WO2023190253A1 - Printed circuit board and manufacturing method therefor, and power module - Google Patents

Printed circuit board and manufacturing method therefor, and power module Download PDF

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Publication number
WO2023190253A1
WO2023190253A1 PCT/JP2023/012009 JP2023012009W WO2023190253A1 WO 2023190253 A1 WO2023190253 A1 WO 2023190253A1 JP 2023012009 W JP2023012009 W JP 2023012009W WO 2023190253 A1 WO2023190253 A1 WO 2023190253A1
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WO
WIPO (PCT)
Prior art keywords
circuit board
main surface
metal
plate
ceramic plate
Prior art date
Application number
PCT/JP2023/012009
Other languages
French (fr)
Japanese (ja)
Inventor
知広 ▲濱▼岡
聖治 小橋
厚樹 五十嵐
晃正 湯浅
貴裕 中村
善幸 江嶋
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デンカ株式会社
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Publication date
Application filed by デンカ株式会社 filed Critical デンカ株式会社
Priority to JP2023550662A priority Critical patent/JPWO2023190253A1/ja
Publication of WO2023190253A1 publication Critical patent/WO2023190253A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/13Mountings, e.g. non-detachable insulating substrates characterised by the shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate

Definitions

  • the present disclosure relates to a circuit board, a method for manufacturing the same, and a power module.
  • a circuit board included in such a power module includes a ceramic substrate and a copper plate, which are joined via a brazing material containing an active metal.
  • a phenomenon occurs in which the brazing material seeps onto the surface of the copper plate and creeps up along the side surface of the copper plate. If such a phenomenon occurs, it is feared that it will not only impair the appearance, but also lead to deterioration in the wettability of the solder material used, for example, when bonding semiconductor elements.
  • Patent Document 1 proposes providing a rough portion with a large surface roughness on the side surface of a metal plate in order to suppress creeping up of the brazing material.
  • Patent Document 2 proposes a technique in which a rib is provided in a circuit layer so as to surround a mounting surface on which a semiconductor element is to be mounted, in order to suppress the occurrence of stains due to the creeping phenomenon.
  • Patent Document 3 proposes laminating and brazing the metal plates so that the surface on the side where burrs are formed overlaps one surface of the ceramic plate. Using such techniques, attempts have been made to solve the problem of stains caused by creeping up of the brazing filler metal.
  • An etching method is known as a method for manufacturing multi-chip circuit boards.
  • the etching method requires resist printing and etching steps to process the metal plate into a predetermined size.
  • a mounting method is used in which metal plates that have been pre-processed to a predetermined size are joined together, such a process is not necessary, and production efficiency can be improved.
  • the amount of brazing filler metal applied is large, there is a concern that the brazing filler metal may creep up.
  • the present disclosure provides a circuit board and a method for manufacturing the same that can sufficiently suppress creeping up of the brazing material. Furthermore, the present disclosure provides a power module with excellent reliability by including such a circuit board.
  • a circuit board is a circuit board that includes a ceramic plate, a metal plate, and a brazing material layer that joins the ceramic plate and the metal plate, the metal plate being joined to the ceramic plate.
  • a recess is formed in the main surface, and the recess is provided inside the outer edge of the main surface.
  • a recess is formed inside the outer edge of the main surface of the metal plate.
  • the recesses are filled with a brazing material during bonding. Therefore, it is possible to sufficiently suppress the brazing filler metal from creeping up onto the side surface of the metal plate and the main surface on the side opposite to the ceramic plate side.
  • a circuit board in which creeping up of the brazing material is suppressed in this manner has excellent appearance and connection reliability with external circuits such as semiconductor elements.
  • the recess may be closer to the outer edge of the main surface of the metal plate than to the center. Thereby, it is possible to further suppress the brazing material from creeping up onto the side surface of the metal plate and the main surface on the opposite side to the ceramic plate side.
  • the recess may be provided along the outer edge of the main surface of the metal plate so as to revolve around the center of the main surface of the metal plate. Thereby, creeping up of the brazing material can be sufficiently suppressed on the entire side surface of the metal plate.
  • the recessed portion may have an expanded portion whose width increases as it approaches the ceramic plate from the inside of the metal plate. Having such an expanded portion makes it easier to fill the recess with the brazing material. This makes it possible to sufficiently increase the bonding reliability.
  • the entire recess may be filled with a component constituting the brazing material layer. Thereby, bonding reliability can be further improved.
  • the width X of the recessed portion of the metal plate may be 0.1 to 1 mm.
  • the depth Z of the recessed portion of the metal plate may be 0.05 to 0.6 mm.
  • the circuit board includes a ceramic plate, a plurality of metal plates, and a plurality of brazing metal layers bonding the main surface of the ceramic plate and each of the main surfaces of the plurality of metal plates, and the plurality of metal plates , the metal plate may include the metal plate in which a recess is formed.
  • the recess is formed on the main surface of at least one metal plate. Therefore, it is possible to sufficiently prevent the brazing material from creeping up the side surface of the metal plate and reaching the main surface of the metal plate on the side opposite to the ceramic plate side.
  • each of the plurality of metal plates may be provided independently for each partition area defined by a partition line on the main surface of the ceramic plate.
  • Such a circuit board may be a multi-chip circuit board. By dividing such a multi-chip circuit board, a plurality of individualized boards (divided boards) can be manufactured at once. Such a circuit board has excellent production efficiency.
  • a method for manufacturing a circuit board includes a preparation step of preparing one or more metal plates in which a recess is formed in the main surface and the recess is provided inside the outer edge of the main surface. a coating and drying step of applying and drying a brazing filler metal to the main surface of the ceramic plate to form one or more coated layers; and a coating and drying step of forming one or more coated layers between the ceramic plate and one or more metal plates. a lamination process in which a laminate is produced by laminating the laminate, and a bonding process in which the laminate is heated to obtain a joined body in which a ceramic plate and one or more metal plates are joined by one or more brazing metal layers. In the lamination step, the ceramic plate and the one or more metal plates are laminated so that the main surface of the one or more metal plates and the main surface of the ceramic plate face each other.
  • the ceramic plate and the one or more metal plates are stacked together so that the main surface of the one or more metal plates on which the recess is formed faces the ceramic plate. are laminated.
  • the circuit board obtained by performing the bonding process using the laminate obtained in this way can sufficiently suppress the brazing material from creeping up the side surface of the metal plate and the main surface on the opposite side to the ceramic plate side. .
  • a circuit board obtained by such a manufacturing method has excellent appearance and connection reliability of semiconductor elements.
  • a plurality of metal plates in which recesses are formed are prepared, and in the lamination step, each of the plurality of metal plates is divided into separate areas defined by partition lines on the main surface of the ceramic plate.
  • a plurality of metal plates may be laminated to produce a laminate, and after the bonding step, a dividing step may be included in which the ceramic plates in the bonded body are divided along division lines.
  • the bonded body obtained by such a bonding process can also be called a multi-chip circuit board.
  • a multi-chip circuit board by dividing such a multi-chip circuit board, a plurality of individualized boards (divided boards) can be manufactured all at once.
  • Such a manufacturing method can manufacture circuit boards (singulated boards) with high production efficiency.
  • a power module includes any of the circuit boards described above and a semiconductor element electrically connected to the metal plate of the circuit board. Such a power module has excellent reliability because it includes any of the above-mentioned circuit boards.
  • circuit board and a method for manufacturing the same that can sufficiently suppress creeping up of the brazing material. Furthermore, by including such a circuit board, a highly reliable power module can be provided.
  • FIG. 1 is a perspective view of a circuit board.
  • FIG. 2 is a plan view of the circuit board.
  • FIG. 3 is a cross-sectional view taken along the line III--III of the circuit board of FIG.
  • FIG. 4 is an enlarged cross-sectional view of a part of the cross-section of FIG. 3.
  • FIG. 5 is a cross-sectional view of the power module.
  • FIG. 6 is a scanning electron microscope (SEM) photograph showing a cross section along the thickness direction of the circuit board of Example 1.
  • the numerical range indicated by "x to y” means greater than or equal to x and less than or equal to y.
  • Numerical ranges in which the upper limit or lower limit of each numerical range in each embodiment is replaced with the numerical value of any example are also included in the present disclosure.
  • a circuit board includes a ceramic plate, a metal plate, and a brazing material layer that joins the main surface of the ceramic plate and the main surface of the metal plate.
  • the number of metal plates joined to one main surface of one ceramic plate may be one or multiple.
  • the material of the ceramic plate is not particularly limited, and may be made of, for example, a nitride sintered body, a carbide sintered body, or an oxide sintered body. Specific examples include silicon nitride sintered bodies, aluminum nitride sintered bodies, aluminum oxide sintered bodies, and silicon carbide sintered bodies. There is no particular restriction as long as it is in the shape of a ceramic plate.
  • the thickness of the ceramic plate may be, for example, 0.2 to 2 mm, or 0.32 to 1.1 mm.
  • the metal plate may include Cu or an alloy of Cu and another metal, and may be a copper plate, for example.
  • the metal plate has a recess formed in its main surface opposite to the main surface of the ceramic plate.
  • the recess is provided inside the outer edge of the main surface of the metal plate. Therefore, the recess does not appear on the external appearance of the circuit board.
  • the thickness of the metal plate (distance between main surfaces) may be, for example, 0.1 to 1.2 mm, or 0.2 to 1 mm.
  • the metal plate may have a plating film on its surface.
  • the recess When viewed in a cross section along the thickness direction of the circuit board, the recess may have a V-shape such that the width thereof increases toward the ceramic plate. Since such a recess is easily filled with components constituting the brazing material layer, the reliability of joining between the metal plate and the ceramic plate can be sufficiently increased.
  • the brazing material layer may contain Ag, and may also contain Ag and Cu. Furthermore, it may contain one or more metals selected from the group consisting of Sn and active metals. Two or more metals may be an alloy.
  • the active metal may include one or more selected from the group consisting of Ti, Hf, Zr, and Nb.
  • Ag and Cu contained in the brazing material layer may be contained in the brazing material layer as an alloy such as an Ag--Cu eutectic alloy. Components constituting the brazing material layer include those described above.
  • the content of Ag in the brazing material layer may be 45 to 95% by mass, or 50 to 95% by mass.
  • the total content of Ag and Cu in the brazing material layer may be 65 to 100% by weight, 70 to 99% by weight, or 90 to 98% by weight. Thereby, the denseness of the brazing material layer can be improved while sufficiently reducing the voids in the recesses.
  • the content of the active metal in the brazing material layer may be 0.5 to 8 parts by mass based on 100 parts by mass of Ag and Cu in total.
  • the content of the active metal may be 0.5 to 8 parts by mass based on 100 parts by mass of Ag and Cu in total.
  • the metal contained in the brazing material layer may be contained as a nitride, oxide, carbide, or hydride.
  • the braze layer may include titanium nitride and/or titanium hydride ( TiH2 ). This makes it possible to sufficiently increase the bonding strength between the ceramic plate and the metal plate.
  • TiH 2 titanium nitride and/or titanium hydride
  • the content of TiH 2 may be, for example, 1 to 8 parts by weight based on 100 parts by weight of Ag and Cu in total.
  • FIG. 1 is a perspective view showing an example of a circuit board according to the present embodiment.
  • 2 is a plan view of the circuit board of FIG. 1
  • FIG. 3 is a sectional view taken along the line III--III of FIG.
  • the circuit board 100 includes a ceramic plate 10 and a plurality of metal plates 20 on the main surface 10A and the main surface 10B of the ceramic board 10.
  • the ceramic plate 10 has a flat plate shape.
  • the ceramic plate 10 is divided into a plurality of sections by dividing lines on the main surface 10A.
  • the principal surface 10A includes a plurality of partition lines L1 extending along a first direction and lined up at equal intervals, and a plurality of partition lines L1 extending along a second direction orthogonal to the first direction, as partition lines.
  • a plurality of partition lines L2 arranged at equal intervals are provided.
  • the partition line L1 and the partition line L2 are orthogonal to each other.
  • the partition lines L1 and L2 may be composed of a plurality of recesses arranged in a straight line, or may be composed of linear grooves. Specifically, it may be a scribe line formed with laser light.
  • the laser source include a carbon dioxide laser and a YAG laser.
  • a scribe line can be formed by intermittently irradiating laser light from such a laser source.
  • the partition lines L1 and L2 do not have to be arranged at equal intervals, and are not limited to being perpendicular to each other. Further, the partition lines L1 and L2 may not be straight, but may be curved or bent.
  • the ceramic plate 10 has a plurality of partition areas 50 defined by partition lines L1 and L2.
  • a metal plate 20 is provided in each of the plurality of divided areas 50.
  • the plurality of metal plates 20 are independent from each other.
  • the circuit board 100 is also called a collective board, and can be divided along partition lines L1 and L2. By dividing, a plurality of circuit boards (singulated boards) can be obtained. The individualized board obtained by dividing in this way is also an example of the circuit board of this embodiment.
  • One main surface 20A of the metal plate 20 is exposed to the outside.
  • the other main surface 20B of the metal plate 20 and the main surface 10A (main surface 10B) of the ceramic plate 10 are joined by a brazing material layer 30.
  • a recess 22 is formed inside the outer edge 20b of the main surface 20B (joint surface with the brazing material layer 30) of the metal plate 20.
  • Such a recess 22 may be formed by cutting a part of the main surface 20B of the metal plate 20.
  • the recess 22 is provided along the outer edge 20b of the main surface 20B of the metal plate 20 so as to go around the center of the main surface 20B.
  • the recess 22 may be provided only in the vicinity of the portion where the semiconductor element is soldered when the semiconductor element is mounted on the metal plate 20. Further, the recesses 22 may be provided only in some of the plurality of metal plates 20. For example, it is not necessary to provide the recess 22 in the metal plate 20 that serves as a heat sink of the power module.
  • the entire recess 22 is filled with a portion of the brazing material layer 30. That is, the entire concave portion 22 is filled with the component constituting the brazing material layer 30. As a result, the metal plate 20 and the ceramic plate 10 are firmly joined by the brazing material layer 30. Therefore, the reliability of bonding between the metal plate 20 and the ceramic plate 10 can be sufficiently improved. Note that it is not essential that the entire recess 22 be filled with the component constituting the brazing material layer 30. In a modified example, only a portion of the recess 22 may be filled with the component constituting the brazing material layer 30.
  • FIG. 4 shows a partially enlarged cross-section of the circuit board 100 shown in FIG. 3.
  • 3 and 4 both show a cross section perpendicular to the longitudinal direction of the recess 22 and along the thickness direction of the metal plate 20.
  • the width X of the recess 22 may be 0.1 to 1 mm.
  • the lower limit of the width X may be 0.2 mm or 0.3 mm.
  • the upper limit of the width X may be 0.9 mm or 0.8 mm.
  • the width X of the recess 22 is the distance between the outer edge 22b and the inner edge 22c of the recess 22.
  • the depth Z of the recess 22 may be 0.05 to 0.6 mm.
  • the lower limit of the depth Z may be 0.15 mm or 0.2 mm.
  • the upper limit of the depth Z may be 0.4 mm or 0.3 mm. This makes it easier to fill the entire recess 22 with the components constituting the brazing material layer 30. Thereby, the reliability of bonding between the metal plate 20 and the ceramic plate 10 can be made sufficiently high.
  • the ratio of the depth Z to the thickness of the metal plate 20 may be from 0.05 to 0.5, or from 0.15 to 0.4. Thereby, the creeping up of the brazing filler metal can be sufficiently suppressed while maintaining the conductivity of the metal plate 20 sufficiently.
  • the length Y between the outer edge 22b of the recess 22 and the side surface 20C may be 0.1 to 5 mm.
  • the lower limit of the length Y may be 0.15 mm or 0.2 mm.
  • the upper limit of the length Y may be 4 mm, 3 mm, or 1 mm.
  • the recess 22 has an expanded portion 22A whose width increases as it approaches the ceramic plate 10 from inside the metal plate 20.
  • the "width" here is the length of the recess 22 measured parallel to the main surface 20B in a cross section as shown in FIG.
  • the concave portion 22 having such an expanded portion 22A is easily filled with the component constituting the brazing material layer 30. Thereby, the reliability of bonding between the metal plate 20 and the ceramic plate 10 can be made sufficiently high.
  • the entire recess 22 is made up of the extended portion 22A, but the shape is not limited to this. Only a part of the recess 22 may be formed by the extended portion 22A. For example, only a portion of the recessed portion closer to the ceramic plate 10 may be configured as an expanded portion. In this case, the recess may be trapezoidal.
  • the ratio of the width X to the length of the main surface 20A of the metal plate 20 measured along the same direction as the width X is 0. It may be from .001 to 0.3, from 0.001 to 0.2, from 0.002 to 0.2.
  • the length of the main surface 20A may be, for example, 5 to 100 mm, or 15 to 50 mm.
  • the projected area of the recess 22 may be 0.0025 to 0.3 mm2 , and may be 0.01 to 0.3mm2. It may be.
  • the projected area of the recess 22 is calculated by the formula: width X x depth Z/2.
  • the recess 22 is rectangular, it can be calculated by width X x depth Z.
  • the metal plate 20 may function as a circuit board that has the function of transmitting electrical signals or a heat sink that has the function of transmitting heat. Further, the metal plate 20 may have both a function of transmitting heat and a function of transmitting an electric signal.
  • the circuit board 100 and the individualized boards (circuit boards) obtained by dividing the same include brazing filler metal on the side surface 20C of the metal plate 20 and the main surface 20A of the metal plate 20 on the side opposite to the ceramic plate 10 side. The rise is sufficiently suppressed. Thereby, the step of removing the brazing material from the side surface 20C and the main surface 20A can be omitted.
  • the circuit board 100 has excellent bonding reliability between the metal plate 20 and the ceramic plate 10. Therefore, it has excellent appearance and connection reliability with external circuits such as semiconductor elements. Therefore, it is suitable as a component mounted on a power module that requires high reliability.
  • a power module includes a circuit board and a semiconductor element electrically connected to a metal plate of the circuit board.
  • the circuit board may be the above-described circuit board 100 or a modification thereof, or may be another circuit board. The description regarding the circuit board 100 and its modifications is applied to the power module of this embodiment. Such a power module has excellent reliability.
  • the circuit board and the semiconductor element may be sealed with resin.
  • FIG. 5 is a sectional view showing an example of the power module according to the present embodiment.
  • the power module 300 includes a base plate 70 and a circuit board 101 joined to one side of the base plate 70 via solder 62.
  • the metal plate 21 on one side of the circuit board 101 is joined to the base plate 70 via solder 62.
  • a semiconductor element 60 is attached to at least one of the metal plates 20 on the other side of the circuit board 101 via solder 61.
  • the semiconductor element 60 is connected to a predetermined location on the metal plate 20 with a metal wire 64 such as an aluminum wire. In this way, the semiconductor element 60 and the metal plate 20 are electrically connected.
  • the metal plate 20a which is one of the metal plates 20, is connected to an electrode 63 provided through the casing 66 via a solder 65. ing.
  • a housing 66 is disposed on one main surface of the base plate 70 and is integrated with the main surface to accommodate the circuit board 101.
  • a housing space formed by one main surface of the base plate 70 and the housing 66 is filled with resin 80 so as to cover the circuit board 101 and the semiconductor element 60 .
  • the resin 80 seals the circuit board 101 and the semiconductor element 60.
  • the resin may be, for example, a thermosetting resin or a photocuring resin.
  • Cooling fins 72 forming a heat radiating section are joined to the other main surface of the base plate 70 via grease 74. Screws 73 are attached to the ends of the base plate 70 to fix the cooling fins 72 to the base plate 70.
  • the base plate 70 and the cooling fins 72 may be made of aluminum.
  • the base plate 70 and the cooling fins 72 have high thermal conductivity and function well as a heat dissipation section.
  • the metal plate 20 and the metal plate 21 are electrically insulated by the ceramic plate 10.
  • the metal plate 20 (20a) may form an electric circuit.
  • the metal plate 20 and the metal plate 21 are respectively joined to the main surface 10A and the main surface 10B of the ceramic plate 10 by a brazing material layer (not shown).
  • a recessed portion as shown in FIGS. 3 and 4 is formed on the main surface of the metal plate 20 to be joined to the ceramic plate 10.
  • This recess has the same size as the recess 22, and the entire recess may be filled with a component constituting the brazing material layer.
  • the reliability of the bond between the metal plate 20 and the ceramic plate 10 can be made sufficiently high. Therefore, the power module 300 has excellent electrical connection reliability between the semiconductor element 60 and the metal plate 20.
  • a recess 22 may be formed on the main surface of the metal plate 21 to be joined to the ceramic plate 10.
  • a method for manufacturing a circuit board includes a preparation step of preparing one or more metal plates each having a recess formed in its main surface and the recess provided inside the outer edge of the main surface; A coating and drying step in which a brazing material is applied and dried on the main surface of a ceramic plate to form one or more coating layers, and a ceramic plate and one or more metal plates are sandwiched between the one or more coating layers.
  • the metal plate may be a copper plate, for example.
  • the recessed portion can be formed, for example, by machining using a machining center.
  • the shape, position (for example, length Y), size (for example, width X and depth Z), and projected area of the recess may be as described above.
  • the size of the recess can be adjusted by changing the amount of cutting.
  • the recess may be formed along a part of the outer edge of the main surface of the metal plate, or may be formed so as to go around the center of the main surface of the metal plate.
  • the ceramic plate used in the coating and drying process can be produced, for example, by the following procedure.
  • a green sheet is produced by molding a slurry containing an inorganic compound powder, a binder resin, a sintering aid, a plasticizer, a dispersant, a solvent, and the like.
  • inorganic compounds include aluminum nitride (AlN), silicon nitride (Si 3 N 4 ), silicon carbide, and aluminum oxide.
  • Sintering aids include rare earth metals, alkaline earth metals, metal oxides, fluorides, chlorides, nitrates, sulfates, and the like. These may be used alone or in combination of two or more.
  • binder resins include methyl cellulose, ethyl cellulose, polyvinyl alcohol, polyvinyl butyral, and (meth)acrylic resins.
  • plasticizers include purified glycerin, glycerin triolate, diethylene glycol, phthalic acid plasticizers such as di-n-butyl phthalate, and dibasic acid plasticizers such as di-2-ethylhexyl sebacate.
  • dispersants include poly(meth)acrylates and (meth)acrylic acid-maleate copolymers.
  • solvents include organic solvents such as ethanol and toluene.
  • Examples of methods for forming green sheets from slurry include a doctor blade method and an extrusion method.
  • the green sheet obtained by molding is degreased and fired.
  • Degreasing may be performed, for example, by heating at 400 to 800°C for 0.5 to 20 hours. Thereby, the amount of residual organic matter (carbon) can be reduced while suppressing oxidation and deterioration of inorganic compounds.
  • Sintering is performed, for example, by heating to 1700 to 1900° C. in a non-oxidizing gas atmosphere such as nitrogen, argon, ammonia, or hydrogen.
  • a ceramic plate 10 can be obtained. If necessary, the ceramic plate may be laser-processed to cut the edges or provide scribe lines.
  • the above-mentioned degreasing and sintering may be performed, for example, with a plurality of green sheets laminated.
  • a release layer made of a release agent may be provided between the green sheets in order to facilitate separation of the base materials after firing.
  • the mold release agent for example, boron nitride (BN) can be used.
  • the release layer may be formed, for example, by applying a slurry of boron nitride powder by spraying, brushing, roll coating, screen printing, or the like.
  • the number of green sheets to be laminated may be, for example, 8 to 100, or 30 to 70, from the viewpoint of efficient mass production of ceramic plates and sufficient degreasing.
  • a partition line may be formed on the one main surface.
  • a scribe line may be provided as a partition line by irradiating the main surface of the ceramic plate with a laser beam.
  • the laser beam irradiated onto the main surface of the ceramic include a carbon dioxide laser and a YAG laser.
  • scribe lines that become the division lines L1 and L2 as shown in FIGS. 1 and 2 are formed.
  • Such partition lines L1 and L2 can be used as cutting lines when dividing the circuit board in a subsequent process.
  • the brazing material applied to the main surface of the ceramic plate contains, for example, silver, copper, tin, active metals, metal compounds containing these as constituent elements, organic solvents, binders, and the like.
  • the viscosity of the brazing filler metal may be, for example, 5 to 20 Pa ⁇ s.
  • the organic solvent content in the brazing filler metal may be, for example, 5 to 25% by mass, and the binder content may be, for example, 2 to 15% by mass.
  • the brazing filler metal may contain Ag in the form of a single metal or a metal compound (alloy), and in addition to Ag, it may contain one or more metals selected from the group consisting of Cu, Sn, and active metals. It's fine. Two or more metals may be an alloy.
  • the active metal may include one or more selected from the group consisting of Ti, Hf, Zr, and Nb.
  • the content of Ag in the brazing filler metal may be 93 parts by mass or more, 95 parts by mass or more, 97 parts by mass or more, and 100 parts by mass based on a total of 100 parts by mass of Ag and Cu. It may be.
  • the molten brazing filler metal smoothly reacts with Cu contained in the metal plate to form a eutectic alloy. Therefore, the brazing material layer is smoothly formed even within the recessed portion of the metal plate.
  • the brazing filler metal does not need to contain Cu.
  • the content of active metal in the brazing material may be 0.5 to 8 parts by mass based on 100 parts by mass of Ag and Cu in total.
  • the content of the active metal may be 0.5 to 8 parts by mass based on 100 parts by mass of Ag and Cu in total.
  • the metal contained in the brazing filler metal may be contained as a nitride, oxide, carbide, or hydride.
  • the brazing material may include titanium nitride and/or titanium hydride ( TiH2 ). This makes it possible to sufficiently increase the bonding strength between the ceramic plate and the metal plate.
  • TiH 2 titanium nitride and/or titanium hydride
  • the content of TiH 2 may be, for example, 1 to 8 parts by weight based on 100 parts by weight of Ag and Cu in total.
  • the content of tin in the brazing filler metal may be 0.5 to 5 parts by mass based on 100 parts by mass of Ag and Cu in total.
  • the tin content may be 0.5 to 5 parts by mass based on 100 parts by mass of Ag and Cu in total.
  • One or more coating layers are provided on the main surface of the ceramic plate by applying and drying a brazing material by a method such as a roll coater method, screen printing method, or transfer method.
  • the coating layer may be provided at a position where the metal plates are to be joined. Therefore, the number of coated layers may be the same as the number of metal plates bonded to the ceramic plate.
  • a ceramic plate and a metal plate are laminated with the coating layer sandwiched between them to produce a laminate.
  • the main surface on which the recess is formed and the main surface of the ceramic plate are stacked so that they face each other.
  • the metal plate may be pressed in the direction toward the ceramic plate. With the pressing, the coating layer spreads and the recesses are filled with the brazing material, resulting in a laminate in which the ceramic plate and the metal plate are well bonded by the coating layer.
  • each of the plurality of metal plates 20 is arranged independently for each partition area 50 defined by partition lines L1 and L2 on the main surface 10A of the ceramic plate 10.
  • a plurality of metal plates 20 are laminated to produce a laminate.
  • the obtained laminate is heated in a heating furnace to obtain a joined body in which the ceramic plate and the metal plate are joined with a brazing material layer.
  • the heating temperature may be, for example, 700 to 900°C.
  • the atmosphere in the furnace may be an inert gas such as nitrogen, and the reaction may be performed under reduced pressure below atmospheric pressure or under vacuum.
  • the heating furnace may be of a continuous type that continuously manufactures a plurality of joined bodies, or may be one that manufactures one or more joined bodies in a batch manner. Heating may be performed while pressing the joined body in the stacking direction of the laminate.
  • the brazing material contained in the coating layer flows and reacts with the metal plate, forming a brazing material layer.
  • the brazing material layer may include a reaction product between the brazing material and a metal component contained in the metal plate.
  • the brazing material filled in the recess may also react and become part of the brazing material layer.
  • surface treatment such as forming a plating film on the metal plate is performed.
  • cutting or the like may be performed to adjust the shape of the brazing material layer. In this way, a circuit board can be manufactured.
  • a dividing step may be performed in which the aggregate substrate is divided into individual pieces. .
  • the collective board can be divided along the division lines L1 and L2 to obtain a plurality of circuit boards.
  • a joined body can be obtained by joining a plurality of metal plates that have been previously processed to a predetermined size.
  • this manufacturing method mounting method
  • the circuit board obtained by such a manufacturing method can reduce manufacturing costs and has excellent appearance and connection reliability with external circuits such as semiconductor elements.
  • the step of removing the brazing filler metal that has climbed up can be omitted, production efficiency is also excellent.
  • the manufacturing method of the circuit boards 100, 101 and their modifications described above is not limited to the manufacturing method described above.
  • a power module may be manufactured using the circuit board obtained in this way.
  • a power module can be manufactured by mounting a semiconductor element on a circuit board using solder and wire bonding, etc., housing the circuit board and semiconductor element in a housing space of a housing, and then sealing it with resin. .
  • a plurality of metal plates are provided on each of the pair of main surfaces of the ceramic plate, but the present invention is not limited thereto.
  • one or more metal plates may be provided on only one main surface of the ceramic plate.
  • the structure and shape of the brazing material layer and the metal plate (recess) provided on each of the pair of main surfaces of the ceramic plate may be different from each other.
  • one metal plate may be provided on each of the pair of main surfaces of the ceramic plate.
  • a circuit board comprising a ceramic plate, a metal plate, and a brazing material layer that joins the ceramic plate and the metal plate, A recess is formed on the main surface of the metal plate to be joined to the ceramic plate, The circuit board, wherein the recess is provided inside an outer edge of the main surface.
  • the recess according to [1] or [2], wherein the recess is provided along the outer edge of the main surface of the metal plate so as to go around the center of the main surface of the metal plate. circuit board.
  • a plurality of metal plates in which the recesses are formed are prepared,
  • the laminated body is produced by laminating the plurality of metal plates such that each of the plurality of metal plates is independent for each partition area defined by a partition line on the main surface of the ceramic plate.
  • a power module comprising: a semiconductor element electrically connected to the semiconductor element;
  • the recesses When viewed in cross section in the thickness direction of the copper plate, the recesses were processed to have a V-shape as shown in FIGS. 3 and 4. As a result, a copper plate having a shape similar to that of the metal plate 20 shown in FIGS. 1 to 4 was obtained.
  • a brazing filler metal containing Ag, Sn, and TiH 2 was prepared.
  • This brazing filler metal contained 100 parts by mass of Ag based on a total of 100 parts by mass of Ag and Cu. That is, a brazing filler metal that does not contain Cu was used.
  • This brazing filler metal contained 3 parts by mass of Sn and 3.5 parts by mass of TiH 2 based on 100 parts by mass of Ag.
  • the main surface of the ceramic plate was divided into 24 divided areas by scribe lines.
  • a brazing material was applied to each divided area by screen printing to form a coating layer.
  • the coating area of the coating layer was the same as the area of the main surface of the copper plate to be bonded to the ceramic plate.
  • a copper plate was laminated on the ceramic plate so that the coating layer and the main surface of the copper plate were in contact with each other. In this way, a total of 24 copper plates were laminated on one main surface of the ceramic plate so as to be independent for each divided area.
  • FIG. 6 is a SEM photograph of the cross section.
  • the measurement results of width X, depth Z, and length Y, and the projected area of the recess (X ⁇ Z/2) were as shown in Table 1. The measurements were performed on only one circuit board. Note that all 24 copper plates were processed under the same machining conditions. Therefore, the values of the width X, depth Z, and length Y of the recess can be considered to be the same.
  • Example 2 A brazing filler metal containing Ag, Cu, Sn, and TiH2 was prepared. The mass ratio of Ag to Cu in the brazing filler metal was 69:31. This brazing filler metal contained 3 parts by mass of Sn and 3.5 parts by mass of TiH 2 based on 100 parts by mass of Ag and Cu in total. A circuit board was produced and evaluated in the same manner as in Example 1 except that such a brazing material was used. The results were as shown in Table 1. Also in the circuit board of Example 2, no creeping up of the brazing material was detected on the surface of the copper plate.
  • Example 1 A circuit board was produced and evaluated in the same manner as in Example 1, except that no recess was formed on one main surface (main surface 20B) of each copper plate. The results were as shown in Table 1.
  • Example 2 A circuit board was produced and evaluated in the same manner as in Example 2, except that no recess was formed on one main surface (main surface 20B) of each copper plate. The results were as shown in Table 1.
  • circuit board and a method for manufacturing the same that can sufficiently suppress creeping up of the brazing material. Furthermore, a power module including such a circuit board can be provided.
  • SYMBOLS 10 Ceramic plate, 10A, 10B... Main surface, 20, 20a, 21... Metal plate, 20A, 20B... Main surface, 20b, 22b... Outer edge, 20C... Side surface, 22... Recessed part, 22A... Extension part, 22c... Inner edge , 30... Brazing material layer, 50... Division area, 60... Semiconductor element, 61, 62, 65... Solder, 63... Electrode, 64... Metal wire, 66... Housing, 70... Base plate, 72... Cooling fin, 73 ...screw, 74...grease, 80...resin, 100, 101...circuit board, 300...power module, L1, L2...compartment line.

Abstract

Provided is a printed circuit board comprising a ceramic plate, a metal plate, and a brazing layer joining the ceramic plate and the metal plate, wherein recesses are formed in the main surface of the metal plate that joins the ceramic plate, and the recesses are provided further inside than the outer edge of the main surface. Also provided is a power module comprising the printed circuit board and semiconductor elements electrically connected to the metal plate of the printed circuit board.

Description

回路基板及びその製造方法、並びにパワーモジュールCircuit board and its manufacturing method, and power module
 本開示は、回路基板及びその製造方法、並びにパワーモジュールに関する。 The present disclosure relates to a circuit board, a method for manufacturing the same, and a power module.
 ロボット及びモーター等の産業機器の高性能化に伴い、大電流及び高電圧を制御するパワーモジュールが使用されている。このようなパワーモジュールに備えられる回路基板は、セラミック基板と銅板と備えており、これらは活性金属を含有するろう材を介して接合される。このような回路基板を形成する際に、ろう材が銅板の表面に染み出して銅板の側面を伝って這い上がる現象が生じる。このような現象が生じると、外観を損なうだけではなく、例えば半導体素子を接合する際に用いるはんだ材のぬれ製の悪化につながることも懸念される。 With the increasing performance of industrial equipment such as robots and motors, power modules that control large currents and high voltages are being used. A circuit board included in such a power module includes a ceramic substrate and a copper plate, which are joined via a brazing material containing an active metal. When forming such a circuit board, a phenomenon occurs in which the brazing material seeps onto the surface of the copper plate and creeps up along the side surface of the copper plate. If such a phenomenon occurs, it is feared that it will not only impair the appearance, but also lead to deterioration in the wettability of the solder material used, for example, when bonding semiconductor elements.
 特許文献1では、ろう材の這い上がりを抑制するため、金属板の側面に表面粗さの大きい粗部を設けることが提案されている。特許文献2では、這い上がり現象によるシミの発生を抑制するため、半導体素子が搭載される搭載予定面を囲むように回路層にリブを設ける技術が提案されている。特許文献3では、金属板のうち、バリが生じている側の表面をセラミック板の一方の面に重ねるようにして積層してろう付けすることが提案されている。このような技術によって、ろう材の這い上がりによって生じるシミの問題を解決することが試みられている。 Patent Document 1 proposes providing a rough portion with a large surface roughness on the side surface of a metal plate in order to suppress creeping up of the brazing material. Patent Document 2 proposes a technique in which a rib is provided in a circuit layer so as to surround a mounting surface on which a semiconductor element is to be mounted, in order to suppress the occurrence of stains due to the creeping phenomenon. Patent Document 3 proposes laminating and brazing the metal plates so that the surface on the side where burrs are formed overlaps one surface of the ceramic plate. Using such techniques, attempts have been made to solve the problem of stains caused by creeping up of the brazing filler metal.
国際公開第2019/163941号International Publication No. 2019/163941 特開2020-155444号公報Japanese Patent Application Publication No. 2020-155444 特開2016-39163号公報JP2016-39163A
 多数個取りの回路基板の製造方法としては、エッチング法が知られている。エッチング法では、金属板を所定のサイズに加工するためにレジスト印刷及びエッチングの工程が必要となる。一方、予め所定のサイズに加工された金属板を接合する搭載法であれば、このような工程が不要となり、生産効率を向上することができる。このような搭載法の場合、金属板の端部とセラミック板との接合信頼性を確保するために、ろう材の塗布量を十分に確保する必要がある。ところが、ろう材の塗布量が多くなると、ろう材の這い上がりが生じることが懸念される。 An etching method is known as a method for manufacturing multi-chip circuit boards. The etching method requires resist printing and etching steps to process the metal plate into a predetermined size. On the other hand, if a mounting method is used in which metal plates that have been pre-processed to a predetermined size are joined together, such a process is not necessary, and production efficiency can be improved. In the case of such a mounting method, it is necessary to ensure a sufficient amount of brazing material to be applied in order to ensure bonding reliability between the end of the metal plate and the ceramic plate. However, if the amount of brazing filler metal applied is large, there is a concern that the brazing filler metal may creep up.
 そこで、本開示は、ろう材の這い上がりを十分に抑制することが可能な回路基板及びその製造方法を提供する。また、本開示は、そのような回路基板を備えることによって信頼性に優れるパワーモジュールを提供する。 Therefore, the present disclosure provides a circuit board and a method for manufacturing the same that can sufficiently suppress creeping up of the brazing material. Furthermore, the present disclosure provides a power module with excellent reliability by including such a circuit board.
 本開示の一側面に係る回路基板は、セラミック板と、金属板と、セラミック板と金属板とを接合するろう材層と、を備える回路基板であって、金属板のセラミック板と接合される主面に凹部が形成されており、凹部は当該主面の外縁よりも内側に設けられている。 A circuit board according to one aspect of the present disclosure is a circuit board that includes a ceramic plate, a metal plate, and a brazing material layer that joins the ceramic plate and the metal plate, the metal plate being joined to the ceramic plate. A recess is formed in the main surface, and the recess is provided inside the outer edge of the main surface.
 上記回路基板では、金属板の主面の外縁よりも内側に凹部が形成されている。このような回路基板では、接合の際にろう材が凹部に充填される。このため、金属板の側面及びセラミック板側とは反対側の主面へのろう材の這い上がりを十分に抑制できる。このようにろう材の這い上がりが抑制された回路基板は、外観及び半導体素子等の外部回路との接続信頼性に優れる。 In the above circuit board, a recess is formed inside the outer edge of the main surface of the metal plate. In such circuit boards, the recesses are filled with a brazing material during bonding. Therefore, it is possible to sufficiently suppress the brazing filler metal from creeping up onto the side surface of the metal plate and the main surface on the side opposite to the ceramic plate side. A circuit board in which creeping up of the brazing material is suppressed in this manner has excellent appearance and connection reliability with external circuits such as semiconductor elements.
 上記凹部は、金属板の上記主面の中心よりも外縁に近接していてよい。これによって、金属板の側面及びセラミック板側とは反対側の主面へのろう材の這い上がりを一層抑制することができる。 The recess may be closer to the outer edge of the main surface of the metal plate than to the center. Thereby, it is possible to further suppress the brazing material from creeping up onto the side surface of the metal plate and the main surface on the opposite side to the ceramic plate side.
 上記凹部は、金属板の上記主面の外縁に沿って、金属板の上記主面の中心を周回するように設けられていてよい。これによって、金属板の側面全体において、ろう材の這い上がりを十分に抑制することができる。 The recess may be provided along the outer edge of the main surface of the metal plate so as to revolve around the center of the main surface of the metal plate. Thereby, creeping up of the brazing material can be sufficiently suppressed on the entire side surface of the metal plate.
 上記凹部は、金属板の内部からセラミック板に近接するにつれて幅が大きくなる拡張部を有してよい。このような拡張部を有することによって、凹部にろう材が充填されやすくなる。これによって、接合信頼性を十分に高くすることができる。上記凹部の全体にろう材層を構成する成分が充填されていてよい。これによって、接合信頼性を一層向上することができる。 The recessed portion may have an expanded portion whose width increases as it approaches the ceramic plate from the inside of the metal plate. Having such an expanded portion makes it easier to fill the recess with the brazing material. This makes it possible to sufficiently increase the bonding reliability. The entire recess may be filled with a component constituting the brazing material layer. Thereby, bonding reliability can be further improved.
 上記金属板の凹部の幅Xは0.1~1mmであってよい。このようなサイズの凹部を有する金属板を備えることによって、ろう材の這い上がりの抑制と接合信頼性とを十分に高い水準で両立することができる。 The width X of the recessed portion of the metal plate may be 0.1 to 1 mm. By providing a metal plate having a concave portion of such size, it is possible to suppress creeping up of the brazing material and to achieve a sufficiently high level of bonding reliability.
 上記金属板の凹部の深さZは0.05~0.6mmであってよい。このようなサイズの凹部を有する金属板を備えることによって、ろう材の這い上がりを一層抑制することができる。 The depth Z of the recessed portion of the metal plate may be 0.05 to 0.6 mm. By providing a metal plate having recesses of such size, creeping up of the brazing material can be further suppressed.
 上記回路基板は、セラミック板と、複数の金属板と、セラミック板の上記主面と複数の金属板の主面のそれぞれとを接合する複数のろう材層と、を備え、複数の金属板が、凹部が形成されている上記金属板を含んでよい。 The circuit board includes a ceramic plate, a plurality of metal plates, and a plurality of brazing metal layers bonding the main surface of the ceramic plate and each of the main surfaces of the plurality of metal plates, and the plurality of metal plates , the metal plate may include the metal plate in which a recess is formed.
 上記回路基板では、少なくとも一つの金属板の主面に上記凹部が形成されている。このため、ろう材が、当該金属板の側面を這い上がり、金属板のセラミック板側とは反対側の主面にろう材が到達することを十分に抑制できる。なお、複数の金属板のそれぞれは、セラミック板の主面における区画線で画定される区画領域毎に独立して設けられてよい。このような回路基板は、多数個取り回路基板であってよい。このような多数個取り回路基板を分割すれば、複数の個片化基板(分割基板)を纏めて製造することができる。このような回路基板は、生産効率に優れる。 In the circuit board, the recess is formed on the main surface of at least one metal plate. Therefore, it is possible to sufficiently prevent the brazing material from creeping up the side surface of the metal plate and reaching the main surface of the metal plate on the side opposite to the ceramic plate side. Note that each of the plurality of metal plates may be provided independently for each partition area defined by a partition line on the main surface of the ceramic plate. Such a circuit board may be a multi-chip circuit board. By dividing such a multi-chip circuit board, a plurality of individualized boards (divided boards) can be manufactured at once. Such a circuit board has excellent production efficiency.
 本開示の一側面に係る回路基板の製造方法は、主面に凹部が形成され、当該凹部が当該主面の外縁よりも内側に設けられている一つ又は複数の金属板を準備する準備工程と、セラミック板の主面にろう材を塗布及び乾燥して一つ又は複数の塗布層を設ける塗布乾燥工程と、一つ又は複数の塗布層を挟むようにしてセラミック板と一つ又は複数の金属板とを積層して積層体を作製する積層工程と、積層体を加熱してセラミック板と一つ又は複数の金属板とが一つ又は複数のろう材層で接合された接合体を得る接合工程と、を有し、積層工程において、一つ又は複数の金属板の主面とセラミック板の主面とが対向するようにセラミック板と一つ又は複数の金属板とを積層する。 A method for manufacturing a circuit board according to one aspect of the present disclosure includes a preparation step of preparing one or more metal plates in which a recess is formed in the main surface and the recess is provided inside the outer edge of the main surface. a coating and drying step of applying and drying a brazing filler metal to the main surface of the ceramic plate to form one or more coated layers; and a coating and drying step of forming one or more coated layers between the ceramic plate and one or more metal plates. a lamination process in which a laminate is produced by laminating the laminate, and a bonding process in which the laminate is heated to obtain a joined body in which a ceramic plate and one or more metal plates are joined by one or more brazing metal layers. In the lamination step, the ceramic plate and the one or more metal plates are laminated so that the main surface of the one or more metal plates and the main surface of the ceramic plate face each other.
 上記製造方法では、積層工程で、一つ又は複数の金属板の主面のうち凹部が形成されている方の主面とセラミック板とが対向するようにセラミック板と一つ又は複数の金属板とを積層している。このようにして得られる積層体を用いて接合工程を行って得られる回路基板は、ろう材が金属板の側面、及びセラミック板側とは反対側の主面に這い上がることを十分に抑制できる。このような製造方法で得られる回路基板は、外観及び半導体素子の接続信頼性に優れる。 In the above manufacturing method, in the lamination process, the ceramic plate and the one or more metal plates are stacked together so that the main surface of the one or more metal plates on which the recess is formed faces the ceramic plate. are laminated. The circuit board obtained by performing the bonding process using the laminate obtained in this way can sufficiently suppress the brazing material from creeping up the side surface of the metal plate and the main surface on the opposite side to the ceramic plate side. . A circuit board obtained by such a manufacturing method has excellent appearance and connection reliability of semiconductor elements.
 上記製造方法の準備工程では凹部が形成されている複数の金属板を準備し、積層工程では、複数の金属板のそれぞれがセラミック板の主面における区画線で画定される区画領域毎に独立するように、複数の金属板を積層して積層体を作製し、接合工程の後に、接合体におけるセラミック板を区画線に沿って分割する分割工程を有してよい。 In the preparation step of the above manufacturing method, a plurality of metal plates in which recesses are formed are prepared, and in the lamination step, each of the plurality of metal plates is divided into separate areas defined by partition lines on the main surface of the ceramic plate. In this way, a plurality of metal plates may be laminated to produce a laminate, and after the bonding step, a dividing step may be included in which the ceramic plates in the bonded body are divided along division lines.
 このような接合工程で得られる接合体は、多数個取り回路基板ということもできる。分割工程において、このような多数個取り回路基板を分割すれば、複数の個片化基板(分割基板)を纏めて製造することができる。このような製造方法は、高い生産効率で回路基板(個片化基板)を製造することができる。 The bonded body obtained by such a bonding process can also be called a multi-chip circuit board. In the dividing step, by dividing such a multi-chip circuit board, a plurality of individualized boards (divided boards) can be manufactured all at once. Such a manufacturing method can manufacture circuit boards (singulated boards) with high production efficiency.
 本開示の一側面に係るパワーモジュールは、上述のいずれかの回路基板と、当該回路基板の金属板に電気的に接続される半導体素子と、を備える。このようなパワーモジュールは、上述のいずれかの回路基板を備えることから信頼性に優れる。 A power module according to one aspect of the present disclosure includes any of the circuit boards described above and a semiconductor element electrically connected to the metal plate of the circuit board. Such a power module has excellent reliability because it includes any of the above-mentioned circuit boards.
 ろう材の這い上がりを十分に抑制することが可能な回路基板及びその製造方法を提供することができる。また、そのような回路基板を備えることによって信頼性に優れるパワーモジュールを提供することができる。 It is possible to provide a circuit board and a method for manufacturing the same that can sufficiently suppress creeping up of the brazing material. Furthermore, by including such a circuit board, a highly reliable power module can be provided.
図1は、回路基板の斜視図である。FIG. 1 is a perspective view of a circuit board. 図2は、回路基板の平面図である。FIG. 2 is a plan view of the circuit board. 図3は、図2の回路基板のIII-III線断面図である。FIG. 3 is a cross-sectional view taken along the line III--III of the circuit board of FIG. 図4は、図3の断面の一部を拡大して示す断面図である。FIG. 4 is an enlarged cross-sectional view of a part of the cross-section of FIG. 3. 図5は、パワーモジュールの断面図である。FIG. 5 is a cross-sectional view of the power module. 図6は、実施例1の回路基板の厚さ方向に沿う断面を示す走査型電子顕微鏡(SEM)の写真である。FIG. 6 is a scanning electron microscope (SEM) photograph showing a cross section along the thickness direction of the circuit board of Example 1.
 以下、場合により図面を参照して、本開示の実施形態を説明する。ただし、以下の実施形態は、本開示を説明するための例示であり、本開示を以下の内容に限定する趣旨ではない。説明において、同一要素又は同一機能を有する要素には同一符号を用い、場合により重複する説明は省略する。また、上下左右等の位置関係は、特に断らない限り、図面に示す位置関係に基づくものとする。更に、各要素の寸法比率は図示の比率に限られるものではない。なお、「~」の記号で示される数値範囲は、下限値及び上限値を含む。すなわち、「x~y」で示される数値範囲は、x以上且つy以下を意味する。各実施形態における各数値範囲の上限又は下限をいずれかの実施例の数値で置き換えた数値範囲も本開示に含まれる。 Hereinafter, embodiments of the present disclosure will be described with reference to the drawings as the case may be. However, the following embodiments are examples for explaining the present disclosure, and are not intended to limit the present disclosure to the following contents. In the description, the same reference numerals will be used for the same elements or elements having the same function, and redundant description will be omitted in some cases. In addition, the positional relationships such as top, bottom, left, and right are based on the positional relationships shown in the drawings unless otherwise specified. Furthermore, the dimensional ratio of each element is not limited to the ratio shown in the drawings. Note that the numerical range indicated by the symbol "~" includes a lower limit value and an upper limit value. That is, the numerical range indicated by "x to y" means greater than or equal to x and less than or equal to y. Numerical ranges in which the upper limit or lower limit of each numerical range in each embodiment is replaced with the numerical value of any example are also included in the present disclosure.
 一実施形態に係る回路基板は、セラミック板と、金属板と、セラミック板の主面と金属板の主面とを接合するろう材層と、を備える。一枚のセラミック板の一方の主面に接合される金属板は、一つであってもよいし、複数であってもよい。セラミック板の材質は特に制限されず、例えば、窒化物焼結体、炭化物焼結体、又は酸化物焼結体で構成されていてよい。具体的には、窒化ケイ素焼結体、窒化アルミニウム焼結体、酸化アルミニウム焼結体、及び炭化ケイ素焼結体等が挙げられる。セラミック板の板状であれば特に制限されない。セラミック板の厚みは、例えば0.2~2mmであってよく、0.32~1.1mmであってもよい。 A circuit board according to one embodiment includes a ceramic plate, a metal plate, and a brazing material layer that joins the main surface of the ceramic plate and the main surface of the metal plate. The number of metal plates joined to one main surface of one ceramic plate may be one or multiple. The material of the ceramic plate is not particularly limited, and may be made of, for example, a nitride sintered body, a carbide sintered body, or an oxide sintered body. Specific examples include silicon nitride sintered bodies, aluminum nitride sintered bodies, aluminum oxide sintered bodies, and silicon carbide sintered bodies. There is no particular restriction as long as it is in the shape of a ceramic plate. The thickness of the ceramic plate may be, for example, 0.2 to 2 mm, or 0.32 to 1.1 mm.
 金属板は、Cu又はCuと他の金属との合金を含んでいてよく、例えば銅板であってよい。金属板は、セラミック板の主面に対向する主面に凹部が形成されている。凹部は、金属板の主面の外縁よりも内側に設けられている。このため、凹部は回路基板の外観には現れていない。金属板がこのような凹部を備えることによって、ろう材が金属板の側面及び金属板のセラミック板側とは反対側の主面へ這い上がることを十分に抑制することができる。金属板の厚み(主面間の距離)は、例えば0.1~1.2mmであってよく、0.2~1mmであってもよい。金属板は表面にめっき膜を有していてもよい。回路基板の厚み方向に沿う断面で見たときに、凹部はその幅がセラミック板に向かって拡がるようにV字状を呈していてもよい。このような凹部には、ろう材層を構成する成分が充填されやすいため、金属板とセラミック板の接合信頼性を十分に高くすることができる。 The metal plate may include Cu or an alloy of Cu and another metal, and may be a copper plate, for example. The metal plate has a recess formed in its main surface opposite to the main surface of the ceramic plate. The recess is provided inside the outer edge of the main surface of the metal plate. Therefore, the recess does not appear on the external appearance of the circuit board. By providing the metal plate with such a recessed portion, it is possible to sufficiently suppress the brazing material from creeping up to the side surface of the metal plate and the main surface of the metal plate on the side opposite to the ceramic plate side. The thickness of the metal plate (distance between main surfaces) may be, for example, 0.1 to 1.2 mm, or 0.2 to 1 mm. The metal plate may have a plating film on its surface. When viewed in a cross section along the thickness direction of the circuit board, the recess may have a V-shape such that the width thereof increases toward the ceramic plate. Since such a recess is easily filled with components constituting the brazing material layer, the reliability of joining between the metal plate and the ceramic plate can be sufficiently increased.
 ろう材層は、Agを含んでよく、Ag及びCuを含んでもよい。さらに、Sn、及び活性金属からなる群より選ばれる一種又は二種以上の金属を含有してよい。二種以上の金属は合金となっていてもよい。活性金属は、Ti、Hf、Zr、及びNbからなる群より選ばれる一種又は二種以上を含んでいてよい。ろう材層に含まれるAg及びCuは、例えばAg-Cu共晶合金等の合金としてろう材層に含まれていてもよい。ろう材層を構成する成分としては上述のような成分が挙げられる。ろう材層におけるAgの含有量は、45~95質量%であってよく、50~95質量%であってもよい。ろう材層におけるAg及びCuの合計含有量は、65~100質量%であってよく、70~99質量%であってよく、90~98質量%であってもよい。これによって、凹部における空隙を十分に低減しつつ、ろう材層の緻密性を向上することができる。 The brazing material layer may contain Ag, and may also contain Ag and Cu. Furthermore, it may contain one or more metals selected from the group consisting of Sn and active metals. Two or more metals may be an alloy. The active metal may include one or more selected from the group consisting of Ti, Hf, Zr, and Nb. Ag and Cu contained in the brazing material layer may be contained in the brazing material layer as an alloy such as an Ag--Cu eutectic alloy. Components constituting the brazing material layer include those described above. The content of Ag in the brazing material layer may be 45 to 95% by mass, or 50 to 95% by mass. The total content of Ag and Cu in the brazing material layer may be 65 to 100% by weight, 70 to 99% by weight, or 90 to 98% by weight. Thereby, the denseness of the brazing material layer can be improved while sufficiently reducing the voids in the recesses.
 ろう材層における活性金属の含有量は、Ag及びCuの合計100質量部に対して、0.5~8質量部であってよい。活性金属の含有量を0.5質量部以上とすることで、セラミック板とろう材層との接合性を向上することができる。一方、活性金属の含有量を8質量部以下とすることで、接合界面に脆弱な合金層が形成されることを抑制できる。 The content of the active metal in the brazing material layer may be 0.5 to 8 parts by mass based on 100 parts by mass of Ag and Cu in total. By setting the content of the active metal to 0.5 parts by mass or more, the bondability between the ceramic plate and the brazing material layer can be improved. On the other hand, by setting the content of the active metal to 8 parts by mass or less, formation of a fragile alloy layer at the bonding interface can be suppressed.
 ろう材層に含有される上記金属は、窒化物、酸化物、炭化物又は水素化物として含まれていてもよい。一例として、ろう材層は、窒化チタン及び/又は水素化チタン(TiH)を含んでいてよい。これによって、セラミック板と金属板との接合強度を十分に高くすることができる。AgとCuの合計100質量部に対するTiHの含有量は例えば1~8質量部であってよい。 The metal contained in the brazing material layer may be contained as a nitride, oxide, carbide, or hydride. As an example, the braze layer may include titanium nitride and/or titanium hydride ( TiH2 ). This makes it possible to sufficiently increase the bonding strength between the ceramic plate and the metal plate. The content of TiH 2 may be, for example, 1 to 8 parts by weight based on 100 parts by weight of Ag and Cu in total.
 図1は、本実施形態に係る回路基板の一例を示す斜視図である。図2は、図1の回路基板の平面図であり、図3は、図2のIII-III線断面図である。図1、図2及び図3に示すように、回路基板100は、セラミック板10と、セラミック板10の主面10A及び主面10B上に複数の金属板20と、を備える。 FIG. 1 is a perspective view showing an example of a circuit board according to the present embodiment. 2 is a plan view of the circuit board of FIG. 1, and FIG. 3 is a sectional view taken along the line III--III of FIG. As shown in FIGS. 1, 2, and 3, the circuit board 100 includes a ceramic plate 10 and a plurality of metal plates 20 on the main surface 10A and the main surface 10B of the ceramic board 10.
 セラミック板10は、平板形状を有する。セラミック板10は主面10Aにおける区画線によって複数に区画されている。主面10Aには、区画線として、第1の方向に沿って延在し且つ等間隔で並ぶ複数の区画線L1と、第1の方向に直交する第2の方向に沿って延在し且つ等間隔で並ぶ複数の区画線L2と、が設けられている。区画線L1と区画線L2とは互いに直交している。 The ceramic plate 10 has a flat plate shape. The ceramic plate 10 is divided into a plurality of sections by dividing lines on the main surface 10A. The principal surface 10A includes a plurality of partition lines L1 extending along a first direction and lined up at equal intervals, and a plurality of partition lines L1 extending along a second direction orthogonal to the first direction, as partition lines. A plurality of partition lines L2 arranged at equal intervals are provided. The partition line L1 and the partition line L2 are orthogonal to each other.
 区画線L1,L2は、例えば、直線状に並んだ複数の凹みで構成されていてもよいし、線状の溝で構成されていてもよい。具体的には、レーザー光で形成されるスクライブラインであってよい。レーザー源としては、例えば、炭酸ガスレーザー及びYAGレーザー等が挙げられる。このようなレーザー源からレーザー光を間欠的に照射することによってスクライブラインを形成することができる。なお、区画線L1,L2は、等間隔で並んでいなくてもよく、また、直交するものに限定されない。また、区画線L1,L2は、直線状ではなく、曲線状であってもよいし、折れ曲がっていてもよい。 For example, the partition lines L1 and L2 may be composed of a plurality of recesses arranged in a straight line, or may be composed of linear grooves. Specifically, it may be a scribe line formed with laser light. Examples of the laser source include a carbon dioxide laser and a YAG laser. A scribe line can be formed by intermittently irradiating laser light from such a laser source. Note that the partition lines L1 and L2 do not have to be arranged at equal intervals, and are not limited to being perpendicular to each other. Further, the partition lines L1 and L2 may not be straight, but may be curved or bent.
 セラミック板10は、区画線L1及び区画線L2によって画定される複数の区画領域50を有する。複数の区画領域50のそれぞれに、金属板20が設けられている。複数の金属板20は、それぞれ互いに独立している。回路基板100は、集合基板とも称されるものであり、区画線L1,L2に沿って分割することができる。分割することによって複数の回路基板(個片化基板)を得ることができる。このように分割して得られる個片化基板も、本実施形態の回路基板の一例である。 The ceramic plate 10 has a plurality of partition areas 50 defined by partition lines L1 and L2. A metal plate 20 is provided in each of the plurality of divided areas 50. The plurality of metal plates 20 are independent from each other. The circuit board 100 is also called a collective board, and can be divided along partition lines L1 and L2. By dividing, a plurality of circuit boards (singulated boards) can be obtained. The individualized board obtained by dividing in this way is also an example of the circuit board of this embodiment.
 金属板20の一方の主面20Aは外部に露出している。金属板20の他方の主面20Bとセラミック板10の主面10A(主面10B)は、ろう材層30によって接合されている。金属板20の主面20B(ろう材層30との接合面)の外縁20bよりも内側に凹部22が形成されている。このような凹部22は、金属板20の主面20Bの一部を切削加工して形成されたものであってよい。図2及び図3に示されるように、凹部22は、金属板20の主面20Bの外縁20bに沿って、主面20Bの中心を周回するように設けられている。ただし、凹部22を主面20Bの外縁20bの全周に沿うように設けることは必須ではない。凹部22は、主面20Bの中心よりも主面20Bの外縁20bに近接している。これによって、金属板20の側面20C及びセラミック板10側とは反対側の主面20Aへのろう材の這い上がりを一層抑制することができる。変形例では、金属板20の上に半導体素子が搭載される際に半田付けがなされる部分の近傍のみに、凹部22を設けてもよい。また、複数の金属板20の一部のみに凹部22を設けてもよい。例えば、パワーモジュールの放熱板となる金属板20には凹部22を設けなくてもよい。 One main surface 20A of the metal plate 20 is exposed to the outside. The other main surface 20B of the metal plate 20 and the main surface 10A (main surface 10B) of the ceramic plate 10 are joined by a brazing material layer 30. A recess 22 is formed inside the outer edge 20b of the main surface 20B (joint surface with the brazing material layer 30) of the metal plate 20. Such a recess 22 may be formed by cutting a part of the main surface 20B of the metal plate 20. As shown in FIGS. 2 and 3, the recess 22 is provided along the outer edge 20b of the main surface 20B of the metal plate 20 so as to go around the center of the main surface 20B. However, it is not essential to provide the recess 22 along the entire circumference of the outer edge 20b of the main surface 20B. The recess 22 is closer to the outer edge 20b of the main surface 20B than to the center of the main surface 20B. Thereby, it is possible to further suppress the brazing material from creeping up onto the side surface 20C of the metal plate 20 and the main surface 20A on the side opposite to the ceramic plate 10 side. In a modified example, the recess 22 may be provided only in the vicinity of the portion where the semiconductor element is soldered when the semiconductor element is mounted on the metal plate 20. Further, the recesses 22 may be provided only in some of the plurality of metal plates 20. For example, it is not necessary to provide the recess 22 in the metal plate 20 that serves as a heat sink of the power module.
 図3に示すように、凹部22全体にろう材層30の一部が充填されている。すなわち、凹部22全体にろう材層30を構成する成分が充填されている。これによって、金属板20とセラミック板10とが、ろう材層30によって強固に接合される。したがって、金属板20とセラミック板10の接合信頼性を十分に向上することができる。なお、ろう材層30を構成する成分が凹部22全体に充填されることは必須ではない。変形例では、凹部22の一部のみにろう材層30を構成する成分が充填されていてもよい。 As shown in FIG. 3, the entire recess 22 is filled with a portion of the brazing material layer 30. That is, the entire concave portion 22 is filled with the component constituting the brazing material layer 30. As a result, the metal plate 20 and the ceramic plate 10 are firmly joined by the brazing material layer 30. Therefore, the reliability of bonding between the metal plate 20 and the ceramic plate 10 can be sufficiently improved. Note that it is not essential that the entire recess 22 be filled with the component constituting the brazing material layer 30. In a modified example, only a portion of the recess 22 may be filled with the component constituting the brazing material layer 30.
 図4は、図3に示す回路基板100の断面の一部を拡大して示している。図3及び図4は、ともに、凹部22の長手方向に直交し且つ金属板20の厚さ方向に沿う断面を示している。このような断面で見たときに、凹部22の幅Xは、0.1~1mmであってよい。幅Xの下限は0.2mmであってよく、0.3mmであってもよい。幅Xの上限は0.9mmであってよく、0.8mmであってもよい。これによって、側面20Cへのろう材の這い上がりの抑制と、金属板20とセラミック板10との接合信頼性とを十分に高い水準で両立することができる。なお、凹部22の幅Xは凹部22の外縁22bと内縁22cの間隔である。 FIG. 4 shows a partially enlarged cross-section of the circuit board 100 shown in FIG. 3. 3 and 4 both show a cross section perpendicular to the longitudinal direction of the recess 22 and along the thickness direction of the metal plate 20. When viewed in such a cross section, the width X of the recess 22 may be 0.1 to 1 mm. The lower limit of the width X may be 0.2 mm or 0.3 mm. The upper limit of the width X may be 0.9 mm or 0.8 mm. Thereby, it is possible to suppress the brazing material from creeping up to the side surface 20C and to achieve a sufficiently high level of bonding reliability between the metal plate 20 and the ceramic plate 10. Note that the width X of the recess 22 is the distance between the outer edge 22b and the inner edge 22c of the recess 22.
 上記断面で見たときに、凹部22の深さZは、0.05~0.6mmであってよい。深さZの下限は、0.15mmであってよく、0.2mmであってもよい。これによって、側面20Cへのろう材の這い上がりを十分に抑制することができる。深さZの上限は0.4mmであってよく、0.3mmであってもよい。これによって、凹部22の全体にろう材層30を構成する成分が充填され易くなる。これによって、金属板20とセラミック板10との接合信頼性を十分に高くすることができる。金属板20の厚さに対する深さZの比は、0.05~0.5であってよく、0.15~0.4であってもよい。これによって、金属板20の導電性を十分に維持しつつろう材の這い上がりを十分に抑制することができる。 When viewed in the above cross section, the depth Z of the recess 22 may be 0.05 to 0.6 mm. The lower limit of the depth Z may be 0.15 mm or 0.2 mm. Thereby, it is possible to sufficiently suppress the brazing filler metal from creeping up to the side surface 20C. The upper limit of the depth Z may be 0.4 mm or 0.3 mm. This makes it easier to fill the entire recess 22 with the components constituting the brazing material layer 30. Thereby, the reliability of bonding between the metal plate 20 and the ceramic plate 10 can be made sufficiently high. The ratio of the depth Z to the thickness of the metal plate 20 may be from 0.05 to 0.5, or from 0.15 to 0.4. Thereby, the creeping up of the brazing filler metal can be sufficiently suppressed while maintaining the conductivity of the metal plate 20 sufficiently.
 上記断面で見たときに、凹部22の外縁22bと側面20Cの間の長さYは、0.1~5mmであってよい。長さYの下限は0.15mmであってよく、0.2mmであってもよい。長さYの上限は4mmであってよく、3mmであってよく、1mmであってもよい。長さYがこのようなサイズであることによって、側面20Cへのろう材の這い上がりを十分に抑制することができる。 When viewed in the above cross section, the length Y between the outer edge 22b of the recess 22 and the side surface 20C may be 0.1 to 5 mm. The lower limit of the length Y may be 0.15 mm or 0.2 mm. The upper limit of the length Y may be 4 mm, 3 mm, or 1 mm. By setting the length Y to such a size, it is possible to sufficiently suppress the brazing filler metal from creeping up to the side surface 20C.
 凹部22は、金属板20の内部からセラミック板10に近接するにつれて幅が大きくなる拡張部22Aを有する。ここでいう「幅」とは、図4に示すような断面において、主面20Bと平行に計測される凹部22の長さである。このような拡張部22Aを有する凹部22はろう材層30を構成する成分が充填され易い。これによって、金属板20とセラミック板10との接合信頼性を十分に高くすることができる。なお、この図4の例では、凹部22の全体が拡張部22Aで構成されているが、このような形状に限定されない。凹部22の一部のみが拡張部22Aで構成されていてもよい。例えば、凹部のうち、セラミック板10寄りの一部のみが拡張部で構成されていてもよい。この場合、凹部は台形状であってよい。 The recess 22 has an expanded portion 22A whose width increases as it approaches the ceramic plate 10 from inside the metal plate 20. The "width" here is the length of the recess 22 measured parallel to the main surface 20B in a cross section as shown in FIG. The concave portion 22 having such an expanded portion 22A is easily filled with the component constituting the brazing material layer 30. Thereby, the reliability of bonding between the metal plate 20 and the ceramic plate 10 can be made sufficiently high. In the example shown in FIG. 4, the entire recess 22 is made up of the extended portion 22A, but the shape is not limited to this. Only a part of the recess 22 may be formed by the extended portion 22A. For example, only a portion of the recessed portion closer to the ceramic plate 10 may be configured as an expanded portion. In this case, the recess may be trapezoidal.
 ろう材の這い上がりの抑制と接合信頼性とを高水準で両立する観点から、幅Xと同じ方向に沿って測定される金属板20の主面20Aの長さに対する幅Xの比は、0.001~0.3であってよく、0.001~0.2であってよく、0.002~0.2であってもよい。主面20Aの長さは、例えば、5~100mmであってよく、15~50mmであってもよい。 From the viewpoint of achieving both suppression of brazing filler metal creep-up and high bonding reliability, the ratio of the width X to the length of the main surface 20A of the metal plate 20 measured along the same direction as the width X is 0. It may be from .001 to 0.3, from 0.001 to 0.2, from 0.002 to 0.2. The length of the main surface 20A may be, for example, 5 to 100 mm, or 15 to 50 mm.
 ろう材の這い上がりの抑制と接合信頼性とをさらに高水準で両立する観点から、凹部22の投影面積は、0.0025~0.3mmであってよく、0.01~0.3mmであってもよい。凹部22の投影面積は、上記断面において凹部22が三角形である場合、幅X×深さZ/2の式で算出される。凹部22が矩形である場合、幅X×深さZによって算出することができる。 From the viewpoint of achieving both suppression of creeping up of the brazing material and bonding reliability at a higher level, the projected area of the recess 22 may be 0.0025 to 0.3 mm2 , and may be 0.01 to 0.3mm2. It may be. When the recess 22 is triangular in the cross section, the projected area of the recess 22 is calculated by the formula: width X x depth Z/2. When the recess 22 is rectangular, it can be calculated by width X x depth Z.
 回路基板100は、必要に応じて分割して個片化された後、例えば、パワーモジュールに搭載されてもよい。金属板20は、電気信号を伝達する機能を有する回路板、又は熱を伝達する機能を有する放熱板として機能してよい。また、金属板20は、熱を伝達する機能と、電気信号を伝達する機能を兼ね備えていてもよい。回路基板100及びこれを分割して得られる個片化基板(回路基板)は、金属板20の側面20C、及び金属板20のセラミック板10側とは反対側の主面20Aにおけるろう材の這い上がりが十分に抑制されている。これによって、側面20C及び主面20Aからろう材を除去する工程を省略することができる。また、回路基板100は、金属板20とセラミック板10との接合信頼性に優れる。このため、外観及び半導体素子等の外部回路との接続信頼性に優れる。したがって、高い信頼性が求められるパワーモジュールに搭載される部品として好適である。 After the circuit board 100 is divided into individual pieces as necessary, it may be mounted on a power module, for example. The metal plate 20 may function as a circuit board that has the function of transmitting electrical signals or a heat sink that has the function of transmitting heat. Further, the metal plate 20 may have both a function of transmitting heat and a function of transmitting an electric signal. The circuit board 100 and the individualized boards (circuit boards) obtained by dividing the same include brazing filler metal on the side surface 20C of the metal plate 20 and the main surface 20A of the metal plate 20 on the side opposite to the ceramic plate 10 side. The rise is sufficiently suppressed. Thereby, the step of removing the brazing material from the side surface 20C and the main surface 20A can be omitted. Moreover, the circuit board 100 has excellent bonding reliability between the metal plate 20 and the ceramic plate 10. Therefore, it has excellent appearance and connection reliability with external circuits such as semiconductor elements. Therefore, it is suitable as a component mounted on a power module that requires high reliability.
 一実施形態に係るパワーモジュールは、回路基板と、回路基板の金属板に電気的に接続される半導体素子と、を備える。回路基板は、上述の回路基板100又はその変形例であってよいし、別の回路基板であってもよい。回路基板100及びその変形例に関する説明内容は、本実施形態のパワーモジュールに適用される。このようなパワーモジュールは、信頼性に優れる。回路基板及び半導体素子は、樹脂によって封止されていてもよい。 A power module according to one embodiment includes a circuit board and a semiconductor element electrically connected to a metal plate of the circuit board. The circuit board may be the above-described circuit board 100 or a modification thereof, or may be another circuit board. The description regarding the circuit board 100 and its modifications is applied to the power module of this embodiment. Such a power module has excellent reliability. The circuit board and the semiconductor element may be sealed with resin.
 図5は、本実施形態に係るパワーモジュールの一例を示す断面図である。パワーモジュール300は、ベース板70と、ハンダ62を介してベース板70の一方面と接合される回路基板101とを備える。回路基板101の一方面側における金属板21がハンダ62を介してベース板70と接合している。 FIG. 5 is a sectional view showing an example of the power module according to the present embodiment. The power module 300 includes a base plate 70 and a circuit board 101 joined to one side of the base plate 70 via solder 62. The metal plate 21 on one side of the circuit board 101 is joined to the base plate 70 via solder 62.
 回路基板101の他方面側における金属板20の少なくとも一つには、ハンダ61を介して半導体素子60が取り付けられている。半導体素子60は、アルミワイヤ(アルミ線)等の金属ワイヤ64で金属板20の所定箇所に接続されている。このようにして、半導体素子60と金属板20とは電気的に接続されている。筐体66の外部と金属板20とを電気的に接続するため、金属板20の一つである金属板20aは、ハンダ65を介して筐体66を貫通して設けられる電極63に接続されている。 A semiconductor element 60 is attached to at least one of the metal plates 20 on the other side of the circuit board 101 via solder 61. The semiconductor element 60 is connected to a predetermined location on the metal plate 20 with a metal wire 64 such as an aluminum wire. In this way, the semiconductor element 60 and the metal plate 20 are electrically connected. In order to electrically connect the outside of the casing 66 and the metal plate 20, the metal plate 20a, which is one of the metal plates 20, is connected to an electrode 63 provided through the casing 66 via a solder 65. ing.
 ベース板70の一方の主面上には、当該主面と一体になって回路基板101を収容する筐体66が配置されている。ベース板70の一方の主面と筐体66とで形成される収容空間には、回路基板101及び半導体素子60を覆うようにして樹脂80が充填されている。樹脂80は、回路基板101及び半導体素子60を封止している。樹脂は、例えば、熱硬化型樹脂であってよく、光硬化型樹脂であってもよい。 A housing 66 is disposed on one main surface of the base plate 70 and is integrated with the main surface to accommodate the circuit board 101. A housing space formed by one main surface of the base plate 70 and the housing 66 is filled with resin 80 so as to cover the circuit board 101 and the semiconductor element 60 . The resin 80 seals the circuit board 101 and the semiconductor element 60. The resin may be, for example, a thermosetting resin or a photocuring resin.
 ベース板70の他方の主面には、グリース74を介して放熱部をなす冷却フィン72が接合されている。ベース板70の端部には冷却フィン72をベース板70に固定するネジ73が取り付けられている。ベース板70及び冷却フィン72はアルミニウムで構成されていてもよい。ベース板70及び冷却フィン72は、高い熱伝導率を有することによって放熱部として良好に機能する。 Cooling fins 72 forming a heat radiating section are joined to the other main surface of the base plate 70 via grease 74. Screws 73 are attached to the ends of the base plate 70 to fix the cooling fins 72 to the base plate 70. The base plate 70 and the cooling fins 72 may be made of aluminum. The base plate 70 and the cooling fins 72 have high thermal conductivity and function well as a heat dissipation section.
 セラミック板10によって、金属板20と金属板21は電気的に絶縁される。金属板20(20a)は電気回路を形成していてよい。金属板20及び金属板21は、ろう材層(不図示)によってセラミック板10の主面10A及び主面10Bにそれぞれ接合されている。金属板20のセラミック板10と接合される主面には、図3及び図4に示すような凹部が形成されている。この凹部は、凹部22と同様のサイズを有し、凹部の全体にはろう材層を構成する成分が充填されていてよい。このような凹部を有することによって、搭載法で製造した場合でも、金属板20の側面と半導体素子60が搭載される主面へのろう材の這い上がりを十分に抑制することができる。また、金属板20とセラミック板10との接合信頼性を十分に高くすることができる。したがって、パワーモジュール300は、半導体素子60と金属板20との電気的な接続の信頼性に優れる。金属板21のセラミック板10と接合される主面にも、金属板20と同様に凹部22が形成されていてよい。 The metal plate 20 and the metal plate 21 are electrically insulated by the ceramic plate 10. The metal plate 20 (20a) may form an electric circuit. The metal plate 20 and the metal plate 21 are respectively joined to the main surface 10A and the main surface 10B of the ceramic plate 10 by a brazing material layer (not shown). A recessed portion as shown in FIGS. 3 and 4 is formed on the main surface of the metal plate 20 to be joined to the ceramic plate 10. This recess has the same size as the recess 22, and the entire recess may be filled with a component constituting the brazing material layer. By having such a recessed portion, even when manufactured by the mounting method, it is possible to sufficiently suppress the brazing material from creeping up to the side surface of the metal plate 20 and the main surface on which the semiconductor element 60 is mounted. Furthermore, the reliability of the bond between the metal plate 20 and the ceramic plate 10 can be made sufficiently high. Therefore, the power module 300 has excellent electrical connection reliability between the semiconductor element 60 and the metal plate 20. Similarly to the metal plate 20, a recess 22 may be formed on the main surface of the metal plate 21 to be joined to the ceramic plate 10.
 一実施形態に係る回路基板の製造方法は、主面に凹部が形成され、当該凹部が当該主面の外縁よりも内側に設けられている一つ又は複数の金属板を準備する準備工程と、セラミック板の主面にろう材を塗布及び乾燥して一つ又は複数の塗布層を設ける塗布乾燥工程と、一つ又は複数の塗布層を挟むようにしてセラミック板と一つ又は複数の金属板とを積層して積層体を作製する積層工程と、積層体を加熱してセラミック板と一つ又は複数の金属板とが一つ又は複数のろう材層で接合された接合体を得る接合工程と、を有する。 A method for manufacturing a circuit board according to one embodiment includes a preparation step of preparing one or more metal plates each having a recess formed in its main surface and the recess provided inside the outer edge of the main surface; A coating and drying step in which a brazing material is applied and dried on the main surface of a ceramic plate to form one or more coating layers, and a ceramic plate and one or more metal plates are sandwiched between the one or more coating layers. a laminating step of laminating to produce a laminate; a joining step of heating the laminate to obtain a joined body in which a ceramic plate and one or more metal plates are joined with one or more brazing metal layers; has.
 各工程の詳細について説明する。まず、主面の外縁よりも内側に凹部が形成されている一つ又は複数の金属板を準備する。金属板は例えば銅板であってよい。凹部は、例えば、マシニングセンタを用いた機械加工で形成することができる。凹部の形状、位置(例えば、長さY)、サイズ(例えば、幅X及び深さZ)及び投影面積は、上述したとおりであってよい。凹部のサイズは切削量を変えることで調整することができる。凹部は、金属板の主面の外縁の一部に沿って形成してもよいし、金属板の主面の中心を周回するように形成してもよい。 The details of each process will be explained. First, one or more metal plates each having a concave portion formed inside the outer edge of its main surface are prepared. The metal plate may be a copper plate, for example. The recessed portion can be formed, for example, by machining using a machining center. The shape, position (for example, length Y), size (for example, width X and depth Z), and projected area of the recess may be as described above. The size of the recess can be adjusted by changing the amount of cutting. The recess may be formed along a part of the outer edge of the main surface of the metal plate, or may be formed so as to go around the center of the main surface of the metal plate.
 塗布乾燥工程で用いるセラミック板は、例えば以下の手順で作製できる。まず、無機化合物の粉末、バインダ樹脂、焼結助剤、可塑剤、分散剤、及び溶媒等を含むスラリーを成形してグリーンシートを作製する。無機化合物の例としては、窒化アルミニウム(AlN)、窒化ケイ素(Si)、炭化ケイ素、及び酸化アルミニウム等が挙げられる。焼結助剤としては、希土類金属、アルカリ土類金属、金属酸化物、フッ化物、塩化物、硝酸塩、及び硫酸塩等が挙げられる。これらは一種のみ用いてもよいし二種以上を併用してもよい。焼結助剤を用いることにより、無機化合物粉末の焼結を促進させることができる。バインダ樹脂の例としては、メチルセルロース、エチルセルロース、ポリビニルアルコール、ポリビニルブチラール、及び(メタ)アクリル系樹脂等が挙げられる。 The ceramic plate used in the coating and drying process can be produced, for example, by the following procedure. First, a green sheet is produced by molding a slurry containing an inorganic compound powder, a binder resin, a sintering aid, a plasticizer, a dispersant, a solvent, and the like. Examples of inorganic compounds include aluminum nitride (AlN), silicon nitride (Si 3 N 4 ), silicon carbide, and aluminum oxide. Sintering aids include rare earth metals, alkaline earth metals, metal oxides, fluorides, chlorides, nitrates, sulfates, and the like. These may be used alone or in combination of two or more. By using a sintering aid, sintering of the inorganic compound powder can be promoted. Examples of binder resins include methyl cellulose, ethyl cellulose, polyvinyl alcohol, polyvinyl butyral, and (meth)acrylic resins.
 可塑剤の例としては、精製グリセリン、グリセリントリオレート、ジエチレングリコール、ジ-n-ブチルフタレート等のフタル酸系可塑剤、セバシン酸ジ-2-エチルヘキシル等の二塩基酸系可塑剤等が挙げられる。分散剤の例としては、ポリ(メタ)アクリル酸塩、及び(メタ)アクリル酸-マレイン酸塩コポリマーが挙げられる。溶媒の例としては、エタノール及びトルエン等の有機溶媒が挙げられる。 Examples of plasticizers include purified glycerin, glycerin triolate, diethylene glycol, phthalic acid plasticizers such as di-n-butyl phthalate, and dibasic acid plasticizers such as di-2-ethylhexyl sebacate. Examples of dispersants include poly(meth)acrylates and (meth)acrylic acid-maleate copolymers. Examples of solvents include organic solvents such as ethanol and toluene.
 スラリーからグリーンシートを形成する方法の例としては、ドクターブレード法及び押出成形法が挙げられる。次に、成形して得られたグリーンシートを脱脂して焼成する。脱脂は、例えば、400~800℃で、0.5~20時間加熱して行ってよい。これによって、無機化合物の酸化及び劣化を抑制しつつ、有機物(炭素)の残留量を低減することができる。焼結は、例えば、窒素、アルゴン、アンモニア又は水素等の非酸化性ガス雰囲気下、1700~1900℃に加熱して行う。これによって、例えばセラミック板10を得ることができる。必要に応じてセラミック板のレーザー加工を行い、端部を切断したり、スクライブラインを設けたりしてもよい。 Examples of methods for forming green sheets from slurry include a doctor blade method and an extrusion method. Next, the green sheet obtained by molding is degreased and fired. Degreasing may be performed, for example, by heating at 400 to 800°C for 0.5 to 20 hours. Thereby, the amount of residual organic matter (carbon) can be reduced while suppressing oxidation and deterioration of inorganic compounds. Sintering is performed, for example, by heating to 1700 to 1900° C. in a non-oxidizing gas atmosphere such as nitrogen, argon, ammonia, or hydrogen. In this way, for example, a ceramic plate 10 can be obtained. If necessary, the ceramic plate may be laser-processed to cut the edges or provide scribe lines.
 上述の脱脂及び焼結は、例えばグリーンシートを複数積層した状態で行ってもよい。積層して脱脂及び焼結を行う場合、焼成後の基材の分離を円滑にするため、グリーンシート間に離型剤による離型層を設けてよい。離型剤としては、例えば、窒化ホウ素(BN)を用いることができる。離型層は、例えば、窒化ホウ素の粉末のスラリーを、スプレー、ブラシ、ロールコート、又はスクリーン印刷等の方法により塗布して形成してよい。積層するグリーンシートの枚数は、セラミック板の量産を効率的に行いつつ、脱脂を十分に進行させる観点から、例えば8~100枚であってよく、30~70枚であってもよい。 The above-mentioned degreasing and sintering may be performed, for example, with a plurality of green sheets laminated. When degreasing and sintering the green sheets, a release layer made of a release agent may be provided between the green sheets in order to facilitate separation of the base materials after firing. As the mold release agent, for example, boron nitride (BN) can be used. The release layer may be formed, for example, by applying a slurry of boron nitride powder by spraying, brushing, roll coating, screen printing, or the like. The number of green sheets to be laminated may be, for example, 8 to 100, or 30 to 70, from the viewpoint of efficient mass production of ceramic plates and sufficient degreasing.
 セラミック板の一方の主面に複数の金属板を接合する場合、当該一方の主面に区画線を形成してもよい。例えば、セラミック板の主面にレーザー光を照射して、区画線としてスクライブラインを設けてもよい。セラミックの主面に照射するレーザー光としては、例えば、炭酸ガスレーザー及びYAGレーザー等が挙げられる。このようなレーザー源からレーザー光を間欠的に照射することによって、図1及び図2に示すような区画線L1,L2となるスクライブラインを形成する。このような区画線L1,L2は、後工程において、回路基板を分割する際の切断線として利用することができる。 When joining a plurality of metal plates to one main surface of a ceramic plate, a partition line may be formed on the one main surface. For example, a scribe line may be provided as a partition line by irradiating the main surface of the ceramic plate with a laser beam. Examples of the laser beam irradiated onto the main surface of the ceramic include a carbon dioxide laser and a YAG laser. By intermittently irradiating laser light from such a laser source, scribe lines that become the division lines L1 and L2 as shown in FIGS. 1 and 2 are formed. Such partition lines L1 and L2 can be used as cutting lines when dividing the circuit board in a subsequent process.
 セラミック板の主面に塗布するろう材は、例えば、銀、銅、錫、活性金属、及びこれらを構成元素とする金属化合物、有機溶媒、並びにバインダ等を含有する。ろう材の粘度は、例えば5~20Pa・sであってよい。ろう材における有機溶媒の含有量は、例えば、5~25質量%、バインダ量の含有量は、例えば、2~15質量%であってよい。 The brazing material applied to the main surface of the ceramic plate contains, for example, silver, copper, tin, active metals, metal compounds containing these as constituent elements, organic solvents, binders, and the like. The viscosity of the brazing filler metal may be, for example, 5 to 20 Pa·s. The organic solvent content in the brazing filler metal may be, for example, 5 to 25% by mass, and the binder content may be, for example, 2 to 15% by mass.
 ろう材は、金属単体又は金属化合物(合金)の形態で、Agを含んでよく、Agに加えて、Cu、Sn、及び活性金属からなる群より選ばれる一種又は二種以上の金属を含有してよい。二種以上の金属は合金となっていてもよい。活性金属は、Ti、Hf、Zr、及びNbからなる群より選ばれる一種又は二種以上を含んでいてよい。ろう材は、Ag及びCuの合計100質量部に対してAgの含有量が93質量部以上であってよく、95質量部以上であってよく、97質量部以上であってよく、100質量部であってもよい。このため、溶融したろう材は、金属板に含まれるCuと円滑に反応して共晶合金を形成する。したがって、金属板の凹部内にもろう材層が円滑に形成される。ろう材はCuを含有していなくてもよい。 The brazing filler metal may contain Ag in the form of a single metal or a metal compound (alloy), and in addition to Ag, it may contain one or more metals selected from the group consisting of Cu, Sn, and active metals. It's fine. Two or more metals may be an alloy. The active metal may include one or more selected from the group consisting of Ti, Hf, Zr, and Nb. The content of Ag in the brazing filler metal may be 93 parts by mass or more, 95 parts by mass or more, 97 parts by mass or more, and 100 parts by mass based on a total of 100 parts by mass of Ag and Cu. It may be. Therefore, the molten brazing filler metal smoothly reacts with Cu contained in the metal plate to form a eutectic alloy. Therefore, the brazing material layer is smoothly formed even within the recessed portion of the metal plate. The brazing filler metal does not need to contain Cu.
 ろう材における活性金属の含有量は、Ag及びCuの合計100質量部に対して、0.5~8質量部であってよい。活性金属の含有量を0.5質量部以上とすることで、セラミック板とろう材との接合性を向上することができる。一方、活性金属の含有量を8質量部以下とすることで、接合界面に脆弱な合金層が形成されることを抑制できる。 The content of active metal in the brazing material may be 0.5 to 8 parts by mass based on 100 parts by mass of Ag and Cu in total. By setting the content of the active metal to 0.5 parts by mass or more, the bondability between the ceramic plate and the brazing material can be improved. On the other hand, by setting the content of the active metal to 8 parts by mass or less, formation of a fragile alloy layer at the bonding interface can be suppressed.
 ろう材に含有される上記金属は、窒化物、酸化物、炭化物又は水素化物として含まれていてもよい。一例として、ろう材は、窒化チタン及び/又は水素化チタン(TiH)を含んでいてよい。これによって、セラミック板と金属板との接合強度を十分に高くすることができる。AgとCuの合計100質量部に対するTiHの含有量は例えば1~8質量部であってよい。 The metal contained in the brazing filler metal may be contained as a nitride, oxide, carbide, or hydride. As an example, the brazing material may include titanium nitride and/or titanium hydride ( TiH2 ). This makes it possible to sufficiently increase the bonding strength between the ceramic plate and the metal plate. The content of TiH 2 may be, for example, 1 to 8 parts by weight based on 100 parts by weight of Ag and Cu in total.
 ろう材における錫の含有量は、Ag及びCuの合計100質量部に対して、0.5~5質量部であってよい。錫の含有量を0.5質量部以上とすることで、セラミック板とろう材との接合性を向上することができる。一方、錫の含有量を5質量部以下とすることで、接合界面に脆弱な合金層が形成されることを抑制できる。 The content of tin in the brazing filler metal may be 0.5 to 5 parts by mass based on 100 parts by mass of Ag and Cu in total. By setting the tin content to 0.5 parts by mass or more, the bondability between the ceramic plate and the brazing material can be improved. On the other hand, by setting the tin content to 5 parts by mass or less, formation of a fragile alloy layer at the bonding interface can be suppressed.
 セラミック板の主面に、ロールコーター法、スクリーン印刷法、又は転写法等の方法によってろう材を塗布及び乾燥して一つ又は複数の塗布層を設ける。塗布層は、金属板が接合される位置に設ければよい。したがって、塗布層の数は、セラミック板に接合される金属板の数と同じであってよい。 One or more coating layers are provided on the main surface of the ceramic plate by applying and drying a brazing material by a method such as a roll coater method, screen printing method, or transfer method. The coating layer may be provided at a position where the metal plates are to be joined. Therefore, the number of coated layers may be the same as the number of metal plates bonded to the ceramic plate.
 塗布層を形成したら、塗布層を挟むようにしてセラミック板と金属板とを積層して積層体を作製する。このとき、金属板の2つの主面のうち、凹部が形成されている主面とセラミック板の主面とが対向するようにして積層する。積層体を作製する際に、金属板をセラミック板に向かう方向に押圧してもよい。押圧に伴って、塗布層が拡がるとともに凹部にろう材が充填され、塗布層でセラミック板と金属板とが良好に接着された積層体が得られる。 Once the coating layer is formed, a ceramic plate and a metal plate are laminated with the coating layer sandwiched between them to produce a laminate. At this time, of the two main surfaces of the metal plates, the main surface on which the recess is formed and the main surface of the ceramic plate are stacked so that they face each other. When producing the laminate, the metal plate may be pressed in the direction toward the ceramic plate. With the pressing, the coating layer spreads and the recesses are filled with the brazing material, resulting in a laminate in which the ceramic plate and the metal plate are well bonded by the coating layer.
 図1~図3に示すような回路基板100を製造する場合、複数の金属板20のそれぞれがセラミック板10の主面10Aにおける区画線L1,L2で画定される区画領域50毎に独立するように、複数の金属板20を積層して積層体を作製する。 When manufacturing the circuit board 100 as shown in FIGS. 1 to 3, each of the plurality of metal plates 20 is arranged independently for each partition area 50 defined by partition lines L1 and L2 on the main surface 10A of the ceramic plate 10. Next, a plurality of metal plates 20 are laminated to produce a laminate.
 得られた積層体を、加熱炉で加熱してセラミック板と金属板とがろう材層で接合された接合体を得る。加熱温度は例えば700~900℃であってよい。炉内の雰囲気は窒素等の不活性ガスであってよく、大気圧未満の減圧下で行ってもよいし、真空下で行ってもよい。加熱炉は、複数の接合体を連続的に製造する連続式のものであってもよいし、一つ又は複数の接合体をバッチ式で製造するものであってもよい。加熱は、接合体を上記積層体の積層方向に押圧しながら行ってもよい。 The obtained laminate is heated in a heating furnace to obtain a joined body in which the ceramic plate and the metal plate are joined with a brazing material layer. The heating temperature may be, for example, 700 to 900°C. The atmosphere in the furnace may be an inert gas such as nitrogen, and the reaction may be performed under reduced pressure below atmospheric pressure or under vacuum. The heating furnace may be of a continuous type that continuously manufactures a plurality of joined bodies, or may be one that manufactures one or more joined bodies in a batch manner. Heating may be performed while pressing the joined body in the stacking direction of the laminate.
 積層体を加熱すると、塗布層に含まれるろう材は流動しつつ金属板と反応し、ろう材層が形成される。すなわち、ろう材層は、ろう材と金属板に含まれる金属成分との反応生成物を含んでよい。このとき、凹部に充填されているろう材も反応してろう材層の一部となってよい。その後、金属板にめっき膜を形成する等の表面処理を行う。このとき、ろう材層の形状を整える切削加工等を行ってもよい。このようにして、回路基板を製造することができる。 When the laminate is heated, the brazing material contained in the coating layer flows and reacts with the metal plate, forming a brazing material layer. That is, the brazing material layer may include a reaction product between the brazing material and a metal component contained in the metal plate. At this time, the brazing material filled in the recess may also react and become part of the brazing material layer. After that, surface treatment such as forming a plating film on the metal plate is performed. At this time, cutting or the like may be performed to adjust the shape of the brazing material layer. In this way, a circuit board can be manufactured.
 接合体が、図1~図3に示すようにセラミック板の一方の主面に複数の金属板を備える集合基板である場合、集合基板を分割して個片化する分割工程を行ってもよい。分割工程では、区画線L1,L2に沿って集合基板を分割し、複数の回路基板を得ることができる。 If the bonded body is an aggregate substrate including a plurality of metal plates on one main surface of a ceramic plate as shown in FIGS. 1 to 3, a dividing step may be performed in which the aggregate substrate is divided into individual pieces. . In the dividing step, the collective board can be divided along the division lines L1 and L2 to obtain a plurality of circuit boards.
 上述の製造方法は、予め所定のサイズに加工された複数の金属板を接合して接合体を得ることができる。このような製造方法(搭載法)によれば、レジスト印刷工程及び金属板のエッチング工程を行うことなく、這い上がりが十分に抑制されるとともに接合信頼性に優れる回路基板を効率よく製造することができる。このような製造方法で得られる回路基板は、製造コストが低減できるうえに、外観及び半導体素子等の外部回路との接続信頼性に優れる。また、這い上がったろう材を除去する工程を省略できるため、生産効率にも優れる。ただし、上述の回路基板100,101及びこれらの変形例の製造方法は、上述の製造方法に限定されない。 In the above manufacturing method, a joined body can be obtained by joining a plurality of metal plates that have been previously processed to a predetermined size. According to this manufacturing method (mounting method), it is possible to efficiently manufacture a circuit board that sufficiently suppresses creeping up and has excellent bonding reliability without performing a resist printing process or a metal plate etching process. can. The circuit board obtained by such a manufacturing method can reduce manufacturing costs and has excellent appearance and connection reliability with external circuits such as semiconductor elements. Furthermore, since the step of removing the brazing filler metal that has climbed up can be omitted, production efficiency is also excellent. However, the manufacturing method of the circuit boards 100, 101 and their modifications described above is not limited to the manufacturing method described above.
 このようにして得られた回路基板を用いて、パワーモジュールを製造してもよい。パワーモジュールは、回路基板に、ハンダとワイヤボンディング等を用いて半導体素子を搭載し、回路基板及び半導体素子を筐体の収容空間内に収容したうえで樹脂封止を行って製造することができる。 A power module may be manufactured using the circuit board obtained in this way. A power module can be manufactured by mounting a semiconductor element on a circuit board using solder and wire bonding, etc., housing the circuit board and semiconductor element in a housing space of a housing, and then sealing it with resin. .
 以上、本開示の実施形態を説明したが、本開示は上記実施形態に何ら限定されるものではない。例えば、図1~図3の例では、セラミック板の一対の主面のそれぞれに複数の金属板を備えていたが、これに限定されない。例えば、一つ又は複数の金属板がセラミック板の一方の主面にのみ設けられていてもよい。セラミック板の一対の主面のそれぞれに設けられるろう材層及び金属板(凹部)の構造及び形状は、互いに異なっていてもよい。また、セラミック板の一対の主面のそれぞれに一つの金属板が設けられていてもよい。 Although the embodiments of the present disclosure have been described above, the present disclosure is not limited to the above embodiments. For example, in the examples shown in FIGS. 1 to 3, a plurality of metal plates are provided on each of the pair of main surfaces of the ceramic plate, but the present invention is not limited thereto. For example, one or more metal plates may be provided on only one main surface of the ceramic plate. The structure and shape of the brazing material layer and the metal plate (recess) provided on each of the pair of main surfaces of the ceramic plate may be different from each other. Further, one metal plate may be provided on each of the pair of main surfaces of the ceramic plate.
[1]セラミック板と、金属板と、前記セラミック板と前記金属板とを接合するろう材層と、を備える回路基板であって、
 前記金属板の前記セラミック板と接合される主面に凹部が形成されており、
 前記凹部は前記主面の外縁よりも内側に設けられている、回路基板。
[2]前記凹部は、前記主面の中心よりも前記外縁に近接している、[1]に記載の回路基板。
[3]前記凹部は、前記金属板の前記主面の前記外縁に沿って、前記金属板の前記主面の中心を周回するように設けられている、[1]又は[2]に記載の回路基板。
[4]前記凹部は、前記金属板の内部から前記セラミック板に近接するにつれて幅が大きくなる拡張部を有する、[1]~[3]のいずれか一つに記載の回路基板。
[5]前記凹部の全体に前記ろう材層を構成する成分が充填されている、[1]~[4]のいずれか一つに記載の回路基板。
[6]前記金属板の前記凹部の幅Xが0.1~1mmである、[1]~[5]のいずれか一つに記載の回路基板。
[7]前記金属板の前記凹部の深さZが0.05~0.6mmである、[1]~[6]のいずれか一つに記載の回路基板。
[8]前記セラミック板と、複数の金属板と、前記セラミック板と前記複数の金属板のそれぞれとを接合する複数のろう材層と、を備え、
 前記複数の金属板が、前記凹部が形成されている前記金属板を含む、[1]~[7]のいずれか一つに記載の回路基板。
[9]主面に凹部が形成され、当該凹部が当該主面の外縁よりも内側に設けられている一つ又は複数の金属板を準備する準備工程と、
 セラミック板の主面にろう材を塗布及び乾燥して一つ又は複数の塗布層を設ける塗布乾燥工程と、
 前記一つ又は複数の塗布層を挟むようにして前記セラミック板と前記一つ又は複数の金属板とを積層して積層体を作製する積層工程と、
 前記積層体を加熱して前記セラミック板と前記一つ又は複数の金属板とが一つ又は複数のろう材層で接合された接合体を得る接合工程と、を有し、
 前記積層工程において、前記一つ又は複数の金属板の前記主面と前記セラミック板の前記主面とが対向するように前記セラミック板と前記一つ又は複数の金属板とを積層する、回路基板の製造方法。
[10]前記準備工程では前記凹部が形成されている複数の金属板を準備し、
 前記積層工程では、前記複数の金属板のそれぞれが前記セラミック板の前記主面における区画線で画定される区画領域毎に独立するように前記複数の金属板を積層して前記積層体を作製し、
 前記接合工程の後に、前記接合体における前記セラミック板を前記区画線に沿って分割する分割工程を有する、[9]に記載の回路基板の製造方法。
[11]前記[1]~[8]のいずれか一つに記載の回路基板、又は前記[9]又は[10]に記載の製造方法で得られる回路基板と、当該回路基板の前記金属板に電気的に接続される半導体素子と、を備えるパワーモジュール。
[1] A circuit board comprising a ceramic plate, a metal plate, and a brazing material layer that joins the ceramic plate and the metal plate,
A recess is formed on the main surface of the metal plate to be joined to the ceramic plate,
The circuit board, wherein the recess is provided inside an outer edge of the main surface.
[2] The circuit board according to [1], wherein the recess is closer to the outer edge than to the center of the main surface.
[3] The recess according to [1] or [2], wherein the recess is provided along the outer edge of the main surface of the metal plate so as to go around the center of the main surface of the metal plate. circuit board.
[4] The circuit board according to any one of [1] to [3], wherein the recess has an expanded portion whose width increases as it approaches the ceramic plate from the inside of the metal plate.
[5] The circuit board according to any one of [1] to [4], wherein the entire recess is filled with a component constituting the brazing material layer.
[6] The circuit board according to any one of [1] to [5], wherein the width X of the recessed portion of the metal plate is 0.1 to 1 mm.
[7] The circuit board according to any one of [1] to [6], wherein the depth Z of the recessed portion of the metal plate is 0.05 to 0.6 mm.
[8] Comprising the ceramic plate, a plurality of metal plates, and a plurality of brazing filler metal layers bonding the ceramic plate and each of the plurality of metal plates,
The circuit board according to any one of [1] to [7], wherein the plurality of metal plates include the metal plate in which the recess is formed.
[9] A preparation step of preparing one or more metal plates in which a recess is formed in the main surface, and the recess is provided inside the outer edge of the main surface;
a coating and drying step of applying and drying a brazing material on the main surface of the ceramic plate to form one or more coating layers;
a laminating step of laminating the ceramic plate and the one or more metal plates so as to sandwich the one or more coating layers to produce a laminate;
a joining step of heating the laminate to obtain a joined body in which the ceramic plate and the one or more metal plates are joined with one or more brazing metal layers,
In the lamination step, the ceramic plate and the one or more metal plates are laminated so that the main surface of the one or more metal plates and the main surface of the ceramic plate face each other, a circuit board. manufacturing method.
[10] In the preparation step, a plurality of metal plates in which the recesses are formed are prepared,
In the laminating step, the laminated body is produced by laminating the plurality of metal plates such that each of the plurality of metal plates is independent for each partition area defined by a partition line on the main surface of the ceramic plate. ,
The method for manufacturing a circuit board according to [9], further comprising a dividing step of dividing the ceramic plate in the joined body along the division line after the joining step.
[11] The circuit board according to any one of [1] to [8] above, or the circuit board obtained by the manufacturing method according to [9] or [10] above, and the metal plate of the circuit board. A power module comprising: a semiconductor element electrically connected to the semiconductor element;
 実施例を参照して本開示の内容をより詳細に説明するが、本開示は下記の実施例に限定されるものではない。 The contents of the present disclosure will be described in more detail with reference to Examples, but the present disclosure is not limited to the following Examples.
(実施例1)
[回路基板の作製]
 窒化ケイ素製のセラミック板(厚さ:0.32mm)、24枚の銅板(材質:無酸素銅、サイズ:縦×横×厚さ=17mm×38mm×0.8mm)及びろう材を準備した。機械加工によって、各銅板の一方の主面(主面20B)に凹部を形成した。この凹部は、図2及び図3に示すように、主面の外縁よりも内側において、外縁に沿って主面の中心を周回するように形成した。凹部は、銅板の主面の中心よりも外縁に近接していた。銅板の厚さ方向に断面で見たときに、凹部が図3及び図4に示すようなV字形状となるように加工した。これによって、図1~図4に示す金属板20と同様の形状を有する銅板を得た。
(Example 1)
[Preparation of circuit board]
A silicon nitride ceramic plate (thickness: 0.32 mm), 24 copper plates (material: oxygen-free copper, size: length x width x thickness = 17 mm x 38 mm x 0.8 mm), and a brazing filler metal were prepared. A recess was formed on one main surface (main surface 20B) of each copper plate by machining. As shown in FIGS. 2 and 3, this recess was formed inside the outer edge of the main surface so as to go around the center of the main surface along the outer edge. The recess was closer to the outer edge of the main surface of the copper plate than to the center. When viewed in cross section in the thickness direction of the copper plate, the recesses were processed to have a V-shape as shown in FIGS. 3 and 4. As a result, a copper plate having a shape similar to that of the metal plate 20 shown in FIGS. 1 to 4 was obtained.
 Ag、Sn、及びTiHを含むろう材を準備した。このろう材は、Ag及びCuの合計100質量部に対してAgを100質量部含んでいた。すなわち、Cuを含まないろう材を用いた。このろう材は、Ag100質量に対し、Snを3質量部、及びTiHを3.5質量部含んでいた。 A brazing filler metal containing Ag, Sn, and TiH 2 was prepared. This brazing filler metal contained 100 parts by mass of Ag based on a total of 100 parts by mass of Ag and Cu. That is, a brazing filler metal that does not contain Cu was used. This brazing filler metal contained 3 parts by mass of Sn and 3.5 parts by mass of TiH 2 based on 100 parts by mass of Ag.
 セラミック板の主面をスクライブラインによって24個の区画領域に区画した。各区画領域に、スクリーン印刷でろう材を塗布して塗布層を形成した。塗布層の塗布面積は、セラミック板と接合される銅板の主面の面積と同じとした。塗布層を形成した後、セラミック板の上に、塗布層と銅板の当該主面とが接するようにして銅板を積層した。このようにして、セラミック板の一方の主面に、区画領域毎に独立するように合計で24個の銅板を積層した。 The main surface of the ceramic plate was divided into 24 divided areas by scribe lines. A brazing material was applied to each divided area by screen printing to form a coating layer. The coating area of the coating layer was the same as the area of the main surface of the copper plate to be bonded to the ceramic plate. After forming the coating layer, a copper plate was laminated on the ceramic plate so that the coating layer and the main surface of the copper plate were in contact with each other. In this way, a total of 24 copper plates were laminated on one main surface of the ceramic plate so as to be independent for each divided area.
 セラミック板の主面上の銅板をセラミック板に向けて0.035MPaでプレスして積層体を得た。その後、積層体を、真空中、820℃で1時間加熱した。このようにしてセラミック板の主面にろう材層を介して銅板が接合された接合体を得た。その後、Ni-Pめっき液(リン濃度:8~12質量%)を用いて無電解メッキ処理を行い、銅板上にめっき膜を有する多数個取り回路基板を形成した。スクライブラインに沿って多数個取り回路基板を分割し、24個の回路基板を得た。一つの回路基板のセラミック板のサイズは、縦×横×厚さ=20mm×41mm×0.32mmであった。 A laminate was obtained by pressing the copper plate on the main surface of the ceramic plate toward the ceramic plate at 0.035 MPa. Thereafter, the laminate was heated at 820° C. for 1 hour in vacuum. In this way, a joined body was obtained in which the copper plate was joined to the main surface of the ceramic plate via the brazing material layer. Thereafter, electroless plating was performed using a Ni--P plating solution (phosphorus concentration: 8 to 12% by mass) to form a multi-chip circuit board having a plating film on the copper plate. The multi-chip circuit board was divided along the scribe line to obtain 24 circuit boards. The size of the ceramic plate of one circuit board was length x width x thickness = 20 mm x 41 mm x 0.32 mm.
[回路基板の評価]
<這い上がりの評価>
 回路基板における銅板の表面(セラミック板側の主面とは反対側の主面)、及び側面を、ルーペ(倍率10倍)を使用して目視観察を行い、ろう材の這い上がりの有無を判定した。銅板の表面に這い上がりが検知されなかったものを「A」、銅板の表面に這い上がりが検知されたものを「B」と判定した。24個の回路基板のうち、「A」の個数とその割合は表1に示すとおりであった。実施例1の回路基板では、銅板の表面においてろう材の這い上がりが全く検知されなかった。
[Evaluation of circuit board]
<Evaluation of creeping up>
Visually observe the surface of the copper plate (the main surface opposite to the main surface on the ceramic board side) and side surfaces of the circuit board using a magnifying glass (10x magnification) to determine whether or not the brazing filler metal has crawled up. did. A sample in which no creeping was detected on the surface of the copper plate was graded as "A", and a sample in which creeping was detected on the surface of the copper plate was graded as "B". Among the 24 circuit boards, the number and proportion of "A" were as shown in Table 1. In the circuit board of Example 1, no creeping up of the brazing material was detected on the surface of the copper plate.
<凹部のサイズ及び位置の測定>
 銅板の側面における凹部の端縁に直交し、且つ銅板の厚さ方向に沿うように回路基板を切断し、図4に示すような断面を得た。この断面のSEM観察を行って、凹部の幅X及び深さZを測定した。また、凹部22の外縁22bと銅板の側面20Cの間の長さYを測定した。図6は、当該断面のSEM写真である。幅X、深さZ及び長さYの測定結果、及び凹部の投影面積(X×Z/2)は、表1に示すとおりであった。測定は、1個の回路基板についてのみ行った。なお、24個の銅板は、いずれも、同じ機械加工の条件で加工した。このため、凹部の幅X及び深さZ、並びに長さYの値は同一とみなすことができる。
<Measurement of recess size and position>
The circuit board was cut perpendicular to the edge of the recess on the side surface of the copper plate and along the thickness direction of the copper plate to obtain a cross section as shown in FIG. SEM observation of this cross section was performed to measure the width X and depth Z of the recess. Furthermore, the length Y between the outer edge 22b of the recess 22 and the side surface 20C of the copper plate was measured. FIG. 6 is a SEM photograph of the cross section. The measurement results of width X, depth Z, and length Y, and the projected area of the recess (X×Z/2) were as shown in Table 1. The measurements were performed on only one circuit board. Note that all 24 copper plates were processed under the same machining conditions. Therefore, the values of the width X, depth Z, and length Y of the recess can be considered to be the same.
(実施例2)
 Ag、Cu、Sn、及びTiHを含むろう材を準備した。ろう材におけるAgとCuの質量比は69:31であった。このろう材は、AgとCuの合計100質量に対し、Snを3質量部、及びTiHを3.5質量部含んでいた。このようなろう材を用いたこと以外は、実施例1と同様にして、回路基板を作製して評価を行った。結果は、表1に示すとおりであった。実施例2の回路基板も、銅板の表面においてろう材の這い上がりが全く検知されなかった。
(Example 2)
A brazing filler metal containing Ag, Cu, Sn, and TiH2 was prepared. The mass ratio of Ag to Cu in the brazing filler metal was 69:31. This brazing filler metal contained 3 parts by mass of Sn and 3.5 parts by mass of TiH 2 based on 100 parts by mass of Ag and Cu in total. A circuit board was produced and evaluated in the same manner as in Example 1 except that such a brazing material was used. The results were as shown in Table 1. Also in the circuit board of Example 2, no creeping up of the brazing material was detected on the surface of the copper plate.
(比較例1)
 各銅板の一方の主面(主面20B)に凹部を形成しなかったこと以外は、実施例1と同様にして、回路基板を作製して評価を行った。結果は、表1に示すとおりであった。
(Comparative example 1)
A circuit board was produced and evaluated in the same manner as in Example 1, except that no recess was formed on one main surface (main surface 20B) of each copper plate. The results were as shown in Table 1.
(比較例2)
 各銅板の一方の主面(主面20B)に凹部を形成しなかったこと以外は、実施例2と同様にして、回路基板を作製して評価を行った。結果は、表1に示すとおりであった。
(Comparative example 2)
A circuit board was produced and evaluated in the same manner as in Example 2, except that no recess was formed on one main surface (main surface 20B) of each copper plate. The results were as shown in Table 1.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 表1に示すとおり、実施例1,2では、金属板(銅板)の主面に凹部を形成することによって、ろう材の這い上がりを十分に抑制できることが確認された。 As shown in Table 1, in Examples 1 and 2, it was confirmed that by forming a recess on the main surface of the metal plate (copper plate), creeping up of the brazing material could be sufficiently suppressed.
 ろう材の這い上がりを十分に抑制することが可能な回路基板及びその製造方法を提供することができる。また、そのような回路基板を備えるパワーモジュールを提供することができる。 It is possible to provide a circuit board and a method for manufacturing the same that can sufficiently suppress creeping up of the brazing material. Furthermore, a power module including such a circuit board can be provided.
 10…セラミック板、10A,10B…主面、20,20a,21…金属板、20A,20B…主面、20b,22b…外縁、20C…側面、22…凹部、22A…拡張部、22c…内縁、30…ろう材層、50…区画領域、60…半導体素子、61,62,65…ハンダ、63…電極、64…金属ワイヤ、66…筐体、70…ベース板、72…冷却フィン、73…ネジ、74…グリース、80…樹脂、100,101…回路基板、300…パワーモジュール、L1,L2…区画線。 DESCRIPTION OF SYMBOLS 10... Ceramic plate, 10A, 10B... Main surface, 20, 20a, 21... Metal plate, 20A, 20B... Main surface, 20b, 22b... Outer edge, 20C... Side surface, 22... Recessed part, 22A... Extension part, 22c... Inner edge , 30... Brazing material layer, 50... Division area, 60... Semiconductor element, 61, 62, 65... Solder, 63... Electrode, 64... Metal wire, 66... Housing, 70... Base plate, 72... Cooling fin, 73 ...screw, 74...grease, 80...resin, 100, 101...circuit board, 300...power module, L1, L2...compartment line.

Claims (11)

  1.  セラミック板と、金属板と、前記セラミック板と前記金属板とを接合するろう材層と、を備える回路基板であって、
     前記金属板の前記セラミック板と接合される主面に凹部が形成されており、
     前記凹部は前記主面の外縁よりも内側に設けられている、回路基板。
    A circuit board comprising a ceramic plate, a metal plate, and a brazing material layer for joining the ceramic plate and the metal plate,
    A recess is formed on the main surface of the metal plate to be joined to the ceramic plate,
    The circuit board, wherein the recess is provided inside an outer edge of the main surface.
  2.  前記凹部は、前記主面の中心よりも前記外縁に近接している、請求項1に記載の回路基板。 The circuit board according to claim 1, wherein the recess is closer to the outer edge than to the center of the main surface.
  3.  前記凹部は、前記金属板の前記主面の前記外縁に沿って、前記金属板の前記主面の中心を周回するように設けられている、請求項1に記載の回路基板。 The circuit board according to claim 1, wherein the recess is provided along the outer edge of the main surface of the metal plate so as to go around the center of the main surface of the metal plate.
  4.  前記凹部は、前記金属板の内部から前記セラミック板に近接するにつれて幅が大きくなる拡張部を有する、請求項1に記載の回路基板。 The circuit board according to claim 1, wherein the recess has an expanded portion whose width increases as it approaches the ceramic plate from the inside of the metal plate.
  5.  前記凹部の全体に前記ろう材層を構成する成分が充填されている、請求項1に記載の回路基板。 The circuit board according to claim 1, wherein the entire recess is filled with a component constituting the brazing material layer.
  6.  前記金属板の前記凹部の幅Xが0.1~1mmである、請求項1に記載の回路基板。 The circuit board according to claim 1, wherein the width X of the recessed portion of the metal plate is 0.1 to 1 mm.
  7.  前記金属板の前記凹部の深さZが0.05~0.6mmである、請求項1に記載の回路基板。 The circuit board according to claim 1, wherein the depth Z of the recessed portion of the metal plate is 0.05 to 0.6 mm.
  8.  前記セラミック板と、複数の金属板と、前記セラミック板と前記複数の金属板のそれぞれとを接合する複数のろう材層と、を備え、
     前記複数の金属板が、前記凹部が形成されている前記金属板を含む、請求項1に記載の回路基板。
    comprising the ceramic plate, a plurality of metal plates, and a plurality of brazing metal layers that join the ceramic plate and each of the plurality of metal plates,
    The circuit board according to claim 1, wherein the plurality of metal plates include the metal plate in which the recessed portion is formed.
  9.  主面に凹部が形成され、当該凹部が当該主面の外縁よりも内側に設けられている一つ又は複数の金属板を準備する準備工程と、
     セラミック板の主面にろう材を塗布及び乾燥して一つ又は複数の塗布層を設ける塗布乾燥工程と、
     前記一つ又は複数の塗布層を挟むようにして前記セラミック板と前記一つ又は複数の金属板とを積層して積層体を作製する積層工程と、
     前記積層体を加熱して前記セラミック板と前記一つ又は複数の金属板とが一つ又は複数のろう材層で接合された接合体を得る接合工程と、を有し、
     前記積層工程において、前記一つ又は複数の金属板の前記主面と前記セラミック板の前記主面とが対向するように前記セラミック板と前記一つ又は複数の金属板とを積層する、回路基板の製造方法。
    A preparation step of preparing one or more metal plates in which a recess is formed in the main surface, and the recess is provided inside the outer edge of the main surface;
    a coating and drying step of applying and drying a brazing material on the main surface of the ceramic plate to form one or more coating layers;
    a laminating step of laminating the ceramic plate and the one or more metal plates so as to sandwich the one or more coating layers to produce a laminate;
    a joining step of heating the laminate to obtain a joined body in which the ceramic plate and the one or more metal plates are joined with one or more brazing metal layers,
    In the lamination step, the ceramic plate and the one or more metal plates are laminated so that the main surface of the one or more metal plates and the main surface of the ceramic plate face each other, a circuit board. manufacturing method.
  10.  前記準備工程では前記凹部が形成されている複数の金属板を準備し、
     前記積層工程では、前記複数の金属板のそれぞれが前記セラミック板の前記主面における区画線で画定される区画領域毎に独立するように前記複数の金属板を積層して前記積層体を作製し、
     前記接合工程の後に、前記接合体における前記セラミック板を前記区画線に沿って分割する分割工程を有する、請求項9に記載の回路基板の製造方法。
    In the preparation step, a plurality of metal plates in which the recesses are formed are prepared,
    In the laminating step, the laminated body is produced by laminating the plurality of metal plates such that each of the plurality of metal plates is independent for each partition area defined by a partition line on the main surface of the ceramic plate. ,
    10. The method for manufacturing a circuit board according to claim 9, further comprising a dividing step of dividing the ceramic plate in the joined body along the division line after the joining step.
  11.  請求項1~8のいずれか一項に記載の回路基板と、当該回路基板の前記金属板に電気的に接続される半導体素子と、を備えるパワーモジュール。 A power module comprising the circuit board according to any one of claims 1 to 8, and a semiconductor element electrically connected to the metal plate of the circuit board.
PCT/JP2023/012009 2022-03-31 2023-03-24 Printed circuit board and manufacturing method therefor, and power module WO2023190253A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136290A (en) * 1991-11-11 1993-06-01 Toshiba Corp Ceramics circuit substrate
JP2007311527A (en) * 2006-05-18 2007-11-29 Mitsubishi Materials Corp Power module, substrate thereof, and manufacturing method thereof
JP2021150455A (en) * 2020-03-18 2021-09-27 三菱マテリアル株式会社 Temporary fixing method for metal member, manufacturing method for joint, and manufacturing method for insulated circuit board
JP2022000871A (en) * 2018-07-31 2022-01-04 京セラ株式会社 Electrical circuit board and power module

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05136290A (en) * 1991-11-11 1993-06-01 Toshiba Corp Ceramics circuit substrate
JP2007311527A (en) * 2006-05-18 2007-11-29 Mitsubishi Materials Corp Power module, substrate thereof, and manufacturing method thereof
JP2022000871A (en) * 2018-07-31 2022-01-04 京セラ株式会社 Electrical circuit board and power module
JP2021150455A (en) * 2020-03-18 2021-09-27 三菱マテリアル株式会社 Temporary fixing method for metal member, manufacturing method for joint, and manufacturing method for insulated circuit board

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