WO2023182379A1 - Phosphor sheet and lighting device - Google Patents

Phosphor sheet and lighting device Download PDF

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Publication number
WO2023182379A1
WO2023182379A1 PCT/JP2023/011316 JP2023011316W WO2023182379A1 WO 2023182379 A1 WO2023182379 A1 WO 2023182379A1 JP 2023011316 W JP2023011316 W JP 2023011316W WO 2023182379 A1 WO2023182379 A1 WO 2023182379A1
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Prior art keywords
phosphor
phosphor sheet
lighting device
particles
sheet
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PCT/JP2023/011316
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French (fr)
Japanese (ja)
Inventor
正宏 小西
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デンカ株式会社
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Publication of WO2023182379A1 publication Critical patent/WO2023182379A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02Use of particular materials as binders, particle coatings or suspension media therefor
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/59Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing silicon
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/64Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing aluminium
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/77Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing rare earth metals
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21VFUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V9/00Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
    • F21V9/30Elements containing photoluminescent material distinct from or spaced from the light source
    • F21V9/32Elements containing photoluminescent material distinct from or spaced from the light source characterised by the arrangement of the photoluminescent material
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21YINDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00Light-generating elements of semiconductor light sources
    • F21Y2115/10Light-emitting diodes [LED]

Definitions

  • the present invention relates to a phosphor sheet and a lighting device.
  • Example 2 of Patent Document 1 (i) a glass binder paint containing 30 vol% of phosphor was applied to the surface of a glass substrate to form a phosphor layer with a thickness of 200 ⁇ m; (ii) ) A mounting board for LED lighting was obtained by bonding multiple CSPs on the glass substrate; and (iii) when electricity was applied to the mounting board, there was no glare or glare even though the multiple CSPs were emitting light. It states that the problem of multiple shadows has been reduced.
  • CSP is an abbreviation for Chip Scale Package or Chip Size Package, which is an LED chip wrapped in phosphor resin, making it packageless with only the LED chip and phosphor resin.
  • Example 2 of Patent Document 1 a phosphor layer with a thickness of 200 ⁇ m is formed on a glass substrate using a “glass binder paint” containing a phosphor.
  • a sintering process at high temperatures is usually required. Therefore, with respect to Example 2 of Patent Document 1, there is room for improvement in terms of ease of providing the phosphor layer, etc.
  • the casing/substrate to which the glass binder paint is applied is subject to restrictions such as heat resistance and optimization of expansion coefficient.
  • forming a phosphor layer using "paint” has problems, such as the complexity of the process and the need to solve the problem of "dripping" of the paint.
  • the present invention has been made in view of these circumstances.
  • One of the objects of the present invention is to provide a material on which a phosphor layer can be formed by a simple process without using paint.
  • a phosphor sheet comprising a thermosetting resin composition in a B-stage state, including phosphor particles and a curable resin component, and having a thickness of 20 to 150 ⁇ m.
  • the phosphor sheet according to any one of The phosphor particles include phosphor particles that can convert blue light into light with a wavelength longer than the wavelength of the blue light. 6. 1. ⁇ 5. The phosphor sheet according to any one of A phosphor sheet in which the median diameter D50 of the phosphor particles is 1 ⁇ m or more and 20 ⁇ m or less. 7. 1. ⁇ 6. The phosphor sheet according to any one of A phosphor sheet in which two or more maxima are observed in the particle size distribution curve of the phosphor particles. 8. 1. ⁇ 7.
  • the phosphor sheet according to any one of In the particle size distribution curve of the phosphor particles a maximum is observed in both a particle size region of 1 ⁇ m or more and 6 ⁇ m or less and a particle size region of 10 ⁇ m or more and 25 ⁇ m or less. 9. 1. ⁇ 8.
  • the phosphor sheet according to any one of The phosphor particles include a CASN-based phosphor, a SCASN-based phosphor, a La 3 Si 6 N 11 -based phosphor, a Sr 2 Si 5 N 8 -based phosphor, a Ba 2 Si 5 N 8 -based phosphor, and an ⁇ -sialon-based phosphor.
  • a phosphor layer can be formed by a simple process without using paint.
  • FIG. 3 is a diagram for explaining an LED chip with a reflector and an LED chip without a reflector.
  • a description that does not indicate whether it is substituted or unsubstituted includes both those without a substituent and those with a substituent.
  • alkyl group includes not only an alkyl group without a substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • (meth)acrylic represents a concept that includes both acrylic and methacrylic. The same applies to similar expressions such as "(meth)acrylate”.
  • organic group as used herein means an atomic group obtained by removing one or more hydrogen atoms from an organic compound, unless otherwise specified.
  • a "monovalent organic group” refers to an atomic group obtained by removing one hydrogen atom from an arbitrary organic compound.
  • the phosphor sheet of this embodiment includes phosphor particles and a curable resin component, and is composed of a thermosetting resin composition in a B-stage state.
  • the thickness of the phosphor sheet of this embodiment is usually 20 to 150 ⁇ m, preferably 30 to 120 ⁇ m, and more preferably 35 to 100 ⁇ m.
  • the phosphor sheet of this embodiment is in a B-stage state (in other words, a semi-cured state), its fluidity at a temperature around room temperature has substantially disappeared, and it is in the form of a "sheet". can be kept. Since the phosphor sheet of this embodiment is in a B-stage state, it can be placed on a substrate as a sheet and then heated (preferably heated while applying pressure) to adhere sufficiently strongly to the substrate. , a phosphor layer can be provided. At this time, since there is no need to apply liquid paint, the phosphor layer can be formed using a simpler process than in the past.
  • the B-stage state includes a state before the C-stage state, that is, before complete curing.
  • the phosphor sheet of this embodiment Since the thickness of the phosphor sheet of this embodiment is 20 ⁇ m or more, the phosphor sheet contains a sufficient amount of phosphor particles, and the light conversion efficiency of the phosphor sheet can be sufficiently increased. Moreover, since the thickness of the phosphor sheet of this embodiment is 150 ⁇ m or less, the time required for thermosetting can be shortened. It is also preferable that the phosphor sheet is not too thick because it facilitates electrical connection (soldering, etc.) between the light emitting element and the copper wiring in manufacturing the lighting device described later.
  • the phosphor particles included in the phosphor sheet of this embodiment may be any phosphor particles that emit fluorescence when exposed to light emitted from a light emitting element. Specifically, the phosphor particles need only be able to convert blue light into light with a longer wavelength than the wavelength of the blue light. Only one type of particles may be used, or two or more phosphor particles may be used in combination.
  • Examples of the phosphor particles include CASN-based phosphors, SCASN-based phosphors, La 3 Si 6 N 11 -based phosphors, Sr 2 Si 5 N 8 -based phosphors, Ba 2 Si 5 N 8 -based phosphors, and ⁇ -sialon phosphors.
  • Examples include one or more selected from the group consisting of phosphors, ⁇ -sialon phosphors, LuAG phosphors, and YAG phosphors. These phosphors usually contain activating elements such as Eu and Ce.
  • the CASN-based phosphor (a type of nitride phosphor) preferably contains Eu.
  • the CASN-based phosphor is, for example, a red phosphor represented by the formula CaAlSiN 3 :Eu 2+ , which uses Eu 2+ as an activator and has a crystal made of alkaline earth silicon nitride as a matrix.
  • the definition of Eu-containing CASN-based phosphors in this specification excludes Eu-containing SCASN-based phosphors.
  • the SCASN-based phosphor (a type of nitride phosphor) preferably contains Eu.
  • the SCASN-based phosphor is, for example, a red phosphor represented by the formula (Sr,Ca)AlSiN 3 :Eu 2+ , which uses Eu 2+ as an activator and has a crystal made of alkaline earth silicon nitride as a matrix.
  • the La 3 Si 6 N 11 -based phosphor is La 3 Si 6 N 11 :Ce phosphor. This typically wavelength converts blue light from a blue LED to yellow light.
  • the Sr 2 Si 5 N 8 -based phosphor includes a Sr 2 Si 5 N 8 :Eu 2+ phosphor, a Sr 2 Si 5 N 8 :Ce 3+ phosphor, and the like. These typically wavelength convert blue light from blue LEDs into yellow to red light.
  • the Ba 2 Si 5 N 8 -based phosphor is Ba 2 Si 5 N 8 :Eu. This typically wavelength converts blue light from a blue LED to orange-red light.
  • the ⁇ -type sialon-based phosphor preferably contains Eu.
  • ⁇ -type sialon containing Eu is represented by, for example, the general formula: M x Eu y Si 12-(m+n) Al (m+n) O n N 16-n .
  • the ⁇ -type sialon-based phosphor preferably contains Eu.
  • ⁇ -type sialon containing Eu is, for example, represented by the general formula Si 6-z Al z O z N 8-z :Eu 2+ (0 ⁇ Z ⁇ 4.2), and is derived from ⁇ -sialon containing Eu 2+ as a solid solution. It is a phosphor.
  • the Z value and the europium content are not particularly limited.
  • the Z value is, for example, greater than 0 and less than or equal to 4.2, and is preferably greater than or equal to 0.005 and less than or equal to 1.0 from the viewpoint of further improving the luminescence intensity of ⁇ -sialon.
  • the content of europium is preferably 0.1% by mass or more and 2.0% by mass or less.
  • LuAG-based phosphor usually means lutetium aluminum garnet crystal. Considering the application to a lighting device, it is preferable that LuAG is a LuAG:Ce phosphor. More specifically, LuAG can be represented by the composition formula Lu 3 Al 5 O 12 :Ce, but the composition of LuAG does not necessarily have to follow stoichiometry.
  • YAG-based phosphor usually means yttrium aluminum garnet crystal. Considering application to lighting devices, it is preferable that the YAG-based phosphor be activated with Ce. More specifically, the YAG-based phosphor can be represented by the composition formula Y 3 Al 5 O 12 :Ce, but the composition of the YAG-based phosphor does not necessarily have to follow stoichiometry.
  • phosphor particles Commercially available products may be used as the phosphor particles. Examples of commercially available phosphor particles include Aron Bright (registered trademark) manufactured by Denka Corporation. It is also commercially available from Mitsubishi Chemical and other companies.
  • the median diameter D50 of the phosphor particles is preferably 1 ⁇ m or more and 20 ⁇ m or less, more preferably 5 ⁇ m or more and 15 ⁇ m or less. By appropriately adjusting the median diameter D50 , it becomes easier to form a thin and uniform phosphor sheet.
  • two or more maxima are observed in the particle size distribution curve of the phosphor particles. Specifically, it is preferable that the maximum is observed in both a region of particle size of 1 ⁇ m or more and 6 ⁇ m or less and a region of particle size of 10 ⁇ m or more and 25 ⁇ m or less.
  • the fact that two or more local maxima are observed means that the phosphor particles include both large particles and small particles. Since the small particles fit into the "gaps" between the large particles, it is easier to increase the content of phosphor particles compared to when only large particles are used. Moreover, even if the content of phosphor particles is increased, various physical properties can be easily maintained. Furthermore, when formed into a coating film, it becomes more difficult for light emitted from the light emitting element to pass through.
  • the median diameter D50 and particle size distribution curve of the phosphor particles can be determined by improving the preparation method of the phosphor particles, appropriately crushing the phosphor particles, and appropriately mixing two or more phosphor particles with different particle sizes. It can be adjusted by
  • the particle size distribution curve of the phosphor particles can be measured using a laser diffraction scattering particle size distribution measuring device after dispersing raw material phosphor particles in a dispersion medium using an ultrasonic homogenizer. Then, the median diameter D50 can be determined from the obtained particle size distribution curve.
  • the median diameter D50 and the particle size distribution curve are measured on a volume basis.
  • the phosphor sheet of this embodiment may contain only one type of phosphor particles, or may contain two or more types of phosphor particles.
  • the content of the phosphor particles in the phosphor sheet is 25 vol% or more and 60 vol% or less. This content is preferably 30 vol% or more and 60 vol% or less, more preferably 35 vol% or more and 60 vol% or less, and still more preferably 40 vol% or more and 50 vol% or less.
  • one of the causes of crack generation is considered to be the difference in thermal expansion coefficient between the phosphor layer and the substrate on which the phosphor layer is provided.
  • the amount of the curable resin component is relatively reduced. Then, the difference between the coefficient of thermal expansion of the phosphor layer and the coefficient of thermal expansion of the substrate on which the phosphor layer is provided becomes small. As a result, it is thought that cracks are less likely to occur in the phosphor layer.
  • the content of phosphor particles in the phosphor sheet is preferably 30 vol% or more, more preferably 35 vol% or more.
  • the content of phosphor particles in the phosphor sheet is preferably 60 vol% or less. Since the content of the phosphor particles is not too large, the phosphor particles are less likely to fall off from the formed phosphor layer.
  • the phosphor sheet of this embodiment contains a curable resin component.
  • curable resin component refers not only to (1) a resin (polymer) component that has the property of being cured by the action of heat, light, etc., but also (2) a monomer or oligomer component before coating film formation. However, it also includes components that can be increased in molecular weight to form resins (polymers) by the action of heat, light, etc. after coating film formation.
  • curable resin component refers not only to (1) a resin (polymer) component that has the property of being cured by the action of heat, light, etc., but also (2) a monomer or oligomer component before coating film formation. However, it also includes components that can be increased in molecular weight to form resins (polymers) by the action of heat, light, etc. after coating film formation.
  • polymers, monomers, or oligomers polymerization initiators, curing agents, and the like are also considered to be part of the "curable resin component.”
  • the curable resin component When the curable resin component includes resins, monomers or oligomers, these are usually organic. That is, the curable resin component usually contains an organic resin, an organic monomer, or an organic oligomer.
  • the curable resin component preferably includes a thermosetting resin component.
  • a highly durable lighting device can be manufactured.
  • the curable resin component may include a thermoplastic resin.
  • the curable resin component preferably contains one or more of silicone resins, epoxy resins, etc.
  • the silicone resin preferably contains a silicone resin having a phenyl group and/or a methyl group.
  • silicone resins are preferable in terms of compatibility with other components, solvent solubility, coatability, heat resistance, durability, and the like.
  • the ratio of phenyl groups to methyl groups in this resin is, for example, about 0.3:1 to 1.5:1.
  • the curable resin component can include reactive groups. This allows the curable resin component to cure itself.
  • the curable resin component preferably includes a silicone resin containing a silanol group (-Si-OH). As a result, a condensation reaction of silanol groups occurs during coating film formation, and a cured coating film is obtained.
  • the silanol content (OH mass %) of the silicone resin containing a silanol group (-Si-OH) is, for example, 0.1 mass % or more and 5 mass % or less.
  • the curable resin component may be one that is cured by a hydrosilylation reaction between a vinyl group-containing polymer and a Si-H group-containing silicone polymer (addition reaction type).
  • the epoxy resin may be any resin as long as it has an epoxy group in its molecule.
  • Bisphenol A type epoxy resin bisphenol F type epoxy resin, bisphenol S type epoxy resin, alicyclic epoxy resin, aliphatic chain epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, Examples include diglycidyl etherified products of biphenol, diglycidyl etherified products of naphthalene diol, diglycidyl etherified products of phenols, diglycidyl etherified products of alcohols, alkyl substituted products, halides, hydrogenated products, etc. Can be done.
  • a curing agent that can harden the epoxy resin.
  • the curing agent include polyfunctional phenols, amines, imidazole compounds, acid anhydrides, organic phosphorus compounds, and halides thereof.
  • polyfunctional phenols include monocyclic difunctional phenols such as hydroquinone, resorcinol, and catechol, polycyclic difunctional phenols such as bisphenol A, bisphenol F, naphthalene diols, biphenols, and their halides and alkyl group-substituted phenols.
  • there are novolacs and resols which are polycondensates of these phenols and aldehydes.
  • amines include aliphatic or aromatic primary amines, secondary amines, tertiary amines, quaternary ammonium salts, aliphatic cyclic amines, guanidines, urea derivatives, and the like.
  • Examples of these compounds include N,N-benzyldimethylamine, 2-(dimethylaminomethyl)phenol, 2,4,6-tris(dimethylaminomethyl)phenol, tetramethylguanidine, triethanolamine, N,N '-dimethylpiperazine, 1,4-diazabicyclo[2,2,2]octane, 1,8-diazabicyclo[5,4,0]-7-undecene, 1,5-diazabicyclo[4,4,0]-5 -Nonene, hexamethylenetetramine, pyridine, picoline, piperidine, pyrrolidine, dimethylcyclohexylamine, dimethylhexylamine, cyclohexylamine, diisobutylamine, di-n-butylamine, diphenylamine, N-methylaniline, tri-n-propylamine, tri- -n-octylamine, tri-n-butylamine, triphenylamine
  • imidazole compounds include imidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2- Heptadecylimidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl-4 - Methylimidazole, 2-ethylimidazoline, 2-phenyl-4-methylimidazoline, benzimidazole, 1-cyanoethylimidazole and the like.
  • acid anhydrides examples include phthalic anhydride, hexahydrophthalic anhydride, pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, and the like.
  • organic phosphorus compound any phosphorus compound having an organic group can be used without particular limitation.
  • hexamethylphosphoric acid triamide, tri(dichloropropyl) phosphate, tri(chloropropyl) phosphate, triphenyl phosphite, trimethyl phosphate, phenylphosphonic acid, triphenylphosphine, tri-n-butylphosph These include fins and diphenylphosphine.
  • Epoxy resin curing agents can be used alone or in combination.
  • the amount of the curing agent for the epoxy resin to be used is not particularly limited as long as the curing reaction of the epoxy group can proceed appropriately. It is preferably used in an amount of 0.01 to 5.0 equivalents, particularly preferably 0.8 to 1.2 equivalents, per mole of epoxy group.
  • the phosphor sheet of this embodiment may contain a curing accelerator as necessary.
  • Typical curing accelerators include tertiary amines, imidazoles, quaternary ammonium salts, etc., but are not limited thereto.
  • the phosphor sheet of the embodiment may contain fibers from the viewpoint of handling properties, shape retention properties, and the like.
  • the phosphor sheet of this embodiment may be in a B-stage state by impregnating the above-mentioned curable resin component into a fiber base material.
  • the fiber base material is not particularly limited. Commonly used base materials for prepregs, such as glass cloth, aramid nonwoven fabric, and liquid crystal polymer nonwoven fabric, can be used.
  • glass cloth examples include "Style 1027MS” manufactured by Asahi Schwebel (warp density 75/25 mm, weft density 75/25 mm, cloth weight 20 g/m 2 , thickness 19 ⁇ m), “Style 1027MS” manufactured by Asahi Schwebel Style 1037MS” (warp density 70/25mm, weft density 73/25mm, fabric weight 24g/ m2 , thickness 28 ⁇ m), Arisawa Seisakusho's “1078” (warp density 54/25mm, weft density 54 /25mm, cloth weight 48g/ m2 , thickness 43 ⁇ m), "1037NS” manufactured by Arisawa Seisakusho (warp density 72/25mm, weft density 69/25mm, cloth weight 23g/ m2 , thickness 21 ⁇ m), "1027NS” manufactured by Arisawa Seisakusho Co., Ltd.
  • liquid crystal polymer nonwoven fabric examples include "Veklus” (basis weight 6 to 15 g/m 2 ) and "Vectran” produced by the melt-blowing aromatic polyester nonwoven fabric manufactured by Kuraray Co., Ltd.
  • the phosphor sheet of this embodiment may contain a fluidity regulator from the viewpoint of manufacturing suitability.
  • a fluidity modifier silica particles such as hydrophobic silica and hydrophilic silica, aluminum oxide, etc. can be used. In particular, fumed silica is preferably used.
  • Commercially available fluidity modifiers include, for example, AEROSIL 130, AEROSIL 200, AEROSIL 300, AEROSIL R-972, AEROSIL R-812, AEROSIL R-812S, Aluminum Oxide C (manufactured by Nippon Aerosil Co., Ltd., AEROSIL is a registered trademark). ), Carplex FPS -1 (manufactured by DSL, trade name).
  • the phosphor sheet of this embodiment preferably has through holes. This is for electrically connecting the light emitting element and the copper wiring in manufacturing the lighting device, which will be described later.
  • the position, size, shape, number, etc. of the through holes may be determined as appropriate depending on the design of the illumination device to be finally obtained.
  • the through hole can be provided, for example, by punching. Of course, the through holes may be provided in other ways.
  • the phosphor sheet of this embodiment can be manufactured based on known knowledge regarding curable resin compositions.
  • the phosphor sheet of this embodiment can be manufactured by following the manufacturing method of "prepreg" used for manufacturing electrical and electronic parts.
  • prepreg used for manufacturing electrical and electronic parts.
  • the varnish can be manufactured by heating at a temperature and for a time that does not completely cure the varnish (becomes in a B-stage state).
  • other methods for example, a hot melt method that does not use a solvent may be used.
  • the prepreg manufacturing method is described in various known documents, so it can be used as a reference when manufacturing the phosphor sheet of this embodiment. Methods for manufacturing prepreg are described, for example, in JP-A No. 2020-139164, JP-A No. 2004-188652, and the like.
  • the lighting device of this embodiment is (i) an insulating substrate; (ii) a phosphor layer that is a cured product of the phosphor sheet, provided on one side of the insulating substrate; (iii) a light emitting element installed on the surface of the fluorescent layer opposite to the insulating substrate; Equipped with
  • the lighting device of this embodiment preferably further includes a white layer between the insulating substrate and the fluorescent layer.
  • the lighting device of this embodiment can be manufactured, for example, by the steps shown in FIGS. 1 to 5.
  • a substrate including at least an insulating substrate 20 as shown in FIG. 1 is prepared.
  • a first copper foil 22A is normally provided on one surface of the insulating substrate 20.
  • a part of the first copper foil 22A is removed by etching and functions as a copper circuit (copper wiring).
  • a second copper foil 22B may be provided on the other surface of the insulating substrate 20.
  • the material of the insulating substrate 20 is not particularly limited as long as it is known to be used for PWBs (printed circuit boards).
  • polyimide resin, silicone resin, (meth)acrylic resin, urea resin, epoxy resin, fluororesin, glass, metal (aluminum, copper, iron, stainless steel, etc.) can be used.
  • polyimide resin, silicone resin, glass, or metal such as a so-called "metal substrate” in which aluminum or copper is used as a base metal and an insulating layer is provided
  • the thickness of the insulating substrate 20 is not particularly limited as long as it can be used for lighting equipment. For example, it is 50 ⁇ m or more and 1000 ⁇ m or less, specifically 50 ⁇ m or more and 500 ⁇ m or less.
  • the first copper foil 22A is electrically connected to the surface-mounted LED element 28 by solder 30, as described later. Electricity is supplied to the surface-mounted LED element 28 by the cuprous foil 22A and the solder 30, and the surface-mounted LED element 28 emits light.
  • the force can be balanced on both sides of the insulating substrate 20, and the occurrence of warping, for example, can be suppressed. There is.
  • the white layer 24 is provided on the side of the first copper foil 22A of the substrate shown in FIG.
  • the white layer 24 is, for example, a B-stage "phosphor sheet" manufactured by using white particles (typically a white pigment such as titanium oxide or alumina) instead of the phosphor particles in the above-mentioned ⁇ phosphor sheet>. It can be provided using a "white sheet”. It is preferable that the white sheet has a through hole for electrically connecting the light emitting element and the copper wiring.
  • the specific conditions for providing the white layer 24 can be the same as those for forming the fluorescent layer, which will be described later.
  • the thickness of the white layer 24 is usually 20 to 150 ⁇ m, preferably 30 to 120 ⁇ m, and more preferably 35 to 100 ⁇ m.
  • the thickness of the white layer 24 is preferably 20 to 100 ⁇ m, and it is more preferable that the total thickness of the white layer 24 and the fluorescent layer 26 described below be 100 ⁇ m or less. preferable.
  • the white sheet has a through hole, it is preferable that the position of the through hole coincides with the portion of the first copper foil 22A to be soldered by appropriate means.
  • a fluorescent layer 26 is provided on the exposed surface of the white layer 24 (in the case where the white layer 24 is not provided, the exposed surface of the first copper foil 22A).
  • the fluorescent layer 26 can be provided using the above-mentioned phosphor sheet.
  • the fluorescent layer 26 has an opening (through hole) for electrically connecting the light emitting element and the copper wiring in a process described later.
  • the phosphor sheet has a through hole, it is preferable that the position of the opening (through hole) coincides with the portion of the first copper foil 22A to be soldered by appropriate means.
  • the above-mentioned phosphor sheet can be laminated on the exposed surface of the white layer 24 by a vacuum lamination method.
  • the conditions for the vacuum lamination method are not particularly limited, but the temperature for heat-pressing is preferably 60 to 160°C, more preferably 80 to 140°C.
  • the heating pressure is preferably 0.098 to 1.77 MPa, more preferably 0.29 to 1.47 MPa.
  • the heat and pressure bonding time is preferably 20 to 400 seconds, more preferably 30 to 300 seconds.
  • Lamination is preferably carried out under reduced pressure conditions of 26.7 hPa or less.
  • the phosphor sheet may be smoothed by applying a pressing force to the phosphor sheet.
  • the uncured components in the phosphor sheet are cured, and the phosphor layer 26 can be provided.
  • the heating conditions here are not particularly limited, but for example, the curing temperature is 120 to 240°C, preferably 150 to 220°C, more preferably 170 to 200°C, and the curing time is 5 to 120 minutes, preferably 10 to 100°C. minutes, more preferably 15 to 90 minutes.
  • the method for forming the fluorescent layer 26 as described above is just an example.
  • the fluorescent layer 26 may be provided using a known method for laminating and curing prepreg, which is different from the above method.
  • Solder 30 is placed in the opening (through hole) of the fluorescent layer 26 . Thereafter, the surface-mounted LED element 28 is placed on the solder 30. Then, the surface-mounted LED element 28 and the first copper foil 22A are soldered and electrically connected by melting the solder using, for example, a reflow method.
  • the specific method and conditions for soldering are not particularly limited. Incidentally, the solder 30 may be applied to the first copper foil 22A in advance.
  • a lighting device can be manufactured in the manner described above. Incidentally, as shown in FIG. 5, a plurality of light emitting elements (surface-mounted LED elements 28) may be installed in the lighting device.
  • a spacer may be used for the purpose of adjusting the film thickness. That is, the white layer 24 and the fluorescent layer 26 may be provided by heating, pressing, etc. using a spacer.
  • the resin component softened when the sheet in the B-stage state is heated may be soldered to the surface-mounted LED element 28 in the cuprous foil 22A. It is conceivable that the paint may "bleed out" into the area where it should be attached. In this case, there is a possibility that the first copper foil 22A and the surface-mounted LED element 28 cannot be electrically connected. One possible way to prevent this is to change the material of the resin sheet or the process conditions. Another method is to "protect" the part of the first copper foil 22A to which the surface-mounted LED element 28 is to be soldered by temporarily using a suitable member, such as a spring pin. It will be done.
  • the softened resin component can theoretically be applied to the surface-mounted LED element 28 on the first copper foil 22A. It is possible to prevent "bleeding" onto the parts to be soldered.
  • the light-emitting element preferably does not include a reflector.
  • some known surface-mounted LED elements are equipped with a reflector, as shown in FIG. 6A, so that light does not leak out laterally or downwardly.
  • the light emitting element does not include a reflector as shown in FIG. 6B.
  • the semiconductor light-emitting element 100 is arranged in a package-shaped part 108 formed by a substrate 102 and a reflector (housing) 104, and a sealing member 110 (light-transmitting resin) is placed in the package-shaped part 108. ) is filled.
  • Substrate 102 can include wiring 112 .
  • FIG. 6B the same elements as in FIG. 2A are given the same reference numerals.
  • a housing (reflector) is not used.
  • the sealing member 110 can be formed by molding using a desired mold. Alternatively, the sealing member 110 may be prepared in advance and molded into a desired shape, and may be adhered to the substrate 102 so as to cover the semiconductor light emitting element 100.
  • a curable resin component (silicone resin) and a solvent were first mixed to obtain a uniform solution. Thereafter, phosphor particles and a fluidity modifier (Example 3 only) were added to the solution and uniformly mixed and dispersed to obtain silicone resin varnishes 1-1 to 1-4.
  • a commercially available fiber base material (glass cloth) was impregnated with the above silicone resin varnish and dried in a vertical drying oven. After cooling, a through hole for connecting the light emitting element and the copper wiring was formed by punching. In this way, silicone resin phosphor sheets 2-1 to 2-4 were produced. Incidentally, the drying conditions (temperature and time) were adjusted so that the silicone resin phosphor sheet was in a B-stage state. Further, based on the thickness of the phosphor layer (50 ⁇ m) described later, a fiber base material (glass cloth) having an appropriate thickness was selected.
  • epoxy resin varnishes 2-1 to 2-4 having the following compositions were prepared.
  • ⁇ Bisphenol A type epoxy resin 640 parts by mass ⁇ Bisphenol A novolac resin 25 parts by mass ⁇ Ethyl methyl imidazole 0.2 parts by mass ⁇ Phosphor particles in the amount shown in the table below ⁇ Methyl ethyl ketone solvent
  • the viscosity of the resin varnish is approximately 0.1 Ns/m amount that becomes 2
  • a commercially available fiber base material (glass cloth) was impregnated with the above epoxy resin varnish and dried at 135° C. for 5 minutes in a vertical drying oven. After cooling, a through hole for connecting the light emitting element and the copper wiring was formed by punching. In this way, epoxy resin phosphor sheets 2-1 to 2-4 in a B-stage state were produced.
  • the fiber base material (glass cloth) was selected to have an appropriate thickness based on the thickness (50 ⁇ m) of the phosphor layer described later.
  • ⁇ Manufacture of white sheet> Except that titanium oxide/alumina mixed particles were used instead of the phosphor particles so that the amount in the nonvolatile components was 50 vol%, and the thickness of the glass cloth was changed as appropriate, A silicone resin-based white sheet was manufactured in the same manner as in ⁇ Manufacture of Phosphor Sheet Used>. In addition, the above-mentioned ⁇ Epoxy An epoxy resin-based white sheet was manufactured in the same manner as in ⁇ Manufacture of Phosphor Sheet Using Resin''.
  • a lighting device was manufactured in which a plurality of CSPs were arranged on a phosphor layer at regular intervals.
  • the manufacturing procedure is briefly shown below.
  • a bonding sheet CS-3305A manufactured by Risho Kogyo Co., Ltd. which was laminated with copper foil on both sides, was prepared. This copper foil was etched to form a copper circuit on the first copper foil.
  • the silicone resin white sheet described above was placed on the cuprous foil and pressed at a pressure of 20 kgf/cm 2 and a temperature of 190° C. for 90 minutes.
  • the position of the through hole in each sheet was set to be the position where the CSP and the first copper foil were connected in (4).
  • a lighting device was manufactured in which a plurality of CSPs were arranged on a phosphor layer at regular intervals.
  • the manufacturing procedure is briefly shown below.
  • a bonding sheet CS-3305A manufactured by Risho Kogyo Co., Ltd. which was laminated with copper foil on both sides, was prepared. This copper foil was etched to form a copper circuit on the first copper foil.
  • the above white epoxy resin sheet was placed on the cuprous foil and pressed at a pressure of 20 kgf/cm 2 and a temperature of 190° C. for 90 minutes. This formed a white layer with a thickness of 35 ⁇ m.
  • the position of the through hole in each sheet was set to be the position where the CSP and the first copper foil were connected in (4).
  • Color temperature conversion> A current was applied to each lighting device produced above to cause the lighting device to emit light.
  • the color temperature of the light emitted from the lighting device was measured using a total luminous flux measurement system (device equipped with an integrating sphere) manufactured by Otsuka Electronics Co., Ltd.
  • the measured color temperature was 2000 to 2100K and the color temperature was converted by at least 100K from the color temperature of the CSP itself (2200 to 2300K), the color temperature conversion property was evaluated as "good”.

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Abstract

Provided is a phosphor sheet comprising a thermosetting resin composition that contains phosphor particles and a curing resin component and is in a B stage state, and having a thickness of 20-150 μm. Also provided is a lighting device equipped with a phosphor layer that is a cured product of the phosphor sheet, and a light-emitting element installed on a surface on the reverse side from an insulating substrate of the phosphor layer.

Description

蛍光体シートおよび照明装置Phosphor sheets and lighting devices
 本発明は、蛍光体シートおよび照明装置に関する。 The present invention relates to a phosphor sheet and a lighting device.
 LED(Light Emitting Device)を用いた照明装置について、様々な開発が進められている。LEDそのものの開発だけでなく、LEDを備える実装基板に関する開発も知られている。 Various developments are underway regarding lighting devices using LEDs (Light Emitting Devices). In addition to the development of LEDs themselves, the development of mounting boards equipped with LEDs is also known.
 例えば、特許文献1の実施例2には、(i)30vol%の蛍光体を含むガラスバインダー塗料を、ガラス基板の表面に塗布して、厚さ200μmの蛍光体層を形成したこと、(ii)そのガラス基板上に、複数のCSPを接合してLED照明用実装基板を得たこと、(iii)その実装基板に通電したところ、複数のCSPから発光しているにもかかわらず、グレアや多重影の問題が軽減されたこと、などが記載されている。
 (CSPとは、Chip Scale PackageまたはChip Size Packageの略で、LEDチップを蛍光体樹脂で包み、LEDチップと蛍光体樹脂だけの構成でパッケージレスとしたものである。)
For example, in Example 2 of Patent Document 1, (i) a glass binder paint containing 30 vol% of phosphor was applied to the surface of a glass substrate to form a phosphor layer with a thickness of 200 μm; (ii) ) A mounting board for LED lighting was obtained by bonding multiple CSPs on the glass substrate; and (iii) when electricity was applied to the mounting board, there was no glare or glare even though the multiple CSPs were emitting light. It states that the problem of multiple shadows has been reduced.
(CSP is an abbreviation for Chip Scale Package or Chip Size Package, which is an LED chip wrapped in phosphor resin, making it packageless with only the LED chip and phosphor resin.)
国際公開第2019/093339号International Publication No. 2019/093339
 特許文献1の実施例2においては、蛍光体を含む「ガラスバインダー塗料」を用いて、ガラス基板上に厚さ200μmの蛍光体層を形成している。しかし、ガラスバインダー塗料を十二分に硬化させるには、通常、高温での焼結工程を要する。よって、特許文献1の実施例2については、蛍光体層を設ける簡便性などの点で改善の余地がある。また、ガラスバインダー塗料を塗布する筐体/基板にも、耐熱性や膨張係数最適化等の制限がかかる。さらに、「塗料」を用いて蛍光体層を形成することには、工程の複雑化や、塗料の「垂れ」の問題を解決する必要があるなどの課題もある。 In Example 2 of Patent Document 1, a phosphor layer with a thickness of 200 μm is formed on a glass substrate using a “glass binder paint” containing a phosphor. However, in order to fully cure glass binder paints, a sintering process at high temperatures is usually required. Therefore, with respect to Example 2 of Patent Document 1, there is room for improvement in terms of ease of providing the phosphor layer, etc. Additionally, the casing/substrate to which the glass binder paint is applied is subject to restrictions such as heat resistance and optimization of expansion coefficient. Furthermore, forming a phosphor layer using "paint" has problems, such as the complexity of the process and the need to solve the problem of "dripping" of the paint.
 本発明はこのような事情に鑑みてなされたものである。本発明の目的の1つは、塗料を用いないで簡便なプロセスによりに蛍光体層を形成可能な材料を提供することである。 The present invention has been made in view of these circumstances. One of the objects of the present invention is to provide a material on which a phosphor layer can be formed by a simple process without using paint.
 本発明者らは、鋭意検討の結果、以下に提供される発明を完成させ、上記課題を解決した。 As a result of intensive studies, the present inventors completed the invention provided below and solved the above problems.
1.
 蛍光体粒子と、硬化性樹脂成分と、を含み、B-ステージ状態にある熱硬化性樹脂組成物で構成され、厚みが20~150μmである蛍光体シート。
2.
 1.に記載の蛍光体シートであって、
 前記硬化性樹脂成分が、エポキシ樹脂およびシリコーン樹脂からなる群より選ばれる少なくとも1種を含む蛍光体シート。
3.
 1.または2.に記載の蛍光体シートであって、
 貫通孔を有する蛍光体シート。
4.
 1.~3.のいずれか1つに記載の蛍光体シートであって、
 蛍光体粒子の含有率が25vol%以上60vol%以下である蛍光体シート。
5.
 1.~4.のいずれか1つに記載の蛍光体シートであって、
 前記蛍光体粒子は、青色光を、前記青色光の波長よりも長波長の光に変換可能な蛍光体粒子を含む蛍光体シート。
6.
 1.~5.のいずれか1つに記載の蛍光体シートであって、
 前記蛍光体粒子のメジアン径D50が1μm以上20μm以下である蛍光体シート。
7.
 1.~6.のいずれか1つに記載の蛍光体シートであって、
 前記蛍光体粒子の粒径分布曲線において、2以上の極大が認められる蛍光体シート。
8.
 1.~7.のいずれか1つに記載の蛍光体シートであって、
 前記蛍光体粒子の粒径分布曲線において、粒径1μm以上6μm以下の領域と、粒径10μm以上25μm以下の領域の両方に極大が認められる蛍光体シート。
9.
 1.~8.のいずれか1つに記載の蛍光体シートであって、
 前記蛍光体粒子が、CASN系蛍光体、SCASN系蛍光体、LaSi11系蛍光体、SrSi系蛍光体、BaSi系蛍光体、α型サイアロン系蛍光体、β型サイアロン系蛍光体、LuAG系蛍光体およびYAG系蛍光体からなる群より選ばれる1または2以上を含む蛍光体シート。
10.
 絶縁基板と、
 前記絶縁基板の片面側に設けられた、1.~9.のいずれか1つに記載の蛍光体シートの硬化物である蛍光層と、
 前記蛍光層における前記絶縁基板と反対側の面に設置された発光素子と、を備える照明装置。
11.
 10.に記載の照明装置であって、
 前記絶縁基板と、前記蛍光層との間に、さらに白色層を備える照明装置。
12.
 10.または11.に記載の照明装置であって、
 複数の前記発光素子が設置された照明装置。
13.
 10.~12.のいずれか1つに記載の照明装置であって、
 前記発光素子はリフレクタを備えない照明装置。
1.
A phosphor sheet comprising a thermosetting resin composition in a B-stage state, including phosphor particles and a curable resin component, and having a thickness of 20 to 150 μm.
2.
1. The phosphor sheet described in
A phosphor sheet in which the curable resin component includes at least one selected from the group consisting of epoxy resins and silicone resins.
3.
1. or 2. The phosphor sheet described in
A phosphor sheet with through holes.
4.
1. ~3. The phosphor sheet according to any one of
A phosphor sheet having a content of phosphor particles of 25 vol% or more and 60 vol% or less.
5.
1. ~4. The phosphor sheet according to any one of
The phosphor particles include phosphor particles that can convert blue light into light with a wavelength longer than the wavelength of the blue light.
6.
1. ~5. The phosphor sheet according to any one of
A phosphor sheet in which the median diameter D50 of the phosphor particles is 1 μm or more and 20 μm or less.
7.
1. ~6. The phosphor sheet according to any one of
A phosphor sheet in which two or more maxima are observed in the particle size distribution curve of the phosphor particles.
8.
1. ~7. The phosphor sheet according to any one of
In the particle size distribution curve of the phosphor particles, a maximum is observed in both a particle size region of 1 μm or more and 6 μm or less and a particle size region of 10 μm or more and 25 μm or less.
9.
1. ~8. The phosphor sheet according to any one of
The phosphor particles include a CASN-based phosphor, a SCASN-based phosphor, a La 3 Si 6 N 11 -based phosphor, a Sr 2 Si 5 N 8 -based phosphor, a Ba 2 Si 5 N 8 -based phosphor, and an α-sialon-based phosphor. A phosphor sheet containing one or more selected from the group consisting of a phosphor, a β-sialon phosphor, a LuAG phosphor, and a YAG phosphor.
10.
an insulating substrate;
1. provided on one side of the insulating substrate; ~9. a phosphor layer that is a cured product of the phosphor sheet according to any one of
A lighting device comprising: a light emitting element installed on a surface of the fluorescent layer opposite to the insulating substrate.
11.
10. The lighting device according to
The lighting device further includes a white layer between the insulating substrate and the fluorescent layer.
12.
10. or 11. The lighting device according to
A lighting device in which a plurality of the light emitting elements are installed.
13.
10. ~12. The lighting device according to any one of
A lighting device in which the light emitting element does not include a reflector.
 本発明によれば、塗料を用いないで簡便なプロセスによりに蛍光体層を形成可能である。 According to the present invention, a phosphor layer can be formed by a simple process without using paint.
照明装置の製造手順について説明するための図である。It is a figure for explaining the manufacturing procedure of a lighting device. 照明装置の製造手順について説明するための図である。It is a figure for explaining the manufacturing procedure of a lighting device. 照明装置の製造手順について説明するための図である。It is a figure for explaining the manufacturing procedure of a lighting device. 照明装置の製造手順について説明するための図である。It is a figure for explaining the manufacturing procedure of a lighting device. 照明装置の製造手順および照明装置について説明するための図である。It is a figure for explaining the manufacturing procedure of a lighting device, and a lighting device. リフレクタを備えるLEDチップと、リフレクタを備えないLEDチップを説明するための図である。FIG. 3 is a diagram for explaining an LED chip with a reflector and an LED chip without a reflector.
 以下、本発明の実施形態について、図面を参照しつつ、詳細に説明する。
 すべての図面において、同様な構成要素には同様の符号を付し、適宜説明を省略する。
 煩雑さを避けるため、(i)同一図面内に同一の構成要素が複数ある場合には、その1つのみに符号を付し、全てには符号を付さない場合や、(ii)特に図2以降において、図1と同様の構成要素に改めては符号を付さない場合がある。
 すべての図面はあくまで説明用のものである。図面中の各部材の形状や寸法比などは、必ずしも現実の物品と対応しない。
Embodiments of the present invention will be described in detail below with reference to the drawings.
In all the drawings, similar components are denoted by the same reference numerals, and description thereof will be omitted as appropriate.
To avoid complication, (i) if there are multiple identical components in the same drawing, only one of them will be given a reference numeral and not all of them, or (ii) especially 2 and subsequent parts, components similar to those in FIG. 1 may not be labeled again.
All drawings are for illustrative purposes only. The shapes and dimensional ratios of each member in the drawings do not necessarily correspond to the actual product.
 本明細書中、数値範囲の説明における「X~Y」との表記は、特に断らない限り、X以上Y以下のことを表す。例えば、「1~5質量%」とは「1質量%以上5質量%以下」を意味する。 In the present specification, the notation "X to Y" in the description of numerical ranges indicates from X to Y, unless otherwise specified. For example, "1 to 5% by mass" means "1 to 5% by mass".
 本明細書における基(原子団)の表記において、置換か無置換かを記していない表記は、置換基を有しないものと置換基を有するものの両方を包含するものである。例えば「アルキル基」とは、置換基を有しないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 本明細書における「(メタ)アクリル」との表記は、アクリルとメタクリルの両方を包含する概念を表す。「(メタ)アクリレート」等の類似の表記についても同様である。
 本明細書における「有機基」の語は、特に断りが無い限り、有機化合物から1つ以上の水素原子を除いた原子団のことを意味する。例えば、「1価の有機基」とは、任意の有機化合物から1つの水素原子を除いた原子団のことを表す。
In the description of a group (atomic group) in this specification, a description that does not indicate whether it is substituted or unsubstituted includes both those without a substituent and those with a substituent. For example, the term "alkyl group" includes not only an alkyl group without a substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In this specification, the expression "(meth)acrylic" represents a concept that includes both acrylic and methacrylic. The same applies to similar expressions such as "(meth)acrylate".
The term "organic group" as used herein means an atomic group obtained by removing one or more hydrogen atoms from an organic compound, unless otherwise specified. For example, a "monovalent organic group" refers to an atomic group obtained by removing one hydrogen atom from an arbitrary organic compound.
<蛍光体シート>
 本実施形態の蛍光体シートは、蛍光体粒子と、硬化性樹脂成分と、を含み、B-ステージ状態にある熱硬化性樹脂組成物で構成される。
 本実施形態の蛍光体シートの厚みは、通常20~150μm、好ましくは30~120μm、より、好ましくは35~100μmである。
<Phosphor sheet>
The phosphor sheet of this embodiment includes phosphor particles and a curable resin component, and is composed of a thermosetting resin composition in a B-stage state.
The thickness of the phosphor sheet of this embodiment is usually 20 to 150 μm, preferably 30 to 120 μm, and more preferably 35 to 100 μm.
 本実施形態の蛍光体シートは、B-ステージ状態(別の言い方として半硬化状態)であることにより、室温付近の温度での流動性が実質的に消失しており、「シート」としての形態を保つことができる。
 本実施形態の蛍光体シートは、B-ステージ状態であることにより、シートとして基板上に置いた後、加熱する(好ましくは圧力をかけながら加熱する)ことで、基板と十分に強く接着して、蛍光体層を設けることができる。この際、液状の塗料の塗布が不要であるため、従来に比べて簡便なプロセスによりに蛍光体層を形成可能である。ちなみに、本明細書において、B-ステージ状態には、C-ステージ状態の前、すなわち完全硬化する前までの状態を含む。
 本実施形態の蛍光体シートの厚みが20μm以上であることにより、蛍光体シートが十分な量の蛍光体粒子を含むこととなり、蛍光体シートの光変換効率を十分大きくすることができる。また、本実施形態の蛍光体シートの厚みが150μm以下であることにより、熱硬化に必要な時間を短縮することができる。蛍光体シートが厚すぎないことは、後掲の照明装置の製造における、発光素子と銅配線との電気的な接続(はんだ付けなど)をしやすくする点でも好ましい。
Since the phosphor sheet of this embodiment is in a B-stage state (in other words, a semi-cured state), its fluidity at a temperature around room temperature has substantially disappeared, and it is in the form of a "sheet". can be kept.
Since the phosphor sheet of this embodiment is in a B-stage state, it can be placed on a substrate as a sheet and then heated (preferably heated while applying pressure) to adhere sufficiently strongly to the substrate. , a phosphor layer can be provided. At this time, since there is no need to apply liquid paint, the phosphor layer can be formed using a simpler process than in the past. Incidentally, in this specification, the B-stage state includes a state before the C-stage state, that is, before complete curing.
Since the thickness of the phosphor sheet of this embodiment is 20 μm or more, the phosphor sheet contains a sufficient amount of phosphor particles, and the light conversion efficiency of the phosphor sheet can be sufficiently increased. Moreover, since the thickness of the phosphor sheet of this embodiment is 150 μm or less, the time required for thermosetting can be shortened. It is also preferable that the phosphor sheet is not too thick because it facilitates electrical connection (soldering, etc.) between the light emitting element and the copper wiring in manufacturing the lighting device described later.
 以下、本実施形態の蛍光体シートについてより具体的に説明する。 Hereinafter, the phosphor sheet of this embodiment will be explained in more detail.
(蛍光体粒子)
 本実施形態の蛍光体シートが含む蛍光体粒子は、発光素子から発せられる光により蛍光を発するものであればよい。具体的には、蛍光体粒子は、青色光を、その青色光の波長よりも長波長の光に変換可能なものであればよい、所望の色目・色温度などに応じて、特定の蛍光体粒子を1種のみ用いてもよいし、2以上の蛍光体粒子を併用してもよい。
(phosphor particles)
The phosphor particles included in the phosphor sheet of this embodiment may be any phosphor particles that emit fluorescence when exposed to light emitted from a light emitting element. Specifically, the phosphor particles need only be able to convert blue light into light with a longer wavelength than the wavelength of the blue light. Only one type of particles may be used, or two or more phosphor particles may be used in combination.
 蛍光体粒子としては、CASN系蛍光体、SCASN系蛍光体、LaSi11系蛍光体、SrSi系蛍光体、BaSi系蛍光体、α型サイアロン系蛍光体、β型サイアロン系蛍光体、LuAG系蛍光体およびYAG系蛍光体からなる群より選ばれる1または2以上を挙げることができる。これら蛍光体は、通常、Eu、Ce等の賦活元素を含む。 Examples of the phosphor particles include CASN-based phosphors, SCASN-based phosphors, La 3 Si 6 N 11 -based phosphors, Sr 2 Si 5 N 8 -based phosphors, Ba 2 Si 5 N 8 -based phosphors, and α-sialon phosphors. Examples include one or more selected from the group consisting of phosphors, β-sialon phosphors, LuAG phosphors, and YAG phosphors. These phosphors usually contain activating elements such as Eu and Ce.
 CASN系蛍光体(窒化物蛍光体の一種)は、好ましくはEuを含む。CASN系蛍光体は、例えば、式CaAlSiN:Eu2+で表され、Eu2+を付活剤とし、アルカリ土類ケイ窒化物からなる結晶を母体とする赤色蛍光体をいう。
 本明細書におけるEuを含有するCASN系蛍光体の定義では、Euを含有するSCASN系蛍光体は除かれる。
The CASN-based phosphor (a type of nitride phosphor) preferably contains Eu. The CASN-based phosphor is, for example, a red phosphor represented by the formula CaAlSiN 3 :Eu 2+ , which uses Eu 2+ as an activator and has a crystal made of alkaline earth silicon nitride as a matrix.
The definition of Eu-containing CASN-based phosphors in this specification excludes Eu-containing SCASN-based phosphors.
 SCASN系蛍光体(窒化物蛍光体の一種)は、好ましくはEuを含む。SCASN系蛍光体は、例えば、式(Sr,Ca)AlSiN:Eu2+で表され、Eu2+を賦活剤とし、アルカリ土類ケイ窒化物からなる結晶を母体とする赤色蛍光体をいう。 The SCASN-based phosphor (a type of nitride phosphor) preferably contains Eu. The SCASN-based phosphor is, for example, a red phosphor represented by the formula (Sr,Ca)AlSiN 3 :Eu 2+ , which uses Eu 2+ as an activator and has a crystal made of alkaline earth silicon nitride as a matrix.
 LaSi11系蛍光体は、具体的には、LaSi11:Ce蛍光体などである。これは、通常、青色LEDからの青色光を黄色光に波長変換する。 Specifically, the La 3 Si 6 N 11 -based phosphor is La 3 Si 6 N 11 :Ce phosphor. This typically wavelength converts blue light from a blue LED to yellow light.
 SrSi系蛍光体は、具体的には、SrSi:Eu2+蛍光体や、SrSi:Ce3+蛍光体などである。これらは、通常、青色LEDからの青色光を黄色~赤色の光に波長変換する。 Specifically, the Sr 2 Si 5 N 8 -based phosphor includes a Sr 2 Si 5 N 8 :Eu 2+ phosphor, a Sr 2 Si 5 N 8 :Ce 3+ phosphor, and the like. These typically wavelength convert blue light from blue LEDs into yellow to red light.
  BaSi系蛍光体は、具体的には、BaSi:Euである。これは、通常、青色LEDからの青色光を橙色~赤色の光に波長変換する。 Specifically, the Ba 2 Si 5 N 8 -based phosphor is Ba 2 Si 5 N 8 :Eu. This typically wavelength converts blue light from a blue LED to orange-red light.
 α型サイアロン系蛍光体は、好ましくはEuを含む。Euを含むα型サイアロンは、例えば、一般式:MEuSi12-(m+n)Al(m+n)16-nで表される。一般式中、MはLi、Mg、Ca、Y及びランタニド元素(ただし、LaとCeを除く)からなる群から選ばれる、少なくともCaを含む1種以上の元素であり、Mの価数をaとしたとき、ax+2y=mであり、xが0<x≦1.5であり、0.3≦m<4.5、0<n<2.25である。 The α-type sialon-based phosphor preferably contains Eu. α-type sialon containing Eu is represented by, for example, the general formula: M x Eu y Si 12-(m+n) Al (m+n) O n N 16-n . In the general formula, M is one or more elements containing at least Ca selected from the group consisting of Li, Mg, Ca, Y, and lanthanide elements (excluding La and Ce), and the valence of M is a When, ax+2y=m, x is 0<x≦1.5, 0.3≦m<4.5, and 0<n<2.25.
 β型サイアロン系蛍光体は、好ましくはEuを含む。Euを含むβ型サイアロンは、例えば、一般式Si6-zAl8-z:Eu2+(0<Z≦4.2)で示され、Eu2+が固溶したβ型サイアロンからなる蛍光体である。一般式において、Z値とユウロピウムの含有量は特に限定されない。Z値は、例えば0を超えて4.2以下であり、β型サイアロンの発光強度をより向上させる観点から、好ましくは0.005以上1.0以下である。また、ユウロピウムの含有量は0.1質量%以上2.0質量%以下であることが好ましい。 The β-type sialon-based phosphor preferably contains Eu. β-type sialon containing Eu is, for example, represented by the general formula Si 6-z Al z O z N 8-z :Eu 2+ (0<Z≦4.2), and is derived from β-sialon containing Eu 2+ as a solid solution. It is a phosphor. In the general formula, the Z value and the europium content are not particularly limited. The Z value is, for example, greater than 0 and less than or equal to 4.2, and is preferably greater than or equal to 0.005 and less than or equal to 1.0 from the viewpoint of further improving the luminescence intensity of β-sialon. Further, the content of europium is preferably 0.1% by mass or more and 2.0% by mass or less.
 LuAG系蛍光体は、通常、ルテチウムアルミニウムガーネット結晶を意味する。照明装置への適用を考慮すると、LuAGは、LuAG:Ce蛍光体であることが好ましい。より具体的には、LuAGは、LuAl12:Ceの組成式で表すことができるが、LuAGの組成は必ずしも化学量論に従っていなくてもよい。 LuAG-based phosphor usually means lutetium aluminum garnet crystal. Considering the application to a lighting device, it is preferable that LuAG is a LuAG:Ce phosphor. More specifically, LuAG can be represented by the composition formula Lu 3 Al 5 O 12 :Ce, but the composition of LuAG does not necessarily have to follow stoichiometry.
 YAG系蛍光体は、通常、イットリウムアルミニウムガーネット結晶を意味する。照明装置への適用を考慮すると、YAG系蛍光体はCeで賦活されているものが好ましい。より具体的には、YAG系蛍光体は、YAl12:Ceの組成式で表すことができるが、YAG系蛍光体の組成は必ずしも化学量論に従っていなくてもよい。 YAG-based phosphor usually means yttrium aluminum garnet crystal. Considering application to lighting devices, it is preferable that the YAG-based phosphor be activated with Ce. More specifically, the YAG-based phosphor can be represented by the composition formula Y 3 Al 5 O 12 :Ce, but the composition of the YAG-based phosphor does not necessarily have to follow stoichiometry.
 蛍光体粒子として市販品を使用してもよい。市販の蛍光体粒子としては、例えば、デンカ株式会社のアロンブライト(登録商標)などを挙げることができる。その他、三菱ケミカル社などからも市販されている。 Commercially available products may be used as the phosphor particles. Examples of commercially available phosphor particles include Aron Bright (registered trademark) manufactured by Denka Corporation. It is also commercially available from Mitsubishi Chemical and other companies.
 蛍光体粒子のメジアン径D50は、好ましくは1μm以上20μm以下、より好ましくは5μm以上15μm以下である。メジアン径D50が適切に調整されることにより、例え薄くて均一な蛍光体シートを形成しやすくなる。 The median diameter D50 of the phosphor particles is preferably 1 μm or more and 20 μm or less, more preferably 5 μm or more and 15 μm or less. By appropriately adjusting the median diameter D50 , it becomes easier to form a thin and uniform phosphor sheet.
 蛍光体粒子の粒径分布曲線においては、2以上の極大が認められることが好ましい。具体的には、粒径1μm以上6μm以下の領域と、粒径10μm以上25μm以下の領域の両方に極大が認められることが好ましい。2以上の極大が認められることは、蛍光体粒子が、大粒子と小粒子の両方を含むことを意味する。小粒子が大粒子間の「すき間」に入り込むため、大粒子のみを使う場合に比べて蛍光体粒子の含有率を高めやすい。また、蛍光体粒子の含有率を高めたとしても、諸物性を維持しやすい。さらに、塗膜としたときに、発光素子から発せられた光がより透過しにくくなる。 It is preferable that two or more maxima are observed in the particle size distribution curve of the phosphor particles. Specifically, it is preferable that the maximum is observed in both a region of particle size of 1 μm or more and 6 μm or less and a region of particle size of 10 μm or more and 25 μm or less. The fact that two or more local maxima are observed means that the phosphor particles include both large particles and small particles. Since the small particles fit into the "gaps" between the large particles, it is easier to increase the content of phosphor particles compared to when only large particles are used. Moreover, even if the content of phosphor particles is increased, various physical properties can be easily maintained. Furthermore, when formed into a coating film, it becomes more difficult for light emitted from the light emitting element to pass through.
 蛍光体粒子のメジアン径D50や粒径分布曲線は、蛍光体粒子の調製方法の工夫、蛍光体粒子を適切に粉砕すること、粒径が異なる2以上の蛍光体粒子を適切に混合することなどにより調整することができる。 The median diameter D50 and particle size distribution curve of the phosphor particles can be determined by improving the preparation method of the phosphor particles, appropriately crushing the phosphor particles, and appropriately mixing two or more phosphor particles with different particle sizes. It can be adjusted by
 蛍光体粒子の粒径分布曲線は、原料の蛍光体粒子を、超音波ホモジナイザで分散媒に分散させたうえで、レーザー回折散乱式粒度分布測定装置により測定することができる。そして、得られた粒径分布曲線から、メジアン径D50を求めることができる。分散処理や測定装置の詳細については後述の実施例を参照されたい。
 念のため述べておくと、本明細書において、メジアン径D50や粒径分布曲線は、体積基準で測定される。
The particle size distribution curve of the phosphor particles can be measured using a laser diffraction scattering particle size distribution measuring device after dispersing raw material phosphor particles in a dispersion medium using an ultrasonic homogenizer. Then, the median diameter D50 can be determined from the obtained particle size distribution curve. For details of the distributed processing and the measuring device, please refer to Examples described later.
As a reminder, in this specification, the median diameter D50 and the particle size distribution curve are measured on a volume basis.
 本実施形態の蛍光体シートは、蛍光体粒子を1種のみ含んでもよいし、2種以上含んでもよい。
 蛍光体シート中の蛍光体粒子の含有率は、25vol%以上60vol%以下である。この含有率は、好ましくは30vol%以上60vol%以下、より好ましくは35vol%以上60vol%以下、さらに好ましくは40vol%以上50vol%以下である。
The phosphor sheet of this embodiment may contain only one type of phosphor particles, or may contain two or more types of phosphor particles.
The content of the phosphor particles in the phosphor sheet is 25 vol% or more and 60 vol% or less. This content is preferably 30 vol% or more and 60 vol% or less, more preferably 35 vol% or more and 60 vol% or less, and still more preferably 40 vol% or more and 50 vol% or less.
 蛍光体粒子の含有率を25vol%以上とすることにより、発光素子から発せられた光を十分に蛍光に変換しやすくなる。
 また、蛍光体粒子の含有率を25vol%以上とすることにより、蛍光体層にクラックが発生しにくくなるというメリットもある。一般的な知見に基づけば、クラック発生の原因の1つは、蛍光体層と、蛍光体層を設ける基板との熱膨張率の差と考えられる。蛍光体粒子の含有率を25vol%以上とすることにより、相対的に硬化性樹脂成分が減る。そして、蛍光体層の熱膨張率と、蛍光体層を設ける基板の熱膨張率の差が小さくなる。その結果、蛍光体層にクラックが発生しにくくなると考えられる。
By setting the content of the phosphor particles to 25 vol % or more, it becomes easy to sufficiently convert the light emitted from the light emitting element into fluorescence.
Further, by setting the content of the phosphor particles to 25 vol % or more, there is also the advantage that cracks are less likely to occur in the phosphor layer. Based on general knowledge, one of the causes of crack generation is considered to be the difference in thermal expansion coefficient between the phosphor layer and the substrate on which the phosphor layer is provided. By setting the content of the phosphor particles to 25 vol% or more, the amount of the curable resin component is relatively reduced. Then, the difference between the coefficient of thermal expansion of the phosphor layer and the coefficient of thermal expansion of the substrate on which the phosphor layer is provided becomes small. As a result, it is thought that cracks are less likely to occur in the phosphor layer.
 蛍光体シート中の蛍光体粒子の含有率は、好ましくは30vol%以上、より好ましくは35vol%以上である。こうすることで、例えば蛍光体層が薄い場合であっても発光素子から発せられた光を十分に蛍光に変換することができたり、発光素子から発せられた光の色温度を大きく変換できたりする。 The content of phosphor particles in the phosphor sheet is preferably 30 vol% or more, more preferably 35 vol% or more. By doing this, for example, even if the phosphor layer is thin, the light emitted from the light emitting element can be sufficiently converted into fluorescence, and the color temperature of the light emitted from the light emitting element can be significantly changed. do.
 一方、蛍光体シート中の蛍光体粒子の含有率は60vol%以下であることが好ましい。蛍光体粒子の含有率が大きすぎないことにより、形成された蛍光体層から蛍光体粒子が脱落しにくくなる。 On the other hand, the content of phosphor particles in the phosphor sheet is preferably 60 vol% or less. Since the content of the phosphor particles is not too large, the phosphor particles are less likely to fall off from the formed phosphor layer.
(硬化性樹脂成分)
 本実施形態の蛍光体シートは、硬化性樹脂成分を含む。
 本明細書において、「硬化性樹脂成分」は、(1)熱、光などの作用により硬化する性質を有する樹脂(ポリマー)成分だけでなく、(2)塗膜形成前においてはモノマーまたはオリゴマーであるが、塗膜形成後に、熱、光などの作用により高分子量化して樹脂(ポリマー)を形成可能な成分も含む。
 上記に関連して、本明細書においては、ポリマー、モノマーまたはオリゴマーに加え、重合開始剤や硬化剤なども「硬化性樹脂成分」の一部であるとする。
(Curable resin component)
The phosphor sheet of this embodiment contains a curable resin component.
In this specification, the term "curable resin component" refers not only to (1) a resin (polymer) component that has the property of being cured by the action of heat, light, etc., but also (2) a monomer or oligomer component before coating film formation. However, it also includes components that can be increased in molecular weight to form resins (polymers) by the action of heat, light, etc. after coating film formation.
In connection with the above, in this specification, in addition to polymers, monomers, or oligomers, polymerization initiators, curing agents, and the like are also considered to be part of the "curable resin component."
 硬化性樹脂成分が樹脂、モノマーまたはオリゴマーを含む場合、これらは通常は有機物である。つまり、硬化性樹脂成分は、通常、有機樹脂、有機モノマーまたは有機オリゴマーを含む。 When the curable resin component includes resins, monomers or oligomers, these are usually organic. That is, the curable resin component usually contains an organic resin, an organic monomer, or an organic oligomer.
 硬化性樹脂成分は、好ましくは熱硬化性樹脂成分を含む。これにより、耐久性が高い照明装置を製造することができる。もちろん、目的や用途によっては、硬化性樹脂成分は熱可塑性樹脂を含んでもよい。 The curable resin component preferably includes a thermosetting resin component. Thereby, a highly durable lighting device can be manufactured. Of course, depending on the purpose and use, the curable resin component may include a thermoplastic resin.
 硬化性樹脂成分は、シリコーン樹脂、エポキシ樹脂等のうち1または2以上を含むことが好ましい。 The curable resin component preferably contains one or more of silicone resins, epoxy resins, etc.
 シリコーン樹脂は、フェニル基および/またはメチル基を有するシリコーン樹脂を含むことが好ましい。このようなシリコーン樹脂は、他の成分との相溶性、溶剤溶解性、塗布性、耐熱性や耐久性などの点で好ましい。この樹脂中のフェニル基:メチル基の比率は、例えば0.3:1から1.5:1程度である。 The silicone resin preferably contains a silicone resin having a phenyl group and/or a methyl group. Such silicone resins are preferable in terms of compatibility with other components, solvent solubility, coatability, heat resistance, durability, and the like. The ratio of phenyl groups to methyl groups in this resin is, for example, about 0.3:1 to 1.5:1.
 硬化性樹脂成分は、反応性基を含むことができる。これにより、硬化性樹脂成分はそれ自身で硬化することができる。
 一例として、硬化性樹脂成分は、シラノール基(-Si-OH)を含むシリコーン樹脂を含むことが好ましい。これにより、塗膜形成時にシラノール基の縮合反応が起こり、硬化した塗膜が得られる。シラノール基(-Si-OH)を含むシリコーン樹脂の、シラノール含有量(OH質量%)は、例えば0.1質量%以上5質量%以下である。
 別の例として、硬化性樹脂成分は、ビニル基含有ポリマーと、Si-H基含有シリコーンポリマのヒドロシリル化反応により硬化するもの(付加反応タイプ)であってもよい。
The curable resin component can include reactive groups. This allows the curable resin component to cure itself.
As an example, the curable resin component preferably includes a silicone resin containing a silanol group (-Si-OH). As a result, a condensation reaction of silanol groups occurs during coating film formation, and a cured coating film is obtained. The silanol content (OH mass %) of the silicone resin containing a silanol group (-Si-OH) is, for example, 0.1 mass % or more and 5 mass % or less.
As another example, the curable resin component may be one that is cured by a hydrosilylation reaction between a vinyl group-containing polymer and a Si-H group-containing silicone polymer (addition reaction type).
 エポキシ樹脂は、分子内にエポキシ基を有するものであればどのようなものでもよい。ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、脂環式エポキシ樹脂、脂肪族鎖状エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビフェノールのジグリシジリエーテル化物、ナフタレンジオールのジグリシジリエーテル化物、フェノール類のジグリシジリエーテル化物、アルコール類のジグリシジルエーテル化物、これらのアルキル置換体、ハロゲン化物、水素添加物などを挙げることができる。 The epoxy resin may be any resin as long as it has an epoxy group in its molecule. Bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, alicyclic epoxy resin, aliphatic chain epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, Examples include diglycidyl etherified products of biphenol, diglycidyl etherified products of naphthalene diol, diglycidyl etherified products of phenols, diglycidyl etherified products of alcohols, alkyl substituted products, halides, hydrogenated products, etc. Can be done.
 エポキシ樹脂を用いる場合、エポキシ樹脂を硬化させることができる硬化剤を用いることが好ましい。硬化剤としては、例えば、多官能フェノール類、アミン類、イミダゾール化合物、酸無水物、有機リン化合物およびこれらのハロゲン化物などがある。
 多官能フェノール類の例として、単環二官能フェノールであるヒドロキノン、レゾルシノール、カテコール,多環二官能フェノールであるビスフェノールA、ビスフェノールF、ナフタレンジオール類、ビフェノール類、及びこれらのハロゲン化物、アルキル基置換体などがある。更に、これらのフェノール類とアルデヒド類との重縮合物であるノボラック、レゾールがある。
 アミン類の例としては、脂肪族あるいは芳香族の第一級アミン、第二級アミン、第三級アミン、第四級アンモニウム塩及び脂肪族環状アミン類、グアニジン類、尿素誘導体等がある。これらの化合物の一例としては、N、N-ベンジルジメチルアミン、2-(ジメチルアミノメチル)フェノール、2、4、6-トリス(ジメチルアミノメチル)フェノール、テトラメチルグアニジン、トリエタノールアミン、N、N'-ジメチルピペラジン、1、4-ジアザビシクロ[2、2、2]オクタン、1、8-ジアザビシクロ[5、4、0]-7-ウンデセン、1、5-ジアザビシクロ[4、4、0]-5-ノネン、ヘキサメチレンテトラミン、ピリジン、ピコリン、ピペリジン、ピロリジン、ジメチルシクロヘキシルアミン、ジメチルヘキシルアミン、シクロヘキシルアミン、ジイソブチルアミン、ジ-n-ブチルアミン、ジフェニルアミン、N-メチルアニリン、トリ-n-プロピルアミン、トリ-n-オクチルアミン、トリ-n-ブチルアミン、トリフェニルアミン、テトラメチルアンモニウムクロライド、テトラメチルアンモニウムブロマイド、テトラメチルアンモニウムアイオダイド、トリエチレンテトラミン、ジアミノジフェニルメタン、ジアミノジフェニルエーテル、ジシアンジアミド、トリルビグアニド、グアニル尿素、ジメチル尿素等がある。
 イミダゾール化合物の例としては、イミダゾール、2-エチルイミダゾール、2-エチル-4-メチルイミダゾール、2-メチルイミダゾール、2-フェニルイミダゾール、2-ウンデシルイミダゾール、1-ベンジル-2-メチルイミダゾール、2-ヘプタデシルイミダゾール、4、5-ジフェニルイミダゾール、2-メチルイミダゾリン、2-フェニルイミダゾリン、2-ウンデシルイミダゾリン、2-ヘプタデシルイミダゾリン、2-イソプロピルイミダゾール、2、4-ジメチルイミダゾール、2-フェニル-4-メチルイミダゾール、2-エチルイミダゾリン、2-フェニル-4-メチルイミダゾリン、ベンズイミダゾール、1-シアノエチルイミダゾールなどがある。
 酸無水物の例としては、無水フタル酸、ヘキサヒドロ無水フタル酸、ピロメリット酸二無水物、ベンゾフェノンテトラカルボン酸二無水物等がある。
 有機リン化合物としては、有機基を有するリン化合物であれば特に限定せれずに使用できる。例えば、ヘキサメチルリン酸トリアミド、リン酸トリ(ジクロロプロピル)、リン酸トリ(クロロプロピル)、亜リン酸トリフェニル、リン酸トリメチル、フェニルフォスフォン酸、トリフェニルフォスフィン、トリ-n-ブチルフォスフィン、ジフェニルフォスフィンなどがある。
When using an epoxy resin, it is preferable to use a curing agent that can harden the epoxy resin. Examples of the curing agent include polyfunctional phenols, amines, imidazole compounds, acid anhydrides, organic phosphorus compounds, and halides thereof.
Examples of polyfunctional phenols include monocyclic difunctional phenols such as hydroquinone, resorcinol, and catechol, polycyclic difunctional phenols such as bisphenol A, bisphenol F, naphthalene diols, biphenols, and their halides and alkyl group-substituted phenols. There are bodies, etc. Furthermore, there are novolacs and resols, which are polycondensates of these phenols and aldehydes.
Examples of amines include aliphatic or aromatic primary amines, secondary amines, tertiary amines, quaternary ammonium salts, aliphatic cyclic amines, guanidines, urea derivatives, and the like. Examples of these compounds include N,N-benzyldimethylamine, 2-(dimethylaminomethyl)phenol, 2,4,6-tris(dimethylaminomethyl)phenol, tetramethylguanidine, triethanolamine, N,N '-dimethylpiperazine, 1,4-diazabicyclo[2,2,2]octane, 1,8-diazabicyclo[5,4,0]-7-undecene, 1,5-diazabicyclo[4,4,0]-5 -Nonene, hexamethylenetetramine, pyridine, picoline, piperidine, pyrrolidine, dimethylcyclohexylamine, dimethylhexylamine, cyclohexylamine, diisobutylamine, di-n-butylamine, diphenylamine, N-methylaniline, tri-n-propylamine, tri- -n-octylamine, tri-n-butylamine, triphenylamine, tetramethylammonium chloride, tetramethylammonium bromide, tetramethylammonium iodide, triethylenetetramine, diaminodiphenylmethane, diaminodiphenyl ether, dicyandiamide, tolylbiguanide, guanylurea, Examples include dimethylurea.
Examples of imidazole compounds include imidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2- Heptadecylimidazole, 4,5-diphenylimidazole, 2-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl-4 - Methylimidazole, 2-ethylimidazoline, 2-phenyl-4-methylimidazoline, benzimidazole, 1-cyanoethylimidazole and the like.
Examples of acid anhydrides include phthalic anhydride, hexahydrophthalic anhydride, pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, and the like.
As the organic phosphorus compound, any phosphorus compound having an organic group can be used without particular limitation. For example, hexamethylphosphoric acid triamide, tri(dichloropropyl) phosphate, tri(chloropropyl) phosphate, triphenyl phosphite, trimethyl phosphate, phenylphosphonic acid, triphenylphosphine, tri-n-butylphosph These include fins and diphenylphosphine.
 エポキシ樹脂の硬化剤は、単独、或いは、組み合わせて用いることもできる。エポキシ樹脂の硬化剤の使用量は、エポキシ基の硬化反応を適切に進行させることができれば、特に限定することなく使用できる。好ましくは、エポキシ基1モルに対して、0.01~5.0当量の範囲で、特に好ましくは0.8~1.2当量の範囲で使用する。 Epoxy resin curing agents can be used alone or in combination. The amount of the curing agent for the epoxy resin to be used is not particularly limited as long as the curing reaction of the epoxy group can proceed appropriately. It is preferably used in an amount of 0.01 to 5.0 equivalents, particularly preferably 0.8 to 1.2 equivalents, per mole of epoxy group.
 本実施形態の蛍光体シートは、必要に応じて硬化促進剤を含んでもよい。代表的な硬化促進剤として、第三級アミン、イミダゾール類、第四級アンモニウム塩等があるが、これに限定されるものではない。 The phosphor sheet of this embodiment may contain a curing accelerator as necessary. Typical curing accelerators include tertiary amines, imidazoles, quaternary ammonium salts, etc., but are not limited thereto.
(その他成分)
 実施形態の蛍光体シートは、ハンドリング性や形状保持性などの観点で、繊維を含んでもよい。換言すると、本実施形態の蛍光体シートは、上述の硬化性樹脂成分などが繊維基材中に含浸してB-ステージ状態となったものであってもよい。
 繊維基材は特に限定されない。ガラスクロス、アラミド不織布、液晶ポリマー不織布等のプリプレグ用基材として常用されているものを用いることができる。
(Other ingredients)
The phosphor sheet of the embodiment may contain fibers from the viewpoint of handling properties, shape retention properties, and the like. In other words, the phosphor sheet of this embodiment may be in a B-stage state by impregnating the above-mentioned curable resin component into a fiber base material.
The fiber base material is not particularly limited. Commonly used base materials for prepregs, such as glass cloth, aramid nonwoven fabric, and liquid crystal polymer nonwoven fabric, can be used.
 ガラスクロスの具体例としては、旭シュエーベル社製の「スタイル1027MS」(経糸密度75本/25mm、緯糸密度75本/25mm、布重量20g/m、厚さ19μm)、旭シュエーベル社製の「スタイル1037MS」(経糸密度70本/25mm、緯糸密度73本/25mm、布重量24g/m、厚さ28μm)、有沢製作所社製の「1078」(経糸密度54本/25mm、緯糸密度54本/25mm、布重量48g/m、厚さ43μm)、有沢製作所社製の「1037NS」(経糸密度72本/25mm、緯糸密度69本/25mm、布重量23g/m、厚さ21μm)、有沢製作所社製の「1027NS」(経糸密度75本/25mm、緯糸密度75本/25mm、布重量19.5g/m、厚さ16μm)、有沢製作所社製の「1015NS」(経糸密度95本/25mm、緯糸密度95本/25mm、布重量17.5g/m、厚さ15μm)、有沢製作所社製の「1000NS」(経糸密度85本/25mm、緯糸密度85本/25mm、布重量11g/m、厚さ10μm)等が挙げられる。また液晶ポリマー不織布の具体例としては、クラレ社製の、芳香族ポリエステル不織布のメルトブロー法による「ベクルス」(目付け量6~15g/m)や「ベクトラン」などが挙げられる。 Specific examples of glass cloth include "Style 1027MS" manufactured by Asahi Schwebel (warp density 75/25 mm, weft density 75/25 mm, cloth weight 20 g/m 2 , thickness 19 μm), "Style 1027MS" manufactured by Asahi Schwebel Style 1037MS" (warp density 70/25mm, weft density 73/25mm, fabric weight 24g/ m2 , thickness 28μm), Arisawa Seisakusho's "1078" (warp density 54/25mm, weft density 54 /25mm, cloth weight 48g/ m2 , thickness 43μm), "1037NS" manufactured by Arisawa Seisakusho (warp density 72/25mm, weft density 69/25mm, cloth weight 23g/ m2 , thickness 21μm), "1027NS" manufactured by Arisawa Seisakusho Co., Ltd. (warp density 75 threads/25 mm, weft density 75 threads/25 mm, fabric weight 19.5 g/m 2 , thickness 16 μm), "1015NS" manufactured by Arisawa Seisakusho Co., Ltd. (warp density 95 threads/25 mm) /25mm, weft density 95/25mm, fabric weight 17.5g/ m2 , thickness 15μm), "1000NS" manufactured by Arisawa Seisakusho (warp density 85/25mm, weft density 85/25mm, fabric weight 11g) /m 2 , thickness 10 μm), etc. Further, specific examples of the liquid crystal polymer nonwoven fabric include "Veklus" (basis weight 6 to 15 g/m 2 ) and "Vectran" produced by the melt-blowing aromatic polyester nonwoven fabric manufactured by Kuraray Co., Ltd.
 また、本実施形態の蛍光体シートは、製造適性の観点から、流動性調整剤を含んでもよい。
 流動性調整剤としては、疎水性シリカ、親水性シリカなどのシリカ粒子、酸化アルミニウム等が適用できる。特に、フュームドシリカが好ましく用いられる。市販の流動性調整剤として、例えば、AEROSIL 130、AEROSIL 200、AEROSIL 300、AEROSIL R-972、AEROSIL R-812、AEROSIL R-812S、AlminiumOxideC(日本アエロジル社製、AEROSILは登録商標)、カープレックスFPS-1(DSL社製、商品名)等が挙げられる。
Further, the phosphor sheet of this embodiment may contain a fluidity regulator from the viewpoint of manufacturing suitability.
As the fluidity modifier, silica particles such as hydrophobic silica and hydrophilic silica, aluminum oxide, etc. can be used. In particular, fumed silica is preferably used. Commercially available fluidity modifiers include, for example, AEROSIL 130, AEROSIL 200, AEROSIL 300, AEROSIL R-972, AEROSIL R-812, AEROSIL R-812S, Aluminum Oxide C (manufactured by Nippon Aerosil Co., Ltd., AEROSIL is a registered trademark). ), Carplex FPS -1 (manufactured by DSL, trade name).
(貫通孔)
 本実施形態の蛍光体シートは、好ましくは貫通孔を有する。これは、後述する照明装置の製造において、発光素子と銅配線とを電気的に接続するためである。
 貫通孔の位置、大きさ、形状、数などは、最終的に得ようとする照明装置の設計に応じて適宜決定すればよい。
 貫通孔は、例えば打ち抜き加工により設けることができる。もちろん、貫通孔はその他の方法で設けてもよい。
(through hole)
The phosphor sheet of this embodiment preferably has through holes. This is for electrically connecting the light emitting element and the copper wiring in manufacturing the lighting device, which will be described later.
The position, size, shape, number, etc. of the through holes may be determined as appropriate depending on the design of the illumination device to be finally obtained.
The through hole can be provided, for example, by punching. Of course, the through holes may be provided in other ways.
(蛍光体シートの製造方法)
 本実施形態の蛍光体シートは、硬化性樹脂組成物に関する公知の知見に基づき製造することができる。
 一例として、本実施形態の蛍光体シートは、電気電子部品の製造に用いられる「プリプレグ」の製造方法に倣って製造することができる。一例として、本実施形態の蛍光体シートは、(1)まず、繊維基材以外の成分を、有機溶剤に溶解または分散させてワニスを製造し、(2)そのワニスを繊維基材に含浸させ、(3)ワニスが完全硬化しない(B-ステージ状態となる)温度・時間加熱する、という工程で製造することができる。もちろん、これ以外の方法(例えば、溶剤を用いないホットメルト法)で製造してもよい。
 プリプレグの製造方法に関しては種々の公知文献に記載されているため、本実施形態の蛍光体シートを製造する際にも参考とすることができる。プリプレグの製造方法は、例えば特開2020-139164号公報、特開2004-188652号公報などに記載されている。
(Method for manufacturing phosphor sheet)
The phosphor sheet of this embodiment can be manufactured based on known knowledge regarding curable resin compositions.
As an example, the phosphor sheet of this embodiment can be manufactured by following the manufacturing method of "prepreg" used for manufacturing electrical and electronic parts. As an example, in the phosphor sheet of this embodiment, (1) first, components other than the fiber base material are dissolved or dispersed in an organic solvent to produce a varnish, and (2) the fiber base material is impregnated with the varnish. (3) The varnish can be manufactured by heating at a temperature and for a time that does not completely cure the varnish (becomes in a B-stage state). Of course, other methods (for example, a hot melt method that does not use a solvent) may be used.
The prepreg manufacturing method is described in various known documents, so it can be used as a reference when manufacturing the phosphor sheet of this embodiment. Methods for manufacturing prepreg are described, for example, in JP-A No. 2020-139164, JP-A No. 2004-188652, and the like.
<照明装置>
 本実施形態の照明装置は、
 (i)絶縁基板と、
 (ii)上記絶縁基板の片面側に設けられた、上記の蛍光体シートの硬化物である蛍光層と、
 (iii)上記蛍光層における上記絶縁基板と反対側の面に設置された発光素子と、
を備える。
<Lighting device>
The lighting device of this embodiment is
(i) an insulating substrate;
(ii) a phosphor layer that is a cured product of the phosphor sheet, provided on one side of the insulating substrate;
(iii) a light emitting element installed on the surface of the fluorescent layer opposite to the insulating substrate;
Equipped with
 また、本実施形態の照明装置は、上記絶縁基板と、上記蛍光層との間に、さらに白色層を備えることが好ましい。 Furthermore, the lighting device of this embodiment preferably further includes a white layer between the insulating substrate and the fluorescent layer.
 本実施形態の照明装置は、例えば、図1~5に示すような手順で製造することができる。 The lighting device of this embodiment can be manufactured, for example, by the steps shown in FIGS. 1 to 5.
・図1
 まず、図1に示したような、少なくとも絶縁基板20を備える基板を準備する。
 絶縁基板20の一方の面には、通常、第一銅箔22Aが設けられている。第一銅箔22Aの一部はエッチングにより除去されており、銅回路(銅配線)として機能する。また、絶縁基板20の他方の面には、第二銅箔22Bが設けられていてもよい。
・Figure 1
First, a substrate including at least an insulating substrate 20 as shown in FIG. 1 is prepared.
A first copper foil 22A is normally provided on one surface of the insulating substrate 20. A part of the first copper foil 22A is removed by etching and functions as a copper circuit (copper wiring). Further, a second copper foil 22B may be provided on the other surface of the insulating substrate 20.
 絶縁基板20の材質としては、PWB(プリント基板)への使用が知られているものであれば特に制限されない。例えば、ポリイミド樹脂、シリコーン樹脂、(メタ)アクリル樹脂、ユリア樹脂、エポキシ樹脂、フッ素樹脂、ガラス、金属(アルミニウム、銅、鉄、ステンレス鋼など)といったものを使用できる。好ましくは耐熱性の観点から、ポリイミド樹脂やシリコーン樹脂、ガラスや金属(ベースメタルとしてアルミニウムや銅を使い、絶縁層を設けたいわゆる「メタル基板」など)を使用できる。「ボンディングシート」等の名称で市販されている材料を用いることも好ましい。
 絶縁基板20の厚さは、照明器具に用いることができる範囲ならば特に制限されない。例えば50μm以上1000μm以下、具体的には50μm以上500μm以下である。
The material of the insulating substrate 20 is not particularly limited as long as it is known to be used for PWBs (printed circuit boards). For example, polyimide resin, silicone resin, (meth)acrylic resin, urea resin, epoxy resin, fluororesin, glass, metal (aluminum, copper, iron, stainless steel, etc.) can be used. Preferably, from the viewpoint of heat resistance, polyimide resin, silicone resin, glass, or metal (such as a so-called "metal substrate" in which aluminum or copper is used as a base metal and an insulating layer is provided) can be used. It is also preferable to use a material commercially available under the name of "bonding sheet" or the like.
The thickness of the insulating substrate 20 is not particularly limited as long as it can be used for lighting equipment. For example, it is 50 μm or more and 1000 μm or less, specifically 50 μm or more and 500 μm or less.
 第一銅箔22Aは、後述のように、表面実装型LED素子28と、はんだ30により電気的に接続される。第一銅箔22Aおよびはんだ30により、表面実装型LED素子28に電気が供給されて、表面実装型LED素子28は発光する。
 絶縁基板20の一方の面に第一銅箔22Aがあり、他方の面に第二銅箔22Bがあることで、絶縁基板20の両面で力のバランスが取れ、例えば反りの発生が抑えられることがある。
The first copper foil 22A is electrically connected to the surface-mounted LED element 28 by solder 30, as described later. Electricity is supplied to the surface-mounted LED element 28 by the cuprous foil 22A and the solder 30, and the surface-mounted LED element 28 emits light.
By having the first copper foil 22A on one side of the insulating substrate 20 and the second copper foil 22B on the other side, the force can be balanced on both sides of the insulating substrate 20, and the occurrence of warping, for example, can be suppressed. There is.
・図2
 好ましくは、図1に示した基板の、第一銅箔22Aの面側に、白色層24を設ける。白色層24は、例えば、上述した<蛍光体シート>において、蛍光体粒子の代わりに白色粒子(典型的には酸化チタンやアルミナなどの白色顔料)を用いて製造した、B-ステージ状態の「白色シート」を用いて設けることができる。白色シートは、発光素子と銅配線とを電気的に接続するための貫通孔を有していることが好ましい。白色層24を設ける具体的条件は、後述する蛍光層の形成と同様とすることができる。
 白色層24の厚みは、通常20~150μm、好ましくは30~120μm、より、好ましくは35~100μmである。特に、白色シートが貫通孔を有する場合、白色層24の厚みは、20~100μmとすることが好ましく、白色層24の厚みと後述する蛍光層26との合計厚みを100μm以下とすることがより好ましい。
 また、白色シートが貫通孔を有する場合、適切な手段により、貫通孔の位置が、第一銅箔22Aにおけるはんだ付けされるべき部分と一致するようにすることが好ましい。
・Figure 2
Preferably, the white layer 24 is provided on the side of the first copper foil 22A of the substrate shown in FIG. The white layer 24 is, for example, a B-stage "phosphor sheet" manufactured by using white particles (typically a white pigment such as titanium oxide or alumina) instead of the phosphor particles in the above-mentioned <phosphor sheet>. It can be provided using a "white sheet". It is preferable that the white sheet has a through hole for electrically connecting the light emitting element and the copper wiring. The specific conditions for providing the white layer 24 can be the same as those for forming the fluorescent layer, which will be described later.
The thickness of the white layer 24 is usually 20 to 150 μm, preferably 30 to 120 μm, and more preferably 35 to 100 μm. In particular, when the white sheet has through-holes, the thickness of the white layer 24 is preferably 20 to 100 μm, and it is more preferable that the total thickness of the white layer 24 and the fluorescent layer 26 described below be 100 μm or less. preferable.
Moreover, when the white sheet has a through hole, it is preferable that the position of the through hole coincides with the portion of the first copper foil 22A to be soldered by appropriate means.
・図3
 白色層24の露出面(白色層24を設けない場合には、第一銅箔22Aの露出面)に、蛍光層26を設ける。蛍光層26は、上述の蛍光体シートを用いて設けることができる。
 ちなみに、図3において、蛍光層26は、後述の工程で発光素子と銅配線とを電気的に接続するための開口部(貫通孔)を有している。蛍光体シートが貫通孔を有する場合、適切な手段により、開口部(貫通孔)の位置が、第一銅箔22Aにおけるはんだ付けされるべき部分と一致するようにすることが好ましい。
・Figure 3
A fluorescent layer 26 is provided on the exposed surface of the white layer 24 (in the case where the white layer 24 is not provided, the exposed surface of the first copper foil 22A). The fluorescent layer 26 can be provided using the above-mentioned phosphor sheet.
Incidentally, in FIG. 3, the fluorescent layer 26 has an opening (through hole) for electrically connecting the light emitting element and the copper wiring in a process described later. When the phosphor sheet has a through hole, it is preferable that the position of the opening (through hole) coincides with the portion of the first copper foil 22A to be soldered by appropriate means.
 例えば、上述の蛍光体シートを、真空ラミネート法により、白色層24の露出面に積層することができる。真空ラミネート法の条件は特に限定されないが、加熱圧着温度は、好ましくは60~160℃、より好ましくは80~140℃である。加熱圧着圧力は、好ましくは0.098~1.77MPa、より好ましくは0.29~1.47MPaである。加熱圧着時間は、好ましくは20~400秒間、より好ましくは30~300秒である。積層は、好ましくは圧力26.7hPa以下の減圧条件下で実施する。 For example, the above-mentioned phosphor sheet can be laminated on the exposed surface of the white layer 24 by a vacuum lamination method. The conditions for the vacuum lamination method are not particularly limited, but the temperature for heat-pressing is preferably 60 to 160°C, more preferably 80 to 140°C. The heating pressure is preferably 0.098 to 1.77 MPa, more preferably 0.29 to 1.47 MPa. The heat and pressure bonding time is preferably 20 to 400 seconds, more preferably 30 to 300 seconds. Lamination is preferably carried out under reduced pressure conditions of 26.7 hPa or less.
 真空ラミネートの後に、蛍光体シートに押圧力を加えることにより、蛍光体シートの平滑化処理を行ってもよい。 After vacuum lamination, the phosphor sheet may be smoothed by applying a pressing force to the phosphor sheet.
 白色層24の露出面に積層され、場合によっては平滑化処理された蛍光体シートを、加熱する。これにより蛍光体シート中の未硬化成分が硬化し、蛍光層26を設けることができる。ここでの加熱条件は特に限定されないが、例えば硬化温度は120~240℃、好ましくは150~220℃、より好ましくは170~200℃であり、硬化時間は5~120分、好ましくは10~100分、より好ましくは15~90分とすることができる。 A phosphor sheet laminated on the exposed surface of the white layer 24 and, if necessary, smoothed, is heated. As a result, the uncured components in the phosphor sheet are cured, and the phosphor layer 26 can be provided. The heating conditions here are not particularly limited, but for example, the curing temperature is 120 to 240°C, preferably 150 to 220°C, more preferably 170 to 200°C, and the curing time is 5 to 120 minutes, preferably 10 to 100°C. minutes, more preferably 15 to 90 minutes.
 以上のような蛍光層26の形成方法はあくまで一例である。上記とは異なる、公知のプリプレグの積層・硬化方法などを参考にして蛍光層26を設けてもよい。 The method for forming the fluorescent layer 26 as described above is just an example. The fluorescent layer 26 may be provided using a known method for laminating and curing prepreg, which is different from the above method.
・図4および図5
 蛍光層26の開口部(貫通孔)の部分にはんだ30を置く。その後、そのはんだ30の上に表面実装型LED素子28を置く。そして、例えばリフロー法によりはんだを融解させて、表面実装型LED素子28と第一銅箔22Aとをはんだ付けし、電気的に接続する。はんだ付けの具体的方法や条件は特に限定されない。
 ちなみに、はんだ30を、あらかじめ第一銅箔22Aに付けておいてもよい。
・Figures 4 and 5
Solder 30 is placed in the opening (through hole) of the fluorescent layer 26 . Thereafter, the surface-mounted LED element 28 is placed on the solder 30. Then, the surface-mounted LED element 28 and the first copper foil 22A are soldered and electrically connected by melting the solder using, for example, a reflow method. The specific method and conditions for soldering are not particularly limited.
Incidentally, the solder 30 may be applied to the first copper foil 22A in advance.
 以上のようにして、照明装置を製造することができる。
 ちなみに、図5に示すように、照明装置には、複数の発光素子(表面実装型LED素子28)が設置されていてもよい。
A lighting device can be manufactured in the manner described above.
Incidentally, as shown in FIG. 5, a plurality of light emitting elements (surface-mounted LED elements 28) may be installed in the lighting device.
・補足
 白色層24を設ける工程や、蛍光層26を設ける工程では、膜厚の調整などを目的として、スペーサー(シム)を用いてもよい。すなわち、スペーサーを用いたうえで加熱、押圧などを施すことで白色層24や蛍光層26を設けてもよい。
- Supplementary information In the step of providing the white layer 24 and the step of providing the fluorescent layer 26, a spacer (shim) may be used for the purpose of adjusting the film thickness. That is, the white layer 24 and the fluorescent layer 26 may be provided by heating, pressing, etc. using a spacer.
 また、図3や図4において、樹脂シートの素材やプロセス条件によっては、B-ステージ状態のシートを加熱したときに軟化した樹脂成分が、第一銅箔22Aにおける表面実装型LED素子28とはんだ付けされるべき部分に「流れ出してしまう」ことが考えられる。こうなった場合には第一銅箔22Aと表面実装型LED素子28とを電気的に接続できなくなる可能性がある。
 これを防ぐ方法の1つとして、樹脂シートの素材やプロセス条件の変更が考えられる。別の方法として、第一銅箔22Aにおける表面実装型LED素子28がはんだ付けされるべき部分を、適当な部材、例えばスプリングピンなどを一時的に用いることで「保護しておく」ことが考えられる。さらに別の方法として、上述のように、はんだ30を、あらかじめ第一銅箔22Aに付けておけば、原理的に、軟化した樹脂成分が、第一銅箔22Aにおける表面実装型LED素子28とはんだ付けされるべき部分に「流れ出してしまう」ことは防止できる。
In addition, in FIGS. 3 and 4, depending on the material of the resin sheet and process conditions, the resin component softened when the sheet in the B-stage state is heated may be soldered to the surface-mounted LED element 28 in the cuprous foil 22A. It is conceivable that the paint may "bleed out" into the area where it should be attached. In this case, there is a possibility that the first copper foil 22A and the surface-mounted LED element 28 cannot be electrically connected.
One possible way to prevent this is to change the material of the resin sheet or the process conditions. Another method is to "protect" the part of the first copper foil 22A to which the surface-mounted LED element 28 is to be soldered by temporarily using a suitable member, such as a spring pin. It will be done. As another method, as described above, if the solder 30 is applied to the first copper foil 22A in advance, the softened resin component can theoretically be applied to the surface-mounted LED element 28 on the first copper foil 22A. It is possible to prevent "bleeding" onto the parts to be soldered.
・表面実装型LED素子28について
 本実施形態においては、発光素子(表面実装型LED素子28)は、リフレクタを備えないことが好ましい。具体的に説明すると、公知の表面実装型LED素子(発光素子)の中には、図6Aのように、リフレクタが備わっていることにより、光が横方向や下方向に漏れ出ないものある。しかし、本実施形態においては、発光素子(表面実装型LED素子28)は、図6Bのようにリフレクタを備えないことが好ましい。
 リフレクタを備えない発光素子を用いることで、LEDチップからの光が横方向や下方向に漏れ出る。そして、その漏れ出た光が蛍光層26のαで示した部分に当たり、αの部分が発光する。これにより、グレアや多重影の問題が一層軽減される。
- Regarding the surface-mounted LED element 28 In this embodiment, the light-emitting element (surface-mounted LED element 28) preferably does not include a reflector. Specifically, some known surface-mounted LED elements (light emitting elements) are equipped with a reflector, as shown in FIG. 6A, so that light does not leak out laterally or downwardly. However, in this embodiment, it is preferable that the light emitting element (surface-mounted LED element 28) does not include a reflector as shown in FIG. 6B.
By using a light emitting element without a reflector, light from the LED chip leaks laterally and downward. Then, the leaked light hits a portion of the fluorescent layer 26 indicated by α, and the portion indicated by α emits light. This further reduces glare and multiple shadow problems.
 図6Aの発光素子では、基板102とリフレクタ(筐体)104により形成されるパッケージ状部108に、半導体発光素子100が配置され、パッケージ状部108には封止部材110(光透過性の樹脂)が充填されている。基板102は配線112を備えることができる。
 図6Bにおいて、図2Aと同一の要素には同一の符号が付されている。図2Bの発光素子では、筐体(リフレクタ)は用いられない。図示されるように半導体発光素子100をマウントした後、所望の型を用いた型成形により封止部材110を形成することができる。または、予め所望の形状に成形した封止部材110を用意しておき、これを、半導体発光素子100を覆うように基板102に接着させてもよい。
In the light-emitting element of FIG. 6A, the semiconductor light-emitting element 100 is arranged in a package-shaped part 108 formed by a substrate 102 and a reflector (housing) 104, and a sealing member 110 (light-transmitting resin) is placed in the package-shaped part 108. ) is filled. Substrate 102 can include wiring 112 .
In FIG. 6B, the same elements as in FIG. 2A are given the same reference numerals. In the light emitting element of FIG. 2B, a housing (reflector) is not used. After mounting the semiconductor light emitting device 100 as illustrated, the sealing member 110 can be formed by molding using a desired mold. Alternatively, the sealing member 110 may be prepared in advance and molded into a desired shape, and may be adhered to the substrate 102 so as to cover the semiconductor light emitting element 100.
 以上、本発明の実施形態について述べたが、これらは本発明の例示であり、上記以外の様々な構成を採用することができる。また、本発明は上述の実施形態に限定されるものではなく、本発明の目的を達成できる範囲での変形、改良等は本発明に含まれる。 Although the embodiments of the present invention have been described above, these are merely examples of the present invention, and various configurations other than those described above can be adopted. Furthermore, the present invention is not limited to the above-described embodiments, and the present invention includes modifications, improvements, etc. within a range that can achieve the purpose of the present invention.
 本発明の実施態様を、実施例および比較例に基づき詳細に説明する。念のため述べておくと、本発明は実施例のみに限定されない。 Embodiments of the present invention will be described in detail based on Examples and Comparative Examples. It should be noted that the present invention is not limited only to the embodiments.
<蛍光体粒子の準備>
・CASN-1:デンカ社製のCASN系蛍光体、品番RE-650YMDB、D50=15.7μm
・CASN-2:デンカ社製のCASN系蛍光体、品番RE-Sample 650SD4、D50=3.2μm
<Preparation of phosphor particles>
・CASN-1: CASN-based phosphor manufactured by Denka, product number RE-650YMDB, D 50 = 15.7 μm
・CASN-2: CASN-based phosphor manufactured by Denka, product number RE-Sample 650SD4, D 50 = 3.2 μm
<シリコーン樹脂を用いた蛍光体シートの製造>
 上記蛍光体粒子のほか、以下材料を準備した。
・硬化性樹脂成分:東レ・ダウコーニング社のシリコーンレジン「RSN-0805」(シラノール基含有、シラノール含有量(OH質量)1%、二酸化珪素含有量48質量%、フェニル:メチル比=1.1:1、重量平均分子量200~300×10、キシレン含有、樹脂固形分50重量%)
・流動性調整剤:日本アエロジル社のフュームドシリカ AEROSIL 200
・溶剤:ブチルカルビトール
<Manufacture of phosphor sheet using silicone resin>
In addition to the phosphor particles mentioned above, the following materials were prepared.
- Curable resin component: Dow Corning Toray silicone resin "RSN-0805" (silanol group content, silanol content (OH mass) 1%, silicon dioxide content 48 mass%, phenyl:methyl ratio = 1.1 :1, weight average molecular weight 200-300×10 3 , xylene content, resin solid content 50% by weight)
・Fluidity modifier: Nippon Aerosil Co., Ltd.'s fumed silica AEROSIL 200
・Solvent: Butyl carbitol
 表1に記載の成分のうち、まず、硬化性樹脂成分(シリコーンレジン)と溶剤とを混合して均一な溶液を得た。
 その後、その溶液に蛍光体粒子および流動性調整剤(実施例3のみ)を投入し、均一に混合・分散して、シリコーン樹脂ワニス1-1~1-4を得た。
Among the components listed in Table 1, a curable resin component (silicone resin) and a solvent were first mixed to obtain a uniform solution.
Thereafter, phosphor particles and a fluidity modifier (Example 3 only) were added to the solution and uniformly mixed and dispersed to obtain silicone resin varnishes 1-1 to 1-4.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 上記のシリコーン樹脂ワニスを、市場で入手可能な繊維基材(ガラスクロス)に含浸し、縦型乾燥炉にて乾燥させた。冷却後、打ち抜き加工により、発光素子と銅配線との接続のための貫通孔を設けた。このようにして、シリコーン樹脂系蛍光体シート2-1~2-4を作製した。
 ちなみに、乾燥条件(温度および時間)は、シリコーン樹脂系蛍光体シートがB-ステージ状態となるように調整した。また、後述する蛍光体層の厚み(50μm)を踏まえ、繊維基材(ガラスクロス)については適切な厚みのものを選択した。
A commercially available fiber base material (glass cloth) was impregnated with the above silicone resin varnish and dried in a vertical drying oven. After cooling, a through hole for connecting the light emitting element and the copper wiring was formed by punching. In this way, silicone resin phosphor sheets 2-1 to 2-4 were produced.
Incidentally, the drying conditions (temperature and time) were adjusted so that the silicone resin phosphor sheet was in a B-stage state. Further, based on the thickness of the phosphor layer (50 μm) described later, a fiber base material (glass cloth) having an appropriate thickness was selected.
<エポキシ樹脂を用いた蛍光体シートの製造>
 まず、以下組成のエポキシ樹脂ワニス2-1~2-4を準備した。
・ビスフェノールA型エポキシ樹脂 640質量部
・ビスフェノールAノボラック樹脂 25質量部
・エチルメチルイミダゾール 0.2部質量部
・蛍光体粒子 下表に示す量
・メチルエチルケトン溶剤 樹脂ワニスの粘度がおおよそ0.1Ns/mとなる量
<Manufacture of phosphor sheet using epoxy resin>
First, epoxy resin varnishes 2-1 to 2-4 having the following compositions were prepared.
・Bisphenol A type epoxy resin 640 parts by mass ・Bisphenol A novolac resin 25 parts by mass ・Ethyl methyl imidazole 0.2 parts by mass ・Phosphor particles in the amount shown in the table below ・Methyl ethyl ketone solvent The viscosity of the resin varnish is approximately 0.1 Ns/m amount that becomes 2
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 上記のエポキシ樹脂ワニスを、市場で入手可能な繊維基材(ガラスクロス)に含浸し、縦型乾燥炉にて135℃で5分間乾燥させた。冷却後、打ち抜き加工により、発光素子と銅配線との接続のための貫通孔を設けた。このようにして、B-ステージ状態の、エポキシ樹脂系蛍光体シート2-1~2-4を作製した。
 ちなみに、後述する蛍光体層の厚み(50μm)を踏まえ、繊維基材(ガラスクロス)については適切な厚みのものを選択した。
A commercially available fiber base material (glass cloth) was impregnated with the above epoxy resin varnish and dried at 135° C. for 5 minutes in a vertical drying oven. After cooling, a through hole for connecting the light emitting element and the copper wiring was formed by punching. In this way, epoxy resin phosphor sheets 2-1 to 2-4 in a B-stage state were produced.
Incidentally, the fiber base material (glass cloth) was selected to have an appropriate thickness based on the thickness (50 μm) of the phosphor layer described later.
<白色シートの製造>
 蛍光体粒子の代わりに、酸化チタン/アルミナ混合粒子を、不揮発成分中の量が50vol%となるように用いたこと、および、ガラスクロスの厚みを適宜変更したこと以外は、上記<シリコーン樹脂を用いた蛍光体シートの製造>と同様にして、シリコーン樹脂系白色シートを製造した。
 また、蛍光体粒子の代わりに、酸化チタン/アルミナ混合粒子を、不揮発成分中の量が50vol%となるように用いたこと、および、ガラスクロスの厚みを適宜変更したこと以外は、上記<エポキシ樹脂を用いた蛍光体シートの製造>と同様にして、エポキシ樹脂系白色シートを製造した。
<Manufacture of white sheet>
Except that titanium oxide/alumina mixed particles were used instead of the phosphor particles so that the amount in the nonvolatile components was 50 vol%, and the thickness of the glass cloth was changed as appropriate, A silicone resin-based white sheet was manufactured in the same manner as in <Manufacture of Phosphor Sheet Used>.
In addition, the above-mentioned <Epoxy An epoxy resin-based white sheet was manufactured in the same manner as in ``Manufacture of Phosphor Sheet Using Resin''.
<照明装置の作製(シリコーン系)>
 上記の蛍光体シートなどを用い、複数個のCSPが、一定間隔をあけて、蛍光体層の上に整列した照明装置を作製した。製造手順を以下に簡単に示す。
(1)絶縁基板の材料として、両面銅箔を張り合わせた利昌工業社製のボンディングシートCS-3305Aを準備した。これの銅箔をエッチングして第一銅箔に銅回路を形成するなどした。
(2)第一銅箔の上に、上記のシリコーン樹脂系白色シートを置き、20kgf/cmの圧力で、温度190℃で90分間プレスした。これにより厚さ35μmの白色層を形成した。
(3)白色層の上に、上記のシリコーン樹脂系蛍光体シート(1-1~1-4のいずれか)を置き、20kgf/cmの圧力で、温度190℃で90分間プレスした。これにより厚さ50μmの蛍光体層を形成した。
(4)表面実装型LED素子である市販のCSP(WICOP SZ8-Y15-WW-C8、ソウル半導体社製、リフレクタ無し品、色温度2200~2300K)と、第一銅箔(銅回路)とを、はんだにより電気的に接続した。
<Production of lighting device (silicone type)>
Using the above phosphor sheet and the like, a lighting device was manufactured in which a plurality of CSPs were arranged on a phosphor layer at regular intervals. The manufacturing procedure is briefly shown below.
(1) As a material for the insulating substrate, a bonding sheet CS-3305A manufactured by Risho Kogyo Co., Ltd., which was laminated with copper foil on both sides, was prepared. This copper foil was etched to form a copper circuit on the first copper foil.
(2) The silicone resin white sheet described above was placed on the cuprous foil and pressed at a pressure of 20 kgf/cm 2 and a temperature of 190° C. for 90 minutes. This formed a white layer with a thickness of 35 μm.
(3) The above silicone resin phosphor sheet (any one of 1-1 to 1-4) was placed on the white layer and pressed at a pressure of 20 kgf/cm 2 and a temperature of 190° C. for 90 minutes. As a result, a phosphor layer with a thickness of 50 μm was formed.
(4) A commercially available CSP (WICOP SZ8-Y15-WW-C8, manufactured by Seoul Semiconductor Co., Ltd., product without reflector, color temperature 2200-2300K), which is a surface-mounted LED element, and cuprous foil (copper circuit). , electrically connected by soldering.
 なお、上記(2)および(3)においては、各シートの貫通孔の位置が、(4)でCSPと第一銅箔とを接続する位置となるようにした。 In addition, in the above (2) and (3), the position of the through hole in each sheet was set to be the position where the CSP and the first copper foil were connected in (4).
<照明装置の作製(エポキシ系)>
 上記の蛍光体シートなどを用い、複数個のCSPが、一定間隔をあけて、蛍光体層の上に整列した照明装置を作製した。製造手順を以下に簡単に示す。
(1)絶縁基板の材料として、両面銅箔を張り合わせた利昌工業社製のボンディングシートCS-3305Aを準備した。これの銅箔をエッチングして第一銅箔に銅回路を形成するなどした。
(2)第一銅箔の上に、上記のエポキシ樹脂系白色シートを置き、20kgf/cmの圧力で、温度190℃で90分間プレスした。これにより厚さ35μmの白色層を形成した。
(3)白色層の上に、上記のエポキシ樹脂系蛍光体シート(2-1~2-4のいずれか)を置き、20kgf/cmの圧力で、温度190℃で90分間プレスした。これにより厚さ50μmの蛍光体層を形成した。
(4)表面実装型LED素子である市販のCSP(WICOP SZ8-Y15-WW-C8、ソウル半導体社製、リフレクタ無し品、色温度2200~2300K)と、第一銅箔(銅回路)とを、はんだにより電気的に接続した。
<Production of lighting device (epoxy system)>
Using the above phosphor sheet and the like, a lighting device was manufactured in which a plurality of CSPs were arranged on a phosphor layer at regular intervals. The manufacturing procedure is briefly shown below.
(1) As a material for the insulating substrate, a bonding sheet CS-3305A manufactured by Risho Kogyo Co., Ltd., which was laminated with copper foil on both sides, was prepared. This copper foil was etched to form a copper circuit on the first copper foil.
(2) The above white epoxy resin sheet was placed on the cuprous foil and pressed at a pressure of 20 kgf/cm 2 and a temperature of 190° C. for 90 minutes. This formed a white layer with a thickness of 35 μm.
(3) The above epoxy resin phosphor sheet (any one of 2-1 to 2-4) was placed on the white layer and pressed at a pressure of 20 kgf/cm 2 and a temperature of 190° C. for 90 minutes. As a result, a phosphor layer with a thickness of 50 μm was formed.
(4) A commercially available CSP (WICOP SZ8-Y15-WW-C8, manufactured by Seoul Semiconductor Co., Ltd., product without reflector, color temperature 2200-2300K), which is a surface-mounted LED element, and cuprous foil (copper circuit). , electrically connected by soldering.
 なお、上記(2)および(3)においては、各シートの貫通孔の位置が、(4)でCSPと第一銅箔とを接続する位置となるようにした。 In addition, in the above (2) and (3), the position of the through hole in each sheet was set to be the position where the CSP and the first copper foil were connected in (4).
<評価:色温度の変換>
 上記で作製した各照明装置に電流を流し、照明装置を発光させた。照明装置から発せられる光の色温度を、大塚電子株式会社製の全光束測定システム(積分球を備える装置)を用いて測定した。測定された色温度が2000~2100Kであり、CSPそのものの色温度(2200~2300K)から少なくとも100K以上色温度が変換された場合を、色温度変換性「良好」と評価した。
<Evaluation: Color temperature conversion>
A current was applied to each lighting device produced above to cause the lighting device to emit light. The color temperature of the light emitted from the lighting device was measured using a total luminous flux measurement system (device equipped with an integrating sphere) manufactured by Otsuka Electronics Co., Ltd. When the measured color temperature was 2000 to 2100K and the color temperature was converted by at least 100K from the color temperature of the CSP itself (2200 to 2300K), the color temperature conversion property was evaluated as "good".
 結果、作成したすべての照明装置について、色温度変換性は「良好」であった。 As a result, the color temperature conversion properties of all the lighting devices produced were "good."
 以上、B-ステージ状態の蛍光体「シート」を用いることにより、塗料を用いないで簡便なプロセスで蛍光体層を形成すること、また、照明装置を製造することができた。 As described above, by using the phosphor "sheet" in the B-stage state, it was possible to form a phosphor layer in a simple process without using paint, and to manufacture a lighting device.
 この出願は、2022年3月25日に出願された日本出願特願2022-049903号を基礎とする優先権を主張し、その開示の全てをここに取り込む。 This application claims priority based on Japanese Patent Application No. 2022-049903 filed on March 25, 2022, and the entire disclosure thereof is incorporated herein.
 20  絶縁基板
 22A 第一銅箔
 22B 第二銅箔
 24  白色層
 26  蛍光層
 28  表面実装型LED素子
 30  はんだ
 100 半導体発光素子
 102 基板
 104 リフレクタ(筐体)
 108 パッケージ状部
 110 封止部材
 112 配線
20 Insulating substrate 22A Cuprous foil 22B Cupric foil 24 White layer 26 Fluorescent layer 28 Surface-mounted LED element 30 Solder 100 Semiconductor light emitting element 102 Substrate 104 Reflector (housing)
108 Package-shaped part 110 Sealing member 112 Wiring

Claims (13)

  1.  蛍光体粒子と、硬化性樹脂成分と、を含み、B-ステージ状態にある熱硬化性樹脂組成物で構成され、厚みが20~150μmである蛍光体シート。 A phosphor sheet comprising a thermosetting resin composition in a B-stage state, including phosphor particles and a curable resin component, and having a thickness of 20 to 150 μm.
  2.  請求項1に記載の蛍光体シートであって、
     前記硬化性樹脂成分が、エポキシ樹脂およびシリコーン樹脂からなる群より選ばれる少なくとも1種を含む蛍光体シート。
    The phosphor sheet according to claim 1,
    A phosphor sheet in which the curable resin component contains at least one selected from the group consisting of epoxy resins and silicone resins.
  3.  請求項1または2に記載の蛍光体シートであって、
     貫通孔を有する蛍光体シート。
    The phosphor sheet according to claim 1 or 2,
    A phosphor sheet with through holes.
  4.  請求項1~3のいずれか1項に記載の蛍光体シートであって、
     蛍光体粒子の含有率が25vol%以上60vol%以下である蛍光体シート。
    The phosphor sheet according to any one of claims 1 to 3,
    A phosphor sheet having a content of phosphor particles of 25 vol% or more and 60 vol% or less.
  5.  請求項1~4のいずれか1項に記載の蛍光体シートであって、
     前記蛍光体粒子は、青色光を、前記青色光の波長よりも長波長の光に変換可能な蛍光体粒子を含む蛍光体シート。
    The phosphor sheet according to any one of claims 1 to 4,
    The phosphor sheet includes phosphor particles in which the phosphor particles can convert blue light into light with a wavelength longer than the wavelength of the blue light.
  6.  請求項1~5のいずれか1項に記載の蛍光体シートであって、
     前記蛍光体粒子のメジアン径D50が1μm以上20μm以下である蛍光体シート。
    The phosphor sheet according to any one of claims 1 to 5,
    A phosphor sheet in which the median diameter D50 of the phosphor particles is 1 μm or more and 20 μm or less.
  7.  請求項1~6のいずれか1項に記載の蛍光体シートであって、
     前記蛍光体粒子の粒径分布曲線において、2以上の極大が認められる蛍光体シート。
    The phosphor sheet according to any one of claims 1 to 6,
    A phosphor sheet in which two or more maxima are observed in the particle size distribution curve of the phosphor particles.
  8.  請求項1~7のいずれか1項に記載の蛍光体シートであって、
     前記蛍光体粒子の粒径分布曲線において、粒径1μm以上6μm以下の領域と、粒径10μm以上25μm以下の領域の両方に極大が認められる蛍光体シート。
    The phosphor sheet according to any one of claims 1 to 7,
    In the particle size distribution curve of the phosphor particles, a maximum is observed in both a particle size region of 1 μm or more and 6 μm or less and a particle size region of 10 μm or more and 25 μm or less.
  9.  請求項1~8のいずれか1項に記載の蛍光体シートであって、
     前記蛍光体粒子が、CASN系蛍光体、SCASN系蛍光体、LaSi11系蛍光体、SrSi系蛍光体、BaSi系蛍光体、α型サイアロン系蛍光体、β型サイアロン系蛍光体、LuAG系蛍光体およびYAG系蛍光体からなる群より選ばれる1または2以上を含む蛍光体シート。
    The phosphor sheet according to any one of claims 1 to 8,
    The phosphor particles include a CASN-based phosphor, a SCASN-based phosphor, a La 3 Si 6 N 11 -based phosphor, a Sr 2 Si 5 N 8 -based phosphor, a Ba 2 Si 5 N 8 -based phosphor, and an α-sialon-based phosphor. A phosphor sheet containing one or more selected from the group consisting of a phosphor, a β-sialon phosphor, a LuAG phosphor, and a YAG phosphor.
  10.  絶縁基板と、
     前記絶縁基板の片面側に設けられた、請求項1~9のいずれか1項に記載の蛍光体シートの硬化物である蛍光層と、
     前記蛍光層における前記絶縁基板と反対側の面に設置された発光素子と、を備える照明装置。
    an insulating substrate;
    A phosphor layer, which is a cured product of the phosphor sheet according to any one of claims 1 to 9, provided on one side of the insulating substrate;
    A lighting device comprising: a light emitting element installed on a surface of the fluorescent layer opposite to the insulating substrate.
  11.  請求項10に記載の照明装置であって、
     前記絶縁基板と、前記蛍光層との間に、さらに白色層を備える照明装置。
    The lighting device according to claim 10,
    The lighting device further includes a white layer between the insulating substrate and the fluorescent layer.
  12.  請求項10または11に記載の照明装置であって、
     複数の前記発光素子が設置された照明装置。
    The lighting device according to claim 10 or 11,
    A lighting device in which a plurality of the light emitting elements are installed.
  13.  請求項10~12のいずれか1項に記載の照明装置であって、
     前記発光素子はリフレクタを備えない照明装置。
    The lighting device according to any one of claims 10 to 12,
    A lighting device in which the light emitting element does not include a reflector.
PCT/JP2023/011316 2022-03-25 2023-03-22 Phosphor sheet and lighting device WO2023182379A1 (en)

Applications Claiming Priority (2)

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JP2022-049903 2022-03-25
JP2022049903 2022-03-25

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018041860A (en) * 2016-09-08 2018-03-15 日東電工株式会社 Wavelength conversion sheet, sheet covering element, and optical semiconductor device
JP2019204039A (en) * 2018-05-25 2019-11-28 日亜化学工業株式会社 Method for forming translucent member and method for manufacturing light-emitting device, and light-emitting device
JP2020087907A (en) * 2018-11-21 2020-06-04 信越化学工業株式会社 Method for manufacturing anisotropic film
WO2022030397A1 (en) * 2020-08-07 2022-02-10 デンカ株式会社 Fluorescent coating, coating film, fluorescent substrate, and lighting equipment
WO2022030400A1 (en) * 2020-08-07 2022-02-10 デンカ株式会社 Fluorescent coating material, coating film, fluorescent substrate, and illumination device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018041860A (en) * 2016-09-08 2018-03-15 日東電工株式会社 Wavelength conversion sheet, sheet covering element, and optical semiconductor device
JP2019204039A (en) * 2018-05-25 2019-11-28 日亜化学工業株式会社 Method for forming translucent member and method for manufacturing light-emitting device, and light-emitting device
JP2020087907A (en) * 2018-11-21 2020-06-04 信越化学工業株式会社 Method for manufacturing anisotropic film
WO2022030397A1 (en) * 2020-08-07 2022-02-10 デンカ株式会社 Fluorescent coating, coating film, fluorescent substrate, and lighting equipment
WO2022030400A1 (en) * 2020-08-07 2022-02-10 デンカ株式会社 Fluorescent coating material, coating film, fluorescent substrate, and illumination device

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