WO2024021979A1 - Oxime ester photoinitiator, preparation method therefor and use thereof - Google Patents

Oxime ester photoinitiator, preparation method therefor and use thereof Download PDF

Info

Publication number
WO2024021979A1
WO2024021979A1 PCT/CN2023/103405 CN2023103405W WO2024021979A1 WO 2024021979 A1 WO2024021979 A1 WO 2024021979A1 CN 2023103405 W CN2023103405 W CN 2023103405W WO 2024021979 A1 WO2024021979 A1 WO 2024021979A1
Authority
WO
WIPO (PCT)
Prior art keywords
reaction
oxime ester
substituted
nitrite
group
Prior art date
Application number
PCT/CN2023/103405
Other languages
French (fr)
Chinese (zh)
Inventor
钱彬
Original Assignee
常州强力电子新材料股份有限公司
常州强力先端电子材料有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 常州强力电子新材料股份有限公司, 常州强力先端电子材料有限公司 filed Critical 常州强力电子新材料股份有限公司
Publication of WO2024021979A1 publication Critical patent/WO2024021979A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • C07D209/86Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/82Carbazoles; Hydrogenated carbazoles
    • C07D209/88Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/12Esters of phenols or saturated alcohols
    • C08F222/20Esters containing oxygen in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present application relates to the technical field of organic chemistry, specifically, to an oxime ester photoinitiator, its preparation method and application.
  • Oxime ester photoinitiators are widely used in the production of various photoresists due to their relatively excellent performance.
  • oxime ester initiators with carbazole as the parent group are an important type of oxime ester photoinitiators. Because of its relatively high sensitivity, it has attracted widespread attention from those skilled in the art. High-sensitivity oxime ester initiators have always been the goal pursued by industry technicians.
  • the patents CN103833872A, CN103819583A and CN110066225A respectively modified the molecular structure and red-shifted the absorption wavelength to improve the sensitivity, thereby obtaining high sensitivity under LED curing conditions. Initiator.
  • the main purpose of this application is to provide an oxime ester photoinitiator, its preparation method and application, so as to solve the problem that photoinitiators in the prior art cannot achieve both high sensitivity and low yellowing.
  • an oxime ester photoinitiator having a structure represented by general formula (I):
  • R 1 and R 2 are each independently selected from substituted or unsubstituted C 1 to C 20 alkyl, substituted or unsubstituted C 3 to C 20 cycloalkyl, substituted or unsubstituted Substituted C 6 to C 20 aryl group, substituted or unsubstituted C 4 to C 20 heteroaryl group, substituted or unsubstituted C 3 to C 20 alicyclic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, z is 1 or 0.
  • the substituent is selected from the C 3 to C 12 cycloalkyl group; optionally, in the substituted or unsubstituted C 1 to C 20 alkyl group, at least one -CH 2 - is substituted by -O- or -S-; in the substituted C 3 ⁇ C 20 cycloalkyl group, the substituent is selected from C 1 ⁇ C 10 linear or branched alkyl group; the substituted C 6 ⁇ In the C 20 aryl group, the substituent is selected from C 1 to C 6 linear or branched alkyl group, C 1 to C 10 linear or branched alkoxy group, C 1 to C 10 linear or branched alkoxy group.
  • alkylthio groups C 1 to C 8 linear or branched acyl groups, C 1 to C 8 linear or branched acyloxy groups, halogen atoms, cyano groups or nitro groups; substitution In the C 4 to C 20 heteroaryl group, the substituent is selected from C 1 to C 8 linear or branched alkyl group; in the substituted C 3 to C 20 alicyclic heterocyclic group, the substituent is selected from C 1 to C 6 linear or branched alkyl group.
  • R 1 and R 2 are each independently selected from a C 1 to C 20 alkyl group or a C 6 to C 20 aryl group; preferably, R 1 and R 2 are each independently selected from a methyl group, an ethyl group or a C 20 alkyl group. phenyl.
  • the oxime ester photoinitiator has a structure shown in any one of the structural formulas (1) to (13):
  • oxime ester photoinitiator is N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N-(2-aminoethyl)-2-aminoethyl-N
  • the preparation method includes the following steps: step S1, carbazole with raw material A Carry out substitution reaction to obtain intermediate a Step S2, combine intermediate a and raw material B Carry out the first Friedel-Crafts reaction to obtain intermediate b Step S3, combine intermediate b and raw material C Carry out the second Friedel-Crafts reaction to obtain intermediate c Step S4, react intermediate c with nitrite and/or nitrite ester oximation reaction to obtain intermediate d Step S5, perform an esterification reaction between intermediate d and acid anhydride and/or acid chloride to obtain an oxime ester photoinitiator Among them, X is F, Cl, Br or I, m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, and z is 1 or 0.
  • step S1 the substitution reaction is carried out under alkaline conditions, and the base is potassium hydroxide and/or sodium hydroxide; and/or, in step S2, the first Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride.
  • the solvent of the first Friedel-Crafts reaction is methylene chloride and/or dichloroethane; and/or, in step S3, the second Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride, and the solvent of the second Friedel-Crafts reaction is be methylene chloride and/or dichloroethane; and/or, in step S4, the nitrite is sodium nitrite and/or potassium nitrite, and the nitrite ester is ethyl nitrite, isoamyl nitrite and nitrite.
  • One or more isooctyl nitrates preferably, the oximation reaction is carried out under acidic conditions, the acid is concentrated hydrochloric acid and/or halogenated carboxylic acid, the halogenated carboxylic acid is chloroacetic acid or bromoacetic acid, the oximation reaction is
  • the solvent is one or more of ethyl acetate, tetrahydrofuran and dichloromethane; and/or, in step S5, the acid anhydride is acetic anhydride and/or benzoic anhydride, and the acid chloride is one of acetyl chloride, propionyl chloride and benzoyl chloride.
  • the esterification reaction is carried out under alkaline conditions, and the base is one or more of triethylamine, diisopropylethylamine and 4-dimethylaminopyridine.
  • step S1 the molar ratio of raw material A to carbazole is (1 ⁇ 1.1):1; preferably, the reaction temperature of the substitution reaction is 50 ⁇ 100°C; more preferably, the reaction temperature of the substitution reaction is 50 ⁇ 100°C. 80°C; and/or, in step S2, the molar ratio of raw material B to intermediate a is (1 ⁇ 1.1):1; preferably, the reaction temperature of the first Friedel-Crafts reaction is -10 ⁇ 10°C; more preferably, The reaction temperature of the first Friedel-Crafts reaction is 0-5°C; and/or, in step S3, the molar ratio of raw material C to intermediate b is (1-1.1):1; preferably, the reaction temperature of the second Friedel-Crafts reaction is is -10 ⁇ 10°C; more preferably, the reaction temperature of the second Friedel-Crafts reaction is 0 ⁇ 5°C; and/or, in step S4, the molar ratio of nitrite and/or nitrite ester to intermediate
  • the application of the oxime ester photoinitiator of the present application in photoresist is provided.
  • a photocurable composition including a photoinitiator, which is the oxime ester photoinitiator of the present application; preferably, in parts by weight, the photocurable composition includes 800 to 1000 parts of solvent, 100-300 parts of acrylate copolymer, 50-150 parts of dipentaerythritol hexaacrylate and 3-10 parts of oxime ester photoinitiator.
  • the oxime ester photoinitiator of the present application has a diketoxime ester structure, which greatly improves the sensitivity. It also improves the solubility by setting asymmetric substituents and limiting specific group types; moreover, its delocalized structure can reduce Fluctuation of groups improves yellowing properties.
  • the oxime ester photoinitiator of the present application has significantly improved solubility, excellent application performance in photocurable compositions, and not only has low yellowing properties when applied to photocurable compositions It has high sensitivity and can take into account both high sensitivity and low yellowing.
  • the oxime ester photoinitiator also has the advantages of easy synthesis and low cost, and has good application prospects in the field of photocuring.
  • Concentrated hydrochloric acid aqueous hydrochloric acid solution with a mass concentration of 38% and above.
  • an oxime ester photoinitiator having a structure represented by general formula (I):
  • R 1 and R 2 are each independently selected from substituted or unsubstituted C 1 to C 20 alkyl, substituted or unsubstituted C 3 to C 20 cycloalkyl, substituted or unsubstituted Substituted C 6 to C 20 aryl group, substituted or unsubstituted C 4 to C 20 heteroaryl group, substituted or unsubstituted C 3 to C 20 alicyclic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, z is 1 or 0.
  • the oxime ester photoinitiator of the present application has a diketoxime ester structure, which greatly improves the sensitivity; by setting asymmetric substituents and limiting specific group types, the solubility is improved; and its delocalized structure can reduce the number of radicals. The group fluctuates and improves the yellowing performance.
  • the oxime ester photoinitiator of the present application has significantly improved solubility. It has excellent application performance in photocurable compositions. When applied to photocurable compositions, it not only has the characteristics of low yellowing, but also has high sensitivity, and can achieve both high sensitivity and low yellowing.
  • the oxime ester photoinitiator also has the advantages of easy synthesis and low cost, and has good application prospects in the field of photocuring.
  • the substituent in the substituted C 1 to C 20 alkyl group, is selected from the group consisting of C 3 to C 12 cycloalkyl groups; optionally, substituted or unsubstituted C 1 to In the C 20 alkyl group, at least one -CH 2 - is substituted by -O- or -S-; in the substituted C 3 to C 20 cycloalkyl group, the substituent is selected from C 1 to C 10 straight chain or branched Alkyl group; in the substituted C 6 to C 20 aryl group, the substituent is selected from C 1 to C 6 linear or branched alkyl group, C 1 to C 10 linear or branched alkoxy group, C 1 to C 10 linear or branched alkylthio group, C 1 to C 8 linear or branched acyl group, C 1 to C 8 linear or branched acyloxy group, halogen atom, cyano group or nitro group One or more of them; in the substituted
  • R 1 and R 2 are independently selected from C 1 to C 20 alkyl groups or C 6 to C 20 aryl groups; preferably, R 1 and R 2 are independently selected from Methyl, ethyl or phenyl.
  • the oxime ester photoinitiator with the above substituents has higher sensitivity and lower yellowing property.
  • the oxime ester photoinitiator has a structure shown in any one of the structural formulas (1) to (13), and has better overall performance:
  • the oxime ester photoinitiator is Most preferably, the oxime ester photoinitiator is The oxime ester photoinitiator with the above structure has greater sensitivity and better solubility.
  • the substituents and delocalized structure can reduce group fluctuations and improve yellowing properties. Better, it has further improved solubility, can better balance high sensitivity and low yellowing, and is easier to synthesize and lower cost.
  • a method for preparing the oxime ester photoinitiator of the present application includes the following steps: Step S1, convert carbazole with raw material A Carry out substitution reaction to obtain intermediate a Step S2, combine intermediate a and raw material B Carry out the first Friedel-Crafts reaction to obtain intermediate b Step S3, combine intermediate b and raw material C Carry out the second Friedel-Crafts reaction to obtain intermediate c Step S4, perform an oximation reaction between intermediate c and nitrite and/or nitrite ester to obtain intermediate d.
  • Step S5 perform an esterification reaction between intermediate d and acid anhydride and/or acid chloride to obtain an oxime ester photoinitiator
  • X is F, Cl, Br or I
  • m is 1 or 1
  • n is 1 or 1
  • x is 1 or 1
  • y is 1 or 0.
  • z is 1 or 0.
  • carbazole and raw material A are first subjected to a substitution reaction to realize substitution of carbazole N-H to obtain intermediate a; then intermediate a and raw material B are subjected to the first Friedel-Crafts reaction, so that raw material B is connected to the carbazole benzene ring, Obtain intermediate b; continue to carry out the second Friedel-Crafts reaction between intermediate b and raw material C, so that raw material C is connected to another carbazole benzene ring to obtain intermediate c; then intermediate c is reacted with nitrite and/or nitrite The nitrate ester undergoes an oximation reaction to form an aldoxime structure to obtain intermediate d; finally, intermediate d is subjected to an esterification reaction with acid anhydride and/or acid chloride to form an oxime ester structure, thereby obtaining the oxime ester photoinitiator of the present application.
  • the preparation method of the present application has a simple process, does not produce polluting waste, has high product purity and high yield, and is suitable for industrial production.
  • the prepared oxime ester photoinitiator can have both high sensitivity and low yellowing.
  • the reaction reagents used are all known compounds in the prior art, and can be obtained commercially or conveniently prepared by existing synthesis methods.
  • the nitrite is sodium nitrite and/or potassium nitrite
  • the nitrite ester is ethyl nitrite, isoamyl nitrite and isooctyl nitrite.
  • the acid anhydride is acetic anhydride and/or benzoic anhydride
  • the acid chloride is one or more of acetyl chloride, propionyl chloride and benzoyl chloride.
  • step S1 the substitution reaction is carried out under alkaline conditions, and the base is potassium hydroxide and/or sodium hydroxide; and/or, in step S2, the first Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride, the first Friedel-Crafts reaction
  • the solvent is dichloromethane and/or dichloroethane; and/or, in step S3, the second Friedel-Crafts reaction is performed under the catalysis of aluminum trichloride, and the solvent of the second Friedel-Crafts reaction is dichloromethane and/or Or dichloroethane; and/or, in step S4, the oximation reaction is carried out under acidic conditions, the acid is concentrated hydrochloric acid and/or
  • the reactants added later in the reaction process can achieve a more complete reaction if the reactants added later are slightly excessive based on the proportion of the reaction formula.
  • the reaction temperature varies slightly depending on the type of raw materials.
  • the molar ratio of raw material A to carbazole is (1 ⁇ 1.1):1; preferably, the reaction temperature of the substitution reaction is 50 ⁇ 100°C; more preferably, the reaction temperature of the substitution reaction is 50 ⁇ 80°C; and/or, Step S2, the molar ratio of raw material B to intermediate a is (1 ⁇ 1.1):1; preferably, the reaction temperature of the first Friedel-Crafts reaction is -10 ⁇ 10°C; more preferably, the reaction temperature of the first Friedel-Crafts reaction The temperature is 0 ⁇ 5°C; and/or, Step S3, the molar ratio of raw material C to intermediate b is (1 ⁇ 1.1):1; preferably, the reaction temperature of the second Friedel-Crafts reaction is -10 ⁇ 10°C; more preferably, the
  • the application of the oxime ester photoinitiator in photoresist is also provided. It is especially suitable for UV-LED light curing systems, especially suitable for initiating under the action of 365nm light source. It has excellent sensitivity after application, and has the characteristics of low yellowing and high solubility.
  • the oxime ester photoinitiator of the present application can also be used in paints, coatings, inks, and molding materials. Specifically, it can be used in the production of base materials such as plastics, metals, glass, ceramics, wood, and walls.
  • Coatings for coating protective film materials such as hard coating agents, antifouling films, anti-reflective films, and impact buffer films; photocurable adhesives, adhesives, photodegradable coatings, coatings, and molded articles; holographic imaging materials Optical recording media, etc.; optical molding resins, such as inks (resins) for 3D printing, photoresists for electronic circuits and semiconductor manufacturing, photoresists for electronic materials such as color filters, black matrices, and dry films in displays, etc.
  • protective film materials such as hard coating agents, antifouling films, anti-reflective films, and impact buffer films
  • photocurable adhesives adhesives, photodegradable coatings, coatings, and molded articles
  • holographic imaging materials Optical recording media, etc.
  • optical molding resins such as inks (resins) for 3D printing, photoresists for electronic circuits and semiconductor manufacturing, photoresists for electronic materials such as color filters, black matrices, and dry
  • Interlayer insulation film, light extraction film, brightness enhancement film, sealing material including interlayer insulation film, light extraction film, brightness enhancement film, sealing material; printing inks such as screen printing, offset printing, gravure printing, etc., light curing ink for inkjet printing; lenses, lens arrays, optical waveguides, light guide plates , light diffusion plates, diffraction elements and other optical components; optical gaps, ribs, nanoimprint materials, quantum dots, OLEDs, etc.
  • a photocurable composition including a photoinitiator.
  • the photoinitiator is the oxime ester photoinitiator of the present application; preferably, in parts by weight, the photocurable composition
  • the composition includes 800 to 1000 parts of solvent, 100 to 300 parts of acrylate copolymer, 50 to 150 parts of dipentaerythritol hexaacrylate, and 3 to 10 parts of oxime ester photoinitiator.
  • the type of solvent for the above composition is not particularly limited as long as it can dissolve the raw materials and has no adverse effect on the reaction. It can be one or more of butanone, ethyl acetate, tetrahydrofuran and methylene chloride.
  • the photocurable composition not only has the characteristics of low yellowing, but also has high sensitivity, and can achieve both high sensitivity and low yellowing. It should be noted that the term "parts by weight" in this application has the same dimension, for example, they all represent 1g or 1kg.
  • Example 1 According to the method of Example 1 and replacing the corresponding raw materials, the following compounds 2 to 13 were prepared. Their structures and corresponding NMR characterization data are listed in Table 1 below.
  • Example 14 to 19 The difference between Examples 14 to 19 and Example 1 is that the molar ratio of reactants in each reaction is different. See Table 2 for details.
  • the photocurable compositions used in the photosensitivity tests in Examples 1 to 13 and Comparative Examples 1 to 4 of the present application were prepared according to the proportions in Table 5.
  • the photoinitiator is the oxime ester compound represented by the general formula (I) in the foregoing content of the application
  • the solubility of the oxime ester photoinitiator in propylene glycol methyl ether acetate is one of the index parameters that represents its solubility and measures the application performance of the photoinitiator.
  • Compounds with the structure shown in general formula (I) were selected and the solubility of compounds 1 to 13 and compounds A, B, C, and D in PGMEA at 25°C were tested respectively. The test results are shown in Table 6.
  • compositions of Examples 1 to 13 and Comparative Examples 1 to 4 were protected from light and stirred, and then coated on a 21-step scale using a #6 wire rod to form a coating film with a film thickness of about 15 ⁇ m.
  • Expose the coating film with an LED lamp (385nm) give an energy of 191mJ/ cm2 (100% light intensity, 8m/min*2 times), develop with 2% NaOH aqueous solution for 2 minutes after curing, rinse with tap water for 1 minute, and observe The test results of the gradient ruler are shown in Table 6.
  • Examples 1 to 13 and Comparative Examples 1 to 4 were fully stirred in a yellow light room, the composition was coated on tinplate using a 15# wire rod to form a coating film with a wet film thickness of 10 ⁇ m.
  • An X-Rite colorimeter was used to conduct a yellowing test, and the yellowing resistance of the light-cured resin was judged based on the ⁇ b value. The higher the ⁇ b value, the more obvious the yellowing and the worse the yellowing resistance.
  • the yellowing resistance test results of Examples 1 to 13 and Comparative Examples 1 to 4 are shown in Table 6.
  • the oxime ester initiator shown in formula (I) disclosed in the present application has excellent solubility in organic solvents, has the characteristics of high sensitivity and low yellowing after application, and is easy to Synthetic, low cost, and has good application prospects in the field of photocuring.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Indole Compounds (AREA)

Abstract

The present application provides an oxime ester photoinitiator, and a preparation method therefor and the use thereof. The oxime ester photoinitiator has a structure as shown in general formula (I), wherein R1 and R2 are each independently selected from a substituted or unsubstituted C1-C20 alkyl, a substituted or unsubstituted C3-C20 cycloalkyl, a substituted or unsubstituted C6-C20 aryl, a substituted or unsubstituted C4-C20 heteroaryl, and a substituted or unsubstituted C3-C20 cycloaliphatic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, and z is 1 or 0. The oxime ester photoinitiator of the present application has a diketone oxime ester structure and asymmetric substituents, and has a delocalization structure. Compared with an existing similar photoinitiator, the oxime ester photoinitiator has significantly improved solubility, can take both high sensitivity and low yellowing into consideration when applied to a photocurable composition, and has good application prospects.

Description

肟酯光引发剂、其制备方法及应用Oxime ester photoinitiator, its preparation method and application
本申请要求申请日为2022年7月27日的中国专利申请202210893632.X的优先权。本申请引用上述中国专利申请的全文。This application claims priority from Chinese patent application 202210893632.X with a filing date of July 27, 2022. This application cites the full text of the above-mentioned Chinese patent application.
技术领域Technical field
本申请涉及有机化学技术领域,具体而言,涉及一种肟酯光引发剂、其制备方法及应用。The present application relates to the technical field of organic chemistry, specifically, to an oxime ester photoinitiator, its preparation method and application.
背景技术Background technique
肟酯类光引发剂以其相对优异的性能被广泛应用于各种光刻胶的制作,其中以咔唑为母体基团的肟酯引发剂是肟酯类光引发剂中的重要一类,由于其具有相对较高的感度得到本领域技术人员广泛关注。高感度肟酯引发剂一直是行业技术人员追求的目标,专利CN103833872A、CN103819583A和CN110066225A分别通过对分子结构进行改性,吸收波长进行红移进行感度提升,得到在LED固化条件下拥有较高感度的引发剂。Oxime ester photoinitiators are widely used in the production of various photoresists due to their relatively excellent performance. Among them, oxime ester initiators with carbazole as the parent group are an important type of oxime ester photoinitiators. Because of its relatively high sensitivity, it has attracted widespread attention from those skilled in the art. High-sensitivity oxime ester initiators have always been the goal pursued by industry technicians. The patents CN103833872A, CN103819583A and CN110066225A respectively modified the molecular structure and red-shifted the absorption wavelength to improve the sensitivity, thereby obtaining high sensitivity under LED curing conditions. Initiator.
然而,这类引发剂由于黄变问题很难在RGB彩色光刻胶和透明涂层中应用,专利CN114369178A、CN104910053A和申请号202111363587.9等专利在一定程度上降低了黄变系数,但其感光度仍然不够理想,另外部分结构相对复杂,难以工业化应用。为提高透明光刻胶的透光率和彩色光刻胶的色彩饱和度,所使用的光引发剂需要具有较低的黄变性和较高的感光,因此仍需要开发有更高感度和更低黄变性的新光引发剂产品。However, this type of initiator is difficult to apply in RGB color photoresists and transparent coatings due to yellowing problems. Patents such as patents CN114369178A, CN104910053A and application number 202111363587.9 have reduced the yellowing coefficient to a certain extent, but their sensitivity is still It is not ideal, and some parts of the structure are relatively complex, making it difficult to apply industrially. In order to improve the transmittance of transparent photoresist and the color saturation of color photoresist, the photoinitiator used needs to have lower yellowness and higher sensitivity. Therefore, it is still necessary to develop higher sensitivity and lower New photoinitiator products for yellowing.
发明内容Contents of the invention
本申请的主要目的在于提供一种肟酯光引发剂、其制备方法及应用,以解决现有技术中光引发剂无法兼顾高感度和低黄变性的问题。The main purpose of this application is to provide an oxime ester photoinitiator, its preparation method and application, so as to solve the problem that photoinitiators in the prior art cannot achieve both high sensitivity and low yellowing.
为了实现上述目的,根据本申请的一个方面,提供了一种肟酯光引发剂,具有通式(I)所示结构:
In order to achieve the above objects, according to one aspect of the present application, an oxime ester photoinitiator is provided, having a structure represented by general formula (I):
通式(I),其中,R1、R2分别独立地选自取代或未取代的C1~C20的烷基、取代或未取代的C3~C20的环烷基、取代或未取代的C6~C20的芳基、取代或未取代的C4~C20的杂芳基、取代或未取代的C3~C20的脂环族杂环基;m为1或0,n为1或0,x为1或0,y为1或0,z为1或0。General formula (I), wherein R 1 and R 2 are each independently selected from substituted or unsubstituted C 1 to C 20 alkyl, substituted or unsubstituted C 3 to C 20 cycloalkyl, substituted or unsubstituted Substituted C 6 to C 20 aryl group, substituted or unsubstituted C 4 to C 20 heteroaryl group, substituted or unsubstituted C 3 to C 20 alicyclic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, z is 1 or 0.
进一步地,取代的C1~C20的烷基中,取代基选自C3~C12的环烷基;可选地,取代或未取代的C1~C20的烷基中,至少一个-CH2-被-O-或-S-取代;取代的C3~C20的环烷基中,取代基选自C1~C10的直链或支链烷基;取代的C6~C20的芳基中,取代基选自C1~C6的直链或支链烷基、C1~C10的直链或支链烷氧基、C1~C10的直链或支链烷硫基、C1~C8的直链或支链酰基、C1~C8的直链或支链酰氧基、卤原子、氰基或硝基中的一种或多种;取代的C4~C20的杂芳基中,取代基选自C1~C8的直链或支链烷基;取代的C3~C20的脂环族杂环基中,取代基选自C1~C6的直链或支链烷基。Further, in the substituted C 1 to C 20 alkyl group, the substituent is selected from the C 3 to C 12 cycloalkyl group; optionally, in the substituted or unsubstituted C 1 to C 20 alkyl group, at least one -CH 2 - is substituted by -O- or -S-; in the substituted C 3 ~ C 20 cycloalkyl group, the substituent is selected from C 1 ~ C 10 linear or branched alkyl group; the substituted C 6 ~ In the C 20 aryl group, the substituent is selected from C 1 to C 6 linear or branched alkyl group, C 1 to C 10 linear or branched alkoxy group, C 1 to C 10 linear or branched alkoxy group. One or more of alkylthio groups, C 1 to C 8 linear or branched acyl groups, C 1 to C 8 linear or branched acyloxy groups, halogen atoms, cyano groups or nitro groups; substitution In the C 4 to C 20 heteroaryl group, the substituent is selected from C 1 to C 8 linear or branched alkyl group; in the substituted C 3 to C 20 alicyclic heterocyclic group, the substituent is selected from C 1 to C 6 linear or branched alkyl group.
进一步地,R1、R2分别独立地选自C1~C20的烷基或C6~C20的芳基;优选地,R1、R2分别独立地选自甲基、乙基或苯基。Further, R 1 and R 2 are each independently selected from a C 1 to C 20 alkyl group or a C 6 to C 20 aryl group; preferably, R 1 and R 2 are each independently selected from a methyl group, an ethyl group or a C 20 alkyl group. phenyl.
进一步地,肟酯光引发剂具有结构式(1)~(13)中任一所示结构:

Further, the oxime ester photoinitiator has a structure shown in any one of the structural formulas (1) to (13):

进一步地,肟酯光引发剂为 Further, the oxime ester photoinitiator is
进一步地,制备方法包括以下步骤:步骤S1,将咔唑与原料A进行取代反应,得到中间体a步骤S2,将中间体a与原料B进行第一傅克反应,得到中间体b步骤S3,将中间体b与原料C进行第二傅克反应,得到中间体c步骤S4,将中间体c与亚硝酸盐和/或亚硝酸酯进行 肟化反应,得到中间体d步骤S5,将中间体d与酸酐和/或酰氯进行酯化反应,得到肟酯光引发剂其中,X为F、Cl、Br或I,m为1或0,n为1或0,x为1或0,y为1或0,z为1或0。Further, the preparation method includes the following steps: step S1, carbazole with raw material A Carry out substitution reaction to obtain intermediate a Step S2, combine intermediate a and raw material B Carry out the first Friedel-Crafts reaction to obtain intermediate b Step S3, combine intermediate b and raw material C Carry out the second Friedel-Crafts reaction to obtain intermediate c Step S4, react intermediate c with nitrite and/or nitrite ester oximation reaction to obtain intermediate d Step S5, perform an esterification reaction between intermediate d and acid anhydride and/or acid chloride to obtain an oxime ester photoinitiator Among them, X is F, Cl, Br or I, m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, and z is 1 or 0.
进一步地,步骤S1中,取代反应在碱性条件下进行,碱为氢氧化钾和/或氢氧化钠;和/或,步骤S2中,第一傅克反应在三氯化铝的催化下进行,第一傅克反应的溶剂为二氯甲烷和/或二氯乙烷;和/或,步骤S3中,第二傅克反应在三氯化铝的催化下进行,第二傅克反应的溶剂为二氯甲烷和/或二氯乙烷;和/或,步骤S4中,亚硝酸盐为亚硝酸钠和/或亚硝酸钾,亚硝酸酯为亚硝酸乙酯、亚硝酸异戊酯和亚硝酸异辛酯的一种或多种;优选地,肟化反应在酸性条件下进行,酸为浓盐酸和/或卤代羧酸,卤代羧酸为氯乙酸或溴乙酸,肟化反应的溶剂为乙酸乙酯、四氢呋喃和二氯甲烷的一种或多种;和/或,步骤S5中,酸酐为醋酸酐和/或苯甲酸酐,酰氯为乙酰氯、丙酰氯和苯甲酰氯的一种或多种;优选地,酯化反应在碱性条件下进行,碱为三乙胺、二异丙基乙胺和4-二甲氨基吡啶的一种或多种。Further, in step S1, the substitution reaction is carried out under alkaline conditions, and the base is potassium hydroxide and/or sodium hydroxide; and/or, in step S2, the first Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride. , the solvent of the first Friedel-Crafts reaction is methylene chloride and/or dichloroethane; and/or, in step S3, the second Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride, and the solvent of the second Friedel-Crafts reaction is be methylene chloride and/or dichloroethane; and/or, in step S4, the nitrite is sodium nitrite and/or potassium nitrite, and the nitrite ester is ethyl nitrite, isoamyl nitrite and nitrite. One or more isooctyl nitrates; preferably, the oximation reaction is carried out under acidic conditions, the acid is concentrated hydrochloric acid and/or halogenated carboxylic acid, the halogenated carboxylic acid is chloroacetic acid or bromoacetic acid, the oximation reaction is The solvent is one or more of ethyl acetate, tetrahydrofuran and dichloromethane; and/or, in step S5, the acid anhydride is acetic anhydride and/or benzoic anhydride, and the acid chloride is one of acetyl chloride, propionyl chloride and benzoyl chloride. One or more; preferably, the esterification reaction is carried out under alkaline conditions, and the base is one or more of triethylamine, diisopropylethylamine and 4-dimethylaminopyridine.
进一步地,步骤S1中,原料A与咔唑的摩尔比为(1~1.1)∶1;优选地,取代反应的反应温度为50~100℃;更优选地,取代反应的反应温度为50~80℃;和/或,步骤S2,原料B与中间体a的摩尔比为(1~1.1)∶1;优选地,第一傅克反应的反应温度为-10~10℃;更优选地,第一傅克反应的反应温度为0~5℃;和/或,步骤S3,原料C与中间体b的摩尔比为(1~1.1)∶1;优选地,第二傅克反应的反应温度为-10~10℃;更优选地,第二傅克反应的反应温度为0~5℃;和/或,步骤S4,亚硝酸盐和/或亚硝酸酯与中间体c的摩尔比为(2~3.5)∶1;优选地,肟化反应的反应温度为0~30℃;更优选地,肟化反应的反应温度为20~25℃;和/或,步骤S5,酸酐和/或酰氯与中间体d的摩尔比为(2~2.8)∶1;优选地,酯化反应的反应温度为0~30℃;更优选地,酯化反应的反应温度为20~25℃。Further, in step S1, the molar ratio of raw material A to carbazole is (1~1.1):1; preferably, the reaction temperature of the substitution reaction is 50~100°C; more preferably, the reaction temperature of the substitution reaction is 50~100°C. 80°C; and/or, in step S2, the molar ratio of raw material B to intermediate a is (1~1.1):1; preferably, the reaction temperature of the first Friedel-Crafts reaction is -10~10°C; more preferably, The reaction temperature of the first Friedel-Crafts reaction is 0-5°C; and/or, in step S3, the molar ratio of raw material C to intermediate b is (1-1.1):1; preferably, the reaction temperature of the second Friedel-Crafts reaction is is -10~10°C; more preferably, the reaction temperature of the second Friedel-Crafts reaction is 0~5°C; and/or, in step S4, the molar ratio of nitrite and/or nitrite ester to intermediate c is ( 2~3.5):1; Preferably, the reaction temperature of the oximation reaction is 0~30°C; More preferably, the reaction temperature of the oximation reaction is 20~25°C; and/or, step S5, acid anhydride and/or acid chloride The molar ratio to intermediate d is (2-2.8):1; preferably, the reaction temperature of the esterification reaction is 0-30°C; more preferably, the reaction temperature of the esterification reaction is 20-25°C.
根据本申请的另一方面,提供了本申请的肟酯光引发剂在光刻胶中的应用。 According to another aspect of the present application, the application of the oxime ester photoinitiator of the present application in photoresist is provided.
根据本申请的另一方面,提供了一种光固化组合物,包括光引发剂,光引发剂为本申请的肟酯光引发剂;优选地,按重量份计,光固化组合物包括800~1000份的溶剂、100~300份的丙烯酸酯共聚物、50~150份的二季戊四醇六丙烯酸酯和3~10份的肟酯光引发剂。According to another aspect of the present application, a photocurable composition is provided, including a photoinitiator, which is the oxime ester photoinitiator of the present application; preferably, in parts by weight, the photocurable composition includes 800 to 1000 parts of solvent, 100-300 parts of acrylate copolymer, 50-150 parts of dipentaerythritol hexaacrylate and 3-10 parts of oxime ester photoinitiator.
本申请的肟酯光引发剂具有双酮肟酯结构,感度得到较大提高,又通过设置不对称取代基并限定特定基团种类,提高了溶解性能;而且,其具备的离域结构能够减少基团波动,提升黄变性能。相比于现有的同类光引发剂,本申请的肟酯光引发剂具有显著提高的溶解性,在光固化组合物中的应用性能优异,应用于光固化组合物时不仅具有低黄变的特点,并且具有高感度,可以兼顾高感度和低黄变性。此外,该肟酯光引发剂还具有易合成、成本低等优点,在光固化领域中具有良好的应用前景。The oxime ester photoinitiator of the present application has a diketoxime ester structure, which greatly improves the sensitivity. It also improves the solubility by setting asymmetric substituents and limiting specific group types; moreover, its delocalized structure can reduce Fluctuation of groups improves yellowing properties. Compared with existing similar photoinitiators, the oxime ester photoinitiator of the present application has significantly improved solubility, excellent application performance in photocurable compositions, and not only has low yellowing properties when applied to photocurable compositions It has high sensitivity and can take into account both high sensitivity and low yellowing. In addition, the oxime ester photoinitiator also has the advantages of easy synthesis and low cost, and has good application prospects in the field of photocuring.
具体实施方式Detailed ways
需要说明的是,在不冲突的情况下,本申请中的实施例及实施例中的特征可以相互组合。下面将结合实施例来详细说明本申请。It should be noted that, as long as there is no conflict, the embodiments and features in the embodiments of this application can be combined with each other. The present application will be described in detail below with reference to examples.
术语解释:Terminology explanation:
浓盐酸:质量浓度38%及以上的盐酸水溶液。Concentrated hydrochloric acid: aqueous hydrochloric acid solution with a mass concentration of 38% and above.
正如本申请背景技术中所述,现有技术中存在光引发剂无法兼顾高感度和低黄变性的问题。为了解决上述问题,在本申请一种典型的实施方式中,提供了一种肟酯光引发剂,具有通式(I)所示结构:
As mentioned in the background of this application, there is a problem in the prior art that photoinitiators cannot achieve both high sensitivity and low yellowing. In order to solve the above problems, in a typical embodiment of the present application, an oxime ester photoinitiator is provided, having a structure represented by general formula (I):
通式(I),其中,R1、R2分别独立地选自取代或未取代的C1~C20的烷基、取代或未取代的C3~C20的环烷基、取代或未取代的C6~C20的芳基、取代或未取代的C4~C20的杂芳基、取代或未取代的C3~C20的脂环族杂环基;m为1或0,n为1或0,x为1或0,y为1或0,z为1或0。General formula (I), wherein R 1 and R 2 are each independently selected from substituted or unsubstituted C 1 to C 20 alkyl, substituted or unsubstituted C 3 to C 20 cycloalkyl, substituted or unsubstituted Substituted C 6 to C 20 aryl group, substituted or unsubstituted C 4 to C 20 heteroaryl group, substituted or unsubstituted C 3 to C 20 alicyclic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, z is 1 or 0.
本申请的肟酯光引发剂具有双酮肟酯结构,感度得到较大提高;通过设置不对称取代基并限定特定基团种类,提高了溶解性能;而且,其具备的离域结构能够减少基团波动,提升黄变性能。相比于现有的同类光引发剂,本申请的肟酯光引发剂具有显著提高的溶解性,在 光固化组合物中的应用性能优异,应用于光固化组合物时不仅具有低黄变的特点,并且具有高感度,可以兼顾高感度和低黄变性。此外,该肟酯光引发剂还具有易合成、成本低等优点,在光固化领域中具有很好的应用前景。The oxime ester photoinitiator of the present application has a diketoxime ester structure, which greatly improves the sensitivity; by setting asymmetric substituents and limiting specific group types, the solubility is improved; and its delocalized structure can reduce the number of radicals. The group fluctuates and improves the yellowing performance. Compared with existing similar photoinitiators, the oxime ester photoinitiator of the present application has significantly improved solubility. It has excellent application performance in photocurable compositions. When applied to photocurable compositions, it not only has the characteristics of low yellowing, but also has high sensitivity, and can achieve both high sensitivity and low yellowing. In addition, the oxime ester photoinitiator also has the advantages of easy synthesis and low cost, and has good application prospects in the field of photocuring.
具体地,在一种优选的实施方式中,取代的C1~C20的烷基中,取代基选自C3~C12的环烷基;可选地,取代或未取代的C1~C20的烷基中,至少一个-CH2-被-O-或-S-取代;取代的C3~C20的环烷基中,取代基选自C1~C10的直链或支链烷基;取代的C6~C20的芳基中,取代基选自C1~C6的直链或支链烷基、C1~C10的直链或支链烷氧基、C1~C10的直链或支链烷硫基、C1~C8的直链或支链酰基、C1~C8的直链或支链酰氧基、卤原子、氰基或硝基中的一种或多种;取代的C4~C20的杂芳基中,取代基选自C1~C8的直链或支链烷基;取代的C3~C20的脂环族杂环基中,取代基选自C1~C6的直链或支链烷基,具有上述取代基的肟酯光引发剂的溶解性能更佳。Specifically, in a preferred embodiment, in the substituted C 1 to C 20 alkyl group, the substituent is selected from the group consisting of C 3 to C 12 cycloalkyl groups; optionally, substituted or unsubstituted C 1 to In the C 20 alkyl group, at least one -CH 2 - is substituted by -O- or -S-; in the substituted C 3 to C 20 cycloalkyl group, the substituent is selected from C 1 to C 10 straight chain or branched Alkyl group; in the substituted C 6 to C 20 aryl group, the substituent is selected from C 1 to C 6 linear or branched alkyl group, C 1 to C 10 linear or branched alkoxy group, C 1 to C 10 linear or branched alkylthio group, C 1 to C 8 linear or branched acyl group, C 1 to C 8 linear or branched acyloxy group, halogen atom, cyano group or nitro group One or more of them; in the substituted C 4 to C 20 heteroaryl group, the substituent is selected from the C 1 to C 8 linear or branched alkyl group; the substituted C 3 to C 20 alicyclic group In the heterocyclic group, the substituent is selected from C 1 to C 6 linear or branched alkyl groups, and the oxime ester photoinitiator having the above substituents has better solubility.
在一种优选的实施方式中,R1、R2分别独立地选自C1~C20的烷基或C6~C20的芳基;优选地,R1、R2分别独立地选自甲基、乙基或苯基。具有上述取代基的肟酯光引发剂具有更高的感度和更低的黄变性。In a preferred embodiment, R 1 and R 2 are independently selected from C 1 to C 20 alkyl groups or C 6 to C 20 aryl groups; preferably, R 1 and R 2 are independently selected from Methyl, ethyl or phenyl. The oxime ester photoinitiator with the above substituents has higher sensitivity and lower yellowing property.
优选地,肟酯光引发剂具有结构式(1)~(13)中任一所示结构,综合性能更佳:

Preferably, the oxime ester photoinitiator has a structure shown in any one of the structural formulas (1) to (13), and has better overall performance:

更优选地,肟酯光引发剂为 最优选地,肟酯光引发剂为上述结构的肟酯光引发剂感度得到更大提高,溶解性能更好,取代基和离域结构减少基团波动、提升黄变性能的效果 更佳,具有进一步提高的溶解性,可以更好地兼顾高感度和低黄变性,而且更易合成、成本更低。More preferably, the oxime ester photoinitiator is Most preferably, the oxime ester photoinitiator is The oxime ester photoinitiator with the above structure has greater sensitivity and better solubility. The substituents and delocalized structure can reduce group fluctuations and improve yellowing properties. Better, it has further improved solubility, can better balance high sensitivity and low yellowing, and is easier to synthesize and lower cost.
在本申请又一种典型的实施方式中,还提供了本申请的肟酯光引发剂的制备方法,包括以下步骤:步骤S1,将咔唑与原料A进行取代反应,得到中间体a步骤S2,将中间体a与原料B进行第一傅克反应,得到中间体b步骤S3,将中间体b与原料C进行第二傅克反应,得到中间体c步骤S4,将中间体c与亚硝酸盐和/或亚硝酸酯进行肟化反应,得到中间体d步骤S5,将中间体d与酸酐和/或酰氯进行酯化反应,得到肟酯光引发剂 其中,X为F、Cl、Br或I,m为1或0,n为1或0,x为1或0,y为1或0,z为1或0。In yet another typical embodiment of the present application, a method for preparing the oxime ester photoinitiator of the present application is also provided, which includes the following steps: Step S1, convert carbazole with raw material A Carry out substitution reaction to obtain intermediate a Step S2, combine intermediate a and raw material B Carry out the first Friedel-Crafts reaction to obtain intermediate b Step S3, combine intermediate b and raw material C Carry out the second Friedel-Crafts reaction to obtain intermediate c Step S4, perform an oximation reaction between intermediate c and nitrite and/or nitrite ester to obtain intermediate d. Step S5, perform an esterification reaction between intermediate d and acid anhydride and/or acid chloride to obtain an oxime ester photoinitiator Among them, X is F, Cl, Br or I, m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, and z is 1 or 0.
本申请先将咔唑与原料A进行取代反应,实现咔唑N-H的取代,得到中间体a;随后将中间体a与原料B进行第一傅克反应,使得原料B与咔唑苯环连接,得到中间体b;继续将中间体b与原料C进行第二傅克反应,使得原料C与另一个咔唑苯环连接,得到中间体c;然后将中间体c与亚硝酸盐和/或亚硝酸酯进行肟化反应,形成醛肟结构,得到中间体d;最后将中间体d与酸酐和/或酰氯进行酯化反应,形成肟酯结构,得到本申请的肟酯光引发剂。In this application, carbazole and raw material A are first subjected to a substitution reaction to realize substitution of carbazole N-H to obtain intermediate a; then intermediate a and raw material B are subjected to the first Friedel-Crafts reaction, so that raw material B is connected to the carbazole benzene ring, Obtain intermediate b; continue to carry out the second Friedel-Crafts reaction between intermediate b and raw material C, so that raw material C is connected to another carbazole benzene ring to obtain intermediate c; then intermediate c is reacted with nitrite and/or nitrite The nitrate ester undergoes an oximation reaction to form an aldoxime structure to obtain intermediate d; finally, intermediate d is subjected to an esterification reaction with acid anhydride and/or acid chloride to form an oxime ester structure, thereby obtaining the oxime ester photoinitiator of the present application.
本申请的制备方法工艺简单,不产生污染性废弃物,且产品纯度高,收率高,适用于工业化生产,制备得到的肟酯光引发剂可以兼顾高感度和低黄变性。在制备上述肟酯类化合物的过程中,使用的反应试剂都是现有技术中的已知化合物,可通过商购获得或由现有的合成方法方便地制得。The preparation method of the present application has a simple process, does not produce polluting waste, has high product purity and high yield, and is suitable for industrial production. The prepared oxime ester photoinitiator can have both high sensitivity and low yellowing. In the process of preparing the above-mentioned oxime ester compounds, the reaction reagents used are all known compounds in the prior art, and can be obtained commercially or conveniently prepared by existing synthesis methods.
在知晓了本申请公开的合成思路的基础上,具体反应条件对本领域技术人员而言是容易确定的。在一种优选的实施方式中,以提高产率为目的,亚硝酸盐为亚硝酸钠和/或亚硝酸钾,亚硝酸酯为亚硝酸乙酯、亚硝酸异戊酯和亚硝酸异辛酯的一种或多种;和/或,酸酐为醋酸酐和/或苯甲酸酐,酰氯为乙酰氯、丙酰氯和苯甲酰氯的一种或多种。On the basis of knowing the synthetic ideas disclosed in this application, the specific reaction conditions can be easily determined by those skilled in the art. In a preferred embodiment, in order to increase the yield, the nitrite is sodium nitrite and/or potassium nitrite, and the nitrite ester is ethyl nitrite, isoamyl nitrite and isooctyl nitrite. One or more of; and/or, the acid anhydride is acetic anhydride and/or benzoic anhydride, and the acid chloride is one or more of acetyl chloride, propionyl chloride and benzoyl chloride.
上述反应在有机溶剂中进行,对有机溶剂种类并没有特别限定,只要能够溶解原料且对反应无不良影响即可,同时,为进一步提高反应速率,在一种优选的实施方式中,步骤S1中,取代反应在碱性条件下进行,碱为氢氧化钾和/或氢氧化钠;和/或,步骤S2中,第一傅克反应在三氯化铝的催化下进行,第一傅克反应的溶剂为二氯甲烷和/或二氯乙烷;和/或,步骤S3中,第二傅克反应在三氯化铝的催化下进行,第二傅克反应的溶剂为二氯甲烷和/或二氯乙烷;和/或,步骤S4中,肟化反应在酸性条件下进行,酸为浓盐酸和/或卤代羧酸,卤代羧酸为氯乙酸或溴乙酸,肟化反应的溶剂为乙酸乙酯、四氢呋喃和二氯甲烷的一种或多种;和/或,步骤S5中,酯化反应在碱性条件下进行,碱为三乙胺(TEA)、二异丙基乙胺和4-二甲氨基吡啶的一种或多种。The above reaction is carried out in an organic solvent, and the type of organic solvent is not particularly limited, as long as it can dissolve the raw materials and has no adverse effect on the reaction. At the same time, in order to further increase the reaction rate, in a preferred embodiment, in step S1 , the substitution reaction is carried out under alkaline conditions, and the base is potassium hydroxide and/or sodium hydroxide; and/or, in step S2, the first Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride, the first Friedel-Crafts reaction The solvent is dichloromethane and/or dichloroethane; and/or, in step S3, the second Friedel-Crafts reaction is performed under the catalysis of aluminum trichloride, and the solvent of the second Friedel-Crafts reaction is dichloromethane and/or Or dichloroethane; and/or, in step S4, the oximation reaction is carried out under acidic conditions, the acid is concentrated hydrochloric acid and/or halogenated carboxylic acid, the halogenated carboxylic acid is chloroacetic acid or bromoacetic acid, the oximation reaction is The solvent is one or more of ethyl acetate, tetrahydrofuran and dichloromethane; and/or, in step S5, the esterification reaction is performed under alkaline conditions, and the base is triethylamine (TEA), diisopropyl ethyl One or more of amine and 4-dimethylaminopyridine.
反应过程中较后加入的反应物,在反应式比例的基础上略微过量,即可达到较充分的反应,反应温度根据原料种类略有差异,在一种优选的实施方式中,步骤S1中,原料A与咔唑的摩尔比为(1~1.1)∶1;优选地,取代反应的反应温度为50~100℃;更优选地,取代反应的反应温度为50~80℃;和/或,步骤S2,原料B与中间体a的摩尔比为(1~1.1)∶1;优选地,第一傅克反应的反应温度为-10~10℃;更优选地,第一傅克反应的反应温度为0~5℃;和/或, 步骤S3,原料C与中间体b的摩尔比为(1~1.1)∶1;优选地,第二傅克反应的反应温度为-10~10℃;更优选地,第二傅克反应的反应温度为0~5℃;和/或,步骤S4,亚硝酸盐和/或亚硝酸酯与中间体c的摩尔比为(2~3.5)∶1;优选地,肟化反应的反应温度为0~30℃;更优选地,肟化反应的反应温度为20~25℃;和/或,步骤S5,酸酐和/或酰氯与中间体d的摩尔比为(2~2.8)∶1;优选地,酯化反应的反应温度为0~30℃;更优选地,酯化反应的反应温度为20~25℃,可以得到最佳的反应效果,产品收率更高。The reactants added later in the reaction process can achieve a more complete reaction if the reactants added later are slightly excessive based on the proportion of the reaction formula. The reaction temperature varies slightly depending on the type of raw materials. In a preferred embodiment, in step S1, The molar ratio of raw material A to carbazole is (1~1.1):1; preferably, the reaction temperature of the substitution reaction is 50~100°C; more preferably, the reaction temperature of the substitution reaction is 50~80°C; and/or, Step S2, the molar ratio of raw material B to intermediate a is (1~1.1):1; preferably, the reaction temperature of the first Friedel-Crafts reaction is -10~10°C; more preferably, the reaction temperature of the first Friedel-Crafts reaction The temperature is 0~5℃; and/or, Step S3, the molar ratio of raw material C to intermediate b is (1~1.1):1; preferably, the reaction temperature of the second Friedel-Crafts reaction is -10~10°C; more preferably, the reaction temperature of the second Friedel-Crafts reaction The temperature is 0~5°C; and/or, in step S4, the molar ratio of nitrite and/or nitrite ester to intermediate c is (2~3.5):1; preferably, the reaction temperature of the oximation reaction is 0 ~30°C; more preferably, the reaction temperature of the oximation reaction is 20~25°C; and/or, in step S5, the molar ratio of acid anhydride and/or acid chloride to intermediate d is (2~2.8):1; preferably , the reaction temperature of the esterification reaction is 0-30°C; more preferably, the reaction temperature of the esterification reaction is 20-25°C, which can obtain the best reaction effect and the product yield is higher.
在本申请又一种典型的实施方式中,还提供了本申请的肟酯光引发剂在光刻胶中的应用。尤其适用于UV-LED光固化体系,特别适合在365nm光源作用下引发,应用后感度优异,并且具有低黄变、高溶解性的特点。In yet another typical embodiment of the present application, the application of the oxime ester photoinitiator in photoresist is also provided. It is especially suitable for UV-LED light curing systems, especially suitable for initiating under the action of 365nm light source. It has excellent sensitivity after application, and has the characteristics of low yellowing and high solubility.
非限制性地,本申请的肟酯光引发剂也可应用在油漆、涂料、油墨和成型材料等方面,具体可应用于制作:在塑料、金属、玻璃、陶瓷、木材、墙体等基材上进行涂布的涂料;硬涂层剂、防污膜、防反射膜、冲击缓冲膜等保护膜材料;光固化黏合剂、黏着剂,光分解型涂料、涂膜、成型物;全息影像材料等的光记录介质;光学成型树脂,例如,3D打印用油墨(树脂),电子电路和半导体制造用光刻胶,显示器中彩色滤光片、黑色矩阵、干膜等电子材料用光刻胶等;层间绝缘膜,光提取膜,增亮膜,密封材料;丝网印刷、胶板印刷、凹版印刷等印刷用油墨,喷墨打印用光固化油墨;镜片、透镜阵列、光导波路、导光板、光扩散板、衍射元件等光学部件;光间隙物,肋壁,纳米压印用材料,量子点,OLED等。Without limitation, the oxime ester photoinitiator of the present application can also be used in paints, coatings, inks, and molding materials. Specifically, it can be used in the production of base materials such as plastics, metals, glass, ceramics, wood, and walls. Coatings for coating; protective film materials such as hard coating agents, antifouling films, anti-reflective films, and impact buffer films; photocurable adhesives, adhesives, photodegradable coatings, coatings, and molded articles; holographic imaging materials Optical recording media, etc.; optical molding resins, such as inks (resins) for 3D printing, photoresists for electronic circuits and semiconductor manufacturing, photoresists for electronic materials such as color filters, black matrices, and dry films in displays, etc. ; Interlayer insulation film, light extraction film, brightness enhancement film, sealing material; printing inks such as screen printing, offset printing, gravure printing, etc., light curing ink for inkjet printing; lenses, lens arrays, optical waveguides, light guide plates , light diffusion plates, diffraction elements and other optical components; optical gaps, ribs, nanoimprint materials, quantum dots, OLEDs, etc.
在本申请又一种典型的实施方式中,还提供了一种光固化组合物,包括光引发剂,光引发剂为本申请的肟酯光引发剂;优选地,按重量份计,光固化组合物包括800~1000份的溶剂、100~300份的丙烯酸酯共聚物、50~150份的二季戊四醇六丙烯酸酯和3~10份的肟酯光引发剂。In yet another typical embodiment of the present application, a photocurable composition is also provided, including a photoinitiator. The photoinitiator is the oxime ester photoinitiator of the present application; preferably, in parts by weight, the photocurable composition The composition includes 800 to 1000 parts of solvent, 100 to 300 parts of acrylate copolymer, 50 to 150 parts of dipentaerythritol hexaacrylate, and 3 to 10 parts of oxime ester photoinitiator.
对上述组合物的溶剂种类并没有特别限定,只要能够溶解原料且对反应无不良影响即可,可以为丁酮、乙酸乙酯、四氢呋喃和二氯甲烷的一种或多种。丙烯酸酯共聚物优选为:甲基丙烯酸卞酯∶甲基丙烯酸∶甲基丙烯酸羟乙酯的摩尔比为70∶10∶20的共聚物,Mw=10000。该光固化组合物不仅具有低黄变的特点,并且具有高感度,可以兼顾高感度和低黄变性。需要说明的是,本申请中术语“重量份”具有相同的量纲,比如均表示1g或1kg等。The type of solvent for the above composition is not particularly limited as long as it can dissolve the raw materials and has no adverse effect on the reaction. It can be one or more of butanone, ethyl acetate, tetrahydrofuran and methylene chloride. The acrylate copolymer is preferably a copolymer in which the molar ratio of benzyl methacrylate: methacrylic acid: hydroxyethyl methacrylate is 70:10:20, and Mw=10000. The photocurable composition not only has the characteristics of low yellowing, but also has high sensitivity, and can achieve both high sensitivity and low yellowing. It should be noted that the term "parts by weight" in this application has the same dimension, for example, they all represent 1g or 1kg.
以下结合具体实施例对本申请作进一步详细描述,这些实施例不能理解为限制本申请所要求保护的范围。The present application will be described in further detail below with reference to specific examples. These examples shall not be construed as limiting the scope of protection claimed by the present application.
实施例1
Example 1
(1)中间体1a的制备
(1) Preparation of intermediate 1a
将20g咔唑(0.12mol)、16.70g环己基甲基氯(0.13mol)、5.76g氢氧化钠(0.14mol)和100mLDMF加入到250mL三口瓶中,升温至80℃进行取代反应,搅拌4h;TLC确认原料反应完全。反应液冷却至室温,硅藻土过滤,滤液中加入100mL二氯甲烷,然后用水洗(200mL×3次),有机相浓缩,所得残余物用正己烷溶解,降温至5~10℃,搅拌析晶2h,过滤,收集固体,40℃烘箱干燥,得到24.81g白色固体,即中间体1a,收率78.5%。Add 20g carbazole (0.12mol), 16.70g cyclohexylmethyl chloride (0.13mol), 5.76g sodium hydroxide (0.14mol) and 100mL DMF into a 250mL three-necked flask, raise the temperature to 80°C for substitution reaction, and stir for 4 hours; TLC confirmed that the raw material reaction was complete. The reaction solution was cooled to room temperature, filtered through Celite, and 100 mL of methylene chloride was added to the filtrate, then washed with water (200 mL Crystallize for 2 hours, filter, collect the solid, and dry it in an oven at 40°C to obtain 24.81g of white solid, namely intermediate 1a, with a yield of 78.5%.
(2)中间体1c的制备
(2) Preparation of intermediate 1c
将24g中间体1a(0.090mol)、12.60g三氯化铝(0.095mol)溶于100mL二氯甲烷中,降温至0~5℃;将15.88g环己基丙酰氯(0.091mol)溶于20mL二氯甲烷中,滴加到反应液中,控温0~5℃进行第一傅克反应;滴加完,继续搅拌1h,原料反应完全,得到中间体1b。Dissolve 24g of intermediate 1a (0.090mol) and 12.60g of aluminum trichloride (0.095mol) in 100mL of dichloromethane, and cool the temperature to 0~5°C; dissolve 15.88g of cyclohexylpropionyl chloride (0.091mol) in 20mL of dichloromethane. In methyl chloride, add dropwise to the reaction solution, and perform the first Friedel-Crafts reaction at a temperature of 0 to 5°C; after the dropwise addition, continue stirring for 1 hour, the raw materials react completely, and intermediate 1b is obtained.
再降温至0~5℃,然后加入12.60g三氯化铝(0.095mol),再将14.64g正辛酰氯(0.095mol)溶于20mL二氯甲烷中,加入到反应液中,控温0~5℃进行第二傅克反应,滴加完,继续搅拌1h,TLC确认反应完全。将反应液缓慢加入到500mL冰水中,充分搅拌,静置半小时,有机相再用水洗(100mL×3次),有机相浓缩,所得固体再用200mL甲醇溶解,降温至5~10℃,搅拌析晶2h,过滤,所得固体60℃烘干,得到40.19g白色固体,即中间体1c,收率84.6%。Then cool the temperature to 0~5℃, then add 12.60g aluminum trichloride (0.095mol), then dissolve 14.64g n-octanoyl chloride (0.095mol) in 20mL methylene chloride, add it to the reaction solution, and control the temperature from 0~ Carry out the second Friedel-Crafts reaction at 5°C. After the dropwise addition, continue stirring for 1 hour. TLC confirms that the reaction is complete. Slowly add the reaction solution to 500 mL of ice water, stir thoroughly, and let stand for half an hour. The organic phase is washed with water (100 mL Crystallize for 2 hours, filter, and dry the obtained solid at 60°C to obtain 40.19g of white solid, namely intermediate 1c, with a yield of 84.6%.
(3)化合物1d的制备
(3) Preparation of compound 1d
向500L圆底烧瓶中加入45g中间体1c(0.085mol)和270mL乙酸乙酯,加入25.5mL浓盐酸,在氮气氛围下,室温下滴加29.97g亚硝酸异戊酯(0.256mol),滴加完毕后,继续肟化反应2h。向反应液中加入200mL氯化钠水溶液,分出有机相,再对有机相进行水洗(200mL×3),有机相浓缩,所得残余物用200mL甲醇进行搅拌析晶,过滤,60℃烘干,得到33.91g浅黄色固体,即中间体1d,收率68.1%。Add 45g of intermediate 1c (0.085mol) and 270mL of ethyl acetate into a 500L round-bottom flask, add 25.5mL of concentrated hydrochloric acid, and add 29.97g of isoamyl nitrite (0.256mol) dropwise under a nitrogen atmosphere at room temperature. After completion, continue the oximation reaction for 2 hours. Add 200 mL sodium chloride aqueous solution to the reaction solution, separate the organic phase, wash the organic phase with water (200 mL 33.91g of light yellow solid was obtained, namely intermediate 1d, with a yield of 68.1%.
(4)化合物1的制备
(4) Preparation of compound 1
向500mL反应瓶中加入48g中间体1d(0.082mol)、8.70gTEA(0.172mol)和240mL二氯甲烷,搅拌溶清。滴加8.78g乙酸酐(0.172mol),滴完,室温搅拌2h进行酯化反应。往反应液中加入200mL水,搅拌10min,静置分层,分出下层有机相,水洗至中性,有机相浓缩,所得固体用200mL甲醇溶解,回流搅拌1h。冷却至室温,搅拌1h,再冰浴,降温至5~10℃,搅拌1h。过滤,滤饼用200mL甲醇洗涤,得粗品。粗品溶于150mL丙酮,加入到300mL甲醇中,搅拌析晶,冰浴下继续搅拌1h,过滤,滤饼用200mL甲醇淋洗,所得固体放入60℃真空干燥箱中干燥24h,得到34.39g浅黄色固体,即化合物1,收率62.6%,纯度99.12%。 Add 48g of intermediate 1d (0.082mol), 8.70g of TEA (0.172mol) and 240mL of methylene chloride into a 500mL reaction bottle, and stir to dissolve. Add 8.78g acetic anhydride (0.172 mol) dropwise, and stir at room temperature for 2 hours to perform esterification reaction. Add 200 mL of water to the reaction solution, stir for 10 min, let stand for layering, separate the lower organic phase, wash with water until neutral, concentrate the organic phase, dissolve the solid obtained with 200 mL of methanol, and stir under reflux for 1 h. Cool to room temperature, stir for 1 hour, then cool to 5-10°C in ice bath, and stir for 1 hour. Filter, and wash the filter cake with 200 mL methanol to obtain crude product. Dissolve the crude product in 150 mL acetone, add it to 300 mL methanol, stir to crystallize, continue stirring in an ice bath for 1 hour, filter, rinse the filter cake with 200 mL methanol, and dry the solid in a 60°C vacuum drying oven for 24 hours to obtain 34.39 g of shallow Yellow solid, compound 1, yield 62.6%, purity 99.12%.
化合物1的结构由如下核磁数据确认:The structure of compound 1 was confirmed by the following NMR data:
1H NMR(500MHz,Chloroform-d)δ8.61~8.57(m,1H),8.57~8.53(m,1H),7.97(dd,J=7.5,1.5Hz,1H),7.92(dd,J=7.5,1.5Hz,1H),7.80(d,J=7.5Hz,1H),7.58(d,J=7.5Hz,1H),4.12(d,J=7.1Hz,2H),2.91(d,J=7.0Hz,2H),2.76(t,J=7.1Hz,2H),2.15(s,6H),2.04(dq,J=13.9,7.0Hz,1H),1.95(hept,J=7.0Hz,1H),1.65(p,J=7.1Hz,2H),1.59~1.50(m,5H),1.54~1.38(m,16H),1.37~1.23(m,5H),0.93~0.85(m,3H).1H NMR (500MHz, Chloroform-d) δ8.61~8.57 (m, 1H), 8.57~8.53 (m, 1H), 7.97 (dd, J=7.5, 1.5Hz, 1H), 7.92 (dd, J=7.5 , 1.5Hz, 1H), 7.80 (d, J=7.5Hz, 1H), 7.58 (d, J=7.5Hz, 1H), 4.12 (d, J=7.1Hz, 2H), 2.91 (d, J=7.0 Hz, 2H), 2.76 (t, J=7.1Hz, 2H), 2.15 (s, 6H), 2.04 (dq, J=13.9, 7.0Hz, 1H), 1.95 (hept, J=7.0Hz, 1H), 1.65(p, J=7.1Hz, 2H), 1.59~1.50(m, 5H), 1.54~1.38(m, 16H), 1.37~1.23(m, 5H), 0.93~0.85(m, 3H).
实施例2至13Examples 2 to 13
按照实施例1方法,更换相应的原料,制备出如下化合物2至13,其结构和对应的核磁表征数据列于下表1。According to the method of Example 1 and replacing the corresponding raw materials, the following compounds 2 to 13 were prepared. Their structures and corresponding NMR characterization data are listed in Table 1 below.
表1



Table 1



实施例14至19Examples 14 to 19
实施例14至19与实施例1的区别在于,各反应的反应物摩尔比不同,详见表2。The difference between Examples 14 to 19 and Example 1 is that the molar ratio of reactants in each reaction is different. See Table 2 for details.
表2
Table 2
实施例20至25Examples 20 to 25
实施例20至25与实施例1的区别在于,反应温度不同,详见表3。The difference between Examples 20 to 25 and Example 1 lies in the different reaction temperatures. See Table 3 for details.
表3

table 3

在制备同一种化合物产品的过程中,变换不同的反应条件,得到的实施例1和实施例14至25的化合物1收率和纯度见表4。In the process of preparing the same compound product, different reaction conditions were changed, and the yield and purity of Compound 1 obtained in Example 1 and Examples 14 to 25 are shown in Table 4.
表4
Table 4
由表2至表4可知,当实施例各步骤的制备摩尔比均在本申请优选范围之内时,肟酯光引发剂的收率和纯度最高,过低时会导致反应不充分,超过本申请范围时收率和纯度的提升并不明显,反而造成试剂和原料的浪费,甚至会导致副反应的发生影响产品纯度。当实施例 各步骤的反应温度均在本申请优选范围之内时,肟酯光引发剂的收率和纯度最高,温度过低时会导致反应不完全,反应速率慢,温度过高超过本申请范围时,收率和纯度的提升并不明显,反而导致成本增加。因此,优选制备摩尔比和反应温度在本申请的优选范围。It can be seen from Table 2 to Table 4 that when the preparation molar ratio of each step of the embodiment is within the preferred range of the present application, the yield and purity of the oxime ester photoinitiator are the highest. If it is too low, the reaction will be insufficient and exceed this limit. The improvement in yield and purity is not obvious when applying within the scope. Instead, it causes a waste of reagents and raw materials, and may even cause side reactions that affect product purity. When the example When the reaction temperature of each step is within the preferred range of this application, the yield and purity of the oxime ester photoinitiator will be the highest. If the temperature is too low, the reaction will be incomplete and the reaction rate will be slow. If the temperature is too high and exceeds the range of this application, The improvement in yield and purity is not obvious, but leads to increased costs. Therefore, it is preferred that the molar ratio of preparation and the reaction temperature are within the preferred ranges of this application.
性能评价Performance evaluation
需要说明的是,本申请实施例1至13和比较例1至4中进行光敏测试时采用的光固化组合物按照表5配比进行配制。例如,按重量份计,实施例1的光固化组合物包括:200份丙烯酸酯共聚物,100份二季戊四醇六丙烯酸酯,5份光引发剂,900份丁酮(溶剂),5份染料蓝15(CAS:147-14-8),且上述丙烯酸酯共聚物(厂家:常州强力电子新材料股份有限公司)为甲基丙烯酸卞酯/甲基丙烯酸/甲基丙烯酸羟乙酯(摩尔比为70∶10∶20)共聚物,Mw=10000。上述光固化组合物中,光引发剂为本申请前述内容中通式(I)所示的肟酯化合物或作为对比的现有技术中已知的同类光引发剂。It should be noted that the photocurable compositions used in the photosensitivity tests in Examples 1 to 13 and Comparative Examples 1 to 4 of the present application were prepared according to the proportions in Table 5. For example, in parts by weight, the photocurable composition of Example 1 includes: 200 parts of acrylate copolymer, 100 parts of dipentaerythritol hexaacrylate, 5 parts of photoinitiator, 900 parts of butanone (solvent), and 5 parts of dye blue 15 (CAS: 147-14-8), and the above-mentioned acrylate copolymer (manufacturer: Changzhou Qianli Electronic New Materials Co., Ltd.) is benzyl methacrylate/methacrylic acid/hydroxyethyl methacrylate (molar ratio is 70:10:20) copolymer, Mw=10000. In the above-mentioned photocurable composition, the photoinitiator is the oxime ester compound represented by the general formula (I) in the foregoing content of the application or a similar photoinitiator known in the prior art for comparison.
表5


table 5


1、溶解性能测试1. Dissolution performance test
肟酯光引发剂在丙二醇甲醚醋酸酯(PGMEA)中的溶解度大小是代表其溶解性能及衡量光引发剂应用性能的指标参数之一。选用通式(I)所示结构的化合物,分别测试了25℃时化合物1至13和化合物A、B、C、D在PGMEA中的溶解度,测试结果如表6中所示。The solubility of the oxime ester photoinitiator in propylene glycol methyl ether acetate (PGMEA) is one of the index parameters that represents its solubility and measures the application performance of the photoinitiator. Compounds with the structure shown in general formula (I) were selected and the solubility of compounds 1 to 13 and compounds A, B, C, and D in PGMEA at 25°C were tested respectively. The test results are shown in Table 6.
2、光敏性能测试2. Photosensitive performance test
(1)感光度测试(1) Sensitivity test
将实施例1至13和比较例1至4的组合物避光搅拌,利用6#线棒涂布于21阶梯度尺上,形成膜厚约15μm的涂膜。用LED灯(385nm)对涂膜进行曝光,给与191mJ/cm2的能量(100%光强,8m/min*2遍),固化后用2%NaOH水溶液显影2min,后自来水冲洗1min,观察梯度尺的测试结果,见表6。The compositions of Examples 1 to 13 and Comparative Examples 1 to 4 were protected from light and stirred, and then coated on a 21-step scale using a #6 wire rod to form a coating film with a film thickness of about 15 μm. Expose the coating film with an LED lamp (385nm), give an energy of 191mJ/ cm2 (100% light intensity, 8m/min*2 times), develop with 2% NaOH aqueous solution for 2 minutes after curing, rinse with tap water for 1 minute, and observe The test results of the gradient ruler are shown in Table 6.
(2)耐黄变性能测试(2)Yellowing resistance test
在黄光室将实施例1至13和比较例1至4的光固化组合物搅拌充分后,使用15#线棒将组合物涂布于马口铁上,制成湿膜厚度为10μm的涂膜。采用365nm-LED光源曝光,接收2000mJ/cm2的能量,使其充分固化完全。采用爱色丽色差仪进行黄变测试,根据Δb值判断光固化树脂的耐黄变性能。Δb值越高,说明黄变越明显,耐黄变性能越差。实施例1至13和比较例1至4的耐黄变性能测试结果见表6。After the photocurable compositions of Examples 1 to 13 and Comparative Examples 1 to 4 were fully stirred in a yellow light room, the composition was coated on tinplate using a 15# wire rod to form a coating film with a wet film thickness of 10 μm. Use 365nm-LED light source for exposure and receive 2000mJ/ cm2 energy to fully cure it. An X-Rite colorimeter was used to conduct a yellowing test, and the yellowing resistance of the light-cured resin was judged based on the Δb value. The higher the Δb value, the more obvious the yellowing and the worse the yellowing resistance. The yellowing resistance test results of Examples 1 to 13 and Comparative Examples 1 to 4 are shown in Table 6.
表6

Table 6

综上可知,与传统的光引发剂相比,本申请公开的式(I)所示肟酯引发剂在有机溶剂中的溶解性优异,应用后具有高感度、低黄变的特点,而且易合成、成本低,在光固化领域中具有很好的应用前景。In summary, it can be seen that compared with traditional photoinitiators, the oxime ester initiator shown in formula (I) disclosed in the present application has excellent solubility in organic solvents, has the characteristics of high sensitivity and low yellowing after application, and is easy to Synthetic, low cost, and has good application prospects in the field of photocuring.
以上所述仅为本申请的优选实施例而已,并不用于限制本申请,对于本领域的技术人员来说,本申请可以有各种更改和变化。凡在本申请的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本申请的保护范围之内。 The above descriptions are only preferred embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various modifications and changes. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of this application shall be included in the protection scope of this application.

Claims (10)

  1. 一种肟酯光引发剂,其特征在于,具有通式(I)所示结构:
    An oxime ester photoinitiator is characterized by having a structure represented by general formula (I):
    其中,R1、R2分别独立地选自取代或未取代的C1~C20的烷基、取代或未取代的C3~C20的环烷基、取代或未取代的C6~C20的芳基、取代或未取代的C4~C20的杂芳基、取代或未取代的C3~C20的脂环族杂环基;m为1或0,n为1或0,x为1或0,y为1或0,z为1或0。Wherein, R 1 and R 2 are independently selected from substituted or unsubstituted C 1 to C 20 alkyl groups, substituted or unsubstituted C 3 to C 20 cycloalkyl groups, substituted or unsubstituted C 6 to C 20 aryl group, substituted or unsubstituted C 4 to C 20 heteroaryl group, substituted or unsubstituted C 3 to C 20 alicyclic heterocyclic group; m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, z is 1 or 0.
  2. 根据权利要求1所述的肟酯光引发剂,其特征在于,The oxime ester photoinitiator according to claim 1, characterized in that,
    取代的所述C1~C20的烷基中,取代基选自C3~C12的环烷基;可选地,取代或未取代的所述C1~C20的烷基中,至少一个-CH2-被-O-或-S-取代;In the substituted C 1 to C 20 alkyl group, the substituent is selected from C 3 to C 12 cycloalkyl groups; optionally, in the substituted or unsubstituted C 1 to C 20 alkyl group, at least One -CH 2 - is replaced by -O- or -S-;
    取代的所述C3~C20的环烷基中,取代基选自C1~C10的直链或支链烷基;In the substituted C 3 to C 20 cycloalkyl group, the substituent is selected from C 1 to C 10 linear or branched chain alkyl groups;
    取代的所述C6~C20的芳基中,取代基选自C1~C6的直链或支链烷基、C1~C10的直链或支链烷氧基、C1~C10的直链或支链烷硫基、C1~C8的直链或支链酰基、C1~C8的直链或支链酰氧基、卤原子、氰基或硝基中的一种或多种;In the substituted C 6 to C 20 aryl group, the substituent is selected from C 1 to C 6 linear or branched alkyl groups, C 1 to C 10 linear or branched alkoxy groups, C 1 to C 10 linear or branched alkylthio group, C 1 to C 8 linear or branched acyl group, C 1 to C 8 linear or branched acyloxy group, halogen atom, cyano group or nitro group one or more;
    取代的所述C4~C20的杂芳基中,取代基选自C1~C8的直链或支链烷基;In the substituted C 4 to C 20 heteroaryl group, the substituent is selected from a C 1 to C 8 linear or branched alkyl group;
    取代的所述C3~C20的脂环族杂环基中,取代基选自C1~C6的直链或支链烷基。In the substituted C 3 to C 20 alicyclic heterocyclic group, the substituent is selected from C 1 to C 6 linear or branched chain alkyl groups.
  3. 根据权利要求1或2所述的肟酯光引发剂,其特征在于,R1、R2分别独立地选自C1~C20的烷基或C6~C20的芳基;优选地,R1、R2分别独立地选自甲基、乙基或苯基。The oxime ester photoinitiator according to claim 1 or 2, characterized in that R 1 and R 2 are each independently selected from a C 1 to C 20 alkyl group or a C 6 to C 20 aryl group; preferably, R 1 and R 2 are each independently selected from methyl, ethyl or phenyl.
  4. 根据权利要求1至3中任一项所述的肟酯光引发剂,其特征在于,所述肟酯光引发剂具有结构式(1)~(13)中任一所示结构:

    The oxime ester photoinitiator according to any one of claims 1 to 3, characterized in that the oxime ester photoinitiator has a structure shown in any one of the structural formulas (1) to (13):

  5. 根据权利要求1至4中任一项所述的肟酯光引发剂,其特征在于,所述肟酯光引发剂为 The oxime ester photoinitiator according to any one of claims 1 to 4, characterized in that the oxime ester photoinitiator is
  6. 权利要求1至5中任一项所述的肟酯光引发剂的制备方法,其特征在于,所述制备方法包括以下步骤:The preparation method of the oxime ester photoinitiator according to any one of claims 1 to 5, characterized in that the preparation method includes the following steps:
    步骤S1,将咔唑与原料A进行取代反应,得到中间体a Step S1, carbazole with raw material A Carry out substitution reaction to obtain intermediate a
    步骤S2,将所述中间体a与原料B进行第一傅克反应,得到中间体 b Step S2, combine the intermediate a and raw material B Carry out the first Friedel-Crafts reaction to obtain the intermediate b
    步骤S3,将所述中间体b与原料C进行第二傅克反应,得到中间体c Step S3, combine the intermediate b and raw material C Carry out the second Friedel-Crafts reaction to obtain intermediate c
    步骤S4,将所述中间体c与亚硝酸盐和/或亚硝酸酯进行肟化反应,得到中间体d Step S4, perform an oximation reaction between the intermediate c and nitrite and/or nitrite ester to obtain the intermediate d.
    步骤S5,将所述中间体d与酸酐和/或酰氯进行酯化反应,得到所述肟酯光引发剂 Step S5, perform an esterification reaction between the intermediate d and acid anhydride and/or acid chloride to obtain the oxime ester photoinitiator
    其中,X为F、Cl、Br或I,m为1或0,n为1或0,x为1或0,y为1或0,z为1或0。Among them, X is F, Cl, Br or I, m is 1 or 0, n is 1 or 0, x is 1 or 0, y is 1 or 0, and z is 1 or 0.
  7. 根据权利要求6所述的制备方法,其特征在于, The preparation method according to claim 6, characterized in that:
    所述步骤S1中,所述取代反应在碱性条件下进行,碱为氢氧化钾和/或氢氧化钠;和/或,In the step S1, the substitution reaction is carried out under alkaline conditions, and the base is potassium hydroxide and/or sodium hydroxide; and/or,
    所述步骤S2中,所述第一傅克反应在三氯化铝的催化下进行,所述第一傅克反应的溶剂为二氯甲烷和/或二氯乙烷;和/或,In the step S2, the first Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride, and the solvent of the first Friedel-Crafts reaction is dichloromethane and/or dichloroethane; and/or,
    所述步骤S3中,所述第二傅克反应在三氯化铝的催化下进行,所述第二傅克反应的溶剂为二氯甲烷和/或二氯乙烷;和/或,In the step S3, the second Friedel-Crafts reaction is carried out under the catalysis of aluminum trichloride, and the solvent of the second Friedel-Crafts reaction is dichloromethane and/or dichloroethane; and/or,
    所述步骤S4中,所述亚硝酸盐为亚硝酸钠和/或亚硝酸钾,所述亚硝酸酯为亚硝酸乙酯、亚硝酸异戊酯和亚硝酸异辛酯的一种或多种;优选地,所述肟化反应在酸性条件下进行,酸为浓盐酸和/或卤代羧酸,所述卤代羧酸为氯乙酸或溴乙酸,所述肟化反应的溶剂为乙酸乙酯、四氢呋喃和二氯甲烷的一种或多种;和/或,In the step S4, the nitrite is sodium nitrite and/or potassium nitrite, and the nitrite is one or more of ethyl nitrite, isoamyl nitrite and isooctyl nitrite. ; Preferably, the oximation reaction is carried out under acidic conditions, the acid is concentrated hydrochloric acid and/or halogenated carboxylic acid, the halogenated carboxylic acid is chloroacetic acid or bromoacetic acid, and the solvent of the oximation reaction is ethyl acetate. One or more of ester, tetrahydrofuran and methylene chloride; and/or,
    所述步骤S5中,所述酸酐为醋酸酐和/或苯甲酸酐,所述酰氯为乙酰氯、丙酰氯和苯甲酰氯的一种或多种;优选地,所述酯化反应在碱性条件下进行,所述碱为三乙胺、二异丙基乙胺和4-二甲氨基吡啶的一种或多种。In the step S5, the acid anhydride is acetic anhydride and/or benzoic anhydride, and the acid chloride is one or more of acetyl chloride, propionyl chloride and benzoyl chloride; preferably, the esterification reaction is carried out in an alkaline The base is one or more of triethylamine, diisopropylethylamine and 4-dimethylaminopyridine.
  8. 根据权利要求6或7所述的制备方法,其特征在于,The preparation method according to claim 6 or 7, characterized in that,
    所述步骤S1中,所述原料A与所述咔唑的摩尔比为(1~1.1)∶1;优选地,所述取代反应的反应温度为50~100℃;更优选地,所述取代反应的反应温度为50~80℃;和/或,In the step S1, the molar ratio of the raw material A to the carbazole is (1~1.1):1; preferably, the reaction temperature of the substitution reaction is 50~100°C; more preferably, the substitution The reaction temperature of the reaction is 50~80°C; and/or,
    所述步骤S2中,所述原料B与所述中间体a的摩尔比为(1~1.1)∶1;优选地,所述第一傅克反应的反应温度为-10~10℃;更优选地,所述第一傅克反应的反应温度为0~5℃;和/或,In the step S2, the molar ratio of the raw material B to the intermediate a is (1~1.1):1; preferably, the reaction temperature of the first Friedel-Crafts reaction is -10~10°C; more preferably Ground, the reaction temperature of the first Friedel-Crafts reaction is 0~5°C; and/or,
    所述步骤S3中,所述原料C与所述中间体b的摩尔比为(1~1.1)∶1;优选地,所述第二傅克反应的反应温度为-10~10℃;更优选地,所述第二傅克反应的反应温度为0~5℃;和/或,In the step S3, the molar ratio of the raw material C and the intermediate b is (1~1.1):1; preferably, the reaction temperature of the second Friedel-Crafts reaction is -10~10°C; more preferably Ground, the reaction temperature of the second Friedel-Crafts reaction is 0~5°C; and/or,
    所述步骤S4中,所述亚硝酸盐和/或亚硝酸酯与所述中间体c的摩尔比为(2~3.5)∶1;优选地,所述肟化反应的反应温度为0~30℃;更优选地,所述肟化反应的反应温度为20~25℃;和/或,In the step S4, the molar ratio of the nitrite and/or nitrite ester to the intermediate c is (2-3.5):1; preferably, the reaction temperature of the oximation reaction is 0-30 ℃; more preferably, the reaction temperature of the oximation reaction is 20 to 25 ℃; and/or,
    所述步骤S5中,所述酸酐和/或酰氯与所述中间体d的摩尔比为(2~2.8)∶1;优选地,所述酯化反应的反应温度为0~30℃;更优选地,所述酯化反应的反应温度为20~25℃。In the step S5, the molar ratio of the acid anhydride and/or acid chloride to the intermediate d is (2-2.8):1; preferably, the reaction temperature of the esterification reaction is 0-30°C; more preferably Preferably, the reaction temperature of the esterification reaction is 20-25°C.
  9. 权利要求1至5中任一项所述的肟酯光引发剂在光刻胶中的应用。Application of the oxime ester photoinitiator described in any one of claims 1 to 5 in photoresist.
  10. 一种光固化组合物,包括光引发剂,其特征在于,所述光引发剂为权利要求1至5中任一项所述的肟酯光引发剂;优选地,按重量份计,所述光固化组合物包括800~1000份的溶剂、100~300份的丙烯酸酯共聚物、50~150份的二季戊四醇六丙烯酸酯和3~10份的所述肟酯光引发剂。 A photocurable composition, including a photoinitiator, characterized in that the photoinitiator is the oxime ester photoinitiator described in any one of claims 1 to 5; preferably, in parts by weight, the The photocurable composition includes 800 to 1000 parts of solvent, 100 to 300 parts of acrylate copolymer, 50 to 150 parts of dipentaerythritol hexaacrylate, and 3 to 10 parts of the oxime ester photoinitiator.
PCT/CN2023/103405 2022-07-27 2023-06-28 Oxime ester photoinitiator, preparation method therefor and use thereof WO2024021979A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210893632.X 2022-07-27
CN202210893632.XA CN117510396A (en) 2022-07-27 2022-07-27 Oxime ester photoinitiator, preparation method and application thereof

Publications (1)

Publication Number Publication Date
WO2024021979A1 true WO2024021979A1 (en) 2024-02-01

Family

ID=89705257

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2023/103405 WO2024021979A1 (en) 2022-07-27 2023-06-28 Oxime ester photoinitiator, preparation method therefor and use thereof

Country Status (2)

Country Link
CN (1) CN117510396A (en)
WO (1) WO2024021979A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102020727A (en) * 2010-11-23 2011-04-20 常州强力先端电子材料有限公司 Pyrazole oxime ester photoinitiator with high photosensibility, preparation method and application thereof
CN102459171A (en) * 2009-06-17 2012-05-16 东洋油墨Sc控股株式会社 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
CN103819583A (en) * 2014-03-18 2014-05-28 常州强力电子新材料股份有限公司 Photoinitiator containing nitro dioxime ester and preparation method and application thereof
CN104076606A (en) * 2014-07-15 2014-10-01 常州强力电子新材料股份有限公司 Photoelectric sensitive composition containing oxime ester type photoinitiator and application thereof
CN113227050A (en) * 2018-12-28 2021-08-06 株式会社三养社 Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing carbazole poly-beta-oxime ester derivative compound, and photoresist composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102459171A (en) * 2009-06-17 2012-05-16 东洋油墨Sc控股株式会社 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
CN102020727A (en) * 2010-11-23 2011-04-20 常州强力先端电子材料有限公司 Pyrazole oxime ester photoinitiator with high photosensibility, preparation method and application thereof
CN103819583A (en) * 2014-03-18 2014-05-28 常州强力电子新材料股份有限公司 Photoinitiator containing nitro dioxime ester and preparation method and application thereof
CN104076606A (en) * 2014-07-15 2014-10-01 常州强力电子新材料股份有限公司 Photoelectric sensitive composition containing oxime ester type photoinitiator and application thereof
CN113227050A (en) * 2018-12-28 2021-08-06 株式会社三养社 Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing carbazole poly-beta-oxime ester derivative compound, and photoresist composition

Also Published As

Publication number Publication date
CN117510396A (en) 2024-02-06

Similar Documents

Publication Publication Date Title
TWI617539B (en) Cyclopentanedione oxime ester ,manufacturing method and applications.
JP2014505115A (en) Polymer compound containing dye and curable resin composition containing the same
TW201700484A (en) Squarylium compounds used for LCD color filters
CN104861691A (en) Dye and colored curable resin composition
JP2022528738A (en) New dialoylcarbazole compounds, and their use as sensitizers
JP2012042896A (en) Colorant composition for color filter
KR101787338B1 (en) Colored photosensitive resin composition for color filter
KR20170036694A (en) Phthalocyanine compound used for color filter of lcd
WO2024021979A1 (en) Oxime ester photoinitiator, preparation method therefor and use thereof
JP5935417B2 (en) Dye salt
TWI499645B (en) Pyridone compounds
TWI522426B (en) Pyridone compounds
TWI619771B (en) Pyridone complex compound
WO2022237644A1 (en) Oxime ester photoinitiator of chalcone structure, preparation method therefor and application thereof
JP5831136B2 (en) Compound
TW201313701A (en) Compound
TW201311829A (en) Compound
JP5935289B2 (en) Compound
JP2011148991A (en) Compound
JP2024523053A (en) Oxime ester photoinitiator having chalcone structure, and its preparation and use
JP2012122003A (en) Compound for dyestuff
JP5772505B2 (en) Compound
KR20130018159A (en) Compound
JP2012122005A (en) Compound for dyestuff
JP2013043969A (en) Compound

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 23845192

Country of ref document: EP

Kind code of ref document: A1