WO2024051257A1 - Optical waveguide sheet and manufacturing method therefor, and augmented reality device - Google Patents

Optical waveguide sheet and manufacturing method therefor, and augmented reality device Download PDF

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Publication number
WO2024051257A1
WO2024051257A1 PCT/CN2023/100689 CN2023100689W WO2024051257A1 WO 2024051257 A1 WO2024051257 A1 WO 2024051257A1 CN 2023100689 W CN2023100689 W CN 2023100689W WO 2024051257 A1 WO2024051257 A1 WO 2024051257A1
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WO
WIPO (PCT)
Prior art keywords
conductive layer
optical waveguide
thermosetting resin
light
refractive index
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PCT/CN2023/100689
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French (fr)
Chinese (zh)
Inventor
叶万俊
Original Assignee
Oppo广东移动通信有限公司
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Application filed by Oppo广东移动通信有限公司 filed Critical Oppo广东移动通信有限公司
Publication of WO2024051257A1 publication Critical patent/WO2024051257A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/01Head-up displays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings

Definitions

  • the present application relates to the field of electronics, and specifically to an optical waveguide plate, its preparation method and an augmented reality device.
  • Augmented reality (AR) technology can combine virtuality and reality, and is currently being used more and more widely.
  • This diffraction angle is generally the propagation angle of light in the optical waveguide. The greater the diffraction angle, the greater the propagation distance of light in the optical waveguide within one cycle, and the corresponding exit pupil density will be smaller.
  • different propagation angles correspond to different exit pupil densities of light and different grating action times. This results in a difference in energy of the final emitted light, which affects the uniformity of efficiency and color distribution within the field of view of the optical waveguide. And as the field of view increases, this difference will become more obvious, and efficiency uniformity and color distribution will be further degraded.
  • the first embodiment of the present application provides an optical waveguide plate, which includes:
  • the light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence; the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and The refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; and
  • the grating part includes a light coupling part and a light coupling part, and the light coupling part and the light coupling part are spaced apart on the surface of the first conductive layer facing away from the second conductive layer.
  • a second embodiment of the present application provides a method for preparing an optical waveguide sheet.
  • the optical waveguide sheet includes a light conductive part and a grating part.
  • the light conductive part includes a first conductive layer and a second conductive layer that are stacked in sequence. and a third conductive layer, the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and the refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; the grating
  • the method includes:
  • the third conductive layer is formed using a first molding method; wherein the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is the same as the second molding method.
  • the molding methods are different.
  • a third embodiment of the present application provides an augmented reality device, which is characterized by including:
  • a projection light engine is used to project light signals, the light signals include image information;
  • optical waveguide sheet described in the embodiment of the present application is used to transmit the optical signal.
  • FIG. 1 is a schematic top structural view of an optical waveguide plate according to an embodiment of the present application.
  • FIG. 2 is a schematic cross-sectional structural view of the optical waveguide plate along the direction AA in FIG. 1 according to an embodiment of the present application.
  • Figure 3 is a schematic diagram of an optical path of an optical waveguide plate according to an embodiment of the present application.
  • Figure 4 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to an embodiment of the present application.
  • Figure 5 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to another embodiment of the present application.
  • Figure 6 is a schematic structural diagram of the first mold according to an embodiment of the present application.
  • FIG. 7 is a schematic structural diagram of a manufacturing process of an optical waveguide plate according to an embodiment of the present application.
  • Figure 8 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to another embodiment of the present application.
  • Figure 9 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to another embodiment of the present application.
  • FIG. 10 is a schematic structural diagram of the preparation process of the first conductive layer and the grating part according to an embodiment of the present application.
  • FIG. 11 is a schematic structural diagram of the third conductive layer preparation process according to an embodiment of the present application.
  • FIG. 12 is a schematic structural diagram of the second conductive layer preparation process according to an embodiment of the present application.
  • Figure 13 is a schematic structural diagram of an augmented reality device according to an embodiment of the present application.
  • Figure 14 is a schematic cross-sectional structural diagram of the augmented reality device along the C-C direction in Figure 13 according to an embodiment of the present application.
  • Figure 15 is a circuit block diagram of an augmented reality device according to an embodiment of the present application.
  • this application provides an optical waveguide plate, which includes:
  • the light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence; the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and The refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; and
  • the grating part includes a light coupling part and a light coupling part, and the light coupling part and the light coupling part are spaced apart on the surface of the first conductive layer facing away from the second conductive layer.
  • the first conductive layer, the second conductive layer, the third conductive layer and the grating part are an integral structure.
  • the thickness of the first conductive layer is greater than the thickness of the second conductive layer
  • the The thickness of the third conductive layer is greater than the thickness of the second conductive layer
  • the thickness h 1 of the first conductive layer and the thickness h of the second conductive layer is 7:1 ⁇ h 1 / h 2 ⁇ 10:1; the ratio h 3 of the thickness h 3 of the third conductive layer and the thickness h 2 of the second conductive layer
  • the range of /h 2 is 10 ⁇ h 3 /h 2 ⁇ 14:1.
  • the thickness h1 of the first conductive layer ranges from 0.2mm ⁇ h1 ⁇ 3mm, so The thickness h2 of the second conductive layer is in the range of 0.01mm ⁇ h2 ⁇ 0.1mm, and the thickness h3 of the third conductive layer is in the range of 0.2mm ⁇ h3 ⁇ 3mm.
  • the refractive index n 1 of the first conductive layer is equal to the refractive index n 3 of the third conductive layer.
  • the optical waveguide plate satisfies the following relationship:
  • n 2 is the refractive index of the first conductive layer
  • the refractive index n1 of the first conductive layer is in the range of 1.55 ⁇ n1 ⁇ 2.0; the refractive index n2 of the second conductive layer is in the range of 1.35 ⁇ n2 ⁇ 1.6; the refractive index of the third conductive layer is The range of rate n3 is 1.55 ⁇ n3 ⁇ 2.0.
  • the first conductive layer and the third conductive layer are both thermosetting resin layers, and the second conductive layer is a thermoplastic resin layer; or, the first conductive layer and the third conductive layer are both thermosetting resin layers. is a thermoplastic resin layer, and the second conductive layer is a thermosetting resin layer.
  • thermoplastic resin layer includes polycarbonate.
  • the present application provides a method for preparing an optical waveguide sheet.
  • the optical waveguide sheet includes a light conductive part and a grating part.
  • the light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence. Three conductive layers, the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and the refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; the grating portion is provided On the surface of the first conductive layer facing away from the second conductive layer; the method includes:
  • the third conductive layer is formed using a first molding method; wherein the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is the same as the second molding method.
  • the molding methods are different.
  • the first molding method is casting molding
  • the second molding method is injection molding
  • the method includes:
  • a first mold is provided.
  • the first mold includes a first sub-mold and a second sub-mold.
  • the first sub-mold and the second sub-mold enclose a first mold cavity.
  • the first sub-mold has a surface facing the The grating texture of the first mold cavity, the grating texture is complementary to the structure of the grating part;
  • a second conductive layer is formed by injection molding on the surface of the first conductive layer facing away from the grating part;
  • thermosetting resin glue Inject a second thermosetting resin glue into the surface of the second conductive layer facing away from the first conductive layer
  • thermosetting resin glue is solidified to obtain a third conductive layer.
  • the first thermosetting resin glue is cured to obtain a first conductive layer and a grating part, including:
  • the first sub-mold is positioned below the second sub-mold, and the first thermosetting resin glue is solidified to obtain the first conductive layer and the grating portion.
  • the second conductive layer is formed by injection molding on the surface of the first conductive layer facing away from the grating part.
  • the method also included:
  • the surface of the first conductive layer facing away from the grating portion is polished so that the first conductive layer faces away from the light grating portion.
  • the surface accuracy PV1 of the gate surface is PV1 ⁇ 15nm;
  • the method further includes:
  • the surface of the third conductive layer facing away from the second conductive layer is polished so that the surface precision PV2 of the surface of the third conductive layer facing away from the second conductive layer is PV2 ⁇ 15 nm.
  • the second conductive layer is a thermoplastic resin layer
  • the thermoplastic resin layer includes polycarbonate
  • the first thermosetting resin glue and the second thermosetting resin glue both include thermosetting resin monomers and cured Agent
  • the thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, ethylene glycol dimethacrylate, allyl ester, diallyl phthalate, urethane
  • the curing agent includes at least one of tert-butyl peroxyneodecanoate, isophorone diamine, ethylene diamine, and methylene biscyclohexanamine.
  • the first molding method is injection molding
  • the second molding method is cast molding
  • the method includes:
  • thermosetting resin glue Inject a third thermosetting resin glue into the gap between the first conductive layer and the third conductive layer
  • thermosetting resin glue is cured to obtain a second conductive layer.
  • the second mold has a connected second mold cavity and a groove, the groove is arranged around the outer periphery of the second mold cavity, and the first conductive layer and the third mold cavity are connected to each other.
  • the conductive layer is spaced in the second mold and includes:
  • thermosetting resin glue solution between the first conductive layer and the third conductive layer includes:
  • thermosetting resin glue is injected into the gap and the groove between the first conductive layer and the third conductive layer.
  • arranging the first conductive layer and the third conductive layer in the second mold at intervals includes:
  • the first conductive layer and the third conductive layer are spaced apart from each other in the second mold, so that the width of the gap between the first conductive layer and the third conductive layer is 0.01 mm to 0.1 mm.
  • the first conductive layer and the third conductive layer are both thermoplastic resin layers, and the thermoplastic resin layer includes polycarbonate;
  • the third thermosetting resin glue includes a thermosetting resin monomer and a curing agent,
  • the thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, ethylene glycol dimethacrylate, allyl ester, diallyl phthalate, and urethane.
  • the curing agent includes at least one of tert-butyl peroxyneodecanoate, isophorone diamine, ethylene diamine, and methylene biscyclohexanamine.
  • this application provides an augmented reality device, which includes:
  • a projection light engine is used to project light signals, the light signals include image information;
  • the optical waveguide plate according to the first aspect of this application is used to transmit the optical signal.
  • Augmented reality is a technology that provides users with enhanced reality perception by superimposing computer-generated image input onto real-world images and inputting it to the human eye. It is currently being used more and more widely.
  • Optical waveguide is a media device that guides light waves to propagate in it.
  • optical waveguides can guide the light projected by a micro projector to the front of the glasses, superimposing a virtual image on top of the real image in front of the human eye, which has the function of augmented reality.
  • diffractive optical waveguides light of different wavelengths and different fields of view often have different diffraction angles. This diffraction angle is generally the propagation angle of light in the optical waveguide.
  • different propagation angles correspond to different exit pupil densities of light and different grating action times. This results in a difference in energy of the final emitted light, which affects the uniformity of efficiency and color distribution within the field of view of the optical waveguide. And as the field of view increases, this difference will become more obvious, and efficiency uniformity and color distribution will be further degraded.
  • an embodiment of the present application provides an optical waveguide plate 100 , which includes a light conductive part 10 and a grating part 30 .
  • the light conductive part 10 includes a first conductive layer 11, a second conductive layer 13 and a third conductive layer 15 that are stacked in sequence.
  • the refractive index of the first conductive layer 11 is greater than the refractive index of the second conductive layer 13.
  • the refractive index of the third conductive layer 15 is greater than the refractive index of the second conductive layer 13 .
  • the grating part 30 includes a light coupling part 31 and a light coupling part 33 .
  • the light coupling part 31 and the light coupling part 33 are spaced apart from the first conductive layer 11 away from the second conductive layer 13 . surface.
  • the light coupling part 31 is a coupling grating
  • the light coupling part 33 is a coupling grating.
  • the optical coupling part 31 is used to receive the optical signal entering the optical waveguide 100 and couple the optical signal into the optical conductive part 10 (ie, the first conductive layer 11, the second conductive layer 13 and the third conductive layer 15 ), the first conductive layer 11, the second conductive layer 13 and the third conductive layer 15 are used to transmit the optical signal;
  • the optical coupling part 33 is used to receive the first conductive layer 11, the second conductive layer 11 and the third conductive layer 15.
  • the optical signals transmitted by the conductive layer 13 and the third conductive layer 15 couple the optical signals out of the optical waveguide 100 .
  • the optical waveguide sheet 100 in the embodiment of the present application includes a light conductive part 10.
  • the light conductive part 10 includes a first conductive layer 11, a second conductive layer 13 and a third conductive layer 15 that are stacked in sequence;
  • the refractive index is greater than the refractive index of the second conductive layer 13, and the refractive index of the third conductive layer 15 is greater than the refractive index of the second conductive layer 13, which makes
  • the incident light of different fields of view or the light of different wavelengths propagates in different conductive layers in the optical waveguide sheet 100 after being diffracted by the coupling grating, so that the exit pupil density of the light of different wavelengths or the diffracted light of different fields of view can be adjusted, so that The ratio of the exit pupil density is controlled in a smaller range, which increases the degree of freedom in the design of the optical waveguide plate 100.
  • the uniformity and diffraction image of the optical waveguide plate 100 can be improved.
  • the first conductive layer 11 , the second conductive layer 13 , the third conductive layer 15 and the grating part 30 are an integral structure. It can be understood that the first conductive layer 11 , the second conductive layer 13 , the third conductive layer 15 and the grating part 30 are connected in sequence to form an integrated structure. It can also be understood that the first conductive layer 11 , the second conductive layer 13 , the third conductive layer 15 , the coupling grating part 30 and the coupling grating part 30 are an integral structure.
  • the one-piece structure can omit the lamination process between each resin layer, thereby avoiding misalignment problems caused by lamination.
  • the refractive index of the first conductive layer 11 is equal to the refractive index of the third conductive layer 15, compared to the case where the refractive index of the first conductive layer 11 and the third conductive layer 15 are unequal, so that the first conductive layer 11 and the third conductive layer 15 only need to be prepared using the same material and formula, which can simplify the raw material preparation process and reduce the preparation cost of the optical waveguide 100.
  • the refractive index of the first conductive layer 11 is the same as that of the third conductive layer 11
  • the refractive index of 15 is equal, the optical waveguide plate 100 produced has better display effect.
  • the refractive index n1 of the first conductive layer 11 ranges from 1.55 to 2.0.
  • the refractive index n1 of the first conductive layer 11 may be, but is not limited to, 1.55, 1.6, 1.65, 1.7, 1.75, 1.8, 1.85, 1.9, 1.95, 2.0, etc. If the refractive index of the first conductive layer 11 is too small, the field of view (FOV) of the optical waveguide 100 produced is too small, and if the refractive index of the first conductive layer 11 is too large, it is difficult to achieve it with current resin materials and processes.
  • FOV field of view
  • the refractive index n2 of the second conductive layer 13 ranges from 1.35 to 1.6.
  • the refractive index n2 of the second conductive layer 13 may be, but is not limited to, 1.35, 1.4, 1.45, 1.5, 1.55, 1.6, etc. If the refractive index of the second conductive layer 13 is too small, it is difficult to achieve it with current resin materials and processes; if the refractive index of the second conductive layer 13 is too large, the refractive index of the second conductive layer 13 will be close to that of the first conductive layer 11 or the third conductive layer. Layer 15 is not conducive to improving the uniformity of the diffraction image of the optical waveguide plate 100.
  • the refractive index n3 of the third conductive layer 15 ranges from 1.55 to 2.0.
  • the refractive index n3 of the third conductive layer 15 may be, but is not limited to, 1.55, 1.6, 1.65, 1.7, 1.75, 1.8, 1.85, 1.9, 1.95, 2.0, etc.
  • the refractive index of the third conductive layer 15 is too small, and the field of view (FOV) of the optical waveguide 100 is too small.
  • the refractive index of the third conductive layer 15 is too high, which is difficult to achieve with current resin materials and processes.
  • the thickness of the first conductive layer 11 is greater than that of the second conductive layer 13
  • the thickness of the third conductive layer 15 is greater than the thickness of the second conductive layer 13 . This can better improve the uniformity of the diffraction pattern of the optical waveguide plate 100 .
  • the thickness h 1 of the first conductive layer 11 is equal to the thickness h 1 of the third conductive layer 11 .
  • the ratio h 1 /h 2 of the thickness h 2 of the two conductive layers 13 is in the range of 7:1 ⁇ h 1 /h 2 ⁇ 10:1; specifically, the thickness h 1 of the first conductive layer 11 and the thickness h 1 of the first conductive layer 13 are in the range of 7:1 ⁇ h 1 /h 2 ⁇ 10:1.
  • the ratio h 1 /h 2 of the thickness h 2 of the second conductive layer 13 may be, but is not limited to, 7:1, 7.5:1, 8:1, 8.5:1, 9:1, 9.5:1, or 10:1. If the ratio of the thickness h 1 of the first conductive layer 11 to the thickness h 2 of the second conductive layer 13 is too large or too small, the uniformity of the diffraction image will be reduced, and it is impossible to improve the uniformity of the diffraction image of the optical waveguide plate 100 . Effect.
  • the thickness h 1 of the first conductive layer 11 ranges from 0.2 mm ⁇ h 1 ⁇ 3mm.
  • the thickness of the first conductive layer 11 may be, but is not limited to, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.2mm, 1.5mm, 1.8mm, 2.0mm, 2.2mm, 2.5mm, 2.8mm, 3mm, etc. If the thickness of the first conductive layer 11 is too thick, the weight of the produced optical waveguide sheet 100 will be too heavy. If the thickness of the first conductive layer 11 is too thin, the first conductive layer 11 will be too soft and easily deformed or bent, affecting the optical waveguide. The display effect of slice 100 images.
  • the thickness h 2 of the second conductive layer 13 ranges from 0.01 mm ⁇ h 2 ⁇ 0.1mm; specifically, the thickness of the second conductive layer 13 can be, but is not limited to, 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, 0.06mm, 0.07mm, 0.08mm, 0.09mm, 1.0 mm etc.
  • the thickness of the second conductive layer 13 is too thick. When the light passes through the second conductive layer 13, the optical path changes too much, making it more difficult for the optical design to achieve the expected goals, which will affect the uniformity of the displayed image.
  • the thickness of the second conductive layer 13 is too thin.
  • the structure of the light conductive part 10 is close to the structure in which the first conductive layer 11 and the third conductive layer 15 are bonded together, and the effect on improving the uniformity of the diffraction image is not good.
  • the thickness h 3 of the third conductive layer is equal to the thickness h 3 of the second conductive layer 15 .
  • the ratio h 3 /h 2 of the thickness h 2 of the conductive layer is in the range of 10 ⁇ h 3 /h 2 ⁇ 14:1; specifically, the thickness h 3 of the third conductive layer 15 and the thickness h 3 of the second conductive layer 13
  • the ratio of thickness h 2 h 3 /h 2 can be but is not limited to 10:1, 10.5:1, 11:1, 11.5:1, 12:1, 12.5:1, 13:1, 13.5:1, 14 :1.
  • the ratio h 3 /h 2 of the thickness h 3 of the third conductive layer 15 to the thickness h 2 of the second conductive layer 13 is too large or too small, the uniformity of the diffraction image will be reduced, and it is impossible to improve the optical waveguide plate. 100% effect on diffraction image uniformity.
  • the thickness h 3 of the third conductive layer 15 ranges from 0.2 mm ⁇ h 3 ⁇ 3mm.
  • the thickness of the third conductive layer 15 may be, but is not limited to, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.2mm, 1.5mm, 1.8 mm, 2.0mm, 2.2mm, 2.5mm, 2.8mm, 3mm, etc. If the thickness of the third conductive layer 15 is too thick, the weight of the produced optical waveguide sheet 100 will be too heavy. If the thickness of the third conductive layer 15 is too thin, the third conductive layer 15 will be too soft and easily deformed or bent, affecting the optical waveguide. The display effect of slice 100 images.
  • the thickness h 1 of the first conductive layer 11 is 0.4 mm; the thickness h 2 of the second conductive layer is 0.05 mm; and the thickness h 3 of the third conductive layer is 0.4 mm.
  • the thickness of the second conductive layer 13 is much smaller than the thickness of the first conductive layer 11 and the third conductive layer 15 . Therefore, the thickness of the second conductive layer 13 can be ignored. Then the optical waveguide plate satisfies the following requirements: Relationship:
  • n 2 is the refractive index of the first conductive layer
  • ⁇ 1 is when the light conductive part is a single layer
  • the thickness is h 1 + h 3
  • the refractive index is n 1
  • the light is vertically incident on the optical waveguide sheet
  • ⁇ 2 is the diffraction angle of light in the optical waveguide plate.
  • the optical waveguide plate 100 When the optical waveguide plate 100 satisfies the above relational expression, the uniformity of the diffraction image of the optical waveguide plate 100 can be better improved, and the optical efficiency of the optical waveguide plate 100 can be improved.
  • the first conductive layer 11, the second conductive layer 13, and the third conductive layer 15 are all resin layers.
  • the optical waveguide plate 100 of the present application is made of resin, is lighter in weight, has better resistance to falling, and has low manufacturing cost.
  • the first conductive layer 11 and the third conductive layer 15 are both thermosetting resin layers, and the second conductive layer 13 is a thermoplastic resin layer. In other embodiments, the first conductive layer 11 and the third conductive layer 15 are both thermoplastic resin layers, and the second conductive layer 13 is a thermosetting resin layer.
  • the thermoplastic resin layer may include, but is not limited to, polycarbonate (PC).
  • the thermosetting resin layer is obtained by curing the thermosetting resin glue.
  • the thermosetting resin glue includes thermosetting resin monomers and curing agents.
  • the thermosetting resin monomers include propylene carbonate, allyl diglycol carbonate, acrylonitrile, ethylene glycol dimethacrylate, allyl ester, and phthalate. At least one of diallyl acid, urethane, etc.
  • the curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like.
  • the thermosetting resin glue also includes at least one of a release agent, an antioxidant, and the like.
  • the refractive index of the first conductive layer 11 and the third conductive layer 15 can be adjusted by adding a refractive index adjuster with a high refractive index, such as a white metal oxide, such as titanium dioxide or titanium dioxide, into the thermosetting resin layer or the thermoplastic resin layer. Zirconia, etc.
  • a refractive index adjuster with a high refractive index such as a white metal oxide, such as titanium dioxide or titanium dioxide
  • a white metal oxide such as titanium dioxide or titanium dioxide
  • the first conductivity can be adjusted.
  • the optical waveguide plate 100 in the embodiment of the present application can be prepared by the method described in the following embodiments of the present application. In addition, it can also be prepared by other methods.
  • the preparation method of the embodiment of the present application is only one part of the optical waveguide plate 100 of the present application. One or more preparation methods should not be understood as limiting the optical waveguide plate 100 provided in the embodiments of the present application.
  • an embodiment of the present application provides a method for preparing an optical waveguide plate 100 .
  • the optical waveguide plate 100 includes a light conductive part 10 and a grating part 30 .
  • the light conductive part 10 includes a first layer arranged in a stacked manner.
  • the conductive layer 11, the second conductive layer 13 and the third conductive layer 15, the refractive index of the first conductive layer 11 is greater than the refractive index of the second conductive layer 13, and the refractive index of the third conductive layer 15 is greater than The refractive index of the second conductive layer 13;
  • the grating portion 30 is disposed on the surface of the first conductive layer 11 facing away from the second conductive layer 13; the method includes:
  • S203 use a first molding method to form the third conductive layer 15; wherein the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is the same as the above.
  • the second molding method is different.
  • S201, S202 and S203 there is no order between S201, S202 and S203.
  • the order between S201, S202 and S203 can be adjusted according to the difference between the first molding method and the second molding method.
  • the method is illustrated in the order of S201, S202, and S203 and should not be understood as limiting the scope of protection of the present application.
  • the grating part 30 includes a light coupling part 31 and a light coupling part 33 , and the light coupling part 31 and the light coupling part 33 are spaced apart on the surface of the first conductive layer 11 away from the second conductive layer 13 .
  • the optical waveguide 100 produced by the method for preparing the optical waveguide 100 according to the embodiment of the present application includes a light conductive part 10.
  • the light conductive part 10 includes a first conductive layer 11, a second conductive layer 13 and a third conductive layer that are stacked in sequence.
  • the refractive index of the first conductive layer 11 is greater than the refractive index of the second conductive layer 13, and the refractive index of the third conductive layer 15 is greater than the refractive index of the second conductive layer 13, which makes different fields of view incident
  • Light of different wavelengths or light of different wavelengths propagates in different resin layers in the optical waveguide sheet 100 after being coupled into the grating and diffracted, so that the exit pupil density of light of different wavelengths or diffracted light of different fields of view can be adjusted, so that the exit pupil density can be adjusted. Controlling the ratio in a smaller range increases the degree of freedom in the design of the optical waveguide plate 100.
  • the uniformity of the diffraction image of the optical waveguide plate 100 can be improved and the optical efficiency can be improved.
  • the optical waveguide plate 100 of the present application is made of resin, is lighter in weight, and has better resistance to falling. power and low preparation cost.
  • the first conductive layer 11, the second conductive layer 13, the third conductive layer 15 and the grating part 30 of the optical waveguide sheet 100 produced in this application have an integrated structure.
  • the first conductive layer 11, the second conductive layer 13 and the third conductive layer There is no need to laminate two layers 15, which eliminates the lamination process and can also avoid misalignment caused by the lamination process.
  • the preparation method of the present application alternates injection molding and pouring molding processes, so that the surfaces of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 can all achieve optical-level flatness. .
  • the first molding method is casting molding
  • the second molding method is injection molding.
  • the method for preparing the optical waveguide sheet 100 provided in the embodiment of the present application includes:
  • the first mold 100a includes a first sub-mold 10a and a second sub-mold 30a.
  • the first sub-mold 10a and the second sub-mold 30a are enclosed together.
  • the first mold cavity 301a, the first sub-mold 10a has a grating texture 11a facing the first mold cavity 301a, the grating texture 11a is complementary to the structure of the grating part 30.
  • the term "structurally complementary" in this application means that when two structurally complementary components are fitted together, the protrusions of one component exactly fill the grooves of the other component and are arranged in close contact with each other.
  • the surface of the second sub-mold 30a has the grating texture 11a
  • the surface of the second sub-mold 30a has the grating texture 11a and the first sub-mold 10a enclose the first mold cavity 301a
  • the grating texture 11a includes a coupling grating texture 111a and a coupling grating texture 113a.
  • the coupling grating texture 111a is complementary to the structure of the light coupling part 31
  • the coupling grating texture 113a is complementary to the structure of the light coupling part 33.
  • the first thermosetting resin glue may include a thermosetting resin monomer and a curing agent.
  • the thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, urethane, etc.
  • the curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like.
  • the first thermosetting resin glue further includes at least one of a release agent, an antioxidant, and the like.
  • the first thermosetting resin glue further includes a refractive index adjuster, and the refractive index adjuster includes at least one of titanium dioxide or zirconium dioxide, so that the first conductive layer 11 has a higher refractive index.
  • thermosetting resin monomer curing agent, release agent, antioxidant, refractive index adjuster, etc. are stirred evenly, vacuum degassing is performed under vacuum conditions to remove dissolved air in the material, and degassing is completed. Backup.
  • the first thermosetting resin glue solution is prepared through the following steps: weigh 10g propylene carbonate, 5g allyl diglycol carbonate, 4.8g urethane, and 0.5g isophorone respectively. Diamine, 0.3g methylene biscyclohexylamine, 0.01g glyceryl monooleate, 0.01g di-tert-butyl-p-cresol, stir and mix evenly; defoaming under 100Pa vacuum conditions for 20 minutes.
  • the first thermosetting resin glue liquid is heated (for example, heated to 70°C to 120°C) to cause a polymerization reaction between the thermosetting resin monomer and the curing agent to form a thermosetting resin layer, that is, the first part of the integrated structure.
  • Conductive layer 11 and grating portion 30 are examples of the first thermosetting resin glue liquid.
  • the first thermosetting resin glue solution is gradually heated from room temperature to 80°C in 4 hours; the temperature is maintained at 80°C for 5 hours; and the first thermosetting resin glue solution is gradually heated from 80°C to 100°C in 3 hours; In 2 hours, gradually heat the first thermosetting resin glue solution from 100°C to 120°C; keep it at 120°C for 7 hours; and in 2 hours, gradually lower the temperature to 50°C.
  • the first sub-mold 10a is positioned below the second sub-mold 30a in the direction of gravity, and the first thermosetting resin glue is solidified, so as to Obtain the first conductive layer 11 and grating part 30.
  • the thermosetting resin glue undergoes a polymerization reaction and solidifies, volume shrinkage occurs, so that the first sub-mold 10a with the grating texture 11a is located under the gravity of the second sub-mold 30a without the grating texture 11a. This can better obtain the The grating part 30 with the preset structure will not cause any error between the grating texture 11a and the preset structure due to volume shrinkage.
  • thermoplastic resin such as polycarbonate is used to form the second conductive layer 13 on the surface of the first conductive layer 11 away from the grating part 30 by high-pressure injection molding.
  • the temperature during injection molding of polycarbonate is around 250°C, which is far lower than the softening or deformation temperature of the thermosetting resin layer. Therefore, when the second conductive layer 13 is injected, the first conductive layer 11 can still maintain its original shape. Film layer structure, surface flatness will not be affected by injection molding.
  • the reason why the second conductive layer 13 is not prepared by casting is because the raw material for casting is thermosetting resin glue.
  • the surface of the second conductive layer 13 is uneven and needs to be polished to achieve optical flatness.
  • the thickness of the second conductive layer 13 itself is only 0.01mm to 0.1mm. Therefore, it is very easy to be consumed during the polishing process, making it difficult to control the second conductive layer 13 .
  • the thickness of the conductive layer 13. Therefore, high-pressure injection molding is required to ensure that the surface of the second conductive layer 13 away from the first conductive layer 11 can maintain optical-level flatness without polishing.
  • the second thermosetting resin glue may include a thermosetting resin monomer and a curing agent.
  • the thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, urethane, etc.
  • the curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like.
  • the second thermosetting resin glue further includes at least one of a release agent, an antioxidant, and the like.
  • the second thermosetting resin glue further includes at least one of titanium dioxide or zirconium dioxide, so that the third conductive layer 15 has a higher refractive index.
  • thermosetting resin glue For detailed description of other aspects of the second thermosetting resin glue, please refer to the description of the first thermoplastic resin in the above embodiments, which will not be described again here.
  • the second thermosetting resin glue liquid is heated (for example, heated to 70° C. to 120° C.) to cause a polymerization reaction between the thermosetting resin monomer and the curing agent to form a thermosetting resin layer, that is, the third conductive layer 15 .
  • the curing temperature of the thermosetting resin glue is generally between 70°C and 120°C, which is much lower than the second conductive layer 13 (its melting temperature is generally higher than 200°C). Therefore, during the solidification process of the second thermosetting resin glue, The second conductive layer 13 will not soften or deform, and can well maintain the flatness of the surface of the second conductive layer 13 .
  • the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 cannot all be prepared by injection molding. Therefore, when the second conductive layer 13 is injected on the first conductive layer 11, since the injection temperature is above the melting temperature of the thermoplastic resin, if the second conductive layer 13 is injected on the surface of the first conductive layer 11, the molten thermoplastic resin will contact After reaching the first conductive layer 11, the surface of the first conductive layer 11 will soften, so that the flatness of the contact surface between the first conductive layer 11 and the second conductive layer 13 cannot be maintained. The interface between the layers 13 changes and the optical level flatness is no longer maintained.
  • the second conductive layer 13 in this embodiment is a thermosetting resin layer.
  • the temperature when the second conductive layer 13 is formed is relatively low, so the interface between the first conductive layer 11 and the second conductive layer 13 will not change. ization and can maintain good optical grade flatness.
  • the first molding method is casting molding
  • the second molding method is injection molding.
  • the method for preparing the optical waveguide sheet 100 provided in the embodiment of the present application includes:
  • the first mold 100a includes a first sub-mold 10a and a second sub-mold 30a.
  • the first sub-mold 10a and the second sub-mold 30a enclose a first mold cavity 301a.
  • the first sub-mold 10a has a grating texture 11a facing the first mold cavity 301a, and the grating texture 11a is complementary to the structure of the grating part 30;
  • PV refers to the difference between the highest and lowest value on a surface.
  • the PV value is a measure of surface roughness.
  • a polishing machine is used to polish the surface of the first conductive layer 11 facing away from the grating part 30, so that the surface accuracy PV1 of the surface of the first conductive layer 11 facing away from the grating part 30 is PV1 ⁇ 15 nm, so that the surface of the first conductive layer 11 facing away from the grating portion 30 reaches an optical level of flatness.
  • the first thermally fixed resin glue undergoes a polymerization reaction to form the first conductive layer 11, the volume will shrink. Therefore, the surface of the formed first conductive layer 11 away from the grating portion 30 will be uneven. Therefore, it is necessary to conduct the first conductive layer 11.
  • the surface of the layer 11 facing away from the grating part 30 is polished so that the surface of the first conductive layer 11 facing away from the grating part 30 can reach optical grade flatness, so that the manufactured optical waveguide plate 100 has better image display effect.
  • a polishing machine is used to polish the surface of the third conductive layer 15 facing away from the second conductive layer 13, so that the surface precision PV1 of the surface of the third conductive layer 15 facing away from the second conductive layer 13 is PV1. ⁇ 15 nm, so that the surface of the third conductive layer 15 facing away from the second conductive layer 13 reaches an optical level of flatness. Since the volume of the second heat-fixing resin glue polymerizes to form the third conductive layer 15, the volume will shrink. Therefore, the surface of the formed third conductive layer 15 facing away from the second conductive layer 13 will be uneven.
  • the surface of the third conductive layer 15 facing away from the second conductive layer 13 is polished so that the surface of the third conductive layer 15 facing away from the second conductive layer 13 can reach an optical level of flatness, so that the manufactured The optical waveguide plate 100 has better image display effect.
  • the first molding method is injection molding
  • the second molding method is casting molding
  • the method for preparing the optical waveguide sheet 100 provided in the embodiment of the present application includes:
  • thermoplastic resin such as polycarbonate
  • the first injection mold P and the second injection mold Q using an injection molding method to manufacture the first conductive layer 11 and the grating part 30 of an integrated structure, and the third conductive layer 15 respectively. Since the first conductive layer 11 and the second conductive layer 13 obtained by high-pressure injection molding will not undergo significant volume shrinkage, the first conductive layer 11 and the third conductive layer 15 do not need to be polished.
  • Polycarbonate has a high refractive index, which allows the manufactured optical waveguide plate 100 to have a large field of view (FOV).
  • the thermal deformation temperature of polycarbonate is relatively high, usually about 135°C, higher than 120°C. Therefore, there will be no softening phenomenon when the second conductive layer 13 is formed during pouring and solidification.
  • the second mold 100b has a second mold cavity 101b.
  • the first conductive layer 11 is installed on one side of the second mold cavity 101b of the second mold 100b, and the third conductive layer 11 is installed on one side of the second mold cavity 101b.
  • 15 is installed in the second mold cavity 101b on the side opposite to the first conductive layer 11, so that there is a gap between the first conductive layer 11 and the second conductive layer 13, and at the same time, the first conductive layer 11 is compared with The grating portion 30 is closer to the third conductive layer 15 . In other words, the grating portion 30 is further away from the third conductive layer 15 than the first conductive layer 11 . It can be understood that after the first conductive layer 11 and the third conductive layer 15 are installed, the surface of the first conductive layer 11 facing the third conductive layer 15 is parallel to the surface of the third conductive layer 15 facing the second conductive layer 13 .
  • the width of the gap between the first conductive layer 11 and the third conductive layer 15 that is, the surface of the first conductive layer 11 facing the third conductive layer 15 and the surface of the third conductive layer 15 facing the second conductive layer 13
  • the vertical distance between them ranges from 0.01mm to 0.1mm. In other words, the distance between the first conductive layer 11 and the third conductive layer 15 is adjusted so that the distance between them is the thickness of the second conductive layer 13 .
  • the second mold 100b further has a groove 103b, the groove 103b is arranged around the outer periphery of the second mold cavity 101b, and the groove 103b is connected with the second mold cavity 101b.
  • arranging the first conductive layer 11 and the third conductive layer 15 in the second mold 100b at intervals includes arranging the first conductive layer 11 and the third conductive layer 15 in the second mold 100b at intervals.
  • the gap between the first conductive layer 11 and the third conductive layer 15 is connected to the groove 103b.
  • the groove 103b is disposed at the middle position on the outer circumferential side of the second mold cavity 101b, so that the first conductive layer 11 and the third conductive layer 15 can be disposed behind the second mold cavity 101b, and the first conductive layer
  • the gap formed between the layer 11 and the third conductive layer 15 can better align the groove 103b and communicate with the groove 103b.
  • the gap between the first conductive layer 11 and the third conductive layer 15 is filled with a third thermosetting resin glue.
  • the third thermosetting resin glue may include a thermosetting resin monomer and a curing agent.
  • the thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, urethane, etc.
  • the curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like.
  • the method further includes injecting a third thermosetting resin glue into the groove 103b.
  • the third thermosetting resin glue is injected into the gap between the first conductive layer 11 and the third conductive layer 15 and into the groove 103b.
  • thermosetting resin glue undergoes a polymerization reaction and solidifies, volume shrinkage occurs, and the gap between the first layer and the third layer is small.
  • the third thermosetting resin glue is also injected into the groove 103b, so that in the third layer
  • a certain amount of the third thermosetting resin glue i.e., the third thermosetting resin glue in the groove 103b
  • the third thermosetting resin glue in the groove 103b can be extracted from the groove 103b through the action of capillary force. will flow into the gap between the first conductive layer 11 and the third conductive layer 15 under the action of capillary force), so that the first conductive layer 11 and the third conductive layer 15 always maintain a filled state.
  • Undesirable phenomena such as insufficient filling or delamination occur between the conductive layer 11 and the third conductive layer 15 .
  • thermosetting resin glue For detailed description of other aspects of the third thermosetting resin glue, please refer to the description of the first thermoplastic resin in the above embodiments, which will not be described again here.
  • the third thermosetting resin glue liquid is heated (for example, heated to 70°C to 120°C) to cause a polymerization reaction between the thermosetting resin monomer and the curing agent to form a thermosetting resin layer, that is, the second conductive layer 13 .
  • an embodiment of the present application also provides an augmented reality device 500, which includes: a projection light machine 510 and the optical waveguide sheet 100 of the present application.
  • the projection light engine 510 is used to project light signals, and the light signals include image information;
  • the optical waveguide plate 100 is disposed on the exit surface of the projection light engine 510 and is used to transmit the light signals. It can be understood that the grating portion 30 of the optical waveguide plate 100 is arranged away from the projection light machine 510 .
  • the projection light machine 510 includes a display 511 and a lens 513.
  • the display 511 is used to emit light signals
  • the lens 513 is provided on the display surface side of the display 511 to modulate the light signals, so that the light rays (light signals) of different viewing angles emitted from the same pixel point on the display 511 pass through
  • the lens 513 emits in the form of parallel light to place the image information in the optical signal at an infinite distance so that it can be viewed by the naked eye.
  • the optical waveguide 100 is disposed on the side of the lens 513 away from the display 511 and is used for transmitting the optical signal modulated by the lens 513 .
  • the augmented reality device 500 of the present application may be, but is not limited to, near-eye display devices such as augmented reality glasses (AR glasses), augmented reality helmets, and augmented reality masks.
  • near-eye display devices such as augmented reality glasses (AR glasses), augmented reality helmets, and augmented reality masks.
  • display 511 may be a microdisplay.
  • the display 511 includes a light emitting unit, which may include, but is not limited to, a micro light emitting diode (Micro Light Emitting Diode, Micro LED) chip, a micro organic light emitting diode (Micro Organic Light-Emitting Diode, Micro OLED) chip or a micro liquid crystal display ( At least one of Micro liquid crystal display, Micro LCD).
  • a micro light emitting diode Micro Light Emitting Diode, Micro LED
  • Micro OLED Micro Organic Light-Emitting Diode
  • Micro LCD At least one of Micro liquid crystal display, Micro LCD.
  • the brightness of Micro OLED is usually less than 5000nits
  • the brightness of LCD is usually less than 15000nits
  • the brightness of Micro LED can reach 2000000nits, which is much higher than the former two.
  • Micro LED displays are self-illuminating light sources and have better contrast and smaller display delays when applied to the augmented reality device 500.
  • the area on the display surface that can emit light signals becomes the effective light-emitting area.
  • the diagonal size of the effective light-emitting area of the display 511 ranges from 0.11 inch to 0.15 inch, and the effective light-emitting area aspect ratio is 4:3. In other embodiments, the diagonal size of the effective light-emitting area of the display 511 ranges from 0.17 inch to 0.21 inch, and the effective light-emitting area aspect ratio is 16:9.
  • the color of the light emitted by the display 511 may be, but is not limited to, at least one of red light, green light, blue light, etc.
  • the display 511 is a Micro LED that emits green light. In other embodiments, it can also be another monochromatic light Micro LED or a multi-color light Micro LED.
  • the optical waveguide 100 can also detect the image information in the optical signal emitted by the lens 513 in one dimension. Or dilate the pupil in two dimensions to increase the range of orbital movement, thereby adapting to more people.
  • the augmented reality device 500 of the present application further includes a carrying member 550 , which is used to carry the optical waveguide sheet 100 .
  • the carrier 550 may be, but is not limited to, a frame of augmented reality glasses, a helmet body of an augmented reality helmet, a mask body of an augmented reality mask, etc.
  • the optical waveguide sheet 100 may be disposed on the carrier 550 through adhesive or fastening parts.
  • the augmented reality device 500 in this embodiment of the present application further includes a wearing piece 530 .
  • the wearing part 530 is rotatably connected to the carrying part 550, and the wearing part 530 is used to hold the wearer (such as a human head or a head prosthesis, etc.).
  • the wearing part 530 includes a first wearing part 531 and a second wearing part 533.
  • the first wearing part 531 is rotatably connected to one end of the carrying part 550
  • the second wearing part 533 is rotatably connected to the carrying part.
  • 550 is away from the other end of the first wearing component 531 .
  • the first wearing component 531 cooperates with the second wearing component 533 to clamp the augmented reality device 500 to the wearer.
  • the first wearing component 531 and the second wearing component 533 are also used to set the projector.
  • both the first wearing component 531 and the second wearing component 533 may be, but are not limited to, temples of the augmented reality device 500 (AR glasses).
  • AR glasses augmented reality device 500
  • the augmented reality device 500 in this embodiment of the present application also includes a processor 540 and a memory 560.
  • the processor 540 is electrically connected to the display 511 and is used to control the display 511 to emit light signals containing image information, etc.
  • the memory 560 is electrically connected to the processor 540 and is used to store program codes required for the operation of the processor 540, program codes required for controlling the display 511, image information emitted by the display 511, etc.
  • the processor 540 includes one or more general-purpose processors, where the general-purpose processor can be any type of device capable of processing electronic instructions, including a central processing unit (Central Processing Unit, CPU), a microprocessor, a microprocessor, Controllers, main processors, controllers, ASICs, etc.
  • the processor 540 is used to execute various types of digital storage instructions, such as software or firmware programs stored in the memory 560, which can enable the computing device to provide a wide variety of services.
  • the memory 560 may include volatile memory (Volatile Memory), such as random access memory (Random Access Memory, RAM); the memory 560 may also include non-volatile memory (Non-Volatile Memory, NVM), such as Read-Only Memory (ROM), Flash Memory (FM), Hard Disk Drive (HDD) or Solid-State Drive (SSD). Memory 560 may also include a combination of the types of memory described above.
  • volatile memory such as random access memory (Random Access Memory, RAM
  • NVM non-volatile Memory
  • ROM Read-Only Memory
  • FM Flash Memory
  • HDD Hard Disk Drive
  • SSD Solid-State Drive
  • Memory 560 may also include a combination of the types of memory described above.
  • the augmented reality device 500 in this embodiment is only a form of the augmented reality device 500 applied to the optical waveguide sheet 100, and should not be understood as a limitation of the augmented reality device 500 provided in this application.

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Abstract

The present application provides an optical waveguide sheet and a manufacturing method therefor, and an augmented reality device. The optical waveguide sheet comprises: a light conduction portion, the light conduction portion comprising a first conduction layer, a second conduction layer, and a third conduction layer which are sequentially stacked, wherein the refractive index of the first conduction layer is greater than that of the second conduction layer, and the refractive index of the third conduction layer is greater than that of the second conduction layer; and a grating portion, the grating portion comprising a light in-coupling portion and a light out-coupling portion, and the light in-coupling portion and the light out-coupling portion being spaced apart on the surface of the first conduction layer facing away from the second conduction layer. Diffraction patterns of the optical waveguide sheet of the present application have better uniformity, so that a better display effect is achieved.

Description

光波导片、其制备方法及增强现实设备Optical waveguide plate, preparation method thereof and augmented reality device 技术领域Technical field
本申请涉及电子领域,具体涉及一种光波导片、其制备方法及增强现实设备。The present application relates to the field of electronics, and specifically to an optical waveguide plate, its preparation method and an augmented reality device.
背景技术Background technique
增强现实(augmented reality,AR)技术,可以将虚拟与现实结合,目前得到了越来越广泛的应用。在衍射光波导片中,往往不同波长、不同视场的光线拥有不同的衍射角度,这个衍射角度一般就是光线在光波导片的光波导片中的传播角度。衍射角度越大,在一个周期内,光线在光波导片内的很想传播距离也越大,其对应的出瞳密度也将越小。在单层光波导片中,不同的传播角度对应着不同的光线的出瞳密度和不同的光栅作用次数。这样使得最终出射的光线能量的差异,从而影响光波导片视场内效率的均匀性和色彩分布。并且随着视场的增大,这种差异将会愈发明显,效率均匀性和色彩分布将会进一步劣化。Augmented reality (AR) technology can combine virtuality and reality, and is currently being used more and more widely. In diffractive optical waveguides, light of different wavelengths and different fields of view often have different diffraction angles. This diffraction angle is generally the propagation angle of light in the optical waveguide. The greater the diffraction angle, the greater the propagation distance of light in the optical waveguide within one cycle, and the corresponding exit pupil density will be smaller. In a single-layer optical waveguide, different propagation angles correspond to different exit pupil densities of light and different grating action times. This results in a difference in energy of the final emitted light, which affects the uniformity of efficiency and color distribution within the field of view of the optical waveguide. And as the field of view increases, this difference will become more obvious, and efficiency uniformity and color distribution will be further degraded.
发明内容Contents of the invention
本申请第一方面实施例提供了一种光波导片,其包括:The first embodiment of the present application provides an optical waveguide plate, which includes:
光传导部,所述光传导部包括依次层叠设置的第一传导层、第二传导层及第三传导层;所述第一传导层的折射率大于所述第二传导层的折射率,且所述第三传导层的折射率大于所述第二传导层的折射率;以及The light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence; the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and The refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; and
光栅部,所述光栅部包括光耦入部及光耦出部,所述光耦入部及所述光耦出部间隔设置于所述第一传导层背离所述第二传导层的表面。The grating part includes a light coupling part and a light coupling part, and the light coupling part and the light coupling part are spaced apart on the surface of the first conductive layer facing away from the second conductive layer.
本申请第二方面实施例提供了一种光波导片的制备方法,所述光波导片包括光传导部及光栅部,所述光传导部包括依次层叠设置的第一传导层、第二传导层及第三传导层,所述第一传导层的折射率大于所述第二传导层的折射率,且所述第三传导层的折射率大于所述第二传导层的折射率;所述光栅部设置于所述第一传导层背离所述第二传导层的表面;所述方法包括:A second embodiment of the present application provides a method for preparing an optical waveguide sheet. The optical waveguide sheet includes a light conductive part and a grating part. The light conductive part includes a first conductive layer and a second conductive layer that are stacked in sequence. and a third conductive layer, the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and the refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; the grating The method includes:
采用第一成型方法形成第一传导层及光栅部;Using the first molding method to form the first conductive layer and the grating part;
采用第二成型方法形成第二传导层;以及using a second forming method to form the second conductive layer; and
采用第一成型方法形成第三传导层;其中,所述第一成型方法为注塑成型或浇注成型,所述第二成型方法为注塑成型或浇注成型,所述第一成型方法与所述第二成型方法不同。The third conductive layer is formed using a first molding method; wherein the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is the same as the second molding method. The molding methods are different.
本申请第三方面实施例提供一种增强现实设备,其特征在于,包括:A third embodiment of the present application provides an augmented reality device, which is characterized by including:
投影光机,所述投影光机用于投射光信号,所述光信号包括图像信息;以及A projection light engine, the projection light engine is used to project light signals, the light signals include image information; and
本申请实施例所述的光波导片,所述光波导片用于将所述光信号进行传输。The optical waveguide sheet described in the embodiment of the present application is used to transmit the optical signal.
附图说明Description of the drawings
为了更清楚地说明本申请实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required to be used in the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, other drawings can also be obtained based on these drawings without exerting creative efforts.
图1是本申请一实施例的光波导片的俯视结构示意图。FIG. 1 is a schematic top structural view of an optical waveguide plate according to an embodiment of the present application.
图2是本申请一实施例的光波导片沿图1中A-A方向的剖视结构示意图。 FIG. 2 is a schematic cross-sectional structural view of the optical waveguide plate along the direction AA in FIG. 1 according to an embodiment of the present application.
图3是本申请一实施例的光波导片的光路示意图。Figure 3 is a schematic diagram of an optical path of an optical waveguide plate according to an embodiment of the present application.
图4是本申请一实施例的光波导片的制备方法流程示意图。Figure 4 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to an embodiment of the present application.
图5是本申请又一实施例的光波导片的制备方法流程示意图。Figure 5 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to another embodiment of the present application.
图6是本申请一实施例的第一模具的结构示意图。Figure 6 is a schematic structural diagram of the first mold according to an embodiment of the present application.
图7是本申请一实施例的光波导片的制备流程的结构示意图。FIG. 7 is a schematic structural diagram of a manufacturing process of an optical waveguide plate according to an embodiment of the present application.
图8是本申请又一实施例的光波导片的制备方法流程示意图。Figure 8 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to another embodiment of the present application.
图9是本申请又一实施例的光波导片的制备方法流程示意图。Figure 9 is a schematic flow chart of a method for manufacturing an optical waveguide plate according to another embodiment of the present application.
图10是本申请一实施例第一传导层与光栅部制备流程结构示意图。FIG. 10 is a schematic structural diagram of the preparation process of the first conductive layer and the grating part according to an embodiment of the present application.
图11是本申请一实施例第三传导层制备流程结构示意图。FIG. 11 is a schematic structural diagram of the third conductive layer preparation process according to an embodiment of the present application.
图12是本申请一实施例第二传导层制备流程结构示意图。FIG. 12 is a schematic structural diagram of the second conductive layer preparation process according to an embodiment of the present application.
图13是本申请一实施例的增强现实设备的结构示意图。Figure 13 is a schematic structural diagram of an augmented reality device according to an embodiment of the present application.
图14是本申请一实施例的增强现实设备沿图13中C-C方向的剖视结构示意图。Figure 14 is a schematic cross-sectional structural diagram of the augmented reality device along the C-C direction in Figure 13 according to an embodiment of the present application.
图15是本申请一实施例的增强现实设备的电路框图。Figure 15 is a circuit block diagram of an augmented reality device according to an embodiment of the present application.
附图标记说明:
100-光波导片,10-光传导部,11-第一传导层,13-第二传导层,15-第三传导层,30-
光栅部,31-光耦入部,33-光耦出部,100a-第一模具,10a-第一子模,11a-光栅纹理,111a-耦入光栅纹理,113a-耦出光栅纹理,30a-第二子模,301a-第一模腔,100b-第二模具,101b-第二模腔,103b-凹槽,500-增强现实设备,510-投影光机,511-显示器,513-镜头,530-佩戴件,531-第一佩戴子件,533-第二佩戴子件,550-承载件,540-处理器,560-存储器。
Explanation of reference symbols:
100-Optical waveguide plate, 10-Light conductive part, 11-First conductive layer, 13-Second conductive layer, 15-Third conductive layer, 30-
Grating part, 31-light coupling part, 33-light coupling part, 100a-first mold, 10a-first sub-mold, 11a-grating texture, 111a-coupling grating texture, 113a-coupling grating texture, 30a- Second sub-mold, 301a-first mold cavity, 100b-second mold, 101b-second mold cavity, 103b-groove, 500-augmented reality equipment, 510-projection machine, 511-display, 513-lens, 530-wearing component, 531-first wearing component, 533-second wearing component, 550-carrying component, 540-processor, 560-memory.
具体实施方式Detailed ways
第一方面,本申请提供一种光波导片,所述光波导片包括:In a first aspect, this application provides an optical waveguide plate, which includes:
光传导部,所述光传导部包括依次层叠设置的第一传导层、第二传导层及第三传导层;所述第一传导层的折射率大于所述第二传导层的折射率,且所述第三传导层的折射率大于所述第二传导层的折射率;以及The light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence; the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and The refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; and
光栅部,所述光栅部包括光耦入部及光耦出部,所述光耦入部及所述光耦出部间隔设置于所述第一传导层背离所述第二传导层的表面。The grating part includes a light coupling part and a light coupling part, and the light coupling part and the light coupling part are spaced apart on the surface of the first conductive layer facing away from the second conductive layer.
可选地,所述第一传导层、所述第二传导层、所述第三传导层及所述光栅部为一体结构。Optionally, the first conductive layer, the second conductive layer, the third conductive layer and the grating part are an integral structure.
可选地,沿所述第一传导层、所述第二传导层及所述第三传导层的层叠方向上,所述第一传导层的厚度大于所述第二传导层的厚度,所述第三传导层的厚度大于所述第二传导层的厚度。Optionally, along the stacking direction of the first conductive layer, the second conductive layer and the third conductive layer, the thickness of the first conductive layer is greater than the thickness of the second conductive layer, and the The thickness of the third conductive layer is greater than the thickness of the second conductive layer.
可选地,沿所述第一传导层、所述第二传导层及所述第三传导层的层叠方向上,所述第一传导层的厚度h1与所述第二传导层的厚度h2的比值h1/h2的范围为7:1≤h1/h2≤10:1;所述第三传导层的厚度h3与所述第二传导层的厚度h2的比值h3/h2的范围为10≤h3/h2≤14:1。Optionally, along the stacking direction of the first conductive layer, the second conductive layer and the third conductive layer, the thickness h 1 of the first conductive layer and the thickness h of the second conductive layer The range of the ratio h 1 /h 2 of 2 is 7:1 ≤ h 1 / h 2 ≤ 10:1; the ratio h 3 of the thickness h 3 of the third conductive layer and the thickness h 2 of the second conductive layer The range of /h 2 is 10≤h 3 /h 2 ≤14:1.
可选地,沿所述第一传导层、所述第二传导层及所述第三传导层的层叠方向上,所述第一传导层的厚度h1的范围为0.2mm≤h1≤3mm,所述第二传导层的厚度h2的范围为0.01mm≤h2≤0.1mm,所述第三传导层的厚度h3的范围为0.2mm≤h3≤3mm。 Optionally, along the stacking direction of the first conductive layer, the second conductive layer and the third conductive layer, the thickness h1 of the first conductive layer ranges from 0.2mm≤h1≤3mm, so The thickness h2 of the second conductive layer is in the range of 0.01mm≤h2≤0.1mm, and the thickness h3 of the third conductive layer is in the range of 0.2mm≤h3≤3mm.
可选地,所述第一传导层的折射率n1等于所述第三传导层的折射率n3Optionally, the refractive index n 1 of the first conductive layer is equal to the refractive index n 3 of the third conductive layer.
可选地,所述光波导片满足以下关系式:Optionally, the optical waveguide plate satisfies the following relationship:
2(h1+h3)tanθ1=2h3×tanθ2;以及2(h 1 +h 3 )tanθ 1 =2h 3 ×tanθ 2 ; and
θ2≥sin-1(n2/n1);θ 2 ≥sin -1 (n 2 /n 1 );
其中,n2为所述第一传导层的折射率,θ1为当光传导部为单层、厚度h=h1+h3、折射率为n1时,光线垂直入射至光波导片,在单层光传导部内的衍射角;θ2为光线在所述光波导片内的衍射角。Among them, n 2 is the refractive index of the first conductive layer, θ 1 is when the light conductive part is a single layer, the thickness h=h 1 + h 3 and the refractive index n 1 , the light is vertically incident on the optical waveguide sheet, The diffraction angle in the single-layer light transmission part; θ 2 is the diffraction angle of light in the optical waveguide plate.
可选地,所述第一传导层的折射率n1的范围为1.55≤n1≤2.0;所述第二传导层的折射率n2的范围为1.35≤n2≤1.6;所述第三传导层的折射率n3的范围为1.55≤n3≤2.0。Optionally, the refractive index n1 of the first conductive layer is in the range of 1.55≤n1≤2.0; the refractive index n2 of the second conductive layer is in the range of 1.35≤n2≤1.6; the refractive index of the third conductive layer is The range of rate n3 is 1.55≤n3≤2.0.
可选地,所述第一传导层与所述第三传导层均为热固性树脂层,所述第二传导层为热塑性树脂层;或者,所述第一传导层与所述第三传导层均为热塑性树脂层,所述第二传导层为热固性树脂层。Optionally, the first conductive layer and the third conductive layer are both thermosetting resin layers, and the second conductive layer is a thermoplastic resin layer; or, the first conductive layer and the third conductive layer are both thermosetting resin layers. is a thermoplastic resin layer, and the second conductive layer is a thermosetting resin layer.
可选地,所述热塑性树脂层包括聚碳酸酯。Optionally, the thermoplastic resin layer includes polycarbonate.
第二方面,本申请提供一种光波导片的制备方法,所述光波导片包括光传导部及光栅部,所述光传导部包括依次层叠设置的第一传导层、第二传导层及第三传导层,所述第一传导层的折射率大于所述第二传导层的折射率,且所述第三传导层的折射率大于所述第二传导层的折射率;所述光栅部设置于所述第一传导层背离所述第二传导层的表面;所述方法包括:In a second aspect, the present application provides a method for preparing an optical waveguide sheet. The optical waveguide sheet includes a light conductive part and a grating part. The light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence. Three conductive layers, the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and the refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; the grating portion is provided On the surface of the first conductive layer facing away from the second conductive layer; the method includes:
采用第一成型方法形成第一传导层及光栅部;Using the first molding method to form the first conductive layer and the grating part;
采用第二成型方法形成第二传导层;以及using a second forming method to form the second conductive layer; and
采用第一成型方法形成第三传导层;其中,所述第一成型方法为注塑成型或浇注成型,所述第二成型方法为注塑成型或浇注成型,所述第一成型方法与所述第二成型方法不同。The third conductive layer is formed using a first molding method; wherein the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is the same as the second molding method. The molding methods are different.
可选地,所述第一成型方法为浇注成型,所述第二成型方法为注塑成型,所述方法包括:Optionally, the first molding method is casting molding, the second molding method is injection molding, and the method includes:
提供第一模具,所述第一模具包括第一子模及第二子模,所述第一子模与所述第二子模围合成第一模腔,所述第一子模具有面向所述第一模腔的光栅纹理,所述光栅纹理与所述光栅部的结构互补;A first mold is provided. The first mold includes a first sub-mold and a second sub-mold. The first sub-mold and the second sub-mold enclose a first mold cavity. The first sub-mold has a surface facing the The grating texture of the first mold cavity, the grating texture is complementary to the structure of the grating part;
在所述第一模腔内注入第一热固性树脂胶液;Inject a first thermosetting resin glue into the first mold cavity;
对所述第一热固性树脂胶液进行固化,得到第一传导层及光栅部;Solidify the first thermosetting resin glue to obtain a first conductive layer and a grating part;
在所述第一传导层背离所述光栅部的表面注塑形成第二传导层;A second conductive layer is formed by injection molding on the surface of the first conductive layer facing away from the grating part;
在所述第二传导层背离所述第一传导层的表面注入第二热固性树脂胶液;以及Inject a second thermosetting resin glue into the surface of the second conductive layer facing away from the first conductive layer; and
对所述第二热固性树脂胶液进行固化,得到第三传导层。The second thermosetting resin glue is solidified to obtain a third conductive layer.
可选地,所述对所述第一热固性树脂胶液进行固化,得到第一传导层及光栅部,包括:Optionally, the first thermosetting resin glue is cured to obtain a first conductive layer and a grating part, including:
沿重力方向上,使第一子模位于第二子模的下方,对所述第一热固性树脂胶液进行固化,以得到第一传导层及光栅部。Along the direction of gravity, the first sub-mold is positioned below the second sub-mold, and the first thermosetting resin glue is solidified to obtain the first conductive layer and the grating portion.
可选地,所述对所述第一热固性树脂胶液进行固化,得到第一传导层及光栅部之后,所述在所述第一传导层背离所述光栅部的表面注塑形成第二传导层之前,所述方法还包括:Optionally, after the first thermosetting resin glue is cured to obtain the first conductive layer and the grating part, the second conductive layer is formed by injection molding on the surface of the first conductive layer facing away from the grating part. Previously, the method also included:
对所述第一传导层背离所述光栅部的表面进行抛光,以使所述第一传导层背离所述光 栅部表面的面精度PV1为PV1≤15nm;The surface of the first conductive layer facing away from the grating portion is polished so that the first conductive layer faces away from the light grating portion. The surface accuracy PV1 of the gate surface is PV1≤15nm;
所述对所述第二热固性树脂胶液进行固化,得到第三传导层之后,所述方法还包括:After the second thermosetting resin glue is cured to obtain the third conductive layer, the method further includes:
对所述第三传导层背离第二传导层的表面进行抛光,以使所述第三传导层背离第二传导层的表面的面精度PV2为PV2≤15nm。The surface of the third conductive layer facing away from the second conductive layer is polished so that the surface precision PV2 of the surface of the third conductive layer facing away from the second conductive layer is PV2≤15 nm.
可选地,所述第二传导层为热塑性树脂层,所述热塑性树脂层包括聚碳酸酯;所述第一热固性树脂胶液和所述第二热固性树脂胶液均包括热固性树脂单体及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯中的至少一种,所述固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺中的至少一种。Optionally, the second conductive layer is a thermoplastic resin layer, and the thermoplastic resin layer includes polycarbonate; the first thermosetting resin glue and the second thermosetting resin glue both include thermosetting resin monomers and cured Agent, the thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, ethylene glycol dimethacrylate, allyl ester, diallyl phthalate, urethane At least one of them, the curing agent includes at least one of tert-butyl peroxyneodecanoate, isophorone diamine, ethylene diamine, and methylene biscyclohexanamine.
可选地,所述第一成型方法为注塑成型,所述第二成型方法为浇注成型;所述方法包括:Optionally, the first molding method is injection molding, and the second molding method is cast molding; the method includes:
采用注塑成型方法制得一体结构的所述第一传导层与光栅部,并制得所述第三传导层;Using an injection molding method to prepare the first conductive layer and the grating part of an integrated structure, and to prepare the third conductive layer;
将所述第一传导层与所述第三传导层间隔设置于第二模具内,并使所述光栅部背离所述第三传导层;Arrange the first conductive layer and the third conductive layer at intervals in the second mold, with the grating portion facing away from the third conductive layer;
在所述第一传导层与所述第三传导层之间的间隙中注入第三热固性树脂胶液;Inject a third thermosetting resin glue into the gap between the first conductive layer and the third conductive layer;
对所述第三热固性树脂胶液进行固化,以得到第二传导层。The third thermosetting resin glue is cured to obtain a second conductive layer.
可选地,所述第二模具具有连通的第二模腔及凹槽,所述凹槽环绕所述第二模腔的外周缘设置,所述将所述第一传导层与所述第三传导层间隔设置于第二模具内,包括:Optionally, the second mold has a connected second mold cavity and a groove, the groove is arranged around the outer periphery of the second mold cavity, and the first conductive layer and the third mold cavity are connected to each other. The conductive layer is spaced in the second mold and includes:
将第一传导层与第三传导层间隔设置于所述第二模腔内,并使所述第一传导层与所述第三传导层之间的间隙连通所述凹槽;Arrange the first conductive layer and the third conductive layer at intervals in the second mold cavity, and connect the gap between the first conductive layer and the third conductive layer to the groove;
所述在所述第一传导层与所述第三传导层之间注入第三热固性树脂胶液,包括:Injecting a third thermosetting resin glue solution between the first conductive layer and the third conductive layer includes:
在所述第一传导层与所述第三传导层之间的间隙以及凹槽内均注入第三热固性树脂胶液。A third thermosetting resin glue is injected into the gap and the groove between the first conductive layer and the third conductive layer.
可选地,所述将所述第一传导层与所述第三传导层间隔设置于第二模具内,包括:Optionally, arranging the first conductive layer and the third conductive layer in the second mold at intervals includes:
将所述第一传导层与所述第三传导层间隔设置于第二模具内,以使所述第一传导层与所述第三传导层之间的间隙的宽度为0.01mm至0.1mm。The first conductive layer and the third conductive layer are spaced apart from each other in the second mold, so that the width of the gap between the first conductive layer and the third conductive layer is 0.01 mm to 0.1 mm.
可选地,所述第一传导层和所述第三传导层均为热塑性树脂层,所述热塑性树脂层包括聚碳酸酯;所述第三热固性树脂胶液包括热固性树脂单体及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯中的至少一种,所述固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺中的至少一种。Optionally, the first conductive layer and the third conductive layer are both thermoplastic resin layers, and the thermoplastic resin layer includes polycarbonate; the third thermosetting resin glue includes a thermosetting resin monomer and a curing agent, The thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, ethylene glycol dimethacrylate, allyl ester, diallyl phthalate, and urethane. At least one, the curing agent includes at least one of tert-butyl peroxyneodecanoate, isophorone diamine, ethylene diamine, and methylene biscyclohexanamine.
第三方面,本申请提供一种增强现实设备,其包括:In a third aspect, this application provides an augmented reality device, which includes:
投影光机,所述投影光机用于投射光信号,所述光信号包括图像信息;以及A projection light engine, the projection light engine is used to project light signals, the light signals include image information; and
本申请第一方面所述的光波导片,所述光波导片用于将所述光信号进行传输。The optical waveguide plate according to the first aspect of this application is used to transmit the optical signal.
为了使本技术领域的人员更好地理解本申请方案,下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。 In order to enable those in the technical field to better understand the solutions of the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only These are part of the embodiments of this application, but not all of them. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of protection of this application.
本申请的说明书和权利要求书及上述附图中的术语“第一”、“第二”等是用于区别不同对象,而不是用于描述特定顺序。此外,术语“包括”和“具有”以及它们任何变形,意图在于覆盖不排他的包含。例如包含了一系列步骤或单元的过程、方法、系统、产品或设备没有限定于已列出的步骤或单元,而是可选地还包括没有列出的步骤或单元,或可选地还包括对于这些过程、方法、产品或设备固有的其他步骤或单元。The terms "first", "second", etc. in the description and claims of this application and the above-mentioned drawings are used to distinguish different objects, rather than describing a specific sequence. Furthermore, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but optionally also includes steps or units that are not listed, or optionally also includes Other steps or units inherent to such processes, methods, products or devices.
下面将结合附图,对本申请实施例中的技术方案进行描述。需要说明的是,为便于说明,在本申请的实施例中,相同的附图标记表示相同的部件,并且为了简洁,在不同实施例中,省略对相同部件的详细说明。The technical solutions in the embodiments of the present application will be described below with reference to the accompanying drawings. It should be noted that, for convenience of description, in the embodiments of the present application, the same reference numerals represent the same components, and for the sake of simplicity, detailed descriptions of the same components in different embodiments are omitted.
增强现实(augmented reality,AR),是一种通过将计算机生成的图像输入叠加到现实世界的图像中输入人眼,以为用户提供增强的现实感知的技术,目前得到了越来越广泛的应用。光波导片(optical waveguide)是引导光波在其中传播的介质装置。作为目前增强现实AR眼镜的主要技术方案,光波导可以将微型投影机投射的光导到眼镜前方,在人眼前方实像之上叠加一个虚像,即具有增强现实的功能。在衍射光波导片中,往往不同波长、不同视场的光线拥有不同的衍射角度,这个衍射角度一般就是光线在光波导片的光波导片中的传播角度。衍射角度越大,在一个周期内,光线在光波导片内的很想传播距离也越大,其对应的出瞳密度也将越小。在单层光波导片中,不同的传播角度对应着不同的光线的出瞳密度和不同的光栅作用次数。这样使得最终出射的光线能量的差异,从而影响光波导片视场内效率的均匀性和色彩分布。并且随着视场的增大,这种差异将会愈发明显,效率均匀性和色彩分布将会进一步劣化。Augmented reality (AR) is a technology that provides users with enhanced reality perception by superimposing computer-generated image input onto real-world images and inputting it to the human eye. It is currently being used more and more widely. Optical waveguide is a media device that guides light waves to propagate in it. As the current main technical solution for augmented reality AR glasses, optical waveguides can guide the light projected by a micro projector to the front of the glasses, superimposing a virtual image on top of the real image in front of the human eye, which has the function of augmented reality. In diffractive optical waveguides, light of different wavelengths and different fields of view often have different diffraction angles. This diffraction angle is generally the propagation angle of light in the optical waveguide. The greater the diffraction angle, the greater the propagation distance of light in the optical waveguide within one cycle, and the corresponding exit pupil density will be smaller. In a single-layer optical waveguide, different propagation angles correspond to different exit pupil densities of light and different grating action times. This results in a difference in energy of the final emitted light, which affects the uniformity of efficiency and color distribution within the field of view of the optical waveguide. And as the field of view increases, this difference will become more obvious, and efficiency uniformity and color distribution will be further degraded.
请参见图1和图2,本申请实施例提供了一种光波导片100,其包括光传导部10以及光栅部30。所述光传导部10包括依次层叠设置的第一传导层11、第二传导层13及第三传导层15,所述第一传导层11的折射率大于所述第二传导层13的折射率,且所述第三传导层15的折射率大于第二传导层13的折射率。所述光栅部30包括光耦入部31及光耦出部33,所述光耦入部31及所述光耦出部33间隔设置于所述第一传导层11背离所述第二传导层13的表面。Referring to FIG. 1 and FIG. 2 , an embodiment of the present application provides an optical waveguide plate 100 , which includes a light conductive part 10 and a grating part 30 . The light conductive part 10 includes a first conductive layer 11, a second conductive layer 13 and a third conductive layer 15 that are stacked in sequence. The refractive index of the first conductive layer 11 is greater than the refractive index of the second conductive layer 13. , and the refractive index of the third conductive layer 15 is greater than the refractive index of the second conductive layer 13 . The grating part 30 includes a light coupling part 31 and a light coupling part 33 . The light coupling part 31 and the light coupling part 33 are spaced apart from the first conductive layer 11 away from the second conductive layer 13 . surface.
可选地,所述光耦入部31为耦入光栅,所述光耦出部33为耦出光栅。光耦入部31用于接收进入所述光波导片100的光信号,将所述光信号耦入光传导部10(即所述第一传导层11、第二传导层13及第三传导层15),所述第一传导层11、第二传导层13及第三传导层15配合用于传输所述光信号;所述光耦出部33用于接收所述第一传导层11、第二传导层13及第三传导层15传输的光信号,将所述光信号耦出所述光波导片100。Optionally, the light coupling part 31 is a coupling grating, and the light coupling part 33 is a coupling grating. The optical coupling part 31 is used to receive the optical signal entering the optical waveguide 100 and couple the optical signal into the optical conductive part 10 (ie, the first conductive layer 11, the second conductive layer 13 and the third conductive layer 15 ), the first conductive layer 11, the second conductive layer 13 and the third conductive layer 15 are used to transmit the optical signal; the optical coupling part 33 is used to receive the first conductive layer 11, the second conductive layer 11 and the third conductive layer 15. The optical signals transmitted by the conductive layer 13 and the third conductive layer 15 couple the optical signals out of the optical waveguide 100 .
如图3所示,使用时,光线从第一传导层11背离第二传导层13的一侧入射。当光线垂直射入光传导部10时,光线在第一传导层11与第二传导层13,以及第三传导层15与第二传导层13之间不会发生全反射,光线可以在第一传导层11与第三传导层15之间进行传播。当光线以一定角度入射如θ时,则光线在第一传导层11与第二传导层13之间发生全反射,光线只能在第一传导层11内传播。入射光线进入光传导部10后,通过两条途径进行传输,从而提高了光波导片100颜色图案的均匀性和提升光效率。As shown in FIG. 3 , during use, light is incident from the side of the first conductive layer 11 away from the second conductive layer 13 . When light perpendicularly enters the light transmission part 10, total reflection of the light will not occur between the first transmission layer 11 and the second transmission layer 13, and between the third transmission layer 15 and the second transmission layer 13. The light can pass through the first transmission layer 10. Propagation occurs between the conductive layer 11 and the third conductive layer 15 . When light is incident at a certain angle such as θ, total reflection occurs between the first conductive layer 11 and the second conductive layer 13 , and the light can only propagate within the first conductive layer 11 . After the incident light enters the light transmission part 10, it is transmitted through two paths, thereby improving the uniformity of the color pattern of the optical waveguide sheet 100 and improving the light efficiency.
本申请实施例的光波导片100包括光传导部10,光传导部10包括依次层叠设置的第一传导层11、第二传导层13及第三传导层15;所述第一传导层11的折射率大于所述第二传导层13的折射率,所述第三传导层15的折射率大于第二传导层13的折射率,这使得 不同视场入射的光线或不同波长的光线经耦入光栅衍射后在光波导片100中的不同传导层中传播,从而这样可以调节不同波长的光线或不同视场衍射光线的出瞳密度,让出瞳密度的比值控制在较小的范围,增加光波导片100设计的自由度,相较于光传导部10为单层的光波导片100,可以提高光波导片100衍射图像的均匀性和提升光效率。The optical waveguide sheet 100 in the embodiment of the present application includes a light conductive part 10. The light conductive part 10 includes a first conductive layer 11, a second conductive layer 13 and a third conductive layer 15 that are stacked in sequence; The refractive index is greater than the refractive index of the second conductive layer 13, and the refractive index of the third conductive layer 15 is greater than the refractive index of the second conductive layer 13, which makes The incident light of different fields of view or the light of different wavelengths propagates in different conductive layers in the optical waveguide sheet 100 after being diffracted by the coupling grating, so that the exit pupil density of the light of different wavelengths or the diffracted light of different fields of view can be adjusted, so that The ratio of the exit pupil density is controlled in a smaller range, which increases the degree of freedom in the design of the optical waveguide plate 100. Compared with the optical waveguide plate 100 in which the light transmission part 10 is a single layer, the uniformity and diffraction image of the optical waveguide plate 100 can be improved. Improve light efficiency.
可选地,所述第一传导层11、所述第二传导层13、所述第三传导层15及所述光栅部30为一体结构。可以理解地,所述第一传导层11、所述第二传导层13、所述第三传导层15及所述光栅部30依次连接,形成一体结构。还可以理解地,所述第一传导层11、所述第二传导层13、所述第三传导层15、耦入光栅部30及耦出光栅部30为一体结构。一体结构可以省略各个树脂层之间的贴合工艺,从而可以避免贴合造成的对位不准问题等。Optionally, the first conductive layer 11 , the second conductive layer 13 , the third conductive layer 15 and the grating part 30 are an integral structure. It can be understood that the first conductive layer 11 , the second conductive layer 13 , the third conductive layer 15 and the grating part 30 are connected in sequence to form an integrated structure. It can also be understood that the first conductive layer 11 , the second conductive layer 13 , the third conductive layer 15 , the coupling grating part 30 and the coupling grating part 30 are an integral structure. The one-piece structure can omit the lamination process between each resin layer, thereby avoiding misalignment problems caused by lamination.
可选地,第一传导层11的折射率与第三传导层15的折射率相等,相较于第一传导层11与第三传导层15的折射率不等的情况,这样第一传导层11与第三传导层15只需要采用同样的材料和配方制备即可,可以简化原料配制工艺,降低光波导片100的制备成本,此外,当第一传导层11的折射率与第三传导层15的折射率相等时,制得的光波导片100具有更好的显示效果。Optionally, the refractive index of the first conductive layer 11 is equal to the refractive index of the third conductive layer 15, compared to the case where the refractive index of the first conductive layer 11 and the third conductive layer 15 are unequal, so that the first conductive layer 11 and the third conductive layer 15 only need to be prepared using the same material and formula, which can simplify the raw material preparation process and reduce the preparation cost of the optical waveguide 100. In addition, when the refractive index of the first conductive layer 11 is the same as that of the third conductive layer 11 When the refractive index of 15 is equal, the optical waveguide plate 100 produced has better display effect.
可选地,所述第一传导层11的折射率n1的范围为1.55至2.0。具体地,所述第一传导层11的折射率n1可以为但不限于为1.55、1.6、1.65、1.7、1.75、1.8、1.85、1.9、1.95、2.0等。第一传导层11的折射率太小时,制得的光波导片100的视场角(FOV)过小,第一传导层11的折射率太大,目前的树脂材料和工艺难以达到。Optionally, the refractive index n1 of the first conductive layer 11 ranges from 1.55 to 2.0. Specifically, the refractive index n1 of the first conductive layer 11 may be, but is not limited to, 1.55, 1.6, 1.65, 1.7, 1.75, 1.8, 1.85, 1.9, 1.95, 2.0, etc. If the refractive index of the first conductive layer 11 is too small, the field of view (FOV) of the optical waveguide 100 produced is too small, and if the refractive index of the first conductive layer 11 is too large, it is difficult to achieve it with current resin materials and processes.
可选地,所述第二传导层13的折射率n2的范围为1.35至1.6。具体地,所述第二传导层13的折射率n2可以为但不限于为1.35、1.4、1.45、1.5、1.55、1.6等。第二传导层13的折射率太小时,目前的树脂材料和工艺难以达到;第二传导层13的折射率太大,则第二传导层13的折射率接近第一传导层11或第三传导层15,不利于提高光波导片100衍射图像的均匀性。Optionally, the refractive index n2 of the second conductive layer 13 ranges from 1.35 to 1.6. Specifically, the refractive index n2 of the second conductive layer 13 may be, but is not limited to, 1.35, 1.4, 1.45, 1.5, 1.55, 1.6, etc. If the refractive index of the second conductive layer 13 is too small, it is difficult to achieve it with current resin materials and processes; if the refractive index of the second conductive layer 13 is too large, the refractive index of the second conductive layer 13 will be close to that of the first conductive layer 11 or the third conductive layer. Layer 15 is not conducive to improving the uniformity of the diffraction image of the optical waveguide plate 100.
可选地,所述第三传导层15的折射率n3的范围为1.55至2.0。具体地,所述第三传导层15的折射率n3可以为但不限于为1.55、1.6、1.65、1.7、1.75、1.8、1.85、1.9、1.95、2.0等。第三传导层15的折射率太小时,制得的光波导片100的视场角(FOV)过小,第三传导层15的折射率太大,目前的树脂材料和工艺难以达到。Optionally, the refractive index n3 of the third conductive layer 15 ranges from 1.55 to 2.0. Specifically, the refractive index n3 of the third conductive layer 15 may be, but is not limited to, 1.55, 1.6, 1.65, 1.7, 1.75, 1.8, 1.85, 1.9, 1.95, 2.0, etc. The refractive index of the third conductive layer 15 is too small, and the field of view (FOV) of the optical waveguide 100 is too small. The refractive index of the third conductive layer 15 is too high, which is difficult to achieve with current resin materials and processes.
可选地,沿所述第一传导层11、所述第二传导层13及所述第三传导层15的层叠方向上,所述第一传导层11的厚度大于所述第二传导层13的厚度,所述第三传导层15的厚度大于所述第二传导层13的厚度。这样可以更好地改善光波导片100衍射图案的均匀性。Optionally, along the stacking direction of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 , the thickness of the first conductive layer 11 is greater than that of the second conductive layer 13 The thickness of the third conductive layer 15 is greater than the thickness of the second conductive layer 13 . This can better improve the uniformity of the diffraction pattern of the optical waveguide plate 100 .
在一些实施例中,沿所述第一传导层11、所述第二传导层13及所述第三传导层15的层叠方向上,所述第一传导层11的厚度h1与所述第二传导层13的厚度h2的比值h1/h2的范围为7:1≤h1/h2≤10:1;具体地,所述第一传导层11的厚度h1与所述第二传导层13的厚度h2的比值h1/h2可以为但不限于为7:1、7.5:1、8:1、8.5:1、9:1、9.5:1、10:1。所述第一传导层11的厚度h1与所述第二传导层13的厚度h2的比值太大或太小均会降低衍射图像的均匀性,无法实现提高光波导片100衍射图像均匀性的效果。In some embodiments, along the stacking direction of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 , the thickness h 1 of the first conductive layer 11 is equal to the thickness h 1 of the third conductive layer 11 . The ratio h 1 /h 2 of the thickness h 2 of the two conductive layers 13 is in the range of 7:1≤h 1 /h 2 ≤10:1; specifically, the thickness h 1 of the first conductive layer 11 and the thickness h 1 of the first conductive layer 13 are in the range of 7:1≤h 1 /h 2 ≤10:1. The ratio h 1 /h 2 of the thickness h 2 of the second conductive layer 13 may be, but is not limited to, 7:1, 7.5:1, 8:1, 8.5:1, 9:1, 9.5:1, or 10:1. If the ratio of the thickness h 1 of the first conductive layer 11 to the thickness h 2 of the second conductive layer 13 is too large or too small, the uniformity of the diffraction image will be reduced, and it is impossible to improve the uniformity of the diffraction image of the optical waveguide plate 100 . Effect.
可选地,沿所述第一传导层11、所述第二传导层13及所述第三传导层15的层叠方向上,所述第一传导层11的厚度h1的范围为0.2mm≤h1≤3mm。具体地,第一传导层11的厚度可以为但不限于为0.2mm、0.3mm、0.4mm、0.5mm、0.6mm、0.7mm、0.8mm、0.9mm、 1.0mm、1.2mm、1.5mm、1.8mm、2.0mm、2.2mm、2.5mm、2.8mm、3mm等。第一传导层11的厚度太厚,制得的光波导片100的重量太重,第一传导层11的厚度太薄,则第一传导层11太软,容易发生变形或弯曲,影响光波导片100图像的显示效果。Optionally, along the stacking direction of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 , the thickness h 1 of the first conductive layer 11 ranges from 0.2 mm ≤ h 1 ≤3mm. Specifically, the thickness of the first conductive layer 11 may be, but is not limited to, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.2mm, 1.5mm, 1.8mm, 2.0mm, 2.2mm, 2.5mm, 2.8mm, 3mm, etc. If the thickness of the first conductive layer 11 is too thick, the weight of the produced optical waveguide sheet 100 will be too heavy. If the thickness of the first conductive layer 11 is too thin, the first conductive layer 11 will be too soft and easily deformed or bent, affecting the optical waveguide. The display effect of slice 100 images.
可选地,沿所述第一传导层11、所述第二传导层13及所述第三传导层15的层叠方向上,所述第二传导层13的厚度h2的范围为0.01mm≤h2≤0.1mm;具体地,第二传导层13的厚度可以为但不限于为0.01mm、0.02mm、0.03mm、0.04mm、0.05mm、0.06mm、0.07mm、0.08mm、0.09mm、1.0mm等。第二传导层13的厚度太厚,光线在经过第二传导层13时,光路改变太多,光学设计更难达到预期目标,会影响显示图像的均匀性;第二传导层13的厚度太薄,光传导部10的结构接近第一传导层11与第三传导层15贴合在一起的结构,对于衍射图像均匀性的改进效果也不好。Optionally, along the stacking direction of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 , the thickness h 2 of the second conductive layer 13 ranges from 0.01 mm ≤ h 2 ≤ 0.1mm; specifically, the thickness of the second conductive layer 13 can be, but is not limited to, 0.01mm, 0.02mm, 0.03mm, 0.04mm, 0.05mm, 0.06mm, 0.07mm, 0.08mm, 0.09mm, 1.0 mm etc. The thickness of the second conductive layer 13 is too thick. When the light passes through the second conductive layer 13, the optical path changes too much, making it more difficult for the optical design to achieve the expected goals, which will affect the uniformity of the displayed image. The thickness of the second conductive layer 13 is too thin. , the structure of the light conductive part 10 is close to the structure in which the first conductive layer 11 and the third conductive layer 15 are bonded together, and the effect on improving the uniformity of the diffraction image is not good.
在一些实施例中,沿所述第一传导层11、所述第二传导层13及所述第三传导层15的层叠方向上,所述第三传导层的厚度h3与所述第二传导层的厚度h2的比值h3/h2的范围为10≤h3/h2≤14:1;具体地,所述第三传导层15的厚度h3与所述第二传导层13的厚度h2的比值h3/h2可以为但不限于为10:1、10.5:1、11:1、11.5:1、12:1、12.5:1、13:1、13.5:1、14:1。所述第三传导层15的厚度h3与所述第二传导层13的厚度h2的比值h3/h2太大或太小均会降低衍射图像的均匀性,无法实现提高光波导片100衍射图像均匀性的效果。In some embodiments, along the stacking direction of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 , the thickness h 3 of the third conductive layer is equal to the thickness h 3 of the second conductive layer 15 . The ratio h 3 /h 2 of the thickness h 2 of the conductive layer is in the range of 10 ≤ h 3 /h 2 ≤ 14:1; specifically, the thickness h 3 of the third conductive layer 15 and the thickness h 3 of the second conductive layer 13 The ratio of thickness h 2 h 3 /h 2 can be but is not limited to 10:1, 10.5:1, 11:1, 11.5:1, 12:1, 12.5:1, 13:1, 13.5:1, 14 :1. If the ratio h 3 /h 2 of the thickness h 3 of the third conductive layer 15 to the thickness h 2 of the second conductive layer 13 is too large or too small, the uniformity of the diffraction image will be reduced, and it is impossible to improve the optical waveguide plate. 100% effect on diffraction image uniformity.
可选地,沿所述第一传导层11、所述第二传导层13及所述第三传导层15的层叠方向上,所述第三传导层15的厚度h3的范围为0.2mm≤h3≤3mm。具体地,第三传导层15的厚度可以为但不限于为0.2mm、0.3mm、0.4mm、0.5mm、0.6mm、0.7mm、0.8mm、0.9mm、1.0mm、1.2mm、1.5mm、1.8mm、2.0mm、2.2mm、2.5mm、2.8mm、3mm等。第三传导层15的厚度太厚,制得的光波导片100的重量太重,第三传导层15的厚度太薄,则第三传导层15太软,容易发生变形或弯曲,影响光波导片100图像的显示效果。Optionally, along the stacking direction of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 , the thickness h 3 of the third conductive layer 15 ranges from 0.2 mm ≤ h 3 ≤3mm. Specifically, the thickness of the third conductive layer 15 may be, but is not limited to, 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1.0mm, 1.2mm, 1.5mm, 1.8 mm, 2.0mm, 2.2mm, 2.5mm, 2.8mm, 3mm, etc. If the thickness of the third conductive layer 15 is too thick, the weight of the produced optical waveguide sheet 100 will be too heavy. If the thickness of the third conductive layer 15 is too thin, the third conductive layer 15 will be too soft and easily deformed or bent, affecting the optical waveguide. The display effect of slice 100 images.
在一具体实施例中,第一传导层11的厚度h1为0.4mm;第二传导层的厚度h2为0.05mm,所述第三传导层的厚度h3为0.4mm。In a specific embodiment, the thickness h 1 of the first conductive layer 11 is 0.4 mm; the thickness h 2 of the second conductive layer is 0.05 mm; and the thickness h 3 of the third conductive layer is 0.4 mm.
在一些实施例中,第二传导层13的厚度远小于第一传导层11及第三传导层15的厚度,因此,第二传导层13的厚度可以忽略不计,则所述光波导片满足以下关系式:In some embodiments, the thickness of the second conductive layer 13 is much smaller than the thickness of the first conductive layer 11 and the third conductive layer 15 . Therefore, the thickness of the second conductive layer 13 can be ignored. Then the optical waveguide plate satisfies the following requirements: Relationship:
2(h1+h3)tanθ1=2h3×tanθ2;以及2(h 1 +h 3 )tanθ 1 =2h 3 ×tanθ 2 ; and
θ2≥sin-1(n2/n1);θ 2 ≥sin -1 (n 2 /n 1 );
其中,n2为所述第一传导层的折射率,θ1为当光传导部为单层、厚度为h1+h3、折射率为n1时,光线垂直入射至光波导片时,在单层光传导部内的衍射角;θ2为光线在所述光波导片内的衍射角。Among them, n 2 is the refractive index of the first conductive layer, θ 1 is when the light conductive part is a single layer, the thickness is h 1 + h 3 , and the refractive index is n 1 , and the light is vertically incident on the optical waveguide sheet, The diffraction angle in the single-layer light transmission part; θ 2 is the diffraction angle of light in the optical waveguide plate.
当光波导片100满足上述关系式时,可以更好的提高光波导片100衍射图像的均匀性,提升光波导片100的光效率。When the optical waveguide plate 100 satisfies the above relational expression, the uniformity of the diffraction image of the optical waveguide plate 100 can be better improved, and the optical efficiency of the optical waveguide plate 100 can be improved.
可选地,所述第一传导层11、所述第二传导层13、所述第三传导层15均为树脂层。相较于玻璃材质的光波导片100,本申请的光波导片100为树脂材质,其重量更轻,具有更好的抗跌落能力,且制备成本低。Optionally, the first conductive layer 11, the second conductive layer 13, and the third conductive layer 15 are all resin layers. Compared with the optical waveguide plate 100 made of glass, the optical waveguide plate 100 of the present application is made of resin, is lighter in weight, has better resistance to falling, and has low manufacturing cost.
在一些实施例中,第一传导层11与第三传导层15均为热固性树脂层,第二传导层13为热塑性树脂层。在另一些实施例中,第一传导层11与第三传导层15均为热塑性树脂层,第二传导层13为热固性树脂层。通过热固性树脂层与热塑性树脂层的交替配合,制备光 传导部10,从而可以制备一体化结构,且制得的每个树脂层的表面的平整度均可以满足光学级平整度的要求。In some embodiments, the first conductive layer 11 and the third conductive layer 15 are both thermosetting resin layers, and the second conductive layer 13 is a thermoplastic resin layer. In other embodiments, the first conductive layer 11 and the third conductive layer 15 are both thermoplastic resin layers, and the second conductive layer 13 is a thermosetting resin layer. Through the alternating combination of thermosetting resin layers and thermoplastic resin layers, optical The conductive part 10 can thus prepare an integrated structure, and the flatness of the surface of each resin layer can meet the requirements of optical grade flatness.
可选地,热塑性树脂层可以包括但不限于包括聚碳酸酯(PC)。热固性树脂层由热固性树脂胶液经固化得到。热固性树脂胶液包括热固性树脂单体以及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯等中的至少一种。固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺等中的至少一种。可选地,热固性树脂胶液还包括脱模剂、抗氧化剂等中的至少一种。Alternatively, the thermoplastic resin layer may include, but is not limited to, polycarbonate (PC). The thermosetting resin layer is obtained by curing the thermosetting resin glue. The thermosetting resin glue includes thermosetting resin monomers and curing agents. The thermosetting resin monomers include propylene carbonate, allyl diglycol carbonate, acrylonitrile, ethylene glycol dimethacrylate, allyl ester, and phthalate. At least one of diallyl acid, urethane, etc. The curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like. Optionally, the thermosetting resin glue also includes at least one of a release agent, an antioxidant, and the like.
可选地,第一传导层11及第三传导层15的折射率可以通过在热固性树脂层或热塑性树脂层中添加具有高折射率的折射率调节剂,例如白色金属氧化物,如二氧化钛或二氧化锆等。通过调节第一传导层11及第三传导层15中二氧化钛或二氧化锆添加量(例如二氧化钛或二氧化锆的添加量(质量含量)为0.5%至10%等),从而可以调节第一传导层11或第三传导层15的折射率。Alternatively, the refractive index of the first conductive layer 11 and the third conductive layer 15 can be adjusted by adding a refractive index adjuster with a high refractive index, such as a white metal oxide, such as titanium dioxide or titanium dioxide, into the thermosetting resin layer or the thermoplastic resin layer. Zirconia, etc. By adjusting the amount of titanium dioxide or zirconium dioxide added in the first conductive layer 11 and the third conductive layer 15 (for example, the amount of titanium dioxide or zirconium dioxide added (mass content) is 0.5% to 10%, etc.), the first conductivity can be adjusted. The refractive index of layer 11 or third conductive layer 15.
本申请实施例的光波导片100可以通过本申请下列实施例所述的方法进行制备,此外,还可以通过其它方法进行制备,本申请实施例的制备方法仅仅是本申请光波导片100的一种或多种制备方法,不应理解为对本申请实施例提供的光波导片100的限定。The optical waveguide plate 100 in the embodiment of the present application can be prepared by the method described in the following embodiments of the present application. In addition, it can also be prepared by other methods. The preparation method of the embodiment of the present application is only one part of the optical waveguide plate 100 of the present application. One or more preparation methods should not be understood as limiting the optical waveguide plate 100 provided in the embodiments of the present application.
请参见图4,本申请实施例提供了一种光波导片100的制备方法,所述光波导片100包括光传导部10及光栅部30,所述光传导部10包括依次层叠设置的第一传导层11、第二传导层13及第三传导层15,所述第一传导层11的折射率大于所述第二传导层13的折射率,且所述第三传导层15的折射率大于所述第二传导层13的折射率;所述光栅部30设置于所述第一传导层11背离所述第二传导层13的表面;所述方法包括:Referring to FIG. 4 , an embodiment of the present application provides a method for preparing an optical waveguide plate 100 . The optical waveguide plate 100 includes a light conductive part 10 and a grating part 30 . The light conductive part 10 includes a first layer arranged in a stacked manner. The conductive layer 11, the second conductive layer 13 and the third conductive layer 15, the refractive index of the first conductive layer 11 is greater than the refractive index of the second conductive layer 13, and the refractive index of the third conductive layer 15 is greater than The refractive index of the second conductive layer 13; the grating portion 30 is disposed on the surface of the first conductive layer 11 facing away from the second conductive layer 13; the method includes:
S201,采用第一成型方法形成第一传导层11及光栅部30;S201, use the first molding method to form the first conductive layer 11 and the grating part 30;
S202,采用第二成型方法形成第二传导层13;以及S202, use the second molding method to form the second conductive layer 13; and
S203,采用第一成型方法形成第三传导层15;其中,所述第一成型方法为注塑成型或浇注成型,所述第二成型方法为注塑成型或浇注成型,所述第一成型方法与所述第二成型方法不同。S203, use a first molding method to form the third conductive layer 15; wherein the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is the same as the above. The second molding method is different.
需要说明的是,S201、S202及S203之间没有顺序之分,S201、S202及S203之间的顺序可以根据第一成型方法以及第二成型方法的不同进行调整,在本实施例及图4中以所述方法按S201、S202、S203的顺序进行示意,不应理解为对本申请保护范围的限定。It should be noted that there is no order between S201, S202 and S203. The order between S201, S202 and S203 can be adjusted according to the difference between the first molding method and the second molding method. In this embodiment and Figure 4 The method is illustrated in the order of S201, S202, and S203 and should not be understood as limiting the scope of protection of the present application.
可选地,光栅部30包括光耦入部31及光耦出部33,光耦入部31及光耦出部33间隔设置于第一传导层11背离第二传导层13的表面。Optionally, the grating part 30 includes a light coupling part 31 and a light coupling part 33 , and the light coupling part 31 and the light coupling part 33 are spaced apart on the surface of the first conductive layer 11 away from the second conductive layer 13 .
本申请实施例的光波导片100的制备方法制得的光波导片100包括光传导部10,光传导部10包括依次层叠设置的第一传导层11、第二传导层13及第三传导层15;所述第一传导层11的折射率大于所述第二传导层13的折射率,所述第三传导层15的折射率大于第二传导层13的折射率,这使得不同视场入射的光线或不同波长的光线经耦入光栅衍射后在光波导片100中的不同树脂层中传播,从而这样可以调节不同波长的光线或不同视场衍射光线的出瞳密度,让出瞳密度的比值控制在较小的范围,增加光波导片100设计的自由度,相较于光传导部10为单层的光波导片100,可以提高光波导片100衍射图像的均匀性和提升光效率。此外,本申请的光波导片100为树脂材质,其重量更轻,具有更好的抗跌落能 力,且制备成本低。本申请制得的光波导片100的第一传导层11、第二传导层13、第三传导层15及光栅部30为一体结构,第一传导层11、第二传导层13与第三传导层15两两之间无需进行贴合,省略了贴合工艺,还可以避免贴合工艺中造成的对位不准。再者,本申请的制备方法通过注塑成型与浇注成型工艺的交替配合,从而使得制得的第一传导层11、第二传导层13及第三传导层15的表面均可以达到光学级平整度。The optical waveguide 100 produced by the method for preparing the optical waveguide 100 according to the embodiment of the present application includes a light conductive part 10. The light conductive part 10 includes a first conductive layer 11, a second conductive layer 13 and a third conductive layer that are stacked in sequence. 15; The refractive index of the first conductive layer 11 is greater than the refractive index of the second conductive layer 13, and the refractive index of the third conductive layer 15 is greater than the refractive index of the second conductive layer 13, which makes different fields of view incident Light of different wavelengths or light of different wavelengths propagates in different resin layers in the optical waveguide sheet 100 after being coupled into the grating and diffracted, so that the exit pupil density of light of different wavelengths or diffracted light of different fields of view can be adjusted, so that the exit pupil density can be adjusted. Controlling the ratio in a smaller range increases the degree of freedom in the design of the optical waveguide plate 100. Compared with the optical waveguide plate 100 in which the light transmission part 10 is a single layer, the uniformity of the diffraction image of the optical waveguide plate 100 can be improved and the optical efficiency can be improved. In addition, the optical waveguide plate 100 of the present application is made of resin, is lighter in weight, and has better resistance to falling. power and low preparation cost. The first conductive layer 11, the second conductive layer 13, the third conductive layer 15 and the grating part 30 of the optical waveguide sheet 100 produced in this application have an integrated structure. The first conductive layer 11, the second conductive layer 13 and the third conductive layer There is no need to laminate two layers 15, which eliminates the lamination process and can also avoid misalignment caused by the lamination process. Furthermore, the preparation method of the present application alternates injection molding and pouring molding processes, so that the surfaces of the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 can all achieve optical-level flatness. .
请参见图5至图7,所述第一成型方法为浇注成型,所述第二成型方法为注塑成型,本申请实施例提供的光波导片100的制备方法包括:Referring to Figures 5 to 7, the first molding method is casting molding, and the second molding method is injection molding. The method for preparing the optical waveguide sheet 100 provided in the embodiment of the present application includes:
S301,如图6所示,提供第一模具100a,所述第一模具100a包括第一子模10a及第二子模30a,所述第一子模10a与所述第二子模30a围合成第一模腔301a,所述第一子模10a具有面向所述第一模腔301a的光栅纹理11a,所述光栅纹理11a与所述光栅部30的结构互补。本申请术语“结构互补”指结构互补的两个部件贴合时,其中一个部件的凸起正好填充另一个部分的凹槽,且彼此贴合设置。S301, as shown in Figure 6, provide a first mold 100a. The first mold 100a includes a first sub-mold 10a and a second sub-mold 30a. The first sub-mold 10a and the second sub-mold 30a are enclosed together. The first mold cavity 301a, the first sub-mold 10a has a grating texture 11a facing the first mold cavity 301a, the grating texture 11a is complementary to the structure of the grating part 30. The term "structurally complementary" in this application means that when two structurally complementary components are fitted together, the protrusions of one component exactly fill the grooves of the other component and are arranged in close contact with each other.
可以理解地,第二子模30a的表面具有光栅纹理11a,第二子模30a具有光栅纹理11a的表面与第一子模10a围合成第一模腔301a。可选地,光栅纹理11a包括耦入光栅纹理111a以及耦出光栅纹理113a,耦入光栅纹理111a与光耦入部31的结构互补,耦出光栅纹理113a与光耦出部33的结构互补。It can be understood that the surface of the second sub-mold 30a has the grating texture 11a, and the surface of the second sub-mold 30a has the grating texture 11a and the first sub-mold 10a enclose the first mold cavity 301a. Optionally, the grating texture 11a includes a coupling grating texture 111a and a coupling grating texture 113a. The coupling grating texture 111a is complementary to the structure of the light coupling part 31, and the coupling grating texture 113a is complementary to the structure of the light coupling part 33.
S302,在所述第一模腔301a内注入第一热固性树脂胶液;S302, inject the first thermosetting resin glue into the first mold cavity 301a;
可选地,第一热固性树脂胶液可以包括热固性树脂单体以及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯等中的至少一种。固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺等中的至少一种。可选地,第一热固性树脂胶液还包括脱模剂、抗氧化剂等中的至少一种。可选地,第一热固性树脂胶液还包括折射率调节剂,所述折射率调节剂包括二氧化钛或二氧化锆中的至少一种,以使得到第一传导层11具有较高的折射率。Optionally, the first thermosetting resin glue may include a thermosetting resin monomer and a curing agent. The thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, urethane, etc. The curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like. Optionally, the first thermosetting resin glue further includes at least one of a release agent, an antioxidant, and the like. Optionally, the first thermosetting resin glue further includes a refractive index adjuster, and the refractive index adjuster includes at least one of titanium dioxide or zirconium dioxide, so that the first conductive layer 11 has a higher refractive index.
可选地,将热固性树脂单体、固化剂、脱模剂、抗氧化剂、所述折射率调节剂等搅拌均匀后,在真空条件下真空脱泡,以去除材料中溶解的空气,脱泡完成后备用。Optionally, after the thermosetting resin monomer, curing agent, release agent, antioxidant, refractive index adjuster, etc. are stirred evenly, vacuum degassing is performed under vacuum conditions to remove dissolved air in the material, and degassing is completed. Backup.
在一具体实施例中,第一热固性树脂胶液通过以下步骤配置:分别称取10g碳酸丙烯酯、5g烯丙基二甘醇碳酸脂、4.8g胺基甲酸酯、0.5g异佛尔酮二胺、0.3g亚甲基双环己烷胺、0.01g甘油单油酸酯、0.01g二叔丁基对甲酚,搅拌混合均匀;在100Pa真空条件下脱泡20min。In a specific embodiment, the first thermosetting resin glue solution is prepared through the following steps: weigh 10g propylene carbonate, 5g allyl diglycol carbonate, 4.8g urethane, and 0.5g isophorone respectively. Diamine, 0.3g methylene biscyclohexylamine, 0.01g glyceryl monooleate, 0.01g di-tert-butyl-p-cresol, stir and mix evenly; defoaming under 100Pa vacuum conditions for 20 minutes.
S303,对所述第一热固性树脂胶液进行固化,得到第一传导层11及光栅部30;S303, solidify the first thermosetting resin glue to obtain the first conductive layer 11 and the grating portion 30;
可选地,对第一热固性树脂胶液进行加热(例如,加热至70℃至120℃),以使热固性树脂单体与固化剂发生聚合反应,从而形成热固性树脂层,即一体结构的第一传导层11及光栅部30。Optionally, the first thermosetting resin glue liquid is heated (for example, heated to 70°C to 120°C) to cause a polymerization reaction between the thermosetting resin monomer and the curing agent to form a thermosetting resin layer, that is, the first part of the integrated structure. Conductive layer 11 and grating portion 30 .
在一具体实施例中,于4h,使第一热固性树脂胶液由室温逐步升温至80℃;于80℃保温5h;于3h,使第一热固性树脂胶液由80℃逐步升温至100℃;于2h,使第一热固性树脂胶液由100℃逐步升温至120℃;于120℃保温7h;于2h,逐步降温至50℃。In a specific embodiment, the first thermosetting resin glue solution is gradually heated from room temperature to 80°C in 4 hours; the temperature is maintained at 80°C for 5 hours; and the first thermosetting resin glue solution is gradually heated from 80°C to 100°C in 3 hours; In 2 hours, gradually heat the first thermosetting resin glue solution from 100°C to 120°C; keep it at 120°C for 7 hours; and in 2 hours, gradually lower the temperature to 50°C.
可选地,在对第一热固性树脂胶液进行加热固化之前,沿重力方向上,使第一子模10a位于第二子模30a的下方,对所述第一热固性树脂胶液进行固化,以得到第一传导层11 及光栅部30。热固性树脂胶液发生聚合反应进行固化时,会发生体积收缩,使得具有光栅纹理11a的第一子模10a位于不具有光栅纹理11a的第二子模30a的重力下方,这样可以更好的得到具有预设结构的光栅部30,不会有由于体积的收缩,使得光栅纹理11a与预设结构产生误差。Optionally, before the first thermosetting resin glue is heated and solidified, the first sub-mold 10a is positioned below the second sub-mold 30a in the direction of gravity, and the first thermosetting resin glue is solidified, so as to Obtain the first conductive layer 11 and grating part 30. When the thermosetting resin glue undergoes a polymerization reaction and solidifies, volume shrinkage occurs, so that the first sub-mold 10a with the grating texture 11a is located under the gravity of the second sub-mold 30a without the grating texture 11a. This can better obtain the The grating part 30 with the preset structure will not cause any error between the grating texture 11a and the preset structure due to volume shrinkage.
S304,在所述第一传导层11背离所述光栅部30的表面注塑形成第二传导层13;S304, injection molding to form a second conductive layer 13 on the surface of the first conductive layer 11 away from the grating part 30;
可选地,采用热塑性树脂例如聚碳酸酯,在第一传导层11背离光栅部30的表面通过高压注塑形成第二传导层13。聚碳酸酯注塑成型时的温度在250℃左右,而该温度远远低于热固性树脂层软化或变形温度,因此,在注塑第二传导层13时,第一传导层11仍然可以保持原有的膜层结构,表面平整度不会受注塑影响。在本实施例中,第二传导层13之所以不采用浇注成型的方式制备,是因为浇注成型的原料为热固性树脂胶液,热固性树脂胶液聚合反应过程中会发生体积收缩,从而使得得到的第二传导层13的表面凹凸不平,需要打磨抛光才能达到光学级平面度,而第二传导层13本身的厚度只有0.01mm至0.1mm,从而,非常容易在抛光过程消耗掉,难以控制第二传导层13的厚度。因此需要用高压注塑的方式,这样能够保障第二传导层13背离第一传导层11的表面在不抛光的情况下,也能维持光学级平面度。Alternatively, thermoplastic resin such as polycarbonate is used to form the second conductive layer 13 on the surface of the first conductive layer 11 away from the grating part 30 by high-pressure injection molding. The temperature during injection molding of polycarbonate is around 250°C, which is far lower than the softening or deformation temperature of the thermosetting resin layer. Therefore, when the second conductive layer 13 is injected, the first conductive layer 11 can still maintain its original shape. Film layer structure, surface flatness will not be affected by injection molding. In this embodiment, the reason why the second conductive layer 13 is not prepared by casting is because the raw material for casting is thermosetting resin glue. During the polymerization reaction of the thermosetting resin glue, volume shrinkage will occur, so that the obtained The surface of the second conductive layer 13 is uneven and needs to be polished to achieve optical flatness. The thickness of the second conductive layer 13 itself is only 0.01mm to 0.1mm. Therefore, it is very easy to be consumed during the polishing process, making it difficult to control the second conductive layer 13 . The thickness of the conductive layer 13. Therefore, high-pressure injection molding is required to ensure that the surface of the second conductive layer 13 away from the first conductive layer 11 can maintain optical-level flatness without polishing.
S305,在所述第二传导层13背离所述第一传导层11的表面注入第二热固性树脂胶液;以及S305, inject a second thermosetting resin glue into the surface of the second conductive layer 13 facing away from the first conductive layer 11; and
可选地,第二热固性树脂胶液可以包括热固性树脂单体以及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯等中的至少一种。固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺等中的至少一种。可选地,第二热固性树脂胶液还包括脱模剂、抗氧化剂等中的至少一种。可选地,第二热固性树脂胶液还包括二氧化钛或二氧化锆中的至少一种,以使得到第三传导层15具有较高的折射率。Optionally, the second thermosetting resin glue may include a thermosetting resin monomer and a curing agent. The thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, urethane, etc. The curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like. Optionally, the second thermosetting resin glue further includes at least one of a release agent, an antioxidant, and the like. Optionally, the second thermosetting resin glue further includes at least one of titanium dioxide or zirconium dioxide, so that the third conductive layer 15 has a higher refractive index.
关于第二热固性树脂胶液的其它方面的详细描述,请参见上述实施例对第一热塑性树脂的描述,在此不再赘述。For detailed description of other aspects of the second thermosetting resin glue, please refer to the description of the first thermoplastic resin in the above embodiments, which will not be described again here.
S306,对所述第二热固性树脂胶液进行固化,得到第三传导层15。S306: Solidify the second thermosetting resin glue to obtain the third conductive layer 15.
可选地,对第二热固性树脂胶液进行加热(例如,加热至70℃至120℃),以使热固性树脂单体与固化剂发生聚合反应,从而形成热固性树脂层,即第三传导层15。Optionally, the second thermosetting resin glue liquid is heated (for example, heated to 70° C. to 120° C.) to cause a polymerization reaction between the thermosetting resin monomer and the curing agent to form a thermosetting resin layer, that is, the third conductive layer 15 .
热固性树脂胶液的固化温度一般在70℃至120℃之间,远低于第二传导层13(其熔融温度一般高于200℃),因此,在第二热固性树脂胶液的固化过程中,第二传导层13不会发生软化或变形,可以很好的保持第二传导层13表面的平整度。The curing temperature of the thermosetting resin glue is generally between 70°C and 120°C, which is much lower than the second conductive layer 13 (its melting temperature is generally higher than 200°C). Therefore, during the solidification process of the second thermosetting resin glue, The second conductive layer 13 will not soften or deform, and can well maintain the flatness of the surface of the second conductive layer 13 .
需要说明的是,第一传导层11、第二传导层13及第三传导层15无法均采用注塑成型的方式进行制备。因此,在第一传导层11上注塑第二传导层13时,由于注塑的温度在热塑性树脂的熔融温度以上,若在第一传导层11的表面注塑第二传导层13,熔融的热塑性树脂接触到第一传导层11后,会使得第一传导层11的表面发生软化,从而无法维持第一传导层11与第二传导层13接触面的平面度,从而第一传导层11与第二传导层13之间的界面发生变化,不再保持光学级平面度,甚至第一传导层11与第二传导层13之间的树脂还会有一定熔融,无法满足光学需求。而本实施例的第二传导层13为热固性树脂层,第二传导层13形成时的温度较低,不会是第一传导层11与第二传导层13之间的界面发生变 化,能够保持较好的光学级平面度。It should be noted that the first conductive layer 11 , the second conductive layer 13 and the third conductive layer 15 cannot all be prepared by injection molding. Therefore, when the second conductive layer 13 is injected on the first conductive layer 11, since the injection temperature is above the melting temperature of the thermoplastic resin, if the second conductive layer 13 is injected on the surface of the first conductive layer 11, the molten thermoplastic resin will contact After reaching the first conductive layer 11, the surface of the first conductive layer 11 will soften, so that the flatness of the contact surface between the first conductive layer 11 and the second conductive layer 13 cannot be maintained. The interface between the layers 13 changes and the optical level flatness is no longer maintained. Even the resin between the first conductive layer 11 and the second conductive layer 13 will melt to a certain extent, which cannot meet the optical requirements. The second conductive layer 13 in this embodiment is a thermosetting resin layer. The temperature when the second conductive layer 13 is formed is relatively low, so the interface between the first conductive layer 11 and the second conductive layer 13 will not change. ization and can maintain good optical grade flatness.
请参见图8,所述第一成型方法为浇注成型,所述第二成型方法为注塑成型,本申请实施例提供的光波导片100的制备方法包括:Please refer to Figure 8. The first molding method is casting molding, and the second molding method is injection molding. The method for preparing the optical waveguide sheet 100 provided in the embodiment of the present application includes:
S401,提供第一模具100a,所述第一模具100a包括第一子模10a及第二子模30a,所述第一子模10a与所述第二子模30a围合成第一模腔301a,所述第一子模10a具有面向所述第一模腔301a的光栅纹理11a,所述光栅纹理11a与所述光栅部30的结构互补;S401. Provide a first mold 100a. The first mold 100a includes a first sub-mold 10a and a second sub-mold 30a. The first sub-mold 10a and the second sub-mold 30a enclose a first mold cavity 301a. The first sub-mold 10a has a grating texture 11a facing the first mold cavity 301a, and the grating texture 11a is complementary to the structure of the grating part 30;
S402,在所述第一模腔301a内注入第一热固性树脂胶液;S402, inject the first thermosetting resin glue into the first mold cavity 301a;
S403,沿重力方向上,使第一子模10a位于第二子模30a的下方,对所述第一热固性树脂胶液进行固化,得到第一传导层11及光栅部30;S403, position the first sub-mold 10a below the second sub-mold 30a along the direction of gravity, and solidify the first thermosetting resin glue to obtain the first conductive layer 11 and the grating portion 30;
关于S401至S403的详细描述,请参见上述实施例对应部分的描述,在此不再赘述。For detailed descriptions of S401 to S403, please refer to the descriptions of the corresponding parts of the above embodiments, which will not be described again here.
S404,对所述第一传导层11背离所述光栅部30的表面进行抛光,以使所述第一传导层11背离所述光栅部30表面的面精度PV1为PV1≤15nm;S404, polish the surface of the first conductive layer 11 facing away from the grating part 30, so that the surface precision PV1 of the first conductive layer 11 facing away from the grating part 30 is PV1≤15nm;
术语“PV”指表面上最高值与最低值之间的差值。PV值是衡量表面不平整度的一个衡量指标。The term "PV" refers to the difference between the highest and lowest value on a surface. The PV value is a measure of surface roughness.
可选地,采用抛光机对所述第一传导层11背离所述光栅部30的表面进行打磨抛光,以使所述第一传导层11背离所述光栅部30表面的面精度PV1为PV1≤15nm,从而使所述第一传导层11背离所述光栅部30的表面达到光学级的平面度。由于第一热固定树脂胶液发生聚合反应形成第一传导层11时,体积会发生收缩,因此,形成的第一传导层11背离光栅部30的表面会凹凸不平,因此,需要对第一传导层11背离光栅部30的表面进行抛光打磨,以使第一传导层11背离光栅部30的表面可以达到光学级的平面度,从而使得制得的光波导片100具有更好的图像显示效果。Optionally, a polishing machine is used to polish the surface of the first conductive layer 11 facing away from the grating part 30, so that the surface accuracy PV1 of the surface of the first conductive layer 11 facing away from the grating part 30 is PV1≤ 15 nm, so that the surface of the first conductive layer 11 facing away from the grating portion 30 reaches an optical level of flatness. When the first thermally fixed resin glue undergoes a polymerization reaction to form the first conductive layer 11, the volume will shrink. Therefore, the surface of the formed first conductive layer 11 away from the grating portion 30 will be uneven. Therefore, it is necessary to conduct the first conductive layer 11. The surface of the layer 11 facing away from the grating part 30 is polished so that the surface of the first conductive layer 11 facing away from the grating part 30 can reach optical grade flatness, so that the manufactured optical waveguide plate 100 has better image display effect.
S405,在所述第一传导层11背离所述光栅部30的表面注塑形成第二传导层13;S405, injection molding to form a second conductive layer 13 on the surface of the first conductive layer 11 away from the grating part 30;
S406,在所述第二传导层13背离所述第一传导层11的表面注入第二热固性树脂胶液;S406, inject a second thermosetting resin glue into the surface of the second conductive layer 13 facing away from the first conductive layer 11;
S407,对所述第二热固性树脂胶液进行固化,得到第三传导层15;以及S407, solidify the second thermosetting resin glue to obtain the third conductive layer 15; and
关于S405至S407的详细描述,请参见上述实施例对应部分的描述,在此不再赘述。For a detailed description of S405 to S407, please refer to the description of the corresponding part of the above embodiment, and details will not be described again here.
S408,对所述第三传导层15背离第二传导层13的表面进行抛光,以使所述第三传导层15背离第二传导层13的表面的面精度PV2为PV2≤15nm。S408: Polish the surface of the third conductive layer 15 facing away from the second conductive layer 13 so that the surface precision PV2 of the surface of the third conductive layer 15 facing away from the second conductive layer 13 is PV2≤15 nm.
可选地,采用抛光机对所述第三传导层15背离第二传导层13的表面进行打磨抛光,以使所述第三传导层15背离第二传导层13的表面的面精度PV1为PV1≤15nm,从而使所述第三传导层15背离第二传导层13的表面达到光学级的平面度。由于第二热固定树脂胶液发生聚合反应形成第三传导层15时,体积会发生收缩,因此,形成的所述第三传导层15背离第二传导层13的表面会凹凸不平,因此,需要对所述第三传导层15背离第二传导层13的表面进行抛光打磨,以使所述第三传导层15背离第二传导层13的表面可以达到光学级的平面度,从而使得制得的光波导片100具有更好的图像显示效果。Optionally, a polishing machine is used to polish the surface of the third conductive layer 15 facing away from the second conductive layer 13, so that the surface precision PV1 of the surface of the third conductive layer 15 facing away from the second conductive layer 13 is PV1. ≤15 nm, so that the surface of the third conductive layer 15 facing away from the second conductive layer 13 reaches an optical level of flatness. Since the volume of the second heat-fixing resin glue polymerizes to form the third conductive layer 15, the volume will shrink. Therefore, the surface of the formed third conductive layer 15 facing away from the second conductive layer 13 will be uneven. Therefore, it is necessary to The surface of the third conductive layer 15 facing away from the second conductive layer 13 is polished so that the surface of the third conductive layer 15 facing away from the second conductive layer 13 can reach an optical level of flatness, so that the manufactured The optical waveguide plate 100 has better image display effect.
请参见图9,所述第一成型方法为注塑成型,所述第二成型方法为浇注成型;本申请实施例提供的光波导片100的制备方法包括:Referring to Figure 9, the first molding method is injection molding, and the second molding method is casting molding; the method for preparing the optical waveguide sheet 100 provided in the embodiment of the present application includes:
S501,采用注塑成型方法制得一体结构的所述第一传导层11与光栅部30,并制得所述第三传导层15;S501, use an injection molding method to prepare the first conductive layer 11 and the grating part 30 of an integrated structure, and prepare the third conductive layer 15;
如图10和图11所示,可选地,采用热塑性树脂例如聚碳酸酯,利用第一注塑模具P 及第二注塑模具Q,采用注塑成型方法,分别制得一体结构的所述第一传导层11与光栅部30、以及所述第三传导层15。由于高压注塑得到的第一传导层11与第二传导层13不会产生明显的体积收缩,因此,第一传导层11和第三传导层15均不需要进行打磨抛光。As shown in Figures 10 and 11, optionally, using a thermoplastic resin such as polycarbonate, the first injection mold P and the second injection mold Q, using an injection molding method to manufacture the first conductive layer 11 and the grating part 30 of an integrated structure, and the third conductive layer 15 respectively. Since the first conductive layer 11 and the second conductive layer 13 obtained by high-pressure injection molding will not undergo significant volume shrinkage, the first conductive layer 11 and the third conductive layer 15 do not need to be polished.
聚碳酸酯具有较高的折射率,可以使制得的光波导片100具有较大的视场角(FOV)。聚碳酸酯的热变形温度较高,通常为135℃左右,高于120℃,因此,不会在浇筑固化形成第二传导层13时产生软化现象。Polycarbonate has a high refractive index, which allows the manufactured optical waveguide plate 100 to have a large field of view (FOV). The thermal deformation temperature of polycarbonate is relatively high, usually about 135°C, higher than 120°C. Therefore, there will be no softening phenomenon when the second conductive layer 13 is formed during pouring and solidification.
关于第一传导层11、光栅部30及第三传导层15的详细描述,请参见上述实施例对应部分的描述,在此不再赘述。For detailed descriptions of the first conductive layer 11 , the grating portion 30 and the third conductive layer 15 , please refer to the descriptions of the corresponding parts of the above embodiments and will not be described again here.
S502,将所述第一传导层11与所述第三传导层15间隔设置于第二模具100b内,并使所述光栅部30背离所述第三传导层15;S502, arrange the first conductive layer 11 and the third conductive layer 15 in the second mold 100b at intervals, and make the grating part 30 away from the third conductive layer 15;
请一并参见图12,可选地,第二模具100b具有第二模腔101b,将第一传导层11安装于第二模具100b的第二模腔101b内的一侧,将第三传导层15安装于第二模腔101b内,与第一传导层11相背的一侧,以使第一传导层11与第二传导层13之间具有间隙,同时使得第一传导层11相较于光栅部30更靠近第三传导层15,换言之,光栅部30相较于第一传导层11更远离第三传导层15。可以理解地,安装完第一传导层11与第三传导层15后,第一传导层11面向第三传导层15的表面与第三传导层15面向第二传导层13的表面平行。Please refer to Figure 12 together. Optionally, the second mold 100b has a second mold cavity 101b. The first conductive layer 11 is installed on one side of the second mold cavity 101b of the second mold 100b, and the third conductive layer 11 is installed on one side of the second mold cavity 101b. 15 is installed in the second mold cavity 101b on the side opposite to the first conductive layer 11, so that there is a gap between the first conductive layer 11 and the second conductive layer 13, and at the same time, the first conductive layer 11 is compared with The grating portion 30 is closer to the third conductive layer 15 . In other words, the grating portion 30 is further away from the third conductive layer 15 than the first conductive layer 11 . It can be understood that after the first conductive layer 11 and the third conductive layer 15 are installed, the surface of the first conductive layer 11 facing the third conductive layer 15 is parallel to the surface of the third conductive layer 15 facing the second conductive layer 13 .
可选地,第一传导层11与第三传导层15之间的间隙的宽度,即第一传导层11面向第三传导层15的表面与第三传导层15面向第二传导层13的表面之间的垂直距离的范围为0.01mm至0.1mm。换言之,调节第一传导层11与第三传导层15之间的间距,从而使得他们的间距为第二传导层13的厚度。Optionally, the width of the gap between the first conductive layer 11 and the third conductive layer 15 , that is, the surface of the first conductive layer 11 facing the third conductive layer 15 and the surface of the third conductive layer 15 facing the second conductive layer 13 The vertical distance between them ranges from 0.01mm to 0.1mm. In other words, the distance between the first conductive layer 11 and the third conductive layer 15 is adjusted so that the distance between them is the thickness of the second conductive layer 13 .
在一些实施例中,第二模具100b还具有凹槽103b,所述凹槽103b环绕所述第二模腔101b的外周缘设置,且所述凹槽103b与所述第二模腔101b连通。此时,所述将所述第一传导层11与所述第三传导层15间隔设置于第二模具100b内,包括将第一传导层11与第三传导层15间隔设置于所述第二模腔101b内,并使所述第一传导层11与所述第三传导层15之间的间隙连通所述凹槽103b。In some embodiments, the second mold 100b further has a groove 103b, the groove 103b is arranged around the outer periphery of the second mold cavity 101b, and the groove 103b is connected with the second mold cavity 101b. At this time, arranging the first conductive layer 11 and the third conductive layer 15 in the second mold 100b at intervals includes arranging the first conductive layer 11 and the third conductive layer 15 in the second mold 100b at intervals. In the mold cavity 101b, the gap between the first conductive layer 11 and the third conductive layer 15 is connected to the groove 103b.
可选地,凹槽103b设置于第二模腔101b外周侧的中间位置,这样可以使得所述第一传导层11与所述第三传导层15设置于第二模腔101b后,第一传导层11与第三传导层15之间形成的间隙可以更好地对准凹槽103b,与凹槽103b连通。Optionally, the groove 103b is disposed at the middle position on the outer circumferential side of the second mold cavity 101b, so that the first conductive layer 11 and the third conductive layer 15 can be disposed behind the second mold cavity 101b, and the first conductive layer The gap formed between the layer 11 and the third conductive layer 15 can better align the groove 103b and communicate with the groove 103b.
S503,在所述第一传导层11与所述第三传导层15之间的间隙中注入第三热固性树脂胶液;S503, inject the third thermosetting resin glue into the gap between the first conductive layer 11 and the third conductive layer 15;
可选地,往所述第一传导层11与所述第三传导层15之间的间隙中注满第三热固性树脂胶液。Optionally, the gap between the first conductive layer 11 and the third conductive layer 15 is filled with a third thermosetting resin glue.
可选地,第三热固性树脂胶液可以包括热固性树脂单体以及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯等中的至少一种。固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺等中的至少一种。Optionally, the third thermosetting resin glue may include a thermosetting resin monomer and a curing agent. The thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, urethane, etc. The curing agent includes at least one of tert-butyl peroxide neodecanoate, isophorone diamine, ethylene diamine, methylene bicyclohexanamine, and the like.
可选地,当第二模具100b还具有凹槽103b时,所述方法还包括往所述凹槽103b内注入第三热固性树脂胶液。换言之,在所述第一传导层11与所述第三传导层15之间的间隙以及凹槽103b内均注入第三热固性树脂胶液。 Optionally, when the second mold 100b also has a groove 103b, the method further includes injecting a third thermosetting resin glue into the groove 103b. In other words, the third thermosetting resin glue is injected into the gap between the first conductive layer 11 and the third conductive layer 15 and into the groove 103b.
第三热固性树脂胶液发生聚合反应进行固化时,会发生体积收缩,第一层与第三层之间的间隙较小,在凹槽103b内也注入第三热固性树脂胶液,这样在第三热固性树脂胶液发生聚合反应进行固化且体积发生收缩时,能够通过毛细力的作用,从凹槽103b内抽取一定的第三热固性刷知胶液(即凹槽103b内的第三热固性树脂胶液会在毛细力的作用下,往第一传导层11与第三传导层15之间的间隙流动),从而使得第一传导层11与第三传导层15之间始终维持填充的状态,第一传导层11与第三传导层15之间的出现填充不满或分层等不良现象。When the third thermosetting resin glue undergoes a polymerization reaction and solidifies, volume shrinkage occurs, and the gap between the first layer and the third layer is small. The third thermosetting resin glue is also injected into the groove 103b, so that in the third layer When the thermosetting resin glue undergoes a polymerization reaction to solidify and shrinks in volume, a certain amount of the third thermosetting resin glue (i.e., the third thermosetting resin glue in the groove 103b) can be extracted from the groove 103b through the action of capillary force. will flow into the gap between the first conductive layer 11 and the third conductive layer 15 under the action of capillary force), so that the first conductive layer 11 and the third conductive layer 15 always maintain a filled state. Undesirable phenomena such as insufficient filling or delamination occur between the conductive layer 11 and the third conductive layer 15 .
关于第三热固性树脂胶液的其它方面的详细描述,请参见上述实施例对第一热塑性树脂的描述,在此不再赘述。For detailed description of other aspects of the third thermosetting resin glue, please refer to the description of the first thermoplastic resin in the above embodiments, which will not be described again here.
S504,对所述第三热固性树脂胶液进行固化,以得到第二传导层13。S504, solidify the third thermosetting resin glue to obtain the second conductive layer 13.
可选地,对第三热固性树脂胶液进行加热(例如,加热至70℃至120℃),以使热固性树脂单体与固化剂发生聚合反应,从而形成热固性树脂层,即第二传导层13。Optionally, the third thermosetting resin glue liquid is heated (for example, heated to 70°C to 120°C) to cause a polymerization reaction between the thermosetting resin monomer and the curing agent to form a thermosetting resin layer, that is, the second conductive layer 13 .
请参见图13和图14,本申请实施例还提供一种增强现实设备500,其包括:投影光机510及本申请的光波导片100。所述投影光机510用于投射光信号,所述光信号包括图像信息;所述光波导片100设置于所述投影光机510的出射面,用于将所述光信号进行传输。可以理解地,光波导片100的光栅部30背离所述投影光机510设置。Referring to Figures 13 and 14, an embodiment of the present application also provides an augmented reality device 500, which includes: a projection light machine 510 and the optical waveguide sheet 100 of the present application. The projection light engine 510 is used to project light signals, and the light signals include image information; the optical waveguide plate 100 is disposed on the exit surface of the projection light engine 510 and is used to transmit the light signals. It can be understood that the grating portion 30 of the optical waveguide plate 100 is arranged away from the projection light machine 510 .
可选地,投影光机510包括显示器511及镜头513。显示器511用于出射光信号,镜头513设置于显示器511的显示面侧,用于对光信号进行调制,以使得显示器511上同一个像素点出射的不同视场角的光线(光信号),经过镜头513调制后,以平行光的形式出射,以将光信号中的图像信息在无穷远的位置,以便肉眼可以观看到。光波导片100设置于镜头513背离显示器511的一侧,用于将经镜头513调制后的光信号进行传输。Optionally, the projection light machine 510 includes a display 511 and a lens 513. The display 511 is used to emit light signals, and the lens 513 is provided on the display surface side of the display 511 to modulate the light signals, so that the light rays (light signals) of different viewing angles emitted from the same pixel point on the display 511 pass through After modulation, the lens 513 emits in the form of parallel light to place the image information in the optical signal at an infinite distance so that it can be viewed by the naked eye. The optical waveguide 100 is disposed on the side of the lens 513 away from the display 511 and is used for transmitting the optical signal modulated by the lens 513 .
本申请的增强现实设备500可以为但不限于为增强现实眼镜(AR眼镜)、增强现实头盔、增强现实面罩等近眼显示设备。The augmented reality device 500 of the present application may be, but is not limited to, near-eye display devices such as augmented reality glasses (AR glasses), augmented reality helmets, and augmented reality masks.
可选地,显示器511可以为微显示器。显示器511包括发光单元,发光单元可以包括但不限于包括微型发光二极管(Micro Light Emitting Diode,Micro LED)芯片、微有机发光二极管(Micro Organic Light-Emitting Diode,Micro OLED)芯片或微型液晶显示屏(Micro liquid crystal display,Micro LCD)中的至少一种。在相同的工作功率条件下,Micro OLED的亮度通常小于5000nits,LCD的亮度通常小于15000nits,而Micro LED的亮度可达2000000nits,远高于前两者。因此,相较于Micro OLED显示器及Micro LCD显示器,当显示器511为Micro LED显示器时,其输出的图像具有更高的亮度。相较于Micro LCD显示器,Micro LED显示器是自发光光源,应用于增强现实设备500时具有更好的对比度及更小的显示延迟。Alternatively, display 511 may be a microdisplay. The display 511 includes a light emitting unit, which may include, but is not limited to, a micro light emitting diode (Micro Light Emitting Diode, Micro LED) chip, a micro organic light emitting diode (Micro Organic Light-Emitting Diode, Micro OLED) chip or a micro liquid crystal display ( At least one of Micro liquid crystal display, Micro LCD). Under the same operating power conditions, the brightness of Micro OLED is usually less than 5000nits, the brightness of LCD is usually less than 15000nits, and the brightness of Micro LED can reach 2000000nits, which is much higher than the former two. Therefore, compared with Micro OLED displays and Micro LCD displays, when the display 511 is a Micro LED display, the image output by it has higher brightness. Compared with Micro LCD displays, Micro LED displays are self-illuminating light sources and have better contrast and smaller display delays when applied to the augmented reality device 500.
在一些实施例中,显示面上能够出射光信号的区域成为有效发光区域,显示器511的有效发光区域对角线尺寸的范围为0.11inch至0.15inch,有效发光区域长宽比为4:3。在另一些实施例中,显示器511的有效发光区域对角线尺寸的范围为0.17inch至0.21inch,有效发光区域长宽比为16:9。可选地,显示器511出射的光线的颜色可以为但不限于为红光、绿光、蓝光等中的至少一种。在一具体实施例中,显示器511为出射绿光的Micro LED,在另一些实施例中,也可以为其它单色光Micro LED或复色光Micro LED。In some embodiments, the area on the display surface that can emit light signals becomes the effective light-emitting area. The diagonal size of the effective light-emitting area of the display 511 ranges from 0.11 inch to 0.15 inch, and the effective light-emitting area aspect ratio is 4:3. In other embodiments, the diagonal size of the effective light-emitting area of the display 511 ranges from 0.17 inch to 0.21 inch, and the effective light-emitting area aspect ratio is 16:9. Optionally, the color of the light emitted by the display 511 may be, but is not limited to, at least one of red light, green light, blue light, etc. In a specific embodiment, the display 511 is a Micro LED that emits green light. In other embodiments, it can also be another monochromatic light Micro LED or a multi-color light Micro LED.
在一些实施例中,光波导片100还可以对镜头513出射的光信号中的图像信息在一维 或二维上进行扩瞳,以增大动眼眶的范围,从而适应更多的人群。In some embodiments, the optical waveguide 100 can also detect the image information in the optical signal emitted by the lens 513 in one dimension. Or dilate the pupil in two dimensions to increase the range of orbital movement, thereby adapting to more people.
在一些实施例中,本申请的增强现实设备500还包括承载件550,所述承载件550用于承载光波导片100。可选地,承载件550可以为但不限于为增强现实眼镜的镜框、增强现实头盔的头盔本体、增强现实面罩的面罩本体等。可选地,光波导片100可以通过粘合剂或紧固部分等设置于承载件550上。In some embodiments, the augmented reality device 500 of the present application further includes a carrying member 550 , which is used to carry the optical waveguide sheet 100 . Optionally, the carrier 550 may be, but is not limited to, a frame of augmented reality glasses, a helmet body of an augmented reality helmet, a mask body of an augmented reality mask, etc. Alternatively, the optical waveguide sheet 100 may be disposed on the carrier 550 through adhesive or fastening parts.
在一些实施例中,当增强现实设备500为增强现实眼镜时,本申请实施例的增强现实设备500还包括佩戴件530。佩戴件530与承载件550可转动连接,佩戴件530用于夹持佩戴者(如人体头部、或者头部假体等)。In some embodiments, when the augmented reality device 500 is augmented reality glasses, the augmented reality device 500 in this embodiment of the present application further includes a wearing piece 530 . The wearing part 530 is rotatably connected to the carrying part 550, and the wearing part 530 is used to hold the wearer (such as a human head or a head prosthesis, etc.).
可选地,佩戴件530包括第一佩戴子件531及第二佩戴子件533,第一佩戴子件531可转动连接于承载件550的一端,第二佩戴子件533可转动连接于承载件550远离第一佩戴子件531的另一端。第一佩戴子件531与第二佩戴子件533配合,用于将增强现实设备500夹持于佩戴者。可选地,第一佩戴子件531及第二佩戴子件533还用于设置投影光机。Optionally, the wearing part 530 includes a first wearing part 531 and a second wearing part 533. The first wearing part 531 is rotatably connected to one end of the carrying part 550, and the second wearing part 533 is rotatably connected to the carrying part. 550 is away from the other end of the first wearing component 531 . The first wearing component 531 cooperates with the second wearing component 533 to clamp the augmented reality device 500 to the wearer. Optionally, the first wearing component 531 and the second wearing component 533 are also used to set the projector.
可选地,所述第一佩戴子件531与所述第二佩戴子件533均可以为但不限于为增强现实设备500(AR眼镜)的镜腿。Optionally, both the first wearing component 531 and the second wearing component 533 may be, but are not limited to, temples of the augmented reality device 500 (AR glasses).
请参见图15,本申请实施例的增强现实设备500还包括处理器540及存储器560。处理器540与显示器511电连接,用于控制显示器511出射具有图像信息的光信号等。存储器560与处理器540电连接,用于存储处理器540运行所需的程序代码,控制显示器511所需的程序代码、显示器511出射的图像信息等。Referring to Figure 15, the augmented reality device 500 in this embodiment of the present application also includes a processor 540 and a memory 560. The processor 540 is electrically connected to the display 511 and is used to control the display 511 to emit light signals containing image information, etc. The memory 560 is electrically connected to the processor 540 and is used to store program codes required for the operation of the processor 540, program codes required for controlling the display 511, image information emitted by the display 511, etc.
可选地,处理器540包括一个或者多个通用处理器,其中,通用处理器可以是能够处理电子指令的任何类型的设备,包括中央处理器(Central Processing Unit,CPU)、微处理器、微控制器、主处理器、控制器以及ASIC等等。处理器540用于执行各种类型的数字存储指令,例如存储在存储器560中的软件或者固件程序,它能使计算设备提供较宽的多种服务。Optionally, the processor 540 includes one or more general-purpose processors, where the general-purpose processor can be any type of device capable of processing electronic instructions, including a central processing unit (Central Processing Unit, CPU), a microprocessor, a microprocessor, Controllers, main processors, controllers, ASICs, etc. The processor 540 is used to execute various types of digital storage instructions, such as software or firmware programs stored in the memory 560, which can enable the computing device to provide a wide variety of services.
可选地,存储器560可以包括易失性存储器(Volatile Memory),例如随机存取存储器(Random Access Memory,RAM);存储器560也可以包括非易失性存储器(Non-Volatile Memory,NVM),例如只读存储器(Read-Only Memory,ROM)、快闪存储器(Flash Memory,FM)、硬盘(Hard Disk Drive,HDD)或固态硬盘(Solid-State Drive,SSD)。存储器560还可以包括上述种类的存储器的组合。Optionally, the memory 560 may include volatile memory (Volatile Memory), such as random access memory (Random Access Memory, RAM); the memory 560 may also include non-volatile memory (Non-Volatile Memory, NVM), such as Read-Only Memory (ROM), Flash Memory (FM), Hard Disk Drive (HDD) or Solid-State Drive (SSD). Memory 560 may also include a combination of the types of memory described above.
可以理解地,本实施方式中的增强现实设备500仅仅为光波导片100所应用的增强现实设备500的一种形态,不应当理解为对本申请提供的增强现实设备500的限定。It can be understood that the augmented reality device 500 in this embodiment is only a form of the augmented reality device 500 applied to the optical waveguide sheet 100, and should not be understood as a limitation of the augmented reality device 500 provided in this application.
在本申请中提及“实施例”“实施方式”意味着,结合实施例描述的特定特征、结构或特性可以包含在本申请的至少一个实施例中。在说明书中的各个位置出现所述短语并不一定均是指相同的实施例,也不是与其它实施例互斥的独立的或备选的实施例。本领域技术人员显式地和隐式地理解的是,本申请所描述的实施例可以与其它实施例相结合。此外,还应该理解的是,本申请各实施例所描述的特征、结构或特性,在相互之间不存在矛盾的情况下,可以任意组合,形成又一未脱离本申请技术方案的精神和范围的实施例。Reference in this application to "an embodiment" or "an implementation" means that a particular feature, structure or characteristic described in connection with the embodiment may be included in at least one embodiment of the application. The appearances of recited phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those skilled in the art understand explicitly and implicitly that the embodiments described herein may be combined with other embodiments. In addition, it should also be understood that the features, structures or characteristics described in the embodiments of the present application can be arbitrarily combined to form another structure without departing from the spirit and scope of the technical solution of the present application, provided there is no contradiction between them. embodiment.
最后应说明的是,以上实施方式仅用以说明本申请的技术方案而非限制,尽管参照以上较佳实施方式对本申请进行了详细说明,本领域的普通技术人员应当理解,可以对本申请的技术方案进行修改或等同替换都不应脱离本申请技术方案的精神和范围。 Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application and are not limiting. Although the present application has been described in detail with reference to the above preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present application can be modified. Any modification or equivalent substitution of the solution shall not depart from the spirit and scope of the technical solution of this application.

Claims (20)

  1. 一种光波导片,其特征在于,包括:An optical waveguide sheet, characterized by including:
    光传导部,所述光传导部包括依次层叠设置的第一传导层、第二传导层及第三传导层;所述第一传导层的折射率大于所述第二传导层的折射率,且所述第三传导层的折射率大于所述第二传导层的折射率;以及The light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence; the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and The refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; and
    光栅部,所述光栅部包括光耦入部及光耦出部,所述光耦入部及所述光耦出部间隔设置于所述第一传导层背离所述第二传导层的表面。The grating part includes a light coupling part and a light coupling part, and the light coupling part and the light coupling part are spaced apart on the surface of the first conductive layer facing away from the second conductive layer.
  2. 根据权利要求1所述的光波导片,其特征在于,所述第一传导层、所述第二传导层、所述第三传导层及所述光栅部为一体结构。The optical waveguide sheet according to claim 1, wherein the first conductive layer, the second conductive layer, the third conductive layer and the grating part are of an integrated structure.
  3. 根据权利要求1所述的光波导片,其特征在于,沿所述第一传导层、所述第二传导层及所述第三传导层的层叠方向上,所述第一传导层的厚度h1大于所述第二传导层的厚度h2,所述第三传导层的厚度h3大于所述第二传导层的厚度h2The optical waveguide sheet according to claim 1, characterized in that, along the stacking direction of the first conductive layer, the second conductive layer and the third conductive layer, the thickness h of the first conductive layer 1 is greater than the thickness h 2 of the second conductive layer, and the thickness h 3 of the third conductive layer is greater than the thickness h 2 of the second conductive layer.
  4. 根据权利要求3所述的光波导片,其特征在于,沿所述第一传导层、所述第二传导层及所述第三传导层的层叠方向上,所述第一传导层的厚度h1与所述第二传导层的厚度h2的比值h1/h2的范围为7:1≤h1/h2≤10:1,所述第三传导层的厚度h3与所述第二传导层的厚度h2的比值h3/h2的范围为10≤h3/h2≤14:1。The optical waveguide sheet according to claim 3, characterized in that, along the stacking direction of the first conductive layer, the second conductive layer and the third conductive layer, the thickness h of the first conductive layer The ratio h 1 /h 2 of 1 to the thickness h 2 of the second conductive layer is in the range of 7:1≤h 1 /h 2 ≤10:1, and the thickness h 3 of the third conductive layer is in the range of 7:1≤h 1 /h 2 ≤10:1. The ratio h 3 /h 2 of the thickness h 2 of the two conductive layers ranges from 10 ≤ h 3 /h 2 ≤ 14:1.
  5. 根据权利要求3所述的光波导片,其特征在于,沿所述第一传导层、所述第二传导层及所述第三传导层的层叠方向上,所述第一传导层的厚度h1的范围为0.2mm≤h1≤3mm,所述第二传导层的厚度h2的范围为0.01mm≤h2≤0.1mm,所述第三传导层的厚度h3的范围为0.2mm≤h3≤3mm。The optical waveguide sheet according to claim 3, characterized in that, along the stacking direction of the first conductive layer, the second conductive layer and the third conductive layer, the thickness h1 of the first conductive layer The range of the thickness h2 of the second conductive layer is 0.2mm≤h1≤3mm, the range of the thickness h2 of the second conductive layer is 0.01mm≤h2≤0.1mm, and the range of the thickness h3 of the third conductive layer is 0.2mm≤h3≤3mm.
  6. 根据权利要求3所述的光波导片,其特征在于,所述第一传导层的折射率n1等于所述第三传导层的折射率n3The optical waveguide sheet according to claim 3, wherein the refractive index n 1 of the first conductive layer is equal to the refractive index n 3 of the third conductive layer.
  7. 根据权利要求6所述的光波导片,其特征在于,所述光波导片满足以下关系式:
    2(h1+h3)tanθ1=2h3×tanθ2;以及
    θ2≥sin-1(n2/n1);
    The optical waveguide plate according to claim 6, characterized in that the optical waveguide plate satisfies the following relational expression:
    2(h 1 +h 3 )tanθ 1 =2h 3 ×tanθ 2 ; and θ 2 ≥ sin -1 (n 2 /n 1 );
    其中,n2为所述第一传导层的折射率,θ1为当光传导部为单层、厚度h=h1+h3、折射率为n1时,光线垂直入射至光波导片,在单层光传导部内的衍射角;θ2为光线在所述光波导片内的衍射角。Among them, n 2 is the refractive index of the first conductive layer, θ 1 is when the light conductive part is a single layer, the thickness h=h 1 + h 3 and the refractive index n 1 , the light is vertically incident on the optical waveguide sheet, The diffraction angle in the single-layer light transmission part; θ 2 is the diffraction angle of light in the optical waveguide plate.
  8. 根据权利要求1至7任一项所述的光波导片,其特征在于,所述第一传导层的折射率n1的范围为1.55≤n1≤2.0;所述第二传导层的折射率n2的范围为1.35≤n2≤1.6;所述第三传导层的折射率n3的范围为1.55≤n3≤2.0。 The optical waveguide sheet according to any one of claims 1 to 7, characterized in that the refractive index n1 of the first conductive layer is in the range of 1.55≤n1≤2.0; the refractive index n2 of the second conductive layer is in the range of 1.55≤n1≤2.0. The range is 1.35≤n2≤1.6; the range of the refractive index n3 of the third conductive layer is 1.55≤n3≤2.0.
  9. 根据权利要求1至7任一项所述的光波导片,其特征在于,所述第一传导层与所述第三传导层均为热固性树脂层,所述第二传导层为热塑性树脂层;或者,所述第一传导层与所述第三传导层均为热塑性树脂层,所述第二传导层为热固性树脂层。The optical waveguide sheet according to any one of claims 1 to 7, wherein the first conductive layer and the third conductive layer are both thermosetting resin layers, and the second conductive layer is a thermoplastic resin layer; Alternatively, the first conductive layer and the third conductive layer are both thermoplastic resin layers, and the second conductive layer is a thermosetting resin layer.
  10. 根据权利要求9所述的光波导片,其特征在于,所述热塑性树脂层包括聚碳酸酯。The optical waveguide sheet according to claim 9, wherein the thermoplastic resin layer includes polycarbonate.
  11. 一种光波导片的制备方法,其特征在于,所述光波导片包括光传导部及光栅部,所述光传导部包括依次层叠设置的第一传导层、第二传导层及第三传导层,所述第一传导层的折射率大于所述第二传导层的折射率,且所述第三传导层的折射率大于所述第二传导层的折射率;所述光栅部设置于所述第一传导层背离所述第二传导层的表面;所述方法包括:A method for preparing an optical waveguide sheet, characterized in that the optical waveguide sheet includes a light conductive part and a grating part, and the light conductive part includes a first conductive layer, a second conductive layer and a third conductive layer that are stacked in sequence. , the refractive index of the first conductive layer is greater than the refractive index of the second conductive layer, and the refractive index of the third conductive layer is greater than the refractive index of the second conductive layer; the grating portion is disposed on the A surface of the first conductive layer facing away from the second conductive layer; the method includes:
    采用第一成型方法形成第一传导层及光栅部;Using the first molding method to form the first conductive layer and the grating part;
    采用第二成型方法形成第二传导层;以及using a second forming method to form the second conductive layer; and
    采用第一成型方法形成第三传导层;Using the first forming method to form the third conductive layer;
    其中,所述第一成型方法为注塑成型或浇注成型,所述第二成型方法为注塑成型或浇注成型,所述第一成型方法与所述第二成型方法不同。Wherein, the first molding method is injection molding or pouring molding, the second molding method is injection molding or pouring molding, and the first molding method is different from the second molding method.
  12. 根据权利要求11所述的光波导片的制备方法,其特征在于,所述第一成型方法为浇注成型,所述第二成型方法为注塑成型,所述方法包括:The method for preparing an optical waveguide plate according to claim 11, wherein the first molding method is casting molding, the second molding method is injection molding, and the method includes:
    提供第一模具,所述第一模具包括第一子模及第二子模,所述第一子模与所述第二子模围合成第一模腔,所述第一子模具有面向所述第一模腔的光栅纹理,所述光栅纹理与所述光栅部的结构互补;A first mold is provided. The first mold includes a first sub-mold and a second sub-mold. The first sub-mold and the second sub-mold enclose a first mold cavity. The first sub-mold has a surface facing the The grating texture of the first mold cavity, the grating texture is complementary to the structure of the grating part;
    在所述第一模腔内注入第一热固性树脂胶液;Inject a first thermosetting resin glue into the first mold cavity;
    对所述第一热固性树脂胶液进行固化,得到第一传导层及光栅部;Solidify the first thermosetting resin glue to obtain a first conductive layer and a grating portion;
    在所述第一传导层背离所述光栅部的表面注塑形成第二传导层;A second conductive layer is formed by injection molding on the surface of the first conductive layer facing away from the grating part;
    在所述第二传导层背离所述第一传导层的表面注入第二热固性树脂胶液;以及Inject a second thermosetting resin glue into the surface of the second conductive layer facing away from the first conductive layer; and
    对所述第二热固性树脂胶液进行固化,得到第三传导层。The second thermosetting resin glue is solidified to obtain a third conductive layer.
  13. 根据权利要求12所述的光波导片的制备方法,其特征在于,所述对所述第一热固性树脂胶液进行固化,得到第一传导层及光栅部,包括:The method for preparing an optical waveguide plate according to claim 12, wherein the step of solidifying the first thermosetting resin glue to obtain the first conductive layer and the grating part includes:
    沿重力方向上,使第一子模位于第二子模的下方,对所述第一热固性树脂胶液进行固化,以得到第一传导层及光栅部。Along the direction of gravity, the first sub-mold is positioned below the second sub-mold, and the first thermosetting resin glue is solidified to obtain the first conductive layer and the grating portion.
  14. 根据权利要求12所述的光波导片的制备方法,其特征在于,所述对所述第一热固性树脂胶液进行固化,得到第一传导层及光栅部之后,所述在所述第一传导层背离所述光栅部的表面注塑形成第二传导层之前,所述方法还包括:The method for preparing an optical waveguide according to claim 12, wherein after the first thermosetting resin glue is cured to obtain the first conductive layer and the grating portion, the first conductive layer is Before the surface of the layer facing away from the grating part is injection molded to form the second conductive layer, the method further includes:
    对所述第一传导层背离所述光栅部的表面进行抛光,以使所述第一传导层背离所述光栅部表面的面精度PV1为PV1≤15nm; Polish the surface of the first conductive layer facing away from the grating part so that the surface precision PV1 of the first conductive layer facing away from the grating part is PV1≤15nm;
    所述对所述第二热固性树脂胶液进行固化,得到第三传导层之后,所述方法还包括:After the second thermosetting resin glue is cured to obtain the third conductive layer, the method further includes:
    对所述第三传导层背离第二传导层的表面进行抛光,以使所述第三传导层背离第二传导层的表面的面精度PV2为PV2≤15nm。The surface of the third conductive layer facing away from the second conductive layer is polished so that the surface precision PV2 of the surface of the third conductive layer facing away from the second conductive layer is PV2≤15 nm.
  15. 根据权利要求12至14中任一项所述的光波导片的制备方法,其特征在于,所述第二传导层为热塑性树脂层,所述热塑性树脂层包括聚碳酸酯;所述第一热固性树脂胶液和所述第二热固性树脂胶液均包括热固性树脂单体及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯中的至少一种,所述固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、亚甲基双环己烷胺中的至少一种。The method for preparing an optical waveguide sheet according to any one of claims 12 to 14, wherein the second conductive layer is a thermoplastic resin layer, and the thermoplastic resin layer includes polycarbonate; and the first thermosetting layer The resin glue liquid and the second thermosetting resin glue liquid both include thermosetting resin monomers and curing agents. The thermosetting resin monomers include propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethyl. At least one of acrylate, allyl ester, diallyl phthalate, and urethane, and the curing agent includes tert-butyl peroxyneodecanoate, isophorone diamine, and ethylene diamine. , at least one of methylene biscyclohexane amines.
  16. 根据权利要求11所述的光波导片的制备方法,其特征在于,所述第一成型方法为注塑成型,所述第二成型方法为浇注成型;所述方法包括:The method for preparing an optical waveguide plate according to claim 11, wherein the first molding method is injection molding, and the second molding method is casting molding; the method includes:
    采用注塑成型方法制得一体结构的所述第一传导层与光栅部,并制得所述第三传导层;Using an injection molding method to prepare the first conductive layer and the grating part of an integrated structure, and to prepare the third conductive layer;
    将所述第一传导层与所述第三传导层间隔设置于第二模具内,并使所述光栅部背离所述第三传导层;Arrange the first conductive layer and the third conductive layer at intervals in the second mold, with the grating portion facing away from the third conductive layer;
    在所述第一传导层与所述第三传导层之间的间隙中注入第三热固性树脂胶液;Inject a third thermosetting resin glue into the gap between the first conductive layer and the third conductive layer;
    对所述第三热固性树脂胶液进行固化,以得到第二传导层。The third thermosetting resin glue is cured to obtain a second conductive layer.
  17. 根据权利要求16所述的光波导片的制备方法,其特征在于,所述第二模具具有连通的第二模腔及凹槽,所述凹槽环绕所述第二模腔的外周缘设置,所述将所述第一传导层与所述第三传导层间隔设置于第二模具内,包括:The method for preparing an optical waveguide according to claim 16, wherein the second mold has a connected second mold cavity and a groove, and the groove is arranged around the outer periphery of the second mold cavity, The step of arranging the first conductive layer and the third conductive layer in the second mold at intervals includes:
    将第一传导层与第三传导层间隔设置于所述第二模腔内,并使所述第一传导层与所述第三传导层之间的间隙连通所述凹槽;Arrange the first conductive layer and the third conductive layer at intervals in the second mold cavity, and connect the gap between the first conductive layer and the third conductive layer to the groove;
    所述在所述第一传导层与所述第三传导层之间注入第三热固性树脂胶液,包括:Injecting a third thermosetting resin glue solution between the first conductive layer and the third conductive layer includes:
    在所述第一传导层与所述第三传导层之间的间隙以及凹槽内均注入第三热固性树脂胶液。A third thermosetting resin glue is injected into the gap and the groove between the first conductive layer and the third conductive layer.
  18. 根据权利要求16所述的光波导片的制备方法,其特征在于,所述将所述第一传导层与所述第三传导层间隔设置于第二模具内,包括:The method for manufacturing an optical waveguide sheet according to claim 16, wherein the step of arranging the first conductive layer and the third conductive layer in a second mold at intervals includes:
    将所述第一传导层与所述第三传导层间隔设置于第二模具内,以使所述第一传导层与所述第三传导层之间的间隙的宽度为0.01mm至0.1mm。The first conductive layer and the third conductive layer are spaced apart from each other in the second mold, so that the width of the gap between the first conductive layer and the third conductive layer is 0.01 mm to 0.1 mm.
  19. 根据权利要求16至18中任一项所述的光波导片的制备方法,其特征在于,所述第一传导层和所述第三传导层均为热塑性树脂层,所述热塑性树脂层包括聚碳酸酯;所述第三热固性树脂胶液包括热固性树脂单体及固化剂,所述热固性树脂单体包括碳酸丙烯酯、烯丙基二甘醇碳酸脂、丙烯腈、乙二醇二甲基丙烯酸酯、烯丙烯酯、酞酸二烯丙酯、胺基甲酸酯中的至少一种,所述固化剂包括过氧化新癸酸叔丁酯,异佛尔酮二胺、乙二胺、 亚甲基双环己烷胺中的至少一种。The method for preparing an optical waveguide according to any one of claims 16 to 18, wherein the first conductive layer and the third conductive layer are both thermoplastic resin layers, and the thermoplastic resin layer includes polyethylene. Carbonate; the third thermosetting resin glue includes a thermosetting resin monomer and a curing agent. The thermosetting resin monomer includes propylene carbonate, allyl diglycol carbonate, acrylonitrile, and ethylene glycol dimethacrylic acid. At least one of ester, allyl ester, diallyl phthalate, and urethane, the curing agent includes tert-butyl peroxyneodecanoate, isophorone diamine, ethylene diamine, At least one kind of methylene biscyclohexane amine.
  20. 一种增强现实设备,其特征在于,包括:An augmented reality device, characterized by including:
    投影光机,所述投影光机用于投射光信号,所述光信号包括图像信息;以及A projection light engine, the projection light engine is used to project light signals, the light signals include image information; and
    权利要求1至10任一项所述的光波导片,所述光波导片用于将所述光信号进行传输。 The optical waveguide plate according to any one of claims 1 to 10, said optical waveguide plate being used to transmit the optical signal.
PCT/CN2023/100689 2022-09-08 2023-06-16 Optical waveguide sheet and manufacturing method therefor, and augmented reality device WO2024051257A1 (en)

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