WO2023128581A1 - Adhesive composition - Google Patents
Adhesive composition Download PDFInfo
- Publication number
- WO2023128581A1 WO2023128581A1 PCT/KR2022/021444 KR2022021444W WO2023128581A1 WO 2023128581 A1 WO2023128581 A1 WO 2023128581A1 KR 2022021444 W KR2022021444 W KR 2022021444W WO 2023128581 A1 WO2023128581 A1 WO 2023128581A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substituted
- group
- unsubstituted
- formula
- adhesive composition
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 62
- 239000000853 adhesive Substances 0.000 title claims abstract description 52
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 52
- 239000011347 resin Substances 0.000 claims abstract description 30
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000003999 initiator Substances 0.000 claims abstract description 27
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 25
- 239000000126 substance Substances 0.000 claims description 30
- 239000004593 Epoxy Substances 0.000 claims description 22
- 125000003118 aryl group Chemical group 0.000 claims description 22
- -1 cyclic anhydride Chemical class 0.000 claims description 22
- 125000000217 alkyl group Chemical group 0.000 claims description 20
- 125000003342 alkenyl group Chemical group 0.000 claims description 17
- 150000002431 hydrogen Chemical group 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 16
- 239000001257 hydrogen Substances 0.000 claims description 16
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims description 15
- 229910052760 oxygen Inorganic materials 0.000 claims description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 125000001072 heteroaryl group Chemical group 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 11
- 239000004925 Acrylic resin Substances 0.000 claims description 9
- 229920000178 Acrylic resin Polymers 0.000 claims description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 9
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 150000002367 halogens Chemical class 0.000 claims description 8
- 125000000101 thioether group Chemical group 0.000 claims description 8
- 125000002560 nitrile group Chemical group 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 6
- 125000003700 epoxy group Chemical group 0.000 claims description 6
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 6
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 239000003822 epoxy resin Substances 0.000 claims description 5
- 229920000647 polyepoxide Polymers 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 125000006717 (C3-C10) cycloalkenyl group Chemical group 0.000 claims description 3
- 125000000739 C2-C30 alkenyl group Chemical group 0.000 claims description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical group OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- UFHFLCQGNIYNRP-VVKOMZTBSA-N Dideuterium Chemical compound [2H][2H] UFHFLCQGNIYNRP-VVKOMZTBSA-N 0.000 claims 2
- 150000001735 carboxylic acids Chemical class 0.000 claims 2
- 230000000052 comparative effect Effects 0.000 description 21
- 239000000463 material Substances 0.000 description 19
- 238000011156 evaluation Methods 0.000 description 12
- 150000003254 radicals Chemical class 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 125000002091 cationic group Chemical group 0.000 description 8
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 8
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- 230000035515 penetration Effects 0.000 description 7
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000002562 thickening agent Substances 0.000 description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 125000001931 aliphatic group Chemical group 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical compound C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000010538 cationic polymerization reaction Methods 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 230000005764 inhibitory process Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- YJTKZCDBKVTVBY-UHFFFAOYSA-N 1,3-Diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=CC(C=2C=CC=CC=2)=C1 YJTKZCDBKVTVBY-UHFFFAOYSA-N 0.000 description 2
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 2
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052805 deuterium Inorganic materials 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- 125000001041 indolyl group Chemical group 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 125000003373 pyrazinyl group Chemical group 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- OJOWICOBYCXEKR-APPZFPTMSA-N (1S,4R)-5-ethylidenebicyclo[2.2.1]hept-2-ene Chemical compound CC=C1C[C@@H]2C[C@@H]1C=C2 OJOWICOBYCXEKR-APPZFPTMSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- UICXTANXZJJIBC-UHFFFAOYSA-N 1-(1-hydroperoxycyclohexyl)peroxycyclohexan-1-ol Chemical compound C1CCCCC1(O)OOC1(OO)CCCCC1 UICXTANXZJJIBC-UHFFFAOYSA-N 0.000 description 1
- CPQUDUZKHJNUHS-UHFFFAOYSA-N 1-[2-(cyclopenten-1-yloxy)ethoxy]cyclopentene Chemical compound C=1CCCC=1OCCOC1=CCCC1 CPQUDUZKHJNUHS-UHFFFAOYSA-N 0.000 description 1
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical group C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 1
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical group C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical group C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- YZLYANFUIYPBNT-UHFFFAOYSA-N 2,2-bis(7-oxabicyclo[4.1.0]heptan-3-ylmethyl)propanedioic acid Chemical compound OC(=O)C(CC1CCC2OC2C1)(CC1CCC2OC2C1)C(O)=O YZLYANFUIYPBNT-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- KNDAEDDIIQYRHY-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-(piperazin-1-ylmethyl)pyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)CN1CCNCC1 KNDAEDDIIQYRHY-UHFFFAOYSA-N 0.000 description 1
- GRWFFFOEIHGUBG-UHFFFAOYSA-N 3,4-Epoxy-6-methylcyclohexylmethyl-3,4-epoxy-6-methylcyclo-hexanecarboxylate Chemical compound C1C2OC2CC(C)C1C(=O)OCC1CC2OC2CC1C GRWFFFOEIHGUBG-UHFFFAOYSA-N 0.000 description 1
- PSQVRPSVCYLDTE-UHFFFAOYSA-N 3-(5-bicyclo[2.2.1]hept-2-enyl)prop-2-enoic acid Chemical compound C1C2C(C=CC(=O)O)CC1C=C2 PSQVRPSVCYLDTE-UHFFFAOYSA-N 0.000 description 1
- YWVFNWVZBAWOOY-UHFFFAOYSA-N 4-methylcyclohexane-1,2-dicarboxylic acid Chemical compound CC1CCC(C(O)=O)C(C(O)=O)C1 YWVFNWVZBAWOOY-UHFFFAOYSA-N 0.000 description 1
- INYHZQLKOKTDAI-UHFFFAOYSA-N 5-ethenylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(C=C)CC1C=C2 INYHZQLKOKTDAI-UHFFFAOYSA-N 0.000 description 1
- OEMSKMUAMXLNKL-UHFFFAOYSA-N 5-methyl-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C)=CCC2C(=O)OC(=O)C12 OEMSKMUAMXLNKL-UHFFFAOYSA-N 0.000 description 1
- DFGKGUXTPFWHIX-UHFFFAOYSA-N 6-[2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]acetyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)C1=CC2=C(NC(O2)=O)C=C1 DFGKGUXTPFWHIX-UHFFFAOYSA-N 0.000 description 1
- LQOPXMZSGSTGMF-UHFFFAOYSA-N 6004-79-1 Chemical compound C1CC2C3C(=O)OC(=O)C3C1C2 LQOPXMZSGSTGMF-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 208000025721 COVID-19 Diseases 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 229910007541 Zn O Inorganic materials 0.000 description 1
- IEOVKCGOIXZDRK-UTLUCORTSA-N [(1R,2R,4R)-2-bicyclo[2.2.1]hept-5-enyl]methyl prop-2-enoate Chemical compound C1[C@H]2[C@H](COC(=O)C=C)C[C@@H]1C=C2 IEOVKCGOIXZDRK-UTLUCORTSA-N 0.000 description 1
- FHKPLLOSJHHKNU-INIZCTEOSA-N [(3S)-3-[8-(1-ethyl-5-methylpyrazol-4-yl)-9-methylpurin-6-yl]oxypyrrolidin-1-yl]-(oxan-4-yl)methanone Chemical compound C(C)N1N=CC(=C1C)C=1N(C2=NC=NC(=C2N=1)O[C@@H]1CN(CC1)C(=O)C1CCOCC1)C FHKPLLOSJHHKNU-INIZCTEOSA-N 0.000 description 1
- NRJLSUZLHMXXHJ-UHFFFAOYSA-N [4-(7-oxabicyclo[4.1.0]heptane-4-carbonyloxymethyl)cyclohexyl]methyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CCC(COC(=O)C2CC3OC3CC2)CC1 NRJLSUZLHMXXHJ-UHFFFAOYSA-N 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000004644 alkyl sulfinyl group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- FYVWQKLEEBBZON-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-3-ylmethyl) nonanedioate Chemical compound O1C2CC(CCC21)COC(CCCCCCCC(=O)OCC1CC2C(CC1)O2)=O FYVWQKLEEBBZON-UHFFFAOYSA-N 0.000 description 1
- GTZJMIWDRJQUHG-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) butanedioate Chemical compound C1CC2OC2CC1COC(=O)CCC(=O)OCC1CC2OC2CC1 GTZJMIWDRJQUHG-UHFFFAOYSA-N 0.000 description 1
- YHBCULIFYATDAS-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) decanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCCCCCC(=O)OCC1CC2OC2CC1 YHBCULIFYATDAS-UHFFFAOYSA-N 0.000 description 1
- WAQJWJHUIZCDFA-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) heptanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCCC(=O)OCC1CC2OC2CC1 WAQJWJHUIZCDFA-UHFFFAOYSA-N 0.000 description 1
- DJUWPHRCMMMSCV-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) hexanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCC(=O)OCC1CC2OC2CC1 DJUWPHRCMMMSCV-UHFFFAOYSA-N 0.000 description 1
- LOVMILFXAQVYMP-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) pentanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCC(=O)OCC1CC2OC2CC1 LOVMILFXAQVYMP-UHFFFAOYSA-N 0.000 description 1
- LMMDJMWIHPEQSJ-UHFFFAOYSA-N bis[(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl)methyl] hexanedioate Chemical compound C1C2OC2CC(C)C1COC(=O)CCCCC(=O)OCC1CC2OC2CC1C LMMDJMWIHPEQSJ-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000002676 chrysenyl group Chemical group C1(=CC=CC=2C3=CC=C4C=CC=CC4=C3C=CC12)* 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- TXCDCPKCNAJMEE-UHFFFAOYSA-N dibenzofuran Chemical group C1=CC=C2C3=CC=CC=C3OC2=C1 TXCDCPKCNAJMEE-UHFFFAOYSA-N 0.000 description 1
- 125000005509 dibenzothiophenyl group Chemical group 0.000 description 1
- 125000000532 dioxanyl group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 125000003914 fluoranthenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC=C4C1=C23)* 0.000 description 1
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- QQYNRBAAQFZCLF-UHFFFAOYSA-N furan-maleic anhydride adduct Chemical compound O1C2C3C(=O)OC(=O)C3C1C=C2 QQYNRBAAQFZCLF-UHFFFAOYSA-N 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000005549 heteroarylene group Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 125000001977 isobenzofuranyl group Chemical group C=1(OC=C2C=CC=CC12)* 0.000 description 1
- 125000000904 isoindolyl group Chemical group C=1(NC=C2C=CC=CC12)* 0.000 description 1
- 125000005956 isoquinolyl group Chemical group 0.000 description 1
- 150000002540 isothiocyanates Chemical class 0.000 description 1
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- QCGKUFZYSPBMAY-UHFFFAOYSA-N methyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1C(C(=O)OC)CCC2OC21 QCGKUFZYSPBMAY-UHFFFAOYSA-N 0.000 description 1
- KNRCVAANTQNTPT-UHFFFAOYSA-N methyl-5-norbornene-2,3-dicarboxylic anhydride Chemical compound O=C1OC(=O)C2C1C1(C)C=CC2C1 KNRCVAANTQNTPT-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 230000007903 penetration ability Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- 125000001792 phenanthrenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 125000004934 phenanthridinyl group Chemical group C1(=CC=CC2=NC=C3C=CC=CC3=C12)* 0.000 description 1
- 125000004625 phenanthrolinyl group Chemical group N1=C(C=CC2=CC=C3C=CC=NC3=C12)* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical group C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M thiocyanate group Chemical group [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/08—Metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/01—Hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/05—Alcohols; Metal alcoholates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/101—Esters; Ether-esters of monocarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J135/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
Definitions
- the present invention relates to adhesive compositions.
- Korean Patent Publication No. 10-2016-0011310 discloses an organic light emitting display device including a dam (DAM) structure disposed on a substrate and spaced apart from a display unit.
- the dam structure may be disposed outside the display unit and may be disposed to surround the display unit.
- the dam structure exists outside the display unit, the permeation path of moisture or oxygen penetrating into the display unit from the outside of the organic light emitting display device is lengthened, and thus moisture permeability resistance of the organic light emitting display device may be further improved.
- An object of the present invention is to provide an adhesive composition that helps to maintain the performance of electronic devices from the external environment.
- the present invention provides an adhesive composition comprising a curable resin, a getter and a crosslinking agent, wherein the crosslinking agent includes a compound represented by Formula 1 or Formula 2 below.
- Ring A may or may not exist, and when present is a substituted or unsubstituted C3-C10 cycloalkyl group or a substituted or unsubstituted C3-C10 cycloalkenyl group,
- X is hydrogen, a substituted or unsubstituted C2 ⁇ C20 alkenyl group, a substituted or unsubstituted C1 ⁇ C20 alkylidene group, (meth)acrylate or a substituted or unsubstituted C1 ⁇ C30 in which (meth)acrylic acid is present.
- a substituted or unsubstituted C2-C30 alkenyl group in which an alkyl group or (meth)acrylate or (meth)acrylic acid is present, and the alkyl group or alkenyl group may have one or more -CH2- substituted with oxygen,
- R1 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1 ⁇ C30 alkyl group, substituted or unsubstituted C2 ⁇ C30 alkenyl group, substituted or unsubstituted C1 ⁇ C30 alkoxy group group, a substituted or unsubstituted C1 ⁇ C30 sulfide group, a substituted or unsubstituted C6 ⁇ C50 aryl group, or a substituted or unsubstituted C2 ⁇ C50 heteroaryl group,
- n is an integer from 0 to 4.
- the norbonane structure has or does not have a double bond, and the total number of double bonds present in the norbonane structure and ring A is 1 or 2, and the position of the double bond is not limited
- Ring B may or may not be present, and if present is a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), or an epoxy ring;
- Ring C may or may not be present, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), an epoxy ring, or a cyclic anhydride a nobonanic group with or without a carboxylic acid;
- Ring D may or may not exist, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group, a substituted or unsubstituted C3-C10 cycloalkyl group with an epoxy group, a cyclic dicarboxylic acid, Or an epoxy ring,
- Y is hydrogen, a hydroxy group, a substituted or unsubstituted C1 ⁇ C30 alkyl group in which (meth)acrylic acid is present (one or more -CH2- may be substituted with oxygen), a substituted or unsubstituted C1 ⁇ in which carboxylic acid is present
- R2 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1 ⁇ C30 alkyl group, substituted or unsubstituted C1 ⁇ C30 hydroxyalkyl group, carboxylic acid group, substituted or unsubstituted C1 ⁇ C30 carboxylic acid alkyl group, substituted or unsubstituted C2 ⁇ C30 alkenyl group, substituted or unsubstituted C1 ⁇ C30 alkoxy group, substituted or unsubstituted C1 ⁇ C30 sulfide group, substituted or unsubstituted A C6 ⁇ C50 aryl group, or a substituted or unsubstituted C2 ⁇ C50 heteroaryl group,
- R3 and R4 are each independently hydrogen, a substituted or unsubstituted C1 ⁇ C30 alkyl group, a substituted or unsubstituted C2 ⁇ C30 alkenyl group, a substituted or unsubstituted C6 ⁇ C30 aryl group, or a substituted or unsubstituted C2 ⁇ C30 aryl group.
- n is an integer from 0 to 4.
- the norbonane structure has or does not have a double bond
- the total number of double bonds present in the norbonane structure and ring A is 0 or 1
- the position of the double bond is not limited
- the present invention also provides a cured product in which the adhesive composition is cured.
- the present invention also provides a dam (DAM) structure in which the adhesive composition is cured.
- DAM dam
- the present invention also provides a display device including the dam structure.
- the adhesive composition according to the present invention has a high cross-linking density, decreases the space between resins, thereby lowering the water permeation rate (moisture permeation rate), and has a cyclic structure, especially a bicyclic or bridged structure, which has a higher polarity than the linear structure, so that the attractive force between the resins is reduced. It acts strongly and has excellent adhesion and reliability.
- aryl refers to a C5-50 aromatic hydrocarbon ring group such as phenyl, benzyl, naphthyl, biphenyl, terphenyl, fluorene, phenanthrenyl, triphenyl It may mean containing an aromatic ring such as renyl, perylenyl, chrysenyl, fluoranthenyl, benzofluorenyl, benzotriphenylenyl, benzochrysenyl, anthracenyl, stilbenyl, pyrenyl, etc., and "hetero "Aryl” is a C2-50 aromatic ring containing one or more heteroatoms, for example, pyrrolyl, pyrazinyl, pyridinyl, indolyl, isoindolyl, furyl, benzofuranyl, isobenzofuranyl, Dibenzofuranyl, benzothiophenyl, di
- Ar x (where x is an integer) means a substituted or unsubstituted C6-C50 aryl group or a substituted or unsubstituted C2-C50 heteroaryl group, unless otherwise defined
- L x (where x is an integer) means a direct bond, a substituted or unsubstituted C6 ⁇ C50 arylene group, or a substituted or unsubstituted C2 ⁇ C50 heteroarylene group, unless otherwise defined
- R x (where x is If not particularly defined, hydrogen, deuterium, halogen, nitro group, nitrile group, substituted or unsubstituted C1 ⁇ C30 alkyl group, substituted or unsubstituted C2 ⁇ C30 alkenyl group, substituted or unsubstituted C1 ⁇ C30 alkoxy group, substituted or unsubstituted C1 ⁇ C30 sulfide group, substituted or unsubstituted C
- substituted or unsubstituted refers to deuterium, halogen, amino, cyano, nitrile, nitro, nitroso, sulfamoyl, isothiocyanate, thiocyanate groups.
- carboxyl group, or C1 ⁇ C30 alkyl group C1 ⁇ C30 alkylsulfinyl group, C1 ⁇ C30 alkylsulfonyl group, C1 ⁇ C30 alkylsulfanyl group, C1 ⁇ C12 fluoroalkyl group, C2 ⁇ C30 alkenyl group, C1 ⁇ C30 alkoxy group, C1 ⁇ C12 N-alkylamino group, C2 ⁇ C20 N,N-dialkylamino group, substituted or unsubstituted C1 ⁇ C30 sulfide group, C1 ⁇ C6 N-alkylsulfamoyl group, C2 ⁇ C12 N,N-dialkylsulfamoyl group, C3 ⁇ C30 silyl group, C3 ⁇ C20 cycloalkyl group, C3 ⁇ C20 heterocycloalkyl group, C6 ⁇ C50 aryl group and C2 ⁇ C50 heteroaryl group It may mean that it is substituted or
- An adhesive composition according to an embodiment of the present invention includes a curable resin, a getter and a crosslinking agent.
- the adhesive composition may further include an initiator.
- the content of the crosslinking agent in the total composition may be included in the range of 0.5 to 30% by weight.
- the curable resin may include an epoxy-based resin, an acrylic-based resin, or a mixture thereof.
- Types of the epoxy-based resin and the acrylic-based resin are not limited, and known resins and commercially available resins may be used.
- resins having an epoxy group applicable as an adhesive composition may be used without particular limitation.
- acrylic resins having an acrylic group may be used without particular limitation, for example, Aliphatic difunctional urethane acrylate and Aliphatic trifunctional urethane acrylate. ), Aliphatic hexafunctional urethane acrylate, Aromatic difunctional urethane acrylate, Aliphatic trifunctional urethane acrylate and Aromatic hexafunctional urethane An acrylic resin having a urethane group such as acrylate (aromatic hexafunctional urethane acrylate) may be used.
- the mixing ratio thereof may be 1:99 to 99:1, and more specifically, 25:75 to 75:25. It is not limited thereto.
- a cationic initiator or a radical initiator may be used, and when an epoxy-based resin and an acrylic-based resin are used simultaneously, a cationic initiator and a radical initiator may be simultaneously used as the initiator.
- a cationic initiator is a material that initiates a ring-opening reaction of an epoxy group, and refers to a compound capable of initiating cationic polymerization by irradiation of electromagnetic waves or a compound capable of generating a compound capable of initiating cationic polymerization by irradiation of electromagnetic waves. .
- the content of the cationic initiator is preferably adjusted based on the content of the epoxy resin, for example, 0.1 to 10 parts by weight of the cationic initiator is preferably included with respect to 100 parts by weight of the epoxy resin, and 0.3 to 7 parts by weight is used. It is more preferred for efficient polymerization.
- the type of the cationic initiator is not particularly limited, and for example, one or more cationic polymerization initiators selected from among aromatic diazonium salts, aromatic iodine aluminum salts, aromatic sulfonium salts, and iron-arene complexes may be used, among which aromatic sulfonium salts It may be preferred to use, but is not limited to the above example.
- the radical initiator is, for example, a substance that reacts with an acrylate group to start an addition polymerization reaction, and the content of the radical initiator is preferably adjusted based on the content of the acrylic resin.
- a radical initiator based on 100 parts by weight of the acrylic resin It is preferable to include 0.1 to 10 parts by weight, and it is more preferable to include 0.3 to 7 parts by weight for an effective polymerization reaction.
- the radical initiator may be a thermal initiator or a photoinitiator.
- Thermal radical initiators include azo compounds such as 2,2'-azobis(isobutyronitrile); hydroperoxides such as tert-butyl hydroperoxide; and peroxides such as benzoyl peroxide and cyclohexanone peroxide, but one or more of them may be used, but is not limited thereto.
- Getter is a material that absorbs and removes all gases and moisture very quickly by chemical reaction except for inert gas. It helps to maintain, and may be included in 0.1 to 40% by weight based on the total weight of the adhesive composition. When the adhesive composition contains less than 0.1% by weight of the getter, an excessively small amount of the getter may cause a problem in that the adhesive retention of the cured adhesive composition is greatly reduced. It is better to adjust with The content of the getter may be adjusted according to the desired characteristics of the adhesive composition, and the content of the getter is preferably 30% by weight or less in order to impart better adhesion, and the content of the getter is 10% by weight in order to realize a high crosslinking density of the adhesive composition. % or less may be preferred to be included in the adhesive composition.
- the getter may be included in the range of 0.5% by weight to 10% by weight. More specifically, the getter may be included within the range of 1% to 8% by weight. If it is less than the above range, the moisture blocking properties of the adhesive composition may be deteriorated and a problem of deterioration of adhesive strength may occur, and if it exceeds the above range, optical properties such as light transmittance may be deteriorated.
- the getter is included in the adhesive composition, absorbs moisture penetrating into the cured body after the adhesive composition is cured, and functions to prevent deterioration of adhesive strength of the cured body due to moisture permeation, and metal oxides or alloys thereof may be used.
- the metal oxide for example, one or more of CaO, MgO, Al2O3, ZrO2, TiO2, PbO, and ZnO may be used, and an alloy of the metal oxide may be, for example, Al-Zn-O (AZO) and In-Sb.
- AZO Al-Zn-O
- ITO In-Sb
- CaO has the best water absorption ability, and in order to further improve the adhesive retention of the cured adhesive composition, a CaO getter can be used, and since MgO has better optical properties such as light transmittance and haze, the cured adhesive composition In order to implement higher optical properties of , it is recommended to use MgO getter.
- the crosslinking agent includes a compound represented by Formula 1 or Formula 2 below.
- Ring A may or may not exist, and when present is a substituted or unsubstituted C3-C10 cycloalkyl group or a substituted or unsubstituted C3-C10 cycloalkenyl group,
- X is hydrogen, a substituted or unsubstituted C2 ⁇ C20 alkenyl group, a substituted or unsubstituted C1 ⁇ C20 alkylidene group, (meth)acrylate or a substituted or unsubstituted C1 ⁇ C30 in which (meth)acrylic acid is present.
- a substituted or unsubstituted C2-C30 alkenyl group in which an alkyl group or (meth)acrylate or (meth)acrylic acid is present, and the alkyl group or alkenyl group may have one or more -CH2- substituted with oxygen,
- R1 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1 ⁇ C30 alkyl group, substituted or unsubstituted C2 ⁇ C30 alkenyl group, substituted or unsubstituted C1 ⁇ C30 alkoxy group group, a substituted or unsubstituted C1 ⁇ C30 sulfide group, a substituted or unsubstituted C6 ⁇ C50 aryl group, or a substituted or unsubstituted C2 ⁇ C50 heteroaryl group,
- n is an integer from 0 to 4.
- the norbonane structure may or may not have a double bond, and the total number of double bonds present in the norbonane structure and ring A is one or two, and the position of the double bond is not limited.
- the crosslinking agent of Chemical Formula 1 may be used together with an acrylic resin. More specifically, crosslinking is possible through a bond between a double bond of norbornane and a carboxyl group or a vinyl group of an acrylic resin.
- crosslinking agent of Formula 1 examples are shown in Table 1 below, but are not limited thereto.
- Chemical Formula 2 is as follows.
- Ring B may or may not be present, and if present is a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), or an epoxy ring;
- Ring C may or may not be present, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), an epoxy ring, or a cyclic anhydride a nobonanic group with or without a carboxylic acid;
- Ring D may or may not exist, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group, a substituted or unsubstituted C3-C10 cycloalkyl group with an epoxy group, a cyclic dicarboxylic acid, Or an epoxy ring,
- Y is hydrogen, a hydroxy group, a substituted or unsubstituted C1 ⁇ C30 alkyl group in which (meth)acrylic acid is present (one or more -CH2- may be substituted with oxygen), a substituted or unsubstituted C1 ⁇ in which carboxylic acid is present
- R2 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1 ⁇ C30 alkyl group, substituted or unsubstituted C1 ⁇ C30 hydroxyalkyl group, carboxylic acid group, substituted or unsubstituted C1 ⁇ C30 carboxylic acid alkyl group, substituted or unsubstituted C2 ⁇ C30 alkenyl group, substituted or unsubstituted C1 ⁇ C30 alkoxy group, substituted or unsubstituted C1 ⁇ C30 sulfide group, substituted or unsubstituted A C6 ⁇ C50 aryl group, or a substituted or unsubstituted C2 ⁇ C50 heteroaryl group,
- R3 and R4 are each independently hydrogen, a substituted or unsubstituted C1 ⁇ C30 alkyl group, a substituted or unsubstituted C2 ⁇ C30 alkenyl group, a substituted or unsubstituted C6 ⁇ C30 aryl group, or a substituted or unsubstituted C2 ⁇ C30 aryl group.
- n is an integer from 0 to 4.
- the norbonane structure has or does not have a double bond
- the total number of double bonds present in the norbonane structure and ring A is 0 or 1
- the position of the double bond is not limited
- the crosslinking agent of Chemical Formula 2 may be used when an epoxy-based resin or a mixture of an epoxy-based resin and an acrylic-based resin is used. More specifically, crosslinking with an epoxy-based resin is possible through an epoxy group, an acid anhydride group, or a hydroxyl group of norbornane.
- crosslinking agent of Formula 2 examples are shown in Table 2 below, but are not limited thereto.
- two or more types of resins are used in the adhesive composition
- two or more types of crosslinking agents of Chemical Formulas 1 and 2 may be mixed and used, and may be formulated according to the type and content of the resin.
- the norbornane crosslinking agent of Chemical Formula 1 is suitable, and when applying epoxy resins, it is preferable to apply the norbornane crosslinking agent of Chemical Formula 2, but is not limited thereto.
- the adhesive composition of the present invention may further include one or more additives selected from a thickener, a thixotropy agent, and a spacer.
- a thickener and a thixotropic agent are materials that impart thickening properties and thixotropy to the adhesive composition, respectively, and may include, for example, fumed silica, and may be further included in the adhesive composition in an amount of 0.1 to 20% by weight.
- the spacer is a material that helps to maintain a constant distance between the upper and lower plates when an adhesive composition is used in the upper and lower plates that need to be attached. Any material that does not chemically react with the adhesive composition can be used without particular limitation. do.
- the adhesive composition of the present invention may exhibit a viscosity of 50,000 to 350,000 cP.
- the adhesive composition may be advantageous to secure excellent processability.
- the viscosity range for example, it may have thixotropy which is advantageous for a process of forming a dam structure of a display device.
- the adhesive composition is out of the above viscosity range, it is difficult to form a cured body with a desired thickness, and a problem of poor fairness may occur.
- a thickener may be included as an additive so as to exhibit a viscosity within the above range, and as the thickener, conventional thickeners may be used without limitation.
- a display device which is another embodiment of the present invention, includes the hardened body, and may be specifically applied to a dam outside the display device.
- the forming process may follow a conventional process.
- UV curing, thermal curing, or a curing process using both UV and heat may be used.
- the dam structure formed from the dam material composition according to the embodiment may exhibit excellent adhesion and oxygen/moisture barrier properties.
- the dam structure formed from the dam material composition according to the embodiment may have flexible characteristics and may be applicable to various flexible/bendable/foldable display devices.
- a dam structure formed from the dam material composition according to the embodiment may have excellent reliability and durability. Therefore, using the dam material composition according to the embodiment, a display device having excellent reliability and durability can be manufactured.
- the dam material composition according to the embodiment can be usefully applied to the manufacture of deformable display devices such as flexible/bendable/foldable.
- the DAM to be evaluated is located outside the center of the glass substrate, and the opaque DAM for checking whether moisture permeates is located inside the DAM for evaluation. When moisture permeates the external evaluation DAM, it also affects the opaque DAM located inside. This was identified and the moisture penetration time was confirmed. All DAMs were evaluated with a fixed width of 5 mm. The distance between the DAM for external evaluation and the DAM for internal evaluation must have the same distance. For example, if the internal opaque DAM is a circle with a diameter of 5 cm, the external DAM for evaluation should be at least 6 cm. For another example, if the DAM for internal evaluation is in the shape of a square, the external DAM should also be drawn with its center coincident with the internal rectangle and maintained at a certain distance.
- the moisture penetration confirmation material absorbs moisture
- the opaque material changes to transparent due to the nature of CaO, and the moisture absorption can be confirmed, and the time required for the opaque DAM to become transparent by consuming moisture was measured (unit: hr).
- the speed of the discharge head was between 5 and 80 cm/min depending on the viscosity and surface characteristics of the material.
- Exposure was performed at 1000 to 5000 mJ.
- the specified components were added to a 300 ml paste mixer container at the component ratio of Table 4, then put into a revolution-rotation mixer, and then mixed at a revolution of 1200 rpm and a rotation of 1200 rpm for 60 minutes to prepare an adhesive composition. After that, the moisture inhibitory power and adhesion reliability of the cured body of the adhesive composition were evaluated by the above method, and are shown in Tables 5 and 6 below.
- the content of the crosslinking agent exhibited excellent water permeation inhibition within the range of 0.5 to 30% by weight, and particularly excellent water penetration ability within the range of 1.0 to 20% by weight.
- the content of the crosslinking agent was low, and the moisture permeation inhibition was low, and in the case of Example 15, it can be seen that the physical properties rather deteriorated due to the excessive content of norbornene acid anhydride. Under conditions of high temperature and high humidity, excess acid anhydride is converted into carboxylic acid, which is expected to play a role in reducing durability of the material.
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Abstract
Description
본 발명은 접착 조성물에 관한 것이다.The present invention relates to adhesive compositions.
4차 산업혁명이 도래한 이래로 이제는 일상 생활에서 전자기기는 사람들의 24 시간을 함께 한다. 그러면서 대부분의 전자기기들은 생활과 밀접한 환경에 같이 놓이게 된다. 특히 모바일 기기는 고습의 환경에 놓이는 경우가 많게 된다. 예를 들면 COVID-19의 전염병의 유행과 맞물려 손씻기, 쎄니타이저 사용, 등 수분 및 화학물질에 노출이 되는 경우가 대표적이다. 또한 해외 여행의 어려움으로 다양한 국내 엑티비티 활동이 활발해지면서 상대적으로 높은 온도의 외부 환경에서 전자기기가 노출되는 상황도 발생한다.Since the advent of the 4th industrial revolution, electronic devices are now with people 24 hours a day in daily life. At the same time, most electronic devices are placed together in an environment close to life. In particular, mobile devices are often placed in environments with high humidity. For example, in line with the epidemic of COVID-19, exposure to moisture and chemicals such as hand washing, use of sanitizers, etc. is typical. In addition, as various domestic activities become active due to the difficulties of overseas travel, there are situations in which electronic devices are exposed to a relatively high temperature external environment.
한편 반도체 산업 분야의 발전과 맞물려 재료의 성능 또한 상향평준화 되고 있다. 성능이 상향 되면서 전자기기의 기능이 장시간 유지되는 것이 화두이다. 결국 고성능 전자기기가 외부 환경에 대해서 기능 저하 없이 유지되는 것이 관심사이다. 여기서 전자기기의 성능을 저하시키는 것은 고온, 고습의 환경이며 여기에 대기 중의 산소 또한 전자 기기의 성능을 저하시키는 요인이 된다. Meanwhile, along with the development of the semiconductor industry, the performance of materials is also being leveled up. It is a hot topic that the function of electronic devices is maintained for a long time as the performance is improved. After all, it is of interest that high-performance electronic devices are maintained without deterioration in the external environment. Here, it is a high-temperature, high-humidity environment that degrades the performance of the electronic device, and oxygen in the air is also a factor that degrades the performance of the electronic device.
한국공개특허 제10-2016-0011310호에는 기판상에 배치되면서 디스플레이부와 이격 배치된 댐(DAM) 구조체를 포함하는 유기발광 표시 장치를 개시하고 있다. 상기 댐 구조체는 디스플레이부의 외곽에 배치될 수 있으며, 디스플레이부를 둘러싸도록 배치될 수 있다. 댐 구조체가 디스플레이부의 외곽에 존재함에 따라, 유기 발광 표시 장치의 외측부에서 디스플레이부로 침투하는 수분이나 산소의 침투 경로가 길어지므로, 유기 발광 표시 장치의 내투습성이 더욱 향상될 수 있다.Korean Patent Publication No. 10-2016-0011310 discloses an organic light emitting display device including a dam (DAM) structure disposed on a substrate and spaced apart from a display unit. The dam structure may be disposed outside the display unit and may be disposed to surround the display unit. As the dam structure exists outside the display unit, the permeation path of moisture or oxygen penetrating into the display unit from the outside of the organic light emitting display device is lengthened, and thus moisture permeability resistance of the organic light emitting display device may be further improved.
본 발명은 외부 환경으로부터 전자기기 성능을 유지할 수 있도록 돕는 접착 조성물을 제공하는 것을 목적으로 한다.An object of the present invention is to provide an adhesive composition that helps to maintain the performance of electronic devices from the external environment.
또한, 고온-고습 조건에서 신뢰성이 우수한 접착 조성물을 제공하는 것을 목적으로 한다.In addition, it is an object of the present invention to provide an adhesive composition having excellent reliability under high-temperature-high-humidity conditions.
상기의 과제 및 추가적 과제에 대하여 아래에서 자세히 서술한다.The above tasks and additional tasks are described in detail below.
상기의 과제를 해결하기 위한 수단으로서,As a means for solving the above problems,
본 발명은 경화성 수지, 게터 및 가교제를 포함하는 접착 조성물로서, 상기 가교제는 하기 화학식 1 또는 하기 화학식 2로 표현되는 화합물을 포함하는 접착 조성물을 제공한다.The present invention provides an adhesive composition comprising a curable resin, a getter and a crosslinking agent, wherein the crosslinking agent includes a compound represented by Formula 1 or Formula 2 below.
<화학식 1><Formula 1>
(상기 화학식 1에서,(In Formula 1 above,
고리 A는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기, 또는 치환 또는 비치환된 C3~C10의 사이클로알케닐기이며,Ring A may or may not exist, and when present is a substituted or unsubstituted C3-C10 cycloalkyl group or a substituted or unsubstituted C3-C10 cycloalkenyl group,
X는 수소, 치환 또는 비치환된 C2~C20의 알케닐기, 치환 또는 비치환된 C1~C20의 알킬리덴기, (메트)아크릴레이트 또는 (메트)아크릴산이 존재하는 치환 또는 비치환된 C1~C30의 알킬기 또는 (메트)아크릴레이트 또는 (메트)아크릴산이 존재하는 치환 또는 비치환된 C2~C30의 알케닐기이며, 상기 알킬기 또는 알케닐기는 하나 이상의 -CH2- 가 산소로 치환될 수 있으며,X is hydrogen, a substituted or unsubstituted C2~C20 alkenyl group, a substituted or unsubstituted C1~C20 alkylidene group, (meth)acrylate or a substituted or unsubstituted C1~C30 in which (meth)acrylic acid is present. A substituted or unsubstituted C2-C30 alkenyl group in which an alkyl group or (meth)acrylate or (meth)acrylic acid is present, and the alkyl group or alkenyl group may have one or more -CH2- substituted with oxygen,
R1은 각각 독립적으로 수소, 중수소, 할로겐, 니트로기, 니트릴기, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 알콕시기, 치환 또는 비치환된 C1~C30의 설파이드기, 치환 또는 비치환된 C6~C50의 아릴기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴기이며,R1 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1~C30 alkyl group, substituted or unsubstituted C2~C30 alkenyl group, substituted or unsubstituted C1~C30 alkoxy group group, a substituted or unsubstituted C1~C30 sulfide group, a substituted or unsubstituted C6~C50 aryl group, or a substituted or unsubstituted C2~C50 heteroaryl group,
m은 0 내지 4의 정수이며,m is an integer from 0 to 4;
화학식 1에는 도시하지 않았으나 노보난 구조는 이중결합이 있거나 없으며, 노보난 구조 및 고리 A에 존재하는 이중결합의 총합계는 1개 또는 2개이며, 이중결합의 위치는 제한되지 않는다)Although not shown in Formula 1, the norbonane structure has or does not have a double bond, and the total number of double bonds present in the norbonane structure and ring A is 1 or 2, and the position of the double bond is not limited)
<화학식 2><Formula 2>
(상기 화학식 2에서,(In Formula 2 above,
고리 B는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기(하나 이상의 -CH2-가 -CO-로 치환될 수 있음), 또는 에폭시 고리이며,Ring B may or may not be present, and if present is a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), or an epoxy ring;
고리 C는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기(하나 이상의 -CH2-가 -CO-로 치환될 수 있음), 에폭시 고리, 또는 고리형 무수디카르복실산이 존재하거나 없는 노보난기이며,Ring C may or may not be present, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), an epoxy ring, or a cyclic anhydride a nobonanic group with or without a carboxylic acid;
고리 D는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기, 에폭시기가 존재하는 치환 또는 비치환된 C3~C10의 사이클로알킬기, 고리형 무수디카르복실산, 또는 에폭시 고리이며,Ring D may or may not exist, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group, a substituted or unsubstituted C3-C10 cycloalkyl group with an epoxy group, a cyclic dicarboxylic acid, Or an epoxy ring,
Y는 수소, 히드록시기, (메트)아크릴산이 존재하는 치환 또는 비치환된 C1~C30의 알킬기(하나 이상의 -CH2- 가 산소로 치환될 수 있음), 카르복실산이 존재하는 치환 또는 비치환된 C1~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 히드록시 알킬기 또는 카르복실산기이며,Y is hydrogen, a hydroxy group, a substituted or unsubstituted C1~C30 alkyl group in which (meth)acrylic acid is present (one or more -CH2- may be substituted with oxygen), a substituted or unsubstituted C1~ in which carboxylic acid is present A C30 alkenyl group, a substituted or unsubstituted C1~C30 hydroxyalkyl group or a carboxylic acid group,
Z는 CH2, O, S, NR3, P=O 또는 PR4이며,Z is CH2, O, S, NR3, P=0 or PR4;
R2는 각각 독립적으로 수소, 중수소, 할로겐, 니트로기, 니트릴기, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C1~C30의 히드록시 알킬기, 카르복실산기, 치환 또는 비치환된 C1~C30의 카르복실산 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 알콕시기, 치환 또는 비치환된 C1~C30의 설파이드기, 치환 또는 비치환된 C6~C50의 아릴기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴기이며,R2 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1~C30 alkyl group, substituted or unsubstituted C1~C30 hydroxyalkyl group, carboxylic acid group, substituted or unsubstituted C1~C30 carboxylic acid alkyl group, substituted or unsubstituted C2~C30 alkenyl group, substituted or unsubstituted C1~C30 alkoxy group, substituted or unsubstituted C1~C30 sulfide group, substituted or unsubstituted A C6~C50 aryl group, or a substituted or unsubstituted C2~C50 heteroaryl group,
R3 및 R4는 각각 독립적으로 수소, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C6~C30의 아릴기, 또는 치환 또는 비치환된 C2~C30의 헤테로아릴기이며,R3 and R4 are each independently hydrogen, a substituted or unsubstituted C1~C30 alkyl group, a substituted or unsubstituted C2~C30 alkenyl group, a substituted or unsubstituted C6~C30 aryl group, or a substituted or unsubstituted C2~C30 aryl group. A C2~C30 heteroaryl group,
n은 0 내지 4의 정수이며,n is an integer from 0 to 4;
화학식 2에는 도시하지 않았으나 노보난 구조는 이중결합이 있거나 없으며, 노보난 구조 및 고리 A에 존재하는 이중결합의 총합계는 0개 또는 1개이며, 이중결합의 위치는 제한되지 않으며,Although not shown in Formula 2, the norbonane structure has or does not have a double bond, the total number of double bonds present in the norbonane structure and ring A is 0 or 1, and the position of the double bond is not limited,
화학식 2에는 도시하지 않았으나 이웃하는 2개의 탄소에 산소가 결합된 에폭시 구조가 0개 내지 2개 포함될 수 있으며,Although not shown in Chemical Formula 2, 0 to 2 epoxy structures in which oxygen is bonded to two adjacent carbons may be included,
화학식 2에는 도시하지 않았으나 이웃하는 탄소와 결합하여 형성된 고리형 무수디카르복실산 구조가 0개 내지 2개 포함될 수 있다).Although not shown in Chemical Formula 2, 0 to 2 cyclic anhydride structures formed by bonding with neighboring carbons may be included).
본 발명은 또한, 상기 접착 조성물이 경화된 경화체를 제공한다.The present invention also provides a cured product in which the adhesive composition is cured.
본 발명은 또한, 상기 접착 조성물이 경화된 댐(DAM) 구조체를 제공한다.The present invention also provides a dam (DAM) structure in which the adhesive composition is cured.
본 발명은 또한, 상기 댐 구조체를 포함하는 디스플레이 장치를 제공한다.The present invention also provides a display device including the dam structure.
본 발명에 따른 접착 조성물은 가교 밀도가 높고, 수지간의 공간이 감소하여 수분 침투 속도(수분 투과 속도)를 저하시키며 Linear 구조보다 극성이 높은 cyclic 구조, 특히bicyclic, 또는 Bridged 구조를 가져 수지간의 인력이 강하게 작용하여 부착력 및 신뢰성이 우수하다. The adhesive composition according to the present invention has a high cross-linking density, decreases the space between resins, thereby lowering the water permeation rate (moisture permeation rate), and has a cyclic structure, especially a bicyclic or bridged structure, which has a higher polarity than the linear structure, so that the attractive force between the resins is reduced. It acts strongly and has excellent adhesion and reliability.
상기의 효과 및 추가적 효과에 대하여 아래에서 자세히 서술한다.The above effects and additional effects are described in detail below.
이하에 본 발명을 상세하게 설명하기에 앞서, 본 명세서에 사용된 용어는 특정의 실시예를 기술하기 위한 것일 뿐 첨부하는 특허청구의 범위에 의해서만 한정되는 본 발명의 범위를 한정하려는 것은 아님을 이해하여야 한다. 본 명세서에 사용되는 모든 기술용어 및 과학용어는 다른 언급이 없는 한은 기술적으로 통상의 기술을 가진 자에게 일반적으로 이해되는 것과 동일한 의미를 가진다.Prior to describing the present invention in detail below, it is understood that the terms used herein are intended to describe specific embodiments and are not intended to limit the scope of the present invention, which is limited only by the appended claims. shall. All technical and scientific terms used herein have the same meaning as commonly understood by a person of ordinary skill in the art unless otherwise specified.
본 명세서 및 청구범위의 전반에 걸쳐, 다른 언급이 없는 한 포함(comprise, comprises, comprising)이라는 용어는 언급된 물건, 단계 또는 일군의 물건, 및 단계를 포함하는 것을 의미하고, 임의의 어떤 다른 물건, 단계 또는 일군의 물건 또는 일군의 단계를 배제하는 의미로 사용된 것은 아니다.Throughout this specification and claims, the terms "comprise", "comprise" and "comprising", unless stated otherwise, are meant to include a stated object, step or group of objects, and steps, and any other object However, it is not used in the sense of excluding a step or a group of objects or a group of steps.
본 명세서 및 청구범위의 전반에 걸쳐, 용어 "아릴"은 C5-50의 방향족 탄화수소 고리기, 예를 들어, 페닐, 벤질, 나프틸, 비페닐, 터페닐, 플루오렌, 페난트레닐, 트리페닐레닐, 페릴레닐, 크리세닐, 플루오란테닐, 벤조플루오레닐, 벤조트리페닐레닐, 벤조크리세닐, 안트라세닐, 스틸베닐, 파이레닐 등의 방향족 고리를 포함하는 것을 의미할 수 있으며, "헤테로아릴"은 1 개 이상의 헤테로 원소를 포함하는 C2-50의 방향족 고리로서, 예를 들어, 피롤릴, 피라지닐, 피리디닐, 인돌릴, 이소인돌릴, 푸릴, 벤조푸라닐, 이소벤조푸라닐, 디벤조푸라닐, 벤조티오페닐, 디벤조티오페닐, 퀴놀릴기, 이소퀴놀릴, 퀴녹살리닐, 카르바졸릴, 페난트리디닐, 아크리디닐, 페난트롤리닐, 티에닐, 및 피리딘 고리, 피라진 고리, 피리미딘 고리, 피리다진 고리, 트리아진 고리, 인돌 고리, 퀴놀린 고리, 아크리딘고리, 피롤리딘 고리, 디옥산 고리, 피페리딘 고리, 모르폴린 고리, 피페라진 고리, 카르바졸 고리, 푸란 고리, 티오펜 고리, 옥사졸 고리, 옥사디아졸 고리, 벤조퓨란 고리, 티아졸 고리, 티아디아졸 고리, 벤조티오펜 고리, 트리아졸 고리, 이미다졸 고리, 벤조이미다졸 고리, 피란 고리, 디벤조푸란 고리 등으로부터 형성되는 헤테로고리기를 포함하는 것을 의미할 수 있다.Throughout this specification and claims, the term "aryl" refers to a C5-50 aromatic hydrocarbon ring group such as phenyl, benzyl, naphthyl, biphenyl, terphenyl, fluorene, phenanthrenyl, triphenyl It may mean containing an aromatic ring such as renyl, perylenyl, chrysenyl, fluoranthenyl, benzofluorenyl, benzotriphenylenyl, benzochrysenyl, anthracenyl, stilbenyl, pyrenyl, etc., and "hetero "Aryl" is a C2-50 aromatic ring containing one or more heteroatoms, for example, pyrrolyl, pyrazinyl, pyridinyl, indolyl, isoindolyl, furyl, benzofuranyl, isobenzofuranyl, Dibenzofuranyl, benzothiophenyl, dibenzothiophenyl, quinolyl group, isoquinolyl, quinoxalinyl, carbazolyl, phenanthridinyl, acridinyl, phenanthrolinyl, thienyl, and pyridine ring, pyrazine ring, pyrimidine ring, pyridazine ring, triazine ring, indole ring, quinoline ring, acridine ring, pyrrolidine ring, dioxane ring, piperidine ring, morpholine ring, piperazine ring, carbazole ring , Furan ring, thiophene ring, oxazole ring, oxadiazole ring, benzofuran ring, thiazole ring, thiadiazole ring, benzothiophene ring, triazole ring, imidazole ring, benzoimidazole ring, pyran ring , It may mean including a heterocyclic group formed from a dibenzofuran ring and the like.
또한, 화학식에서 Arx(여기서 x는 정수임)는 특별히 정의되지 않는 경우, 치환 또는 비치환된 C6~C50의 아릴기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴기를 의미하며, L x(여기서 x는 정수임)은 특별히 정의되지 않는 경우, 직접결합, 치환 또는 비치환된 C6~C50의 아릴렌기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴렌기를 의미하며, R x(여기서 x는 정수임)은 특별히 정의되지 않는 경우, 수소, 중수소, 할로겐, 니트로기, 니트릴기, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 알콕시기, 치환 또는 비치환된 C1~C30의 설파이드기, 치환 또는 비치환된 C6~C50의 아릴기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴기를 의미한다.In addition, in the formula, Ar x (where x is an integer) means a substituted or unsubstituted C6-C50 aryl group or a substituted or unsubstituted C2-C50 heteroaryl group, unless otherwise defined, and L x ( Where x is an integer) means a direct bond, a substituted or unsubstituted C6~C50 arylene group, or a substituted or unsubstituted C2~C50 heteroarylene group, unless otherwise defined, and R x (where x is If not particularly defined, hydrogen, deuterium, halogen, nitro group, nitrile group, substituted or unsubstituted C1~C30 alkyl group, substituted or unsubstituted C2~C30 alkenyl group, substituted or unsubstituted C1 ~C30 alkoxy group, substituted or unsubstituted C1~C30 sulfide group, substituted or unsubstituted C6~C50 aryl group, or substituted or unsubstituted C2~C50 heteroaryl group.
본 명세서 및 청구범위 전반에 걸쳐, 용어 "치환 또는 비치환된"은 중수소, 할로겐, 아미노기, 시아노기, 니트릴기, 니트로기, 니트로소기, 술파모일기, 이소티오시아네이트기, 티오시아네이트기, 카르복시기, 또는 C1~C30의 알킬기, C1~C30의 알킬술피닐기, C1~C30의 알킬술포닐기, C1~C30의 알킬술파닐기, C1∼C12 의 플루오로알킬기, C2~C30의 알케닐기, C1~C30의 알콕시기, C1~C12의 N-알킬아미노기, C2~C20의 N,N-디알킬아미노기, 치환 또는 비치환된 C1~C30의 설파이드기, C1∼C6의 N-알킬술파모일기, C2∼C12의 N,N-디알킬술파모일기, C3~C30의 실릴기, C3~C20의 시클로알킬기, C3~C20의 헤테로시클로알킬기, C6~C50의 아릴기 및 C2~C50의 헤테로아릴기 등으로 이루어진 군으로부터 선택된 하나 이상의 기로 치환되거나 치환되지 않는 것을 의미할 수 있으나, 특별히 이에 한정되는 것은 아니다. 또한, 본원 명세서 전체에서 동일한 기호는 특별히 언급하지 않는 한 같은 의미를 가질 수 있다. 한편, *은 결합위치를 의미한다.Throughout this specification and claims, the term “substituted or unsubstituted” refers to deuterium, halogen, amino, cyano, nitrile, nitro, nitroso, sulfamoyl, isothiocyanate, thiocyanate groups. , carboxyl group, or C1~C30 alkyl group, C1~C30 alkylsulfinyl group, C1~C30 alkylsulfonyl group, C1~C30 alkylsulfanyl group, C1~C12 fluoroalkyl group, C2~C30 alkenyl group, C1 ~C30 alkoxy group, C1~C12 N-alkylamino group, C2~C20 N,N-dialkylamino group, substituted or unsubstituted C1~C30 sulfide group, C1~C6 N-alkylsulfamoyl group, C2~C12 N,N-dialkylsulfamoyl group, C3~C30 silyl group, C3~C20 cycloalkyl group, C3~C20 heterocycloalkyl group, C6~C50 aryl group and C2~C50 heteroaryl group It may mean that it is substituted or unsubstituted with one or more groups selected from the group consisting of, but is not particularly limited thereto. In addition, the same symbol throughout the present specification may have the same meaning unless otherwise specified. On the other hand, * means a binding position.
한편, 본 발명의 여러 가지 실시예들은 명확한 반대의 지적이 없는 한 그 외의 어떤 다른 실시예들과 결합될 수 있다. 이하, 본 발명의 실시예 및 이에 따른 효과를 설명하기로 한다.On the other hand, various embodiments of the present invention can be combined with any other embodiments unless clearly indicated to the contrary. Hereinafter, embodiments of the present invention and effects thereof will be described.
이하에서 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.
본 발명의 일실시예에 따른 접착 조성물은 경화성 수지, 게터 및 가교제를 포함한다. 상기 접착 조성물은 개시제를 더 포함할 수 있다. 전체 조성물 중 상기 가교제 함량은 0.5 내지 30 중량% 포함될 수 있다.An adhesive composition according to an embodiment of the present invention includes a curable resin, a getter and a crosslinking agent. The adhesive composition may further include an initiator. The content of the crosslinking agent in the total composition may be included in the range of 0.5 to 30% by weight.
상기 경화성 수지는 에폭시계 수지, 아크릴계 수지 또는 이들의 혼합물이 포함될 수 있다. 상기 에폭시계 수지 및 아크릴계 수지의 종류는 제한되지 않으며, 공지의 수지 및 상용화된 수지를 사용할 수 있다.The curable resin may include an epoxy-based resin, an acrylic-based resin, or a mixture thereof. Types of the epoxy-based resin and the acrylic-based resin are not limited, and known resins and commercially available resins may be used.
경화성 수지 중 에폭시계 수지로는 접착 조성물로 적용가능한 에폭시기를 갖는 수지들을 특별한 제한 없이 사용할 수 있으며, 일예로서 (3,4-에폭시시클로헥실)메틸-3',4'-에폭시시클로헥산카르복실레이트, 3,4-에폭시-6-메틸시클로헥실메틸-3',4'-에폭시-6'-메틸시클로헥산카르복실레이트, 비스(3,4-에폭시시클로헥실메틸)아디페이트, 비스((3,4-에폭시-6-메틸시클로헥실)메틸)아디페이트, 비스(3,4-에폭시시클로헥실메틸)말로네이트, 비스(3,4-에폭시시클로헥실메틸)숙시네이트, 비스(3,4-에폭시시클로헥실메틸)글루타레이트, 비스(3,4-에폭시시클로헥실메틸)피멜레이트, 비스(3,4-에폭시시클로헥실메틸)아젤레이트 및 비스(3,4-에폭시시클로헥실메틸)세바케이트 등을 사용할 수 있다.Among the curable resins, as the epoxy-based resin, resins having an epoxy group applicable as an adhesive composition may be used without particular limitation. As an example, (3,4-epoxycyclohexyl)methyl-3',4'-epoxycyclohexanecarboxylate , 3,4-epoxy-6-methylcyclohexylmethyl-3 ', 4'-epoxy-6'-methylcyclohexanecarboxylate, bis (3,4-epoxycyclohexylmethyl) adipate, bis ((3 ,4-epoxy-6-methylcyclohexyl)methyl)adipate, bis(3,4-epoxycyclohexylmethyl)malonate, bis(3,4-epoxycyclohexylmethyl)succinate, bis(3,4- Epoxycyclohexylmethyl)glutarate, bis(3,4-epoxycyclohexylmethyl)pimelate, bis(3,4-epoxycyclohexylmethyl)azelate and bis(3,4-epoxycyclohexylmethyl)sebacate etc. can be used.
경화성 수지 중 아크릴계 수지로는 아크릴기를 갖는 수지들을 특별한 제한 없이 사용할 수 있으며, 예를 들어 알리파틱 2-관능 우레탄 아크릴레이트(Aliphatic difunctional urethane acrylate), 알리파틱 3-관능 우레탄 아크릴레이트(Aliphatic trifunctional urethane acrylate), 알리파틱 6-관능 우레탄 아크릴레이트(Aliphatic hexafunctional urethane acrylate), 아로마틱 2-관능 우레탄 아크릴레이트(Aromatic difunctional urethane acrylate), 아로마틱 3-관능 우레탄 아크릴레이트(Aliphatic trifunctional urethane acrylate) 및 아로마틱 6-관능 우레탄 아크릴레이트(Aromatic hexafunctional urethane acrylate) 등의 우레탄기를 갖는 아크릴계 수지를 사용할 수 있다.Among the curable resins, as the acrylic resin, resins having an acrylic group may be used without particular limitation, for example, Aliphatic difunctional urethane acrylate and Aliphatic trifunctional urethane acrylate. ), Aliphatic hexafunctional urethane acrylate, Aromatic difunctional urethane acrylate, Aliphatic trifunctional urethane acrylate and Aromatic hexafunctional urethane An acrylic resin having a urethane group such as acrylate (aromatic hexafunctional urethane acrylate) may be used.
상기 에폭시계 수지와 아크릴계 수지를 함께 사용할 경우, 이들의 혼합비율로는 1:99 내지 99:1의 혼합비율로 사용할 수 있으며, 더 구체적으로 25 : 75 내지 75 : 25의 혼합비율로 사용할 수 있으나 이에 제한되는 것은 아니다.When the epoxy resin and the acrylic resin are used together, the mixing ratio thereof may be 1:99 to 99:1, and more specifically, 25:75 to 75:25. It is not limited thereto.
상기 개시제로는 양이온 개시제 또는 라디칼 개시제를 사용할 수 있으며, 에폭시계 수지와 아크릴계 수지가 동시에 사용될 경우 개시제로 양이온 개시제 및 라디칼 개시제를 동시에 사용할 수 있다. 양이온 개시제는 에폭시기의 고리열림반응을 시작시키는 물질로서, 전자기파의 조사에 의해 양이온 중합을 개시시킬 수 있는 화합물 또는 전자기파의 조사에 의해 양이온 중합을 개시시킬 수 있는 화합물을 생성할 수 있는 화합물을 의미한다. 양이온 개시제는 에폭시계 수지의 함량을 기준으로 함량을 조절하는 것이 좋으며, 예를 들어 에폭시계 수지 100 중량부에 대하여 양이온 개시제를 0.1 내지 10 중량부로 포함하는 것이 선호되며, 0.3 내지 7 중량부로 사용되는 것이 효과적인 중합반응을 위하여 보다 선호된다.As the initiator, a cationic initiator or a radical initiator may be used, and when an epoxy-based resin and an acrylic-based resin are used simultaneously, a cationic initiator and a radical initiator may be simultaneously used as the initiator. A cationic initiator is a material that initiates a ring-opening reaction of an epoxy group, and refers to a compound capable of initiating cationic polymerization by irradiation of electromagnetic waves or a compound capable of generating a compound capable of initiating cationic polymerization by irradiation of electromagnetic waves. . The content of the cationic initiator is preferably adjusted based on the content of the epoxy resin, for example, 0.1 to 10 parts by weight of the cationic initiator is preferably included with respect to 100 parts by weight of the epoxy resin, and 0.3 to 7 parts by weight is used. It is more preferred for efficient polymerization.
상기 양이온 개시제의 종류는 특별히 제한되지 않으며, 예를 들면, 방향족 디아조늄염, 방향족 요오드 알루미늄염, 방향족 설포늄염 및 철-아렌 착체 중 1종 이상의 양이온 중합 개시제를 사용할 수 있고, 이 중 방향족 설포늄염을 사용하는 것이 선호될 수 있지만, 상기 예시에 한정되는 것은 아니다.The type of the cationic initiator is not particularly limited, and for example, one or more cationic polymerization initiators selected from among aromatic diazonium salts, aromatic iodine aluminum salts, aromatic sulfonium salts, and iron-arene complexes may be used, among which aromatic sulfonium salts It may be preferred to use, but is not limited to the above example.
라디칼 개시제는 예를 들어 아크릴레이트기와 반응하여, 첨가중합반응을 시작하는 물질로서, 라디칼 개시제는 아크릴계 레진의 함량을 기준으로 함량을 조절하는 것이 좋으며, 예를 들어 아크릴계 레진 100 중량부에 대하여 라디칼 개시제를 0.1 내지 10 중량부로 포함하는 것이 선호되며, 0.3 내지 7 중량부로 포함되는 것이 효과적인 중합반응을 위하여 보다 선호된다.The radical initiator is, for example, a substance that reacts with an acrylate group to start an addition polymerization reaction, and the content of the radical initiator is preferably adjusted based on the content of the acrylic resin. For example, a radical initiator based on 100 parts by weight of the acrylic resin It is preferable to include 0.1 to 10 parts by weight, and it is more preferable to include 0.3 to 7 parts by weight for an effective polymerization reaction.
상기 라디칼 개시제는 열 개시제 또는 광개시제일 수 있다. 열 라디칼 개시제는 아조 화합물, 예를 들어 2,2'-아조비스(아이소부티로니트릴); 하이드로퍼옥사이드, 예를 들어 tert-부틸 하이드로퍼옥사이드; 및 퍼옥사이드, 예를 들어 벤조일 퍼옥사이드 및 사이클로헥사논 퍼옥사이드로부터 중 1종 이상을 사용할 수 있으나, 이에 한정되는 것은 아니다.The radical initiator may be a thermal initiator or a photoinitiator. Thermal radical initiators include azo compounds such as 2,2'-azobis(isobutyronitrile); hydroperoxides such as tert-butyl hydroperoxide; and peroxides such as benzoyl peroxide and cyclohexanone peroxide, but one or more of them may be used, but is not limited thereto.
게터(Getter)는 불활성 가스(Inert gas)를 제외한 모든 가스와 수분을 화학반응에 의해 아주 빠르게 흡수 제거하는 특성이 있는 소재로서, 접착 조성물에 포함되어 수분을 흡수하고 접착 조성물이 경화 후 높은 접착력을 유지하는데 도움을 주며, 접착 조성물 전체 중량에 대하여 0.1 내지 40 중량%로 포함될 수 있다. 접착 조성물에 게터가 0.1 중량% 미만으로 포함되는 경우 지나치게 적은 소량의 게터 함량으로 인해 접착 조성물 경화체의 접착 유지력이 크게 떨어지는 문제가 발생할 수 있으며, 특성들이 온전히 발휘되기 위해서는 게터의 함량은 40 중량% 이하로 조절하는 것이 좋다. 게터의 함량은 선호되는 접착 조성물 특성에 따라 조절될 수 있으며, 더욱 우수한 접착력 부여를 위해서는 게터의 함량이 30 중량% 이하인 것이 선호되며, 접착 조성물의 높은 가교 밀도를 구현하기 위해서는 게터의 함량이 10 중량% 이하로 접착 조성물에 포함되는 것이 선호될 수 있다. Getter is a material that absorbs and removes all gases and moisture very quickly by chemical reaction except for inert gas. It helps to maintain, and may be included in 0.1 to 40% by weight based on the total weight of the adhesive composition. When the adhesive composition contains less than 0.1% by weight of the getter, an excessively small amount of the getter may cause a problem in that the adhesive retention of the cured adhesive composition is greatly reduced. It is better to adjust with The content of the getter may be adjusted according to the desired characteristics of the adhesive composition, and the content of the getter is preferably 30% by weight or less in order to impart better adhesion, and the content of the getter is 10% by weight in order to realize a high crosslinking density of the adhesive composition. % or less may be preferred to be included in the adhesive composition.
구체적으로 게터는 0.5 중량% 내지 10 중량% 범위내 포함될 수 있다. 더 구체적으로 게터는 1 중량% 내지 8 중량% 범위내로 포함될 수 있다. 상기 범위 미만에서는 접착조성물의 수분 차단 특성이 떨어지며 접착력 저하 문제가 발생할 수 있으며, 상기 범위를 초과하는 경우 광투과도 등의 광학적 특성이 떨어질 수 있다. Specifically, the getter may be included in the range of 0.5% by weight to 10% by weight. More specifically, the getter may be included within the range of 1% to 8% by weight. If it is less than the above range, the moisture blocking properties of the adhesive composition may be deteriorated and a problem of deterioration of adhesive strength may occur, and if it exceeds the above range, optical properties such as light transmittance may be deteriorated.
게터는 접착 조성물에 포함되어, 접착 조성물이 경화된 후 경화체 내부로 침투하는 수분을 흡수하여, 수분 침투로 인한 경화체의 접착력 저하를 방지하는 기능을 하며, 금속산화물 또는 이들의 합금을 사용할 수 있다. 금속 산화물은 예를 들어, CaO, MgO, Al2O3, ZrO2, TiO2, PbO 및 ZnO 중 1종 이상을 사용할 수 있으며, 금속 산화물의 합금은 예를 들어, Al-Zn-O(AZO) 및 In-Sb-O(ITO) 중 1종 이상을 사용할 수 있으며, 2종 이상의 게터를 혼합하여 사용하여도 무방하다.The getter is included in the adhesive composition, absorbs moisture penetrating into the cured body after the adhesive composition is cured, and functions to prevent deterioration of adhesive strength of the cured body due to moisture permeation, and metal oxides or alloys thereof may be used. As the metal oxide, for example, one or more of CaO, MgO, Al2O3, ZrO2, TiO2, PbO, and ZnO may be used, and an alloy of the metal oxide may be, for example, Al-Zn-O (AZO) and In-Sb. One or more of -O(ITO) may be used, and two or more getters may be mixed and used.
상기 게터 중에서 CaO의 수분 흡수 능력은 가장 우수하며, 접착 조성물 경화체의 접착 유지력을 더욱 향상시키기 위하여, CaO 게터를 사용할 수 있으며, 빛 투과도 및 헤이즈 등의 광학적 특성은 MgO가 더욱 우수하므로, 접착 조성물 경화체의 더욱 높은 광학적 특성을 구현하기 위하여는 MgO 게터를 사용하는 것이 좋다.Among the getters, CaO has the best water absorption ability, and in order to further improve the adhesive retention of the cured adhesive composition, a CaO getter can be used, and since MgO has better optical properties such as light transmittance and haze, the cured adhesive composition In order to implement higher optical properties of , it is recommended to use MgO getter.
상기 가교제는 하기 화학식 1 또는 하기 화학식 2로 표현되는 화합물을 포함한다.The crosslinking agent includes a compound represented by Formula 1 or Formula 2 below.
<화학식 1><Formula 1>
상기 화학식 1에서,In Formula 1,
고리 A는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기, 또는 치환 또는 비치환된 C3~C10의 사이클로알케닐기이며,Ring A may or may not exist, and when present is a substituted or unsubstituted C3-C10 cycloalkyl group or a substituted or unsubstituted C3-C10 cycloalkenyl group,
X는 수소, 치환 또는 비치환된 C2~C20의 알케닐기, 치환 또는 비치환된 C1~C20의 알킬리덴기, (메트)아크릴레이트 또는 (메트)아크릴산이 존재하는 치환 또는 비치환된 C1~C30의 알킬기 또는 (메트)아크릴레이트 또는 (메트)아크릴산이 존재하는 치환 또는 비치환된 C2~C30의 알케닐기이며, 상기 알킬기 또는 알케닐기는 하나 이상의 -CH2- 가 산소로 치환될 수 있으며,X is hydrogen, a substituted or unsubstituted C2~C20 alkenyl group, a substituted or unsubstituted C1~C20 alkylidene group, (meth)acrylate or a substituted or unsubstituted C1~C30 in which (meth)acrylic acid is present. A substituted or unsubstituted C2-C30 alkenyl group in which an alkyl group or (meth)acrylate or (meth)acrylic acid is present, and the alkyl group or alkenyl group may have one or more -CH2- substituted with oxygen,
R1은 각각 독립적으로 수소, 중수소, 할로겐, 니트로기, 니트릴기, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 알콕시기, 치환 또는 비치환된 C1~C30의 설파이드기, 치환 또는 비치환된 C6~C50의 아릴기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴기이며,R1 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1~C30 alkyl group, substituted or unsubstituted C2~C30 alkenyl group, substituted or unsubstituted C1~C30 alkoxy group group, a substituted or unsubstituted C1~C30 sulfide group, a substituted or unsubstituted C6~C50 aryl group, or a substituted or unsubstituted C2~C50 heteroaryl group,
m은 0 내지 4의 정수이며,m is an integer from 0 to 4;
화학식 1에는 도시하지 않았으나 노보난 구조는 이중결합이 있거나 없으며, 노보난 구조 및 고리 A에 존재하는 이중결합의 총합계는 1개 또는 2개이며, 이중결합의 위치는 제한되지 않는다.Although not shown in Formula 1, the norbonane structure may or may not have a double bond, and the total number of double bonds present in the norbonane structure and ring A is one or two, and the position of the double bond is not limited.
상기 화학식 1의 가교제는 아크릴계 수지를 사용할 때 함께 사용될 수 있다. 보다 구체적으로 노보난의 이중결합과 아크릴계 수지의 카르복실기 또는 비닐기 등과의 결합을 통해 가교가 가능하다.The crosslinking agent of Chemical Formula 1 may be used together with an acrylic resin. More specifically, crosslinking is possible through a bond between a double bond of norbornane and a carboxyl group or a vinyl group of an acrylic resin.
상기 화학식 1의 가교제의 예시는 하기 표 1과 같으며, 제한되지 않는다.Examples of the crosslinking agent of Formula 1 are shown in Table 1 below, but are not limited thereto.
한편, 화학식 2는 하기와 같다. Meanwhile, Chemical Formula 2 is as follows.
<화학식 2><Formula 2>
상기 화학식 2에서,In Formula 2,
고리 B는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기(하나 이상의 -CH2-가 -CO-로 치환될 수 있음), 또는 에폭시 고리이며,Ring B may or may not be present, and if present is a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), or an epoxy ring;
고리 C는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기(하나 이상의 -CH2-가 -CO-로 치환될 수 있음), 에폭시 고리, 또는 고리형 무수디카르복실산이 존재하거나 없는 노보난기이며,Ring C may or may not be present, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group (one or more -CH2- may be substituted with -CO-), an epoxy ring, or a cyclic anhydride a nobonanic group with or without a carboxylic acid;
고리 D는 존재하거나 존재하지 않을 수 있으며, 존재하는 경우 치환 또는 비치환된 C3~C10의 사이클로알킬기, 에폭시기가 존재하는 치환 또는 비치환된 C3~C10의 사이클로알킬기, 고리형 무수디카르복실산, 또는 에폭시 고리이며,Ring D may or may not exist, and if present, a substituted or unsubstituted C3-C10 cycloalkyl group, a substituted or unsubstituted C3-C10 cycloalkyl group with an epoxy group, a cyclic dicarboxylic acid, Or an epoxy ring,
Y는 수소, 히드록시기, (메트)아크릴산이 존재하는 치환 또는 비치환된 C1~C30의 알킬기(하나 이상의 -CH2- 가 산소로 치환될 수 있음), 카르복실산이 존재하는 치환 또는 비치환된 C1~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 히드록시 알킬기 또는 카르복실산기이며,Y is hydrogen, a hydroxy group, a substituted or unsubstituted C1~C30 alkyl group in which (meth)acrylic acid is present (one or more -CH2- may be substituted with oxygen), a substituted or unsubstituted C1~ in which carboxylic acid is present A C30 alkenyl group, a substituted or unsubstituted C1~C30 hydroxyalkyl group or a carboxylic acid group,
Z는 CH2, O, S, NR3, P=O 또는 PR4이며,Z is CH2, O, S, NR3, P=0 or PR4;
R2는 각각 독립적으로 수소, 중수소, 할로겐, 니트로기, 니트릴기, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C1~C30의 히드록시 알킬기, 카르복실산기, 치환 또는 비치환된 C1~C30의 카르복실산 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C1~C30의 알콕시기, 치환 또는 비치환된 C1~C30의 설파이드기, 치환 또는 비치환된 C6~C50의 아릴기, 또는 치환 또는 비치환된 C2~C50의 헤테로아릴기이며,R2 is each independently hydrogen, heavy hydrogen, halogen, nitro group, nitrile group, substituted or unsubstituted C1~C30 alkyl group, substituted or unsubstituted C1~C30 hydroxyalkyl group, carboxylic acid group, substituted or unsubstituted C1~C30 carboxylic acid alkyl group, substituted or unsubstituted C2~C30 alkenyl group, substituted or unsubstituted C1~C30 alkoxy group, substituted or unsubstituted C1~C30 sulfide group, substituted or unsubstituted A C6~C50 aryl group, or a substituted or unsubstituted C2~C50 heteroaryl group,
R3 및 R4는 각각 독립적으로 수소, 치환 또는 비치환된 C1~C30의 알킬기, 치환 또는 비치환된 C2~C30의 알케닐기, 치환 또는 비치환된 C6~C30의 아릴기, 또는 치환 또는 비치환된 C2~C30의 헤테로아릴기이며,R3 and R4 are each independently hydrogen, a substituted or unsubstituted C1~C30 alkyl group, a substituted or unsubstituted C2~C30 alkenyl group, a substituted or unsubstituted C6~C30 aryl group, or a substituted or unsubstituted C2~C30 aryl group. A C2~C30 heteroaryl group,
n은 0 내지 4의 정수이며,n is an integer from 0 to 4;
화학식 2에는 도시하지 않았으나 노보난 구조는 이중결합이 있거나 없으며, 노보난 구조 및 고리 A에 존재하는 이중결합의 총합계는 0개 또는 1개이며, 이중결합의 위치는 제한되지 않으며,Although not shown in Formula 2, the norbonane structure has or does not have a double bond, the total number of double bonds present in the norbonane structure and ring A is 0 or 1, and the position of the double bond is not limited,
화학식 2에는 도시하지 않았으나 이웃하는 2개의 탄소에 산소가 결합된 에폭시 구조가 0개 내지 2개 포함될 수 있으며,Although not shown in Chemical Formula 2, 0 to 2 epoxy structures in which oxygen is bonded to two adjacent carbons may be included,
화학식 2에는 도시하지 않았으나 이웃하는 탄소와 결합하여 형성된 고리형 무수디카르복실산 구조가 0개 내지 2개 포함될 수 있다.Although not shown in Chemical Formula 2, 0 to 2 cyclic anhydride structures formed by bonding with neighboring carbons may be included.
상기 화학식 2의 가교제는 에폭시계 수지 또는 에폭시계 수지와 아크릴계 수지를 혼합하여 사용할 때 사용될 수 있다. 보다 구체적으로 노보난의 에폭시기, 산무수물기 또는 수산기 등을 통해 에폭시계 수지와의 가교가 가능하다.The crosslinking agent of Chemical Formula 2 may be used when an epoxy-based resin or a mixture of an epoxy-based resin and an acrylic-based resin is used. More specifically, crosslinking with an epoxy-based resin is possible through an epoxy group, an acid anhydride group, or a hydroxyl group of norbornane.
상기 화학식 2의 가교제의 예시는 하기 표 2와 같으며, 제한되지 않는다.Examples of the crosslinking agent of Formula 2 are shown in Table 2 below, but are not limited thereto.
접착 조성물의 수지가 2종 이상일 경우 상기 화학식 1, 2노보난의 가교제를 2종 이상 혼합하여 사용할 수 있으며, 수지의 종류 및 함량에 맞춰 배합할 수 있다. 아크릴계 수지류 적용시 화학식 1 노보난 가교제 등이 적합하고 에폭시계 수지류 적용시 화학식 2 노보난 가교제를 적용하는 것이 바람직하나 이에 국한되는 것은 아니다. When two or more types of resins are used in the adhesive composition, two or more types of crosslinking agents of Chemical Formulas 1 and 2 may be mixed and used, and may be formulated according to the type and content of the resin. When applying acrylic resins, the norbornane crosslinking agent of Chemical Formula 1 is suitable, and when applying epoxy resins, it is preferable to apply the norbornane crosslinking agent of Chemical Formula 2, but is not limited thereto.
본 발명의 접착 조성물은 증점제, 요변제(Tixotropy) 및 스페이서(spacer) 중 1종 이상의 첨가제를 더 포함할 수 있다. 증점제 및 요변제는 각각 접착 조성물의 증점 특성 및 요변성을 부여하는 물질로서, 예를 들어 흄드 실리카(Fumed silica)를 사용할 수 있으며, 접착 조성물에 0.1 내지 20 중량%로 더 포함될 수 있다.The adhesive composition of the present invention may further include one or more additives selected from a thickener, a thixotropy agent, and a spacer. A thickener and a thixotropic agent are materials that impart thickening properties and thixotropy to the adhesive composition, respectively, and may include, for example, fumed silica, and may be further included in the adhesive composition in an amount of 0.1 to 20% by weight.
스페이서는 부착이 필요한 상판과 하판에 있어, 접착 조성물이 사용되는 경우, 상판과 하판의 일정한 간격이 유지되도록 하는데 도움을 주는 물질로서, 접착 조성물과 화학적으로 반응하지 않는 물질이면 특별히 한정되지 않고 사용 가능하다.The spacer is a material that helps to maintain a constant distance between the upper and lower plates when an adhesive composition is used in the upper and lower plates that need to be attached. Any material that does not chemically react with the adhesive composition can be used without particular limitation. do.
본 발명의 접착 조성물은 50,000 내지 350,000 cP의 점도를 나타낼 수 있다. 접착 조성물이 상기 범위의 점도를 나타내는 경우 우수한 공정성을 확보하는데 유리할 수 있다. 또한, 상기 점도 범위를 나타냄에 따라 예를 들어 디스플레이 장치의 댐(Dam) 구조체 형성 공정에 유리한 요변성(thixotropy)을 가질 수 있다. 접착 조성물이 상기 점도 범위를 벗어나는 경우 원하는 두께로 경화체를 형성하기 어려워 공정성이 떨어지는 문제가 발생할 수 있다.The adhesive composition of the present invention may exhibit a viscosity of 50,000 to 350,000 cP. When the adhesive composition exhibits a viscosity within the above range, it may be advantageous to secure excellent processability. In addition, according to the viscosity range, for example, it may have thixotropy which is advantageous for a process of forming a dam structure of a display device. When the adhesive composition is out of the above viscosity range, it is difficult to form a cured body with a desired thickness, and a problem of poor fairness may occur.
상기 범위로 점도를 나타낼 수 있도록 첨가제로서 증점제를 포함할 수 있으며, 증점제로는 기존에 알려진 통상의 증점제를 제한없이 사용할 수 있다.A thickener may be included as an additive so as to exhibit a viscosity within the above range, and as the thickener, conventional thickeners may be used without limitation.
본 발명의 또 다른 일 실시예인 디스플레이 장치는 상기 경화체를 포함하며, 구체적으로, 디스플레이 장치 외각의 댐(dam)에 적용될 수 있다.A display device, which is another embodiment of the present invention, includes the hardened body, and may be specifically applied to a dam outside the display device.
본 발명의 조성물을 이용하여 디스플레이 장치의 댐 구조체를 형성할 경우, 형성 공정은 기존의 공정을 따를 수 있다. 예를 들어, UV 경화나 열 경화 또는 UV와 열을 모두 이용하는 경화 공정을 사용할 수 있다. 상기 실시예에 따른 댐 재료 조성물로부터 형성된 댐 구조체는 우수한 부착력 및 산소/수분 차단 특성을 나타낼 수 있다. 또한, 실시예에 따른 댐 재료 조성물로부터 형성된 댐 구조체는 플렉서블한 특성을 가질 수 있고, 다양한 플렉서블/벤더블/폴더블 디스플레이 장치에 적용이 가능할 수 있다. 또한, 실시예에 따른 댐 재료 조성물로부터 형성된 댐 구조체는 우수한 신뢰성 및 내구성을 가질 수 있다. 따라서, 실시예에 따른 댐 재료 조성물을 이용하면, 우수한 신뢰성 및 내구성을 갖는 디스플레이 장치를 제조할 수 있다. 특히, 실시예에 따른 댐 재료 조성물은 플렉서블/벤더블/폴더블 등 변형 가능한 디스플레이 장치의 제조에 유용하게 적용될 수 있다. When forming a dam structure of a display device using the composition of the present invention, the forming process may follow a conventional process. For example, UV curing, thermal curing, or a curing process using both UV and heat may be used. The dam structure formed from the dam material composition according to the embodiment may exhibit excellent adhesion and oxygen/moisture barrier properties. In addition, the dam structure formed from the dam material composition according to the embodiment may have flexible characteristics and may be applicable to various flexible/bendable/foldable display devices. In addition, a dam structure formed from the dam material composition according to the embodiment may have excellent reliability and durability. Therefore, using the dam material composition according to the embodiment, a display device having excellent reliability and durability can be manufactured. In particular, the dam material composition according to the embodiment can be usefully applied to the manufacture of deformable display devices such as flexible/bendable/foldable.
이하에서는 본 발명의 접착 조성물의 구체적 실시예를 통하여 본 발명을 더 상세하게 설명한다. 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail through specific examples of the adhesive composition of the present invention. The following examples are merely illustrative of the present invention, but the scope of the present invention is not limited to the following examples.
수분 침투 평가_수분 침투 시간을 측정Moisture permeation evaluation_Measurement of water permeation time
평가하고자 하는 DAM은 유리 기판 중심으로부터 바깥쪽에 위치하고 수분 침투여부 확인용 불투명 DAM은 평가용 DAM 내부에 위치한다. 수분이 외부 평가용 DAM에 침투하게 되면 내부에 위치한 불투명 DAM에도 영향을 끼치게 되는데 이를 파악하여 수분 침투 시간을 확인하였다. 모든 DAM은 5mm폭으로 고정하여 평가하였다. 외부 평가용 DAM 내부 평가용 DAM과의 거리가 동일한 거리를 가져야 한다. 예를 들면 내부 불투명 DAM이 직경 5cm의 원이라면, 외부 평가용 DAM은 최소 6cm 이상 이어야 한다. 또 다른 예를 들면 내부 평가용 DAM을 정사각형 모양으로 하면, 외부 DAM 또한 내부 사각형과 중심을 일치시켜 일정거리를 유지하여 그려야 한다.The DAM to be evaluated is located outside the center of the glass substrate, and the opaque DAM for checking whether moisture permeates is located inside the DAM for evaluation. When moisture permeates the external evaluation DAM, it also affects the opaque DAM located inside. This was identified and the moisture penetration time was confirmed. All DAMs were evaluated with a fixed width of 5 mm. The distance between the DAM for external evaluation and the DAM for internal evaluation must have the same distance. For example, if the internal opaque DAM is a circle with a diameter of 5 cm, the external DAM for evaluation should be at least 6 cm. For another example, if the DAM for internal evaluation is in the shape of a square, the external DAM should also be drawn with its center coincident with the internal rectangle and maintained at a certain distance.
요약하자면, 하부 유리 기판에 평가하고자 하는 DAM을 그린 후 내부에 수분 침투여부 확인용 불투명 DAM을 그린다. 이후 상부 유리 기판을 덮어 진공 합착하고 UV 노광을 통해 접착시킨 후 시편을 제조하여 평가한다.In summary, after drawing the DAM to be evaluated on the lower glass substrate, draw the opaque DAM to check whether moisture penetrates inside. Thereafter, the upper glass substrate is covered and bonded in a vacuum, and a specimen is prepared and evaluated after bonding through UV exposure.
내부 불투명 DAM은 수분침투 확인 재료로 CaO Getter를 30%, 라디칼 개시제 2%, 에스터계열의 아크릴레이트 68%를 혼합하여 사용하였다.For the internal opaque DAM, a mixture of 30% CaO getter, 2% radical initiator, and 68% ester-based acrylate was used as a material for checking moisture permeation.
수분침투 확인 재료는 수분을 흡수하게 되는 경우 CaO 특성상 불투명한 재료가 투명하게 변하여 수분 흡수를 확인 가능하며, 불투명 DAM이 수분을 먹어 모두 투명하게 되는데 걸리는 시간을 측정하였다(단위: hr).When the moisture penetration confirmation material absorbs moisture, the opaque material changes to transparent due to the nature of CaO, and the moisture absorption can be confirmed, and the time required for the opaque DAM to become transparent by consuming moisture was measured (unit: hr).
수분 침투 평가를 위한 시편 제작Specimen fabrication for water penetration evaluation
(1) Musashi 社의 디스펜서를 사용하였다.(1) Musashi's dispenser was used.
(2) 장비의 모델은 MUSASHI 社의 Shotmaster-300DS를 사용하였고, Drawing 프로그램은 MuCAD V를 이용하여 원하는 모양을 기입하였다.(2) MUSASHI's Shotmaster-300DS was used for the model of the equipment, and the desired shape was written using MuCAD V for the drawing program.
(3) 토출하는 노즐의 니들 크기는 22~18ø 를 사용하였다,(3) The needle size of the discharge nozzle was 22~18ø,
(4) 토출 헤드의 속도는 점도와 재료의 표면 특성에 따라 5~80 cm/min 사이 수치로 진행하였다.(4) The speed of the discharge head was between 5 and 80 cm/min depending on the viscosity and surface characteristics of the material.
(5) 토출 압력은 0.3~0.8 Mpa로 진행하였다.(5) The discharge pressure was 0.3~0.8 Mpa.
(6) 상부 하부 기판의 합착은 진공합착 장비를 사용하여 진행하였다.(6) Bonding of the upper and lower substrates was performed using vacuum bonding equipment.
(7) 노광은 1000~5000 mJ로 노광을 진행하였다.(7) Exposure was performed at 1000 to 5000 mJ.
(8) 노광 후에100 ℃ Hot Plate에서 30 min Curing하였다.(8) Curing was performed on a 100 °C Hot Plate for 30 min after exposure.
부착력 측정 시편 제작Fabrication of specimens for measuring adhesion
2.5x4cm, 0.7T 크기의 glass에resin 복합체를 0.5~2mg 올린다. 그리고 상부에 동일한 glass를 90° 틀어서 올려준다. 여기에 500g의 추를 올려 약 15~30s 정도 눌러준다. Dot의 크기가 5mm 정도 되도록 한다. Put 0.5~2mg of resin complex on a 2.5x4cm, 0.7T size glass. Then, rotate the same glass at the top by 90° and raise it. Place a 500g weight here and press it for about 15 to 30 seconds. Make the dot size about 5mm.
그 후 UV 노광기에 1000~5000 mJ 노광한다. 노광 후에는 100 ℃ Hot Plate에서 30 min Curing한다. UTM을 사용하여 부착력 측정한다.After that, it is exposed to 1000 to 5000 mJ in a UV exposure machine. After exposure, Curing is performed on a 100 ℃ Hot Plate for 30 min. Adhesion is measured using UTM.
가혹평가 조건Severe evaluation conditions
(1) 85℃/85RH%(상대습도) 조건의 Oven에 넣어서 재료의 수분침투 및 부착신뢰성 평가를 진행한다.(1) Put it in an oven under 85℃/85RH% (relative humidity) conditions to evaluate the water penetration and adhesion reliability of the material.
(2) 사용한 Oven은 SORITECH 社의 고온-고습 장비를 사용하였다.(2) The Oven used was SORITECH's high-temperature-high-humidity equipment.
실시예 1 내지 10 및 비교예 1 내지 6Examples 1 to 10 and Comparative Examples 1 to 6
하기 표 3에 실시예 및 비교예에 사용된 성분을 명시하였다.In Table 3 below, components used in Examples and Comparative Examples were specified.
명시된 성분들을 표 4의 성분비로 300 ml paste mixer 용기에 투입한 후 공전-자전 mixer에 투입 후, 공전 1200 rpm, 자전 1200 rpm로 60분간 혼합하여 접착 조성물을 제조하였다. 그 후 접착 조성물의 경화체의 수분억제력 및 부착신뢰성을 전술한 방법으로 평가하여 하기 표 5 및 표 6에 나타내었다.The specified components were added to a 300 ml paste mixer container at the component ratio of Table 4, then put into a revolution-rotation mixer, and then mixed at a revolution of 1200 rpm and a rotation of 1200 rpm for 60 minutes to prepare an adhesive composition. After that, the moisture inhibitory power and adhesion reliability of the cured body of the adhesive composition were evaluated by the above method, and are shown in Tables 5 and 6 below.
(제품명:
SUO-,4140I10 SHIN-A T&C)
Urethane Acrylate
(product name:
SUO-,4140I10 SHIN-A T&C)
(양이온 개시제)
/
2-Methyl-4′-(methylthio)-2-
Morpholinopropiophenone
(라디칼 개시제)Bis(4-methylphenyl)iodonium hexafluorophosphate
(cationic initiator)
/
2-Methyl-4′-(methylthio)-2-
Morpholinopropiophenone
(radical initiator)
1,2,3,6-tetrahydrophthalic anhydride3 or 4-methyl-
1,2,3,6-tetrahydrophthalic anhydride
(제품명:
SUO-,4140I10 SHIN-A T&C)
Urethane Acrylate
(product name:
SUO-,4140I10 SHIN-A T&C)
(양이온 개시제)
/
2-Methyl-4′-(methylthio)-2-
Morpholinopropiophenone
(라디칼 개시제)Bis(4-methylphenyl)iodonium hexafluorophosphate
(cationic initiator)
/
2-Methyl-4′-(methylthio)-2-
Morpholinopropiophenone
(radical initiator)
개시제radical
initiator
개시제cation
initiator
(hr)Moisture penetration evaluation
(hr)
(kgf/cm2)Attachment reliability
(kgf/cm2)
(탁도, %)optical properties
(turbidity, %)
(hr)Moisture penetration evaluation
(hr)
(kgf/cm2)Attachment reliability
(kgf/cm2)
실험군 Ⅰ_비교예1~실시예4_아크릴레이트 단독 조성에서 가교제 의 역할 Experimental group Ⅰ_Comparative Example 1~Example 4_The role of crosslinking agent in the composition of acrylate alone
(1) 아크릴 단독 조성에서 가교제를 사용한 경우 부착신뢰성이 개선되는 효과를 보인다(1) When a crosslinking agent is used in the composition of acrylic alone, the effect of improving adhesion reliability is shown.
(2) (우레탄)아크릴의 특성상 수분 투과 특성이 좋은 편이기 때문에 수분 억제력은 다른 레진에 비해서 부족하나 가교제를 투입하면 그 특성이 향상됨을 알 수 있다.(2) Due to the nature of (urethane) acrylic, it has good moisture permeability, so its moisture suppression ability is insufficient compared to other resins, but it can be seen that the properties are improved by adding a crosslinking agent.
실험군experimental group Ⅱ_ II_ 비교예3Comparative Example 3 ~~ 실시예8Example 8 __ 아크릴레이트acrylate +에폭시 조성에 +In the composition of the epoxy 노보넨Norbornen 가교제cross-linking agent 도입 introduction
(1) 노보넨 가교제 중에서 노보넨 산무수물구조, 그 중에서도 비슷한 구조에서 bridged 구조를 가지는 것이 물성이 더욱 더 개선됨을 확인하였다.(1) Among the norbornene crosslinking agents, it was confirmed that the norbornene acid anhydride structure, among others, having a bridged structure in a similar structure further improved the physical properties.
(2) 수분에 대한 특성과 부착 신뢰성에 대한 특성이 모두 향상되었다.(2) Both the moisture resistance and adhesion reliability characteristics were improved.
(3) cyclic 구조 이면서도 Bridged를 가진 가교제의 특성이 우수한 것을 볼 수 있는데, 유사한 구조라고 해도 bridged가 있는 것은 같은 탄소 개수 대비 부피가 작은 구조이다. 또한 재료의 극성이 높아 레진과 레진 사이의 반데르발스힘 등의 인력이 강하게 작용, 수분이 침투하기 어려워 재료의 신뢰성이 우수할 수 있다.(3) Although it is a cyclic structure, it can be seen that the bridged crosslinking agent has excellent properties. In addition, since the polarity of the material is high, attraction such as the van der Waals force between resins acts strongly, and moisture is difficult to penetrate, so the reliability of the material may be excellent.
실험군experimental group Ⅲ_ III_ 실시예Example 9~ 9~ 실시예Example 15_ 15_ 노보넨Norbornen 산무수물의acid anhydride 함량에 따른 물성 변화를 확인 Check the change in physical properties according to the content
(1) 가교제 함량은 0.5 내지 30 중량% 범위내가 우수한 수분 침투 억제력을 나타내었으며, 특히 1.0 내지 20 중량% 범위내가 우수한 수분 침투력을 나타내었다. 실시예 9의 경우 가교제 함량이 적어 수분 침투 억제력이 낮게 나왔고, 실시예 15의 경우 노보넨 산무수물의 과도한 함량으로 오히려 물성이 하락하는 것을 알 수 있다. 고온-고습의 조건에서 잉여의 산무수물이 카르복실산으로 변하여 재료의 내구성을 떨어뜨리는 역할을 하는 것으로 예상된다.(1) The content of the crosslinking agent exhibited excellent water permeation inhibition within the range of 0.5 to 30% by weight, and particularly excellent water penetration ability within the range of 1.0 to 20% by weight. In the case of Example 9, the content of the crosslinking agent was low, and the moisture permeation inhibition was low, and in the case of Example 15, it can be seen that the physical properties rather deteriorated due to the excessive content of norbornene acid anhydride. Under conditions of high temperature and high humidity, excess acid anhydride is converted into carboxylic acid, which is expected to play a role in reducing durability of the material.
실험군 Ⅳ_실시예 16~실시예 25_Getter 함량에 따른 광학적 특성Experimental group IV_Example 16~Example 25_Optical characteristics according to getter content
Getter의 함량을 0.5 중량% 내지 10 중량% 범위내로 적게 사용하여도 광학적 특성을 크게 향상시키면서 동시에 충분한 수분 침투 억제력을 갖는 것을 확인할 수 있다. 오히려 초기 부착 신뢰성의 경우 4.0kgf/cm2 이상이며, 1000시간 평가 경과 후의 변화폭도 미세한 수준으로 만족스러운 결과를 얻었다. 수분침투 평가를 보면 평균적으로 약 900~1200hr 수준으로 상당히 양호하며, 광학적 특성인 탁도 또한 크게 향상되는 것을 확인 할 수 있었다.It can be seen that even when the content of the getter is used within the range of 0.5% to 10% by weight, the optical properties are greatly improved and at the same time, sufficient water penetration inhibition is obtained. Rather, in the case of initial attachment reliability, it was 4.0 kgf/cm 2 or more, and a satisfactory result was obtained at a fine level of change after 1000 hours of evaluation. Looking at the water permeation evaluation, it was confirmed that the average time was quite good at about 900 to 1200 hr, and the turbidity, which is an optical characteristic, was also greatly improved.
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KR20100026081A (en) * | 2008-08-29 | 2010-03-10 | 고려대학교 기술지주 (주) | Sealant composition and fabrication method thereof |
KR20120139089A (en) * | 2011-06-16 | 2012-12-27 | 엘지디스플레이 주식회사 | Organic light emitting device and method for manufacturing the same |
KR20130106507A (en) * | 2012-03-20 | 2013-09-30 | 삼성디스플레이 주식회사 | Sealing composition and method for manufacturing display panel using the same |
KR20150046044A (en) * | 2012-08-20 | 2015-04-29 | 헨켈 차이나 컴퍼니 리미티드 | Liquid optically clear photo-curable adhesive for display application |
KR20200055530A (en) * | 2018-11-13 | 2020-05-21 | 엘티소재주식회사 | Bibulous composition comprising getter material, bibulous film comprising same and organic electronic device comprising same |
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KR20120139089A (en) * | 2011-06-16 | 2012-12-27 | 엘지디스플레이 주식회사 | Organic light emitting device and method for manufacturing the same |
KR20130106507A (en) * | 2012-03-20 | 2013-09-30 | 삼성디스플레이 주식회사 | Sealing composition and method for manufacturing display panel using the same |
KR20150046044A (en) * | 2012-08-20 | 2015-04-29 | 헨켈 차이나 컴퍼니 리미티드 | Liquid optically clear photo-curable adhesive for display application |
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