WO2023217261A1 - Display panel and display device - Google Patents

Display panel and display device Download PDF

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Publication number
WO2023217261A1
WO2023217261A1 PCT/CN2023/093801 CN2023093801W WO2023217261A1 WO 2023217261 A1 WO2023217261 A1 WO 2023217261A1 CN 2023093801 W CN2023093801 W CN 2023093801W WO 2023217261 A1 WO2023217261 A1 WO 2023217261A1
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WO
WIPO (PCT)
Prior art keywords
sub
pixels
extension section
adjacent
via hole
Prior art date
Application number
PCT/CN2023/093801
Other languages
French (fr)
Chinese (zh)
Inventor
台玉可
王世君
王继国
王洋
刘屹
杨心澜
魏旃
丁腾飞
吕广爽
陈公达
齐胜美
梁海瑶
彭洲
张盛丰
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Publication of WO2023217261A1 publication Critical patent/WO2023217261A1/en

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Classifications

    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3607Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals for displaying colours or for displaying grey scales with a specific pixel layout, e.g. using sub-pixels
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers

Definitions

  • Embodiments of the present disclosure relate to but are not limited to the field of display technology, and in particular, to a display substrate and a display device.
  • Liquid crystal display devices are widely used in modern information equipment, such as monitors, televisions, mobile phones, and digital products, due to their advantages of light weight, low power consumption, low radiation, and portability.
  • a dual gate structure is used to drive sub-pixels.
  • two gate lines are provided in one pixel, each gate line corresponds to a different sub-pixel, and the same data line is used between the two sub-pixels.
  • Such a design can halve the data lines, thus halving the number of data driver chips, achieving cost savings.
  • R, G, and B sub-pixels in the same row are connected to different gate lines.
  • the power supply conditions in the data lines are different, it will cause display differences between adjacent pixel columns, resulting in vertical lines or shaking heads. bad.
  • an embodiment of the present disclosure provides a display substrate, including a substrate and a plurality of sub-pixels located on one side of the substrate and arranged in M rows and N groups. Each group of sub-pixels includes two columns of sub-pixels.
  • the display substrate It also includes M pairs of gate lines, which correspond to M rows of sub-pixels one-to-one.
  • the pair of gate lines include a first gate line and a second gate line extending along the first direction.
  • the first gate line and the second gate line Set separately On opposite sides of the corresponding row of sub-pixels and between two adjacent rows of sub-pixels, the first direction is the direction of the row;
  • the display substrate also includes N data lines.
  • Each data line corresponds to two adjacent groups of sub-pixels.
  • the adjacent two groups of sub-pixels corresponding to the same data line are respectively the first group of sub-pixels and the second group of sub-pixels.
  • the pixel electrodes of the odd-numbered rows of sub-pixels in the first group of sub-pixels are connected to the corresponding data lines
  • the pixel electrodes of the even-numbered rows of sub-pixels in the second group of sub-pixels are connected to the corresponding data lines;
  • the display substrate also includes an electrode compensation layer and a common electrode layer disposed on one side of the substrate.
  • a first insulating layer is disposed between the electrode compensation layer and the common electrode layer.
  • the electrode compensation layer includes a plurality of first compensation lines, and a plurality of third compensation lines.
  • a compensation line corresponds to a row of sub-pixels.
  • the first compensation line is located between two adjacent data lines and between two adjacent columns of sub-pixels in the corresponding row of sub-pixels.
  • the first compensation line passes through the first The first via hole of the insulation layer is connected to the common electrode layer.
  • the plurality of first compensation traces are not connected to each other in the electrode compensation layer.
  • the first via hole is located at one end of the first compensation trace, and the orthographic projection of the first via hole on the substrate is located on the substrate of two adjacent gate lines of two adjacent rows of sub-pixels.
  • the first compensation trace includes a first extension section and a second extension section, the first extension section is located between two adjacent sub-pixels, and the second extension section connects the first extension section and the first via hole, There is no overlapping area between the first via hole and the extension line of the first extension section.
  • the display substrate further includes a second via hole penetrating the first insulating layer.
  • the other end of the first compensation trace is connected to the common electrode layer through the second via hole.
  • the second via hole is on the substrate.
  • the orthographic projection is located between the orthographic projections of two adjacent gate lines of two adjacent rows of sub-pixels on the substrate.
  • the first compensation line also includes a third extension section, and the third extension section connects the first extension section and the third extension section. There is no overlapping area between the second via hole and the extension line of the first extension section.
  • the display substrate further includes a preset light-shielding area, and the second extension section is located in the preset light-shielding area.
  • the first compensation trace includes a first extension section, the first extension section is located between two adjacent sub-pixels and extends along the second direction, and the orthographic projection of the first via hole on the substrate is located at Between two adjacent rows of sub-pixels, the orthographic projection of the first via hole on the substrate and the orthographic projection of the first extension section on the substrate at least partially overlap.
  • the first compensation trace also includes a fourth extension section.
  • the fourth extension section is located between two adjacent rows of sub-pixels.
  • the fourth extension section is not parallel to the first extension section.
  • the first via hole The orthographic projection on the substrate at least partially overlaps the orthographic projection of the fourth extension on the substrate.
  • the display substrate further includes a third via hole penetrating the first insulating layer.
  • the third via hole is located at an end of the first extension section away from the first via hole.
  • the third via hole is located on the substrate.
  • the orthographic projection is located between two adjacent sub-pixels and between the orthographic projections of the two gate lines of the corresponding row of sub-pixels on the substrate.
  • the electrode compensation layer and the data line are located on the same layer.
  • it also includes a first conductive layer, a second insulating layer, a second conductive layer, a first insulating layer and a common electrode layer arranged in sequence on one side of the substrate, and the electrode compensation layer and the gate line are located
  • the first conductive layer, the data line is located on the second conductive layer
  • the first compensation line includes a first extension section, the first extension section is located between two adjacent sub-pixels and extends along the second direction, the first extension section is located in the corresponding row
  • the orthographic projection of the first via hole on the substrate is located between two adjacent sub-pixels and between the orthographic projection of the two gate lines of the corresponding row of sub-pixels on the substrate,
  • the number of the first via hole is at least one, the first via hole penetrates the second insulating layer and the first insulating layer, and the first extension section is connected to the common electrode layer through at least one first via hole.
  • the data lines include a first portion of wiring corresponding to odd-numbered rows of sub-pixels and a second portion of wiring corresponding to even-numbered rows, and the first portion of wiring is located in the corresponding first group of sub-pixels. Between two adjacent columns of sub-pixels, the second part of the wiring is located between the two adjacent columns of sub-pixels of the corresponding second group of sub-pixels.
  • the data line also includes a third part of the wiring, and the third part of the wiring is located in two adjacent rows. Between two adjacent gate lines of a sub-pixel, a first portion of wiring and a second portion of wiring corresponding to two adjacent rows of sub-pixels are connected through a third portion of wiring.
  • the data line is located between two adjacent groups of sub-pixels, and the data line extends along a second direction, and the second direction is the direction of the column.
  • each row of sub-pixels is configured as multiple pixel units.
  • the pixel units include sequentially adjacent first color sub-pixels, second color sub-pixels and third color sub-pixels.
  • the sub-pixels in the same row The pixel electrodes of the first color sub-pixels are all connected to the same gate line, the pixel electrodes of the second color sub-pixels in the same row of sub-pixels are all connected to another gate line, and the pixel electrodes of two adjacent pixel units in the same row of sub-pixels are connected to the same gate line.
  • the pixel electrodes of the third color sub-pixels are respectively connected to different gate lines.
  • an embodiment of the disclosure provides a display device, including the display substrate in any embodiment of the disclosure.
  • Figure 1 is a schematic diagram of a dual-gate structure used in a display substrate
  • Figure 2 is a schematic diagram of a pixel using a double gate structure
  • Figure 3 is a schematic diagram of a display substrate using a double-gate structure in an embodiment of the present disclosure
  • Figure 4 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in an embodiment of the present disclosure
  • Figure 5a is a schematic cross-sectional view of A-A in Figure 4 in one embodiment
  • Figure 5b is a schematic cross-sectional view of B-B in Figure 4 in one embodiment
  • Figure 6 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure
  • Figure 7 is a schematic cross-sectional view of A-A in Figure 6 in one embodiment
  • Figure 8 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure
  • Figure 9 is a schematic cross-sectional view of A-A in Figure 8 in one embodiment
  • Figure 10 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure
  • Figure 11 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure
  • Figure 12 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure
  • Figure 13 is a schematic cross-sectional view along line A-A in Figure 12 .
  • Figure 1 is a schematic diagram of a display substrate using a double gate structure
  • Figure 2 is a schematic diagram of a pixel using a double gate structure.
  • the double-gate structure shown in Figures 1 and 2 can be called the double-gate structure of the ordinary (Column) architecture.
  • the Column architecture one row of sub-pixels corresponds to two gate lines, respectively.
  • the gate line 121 and the second gate line 122 each correspond to a different sub-pixel.
  • one pixel unit may include a first color sub-pixel R, a second color sub-pixel G, and a third color sub-pixel B.
  • the first color sub-pixel R and the third color sub-pixel B correspond to one gate line
  • the second color sub-pixel G corresponds to another gate line.
  • the first color sub-pixel R and the second color sub-pixel G use the same data line 141
  • the third color sub-pixel B uses the same data line 141 as the first color sub-pixel R in the adjacent pixel unit.
  • the data line 141 can be halved, and the number of data driver chips can be halved, thereby achieving cost savings.
  • the pixel electrodes 142 of the first color sub-pixel R, the second color sub-pixel G, and the third color sub-pixel B in the same row are connected to different gate lines, when the power supply conditions of the data lines 141 are different, adjacent Display differences between pixel columns cause vertical lines or shaking head patterns.
  • the pixel electrode 142 is connected to the gate line, which should be understood to mean that the pixel electrode 142 is connected to the gate line through a thin film transistor.
  • the gate electrode of the thin film transistor is connected to the gate line
  • the first electrode of the thin film transistor is connected to the pixel electrode 142 .
  • the pixel electrode 142 is connected to the data line 141.
  • the pixel electrode 142 is connected to the data line 141 through a thin film transistor.
  • the second electrode of the thin film transistor is connected to the data line 141, and the first electrode of the thin film transistor is connected to the pixel electrode 142.
  • the first electrode may be one of the source electrode and the drain electrode
  • the second electrode may be the other of the source electrode and the drain electrode.
  • the first electrode may be the drain electrode
  • the second electrode may be the source electrode.
  • FIG. 3 is a schematic diagram of a display substrate using a dual-gate structure according to an embodiment of the present disclosure.
  • FIG. 4 is a schematic diagram of a pixel in which the display substrate adopts a double-gate structure in an embodiment of the present disclosure.
  • FIG. 5a is a schematic cross-sectional view of AA in FIG. 4 in one embodiment
  • FIG. 5b is a schematic cross-sectional view of BB in FIG. 4 in one embodiment.
  • the display substrate may include a substrate 11 and a plurality of sub-pixels located on the substrate 11.
  • the plurality of sub-pixels are arranged in M rows and N groups, and each group of sub-pixels includes two columns of sub-pixels. You can set the direction of the rows as the first direction X, and the direction of the columns as the second direction Y.
  • M and N are positive integers greater than or equal to 1.
  • the display substrate may further include M pairs of gate lines and N data lines 141, which are located on the same side of the substrate 11 but on different layers.
  • M pairs of gate lines correspond to M rows of sub-pixels one-to-one
  • the pair of gate lines may include a first gate line 121 and a second gate line 122 extending along the first direction X.
  • the first gate line 121 and the second gate line 122 are respectively provided on opposite sides of the corresponding row of sub-pixels, and are located between two adjacent rows of sub-pixels, as shown in FIGS. 3 and 4 .
  • the gate line located on the upper side of the row sub-pixel may be the first gate line 121
  • the gate line located on the lower side of the row sub-pixel may be the second gate line 122 .
  • each row of sub-pixels can be configured as multiple pixel units, and one pixel unit includes sequentially adjacent first-color sub-pixels, second-color sub-pixels, and third-color sub-pixels.
  • the first color sub-pixel may be a red sub-pixel R
  • the second color sub-pixel may be a green sub-pixel G
  • the third color sub-pixel may be a blue sub-pixel B.
  • the color settings of the first color sub-pixel, the second color sub-pixel and the third color sub-pixel are not limited to R, G, and B.
  • the color of the sub-pixel in each pixel unit can be set as needed.
  • the pixel electrodes 142 of the first color subpixels in the same row of subpixels are all connected to the same gate line, and the second color subpixels in the same row of subpixels are connected to the same gate line.
  • the pixel electrodes 142 of the pixel electrodes 142 are all connected to another gate line, and the pixel electrodes 142 of the third color sub-pixels in two adjacent pixel units in the same row of sub-pixels are connected to different gate lines respectively.
  • FIG. 3 the pixel electrodes 142 of the first color subpixels in the same row of subpixels are all connected to the same gate line
  • the second color subpixels in the same row of subpixels are connected to the same gate line.
  • the pixel electrodes 142 of the pixel electrodes 142 are all connected to another gate line
  • the pixel electrodes 142 of the third color sub-pixels in two adjacent pixel units in the same row of sub-pixels are connected to different gate lines respectively.
  • the pixel electrodes 142 of the first color subpixels in the same row of subpixels are all connected to the first gate line 121
  • the pixel electrodes 142 of the second color subpixels in the same row of subpixels are all connected to the second color subpixels.
  • Gate lines 122 are connected.
  • the third color sub-pixel in the first pixel unit is connected to the second gate line 122
  • the third color sub-pixel in the second pixel unit is connected to the first gate line 121.
  • the display substrate may further include N data lines 141 , each data line 141 corresponding to two adjacent groups of sub-pixels.
  • the two adjacent groups of sub-pixels corresponding to the same data line 141 may be the first group of sub-pixels 31 and the second group of sub-pixels 32 respectively.
  • the pixel electrodes 142 of the odd-numbered rows of sub-pixels in the first group of sub-pixels 31 correspond to The data lines 141 are connected, and the pixel electrodes 142 of the even-numbered row sub-pixels in the second group of sub-pixels 32 are connected to the corresponding data lines 141 .
  • the above-mentioned first group of sub-pixels 31 and second group of sub-pixels 32 are relative to the corresponding data lines.
  • one group of sub-pixels is the first group of sub-pixels.
  • this group of sub-pixels may be the second group of sub-pixels.
  • the pixel connection method shown in Figure 3 can be called Z architecture pixels.
  • the technical solution using Z architecture pixels can avoid display differences caused by different charging of adjacent data lines 141 and avoid vertical or shaking head marks.
  • the display substrate may also include an electrode compensation layer disposed on one side of the substrate 11 , and the electrode compensation layer may include a plurality of common electrode compensation lines 171 .
  • the common electrode compensation line 171 may be located between two adjacent data lines 141 and between two adjacent columns of sub-pixels.
  • the display substrate further includes a first conductive layer, a second insulating layer 13 , a second conductive layer, and a first insulating layer sequentially disposed on one side of the substrate 11 15.
  • the first gate line 121 and the second gate line 122 are located in the first conductive layer
  • the data line 141 and the pixel electrode 142 are located in the second conductive layer
  • the electrode compensation layer is a different layer from the first conductive layer and a different layer from the second conductive layer.
  • the electrode compensation layer includes a common electrode compensation line 171 .
  • the common electrode compensation line 171 is connected to the common electrode layer 16 through a via hole penetrating the third insulating layer 18 .
  • the common electrode compensation line 171 can be located on the same layer as the data line 141 .
  • the display substrate does not need to separately provide an electrode compensation layer and the third insulating layer 18 .
  • the common electrode layer 16 is provided on the first insulating layer 15 Above, the common electrode compensation line 171 may be connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
  • FIG. 6 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure.
  • FIG. 7 is a schematic diagram of the A-A cross-section of FIG. 6 in one embodiment.
  • the display substrate also includes a first conductive layer, a second insulating layer 13 , a second conductive layer, a first insulating layer 15 and a common electrode layer 16 that are sequentially disposed on one side of the substrate 11 .
  • the first gate line 121 and the second gate line 122 are located on the first conductive layer, and the data line 141, the pixel electrode 142 and the electrode compensation layer are all located on the second conductive layer.
  • the electrode compensation layer may include a plurality of common electrode compensation lines 171 .
  • the common electrode compensation line 171 may be located between two adjacent data lines 141 and between two adjacent columns of sub-pixels.
  • the common electrode compensation line 171 is connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
  • the data line 141 includes a first portion of wiring 141a corresponding to the odd-numbered rows of sub-pixels and a second portion of wiring 141b corresponding to the even-numbered rows.
  • the first portion of wiring 141a is located on the opposite side.
  • the second portion of wiring 141b is located between two adjacent columns of sub-pixels in the corresponding second group of sub-pixels 32.
  • the data line 141 also includes a third portion of wiring 141c.
  • the third portion of wiring 141c is located between two adjacent gate lines of two adjacent rows of sub-pixels.
  • the third portion of wiring 141c is located between two adjacent rows of sub-pixels.
  • the data line 141 in FIG. 6 has a "bow-shaped" routing.
  • the common electrode compensation line 171 may include a plurality of first compensation lines 171 a corresponding to one row of sub-pixels, and the first compensation lines 171 a
  • the wiring 171a is located between two adjacent data lines 141 and between two adjacent columns of sub-pixels in the corresponding row of sub-pixels.
  • the first compensation trace 171 a may be connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
  • the common electrode compensation line 171 may also include a second compensation line 171b, and the second compensation line 171b is located between two adjacent gate lines of two adjacent rows of sub-pixels.
  • the second compensation wiring 171b connects the first compensation wiring 171a corresponding to two adjacent rows of sub-pixels. Therefore, the common electrode compensation line 171 in FIG. 6 has a "bow-shaped" routing.
  • FIG. 6 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure.
  • FIG. 9 is a schematic diagram of the AA cross-section of FIG. 8 in one embodiment.
  • the pixel connection method in the display substrate adopts a Z-architecture pixel technology solution. As shown in FIGS.
  • the display substrate also includes an electrode compensation layer and a common electrode layer 16 disposed on one side of the substrate 11 , and a first insulating layer 15 is disposed between the electrode compensation layer and the common electrode layer 16 .
  • the electrode compensation layer includes a plurality of electrode compensation lines, and the electrode compensation lines are located between two adjacent data lines 141 .
  • the electrode compensation line may include a plurality of first compensation lines 171a.
  • the plurality of first compensation lines 171a correspond to a row of sub-pixels.
  • the first compensation lines 171a are located between two adjacent data lines 141 and are located in the corresponding row of sub-pixels. Between two adjacent columns of sub-pixels in the pixel, the first compensation wiring 171a is connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
  • the common electrode signal can be compensated for the common electrode layer 16 to ensure the charging rate of the pixels and improve the display effect.
  • the substrate 11 can be a glass substrate or a flexible substrate.
  • the material of the substrate 11 can be set as needed and is not limited here.
  • the electrode compensation layer and the data line 141 are located on the same layer, that is, the first compensation wiring 171 a and the data line 141 are located on the same layer. This setting method will not increase the number of masks for the display substrate and will not increase production costs.
  • the plurality of first compensation traces 171a are not connected to each other in the electrode compensation layer.
  • the first compensation trace 171a is connected to the common electrode layer 16 through the corresponding first via hole 41. Therefore, it is no longer necessary to provide the second compensation trace 171b in the electrode compensation layer.
  • the distance between two adjacent gate lines (the second gate line 122a and the first gate line 121b) of two adjacent rows of sub-pixels is greatly reduced. , can improve the pixel aperture ratio of the display device, and can meet the needs and design needs of small and medium-sized display products that require higher pixel resolution.
  • the data line 141 includes a first portion of wiring 141a corresponding to the odd-numbered rows of sub-pixels and a second portion of wiring 141b corresponding to the even-numbered rows.
  • the first portion of wiring 141a is located at Between two adjacent columns of sub-pixels in the corresponding first group of sub-pixels 31, the second portion of wiring 141b is located between two adjacent columns of sub-pixels in the corresponding second group of sub-pixels 32.
  • the data line 141 also includes a third portion of wiring 141c.
  • the third portion of wiring 141c is located between two adjacent gate lines of two adjacent rows of sub-pixels. For example, the third portion of wiring 141c is located between two adjacent rows of sub-pixels.
  • the data line 141 in Figure 8 also has a "bow-shaped" routing.
  • the display substrate further includes a first conductive layer, a second insulating layer 13 , a second conductive layer, a first insulating layer 15 and a common layer arranged sequentially on one side of the substrate 11 Electrode layer 16.
  • the first gate line 121 and the second gate line 122 are located on the first conductive layer, and the data line 141, the pixel electrode 142 and the electrode compensation layer are all located on the second conductive layer.
  • the display substrate may further include a thin film transistor.
  • the thin film transistor may include a gate electrode, an active layer, a source electrode and a drain electrode.
  • the gate electrode may be located on the first conductive layer, and the source electrode and the drain electrode may be located on the first conductive layer.
  • the active layer can be arranged as needed. For example, the active layer can be arranged between the second insulating layer 13 and the second conductive layer, and both the source electrode and the drain electrode are connected to the active layer.
  • the display substrate may include a plurality of first thin film transistors 61 , the plurality of first thin film transistors 61 correspond to a plurality of sub-pixels one by one, and the first thin film transistors 61 are connected to the pixel electrodes of the corresponding sub-pixels. .
  • the orthographic projection of the first thin film transistor 61 on the substrate 11 is located between two adjacent rows of sub-pixels. Therefore, the first thin film transistor 61 does not occupy the sub-pixel area for setting the pixel electrode, and the pixel aperture ratio can be improved.
  • the first via hole 41 may be located at one end of the first compensation trace 171 a, and the orthographic projection of the first via hole 41 on the substrate 11 may be located at two adjacent rows of sub-pixels. between the orthographic projections of two adjacent gate lines on the substrate 11.
  • the orthographic projection of the first via hole 41 on the substrate 11 is located between the orthographic projections of the second gate line 122 a and the first gate line 121 b of two adjacent rows of sub-pixels on the substrate 11 . between.
  • the first compensation trace 171a includes a first extension section a1 and a second extension section a2.
  • the first extension section a1 is located between two adjacent sub-pixels.
  • the first extension section a1 can be along the second direction. extend.
  • the second extension section a2 connects the first extension section a1 and the first via hole 41 . There is no overlapping area between the extension lines of the first via hole 41 and the first extension section a1. That is to say, the second extension section a2 is not parallel to the first extension section a1.
  • the first compensation trace 171a extends along the second direction, and the first via hole 41 is located on the first compensation trace 171a. Therefore, in order for the first via hole 41 to avoid the third side of the data line 141, The partial wiring 141c can increase the distance between the second gate line 122 and the first gate line 121.
  • the first extension section a1 extends along the second direction, the second extension section a2 is not parallel to the first extension section a1 , and there is no intersection between the first via hole 41 and the extension line of the first extension section a1 . overlapping area.
  • the first via hole 41 is located on one side (for example, the right side) of the first extension section a1, which allows the first via hole 41 to avoid the third part of the wiring 141c of the data line 141, thus reducing the size of the second gate line. 122 and the first gate line 121, thereby reducing the distance between adjacent rows of sub-pixels, which is beneficial to improving the pixel aperture ratio of the display product.
  • the display substrate further includes a penetrating first insulating layer 15
  • the other end of the first compensation trace 171a is connected to the common electrode layer 16 through the second via hole 42.
  • the orthographic projection of the second via hole 42 on the substrate 11 is located between the orthographic projections of two adjacent gate lines on the substrate 11 of two adjacent rows of sub-pixels.
  • the first compensation trace 171a also includes a third extension section a3.
  • the third extension section a3 connects the first extension section a1 and the second via hole 42.
  • the second via hole 42 does not overlap with the extension line of the first extension section a1. area.
  • both ends of the first compensation trace 171a are connected to the common electrode layer 16 through the first via hole 41 and the second via hole 42 respectively, which can reduce the connection between the first compensation trace 171a and the common electrode layer 16 resistance to improve product performance.
  • the first via hole 41 and the second via hole 42 are located on the same side of the corresponding first extension section a1.
  • the first via hole 41 and the second via hole 42 are both located on the right or left side of the first extension section a1 .
  • the positions of the second extension section a2 in the first compensation trace 171a corresponding to two adjacent rows of sub-pixels are opposite.
  • the first via hole 41 and the second via hole 42 are both located on the right side of the first extension section a1.
  • the second extension section a2 and The third extension sections a3 all extend toward the right side of the corresponding first extension section a1; in the first compensation traces 171a corresponding to the even-numbered rows of sub-pixels, the first via hole 41 and the second via hole 42 are located in the first extension section a1 Therefore, the second extension section a2 and the third extension section a3 both extend toward the left side of the corresponding first extension section a1.
  • both the first via holes 41 corresponding to the sub-pixels in the odd rows and the second via holes 42 corresponding to the sub-pixels in the even rows can avoid the third part of the wiring 141 c of the data line 141 , which is beneficial to the data line 141
  • the third part of the trace is set to 141c.
  • the display substrate may further include a preset light-shielding area 50 , the second extension section a2 is located in the preset light-shielding area 50 and/or the third extension section a3 is located in the preset light-shielding area 50 Inside.
  • the display substrate can be used in a liquid crystal display device.
  • the liquid crystal display device can include the display substrate in the embodiment of the present disclosure, and a color filter substrate aligned with the display substrate.
  • a black matrix can be disposed on the color filter substrate.
  • the black matrix Orthographic projections on the display substrate may be between adjacent rows of sub-pixels and between adjacent columns of sub-pixels.
  • a preset light-shielding area 50 is provided in the display substrate.
  • the preset light-shielding area 50 corresponds to the black matrix in the color filter substrate.
  • the second extension section a2 is arranged in the preset light shielding area 50 and/or the third extension section a3 is arranged in the preset light shielding area 50, so that the second extension section a2 and/or the third extension section a3 can be blocked by the black matrix. , to avoid the second extension
  • the segment a2 and the third extended segment a3 affect the light transmittance of the display device.
  • FIG. 10 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure.
  • the data line 141 is located between two adjacent groups of sub-pixels.
  • the data line 141 may extend along the second direction between two adjacent groups of sub-pixels.
  • the data lines 141 between adjacent rows of sub-pixels are connected straight lines, and there is no need to set a third part of the wiring 141c between adjacent gate lines of adjacent rows of sub-pixels, which can further reduce the number of adjacent rows of sub-pixels.
  • the distance between two adjacent gate lines of a row of sub-pixels is beneficial to improving the aperture ratio of the display product.
  • the first compensation trace 171a may include a first extension section a1, the first extension section a1 is located between two adjacent sub-pixels and extends along the second direction.
  • the orthographic projection of the first via hole 41 on the substrate 11 is located between two adjacent rows of sub-pixels.
  • the orthographic projection of the first via hole 41 on the substrate 11 is the same as the orthographic projection of the first extension section a1 on the substrate 11 At least partially overlap.
  • the data line 141 is a straight line extending along the second direction, the first via hole 41 no longer needs to avoid the data line 141 .
  • the first via hole 41 can be placed on the substrate 11
  • the orthographic projection on the substrate 11 is set to at least partially overlap with the orthographic projection of the first extension section a1 on the substrate 11 , so that the distance between adjacent rows of sub-pixels can be further reduced and the pixel aperture ratio can be further improved.
  • the orthographic projection of the first via hole 41 on the substrate 11 is located between two adjacent gate lines of two adjacent rows of sub-pixels. This ensures that the first via hole 41 is located in the preset light shielding area 50. Avoid affecting the light transmittance of the display substrate.
  • two first extension sections a1 located between the same two columns of sub-pixels can be The electrode compensation layer is interconnected.
  • the first extended section a1-a in the adjacent odd-numbered row sub-pixels and the first extended section a1-b in the even-numbered row sub-pixels are located between the same two columns of sub-pixels.
  • the first extended section a1-a in the odd-numbered rows of sub-pixels may be connected to each other.
  • first extension sections a1 that are connected to each other in the electrode compensation layer share the first via hole 41 .
  • the number of first via holes 41 can be reduced.
  • the first extension section a1 in the odd-numbered rows of sub-pixels and the first extension section a1 in the even-numbered rows of sub-pixels when there is the same layer of conductive material between the first extension section a1 in the odd-numbered rows of sub-pixels and the first extension section a1 in the even-numbered rows of sub-pixels, the first extension section a1 in the odd-numbered rows of sub-pixels and the first extension section a1 in the even-numbered subpixels
  • the second extension section a2 in the row sub-pixel is not connected in the electrode compensation layer.
  • the first compensation trace 171a also includes a fourth extension section a4.
  • the fourth extension section a4 is located between two adjacent rows of sub-pixels.
  • the fourth extension section a4 is connected to the first The extension section a1 is not parallel, and the orthographic projection of the first via hole 41 on the substrate 11 and the orthographic projection of the fourth extension section a4 on the substrate 11 at least partially overlap.
  • the fourth extension section a4 may be located between two adjacent gate lines of two adjacent rows of sub-pixels.
  • the direction of the fourth extension section a4 is not parallel to the direction of the first extension section a1.
  • the direction of the fourth extension section a4 may be perpendicular to the direction of the first extension section a1.
  • the first compensation line 171a and the data line 141 are located on the same layer.
  • FIG. 11 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure.
  • the display substrate may further include a third via hole 43 , and the third via hole 43 penetrates the first insulating layer 15 .
  • the third via hole 43 is located at one end of the first extension section a1 away from the first via hole 41 .
  • the orthographic projection of the third via hole 43 on the substrate 11 is located between two adjacent sub-pixels and is located on both sides of the corresponding row of sub-pixels. Between the orthographic projections of the grating lines on the substrate 11.
  • the first compensation trace 171a and the data line 141 are located on the same layer.
  • FIG. 12 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure.
  • Figure 13 is a schematic cross-sectional view along line A-A in Figure 12 .
  • the display substrate includes a first conductive layer, a second insulating layer 13 , a second conductive layer, and a first insulating layer 15 that are sequentially disposed on one side of the substrate 11 and common electrode layer 16.
  • the electrode compensation layer and the gate line are located on the first conductive layer, and the data line 141 is located on the second conductive layer.
  • the first compensation trace 171a includes a first extension section a1.
  • the first extension section a1 is located between two adjacent sub-pixels and extends along the second direction.
  • the first extension section a1 is located between the two gate lines of the corresponding row of sub-pixels.
  • the orthographic projection of the first via hole 41 on the substrate 11 is located between two adjacent sub-pixels and located between the two gate lines of the corresponding row of sub-pixels. (the first gate line 121a and the second gate line 122a) between orthographic projections on the substrate 11.
  • the number of the first via hole 41 is at least one.
  • the first via hole 41 penetrates the second insulation layer 13 and the first insulation layer 15 .
  • the first extension section a1 is connected to the common electrode layer 16 through at least one first via hole 41 .
  • the embodiments shown in Figures 11 and 12 can be applied to medium and large size display products.
  • the first extension section a1 is connected to the common electrode layer 16 through two via holes, which can reduce the distance between the first compensation trace 171a and the common electrode layer 16. Connection resistance between common electrode layers 16.
  • the display substrate in the embodiment of the present disclosure can be applied to non-TDDI (Touch and Display Driver Integration, touch and display driver integration) dual-gate display products.
  • TDDI Touch and Display Driver Integration, touch and display driver integration
  • the preparation process of the display substrate according to the embodiment of the present disclosure will be described below with reference to the embodiments of FIG. 8 and FIG. 9 .
  • the "patterning" mentioned in this article when the patterned material is an inorganic material or metal, includes coating of photoresist, mask exposure, development, etching, and stripping lithography. Glue and other processes.
  • the patterned material is an organic material
  • "patterning” includes mask exposure, development and other processes.
  • the evaporation, deposition, coating, coating, etc. mentioned in this article are all mature in related technologies. Preparation Process.
  • the preparation process of the display substrate may include the following steps.
  • the first gate line 121, the second gate line 122 and the gate electrode of the thin film transistor are formed on one side of the substrate 11. As shown in FIGS. 8 and 9 , the process may include: forming a first metal film on one side of the substrate 11 , patterning the first metal film, and forming the first gate line 121 and the second gate line 121 at a preset position. The gate line 122 and the gate electrode of the thin film transistor. The layer where the first gate line 121, the second gate line 122 and the gate electrode of the thin film transistor are located is the first conductive layer.
  • the second insulating layer 13 is formed on the side of the first conductive layer facing away from the substrate 11, as shown in FIGS. 8 and 9.
  • An active layer of the thin film transistor is formed on a side of the second insulating layer 13 facing away from the substrate 11 .
  • the active layer is not shown in Figures 8 and 9.
  • the first compensation wiring 171a, the data line 141, the source and drain electrodes of the thin film transistor, and the pixel electrode 142 are formed on a side of the active layer facing away from the substrate 11. As shown in FIGS. 8 and 9 , this step may include: forming a second metal film on a side of the active layer facing away from the substrate 11 , patterning the second metal film, and forming a first compensation film at a preset position.
  • the wiring 171a, the data line 141, and the source and drain electrodes of the thin film transistor form a pixel electrode 142 film on the side of the first compensation wiring 171a, the data line 141 away from the substrate 11, and pattern the pixel electrode 142 film Processing, the pixel electrode 142 is formed at a preset position, and the pixel electrode 142 is located in the area where the sub-pixel is located.
  • the orthographic projection of the pixel electrode 142 on the substrate 11 does not overlap with the orthographic projection of the first compensation line 171 a and the data line 141 on the substrate 11 .
  • the pixel electrode 142 may be connected to one of the source electrode and the drain electrode.
  • the layer where the first compensation line 171a, the data line 141, the source electrode and the drain electrode of the thin film transistor and the pixel electrode 142 are located is the second conductive layer.
  • a first insulating layer 15 is formed on the side of the second conductive layer facing away from the substrate 11.
  • the first insulating layer 15 is provided with a first via hole 41 and a second via hole 42.
  • the first compensation trace 171a passes through the first via hole. 41 and the second via hole 42 are exposed.
  • a common electrode layer 16 is formed on the side of the first insulating layer 15 facing away from the substrate 11 .
  • the common electrode layer 16 is connected to the first compensation trace 171 a through the first via hole 41 and the second via hole 42 , as shown in FIG. 8 and FIG. 9 shown.
  • the first insulating layer, the second insulating layer, and the third insulating layer may be made of any one of silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiON), or more.
  • SiOx silicon oxide
  • SiNx silicon nitride
  • SiON silicon oxynitride
  • the gate electrode, source electrode, drain electrode, gate line, data line, and electrode compensation layer can be made of metal materials, such as silver (Ag), copper (Cu), aluminum (Al), titanium (Ti), and molybdenum (Mo).
  • any one or more, or alloy materials of the above metals can be a single-layer structure, or a multi-layer composite structure, such as Ti/Al/Ti, etc.
  • the active layer can use amorphous indium gallium zinc oxide materials (a-IGZO), zinc oxynitride (ZnON), indium zinc tin oxide (IZTO), amorphous silicon (a-Si), polycrystalline silicon (p-Si), Various materials such as hexathiophene and polythiophene, that is, the present disclosure is applicable to transistors manufactured based on oxide Oxide technology, silicon technology, and organic technology.
  • the pixel electrode and the common electrode layer can use transparent conductive materials, such as indium tin oxide (ITO) or indium zinc oxide (IZO).
  • embodiments of the disclosure further provide a display device, which includes the display substrate in the embodiments of the disclosure.
  • the display device can be: a mobile phone, a tablet computer, a television, a monitor, a laptop, a digital photo frame, a navigator, or any other product or component with a display function.
  • the display device may be a liquid crystal display device.
  • the display device may further include a color filter substrate, and a black matrix is provided on the color filter substrate.
  • the second extension section, the third extension section or the fourth extension section in the first compensation line The orthographic projections of the extension sections on the substrate may all be located within the orthographic projection range of the black matrix on the substrate.
  • first and second are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of indicated technical features. Therefore, features defined as “first” and “second” may explicitly or implicitly include one or more of these features.
  • “plurality” means two or more, unless otherwise expressly limited.
  • connection In this disclosure, unless otherwise explicitly stated and limited, the terms “installation”, “connection”, “connection”, “fixing” and other terms should be understood in a broad sense. For example, it can be a fixed connection or a detachable connection. , or integrated; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, or an internal connection between two elements or an interaction between two elements .
  • a first feature "on” or “below” a second feature may include the first and second features in direct contact, or may include the first and second features. Not in direct contact but through additional characteristic contact between them.
  • the terms “above”, “above” and “above” a first feature on a second feature include the first feature being directly above and diagonally above the second feature, or simply mean that the first feature is higher in level than the second feature.
  • “Below”, “below” and “beneath” the first feature of the second feature includes the first feature being directly above and diagonally above the second feature, or simply means that the first feature has a smaller horizontal height than the second feature.

Abstract

A display substrate and a display device. The display substrate comprises a plurality of sub-pixels arranged in M rows and N groups; each group of sub-pixels comprise two columns of sub-pixels; M pairs of gate lines are in one-to-one correspondence with the M rows of sub-pixels; each of N data lines (141) corresponds to two adjacent groups of sub-pixels; two adjacent groups of sub-pixels corresponding to a same data line (141) are respectively a first group of sub-pixels (31) and a second group of sub-pixels (32); pixel electrodes (142) of an odd-numbered row of sub-pixels in the first group of sub-pixels (31) and pixel electrodes (142) of an even-numbered row of sub-pixels in the second group of sub-pixels (32) are connected to corresponding data lines (141). The display substrate further comprises a common electrode layer (16) and a plurality of first compensation wires (171a); the plurality of first compensation wires (171a) correspond to one row of sub-pixels; the first compensation wires (171a) are located between two adjacent data lines (141) and located between two adjacent columns of sub-pixels in a corresponding row of sub-pixels; the first compensation wires (171a) are connected to the common electrode layer (16) by means of first via holes (41).

Description

显示面板和显示装置Display panels and display devices
本申请要求于2022年5月12日提交中国专利局、申请号为202210519210.6、发明名称为“一种显示基板和显示装置”的中国专利申请的优先权,其内容应理解为通过引用的方式并入本申请中。This application claims priority to the Chinese patent application submitted to the China Patent Office on May 12, 2022, with the application number 202210519210.6 and the invention title "A display substrate and display device". Its content should be understood as being incorporated by reference. into this application.
技术领域Technical field
本公开实施例涉及但不限于显示技术领域,尤指一种显示基板和显示装置。Embodiments of the present disclosure relate to but are not limited to the field of display technology, and in particular, to a display substrate and a display device.
背景技术Background technique
液晶显示装置(LCD)由于具有重量轻、耗电少、辐射低和携带方便等优点而被广泛应用于现代化信息设备,如显示器、电视、移动电话和数字产品等。为了使显示装置的边框变窄、屏占比变大,采用双栅(Dual Gate)结构来驱动子像素。在双栅结构中,一个像素中设置两条栅线,每条栅线对应不同的子像素,两个子像素之间使用同一条数据线。这样的设计,可以使数据线减半,从而使数据驱动芯片数量减半,达到节约成本的效果。Liquid crystal display devices (LCDs) are widely used in modern information equipment, such as monitors, televisions, mobile phones, and digital products, due to their advantages of light weight, low power consumption, low radiation, and portability. In order to narrow the frame of the display device and increase the screen-to-body ratio, a dual gate structure is used to drive sub-pixels. In the dual-gate structure, two gate lines are provided in one pixel, each gate line corresponds to a different sub-pixel, and the same data line is used between the two sub-pixels. Such a design can halve the data lines, thus halving the number of data driver chips, achieving cost savings.
目前的双栅结构中,同一行的R、G、B子像素连接不同的栅线,当数据线中通电情况不同时,会导致相邻像素列之间的显示差异,产生竖纹或者摇头纹不良。In the current dual-gate structure, R, G, and B sub-pixels in the same row are connected to different gate lines. When the power supply conditions in the data lines are different, it will cause display differences between adjacent pixel columns, resulting in vertical lines or shaking heads. bad.
发明内容Contents of the invention
以下是对本文详细描述的主题的概述。本概述并非是为了限制权利要求的保护范围。The following is an overview of the topics described in detail in this article. This summary is not intended to limit the scope of the claims.
第一方面,本公开实施例提供了一种显示基板,包括衬底以及位于衬底的一侧且呈M行N组排列的多个子像素,每组子像素包括两列子像素,所示显示基板还包括M对栅线,M对栅线与M行子像素一一对应,一对栅线包括沿第一方向延伸的第一栅线和第二栅线,第一栅线和第二栅线分别设置 在对应行子像素的相对两侧且位于相邻两行子像素之间,第一方向为行所在的方向;In a first aspect, an embodiment of the present disclosure provides a display substrate, including a substrate and a plurality of sub-pixels located on one side of the substrate and arranged in M rows and N groups. Each group of sub-pixels includes two columns of sub-pixels. The display substrate It also includes M pairs of gate lines, which correspond to M rows of sub-pixels one-to-one. The pair of gate lines include a first gate line and a second gate line extending along the first direction. The first gate line and the second gate line Set separately On opposite sides of the corresponding row of sub-pixels and between two adjacent rows of sub-pixels, the first direction is the direction of the row;
显示基板还包括N条数据线,每条数据线与相邻两组子像素相对应,与同一条数据线相对应的相邻两组子像素分别为第一组子像素和第二组子像素,第一组子像素中的奇数行子像素的像素电极与对应的数据线连接,第二组子像素中的偶数行子像素的像素电极与对应的数据线连接;The display substrate also includes N data lines. Each data line corresponds to two adjacent groups of sub-pixels. The adjacent two groups of sub-pixels corresponding to the same data line are respectively the first group of sub-pixels and the second group of sub-pixels. , the pixel electrodes of the odd-numbered rows of sub-pixels in the first group of sub-pixels are connected to the corresponding data lines, and the pixel electrodes of the even-numbered rows of sub-pixels in the second group of sub-pixels are connected to the corresponding data lines;
显示基板还包括设置在衬底一侧的电极补偿层和公共电极层,电极补偿层和公共电极层之间设置有第一绝缘层,电极补偿层包括多个第一补偿走线,多个第一补偿走线与一行子像素相对应,第一补偿走线位于相邻两条数据线之间且位于对应行子像素中的相邻两列子像素之间,第一补偿走线通过贯穿第一绝缘层的第一过孔与公共电极层连接。The display substrate also includes an electrode compensation layer and a common electrode layer disposed on one side of the substrate. A first insulating layer is disposed between the electrode compensation layer and the common electrode layer. The electrode compensation layer includes a plurality of first compensation lines, and a plurality of third compensation lines. A compensation line corresponds to a row of sub-pixels. The first compensation line is located between two adjacent data lines and between two adjacent columns of sub-pixels in the corresponding row of sub-pixels. The first compensation line passes through the first The first via hole of the insulation layer is connected to the common electrode layer.
在一些可能的实现方式中,多个第一补偿走线在电极补偿层中彼此不连通。In some possible implementations, the plurality of first compensation traces are not connected to each other in the electrode compensation layer.
在一些可能的实现方式中,第一过孔位于第一补偿走线的一端,第一过孔在衬底上的正投影位于相邻两行子像素的相邻两个栅线在衬底上的正投影之间,第一补偿走线包括第一延伸段和第二延伸段,第一延伸段位于相邻两个子像素之间,第二延伸段连接第一延伸段和第一过孔,第一过孔与第一延伸段的延长线不存在交叠区域。In some possible implementations, the first via hole is located at one end of the first compensation trace, and the orthographic projection of the first via hole on the substrate is located on the substrate of two adjacent gate lines of two adjacent rows of sub-pixels. between the front projections, the first compensation trace includes a first extension section and a second extension section, the first extension section is located between two adjacent sub-pixels, and the second extension section connects the first extension section and the first via hole, There is no overlapping area between the first via hole and the extension line of the first extension section.
在一些可能的实现方式中,显示基板还包括贯穿第一绝缘层的第二过孔,第一补偿走线的另一端通过第二过孔与公共电极层连接,第二过孔在衬底上的正投影位于相邻两行子像素的相邻两个栅线在衬底上的正投影之间,第一补偿走线还包括第三延伸段,第三延伸段连接第一延伸段和第二过孔,第二过孔与第一延伸段的延长线不存在交叠区域。In some possible implementations, the display substrate further includes a second via hole penetrating the first insulating layer. The other end of the first compensation trace is connected to the common electrode layer through the second via hole. The second via hole is on the substrate. The orthographic projection is located between the orthographic projections of two adjacent gate lines of two adjacent rows of sub-pixels on the substrate. The first compensation line also includes a third extension section, and the third extension section connects the first extension section and the third extension section. There is no overlapping area between the second via hole and the extension line of the first extension section.
在一些可能的实现方式中,显示基板还包括预设遮光区,第二延伸段位于预设遮光区内。In some possible implementations, the display substrate further includes a preset light-shielding area, and the second extension section is located in the preset light-shielding area.
在一些可能的实现方式中,第一补偿走线包括第一延伸段,第一延伸段位于相邻两个子像素之间且沿第二方向延伸,第一过孔在衬底上的正投影位于相邻两行子像素之间,第一过孔在衬底上的正投影与第一延伸段在衬底上的正投影至少部分交叠。 In some possible implementations, the first compensation trace includes a first extension section, the first extension section is located between two adjacent sub-pixels and extends along the second direction, and the orthographic projection of the first via hole on the substrate is located at Between two adjacent rows of sub-pixels, the orthographic projection of the first via hole on the substrate and the orthographic projection of the first extension section on the substrate at least partially overlap.
在一些可能的实现方式中,第一补偿走线还包括第四延伸段,第四延伸段位于相邻两行子像素之间,第四延伸段与第一延伸段不平行,第一过孔在衬底上的正投影与第四延伸段在衬底上的正投影至少部分交叠。In some possible implementations, the first compensation trace also includes a fourth extension section. The fourth extension section is located between two adjacent rows of sub-pixels. The fourth extension section is not parallel to the first extension section. The first via hole The orthographic projection on the substrate at least partially overlaps the orthographic projection of the fourth extension on the substrate.
在一些可能的实现方式中,显示基板还包括贯穿第一绝缘层的第三过孔,第三过孔位于第一延伸段的远离第一过孔的一端,第三过孔在衬底上的正投影位于相邻两个子像素之间且位于对应行子像素的两条栅线在衬底上的正投影之间。In some possible implementations, the display substrate further includes a third via hole penetrating the first insulating layer. The third via hole is located at an end of the first extension section away from the first via hole. The third via hole is located on the substrate. The orthographic projection is located between two adjacent sub-pixels and between the orthographic projections of the two gate lines of the corresponding row of sub-pixels on the substrate.
在一些可能的实现方式中,电极补偿层与数据线位于同一层。In some possible implementations, the electrode compensation layer and the data line are located on the same layer.
在一些可能的实现方式中,还包括在衬底的一侧依次设置的第一导电层、第二绝缘层、第二导电层、第一绝缘层和公共电极层,电极补偿层和栅线位于第一导电层,数据线位于第二导电层,第一补偿走线包括第一延伸段,第一延伸段位于相邻两个子像素之间且沿第二方向延伸,第一延伸段位于对应行子像素的两条栅线之间,第一过孔在衬底上的正投影位于相邻两个子像素之间且位于对应行子像素的两条栅线在衬底上的正投影之间,第一过孔的数量为至少一个,第一过孔贯穿第二绝缘层和第一绝缘层,第一延伸段通过至少一个第一过孔与公共电极层连接。In some possible implementations, it also includes a first conductive layer, a second insulating layer, a second conductive layer, a first insulating layer and a common electrode layer arranged in sequence on one side of the substrate, and the electrode compensation layer and the gate line are located The first conductive layer, the data line is located on the second conductive layer, the first compensation line includes a first extension section, the first extension section is located between two adjacent sub-pixels and extends along the second direction, the first extension section is located in the corresponding row Between the two gate lines of the sub-pixel, the orthographic projection of the first via hole on the substrate is located between two adjacent sub-pixels and between the orthographic projection of the two gate lines of the corresponding row of sub-pixels on the substrate, The number of the first via hole is at least one, the first via hole penetrates the second insulating layer and the first insulating layer, and the first extension section is connected to the common electrode layer through at least one first via hole.
在一些可能的实现方式中,数据线包括与奇数行子像素相对应的第一部分走线以及与偶数行相对应的第二部分走线,第一部分走线位于对应的第一组子像素中的相邻两列子像素之间,第二部分走线位于对应的第二组子像素的相邻两列子像素之间,数据线还包括第三部分走线,第三部分走线位于相邻两行子像素的相邻两条栅线之间,与相邻两行子像素相对应的第一部分走线和第二部分走线通过第三部分走线连接。In some possible implementations, the data lines include a first portion of wiring corresponding to odd-numbered rows of sub-pixels and a second portion of wiring corresponding to even-numbered rows, and the first portion of wiring is located in the corresponding first group of sub-pixels. Between two adjacent columns of sub-pixels, the second part of the wiring is located between the two adjacent columns of sub-pixels of the corresponding second group of sub-pixels. The data line also includes a third part of the wiring, and the third part of the wiring is located in two adjacent rows. Between two adjacent gate lines of a sub-pixel, a first portion of wiring and a second portion of wiring corresponding to two adjacent rows of sub-pixels are connected through a third portion of wiring.
在一些可能的实现方式中,数据线位于相邻两组子像素之间,数据线沿第二方向延伸,第二方向为列所在的方向。In some possible implementations, the data line is located between two adjacent groups of sub-pixels, and the data line extends along a second direction, and the second direction is the direction of the column.
在一些可能的实现方式中,每行子像素设置为多个像素单元,像素单元包括依次相邻的第一颜色子像素、第二颜色子像素和第三颜色子像素,同一行子像素中的第一颜色子像素的像素电极均与同一条栅线连接,同一行子像素中的第二颜色子像素的像素电极均与另一条栅线连接,同一行子像素中相邻两个像素单元中的第三颜色子像素的像素电极分别与不同的栅线连接。 In some possible implementations, each row of sub-pixels is configured as multiple pixel units. The pixel units include sequentially adjacent first color sub-pixels, second color sub-pixels and third color sub-pixels. The sub-pixels in the same row The pixel electrodes of the first color sub-pixels are all connected to the same gate line, the pixel electrodes of the second color sub-pixels in the same row of sub-pixels are all connected to another gate line, and the pixel electrodes of two adjacent pixel units in the same row of sub-pixels are connected to the same gate line. The pixel electrodes of the third color sub-pixels are respectively connected to different gate lines.
第二方面,本公开实施例提供了一种显示装置,包括本公开任一实施例中的显示基板。In a second aspect, an embodiment of the disclosure provides a display device, including the display substrate in any embodiment of the disclosure.
在阅读并理解了附图和详细描述后,可以明白其他方面。Other aspects will be apparent after reading and understanding the drawings and detailed description.
附图概述Figure overview
在附图中,除非另外规定,否则贯穿多个附图相同的附图标记表示相同或相似的部件或元素。这些附图不一定是按照比例绘制的。In the drawings, unless otherwise specified, the same reference numbers refer to the same or similar parts or elements throughout the several figures. The drawings are not necessarily to scale.
图1为一种显示基板中采用双栅结构的原理图;Figure 1 is a schematic diagram of a dual-gate structure used in a display substrate;
图2为一种采用双栅结构的像素示意图;Figure 2 is a schematic diagram of a pixel using a double gate structure;
图3为本公开一实施例中显示基板采用双栅结构的原理图;Figure 3 is a schematic diagram of a display substrate using a double-gate structure in an embodiment of the present disclosure;
图4为本公开一实施例中显示基板采用双栅结构的像素示意图;Figure 4 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in an embodiment of the present disclosure;
图5a为图4在一个实施例中的A-A截面示意图;Figure 5a is a schematic cross-sectional view of A-A in Figure 4 in one embodiment;
图5b为图4在一个实施例中的B-B截面示意图;Figure 5b is a schematic cross-sectional view of B-B in Figure 4 in one embodiment;
图6为本公开另一实施例中显示基板采用双栅结构的像素示意图;Figure 6 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure;
图7为图6在一个实施例中的A-A截面示意图;Figure 7 is a schematic cross-sectional view of A-A in Figure 6 in one embodiment;
图8为本公开另一实施例中显示基板采用双栅结构的像素示意图;Figure 8 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure;
图9为图8在一个实施例中的A-A截面示意图;Figure 9 is a schematic cross-sectional view of A-A in Figure 8 in one embodiment;
图10为本公开另一实施例中显示基板采用双栅结构的像素示意图;Figure 10 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure;
图11为本公开另一实施例中显示基板采用双栅结构的像素示意图;Figure 11 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure;
图12为本公开另一实施例中显示基板采用双栅结构的像素示意图;Figure 12 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure;
图13为图12中的A-A截面示意图。Figure 13 is a schematic cross-sectional view along line A-A in Figure 12 .
详述Elaborate
在下文中,仅简单地描述了某些示例性实施例。正如本领域技术人员可认识到的那样,在不脱离本公开的精神或范围的情况下,可通过各种不同方 式修改所描述的实施例,不同的实施例在不冲突的情况下可以任意结合。因此,附图和描述被认为本质上是示例性的而非限制性的。In the following, only certain exemplary embodiments are briefly described. As those skilled in the art will realize, various methods may be used without departing from the spirit or scope of the present disclosure. The described embodiments may be modified according to the formula, and different embodiments may be combined arbitrarily without conflict. Accordingly, the drawings and description are to be regarded as illustrative in nature and not restrictive.
图1为一种显示基板中采用双栅结构的原理图,图2为一种采用双栅结构的像素示意图。图1和图2所示的双栅结构可以叫做普通(Column)架构的双栅结构,如图1和图2所示,在Column架构中,一行子像素对应两条栅线,分别为第一栅线121和第二栅线122,每条栅线对应不同的子像素。例如,在图1和图2中,一个像素单元可以包括第一颜色子像素R、第二颜色子像素G和第三颜色子像素B。对于一个像素单元来说,第一颜色子像素R和第三颜色子像素B对应一条栅线,第二颜色子像素G对应另一条栅线。第一颜色子像素R与第二颜色子像素G使用同一条数据线141,第三颜色子像素B与相邻的像素单元中的第一颜色子像素R使用同一条数据线141。采用图1和图2所示Column架构,可以使数据线141减半,使数据驱动芯片数量减半,达到节约成本的效果。但是,由于同一行的第一颜色子像素R、第二颜色子像素G、第三颜色子像素B的像素电极142连接不同的栅线,当数据线141中通电情况不同时,会导致相邻像素列之间的显示差异,产生竖纹或者摇头纹不良。Figure 1 is a schematic diagram of a display substrate using a double gate structure, and Figure 2 is a schematic diagram of a pixel using a double gate structure. The double-gate structure shown in Figures 1 and 2 can be called the double-gate structure of the ordinary (Column) architecture. As shown in Figures 1 and 2, in the Column architecture, one row of sub-pixels corresponds to two gate lines, respectively. The gate line 121 and the second gate line 122 each correspond to a different sub-pixel. For example, in FIGS. 1 and 2 , one pixel unit may include a first color sub-pixel R, a second color sub-pixel G, and a third color sub-pixel B. For a pixel unit, the first color sub-pixel R and the third color sub-pixel B correspond to one gate line, and the second color sub-pixel G corresponds to another gate line. The first color sub-pixel R and the second color sub-pixel G use the same data line 141, and the third color sub-pixel B uses the same data line 141 as the first color sub-pixel R in the adjacent pixel unit. Using the Column architecture shown in Figures 1 and 2, the data line 141 can be halved, and the number of data driver chips can be halved, thereby achieving cost savings. However, since the pixel electrodes 142 of the first color sub-pixel R, the second color sub-pixel G, and the third color sub-pixel B in the same row are connected to different gate lines, when the power supply conditions of the data lines 141 are different, adjacent Display differences between pixel columns cause vertical lines or shaking head patterns.
本文中,像素电极142与栅线连接,应当理解为,像素电极142通过薄膜晶体管与栅线连接,例如薄膜晶体管的栅电极与栅线连接,薄膜晶体管的第一极与像素电极142连接。像素电极142与数据线141连接,应当理解为,像素电极142通过薄膜晶体管与数据线141连接,例如,薄膜晶体管的第二极与数据线141连接,薄膜晶体管的第一极与像素电极142连接。第一极可以为源电极和漏电极中的一个,第二极可以为源电极和漏电极中的另一个,例如,第一极可以为漏电极,第二极可以为源电极。Here, the pixel electrode 142 is connected to the gate line, which should be understood to mean that the pixel electrode 142 is connected to the gate line through a thin film transistor. For example, the gate electrode of the thin film transistor is connected to the gate line, and the first electrode of the thin film transistor is connected to the pixel electrode 142 . The pixel electrode 142 is connected to the data line 141. It should be understood that the pixel electrode 142 is connected to the data line 141 through a thin film transistor. For example, the second electrode of the thin film transistor is connected to the data line 141, and the first electrode of the thin film transistor is connected to the pixel electrode 142. . The first electrode may be one of the source electrode and the drain electrode, and the second electrode may be the other of the source electrode and the drain electrode. For example, the first electrode may be the drain electrode, and the second electrode may be the source electrode.
图3为本公开一实施例中显示基板采用双栅结构的原理图。图4为本公开一实施例中显示基板采用双栅结构的像素示意图,图5a为图4在一个实施例中的A-A截面示意图,图5b为图4在一个实施例中的B-B截面示意图。如图3、图4、图5a所示,显示基板可以包括衬底11以及位于衬底11上的多个子像素,多个子像素呈M行N组排列,每组子像素包括两列子像素。可以将行所在的方向设置为第一方向X,将列所在的方向设置为第二方向Y。 M和N为大于等于1的正整数。FIG. 3 is a schematic diagram of a display substrate using a dual-gate structure according to an embodiment of the present disclosure. FIG. 4 is a schematic diagram of a pixel in which the display substrate adopts a double-gate structure in an embodiment of the present disclosure. FIG. 5a is a schematic cross-sectional view of AA in FIG. 4 in one embodiment, and FIG. 5b is a schematic cross-sectional view of BB in FIG. 4 in one embodiment. As shown in Figures 3, 4, and 5a, the display substrate may include a substrate 11 and a plurality of sub-pixels located on the substrate 11. The plurality of sub-pixels are arranged in M rows and N groups, and each group of sub-pixels includes two columns of sub-pixels. You can set the direction of the rows as the first direction X, and the direction of the columns as the second direction Y. M and N are positive integers greater than or equal to 1.
在示例性实施例中,显示基板还可以包括M对栅线和N条数据线141,M对栅线和N条数据线141位于衬底11的同一侧,但是位于不同层。M对栅线与M行子像素一一对应,一对栅线可以包括沿第一方向X延伸的第一栅线121和第二栅线122。第一栅线121和第二栅线122分别设置在对应行子像素的相对两侧,且位于相邻两行子像素之间,如图3和图4所示。在图3和图4中,位于行子像素上侧的栅线可以为第一栅线121,位于行子像素下侧的栅线可以为第二栅线122。In an exemplary embodiment, the display substrate may further include M pairs of gate lines and N data lines 141, which are located on the same side of the substrate 11 but on different layers. M pairs of gate lines correspond to M rows of sub-pixels one-to-one, and the pair of gate lines may include a first gate line 121 and a second gate line 122 extending along the first direction X. The first gate line 121 and the second gate line 122 are respectively provided on opposite sides of the corresponding row of sub-pixels, and are located between two adjacent rows of sub-pixels, as shown in FIGS. 3 and 4 . In FIGS. 3 and 4 , the gate line located on the upper side of the row sub-pixel may be the first gate line 121 , and the gate line located on the lower side of the row sub-pixel may be the second gate line 122 .
如图3所示,每行子像素可以设置为多个像素单元,一像素单元包括依次相邻的第一颜色子像素、第二颜色子像素和第三颜色子像素。示例性地,第一颜色子像素可以为红色子像素R,第二颜色子像素可以为绿色子像素G,第三颜色子像素可以为蓝色子像素B。第一颜色子像素、第二颜色子像素和第三颜色子像素的颜色设置并不限于R、G、B,每个像素单元中子像素的颜色可以根据需要设置。As shown in FIG. 3 , each row of sub-pixels can be configured as multiple pixel units, and one pixel unit includes sequentially adjacent first-color sub-pixels, second-color sub-pixels, and third-color sub-pixels. For example, the first color sub-pixel may be a red sub-pixel R, the second color sub-pixel may be a green sub-pixel G, and the third color sub-pixel may be a blue sub-pixel B. The color settings of the first color sub-pixel, the second color sub-pixel and the third color sub-pixel are not limited to R, G, and B. The color of the sub-pixel in each pixel unit can be set as needed.
在示例性实施例中,如图3和图4所示,同一行子像素中的第一颜色子像素的像素电极142均与同一条栅线连接,同一行子像素中的第二颜色子像素的像素电极142均与另一条栅线连接,同一行子像素中相邻两个像素单元中的第三颜色子像素的像素电极142分别与不同的栅线连接。例如,在图3中,同一行子像素中的第一颜色子像素的像素电极142均与第一栅线121连接,同一行子像素中的第二颜色子像素的像素电极142均与第二栅线122连接。第一像素单元中的第三颜色子像素与第二栅线122连接,第二像素单元中的第三颜色子像素与第一栅线121连接。In an exemplary embodiment, as shown in FIGS. 3 and 4 , the pixel electrodes 142 of the first color subpixels in the same row of subpixels are all connected to the same gate line, and the second color subpixels in the same row of subpixels are connected to the same gate line. The pixel electrodes 142 of the pixel electrodes 142 are all connected to another gate line, and the pixel electrodes 142 of the third color sub-pixels in two adjacent pixel units in the same row of sub-pixels are connected to different gate lines respectively. For example, in FIG. 3 , the pixel electrodes 142 of the first color subpixels in the same row of subpixels are all connected to the first gate line 121 , and the pixel electrodes 142 of the second color subpixels in the same row of subpixels are all connected to the second color subpixels. Gate lines 122 are connected. The third color sub-pixel in the first pixel unit is connected to the second gate line 122, and the third color sub-pixel in the second pixel unit is connected to the first gate line 121.
在示例性实施例中,如图3和图4所示,显示基板还可以包括N条数据线141,每条数据线141与相邻两组子像素相对应。与同一条数据线141相对应的相邻两组子像素可以分别为第一组子像素31和第二组子像素32,第一组子像素31中的奇数行子像素的像素电极142与对应的数据线141连接,第二组子像素32中的偶数行子像素的像素电极142与对应的数据线141连接。In an exemplary embodiment, as shown in FIGS. 3 and 4 , the display substrate may further include N data lines 141 , each data line 141 corresponding to two adjacent groups of sub-pixels. The two adjacent groups of sub-pixels corresponding to the same data line 141 may be the first group of sub-pixels 31 and the second group of sub-pixels 32 respectively. The pixel electrodes 142 of the odd-numbered rows of sub-pixels in the first group of sub-pixels 31 correspond to The data lines 141 are connected, and the pixel electrodes 142 of the even-numbered row sub-pixels in the second group of sub-pixels 32 are connected to the corresponding data lines 141 .
上述第一组子像素31和第二组子像素32是相对于对应的数据线来说的,例如,在对应第i条数据线时,其中的一组子像素为第一组子像素,在对应 第i+1条数据线时,该组子像素可以为第二组子像素。The above-mentioned first group of sub-pixels 31 and second group of sub-pixels 32 are relative to the corresponding data lines. For example, when corresponding to the i-th data line, one group of sub-pixels is the first group of sub-pixels. correspond For the i+1th data line, this group of sub-pixels may be the second group of sub-pixels.
图3所示的像素连接方式可以叫做Z架构像素。采用Z架构像素的技术方案可以避免由于相邻数据线141充电不同带来的显示差异,避免竖纹或者摇头纹不良。The pixel connection method shown in Figure 3 can be called Z architecture pixels. The technical solution using Z architecture pixels can avoid display differences caused by different charging of adjacent data lines 141 and avoid vertical or shaking head marks.
在采用双栅结构时,为了保证像素充电率,如图4所示,显示基板还可以包括设置在衬底11一侧的电极补偿层,电极补偿层可以包括多条公共电极补偿线171。公共电极补偿线171可以位于相邻的两条数据线141之间,且位于相邻两列子像素之间。When using a double-gate structure, in order to ensure the pixel charging rate, as shown in FIG. 4 , the display substrate may also include an electrode compensation layer disposed on one side of the substrate 11 , and the electrode compensation layer may include a plurality of common electrode compensation lines 171 . The common electrode compensation line 171 may be located between two adjacent data lines 141 and between two adjacent columns of sub-pixels.
在示例性实施例中,如图5a和图5b所示,显示基板还包括在衬底11的一侧依次设置的第一导电层、第二绝缘层13、第二导电层、第一绝缘层15、电极补偿层、第三绝缘层18和公共电极层16。第一栅线121和第二栅线122位于第一导电层,数据线141和像素电极142位于第二导电层,电极补偿层与第一导电层不同层且与第二导电层不同层。电极补偿层包括公共电极补偿线171。公共电极补偿线171通过贯穿第三绝缘层18的过孔与公共电极层16连接。In an exemplary embodiment, as shown in FIGS. 5a and 5b , the display substrate further includes a first conductive layer, a second insulating layer 13 , a second conductive layer, and a first insulating layer sequentially disposed on one side of the substrate 11 15. Electrode compensation layer, third insulating layer 18 and common electrode layer 16. The first gate line 121 and the second gate line 122 are located in the first conductive layer, the data line 141 and the pixel electrode 142 are located in the second conductive layer, and the electrode compensation layer is a different layer from the first conductive layer and a different layer from the second conductive layer. The electrode compensation layer includes a common electrode compensation line 171 . The common electrode compensation line 171 is connected to the common electrode layer 16 through a via hole penetrating the third insulating layer 18 .
在图2所示实施例中,公共电极补偿线171可以与数据线141位于同一层,显示基板不需要单独设置电极补偿层和第三绝缘层18,公共电极层16设置在第一绝缘层15的上方,公共电极补偿线171可以通过贯穿第一绝缘层15的第一过孔41与公共电极层16连接。In the embodiment shown in FIG. 2 , the common electrode compensation line 171 can be located on the same layer as the data line 141 . The display substrate does not need to separately provide an electrode compensation layer and the third insulating layer 18 . The common electrode layer 16 is provided on the first insulating layer 15 Above, the common electrode compensation line 171 may be connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
图6为本公开另一实施例中显示基板采用双栅结构的像素示意图,图7为图6在一个实施例中的A-A截面示意图。如图6和图7所示,显示基板还包括在衬底11的一侧依次设置的第一导电层、第二绝缘层13、第二导电层、第一绝缘层15和公共电极层16。第一栅线121和第二栅线122位于第一导电层,数据线141、像素电极142和电极补偿层均位于第二导电层。电极补偿层可以包括多条公共电极补偿线171。公共电极补偿线171可以位于相邻的两条数据线141之间,且位于相邻两列子像素之间。公共电极补偿线171通过贯穿第一绝缘层15的第一过孔41与公共电极层16连接。FIG. 6 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure. FIG. 7 is a schematic diagram of the A-A cross-section of FIG. 6 in one embodiment. As shown in FIGS. 6 and 7 , the display substrate also includes a first conductive layer, a second insulating layer 13 , a second conductive layer, a first insulating layer 15 and a common electrode layer 16 that are sequentially disposed on one side of the substrate 11 . The first gate line 121 and the second gate line 122 are located on the first conductive layer, and the data line 141, the pixel electrode 142 and the electrode compensation layer are all located on the second conductive layer. The electrode compensation layer may include a plurality of common electrode compensation lines 171 . The common electrode compensation line 171 may be located between two adjacent data lines 141 and between two adjacent columns of sub-pixels. The common electrode compensation line 171 is connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
如图6所示,数据线141包括与奇数行子像素相对应的第一部分走线141a以及与偶数行相对应的第二部分走线141b,第一部分走线141a位于对 应的第一组子像素31中的相邻两列子像素之间,第二部分走线141b位于对应的第二组子像素32的相邻两列子像素之间。数据线141还包括第三部分走线141c,第三部分走线141c位于相邻两行子像素的相邻两条栅线之间,例如,第三部分走线141c位于相邻两行子像素的第二栅线122a和第一栅线121b之间。与相邻两行子像素相对应的第一部分走线141a和第二部分走线141b通过第三部分走线141c连接。从而,图6中的数据线141呈“弓字型”走线。As shown in FIG. 6 , the data line 141 includes a first portion of wiring 141a corresponding to the odd-numbered rows of sub-pixels and a second portion of wiring 141b corresponding to the even-numbered rows. The first portion of wiring 141a is located on the opposite side. Between two adjacent columns of sub-pixels in the corresponding first group of sub-pixels 31, the second portion of wiring 141b is located between two adjacent columns of sub-pixels in the corresponding second group of sub-pixels 32. The data line 141 also includes a third portion of wiring 141c. The third portion of wiring 141c is located between two adjacent gate lines of two adjacent rows of sub-pixels. For example, the third portion of wiring 141c is located between two adjacent rows of sub-pixels. between the second gate line 122a and the first gate line 121b. The first partial wiring 141a and the second partial wiring 141b corresponding to two adjacent rows of sub-pixels are connected by a third partial wiring 141c. Therefore, the data line 141 in FIG. 6 has a "bow-shaped" routing.
在示例性实施例中,如图6和图7所示,公共电极补偿线171可以包括多个第一补偿走线171a,多个第一补偿走线171a与一行子像素相对应,第一补偿走线171a位于相邻两条数据线141之间且位于对应行子像素中的相邻两列子像素之间。第一补偿走线171a可以通过贯穿第一绝缘层15的第一过孔41与公共电极层16连接。In an exemplary embodiment, as shown in FIGS. 6 and 7 , the common electrode compensation line 171 may include a plurality of first compensation lines 171 a corresponding to one row of sub-pixels, and the first compensation lines 171 a The wiring 171a is located between two adjacent data lines 141 and between two adjacent columns of sub-pixels in the corresponding row of sub-pixels. The first compensation trace 171 a may be connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
示例性地,如图6所示,公共电极补偿线171还可以包括第二补偿走线171b,第二补偿走线171b位于相邻两行子像素的相邻两条栅线之间。第二补偿走线171b连接相邻两行子像素相对应的第一补偿走线171a。从而,图6中的公共电极补偿线171呈“弓字型”走线。For example, as shown in FIG. 6 , the common electrode compensation line 171 may also include a second compensation line 171b, and the second compensation line 171b is located between two adjacent gate lines of two adjacent rows of sub-pixels. The second compensation wiring 171b connects the first compensation wiring 171a corresponding to two adjacent rows of sub-pixels. Therefore, the common electrode compensation line 171 in FIG. 6 has a "bow-shaped" routing.
图6所示的实施例中,在相邻两行子像素的相邻两条栅线之间不仅设置数据线141的第三部分走线141c,而且还设置公共电极补偿线171的第二补偿走线171b。图6所示实施例相对于图2所示实施例没有增加掩膜数。图8为本公开另一实施例中显示基板采用双栅结构的像素示意图,图9为图8在一个实施例中的A-A截面示意图。在一种实施方式中,如图8所示,显示基板中像素连接方式采用Z架构像素技术方案。如图8和图9所示,显示基板还包括设置在衬底11一侧的电极补偿层和公共电极层16,电极补偿层和公共电极层16之间设置有第一绝缘层15。电极补偿层包括多个电极补偿线,电极补偿线位于相邻两条数据线141之间。电极补偿线可以包括多个第一补偿走线171a,多个第一补偿走线171a与一行子像素相对应,第一补偿走线171a位于相邻两条数据线141之间且位于对应行子像素中的相邻两列子像素之间,第一补偿走线171a通过贯穿第一绝缘层15的第一过孔41与公共电极层16连接。 In the embodiment shown in FIG. 6 , not only the third partial wiring 141c of the data line 141 is provided between two adjacent gate lines of two adjacent rows of sub-pixels, but also the second compensation line of the common electrode compensation line 171 is provided. Trace 171b. The embodiment shown in FIG. 6 does not increase the number of masks compared to the embodiment shown in FIG. 2 . FIG. 8 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure. FIG. 9 is a schematic diagram of the AA cross-section of FIG. 8 in one embodiment. In one implementation, as shown in FIG. 8 , the pixel connection method in the display substrate adopts a Z-architecture pixel technology solution. As shown in FIGS. 8 and 9 , the display substrate also includes an electrode compensation layer and a common electrode layer 16 disposed on one side of the substrate 11 , and a first insulating layer 15 is disposed between the electrode compensation layer and the common electrode layer 16 . The electrode compensation layer includes a plurality of electrode compensation lines, and the electrode compensation lines are located between two adjacent data lines 141 . The electrode compensation line may include a plurality of first compensation lines 171a. The plurality of first compensation lines 171a correspond to a row of sub-pixels. The first compensation lines 171a are located between two adjacent data lines 141 and are located in the corresponding row of sub-pixels. Between two adjacent columns of sub-pixels in the pixel, the first compensation wiring 171a is connected to the common electrode layer 16 through the first via hole 41 penetrating the first insulation layer 15 .
本公开实施例的技术方案,通过设置多个第一补偿走线171a,可以对公共电极层16进行公共电极信号补偿,保证像素的充电率,提高显示效果。According to the technical solution of the embodiment of the present disclosure, by arranging a plurality of first compensation lines 171a, the common electrode signal can be compensated for the common electrode layer 16 to ensure the charging rate of the pixels and improve the display effect.
示例性地,衬底11可以为玻璃衬底,也可以为柔性衬底,衬底11的材质可以根据需要设置,在此不作限定。For example, the substrate 11 can be a glass substrate or a flexible substrate. The material of the substrate 11 can be set as needed and is not limited here.
在一种实施方式中,如图9所示,电极补偿层与数据线141位于同一层,即第一补偿走线171a与数据线141位于同一层。这样的设置方式,不会增加显示基板的掩膜次数,不会增加生产成本。In one implementation, as shown in FIG. 9 , the electrode compensation layer and the data line 141 are located on the same layer, that is, the first compensation wiring 171 a and the data line 141 are located on the same layer. This setting method will not increase the number of masks for the display substrate and will not increase production costs.
在一种实施方式中,如图8和图9所示,多个第一补偿走线171a在电极补偿层中彼此不连通。第一补偿走线171a通过对应的第一过孔41与公共电极层16连接。从而,电极补偿层中不再需要设置第二补偿走线171b。相对于图6所示实施例,图8所示实施例中,相邻两行子像素的相邻两条栅线(第二栅线122a和第一栅线121b)之间的距离大大减小,可以提升显示装置的像素开口率,可以满足对像素分辨率要求较高的中小尺寸显示产品的需求及设计需求。In one implementation, as shown in FIGS. 8 and 9 , the plurality of first compensation traces 171a are not connected to each other in the electrode compensation layer. The first compensation trace 171a is connected to the common electrode layer 16 through the corresponding first via hole 41. Therefore, it is no longer necessary to provide the second compensation trace 171b in the electrode compensation layer. Compared with the embodiment shown in Figure 6, in the embodiment shown in Figure 8, the distance between two adjacent gate lines (the second gate line 122a and the first gate line 121b) of two adjacent rows of sub-pixels is greatly reduced. , can improve the pixel aperture ratio of the display device, and can meet the needs and design needs of small and medium-sized display products that require higher pixel resolution.
在一种实施方式中,如图8所示,数据线141包括与奇数行子像素相对应的第一部分走线141a以及与偶数行相对应的第二部分走线141b,第一部分走线141a位于对应的第一组子像素31中的相邻两列子像素之间,第二部分走线141b位于对应的第二组子像素32的相邻两列子像素之间。数据线141还包括第三部分走线141c,第三部分走线141c位于相邻两行子像素的相邻两条栅线之间,例如,第三部分走线141c位于相邻两行子像素的第二栅线122a和第一栅线121b之间。与相邻两行子像素相对应的第一部分走线141a和第二部分走线141b通过第三部分走线141c连接。从而,图8中的数据线141也呈“弓字型”走线。In one implementation, as shown in FIG. 8 , the data line 141 includes a first portion of wiring 141a corresponding to the odd-numbered rows of sub-pixels and a second portion of wiring 141b corresponding to the even-numbered rows. The first portion of wiring 141a is located at Between two adjacent columns of sub-pixels in the corresponding first group of sub-pixels 31, the second portion of wiring 141b is located between two adjacent columns of sub-pixels in the corresponding second group of sub-pixels 32. The data line 141 also includes a third portion of wiring 141c. The third portion of wiring 141c is located between two adjacent gate lines of two adjacent rows of sub-pixels. For example, the third portion of wiring 141c is located between two adjacent rows of sub-pixels. between the second gate line 122a and the first gate line 121b. The first partial wiring 141a and the second partial wiring 141b corresponding to two adjacent rows of sub-pixels are connected by a third partial wiring 141c. Therefore, the data line 141 in Figure 8 also has a "bow-shaped" routing.
在一种实施方式中,如图9所示,显示基板还包括在衬底11的一侧依次设置的第一导电层、第二绝缘层13、第二导电层、第一绝缘层15和公共电极层16。第一栅线121和第二栅线122位于第一导电层,数据线141、像素电极142和电极补偿层均位于第二导电层。In one embodiment, as shown in FIG. 9 , the display substrate further includes a first conductive layer, a second insulating layer 13 , a second conductive layer, a first insulating layer 15 and a common layer arranged sequentially on one side of the substrate 11 Electrode layer 16. The first gate line 121 and the second gate line 122 are located on the first conductive layer, and the data line 141, the pixel electrode 142 and the electrode compensation layer are all located on the second conductive layer.
显示基板还可以包括薄膜晶体管,薄膜晶体管可以包括栅电极、有源层、源电极和漏电极,栅电极可以位于第一导电层,源电极和漏电极可以位于第 二导电层。有源层的设置可以根据需要设置,例如,可以在第二绝缘层13与第二导电层之间设置有源层,源电极和漏电极均与有源层连接。The display substrate may further include a thin film transistor. The thin film transistor may include a gate electrode, an active layer, a source electrode and a drain electrode. The gate electrode may be located on the first conductive layer, and the source electrode and the drain electrode may be located on the first conductive layer. Two conductive layers. The active layer can be arranged as needed. For example, the active layer can be arranged between the second insulating layer 13 and the second conductive layer, and both the source electrode and the drain electrode are connected to the active layer.
示例性地,如图8所示,显示基板可以包括多个第一薄膜晶体管61,多个第一薄膜晶体管61与多个子像素一一对应,第一薄膜晶体管61与对应子像素的像素电极连接。第一薄膜晶体管61在衬底11上的正投影位于相邻两行子像素之间。从而,第一薄膜晶体管61不会占用用于设置像素电极的子像素区域,可以提高像素开口率。For example, as shown in FIG. 8 , the display substrate may include a plurality of first thin film transistors 61 , the plurality of first thin film transistors 61 correspond to a plurality of sub-pixels one by one, and the first thin film transistors 61 are connected to the pixel electrodes of the corresponding sub-pixels. . The orthographic projection of the first thin film transistor 61 on the substrate 11 is located between two adjacent rows of sub-pixels. Therefore, the first thin film transistor 61 does not occupy the sub-pixel area for setting the pixel electrode, and the pixel aperture ratio can be improved.
在一种实施方式中,如图8所示,第一过孔41可以位于第一补偿走线171a的一端,第一过孔41在衬底11上的正投影可以位于相邻两行子像素的相邻两个栅线在衬底11上的正投影之间。示例性地,在图8中,第一过孔41在衬底11上的正投影位于相邻两行子像素的第二栅线122a与第一栅线121b在衬底11上的正投影之间。示例性地,如图8所示,第一过孔41在衬底11上的正投影与第一薄膜晶体管61在衬底11上的正投影不存在交叠区域。从而,第一过孔41可以避让第一薄膜晶体管61In one implementation, as shown in FIG. 8 , the first via hole 41 may be located at one end of the first compensation trace 171 a, and the orthographic projection of the first via hole 41 on the substrate 11 may be located at two adjacent rows of sub-pixels. between the orthographic projections of two adjacent gate lines on the substrate 11. For example, in FIG. 8 , the orthographic projection of the first via hole 41 on the substrate 11 is located between the orthographic projections of the second gate line 122 a and the first gate line 121 b of two adjacent rows of sub-pixels on the substrate 11 . between. For example, as shown in FIG. 8 , there is no overlapping area between the orthographic projection of the first via hole 41 on the substrate 11 and the orthographic projection of the first thin film transistor 61 on the substrate 11 . Therefore, the first via hole 41 can avoid the first thin film transistor 61
在示例性实施例中,第一补偿走线171a包括第一延伸段a1和第二延伸段a2,第一延伸段a1位于相邻两个子像素之间,第一延伸段a1可以沿第二方向延伸。第二延伸段a2连接第一延伸段a1和第一过孔41。第一过孔41与第一延伸段a1的延长线不存在交叠区域,也就是说,第二延伸段a2与第一延伸段a1不平行。In an exemplary embodiment, the first compensation trace 171a includes a first extension section a1 and a second extension section a2. The first extension section a1 is located between two adjacent sub-pixels. The first extension section a1 can be along the second direction. extend. The second extension section a2 connects the first extension section a1 and the first via hole 41 . There is no overlapping area between the extension lines of the first via hole 41 and the first extension section a1. That is to say, the second extension section a2 is not parallel to the first extension section a1.
在图6所示实施例中,第一补偿走线171a沿第二方向延伸,第一过孔41位于第一补偿走线171a,从而,为了使第一过孔41避让数据线141的第三部分走线141c,可增大第二栅线122与第一栅线121之间的距离。图8所示实施例中,第一延伸段a1沿第二方向延伸,第二延伸段a2与第一延伸段a1不平行,第一过孔41与第一延伸段a1的延长线不存在交叠区域。从而,第一过孔41位于第一延伸段a1的一侧(例如右侧),这就使得第一过孔41可以避让数据线141第三部分走线141c,就可以减小第二栅线122与第一栅线121之间的距离,进而减小相邻行子像素之间的距离,有利于提高显示产品的像素开口率。In the embodiment shown in FIG. 6 , the first compensation trace 171a extends along the second direction, and the first via hole 41 is located on the first compensation trace 171a. Therefore, in order for the first via hole 41 to avoid the third side of the data line 141, The partial wiring 141c can increase the distance between the second gate line 122 and the first gate line 121. In the embodiment shown in FIG. 8 , the first extension section a1 extends along the second direction, the second extension section a2 is not parallel to the first extension section a1 , and there is no intersection between the first via hole 41 and the extension line of the first extension section a1 . overlapping area. Therefore, the first via hole 41 is located on one side (for example, the right side) of the first extension section a1, which allows the first via hole 41 to avoid the third part of the wiring 141c of the data line 141, thus reducing the size of the second gate line. 122 and the first gate line 121, thereby reducing the distance between adjacent rows of sub-pixels, which is beneficial to improving the pixel aperture ratio of the display product.
在一种实施方式中,如图8所示,显示基板还包括贯穿第一绝缘层15 的第二过孔42,第一补偿走线171a的另一端通过第二过孔42与公共电极层16连接。第二过孔42在衬底11上的正投影位于相邻两行子像素的相邻两个栅线在衬底11上的正投影之间。第一补偿走线171a还包括第三延伸段a3,第三延伸段a3连接第一延伸段a1和第二过孔42,第二过孔42与第一延伸段a1的延长线不存在交叠区域。这样的结构,第一补偿走线171a的两端分别通过第一过孔41和第二过孔42与公共电极层16连接,可以降低第一补偿走线171a与公共电极层16之间的连接电阻,提高产品性能。In one embodiment, as shown in FIG. 8 , the display substrate further includes a penetrating first insulating layer 15 The other end of the first compensation trace 171a is connected to the common electrode layer 16 through the second via hole 42. The orthographic projection of the second via hole 42 on the substrate 11 is located between the orthographic projections of two adjacent gate lines on the substrate 11 of two adjacent rows of sub-pixels. The first compensation trace 171a also includes a third extension section a3. The third extension section a3 connects the first extension section a1 and the second via hole 42. The second via hole 42 does not overlap with the extension line of the first extension section a1. area. In such a structure, both ends of the first compensation trace 171a are connected to the common electrode layer 16 through the first via hole 41 and the second via hole 42 respectively, which can reduce the connection between the first compensation trace 171a and the common electrode layer 16 resistance to improve product performance.
在一种实施方式中,如图8所示,第一过孔41和第二过孔42位于对应的第一延伸段a1的同一侧。例如,图8中,第一过孔41和第二过孔42均位于第一延伸段a1的右侧或左侧。In one embodiment, as shown in FIG. 8 , the first via hole 41 and the second via hole 42 are located on the same side of the corresponding first extension section a1. For example, in FIG. 8 , the first via hole 41 and the second via hole 42 are both located on the right or left side of the first extension section a1 .
示例性地,相邻两行子像素对应的第一补偿走线171a中的第二延伸段a2的位置相反。例如,图8中,奇数行子像素对应的第一补偿走线171a中,第一过孔41和第二过孔42均位于第一延伸段a1的右侧,因此,第二延伸段a2和第三延伸段a3均朝向对应的第一延伸段a1的右侧延伸;偶数行子像素对应的第一补偿走线171a中,第一过孔41和第二过孔42位于第一延伸段a1的左侧,因此,第二延伸段a2和第三延伸段a3均朝向对应的第一延伸段a1的左侧延伸。For example, the positions of the second extension section a2 in the first compensation trace 171a corresponding to two adjacent rows of sub-pixels are opposite. For example, in Figure 8, in the first compensation trace 171a corresponding to the odd-numbered row sub-pixel, the first via hole 41 and the second via hole 42 are both located on the right side of the first extension section a1. Therefore, the second extension section a2 and The third extension sections a3 all extend toward the right side of the corresponding first extension section a1; in the first compensation traces 171a corresponding to the even-numbered rows of sub-pixels, the first via hole 41 and the second via hole 42 are located in the first extension section a1 Therefore, the second extension section a2 and the third extension section a3 both extend toward the left side of the corresponding first extension section a1.
从而,如图8所示,奇数行子像素对应的第一过孔41和偶数行子像素对应的第二过孔42均可以避让数据线141的第三部分走线141c,有利于数据线141的第三部分走线141c的设置。Therefore, as shown in FIG. 8 , both the first via holes 41 corresponding to the sub-pixels in the odd rows and the second via holes 42 corresponding to the sub-pixels in the even rows can avoid the third part of the wiring 141 c of the data line 141 , which is beneficial to the data line 141 The third part of the trace is set to 141c.
在一种实施方式中,如图8所示,显示基板还可以包括预设遮光区50,第二延伸段a2位于预设遮光区50内和/或第三延伸段a3位于预设遮光区50内。示例性地,显示基板可以应用于液晶显示装置中,液晶显示装置可以包括本公开实施例中的显示基板,以及与显示基板对盒的彩膜基板,彩膜基板上可以设置黑矩阵,黑矩阵在显示基板上的正投影可以位于相邻行子像素之间以及相邻列子像素之间。在显示基板中设置有预设遮光区50,在显示基板与彩膜基板对盒后,该预设遮光区50与彩膜基板中的黑矩阵相对应。将第二延伸段a2设置在预设遮光区50和/或将第三延伸段a3设置在预设遮光区50,从而,第二延伸段a2和/或第三延伸段a3可以被黑矩阵遮挡,避免第二延伸 段a2和第三延伸段a3影响显示装置的透光率。In one embodiment, as shown in FIG. 8 , the display substrate may further include a preset light-shielding area 50 , the second extension section a2 is located in the preset light-shielding area 50 and/or the third extension section a3 is located in the preset light-shielding area 50 Inside. For example, the display substrate can be used in a liquid crystal display device. The liquid crystal display device can include the display substrate in the embodiment of the present disclosure, and a color filter substrate aligned with the display substrate. A black matrix can be disposed on the color filter substrate. The black matrix Orthographic projections on the display substrate may be between adjacent rows of sub-pixels and between adjacent columns of sub-pixels. A preset light-shielding area 50 is provided in the display substrate. After the display substrate and the color filter substrate are assembled, the preset light-shielding area 50 corresponds to the black matrix in the color filter substrate. The second extension section a2 is arranged in the preset light shielding area 50 and/or the third extension section a3 is arranged in the preset light shielding area 50, so that the second extension section a2 and/or the third extension section a3 can be blocked by the black matrix. , to avoid the second extension The segment a2 and the third extended segment a3 affect the light transmittance of the display device.
图10为本公开另一实施例中显示基板采用双栅结构的像素示意图。在一种实施方式中,如图10所示,数据线141位于相邻两组子像素之间。数据线141可以在相邻两组子像素之间沿第二方向延伸。这样的结构,相邻行子像素之间的数据线141为连通的直线,不再需要在相邻行子像素的相邻栅线之间设置第三部分走线141c,可以进一步减小相邻行子像素的相邻两个栅线之间的距离,有利于提升显示产品的开口率。FIG. 10 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure. In one implementation, as shown in FIG. 10 , the data line 141 is located between two adjacent groups of sub-pixels. The data line 141 may extend along the second direction between two adjacent groups of sub-pixels. With such a structure, the data lines 141 between adjacent rows of sub-pixels are connected straight lines, and there is no need to set a third part of the wiring 141c between adjacent gate lines of adjacent rows of sub-pixels, which can further reduce the number of adjacent rows of sub-pixels. The distance between two adjacent gate lines of a row of sub-pixels is beneficial to improving the aperture ratio of the display product.
在一种实施方式中,如图10所示,第一补偿走线171a可以包括第一延伸段a1,第一延伸段a1位于相邻两个子像素之间且沿第二方向延伸。第一过孔41在衬底11上的正投影位于相邻两行子像素之间,第一过孔41在衬底11上的正投影与第一延伸段a1在衬底11上的正投影至少部分交叠。在图10所示实施例中,由于数据线141为沿第二方向延伸的直线,从而,第一过孔41不再需要避让数据线141,因此,可以将第一过孔41在衬底11上的正投影设置为与第一延伸段a1在衬底11上的正投影至少部分交叠,这样就可以进一步减小相邻行子像素之间的距离,进一步提高像素开口率。In one implementation, as shown in FIG. 10 , the first compensation trace 171a may include a first extension section a1, the first extension section a1 is located between two adjacent sub-pixels and extends along the second direction. The orthographic projection of the first via hole 41 on the substrate 11 is located between two adjacent rows of sub-pixels. The orthographic projection of the first via hole 41 on the substrate 11 is the same as the orthographic projection of the first extension section a1 on the substrate 11 At least partially overlap. In the embodiment shown in FIG. 10 , since the data line 141 is a straight line extending along the second direction, the first via hole 41 no longer needs to avoid the data line 141 . Therefore, the first via hole 41 can be placed on the substrate 11 The orthographic projection on the substrate 11 is set to at least partially overlap with the orthographic projection of the first extension section a1 on the substrate 11 , so that the distance between adjacent rows of sub-pixels can be further reduced and the pixel aperture ratio can be further improved.
示例性地,第一过孔41在衬底11上的正投影位于相邻两行子像素的相邻两条栅线之间,这样就可以保证第一过孔41位于预设遮光区50,避免对显示基板的透光率产生影响。For example, the orthographic projection of the first via hole 41 on the substrate 11 is located between two adjacent gate lines of two adjacent rows of sub-pixels. This ensures that the first via hole 41 is located in the preset light shielding area 50. Avoid affecting the light transmittance of the display substrate.
示例性地,如图10所示,相邻的两行子像素中,位于相同两列子像素之间的两个第一延伸段a1在二者之间不存在同层导电材料的情况下可以在电极补偿层中相互连通。示例性地,在图10中,相邻的奇数行子像素中的第一延伸段a1-a与偶数行子像素中的第一延伸段a1-b位于相同两列子像素之间,在奇数行子像素中的第一延伸段a1-a与偶数行子像素中的第一延伸段a1-b之间不存在同层导电材料的情况下,奇数行子像素中的第一延伸段a1-a与偶数行子像素中的第一延伸段a1-b可以相互连通。For example, as shown in Figure 10, in two adjacent rows of sub-pixels, two first extension sections a1 located between the same two columns of sub-pixels can be The electrode compensation layer is interconnected. For example, in Figure 10, the first extended section a1-a in the adjacent odd-numbered row sub-pixels and the first extended section a1-b in the even-numbered row sub-pixels are located between the same two columns of sub-pixels. In the odd-numbered rows, When there is no same layer of conductive material between the first extended section a1-a in the sub-pixels and the first extended section a1-b in the even-numbered rows of sub-pixels, the first extended section a1-a in the odd-numbered rows of sub-pixels The first extended section a1-b in the even-numbered rows of sub-pixels may be connected to each other.
示例性地,如图10所示,在电极补偿层中相互连通的两个第一延伸段a1共用第一过孔41。这样就可以减少第一过孔41的数量。For example, as shown in FIG. 10 , two first extension sections a1 that are connected to each other in the electrode compensation layer share the first via hole 41 . In this way, the number of first via holes 41 can be reduced.
示例性地,奇数行子像素中的第一延伸段a1与偶数行子像素中的第一延伸段a1之间存在同层导电材料时,奇数行子像素中的第一延伸段a1与偶数 行子像素中的第二延伸段a2在电极补偿层中不连通。For example, when there is the same layer of conductive material between the first extension section a1 in the odd-numbered rows of sub-pixels and the first extension section a1 in the even-numbered rows of sub-pixels, the first extension section a1 in the odd-numbered rows of sub-pixels and the first extension section a1 in the even-numbered subpixels The second extension section a2 in the row sub-pixel is not connected in the electrode compensation layer.
在一种实施方式中,如图10所示,第一补偿走线171a还包括第四延伸段a4,第四延伸段a4位于相邻两行子像素之间,第四延伸段a4与第一延伸段a1不平行,第一过孔41在衬底11上的正投影与第四延伸段a4在衬底11上的正投影至少部分交叠。通过设置第四延伸段a4可以增大第一补偿走线171a的补偿负载,避免电极补偿线分段设置对公共电极补偿信号的影响。In one implementation, as shown in Figure 10, the first compensation trace 171a also includes a fourth extension section a4. The fourth extension section a4 is located between two adjacent rows of sub-pixels. The fourth extension section a4 is connected to the first The extension section a1 is not parallel, and the orthographic projection of the first via hole 41 on the substrate 11 and the orthographic projection of the fourth extension section a4 on the substrate 11 at least partially overlap. By arranging the fourth extension section a4, the compensation load of the first compensation line 171a can be increased, and the influence of the segmented arrangement of the electrode compensation line on the common electrode compensation signal can be avoided.
示例性地,第四延伸段a4可以位于相邻两行子像素的相邻两条栅线之间。第四延伸段a4的方向与第一延伸段a1的方向不平行,示例性地,第四延伸段a4的方向可以与第一延伸段a1的方向相垂直。For example, the fourth extension section a4 may be located between two adjacent gate lines of two adjacent rows of sub-pixels. The direction of the fourth extension section a4 is not parallel to the direction of the first extension section a1. For example, the direction of the fourth extension section a4 may be perpendicular to the direction of the first extension section a1.
在图10所示实施例中,第一补偿走线171a与数据线141位于同一层。In the embodiment shown in FIG. 10 , the first compensation line 171a and the data line 141 are located on the same layer.
图11为本公开另一实施例中显示基板采用双栅结构的像素示意图。在一种实施方式中,如图11所示,显示基板还可以包括第三过孔43,第三过孔43贯穿第一绝缘层15。第三过孔43位于第一延伸段a1的远离第一过孔41的一端,第三过孔43在衬底11上的正投影位于相邻两个子像素之间且位于对应行子像素的两条栅线在衬底11上的正投影之间。FIG. 11 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure. In one embodiment, as shown in FIG. 11 , the display substrate may further include a third via hole 43 , and the third via hole 43 penetrates the first insulating layer 15 . The third via hole 43 is located at one end of the first extension section a1 away from the first via hole 41 . The orthographic projection of the third via hole 43 on the substrate 11 is located between two adjacent sub-pixels and is located on both sides of the corresponding row of sub-pixels. Between the orthographic projections of the grating lines on the substrate 11.
示例性地,如图11所示,第一补偿走线171a与数据线141位于同一层。For example, as shown in FIG. 11 , the first compensation trace 171a and the data line 141 are located on the same layer.
图12为本公开另一实施例中显示基板采用双栅结构的像素示意图。图13为图12中的A-A截面示意图。在一种实施方式中,如图12和图13所示,显示基板包括在衬底11的一侧依次设置的第一导电层、第二绝缘层13、第二导电层、第一绝缘层15和公共电极层16。电极补偿层和栅线位于第一导电层,数据线141位于第二导电层。第一补偿走线171a包括第一延伸段a1,第一延伸段a1位于相邻两个子像素之间且沿第二方向延伸。第一延伸段a1位于对应行子像素的两条栅线之间,第一过孔41在衬底11上的正投影位于相邻两个子像素之间且位于对应行子像素的两条栅线(第一栅线121a与第二栅线122a)在衬底11上的正投影之间。第一过孔41的数量为至少一个,第一过孔41贯穿第二绝缘层13和第一绝缘层15,第一延伸段a1通过至少一个第一过孔41与公共电极层16连接。FIG. 12 is a schematic diagram of a pixel in which the display substrate adopts a double gate structure in another embodiment of the present disclosure. Figure 13 is a schematic cross-sectional view along line A-A in Figure 12 . In one embodiment, as shown in FIGS. 12 and 13 , the display substrate includes a first conductive layer, a second insulating layer 13 , a second conductive layer, and a first insulating layer 15 that are sequentially disposed on one side of the substrate 11 and common electrode layer 16. The electrode compensation layer and the gate line are located on the first conductive layer, and the data line 141 is located on the second conductive layer. The first compensation trace 171a includes a first extension section a1. The first extension section a1 is located between two adjacent sub-pixels and extends along the second direction. The first extension section a1 is located between the two gate lines of the corresponding row of sub-pixels. The orthographic projection of the first via hole 41 on the substrate 11 is located between two adjacent sub-pixels and located between the two gate lines of the corresponding row of sub-pixels. (the first gate line 121a and the second gate line 122a) between orthographic projections on the substrate 11. The number of the first via hole 41 is at least one. The first via hole 41 penetrates the second insulation layer 13 and the first insulation layer 15 . The first extension section a1 is connected to the common electrode layer 16 through at least one first via hole 41 .
图11和图12所示的实施例可以应用于中大尺寸显示产品中,第一延伸段a1通过两个过孔与公共电极层16连接,可以降低第一补偿走线171a与公 共电极层16之间的连接电阻。The embodiments shown in Figures 11 and 12 can be applied to medium and large size display products. The first extension section a1 is connected to the common electrode layer 16 through two via holes, which can reduce the distance between the first compensation trace 171a and the common electrode layer 16. Connection resistance between common electrode layers 16.
本公开实施例中的显示基板可以应用于非TDDI(Touch and Display Driver Integration,触控与显示驱动器集成)的双栅显示产品中。The display substrate in the embodiment of the present disclosure can be applied to non-TDDI (Touch and Display Driver Integration, touch and display driver integration) dual-gate display products.
下面以图8和图9实施例说明本公开实施例显示基板的制备过程。可以理解的是,本文中所说的“图案化”,当图案化的材质为无机材质或金属时,“图案化”包括涂覆光刻胶、掩膜曝光、显影、刻蚀、剥离光刻胶等工艺,当图案化的材质为有机材质时,“图案化”包括掩模曝光、显影等工艺,本文中所说的蒸镀、沉积、涂覆、涂布等均是相关技术中成熟的制备工艺。The preparation process of the display substrate according to the embodiment of the present disclosure will be described below with reference to the embodiments of FIG. 8 and FIG. 9 . It can be understood that the "patterning" mentioned in this article, when the patterned material is an inorganic material or metal, includes coating of photoresist, mask exposure, development, etching, and stripping lithography. Glue and other processes. When the patterned material is an organic material, "patterning" includes mask exposure, development and other processes. The evaporation, deposition, coating, coating, etc. mentioned in this article are all mature in related technologies. Preparation Process.
显示基板的制备过程可以包括如下步骤。The preparation process of the display substrate may include the following steps.
在衬底11的一侧形成第一栅线121、第二栅线122以及薄膜晶体管的栅电极。如图8和图9所示,该过程可以包括:在衬底11的一侧形成第一金属薄膜,对第一金属薄膜进行图案化处理,在预设位置形成第一栅线121、第二栅线122和薄膜晶体管的栅电极。第一栅线121、第二栅线122和薄膜晶体管的栅电极所在的层为第一导电层。The first gate line 121, the second gate line 122 and the gate electrode of the thin film transistor are formed on one side of the substrate 11. As shown in FIGS. 8 and 9 , the process may include: forming a first metal film on one side of the substrate 11 , patterning the first metal film, and forming the first gate line 121 and the second gate line 121 at a preset position. The gate line 122 and the gate electrode of the thin film transistor. The layer where the first gate line 121, the second gate line 122 and the gate electrode of the thin film transistor are located is the first conductive layer.
在第一导电层的背离衬底11的一侧形成第二绝缘层13,如图8和图9所示。The second insulating layer 13 is formed on the side of the first conductive layer facing away from the substrate 11, as shown in FIGS. 8 and 9.
在第二绝缘层13的背离衬底11的一侧形成薄膜晶体管的有源层。图8和图9中未示出有源层。An active layer of the thin film transistor is formed on a side of the second insulating layer 13 facing away from the substrate 11 . The active layer is not shown in Figures 8 and 9.
在有源层的背离衬底11的一侧形成第一补偿走线171a、数据线141、薄膜晶体管的源电极和漏电极以及像素电极142。如图8和图9所示,该步骤可以包括:在有源层的背离衬底11的一侧形成第二金属薄膜,对第二金属薄膜进行图案化处理,在预设位置形成第一补偿走线171a、数据线141以及薄膜晶体管的源电极和漏电极;在第一补偿走线171a、数据线141的背离衬底11的一侧形成像素电极142薄膜,对像素电极142薄膜进行图案化处理,在预设位置形成像素电极142,像素电极142位于子像素所在的区域。像素电极142在衬底11上的正投影与第一补偿走线171a、数据线141在衬底11上的正投影均不交叠。像素电极142可以与源电极和漏电极中的一个连接。第一补偿走线171a、数据线141、薄膜晶体管的源电极和漏电极以及像素电极142所在的层为第二导电层。 The first compensation wiring 171a, the data line 141, the source and drain electrodes of the thin film transistor, and the pixel electrode 142 are formed on a side of the active layer facing away from the substrate 11. As shown in FIGS. 8 and 9 , this step may include: forming a second metal film on a side of the active layer facing away from the substrate 11 , patterning the second metal film, and forming a first compensation film at a preset position. The wiring 171a, the data line 141, and the source and drain electrodes of the thin film transistor; form a pixel electrode 142 film on the side of the first compensation wiring 171a, the data line 141 away from the substrate 11, and pattern the pixel electrode 142 film Processing, the pixel electrode 142 is formed at a preset position, and the pixel electrode 142 is located in the area where the sub-pixel is located. The orthographic projection of the pixel electrode 142 on the substrate 11 does not overlap with the orthographic projection of the first compensation line 171 a and the data line 141 on the substrate 11 . The pixel electrode 142 may be connected to one of the source electrode and the drain electrode. The layer where the first compensation line 171a, the data line 141, the source electrode and the drain electrode of the thin film transistor and the pixel electrode 142 are located is the second conductive layer.
在第二导电层的背离衬底11的一侧形成第一绝缘层15,第一绝缘层15开设有第一过孔41和第二过孔42,第一补偿走线171a通过第一过孔41和第二过孔42暴露。A first insulating layer 15 is formed on the side of the second conductive layer facing away from the substrate 11. The first insulating layer 15 is provided with a first via hole 41 and a second via hole 42. The first compensation trace 171a passes through the first via hole. 41 and the second via hole 42 are exposed.
在第一绝缘层15的背离衬底11的一侧形成公共电极层16,公共电极层16通过第一过孔41和第二过孔42与第一补偿走线171a连接,如图8和图9所示。A common electrode layer 16 is formed on the side of the first insulating layer 15 facing away from the substrate 11 . The common electrode layer 16 is connected to the first compensation trace 171 a through the first via hole 41 and the second via hole 42 , as shown in FIG. 8 and FIG. 9 shown.
在示例性实施例中,第一绝缘层、第二绝缘层、第三绝缘层可以采用硅氧化物(SiOx)、硅氮化物(SiNx)和氮氧化硅(SiON)中的任意一种或更多种,可以是单层、多层或复合层。栅电极、源电极、漏电极、栅线、数据线、电极补偿层可以采用金属材料,如银(Ag)、铜(Cu)、铝(Al)、钛(Ti)和钼(Mo)中的任意一种或更多种,或上述金属的合金材料,如铝钕合金(AlNd)或钼铌合金(MoNb),可以是单层结构,或者多层复合结构,如Ti/Al/Ti等。有源层可以采用非晶态氧化铟镓锌材料(a-IGZO)、氮氧化锌(ZnON)、氧化铟锌锡(IZTO)、非晶硅(a-Si)、多晶硅(p-Si)、六噻吩、聚噻吩等各种材料,即本公开适用于基于氧化物Oxide技术、硅技术以及有机物技术制造的晶体管。像素电极和公共电极层可以采用透明导电材料,例如氧化铟锡(ITO)或氧化铟锌(IZO)等。In an exemplary embodiment, the first insulating layer, the second insulating layer, and the third insulating layer may be made of any one of silicon oxide (SiOx), silicon nitride (SiNx), silicon oxynitride (SiON), or more. Various, can be single layer, multi-layer or composite layer. The gate electrode, source electrode, drain electrode, gate line, data line, and electrode compensation layer can be made of metal materials, such as silver (Ag), copper (Cu), aluminum (Al), titanium (Ti), and molybdenum (Mo). Any one or more, or alloy materials of the above metals, such as aluminum-neodymium alloy (AlNd) or molybdenum-niobium alloy (MoNb), can be a single-layer structure, or a multi-layer composite structure, such as Ti/Al/Ti, etc. The active layer can use amorphous indium gallium zinc oxide materials (a-IGZO), zinc oxynitride (ZnON), indium zinc tin oxide (IZTO), amorphous silicon (a-Si), polycrystalline silicon (p-Si), Various materials such as hexathiophene and polythiophene, that is, the present disclosure is applicable to transistors manufactured based on oxide Oxide technology, silicon technology, and organic technology. The pixel electrode and the common electrode layer can use transparent conductive materials, such as indium tin oxide (ITO) or indium zinc oxide (IZO).
基于前述实施例的发明构思,本公开实施例还提供了一种显示装置,该显示装置包括本公开实施例中的显示基板。显示装置可以为:手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。Based on the inventive concepts of the foregoing embodiments, embodiments of the disclosure further provide a display device, which includes the display substrate in the embodiments of the disclosure. The display device can be: a mobile phone, a tablet computer, a television, a monitor, a laptop, a digital photo frame, a navigator, or any other product or component with a display function.
示例性地,显示装置可以为液晶显示装置。显示装置还可以包括彩膜基板,彩膜基板上设置有黑矩阵,在彩膜基板与显示基板对盒的情况下,第一补偿走线中的第二延伸段、第三延伸段或第四延伸段在衬底上的正投影可以均位于黑矩阵在衬底上的的正投影范围内。Exemplarily, the display device may be a liquid crystal display device. The display device may further include a color filter substrate, and a black matrix is provided on the color filter substrate. When the color filter substrate and the display substrate are paired, the second extension section, the third extension section or the fourth extension section in the first compensation line The orthographic projections of the extension sections on the substrate may all be located within the orthographic projection range of the black matrix on the substrate.
在本说明书的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或 位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本公开和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本公开的限制。In the description of this specification, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", ""Back","Left","Right","Vertical","Horizontal","Top","Bottom","Inside","Outside","Clockwise","Counterclockwise","Axis" , "radial", "circumferential" and other indicated directions or The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present disclosure and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, Therefore, it is not to be construed as a limitation on the present disclosure.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者多个该特征。在本公开的描述中,“多个”的含义是两个或两个以上,除非另有明确的限定。In addition, the terms “first” and “second” are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of indicated technical features. Therefore, features defined as “first” and “second” may explicitly or implicitly include one or more of these features. In the description of the present disclosure, "plurality" means two or more, unless otherwise expressly limited.
在本公开中,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接,还可以是通信;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据情况理解上述术语在本公开中的含义。In this disclosure, unless otherwise explicitly stated and limited, the terms "installation", "connection", "connection", "fixing" and other terms should be understood in a broad sense. For example, it can be a fixed connection or a detachable connection. , or integrated; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, or an internal connection between two elements or an interaction between two elements . For those of ordinary skill in the art, the meanings of the above terms in this disclosure can be understood according to the circumstances.
在本公开中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度小于第二特征。In this disclosure, unless otherwise expressly stated and limited, a first feature "on" or "below" a second feature may include the first and second features in direct contact, or may include the first and second features. Not in direct contact but through additional characteristic contact between them. Furthermore, the terms "above", "above" and "above" a first feature on a second feature include the first feature being directly above and diagonally above the second feature, or simply mean that the first feature is higher in level than the second feature. “Below”, “below” and “beneath” the first feature of the second feature includes the first feature being directly above and diagonally above the second feature, or simply means that the first feature has a smaller horizontal height than the second feature.
上文的公开提供了许多不同的实施方式或示例用来实现本公开的不同结构。为了简化本公开,上文中对特定示例的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本公开。此外,本公开可以在不同示例中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。The above disclosure provides many different embodiments or examples for implementing different structures of the present disclosure. To simplify the present disclosure, the components and arrangements of specific examples are described above. Of course, they are merely examples and are not intended to limit the disclosure. Furthermore, this disclosure may repeat reference numbers and/or reference letters in different examples, such repetition being for purposes of simplicity and clarity and does not by itself indicate a relationship between the various embodiments and/or arrangements discussed.
以上,仅为本公开的示例性实施方式,但本公开的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本公开揭露的技术范围内,可轻易想到其各种变化或替换,这些都应涵盖在本公开的保护范围之内。因此,本公开的保护范围应以权利要求的保护范围为准。 The above are only exemplary embodiments of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person familiar with the technical field can easily think of various changes or replacements within the technical scope of the present disclosure. , these should be covered by the protection scope of this disclosure. Therefore, the protection scope of the present disclosure should be subject to the protection scope of the claims.

Claims (14)

  1. 一种显示基板,包括衬底以及位于所述衬底的一侧且呈M行N组排列的多个子像素,每组子像素包括两列子像素,所示显示基板还包括M对栅线,M对栅线与M行子像素一一对应,一对栅线包括沿第一方向延伸的第一栅线和第二栅线,所述第一栅线和所述第二栅线分别设置在对应行子像素的相对两侧且位于相邻两行子像素之间,所述第一方向为行所在的方向;A display substrate includes a substrate and a plurality of sub-pixels located on one side of the substrate and arranged in M rows and N groups. Each group of sub-pixels includes two columns of sub-pixels. The display substrate also includes M pairs of gate lines, M A pair of gate lines corresponds one to one to M rows of sub-pixels. A pair of gate lines includes a first gate line and a second gate line extending along a first direction. The first gate line and the second gate line are respectively arranged at corresponding Opposite sides of the row of sub-pixels and located between two adjacent rows of sub-pixels, and the first direction is the direction of the row;
    所述显示基板还包括N条数据线,每条数据线与相邻两组子像素相对应,与同一条数据线相对应的相邻两组子像素分别为第一组子像素和第二组子像素,所述第一组子像素中的奇数行子像素的像素电极与对应的所述数据线连接,所述第二组子像素中的偶数行子像素的像素电极与对应的所述数据线连接;The display substrate also includes N data lines. Each data line corresponds to two adjacent groups of sub-pixels. The adjacent two groups of sub-pixels corresponding to the same data line are respectively a first group of sub-pixels and a second group of sub-pixels. sub-pixels, the pixel electrodes of the odd-numbered rows of sub-pixels in the first group of sub-pixels are connected to the corresponding data lines, and the pixel electrodes of the even-numbered rows of sub-pixels in the second group of sub-pixels are connected to the corresponding data lines. line connection;
    所述显示基板还包括设置在所述衬底一侧的电极补偿层和公共电极层,所述电极补偿层和所述公共电极层之间设置有第一绝缘层,所述电极补偿层包括多个第一补偿走线,多个所述第一补偿走线与一行子像素相对应,所述第一补偿走线位于相邻两条数据线之间且位于对应行子像素中的相邻两列子像素之间,所述第一补偿走线通过贯穿所述第一绝缘层的第一过孔与所述公共电极层连接。The display substrate also includes an electrode compensation layer and a common electrode layer disposed on one side of the substrate. A first insulating layer is disposed between the electrode compensation layer and the common electrode layer. The electrode compensation layer includes a plurality of A plurality of first compensation lines corresponds to a row of sub-pixels, and the first compensation lines are located between two adjacent data lines and between two adjacent sub-pixels in the corresponding row. Between columns of sub-pixels, the first compensation line is connected to the common electrode layer through a first via hole penetrating the first insulation layer.
  2. 根据权利要求1所述的显示基板,其中,多个所述第一补偿走线在所述电极补偿层中彼此不连通。The display substrate according to claim 1, wherein a plurality of the first compensation traces are not connected to each other in the electrode compensation layer.
  3. 根据权利要求2所述的显示基板,其中,所述第一过孔位于所述第一补偿走线的一端,所述第一过孔在所述衬底上的正投影位于相邻两行子像素的相邻两个栅线在所述衬底上的正投影之间,所述第一补偿走线包括第一延伸段和第二延伸段,所述第一延伸段位于相邻两个子像素之间,所述第二延伸段连接所述第一延伸段和所述第一过孔,所述第一过孔与所述第一延伸段的延长线不存在交叠区域。The display substrate according to claim 2, wherein the first via hole is located at one end of the first compensation trace, and the orthographic projection of the first via hole on the substrate is located in two adjacent rows. Between the orthographic projections of two adjacent gate lines of a pixel on the substrate, the first compensation line includes a first extension section and a second extension section, and the first extension section is located at two adjacent sub-pixels. The second extension section connects the first extension section and the first via hole, and there is no overlapping area between the first via hole and the extension line of the first extension section.
  4. 根据权利要求3所述的显示基板,还包括贯穿所述第一绝缘层的第二过孔,所述第一补偿走线的另一端通过所述第二过孔与所述公共电极层连接,所述第二过孔在所述衬底上的正投影位于相邻两行子像素的相邻两个栅线在所述衬底上的正投影之间,所述第一补偿走线还包括第三延伸段,所述第三 延伸段连接所述第一延伸段和所述第二过孔,所述第二过孔与所述第一延伸段的延长线不存在交叠区域。The display substrate according to claim 3, further comprising a second via hole penetrating the first insulating layer, and the other end of the first compensation line is connected to the common electrode layer through the second via hole, The orthographic projection of the second via hole on the substrate is located between the orthographic projections of two adjacent gate lines of two adjacent rows of sub-pixels on the substrate, and the first compensation trace also includes The third extension section, the third The extension section connects the first extension section and the second via hole, and there is no overlapping area between the second via hole and the extension line of the first extension section.
  5. 根据权利要求3所述的显示基板,还包括预设遮光区,所述第二延伸段位于所述预设遮光区内。The display substrate according to claim 3, further comprising a preset light-shielding area, and the second extension section is located in the preset light-shielding area.
  6. 根据权利要求1所述的显示基板,其中,所述第一补偿走线包括第一延伸段,所述第一延伸段位于相邻两个子像素之间且沿第二方向延伸,所述第一过孔在所述衬底上的正投影位于相邻两行子像素之间,所述第一过孔在所述衬底上的正投影与所述第一延伸段在所述衬底上的正投影至少部分交叠。The display substrate according to claim 1, wherein the first compensation trace includes a first extension section, the first extension section is located between two adjacent sub-pixels and extends along the second direction, and the first extension section The orthographic projection of the via hole on the substrate is located between two adjacent rows of sub-pixels, and the orthographic projection of the first via hole on the substrate is consistent with the orthographic projection of the first extension section on the substrate. Orthographic projections at least partially overlap.
  7. 根据权利要求6所述的显示基板,其中,所述第一补偿走线还包括第四延伸段,所述第四延伸段位于相邻两行子像素之间,所述第四延伸段与所述第一延伸段不平行,所述第一过孔在所述衬底上的正投影与所述第四延伸段在所述衬底上的正投影至少部分交叠。The display substrate according to claim 6, wherein the first compensation trace further includes a fourth extension section, the fourth extension section is located between two adjacent rows of sub-pixels, the fourth extension section is connected to the The first extension section is not parallel, and the orthographic projection of the first via hole on the substrate at least partially overlaps the orthographic projection of the fourth extension section on the substrate.
  8. 根据权利要求6所述的显示基板,还包括贯穿所述第一绝缘层的第三过孔,所述第三过孔位于所述第一延伸段的远离所述第一过孔的一端,所述第三过孔在所述衬底上的正投影位于相邻两个子像素之间且位于对应行子像素的两条栅线在所述衬底上的正投影之间。The display substrate according to claim 6, further comprising a third via hole penetrating the first insulating layer, the third via hole being located at an end of the first extension section away from the first via hole, so The orthographic projection of the third via hole on the substrate is located between two adjacent sub-pixels and between the orthographic projections of the two gate lines of the corresponding row of sub-pixels on the substrate.
  9. 根据权利要求1-8中任一项所述的显示基板,其中,所述电极补偿层与所述数据线位于同一层。The display substrate according to any one of claims 1 to 8, wherein the electrode compensation layer and the data line are located on the same layer.
  10. 根据权利要求2所述的显示基板,还包括在所述衬底的一侧依次设置的第一导电层、第二绝缘层、第二导电层、所述第一绝缘层和所述公共电极层,所述电极补偿层和所述栅线位于所述第一导电层,所述数据线位于所述第二导电层,所述第一补偿走线包括第一延伸段,所述第一延伸段位于相邻两个子像素之间且沿第二方向延伸,所述第一延伸段位于对应行子像素的两条栅线之间,所述第一过孔在所述衬底上的正投影位于相邻两个子像素之间且位于对应行子像素的两条栅线在所述衬底上的正投影之间,所述第一过孔的数量为至少一个,所述第一过孔贯穿所述第二绝缘层和所述第一绝缘层,所述第一延伸段通过所述至少一个第一过孔与所述公共电极层连接。The display substrate according to claim 2, further comprising a first conductive layer, a second insulating layer, a second conductive layer, the first insulating layer and the common electrode layer arranged in sequence on one side of the substrate , the electrode compensation layer and the gate line are located on the first conductive layer, the data line is located on the second conductive layer, the first compensation line includes a first extension section, the first extension section The first extension section is located between two adjacent sub-pixels and extends along the second direction. The first extension section is located between two gate lines corresponding to the row of sub-pixels. The orthographic projection of the first via hole on the substrate is located at Between two adjacent sub-pixels and between the orthographic projections of the two gate lines of the corresponding row of sub-pixels on the substrate, the number of the first via holes is at least one, and the first via holes penetrate all The second insulating layer and the first insulating layer are connected to the common electrode layer through the at least one first via hole.
  11. 根据权利要求1所述的显示基板,其中,所述数据线包括与奇数行子像素相对应的第一部分走线以及与偶数行相对应的第二部分走线,所述第 一部分走线位于对应的第一组子像素中的相邻两列子像素之间,所述第二部分走线位于对应的第二组子像素的相邻两列子像素之间,所述数据线还包括第三部分走线,所述第三部分走线位于相邻两行子像素的相邻两条栅线之间,与相邻两行子像素相对应的所述第一部分走线和所述第二部分走线通过所述第三部分走线连接。The display substrate according to claim 1, wherein the data line includes a first portion of wiring corresponding to odd-numbered rows of sub-pixels and a second portion of wiring corresponding to even-numbered rows, and the A part of the wiring is located between two adjacent columns of sub-pixels in the corresponding first group of sub-pixels, the second part of the wiring is located between two adjacent columns of sub-pixels in the corresponding second group of sub-pixels, and the data line is also It includes a third part of wiring, the third part of wiring is located between two adjacent gate lines of two adjacent rows of sub-pixels, the first part of wiring corresponding to the two adjacent rows of sub-pixels and the The second part of the traces is connected through the third part of the traces.
  12. 根据权利要求1所述的显示基板,其中,所述数据线位于相邻两组子像素之间,所述数据线沿第二方向延伸,所述第二方向为列所在的方向。The display substrate according to claim 1, wherein the data line is located between two adjacent groups of sub-pixels, the data line extends along a second direction, and the second direction is the direction of the column.
  13. 根据权利要求1所述的显示基板,其中,每行子像素设置为多个像素单元,所述像素单元包括依次相邻的第一颜色子像素、第二颜色子像素和第三颜色子像素,同一行子像素中的第一颜色子像素的像素电极均与同一条栅线连接,同一行子像素中的第二颜色子像素的像素电极均与另一条栅线连接,同一行子像素中相邻两个像素单元中的第三颜色子像素的像素电极分别与不同的栅线连接。The display substrate according to claim 1, wherein each row of sub-pixels is configured as a plurality of pixel units, and the pixel units include sequentially adjacent first color sub-pixels, second color sub-pixels and third color sub-pixels, The pixel electrodes of the first color subpixels in the same row of subpixels are all connected to the same gate line, the pixel electrodes of the second color subpixels in the same row of subpixels are all connected to another gate line, and the pixel electrodes of the second color subpixels in the same row of subpixels are all connected to the same gate line. The pixel electrodes of the third color sub-pixels in two adjacent pixel units are respectively connected to different gate lines.
  14. 一种显示装置,包括权利要求1-13中任一项所述的显示基板。 A display device comprising the display substrate according to any one of claims 1-13.
PCT/CN2023/093801 2022-05-12 2023-05-12 Display panel and display device WO2023217261A1 (en)

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