WO2023151130A1 - Microwave magnetic sensor and measurement method therefor - Google Patents

Microwave magnetic sensor and measurement method therefor Download PDF

Info

Publication number
WO2023151130A1
WO2023151130A1 PCT/CN2022/077536 CN2022077536W WO2023151130A1 WO 2023151130 A1 WO2023151130 A1 WO 2023151130A1 CN 2022077536 W CN2022077536 W CN 2022077536W WO 2023151130 A1 WO2023151130 A1 WO 2023151130A1
Authority
WO
WIPO (PCT)
Prior art keywords
magnetic sensor
microwave magnetic
wavelength
magnetoresistive element
sensor according
Prior art date
Application number
PCT/CN2022/077536
Other languages
French (fr)
Chinese (zh)
Inventor
维尼·辛格
陈林峰
陈锦华
潘峰
魏锦烨
李敏
韩文都
Original Assignee
湖州久鼎电子有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 湖州久鼎电子有限公司 filed Critical 湖州久鼎电子有限公司
Publication of WO2023151130A1 publication Critical patent/WO2023151130A1/en

Links

Images

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/12Measuring magnetic properties of articles or specimens of solids or fluids

Definitions

  • the invention relates to the field of sensors, in particular to a microwave magnetic sensor and a measuring method thereof.
  • Magnetic sensors are widely used in consumer electronics and industrial production, especially magnetic sensors are playing an increasingly important role in the Internet of Things (IoT) and Industrial Internet of Things (IIoT). Magnetic sensors can be used to provide smart home solutions, for example, allowing users to turn appliances on and off remotely and adjust energy consumption in real time by measuring current and voltage. Magnetic sensors can also be used to provide angle sensing, distance sensing, motion sensing, and safety switches for robotics and factory automation.
  • IoT Internet of Things
  • IIoT Industrial Internet of Things
  • Magnetic sensors with magnetoresistive (MR) elements have been used on a large scale.
  • the resistance of a magneto-resistive element changes as the external magnetic field experienced by the magneto-resistive element changes.
  • the magnetoresistance elements include semiconductor magnetoresistance elements such as indium antimonide (InSb) and metal magnetoresistance elements such as giant magnetoresistance (GMR) elements, tunnel magnetoresistance (TMR) elements, and anisotropic magnetoresistance (AMR) elements.
  • InSb indium antimonide
  • MMR giant magnetoresistance
  • TMR tunnel magnetoresistance
  • AMR anisotropic magnetoresistance
  • the metal magnetoresistive element itself is a conductor, it is difficult to accurately measure the change of the resistivity of the metal magnetoresistive element. Therefore, the sensitivity and accuracy of the magnetic sensor with metal magnetoresistive elements need to be further improved.
  • the object of the present invention is to provide a microwave magnetic sensor to solve the problems raised in the background art.
  • a kind of microwave magnetic sensor comprises:
  • each of the half-wavelength resonators is a section of transmission line whose length is equal to half of the wavelength corresponding to its fundamental mode resonance frequency, and the two half-wavelength resonators have the same length and the same Fundamental mode resonant frequency;
  • a magneto-resistance element the magneto-resistance element is located between the two half-wavelength resonators, and is equidistantly and symmetrically spaced from the two half-wavelength resonators, and the magneto-resistance element resonates with the two half-wavelength resonators
  • the ends of the resonators constitute coupling capacitors through which the two half-wavelength resonators are coupled.
  • the magneto-resistance element is a metal magneto-resistance element, including a giant magneto-resistance element, a tunnel magneto-resistance element or an anisotropic magneto-resistance element.
  • the transmission line is a planar transmission line, including stripline, microstrip or coplanar line.
  • said transmission line is a microstrip.
  • the substrate is made of low-loss dielectric materials, including but not limited to silicon, gallium arsenide, FR-4, alumina, sapphire, quartz or combinations thereof;
  • Ground wire made of highly conductive metals, including but not limited to gold, silver, copper, or combinations thereof.
  • the protective layer covers the magnetoresistive element
  • the protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica or combinations thereof.
  • the protective layer fills a gap between the resonator and the magnetoresistive element, and covers a part of the half-wavelength resonator.
  • the magnetoresistive element has a stepped structure on each side;
  • the magnetoresistive element includes a top surface, a middle surface and a bottom surface, the bottom surface of the magnetoresistive element directly contacts the top surface of the substrate, and the middle surface and the top surface of the magnetoresistive element are located on the top surface of the half-wavelength resonator above, and cover part of the half-wavelength resonator on each side.
  • the isolation element is arranged between the half-wavelength resonator and the magnetoresistive element;
  • the isolation element has a stepped structure
  • the isolation element includes a top surface, a middle surface and a bottom surface, the top surface of the isolation element directly contacts the middle surface of the magnetoresistive element, and the middle surface of the isolation element directly contacts the top surface of the half-wavelength resonator, The bottom surface of the isolation element is directly on the top surface of the contact substrate.
  • the isolation elements are made of low-k materials including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the protective layer covers the magnetoresistive element
  • the protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • said spacer element has a stepped structure on each side;
  • the isolation element includes a top surface, a middle surface and a bottom surface, the bottom surface of the isolation element directly contacts the top surface of the substrate, the middle surface of the isolation element directly contacts the top surface of the half-wavelength resonator, and in each The side covers a part of the half-wavelength resonator, and the magnetoresistive element is arranged on the top surface of the isolation element;
  • the material of the isolation element is a low-k material, including but not limited to fluorine-doped silicon dioxide, organic silicon glass, porous silicon dioxide or a combination thereof.
  • the protective layer covers the magnetoresistive element
  • the protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the half-wavelength resonator includes a transition portion, and the transition portion is located on a side of the half-wavelength resonator close to the magnetoresistive element;
  • the width of an end of the transition portion close to the magnetoresistive element is consistent with the width of the magnetoresistive element.
  • the coupling unit is used to measure the resonant frequency of the microwave magnetic sensor
  • the coupling unit is made of a length of transmission line whose characteristic impedance is identical to that of the external measurement line.
  • the coupling between the coupling unit and the half-wavelength resonator is end-to-end coupling.
  • the coupling between the coupling unit and the half-wavelength resonator is parallel coupling.
  • the substrate, the half-wavelength resonator, the coupling unit and the ground wire are made of non-magnetic materials.
  • a measuring method of a microwave magnetic sensor comprising:
  • the microwave magnetic sensor provided by the present invention can determine the external magnetic field according to the change of the first resonant frequency of the microwave magnetic sensor. Since the resonant frequency of the resonant structure can be accurately measured, the microwave magnetic sensor provided by the invention has higher sensitivity and accuracy than the existing Wheatstone bridge-based reluctance sensor. Furthermore, the microwave magnetic sensor can be fabricated using conventional semiconductor fabrication processes and techniques. In addition, since microwave magnetic sensors work at microwave frequencies, microwave magnetic sensors can be integrated into wireless communication systems to achieve remote, wireless sensing.
  • Fig. 1 is a schematic structural diagram of a microwave magnetic sensor provided by an embodiment of the present invention
  • FIG. 2 is a partial enlarged view of the coupling capacitor CAP in FIG. 1;
  • Fig. 3 is a diagram of the relationship between the first resonant frequency of an exemplary microwave magnetic sensor and the resistivity of the magnetoresistive element provided by the embodiment of the present invention
  • Fig. 4 is a top view of a microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 5 is a sectional view along A-A' section in Fig. 4;
  • FIG. 6 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • FIG. 7 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 8 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 9 is a sectional view along B-B' section in Fig. 8;
  • Figure 10 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 11 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 12 is a cross-sectional view along C-C' section in Fig. 11;
  • Fig. 13 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 14 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 15 is a sectional view along D-D' section among Fig. 14;
  • Fig. 16 is a schematic structural diagram of another microwave magnetic sensor provided by an embodiment of the present invention.
  • the metal magnetoresistive element itself is a conductor, it is difficult to accurately measure the change of the resistivity of the metal magnetoresistive element. Therefore, the sensitivity and accuracy of the magnetic sensor with metal magnetoresistive elements need to be further improved.
  • the present invention provides a microwave magnetic sensor with a metal magnetoresistance element and a measurement method thereof, which effectively solves the technical problems in the prior art and improves the sensitivity and accuracy of the magnetic sensor with a metal magnetoresistance element .
  • the resistivity of the magnetoresistive element will change, so the resonance characteristic of the microwave magnetic sensor will also change. According to the change of the resonant characteristics of the microwave magnetic sensor, the strength of the external magnetic field can be obtained.
  • Fig. 1 is a schematic structural diagram of a microwave magnetic sensor provided by an embodiment of the present invention.
  • the microwave magnetic sensor includes two half-wavelength resonators 1 and a magnetoresistive element 2 .
  • Each of the half-wavelength resonators 1 is a section of transmission line whose length is equal to half of the wavelength corresponding to its fundamental-mode resonant frequency f 0 .
  • the two half-wavelength resonators have the same length and the same fundamental-mode resonance frequency f 0 .
  • the magneto-resistive element 2 is located between the two half-wavelength resonators 1 and is equidistantly and symmetrically spaced from the two half-wavelength resonators 1 .
  • the magneto-resistive element 2 and the ends of the two half-wavelength resonators 1 form a coupling capacitor CAP, as shown by the dashed box in FIG. 1 .
  • the two half-wavelength resonators 1 are coupled through the coupling capacitor CAP.
  • FIG. 2 is a partial enlarged view of the coupling capacitor CAP in FIG. 1 , including an equivalent circuit of the coupling capacitor CAP.
  • the coupling capacitor CAP includes three capacitances, which are two capacitances C1 formed between the half-wavelength resonator 1 and the magnetoresistive element 2 , and a self-capacitance C2 of the magnetoresistive element 2 .
  • the respective capacitances of the three capacitors are related to the resistivity of the magnetoresistive element 2 . Therefore, the total capacitance C of the coupling capacitor CAP is related to the resistivity of the magnetoresistive element 2 .
  • the fundamental mode resonance of the microwave magnetic sensor degenerates into two resonances, which have the first resonant frequency f and the second resonant frequency f 2 .
  • the first resonant frequency f 1 is lower than the fundamental-mode resonant frequency f 0 of the half-wavelength resonator 1
  • the second resonant frequency f 2 is higher than the fundamental-mode resonant frequency f 0 of the half-wavelength resonator 1 .
  • the first resonance frequency is the lowest resonance frequency of the microwave magnetic sensor.
  • the difference between the first resonance frequency f 1 and the second resonance frequency f 2 is related to the total capacitance C of the coupling capacitor CAP.
  • a change in the total capacitance C will result in a change in the first resonant frequency f 1 and the second resonant frequency f 2 .
  • the total capacitance C can be calculated from the first resonant frequency f1 and the second resonant frequency f2 :
  • Z0 is the characteristic impedance of the transmission line making up the half-wavelength resonator. It can be understood that when the total capacitance C becomes larger, the difference between f 1 and f 2 will become larger, and the first resonant frequency f 1 will decrease.
  • FIG. 3 is a diagram of the relationship between the first resonant frequency of an exemplary microwave magnetic sensor and the resistivity of the magneto-resistive element according to an embodiment of the present invention.
  • This exemplary microwave magnetic sensor is made of microstrip with a characteristic impedance of 50 ⁇ .
  • the resistivity of the magnetoresistive element decreases, the first resonant frequency f 1 of the exemplary microwave magnetic sensor decreases monotonously. Therefore, according to the first resonant frequency f 1 , the resistivity of the magnetoresistive element can be deduced.
  • the coupling capacitor CAP includes the magnetoresistive element 2 .
  • Magnetoresistance refers to the change in resistivity of a sample under an external magnetic field of strength H:
  • ⁇ H magnetoresistance
  • R(H) is the resistivity of the sample in a magnetic field with strength H
  • the magnetoresistance element 2 in the present invention is a metal magnetoresistance element.
  • the metal magnetoresistance element may be a giant magnetoresistance (GMR) element, a tunnel magnetoresistance (TMR) element or an anisotropic magnetoresistance (AMR) element.
  • GMR giant magnetoresistance
  • TMR tunnel magnetoresistance
  • AMR anisotropic magnetoresistance
  • the ⁇ H value of the GMR element, the TMR element, and the AMR element is larger than that of the semiconductor magnetoresistive element.
  • GMR is a spintronic effect
  • the operation of GMR elements is based on the dependence of electron scattering on spin orientation.
  • the thin-film structure of the GMR element consists of alternating ferromagnetic and non-magnetic conductive layers. Depending on the magnetization alignment of adjacent ferromagnetic layers, the overall resistivity of the thin-film structure can vary significantly. When arranged in parallel, the total resistivity is relatively low, while in antiparallel
  • the transmission line used to make the half-wavelength resonator can be any type of planar transmission line, including stripline, microstrip and coplanar line.
  • planar transmission line including stripline, microstrip and coplanar line.
  • microstrip as an exemplary planar transmission line.
  • Fig. 4 is a top view of a microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 5 is a sectional view along section A-A' in Fig. 4 .
  • the microstrip magnetic sensor includes two half-wavelength resonators 101 , a magnetoresistive element 102 , a substrate 103 and a ground wire 104 .
  • the two half-wavelength resonators 101 are made of highly conductive metals, including but not limited to gold, silver, copper or combinations thereof.
  • the two half-wavelength resonators 101 may have a multi-layer structure.
  • the magnetoresistive element 102 is a metal magnetoresistive element, which may be one of a GMR element, a TMR element and an AMR element.
  • the magnetoresistive element 102 is located between the two half-wavelength resonators 101, and is equidistantly and symmetrically spaced from the two half-wavelength resonators.
  • the magnetoresistive element 102 may have a multilayer structure.
  • the substrate 103 is made of a low loss dielectric material including but not limited to silicon, gallium arsenide, FR-4, alumina, sapphire, quartz or combinations thereof.
  • the ground wire 104 is made of highly conductive metals, including but not limited to gold, silver, copper or combinations thereof.
  • the ground wire may have a multilayer structure.
  • the magnetoresistive element 102 may be covered by a protective layer.
  • Fig. 6 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 6 , in one embodiment, the magnetoresistive element 102 is covered by a protective layer 105 .
  • the protection layer 105 is made of a low-k material, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the magnetoresistive element 102 is covered by a protective layer that fills the gap between the resonator 101 and the magnetoresistive element 102 and covers a portion of the half-wavelength resonator 101 .
  • Fig. 7 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 7 , the magnetoresistive element 102 is covered by a protective layer 106 , and the protective layer 106 fills the gap between the resonator 101 and the magnetoresistive element 102 and covers a part of the half-wavelength resonator 101 .
  • the protective layer 106 is made of a low-k material including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the coupling capacitor CAP may have various structures.
  • Fig. 8 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 9 is a sectional view along section B-B' in Fig. 8 .
  • the microstrip magnetic sensor includes a magnetoresistive element 202 and two isolation elements 207 .
  • the magnetoresistive element 202 has a stepped structure on each side.
  • the magnetoresistive element 202 includes a top surface, a middle surface and a bottom surface.
  • the bottom surface of the magnetoresistive element 202 directly contacts the top surface of the substrate 103 .
  • the middle and top surfaces of the magneto-resistive element 202 are located above the top surface of the half-wavelength resonator 101 and cover a part of the half-wavelength resonator 101 on each side.
  • the isolation element 207 has a stepped structure.
  • the isolation element 207 is provided between the half-wavelength resonator 101 and the magnetoresistive element 202 .
  • the isolation element 207 includes a top surface, a middle surface and a bottom surface.
  • the top surface of the isolation element 207 directly contacts the middle surface of the magnetoresistive element 202
  • the middle surface of the isolation element 207 directly contacts the top surface of the half-wavelength resonator 101 .
  • the bottom surface of the isolation element 207 directly contacts the top surface of the substrate 103 .
  • Isolation elements 207 are made of low-k materials including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the magneto-resistive element 202 is a metal magneto-resistive element, which may be one of a GMR element, a TMR element and an AMR element.
  • the magnetoresistive element 202 may have a multilayer structure.
  • the magnetoresistive element is covered by a protective layer.
  • Fig. 10 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 10 , the magnetoresistive element 202 is covered by a protective layer 205 .
  • the protection layer 205 is made of a low-k material, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the materials of the isolation element 207 and the protection layer 205 are the same. In some other embodiments, the isolation element 207 and the protective layer 205 may be made of different materials.
  • Fig. 11 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 12 is a cross-sectional view along section C-C' in Fig. 11.
  • the magnetic sensor includes a magnetoresistive element 302 and an isolation element 307 .
  • the isolation element 307 has a stepped structure on each side.
  • the isolation element 307 includes a top surface, a middle surface and a bottom surface.
  • the bottom surface of the isolation element 307 directly contacts the top surface of the substrate 103 .
  • the middle face of the isolation element 307 directly touches the top face of the half-wave resonator 101 and covers a part of the half-wave resonator 101 on each side.
  • the magnetoresistive element 302 is disposed on the top surface of the isolation element 307 .
  • the material of the isolation element 307 is a low-k material, including but not limited to fluorine-doped silicon dioxide, organic silicon glass, porous silicon dioxide or a combination thereof.
  • the magnetoresistive element 302 is covered by a protective layer.
  • Fig. 13 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 13 , the magnetoresistive element 302 is covered by a protective layer 305 .
  • the protection layer 305 is made of a low-k material, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  • the isolation element 307 and the protective layer 305 are made of the same material. In some other embodiments, the isolation element 307 and the protective layer 305 may be made of different materials.
  • the width of the end of the half-wavelength resonator close to the magnetoresistive element can be adjusted to meet specific measurement requirements.
  • the half-wavelength resonator includes a transition portion, and the transition portion is located on a side of the half-wavelength resonator close to the magnetoresistive element. Through the transition part, the width of the end of the half-wavelength resonator close to the magnetoresistive element can be consistent with the width of the magnetoresistive element, so as to meet specific measurement requirements.
  • Fig. 14 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention.
  • Fig. 15 is a sectional view along the D-D' section in Fig. 14 .
  • the microstrip magnetic sensor includes two half-wavelength resonators 401 and a magnetoresistive element 402 .
  • the half-wavelength resonator includes a transition portion 408 located at one end of the half-wavelength resonator close to the magnetoresistive element 402 .
  • the width of the end of the half-wavelength resonator 401 close to the magnetoresistive element 402 can be consistent with the width of the magnetoresistive element 402.
  • the present invention does not limit the specific structure of the transition portion 408 .
  • the microwave magnetic sensor provided by the present invention also includes a coupling unit for measuring the resonant frequency of the microwave magnetic sensor.
  • Fig. 16 is a schematic structural diagram of another microwave magnetic sensor provided by an embodiment of the present invention.
  • the magnetic sensor includes two coupling units 509 for measuring the resonant frequency of the microwave magnetic sensor.
  • the coupling unit 509 is made of a section of transmission line whose characteristic impedance is consistent with that of the external measurement line, eg 50 ⁇ .
  • the coupling between the coupling unit 509 and the half-wavelength resonator 101 is end-to-end coupling.
  • the coupling between the coupling unit 509 and the half-wavelength resonator 101 may be other types of coupling, such as parallel coupling.
  • the microwave magnetic sensor may only include one coupling unit.
  • the coupling unit 509 and the half-wavelength resonator 101 are made of the same type of transmission line. In some other embodiments, the coupling unit 509 and the half-wavelength resonator 101 may be made of different types of transmission lines.
  • the coupling unit 509 and the half-wavelength resonator 101 are made of the same material. In some other embodiments, the coupling unit 509 and the half-wavelength resonator 101 may be made of different materials.
  • the substrate, the half-wavelength resonator, the coupling unit and the ground are made of non-magnetic materials.
  • the invention also provides a measurement method of the microwave magnetic sensor.
  • the method includes S1, obtaining a calibration curve between the first resonant frequency of the microwave magnetic sensor and the strength of the external magnetic field, the first resonant frequency being the lowest resonant frequency of the microwave magnetic sensor, and the calibration curve can be obtained by Obtained by measuring the first resonant frequency of the microwave magnetic sensor under external magnetic fields of different strengths within the range; S2, measuring the first resonant frequency of the microwave magnetic sensor under the magnetic field to be measured, and obtaining the magnetic field strength to be measured according to the calibration curve.

Abstract

A microwave magnetic sensor, comprising two half-wavelength resonators (1) and a magnetoresistive element (2), wherein each half-wavelength resonator (1) is a transmission line; the length of each half-wavelength resonator is equal to half of the wavelength corresponding to a fundamental mode resonant frequency f0 of the half-wavelength resonator; the two half-wavelength resonators have the same length and the same fundamental mode resonant frequency f0; the magnetoresistive element (2) is located between the two half-wavelength resonators (1) and is symmetrically spaced apart from the two half-wavelength resonators (1) at equal intervals; the magnetoresistive element (2) and end portions of the two half-wavelength resonators (1) form a coupling capacitor CAP; and the two half-wavelength resonators (1) are coupled by means of the coupling capacitor CAP. By means of the microwave magnetic sensor, an external magnetic field is determined according to a change in a first resonant frequency of the microwave magnetic sensor. The resonant frequency of a resonant structure can be accurately measured, such that the microwave magnetic sensor has higher sensitivity and accuracy than existing magnetoresistive sensors based on a Wheatstone bridge.

Description

一种微波磁传感器及其测量方法A microwave magnetic sensor and its measuring method 技术领域technical field
本发明涉及传感器领域,特别涉及微波磁传感器及其测量方法。The invention relates to the field of sensors, in particular to a microwave magnetic sensor and a measuring method thereof.
背景技术Background technique
磁传感器广泛用于消费电子产品和工业生产中,尤其是磁传感器在物联网(IoT)和工业物联网(IIoT)中扮演着越来越重要的角色。磁传感器可用于提供智能家居解决方案,例如,允许用户远程打开和关闭电器,并通过测量电流和电压实时调整能耗。磁传感器还可用于为机器人和工厂自动化提供角度感测、距离感测、移动感测、和安全开关。Magnetic sensors are widely used in consumer electronics and industrial production, especially magnetic sensors are playing an increasingly important role in the Internet of Things (IoT) and Industrial Internet of Things (IIoT). Magnetic sensors can be used to provide smart home solutions, for example, allowing users to turn appliances on and off remotely and adjust energy consumption in real time by measuring current and voltage. Magnetic sensors can also be used to provide angle sensing, distance sensing, motion sensing, and safety switches for robotics and factory automation.
具有磁阻(MR)元件的磁传感器已被大规模使用。磁阻元件的电阻随着该磁阻元件所经历的外部磁场的变化而变化。磁阻元件包括诸如锑化铟(InSb)等半导体磁阻元件和诸如巨磁阻(GMR)元件、隧道磁阻(TMR)元件和各向异性磁阻(AMR)元件等金属磁阻元件。主要由于其灵敏度和可靠性等方面的优势,具有金属磁阻元件的磁传感器广受青睐。Magnetic sensors with magnetoresistive (MR) elements have been used on a large scale. The resistance of a magneto-resistive element changes as the external magnetic field experienced by the magneto-resistive element changes. The magnetoresistance elements include semiconductor magnetoresistance elements such as indium antimonide (InSb) and metal magnetoresistance elements such as giant magnetoresistance (GMR) elements, tunnel magnetoresistance (TMR) elements, and anisotropic magnetoresistance (AMR) elements. Magnetic sensors with metal magnetoresistive elements are widely favored mainly due to their advantages in sensitivity and reliability.
然而,由于金属磁阻元件本身是导体,因此难以精准测量金属磁阻元件的电阻率的变化。因此,具有金属磁阻元件的磁传感器的灵敏度和准确度有待进一步提高。However, since the metal magnetoresistive element itself is a conductor, it is difficult to accurately measure the change of the resistivity of the metal magnetoresistive element. Therefore, the sensitivity and accuracy of the magnetic sensor with metal magnetoresistive elements need to be further improved.
发明内容Contents of the invention
本发明的目的是提供一种微波磁传感器,以解决背景技术中提出的问题。The object of the present invention is to provide a microwave magnetic sensor to solve the problems raised in the background art.
本发明的技术解决方案是:一种微波磁传感器,包括:The technical solution of the present invention is: a kind of microwave magnetic sensor, comprises:
两个半波长谐振器,每个所述半波长谐振器是一段传输线,其长度等于其基模谐振频率对应的波长的一半,两个所述半波长谐振器具有相同的长度和相同的所述基模谐振频率;Two half-wavelength resonators, each of the half-wavelength resonators is a section of transmission line whose length is equal to half of the wavelength corresponding to its fundamental mode resonance frequency, and the two half-wavelength resonators have the same length and the same Fundamental mode resonant frequency;
一个磁阻元件,所述磁阻元件位于两个所述半波长谐振器之间,并与两个所述半波长谐振器等距对称间隔,所述磁阻元件与两个所述半波长谐振器的端部构成耦合电容器,两个所述半波长谐振器通过所述耦合电容器耦合。A magneto-resistance element, the magneto-resistance element is located between the two half-wavelength resonators, and is equidistantly and symmetrically spaced from the two half-wavelength resonators, and the magneto-resistance element resonates with the two half-wavelength resonators The ends of the resonators constitute coupling capacitors through which the two half-wavelength resonators are coupled.
作为优选,所述磁阻元件为金属磁阻元件,包括巨磁阻元件、隧道磁阻元 件或各向异性磁阻元件。Preferably, the magneto-resistance element is a metal magneto-resistance element, including a giant magneto-resistance element, a tunnel magneto-resistance element or an anisotropic magneto-resistance element.
作为优选,所述传输线是一种平面传输线,包括带状线、微带或共面线。Preferably, the transmission line is a planar transmission line, including stripline, microstrip or coplanar line.
作为优选,所述传输线是微带。Preferably, said transmission line is a microstrip.
作为优选,衬底,由低损耗介电材料制成,包括但不限于硅、砷化镓、FR-4、氧化铝、蓝宝石、石英或其组合;Preferably, the substrate is made of low-loss dielectric materials, including but not limited to silicon, gallium arsenide, FR-4, alumina, sapphire, quartz or combinations thereof;
地线,由高导电性金属制成,包括但不限于金、银、铜或其组合。Ground wire, made of highly conductive metals, including but not limited to gold, silver, copper, or combinations thereof.
作为优选,所述保护层覆盖所述磁阻元件;Preferably, the protective layer covers the magnetoresistive element;
所述保护层由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica or combinations thereof.
作为优选,所述保护层填充所述谐振器和所述磁阻元件之间的间隙,并且覆盖所述半波长谐振器的一部分。Preferably, the protective layer fills a gap between the resonator and the magnetoresistive element, and covers a part of the half-wavelength resonator.
作为优选,所述磁阻元件在每一侧具有台阶结构;Preferably, the magnetoresistive element has a stepped structure on each side;
所述磁阻元件包括顶面、中间面和底面,所述磁阻元件的底面直接接触衬底的顶面,所述磁阻元件的中间面和顶面位于所述半波长谐振器的顶面之上,并且在每一侧覆盖所述半波长谐振器一部分。The magnetoresistive element includes a top surface, a middle surface and a bottom surface, the bottom surface of the magnetoresistive element directly contacts the top surface of the substrate, and the middle surface and the top surface of the magnetoresistive element are located on the top surface of the half-wavelength resonator above, and cover part of the half-wavelength resonator on each side.
作为优选,所述隔离元件设置在所述半波长谐振器和所述磁阻元件之间;Preferably, the isolation element is arranged between the half-wavelength resonator and the magnetoresistive element;
所述隔离元件具有台阶结构;The isolation element has a stepped structure;
所述隔离元件包括顶面、中间面和底面,所述隔离元件的顶面直接接触所述磁阻元件的中间面,所述隔离元件的中间面直接接触所述半波长谐振器的顶面,所述隔离元件的底面直接所述接触衬底的顶面。The isolation element includes a top surface, a middle surface and a bottom surface, the top surface of the isolation element directly contacts the middle surface of the magnetoresistive element, and the middle surface of the isolation element directly contacts the top surface of the half-wavelength resonator, The bottom surface of the isolation element is directly on the top surface of the contact substrate.
所述隔离元件由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The isolation elements are made of low-k materials including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
作为优选,所述保护层覆盖所述磁阻元件;Preferably, the protective layer covers the magnetoresistive element;
所述保护层由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅、或其组合。The protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
作为优选,所述隔离元件在每一侧具有台阶结构;Preferably, said spacer element has a stepped structure on each side;
所述隔离元件包括顶面、中间面和底面,所述隔离元件的底面直接接触衬底的顶面,所述隔离元件的中间面直接接触所述半波长谐振器的顶面,并且在每一侧覆盖所述半波长谐振器一部分,所述磁阻元件设置在所述隔离元件的顶面上;The isolation element includes a top surface, a middle surface and a bottom surface, the bottom surface of the isolation element directly contacts the top surface of the substrate, the middle surface of the isolation element directly contacts the top surface of the half-wavelength resonator, and in each The side covers a part of the half-wavelength resonator, and the magnetoresistive element is arranged on the top surface of the isolation element;
所述隔离元件的材料为低k材料,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The material of the isolation element is a low-k material, including but not limited to fluorine-doped silicon dioxide, organic silicon glass, porous silicon dioxide or a combination thereof.
作为优选,所述保护层覆盖所述磁阻元件;Preferably, the protective layer covers the magnetoresistive element;
所述保护层由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅、或其组合。The protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
作为优选,所述半波长谐振器包括过渡部分,所述过度部分位于所述半波长谐振器靠近所述磁阻元件的一侧;Preferably, the half-wavelength resonator includes a transition portion, and the transition portion is located on a side of the half-wavelength resonator close to the magnetoresistive element;
所述过渡部分靠近所述磁阻元件的一端的宽度与所述磁阻元件的宽度一致。The width of an end of the transition portion close to the magnetoresistive element is consistent with the width of the magnetoresistive element.
作为优选,所述耦合单元用于测量所述微波磁传感器的谐振频率;Preferably, the coupling unit is used to measure the resonant frequency of the microwave magnetic sensor;
所述耦合单元由一段传输线制成,所述传输线的特征阻抗与外部测量线路的特征阻抗一致。The coupling unit is made of a length of transmission line whose characteristic impedance is identical to that of the external measurement line.
作为优选,所述耦合单元与所述半波长谐振器之间的耦合为端对端耦合。Preferably, the coupling between the coupling unit and the half-wavelength resonator is end-to-end coupling.
作为优选,所述耦合单元与所述半波长谐振器之间的耦合为平行耦合。Preferably, the coupling between the coupling unit and the half-wavelength resonator is parallel coupling.
作为优选,所述衬底、所述半波长谐振器、所述耦合单元和所述地线由非磁性材料制成。Preferably, the substrate, the half-wavelength resonator, the coupling unit and the ground wire are made of non-magnetic materials.
一种微波磁传感器的测量方法,包括:A measuring method of a microwave magnetic sensor, comprising:
S1,获得所述微波磁传感器的第一谐振频率与外部磁场强度之间的校准曲线,所述第一谐振频率为所述微波磁传感器的最低谐振频率,所述校准曲线通过在感兴趣的范围内不同强度的外部磁场下测量所述微波磁传感器的所述第一谐振频率来获得;S1, obtain the calibration curve between the first resonant frequency of the microwave magnetic sensor and the external magnetic field strength, the first resonant frequency is the lowest resonant frequency of the microwave magnetic sensor, and the calibration curve is passed in the range of interest obtained by measuring the first resonant frequency of the microwave magnetic sensor under external magnetic fields of different strengths;
S2,在待测磁场下测量所述微波磁传感器的所述第一谐振频率,并根据所述校准曲线获得所述待测磁场的强度。S2. Measure the first resonant frequency of the microwave magnetic sensor under the magnetic field to be measured, and obtain the strength of the magnetic field to be measured according to the calibration curve.
本发明有益效果是:The beneficial effects of the present invention are:
与现有技术相比,利用本发明提供的微波磁传感器,可以根据微波磁传感器的第一谐振频率的变化来确定外部磁场。由于谐振结构的谐振频率可以精准测量,因此本发明提供的微波磁传感器比现有的基于惠斯通电桥的磁阻传感器具有更高的灵敏度和准确度。此外,可以使用传统的半导体制造工艺和技术来制造所述微波磁传感器。另外,由于微波磁传感器工作在微波频率,因此可以将微波磁传感器集成到无线通信系统中,从而实现远程、无线传感。Compared with the prior art, the microwave magnetic sensor provided by the present invention can determine the external magnetic field according to the change of the first resonant frequency of the microwave magnetic sensor. Since the resonant frequency of the resonant structure can be accurately measured, the microwave magnetic sensor provided by the invention has higher sensitivity and accuracy than the existing Wheatstone bridge-based reluctance sensor. Furthermore, the microwave magnetic sensor can be fabricated using conventional semiconductor fabrication processes and techniques. In addition, since microwave magnetic sensors work at microwave frequencies, microwave magnetic sensors can be integrated into wireless communication systems to achieve remote, wireless sensing.
附图说明Description of drawings
图1为本发明实施例提供的一种微波磁传感器的结构示意图;Fig. 1 is a schematic structural diagram of a microwave magnetic sensor provided by an embodiment of the present invention;
图2为图1中的耦合电容器CAP的局部放大图;FIG. 2 is a partial enlarged view of the coupling capacitor CAP in FIG. 1;
图3为本发明实施例提供的一种示例性的微波磁传感器的第一谐振频率和磁阻元件的电阻率之间的关系图;Fig. 3 is a diagram of the relationship between the first resonant frequency of an exemplary microwave magnetic sensor and the resistivity of the magnetoresistive element provided by the embodiment of the present invention;
图4为本发明实施例提供的一种微带磁传感器的俯视图;Fig. 4 is a top view of a microstrip magnetic sensor provided by an embodiment of the present invention;
图5为沿图4中A-A’截面的截面图;Fig. 5 is a sectional view along A-A' section in Fig. 4;
图6为本发明实施例提供的另一种微带磁传感器的截面图;6 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图7为本发明实施例提供的另一种微带磁传感器的截面图;7 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图8为本发明实施例提供的另一种微带磁传感器的俯视图;Fig. 8 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图9为沿图8中B-B’截面的截面图;Fig. 9 is a sectional view along B-B' section in Fig. 8;
图10为本发明实施例提供的另一种微带磁传感器的截面图;Figure 10 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图11为本发明实施例提供的另一种微带磁传感器的俯视图;Fig. 11 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图12为沿图11中C-C’截面的截面图;Fig. 12 is a cross-sectional view along C-C' section in Fig. 11;
图13为本发明实施例提供的另一种微带磁传感器的截面图;Fig. 13 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图14为本发明实施例提供的另一种微带磁传感器的俯视图;Fig. 14 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention;
图15为沿图14中D-D’截面的截面图;Fig. 15 is a sectional view along D-D' section among Fig. 14;
图16为本发明实施例提供的另一种微波磁传感器的结构示意图。Fig. 16 is a schematic structural diagram of another microwave magnetic sensor provided by an embodiment of the present invention.
具体实施方式Detailed ways
现在将参照附图来详细描述本发明的各种示例性实施例。应注意到:除非另外具体说明,否则在这些实施例中阐述的部件和步骤的相对布置、数字表达式和数值不限制本发明的范围。Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that the relative arrangements of components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless specifically stated otherwise.
以下对示例性实施例的描述实际上仅仅是说明性的,决不作为对本发明及其应用或使用的任何限制。在示出和讨论的所有例子中,任何具体值应被解释为仅仅是示例性的,而不是作为限制。因此,示例性实施例的其它例子可以具有不同的值。The following description of the exemplary embodiments is merely illustrative in nature and in no way is taken as any limitation of the invention and its application or uses. In all examples shown and discussed, any specific values should be construed as exemplary only, and not as limitations. Therefore, other instances of the exemplary embodiment may have different values.
对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论,但在适当情况下,这些技术、方法和设备应当被视为说明书的一部分。Techniques, methods and devices known to those of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, such techniques, methods and devices should be considered part of the description.
应注意到:相似的标号和字母在附图中表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不对其进行进一步讨论。It should be noted that like numerals and letters denote like items in the figures, therefore, once an item is defined in one figure, it is not discussed further in subsequent figures.
正如背景技术所述,由于金属磁阻元件本身是导体,因此难以精准测量金 属磁阻元件的电阻率的变化。因此,具有金属磁阻元件的磁传感器的灵敏度和准确度有待进一步提高。As mentioned in the background, since the metal magnetoresistive element itself is a conductor, it is difficult to accurately measure the change of the resistivity of the metal magnetoresistive element. Therefore, the sensitivity and accuracy of the magnetic sensor with metal magnetoresistive elements need to be further improved.
有鉴于此,本发明提供了一种具有金属磁阻元件的微波磁传感器及其测量方法,有效解决了现有技术存在的技术问题,提高了具有金属磁阻元件的磁传感器的灵敏度和准确度。In view of this, the present invention provides a microwave magnetic sensor with a metal magnetoresistance element and a measurement method thereof, which effectively solves the technical problems in the prior art and improves the sensitivity and accuracy of the magnetic sensor with a metal magnetoresistance element .
在本发明提供的具有金属磁阻元件的微波磁传感器中,当对磁阻元件施加外部磁场时,磁阻元件的电阻率会发生变化,因此,微波磁传感器的谐振特性也会发生变化。根据微波磁传感器谐振特性的变化,可以得到外部磁场的强度。In the microwave magnetic sensor with metal magnetoresistive element provided by the present invention, when an external magnetic field is applied to the magnetoresistive element, the resistivity of the magnetoresistive element will change, so the resonance characteristic of the microwave magnetic sensor will also change. According to the change of the resonant characteristics of the microwave magnetic sensor, the strength of the external magnetic field can be obtained.
图1为本发明实施例提供的一种微波磁传感器的结构示意图。如图1所示,所述微波磁传感器包括两个半波长谐振器1和一个磁阻元件2。每个所述半波长谐振器1是一段传输线,其长度等于其基模谐振频率f 0对应的波长的一半。两个所述半波长谐振器具有相同的长度和相同的基模谐振频率f 0。所述磁阻元件2位于两个所述半波长谐振器1之间,并与两个所述半波长谐振器1等距对称间隔。所述磁阻元件2与两个所述半波长谐振器1的端部构成耦合电容器CAP,如图1中的虚线方框所示。两个所述半波长谐振器1通过所述耦合电容器CAP耦合。 Fig. 1 is a schematic structural diagram of a microwave magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 1 , the microwave magnetic sensor includes two half-wavelength resonators 1 and a magnetoresistive element 2 . Each of the half-wavelength resonators 1 is a section of transmission line whose length is equal to half of the wavelength corresponding to its fundamental-mode resonant frequency f 0 . The two half-wavelength resonators have the same length and the same fundamental-mode resonance frequency f 0 . The magneto-resistive element 2 is located between the two half-wavelength resonators 1 and is equidistantly and symmetrically spaced from the two half-wavelength resonators 1 . The magneto-resistive element 2 and the ends of the two half-wavelength resonators 1 form a coupling capacitor CAP, as shown by the dashed box in FIG. 1 . The two half-wavelength resonators 1 are coupled through the coupling capacitor CAP.
图2为图1中的所述耦合电容器CAP的局部放大图,包括耦合电容器CAP的等效电路。如图2所示,耦合电容器CAP包括三个电容,分别是两个在半波长谐振器1和磁阻元件2之间形成的电容C1,以及磁阻元件2的自电容C2。三个电容各自的电容与磁阻元件2的电阻率有关。因此,耦合电容器CAP的总电容C与磁阻元件2的电阻率有关。FIG. 2 is a partial enlarged view of the coupling capacitor CAP in FIG. 1 , including an equivalent circuit of the coupling capacitor CAP. As shown in FIG. 2 , the coupling capacitor CAP includes three capacitances, which are two capacitances C1 formed between the half-wavelength resonator 1 and the magnetoresistive element 2 , and a self-capacitance C2 of the magnetoresistive element 2 . The respective capacitances of the three capacitors are related to the resistivity of the magnetoresistive element 2 . Therefore, the total capacitance C of the coupling capacitor CAP is related to the resistivity of the magnetoresistive element 2 .
在微波磁传感器中,由于两个半波长谐振器1通过耦合电容器CAP耦合,微波磁传感器的基模谐振退化为两个谐振,这两个谐振分别具有第一谐振频率f 1和第二谐振频率f 2。第一谐振频率f 1低于半波长谐振器1的基模谐振频率f 0,第二谐振频率f 2高于半波长谐振器1的基模谐振频率f 0。具体地,第一谐振频率为微波磁传感器的最低谐振频率。 In the microwave magnetic sensor, since two half-wavelength resonators 1 are coupled through the coupling capacitor CAP, the fundamental mode resonance of the microwave magnetic sensor degenerates into two resonances, which have the first resonant frequency f and the second resonant frequency f 2 . The first resonant frequency f 1 is lower than the fundamental-mode resonant frequency f 0 of the half-wavelength resonator 1 , and the second resonant frequency f 2 is higher than the fundamental-mode resonant frequency f 0 of the half-wavelength resonator 1 . Specifically, the first resonance frequency is the lowest resonance frequency of the microwave magnetic sensor.
第一谐振频率f 1和第二谐振频率f 2之间的差值与耦合电容器CAP的总电容C有关。总电容C的变化会导致第一谐振频率f 1和第二谐振频率f 2的变化。总电容C可以由第一谐振频率f 1和第二谐振频率f 2计算得出: The difference between the first resonance frequency f 1 and the second resonance frequency f 2 is related to the total capacitance C of the coupling capacitor CAP. A change in the total capacitance C will result in a change in the first resonant frequency f 1 and the second resonant frequency f 2 . The total capacitance C can be calculated from the first resonant frequency f1 and the second resonant frequency f2 :
Figure PCTCN2022077536-appb-000001
Figure PCTCN2022077536-appb-000001
其中Z 0是构成半波长谐振器的传输线的特征阻抗。可以理解的是,当总电容C变大时,f 1和f 2的差值会变大,第一谐振频率f 1会降低。 where Z0 is the characteristic impedance of the transmission line making up the half-wavelength resonator. It can be understood that when the total capacitance C becomes larger, the difference between f 1 and f 2 will become larger, and the first resonant frequency f 1 will decrease.
当磁阻元件2的电阻率减小时,总电容C会增加,因此第一谐振频率f l会降低。图3为本发明实施例提供的一种示例性的微波磁传感器的第一谐振频率和磁阻元件的电阻率之间的关系图。该示例性微波磁传感器由微带制成,所述微带的特征阻抗为50Ω。如图3所示,当磁阻元件的电阻率减小时,该示例性微波磁传感器的第一谐振频率f 1单调降低。因此,根据第一谐振频率f 1,可以推算出磁阻元件的电阻率。 When the resistivity of the magnetoresistive element 2 decreases, the total capacitance C will increase, so the first resonant frequency f l will decrease. Fig. 3 is a diagram of the relationship between the first resonant frequency of an exemplary microwave magnetic sensor and the resistivity of the magneto-resistive element according to an embodiment of the present invention. This exemplary microwave magnetic sensor is made of microstrip with a characteristic impedance of 50Ω. As shown in FIG. 3 , when the resistivity of the magnetoresistive element decreases, the first resonant frequency f 1 of the exemplary microwave magnetic sensor decreases monotonously. Therefore, according to the first resonant frequency f 1 , the resistivity of the magnetoresistive element can be deduced.
在本发明中,耦合电容器CAP包含磁阻元件2。磁阻是指样品在强度为H的外部磁场下的电阻率的变化:In the present invention, the coupling capacitor CAP includes the magnetoresistive element 2 . Magnetoresistance refers to the change in resistivity of a sample under an external magnetic field of strength H:
Figure PCTCN2022077536-appb-000002
Figure PCTCN2022077536-appb-000002
其中δH代表磁阻,R(H)为样品在强度为H的磁场中的电阻率,R(0)为H=0时样品的电阻率。Wherein δH represents magnetoresistance, R(H) is the resistivity of the sample in a magnetic field with strength H, and R(0) is the resistivity of the sample when H=0.
本发明中的磁阻元件2为金属磁阻元件。金属磁阻元件可以是巨磁阻(GMR)元件、隧道磁阻(TMR)元件或各向异性磁阻(AMR)元件。通常,GMR元件、TMR元件和AMR元件的δH值大于半导体磁阻元件的δH值。以GMR为例,GMR是一种自旋电子效应,并且GMR元件的运作基于电子散射对自旋取向的依赖性。GMR元件的薄膜结构由交替设置的铁磁和非磁导电层构成。根据相邻铁磁层的磁化排列,薄膜结构的总电阻率可能会发生显着变化。平行排列时,总电阻率相对较低,而反平行排列时,总电阻率相对较高。The magnetoresistance element 2 in the present invention is a metal magnetoresistance element. The metal magnetoresistance element may be a giant magnetoresistance (GMR) element, a tunnel magnetoresistance (TMR) element or an anisotropic magnetoresistance (AMR) element. Generally, the δH value of the GMR element, the TMR element, and the AMR element is larger than that of the semiconductor magnetoresistive element. Taking GMR as an example, GMR is a spintronic effect, and the operation of GMR elements is based on the dependence of electron scattering on spin orientation. The thin-film structure of the GMR element consists of alternating ferromagnetic and non-magnetic conductive layers. Depending on the magnetization alignment of adjacent ferromagnetic layers, the overall resistivity of the thin-film structure can vary significantly. When arranged in parallel, the total resistivity is relatively low, while in antiparallel arrangement, the total resistivity is relatively high.
在本发明中,用于制作半波长谐振器的传输线可以是任何类型的平面传输线,包括带状线、微带和共面线。下面描述以微带为示例性平面传输线。In the present invention, the transmission line used to make the half-wavelength resonator can be any type of planar transmission line, including stripline, microstrip and coplanar line. The following describes a microstrip as an exemplary planar transmission line.
图4为本发明实施例提供的一种微带磁传感器的俯视图。图5为沿图4中A-A’截面的截面图。如图4和图5所示,微带磁传感器包括两个半波长谐振器101、磁阻元件102、衬底103和地线104。Fig. 4 is a top view of a microstrip magnetic sensor provided by an embodiment of the present invention. Fig. 5 is a sectional view along section A-A' in Fig. 4 . As shown in FIG. 4 and FIG. 5 , the microstrip magnetic sensor includes two half-wavelength resonators 101 , a magnetoresistive element 102 , a substrate 103 and a ground wire 104 .
两个所述半波长谐振器101由高导电性金属制成,包括但不限于金、银、铜或其组合。两个所述半波长谐振器101可以具有多层结构。The two half-wavelength resonators 101 are made of highly conductive metals, including but not limited to gold, silver, copper or combinations thereof. The two half-wavelength resonators 101 may have a multi-layer structure.
所述磁阻元件102为金属磁阻元件,可以是GMR元件、TMR元件和AMR元件中的一种。磁阻元件102位于两个半波长谐振器101之间,并与两个半波 长谐振器等距对称间隔。磁阻元件102可以具有多层结构。The magnetoresistive element 102 is a metal magnetoresistive element, which may be one of a GMR element, a TMR element and an AMR element. The magnetoresistive element 102 is located between the two half-wavelength resonators 101, and is equidistantly and symmetrically spaced from the two half-wavelength resonators. The magnetoresistive element 102 may have a multilayer structure.
衬底103由低损耗介电材料制成,包括但不限于硅、砷化镓、FR-4、氧化铝、蓝宝石、石英或其组合。The substrate 103 is made of a low loss dielectric material including but not limited to silicon, gallium arsenide, FR-4, alumina, sapphire, quartz or combinations thereof.
地线104由高导电性金属制成,包括但不限于金、银、铜或它们的组合。地线可以具有多层结构。The ground wire 104 is made of highly conductive metals, including but not limited to gold, silver, copper or combinations thereof. The ground wire may have a multilayer structure.
磁阻元件102可以被保护层覆盖。图6为本发明实施例提供的另一种微带磁传感器的截面图。如图6所示,在一个实施例中,磁阻元件102被保护层105覆盖。保护层105由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The magnetoresistive element 102 may be covered by a protective layer. Fig. 6 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 6 , in one embodiment, the magnetoresistive element 102 is covered by a protective layer 105 . The protection layer 105 is made of a low-k material, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
在一个实施例中,磁阻元件102被保护层覆盖,所述保护层填充谐振器101和磁阻元件102之间的间隙,并且覆盖半波长谐振器101的一部分。图7为本发明实施例提供的另一种微带磁传感器的截面图。如图7所示,磁阻元件102被保护层106覆盖,保护层106填充谐振器101和磁阻元件102之间的间隙,并覆盖半波长谐振器101的一部分。保护层106由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。In one embodiment, the magnetoresistive element 102 is covered by a protective layer that fills the gap between the resonator 101 and the magnetoresistive element 102 and covers a portion of the half-wavelength resonator 101 . Fig. 7 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 7 , the magnetoresistive element 102 is covered by a protective layer 106 , and the protective layer 106 fills the gap between the resonator 101 and the magnetoresistive element 102 and covers a part of the half-wavelength resonator 101 . The protective layer 106 is made of a low-k material including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
在本发明中,耦合电容器CAP可以具有多种结构。图8为本发明实施例提供的另一种微带磁传感器的俯视图。图9为沿图8中B-B’截面的截面图。如图8和图9所示,在一个实施例中,微带磁传感器包括磁阻元件202和两个隔离元件207。In the present invention, the coupling capacitor CAP may have various structures. Fig. 8 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention. Fig. 9 is a sectional view along section B-B' in Fig. 8 . As shown in FIGS. 8 and 9 , in one embodiment, the microstrip magnetic sensor includes a magnetoresistive element 202 and two isolation elements 207 .
磁阻元件202在每一侧具有台阶结构。磁阻元件202包括顶面、中间面和底面。磁阻元件202的底面直接接触衬底103的顶面。磁阻元件202的中间面和顶面位于半波长谐振器101的顶面之上,并且在每一侧覆盖半波长谐振器101一部分。The magnetoresistive element 202 has a stepped structure on each side. The magnetoresistive element 202 includes a top surface, a middle surface and a bottom surface. The bottom surface of the magnetoresistive element 202 directly contacts the top surface of the substrate 103 . The middle and top surfaces of the magneto-resistive element 202 are located above the top surface of the half-wavelength resonator 101 and cover a part of the half-wavelength resonator 101 on each side.
隔离元件207具有台阶结构。隔离元件207设置在半波长谐振器101和磁阻元件202之间。隔离元件207包括顶面、中间面和底面。隔离元件207的顶面直接接触磁阻元件202的中间面,隔离元件207的中间面直接接触半波长谐振器101的顶面。隔离元件207的底面直接接触衬底103的顶面。隔离元件207由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The isolation element 207 has a stepped structure. The isolation element 207 is provided between the half-wavelength resonator 101 and the magnetoresistive element 202 . The isolation element 207 includes a top surface, a middle surface and a bottom surface. The top surface of the isolation element 207 directly contacts the middle surface of the magnetoresistive element 202 , and the middle surface of the isolation element 207 directly contacts the top surface of the half-wavelength resonator 101 . The bottom surface of the isolation element 207 directly contacts the top surface of the substrate 103 . Isolation elements 207 are made of low-k materials including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
磁阻元件202为金属磁阻元件,可以是GMR元件、TMR元件和AMR元 件中的一种。磁阻元件202可以具有多层结构。The magneto-resistive element 202 is a metal magneto-resistive element, which may be one of a GMR element, a TMR element and an AMR element. The magnetoresistive element 202 may have a multilayer structure.
在一个实施例中,磁阻元件被保护层覆盖。图10为本发明实施例提供的另一种微带磁传感器的截面图。如图10所示,磁阻元件202被保护层205覆盖。保护层205由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅、或其组合。In one embodiment, the magnetoresistive element is covered by a protective layer. Fig. 10 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 10 , the magnetoresistive element 202 is covered by a protective layer 205 . The protection layer 205 is made of a low-k material, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
在一实施例中,隔离元件207和保护层205的材料相同。在其他一些实施例中,隔离元件207和保护层205可以由不同的材料制成。In one embodiment, the materials of the isolation element 207 and the protection layer 205 are the same. In some other embodiments, the isolation element 207 and the protective layer 205 may be made of different materials.
图11为本发明实施例提供的另一种微带磁传感器的俯视图。图12为沿图11中C-C’截面的截面图。如图11和12所示,在一个实施例中,磁传感器包括磁阻元件302和隔离元件307。Fig. 11 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention. Fig. 12 is a cross-sectional view along section C-C' in Fig. 11. As shown in FIGS. 11 and 12 , in one embodiment, the magnetic sensor includes a magnetoresistive element 302 and an isolation element 307 .
隔离元件307在每一侧具有台阶结构。隔离元件307包括顶面、中间面和底面。隔离元件307的底面直接接触衬底103的顶面。隔离元件307的中间面直接接触半波长谐振器101的顶面,并且在每一侧覆盖半波长谐振器101一部分。磁阻元件302设置在隔离元件307的顶面上。隔离元件307的材料为低k材料,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The isolation element 307 has a stepped structure on each side. The isolation element 307 includes a top surface, a middle surface and a bottom surface. The bottom surface of the isolation element 307 directly contacts the top surface of the substrate 103 . The middle face of the isolation element 307 directly touches the top face of the half-wave resonator 101 and covers a part of the half-wave resonator 101 on each side. The magnetoresistive element 302 is disposed on the top surface of the isolation element 307 . The material of the isolation element 307 is a low-k material, including but not limited to fluorine-doped silicon dioxide, organic silicon glass, porous silicon dioxide or a combination thereof.
在一个实施例中,磁阻元件302被保护层覆盖。图13为本发明实施例提供的另一种微带磁传感器的截面图。如图13所示,磁阻元件302被保护层305覆盖。保护层305由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅、或其组合。In one embodiment, the magnetoresistive element 302 is covered by a protective layer. Fig. 13 is a cross-sectional view of another microstrip magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 13 , the magnetoresistive element 302 is covered by a protective layer 305 . The protection layer 305 is made of a low-k material, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
在一实施例中,隔离元件307和保护层305由相同的材料制成。在其他一些实施例中,隔离元件307和保护层305可以由不同的材料制成。In one embodiment, the isolation element 307 and the protective layer 305 are made of the same material. In some other embodiments, the isolation element 307 and the protective layer 305 may be made of different materials.
在本发明中,可以调整半波长谐振器靠近磁阻元件的一端的宽度以满足特定的测量要求。在一实施例中,半波长谐振器包括过渡部分,所述过度部分位于半波长谐振器靠近磁阻元件的一侧。通过过渡部分,可以实现半波长谐振器靠近磁阻元件的一端的宽度为与磁阻元件的宽度的一致,从而满足特定的测量要求。In the present invention, the width of the end of the half-wavelength resonator close to the magnetoresistive element can be adjusted to meet specific measurement requirements. In an embodiment, the half-wavelength resonator includes a transition portion, and the transition portion is located on a side of the half-wavelength resonator close to the magnetoresistive element. Through the transition part, the width of the end of the half-wavelength resonator close to the magnetoresistive element can be consistent with the width of the magnetoresistive element, so as to meet specific measurement requirements.
图14为本发明实施例提供的另一种微带磁传感器的俯视图。图15为沿图14中D-D’截面的截面图。如图14和图15所示,微带磁传感器包括两个半波长谐振器401和一个磁阻元件402。半波长谐振器包括过渡部分408,所述过度部分408位于半波长谐振器靠近磁阻元件402的一端。通过过渡部分408,可 以实现半波长谐振器401靠近磁阻元件402的一端的宽度与磁阻元件402的宽度的一致。本发明不对过渡部分408的具体结构进行限定。Fig. 14 is a top view of another microstrip magnetic sensor provided by an embodiment of the present invention. Fig. 15 is a sectional view along the D-D' section in Fig. 14 . As shown in FIG. 14 and FIG. 15 , the microstrip magnetic sensor includes two half-wavelength resonators 401 and a magnetoresistive element 402 . The half-wavelength resonator includes a transition portion 408 located at one end of the half-wavelength resonator close to the magnetoresistive element 402 . Through the transition part 408, the width of the end of the half-wavelength resonator 401 close to the magnetoresistive element 402 can be consistent with the width of the magnetoresistive element 402. The present invention does not limit the specific structure of the transition portion 408 .
本发明提供的微波磁传感器还包括用于测量微波磁传感器的谐振频率的耦合单元。图16为本发明实施例提供的另一种微波磁传感器的结构示意图。如图16所示,在一个实施例中,磁传感器包括两个耦合单元509,用于测量微波磁传感器的谐振频率。耦合单元509由一段传输线制成,该传输线的特征阻抗与外部测量线路的特征阻抗一致,例如50Ω。在一实施例中,如图16所示,耦合单元509与半波长谐振器101之间的耦合为端对端耦合。在其他一些实施例中,耦合单元509与半波长谐振器101之间的耦合可以是其他类型的耦合,例如平行耦合。The microwave magnetic sensor provided by the present invention also includes a coupling unit for measuring the resonant frequency of the microwave magnetic sensor. Fig. 16 is a schematic structural diagram of another microwave magnetic sensor provided by an embodiment of the present invention. As shown in FIG. 16 , in one embodiment, the magnetic sensor includes two coupling units 509 for measuring the resonant frequency of the microwave magnetic sensor. The coupling unit 509 is made of a section of transmission line whose characteristic impedance is consistent with that of the external measurement line, eg 50Ω. In one embodiment, as shown in FIG. 16 , the coupling between the coupling unit 509 and the half-wavelength resonator 101 is end-to-end coupling. In some other embodiments, the coupling between the coupling unit 509 and the half-wavelength resonator 101 may be other types of coupling, such as parallel coupling.
在一些其他实施例中,微波磁传感器可以仅包括一个耦合单元。In some other embodiments, the microwave magnetic sensor may only include one coupling unit.
在一个实施例中,耦合单元509和半波长谐振器101由相同类型的传输线制成。在一些其他实施例中,耦合单元509和半波长谐振器101可以由不同类型的传输线制成。In one embodiment, the coupling unit 509 and the half-wavelength resonator 101 are made of the same type of transmission line. In some other embodiments, the coupling unit 509 and the half-wavelength resonator 101 may be made of different types of transmission lines.
在一个实施例中,耦合单元509和半波长谐振器101由相同的材料制成。在一些其他实施例中,耦合单元509和半波长谐振器101可以由不同的材料制成。In one embodiment, the coupling unit 509 and the half-wavelength resonator 101 are made of the same material. In some other embodiments, the coupling unit 509 and the half-wavelength resonator 101 may be made of different materials.
在一个实施例中,衬底、半波长谐振器、耦合单元和地线由非磁性材料制成。In one embodiment, the substrate, the half-wavelength resonator, the coupling unit and the ground are made of non-magnetic materials.
本发明还提供了微波磁传感器的测量方法。该方法包括S1,获得微波磁传感器的第一谐振频率与外部磁场强度之间的校准曲线,所述第一谐振频率为所述微波磁传感器的最低谐振频率,所述校准曲线可以通过在感兴趣的范围内不同强度的外部磁场下测量微波磁传感器的第一谐振频率来获得;S2,在待测磁场下测量微波磁传感器的第一谐振频率,并根据校准曲线获得待测磁场强度。The invention also provides a measurement method of the microwave magnetic sensor. The method includes S1, obtaining a calibration curve between the first resonant frequency of the microwave magnetic sensor and the strength of the external magnetic field, the first resonant frequency being the lowest resonant frequency of the microwave magnetic sensor, and the calibration curve can be obtained by Obtained by measuring the first resonant frequency of the microwave magnetic sensor under external magnetic fields of different strengths within the range; S2, measuring the first resonant frequency of the microwave magnetic sensor under the magnetic field to be measured, and obtaining the magnetic field strength to be measured according to the calibration curve.
以上所述仅为本发明的实施例,并不用以限制本发明。凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above descriptions are only examples of the present invention, and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included within the protection scope of the present invention.

Claims (18)

  1. 一种微波磁传感器,包括:A microwave magnetic sensor, comprising:
    两个半波长谐振器,每个所述半波长谐振器是一段传输线,其长度等于其基模谐振频率对应的波长的一半,两个所述半波长谐振器具有相同的长度和相同的所述基模谐振频率;Two half-wavelength resonators, each of the half-wavelength resonators is a section of transmission line whose length is equal to half of the wavelength corresponding to its fundamental mode resonance frequency, and the two half-wavelength resonators have the same length and the same Fundamental mode resonant frequency;
    一个磁阻元件,所述磁阻元件位于两个所述半波长谐振器之间,并与两个所述半波长谐振器等距对称间隔,所述磁阻元件与两个所述半波长谐振器的端部构成耦合电容器,两个所述半波长谐振器通过所述耦合电容器耦合。A magneto-resistance element, the magneto-resistance element is located between the two half-wavelength resonators, and is equidistantly and symmetrically spaced from the two half-wavelength resonators, and the magneto-resistance element resonates with the two half-wavelength resonators The ends of the resonators constitute coupling capacitors through which the two half-wavelength resonators are coupled.
  2. 根据权利要求1所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 1, characterized in that:
    所述磁阻元件为金属磁阻元件,包括巨磁阻元件、隧道磁阻元件或各向异性磁阻元件。The magneto-resistance element is a metal magneto-resistance element, including a giant magneto-resistance element, a tunnel magneto-resistance element or an anisotropic magneto-resistance element.
  3. 根据权利要求2所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 2, characterized in that:
    所述传输线是一种平面传输线,包括带状线、微带或共面线。The transmission line is a planar transmission line, including stripline, microstrip or coplanar line.
  4. 根据权利要求3所述的微波磁传感器,其特征在于,The microwave magnetic sensor according to claim 3, characterized in that,
    所述传输线是微带。The transmission line is a microstrip.
  5. 根据权利要求4所述的微波磁传感器,还包括:The microwave magnetic sensor according to claim 4, further comprising:
    衬底,由低损耗介电材料制成,包括但不限于硅、砷化镓、FR-4、氧化铝、蓝宝石、石英或其组合;Substrates, made of low-loss dielectric materials including, but not limited to, silicon, gallium arsenide, FR-4, alumina, sapphire, quartz, or combinations thereof;
    地线,由高导电性金属制成,包括但不限于金、银、铜或其组合。Ground wire, made of highly conductive metals, including but not limited to gold, silver, copper, or combinations thereof.
  6. 根据权利要求5所述的微波磁传感器,还包括保护层,其特征在于:The microwave magnetic sensor according to claim 5, further comprising a protective layer, characterized in that:
    所述保护层覆盖所述磁阻元件;The protective layer covers the magnetoresistive element;
    所述保护层由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica or combinations thereof.
  7. 根据权利要求6所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 6, characterized in that:
    所述保护层填充所述谐振器和所述磁阻元件之间的间隙,并且覆盖所述半波长谐振器的一部分。The protective layer fills a gap between the resonator and the magnetoresistive element, and covers a part of the half-wavelength resonator.
  8. 根据权利要求5所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 5, characterized in that:
    所述磁阻元件在每一侧具有台阶结构;The magnetoresistive element has a stepped structure on each side;
    所述磁阻元件包括顶面、中间面和底面,所述磁阻元件的底面直接接触衬底的顶面,所述磁阻元件的中间面和顶面位于所述半波长谐振器的顶面之上,并且在每一侧覆盖所述半波长谐振器一部分。The magnetoresistive element includes a top surface, a middle surface and a bottom surface, the bottom surface of the magnetoresistive element directly contacts the top surface of the substrate, and the middle surface and the top surface of the magnetoresistive element are located on the top surface of the half-wavelength resonator above, and cover part of the half-wavelength resonator on each side.
  9. 根据权利要求8所述的微波磁传感器,还包括隔离元件,其特征在于:The microwave magnetic sensor according to claim 8, further comprising an isolation element, characterized in that:
    所述隔离元件设置在所述半波长谐振器和所述磁阻元件之间;the isolation element is disposed between the half-wavelength resonator and the magnetoresistive element;
    所述隔离元件具有台阶结构;The isolation element has a stepped structure;
    所述隔离元件包括顶面、中间面和底面,所述隔离元件的顶面直接接触所述磁阻元件的中间面,所述隔离元件的中间面直接接触所述半波长谐振器的顶面,所述隔离元件的底面直接所述接触衬底的顶面。The isolation element includes a top surface, a middle surface and a bottom surface, the top surface of the isolation element directly contacts the middle surface of the magnetoresistive element, and the middle surface of the isolation element directly contacts the top surface of the half-wavelength resonator, The bottom surface of the isolation element is directly on the top surface of the contact substrate.
    所述隔离元件由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The isolation elements are made of low-k materials including, but not limited to, fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  10. 根据权利要求9所述的微波磁传感器,还包括保护层,其特征在于:The microwave magnetic sensor according to claim 9, further comprising a protective layer, characterized in that:
    所述保护层覆盖所述磁阻元件;The protective layer covers the magnetoresistive element;
    所述保护层由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅、或其组合。The protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  11. 根据权利要求5所述的微波磁传感器,还包括隔离元件,其特征在于:The microwave magnetic sensor according to claim 5, further comprising an isolation element, characterized in that:
    所述隔离元件在每一侧具有台阶结构;said spacer element has a stepped structure on each side;
    所述隔离元件包括顶面、中间面和底面,所述隔离元件的底面直接接触衬底的顶面,所述隔离元件的中间面直接接触所述半波长谐振器的顶面,并且在每一侧覆盖所述半波长谐振器一部分,所述磁阻元件设置在所述隔离元件的顶面上;The isolation element includes a top surface, a middle surface and a bottom surface, the bottom surface of the isolation element directly contacts the top surface of the substrate, the middle surface of the isolation element directly contacts the top surface of the half-wavelength resonator, and at each The side covers a part of the half-wavelength resonator, and the magnetoresistive element is arranged on the top surface of the isolation element;
    所述隔离元件的材料为低k材料,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅或其组合。The material of the isolation element is a low-k material, including but not limited to fluorine-doped silicon dioxide, organic silicon glass, porous silicon dioxide or a combination thereof.
  12. 根据权利要求11所述的微波磁传感器,还包括保护层,其特征在于:The microwave magnetic sensor according to claim 11, further comprising a protective layer, characterized in that:
    所述保护层覆盖所述磁阻元件;The protective layer covers the magnetoresistive element;
    所述保护层由低k材料制成,包括但不限于掺氟二氧化硅、有机硅玻璃、多孔二氧化硅、或其组合。The protective layer is made of low-k materials, including but not limited to fluorine-doped silica, silicone glass, porous silica, or combinations thereof.
  13. 根据权利要求5所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 5, characterized in that:
    所述半波长谐振器包括过渡部分,所述过度部分位于所述半波长谐振器靠 近所述磁阻元件的一侧;The half-wavelength resonator includes a transition portion, and the transition portion is located on a side of the half-wavelength resonator close to the magnetoresistive element;
    所述过渡部分靠近所述磁阻元件的一端的宽度与所述磁阻元件的宽度一致。The width of an end of the transition portion close to the magnetoresistive element is consistent with the width of the magnetoresistive element.
  14. 根据权利要求1所述的微波磁传感器,还包括耦合单元,其特征在于:The microwave magnetic sensor according to claim 1, further comprising a coupling unit, characterized in that:
    所述耦合单元用于测量所述微波磁传感器的谐振频率;The coupling unit is used to measure the resonant frequency of the microwave magnetic sensor;
    所述耦合单元由一段传输线制成,所述传输线的特征阻抗与外部测量线路的特征阻抗一致。The coupling unit is made of a length of transmission line whose characteristic impedance is identical to that of the external measurement line.
  15. 根据权利要求14所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 14, characterized in that:
    所述耦合单元与所述半波长谐振器之间的耦合为端对端耦合。The coupling between the coupling unit and the half-wavelength resonator is end-to-end coupling.
  16. 根据权利要求14所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 14, characterized in that:
    所述耦合单元与所述半波长谐振器之间的耦合为平行耦合。The coupling between the coupling unit and the half-wavelength resonator is parallel coupling.
  17. 根据权利要求14所述的微波磁传感器,其特征在于:The microwave magnetic sensor according to claim 14, characterized in that:
    所述衬底、所述半波长谐振器、所述耦合单元和所述地线由非磁性材料制成。The substrate, the half-wavelength resonator, the coupling unit and the ground are made of non-magnetic material.
  18. 根据权利要求1所述的一种微波磁传感器的测量方法,包括:The measuring method of a kind of microwave magnetic sensor according to claim 1, comprising:
    S1,获得所述微波磁传感器的第一谐振频率与外部磁场强度之间的校准曲线,所述第一谐振频率为所述微波磁传感器的最低谐振频率,所述校准曲线通过在感兴趣的范围内不同强度的外部磁场下测量所述微波磁传感器的所述第一谐振频率来获得;S1, obtaining the calibration curve between the first resonant frequency of the microwave magnetic sensor and the external magnetic field strength, the first resonant frequency is the lowest resonant frequency of the microwave magnetic sensor, and the calibration curve is passed in the range of interest obtained by measuring the first resonant frequency of the microwave magnetic sensor under external magnetic fields of different strengths;
    S2,在待测磁场下测量所述微波磁传感器的所述第一谐振频率,并根据所述校准曲线获得所述待测磁场的强度。S2. Measure the first resonant frequency of the microwave magnetic sensor under the magnetic field to be measured, and obtain the strength of the magnetic field to be measured according to the calibration curve.
PCT/CN2022/077536 2022-02-10 2022-02-23 Microwave magnetic sensor and measurement method therefor WO2023151130A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202210123309.4A CN114779133A (en) 2022-02-10 2022-02-10 Microwave magnetic sensor and measuring method thereof
CN202210123309.4 2022-02-10

Publications (1)

Publication Number Publication Date
WO2023151130A1 true WO2023151130A1 (en) 2023-08-17

Family

ID=82424183

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2022/077536 WO2023151130A1 (en) 2022-02-10 2022-02-23 Microwave magnetic sensor and measurement method therefor

Country Status (2)

Country Link
CN (1) CN114779133A (en)
WO (1) WO2023151130A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5985162A (en) * 1997-03-05 1999-11-16 Headway Technologies, Inc. Method for forming soft adjacent layer (SAL) magnetoresistive (MR) sensor element with electrically insulated soft adjacent layer (SAL)
US20060221507A1 (en) * 2005-03-31 2006-10-05 Rie Sato Magnetic sensor
CN101738587A (en) * 2008-11-24 2010-06-16 于文杰 Micro-magnetic sensor
CN202837524U (en) * 2012-09-18 2013-03-27 北京航空航天大学 Colossal magnetoresistance magnetoresistive sensor based on phase detection
CN110501659A (en) * 2019-09-10 2019-11-26 珠海多创科技有限公司 Self-powered magnetic sensor chip
CN111323737A (en) * 2020-04-09 2020-06-23 西安交通大学 Impedance sensitive type magnetic sensor and hardware detection circuit thereof
CN113567898A (en) * 2021-07-23 2021-10-29 中国科学院空天信息创新研究院 Low-frequency MEMS (micro-electromechanical system) magnetoresistive sensor modulated by magnetoresistive motion

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5985162A (en) * 1997-03-05 1999-11-16 Headway Technologies, Inc. Method for forming soft adjacent layer (SAL) magnetoresistive (MR) sensor element with electrically insulated soft adjacent layer (SAL)
US20060221507A1 (en) * 2005-03-31 2006-10-05 Rie Sato Magnetic sensor
CN101738587A (en) * 2008-11-24 2010-06-16 于文杰 Micro-magnetic sensor
CN202837524U (en) * 2012-09-18 2013-03-27 北京航空航天大学 Colossal magnetoresistance magnetoresistive sensor based on phase detection
CN110501659A (en) * 2019-09-10 2019-11-26 珠海多创科技有限公司 Self-powered magnetic sensor chip
CN111323737A (en) * 2020-04-09 2020-06-23 西安交通大学 Impedance sensitive type magnetic sensor and hardware detection circuit thereof
CN113567898A (en) * 2021-07-23 2021-10-29 中国科学院空天信息创新研究院 Low-frequency MEMS (micro-electromechanical system) magnetoresistive sensor modulated by magnetoresistive motion

Also Published As

Publication number Publication date
CN114779133A (en) 2022-07-22

Similar Documents

Publication Publication Date Title
US20100045285A1 (en) Magnetic sensor element and manufacturing method thereof
WO2013135117A1 (en) Magnetoresistance magnetic field gradient sensor
KR102616213B1 (en) Hybrid kinetic inductance device for superconducting quantum computing
CN105136349B (en) A kind of magnetic pressure transducer
CN215895506U (en) Quantum processing unit and quantum computer
WO2023151130A1 (en) Microwave magnetic sensor and measurement method therefor
CN107526046B (en) Planar inductance type magnetic sensor
De Cos et al. Very large magnetoimpedance (MI) in FeNi/Au multilayer film systems
Wu et al. A quality factor enhanced microwave sensor based on modified split-ring resonator for microfluidic applications
WO2019202169A1 (en) Single magnetic-layer microwave oscillator
JPH0249155A (en) Apparatus and method for describing characteristic of conductivity of substance
Regalla et al. Application of a Cylindrical Dielectric Resonator as an Angular Displacement Sensor
CN205079891U (en) Magnetism pressure sensor
US7986140B2 (en) Systems and methods for RF magnetic-field vector detection based on spin rectification effects
Hammer et al. Superconducting coplanar waveguide resonators for detector applications
JP5216727B2 (en) Thin film evaluation method
Frommberger et al. Processing and application of magnetoelastic thin films in high-frequency devices
JP3969002B2 (en) Magnetic sensor
CN114594312A (en) Liquid complex dielectric constant sensor of mutual coupling annular gap resonance structure and measuring method
CN104793156B (en) The preparation method of magnetic sensing device
CN117849677A (en) Magnetic field sensor and measuring method thereof
CN104793150A (en) Magnetic sensor and magnetic sensor manufacturing method
Joffe et al. Multiresonance measurement method for microwave microscopy
JP2001289926A (en) Magnetoresistance effect element, and magnetic sensor
RU2793891C1 (en) Spintron detector of microwave oscillations

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 22925492

Country of ref document: EP

Kind code of ref document: A1