WO2023108451A1 - Light-emitting device and transfer apparatus - Google Patents

Light-emitting device and transfer apparatus Download PDF

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Publication number
WO2023108451A1
WO2023108451A1 PCT/CN2021/138164 CN2021138164W WO2023108451A1 WO 2023108451 A1 WO2023108451 A1 WO 2023108451A1 CN 2021138164 W CN2021138164 W CN 2021138164W WO 2023108451 A1 WO2023108451 A1 WO 2023108451A1
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WO
WIPO (PCT)
Prior art keywords
light
layer
electrode
type semiconductor
emitting
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PCT/CN2021/138164
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French (fr)
Chinese (zh)
Inventor
樊勇
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厦门市芯颖显示科技有限公司
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Priority to PCT/CN2021/138164 priority Critical patent/WO2023108451A1/en
Publication of WO2023108451A1 publication Critical patent/WO2023108451A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/44Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
    • H01L33/46Reflective coating, e.g. dielectric Bragg reflector

Definitions

  • the present application relates to the field of display technology, in particular to a light emitting device and a transfer device.
  • Micro LED (miniature light-emitting diode) display technology refers to a display technology that uses self-luminous micron-scale LEDs as light-emitting pixel units and assembles them on the drive panel to form a high-density LED array. Due to the characteristics of small size, high integration and self-illumination of micro LED chips, compared with LCD and OLED in terms of display, it has greater brightness, resolution, contrast, energy consumption, service life, response speed and thermal stability. advantages, so it is often used as a light emitting device in various places.
  • the existing Micro LED has a large luminous angle and cannot achieve narrow luminescence. Therefore, when it is used in AR (augmented reality, augmented reality), MR (mixed reality, mixed reality) Micro-LED display panels, high-brightness vehicles and micro-device transfer For applications such as devices that require narrow light sources, the existing Micro LEDs are difficult to meet their needs.
  • AR augmented reality, augmented reality
  • MR mixed reality, mixed reality
  • embodiments of the present application provide a light emitting device and a transfer device using the light emitting device.
  • a light-emitting device proposed by an embodiment of the present application includes, for example: a light-emitting functional layer provided with a light-emitting surface; a first electrode provided on one side of the light-emitting functional layer and electrically connected to the light-emitting functional layer; Two electrodes, arranged on the same side of the light-emitting functional layer as the first electrode and electrically connected to the light-emitting functional layer respectively; a light-shielding layer covering the light-emitting surface, and a light-emitting port is arranged on the light-shielding layer In order to expose the light emitted by the light emitting functional layer, the area of the light outlet is smaller than the area of the light outlet surface.
  • a light-shielding layer with a light outlet is provided on the light outlet surface, so that the area of the light outlet is smaller than the area of the light outlet, thereby realizing narrow light emission of the light emitting device.
  • the light-emitting functional layer includes: a first doping type semiconductor layer electrically connected to the first electrode; a second doping type semiconductor layer electrically connected to the second electrode;
  • a buffer layer located on a side of the second doping type semiconductor layer away from the second electrode; wherein the light exit surface is located on a side of the buffer layer away from the second doping type semiconductor layer, the The first electrode is located on a side of the first doping type semiconductor layer away from the active layer, and the second electrode is located on a side of the second doping type semiconductor layer away from the buffer layer.
  • the light-emitting functional layer includes: a first doping type semiconductor layer, connected to the first electrode; a second doping type semiconductor layer, connected to the second electrode; an active layer, Set between the first doping type semiconductor layer and the second doping type semiconductor; a buffer layer, located on the side of the second doping type semiconductor layer away from the second electrode; wherein the light emitting The surface and the first electrode are located on the side of the first doping type semiconductor layer away from the active layer, and the first electrode penetrates through the light shielding layer and is connected to the first doping type semiconductor layer, so The second electrode is located on a side of the second doping type semiconductor layer away from the buffer layer.
  • the light-shielding layer also covers other surfaces on the light-emitting functional layer except the light-emitting surface, and the first electrode and the second electrode respectively penetrate through the light-shielding layer .
  • the light-shielding layer includes an insulating layer and a metal layer, and the metal layer is located on a side of the insulating layer away from the light-emitting functional layer.
  • the light-shielding layer is a distributed Bragg mirror.
  • the light emitting device further includes a condenser lens, and the condenser lens is arranged at the light outlet and covers the light outlet.
  • the light outlet includes a plurality of sub-light outlets with hollow patterns.
  • a transfer device proposed in the embodiments of the present application includes, for example: a transfer substrate; a driving device layer disposed on the transfer substrate; a light emitting device as described in any one of the preceding embodiments, disposed on the transfer substrate; The side of the driving device layer away from the transfer substrate and electrically connected to the driving device layer; the first adhesive colloid layer is arranged on the side of the driving device layer away from the transfer substrate.
  • the transfer device further includes: a second adhesive colloid layer, pasted on the side of the driving substrate away from the transfer substrate and covering the light emitting device; an adhesive substrate, arranged on Between the first adhesive colloid layer and the second adhesive colloid layer.
  • an adhesive protrusion is disposed on a side of the first adhesive gel layer away from the driving substrate, and the adhesive protrusion is disposed corresponding to the light emitting device.
  • a light-shielding layer with a light outlet is provided on the light outlet surface, so that the area of the light outlet is smaller than the area of the light outlet surface, thereby realizing the light emitting device. narrow light.
  • a light-shielding layer is arranged on other surfaces of the light-emitting device to reduce side light output of the light-emitting device.
  • the light-shielding layer is set as an insulating layer and a metal layer or a structure of a distributed Bragg reflector, which increases the reflection of light on multiple sides and the resonance in the reflection cavity, thereby improving the utilization rate of light.
  • a condenser lens is arranged at the light outlet, which further narrows the light outlet angle of the light emitting device and improves the brightness of the light emitting device. Furthermore, by setting a plurality of light outlets with hollow patterns, the light angle is further narrowed, and a light emitting device with narrow light emission is provided.
  • the transfer device provided by the embodiment of the present application, by disposing the light-emitting device capable of realizing narrow light emission on the transfer device, it solves the problems caused by the large light emission angle of the light-emitting device and the side light emission in the transfer device to adjacent areas. In order to realize the debonding of the precise position, improve the transfer yield and transfer reliability of micro devices.
  • Fig. 1 is a schematic structural diagram of a light emitting device provided in the first embodiment of the present application.
  • Fig. 2 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
  • Fig. 3 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
  • Fig. 4 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
  • FIG. 5 is a schematic structural diagram of a light-emitting surface in the first embodiment of the present application.
  • FIG. 6 is a schematic structural diagram of another light-emitting surface in the first embodiment of the present application.
  • Fig. 7 is a schematic structural diagram of a light emitting device provided in the second embodiment of the present application.
  • Fig. 8 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
  • FIG. 9 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
  • Fig. 10 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
  • Fig. 11 is a schematic structural diagram of a transfer device provided in the third embodiment of the present application.
  • FIG. 12 is a schematic structural diagram of another transfer device provided in the third embodiment of the present application.
  • FIG. 13 is a schematic structural diagram of another transfer device provided in the third embodiment of the present application.
  • Fig. 14 is a schematic structural diagram of another light emitting device transfer device provided in the third embodiment of the present application.
  • the first embodiment of the present application provides a light-emitting device 10 , which includes, for example, a light-emitting functional layer 11 , a first electrode 12 , a second electrode 13 and a light-shielding layer 14 .
  • the light-emitting functional layer 11 can, for example, emit light of various colors such as infrared light, ultraviolet light, and blue light.
  • the light-emitting functional layer 11 is provided with a light-emitting surface 1101 , so that the light emitted by the light-emitting functional layer 11 can pass through the light-emitting surface 1101 and be emitted to the external environment.
  • the first electrode 12 is, for example, disposed on one side of the light emitting functional layer 11 and electrically connected to the light emitting functional layer 11 .
  • the second electrode 13 is disposed on the same side as the first electrode 12 on the light emitting functional layer 11 and is electrically connected to the light emitting functional layer respectively.
  • the first electrode 12 and the second electrode 13 are located on the same side of the light-emitting functional layer 11 , and are electrically connected to the light-emitting functional layer 11 at both ends of the light-emitting functional layer 11 .
  • the light-shielding layer 14 covers, for example, the light-emitting surface 1101 .
  • a light outlet 141 is provided on the light-shielding layer 14 to expose the light emitted by the light-emitting functional layer 11 .
  • the area of the light exit 141 is smaller than the area of the light exit surface 1101 .
  • a light-shielding layer with a light exit hole is provided on the light exit surface, so that the area of the light exit opening is smaller than the area of the light exit surface, and the narrow light exit of the light emitting device is realized.
  • the light emitting functional layer 11 includes, for example, a first doping type semiconductor layer 111 , a second doping type semiconductor layer 113 , an active layer 112 and a buffer layer 114 .
  • the light emitting surface 1101 is located on the side of the buffer layer 114 away from the second doped type semiconductor layer 113 , and the light emitted from the active layer 112 sequentially passes through the second doped type semiconductor layer 113 and the buffer layer 114 to emerge from the light emitting surface 1101 .
  • the first doping type semiconductor layer 111 is, for example, an N-type GaN (gallium nitride, gallium nitride) layer, and the first electrode 12 electrically connected to the first doping type semiconductor layer 111 is, for example, an N-type electrode.
  • the second doping type semiconductor layer 113 is, for example, a P-type GaN layer, and the second electrode 13 electrically connected to the second doping type semiconductor layer 113 is, for example, a P-type electrode. It can be understood that the materials of the first doping type semiconductor layer 111 and the second doping type semiconductor layer 113 can be interchanged, and similarly, the positions of the first electrode 12 and the second electrode 13 can also be interchanged.
  • the active layer 112 is disposed between the first doping type semiconductor layer 111 and the second doping type semiconductor layer 113 .
  • the active layer 112 is, for example, an InGaN (indium gallium nitride), GaN, AlGaAs (aluminum gallium arsenide) multi-quantum well layer, which can emit infrared light, ultraviolet light, blue light and other light. It can be understood that the material of the active layer 112 can also be other inorganic semiconductor materials to emit light of different colors, and the present application is not limited thereto.
  • the buffer layer 114 is, for example, disposed on a side of the second doping type semiconductor layer 113 away from the second electrode 13 .
  • the composition material of the buffer layer 114 includes, for example, one of aluminum nitride and gallium nitride. Depending on the growth substrate of the buffer layer 114 or the material of the active layer 112 , the buffer layer 114 may also be doped with other materials such as aluminum. This application is not limited thereto.
  • the buffer layer 114 can flatten the bottom layer of the light emitting device, thereby providing a good growth substrate for multiple layer structures disposed on the buffer layer 114 .
  • the light-emitting device 10 provided by the present application can also add other functional layers according to actual needs, such as unintentionally doped gallium nitride layer (u-GaN), located between the N-type semiconductor layer and the multi-quantum well layer
  • u-GaN unintentionally doped gallium nitride layer
  • EBL Electron Blocking Layer
  • the light-shielding layer 14 also covers other surfaces of the light-emitting functional layer 11 except the light-emitting surface 1101 .
  • the first electrode 12 and the second electrode 13 respectively penetrate through the light-shielding layer 14 for realizing electrical conduction with the external power supply.
  • the above technical solution further reduces side light emission of the light emitting device by covering multiple sides of the light emitting device with light-shielding layers.
  • the light shielding layer 14 is, for example, a highly reflective metal coating.
  • the highly reflective metal coating includes an insulating layer 141 and a metal layer 142 .
  • the metal layer 142 is located on a side of the insulating layer 141 away from the light-emitting functional layer 11 , that is, the metal layer 142 is disposed between the insulating layer 141 and the light-emitting functional layer 11 .
  • the material of the insulating layer 141 is, for example, a material with good insulating properties such as silicon oxide.
  • the metal layer 142 is, for example, aluminum, silver, gold and other metal materials with good reflective properties, and the present application is not limited thereto.
  • the insulating layer 141 is arranged on the light-emitting surface 1101 and multiple surfaces of the light-emitting functional layer 11 except the light-emitting surface 1101, which can isolate the contact between the metal layer 142 and the light-emitting functional layer 11 and play a protective role. In addition, the insulating layer 141 can also prevent light emission.
  • the combination of holes and electrons in the first doping type semiconductor layer 111 and the second doping type semiconductor layer 113 on multiple sides of the device 10 produces ineffective luminescence.
  • the above technical proposal can reflect the light emitted by the light-emitting device by arranging the metal layer on the side of the insulating layer away from the light-emitting functional layer, thereby improving the utilization rate of light.
  • a highly reflective metal coating is provided on the side where the first electrode and the second electrode are located, which improves the utilization of light and the resonance in the reflective cavity, and is conducive to reducing the light output angle, so as to meet the needs of narrow and high light output. Show application scenarios.
  • the light-shielding layer 14 may also be a distributed Bragg reflector (Distributed Bragg Reflector, DBR).
  • the distributed Bragg reflector is a structure formed by periodic arrangement of various inorganic materials with different refractive indices. Referring to FIG. 4 , it shows a distributed Bragg reflector formed by two different inorganic materials arranged at intervals.
  • the above technical solution not only shields multiple sides of the light emitting device from light by setting the light shielding layer as a distributed Bragg reflector, but also improves light reflection, thus improving the utilization rate of light.
  • the light emitting device 10 further includes a condenser lens 10 .
  • the condenser lens 10 is, for example, disposed at the light outlet 141 and covers the light outlet 141 . Wherein, the light emitting angle of the light emitting device is further reduced by setting the condenser lens, and the light emitting brightness of the light emitting device is improved.
  • the light-shielding layer 14 covers, for example, the light-emitting surface 1101 , so that the light-emitting surface 1101 is composed of the light-emitting opening 141 and the light-shielding layer 14 .
  • the light-shielding layer covering the light-emitting surface 1101 is, for example, provided with a plurality of hollow patterns. Therefore, as shown in FIG. 6 , the light outlet 141 includes, for example, a plurality of sub-light outlets 1411 with hollow patterns.
  • the plurality of sub-light outlets 1411 may, for example, be provided with corresponding condenser lenses, so as to further narrow the light-emitting angle and improve brightness.
  • the shape of the hollow pattern may be square, circular, triangular or other geometric patterns, which is not limited in the present application.
  • the first embodiment of the present application has the following beneficial effects: by providing a light-shielding layer with a light outlet on the light outlet surface, the area of the light outlet is smaller than the area of the light outlet surface, thereby realizing narrow light output of the light emitting device.
  • a light-shielding layer is arranged on other surfaces of the light-emitting device to reduce side light output of the light-emitting device.
  • the light-shielding layer is set as an insulating layer and a metal layer or a structure of a distributed Bragg reflector, which increases the reflection of light on multiple sides and the resonance in the reflection cavity, thereby improving the utilization rate of light.
  • a condenser lens is arranged at the light outlet, which further narrows the light outlet angle of the light-emitting device and improves the brightness of the light-emitting device. Furthermore, by setting a plurality of light outlets with hollow patterns, the light angle is further narrowed, and a light emitting device with narrow light emission is provided.
  • a light-emitting device 20 provided in the second embodiment of the present application includes, for example, a first electrode 22 , a second electrode 23 , a light-shielding layer 24 , and a light-emitting functional layer (not shown in FIG. 7 ).
  • a light-emitting surface 2101 is disposed on the light-emitting functional layer.
  • the light emitting functional layer includes: a first doping type semiconductor layer 211 , a second doping type semiconductor layer 213 , an active layer 212 and a buffer layer 214 .
  • the light emitting surface 2101 and the first electrode 22 are located on a side of the first doped type semiconductor layer 211 away from the active layer 212 .
  • the light-shielding layer 24 is, for example, disposed on the light-emitting surface 2101, and the light-shielding layer 24 is provided with a light-emitting port 241.
  • the light emitted from the active layer 212 sequentially passes through the first doped type semiconductor layer 211 and exits from the light-emitting port 141 on the light-emitting surface 2101. .
  • the first doping type semiconductor layer 211 is, for example, an N-type GaN (gallium nitride, gallium nitride) layer, and the first electrode 22 electrically connected to the first doping type semiconductor layer 211 is, for example, an N-type electrode.
  • the second doping type semiconductor layer 213 is, for example, a P-type GaN layer, and the second electrode 23 electrically connected to the second doping type semiconductor layer 213 is, for example, a P-type electrode.
  • the active layer 212 is, for example, an InGaN (indium gallium nitride), GaN, AlGaAs (aluminum gallium arsenide) multi-quantum well layer to emit infrared light, ultraviolet light, blue light and other light. It can be understood that the material of the active layer 212 can also be other inorganic semiconductor materials to emit light of different colors, and the present application is not limited thereto.
  • the buffer layer 214 is, for example, disposed on a side of the second doping type semiconductor layer 213 away from the second electrode 23 .
  • the material of the buffer layer 214 includes, for example, one of aluminum nitride and gallium nitride.
  • the buffer layer 214 can also be doped with other materials such as aluminum. This application is not limited thereto.
  • the buffer layer 214 can flatten the bottom layer of the light emitting device, thereby providing a good growth substrate for multiple layer structures disposed on the buffer layer 214 .
  • the light-emitting device 20 provided in the present application can also add other functional layers according to actual needs, such as transparent metal electrode layers on the side of the first electrode 22 and the second electrode 23, non-intentionally doped nitride Gallium layer (u-GaN), the stress release layer between the N-type semiconductor layer and the multi-quantum well layer, the electron blocking layer (EBL, Electron Blocking Layer) between the multi-quantum well layer and the P-type semiconductor layer, etc.
  • u-GaN non-intentionally doped nitride Gallium layer
  • EBL Electron Blocking Layer
  • the light-shielding layer 24 also covers other surfaces of the light-emitting functional layer except the light-emitting surface 2101 .
  • the first electrode 22 and the second electrode 23 respectively penetrate through the light-shielding layer 24 for realizing electrical conduction with an external power source.
  • the above technical solution further reduces side light leakage of the light-emitting device by covering multiple sides of the light-emitting device with light-shielding layers.
  • the light-shielding layer 24 is, for example, a highly reflective metal coating.
  • the highly reflective metal coating includes an insulating layer 241 and a metal layer 242 .
  • the metal layer 242 is located on a side of the insulating layer 241 away from the light-emitting functional layer.
  • the material of the insulating layer 241 is, for example, a material with good insulating properties such as silicon oxide.
  • the metal layer 242 is, for example, aluminum, silver, gold and other metal materials with good reflective properties, and the present application is not limited thereto.
  • the insulating layer 241 is disposed on the light-emitting surface 2101 and multiple surfaces of the light-emitting device 20 except the light-emitting surface, which can isolate the contact between the metal layer 242 and the light-emitting functional layer and play a protective role.
  • the insulating layer 241 can also prevent ineffective light emission generated by the combination of holes and electrons in the first doped type semiconductor layer 211 and the second doped type semiconductor layer 213 on multiple sides of the light emitting device.
  • the above technical proposal can reflect the light emitted by the light-emitting device by arranging the metal layer on the side of the insulating layer away from the light-emitting functional layer, thereby improving the utilization of light.
  • a highly reflective metal coating is provided on the side where the first electrode and the second electrode are located, which improves the utilization of light and the resonance in the reflective cavity, and is conducive to reducing the light output angle, so as to meet the needs of narrow and high light output. Show application scenarios.
  • the light shielding layer 24 may also be a distributed Bragg reflector.
  • the distributed Bragg reflector is a structure formed by periodic arrangement of various inorganic materials with different refractive indices.
  • Fig. 10 shows a distributed Bragg reflector formed by two different inorganic materials spaced apart. Wherein, setting the light-shielding layer as a distributed Bragg reflector not only shields multiple sides of the light-emitting device, but also improves light reflection, thus increasing the utilization rate of light.
  • the light emitting device 20 further includes a condenser lens 25 , for example.
  • the condenser lens 25 is, for example, disposed at the light outlet 241 and covers the light outlet 241 . Wherein, by setting the condensing lens, the light emitting angle of the light emitting device is further reduced, and the brightness is improved.
  • the light-shielding layer 24 covers, for example, the light-emitting surface 2101 , the light-emitting surface 2101 is composed of the light-emitting opening 241 and the light-shielding layer 24 .
  • the light-shielding layer 24 covering the light-emitting surface 2101 is provided with a plurality of hollow patterns, for example. Therefore, the light outlet 241 includes, for example, a plurality of sub-light outlets with hollow patterns.
  • the light outlet 241 on the light outlet surface 2401 refer to the description of the light outlet 141 in the foregoing first embodiment and FIG. 5 and FIG. 6 , and details will not be repeated here.
  • the plurality of sub-light outlets may, for example, be provided with corresponding condenser lenses, so as to further narrow the light-emitting angle and improve brightness.
  • the shape of the hollow pattern may be square, circular, triangular or other geometric patterns, which is not limited in the present application.
  • the second embodiment of the present application provides a light-emitting device 20 , the light-emitting surface of which is located on the same side as the two electrodes of the light-emitting functional layer 21 , so as to achieve light emission from the top surface of the light-emitting device 20 .
  • the light-emitting surface is located on the opposite side of the two electrodes, so that light can be emitted from the bottom surface of the light-emitting device 10 .
  • Both light-emitting devices can be used as narrow light-emitting light sources of the display panel, and can be applied in different scenarios due to their different light-emitting surfaces.
  • the second embodiment of the present application has the following beneficial effects: by providing a light-shielding layer with a light outlet on the light outlet surface, the area of the light outlet is smaller than the area of the light outlet surface, thereby realizing narrow light output of the light emitting device.
  • a light-shielding layer is arranged on other surfaces of the light-emitting device to reduce side light output of the light-emitting device.
  • the light-shielding layer is set as an insulating layer and a metal layer or a structure of a distributed Bragg reflector, which increases the reflection of light on multiple sides and the resonance in the reflection cavity, thereby improving the utilization rate of light.
  • a condenser lens is arranged at the light outlet, which further narrows the light emitting angle of the light emitting device and improves the brightness of the light emitting device. Furthermore, by setting a plurality of light outlets with hollow patterns, the light angle is further narrowed, and a light emitting device with narrow light emission is provided.
  • a transfer device 30 provided by the third embodiment of the present application includes, for example, a transfer substrate 311 , a driving device layer 312 , a light emitting device 30 and a first adhesive layer 313 .
  • the light emitting device 30 adopts any light emitting device as provided in the aforementioned first embodiment and/or the second embodiment.
  • the light-emitting device 30 can realize narrow light emission, which solves the problem of the large light-emitting angle of the light-emitting device and the influence of side light emission on adjacent areas, and provides a micro-device transfer device that can realize precise debonding.
  • the transfer substrate 311 is, for example, a glass substrate, a flexible substrate, or other substrate materials with good bearing performance.
  • the driving device layer 312 is, for example, a TFT (Thin Film Transistor, thin film field effect transistor) driving device, a CMOS (Complementary Metal Oxide Semiconductor, complementary metal oxide semiconductor), a silicon-based liquid crystal (Liquid Crystal on Silicon, LCOS) substrate, etc. for driving A driving circuit for a light emitting device.
  • the driving device layer 312 is, for example, disposed on the transfer substrate 311 .
  • the light emitting device 30 is, for example, disposed on the side of the driving device layer 313 away from the transfer substrate 311 , and the light emitting device 30 is electrically connected to the driving device layer, so as to emit light under the driving of the driving device layer 312 .
  • the first adhesive colloid layer 313 is, for example, IR (Infrared Radiation, infrared), UR (Ultraviolet Rays, ultraviolet) photolytic adhesives and other reusable photolytic adhesives, which can reduce the viscosity under infrared or ultraviolet irradiation respectively, Recovers viscosity when not irradiated, thus enabling repeated use.
  • the first adhesive gel layer 313 is, for example, disposed on a side of the driving device layer 312 away from the transfer substrate 311 .
  • the first adhesive colloid layer 313 is set to cover the light-emitting device 30 correspondingly, so that the light-emitting device 30 can be debonded at a precise position with the repeatable photodissolvable glue covered thereon.
  • the first adhesive colloid layer 313 is, for example, an entire layer structure covering the driving device layer 312 away from the transfer substrate 311 , and the first adhesive colloid layer 313 covers the light emitting device 30 . Since the light emitting device 30 is a narrow light emitting device, precise debonding from a narrow light emitting area to a reusable photolytic adhesive can be realized. It can be understood that, the corresponding number of light emitting devices 30 is, for example, multiple.
  • the transfer device 30 bonds a plurality of micro-devices to be transferred through the first adhesive colloid layer 313.
  • a plurality of micro devices to be transferred are, for example, any type of micro light emitting diodes or other micro components.
  • the driving device layer 312 drives The light-emitting device 30 emits light to the reusable photolytic adhesive, so that its viscosity is reduced, so that the bonded micro-device to be transferred falls to the target substrate, thereby realizing the transfer of the micro-device. Then, after the driving device layer 312 controls the light-emitting device 30 to turn off, the photolytic adhesive can be reused to restore, so that the above operations can be repeated until all the micro devices to be transferred are transferred, thereby realizing the large-scale transfer of the micro devices.
  • the light-emitting device 30 adopts any light-emitting device provided in the aforementioned first embodiment and/or the second embodiment, the light output angle of the light-emitting device 30 is small, so that the light emitted by the light-emitting device 30 can fall on the corresponding position.
  • Repeated use of photodebonding glue on the adhesive can achieve debonding at precise positions without affecting adjacent areas, improving the transfer yield and transfer reliability of micro devices. It can be understood that when it is necessary to repair the micro devices at certain positions on the target substrate, the driving device layer 312 can also control the light emission of the corresponding target light emitting devices 30 , so as to realize the repair of the micro devices corresponding to the target positions.
  • the type of light emitted by the light-emitting device 30 is set corresponding to the material of the reusable photolytic adhesive. narrow light emitting devices.
  • the present application is not limited thereto.
  • the light emitting device transfer device 30 further includes, for example, an adhesive substrate 314 and a second adhesive gel layer 315 .
  • the second adhesive colloid layer 315 is, for example, pasted on the side of the driving device layer 312 away from the transfer substrate 311 , and covers the light emitting device 30 .
  • the bonding substrate 314 is, for example, a glass substrate, a flexible substrate and other substrate materials with good light transmission performance.
  • the adhesive substrate 314 is, for example, disposed between the first adhesive gel layer 313 and the second adhesive gel layer 315 .
  • the material of the second adhesive colloid layer 313 is, for example, a colloid material for bonding such as pressure-sensitive adhesive and water-based adhesive with good adhesive performance, which is used for bonding the adhesive substrate 314 and the light emitting device 30 .
  • the second adhesive colloid layer 315 is correspondingly covered on the light emitting device 30 or is an entire layer structure disposed on the driving device layer 312 and covering the light emitting device 30 , which is not limited in the present application.
  • the first adhesive colloid layer 313 used here is, for example, non-reusable photolytic adhesive with good adhesive performance.
  • the first adhesive colloid layer 313 can be a photolytic adhesive composed of pressure sensitive adhesive and photosensitive material, which has good viscosity before light, and loses viscosity after light, and cannot be restored.
  • the non-reusable photolytic adhesive has low cost and a wide range of choices, and it can be debonded by light, without the need to control the light color of the light-emitting device. Therefore, as shown in FIG. 13 , the third embodiment of the present application also provides a transfer device 30 using a non-reusable photolytic adhesive,
  • the process of transferring micro devices using a non-reusable photolytic adhesive transfer device 30 is as follows: first, the transfer device 30 bonds a plurality of micro devices through the first adhesive colloid layer 313 device, which is then transferred onto the target substrate.
  • the transfer device 30 drives the driving device layer 312, so that the driving device layer 312 drives the light emitting device 30 to emit light.
  • the light emitted by the light-emitting device 30 passes through the second adhesive colloid layer 315, the adhesive substrate 314 to the first adhesive colloid layer 313, so that the viscosity of the first adhesive colloid layer 313 decreases after receiving the light, resulting in its stickiness.
  • the connected microdevices are transferred to the target substrate.
  • the first adhesive layer 313 is a non-reusable photodegradable adhesive, it is necessary to peel off the adhesive substrate 314 to separate the adhesive substrate 314 and the adhesive bonded on the adhesive substrate 314 after completing a micro-LED transfer.
  • the first adhesive colloid layer 313, and then the unused adhesive substrate 314 and the first adhesive colloid layer 313 are bonded on the second adhesive colloid layer 315 away from the driving device layer 312, and the above steps are repeated to complete a large-scale transfer of microdevices.
  • an adhesive gel is disposed between the adhesive substrate 314 and the first adhesive gel layer 313 , and the viscosity of the adhesive gel does not change substantially under the irradiation of the light emitting device 30 .
  • a bonding protrusion 3131 is provided on the side of the first debonding gel layer 313 away from the bonding substrate 314 .
  • the bonding protrusions 3131 are used for bonding micro devices to be transferred.
  • the number of adhesive protrusions 3151 is multiple, and their positions correspond to the positions of the corresponding light emitting devices 30 one by one, so that the light emitted by the light emitting device 30 can pass through the second adhesive gel 315, the adhesive substrate 314, the first adhesive
  • the adhesive layer 313 reaches the bonding protrusion 3151, thereby reducing the bonding strength of the bonding protrusion 3151 and the micro-device bonded thereto, and completing the precise transfer of the micro-device.
  • the transfer device provided by the third embodiment of the present application solves the problems caused by the light emitting device in the transfer device due to the large light emitting angle and the side light emission to the adjacent light emitting device by arranging the light emitting device capable of realizing narrow light emission on the transfer device.

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Abstract

Provided in the embodiments of the present invention are a light-emitting device and a transfer apparatus. The light-emitting device comprises, for example: a light-emitting functional layer, which is provided with a light-emitting surface; a first electrode, which is arranged on one side of the light-emitting functional layer, and is electrically connected to the light-emitting functional layer; a second electrode, which is arranged on the same side of the light-emitting functional layer as the first electrode, and is electrically connected to the light-emitting functional layer; and a light-shielding layer, which covers the light-emitting surface, and is provided with a light outlet such that light emitted by the light-emitting functional layer is exposed, wherein the area of the light outlet is smaller than the area of the light-emitting surface. In the technical solution, a light-shielding layer having a light outlet is provided on a light-emitting surface, such that the area of the light outlet is smaller than the area of the light-emitting surface, thereby realizing narrow light emission of the light-emitting device.

Description

发光器件和转移装置Light emitting devices and transfer devices 技术领域technical field
本申请涉及一种显示技术领域,尤其涉及一种发光器件和转移装置。The present application relates to the field of display technology, in particular to a light emitting device and a transfer device.
背景技术Background technique
Micro LED(微型发光二极管)显示技术是指以自发光的微米量级的LED为发光像素单元,将其组装到驱动面板上形成高密度LED阵列的显示技术。由于micro LED芯片尺寸小、集成度高和自发光等特点,在显示方面与LCD、OLED相比在亮度、分辨率、对比度、能耗、使用寿命、响应速度和热稳定性等方面具有更大的优势,因此其常作为一种发光器件应用在各种场所中。Micro LED (miniature light-emitting diode) display technology refers to a display technology that uses self-luminous micron-scale LEDs as light-emitting pixel units and assembles them on the drive panel to form a high-density LED array. Due to the characteristics of small size, high integration and self-illumination of micro LED chips, compared with LCD and OLED in terms of display, it has greater brightness, resolution, contrast, energy consumption, service life, response speed and thermal stability. advantages, so it is often used as a light emitting device in various places.
但是现有的Micro LED发光角度大,无法实现窄发光,因此当其应用在AR(augmented reality,增强现实)、MR(mixed reality,混合现实)Micro-LED显示面板、高亮车载以及微型器件转移装置等需要窄发光光源的应用场景时,现有的Micro LED难以满足其需求。However, the existing Micro LED has a large luminous angle and cannot achieve narrow luminescence. Therefore, when it is used in AR (augmented reality, augmented reality), MR (mixed reality, mixed reality) Micro-LED display panels, high-brightness vehicles and micro-device transfer For applications such as devices that require narrow light sources, the existing Micro LEDs are difficult to meet their needs.
申请内容application content
因此,为克服现有技术存在的至少部分缺陷与不足,本申请实施例提供的一种发光器件以及采用该种发光器件的转移装置。Therefore, in order to overcome at least some of the defects and deficiencies in the prior art, embodiments of the present application provide a light emitting device and a transfer device using the light emitting device.
具体地,本申请一个实施例提出的一种发光器件例如包括:发光功能层,设置有出光面;第一电极,设置在所述发光功能层的一侧且电连接所述发光功能层;第二电极,设置在所述发光功能层上与所述第一电极的同一侧且分别电连接所述发光功能层;遮光层,覆盖在所述出光面上,所述遮光层上设置有出光口以露出所述发光功能层发出的光 线,所述出光口的面积小于所述出光面的面积。Specifically, a light-emitting device proposed by an embodiment of the present application includes, for example: a light-emitting functional layer provided with a light-emitting surface; a first electrode provided on one side of the light-emitting functional layer and electrically connected to the light-emitting functional layer; Two electrodes, arranged on the same side of the light-emitting functional layer as the first electrode and electrically connected to the light-emitting functional layer respectively; a light-shielding layer covering the light-emitting surface, and a light-emitting port is arranged on the light-shielding layer In order to expose the light emitted by the light emitting functional layer, the area of the light outlet is smaller than the area of the light outlet surface.
上述技术方案通过在出光面上设置带出光口的遮光层,使得出光口的面积小于出光口的面积,从而实现了发光器件的窄发光。In the above technical solution, a light-shielding layer with a light outlet is provided on the light outlet surface, so that the area of the light outlet is smaller than the area of the light outlet, thereby realizing narrow light emission of the light emitting device.
在本申请的一个实施例中,所述发光功能层包括:第一掺杂类型半导体层,电连接所述第一电极;第二掺杂类型半导体层,电连接所述第二电极;In one embodiment of the present application, the light-emitting functional layer includes: a first doping type semiconductor layer electrically connected to the first electrode; a second doping type semiconductor layer electrically connected to the second electrode;
有源层,设置所述第一掺杂类型半导体层和所述第二掺杂类型半导体之间;an active layer disposed between the first doping type semiconductor layer and the second doping type semiconductor;
缓冲层,位于所述第二掺杂类型半导体层远离所述第二电极的一侧;其中,所述出光面位于所述缓冲层远离所述第二掺杂类型半导体层的一侧,所述第一电极位于所述第一掺杂类型半导体层远离所述有源层的一侧,所述第二电极位于所述第二掺杂类型半导体层远离所述缓冲层的一侧。a buffer layer located on a side of the second doping type semiconductor layer away from the second electrode; wherein the light exit surface is located on a side of the buffer layer away from the second doping type semiconductor layer, the The first electrode is located on a side of the first doping type semiconductor layer away from the active layer, and the second electrode is located on a side of the second doping type semiconductor layer away from the buffer layer.
在本申请的一个实施例中,所述发光功能层包括:第一掺杂类型半导体层,连接所述第一电极;第二掺杂类型半导体层,连接所述第二电极;有源层,设置所述第一掺杂类型半导体层和所述第二掺杂类型半导体之间;缓冲层,位于所述第二掺杂类型半导体层背离所述第二电极的一侧;其中,所述出光面和所述第一电极位于所述第一掺杂类型半导体层远离所述有源层的一侧,所述第一电极贯穿所述遮光层且连接所述第一掺杂类型半导体层,所述第二电极位于所述第二掺杂类型半导体层远离所述缓冲层的一侧。In one embodiment of the present application, the light-emitting functional layer includes: a first doping type semiconductor layer, connected to the first electrode; a second doping type semiconductor layer, connected to the second electrode; an active layer, Set between the first doping type semiconductor layer and the second doping type semiconductor; a buffer layer, located on the side of the second doping type semiconductor layer away from the second electrode; wherein the light emitting The surface and the first electrode are located on the side of the first doping type semiconductor layer away from the active layer, and the first electrode penetrates through the light shielding layer and is connected to the first doping type semiconductor layer, so The second electrode is located on a side of the second doping type semiconductor layer away from the buffer layer.
在本申请的一个实施例中,所述遮光层还覆盖在所述发光功能层上除所述出光面之外的其它表面,所述第一电极和所述第二电极分别贯穿所述遮光层。In an embodiment of the present application, the light-shielding layer also covers other surfaces on the light-emitting functional layer except the light-emitting surface, and the first electrode and the second electrode respectively penetrate through the light-shielding layer .
在本申请的一个实施例中,所述遮光层包括绝缘层和金属层,所述金属层位于所述绝缘层远离所述发光功能层的一侧。In one embodiment of the present application, the light-shielding layer includes an insulating layer and a metal layer, and the metal layer is located on a side of the insulating layer away from the light-emitting functional layer.
在本申请的一个实施例中,所述遮光层为分布式布拉格发射镜。In one embodiment of the present application, the light-shielding layer is a distributed Bragg mirror.
在本申请的一个实施例中,所述发光器件还包括聚光透镜,所述聚光透镜设置在所述出光口处并覆盖所述出光口。In one embodiment of the present application, the light emitting device further includes a condenser lens, and the condenser lens is arranged at the light outlet and covers the light outlet.
在本申请的一个实施例中,所述出光口包括多个具有镂空图案的子出光口。In one embodiment of the present application, the light outlet includes a plurality of sub-light outlets with hollow patterns.
另外,本申请实施例提出的一种转移装置,例如包括:转移基板;驱动器件层,设置在所述转移基板上;如前述实施例所述的任意一项所述的发光器件,设置在所述驱动器件层上远离所述转移基板的一侧且电连接所述驱动器件层;第一黏接胶体层,设置在所述驱动器件层上远离所述转移基板的一侧。In addition, a transfer device proposed in the embodiments of the present application includes, for example: a transfer substrate; a driving device layer disposed on the transfer substrate; a light emitting device as described in any one of the preceding embodiments, disposed on the transfer substrate; The side of the driving device layer away from the transfer substrate and electrically connected to the driving device layer; the first adhesive colloid layer is arranged on the side of the driving device layer away from the transfer substrate.
在本申请的一个实施例中,所述转移装置还包括:第二黏接胶体层,粘贴在所述驱动基板远离所述转移基板的一侧且覆盖所述发光器件;黏接基板,设置在所述第一黏接胶体层和所述第二黏接胶体层之间。In one embodiment of the present application, the transfer device further includes: a second adhesive colloid layer, pasted on the side of the driving substrate away from the transfer substrate and covering the light emitting device; an adhesive substrate, arranged on Between the first adhesive colloid layer and the second adhesive colloid layer.
在本申请的一个实施例中,所述第一黏接胶体层上远离所述驱动基板的一侧上设置有黏接凸起,所述黏接凸起与所述发光器件对应设置。In one embodiment of the present application, an adhesive protrusion is disposed on a side of the first adhesive gel layer away from the driving substrate, and the adhesive protrusion is disposed corresponding to the light emitting device.
上述的一个或多个技术方案具有如下有益效果和优点:本申请实施例通过在出光面上设置带有出光口的遮光层,使得出光口的面积小于出光面的面积,从而实现了发光器件的窄出光。此外在发光器件的其他表面设置遮光层,减小了发光器件的侧面出光。将遮光层设置成绝缘层以及金属层或分布式布拉格发射镜的结构,增加了光在多个侧面的反射以及在反射腔的谐振,从而提高了光的利用率。在出光口设置聚光透镜,进一步收窄了发光器件的出光角度,提到高了发光器件的亮度。进一步地,通过设置多个带镂空图案的出光口,进一步收窄了发光角,提供了一种窄发光的发光器件。另一方面,本申请实施例提供的一种转移装置,通过将能实现窄发光的发光器件设置在转移装置上,解决了转移装置中因发光器件出光角度大以及侧面出光而对相邻区域造 成影响的问题,从而实现精确位置的解黏,提高微型器件转移良率以及转移可靠性。The above one or more technical solutions have the following beneficial effects and advantages: In the embodiment of the present application, a light-shielding layer with a light outlet is provided on the light outlet surface, so that the area of the light outlet is smaller than the area of the light outlet surface, thereby realizing the light emitting device. narrow light. In addition, a light-shielding layer is arranged on other surfaces of the light-emitting device to reduce side light output of the light-emitting device. The light-shielding layer is set as an insulating layer and a metal layer or a structure of a distributed Bragg reflector, which increases the reflection of light on multiple sides and the resonance in the reflection cavity, thereby improving the utilization rate of light. A condenser lens is arranged at the light outlet, which further narrows the light outlet angle of the light emitting device and improves the brightness of the light emitting device. Furthermore, by setting a plurality of light outlets with hollow patterns, the light angle is further narrowed, and a light emitting device with narrow light emission is provided. On the other hand, in the transfer device provided by the embodiment of the present application, by disposing the light-emitting device capable of realizing narrow light emission on the transfer device, it solves the problems caused by the large light emission angle of the light-emitting device and the side light emission in the transfer device to adjacent areas. In order to realize the debonding of the precise position, improve the transfer yield and transfer reliability of micro devices.
附图说明Description of drawings
为了更清楚地说明本申请实施例的技术方案,下面将对实施例描述中所需要使用的附图作简单介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings that need to be used in the description of the embodiments. Obviously, the drawings in the following description are only some embodiments of the present application. Those of ordinary skill in the art can also obtain other drawings based on these drawings without any creative effort.
图1为本申请第一实施例提供的一种发光器件的结构示意图。Fig. 1 is a schematic structural diagram of a light emitting device provided in the first embodiment of the present application.
图2为本申请第一实施例提供的又一种发光器件的结构示意图。Fig. 2 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
图3为本申请第一实施例提供的再一种发光器件的结构示意图。Fig. 3 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
图4为本申请第一实施例提供的再一种发光器件的结构示意图。Fig. 4 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
图5为本申请第一实施例中出光面的结构示意图。FIG. 5 is a schematic structural diagram of a light-emitting surface in the first embodiment of the present application.
图6为本申请第一实施例中又一种出光面的结构示意图。FIG. 6 is a schematic structural diagram of another light-emitting surface in the first embodiment of the present application.
图7为本申请第二实施例提供的一种发光器件的结构示意图。Fig. 7 is a schematic structural diagram of a light emitting device provided in the second embodiment of the present application.
图8为本申请第一实施例提供的又一种发光器件的结构示意图。Fig. 8 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
图9为本申请第一实施例提供的再一种发光器件的结构示意图。FIG. 9 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
图10为本申请第一实施例提供的再一种发光器件的结构示意图。Fig. 10 is a schematic structural diagram of another light emitting device provided in the first embodiment of the present application.
图11为本申请第三实施例提供的一种转移装置的结构示意图。Fig. 11 is a schematic structural diagram of a transfer device provided in the third embodiment of the present application.
图12为本申请第三实施例提供的又一种转移装置的结构示意图。FIG. 12 is a schematic structural diagram of another transfer device provided in the third embodiment of the present application.
图13为本申请第三实施例提供的再一种转移装置的结构示意图。FIG. 13 is a schematic structural diagram of another transfer device provided in the third embodiment of the present application.
图14为本申请第三实施例提供的再一种发光器件转移装置的结构示意图。Fig. 14 is a schematic structural diagram of another light emitting device transfer device provided in the third embodiment of the present application.
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only part of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of this application.
需要说明,本申请实施例中所有方向性指示(诸如上、下、左、右、前、后)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。It should be noted that all directional indications (such as up, down, left, right, front, and back) in the embodiments of the present application are only used to explain the relative positions of the components in a certain posture (as shown in the accompanying drawings) relationship, motion, etc., if the particular pose changes, the directional indication changes accordingly.
在本申请实施例中如涉及“第一”、“第二”等的描述仅用于描述目的,而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。In the embodiments of the present application, the descriptions involving "first", "second", etc. are only for the purpose of description, and should not be understood as indicating or implying their relative importance or implicitly indicating the quantity of the indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features.
【第一实施例】【The first embodiment】
参见图1,本申请第一实施例提供一种发光器件10,其例如包括发光功能层11、第一电极12、第二电极13以及遮光层14。其中,发光功能层11例如能发出红外光、紫外光、蓝光等各种颜色的光线。发光功能层11例如设置有出光面1101,从而发光功能层11发出的光线能穿过出光面1101射出至外部环境。第一电极12例如设置在发光功能层11的一侧且电连接发光功能层11。第二电极13例如设置在发光功能层11上与第一电极12的同一侧且分别电连接发光功能层。具体地,第一电极12和第二电极13位于发光功能层11的同一侧,且分别在发光功能层11的两端上电连接发光功能层11。遮光层14例如覆盖在出光面1101上。遮光层14上例如设置有出光口141以露出发光功能层11发出的光线。出光口141的面积小于出光面1101的面积。Referring to FIG. 1 , the first embodiment of the present application provides a light-emitting device 10 , which includes, for example, a light-emitting functional layer 11 , a first electrode 12 , a second electrode 13 and a light-shielding layer 14 . Wherein, the light-emitting functional layer 11 can, for example, emit light of various colors such as infrared light, ultraviolet light, and blue light. For example, the light-emitting functional layer 11 is provided with a light-emitting surface 1101 , so that the light emitted by the light-emitting functional layer 11 can pass through the light-emitting surface 1101 and be emitted to the external environment. The first electrode 12 is, for example, disposed on one side of the light emitting functional layer 11 and electrically connected to the light emitting functional layer 11 . For example, the second electrode 13 is disposed on the same side as the first electrode 12 on the light emitting functional layer 11 and is electrically connected to the light emitting functional layer respectively. Specifically, the first electrode 12 and the second electrode 13 are located on the same side of the light-emitting functional layer 11 , and are electrically connected to the light-emitting functional layer 11 at both ends of the light-emitting functional layer 11 . The light-shielding layer 14 covers, for example, the light-emitting surface 1101 . For example, a light outlet 141 is provided on the light-shielding layer 14 to expose the light emitted by the light-emitting functional layer 11 . The area of the light exit 141 is smaller than the area of the light exit surface 1101 .
上述技术方案通过在出光面上设置带有出光孔的遮光层,从而使得出光口的面积小 于出光面的面积,实现了发光器件的窄出光。In the above technical solution, a light-shielding layer with a light exit hole is provided on the light exit surface, so that the area of the light exit opening is smaller than the area of the light exit surface, and the narrow light exit of the light emitting device is realized.
具体地,如图2所示,发光功能层11例如包括第一掺杂类型半导体层111、第二掺杂类型半导体层113、有源层112以及缓冲层114。其中,出光面1101位于缓冲层114远离第二掺杂类型半导体层113的一侧,有源层112发出的光线依次穿过第二掺杂类型半导体层113以及缓冲层114从出光面1101出射。第一掺杂类型半导体层111例如N型GaN(gallium nitride,氮化镓)层,且与第一掺杂类型半导体层111电连接的第一电极12例如为N型电极。第二掺杂类型半导体层113例如为P型GaN层,与第二掺杂类型半导体层113电连接的第二电极13例如为P型电极。可以理解的是,这里第一掺杂类型半导体层111和第二掺杂类型半导体层113的材料例如可以互换,同理,第一电极12与第二电极13的位置也可以互换。有源层112设置在第一掺杂类型半导体层111和第二掺杂类型半导体层113之间。有源层112例如为InGaN(铟氮化稼)、GaN、AlGaAs(铝砷化稼)多量子阱层,可发出红外光、紫外光、蓝光等光线。可以理解的是,有源层112的材料还可以为其他无机半导体物料,以发出不同颜色的光,本申请不以此为限制。缓冲层114例如设置在第二掺杂类型半导体层113远离第二电极13的一侧。缓冲层114的组成材料例如包括氮化铝、氮化镓中的一种,根据缓冲层114生长衬底或有源层112的材料不同,缓冲层114还可以掺杂铝等其他材料。本申请不以此为限制。缓冲层114能平缓发光器件底层,从而为设置在缓冲层114上的多个层结构提供良好的生长基板。此外,可以理解的是,本申请提供的发光器件10还可以根据实际需要增设其他功能层,例如非有意掺杂氮化镓层(u-GaN)、位于N型半导体层与多量子阱层之间的应力释放层、位于多量子阱层与P型半导体层之间的电子阻挡层(EBL,Electron Blocking Layer)等,本申请实施例并不以此为限。Specifically, as shown in FIG. 2 , the light emitting functional layer 11 includes, for example, a first doping type semiconductor layer 111 , a second doping type semiconductor layer 113 , an active layer 112 and a buffer layer 114 . Wherein, the light emitting surface 1101 is located on the side of the buffer layer 114 away from the second doped type semiconductor layer 113 , and the light emitted from the active layer 112 sequentially passes through the second doped type semiconductor layer 113 and the buffer layer 114 to emerge from the light emitting surface 1101 . The first doping type semiconductor layer 111 is, for example, an N-type GaN (gallium nitride, gallium nitride) layer, and the first electrode 12 electrically connected to the first doping type semiconductor layer 111 is, for example, an N-type electrode. The second doping type semiconductor layer 113 is, for example, a P-type GaN layer, and the second electrode 13 electrically connected to the second doping type semiconductor layer 113 is, for example, a P-type electrode. It can be understood that the materials of the first doping type semiconductor layer 111 and the second doping type semiconductor layer 113 can be interchanged, and similarly, the positions of the first electrode 12 and the second electrode 13 can also be interchanged. The active layer 112 is disposed between the first doping type semiconductor layer 111 and the second doping type semiconductor layer 113 . The active layer 112 is, for example, an InGaN (indium gallium nitride), GaN, AlGaAs (aluminum gallium arsenide) multi-quantum well layer, which can emit infrared light, ultraviolet light, blue light and other light. It can be understood that the material of the active layer 112 can also be other inorganic semiconductor materials to emit light of different colors, and the present application is not limited thereto. The buffer layer 114 is, for example, disposed on a side of the second doping type semiconductor layer 113 away from the second electrode 13 . The composition material of the buffer layer 114 includes, for example, one of aluminum nitride and gallium nitride. Depending on the growth substrate of the buffer layer 114 or the material of the active layer 112 , the buffer layer 114 may also be doped with other materials such as aluminum. This application is not limited thereto. The buffer layer 114 can flatten the bottom layer of the light emitting device, thereby providing a good growth substrate for multiple layer structures disposed on the buffer layer 114 . In addition, it can be understood that the light-emitting device 10 provided by the present application can also add other functional layers according to actual needs, such as unintentionally doped gallium nitride layer (u-GaN), located between the N-type semiconductor layer and the multi-quantum well layer The stress release layer in between, the electron blocking layer (EBL, Electron Blocking Layer) between the multi-quantum well layer and the P-type semiconductor layer, etc., the embodiments of the present application are not limited thereto.
更进一步地,遮光层14还覆盖在发光功能层11上除出光面1101的其他表面。其中,第一电极12和第二电极13分别贯穿遮光层14,用于实现与外界电源的电导通。上述技术方案通过在发光器件的多个侧面覆盖遮光层,进一步减少了发光器件的侧面出光。Furthermore, the light-shielding layer 14 also covers other surfaces of the light-emitting functional layer 11 except the light-emitting surface 1101 . Wherein, the first electrode 12 and the second electrode 13 respectively penetrate through the light-shielding layer 14 for realizing electrical conduction with the external power supply. The above technical solution further reduces side light emission of the light emitting device by covering multiple sides of the light emitting device with light-shielding layers.
更具体地,如图3所示,遮光层14例如为高反射金属镀层。具体地,高反射金属镀层包括绝缘层141以及金属层142。其中,金属层142位于绝缘层141远离发光功能层11的一侧,也即金属层142设置在绝缘层141和发光功能层11之间。绝缘层141的材料例如采用氧化硅等绝缘性良好的材料。金属层142例如为铝、银、金等具有良好反射性能的金属材料,本申请不以此为限。绝缘层141设置在出光面1101以及发光功能层11除出光面1101的多个表面,其能隔绝金属层142与发光功能层11的接触,起到保护作用,此外,绝缘层141还能防止发光器件10多个侧面上第一掺杂类型半导体层111与第二掺杂类型半导体层113中的空穴与电子的结合产生的无效发光。上述技术方案通过在绝缘层远离发光功能层的一侧上设置金属层,能将发光器件发射的光线进行反射,提高了光的利用率。其中,在第一电极和第二电极所在的侧面上设置高反射金属镀层,提升了光的利用以及反射腔中的谐振,有利于减小出光角度,以适应需要窄出光且高亮出光的显示应用场景。More specifically, as shown in FIG. 3 , the light shielding layer 14 is, for example, a highly reflective metal coating. Specifically, the highly reflective metal coating includes an insulating layer 141 and a metal layer 142 . Wherein, the metal layer 142 is located on a side of the insulating layer 141 away from the light-emitting functional layer 11 , that is, the metal layer 142 is disposed between the insulating layer 141 and the light-emitting functional layer 11 . The material of the insulating layer 141 is, for example, a material with good insulating properties such as silicon oxide. The metal layer 142 is, for example, aluminum, silver, gold and other metal materials with good reflective properties, and the present application is not limited thereto. The insulating layer 141 is arranged on the light-emitting surface 1101 and multiple surfaces of the light-emitting functional layer 11 except the light-emitting surface 1101, which can isolate the contact between the metal layer 142 and the light-emitting functional layer 11 and play a protective role. In addition, the insulating layer 141 can also prevent light emission. The combination of holes and electrons in the first doping type semiconductor layer 111 and the second doping type semiconductor layer 113 on multiple sides of the device 10 produces ineffective luminescence. The above technical proposal can reflect the light emitted by the light-emitting device by arranging the metal layer on the side of the insulating layer away from the light-emitting functional layer, thereby improving the utilization rate of light. Among them, a highly reflective metal coating is provided on the side where the first electrode and the second electrode are located, which improves the utilization of light and the resonance in the reflective cavity, and is conducive to reducing the light output angle, so as to meet the needs of narrow and high light output. Show application scenarios.
另一方面,如图4所示,遮光层14还可以为分布式布拉格反射镜(Distributed Bragg Reflector,DBR)。分布式布拉格反射镜为多种具有不同折射率的无机材料呈周期性排布形成的一种结构。参照图4,其展示了一种由两种不同无机材料间隔排布形成的一种分布式布拉格发射镜。上述技术方案通过将遮光层设置成分布式布拉格发射镜不仅对发光器件的多个侧面进行了遮光,同时也提升了光的反射,从提高了光的利用率。On the other hand, as shown in FIG. 4, the light-shielding layer 14 may also be a distributed Bragg reflector (Distributed Bragg Reflector, DBR). The distributed Bragg reflector is a structure formed by periodic arrangement of various inorganic materials with different refractive indices. Referring to FIG. 4 , it shows a distributed Bragg reflector formed by two different inorganic materials arranged at intervals. The above technical solution not only shields multiple sides of the light emitting device from light by setting the light shielding layer as a distributed Bragg reflector, but also improves light reflection, thus improving the utilization rate of light.
更进一步地,参加图2-图4,发光器件10还包括聚光透镜10。聚光透镜10例如设置在出光口141处并覆盖所述出光口141。其中,通过设置聚光透镜进一步减小了发光器件的出光角度,且提高了发光器件的出光亮度。Furthermore, referring to FIGS. 2-4 , the light emitting device 10 further includes a condenser lens 10 . The condenser lens 10 is, for example, disposed at the light outlet 141 and covers the light outlet 141 . Wherein, the light emitting angle of the light emitting device is further reduced by setting the condenser lens, and the light emitting brightness of the light emitting device is improved.
此外,参照图5,遮光层14例如覆盖在出光面1101上,从而出光面1101由出光口141和遮光层14组成。为了进一步减少收窄发光角,覆盖在出光面1101上的遮光层例如设置有多个镂空图案。因此,如图6所示,出光口141例如包括多个具有镂空图案的子出光口1411。可以理解的是,多个子出光口1411可例如对应设置聚光透镜,从而进一步收窄发光角,提高亮度。此外,镂空图案的形状可为方形、圆形、三角形或者其他几何图案,本申请不以此为限。In addition, referring to FIG. 5 , the light-shielding layer 14 covers, for example, the light-emitting surface 1101 , so that the light-emitting surface 1101 is composed of the light-emitting opening 141 and the light-shielding layer 14 . In order to further reduce narrowing of the light emitting angle, the light-shielding layer covering the light-emitting surface 1101 is, for example, provided with a plurality of hollow patterns. Therefore, as shown in FIG. 6 , the light outlet 141 includes, for example, a plurality of sub-light outlets 1411 with hollow patterns. It can be understood that the plurality of sub-light outlets 1411 may, for example, be provided with corresponding condenser lenses, so as to further narrow the light-emitting angle and improve brightness. In addition, the shape of the hollow pattern may be square, circular, triangular or other geometric patterns, which is not limited in the present application.
综上所述,本申请第一实施例具有如下有益效果:通过在出光面上设置带有出光口的遮光层,使得出光口的面积小于出光面的面积,从而实现了发光器件的窄出光。此外在发光器件的其他表面设置遮光层,减小了发光器件的侧面出光。将遮光层设置成绝缘层以及金属层或分布式布拉格发射镜的结构,增加了光在多个侧面的反射以及在反射腔的谐振,从而提高了光的利用率。在出光口设置聚光透镜,进一步收窄了发光器件的出光角度并提到高了发光器件的亮度。进一步地,通过设置多个带镂空图案的出光口,进一步收窄了发光角,提供了一种窄发光的发光器件。In summary, the first embodiment of the present application has the following beneficial effects: by providing a light-shielding layer with a light outlet on the light outlet surface, the area of the light outlet is smaller than the area of the light outlet surface, thereby realizing narrow light output of the light emitting device. In addition, a light-shielding layer is arranged on other surfaces of the light-emitting device to reduce side light output of the light-emitting device. The light-shielding layer is set as an insulating layer and a metal layer or a structure of a distributed Bragg reflector, which increases the reflection of light on multiple sides and the resonance in the reflection cavity, thereby improving the utilization rate of light. A condenser lens is arranged at the light outlet, which further narrows the light outlet angle of the light-emitting device and improves the brightness of the light-emitting device. Furthermore, by setting a plurality of light outlets with hollow patterns, the light angle is further narrowed, and a light emitting device with narrow light emission is provided.
【第二实施例】【Second Embodiment】
参照图7,本申请第二实施例提供的一种发光器件20例如包括第一电极22、第二电极23、遮光层24、以及发光功能层(图7中未示出)。发光功能层上设置有出光面2101。其中,发光功能层包括:第一掺杂类型半导体层211、第二掺杂类型半导体层213、有源层212以及缓冲层214。Referring to FIG. 7 , a light-emitting device 20 provided in the second embodiment of the present application includes, for example, a first electrode 22 , a second electrode 23 , a light-shielding layer 24 , and a light-emitting functional layer (not shown in FIG. 7 ). A light-emitting surface 2101 is disposed on the light-emitting functional layer. Wherein, the light emitting functional layer includes: a first doping type semiconductor layer 211 , a second doping type semiconductor layer 213 , an active layer 212 and a buffer layer 214 .
具体地,出光面2101和第一电极22位于第一掺杂类型半导体层211远离有源层212的一侧。遮光层24例如设置在出光面2101上,且遮光层24上设置有出光口241,有源层212发出的光线依次穿过第一掺杂类型半导体层211从出光面2101上的出光口141出射。第一掺杂类型半导体层211例如N型GaN(gallium nitride,氮化镓)层,且与第一掺杂类型半导体层211电连接的第一电极22例如为N型电极。第二掺杂类型半导体层213例如为P型GaN层,与第二掺杂类型半导体层213电连接的第二电极23例如为P型电极。可以理解的是,这里第一掺杂类型半导体层211和第二掺杂类型半导体层213的材料例如可以互换,对应的与其分别电连接的第一电极22和第二电极23的材料也可以互换,本申请不以此为限。有源层212例如为InGaN(铟氮化稼)、GaN、AlGaAs(铝砷化稼)多量子阱层从而发出红外光、紫外光、蓝光等光线。可以理解的是,有源层212的材料还可以为其他无机半导体物料,以发出不同颜色的光,本申请不以此为限制。缓冲层214例如设置在第二掺杂类型半导体层213远离第二电极23的一侧。缓冲层214的组成材料例如包括氮化铝、氮化镓中的一种,根据缓冲层214生长衬底或是有源层212的材料不同,缓冲层214还可以掺杂铝等其他材料。本申请不以此为限制。缓冲层214能平缓发光器件底层,从而给设置在缓冲层214上的多个层结构提供良好的生长基板。此外,可以理解的是,本申请提供的发光器件20还可以根据实际需要增设其他功能层,例如位于第一电极22和第二电极23一侧上的透明金属电极层、非有意掺杂氮化镓层(u-GaN)、位于N型半导体层与多量子阱层之间的应力释放层、位于多量子阱层与P型半导体层之间的电子阻挡层(EBL,Electron Blocking Layer)等,本申请实施例并不以此为限。Specifically, the light emitting surface 2101 and the first electrode 22 are located on a side of the first doped type semiconductor layer 211 away from the active layer 212 . The light-shielding layer 24 is, for example, disposed on the light-emitting surface 2101, and the light-shielding layer 24 is provided with a light-emitting port 241. The light emitted from the active layer 212 sequentially passes through the first doped type semiconductor layer 211 and exits from the light-emitting port 141 on the light-emitting surface 2101. . The first doping type semiconductor layer 211 is, for example, an N-type GaN (gallium nitride, gallium nitride) layer, and the first electrode 22 electrically connected to the first doping type semiconductor layer 211 is, for example, an N-type electrode. The second doping type semiconductor layer 213 is, for example, a P-type GaN layer, and the second electrode 23 electrically connected to the second doping type semiconductor layer 213 is, for example, a P-type electrode. It can be understood that, here, the materials of the first doped type semiconductor layer 211 and the second doped type semiconductor layer 213 can be interchanged, for example, and the corresponding materials of the first electrode 22 and the second electrode 23 electrically connected to them can also be exchange, the present application is not limited thereto. The active layer 212 is, for example, an InGaN (indium gallium nitride), GaN, AlGaAs (aluminum gallium arsenide) multi-quantum well layer to emit infrared light, ultraviolet light, blue light and other light. It can be understood that the material of the active layer 212 can also be other inorganic semiconductor materials to emit light of different colors, and the present application is not limited thereto. The buffer layer 214 is, for example, disposed on a side of the second doping type semiconductor layer 213 away from the second electrode 23 . The material of the buffer layer 214 includes, for example, one of aluminum nitride and gallium nitride. Depending on the growth substrate of the buffer layer 214 or the material of the active layer 212 , the buffer layer 214 can also be doped with other materials such as aluminum. This application is not limited thereto. The buffer layer 214 can flatten the bottom layer of the light emitting device, thereby providing a good growth substrate for multiple layer structures disposed on the buffer layer 214 . In addition, it can be understood that the light-emitting device 20 provided in the present application can also add other functional layers according to actual needs, such as transparent metal electrode layers on the side of the first electrode 22 and the second electrode 23, non-intentionally doped nitride Gallium layer (u-GaN), the stress release layer between the N-type semiconductor layer and the multi-quantum well layer, the electron blocking layer (EBL, Electron Blocking Layer) between the multi-quantum well layer and the P-type semiconductor layer, etc., The embodiment of the present application is not limited thereto.
更进一步地,如图8所示,遮光层24还覆盖在发光功能层上除出光面2101的其他 表面。其中,第一电极22和第二电极23分别贯穿遮光层24,用于实现与外界电源的电导通。上述技术方案通过在发光器件的多个侧面覆盖遮光层,进一步减少了发光器件的侧面漏光。Furthermore, as shown in FIG. 8 , the light-shielding layer 24 also covers other surfaces of the light-emitting functional layer except the light-emitting surface 2101 . Wherein, the first electrode 22 and the second electrode 23 respectively penetrate through the light-shielding layer 24 for realizing electrical conduction with an external power source. The above technical solution further reduces side light leakage of the light-emitting device by covering multiple sides of the light-emitting device with light-shielding layers.
更具体地,如图9所示,遮光层24例如为高反射金属镀层。具体地,高反射金属镀层包括绝缘层241以及金属层242。其中,金属层242位于绝缘层241远离发光功能层的一侧。绝缘层241的材料例如采用氧化硅等绝缘性良好的材料。金属层242例如为铝、银、金等具有良好反射性能的金属材料,本申请不以此为限。绝缘层241设置在出光面2101以及发光器件20除出光面的多个表面,其能隔绝金属层242与发光功能层的接触,起到保护作用。此外,绝缘层241还能防止发光器件多个侧面上的第一掺杂类型半导体层211与第二掺杂类型半导体层213中的空穴与电子的结合产生的无效发光。上述技术方案通过在绝缘层远离发光功能层的一侧上设置金属层,能将发光器件发射的光线进行反射,提高了光的利用。其中,在第一电极和第二电极所在的侧面上设置高反射金属镀层,提升了光的利用以及反射腔中的谐振,有利于减小出光角度,以适应需要窄出光且高亮出光的显示应用场景。More specifically, as shown in FIG. 9 , the light-shielding layer 24 is, for example, a highly reflective metal coating. Specifically, the highly reflective metal coating includes an insulating layer 241 and a metal layer 242 . Wherein, the metal layer 242 is located on a side of the insulating layer 241 away from the light-emitting functional layer. The material of the insulating layer 241 is, for example, a material with good insulating properties such as silicon oxide. The metal layer 242 is, for example, aluminum, silver, gold and other metal materials with good reflective properties, and the present application is not limited thereto. The insulating layer 241 is disposed on the light-emitting surface 2101 and multiple surfaces of the light-emitting device 20 except the light-emitting surface, which can isolate the contact between the metal layer 242 and the light-emitting functional layer and play a protective role. In addition, the insulating layer 241 can also prevent ineffective light emission generated by the combination of holes and electrons in the first doped type semiconductor layer 211 and the second doped type semiconductor layer 213 on multiple sides of the light emitting device. The above technical proposal can reflect the light emitted by the light-emitting device by arranging the metal layer on the side of the insulating layer away from the light-emitting functional layer, thereby improving the utilization of light. Among them, a highly reflective metal coating is provided on the side where the first electrode and the second electrode are located, which improves the utilization of light and the resonance in the reflective cavity, and is conducive to reducing the light output angle, so as to meet the needs of narrow and high light output. Show application scenarios.
另一方面,如图10所示,遮光层24还可以为分布式布拉格反射镜。分布式布拉格反射镜为多种具有不同折射率的无机材料呈周期性排布形成的一种结构。图10展示了一种由两种不同无机材料间隔排布形成的一种分布式布拉格发射镜。其中,通过将遮光层设置成分布式布拉格发射镜不仅对发光器件的多个侧面进行了遮光,同时也提升了光的反射,从增加了光的利用率。On the other hand, as shown in FIG. 10 , the light shielding layer 24 may also be a distributed Bragg reflector. The distributed Bragg reflector is a structure formed by periodic arrangement of various inorganic materials with different refractive indices. Fig. 10 shows a distributed Bragg reflector formed by two different inorganic materials spaced apart. Wherein, setting the light-shielding layer as a distributed Bragg reflector not only shields multiple sides of the light-emitting device, but also improves light reflection, thus increasing the utilization rate of light.
更进一步地,如图8-图10所示,发光器件20例如还包括聚光透镜25。聚光透镜25例如设置在出光口241处并覆盖所述出光口241。其中,通过设置聚光透镜进一步减 小了发光器件的出光角度,提高了亮度。Furthermore, as shown in FIGS. 8-10 , the light emitting device 20 further includes a condenser lens 25 , for example. The condenser lens 25 is, for example, disposed at the light outlet 241 and covers the light outlet 241 . Wherein, by setting the condensing lens, the light emitting angle of the light emitting device is further reduced, and the brightness is improved.
此外,由于遮光层24例如覆盖在出光面2101上,从而出光面2101由出光口241和遮光层24组成。为了进一步减少收窄发光角,覆盖在出光面2101上的遮光层24例如设置有多个镂空图案。因此,出光口241例如包括多个具有镂空图案的子出光口。出光口241在出光面2401的排布情况参照前述第一实施例以及图5和图6对出光口141的描述,在此不再赘述。可以理解的是,多个子出光口可例如对应设置聚光透镜,从而进一步收窄发光角,提高亮度。此外,镂空图案的形状可为方形、圆形、三角形或者其他几何图案,本申请不以此为限。In addition, since the light-shielding layer 24 covers, for example, the light-emitting surface 2101 , the light-emitting surface 2101 is composed of the light-emitting opening 241 and the light-shielding layer 24 . In order to further reduce narrowing of the light-emitting angle, the light-shielding layer 24 covering the light-emitting surface 2101 is provided with a plurality of hollow patterns, for example. Therefore, the light outlet 241 includes, for example, a plurality of sub-light outlets with hollow patterns. For the arrangement of the light outlet 241 on the light outlet surface 2401 , refer to the description of the light outlet 141 in the foregoing first embodiment and FIG. 5 and FIG. 6 , and details will not be repeated here. It can be understood that the plurality of sub-light outlets may, for example, be provided with corresponding condenser lenses, so as to further narrow the light-emitting angle and improve brightness. In addition, the shape of the hollow pattern may be square, circular, triangular or other geometric patterns, which is not limited in the present application.
值得说明的是,本申请第二实施例提供一种发光器件20,其出光面与两个电极位于发光功能层21的同侧,实现发光器件20的顶面出光。而第一实施例提供的一种发光器件10,其出光面位于两个电极的对侧,实现发光器件10的底面出光。两种发光器件均能作为显示面板的窄发光光源,由于其出光面的不同,可应用在不同的场景中。It is worth noting that the second embodiment of the present application provides a light-emitting device 20 , the light-emitting surface of which is located on the same side as the two electrodes of the light-emitting functional layer 21 , so as to achieve light emission from the top surface of the light-emitting device 20 . However, in the light-emitting device 10 provided in the first embodiment, the light-emitting surface is located on the opposite side of the two electrodes, so that light can be emitted from the bottom surface of the light-emitting device 10 . Both light-emitting devices can be used as narrow light-emitting light sources of the display panel, and can be applied in different scenarios due to their different light-emitting surfaces.
综上所述,本申请第二实施例具有如下有益效果:通过在出光面上设置带有出光口的遮光层,使得出光口的面积小于出光面的面积,从而实现了发光器件的窄出光。此外在发光器件的其他表面设置遮光层,减小了发光器件的侧面出光。将遮光层设置成绝缘层以及金属层或分布式布拉格发射镜的结构,增加了光在多个侧面的反射以及在反射腔的谐振,从而提高了光的利用率。在出光口设置聚光透镜,进一步收窄了发光器件的出光角度,提高了发光器件的亮度。进一步地,通过设置多个带镂空图案的出光口,进一步收窄了发光角,提供了一种窄发光的发光器件。In summary, the second embodiment of the present application has the following beneficial effects: by providing a light-shielding layer with a light outlet on the light outlet surface, the area of the light outlet is smaller than the area of the light outlet surface, thereby realizing narrow light output of the light emitting device. In addition, a light-shielding layer is arranged on other surfaces of the light-emitting device to reduce side light output of the light-emitting device. The light-shielding layer is set as an insulating layer and a metal layer or a structure of a distributed Bragg reflector, which increases the reflection of light on multiple sides and the resonance in the reflection cavity, thereby improving the utilization rate of light. A condenser lens is arranged at the light outlet, which further narrows the light emitting angle of the light emitting device and improves the brightness of the light emitting device. Furthermore, by setting a plurality of light outlets with hollow patterns, the light angle is further narrowed, and a light emitting device with narrow light emission is provided.
【第三实施例】[Third embodiment]
参照图11,本申请第三实施例提供的一种转移装置30例如包括转移基板311、驱 动器件层312、发光器件30以及第一黏接胶体层313。其中,发光器件30采用如前述第一实施例和/或第二实施例提供的任意一种发光器件。发光器件30能实现窄发光,解决了因发光器件发光角度大以及会产生侧面出光对相邻区域造成影响的问题,提供了一种能实现精确解黏的微型器件转移装置。Referring to FIG. 11 , a transfer device 30 provided by the third embodiment of the present application includes, for example, a transfer substrate 311 , a driving device layer 312 , a light emitting device 30 and a first adhesive layer 313 . Wherein, the light emitting device 30 adopts any light emitting device as provided in the aforementioned first embodiment and/or the second embodiment. The light-emitting device 30 can realize narrow light emission, which solves the problem of the large light-emitting angle of the light-emitting device and the influence of side light emission on adjacent areas, and provides a micro-device transfer device that can realize precise debonding.
具体地,转移基板311例如采用玻璃基板、柔性基板或者其他承载性能好的基板材料。驱动器件层312例如为TFT(Thin Film Transistor,薄膜场效应晶体管)驱动器件、CMOS(Complementary Metal Oxide Semiconductor,互补金属氧化物半导体)、硅基液晶(Liquid Crystal on Silicon,LCOS)基板等用来驱动发光器件的驱动电路。驱动器件层312例如设置在转移基板311上。发光器件30例如设置在驱动器件层313远离转移基板311的一侧,且发光器件30例如对应电连接驱动器件层,从而能在驱动器件层312的驱动下发出光线。第一黏接胶体层313例如为IR(Infrared Radiation,红外线)、UR(Ultraviolet Rays,紫外线)光解黏胶等可重复使用光解黏胶,其分别能在红外线或是紫外线照射下降低黏度,在不被照射时恢复黏度,因而可以达到重复使用。第一黏接胶体层313例如设置在驱动器件层312上远离转移基板311的一侧。具体地,如图11所示,第一黏接胶体层313例如设置对应覆盖在发光器件30上,从而能发光器件30能和覆盖在其上的可重复光解黏胶实现精确位置的解黏。另一方面,如图12所示,第一黏接胶体层313例如为设置覆盖在驱动器件层312远离转移基板311的整层结构,且第一黏接胶体层313覆盖发光器件30。由于发光器件30为窄发光发光器件,因此能实现窄发光区至可重复使用光解黏胶的精确解黏。可以理解的是,发光器件30对应的数量例如为多个。Specifically, the transfer substrate 311 is, for example, a glass substrate, a flexible substrate, or other substrate materials with good bearing performance. The driving device layer 312 is, for example, a TFT (Thin Film Transistor, thin film field effect transistor) driving device, a CMOS (Complementary Metal Oxide Semiconductor, complementary metal oxide semiconductor), a silicon-based liquid crystal (Liquid Crystal on Silicon, LCOS) substrate, etc. for driving A driving circuit for a light emitting device. The driving device layer 312 is, for example, disposed on the transfer substrate 311 . The light emitting device 30 is, for example, disposed on the side of the driving device layer 313 away from the transfer substrate 311 , and the light emitting device 30 is electrically connected to the driving device layer, so as to emit light under the driving of the driving device layer 312 . The first adhesive colloid layer 313 is, for example, IR (Infrared Radiation, infrared), UR (Ultraviolet Rays, ultraviolet) photolytic adhesives and other reusable photolytic adhesives, which can reduce the viscosity under infrared or ultraviolet irradiation respectively, Recovers viscosity when not irradiated, thus enabling repeated use. The first adhesive gel layer 313 is, for example, disposed on a side of the driving device layer 312 away from the transfer substrate 311 . Specifically, as shown in FIG. 11 , for example, the first adhesive colloid layer 313 is set to cover the light-emitting device 30 correspondingly, so that the light-emitting device 30 can be debonded at a precise position with the repeatable photodissolvable glue covered thereon. . On the other hand, as shown in FIG. 12 , the first adhesive colloid layer 313 is, for example, an entire layer structure covering the driving device layer 312 away from the transfer substrate 311 , and the first adhesive colloid layer 313 covers the light emitting device 30 . Since the light emitting device 30 is a narrow light emitting device, precise debonding from a narrow light emitting area to a reusable photolytic adhesive can be realized. It can be understood that, the corresponding number of light emitting devices 30 is, for example, multiple.
采用上述装置进行微型发光二极管转移的过程具体如下:转移装置30通过第一黏 接胶体层313黏接多个待转移的微型器件。多个待转移的微型器件例如现有的任意一种类型的微型发光二极管或其他微型元器件。由于第一黏接胶体层313为可重复使用光解黏胶,因而将第一黏接胶体层313黏接的多个待转移微型器件对应转移到目标基板上方的位置之后,驱动器件层312驱动发光器件30发出光线至可重复使用光解黏胶,从而其黏性降低,致使黏接的待转移的微型器件落至目标基板,从而实现微型器件的转移。然后,驱动器件层312控制发光器件30关闭后,可重复使用光解黏胶恢复,从而能重复上述操作,直至所有待转移微型器件全部转移,从而实现了微型器件的大规模转移。由于发光器件30采用如前述第一实施例和/或第二实施例提供的任意一种发光器件,因此,发光器件30的出光角度小,从而发光器件30发光的光线能落在对应位置的可重复使用光解黏胶上,从而实现精确位置的解黏,不影响相邻区域,提高了微型器件转移良率以及转移可靠性。可以理解的是,当需要对目标基板上的某些位置的微型器件的修补时,驱动器件层312也可控制对应目标发光器件30的发光,从而实现对应目标位置微型器件的修补。另一方面,发光器件30发出的光线类型与可重复使用光解黏胶的材料对应设置,举例而言,可重复使用光解黏胶为IR光解黏胶,则发光器件30为发出红外线的窄发光器件。此外,如有其他可重复使用的光解黏胶,其也能被应用在本申请第二实施例中,本申请不以此为限。The process of using the above-mentioned device to transfer micro-LEDs is as follows: the transfer device 30 bonds a plurality of micro-devices to be transferred through the first adhesive colloid layer 313. A plurality of micro devices to be transferred are, for example, any type of micro light emitting diodes or other micro components. Since the first adhesive colloid layer 313 is a reusable photolytic adhesive, after the multiple micro devices to be transferred bonded by the first adhesive colloid layer 313 are correspondingly transferred to the position above the target substrate, the driving device layer 312 drives The light-emitting device 30 emits light to the reusable photolytic adhesive, so that its viscosity is reduced, so that the bonded micro-device to be transferred falls to the target substrate, thereby realizing the transfer of the micro-device. Then, after the driving device layer 312 controls the light-emitting device 30 to turn off, the photolytic adhesive can be reused to restore, so that the above operations can be repeated until all the micro devices to be transferred are transferred, thereby realizing the large-scale transfer of the micro devices. Since the light-emitting device 30 adopts any light-emitting device provided in the aforementioned first embodiment and/or the second embodiment, the light output angle of the light-emitting device 30 is small, so that the light emitted by the light-emitting device 30 can fall on the corresponding position. Repeated use of photodebonding glue on the adhesive can achieve debonding at precise positions without affecting adjacent areas, improving the transfer yield and transfer reliability of micro devices. It can be understood that when it is necessary to repair the micro devices at certain positions on the target substrate, the driving device layer 312 can also control the light emission of the corresponding target light emitting devices 30 , so as to realize the repair of the micro devices corresponding to the target positions. On the other hand, the type of light emitted by the light-emitting device 30 is set corresponding to the material of the reusable photolytic adhesive. narrow light emitting devices. In addition, if there are other reusable photolytic adhesives, they can also be applied in the second embodiment of the present application, and the present application is not limited thereto.
另一方面,参照图13,发光器件转移装置30例如还包括黏接基板314以及第二黏接胶体层315。其中,第二黏接胶体层315例如粘贴在驱动器件层312远离转移基板311的一侧,且覆盖在发光器件30上。黏接基板314例如为透光性能良好的玻璃基板、柔性基板等基板材料。黏接基板314例如设置在第一黏接胶体层313和第二黏接胶体层315之间。这里,第二黏接胶体层313的材料例如为黏接性能良好的压敏胶、水性黏胶 等用于黏接的胶体材料,其用于黏接黏接基板314和发光器件30。第二黏接胶体层315例如对应覆盖在发光器件30上或者为设置在驱动器件层312且覆盖发光器件30的整层结构,本申请不以此为限制。与前述提到的一种转移装置30不同的是,这里使用的第一黏接胶体层313例如为黏接性能良好的不可重复使用的光解黏胶。举例而言,第一黏接胶体层313可为压敏胶和光敏材料组成的光解黏胶,其在光照之前具有很好的黏性,在光照后,失去黏性,且不可恢复。不可重复使用的光解黏胶成本低,选择范围广,且其通过光照即可解黏,无需控制发光器件的出光颜色。因而,如图13所示,本申请第三实施例还提供一种使用不可重复使用光解黏胶的转移装置30,On the other hand, referring to FIG. 13 , the light emitting device transfer device 30 further includes, for example, an adhesive substrate 314 and a second adhesive gel layer 315 . Wherein, the second adhesive colloid layer 315 is, for example, pasted on the side of the driving device layer 312 away from the transfer substrate 311 , and covers the light emitting device 30 . The bonding substrate 314 is, for example, a glass substrate, a flexible substrate and other substrate materials with good light transmission performance. The adhesive substrate 314 is, for example, disposed between the first adhesive gel layer 313 and the second adhesive gel layer 315 . Here, the material of the second adhesive colloid layer 313 is, for example, a colloid material for bonding such as pressure-sensitive adhesive and water-based adhesive with good adhesive performance, which is used for bonding the adhesive substrate 314 and the light emitting device 30 . For example, the second adhesive colloid layer 315 is correspondingly covered on the light emitting device 30 or is an entire layer structure disposed on the driving device layer 312 and covering the light emitting device 30 , which is not limited in the present application. Different from the transfer device 30 mentioned above, the first adhesive colloid layer 313 used here is, for example, non-reusable photolytic adhesive with good adhesive performance. For example, the first adhesive colloid layer 313 can be a photolytic adhesive composed of pressure sensitive adhesive and photosensitive material, which has good viscosity before light, and loses viscosity after light, and cannot be restored. The non-reusable photolytic adhesive has low cost and a wide range of choices, and it can be debonded by light, without the need to control the light color of the light-emitting device. Therefore, as shown in FIG. 13 , the third embodiment of the present application also provides a transfer device 30 using a non-reusable photolytic adhesive,
具体地,本申请第三实施例提供的一种使用不可重复使用光解黏胶的转移装置30转移微型器件的过程如下:首先,转移装置30通过第一黏接胶体层313黏接多个微型器件,然后将其转移至目标基板上方。转移装置30驱动驱动器件层312,从而驱动器件层312驱动发光器件30发光。发光器件30发出的光线穿过第二黏接胶体层315、黏接基板314至第一黏接胶体层313,从而第一黏接胶体层313在接收到光线后,黏性降低,致使其黏接的微型器件转移至目标基板。由于第一黏接胶体层313为不可重复使用的光解黏胶体,因此在完成一次微型发光二极管转移后,需要剥离黏接基板314从而分离黏接基板314以及黏接在黏接基板314上的第一黏接胶体层313,然后在第二黏接胶体层315远离驱动器件层312上黏接未使用的黏接基板314以及第一黏接胶体层313,重复上述步骤,即可完成大规模的微型器件的转移。可以理解的是,黏接基板314和第一黏接胶体层313之间例如还设置有黏接胶体,该黏接胶体在发光器件30的照射下,黏度基本不发生改变。Specifically, the process of transferring micro devices using a non-reusable photolytic adhesive transfer device 30 provided in the third embodiment of the present application is as follows: first, the transfer device 30 bonds a plurality of micro devices through the first adhesive colloid layer 313 device, which is then transferred onto the target substrate. The transfer device 30 drives the driving device layer 312, so that the driving device layer 312 drives the light emitting device 30 to emit light. The light emitted by the light-emitting device 30 passes through the second adhesive colloid layer 315, the adhesive substrate 314 to the first adhesive colloid layer 313, so that the viscosity of the first adhesive colloid layer 313 decreases after receiving the light, resulting in its stickiness. The connected microdevices are transferred to the target substrate. Since the first adhesive layer 313 is a non-reusable photodegradable adhesive, it is necessary to peel off the adhesive substrate 314 to separate the adhesive substrate 314 and the adhesive bonded on the adhesive substrate 314 after completing a micro-LED transfer. The first adhesive colloid layer 313, and then the unused adhesive substrate 314 and the first adhesive colloid layer 313 are bonded on the second adhesive colloid layer 315 away from the driving device layer 312, and the above steps are repeated to complete a large-scale transfer of microdevices. It can be understood that, for example, an adhesive gel is disposed between the adhesive substrate 314 and the first adhesive gel layer 313 , and the viscosity of the adhesive gel does not change substantially under the irradiation of the light emitting device 30 .
进一步地,参照图14,为了实现更精准位置的解黏,第一解黏胶体层313远离所 述黏接基板314的一侧上设置有黏接凸起3131。黏接凸起3131用于黏接待转移的微型器件。黏接凸起3151的数量为多个,其位置与对应发光器件30的位置一一对应,如此能实现发光器件30发出的光线穿过第二黏接胶体315、黏接基板314、第一黏接胶体层313到达黏接凸起3151,从而降低黏接凸起3151与其黏接的微型器件的黏接强度,完成微型器件的精确转移。Further, referring to FIG. 14 , in order to realize debonding at a more precise position, a bonding protrusion 3131 is provided on the side of the first debonding gel layer 313 away from the bonding substrate 314 . The bonding protrusions 3131 are used for bonding micro devices to be transferred. The number of adhesive protrusions 3151 is multiple, and their positions correspond to the positions of the corresponding light emitting devices 30 one by one, so that the light emitted by the light emitting device 30 can pass through the second adhesive gel 315, the adhesive substrate 314, the first adhesive The adhesive layer 313 reaches the bonding protrusion 3151, thereby reducing the bonding strength of the bonding protrusion 3151 and the micro-device bonded thereto, and completing the precise transfer of the micro-device.
综上所述,本申请第三实施例提供的转移装置,通过将能实现窄发光的发光器件设置在转移装置上,解决了转移装置中因发光器件因出光角度大以及侧面出光而对相邻区域造成响的问题,从而实现精确位置的解黏,提高微型器件转移良率以及转移可靠性。To sum up, the transfer device provided by the third embodiment of the present application solves the problems caused by the light emitting device in the transfer device due to the large light emitting angle and the side light emission to the adjacent light emitting device by arranging the light emitting device capable of realizing narrow light emission on the transfer device. The problem of noise caused by the area, so as to realize the debonding of the precise position, improve the transfer yield and transfer reliability of micro devices.
此外,可以理解的是,前述各个实施例仅为本申请的示例性说明,在技术特征不冲突、结构不矛盾、不违背本申请的申请目的前提下,各个实施例的技术方案可以任意组合、搭配使用。In addition, it can be understood that the above-mentioned embodiments are only exemplary illustrations of the present application. On the premise that the technical features do not conflict, the structures do not contradict, and the application objective of the present application is not violated, the technical solutions of the various embodiments can be combined arbitrarily, For use with.
最后应说明的是:以上实施例仅用以说明本申请的技术方案,而非对其限制;尽管参照前述实施例对本申请进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例技术方案的精神和范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, rather than limiting them; although the present application has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: it can still Modifications are made to the technical solutions described in the foregoing embodiments, or equivalent replacements are made to some of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the various embodiments of the present application.

Claims (11)

  1. 一种发光器件,其特征在于,包括:A light emitting device, characterized in that it comprises:
    发光功能层,设置有出光面;The light-emitting functional layer is provided with a light-emitting surface;
    第一电极,设置在所述发光功能层的一侧且电连接所述发光功能层;a first electrode, disposed on one side of the light-emitting functional layer and electrically connected to the light-emitting functional layer;
    第二电极,设置在所述发光功能层上与所述第一电极的同一侧且分别电连接所述发光功能层;The second electrode is arranged on the same side of the light-emitting functional layer as the first electrode and is electrically connected to the light-emitting functional layer;
    遮光层,覆盖在所述出光面上,所述遮光层上设置有出光口以露出所述发光功能层发出的光线,所述出光口的面积小于所述出光面的面积。A light-shielding layer covers the light-emitting surface. A light-shielding opening is provided on the light-shielding layer to expose the light emitted by the light-emitting functional layer. The area of the light-shielding opening is smaller than that of the light-emitting surface.
  2. 如权利要求1所述的发光器件,其特征在于,所述发光功能层包括:The light-emitting device according to claim 1, wherein the light-emitting functional layer comprises:
    第一掺杂类型半导体层,电连接所述第一电极;a first doping type semiconductor layer electrically connected to the first electrode;
    第二掺杂类型半导体层,电连接所述第二电极;a second doping type semiconductor layer electrically connected to the second electrode;
    有源层,设置所述第一掺杂类型半导体层和所述第二掺杂类型半导体之间;an active layer disposed between the first doping type semiconductor layer and the second doping type semiconductor;
    缓冲层,位于所述第二掺杂类型半导体层远离所述第二电极的一侧;a buffer layer located on a side of the second doping type semiconductor layer away from the second electrode;
    其中,所述出光面位于所述缓冲层远离所述第二掺杂类型半导体层的一侧,所述第一电极位于所述第一掺杂类型半导体层远离所述有源层的一侧,所述第二电极位于所述第二掺杂类型半导体层远离所述缓冲层的一侧。Wherein, the light-emitting surface is located on a side of the buffer layer away from the second doped type semiconductor layer, and the first electrode is located on a side of the first doped type semiconductor layer away from the active layer, The second electrode is located on a side of the second doping type semiconductor layer away from the buffer layer.
  3. 如权利要求1所述的发光器件,其特征在于,所述发光功能层包括:The light-emitting device according to claim 1, wherein the light-emitting functional layer comprises:
    第一掺杂类型半导体层,连接所述第一电极;a first doping type semiconductor layer connected to the first electrode;
    第二掺杂类型半导体层,连接所述第二电极;a second doping type semiconductor layer connected to the second electrode;
    有源层,设置所述第一掺杂类型半导体层和所述第二掺杂类型半导体之间;an active layer disposed between the first doping type semiconductor layer and the second doping type semiconductor;
    缓冲层,位于所述第二掺杂类型半导体层背离所述第二电极的一侧;a buffer layer located on a side of the second doping type semiconductor layer away from the second electrode;
    其中,所述出光面和所述第一电极位于所述第一掺杂类型半导体层远离所述有源层的一侧,所述第一电极贯穿所述遮光层且连接所述第一掺杂类型半导体层,所述第二电极位于所述第二掺杂类型半导体层远离所述缓冲层的一侧。Wherein, the light emitting surface and the first electrode are located on the side of the first doped type semiconductor layer away from the active layer, and the first electrode penetrates through the light shielding layer and connects to the first doped semiconductor layer. type semiconductor layer, the second electrode is located on a side of the second doping type semiconductor layer away from the buffer layer.
  4. 如权利要求1所述的发光器件,其特征在于,所述遮光层还覆盖在所述发光功能层上除所述出光面之外的其它表面,所述第一电极和所述第二电极分别贯穿所述遮光层。The light-emitting device according to claim 1, wherein the light-shielding layer also covers other surfaces on the light-emitting functional layer except the light-emitting surface, and the first electrode and the second electrode are respectively through the shading layer.
  5. 如权利要求1所述的发光器件,其特征在于,所述遮光层包括绝缘层和金属层,所述金属层位于所述绝缘层远离所述发光功能层的一侧。The light-emitting device according to claim 1, wherein the light-shielding layer comprises an insulating layer and a metal layer, and the metal layer is located on a side of the insulating layer away from the light-emitting functional layer.
  6. 如权利要求1所述的发光器件,其特征在于,所述遮光层为分布式布拉格发射镜。The light emitting device according to claim 1, characterized in that the light shielding layer is a distributed Bragg mirror.
  7. 如权利要求1所述的发光器件,其特征在于,所述发光器件还包括聚光透镜,所述聚光透镜设置在所述出光口处并覆盖所述出光口。The light emitting device according to claim 1, further comprising a condensing lens, the condensing lens is arranged at the light outlet and covers the light outlet.
  8. 如权利要求1所述的发光器件,其特征在于,所述出光口包括多个具有镂空图案的子出光口。The light emitting device according to claim 1, wherein the light outlet comprises a plurality of sub-light outlets with hollow patterns.
  9. 一种转移装置,其特征在于,包括:A transfer device, characterized in that it comprises:
    转移基板;transfer substrate;
    驱动器件层,设置在所述转移基板上;a driving device layer disposed on the transfer substrate;
    如权利要求1-8任意一项所述的发光器件,设置在所述驱动器件层上远离所述转移基板的一侧且电连接所述驱动器件层;The light emitting device according to any one of claims 1-8, which is arranged on the side of the driving device layer away from the transfer substrate and electrically connected to the driving device layer;
    第一黏接胶体层,设置在所述驱动器件层上远离所述转移基板的一侧。The first adhesive colloid layer is disposed on the side of the driving device layer away from the transfer substrate.
  10. 如权利要求9所述的转移装置,其特征在于,还包括:The transfer device according to claim 9, further comprising:
    第二黏接胶体层,粘贴在所述驱动基板远离所述转移基板的一侧且覆盖所述发光器件;A second adhesive colloid layer, pasted on the side of the driving substrate away from the transfer substrate and covering the light emitting device;
    黏接基板,设置在所述第一黏接胶体层和所述第二黏接胶体层之间。The adhesive substrate is arranged between the first adhesive colloid layer and the second adhesive colloid layer.
  11. 如权利要求9或10所述的转移装置,其特征在于,所述第一黏接胶体层上远离所述驱动基板的一侧上设置有黏接凸起,所述黏接凸起与所述发光器件对应设置。The transfer device according to claim 9 or 10, wherein an adhesive protrusion is arranged on the side of the first adhesive colloid layer away from the driving substrate, and the adhesive protrusion is connected to the The light emitting device is set accordingly.
PCT/CN2021/138164 2021-12-15 2021-12-15 Light-emitting device and transfer apparatus WO2023108451A1 (en)

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