WO2023190682A1 - Diffusion plate and device - Google Patents

Diffusion plate and device Download PDF

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Publication number
WO2023190682A1
WO2023190682A1 PCT/JP2023/012796 JP2023012796W WO2023190682A1 WO 2023190682 A1 WO2023190682 A1 WO 2023190682A1 JP 2023012796 W JP2023012796 W JP 2023012796W WO 2023190682 A1 WO2023190682 A1 WO 2023190682A1
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WO
WIPO (PCT)
Prior art keywords
microlens
microlenses
lens
shape
light
Prior art date
Application number
PCT/JP2023/012796
Other languages
French (fr)
Japanese (ja)
Inventor
光雄 有馬
正之 石渡
Original Assignee
デクセリアルズ株式会社
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Filing date
Publication date
Priority claimed from JP2023048199A external-priority patent/JP2023152876A/en
Application filed by デクセリアルズ株式会社 filed Critical デクセリアルズ株式会社
Publication of WO2023190682A1 publication Critical patent/WO2023190682A1/en

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    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00Globes; Bowls; Cover glasses
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V3/00Globes; Bowls; Cover glasses
    • F21V3/02Globes; Bowls; Cover glasses characterised by the shape
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21YINDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00Light-generating elements of semiconductor light sources
    • F21Y2115/10Light-emitting diodes [LED]
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21YINDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00Light-generating elements of semiconductor light sources
    • F21Y2115/30Semiconductor lasers

Definitions

  • the present invention relates to a diffuser plate and a device.
  • a diffusion plate In order to change the light diffusion characteristics, a diffusion plate is used to diffuse incident light in a desired direction. Diffusion plates are widely used in various devices such as display devices such as displays, projection devices such as projectors, and various lighting devices. There is a type of diffuser plate that uses light refraction caused by the surface shape of the diffuser plate to diffuse incident light at a desired diffusion angle. As this type of diffusion plate, a microlens array type diffusion plate in which a plurality of microlenses each having a size of about several tens of micrometers are arranged is known.
  • Such a microlens array type diffuser plate has a problem in that as a result of interference between the wavefronts of light from each microlens, diffraction waves are generated due to the periodic structure of the microlens array, causing unevenness in the intensity distribution of the diffused light. For this reason, techniques have been proposed to reduce unevenness in the intensity distribution of diffused light due to interference and diffraction by varying the arrangement of microlenses, the shape of lens surfaces, and the shape of apertures.
  • Patent Document 1 discloses that a plurality of microlenses are randomly arranged using a honeycomb structure as a basic pattern.
  • a plurality of microlenses are randomly arranged on the surface of a diffuser plate such that the apex position of each microlens is located within a predetermined circle centered on the apex position in the basic pattern. .
  • Patent Document 2 discloses that the cross-sectional shapes and heights of the vertices of a plurality of microlenses arranged in a grid on the main surface of a diffuser plate are different from each other, and the surface shape of each microlens does not have an axis of symmetry. It is disclosed that the shape is
  • Patent Document 3 discloses that by providing a difference in the height of the vertices of a plurality of regularly arranged microlenses, the diffusion angle distribution of transmitted light from each microlens is approximately the same and is within a certain range. Microlenses having mutually different phase differences are disclosed.
  • microlenses are formed such that the bottoms of a plurality of microlenses (concavities) are at two or more different positions in the depth direction, and the bottoms of the microlenses are arranged irregularly.
  • the pattern exists within a predetermined circle based on the center point of the regular arrangement pattern.
  • Patent Document 5 discloses arranging a plurality of microlenses based on a reference lattice while displacing the position of the apex of the microlens to the vicinity of a lattice point of the reference lattice structure.
  • Patent No. 4981300 International Publication 2016/051785 JP2017-009669
  • Patent No. 6680455 International Publication 2015/182619
  • a plurality of microlenses are arranged at irregular planar positions on the surface of the diffuser plate (on the XY plane), or a plurality of microlenses are arranged regularly
  • the surface shapes of the multiple lenses were irregularly varied.
  • the microlens array structure in which the planar arrangement of the lenses, the position of the lens vertices, and the surface shape of the lenses are irregularly varied can have the effect of reducing the above-mentioned unevenness in the intensity distribution of the diffused light to some extent.
  • the diffraction phenomenon of the periodic structure causes spectral diffracted light (a spectrum distributed concentrically around the optical axis of the light emitted from the diffuser plate).
  • spectral diffracted light a spectrum distributed concentrically around the optical axis of the light emitted from the diffuser plate.
  • the uniformity of the intensity of the diffused light is reduced.
  • high-intensity 0th-order diffracted light peak noise that occurs near the optical axis of the emitted light (diffusion angle is near 0 degrees)
  • it becomes difficult to appropriately disperse and distribute the diffused light There was also a problem that the light distribution of the diffused light deteriorated.
  • Patent Document 3 discloses that a raised part that gives a phase difference to a plurality of regularly arranged microlenses is continuously formed in the lens part, and this raised part is formed into a convex curved surface having a larger slope than the lens part or It is disclosed that the convex portion of the microlens has a concave curved surface and the difference between the maximum height and the minimum height of the convex portion of the microlens is controlled within a predetermined range.
  • the raised portion of the microlens is configured with an inclined convex curved surface or concave curved surface as in Patent Document 3, the cutoff property and uniformity of the diffused light distribution may deteriorate, and the local There were problems with small brightness changes (unevenness) and flickering.
  • the present invention has been made in view of the above circumstances, and an object of the present invention is to solve new variations in the microlens array structure even when a plurality of microlenses are regularly arranged.
  • an object of the present invention is to solve new variations in the microlens array structure even when a plurality of microlenses are regularly arranged.
  • the effect of suppressing unnecessary diffracted light including spectral diffracted light and 0th order diffracted light is further enhanced, and the diffused light
  • the objective is to further improve the homogeneity and light distribution of the light.
  • base material and a microlens array composed of a plurality of microlenses arranged on an XY plane on at least one surface of the base material; Equipped with The surface shape of each microlens has a preset reference surface shape, The plurality of microlenses are regularly arranged on the XY plane, Each of the microlenses is arranged at a position randomly shifted in the Z direction from a reference position in the Z direction perpendicular to the XY plane, A diffusion plate is provided at a boundary between the plurality of microlenses that are adjacent to each other, and the step in the Z direction is present.
  • the step may be made of a flat surface perpendicular to the XY plane.
  • the shift amount ⁇ s of each microlens in the Z direction may vary randomly within a predetermined variation width ⁇ S.
  • the fluctuation range ⁇ S of the shift amount ⁇ s may satisfy the following formula (5).
  • the fluctuation range ⁇ S of the shift amount ⁇ s may satisfy the following formula (6).
  • the fluctuation width ⁇ S of the shift amount ⁇ s may substantially satisfy the following formula (7).
  • is the wavelength of the incident light [ ⁇ m]
  • n is the refractive index of the material forming the microlens array
  • the fluctuation width ⁇ S [ ⁇ m] of the shift amount ⁇ s may satisfy the following formula (1).
  • the fluctuation width ⁇ S [ ⁇ m] of the shift amount ⁇ s may substantially satisfy the following formula (2).
  • the plurality of microlenses may be arranged with no gaps between them, and there may be no flat portion at the boundary between the plurality of mutually adjacent microlenses.
  • the surface shapes of the plurality of microlenses may be the same.
  • each microlens may be an aspherical shape or a spherical shape having an axis of symmetry.
  • the microlens may be a cylindrical lens.
  • the optical axis of at least some of the plurality of microlenses may be inclined with respect to the Z direction at an inclination angle ⁇ of more than 0° and less than 60°.
  • the inclination angles ⁇ of the optical axes of the plurality of microlenses are different from each other,
  • the inclination angle ⁇ may vary randomly within a predetermined variation range with respect to a predetermined reference inclination angle ⁇ k.
  • the reference opening of the reference surface shape may be circular, oval, or polygonal including square, rectangle, diamond, or hexagon.
  • the material forming the microlens array may be glass, resin, or semiconductor.
  • an apparatus that includes the above diffusion plate.
  • the diffused light from the plurality of lenses can be irregularly arranged.
  • the effect of suppressing unnecessary diffracted light including spectral diffracted light, zero-order diffracted light, etc. can be further enhanced, and the homogeneity and light distribution of diffused light can be further improved.
  • FIG. 1 is a plan view and an enlarged view schematically showing a diffusion plate according to an embodiment of the present invention.
  • FIG. 2 is an enlarged plan view and an enlarged cross-sectional view schematically showing the configuration of a diffuser plate according to the same embodiment.
  • FIG. 3 is an enlarged cross-sectional view schematically showing the vicinity of the boundary of the microlens according to the same embodiment.
  • FIG. 3 is a plan view schematically showing the planar shape (outer shape) of the microlens according to the same embodiment.
  • FIG. 3 is an enlarged perspective view showing the surface of the microlens array according to the same embodiment.
  • FIG. 7 is an explanatory diagram showing a manner in which the height of the apex of each microlens changes due to a change in the lens surface shape and a lens shift according to the same embodiment.
  • FIG. 3 is a plan view showing a reference aperture width and an effective aperture width according to the same embodiment. It is a schematic diagram which shows the aspect which inclines the optical axis of the microlens based on the same embodiment.
  • FIG. 3 is a schematic diagram showing a deflection function of a microlens according to the same embodiment.
  • FIG. 3 is an explanatory diagram showing a planar shape of an anamorphic microlens according to the same embodiment.
  • FIG. 3 is a perspective view showing the three-dimensional shape of an anamorphic microlens according to the same embodiment.
  • FIG. 3 is an explanatory diagram showing a planar shape of a torus-shaped microlens according to the same embodiment.
  • FIG. 2 is a perspective view showing the three-dimensional shape of a torus-shaped microlens according to the same embodiment.
  • FIG. 3 is a perspective view showing a torus-shaped curved surface according to the same embodiment. It is a flowchart which shows the design method of the microlens based on the same embodiment.
  • FIG. 3 is a plan view showing the arrangement of lens center coordinates of the microlens according to the same embodiment.
  • FIG. 3 is a plan view showing the arrangement of microlenses having a rotationally symmetrical aspherical shape according to the same embodiment.
  • FIG. 3 is a perspective view showing a microlens having a rotationally asymmetric aspherical shape according to the same embodiment.
  • FIG. 3 is a perspective view showing a method for determining the surface shape of a microlens according to the same embodiment.
  • FIG. 6 is an explanatory diagram showing a method for adjusting the lens surface height of the microlens according to the same embodiment.
  • FIG. 6 is an explanatory diagram showing a method for adjusting the lens surface height of the microlens according to the same embodiment. It is a flowchart which shows the manufacturing method of the diffuser plate based on the same embodiment.
  • FIG. 3 is an explanatory diagram regarding a diffuser plate according to Comparative Example 1.
  • FIG. 3 is an explanatory diagram regarding a diffuser plate according to Example 1.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 2.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 3.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 4.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 5.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 6.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 7.
  • FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 8.
  • FIG. 7 is an explanatory diagram regarding a diffusion plate according to Example 9.
  • the diffusion plate 1 is a microlens array type diffusion plate that has a function of uniformly diffusing light.
  • the diffusion plate 1 includes a base material 10 and a microlens array 20 formed on an XY plane on at least one surface (principal surface) of the base material 10.
  • the microlens array 20 is composed of a plurality of microlenses 21 regularly arranged on the XY plane.
  • the microlens 21 has a convex structure (convex lens) or a concave structure (concave lens) having a light diffusion function, and has an aperture width D (also referred to as a lens diameter or aperture diameter) of about several tens of ⁇ m, for example, and an aperture width D of about several tens of ⁇ m. It has a radius of curvature R of approximately Note that the diffusion plate 1 may be a transmission type diffusion plate that transmits incident light, or a reflection type diffusion plate that reflects incident light, as long as it is equipped with the microlens array 20. It's okay.
  • the plurality of microlenses 21 are regularly arranged on the XY plane of the base material 10.
  • each microlens 21 has a regular hexagonal planar shape (aperture shape), and the plurality of microlenses 21 are arranged in a hexagonal lattice shape on the XY plane of the base material 10. are normally arranged.
  • the plurality of microlenses 21 may be regularly arranged based on various reference lattices other than the hexagonal lattice, such as a square lattice, a rectangular lattice, a triangular lattice, or other polygonal lattices.
  • “regularly arranged” means substantially regularly arranged.
  • “Substantially regularly arranged” means, for example, not only when perfectly aligned with the reference grid and normally arranged, but also within a minute error (for example, ⁇ 1% placement error). , including the case where the grid is shifted from the reference grid.
  • the surface shape (three-dimensional shape) of each microlens 21 has a spherical shape or an aspherical shape.
  • Each microlens 21 is a spherical lens or an aspherical lens.
  • the surface shape of each microlens 21 (hereinafter sometimes referred to as "lens surface shape") has a predetermined reference surface shape set in advance.
  • the surface shape of each microlens 21 preferably matches, for example, the reference surface shape, and as a result, it is preferable that the plurality of microlenses 21 have the same surface shape.
  • each microlens 21 may be substantially the same as the reference surface shape.
  • the surface shape of each microlens 21 may be a shape that varies within a minute error (for example, a shape error of ⁇ 1%) with respect to the reference surface shape.
  • the surface shape of each microlens 21 may be such that the positional shift of the lens apex with respect to the reference surface shape is 5 ⁇ m or less, preferably 0.1 ⁇ m or less. In this way, the surface shapes of the plurality of microlenses 21 may be completely the same shape, or may be substantially the same shape within the range of the above-mentioned shape error.
  • the planar shape of the aperture of the reference surface shape of the microlens 21 (the shape of the reference aperture) is a regular hexagon, but is not limited to this example, and may be circular, circular, etc. It may be an ellipse, or a polygonal shape including a square, rectangle, diamond, or hexagon.
  • the plurality of microlenses 21 having substantially the same surface shape are substantially regularly arranged on the XY plane of the base material 10. This makes it possible to take advantage of the regularly arranged microlenses 21. For example, when a plurality of microlenses having different surface shapes are arranged irregularly, there is a problem that brightness unevenness or flickering occurs for each microlens. In addition, when the surface shape of the microlens is randomly varied, the diffusion angle of the diffused light emitted from each microlens varies, which causes a problem that the cutoff property of the entire diffused light decreases.
  • the plurality of microlenses 21 having substantially the same surface shape are arranged substantially regularly, uneven brightness and flickering of each microlens 21 can be prevented. It can be significantly reduced. Further, since the diffusion angles of the diffused light emitted from the plurality of microlenses 21 can be made substantially the same, the cutoff property of the entire diffused light can be improved.
  • each microlens 21 is positioned at a position randomly shifted in the Z direction from a reference position in the Z direction perpendicular to the XY plane of the base material 10. It is located.
  • the shift amount ⁇ s of each microlens in the Z direction varies randomly within a predetermined variation width ⁇ S. Therefore, the plurality of microlenses 21 are shifted in the Z direction by mutually different shift amounts ⁇ s.
  • a step 23 in the Z direction exists at the boundary between the plurality of microlenses 21 adjacent to each other on the XY plane.
  • the microlenses 21 according to the present embodiment are arranged regularly on the XY plane, but at positions shifted in the Z direction by a random shift amount ⁇ s.
  • shifting the microlens 21 in the Z direction does not mean changing the surface shape of the microlens 21 in the Z direction, but moving the surface shape of the microlens 21 in parallel in the Z direction (from the reference position in the Z direction). (to move up and down in the Z direction).
  • shifting the microlens 21 in the Z direction by the shift amount ⁇ s it is possible to impart a phase difference corresponding to the shift amount ⁇ s to the diffused light emitted from the microlens 21.
  • This shift of the microlens 21 in the Z direction is a new variable element that does not exist in the past as a variable element of the microlens array structure.
  • the microlens array 20 according to this embodiment combines the above-described random shift of the microlenses 21 in the Z direction with a regular arrangement of a plurality of microlenses 21 having substantially the same lens surface shape. It is characterized by
  • the advantages of the plurality of regularly arranged microlenses 21 (the effect of reducing brightness unevenness and flickering for each lens described above, and the cutoff property While taking advantage of the improvement, etc.), unnecessary diffracted light (spectral diffracted light, zero-order diffracted light, etc.) generated due to the periodic structure of the regularly arranged lenses is removed in the Z direction of the microlens 21. can be suitably suppressed by shifting .
  • the plurality of microlenses 21 are arranged such that, for example, on the XY plane, the amount of overlap Ov between the plurality of mutually adjacent microlenses 21 falls within a preset tolerance range. They may be arranged at regular positions, overlapping each other. Furthermore, as shown in FIGS. 2 and 5, on the XY plane of the base material 10, the plurality of microlenses 21 are arranged without any gaps between them, and the boundaries between the plurality of mutually adjacent microlenses 21 are flat. Preferably, no part is present. That is, the filling rate of the microlenses 21 on the XY plane of the base material 10 is preferably 100%.
  • the surface of the diffuser plate 1 is occupied by the uneven structure of the plurality of randomly arranged microlenses 21, and no flat portion exists. Therefore, the incident light on the diffuser plate 1 is transmitted or reflected by the lens surface of one of the microlenses 21 and refracted, so that the zero-order transmitted light passes through the flat part of the base material 10 without being refracted. Components can be suppressed. Therefore, by imparting an irregular phase difference to the diffused light emitted from the plurality of microlenses 21, it is possible to suppress the generation of unnecessary diffracted light and also prevent the generation of light that passes through the diffuser plate 1 without being refracted. .
  • the reference aperture width Dk is the aperture width of the reference surface shape of the microlens 21
  • the reference radius of curvature Rk is the radius of curvature of the reference surface shape of the microlens 21.
  • the reference surface shape is a lens surface shape that serves as a reference for designing the microlens 21. Thereby, the surface shapes of the plurality of microlenses 21 can be matched to the predetermined reference surface shape.
  • the surface shape of each microlens 21 is a three-dimensional shape based on a preset reference surface shape.
  • the surface shape (lens surface shape) and reference surface shape of each microlens 21 are preferably aspherical or spherical with an axis of symmetry.
  • the axis of symmetry is an axis that serves as a reference for rotational symmetry or line symmetry.
  • the lens surface shape and the reference surface shape may be a three-dimensional shape that is rotationally symmetrical about the axis of symmetry, or a three-dimensional shape that is line symmetrical about a plane that includes the axis of symmetry.
  • each microlens 21 can suitably exhibit a diffusion function that can realize the uniformity and light distribution of diffused light required of the diffusion plate 1.
  • the diffusion angles of the diffused light emitted from the plurality of microlenses 21 be a predetermined angle set in advance, and that they be the same. Further, it is more effective that the diffusion angle of the diffused light emitted from the entire diffuser plate 1 according to this embodiment is, for example, in the range of 0.5° or more and 20° or less.
  • the microlenses 21 are shifted by a random shift amount ⁇ s in the Z direction, and a step 23 is formed at the boundary between the microlenses 21.
  • the outline (boundary line 24) of the planar shape of each microlens 21 is the same as that of a reference lattice such as a hexagonal lattice.
  • a reference lattice such as a hexagonal lattice.
  • it is a straight line that follows the shape. This makes it possible to suppress brightness unevenness and flickering for each microlens 21, and also to make the diffusion angles of the diffused light emitted from the plurality of microlenses 21 the same, thereby improving the cut-off performance of the entire diffused light. .
  • the optical axes 25 of at least some of the plurality of microlenses 21 may be inclined with respect to the Z direction at an inclination angle ⁇ of, for example, more than 1° and less than 60° (see FIG. 8). .
  • inclination angle
  • the surface shape of the microlens 21 can also be rotated in the tilting direction and tilted with respect to the Z direction.
  • the emitted light (diffused light) that passes through the diffuser plate 1 and is diffused can be deflected in a direction different from the normal refraction effect of the diffuser plate. Due to the deflection effect of the diffuser plate 1, the luminous flux of the emitted light can be bent in a desired direction.
  • the inclination angles ⁇ of the optical axes 25 of the plurality of microlenses 21 are different from each other.
  • the arrangement of the plurality of microlenses 21 on the XY plane and the aperture of each microlens 21 are Multiple types of variable factors such as the width D and radius of curvature R, the height h of the lens apex, the lens planar shape, the diffusion angle, the inclination angle ⁇ of the optical axis 25, etc. are adjusted to a minute value that does not deviate from the regular arrangement of the microlenses 21. It may be varied randomly within the range. Thereby, the microlens array structure can be more randomly varied using various variable elements.
  • the microlens 21 is not limited to the example of a spherical or aspherical lens as described above, but may be a cylindrical lens (not shown).
  • a plurality of microlenses 21 made up of cylindrical lenses may be regularly arranged on the XY plane of the base material 10 so as to extend in mutually parallel directions (for example, the X direction or the Y direction).
  • anisotropy can be imparted to the diffusion direction of the diffusion plate 1 including a plurality of cylindrical lenses.
  • the present embodiment it is possible to realize a three-dimensional surface structure of the microlens array 20 with high randomness, so that the superposition state of the phases of the diffused lights emitted from the plurality of microlenses 21 can be controlled. be able to. That is, according to the present embodiment, while a plurality of microlenses 21 having the same lens surface shape are regularly arranged, each microlens 21 is randomly shifted in the Z direction, and mutually adjacent microlenses 21, A vertical step 23 is provided between 21. As a result, even if a plurality of microlenses 21 having the same lens surface shape are arranged regularly, an irregular phase difference can be imparted to the diffused light from the plurality of microlenses 21.
  • the diffuser plate 1 achieves a brightness characteristic with high transmittance, satisfies the homogeneity of the light distribution of the diffused light, and realizes the brightness distribution of the diffused light with an effective cutoff property. You can also.
  • FIG. 1 is a plan view and an enlarged view schematically showing a diffusion plate 1 according to this embodiment.
  • the diffusion plate 1 is a microlens array type diffusion plate in which a microlens array 20 consisting of a plurality of microlenses 21 (single lenses) is arranged on a base material 10.
  • the microlens array of the diffuser plate 1 is composed of a plurality of unit cells 3, as shown in FIG.
  • the unit cell 3 is a basic arrangement pattern of the microlenses 21.
  • a plurality of microlenses 21 are arranged on the surface of each unit cell 3 in a predetermined layout pattern (arrangement pattern).
  • FIG. 1 shows an example in which the shape of the unit cells 3 constituting the microlens array 20 of the diffuser plate 1 is rectangular, particularly square.
  • the shape of the unit cell 3 is not limited to the example shown in FIG. 1.
  • the shape of the unit cell 3 is not limited to the example shown in FIG. It may have any shape as long as it can be filled.
  • the unit cells 3 correspond to each unit area.
  • a plurality of square unit cells 3 are repeatedly arranged vertically and horizontally on the surface of the diffuser plate 1.
  • the number of unit cells 3 constituting the diffusion plate 1 is not particularly limited, and the diffusion plate 1 may be composed of one unit cell 3 or may be composed of a plurality of unit cells 3. It's okay.
  • unit cells 3 having mutually different surface structures may be repeatedly arranged, or unit cells 3 having the same surface structure may be repeatedly arranged.
  • the unit cells 3 are continuous in the arrangement direction of the unit cells 3 (in other words, the array arrangement direction).
  • the microlens array 20 is constructed by arranging the unit cells 3 without gaps while maintaining the continuity of the surface shape of the microlenses 21 at the boundary between a plurality of mutually adjacent unit cells 3.
  • the continuity of the surface shape of the microlens 21 refers to the microlens 21 located at the outer edge of one unit cell 3 of two mutually adjacent unit cells 3, and the one located at the outer edge of the other unit cell 3. This means that the microlenses 21 located at the outer edge are formed continuously without any deviation in planar shape or step in the height direction.
  • the unit cells 3 (basic structure) of the microlens array 20 are arranged without any gaps while maintaining the continuity of the boundaries, so that the microlens array 20 is configured. ing.
  • This prevents the occurrence of unintended problems such as diffraction, reflection, and scattering of light at the boundary between the mutually adjacent unit cells 3 and 3, thereby making it possible to obtain desired light distribution characteristics by the diffuser plate 1. can.
  • the microlens array 20 have a structure in which the unit cells 3 are repeated, the design efficiency and productivity of the microlens array 20 can be improved.
  • FIG. 2 is an enlarged plan view and an enlarged sectional view schematically showing the configuration of the diffusion plate 1 according to the present embodiment.
  • FIG. 3 is an enlarged sectional view schematically showing the vicinity of the boundary of the microlens 21 according to this embodiment.
  • FIG. 4 is a plan view schematically showing the planar shape (outer shape) of the microlens 21 when the microlens 21 is viewed in plan from a direction perpendicular to the surface of the base material 10 according to the present embodiment.
  • the diffusion plate 1 includes a base material 10 and a microlens array 20 formed on the surface of the base material 10.
  • the base material 10 is a substrate for supporting the microlens array 20.
  • the base material 10 may be in the form of a film or a plate. Further, the base material 10 may have a flat plate shape or a curved plate shape.
  • the base material 10 shown in FIG. 2 has, for example, a rectangular flat plate shape, but is not limited to this example.
  • the shape and thickness of the base material 10 may be arbitrary depending on the shape, configuration, etc. of the device in which the diffuser plate 1 is mounted.
  • the base material 10 is a transparent base material that can transmit light.
  • the base material 10 is made of a material that can be considered transparent in the wavelength band of light incident on the diffuser plate 1.
  • the base material 10 may be formed of a material having a light transmittance of 70% or more in the wavelength band of visible light.
  • the base material 10 is made of, for example, polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), polycarbonate (PC), cyclic olefin copolymer (Cy clo Olefin Copolymer: COC), cyclic olefin polymer (Cyclo It may be formed of a known resin such as Olefin Polymer (COP), triacetylcellulose (TAC), or the like.
  • the base material 10 may be formed of a known optical glass such as quartz glass, borosilicate glass, white plate glass, or the like.
  • the microlens array 20 is provided on at least one surface (principal surface) of the base material 10.
  • the microlens array 20 is an aggregate of a plurality of microlenses 21 (single lenses) arranged on the surface of the base material 10.
  • a microlens array 20 is formed on one surface (principal surface) of the base material 10.
  • the present invention is not limited to this example, and the microlens array 20 may be formed on both main surfaces (the front surface and the back surface) of the base material 10.
  • the surface of the base material 10 on which the microlens array 20 is provided may be, for example, a flat surface.
  • the flat surface of the base material 10 may be referred to as an XY plane.
  • the X direction and the Y direction in the XY plane are directions parallel to the surface of the base material 10.
  • the X direction and the Y direction are perpendicular to each other.
  • the Z direction is a direction perpendicular to the surface of the base material 10 (that is, a normal direction), and corresponds to the thickness direction of the diffusion plate 1.
  • the Z direction is perpendicular to the XY plane, the X direction, and the Y direction.
  • the microlens array 20 may be formed directly on the surface of the base material 10 itself, or may be indirectly formed on another layer laminated on the surface of the base material 10.
  • a resin layer made of an ultraviolet curable resin or the like is laminated on the surface of the base material 10 made of glass or the like, and the uneven structure of the master is transferred to this resin layer to form a microlens array. 20 may be formed.
  • the microlens 21 is, for example, a minute optical lens on the order of several tens of ⁇ m.
  • the microlens 21 constitutes a single lens of the microlens array 20.
  • the microlenses 21 may have a concave structure (concave lens) formed to recess in the thickness direction of the diffuser plate 1, or may have a convex structure (convex lens) formed to protrude in the thickness direction of the diffuser plate 1. It may be.
  • the microlens 21 may have a concave structure (convex lens) as shown in FIG. 2
  • the present invention is not limited to this example.
  • the microlens 21 may have a concave structure (concave lens).
  • the surface shape (lens surface shape) of the microlens 21 has a spherical shape or an aspherical shape.
  • the surface shape of the microlens 21 is not particularly limited as long as it has a curved shape that includes at least a spherical component or an aspherical component at least in part.
  • the surface shape of the microlens 21 may be a spherical shape including only a spherical component, an aspheric shape including only an aspherical component, or an aspherical component and a spherical component.
  • the curved surface shape may include other curved surface components.
  • the surface shape of the portion on the vertex side of the microlens 21 may be aspherical, and the surface shape of the other portion may be spherical. Further, the surface shape of the portion on the vertex side of the microlens 21 may be spherical, and the surface shape of the other portion may be aspherical.
  • the surface shape (lens surface shape) of the microlens 21 is preferably an aspherical shape or a spherical shape having an axis of symmetry.
  • the lens surface shape is preferably a three-dimensional shape that is rotationally symmetrical about an axis of symmetry or a three-dimensional shape that is axisymmetric with respect to a plane that includes the axis of symmetry.
  • the lens surface shape does not become an excessively distorted shape or an excessively irregular shape. It can suitably exhibit a diffusion function that can realize optical properties.
  • the microlens 21 may be configured with a cylindrical lens extending in a predetermined direction on the XY plane.
  • the plurality of microlenses 21 be arranged closely so as to be adjacent to each other without any gaps.
  • the plurality of microlenses 21 are arranged continuously so as to overlap each other so that there is no gap (flat part) at the boundary between the plurality of microlenses 21, 21 adjacent to each other. .
  • the plurality of microlenses 21 be arranged without gaps on the surface of the base material 10 (on the XY plane). That is, it is preferable that the microlenses 21 be arranged so that the filling rate of the microlenses 21 on the surface of the base material 10 is 100%.
  • the microlens array 20 in which the plurality of microlenses 21 are arranged adjacent to each other without gaps can further improve the diffusion performance.
  • the filling rate of the microlenses 21 on the base material 10 is preferably 90% or more, and more preferably 100%.
  • the filling rate is the ratio of the area occupied by the plurality of microlenses 21 on the surface of the base material 10 (on the XY plane). If the filling rate is 100%, most of the surface of the microlens array 20 is formed by curved surface components and contains almost no flat surface components.
  • the vicinity of the inflection point at the boundary between mutually adjacent microlenses 21, 21 is approximately flat. It could happen.
  • the width of the area near the inflection point that is approximately flat is 1 ⁇ m. It is preferable that it is below. Thereby, the zero-order transmitted light component can be sufficiently suppressed.
  • the plurality of microlenses 21 are regularly arranged along the reference grid on the XY plane.
  • regular arrangement means that there is substantial regularity in the arrangement of the microlenses 21 in any region of the microlens array 20. However, even if there is some irregularity in the arrangement of the microlenses 21 in a small area, if there is regularity in the arrangement of the microlenses in the entire arbitrary area, it is considered to be included in the "regular arrangement”. do. Note that a method for regularly arranging the microlenses 21 in the microlens array 20 according to this embodiment will be described later.
  • lens parameters such as the aperture width D and the radius of curvature R that determine the surface shape of each microlens 21 are the same as the reference aperture width Dk and the reference radius of curvature Rk of the reference surface shape set in advance, or The value is within a small shape error range with respect to the reference opening width Dk and the reference radius of curvature Rk (for example, within a range of ⁇ 1% with respect to Dk and Rk).
  • the aperture width D is the width of the aperture 27 of the microlens 21 (for example, see FIG. 8) in the X direction or the Y direction, and corresponds to the lens diameter of the microlens 21.
  • the radius of curvature R is the radius of curvature of the curved surface shape of the microlens 21 in the X direction or the Y direction.
  • each microlens 21 has substantially the same surface shape based on a predetermined reference surface shape. Furthermore, on the surface of the base material 10 (on the XY plane), the plurality of microlenses 21 are arranged densely and continuously so as to overlap each other, and the individual microlenses 21 are arranged regularly on the XY plane. It is located.
  • each microlens 21 become substantially the same as the reference surface shape.
  • the surface shapes and planar shapes of the plurality of microlenses 21 become substantially the same. Therefore, as schematically shown in FIG. 2, the plurality of microlenses 21 have a substantially constant planar shape that follows the shape of the reference lattice, such as a regular hexagon, and have symmetry.
  • the boundary line 24 between the microlenses 21A and 21B is substantially It consists only of straight lines and does not contain curves.
  • the outline of the planar shape of the microlens 21 (the boundary line 24 between the microlens 21 and a plurality of adjacent microlenses 21) is a straight line.
  • the boundary line 24 between the mutually adjacent microlenses 21, 21 includes only a substantially straight line, the regularity of the boundary between the microlenses 21, 21 can be maintained. Therefore, the advantages of the regular arrangement of the plurality of microlenses 21 described above (for example, the effect of reducing uneven brightness and flickering for each lens, and the improvement of cutoff performance) can be ensured.
  • FIG. 5 is an enlarged perspective view showing the surface of the microlens array 20 according to this embodiment.
  • each microlens 21 according to the present embodiment is located at a reference position in the Z direction perpendicular to the They are placed at positions randomly shifted in the Z direction from the zero height position.
  • the shift amount ⁇ s of each microlens in the Z direction varies randomly within a predetermined variation width ⁇ S. For example, when the variation width ⁇ S is 1 ⁇ m, the shift amount ⁇ s of each microlens 21 is set to a variation value that randomly varies within the variation range of 0 to 1 ⁇ m.
  • Each shift amount ⁇ s may be randomly determined using random numbers.
  • the plurality of microlenses 21 are arranged at positions shifted in the Z direction by mutually different shift amounts ⁇ s.
  • a step 23 in the Z direction exists at the boundary between the plurality of microlenses 21, 21 that are adjacent to each other on the XY plane.
  • the step 23 is preferably a flat surface parallel to the Z direction (i.e., a flat surface perpendicular to the XY plane), but it is preferably a curved surface parallel to the Z direction (i.e., the XY plane It may be a curved surface perpendicular to the Z direction), or a flat or curved surface inclined with respect to the Z direction.
  • the step 23 in the Z direction is provided at the boundary between the plurality of mutually adjacent microlenses 21, 21, the surface shapes of the microlenses 21, 21 are discontinuous with each other.
  • the size (height in the Z direction) of the step 23 formed at the boundary between the microlenses 21, 21 is irregular.
  • the microlens 21 according to the present embodiment is arranged at a position shifted in the Z direction by a random shift amount ⁇ s. Thereby, a random phase difference can be imparted to the diffused light emitted from each microlens 21 according to the random shift amount ⁇ s of each microlens 21.
  • each microlens 21 is randomly arranged in the Z direction. It is characterized by shifting to.
  • a lens shift as a new variable element of the microlens array structure, it is possible to impart a phase difference depending on the variation of the lens shift to the diffused light emitted from each microlens 21. Therefore, even when a plurality of microlenses 21 are arranged regularly, it is possible to impart an irregular and variously varying phase difference to the diffused light emitted from each microlens 21.
  • step 23 between the shifted microlenses 21, 21 a plane perpendicular to the XY plane, it is possible to improve the cutoff property and uniformity of the diffused light distribution, and to This has the effect of reducing and eliminating small local brightness changes (unevenness) and flickering.
  • the present embodiment by imparting an irregular phase difference due to a lens shift to the diffused light from each microlens 21, the diffraction of the diffused light can be mutually canceled out. Therefore, in the diffused light emitted from the entire diffuser plate 1, spectral diffracted light (spectral noise that occurs concentrically in the entire diffused light), 0th-order diffracted light (peak-shaped noise that occurs near the diffusion angle of 0 degrees), etc. It is possible to significantly improve the effect of suppressing unnecessary diffracted light including.
  • FIG. 6 is an explanatory diagram showing a manner in which the height h of the apex of each microlens 21 (hereinafter also referred to as “lens height h") changes due to the lens shift according to the present embodiment.
  • the lens surface shape is not changed (or the lens surface shape is slightly changed).
  • the arrangement of each microlens 21 is randomly shifted in the Z direction (lens shift). Therefore, the height h of the apex of each microlens 21 varies depending on the lens shift. As a result, a phase difference due to the lens shift is imparted to the diffused light from each microlens 21.
  • FIG. 6 shows a procedure for designing the microlens 21 to provide a phase difference by irregularly varying the lens height h by the lens shift as described above.
  • the various dimensions shown in FIG. 6 are as follows.
  • Dk Reference aperture width [ ⁇ m] which is the aperture width of the reference surface shape of the microlens
  • Rk Standard radius of curvature [ ⁇ m] which is the radius of curvature of the standard surface shape of the microlens
  • hk Reference lens height [ ⁇ m] which is the height of the apex of the reference surface shape of the microlens
  • D Microlens aperture width [ ⁇ m]
  • R Radius of curvature of microlens [ ⁇ m]
  • ⁇ s Shift amount of microlens in Z direction [ ⁇ m]
  • a plurality of microlenses 21A, 21B, and 21C having a reference surface shape are arranged on the XY plane of the base material 10.
  • the plurality of microlenses 21A, 21B, and 21C all have the same reference surface shape. Therefore, the aperture widths D 1 , D 2 , and D 3 of these microlenses 21A, 21B, and 21C are the same reference aperture width Dk, and the curvature radii R 1 , R 2 , and R 3 are the same reference curvature radius Rk. It is. Further, the heights of these microlenses 21A, 21B, and 21C are all the same reference lens height hk.
  • each of the microlenses 21A, 21B, and 21C is shifted by random shift amounts ⁇ s 1 , ⁇ s 2 , and ⁇ s 3 in the Z direction.
  • the relative position in the Z direction changes.
  • a step 23 (vertical flat surface) in the Z direction is formed at the boundary between the adjacent microlenses 21A, 21B, and 21C.
  • the heights h 1 , h 2 , and h 3 of the vertices of the microlenses 21A, 21B, and 21C also vary by different shift amounts ⁇ s 1 , ⁇ s 2 , and ⁇ s 3 , and become different heights.
  • the final lens height h of each microlens 21 becomes hk+ ⁇ s.
  • the lens height h of each regularly arranged microlens 21 is changed by "lens shift" which is a variable element of the microlens array structure. Vary according to the rules. As a result, irregular phase differences that differ from each other can be imparted to the diffused light emitted from the plurality of microlenses 21, so that the diffraction of the diffused light can be canceled out and unnecessary diffracted light can be suppressed. can.
  • Lens shift variation range ⁇ S> a suitable range of the variation range ⁇ S of the shift amount ⁇ s when the arrangement of the microlenses 21 according to the present embodiment is randomly shifted in the Z direction will be described.
  • the shift amount ⁇ s [ ⁇ m] of each microlens 21 in the Z direction varies randomly within a predetermined variation width ⁇ S [ ⁇ m].
  • ⁇ s MAX the Z-direction shift amount ⁇ s (random fluctuation value) of each microlens 21 is set as a random fluctuation value within the range of 0 to 1.06 [ ⁇ m].
  • the shift amount ⁇ s (random variation value) of each microlens 21 in the Z direction is set as a random variation value within the range of -0.56 to 1.06 [ ⁇ m].
  • the fluctuation range ⁇ S of the shift amount ⁇ s preferably satisfies the following formula (5), more preferably satisfies formula (6), and even more preferably substantially satisfies formula (7).
  • substantially satisfies not only means that the values on the left and right sides of equation (7) completely match, but also when the error between the values on the left and right sides is a minute error ( For example, it may be within the range of ⁇ 2% error).
  • the diffraction peak ratio K A can be suppressed to 60% or less.
  • the diffraction peak ratio K A can be suppressed to 30% or less.
  • the diffraction peak ratio K A can be suppressed to 10% or less.
  • the "diffraction peak level (A)” is an index representing the level (for example, amplitude) of the peak of diffracted light included in the diffused light emitted from the diffuser plate 1.
  • the measured value is the value of the diffraction peak level.
  • the measured value when the diffraction peak level (for example, the amplitude of the diffraction emission line spectrum) of the diffused light is measured using the diffuser plate 1 equipped with the microlens array 20 subjected to the lens shift according to the present embodiment, It can be used as a diffraction peak level (A).
  • the variation width ⁇ S of the shift amount ⁇ s preferably satisfies the following formula (8), more preferably satisfies formula (1), and even more preferably substantially satisfies formula (2).
  • substantially satisfies not only means that the values on the left and right sides of equation (2) completely match, but also when the error between the values on the left and right sides is a minute error ( For example, it may be within the range of ⁇ 2% error).
  • the diffraction peak ratio K A can be suppressed to 60% or less.
  • the diffraction peak ratio K A can be suppressed to 30% or less.
  • the diffraction peak ratio K A can be suppressed to 10% or less.
  • is the wavelength [ ⁇ m] of the incident light that enters the diffuser plate 1.
  • n is the refractive index of the material forming the microlens array 20.
  • the material forming the microlens array 20 means the material of the member (medium through which light passes) on which the microlens array 20 is formed.
  • the material forming the microlens array 20 (hereinafter sometimes referred to as "the material of the microlens array 20") is, for example, glass, resin, or semiconductor. Note that when the incident light is visible light, a microlens array 20 made of glass or resin is used. On the other hand, when the incident light is infrared light, a microlens array 20 made of semiconductor is used.
  • the material of the microlens array 20 is glass.
  • the material of the microlens array 20 is indirectly formed on another layer laminated on the surface of the glass base material 10
  • the material of the microlens array 20 is the material of the other layer (for example, the above-mentioned various resins, semiconductors, etc.).
  • the microlens array 20 is formed by laminating a resin layer made of the above-mentioned various resins on the surface of the glass base material 10 and transferring the uneven structure of the microlens array 20 to the resin layer using a master.
  • the material of the microlens array 20 is the resin forming the resin layer.
  • the refractive index n when light passes through the microlens array 20 also has different values.
  • the refractive index n is the absolute refractive index of the material of the microlens array 20.
  • n' absolute refractive index
  • n' refractive index difference
  • each microlens 21 is shifted in the Z direction by a random shift amount ⁇ s within the range of fluctuation width ⁇ S.
  • a random phase difference is imparted to the diffused light emitted from each microlens 21 depending on the shift amount ⁇ s of each microlens 21.
  • the phase difference given to each microlens 21 by the shift amount ⁇ s is the refractive index difference (n-1) rather than the phase difference corresponding to the distance optical path length difference " ⁇ s" considering only the shift amount ⁇ s.
  • phase difference corresponding to an optical optical path length difference "(n-1) ⁇ s” that takes into account both the shift amount ⁇ s and the shift amount ⁇ s.
  • This optical optical path length difference "(n-1) ⁇ s” reflects not only the optical path length difference due to the shift amount ⁇ s, but also the change in the refractive index n that depends on the material of the microlens array 20 and the wavelength ⁇ . It represents the phase difference.
  • the above refractive index difference (n-1) It is preferable to use a phase difference corresponding to the optical maximum optical path length difference "(n-1).delta.S” taking into account both the variation width .delta.S and the variation width .delta.S. It is conceivable that the interference effect between the diffused lights emitted from the plurality of microlenses 21 of the microlens array 20 changes due to this optical maximum optical path length difference “(n ⁇ 1) ⁇ S”. Therefore, in this embodiment, the effect of suppressing diffracted light is evaluated using a parameter "(n-1) ⁇ S/ ⁇ ” as a parameter representing the maximum phase difference imparted to the entire microlens array 20. This parameter “(n-1) ⁇ S/ ⁇ ” represents the ratio of the phase difference corresponding to the optical maximum optical path length difference “(n-1) ⁇ S” to the wavelength ⁇ of the incident light.
  • equation (5) indicates that the parameter "(n-1) ⁇ S/ ⁇ " is equal to or greater than "0.5".
  • equation (5) indicates that the optical maximum optical path length difference "(n-1) ⁇ S” is 0.5 times or more the wavelength ⁇ .
  • the maximum optical path length difference “(n ⁇ 1) ⁇ S” given by the lens shift according to the present embodiment can be set to an appropriate value for the wavelength ⁇ . Thereby, an irregular phase difference can be appropriately imparted to the diffused light emitted from the plurality of microlenses 21 within the range of the maximum optical path length difference “(n ⁇ 1) ⁇ S”.
  • the diffused lights to which such irregular phase differences are imparted can suitably interfere with each other, and the diffraction of the diffused lights can be canceled out. Therefore, in the diffused light emitted from the entire microlens array 20, the peak of the diffracted light, especially the peak of the 0th order diffracted light, can be suitably suppressed, so that the diffraction peak ratio KA can be suppressed to 60% or less. can.
  • equation (6) indicates that the parameter "(n-1) ⁇ S/ ⁇ " is equal to or greater than "0.75".
  • equation (6) indicates that the optical maximum optical path length difference "(n-1) ⁇ S” is 0.75 times or more the wavelength ⁇ .
  • the diffused lights having such irregular phase differences can be caused to interfere with each other more appropriately, and the diffraction of the diffused lights can be canceled out. Therefore, in the diffused light emitted from the entire microlens array 20, the peak of the diffracted light, especially the peak of the 0th order diffracted light, can be suppressed more preferably, so the diffraction peak ratio K A can be suppressed to 30% or less. I can do it.
  • equation (7) indicates that the parameter "(n-1) ⁇ S/ ⁇ " is "1".
  • equation (7) indicates that the optical maximum optical path length difference "(n-1) ⁇ S” is the wavelength ⁇ .
  • the diffused lights to which such irregular phase differences have been imparted can be caused to interfere with each other even more favorably, and the diffraction of the diffused lights can be canceled out. Therefore, in the diffused light emitted from the entire microlens array 20, the peak of the diffracted light, especially the peak of the 0th order diffracted light, can be suppressed even more favorably, so the diffraction peak ratio KA is suppressed to 10% or less. be able to.
  • equation (8) indicates that the optical maximum optical path length difference "(n-1) ⁇ S" is equal to or greater than "0.5 ⁇ m ⁇ ". That is, equation (8) indicates that the parameter "(n-1).delta.S/ ⁇ " is greater than or equal to "0.5.m”.
  • equation (8) is synonymous with equation (5).
  • the effect of suppressing the peak of the diffracted light due to the mutual interference of the diffused light with a phase difference is the difference between the maximum optical path length difference "(n-1) ⁇ S" and an integer multiple of the wavelength ⁇ . Depends on size.
  • equation (1) is synonymous with equation (6)
  • equation (2) is synonymous with equation (7). Therefore, for the same reason as the relationship between equations (5) and (8) above, by satisfying equation (1), the diffraction peak ratio K A can be suppressed to 30% or less, as in equation (6). be able to. Further, by substantially satisfying the equation (2), the diffraction peak ratio K A can be suppressed to 10% or less similarly to the equation (7).
  • the effective opening width D' is the diameter of an inscribed circle 64 that is inscribed in a regular hexagon 62 that is inscribed in a circle whose diameter is the reference opening width Dk (that is, the reference opening 60).
  • the reference surface shapes of a plurality of microlenses 21 are regularly arranged in a hexagonal dense manner on the XY plane, the circular reference aperture of the microlens 21 becomes the inscribed circle 64, and the aperture width of the circular reference aperture is effective.
  • the opening width becomes D'.
  • the heights of the vertices (lens height h) of the plurality of microlenses 21 according to this embodiment vary irregularly due to lens shift.
  • the change in the lens height h depends on the shift amount ⁇ s of the lens shift.
  • the shift amount ⁇ s of each microlens 21 is randomly set within a predetermined fluctuation width ⁇ S. Therefore, the maximum height difference ⁇ Z of the lens height h is substantially the same as the variation width ⁇ S of the shift amount ⁇ s ( ⁇ Z ⁇ S).
  • the maximum height difference ⁇ Z, the effective aperture width D', the wavelength ⁇ , and the refractive index n satisfy the following formula (3).
  • the evaluation value Eva (D', ⁇ , ⁇ Z) becomes 10 or more, and in the diffused light from the entire diffuser plate 1, spectral diffracted light can be suitably suppressed, and the diffused light It has the effect of homogenizing and equalizing the intensity distribution.
  • the maximum height difference ⁇ Z, the effective aperture width D', the wavelength ⁇ , and the refractive index n satisfy the following formula (4).
  • the evaluation value Eva (D', ⁇ , ⁇ Z) becomes 15 or more, and in the diffused light from the entire diffuser plate 1, spectral diffracted light can be further suppressed, and the diffused light The effect of homogenizing and equalizing the intensity distribution can be further improved.
  • FIG. 8 is a schematic diagram showing a mode in which the optical axis 25 of the microlens 21 according to this embodiment is tilted.
  • the upper diagram in FIG. 8 (FIG. 8A) shows the surface shape (reference aspheric shape) of the microlens 21 before the optical axis 25 is tilted.
  • the lower diagram in FIG. 8 (FIG. 8B) shows the surface shape (tilted aspherical shape) of the microlens 21 after the optical axis 25 is tilted.
  • the surface 26 of the microlens 21 may be referred to as the "lens surface 26", and the surface shape of the microlens 21 (that is, the curved shape of the lens surface 26) may be referred to as the "lens surface shape”.
  • the lens surface shape is an aspherical shape having an axis of symmetry
  • the lens surface shape may be a spherical shape or a cylindrical lens shape.
  • the curved shape (lens surface shape) of the lens surface 26 of the microlens 21 according to the present embodiment may have an aspherical shape such as an ellipsoid, a paraboloid, or a hyperboloid. good.
  • FIG. 8 shows an example in which the aspherical shape of the lens surface 26 is an ellipsoid that is vertically elongated in the direction of the optical axis 25 (Conic coefficient K>0).
  • the ellipsoidal surface means a spheroidal surface that is the surface of a spheroid.
  • a spheroid is a rotating body obtained by using an ellipse with its major axis or minor axis as the axis of rotation.
  • the ellipsoidal surface in the case of K>0 is the surface of a spheroid (that is, a long ellipsoid) obtained with the long axis of the ellipse as the rotation axis.
  • the ellipsoidal surface is the surface of a spheroid (that is, a flat ellipsoid) obtained with the minor axis of the ellipse as the rotation axis.
  • the axis of rotation (corresponding to the axis of symmetry) of the spheroid coincides with the optical axis 25 of the microlens 21.
  • the optical axis 25 of the microlens 21 when the optical axis 25 of the microlens 21 is not inclined, the optical axis 25 of the microlens 21 is in the normal direction (Z direction) to the surface (XY plane) of the base material 10 of the diffuser plate 1. ). In other words, the optical axis 25 overlaps the Z axis.
  • the surface shape of the microlens 21 also has a reference aspheric shape (FIG. 8A) that is not inclined with respect to the Z direction.
  • the reference aspherical shape according to this embodiment is, for example, an aspherical shape that is rotationally symmetrical about the normal direction (Z direction) to the XY plane.
  • the reference aspherical shape may be, for example, an aspherical shape that is rotationally asymmetrical about the Z direction as long as the optical axis 25 is an aspherical shape parallel to the Z direction.
  • the vertex 28 of the microlens 21 is located on the optical axis 25 and the Z axis.
  • the reference aspherical shape (FIG. 8A) is a lens surface shape that serves as a reference when designing the inclined aspherical shape (FIG. 8B).
  • the aperture width D of the microlens 21 is the width (lens diameter) of the aperture 27 of the microlens 21 in the XY plane.
  • the shape of the opening 27 of the microlens 21 may be, for example, a circle, an ellipse, a square, a rectangle, a diamond, a hexagon, or another polygon. An example will be explained.
  • the opening width D is represented by an opening width Dx in the X direction and an opening width Dy in the Y direction.
  • the radius of curvature R of the microlens 21 is the radius of curvature at the top of the lens surface shape.
  • the radius of curvature R is represented by a radius of curvature Rx in the X direction and a radius of curvature Ry in the Y direction.
  • Rx in the X direction
  • Rx radius of curvature
  • Ry in the Y direction.
  • the optical axis 25 of the microlens 21 is aligned at a predetermined direction with respect to the normal direction (Z direction) to the surface (XY plane) of the base material 10 of the diffuser plate 1. It may be inclined at an inclination angle ⁇ .
  • the tilt angle ⁇ is the angle between the optical axis 25 and the normal direction (Z direction).
  • the inclination direction of the optical axis 25 is represented by an azimuth angle ⁇ .
  • the azimuth angle ⁇ is the angle between the optical axis 25 projected onto the XY plane and the X direction when the inclined optical axis 25 is projected onto the XY plane.
  • the lens surface 26 of the microlens 21 also inclines at an inclination angle ⁇ in the inclination direction represented by the azimuth angle ⁇ .
  • the lens surface shape of the tilted microlens 21 becomes an aspherical shape obtained by tilting the reference aspherical shape (FIG. 8A), that is, a tilted aspherical shape (FIG. 8B).
  • the surface shape of the microlens 21 when the optical axis 25 of the microlens 21 is inclined at an inclination angle ⁇ with respect to the Z direction, the surface shape of the microlens 21 also changes in the inclination direction represented by the azimuth angle ⁇ . It has an inclined aspherical shape inclined at an inclination angle ⁇ with respect to the Z direction.
  • This inclined aspherical shape (FIG. 8B) is a shape obtained by rotating the reference aspherical shape (FIG. 8A) by an inclination angle ⁇ about the center point 30 of the reference aspherical shape.
  • This tilted aspherical shape is rotationally symmetrical about the optical axis 25 tilted at an inclination angle ⁇ .
  • the center point 30 is the origin (x, y, z) when designing the reference aspherical shape of the microlens 21.
  • the aperture surface of the reference aspherical shape of the microlens 21 is designed to be a circle, an ellipse, or the like.
  • this origin (x, y, z) may be a reference position when shifting the arrangement of the microlens 21 in the Z direction as described above.
  • the center point 30 is illustrated as being located on the surface (XY plane) of the base material 10 in FIG. 8, the center point 30 does not have to be located on the XY plane.
  • the apex 28 of the microlens 21 is located on the optical axis 25 and the Z axis.
  • FIG. 8B when the optical axis 25 and the lens surface shape are tilted, the vertex 29 of the lens surface 26 of the tilted microlens 21 is different from the vertex 28 of the lens surface 26 shown in FIG. 8A. Move to different positions.
  • This apex 29 is the highest point in the Z direction of the tilted aspherical shape (FIG. 8B), and is located at a position offset from the optical axis 25 tilted by the tilt angle ⁇ .
  • the optical axis 25 of the microlens 21 and the lens surface shape are tilted, and the apex 29 of the microlens 21 is moved to a position offset from the optical axis 25.
  • the outgoing light (diffused light) that passes through the microlens 21 and is emitted can be deflected with respect to the incident light.
  • Deflection means bending the direction of the principal ray of the emitted light in a desired direction with respect to the direction of the principal ray of the incident light, thereby deflecting the main traveling direction of the emitted light (diffuse light) in the desired direction. do.
  • FIG. 9 is a schematic diagram showing the deflection function of the microlens 21 according to this embodiment.
  • the upper diagram in FIG. 9 (FIG. 9A) shows the diffusion function of transmitted light by the microlens 21 whose optical axis 25 is not inclined.
  • the lower diagram in FIG. 9 (FIG. 9B) shows the diffusion and deflection functions of transmitted light by the microlens 21 with the optical axis 25 inclined.
  • a case will be considered in which collimated light parallel to the normal direction (Z direction) of the surface of the diffuser plate 1 is incident as the incident light 40 to the diffuser plate 1.
  • the incident angle ⁇ in of the incident light 40 is 0°
  • the direction of the principal ray 41 of the incident light 40 is parallel to the Z direction.
  • the optical axis 25 of the microlens 21 if the optical axis 25 of the microlens 21 is not inclined, the light transmitted through the microlens 21 is symmetrical about the direction of the optical axis 25 of the microlens 21 (Z direction). spread to. Therefore, the emitted light 50 becomes diffused light that is symmetrically diffused around the Z direction. As a result, the outgoing angle ⁇ out of the principal ray 51 of the outgoing light 50 becomes 0°, and the direction of the principal ray 51 of the outgoing light 50 becomes parallel to the Z direction.
  • the deflection direction of the principal ray 51 of the output light 50 is aligned with the optical axis 25 of the microlens 21.
  • the direction is opposite to the direction of inclination (the right direction in FIG. 9B) (the left direction in FIG. 9B).
  • the deflection angle ⁇ representing this deflection direction is determined by the inclination angle ⁇ of the optical axis 25, the inclined aspherical shape of the microlens 21, the position of the apex 29, etc.
  • the deflection angle ⁇ changes depending on the tilt angle ⁇ . If the lens surface shape is the same, the larger the inclination angle ⁇ , the larger the deflection angle ⁇ .
  • the optical axis 25 of the microlens 21 is inclined at the inclination angle ⁇
  • the luminous flux of the emitted light 50 is deflected in the direction of deflection (direction represented by the deflection angle ⁇ ) with respect to the luminous flux of the incident light 40.
  • the light is deflected and becomes diffused light that is diffused almost symmetrically around the deflection direction.
  • the outgoing angle ⁇ out of the principal ray 51 of the outgoing light 50 becomes ⁇ °
  • the direction of the principal ray 51 of the outgoing light 50 is a direction inclined by the deflection angle ⁇ with respect to the Z direction
  • the optical axis 25 The direction is opposite to the direction of inclination.
  • the optical axis 25 of each microlens 21 constituting the microlens array 20 is aligned in the normal direction (Z direction) to the surface (XY plane) of the base material 10 of the diffuser plate 1. ). Furthermore, the lens surface shape of each microlens 21 is an inclined aspherical shape (FIGS. 8B, 9B) obtained by rotating the reference aspherical shape (FIGS. 8A, 9A) in the same direction at an inclination angle ⁇ . The lens surface shape is also inclined to follow the inclination of the optical axis 25.
  • the direction of the output light 50 can be bent in the direction opposite to the direction of inclination of the optical axis 25 with respect to the direction of the input light 40, and the output light 50 can be deflected in a desired direction. Therefore, according to this embodiment, the emitted light 50 can also be deflected in a direction different from the refraction direction due to the normal refraction effect of the diffuser plate 1.
  • the incident light incident on the diffuser plate 1 according to the present embodiment may be, for example, collimated light collimated by an optical system, or may be diffused light incident from a single point light source.
  • the light may be diffused light or collimated light incident from a plurality of light sources arranged in the same direction with respect to the diffuser plate 1.
  • the microlens array 20 according to this embodiment can suitably deflect these incident lights.
  • the inclination angle ⁇ of the optical axis 25 of the microlens 21 according to this embodiment is 60° or less. If the inclination angle ⁇ exceeds 60°, the surface shape of the microlens 21 will be distorted, and the microlens 21 will have extreme anisotropy. For this reason, it becomes difficult to mold the microlenses 21 that are excessively inclined, and the feasibility of forming a microlens array structure may decrease. Furthermore, it may become difficult to clearly manifest the deflection function of the emitted light, and the optical characteristics of the microlens 21 may also deteriorate.
  • the inclination angle ⁇ must be 60°. It is preferable that it is less than or equal to °.
  • the inclination angle ⁇ is 45° or less.
  • noise in the diffused light may easily occur depending on the shape of the inclined microlens 21.
  • This lens shape-dependent noise includes, for example, zero-order diffracted light noise or spectral noise.
  • Spectral noise is noise composed of refracted and scattered extraordinary light and relatively periodic peak-shaped diffracted light, and is generated by a diffraction phenomenon caused by discontinuity in the shape of the microlens array 20. Therefore, in order to reduce noise generated by the diffused light caused by the microlens 21, it is preferable that the inclination angle ⁇ is 45° or less.
  • the inclination angle ⁇ is preferably 1° or more. If the inclination angle ⁇ is less than 1°, the realization of the deflection function will not be determined due to formation errors of the microlens 21 or limitations in the detection accuracy of the deflection angle, and the deflection function of the emitted light will be insufficient. There are cases. Therefore, in order to suitably realize the deflection function, the inclination angle ⁇ is preferably 1° or more, and more preferably 2° or more.
  • the surface shape (lens surface shape) of the microlens 21 according to the present embodiment is preferably an aspherical shape that is rotationally symmetrical about the optical axis 25 tilted at the tilt angle ⁇ , as shown in FIG. 8, for example.
  • the lens surface shape according to the present embodiment is preferably a tilted aspherical shape that is rotationally symmetrical about the tilted optical axis 25.
  • This has the advantage that the microlens 21 with the optical axis 25 inclined can be designed and manufactured relatively easily.
  • the emitted light 50 can be suitably deflected in a desired direction by the microlens 21, and the accuracy and uniformity of the deflection function can be improved.
  • the inclination angle ⁇ of the optical axis 25 with respect to the Z direction may vary randomly with respect to a predetermined reference inclination angle ⁇ k.
  • the azimuth angle ⁇ representing the direction of inclination of the optical axis 25 may also vary randomly.
  • the inclination angles ⁇ of all the microlenses 21 may vary randomly within a predetermined variation width ⁇ with reference to the reference inclination angle ⁇ k.
  • the azimuth angles ⁇ of all the microlenses 21 may vary randomly within a relatively wide variation range.
  • the optical axes 25 of the plurality of microlenses 21 constituting the microlens array 20 may be inclined in mutually different directions (azimuth angle ⁇ ) at mutually different inclination angles ⁇ .
  • the inclination angle ⁇ of the optical axis 25 of the plurality of microlenses 21 varies randomly within a predetermined variation range (for example, within a relatively wide variation range ⁇ ) with respect to a predetermined reference inclination angle ⁇ k. You can leave it there.
  • the azimuth angle ⁇ of the optical axis 25 of the plurality of microlenses 21 also differs from each other, and the azimuth angle ⁇ varies randomly within a predetermined variation range (for example, within a relatively wide variation width ⁇ ). You can leave it there.
  • the surface shape of all the microlenses 21 is an ellipsoid, and is rotationally symmetrical about the optical axis 25.
  • the aperture width D and radius of curvature R of the microlens 21 do not vary randomly around Dk and Rk, but are substantially the same as Dk and Rk, so that the surface of each microlens 21
  • the shape is substantially the same as the shape of the reference ellipsoid. Therefore, the surface shapes of the plurality of microlenses 21 are mutually the same ellipsoid.
  • the microlens array 20 having such a configuration, the light emitted from each microlens 21 is deflected at a deflection angle ⁇ corresponding to the inclination angle ⁇ of each optical axis 25 and corresponding to the azimuth angle ⁇ of each optical axis 25. can be deflected in the deflection direction. Therefore, the microlens array 20 as a whole can deflect the emitted light in random directions at random deflection angles ⁇ centered on a desired angle. Therefore, since the deflection direction and the deflection angle ⁇ of the emitted light can be varied, the homogeneity of the emitted light can be improved.
  • the inclination angle ⁇ and azimuth angle ⁇ of the optical axis 25 of each microlens 21 can be changed. It can be varied randomly within a relatively wide variation range. Thereby, it is also possible to further reduce unevenness in the intensity distribution of the diffused light due to interference and diffraction of the light emitted from the plurality of microlenses 21.
  • Conic coefficient K of aspherical shape, aspect ratio> Furthermore, when the aspherical shape of the microlens 21 according to the present embodiment is expressed by an aspherical lens formula using a conic coefficient K, the conic coefficient K in the aspherical lens formula is likely to be greater than 0. Preferred (K>0). If K>0, the lens surface shape becomes an ellipsoid that is vertically elongated in the direction of the optical axis 25. This has the effect of making it easier to achieve both deflection function and diffusion control.
  • the formula for the aspherical lens representing the aspherical shape is, for example, the following formula (40). be able to.
  • each parameter is as follows.
  • the aspect ratio k of the surface shape of the microlens 21 is preferably 0.1 or more and 1.1 or less, and preferably 0.2 or more and 0.6 or less. is more preferable. This has the effect of making it easier to control the diffusion angle and form the structure of the microlens 21.
  • the maximum lens apex height h max is the apex height of the microlens 21 having the highest apex height among the plurality of microlenses 21 included in one unit cell 3 shown in FIG.
  • the maximum value of h is h max ).
  • the minimum boundary point height h MIN is the height of the lowest position of the boundary line 24 around the microlens 21 .
  • the microlens 21 preferably has an aspherical shape or a spherical shape having an axis of symmetry, for example, as shown in FIG. Preferably, it has a rotationally symmetrical aspherical shape. This rotationally symmetrical aspherical shape is isotropic with the optical axis 25 as the center.
  • the surface shape of the microlens 21 is not limited to this example; for example, it may be an aspherical shape that is not rotationally symmetrical about the optical axis 25, or it may be an aspherical shape that has anisotropy. good.
  • the lens surface shape is a rotationally asymmetrical aspherical shape or an anisotropic aspherical shape
  • by shifting each microlens 21 in the Z direction by a random shift amount ⁇ s to impart a phase difference. it is possible to suppress the diffracted light and improve the homogeneity of the diffused light.
  • the optical axis 25 of the microlens 21 is inclined, the emitted light can be deflected in a desired direction by the action of the inclined optical axis 25. is possible.
  • the microlens 21 is rotationally asymmetric with respect to the optical axis 25.
  • An example of an aspherical shape having anisotropy and line symmetry with respect to a plane containing (axis of symmetry) will be described.
  • an anamorphic shape or a torus shape can be used as the aspherical shape having anisotropy and extending in a predetermined direction.
  • FIG. 10 is an explanatory diagram showing the planar shape of the anamorphic microlens 21.
  • FIG. 11 is a perspective view showing the three-dimensional shape of the anamorphic microlens 21.
  • the microlens 21 shown in FIGS. 10 and 11 is a so-called anamorphic lens, and its surface shape is an aspherical shape including an anamorphic curved surface.
  • the planar shape of the microlens 21 is an anisotropic ellipse.
  • the major axis of the elliptical shape in the Y-axis direction is Dy
  • the minor axis in the X-axis direction is Dx.
  • the surface shape of the microlens 21 is an aspherical curved surface having predetermined radii of curvature Rx and Ry in the major and minor axis directions of an elliptical shape, respectively.
  • the microlens 21 has an aspherical shape having anisotropy in the Y-axis direction.
  • the anamorphic curved surface (aspherical surface) shown in FIG. 11 is expressed by the following formula (50).
  • the following formula (50) is an example of a formula representing an anamorphic curved surface (aspherical surface).
  • each parameter is as follows.
  • Ry Radius of curvature in the Y direction
  • Kx Conic coefficient in the X direction
  • Ky Conic coefficient in the Y direction
  • a y6 4th and 6th order aspherical coefficients in the Y direction
  • the short axis in the X direction of the ellipse on the XY plane is Dx
  • the long axis in the Y direction is Dy.
  • cut out the curved surface is set as the surface shape (anamorphic shape) of the microlens 21.
  • the major axis Dy, the minor axis Dx, the radius of curvature Ry in the Y direction (major axis direction), and the radius of curvature Rx in the X direction (minor axis direction) of the elliptical shape are set at a predetermined rate of variation for each microlens 21. Vary randomly within a range to create variation. Thereby, the surface shapes of the plurality of microlenses 21 having mutually different anamorphic shapes can be set.
  • FIG. 12 is an explanatory diagram showing the planar shape of the torus-shaped microlens 21.
  • FIG. 13 is a perspective view showing the three-dimensional shape of the torus-shaped microlens 21.
  • FIG. 14 is a perspective view showing a torus-shaped curved surface.
  • the surface shape of the microlens 21 is an aspherical shape including a partially curved surface of a torus shape.
  • a torus is a surface of revolution obtained by rotating a circle. Specifically, as shown in FIG. 14, the small circle (radius: R) is rotated along the circumference of the large circle (radius: R) around the rotation axis (X-axis) located outside the small circle (radius: r). By rotating the circle, a so-called donut-shaped torus is obtained.
  • the curved shape of the surface (torus surface) of this toric body is a torus shape. By cutting out the outer portion of this torus shape, a three-dimensional shape of the torus-shaped microlens 21 as shown in FIG. 13 is obtained.
  • the planar shape of the torus-shaped microlens 21 is an elliptical shape with anisotropy.
  • the major axis of the elliptical shape in the Y-axis direction is R
  • the minor axis in the X-axis direction is r.
  • These r and R correspond to the aperture widths Dx and Dy of the microlens 21 in the X direction and the Y direction.
  • the three-dimensional shape of the microlens 21 is an aspherical curved surface having predetermined radii of curvature R and r in the major and minor axis directions of an elliptical shape, respectively.
  • the microlens 21 has an aspherical shape having anisotropy in the Y-axis direction.
  • FIG. 14 is a perspective view showing an aspherical curved surface expressed by the following formula (52). Note that in equation (52), R is the radius of the large circle, and r is the radius of the small circle.
  • the curved surface is formed such that the short axis in the X direction of the ellipse on the XY plane is r, and the long axis in the Y direction is R. Cut out. This cut out part of the curved surface shape is set as the curved surface shape (torus shape) of the microlens 21.
  • the aspherical shapes such as the anamorphic shape and torus shape described above are not rotationally symmetrical shapes about the optical axis 25 of the microlens 21.
  • the aspherical shape is a shape that is symmetrical in the Y direction with respect to the XZ plane that includes the optical axis 25, and a shape that is symmetrical in the X direction with respect to the YZ plane that includes the optical axis 25.
  • the surface shape of the microlens 21 may be an aspherical shape (for example, an anamorphic shape or a torus shape) having such symmetry and anisotropy.
  • diffracted light can be suppressed and the homogeneity of diffused light can be increased by shifting each microlens 21 having an aspherical shape in the Z direction by a random shift amount ⁇ s to provide a phase difference. is possible. Furthermore, even in the case of an aspherical microlens 21 having symmetry and anisotropy, if the optical axis 25 of the microlens 21 is tilted and the lens surface shape is rotated in the direction of inclination, the inclination can be Due to the effect of the optical axis 25 and the lens surface shape, the emitted light can be deflected in a desired direction. Furthermore, different diffusion characteristics can be obtained in the X direction and the Y direction.
  • the aspherical shape of the microlens 21 having anisotropy in addition to the above examples, for example, an aspherical shape cut out from an ellipsoid can also be used.
  • FIG. 15 is a flowchart showing a method for designing the microlens array 20 according to this embodiment.
  • (S10) Setting of lens center coordinates As shown in FIG. 15, first, in S10 , on the surface of the microlens array 20 (on the and y coordinate).
  • the lens center coordinates p n are the coordinates of the center point 30 (see FIG. 8) of each microlens 21 on the XY plane.
  • the plurality of lens center coordinates p n are regularly arranged along a preset reference grid.
  • a plurality of lens center coordinates are arranged along a reference grating having a preset grating interval i.
  • Set p n (xp n , yp n ).
  • a triangular lattice is used as the reference lattice so that the intervals between the plurality of lens center coordinates pn fall within a preset range.
  • a triangular lattice is set on the XY plane by arranging a plurality of equilateral triangles whose side length is the lattice interval i.
  • the lattice points (vertices of equilateral triangles) of the triangular lattice are set at the center coordinates p n (xp n , yp n ) of each lens.
  • a plurality of lens center coordinates p n can be regularly arranged along the triangular lattice, and the intervals between the lens center coordinates p n can be adjusted to a constant lattice interval i.
  • the plurality of microlenses 21 can be arranged regularly while overlapping each other with an appropriate amount of overlap Ov. Therefore, it is possible to suppress the generation of a flat part that does not become a lens surface between the mutually adjacent microlenses 21, 21, so that the generation of zero-order diffracted light that passes through the flat part of the diffuser plate 1 can be suppressed.
  • microlenses 21, 21 do not overlap each other excessively, the moldability and feasibility of the microlens array structure are not impaired.
  • the lens parameter is a parameter that determines the surface shape of the microlens 21 (lens surface shape).
  • the lens parameters are set randomly within a preset variation range.
  • the lens parameters include, for example, the reference aperture width Dk and reference radius of curvature Rk of the reference surface shape, the actual aperture width D (lens diameter) of each microlens 21, the radius of curvature R of the top of the microlens 21, and the like.
  • the reference surface shape is a reference aspherical surface shape that is rotationally symmetrical about the optical axis 25 (axis of symmetry), for example, an ellipsoidal surface (the surface of a spheroid whose axis of rotation is in the direction of the optical axis 25), In the case of a paraboloid, a hyperboloid, etc. (see FIG.
  • the lens parameters include, for example, a reference aperture width Dk, a reference radius of curvature Rk, an aperture width D, a radius of curvature R, an inclination angle ⁇ , an azimuth angle ⁇ , etc. (See Figure 8.)
  • the reference surface shape of the microlens 21 is rotationally asymmetric about the optical axis 25 and has an anisotropic aspherical shape, such as an anamorphic shape or a torus shape.
  • the distance d may include a distance dx in the X direction and a distance dy in the Y direction from the lens center coordinate pn on the XY plane.
  • the planar shape of the microlens 21 is, for example, as shown in FIG. , becomes a circle as shown in FIG.
  • the planar shape of the microlens 21 is, for example, FIGS. As shown in the figure, it becomes an ellipse or a shape approximating an ellipse.
  • the plurality of microlenses 21 have the same shape, and the lens surface shape of each microlens 21 is substantially the same as the reference surface shape. Therefore, the aperture width D and the radius of curvature R of each microlens 21 are set to the reference aperture width Dk and the reference radius of curvature Rk, respectively.
  • the lens parameters set in the lens parameter setting step (S12) may be only parameters related to the reference surface shape (Dk, Rk, etc.).
  • each microlens 21 is a shape that varies within a minute error (for example, ⁇ 1% shape error) with respect to the reference surface shape. It's okay.
  • the aperture width D and radius of curvature R of each microlens 21 may be set to randomly varied values within a small error range.
  • Rk radius of curvature
  • the lens surface shape of the plurality of microlenses 21 can be changed from a reference surface shape (for example, a reference aspherical shape having an axis of symmetry) to a minute value. It is possible to set mutually different lens surface shapes by varying the lens surface shape.
  • the lens parameters set in the lens parameter setting step (S12) include parameters related to the reference surface shape (Dk, Rk, etc.) and parameters related to the variation rate ( ⁇ D, ⁇ R). ) may also be included.
  • the shift amount ⁇ s is a distance by which the microlens 21 placed at the reference position is shifted in the Z direction in the initial setting (see FIG. 6B).
  • the shift amount ⁇ s is randomly set within a preset fluctuation range ⁇ S. That is, the shift amount ⁇ s of each microlens 21 is preferably set to a value that varies randomly within the range of variation ⁇ S so that the shift amount ⁇ s of the plurality of microlenses 21 has different values.
  • the fluctuation width ⁇ S corresponds to the maximum shift amount ⁇ s max , which is the maximum value among the shift amounts ⁇ s of the plurality of microlenses 21.
  • ⁇ S ⁇ /(n-1)
  • the shift amount ⁇ s can be any value within the range of 0 [ ⁇ m] or more and ⁇ /(n-1) [ ⁇ m] or less. set to the value.
  • ⁇ S By setting the shift amount ⁇ s to a random value in this way, the positions in the Z direction and the lens height h of the plurality of microlenses 21 are more irregularly changed, and the mutual can be given different phase differences. Furthermore, by setting the fluctuation width ⁇ S to a value that satisfies the above formulas ((5) to (7)), ⁇ S can be set to a more appropriate value according to the wavelength ⁇ of the incident light and the refractive index n of the microlens array 20. As a result, it is possible to impart an irregular phase difference within a range suitable for the wavelength ⁇ and refractive index n to the light emitted from each microlens 21 (diffused light). Since the 0th-order diffracted light included in the output light having a phase difference can be canceled out, the effect of suppressing unnecessary diffracted light such as the 0th-order diffracted light described above is further enhanced.
  • a tilting process may be performed to tilt the optical axis 25 of each microlens 21 and the lens surface shape.
  • the optical axis 25 of each microlens 21 is tilted at a tilt angle ⁇ with respect to the Z direction in the tilt direction defined by the azimuth angle ⁇ .
  • the lens surface shape determined in S16 is rotated about the center point 30 of each microlens 21 as a rotation center.
  • the rotation angle at this time is the same as the inclination angle ⁇ , and the rotation direction is the direction of the azimuth angle ⁇ .
  • the center point 30, which is the center of rotation is the origin (x, y, z) when designing the reference surface shape of the microlens 21 in S12 and S16 above.
  • the lens surface shape is tilted at an inclination angle ⁇ with respect to the Z direction, changing from the reference surface shape (see FIG. 8A) to the inclined surface shape (see FIG. 8B).
  • the apex of the microlens 21 moves from the apex 28 before rotation to a new apex 29.
  • This new apex 29 is the apex of the inclined surface shape obtained by rotating the reference surface shape by the inclination angle ⁇ , and is located at a position tilted by the inclination angle ⁇ and shifted from the optical axis 25.
  • the lens surfaces 26, 26 of adjacent microlenses 21, 21 may partially overlap each other. Therefore, in the area where the lens surfaces overlap, as shown in FIG. 20B, the lens surface 26 of the two lenses with a larger z value (that is, the lens surface 26 with a higher height) is used as a microlens. Used as the surface of array 20.
  • a grid arranged in a lattice shape on the XY plane is set.
  • the z value (lens height) of each grid is determined based on the lens surface shape determined in S16 above.
  • this shift processing the lens surface 26 of each microlens 21 is shifted in the Z direction by a shift amount ⁇ s that is randomly set in advance for each microlens 21, and the height position of the lens surface 26 of each microlens 21 ( z value) is determined.
  • the microlens 21 used in that grid and the lens surface of the microlens 21 are selected. Twenty-six z-values are identified. Then, the shift amount ⁇ s set for the specified microlens 21 is added to the z value of the specified lens surface 26 to obtain the final height h of the lens surface 26 of the microlens 21. A representative z value is determined. At this time, regarding the area where two adjacent microlenses 21, 21 overlap, the area where the two adjacent microlenses 21, 21 overlap is determined based on the lens ID assigned to each grid in S18 and the boundary line 24 between the microlenses 21, 21. It is possible to determine which lens among the two microlenses 21 and 21's z value and shift amount ⁇ s should be used for calculation.
  • the shift amount ⁇ s randomly set for each microlens 21 is added to the z value representing the height h' of each microlens 21.
  • the lens surface 26 of each microlens 21 is shifted in the Z direction by a random shift amount ⁇ s (see FIG. 6B).
  • the lens surface shape of the plurality of microlenses 21 is such that the plurality of microlenses 21 having substantially the same lens surface shape are regularly arranged on the XY plane, and (S10, S12, S16), the lens surface of each microlens 21 can be placed at a position shifted in the Z direction by a random shift amount ⁇ s (S14, S20). Thereby, an irregular phase difference corresponding to the random shift amount ⁇ s can be superimposed and imparted to the diffused light emitted from each microlens 21.
  • the plurality of microlenses 21 are regularly arranged on the XY plane of the base material 10. Furthermore, it is preferable that the plurality of microlenses 21 are arranged so as to overlap each other without any gaps with a predetermined amount of overlap Ov, and that there is no flat part at the boundary between adjacent microlenses 21. Thereby, while arranging the plurality of microlenses 21 continuously on the XY plane with no gaps between them, it is possible to impart different diffusion characteristics to each of the microlenses 21 by the lens shift.
  • the microlens array 20 having such a configuration can reduce macroscopic light intensity fluctuations depending on the lens surface structure and light intensity changes due to unnecessary diffracted light, so it can achieve good homogeneity and light distribution, and diffusion with effective cutoff properties. Light intensity distribution can be realized.
  • FIG. 22 is a flowchart showing a method for manufacturing the diffusion plate 1 according to this embodiment.
  • the base material (the base material of the master master or the base material 10 of the diffusion plate 1) is cleaned (step S101).
  • the base material may be, for example, a roll base material such as a glass roll, or a flat base material such as a glass wafer or a silicon wafer.
  • a resist is formed on the surface of the cleaned base material (step S103).
  • the resist layer can be formed using a resist using a metal oxide.
  • a resist layer can be formed on a roll-shaped base material by spray coating or dipping a resist.
  • a resist layer can be formed on a flat base material by subjecting it to various coating treatments.
  • a positive photoreactive resist or a negative photoreactive resist may be used.
  • a coupling agent may be used to increase the adhesion between the base material and the resist.
  • the resist layer is exposed using a pattern corresponding to the shape of the microlens array 20 (step S105).
  • Such exposure processing may be performed using known exposure methods, such as exposure using a gray scale mask, multiple exposure by overlapping multiple gray scale masks, or laser exposure using a picosecond pulse laser or femtosecond pulse laser. may be applied as appropriate.
  • the exposed resist layer is developed (S107).
  • a pattern is formed in the resist layer by this development process.
  • Development processing can be performed by using an appropriate developer depending on the material of the resist layer.
  • the resist layer can be alkali developed using an inorganic or organic alkaline solution.
  • a master master having the shape of the microlens array 20 formed on its surface is completed (S111).
  • a glass master can be manufactured by etching a glass base material using a patterned resist layer as a mask.
  • a metal master can be manufactured by performing Ni sputtering or nickel plating (NED treatment) on a resist layer on which a pattern has been formed, forming a nickel layer with a transferred pattern, and then peeling off the base material. .
  • a metal master master is manufactured by forming a nickel layer with a resist pattern transferred thereto by Ni sputtering with a thickness of about 50 nm or nickel plating with a thickness of 100 ⁇ m to 200 ⁇ m (e.g., Ni sulfamate bath). can do.
  • step S111 e.g., glass master master, metal master master
  • step S111 e.g., glass master master, metal master master
  • the pattern of the microlens array 20 is transferred onto a glass base material, a film base material, etc., which is the base material 10 of the diffuser plate 1 (S115), and if necessary, a protective film is added. , an antireflection film or the like is formed (S117).
  • the diffusion plate 1 according to this embodiment can be manufactured using the master master and the soft mold.
  • a soft mold is manufactured (S113) using a master master (S111), and then the diffusion plate 1 is manufactured by transfer using the soft mold (S115).
  • a master master for example, an inorganic glass master
  • the diffusion plate 1 may be manufactured by imprinting using the master master.
  • an acrylic photocurable resin is applied to a base material made of PET (PolyEthylene Terephthalate) or PC (PolyCarbonate), a pattern of a master master is transferred to the applied acrylic photocurable resin, and the acrylic photocurable resin is exposed to UV light. By curing, the diffusion plate 1 can be manufactured.
  • the diffuser plate 1 may be manufactured by directly processing the glass base material itself.
  • a dry etching process is performed on the base material 10 of the diffuser plate 1 using a known compound such as CF4 (S119), and then, if necessary, A protective film, an antireflection film, etc. may be formed (S121).
  • CF4 CF4
  • S121 A protective film, an antireflection film, etc.
  • the diffusion plate 1 according to this embodiment can be manufactured by various methods, such as photolithography, etching, resin transfer, or electroforming transfer.
  • the diffusion plate 1 as described above can be appropriately installed in various devices that need to diffuse light in order to realize its functions.
  • Examples of such devices include display devices such as various displays (for example, LEDs and organic EL displays), projection devices such as projectors, and various lighting devices.
  • the diffusion plate 1 can be applied to a backlight of a liquid crystal display device, a lens integrated with a diffusion plate, etc., and can also be applied to light shaping. Further, the diffusion plate 1 can be applied to a transmission screen, a Fresnel lens, a reflection screen, etc. of a projection device. Further, the diffusion plate 1 can be applied to various lighting devices used for spot lighting, base lighting, etc., various special lighting, and various screens such as intermediate screens and final screens. Furthermore, the diffusion plate 1 can be applied to applications such as controlling the diffusion of light source light in optical devices, such as controlling the light distribution of LED light source devices, controlling the light distribution of laser light source devices, and controlling the incident light to various light valve systems. It can also be applied to control, etc.
  • the device to which the diffuser plate 1 is applied is not limited to the above application example, but can be applied to any known device as long as it utilizes light diffusion.
  • the diffusion plate 1 according to the present embodiment can be installed in optical equipment such as various illumination optical systems, image projection optical systems, measurement detection sensing optical systems, and the like.
  • the device including the diffusion plate 1 according to the present embodiment may be a display device, a projection device, a lighting device, a photodetection device, a video device, an optical processing device, an optical communication device, an optical calculation device, etc. .
  • the light incident on the diffuser plate 1 is preferably light having a wavelength ⁇ in the visible light range, and may be, for example, coherent light such as a laser beam, or incoherent light from a light source such as an LED or a lamp. It may be light. Furthermore, when the device including the diffuser plate 1 is used as a lighting device or a video device, a light source such as an LED light source or a white light source may also be used.
  • the diffusion plate 1 including the microlenses 21 having an inclined aspherical shape according to the present embodiment can be manufactured by, for example, imprint processing using a master disk having an uneven structure of the microlenses 21.
  • the master disc can be manufactured by high-precision drawing exposure or stepper exposure using laser light or a controlled light source, and photolithography techniques such as etching.
  • the master can be manufactured by transferring a structural surface formed by lithography by electroforming, or it can also be manufactured as an inorganic device by glass etching.
  • the master disc can also be manufactured by precision machining technology.
  • the product of the diffusion plate 1 may be provided as an inorganic device by glass etching, for example. Further, the diffusion plate 1 may be provided, for example, as an organic imprint film that is copied from a master. In this way, the product of the diffusion plate 1 can be provided as a transfer film product or a member surface transfer product.
  • a transfer product of the diffusion plate 1 a flat plate master or a roll master can be used, and injection molding, melt transfer, UV resin transfer using photopolymerization method, etc. can be used.
  • a diffuser plate according to an example of the present invention and a diffuser plate according to a comparative example were designed according to the design conditions described below while changing the surface structure of the microlens array.
  • Tables 1 and 2 show the design conditions of the surface structure of the microlens array and the evaluation results of the effect of suppressing the diffraction peak of diffused light regarding the diffusion plates according to the examples and comparative examples.
  • Table 2 shows examples and comparative examples that meet the requirements of formula (5), formula (6), and formula (7) (requirements of formula (8), formula (1), and formula (2)). It also shows whether or not the requirements of Equation (3), Equation (4), and Equation (7) are satisfied.
  • Examples and Comparative Examples have a lens surface shape based on the reference surface shape (reference aperture width Dk, reference radius of curvature Rk).
  • a microlens array was designed by regularly arranging a plurality of microlenses on the XY plane of the base material. At this time, a plurality of microlenses were regularly arranged along a hexagonal lattice to form a regular honeycomb array structure (see FIG. 2).
  • the reference surface shape of the microlens in Examples and Comparative Examples was spherical, and the reference aperture was circular.
  • the reference opening width Dk of the reference surface shape was set to a fixed value of 30 ⁇ m.
  • the reference radius of curvature Rk of the reference surface shape was set to a fixed value of 60 ⁇ m.
  • Example 9 the lens surface shape of each microlens was randomly varied within a small error range with respect to the reference surface shape.
  • the case where the lens surface shape is slightly varied within the range of minute error (for example, ⁇ 1% shape error) as in Example 9 above is also included in the case where the microlens of the present invention has the reference surface shape. It will be done.
  • each microlens having the above reference surface shape was shifted in the Z direction by a random shift amount ⁇ s.
  • the shift amount ⁇ s of each microlens a value was used that was randomly varied within a preset variation width ⁇ S using random numbers.
  • the fluctuation width ⁇ S was set to a different value (0.266 to 2.120 ⁇ m) for each of Examples 1 to 9.
  • the difference between the maximum value ⁇ s_max (for example, 0.266 to 2.120 ⁇ m) and the minimum value ⁇ s_min (for example, 0 ⁇ m) of the shift amount ⁇ s in each of Examples 1 to 9 is determined by the variation set in advance for each of Examples 1 to 9.
  • a step in the Z direction is formed at the boundary between adjacent microlenses, and due to the step at the boundary, the lens surfaces of adjacent microlenses become discontinuous with each other. (See Figure 5.)
  • the preferable range of the variation range ⁇ S of the shift amount ⁇ s defined by the above-mentioned equation (5) (formula (8)), equation (6) (formula (1)), and equation (7) (formula (2)) is As shown in Table 2, in Examples 2 to 9, ⁇ S was set so as to satisfy the requirements of formula (5) (formula (8)). Furthermore, in Examples 3 to 9, ⁇ S was set so as to satisfy the requirements of equation (6) (formula (1)). Furthermore, in Examples 4 and 9, ⁇ S was set so as to satisfy the requirements of Equation (7) (Equation (2)). Note that the value of "m" in Equation (8), Equation (1), and Equation (2) was set to "1".
  • a plurality of microlenses having substantially the same lens surface shape are shifted randomly in the Z direction ⁇ s within the range of variation ⁇ S. I shifted it.
  • an irregular phase difference "(n-1) ⁇ s” is imparted to the diffused light emitted from each microlens due to the lens shift. Therefore, the value of the parameter "(n-1) ⁇ S/ ⁇ ” that represents the ratio of the phase difference "(n-1) ⁇ S” corresponding to the optical maximum optical path length difference of the entire microlens array to the wavelength ⁇ . was 0.25 to 1.99.
  • KA is a graph showing the relationship with A.
  • the diffraction peak level (A) is an index representing the level (for example, amplitude) of the peak of diffracted light included in the diffused light emitted from the diffuser plate 1.
  • the measured value when simulating the diffraction peak level (for example, the amplitude of the diffraction emission line spectrum) using the microlens array without the lens shift according to Comparative Example 1 is calculated as the diffraction peak level.
  • the reference value (Ak) was set as the reference value (Ak).
  • the smaller the value of the diffraction peak ratio KA the more appropriately the peak of the diffracted light (especially the peak of the 0th order diffracted light) can be reduced, and the more appropriately the unnecessary diffracted light can be suppressed.
  • Diffraction peak ratio K A can be reduced to 10% or less, and the effect of suppressing diffracted light is extremely excellent.
  • B Diffraction peak ratio K A can be reduced to 30% or less, and the effect of suppressing diffracted light is outstanding.
  • C Diffraction peak ratio K A can be reduced to 60% or less, and the effect of suppressing diffracted light is excellent.
  • X Diffraction peak ratio K A is 100% (reference value), and the effect of suppressing diffracted light is poor.
  • FIGS. 25 to 34 show simulation results of the light distribution characteristics, brightness distribution, etc. of diffused light by the diffuser plates according to Comparative Example 1 and Examples 1 to 9, respectively.
  • (a) is a bitmap data image showing the surface shape of one unit cell 3 (see FIG. 1) of the microlens array, which was generated by a computer.
  • (b) is an image showing a simulation result of light distribution by electromagnetic field analysis.
  • (c) is a graph showing simulation results of the brightness distribution of diffused light projected onto a screen located at a distance of 100 mm from the diffuser plate.
  • horizontal axis horizontal coordinate position of the screen [mm]
  • vertical axis diffraction peak level A (vertical axis scale ranges from 0 to 2.4 [V/m]).
  • the diffraction peak level A is, for example, the amplitude value (electric field strength) of a bright line spectrum representing the amplitude distribution of diffused light.
  • (d) shows the diffraction peak ratio K A shown in Table 2 and the evaluation results of the diffraction peak suppression effect.
  • each microlens was randomly shifted in the Z direction, and a step was formed at the boundary between the microlenses.
  • a plurality of microlenses having substantially the same lens surface shape are regularly arranged along a hexagonal lattice, due to lens shift, spectral diffracted light and This has the effect of suppressing unnecessary diffracted light such as 0th-order diffracted light.
  • the peak of unnecessary diffracted light could be suppressed more favorably than in Comparative Example 1, and as shown in FIG.
  • the diffraction peak ratio KA was able to be reduced to 82% or less. Therefore, as shown in the evaluation results in Table 2, in Examples 1 to 9, the diffracted light suppression effect was evaluated as A to D.
  • Equation (5) 2A
  • Equation (5) 2A
  • Example 1 does not satisfy Equation (5)
  • Examples 2 to 9 do not satisfy Equation (5)
  • the parameter "(n-1) ⁇ S/ ⁇ " is 0.5 or more.
  • the diffraction peak level A could be reduced to 1.80 or less
  • the diffraction peak ratio K A could be reduced to 59% or less.
  • the evaluation of the suppressing effect on diffracted light is C rating or higher.
  • each microlens can be irregularly shifted by a shift amount ⁇ s within a more appropriate range of fluctuation ⁇ S, which can further improve the effect of suppressing diffracted light. It is thought to be from
  • each microlens can be irregularly shifted by a shift amount ⁇ s within a more appropriate variation width ⁇ S, which further improves the effect of suppressing diffracted light. This is probably because it can be improved.
  • Example 9 since Example 9 also satisfies formula (7), the diffraction peak ratio K A is sufficiently reduced, but it is about 11%, which is slightly over 10%. The reason for this is presumed to be that in Example 9, since the lens surface shape was varied within a small error range, an error also occurred in the measured value of the diffraction peak level A. In any case, it was confirmed that by satisfying formula (7) and formula (2) as in Examples 4 and 9, the diffraction peak ratio K A could be significantly reduced to 11% or less.
  • equations (3) and (4) are requirements regarding the appropriate range of the evaluation value Eva (D', ⁇ , ⁇ Z) with ⁇ , Dk, and ⁇ Z as variables.
  • Examples 5 to 8 satisfy the requirements of formula (3)
  • Examples 6 to 8 satisfy the requirements of both formula (3) and formula (4).
  • Examples 2 to 4 do not satisfy the requirements of both formula (3) and formula (4).
  • Examples 2 to 9 all satisfy the requirements of the above-mentioned formula (5), and there is no difference between Examples 2 to 9 with respect to the requirements.
  • Examples 2 to 4 which do not satisfy the requirements of both formula (3) and formula (4), as shown in Table 2, the evaluation of the suppression effect of the peak of diffracted light is A to C, while although not shown in No. 2, the evaluation of the uniformity of the intensity distribution of the diffused light was relatively poor. Therefore, in Examples 2 to 4, there is an effect of suppressing the peak of diffracted light centered on the 0th-order diffracted light, but the evaluation of the uniformity of the intensity distribution of diffused light is low, and the effect is improved to suppress the spectral diffracted light. There was room for.
  • Examples 5 to 8 that satisfy the requirements of formula (3), the evaluation of the suppressing effect on the peak of diffracted light is A to B, as shown in Table 2. However, the evaluation of the uniformity of the intensity distribution of diffused light was also relatively excellent. In Examples 5 to 8, compared to Examples 2 to 4, which do not satisfy the requirements of formula (3) above, they are more effective in suppressing spectral diffraction light and are also more effective in equalizing the intensity distribution of diffused light. It was excellent.
  • Examples 6 to 8 which satisfy not only the requirements of formula (3) but also formula (4), the suppressing effect of the peak of diffracted light is evaluated as A to B, and the intensity distribution of diffused light is uniform. The degree of evaluation was also even better than that of Example 5. Examples 6 to 8 were more effective in making the intensity distribution of diffused light more uniform than Example 5, which did not satisfy the requirements of the above formula (4).
  • the reference surface shape of the microlens (reference aperture width Dk of 30 ⁇ m, reference radius of curvature Rk of 60 m), which is assumed to be difficult to suppress zero-order diffraction light and spectral diffraction light, is used as a reference. designed a lens array.
  • a shift amount ⁇ s that randomly fluctuates with a fluctuation width ⁇ S of about 2.1 ⁇ m at maximum Each microlens was shifted irregularly in the Z direction. Then, a simulation was conducted to evaluate the homogeneity and light distribution of diffused light by comparing Examples 1 to 9 in which such lens shifts were applied and Comparative Example 1 in which no lens shifts were applied.
  • an irregular optical phase difference was imparted to the diffused light emitted from each microlens by geometrically shifting each microlens in the Z direction.
  • the irregular optical phase difference given to each microlens has an excellent effect of reducing the peak of unnecessary diffracted light such as 0th order diffracted light, and the top hat shape can be achieved without changing the diffusion angle characteristics. It was confirmed that it is possible to achieve homogeneous light distribution characteristics.
  • the plurality of microlenses 21 are arranged regularly on the XY plane of the base material 10 along a reference lattice such as a square lattice, a rectangular lattice, a hexagonal lattice, etc.
  • a reference lattice such as a square lattice, a rectangular lattice, a hexagonal lattice, etc.
  • the present invention is not limited to such examples.
  • the plurality of microlenses 21 may be arranged quasi-regularly on the XY plane of the base material 10.
  • the plurality of microlenses 21 are basically arranged along the various reference lattices described above, but may also be arranged randomly to some extent by randomly varying the lattice spacing within a minute range. Good (semi-regular arrangement).

Abstract

[Problem] To further improve an effect of suppressing unnecessary diffracted light, which includes spectral diffracted light, 0-th order diffracted light, and the like, and thereby further improve the homogeneity and light distribution characteristics of the diffused light, by using a new variable element of a microlens array structure even in a case of regularly arraying a plurality of microlenses, and by imparting irregular phase difference on the diffused light from the plurality of lenses. [Solution] Provided is a diffusion plate that is provided with a base material, and a microlens array composed of a plurality of microlenses arranged on an XY-plane on at least one of the surfaces of the base material. The surface shape of each of the microlenses is a preset reference surface shape, and the plurality of microlenses are arranged regularly on the XY-plane. Each of the microlenses is disposed at a position randomly shifted in the Z-direction, which is perpendicular to the XY-plane, from a reference position in the Z-direction. There are Z-directional steps at boundaries between the microlenses that are mutually adjacent to each other.

Description

拡散板および装置Diffuser and equipment
 本発明は、拡散板および装置に関する。 The present invention relates to a diffuser plate and a device.
 光の拡散特性を変化させるために、入射光を所望の方向に拡散させる拡散板が用いられている。拡散板は、例えば、ディスプレイ等の表示装置、プロジェクタ等の投影装置、または各種の照明装置等といった様々な装置に広く利用される。拡散板の表面形状に起因する光の屈折を利用して、入射光を所望の拡散角で拡散させるタイプの拡散板がある。当該タイプの拡散板として、数十μm程度の大きさのマイクロレンズが複数配置されたマイクロレンズアレイ型の拡散板が知られている。 In order to change the light diffusion characteristics, a diffusion plate is used to diffuse incident light in a desired direction. Diffusion plates are widely used in various devices such as display devices such as displays, projection devices such as projectors, and various lighting devices. There is a type of diffuser plate that uses light refraction caused by the surface shape of the diffuser plate to diffuse incident light at a desired diffusion angle. As this type of diffusion plate, a microlens array type diffusion plate in which a plurality of microlenses each having a size of about several tens of micrometers are arranged is known.
 かかるマイクロレンズアレイ型の拡散板では、各マイクロレンズからの光の波面が干渉した結果、マイクロレンズ配列の周期構造による回折波が生じ、拡散光の強度分布にむらが生じるという問題がある。このため、マイクロレンズの配置や、レンズ面の形状、開口の形状をばらつかせることにより、干渉や回折による拡散光の強度分布のむらを低減する技術が提案されている。 Such a microlens array type diffuser plate has a problem in that as a result of interference between the wavefronts of light from each microlens, diffraction waves are generated due to the periodic structure of the microlens array, causing unevenness in the intensity distribution of the diffused light. For this reason, techniques have been proposed to reduce unevenness in the intensity distribution of diffused light due to interference and diffraction by varying the arrangement of microlenses, the shape of lens surfaces, and the shape of apertures.
 例えば、特許文献1には、ハニカム構造を基本パターンとして、複数のマイクロレンズをランダムに配置することが開示されている。この特許文献1では、各マイクロレンズの頂点位置が、基本パターンにおける頂点位置を中心とした所定の円内に位置するように、複数のマイクロレンズが拡散板の表面上にランダムに配置されている。 For example, Patent Document 1 discloses that a plurality of microlenses are randomly arranged using a honeycomb structure as a basic pattern. In Patent Document 1, a plurality of microlenses are randomly arranged on the surface of a diffuser plate such that the apex position of each microlens is located within a predetermined circle centered on the apex position in the basic pattern. .
 また、特許文献2には、拡散板の主面上に格子状に配列された複数のマイクロレンズの断面形状と頂点の高さが互いに異なり、各マイクロレンズの表面形状が対称軸を有さない形状であることが開示されている。 Furthermore, Patent Document 2 discloses that the cross-sectional shapes and heights of the vertices of a plurality of microlenses arranged in a grid on the main surface of a diffuser plate are different from each other, and the surface shape of each microlens does not have an axis of symmetry. It is disclosed that the shape is
 また、特許文献3には、規則的に配列された複数のマイクロレンズの頂点の高さに差を設けて、各マイクロレンズからの透過光の拡散角度分布が略同一であって、一定範囲内で互いに異なる位相差が設定されたマイクロレンズが開示されている。 Furthermore, Patent Document 3 discloses that by providing a difference in the height of the vertices of a plurality of regularly arranged microlenses, the diffusion angle distribution of transmitted light from each microlens is approximately the same and is within a certain range. Microlenses having mutually different phase differences are disclosed.
 また、特許文献4には、複数のマイクロレンズ(凹部)の底部の位置が深さ方向に2以上の異なる位置となるようにマイクロレンズが形成され、当該マイクロレンズの底部が不規則に配列されつつ、規則的な配列パターンの中心点を基準して所定の円内に存在することが開示されている。 Further, in Patent Document 4, microlenses are formed such that the bottoms of a plurality of microlenses (concavities) are at two or more different positions in the depth direction, and the bottoms of the microlenses are arranged irregularly. However, it is disclosed that the pattern exists within a predetermined circle based on the center point of the regular arrangement pattern.
 また、特許文献5には、複数のマイクロレンズを基準格子に基づいて配列しつつ、当該マイクロレンズの頂点の位置を、基準格子構造の格子点の近傍に変位させることが開示されている。 Further, Patent Document 5 discloses arranging a plurality of microlenses based on a reference lattice while displacing the position of the apex of the microlens to the vicinity of a lattice point of the reference lattice structure.
特許第4981300号公報Patent No. 4981300 国際公開2016/051785号International Publication 2016/051785 特開2017-009669号JP2017-009669 特許第6680455号公報Patent No. 6680455 国際公開2015/182619号International Publication 2015/182619
 上記のように、特許文献1~5に記載の従来技術では、拡散板の表面上(XY平面上)において複数のマイクロレンズを不規則な平面位置に配置したり、規則的に配列された複数のマイクロレンズの頂点の位置をXY平面上で不規則にずらしたり、当該頂点の高さをZ方向に相互に相違させたりすることによって、複数のレンズの表面形状を不規則に変動させていた。このように、レンズの平面配置や、レンズ頂点の位置、レンズの表面形状を不規則に変動させるマイクロレンズアレイ構造により、上述した拡散光の強度分布のむらを、ある程度は低減する効果が得られる。 As mentioned above, in the conventional techniques described in Patent Documents 1 to 5, a plurality of microlenses are arranged at irregular planar positions on the surface of the diffuser plate (on the XY plane), or a plurality of microlenses are arranged regularly By irregularly shifting the positions of the vertices of the microlenses on the XY plane or by making the heights of the vertices differ from each other in the Z direction, the surface shapes of the multiple lenses were irregularly varied. . In this way, the microlens array structure in which the planar arrangement of the lenses, the position of the lens vertices, and the surface shape of the lenses are irregularly varied can have the effect of reducing the above-mentioned unevenness in the intensity distribution of the diffused light to some extent.
 しかしながら、複数のマイクロレンズが周期的に配列されたマイクロレンズアレイ構造では、当該周期構造の回折現象によりスペクトル状の回折光(拡散板からの出射光の光軸を中心として同心円状に分布するスペクトルノイズ)が発生し、拡散光の強度の均質性が低下するという問題があった。さらに、高い強度の0次回折光(出射光の光軸付近(拡散角度が0度付近)に生じるピーク状のノイズ)が発生するため、拡散光を適切に分散配光することが困難になり、拡散光の配光性が低下するという問題もあった。この点、上記従来技術の不規則なマイクロレンズアレイ構造であっても、スペクトル状の回折光や0次回折光を十分に抑制することができず、拡散光の強度分布のむらが生じてしまうため、拡散光の均質性や配光性に改善の余地があった。 However, in a microlens array structure in which a plurality of microlenses are arranged periodically, the diffraction phenomenon of the periodic structure causes spectral diffracted light (a spectrum distributed concentrically around the optical axis of the light emitted from the diffuser plate). There is a problem in that the uniformity of the intensity of the diffused light is reduced. Furthermore, since high-intensity 0th-order diffracted light (peak noise that occurs near the optical axis of the emitted light (diffusion angle is near 0 degrees)) is generated, it becomes difficult to appropriately disperse and distribute the diffused light. There was also a problem that the light distribution of the diffused light deteriorated. In this regard, even with the irregular microlens array structure of the prior art described above, it is not possible to sufficiently suppress spectral diffracted light and zero-order diffracted light, resulting in uneven intensity distribution of diffused light. There was room for improvement in the homogeneity and light distribution of diffused light.
 したがって、上記従来技術のように複数のレンズの配置や、レンズ頂点の高さまたは平面位置、レンズ表面形状を不規則に変動させること以外に、マイクロレンズアレイ構造の新たな変動要素を用いて、複数のレンズからの拡散光に不規則な位相差を付与することが希求されていた。これによって、スペクトル状の回折光や0次回折光などを含む不要な回折光の抑制効果をさらに高めて、拡散光の強度分布のむらを一層低減し、拡散光の均質性や配光性をさらに向上することが期待できる。 Therefore, in addition to irregularly varying the arrangement of a plurality of lenses, the height or plane position of the lens apex, and the lens surface shape as in the prior art described above, by using new variable elements of the microlens array structure, It has been desired to impart an irregular phase difference to the diffused light from a plurality of lenses. This further enhances the effect of suppressing unnecessary diffracted light, including spectral diffracted light and zero-order diffracted light, further reduces unevenness in the intensity distribution of diffused light, and further improves the homogeneity and light distribution of diffused light. You can expect to do so.
 特に、略同一のレンズ形状を有する複数のマイクロレンズを規則的に配列する場合(例えば、矩形格子状または六方格子状など正規配列する場合)には、レンズごとの輝度むらやちらつきを抑制できるという利点がある。しかし、複数のマイクロレンズを規則的に配列する場合には、不規則に配列する場合と比べて、上述したレンズの周期構造に起因したスペクトル状の回折光や0次回折光などを含む不要な回折光の発生が、さらに顕著になってしまうという問題がある。したがって、当該規則的な配列の場合には、上述したマイクロレンズアレイ構造の新たな変動要素を用いて、複数のレンズからの拡散光に不規則な位相差を付与することが、より一層希求されていた。 In particular, when multiple microlenses having approximately the same lens shape are arranged regularly (for example, when arranged regularly in a rectangular lattice shape or a hexagonal lattice shape), it is possible to suppress brightness unevenness and flickering for each lens. There are advantages. However, when multiple microlenses are arranged regularly, compared to the case where they are arranged irregularly, unnecessary diffracted light including spectral diffracted light and zero-order diffracted light due to the periodic structure of the lenses described above is generated. There is a problem in that the generation of light becomes even more noticeable. Therefore, in the case of the regular arrangement, it is even more desirable to use the above-mentioned new variable element of the microlens array structure to impart an irregular phase difference to the diffused light from the plurality of lenses. was.
 なお、特許文献3には、規則的に配置された複数のマイクロレンズに位相差を与える嵩上げ部分を、レンズ部に連続して形成し、この嵩上げ部分をレンズ部よりも傾斜が大きい凸曲面もしくは凹曲面とするとともに、マイクロレンズの凸部の最大高さと最小高さとの差を所定範囲に制御することが開示されている。しかしながら、特許文献3のように、マイクロレンズの嵩上げ部分を、傾斜した凸曲面もしくは凹曲面で構成すると、拡散配光のカットオフ性や均一性が劣化したり、各マイクロレンズごとの局部的な細かな輝度変化(むら)、ちらつきが発生したりするという問題があった。 In addition, Patent Document 3 discloses that a raised part that gives a phase difference to a plurality of regularly arranged microlenses is continuously formed in the lens part, and this raised part is formed into a convex curved surface having a larger slope than the lens part or It is disclosed that the convex portion of the microlens has a concave curved surface and the difference between the maximum height and the minimum height of the convex portion of the microlens is controlled within a predetermined range. However, if the raised portion of the microlens is configured with an inclined convex curved surface or concave curved surface as in Patent Document 3, the cutoff property and uniformity of the diffused light distribution may deteriorate, and the local There were problems with small brightness changes (unevenness) and flickering.
 そこで、本発明は、上記事情に鑑みてなされたものであり、本発明の目的とするところは、複数のマイクロレンズを規則的に配列する場合であっても、マイクロレンズアレイ構造の新たな変動要素を用いて、複数のレンズからの拡散光に不規則な位相差を付与することによって、スペクトル状の回折光や0次回折光などを含む不要な回折光の抑制効果をさらに高めて、拡散光の均質性や配光性をさらに向上することにある。 Therefore, the present invention has been made in view of the above circumstances, and an object of the present invention is to solve new variations in the microlens array structure even when a plurality of microlenses are regularly arranged. By using elements to impart an irregular phase difference to the diffused light from multiple lenses, the effect of suppressing unnecessary diffracted light including spectral diffracted light and 0th order diffracted light is further enhanced, and the diffused light The objective is to further improve the homogeneity and light distribution of the light.
 上記課題を解決するために、本発明のある観点によれば、
 基材と、
 前記基材の少なくとも一方の表面におけるXY平面上に配置された複数のマイクロレンズから構成されるマイクロレンズアレイと、
を備え、
 前記各マイクロレンズの表面形状は、予め設定された基準表面形状を有し、
 前記複数のマイクロレンズは、前記XY平面上に規則的に配列されており、
 前記各マイクロレンズは、前記XY平面に対して垂直なZ方向の基準位置から、前記Z方向にランダムにシフトした位置に配置されており、
 相互に隣接する前記複数のマイクロレンズ間の境界には、前記Z方向の段差が存在する、拡散板が提供される。
In order to solve the above problems, according to a certain aspect of the present invention,
base material and
a microlens array composed of a plurality of microlenses arranged on an XY plane on at least one surface of the base material;
Equipped with
The surface shape of each microlens has a preset reference surface shape,
The plurality of microlenses are regularly arranged on the XY plane,
Each of the microlenses is arranged at a position randomly shifted in the Z direction from a reference position in the Z direction perpendicular to the XY plane,
A diffusion plate is provided at a boundary between the plurality of microlenses that are adjacent to each other, and the step in the Z direction is present.
 前記段差は、前記XY平面に対して垂直な平坦面からなるようにしてもよい。 The step may be made of a flat surface perpendicular to the XY plane.
 前記各マイクロレンズの前記Z方向のシフト量Δsは、所定の変動幅δSの範囲内でランダムに変動しているようにしてもよい。 The shift amount Δs of each microlens in the Z direction may vary randomly within a predetermined variation width δS.
 λが入射光の波長[μm]であり、nが前記マイクロレンズアレイを形成している材質の屈折率であるとき、
 前記シフト量Δsの前記変動幅δSは、下記式(5)を満たすようにしてもよい。
When λ is the wavelength of the incident light [μm] and n is the refractive index of the material forming the microlens array,
The fluctuation range δS of the shift amount Δs may satisfy the following formula (5).
Figure JPOXMLDOC01-appb-M000009
Figure JPOXMLDOC01-appb-M000009
 前記シフト量Δsの前記変動幅δSは、下記式(6)を満たすようにしてもよい。 The fluctuation range δS of the shift amount Δs may satisfy the following formula (6).
Figure JPOXMLDOC01-appb-M000010
Figure JPOXMLDOC01-appb-M000010
 前記シフト量Δsの前記変動幅δSは、下記式(7)を実質的に満たすようにしてもよい。 The fluctuation width δS of the shift amount Δs may substantially satisfy the following formula (7).
Figure JPOXMLDOC01-appb-M000011
Figure JPOXMLDOC01-appb-M000011
 mが1以上の整数であり、λが入射光の波長[μm]であり、nが前記マイクロレンズアレイを形成している材質の屈折率であるとき、
 前記シフト量Δsの前記変動幅δS[μm]は、下記式(8)を満たすようにしてもよい。
When m is an integer of 1 or more, λ is the wavelength of the incident light [μm], and n is the refractive index of the material forming the microlens array,
The fluctuation width δS [μm] of the shift amount Δs may satisfy the following formula (8).
Figure JPOXMLDOC01-appb-M000012
Figure JPOXMLDOC01-appb-M000012
 前記シフト量Δsの前記変動幅δS[μm]は、下記式(1)を満たすようにしてもよい。 The fluctuation width δS [μm] of the shift amount Δs may satisfy the following formula (1).
Figure JPOXMLDOC01-appb-M000013
Figure JPOXMLDOC01-appb-M000013
 前記シフト量Δsの前記変動幅δS[μm]は、下記式(2)を実質的に満たすようにしてもよい。 The fluctuation width δS [μm] of the shift amount Δs may substantially satisfy the following formula (2).
Figure JPOXMLDOC01-appb-M000014
Figure JPOXMLDOC01-appb-M000014
 下記式(3)を満たすようにしてもよい。 The following formula (3) may be satisfied.
Figure JPOXMLDOC01-appb-M000015

 Eva(D’,λ,δZ):前記式(3)で定められる評価値
 λ:入射光の波長[μm]
 n:前記マイクロレンズアレイを形成している材質の屈折率
 δZ:前記各マイクロレンズの頂点の高さhの最大値hmaxと最小値hminとの差[μm]
 Dk:前記基準表面形状の基準開口幅[μm]。前記基準開口幅Dkは、前記基準表面形状の円形の基準開口の直径である。
 D’:前記基準表面形状の有効開口幅[μm]。前記有効開口幅D’は、前記基準開口幅Dkを直径とする円に内接する正六角形に内接する内接円の直径である。
Figure JPOXMLDOC01-appb-M000015

Eva (D', λ, δZ) : Evaluation value determined by the above formula (3) λ: Wavelength of incident light [μm]
n: refractive index of the material forming the microlens array δZ: difference between the maximum value h max and the minimum value h min of the height h of the apex of each of the microlenses [μm]
Dk: Reference opening width [μm] of the reference surface shape. The reference opening width Dk is the diameter of the circular reference opening of the reference surface shape.
D': Effective opening width [μm] of the reference surface shape. The effective opening width D' is the diameter of an inscribed circle inscribed in a regular hexagon that is inscribed in a circle whose diameter is the reference opening width Dk.
 下記式(4)を満たすようにしてもよい。 The following formula (4) may be satisfied.
Figure JPOXMLDOC01-appb-M000016
Figure JPOXMLDOC01-appb-M000016
 前記XY平面上において、前記複数のマイクロレンズは相互に隙間なく配置されており、相互に隣接する前記複数のマイクロレンズ間の境界に平坦部が存在しないようにしてもよい。 On the XY plane, the plurality of microlenses may be arranged with no gaps between them, and there may be no flat portion at the boundary between the plurality of mutually adjacent microlenses.
 前記複数のマイクロレンズの表面形状は、相互に同一であるようにしてもよい。 The surface shapes of the plurality of microlenses may be the same.
 前記各マイクロレンズの表面形状は、対称軸を有する非球面形状又は球面形状であるようにしてもよい。 The surface shape of each microlens may be an aspherical shape or a spherical shape having an axis of symmetry.
 前記マイクロレンズは、シリンドリカルレンズであるようにしてもよい。 The microlens may be a cylindrical lens.
 前記複数のマイクロレンズのうち少なくとも一部の光軸は、前記Z方向に対して、0°超、60°以下の傾斜角αで傾斜しているようにしてもよい。 The optical axis of at least some of the plurality of microlenses may be inclined with respect to the Z direction at an inclination angle α of more than 0° and less than 60°.
 前記複数のマイクロレンズの前記光軸の前記傾斜角αは、相互に異なり、
 前記傾斜角αは、所定の基準傾斜角αkを基準として、所定の変動範囲でランダムに変動しているようにしてもよい。
The inclination angles α of the optical axes of the plurality of microlenses are different from each other,
The inclination angle α may vary randomly within a predetermined variation range with respect to a predetermined reference inclination angle αk.
 前記基準表面形状の基準開口は、円形、楕円形、または、正方形、矩形、ひし形もしくは六角形を含む多角形状であるようにしてもよい。 The reference opening of the reference surface shape may be circular, oval, or polygonal including square, rectangle, diamond, or hexagon.
 前記マイクロレンズアレイを形成している材質は、ガラス、樹脂、または、半導体であるようにしてもよい。 The material forming the microlens array may be glass, resin, or semiconductor.
 上記課題を解決するために、本発明の別の観点によれば、上記の拡散板を備える、装置が提供される。 In order to solve the above problems, according to another aspect of the present invention, an apparatus is provided that includes the above diffusion plate.
 以上説明したように本発明によれば、複数のマイクロレンズを規則的に配列する場合であっても、マイクロレンズアレイ構造の新たな変動要素を用いて、複数のレンズからの拡散光に不規則な位相差を付与することによって、スペクトル状の回折光や0次回折光などを含む不要な回折光の抑制効果をさらに高めて、拡散光の均質性や配光性をさらに向上することができる。 As explained above, according to the present invention, even when a plurality of microlenses are arranged regularly, by using a new variable element of the microlens array structure, the diffused light from the plurality of lenses can be irregularly arranged. By imparting a phase difference, the effect of suppressing unnecessary diffracted light including spectral diffracted light, zero-order diffracted light, etc. can be further enhanced, and the homogeneity and light distribution of diffused light can be further improved.
本発明の一実施形態に係る拡散板を模式的に示す平面図と拡大図である。FIG. 1 is a plan view and an enlarged view schematically showing a diffusion plate according to an embodiment of the present invention. 同実施形態に係る拡散板の構成を模式的に示す拡大平面図および拡大断面図である。FIG. 2 is an enlarged plan view and an enlarged cross-sectional view schematically showing the configuration of a diffuser plate according to the same embodiment. 同実施形態に係るマイクロレンズの境界近傍を模式的に示す拡大断面図である。FIG. 3 is an enlarged cross-sectional view schematically showing the vicinity of the boundary of the microlens according to the same embodiment. 同実施形態に係るマイクロレンズの平面形状(外形)を模式的に示す平面図である。FIG. 3 is a plan view schematically showing the planar shape (outer shape) of the microlens according to the same embodiment. 同実施形態に係るマイクロレンズアレイの表面を示す拡大斜視図である。FIG. 3 is an enlarged perspective view showing the surface of the microlens array according to the same embodiment. 同実施形態に係るレンズ表面形状の変動とレンズシフトとによって、各マイクロレンズの頂点の高さが変動する態様を示す説明図である。FIG. 7 is an explanatory diagram showing a manner in which the height of the apex of each microlens changes due to a change in the lens surface shape and a lens shift according to the same embodiment. 同実施形態に係る基準開口幅と有効開口幅を示す平面図である。FIG. 3 is a plan view showing a reference aperture width and an effective aperture width according to the same embodiment. 同実施形態に係るマイクロレンズの光軸を傾斜させる態様を示す模式図である。It is a schematic diagram which shows the aspect which inclines the optical axis of the microlens based on the same embodiment. 同実施形態に係るマイクロレンズの偏向機能を示す模式図である。FIG. 3 is a schematic diagram showing a deflection function of a microlens according to the same embodiment. 同実施形態に係るアナモルフィック形状のマイクロレンズの平面形状を示す説明図である。FIG. 3 is an explanatory diagram showing a planar shape of an anamorphic microlens according to the same embodiment. 同実施形態に係るアナモルフィック形状のマイクロレンズの立体形状を示す斜視図である。FIG. 3 is a perspective view showing the three-dimensional shape of an anamorphic microlens according to the same embodiment. 同実施形態に係るトーラス形状のマイクロレンズの平面形状を示す説明図である。FIG. 3 is an explanatory diagram showing a planar shape of a torus-shaped microlens according to the same embodiment. 同実施形態に係るトーラス形状のマイクロレンズの立体形状を示す斜視図である。FIG. 2 is a perspective view showing the three-dimensional shape of a torus-shaped microlens according to the same embodiment. 同実施形態に係るトーラス形状の曲面を示す斜視図である。FIG. 3 is a perspective view showing a torus-shaped curved surface according to the same embodiment. 同実施形態に係るマイクロレンズの設計方法を示すフローチャートである。It is a flowchart which shows the design method of the microlens based on the same embodiment. 同実施形態に係るマイクロレンズのレンズ中心座標の配置を示す平面図である。FIG. 3 is a plan view showing the arrangement of lens center coordinates of the microlens according to the same embodiment. 同実施形態に係る回転対称な非球面形状を有するマイクロレンズの配置を示す平面図である。FIG. 3 is a plan view showing the arrangement of microlenses having a rotationally symmetrical aspherical shape according to the same embodiment. 同実施形態に係る回転非対称な非球面形状を有するマイクロレンズを示す斜視図である。FIG. 3 is a perspective view showing a microlens having a rotationally asymmetric aspherical shape according to the same embodiment. 同実施形態に係るマイクロレンズの表面形状の決定方法を示す斜視図である。FIG. 3 is a perspective view showing a method for determining the surface shape of a microlens according to the same embodiment. 同実施形態に係るマイクロレンズのレンズ面高さの調整方法を示す説明図である。FIG. 6 is an explanatory diagram showing a method for adjusting the lens surface height of the microlens according to the same embodiment. 同実施形態に係るマイクロレンズのレンズ面高さの調整方法を示す説明図である。FIG. 6 is an explanatory diagram showing a method for adjusting the lens surface height of the microlens according to the same embodiment. 同実施形態に係る拡散板の製造方法を示すフローチャートである。It is a flowchart which shows the manufacturing method of the diffuser plate based on the same embodiment. 実施例に係るパラメータ「(n―1)・δS/λ」の値と、回折ピークレベルAとの関係を示すグラフである。It is a graph showing the relationship between the value of the parameter “(n-1)·δS/λ” and the diffraction peak level A according to the example. 実施例に係るパラメータ「(n―1)・δS/λ」の値と、回折ピーク比率Kとの関係を示すグラフである。It is a graph showing the relationship between the value of the parameter “(n-1)·δS/λ” and the diffraction peak ratio K A according to the example. 比較例1に係る拡散板に関する説明図である。FIG. 3 is an explanatory diagram regarding a diffuser plate according to Comparative Example 1. 実施例1に係る拡散板に関する説明図である。FIG. 3 is an explanatory diagram regarding a diffuser plate according to Example 1. 実施例2に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 2. 実施例3に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 3. 実施例4に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 4. 実施例5に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 5. 実施例6に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 6. 実施例7に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 7. 実施例8に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffuser plate according to Example 8. 実施例9に係る拡散板に関する説明図である。FIG. 7 is an explanatory diagram regarding a diffusion plate according to Example 9.
 以下に添付図面を参照しながら、本発明の好適な実施の形態について詳細に説明する。なお、本明細書および図面において、実質的に同一の機能構成を有する構成要素については、同一の符号を付することにより重複説明を省略する。 Preferred embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Note that, in this specification and the drawings, components having substantially the same functional configurations are designated by the same reference numerals and redundant explanation will be omitted.
 <1.拡散板の概要>
 まず、図1~図5を参照して、本発明の一実施形態に係る拡散板1の概要について説明する。
<1. Overview of diffuser plate>
First, an overview of a diffusion plate 1 according to an embodiment of the present invention will be described with reference to FIGS. 1 to 5.
 図1~図5に示すように、本実施形態に係る拡散板1は、光を均質に拡散する機能を備えたマイクロレンズアレイ型の拡散板である。かかる拡散板1は、基材10と、当該基材10の少なくとも一方の表面(主面)におけるXY平面上に形成されたマイクロレンズアレイ20を有する。マイクロレンズアレイ20は、XY平面上に規則的に配列された複数のマイクロレンズ21から構成される。当該マイクロレンズ21は、光拡散機能を有する凸構造(凸レンズ)または凹構造(凹レンズ)からなり、例えば、数十μm程度の開口幅D(レンズ径、開口径とも称する。)と、数十μm程度の曲率半径Rを有する。なお、拡散板1は、マイクロレンズアレイ20を備えたものであれば、入射光を透過させる透過型の拡散板であってもよいし、あるいは、入射光を反射させる反射型の拡散板であってもよい。 As shown in FIGS. 1 to 5, the diffusion plate 1 according to the present embodiment is a microlens array type diffusion plate that has a function of uniformly diffusing light. The diffusion plate 1 includes a base material 10 and a microlens array 20 formed on an XY plane on at least one surface (principal surface) of the base material 10. The microlens array 20 is composed of a plurality of microlenses 21 regularly arranged on the XY plane. The microlens 21 has a convex structure (convex lens) or a concave structure (concave lens) having a light diffusion function, and has an aperture width D (also referred to as a lens diameter or aperture diameter) of about several tens of μm, for example, and an aperture width D of about several tens of μm. It has a radius of curvature R of approximately Note that the diffusion plate 1 may be a transmission type diffusion plate that transmits incident light, or a reflection type diffusion plate that reflects incident light, as long as it is equipped with the microlens array 20. It's okay.
 また、上記のように複数のマイクロレンズ21は、基材10のXY平面上に、規則的に配列されている。例えば、図1、図2の例では、各マイクロレンズ21は正六角形の平面形状(開口形状)を有しており、複数のマイクロレンズ21は、基材10のXY平面上に、六方格子状に正規配列されている。ただし、複数のマイクロレンズ21は、六方格子以外にも、例えば、正方格子、矩形格子、三角格子またはその他の多角形格子など、各種の基準格子に基づいて規則的に配列されてもよい。ここで、「規則的に配列される」とは、実質的に規則的に配列されることを意味する。「実質的に規則的に配列される」とは、例えば、基準格子に完全に一致して正規配列される場合だけでなく、微小な誤差(例えば、±1%の配置誤差)の範囲内で、基準格子に対してずれて配列される場合も含む。 Furthermore, as described above, the plurality of microlenses 21 are regularly arranged on the XY plane of the base material 10. For example, in the examples shown in FIGS. 1 and 2, each microlens 21 has a regular hexagonal planar shape (aperture shape), and the plurality of microlenses 21 are arranged in a hexagonal lattice shape on the XY plane of the base material 10. are normally arranged. However, the plurality of microlenses 21 may be regularly arranged based on various reference lattices other than the hexagonal lattice, such as a square lattice, a rectangular lattice, a triangular lattice, or other polygonal lattices. Here, "regularly arranged" means substantially regularly arranged. "Substantially regularly arranged" means, for example, not only when perfectly aligned with the reference grid and normally arranged, but also within a minute error (for example, ±1% placement error). , including the case where the grid is shifted from the reference grid.
 そして、本実施形態に係る拡散板1では、各マイクロレンズ21の表面形状(三次元的な立体形状)は、球面形状または非球面形状を有している。各マイクロレンズ21は、球面レンズまたは非球面レンズとなっている。さらに、各マイクロレンズ21の表面形状(以下、「レンズ表面形状」と称する場合もある。)は、予め設定された所定の基準表面形状を有している。各マイクロレンズ21の表面形状は、例えば、基準表面形状と一致することが好ましく、その結果、複数のマイクロレンズ21が相互に同一の表面形状を有していることが好ましい。 In the diffuser plate 1 according to the present embodiment, the surface shape (three-dimensional shape) of each microlens 21 has a spherical shape or an aspherical shape. Each microlens 21 is a spherical lens or an aspherical lens. Furthermore, the surface shape of each microlens 21 (hereinafter sometimes referred to as "lens surface shape") has a predetermined reference surface shape set in advance. The surface shape of each microlens 21 preferably matches, for example, the reference surface shape, and as a result, it is preferable that the plurality of microlenses 21 have the same surface shape.
 しかし、本発明は、かかる例に限定されず、各マイクロレンズ21の表面形状は、基準表面形状と実質的に同一な形状であってもよい。例えば、各マイクロレンズ21の表面形状は、基準表面形状に対して微小な誤差(例えば、±1%の形状誤差)の範囲内で変動した形状であってもよい。また、各マイクロレンズ21の表面形状は、基準表面形状に対するレンズ頂点の位置ずれが5μm以下、好ましくは0.1μm以下であるような形状であってもよい。このように、複数のマイクロレンズ21の表面形状は、相互に完全に同一な形状であってもよいし、上記形状誤差の範囲内で実質的に同一な形状であってもよい。 However, the present invention is not limited to this example, and the surface shape of each microlens 21 may be substantially the same as the reference surface shape. For example, the surface shape of each microlens 21 may be a shape that varies within a minute error (for example, a shape error of ±1%) with respect to the reference surface shape. Further, the surface shape of each microlens 21 may be such that the positional shift of the lens apex with respect to the reference surface shape is 5 μm or less, preferably 0.1 μm or less. In this way, the surface shapes of the plurality of microlenses 21 may be completely the same shape, or may be substantially the same shape within the range of the above-mentioned shape error.
 また、図1、図2に示す例では、マイクロレンズ21の基準表面形状の開口部の平面形状(基準開口の形状)は、正六角形であるが、かかる例に限定されず、例えば、円形、楕円形、または、正方形、矩形、ひし形もしくは六角形を含む多角形状などであってもよい。 In the examples shown in FIGS. 1 and 2, the planar shape of the aperture of the reference surface shape of the microlens 21 (the shape of the reference aperture) is a regular hexagon, but is not limited to this example, and may be circular, circular, etc. It may be an ellipse, or a polygonal shape including a square, rectangle, diamond, or hexagon.
 以上のように、本実施形態では、実質的に同一の表面形状を有する複数のマイクロレンズ21が、基材10のXY平面上に、実質的に規則的に配列されている。これにより、規則的に配列されたマイクロレンズ21の利点を活かすことができる。例えば、相異なる表面形状を有する複数のマイクロレンズを不規則に配置した場合には、マイクロレンズごとに輝度むらや、ちらつきが発生するという問題がある。また、マイクロレンズの表面形状がランダムに変動した形状である場合、各マイクロレンズから出射される拡散光の拡散角がばらつくため、拡散光全体のカットオフ性が低下するという問題がある。これに対し、本実施形態では、実質的に同一の表面形状を有する複数のマイクロレンズ21が実質的に規則的に配列されているので、マイクロレンズ21ごとの輝度むらや、ちらつきの発生を、顕著に低減できる。また、複数のマイクロレンズ21から出射される拡散光の拡散角を略同一にできるので、拡散光全体のカットオフ性を向上できる。 As described above, in this embodiment, the plurality of microlenses 21 having substantially the same surface shape are substantially regularly arranged on the XY plane of the base material 10. This makes it possible to take advantage of the regularly arranged microlenses 21. For example, when a plurality of microlenses having different surface shapes are arranged irregularly, there is a problem that brightness unevenness or flickering occurs for each microlens. In addition, when the surface shape of the microlens is randomly varied, the diffusion angle of the diffused light emitted from each microlens varies, which causes a problem that the cutoff property of the entire diffused light decreases. On the other hand, in this embodiment, since the plurality of microlenses 21 having substantially the same surface shape are arranged substantially regularly, uneven brightness and flickering of each microlens 21 can be prevented. It can be significantly reduced. Further, since the diffusion angles of the diffused light emitted from the plurality of microlenses 21 can be made substantially the same, the cutoff property of the entire diffused light can be improved.
 さらに、図2および図5に示すように、本実施形態では、各マイクロレンズ21は、基材10のXY平面に対して垂直なZ方向の基準位置から、Z方向にランダムにシフトした位置に配置されている。各マイクロレンズのZ方向のシフト量Δsは、所定の変動幅δSの範囲内でランダムに変動している。したがって、複数のマイクロレンズ21は、相互に異なるシフト量ΔsでZ方向にシフトしている。この結果、XY平面上で相互に隣接する複数のマイクロレンズ21間の境界には、Z方向の段差23が存在する。 Furthermore, as shown in FIGS. 2 and 5, in this embodiment, each microlens 21 is positioned at a position randomly shifted in the Z direction from a reference position in the Z direction perpendicular to the XY plane of the base material 10. It is located. The shift amount Δs of each microlens in the Z direction varies randomly within a predetermined variation width δS. Therefore, the plurality of microlenses 21 are shifted in the Z direction by mutually different shift amounts Δs. As a result, a step 23 in the Z direction exists at the boundary between the plurality of microlenses 21 adjacent to each other on the XY plane.
 このように、本実施形態に係るマイクロレンズ21は、XY平面上では規則的に配列されつつ、ランダムなシフト量ΔsでZ方向にシフトした位置に配置されている。ここで、マイクロレンズ21のZ方向のシフトとは、マイクロレンズ21の表面形状をZ方向に変形させるのではなく、マイクロレンズ21の表面形状をZ方向に平行移動させること(Z方向の基準位置からZ方向に上下動させること)を意味する。マイクロレンズ21をZ方向にシフト量Δsだけシフトすることにより、当該マイクロレンズ21から出射される拡散光に対して、シフト量Δsに応じた位相差を付与することができる。 In this way, the microlenses 21 according to the present embodiment are arranged regularly on the XY plane, but at positions shifted in the Z direction by a random shift amount Δs. Here, shifting the microlens 21 in the Z direction does not mean changing the surface shape of the microlens 21 in the Z direction, but moving the surface shape of the microlens 21 in parallel in the Z direction (from the reference position in the Z direction). (to move up and down in the Z direction). By shifting the microlens 21 in the Z direction by the shift amount Δs, it is possible to impart a phase difference corresponding to the shift amount Δs to the diffused light emitted from the microlens 21.
 かかるマイクロレンズ21のZ方向のシフトは、マイクロレンズアレイ構造の変動要素として、従来には無い新たな変動要素である。本実施形態に係るマイクロレンズアレイ20では、上記のようなマイクロレンズ21のZ方向のランダムなシフトと、実質的に同一なレンズ表面形状を有する複数のマイクロレンズ21の規則的な配列とを組み合わせることを特徴としている。 This shift of the microlens 21 in the Z direction is a new variable element that does not exist in the past as a variable element of the microlens array structure. The microlens array 20 according to this embodiment combines the above-described random shift of the microlenses 21 in the Z direction with a regular arrangement of a plurality of microlenses 21 having substantially the same lens surface shape. It is characterized by
 これにより、複数のマイクロレンズ21から出射される拡散光に、より一層不規則な位相差を付与することができる。したがって、各マイクロレンズ21から出射される拡散光の回折を打ち消し合わせることができるので、従来では十分に抑制できなかったスペクトル状の回折光や0次回折光などを含む不要な回折光の抑制効果をさらに高めることができる。よって、複数のマイクロレンズ21からの拡散光が相互に干渉したり回折したりすることにより生じる拡散光の強度分布のむらを、より一層効果的に抑制できるので、拡散光の均質性や配光性をさらに向上することができる。 Thereby, a more irregular phase difference can be imparted to the diffused light emitted from the plurality of microlenses 21. Therefore, since the diffraction of the diffused light emitted from each microlens 21 can be canceled out, the effect of suppressing unnecessary diffracted light including spectral diffracted light and zero-order diffracted light, which could not be sufficiently suppressed in the past, can be suppressed. It can be further increased. Therefore, it is possible to more effectively suppress unevenness in the intensity distribution of the diffused light caused by mutual interference or diffraction of the diffused light from the plurality of microlenses 21, thereby improving the homogeneity and light distribution of the diffused light. can be further improved.
 以上のように、本実施形態に係るマイクロレンズアレイ20によれば、規則的に配列された複数のマイクロレンズ21の利点(上述したレンズごとの輝度むら、ちらつきの低減効果や、カットオフ性の向上など)を活かしながら、規則的に配列されたレンズの周期構造に起因して発生する不要な回折光(スペクトル状の回折光や、0次回折光など)を、上記のマイクロレンズ21のZ方向のシフトによって、好適に抑制することができる。 As described above, according to the microlens array 20 according to the present embodiment, the advantages of the plurality of regularly arranged microlenses 21 (the effect of reducing brightness unevenness and flickering for each lens described above, and the cutoff property While taking advantage of the improvement, etc.), unnecessary diffracted light (spectral diffracted light, zero-order diffracted light, etc.) generated due to the periodic structure of the regularly arranged lenses is removed in the Z direction of the microlens 21. can be suitably suppressed by shifting .
 また、本実施形態によれば、例えば、XY平面上において、相互に隣接する複数のマイクロレンズ21同士の重なり量Ovが、予め設定された許容範囲内になるように、複数のマイクロレンズ21が相互に重なり合いつつ、規則的な位置に配置されてもよい。さらに、図2および図5に示すように、基材10のXY平面上において、複数のマイクロレンズ21は相互に隙間なく配置されており、相互に隣接する複数のマイクロレンズ21間の境界に平坦部が存在しないことが好ましい。即ち、基材10のXY平面上におけるマイクロレンズ21の充填率は、100%であることが好ましい。 Further, according to the present embodiment, the plurality of microlenses 21 are arranged such that, for example, on the XY plane, the amount of overlap Ov between the plurality of mutually adjacent microlenses 21 falls within a preset tolerance range. They may be arranged at regular positions, overlapping each other. Furthermore, as shown in FIGS. 2 and 5, on the XY plane of the base material 10, the plurality of microlenses 21 are arranged without any gaps between them, and the boundaries between the plurality of mutually adjacent microlenses 21 are flat. Preferably, no part is present. That is, the filling rate of the microlenses 21 on the XY plane of the base material 10 is preferably 100%.
 これにより、拡散板1の表面は、ランダムに配置された複数のマイクロレンズ21の凹凸構造で占められて、平坦部が存在しなくなる。したがって、拡散板1に対する入射光は、いずれかのマイクロレンズ21のレンズ面を透過または反射して屈折することになるので、屈折せずに基材10の平坦部をそのまま透過する0次透過光成分を抑制できる。よって、複数のマイクロレンズ21から出射する拡散光に不規則な位相差を付与して、不要な回折光の発生を抑制しつつ、拡散板1で屈折せずに透過する光の発生も防止できる。 As a result, the surface of the diffuser plate 1 is occupied by the uneven structure of the plurality of randomly arranged microlenses 21, and no flat portion exists. Therefore, the incident light on the diffuser plate 1 is transmitted or reflected by the lens surface of one of the microlenses 21 and refracted, so that the zero-order transmitted light passes through the flat part of the base material 10 without being refracted. Components can be suppressed. Therefore, by imparting an irregular phase difference to the diffused light emitted from the plurality of microlenses 21, it is possible to suppress the generation of unnecessary diffracted light and also prevent the generation of light that passes through the diffuser plate 1 without being refracted. .
 また、上記のように、各マイクロレンズ21は、予め設定された基準表面形状を有しており、複数のマイクロレンズ21の表面形状は、相互に実質的に同一である。このため、複数のマイクロレンズ21の開口幅D(レンズ径)および曲率半径Rは、相互に実質的に同一である。つまり、各マイクロレンズ21の開口幅Dは、所定の基準開口幅Dkと実質的に同一である。(D[μm]=Dk[μm])。同様に、各マイクロレンズ21の曲率半径Rは、所定の基準曲率半径Rkと実質的に同一である(R[μm]=Rk[μm])。ここで、基準開口幅Dkは、マイクロレンズ21の基準表面形状の開口幅であり、基準曲率半径Rkは、マイクロレンズ21の基準表面形状の曲率半径である。基準表面形状は、マイクロレンズ21の設計の基準となるレンズ表面形状である。これにより、複数のマイクロレンズ21の表面形状を、所定の基準表面形状に合わせることができる。 Furthermore, as described above, each microlens 21 has a preset reference surface shape, and the surface shapes of the plurality of microlenses 21 are substantially the same. Therefore, the aperture width D (lens diameter) and radius of curvature R of the plurality of microlenses 21 are substantially the same. That is, the aperture width D of each microlens 21 is substantially the same as the predetermined reference aperture width Dk. (D [μm] = Dk [μm]). Similarly, the radius of curvature R of each microlens 21 is substantially the same as the predetermined reference radius of curvature Rk (R [μm] = Rk [μm]). Here, the reference aperture width Dk is the aperture width of the reference surface shape of the microlens 21, and the reference radius of curvature Rk is the radius of curvature of the reference surface shape of the microlens 21. The reference surface shape is a lens surface shape that serves as a reference for designing the microlens 21. Thereby, the surface shapes of the plurality of microlenses 21 can be matched to the predetermined reference surface shape.
 このように、本実施形態に係る各マイクロレンズ21の表面形状は、予め設定された基準表面形状を基準とした三次元形状である。ここで、各マイクロレンズ21の表面形状(レンズ表面形状)および基準表面形状は、対称軸を有する非球面形状又は球面形状であることが好ましい。ここで、対称軸とは、回転対称または線対称の基準となる軸である。例えば、レンズ表面形状および基準表面形状は、対称軸を中心として回転対称な立体形状であってもよいし、あるいは、対称軸を含む平面を基準として線対称な立体形状であってもよい。このように、レンズ表面形状が、対称軸を有する非球面形状又は球面形状であることにより、レンズ表面形状は、過度にいびつに歪んだ形状や、過度に不規則化された形状とならない。したがって、個々のマイクロレンズ21が、拡散板1に要求される拡散光の均質性と配光性を実現できるような拡散機能を好適に発揮できる。 In this way, the surface shape of each microlens 21 according to the present embodiment is a three-dimensional shape based on a preset reference surface shape. Here, the surface shape (lens surface shape) and reference surface shape of each microlens 21 are preferably aspherical or spherical with an axis of symmetry. Here, the axis of symmetry is an axis that serves as a reference for rotational symmetry or line symmetry. For example, the lens surface shape and the reference surface shape may be a three-dimensional shape that is rotationally symmetrical about the axis of symmetry, or a three-dimensional shape that is line symmetrical about a plane that includes the axis of symmetry. In this way, since the lens surface shape is an aspherical shape or a spherical shape having an axis of symmetry, the lens surface shape does not become an excessively distorted shape or an excessively irregular shape. Therefore, each microlens 21 can suitably exhibit a diffusion function that can realize the uniformity and light distribution of diffused light required of the diffusion plate 1.
 さらに、複数のマイクロレンズ21から出射される拡散光の拡散角が、予め設定された所定角度であり、相互に同一であることが好ましい。また、本実施形態に係る拡散板1の全体から出射される拡散光の拡散角は、例えば、0.5°以上、20°以下の範囲であることが、より効果的である。本実施形態では、マイクロレンズ21をZ方向にランダムなシフト量Δsだけシフトさせて、かつ、マイクロレンズ21間の境界に段差23を形成している。これにより、比較的狭い角度範囲の拡散角(例えば5°)を有する拡散光を出射する拡散板1において、複数のマイクロレンズ21から出射される拡散光の干渉や回折による拡散光の強度分布のむらを低減できるとともに、拡散光を均質に配光することができる。 Furthermore, it is preferable that the diffusion angles of the diffused light emitted from the plurality of microlenses 21 be a predetermined angle set in advance, and that they be the same. Further, it is more effective that the diffusion angle of the diffused light emitted from the entire diffuser plate 1 according to this embodiment is, for example, in the range of 0.5° or more and 20° or less. In this embodiment, the microlenses 21 are shifted by a random shift amount Δs in the Z direction, and a step 23 is formed at the boundary between the microlenses 21. This prevents unevenness in the intensity distribution of the diffused light due to interference and diffraction of the diffused light emitted from the plurality of microlenses 21 in the diffuser plate 1 that emits diffused light having a diffusion angle in a relatively narrow angle range (for example, 5 degrees). It is possible to reduce the amount of light and distribute the diffused light uniformly.
 また、図4に示すように、各マイクロレンズ21をXY平面に投影して平面視した場合に、各マイクロレンズ21の平面形状の外形線(境界線24)は、六方格子などの基準格子の形状に沿った直線であることが好ましい。これによって、マイクロレンズ21ごとの輝度むらやちらつきを抑制できるとともに、複数のマイクロレンズ21から出射される拡散光の拡散角を同一にすることができるので、拡散光全体のカットオフ性を向上できる。 Further, as shown in FIG. 4, when each microlens 21 is projected onto the XY plane and viewed in plan, the outline (boundary line 24) of the planar shape of each microlens 21 is the same as that of a reference lattice such as a hexagonal lattice. Preferably, it is a straight line that follows the shape. This makes it possible to suppress brightness unevenness and flickering for each microlens 21, and also to make the diffusion angles of the diffused light emitted from the plurality of microlenses 21 the same, thereby improving the cut-off performance of the entire diffused light. .
 また、複数のマイクロレンズ21のうち少なくとも一部の光軸25は、Z方向に対して、例えば、1°超、60°以下の傾斜角αで傾斜していてもよい(図8参照。)。このようにマイクロレンズ21の光軸25をZ方向に対して傾斜させることにより、当該マイクロレンズ21の表面形状も当該傾斜方向に回転させて、Z方向に対して傾斜させることができる。これにより、拡散板1を透過して拡散する出射光(拡散光)を、拡散板が有する通常の屈折作用とは異なる方向に、偏向させることができる。かかる拡散板1の偏向作用により、出射光の光束を所望方向に屈曲させることができる。 Further, the optical axes 25 of at least some of the plurality of microlenses 21 may be inclined with respect to the Z direction at an inclination angle α of, for example, more than 1° and less than 60° (see FIG. 8). . By tilting the optical axis 25 of the microlens 21 with respect to the Z direction in this way, the surface shape of the microlens 21 can also be rotated in the tilting direction and tilted with respect to the Z direction. Thereby, the emitted light (diffused light) that passes through the diffuser plate 1 and is diffused can be deflected in a direction different from the normal refraction effect of the diffuser plate. Due to the deflection effect of the diffuser plate 1, the luminous flux of the emitted light can be bent in a desired direction.
 さらに、複数のマイクロレンズ21の光軸25の傾斜角αは、相互に異なることが好ましい。そして、傾斜角αは、所定の基準傾斜角αkを基準として、所定の変動範囲内(例えば、αk±Δαの範囲内)でランダムに変動してもよい(α[°]=αk[°]±Δα[°])。これにより、複数のマイクロレンズ21から出射される拡散光をランダムに偏向させることができるので、拡散光の強度分布のむらを低減できるとともに、拡散光を均質に配光することができる。 Furthermore, it is preferable that the inclination angles α of the optical axes 25 of the plurality of microlenses 21 are different from each other. The inclination angle α may vary randomly within a predetermined variation range (for example, within the range of αk±Δα) with respect to a predetermined reference inclination angle αk (α[°]=αk[°] ±Δα [°]). Thereby, the diffused light emitted from the plurality of microlenses 21 can be randomly deflected, so that the unevenness of the intensity distribution of the diffused light can be reduced and the diffused light can be uniformly distributed.
 上記のように、本実施形態では、上述したマイクロレンズ21のZ方向のシフト量Δsをランダムに変動させるだけでなく、複数のマイクロレンズ21のXY平面上の配置や、各マイクロレンズ21の開口幅Dおよび曲率半径R、レンズ頂点の高さh、レンズ平面形状、拡散角、光軸25の傾斜角α等といった複数種類の変動要素を、マイクロレンズ21の規則的な配列から逸脱しない微小な範囲で、ランダムに変動させてもよい。これにより、マイクロレンズアレイ構造を、多様な変動要素でより一層ランダムに変動させることができる。 As described above, in this embodiment, in addition to randomly varying the shift amount Δs of the microlenses 21 in the Z direction, the arrangement of the plurality of microlenses 21 on the XY plane and the aperture of each microlens 21 are Multiple types of variable factors such as the width D and radius of curvature R, the height h of the lens apex, the lens planar shape, the diffusion angle, the inclination angle α of the optical axis 25, etc. are adjusted to a minute value that does not deviate from the regular arrangement of the microlenses 21. It may be varied randomly within the range. Thereby, the microlens array structure can be more randomly varied using various variable elements.
 なお、マイクロレンズ21は、上記のような球面形状または非球面形状のレンズの例に限定されず、シリンドリカルレンズ(図示せず。)であってもよい。例えば、シリンドリカルレンズで構成された複数のマイクロレンズ21を、基材10のXY平面上に相互に平行な方向(例えば、X方向またはY方向)に延びるように規則的に配列してもよい。これにより、複数のシリンドリカルレンズを備えた拡散板1の拡散方向に異方性を持たせることができる。このようにマイクロレンズ21がシリンドリカルレンズで構成される場合も、上記と同様に個々のシリンドリカルレンズをZ方向にランダムなシフト量Δsでシフトさせることが好ましい。これによって、シリンドリカルレンズにより拡散板1に対して異方性や狭い拡散角度を付与しつつ、当該拡散板1において、スペクトル状の回折光や0次回折光などを含む不要な回折光を抑制することが可能になる。 Note that the microlens 21 is not limited to the example of a spherical or aspherical lens as described above, but may be a cylindrical lens (not shown). For example, a plurality of microlenses 21 made up of cylindrical lenses may be regularly arranged on the XY plane of the base material 10 so as to extend in mutually parallel directions (for example, the X direction or the Y direction). Thereby, anisotropy can be imparted to the diffusion direction of the diffusion plate 1 including a plurality of cylindrical lenses. Even when the microlens 21 is composed of cylindrical lenses as described above, it is preferable to shift each cylindrical lens in the Z direction by a random shift amount Δs in the same way as described above. This allows the cylindrical lens to impart anisotropy and a narrow diffusion angle to the diffuser plate 1 while suppressing unnecessary diffracted light including spectral diffracted light and zero-order diffracted light in the diffuser plate 1. becomes possible.
 以上のように、本実施形態によれば、ランダム性の高いマイクロレンズアレイ20の3次元表面構造を実現できるので、複数のマイクロレンズ21から出射される拡散光の位相の重合せ状態を制御することができる。すなわち、本実施形態によれば、同一のレンズ表面形状を有する複数のマイクロレンズ21を規則的に配列しつつ、各マイクロレンズ21をZ方向にランダムにシフトさせ、相互に隣接するマイクロレンズ21、21の間に垂直な段差23を設ける。これによって、同一のレンズ表面形状を有する複数のマイクロレンズ21が規則的に配列される場合であっても、複数のマイクロレンズ21からの拡散光に対して、不規則な位相差を付与することができる。したがって、複数のマイクロレンズ21から出射される拡散光の回折を打ち消し合わせることができるので、スペクトル状の回折光や0次回折光などを含む不要な回折光の抑制効果を高めることができる。よって、拡散光の強度分布のむらを十分に低減できるので、拡散光の均質性や配光性をさらに向上することができる。また、本実施形態に係る拡散板1は、高透過性の輝度特性を実現するとともに、拡散光の配光の均質性を満足しつつ、有効なカットオフ性を有する拡散光の輝度分布を実現することもできる。 As described above, according to the present embodiment, it is possible to realize a three-dimensional surface structure of the microlens array 20 with high randomness, so that the superposition state of the phases of the diffused lights emitted from the plurality of microlenses 21 can be controlled. be able to. That is, according to the present embodiment, while a plurality of microlenses 21 having the same lens surface shape are regularly arranged, each microlens 21 is randomly shifted in the Z direction, and mutually adjacent microlenses 21, A vertical step 23 is provided between 21. As a result, even if a plurality of microlenses 21 having the same lens surface shape are arranged regularly, an irregular phase difference can be imparted to the diffused light from the plurality of microlenses 21. I can do it. Therefore, since the diffraction of the diffused light emitted from the plurality of microlenses 21 can be canceled out, the effect of suppressing unnecessary diffracted light including spectral diffracted light, zero-order diffracted light, etc. can be enhanced. Therefore, since the unevenness of the intensity distribution of the diffused light can be sufficiently reduced, the homogeneity and light distribution of the diffused light can be further improved. Further, the diffuser plate 1 according to the present embodiment achieves a brightness characteristic with high transmittance, satisfies the homogeneity of the light distribution of the diffused light, and realizes the brightness distribution of the diffused light with an effective cutoff property. You can also.
 以下では、以上のような特徴を有する本実施形態に係る拡散板1について、詳細に説明する。 Below, the diffuser plate 1 according to the present embodiment having the above characteristics will be described in detail.
 <2.拡散板の全体構成>
 次に、図1を参照して、本発明の一実施形態に係る拡散板1の全体構成と、マイクロレンズのレイアウトパターンについて説明する。図1は、本実施形態に係る拡散板1を模式的に示す平面図と拡大図である。
<2. Overall configuration of diffuser plate>
Next, with reference to FIG. 1, the overall configuration of a diffuser plate 1 and a layout pattern of microlenses according to an embodiment of the present invention will be described. FIG. 1 is a plan view and an enlarged view schematically showing a diffusion plate 1 according to this embodiment.
 本実施形態に係る拡散板1は、基材10上に複数のマイクロレンズ21(単レンズ)からなるマイクロレンズアレイ20が配置された、マイクロレンズアレイ型の拡散板である。かかる拡散板1のマイクロレンズアレイは、図1に示すように、複数の単位セル3から構成されている。単位セル3は、マイクロレンズ21の基本配置パターンである。個々の単位セル3の表面には、所定のレイアウトパターン(配置パターン)で複数のマイクロレンズ21が配置されている。 The diffusion plate 1 according to the present embodiment is a microlens array type diffusion plate in which a microlens array 20 consisting of a plurality of microlenses 21 (single lenses) is arranged on a base material 10. The microlens array of the diffuser plate 1 is composed of a plurality of unit cells 3, as shown in FIG. The unit cell 3 is a basic arrangement pattern of the microlenses 21. A plurality of microlenses 21 are arranged on the surface of each unit cell 3 in a predetermined layout pattern (arrangement pattern).
 ここで、図1では、拡散板1のマイクロレンズアレイ20を構成する単位セル3の形状が矩形、特に正方形である例を示している。しかしながら、単位セル3の形状は、図1に示した例に限定されるものではなく、例えば、正三角形状または正六角形状などのように、拡散板1の表面(XY平面)上を隙間なく埋めることが可能であれば、任意の形状であってもよい。 Here, FIG. 1 shows an example in which the shape of the unit cells 3 constituting the microlens array 20 of the diffuser plate 1 is rectangular, particularly square. However, the shape of the unit cell 3 is not limited to the example shown in FIG. 1. For example, the shape of the unit cell 3 is not limited to the example shown in FIG. It may have any shape as long as it can be filled.
 拡散板1のマイクロレンズアレイ20の表面を複数の単位領域に分割したとき、単位セル3は、個々の単位領域に相当する。図1の例では、拡散板1の表面上において、正方形の複数の単位セル3が、縦横に繰り返し配列されている。拡散板1を構成する単位セル3の個数は、特に限定されるものではなく、拡散板1が1つの単位セル3から構成されていてもよいし、あるいは、複数の単位セル3から構成されていてもよい。拡散板1においては、互いに異なる表面構造を有する単位セル3が繰り返し配列されてもよいし、あるいは、互いに同一の表面構造を有する単位セル3が繰り返し配列されてもよい。 When the surface of the microlens array 20 of the diffuser plate 1 is divided into a plurality of unit areas, the unit cells 3 correspond to each unit area. In the example of FIG. 1, a plurality of square unit cells 3 are repeatedly arranged vertically and horizontally on the surface of the diffuser plate 1. The number of unit cells 3 constituting the diffusion plate 1 is not particularly limited, and the diffusion plate 1 may be composed of one unit cell 3 or may be composed of a plurality of unit cells 3. It's okay. In the diffusion plate 1, unit cells 3 having mutually different surface structures may be repeatedly arranged, or unit cells 3 having the same surface structure may be repeatedly arranged.
 また、図1中の右側の拡大図に模式的に示したように、単位セル3内に設けられた複数のマイクロレンズ21のレイアウトパターン(配置パターン)は、相互に隣接する複数の単位セル3間で、単位セル3の配列方向(換言すれば、アレイ配列方向)に連続している。相互に隣接する複数の単位セル3間の境界部分においてマイクロレンズ21の表面形状の連続性を保ちながら、単位セル3を隙間なく配列することにより、マイクロレンズアレイ20が構成されている。ここで、マイクロレンズ21の表面形状の連続性とは、相互に隣接する2つの単位セル3、3のうち、一方の単位セル3の外縁に位置するマイクロレンズ21と、他方の単位セル3の外縁に位置するマイクロレンズ21とが、平面形状のずれや高さ方向の段差がなく、連続的に形成されていることを意味する。 Further, as schematically shown in the enlarged view on the right side of FIG. In between, the unit cells 3 are continuous in the arrangement direction of the unit cells 3 (in other words, the array arrangement direction). The microlens array 20 is constructed by arranging the unit cells 3 without gaps while maintaining the continuity of the surface shape of the microlenses 21 at the boundary between a plurality of mutually adjacent unit cells 3. Here, the continuity of the surface shape of the microlens 21 refers to the microlens 21 located at the outer edge of one unit cell 3 of two mutually adjacent unit cells 3, and the one located at the outer edge of the other unit cell 3. This means that the microlenses 21 located at the outer edge are formed continuously without any deviation in planar shape or step in the height direction.
 このように、本実施形態に係る拡散板1では、マイクロレンズアレイ20の単位セル3(基本構造)が、境界の連続性を保って隙間なく配列されることで、マイクロレンズアレイ20が構成されている。これにより、相互に隣接する単位セル3、3間の境界部分において、光の回折、反射、散乱等の意図しない不具合の発生を防止して、拡散板1による所望の配光特性を得ることができる。また、マイクロレンズアレイ20を単位セル3の繰り返し構造とすることにより、マイクロレンズアレイ20の設計効率と生産性を向上できる。 In this way, in the diffusion plate 1 according to the present embodiment, the unit cells 3 (basic structure) of the microlens array 20 are arranged without any gaps while maintaining the continuity of the boundaries, so that the microlens array 20 is configured. ing. This prevents the occurrence of unintended problems such as diffraction, reflection, and scattering of light at the boundary between the mutually adjacent unit cells 3 and 3, thereby making it possible to obtain desired light distribution characteristics by the diffuser plate 1. can. Moreover, by making the microlens array 20 have a structure in which the unit cells 3 are repeated, the design efficiency and productivity of the microlens array 20 can be improved.
 <3.拡散板の構成>
 次に、図2~図5を参照して、本実施形態に係る拡散板1の構成についてより詳細に説明する。図2は、本実施形態に係る拡散板1の構成を模式的に示す拡大平面図および拡大断面図である。図3は、本実施形態に係るマイクロレンズ21の境界近傍を模式的に示す拡大断面図である。図4は、本実施形態に係る基材10の表面に対して垂直な方向からマイクロレンズ21を平面視した場合のマイクロレンズ21の平面形状(外形)を模式的に示す平面図である。
<3. Diffusion plate configuration>
Next, the configuration of the diffuser plate 1 according to this embodiment will be described in more detail with reference to FIGS. 2 to 5. FIG. 2 is an enlarged plan view and an enlarged sectional view schematically showing the configuration of the diffusion plate 1 according to the present embodiment. FIG. 3 is an enlarged sectional view schematically showing the vicinity of the boundary of the microlens 21 according to this embodiment. FIG. 4 is a plan view schematically showing the planar shape (outer shape) of the microlens 21 when the microlens 21 is viewed in plan from a direction perpendicular to the surface of the base material 10 according to the present embodiment.
 図2に示すように、本実施形態に係る拡散板1は、基材10と、基材10の表面に形成されたマイクロレンズアレイ20と、を備える。 As shown in FIG. 2, the diffusion plate 1 according to the present embodiment includes a base material 10 and a microlens array 20 formed on the surface of the base material 10.
 まず、基材10について説明する。基材10は、マイクロレンズアレイ20を支持するための基板である。かかる基材10は、フィルム状であってもよく、板状であってもよい。また、基材10は、平板状であってもよく、湾曲板状であってもよい。図2に示す基材10は、例えば矩形平板状を有するが、かかる例に限定されない。基材10の形状や厚さは、拡散板1が実装される装置の形状、構成等に応じて、任意の形状および厚さであってよい。 First, the base material 10 will be explained. The base material 10 is a substrate for supporting the microlens array 20. The base material 10 may be in the form of a film or a plate. Further, the base material 10 may have a flat plate shape or a curved plate shape. The base material 10 shown in FIG. 2 has, for example, a rectangular flat plate shape, but is not limited to this example. The shape and thickness of the base material 10 may be arbitrary depending on the shape, configuration, etc. of the device in which the diffuser plate 1 is mounted.
 基材10は、光を透過することが可能な透明基材である。基材10は、拡散板1に入射する光の波長帯域において透明とみなすことが可能な材質で形成される。例えば、基材10は、可視光の波長帯域において光透過率が70%以上の材質で形成されてもよい。 The base material 10 is a transparent base material that can transmit light. The base material 10 is made of a material that can be considered transparent in the wavelength band of light incident on the diffuser plate 1. For example, the base material 10 may be formed of a material having a light transmittance of 70% or more in the wavelength band of visible light.
 基材10は、例えば、ポリメチルメタクリレート(polymethyl methacrylate:PMMA)、ポリエチレンテレフタレート(Polyethylene terephthalate:PET)、ポリカーボネート(polycarbonate:PC)、環状オレフィン・コポリマー(Cyclo Olefin Copolymer:COC)、環状オレフィンポリマー(Cyclo Olefin Polymer:COP)、トリアセチルセルロース(Triacetylcellulose:TAC)等といった公知の樹脂で形成されてもよい。あるいは、基材10は、石英ガラス、ホウケイ酸ガラス、白板ガラス等といった公知の光学ガラスで形成されてもよい。 The base material 10 is made of, for example, polymethyl methacrylate (PMMA), polyethylene terephthalate (PET), polycarbonate (PC), cyclic olefin copolymer (Cy clo Olefin Copolymer: COC), cyclic olefin polymer (Cyclo It may be formed of a known resin such as Olefin Polymer (COP), triacetylcellulose (TAC), or the like. Alternatively, the base material 10 may be formed of a known optical glass such as quartz glass, borosilicate glass, white plate glass, or the like.
 次に、マイクロレンズアレイ20について説明する。マイクロレンズアレイ20は、基材10の少なくとも一方の表面(主面)に設けられる。マイクロレンズアレイ20は、基材10の表面上に配列された複数のマイクロレンズ21(単レンズ)の集合体である。本実施形態では、図2に示すように、マイクロレンズアレイ20が、基材10の一方の表面(主面)上に形成されている。しかし、かかる例に限定されず、基材10の両方の主面(表面と裏面)に、マイクロレンズアレイ20が形成されてもよい。 Next, the microlens array 20 will be explained. The microlens array 20 is provided on at least one surface (principal surface) of the base material 10. The microlens array 20 is an aggregate of a plurality of microlenses 21 (single lenses) arranged on the surface of the base material 10. In this embodiment, as shown in FIG. 2, a microlens array 20 is formed on one surface (principal surface) of the base material 10. However, the present invention is not limited to this example, and the microlens array 20 may be formed on both main surfaces (the front surface and the back surface) of the base material 10.
 マイクロレンズアレイ20が設けられる基材10の表面は、例えば、平坦面であってよい。以下では、当該基材10の平坦な表面を、XY平面と称する場合もある。XY平面におけるX方向およびY方向は、当該基材10の表面に対して平行な方向である。X方向とY方向は相互に垂直である。また、Z方向は、基材10の表面に対して垂直な方向(即ち、法線方向)であり、拡散板1の厚み方向に相当する。Z方向は、XY平面、X方向およびY方向に対して垂直である。 The surface of the base material 10 on which the microlens array 20 is provided may be, for example, a flat surface. Below, the flat surface of the base material 10 may be referred to as an XY plane. The X direction and the Y direction in the XY plane are directions parallel to the surface of the base material 10. The X direction and the Y direction are perpendicular to each other. Further, the Z direction is a direction perpendicular to the surface of the base material 10 (that is, a normal direction), and corresponds to the thickness direction of the diffusion plate 1. The Z direction is perpendicular to the XY plane, the X direction, and the Y direction.
 なお、マイクロレンズアレイ20は、基材10自体の表面に直接的に形成されてもよいし、あるいは、基材10の表面上に積層された別の層に間接的に形成されてもよい。例えば、ガラス等からなる基材10の表面に、紫外線硬化性樹脂等からなる樹脂層を積層し、この樹脂層に対して原盤の凹凸構造を転写するなどして、当該樹脂層にマイクロレンズアレイ20を形成してもよい。 Note that the microlens array 20 may be formed directly on the surface of the base material 10 itself, or may be indirectly formed on another layer laminated on the surface of the base material 10. For example, a resin layer made of an ultraviolet curable resin or the like is laminated on the surface of the base material 10 made of glass or the like, and the uneven structure of the master is transferred to this resin layer to form a microlens array. 20 may be formed.
 マイクロレンズ21は、例えば数十μmオーダーの微細な光学レンズである。マイクロレンズ21は、マイクロレンズアレイ20の単レンズを構成する。マイクロレンズ21は、拡散板1の厚み方向に陥没するように形成された凹構造(凹レンズ)であってもよいし、拡散板1の厚み方向に突出するように形成された凸構造(凸レンズ)であってもよい。本実施形態では、図2に示すようにマイクロレンズ21が凸構造(凸レンズ)である例について説明するが、かかる例に限定されない。拡散板1の所望の光学特性に応じて、マイクロレンズ21は凹構造(凹レンズ)であってもよい。 The microlens 21 is, for example, a minute optical lens on the order of several tens of μm. The microlens 21 constitutes a single lens of the microlens array 20. The microlenses 21 may have a concave structure (concave lens) formed to recess in the thickness direction of the diffuser plate 1, or may have a convex structure (convex lens) formed to protrude in the thickness direction of the diffuser plate 1. It may be. In this embodiment, an example in which the microlens 21 has a convex structure (convex lens) as shown in FIG. 2 will be described, but the present invention is not limited to this example. Depending on the desired optical characteristics of the diffuser plate 1, the microlens 21 may have a concave structure (concave lens).
 マイクロレンズ21の表面形状(レンズ表面形状)は、球面形状または非球面形状を有する。マイクロレンズ21の表面形状は、少なくとも一部に球面成分もしくは非球面成分を含む曲面形状であれば、特に限定されない。例えば、マイクロレンズ21の表面形状は、球面成分のみを含む球面形状であってもよいし、非球面成分のみを含む非球面形状であってもよいし、あるいは、非球面成分と、球面成分またはその他の曲面成分とを含む曲面形状であってもよい。例えば、マイクロレンズ21の頂点側の部分の表面形状が非球面形状であってもよく、他の部分の表面形状が球面形状であってもよい。また、マイクロレンズ21の頂点側の部分の表面形状が球面形状であってもよく、他の部分の表面形状が非球面形状であってもよい。 The surface shape (lens surface shape) of the microlens 21 has a spherical shape or an aspherical shape. The surface shape of the microlens 21 is not particularly limited as long as it has a curved shape that includes at least a spherical component or an aspherical component at least in part. For example, the surface shape of the microlens 21 may be a spherical shape including only a spherical component, an aspheric shape including only an aspherical component, or an aspherical component and a spherical component. The curved surface shape may include other curved surface components. For example, the surface shape of the portion on the vertex side of the microlens 21 may be aspherical, and the surface shape of the other portion may be spherical. Further, the surface shape of the portion on the vertex side of the microlens 21 may be spherical, and the surface shape of the other portion may be aspherical.
 また、上述したように、マイクロレンズ21の表面形状(レンズ表面形状)は、対称軸を有する非球面形状または球面形状であることが好ましい。例えば、レンズ表面形状は、対称軸を中心として回転対称な立体形状、または対称軸を含む平面を基準として線対称な立体形状であることが好ましい。これにより、レンズ表面形状は、過度にいびつに歪んだ形状や、過度に不規則化された形状とならないので、個々のマイクロレンズ21が、拡散板1に要求される拡散光の均質性と配光性を実現できるような拡散機能を好適に発揮できる。また、上述したように、マイクロレンズ21は、XY平面上の所定方向に延びるシリンドリカルレンズで構成されてもよい。 Furthermore, as described above, the surface shape (lens surface shape) of the microlens 21 is preferably an aspherical shape or a spherical shape having an axis of symmetry. For example, the lens surface shape is preferably a three-dimensional shape that is rotationally symmetrical about an axis of symmetry or a three-dimensional shape that is axisymmetric with respect to a plane that includes the axis of symmetry. As a result, the lens surface shape does not become an excessively distorted shape or an excessively irregular shape. It can suitably exhibit a diffusion function that can realize optical properties. Furthermore, as described above, the microlens 21 may be configured with a cylindrical lens extending in a predetermined direction on the XY plane.
 また、図2に示すように、複数のマイクロレンズ21は、互いに隙間なく隣接するように密集して配置されることが好ましい。換言すると、互いに隣接する複数のマイクロレンズ21、21間の境界部分に隙間(平坦部)が存在しないように、複数のマイクロレンズ21が相互に重なり合うようにして連続的に配置されることが好ましい。このように、基材10の表面上(XY平面上)に、複数のマイクロレンズ21が隙間なく配置されることが好ましい。つまり、基材10の表面上に占めるマイクロレンズ21の充填率が100%となるように配置されることが好ましい。これにより、入射光のうち、拡散板1の表面で散乱せずにそのまま透過してしまう成分(以下、「0次透過光成分」ともいう。)を、抑制することが可能となる。その結果、複数のマイクロレンズ21が互いに隙間なく隣接するように配置されたマイクロレンズアレイ20により、拡散性能を更に向上させることが可能となる。 Further, as shown in FIG. 2, it is preferable that the plurality of microlenses 21 be arranged closely so as to be adjacent to each other without any gaps. In other words, it is preferable that the plurality of microlenses 21 are arranged continuously so as to overlap each other so that there is no gap (flat part) at the boundary between the plurality of microlenses 21, 21 adjacent to each other. . In this way, it is preferable that the plurality of microlenses 21 be arranged without gaps on the surface of the base material 10 (on the XY plane). That is, it is preferable that the microlenses 21 be arranged so that the filling rate of the microlenses 21 on the surface of the base material 10 is 100%. This makes it possible to suppress the component (hereinafter also referred to as "zero-order transmitted light component") of the incident light that passes through the surface of the diffuser plate 1 without being scattered. As a result, the microlens array 20 in which the plurality of microlenses 21 are arranged adjacent to each other without gaps can further improve the diffusion performance.
 なお、0次透過光成分を抑制するためには、基材10の上のマイクロレンズ21の充填率は、90%以上であることが好ましく、100%であることがより好ましい。ここで、充填率とは、基材10の表面上(XY平面上)において複数のマイクロレンズ21が占める部分の面積の割合である。充填率が100%であれば、マイクロレンズアレイ20の表面の大部分は、曲面成分で形成され、平坦面成分をほぼ含まないことになる。 Note that in order to suppress the zero-order transmitted light component, the filling rate of the microlenses 21 on the base material 10 is preferably 90% or more, and more preferably 100%. Here, the filling rate is the ratio of the area occupied by the plurality of microlenses 21 on the surface of the base material 10 (on the XY plane). If the filling rate is 100%, most of the surface of the microlens array 20 is formed by curved surface components and contains almost no flat surface components.
 ただし、実際のマイクロレンズアレイ20の製造上では、複数のマイクロレンズ21の曲面を連続的に接続するために、相互に隣接するマイクロレンズ21、21間の境界における変曲点近傍が略平坦となることがあり得る。このような場合、マイクロレンズ21、21間の境界において、略平坦となる変曲点近傍領域の幅(図3、図4に示すマイクロレンズ21、21間の境界線24の幅)は、1μm以下であることが好ましい。これにより、0次透過光成分を十分に抑制できる。 However, in actual manufacturing of the microlens array 20, in order to continuously connect the curved surfaces of a plurality of microlenses 21, the vicinity of the inflection point at the boundary between mutually adjacent microlenses 21, 21 is approximately flat. It could happen. In such a case, at the boundary between the microlenses 21, 21, the width of the area near the inflection point that is approximately flat (the width of the boundary line 24 between the microlenses 21, 21 shown in FIGS. 3 and 4) is 1 μm. It is preferable that it is below. Thereby, the zero-order transmitted light component can be sufficiently suppressed.
 また、本実施形態に係るマイクロレンズアレイ20では、複数のマイクロレンズ21は、XY平面上において基準格子に沿って規則的に配置される。ここで、「規則的な配置」とは、マイクロレンズアレイ20の任意の領域において、マイクロレンズ21の配置に実質的な規則性が存在することを表す。ただし、微小領域においてマイクロレンズ21の配置に何らかの不規則性が存在したとしても、任意の領域全体としてマイクロレンズの配置に規則性が存在するものは、「規則的な配置」に含まれるものとする。なお、本実施形態に係るマイクロレンズアレイ20におけるマイクロレンズ21の規則的な配置方法については、後述する。 Furthermore, in the microlens array 20 according to the present embodiment, the plurality of microlenses 21 are regularly arranged along the reference grid on the XY plane. Here, "regular arrangement" means that there is substantial regularity in the arrangement of the microlenses 21 in any region of the microlens array 20. However, even if there is some irregularity in the arrangement of the microlenses 21 in a small area, if there is regularity in the arrangement of the microlenses in the entire arbitrary area, it is considered to be included in the "regular arrangement". do. Note that a method for regularly arranging the microlenses 21 in the microlens array 20 according to this embodiment will be described later.
 さらに、各マイクロレンズ21の表面形状を決定する開口幅D、曲率半径Rなどのレンズパラメータは、予め設定された基準表面形状の基準開口幅Dk、基準曲率半径Rkと同一であるか、または、当該基準開口幅Dk、基準曲率半径Rkに対して微小な形状誤差の範囲内(例えば、Dk、Rkに対して±1%の範囲内)の値である。なお、開口幅Dは、マイクロレンズ21の開口部27(例えば、図8参照。)のX方向またはY方向の幅であり、マイクロレンズ21のレンズ径に相当する。曲率半径Rは、マイクロレンズ21の曲面形状のX方向またはY方向の曲率半径である。 Further, lens parameters such as the aperture width D and the radius of curvature R that determine the surface shape of each microlens 21 are the same as the reference aperture width Dk and the reference radius of curvature Rk of the reference surface shape set in advance, or The value is within a small shape error range with respect to the reference opening width Dk and the reference radius of curvature Rk (for example, within a range of ±1% with respect to Dk and Rk). Note that the aperture width D is the width of the aperture 27 of the microlens 21 (for example, see FIG. 8) in the X direction or the Y direction, and corresponds to the lens diameter of the microlens 21. The radius of curvature R is the radius of curvature of the curved surface shape of the microlens 21 in the X direction or the Y direction.
 なお、各マイクロレンズ21の開口幅Dは、所定の基準開口幅Dkを基準として、所定の微小な変動率δD[%](例えば、δD=±1%)の範囲内でランダムに変動してもよい(D=Dk±δD%)。同様に、各マイクロレンズの曲率半径Rは、所定の基準曲率半径Rkを基準として、所定の微小な変動率δR[%](例えば、δR=±1%)の範囲内でランダムに変動してもよい(R=Rk±δR%)。これにより、所定の基準開口幅Dk、基準曲率半径Rkを中心として、開口幅D、曲率半径Rを微小な誤差の範囲内で適切にばらつかせることができる。したがって、複数のマイクロレンズ21の規則的な配列と、拡散板1の所望の光学特性(拡散性能)を維持しつつ、各マイクロレンズ21からの拡散光の干渉や回折による拡散光の強度分布のむら(輝度むら、色むらなど)を低減できる。さらに、各マイクロレンズ21からの拡散光の局部的な細かな輝度変化やちらつきを低減できる。このように、マイクロレンズアレイ20の全体的な干渉回折の強度分布を極小化できるともに、各マイクロレンズ21単体の輝度変化も極小化できるという効果がある。 Note that the aperture width D of each microlens 21 varies randomly within a predetermined minute fluctuation rate δD [%] (for example, δD=±1%) with respect to a predetermined reference aperture width Dk. (D=Dk±δD%). Similarly, the radius of curvature R of each microlens varies randomly within a predetermined minute variation rate δR [%] (for example, δR=±1%) with respect to a predetermined reference radius of curvature Rk. (R=Rk±δR%). Thereby, the aperture width D and the radius of curvature R can be appropriately varied within a small error range around the predetermined reference aperture width Dk and reference radius of curvature Rk. Therefore, while maintaining the regular arrangement of the plurality of microlenses 21 and the desired optical characteristics (diffusion performance) of the diffuser plate 1, unevenness in the intensity distribution of the diffused light due to interference and diffraction of the diffused light from each microlens 21 can be prevented. (brightness unevenness, color unevenness, etc.) can be reduced. Furthermore, local minute brightness changes and flickering of the diffused light from each microlens 21 can be reduced. In this way, the overall intensity distribution of interference diffraction of the microlens array 20 can be minimized, and the change in brightness of each microlens 21 alone can also be minimized.
 以上のように、本実施形態に係るマイクロレンズアレイ20においては、各マイクロレンズ21は、所定の基準表面形状を基準として、実質的に同一な表面形状を有している。さらに、基材10の表面上(XY平面上)において、複数のマイクロレンズ21が互いに重なり合うように密集して連続的に配置され、かつ、個々のマイクロレンズ21は、XY平面上において規則的に配置されている。 As described above, in the microlens array 20 according to the present embodiment, each microlens 21 has substantially the same surface shape based on a predetermined reference surface shape. Furthermore, on the surface of the base material 10 (on the XY plane), the plurality of microlenses 21 are arranged densely and continuously so as to overlap each other, and the individual microlenses 21 are arranged regularly on the XY plane. It is located.
 これにより、各マイクロレンズ21の表面形状(立体的な曲面形状)および平面形状(基材10のXY平面に投影した形状)は、基準表面形状と実質的に同一な形状となる。この結果、複数のマイクロレンズ21の表面形状や平面形状は、相互に実質的に同一な形状となる。したがって、複数のマイクロレンズ21は、図2に模式的に示したように、正六角形など基準格子にの形状に従ったほぼ一定の平面形状を有するようになり、対称性を有する。 As a result, the surface shape (three-dimensional curved surface shape) and planar shape (shape projected onto the XY plane of the base material 10) of each microlens 21 become substantially the same as the reference surface shape. As a result, the surface shapes and planar shapes of the plurality of microlenses 21 become substantially the same. Therefore, as schematically shown in FIG. 2, the plurality of microlenses 21 have a substantially constant planar shape that follows the shape of the reference lattice, such as a regular hexagon, and have symmetry.
 この結果、図3に示すように、マイクロレンズ21Aの曲率半径Rと、当該マイクロレンズ21Aに隣接するマイクロレンズ21Bの曲率半径Rとは、相互に実質的に同一になる(R=R=Rk)。互いに隣接するマイクロレンズ21A、21Bの曲率半径R、Rが互いに実質的に同一である場合、図4に示すように、当該マイクロレンズ21A、21Bの間の境界線24は、実質的に直線のみで構成され、曲線を含まないようになる。 As a result, as shown in FIG. 3, the radius of curvature RA of the microlens 21A and the radius of curvature RB of the microlens 21B adjacent to the microlens 21A are substantially the same ( RA = RB = Rk). When the radii of curvature R A and R B of the microlenses 21A and 21B adjacent to each other are substantially the same, as shown in FIG. 4, the boundary line 24 between the microlenses 21A and 21B is substantially It consists only of straight lines and does not contain curves.
 具体的には、図4に示すように、基材10の表面に対して垂直な法線方向(Z方向)からマイクロレンズ21を平面視した場合を考える。この場合、マイクロレンズ21の平面形状の外形線(当該マイクロレンズ21と、隣接する他の複数のマイクロレンズ21との間の境界線24)は、直線で構成されることになる。このように、相互に隣接するマイクロレンズ21、21間の境界線24が、実質的に直線のみを含む場合、当該マイクロレンズ21、21間の境界の規則性を維持できる。よって、上述した複数のマイクロレンズ21の規則的な配列の利点(例えば、レンズごとの輝度むら、ちらつきの低減効果や、カットオフ性の向上など)を確保することができる。 Specifically, as shown in FIG. 4, consider the case where the microlens 21 is viewed from above in the normal direction (Z direction) perpendicular to the surface of the base material 10. In this case, the outline of the planar shape of the microlens 21 (the boundary line 24 between the microlens 21 and a plurality of adjacent microlenses 21) is a straight line. In this way, when the boundary line 24 between the mutually adjacent microlenses 21, 21 includes only a substantially straight line, the regularity of the boundary between the microlenses 21, 21 can be maintained. Therefore, the advantages of the regular arrangement of the plurality of microlenses 21 described above (for example, the effect of reducing uneven brightness and flickering for each lens, and the improvement of cutoff performance) can be ensured.
 <4.マイクロレンズのZ方向のシフト>
 次に、図2、図3および図5を参照して、本実施形態に係るマイクロレンズアレイ20の特徴であるレンズシフトについて詳細に説明する。図5は、本実施形態に係るマイクロレンズアレイ20の表面を示す拡大斜視図である。
<4. Shift of microlens in Z direction>
Next, the lens shift, which is a feature of the microlens array 20 according to this embodiment, will be described in detail with reference to FIGS. 2, 3, and 5. FIG. 5 is an enlarged perspective view showing the surface of the microlens array 20 according to this embodiment.
 <4.1.レンズシフトとレンズ間の段差>
 図2、図3および図5に示すように、本実施形態に係る各マイクロレンズ21は、基材10のXY平面に対して垂直なZ方向の基準位置(例えば、XY平面上においてZ座標がゼロとなる高さ位置)から、Z方向にランダムにシフトした位置に配置されている。各マイクロレンズのZ方向のシフト量Δsは、所定の変動幅δSの範囲内でランダムに変動している。例えば、変動幅δSが1μmである場合、各マイクロレンズ21のシフト量Δsは、0~1μmの変動幅の範囲内でランダムに変動する変動値に設定される。各シフト量Δsは、乱数によりランダムに決定されてもよい。
<4.1. Lens shift and difference between lenses>
As shown in FIGS. 2, 3, and 5, each microlens 21 according to the present embodiment is located at a reference position in the Z direction perpendicular to the They are placed at positions randomly shifted in the Z direction from the zero height position. The shift amount Δs of each microlens in the Z direction varies randomly within a predetermined variation width δS. For example, when the variation width δS is 1 μm, the shift amount Δs of each microlens 21 is set to a variation value that randomly varies within the variation range of 0 to 1 μm. Each shift amount Δs may be randomly determined using random numbers.
 このように、複数のマイクロレンズ21は、相互に異なるシフト量ΔsでZ方向にシフトした位置に配置されている。この結果、図2、図3および図5に示すように、XY平面上で相互に隣接する複数のマイクロレンズ21、21間の境界には、Z方向の段差23が存在する。この段差23は、例えば、Z方向に対して平行な平坦面(即ち、XY平面に対して垂直な平坦面)であることが好ましいが、Z方向に対して平行な湾曲面(即ち、XY平面に対して垂直な湾曲面)、または、Z方向に対して傾斜した平坦面もしく湾曲面などであってもよい。相互に隣接する複数のマイクロレンズ21、21間の境界に、Z方向の段差23が設けられているため、当該マイクロレンズ21、21の表面形状は相互に不連続になっている。そして、このようなマイクロレンズ21、21間の境界に形成された段差23の大きさ(Z方向の高さ)は、不規則である。 In this way, the plurality of microlenses 21 are arranged at positions shifted in the Z direction by mutually different shift amounts Δs. As a result, as shown in FIGS. 2, 3, and 5, a step 23 in the Z direction exists at the boundary between the plurality of microlenses 21, 21 that are adjacent to each other on the XY plane. For example, the step 23 is preferably a flat surface parallel to the Z direction (i.e., a flat surface perpendicular to the XY plane), but it is preferably a curved surface parallel to the Z direction (i.e., the XY plane It may be a curved surface perpendicular to the Z direction), or a flat or curved surface inclined with respect to the Z direction. Since the step 23 in the Z direction is provided at the boundary between the plurality of mutually adjacent microlenses 21, 21, the surface shapes of the microlenses 21, 21 are discontinuous with each other. The size (height in the Z direction) of the step 23 formed at the boundary between the microlenses 21, 21 is irregular.
 このように、本実施形態に係るマイクロレンズ21は、ランダムなシフト量ΔsでZ方向にシフトした位置に配置されている。これにより、各マイクロレンズ21のランダムなシフト量Δsに応じて、当該各マイクロレンズ21から出射される拡散光に対して、ランダムな位相差を付与することができる。 In this way, the microlens 21 according to the present embodiment is arranged at a position shifted in the Z direction by a random shift amount Δs. Thereby, a random phase difference can be imparted to the diffused light emitted from each microlens 21 according to the random shift amount Δs of each microlens 21.
 以上のように、本実施形態に係るマイクロレンズアレイ20では、実質的に同一形状を有する複数のマイクロレンズ21が規則的に配列されたマイクロレンズアレイ20において、各マイクロレンズ21をZ方向にランダムにシフトさせることを特徴としている。このようなレンズシフトをマイクロレンズアレイ構造の新たな変動要素として適用して、当該レンズシフトの変動に依存する位相差を、各マイクロレンズ21から出射される拡散光に付与することができる。よって、複数のマイクロレンズ21を規則的に配列する場合であっても、各マイクロレンズ21から出射される拡散光に、不規則で多様に変動する位相差を付与することができる。さらに、シフトされたマイクロレンズ21、21の間の段差23を、XY平面に対して垂直な平面とすることにより、拡散配光のカットオフ性や均一性を向上できるとともに、各マイクロレンズ21ごとの局部的な細かな輝度変化(むら)、ちらつきを低減、解消できるという効果がある。 As described above, in the microlens array 20 according to the present embodiment, in the microlens array 20 in which a plurality of microlenses 21 having substantially the same shape are regularly arranged, each microlens 21 is randomly arranged in the Z direction. It is characterized by shifting to. By applying such a lens shift as a new variable element of the microlens array structure, it is possible to impart a phase difference depending on the variation of the lens shift to the diffused light emitted from each microlens 21. Therefore, even when a plurality of microlenses 21 are arranged regularly, it is possible to impart an irregular and variously varying phase difference to the diffused light emitted from each microlens 21. Furthermore, by making the step 23 between the shifted microlenses 21, 21 a plane perpendicular to the XY plane, it is possible to improve the cutoff property and uniformity of the diffused light distribution, and to This has the effect of reducing and eliminating small local brightness changes (unevenness) and flickering.
 したがって、本実施形態によれば、各マイクロレンズ21からの拡散光に、レンズシフトによる不規則な位相差を付与することにより、当該拡散光の回折を相互に打ち消し合わせることができる。よって、拡散板1全体から出射される拡散光において、スペクトル状の回折光(拡散光全体に同心円状に生じるスペクトルノイズ)や、0次回折光(拡散角0度付近に生じるピーク状のノイズ)などを含む不要な回折光を抑制する効果を大幅に向上することができる。よって、拡散板1全体から出射される拡散光において、スペクトル状の回折光や0次回折光に起因する強度分布のむらを、より一層効果的に抑制できるので、当該拡散光の均質性や配光性をさらに向上することができる。 Therefore, according to the present embodiment, by imparting an irregular phase difference due to a lens shift to the diffused light from each microlens 21, the diffraction of the diffused light can be mutually canceled out. Therefore, in the diffused light emitted from the entire diffuser plate 1, spectral diffracted light (spectral noise that occurs concentrically in the entire diffused light), 0th-order diffracted light (peak-shaped noise that occurs near the diffusion angle of 0 degrees), etc. It is possible to significantly improve the effect of suppressing unnecessary diffracted light including. Therefore, in the diffused light emitted from the entire diffuser plate 1, unevenness in the intensity distribution caused by spectral diffracted light and zero-order diffracted light can be suppressed more effectively, thereby improving the homogeneity and light distribution of the diffused light. can be further improved.
 <4.2.レンズ高さhの変動>
 次に、図6を参照して、本実施形態に係るマイクロレンズ21に位相差を付与するための変動要因である「レンズシフト」について説明する。図6は、本実施形態に係るレンズシフトによって、各マイクロレンズ21の頂点の高さh(以下、「レンズ高さh」と称する場合もある。)が変動する態様を示す説明図である。
<4.2. Variation in lens height h>
Next, with reference to FIG. 6, "lens shift" which is a variable factor for imparting a phase difference to the microlens 21 according to this embodiment will be described. FIG. 6 is an explanatory diagram showing a manner in which the height h of the apex of each microlens 21 (hereinafter also referred to as "lens height h") changes due to the lens shift according to the present embodiment.
 上記のように、本実施形態では、同一形状を有する複数のマイクロレンズ21が規則的に配列されたマイクロレンズアレイ20において、レンズ表面形状を変動させることなく(あるいは、レンズ表面形状を微小に変動させつつ)、各マイクロレンズ21の配置をZ方向にランダムにシフトさせる(レンズシフト)。したがって、各マイクロレンズ21の頂点の高さhは、レンズシフトによって変動する。この結果、各マイクロレンズ21からの拡散光に対して、レンズシフトによる位相差が付与される。 As described above, in this embodiment, in the microlens array 20 in which a plurality of microlenses 21 having the same shape are regularly arranged, the lens surface shape is not changed (or the lens surface shape is slightly changed). ), and the arrangement of each microlens 21 is randomly shifted in the Z direction (lens shift). Therefore, the height h of the apex of each microlens 21 varies depending on the lens shift. As a result, a phase difference due to the lens shift is imparted to the diffused light from each microlens 21.
 図6は、上記のようなレンズシフトによって、レンズ高さhを不規則に変動させて位相差を付与するための、マイクロレンズ21の設計手順を示している。図6に示す各種寸法は以下のとおりである。 FIG. 6 shows a procedure for designing the microlens 21 to provide a phase difference by irregularly varying the lens height h by the lens shift as described above. The various dimensions shown in FIG. 6 are as follows.
 Dk:マイクロレンズの基準表面形状の開口幅である基準開口幅[μm]
 Rk:マイクロレンズの基準表面形状の曲率半径である基準曲率半径[μm]
 hk:マイクロレンズの基準表面形状の頂点の高さである基準レンズ高さ[μm]
 D :マイクロレンズの開口幅[μm]
 R :マイクロレンズの曲率半径[μm]
 Δs:マイクロレンズのZ方向のシフト量[μm]
 h :Z方向にシフトさせた後のマイクロレンズの頂点の高さ(レンズ高さ)[μm](h=hk+Δs)
Dk: Reference aperture width [μm] which is the aperture width of the reference surface shape of the microlens
Rk: Standard radius of curvature [μm] which is the radius of curvature of the standard surface shape of the microlens
hk: Reference lens height [μm] which is the height of the apex of the reference surface shape of the microlens
D: Microlens aperture width [μm]
R: Radius of curvature of microlens [μm]
Δs: Shift amount of microlens in Z direction [μm]
h: Height of the apex of the microlens after shifting in the Z direction (lens height) [μm] (h=hk+Δs)
 まず、図6Aに示すように、基準表面形状を有する複数のマイクロレンズ21A、21B、21Cを基材10のXY平面上に配置する。この段階では、複数のマイクロレンズ21A、21B、21Cは全て、同一の基準表面形状を有する。したがって、これらマイクロレンズ21A、21B、21Cの開口幅D、D、Dは、同一の基準開口幅Dkであり、曲率半径R、R、Rは、同一の基準曲率半径Rkである。また、これらマイクロレンズ21A、21B、21Cの高さは全て、同一の基準レンズ高さhkである。 First, as shown in FIG. 6A, a plurality of microlenses 21A, 21B, and 21C having a reference surface shape are arranged on the XY plane of the base material 10. At this stage, the plurality of microlenses 21A, 21B, and 21C all have the same reference surface shape. Therefore, the aperture widths D 1 , D 2 , and D 3 of these microlenses 21A, 21B, and 21C are the same reference aperture width Dk, and the curvature radii R 1 , R 2 , and R 3 are the same reference curvature radius Rk. It is. Further, the heights of these microlenses 21A, 21B, and 21C are all the same reference lens height hk.
 次いで、図6Bに示すように、各マイクロレンズ21A、21B、21Cを、Z方向にランダムなシフト量Δs、Δs、Δsだけシフトさせる。このレンズシフトでは、各マイクロレンズ21A、21B、21Cの表面形状は基準表面形状から変化しないが、Z方向の基準位置(例えば、Z軸座標z=0の位置)に対するマイクロレンズ21A、21B、21CのZ方向の相対位置が変化する。この結果、隣接するマイクロレンズ21A、21B、21Cの間の境界に、Z方向の段差23(垂直な平坦面)が形成される。また、マイクロレンズ21A、21B、21Cの頂点の高さh、h、hも、相異なるシフト量Δs、Δs、Δsだけ変動して、相互に異なる高さとなる。このようにして、レンズシフトにより、図6Bのレンズ高さhは、図6Aのレンズ高さhkに対して、相異なるシフト量Δsだけ変動する(h=hk+Δs)。この結果、各マイクロレンズ21の最終的なレンズ高さhは、hk+Δsとなる。 Next, as shown in FIG. 6B, each of the microlenses 21A, 21B, and 21C is shifted by random shift amounts Δs 1 , Δs 2 , and Δs 3 in the Z direction. In this lens shift, the surface shape of each microlens 21A, 21B, 21C does not change from the reference surface shape, but the microlens 21A, 21B, 21C relative to the reference position in the Z direction (for example, the position of Z-axis coordinate z=0) The relative position in the Z direction changes. As a result, a step 23 (vertical flat surface) in the Z direction is formed at the boundary between the adjacent microlenses 21A, 21B, and 21C. Furthermore, the heights h 1 , h 2 , and h 3 of the vertices of the microlenses 21A, 21B, and 21C also vary by different shift amounts Δs 1 , Δs 2 , and Δs 3 , and become different heights. In this way, due to the lens shift, the lens height h in FIG. 6B changes by a different shift amount Δs with respect to the lens height hk in FIG. 6A (h=hk+Δs). As a result, the final lens height h of each microlens 21 becomes hk+Δs.
 以上、図6を参照して説明したように、本実施形態では、マイクロレンズアレイ構造の変動要素である「レンズシフト」によって、規則的に配列された各マイクロレンズ21のレンズ高さhを不規則に変動させる。これにより、複数のマイクロレンズ21から出射される拡散光に、相互に異なる不規則な位相差を付与できるので、当該拡散光の回折を相互に打ち消し合わせて、不要な回折光を抑制することができる。 As described above with reference to FIG. 6, in this embodiment, the lens height h of each regularly arranged microlens 21 is changed by "lens shift" which is a variable element of the microlens array structure. Vary according to the rules. As a result, irregular phase differences that differ from each other can be imparted to the diffused light emitted from the plurality of microlenses 21, so that the diffraction of the diffused light can be canceled out and unnecessary diffracted light can be suppressed. can.
 <4.3.レンズシフトの変動幅δS>
 次に、本実施形態に係るマイクロレンズ21の配置をZ方向にランダムにシフトさせるときの、シフト量Δsの変動幅δSの好適な範囲について説明する。
<4.3. Lens shift variation range δS>
Next, a suitable range of the variation range δS of the shift amount Δs when the arrangement of the microlenses 21 according to the present embodiment is randomly shifted in the Z direction will be described.
 上記のように、各マイクロレンズ21のZ方向のシフト量Δs[μm]は、所定の変動幅δS[μm]の範囲内でランダムに変動している。このシフト量Δsの変動幅δSは、予め設定された固定値であり、シフト量Δsの最大値ΔsMAXと最小値ΔsMINの差分に相当する(δS=ΔsMAX-ΔsMIN)。 As described above, the shift amount Δs [μm] of each microlens 21 in the Z direction varies randomly within a predetermined variation width δS [μm]. The variation width δS of the shift amount Δs is a preset fixed value, and corresponds to the difference between the maximum value Δs MAX and the minimum value Δs MIN of the shift amount Δs (δS=Δs MAX −Δs MIN ).
 例えば、ΔsMAX(固定値)=+1.06[μm]、ΔsMIN(固定値)=0[μm]である場合、「δS(固定値)=ΔsMAX-ΔsMIN=1.06[μm]=ΔsMAX」となる。この場合、各マイクロレンズ21のZ方向のシフト量Δs(ランダム変動値)は、0~1.06[μm]の範囲内のランダムな変動値としてそれぞれ設定される。 For example, if Δs MAX (fixed value) = +1.06 [μm] and Δs MIN (fixed value) = 0 [μm], then "δS (fixed value) = Δs MAX - Δs MIN = 1.06 [μm]" =Δs MAX ”. In this case, the Z-direction shift amount Δs (random fluctuation value) of each microlens 21 is set as a random fluctuation value within the range of 0 to 1.06 [μm].
 また、ΔsMAX(固定値)=+1.06[μm]、ΔsMIN(固定値)=-0.56[μm]である場合、「δS(固定値)=ΔsMAX-ΔsMIN=1.62[μm]」となり、「δS≠ΔsMAX」となる。この場合、各マイクロレンズ21のZ方向のシフト量Δs(ランダム変動値)は、-0.56~1.06[μm]の範囲内のランダムな変動値としてそれぞれ設定される。 Also, if Δs MAX (fixed value) = +1.06 [μm] and Δs MIN (fixed value) = -0.56 [μm], then "δS (fixed value) = Δs MAX - Δs MIN = 1.62 [μm]” and “δS≠Δs MAX ”. In this case, the shift amount Δs (random variation value) of each microlens 21 in the Z direction is set as a random variation value within the range of -0.56 to 1.06 [μm].
 シフト量Δsの変動幅δSは、下記式(5)を満たすことが好ましく、式(6)を満たすことがより好ましく、式(7)を実質的に満たすことがより一層好ましい。なお、「実質的に満たす」とは、式(7)の左辺と右辺の値が完全に一致する場合だけでなく、当該左辺の値と右辺の値との間の誤差が、微細な誤差(例えば±2%の誤差)の範囲内である場合も含む。 The fluctuation range δS of the shift amount Δs preferably satisfies the following formula (5), more preferably satisfies formula (6), and even more preferably substantially satisfies formula (7). Note that "substantially satisfies" not only means that the values on the left and right sides of equation (7) completely match, but also when the error between the values on the left and right sides is a minute error ( For example, it may be within the range of ±2% error).
Figure JPOXMLDOC01-appb-M000017
Figure JPOXMLDOC01-appb-M000017
Figure JPOXMLDOC01-appb-M000018
Figure JPOXMLDOC01-appb-M000018
Figure JPOXMLDOC01-appb-M000019
Figure JPOXMLDOC01-appb-M000019
 シフト量Δsの変動幅δSが式(5)を満たすことにより、回折ピーク比率Kを60%以下に抑制することができる。δSが式(6)を満たすことにより、回折ピーク比率Kを30%以下に抑制することができる。δSが式(7)を実質的に満たすことにより、回折ピーク比率Kを10%以下に抑制することができる。 When the variation range δS of the shift amount Δs satisfies equation (5), the diffraction peak ratio K A can be suppressed to 60% or less. When δS satisfies formula (6), the diffraction peak ratio K A can be suppressed to 30% or less. When δS substantially satisfies formula (7), the diffraction peak ratio K A can be suppressed to 10% or less.
 なお、「回折ピークレベル(A)」は、拡散板1から出射される拡散光に含まれる回折光のピークのレベル(例えば、振幅)を表す指標である。「回折ピーク比率(K)」は、回折ピークレベルの基準値(Ak)に対する、測定された回折ピークレベル(A)の比率である(K[%]=(A/Ak)×100)。例えば、本実施形態に係るレンズシフトを施していないマイクロレンズアレイを備えた拡散板を用いて、回折ピークレベル(例えば、回折輝線スペクトルの振幅)を測定したときの測定値を、回折ピークレベルの基準値(Ak)として用いることができる。また、本実施形態に係るレンズシフトを施したマイクロレンズアレイ20を備えた拡散板1を用いて、拡散光の回折ピークレベル(例えば、回折輝線スペクトルの振幅)を測定したときの測定値を、回折ピークレベル(A)として用いることができる。 Note that the "diffraction peak level (A)" is an index representing the level (for example, amplitude) of the peak of diffracted light included in the diffused light emitted from the diffuser plate 1. "Diffraction peak ratio (K A )" is the ratio of the measured diffraction peak level (A) to the reference value (Ak) of the diffraction peak level (K A [%] = (A/Ak) x 100) . For example, when the diffraction peak level (for example, the amplitude of the diffraction emission line spectrum) is measured using a diffraction plate equipped with a microlens array that has not been subjected to lens shift according to the present embodiment, the measured value is the value of the diffraction peak level. It can be used as a reference value (Ak). Moreover, the measured value when the diffraction peak level (for example, the amplitude of the diffraction emission line spectrum) of the diffused light is measured using the diffuser plate 1 equipped with the microlens array 20 subjected to the lens shift according to the present embodiment, It can be used as a diffraction peak level (A).
 また、上記式(5)~(7)をそれぞれ一般化した式として、下記式(8)、(1)、(2)が考えられる。シフト量Δsの変動幅δSは、下記式(8)を満たすことが好ましく、式(1)を満たすことがより好ましく、式(2)を実質的に満たすことがより一層好ましい。なお、「実質的に満たす」とは、式(2)の左辺と右辺の値が完全に一致する場合だけでなく、当該左辺の値と右辺の値との間の誤差が、微細な誤差(例えば±2%の誤差)の範囲内である場合も含む。 Additionally, the following formulas (8), (1), and (2) can be considered as formulas that are generalized versions of the above formulas (5) to (7), respectively. The variation width δS of the shift amount Δs preferably satisfies the following formula (8), more preferably satisfies formula (1), and even more preferably substantially satisfies formula (2). Note that "substantially satisfies" not only means that the values on the left and right sides of equation (2) completely match, but also when the error between the values on the left and right sides is a minute error ( For example, it may be within the range of ±2% error).
 δSが式(8)を満たすことにより、回折ピーク比率Kを60%以下に抑制することができる。δSが式(1)を満たすことにより、回折ピーク比率Kを30%以下に抑制することができる。δSが式(2)を実質的に満たすことにより、回折ピーク比率Kを10%以下に抑制することができる。 When δS satisfies formula (8), the diffraction peak ratio K A can be suppressed to 60% or less. When δS satisfies formula (1), the diffraction peak ratio K A can be suppressed to 30% or less. When δS substantially satisfies formula (2), the diffraction peak ratio K A can be suppressed to 10% or less.
Figure JPOXMLDOC01-appb-M000020
Figure JPOXMLDOC01-appb-M000020
Figure JPOXMLDOC01-appb-M000021
Figure JPOXMLDOC01-appb-M000021
Figure JPOXMLDOC01-appb-M000022
Figure JPOXMLDOC01-appb-M000022
 なお、上記の式(5)~(8)、式(1)、式(2)において、「m」は、1以上の整数(m=1,2,3,・・・)である。「λ」は、拡散板1に入射する入射光の波長[μm]である。「n」は、マイクロレンズアレイ20を形成している材質の屈折率である。 Note that in the above equations (5) to (8), equation (1), and equation (2), "m" is an integer of 1 or more (m=1, 2, 3, . . . ). “λ” is the wavelength [μm] of the incident light that enters the diffuser plate 1. “n” is the refractive index of the material forming the microlens array 20.
 ここで、マイクロレンズアレイ20を形成している材質の屈折率nについて説明する。マイクロレンズアレイ20を形成している材質とは、マイクロレンズアレイ20が形成されている部材(光が通過する媒体)の材質を意味する。マイクロレンズアレイ20を形成している材質(以下、「マイクロレンズアレイ20の材質」と称する場合もある。)は、例えば、ガラス、樹脂または半導体などである。なお、入射光が可視光である場合、ガラスまたは樹脂を材質とするマイクロレンズアレイ20が用いられる。一方、入射光が赤外光である場合、半導体を材質とするマイクロレンズアレイ20が用いられる。 Here, the refractive index n of the material forming the microlens array 20 will be explained. The material forming the microlens array 20 means the material of the member (medium through which light passes) on which the microlens array 20 is formed. The material forming the microlens array 20 (hereinafter sometimes referred to as "the material of the microlens array 20") is, for example, glass, resin, or semiconductor. Note that when the incident light is visible light, a microlens array 20 made of glass or resin is used. On the other hand, when the incident light is infrared light, a microlens array 20 made of semiconductor is used.
 上述したとおり、マイクロレンズアレイ20が、ガラス製の基材10の表面に直接的に形成されている場合、マイクロレンズアレイ20の材質は、ガラスである。一方、マイクロレンズアレイ20が、ガラス製の基材10の表面に積層された別の層に間接的に形成されている場合には、マイクロレンズアレイ20の材質は、当該別の層の材質(例えば、上記各種の樹脂、半導体など)である。例えば、ガラス製の基材10の表面に、上記各種の樹脂からなる樹脂層を積層し、原盤を用いて当該樹脂層にマイクロレンズアレイ20の凹凸構造を転写して、マイクロレンズアレイ20を形成する場合がある。この場合には、マイクロレンズアレイ20の材質は、当該樹脂層を形成している樹脂である。 As described above, when the microlens array 20 is formed directly on the surface of the glass base material 10, the material of the microlens array 20 is glass. On the other hand, when the microlens array 20 is indirectly formed on another layer laminated on the surface of the glass base material 10, the material of the microlens array 20 is the material of the other layer ( For example, the above-mentioned various resins, semiconductors, etc.). For example, the microlens array 20 is formed by laminating a resin layer made of the above-mentioned various resins on the surface of the glass base material 10 and transferring the uneven structure of the microlens array 20 to the resin layer using a master. There are cases where In this case, the material of the microlens array 20 is the resin forming the resin layer.
 このように、マイクロレンズアレイ20の材質が異なる場合、当該マイクロレンズアレイ20を光が通過するときの屈折率nも異なる値となる。なお、屈折率nは、マイクロレンズアレイ20の材質の絶対屈折率である。 In this way, when the microlens array 20 is made of different materials, the refractive index n when light passes through the microlens array 20 also has different values. Note that the refractive index n is the absolute refractive index of the material of the microlens array 20.
 次に、上記の式(5)~(8)、式(1)および式(2)に含まれているパラメータ「(n―1)・δS」と「(n―1)・δS/λ」の技術的意義について説明する。 Next, the parameters “(n-1)・δS” and “(n-1)・δS/λ” included in the above equations (5) to (8), equation (1), and equation (2) Explain the technical significance of
 マイクロレンズアレイ20の構造面に接する外部媒体が空気である場合を想定し、空気の屈折率n’(絶対屈折率)が概ね「1」であると考える(n’=1)。この場合、マイクロレンズアレイ20の材質の屈折率nと、空気の屈折率n’との間に、屈折率差(n-1)が生じる。 Assuming that the external medium in contact with the structural surface of the microlens array 20 is air, it is assumed that the refractive index n' (absolute refractive index) of air is approximately "1" (n'=1). In this case, a refractive index difference (n-1) occurs between the refractive index n of the material of the microlens array 20 and the refractive index n' of air.
 本実施形態では、上記のように各マイクロレンズ21が、変動幅δSの範囲内のランダムなシフト量ΔsでZ方向にシフトしている。これにより、入射光がマイクロレンズアレイ20を通過するとき、各マイクロレンズ21のシフト量Δsによって、各マイクロレンズ21から出射される拡散光に、ランダムな位相差が付与される。シフト量Δsにより各マイクロレンズ21に付与される位相差としては、シフト量Δsだけを考慮した距離的な光路長差「Δs」に相当する位相差よりも、上記屈折率差(n-1)およびシフト量Δsの双方を考慮した光学的な光路長差「(n―1)・Δs」に相当する位相差を用いることが好ましい。この光学的な光路長差「(n―1)・Δs」は、シフト量Δsによる光路長差だけでなく、マイクロレンズアレイ20の材質や波長λに依存する屈折率nの変化も反映させた位相差を表している。 In this embodiment, as described above, each microlens 21 is shifted in the Z direction by a random shift amount Δs within the range of fluctuation width δS. Thereby, when the incident light passes through the microlens array 20, a random phase difference is imparted to the diffused light emitted from each microlens 21 depending on the shift amount Δs of each microlens 21. The phase difference given to each microlens 21 by the shift amount Δs is the refractive index difference (n-1) rather than the phase difference corresponding to the distance optical path length difference "Δs" considering only the shift amount Δs. It is preferable to use a phase difference corresponding to an optical optical path length difference "(n-1)·Δs" that takes into account both the shift amount Δs and the shift amount Δs. This optical optical path length difference "(n-1)・Δs" reflects not only the optical path length difference due to the shift amount Δs, but also the change in the refractive index n that depends on the material of the microlens array 20 and the wavelength λ. It represents the phase difference.
 そして、マイクロレンズアレイ20全体に付与される位相差としても、変動幅δSだけを考慮した距離的な最大光路長差「δS」に相当する位相差よりも、上記屈折率差(n-1)および変動幅δSの双方を考慮した光学的な最大光路長差「(n―1)・δS」に相当する位相差を用いることが好ましい。この光学的な最大光路長差「(n―1)・δS」に起因して、マイクロレンズアレイ20の複数のマイクロレンズ21から出射される拡散光同士の干渉効果が変化することが考えられる。そこで、本実施形態では、マイクロレンズアレイ20全体に付与される最大位相差を表すパラメータとして、「(n―1)・δS/λ」というパラメータを用いて、回折光の抑制効果を評価する。このパラメータ「(n―1)・δS/λ」は、入射光の波長λに対する、上記光学的な最大光路長差「(n―1)・δS」に相当する位相差の比率を表す。 As for the phase difference imparted to the entire microlens array 20, the above refractive index difference (n-1) It is preferable to use a phase difference corresponding to the optical maximum optical path length difference "(n-1).delta.S" taking into account both the variation width .delta.S and the variation width .delta.S. It is conceivable that the interference effect between the diffused lights emitted from the plurality of microlenses 21 of the microlens array 20 changes due to this optical maximum optical path length difference “(n−1)·δS”. Therefore, in this embodiment, the effect of suppressing diffracted light is evaluated using a parameter "(n-1)·δS/λ" as a parameter representing the maximum phase difference imparted to the entire microlens array 20. This parameter “(n-1)·δS/λ” represents the ratio of the phase difference corresponding to the optical maximum optical path length difference “(n-1)·δS” to the wavelength λ of the incident light.
 上記の式(5)は、上記パラメータ「(n―1)・δS/λ」が「0.5」以上であることを表している。つまり、式(5)は、上記光学的な最大光路長差「(n―1)・δS」が波長λの0.5倍以上であることを表している。この式(5)を満たすことにより、本実施形態に係るレンズシフトにより付与される最大光路長差「(n―1)・δS」を、波長λに対して適切な値に設定できる。これにより、複数のマイクロレンズ21から出射される拡散光に対して、当該最大光路長差「(n―1)・δS」の範囲内で不規則な位相差を適切に付与できる。したがって、かかる不規則な位相差が付与された拡散光同士を好適に干渉させ、拡散光の回折を相互に打ち消し合わせることができる。よって、マイクロレンズアレイ20全体から出射される拡散光において、回折光のピーク、特に0次回折光のピークを好適に抑制することができるので、回折ピーク比率Kを60%以下に抑制することができる。 The above equation (5) indicates that the parameter "(n-1)·δS/λ" is equal to or greater than "0.5". In other words, equation (5) indicates that the optical maximum optical path length difference "(n-1)·δS" is 0.5 times or more the wavelength λ. By satisfying this equation (5), the maximum optical path length difference “(n−1)·δS” given by the lens shift according to the present embodiment can be set to an appropriate value for the wavelength λ. Thereby, an irregular phase difference can be appropriately imparted to the diffused light emitted from the plurality of microlenses 21 within the range of the maximum optical path length difference “(n−1)·δS”. Therefore, the diffused lights to which such irregular phase differences are imparted can suitably interfere with each other, and the diffraction of the diffused lights can be canceled out. Therefore, in the diffused light emitted from the entire microlens array 20, the peak of the diffracted light, especially the peak of the 0th order diffracted light, can be suitably suppressed, so that the diffraction peak ratio KA can be suppressed to 60% or less. can.
 また、上記の式(6)は、上記パラメータ「(n―1)・δS/λ」が「0.75」以上であることを表している。つまり、式(6)は、上記光学的な最大光路長差「(n―1)・δS」が波長λの0.75倍以上であることを表している。この式(6)を満たすことにより、本実施形態に係るレンズシフトにより付与される最大光路長差「(n―1)・δS」を、波長λに対してより適切な値に設定できる。これにより、複数のマイクロレンズ21から出射される拡散光に対して、当該最大光路長差「(n―1)・δS」の範囲内で不規則な位相差をより適切に付与できる。したがって、かかる不規則な位相差が付与された拡散光同士をより好適に干渉させ、拡散光の回折を相互に打ち消し合わせることができる。よって、マイクロレンズアレイ20全体から出射される拡散光において、回折光のピーク、特に0次回折光のピークをより好適に抑制することができるので、回折ピーク比率Kを30%以下に抑制することができる。 Furthermore, the above equation (6) indicates that the parameter "(n-1)·δS/λ" is equal to or greater than "0.75". In other words, equation (6) indicates that the optical maximum optical path length difference "(n-1)·δS" is 0.75 times or more the wavelength λ. By satisfying this equation (6), the maximum optical path length difference “(n−1)·δS” given by the lens shift according to the present embodiment can be set to a more appropriate value for the wavelength λ. Thereby, an irregular phase difference can be more appropriately imparted to the diffused light emitted from the plurality of microlenses 21 within the range of the maximum optical path length difference “(n−1)·δS”. Therefore, the diffused lights having such irregular phase differences can be caused to interfere with each other more appropriately, and the diffraction of the diffused lights can be canceled out. Therefore, in the diffused light emitted from the entire microlens array 20, the peak of the diffracted light, especially the peak of the 0th order diffracted light, can be suppressed more preferably, so the diffraction peak ratio K A can be suppressed to 30% or less. I can do it.
 また、上記の式(7)は、上記パラメータ「(n―1)・δS/λ」が「1」であることを表している。つまり、式(7)は、上記光学的な最大光路長差「(n―1)・δS」が波長λであることを表している。この式(7)を満たすことにより、本実施形態に係るレンズシフトにより付与される最大光路長差「(n―1)・δS」を、波長λに対してより一層適切な値に設定できる。これにより、複数のマイクロレンズ21から出射される拡散光に対して、当該最大光路長差「(n―1)・δS」の範囲内で不規則な位相差をより一層適切に付与できる。したがって、かかる不規則な位相差が付与された拡散光同士をより一層好適に干渉させ、拡散光の回折を相互に打ち消し合わせることができる。よって、マイクロレンズアレイ20全体から出射される拡散光において、回折光のピーク、特に0次回折光のピークをより一層好適に抑制することができるので、回折ピーク比率Kを10%以下に抑制することができる。 Furthermore, the above equation (7) indicates that the parameter "(n-1)·δS/λ" is "1". In other words, equation (7) indicates that the optical maximum optical path length difference "(n-1)·δS" is the wavelength λ. By satisfying this equation (7), the maximum optical path length difference “(n−1)·δS” given by the lens shift according to the present embodiment can be set to a more appropriate value for the wavelength λ. Thereby, it is possible to more appropriately impart an irregular phase difference to the diffused light emitted from the plurality of microlenses 21 within the range of the maximum optical path length difference “(n−1)·δS”. Therefore, the diffused lights to which such irregular phase differences have been imparted can be caused to interfere with each other even more favorably, and the diffraction of the diffused lights can be canceled out. Therefore, in the diffused light emitted from the entire microlens array 20, the peak of the diffracted light, especially the peak of the 0th order diffracted light, can be suppressed even more favorably, so the diffraction peak ratio KA is suppressed to 10% or less. be able to.
 一方、上記の式(8)は、上記光学的な最大光路長差「(n―1)・δS」が「0.5・m・λ」以上であることを表している。即ち、式(8)は、上記パラメータ「(n―1)・δS/λ」が「0.5・m」以上であることを表している。m=1である場合、式(8)は、式(5)と同義である。ここで、位相差が付与された拡散光の相互干渉により、回折光のピークを抑制する効果は、上記最大光路長差「(n―1)・δS」と波長λの整数倍との差分の大きさに依存する。このため、式(5)中のλを整数倍(m倍)しても、当該差分が同程度であれば、同等の回折光の抑制効果が得られる。したがって、上記式(5)を満たすことにより得られる回折光の抑制効果は、波長λを整数倍(m倍)した式(8)を満たすことでも得られる。よって、式(8)を満たすことによっても、式(5)と同様に、回折ピーク比率Kを60%以下に抑制することができる。 On the other hand, the above equation (8) indicates that the optical maximum optical path length difference "(n-1)·δS" is equal to or greater than "0.5·m·λ". That is, equation (8) indicates that the parameter "(n-1).delta.S/λ" is greater than or equal to "0.5.m". When m=1, equation (8) is synonymous with equation (5). Here, the effect of suppressing the peak of the diffracted light due to the mutual interference of the diffused light with a phase difference is the difference between the maximum optical path length difference "(n-1)・δS" and an integer multiple of the wavelength λ. Depends on size. Therefore, even if λ in Equation (5) is multiplied by an integral number (m times), the same effect of suppressing the diffracted light can be obtained as long as the difference is about the same level. Therefore, the effect of suppressing the diffracted light obtained by satisfying the above formula (5) can also be obtained by satisfying formula (8), which is an integral multiple (m times) of the wavelength λ. Therefore, by satisfying formula (8), the diffraction peak ratio K A can be suppressed to 60% or less similarly to formula (5).
 同様に、m=1である場合、式(1)は式(6)と同義であり、式(2)は式(7)と同義である。したがって、上記式(5)と式(8)の関係と同様な理由から、式(1)を満たすことによっても、式(6)と同様に、回折ピーク比率Kを30%以下に抑制することができる。また、式(2)を実質的に満たすことによっても、式(7)と同様に、回折ピーク比率Kを10%以下に抑制することができる。 Similarly, when m=1, equation (1) is synonymous with equation (6), and equation (2) is synonymous with equation (7). Therefore, for the same reason as the relationship between equations (5) and (8) above, by satisfying equation (1), the diffraction peak ratio K A can be suppressed to 30% or less, as in equation (6). be able to. Further, by substantially satisfying the equation (2), the diffraction peak ratio K A can be suppressed to 10% or less similarly to the equation (7).
 <4.3.レンズ高さhの最大高低差δZ>
 次に、図7を参照して、本実施形態に係るマイクロレンズ21の頂点の高さhの最大高低差δZに関する関係式について説明する。なお、以下の説明で用いる記号や用語は以下のとおりである。
<4.3. Maximum height difference δZ of lens height h>
Next, with reference to FIG. 7, a relational expression regarding the maximum height difference δZ of the height h of the apex of the microlens 21 according to the present embodiment will be described. Note that the symbols and terms used in the following explanation are as follows.
 Eva(D’,λ,δZ):下記式(3)で定められる評価値
 λ:入射光の波長[μm]
 n:マイクロレンズアレイ20を形成している材質の屈折率[無次元量]
 δZ:マイクロレンズアレイ20を構成する複数のマイクロレンズ21の頂点の高さhの最大値hmaxと最小値hminとの差[μm](δZ=hmax-hmin
 Dk:基準表面形状の基準開口幅[μm]。図7に示すように、基準開口幅Dkは、基準表面形状の円形の基準開口60の直径である。
 D’:基準表面形状の有効開口幅[μm]。図7に示すように、有効開口幅D’は、基準開口幅Dkを直径とする円(即ち、基準開口60)に内接する正六角形62に内接する内接円64の直径である。XY平面上に複数のマイクロレンズ21の基準表面形状を六方細密で規則的に配置する場合、当該マイクロレンズ21の円形の基準開口が内接円64となり、当該円形の基準開口の開口幅が有効開口幅D’となる。
Eva (D',λ,δZ) : Evaluation value determined by the following formula (3) λ: Wavelength of incident light [μm]
n: refractive index of the material forming the microlens array 20 [dimensionless quantity]
δZ: Difference [μm] between the maximum value h max and the minimum value h min of the height h of the apex of the plurality of microlenses 21 constituting the microlens array 20 (δZ=h max - h min )
Dk: Reference opening width of reference surface shape [μm]. As shown in FIG. 7, the reference opening width Dk is the diameter of the circular reference opening 60 having the reference surface shape.
D': Effective opening width of the reference surface shape [μm]. As shown in FIG. 7, the effective opening width D' is the diameter of an inscribed circle 64 that is inscribed in a regular hexagon 62 that is inscribed in a circle whose diameter is the reference opening width Dk (that is, the reference opening 60). When the reference surface shapes of a plurality of microlenses 21 are regularly arranged in a hexagonal dense manner on the XY plane, the circular reference aperture of the microlens 21 becomes the inscribed circle 64, and the aperture width of the circular reference aperture is effective. The opening width becomes D'.
 図6で説明したように、本実施形態に係る複数のマイクロレンズ21の頂点の高さ(レンズ高さh)は、レンズシフトによって、不規則に変動している。レンズ高さhの最大高低差δZは、複数のマイクロレンズ21のレンズ高さhのうち、最も高いレンズ高さhmaxと最も低いレンズ高さhminとの差である(δZ=hmax-hmin)。本実施形態では、レンズ表面形状は変動していないので、レンズ高さhの変動は、レンズシフトのシフト量Δsに依存する。各マイクロレンズ21のシフト量Δsは、所定の変動幅δSの範囲内でランダムに設定される。したがって、レンズ高さhの最大高低差δZは、シフト量Δsの変動幅δSと実質的に同一である(δZ≒δS)。 As described with reference to FIG. 6, the heights of the vertices (lens height h) of the plurality of microlenses 21 according to this embodiment vary irregularly due to lens shift. The maximum height difference δZ of the lens heights h is the difference between the highest lens height h max and the lowest lens height h min among the lens heights h of the plurality of microlenses 21 (δZ=h max - h min ). In this embodiment, since the lens surface shape does not change, the change in the lens height h depends on the shift amount Δs of the lens shift. The shift amount Δs of each microlens 21 is randomly set within a predetermined fluctuation width δS. Therefore, the maximum height difference δZ of the lens height h is substantially the same as the variation width δS of the shift amount Δs (δZ≈δS).
 本実施形態に係るマイクロレンズアレイ20において、最大高低差δZと有効開口幅D’と波長λと屈折率nは、下記式(3)を満たすことが好ましい。この式(3)を満たすことにより、評価値Eva(D’,λ,δZ)が10以上となり、拡散板1全体からの拡散光において、スペクトル状の回折光を好適に抑制でき、拡散光の強度分布を均質化および均斉化する効果がある。 In the microlens array 20 according to the present embodiment, it is preferable that the maximum height difference δZ, the effective aperture width D', the wavelength λ, and the refractive index n satisfy the following formula (3). By satisfying this formula (3), the evaluation value Eva (D', λ, δZ) becomes 10 or more, and in the diffused light from the entire diffuser plate 1, spectral diffracted light can be suitably suppressed, and the diffused light It has the effect of homogenizing and equalizing the intensity distribution.
Figure JPOXMLDOC01-appb-M000023
Figure JPOXMLDOC01-appb-M000023
 さらに、最大高低差δZと有効開口幅D’と波長λと屈折率nは、下記式(4)を満たすことがより好ましい。この式(4)を満たすことにより、評価値Eva(D’,λ,δZ)が15以上となり、拡散板1全体からの拡散光において、スペクトル状の回折光をより一層抑制でき、拡散光の強度分布を均質化および均斉化する効果をより一層向上できる。 Furthermore, it is more preferable that the maximum height difference δZ, the effective aperture width D', the wavelength λ, and the refractive index n satisfy the following formula (4). By satisfying this formula (4), the evaluation value Eva (D', λ, δZ) becomes 15 or more, and in the diffused light from the entire diffuser plate 1, spectral diffracted light can be further suppressed, and the diffused light The effect of homogenizing and equalizing the intensity distribution can be further improved.
Figure JPOXMLDOC01-appb-M000024
Figure JPOXMLDOC01-appb-M000024
 <5.マイクロレンズの光軸の傾斜と、拡散光の偏向機能>
 次に、図8を参照して、本実施形態に係る光軸25が傾斜したマイクロレンズ21について説明する。図8は、本実施形態に係るマイクロレンズ21の光軸25を傾斜させる態様を示す模式図である。図8中の上側の図(図8A)は、光軸25を傾斜させる前のマイクロレンズ21の表面形状(基準非球面形状)を示す。図8中の下側の図(図8B)は、光軸25を傾斜させた後のマイクロレンズ21の表面形状(傾斜非球面形状)を示す。なお、以下の説明では、マイクロレンズ21の表面26を「レンズ面26」と称し、マイクロレンズ21の表面形状(つまり、レンズ面26の曲面形状)を「レンズ表面形状」と称する場合もある。なお、以下では、レンズ表面形状が、対称軸を有する非球面形状である例について説明するが、レンズ表面形状は球面形状であってもよいし、シリンドリカルレンズ形状であってもよい。
<5. Microlens optical axis tilt and diffused light deflection function>
Next, with reference to FIG. 8, a microlens 21 having an inclined optical axis 25 according to this embodiment will be described. FIG. 8 is a schematic diagram showing a mode in which the optical axis 25 of the microlens 21 according to this embodiment is tilted. The upper diagram in FIG. 8 (FIG. 8A) shows the surface shape (reference aspheric shape) of the microlens 21 before the optical axis 25 is tilted. The lower diagram in FIG. 8 (FIG. 8B) shows the surface shape (tilted aspherical shape) of the microlens 21 after the optical axis 25 is tilted. Note that in the following description, the surface 26 of the microlens 21 may be referred to as the "lens surface 26", and the surface shape of the microlens 21 (that is, the curved shape of the lens surface 26) may be referred to as the "lens surface shape". Note that although an example in which the lens surface shape is an aspherical shape having an axis of symmetry will be described below, the lens surface shape may be a spherical shape or a cylindrical lens shape.
 <5.1.傾斜した光軸とレンズ表面形状>
 図8に示すように、本実施形態に係るマイクロレンズ21のレンズ面26の曲面形状(レンズ表面形状)は、例えば、楕円面、放物面または双曲面などの非球面形状を有してもよい。図8では、レンズ面26の非球面形状が、光軸25の方向に縦長の楕円面(コーニック係数K>0)である例を示している。なお、楕円面は、回転楕円体の表面である回転楕円面を意味する。回転楕円体は、楕円をその長軸又は短軸を回転軸として得られる回転体である。K>0の場合の楕円面は、楕円の長軸を回転軸として得られる回転楕円体(つまり、長楕円体)の表面である。一方、-1<K<0の場合の楕円面は、楕円の短軸を回転軸として得られる回転楕円体(つまり、扁平楕円体)の表面である。いずれの場合も、回転楕円体の回転軸(対称軸に相当する。)が、マイクロレンズ21の光軸25に一致する。
<5.1. Tilted optical axis and lens surface shape>
As shown in FIG. 8, the curved shape (lens surface shape) of the lens surface 26 of the microlens 21 according to the present embodiment may have an aspherical shape such as an ellipsoid, a paraboloid, or a hyperboloid. good. FIG. 8 shows an example in which the aspherical shape of the lens surface 26 is an ellipsoid that is vertically elongated in the direction of the optical axis 25 (Conic coefficient K>0). Note that the ellipsoidal surface means a spheroidal surface that is the surface of a spheroid. A spheroid is a rotating body obtained by using an ellipse with its major axis or minor axis as the axis of rotation. The ellipsoidal surface in the case of K>0 is the surface of a spheroid (that is, a long ellipsoid) obtained with the long axis of the ellipse as the rotation axis. On the other hand, when −1<K<0, the ellipsoidal surface is the surface of a spheroid (that is, a flat ellipsoid) obtained with the minor axis of the ellipse as the rotation axis. In either case, the axis of rotation (corresponding to the axis of symmetry) of the spheroid coincides with the optical axis 25 of the microlens 21.
 図8Aに示すように、マイクロレンズ21の光軸25を傾斜させていない場合、マイクロレンズ21の光軸25は、拡散板1の基材10の表面(XY平面)に対する法線方向(Z方向)に延びる。つまり、光軸25はZ軸に重なっている。この場合、当該マイクロレンズ21の表面形状も、Z方向に対して傾斜していない基準非球面形状(図8A)となる。本実施形態に係る基準非球面形状は、例えば、XY平面に対する法線方向(Z方向)を中心として回転対称な非球面形状である。なお、基準非球面形状は、光軸25がZ方向に平行な非球面形状であれば、例えば、Z方向を中心として回転非対称な非球面形状であってもよい。レンズ表面形状が基準非球面形状である場合、マイクロレンズ21の頂点28は、光軸25およびZ軸上に位置する。なお、基準非球面形状(図8A)は、傾斜非球面形状(図8B)を設計するときの基準となるレンズ表面形状である。 As shown in FIG. 8A, when the optical axis 25 of the microlens 21 is not inclined, the optical axis 25 of the microlens 21 is in the normal direction (Z direction) to the surface (XY plane) of the base material 10 of the diffuser plate 1. ). In other words, the optical axis 25 overlaps the Z axis. In this case, the surface shape of the microlens 21 also has a reference aspheric shape (FIG. 8A) that is not inclined with respect to the Z direction. The reference aspherical shape according to this embodiment is, for example, an aspherical shape that is rotationally symmetrical about the normal direction (Z direction) to the XY plane. Note that the reference aspherical shape may be, for example, an aspherical shape that is rotationally asymmetrical about the Z direction as long as the optical axis 25 is an aspherical shape parallel to the Z direction. When the lens surface shape is a reference aspherical shape, the vertex 28 of the microlens 21 is located on the optical axis 25 and the Z axis. Note that the reference aspherical shape (FIG. 8A) is a lens surface shape that serves as a reference when designing the inclined aspherical shape (FIG. 8B).
 マイクロレンズ21の開口幅Dは、XY平面におけるマイクロレンズ21の開口部27の幅(レンズ径)である。マイクロレンズ21の開口部27の形状は、例えば、円形、楕円形、または、正方形、矩形、ひし形、もしくは六角形、その他の多角形などであってもよいが、以下では、円形または楕円形である例について説明する。開口幅Dは、X方向の開口幅Dxと、Y方向の開口幅Dyで表される。また、マイクロレンズ21の曲率半径Rは、レンズ表面形状の頂部における曲率半径である。曲率半径Rは、X方向の曲率半径Rxと、Y方向の曲率半径Ryで表される。図8Aに示すように、レンズ表面形状が基準非球面形状であり、かつ、光軸25を中心に回転対称な形状である場合、Dx=Dy、Rx=Ryとなり、DxおよびDyは、基準開口幅Dkに等しくなり、RxおよびRyは、基準曲率半径Rkに等しくなる。 The aperture width D of the microlens 21 is the width (lens diameter) of the aperture 27 of the microlens 21 in the XY plane. The shape of the opening 27 of the microlens 21 may be, for example, a circle, an ellipse, a square, a rectangle, a diamond, a hexagon, or another polygon. An example will be explained. The opening width D is represented by an opening width Dx in the X direction and an opening width Dy in the Y direction. Further, the radius of curvature R of the microlens 21 is the radius of curvature at the top of the lens surface shape. The radius of curvature R is represented by a radius of curvature Rx in the X direction and a radius of curvature Ry in the Y direction. As shown in FIG. 8A, when the lens surface shape is a reference aspherical shape and rotationally symmetrical about the optical axis 25, Dx=Dy, Rx=Ry, and Dx and Dy are the reference aperture. It becomes equal to the width Dk, and Rx and Ry become equal to the reference radius of curvature Rk.
 一方、図8Bに示すように、本実施形態に係るマイクロレンズ21の光軸25は、拡散板1の基材10の表面(XY平面)に対する法線方向(Z方向)に対して、所定の傾斜角αで傾斜していてもよい。傾斜角αは、光軸25と法線方向(Z方向)とのなす角度である。また、光軸25の傾斜方向は、方位角βで表される。方位角βは、傾斜した光軸25をXY平面に投影した場合において、当該XY平面上に投影された光軸25と、X方向とのなす角度である。このような光軸25の傾斜に追従して、マイクロレンズ21のレンズ面26も、方位角βで表される傾斜方向に、傾斜角αで傾斜する。この結果、傾斜したマイクロレンズ21のレンズ表面形状は、基準非球面形状(図8A)を傾斜させた非球面形状、即ち、傾斜非球面形状(図8B)となる。 On the other hand, as shown in FIG. 8B, the optical axis 25 of the microlens 21 according to the present embodiment is aligned at a predetermined direction with respect to the normal direction (Z direction) to the surface (XY plane) of the base material 10 of the diffuser plate 1. It may be inclined at an inclination angle α. The tilt angle α is the angle between the optical axis 25 and the normal direction (Z direction). Further, the inclination direction of the optical axis 25 is represented by an azimuth angle β. The azimuth angle β is the angle between the optical axis 25 projected onto the XY plane and the X direction when the inclined optical axis 25 is projected onto the XY plane. Following the inclination of the optical axis 25, the lens surface 26 of the microlens 21 also inclines at an inclination angle α in the inclination direction represented by the azimuth angle β. As a result, the lens surface shape of the tilted microlens 21 becomes an aspherical shape obtained by tilting the reference aspherical shape (FIG. 8A), that is, a tilted aspherical shape (FIG. 8B).
 図8Bに示すように、マイクロレンズ21の光軸25がZ方向に対して傾斜角αで傾斜している場合、当該マイクロレンズ21の表面形状も、方位角βで表される傾斜方向に、Z方向に対して傾斜角αで傾斜した傾斜非球面形状となる。この傾斜非球面形状(図8B)は、基準非球面形状の中心点30を中心に、基準非球面形状(図8A)を傾斜角αだけ回転させた形状である。かかる傾斜非球面形状は、傾斜角αで傾斜した光軸25を中心として回転対称な非球面形状である。 As shown in FIG. 8B, when the optical axis 25 of the microlens 21 is inclined at an inclination angle α with respect to the Z direction, the surface shape of the microlens 21 also changes in the inclination direction represented by the azimuth angle β. It has an inclined aspherical shape inclined at an inclination angle α with respect to the Z direction. This inclined aspherical shape (FIG. 8B) is a shape obtained by rotating the reference aspherical shape (FIG. 8A) by an inclination angle α about the center point 30 of the reference aspherical shape. This tilted aspherical shape is rotationally symmetrical about the optical axis 25 tilted at an inclination angle α.
 なお、中心点30は、マイクロレンズ21の基準非球面形状を設計するときの原点(x,y,z)である。詳細には、マイクロレンズアレイ20の設計段階では、マイクロレンズ21の基準非球面形状の開口面を、円または楕円等に設計する。このとき、当該円の半径x(x=y)、または当該楕円の短径xと長径yが、設定した長さになるような開口面を、z=0のxy平面に設定する。このようなxyz空間における原点(x=0,y=0,z=0)が、基準非球面形状を設計するときの原点(x,y,z)であり、当該原点(x,y,z)は、上記の中心点30に相当する。また、この原点(x,y,z)は、上記のようにマイクロレンズ21の配置をZ方向にシフトさせるときの基準位置であってもよい。なお、図8では、中心点30が、基材10の表面(XY平面)上に位置するように図示されているが、中心点30は、XY平面上に位置しなくてもよい。 Note that the center point 30 is the origin (x, y, z) when designing the reference aspherical shape of the microlens 21. Specifically, in the design stage of the microlens array 20, the aperture surface of the reference aspherical shape of the microlens 21 is designed to be a circle, an ellipse, or the like. At this time, an opening surface is set on the xy plane where z=0 so that the radius x of the circle (x=y) or the minor axis x and major axis y of the ellipse have the set lengths. The origin (x=0, y=0, z=0) in such xyz space is the origin (x, y, z) when designing the reference aspherical shape, and the origin (x, y, z) ) corresponds to the center point 30 above. Moreover, this origin (x, y, z) may be a reference position when shifting the arrangement of the microlens 21 in the Z direction as described above. In addition, although the center point 30 is illustrated as being located on the surface (XY plane) of the base material 10 in FIG. 8, the center point 30 does not have to be located on the XY plane.
 上記の図8Aに示したように、レンズ表面形状が、傾斜していない基準非球面形状である場合、マイクロレンズ21の頂点28は、光軸25およびZ軸上に位置する。 As shown in FIG. 8A above, when the lens surface shape is a non-inclined standard aspherical shape, the apex 28 of the microlens 21 is located on the optical axis 25 and the Z axis.
 これに対し、図8Bに示すように、光軸25およびレンズ表面形状が傾斜すると、傾斜したマイクロレンズ21のレンズ面26の頂点29は、上記図8Aに示したレンズ面26の頂点28とは異なる位置に移動する。この頂点29は、傾斜非球面形状(図8B)のZ方向の最高点であり、傾斜角αだけ傾斜した光軸25からずれた位置に配置される。 On the other hand, as shown in FIG. 8B, when the optical axis 25 and the lens surface shape are tilted, the vertex 29 of the lens surface 26 of the tilted microlens 21 is different from the vertex 28 of the lens surface 26 shown in FIG. 8A. Move to different positions. This apex 29 is the highest point in the Z direction of the tilted aspherical shape (FIG. 8B), and is located at a position offset from the optical axis 25 tilted by the tilt angle α.
 以上のように、本実施形態では、マイクロレンズ21の光軸25とレンズ表面形状を傾斜させ、マイクロレンズ21の頂点29を光軸25からずれた位置に移動させる。これにより、光軸25が傾斜したマイクロレンズ21に光を入射したとき、当該マイクロレンズ21を透過して出射される出射光(拡散光)を、入射光に対して偏向させることができる。偏向とは、出射光の主光線の方向を、入射光の主光線の方向に対して所望方向に屈曲させて、出射光(拡散光)の主な進行方向を所望方向に偏らせることを意味する。 As described above, in this embodiment, the optical axis 25 of the microlens 21 and the lens surface shape are tilted, and the apex 29 of the microlens 21 is moved to a position offset from the optical axis 25. Thereby, when light is incident on the microlens 21 with the optical axis 25 inclined, the outgoing light (diffused light) that passes through the microlens 21 and is emitted can be deflected with respect to the incident light. Deflection means bending the direction of the principal ray of the emitted light in a desired direction with respect to the direction of the principal ray of the incident light, thereby deflecting the main traveling direction of the emitted light (diffuse light) in the desired direction. do.
 <5.2.出射光の偏向機能>
 ここで、図9を参照して、本実施形態に係るマイクロレンズ21による出射光(拡散光)の偏向機能について、より詳細に説明する。図9は、本実施形態に係るマイクロレンズ21の偏向機能を示す模式図である。図9中の上側の図(図9A)は、光軸25が傾斜していないマイクロレンズ21による透過光の拡散機能を示す。図9中の下側の図(図9B)は、光軸25が傾斜したマイクロレンズ21による透過光の拡散機能および偏向機能を示す。
<5.2. Outgoing light deflection function>
Here, with reference to FIG. 9, the deflection function of the emitted light (diffused light) by the microlens 21 according to this embodiment will be described in more detail. FIG. 9 is a schematic diagram showing the deflection function of the microlens 21 according to this embodiment. The upper diagram in FIG. 9 (FIG. 9A) shows the diffusion function of transmitted light by the microlens 21 whose optical axis 25 is not inclined. The lower diagram in FIG. 9 (FIG. 9B) shows the diffusion and deflection functions of transmitted light by the microlens 21 with the optical axis 25 inclined.
 図9に示すように、拡散板1に対する入射光40として、拡散板1の表面の法線方向(Z方向)に平行なコリメート光が入射される場合を考える。この場合、入射光40の入射角θinは、0°であり、入射光40の主光線41の方向はZ方向に平行である。拡散板1にコリメート光が入射されると、拡散板1を透過する光は、マイクロレンズ21によって拡散されるので、出射光50は拡散光となる。 As shown in FIG. 9, a case will be considered in which collimated light parallel to the normal direction (Z direction) of the surface of the diffuser plate 1 is incident as the incident light 40 to the diffuser plate 1. In this case, the incident angle θin of the incident light 40 is 0°, and the direction of the principal ray 41 of the incident light 40 is parallel to the Z direction. When the collimated light is incident on the diffuser plate 1, the light that passes through the diffuser plate 1 is diffused by the microlens 21, so the emitted light 50 becomes diffused light.
 ここで、図9Aに示すように、マイクロレンズ21の光軸25が傾斜していない場合、マイクロレンズ21を透過する光は、マイクロレンズ21の光軸25の方向(Z方向)を中心として対称に拡散される。このため、出射光50は、Z方向を中心として対称に拡散する拡散光となる。この結果、出射光50の主光線51の出射角θoutは、0°となり、出射光50の主光線51の方向は、Z方向に平行になる。 Here, as shown in FIG. 9A, if the optical axis 25 of the microlens 21 is not inclined, the light transmitted through the microlens 21 is symmetrical about the direction of the optical axis 25 of the microlens 21 (Z direction). spread to. Therefore, the emitted light 50 becomes diffused light that is symmetrically diffused around the Z direction. As a result, the outgoing angle θout of the principal ray 51 of the outgoing light 50 becomes 0°, and the direction of the principal ray 51 of the outgoing light 50 becomes parallel to the Z direction.
 一方、図9Bに示すように、マイクロレンズ21の光軸25が傾斜角αで傾斜している場合、拡散板1から出射する出射光50の主光線51は、入射光40の主光線41に対して偏向する。詳細には、拡散板1を透過する光は、Z方向とは異なる偏向方向を中心としてほぼ対称に拡散される。この偏向方向は、入射光40の主光線41に対して出射光50の主光線51が屈曲した方向であり、偏向角γで表される。図9Bに示すように、入射光40が拡散板1に対してZ方向に入射する場合(θin=0°)、出射光50の主光線51の偏向方向は、マイクロレンズ21の光軸25の傾斜方向(図9Bの右方向)に対して反対方向(図9Bの左方向)となる。この偏向方向を表す偏向角γは、光軸25の傾斜角αと、マイクロレンズ21の傾斜非球面形状、頂点29の位置などによって定まる。偏向角γは、傾斜角αに応じて変化する。レンズ表面形状が同一であれば、傾斜角αが大きいほど、偏向角γも大きくなる。 On the other hand, as shown in FIG. 9B, when the optical axis 25 of the microlens 21 is inclined at the inclination angle α, the principal ray 51 of the outgoing light 50 emitted from the diffuser plate 1 becomes the principal ray 41 of the incident light 40. deflect against. Specifically, the light that passes through the diffuser plate 1 is diffused almost symmetrically with respect to a polarization direction different from the Z direction. This deflection direction is a direction in which the principal ray 51 of the outgoing light 50 is bent with respect to the principal ray 41 of the incident light 40, and is represented by a deflection angle γ. As shown in FIG. 9B, when the incident light 40 enters the diffuser plate 1 in the Z direction (θin=0°), the deflection direction of the principal ray 51 of the output light 50 is aligned with the optical axis 25 of the microlens 21. The direction is opposite to the direction of inclination (the right direction in FIG. 9B) (the left direction in FIG. 9B). The deflection angle γ representing this deflection direction is determined by the inclination angle α of the optical axis 25, the inclined aspherical shape of the microlens 21, the position of the apex 29, etc. The deflection angle γ changes depending on the tilt angle α. If the lens surface shape is the same, the larger the inclination angle α, the larger the deflection angle γ.
 このように、マイクロレンズ21の光軸25が傾斜角αで傾斜している場合、出射光50の光束は、入射光40の光束に対して偏向方向(偏向角γで表される方向)に偏向され、当該偏向方向を中心としてほぼ対称に拡散する拡散光となる。この結果、出射光50の主光線51の出射角θoutはγ°になり、出射光50の主光線51の方向は、Z方向に対して偏向角γだけ傾斜した方向であって、光軸25の傾斜方向とは反対の方向となる。 In this way, when the optical axis 25 of the microlens 21 is inclined at the inclination angle α, the luminous flux of the emitted light 50 is deflected in the direction of deflection (direction represented by the deflection angle γ) with respect to the luminous flux of the incident light 40. The light is deflected and becomes diffused light that is diffused almost symmetrically around the deflection direction. As a result, the outgoing angle θout of the principal ray 51 of the outgoing light 50 becomes γ°, and the direction of the principal ray 51 of the outgoing light 50 is a direction inclined by the deflection angle γ with respect to the Z direction, and the optical axis 25 The direction is opposite to the direction of inclination.
 以上説明したように、本実施形態によれば、マイクロレンズアレイ20を構成する各マイクロレンズ21の光軸25が、拡散板1の基材10の表面(XY平面)の法線方向(Z方向)に対して傾斜している。さらに、各マイクロレンズ21のレンズ表面形状は、基準非球面形状(図8A、図9A)を傾斜角αで同方向に回転させた傾斜非球面形状(図8B、図9B)となっており、当該レンズ表面形状も、光軸25の傾斜に追従して傾斜している。これにより、入射光40の方向に対して出射光50の方向を、光軸25の傾斜方向とは反対方向に屈曲させて、出射光50を所望方向に偏向させることができる。したがって、本実施形態によれば、拡散板1が有する通常の屈折作用による屈折方向とは異なる方向にも、出射光50を偏向させることができる。 As explained above, according to the present embodiment, the optical axis 25 of each microlens 21 constituting the microlens array 20 is aligned in the normal direction (Z direction) to the surface (XY plane) of the base material 10 of the diffuser plate 1. ). Furthermore, the lens surface shape of each microlens 21 is an inclined aspherical shape (FIGS. 8B, 9B) obtained by rotating the reference aspherical shape (FIGS. 8A, 9A) in the same direction at an inclination angle α. The lens surface shape is also inclined to follow the inclination of the optical axis 25. Thereby, the direction of the output light 50 can be bent in the direction opposite to the direction of inclination of the optical axis 25 with respect to the direction of the input light 40, and the output light 50 can be deflected in a desired direction. Therefore, according to this embodiment, the emitted light 50 can also be deflected in a direction different from the refraction direction due to the normal refraction effect of the diffuser plate 1.
 なお、本実施形態に係る拡散板1に入射される入射光は、例えば、光学系によりコリメートされたコリメート光であってもよいし、1つの点光源から入射される拡散光であってもよいし、拡散板1に対して同一方向に配置された複数の光源から入射される拡散光またはコリメート光などであってもよい。本実施形態に係るマイクロレンズアレイ20は、これらの入射光を好適に偏向することが可能である。 Note that the incident light incident on the diffuser plate 1 according to the present embodiment may be, for example, collimated light collimated by an optical system, or may be diffused light incident from a single point light source. However, the light may be diffused light or collimated light incident from a plurality of light sources arranged in the same direction with respect to the diffuser plate 1. The microlens array 20 according to this embodiment can suitably deflect these incident lights.
 <5.3.傾斜角αの好ましい範囲>
 また、本実施形態に係るマイクロレンズ21の光軸25の傾斜角αは、60°以下であることが好ましい。傾斜角αが60°超であると、マイクロレンズ21の表面形状が崩れてしまい、マイクロレンズ21が極端な異方性を有することになる。このため、過度に傾斜したマイクロレンズ21の成形が困難になり、マイクロレンズアレイ構造の実現性が低下する場合がある。また、出射光の偏向機能を明確に顕現させることが困難になったり、マイクロレンズ21の光学特性も低下したりする場合がある。したがって、マイクロレンズ21の成形性や、マイクロレンズアレイ構造の実現性、マイクロレンズ21による偏向機能の明確な顕現性、およびマイクロレンズ21の光学特性などを確保するためには、傾斜角αが60°以下であることが好ましい。
<5.3. Preferred range of inclination angle α>
Moreover, it is preferable that the inclination angle α of the optical axis 25 of the microlens 21 according to this embodiment is 60° or less. If the inclination angle α exceeds 60°, the surface shape of the microlens 21 will be distorted, and the microlens 21 will have extreme anisotropy. For this reason, it becomes difficult to mold the microlenses 21 that are excessively inclined, and the feasibility of forming a microlens array structure may decrease. Furthermore, it may become difficult to clearly manifest the deflection function of the emitted light, and the optical characteristics of the microlens 21 may also deteriorate. Therefore, in order to ensure the moldability of the microlens 21, the feasibility of the microlens array structure, the clear manifestation of the deflection function by the microlens 21, and the optical properties of the microlens 21, the inclination angle α must be 60°. It is preferable that it is less than or equal to °.
 さらに、傾斜角αは、45°以下であることがより好ましい。傾斜角αが45°超であると、傾斜したマイクロレンズ21の形状に依存して、拡散光のノイズが発生しやすくなる場合がある。このレンズ形状に依存したノイズは、例えば、0次回折光のノイズ、またはスペクトルノイズなどを含む。スペクトルノイズは、屈折散乱された異常光や、比較的周期性のあるピーク状の回折光からなるノイズであり、マイクロレンズアレイ20の形状の不連続性に起因した回折現象により発生する。したがって、マイクロレンズ21による拡散光のノイズの発生を低減するためには、傾斜角αが45°以下であることが好ましい。 Furthermore, it is more preferable that the inclination angle α is 45° or less. When the inclination angle α is more than 45°, noise in the diffused light may easily occur depending on the shape of the inclined microlens 21. This lens shape-dependent noise includes, for example, zero-order diffracted light noise or spectral noise. Spectral noise is noise composed of refracted and scattered extraordinary light and relatively periodic peak-shaped diffracted light, and is generated by a diffraction phenomenon caused by discontinuity in the shape of the microlens array 20. Therefore, in order to reduce noise generated by the diffused light caused by the microlens 21, it is preferable that the inclination angle α is 45° or less.
 また、傾斜角αは、1°以上であることが好ましい。傾斜角αが1°未満であると、マイクロレンズ21の形成誤差や、偏向角の検出精度の限界などの原因により、偏向機能の実現が未確定となり、出射光の偏向機能が不十分となる場合がある。したがって、偏向機能を好適に実現するためには、傾斜角αが1°以上であることが好ましく、2°以上であることがより好ましい。 Furthermore, the inclination angle α is preferably 1° or more. If the inclination angle α is less than 1°, the realization of the deflection function will not be determined due to formation errors of the microlens 21 or limitations in the detection accuracy of the deflection angle, and the deflection function of the emitted light will be insufficient. There are cases. Therefore, in order to suitably realize the deflection function, the inclination angle α is preferably 1° or more, and more preferably 2° or more.
 <5.4.回転対称な非球面形状>
 本実施形態に係るマイクロレンズ21の表面形状(レンズ表面形状)は、例えば図8に示したように、傾斜角αで傾斜した光軸25を中心として回転対称な非球面形状であることが好ましい。回転対称な非球面形状は、例えば、楕円面(-1<K<0、K>0)、放物面(K=-1)、または双曲面(K<-1)などである。なお、「K」は、コーニック係数であり、非球面形状を規定する式に用いられる。
<5.4. Rotationally symmetrical aspherical shape>
The surface shape (lens surface shape) of the microlens 21 according to the present embodiment is preferably an aspherical shape that is rotationally symmetrical about the optical axis 25 tilted at the tilt angle α, as shown in FIG. 8, for example. . The rotationally symmetrical aspherical shape is, for example, an ellipsoid (-1<K<0, K>0), a paraboloid (K=-1), or a hyperboloid (K<-1). Note that "K" is a conic coefficient, which is used in the equation that defines the aspherical shape.
 このように、本実施形態に係るレンズ表面形状は、傾斜した光軸25を中心として回転対称な傾斜非球面形状であることが好ましい。これにより、光軸25が傾斜したマイクロレンズ21を比較的に容易に設計、製造できるという利点がある。さらに、当該マイクロレンズ21により出射光50を所望方向に好適に偏向させることができ、偏向機能の精度と均一性を高めることができる。 As described above, the lens surface shape according to the present embodiment is preferably a tilted aspherical shape that is rotationally symmetrical about the tilted optical axis 25. This has the advantage that the microlens 21 with the optical axis 25 inclined can be designed and manufactured relatively easily. Furthermore, the emitted light 50 can be suitably deflected in a desired direction by the microlens 21, and the accuracy and uniformity of the deflection function can be improved.
 <5.5.傾斜角αおよび方位角βのランダム変動>
 ここで、複数のマイクロレンズ21の傾斜角αおよび方位角βをランダムに変動させ、相互に異なる変動値に設定する例について説明する。
<5.5. Random variation of inclination angle α and azimuth angle β>
Here, an example will be described in which the inclination angle α and azimuth angle β of the plurality of microlenses 21 are randomly varied and set to mutually different variation values.
 マイクロレンズアレイ20を構成する複数のマイクロレンズ21について、Z方向に対する光軸25の傾斜角αは、所定の基準傾斜角αkを基準としてランダムに変動していてもよい。さらに、光軸25の傾斜方向を表す方位角βも、ランダムに変動していてもよい。例えば、次の式(30)で示すように、全てのマイクロレンズ21の傾斜角αは、基準傾斜角αkを基準として、所定の変動幅Δαの範囲内でランダムに変動していてもよい。また、次の式(31)で示すように、全てのマイクロレンズ21の方位角βは、比較的広い変動範囲でランダムに変動していてもよい。例えば、基準傾斜角αkが0°であり(αk=0°)、変動幅Δαが20°であり(Δα=20°)、方位角βの変動範囲は、0°~360°の範囲でランダムであってもよい。

 α=αk±Δα  ・・・(30)
 β=0°~360°  ・・・(31)
Regarding the plurality of microlenses 21 constituting the microlens array 20, the inclination angle α of the optical axis 25 with respect to the Z direction may vary randomly with respect to a predetermined reference inclination angle αk. Furthermore, the azimuth angle β representing the direction of inclination of the optical axis 25 may also vary randomly. For example, as shown in the following equation (30), the inclination angles α of all the microlenses 21 may vary randomly within a predetermined variation width Δα with reference to the reference inclination angle αk. Furthermore, as shown in the following equation (31), the azimuth angles β of all the microlenses 21 may vary randomly within a relatively wide variation range. For example, the standard inclination angle αk is 0° (αk = 0°), the fluctuation width Δα is 20° (Δα = 20°), and the fluctuation range of the azimuth angle β is random in the range of 0° to 360°. It may be.

α=αk±Δα...(30)
β=0°~360°...(31)
 以上のように、マイクロレンズアレイ20を構成する複数のマイクロレンズ21の光軸25は、相互に異なる傾斜角αで、相互に異なる方向(方位角β)に傾斜していてもよい。この際、複数のマイクロレンズ21の光軸25の傾斜角αは、所定の基準傾斜角αkを基準として、所定の変動範囲(例えば、比較的広い変動幅Δαの範囲内)でランダムに変動していてもよい。同様に、複数のマイクロレンズ21の光軸25の方位角βも、相互に異なり、当該方位角βは、所定の変動範囲(例えば、比較的広い変動幅Δβの範囲内)でランダムに変動していてもよい。 As described above, the optical axes 25 of the plurality of microlenses 21 constituting the microlens array 20 may be inclined in mutually different directions (azimuth angle β) at mutually different inclination angles α. At this time, the inclination angle α of the optical axis 25 of the plurality of microlenses 21 varies randomly within a predetermined variation range (for example, within a relatively wide variation range Δα) with respect to a predetermined reference inclination angle αk. You can leave it there. Similarly, the azimuth angle β of the optical axis 25 of the plurality of microlenses 21 also differs from each other, and the azimuth angle β varies randomly within a predetermined variation range (for example, within a relatively wide variation width Δβ). You can leave it there.
 そして、全てのマイクロレンズ21の表面形状は、楕円面であり、光軸25を中心として回転対称である。本実施形態では、マイクロレンズ21の開口幅Dや曲率半径RがDk、Rkを中心にランダムに変動しておらず、Dk、Rkと実質的に同一であるので、個々のマイクロレンズ21の表面形状は、基準楕円面の形状と実質的に同一である。したがって、複数のマイクロレンズ21の表面形状は、相互に同一の楕円面となっている。 The surface shape of all the microlenses 21 is an ellipsoid, and is rotationally symmetrical about the optical axis 25. In this embodiment, the aperture width D and radius of curvature R of the microlens 21 do not vary randomly around Dk and Rk, but are substantially the same as Dk and Rk, so that the surface of each microlens 21 The shape is substantially the same as the shape of the reference ellipsoid. Therefore, the surface shapes of the plurality of microlenses 21 are mutually the same ellipsoid.
 かかる構成のマイクロレンズアレイ20により、各マイクロレンズ21から出射される出射光を、各光軸25の傾斜角αにそれぞれ対応する偏向角γで、各光軸25の方位角βにそれぞれ対応する偏向方向に偏向することができる。よって、マイクロレンズアレイ20全体として、所望の角度を中心としたランダムな偏向角γで、ランダムな方向に出射光を偏向できる。よって、出射光の偏向方向や偏向角γをばらつかせることができるので、出射光の均質性を向上できる。さらに、複数のマイクロレンズ21が実質的に同一のレンズ表面形状を有し、規則的に配列されている場合であっても、各マイクロレンズ21の光軸25の傾斜角αおよび方位角βを比較的広い変動範囲でランダムに変動させることができる。これによって、複数のマイクロレンズ21からの出射光の干渉や回折による拡散光の強度分布のむらを、より一層低減することもできる。 With the microlens array 20 having such a configuration, the light emitted from each microlens 21 is deflected at a deflection angle γ corresponding to the inclination angle α of each optical axis 25 and corresponding to the azimuth angle β of each optical axis 25. can be deflected in the deflection direction. Therefore, the microlens array 20 as a whole can deflect the emitted light in random directions at random deflection angles γ centered on a desired angle. Therefore, since the deflection direction and the deflection angle γ of the emitted light can be varied, the homogeneity of the emitted light can be improved. Furthermore, even if the plurality of microlenses 21 have substantially the same lens surface shape and are regularly arranged, the inclination angle α and azimuth angle β of the optical axis 25 of each microlens 21 can be changed. It can be varied randomly within a relatively wide variation range. Thereby, it is also possible to further reduce unevenness in the intensity distribution of the diffused light due to interference and diffraction of the light emitted from the plurality of microlenses 21.
 <5.5.非球面形状のコーニック係数K、アスペクト比>
 さらに、本実施形態に係るマイクロレンズ21の非球面形状を、コーニック係数Kを用いた非球面レンズの式で表したとき、当該非球面レンズの式におけるコーニック係数Kは、0超であることが好ましい(K>0)。K>0であれば、レンズ表面形状は、光軸25の方向に縦長の楕円面となる。これにより、偏向機能と拡散制御の両立を行いやすいという効果がある。
<5.5. Conic coefficient K of aspherical shape, aspect ratio>
Furthermore, when the aspherical shape of the microlens 21 according to the present embodiment is expressed by an aspherical lens formula using a conic coefficient K, the conic coefficient K in the aspherical lens formula is likely to be greater than 0. Preferred (K>0). If K>0, the lens surface shape becomes an ellipsoid that is vertically elongated in the direction of the optical axis 25. This has the effect of making it easier to achieve both deflection function and diffusion control.
 なお、マイクロレンズ21の非球面形状が、光軸25を中心として回転対称な非球面形状である場合、当該非球面形状を表す非球面レンズの式は、例えば、以下の式(40)を用いることができる。 Note that when the aspherical shape of the microlens 21 is an aspherical shape that is rotationally symmetrical about the optical axis 25, the formula for the aspherical lens representing the aspherical shape is, for example, the following formula (40). be able to.
 Z=(x/R)/{1+(1-(1+K)・x/R0.5}+A・x+A・x   ・・・(40) Z=(x 2 /R)/{1+(1-(1+K)・x 2 /R 2 ) 0.5 }+A 4・x 4 +A 6・x 6 ...(40)
 なお、式(40)において、各パラメータは以下のとおりである。
 Z:Sag量
 x:Z軸からの距離
 R:曲率半径
 K:コーニック係数
 A,A:4次、6次の非球面係数
Note that in equation (40), each parameter is as follows.
Z: Sag amount x: Distance from Z-axis R: Radius of curvature K: Conic coefficient A 4 , A 6 : 4th and 6th order aspheric coefficients
 また、マイクロレンズ21の表面形状(即ち、上記の非球面形状)のアスペクト比kは、0.1以上、1.1以下であることが好ましく、0.2以上、0.6以下であることがより好ましい。これにより、拡散角の制御性と、マイクロレンズ21の構造形成の実現性を得やすいという効果がある。 Further, the aspect ratio k of the surface shape of the microlens 21 (i.e., the above-mentioned aspherical shape) is preferably 0.1 or more and 1.1 or less, and preferably 0.2 or more and 0.6 or less. is more preferable. This has the effect of making it easier to control the diffusion angle and form the structure of the microlens 21.
 ここで、アスペクト比kは、複数のマイクロレンズ21の最大レンズ高さhMAXと、マイクロレンズ21の基準開口幅Dkとの比である(k=hMAX/Dk)。最大レンズ高さhMAXは、最大レンズ頂点高さhmaxと、最小境界点高さhMINとの差である(hMAX=hmax-hMIN)。最大レンズ頂点高さhmaxは、図1に示す1つの単位セル3内に含まれる複数のマイクロレンズ21のうち、頂点の高さが最も高いマイクロレンズ21の頂点の高さ(即ち、レンズ高さhの最大値hmax)である。最小境界点高さhMINは、当該マイクロレンズ21の周囲の境界線24のうち最も低い位置の高さである。 Here, the aspect ratio k is the ratio between the maximum lens height h MAX of the plurality of microlenses 21 and the reference aperture width Dk of the microlenses 21 (k=h MAX /Dk). The maximum lens height h MAX is the difference between the maximum lens apex height h max and the minimum boundary point height h MIN (h MAX =h max −h MIN ). The maximum lens apex height h max is the apex height of the microlens 21 having the highest apex height among the plurality of microlenses 21 included in one unit cell 3 shown in FIG. The maximum value of h is h max ). The minimum boundary point height h MIN is the height of the lowest position of the boundary line 24 around the microlens 21 .
 <6.その他のレンズ表面形状>
 上述したように、本実施形態に係るマイクロレンズ21は、対称軸を有する非球面形状または球面形状であることが好ましく、例えば図8に示したように、光軸25(対称軸)を中心として回転対称な非球面形状であることが好ましい。この回転対称な非球面形状は、光軸25を中心として等方性を有する非球面形状である。しかし、マイクロレンズ21の表面形状は、かかる例に限定されず、例えば、光軸25を中心として回転対称でない非球面形状であってもよいし、異方性を有する非球面形状であってもよい。レンズ表面形状が、回転非対称な非球面形状や、異方性を有する非球面形状であっても、各マイクロレンズ21をZ方向にランダムなシフト量Δsでシフトさせて位相差を付与することによって、回折光を抑制して、拡散光の均質性を高めることは可能である。また、異方性を有する非球面形状のマイクロレンズ21においても、マイクロレンズ21の光軸25が傾斜していれば、当該傾斜した光軸25の作用により、出射光を所望方向に偏向させることは可能である。
<6. Other lens surface shapes>
As described above, the microlens 21 according to the present embodiment preferably has an aspherical shape or a spherical shape having an axis of symmetry, for example, as shown in FIG. Preferably, it has a rotationally symmetrical aspherical shape. This rotationally symmetrical aspherical shape is isotropic with the optical axis 25 as the center. However, the surface shape of the microlens 21 is not limited to this example; for example, it may be an aspherical shape that is not rotationally symmetrical about the optical axis 25, or it may be an aspherical shape that has anisotropy. good. Even if the lens surface shape is a rotationally asymmetrical aspherical shape or an anisotropic aspherical shape, by shifting each microlens 21 in the Z direction by a random shift amount Δs to impart a phase difference. , it is possible to suppress the diffracted light and improve the homogeneity of the diffused light. Furthermore, even in the aspherical microlens 21 having anisotropy, if the optical axis 25 of the microlens 21 is inclined, the emitted light can be deflected in a desired direction by the action of the inclined optical axis 25. is possible.
 以下では、図10~図14を参照して、マイクロレンズ21の表面形状が、対称軸を有する非球面形状である場合の一例として、光軸25に対して回転非対称であるが、光軸25(対称軸)を含む平面に対して線対称であり、かつ、異方性を有する非球面形状である例について説明する。所定の方向に延伸した異方性を有する非球面形状として、例えば、アナモルフィック形状、または、トーラス形状などを用いることができる。 Below, with reference to FIGS. 10 to 14, as an example where the surface shape of the microlens 21 is an aspherical shape having an axis of symmetry, the microlens 21 is rotationally asymmetric with respect to the optical axis 25. An example of an aspherical shape having anisotropy and line symmetry with respect to a plane containing (axis of symmetry) will be described. For example, an anamorphic shape or a torus shape can be used as the aspherical shape having anisotropy and extending in a predetermined direction.
 (1)アナモルフィック形状
 まず、図10~図11を参照して、アナモルフィック形状のマイクロレンズ21について説明する。図10は、アナモルフィック形状のマイクロレンズ21の平面形状を示す説明図である。図11は、アナモルフィック形状のマイクロレンズ21の立体形状を示す斜視図である。
(1) Anamorphic shape First, the anamorphic microlens 21 will be described with reference to FIGS. 10 and 11. FIG. 10 is an explanatory diagram showing the planar shape of the anamorphic microlens 21. FIG. 11 is a perspective view showing the three-dimensional shape of the anamorphic microlens 21.
 図10および図11に示すマイクロレンズ21は、いわゆるアナモルフィックレンズであり、その表面形状は、アナモルフィック形状の曲面を含む非球面形状である。図10に示すように、当該マイクロレンズ21の平面形状は、異方性を有する楕円形状である。当該楕円形状のY軸方向の長径がDyであり、X軸方向の短径がDxである。これらDx、Dyは、マイクロレンズ21のX方向およびY方向の開口幅に相当する。図11に示すように、当該マイクロレンズ21の表面形状は、楕円形状の長軸方向および短軸方向の各々に所定の曲率半径Rx、Ryを有する非球面形状の曲面からなる。かかるマイクロレンズ21は、Y軸方向に異方性を有する非球面形状となっている。 The microlens 21 shown in FIGS. 10 and 11 is a so-called anamorphic lens, and its surface shape is an aspherical shape including an anamorphic curved surface. As shown in FIG. 10, the planar shape of the microlens 21 is an anisotropic ellipse. The major axis of the elliptical shape in the Y-axis direction is Dy, and the minor axis in the X-axis direction is Dx. These Dx and Dy correspond to the aperture widths of the microlens 21 in the X direction and the Y direction. As shown in FIG. 11, the surface shape of the microlens 21 is an aspherical curved surface having predetermined radii of curvature Rx and Ry in the major and minor axis directions of an elliptical shape, respectively. The microlens 21 has an aspherical shape having anisotropy in the Y-axis direction.
 ここで、図11および下記式(50)を参照して、アナモルフィック形状のマイクロレンズ21の表面形状の設定方法について説明する。図11に示すアナモルフィック形状の曲面(非球面)は、下記式(50)で表される。下記式(50)は、アナモルフィック形状の曲面(非球面)を表す式の一例である。 Here, a method for setting the surface shape of the anamorphic microlens 21 will be described with reference to FIG. 11 and equation (50) below. The anamorphic curved surface (aspherical surface) shown in FIG. 11 is expressed by the following formula (50). The following formula (50) is an example of a formula representing an anamorphic curved surface (aspherical surface).
Figure JPOXMLDOC01-appb-M000025
Figure JPOXMLDOC01-appb-M000025
 なお、式(50)において、各パラメータは以下のとおりである。
 Cx=1/Rx
 Cy=1/Ry
 Rx:X方向の曲率半径
 Ry:Y方向の曲率半径
 Kx:X方向のコーニック係数
 Ky:Y方向のコーニック係数
 Ax4,Ax6:X方向の4次、6次の非球面係数
 Ay4,Ay6:Y方向の4次、6次の非球面係数
Note that in equation (50), each parameter is as follows.
Cx=1/Rx
Cy=1/Ry
Rx: Radius of curvature in the X direction Ry: Radius of curvature in the Y direction Kx: Conic coefficient in the X direction Ky: Conic coefficient in the Y direction A x4 , A x6 : 4th and 6th order aspheric coefficients in the X direction A y4 , A y6 : 4th and 6th order aspherical coefficients in the Y direction
 図11に示すように、上記式(50)で規定されるアナモルフィック形状の曲面から、XY平面上の楕円形状のX方向の短径がDxとなり、Y方向の長径がDyとなるように、曲面を切り出す。この切り出した一部の曲面形状を、マイクロレンズ21の表面形状(アナモルフィック形状)に設定する。ここで、楕円形状の長径Dy、短径Dx、Y方向(長軸方向)の曲率半径Ry、およびX方向(短軸方向)の曲率半径Rxを、マイクロレンズ21ごとに、所定の変動率の範囲内でランダムに変動させて、ばらつかせる。これにより、相互に異なるアナモルフィック形状からなる複数のマイクロレンズ21の表面形状を設定できる。 As shown in FIG. 11, from the anamorphic curved surface defined by the above formula (50), the short axis in the X direction of the ellipse on the XY plane is Dx, and the long axis in the Y direction is Dy. , cut out the curved surface. This cut out part of the curved surface shape is set as the surface shape (anamorphic shape) of the microlens 21. Here, the major axis Dy, the minor axis Dx, the radius of curvature Ry in the Y direction (major axis direction), and the radius of curvature Rx in the X direction (minor axis direction) of the elliptical shape are set at a predetermined rate of variation for each microlens 21. Vary randomly within a range to create variation. Thereby, the surface shapes of the plurality of microlenses 21 having mutually different anamorphic shapes can be set.
 (2)トーラス形状
 次に、図12~図14を参照して、マイクロレンズ21の非球面形状の別の例(トーラス形状)について説明する。図12は、トーラス形状のマイクロレンズ21の平面形状を示す説明図である。図13は、トーラス形状のマイクロレンズ21の立体形状を示す斜視図である。図14は、トーラス形状の曲面を示す斜視図である。
(2) Torus Shape Next, another example of the aspherical shape (torus shape) of the microlens 21 will be described with reference to FIGS. 12 to 14. FIG. 12 is an explanatory diagram showing the planar shape of the torus-shaped microlens 21. FIG. 13 is a perspective view showing the three-dimensional shape of the torus-shaped microlens 21. FIG. 14 is a perspective view showing a torus-shaped curved surface.
 図12~図14に示すように、マイクロレンズ21の表面形状は、トーラス形状の一部の曲面を含む非球面形状である。トーラスは、円を回転して得られる回転面である。具体的には、図14に示すように、小円(半径:r)の外側に配置された回転軸(X軸)を中心として、大円(半径:R)の円周に沿って当該小円を回転させることにより、いわゆるドーナツ型の円環体が得られる。この円環体の表面(トーラス面)の曲面形状がトーラス形状である。このトーラス形状の外側部分を切り出すことにより、図13に示すようなトーラス形状のマイクロレンズ21の立体形状が得られる。 As shown in FIGS. 12 to 14, the surface shape of the microlens 21 is an aspherical shape including a partially curved surface of a torus shape. A torus is a surface of revolution obtained by rotating a circle. Specifically, as shown in FIG. 14, the small circle (radius: R) is rotated along the circumference of the large circle (radius: R) around the rotation axis (X-axis) located outside the small circle (radius: r). By rotating the circle, a so-called donut-shaped torus is obtained. The curved shape of the surface (torus surface) of this toric body is a torus shape. By cutting out the outer portion of this torus shape, a three-dimensional shape of the torus-shaped microlens 21 as shown in FIG. 13 is obtained.
 図12に示すように、トーラス形状のマイクロレンズ21の平面形状は、異方性を有する楕円形状である。当該楕円形状のY軸方向の長径がRであり、X軸方向の短径がrである。これらr、Rは、マイクロレンズ21のX方向およびY方向の開口幅Dx、Dyに相当する。図13に示すように、当該マイクロレンズ21の立体形状は、楕円形状の長軸方向および短軸方向の各々に所定の曲率半径R、rを有する非球面形状の曲面からなる。かかるマイクロレンズ21は、Y軸方向に異方性を有する非球面形状となっている。 As shown in FIG. 12, the planar shape of the torus-shaped microlens 21 is an elliptical shape with anisotropy. The major axis of the elliptical shape in the Y-axis direction is R, and the minor axis in the X-axis direction is r. These r and R correspond to the aperture widths Dx and Dy of the microlens 21 in the X direction and the Y direction. As shown in FIG. 13, the three-dimensional shape of the microlens 21 is an aspherical curved surface having predetermined radii of curvature R and r in the major and minor axis directions of an elliptical shape, respectively. The microlens 21 has an aspherical shape having anisotropy in the Y-axis direction.
 ここで、図14および下記式(52)を参照して、トーラス形状のマイクロレンズ21の表面形状の設定方法について説明する。図14は、下記式(52)で表される非球面の曲面を示す斜視図である。なお、式(52)において、Rは大円半径であり、rは小円半径である。 Here, a method for setting the surface shape of the torus-shaped microlens 21 will be described with reference to FIG. 14 and the following equation (52). FIG. 14 is a perspective view showing an aspherical curved surface expressed by the following formula (52). Note that in equation (52), R is the radius of the large circle, and r is the radius of the small circle.
Figure JPOXMLDOC01-appb-M000026
Figure JPOXMLDOC01-appb-M000026
 図14に示すように、上記式(52)で規定されるトーラス形状の曲面から、XY平面上の楕円形状のX方向の短径がrとなり、Y方向の長径がRとなるように、曲面を切り出す。この切り出した一部の曲面形状を、マイクロレンズ21の曲面形状(トーラス形状)に設定する。ここで、楕円形状の長径Dy、短径Dx、Y方向(長軸方向)の曲率半径R(レンズの曲率半径Ryに相当。)、およびX方向(短軸方向)の曲率半径r(レンズの曲率半径Rxに相当。)を、マイクロレンズ21ごとに、所定の変動率の範囲内でランダムに変動させて、ばらつかせる。これにより、相互に異なるトーラス形状からなる複数のマイクロレンズ21の表面形状を設定できる。 As shown in FIG. 14, from the torus-shaped curved surface defined by the above formula (52), the curved surface is formed such that the short axis in the X direction of the ellipse on the XY plane is r, and the long axis in the Y direction is R. Cut out. This cut out part of the curved surface shape is set as the curved surface shape (torus shape) of the microlens 21. Here, the major axis Dy, the minor axis Dx, the radius of curvature R in the Y direction (major axis direction) (corresponds to the radius of curvature Ry of the lens), and the radius of curvature r in the X direction (minor axis direction) (corresponding to the radius of curvature Ry of the lens). (corresponding to the radius of curvature Rx) is randomly varied within a predetermined variation rate for each microlens 21 to vary it. Thereby, the surface shapes of the plurality of microlenses 21 having mutually different torus shapes can be set.
 上記のアナモルフィック形状およびトーラス形状などの非球面形状は、マイクロレンズ21の光軸25を中心として回転対称な形状ではない。しかし、当該非球面形状は、光軸25を含むXZ平面を基準としてY方向に対称な形状であり、かつ、光軸25を含むYZ平面を基準としてX方向に対称な形状である。マイクロレンズ21の表面形状は、このような対称性と異方性を有する非球面形状(例えば、アナモルフィック形状、トーラス形状)であってもよい。この場合でも、当該非球面形状を有する各マイクロレンズ21をZ方向にランダムなシフト量Δsでシフトさせて位相差を付与することによって、回折光を抑制して、拡散光の均質性を高めることは可能である。また、対称性と異方性を有する非球面形状のマイクロレンズ21においても、マイクロレンズ21の光軸25を傾斜させて、レンズ表面形状を当該傾斜方向に回転させて傾斜させれば、当該傾斜した光軸25とレンズ表面形状の作用により、出射光を所望方向に偏向させることができる。さらに、X方向とY方向で相互に異なる拡散特性を得ることができる。 The aspherical shapes such as the anamorphic shape and torus shape described above are not rotationally symmetrical shapes about the optical axis 25 of the microlens 21. However, the aspherical shape is a shape that is symmetrical in the Y direction with respect to the XZ plane that includes the optical axis 25, and a shape that is symmetrical in the X direction with respect to the YZ plane that includes the optical axis 25. The surface shape of the microlens 21 may be an aspherical shape (for example, an anamorphic shape or a torus shape) having such symmetry and anisotropy. Even in this case, diffracted light can be suppressed and the homogeneity of diffused light can be increased by shifting each microlens 21 having an aspherical shape in the Z direction by a random shift amount Δs to provide a phase difference. is possible. Furthermore, even in the case of an aspherical microlens 21 having symmetry and anisotropy, if the optical axis 25 of the microlens 21 is tilted and the lens surface shape is rotated in the direction of inclination, the inclination can be Due to the effect of the optical axis 25 and the lens surface shape, the emitted light can be deflected in a desired direction. Furthermore, different diffusion characteristics can be obtained in the X direction and the Y direction.
 なお、異方性を有するマイクロレンズ21の非球面形状として、上記の例以外にも、例えば、楕円球体から切り出した非球面形状などを用いることもできる。 Note that as the aspherical shape of the microlens 21 having anisotropy, in addition to the above examples, for example, an aspherical shape cut out from an ellipsoid can also be used.
 <7.マイクロレンズアレイの設計方法>
 次に、図15~図21を参照して、本実施形態に係るマイクロレンズアレイ20の設計方法について説明する。図15は、本実施形態に係るマイクロレンズアレイ20の設計方法を示すフローチャートである。
<7. How to design a microlens array>
Next, a method for designing the microlens array 20 according to this embodiment will be described with reference to FIGS. 15 to 21. FIG. 15 is a flowchart showing a method for designing the microlens array 20 according to this embodiment.
 (S10)レンズ中心座標の設定
 図15に示すように、まず、S10において、マイクロレンズアレイ20の表面上(XY平面上)において、各マイクロレンズ21のレンズ中心座標p(レンズ中心のx座標とy座標)を設定する。レンズ中心座標pは、各マイクロレンズ21の中心点30(図8参照。)のXY平面上の座標である。本実施形態では、複数のマイクロレンズ21をXY平面上に規則的に配列するため、予め設定された基準格子に沿って複数のレンズ中心座標pが規則的に配置される。
(S10) Setting of lens center coordinates As shown in FIG. 15, first, in S10 , on the surface of the microlens array 20 (on the and y coordinate). The lens center coordinates p n are the coordinates of the center point 30 (see FIG. 8) of each microlens 21 on the XY plane. In this embodiment, since the plurality of microlenses 21 are regularly arranged on the XY plane, the plurality of lens center coordinates p n are regularly arranged along a preset reference grid.
 具体的には、例えば、図16に示すように、予めサイズが設定されたマイクロレンズアレイ20のXY平面上に、予め設定された格子間隔iを有する基準格子に沿って、複数のレンズ中心座標p(xp,yp)を設定する。なお、nは、マイクロレンズ21の設置数である(n=1,2,3,・・・)。複数のレンズ中心座標p同士の間隔が、予め設定された範囲となるように、図示の例では、基準格子として三角格子を用いている。まず、一辺の長さを格子間隔iとする複数の正三角形を並べて、XY平面上に三角格子を設定する。次いで、当該三角格子の格子点(正三角形の頂点)を、各レンズ中心座標p(xp,yp)に設定する。これにより、三角格子に沿って複数のレンズ中心座標pを規則的に配置して、レンズ中心座標p同士の間隔を一定の格子間隔iに合わせることができる。 Specifically, as shown in FIG. 16, for example, on the XY plane of the microlens array 20 whose size is set in advance, a plurality of lens center coordinates are arranged along a reference grating having a preset grating interval i. Set p n (xp n , yp n ). Note that n is the number of installed microlenses 21 (n=1, 2, 3, . . . ). In the illustrated example, a triangular lattice is used as the reference lattice so that the intervals between the plurality of lens center coordinates pn fall within a preset range. First, a triangular lattice is set on the XY plane by arranging a plurality of equilateral triangles whose side length is the lattice interval i. Next, the lattice points (vertices of equilateral triangles) of the triangular lattice are set at the center coordinates p n (xp n , yp n ) of each lens. Thereby, a plurality of lens center coordinates p n can be regularly arranged along the triangular lattice, and the intervals between the lens center coordinates p n can be adjusted to a constant lattice interval i.
 さらに、上記のようにしてレンズ中心座標pを配置するときには、図17に示すように、XY平面上において相互に隣接するマイクロレンズ21、21同士の重なり量Ovが、予め設定された所定の許容範囲(例えば、所定値以下)になるように、基準格子の格子間隔iを調整することが好ましい。これにより、XY平面上において、複数のマイクロレンズ21を適切な重なり量Ovで相互に重なり合わせつつ、当該複数のマイクロレンズ21を規則的に配置できる。したがって、相互に隣接するマイクロレンズ21、21間において、レンズ面にならない平坦部の発生を抑制できるので、拡散板1の平坦部を透過する0次回折光の発生を抑制できる。また、複数のマイクロレンズ21から出射される拡散光の干渉や回折による拡散光の強度分布のむらを低減できる。さらに、マイクロレンズ21、21同士が過度に重なり合っていないので、マイクロレンズアレイ構造の成形性や実現性を損なうこともない。 Furthermore, when arranging the lens center coordinates p n as described above, as shown in FIG. It is preferable to adjust the grid spacing i of the reference grid so that it falls within a permissible range (for example, below a predetermined value). Thereby, on the XY plane, the plurality of microlenses 21 can be arranged regularly while overlapping each other with an appropriate amount of overlap Ov. Therefore, it is possible to suppress the generation of a flat part that does not become a lens surface between the mutually adjacent microlenses 21, 21, so that the generation of zero-order diffracted light that passes through the flat part of the diffuser plate 1 can be suppressed. Moreover, unevenness in the intensity distribution of the diffused light due to interference or diffraction of the diffused light emitted from the plurality of microlenses 21 can be reduced. Furthermore, since the microlenses 21, 21 do not overlap each other excessively, the moldability and feasibility of the microlens array structure are not impaired.
 (S12)レンズパラメータの設定
 次いで、図15に示すように、S12において、各マイクロレンズ21のレンズパラメータを設定する。レンズパラメータは、マイクロレンズ21の表面形状(レンズ表面形状)を決定するパラメータである。レンズパラメータは、予め設定された変動範囲内でランダムに設定されることが好ましい。
(S12) Setting Lens Parameters Next, as shown in FIG. 15, in S12, the lens parameters of each microlens 21 are set. The lens parameter is a parameter that determines the surface shape of the microlens 21 (lens surface shape). Preferably, the lens parameters are set randomly within a preset variation range.
 レンズパラメータは、例えば、基準表面形状の基準開口幅Dkおよび基準曲率半径Rkと、実際の各マイクロレンズ21の開口幅D(レンズ径)、マイクロレンズ21の頂部の曲率半径Rなどを含む。例えば、基準表面形状が、光軸25(対称軸)を中心として回転対称な基準非球面形状である場合、例えば、楕円面(光軸25の方向を回転軸とする回転楕円体の表面)、放物面、双曲面などである場合(図17参照。)、レンズパラメータは、例えば、基準開口幅Dk、基準曲率半径Rk、開口幅D、曲率半径R、傾斜角α、方位角βなどを含む(図8参照。)。 The lens parameters include, for example, the reference aperture width Dk and reference radius of curvature Rk of the reference surface shape, the actual aperture width D (lens diameter) of each microlens 21, the radius of curvature R of the top of the microlens 21, and the like. For example, when the reference surface shape is a reference aspherical surface shape that is rotationally symmetrical about the optical axis 25 (axis of symmetry), for example, an ellipsoidal surface (the surface of a spheroid whose axis of rotation is in the direction of the optical axis 25), In the case of a paraboloid, a hyperboloid, etc. (see FIG. 17), the lens parameters include, for example, a reference aperture width Dk, a reference radius of curvature Rk, an aperture width D, a radius of curvature R, an inclination angle α, an azimuth angle β, etc. (See Figure 8.)
 一方、図18に示すように、マイクロレンズ21の基準表面形状が、光軸25を中心として回転非対称であり、異方性を有する非球面形状、例えば、アナモルフィック形状、トーラス形状などである場合、レンズパラメータは、当該非球面形状を規定する関数(z=f(d))に用いられるパラメータであってもよい。この場合、レンズ表面形状の高さ方向の値zは、XY平面上におけるレンズ中心座標pからの距離dの関数(z=f(d))で表される。距離dは、XY平面上におけるレンズ中心座標pからのX方向の距離dxと、Y方向の距離dyとを含んでもよい。この距離dx、dyを用いた関数により、レンズ表面形状の高さ方向の位置zを決定することができる(z=f(dx、dy))。このような異方性を有する非球面形状のレンズ表面形状を表す関数(z=f(d))に含まれるパラメータを、上記レンズパラメータとして設定してもよい。 On the other hand, as shown in FIG. 18, the reference surface shape of the microlens 21 is rotationally asymmetric about the optical axis 25 and has an anisotropic aspherical shape, such as an anamorphic shape or a torus shape. In this case, the lens parameter may be a parameter used in a function (z=f(d)) that defines the aspherical shape. In this case, the value z of the lens surface shape in the height direction is expressed as a function of the distance d from the lens center coordinates p n on the XY plane (z=f(d)). The distance d may include a distance dx in the X direction and a distance dy in the Y direction from the lens center coordinate pn on the XY plane. A function using these distances dx and dy can determine the position z of the lens surface shape in the height direction (z=f(dx, dy)). A parameter included in a function (z=f(d)) representing the aspherical lens surface shape having such anisotropy may be set as the lens parameter.
 なお、レンズ表面形状が、光軸25を中心として回転対称な基準非球面形状(例えば、楕円面、放物面、双曲面など)である場合、マイクロレンズ21の平面形状は、例えば、図17、図20に示すように円となる。一方、レンズ表面形状が、光軸25を中心として回転非対称な基準非球面形状(例えば、アナモルフィック形状、トーラス形状)である場合、マイクロレンズ21の平面形状は、例えば、図10、図12に示すように楕円もしくは楕円に近似した形状となる。 Note that when the lens surface shape is a reference aspherical surface shape that is rotationally symmetrical about the optical axis 25 (for example, an ellipsoid, a paraboloid, a hyperboloid, etc.), the planar shape of the microlens 21 is, for example, as shown in FIG. , becomes a circle as shown in FIG. On the other hand, when the lens surface shape is a reference aspherical shape that is rotationally asymmetric about the optical axis 25 (for example, an anamorphic shape, a torus shape), the planar shape of the microlens 21 is, for example, FIGS. As shown in the figure, it becomes an ellipse or a shape approximating an ellipse.
 また、上述したように、本実施形態では、複数のマイクロレンズ21は相互に同一の形状を有し、各マイクロレンズ21のレンズ表面形状は基準表面形状と実質的に同一である。したがって、各マイクロレンズ21の開口幅D、曲率半径Rはそれぞれ、基準開口幅Dk、基準曲率半径Rkに設定される。この場合、レンズパラメータの設定ステップ(S12)で設定されるレンズパラメータは、基準表面形状に関するパラメータ(Dk、Rkなど)だけであってもよい。 Furthermore, as described above, in this embodiment, the plurality of microlenses 21 have the same shape, and the lens surface shape of each microlens 21 is substantially the same as the reference surface shape. Therefore, the aperture width D and the radius of curvature R of each microlens 21 are set to the reference aperture width Dk and the reference radius of curvature Rk, respectively. In this case, the lens parameters set in the lens parameter setting step (S12) may be only parameters related to the reference surface shape (Dk, Rk, etc.).
 ただし、本発明は、かかる例に限定されず、各マイクロレンズ21の表面形状は、基準表面形状に対して微小な誤差(例えば、±1%の形状誤差)の範囲内で変動した形状であってもよい。この場合、各マイクロレンズ21の開口幅Dおよび曲率半径Rは、微小な誤差の範囲内でランダムに変動した値に設定されてもよい。このとき、開口幅Dは、所定の基準開口幅Dkを基準として、微小な変動率δDの範囲内でランダムに変動した値に設定されてもよい(D=Dk±δD%)。同様に、各マイクロレンズ21の曲率半径Rは、所定の基準曲率半径Rkを基準として、微小な変動率δRの範囲内でランダムに変動した値に設定されてもよい(R=Rk±δR%)。このようにレンズパラメータである開口幅Dおよび曲率半径Rを微小な変動させることにより、複数のマイクロレンズ21のレンズ表面形状を、基準表面形状(例えば、対称軸を有する基準非球面形状)から微小に変動させて、相互に異なるレンズ表面形状に設定することができる。このようにレンズ表面形状を変動させる場合には、レンズパラメータの設定ステップ(S12)で設定されるレンズパラメータは、基準表面形状に関するパラメータ(Dk、Rkなど)と、変動率に関するパラメータ(δD、δRなど)を含んでもよい。 However, the present invention is not limited to such an example, and the surface shape of each microlens 21 is a shape that varies within a minute error (for example, ±1% shape error) with respect to the reference surface shape. It's okay. In this case, the aperture width D and radius of curvature R of each microlens 21 may be set to randomly varied values within a small error range. At this time, the aperture width D may be set to a value that randomly varies within a small variation rate δD based on a predetermined reference aperture width Dk (D=Dk±δD%). Similarly, the radius of curvature R of each microlens 21 may be set to a value that randomly varies within the range of a minute variation rate δR with respect to a predetermined reference radius of curvature Rk (R=Rk±δR% ). In this way, by minutely varying the lens parameters aperture width D and radius of curvature R, the lens surface shape of the plurality of microlenses 21 can be changed from a reference surface shape (for example, a reference aspherical shape having an axis of symmetry) to a minute value. It is possible to set mutually different lens surface shapes by varying the lens surface shape. When varying the lens surface shape in this way, the lens parameters set in the lens parameter setting step (S12) include parameters related to the reference surface shape (Dk, Rk, etc.) and parameters related to the variation rate (δD, δR). ) may also be included.
 (S14)Z方向のシフト量Δsの設定
 次いで、S14において、各マイクロレンズ21の配置を、Z方向の基準位置からZ方向にシフトするためのシフト量Δsを設定する。Z方向の基準位置は、Z方向のレンズシフトの基準となる高さ位置(Z座標位置)であり、例えば、図8に示す中心点30の高さ位置(z=0の位置)である。シフト量Δsは、初期設定では当該基準位置に配置されたマイクロレンズ21をZ方向にシフトさせる距離である(図6B参照。)。
(S14) Setting the shift amount Δs in the Z direction Next, in S14, the shift amount Δs for shifting the arrangement of each microlens 21 from the reference position in the Z direction in the Z direction is set. The Z-direction reference position is a height position (Z coordinate position) that serves as a reference for lens shift in the Z direction, and is, for example, the height position of the center point 30 (z=0 position) shown in FIG. The shift amount Δs is a distance by which the microlens 21 placed at the reference position is shifted in the Z direction in the initial setting (see FIG. 6B).
 シフト量Δsは、予め設定された変動幅δSの範囲内でランダムに設定されることが好ましい。即ち、複数のマイクロレンズ21のシフト量Δsが相互に異なる値になるように、各マイクロレンズ21のシフト量Δsは、変動幅δSの範囲内でランダムに変動した値に設定されることが好ましい。例えば、シフト量Δsとして、予め設定された変動幅δSと、乱数(例えば、0.0~1.0の範囲の乱数)との積を用いてよい(Δs=δS×乱数)。この場合、変動幅δSは、複数のマイクロレンズ21のシフト量Δsのうちの最大値である最大シフト量Δsmaxに相当する。 It is preferable that the shift amount Δs is randomly set within a preset fluctuation range δS. That is, the shift amount Δs of each microlens 21 is preferably set to a value that varies randomly within the range of variation δS so that the shift amount Δs of the plurality of microlenses 21 has different values. . For example, the shift amount Δs may be the product of a preset fluctuation range δS and a random number (for example, a random number in the range of 0.0 to 1.0) (Δs=δS×random number). In this case, the fluctuation width δS corresponds to the maximum shift amount Δs max , which is the maximum value among the shift amounts Δs of the plurality of microlenses 21.
 例えば、変動幅δSは、上記式(5)(または式(8))を満たすことが好ましく、上記式(6)(または式(1))を満たすことがより好ましく、上記式(7)(または式(2))を満たすことがより一層好ましい(m=1,2,3・・・)。例えば、上記式(7)を満たす場合、δS=λ/(n-1)となり、シフト量Δsは、0[μm]以上、λ/(n-1)[μm]以下の範囲内の任意の値に設定される。 For example, the fluctuation width δS preferably satisfies the above formula (5) (or formula (8)), more preferably satisfies the above formula (6) (or formula (1)), and satisfies the above formula (7) ( It is even more preferable that the formula (2) is satisfied (m=1, 2, 3...). For example, when the above formula (7) is satisfied, δS=λ/(n-1), and the shift amount Δs can be any value within the range of 0 [μm] or more and λ/(n-1) [μm] or less. set to the value.
 このようにシフト量Δsをランダムな値に設定することにより、複数のマイクロレンズ21のZ方向の位置とレンズ高さhを、より一層不規則に変動させて、各マイクロレンズ21に対して相互に異なる位相差を付与することができる。また、変動幅δSを上記式((5)~(7)を満たす値に設定することで、入射光の波長λとマイクロレンズアレイ20の屈折率nに応じて、δSをより適切な値に設定できる。これにより、各マイクロレンズ21からの出射光(拡散光)に対して、当該波長λと屈折率nに適した範囲内の不規則な位相差を付与できる。よって、当該不規則な位相差を有する出射光に含まれる0次回折光を相互に打ち消し合わせることができるので、上述した0次回折光などの不要な回折光を抑制する効果がより一層高まる。 By setting the shift amount Δs to a random value in this way, the positions in the Z direction and the lens height h of the plurality of microlenses 21 are more irregularly changed, and the mutual can be given different phase differences. Furthermore, by setting the fluctuation width δS to a value that satisfies the above formulas ((5) to (7)), δS can be set to a more appropriate value according to the wavelength λ of the incident light and the refractive index n of the microlens array 20. As a result, it is possible to impart an irregular phase difference within a range suitable for the wavelength λ and refractive index n to the light emitted from each microlens 21 (diffused light). Since the 0th-order diffracted light included in the output light having a phase difference can be canceled out, the effect of suppressing unnecessary diffracted light such as the 0th-order diffracted light described above is further enhanced.
 (S16)レンズ表面形状の決定
 次いで、S16において、上記S12で設定されたレンズパラメータに基づいて、各マイクロレンズ21のレンズ表面形状を決定する。これにより、各マイクロレンズ21のレンズ表面形状とレンズ面の高さhk(図6A参照。)が決定される。
(S16) Determination of Lens Surface Shape Next, in S16, the lens surface shape of each microlens 21 is determined based on the lens parameters set in S12 above. As a result, the lens surface shape and lens surface height hk (see FIG. 6A) of each microlens 21 are determined.
 具体的には、図19に示すように、上記設定されたレンズパラメータに基づいて、各マイクロレンズ21のレンズ面26を表すZ座標位置を計算して、各マイクロレンズ21のレンズ表面形状を決定する。そして、設定されたレンズ表面形状のXY平面上におけるサイズ(例えば、開口幅D)が、上記S12で設定されたパラメータのサイズ(例えば、上記S12で設定された開口幅D)に合うように、設定されたレンズ表面形状のZ方向の高さ位置を調整する。そして、当該高さ位置を調整した後のレンズ表面形状のXY平面による水平断面を、z=0の位置の断面とする。 Specifically, as shown in FIG. 19, the Z coordinate position representing the lens surface 26 of each microlens 21 is calculated based on the lens parameters set above, and the lens surface shape of each microlens 21 is determined. do. Then, the size of the set lens surface shape on the XY plane (for example, aperture width D) matches the size of the parameter set in S12 above (for example, aperture width D set in S12 above). Adjust the height position of the set lens surface shape in the Z direction. Then, the horizontal cross section of the lens surface shape taken on the XY plane after adjusting the height position is defined as the cross section at the position of z=0.
 なお、S16の後に、必要に応じて、各マイクロレンズ21の光軸25とレンズ表面形状を傾斜させる傾斜処理(図8参照。)を行ってもよい。この傾斜処理を行う場合、各マイクロレンズ21の光軸25を、上記方位角βで規定される傾斜方向に、Z方向に対して傾斜角αで傾斜させる。さらに、当該光軸25の傾斜に合わせて、上記S16で決定されたレンズ表面形状を、各マイクロレンズ21の中心点30を回転中心として回転させる。このときの回転角は、傾斜角αと同一であり、回転方向は、上記方位角βの方向である。また、回転中心となる中心点30は、上記S12、S16でマイクロレンズ21の基準表面形状を設計するときの原点(x,y,z)である。 Note that after S16, if necessary, a tilting process (see FIG. 8) may be performed to tilt the optical axis 25 of each microlens 21 and the lens surface shape. When performing this tilting process, the optical axis 25 of each microlens 21 is tilted at a tilt angle α with respect to the Z direction in the tilt direction defined by the azimuth angle β. Further, in accordance with the inclination of the optical axis 25, the lens surface shape determined in S16 is rotated about the center point 30 of each microlens 21 as a rotation center. The rotation angle at this time is the same as the inclination angle α, and the rotation direction is the direction of the azimuth angle β. Further, the center point 30, which is the center of rotation, is the origin (x, y, z) when designing the reference surface shape of the microlens 21 in S12 and S16 above.
 かかる回転処理により、図8に示したように、レンズ表面形状が、Z方向に対して傾斜角αで傾斜して、基準表面形状(図8A参照。)から傾斜表面形状(図8B参照。)に変化する。また、マイクロレンズ21の頂点は、回転前の頂点28から、新たな頂点29に移動する。この新たな頂点29は、基準表面形状を傾斜角αだけ回転させた傾斜表面形状の頂点であり、傾斜角αだけ傾斜した光軸25からずれた位置に配置される。 Through this rotation process, as shown in FIG. 8, the lens surface shape is tilted at an inclination angle α with respect to the Z direction, changing from the reference surface shape (see FIG. 8A) to the inclined surface shape (see FIG. 8B). Changes to Further, the apex of the microlens 21 moves from the apex 28 before rotation to a new apex 29. This new apex 29 is the apex of the inclined surface shape obtained by rotating the reference surface shape by the inclination angle α, and is located at a position tilted by the inclination angle α and shifted from the optical axis 25.
 (S18)レンズ面同士が重なり合う領域におけるレンズ面高さの調整
 次いで、S18において、上記S16でレンズ表面形状が決定された複数のマイクロレンズ21に関し、隣接するマイクロレンズ21、21のレンズ面26の一部が重なり合う場合に、当該重なり合う領域のレンズ面26の高さを調整する。このレンズ面26の高さの調整処理(S18)について、図20および図21を参照して説明する。
(S18) Adjusting the height of the lens surface in the region where the lens surfaces overlap Next, in S18, regarding the plurality of microlenses 21 whose lens surface shapes have been determined in the above S16, the height of the lens surface 26 of the adjacent microlenses 21, 21 is adjusted. When parts overlap, the height of the lens surface 26 in the overlapping area is adjusted. The height adjustment process (S18) of the lens surface 26 will be explained with reference to FIGS. 20 and 21.
 上記レンズ表面形状の決定処理(S16)の結果、図20Aに示すように、隣接するマイクロレンズ21、21のレンズ面26、26同士が部分的に重なり合う場合がある。そこで、当該レンズ面同士が重なり合う領域では、図20Bに示すように、2つのレンズのうち、z値が大きい方(つまり、レンズ面26の高さが高い方)のレンズ面26を、マイクロレンズアレイ20の表面として使用する。 As a result of the lens surface shape determination process (S16), as shown in FIG. 20A, the lens surfaces 26, 26 of adjacent microlenses 21, 21 may partially overlap each other. Therefore, in the area where the lens surfaces overlap, as shown in FIG. 20B, the lens surface 26 of the two lenses with a larger z value (that is, the lens surface 26 with a higher height) is used as a microlens. Used as the surface of array 20.
 より具体的には、レンズ面の高さの調整処理(S18)では、まず、図21に示すように、XY平面上に格子状に配列されたグリッドを設定する。次いで、当該グリッドごとに、上記S16で決定されたレンズ表面形状に基づいて、各グリッドのz値(レンズ高さ)を決定する。 More specifically, in the lens surface height adjustment process (S18), first, as shown in FIG. 21, a grid arranged in a lattice shape on the XY plane is set. Next, for each grid, the z value (lens height) of each grid is determined based on the lens surface shape determined in S16 above.
 より詳細には、例えば図21に示すように、まず、マイクロレンズ21ごとにユニークなレンズIDを設定する。そして、XY平面上のグリッドごとに、レンズ中心からの距離の関数であるz値を決定する。z値は、そのXY平面位置におけるレンズ面26の高さを表す。そして、2つのマイクロレンズ21、21(レンズID=1のレンズと、レンズID=2のレンズ)が相互に重なり合う領域では、レンズID=1のレンズと、レンズID=2のレンズについてそれぞれ、レンズ面26のz値を計算する。そして、2つのレンズのうちz値が大きい方のレンズ面26のz値を、マイクロレンズアレイ20のレンズ面26のz値として使用する。図21では、グリッドごとにレンズIDとして「1」または「2」が割り当てられており、後述するS20において、グリッドごとにどちらのレンズのz値を使用したかを、特定できるようになっている。また、このようにグリッドごとにレンズIDを割り当てることにより、隣り合うマイクロレンズ21、21間の境界線24を特定することもできる。 More specifically, as shown in FIG. 21, for example, a unique lens ID is first set for each microlens 21. Then, the z value, which is a function of the distance from the lens center, is determined for each grid on the XY plane. The z value represents the height of the lens surface 26 at that XY plane position. In the area where the two microlenses 21 and 21 (the lens with lens ID=1 and the lens with lens ID=2) overlap each other, the lens with lens ID=1 and the lens with lens ID=2 are Calculate the z-value of surface 26. Then, the z value of the lens surface 26 of the two lenses with the larger z value is used as the z value of the lens surface 26 of the microlens array 20. In FIG. 21, "1" or "2" is assigned as a lens ID for each grid, and in S20 described later, it is possible to specify which lens's z value is used for each grid. . Further, by assigning a lens ID to each grid in this way, it is also possible to specify the boundary line 24 between adjacent microlenses 21, 21.
 (S20)レンズシフト処理
 その後、S20では、各マイクロレンズ21を、Z方向にシフト量Δsだけシフトする処理が行われる。このシフト処理では、マイクロレンズ21ごとに予めランダムに設定されたシフト量Δsだけ、各マイクロレンズ21のレンズ面26をZ方向にシフトして、各マイクロレンズ21のレンズ面26の高さ位置(z値)が決定される。
(S20) Lens Shift Processing Thereafter, in S20, a process of shifting each microlens 21 by a shift amount Δs in the Z direction is performed. In this shift processing, the lens surface 26 of each microlens 21 is shifted in the Z direction by a shift amount Δs that is randomly set in advance for each microlens 21, and the height position of the lens surface 26 of each microlens 21 ( z value) is determined.
 具体的には、S20では、上記S16でレンズ表面形状が決定された各マイクロレンズ21の高さh’を表すz値に、上記S14でランダムに設定された各マイクロレンズ21のシフト量Δsを表すz値を加算する。これにより、シフトされた後の各マイクロレンズ21の高さh(図6B参照。)を表すz値が決定される(h=h’+Δs)。 Specifically, in S20, the shift amount Δs of each microlens 21 randomly set in S14 above is added to the z value representing the height h' of each microlens 21 whose lens surface shape was determined in S16 above. Add the represented z values. Thereby, the z value representing the height h (see FIG. 6B) of each microlens 21 after being shifted is determined (h=h'+Δs).
 このS20のシフト処理を行う際には、上記S18によりグリッドごとに割り当てられたレンズID(図21参照。)に基づいて、そのグリッドで使用されたマイクロレンズ21と、当該マイクロレンズ21のレンズ面26のz値が特定される。そして、当該特定されたレンズ面26のz値に対して、当該特定されたマイクロレンズ21に設定されたシフト量Δsを加算して、最終的なマイクロレンズ21のレンズ面26の高さhを表すz値が決定される。この際、隣接する2つのマイクロレンズ21、21同士が重なり合う領域については、上記S18にてグリッドごとに割り当てられたレンズIDと、マイクロレンズ21、21間の境界線24とに基づいて、当該2つのマイクロレンズ21、21のうちどちらのレンズのz値と、シフト量Δsを用いて計算するかを判別可能である。 When performing the shift process in S20, based on the lens ID (see FIG. 21) assigned to each grid in S18, the microlens 21 used in that grid and the lens surface of the microlens 21 are selected. Twenty-six z-values are identified. Then, the shift amount Δs set for the specified microlens 21 is added to the z value of the specified lens surface 26 to obtain the final height h of the lens surface 26 of the microlens 21. A representative z value is determined. At this time, regarding the area where two adjacent microlenses 21, 21 overlap, the area where the two adjacent microlenses 21, 21 overlap is determined based on the lens ID assigned to each grid in S18 and the boundary line 24 between the microlenses 21, 21. It is possible to determine which lens among the two microlenses 21 and 21's z value and shift amount Δs should be used for calculation.
 以上のようにして、S20では、各マイクロレンズ21の高さh’を表すz値に対して、マイクロレンズ21ごとにランダムに設定されたシフト量Δsをそれぞれ加算する。これにより、各マイクロレンズ21のレンズ面26はそれぞれ、ランダムなシフト量ΔsでZ方向にシフトされる(図6B参照。)。 As described above, in S20, the shift amount Δs randomly set for each microlens 21 is added to the z value representing the height h' of each microlens 21. As a result, the lens surface 26 of each microlens 21 is shifted in the Z direction by a random shift amount Δs (see FIG. 6B).
 以上、本実施形態に係るマイクロレンズアレイ20の設計方法について説明した。本実施形態に係る設計方法によれば、複数のマイクロレンズ21のレンズ表面形状を、相互に実質的に同一のレンズ表面形状を有する複数のマイクロレンズ21をXY平面上に規則的に配列するとともに(S10、S12、S16)、各マイクロレンズ21のレンズ面をランダムなシフト量ΔsでZ方向にシフトした位置に配置することができる(S14、S20)。これにより、各マイクロレンズ21から出射される拡散光に対して、ランダムなシフト量Δsに応じた不規則な位相差を重畳して付与することができる。 The method for designing the microlens array 20 according to this embodiment has been described above. According to the design method according to the present embodiment, the lens surface shape of the plurality of microlenses 21 is such that the plurality of microlenses 21 having substantially the same lens surface shape are regularly arranged on the XY plane, and (S10, S12, S16), the lens surface of each microlens 21 can be placed at a position shifted in the Z direction by a random shift amount Δs (S14, S20). Thereby, an irregular phase difference corresponding to the random shift amount Δs can be superimposed and imparted to the diffused light emitted from each microlens 21.
 かかるシフト量Δsのランダムなシフトにより、複数のマイクロレンズ21から出射される拡散光に、不規則な位相差を付与することができる。したがって、各マイクロレンズ21から出射される拡散光の回折を相互に打ち消し合わせることができる。よって、マイクロレンズが規則的に配列された従来のマイクロレンズアレイでは抑制できなかったスペクトル状の回折光や0次回折光などを含む不要な回折光を抑制することができる。したがって、複数のマイクロレンズ21からの拡散光が相互に干渉、回折することに起因する拡散光の強度分布のむらを、効果的に抑制できる。よって、規則的に配列されたマイクロレンズアレイ20全体から出射される拡散光の均質性や配光性を、向上することができる。 By such a random shift of the shift amount Δs, an irregular phase difference can be imparted to the diffused light emitted from the plurality of microlenses 21. Therefore, the diffraction of the diffused light emitted from each microlens 21 can be mutually canceled out. Therefore, unnecessary diffracted light including spectral diffracted light and zero-order diffracted light, which could not be suppressed by conventional microlens arrays in which microlenses are regularly arranged, can be suppressed. Therefore, unevenness in the intensity distribution of the diffused light caused by mutual interference and diffraction of the diffused light from the plurality of microlenses 21 can be effectively suppressed. Therefore, the homogeneity and light distribution of the diffused light emitted from the entire regularly arranged microlens array 20 can be improved.
 さらに、本実施形態に係るマイクロレンズアレイ20の設計方法によれば、複数のマイクロレンズ21は基材10のXY平面上に規則的に配置される。さらに、複数のマイクロレンズ21は、所定の重なり量Ovで相互に隙間なく重なり合うように配置され、相隣接するマイクロレンズ21間の境界部分に平坦部が存在しないことが好ましい。これにより、XY平面上に複数のマイクロレンズ21を、相互に隙間なく連続的に配列しつつ、上記レンズシフトにより各マイクロレンズ21に対して相互に異なる拡散特性を付与することができる。かかる構成のマイクロレンズアレイ20は、レンズ表面構造に依存するマクロ光量変動や、不要な回折光による光量変化を低減できるので、良好な均質性および配光性と、有効なカットオフ性を有する拡散光の強度分布を実現できる。 Furthermore, according to the design method of the microlens array 20 according to the present embodiment, the plurality of microlenses 21 are regularly arranged on the XY plane of the base material 10. Furthermore, it is preferable that the plurality of microlenses 21 are arranged so as to overlap each other without any gaps with a predetermined amount of overlap Ov, and that there is no flat part at the boundary between adjacent microlenses 21. Thereby, while arranging the plurality of microlenses 21 continuously on the XY plane with no gaps between them, it is possible to impart different diffusion characteristics to each of the microlenses 21 by the lens shift. The microlens array 20 having such a configuration can reduce macroscopic light intensity fluctuations depending on the lens surface structure and light intensity changes due to unnecessary diffracted light, so it can achieve good homogeneity and light distribution, and diffusion with effective cutoff properties. Light intensity distribution can be realized.
 <7.マイクロレンズの製造方法>
 次に、図22を参照して、本実施形態に係る拡散板1の製造方法について説明する。図22は、本実施形態に係る拡散板1の製造方法を示すフローチャートである。
<7. Microlens manufacturing method>
Next, with reference to FIG. 22, a method for manufacturing the diffusion plate 1 according to this embodiment will be described. FIG. 22 is a flowchart showing a method for manufacturing the diffusion plate 1 according to this embodiment.
 図22に示すように、本実施形態に係る拡散板1の製造方法では、まず、基材(マスタ原盤の基材または拡散板1の基材10)が洗浄される(ステップS101)。基材は、例えば、ガラスロールのようなロール状の基材であってもよいし、ガラスウェハまたはシリコンウェハのような平板状の基材であってもよい。 As shown in FIG. 22, in the method for manufacturing the diffusion plate 1 according to the present embodiment, first, the base material (the base material of the master master or the base material 10 of the diffusion plate 1) is cleaned (step S101). The base material may be, for example, a roll base material such as a glass roll, or a flat base material such as a glass wafer or a silicon wafer.
 次いで、洗浄後の基材の表面上にレジストが形成される(ステップS103)。例えば、金属酸化物を用いたレジストにより、レジスト層を形成することができる。具体的には、ロール状の基材に対しては、レジストをスプレイ塗布またはディッピング処理することにより、レジスト層を形成することができる。一方、平板状の基材に対しては、レジストを各種コーティング処理することにより、レジスト層を形成することができる。なお、レジストとしては、ポジ型光反応レジストを用いてもよいし、ネガ型光反応レジストを用いてもよい。また、基材とレジストとの密着性を高めるために、カップリング剤を使用してもよい。 Next, a resist is formed on the surface of the cleaned base material (step S103). For example, the resist layer can be formed using a resist using a metal oxide. Specifically, a resist layer can be formed on a roll-shaped base material by spray coating or dipping a resist. On the other hand, a resist layer can be formed on a flat base material by subjecting it to various coating treatments. Note that as the resist, a positive photoreactive resist or a negative photoreactive resist may be used. Furthermore, a coupling agent may be used to increase the adhesion between the base material and the resist.
 さらに、マイクロレンズアレイ20の形状に対応するパターンを用いて、レジスト層が露光される(ステップS105)。かかる露光処理は、例えば、グレイスケールマスクを用いた露光、複数のグレイスケールマスクの重ね合わせによる多重露光、または、ピコ秒パルスレーザもしくはフェムト秒パルスレーザ等を用いたレーザ露光など、公知の露光方法を適宜適用すればよい。 Further, the resist layer is exposed using a pattern corresponding to the shape of the microlens array 20 (step S105). Such exposure processing may be performed using known exposure methods, such as exposure using a gray scale mask, multiple exposure by overlapping multiple gray scale masks, or laser exposure using a picosecond pulse laser or femtosecond pulse laser. may be applied as appropriate.
 その後、露光後のレジスト層が現像される(S107)。かかる現像処理により、レジスト層にパターンが形成される。レジスト層の材質に応じて適切な現像液を用いることで、現像処理を実行することができる。例えば、レジスト層が金属酸化物を用いたレジストで形成されている場合、無機または有機アルカリ溶液を用いることで、レジスト層をアルカリ現像することができる。 Thereafter, the exposed resist layer is developed (S107). A pattern is formed in the resist layer by this development process. Development processing can be performed by using an appropriate developer depending on the material of the resist layer. For example, when the resist layer is formed of a resist using a metal oxide, the resist layer can be alkali developed using an inorganic or organic alkaline solution.
 次いで、現像後のレジスト層を用いてスパッタ処理またはエッチング処理することにより(S109)、表面にマイクロレンズアレイ20の形状が形成されたマスタ原盤が完成する(S111)。具体的には、パターンが形成されたレジスト層をマスクとして、ガラス基材をガラスエッチングすることで、ガラスマスタを製造することができる。または、パターンが形成されたレジスト層にNiスパッタまたはニッケルめっき(NED処理)を行い、パターンが転写されたニッケル層を形成した後、基材を剥離することで、メタルマスタを製造することができる。例えば、膜厚50nm程度のNiスパッタ、または膜厚100μm~200μmのニッケルめっき(例えば、スルファミン酸Ni浴)等によって、レジストのパターンが転写されたニッケル層を形成することで、メタルマスタ原盤を製造することができる。 Next, by performing sputtering or etching using the developed resist layer (S109), a master master having the shape of the microlens array 20 formed on its surface is completed (S111). Specifically, a glass master can be manufactured by etching a glass base material using a patterned resist layer as a mask. Alternatively, a metal master can be manufactured by performing Ni sputtering or nickel plating (NED treatment) on a resist layer on which a pattern has been formed, forming a nickel layer with a transferred pattern, and then peeling off the base material. . For example, a metal master master is manufactured by forming a nickel layer with a resist pattern transferred thereto by Ni sputtering with a thickness of about 50 nm or nickel plating with a thickness of 100 μm to 200 μm (e.g., Ni sulfamate bath). can do.
 さらに、上記S111で完成したマスタ原盤(例えば、ガラスマスタ原盤、メタルマスタ原盤)を用いて、樹脂フィルム等にパターンを転写(インプリント)することで、表面にマイクロレンズアレイ20の反転形状が形成されたソフトモールドが作成される(S113)。 Furthermore, by using the master master completed in step S111 (e.g., glass master master, metal master master) to transfer (imprint) a pattern onto a resin film or the like, an inverted shape of the microlens array 20 is formed on the surface. A soft mold is created (S113).
 その後、ソフトモールドを用いて、拡散板1の基材10であるガラス基材またはフィルム基材等に対して、マイクロレンズアレイ20のパターンを転写し(S115)、さらに、必要に応じて保護膜、反射防止膜等を成膜する(S117)。これにより、マスタ原盤とソフトモールドを介して、本実施形態に係る拡散板1を製造することができる。 Thereafter, using a soft mold, the pattern of the microlens array 20 is transferred onto a glass base material, a film base material, etc., which is the base material 10 of the diffuser plate 1 (S115), and if necessary, a protective film is added. , an antireflection film or the like is formed (S117). Thereby, the diffusion plate 1 according to this embodiment can be manufactured using the master master and the soft mold.
 なお、上記では、マスタ原盤(S111)を用いてソフトモールドを製造(S113)した後に、当該ソフトモールドを用いた転写により拡散板1を製造(S115)する例について説明した。しかし、かかる例に限定されず、マイクロレンズアレイ20の反転形状が形成されたマスタ原盤(例えば無機ガラス原盤)を製造し、当該マスタ原盤を用いたインプリントにより拡散板1を製造してもよい。例えば、PET(PolyEthylene Terephthalate)またはPC(PolyCarbonate)からなる基材に、アクリル系光硬化樹脂を塗布し、塗布したアクリル系光硬化樹脂にマスタ原盤のパターンを転写し、アクリル系光硬化樹脂をUV硬化させることで、拡散板1を製造することができる。 Note that, above, an example has been described in which a soft mold is manufactured (S113) using a master master (S111), and then the diffusion plate 1 is manufactured by transfer using the soft mold (S115). However, the invention is not limited to this example, and a master master (for example, an inorganic glass master) on which the inverted shape of the microlens array 20 is formed may be manufactured, and the diffusion plate 1 may be manufactured by imprinting using the master master. . For example, an acrylic photocurable resin is applied to a base material made of PET (PolyEthylene Terephthalate) or PC (PolyCarbonate), a pattern of a master master is transferred to the applied acrylic photocurable resin, and the acrylic photocurable resin is exposed to UV light. By curing, the diffusion plate 1 can be manufactured.
 一方、ガラス基材自体に対して直接加工を施して、拡散板1を製造してもよい。この場合には、上記ステップS107における現像処理に引き続き、CF等の公知の化合物を用いて、拡散板1の基材10に対してドライエッチング処理を施し(S119)、その後、必要に応じて保護膜、反射防止膜等を成膜すればよい(S121)。これにより、本実施形態に係る拡散板1を製造することができる。 On the other hand, the diffuser plate 1 may be manufactured by directly processing the glass base material itself. In this case, following the development process in step S107, a dry etching process is performed on the base material 10 of the diffuser plate 1 using a known compound such as CF4 (S119), and then, if necessary, A protective film, an antireflection film, etc. may be formed (S121). Thereby, the diffusion plate 1 according to this embodiment can be manufactured.
 なお、図22に示した製造方法は、あくまでも一例であって、拡散板1の製造方法は、上記の例に限定されない。本実施形態に係る拡散板1は、例えば、フォトリソグラフィー、エッチング、樹脂転写または電鋳転写など、各種の方法で製造することができる。 Note that the manufacturing method shown in FIG. 22 is just an example, and the manufacturing method of the diffuser plate 1 is not limited to the above example. The diffusion plate 1 according to this embodiment can be manufactured by various methods, such as photolithography, etching, resin transfer, or electroforming transfer.
 <8.拡散板の適用例>
 次に、本実施形態に係る拡散板1の適用例について説明する。
<8. Application examples of diffuser plates>
Next, an application example of the diffuser plate 1 according to this embodiment will be described.
 以上説明したような拡散板1は、その機能を実現するために光を拡散させる必要がある各種の装置に対して、適宜実装することが可能である。かかる装置としては、例えば、各種のディスプレイ(例えば、LED、有機ELディスプレイ)等の表示装置や、プロジェクタ等の投影装置、各種の照明装置を挙げることができる。 The diffusion plate 1 as described above can be appropriately installed in various devices that need to diffuse light in order to realize its functions. Examples of such devices include display devices such as various displays (for example, LEDs and organic EL displays), projection devices such as projectors, and various lighting devices.
 例えば、拡散板1は、液晶表示装置のバックライト、拡散板一体化レンズ等に適用することも可能であり、光整形の用途にも適用可能である。また、拡散板1は、投影装置の透過スクリーン、フレネルレンズ、反射スクリーン等にも適用可能である。また、拡散板1は、スポット照明やベース照明等に利用される各種の照明装置や、各種の特殊ライティングや、中間スクリーンや最終スクリーン等の各種のスクリーン等に適用することも可能である。さらに、拡散板1は、光学装置における光源光の拡散制御などの用途にも適用可能であり、LED光源装置の配光制御、レーザ光源装置の配光制御、各種ライトバルブ系への入射配光制御等にも適用できる。 For example, the diffusion plate 1 can be applied to a backlight of a liquid crystal display device, a lens integrated with a diffusion plate, etc., and can also be applied to light shaping. Further, the diffusion plate 1 can be applied to a transmission screen, a Fresnel lens, a reflection screen, etc. of a projection device. Further, the diffusion plate 1 can be applied to various lighting devices used for spot lighting, base lighting, etc., various special lighting, and various screens such as intermediate screens and final screens. Furthermore, the diffusion plate 1 can be applied to applications such as controlling the diffusion of light source light in optical devices, such as controlling the light distribution of LED light source devices, controlling the light distribution of laser light source devices, and controlling the incident light to various light valve systems. It can also be applied to control, etc.
 なお、拡散板1が適用される装置は、上記の適用例に限定されず、光の拡散を利用する装置であれば、任意の公知の装置に対しても適用可能である。例えば、本実施形態に係る拡散板1は、各種の照明光学系、画像の投影光学系、または計測検出センシング光学系などの光学機器に搭載することができる。このように、本実施形態に係る拡散板1を備える装置は、表示装置、投影装置、照明装置、光検出装置、映像装置、光加工装置、光通信装置または光演算装置などであってもよい。また、拡散板1に対する入射光は、可視光域の波長λを有する光であることが好ましく、例えば、レーザ光などのコヒーレント光であってもよいし、LEDまたはランプなどの光源からのインコヒーレント光であってもよい。また、拡散板1を備える装置が照明装置または映像装置などとして使用される場合、LED光源または白色光源などの光源も併せて使用されてもよい。 Note that the device to which the diffuser plate 1 is applied is not limited to the above application example, but can be applied to any known device as long as it utilizes light diffusion. For example, the diffusion plate 1 according to the present embodiment can be installed in optical equipment such as various illumination optical systems, image projection optical systems, measurement detection sensing optical systems, and the like. As described above, the device including the diffusion plate 1 according to the present embodiment may be a display device, a projection device, a lighting device, a photodetection device, a video device, an optical processing device, an optical communication device, an optical calculation device, etc. . The light incident on the diffuser plate 1 is preferably light having a wavelength λ in the visible light range, and may be, for example, coherent light such as a laser beam, or incoherent light from a light source such as an LED or a lamp. It may be light. Furthermore, when the device including the diffuser plate 1 is used as a lighting device or a video device, a light source such as an LED light source or a white light source may also be used.
 また、本実施形態に係る傾斜非球面形状を有するマイクロレンズ21を備えた拡散板1は、例えば、当該マイクロレンズ21の凹凸構造を備えた原盤を用いたインプリント加工等により、製造することができる。当該原盤は、レーザ光または制御された光源による高精細な精度の描画露光またはステッパ露光と、エッチングなどのフォトリソグラフィー技術とによって製造することができる。例えば、原盤は、リソグラフィーにより成形された構造面を電鋳により転写して製造することも可能であり、ガラスエッチングによる無機デバイスとして製造することも可能である。あるいは、当該原盤は、精密機械加工技術によって製造することもできる。 Further, the diffusion plate 1 including the microlenses 21 having an inclined aspherical shape according to the present embodiment can be manufactured by, for example, imprint processing using a master disk having an uneven structure of the microlenses 21. can. The master disc can be manufactured by high-precision drawing exposure or stepper exposure using laser light or a controlled light source, and photolithography techniques such as etching. For example, the master can be manufactured by transferring a structural surface formed by lithography by electroforming, or it can also be manufactured as an inorganic device by glass etching. Alternatively, the master disc can also be manufactured by precision machining technology.
 本実施形態に係る拡散板1の製品は、例えば、ガラスエッチングによる無機デバイスとして提供されてもよい。また、拡散板1は、例えば、原盤から複製される有機インプリントフィルムとして提供されてもよい。このように、拡散板1の製品は、転写フィルム品、または部材面転写品として提供することができる。拡散板1の転写品を製造する際、平板原盤またはロール状原盤を使用して、射出成形、溶融転写、もしくはフォトポリマリゼーション法のUVレジン転写などを利用できる。 The product of the diffusion plate 1 according to this embodiment may be provided as an inorganic device by glass etching, for example. Further, the diffusion plate 1 may be provided, for example, as an organic imprint film that is copied from a master. In this way, the product of the diffusion plate 1 can be provided as a transfer film product or a member surface transfer product. When manufacturing a transfer product of the diffusion plate 1, a flat plate master or a roll master can be used, and injection molding, melt transfer, UV resin transfer using photopolymerization method, etc. can be used.
 次に、本発明の実施例に係る拡散板について説明する。なお、以下の実施例は、あくまでも本発明に係る拡散板の効果や実施可能性を示すための一例にすぎず、本発明は以下の実施例に限定されるものではない。 Next, a diffusion plate according to an embodiment of the present invention will be described. Note that the following examples are merely examples for showing the effects and feasibility of the diffusion plate according to the present invention, and the present invention is not limited to the following examples.
 <1.設計条件>
 マイクロレンズアレイの表面構造を変更しつつ、以下で説明する設計条件により、本発明の実施例に係る拡散板と、比較例に係る拡散板を設計した。
<1. Design conditions>
A diffuser plate according to an example of the present invention and a diffuser plate according to a comparative example were designed according to the design conditions described below while changing the surface structure of the microlens array.
 表1~表2は、実施例および比較例に係る拡散板に関し、マイクロレンズアレイの表面構造の設計条件と、拡散光の回折ピークを抑制する効果の評価結果を示す。なお、表2には、実施例および比較例が、上述した式(5)、式(6)および式(7)の要件(式(8)、式(1)および式(2)の要件)を満たすか否かと、式(3)、式(4)および式(7)の要件を満たすか否かも示してある。 Tables 1 and 2 show the design conditions of the surface structure of the microlens array and the evaluation results of the effect of suppressing the diffraction peak of diffused light regarding the diffusion plates according to the examples and comparative examples. Table 2 shows examples and comparative examples that meet the requirements of formula (5), formula (6), and formula (7) (requirements of formula (8), formula (1), and formula (2)). It also shows whether or not the requirements of Equation (3), Equation (4), and Equation (7) are satisfied.
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000027
Figure JPOXMLDOC01-appb-T000028
Figure JPOXMLDOC01-appb-T000028
 (1)実施例と比較例の共通の設計条件
 表1に示すように、実施例および比較例とも、基準表面形状(基準開口幅Dk、基準曲率半径Rk)を基準としたレンズ表面形状を有する複数のマイクロレンズを、基材のXY平面上に、規則的に配列して、マイクロレンズアレイを設計した。この際、複数のマイクロレンズを六方格子に沿って規則的に配列して、正規のハニカム配列構造とした(図2参照。)。
(1) Common design conditions for Examples and Comparative Examples As shown in Table 1, both Examples and Comparative Examples have a lens surface shape based on the reference surface shape (reference aperture width Dk, reference radius of curvature Rk). A microlens array was designed by regularly arranging a plurality of microlenses on the XY plane of the base material. At this time, a plurality of microlenses were regularly arranged along a hexagonal lattice to form a regular honeycomb array structure (see FIG. 2).
 実施例および比較例におけるマイクロレンズの基準表面形状は、球面形状とし、基準開口は円形とした。基準表面形状の基準開口幅Dkは、30μmの固定値とした。基準表面形状の基準曲率半径Rkは、60μmの固定値とした。 The reference surface shape of the microlens in Examples and Comparative Examples was spherical, and the reference aperture was circular. The reference opening width Dk of the reference surface shape was set to a fixed value of 30 μm. The reference radius of curvature Rk of the reference surface shape was set to a fixed value of 60 μm.
 また、相互に隣接する2つのマイクロレンズの頂点の間の距離L(以下、「レンズ頂点間距離L」という。Lは、図16に示した「格子間隔i」に相当する。)を、25μmとした。この結果、隣接するマイクロレンズ同士の重なり量Ovを5μmとした(Ov=Dk-L=30μm-25μm=5μm)。また、マイクロレンズアレイを形成する材質(ガラス基材)の屈折率nは、1.5とした。 In addition, the distance L between the vertices of two mutually adjacent microlenses (hereinafter referred to as "lens inter-vertex distance L", L corresponds to "grid interval i" shown in FIG. 16) is 25 μm. And so. As a result, the overlapping amount Ov between adjacent microlenses was set to 5 μm (Ov=Dk−L=30 μm−25 μm=5 μm). Further, the refractive index n of the material (glass base material) forming the microlens array was set to 1.5.
 比較例1および実施例1~8では、レンズ表面形状を変動させずに基準表面形状のままとした。各マイクロレンズの開口幅Dとして、基準開口幅Dk=30μmを用いた。また、各マイクロレンズの曲率半径Rとして、基準曲率半径Rk=60μmを用いた。 In Comparative Example 1 and Examples 1 to 8, the lens surface shape was not changed and remained at the standard surface shape. As the aperture width D of each microlens, a reference aperture width Dk=30 μm was used. Further, as the radius of curvature R of each microlens, a reference radius of curvature Rk=60 μm was used.
 一方、実施例9では、微小な誤差の範囲内(変動率δ[%]=±1%)で、開口幅D、曲率半径R等のレンズパラメータを変動させることにより、レンズ表面形状を微小に変動させた。具体的には、乱数を用いて、基準開口幅Dkを所定の変動率δ(±1%)の範囲内でランダムに変動させることで、各マイクロレンズの開口幅D(ランダム変動値)を求めた。同様に、乱数を用いて、基準曲率半径Rkを所定の変動率δ(±1%)の範囲内でランダムに変動させることで、各マイクロレンズの曲率半径R(ランダム変動値)を求めた。このようにして、実施例9では、各マイクロレンズのレンズ表面形状を、基準表面形状を基準として微小な誤差の範囲内でランダムに変動させた。この結果、実施例9に係るレンズ表面形状の変動後の各マイクロレンズのレンズ高さh’は、基準レンズ高さhk(固定値)からランダムな変動量Δhだけ変動した(h’=hk+Δh)。以上の実施例9のようにレンズ表面形状を微小な誤差(例えば、±1%の形状誤差)の範囲内で微小に変動させる場合も、本発明のマイクロレンズが基準表面形状を有する場合に含まれる。 On the other hand, in Example 9, the lens surface shape is minutely changed by varying lens parameters such as the aperture width D and the radius of curvature R within a minute error range (variation rate δ[%] = ±1%). I varied it. Specifically, by randomly varying the reference aperture width Dk within a predetermined variation rate δ (±1%) using random numbers, the aperture width D (random variation value) of each microlens is determined. Ta. Similarly, the radius of curvature R (random variation value) of each microlens was determined by randomly varying the reference radius of curvature Rk within a predetermined variation rate δ (±1%) using random numbers. In this manner, in Example 9, the lens surface shape of each microlens was randomly varied within a small error range with respect to the reference surface shape. As a result, the lens height h' of each microlens after the variation of the lens surface shape according to Example 9 varied by a random variation amount Δh from the reference lens height hk (fixed value) (h'=hk+Δh) . The case where the lens surface shape is slightly varied within the range of minute error (for example, ±1% shape error) as in Example 9 above is also included in the case where the microlens of the present invention has the reference surface shape. It will be done.
 (2)実施例のみの設計条件
 さらに、実施例1~9では、上記基準表面形状を有する各マイクロレンズを、ランダムなシフト量ΔsだけZ方向にシフトさせた。各マイクロレンズのシフト量Δsとしては、乱数を用いて、予め設定した変動幅δSの範囲内でランダムに変動させた値を用いた。表1に示すように、変動幅δSは、実施例1~9ごとに異なる値(0.266~2.120μm)に設定した。各実施例1~9におけるシフト量Δsの最大値Δs_max(例えば、0.266~2.120μm)と最小値Δs_min(例えば、0μm)との差は、実施例1~9ごとに予め設定した変動幅δS(例えば、0.266~2.120μm)と一致させた(δS=Δs_max-Δs_min)。
(2) Design conditions for Examples only Furthermore, in Examples 1 to 9, each microlens having the above reference surface shape was shifted in the Z direction by a random shift amount Δs. As the shift amount Δs of each microlens, a value was used that was randomly varied within a preset variation width δS using random numbers. As shown in Table 1, the fluctuation width δS was set to a different value (0.266 to 2.120 μm) for each of Examples 1 to 9. The difference between the maximum value Δs_max (for example, 0.266 to 2.120 μm) and the minimum value Δs_min (for example, 0 μm) of the shift amount Δs in each of Examples 1 to 9 is determined by the variation set in advance for each of Examples 1 to 9. The width was made to match the width δS (for example, 0.266 to 2.120 μm) (δS=Δs_max−Δs_min).
 以上のようなレンズシフトにより、実施例1~8では、最終的な各マイクロレンズの頂点の高さh(レンズ高さh)は、上記基準レンズ高さhk(固定値)から、ランダムなシフト量Δsだけ変動した(h=hk+Δs)。一方、実施例9では、最終的なレンズ高さhは、上記レンズ表面形状の微小な変動後のレンズ高さh’から、ランダムなシフト量Δsだけ変動した(h=h’+Δs=hk+Δh+Δs)。また、実施例1~9に係るマイクロレンズアレイでは、隣接するマイクロレンズ間の境界にZ方向の段差が形成され、当該境界の段差により、隣接するマイクロレンズのレンズ面が相互に不連続となった(図5参照。)。 Due to the lens shift described above, in Examples 1 to 8, the final height h of the apex of each microlens (lens height h) is a random shift from the reference lens height hk (fixed value). It varied by an amount Δs (h=hk+Δs). On the other hand, in Example 9, the final lens height h was varied by a random shift amount Δs from the lens height h' after the slight variation in the lens surface shape (h=h'+Δs=hk+Δh+Δs). . In addition, in the microlens arrays according to Examples 1 to 9, a step in the Z direction is formed at the boundary between adjacent microlenses, and due to the step at the boundary, the lens surfaces of adjacent microlenses become discontinuous with each other. (See Figure 5.)
 なお、上述した式(5)(式(8))、式(6)(式(1))および式(7)(式(2))で規定されるシフト量Δsの変動幅δSの好ましい範囲については、表2に示すように、実施例2~9では、式(5)(式(8))の要件を満たすように、δSを設定した。さらに、実施例3~9では、式(6)(式(1))の要件を満たすように、δSを設定した。さらに、実施例4および実施例9では、式(7)(式(2))の要件を満たすように、δSを設定した。なお、式(8)、式(1)および式(2)中の「m」の値は、「1」に設定した。 In addition, the preferable range of the variation range δS of the shift amount Δs defined by the above-mentioned equation (5) (formula (8)), equation (6) (formula (1)), and equation (7) (formula (2)) is As shown in Table 2, in Examples 2 to 9, δS was set so as to satisfy the requirements of formula (5) (formula (8)). Furthermore, in Examples 3 to 9, δS was set so as to satisfy the requirements of equation (6) (formula (1)). Furthermore, in Examples 4 and 9, δS was set so as to satisfy the requirements of Equation (7) (Equation (2)). Note that the value of "m" in Equation (8), Equation (1), and Equation (2) was set to "1".
Figure JPOXMLDOC01-appb-M000029
Figure JPOXMLDOC01-appb-M000029
Figure JPOXMLDOC01-appb-M000030
Figure JPOXMLDOC01-appb-M000030
Figure JPOXMLDOC01-appb-M000031
Figure JPOXMLDOC01-appb-M000031
 また、上述した式(3)および式(4)の左辺で規定される評価値Eva(D’、λ、δZ)については、表2に示すように、実施例5~8では、式(3)の要件を満たすように、有効開口幅D’、波長λおよび最大高低差δZを設定した。実施例6~8では、式(4)の要件を満たすように、有効開口幅D’、波長λおよび最大高低差δZを設定した。 Furthermore, as shown in Table 2, in Examples 5 to 8, the evaluation value Eva (D', λ, δZ) defined by the left side of equations (3) and (4) is calculated by equation (3). ), the effective aperture width D', the wavelength λ, and the maximum height difference δZ were set. In Examples 6 to 8, the effective aperture width D', wavelength λ, and maximum height difference δZ were set so as to satisfy the requirements of equation (4).
Figure JPOXMLDOC01-appb-M000032
Figure JPOXMLDOC01-appb-M000032
Figure JPOXMLDOC01-appb-M000033
Figure JPOXMLDOC01-appb-M000033
 以上のように、実施例1~9に係るマイクロレンズアレイ構造では、実質的に同一のレンズ表面形状を有する複数のマイクロレンズを、変動幅ΔSの範囲内でZ方向にランダムなシフト量Δsでシフトさせた。この結果、当該レンズシフトにより各マイクロレンズから出射される拡散光に対して不規則な位相差「(n―1)・Δs」がそれぞれ付与される。よって、波長λに対する、マイクロレンズアレイ全体の光学的な最大光路長差に相当する位相差「(n―1)・δS」の比率を表すパラメータ「(n―1)・δS/λ」の値は、0.25~1.99であった。 As described above, in the microlens array structures according to Examples 1 to 9, a plurality of microlenses having substantially the same lens surface shape are shifted randomly in the Z direction Δs within the range of variation ΔS. I shifted it. As a result, an irregular phase difference "(n-1)·Δs" is imparted to the diffused light emitted from each microlens due to the lens shift. Therefore, the value of the parameter "(n-1)・δS/λ" that represents the ratio of the phase difference "(n-1)・δS" corresponding to the optical maximum optical path length difference of the entire microlens array to the wavelength λ. was 0.25 to 1.99.
 (3)比較例のみの設計条件
 一方、比較例1では、上記実施例のようなZ方向のレンズシフトを施さなかった(δS=0、Δs=0)。このため、比較例1に係る最終的な各マイクロレンズの頂点の高さh(レンズ高さh)は、上記基準表面形状の基準レンズ高さhkと同一であった(h=hk)。また、比較例1に係るマイクロレンズアレイでは、隣接するマイクロレンズ間の境界にZ方向の段差は形成されず、隣接するマイクロレンズのレンズ面が相互に連続的に接続されていた。この結果、各マイクロレンズから出射される拡散光に対して不規則な位相差「(n―1)・δS」が付与されない。このため、上記パラメータ「(n―1)・δS/λ」の値は、0であった。
(3) Design conditions only for comparative example On the other hand, in comparative example 1, the lens shift in the Z direction as in the above example was not performed (δS=0, Δs=0). Therefore, the final apex height h (lens height h) of each microlens according to Comparative Example 1 was the same as the reference lens height hk of the reference surface shape (h=hk). Further, in the microlens array according to Comparative Example 1, no step in the Z direction was formed at the boundary between adjacent microlenses, and the lens surfaces of adjacent microlenses were continuously connected to each other. As a result, the irregular phase difference "(n-1)·δS" is not imparted to the diffused light emitted from each microlens. Therefore, the value of the parameter "(n-1)·δS/λ" was 0.
 <2.シミュレーション条件と製造条件>
 以上のように設計された実施例1~9と比較例1に係るマイクロレンズアレイに対して、入射光として、Z方向のコリメート光(波長λ=0.532μm)を入射したときの、マイクロレンズアレイによる拡散配光の状態をシミュレーションした。具体的には、電磁場解析を用いて、実施例1~9と比較例1に係るマイクロレンズアレイを備えた拡散板による拡散光の配光をシミュレーションした。また、実施例1~9と比較例1に係るマイクロレンズアレイを備えた拡散板から、100mmの距離にあるスクリーンに投影された拡散光の振幅分布をシミュレーションした。なお、マイクロレンズアレイが形成されている材質であるガラス基材の屈折率は、「1.5」とした。
<2. Simulation conditions and manufacturing conditions>
When collimated light in the Z direction (wavelength λ = 0.532 μm) was incident on the microlens arrays of Examples 1 to 9 and Comparative Example 1 designed as described above, the microlens We simulated the state of diffused light distribution by the array. Specifically, using electromagnetic field analysis, the distribution of diffused light by the diffuser plates equipped with microlens arrays according to Examples 1 to 9 and Comparative Example 1 was simulated. In addition, the amplitude distribution of diffused light projected from the diffuser plate equipped with the microlens array according to Examples 1 to 9 and Comparative Example 1 onto a screen at a distance of 100 mm was simulated. Note that the refractive index of the glass base material, which is the material on which the microlens array is formed, was set to "1.5".
 <3.評価基準>
 次いで、上記のシミュレーション結果と、実際に製造した拡散板を用いて、実施例および比較例に係る拡散板による回折光の抑制効果を評価した。以下に、この回折光の抑制効果の評価基準について、表2、図23~図24を参照して説明する。
<3. Evaluation criteria>
Next, the effects of suppressing diffracted light by the diffusion plates according to the examples and comparative examples were evaluated using the above simulation results and the actually manufactured diffusion plates. The evaluation criteria for the suppressing effect on diffracted light will be described below with reference to Table 2 and FIGS. 23 to 24.
 図23、図24は、比較例1および実施例1~9に関し、表2に示したパラメータ「(n―1)・δS/λ」の値と、回折ピークレベルA(振幅)、回折ピーク比率Kとの関係をそれぞれ示すグラフである。 23 and 24 show the values of the parameters “(n-1)・δS/λ” shown in Table 2, the diffraction peak level A (amplitude), and the diffraction peak ratio for Comparative Example 1 and Examples 1 to 9. KA is a graph showing the relationship with A.
 上述したように、回折ピークレベル(A)は、拡散板1から出射される拡散光に含まれる回折光のピークのレベル(例えば、振幅)を表す指標である。回折ピーク比率(K)は、回折ピークレベルの基準値(Ak)に対する、測定された回折ピークレベル(A)の比率である(K[%]=(A/Ak)×100)。本実施例に係るシミュレーションでは、比較例1に係るレンズシフトを施していないマイクロレンズアレイを用いて、回折ピークレベル(例えば、回折輝線スペクトルの振幅)をシミュレーションしたときの測定値を、回折ピークレベルの基準値(Ak)とした。また、実施例1~9に係るレンズシフトを施したマイクロレンズアレイを用いて、拡散光の回折ピークレベル(例えば、回折輝線スペクトルの振幅)をシミュレーションしたときの測定値を、回折ピークレベル(A)とした。つまり、実施例1~9に係る回折ピーク比率K[%]は、比較例1に係る回折ピーク比率Kの基準値(=100%)に対する割合を示す。回折ピーク比率Kの値が小さいほど、回折光のピーク(特に、0次回折光のピーク)を適切に低減でき、不要な回折光を好適に抑制できることを表す。 As described above, the diffraction peak level (A) is an index representing the level (for example, amplitude) of the peak of diffracted light included in the diffused light emitted from the diffuser plate 1. The diffraction peak ratio (K A ) is the ratio of the measured diffraction peak level (A) to the reference value (Ak) of the diffraction peak level (K A [%]=(A/Ak)×100). In the simulation according to this example, the measured value when simulating the diffraction peak level (for example, the amplitude of the diffraction emission line spectrum) using the microlens array without the lens shift according to Comparative Example 1 is calculated as the diffraction peak level. The reference value (Ak) was set as the reference value (Ak). In addition, the measured value when simulating the diffraction peak level (for example, the amplitude of the diffraction emission line spectrum) of diffused light using the microlens array subjected to the lens shift according to Examples 1 to 9 was calculated using the diffraction peak level (A ). That is, the diffraction peak ratio K A [%] according to Examples 1 to 9 indicates the ratio of the diffraction peak ratio K A according to Comparative Example 1 to the reference value (=100%). The smaller the value of the diffraction peak ratio KA , the more appropriately the peak of the diffracted light (especially the peak of the 0th order diffracted light) can be reduced, and the more appropriately the unnecessary diffracted light can be suppressed.
 各実施例1~9および比較例1に係る拡散板による不要な回折光(スペクトル回折光および0次回折光)の抑制効果を、次のような評価基準により5段階(評価A、B、C、D、X)で評価した。かかる不要な回折光の抑制効果の評価結果を上記表2に示す。 The effect of suppressing unnecessary diffracted light (spectral diffracted light and 0th order diffracted light) by the diffusion plates of Examples 1 to 9 and Comparative Example 1 was evaluated in five grades (ratings A, B, C, D, X). The evaluation results of the suppressing effect on unnecessary diffracted light are shown in Table 2 above.
 A:回折ピーク比率Kを10%以下に低減でき、回折光の抑制効果が極めて顕著に優れる。
 B:回折ピーク比率Kを30%以下に低減でき、回折光の抑制効果が顕著に優れる
 C:回折ピーク比率Kを60%以下に低減でき、回折光の抑制効果が優れる。
 D:回折ピーク比率Kが100%未満であり、比較例(回折ピーク比率K=100%)よりも回折光の抑制効果が改善している。
 X:回折ピーク比率Kが100%(基準値)であり、回折光の抑制効果が劣る。
A: Diffraction peak ratio K A can be reduced to 10% or less, and the effect of suppressing diffracted light is extremely excellent.
B: Diffraction peak ratio K A can be reduced to 30% or less, and the effect of suppressing diffracted light is outstanding. C: Diffraction peak ratio K A can be reduced to 60% or less, and the effect of suppressing diffracted light is excellent.
D: Diffraction peak ratio K A is less than 100%, and the suppressing effect of diffracted light is improved compared to the comparative example (diffraction peak ratio K A =100%).
X: Diffraction peak ratio K A is 100% (reference value), and the effect of suppressing diffracted light is poor.
 <4.評価結果>
 次に、上記表1~2と、図23~図34を参照して、実施例と比較例の評価結果について対比検討する。
<4. Evaluation results>
Next, with reference to Tables 1 and 2 above and FIGS. 23 to 34, the evaluation results of Examples and Comparative Examples will be compared and examined.
 図25~図34はそれぞれ、比較例1および実施例1~9に係る拡散板による拡散光の配光特性や輝度分布等のシミュレーション結果を示す。 FIGS. 25 to 34 show simulation results of the light distribution characteristics, brightness distribution, etc. of diffused light by the diffuser plates according to Comparative Example 1 and Examples 1 to 9, respectively.
 なお、図25~図34において、(a)は、コンピュータにより生成されたマイクロレンズアレイの1つの単位セル3(図1参照。)の表面形状を示すビットマップデータ画像である。(b)は、電磁場解析による配光のシミュレーション結果を示す画像である。(c)は、拡散板から100mmの距離にあるスクリーンに投影された拡散光の輝度分布のシミュレーション結果を示すグラフである。(c)のグラフにおいて、横軸:スクリーンの水平方向の座標位置[mm]、縦軸:回折ピークレベルA(縦軸のスケールは、0~2.4[V/m]の範囲))である。回折ピークレベルAは、例えば、拡散光の振幅分布を表す輝線スペクトルの振幅値(電界強度)である。(d)は、表2に示した回折ピーク比率Kと、回折ピークの抑制効果の評価結果を示す。 Note that in FIGS. 25 to 34, (a) is a bitmap data image showing the surface shape of one unit cell 3 (see FIG. 1) of the microlens array, which was generated by a computer. (b) is an image showing a simulation result of light distribution by electromagnetic field analysis. (c) is a graph showing simulation results of the brightness distribution of diffused light projected onto a screen located at a distance of 100 mm from the diffuser plate. In the graph (c), horizontal axis: horizontal coordinate position of the screen [mm], vertical axis: diffraction peak level A (vertical axis scale ranges from 0 to 2.4 [V/m]). be. The diffraction peak level A is, for example, the amplitude value (electric field strength) of a bright line spectrum representing the amplitude distribution of diffused light. (d) shows the diffraction peak ratio K A shown in Table 2 and the evaluation results of the diffraction peak suppression effect.
 (1)比較例1と実施例1~9との対比(レンズシフトの有効性)
 表1および図25に示すように、比較例1では、Δs=0、δS=0であり、各マイクロレンズをZ方向にランダムにシフトさせておらず、マイクロレンズ間の境界に段差が形成されていない。このため、比較例1では、規則的に配列された複数のマイクロレンズに対して位相差が付与されていない。したがって、図25に示すように、マイクロレンズアレイの周期構造に起因するスペクトル回折光や、各レンズの光軸付近に発生する0次回折光などの不要な回折光が顕著に発生し、回折ピークレベルAが「2.20」と顕著に高い値となった。このように、比較例1では、スペクトル回折光や0次回折光を抑制する効果はなく、表2の評価結果に示すように、最も低いX評価であった。
(1) Comparison between Comparative Example 1 and Examples 1 to 9 (effectiveness of lens shift)
As shown in Table 1 and FIG. 25, in Comparative Example 1, Δs=0 and δS=0, each microlens was not randomly shifted in the Z direction, and a step was formed at the boundary between the microlenses. Not yet. Therefore, in Comparative Example 1, no phase difference is imparted to the plurality of regularly arranged microlenses. Therefore, as shown in FIG. 25, unnecessary diffracted light such as spectral diffracted light due to the periodic structure of the microlens array and 0th-order diffracted light generated near the optical axis of each lens is significantly generated, and the diffraction peak level A was a significantly high value of "2.20". As described above, Comparative Example 1 had no effect of suppressing spectral diffraction light or zero-order diffraction light, and as shown in the evaluation results in Table 2, had the lowest X evaluation.
 これに対し、実施例1~9では、Δs≧0、δS>0であり、各マイクロレンズをZ方向にランダムにシフトさせ、マイクロレンズ間の境界に段差を形成した。これにより、実施例1~9では、実質的に同一のレンズ表面形状を有する複数のマイクロレンズが六方格子に沿って規則的に配列されているにもかかわらず、レンズシフトにより、スペクトル回折光や0次回折光などの不要な回折光を抑制する効果を発揮した。この結果、表2および図26~図34に示すように、実施例1~9では、比較例1と比べて、不要な回折光のピークを好適に抑制することができ、図24に示すように、回折ピーク比率Kを82%以下に低減することができた。したがって、表2の評価結果に示すように実施例1~9では、回折光の抑制効果の評価がA~D評価であった。 On the other hand, in Examples 1 to 9, Δs≧0 and δS>0, each microlens was randomly shifted in the Z direction, and a step was formed at the boundary between the microlenses. As a result, in Examples 1 to 9, although a plurality of microlenses having substantially the same lens surface shape are regularly arranged along a hexagonal lattice, due to lens shift, spectral diffracted light and This has the effect of suppressing unnecessary diffracted light such as 0th-order diffracted light. As a result, as shown in Table 2 and FIGS. 26 to 34, in Examples 1 to 9, the peak of unnecessary diffracted light could be suppressed more favorably than in Comparative Example 1, and as shown in FIG. In addition, the diffraction peak ratio KA was able to be reduced to 82% or less. Therefore, as shown in the evaluation results in Table 2, in Examples 1 to 9, the diffracted light suppression effect was evaluated as A to D.
 このように、実施例1~9はいずれも、比較例1と比べて、回折光の抑制効果に優れていた。この理由は、実施例1~9では、レンズシフトにより、マイクロレンズアレイの表面構造を不規則にして、各マイクロレンズからの拡散光に不規則な位相差を重畳しているからと考えられる。よって、実施例1~9のようにマイクロレンズをランダムにシフトさせることによって、スペクトル回折光や0次回折光などを含む不要な回折光の抑制効果を高めて、拡散光の強度分布のむらを低減し、拡散光の均質性や配光性を向上できることが確認された。 As described above, all of Examples 1 to 9 were superior to Comparative Example 1 in suppressing diffracted light. The reason for this is thought to be that in Examples 1 to 9, the surface structure of the microlens array is made irregular by lens shift, and an irregular phase difference is superimposed on the diffused light from each microlens. Therefore, by randomly shifting the microlenses as in Examples 1 to 9, the effect of suppressing unnecessary diffracted light including spectral diffracted light and zero-order diffracted light is enhanced, and the unevenness of the intensity distribution of diffused light is reduced. It was confirmed that the homogeneity and light distribution of diffused light could be improved.
 (2)実施例1~9の対比(シフト量Δsの変動幅δSの条件の有効性)
 次に、上述した屈折率差(n-1)および変動幅δSの双方を考慮した光学的な最大光路長差「(n―1)・δS」に相当する位相差と、当該位相差に関するパラメータ「(n―1)・δS/λ」に関する式(5)~式(7)の条件の有効性について説明する。
(2) Comparison of Examples 1 to 9 (effectiveness of the condition of fluctuation width δS of shift amount Δs)
Next, the phase difference corresponding to the optical maximum optical path length difference "(n-1)・δS" considering both the refractive index difference (n-1) and the variation width δS described above, and the parameters related to the phase difference. The validity of the conditions of equations (5) to (7) regarding “(n−1)·δS/λ” will be explained.
 (2A)式(5)および式(8)について
 表2に示すように、実施例1は、式(5)を満たしていないのに対し、実施例2~9は、式(5)を満たしており、上記パラメータ「(n―1)・δS/λ」が0.5以上である。これにより、表2および図23、図24に示すように、実施例2~9では、回折ピークレベルAを1.80以下に低減でき、回折ピーク比率Kを59%以下に低減できており、回折光の抑制効果の評価はC評価以上である。この理由は、式(5)を満たすことにより、より適切な変動幅δSの範囲内のシフト量Δsで各マイクロレンズを不規則にシフトさせることができるので、回折光の抑制効果をより向上できるからと考えられる。
(2A) Regarding Equations (5) and Equations (8) As shown in Table 2, Example 1 does not satisfy Equation (5), whereas Examples 2 to 9 do not satisfy Equation (5). and the parameter "(n-1)·δS/λ" is 0.5 or more. As a result, as shown in Table 2 and FIGS. 23 and 24, in Examples 2 to 9, the diffraction peak level A could be reduced to 1.80 or less, and the diffraction peak ratio K A could be reduced to 59% or less. The evaluation of the suppressing effect on diffracted light is C rating or higher. The reason for this is that by satisfying equation (5), each microlens can be irregularly shifted by a shift amount Δs within a more appropriate range of fluctuation δS, which can further improve the effect of suppressing diffracted light. It is thought to be from
 かかる結果により、式(5)を満たすことにより、回折ピーク比率Kを60%以下に低減できることが確認された。また、図24のグラフの結果からすれば、上記式(8)を満たすことにより、式(5)と同様に、回折ピーク比率Kを60%以下に低減できるといえる。 These results confirmed that by satisfying formula (5), the diffraction peak ratio K A can be reduced to 60% or less. Moreover, according to the results of the graph in FIG. 24, it can be said that by satisfying the above formula (8), the diffraction peak ratio K A can be reduced to 60% or less, similarly to formula (5).
 (2B)式(6)および式(1)について
 また、表2に示すように、実施例1、2は、式(6)を満たしていないのに対し、実施例3~9は、式(6)を満たしており、上記パラメータ「(n―1)・δS/λ」が0.75以上である。これにより、表2および図23、図24に示すように、実施例3~9では、回折ピークレベルAを1.30以下に低減でき、回折ピーク比率Kを27%以下に低減できており、回折光の抑制効果の評価はB評価以上である。この理由は、式(6)を満たすことにより、より一層適切な変動幅δSの範囲内のシフト量Δsで各マイクロレンズを不規則にシフトさせることができるので、回折光の抑制効果をより一層向上できるからと考えられる。
(2B) Regarding formula (6) and formula (1) Furthermore, as shown in Table 2, Examples 1 and 2 do not satisfy formula (6), whereas Examples 3 to 9 satisfy formula ( 6) is satisfied, and the above parameter "(n-1)·δS/λ" is 0.75 or more. As a result, as shown in Table 2 and FIGS. 23 and 24, in Examples 3 to 9, the diffraction peak level A could be reduced to 1.30 or less, and the diffraction peak ratio K A could be reduced to 27% or less. The evaluation of the suppressing effect on diffracted light is B rating or higher. The reason for this is that by satisfying Equation (6), each microlens can be irregularly shifted by a shift amount Δs within a more appropriate variation width δS, which further improves the effect of suppressing diffracted light. This is probably because it can be improved.
 かかる結果により、式(6)を満たすことにより、回折ピーク比率Kを30%以下に低減できることが確認された。また、図24のグラフの結果からすれば、上記式(1)を満たすことにより、式(6)と同様に、回折ピーク比率Kを30%以下に低減できるといえる。 These results confirmed that by satisfying formula (6), the diffraction peak ratio K A can be reduced to 30% or less. Further, from the results of the graph in FIG. 24, it can be said that by satisfying the above formula (1), the diffraction peak ratio K A can be reduced to 30% or less, similarly to formula (6).
 (2C)式(7)および式(2)について
 さらに、表2に示すように、実施例1~3、5、6は、式(7)を満たしていないのに対し、実施例4は、式(7)を満たしており、上記パラメータ「(n―1)・δS/λ」が1.0である。これにより、表2および図23、図24に示すように、実施例4では、回折ピークレベルAを0.16にまで低減でき、回折ピーク比率Kを7%にまで低減できており、回折光の抑制効果の評価はA評価である。この理由は、式(7)を満たすことにより、最適な変動幅δSの範囲内のシフト量Δsで各マイクロレンズを不規則にシフトさせることができるので、回折光の抑制効果を顕著に向上できるからと考えられる。
(2C) Regarding formula (7) and formula (2) Furthermore, as shown in Table 2, Examples 1 to 3, 5, and 6 do not satisfy formula (7), whereas Example 4 Equation (7) is satisfied, and the parameter "(n-1)·δS/λ" is 1.0. As a result, as shown in Table 2 and FIGS. 23 and 24, in Example 4, the diffraction peak level A could be reduced to 0.16, and the diffraction peak ratio K A could be reduced to 7%. The light suppression effect was evaluated as A. The reason for this is that by satisfying Equation (7), each microlens can be irregularly shifted by a shift amount Δs within the range of the optimal fluctuation width δS, and the effect of suppressing diffracted light can be significantly improved. It is thought to be from
 また、図24のグラフの変化から分かるように、実施例4のように「(n―1)・δS/λ」が1.0付近である場合に、回折ピーク比率Kが顕著に低下して、K=7%となっている。一方、「(n―1)・δS/λ」が1.0から増加または減少するにつれ、回折ピーク比率Kが10%超に上昇しており、実施例3(「(n―1)・δS/λ」=0.75)では、K=27%であり、実施例5(「(n―1)・δS/λ」=1.25)では、K=19%である。また、実施例8のように「(n―1)・δS/λ」が2.0付近である場合も同様に、回折ピーク比率Kが顕著に低下している。これらの結果からすると、「(n―1)・δS/λ」が1、2、・・・などの整数付近の値である場合、即ち、上記式(2)で示したように光路長差「(n―1)・δS」が波長λの整数倍「m・λ」付近である場合(例えば、「(n―1)・δS」=「m・λ」±10%である場合)に、回折ピーク比率Kを10%以下にまで顕著に低減できるといえる。 Furthermore, as can be seen from the changes in the graph in FIG. 24, when "(n-1)・δS/λ" is around 1.0 as in Example 4, the diffraction peak ratio K A decreases significantly. Therefore, K A =7%. On the other hand, as "(n-1)・δS/λ" increases or decreases from 1.0, the diffraction peak ratio K A increases to more than 10%. δS/λ"=0.75), K A =27%, and in Example 5 ("(n-1)·δS/λ"=1.25), K A =19%. Similarly, when "(n-1)·δS/λ" is around 2.0 as in Example 8, the diffraction peak ratio K A is significantly reduced. From these results, if "(n-1)・δS/λ" is a value near an integer such as 1, 2, etc., that is, the optical path length difference is When “(n-1)・δS” is around an integer multiple of wavelength λ “m・λ” (for example, when “(n-1)・δS” = “m・λ” ±10%) , it can be said that the diffraction peak ratio K A can be significantly reduced to 10% or less.
 かかる結果により、式(7)を満たすことにより、回折ピーク比率Kを10%以下に低減できることが確認された。また、図24のグラフの結果からすれば、上記式(2)を満たすことにより、式(7)と同様に、回折ピーク比率Kを10%以下に低減できるといえる。 These results confirmed that by satisfying formula (7), the diffraction peak ratio K A can be reduced to 10% or less. Further, from the results of the graph in FIG. 24, it can be said that by satisfying the above formula (2), the diffraction peak ratio K A can be reduced to 10% or less, similarly to formula (7).
 なお、実施例9も、式(7)を満たしているため、回折ピーク比率Kが十分に低下しているが、11%程度であり、わずかに10%を上回っている。この理由は、実施例9では、レンズ表面形状を微小な誤差の範囲内で変動させたため、回折ピークレベルAの測定値にも誤差が生じたからであると推察される。いずれにしろ、実施例4、9のように式(7)や式(2)を満たすことにより、回折ピーク比率Kを11%以下にまで大幅に低減できることは確認された。 In addition, since Example 9 also satisfies formula (7), the diffraction peak ratio K A is sufficiently reduced, but it is about 11%, which is slightly over 10%. The reason for this is presumed to be that in Example 9, since the lens surface shape was varied within a small error range, an error also occurred in the measured value of the diffraction peak level A. In any case, it was confirmed that by satisfying formula (7) and formula (2) as in Examples 4 and 9, the diffraction peak ratio K A could be significantly reduced to 11% or less.
 (3)実施例2~9の対比(式(3)と(4)の要件の有効性)
 上述したように、式(3)および式(4)は、λとDkとδZを変数とする評価値Eva(D’,λ,δZ)の適正範囲に関する要件である。表2に示すように、実施例5~8は、式(3)の要件を満たし、実施例6~8は、式(3)および式(4)の双方の要件を満たしている。これに対し、実施例2~4は、式(3)および式(4)の双方の要件を満たしていない。なお、実施例2~9はいずれも、前述した式(5)の要件を満たしており、当該要件に関して、これら実施例2~9の間で差はない。
(3) Comparison of Examples 2 to 9 (effectiveness of requirements of formulas (3) and (4))
As described above, equations (3) and (4) are requirements regarding the appropriate range of the evaluation value Eva (D', λ, δZ) with λ, Dk, and δZ as variables. As shown in Table 2, Examples 5 to 8 satisfy the requirements of formula (3), and Examples 6 to 8 satisfy the requirements of both formula (3) and formula (4). On the other hand, Examples 2 to 4 do not satisfy the requirements of both formula (3) and formula (4). Note that Examples 2 to 9 all satisfy the requirements of the above-mentioned formula (5), and there is no difference between Examples 2 to 9 with respect to the requirements.
 式(3)および式(4)の双方の要件を満たしていない実施例2~4では、表2に示すように、回折光のピークの抑制効果の評価がA~C評価である一方、表2には示さないが、拡散光の強度分布の均斉度の評価が比較的劣っていた。したがって、当該実施例2~4では、0次回折光を中心とする回折光のピークの抑制効果があるが、拡散光の強度分布の均斉度の評価が低く、スペクトル回折光を抑制する効果に改善の余地があった。 In Examples 2 to 4, which do not satisfy the requirements of both formula (3) and formula (4), as shown in Table 2, the evaluation of the suppression effect of the peak of diffracted light is A to C, while Although not shown in No. 2, the evaluation of the uniformity of the intensity distribution of the diffused light was relatively poor. Therefore, in Examples 2 to 4, there is an effect of suppressing the peak of diffracted light centered on the 0th-order diffracted light, but the evaluation of the uniformity of the intensity distribution of diffused light is low, and the effect is improved to suppress the spectral diffracted light. There was room for.
 これに対し、式(3)の要件を満たしている実施例5~8では、表2に示すように、回折光のピークの抑制効果の評価がA~B評価であり、表2には示さないが、拡散光の強度分布の均斉度の評価も比較的優れていた。当該実施例5~8では、上記式(3)の要件を満たしていない実施例2~4と比べて、スペクトル回折光を抑制する効果に優れ、拡散光の強度分布を均斉化する効果にも優れていた。 On the other hand, in Examples 5 to 8 that satisfy the requirements of formula (3), the evaluation of the suppressing effect on the peak of diffracted light is A to B, as shown in Table 2. However, the evaluation of the uniformity of the intensity distribution of diffused light was also relatively excellent. In Examples 5 to 8, compared to Examples 2 to 4, which do not satisfy the requirements of formula (3) above, they are more effective in suppressing spectral diffraction light and are also more effective in equalizing the intensity distribution of diffused light. It was excellent.
 以上により、実施例5~8のように式(3)を満たすことによって、スペクトル回折光を抑制して、拡散光の強度分布を均斉化する効果に優れ、拡散光の均質性や配光性をさらに向上できることが確認された。 As described above, by satisfying the formula (3) as in Examples 5 to 8, it is possible to suppress the spectral diffraction light and equalize the intensity distribution of the diffused light, thereby improving the homogeneity and light distribution of the diffused light. It was confirmed that this could be further improved.
 さらに、式(3)だけでなく式(4)の要件も満たしている実施例6~8は、回折光のピークの抑制効果がA~B評価であり、かつ、拡散光の強度分布の均斉度の評価も、実施例5よりさらに優れていた。当該実施例6~8では、上記式(4)の要件を満たしていない実施例5と比べて、拡散光の強度分布をより一層均斉化する効果に優れていた。 Furthermore, in Examples 6 to 8, which satisfy not only the requirements of formula (3) but also formula (4), the suppressing effect of the peak of diffracted light is evaluated as A to B, and the intensity distribution of diffused light is uniform. The degree of evaluation was also even better than that of Example 5. Examples 6 to 8 were more effective in making the intensity distribution of diffused light more uniform than Example 5, which did not satisfy the requirements of the above formula (4).
 以上により、実施例6~8のように式(4)を満たすことによって、スペクトル回折光の抑制効果と、拡散光の強度分布を均斉化する効果をより一層向上でき、拡散光の均質性や配光性をより一層向上できることが確認された。 As described above, by satisfying formula (4) as in Examples 6 to 8, the effect of suppressing spectral diffracted light and the effect of equalizing the intensity distribution of diffused light can be further improved, and the homogeneity of diffused light can be improved. It was confirmed that the light distribution could be further improved.
 (4)まとめ
 上記実施例では、0次回折光やスペクトル回折光を抑制しにくいと想定されるマイクロレンズの基準表面形状(基準開口幅Dkが30μm、基準曲率半径Rkが60m)を基準として、マイクロレンズアレイを設計した。そして、実施例では、可視光域のうち比較的長い波長(λ=0.532μm)の入射光を想定し、最大2.1μm程度の変動幅δSでランダムに変動するシフト量Δsを用いて、各マイクロレンズをZ方向に不規則にシフトさせた。そして、かかるレンズシフトを施した実施例1~9と、レンズシフトを施さない比較例1とを比較して、拡散光の均質性や配光性を評価するシミュレーションを行った。
(4) Summary In the above example, the reference surface shape of the microlens (reference aperture width Dk of 30 μm, reference radius of curvature Rk of 60 m), which is assumed to be difficult to suppress zero-order diffraction light and spectral diffraction light, is used as a reference. designed a lens array. In the example, assuming incident light with a relatively long wavelength (λ = 0.532 μm) in the visible light range, using a shift amount Δs that randomly fluctuates with a fluctuation width δS of about 2.1 μm at maximum, Each microlens was shifted irregularly in the Z direction. Then, a simulation was conducted to evaluate the homogeneity and light distribution of diffused light by comparing Examples 1 to 9 in which such lens shifts were applied and Comparative Example 1 in which no lens shifts were applied.
 実施例1~9では、各マイクロレンズをZ方向にシフトするという幾何学的な変位により、各マイクロレンズから出射される拡散光に、不規則な光学的位相差を付与した。これによって、マイクロレンズごとに付与された不規則な光学的位相差により、0次回折光などの不要な回折光のピークを低減する効果に優れ、拡散角度特性を変化させることなく、トップハット形状を有する均質な配光特性を実現できることが確認された。 In Examples 1 to 9, an irregular optical phase difference was imparted to the diffused light emitted from each microlens by geometrically shifting each microlens in the Z direction. As a result, the irregular optical phase difference given to each microlens has an excellent effect of reducing the peak of unnecessary diffracted light such as 0th order diffracted light, and the top hat shape can be achieved without changing the diffusion angle characteristics. It was confirmed that it is possible to achieve homogeneous light distribution characteristics.
 以上、添付図面を参照しながら本発明の好適な実施形態について詳細に説明したが、本発明はかかる例に限定されない。本発明の属する技術の分野における通常の知識を有する者であれば、特許請求の範囲に記載された技術的思想の範疇内において、各種の変更例または修正例に想到し得ることは明らかであり、これらについても、当然に本発明の技術的範囲に属するものと了解される。 Although preferred embodiments of the present invention have been described above in detail with reference to the accompanying drawings, the present invention is not limited to such examples. It is clear that a person with ordinary knowledge in the technical field to which the present invention pertains can come up with various changes or modifications within the scope of the technical idea stated in the claims. It is understood that these also naturally fall within the technical scope of the present invention.
 例えば、上記実施形態では、複数のマイクロレンズ21は、基材10のXY平面上に、正方格子、矩形格子、六方格子などの基準格子に沿って、規則的に配列される例について説明したが、本発明はかかる例に限定されない。例えば、複数のマイクロレンズ21は、基材10のXY平面上において準規則的に配置されてもよい。具体的には、複数のマイクロレンズ21は、例えば、上記各種の基準格子に沿った配列を基本としつつも、格子間隔を微小範囲でランダムに変動させるなどして、ある程度ランダムに配列されてもよい(準規則的な配列)。 For example, in the embodiment described above, the plurality of microlenses 21 are arranged regularly on the XY plane of the base material 10 along a reference lattice such as a square lattice, a rectangular lattice, a hexagonal lattice, etc. However, the present invention is not limited to such examples. For example, the plurality of microlenses 21 may be arranged quasi-regularly on the XY plane of the base material 10. Specifically, the plurality of microlenses 21 are basically arranged along the various reference lattices described above, but may also be arranged randomly to some extent by randomly varying the lattice spacing within a minute range. Good (semi-regular arrangement).
 1 拡散板
 3 単位セル
 10 基材
 20 マイクロレンズアレイ
 21 マイクロレンズ
 23 段差
 24 境界線
 25 光軸
 26 レンズ面
 27 開口部
 28、29 頂点
 30 中心点
 60 基準開口
 D 開口幅
 Dk 基準開口幅
 D’ 有効開口幅
 R 曲率半径
 Rk 基準曲率半径
 δD 変動率
 δR 変動率
 Δs シフト量
 δS 変動幅
 h レンズ高さ
 h’ レンズ表面形状の変動後のレンズ高さ
 Δh レンズ高さの変動量
 δZ 最大高低差
 n マイクロレンズアレイを形成している材質の屈折率
1 Diffusion plate 3 Unit cell 10 Base material 20 Microlens array 21 Microlens 23 Step 24 Boundary line 25 Optical axis 26 Lens surface 27 Aperture 28, 29 Vertex 30 Center point 60 Reference aperture D Aperture width Dk Reference aperture width D' Effective Aperture width R Radius of curvature Rk Standard radius of curvature δD Variation rate δR Variation rate Δs Shift amount δS Variation width h Lens height h' Lens height after lens surface shape variation Δh Lens height variation δZ Maximum height difference n Micro Refractive index of the material forming the lens array

Claims (20)

  1.  基材と、
     前記基材の少なくとも一方の表面におけるXY平面上に配置された複数のマイクロレンズから構成されるマイクロレンズアレイと、
    を備え、
     前記各マイクロレンズの表面形状は、予め設定された基準表面形状を有し、
     前記複数のマイクロレンズは、前記XY平面上に規則的に配列されており、
     前記各マイクロレンズは、前記XY平面に対して垂直なZ方向の基準位置から、前記Z方向にランダムにシフトした位置に配置されており、
     相互に隣接する前記複数のマイクロレンズ間の境界には、前記Z方向の段差が存在する、拡散板。
    base material and
    a microlens array composed of a plurality of microlenses arranged on an XY plane on at least one surface of the base material;
    Equipped with
    The surface shape of each microlens has a preset reference surface shape,
    The plurality of microlenses are regularly arranged on the XY plane,
    Each of the microlenses is arranged at a position randomly shifted in the Z direction from a reference position in the Z direction perpendicular to the XY plane,
    A diffuser plate, wherein a step in the Z direction exists at a boundary between the plurality of mutually adjacent microlenses.
  2.  前記段差は、前記XY平面に対して垂直な平坦面からなる、請求項1に記載の拡散板。 The diffuser plate according to claim 1, wherein the step is a flat surface perpendicular to the XY plane.
  3.  前記各マイクロレンズの前記Z方向のシフト量Δsは、所定の変動幅δSの範囲内でランダムに変動している、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the shift amount Δs of each microlens in the Z direction varies randomly within a predetermined variation width δS.
  4.  λが入射光の波長[μm]であり、nが前記マイクロレンズアレイを形成している材質の屈折率であるとき、
     前記シフト量Δsの前記変動幅δSは、下記式(5)を満たす、請求項3に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000001
    When λ is the wavelength of the incident light [μm] and n is the refractive index of the material forming the microlens array,
    The diffuser plate according to claim 3, wherein the variation width δS of the shift amount Δs satisfies the following formula (5).
    Figure JPOXMLDOC01-appb-M000001
  5.  前記シフト量Δsの前記変動幅δSは、下記式(6)を満たす、請求項4に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000002
    The diffusion plate according to claim 4, wherein the variation width δS of the shift amount Δs satisfies the following formula (6).
    Figure JPOXMLDOC01-appb-M000002
  6.  前記シフト量Δsの前記変動幅δSは、下記式(7)を実質的に満たす、請求項4に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000003
    The diffuser plate according to claim 4, wherein the variation range δS of the shift amount Δs substantially satisfies the following formula (7).
    Figure JPOXMLDOC01-appb-M000003
  7.  mが1以上の整数であり、λが入射光の波長[μm]であり、nが前記マイクロレンズアレイを形成している材質の屈折率であるとき、
     前記シフト量Δsの前記変動幅δS[μm]は、下記式(8)を満たす、請求項3に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000004
    When m is an integer of 1 or more, λ is the wavelength of the incident light [μm], and n is the refractive index of the material forming the microlens array,
    The diffusion plate according to claim 3, wherein the variation width δS [μm] of the shift amount Δs satisfies the following formula (8).
    Figure JPOXMLDOC01-appb-M000004
  8.  前記シフト量Δsの前記変動幅δS[μm]は、下記式(1)を満たす、請求項7に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000005
    The diffuser plate according to claim 7, wherein the variation range δS [μm] of the shift amount Δs satisfies the following formula (1).
    Figure JPOXMLDOC01-appb-M000005
  9.  前記シフト量Δsの前記変動幅δS[μm]は、下記式(2)を実質的に満たす、請求項7に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000006
    The diffuser plate according to claim 7, wherein the variation range δS [μm] of the shift amount Δs substantially satisfies the following formula (2).
    Figure JPOXMLDOC01-appb-M000006
  10.  下記式(3)を満たす、請求項1または2に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000007

     Eva(D’,λ,δZ):前記式(3)で定められる評価値
     λ:入射光の波長[μm]
     n:前記マイクロレンズアレイを形成している材質の屈折率
     δZ:前記各マイクロレンズの頂点の高さhの最大値hmaxと最小値hminとの差[μm]
     Dk:前記基準表面形状の基準開口幅[μm]。前記基準開口幅Dkは、前記基準表面形状の円形の基準開口の直径である。
     D’:前記基準表面形状の有効開口幅[μm]。前記有効開口幅D’は、前記基準開口幅Dkを直径とする円に内接する正六角形に内接する内接円の直径である。
    The diffuser plate according to claim 1 or 2, which satisfies the following formula (3).
    Figure JPOXMLDOC01-appb-M000007

    Eva (D', λ, δZ) : Evaluation value determined by the above formula (3) λ: Wavelength of incident light [μm]
    n: refractive index of the material forming the microlens array δZ: difference between the maximum value h max and the minimum value h min of the height h of the apex of each of the microlenses [μm]
    Dk: Reference opening width [μm] of the reference surface shape. The reference opening width Dk is the diameter of the circular reference opening of the reference surface shape.
    D': Effective opening width [μm] of the reference surface shape. The effective opening width D' is the diameter of an inscribed circle inscribed in a regular hexagon that is inscribed in a circle whose diameter is the reference opening width Dk.
  11.  下記式(4)を満たす、請求項10に記載の拡散板。
    Figure JPOXMLDOC01-appb-M000008
    The diffuser plate according to claim 10, which satisfies the following formula (4).
    Figure JPOXMLDOC01-appb-M000008
  12.  前記XY平面上において、前記複数のマイクロレンズは相互に隙間なく配置されており、相互に隣接する前記複数のマイクロレンズ間の境界に平坦部が存在しない、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the plurality of microlenses are arranged without any gaps between them on the XY plane, and there is no flat portion at a boundary between the plurality of mutually adjacent microlenses. .
  13.  前記複数のマイクロレンズの表面形状は、相互に同一である、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the plurality of microlenses have the same surface shape.
  14.  前記各マイクロレンズの表面形状は、対称軸を有する非球面形状又は球面形状である、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the surface shape of each of the microlenses is an aspherical shape or a spherical shape having an axis of symmetry.
  15.  前記マイクロレンズは、シリンドリカルレンズである、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the microlens is a cylindrical lens.
  16.  前記複数のマイクロレンズのうち少なくとも一部の光軸は、前記Z方向に対して、0°超、60°以下の傾斜角αで傾斜している、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the optical axes of at least some of the plurality of microlenses are inclined with respect to the Z direction at an inclination angle α of more than 0° and less than 60°.
  17.  前記複数のマイクロレンズの前記光軸の前記傾斜角αは、相互に異なり、
     前記傾斜角αは、所定の基準傾斜角αkを基準として、所定の変動範囲でランダムに変動している、請求項16に記載の拡散板。
    The inclination angles α of the optical axes of the plurality of microlenses are different from each other,
    17. The diffuser plate according to claim 16, wherein the inclination angle α varies randomly within a predetermined variation range with respect to a predetermined reference inclination angle αk.
  18.  前記基準表面形状の基準開口は、円形、楕円形、または、正方形、矩形、ひし形もしくは六角形を含む多角形状である、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the reference opening of the reference surface shape is circular, oval, or polygonal including square, rectangle, diamond, or hexagon.
  19.  前記マイクロレンズアレイを形成している材質は、ガラス、樹脂、または、半導体である、請求項1または2に記載の拡散板。 The diffuser plate according to claim 1 or 2, wherein the material forming the microlens array is glass, resin, or semiconductor.
  20.  請求項1または2に記載の拡散板を備える、装置。 An apparatus comprising the diffuser plate according to claim 1 or 2.
PCT/JP2023/012796 2022-03-30 2023-03-29 Diffusion plate and device WO2023190682A1 (en)

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JP2004505306A (en) * 2000-07-31 2004-02-19 ロチェスター フォトニクス コーポレイション Structured screen for controlled light dispersion
JP2015034877A (en) * 2013-08-08 2015-02-19 株式会社デンソー Head-up display device
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