WO2024061105A1 - Functional film and preparation method therefor, and light-emitting device - Google Patents

Functional film and preparation method therefor, and light-emitting device Download PDF

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Publication number
WO2024061105A1
WO2024061105A1 PCT/CN2023/118874 CN2023118874W WO2024061105A1 WO 2024061105 A1 WO2024061105 A1 WO 2024061105A1 CN 2023118874 W CN2023118874 W CN 2023118874W WO 2024061105 A1 WO2024061105 A1 WO 2024061105A1
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film
quantum dot
quantum dots
metal cations
light
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PCT/CN2023/118874
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French (fr)
Chinese (zh)
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周礼宽
杨一行
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Tcl科技集团股份有限公司
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Publication of WO2024061105A1 publication Critical patent/WO2024061105A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/84Passivation; Containers; Encapsulations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating

Definitions

  • the present application relates to the field of display devices, and in particular to a functional film, a preparation method thereof, and a light-emitting device.
  • Quantum Dot Light-Emitting Diode QLED, Quantum Dot Light-Emitting Diode
  • QLED Quantum Dot Light-Emitting Diode
  • common device structures of QLED include anode, quantum dots luminescent layer and cathode.
  • the quantum dot luminescent layer includes quantum dots. There are a large number of dangling bonds on the surface of the quantum dots. The exposed dangling bonds will form defect states and defect energy levels in the energy band gap, causing non-radiative transition losses and reducing the luminous efficiency of the quantum dots.
  • organic ligands such as long-chain carboxylic acid groups, amine groups and other organic compounds
  • these organic ligands are mostly anions and can only be partially passivated.
  • the dangling bonds of metal cations on the quantum dot surface, and their charge-balanced cations show high solvation energy and low affinity to the quantum dot surface, such as hydrogen ions, alkali metal cations, NH 3 + or N 2 H 5 + , etc. , unable to passivate the anionic dangling bonds on the quantum dot surface.
  • Unpassivated anionic dangling bonds have a greater impact on the luminous efficiency or lifetime of the device.
  • This application proposes a functional film, which includes quantum dots and metal cations connecting at least two adjacent quantum dots.
  • the metal cations form chemical bonds with the first anions on the surface of the quantum dots.
  • the functional film is composed of the quantum dots and the metal cations connecting at least two adjacent quantum dots.
  • the metal cations include at least one of divalent metal cations and trivalent metal cations.
  • the atomic percentage of the metal cations in the functional film is 0.1 to 5%; and/or,
  • the quantum dots with the metal cations connected to their surfaces are first quantum dots, and the hydrated particle size of the first quantum dots is 20 to 50 nm.
  • the divalent metal cations include Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and Fe 2 +
  • the trivalent metal cation includes at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
  • This application also provides a method for preparing a functional membrane, which includes the following steps:
  • the treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations to obtain a functional film.
  • the metal cations include at least one of divalent metal cations and trivalent metal cations; and/or,
  • the treatment liquid also contains a second anion, and the second anion includes at least one of nitrate ions, sulfate ions, sulfonate ions and perchlorate ions; and/or,
  • the time for contacting the treatment liquid with the surface of the quantum dot film is 5-30 seconds.
  • the divalent metal cation includes at least one of Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and Fe 2+
  • the trivalent metal cation includes at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
  • the treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations,
  • the steps to obtain functional membranes include:
  • the treatment liquid is placed on the surface of the quantum dot film to form a liquid film, and after standing, the liquid film is removed to obtain a functional film; or,
  • the quantum dot film is placed in the treatment liquid, so that at least one surface of the quantum dot film is in contact with the treatment liquid, and after standing, the quantum dot film is taken out, and the surface of the quantum dot film is removed. Treat the liquid to obtain a functional membrane.
  • the treatment liquid is placed on the quantum dot
  • the method of forming a liquid film on the surface of the film includes: using a treatment solution with a concentration of 2-5 mg/mL to repeatedly coat the surface of the quantum dot film multiple times to form a liquid film; or,
  • the method of arranging the treatment liquid on the surface of the quantum dot film to form a liquid film includes: using a treatment liquid with a concentration of 5-50 mg/mL to coat the surface of the quantum dot film once to form a liquid film. membrane.
  • the quantum dot film is placed in the treatment liquid, so that at least one surface of the quantum dot film is in contact with the treatment liquid, and then the quantum dot film is removed after standing.
  • the concentration of the treatment liquid is 5-50 mg/mL.
  • the light-emitting device includes a stacked anode, a light-emitting layer, and a cathode.
  • the light-emitting layer includes a functional film.
  • the functional film includes the functional film as described above, or the functional film Prepared by the preparation method as described above.
  • the quantum dots of the functional film are selected from one or more of single structure quantum dots and core-shell structure quantum dots
  • the material of the single structure quantum dot is selected from At least one of Group II-VI compounds, Group IV-VI compounds, Group III-V compounds and Group I-III-VI compounds
  • the Group II-VI compounds are selected from the group consisting of CdS, CdSe, CdTe, ZnS, C dZnSeS, At least one of CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and HgZnSTe
  • the IV-VI compound is selected from SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, At least one
  • the anode and the cathode are independently selected from metal electrodes, carbon material electrodes, metal oxide electrodes or composite electrodes, and the material of the metal electrode is selected from the group consisting of Ag, Al, Mg, Au, Cu, Mo, Yb, Ca and at least one of Ba, the material of the carbon material electrode is selected from at least one of graphite, carbon nanotubes, graphene and carbon fiber, the material of the metal oxide electrode is selected from ITO, FTO, ATO, AZO , at least one of GZO, IZO, MZO and AMO, the composite electrode is selected from AZO/Ag/AZO, AZO/Al/AZO, ITO/Ag/ITO, ITO/Al/ITO, ZnO/Ag/ZnO, At least one of ZnO/Al/ZnO, TiO 2 /Ag/TiO 2 , TiO 2 /Al/TiO 2 , ZnS/Ag/ZnS,
  • the light-emitting device further includes a hole function layer provided between the anode and the light-emitting layer, the hole function layer includes a hole transport layer and/or Or a hole injection layer, the materials of the hole transport layer and the hole injection layer are independently selected from TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, transition At least one of metal sulfide, transition metal tinide, doped graphene, non-doped graphene and C60; and/or,
  • the light-emitting device further includes an electronic functional layer provided between the cathode and the light-emitting layer.
  • the electronic functional layer includes an electron transport layer and/or an electron injection layer.
  • the electron transport layer and/or the electron injection layer The material of the injection layer includes inorganic materials and/or organic materials.
  • the inorganic materials are selected from doped or non-doped metal oxides.
  • the metal oxides include zinc oxide, barium oxide, aluminum oxide, nickel oxide, and titanium oxide.
  • copper, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate are examples of copper, zinc tin, indium phosphide, gallium pho
  • the doped elements include aluminum, magnesium, lithium, manganese, yttrium, lanthanum, One or more of copper, nickel, zirconium, cerium, and gadolinium.
  • the organic material is selected from quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds. or more.
  • this application also proposes a display device, which includes the light-emitting device as described above.
  • this application provides a functional film containing quantum dots, adjacent quantum dots are connected through metal cations, and the metal cations form chemical bonds with the first anions on the surface of the quantum dots, thereby suspending the anions on the surface of the quantum dots. It plays a passivation role, reducing defect states on the surface of quantum dots, eliminating non-radiative channels introduced by defect states, which is beneficial to improving the fluorescence quantum yield (PLQY) of quantum dots; at the same time, because adjacent quantum dots are connected through metal cations Together, the functional film is made denser, the coupling effect is enhanced, and the carrier transmission speed is increased, thereby obtaining a higher exciton density, which is beneficial to improving the luminous efficiency or lifetime of the device.
  • PLQY fluorescence quantum yield
  • Figure 1 is a schematic flow chart of a method for preparing a functional film provided by the first embodiment of the present application
  • Figure 2 is a schematic flow chart of a method for preparing a functional film provided in the second embodiment of the present application
  • FIG3 is a schematic flow chart of a method for preparing a functional film provided in a third embodiment of the present application.
  • Figure 4 is a schematic flow chart of a method for preparing a functional film provided by the fourth embodiment of the present application.
  • Figure 5 is a schematic flow chart of a method for preparing a device provided in Embodiment 1 of the present application.
  • Figure 6 is a schematic structural diagram of a light-emitting device provided by an embodiment of the present application.
  • FIG. 7 is a schematic structural diagram of a light-emitting device provided by another embodiment of the present application.
  • At least one means one or more, and “plurality” means two or more.
  • At least one means one or more, and “plurality” means two or more.
  • At least one means one of the following” or similar expressions thereof refers to any combination of these items, including any combination of a single item (items) or a plurality of items (items).
  • at least one of a, b, or c or “at least one of a, b, and c” can mean: a, b, c, a-b ( That is, a and b), a-c, b-c, or a-b-c, where a, b, and c can be single or multiple respectively.
  • This application proposes a functional film, which includes quantum dots and metal cations connecting at least two adjacent quantum dots.
  • the metal cations form chemical bonds with the first anions on the surface of the quantum dots.
  • the anions on the surface of the quantum dots are defined as the first anions.
  • the first anion can be a sulfur anion, a tellurium anion, a selenium anion, etc.
  • the outermost shell is ZnS
  • the surface of the quantum dot There are partially unpassivated sulfide anions, ie, in this example, the first anion is a sulfide anion.
  • a functional film is provided.
  • adjacent quantum dots are connected through metal cations.
  • the metal cations form chemical bonds with the first anions on the surface of the quantum dots, thereby affecting the quantum dots.
  • the anionic dangling bonds on the surface play a passivation role, reducing the defect states on the surface of the quantum dots and eliminating them.
  • the introduced non-radiative channel is beneficial to improving the fluorescence quantum yield (PLQY) of quantum dots; at the same time, because adjacent quantum dots are connected through metal cations, the functional film is made denser, the coupling effect is enhanced, and the current carrying capacity is improved.
  • the exciton transmission speed is increased, thereby obtaining a higher exciton density, which is beneficial to improving the luminous efficiency and lifetime of the device.
  • the functional film is composed of the quantum dots and the metal cations connecting at least two adjacent quantum dots.
  • the metal cations include at least one of divalent metal cations and trivalent metal cations.
  • Divalent metal cations can connect two adjacent quantum dots, and trivalent metal cations can connect three adjacent quantum dots.
  • the divalent metal cations can be selected from any one or more divalent metal cations.
  • the divalent metal cations can include but are not limited to Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , at least one of Pt 2+ , Cu 2+ , Co 2+ and Fe 2+ ;
  • the trivalent metal cation can be selected from any one or more metal cations with a trivalent valence state, for example, trivalent metal cations It may include but is not limited to at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
  • the quantum dots may be one of red quantum dots, green quantum dots and blue quantum dots.
  • the quantum dots are selected from one or more of single structure quantum dots and core-shell structure quantum dots.
  • the materials of the single structure quantum dots are selected from the group consisting of II-VI compounds, IV-VI compounds, III-V compounds and At least one of the compounds of Group I-III-VI, wherein the compound of Group II-VI is selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe
  • the IV-VI group compound is selected from at least one of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe
  • the III-V group compound is selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, At least one of AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, In
  • the shell material of the core-shell structure quantum dots includes at least one of CdS, CdTe, CdSeTe, CdZnSe, CdZnS, CdSeS, ZnSe, ZnSeS, ZnS and the above single structure quantum dots .
  • the quantum dots also contain metal cations. To facilitate distinction, the metal cations connecting adjacent quantum dots are defined as first metal cations, and all metal cations in the quantum dots are defined as second metal cations.
  • the atomic percentage of the first metal cation in the functional film, is 0.1-5%, for example, the atomic percentage of the first metal cation can be 0.1%, 0.2%, 0.5%, 0.8%, 1%, 1.5%, 2%, 3%, 5%, and values within the range between any two of the above values.
  • the atomic percentage described in the present application refers to the percentage of the number of atoms of the first metal cation to the total number of all atoms in the functional film.
  • the functional film contains a plurality of quantum dots, wherein at least part of the surface of the quantum dots is connected to the metal cation.
  • this surface is connected to the metal cation.
  • Quantum dots are defined as first quantum dots, and other quantum dots that are not connected to the metal cation are defined as second quantum dots.
  • the hydrated particle size of the first quantum dot is 20-50 nm.
  • the hydrated particle size reflects the comprehensive particle size of the quantum dots in the solution state.
  • the hydrated particle size range of the first quantum dot may be 20-30nm, 23-35nm, 25-38nm, 30-40nm, 35-40nm, 39-45nm, 42-50nm, etc.
  • inventions of the present application provide a method for preparing a functional film.
  • Figures 1 to 4 are specific examples of the method for preparing the functional film.
  • the preparation method of the functional film includes the following steps:
  • Step S10 Provide a treatment liquid and a quantum dot film, where the treatment liquid contains metal cations.
  • step S20 the treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations to obtain a functional film.
  • the quantum dot film described in this application refers to a film formed on a substrate using quantum dot luminescent materials. It can be specifically achieved using conventional techniques in the art, for example, chemical methods or physical methods. Chemical methods include chemical vapor deposition, continuous ion layer adsorption and reaction, anodizing, electrolytic deposition, and co-precipitation. Physical methods include physical coating methods and solution methods.
  • Physical coating methods include: thermal evaporation coating method, electron beam evaporation coating method, magnetron sputtering method, multi-arc ion coating method, physical vapor deposition method, atomic layer deposition method, pulse laser Deposition method, etc.; solution method can be spin coating, printing, inkjet printing, scraping method, printing method, dipping and pulling method, soaking method, spray coating method, roller coating method, casting method, slit coating method and strip coating method, etc.
  • a treatment solution containing metal cations is used to surface treat the quantum dot film.
  • the metal cations can passivate the anionic dangling bonds on the surface of the quantum dots, thereby reducing the defect states on the surface of the quantum dots and eliminating defects caused by the defect states.
  • Shallow traps and deep traps improve carrier transport capabilities and eliminate some fast non-radiative channels introduced by defect states, which is beneficial to improving the fluorescence quantum yield (PLQY) of quantum dots and enabling devices to obtain higher currents. efficiency and lifetime stability.
  • this application uses a treatment solution to treat the surface of the quantum dot film after the quantum dot film is formed.
  • Metal cations can serve as bridging ligands to connect adjacent quantum dots, making the quantum dot film denser and enhancing coupling. effect, which is conducive to increasing the carrier transmission speed.
  • the treatment liquid is added during the film preparation stage, the problem of agglomeration in the liquid phase will occur due to quantum dot bridging, which will affect subsequent film preparation.
  • the metal cation may be selected from, but is not limited to, at least one of divalent metal cations and trivalent metal cations.
  • the divalent metal cation can be selected from but not limited to Mg 2+ , Pd 2+ , Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and At least one of Fe 2+ .
  • the trivalent metal cation may be selected from, but is not limited to, at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ , and In 3+ .
  • the above-mentioned metal cations help passivate the anions on the quantum dot surface into bonds to form fewer lattice defects.
  • the treatment liquid may contain one or more metal cations, for example, it may contain two or more divalent cations, or it may contain both divalent cations and trivalent cations.
  • the type mentioned here refers to the same type of element and the same valence state.
  • the metal cation includes one of Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Al 3+ and In 3+ .
  • the functional film can achieve short-range and long-range ordering, which helps to improve device performance.
  • the treatment liquid also contains anions, which mainly cooperate with metal cations to achieve charge balance.
  • this anion is defined as the second anion in this article. Since the role of the second anion is to cooperate with the metal cation to achieve charge balance, the second anion can be any anion that can cooperate with the cation to form a soluble salt. Further, the second anion may be an anion with low affinity to the quantum dot surface, for example, at least one of nitrate ions, sulfate ions, sulfonate ions, and perchlorate ions. Compared with halide ions, etc., the above-mentioned Select organic ligands that will not affect the surface connection of quantum dots to avoid increasing surface defect states and affecting the luminous efficiency and lifetime of the device.
  • the solvent in the treatment liquid includes an alcohol phase solvent, and the alcohol phase solvent can be selected from, but is not limited to, at least one of methanol, ethanol, isopropyl alcohol, and butanol.
  • the quantum dot film can be a film made of any quantum dot luminescent material known in the art for use in the quantum dot luminescent layer.
  • the quantum dots may be one of red quantum dots, green quantum dots and blue quantum dots.
  • the quantum dots are selected from one or more of single structure quantum dots and core-shell structure quantum dots.
  • the materials of the single structure quantum dots are selected from the group consisting of II-VI compounds, IV-VI compounds, III-V compounds and At least one of the compounds of Group I-III-VI, wherein the compound of Group II-VI is selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgS
  • the IV-VI group compound is selected from at least one of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe
  • the III-V group compound is selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, At least one of AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, In
  • the contact time for bringing the treatment liquid into contact with the surface of the quantum dot film in step S20 is further limited.
  • the contact time may be 5-30 s, for example, The contact time can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s and values within the range between any two of the above values, etc. Controlling the contact time within this range helps ensure that the anionic dangling bonds on the surface of the quantum dots are fully passivated and ensures effective bridging between quantum dots.
  • step S20 there are many ways to bring the treatment liquid into contact with the surface of the quantum dot film.
  • the treatment liquid is placed on the surface of the quantum dot film through a solution method, or the quantum dot film is soaked. in the treatment fluid, etc.
  • the solution method can be coating method, printing method, inkjet printing method, blade coating method, printing method, dip pulling method, soaking method, spray coating method, roller coating method, casting method, slit coating method and Strip coating method, etc.
  • the treatment liquid achieves cationic passivation of the surface of the quantum dot film and bridges the quantum dots.
  • step S20 can be implemented as follows:
  • Step S21 The treatment liquid is placed on the surface of the quantum dot film to form a liquid film. After standing, the liquid film is removed to obtain a functional film.
  • the concentration of the treatment liquid used can be 2-50 mg/mL, for example, 2 mg/mL, 3 mg/mL, 4 mg/mL, 5 mg/mL, 6 mg/mL, 8 mg/mL, 10 mg/mL, 15 mg/mL, 20 mg/mL, 25 mg/mL, 30 mg/mL, 35 mg/mL, 40 mg/mL, 45 mg/mL, 50 mg/mL and values within the range between any two of the above values, etc.
  • Using a treatment liquid in this range to treat the quantum dot film can achieve effective connection between quantum dots, and make its surface fully passivated, effectively reducing its surface defects.
  • the solution method can be used to coat the surface of the quantum dot film with a treatment liquid to form a liquid film.
  • This not only has high processing efficiency, but also the thickness of the formed liquid film is uniform and controllable, which helps to make the surface of the quantum dot film various. Everywhere is evenly modified.
  • scraping or spin coating can be used. Taking spin coating as an example, this application does not limit the specific rotation speed during spin coating. During implementation, the spin coating speed is subject to being able to form a film to cover the surface of the quantum dot film to achieve ligand exchange.
  • the rotation speed during spin coating is It can be set to 1000-5000rpm, for example, 1000rpm, 2000rpm, 3000rpm, 4000rpm, 5000rpm, and values within the range between any two of the above values. In this way, it can ensure the spreadability while ensuring the formation of a single layer of liquid.
  • the film has a certain thickness to provide a sufficient amount of cations so that the surface of the quantum dots can be fully modified. It is understood that the rotation speed of spin coating can also be set higher, but accordingly, the number of spin coatings can be increased to ensure that the amount of cations contained in the formed multi-layer liquid film is sufficient to fully modify the surface of the quantum dot film it covers.
  • step S21 may be performed as follows:
  • Step S21a Use a treatment liquid with a concentration of 5-50 mg/mL to coat the surface of the quantum dot film once to form a liquid film.
  • the concentration of the treatment solution can be 5mg/mL, 6mg/mL, 8mg/mL, 10mg/mL, 15mg/mL, 20mg/mL, 25mg/mL, 30mg/mL, 35mg/mL, 40mg/mL, 45mg/mL, 50mg/mL, and values within the range between any two of the above values, etc.
  • step S21a after forming the liquid film, let it stand for 5-30 seconds and then remove the liquid film to ensure that adjacent quantum dots in the quantum dot film can be connected to each other through metal cations.
  • the resting time can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s and any value in the range between any two of the above values. wait.
  • step S21 may be performed as follows:
  • Step S21b Use a treatment liquid with a concentration of 2-5 mg/mL to coat the surface of the quantum dot film multiple times to form a liquid film.
  • the concentration of the treatment solution can be 2mg/mL, 2.5mg/mL, 3mg/mL, 3.5mg/mL, 4mg/mL, 4.5mg/mL, 5mg/mL, or between any two of the above values. Values within the range, etc.
  • the use of multiple coatings of a lower concentration treatment solution can ensure that the film surface is fully modified while preventing the liquid film from covering the film surface for too long, thus preventing the solvent from penetrating into the film and causing an increase in quantum dot surface defects.
  • step S21b after forming the liquid film, let it stand for 5-30 seconds and then remove the liquid film to ensure that adjacent quantum dots in the quantum dot film can be connected to each other through metal cations.
  • the resting time can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s and any value in the range between any two of the above values. wait.
  • the method for removing the liquid film may be washing, soaking, spin coating, centrifugation, etc.
  • the treatment liquid uses an alcohol phase solvent as the solvent of the metal salt. Based on this, in step S21, the treatment liquid is contacted with the surface of the quantum dot film for a period of time so that the surface is fully modified.
  • alcohol-phase solvents such as methanol, ethanol, butanol, isopropyl alcohol, etc., can be used to clean the film surface to remove the liquid film.
  • step S20 can also be implemented as follows:
  • Step S22 Place the quantum dot film in the treatment liquid, bring at least one surface of the quantum dot film into contact with the treatment liquid, take out the quantum dot film after standing, and remove the quantum dots.
  • the quantum dot film is soaked or covered in the treatment liquid, so that one or both sides of the quantum dot film can fully contact the treatment liquid, so that its surface can be fully modified by metal cations.
  • the contact time can be 5-30s, for example, it can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s, and any two of the above values. Values within the range, etc.
  • the concentration of the treatment liquid is 5-50 mg/mL, for example, 5 mg/mL, 6 mg/mL, 8 mg/mL, 10 mg/mL, 15 mg/mL, 20 mg/mL, 25 mg/mL, 30mg/mL, 35mg/mL, 40mg/mL, 45mg/mL, 50mg/mL and values within the range between any two of the above values, etc., while ensuring that the film surface of the same area is fully modified, Using a higher concentration (5-50 mg/mL) treatment solution requires shorter time to treat the film and avoids solvent penetration into the film.
  • the method for removing the treatment liquid on the surface of the quantum dot film may be washing, coating, centrifugation, etc.
  • the treatment liquid uses an alcohol phase solvent as the solvent of the metal salt. Based on this, in step S22, the treatment liquid is contacted with the surface of the quantum dot film for a period of time, so that the surface of the quantum dot film is After being fully modified, alcohol-phase solvents, such as methanol, ethanol, butanol, isopropyl alcohol, etc., can be used to clean the film surface to remove the treatment solution on the surface of the quantum dot film.
  • alcohol-phase solvents such as methanol, ethanol, butanol, isopropyl alcohol, etc.
  • the embodiment of the present application also provides a light-emitting device 100.
  • the light-emitting device 100 includes a stacked anode 10, a light-emitting layer 20 and a cathode 40.
  • the light-emitting layer 20 includes a functional film, and the functional film includes the above-mentioned A functional film, or the functional film is prepared by the preparation method as described above.
  • the quantum dots of the functional film are selected from one or more of single structure quantum dots and core-shell structure quantum dots, and the materials of the single structure quantum dots are selected from II-VI compounds, IV-VI compounds, III -At least one of Group V compounds and Group I-III-VI compounds, wherein the Group II-VI compound is selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS , CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, At least one of CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, Cd
  • the light-emitting device 100 has high luminous efficiency and lifespan; at the same time, because the film itself has a strong coupling effect, it is conducive to carrier transmission, thereby conducive to improving The carrier mobility of the light-emitting device 100 obtains a higher exciton density in the light-emitting layer 20 and improves the luminous efficiency and life of the device.
  • the light-emitting layer 20 may have a single film layer structure composed of a single layer of functional films, or may have a composite film layer structure composed of multiple layers of functional films.
  • each film layer can be configured as the functional film, which helps to further improve the luminous efficiency and lifespan of the device including the luminescent layer 20 .
  • the light-emitting device 100 includes but is not limited to a quantum dot light-emitting diode. During actual processing, the above-mentioned light-emitting device 100 can be prepared using a quantum dot light-emitting diode preparation method known in the art.
  • the materials of cathode 40 and anode 10 may be any known in the art.
  • the materials of the anode 10 and the cathode 40 may be, for example, one or more of metals, carbon materials, and metal oxides.
  • the metal can be, for example, one or more of Ag, Al, Mg, Au, Cu, Mo, Yb, Ca, and Ba;
  • the carbon material can be, for example, one or more of graphite, carbon nanotubes, graphene, and carbon fiber.
  • the metal oxide can be doped or undoped metal oxide, including indium-doped tin oxide (ITO), fluorine-doped tin oxide (FTO), antimony-doped tin oxide (ATO), aluminum-doped zinc oxide (AZO), gallium doped zinc oxide (GZO), indium doped oxide One or more of zinc (IZO), magnesium-doped zinc oxide (MZO) and aluminum-doped magnesium oxide (AMO).
  • the anode 10 and the cathode 40 may also include composite electrodes with metal sandwiched between doped or undoped transparent metal oxides.
  • the composite electrodes may be, for example, AZO/Ag/AZO, AZO/Al/AZO, ITO/Ag/ITO, ITO/Al/ITO, ZnO/Ag/ZnO, ZnO/Al/ZnO, TiO 2 /Ag/TiO 2 , TiO 2 /Al/TiO 2 , ZnS/Ag/ZnS, ZnS/Al/ ZnS etc.
  • the light-emitting device 100 may also include an electronic functional layer disposed between the cathode 40 and the light-emitting layer 20 .
  • the electronic functional layer may be the electron transport layer 30 or the electronic functional layer 30 .
  • the injection layer may also be an electron injection layer and an electron transport layer 30.
  • the electron functional layer is a stacked electron injection layer and electron transport layer 30, the cathode 40, the electron injection layer, the electron transport layer 30 and the light emitting layer 20 are stacked in sequence.
  • the electron transport layer 30 and/or the electron injection layer are made of materials including inorganic materials and/or organic materials.
  • the inorganic materials are selected from doped or undoped metal oxides, and the metal oxides include zinc oxide.
  • barium oxide aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, aluminum zinc oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, sulfide
  • cadmium zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate.
  • the doped elements include One or more of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium, and the organic material is selected from quinoxaline compounds, imidazole compounds, and triazine compounds, containing One or more of fluorene compounds and hydroxyquinoline compounds.
  • the light-emitting device 100 may further include a hole injection layer 60 and a hole transport layer 50 disposed in sequence between the anode 10 and the light-emitting layer 20 .
  • the material of the hole transport layer 50 can be selected from organic materials with hole transport capabilities, including but not limited to TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfide At least one of material, transition metal tin compound, doped graphene, non-doped graphene and C60.
  • organic materials with hole transport capabilities including but not limited to TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-
  • the material of the hole injection layer 60 is a material known in the art for the hole injection layer 60, including but not limited to TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD , PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, At least one of transition metal sulfide, transition metal tinide, doped graphene, non-doped graphene and C60.
  • the method of forming the light-emitting layer 20 and other functional layers such as the hole injection layer 60, the hole transport layer 50 and the electron transport layer 30 may be chemical or physical.
  • the chemical method can be chemical vapor deposition method, continuous ion layer adsorption and reaction method, anodizing method, electrolytic deposition method, co-precipitation method, etc.
  • the physical method can be physical coating method or solution processing method.
  • the physical coating method can be thermal evaporation coating method CVD, electron beam evaporation coating method, magnetron sputtering method, multi-arc ion coating method, physical vapor deposition method PVD, atomic layer deposition.
  • the solution processing method can be spin coating method, printing method, inkjet printing method, scraping method, printing method, dip pulling method, soaking method, spray coating method, roller coating method, casting method, Slit coating method and strip coating method, etc.
  • the solution processing method can be spin coating method, printing method, inkjet printing method, scraping method, printing method, dip pulling method, soaking method, spray coating method, roller coating method, casting method, Slit coating method and strip coating method, etc.
  • a luminescent material solution is provided, wherein the luminescent material in the luminescent material solution is red quantum dots CdZnSe/ZnSeS/ZnS, the solvent is n-octane, and the concentration of the luminescent material solution is 10 mg/mL. Then, the luminescent material solution is spin-coated on quartz glass at a speed of 2000 rpm to obtain a quantum dot film.
  • the luminescent material solution is spin-coated on quartz glass at a speed of 2000 rpm to obtain a quantum dot film.
  • This embodiment provides a QLED device.
  • the structure of the QLED device is: substrate/QLED anode/hole injection layer/hole transport layer/light-emitting layer/electron transport layer/QLED cathode.
  • the method of preparing the device includes the following steps:
  • S101 Provide glass substrate.
  • S102 Prepare an ITO film with a thickness of 100 nm on the glass substrate by magnetron sputtering to form the anode 10.
  • S104 Spin-coat the TFB material on the hole injection layer 60 to obtain the hole transport layer 50 with a thickness of 30 nm.
  • S105 Spin-coat the luminescent material solution on the hole transport layer 50 to obtain a quantum dot film with a thickness of 20 nm, wherein the luminescent material in the luminescent material solution is red quantum dots CdZnSe/ZnSeS/ZnS, and the solvent is positive Octane, the concentration of the luminescent material solution is 15 mg/mL. Then, use an ethanol solution of 10 mg/ml cadmium nitrate to spin-coat (2000 rpm) on the quantum dot film to form a film. After 10 seconds, spin-coat the quantum dot film with ethanol to clean the quantum dot film to obtain the luminescent layer 20 .
  • S107 Evaporate Ag on the electron transport layer 30 to obtain a cathode 40 with a thickness of 100 nm, and obtain a light-emitting diode.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of calcium nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1, and the only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of aluminum nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of indium nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of manganese nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of platinum nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1, and the only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of zinc nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of copper nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of iron nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of cadmium nitrate was changed to the ethanol solution of nickel nitrate.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of 10 mg/ml cadmium nitrate was changed to the ethanol solution with a concentration of 2 mg/mL manganese sulfate.
  • the number of spin coatings was changed from 1 to 5 times. After the liquid film was formed, the standing time was changed from 10s to 30s.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of 10 mg/ml cadmium nitrate was changed to the ethanol solution of lead methane sulfonate with a concentration of 50 mg/mL.
  • the spin coating speed was changed from 2000rpm to 5000rpm.
  • the standing time was changed from 10s to 5000rpm. 5s.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the ethanol solution of 10 mg/ml cadmium nitrate was changed to the ethanol solution of zinc perchlorate with a concentration of 5 mg/mL.
  • the number of spin coatings was changed from 1 to 2 times.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1, and the only difference from Embodiment 1 is that in this embodiment:
  • Step (2) is changed to: place the quantum dot film in a 10 mg/ml cadmium nitrate ethanol solution, so that the lower side of the quantum dot film is in contact with the solution surface for 10 seconds, take out the quantum dot film, and rinse the surface of the quantum dot film with ethanol. Obtain functional membrane.
  • Embodiment 14 This embodiment is basically the same as Embodiment 14. The only difference from Embodiment 14 is that in this embodiment:
  • the concentration of the cadmium nitrate ethanol solution used was changed from 10mg/ml to 5mg/mL, and the contact time was 30s.
  • Embodiment 14 This embodiment is basically the same as Embodiment 14. The only difference from Embodiment 14 is that in this embodiment:
  • the concentration of the cadmium nitrate ethanol solution used was changed from 10mg/ml to 50mg/mL, and the contact time was 5s.
  • Embodiment 1 This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
  • the treatment solution used was changed from a 10 mg/ml cadmium nitrate ethanol solution to a mixed solution of manganese nitrate and copper nitrate dissolved in ethanol.
  • the mixed solution the molar ratio of manganese nitrate and copper nitrate was 1:1, and the molar ratio of manganese nitrate and copper nitrate was 1:1.
  • the total concentration is 10mg/ml.
  • This comparative example is basically the same as Example 1. The only difference from Example 1 is that in this comparative example:
  • Step (2) is reduced.
  • a quantum dot solution is provided, wherein the quantum dots are red quantum dots CdZnSe/ZnSeS/ZnS, the solvent is n-octane, and the concentration of the solution is 20 mg/mL.
  • Example 1 The only difference between the preparation steps of the device in this comparative example and Example 1 is that when preparing the luminescent layer, the treated quantum dot solution prepared in Comparative Example 2 is directly spin-coated on the hole transport layer to form a film to obtain the luminescent layer.
  • This comparative example is basically the same as comparative example 2. The only difference from comparative example 2 is that in this comparative example:
  • the added amount of cadmium nitrate ethanol solution is 0.5 mL.
  • the obtained treated quantum dot solution exhibits aggregation phenomenon.
  • This comparative example is basically the same as comparative example 2. The only difference from comparative example 2 is that in this comparative example:
  • the treatment solution used is zinc nitrate ethanol solution.
  • This comparative example is basically the same as comparative example 2. The only difference from comparative example 2 is that in this comparative example:
  • the treatment liquid used is indium nitrate ethanol solution.
  • metal salt solutions cadmium nitrate ethanol solution, calcium nitrate ethanol solution, aluminum nitrate ethanol solution, indium nitrate ethanol solution, manganese nitrate ethanol solution, platinum nitrate ethanol solution, zinc nitrate ethanol solution, copper nitrate ethanol solution, iron nitrate ethanol solution, Nickel nitrate ethanol solution
  • metal salt solutions cadmium nitrate ethanol solution, calcium nitrate ethanol solution, aluminum nitrate ethanol solution, indium nitrate ethanol solution, manganese nitrate ethanol solution, platinum nitrate ethanol solution, zinc nitrate ethanol solution, copper nitrate ethanol solution, iron nitrate ethanol solution, Nickel nitrate ethanol solution
  • a quantum dot solution wherein the quantum dots are red quantum dots CdZnSe/ZnSeS/ZnS, the solvent is n-octane, and the concentration of the solution is 20 mg/mL.
  • the quantum dots are red quantum dots CdZnSe/ZnSeS/ZnS
  • the solvent is n-octane
  • the concentration of the solution is 20 mg/mL.
  • a dynamic light scattering instrument was used to detect the hydrated particle size of the quantum dots in the quantum dot solution and the treated quantum dot solution, and the results were recorded in Table 1.
  • the data of the hydrated particle size test reflects the comprehensive particle size of the quantum dots and ligands in the solution state. There are only one particle size distribution of quantum dots in the quantum dot solution. After adding a metal salt solution to the quantum dot solution, quantum dots of two particle sizes appear in the solution.
  • the hydrated particle size distribution of the first quantum dot is within 30 ⁇ 50nm, the hydrated particle size of the second quantum dot is distributed between 10 ⁇ 20nm, and the hydrated particle size of the first quantum dot is larger than that of the second quantum dot. This is because the metal cations simultaneously interact with the anions on the surface of multiple quantum dots. Connection, such that adjacent quantum dots are bridged by metal cations, resulting in an increase in hydrated particle size;
  • Comparative Example 2 Comparative Example 3 and the above-mentioned experimental steps for hydrated particle size detection, it can be seen that when the amount of metal salt solution added is up to 0.5 ml, the treated quantum dot solution shows coagulation phenomenon. Obviously, the method of directly adding metal salt solution to the quantum dot solution can only allow the addition of a small amount of metal salt solution for treatment, which will inevitably lead to a lower content of the first quantum dots in the treated solution.
  • the atomic percentage content of each atom of the quantum dot can be obtained, and the sum of the atomic percentage content of all metal atoms is calculated, which is Atomic percentage (At%) of the second metal cation;
  • the atomic percentage of each atom in the treated sample can be obtained. If the treatment solution is used If the type of metal cation contained is the type already present in the quantum dot film or quantum dot solution before treatment, then the difference in content of the metal element before and after treatment is taken as the atomic percentage (At%) of the first metal cation. If the The type of metal cations contained in the treatment liquid is a new type that the quantum dot film or quantum dot solution before treatment does not have, then the atomic percentage content of the detected metal element is the atomic percentage content of the first metal cation (At %).
  • the hydrated particle size of the quantum dot solution will increase, and because the metal cations are connected to the quantum dots, the quantum dot film will also contain the metal cations.
  • Table 2 the data shows that after processing using the method of this application, the quantum dot film contains all The first metal cation. Combining the test results of Experimental Example 1, it can be concluded that after processing using the method of the present application, adjacent quantum dots in the quantum dot film are bridged through metal cations.
  • the emission peak (EL), half-maximum width (FWHM) and current efficiency (CE) of the quantum dot light-emitting diode were tested and calculated by Keithley 2400 high-precision digital source meter, Ocean Optic USB2000+ spectrometer and LS-160 luminance meter respectively;
  • test method of lifetime T95@1knit is the time it takes for the initial brightness L 0 (nit) of the device to decay to 95% under constant current, and is converted into the aging time at 1000 nit.
  • the light-emitting diodes of Examples 1 to 17 all have higher photoelectric performance and longer life T95@1000nit.
  • the metal cations form chemical bonds with the anions on the surface of the quantum dots, thereby passivating the anion dangling bonds on the surface of the quantum dots, reducing the defect states on the surface of the quantum dots, eliminating the non-radiative channels introduced by the defect states, and conducive to improving the quantum Fluorescence quantum yield (PLQY) of dots; at the same time, because adjacent quantum dots are connected through metal cations, the functional film is also made denser, the coupling effect is enhanced, the carrier transmission speed is increased, and higher excitation is obtained.
  • PLQY quantum Fluorescence quantum yield
  • the electron density improves the luminous efficiency and life of the light-emitting device; moreover, comparing Examples 1 to 10, it can be seen that when the metal cations contained in the treatment liquid used are Al 3+ , Mn 2+ , Pt 2+ , and Zn 2 + , Fe 3+ , the effect on improving the luminous efficiency and life of the light-emitting device is better.
  • Example 1 and Comparative Example 2 Example 7 and Comparative Example 4, and Example 4 and Comparative Example 5 respectively, and then compare them with Comparative Example 1 respectively. It can be seen that compared with the scheme of the present application, it is less effective in preparing quantum During the solution dispensing process, a treatment solution is added to modify the surface. If the final concentration of the added treatment solution is low (for example, less than 5 mmol/mL), although the photoelectric performance and lifespan of the device can be improved, the improvement effect will be limited.

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Abstract

A functional film and a preparation method therefor, and a light-emitting device (100). The functional film comprises quantum dots and metal cations connected to at least two adjacent quantum dots. The metal cations and first anions on the surfaces of the quantum dots form chemical bonds. Thus, the improvement of the fluorescence quantum yield (PLQY) of the quantum dots is facilitated; in addition, adjacent quantum dots are connected by means of the metal cations, thereby facilitating the improvement of the light-emitting efficiency and the service life of the device.

Description

功能膜及其制备方法及发光器件Functional film and preparation method thereof and light-emitting device
本申请要求于2022年09月22日在中国专利局提交的、申请号为202211177931.X、申请名称为“功能膜及其制备方法及发光器件和显示装置”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to the Chinese patent application filed with the China Patent Office on September 22, 2022, with the application number 202211177931. The entire contents are incorporated herein by reference.
技术领域Technical field
本申请涉及显示装置领域,尤其涉及一种功能膜及其制备方法及发光器件。The present application relates to the field of display devices, and in particular to a functional film, a preparation method thereof, and a light-emitting device.
背景技术Background technique
量子点发光二极管(QLED,Quantum Dot Light-Emitting Diode)器件具有发光色纯度高、色彩可调控、效率高、稳定性好、可全溶液加工等优点,目前QLED常见的器件结构包括阳极、量子点发光层和阴极。量子点发光层包括量子点,量子点表面存在大量的悬挂键,暴露的悬挂键会在能带隙中形成缺陷态和缺陷能级,造成非辐射跃迁损失并导致量子点发光效率降低。Quantum Dot Light-Emitting Diode (QLED, Quantum Dot Light-Emitting Diode) devices have the advantages of high luminous color purity, controllable color, high efficiency, good stability, and full solution processing. At present, common device structures of QLED include anode, quantum dots luminescent layer and cathode. The quantum dot luminescent layer includes quantum dots. There are a large number of dangling bonds on the surface of the quantum dots. The exposed dangling bonds will form defect states and defect energy levels in the energy band gap, causing non-radiative transition losses and reducing the luminous efficiency of the quantum dots.
技术问题technical problem
在量子点材料的制备过程中加入有机配体(例如长链羧酸基、胺基类等有机物)来钝化量子点表面的悬挂键,但这类有机配体多为阴离子,只能部分钝化量子点表面金属阳离子悬挂键,且其电荷平衡的阳离子表现出较高的溶剂化能和对量子点表面的低亲和力,比如氢离子、碱金属阳离子、NH3 +或N2H5 +等,无法钝化量子点表面的阴离子悬挂键。未钝化的阴离子悬挂键对器件的发光效率或寿命有较大的影响。During the preparation process of quantum dot materials, organic ligands (such as long-chain carboxylic acid groups, amine groups and other organic compounds) are added to passivate the dangling bonds on the surface of quantum dots. However, these organic ligands are mostly anions and can only be partially passivated. The dangling bonds of metal cations on the quantum dot surface, and their charge-balanced cations show high solvation energy and low affinity to the quantum dot surface, such as hydrogen ions, alkali metal cations, NH 3 + or N 2 H 5 + , etc. , unable to passivate the anionic dangling bonds on the quantum dot surface. Unpassivated anionic dangling bonds have a greater impact on the luminous efficiency or lifetime of the device.
技术解决方案Technical solutions
本申请提出一种功能膜,所述功能膜包含量子点以及连接至少两个相邻的所述量子点的金属阳离子,所述金属阳离子与所述量子点的表面的第一阴离子形成化学键。This application proposes a functional film, which includes quantum dots and metal cations connecting at least two adjacent quantum dots. The metal cations form chemical bonds with the first anions on the surface of the quantum dots.
可选的,在本申请的一些实施例中,所述功能膜由所述量子点以及连接至少两个相邻的所述量子点的所述金属阳离子组成。 Optionally, in some embodiments of the present application, the functional film is composed of the quantum dots and the metal cations connecting at least two adjacent quantum dots.
可选的,在本申请的一些实施例中,所述金属阳离子包括二价金属阳离子和三价金属阳离子中的至少一种。Optionally, in some embodiments of the present application, the metal cations include at least one of divalent metal cations and trivalent metal cations.
可选的,在本申请的一些实施例中,所述功能膜中,所述金属阳离子的原子百分含量为0.1~5%;和/或,Optionally, in some embodiments of the present application, the atomic percentage of the metal cations in the functional film is 0.1 to 5%; and/or,
所述功能膜中,表面连接有所述金属阳离子的所述量子点为第一量子点,所述第一量子点的水合粒径为20~50nm。In the functional film, the quantum dots with the metal cations connected to their surfaces are first quantum dots, and the hydrated particle size of the first quantum dots is 20 to 50 nm.
可选的,在本申请的一些实施例中,所述二价金属阳离子包括Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Cu2+、Co2+及Fe2+中的至少一种,所述三价金属阳离子包括Al3+、Fe3+、Ni3+、Cr3+及In3+中的至少一种。Optionally, in some embodiments of the present application, the divalent metal cations include Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and Fe 2 + , and the trivalent metal cation includes at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
本申请还提供一种功能膜的制备方法,包括以下步骤:This application also provides a method for preparing a functional membrane, which includes the following steps:
提供处理液和量子点薄膜,所述处理液中含有金属阳离子;Provide a treatment liquid and a quantum dot film, the treatment liquid containing metal cations;
将所述处理液与所述量子点薄膜的表面进行接触,以使得所述量子点薄膜中的相邻量子点通过所述金属阳离子相互连接,得到功能膜。The treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations to obtain a functional film.
可选的,在本申请的一些实施例中,所述金属阳离子包括二价金属阳离子和三价金属阳离子中的至少一种;和/或,Optionally, in some embodiments of the present application, the metal cations include at least one of divalent metal cations and trivalent metal cations; and/or,
所述处理液中还含有第二阴离子,所述第二阴离子包括硝酸根离子、硫酸根离子、磺酸根离子以及高氯酸根离子中的至少一种;和/或,The treatment liquid also contains a second anion, and the second anion includes at least one of nitrate ions, sulfate ions, sulfonate ions and perchlorate ions; and/or,
将所述处理液与所述量子点薄膜的表面进行接触的时间为5-30s。The time for contacting the treatment liquid with the surface of the quantum dot film is 5-30 seconds.
可选的,在本申请的一些实施例中,所述二价金属阳离子包括Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Cu2+、Co2+及Fe2+中的至少一种,所述三价金属阳离子包括Al3+、Fe3+、Ni3+、Cr3+及In3+中的至少一种。Optionally, in some embodiments of the present application, the divalent metal cation includes at least one of Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and Fe 2+ , and the trivalent metal cation includes at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
可选的,在本申请的一些实施例中,将所述处理液与所述量子点薄膜的表面进行接触,以使得所述量子点薄膜中的相邻量子点通过所述金属阳离子相互连接,得到功能膜的步骤包括:Optionally, in some embodiments of the present application, the treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations, The steps to obtain functional membranes include:
将所述处理液设置在所述量子点薄膜的表面,形成液膜,静置后去除所述液膜,得到功能膜;或者,The treatment liquid is placed on the surface of the quantum dot film to form a liquid film, and after standing, the liquid film is removed to obtain a functional film; or,
将所述量子点薄膜置于所述处理液中,使所述量子点薄膜的至少一表面与所述处理液接触,静置后取出所述量子点薄膜,并去除所述量子点薄膜表面的处理液,得到功能膜。The quantum dot film is placed in the treatment liquid, so that at least one surface of the quantum dot film is in contact with the treatment liquid, and after standing, the quantum dot film is taken out, and the surface of the quantum dot film is removed. Treat the liquid to obtain a functional membrane.
可选的,在本申请的一些实施例中,所述将所述处理液设置在所述量子点 薄膜的表面,形成液膜的方法包括:使用浓度为2-5mg/mL的处理液在所述量子点薄膜的表面重复涂覆多次,形成液膜;或者,Optionally, in some embodiments of the present application, the treatment liquid is placed on the quantum dot The method of forming a liquid film on the surface of the film includes: using a treatment solution with a concentration of 2-5 mg/mL to repeatedly coat the surface of the quantum dot film multiple times to form a liquid film; or,
所述将所述处理液设置在所述量子点薄膜的表面,形成液膜的方法包括:使用浓度为5-50mg/mL的处理液在所述量子点薄膜的表面进行一次涂覆,形成液膜。The method of arranging the treatment liquid on the surface of the quantum dot film to form a liquid film includes: using a treatment liquid with a concentration of 5-50 mg/mL to coat the surface of the quantum dot film once to form a liquid film. membrane.
可选的,在本申请的一些实施例中,将所述量子点薄膜置于所述处理液中,使所述量子点薄膜的至少一表面与所述处理液接触,静置后取出所述量子点薄膜,并去除所述量子点薄膜表面的处理液,得到功能膜的步骤中,所述处理液的浓度为5-50mg/mL。Optionally, in some embodiments of the present application, the quantum dot film is placed in the treatment liquid, so that at least one surface of the quantum dot film is in contact with the treatment liquid, and then the quantum dot film is removed after standing. In the step of removing the treatment liquid on the surface of the quantum dot film to obtain a functional film, the concentration of the treatment liquid is 5-50 mg/mL.
本申请还提供一种发光器件,所述发光器件包括层叠设置的阳极、发光层和阴极,所述发光层包括功能膜,所述功能膜包括如上所述的功能膜,或者,所述功能膜经如上文所述的制备方法制得。This application also provides a light-emitting device. The light-emitting device includes a stacked anode, a light-emitting layer, and a cathode. The light-emitting layer includes a functional film. The functional film includes the functional film as described above, or the functional film Prepared by the preparation method as described above.
可选的,在本申请的一些实施例中,所述功能膜的量子点选自单一结构量子点及核壳结构量子点中的一种或多种,所述单一结构量子点的材料选自II-VI族化合物、IV-VI族化合物、III-V族化合物和I-III-VI族化合物中的至少一种,其中,所述II-VI族化合物选自CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe及HgZnSTe中的至少一种,所述IV-VI族化合物选自SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe及SnPbSTe中的至少一种,所述III-V族化合物选自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs或InAlPSb中的至少一种,所述I-III-VI族化合物选自CuInS2、CuInSe2及AgInS2中的至少一种,所述核壳结构的量子点的核包括上述单一结构量子点中的任意一种,所述核壳结构的量子点的壳层材料包括CdS、CdTe、CdSeTe、 CdZnSe、CdZnS、CdSeS、ZnSe、ZnSeS、ZnS和上述单一结构量子点中的至少一种;和/或,Optionally, in some embodiments of the present application, the quantum dots of the functional film are selected from one or more of single structure quantum dots and core-shell structure quantum dots, and the material of the single structure quantum dot is selected from At least one of Group II-VI compounds, Group IV-VI compounds, Group III-V compounds and Group I-III-VI compounds, wherein the Group II-VI compounds are selected from the group consisting of CdS, CdSe, CdTe, ZnS, C dZnSeS, At least one of CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and HgZnSTe, the IV-VI compound is selected from SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, At least one of PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe, the III-V compound is selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, At least one of GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs or InAlPSb, the I-III-VI group compound is selected from at least one of CuInS 2 , CuInSe 2 and AgInS 2 , and the core-shell structure The core of the quantum dot includes any one of the above single structure quantum dots, and the shell material of the quantum dot of the core-shell structure includes CdS, CdTe, CdSeTe, CdZnSe, CdZnS, CdSeS, ZnSe, ZnSeS, ZnS and at least one of the above single structure quantum dots; and/or,
所述阳极和所述阴极分别独立地选自金属电极、碳材料电极、金属氧化物电极或复合电极,所述金属电极的材料选自Ag、Al、Mg、Au、Cu、Mo、Yb、Ca及Ba中的至少一种,所述碳材料电极的材料选自石墨、碳纳米管、石墨烯以及碳纤维中的至少一种,所述金属氧化物电极的材料选自ITO、FTO、ATO、AZO、GZO、IZO、MZO以及AMO中的至少一种,所述复合电极选自AZO/Ag/AZO、AZO/Al/AZO、ITO/Ag/ITO、ITO/Al/ITO、ZnO/Ag/ZnO、ZnO/Al/ZnO、TiO2/Ag/TiO2、TiO2/Al/TiO2、ZnS/Ag/ZnS以及ZnS/Al/ZnS中的至少一种。The anode and the cathode are independently selected from metal electrodes, carbon material electrodes, metal oxide electrodes or composite electrodes, and the material of the metal electrode is selected from the group consisting of Ag, Al, Mg, Au, Cu, Mo, Yb, Ca and at least one of Ba, the material of the carbon material electrode is selected from at least one of graphite, carbon nanotubes, graphene and carbon fiber, the material of the metal oxide electrode is selected from ITO, FTO, ATO, AZO , at least one of GZO, IZO, MZO and AMO, the composite electrode is selected from AZO/Ag/AZO, AZO/Al/AZO, ITO/Ag/ITO, ITO/Al/ITO, ZnO/Ag/ZnO, At least one of ZnO/Al/ZnO, TiO 2 /Ag/TiO 2 , TiO 2 /Al/TiO 2 , ZnS/Ag/ZnS, and ZnS/Al/ZnS.
可选的,在本申请的一些实施例中,所述发光器件还包括设于所述阳极和所述发光层之间的空穴功能层,所述空穴功能层包括空穴传输层和/或空穴注入层,所述空穴传输层和所述空穴注入层的材料分别独立地选自TFB、CuPc、PVK、Poly-TPD、DNTPD、TCATA、TCCA、CBP、TPD、NPB、NPD、PEDOT:PSS、TAPC、MCC、F4-TCNQ、HATCN、4,4',4'-三(N-3-甲基苯基-N苯基氨基)三苯胺、聚苯胺、过渡金属氧化物、过渡金属硫化物、过渡金属锡化物、掺杂石墨烯、非掺杂石墨烯以及C60中的至少一种;和/或,Optionally, in some embodiments of the present application, the light-emitting device further includes a hole function layer provided between the anode and the light-emitting layer, the hole function layer includes a hole transport layer and/or Or a hole injection layer, the materials of the hole transport layer and the hole injection layer are independently selected from TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, transition At least one of metal sulfide, transition metal tinide, doped graphene, non-doped graphene and C60; and/or,
所述发光器件还包括设于所述阴极和所述发光层之间的电子功能层,所述电子功能层包括电子传输层和/或电子注入层,所述电子传输层和/或所述电子注入层的材料包括无机材料和/或有机材料,所述无机材料选自掺杂或非掺杂的金属氧化物,所述金属氧化物包括氧化锌、氧化钡、氧化铝、氧化镍、氧化钛、氧化锡、氧化钽、氧化锆、氧化镍、氧化钛锂、氧化锌铝、氧化锌锰、氧化锌锡、氧化锌锂、氧化铟锡、硫化镉、硫化锌、硫化钼、硫化钨、硫化铜、锡化锌、磷化铟、磷化镓、硫化铜铟、硫化铜镓、钛酸钡中的一种或多种,掺杂的元素包括铝、镁、锂、锰、钇、镧、铜、镍、锆、铈、钆中的一种或多种,所述有机材料选自喹喔啉化合物、咪唑类化合物、三嗪类化合物,含芴类化合物、羟基喹啉化合物中的一种或多种。The light-emitting device further includes an electronic functional layer provided between the cathode and the light-emitting layer. The electronic functional layer includes an electron transport layer and/or an electron injection layer. The electron transport layer and/or the electron injection layer The material of the injection layer includes inorganic materials and/or organic materials. The inorganic materials are selected from doped or non-doped metal oxides. The metal oxides include zinc oxide, barium oxide, aluminum oxide, nickel oxide, and titanium oxide. , tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, sulfide One or more of copper, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate. The doped elements include aluminum, magnesium, lithium, manganese, yttrium, lanthanum, One or more of copper, nickel, zirconium, cerium, and gadolinium. The organic material is selected from quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds. or more.
另外,本申请还提出一种显示装置,所述显示装置包括如上文所述的发光器件。 In addition, this application also proposes a display device, which includes the light-emitting device as described above.
有益效果beneficial effects
相对现有技术,本申请提供了一种功能膜,其中含有量子点,相邻量子点通过金属阳离子连接,金属阳离子与量子点表面的第一阴离子形成化学键,从而对量子点表面的阴离子悬挂键起到了钝化作用,减少了量子点表面的缺陷态,消除缺陷态所引进的非辐射通道,有利于提升量子点的荧光量子产率(PLQY);同时,由于相邻量子点通过金属阳离子连接起来,使得功能膜更加致密,增强了耦合效应,有利于提升载流子传输速度,从而获得更高的激子密度,有利于提升器件的发光效率或寿命。Compared with the prior art, this application provides a functional film containing quantum dots, adjacent quantum dots are connected through metal cations, and the metal cations form chemical bonds with the first anions on the surface of the quantum dots, thereby suspending the anions on the surface of the quantum dots. It plays a passivation role, reducing defect states on the surface of quantum dots, eliminating non-radiative channels introduced by defect states, which is beneficial to improving the fluorescence quantum yield (PLQY) of quantum dots; at the same time, because adjacent quantum dots are connected through metal cations Together, the functional film is made denser, the coupling effect is enhanced, and the carrier transmission speed is increased, thereby obtaining a higher exciton density, which is beneficial to improving the luminous efficiency or lifetime of the device.
附图说明Description of the drawings
为了更清楚地说明本申请实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application. For those skilled in the art, other drawings can also be obtained based on these drawings without exerting creative efforts.
图1是本申请第一实施例提供的一种功能膜的制备方法的流程示意图;Figure 1 is a schematic flow chart of a method for preparing a functional film provided by the first embodiment of the present application;
图2是本申请第二实施例提供的一种功能膜的制备方法的流程示意图;Figure 2 is a schematic flow chart of a method for preparing a functional film provided in the second embodiment of the present application;
图3是本申请第三实施例提供的一种功能膜的制备方法的流程示意图;FIG3 is a schematic flow chart of a method for preparing a functional film provided in a third embodiment of the present application;
图4是本申请第四实施例提供的一种功能膜的制备方法的流程示意图;Figure 4 is a schematic flow chart of a method for preparing a functional film provided by the fourth embodiment of the present application;
图5是本申请实施例1提供的一种制备器件的方法的流程示意图;Figure 5 is a schematic flow chart of a method for preparing a device provided in Embodiment 1 of the present application;
图6是本申请一实施例提供的发光器件的结构示意图;Figure 6 is a schematic structural diagram of a light-emitting device provided by an embodiment of the present application;
图7是本申请另一实施例提供的发光器件的结构示意图。FIG. 7 is a schematic structural diagram of a light-emitting device provided by another embodiment of the present application.
附图标记:
100-发光器件;10-阳极;20-发光层;30-电子传输层;40-阴极;50-空穴
传输层;60-空穴注入层。
Reference signs:
100-Light-emitting device; 10-Anode; 20-Light-emitting layer; 30-Electron transport layer; 40-Cathode; 50-Hole transport layer; 60-Hole injection layer.
本申请的实施方式Implementation Mode of this Application
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域技术人员在没有作出创造性劳动的前提下所获得的所有其它实施例,都属于本申请保护的范围。此外,应当 理解的是,此处所描述的具体实施方式仅用于说明和解释本申请,并不用于限制本申请。在本申请中,在未作相反说明的情况下,使用的方位词如“上”和“下”具体为附图中的图面方向。另外,在本申请说明书的描述中,术语“包括”是指“包括但不限于”。本申请的各种实施例可以以一个范围的形式存在;应当理解,以一范围形式的描述仅仅是因为方便及简洁,不应理解为对本申请范围的硬性限制;因此,应当认为所述的范围描述已经具体公开所有可能的子范围以及该范围内的单一数值。例如,应当认为从1到6的范围描述已经具体公开子范围,例如从1到3,从1到4,从1到5,从2到4,从2到6,从3到6等,以及所述范围内的单一数字,例如1、2、3、4、5及6,此不管范围为何皆适用。另外,每当在本文中指出数值范围,是指包括所指范围内的任何引用的数字(分数或整数)。The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without any creative work shall fall within the scope of protection of this application. In addition, it should It is understood that the specific implementations described here are only used to illustrate and explain the present application, and are not used to limit the present application. In this application, unless otherwise specified, the directional words used such as "upper" and "lower" specifically refer to the direction of the drawing in the drawings. In addition, in the description of this application specification, the term "including" means "including but not limited to". Various embodiments of the present application may exist in the form of a range; it should be understood that the description in the form of a range is only for convenience and simplicity and should not be understood as a hard limit to the scope of the present application; therefore, the described scope should be considered The description has specifically disclosed all possible subranges as well as the single numerical values within that range. For example, a description of a range from 1 to 6 should be considered to have specifically disclosed subranges, such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6, etc., and A single number within the stated range, such as 1, 2, 3, 4, 5, and 6, applies regardless of the range. Additionally, whenever a numerical range is indicated herein, it is intended to include any cited number (fractional or whole) within the indicated range.
在本申请中,“和/或”,描述关联对象的关联关系,表示可以存在三种关系,例如,A和/或B,可以表示:单独存在A,同时存在A和B,单独存在B的情况。其中A,B可以是单数或者复数。In this application, "and/or" describes the association of associated objects, indicating that there can be three relationships, for example, A and/or B, which can mean: A exists alone, A and B exist simultaneously, and B exists alone. Condition. Where A and B can be singular or plural.
在本申请中,“至少一个”是指一个或者多个,“多个”是指两个或两个以上。“至少一种”、“以下至少一项(个)”或其类似表达,是指的这些项中的任意组合,包括单项(个)或复数项(个)的任意组合。例如,“a,b,或c中的至少一项(个)”,或,“a,b,和c中的至少一项(个)”,均可以表示:a,b,c,a-b(即a和b),a-c,b-c,或a-b-c,其中a,b,c分别可以是单个,也可以是多个。In this application, "at least one" means one or more, and "plurality" means two or more. "At least one", "at least one of the following" or similar expressions thereof refers to any combination of these items, including any combination of a single item (items) or a plurality of items (items). For example, "at least one of a, b, or c", or "at least one of a, b, and c" can mean: a, b, c, a-b ( That is, a and b), a-c, b-c, or a-b-c, where a, b, and c can be single or multiple respectively.
本申请提出一种功能膜,所述功能膜包含量子点以及连接至少两个相邻的所述量子点的金属阳离子,所述金属阳离子与所述量子点的表面的第一阴离子形成化学键。This application proposes a functional film, which includes quantum dots and metal cations connecting at least two adjacent quantum dots. The metal cations form chemical bonds with the first anions on the surface of the quantum dots.
量子点表面存在部分未被钝化的阴离子悬挂键,为便于描述,本文中,将量子点表面的阴离子定义为第一阴离子。基于量子点具体材料,所述第一阴离子可以是硫阴离子、碲阴离子、硒阴离子等,以核壳结构量子点材料CdZnSe/ZnSeS/ZnS为例,其最外层壳为ZnS,该量子点表面存在部分未被钝化的硫阴离子,即,本示例中,第一阴离子为硫阴离子。本申请提供的技术方案中,提供了一种功能膜,其含有的多个量子点中,相邻量子点通过金属阳离子连接,金属阳离子与量子点表面的第一阴离子形成化学键,从而对量子点表面的阴离子悬挂键起到了钝化作用,减少了量子点表面的缺陷态,消除缺陷态 所引进的非辐射通道,有利于提升量子点的荧光量子产率(PLQY);同时,由于相邻量子点通过金属阳离子连接起来,使得功能膜更加致密,增强了耦合效应,有利于提升载流子传输速度,从而获得更高的激子密度,有利于提升器件的发光效率和寿命。There are some unpassivated anionic dangling bonds on the surface of the quantum dots. For the convenience of description, in this article, the anions on the surface of the quantum dots are defined as the first anions. Based on the specific material of the quantum dot, the first anion can be a sulfur anion, a tellurium anion, a selenium anion, etc. Taking the core-shell structure quantum dot material CdZnSe/ZnSeS/ZnS as an example, the outermost shell is ZnS, and the surface of the quantum dot There are partially unpassivated sulfide anions, ie, in this example, the first anion is a sulfide anion. In the technical solution provided by this application, a functional film is provided. Among the multiple quantum dots it contains, adjacent quantum dots are connected through metal cations. The metal cations form chemical bonds with the first anions on the surface of the quantum dots, thereby affecting the quantum dots. The anionic dangling bonds on the surface play a passivation role, reducing the defect states on the surface of the quantum dots and eliminating them. The introduced non-radiative channel is beneficial to improving the fluorescence quantum yield (PLQY) of quantum dots; at the same time, because adjacent quantum dots are connected through metal cations, the functional film is made denser, the coupling effect is enhanced, and the current carrying capacity is improved. The exciton transmission speed is increased, thereby obtaining a higher exciton density, which is beneficial to improving the luminous efficiency and lifetime of the device.
在一具体实施例中,所述功能膜由所述量子点以及连接至少两个相邻的所述量子点的所述金属阳离子组成。In a specific embodiment, the functional film is composed of the quantum dots and the metal cations connecting at least two adjacent quantum dots.
具体地,所述金属阳离子包括二价金属阳离子和三价金属阳离子中的至少一种。二价金属阳离子能够连接相邻的两个量子点,三价金属阳离子能够连接相邻的三个量子点。其中,二价金属阳离子可以选自任意一种或多种价态为二价的金属阳离子,例如,二价金属阳离子可以包括但不限于Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Cu2+、Co2+及Fe2+中的至少一种;三价金属阳离子可以选自任意一种或多种价态为三价的金属阳离子,例如,三价金属阳离子可以包括但不限于Al3+、Fe3+、Ni3+、Cr3+及In3+中的至少一种。Specifically, the metal cations include at least one of divalent metal cations and trivalent metal cations. Divalent metal cations can connect two adjacent quantum dots, and trivalent metal cations can connect three adjacent quantum dots. The divalent metal cations can be selected from any one or more divalent metal cations. For example, the divalent metal cations can include but are not limited to Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , at least one of Pt 2+ , Cu 2+ , Co 2+ and Fe 2+ ; the trivalent metal cation can be selected from any one or more metal cations with a trivalent valence state, for example, trivalent metal cations It may include but is not limited to at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
所述量子点可以是红色量子点、绿色量子点及蓝色量子点中的一种。量子点选自单一结构量子点及核壳结构量子点中的一种或多种,所述单一结构量子点的材料选自II-VI族化合物、IV-VI族化合物、III-V族化合物和I-III-VI族化合物中的至少一种,其中,所述II-VI族化合物选自CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe及HgZnSTe中的至少一种,所述IV-VI族化合物选自SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe及SnPbSTe中的至少一种,所述III-V族化合物选自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs或InAlPSb中的至少一种,所述I-III-VI族化合物选自CuInS2、CuInSe2及AgInS2中的至少一种,所述核壳结构的量子点的核包括上述单一结 构量子点中的任意一种,所述核壳结构的量子点的壳层材料包括CdS、CdTe、CdSeTe、CdZnSe、CdZnS、CdSeS、ZnSe、ZnSeS、ZnS和上述单一结构量子点中的至少一种。所述量子点中也含有金属阳离子,为便于区别,将连接相邻量子点的金属阳离子定义为第一金属阳离子,将量子点中的所有金属阳离子定义为第二金属阳离子。The quantum dots may be one of red quantum dots, green quantum dots and blue quantum dots. The quantum dots are selected from one or more of single structure quantum dots and core-shell structure quantum dots. The materials of the single structure quantum dots are selected from the group consisting of II-VI compounds, IV-VI compounds, III-V compounds and At least one of the compounds of Group I-III-VI, wherein the compound of Group II-VI is selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgST e. At least one of HgZnSeS, HgZnSeTe and HgZnSTe One, the IV-VI group compound is selected from at least one of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe One, the III-V group compound is selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, At least one of AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs or InAlPSb , the I-III-VI group compound is selected from at least one of CuInS 2 , CuInSe 2 and AgInS 2 , and the core of the quantum dot of the core-shell structure includes the above-mentioned single structure. Constituting any one of the quantum dots, the shell material of the core-shell structure quantum dots includes at least one of CdS, CdTe, CdSeTe, CdZnSe, CdZnS, CdSeS, ZnSe, ZnSeS, ZnS and the above single structure quantum dots . The quantum dots also contain metal cations. To facilitate distinction, the metal cations connecting adjacent quantum dots are defined as first metal cations, and all metal cations in the quantum dots are defined as second metal cations.
在本申请的一些实施例中,所述功能膜中,所述第一金属阳离子的原子百分含量为0.1~5%,例如,所述第一金属阳离子的原子百分含量可以是0.1%、0.2%、0.5%、0.8%、1%、1.5%、2%、3%、5%以及上述列举的数值中任意两个数值之间范围内的数值等。本申请所述的原子百分含量是指,第一金属阳离子的原子数占功能膜中所有原子的总数的百分比。In some embodiments of the present application, in the functional film, the atomic percentage of the first metal cation is 0.1-5%, for example, the atomic percentage of the first metal cation can be 0.1%, 0.2%, 0.5%, 0.8%, 1%, 1.5%, 2%, 3%, 5%, and values within the range between any two of the above values. The atomic percentage described in the present application refers to the percentage of the number of atoms of the first metal cation to the total number of all atoms in the functional film.
在本申请的一些实施例中,所述功能膜中包含多个量子点,其中,至少部分量子点表面连接有所述金属阳离子,本文中,将这种表面连接有所述金属阳离子的所述量子点定义为第一量子点,将其它未与所述金属阳离子发生连接的量子点定义为第二量子点。所述第一量子点的水合粒径为20~50nm。水合粒径反映量子点在溶液态时的综合粒径。本申请中,所述第一量子点的水合粒径范围可以为20~30nm、23~35nm、25~38nm、30~40nm、35~40nm、39~45nm、42~50nm等。In some embodiments of the present application, the functional film contains a plurality of quantum dots, wherein at least part of the surface of the quantum dots is connected to the metal cation. Herein, this surface is connected to the metal cation. Quantum dots are defined as first quantum dots, and other quantum dots that are not connected to the metal cation are defined as second quantum dots. The hydrated particle size of the first quantum dot is 20-50 nm. The hydrated particle size reflects the comprehensive particle size of the quantum dots in the solution state. In this application, the hydrated particle size range of the first quantum dot may be 20-30nm, 23-35nm, 25-38nm, 30-40nm, 35-40nm, 39-45nm, 42-50nm, etc.
本申请实施例提供一种功能膜的制备方法,图1至4为所述功能膜的制备方法的具体实施例。The embodiments of the present application provide a method for preparing a functional film. Figures 1 to 4 are specific examples of the method for preparing the functional film.
参阅图1,所述功能膜的制备方法包括以下步骤:Referring to Figure 1, the preparation method of the functional film includes the following steps:
步骤S10,提供处理液和量子点薄膜,所述处理液中含有金属阳离子。Step S10: Provide a treatment liquid and a quantum dot film, where the treatment liquid contains metal cations.
步骤S20,将所述处理液与所述量子点薄膜的表面进行接触,以使得所述量子点薄膜中的相邻量子点通过所述金属阳离子相互连接,得到功能膜。In step S20, the treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations to obtain a functional film.
本申请所述的量子点薄膜是指采用量子点发光材料,在基板上形成的薄膜。其具体可采用本领域常规技术实现,例如,化学法或物理法。化学法包括化学气相沉积法、连续离子层吸附与反应法、阳极氧化法、电解沉积法、共沉淀法。物理法包括物理镀膜法和溶液法,物理镀膜法包括:热蒸发镀膜法、电子束蒸发镀膜法、磁控溅射法、多弧离子镀膜法、物理气相沉积法、原子层沉积法、脉冲激光沉积法等;溶液法可以为旋涂法、印刷法、喷墨打印法、刮涂 法、打印法、浸渍提拉法、浸泡法、喷涂法、滚涂法、浇铸法、狭缝式涂布法及条状涂布法等。The quantum dot film described in this application refers to a film formed on a substrate using quantum dot luminescent materials. It can be specifically achieved using conventional techniques in the art, for example, chemical methods or physical methods. Chemical methods include chemical vapor deposition, continuous ion layer adsorption and reaction, anodizing, electrolytic deposition, and co-precipitation. Physical methods include physical coating methods and solution methods. Physical coating methods include: thermal evaporation coating method, electron beam evaporation coating method, magnetron sputtering method, multi-arc ion coating method, physical vapor deposition method, atomic layer deposition method, pulse laser Deposition method, etc.; solution method can be spin coating, printing, inkjet printing, scraping method, printing method, dipping and pulling method, soaking method, spray coating method, roller coating method, casting method, slit coating method and strip coating method, etc.
本申请中,采用含有金属阳离子的处理液对量子点薄膜进行表面处理,金属阳离子能够对量子点表面的阴离子悬挂键起到钝化作用,从而减少量子点表面的缺陷态,消除缺陷态造成的浅层陷阱和深层陷阱,改善载流子输运能力,消除缺陷态所引进的一些快速的非辐射通道,有利于提升量子点的荧光量子产率(PLQY),使得器件能够获得更高的电流效率和寿命稳定性。In this application, a treatment solution containing metal cations is used to surface treat the quantum dot film. The metal cations can passivate the anionic dangling bonds on the surface of the quantum dots, thereby reducing the defect states on the surface of the quantum dots and eliminating defects caused by the defect states. Shallow traps and deep traps improve carrier transport capabilities and eliminate some fast non-radiative channels introduced by defect states, which is beneficial to improving the fluorescence quantum yield (PLQY) of quantum dots and enabling devices to obtain higher currents. efficiency and lifetime stability.
另一方面,本申请在量子点薄膜成型后,再采用处理液对量子点薄膜表面进行处理,金属阳离子可以作为桥接配体将相邻量子点连接起来,使得量子点薄膜更加致密,增强了耦合效应,有利于提升载流子传输速度。相较而言,如果在薄膜制备阶段就添加处理液,则会因为量子点桥接而产生液相中聚沉的问题,进而影响后续的薄膜制备。On the other hand, this application uses a treatment solution to treat the surface of the quantum dot film after the quantum dot film is formed. Metal cations can serve as bridging ligands to connect adjacent quantum dots, making the quantum dot film denser and enhancing coupling. effect, which is conducive to increasing the carrier transmission speed. In comparison, if the treatment liquid is added during the film preparation stage, the problem of agglomeration in the liquid phase will occur due to quantum dot bridging, which will affect subsequent film preparation.
步骤S10中,所述金属阳离子可以选自但不限于二价金属阳离子和三价金属阳离子中的至少一种。其中,所述二价金属阳离子可以选自但不限于Mg2+、Pd2+、Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Cu2+、Co2+及Fe2+中的至少一种。所述三价金属阳离子可以选自但不限于Al3+、Fe3+、Ni3+、Cr3+、In3+中的至少一种。上述金属阳离子有助于将量子点表面阴离子钝化成键形成较少的晶格缺陷。In step S10, the metal cation may be selected from, but is not limited to, at least one of divalent metal cations and trivalent metal cations. Wherein, the divalent metal cation can be selected from but not limited to Mg 2+ , Pd 2+ , Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and At least one of Fe 2+ . The trivalent metal cation may be selected from, but is not limited to, at least one of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ , and In 3+ . The above-mentioned metal cations help passivate the anions on the quantum dot surface into bonds to form fewer lattice defects.
可以理解,处理液中可以含有一种或者多种金属阳离子,例如,可以含有两种或两种以上的二价阳离子,或者,可以同时含有二价阳离子和三价阳离子。在一些实施例中,所述处理液中含有所述金属阳离子的种类有且只有一种,这里提及的一种指的是,元素种类相同,且价态相同。在至少一实施例中,所述金属阳离子包括Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Al3+及In3+中的一种。相对来说,处理液中只含有一种金属阳离子时,功能膜能够实现短程、长程有序,有助于提高器件性能。It can be understood that the treatment liquid may contain one or more metal cations, for example, it may contain two or more divalent cations, or it may contain both divalent cations and trivalent cations. In some embodiments, there is only one type of metal cation contained in the treatment liquid. The type mentioned here refers to the same type of element and the same valence state. In at least one embodiment, the metal cation includes one of Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Al 3+ and In 3+ . Relatively speaking, when the treatment solution contains only one kind of metal cation, the functional film can achieve short-range and long-range ordering, which helps to improve device performance.
步骤S10中,处理液中还含有阴离子,所述阴离子主要为配合金属阳离子实现电荷平衡,为便于描述和区分,本文中,将这种阴离子定义为第二阴离子。由于第二阴离子的作用是为了配合金属阳离子实现电荷平衡,因此,第二阴离子可以是任意一种能够与阳离子配合形成可溶性盐的阴离子。进一步地,第二阴离子可以为具有对量子点表面低亲和力的阴离子,例如,硝酸根离子、硫酸根离子、磺酸根离子以及高氯酸根离子中的至少一种,相较于卤离子等,上述 选择不会影响量子点表面连接的有机配体,避免增加表面缺陷态,影响器件发光效率和寿命。In step S10, the treatment liquid also contains anions, which mainly cooperate with metal cations to achieve charge balance. For convenience of description and distinction, this anion is defined as the second anion in this article. Since the role of the second anion is to cooperate with the metal cation to achieve charge balance, the second anion can be any anion that can cooperate with the cation to form a soluble salt. Further, the second anion may be an anion with low affinity to the quantum dot surface, for example, at least one of nitrate ions, sulfate ions, sulfonate ions, and perchlorate ions. Compared with halide ions, etc., the above-mentioned Select organic ligands that will not affect the surface connection of quantum dots to avoid increasing surface defect states and affecting the luminous efficiency and lifetime of the device.
处理液中的溶剂包括醇相溶剂,醇相溶剂可以选自但不限于甲醇、乙醇、异丙醇及丁醇中的至少一种。The solvent in the treatment liquid includes an alcohol phase solvent, and the alcohol phase solvent can be selected from, but is not limited to, at least one of methanol, ethanol, isopropyl alcohol, and butanol.
步骤S10中,量子点薄膜可以是由任意一种本领域已知用于量子点发光层的量子点发光材料制成的薄膜。量子点可以是红色量子点、绿色量子点及蓝色量子点中的一种。量子点选自单一结构量子点及核壳结构量子点中的一种或多种,所述单一结构量子点的材料选自II-VI族化合物、IV-VI族化合物、III-V族化合物和I-III-VI族化合物中的至少一种,其中,所述II-VI族化合物选自CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe及HgZnSTe中的至少一种,所述IV-VI族化合物选自SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe及SnPbSTe中的至少一种,所述III-V族化合物选自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs或InAlPSb中的至少一种,所述I-III-VI族化合物选自CuInS2、CuInSe2及AgInS2中的至少一种,所述核壳结构的量子点的核包括上述单一结构量子点中的任意一种,所述核壳结构的量子点的壳层材料包括CdS、CdTe、CdSeTe、CdZnSe、CdZnS、CdSeS、ZnSe、ZnSeS、ZnS和上述单一结构量子点中的至少一种。In step S10, the quantum dot film can be a film made of any quantum dot luminescent material known in the art for use in the quantum dot luminescent layer. The quantum dots may be one of red quantum dots, green quantum dots and blue quantum dots. The quantum dots are selected from one or more of single structure quantum dots and core-shell structure quantum dots. The materials of the single structure quantum dots are selected from the group consisting of II-VI compounds, IV-VI compounds, III-V compounds and At least one of the compounds of Group I-III-VI, wherein the compound of Group II-VI is selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgST e. At least one of HgZnSeS, HgZnSeTe and HgZnSTe One, the IV-VI group compound is selected from at least one of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe One, the III-V group compound is selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, At least one of AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs or InAlPSb , the I-III-VI group compound is selected from at least one of CuInS 2 , CuInSe 2 and AgInS 2 , the core of the core-shell structure quantum dots includes any one of the above single structure quantum dots, the The shell material of the core-shell structure quantum dots includes at least one of CdS, CdTe, CdSeTe, CdZnSe, CdZnS, CdSeS, ZnSe, ZnSeS, ZnS and the above single structure quantum dots.
在本申请的一些实施例中,进一步限定了步骤S20中将所述处理液与所述量子点薄膜的表面进行接触的接触时间,具体地,所述接触的时间可以为5-30s,例如,接触时间可以为5s、6s、7s、8s、10s、12s、15s、17s、18s、20s、22s、25s、26s、28s、30s以及上述数值中任意两个数值之间范围内的数值等, 控制接触时间在此范围内,有助于确保量子点表面阴离子悬挂键被充分钝化,确保量子点之间有效桥接。In some embodiments of the present application, the contact time for bringing the treatment liquid into contact with the surface of the quantum dot film in step S20 is further limited. Specifically, the contact time may be 5-30 s, for example, The contact time can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s and values within the range between any two of the above values, etc. Controlling the contact time within this range helps ensure that the anionic dangling bonds on the surface of the quantum dots are fully passivated and ensures effective bridging between quantum dots.
此外,步骤S20中,将所述处理液与所述量子点薄膜的表面进行接触的方式有多种,例如,将处理液通过溶液法设置在量子点薄膜的表面,或者,将量子点薄膜浸泡在处理液中,等等。其中,溶液法可以为涂覆法、印刷法、喷墨打印法、刮涂法、打印法、浸渍提拉法、浸泡法、喷涂法、滚涂法、浇铸法、狭缝式涂布法及条状涂布法等。处理液通过与量子点薄膜的表面接触,实现对量子点薄膜表面进行阳离子钝化以及桥接量子点。In addition, in step S20, there are many ways to bring the treatment liquid into contact with the surface of the quantum dot film. For example, the treatment liquid is placed on the surface of the quantum dot film through a solution method, or the quantum dot film is soaked. in the treatment fluid, etc. Among them, the solution method can be coating method, printing method, inkjet printing method, blade coating method, printing method, dip pulling method, soaking method, spray coating method, roller coating method, casting method, slit coating method and Strip coating method, etc. By contacting the surface of the quantum dot film, the treatment liquid achieves cationic passivation of the surface of the quantum dot film and bridges the quantum dots.
具体来说,在本申请的一些实施例中,如图2和图3所示,所述步骤S20可以按照如下步骤实施:Specifically, in some embodiments of the present application, as shown in Figures 2 and 3, step S20 can be implemented as follows:
步骤S21,将所述处理液设置在所述量子点薄膜的表面,形成液膜,静置后去除所述液膜,得到功能膜。Step S21: The treatment liquid is placed on the surface of the quantum dot film to form a liquid film. After standing, the liquid film is removed to obtain a functional film.
当采用在量子点薄膜的表面形成液膜的接触方式时,采用的处理液的浓度可以为2-50mg/mL,例如,2mg/mL、3mg/mL、4mg/mL、5mg/mL、6mg/mL、8mg/mL、10mg/mL、15mg/mL、20mg/mL、25mg/mL、30mg/mL、35mg/mL、40mg/mL、45mg/mL、50mg/mL以及上述数值中任意两个数值之间范围内的数值等,采用此范围的处理液对量子点薄膜进行处理能够实现量子点之间有效连接,并使得其表面被充分钝化,有效减少其表面的缺陷。When a contact method of forming a liquid film on the surface of the quantum dot film is adopted, the concentration of the treatment liquid used can be 2-50 mg/mL, for example, 2 mg/mL, 3 mg/mL, 4 mg/mL, 5 mg/mL, 6 mg/mL, 8 mg/mL, 10 mg/mL, 15 mg/mL, 20 mg/mL, 25 mg/mL, 30 mg/mL, 35 mg/mL, 40 mg/mL, 45 mg/mL, 50 mg/mL and values within the range between any two of the above values, etc. Using a treatment liquid in this range to treat the quantum dot film can achieve effective connection between quantum dots, and make its surface fully passivated, effectively reducing its surface defects.
实际加工时,可以采用溶液法的方式在量子点薄膜的表面涂覆处理液,制成液膜,不仅加工效率高,而且形成的液膜厚度均匀可控,有助于使量子点薄膜表面各处被均匀修饰,具体地,可以采用刮涂法、旋涂法。以旋涂为例,本申请不限定旋涂时的具体转速,实施时,旋涂转速以能够成膜覆盖量子点薄膜表面以实现配体交换为准,作为示例,所述旋涂时的转速可以设置为1000-5000rpm,例如,1000rpm、2000rpm、3000rpm、4000rpm、5000rpm以及上述数值中任意两个数值之间范围内的数值等,如此,能够在保证铺展性的同时,确保形成的单层液膜具有一定的厚度,从而能够提供足够的阳离子量,以使得量子点表面能够被充分修饰。可以理解的是,旋涂的转速也可以设置得更高,但相应地,可以增加旋涂次数,以确保形成的多层液膜中含有的阳离子量足够充分修饰其覆盖的量子点薄膜表面。In actual processing, the solution method can be used to coat the surface of the quantum dot film with a treatment liquid to form a liquid film. This not only has high processing efficiency, but also the thickness of the formed liquid film is uniform and controllable, which helps to make the surface of the quantum dot film various. Everywhere is evenly modified. Specifically, scraping or spin coating can be used. Taking spin coating as an example, this application does not limit the specific rotation speed during spin coating. During implementation, the spin coating speed is subject to being able to form a film to cover the surface of the quantum dot film to achieve ligand exchange. As an example, the rotation speed during spin coating is It can be set to 1000-5000rpm, for example, 1000rpm, 2000rpm, 3000rpm, 4000rpm, 5000rpm, and values within the range between any two of the above values. In this way, it can ensure the spreadability while ensuring the formation of a single layer of liquid. The film has a certain thickness to provide a sufficient amount of cations so that the surface of the quantum dots can be fully modified. It is understood that the rotation speed of spin coating can also be set higher, but accordingly, the number of spin coatings can be increased to ensure that the amount of cations contained in the formed multi-layer liquid film is sufficient to fully modify the surface of the quantum dot film it covers.
在一实施例中,所述步骤S21可以按照如下步骤操作: In an embodiment, step S21 may be performed as follows:
步骤S21a,使用浓度为5-50mg/mL的处理液在所述量子点薄膜的表面进行一次涂覆,形成液膜。Step S21a: Use a treatment liquid with a concentration of 5-50 mg/mL to coat the surface of the quantum dot film once to form a liquid film.
采用较高浓度处理液一次涂覆的方法能够使得薄膜表面被充分修饰的同时,避免液膜覆盖薄膜表面的时间过长,从而避免溶剂渗入薄膜内,导致量子点表面缺陷增多。实际操作时,处理液的浓度可以为5mg/mL、6mg/mL、8mg/mL、10mg/mL、15mg/mL、20mg/mL、25mg/mL、30mg/mL、35mg/mL、40mg/mL、45mg/mL、50mg/mL以及上述数值中任意两个数值之间范围内的数值等。Using a one-time coating method with a higher concentration of treatment solution can fully modify the film surface while preventing the liquid film from covering the film surface for too long, thereby preventing the solvent from penetrating into the film and causing an increase in quantum dot surface defects. In actual operation, the concentration of the treatment solution can be 5mg/mL, 6mg/mL, 8mg/mL, 10mg/mL, 15mg/mL, 20mg/mL, 25mg/mL, 30mg/mL, 35mg/mL, 40mg/mL, 45mg/mL, 50mg/mL, and values within the range between any two of the above values, etc.
进一步地,步骤S21a中,在形成液膜后,静置5-30s再去除液膜,确保量子点薄膜中的相邻量子点能够通过金属阳离子相互连接。其中,静置时间可以为5s、6s、7s、8s、10s、12s、15s、17s、18s、20s、22s、25s、26s、28s、30s以及上述数值中任意两个数值之间范围内的数值等。Further, in step S21a, after forming the liquid film, let it stand for 5-30 seconds and then remove the liquid film to ensure that adjacent quantum dots in the quantum dot film can be connected to each other through metal cations. Among them, the resting time can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s and any value in the range between any two of the above values. wait.
在另一实施例中,所述步骤S21可以按照如下步骤操作:In another embodiment, step S21 may be performed as follows:
步骤S21b,使用浓度为2-5mg/mL的处理液在所述量子点薄膜的表面重复涂覆多次,形成液膜。实际操作时,处理液的浓度可以为2mg/mL、2.5mg/mL、3mg/mL、3.5mg/mL、4mg/mL、4.5mg/mL、5mg/mL以及上述数值中任意两个数值之间范围内的数值等。Step S21b: Use a treatment liquid with a concentration of 2-5 mg/mL to coat the surface of the quantum dot film multiple times to form a liquid film. In actual operation, the concentration of the treatment solution can be 2mg/mL, 2.5mg/mL, 3mg/mL, 3.5mg/mL, 4mg/mL, 4.5mg/mL, 5mg/mL, or between any two of the above values. Values within the range, etc.
采用较低浓度处理液多次涂覆的方式,能够确保薄膜表面被充分修饰的同时,避免液膜覆盖薄膜表面的时间过长,从而避免溶剂渗入薄膜内,导致量子点表面缺陷增多。The use of multiple coatings of a lower concentration treatment solution can ensure that the film surface is fully modified while preventing the liquid film from covering the film surface for too long, thus preventing the solvent from penetrating into the film and causing an increase in quantum dot surface defects.
进一步地,步骤S21b中,在形成液膜后,静置5-30s再去除液膜,确保量子点薄膜中的相邻量子点能够通过金属阳离子相互连接。其中,静置时间可以为5s、6s、7s、8s、10s、12s、15s、17s、18s、20s、22s、25s、26s、28s、30s以及上述数值中任意两个数值之间范围内的数值等。Further, in step S21b, after forming the liquid film, let it stand for 5-30 seconds and then remove the liquid film to ensure that adjacent quantum dots in the quantum dot film can be connected to each other through metal cations. Among them, the resting time can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s and any value in the range between any two of the above values. wait.
在一些实施例中,去除液膜的方法可以为冲洗、浸泡、旋涂、离心等。本申请实施例中,处理液采用醇相溶剂作为金属盐的溶剂,基于此,步骤S21中,在将所述处理液与所述量子点薄膜的表面接触一段时间,使得其表面被充分修饰后,可以采用醇相溶剂,例如甲醇、乙醇、丁醇、异丙醇等,对薄膜表面进行清洗,以去除液膜。 In some embodiments, the method for removing the liquid film may be washing, soaking, spin coating, centrifugation, etc. In the embodiment of the present application, the treatment liquid uses an alcohol phase solvent as the solvent of the metal salt. Based on this, in step S21, the treatment liquid is contacted with the surface of the quantum dot film for a period of time so that the surface is fully modified. , alcohol-phase solvents, such as methanol, ethanol, butanol, isopropyl alcohol, etc., can be used to clean the film surface to remove the liquid film.
在本申请的一些实施例中,参阅图4,所述步骤S20还可以按照如下步骤实施:In some embodiments of the present application, referring to Figure 4, step S20 can also be implemented as follows:
步骤S22,将所述量子点薄膜置于所述处理液中,使所述量子点薄膜的至少一表面与所述处理液接触,静置后取出所述量子点薄膜,并去除所述量子点薄膜表面的处理液,得到功能膜。Step S22: Place the quantum dot film in the treatment liquid, bring at least one surface of the quantum dot film into contact with the treatment liquid, take out the quantum dot film after standing, and remove the quantum dots. Treatment liquid on the surface of the film to obtain a functional film.
本实施例方法将量子点薄膜浸泡或者覆盖在处理液上,使得量子点薄膜的一侧或者两侧表面能够与处理液充分接触,进而使得其表面得以被金属阳离子充分修饰。接触时间可以为5-30s,例如可以是5s、6s、7s、8s、10s、12s、15s、17s、18s、20s、22s、25s、26s、28s、30s以及上述数值中任意两个数值之间范围内的数值等。In the method of this embodiment, the quantum dot film is soaked or covered in the treatment liquid, so that one or both sides of the quantum dot film can fully contact the treatment liquid, so that its surface can be fully modified by metal cations. The contact time can be 5-30s, for example, it can be 5s, 6s, 7s, 8s, 10s, 12s, 15s, 17s, 18s, 20s, 22s, 25s, 26s, 28s, 30s, and any two of the above values. Values within the range, etc.
进一步地,步骤S22中,所述处理液的浓度为5-50mg/mL,例如,5mg/mL、6mg/mL、8mg/mL、10mg/mL、15mg/mL、20mg/mL、25mg/mL、30mg/mL、35mg/mL、40mg/mL、45mg/mL、50mg/mL以及上述数值中任意两个数值之间范围内的数值等等,在保证同等面积的薄膜表面被充分修饰的情况下,采用较高浓度(5-50mg/mL)的处理液对薄膜进行处理所需的时间更短,能够避免溶剂渗入薄膜。Further, in step S22, the concentration of the treatment liquid is 5-50 mg/mL, for example, 5 mg/mL, 6 mg/mL, 8 mg/mL, 10 mg/mL, 15 mg/mL, 20 mg/mL, 25 mg/mL, 30mg/mL, 35mg/mL, 40mg/mL, 45mg/mL, 50mg/mL and values within the range between any two of the above values, etc., while ensuring that the film surface of the same area is fully modified, Using a higher concentration (5-50 mg/mL) treatment solution requires shorter time to treat the film and avoids solvent penetration into the film.
在一些实施例中,所述去除量子点薄膜表面的处理液的方法可以为冲洗、涂覆、离心等。In some embodiments, the method for removing the treatment liquid on the surface of the quantum dot film may be washing, coating, centrifugation, etc.
本申请实施例的表面处理方法中,处理液采用醇相溶剂作为金属盐的溶剂,基于此,步骤S22中,在将所述处理液与所述量子点薄膜的表面接触一段时间,使得其表面被充分修饰后,可以采用醇相溶剂,例如甲醇、乙醇、丁醇、异丙醇等,对薄膜表面进行清洗,以清除量子点薄膜表面的处理液。In the surface treatment method of the embodiment of the present application, the treatment liquid uses an alcohol phase solvent as the solvent of the metal salt. Based on this, in step S22, the treatment liquid is contacted with the surface of the quantum dot film for a period of time, so that the surface of the quantum dot film is After being fully modified, alcohol-phase solvents, such as methanol, ethanol, butanol, isopropyl alcohol, etc., can be used to clean the film surface to remove the treatment solution on the surface of the quantum dot film.
本申请实施例还提供一种发光器件100,参阅图6,所述发光器件100包括层叠设置的阳极10、发光层20和阴极40,发光层20包括功能膜,所述功能膜包括如上所述的功能膜,或者,所述功能膜经如上文所述的制备方法制得。The embodiment of the present application also provides a light-emitting device 100. Refer to Figure 6. The light-emitting device 100 includes a stacked anode 10, a light-emitting layer 20 and a cathode 40. The light-emitting layer 20 includes a functional film, and the functional film includes the above-mentioned A functional film, or the functional film is prepared by the preparation method as described above.
所述功能膜的量子点选自单一结构量子点及核壳结构量子点中的一种或多种,所述单一结构量子点的材料选自II-VI族化合物、IV-VI族化合物、III-V族化合物和I-III-VI族化合物中的至少一种,其中,所述II-VI族化合物选自CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、 CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe及HgZnSTe中的至少一种,所述IV-VI族化合物选自SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe及SnPbSTe中的至少一种,所述III-V族化合物选自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs或InAlPSb中的至少一种,所述I-III-VI族化合物选自CuInS2、CuInSe2及AgInS2中的至少一种,所述核壳结构的量子点的核包括上述单一结构量子点中的任意一种,所述核壳结构的量子点的壳层材料包括CdS、CdTe、CdSeTe、CdZnSe、CdZnS、CdSeS、ZnSe、ZnSeS、ZnS和上述单一结构量子点中的至少一种。The quantum dots of the functional film are selected from one or more of single structure quantum dots and core-shell structure quantum dots, and the materials of the single structure quantum dots are selected from II-VI compounds, IV-VI compounds, III -At least one of Group V compounds and Group I-III-VI compounds, wherein the Group II-VI compound is selected from CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS , CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, At least one of CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and HgZnSTe, the IV-VI compound is selected from S nS, At least one of SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe, and the III-V compound is selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, At least one of InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs or InAlPSb, and the Group I-III-VI compound is selected from CuInS 2 , CuInSe 2 and AgInS 2 , the core of the quantum dots of the core-shell structure includes any one of the above single structure quantum dots, and the shell material of the quantum dots of the core-shell structure includes CdS, CdTe , CdSeTe, CdZnSe, CdZnS, CdSeS, ZnSe, ZnSeS, ZnS and at least one of the above single structure quantum dots.
由于上述功能膜中,量子点具有较高荧光量子效率,使得本发光器件100具有较高的发光效率和寿命;同时,由于薄膜本身具有较强耦合效应,利于载流子传输,从而有利于提升发光器件100的载流子迁移率,在发光层20内获得更高的激子密度,提高器件的发光效率和寿命。Because the quantum dots in the above functional film have high fluorescence quantum efficiency, the light-emitting device 100 has high luminous efficiency and lifespan; at the same time, because the film itself has a strong coupling effect, it is conducive to carrier transmission, thereby conducive to improving The carrier mobility of the light-emitting device 100 obtains a higher exciton density in the light-emitting layer 20 and improves the luminous efficiency and life of the device.
发光层20可以是由单层功能膜构成的单膜层结构,也可以是由多层功能膜构成的复合膜层结构。当发光层20设置为多层结构时,每个膜层都可以设置为所述功能膜,如此,有助于进一步提升包含本发光层20的器件的发光效率和寿命。The light-emitting layer 20 may have a single film layer structure composed of a single layer of functional films, or may have a composite film layer structure composed of multiple layers of functional films. When the luminescent layer 20 is configured as a multi-layer structure, each film layer can be configured as the functional film, which helps to further improve the luminous efficiency and lifespan of the device including the luminescent layer 20 .
其中,发光器件100包括但不限于量子点发光二极管,实际加工时,上述发光器件100可以用本领域已知的量子点发光二极管的制备方法制备。The light-emitting device 100 includes but is not limited to a quantum dot light-emitting diode. During actual processing, the above-mentioned light-emitting device 100 can be prepared using a quantum dot light-emitting diode preparation method known in the art.
阴极40和阳极10的材料可以是本领域已知的任一种。阳极10和阴极40的材料例如可以是金属、碳材料以及金属氧化物中的一种或多种。金属例如可以是Ag、Al、Mg、Au、Cu、Mo、Yb、Ca及Ba中的一种或多种;碳材料例如可以是石墨、碳纳米管、石墨烯以及碳纤维中的一种或多种;金属氧化物可以是掺杂或非掺杂金属氧化物,包括铟掺杂氧化锡(ITO)、氟掺杂氧化锡(FTO)、锑掺杂氧化锡(ATO)、铝掺杂氧化锌(AZO)、镓掺杂氧化锌(GZO)、铟掺杂氧化 锌(IZO)、镁掺杂氧化锌(MZO)及铝掺杂氧化镁(AMO)中的一种或几种。此外,所述阳极10和阴极40也可以包括掺杂或非掺杂透明金属氧化物之间夹着金属的复合电极,所述复合电极例如可以是AZO/Ag/AZO、AZO/Al/AZO、ITO/Ag/ITO、ITO/Al/ITO、ZnO/Ag/ZnO、ZnO/Al/ZnO、TiO2/Ag/TiO2、TiO2/Al/TiO2、ZnS/Ag/ZnS、ZnS/Al/ZnS等。The materials of cathode 40 and anode 10 may be any known in the art. The materials of the anode 10 and the cathode 40 may be, for example, one or more of metals, carbon materials, and metal oxides. The metal can be, for example, one or more of Ag, Al, Mg, Au, Cu, Mo, Yb, Ca, and Ba; the carbon material can be, for example, one or more of graphite, carbon nanotubes, graphene, and carbon fiber. species; the metal oxide can be doped or undoped metal oxide, including indium-doped tin oxide (ITO), fluorine-doped tin oxide (FTO), antimony-doped tin oxide (ATO), aluminum-doped zinc oxide (AZO), gallium doped zinc oxide (GZO), indium doped oxide One or more of zinc (IZO), magnesium-doped zinc oxide (MZO) and aluminum-doped magnesium oxide (AMO). In addition, the anode 10 and the cathode 40 may also include composite electrodes with metal sandwiched between doped or undoped transparent metal oxides. The composite electrodes may be, for example, AZO/Ag/AZO, AZO/Al/AZO, ITO/Ag/ITO, ITO/Al/ITO, ZnO/Ag/ZnO, ZnO/Al/ZnO, TiO 2 /Ag/TiO 2 , TiO 2 /Al/TiO 2 , ZnS/Ag/ZnS, ZnS/Al/ ZnS etc.
本领域技术人员可以理解,如图7所示,发光器件100还可以包括设置在阴极40与发光层20之间的电子功能层,所述电子功能层可以是电子传输层30,也可以是电子注入层,还可以是电子注入层和电子传输层30,电子功能层为层叠的电子注入层和电子传输层30时,阴极40、电子注入层、电子传输层30和发光层20依次层叠。所述电子传输层30和/或所述电子注入层的材料包括无机材料和/或有机材料,所述无机材料选自掺杂或非掺杂的金属氧化物,所述金属氧化物包括氧化锌、氧化钡、氧化铝、氧化镍、氧化钛、氧化锡、氧化钽、氧化锆、氧化镍、氧化钛锂、氧化锌铝、氧化锌锰、氧化锌锡、氧化锌锂、氧化铟锡、硫化镉、硫化锌、硫化钼、硫化钨、硫化铜、锡化锌、磷化铟、磷化镓、硫化铜铟、硫化铜镓、钛酸钡中的一种或多种,掺杂的元素包括铝、镁、锂、锰、钇、镧、铜、镍、锆、铈、钆中的一种或多种,所述有机材料选自喹喔啉化合物、咪唑类化合物、三嗪类化合物,含芴类化合物、羟基喹啉化合物中的一种或多种。Those skilled in the art can understand that, as shown in FIG. 7 , the light-emitting device 100 may also include an electronic functional layer disposed between the cathode 40 and the light-emitting layer 20 . The electronic functional layer may be the electron transport layer 30 or the electronic functional layer 30 . The injection layer may also be an electron injection layer and an electron transport layer 30. When the electron functional layer is a stacked electron injection layer and electron transport layer 30, the cathode 40, the electron injection layer, the electron transport layer 30 and the light emitting layer 20 are stacked in sequence. The electron transport layer 30 and/or the electron injection layer are made of materials including inorganic materials and/or organic materials. The inorganic materials are selected from doped or undoped metal oxides, and the metal oxides include zinc oxide. , barium oxide, aluminum oxide, nickel oxide, titanium oxide, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, aluminum zinc oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, sulfide One or more of cadmium, zinc sulfide, molybdenum sulfide, tungsten sulfide, copper sulfide, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate. The doped elements include One or more of aluminum, magnesium, lithium, manganese, yttrium, lanthanum, copper, nickel, zirconium, cerium, and gadolinium, and the organic material is selected from quinoxaline compounds, imidazole compounds, and triazine compounds, containing One or more of fluorene compounds and hydroxyquinoline compounds.
本领域技术人员可以理解,如图7所示,发光器件100还可以包括依次设置在阳极10与发光层20之间的空穴注入层60和空穴传输层50。Those skilled in the art can understand that, as shown in FIG. 7 , the light-emitting device 100 may further include a hole injection layer 60 and a hole transport layer 50 disposed in sequence between the anode 10 and the light-emitting layer 20 .
空穴传输层50的材料可以选自具有空穴传输能力的有机材料,包括但不限于是TFB、CuPc、PVK、Poly-TPD、DNTPD、TCATA、TCCA、CBP、TPD、NPB、NPD、PEDOT:PSS、TAPC、MCC、F4-TCNQ、HATCN、4,4',4'-三(N-3-甲基苯基-N苯基氨基)三苯胺、聚苯胺、过渡金属氧化物、过渡金属硫化物、过渡金属锡化物、掺杂石墨烯、非掺杂石墨烯以及C60中的至少一种。The material of the hole transport layer 50 can be selected from organic materials with hole transport capabilities, including but not limited to TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, transition metal sulfide At least one of material, transition metal tin compound, doped graphene, non-doped graphene and C60.
空穴注入层60的材料为本领域已知用于空穴注入层60的材料,包括但不限于是TFB、CuPc、PVK、Poly-TPD、DNTPD、TCATA、TCCA、CBP、TPD、NPB、NPD、PEDOT:PSS、TAPC、MCC、F4-TCNQ、HATCN、4,4',4'-三(N-3-甲基苯基-N苯基氨基)三苯胺、聚苯胺、过渡金属氧化物、过渡金属硫化物、过渡金属锡化物、掺杂石墨烯、非掺杂石墨烯以及C60中的至少一种。 The material of the hole injection layer 60 is a material known in the art for the hole injection layer 60, including but not limited to TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD , PEDOT: PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, At least one of transition metal sulfide, transition metal tinide, doped graphene, non-doped graphene and C60.
形成发光层20及其他功能层例如空穴注入层60、空穴传输层50及电子传输层30的方法可以为化学法或物理法。其中,化学法可以为化学气相沉积法、连续离子层吸附与反应法、阳极氧化法、电解沉积法及共沉淀法等。物理法可以为物理镀膜法或溶液加工法,物理镀膜法可以为热蒸发镀膜法CVD、电子束蒸发镀膜法、磁控溅射法、多弧离子镀膜法、物理气相沉积法PVD、原子层沉积法及脉冲激光沉积法等;溶液加工法可以为旋涂法、印刷法、喷墨打印法、刮涂法、打印法、浸渍提拉法、浸泡法、喷涂法、滚涂法、浇铸法、狭缝式涂布法及条状涂布法等。本领域技术人员可以根据本领域习知的发光器件的制备方法制备本申请实施例的发光器件100的各个膜层,在此不再赘述。The method of forming the light-emitting layer 20 and other functional layers such as the hole injection layer 60, the hole transport layer 50 and the electron transport layer 30 may be chemical or physical. Among them, the chemical method can be chemical vapor deposition method, continuous ion layer adsorption and reaction method, anodizing method, electrolytic deposition method, co-precipitation method, etc. The physical method can be physical coating method or solution processing method. The physical coating method can be thermal evaporation coating method CVD, electron beam evaporation coating method, magnetron sputtering method, multi-arc ion coating method, physical vapor deposition method PVD, atomic layer deposition. method and pulse laser deposition method, etc.; the solution processing method can be spin coating method, printing method, inkjet printing method, scraping method, printing method, dip pulling method, soaking method, spray coating method, roller coating method, casting method, Slit coating method and strip coating method, etc. Those skilled in the art can prepare each film layer of the light-emitting device 100 in the embodiment of the present application according to the manufacturing methods of light-emitting devices commonly known in the art, and details will not be described again here.
下面通过具体实施例、对比例和实验例对本申请的技术方案及技术效果进行详细说明,以下实施例仅仅是本申请的部分实施例,并非对本申请作出具体限定。The technical solutions and technical effects of the present application will be described in detail below through specific examples, comparative examples and experimental examples. The following examples are only some examples of the present application and do not specifically limit the present application.
实施例1Example 1
量子点薄膜的制备:Preparation of quantum dot film:
(1)提供一种发光材料溶液,所述发光材料溶液中的发光材料为红色量子点CdZnSe/ZnSeS/ZnS,溶剂为正辛烷,所述发光材料溶液的浓度为10mg/mL。然后,使用发光材料溶液在石英玻璃上,以2000rpm转速旋涂成膜,得到量子点薄膜。(1) A luminescent material solution is provided, wherein the luminescent material in the luminescent material solution is red quantum dots CdZnSe/ZnSeS/ZnS, the solvent is n-octane, and the concentration of the luminescent material solution is 10 mg/mL. Then, the luminescent material solution is spin-coated on quartz glass at a speed of 2000 rpm to obtain a quantum dot film.
(2)使用10mg/ml的硝酸镉的乙醇溶液,在量子点薄膜上以2000rpm转速旋涂一次,形成液膜,10s后用乙醇在液膜上旋涂,以对量子点薄膜表面进行清洗,得到功能膜。(2) Use 10 mg/ml cadmium nitrate ethanol solution to spin-coat the quantum dot film once at 2000 rpm to form a liquid film. After 10 seconds, spin-coat the liquid film with ethanol to clean the surface of the quantum dot film. Obtain functional membrane.
器件的制备:Device preparation:
本实施例提供一种QLED器件,所述QLED器件的结构为:基板/QLED阳极/空穴注入层/空穴传输层/发光层/电子传输层/QLED阴极。This embodiment provides a QLED device. The structure of the QLED device is: substrate/QLED anode/hole injection layer/hole transport layer/light-emitting layer/electron transport layer/QLED cathode.
参见图5,制备器件的方法包括以下步骤:Referring to Figure 5, the method of preparing the device includes the following steps:
S101:提供玻璃衬底。S101: Provide glass substrate.
S102:通过磁控溅射在所述玻璃衬底上制备厚度为100nm的ITO薄膜,形成阳极10。S102: Prepare an ITO film with a thickness of 100 nm on the glass substrate by magnetron sputtering to form the anode 10.
S103:在所述阳极10上旋涂PEDOT:PSS材料,得到厚度为50nm的空穴注入层60。 S103: Spin-coat PEDOT:PSS material on the anode 10 to obtain a hole injection layer 60 with a thickness of 50 nm.
S104:在所述空穴注入层60上旋涂TFB材料,得到厚度为30nm的空穴传输层50。S104: Spin-coat the TFB material on the hole injection layer 60 to obtain the hole transport layer 50 with a thickness of 30 nm.
S105:在所述空穴传输层50上旋涂发光材料溶液,得到厚度为20nm的量子点薄膜,其中,所述发光材料溶液中的发光材料为红色量子点CdZnSe/ZnSeS/ZnS,溶剂为正辛烷,所述发光材料溶液的浓度为15mg/mL。然后,使用10mg/ml硝酸镉的乙醇溶液,在量子点薄膜上旋涂(2000rpm)成膜,10s后用乙醇旋涂清洗量子点薄膜,得到发光层20。S105: Spin-coat the luminescent material solution on the hole transport layer 50 to obtain a quantum dot film with a thickness of 20 nm, wherein the luminescent material in the luminescent material solution is red quantum dots CdZnSe/ZnSeS/ZnS, and the solvent is positive Octane, the concentration of the luminescent material solution is 15 mg/mL. Then, use an ethanol solution of 10 mg/ml cadmium nitrate to spin-coat (2000 rpm) on the quantum dot film to form a film. After 10 seconds, spin-coat the quantum dot film with ethanol to clean the quantum dot film to obtain the luminescent layer 20 .
S106:在发光层20上旋涂ZnO材料,得到厚度为30nm的电子传输层30。S106: Spin-coat ZnO material on the light-emitting layer 20 to obtain an electron transport layer 30 with a thickness of 30 nm.
S107:在所述电子传输层30上蒸镀Ag,得到厚度为100nm的阴极40,得到发光二极管。S107: Evaporate Ag on the electron transport layer 30 to obtain a cathode 40 with a thickness of 100 nm, and obtain a light-emitting diode.
实施例2Example 2
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸钙的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of calcium nitrate.
实施例3Example 3
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1, and the only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸铝的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of aluminum nitrate.
实施例4Example 4
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸铟的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of indium nitrate.
实施例5Example 5
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸锰的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of manganese nitrate.
实施例6Example 6
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸铂的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of platinum nitrate.
实施例7Example 7
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1, and the only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸锌的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of zinc nitrate.
实施例8Example 8
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中: This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸铜的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of copper nitrate.
实施例9Example 9
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸铁的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of iron nitrate.
实施例10Example 10
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
硝酸镉的乙醇溶液改为硝酸镍的乙醇溶液。The ethanol solution of cadmium nitrate was changed to the ethanol solution of nickel nitrate.
实施例11Example 11
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
10mg/ml硝酸镉的乙醇溶液改为浓度为2mg/mL硫酸锰的乙醇溶液,形成液膜时,旋涂次数由1次改为5次,形成液膜后静置时间由10s改为30s。The ethanol solution of 10 mg/ml cadmium nitrate was changed to the ethanol solution with a concentration of 2 mg/mL manganese sulfate. When forming a liquid film, the number of spin coatings was changed from 1 to 5 times. After the liquid film was formed, the standing time was changed from 10s to 30s.
实施例12Example 12
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
10mg/ml硝酸镉的乙醇溶液改为浓度为50mg/mL的甲基磺酸铅的乙醇溶液,形成液膜时,旋涂转速由2000rpm改为5000rpm,形成液膜后静置时间由10s改为5s。The ethanol solution of 10 mg/ml cadmium nitrate was changed to the ethanol solution of lead methane sulfonate with a concentration of 50 mg/mL. When forming a liquid film, the spin coating speed was changed from 2000rpm to 5000rpm. After the liquid film was formed, the standing time was changed from 10s to 5000rpm. 5s.
实施例13Example 13
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
10mg/ml硝酸镉的乙醇溶液改为浓度为5mg/mL的高氯酸锌乙醇溶液,形成液膜时,旋涂次数由1次改为2次。The ethanol solution of 10 mg/ml cadmium nitrate was changed to the ethanol solution of zinc perchlorate with a concentration of 5 mg/mL. When forming a liquid film, the number of spin coatings was changed from 1 to 2 times.
实施例14Example 14
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1, and the only difference from Embodiment 1 is that in this embodiment:
步骤(2)改为:将量子点薄膜置于10mg/ml硝酸镉乙醇溶液中,使得量子点薄膜的下侧面与溶液液面接触10s后,取出量子点薄膜,用乙醇冲洗量子点薄膜表面,得到功能膜。Step (2) is changed to: place the quantum dot film in a 10 mg/ml cadmium nitrate ethanol solution, so that the lower side of the quantum dot film is in contact with the solution surface for 10 seconds, take out the quantum dot film, and rinse the surface of the quantum dot film with ethanol. Obtain functional membrane.
器件的制备中,“使用10mg/ml硝酸镉的乙醇溶液,在量子点薄膜上旋涂(2000rpm)成膜,10s后用乙醇旋涂清洗量子点薄膜,得到发光层”改为“将设置有多个膜层的衬底翻转,使量子点薄膜浸在10mg/ml硝酸镉乙醇溶液中,使得量子点薄膜的下侧面与溶液液面接触10s后,用乙醇冲洗量子点薄膜表面,得到发光层,再次翻转衬底,使发光层位于最上层”。 In the preparation of the device, "Use 10mg/ml cadmium nitrate ethanol solution to spin-coat (2000rpm) on the quantum dot film to form a film. After 10 seconds, spin-coat the quantum dot film with ethanol to obtain the luminescent layer" is changed to "Set with The substrates of multiple film layers are turned over, and the quantum dot film is immersed in a 10 mg/ml cadmium nitrate ethanol solution. After the lower side of the quantum dot film is in contact with the solution surface for 10 seconds, the surface of the quantum dot film is rinsed with ethanol to obtain the luminescent layer. , flip the substrate again so that the light-emitting layer is on top."
实施例15Example 15
本实施例与实施例14基本相同,与实施例14的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 14. The only difference from Embodiment 14 is that in this embodiment:
使用的硝酸镉乙醇溶液的浓度由10mg/ml改为5mg/mL,接触时间为30s。The concentration of the cadmium nitrate ethanol solution used was changed from 10mg/ml to 5mg/mL, and the contact time was 30s.
实施例16Example 16
本实施例与实施例14基本相同,与实施例14的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 14. The only difference from Embodiment 14 is that in this embodiment:
使用的硝酸镉乙醇溶液的浓度由10mg/ml改为50mg/mL,接触时间为5s。The concentration of the cadmium nitrate ethanol solution used was changed from 10mg/ml to 50mg/mL, and the contact time was 5s.
实施例17Example 17
本实施例与实施例1基本相同,与实施例1的区别仅在于,本实施例中:This embodiment is basically the same as Embodiment 1. The only difference from Embodiment 1 is that in this embodiment:
使用的处理液由10mg/ml硝酸镉的乙醇溶液改为硝酸锰和硝酸铜溶于乙醇形成的混合溶液,混合溶液中,硝酸锰和硝酸铜的摩尔比为1:1,硝酸锰和硝酸铜的总浓度为10mg/ml。The treatment solution used was changed from a 10 mg/ml cadmium nitrate ethanol solution to a mixed solution of manganese nitrate and copper nitrate dissolved in ethanol. In the mixed solution, the molar ratio of manganese nitrate and copper nitrate was 1:1, and the molar ratio of manganese nitrate and copper nitrate was 1:1. The total concentration is 10mg/ml.
对比例1Comparative example 1
本对比例与实施例1基本相同,与实施例1的区别仅在于,本对比例中:This comparative example is basically the same as Example 1. The only difference from Example 1 is that in this comparative example:
减少了步骤(2)。Step (2) is reduced.
对比例2Comparative example 2
量子点溶液的制备:Preparation of quantum dot solution:
提供量子点溶液,其中,量子点为红色量子点CdZnSe/ZnSeS/ZnS,溶剂为正辛烷,所述溶液的浓度为20mg/mL。A quantum dot solution is provided, wherein the quantum dots are red quantum dots CdZnSe/ZnSeS/ZnS, the solvent is n-octane, and the concentration of the solution is 20 mg/mL.
取量子点溶液5mL,加入0.3mL,50mmol/ml的硝酸镉乙醇溶液,充分搅拌,10min后,加入10ml乙酸乙酯清洗,离心得到沉淀,将沉淀重新分散在正辛烷溶液中,定量15mg/ml,得到处理后的量子点溶液。Take 5 mL of the quantum dot solution, add 0.3 mL of 50 mmol/ml cadmium nitrate ethanol solution, stir thoroughly, and after 10 min, add 10 ml of ethyl acetate to wash, centrifuge to obtain a precipitate, redisperse the precipitate in n-octane solution, and quantify 15 mg/ ml to obtain the treated quantum dot solution.
器件的制备:Device preparation:
本对比例器件的制备步骤与实施例1的区别仅在于:制备发光层时,采用对比例2制得的处理后的量子点溶液在空穴传输层上直接旋涂成膜得到发光层。The only difference between the preparation steps of the device in this comparative example and Example 1 is that when preparing the luminescent layer, the treated quantum dot solution prepared in Comparative Example 2 is directly spin-coated on the hole transport layer to form a film to obtain the luminescent layer.
对比例3Comparative example 3
本对比例与对比例2基本相同,与对比例2的区别仅在于,本对比例中:This comparative example is basically the same as comparative example 2. The only difference from comparative example 2 is that in this comparative example:
硝酸镉乙醇溶液的加入量为0.5mL。得到的处理后的量子点溶液出现聚沉现象。The added amount of cadmium nitrate ethanol solution is 0.5 mL. The obtained treated quantum dot solution exhibits aggregation phenomenon.
对比例4 Comparative example 4
本对比例与对比例2基本相同,与对比例2的区别仅在于,本对比例中:This comparative example is basically the same as comparative example 2. The only difference from comparative example 2 is that in this comparative example:
使用的处理液为硝酸锌乙醇溶液。The treatment solution used is zinc nitrate ethanol solution.
对比例5Comparative example 5
本对比例与对比例2基本相同,与对比例2的区别仅在于,本对比例中:This comparative example is basically the same as comparative example 2. The only difference from comparative example 2 is that in this comparative example:
使用的处理液为硝酸铟乙醇溶液。The treatment liquid used is indium nitrate ethanol solution.
实验例1Experimental example 1
取金属盐溶液(硝酸镉乙醇溶液、硝酸钙乙醇溶液、硝酸铝乙醇溶液、硝酸铟乙醇溶液、硝酸锰乙醇溶液、硝酸铂乙醇溶液、硝酸锌乙醇溶液、硝酸铜乙醇溶液、硝酸铁乙醇溶液、硝酸镍乙醇溶液)进行下述实验:Take metal salt solutions (cadmium nitrate ethanol solution, calcium nitrate ethanol solution, aluminum nitrate ethanol solution, indium nitrate ethanol solution, manganese nitrate ethanol solution, platinum nitrate ethanol solution, zinc nitrate ethanol solution, copper nitrate ethanol solution, iron nitrate ethanol solution, Nickel nitrate ethanol solution) perform the following experiments:
提供量子点溶液,其中,量子点为红色量子点CdZnSe/ZnSeS/ZnS,溶剂为正辛烷,所述溶液的浓度为20mg/mL。取量子点溶液5mL,加入0.3mL,50mmol/ml的金属盐溶液,充分搅拌,10min后,加入10ml乙酸乙酯清洗,离心得到沉淀,将沉淀重新分散在正辛烷溶液中,定量15mg/ml,得到处理后的量子点溶液。A quantum dot solution is provided, wherein the quantum dots are red quantum dots CdZnSe/ZnSeS/ZnS, the solvent is n-octane, and the concentration of the solution is 20 mg/mL. Take 5 mL of quantum dot solution, add 0.3 mL of 50 mmol/ml metal salt solution, stir thoroughly, and after 10 min, add 10 ml of ethyl acetate to wash, centrifuge to obtain a precipitate, redisperse the precipitate in n-octane solution, and quantify 15 mg/ml. , to obtain the processed quantum dot solution.
采用动态光散射仪检测量子点溶液以及处理后的量子点溶液中量子点的水合粒径,结果记入表1中。A dynamic light scattering instrument was used to detect the hydrated particle size of the quantum dots in the quantum dot solution and the treated quantum dot solution, and the results were recorded in Table 1.
表1

Table 1

由表1可知:It can be seen from Table 1:
水合粒径测试的数据反映量子点和配体在溶液态综合粒径。量子点溶液中只有一种粒径分布的量子点,而向量子点溶液中加入金属盐溶液后,溶液中出现了两种粒径的量子点,其中第一量子点的水合粒径分布在30~50nm之间,第二量子点的水合粒径分布在10~20nm之间,第一量子点的水合粒径大于第二量子点,这是因为,金属阳离子同时与多个量子点表面的阴离子连接,使得相邻的量子点之间通过金属阳离子桥接,从而导致了水合粒径的增加;The data of the hydrated particle size test reflects the comprehensive particle size of the quantum dots and ligands in the solution state. There are only one particle size distribution of quantum dots in the quantum dot solution. After adding a metal salt solution to the quantum dot solution, quantum dots of two particle sizes appear in the solution. The hydrated particle size distribution of the first quantum dot is within 30 ~50nm, the hydrated particle size of the second quantum dot is distributed between 10~20nm, and the hydrated particle size of the first quantum dot is larger than that of the second quantum dot. This is because the metal cations simultaneously interact with the anions on the surface of multiple quantum dots. Connection, such that adjacent quantum dots are bridged by metal cations, resulting in an increase in hydrated particle size;
参阅对比例2、对比例3以及上述水合粒径检测的实验步骤可以看出,当金属盐溶液加入量多至0.5ml后,处理后的量子点溶液就出现了聚沉现象,显然,直接在量子点溶液中加入金属盐溶液的方式,只能允许加入少量金属盐溶液进行处理,这必然导致处理后的溶液中第一量子点含量较少。Referring to Comparative Example 2, Comparative Example 3 and the above-mentioned experimental steps for hydrated particle size detection, it can be seen that when the amount of metal salt solution added is up to 0.5 ml, the treated quantum dot solution shows coagulation phenomenon. Obviously, the method of directly adding metal salt solution to the quantum dot solution can only allow the addition of a small amount of metal salt solution for treatment, which will inevitably lead to a lower content of the first quantum dots in the treated solution.
实验例2Experimental example 2
检测实施例1至17,对比例1制得的功能膜中第一金属阳离子含量和第二金属阳离子含量,其中,第一金属阳离子是指连接相邻量子点表面阴离子的金属阳离子,即通过处理液引入的金属阳离子,第二金属阳离子是指量子点本体含有的所有金属阳离子。结果记入表2,检测方法如下:Detect the first metal cation content and the second metal cation content in the functional film prepared in Examples 1 to 17 and Comparative Example 1, where the first metal cation refers to the metal cation connecting the anions on the surface of adjacent quantum dots, that is, through treatment Metal cations introduced into the liquid, and the second metal cations refer to all metal cations contained in the quantum dot body. The results are recorded in Table 2. The detection method is as follows:
通过透射电子显微镜(TEM-EDS)对处理前的量子点薄膜和量子点溶液进行表征,可获得量子点各原子的原子百分含量,计算其中所有金属原子的原子百分含量的总和,即为第二金属阳离子的原子百分含量(At%);By characterizing the quantum dot film and quantum dot solution before treatment with a transmission electron microscope (TEM-EDS), the atomic percentage content of each atom of the quantum dot can be obtained, and the sum of the atomic percentage content of all metal atoms is calculated, which is Atomic percentage (At%) of the second metal cation;
通过透射电子显微镜(TEM-EDS)对处理后的量子点薄膜和量子点溶液进行表征,可获得处理后的样品中各原子的原子百分含量,若采用的处理液中 含有的金属阳离子种类为处理前的量子点薄膜或量子点溶液已有的种类,则取该金属元素处理前后的含量差值作为第一金属阳离子的原子百分含量(At%),若采用的处理液中含有的金属阳离子种类为处理前的量子点薄膜或量子点溶液不具有的新种类,则检测到的该金属元素的原子百分含量即为第一金属阳离子的原子百分含量(At%)。By characterizing the treated quantum dot film and quantum dot solution using a transmission electron microscope (TEM-EDS), the atomic percentage of each atom in the treated sample can be obtained. If the treatment solution is used If the type of metal cation contained is the type already present in the quantum dot film or quantum dot solution before treatment, then the difference in content of the metal element before and after treatment is taken as the atomic percentage (At%) of the first metal cation. If the The type of metal cations contained in the treatment liquid is a new type that the quantum dot film or quantum dot solution before treatment does not have, then the atomic percentage content of the detected metal element is the atomic percentage content of the first metal cation (At %).
表2
Table 2
相邻量子点通过金属阳离子桥接后会导致量子点溶液态水合粒径增大,且由于量子点上连接有所述金属阳离子,导致量子点薄膜中也会含有该金属阳离子。参阅表2,其数据表明,使用本申请方法处理后,量子点薄膜中均含有所 述第一金属阳离子。结合实验例1的检测结果即可得出结论:使用本申请方法处理后,量子点薄膜中的相邻量子点通过金属阳离子实现了桥接。After adjacent quantum dots are bridged by metal cations, the hydrated particle size of the quantum dot solution will increase, and because the metal cations are connected to the quantum dots, the quantum dot film will also contain the metal cations. Referring to Table 2, the data shows that after processing using the method of this application, the quantum dot film contains all The first metal cation. Combining the test results of Experimental Example 1, it can be concluded that after processing using the method of the present application, adjacent quantum dots in the quantum dot film are bridged through metal cations.
实验例3Experimental example 3
测试实施例1至17、对比例1制得的功能膜以及对比例2、4、5制得的处理后的量子点溶液的荧光量子点产率;测试实施例1至17,对比例1、2、4、5制得的器件的光电性能和寿命。检测方法如下:Test the fluorescent quantum dot yields of the functional films prepared in Examples 1 to 17 and Comparative Example 1 and the treated quantum dot solutions prepared in Comparative Examples 2, 4 and 5; Test Examples 1 to 17, Comparative Examples 1, Optoelectronic performance and lifespan of the devices prepared in 2, 4 and 5. The detection method is as follows:
量子点发光二极管的发射峰(EL)、半峰宽(FWHM)以及电流效率(CE)分别通过Keithley 2400高精度数字源表、Ocean Optic USB2000+光谱仪以及LS-160亮度计测试,并计算所得;The emission peak (EL), half-maximum width (FWHM) and current efficiency (CE) of the quantum dot light-emitting diode were tested and calculated by Keithley 2400 high-precision digital source meter, Ocean Optic USB2000+ spectrometer and LS-160 luminance meter respectively;
寿命T95@1knit的测试方法为,在恒定电流下,器件的初始亮度L0(nit)衰减至95%所经历的时间,并换算值1000nit下的老化时间。The test method of lifetime T95@1knit is the time it takes for the initial brightness L 0 (nit) of the device to decay to 95% under constant current, and is converted into the aging time at 1000 nit.
测试结果如表3所示。The test results are shown in Table 3.
表3

table 3

由表三可知:It can be seen from Table 3:
相较于对比例1的发光二极管,实施例1~17的发光二极管均具有较高的光电性能及较长的寿命T95@1000nit,显然,使用含有金属阳离子的处理液对量子点薄膜进行处理后,金属阳离子与量子点表面的阴离子形成化学键,从而对量子点表面的阴离子悬挂键起到了钝化作用,减少了量子点表面的缺陷态,消除缺陷态所引进的非辐射通道,有利于提升量子点的荧光量子产率(PLQY);同时,由于相邻量子点通过金属阳离子连接起来,也使得功能膜更加致密,增强了耦合效应,提升了载流子传输速度,从而获得了更高的激子密度,提升了发光器件的发光效率和寿命;而且,对比实施例1至10可以看出,当采用的处理液中含有的金属阳离子为Al3+、Mn2+、Pt2+、Zn2+、Fe3+时,对发光器件的发光效率和寿命的提升效果更佳。Compared with the light-emitting diode of Comparative Example 1, the light-emitting diodes of Examples 1 to 17 all have higher photoelectric performance and longer life T95@1000nit. Obviously, after using a treatment solution containing metal cations to treat the quantum dot film, , the metal cations form chemical bonds with the anions on the surface of the quantum dots, thereby passivating the anion dangling bonds on the surface of the quantum dots, reducing the defect states on the surface of the quantum dots, eliminating the non-radiative channels introduced by the defect states, and conducive to improving the quantum Fluorescence quantum yield (PLQY) of dots; at the same time, because adjacent quantum dots are connected through metal cations, the functional film is also made denser, the coupling effect is enhanced, the carrier transmission speed is increased, and higher excitation is obtained. The electron density improves the luminous efficiency and life of the light-emitting device; moreover, comparing Examples 1 to 10, it can be seen that when the metal cations contained in the treatment liquid used are Al 3+ , Mn 2+ , Pt 2+ , and Zn 2 + , Fe 3+ , the effect on improving the luminous efficiency and life of the light-emitting device is better.
将实施例1和对比例2,实施例7和对比例4,实施例4和对比例5分别进行对比,再分别与对比例1进行对比,可以看出,相较本申请方案,在制备量子点溶液过程中,加入处理液对其进行表面修饰,如果添加的处理液的终浓度较低(例如低于5mmol/mL),虽然能够实现对器件光电性能和寿命的提升,但提升效果有限,明显低于本申请方案制得的器件的光电性能和寿命;而且,结合对比例3的结果(得到的处理后的量子点溶液出现聚沉现象)来看,如果添加处理液的终浓度偏高,则会因为量子点桥接导致量子点溶液不稳定,出现聚沉现象。Compare Example 1 and Comparative Example 2, Example 7 and Comparative Example 4, and Example 4 and Comparative Example 5 respectively, and then compare them with Comparative Example 1 respectively. It can be seen that compared with the scheme of the present application, it is less effective in preparing quantum During the solution dispensing process, a treatment solution is added to modify the surface. If the final concentration of the added treatment solution is low (for example, less than 5 mmol/mL), although the photoelectric performance and lifespan of the device can be improved, the improvement effect will be limited. It is significantly lower than the photoelectric performance and lifespan of the device produced by the scheme of this application; moreover, combined with the results of Comparative Example 3 (the treated quantum dot solution obtained has agglomeration phenomenon), if the final concentration of the added treatment solution is too high , the quantum dot solution will be unstable and agglomeration will occur due to quantum dot bridging.
以上对本申请实施例所提供的功能膜及其制备方法及发光器件进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上 实施例的说明只是用于帮助理解本申请的方法及其核心思想;同时,对于本领域的技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。 The functional film, its preparation method and the light-emitting device provided by the embodiments of the present application have been introduced in detail. Specific examples are used in this article to illustrate the principles and implementation methods of the present application. The above The description of the embodiments is only used to help understand the method and the core idea of the present application; at the same time, for those skilled in the art, there will be changes in the specific implementation and application scope based on the ideas of the present application. In summary, As mentioned above, the content of this specification should not be construed as a limitation on this application.

Claims (20)

  1. 一种功能膜,其中,所述功能膜包含量子点以及连接至少两个相邻的所述量子点的金属阳离子,所述金属阳离子与所述量子点的表面的第一阴离子形成化学键。A functional film, wherein the functional film includes quantum dots and metal cations connecting at least two adjacent quantum dots, and the metal cations form chemical bonds with first anions on the surface of the quantum dots.
  2. 根据权利要求1所述的功能膜,其中,所述功能膜由所述量子点以及连接至少两个相邻的所述量子点的所述金属阳离子组成。The functional film according to claim 1, wherein the functional film is composed of the quantum dots and the metal cations connecting at least two adjacent quantum dots.
  3. 根据权利要求1或2所述的功能膜,其中,所述金属阳离子包括二价金属阳离子和三价金属阳离子中的一种或多种。The functional film according to claim 1 or 2, wherein the metal cations include one or more of divalent metal cations and trivalent metal cations.
  4. 根据权利要求1或2所述的功能膜,其中,所述功能膜中,所述金属阳离子的原子百分含量为0.1~5%。The functional film according to claim 1 or 2, wherein the atomic percentage of the metal cations in the functional film is 0.1 to 5%.
  5. 根据权利要求1或2所述的功能膜,其中,所述功能膜中,表面连接有所述金属阳离子的所述量子点为第一量子点,所述第一量子点的水合粒径为20~50nm。The functional film according to claim 1 or 2, wherein in the functional film, the quantum dots with the metal cations connected to their surfaces are first quantum dots, and the hydrated particle size of the first quantum dots is 20 ~50nm.
  6. 根据权利要求3所述的功能膜,其中,所述二价金属阳离子包括Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Cu2+、Co2+及Fe2+中的一种或多种,所述三价金属阳离子包括Al3+、Fe3+、Ni3+、Cr3+及In3+中的一种或多种。The functional film according to claim 3, wherein the divalent metal cations include Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and Fe 2+ One or more of the trivalent metal cations include one or more of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
  7. 一种功能膜的制备方法,其中,包括以下步骤:A method for preparing a functional membrane, which includes the following steps:
    提供处理液和量子点薄膜,所述处理液中含有金属阳离子;Providing a treatment solution and a quantum dot film, wherein the treatment solution contains metal cations;
    将所述处理液与所述量子点薄膜的表面进行接触,以使得所述量子点薄膜中的相邻量子点通过所述金属阳离子相互连接,得到功能膜。The treatment liquid is brought into contact with the surface of the quantum dot film so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations to obtain a functional film.
  8. 根据权利要求7所述的制备方法,其中,所述金属阳离子包括二价金属阳离子和三价金属阳离子中的一种或多种。The preparation method according to claim 7, wherein the metal cations include one or more of divalent metal cations and trivalent metal cations.
  9. 根据权利要求7所述的制备方法,其中,所述处理液中还含有第二阴离子,所述第二阴离子包括硝酸根离子、硫酸根离子、磺酸根离子以及高氯酸根离子中的一种或多种。The preparation method according to claim 7, wherein the treatment solution further contains a second anion, and the second anion includes one or more of a nitrate ion, a sulfate ion, a sulfonate ion and a perchlorate ion.
  10. 根据权利要求7所述的制备方法,其中,将所述处理液与所述量子点薄膜的表面进行接触的时间为5-30s。The preparation method according to claim 7, wherein the time for the treatment liquid to contact the surface of the quantum dot film is 5-30s.
  11. 根据权利要求8所述的制备方法,其中,所述二价金属阳离子包括Cd2+、Zn2+、Ca2+、Mn2+、Pt2+、Cu2+、Co2+及Fe2+中的一种或多种,所述三价金属阳离子包括Al3+、Fe3+、Ni3+、Cr3+及In3+中的一种或多种。 The preparation method according to claim 8, wherein the divalent metal cations include Cd 2+ , Zn 2+ , Ca 2+ , Mn 2+ , Pt 2+ , Cu 2+ , Co 2+ and Fe 2+ One or more of the trivalent metal cations include one or more of Al 3+ , Fe 3+ , Ni 3+ , Cr 3+ and In 3+ .
  12. 根据权利要求7所述的制备方法,其中,将所述处理液与所述量子点薄膜的表面进行接触,以使得所述量子点薄膜中的相邻量子点通过所述金属阳离子相互连接,得到功能膜的步骤包括:The preparation method according to claim 7, wherein the treatment liquid is brought into contact with the surface of the quantum dot film, so that adjacent quantum dots in the quantum dot film are connected to each other through the metal cations, to obtain The steps of functional membrane include:
    将所述处理液设置在所述量子点薄膜的表面,形成液膜,静置后去除所述液膜,得到功能膜;或者,The treatment liquid is placed on the surface of the quantum dot film to form a liquid film, and after standing, the liquid film is removed to obtain a functional film; or,
    将所述量子点薄膜置于所述处理液中,使所述量子点薄膜的至少一表面与所述处理液接触,静置后取出所述量子点薄膜,并去除所述量子点薄膜表面的处理液,得到功能膜。The quantum dot film is placed in the treatment liquid, so that at least one surface of the quantum dot film is in contact with the treatment liquid, and after standing, the quantum dot film is taken out, and the surface of the quantum dot film is removed. Treat the liquid to obtain a functional membrane.
  13. 根据权利要求12所述的制备方法,其中,所述将所述处理液设置在所述量子点薄膜的表面,形成液膜的方法包括:使用浓度为2-5mg/mL的处理液在所述量子点薄膜的表面重复涂覆多次,形成液膜;或者,The preparation method according to claim 12, wherein the treatment liquid is disposed on the surface of the quantum dot film, and the method of forming a liquid film includes: using a treatment liquid with a concentration of 2-5 mg/mL in the The surface of the quantum dot film is repeatedly coated multiple times to form a liquid film; or,
    所述将所述处理液设置在所述量子点薄膜的表面,形成液膜的方法包括:使用浓度为5-50mg/mL的处理液在所述量子点薄膜的表面进行一次涂覆,形成液膜。The method of disposing the treatment liquid on the surface of the quantum dot film to form a liquid film includes: coating the surface of the quantum dot film once with a treatment liquid with a concentration of 5-50 mg/mL to form a liquid film. membrane.
  14. 根据权利要求12所述的制备方法,其中,将所述量子点薄膜置于所述处理液中,使所述量子点薄膜的至少一表面与所述处理液接触,静置后取出所述量子点薄膜,并去除所述量子点薄膜表面的处理液,得到功能膜的步骤中,所述处理液的浓度为5-50mg/mL。The preparation method according to claim 12, wherein the quantum dot film is placed in the treatment liquid, at least one surface of the quantum dot film is contacted with the treatment liquid, and the quantum dot film is taken out after standing. dot film and remove the treatment liquid on the surface of the quantum dot film to obtain a functional film, the concentration of the treatment liquid is 5-50 mg/mL.
  15. 一种发光器件,其中,包括层叠设置的阳极、发光层和阴极,所述发光层包括功能膜,所述功能膜包括如权利要求1至6任意一项所述的功能膜,或者,所述功能膜经权利要求7至14任意一项所述的制备方法制得。A light-emitting device, which includes a stacked anode, a light-emitting layer and a cathode, the light-emitting layer includes a functional film, the functional film includes the functional film according to any one of claims 1 to 6, or, The functional film is prepared by the preparation method described in any one of claims 7 to 14.
  16. 根据权利要求15所述的发光器件,其中,所述功能膜的量子点选自单一结构量子点及核壳结构量子点中的一种或多种,所述单一结构量子点的材料选自II-VI族化合物、IV-VI族化合物、III-V族化合物和I-III-VI族化合物中的一种或多种,其中,所述II-VI族化合物选自CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe及HgZnSTe中的一种或多种,所述IV-VI族化合物选自SnS、SnSe、SnTe、PbS、PbSe、PbTe、SnSeS、SnSeTe、 SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、SnPbSSe、SnPbSeTe及SnPbSTe中的一种或多种,所述III-V族化合物选自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs或InAlPSb中的一种或多种,所述I-III-VI族化合物选自CuInS2、CuInSe2及AgInS2中的一种或多种,所述核壳结构的量子点的核包括上述单一结构量子点中的任意一种,所述核壳结构的量子点的壳层材料包括CdS、CdTe、CdSeTe、CdZnSe、CdZnS、CdSeS、ZnSe、ZnSeS、ZnS和上述单一结构量子点中的一种或多种。The light-emitting device according to claim 15, wherein the quantum dots of the functional film are selected from one or more of single structure quantum dots and core-shell structure quantum dots, and the material of the single structure quantum dot is selected from II -One or more of Group VI compounds, Group IV-VI compounds, Group III-V compounds and Group I-III-VI compounds, wherein the Group II-VI compound is selected from CdS, CdSe, CdTe, ZnS , ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe ,CdZnSeS , one or more of CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe and HgZnSTe, the IV-VI compound is selected from SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, One or more of SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe and SnPbSTe, the III-V compound is selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, One or more of GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs or InAlPSb, and the Group I-III-VI compound is selected from one of CuInS 2 , CuInSe 2 and AgInS 2 or more, the core of the quantum dots of the core-shell structure includes any one of the above single structure quantum dots, and the shell material of the quantum dots of the core-shell structure includes CdS, CdTe, CdSeTe, CdZnSe, CdZnS, CdSeS , ZnSe, ZnSeS, ZnS and one or more of the above single structure quantum dots.
  17. 根据权利要求15所述的发光器件,其中,所述阳极和所述阴极分别独立地选自金属电极、碳材料电极、金属氧化物电极或复合电极,所述金属电极的材料选自Ag、Al、Mg、Au、Cu、Mo、Yb、Ca及Ba中的一种或多种,所述碳材料电极的材料选自石墨、碳纳米管、石墨烯以及碳纤维中的一种或多种,所述金属氧化物电极的材料选自ITO、FTO、ATO、AZO、GZO、IZO、MZO以及AMO中的一种或多种,所述复合电极选自AZO/Ag/AZO、AZO/Al/AZO、ITO/Ag/ITO、ITO/Al/ITO、ZnO/Ag/ZnO、ZnO/Al/ZnO、TiO2/Ag/TiO2、TiO2/Al/TiO2、ZnS/Ag/ZnS以及ZnS/Al/ZnS中的一种或多种。The light-emitting device according to claim 15, wherein the anode and the cathode are independently selected from a metal electrode, a carbon material electrode, a metal oxide electrode or a composite electrode, the material of the metal electrode is selected from one or more of Ag, Al, Mg, Au, Cu, Mo, Yb, Ca and Ba, the material of the carbon material electrode is selected from one or more of graphite, carbon nanotubes, graphene and carbon fiber, the material of the metal oxide electrode is selected from one or more of ITO, FTO, ATO, AZO, GZO, IZO, MZO and AMO, and the composite electrode is selected from one or more of AZO/Ag/AZO, AZO/Al/AZO, ITO/Ag/ITO, ITO/Al/ITO, ZnO/Ag/ZnO, ZnO/Al/ZnO, TiO2 /Ag/TiO2, TiO2 /Al/ TiO2 , ZnS/Ag/ZnS and ZnS/Al/ZnS.
  18. 根据权利要求15所述的发光器件,其中,所述发光器件还包括设于所述阳极和所述发光层之间的空穴功能层,所述空穴功能层包括空穴传输层和/或空穴注入层,所述空穴传输层和所述空穴注入层的材料分别独立地选自TFB、CuPc、PVK、Poly-TPD、DNTPD、TCATA、TCCA、CBP、TPD、NPB、NPD、PEDOT:PSS、TAPC、MCC、F4-TCNQ、HATCN、4,4',4'-三(N-3-甲基苯基-N苯基氨基)三苯胺、聚苯胺、过渡金属氧化物、过渡金属硫化物、过渡金属锡化物、掺杂石墨烯、非掺杂石墨烯以及C60中的一种或多种。The light-emitting device according to claim 15, wherein the light-emitting device further includes a hole function layer provided between the anode and the light-emitting layer, the hole function layer includes a hole transport layer and/or Hole injection layer, the materials of the hole transport layer and the hole injection layer are independently selected from TFB, CuPc, PVK, Poly-TPD, DNTPD, TCATA, TCCA, CBP, TPD, NPB, NPD, PEDOT :PSS, TAPC, MCC, F4-TCNQ, HATCN, 4,4',4'-tris(N-3-methylphenyl-Nphenylamino)triphenylamine, polyaniline, transition metal oxides, transition metals One or more of sulfide, transition metal tinide, doped graphene, non-doped graphene and C60.
  19. 根据权利要求15所述的发光器件,其中,所述发光器件还包括设于所述阴极和所述发光层之间的电子功能层,所述电子功能层包括电子传输层和/或电子注入层。The light-emitting device according to claim 15, wherein the light-emitting device further includes an electronic functional layer provided between the cathode and the light-emitting layer, the electronic functional layer including an electron transport layer and/or an electron injection layer. .
  20. 根据权利要求19所述的发光器件,其中,所述电子传输层和/或所述 电子注入层的材料包括无机材料和/或有机材料,所述无机材料选自掺杂或非掺杂的金属氧化物,所述金属氧化物包括氧化锌、氧化钡、氧化铝、氧化镍、氧化钛、氧化锡、氧化钽、氧化锆、氧化镍、氧化钛锂、氧化锌铝、氧化锌锰、氧化锌锡、氧化锌锂、氧化铟锡、硫化镉、硫化锌、硫化钼、硫化钨、硫化铜、锡化锌、磷化铟、磷化镓、硫化铜铟、硫化铜镓、钛酸钡中的一种或多种,掺杂的元素包括铝、镁、锂、锰、钇、镧、铜、镍、锆、铈、钆中的一种或多种,所述有机材料选自喹喔啉化合物、咪唑类化合物、三嗪类化合物,含芴类化合物、羟基喹啉化合物中的一种或多种。 The light emitting device according to claim 19, wherein the electron transport layer and/or the The material of the electron injection layer includes inorganic materials and/or organic materials. The inorganic materials are selected from doped or non-doped metal oxides. The metal oxides include zinc oxide, barium oxide, aluminum oxide, nickel oxide, oxide Titanium, tin oxide, tantalum oxide, zirconium oxide, nickel oxide, lithium titanium oxide, zinc aluminum oxide, zinc manganese oxide, zinc tin oxide, lithium zinc oxide, indium tin oxide, cadmium sulfide, zinc sulfide, molybdenum sulfide, tungsten sulfide, One or more of copper sulfide, zinc tin, indium phosphide, gallium phosphide, copper indium sulfide, copper gallium sulfide, and barium titanate. The doped elements include aluminum, magnesium, lithium, manganese, yttrium, and lanthanum. , one or more of copper, nickel, zirconium, cerium, and gadolinium, and the organic material is selected from quinoxaline compounds, imidazole compounds, triazine compounds, fluorene-containing compounds, and hydroxyquinoline compounds. Kind or variety.
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