm波段的平均透过率较低。表明实施例17～20的偏振薄膜100具有较低的吸收损耗。
实施例17～20的偏振薄膜100在波长450nm、550nm、650nm处的Tp和Tc，以及计算得到的消光比数值见表4。从表4的数据可以看出，实施例17～20的偏振薄膜100具有较高的消光比。
表4实施例17～20的偏振薄膜100的测试数据表

对实施例17～20的偏振薄膜100进行不同入射角度(0～60°)的照射，得到不同入射角度的P光和S光的透过率光谱图，如图17～20所示。从图17～20可以看到，入射角度从0～60°变化时，对于P光和S光在可见光波段范围的透过率光谱影响不大，表明实施例17～20的偏振薄膜100适用于较广的入射角度。
(8)介质光栅的占空比f变化
将实施例1和21～24的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱，如图21所示。从图21可以看到，当占空比f在0.25～0.75之间变化，P光在可见光波段范围的透过率逐渐增加；S光在可见光波段范围的透过率随着占空比f增加而增加。
将实施例21～24的偏振薄膜100带入模型进行仿真计算P光和S光正入射时的透过率，依次如图22～25所示。从图22～25可以看出，P光在400nm～800nm波段的平均透过率较高；S光在400nm～800nm波段的平均透过率较低。表明实施例21～24的偏振薄膜100具有较低的吸收损耗。
实施例21～24的偏振薄膜100在波长450nm、550nm、650nm处的Tp和Tc，以及计算得到的消光比数值见表5。从表5的数据可以看出，实施例21～24的偏振薄膜100具有较高的消光比。
表5实施例21～24的偏振薄膜100的测试数据表

对实施例21～24的偏振薄膜100进行不同入射角度(0～60°)的照射，得到不同入射角度的P光和S光的透过率光谱图，如图26～29所示。从图26～29可以看到，入射角度从0～60°变化时，对于P光和S光在可见光波段范围的透过率光谱影响不大，表明实施例21～24的偏振薄膜100适用于较广的入射角度。
(9)介质光栅的脊部厚度h2变化
将实施例1和25～28的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱影响，如图30所示。从图30可以看到，当介质光栅的脊部厚度h2在60nm～200nm之间变化，P光在可见光波段范围的透过率变化幅度有限；S光在可见光波段范围的透过率随着深度h1增加而显著降低，且降幅明显。
将实施例25～28的偏振薄膜100带入模型进行仿真计算P光和S光正入射时的透过率，依次如图31～34所示。从图31～34可以看出，P光在400nm～800nm波段的平均透过率较高；S光在400nm～800nm波段的平均透过率较低。表明实施例25～28的偏振薄膜100具有较低的吸收损耗。
实施例25～28的偏振薄膜100在波长450nm、550nm、650nm处的Tp和Tc，以及计算得到的消光比数值见表6。从表6的数据可以看出，实施例25～28的偏振薄膜100具有较高的消光比。
表6实施例25～28的偏振薄膜100的测试数据表

对实施例25～28的偏振薄膜100进行不同入射角度(0～60°)的照射，得到不同入射角度的P光和S光的透过率光谱图，如图35～38所示。从图35～38可以看到，入射角度从0～60°变化时，对于P光和S光在可见光波段范围的透过率光谱影响不大，表明实施例25～28的偏振薄膜100适用于较广的入射角度。
(10)保护层的厚度h3变化
将实施例29～33的偏振薄膜100带入模型进行仿真，得到0度入射下P光和S光可见光波段透过率光谱影响，如图39所示。从图39可以看到，当保护层的厚度h3在50nm～200nm之间变化，P光在可见光波段范围的透过率变化幅度不大；S光在可见光波段范围的透过率随着深度h2增加变化幅度不大。
通过计算实施例33的偏振薄膜100在波长450nm、550nm、650nm处的Tp和Tc，可以计算得到对应的消光比数值，见表7。从表7的数据可以看出，实施例33的偏振薄膜100具有较低的吸收损耗和较高的消光比。
表7实施例33的偏振薄膜100的测试数据表
本发明的偏振薄膜，其光栅结构为介质光栅和金属层交替设置，由于介质光栅和金属层不同的折射率，导致S光和P光的等效折射率的值不一样，当S光照射光栅结构时，金属层的电子在栅线方向形成增强自由振荡，使得S光形成增强反射；当P光照射时，电子振荡通过栅线方向受到阻碍，此时P光透射增强，因而本发明的偏振薄膜具备降低吸收损耗，提高消光比的光学性能。此外本发明设计的偏振薄膜具备较大的角度宽容性，这对于大角度的应用场景具备很好的适用性。因此能够兼顾低吸收损耗、高消光比和广入射角度的光学性能，有利于广泛应用。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中 的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本发明的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对发明专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本发明构思的前提下，还可以做出若干变形和改进，这些都属于本发明的保护范围。因此，本发明专利的保护范围应以所附权利要求为准。

Claims (21)

  1. 一种偏振薄膜，其特征在于，所述偏振薄膜包括：
    透明基底；
    光栅层，位于所述透明基底上，所述光栅层包括沿平行于所述透明基底表面的方向周期性间隔设置的介质光栅和金属层；以及
    保护层，覆盖所述光栅层。
  2. 根据权利要求1所述的偏振薄膜，其特征在于，所述介质光栅的周期为50nm～150nm，所述介质光栅的占空比为0.25～0.75，所述介质光栅的厚度为60nm～200nm。
  3. 根据权利要求2所述的偏振薄膜，其特征在于，所述介质光栅的材质为树脂类固化胶，所述介质光栅和所述金属层的厚度相同。
  4. 根据权利要求1所述的偏振薄膜，其特征在于，所述透明基底的折射率为1.4～2，所述介质光栅的折射率为1.4～2。
  5. 根据权利要求1所述的偏振薄膜，其特征在于，所述透明基底为柔性基底。
  6. 根据权利要求5所述的偏振薄膜，其特征在于，所述柔性基底的材质选自聚碳酸酯、聚氯乙烯、聚对苯二甲酸乙二醇酯、聚甲基丙烯酸甲酯、聚丙烯和三醋酸纤维素中的至少一种。
  7. 根据权利要求1、4～6中任一项所述的偏振薄膜，其特征在于，所述透明基底的厚度为0.01mm～1mm。
  8. 根据权利要求1所述的偏振薄膜，其特征在于，所述保护层的折射率为1.3～1.8，所述保护层的厚度为50nm～200nm。
  9. 根据权利要求1或8所述的偏振薄膜，其特征在于，所述保护层的材质选自SiO2、MgF2和SiON中的至少一种。
  10. 根据权利要求1所述的偏振薄膜，其特征在于，所述金属层的材质选自金、银、铜、铝和钨中的至少一种。
  11. 一种偏振薄膜的制作方法，其特征在于，包括如下步骤：
    在透明基底上形成光栅层，所述光栅层包括沿平行于所述透明基底表面的方向周期性间隔设置的介质光栅和金属层，所述介质光栅和所述金属层的厚度相同；以及
    在所述光栅层上上形成保护层，得到偏振薄膜。
  12. 根据权利要求11所述的偏振薄膜的制作方法，其特征在于，在透明基底上形成光栅层的操作为：
    通过纳米压印法在透明基底上形成沿平行于所述透明基底表面的方向间隔设置的介质光栅，相邻两个介质光栅之间为沟槽；
    通过镀膜工艺在所述介质光栅上形成金属层前体，之后去除所述介质光栅远离所述透明基底一侧的金属层前体，并保留所述沟槽内的金属层前体，得到金属层。
  13. 根据权利要求12所述的偏振薄膜的制作方法，其特征在于，通过纳米压印法在透明基底上形成沿平行于所述透明基底表面的方向间隔设置的介质光栅的操作为：将透明基底与压印模板贴合，所述透明基底与所述压印模板之间涂覆有压印胶，之后挤压所述透明基底与所述压印模板，待所述压印胶固化之后将所述压印模板从所述压印胶上脱模，即在所述透明基底上形成沿平行于所述透明基底表面的方向间隔设置的介质光栅。
  14. 根据权利要求11所述的偏振薄膜的制作方法，其特征在于，在所述介质光栅和所述金属层上形成保护层的操作为：通过镀膜工艺在所述介质光栅和所述金属层上形成保护层。
  15. 一种显示装置，其特征在于，包括权利要求1～10中任一项所述的偏振薄膜。
  16. 根据权利要求15所述的显示装置，其特征在于，所述显示装置为投影机、偏振分光棱镜或者平视显示器。
  17. 一种光波导镜片，其特征在于，所述光波导镜片包括：
    光波导，所述光波导具有用以接收光线的受光面和位于所述受光面另一侧的背光面；以及
    权利要求1～10中任一项所述的偏振薄膜，所述偏振薄膜位于所述光波导的背光面上，且所述偏振薄膜的透明基底远离所述光波导设置；
    其中，所述光波导与所述偏振薄膜之间具有空隙。
  18. 根据权利要求17所述的光波导镜片，其特征在于，所述偏振薄膜对S偏振光的透过率小于5％，所述偏振薄膜对P偏振光的透过率大于等于60％。
  19. 根据权利要求17所述的光波导镜片，其特征在于，所述光波导与所述偏振薄膜之间的距离为1μm～5cm。
  20. 根据权利要求17所述的光波导镜片，其特征在于，所述偏振薄膜通过粘结胶固定于所述光波导上，所述粘结胶位于所述偏振薄膜和所述光波导的边缘位置。
  21. 根据权利要求17所述的光波导镜片，其特征在于，所述光波导镜片还包括用以支撑所述偏振薄膜的刚性衬底，所述刚性衬底贴合于所述偏振薄膜远离所述光波导的一侧。
PCT/CN2023/077336 2022-09-27 2023-02-21 偏振薄膜及其制作方法、光波导镜片、显示装置 Ceased WO2024066176A1 (zh)

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