WO2023236418A1 - Light-emitting diode and light-emitting diode package - Google Patents

Light-emitting diode and light-emitting diode package Download PDF

Info

Publication number
WO2023236418A1
WO2023236418A1 PCT/CN2022/127026 CN2022127026W WO2023236418A1 WO 2023236418 A1 WO2023236418 A1 WO 2023236418A1 CN 2022127026 W CN2022127026 W CN 2022127026W WO 2023236418 A1 WO2023236418 A1 WO 2023236418A1
Authority
WO
WIPO (PCT)
Prior art keywords
electrode
light
layer
emitting diode
reflective
Prior art date
Application number
PCT/CN2022/127026
Other languages
French (fr)
Chinese (zh)
Inventor
李明
王思博
廖汉忠
Original Assignee
淮安澳洋顺昌光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 淮安澳洋顺昌光电技术有限公司 filed Critical 淮安澳洋顺昌光电技术有限公司
Publication of WO2023236418A1 publication Critical patent/WO2023236418A1/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40Materials therefor
    • H01L33/405Reflective materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • H01L33/24Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate of the light emitting region, e.g. non-planar junction
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/387Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape with a plurality of electrode regions in direct contact with the semiconductor body and being electrically interconnected by another electrode layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • H01L33/501Wavelength conversion elements characterised by the materials, e.g. binder
    • H01L33/502Wavelength conversion materials

Definitions

  • the present application relates to the field of semiconductor technology, specifically, to a light-emitting diode and a light-emitting diode package.
  • LED Light Emitting Diode
  • LED Light Emitting Diode
  • LED's substrate layer, electrode barrier layer, and reflective layer Due to the absorption of light by the reflective materials in the LED's substrate layer, electrode barrier layer, and reflective layer, the light extraction efficiency of the LED is low. According to calculations in the literature, only 4% of the light in the LED can be emitted, and 96% of the light returns to the inside of the LED and is finally converted into heat after total reflection, material absorption, etc.
  • embodiments of the present application provide a light-emitting diode, including:
  • a reflective electrode including a plurality of sub-reflective electrodes dispersedly provided on the upper surface of the P-type layer;
  • a first interconnection electrode is electrically connected to the N-type layer through the first opening
  • a second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is insulated from the second interconnection electrode;
  • the number of the sub-reflective electrodes is greater than the number of the N steps.
  • embodiments of the present application provide a first possible implementation of the first aspect, wherein the sub-reflective electrodes are columnar structures arranged in an array;
  • An Ag column structure is preferred.
  • the embodiment of the present application provides a third possible implementation manner of the first aspect, wherein the height of the Ag pillar layer is 1-2um.
  • embodiments of the present application provide a fourth possible implementation of the first aspect, wherein the radius of the sub-reflective layer is 5um-30um, and the distance between two adjacent sub-reflective layers is 20um-100um.
  • embodiments of the present application provide a fifth possible implementation of the first aspect, wherein the first insulating layer is a DBR reflective layer; the second interconnection electrode includes an adhesion layer, a metal reflective layer layer, the reflective electrode, DBR reflective layer, and second interconnection electrode form multiple reflections on the light emitted from the active layer.
  • embodiments of the present application provide a sixth possible implementation manner of the first aspect, wherein the material of the adhesion layer includes: one of Ti, Cr, and Ni One or more species, with a thickness of
  • embodiments of the present application provide a seventh possible implementation manner of the first aspect, wherein the light-emitting diode further includes electrical components that are electrically connected to the first interconnection electrode and the second interconnection electrode respectively.
  • the first pad electrode and the second pad electrode are connected, and the first pad electrode and the second pad electrode are electrically insulated.
  • embodiments of the present application provide an eighth possible implementation manner of the first aspect, wherein the number of sub-reflective electrodes is more than twice the number of N steps.
  • embodiments of the present application provide a ninth possible implementation manner of the first aspect, wherein the number of N steps distributed around the light-emitting diode is greater than the number of N steps located inside the light-emitting diode.
  • embodiments of the present application also provide a light-emitting diode, including:
  • the exposed area covered by the layer includes several dispersed N steps;
  • a transparent electrode, arranged on the P-type layer, has a current expansion function
  • a reflective electrode including a plurality of Ag pillar structures dispersedly arranged on the transparent electrode;
  • a second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is insulated from the second interconnection electrode;
  • the embodiment of the present application provides a first possible implementation of the second aspect, wherein the Ag pillar structure is distributed in a dense honeycomb array, and the radius of the Ag pillar structure is 5um-30um, The spacing between two adjacent Ag pillar structures is 20um-100um.
  • embodiments of the present application also provide a light-emitting diode package, including:
  • Figure 7 shows a schematic front structural view of the silver pillar and DBR hole array provided in Embodiment 1 of the present application.
  • Figure 12 shows a schematic front structural view of the fifth opening provided in Embodiment 1 of the present application.
  • Figure 13 shows a schematic top structural view of the fifth opening provided in Embodiment 1 of the present application.
  • Figure 14 shows a schematic front structural view of the pad opening provided in Embodiment 1 of the present application.
  • Figure 15 shows a schematic top structural view of the pad opening provided in Embodiment 1 of the present application.
  • Figure 17 shows a schematic top structural view of the light-emitting diode provided in Embodiment 1 of the present application.
  • Figure 21 shows a schematic top structural view of the pad opening provided in Embodiment 2 of the present application.
  • Figure 22 shows a schematic front structural view of the light-emitting diode provided in Embodiment 2 of the present application.
  • the embodiments of the present application provide a light-emitting diode and a light-emitting diode package, which are described below through embodiments.
  • the light-emitting diode includes:
  • the transparent electrode 300 is disposed on the P-type layer 230 and exposes the N steps 211 and 212; the transparent electrode 300 is an indium tin metal oxide (ITO, Indium Tin Oxides) layer.
  • ITO Indium Tin Oxides
  • the second interconnection electrode 620 covers the P-type layer 230 and is electrically connected to a plurality of sub-reflective electrodes of the reflective electrode 400 through the second opening 520.
  • the first interconnection electrode 610 is connected to the second interconnection electrode 610.
  • the electrode 620 is insulated;
  • the first interconnection electrode 610 is electrically connected to the N-type layer 210 through the first opening 510;
  • the number of the sub-reflective electrodes is greater than the number of the N steps.
  • the sub-reflective electrode It includes an Ag pillar layer, a first high Mohs hardness metal sub-layer, a first low Mohs hardness metal sub-layer and a second high Mohs hardness metal sub-layer.
  • the Ag pillar layer has a single-layer structure, and the first high Mohs hardness metal sub-layer, the first low Mohs hardness metal sub-layer and the second high Mohs hardness metal sub-layer can have a single layer or multi-layer structure.
  • metals with high Mohs hardness include, but are not limited to, Ti, Pt, Ni, and Cr, and metals with low Mohs hardness include, but are not limited to, Al and Au.
  • the first structure of the sub-reflective electrode Ag/Ti/Pt/Ti/Pt/Al/Ti/Al/Ti/Pt;
  • the second structure of the sub-reflective electrode Ag/Ni/Pt/Ni/Pt/Al/Ti/Al/Ti/Pt;
  • the fourth structure of the sub-reflective electrode Ag/Ni/Pt/Ni/Pt/Au/Ti/Pt;
  • the fifth structure of the sub-reflective electrode Ag/Cr/Pt/Cr/Pt/Al/Ti/Al/Ti/Pt.
  • the height of the Ag pillar layer is 1-2um.
  • Ag pillars can be obtained by deposition using electron beam evaporation or sputtering.
  • the radius of the sub-reflective electrode is 5um-30um, and the distance between two adjacent sub-reflective electrodes is 20um-100um.
  • the first insulating layer 500 is a DBR reflective layer
  • the second interconnection electrode 620 includes an adhesion layer, a metal reflective layer, the reflective electrode 400, the DBR reflective layer, and the second interconnection layer.
  • the electrode 620 forms multiple reflections of the light emitted from the active layer 220 .
  • the number of the sub-reflective electrodes is more than twice the number of the N steps.
  • another light-emitting diode provided by the present invention also includes:
  • the transparent electrode 300 is provided on the P-type layer 230 and has a current spreading function
  • the Ag pillar structure, DBR reflective layer, and second interconnection electrode 620 form multiple reflections on the light emitted from the active layer 220 .
  • a third interconnection electrode 630 is further provided between the second pad electrode 920 and the second interconnection electrode 620. Interconnect electrodes 630 are electrically connected.
  • an upper insulating layer 800 is deposited as shown in FIGS. 20 and 21 .
  • the upper insulating layer 800 covers the light emitting structure 200 and includes a first pad opening 810 exposing the first interconnection electrode and a second pad exposing the third interconnection electrode. Opening 820; as shown in FIG. 22, the first pad electrode 910 is connected to the first interconnection electrode 610 through the first pad opening 810, and the second pad electrode 920 is connected to the third interconnection through the second pad opening 920.
  • the electrode 630 is electrically connected.

Abstract

The present application provides a light-emitting diode (LED) and an LED package. The LED comprises: a substrate and a light-emitting structure layer provided on the substrate, wherein the light-emitting structure layer sequentially comprises an N-type layer, an active layer and a P-type layer, the N-type layer comprises an exposed area which is not covered by the P-type layer and the active layer, and the exposed area comprises several dispersed N steps; a reflection electrode comprising a plurality of sub-reflection electrodes which are dispersedly provided on the upper surface of the P-type layer; a first insulating layer covering the light-emitting structure layer and comprising first openings exposing the N steps and second openings exposing the sub-reflecting electrodes; a first interconnection electrode electrically connected to the N-type layer by means of the first openings; and a second interconnection electrode electrically connected to the reflection electrode by means of the second openings, wherein the first interconnection electrode and the second interconnection electrode are insulated from each other, and the number of sub-reflection electrodes is greater than that of N steps. The light emission efficiency of the LED can be improved.

Description

一种发光二极管及发光二极管封装件A kind of light-emitting diode and light-emitting diode package
相关申请的交叉引用Cross-references to related applications
本申请要求于2022年06月07日提交中国国家知识产权局的申请号为202210641669.3、名称为“一种发光二极管及发光二极管封装件”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims priority to the Chinese patent application with application number 202210641669.3 and titled "A light-emitting diode and a light-emitting diode package" submitted to the State Intellectual Property Office of China on June 7, 2022, the entire content of which is incorporated by reference. in this application.
技术领域Technical field
本申请涉及半导体技术领域,具体而言,涉及一种发光二极管及发光二极管封装件。The present application relates to the field of semiconductor technology, specifically, to a light-emitting diode and a light-emitting diode package.
背景技术Background technique
发光二极管(LED,Light Emitting Diode)是一种常用的发光器件,通过电子与空穴复合释放能量实现发光,广泛应用在各种需要光源的领域。但由于LED的衬底层、电极阻挡层、反射层中的反射材料对光的吸收,导致LED的光取出效率较低。根据文献计算,LED中,只有4%的光可以出射,96%的光返回LED内部,经过全反射、材料吸收等最终转换成热。Light Emitting Diode (LED, Light Emitting Diode) is a commonly used light-emitting device that emits energy by releasing energy through the recombination of electrons and holes. It is widely used in various fields that require light sources. However, due to the absorption of light by the reflective materials in the LED's substrate layer, electrode barrier layer, and reflective layer, the light extraction efficiency of the LED is low. According to calculations in the literature, only 4% of the light in the LED can be emitted, and 96% of the light returns to the inside of the LED and is finally converted into heat after total reflection, material absorption, etc.
发明内容Contents of the invention
有鉴于此,本申请的目的在于提供发光二极管及发光二极管封装件,以提高LED的出光效率。In view of this, the purpose of this application is to provide a light-emitting diode and a light-emitting diode package to improve the light extraction efficiency of the LED.
第一方面,本申请实施例提供了发光二极管,包括:In a first aspect, embodiments of the present application provide a light-emitting diode, including:
衬底,以及设置在所述衬底上的发光结构层,所述发光结构层顺次包括N型层、有源层和P型层;所述N型层包括未被所述P型层和所述有源层覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶;A substrate, and a light-emitting structure layer provided on the substrate, the light-emitting structure layer sequentially includes an N-type layer, an active layer and a P-type layer; the N-type layer includes the P-type layer and The exposed area covered by the active layer, the exposed area includes several scattered N steps;
反射电极,包括分散设置于所述P型层的上表面的复数个子反射电极;A reflective electrode including a plurality of sub-reflective electrodes dispersedly provided on the upper surface of the P-type layer;
第一绝缘层,覆盖所述发光结构层并包括露出所述N台阶的第一开口和露出所述子反射电极的第二开口;A first insulating layer covering the light-emitting structure layer and including a first opening exposing the N steps and a second opening exposing the sub-reflective electrode;
第一互连电极,通过所述第一开口与所述N型层电性连接;A first interconnection electrode is electrically connected to the N-type layer through the first opening;
第二互连电极,通过所述第二开口与所述反射电极电性连接,所述第一互连电极与所述第二互连电极绝缘设置;A second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is insulated from the second interconnection electrode;
所述子反射电极的数量大于所述N台阶的数量。The number of the sub-reflective electrodes is greater than the number of the N steps.
结合第一方面,本申请实施例提供了第一方面的第一种可能的实施方式,其中,所述子反射电极为阵列设置的柱状结构;Combined with the first aspect, embodiments of the present application provide a first possible implementation of the first aspect, wherein the sub-reflective electrodes are columnar structures arranged in an array;
优选为Ag柱结构。An Ag column structure is preferred.
结合第一方面,本申请实施例提供了第一方面的第二种可能的实施方式,其中,所述子反射电极包括Ag柱子层、第一高莫氏硬度金属子层、第一低莫氏硬度金属子层以及第 二高莫氏硬度金属子层。Combined with the first aspect, embodiments of the present application provide a second possible implementation of the first aspect, wherein the sub-reflective electrode includes an Ag pillar layer, a first high Mohs hardness metal sub-layer, a first low Mohs hardness metal sub-layer, A hardness metal sub-layer and a second highest Mohs hardness metal sub-layer.
结合第一方面的第一种可能的实施方式,本申请实施例提供了第一方面的第三种可能的实施方式,其中,所述Ag柱子层的高度为1-2um。Combined with the first possible implementation manner of the first aspect, the embodiment of the present application provides a third possible implementation manner of the first aspect, wherein the height of the Ag pillar layer is 1-2um.
结合第一方面,本申请实施例提供了第一方面的第四种可能的实施方式,其中,所述子反射层的半径为5um-30um,相邻两个子反射层的间距为20um-100um。Combined with the first aspect, embodiments of the present application provide a fourth possible implementation of the first aspect, wherein the radius of the sub-reflective layer is 5um-30um, and the distance between two adjacent sub-reflective layers is 20um-100um.
结合第一方面,本申请实施例提供了第一方面的第五种可能的实施方式,其中,所述第一绝缘层为DBR反射层;所述第二互连电极包括粘附层、金属反射层,所述反射电极、DBR反射层、第二互连电极对从有源层发出的光形成多重反射。Combined with the first aspect, embodiments of the present application provide a fifth possible implementation of the first aspect, wherein the first insulating layer is a DBR reflective layer; the second interconnection electrode includes an adhesion layer, a metal reflective layer layer, the reflective electrode, DBR reflective layer, and second interconnection electrode form multiple reflections on the light emitted from the active layer.
结合第一方面的第五种可能的实施方式,本申请实施例提供了第一方面的第六种可能的实施方式,其中,所述粘附层的材料包括:Ti、Cr、Ni中的一种或多种,厚度为
Figure PCTCN2022127026-appb-000001
In combination with the fifth possible implementation manner of the first aspect, embodiments of the present application provide a sixth possible implementation manner of the first aspect, wherein the material of the adhesion layer includes: one of Ti, Cr, and Ni One or more species, with a thickness of
Figure PCTCN2022127026-appb-000001
结合第一方面,本申请实施例提供了第一方面的第七种可能的实施方式,其中,所述发光二极管还包括分别与所述第一互连电极和所述第二互连电极电性连接的第一焊盘电极和第二焊盘电极,所述第一焊盘电极和所述第二焊盘电极电性绝缘。In conjunction with the first aspect, embodiments of the present application provide a seventh possible implementation manner of the first aspect, wherein the light-emitting diode further includes electrical components that are electrically connected to the first interconnection electrode and the second interconnection electrode respectively. The first pad electrode and the second pad electrode are connected, and the first pad electrode and the second pad electrode are electrically insulated.
结合第一方面,本申请实施例提供了第一方面的第八种可能的实施方式,其中,所述子反射电极的数量是所述N台阶个数的2倍以上。Combined with the first aspect, embodiments of the present application provide an eighth possible implementation manner of the first aspect, wherein the number of sub-reflective electrodes is more than twice the number of N steps.
结合第一方面,本申请实施例提供了第一方面的第九种可能的实施方式,其中,所述N台阶分布在所述发光二极管的周边的数量大于其位于发光二极管内部的个数。Combined with the first aspect, embodiments of the present application provide a ninth possible implementation manner of the first aspect, wherein the number of N steps distributed around the light-emitting diode is greater than the number of N steps located inside the light-emitting diode.
第二方面,本申请实施例还提供了一种发光二极管,包括:In a second aspect, embodiments of the present application also provide a light-emitting diode, including:
衬底,设置在衬底上的发光结构层,所述发光结构层依次包括N型层、有源层和P型层,所述N型层包括未被所述P型层和所述有源层覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶;A substrate, a light-emitting structure layer provided on the substrate, the light-emitting structure layer sequentially includes an N-type layer, an active layer and a P-type layer, the N-type layer includes the P-type layer and the active layer. The exposed area covered by the layer includes several dispersed N steps;
透明电极,设置于所述P型层上,具有电流扩展功能;A transparent electrode, arranged on the P-type layer, has a current expansion function;
反射电极,包括复数个分散设置于所述透明电极上的Ag柱结构;A reflective electrode, including a plurality of Ag pillar structures dispersedly arranged on the transparent electrode;
DBR反射层,覆盖所述发光结构层,并包括露出所述N台阶的第一开口和露出所述子反射电极的第二开口;A DBR reflective layer covers the light-emitting structure layer and includes a first opening exposing the N steps and a second opening exposing the sub-reflective electrode;
第一互连电极,通过所述第一开口与所述N型层电性连接;A first interconnection electrode is electrically connected to the N-type layer through the first opening;
第二互连电极,通过所述第二开口与所述反射电极电性连接,所述第一互连电极与所述第二互连电极绝缘设置;A second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is insulated from the second interconnection electrode;
第一焊盘电极,电性连接于所述第一互连电极;a first pad electrode electrically connected to the first interconnection electrode;
第二焊盘电极,电性连接于所述第二互连电极;所述第一焊盘电极和所述第二焊盘电极电性绝缘;A second pad electrode is electrically connected to the second interconnection electrode; the first pad electrode and the second pad electrode are electrically insulated;
所述Ag柱结构、DBR反射层、第二互连电极对从有源层发出的光形成多重反射。The Ag pillar structure, DBR reflective layer, and second interconnection electrode form multiple reflections on the light emitted from the active layer.
结合第二方面,本申请实施例提供了第二方面的第一种可能的实施方式,其中,所述Ag柱结构呈密集的蜂窝状阵列分布,所述Ag柱结构的半径为5um-30um,相邻两个Ag柱结构的间距为20um-100um。Combined with the second aspect, the embodiment of the present application provides a first possible implementation of the second aspect, wherein the Ag pillar structure is distributed in a dense honeycomb array, and the radius of the Ag pillar structure is 5um-30um, The spacing between two adjacent Ag pillar structures is 20um-100um.
结合第二方面,本申请实施例提供了第二方面的第二种可能的实施方式,其中,一上绝缘层设置于所述第一焊盘电极和所述第二焊盘电极之间,包括第一焊盘开口和第二焊盘开口,第一焊盘电极穿过第一焊盘开口与所述第一互连电极电性连接,第二焊盘电极穿过所述第二焊盘开口与所述第二互连电极电性连接。Combined with the second aspect, embodiments of the present application provide a second possible implementation of the second aspect, wherein an upper insulating layer is provided between the first pad electrode and the second pad electrode, including a first pad opening and a second pad opening, a first pad electrode passing through the first pad opening to be electrically connected to the first interconnection electrode, and a second pad electrode passing through the second pad opening electrically connected to the second interconnection electrode.
结合第二方面的第二种可能的实施方式,本申请实施例提供了第二方面的第三种可能的实施方式,其中,所述第二焊盘电极与所述第二互连电极之间还设置有一第三互连电极,所述第二焊盘电极与所述第三互连电极电连接。In conjunction with the second possible implementation manner of the second aspect, embodiments of the present application provide a third possible implementation manner of the second aspect, wherein the connection between the second pad electrode and the second interconnection electrode A third interconnection electrode is also provided, and the second pad electrode is electrically connected to the third interconnection electrode.
第三方面,本申请实施例还提供了一种发光二极管封装件,包括:In a third aspect, embodiments of the present application also provide a light-emitting diode package, including:
封装体,具有安装表面;a package body having a mounting surface;
LED芯片,安装在安装表面上,该LED芯片如上所述的任一项所示,被构造为可发射一定波长范围的光;An LED chip mounted on the mounting surface, the LED chip being configured to emit light in a certain wavelength range as shown in any of the above;
磷光体,覆盖所述LED芯片,被构造为将所述LED芯片发射的光转换为另一波长的光。A phosphor, covering the LED chip, is configured to convert light emitted by the LED chip to light of another wavelength.
本申请实施例提供的发光二极管及发光二极管封装件,发光二极管包括:衬底,以及设置在所述衬底上的发光结构层,所述发光结构层顺次包括N型层、有源层和P型层;所述N型层包括未被所述P型层和所述有源层覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶;反射电极,包括分散设置于所述P型层的上表面的复数个子反射电极;第一绝缘层,覆盖所述发光结构层并包括露出所述N台阶的第一开口和露出所述子反射电极的第二开口;第一互连电极,通过所述第一开口与所述N型层电性连接;第二互连电极,通过所述第二开口与所述反射电极电性连接,所述第一互连电极与所述第二互连电极绝缘设置;所述子反射电极的数量大于所述N台阶的数量。这样,通过分散设置于P型层的上表面的复数个子反射电极,以及,子反射电极的数量大于N台阶的数量,使得LED中的反射面发生变化,改变了光的反射角以及折射角,从而改变出射光的临界角,能够使得更多的光出射到空气中,能够有效提升LED的出光效率。In the light-emitting diode and light-emitting diode package provided by embodiments of the present application, the light-emitting diode includes: a substrate, and a light-emitting structure layer provided on the substrate. The light-emitting structure layer sequentially includes an N-type layer, an active layer and P-type layer; the N-type layer includes an exposed area that is not covered by the P-type layer and the active layer, and the exposed area includes a plurality of dispersed N steps; a reflective electrode including one dispersedly provided on the P-type layer. A plurality of sub-reflective electrodes on the upper surface of the type layer; a first insulating layer covering the light-emitting structure layer and including a first opening exposing the N steps and a second opening exposing the sub-reflective electrode; a first interconnection electrode , is electrically connected to the N-type layer through the first opening; the second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is electrically connected to the second The interconnection electrodes are insulated; the number of the sub-reflective electrodes is greater than the number of the N steps. In this way, by dispersing a plurality of sub-reflective electrodes disposed on the upper surface of the P-type layer, and the number of sub-reflective electrodes is greater than the number of N steps, the reflective surface in the LED changes, changing the reflection angle and refraction angle of light, Thereby changing the critical angle of the emitted light, allowing more light to emit into the air, and effectively improving the light emitting efficiency of the LED.
为使本申请的上述目的、特征和优点能更明显易懂,下文特举较佳实施例,并配合所附附图,作详细说明如下。In order to make the above-mentioned objects, features and advantages of the present application more obvious and understandable, preferred embodiments are given below and described in detail with reference to the attached drawings.
附图说明Description of the drawings
为了更清楚地说明本申请实施例的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,应当理解,以下附图仅示出了本申请的某些实施例,因此不应被看作是对范 围的限定,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他相关的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required to be used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present application and therefore do not It should be regarded as a limitation of the scope. For those of ordinary skill in the art, other relevant drawings can be obtained based on these drawings without exerting creative efforts.
图1示出了本申请实施例一所提供的发光结构层上形成N台阶的主视结构示意图;Figure 1 shows a schematic front structural view of N steps formed on the light-emitting structure layer provided by Embodiment 1 of the present application;
图2示出了本申请实施例一所提供的发光结构层上形成N台阶的俯视结构示意图;Figure 2 shows a schematic top view of the structure of N steps formed on the light-emitting structure layer provided by Embodiment 1 of the present application;
图3示出了本申请实施例一所提供的发光结构层与透明电极的主视结构示意图;Figure 3 shows a schematic front structural view of the light-emitting structural layer and the transparent electrode provided in Embodiment 1 of the present application;
图4示出了本申请实施例一所提供的发光结构层与透明电极的俯视结构示意图;Figure 4 shows a schematic top view of the structure of the light-emitting structure layer and the transparent electrode provided in Embodiment 1 of the present application;
图5示出了本申请实施例一所提供的银柱阵列的主视结构示意图;Figure 5 shows a schematic front structural view of the silver pillar array provided in Embodiment 1 of the present application;
图6示出了本申请实施例一所提供的银柱阵列的俯视结构示意图;Figure 6 shows a schematic top view of the silver pillar array provided in Embodiment 1 of the present application;
图7示出了本申请实施例一所提供的银柱和DBR孔洞阵列的主视结构示意图;Figure 7 shows a schematic front structural view of the silver pillar and DBR hole array provided in Embodiment 1 of the present application;
图8示出了本申请实施例一所提供的银柱和DBR孔洞阵列的俯视结构示意图;Figure 8 shows a schematic top view of the silver pillar and DBR hole array provided in Embodiment 1 of the present application;
图9示出了本申请实施例一所提供的第二互连电极的主视结构示意图;Figure 9 shows a schematic front structural view of the second interconnection electrode provided in Embodiment 1 of the present application;
图10示出了本申请实施例一所提供的第四开口的主视结构示意图;Figure 10 shows a schematic front structural view of the fourth opening provided in Embodiment 1 of the present application;
图11示出了本申请实施例一所提供的第四开口的俯视结构示意图;Figure 11 shows a schematic top structural view of the fourth opening provided in Embodiment 1 of the present application;
图12示出了本申请实施例一所提供的第五开口的主视结构示意图;Figure 12 shows a schematic front structural view of the fifth opening provided in Embodiment 1 of the present application;
图13示出了本申请实施例一所提供的第五开口的俯视结构示意图;Figure 13 shows a schematic top structural view of the fifth opening provided in Embodiment 1 of the present application;
图14示出了本申请实施例一所提供的焊盘开口的主视结构示意图;Figure 14 shows a schematic front structural view of the pad opening provided in Embodiment 1 of the present application;
图15示出了本申请实施例一所提供的焊盘开口的俯视结构示意图;Figure 15 shows a schematic top structural view of the pad opening provided in Embodiment 1 of the present application;
图16示出了本申请实施例一所提供的发光二极管的主视结构示意图;Figure 16 shows a schematic front structural view of the light-emitting diode provided in Embodiment 1 of the present application;
图17示出了本申请实施例一所提供的发光二极管的俯视结构示意图;Figure 17 shows a schematic top structural view of the light-emitting diode provided in Embodiment 1 of the present application;
图18示出了本申请实施例二所提供的间隙的主视结构示意图;Figure 18 shows a schematic front structural view of the gap provided in Embodiment 2 of the present application;
图19示出了本申请实施例二所提供的间隙的俯视结构示意图;Figure 19 shows a schematic top structural view of the gap provided by Embodiment 2 of the present application;
图20示出了本申请实施例二所提供的焊盘开口的主视结构示意图;Figure 20 shows a schematic front structural view of the pad opening provided in Embodiment 2 of the present application;
图21示出了本申请实施例二所提供的焊盘开口的俯视结构示意图;Figure 21 shows a schematic top structural view of the pad opening provided in Embodiment 2 of the present application;
图22示出了本申请实施例二所提供的发光二极管的主视结构示意图;Figure 22 shows a schematic front structural view of the light-emitting diode provided in Embodiment 2 of the present application;
图23示出了现有发光二极管的出光示意图;Figure 23 shows a schematic diagram of the light emission of an existing light-emitting diode;
图24示出了本申请实施例所提供的发光二极管的出光示意图。Figure 24 shows a schematic diagram of the light emitting diode provided by the embodiment of the present application.
附图标注:100:衬底;200:发光结构层;210:N型层;220:有源层;230:P型层;211、212:N台阶;300:透明电极;400:反射电极;420:子反射电极;500:第一绝缘层;510:第一开口;520:第二开口;610:第一互连电极;620:第二互连电极;630:第三互连电极;700:第二绝缘层;710:第三开口;720:第四开口;721:第五开口;730:间隙(第一互连电极和第三互连电极之间);800:上绝缘层;810:第一焊盘开口;820:第二焊盘开口;910:第一焊盘电极;920:第二焊盘电极。References: 100: substrate; 200: light-emitting structure layer; 210: N-type layer; 220: active layer; 230: P-type layer; 211, 212: N steps; 300: transparent electrode; 400: reflective electrode; 420: sub-reflective electrode; 500: first insulating layer; 510: first opening; 520: second opening; 610: first interconnection electrode; 620: second interconnection electrode; 630: third interconnection electrode; 700 : second insulating layer; 710: third opening; 720: fourth opening; 721: fifth opening; 730: gap (between the first interconnection electrode and the third interconnection electrode); 800: upper insulating layer; 810 : first pad opening; 820: second pad opening; 910: first pad electrode; 920: second pad electrode.
具体实施方式Detailed ways
为使本申请实施例的目的、技术方案和优点更加清楚,下面将结合本申请实施例中附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。通常在此处附图中描述和示出的本申请实施例的组件可以以各种不同的配置来布置和设计。因此,以下对在附图中提供的本申请的实施例的详细描述并非旨在限制要求保护的本申请的范围,而是仅仅表示本申请的选定实施例。基于本申请的实施例,本领域技术人员在没有做出创造性劳动的前提下所获得的所有其他实施例,都属于本申请保护的范围。In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only These are part of the embodiments of this application, but not all of them. The components of the embodiments of the present application generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the application provided in the appended drawings is not intended to limit the scope of the claimed application, but rather to represent selected embodiments of the application. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without any creative work shall fall within the scope of protection of this application.
本申请实施例提供了一种发光二极管及发光二极管封装件,下面通过实施例进行描述。The embodiments of the present application provide a light-emitting diode and a light-emitting diode package, which are described below through embodiments.
实施例一Embodiment 1
如图1至图17所示,该发光二极管包括:As shown in Figures 1 to 17, the light-emitting diode includes:
衬底100,以及设置在衬底100上的发光结构层200,发光结构层200顺次包括N型层210、有源层220和P型层230;N型层210包括未被P型层230和有源层220覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶211、212,如图1-2所示;The substrate 100, and the light-emitting structure layer 200 disposed on the substrate 100, the light-emitting structure layer 200 sequentially includes an N-type layer 210, an active layer 220 and a P-type layer 230; the N-type layer 210 includes a P-type layer 230 And the exposed area covered by the active layer 220, the exposed area includes several scattered N steps 211, 212, as shown in Figure 1-2;
透明电极300,如图3-4所示,设置于P型层230上并暴露出N台阶211、212;透明电极300为铟锡金属氧化物(ITO,Indium Tin Oxides)层。The transparent electrode 300, as shown in Figure 3-4, is disposed on the P-type layer 230 and exposes the N steps 211 and 212; the transparent electrode 300 is an indium tin metal oxide (ITO, Indium Tin Oxides) layer.
反射电极400,如图5-6,包括分散设置于P型层230的上表面的复数个子反射电极420;The reflective electrode 400, as shown in Figure 5-6, includes a plurality of sub-reflective electrodes 420 dispersedly arranged on the upper surface of the P-type layer 230;
第一绝缘层500,如图7-8所示,覆盖发光结构层200并包括露出所述N台阶的第一开口510和露出所述子反射电极420的第二开口520;The first insulating layer 500, as shown in Figures 7-8, covers the light-emitting structure layer 200 and includes a first opening 510 exposing the N steps and a second opening 520 exposing the sub-reflective electrode 420;
第二互连电极620,如图9所示,覆盖于P型层230上,通过第二开口520与反射电极400的复数个子反射电极电性连接,第一互连电极610与第二互连电极620绝缘设置;The second interconnection electrode 620, as shown in FIG. 9, covers the P-type layer 230 and is electrically connected to a plurality of sub-reflective electrodes of the reflective electrode 400 through the second opening 520. The first interconnection electrode 610 is connected to the second interconnection electrode 610. The electrode 620 is insulated;
第一互连电极610,如图12所示,通过第一开口510与N型层210电性连接;The first interconnection electrode 610, as shown in FIG. 12, is electrically connected to the N-type layer 210 through the first opening 510;
第一互连电极与所述第二互连电极绝缘设置,具体地如图10和图11所述,通过第二绝缘层700绝缘设置。第二绝缘层700,覆盖第二互连电极620并包括露出所述N台阶的第三开口710、露出第二互连电极620部分区域的若干个第四开口720。The first interconnection electrode is insulated from the second interconnection electrode. Specifically, as shown in FIG. 10 and FIG. 11 , the first interconnection electrode is insulated by the second insulating layer 700 . The second insulating layer 700 covers the second interconnection electrode 620 and includes a third opening 710 exposing the N steps, and a plurality of fourth openings 720 exposing part of the second interconnection electrode 620 .
第一互连电极610通过第三开口710与N型层220电性连接,并设置有露出第四开口720的第五开口721(如图13所示,黑色区域)。The first interconnection electrode 610 is electrically connected to the N-type layer 220 through the third opening 710, and is provided with a fifth opening 721 (shown in FIG. 13, black area) exposing the fourth opening 720.
所述子反射电极的数量大于所述N台阶的数量。The number of the sub-reflective electrodes is greater than the number of the N steps.
本申请实施例中,作为一可选实施例,所述子反射电极为阵列设置的柱状结构;In the embodiment of this application, as an optional embodiment, the sub-reflective electrode is a columnar structure arranged in an array;
优选为Ag柱结构。An Ag column structure is preferred.
本申请实施例中,为了有效降低阵列Ag柱结构的薄膜应力,保障Ag柱结构获得更好的反射特性以及附着力,作为一可选实施例,作为一可选实施例,所述子反射电极包括Ag 柱子层、第一高莫氏硬度金属子层、第一低莫氏硬度金属子层以及第二高莫氏硬度金属子层。其中,Ag柱子层为单层结构,第一高莫氏硬度金属子层、第一低莫氏硬度金属子层以及第二高莫氏硬度金属子层可以为单层或多层结构。In the embodiment of this application, in order to effectively reduce the film stress of the array Ag pillar structure and ensure that the Ag pillar structure obtains better reflection characteristics and adhesion, as an optional embodiment, the sub-reflective electrode It includes an Ag pillar layer, a first high Mohs hardness metal sub-layer, a first low Mohs hardness metal sub-layer and a second high Mohs hardness metal sub-layer. The Ag pillar layer has a single-layer structure, and the first high Mohs hardness metal sub-layer, the first low Mohs hardness metal sub-layer and the second high Mohs hardness metal sub-layer can have a single layer or multi-layer structure.
本申请实施例中,高莫氏硬度金属包括但不限于:Ti、Pt、Ni、Cr,低莫氏硬度金属包括但不限于:Al、Au。In the embodiments of this application, metals with high Mohs hardness include, but are not limited to, Ti, Pt, Ni, and Cr, and metals with low Mohs hardness include, but are not limited to, Al and Au.
本申请实施例中,作为一可选实施例,子反射电极包括但不限于以下结构:In the embodiment of this application, as an optional embodiment, the sub-reflective electrode includes but is not limited to the following structure:
子反射电极第一结构:Ag/Ti/Pt/Ti/Pt/Al/Ti/Al/Ti/Pt;The first structure of the sub-reflective electrode: Ag/Ti/Pt/Ti/Pt/Al/Ti/Al/Ti/Pt;
子反射电极第二结构:Ag/Ni/Pt/Ni/Pt/Al/Ti/Al/Ti/Pt;The second structure of the sub-reflective electrode: Ag/Ni/Pt/Ni/Pt/Al/Ti/Al/Ti/Pt;
子反射电极第三结构:Ag/Ti/Pt/Ti/Pt/Au/Ti/Pt;The third structure of the sub-reflective electrode: Ag/Ti/Pt/Ti/Pt/Au/Ti/Pt;
子反射电极第四结构:Ag/Ni/Pt/Ni/Pt/Au/Ti/Pt;The fourth structure of the sub-reflective electrode: Ag/Ni/Pt/Ni/Pt/Au/Ti/Pt;
子反射电极第五结构:Ag/Cr/Pt/Cr/Pt/Al/Ti/Al/Ti/Pt。The fifth structure of the sub-reflective electrode: Ag/Cr/Pt/Cr/Pt/Al/Ti/Al/Ti/Pt.
本申请实施例中,低莫氏硬度金属Al和Au用于以包裹和披覆的方式形成梯形的Ag柱,Pt作为最后一层保护层,用于保护Ag柱,以及,进行侧边反射。In the embodiment of this application, low Mohs hardness metals Al and Au are used to form trapezoidal Ag pillars in a wrapping and covering manner, and Pt is used as the last protective layer to protect the Ag pillars and perform side reflection.
本申请实施例中,作为一可选实施例,所述Ag柱子层的高度为1-2um。可采用电子束蒸镀或者溅射方式进行沉积以获得Ag柱。In the embodiment of this application, as an optional embodiment, the height of the Ag pillar layer is 1-2um. Ag pillars can be obtained by deposition using electron beam evaporation or sputtering.
本申请实施例中,作为一可选实施例,所述子反射电极的半径为5um-30um,相邻两个子反射电极的间距为20um-100um。In the embodiment of this application, as an optional embodiment, the radius of the sub-reflective electrode is 5um-30um, and the distance between two adjacent sub-reflective electrodes is 20um-100um.
本申请实施例中,作为一可选实施例,第一绝缘层500为DBR反射层;第二互连电极620包括粘附层、金属反射层,反射电极400、DBR反射层、第二互连电极620对从有源层220发出的光形成多重反射。In the embodiment of this application, as an optional embodiment, the first insulating layer 500 is a DBR reflective layer; the second interconnection electrode 620 includes an adhesion layer, a metal reflective layer, the reflective electrode 400, the DBR reflective layer, and the second interconnection layer. The electrode 620 forms multiple reflections of the light emitted from the active layer 220 .
本申请实施例中,作为一可选实施例,所述粘附层的材料采用元素周期表中位于铟锡金属与银金属之间的金属元素,包括:Ti、Cr、Ni中的一种或多种,厚度为
Figure PCTCN2022127026-appb-000002
In the embodiment of the present application, as an optional embodiment, the material of the adhesion layer is a metal element located between indium tin metal and silver metal in the periodic table of elements, including: one of Ti, Cr, Ni or Various, thickness is
Figure PCTCN2022127026-appb-000002
本申请实施例中,作为一可选实施例,所述发光二极管还包括分别与第一互连电极610和第二互连电极620电性连接的第一焊盘电极910和第二焊盘电极920,第一焊盘电极910和第二焊盘电极920电性绝缘。In the embodiment of the present application, as an optional embodiment, the light-emitting diode further includes a first pad electrode 910 and a second pad electrode that are electrically connected to the first interconnection electrode 610 and the second interconnection electrode 620 respectively. 920. The first pad electrode 910 and the second pad electrode 920 are electrically insulated.
本申请实施例中,作为一可选实施例,所述子反射电极的数量是所述N台阶个数的2倍以上。In the embodiment of the present application, as an optional embodiment, the number of the sub-reflective electrodes is more than twice the number of the N steps.
本申请实施例中,作为一可选实施例,所述N台阶分布在所述发光二极管的周边的数量大于其位于发光二极管内部的个数。In the embodiment of the present application, as an optional embodiment, the number of N steps distributed around the light-emitting diode is greater than the number of them located inside the light-emitting diode.
本申请实施例中,作为再一可选实施例,该发光二极管还包括:In the embodiment of this application, as yet another optional embodiment, the light-emitting diode further includes:
上绝缘层800,如图14和15所示,覆盖所述发光结构200,包括第一焊盘开口810和第二焊盘开口820;如图16和图17所示,第一焊盘电极910穿过第一焊盘开口810与第 一互连电极610电性连接,第二焊盘电极920穿过第二焊盘开口820与第二互连电极620电性连接。The upper insulating layer 800, as shown in Figures 14 and 15, covers the light emitting structure 200 and includes a first pad opening 810 and a second pad opening 820; as shown in Figures 16 and 17, the first pad electrode 910 The first pad opening 810 is electrically connected to the first interconnection electrode 610 , and the second pad electrode 920 is electrically connected to the second interconnection electrode 620 through the second pad opening 820 .
实施例二Embodiment 2
如图18至图22所示,本发明提供的另一发光二极管,同样包括:As shown in Figures 18 to 22, another light-emitting diode provided by the present invention also includes:
衬底100,设置在衬底100上的发光结构层200,发光结构层200依次包括N型层210、有源层220和P型层230,N型层210包括未被P型层230和有源层220覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶; Substrate 100, a light-emitting structure layer 200 provided on the substrate 100. The light-emitting structure layer 200 includes an N-type layer 210, an active layer 220 and a P-type layer 230 in sequence. The N-type layer 210 includes a non-P-type layer 230 and an active layer 230. The exposed area covered by the source layer 220 includes several dispersed N steps;
透明电极300,设置于P型层230上,具有电流扩展功能;The transparent electrode 300 is provided on the P-type layer 230 and has a current spreading function;
反射电极400,包括复数个分散设置于透明电极300上的Ag柱结构;The reflective electrode 400 includes a plurality of Ag pillar structures dispersedly arranged on the transparent electrode 300;
第一绝缘层500,为DBR反射层,覆盖发光结构层200,并包括露出所述N台阶的第一开口510和露出所述子反射电极的第二开口520;The first insulating layer 500 is a DBR reflective layer, covers the light-emitting structure layer 200, and includes a first opening 510 exposing the N steps and a second opening 520 exposing the sub-reflective electrode;
第一互连电极610,通过第一开口510与N型层210电性连接;The first interconnection electrode 610 is electrically connected to the N-type layer 210 through the first opening 510;
第二互连电极620,通过第二开口520与反射电极400电性连接,第一互连电极610与第二互连电极620绝缘设置;The second interconnection electrode 620 is electrically connected to the reflective electrode 400 through the second opening 520, and the first interconnection electrode 610 and the second interconnection electrode 620 are insulated;
第一焊盘电极910,电性连接于第一互连电极610;The first pad electrode 910 is electrically connected to the first interconnection electrode 610;
第二焊盘电极920,电性连接于第二互连电极620;第一焊盘电极810和第二焊盘电极820电性绝缘;The second pad electrode 920 is electrically connected to the second interconnection electrode 620; the first pad electrode 810 and the second pad electrode 820 are electrically insulated;
一上绝缘层800设置于第一焊盘电极910和第二焊盘电极920之间,包括第一焊盘开口810和第二焊盘开口820,第一焊盘电极910穿过第一焊盘开口810与第一互连电极610电性连接,第二焊盘电极920穿过第二焊盘开口820与第二互连电极620电性连接。An upper insulating layer 800 is disposed between the first pad electrode 910 and the second pad electrode 920 and includes a first pad opening 810 and a second pad opening 820. The first pad electrode 910 passes through the first pad. The opening 810 is electrically connected to the first interconnection electrode 610 , and the second pad electrode 920 passes through the second pad opening 820 and is electrically connected to the second interconnection electrode 620 .
所述Ag柱结构、DBR反射层、第二互连电极620对从有源层220发出的光形成多重反射。The Ag pillar structure, DBR reflective layer, and second interconnection electrode 620 form multiple reflections on the light emitted from the active layer 220 .
本申请实施例中,作为一可选实施例,所述Ag柱结构呈密集的蜂窝状阵列分布,所述Ag柱结构的半径为5um-30um,相邻两个Ag柱结构的间距为20um-100um。In the embodiment of this application, as an optional embodiment, the Ag pillar structure is distributed in a dense honeycomb array, the radius of the Ag pillar structure is 5um-30um, and the spacing between two adjacent Ag pillar structures is 20um- 100um.
本申请实施例中,通过设置子反射电极为阵列银柱(Ag),并采用高反射率的金属作为侧面反射层,对Ag柱进行包裹和保护,形成粗化的DBR结构,从而改变LED中的反射面,有效改变了光的反射角以及折射角,进而改变出射光的临界角,能够使得更多的光出射到空气中,从而提升了LED的出光效率;同时,Ag柱阵列的结构,能够提供电流的多路径连通,从而能够提供更好的电流扩展性能和散热性能,使得LED还具有优异的电流扩展性能,进而提高LED的电流扩展和散热能力。In the embodiment of the present application, the sub-reflective electrode is set as an array of silver pillars (Ag), and a high-reflectivity metal is used as a side reflective layer to wrap and protect the Ag pillars to form a roughened DBR structure, thereby changing the structure of the LED. The reflective surface effectively changes the reflection angle and refraction angle of light, thereby changing the critical angle of the emitted light, allowing more light to emit into the air, thereby improving the light emitting efficiency of the LED; at the same time, the structure of the Ag column array, It can provide multi-path connection of current, thereby providing better current expansion performance and heat dissipation performance, so that the LED also has excellent current expansion performance, thereby improving the current expansion and heat dissipation capabilities of the LED.
本申请实施例中与实施例一的另一结构区别在于,第二焊盘电极920与第二互连电极620之间还设置有一第三互连电极630,第二焊盘电极920与第三互连电极630电连接。针 对区别技术结合附图说明,实施例一中图1至图11的所对应的结构示意图及其制备方法同样适用于本实施例:Another structural difference between the embodiment of the present application and Embodiment 1 is that a third interconnection electrode 630 is further provided between the second pad electrode 920 and the second interconnection electrode 620. Interconnect electrodes 630 are electrically connected. In view of the description of the different technologies in conjunction with the accompanying drawings, the corresponding structural schematic diagrams and preparation methods of Figures 1 to 11 in Embodiment 1 are also applicable to this embodiment:
在图11所示的发光二极管结构的基础上,沉积第一互连电极610和第三互连电极630,如图18和19所示,第一互连电极610通过第三开口710与N型层220电性连接,第三互连电极630通过第四开口720与第二互连电极连接,第一互连电极610与第三互连电极630之间通过间隙730(图19灰色区域)相互间隔绝缘。On the basis of the light emitting diode structure shown in Figure 11, a first interconnection electrode 610 and a third interconnection electrode 630 are deposited. As shown in Figures 18 and 19, the first interconnection electrode 610 is connected to the N-type through the third opening 710. The layer 220 is electrically connected, the third interconnection electrode 630 is connected to the second interconnection electrode through the fourth opening 720, and the first interconnection electrode 610 and the third interconnection electrode 630 are connected to each other through the gap 730 (gray area in Figure 19). Spaced insulation.
接着如图20和21所示沉积上绝缘层800,上绝缘层800覆盖发光结构200,并包括暴露第一互连电极的第一焊盘开口810和暴露第三互连电极的第二焊盘开口820;如图22所示,第一焊盘电极910通过第一焊盘开口810与第一互连电极610电极连接,第二焊盘电极920通过第二焊盘开口920与第三互连电极630电性连接。Next, an upper insulating layer 800 is deposited as shown in FIGS. 20 and 21 . The upper insulating layer 800 covers the light emitting structure 200 and includes a first pad opening 810 exposing the first interconnection electrode and a second pad exposing the third interconnection electrode. Opening 820; as shown in FIG. 22, the first pad electrode 910 is connected to the first interconnection electrode 610 through the first pad opening 810, and the second pad electrode 920 is connected to the third interconnection through the second pad opening 920. The electrode 630 is electrically connected.
图23示出了现有发光二极管的出光示意图;Figure 23 shows a schematic diagram of the light emission of an existing light-emitting diode;
图24示出了本申请实施例所提供的发光二极管的出光示意图。Figure 24 shows a schematic diagram of the light emitting diode provided by the embodiment of the present application.
如图23和图24所示,图23中,光从多量子阱(MQW,Multi Quantum Well)发射,经过GaN层,在DBR层界面发生了反射,图24由于Ag柱的存在,形成粗化的DBR层界面,从而改变光的反射面,构成全角反射镜(ODR,Omni Directional Reflector)结构,使得发光区发出的一部分光在DBR层和Ag柱界面改变反射角度,进而改变光的折射角,导致出射光的临界角发生变化,使得更多的出射光在蓝宝石和GaN界面不满足全反射的条件,从而出射到空气中,提高了LED的光提取效率。As shown in Figure 23 and Figure 24, in Figure 23, light is emitted from the Multi Quantum Well (MQW, Multi Quantum Well), passes through the GaN layer, and is reflected at the DBR layer interface. Figure 24 is roughened due to the presence of Ag pillars. The interface of the DBR layer changes the reflection surface of light and forms an Omni Directional Reflector (ODR) structure, so that part of the light emitted from the light-emitting area changes the reflection angle at the interface between the DBR layer and the Ag pillar, thereby changing the refraction angle of the light. This causes the critical angle of the emitted light to change, causing more of the emitted light to fail to meet the conditions of total reflection at the interface between sapphire and GaN, and thus emit into the air, thereby improving the light extraction efficiency of the LED.
实施例三Embodiment 3
本申请实施例提供的发光二极管封装件,包括:The light-emitting diode package provided by the embodiment of the present application includes:
封装体,具有安装表面;a package body having a mounting surface;
LED芯片,安装在安装表面上,该LED芯片如上的任一项所示,被构造为可发射一定波长范围的光;An LED chip mounted on the mounting surface, the LED chip being configured to emit light within a certain range of wavelengths as shown in any of the above;
磷光体,覆盖所述LED芯片,被构造为将所述LED芯片发射的光转换为另一波长的光。A phosphor, covering the LED chip, is configured to convert light emitted by the LED chip to light of another wavelength.
应注意到:相似的标号和字母在下面的附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步定义和解释,此外,术语“第一”、“第二”、“第三”等仅用于区分描述,而不能理解为指示或暗示相对重要性。It should be noted that similar reference numerals and letters represent similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need further definition and explanation in subsequent drawings. In addition, the terms "first", "second", "third", etc. are only used to distinguish descriptions and shall not be understood as indicating or implying relative importance.
最后应说明的是:以上所述实施例,仅为本申请的具体实施方式,用以说明本申请的技术方案,而非对其限制,本申请的保护范围并不局限于此,尽管参照前述实施例对本申请进行了详细的说明,本领域的普通技术人员应当理解:任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,其依然可以对前述实施例所记载的技术方案进行修改或可轻 易想到变化,或者对其中部分技术特征进行等同替换;而这些修改、变化或者替换,并不使相应技术方案的本质脱离本申请实施例技术方案的精神和范围。都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应所述以权利要求的保护范围为准。Finally, it should be noted that the above-mentioned embodiments are only specific implementation modes of the present application, and are used to illustrate the technical solutions of the present application, but not to limit them. The protection scope of the present application is not limited thereto. Although refer to the foregoing The embodiments describe the present application in detail. Those of ordinary skill in the art should understand that any person familiar with the technical field can still modify the technical solutions recorded in the foregoing embodiments within the technical scope disclosed in the present application. It is possible to easily think of changes or equivalent substitutions of some of the technical features; however, these modifications, changes or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present application. All are covered by the protection scope of this application. Therefore, the protection scope of this application should be determined by the protection scope of the claims.

Claims (15)

  1. 一种发光二极管,其特征在于,包括:A light-emitting diode, characterized by including:
    衬底,以及设置在所述衬底上的发光结构层,所述发光结构层顺次包括N型层、有源层和P型层;所述N型层包括未被所述P型层和所述有源层覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶;A substrate, and a light-emitting structure layer provided on the substrate, the light-emitting structure layer sequentially includes an N-type layer, an active layer and a P-type layer; the N-type layer includes the P-type layer and The exposed area covered by the active layer, the exposed area includes several scattered N steps;
    反射电极,包括分散设置于所述P型层的上表面的复数个子反射电极;A reflective electrode, including a plurality of sub-reflective electrodes dispersedly provided on the upper surface of the P-type layer;
    第一绝缘层,覆盖所述发光结构层并包括露出所述N台阶的第一开口和露出所述子反射电极的第二开口;A first insulating layer covering the light-emitting structure layer and including a first opening exposing the N steps and a second opening exposing the sub-reflective electrode;
    第一互连电极,通过所述第一开口与所述N型层电性连接;A first interconnection electrode is electrically connected to the N-type layer through the first opening;
    第二互连电极,通过所述第二开口与所述反射电极电性连接,所述第一互连电极与所述第二互连电极绝缘设置;A second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is insulated from the second interconnection electrode;
    所述子反射电极的数量大于所述N台阶的数量。The number of the sub-reflective electrodes is greater than the number of the N steps.
  2. 根据权利要求1所述的发光二极管,其特征在于,所述子反射电极为阵列设置的柱状结构;The light-emitting diode according to claim 1, wherein the sub-reflective electrode is a columnar structure arranged in an array;
    优选为Ag柱结构。An Ag column structure is preferred.
  3. 根据权利要求1所述的发光二极管,其特征在于,所述子反射电极包括Ag柱子层、第一高莫氏硬度金属子层、第一低莫氏硬度金属子层以及第二高莫氏硬度金属子层。The light-emitting diode according to claim 1, wherein the sub-reflective electrode includes an Ag pillar layer, a first high Mohs hardness metal sub-layer, a first low Mohs hardness metal sub-layer and a second high Mohs hardness metal sub-layer. Metal sublayer.
  4. 根据权利要求2所述的发光二极管,其特征在于,所述Ag柱子层的高度为1-2um。The light-emitting diode according to claim 2, wherein the height of the Ag pillar layer is 1-2um.
  5. 根据权利要求1所述的发光二极管,其特征在于,所述子反射层的半径为5um-30um,相邻两个子反射层的间距为20um-100um。The light-emitting diode according to claim 1, wherein the radius of the sub-reflective layer is 5um-30um, and the distance between two adjacent sub-reflective layers is 20um-100um.
  6. 根据权利要求1所述的发光二极管,其特征在于,所述第一绝缘层为DBR反射层;所述第二互连电极包括粘附层、金属反射层,所述反射电极、DBR反射层、第二互连电极对从有源层发出的光形成多重反射。The light-emitting diode according to claim 1, wherein the first insulating layer is a DBR reflective layer; the second interconnection electrode includes an adhesion layer and a metal reflective layer, and the reflective electrode, DBR reflective layer, The second interconnection electrode forms multiple reflections of light emitted from the active layer.
  7. 根据权利要求6所述的发光二极管,其特征在于,所述粘附层的材料包括:Ti、Cr、Ni中的一种或多种,厚度为
    Figure PCTCN2022127026-appb-100001
    The light-emitting diode according to claim 6, characterized in that the material of the adhesion layer includes: one or more of Ti, Cr, and Ni, with a thickness of
    Figure PCTCN2022127026-appb-100001
  8. 根据权利要求1所述的发光二极管,其特征在于,所述发光二极管还包括分别与所述第一互连电极和所述第二互连电极电性连接的第一焊盘电极和第二焊盘电极,所述第一焊盘电极和所述第二焊盘电极电性绝缘。The light-emitting diode according to claim 1, wherein the light-emitting diode further includes a first pad electrode and a second pad electrode electrically connected to the first interconnection electrode and the second interconnection electrode respectively. pad electrode, the first pad electrode and the second pad electrode are electrically insulated.
  9. 根据权利要求1所述的发光二极管,其特征在于,所述子反射电极的数量是所述N台阶个数的2倍以上。The light-emitting diode according to claim 1, wherein the number of the sub-reflective electrodes is more than twice the number of the N steps.
  10. 根据权利要求1所述的发光二极管,其特征在于,所述N台阶分布在所述发光二极管的周边的数量大于其位于发光二极管内部的个数。The light-emitting diode according to claim 1, wherein the number of N steps distributed around the light-emitting diode is greater than the number inside the light-emitting diode.
  11. 一种发光二极管,包括:A light-emitting diode, including:
    衬底,设置在衬底上的发光结构层,所述发光结构层依次包括N型层、有源层和P型层,所述N型层包括未被所述P型层和所述有源层覆盖的暴露区域,所述暴露区域包括若干个分散的N台阶;A substrate, a light-emitting structure layer provided on the substrate, the light-emitting structure layer sequentially includes an N-type layer, an active layer and a P-type layer, the N-type layer includes the P-type layer and the active layer. The exposed area covered by the layer includes several dispersed N steps;
    透明电极,设置于所述P型层上,具有电流扩展功能;A transparent electrode, arranged on the P-type layer, has a current expansion function;
    反射电极,包括复数个分散设置于所述透明电极上的Ag柱结构;A reflective electrode, including a plurality of Ag pillar structures dispersedly arranged on the transparent electrode;
    DBR反射层,覆盖所述发光结构层,并包括露出所述N台阶的第一开口和露出所述子反射电极的第二开口;A DBR reflective layer covers the light-emitting structure layer and includes a first opening exposing the N steps and a second opening exposing the sub-reflective electrode;
    第一互连电极,通过所述第一开口与所述N型层电性连接;A first interconnection electrode is electrically connected to the N-type layer through the first opening;
    第二互连电极,通过所述第二开口与所述反射电极电性连接,所述第一互连电极与所述第二互连电极绝缘设置;A second interconnection electrode is electrically connected to the reflective electrode through the second opening, and the first interconnection electrode is insulated from the second interconnection electrode;
    第一焊盘电极,电性连接于所述第一互连电极;a first pad electrode electrically connected to the first interconnection electrode;
    第二焊盘电极,电性连接于所述第二互连电极;所述第一焊盘电极和所述第二焊盘电极电性绝缘;A second pad electrode is electrically connected to the second interconnection electrode; the first pad electrode and the second pad electrode are electrically insulated;
    所述Ag柱结构、DBR反射层、第二互连电极对从有源层发出的光形成多重反射。The Ag pillar structure, DBR reflective layer, and second interconnection electrode form multiple reflections on the light emitted from the active layer.
  12. 根据权利要求11所述的发光二极管,其特征在于,所述Ag柱结构呈密集的蜂窝状阵列分布,所述Ag柱结构的半径为5um-30um,相邻两个Ag柱结构的间距为20um-100um。The light-emitting diode according to claim 11, characterized in that the Ag pillar structure is distributed in a dense honeycomb array, the radius of the Ag pillar structure is 5um-30um, and the distance between two adjacent Ag pillar structures is 20um. -100um.
  13. 根据权利要求11所述的发光二极管,其特征在于,一上绝缘层设置于所述第一焊盘电极和所述第二焊盘电极之间,包括第一焊盘开口和第二焊盘开口,第一焊盘电极穿过第一焊盘开口与所述第一互连电极电性连接,第二焊盘电极穿过所述第二焊盘开口与所述第二互连电极电性连接。The light-emitting diode of claim 11, wherein an upper insulating layer is disposed between the first pad electrode and the second pad electrode, including a first pad opening and a second pad opening. , the first pad electrode passes through the first pad opening and is electrically connected to the first interconnection electrode, and the second pad electrode passes through the second pad opening and is electrically connected to the second interconnection electrode .
  14. 根据权利要求13所述的发光二极管,其特征在于,所述第二焊盘电极与所述第二互连电极之间还设置有一第三互连电极,所述第二焊盘电极与所述第三互连电极电连接。The light-emitting diode of claim 13, wherein a third interconnection electrode is further provided between the second pad electrode and the second interconnection electrode, and the second pad electrode and the second interconnection electrode are The third interconnection electrode is electrically connected.
  15. 一种发光二极管封装件,包括:A light-emitting diode package, including:
    封装体,具有安装表面;a package body having a mounting surface;
    LED芯片,安装在安装表面上,该LED芯片如权利要求1~13所述的任一项所示,被构造为可发射一定波长范围的光;An LED chip is mounted on the mounting surface, the LED chip being configured to emit light in a certain wavelength range as shown in any one of claims 1 to 13;
    磷光体,覆盖所述LED芯片,被构造为将所述LED芯片发射的光转换为另一波长的光。A phosphor, covering the LED chip, is configured to convert light emitted by the LED chip to light of another wavelength.
PCT/CN2022/127026 2022-06-07 2022-10-24 Light-emitting diode and light-emitting diode package WO2023236418A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210641669.3 2022-06-07
CN202210641669.3A CN115000269B (en) 2022-06-07 2022-06-07 Light emitting diode and light emitting diode package

Publications (1)

Publication Number Publication Date
WO2023236418A1 true WO2023236418A1 (en) 2023-12-14

Family

ID=83033522

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2022/127026 WO2023236418A1 (en) 2022-06-07 2022-10-24 Light-emitting diode and light-emitting diode package

Country Status (2)

Country Link
CN (1) CN115000269B (en)
WO (1) WO2023236418A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115000269B (en) * 2022-06-07 2024-03-01 淮安澳洋顺昌光电技术有限公司 Light emitting diode and light emitting diode package

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014178583A1 (en) * 2013-05-01 2014-11-06 서울바이오시스 주식회사 Light-emitting diode module having light-emitting diode joined through solder paste and light-emitting diode
CN105591002A (en) * 2016-02-01 2016-05-18 大连德豪光电科技有限公司 LED flip chip with reflection layer and preparation method thereof
CN212342655U (en) * 2020-04-01 2021-01-12 厦门三安光电有限公司 Light emitting diode
CN114203747A (en) * 2021-12-08 2022-03-18 厦门市三安光电科技有限公司 Light-emitting diode
CN114391185A (en) * 2021-12-03 2022-04-22 厦门市三安光电科技有限公司 Ultraviolet light-emitting diode and light-emitting device
CN115000269A (en) * 2022-06-07 2022-09-02 淮安澳洋顺昌光电技术有限公司 Light emitting diode and light emitting diode packaging piece

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100675202B1 (en) * 2006-02-02 2007-01-29 삼성전기주식회사 Vertically structured gan type light emitting diode device and method of manufacturing the same
KR101812745B1 (en) * 2011-05-12 2017-12-27 서울바이오시스 주식회사 Light emitting diode and method for fabricating the same
KR102641239B1 (en) * 2015-07-10 2024-02-29 서울바이오시스 주식회사 Light emitting diode, method of fabricating the same, and light emitting device module having the same
KR102543183B1 (en) * 2018-01-26 2023-06-14 삼성전자주식회사 Semiconductor light emitting device
KR102624112B1 (en) * 2018-10-23 2024-01-12 서울바이오시스 주식회사 Flip chip type light emitting diode chip
CN114141925B (en) * 2021-12-01 2023-06-09 厦门三安光电有限公司 Light emitting diode

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014178583A1 (en) * 2013-05-01 2014-11-06 서울바이오시스 주식회사 Light-emitting diode module having light-emitting diode joined through solder paste and light-emitting diode
CN105591002A (en) * 2016-02-01 2016-05-18 大连德豪光电科技有限公司 LED flip chip with reflection layer and preparation method thereof
CN212342655U (en) * 2020-04-01 2021-01-12 厦门三安光电有限公司 Light emitting diode
CN114391185A (en) * 2021-12-03 2022-04-22 厦门市三安光电科技有限公司 Ultraviolet light-emitting diode and light-emitting device
CN114203747A (en) * 2021-12-08 2022-03-18 厦门市三安光电科技有限公司 Light-emitting diode
CN115000269A (en) * 2022-06-07 2022-09-02 淮安澳洋顺昌光电技术有限公司 Light emitting diode and light emitting diode packaging piece

Also Published As

Publication number Publication date
CN115000269A (en) 2022-09-02
CN115000269B (en) 2024-03-01

Similar Documents

Publication Publication Date Title
JP2019179927A (en) High reflection flip chip LED die
TWI466328B (en) Flip-chip light emitting diode and manufacturing method and application thereof
US6380564B1 (en) Semiconductor light emitting device
US20200395511A1 (en) Semiconductor light emitting device
TWI472062B (en) Semiconductor light emitting device and manufacturing method thereof
JP5630384B2 (en) Group III nitride semiconductor light emitting device manufacturing method
US9590143B2 (en) Light emitting device
US20230268466A1 (en) Light emitting diode device
CN111433921B (en) Light-emitting diode
TWI473298B (en) Semiconductor light emitting device and flip chip package device
TWI624964B (en) Electrode and photoelectric semiconductor device using the same
WO2023236418A1 (en) Light-emitting diode and light-emitting diode package
JP5165254B2 (en) Flip chip type light emitting device
JP5731731B2 (en) Light emitting device
CN108075021A (en) Include the semiconductor light-emitting apparatus of reflector layer with multi-layer structure
CN113903836A (en) Flip-chip light emitting diode and light emitting device
US20230026786A1 (en) Light emitting device
CN110429166B (en) LED chip
TW201717432A (en) Light emitting device
JP2020021785A (en) Semiconductor light-emitting element
CN114899290A (en) Light emitting diode chip and light emitting diode package
TW201349576A (en) LED with reflector protection layer
JP2009200254A (en) Semiconductor light emitting element
CN111446338B (en) Light emitting diode
CN211350691U (en) Semiconductor light-emitting element

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22945547

Country of ref document: EP

Kind code of ref document: A1