WO2023096440A1 - Multilayer polyimide film and method for manufacturing same - Google Patents

Multilayer polyimide film and method for manufacturing same Download PDF

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WO2023096440A1
WO2023096440A1 PCT/KR2022/018954 KR2022018954W WO2023096440A1 WO 2023096440 A1 WO2023096440 A1 WO 2023096440A1 KR 2022018954 W KR2022018954 W KR 2022018954W WO 2023096440 A1 WO2023096440 A1 WO 2023096440A1
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mol
dianhydride
polyimide film
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French (fr)
Korean (ko)
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유대건
김동영
원동영
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피아이첨단소재 주식회사
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00Metals, their alloys or their compounds
    • B32B2311/12Copper
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Definitions

  • the present invention relates to a multilayer polyimide film having excellent dimensional stability and excellent adhesive strength, and more particularly, to a multilayer polyimide film having both high thermal dimensional stability and high dimensional stability against moisture and excellent adhesive strength, and a manufacturing method thereof. .
  • Polyimide (PI) is a polymer material with the highest level of heat resistance, chemical resistance, electrical insulation, chemical resistance and weather resistance among organic materials based on an imide ring with excellent chemical stability along with a rigid aromatic main chain. am.
  • Polyimide films are in the limelight as materials for various electronic devices requiring the above-described characteristics.
  • microelectronic parts to which polyimide films are applied include flexible thin circuit boards with high circuit integration to respond to the lightening and miniaturization of electronic products.
  • Polyimide films are particularly widely used as insulating films for thin circuit boards. there is.
  • the thin circuit board generally has a structure in which a circuit including metal foil is formed on an insulating film, and this thin circuit board is referred to as a flexible metal foil clad laminate in a broad sense, and a thin copper plate is used as a metal foil. When used, it is also referred to as Flexible Copper Clad Laminate (FCCL) in a narrower sense.
  • FCCL Flexible Copper Clad Laminate
  • a method for producing a flexible metal foil laminate for example, (i) a casting method in which polyamic acid, which is a precursor of polyimide, is cast or coated on a metal foil and then imidized, (ii) sputtering and (iii) a lamination method in which a polyimide film and a metal foil are bonded with heat and pressure through a thermoplastic polyimide.
  • the metallization method produces, for example, a flexible metal clad laminate by sputtering a metal such as copper on a polyimide film having a thickness of 20 to 38 ⁇ m, and sequentially depositing a tie layer and a seed layer. It is a method of doing, and has an advantage in forming an ultra-fine circuit having a circuit pattern pitch of 35 ⁇ m or less, and is widely used in manufacturing a flexible metal foil laminate for COF (chip on film).
  • a polyimide film used in a metallized flexible metal foil laminate should have high dimensional stability.
  • dimensional stability is measured by thermal dimensional stability represented by a thermal expansion coefficient, but dimensional stability to moisture represented by a hygroscopic expansion coefficient is gradually increasing in importance as well as thermal dimensional stability.
  • a polyimide film having high dimension limitation has a problem in that adhesion to sputter metal plating is generally lowered.
  • Patent Document 1 Republic of Korea Patent Publication No. 10-2012-0133807
  • an object of the present invention is to provide a polyimide multilayer film having high thermal dimensional stability, high dimensional stability against moisture, and excellent adhesive strength at the same time.
  • One aspect of the present invention for achieving the above object includes a first skin layer and a second skin layer respectively formed on one outer surface of the core layer and the opposite surface of the outer surface,
  • Adhesion with copper foil is 0.8 kgf / cm or more
  • a multilayer polyimide film is provided.
  • Another aspect of the present invention includes the multilayer polyimide film and the electrically conductive metal foil,
  • a flexible metal foil laminate is provided.
  • Another aspect of the present invention includes the flexible metal foil laminate,
  • the present invention provides a polyimide film excellent in both thermal dimensional stability and dimensional stability against moisture, as well as adhesive strength, by providing a polyimide film in which the composition ratio and reaction ratio of dianhydride and diamine components are adjusted.
  • Such a polyimide film can be applied to various fields requiring a polyimide film having excellent dimensional stability and adhesive strength, for example, a flexible metal foil laminate manufactured by a metallization method or an electronic component including such a flexible metal foil laminate.
  • dianhydride acid is intended to include its precursors or derivatives, which technically may not be dianhydride acids, but will nonetheless react with diamines to form polyamic acids, which in turn polyamic acids. can be converted to mid.
  • diamine is intended to include precursors or derivatives thereof, which may not technically be diamines, but will nonetheless react with dianhydrides to form polyamic acids, which in turn will form polyamic acids. can be converted to mead
  • the multilayer polyimide film according to one embodiment of the present invention includes a first skin layer and a second skin layer respectively formed on one outer surface of the core layer and the opposite surface of the outer surface, and has an adhesive strength with copper foil of 0.8 kgf/ cm or more.
  • the multi-layer polyimide film may be a multi-layer polyimide film having a three-layer structure in which a first skin layer and a second skin layer are respectively formed on one outer surface of the core layer and the opposite surface of the outer surface around the core layer. .
  • the components and composition ratios of the first skin layer and the second skin layer may be the same or different.
  • the thickness of the first skin layer and the second skin layer may be the same or different.
  • the copper foil may be formed through a sputter-electroplating method on one or more surfaces of the multilayer polyimide film of the present application.
  • the multilayer polyimide film has a thermal expansion coefficient of 2.0 ppm/°C or more and 6.0 ppm/°C or less in a transverse direction (TD), and a hygroscopic expansion coefficient in a transverse direction (TD) 3.0 ppm/RH% or more, and may be 6.0 ppm/RH% or less.
  • the thermal expansion coefficient in the transverse direction (TD) may be, for example, 2.5 ppm/°C or more and 6.0 ppm/°C or less.
  • the moisture absorption expansion coefficient in the transverse direction (TD) may be, for example, 4.5 ppm/RH% or more and 6.0 ppm/RH% or less.
  • the core layer of the multilayer polyimide film includes a dianhydride component including biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA), and paraphenylene diamine.
  • BPDA biphenyltetracarboxylic dianhydride
  • PMDA pyromellitic dianhydride
  • PPD PPD
  • m- tolidine can be obtained by imidization reaction of a polyamic acid solution containing a diamine component.
  • At least one of the first skin layer and the second skin layer is biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, oxydiphthalic anhydride (ODPA) and benzophenone tetracarboxylic Any one selected from the group consisting of dianhydride (BTDA), dianhydride (BTDA), dianhydride (2 or more), and oxydianiline (ODA) and 1,3-bisaminophenoxybenzene (TPE-R) It can be obtained by imidization reaction of the polyamic acid solution containing the diamine component containing the above.
  • At least one of the first skin layer and the second skin layer uses biphenyltetracarboxylic dianhydride and pyromellitic dianhydride together as a dianhydride component, or biphenyltetracarboxylic dianhydride.
  • ricdianhydride, pyromellitic dianhydride and oxydiphthalic dianhydride together, or biphenyltetracarboxylic dianhydride, pyromellitic dianhydride and benzophenonetetracarboxylic dianhydride together can be used
  • At least one of the first skin layer and the second skin layer may use only oxydianiline or both oxydianiline and 1,3-bisaminophenoxybenzene as a diamine component.
  • the core layer has a biphenyltetracarboxylic dianhydride content of 40 mol% or more and 60 mol% or less, based on 100 mol% of the total content of the dianhydride component, and the pyromelli
  • the content of thicdianhydride is 40 mol% or more and 60 mol% or less
  • the paraphenylene diamine content is 50 mol% or more and 70 mol% or less based on 100 mol% of the total content of the diamine component
  • the content of m-tolidine may be 30 mol% or more and 50 mol% or less.
  • At least one of the first skin layer and the second skin layer has a biphenyltetracarboxylic dianhydride content of 15% based on 100 mol% of the total content of the dianhydride component. mol% or more and 85 mol% or less, the content of the pyromellitic dianhydride is 15 mol% or more and 60 mol% or less, the content of the oxydiphthalic anhydride is 35 mol% or less, and the benzophenonetetracarboxylic The content of ricdianhydride is 35 mol% or less, the content of oxydianiline is 20 mol% or more and 100 mol% or less based on 100 mol% of the total content of the diamine component, and 1,3-bisamino The content of phenoxybenzene may be 80 mol% or less.
  • Para-phenylene diamine of the present invention is a rigid monomer, and as the content of para-phenylene diamine increases, the synthesized polyimide has a more linear structure and contributes to improving the mechanical properties of the polyimide.
  • m-tolidine has a methyl group that is particularly hydrophobic, it contributes to the low moisture absorption property related to the dimensional stability of the polyimide film against water.
  • the polyimide chain derived from the biphenyltetracarboxylic dianhydride of the present invention has a structure called a charge transfer complex (CTC), that is, an electron donor and an electron acceptor. They have a regular linear structure located close to each other, and intermolecular interactions are strengthened.
  • CTC charge transfer complex
  • this structure has an effect of preventing hydrogen bonding with moisture, it is possible to maximize the effect of lowering the hygroscopicity of the polyimide film, which affects the dimensional stability to moisture by affecting the lowering of the moisture absorption rate.
  • pyromellitic dianhydride is a dianhydride component having a relatively rigid structure, and is preferable in that it can impart appropriate elasticity to the polyimide film.
  • the content ratio of dianhydride is important.
  • the content ratio of biphenyltetracarboxylic dianhydride decreases, it becomes difficult to expect a low moisture absorption rate due to the CTC structure, and dimensional stability against moisture also deteriorates.
  • biphenyltetracarboxylic dianhydride contains two benzene rings corresponding to the aromatic part
  • pyromellitic dianhydride contains one benzene ring corresponding to the aromatic part
  • the increase in the pyromellitic dianhydride content in the dianhydride component can be understood as an increase in the imide group in the molecule based on the same molecular weight, which means that the polyimide polymer chain has an imide derived from the pyromellitic dianhydride. It can be understood that the ratio of the de group is relatively increased compared to the imide group derived from biphenyltetracarboxylic dianhydride.
  • the increase in the pyromellitic dianhydride content can be seen as a relative increase in the imide group with respect to the entire polyimide film, and as a result, it is difficult to expect high dimensional stability against moisture due to a low moisture absorption.
  • the component having a relatively rigid structure is reduced, and thus the elasticity of the polyimide film may be lowered to a desired level or less.
  • the dimensional stability of the polyimide film may be adversely affected.
  • Some diamine components and some dianhydride components are reacted in an excess amount in a solvent to form a first composition, and some diamine components and some dianhydride components are reacted in an excess amount in another solvent to form a first composition.
  • a method of mixing the first and second compositions after forming the second composition and completing the polymerization wherein, if the diamine component is excessive when forming the first composition, the dianhydride component is added in excess in the second composition And, when the dianhydride component is excessive in the first composition, the diamine component is excessive in the second composition, and the first and second compositions are mixed so that the entire diamine component and the dianhydride component used in these reactions are substantially reduced.
  • the method of polymerizing by making it equimolar, etc. are mentioned.
  • the polymerization method of the polyamic acid as described above can be defined as a random polymerization method, and the polyimide film prepared from the polyamic acid of the present invention manufactured by the above process has dimensional stability and chemical resistance.
  • the height may be preferably applied in terms of maximizing the effect of the present invention.
  • the polymerization method of the polyamic acid that can be particularly preferably used in the present invention may be a block polymerization method.
  • the solvent for synthesizing the polyamic acid is not particularly limited, and any solvent can be used as long as it dissolves the polyamic acid, but an amide-based solvent is preferable.
  • the organic solvent may be an organic polar solvent, and in detail, may be an aprotic polar solvent, for example, N,N-dimethylformamide (DMF), N,N -It may be one or more selected from the group consisting of dimethylacetamide, N-methyl-pyrrolidone (NMP), gamma butyrolactone (GBL), and diglyme, but is not limited thereto, and may be used alone as needed Or it can use in combination of 2 or more types.
  • DMF N,N-dimethylformamide
  • NMP N-methyl-pyrrolidone
  • GBL gamma butyrolactone
  • diglyme but is not limited thereto, and may be used alone as needed Or it can use in combination of 2 or more types.
  • N,N-dimethylformamide and N,N-dimethylacetamide may be particularly preferably used as the organic solvent.
  • a filler may be added for the purpose of improving various properties of the film, such as sliding properties, thermal conductivity, corona resistance, and loop hardness.
  • the filler added is not particularly limited, but preferable examples include silica, titanium oxide, alumina, silicon nitride, boron nitride, calcium hydrogen phosphate, calcium phosphate, mica and the like.
  • the particle size of the filler is not particularly limited, and may be determined according to the film properties to be modified and the type of filler to be added. Generally, the average particle size is 0.05 to 100 ⁇ m, preferably 0.1 to 75 ⁇ m, more preferably 0.1 to 50 ⁇ m, particularly preferably 0.1 to 25 ⁇ m.
  • the addition amount of the filler is not particularly limited either, and may be determined according to the properties of the film to be modified, the particle size of the filler, and the like. Generally, the added amount of the filler is 0.01 to 100 parts by weight, preferably 0.01 to 90 parts by weight, and more preferably 0.02 to 80 parts by weight, based on 100 parts by weight of the polyimide.
  • the added amount of the filler is less than this range, the modification effect by the filler is difficult to appear, and if it exceeds this range, the mechanical properties of the film may be significantly damaged.
  • the method of adding the filler is not particularly limited, and any known method may be used.
  • the polyimide film may be prepared by thermal imidation or chemical imidation.
  • it may be prepared by a complex imidation method in which thermal imidation and chemical imidation are combined.
  • the thermal imidization method is a method of inducing an imidization reaction by excluding a chemical catalyst and using a heat source such as hot air or an infrared dryer.
  • the amic acid group present in the gel film may be imidized by heat-treating the gel film at a variable temperature in the range of 100 to 600 ° C, specifically 200 to 500 ° C, more specifically, Amic acid groups present in the gel film may be imidized by heat treatment at 300 to 500 °C.
  • amic acid about 0.1 mol% to 10 mol% may be imidized even in the process of forming the gel film. This may also be included in the scope of the thermal imidization method.
  • a polyimide film may be prepared using a dehydrating agent and an imidizing agent according to a method known in the art.
  • a dehydrating agent and an imidizing agent are added to a polyamic acid solution, and then heated at 80 to 200 ° C, preferably 100 to 180 ° C, partially cured and dried, and then 5 to 400 ° C at 200 to 400 ° C.
  • a polyimide film can be manufactured by heating for a second.
  • the multilayer polyimide film of the present invention described so far may be manufactured using at least one method of co-extrusion or coating.
  • a multi-layer extrusion method is performed on a casting belt using a co-extrusion die, and then cured to produce a polyimide film having a multi-layer structure.
  • productivity is high, and different types of polyimide resins are mixed between interfaces to ensure high interfacial adhesion reliability.
  • a first filling of a first polyamic acid solution or a first solution that is a first polyimide resin prepared by imidizing the first polyamic acid solution is filled in a first reservoir.
  • the first polyamic acid solution is for forming a core layer, and includes a dianhydride component including biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA), and paraphenylene diamine (PPD). It is preferably prepared by polymerizing a diamine component including ) and m-tolidine.
  • BPDA biphenyltetracarboxylic dianhydride
  • PMDA pyromellitic dianhydride
  • PPD paraphenylene diamine
  • the second polyamic acid solution is for forming the first skin layer and the second skin layer, and includes biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, oxydiphthalic anhydride (ODPA) and benzophenone
  • a dianhydride component containing at least two selected from the group consisting of tetracarboxylic dianhydride (BTDA) and oxydianiline (ODA) and 1,3-bisaminophenoxybenzene (TPE-R) It is preferably prepared by polymerizing a diamine component containing at least one selected one.
  • the first polyamic acid solution is used as the first solution and the second polyamic acid solution is used as the second solution
  • the first solution and the second solution co-extruded before the curing step are imidized. It is preferable to proceed by further including an imidization step.
  • the present invention provides a flexible metal foil laminate comprising the above-described multilayer polyimide film and electrically conductive metal foil.
  • the metal foil used is not particularly limited, but in the case of using the flexible metal foil laminate of the present invention for electronic devices or electrical devices, for example, copper or copper alloy, stainless steel or its alloy, nickel or nickel alloy (42 alloy Also included), it may be a metal foil containing aluminum or aluminum alloy.
  • copper foils such as rolled copper foil and electrolytic copper foil are often used, and they can be preferably used in the present invention as well.
  • a rust prevention layer, a heat resistance layer, or an adhesive layer may be applied to the surface of these metal foils.
  • the thickness of the metal foil is not particularly limited, and may be any thickness capable of exhibiting sufficient functions depending on its use.
  • the flexible metal foil laminate according to the present invention may have a structure in which metal foil is laminated on at least one surface of the multilayer polyimide film.
  • Biphenyltetracarboxylic dianhydride BPDA
  • pyromellitic dianhydride PMDA
  • ODPA oxydiphthalic anhydride
  • BTDA benzophenonetetracarboxylic dianhydride
  • PPD paraphenylene diamine
  • MTD m-tolidine
  • TPE-R 1,3-bisaminophenoxybenzene
  • ODA oxydianiline
  • a second polyamic acid solution to be used in preparing the first and second skin layers was prepared by polymerization of dianhydride acid and diamine components selected from sibenzene and oxydianiline.
  • the core layer was prepared by coextruding the first polyamic acid solution
  • the first skin layer and the second skin layer were prepared by coextruding the second polyamic acid solution.
  • the solvent is generally an amide-based solvent, such as an aprotic solvent, such as N,N'-dimethylformamide, N,N'-dimethylacetamide, N-methyl-pyrroly money, or a combination thereof.
  • an aprotic solvent such as N,N'-dimethylformamide, N,N'-dimethylacetamide, N-methyl-pyrroly money, or a combination thereof.
  • the input form of the dianhydride acid and diamine component can be added in the form of powder, lump or solution, and it is preferable to introduce the reaction in the form of a powder to proceed with the reaction in the initial stage of the reaction, and then add in the form of a solution to adjust the polymerization viscosity thereafter. .
  • the obtained polyamic acid solution may be mixed with an imidization catalyst and a dehydrating agent and applied to a support.
  • Examples of the catalyst used include tertiary amines (eg, isoquinoline, ⁇ -picoline, pyridine, etc.), and examples of the dehydrating agent include anhydrous acid, but are not limited thereto.
  • composition and component ratio of the first skin layer and the second skin layer of Examples 1 to 6 and Comparative Example 9 were the same, and the thickness was also prepared the same.
  • Comparative Examples 1 to 8 corresponded to single-layer polyimide films, and only the core layer was prepared.
  • CTE coefficient of thermal expansion
  • CHE coefficient of hydroscopic expansion
  • CTE coefficient of thermal expansion
  • TA's thermomechanical analyzer Q400 model was used. After cutting the prepared multilayer polyimide film into a width of 4 mm and a length of 20 mm, 10 After the temperature was raised from 30 °C to 400 °C at a rate of °C/min, the slope was measured from 50 °C to 200 °C while cooling at a rate of 10 °C/min.
  • the hygroscopic expansion coefficient (CHE) was obtained by adjusting the humidity to 3% RH at 25°C and fully saturated under the minimum weight applied (about 1 g for a sample of 25 mm ⁇ 150 mm) so that the manufactured multilayer polyimide film would not loosen. After that, the humidity was adjusted to 90% RH and similarly saturated moisture was absorbed, and then the dimensions were measured, and the dimensional change rate was measured from both results.
  • a copper thin layer having a thickness of about 80-300 nm as a copper seed layer for an electroplating electrode is deposited on the prepared multilayer polyimide film through sputtering, and a copper conductive layer having a thickness of about 8-9 ⁇ m through electroplating. was formed to produce a flexible metal foil laminate for COF.
  • the multilayer polyimide films of Examples 1 to 6 had a thermal expansion coefficient of 2.0 ppm/°C or more in the width direction and 6.0 ppm/°C or less, and a hygroscopic expansion coefficient in the width direction of 3.0 ppm/RH% or more and 6.0 ppm/°C or more. It is ppm/RH% or less, and the adhesive strength with copper foil is 0.8 kgf/cm or more.
  • the polyimide films of Comparative Examples 1 to 8 and the multi-layer polyimide film of Comparative Example 9 which differ in component and/or composition ratio from those of the Examples, consisting of only one layer, have thermal expansion coefficient, hygroscopic expansion coefficient, and correlation with copper foil.
  • the multilayer polyimide film of the present application did not satisfy the required properties.
  • the multilayer polyimide films of Examples 1 to 6 prepared within the appropriate range of the present application were excellent in thermal dimensional stability, dimensional stability against moisture, and adhesive strength with copper foil, but outside the appropriate range of the present application, It was confirmed that it was difficult to satisfy all of the thermal dimensional stability, moisture dimensional stability, and adhesive strength with the copper foil of the multilayer polyimide film.
  • a multilayer polyimide film that satisfies all of the various conditions that can be applied to the application field while having excellent dimensional stability and adhesion to the copper foil is a multilayer polyimide film manufactured within the appropriate scope of the present application.
  • the present invention provides a polyimide film excellent in both thermal dimensional stability and dimensional stability against moisture, as well as adhesive strength, by providing a polyimide film in which the composition ratio and reaction ratio of dianhydride and diamine components are adjusted.
  • Such a polyimide film can be applied to various fields requiring a polyimide film having excellent dimensional stability and adhesive strength, for example, a flexible metal foil laminate manufactured by a metallization method or an electronic component including such a flexible metal foil laminate.

Abstract

The present invention provides a multilayer polyimide film and a manufacturing method therefor, wherein the multilayer polyimide film comprises a first skin layer and a second skin layer that are disposed on one outer surface and an opposite surface thereto in a core layer, respectively, and has an adhesive force to copper foil of 0.8 kgf/cm or greater.

Description

다층 구조의 폴리이미드 필름 및 이의 제조방법Polyimide film with multi-layer structure and manufacturing method thereof
본 발명은 치수 안정성이 우수하면서도 접착력이 우수한 다층 폴리이미드 필름에 관한 것으로, 더욱 상세하게는 열적 치수 안정성과 수분에 대한 치수 안정성이 모두 높고, 접착력이 우수한 다층 폴리이미드 필름 및 그 제조방법에 관한 것이다.The present invention relates to a multilayer polyimide film having excellent dimensional stability and excellent adhesive strength, and more particularly, to a multilayer polyimide film having both high thermal dimensional stability and high dimensional stability against moisture and excellent adhesive strength, and a manufacturing method thereof. .
폴리이미드(polyimide, PI)는 강직한 방향족 주쇄와 함께 화학적 안정성이 매우 우수한 이미드 고리를 기초로 하여, 유기 재료들 중에서도 최고 수준의 내열성, 내약품성, 전기 절연성, 내화학성, 내후성을 가지는 고분자 재료이다. Polyimide (PI) is a polymer material with the highest level of heat resistance, chemical resistance, electrical insulation, chemical resistance and weather resistance among organic materials based on an imide ring with excellent chemical stability along with a rigid aromatic main chain. am.
폴리이미드 필름은 전술한 특성들이 요구되는 다양한 전자 디바이스의 소재로서 각광받고 있다.Polyimide films are in the limelight as materials for various electronic devices requiring the above-described characteristics.
폴리이미드 필름이 적용되는 미소 전자 부품의 예로는 전자제품의 경량화와 소형화에 대응 가능하도록 회로 집적도가 높고 유연한 박형 회로기판을 들 수 있으며, 폴리이미드 필름은 특히 박형 회로기판의 절연필름으로 널리 이용되고 있다.Examples of microelectronic parts to which polyimide films are applied include flexible thin circuit boards with high circuit integration to respond to the lightening and miniaturization of electronic products. Polyimide films are particularly widely used as insulating films for thin circuit boards. there is.
상기 박형 회로기판은, 절연필름 상에 금속박을 포함하는 회로가 형성되어 있는 구조가 일반적이며, 이러한 박형 회로기판을 넓은 의미로서 연성 금속박 적층판(Flexible Metal Foil Clad Laminate)이라 지칭하고 금속박으로 얇은 구리판을 이용할 때에는 보다 좁은 의미에서 연성 동박 적층판(Flexible Copper Clad Laminate; FCCL)으로 지칭하기도 한다.The thin circuit board generally has a structure in which a circuit including metal foil is formed on an insulating film, and this thin circuit board is referred to as a flexible metal foil clad laminate in a broad sense, and a thin copper plate is used as a metal foil. When used, it is also referred to as Flexible Copper Clad Laminate (FCCL) in a narrower sense.
연성 금속박 적층판의 제조 방법으로는, 예를 들면 (i) 금속박 상에 폴리이미드의 전구체인 폴리아믹산을 유연(casting), 또는 도포한 후, 이미드화하는 캐스팅법, (ii) 스퍼터링(Sputtering)에 의해 폴리이미드 필름 상에 직접 금속층을 설치하는 메탈라이징법, 및 (iii) 열가소성 폴리이미드를 통해 폴리이미드 필름과 금속박을 열과 압력으로 접합시키는 라미네이트법을 들 수 있다.As a method for producing a flexible metal foil laminate, for example, (i) a casting method in which polyamic acid, which is a precursor of polyimide, is cast or coated on a metal foil and then imidized, (ii) sputtering and (iii) a lamination method in which a polyimide film and a metal foil are bonded with heat and pressure through a thermoplastic polyimide.
특히, 메탈라이징법은 예를 들어, 20 내지 38 ㎛ 두께의 폴리이미드 필름상에 구리 등의 금속을 스퍼터링하여, 타이(Tie)층, 시드(Seed)층을 순차적으로 증착함으로써 연성 금속박 적층판을 생산하는 방법이며, 회로 패턴의 피치(pitch)가 35 ㎛ 이하인 초미세회로를 형성시키는데 유리한 점이 있으며, COF(chip on film)용 연성 금속박 적층판을 제조하는데 널리 사용되고 있다.In particular, the metallization method produces, for example, a flexible metal clad laminate by sputtering a metal such as copper on a polyimide film having a thickness of 20 to 38 μm, and sequentially depositing a tie layer and a seed layer. It is a method of doing, and has an advantage in forming an ultra-fine circuit having a circuit pattern pitch of 35 μm or less, and is widely used in manufacturing a flexible metal foil laminate for COF (chip on film).
메탈라이징법에 의한 연성 금속박 적층판에 사용되는 폴리이미드 필름은 높은 치수 안정성을 가져야 한다. 통상, 열팽창 계수로 나타내는 열적 치수 안정성으로 치수 안정성이 측정되고 있지만, 열적 치수 안정성 못지 않게 흡습팽창계수로 나타내는 수분에 대한 치수 안정성도 중요성이 점차 커지고 있다.A polyimide film used in a metallized flexible metal foil laminate should have high dimensional stability. Usually, dimensional stability is measured by thermal dimensional stability represented by a thermal expansion coefficient, but dimensional stability to moisture represented by a hygroscopic expansion coefficient is gradually increasing in importance as well as thermal dimensional stability.
즉, 열적 치수 안정성과 수분에 대한 치수 안정성이 모두 우수한 폴리이미드 필름에 대한 요구가 증가하고 있으나, 실제 열팽창 계수가 낮은 열적 치수 안정성이 높은 구조의 폴리이미드 필름을 설계할 경우, 수분에 대한 치수 안정성이 낮아지는 문제점이 대두되고 있다.That is, although there is an increasing demand for polyimide films having excellent thermal dimensional stability and dimensional stability against moisture, when designing a polyimide film having a structure with high thermal dimensional stability with a low coefficient of actual thermal expansion, dimensional stability against moisture The problem of this lowering is emerging.
또한, 치수 한정성이 높은 폴리이미드 필름은 통상 스퍼터 금속 도금과의 접착력이 저하되는 문제점을 가지고 있다.In addition, a polyimide film having high dimension limitation has a problem in that adhesion to sputter metal plating is generally lowered.
따라서, 높은 열적 치수 안정성과 수분에 대한 높은 치수 안정성을 가질 뿐만 아니라 우수한 접착력을 가지는 폴리이미드 필름이 절실히 요구되고 있다.Accordingly, there is an urgent need for a polyimide film having excellent adhesive strength as well as high thermal dimensional stability and high water dimensional stability.
이상의 배경기술에 기재된 사항은 발명의 배경에 대한 이해를 돕기 위한 것으로서, 이 기술이 속하는 분야에서 통상의 지식을 가진 자에게 이미 알려진 종래기술이 아닌 사항을 포함할 수 있다.Matters described in the background art above are intended to aid understanding of the background of the invention, and may include matters other than those of the prior art already known to those skilled in the art.
[선행기술문헌][Prior art literature]
[특허문헌][Patent Literature]
(특허문헌 1) 대한민국 공개특허공보 제10-2012-0133807호(Patent Document 1) Republic of Korea Patent Publication No. 10-2012-0133807
이에 본 발명은 높은 열적 치수 안정성과 수분에 대한 높은 치수 안정성과 더불어 우수한 접착력을 동시에 가지는 폴리이미드 다층 필름을 제공하는 것을 목적으로 한다. Accordingly, an object of the present invention is to provide a polyimide multilayer film having high thermal dimensional stability, high dimensional stability against moisture, and excellent adhesive strength at the same time.
그러나, 본 발명이 해결하고자 하는 과제는 이상에서 언급한 과제로 제한되지 않으며, 언급되지 않은 또 다른 과제들은 아래의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.However, the problem to be solved by the present invention is not limited to the above-mentioned problem, and other problems not mentioned will be clearly understood by those skilled in the art from the description below.
상기와 같은 목적을 달성하기 위한 본 발명의 일 측면은 코어층의 일 외측면 및 상기 외측면의 반대면에 각각 형성된 제1 스킨층 및 제2 스킨층을 포함하고,One aspect of the present invention for achieving the above object includes a first skin layer and a second skin layer respectively formed on one outer surface of the core layer and the opposite surface of the outer surface,
동박과의 접착력이 0.8 kgf/cm 이상인,Adhesion with copper foil is 0.8 kgf / cm or more,
다층 폴리이미드 필름을 제공한다.A multilayer polyimide film is provided.
본 발명의 다른 측면은 상기 다층 폴리이미드 필름과 전기 전도성의 금속박을 포함하는, Another aspect of the present invention includes the multilayer polyimide film and the electrically conductive metal foil,
연성 금속박 적층판을 제공한다.A flexible metal foil laminate is provided.
본 발명의 또 다른 측면은 상기 연성 금속박 적층판을 포함하는, Another aspect of the present invention includes the flexible metal foil laminate,
전자 부품을 제공한다.We provide electronic components.
본 발명은 이무수물산 및 디아민 성분의 조성비, 반응비 등이 조절된 폴리이미드 필름을 제공함으로써, 열적 치수 안정성과 수분에 대한 치수 안정성뿐만 아니라 접착력이 모두 우수한 폴리이미드 필름을 제공한다. The present invention provides a polyimide film excellent in both thermal dimensional stability and dimensional stability against moisture, as well as adhesive strength, by providing a polyimide film in which the composition ratio and reaction ratio of dianhydride and diamine components are adjusted.
이러한 폴리이미드 필름은 우수한 치수 안정성과 접착력의 폴리이미드 필름이 요구되는 다양한 분야, 예를 들어, 메탈라이징법에 의해 제조되는 연성 금속박 적층판 또는 이러한 연성 금속박 적층판을 포함하는 전자 부품에 적용이 가능하다.Such a polyimide film can be applied to various fields requiring a polyimide film having excellent dimensional stability and adhesive strength, for example, a flexible metal foil laminate manufactured by a metallization method or an electronic component including such a flexible metal foil laminate.
본 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니 되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다.The terms or words used in this specification and claims should not be construed as being limited to ordinary or dictionary meanings, and the inventors may appropriately define the concept of terms in order to explain their invention in the best way. It should be interpreted as a meaning and concept consistent with the technical idea of the present invention based on the principle that there is.
따라서, 본 명세서에 기재된 실시예의 구성은 본 발명의 가장 바람직한 하나의 실시예에 불과할 뿐이고 본 발명의 기술적 사상을 모두 대변하는 것은 아니므로, 본 출원시점에 있어서 이들을 대체할 수 있는 다양한 균등물과 변형예들이 존재할 수 있음을 이해하여야 한다.Therefore, since the configuration of the embodiments described in this specification is only one of the most preferred embodiments of the present invention and does not represent all of the technical spirit of the present invention, various equivalents and modifications that can replace them at the time of the present application It should be understood that examples may exist.
본 명세서에서 단수의 표현은 문맥상 명백하게 다르게 뜻하지 않는 한, 복수의 표현을 포함한다. 본 명세서에서, "포함하다", "구비하다" 또는 "가지다" 등의 용어는 실시된 특징, 숫자, 단계, 구성 요소 또는 이들을 조합한 것이 존재함을 지정하려는 것이지, 하나 또는 그 이상의 다른 특징들이나 숫자, 단계, 구성 요소, 또는 이들을 조합한 것들의 존재 또는 부가 가능성을 미리 배제하지 않는 것으로 이해되어야 한다.In this specification, singular expressions include plural expressions unless the context clearly dictates otherwise. In this specification, terms such as "comprise", "comprise" or "having" are intended to indicate that there is an embodied feature, number, step, component, or combination thereof, but one or more other features or It should be understood that the presence or addition of numbers, steps, components, or combinations thereof is not precluded.
본 명세서에서 "이무수물산"은 그 전구체 또는 유도체를 포함하는 것으로 의도되는데, 이들은 기술적으로는 이무수물산이 아닐 수 있지만, 그럼에도 불구하고 디아민과 반응하여 폴리아믹산을 형성할 것이며, 이 폴리아믹산은 다시 폴리이미드로 변환될 수 있다.As used herein, “dianhydride acid” is intended to include its precursors or derivatives, which technically may not be dianhydride acids, but will nonetheless react with diamines to form polyamic acids, which in turn polyamic acids. can be converted to mid.
본 명세서에서 "디아민"은 그의 전구체 또는 유도체를 포함하는 것으로 의도되는데, 이들은 기술적으로는 디아민이 아닐 수 있지만, 그럼에도 불구하고 디안하이드라이드와 반응하여 폴리아믹산을 형성할 것이며, 이 폴리아믹산은 다시 폴리이미드로 변환될 수 있다As used herein, "diamine" is intended to include precursors or derivatives thereof, which may not technically be diamines, but will nonetheless react with dianhydrides to form polyamic acids, which in turn will form polyamic acids. can be converted to mead
본 명세서에서 양, 농도, 또는 다른 값 또는 파라미터가 범위, 바람직한 범위 또는 바람직한 상한 값 및 바람직한 하한 값의 열거로서 주어지는 경우, 범위가 별도로 개시되는 지에 상관없이 임의의 한 쌍의 임의의 위쪽 범위 한계치 또는 바람직한 값 및 임의의 아래쪽 범위 한계치 또는 바람직한 값으로 형성된 모든 범위를 구체적으로 개시하는 것으로 이해되어야 한다.When amounts, concentrations, or other values or parameters herein are given as ranges, preferred ranges, or recitations of upper preferred and lower preferred values, any pair of any upper range limits, whether or not the ranges are separately disclosed, or It should be understood as specifically disclosing the preferred values and any lower range limits or all ranges formed from preferred values.
수치 값의 범위가 범위가 본 명세서에서 언급될 경우, 달리 기술되지 않는다면, 그 범위는 그 종점 및 그 범위 내의 모든 정수와 분수를 포함하는 것으로 의도된다. 본 발명의 범주는 범위를 정의할 때 언급되는 특정 값으로 한정되지 않는 것으로 의도된다.When a range of numerical values is recited herein, the range is intended to include its endpoints and all integers and fractions within the range, unless stated otherwise. It is intended that the scope of the present invention not be limited to the specific values recited when defining the range.
본 발명의 일 구현예에 의한 다층 폴리이미드 필름은 코어층의 일 외측면 및 상기 외측면의 반대면에 각각 형성된 제1 스킨층 및 제2 스킨층을 포함하고, 동박과의 접착력이 0.8 kgf/cm 이상일 수 있다.The multilayer polyimide film according to one embodiment of the present invention includes a first skin layer and a second skin layer respectively formed on one outer surface of the core layer and the opposite surface of the outer surface, and has an adhesive strength with copper foil of 0.8 kgf/ cm or more.
즉, 상기 다층 폴리이미드 필름은 코어층을 중심으로 코어층의 일 외측면 및 상기 외측면의 반대면에 각각 제1 스킨층과 제2 스킨층이 형성된 3층 구조의 다층 폴리이미드 필름일 수 있다.That is, the multi-layer polyimide film may be a multi-layer polyimide film having a three-layer structure in which a first skin layer and a second skin layer are respectively formed on one outer surface of the core layer and the opposite surface of the outer surface around the core layer. .
한편, 상기 제1 스킨층 및 제2 스킨층의 성분 및 조성비는 같거나 다를 수 있다.Meanwhile, the components and composition ratios of the first skin layer and the second skin layer may be the same or different.
또한, 상기 제1 스킨층 및 제2 스킨층의 두께는 같거나 다를 수 있다.In addition, the thickness of the first skin layer and the second skin layer may be the same or different.
상기 동박은 본원의 다층 폴리이미드 필름의 한 면 이상에 스퍼터(sputter)-전기 도금 방식을 통해서 형성될 수 있다.The copper foil may be formed through a sputter-electroplating method on one or more surfaces of the multilayer polyimide film of the present application.
일 구현예에 있어서 상기 다층 폴리이미드 필름의 폭 방향(Traverse direction, TD)의 열팽창계수가 2.0 ppm/℃ 이상이고, 6.0 ppm/℃ 이하이며, 폭 방향(Traverse direction, TD)의 흡습팽창계수가 3.0 ppm/RH% 이상이고, 6.0 ppm/RH% 이하일 수 있다.In one embodiment, the multilayer polyimide film has a thermal expansion coefficient of 2.0 ppm/°C or more and 6.0 ppm/°C or less in a transverse direction (TD), and a hygroscopic expansion coefficient in a transverse direction (TD) 3.0 ppm/RH% or more, and may be 6.0 ppm/RH% or less.
상기 폭 방향(Traverse direction, TD)의 열팽창계수는 예를 들어, 2.5 ppm/℃ 이상이고, 6.0 ppm/℃ 이하일 수 있다.The thermal expansion coefficient in the transverse direction (TD) may be, for example, 2.5 ppm/°C or more and 6.0 ppm/°C or less.
또한, 상기 폭 방향(Traverse direction, TD)의 흡습팽창계수는 예를 들어, 4.5 ppm/RH% 이상이고, 6.0 ppm/RH% 이하일 수 있다.In addition, the moisture absorption expansion coefficient in the transverse direction (TD) may be, for example, 4.5 ppm/RH% or more and 6.0 ppm/RH% or less.
일 구현예에 있어서, 상기 다층 폴리이미드 필름의 상기 코어층은 비페닐테트라카르복실릭디안하이드라이드(BPDA) 및 피로멜리틱디안하이드라이드(PMDA)를 포함하는 이무수물산 성분과, 파라페닐렌 디아민(PPD) 및 m-톨리딘(m-tolidine)을 포함하는 디아민 성분을 포함하는 폴리아믹산 용액을 이미드화 반응시켜 얻어질 수 있다.In one embodiment, the core layer of the multilayer polyimide film includes a dianhydride component including biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA), and paraphenylene diamine. (PPD) and m- tolidine (m-tolidine) can be obtained by imidization reaction of a polyamic acid solution containing a diamine component.
한편, 상기 제1 스킨층 및 상기 제2 스킨층 중 어느 하나 이상은 비페닐테트라카르복실릭디안하이드라이드, 피로멜리틱디안하이드라이드, 옥시디프탈릭안하이드라이드(ODPA) 및 벤조페논테트라카복실릭디안하이드라이드(BTDA)로 이루어진 그룹에서 선택된 2종 이상을 포함하는 이무수물산 성분과, 옥시디아닐린(ODA) 및 1,3-비스아미노페녹시벤젠(TPE-R)으로 이루어진 그룹에서 선택된 어느 하나 이상을 포함하는 디아민 성분을 포함하는 폴리아믹산 용액을 이미드화 반응시켜 얻어질 수 있다.On the other hand, at least one of the first skin layer and the second skin layer is biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, oxydiphthalic anhydride (ODPA) and benzophenone tetracarboxylic Any one selected from the group consisting of dianhydride (BTDA), dianhydride (BTDA), dianhydride (2 or more), and oxydianiline (ODA) and 1,3-bisaminophenoxybenzene (TPE-R) It can be obtained by imidization reaction of the polyamic acid solution containing the diamine component containing the above.
예를 들어, 상기 제1 스킨층 및 상기 제2 스킨층 중 어느 하나 이상은 이무수물산 성분으로 비페닐테트라카르복실릭디안하이드라이드와 피로멜리틱디안하이드라이드를 함께 사용하거나, 비페닐테트라카르복실릭디안하이드라이드, 피로멜리틱디안하이드라이드 및 옥시디프탈릭안하이드라이드를 함께 사용하거나, 비페닐테트라카르복실릭디안하이드라이드, 피로멜리틱디안하이드라이드 및 벤조페논테트라카복실릭디안하이드라이드를 함께 사용할 수 있다.For example, at least one of the first skin layer and the second skin layer uses biphenyltetracarboxylic dianhydride and pyromellitic dianhydride together as a dianhydride component, or biphenyltetracarboxylic dianhydride. ricdianhydride, pyromellitic dianhydride and oxydiphthalic dianhydride together, or biphenyltetracarboxylic dianhydride, pyromellitic dianhydride and benzophenonetetracarboxylic dianhydride together can be used
또한, 예를 들어 상기 제1 스킨층 및 상기 제2 스킨층 중 어느 하나 이상은 디아민 성분으로 옥시디아닐린만을 사용하거나, 옥시디아닐린과 1,3-비스아미노페녹시벤젠을 함께 사용할 수 있다. Also, for example, at least one of the first skin layer and the second skin layer may use only oxydianiline or both oxydianiline and 1,3-bisaminophenoxybenzene as a diamine component.
일 구현예에 있어서, 상기 코어층은 상기 이무수물산 성분의 총함량 100 몰%를 기준으로, 상기 비페닐테트라카르복실릭디안하이드라이드의 함량이 40 몰% 이상 60 몰% 이하이고, 상기 피로멜리틱디안하이드라이드의 함량이 40 몰% 이상 60 몰% 이하이며, 상기 디아민 성분의 총함량 100몰%를 기준으로, 상기 파라페닐렌 디아민의 함량이 50 몰% 이상, 70 몰% 이하이고, 상기 m-톨리딘의 함량이 30 몰% 이상, 50 몰% 이하일 수 있다.In one embodiment, the core layer has a biphenyltetracarboxylic dianhydride content of 40 mol% or more and 60 mol% or less, based on 100 mol% of the total content of the dianhydride component, and the pyromelli The content of thicdianhydride is 40 mol% or more and 60 mol% or less, and the paraphenylene diamine content is 50 mol% or more and 70 mol% or less based on 100 mol% of the total content of the diamine component, The content of m-tolidine may be 30 mol% or more and 50 mol% or less.
일 구현예에 있어서, 상기 제1 스킨층 및 상기 제2 스킨층 중 어느 하나 이상은 상기 이무수물산 성분의 총함량 100 몰%를 기준으로, 상기 비페닐테트라카르복실릭디안하이드라이드의 함량이 15 몰% 이상 85 몰% 이하이고, 상기 피로멜리틱디안하이드라이드의 함량이 15 몰% 이상 60 몰% 이하이며, 상기 옥시디프탈릭안하이드라이드의 함량이 35 몰% 이하이고, 상기 벤조페논테트라카복실릭디안하이드라이드의 함량이 35 몰% 이하이며, 상기 디아민 성분의 총함량 100몰%를 기준으로, 상기 옥시디아닐린의 함량이 20 몰% 이상 100 몰% 이하이고, 및 1,3-비스아미노페녹시벤젠의 함량이 80 몰% 이하일 수 있다.In one embodiment, at least one of the first skin layer and the second skin layer has a biphenyltetracarboxylic dianhydride content of 15% based on 100 mol% of the total content of the dianhydride component. mol% or more and 85 mol% or less, the content of the pyromellitic dianhydride is 15 mol% or more and 60 mol% or less, the content of the oxydiphthalic anhydride is 35 mol% or less, and the benzophenonetetracarboxylic The content of ricdianhydride is 35 mol% or less, the content of oxydianiline is 20 mol% or more and 100 mol% or less based on 100 mol% of the total content of the diamine component, and 1,3-bisamino The content of phenoxybenzene may be 80 mol% or less.
본 발명의 파라페닐렌 디아민은 강직한 모노머로 파라페닐렌 디아민의 함량이 증가함에 따라서 합성되는 폴리이미드는 더욱 선형의 구조를 가지게 되고, 폴리이미드의 기계적 특성의 향상에 기여한다.Para-phenylene diamine of the present invention is a rigid monomer, and as the content of para-phenylene diamine increases, the synthesized polyimide has a more linear structure and contributes to improving the mechanical properties of the polyimide.
또한. m-톨리딘은 특히 소수성을 띄는 메틸기를 가지고 있어서 폴리이미드 필름의 수분에 대한 치수 안정성과 연관된 저흡습 특성에 기여한다.also. Since m-tolidine has a methyl group that is particularly hydrophobic, it contributes to the low moisture absorption property related to the dimensional stability of the polyimide film against water.
본 발명의 비페닐테트라카르복실릭디안하이드라이드로부터 유래된 폴리이미드 사슬은 전하이동착체(CTC: Charge transfer complex)라고 명명된 구조, 즉, 전자주게(electron donnor)와 전자받게(electron acceptor)가 서로 근접하게 위치하는 규칙적인 직선 구조를 가지게 되고 분자간 상호 작용(intermolecular interaction)이 강화된다.The polyimide chain derived from the biphenyltetracarboxylic dianhydride of the present invention has a structure called a charge transfer complex (CTC), that is, an electron donor and an electron acceptor. They have a regular linear structure located close to each other, and intermolecular interactions are strengthened.
이러한 구조는 수분과의 수소결합을 방지하는 효과가 있으므로, 흡습률을 낮추는데 영향을 주어 수분에 대한 치수 안정성에 영향을 끼치는 폴리이미드 필름의 흡습성을 낮추는 효과를 극대화 할 수 있다.Since this structure has an effect of preventing hydrogen bonding with moisture, it is possible to maximize the effect of lowering the hygroscopicity of the polyimide film, which affects the dimensional stability to moisture by affecting the lowering of the moisture absorption rate.
또한, 피로멜리틱디안하이드라이드는 상대적으로 강직한 구조를 가지는 이무수물산 성분으로 폴리이미드 필름에 적절한 탄성을 부여할 수 있는 점에서 바람직하다.In addition, pyromellitic dianhydride is a dianhydride component having a relatively rigid structure, and is preferable in that it can impart appropriate elasticity to the polyimide film.
폴리이미드 필름이 우수한 치수 안정성을 가지기 위해서는 이무수물산의 함량비가 중요하다. 예를 들어, 비페닐테트라카르복실릭디안하이드라이드의 함량비가 감소할수록 상기 CTC 구조로 인한 낮은 흡습률을 기대하기 어려워지고, 수분에 대한 치수 안정성도 저하된다.In order for the polyimide film to have excellent dimensional stability, the content ratio of dianhydride is important. For example, as the content ratio of biphenyltetracarboxylic dianhydride decreases, it becomes difficult to expect a low moisture absorption rate due to the CTC structure, and dimensional stability against moisture also deteriorates.
또한, 비페닐테트라카르복실릭디안하이드라이드는 방향족 부분에 해당하는 벤젠 고리를 2개 포함하는 반면에, 피로멜리틱디안하이드라이드는 방향족 부분에 해당하는 벤젠 고리를 1개 포함한다. In addition, biphenyltetracarboxylic dianhydride contains two benzene rings corresponding to the aromatic part, whereas pyromellitic dianhydride contains one benzene ring corresponding to the aromatic part.
이무수물산 성분에서 피로멜리틱디안하이드라이드 함량의 증가는 동일한 분자량을 기준으로 했을 때 분자 내의 이미드기가 증가하는 것으로 이해할 수 있으며, 이는 폴리이미드 고분자 사슬에 상기 피로멜리틱디안하이드라이드로부터 유래되는 이미드기의 비율이 비페닐테트라카르복실릭디안하이드라이드로부터 유래되는 이미드기 대비 상대적으로 증가하는 것으로 이해할 수 있다. The increase in the pyromellitic dianhydride content in the dianhydride component can be understood as an increase in the imide group in the molecule based on the same molecular weight, which means that the polyimide polymer chain has an imide derived from the pyromellitic dianhydride. It can be understood that the ratio of the de group is relatively increased compared to the imide group derived from biphenyltetracarboxylic dianhydride.
즉, 피로멜리틱디안하이드라이드 함량의 증가는 폴리이미드 필름 전체에 대해서도, 이미드기의 상대적 증가로 볼 수 있고, 이로 인해 낮은 흡습률에 의한 수분에 대한 높은 치수 안정성은 기대하기 어려워진다.That is, the increase in the pyromellitic dianhydride content can be seen as a relative increase in the imide group with respect to the entire polyimide film, and as a result, it is difficult to expect high dimensional stability against moisture due to a low moisture absorption.
반대로, 피로멜리틱디안하이드라이드의 함량비가 감소하면 상대적으로 강직한 구조의 성분이 감소하게 되어, 폴리이미드 필름의 탄성이 소망하는 수준 이하로 저하될 수 있다.Conversely, when the content ratio of pyromellitic dianhydride is decreased, the component having a relatively rigid structure is reduced, and thus the elasticity of the polyimide film may be lowered to a desired level or less.
이러한 이유로 상기 비페닐테트라카르복실릭디안하이드라이드의 함량이 상기 범위를 상회하거나, 피로멜리틱디안하이드라이드의 함량이 상기 범위를 하회하는 경우, 폴리이미드 필름의 치수 안정성이 저하될 수 있다.For this reason, when the content of the biphenyltetracarboxylic dianhydride exceeds the above range or the content of the pyromellitic dianhydride is below the above range, the dimensional stability of the polyimide film may deteriorate.
반대로, 상기 비페닐테트라카르복실릭디안하이드라이드의 함량이 상기 범위를 하회하거나, 피로멜리틱디안하이드라이드의 함량이 상기 범위를 상회하는 경우에도, 폴리이미드 필름의 치수 안정성에 악영향을 끼칠 수 있다.Conversely, even when the content of the biphenyltetracarboxylic dianhydride is less than the above range or the content of the pyromellitic dianhydride exceeds the above range, the dimensional stability of the polyimide film may be adversely affected. .
본 발명에서 폴리아믹산의 제조는 예를 들어,Production of polyamic acid in the present invention, for example,
(1) 디아민 성분 전량을 용매 중에 넣고, 그 후 이무수물산 성분을 디아민 성분과 실질적으로 등몰이 되도록 첨가하여 중합하는 방법;(1) A method in which the entire amount of the diamine component is placed in a solvent, and thereafter a dianhydride component is added so as to be substantially equimolar to the diamine component, followed by polymerization;
(2) 이무수물산 성분 전량을 용매 중에 넣고, 그 후 디아민 성분을 이무수물산 성분과 실질적으로 등몰이 되도록 첨가하여 중합하는 방법;(2) a method in which the entire amount of the dianhydride component is placed in a solvent, and then a diamine component is added so as to be substantially equimolar to the dianhydride component, followed by polymerization;
(3) 디아민 성분 중 일부 성분을 용매 중에 넣은 후, 반응 성분에 대해서 이무수물산 성분 중 일부 성분을 약 95~105 몰%의 비율로 혼합한 후, 나머지 디아민 성분을 첨가하고 이에 연속해서 나머지 이무수물산 성분을 첨가하여, 디아민 성분 및 이무수물산 성분이 실질적으로 등몰이 되도록 하여 중합하는 방법;(3) After putting some of the diamine components in a solvent, mixing some of the dianhydride components at a ratio of about 95 to 105 mol% with respect to the reaction components, and then adding the remaining diamine components, followed by the remaining dianhydride components. a method of polymerizing by adding components so that the diamine component and the dianhydride component are substantially equimolar;
(4) 이무수물산 성분을 용매 중에 넣은 후, 반응 성분에 대해서 디아민 화합물 중 일부 성분을 95~105 몰%의 비율로 혼합한 후, 다른 이무수물산 성분을 첨가하고 계속되어 나머지 디아민 성분을 첨가하여, 디아민 성분 및 이무수물산 성분이 실질적으로 등몰이 되도록 하여 중합하는 방법;(4) After putting the dianhydride component in the solvent, some components of the diamine compound are mixed in a ratio of 95 to 105 mol% with respect to the reaction components, then another dianhydride component is added, and then the remaining diamine components are added, a method of polymerizing the diamine component and the dianhydride component so that they are substantially equimolar;
(5) 용매 중에서 일부 디아민 성분과 일부 이무수물산 성분을 어느 하나가 과량이도록 반응시켜, 제1 조성물을 형성하고, 또 다른 용매 중에서 일부 디아민 성분과 일부 이무수물산 성분을 어느 하나가 과량이 되도록 반응시켜 제2 조성물을 형성한 후, 제1, 제2 조성물들을 혼합하고, 중합을 완결하는 방법으로서, 이 때 제1 조성물을 형성할 때 디아민 성분이 과잉일 경우, 제 2조성물에서는 이무수물산 성분을 과량으로 하고, 제1 조성물에서 이무수물산 성분이 과잉일 경우, 제2 조성물에서는 디아민 성분을 과량으로 하여, 제1, 제2 조성물들을 혼합하여 이들 반응에 사용되는 전체 디아민 성분과 이무수물산 성분이 실질적으로 등몰이 되도록 하여 중합하는 방법 등을 들 수 있다.(5) Some diamine components and some dianhydride components are reacted in an excess amount in a solvent to form a first composition, and some diamine components and some dianhydride components are reacted in an excess amount in another solvent to form a first composition. A method of mixing the first and second compositions after forming the second composition and completing the polymerization, wherein, if the diamine component is excessive when forming the first composition, the dianhydride component is added in excess in the second composition And, when the dianhydride component is excessive in the first composition, the diamine component is excessive in the second composition, and the first and second compositions are mixed so that the entire diamine component and the dianhydride component used in these reactions are substantially reduced. The method of polymerizing by making it equimolar, etc. are mentioned.
본 발명에서는, 상기와 같은 폴리아믹산의 중합 방법을 임의(random) 중합 방식으로 정의할 수 있으며, 상기와 같은 과정으로 제조된 본 발명의 폴리아믹산으로부터 제조된 폴리이미드 필름은 치수 안정성 및 내화학성을 높이는 본 발명의 효과를 극대화시키는 측면에서 바람직하게 적용될 수 있다.In the present invention, the polymerization method of the polyamic acid as described above can be defined as a random polymerization method, and the polyimide film prepared from the polyamic acid of the present invention manufactured by the above process has dimensional stability and chemical resistance. The height may be preferably applied in terms of maximizing the effect of the present invention.
다만, 상기 중합 방법은 앞서 설명한 고분자 사슬 내의 반복단위의 길이가 상대적으로 짧게 제조되므로, 이무수물산 성분으로부터 유래되는 폴리이미드 사슬이 가지는 각각의 우수한 특성을 발휘하기에는 한계가 있을 수 있다. 따라서, 본 발명에서 특히 바람직하게 이용될 수 있는 폴리아믹산의 중합 방법은 블록 중합 방식일 수 있다.However, since the polymerization method produces a relatively short length of the repeating unit in the polymer chain described above, there may be limitations in exhibiting the excellent properties of each polyimide chain derived from the dianhydride component. Therefore, the polymerization method of the polyamic acid that can be particularly preferably used in the present invention may be a block polymerization method.
한편, 폴리아믹산을 합성하기 위한 용매는 특별히 한정되는 것은 아니고, 폴리아믹산을 용해시키는 용매이면 어떠한 용매도 사용할 수 있지만, 아미드계 용매인 것이 바람직하다.On the other hand, the solvent for synthesizing the polyamic acid is not particularly limited, and any solvent can be used as long as it dissolves the polyamic acid, but an amide-based solvent is preferable.
구체적으로는, 상기 유기 용매는 유기 극성 용매일 수 있고, 상세하게는 비양성자성 극성 용매(aprotic polar solvent)일 수 있으며, 예를 들어, N,N-디메틸포름아미드(DMF), N,N-디메틸아세트아미드, N-메틸-피롤리돈(NMP), 감마 브티로 락톤(GBL), 디그림(Diglyme)으로 이루어진 군에서 선택된 하나 이상일 수 있으나, 이에 제한되는 것은 아니며, 필요에 따라 단독으로 또는 2종 이상 조합해서 사용할 수 있다. Specifically, the organic solvent may be an organic polar solvent, and in detail, may be an aprotic polar solvent, for example, N,N-dimethylformamide (DMF), N,N -It may be one or more selected from the group consisting of dimethylacetamide, N-methyl-pyrrolidone (NMP), gamma butyrolactone (GBL), and diglyme, but is not limited thereto, and may be used alone as needed Or it can use in combination of 2 or more types.
하나의 예에서, 상기 유기 용매는 N,N-디메틸포름아미드 및 N,N-디메틸아세트아미드가 특히 바람직하게 사용될 수 있다.In one example, N,N-dimethylformamide and N,N-dimethylacetamide may be particularly preferably used as the organic solvent.
또한, 폴리아믹산 제조 공정에서는 접동성, 열전도성, 코로나 내성, 루프 경도 등의 필름의 여러 가지 특성을 개선할 목적으로 충전재를 첨가할 수도 있다. 첨가되는 충전재는 특별히 한정되는 것은 아니지만, 바람직한 예로는 실리카, 산화티탄, 알루미나, 질화규소, 질화붕소, 인산수소칼슘, 인산칼슘, 운모 등을 들 수 있다.In addition, in the polyamic acid manufacturing process, a filler may be added for the purpose of improving various properties of the film, such as sliding properties, thermal conductivity, corona resistance, and loop hardness. The filler added is not particularly limited, but preferable examples include silica, titanium oxide, alumina, silicon nitride, boron nitride, calcium hydrogen phosphate, calcium phosphate, mica and the like.
충전재의 입경은 특별히 한정되는 것은 아니고, 개질하여야 할 필름 특성과 첨가하는 충전재의 종류과 따라서 결정하면 된다. 일반적으로는, 평균 입경이 0.05 내지 100 ㎛, 바람직하게는 0.1 내지 75 ㎛, 더욱 바람직하게는 0.1 내지 50 ㎛, 특히 바람직하게는 0.1 내지 25 ㎛이다.The particle size of the filler is not particularly limited, and may be determined according to the film properties to be modified and the type of filler to be added. Generally, the average particle size is 0.05 to 100 μm, preferably 0.1 to 75 μm, more preferably 0.1 to 50 μm, particularly preferably 0.1 to 25 μm.
입경이 이 범위를 하회하면 개질 효과가 나타나기 어려워지고, 이 범위를 상회하면 표면성을 크게 손상시키거나, 기계적 특성이 크게 저하되는 경우가 있다.When the particle diameter is less than this range, the modification effect becomes difficult to appear, and when it exceeds this range, surface properties may be greatly damaged or mechanical properties may be greatly reduced.
또한, 충전재의 첨가량에 대해서도 특별히 한정되는 것은 아니고, 개질하여야 할 필름 특성이나 충전재 입경 등에 의해 결정하면 된다. 일반적으로, 충전재의 첨가량은 폴리이미드 100 중량부에 대하여 0.01 내지 100 중량부, 바람직하게는 0.01 내지 90 중량부, 더욱 바람직하게는 0.02 내지 80 중량부이다.Further, the addition amount of the filler is not particularly limited either, and may be determined according to the properties of the film to be modified, the particle size of the filler, and the like. Generally, the added amount of the filler is 0.01 to 100 parts by weight, preferably 0.01 to 90 parts by weight, and more preferably 0.02 to 80 parts by weight, based on 100 parts by weight of the polyimide.
충전재 첨가량이 이 범위를 하회하면, 충전재에 의한 개질 효과가 나타나기 어렵고, 이 범위를 상회하면 필름의 기계적 특성이 크게 손상될 가능성이 있다. 충전재의 첨가 방법은 특별히 한정되는 것은 아니고, 공지된 어떠한 방법을 이용할 수도 있다.If the added amount of the filler is less than this range, the modification effect by the filler is difficult to appear, and if it exceeds this range, the mechanical properties of the film may be significantly damaged. The method of adding the filler is not particularly limited, and any known method may be used.
본 발명의 제조방법에서 폴리이미드 필름은 열 이미드화법 및 화학적 이미드화법에 의해서 제조될 수 있다.In the production method of the present invention, the polyimide film may be prepared by thermal imidation or chemical imidation.
또한, 열 이미드화법 및 화학적 이미드화법이 병행되는 복합 이미드화법에 의해서 제조될 수도 있다.In addition, it may be prepared by a complex imidation method in which thermal imidation and chemical imidation are combined.
상기 열 이미드화법이란, 화학적 촉매를 배제하고, 열풍이나 적외선 건조기 등의 열원으로 이미드화 반응을 유도하는 방법이다.The thermal imidization method is a method of inducing an imidization reaction by excluding a chemical catalyst and using a heat source such as hot air or an infrared dryer.
상기 열 이미드화법은 상기 겔 필름을 100 내지 600 ℃의 범위의 가변적인 온도에서 열처리하여 겔 필름에 존재하는 아믹산기를 이미드화할 수 있으며, 상세하게는 200 내지 500 ℃, 더욱 상세하게는, 300 내지 500 ℃에서 열처리하여 겔 필름에 존재하는 아믹산기를 이미드화할 수 있다.In the thermal imidation method, the amic acid group present in the gel film may be imidized by heat-treating the gel film at a variable temperature in the range of 100 to 600 ° C, specifically 200 to 500 ° C, more specifically, Amic acid groups present in the gel film may be imidized by heat treatment at 300 to 500 °C.
다만, 겔 필름을 형성하는 과정에서도 아믹산 중 일부(약 0.1 몰% 내지 10 몰%)가 이미드화될 수 있으며, 이를 위해 50 ℃ 내지 200 ℃의 범위의 가변적인 온도에서 폴리아믹산 조성물을 건조할 수 있고, 이 또한 상기 열 이미드화법의 범주에 포함될 수 있다.However, some of the amic acid (about 0.1 mol% to 10 mol%) may be imidized even in the process of forming the gel film. This may also be included in the scope of the thermal imidization method.
화학적 이미드화법의 경우, 당업계에 공지된 방법에 따라 탈수제 및 이미드화제를 이용하여, 폴리이미드 필름을 제조할 수 있다.In the case of chemical imidation, a polyimide film may be prepared using a dehydrating agent and an imidizing agent according to a method known in the art.
복합이미드화법의 한 예로 폴리아믹산 용액에 탈수제 및 이미드화 제를 투입한 후 80 내지 200℃, 바람직하게는 100 내지 180℃에서 가열하여, 부분적으로 경화 및 건조한 후에 200 내지 400℃에서 5 내지 400 초간 가열함으로써 폴리이미드 필름을 제조할 수 있다.As an example of the composite imidation method, a dehydrating agent and an imidizing agent are added to a polyamic acid solution, and then heated at 80 to 200 ° C, preferably 100 to 180 ° C, partially cured and dried, and then 5 to 400 ° C at 200 to 400 ° C. A polyimide film can be manufactured by heating for a second.
한편, 지금까지 설명한 본 발명의 다층 폴리이미드 필름은 공압출 또는 코팅 중 어느 하나 이상의 방식을 이용하여 제조될 수 있다.Meanwhile, the multilayer polyimide film of the present invention described so far may be manufactured using at least one method of co-extrusion or coating.
공압출 방식은 폴리아믹산 용액 또는 이를 이미드화하여 제조한 폴리이미드 수지를 저장조에 충전한 후, 공압출 다이를 사용하여 캐스팅 밸트 위에 다층 압출한 후, 경화하여 다층 구조의 폴리이미드 필름을 제조하는 방식으로, 생산성이 높고, 계면간 상이한 종류의 폴리이미드 수지가 혼화되어 높은 계면 접착 신뢰성을 확보할 수 있다.In the co-extrusion method, after filling a reservoir with a polyamic acid solution or a polyimide resin prepared by imidizing the same, a multi-layer extrusion method is performed on a casting belt using a co-extrusion die, and then cured to produce a polyimide film having a multi-layer structure. As a result, productivity is high, and different types of polyimide resins are mixed between interfaces to ensure high interfacial adhesion reliability.
예를 들어, 본 발명의 다층 폴리이미드 필름 제조방법은 제1 폴리아믹산 용액 또는 제1 폴리아믹산 용액을 이미드화하여 제조되는 제1 폴리이미드 수지인 제1 용액을 제1 저장조에 충전하는 제1 충전 단계, 제2 폴리아믹산 용액 또는 제2 폴리아믹산 용액을 이미드화하여 제조되는 제2 폴리이미드 수지인 제2 용액을 제2 저장조에 충전하는 제2 충전 단계, 제1 저장조와 연결된 제1 유로, 제2 저장조와 각각 연결된 제2 유로 및 제3 유로가 내부에 각각 형성된 공압출 다이를 통해 제1 용액과 제2 용액을 공압출하는 공압출 단계 및 공압출되어 나온 제1 용액과 제2 용액을 경화하는 경화 단계를 포함하여 진행된다.For example, in the method for manufacturing a multilayer polyimide film of the present invention, a first filling of a first polyamic acid solution or a first solution that is a first polyimide resin prepared by imidizing the first polyamic acid solution is filled in a first reservoir. A second filling step of filling a second reservoir with a second polyamic acid solution or a second solution that is a second polyimide resin prepared by imidizing the second polyamic acid solution, a first flow path connected to the first reservoir, 2 A co-extrusion step of co-extruding the first solution and the second solution through a co-extrusion die having second and third flow passages connected therein, respectively, and curing the co-extruded first and second solutions. It proceeds including a curing step to
제1 폴리아믹산 용액은 코어층을 형성하기 위한 것으로, 비페닐테트라카르복실릭디안하이드라이드(BPDA) 및 피로멜리틱디안하이드라이드(PMDA)를 포함하는 이무수물산 성분과, 파라페닐렌 디아민(PPD) 및 m-톨리딘(m-tolidine)을 포함하는 디아민 성분을 중합하여 제조되는 것이 바람직하다.The first polyamic acid solution is for forming a core layer, and includes a dianhydride component including biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA), and paraphenylene diamine (PPD). It is preferably prepared by polymerizing a diamine component including ) and m-tolidine.
제2 폴리아믹산 용액은 제1 스킨층과 제2 스킨층을 형성하기 위한 것으로, 비페닐테트라카르복실릭디안하이드라이드, 피로멜리틱디안하이드라이드, 옥시디프탈릭안하이드라이드(ODPA) 및 벤조페논테트라카복실릭디안하이드라이드(BTDA)로 이루어진 그룹에서 선택된 2종 이상을 포함하는 이무수물산 성분과, 옥시디아닐린(ODA) 및 1,3-비스아미노페녹시벤젠(TPE-R)으로 이루어진 그룹에서 선택된 어느 하나 이상을 포함하는 디아민 성분을 중합하여 제조되는 것이 바람직하다.The second polyamic acid solution is for forming the first skin layer and the second skin layer, and includes biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, oxydiphthalic anhydride (ODPA) and benzophenone In the group consisting of a dianhydride component containing at least two selected from the group consisting of tetracarboxylic dianhydride (BTDA) and oxydianiline (ODA) and 1,3-bisaminophenoxybenzene (TPE-R) It is preferably prepared by polymerizing a diamine component containing at least one selected one.
한편, 제1 용액으로 상기 제1 폴리아믹산 용액을 사용하고, 제2 용액으로 상기 제2 폴리아믹산 용액을 사용하는 경우, 경화 단계 이전에 공압출되어 나온 제1 용액과 제2 용액을 이미드화하는 이미드화 단계를 더 포함하여 진행되는 것이 바람직하다.On the other hand, when the first polyamic acid solution is used as the first solution and the second polyamic acid solution is used as the second solution, the first solution and the second solution co-extruded before the curing step are imidized. It is preferable to proceed by further including an imidization step.
본 발명은, 상술한 다층 폴리이미드 필름과 전기전도성의 금속박을 포함하는 연성 금속박 적층판을 제공한다.The present invention provides a flexible metal foil laminate comprising the above-described multilayer polyimide film and electrically conductive metal foil.
사용하는 금속박으로는 특별히 한정되는 것은 아니지만, 전자 기기 또는 전기 기기용도에 본 발명의 연성 금속박 적층판을 이용하는 경우에는, 예를 들면 구리 또는 구리 합금, 스테인레스강 또는 그의 합금, 니켈 또는 니켈 합금(42 합금도 포함함), 알루미늄 또는 알루미늄 합금을 포함하는 금속박일 수 있다.The metal foil used is not particularly limited, but in the case of using the flexible metal foil laminate of the present invention for electronic devices or electrical devices, for example, copper or copper alloy, stainless steel or its alloy, nickel or nickel alloy (42 alloy Also included), it may be a metal foil containing aluminum or aluminum alloy.
일반적인 연성 금속박 적층판에서는 압연 동박, 전해 동박이라는 구리박이 많이 사용되며, 본 발명에서도 바람직하게 사용할 수 있다. 또한, 이들 금속박의 표면에는 방청층, 내열층 또는 접착층이 도포되어 있을 수도 있다.In general flexible metal foil laminates, copper foils such as rolled copper foil and electrolytic copper foil are often used, and they can be preferably used in the present invention as well. Moreover, a rust prevention layer, a heat resistance layer, or an adhesive layer may be applied to the surface of these metal foils.
본 발명에서 상기 금속박의 두께에 대해서는 특별히 한정되는 것은 아니고, 그 용도에 따라서 충분한 기능을 발휘할 수 있는 두께이면 된다.In the present invention, the thickness of the metal foil is not particularly limited, and may be any thickness capable of exhibiting sufficient functions depending on its use.
본 발명에 따른 연성 금속박 적층판은, 상기 다층 폴리이미드 필름의 적어도 한면에 금속박이 라미네이트된 구조일 수 있다. The flexible metal foil laminate according to the present invention may have a structure in which metal foil is laminated on at least one surface of the multilayer polyimide film.
이하, 발명의 구체적인 제조예 및 실시예를 통해, 발명의 작용 및 효과를 보다 상술하기로 한다. 다만, 이러한 제조예 및 실시예는 발명의 예시로 제시된 것에 불과하며, 이에 의해 발명의 권리범위가 한정되는 것은 아니다.Hereinafter, the action and effect of the invention will be described in more detail through specific manufacturing examples and examples of the invention. However, these manufacturing examples and examples are only presented as examples of the invention, and the scope of the invention is not limited thereby.
제조예: 다층 폴리이미드 필름의 제조Production example: production of multi-layer polyimide film
비페닐테트라카르복실릭디안하이드라이드(BPDA), 피로멜리틱디안하이드라이드(PMDA), 옥시디프탈릭안하이드라이드(ODPA), 벤조페논테트라카복실릭디안하이드라이드(BTDA), 파라페닐렌 디아민(PPD), m-톨리딘(m-tolidine, MTD), 1,3-비스아미노페녹시벤젠(TPE-R) 및 옥시디아닐린(ODA) 중 이무수물산과 디아민 성분을 선택하여 중합 반응시켜서 코어층 제조에 사용될 제1 폴리아믹산 용액을 제조하였다. Biphenyltetracarboxylic dianhydride (BPDA), pyromellitic dianhydride (PMDA), oxydiphthalic anhydride (ODPA), benzophenonetetracarboxylic dianhydride (BTDA), paraphenylene diamine ( PPD), m-tolidine (MTD), 1,3-bisaminophenoxybenzene (TPE-R), and oxydianiline (ODA), dianhydride acid and diamine components are selected and polymerized to form a core layer A first polyamic acid solution to be used for the preparation was prepared.
비페닐테트라카르복실릭디안하이드라이드, 피로멜리틱디안하이드라이드, 옥시디프탈릭안하이드라이드, 벤조페논테트라카복실릭디안하이드라이드, 파라페닐렌 디아민, m-톨리딘, 1,3-비스아미노페녹시벤젠 및 옥시디아닐린 중 이무수물산과 디아민 성분을 선택하여 중합 반응시켜서 제1 및 제2 스킨층 제조에 사용될 제2 폴리아믹산 용액을 제조하였다.Biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, oxydiphthalic anhydride, benzophenone tetracarboxylic dianhydride, paraphenylene diamine, m-tolidine, 1,3-bisaminophenone A second polyamic acid solution to be used in preparing the first and second skin layers was prepared by polymerization of dianhydride acid and diamine components selected from sibenzene and oxydianiline.
공압출 방식을 통해 앞서 제조한 제1 폴리아믹산 용액과 제2 폴리아믹산 용액 공압출하고, 이미드화한 뒤 경화시킴으로써, 코어층을 중심으로 제1 스킨층과 제2 스킨층이 형성된 다층 폴리이미드 필름을 제조하였다.A multilayer polyimide film in which the first skin layer and the second skin layer are formed around the core layer by co-extruding the previously prepared first polyamic acid solution and the second polyamic acid solution through a co-extrusion method, imidizing, and then curing the solution. was manufactured.
단, 여기서 코어층은 제1 폴리아믹산 용액을 공압출하여 제조하였고, 제1 스킨층과 제2 스킨층은 제2 폴리아믹산 용액을 공압출하여 제조하였다.However, here, the core layer was prepared by coextruding the first polyamic acid solution, and the first skin layer and the second skin layer were prepared by coextruding the second polyamic acid solution.
상기 폴리아믹산 제조시 용매는 일반적으로 아미드계 용매로 비양성자성 극성 용매(Aprotic solvent), 예를 들어 N,N'-디메틸포름아마이드, N,N'-디메틸아세트아미드, N-메틸-피롤리돈, 또는 이들의 조합을 사용할 수 있다.When preparing the polyamic acid, the solvent is generally an amide-based solvent, such as an aprotic solvent, such as N,N'-dimethylformamide, N,N'-dimethylacetamide, N-methyl-pyrroly money, or a combination thereof.
상기 이무수물산과 디아민 성분의 투입형태는 분말, 덩어리 및 용액 형태로 투입할 수 있으며 반응 초기에는 분말 형태로 투입하여 반응을 진행한 다음, 이후에는 중합 점도 조절을 위해 용액 형태로 투입하는 것이 바람직하다. The input form of the dianhydride acid and diamine component can be added in the form of powder, lump or solution, and it is preferable to introduce the reaction in the form of a powder to proceed with the reaction in the initial stage of the reaction, and then add in the form of a solution to adjust the polymerization viscosity thereafter. .
얻어진 폴리아믹산 용액은 이미드화 촉매 및 탈수제와 혼합되어 지지체에 도포될 수 있다. The obtained polyamic acid solution may be mixed with an imidization catalyst and a dehydrating agent and applied to a support.
사용되는 촉매의 예로는 3급 아민류(예컨대, 이소퀴놀린, β-피콜린, 피리딘 등)가 있고, 탈수제의 예로는 무수산이 있으나, 이에 제한되지 않는다. Examples of the catalyst used include tertiary amines (eg, isoquinoline, β-picoline, pyridine, etc.), and examples of the dehydrating agent include anhydrous acid, but are not limited thereto.
실시예 및 비교예Examples and Comparative Examples
하기 표 1 (코어층의 성분 및 조성비) 및 하기 표 2(스킨층의 성분 및 조성비)에 나타낸 바와 같이, 실시예 1 내지 6 및 비교예 1 내지 9에서의 코어층 및 스킨층의 이무수물산 성분 및 상기 디아민 성분의 함량을 조절하여, 제조예에 따라서 다층 폴리이미드 필름을 제조하였다.As shown in Table 1 (components and composition ratio of core layer) and Table 2 (components and composition ratio of skin layer), dianhydride components of the core layer and skin layer in Examples 1 to 6 and Comparative Examples 1 to 9 And by adjusting the content of the diamine component, a multi-layer polyimide film was prepared according to Preparation Example.
실시예 1 내지 6 및 비교예 9의 제1 스킨층 및 제2 스킨층의 조성 및 성분비는 동일하게 하였고, 두께도 동일하게 제조하였다.The composition and component ratio of the first skin layer and the second skin layer of Examples 1 to 6 and Comparative Example 9 were the same, and the thickness was also prepared the same.
단, 비교예 1 내지 8은 단일층 폴리이미드 필름에 해당하여 코어층만을 제조하였다.However, Comparative Examples 1 to 8 corresponded to single-layer polyimide films, and only the core layer was prepared.
코어(core)층core layer
이무수물산(몰%)Dianhydride (mol %) 디아민(몰%)Diamine (mol %)
PMDAPMDA BPDABPDA BTDABTDA ODPAODPA ODAODA TPE-RTPE-R MTDMTD PPDPPD
실시예1Example 1 5050 5050 -- -- -- -- 4040 6060
실시예2Example 2 5050 5050 -- -- -- -- 4040 6060
실시예3Example 3 5050 5050 -- -- -- -- 4040 6060
실시예4Example 4 5050 5050 -- -- -- -- 4040 6060
실시예5Example 5 5050 5050 -- -- -- -- 4040 6060
실시예6Example 6 5050 5050 -- -- -- -- 4040 6060
비교예1Comparative Example 1 5050 5050 -- -- -- -- 4040 6060
비교예2Comparative Example 2 5050 5050 -- -- 100100 -- -- --
비교예3Comparative Example 3 2525 5050 -- 2525 5555 4545 -- --
비교예4Comparative Example 4 2525 5050 2525 -- 5555 4545 -- --
비교예5Comparative Example 5 2525 7575 -- -- 5555 4545 -- --
비교예6Comparative Example 6 5050 2525 2525 -- 5555 4545 -- --
비교예7Comparative Example 7 5050 2525 -- 2525 3030 7070 -- --
비교예8Comparative Example 8 5050 5050 -- -- 1313 -- -- 8787
비교예9Comparative Example 9 5050 5050 -- -- 1313 -- -- 8787
제1 및 제2 스킨(skin)층First and second skin layers
이무수물산(몰%)Dianhydride (mol%) 디아민(몰%)Diamine (mol%)
PMDAPMDA BPDABPDA BTDABTDA ODPAODPA ODAODA TPE-RTPE-R
실시예1Example 1 5050 5050 -- -- 100100 --
실시예2Example 2 2525 5050 -- 2525 5555 4545
실시예3Example 3 2525 5050 2525 -- 5555 4545
실시예4Example 4 2525 7575 -- -- 5555 4545
실시예5Example 5 5050 2525 2525 -- 5555 4545
실시예6Example 6 5050 2525 -- 2525 3030 7070
비교예1Comparative Example 1 -- -- -- -- -- --
비교예2Comparative Example 2 -- -- -- -- -- --
비교예3Comparative Example 3 -- -- -- -- -- --
비교예4Comparative Example 4 -- -- -- -- -- --
비교예5Comparative Example 5 -- -- -- -- -- --
비교예6Comparative Example 6 -- -- -- -- -- --
비교예7Comparative Example 7 -- -- -- -- -- --
비교예8Comparative Example 8 -- -- -- -- -- --
비교예9Comparative Example 9 5050 5050 -- -- 100100 --
제조된 폴리이미드 필름의 폭 방향의 열팽창계수(coefficient of thermal expansion, CTE), 폭 방향의 흡습팽창계수(coefficient of hydroscopic expansion, CHE) 및 접착력을 측정하여 하기 표 3에 나타내었다.The coefficient of thermal expansion (CTE), coefficient of hydroscopic expansion (CHE) in the width direction, and adhesive strength of the prepared polyimide film in the width direction were measured and are shown in Table 3 below.
CTE
(ppm/℃)
CTE
(ppm/℃)
CHE
(ppm/%)
CHE
(ppm/%)
접착력
(Kgf/cm)
adhesion
(Kgf/cm)
실시예 1Example 1 4.44.4 5.45.4 0.830.83
실시예 2Example 2 2.92.9 5.25.2 0.970.97
실시예 3Example 3 3.23.2 4.94.9 0.850.85
실시예 4Example 4 4.44.4 5.55.5 1.011.01
실시예 5Example 5 5.85.8 5.95.9 0.860.86
실시예 6Example 6 4.74.7 5.35.3 0.940.94
비교예 1Comparative Example 1 2.02.0 4.44.4 0.580.58
비교예 2Comparative Example 2 4141 1818 0.850.85
비교예 3Comparative Example 3 19.119.1 11.811.8 0.980.98
비교예 4Comparative Example 4 24.224.2 13.313.3 0.860.86
비교예 5Comparative Example 5 25.725.7 14.114.1 1.081.08
비교예 6Comparative Example 6 55.255.2 19.619.6 0.870.87
비교예 7Comparative Example 7 43.143.1 17.817.8 0.960.96
비교예 8Comparative Example 8 6.16.1 7.37.3 0.670.67
비교예 9Comparative Example 9 8.48.4 9.29.2 0.820.82
(1) 열팽창계수 측정(1) Thermal expansion coefficient measurement
열팽창 계수(CTE)는 TA사 열기계 분석기(thermomechanical analyzer) Q400 모델을 사용하였으며, 제조된 다층 폴리이미드 필름을 폭 4 mm, 길이 20 mm로 자른 후 질소 분위기하에서 0.05 N의 장력을 가하면서, 10 ℃/min의 속도로 30℃에서 400℃까지 승온 후 다시 10 ℃/min의 속도로 냉각하면서 50℃ 에서 200℃ 구간의 기울기를 측정하였다.For the coefficient of thermal expansion (CTE), TA's thermomechanical analyzer Q400 model was used. After cutting the prepared multilayer polyimide film into a width of 4 mm and a length of 20 mm, 10 After the temperature was raised from 30 °C to 400 °C at a rate of °C/min, the slope was measured from 50 °C to 200 °C while cooling at a rate of 10 °C/min.
(2) 흡습팽창계수 측정(2) Measurement of hygroscopic expansion coefficient
흡습팽창계수(CHE)는 제조된 다층 폴리이미드 필름이 느슨해지지 않도록 최저한의 가중을 건 상태(25mm ×150mm의 샘플에 대하여, 약 1g)로, 25℃에서 습도를 3 %RH로 조절하고 완전히 포화할 때까지 흡습시켜 치수를 계측하고, 그 후 90 %RH로 습도를 조정하여 마찬가지로 포화 흡습시킨 후 치수를 계측하고, 양자의 결과로부터 치수변화율을 측정하였다.The hygroscopic expansion coefficient (CHE) was obtained by adjusting the humidity to 3% RH at 25°C and fully saturated under the minimum weight applied (about 1 g for a sample of 25 mm × 150 mm) so that the manufactured multilayer polyimide film would not loosen. After that, the humidity was adjusted to 90% RH and similarly saturated moisture was absorbed, and then the dimensions were measured, and the dimensional change rate was measured from both results.
(3) 접착력 측정(3) Measurement of adhesive strength
제조된 다층 폴리이미드 필름에 스퍼터를 통해 전기도금 전극용 구리 씨드(seed)층으로 약 80-300 nm의 두께를 가지는 구리 박막층을 증착하고, 전기도금을 통해 약 8-9 μm 두께의 구리 도전층을 형성하여 COF용 연성 금속박 적층판을 제작하였다A copper thin layer having a thickness of about 80-300 nm as a copper seed layer for an electroplating electrode is deposited on the prepared multilayer polyimide film through sputtering, and a copper conductive layer having a thickness of about 8-9 μm through electroplating. was formed to produce a flexible metal foil laminate for COF.
상기 연성 금속박 적층판을 습식 에층 공법으로 2mm 폭의 로드 형태로 에칭 후 Universal Testing Machine으로 90°박리 시험을 실시하여 20mm/min의 속도로 당겨 접착력을 측정하였다.After etching the flexible metal foil laminate in the form of a rod with a width of 2 mm by a wet layering method, a 90 ° peel test was performed with a universal testing machine, and the adhesive force was measured by pulling at a speed of 20 mm / min.
측정 결과, 실시예 1 내지 6의 다층 폴리이미드 필름은 폭 방향의 열팽창계수가 2.0 ppm/℃ 이상이고, 6.0 ppm/℃ 이하이며, 폭 방향의 흡습팽창계수가 3.0 ppm/RH% 이상이고, 6.0 ppm/RH% 이하이며, 동박과의 접착력이 0.8 kgf/cm 이상인 특성을 나타내었다.As a result of the measurement, the multilayer polyimide films of Examples 1 to 6 had a thermal expansion coefficient of 2.0 ppm/°C or more in the width direction and 6.0 ppm/°C or less, and a hygroscopic expansion coefficient in the width direction of 3.0 ppm/RH% or more and 6.0 ppm/°C or more. It is ppm/RH% or less, and the adhesive strength with copper foil is 0.8 kgf/cm or more.
이에 비하여, 실시예들과 성분 및/또는 조성비를 달리하고, 1층으로만 이루어진 비교예 1 내지 8의 폴리이미드 필름 및 비교예 9의 다층 폴리이미드 필름은 열팽창계수, 흡습팽창계수 및 동박과의 접착력의 어느 한 특성 이상에서 본원의 다층 폴리이미드 필름이 요구하는 특성을 만족시키지 못하였다.In contrast, the polyimide films of Comparative Examples 1 to 8 and the multi-layer polyimide film of Comparative Example 9, which differ in component and/or composition ratio from those of the Examples, consisting of only one layer, have thermal expansion coefficient, hygroscopic expansion coefficient, and correlation with copper foil. In terms of adhesive strength, the multilayer polyimide film of the present application did not satisfy the required properties.
따라서, 본원의 적절한 범위 내에서 제조된 실시예 1 내지 6의 다층 폴리이미드 필름은 열적 치수 안정성, 수분에 대한 치수 안정성 및 동박과의 접착력이 모두 우수하였으나, 본원의 적절한 범위를 벗어나는 경우, 본원의 다층 폴리이미드 필름의 열적 치수 안정성, 수분에 대한 치수 안정성 및 동박과의 접착력을 모두 만족시키기 어렵다는 것을 확인할 수 있었다.Therefore, the multilayer polyimide films of Examples 1 to 6 prepared within the appropriate range of the present application were excellent in thermal dimensional stability, dimensional stability against moisture, and adhesive strength with copper foil, but outside the appropriate range of the present application, It was confirmed that it was difficult to satisfy all of the thermal dimensional stability, moisture dimensional stability, and adhesive strength with the copper foil of the multilayer polyimide film.
즉, 우수한 치수 안정성 및 동박과의 접착력을 가지면서도, 응용 분야에 적용될 수 있는 다양한 조건을 모두 만족시키는 다층 폴리이미드 필름은 본원의 적절한 범위 내에서 제조된 다층 폴리이미드 필름임을 확인할 수 있었다.That is, it was confirmed that a multilayer polyimide film that satisfies all of the various conditions that can be applied to the application field while having excellent dimensional stability and adhesion to the copper foil is a multilayer polyimide film manufactured within the appropriate scope of the present application.
본 발명인 다층 폴리이미드 필름 및 다층 폴리이미드 필름의 제조방법의 실시예는 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 당업자가 본 발명을 용이하게 실시할 수 있도록 하는 바람직한 실시 예일 뿐, 전술한 실시 예에 한정되는 것은 아니므로 이로 인해 본 발명의 권리범위가 한정되는 것은 아니다. 따라서 본 발명의 진정한 기술적 보호 범위는 첨부된 특허청구범위의 기술적 사상에 의해 정해져야 할 것이다. 또한, 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 여러 가지 치환, 변형 및 변경이 가능하다는 것이 당업자에게 있어 명백할 것이며, 당업자에 의해 용이하게 변경 가능한 부분도 본 발명의 권리범위에 포함됨은 자명하다.Examples of the multilayer polyimide film and the manufacturing method of the multilayer polyimide film of the present invention are only preferred examples that enable those skilled in the art to easily practice the present invention, Because it is not limited to examples, this does not limit the scope of the present invention. Therefore, the true technical protection scope of the present invention should be determined by the technical spirit of the appended claims. In addition, it will be clear to those skilled in the art that various substitutions, modifications and changes are possible within the scope of the technical spirit of the present invention, and it is obvious that parts easily changeable by those skilled in the art are also included in the scope of the present invention. .
본 발명은 이무수물산 및 디아민 성분의 조성비, 반응비 등이 조절된 폴리이미드 필름을 제공함으로써, 열적 치수 안정성과 수분에 대한 치수 안정성뿐만 아니라 접착력이 모두 우수한 폴리이미드 필름을 제공한다. The present invention provides a polyimide film excellent in both thermal dimensional stability and dimensional stability against moisture, as well as adhesive strength, by providing a polyimide film in which the composition ratio and reaction ratio of dianhydride and diamine components are adjusted.
이러한 폴리이미드 필름은 우수한 치수 안정성과 접착력의 폴리이미드 필름이 요구되는 다양한 분야, 예를 들어, 메탈라이징법에 의해 제조되는 연성 금속박 적층판 또는 이러한 연성 금속박 적층판을 포함하는 전자 부품에 적용이 가능하다.Such a polyimide film can be applied to various fields requiring a polyimide film having excellent dimensional stability and adhesive strength, for example, a flexible metal foil laminate manufactured by a metallization method or an electronic component including such a flexible metal foil laminate.

Claims (9)

  1. 코어층의 일 외측면 및 상기 외측면의 반대면에 각각 형성된 제1 스킨층 및 제2 스킨층을 포함하고,Including a first skin layer and a second skin layer respectively formed on one outer surface of the core layer and the opposite surface of the outer surface,
    동박과의 접착력이 0.8 kgf/cm 이상인,Adhesion with copper foil is 0.8 kgf / cm or more,
    다층 폴리이미드 필름.Multi-layer polyimide film.
  2. 제1항에 있어서,According to claim 1,
    폭 방향(Traverse direction, TD)의 열팽창계수가 2.0 ppm/℃ 이상이고, 6.0 ppm/℃ 이하이며,The thermal expansion coefficient in the transverse direction (TD) is 2.0 ppm / ° C or more and 6.0 ppm / ° C or less,
    폭 방향(Traverse direction, TD)의 흡습팽창계수가 3.0 ppm/RH% 이상이고, 6.0 ppm/RH% 이하인,The transverse direction (TD) hygroscopic expansion coefficient is 3.0 ppm / RH% or more and 6.0 ppm / RH% or less,
    다층 폴리이미드 필름.Multi-layer polyimide film.
  3. 제1항에 있어서,According to claim 1,
    상기 코어층은 비페닐테트라카르복실릭디안하이드라이드(BPDA) 및 피로멜리틱디안하이드라이드(PMDA)를 포함하는 이무수물산 성분과, The core layer includes a dianhydride component including biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA),
    파라페닐렌 디아민(PPD) 및 m-톨리딘(m-tolidine)을 포함하는 디아민 성분을 포함하는 폴리아믹산 용액을 이미드화 반응시켜 얻어지는,Obtained by imidization reaction of a polyamic acid solution containing a diamine component including paraphenylene diamine (PPD) and m-tolidine,
    다층 폴리이미드 필름.Multi-layer polyimide film.
  4. 제1항에 있어서,According to claim 1,
    상기 제1 스킨층 및 상기 제2 스킨층으로 이루어진 그룹에서 선택된 어느 하나 이상은 비페닐테트라카르복실릭디안하이드라이드, 피로멜리틱디안하이드라이드, 옥시디프탈릭안하이드라이드(ODPA) 및 벤조페논테트라카복실릭디안하이드라이드(BTDA)로 이루어진 그룹에서 선택된 2종 이상을 포함하는 이무수물산 성분과, At least one selected from the group consisting of the first skin layer and the second skin layer is biphenyltetracarboxylic dianhydride, pyromellitic dianhydride, oxydiphthalic anhydride (ODPA) and benzophenone tetra A dianhydride component containing two or more selected from the group consisting of carboxylic dianhydride (BTDA);
    옥시디아닐린(ODA) 및 1,3-비스아미노페녹시벤젠(TPE-R)으로 이루어진 그룹에서 선택된 어느 하나 이상을 포함하는 디아민 성분을 포함하는 폴리아믹산 용액을 이미드화 반응시켜 얻어지는,Obtained by imidation of a polyamic acid solution containing a diamine component containing at least one selected from the group consisting of oxydianiline (ODA) and 1,3-bisaminophenoxybenzene (TPE-R),
    다층 폴리이미드 필름.Multi-layer polyimide film.
  5. 제3항에 있어서,According to claim 3,
    상기 이무수물산 성분의 총함량 100 몰%를 기준으로, 상기 비페닐테트라카르복실릭디안하이드라이드의 함량이 40 몰% 이상 60 몰% 이하이고, 상기 피로멜리틱디안하이드라이드의 함량이 40 몰% 이상 60 몰% 이하이며,Based on 100 mol% of the total content of the dianhydride component, the content of the biphenyltetracarboxylic dianhydride is 40 mol% or more and 60 mol% or less, and the content of the pyromellitic dianhydride is 40 mol% more than 60 mol% or less,
    상기 디아민 성분의 총함량 100몰%를 기준으로, 상기 파라페닐렌 디아민의 함량이 50 몰% 이상, 70 몰% 이하이고, 상기 m-톨리딘의 함량이 30 몰% 이상, 50 몰% 이하인, Based on 100 mol% of the total content of the diamine component, the paraphenylene diamine content is 50 mol% or more and 70 mol% or less, and the m-tolidine content is 30 mol% or more and 50 mol% or less,
    다층 폴리이미드 필름.Multi-layer polyimide film.
  6. 제4항에 있어서,According to claim 4,
    상기 이무수물산 성분의 총함량 100 몰%를 기준으로, 상기 비페닐테트라카르복실릭디안하이드라이드의 함량이 15 몰% 이상 85 몰% 이하이고, 상기 피로멜리틱디안하이드라이드의 함량이 15 몰% 이상 60 몰% 이하이며, 상기 옥시디프탈릭안하이드라이드의 함량이 35 몰% 이하이고, 상기 벤조페논테트라카복실릭디안하이드라이드의 함량이 35 몰% 이하이며,Based on 100 mol% of the total content of the dianhydride component, the content of the biphenyltetracarboxylic dianhydride is 15 mol% or more and 85 mol% or less, and the content of the pyromellitic dianhydride is 15 mol% 60 mol% or less, the content of the oxydiphthalic anhydride is 35 mol% or less, and the content of the benzophenone tetracarboxylic dianhydride is 35 mol% or less,
    상기 디아민 성분의 총함량 100몰%를 기준으로, 상기 옥시디아닐린의 함량이 20 몰% 이상 100 몰% 이하이고, 및 1,3-비스아미노페녹시벤젠의 함량이 80 몰% 이하인, Based on 100 mol% of the total content of the diamine component, the content of oxydianiline is 20 mol% or more and 100 mol% or less, and the content of 1,3-bisaminophenoxybenzene is 80 mol% or less,
    다층 폴리이미드 필름.Multi-layer polyimide film.
  7. 제1항 내지 제6항 중 어느 한 항에 있어서,According to any one of claims 1 to 6,
    상기 다층 폴리이미드 필름은 공압출 및 코팅으로 이루어진 그룹에서 선택된 어느 하나 이상에 의해서 제조되는,The multilayer polyimide film is prepared by at least one selected from the group consisting of coextrusion and coating,
    다층 폴리이미드 필름.Multi-layer polyimide film.
  8. 제1항 내지 제6항 중 어느 한 항에 따른 다층 폴리이미드 필름과 전기 전도성의 금속박을 포함하는, Comprising the multilayer polyimide film according to any one of claims 1 to 6 and an electrically conductive metal foil,
    연성 금속박 적층판.Flexible metal foil laminate.
  9. 제8항에 따른 연성 금속박 적층판을 포함하는, Including the flexible metal foil laminate according to claim 8,
    전자 부품.Electronic parts.
PCT/KR2022/018954 2021-11-29 2022-11-28 Multilayer polyimide film and method for manufacturing same WO2023096440A1 (en)

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KR20130141628A (en) * 2010-12-14 2013-12-26 가부시키가이샤 가네카 Method for producing three-layer co-extruded polyimide film
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KR101773652B1 (en) * 2013-04-09 2017-09-12 주식회사 엘지화학 Method for manufacturing laminate structure and laminate structure manufactured by using same
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JP2013100379A (en) * 2010-03-03 2013-05-23 Ube Industries Ltd Polyimide film, laminate using same, and flexible thin-film solar cell
KR20130141628A (en) * 2010-12-14 2013-12-26 가부시키가이샤 가네카 Method for producing three-layer co-extruded polyimide film
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