WO2024012749A1 - Broche pour un système de mise en tension - Google Patents

Broche pour un système de mise en tension Download PDF

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Publication number
WO2024012749A1
WO2024012749A1 PCT/EP2023/063334 EP2023063334W WO2024012749A1 WO 2024012749 A1 WO2024012749 A1 WO 2024012749A1 EP 2023063334 W EP2023063334 W EP 2023063334W WO 2024012749 A1 WO2024012749 A1 WO 2024012749A1
Authority
WO
WIPO (PCT)
Prior art keywords
adapter
pin
component
housing
optics
Prior art date
Application number
PCT/EP2023/063334
Other languages
German (de)
English (en)
Inventor
Robert ZIESEL
Guido Limbach
Original Assignee
Carl Zeiss Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Smt Gmbh filed Critical Carl Zeiss Smt Gmbh
Publication of WO2024012749A1 publication Critical patent/WO2024012749A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/0063—Connecting non-slidable parts of machine tools to each other
    • B23Q1/0072—Connecting non-slidable parts of machine tools to each other using a clamping opening for receiving an insertion bolt or nipple
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q2210/00—Machine tools incorporating a specific component
    • B23Q2210/002—Flexures

Definitions

  • the invention relates to a pin for a clamping system, in particular for a clamping system of a processing machine for the production or processing of components of projection exposure systems for semiconductor lithography.
  • Such projection exposure systems are used to produce the finest structures, in particular on semiconductor components or other microstructured components.
  • the functional principle of the systems mentioned is based on producing the finest structures down to the nanometer range by means of a generally reducing image of structures on a mask, with a so-called reticle, on an element to be structured that is provided with photosensitive material.
  • the minimum dimensions of the structures created depend directly on the wavelength of the light used.
  • the so-called DUV range light sources with an emission wavelength in the range of a few nanometers, for example between 1 nm and 120nm, in particular in the range of 13.5nm, have increasingly been used.
  • the wavelength range described is also referred to as the EUV range.
  • the pins of the zero-point clamping systems known from the prior art are typically movably mounted in a guide to compensate for tolerances. In a clean room environment, however, this has the disadvantage that cold welding can often occur between the moving parts because lubrication is not possible there.
  • the object of the present invention is to provide a device which eliminates the disadvantages of the prior art described above.
  • a pin according to the invention for a clamping system comprises an adapter corresponding to the clamping system in a receptacle.
  • the receptacle is mounted floating in a housing of an intermediate piece.
  • the adapter is guided in the housing without lubricant.
  • the required sliding properties can be guaranteed by attaching the adapter to the housing between two sliding elements. ordered sliding body is connected.
  • the sliding elements and/or the sliding body can in particular be provided with a friction-reducing coating.
  • a certain, defined mobility of the pin can be achieved in that the adapter is guided in the housing at least indirectly by at least one solid-state joint.
  • the restoring force of the joints that occurs when using solid-state joints can be used advantageously to position the adapter in an unstressed operating state in a predetermined center position by the restoring forces of the solid-state joints.
  • gripping by a robot arm can be simplified in such a way that the pin is positioned more precisely relative to a receptacle of a robot arm, so that ideally when gripping by the robot arm there is no or only a small contribution to the alignment of the pin by the robot arm must be achieved by holding the robot arm.
  • any friction between the pin and the receptacle that may cause particles or, in extreme cases, even the risk of a collision is effectively reduced.
  • the adapter is connected to the housing only by a solid joint in such a way that only linear movement is possible for the adapter.
  • the positive guidance of the adapter along a straight line created in this way can be advantageous for some applications.
  • the adapter is connected to the housing by at least two solid joints in such a way that the adapter can move in one plane.
  • the two solid-state joints work together in such a way that the respective deflection of both joints allows the adapter to move in any direction within the plane.
  • the direction of movement is determined by the ratio of the deflection of the first to that of the second joint.
  • a component is equipped with four pins.
  • the component can be, for example, an optical element, a receptacle for the optical element for simplified handling of the optical element in production, or another component of a projection exposure system.
  • a first pin does not allow any relative movement between the component and the adapter, while a second Pin is designed such that only linear movement is possible for the adapter.
  • the interaction of the two first-mentioned pins determines the position and orientation of the component.
  • Two further pins serve to compensate for tolerances and are designed in such a way that the adapter can move in one plane.
  • a component comprises four pins, each of which can only be moved along a straight line.
  • the direction of movement of the respective adapters of the pins is aligned such that it runs through a center point of the component. In this way it can be achieved that the center point within a zero-point clamping system centers itself.
  • a component can be equipped with four pins, which are designed to be movable in any direction within a plane. This variant enables particularly good tolerance compensation.
  • FIG. 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography
  • FIG. 2 shows a schematic meridional section of a projection exposure system for DUV projection lithography
  • FIGS. 4a-c further exemplary applications of the invention.
  • a lighting system 2 of the projection exposure system 1 has, in addition to a radiation source 3, lighting optics 4 for illuminating an object field 5 in an object plane 6.
  • the light source 3 can also be provided as a module separate from the other lighting system. In this case, the lighting system does not include the light source 3.
  • a reticle 7 arranged in the object field 5 is illuminated.
  • the reticle 7 is held by a reticle holder 8.
  • the reticle holder 8 can be displaced in particular in a scanning direction via a reticle displacement drive 9.
  • FIG. 1 A Cartesian xyz coordinate system is shown in FIG. 1 for explanation purposes.
  • the x direction runs perpendicular to the drawing plane.
  • the y-direction is horizontal and the z-direction is vertical.
  • the scanning direction in FIG. 1 runs along the y-direction.
  • the z direction runs perpendicular to the object plane 6.
  • the projection exposure system 1 includes projection optics 10.
  • the projection optics 10 is used to image the object field 5 into an image field 11 in an image plane 12.
  • the image plane 12 runs parallel to the object plane 6. Alternatively, an angle other than 0 ° is also between the object plane 6 and the Image level 12 possible.
  • a structure on the reticle 7 is imaged on a light-sensitive layer of a wafer 13 arranged in the area of the image field 11 in the image plane 12.
  • the wafer 13 is held by a wafer holder 14.
  • the wafer holder 14 can be displaced in particular along the y direction via a wafer displacement drive 15.
  • the displacement, on the one hand, of the reticle 7 via the reticle displacement drive 9 and, on the other hand, of the wafer 13 via the wafer displacement drive 15 can take place in synchronization with one another.
  • the radiation source 3 is an EUV radiation source.
  • the radiation source 3 emits in particular EUV radiation 16, which is also referred to below as useful radiation, illumination radiation or illumination light.
  • the useful radiation in particular has a wavelength in the range between 5 nm and 30 nm.
  • the radiation source 3 can be a plasma source, for example an LPP source (Laser Produced Plasma) or a DPP source. Source (Gas Discharged Produced Plasma, plasma produced by gas discharge). It can also be a synchrotron-based radiation source.
  • the radiation source 3 can be a free electron laser (FEL).
  • the illumination radiation 16, which emanates from the radiation source 3, is focused by a collector 17.
  • the collector 17 can be a collector with one or more ellipsoidal and/or hyperboloid reflection surfaces.
  • the at least one reflection surface of the collector 17 can be in grazing incidence (Grazing Incidence, Gl), i.e. with angles of incidence greater than 45° compared to the normal direction of the mirror surface, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence smaller than 45°. with the lighting radiation 16 are applied.
  • Gl grazing Incidence
  • NI normal incidence
  • the collector 17 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress false light.
  • the intermediate focus plane 18 can represent a separation between a radiation source module, having the radiation source 3 and the collector 17, and the illumination optics 4.
  • the lighting optics 4 comprises a deflection mirror 19 and, downstream of it in the beam path, a first facet mirror 20.
  • the deflection mirror 19 can be a flat deflection mirror or alternatively a mirror with an effect that influences the bundle beyond the pure deflection effect.
  • the deflection mirror 19 can be designed as a spectral filter which separates a useful light wavelength of the illumination radiation 16 from false light of a wavelength that deviates from this.
  • first facet mirror 20 is arranged in a plane of the illumination optics 4, which is optically conjugate to the object plane 6 as a field plane, it is also referred to as a field facet mirror.
  • the first facet mirror 20 includes a large number of individual first facets 21, which are also referred to below as field facets. Some of these facets 21 are shown in FIG. 1 only as examples.
  • the first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour.
  • the first facets 21 can be designed as flat facets or alternatively as convex or concave curved facets.
  • the first facets 21 themselves can also each be composed of a large number of individual mirrors, in particular a large number of micromirrors.
  • the first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system).
  • MEMS system microelectromechanical system
  • the illumination radiation 16 runs horizontally, i.e. along the y-direction.
  • a second facet mirror 22 is located downstream of the first facet mirror 20 in the beam path of the illumination optics 4. If the second facet mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as Pupillary facet mirror called. The second facet mirror 22 can also be arranged at a distance from a pupil plane of the lighting optics 4. In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006/0132747 A1, EP 1 614 008 B1 and US 6,573,978.
  • the second facet mirror 22 comprises a plurality of second facets 23.
  • the second facets 23 are also referred to as pupil facets.
  • the second facets 23 can also be macroscopic facets, which can have, for example, round, rectangular or even hexagonal edges, or alternatively they can be facets composed of micromirrors. In this regard, reference is also made to DE 10 2008 009 600 A1.
  • the second facets 23 can have flat or alternatively convex or concave curved reflection surfaces.
  • the lighting optics 4 thus forms a double faceted system.
  • This basic principle is also known as the honeycomb condenser (fly's eye integrator).
  • the second facet mirror 22 may be arranged tilted relative to a pupil plane of the projection optics 10, as described for example in DE 10 2017 220 586 A1.
  • the second facet mirror 22 is the last bundle forming or actually the last mirror for the illumination radiation 16 in the beam path in front of the object field 5.
  • transmission optics can be arranged in the beam path between the second facet mirror 22 and the object field 5, which contributes in particular to the imaging of the first facets 21 into the object field 5.
  • the transmission optics can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the lighting optics 4.
  • the transmission optics can in particular comprise one or two mirrors for perpendicular incidence (NL mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (Gl mirror, gracing incidence mirror).
  • the lighting optics 4 has exactly three mirrors after the collector 17, namely the deflection mirror 19, the field facet mirror 20 and the pupil facet mirror 22.
  • the deflection mirror 19 can also be omitted, so that the lighting optics 4 can then have exactly two mirrors after the collector 17, namely the first facet mirror 20 and the second facet mirror 22.
  • the imaging of the first facets 21 into the object plane 6 by means of the second facets 23 or with the second facets 23 and a transmission optics is generally only an approximate image.
  • the projection optics 10 comprises a plurality of mirrors Mi, which are numbered consecutively according to their arrangement in the beam path of the projection exposure system 1.
  • the projection optics 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible.
  • the penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16.
  • the projection optics 10 are double-obscured optics.
  • the projection optics 10 has an image-side numerical aperture that is larger than 0.5 and which can also be larger than 0.6 and which can be, for example, 0.7 or 0.75.
  • Reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry.
  • the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape.
  • the mirrors Mi just like the mirrors of the lighting optics 4, can have highly reflective coatings for the lighting radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.
  • the projection optics 10 has a large object image offset in the y direction between a y coordinate of a center of the object field 5 and a y coordinate of the center of the image field 11.
  • This object-image offset in the y direction can be approximately as large as a z distance between the object plane 6 and the image plane 12.
  • the projection optics 10 can in particular be anamorphic. In particular, it has different imaging scales ßx, ßy in the x and y directions.
  • a positive magnification ß means an image without image reversal.
  • a negative sign for the image scale ß means an image with image reversal.
  • the projection optics 10 thus leads to a reduction in size in the x direction, that is to say in the direction perpendicular to the scanning direction, in a ratio of 4:1.
  • the projection optics 10 leads to a reduction of 8:1 in the y direction, that is to say in the scanning direction.
  • Image scales are also possible. Image scales of the same sign and absolutely the same in the x and y directions, for example with absolute values of 0.125 or 0.25, are also possible.
  • the number of intermediate image planes in the x and y directions in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, can be different. Examples of projection optics with different numbers of such intermediate images in the x and y directions are known from US 2018/0074303 A1.
  • One of the pupil facets 23 is assigned to exactly one of the field facets 21 to form an illumination channel for illuminating the object field 5. This can in particular result in lighting based on Köhler's principle.
  • the far field is broken down into a large number of object fields 5 using the field facets 21.
  • the field facets 21 generate a plurality of images of the intermediate focus on the pupil facets 23 assigned to them.
  • the field facets 21 are each imaged onto the reticle 7 by an assigned pupil facet 23, superimposed on one another, in order to illuminate the object field 5.
  • the illumination of the object field 5 is in particular as homogeneous as possible.
  • the illumination of the entrance pupil of the projection optics 10 can be geometrically defined by an arrangement of the pupil facets. By selecting the illumination channels, in particular the subset of the pupil facets that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the lighting setting.
  • a likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by redistributing the illumination channels.
  • the projection optics 10 can in particular have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.
  • the entrance pupil of the projection optics 10 cannot regularly be illuminated precisely with the pupil facet mirror 22.
  • the aperture rays often do not intersect at a single point.
  • an area can be found in which the pairwise distance of the aperture beams becomes minimal.
  • This surface represents the entrance pupil or a surface conjugate to it in local space. In particular, this surface shows a finite curvature.
  • the projection optics have 10 different positions of the entrance pupil for the tangential and sagittal beam paths.
  • an imaging element in particular an optical component of the transmission optics, should be provided between the second facet mirror 22 and the reticle 7. With the help of this optical element the different positions can be determined the tangential entrance pupil and the sagittal entrance pupil are taken into account.
  • the pupil facet mirror 22 is arranged in a surface conjugate to the entrance pupil of the projection optics 10.
  • the field facet mirror 20 is tilted relative to the object plane 6.
  • the first facet mirror 20 is arranged tilted to an arrangement plane that is defined by the deflection mirror 19.
  • the first facet mirror 20 is arranged tilted to an arrangement plane that is defined by the second facet mirror 22.
  • Figure 2 shows a schematic meridional section of another projection exposure system 101 for DUV projection lithography, in which the invention can also be used.
  • the structure of the projection exposure system 101 and the principle of the imaging is comparable to the structure and procedure described in Figure 1.
  • the same components are designated with a reference number increased by 100 compared to Figure 1, so the reference numbers in Figure 2 begin with 101.
  • the projection exposure system 101 essentially comprises an illumination system 102, a reticle holder 108 for receiving and precisely positioning a reticle 107 provided with a structure, through which the later structures on a wafer 113 are determined Wafer holder 114 for holding, moving and precisely positioning this wafer 113 and a projection lens 110, with several optical elements 117, which are held via mounts 118 in a lens housing 119 of the projection lens 110.
  • the illumination system 102 provides DUV radiation 116 required for imaging the reticle 107 on the wafer 113.
  • a laser, a plasma source or the like can be used as the source for this radiation 116.
  • the radiation 116 is shaped in the illumination system 102 via optical elements in such a way that the DUV radiation 116 has the desired properties in terms of diameter, polarization, shape of the wavefront and the like when it hits the reticle 107.
  • the structure of the subsequent projection optics 110 with the lens housing 119 does not differ in principle from the structure described in Figure 1 except for the additional use of refractive optical elements 117 such as lenses, prisms, end plates and is therefore not described further.
  • Figure 3a shows a first embodiment of a pin 30 according to the invention for a commercially available zero-point clamping system, which is not shown in Figure 3a.
  • the pin 30 includes an adapter 32 corresponding to a commercially available zero-point clamping system and an intermediate piece 40 with a housing 41.
  • the adapter 32 is arranged in a receptacle 42 in the housing 41 of the intermediate piece 40.
  • a solid joint 34 is formed between the receptacle 42 and the housing 41, whereby the receptacle 42 with the adapter 32 can be moved relative to the housing 41.
  • a sliding body 33 is arranged between two sliding elements designed as sliding plates 51, which is screwed to the adapter 32 via a screw 31, whereby the adapter 32 is pulled into the receptacle 42, while the sliding body 33 is pulled in the direction of the upper of the two Sliding plates 51 are pressed onto the contact surface 45 of the receptacle 42.
  • the bearing body 52 has two interfaces 38 for a tool Counterhold when screwing the adapter 32 and the sliding body 33 with the help of the screw 31 and thus the receptacle 42.
  • a bearing body 52 is arranged between the sliding plates 51, which defines the distance between the sliding plates 51, which can include a friction-reducing coating, for example Iclidur® or a coating made of carbon, a so-called DLC (diamond like carbon) coating, and ensures a uniform load on the Sliding plates 51 ensured by the sliding body 33.
  • the sliding body 33 can also be coated in a similar way to the sliding plates 51.
  • the upper one of the sliding plates 51 is pressed against the contact surface 44 on the housing 41 via the bearing body 52.
  • the housing 41 is closed on the underside facing away from the receptacle 42 by a cover 60, the cover 60 pressing the lower sliding plate 51 against the sliding body 33 and the bearing body 52.
  • the cover 60 includes a contact surface 63 directed towards the component and an adapter 61 with a lateral guide surface 62, so that the pin 30 can be positively connected to a corresponding interface in the component.
  • the component can be, for example, an optical element Mx, 117, as is used in the projection exposure systems 1, 101 explained in FIG. 1 and FIG. 2, or a receptacle for an optical element Mx, 117 or another component the projection exposure systems 1, 101 explained in FIG. 1 or FIG. 2.
  • the adapter 32 is always in the same position in relation to the component and at the same time possible tolerances due to the positional accuracy of a robot system due to the possible relative movement of the adapter 32 to the component or when using multiple zero point clamping systems to avoid over-determination or double fit. Due to the lubricant-free combination of sliding body 33 and sliding plates 51 and due to the friction-free solid joints 34, the pin 30 is particularly suitable for use under clean room conditions.
  • FIG. 3b shows a top view from above of a further embodiment of a two-dimensionally movable pin 72.
  • the basic structure of the pin 72 is identical to the structure of the pin 30 explained in Figure 3a.
  • the screw 31 with the receptacle 42 in the intermediate piece 40 The connected adapter 32 can be moved in the xy plane relative to the housing 41 and thus to the component by means of the solid-state joints 34, 35, which are only indicated schematically and are arranged between the receptacle 42 and the housing 41.
  • the pin 72 is connected to the component, not shown, with eight screws.
  • Figure 3c also shows a top view from above of a further embodiment of the invention in the form of a one-dimensionally movable pin 71.
  • the basic structure of the pin 71 is identical to the structure of the pin 30 explained in Figure 3a.
  • the pin 71 only has a solid joint 34 for moving the adapter 32 relative to the housing 41 in the x direction, whereas a relative movement of the adapter 32 relative to the housing 41 in the y direction is not possible.
  • the different embodiments of the pins 71, 72 and a pin with a fixed connection between the adapter 32 and the housing 41 of the intermediate piece 40, and thus also with the component, can be combined with one another in various ways, which is shown in Figures 4a to 4c is explained in detail.
  • Figure 4a again shows a top view of a component 80 with four pins 70, 71, 72 (2x).
  • the component 80 can be used as an optical element, a receptacle for the optical element for simplified handling of the optical Element in production or another component of a projection exposure system can be formed.
  • a first fixed pin 70 i.e. a pin 70 which does not allow any relative movement between the adapter 32 and the component 80, is connected to the component 80 and thereby clearly defines the position in the xy plane.
  • a second, one-dimensionally movable pin 71 is arranged opposite the pin 70 on the component 80, which is aligned such that the direction of possible movement of the adapter 32 relative to the pin 71 runs through the center point 81 of the component and the fixed pin 70.
  • the pin 71 defines the orientation of the component 80 in the xy plane, whereby to compensate for tolerances, such as manufacturing tolerances and assembly tolerances, as well as possible expansion of the component 80 due to heating during production, the adapter 32 is replaced by that explained in Figure 3c
  • Solid-state joint 34 is designed to be movable along the direction of movement shown by a double arrow in FIG. 4a.
  • the two further pins 72 are designed to be two-dimensionally movable so that they can compensate for tolerances in the xy plane.
  • Figure 4b again shows a component 80 with four pins 71 in a top view.
  • the direction of movement of the respective adapters 32 of the one-dimensionally movable pins 71 is aligned such that it runs through the center 81 of the component 80.
  • Figure 4c also shows a top view of a component 80 with four two-dimensionally movable pins 72.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne une broche (30) pour un système de mise en tension, comprenant un adaptateur (32) qui correspond au système de mise en tension et qui est monté en flottaison dans un réceptacle (42) dans un logement (41) d'une pièce intermédiaire (40), l'adaptateur (32) étant guidé sans lubrifiant dans le logement (41). L'invention concerne en outre un composant (80) qui est équipé de broches (30) correspondantes.
PCT/EP2023/063334 2022-07-12 2023-05-17 Broche pour un système de mise en tension WO2024012749A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102022207123.9 2022-07-12
DE102022207123.9A DE102022207123A1 (de) 2022-07-12 2022-07-12 Zapfen für ein Spannsystem

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Publication Number Publication Date
WO2024012749A1 true WO2024012749A1 (fr) 2024-01-18

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WO (1) WO2024012749A1 (fr)

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4135418A1 (de) * 1991-10-26 1993-05-27 Emil Stark Gmbh Spannvorrichtung zum spannen einer aufspannplatte auf einer traegerplatte fuer bearbeitungsmaschinen
EP0858861A1 (fr) * 1997-02-14 1998-08-19 Stark, Emil, jr. Cheville de connection pour palette ou porte-pièce, servant de support pour des pièces à usiner
US6573978B1 (en) 1999-01-26 2003-06-03 Mcguire, Jr. James P. EUV condenser with non-imaging optics
US20060132747A1 (en) 2003-04-17 2006-06-22 Carl Zeiss Smt Ag Optical element for an illumination system
DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
US20180074303A1 (en) 2015-04-14 2018-03-15 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure unit including same
DE102016122090A1 (de) * 2016-11-17 2018-05-17 Frank Nickl Spannsystem
DE102017220586A1 (de) 2017-11-17 2019-05-23 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage
EP3536456A1 (fr) * 2018-03-05 2019-09-11 Frank Nickl Système de serrage

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021200112A1 (de) 2021-01-08 2021-12-16 Carl Zeiss Smt Gmbh Spannsystem
DE102022200400A1 (de) 2022-01-14 2022-06-30 Carl Zeiss Smt Gmbh Verbindung von komponenten einer optischen einrichtung

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4135418A1 (de) * 1991-10-26 1993-05-27 Emil Stark Gmbh Spannvorrichtung zum spannen einer aufspannplatte auf einer traegerplatte fuer bearbeitungsmaschinen
EP0858861A1 (fr) * 1997-02-14 1998-08-19 Stark, Emil, jr. Cheville de connection pour palette ou porte-pièce, servant de support pour des pièces à usiner
US6573978B1 (en) 1999-01-26 2003-06-03 Mcguire, Jr. James P. EUV condenser with non-imaging optics
US20060132747A1 (en) 2003-04-17 2006-06-22 Carl Zeiss Smt Ag Optical element for an illumination system
EP1614008B1 (fr) 2003-04-17 2009-12-02 Carl Zeiss SMT AG Element optique pour systeme d eclairage
DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
US20180074303A1 (en) 2015-04-14 2018-03-15 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure unit including same
DE102016122090A1 (de) * 2016-11-17 2018-05-17 Frank Nickl Spannsystem
DE102017220586A1 (de) 2017-11-17 2019-05-23 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel, Beleuchtungsoptik und optisches System für eine Projek-tionsbelichtungsanlage
EP3536456A1 (fr) * 2018-03-05 2019-09-11 Frank Nickl Système de serrage

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