WO2023122925A1 - Display device and manufacturing method therefor - Google Patents

Display device and manufacturing method therefor Download PDF

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Publication number
WO2023122925A1
WO2023122925A1 PCT/CN2021/141872 CN2021141872W WO2023122925A1 WO 2023122925 A1 WO2023122925 A1 WO 2023122925A1 CN 2021141872 W CN2021141872 W CN 2021141872W WO 2023122925 A1 WO2023122925 A1 WO 2023122925A1
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WO
WIPO (PCT)
Prior art keywords
layer
light
metal layer
color conversion
metal
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Application number
PCT/CN2021/141872
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French (fr)
Chinese (zh)
Inventor
樊勇
Original Assignee
厦门市芯颖显示科技有限公司
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Application filed by 厦门市芯颖显示科技有限公司 filed Critical 厦门市芯颖显示科技有限公司
Priority to PCT/CN2021/141872 priority Critical patent/WO2023122925A1/en
Publication of WO2023122925A1 publication Critical patent/WO2023122925A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods

Definitions

  • the present application relates to the field of Micro LED (micro light emitting diode) display technology, and in particular to a display device and a manufacturing method thereof.
  • Micro LED microwave light emitting diode
  • Micro LED chips can achieve ns-level response speed and ultra-high brightness.
  • the pixel pitch of the MicroLED is very small.
  • black barriers in the color conversion substrate above the MicroLEDs for shading, and set color barriers between the black barriers.
  • the conversion layer is converted into three-color light.
  • the absorption rate of the black retaining wall reduces the light efficiency.
  • the black retaining wall is made of organic material, water vapor easily enters the color conversion layer from the black retaining wall, which reduces the reliability of the color conversion layer. And it will also spread to the MicroLED area, resulting in shortened service life. Therefore, how to improve the light output rate of Micro LED and increase the effect of blocking water vapor has become a technical problem that needs to be solved urgently.
  • Embodiments of the present application provide a display device and a manufacturing method thereof, which are used to solve the problem of reducing light efficiency due to the use of a black barrier wall in the color conversion substrate above the MicroLED for shading, and the fact that water vapor easily enters the color conversion layer from the black barrier wall, resulting in The reliability of the color conversion layer is reduced, and it also spreads to the MicroLED area, resulting in a technical problem of shortening the service life.
  • An embodiment of the present application provides a display device, including a driving substrate, a light-emitting component layer, a color conversion substrate, and a third metal layer; wherein, the light-emitting component layer includes a plurality of light-emitting chip units disposed on the driving substrate and surrounding the The first metal layer provided by the light-emitting chip unit; each of the light-emitting chip units has a light-emitting surface; the color conversion substrate includes a second metal layer and a filling layer, and the second metal layer is on the light-emitting surface corresponding to the light-emitting chip unit A through hole is provided at the position, and the filling layer is arranged in the through hole; the third metal layer is arranged corresponding to the first metal layer, and is used for sealing and connecting the first metal layer and the second metal layer.
  • the third metal layer is connected to the first metal layer and the second metal layer by low-temperature welding.
  • the light-emitting component layer further includes: a flat layer disposed on the driving substrate and filled between the light-emitting chip units; and a transparent electrode layer covering the flat layer and It is electrically connected with the light-emitting chip unit; the first metal layer is set on the transparent electrode layer or the first metal layer and the transparent electrode layer are set on the same layer.
  • the light-emitting component layer further includes: a reflective layer disposed on the side wall of the light-emitting chip unit, or disposed on the side wall of the light-emitting chip unit and the non-reflective layer on the top surface of the light-emitting chip unit. Top out the glossy area.
  • the light-emitting chip unit includes three blue MicroLED chips, and the filling layer includes a red light color conversion layer and a green light color conversion layer; two of the three through holes corresponding to one light-emitting chip unit There is a red light color conversion layer and a green light color conversion layer.
  • the color conversion substrate further includes a blue light reflective layer, which is disposed in the through hole or on the second metal layer and corresponds to the red light color conversion layer and the green light color conversion layer. location settings.
  • the blue light reflective layer is composed of metal film/transparent dielectric film/metal film three-layer film, or the blue light reflective layer is composed of metal film/transparent dielectric film/metal film/transparent dielectric film/metal film five-layer film .
  • the display device further includes: a light-condensing layer disposed on the color conversion substrate; the light-condensing layer includes a plurality of light-condensing lenses, and the light-condensing lenses are arranged in one-to-one correspondence with the through holes.
  • the color conversion substrate further includes a transparent film layer, which is arranged on the side of the second metal layer away from the driving substrate; the condenser lens is arranged in the through hole, or the condenser lens set on the transparent film layer.
  • the light-emitting chip unit includes a red MicroLED chip, a green MicroLED chip, and a blue MicroLED chip;
  • the filling layer includes a filter layer, and the filter layer includes a red filter layer, a green filter layer, and a blue filter layer.
  • the red filter layer is set corresponding to the red MicroLED chip
  • the green filter layer is set corresponding to the green MicroLED chip
  • the blue filter layer is set corresponding to the blue MicroLED chip.
  • the present application also provides a method for manufacturing a display device, including the steps of: fabricating a light-emitting component layer on a driving substrate, which is to transfer and bond a plurality of light-emitting chip units on the driving substrate, and on the driving substrate Making a flat layer to fill between the light-emitting chip units, each of the light-emitting chip units has a light-emitting surface; making a transparent electrode layer on the flat layer, and the transparent electrode layer and the top of the light-emitting chip unit The light-emitting surface is electrically connected; a first metal layer is made on the transparent electrode layer, and the first metal layer is arranged around the light-emitting chip unit; a color conversion substrate is made, and the color conversion substrate includes a second metal layer and A filling layer, the second metal layer is provided with a through hole corresponding to the light-emitting surface of the light-emitting chip unit, the filling layer is arranged in the through hole; and the color conversion substrate is attached to the light-emit
  • the color conversion substrate further includes a transparent film layer, and the transparent film layer is arranged on one side of the second metal layer; the step of manufacturing the color conversion substrate specifically includes: making a transparent film layer on a carrier substrate ; Making a second metal layer on the transparent film layer, etching a through hole on the second metal layer, and making a filling layer in the through hole.
  • the color conversion substrate after attaching the color conversion substrate to the light-emitting component layer, it also includes: peeling the carrier substrate from the transparent film layer;
  • the layer includes a plurality of condensing lenses, and the condensing lenses are arranged in one-to-one correspondence with the through holes.
  • the second metal layer is used to replace the existing black retaining wall in the color conversion substrate, which can reflect light instead of absorb light, increase the light output rate, and use low-temperature soldering to connect the surrounding light-emitting chip unit through the third metal layer
  • the first metal layer and the second metal layer are arranged so that the metal layer seals the light-emitting chip unit and the filling layer, avoiding the entry of water vapor, and increasing the service life.
  • the filling layer disposed in the through hole of the second metal layer includes a color conversion layer, which can reuse reflected light and increase the light extraction rate.
  • a blue light reflective layer corresponding to the red light color conversion layer and the green light color conversion layer is provided in the through hole, and the blue light reflective layer can reflect light to the color conversion layer, thereby improving the light conversion rate and utilization rate, and the luminous brightness of the display device is improved.
  • FIG. 1 is a schematic structural diagram of a display device provided by an embodiment of the present application.
  • Fig. 2 is a flow chart of a manufacturing method of a display device provided by an embodiment of the present application
  • Fig. 3 is a schematic structural view of a light-emitting component layer provided by an embodiment of the present application.
  • Fig. 4 is a schematic structural diagram of a color conversion substrate provided by an embodiment of the present application after fabrication
  • Fig. 5 is a schematic diagram of the structure provided by an embodiment of the present application after the low-temperature welding of the third metal layer is completed;
  • Fig. 6 is a schematic view of the structure when the carrier substrate is peeled off from the transparent film layer provided by an embodiment of the present application;
  • FIG. 7 is a schematic structural diagram of a display device provided by another embodiment of the present application.
  • the third metal layer 4 the silicon substrate 11, the complementary metal oxide semiconductor layer 12,
  • the second metal layer 31 the filling layer 32, the transparent film layer 33,
  • the display device 100 the light emitting surface 211, the blue MicroLED chip 212,
  • a first feature being "on” or “under” a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them.
  • “above”, “above” and “above” the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature.
  • “Below”, “beneath” and “under” the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.
  • Embodiments of the present application provide a display device and a manufacturing method of the display device. Each will be described in detail below. It should be noted that the description sequence of the following embodiments is not intended to limit the preferred sequence of the embodiments.
  • Embodiment 1 of the present application provides a display device 100, which includes a driving substrate 1, a light-emitting component layer 2, a color conversion substrate 3, and a third metal layer 4; wherein, the light-emitting component layer 2 includes A plurality of light-emitting chip units 21 on the driving substrate 1 and a first metal layer 22 arranged around the light-emitting chip units 21; each of the light-emitting chip units 21 has a light-emitting surface 211; the color conversion substrate 3 includes a second metal layer 31 and a filling layer 32, the second metal layer 31 is provided with a through hole 311 at the position corresponding to the light emitting surface 211 of the light-emitting chip unit 21, and the filling layer 32 is set in the through hole 311; the third metal layer 31
  • the layer 4 is disposed corresponding to the first metal layer 22 and is used for sealing and connecting the first metal layer 22 and the second metal layer 31 .
  • the second metal layer 31 is used in the color conversion substrate 3 to replace the existing black barrier, which can reflect light instead of absorbing light, and increase the light extraction rate. Moreover, the second metal layer 31 can block the lateral transmission of water vapor, prevent water vapor from corroding the filling layer 32 , and improve the reliability of the filling layer 32 .
  • the third metal layer 4 is connected to the first metal layer 22 and the second metal layer 31 by low temperature welding.
  • the low-temperature welding method realizes the sealed connection without affecting the structure of the substrate, and makes the metal layer seal the light-emitting chip unit 21 and the filling layer 32 to prevent water vapor from entering and increase the service life.
  • the driving substrate 1 includes: a silicon substrate 11 and a complementary metal oxide semiconductor layer (CMOS) 12 disposed on the silicon substrate 11 .
  • the silicon substrate 11 is a carrier
  • the CMOS layer 12 is a circuit layer for driving the light-emitting chip unit 21 , which can effectively control the light-emitting and off of the light-emitting chip unit 21 .
  • the light-emitting component layer 2 further includes a flat layer 23 and a transparent electrode layer 24; the flat layer 23 is provided on the driving substrate 1 and filled between adjacent light-emitting chip units 21;
  • the transparent electrode layer 24 covers the planar layer 23 and is electrically connected to the light-emitting chip unit 21; the first metal layer 22 is disposed on the transparent electrode layer 24 or the first metal layer 22 is connected to the The transparent electrode layer 24 is provided on the same layer.
  • the flat layer 23 is made of an opaque material, which can block the cross-light phenomenon of adjacent light-emitting chip units 21 and reduce the installation distance between the light-emitting chip units 21 .
  • the material of the transparent electrode layer 24 includes indium tin oxide (ITO), which can transmit light, so that the light emitted by the light-emitting chip unit 21 can pass through the transparent electrode layer 24 .
  • ITO indium tin oxide
  • the light-emitting component layer 2 further includes: a reflective layer 25 disposed on the side wall of the light-emitting chip unit 21 , or disposed on the side wall of the light-emitting chip unit 21 And the area on the top surface of the light-emitting chip unit 21 that is not the light-emitting surface 211 , that is, the reflective layer 25 is not disposed in the area where the light-emitting surface 211 is located.
  • the reflective layer 25 can effectively reflect light, so that all the light is emitted from the light-emitting surface 211. On the one hand, it can effectively block the cross-light phenomenon of adjacent light-emitting chip units 21, and reduce the installation distance between the light-emitting chip units 21. On the other hand, it can The light emitted by the light emitting chip unit 21 can be fully utilized.
  • the material of the flat layer 23 may also be a transparent material such as silicon nitride or silicon oxide.
  • the light-emitting chip unit 21 includes three blue-light MicroLED chips 212, and the filling layer 32 includes a red light color conversion layer 321 and a green light color conversion layer 322; A red light color conversion layer 321 and a green light color conversion layer 322 are disposed in two through holes 311 of the holes 311 . It can be understood that every three blue MicroLED chips 212 and one red light color conversion layer 321 and one green light color conversion layer 322 form three colors of red, green and blue light, constituting a pixel unit.
  • the way that the light-emitting chip unit 21 includes three blue-light MicroLED chips 212 is convenient for mass production, and the manufacturing process is reduced compared with the structure of three kinds of red, green and blue MicroLED chips in one pixel unit.
  • the metal electrode 26 is set under the blue MicroLED chip 212, so that the reflective effect of the metal electrode 26 can be used to cover the non-extruded light surface 211 area around the light-emitting chip unit 21 together with the reflective layer 25, so that the light-emitting chip
  • the light emitted by the unit 21 is all emitted from the light emitting surface 211 , which further improves the utilization rate of the light emitted by the light emitting chip unit 21 .
  • the color conversion substrate 3 further includes a blue light reflective layer 35 disposed in the through hole 311, and the blue light reflective layer 35 corresponds to the red light color conversion layer 321 and the position of the green color conversion layer 322 are set.
  • the blue light reflective layer 35 can effectively reflect blue light and selectively pass red light and green light, so that the blue light is reflected again into the red light color conversion layer 321 and the green light color conversion layer 322 to excite quantum dots to generate Red light and green light improve light utilization efficiency.
  • the blue light reflective layer 35 is composed of three layers of metal film/transparent medium film/metal film, or the blue light reflective layer 35 is composed of metal film/transparent medium film/metal film/transparent medium film/metal film Composed of five layers of film; the metal film material is any one of silver, aluminum, copper, and gold, and the transparent layer material is any one of metal oxide, silicon nitride, and silicon oxide.
  • the blue light reflective layer 35 of the five-layer film structure has a higher blue light reflectance than the blue light reflective layer 35 of the three-layer film structure, and can more effectively reflect blue light to the red light color conversion layer 321 and the green light color conversion layer
  • the quantum dots are excited in 322 to generate red light and green light, which improves the light utilization efficiency.
  • the color conversion substrate 3 further includes a transparent film layer 33 disposed on a side of the second metal layer 31 away from the driving substrate 1 .
  • the transparent film layer 33 includes polyimide (PI)/inorganic layer/polyimide (PI); the thickness of the transparent film layer 33 is 2-10um.
  • the transparent film layer 33 seals the through hole 311 of the second metal layer 31 and can effectively protect the filling layer 32 disposed in the through hole 311 .
  • the display device further includes: a condensing layer 34 disposed on the color conversion substrate 3 ; the condensing layer 34 includes a plurality of condensing lenses 341 , the condensing The optical lenses 341 are provided in one-to-one correspondence with the through holes 311 .
  • the condensing lens 341 can condense and output the light emitted through the through hole 311 to avoid scattering and mixing light.
  • the present application preferably sets multiple condenser lenses 341 separately.
  • multiple condenser lenses 341 can also be arranged on the transparent substrate 33 to form the light condenser layer 34, and the condenser lenses 341 are arranged on the On the transparent film layer 33 , the transparent film layer 33 can carry a condenser lens 341 disposed above the through hole 311 .
  • the present application further provides a method for manufacturing a display device, including the following steps S1-S3.
  • the driving substrate 1 includes a silicon substrate 11 and a complementary metal oxide semiconductor (CMOS) layer 12 disposed on the silicon substrate 11 .
  • CMOS complementary metal oxide semiconductor
  • the silicon substrate 11 is a carrier
  • the CMOS layer 12 is a circuit layer for driving the light-emitting chip unit 21 , which can effectively control the light-emitting and off of the light-emitting chip unit 21 .
  • the structure after the light-emitting component layer 2 is fabricated is shown in FIG. 3 .
  • the color conversion substrate 3 includes a transparent film layer 33, a second metal layer 31 and a filling layer 32.
  • the second metal layer 31 is provided with a through hole 311 at a position corresponding to the light-emitting surface 211 of the light-emitting chip unit 21, so The filling layer 32 is disposed in the through hole 311 .
  • the step of making the color conversion substrate 3 specifically includes: making a second metal layer 31 , etching a through hole 311 on the second metal layer 31 , and making a filling layer 32 in the through hole 311 .
  • the color conversion substrate 3 further includes a transparent film layer 33, and the transparent film layer 33 is provided on one side of the second metal layer 31; the step of manufacturing the color conversion substrate 3 specifically includes: Making a transparent film layer 33 on the substrate 36; making a second metal layer 31 on the transparent film layer 33, etching a through hole 311 on the second metal layer 31, and making a filling layer 32 in the through hole 311 .
  • the color conversion substrate 3 further includes a blue light reflective layer 35, the blue light reflective layer 35 is arranged in the through hole 311, and is located between the transparent film layer 33 and the filling layer 32, wherein the three adjacent through holes
  • the hole 311 is a group of through hole units, and the blue light reflective layer 35 is arranged in the two through holes 311 in each group of through hole units.
  • the step 3 of making the color conversion substrate specifically includes: making the blue light reflective layer 35 and fill layer 32 .
  • the structure after the color conversion substrate 3 is fabricated is shown in FIG. 4 .
  • the through hole 311 of the second metal layer 31 is arranged corresponding to the light-emitting chip unit 21 , and is sealed and connected to the first metal layer 22 and the second metal layer 31 by low-temperature soldering of the third metal layer 4 .
  • the structure after low-temperature welding of the third metal layer 4 is shown in FIG. 5 .
  • attaching the color conversion substrate 3 to the light-emitting component layer 2 further includes: peeling the carrier substrate 36 from the transparent film layer 33; and making a light-gathering layer 34 on the transparent film layer 33,
  • the condensing layer 34 includes a plurality of condensing lenses 341 , and the condensing lenses 341 are arranged in one-to-one correspondence with the through holes 311 .
  • FIG. 6 is a schematic diagram of the structure when the carrier substrate 36 is peeled off from the transparent film layer 33 .
  • FIG. 1 is a schematic diagram of the overall structure of the display device after the light-gathering layer 34 is manufactured.
  • the light-emitting component layer 2 can be fabricated on the driving substrate 1 at the same time.
  • the light-emitting component layer 2 can also be fabricated on the driving substrate 1 first and then the color conversion substrate 3, or the color conversion substrate 3 can be produced first and then the light-emitting component layer 2 can be fabricated on the driving substrate 1.
  • the second metal layer 31 is used in the color conversion substrate 3 to replace the existing black barrier, which can reflect light instead of absorb light, increase the light output rate, and use low-temperature welding to connect the surrounding through the third metal layer 4
  • the first metal layer 22 and the second metal layer 31 provided on the light-emitting chip unit 21 make the metal layer seal the light-emitting chip unit 21 and the filling layer 32 to prevent water vapor from entering and increase the service life.
  • the filling layer 32 disposed in the through hole 311 of the second metal layer 31 includes a red light color conversion layer 321 and a green light color conversion layer 322 , which can reuse reflected light and increase the light extraction rate.
  • a blue light reflective layer 35 corresponding to the red light color conversion layer 321 and the green light color conversion layer 322 is provided in the through hole 311, and the blue light reflective layer 35 can reflect light to the red light
  • the color conversion layer 321 and the green light color conversion layer 322 improve the light conversion rate and utilization rate, and improve the luminous brightness of the display device.
  • Embodiment 2 of the present application includes most of the technical features of Embodiment 1.
  • the MicroLED chips included in the light-emitting chip unit 21 in Embodiment 2 include red MicroLED chips R, At least one of the green MicroLED chip G and the blue MicroLED chip B;
  • the filling layer 32 includes a filter layer (CF), and the filter layer includes a red filter layer 32R, a green filter layer 32G and a blue filter layer At least one of layers 32B.
  • the red filter layer 32R is set corresponding to the red MicroLED chip R
  • the green filter layer 32G is set corresponding to the green MicroLED chip G
  • the blue filter layer 32B is set corresponding to the blue MicroLED chip B.
  • Embodiment 2 is different from that in Embodiment 1 in that the light-emitting chip unit 21 is a blue-light MicroLED chip 212.
  • the blue-light reflective layer in Embodiment 1 is not provided in Embodiment 2, so that it can also be used in the color conversion substrate 3.
  • the second metal layer 31 replaces the existing black barrier, which can reflect light instead of absorbing light, thereby increasing the light extraction rate.
  • a filling layer 32 is formed in the through hole 311 of the second metal layer 31, the filling layer 32 includes a red filter layer 32R, a green filter layer 32G and a blue filter layer 32B, and the second metal layer 31 can block water vapor The lateral transmission to the filling layer 32 improves the reliability of the filling layer 32 .
  • first metal layer 22 and the second metal layer 31 arranged around the light-emitting chip unit 21 are connected through the third metal layer 4 by low-temperature welding, so that the metal layer seals the light-emitting chip unit 21 and the filling layer 32 to prevent water vapor from entering. Increased service life.
  • Embodiment 1 Based on the display device 100 described above, please refer to FIG. 2 in Embodiment 1 for the manufacturing method of the corresponding display device in Embodiment 2.
  • the sequence of steps is the same as that in Embodiment 1, and the difference is only that it is fabricated on the driving substrate 1.
  • the light-emitting chip unit 21 in the light-emitting component layer 2 and the filling layer 32 formed in the through hole 311 of the second metal layer 31 adopt the structure of the second embodiment.
  • the manufacturing method of the display device in Embodiment 2 specifically includes the following steps S1-S3.
  • a flat layer 23 is formed on the drive substrate 1 to fill between the light-emitting chip units 21;
  • a transparent electrode layer 24 is formed on the flat layer 23, and the transparent electrode layer 24 is electrically connected to the light-emitting chip unit 21. Connection; making a first metal layer 22 on the transparent electrode layer 24 , and the first metal layer 22 is arranged around the light-emitting chip unit 21 .
  • the driving substrate 1 includes a silicon substrate 11 and a complementary metal oxide semiconductor (CMOS) layer 12 disposed on the silicon substrate 11 .
  • the silicon substrate 11 is a carrier
  • the CMOS layer 12 is a circuit layer for driving the light-emitting chip unit 21 , which can effectively control the light-emitting and off of the light-emitting chip unit 21 .
  • the light-emitting chip unit 21 includes at least one of a red MicroLED chip R, a green MicroLED chip G, and a blue MicroLED chip B.
  • the color conversion substrate 3 includes a second metal layer 31 and a filling layer 32, and the second metal layer 31 is provided with a through hole corresponding to the light-emitting surface 211 of the light-emitting chip unit 21 311 , the filling layer 32 is disposed in the through hole 311 .
  • the step of making the color conversion substrate 3 specifically includes: making a second metal layer 31 , etching a through hole 311 on the second metal layer 31 , and making a filling layer 32 in the through hole 311 .
  • the color conversion substrate 3 further includes a transparent film layer 33, and the transparent film layer 33 is provided on one side of the second metal layer 31; at this time, the step of manufacturing the color conversion substrate 3 specifically includes: Fabricate a transparent film layer 33 on a carrier substrate 36; fabricate a second metal layer 31 on the transparent film layer 33, etch and form a through hole 311 on the second metal layer 31, and fabricate in the through hole 311 fill layer 32 .
  • the filling layer 32 includes a filter layer (CF), and the filter layer includes at least one of a red filter layer 32R, a green filter layer 32G and a blue filter layer 32B.
  • the through hole 311 of the second metal layer 31 is set corresponding to the light-emitting chip unit 21, specifically, the red filter layer 32R is set corresponding to the red MicroLED chip R , the green filter layer 32G is set corresponding to the green MicroLED chip G, and the blue filter layer 32B is set corresponding to the blue MicroLED chip B.
  • the first metal layer 22 and the second metal layer 31 are hermetically connected by means of low-temperature welding of the third metal layer 4 .
  • the light-condensing layer 34 includes a plurality of light-condensing lenses 341 , and the light-condensing lenses 341 are arranged in one-to-one correspondence with the through holes 311 .
  • FIG. 6 is a schematic diagram of the structure when the carrier substrate 36 is peeled off from the transparent film layer 33 .
  • FIG. 1 is a schematic diagram of the overall structure of the display device after the light-gathering layer 34 is manufactured.
  • the light-emitting component layer 2 can be fabricated on the driving substrate 1 at the same time.
  • the light-emitting component layer 2 can also be fabricated on the driving substrate 1 first and then the color conversion substrate 3, or the color conversion substrate 3 can be produced first and then the light-emitting component layer 2 can be fabricated on the driving substrate 1.

Abstract

The present application discloses a display device and a manufacturing method therefor. The display device comprises a driving substrate, a light-emitting assembly layer, and a third metal layer; the light-emitting assembly layer comprises a plurality of light-emitting chip units and a first metal layer surrounding the light-emitting chip units; a color conversion substrate comprises a second metal layer and a filling layer; a through hole is formed at a position where the second metal layer corresponds to a top light-emitting surface; the filling layer is provided in the through hole; and the third metal layer corresponds to the first metal layer and is used for connecting the first metal layer and the second metal layer in a sealed manner.

Description

一种显示装置及其制作方法Display device and manufacturing method thereof 技术领域technical field
本申请涉及MicroLED(微发光二极管)显示技术领域,具体涉及一种显示装置及其制作方法。The present application relates to the field of Micro LED (micro light emitting diode) display technology, and in particular to a display device and a manufacturing method thereof.
背景技术Background technique
目前MicroLED芯片由于采用无机发光二极管技术,可实现ns级别的响应速度和超高亮度。由于三色全彩MicroLED微显示中,MicroLED的像素间距很小,要防止像素之间的串色,就要在MicroLED上方的色转换基板中采用黑色挡墙进行遮光,黑色挡墙之间设置色转换层转换为三色光,一方面黑色挡墙的吸收率导致光效降低,此外由于黑色挡墙为有机材质,水汽容易从黑色挡墙进入色转换层,从而导致色转换层的可靠性降低,而且也会扩散至MicroLED区域,导致缩短使用寿命。因此如何提升MicroLED出光率以及增加阻隔水汽效果成为亟需解决的技术问题。At present, due to the use of inorganic light-emitting diode technology, Micro LED chips can achieve ns-level response speed and ultra-high brightness. In the three-color full-color MicroLED micro-display, the pixel pitch of the MicroLED is very small. To prevent color crossover between pixels, it is necessary to use black barriers in the color conversion substrate above the MicroLEDs for shading, and set color barriers between the black barriers. The conversion layer is converted into three-color light. On the one hand, the absorption rate of the black retaining wall reduces the light efficiency. In addition, because the black retaining wall is made of organic material, water vapor easily enters the color conversion layer from the black retaining wall, which reduces the reliability of the color conversion layer. And it will also spread to the MicroLED area, resulting in shortened service life. Therefore, how to improve the light output rate of Micro LED and increase the effect of blocking water vapor has become a technical problem that needs to be solved urgently.
技术问题technical problem
本申请实施例提供一种显示装置及其制作方法,用于解决在MicroLED上方的色转换基板中采用黑色挡墙进行遮光导致光效降低,以及水汽容易从黑色挡墙进入色转换层,从而导致色转换层的可靠性降低,而且也会扩散至MicroLED区域,导致缩短使用寿命的技术问题。Embodiments of the present application provide a display device and a manufacturing method thereof, which are used to solve the problem of reducing light efficiency due to the use of a black barrier wall in the color conversion substrate above the MicroLED for shading, and the fact that water vapor easily enters the color conversion layer from the black barrier wall, resulting in The reliability of the color conversion layer is reduced, and it also spreads to the MicroLED area, resulting in a technical problem of shortening the service life.
技术解决方案technical solution
本申请实施例提供一种显示装置,包括驱动基板、发光组件层、色转换基板以及第三金属层;其中,发光组件层包括设于所述驱动基板上的多个发光芯片单元以及环绕所述发光芯片单元设置的第一金属层;各所述发光芯片单元具有顶出光面;色转换基板包括第二金属层以及填充层,所述第二金属层在对应所述发光芯片单元的顶出光面位置设有通孔,所述填充层设于所述通孔中;第三金属层与所述第一金属层对应设置,用于密封连接所述第一金属层和所述第二金属层。An embodiment of the present application provides a display device, including a driving substrate, a light-emitting component layer, a color conversion substrate, and a third metal layer; wherein, the light-emitting component layer includes a plurality of light-emitting chip units disposed on the driving substrate and surrounding the The first metal layer provided by the light-emitting chip unit; each of the light-emitting chip units has a light-emitting surface; the color conversion substrate includes a second metal layer and a filling layer, and the second metal layer is on the light-emitting surface corresponding to the light-emitting chip unit A through hole is provided at the position, and the filling layer is arranged in the through hole; the third metal layer is arranged corresponding to the first metal layer, and is used for sealing and connecting the first metal layer and the second metal layer.
进一步的,所述第三金属层通过低温焊接方式连接所述第一金属层和所述第二金属层。Further, the third metal layer is connected to the first metal layer and the second metal layer by low-temperature welding.
进一步的,所述发光组件层还包括:平坦层,设于所述驱动基板上并填充于所述发光芯片单元之间;以及透明电极层,所述透明电极层覆盖于所述平坦层上并与所述发光芯片单元电性连接;所述第一金属层设于所述透明电极层上或者所述第一金属层与所述透明电极层设于同一层。Further, the light-emitting component layer further includes: a flat layer disposed on the driving substrate and filled between the light-emitting chip units; and a transparent electrode layer covering the flat layer and It is electrically connected with the light-emitting chip unit; the first metal layer is set on the transparent electrode layer or the first metal layer and the transparent electrode layer are set on the same layer.
进一步的,所述发光组件层还包括:反射层,设于所述发光芯片单元的侧壁上,或者设于所述发光芯片单元的侧壁上和所述发光芯片单元的顶面上的非顶出光面区域。Further, the light-emitting component layer further includes: a reflective layer disposed on the side wall of the light-emitting chip unit, or disposed on the side wall of the light-emitting chip unit and the non-reflective layer on the top surface of the light-emitting chip unit. Top out the glossy area.
进一步的,所述发光芯片单元包括三个蓝光MicroLED芯片,所述填充层包括红光色转换层和绿光色转换层;在一个发光芯片单元对应的三个通孔的其中两个通孔内设有一个红光色转换层和一个绿光色转换层。Further, the light-emitting chip unit includes three blue MicroLED chips, and the filling layer includes a red light color conversion layer and a green light color conversion layer; two of the three through holes corresponding to one light-emitting chip unit There is a red light color conversion layer and a green light color conversion layer.
进一步的,所述色转换基板还包括蓝光反光层,设于所述通孔内或者设于所述第二金属层上且对应于所述红光色转换层和所述绿光色转换层的位置设置。Further, the color conversion substrate further includes a blue light reflective layer, which is disposed in the through hole or on the second metal layer and corresponds to the red light color conversion layer and the green light color conversion layer. location settings.
进一步的,所述蓝光反光层由金属膜/透明介质膜/金属膜三层膜构成,或者所述蓝光反光层由金属膜/透明介质膜/金属膜/透明介质膜/金属膜五层膜构成。Further, the blue light reflective layer is composed of metal film/transparent dielectric film/metal film three-layer film, or the blue light reflective layer is composed of metal film/transparent dielectric film/metal film/transparent dielectric film/metal film five-layer film .
进一步的,所述显示装置还包括:聚光层,设于所述色转换基板上;所述聚光层包括多个聚光透镜,所述聚光透镜与所述通孔一一对应设置。Further, the display device further includes: a light-condensing layer disposed on the color conversion substrate; the light-condensing layer includes a plurality of light-condensing lenses, and the light-condensing lenses are arranged in one-to-one correspondence with the through holes.
进一步的,所述色转换基板还包括透明膜层,设于所述第二金属层背离所述驱动基板的一侧;所述聚光透镜设于所述通孔内,或者所述聚光透镜设于所述透明膜层上。Further, the color conversion substrate further includes a transparent film layer, which is arranged on the side of the second metal layer away from the driving substrate; the condenser lens is arranged in the through hole, or the condenser lens set on the transparent film layer.
进一步的,所述发光芯片单元包括红色MicroLED芯片、绿色MicroLED芯片以及蓝色MicroLED芯片;所述填充层包括滤光层,所述滤光层包括红色滤光层、绿色滤光层以及蓝色滤光层;所述红色滤光层对应所述红色MicroLED芯片设置,所述绿色滤光层对应所述绿色MicroLED芯片设置,是蓝色滤光层对应所述蓝色MicroLED芯片设置。Further, the light-emitting chip unit includes a red MicroLED chip, a green MicroLED chip, and a blue MicroLED chip; the filling layer includes a filter layer, and the filter layer includes a red filter layer, a green filter layer, and a blue filter layer. Optical layer: the red filter layer is set corresponding to the red MicroLED chip, the green filter layer is set corresponding to the green MicroLED chip, and the blue filter layer is set corresponding to the blue MicroLED chip.
本申请还提供一种显示装置的制作方法,包括步骤:在一驱动基板上制作发光组件层,其为将多个发光芯片单元转移并键合在所述驱动基板上,在所述驱动基板上制作一平坦层填充于所述发光芯片单元之间,各所述发光芯片单元具有顶出光面;在所述平坦层上制作一透明电极层,所述透明电极层与所述发光芯片单元的顶出光面电性连接;在所述透明电极层上制作一第一金属层,所述第一金属层环绕所述发光芯片单元设置;制作一色转换基板,所述色转换基板包括第二金属层以及填充层,所述第二金属层在对应所述发光芯片单元的顶出光面位置设有通孔,所述填充层设于所述通孔中;以及将色转换基板贴合至发光组件层上,所述第二金属层的通孔与所述发光芯片单元对应设置,并通过低温焊接第三金属层方式密封连接所述第一金属层和所述第二金属层。The present application also provides a method for manufacturing a display device, including the steps of: fabricating a light-emitting component layer on a driving substrate, which is to transfer and bond a plurality of light-emitting chip units on the driving substrate, and on the driving substrate Making a flat layer to fill between the light-emitting chip units, each of the light-emitting chip units has a light-emitting surface; making a transparent electrode layer on the flat layer, and the transparent electrode layer and the top of the light-emitting chip unit The light-emitting surface is electrically connected; a first metal layer is made on the transparent electrode layer, and the first metal layer is arranged around the light-emitting chip unit; a color conversion substrate is made, and the color conversion substrate includes a second metal layer and A filling layer, the second metal layer is provided with a through hole corresponding to the light-emitting surface of the light-emitting chip unit, the filling layer is arranged in the through hole; and the color conversion substrate is attached to the light-emitting component layer , the through hole of the second metal layer is arranged corresponding to the light-emitting chip unit, and the first metal layer and the second metal layer are sealed and connected by low-temperature soldering of the third metal layer.
进一步的,所述色转换基板还包括透明膜层,所述透明膜层设于所述第二金属层的一侧;在制作色转换基板步骤中具体包括:在一承载基板上制作透明膜层;在所述透明膜层上制作第二金属层,在所述第二金属层上蚀刻形成通孔,在所述通孔内制作填充层。Further, the color conversion substrate further includes a transparent film layer, and the transparent film layer is arranged on one side of the second metal layer; the step of manufacturing the color conversion substrate specifically includes: making a transparent film layer on a carrier substrate ; Making a second metal layer on the transparent film layer, etching a through hole on the second metal layer, and making a filling layer in the through hole.
进一步的,在将色转换基板贴合至发光组件层上后还包括:将所述承载基板从所述透明膜层上剥离;以及在所述透明膜层上制作聚光层,所述聚光层包括多个聚光透镜,所述聚光透镜与所述通孔一一对应设置。Further, after attaching the color conversion substrate to the light-emitting component layer, it also includes: peeling the carrier substrate from the transparent film layer; The layer includes a plurality of condensing lenses, and the condensing lenses are arranged in one-to-one correspondence with the through holes.
有益效果Beneficial effect
本申请实施例在色转换基板中采用第二金属层替换现有的黑色挡墙,能够反射光线而不是吸收光线,增加了出光率,并且采用低温焊接方式通过第三金属层连接环绕发光芯片单元设置的第一金属层和所述第二金属层,使得金属层密封发光芯片单元以及填充层,避免水汽进入,增加了使用寿命。并且还进一步设置在第二金属层的通孔内的填充层包括色转换层,能够再次利用反射光线,增加了出光率。进一步在所述通孔内还设有对应所述红光色转换层和所述绿光色转换层设置的蓝光反光层,所述蓝光反光层能反射光线至色转换层,提升了光转换率和利用率,提升了显示装置的发光亮度。In the embodiment of the present application, the second metal layer is used to replace the existing black retaining wall in the color conversion substrate, which can reflect light instead of absorb light, increase the light output rate, and use low-temperature soldering to connect the surrounding light-emitting chip unit through the third metal layer The first metal layer and the second metal layer are arranged so that the metal layer seals the light-emitting chip unit and the filling layer, avoiding the entry of water vapor, and increasing the service life. Furthermore, the filling layer disposed in the through hole of the second metal layer includes a color conversion layer, which can reuse reflected light and increase the light extraction rate. Further, a blue light reflective layer corresponding to the red light color conversion layer and the green light color conversion layer is provided in the through hole, and the blue light reflective layer can reflect light to the color conversion layer, thereby improving the light conversion rate and utilization rate, and the luminous brightness of the display device is improved.
附图说明Description of drawings
图1是本申请一实施例提供的一种显示装置的结构示意图;FIG. 1 is a schematic structural diagram of a display device provided by an embodiment of the present application;
图2是本申请一实施例提供的一种显示装置的制作方法的流程图;Fig. 2 is a flow chart of a manufacturing method of a display device provided by an embodiment of the present application;
图3是本申请一实施例提供的制作完成发光组件层后的结构示意图;Fig. 3 is a schematic structural view of a light-emitting component layer provided by an embodiment of the present application;
图4是本申请一实施例提供的制作完成色转换基板后的结构示意图;Fig. 4 is a schematic structural diagram of a color conversion substrate provided by an embodiment of the present application after fabrication;
图5是本申请一实施例提供的完成低温焊接第三金属层后的结构示意图;Fig. 5 is a schematic diagram of the structure provided by an embodiment of the present application after the low-temperature welding of the third metal layer is completed;
图6是本申请一实施例提供的将承载基板从透明膜层上剥离时的结构示意图;Fig. 6 is a schematic view of the structure when the carrier substrate is peeled off from the transparent film layer provided by an embodiment of the present application;
图7是本申请另一实施例提供的一种显示装置的结构示意图。FIG. 7 is a schematic structural diagram of a display device provided by another embodiment of the present application.
附图标记说明:Explanation of reference signs:
驱动基板1,发光组件层2,色转换基板3,driving substrate 1, light-emitting component layer 2, color conversion substrate 3,
第三金属层4,硅基板11,互补金属氧化物半导体层12,The third metal layer 4, the silicon substrate 11, the complementary metal oxide semiconductor layer 12,
发光芯片单元21,第一金属层22,平坦层23,light emitting chip unit 21, first metal layer 22, planar layer 23,
透明电极层24,反射层25,金属电极26,Transparent electrode layer 24, reflective layer 25, metal electrode 26,
第二金属层31,填充层32,透明膜层33,The second metal layer 31, the filling layer 32, the transparent film layer 33,
聚光层34,蓝光反光层35,承载基板36,Light-gathering layer 34, blue-light reflective layer 35, carrier substrate 36,
显示装置100,顶出光面211,蓝光MicroLED芯片212,The display device 100, the light emitting surface 211, the blue MicroLED chip 212,
通孔311,红光色转换层321,绿光色转换层322,Through hole 311, red light color conversion layer 321, green light color conversion layer 322,
聚光透镜341,红色MicroLED芯片R,绿色MicroLED芯片G,condenser lens 341, red MicroLED chip R, green MicroLED chip G,
蓝色MicroLED芯片B,红色滤光层32R,绿色滤光层32G,Blue MicroLED chip B, red filter layer 32R, green filter layer 32G,
蓝色滤光层32B。Blue filter layer 32B.
本发明的实施方式Embodiments of the present invention
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。此外,应当理解的是,此处所描述的具体实施方式仅用于说明和解释本申请,并不用于限制本申请。在本申请中,在未作相反说明的情况下,使用的方位词如“上”和“下”通常是指装置实际使用或工作状态下的上和下,具体为附图中的图面方向;而“内”和“外”则是针对装置的轮廓而言的。The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application. In addition, it should be understood that the specific implementations described here are only used to illustrate and explain the present application, and are not intended to limit the present application. In this application, unless stated to the contrary, the used orientation words such as "up" and "down" usually refer to up and down in the actual use or working state of the device, specifically the direction of the drawing in the drawings ; while "inside" and "outside" refer to the outline of the device.
在本申请中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。In this application, unless otherwise expressly specified and limited, a first feature being "on" or "under" a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them. Moreover, "above", "above" and "above" the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature. "Below", "beneath" and "under" the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.
本申请实施例提供一种显示装置及显示装置的制作方法。以下分别进行详细说明。需说明的是,以下实施例的描述顺序不作为对实施例优选顺序的限定。Embodiments of the present application provide a display device and a manufacturing method of the display device. Each will be described in detail below. It should be noted that the description sequence of the following embodiments is not intended to limit the preferred sequence of the embodiments.
实施例1Example 1
如图1所示,本申请实施例1中提供一种显示装置100,包括驱动基板1、发光组件层2、色转换基板3以及第三金属层4;其中,发光组件层2包括设于所述驱动基板1上的多个发光芯片单元21以及环绕所述发光芯片单元21设置的第一金属层22;各所述发光芯片单元21具有顶出光面211;色转换基板3包括第二金属层31以及填充层32,所述第二金属层31在对应所述发光芯片单元21的顶出光面211位置设有通孔311,所述填充层32设于所述通孔311中;第三金属层4与所述第一金属层22对应设置,用于密封连接所述第一金属层22和所述第二金属层31。本申请实施例在色转换基板3中采用第二金属层31替换现有的黑色挡墙,能够反射光线而不是吸收光线,增加了出光率。而且第二金属层31可阻隔水汽横向传输,避免水汽侵蚀填充层32,提升了填充层32的可靠性。As shown in FIG. 1 , Embodiment 1 of the present application provides a display device 100, which includes a driving substrate 1, a light-emitting component layer 2, a color conversion substrate 3, and a third metal layer 4; wherein, the light-emitting component layer 2 includes A plurality of light-emitting chip units 21 on the driving substrate 1 and a first metal layer 22 arranged around the light-emitting chip units 21; each of the light-emitting chip units 21 has a light-emitting surface 211; the color conversion substrate 3 includes a second metal layer 31 and a filling layer 32, the second metal layer 31 is provided with a through hole 311 at the position corresponding to the light emitting surface 211 of the light-emitting chip unit 21, and the filling layer 32 is set in the through hole 311; the third metal layer 31 The layer 4 is disposed corresponding to the first metal layer 22 and is used for sealing and connecting the first metal layer 22 and the second metal layer 31 . In the embodiment of the present application, the second metal layer 31 is used in the color conversion substrate 3 to replace the existing black barrier, which can reflect light instead of absorbing light, and increase the light extraction rate. Moreover, the second metal layer 31 can block the lateral transmission of water vapor, prevent water vapor from corroding the filling layer 32 , and improve the reliability of the filling layer 32 .
本实施例中,所述第三金属层4通过低温焊接方式连接所述第一金属层22和所述第二金属层31。低温焊接方式实现密封连接,不会对基板的结构产生影响,且使得金属层密封发光芯片单元21以及填充层32,避免水汽进入,增加了使用寿命。In this embodiment, the third metal layer 4 is connected to the first metal layer 22 and the second metal layer 31 by low temperature welding. The low-temperature welding method realizes the sealed connection without affecting the structure of the substrate, and makes the metal layer seal the light-emitting chip unit 21 and the filling layer 32 to prevent water vapor from entering and increase the service life.
如图1所示,本实施例中,所述驱动基板1包括:硅基板11以及设于所述硅基板11上的互补金属氧化物半导体层(CMOS)12。硅基板11为载体,互补金属氧化物半导体层12为驱动发光芯片单元21的电路层,能够有效控制发光芯片单元21的发光和关闭。As shown in FIG. 1 , in this embodiment, the driving substrate 1 includes: a silicon substrate 11 and a complementary metal oxide semiconductor layer (CMOS) 12 disposed on the silicon substrate 11 . The silicon substrate 11 is a carrier, and the CMOS layer 12 is a circuit layer for driving the light-emitting chip unit 21 , which can effectively control the light-emitting and off of the light-emitting chip unit 21 .
本实施例中,所述发光组件层2还包括平坦层23以及透明电极层24;平坦层23设于所述驱动基板1上并填充于相邻的所述发光芯片单元21之间;所述透明电极层24覆盖于所述平坦层23上并与所述发光芯片单元21电性连接;所述第一金属层22设于所述透明电极层24上或者所述第一金属层22与所述透明电极层24设于同一层。其中,所述平坦层23为不透光材质,能够阻隔相邻的发光芯片单元21的串光现象,减少发光芯片单元21之间的设置距离。所述透明电极层24的材质包括氧化铟锡(ITO),其能够透过光线,可使得所述发光芯片单元21发出的光线穿过透明电极层24。In this embodiment, the light-emitting component layer 2 further includes a flat layer 23 and a transparent electrode layer 24; the flat layer 23 is provided on the driving substrate 1 and filled between adjacent light-emitting chip units 21; The transparent electrode layer 24 covers the planar layer 23 and is electrically connected to the light-emitting chip unit 21; the first metal layer 22 is disposed on the transparent electrode layer 24 or the first metal layer 22 is connected to the The transparent electrode layer 24 is provided on the same layer. Wherein, the flat layer 23 is made of an opaque material, which can block the cross-light phenomenon of adjacent light-emitting chip units 21 and reduce the installation distance between the light-emitting chip units 21 . The material of the transparent electrode layer 24 includes indium tin oxide (ITO), which can transmit light, so that the light emitted by the light-emitting chip unit 21 can pass through the transparent electrode layer 24 .
如图1所示,本实施例中,所述发光组件层2还包括:反射层25,设于所述发光芯片单元21的侧壁上,或者设于所述发光芯片单元21的侧壁上和所述发光芯片单元21的顶面上的非顶出光面211区域,亦即所述反射层25不设置在顶出光面211所在区域内。反射层25能够有效反射光线,使得光线都从顶出光面211射出,一方面能够有效阻隔相邻的发光芯片单元21的串光现象,减少发光芯片单元21之间的设置距离,另一方面还能够全部利用所述发光芯片单元21发出的光线。此时由于设置了反射层25,所述平坦层23的材质也可为氮化硅或氧化硅等透明材质。As shown in FIG. 1 , in this embodiment, the light-emitting component layer 2 further includes: a reflective layer 25 disposed on the side wall of the light-emitting chip unit 21 , or disposed on the side wall of the light-emitting chip unit 21 And the area on the top surface of the light-emitting chip unit 21 that is not the light-emitting surface 211 , that is, the reflective layer 25 is not disposed in the area where the light-emitting surface 211 is located. The reflective layer 25 can effectively reflect light, so that all the light is emitted from the light-emitting surface 211. On the one hand, it can effectively block the cross-light phenomenon of adjacent light-emitting chip units 21, and reduce the installation distance between the light-emitting chip units 21. On the other hand, it can The light emitted by the light emitting chip unit 21 can be fully utilized. At this time, since the reflective layer 25 is provided, the material of the flat layer 23 may also be a transparent material such as silicon nitride or silicon oxide.
本实施例中,所述发光芯片单元21包括三个蓝光MicroLED芯片212,所述填充层32包括红光色转换层321和绿光色转换层322;在一个发光芯片单元21对应的三个通孔311的其中两个通孔311内设有一个红光色转换层321和一个绿光色转换层322。可理解的是,每三个蓝光MicroLED芯片212以及一个红光色转换层321和一个绿光色转换层322形成了红绿蓝三色光,构成了一个像素单元。所述发光芯片单元21包括三个蓝光MicroLED芯片212的方式便于批量制作,相对于一个像素单元中包含三种红绿蓝三色MicroLED芯片结构减小了制作工序。在蓝光MicroLED芯片212的下方设置金属电极26,这样可利用金属电极26的反光作用,与反射层25共同包覆在所述发光芯片单元21周围的非顶出光面211区域,使得所述发光芯片单元21发出的光线均从顶出光面211射出,进一步提高发光芯片单元21发出的光线的利用率。In this embodiment, the light-emitting chip unit 21 includes three blue-light MicroLED chips 212, and the filling layer 32 includes a red light color conversion layer 321 and a green light color conversion layer 322; A red light color conversion layer 321 and a green light color conversion layer 322 are disposed in two through holes 311 of the holes 311 . It can be understood that every three blue MicroLED chips 212 and one red light color conversion layer 321 and one green light color conversion layer 322 form three colors of red, green and blue light, constituting a pixel unit. The way that the light-emitting chip unit 21 includes three blue-light MicroLED chips 212 is convenient for mass production, and the manufacturing process is reduced compared with the structure of three kinds of red, green and blue MicroLED chips in one pixel unit. The metal electrode 26 is set under the blue MicroLED chip 212, so that the reflective effect of the metal electrode 26 can be used to cover the non-extruded light surface 211 area around the light-emitting chip unit 21 together with the reflective layer 25, so that the light-emitting chip The light emitted by the unit 21 is all emitted from the light emitting surface 211 , which further improves the utilization rate of the light emitted by the light emitting chip unit 21 .
如图1所示,本实施例中,所述色转换基板3还包括蓝光反光层35,设于在所述通孔311内,且所述蓝光反光层35对应于所述红光色转换层321和所述绿光色转换层322的位置设置。所述蓝光反光层35能有效反射蓝光并选择性地通过红光以及绿光,这样使得蓝光被再次反射进入所述红光色转换层321和所述绿光色转换层322中激发量子点产生红光以及绿光,提升了光利用率。As shown in FIG. 1 , in this embodiment, the color conversion substrate 3 further includes a blue light reflective layer 35 disposed in the through hole 311, and the blue light reflective layer 35 corresponds to the red light color conversion layer 321 and the position of the green color conversion layer 322 are set. The blue light reflective layer 35 can effectively reflect blue light and selectively pass red light and green light, so that the blue light is reflected again into the red light color conversion layer 321 and the green light color conversion layer 322 to excite quantum dots to generate Red light and green light improve light utilization efficiency.
本实施例中,所述蓝光反光层35由金属膜/透明介质膜/金属膜三层膜构成,或者所述蓝光反光层35由金属膜/透明介质膜/金属膜/透明介质膜/金属膜五层膜构成;其中金属膜材料为银、铝、铜、金中的任意一种,透明层材料为金属氧化物、氮化硅、氧化硅中的任意一种。五层膜结构的蓝光反光层35相对于三层膜结构的蓝光反光层35的蓝光反射率更高,能够更加有效地反射蓝光至所述红光色转换层321和所述绿光色转换层322中激发量子点产生红光以及绿光,提升了光利用率。In this embodiment, the blue light reflective layer 35 is composed of three layers of metal film/transparent medium film/metal film, or the blue light reflective layer 35 is composed of metal film/transparent medium film/metal film/transparent medium film/metal film Composed of five layers of film; the metal film material is any one of silver, aluminum, copper, and gold, and the transparent layer material is any one of metal oxide, silicon nitride, and silicon oxide. The blue light reflective layer 35 of the five-layer film structure has a higher blue light reflectance than the blue light reflective layer 35 of the three-layer film structure, and can more effectively reflect blue light to the red light color conversion layer 321 and the green light color conversion layer The quantum dots are excited in 322 to generate red light and green light, which improves the light utilization efficiency.
如图1所示,本实施例中,所述色转换基板3还包括透明膜层33,设于所述第二金属层31背离所述驱动基板1的一侧。所述透明膜层33包括聚酰亚胺(PI)/无机层/聚酰亚胺(PI);所述透明膜层33的厚度为2-10um。所述透明膜层33密封所述第二金属层31的通孔311,能够有效保护设于通孔311内的填充层32。As shown in FIG. 1 , in this embodiment, the color conversion substrate 3 further includes a transparent film layer 33 disposed on a side of the second metal layer 31 away from the driving substrate 1 . The transparent film layer 33 includes polyimide (PI)/inorganic layer/polyimide (PI); the thickness of the transparent film layer 33 is 2-10um. The transparent film layer 33 seals the through hole 311 of the second metal layer 31 and can effectively protect the filling layer 32 disposed in the through hole 311 .
如图1所示,本实施例中,所述显示装置还包括:聚光层34,设于所述色转换基板3上;所述聚光层34包括多个聚光透镜341,所述聚光透镜341与所述通孔311一一对应设置。所述聚光透镜341能够将通过所述通孔311射出的光线聚集射出,避免散射混光。As shown in FIG. 1 , in this embodiment, the display device further includes: a condensing layer 34 disposed on the color conversion substrate 3 ; the condensing layer 34 includes a plurality of condensing lenses 341 , the condensing The optical lenses 341 are provided in one-to-one correspondence with the through holes 311 . The condensing lens 341 can condense and output the light emitted through the through hole 311 to avoid scattering and mixing light.
本申请优选多个聚光透镜341单独设置,在其他实施例中也可将多个聚光透镜341设置在透明基板33上形成所述聚光层34,所述聚光透镜341设于所述透明膜层33上,所述透明膜层33能够承载聚光透镜341设置在所述通孔311上方。The present application preferably sets multiple condenser lenses 341 separately. In other embodiments, multiple condenser lenses 341 can also be arranged on the transparent substrate 33 to form the light condenser layer 34, and the condenser lenses 341 are arranged on the On the transparent film layer 33 , the transparent film layer 33 can carry a condenser lens 341 disposed above the through hole 311 .
基于前文所述的显示装置100,如图2所示,本申请还提供一种显示装置的制作方法,包括以下步骤S1-S3。Based on the display device 100 described above, as shown in FIG. 2 , the present application further provides a method for manufacturing a display device, including the following steps S1-S3.
S1、在一驱动基板1上制作发光组件层2。将多个发光芯片单元21转移并键合在所述驱动基板1上,各所述发光芯片单元21具有顶出光面211;在所述驱动基板1上制作一平坦层23填充于所述发光芯片单元21之间;在所述平坦层23上制作一透明电极层24,所述透明电极层24与所述发光芯片单元21电性连接;在所述透明电极层24上制作一第一金属层22,所述第一金属层22环绕所述发光芯片单元21设置。所述驱动基板1包括硅基板11以及设于所述硅基板11上的互补金属氧化物半导体层(CMOS)12。硅基板11为载体,互补金属氧化物半导体层12为驱动发光芯片单元21的电路层,能够有效控制发光芯片单元21的发光和关闭。制作完成发光组件层2后的结构见图3所示。S1. Fabricate a light-emitting component layer 2 on a driving substrate 1 . Transfer and bond a plurality of light-emitting chip units 21 on the driving substrate 1, each of the light-emitting chip units 21 has a light emitting surface 211; a flat layer 23 is formed on the driving substrate 1 to fill the light-emitting chips Between the units 21; a transparent electrode layer 24 is made on the flat layer 23, and the transparent electrode layer 24 is electrically connected to the light-emitting chip unit 21; a first metal layer is made on the transparent electrode layer 24 22 , the first metal layer 22 is disposed around the light emitting chip unit 21 . The driving substrate 1 includes a silicon substrate 11 and a complementary metal oxide semiconductor (CMOS) layer 12 disposed on the silicon substrate 11 . The silicon substrate 11 is a carrier, and the CMOS layer 12 is a circuit layer for driving the light-emitting chip unit 21 , which can effectively control the light-emitting and off of the light-emitting chip unit 21 . The structure after the light-emitting component layer 2 is fabricated is shown in FIG. 3 .
S2、制作一色转换基板3。所述色转换基板3包括透明膜层33、第二金属层31以及填充层32,所述第二金属层31在对应所述发光芯片单元21的顶出光面211位置设有通孔311,所述填充层32设于所述通孔311中。在制作色转换基板3步骤中具体包括:制作一第二金属层31,在所述第二金属层31上蚀刻形成通孔311,在所述通孔311内制作填充层32。S2. Fabricate a one-color conversion substrate 3 . The color conversion substrate 3 includes a transparent film layer 33, a second metal layer 31 and a filling layer 32. The second metal layer 31 is provided with a through hole 311 at a position corresponding to the light-emitting surface 211 of the light-emitting chip unit 21, so The filling layer 32 is disposed in the through hole 311 . The step of making the color conversion substrate 3 specifically includes: making a second metal layer 31 , etching a through hole 311 on the second metal layer 31 , and making a filling layer 32 in the through hole 311 .
本实施例中,所述色转换基板3还包括透明膜层33,所述透明膜层33设于所述第二金属层31的一侧;制作色转换基板3步骤中具体包括:在一承载基板36上制作透明膜层33;在所述透明膜层33上制作第二金属层31,在所述第二金属层31上蚀刻形成通孔311,在所述通孔311内制作填充层32。In this embodiment, the color conversion substrate 3 further includes a transparent film layer 33, and the transparent film layer 33 is provided on one side of the second metal layer 31; the step of manufacturing the color conversion substrate 3 specifically includes: Making a transparent film layer 33 on the substrate 36; making a second metal layer 31 on the transparent film layer 33, etching a through hole 311 on the second metal layer 31, and making a filling layer 32 in the through hole 311 .
在本实施例中,所述色转换基板3还包括蓝光反光层35,蓝光反光层35设置在通孔311内,且位于透明膜层33与填充层32之间,其中相邻的三个通孔311为一组通孔单元,每组通孔单元中两个通孔311内设置蓝光反光层35,制作色转换基板3步骤中具体包括:在所述通孔311内制作蓝光反光层35及填充层32。制作完成色转换基板3后的结构见图4所示。In this embodiment, the color conversion substrate 3 further includes a blue light reflective layer 35, the blue light reflective layer 35 is arranged in the through hole 311, and is located between the transparent film layer 33 and the filling layer 32, wherein the three adjacent through holes The hole 311 is a group of through hole units, and the blue light reflective layer 35 is arranged in the two through holes 311 in each group of through hole units. The step 3 of making the color conversion substrate specifically includes: making the blue light reflective layer 35 and fill layer 32 . The structure after the color conversion substrate 3 is fabricated is shown in FIG. 4 .
S3、将色转换基板3贴合至发光组件层2上。所述第二金属层31的通孔311与所述发光芯片单元21对应设置,并通过低温焊接第三金属层4方式密封连接所述第一金属层22和所述第二金属层31。完成低温焊接第三金属层4后的结构见图5所示。S3 , attaching the color conversion substrate 3 to the light emitting component layer 2 . The through hole 311 of the second metal layer 31 is arranged corresponding to the light-emitting chip unit 21 , and is sealed and connected to the first metal layer 22 and the second metal layer 31 by low-temperature soldering of the third metal layer 4 . The structure after low-temperature welding of the third metal layer 4 is shown in FIG. 5 .
其中,在将色转换基板3贴合至发光组件层2上还包括:将所述承载基板36从所述透明膜层33上剥离;以及在所述透明膜层33上制作聚光层34,所述聚光层34包括多个聚光透镜341,所述聚光透镜341与所述通孔311一一对应设置。图6为将所述承载基板36从所述透明膜层33上剥离时的结构示意图。图1为制作完成聚光层34后的显示装置的整体结构示意图。Wherein, attaching the color conversion substrate 3 to the light-emitting component layer 2 further includes: peeling the carrier substrate 36 from the transparent film layer 33; and making a light-gathering layer 34 on the transparent film layer 33, The condensing layer 34 includes a plurality of condensing lenses 341 , and the condensing lenses 341 are arranged in one-to-one correspondence with the through holes 311 . FIG. 6 is a schematic diagram of the structure when the carrier substrate 36 is peeled off from the transparent film layer 33 . FIG. 1 is a schematic diagram of the overall structure of the display device after the light-gathering layer 34 is manufactured.
需要说明的是,本申请实施例中,在驱动基板1上制作发光组件层2和制作色转换基板3的制备顺序没有先后之分,即,可以同时进行在驱动基板1上制作发光组件层2和制作色转换基板3的制备工艺,也可以先在驱动基板1上制作发光组件层2然后制作色转换基板3,或者也可以先色转换基板3然后在驱动基板1上制作发光组件层2。It should be noted that, in the embodiment of the present application, there is no sequence in the preparation of the light-emitting component layer 2 and the color conversion substrate 3 on the driving substrate 1, that is, the light-emitting component layer 2 can be fabricated on the driving substrate 1 at the same time. As for the manufacturing process of the color conversion substrate 3, the light-emitting component layer 2 can also be fabricated on the driving substrate 1 first and then the color conversion substrate 3, or the color conversion substrate 3 can be produced first and then the light-emitting component layer 2 can be fabricated on the driving substrate 1.
本申请实施例在色转换基板3中采用第二金属层31替换现有的黑色挡墙,能够反射光线而不是吸收光线,增加了出光率,并且采用低温焊接方式通过第三金属层4连接环绕发光芯片单元21设置的第一金属层22和所述第二金属层31,使得金属层密封发光芯片单元21以及填充层32,避免水汽进入,增加了使用寿命。并且还进一步设置在第二金属层31的通孔311内的填充层32包括红光色转换层321和绿光色转换层322,能够再次利用反射光线,增加了出光率。进一步在所述通孔311内还设有对应所述红光色转换层321和所述绿光色转换层322设置的蓝光反光层35,所述蓝光反光层35能反射光线至所述红光色转换层321和所述绿光色转换层322,提升了光转换率和利用率,提升了显示装置的发光亮度。In the embodiment of the present application, the second metal layer 31 is used in the color conversion substrate 3 to replace the existing black barrier, which can reflect light instead of absorb light, increase the light output rate, and use low-temperature welding to connect the surrounding through the third metal layer 4 The first metal layer 22 and the second metal layer 31 provided on the light-emitting chip unit 21 make the metal layer seal the light-emitting chip unit 21 and the filling layer 32 to prevent water vapor from entering and increase the service life. Furthermore, the filling layer 32 disposed in the through hole 311 of the second metal layer 31 includes a red light color conversion layer 321 and a green light color conversion layer 322 , which can reuse reflected light and increase the light extraction rate. Further, a blue light reflective layer 35 corresponding to the red light color conversion layer 321 and the green light color conversion layer 322 is provided in the through hole 311, and the blue light reflective layer 35 can reflect light to the red light The color conversion layer 321 and the green light color conversion layer 322 improve the light conversion rate and utilization rate, and improve the luminous brightness of the display device.
实施例2Example 2
如图7所示,本申请实施例2包含了实施例1的大部分技术特征,其区别在于,在实施例2中的所述发光芯片单元21包括的MicroLED芯片中,包括红色MicroLED芯片R、绿色MicroLED芯片G以及蓝色MicroLED芯片B至少其中之一;所述填充层32包括滤光层(CF),所述滤光层包括红色滤光层32R、绿色滤光层32G以及蓝色滤光层32B至少其中之一。具体为红色滤光层32   R对应红色MicroLED芯片R设置,绿色滤光层32G对应绿色MicroLED芯片G设置,蓝色滤光层32B对应蓝色MicroLED芯片B设置。As shown in FIG. 7 , Embodiment 2 of the present application includes most of the technical features of Embodiment 1. The difference is that the MicroLED chips included in the light-emitting chip unit 21 in Embodiment 2 include red MicroLED chips R, At least one of the green MicroLED chip G and the blue MicroLED chip B; the filling layer 32 includes a filter layer (CF), and the filter layer includes a red filter layer 32R, a green filter layer 32G and a blue filter layer At least one of layers 32B. Specifically, the red filter layer 32R is set corresponding to the red MicroLED chip R, the green filter layer 32G is set corresponding to the green MicroLED chip G, and the blue filter layer 32B is set corresponding to the blue MicroLED chip B.
实施例2不同于实施例1中的所述发光芯片单元21均是蓝光MicroLED芯片212,同时在实施例2中不设置实施例1中的蓝光反光层,这样同样能够在色转换基板3中采用第二金属层31替换现有的黑色挡墙,能够反射光线而不是吸收光线,增加了出光率。并且在第二金属层31的通孔311内形成填充层32,所述填充层32包括红色滤光层32R、绿色滤光层32G以及蓝色滤光层32B,第二金属层31可阻隔水汽横向传输至填充层32,提升了填充层32的可靠性。并且采用低温焊接方式通过第三金属层4连接环绕发光芯片单元21设置的第一金属层22和所述第二金属层31,使得金属层密封发光芯片单元21以及填充层32,避免水汽进入,增加了使用寿命。Embodiment 2 is different from that in Embodiment 1 in that the light-emitting chip unit 21 is a blue-light MicroLED chip 212. At the same time, the blue-light reflective layer in Embodiment 1 is not provided in Embodiment 2, so that it can also be used in the color conversion substrate 3. The second metal layer 31 replaces the existing black barrier, which can reflect light instead of absorbing light, thereby increasing the light extraction rate. And a filling layer 32 is formed in the through hole 311 of the second metal layer 31, the filling layer 32 includes a red filter layer 32R, a green filter layer 32G and a blue filter layer 32B, and the second metal layer 31 can block water vapor The lateral transmission to the filling layer 32 improves the reliability of the filling layer 32 . And the first metal layer 22 and the second metal layer 31 arranged around the light-emitting chip unit 21 are connected through the third metal layer 4 by low-temperature welding, so that the metal layer seals the light-emitting chip unit 21 and the filling layer 32 to prevent water vapor from entering. Increased service life.
基于前文所述的显示装置100,实施例2中对应的显示装置的制作方法请参考实施例1中的图2,其步骤顺序与实施例1相同,其差异仅是在驱动基板1上制作的发光组件层2中的发光芯片单元21以及在所述第二金属层31的通孔311内制作的填充层32采用实施例2的结构。实施例2中的显示装置的制作方法具体包括以下步骤S1-S3。Based on the display device 100 described above, please refer to FIG. 2 in Embodiment 1 for the manufacturing method of the corresponding display device in Embodiment 2. The sequence of steps is the same as that in Embodiment 1, and the difference is only that it is fabricated on the driving substrate 1. The light-emitting chip unit 21 in the light-emitting component layer 2 and the filling layer 32 formed in the through hole 311 of the second metal layer 31 adopt the structure of the second embodiment. The manufacturing method of the display device in Embodiment 2 specifically includes the following steps S1-S3.
S1、在一驱动基板1上制作发光组件层2,其为将多个发光芯片单元21转移并键合在所述驱动基板1上,各所述发光芯片单元21具有顶出光面211;在所述驱动基板1上制作一平坦层23填充于所述发光芯片单元21之间;在所述平坦层23上制作一透明电极层24,所述透明电极层24与所述发光芯片单元21电性连接;在所述透明电极层24上制作一第一金属层22,所述第一金属层22环绕所述发光芯片单元21设置。所述驱动基板1包括硅基板11以及设于所述硅基板11上的互补金属氧化物半导体层(CMOS)12。硅基板11为载体,互补金属氧化物半导体层12为驱动发光芯片单元21的电路层,能够有效控制发光芯片单元21的发光和关闭。其中所述发光芯片单元21包括红色MicroLED芯片R、绿色MicroLED芯片G以及蓝色MicroLED芯片B至少其中之一。S1. Fabricate a light-emitting component layer 2 on a driving substrate 1, which is to transfer and bond a plurality of light-emitting chip units 21 on the driving substrate 1, and each of the light-emitting chip units 21 has a light-emitting surface 211; A flat layer 23 is formed on the drive substrate 1 to fill between the light-emitting chip units 21; a transparent electrode layer 24 is formed on the flat layer 23, and the transparent electrode layer 24 is electrically connected to the light-emitting chip unit 21. Connection; making a first metal layer 22 on the transparent electrode layer 24 , and the first metal layer 22 is arranged around the light-emitting chip unit 21 . The driving substrate 1 includes a silicon substrate 11 and a complementary metal oxide semiconductor (CMOS) layer 12 disposed on the silicon substrate 11 . The silicon substrate 11 is a carrier, and the CMOS layer 12 is a circuit layer for driving the light-emitting chip unit 21 , which can effectively control the light-emitting and off of the light-emitting chip unit 21 . The light-emitting chip unit 21 includes at least one of a red MicroLED chip R, a green MicroLED chip G, and a blue MicroLED chip B.
S2、制作一色转换基板3,所述色转换基板3包括第二金属层31以及填充层32,所述第二金属层31在对应所述发光芯片单元21的顶出光面211位置设有通孔311,所述填充层32设于所述通孔311中。在制作色转换基板3步骤中具体包括:制作一第二金属层31,在所述第二金属层31上蚀刻形成通孔311,在所述通孔311内制作填充层32。S2. Fabricate a color conversion substrate 3, the color conversion substrate 3 includes a second metal layer 31 and a filling layer 32, and the second metal layer 31 is provided with a through hole corresponding to the light-emitting surface 211 of the light-emitting chip unit 21 311 , the filling layer 32 is disposed in the through hole 311 . The step of making the color conversion substrate 3 specifically includes: making a second metal layer 31 , etching a through hole 311 on the second metal layer 31 , and making a filling layer 32 in the through hole 311 .
本实施例中,所述色转换基板3还包括透明膜层33,所述透明膜层33设于所述第二金属层31的一侧;此时在制作色转换基板3步骤中具体包括:在一承载基板36上制作透明膜层33;在所述透明膜层33上制作第二金属层31,在所述第二金属层31上蚀刻形成通孔311,在所述通孔311内制作填充层32。所述填充层32包括滤光层(CF),所述滤光层包括红色滤光层32R、绿色滤光层32G以及蓝色滤光层32B至少其中之一。In this embodiment, the color conversion substrate 3 further includes a transparent film layer 33, and the transparent film layer 33 is provided on one side of the second metal layer 31; at this time, the step of manufacturing the color conversion substrate 3 specifically includes: Fabricate a transparent film layer 33 on a carrier substrate 36; fabricate a second metal layer 31 on the transparent film layer 33, etch and form a through hole 311 on the second metal layer 31, and fabricate in the through hole 311 fill layer 32 . The filling layer 32 includes a filter layer (CF), and the filter layer includes at least one of a red filter layer 32R, a green filter layer 32G and a blue filter layer 32B.
S3、将色转换基板3贴合至发光组件层2上,所述第二金属层31的通孔311与所述发光芯片单元21对应设置,具体为红色滤光层32R对应红色MicroLED芯片R设置,绿色滤光层32G对应绿色MicroLED芯片G设置,蓝色滤光层32B对应蓝色MicroLED芯片B设置。并通过低温焊接第三金属层4方式密封连接所述第一金属层22和所述第二金属层31。S3, attaching the color conversion substrate 3 to the light-emitting component layer 2, the through hole 311 of the second metal layer 31 is set corresponding to the light-emitting chip unit 21, specifically, the red filter layer 32R is set corresponding to the red MicroLED chip R , the green filter layer 32G is set corresponding to the green MicroLED chip G, and the blue filter layer 32B is set corresponding to the blue MicroLED chip B. The first metal layer 22 and the second metal layer 31 are hermetically connected by means of low-temperature welding of the third metal layer 4 .
其中,在将色转换基板3贴合至发光组件层2上后还包括:将所述承载基板36从所述透明膜层33上剥离;以及在所述透明膜层33上制作聚光层34,所述聚光层34包括多个聚光透镜341,所述聚光透镜341与所述通孔311一一对应设置。图6为将所述承载基板36从所述透明膜层33上剥离时的结构示意图。图1为制作完成聚光层34后的显示装置的整体结构示意图。Wherein, after attaching the color conversion substrate 3 to the light-emitting component layer 2, it also includes: peeling the carrier substrate 36 from the transparent film layer 33; , the light-condensing layer 34 includes a plurality of light-condensing lenses 341 , and the light-condensing lenses 341 are arranged in one-to-one correspondence with the through holes 311 . FIG. 6 is a schematic diagram of the structure when the carrier substrate 36 is peeled off from the transparent film layer 33 . FIG. 1 is a schematic diagram of the overall structure of the display device after the light-gathering layer 34 is manufactured.
需要说明的是,本申请实施例中,在驱动基板1上制作发光组件层2和制作色转换基板3的制备顺序没有先后之分,即,可以同时进行在驱动基板1上制作发光组件层2和制作色转换基板3的制备工艺,也可以先在驱动基板1上制作发光组件层2然后制作色转换基板3,或者也可以先色转换基板3然后在驱动基板1上制作发光组件层2。It should be noted that, in the embodiment of the present application, there is no sequence in the preparation of the light-emitting component layer 2 and the color conversion substrate 3 on the driving substrate 1, that is, the light-emitting component layer 2 can be fabricated on the driving substrate 1 at the same time. As for the manufacturing process of the color conversion substrate 3, the light-emitting component layer 2 can also be fabricated on the driving substrate 1 first and then the color conversion substrate 3, or the color conversion substrate 3 can be produced first and then the light-emitting component layer 2 can be fabricated on the driving substrate 1.
以上对本申请实施例所提供的一种显示装置及其制作方法进行了详细介绍,本文中应用了具体个例对本申请的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本申请的方法及其核心思想;同时,对于本领域的技术人员,依据本申请的思想,在具体实施方式及应用范围上均会有改变之处,综上所述,本说明书内容不应理解为对本申请的限制。The above is a detailed introduction of a display device provided by the embodiment of the present application and its manufacturing method. In this paper, specific examples are used to illustrate the principle and implementation of the present application. The description of the above embodiment is only to help understand the present application. The method of application and its core idea; at the same time, for those skilled in the art, according to the idea of this application, there will be changes in the specific implementation and scope of application. In summary, the content of this specification should not be understood as Limitations on this Application.

Claims (13)

  1. 一种显示装置,其特征在于,包括:A display device, characterized in that it comprises:
    驱动基板;drive substrate;
    发光组件层,包括设于所述驱动基板上的多个发光芯片单元以及环绕所述发光芯片单元设置的第一金属层;各所述发光芯片单元具有顶出光面;The light-emitting component layer includes a plurality of light-emitting chip units arranged on the driving substrate and a first metal layer arranged around the light-emitting chip units; each of the light-emitting chip units has a light-emitting surface;
    色转换基板,包括第二金属层以及填充层,所述第二金属层在对应所述发光芯片单元的顶出光面位置设有通孔,所述填充层设于所述通孔中;以及The color conversion substrate includes a second metal layer and a filling layer, the second metal layer is provided with a through hole at the position corresponding to the light emitting surface of the light-emitting chip unit, and the filling layer is set in the through hole; and
    第三金属层,与所述第一金属层对应设置,用于密封连接所述第一金属层和所述第二金属层。The third metal layer is arranged corresponding to the first metal layer, and is used for sealing and connecting the first metal layer and the second metal layer.
  2. 根据权利要求1所述的显示装置,其特征在于,所述第三金属层通过低温焊接方式连接所述第一金属层和所述第二金属层。The display device according to claim 1, wherein the third metal layer is connected to the first metal layer and the second metal layer by low temperature welding.
  3. 根据权利要求1所述的显示装置,其特征在于,所述发光组件层还包括:The display device according to claim 1, wherein the light-emitting component layer further comprises:
    平坦层,设于所述驱动基板上并填充于所述发光芯片单元之间;以及a flat layer disposed on the driving substrate and filled between the light-emitting chip units; and
    透明电极层,所述透明电极层覆盖于所述平坦层上并与所述发光芯片单元电性连接;所述第一金属层设于所述透明电极层上,或者所述第一金属层与所述透明电极层设于同一层。A transparent electrode layer, the transparent electrode layer covers the flat layer and is electrically connected to the light-emitting chip unit; the first metal layer is arranged on the transparent electrode layer, or the first metal layer is connected to the transparent electrode layer The transparent electrode layers are arranged on the same layer.
  4. 根据权利要求3所述的显示装置,其特征在于,所述发光组件层还包括:The display device according to claim 3, wherein the light-emitting component layer further comprises:
    反射层,设于所述发光芯片单元的侧壁上,或者设于所述发光芯片单元的侧壁上和所述发光芯片单元的顶面上的非顶出光面区域。The reflective layer is arranged on the sidewall of the light emitting chip unit, or on the sidewall of the light emitting chip unit and the non-ejecting light surface area on the top surface of the light emitting chip unit.
  5. 根据权利要求1所述的显示装置,其特征在于,所述发光芯片单元包括三个蓝光MicroLED芯片,所述填充层包括红光色转换层和绿光色转换层;在一个发光芯片单元对应的三个通孔的其中两个通孔内设有一个红光色转换层和一个绿光色转换层。The display device according to claim 1, wherein the light-emitting chip unit includes three blue MicroLED chips, and the filling layer includes a red light color conversion layer and a green light color conversion layer; A red light color conversion layer and a green light color conversion layer are arranged in two of the three through holes.
  6. 根据权利要求5所述的显示装置,其特征在于,所述色转换基板还包括蓝光反光层,设于所述通孔内且对应于所述红光色转换层和所述绿光色转换层的位置设置。The display device according to claim 5, wherein the color conversion substrate further includes a blue light reflective layer disposed in the through hole and corresponding to the red light color conversion layer and the green light color conversion layer location settings.
  7. 根据权利要求6所述的显示装置,其特征在于,所述蓝光反光层由金属膜/透明介质膜/金属膜三层膜构成,或者所述蓝光反光层由金属膜/透明介质膜/金属膜/透明介质膜/金属膜五层膜构成。The display device according to claim 6, wherein the blue light reflective layer is composed of a metal film/transparent dielectric film/metal film three-layer film, or the blue light reflective layer is composed of a metal film/transparent dielectric film/metal film /transparent dielectric film/metal film composed of five layers of film.
  8. 根据权利要求1所述的显示装置,其特征在于,还包括:The display device according to claim 1, further comprising:
    聚光层,设于所述色转换基板上;所述聚光层包括多个聚光透镜,所述聚光透镜与所述通孔一一对应设置。The light-gathering layer is arranged on the color conversion substrate; the light-gathering layer includes a plurality of light-gathering lenses, and the light-gathering lenses are arranged in one-to-one correspondence with the through holes.
  9. 根据权利要求8所述的显示装置,其特征在于,所述色转换基板还包括透明膜层,设于所述第二金属层背离所述驱动基板的一侧;所述聚光透镜设于所述透明膜层背离所述第二金属层一侧。The display device according to claim 8, wherein the color conversion substrate further includes a transparent film layer disposed on the side of the second metal layer away from the driving substrate; the condenser lens is disposed on the The side of the transparent film layer away from the second metal layer.
  10. 根据权利要求1所述的显示装置,其特征在于,所述发光芯片单元包括红色MicroLED芯片、绿色MicroLED芯片以及蓝色MicroLED芯片;所述填充层包括滤光层,所述滤光层包括红色滤光层、绿色滤光层以及蓝色滤光层;所述红色滤光层对应所述红色MicroLED芯片设置,所述绿色滤光层对应所述绿色MicroLED芯片设置,是蓝色滤光层对应所述蓝色MicroLED芯片设置。The display device according to claim 1, wherein the light-emitting chip unit includes a red MicroLED chip, a green MicroLED chip, and a blue MicroLED chip; the filling layer includes a filter layer, and the filter layer includes a red filter optical layer, green filter layer, and blue filter layer; the red filter layer is set corresponding to the red MicroLED chip, the green filter layer is set corresponding to the green MicroLED chip, and the blue filter layer is set corresponding to the The blue MicroLED chip setup is described above.
  11. 一种显示装置的制作方法,其特征在于,包括步骤:A method for manufacturing a display device, comprising the steps of:
    在一驱动基板上制作发光组件层,其为将多个发光芯片单元转移并键合在所述驱动基板上,各所述发光芯片单元具有顶出光面,在所述驱动基板上制作一平坦层填充于所述发光芯片单元之间;在所述平坦层上制作一透明电极层,所述透明电极层与所述发光芯片单元电性连接;在所述透明电极层上制作一第一金属层,所述第一金属层环绕所述发光芯片单元设置;Fabricate a light-emitting component layer on a driving substrate, which is to transfer and bond a plurality of light-emitting chip units on the driving substrate, each of the light-emitting chip units has a light-emitting surface, and fabricate a flat layer on the driving substrate Filling between the light-emitting chip units; forming a transparent electrode layer on the flat layer, the transparent electrode layer is electrically connected to the light-emitting chip unit; forming a first metal layer on the transparent electrode layer , the first metal layer is disposed around the light-emitting chip unit;
    制作一色转换基板,所述色转换基板包括第二金属层以及填充层,所述第二金属层在对应所述发光芯片单元的顶出光面位置设有通孔,所述填充层设于所述通孔中;以及Fabricate a color conversion substrate, the color conversion substrate includes a second metal layer and a filling layer, the second metal layer is provided with a through hole at the position corresponding to the light emitting surface of the light-emitting chip unit, and the filling layer is provided on the in the through hole; and
    将色转换基板贴合至发光组件层上,所述第二金属层的通孔与所述发光芯片单元对应设置,并通过低温焊接第三金属层方式密封连接所述第一金属层和所述第二金属层。The color conversion substrate is bonded to the light-emitting component layer, the through hole of the second metal layer is set corresponding to the light-emitting chip unit, and the first metal layer and the first metal layer are sealed and connected by low-temperature welding of the third metal layer. second metal layer.
  12. 根据权利要求11所述的显示装置的制作方法,其特征在于,所述色转换基板还包括透明膜层,所述透明膜层设于所述第二金属层的一侧;在制作色转换基板步骤中具体包括:在一承载基板上制作透明膜层;在所述透明膜层上制作第二金属层,在所述第二金属层上蚀刻形成通孔,在所述通孔内制作填充层。The method for manufacturing a display device according to claim 11, wherein the color conversion substrate further includes a transparent film layer, and the transparent film layer is provided on one side of the second metal layer; The steps specifically include: making a transparent film layer on a carrier substrate; making a second metal layer on the transparent film layer, etching a through hole on the second metal layer, and making a filling layer in the through hole .
  13. 根据权利要求12所述的显示装置的制作方法,其特征在于,在将色转换基板贴合至发光组件层上后还包括:The method for manufacturing a display device according to claim 12, further comprising: after attaching the color conversion substrate to the light-emitting component layer:
    将所述承载基板从所述透明膜层上剥离;以及peeling off the carrier substrate from the transparent film layer; and
    在所述透明膜层上制作聚光层,所述聚光层包括多个聚光透镜,所述聚光透镜与所述通孔一一对应设置。A light concentrating layer is fabricated on the transparent film layer, the light concentrating layer includes a plurality of concentrating lenses, and the concentrating lenses are arranged in one-to-one correspondence with the through holes.
PCT/CN2021/141872 2021-12-28 2021-12-28 Display device and manufacturing method therefor WO2023122925A1 (en)

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