WO2023071875A1 - Semiconductor process device, tray and wafer box - Google Patents

Semiconductor process device, tray and wafer box Download PDF

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Publication number
WO2023071875A1
WO2023071875A1 PCT/CN2022/126076 CN2022126076W WO2023071875A1 WO 2023071875 A1 WO2023071875 A1 WO 2023071875A1 CN 2022126076 W CN2022126076 W CN 2022126076W WO 2023071875 A1 WO2023071875 A1 WO 2023071875A1
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WO
WIPO (PCT)
Prior art keywords
tray
pallet
information
chamber
transmission
Prior art date
Application number
PCT/CN2022/126076
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French (fr)
Chinese (zh)
Inventor
程旭文
Original Assignee
北京北方华创微电子装备有限公司
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Publication of WO2023071875A1 publication Critical patent/WO2023071875A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67294Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • H01L21/67265Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67766Mechanical parts of transfer devices

Definitions

  • the application belongs to the technical field of semiconductor equipment, and in particular relates to a semiconductor process equipment, a tray and a chip box.
  • Enhanced plasma vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) equipment is a kind of thin film deposition equipment commonly used in LED, IC and micro electro mechanical system (Micro Electro Mechanical System, MEMS) and other related fields, mainly used in 2-inch
  • MEMS Micro Electro Mechanical System
  • wafers When PECVD equipment is depositing thin films, wafers need to be loaded in the loading chamber, taken out by the manipulator from the loading chamber, transferred in the transfer chamber, and then transferred to the process chamber for process reaction. Due to the process requirements for wafers of different sizes in the same reaction chamber, the wafers are generally placed on trays for transport. In order to ensure that the position of the wafer in the reaction chamber is relatively accurate, and to ensure the repeatability of the process, the precise transmission of trays of different sizes is very important during the transmission process.
  • the purpose of the embodiment of the present application is to provide a semiconductor process equipment, a tray and a cassette, which can solve the problems of low transmission accuracy, time-consuming and labor-consuming.
  • An embodiment of the present application provides a semiconductor process equipment, including a process chamber, a transport chamber, and a loading chamber, the process chamber is used to perform a semiconductor process, the loading chamber is used to accommodate a cassette, the The cassette is used to carry a tray, and a transfer device is arranged in the transfer chamber for transferring the tray between the process chamber and the loading chamber;
  • An image recognition device is provided at the junction of the loading chamber and the transfer chamber, and the image recognition device is used for carrying the tray on the transfer device and moving from the loading chamber to the transfer chamber During the process, the preset characteristic image on the pallet is identified, and the characteristic information of the pallet is determined;
  • the semiconductor process equipment further includes a controller, the controller is used to obtain the characteristic information, search for the transmission parameters corresponding to the characteristic information from the preset pallet information library, and control the transmission device according to the transmission parameters Transport the pallet.
  • the embodiment of the present application also provides a tray, which is applied to the above-mentioned semiconductor process equipment.
  • a characteristic image is set on the top surface of the tray, and the characteristic image can be recognized by an image recognition device.
  • the characteristic image includes the tray feature information.
  • the embodiment of the present application also provides a chip box for carrying the above-mentioned tray, the chip box includes a plurality of bearing positions, and each of the bearing positions includes a first support block and a second support block arranged oppositely, so The first support block and the second support block are respectively provided with at least one positioning pin, which is used to cooperate with at least two positioning holes on the tray to limit the position of the tray in the cassette, so that A point on the tray profile farthest from the transfer chamber along the tray transfer direction is located at a preset position.
  • the preset characteristic image on the pallet can be recognized by the image recognition device, so as to determine the characteristic information of the pallet.
  • the controller searches the preset pallet information library for the transmission corresponding to the characteristic information parameters, and then control the transmission device to move according to the transmission parameters, so as to realize the transmission of pallets. Based on the above settings, pallets of different specifications can be automatically identified, which can effectively solve the problems of time-consuming, labor-intensive, and error-prone problems caused by manual input of pallet feature information and transmission parameters, thus ensuring the accuracy of different feature information.
  • the transmission accuracy of the pallet in addition, the controller can look up the corresponding transmission parameters from the preset pallet information library, and make the transmission device transmit the pallet according to the transmission parameters, so that there is no need to open the cavity for the transmission device station calibration, effectively solving the problem caused by the cavity opening time-consuming problem. Therefore, the embodiment of the present application can realize automatic and intelligent transmission while ensuring transmission accuracy, reduce manual labor, and improve transmission efficiency.
  • FIG. 1 is a schematic structural diagram of semiconductor process equipment disclosed in an embodiment of the present application.
  • Fig. 2 is a structural schematic diagram of the cassette disclosed in the embodiment of the present application.
  • FIG. 3 is a schematic diagram of barcodes in different forms (a)-(h) disclosed in the embodiments of the present application;
  • Fig. 5 is a schematic diagram of establishing a pallet information library disclosed in the embodiment of the present application.
  • the embodiment of the present application discloses a semiconductor process equipment.
  • the disclosed semiconductor process equipment includes a load chamber 100 , a transfer chamber 200 and a process chamber 300 .
  • the process chamber 300 is used for performing semiconductor processes, for example, processes such as etching a wafer and forming a film layer on the surface of the wafer.
  • the loading chamber 100 is used to accommodate the cassette 400, the cassette 400 is used to carry the tray 500, and the tray 500 is used to carry the wafer.
  • the tray 500 and the cassette 400 are placed in the loading chamber 100 for storage, and when the wafer needs to be processed, the tray 500 carrying the wafer can pass through the loading chamber 100
  • the transfer chamber 200 is transferred to the process chamber 300 to process the wafer in the process chamber 300 .
  • the loading chamber 100 , the transfer chamber 200 and the process chamber 300 are arranged in sequence.
  • a transfer device 600 is provided in the transfer chamber 200.
  • the transfer device 600 can include a robot arm, and the transfer device 600 can be used in the process chamber 300.
  • the tray 500 is transferred to and from the loading chamber 100, and the wafer is carried by the tray 500 for transfer.
  • an image recognition device 700 is provided at the junction of the loading chamber 100 and the transfer chamber 200, and the transfer device 600 carries the pallet 500 and moves from the loading chamber 100 to the transfer chamber 200.
  • the preset characteristic image on the tray 500 can be recognized by the image recognition device 700, so as to determine the characteristic information (such as serial number, identification, etc.) of the tray 500 according to the characteristic image.
  • the image recognition area is formed in the vicinity of the junction of the loading chamber 100 and the transfer chamber 200, so that when the transfer device 600 carries
  • the characteristic image on the currently transported pallet 500 can be recognized by the image recognition device 700, and according to the identified pallet 500
  • the feature image acquires feature information of the tray 500 , so as to prepare for adjusting the transport mode of the transport device 600 .
  • the semiconductor process equipment also includes a controller, which can be respectively connected to the image recognition device 700 and the transmission device 600 to realize signal transmission.
  • the image recognition device 700 can send the characteristic information of the tray 500 to the controller, and the control The device performs analysis and processing, and then controls the transmission device 600 to perform corresponding transmission actions according to the analysis and processing results.
  • the controller can obtain the feature information of the currently transmitted tray 500.
  • the tray information library can also be stored in the controller.
  • the specifications of the pallets 500 respectively correspond to the transmission parameters.
  • the controller After the controller acquires the feature information of the currently transported pallet 500, it searches the pallet information library for the corresponding transport parameters according to the feature information. After finding the corresponding transmission parameters, the control transmission device 600 transmits the tray 500 according to the transmission parameters.
  • the specific process of the semiconductor process equipment transport tray 500 provided in the embodiment of the present application is as follows:
  • the image recognition device 700 can automatically recognize pallets 500 of different specifications, thereby effectively solving the problems of time-consuming, labor-intensive, and error-prone problems caused by manual input of pallet characteristic information and transmission parameters, and ensuring The transmission accuracy and transmission efficiency of pallets 500 of different specifications are improved; in addition, the controller can search the corresponding transmission parameters from the preset pallet information library, and make the transmission device 600 transmit the pallets 500 according to the corresponding transmission parameters, so that there is no need to open the cavity for processing.
  • the 600-position calibration of the transmission device effectively solves the time-consuming and labor-intensive problem caused by opening the cavity. Therefore, the embodiment of the present application can realize automatic and intelligent transmission while ensuring transmission accuracy, reduce manual labor, and improve transmission efficiency.
  • the acquired characteristic information is combined with the pre-stored characteristics in the pallet information database through the controller.
  • the information is compared, so that it can be judged whether there is the same feature information as the feature information of the currently transported tray 500 and the corresponding transport parameters in the tray information library.
  • the pallet information database stores the same feature information as the currently transmitted pallet 500.
  • the corresponding transmission parameters can be found from the pallet information database, so that the transmission
  • the device 600 may transport the tray 500 according to the transport parameters.
  • the second case there is no characteristic information of the currently transmitted pallet 500 in the pallet information database.
  • the characteristic information of the pallets 500 transmitted twice adjacently may be the same or different.
  • the transmission parameters corresponding to the pallets 500 transmitted twice adjacently are the same, so that when the current pallet 500 is transmitted, the transmission parameters of the pallet 500 transmitted last time can be used, so that the current pallet can be realized without switching the transmission parameters.
  • the transmission efficiency can be greatly improved, and the accuracy of the transmission parameters can be guaranteed, thereby ensuring the transmission accuracy.
  • the transmission parameters corresponding to the characteristic information of the currently transmitted pallet 500 can be searched from the pallet information library pre-stored in the controller. After the corresponding transmission parameters are found, the transmission device 600 can be controlled to transmit the pallet 500 according to the transmission parameters. . Based on this, automatic searching and switching of transmission parameters can be realized to ensure the accuracy of transmission parameters and further ensure transmission accuracy.
  • an information file of the pallet 500 can be established in the pallet information library.
  • the specific process is as follows:
  • the commissioning process covers multiple pallets 500 of different specifications that need to be used, so that a pallet information library for transmission is established for multiple pallets 500 of different specifications.
  • station calibration and AWC calibration can be performed according to the above-mentioned debugging process of the transmission device 600. After the calibration is completed, the corresponding transmission parameters can be stored in the pallet information library, including station parameters and AWC sensor parameters. , and thus, an information file of the currently transported pallet 500 is formed in the pallet information library, so as to be invoked when the pallet 500 of this specification is subsequently transported.
  • the feature information of the pallet 500 is stored in the pallet information database, that is, the information file of the pallet 500 is established in the pallet information database, so that when the pallet 500 of this specification needs to be transmitted in the future, it can be directly obtained from the pallet. Invoking from the information library, there is no need to open a cavity for each station calibration and AWC calibration, thereby improving the transmission efficiency of the pallet 500 .
  • the transmission parameters may include the size of the pallet 500 and the station parameters corresponding to the pallet 500 of this size. Based on this, when a pallet 500 of a certain size is transmitted, the pallet 500 with the size can be called from the pallet information library. Corresponding station parameters, so that the tray 500 can be transferred to the corresponding station according to the station parameters.
  • station expansion and contraction value can all be understood as parameters related to the transmission station of the pallet 500, based on these parameter values, the pallet 500 can be determined the transmission method.
  • two wafer automatic centering AWC Active Wafer Centering, wafer automatic centering
  • the connection line of the two AWC sensors is perpendicular to the conveying path of the tray 500 , and the distances between the two AWC sensors and the vertical feet are different. It is easy to understand that the transmission path of the tray 500 is regarded as a straight line, which is located between two AWC sensors and is perpendicular to the connection line of the two AWC sensors.
  • the connection line of the two AWC sensors includes the first line segment and the second line segment.
  • first line segment is the vertical line where one AWC sensor intersects the line
  • second line segment is the vertical line where the other AWC sensor intersects the line
  • intersection point of the two perpendicular lines and the line is the vertical line. foot.
  • the lengths of the first line segment and the second line segment are not equal, that is, the distances between the two AWC sensors and the vertical feet are not equal.
  • the transmission parameters also include: AWC sensor parameters corresponding to the pallet 500 of this size, wherein the AWC sensor parameters include: the front-end trigger delay time of the first AWC sensor 810, the rear-end trigger delay time of the first AWC sensor 810, the second The front-end trigger delay time of the second AWC sensor 820 and the rear-end trigger delay time of the second AWC sensor 820 .
  • each AWC sensor will pass through twice, a total of four times, and the position of the transport device 600 when passing the AWC sensor four times can calculate the center of the current transport tray 500, In this way, the AWC calibration of the transmission device 600 is realized.
  • the transfer station in the process chamber 300 can be taught according to the above-mentioned AWC calibration method of the transfer device 600 , and the teaching center of the transfer device 600 can be determined.
  • the transfer device 600 can compensate according to the deviation, To ensure the consistency of the position of the tray 500 in the process chamber 300 .
  • the transmission parameters of the pallet 500 may include the pallet number, pallet size, corresponding station parameters and corresponding AWC sensor parameters, see the following table for details.
  • the image recognition device 700 may be a barcode recognition sensor, and correspondingly, the characteristic image may be the barcode 510 .
  • the barcode recognition sensor can recognize the barcode 510 on the tray 500 to determine the characteristic information of the tray 500 .
  • the image recognition device 700 can also use other components, and the corresponding feature images can also take other forms, and the specific forms of the image recognition device 700 and feature images are not specifically limited in this embodiment of the application.
  • the transmission device 600 In order to be able to call the characteristic information of pallets 500 of different specifications and the corresponding transmission parameters, and apply the transmission parameters to the transmission device 600, so that the transmission device 600 can accurately and quickly transmit the pallet 500, in the embodiment of the present application, in the pallet information database
  • the feature information and corresponding transmission parameters of pallets 500 of various specifications are stored in the storage.
  • a pallet 500 of a certain specification has a corresponding size of the pallet 500 and a corresponding transmission parameter.
  • the characteristic information of the pallet 500 and the transmission parameters corresponding to the characteristic information can be directly called from the pallet information library, including the size of the pallet 500 and the station parameters corresponding to the size, And the AWC sensor parameters corresponding to the size, so as to control the transfer device 600 to transfer the tray 500 according to the above-mentioned various transfer parameters, without re-inputting the transfer parameters, improving the transfer efficiency and ensuring the transfer accuracy.
  • the embodiment of the present application also discloses a tray 500, which is applied to the above-mentioned semiconductor process equipment, wherein a characteristic image is set on the top surface of the tray 500, the characteristic image can be recognized by the image recognition device 700, and the characteristic image includes Characteristic information of the tray 500 .
  • the feature image may be a barcode 510
  • the image recognition device 700 may use a barcode recognition sensor.
  • Pallets 500 of different specifications have barcodes 510 in different forms, as shown in FIG. 3 .
  • At least two positioning holes are provided on the tray 500, and the at least two positioning holes are used to cooperate with at least two positioning pins 410 provided on the cassette 400 one by one. , restricting the position of the tray 500 in the cassette 400 so that the point on the outline of the tray 500 along the transport direction of the tray 500 that is farthest from the transport chamber 200 is located at a preset position.
  • two positioning holes are set on the tray 500, correspondingly, two positioning pins 410 are set on the cassette 400, and the two positioning holes on the tray 500 are symmetrically set on both sides of the transport direction, that is, two The connection line of the positioning holes is perpendicular to the conveying direction, so that the trays 500 of various sizes required by the process can be covered.
  • the positions of the two positioning holes on the trays 500 of different sizes are different, and the setting method of the positions of the two positioning holes needs to satisfy the regular placement of the trays 500 of different sizes so that the transfer device 600 can pick them up, for example, based on the different sizes of the positioning holes
  • the points on the contours of the trays 500 of different sizes along the conveying direction of the trays 500 that are farthest from the transfer chamber 200 are located at a preset position, that is, the contours of the trays 500 of different sizes are located at a preset position.
  • the preset position is tangent, and the preset position can be flexibly set according to the structure and size of the cassette 400 .
  • the thickness of the tray 500 may be 4mm-6mm, and the height of the positioning pin 410 is designed to be 1.5mm, and the diameter is designed to be 4mm.
  • the positioning hole provided on the tray 500 may have a depth of 2mm and a diameter of 6mm, so as to ensure that the positioning pin 410 can penetrate into the positioning hole. Based on the above-mentioned settings, through the one-to-one matching of at least two positioning holes with at least two positioning pins 410, the uniqueness of the position where the tray 500 is placed on the cassette 400 can be ensured, so that trays 500 of different sizes can be placed in the loading chamber. Positional accuracy in 100's.
  • the embodiment of the present application also discloses a chip box 400 for carrying a tray 500 .
  • the chip box 400 includes a plurality of bearing positions, and each bearing position includes a first supporting block 420 and a second supporting block 430 which are arranged oppositely, and at least one positioning bracket is respectively arranged on the first supporting block 420 and the second supporting block 430.
  • the pins 410 are used to cooperate with at least two positioning holes on the tray 500 one by one, to limit the position of the tray 500 in the cassette 400, so that the outline of the tray 500 is farthest from the transfer chamber 200 along the transfer direction of the tray 500 The point is located at a preset position.
  • the chip box 400 may include a top board, a bottom board, a first side board and a second side board, wherein the top board and the bottom board are arranged in parallel with a certain distance between them, and the first side board and the second side board are both It is connected between the top board and the bottom board, and the first side board and the second side board are arranged at intervals.
  • a plurality of first support blocks 420 are provided on the side of the first side plate facing the second side plate, and the plurality of first support blocks 420 are arranged at intervals along the direction perpendicular to the top plate, so that adjacent A first slot for accommodating a part of the tray 500 is formed between two first support blocks 420 , similarly, a second slot for accommodating a part of the tray 500 is formed between two adjacent second support blocks 430 , and A plurality of first card slots is provided in one-to-one correspondence with a plurality of second card slots, so that the correspondingly arranged first card slots and second card slots form a bearing position for carrying the tray 500 .
  • the same cassette 400 can be compatible with multiple pallets 500 of different sizes.
  • the size of the cassette 400 is designed according to the size of the largest pallet 500 . Based on this, after the tray 500 is placed in the film box 400, the edge of the tray 500 is pressed against the edge of one side of the film box 400, so that the trays 500 of different sizes can be accurately positioned by the film box 400 to ensure that the tray 500 Positional accuracy in the load chamber 100 .
  • positioning structures may be provided on the cassette 400 and the tray 500 respectively.
  • at least one positioning pin 410 is provided on the corresponding first support block 420
  • at least one positioning pin 410 is provided on the second support block 430
  • at least two positioning holes are provided on the tray 500 .
  • the tray 500 carried on the film box 400 is positioned by the positioning pin 410 and the positioning hole that cooperate with each other; the transfer device 600 carries the tray 500 to move from the loading chamber 100 to the transfer chamber 200; during the movement, the image recognition device 700 Recognize the image features on the tray 500, and determine the feature information of the tray 500 according to the image features; after the controller obtains the feature information of the tray 500, compares the feature information with the feature information stored in the tray information database, and judges the pallet information database.
  • the precise positioning of trays 500 of different specifications is realized, and the automatic identification of trays 500 is realized.
  • the characteristic information and corresponding information of the transmission device 600 are automatically called transfer parameters, and transfer the pallet 500 according to the corresponding transfer parameter, so as to ensure the accurate and efficient transfer of the pallet 500 of different specifications.

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Abstract

The present application discloses a semiconductor process device, a tray and a wafer box, which relate to the field of semiconductor equipment. The semiconductor process device comprises a process chamber, a transmission chamber and a loading chamber. The loading chamber is used for accommodating a wafer box, the wafer box is used for bearing a tray, and a transmission apparatus is provided in the transmission chamber and is used for transmitting the tray between the process chamber and the loading chamber. An image recognition apparatus is provided at the connection of the loading chamber and the transmission chamber, and the image recognition apparatus is used for recognizing a preset feature image on the tray when the transmission apparatus bears the tray to move, and for determining feature information of the tray. The semiconductor process device further comprises a controller, the controller being used for obtaining the feature information, finding, from a preset tray information library, transmission parameters corresponding to the feature information, and controlling the transmission apparatus to transmit the tray according to the transmission parameters. A tray, which is used in a semiconductor process device. A wafer box, which is used for bearing a tray. In the present application, problems such as low transmission precision, time consumption and labor consumption may be solved.

Description

半导体工艺设备、托盘及片盒Semiconductor process equipment, trays and cassettes 技术领域technical field
本申请属于半导体装备技术领域,具体涉及一种半导体工艺设备、托盘及片盒。The application belongs to the technical field of semiconductor equipment, and in particular relates to a semiconductor process equipment, a tray and a chip box.
背景技术Background technique
增强型等离子体气相沉积(Plasma Enhanced Chemical Vapor Deposition,PECVD)设备是普遍应用于LED、IC以及微机电系统(Micro Electro Mechanical System,MEMS)等相关领域的一种薄膜沉积设备,主要应用在2吋、4吋、6吋等规格的晶圆表面沉积SiO 2、SiN x或SiON薄膜的工艺过程,目前该种设备已经大量应用在相关半导体领域。 Enhanced plasma vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD) equipment is a kind of thin film deposition equipment commonly used in LED, IC and micro electro mechanical system (Micro Electro Mechanical System, MEMS) and other related fields, mainly used in 2-inch The process of depositing SiO 2 , SiN x or SiON films on the surface of wafers with specifications such as , 4 inches, and 6 inches. At present, this kind of equipment has been widely used in related semiconductor fields.
PECVD设备在进行沉积薄膜时,晶圆需要在装载腔内进行装载,并由机械手从装载腔中取出,在传输腔中进行中转,而后传输至工艺腔中进行工艺反应。由于存在同一反应腔进行不同尺寸晶圆的工艺需求,一般将晶圆放置在托盘上进行传输。为了保证晶圆在反应腔内的位置较为精确,以确保工艺的重复性,在传输过程中不同尺寸托盘的精确传输显得至关重要。When PECVD equipment is depositing thin films, wafers need to be loaded in the loading chamber, taken out by the manipulator from the loading chamber, transferred in the transfer chamber, and then transferred to the process chamber for process reaction. Due to the process requirements for wafers of different sizes in the same reaction chamber, the wafers are generally placed on trays for transport. In order to ensure that the position of the wafer in the reaction chamber is relatively accurate, and to ensure the repeatability of the process, the precise transmission of trays of different sizes is very important during the transmission process.
然而,一些传输装备无法对装载腔内不同规格的托盘进行精确定位,导致传输精度低;不同托盘的参数需要手动输入,且在切换不同尺寸的托盘时需要开腔进行各工位校准及动态晶圆定心(Active Wefer Centering,AWC)标定,从而导致耗时耗力且容易出现人为误差,影响传输精度。However, some transmission equipment cannot accurately position the trays of different specifications in the loading chamber, resulting in low transmission accuracy; the parameters of different trays need to be manually input, and when switching trays of different sizes, it is necessary to open the cavity for each station calibration and dynamic wafer Centering (Active Wefer Centering, AWC) calibration, resulting in time-consuming and labor-intensive and prone to human errors, affecting transmission accuracy.
发明内容Contents of the invention
本申请实施例的目的是提供一种半导体工艺设备、托盘及片盒,能够解决传输精度低、耗时耗力等问题。The purpose of the embodiment of the present application is to provide a semiconductor process equipment, a tray and a cassette, which can solve the problems of low transmission accuracy, time-consuming and labor-consuming.
为了解决上述技术问题,本申请是这样实现的:In order to solve the above-mentioned technical problems, the application is implemented as follows:
本申请实施例提供了一种半导体工艺设备,包括工艺腔室、传输腔室和装载腔室,所述工艺腔室用于执行半导体工艺,所述装载腔室用于容置片盒,所述片盒用于承载托盘,所述传输腔室中设置有传输装置,用于在所述工艺腔室和所述装载腔室之间传输所述托盘;An embodiment of the present application provides a semiconductor process equipment, including a process chamber, a transport chamber, and a loading chamber, the process chamber is used to perform a semiconductor process, the loading chamber is used to accommodate a cassette, the The cassette is used to carry a tray, and a transfer device is arranged in the transfer chamber for transferring the tray between the process chamber and the loading chamber;
所述装载腔室和所述传输腔室的交接处设置有图像识别装置,所述图像识别装置用于在所述传输装置携带所述托盘由所述装载腔室向所述传输腔室移动的过程中,识别所述托盘上的预设的特征图像,确定所述托盘的特征信息;An image recognition device is provided at the junction of the loading chamber and the transfer chamber, and the image recognition device is used for carrying the tray on the transfer device and moving from the loading chamber to the transfer chamber During the process, the preset characteristic image on the pallet is identified, and the characteristic information of the pallet is determined;
所述半导体工艺设备还包括控制器,所述控制器用于获取所述特征信息,从预设的托盘信息库中查找与所述特征信息对应的传输参数,控制所述传输装置根据所述传输参数传输所述托盘。The semiconductor process equipment further includes a controller, the controller is used to obtain the characteristic information, search for the transmission parameters corresponding to the characteristic information from the preset pallet information library, and control the transmission device according to the transmission parameters Transport the pallet.
本申请实施例还提供了一种托盘,应用于上述半导体工艺设备中,所述托盘的顶面上设置有特征图像,所述特征图像可被图像识别装置识别,所述特征图像包括所述托盘的特征信息。The embodiment of the present application also provides a tray, which is applied to the above-mentioned semiconductor process equipment. A characteristic image is set on the top surface of the tray, and the characteristic image can be recognized by an image recognition device. The characteristic image includes the tray feature information.
本申请实施例还提供了一种片盒,用于承载上述托盘,所述片盒包括多个承载位,每个所述承载位均包括相对设置的第一支撑块和第二支撑块,所述第一支撑块和所述第二支撑块上分别设有至少一个定位销,用于与所述托盘上的至少两个定位孔配合,限制所述托盘在所述片盒中的位置,使所述托盘轮廓上沿所述托盘传输方向距所述传输腔室最远的点位于一预设位置处。The embodiment of the present application also provides a chip box for carrying the above-mentioned tray, the chip box includes a plurality of bearing positions, and each of the bearing positions includes a first support block and a second support block arranged oppositely, so The first support block and the second support block are respectively provided with at least one positioning pin, which is used to cooperate with at least two positioning holes on the tray to limit the position of the tray in the cassette, so that A point on the tray profile farthest from the transfer chamber along the tray transfer direction is located at a preset position.
本申请实施例中,通过图像识别装置可以识别出托盘上预设的特征图像,从而确定托盘的特征信息,控制器获取特征信息后从预设的托盘信息库中查找与该特征信息对应的传输参数,而后根据该传输参数控制传输装置进行运动,以实现对托盘的传输。基于上述设置,可以对不同规格的托盘进行自动识别,从而可以有效解决手动输入托盘的特征信息、传输参数的方式带 来的耗时耗力、容易出现误差的问题,从而保证了不同特征信息的托盘的传输精度;另外,控制器可以从预设的托盘信息库中查找对应的传输参数,并使传输装置按照该传输参数传输托盘,从而无需开腔进行传输装置工位校准,有效解决了开腔导致的耗时耗力的问题。因此,本申请实施例能够在保证传输精度的情况下实现自动化、智能化传输,减少人工劳动,提高了传输效率。In the embodiment of the present application, the preset characteristic image on the pallet can be recognized by the image recognition device, so as to determine the characteristic information of the pallet. After obtaining the characteristic information, the controller searches the preset pallet information library for the transmission corresponding to the characteristic information parameters, and then control the transmission device to move according to the transmission parameters, so as to realize the transmission of pallets. Based on the above settings, pallets of different specifications can be automatically identified, which can effectively solve the problems of time-consuming, labor-intensive, and error-prone problems caused by manual input of pallet feature information and transmission parameters, thus ensuring the accuracy of different feature information. The transmission accuracy of the pallet; in addition, the controller can look up the corresponding transmission parameters from the preset pallet information library, and make the transmission device transmit the pallet according to the transmission parameters, so that there is no need to open the cavity for the transmission device station calibration, effectively solving the problem caused by the cavity opening time-consuming problem. Therefore, the embodiment of the present application can realize automatic and intelligent transmission while ensuring transmission accuracy, reduce manual labor, and improve transmission efficiency.
附图说明Description of drawings
图1为本申请实施例公开的半导体工艺设备的结构示意图;FIG. 1 is a schematic structural diagram of semiconductor process equipment disclosed in an embodiment of the present application;
图2为本申请实施例公开的片盒的结构示意图;Fig. 2 is a structural schematic diagram of the cassette disclosed in the embodiment of the present application;
图3为本申请实施例公开的(a)-(h)不同形式的条形码的示意图;3 is a schematic diagram of barcodes in different forms (a)-(h) disclosed in the embodiments of the present application;
图4为本申请实施例公开的托盘传输的原理图;FIG. 4 is a schematic diagram of the pallet transport disclosed in the embodiment of the present application;
图5为本申请实施例公开的建立托盘信息库的原理图。Fig. 5 is a schematic diagram of establishing a pallet information library disclosed in the embodiment of the present application.
附图标记说明:Explanation of reference signs:
100-装载腔室;100 - loading chamber;
200-传输腔室;200 - transfer chamber;
300-工艺腔室;300 - process chamber;
400-片盒;410-定位销;420-第一支撑块;430-第二支撑块;400-piece box; 410-locating pin; 420-the first support block; 430-the second support block;
500-托盘;510-条形码;500-tray; 510-barcode;
600-传输装置;600 - transmission device;
700-图像识别装置;700-image recognition device;
810-第一AWC传感器;820-第二AWC传感器。810 - first AWC sensor; 820 - second AWC sensor.
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创 造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without making creative efforts all belong to the scope of protection of this application.
本申请的说明书和权利要求书中的术语“第一”、“第二”等是用于区别类似的对象,而不用于描述特定的顺序或先后次序。应该理解这样使用的数据在适当情况下可以互换,以便本申请的实施例能够以除了在这里图示或描述的那些以外的顺序实施,且“第一”、“第二”等所区分的对象通常为一类,并不限定对象的个数,例如第一对象可以是一个,也可以是多个。The terms "first", "second" and the like in the specification and claims of the present application are used to distinguish similar objects, and are not used to describe a specific sequence or sequence. It should be understood that the terms so used are interchangeable under appropriate circumstances such that the embodiments of the application can be practiced in sequences other than those illustrated or described herein, and that references to "first," "second," etc. distinguish Objects are generally of one type, and the number of objects is not limited. For example, there may be one or more first objects.
参考图1至图5,本申请实施例公开了一种半导体工艺设备。如图1所示,所公开的半导体工艺设备包括装载腔室100、传输腔室200和工艺腔室300。其中,工艺腔室300用于执行半导体工艺,例如,对晶圆进行刻蚀、在晶圆表面形成膜层等工艺。装载腔室100用于容置片盒400,片盒400用于承载托盘500,托盘500用于承载晶圆。如此,在晶圆进行工艺之前,通过托盘500和片盒400放置在装载腔室100中存储,当需要对晶圆进行工艺时,可以将承载有晶圆的托盘500从装载腔室100中经过传输腔室200传送至工艺腔室300,以在工艺腔室300中对晶圆进行工艺。Referring to FIG. 1 to FIG. 5 , the embodiment of the present application discloses a semiconductor process equipment. As shown in FIG. 1 , the disclosed semiconductor process equipment includes a load chamber 100 , a transfer chamber 200 and a process chamber 300 . Wherein, the process chamber 300 is used for performing semiconductor processes, for example, processes such as etching a wafer and forming a film layer on the surface of the wafer. The loading chamber 100 is used to accommodate the cassette 400, the cassette 400 is used to carry the tray 500, and the tray 500 is used to carry the wafer. In this way, before the wafer is processed, the tray 500 and the cassette 400 are placed in the loading chamber 100 for storage, and when the wafer needs to be processed, the tray 500 carrying the wafer can pass through the loading chamber 100 The transfer chamber 200 is transferred to the process chamber 300 to process the wafer in the process chamber 300 .
一些实施例中,装载腔室100、传输腔室200和工艺腔室300依次布置。为了将装载腔室100中的晶圆传输至工艺腔室300中,在传输腔室200中设置传输装置600,可选地,传输装置600可以包括机械手,通过传输装置600可以在工艺腔室300和装载腔室100之间传输托盘500,并通过托盘500携带晶圆进行传输。In some embodiments, the loading chamber 100 , the transfer chamber 200 and the process chamber 300 are arranged in sequence. In order to transfer the wafer in the loading chamber 100 to the process chamber 300, a transfer device 600 is provided in the transfer chamber 200. Optionally, the transfer device 600 can include a robot arm, and the transfer device 600 can be used in the process chamber 300. The tray 500 is transferred to and from the loading chamber 100, and the wafer is carried by the tray 500 for transfer.
为了对多种不同规格的托盘500进行识别,在装载腔室100和传输腔室200的交接处设置图像识别装置700,在传输装置600携带托盘500由装载腔室100向传输腔室200移动的过程中,可以通过图像识别装置700识别托盘500上的预设的特征图像,从而根据特征图像确定托盘500的特征信息(例如编号、序号、标识等)。In order to identify pallets 500 of various specifications, an image recognition device 700 is provided at the junction of the loading chamber 100 and the transfer chamber 200, and the transfer device 600 carries the pallet 500 and moves from the loading chamber 100 to the transfer chamber 200. During the process, the preset characteristic image on the tray 500 can be recognized by the image recognition device 700, so as to determine the characteristic information (such as serial number, identification, etc.) of the tray 500 according to the characteristic image.
基于此,通过在装载腔室100和传输腔室200的交接处设置图像识别装 置700,使得装载腔室100和传输腔室200的交接处附近区域形成图像识别区,如此,在传输装置600携带托盘500经过图像识别区时,由于不同规格的托盘500上设有不同的特征图像,从而可以通过图像识别装置700对当前传输的托盘500上的特征图像进行识别,并根据所识别的托盘500的特征图像获取托盘500的特征信息,从而为调整传输装置600的传输方式做准备。Based on this, by setting the image recognition device 700 at the junction of the loading chamber 100 and the transfer chamber 200, the image recognition area is formed in the vicinity of the junction of the loading chamber 100 and the transfer chamber 200, so that when the transfer device 600 carries When the pallet 500 passes through the image recognition area, since different characteristic images are provided on the pallet 500 of different specifications, the characteristic image on the currently transported pallet 500 can be recognized by the image recognition device 700, and according to the identified pallet 500 The feature image acquires feature information of the tray 500 , so as to prepare for adjusting the transport mode of the transport device 600 .
半导体工艺设备还包括控制器,控制器可以与上述图像识别装置700以及传输装置600分别连接,以实现信号传输,具体为,图像识别装置700可以将托盘500的特征信息发送至控制器,由控制器进行分析处理,而后根据分析处理结果控制传输装置600执行相应的传输动作。The semiconductor process equipment also includes a controller, which can be respectively connected to the image recognition device 700 and the transmission device 600 to realize signal transmission. Specifically, the image recognition device 700 can send the characteristic information of the tray 500 to the controller, and the control The device performs analysis and processing, and then controls the transmission device 600 to perform corresponding transmission actions according to the analysis and processing results.
其中,控制器可以获取当前传输的托盘500的特征信息,与此同时,控制器内还可以存储有托盘信息库,托盘信息库包括多种不同规格的托盘500的特征信息,以及与多种不同规格的托盘500分别对应的传输参数。如此,在控制器获取当前传输的托盘500的特征信息后,根据该特征信息从托盘信息库中查找与之相对应的传输参数。当查找到对应的传输参数后,控制传输装置600根据该传输参数对托盘500进行传输。Wherein, the controller can obtain the feature information of the currently transmitted tray 500. At the same time, the tray information library can also be stored in the controller. The specifications of the pallets 500 respectively correspond to the transmission parameters. In this way, after the controller acquires the feature information of the currently transported pallet 500, it searches the pallet information library for the corresponding transport parameters according to the feature information. After finding the corresponding transmission parameters, the control transmission device 600 transmits the tray 500 according to the transmission parameters.
本申请实施例提供的半导体工艺设备传输托盘500的具体过程如下:The specific process of the semiconductor process equipment transport tray 500 provided in the embodiment of the present application is as follows:
将承载多个托盘500的片盒400放置于装载腔室100中,每个托盘500中可以承载晶圆;控制器控制传输装置600由传输腔室200移动至装载腔室100,拾取托盘500,并控制传输装置600携带托盘500由装载腔室100朝向传输腔室200移动;在移动过程中,当托盘500移动至图像识别装置700的图像识别区时,图像识别装置700可以对托盘500上预设的特征图像进行识别,并根据特征图像确定托盘500的特征信息,与此同时,将所确定的特征信息传输至控制器;控制器根据该特征信息从预设的托盘信息库中查找与之相对应的传输参数,而后控制传输装置600按照该传输参数传输托盘500。Place the cassette 400 carrying a plurality of trays 500 in the loading chamber 100, each tray 500 can carry wafers; the controller controls the transfer device 600 to move from the transfer chamber 200 to the loading chamber 100, pick up the tray 500, And control the transfer device 600 to carry the tray 500 to move from the loading chamber 100 towards the transfer chamber 200; Identify the characteristic image of the set, and determine the characteristic information of the pallet 500 according to the characteristic image, and at the same time, transmit the determined characteristic information to the controller; the controller searches the preset pallet information library according to the characteristic information Corresponding transmission parameters, and then control the transmission device 600 to transmit the tray 500 according to the transmission parameters.
基于上述设置,通过图像识别装置700可以对不同规格的托盘500进行 自动识别,从而可以有效解决手动输入托盘的特征信息、传输参数的方式带来的耗时耗力、容易出现误差的问题,保证了不同规格的托盘500的传输精度和传输效率;另外,控制器可以从预设的托盘信息库中查找对应的传输参数,并使传输装置600按照对应的传输参数传输托盘500,从而无需开腔进行传输装置600工位校准,有效解决了开腔导致的耗时耗力的问题。因此,本申请实施例能够在保证传输精度的情况下实现自动化、智能化传输,减少人工劳动,提高了传输效率。Based on the above settings, the image recognition device 700 can automatically recognize pallets 500 of different specifications, thereby effectively solving the problems of time-consuming, labor-intensive, and error-prone problems caused by manual input of pallet characteristic information and transmission parameters, and ensuring The transmission accuracy and transmission efficiency of pallets 500 of different specifications are improved; in addition, the controller can search the corresponding transmission parameters from the preset pallet information library, and make the transmission device 600 transmit the pallets 500 according to the corresponding transmission parameters, so that there is no need to open the cavity for processing. The 600-position calibration of the transmission device effectively solves the time-consuming and labor-intensive problem caused by opening the cavity. Therefore, the embodiment of the present application can realize automatic and intelligent transmission while ensuring transmission accuracy, reduce manual labor, and improve transmission efficiency.
为了能够从托盘信息库中查找到当前传输的托盘500的特征信息,以及与该特征信息对应的传输参数,本申请实施例中,通过控制器将获取的特征信息与托盘信息库中预存的特征信息进行比对,从而可以判断托盘信息库中是否存有与当前传输的托盘500的特征信息相同的特征信息以及与之对应的传输参数。In order to be able to find the characteristic information of the currently transmitted pallet 500 from the pallet information database, and the transmission parameters corresponding to the characteristic information, in the embodiment of the present application, the acquired characteristic information is combined with the pre-stored characteristics in the pallet information database through the controller. The information is compared, so that it can be judged whether there is the same feature information as the feature information of the currently transported tray 500 and the corresponding transport parameters in the tray information library.
第一种情况,托盘信息库中存有与当前传输的托盘500的特征信息相同的特征信息,此种情况下,在传输时,可以从托盘信息库中查找到对应的传输参数,从而使传输装置600可以根据该传输参数传输托盘500。In the first case, the pallet information database stores the same feature information as the currently transmitted pallet 500. In this case, during transmission, the corresponding transmission parameters can be found from the pallet information database, so that the transmission The device 600 may transport the tray 500 according to the transport parameters.
第二种情况,托盘信息库中不存在当前传输的托盘500的特征信息,此种情况下,若要实现托盘500的传输,需要首先在托盘信息库中建立该托盘500的信息档案,其中包括托盘的特征信息以及对应的传输参数,以便于为后续查找奠定基础。In the second case, there is no characteristic information of the currently transmitted pallet 500 in the pallet information database. In this case, to realize the transmission of the pallet 500, it is necessary to first establish an information file of the pallet 500 in the pallet information database, including The characteristic information of the pallet and the corresponding transmission parameters are used to lay the foundation for subsequent searches.
考虑到相邻两次传输的托盘500的特征信息可以相同也可以不同。当相同时,相邻两次传输的托盘500对应的传输参数相同,从而在传输当前的托盘500时,可以延用上一次传输的托盘500的传输参数,从而无需切换传输参数即可实现当前托盘500的传输;当不同时,相邻两次传输的托盘500所对应的传输参数不同,从而在传输当前的托盘500时,需要首先切换至与当前传输的托盘500相对应的传输参数。It is considered that the characteristic information of the pallets 500 transmitted twice adjacently may be the same or different. When they are the same, the transmission parameters corresponding to the pallets 500 transmitted twice adjacently are the same, so that when the current pallet 500 is transmitted, the transmission parameters of the pallet 500 transmitted last time can be used, so that the current pallet can be realized without switching the transmission parameters. 500 transmission; when different, the transmission parameters corresponding to the pallets 500 that are transmitted twice adjacently are different, so when the current pallet 500 is transmitted, it is necessary to switch to the transmission parameters corresponding to the current pallet 500 first.
基于上述情况,在上述第一种情况下,还需要进一步判断当前传输的托盘500的特征信息与上一次传输的托盘500的特征信息是否一致。当两次传输的托盘500的特征信息一致时,表明两次传输的托盘500属于同一规格的托盘500,此时无需切换传输参数,从而可以直接延用上一次的传输参数,也即,当前控制器中存储的传输参数,基于此,可以大幅度提高传输效率,并且还能够保证传输参数的准确性,进而保证了传输精度。相反,当两次传输的托盘500的特征信息不一致时,表明当前传输的托盘500与上一次传输的托盘500的规格不同,需要将传输参数切换至与当前传输的托盘500相对应的传输参数。如此,可以从控制器中预存的托盘信息库中查找与当前传输的托盘500的特征信息相对应的传输参数,待查找到对应的传输参数后,可以控制传输装置600根据该传输参数传输托盘500。基于此,可以实现传输参数的自动查找和切换,以保证传输参数的准确性,进而保证传输精度。Based on the above situation, in the above first case, it is necessary to further determine whether the feature information of the currently transported tray 500 is consistent with the feature information of the last transported tray 500 . When the characteristic information of the trays 500 transmitted twice is the same, it indicates that the trays 500 transmitted twice belong to the tray 500 of the same specification. At this time, there is no need to switch the transmission parameters, so that the previous transmission parameters can be directly used, that is, the current control Based on the transmission parameters stored in the device, the transmission efficiency can be greatly improved, and the accuracy of the transmission parameters can be guaranteed, thereby ensuring the transmission accuracy. On the contrary, when the characteristic information of the pallet 500 transmitted twice is inconsistent, it indicates that the specification of the pallet 500 transmitted currently is different from that of the pallet 500 transmitted last time, and the transmission parameters need to be switched to the transmission parameters corresponding to the pallet 500 currently transmitted. In this way, the transmission parameters corresponding to the characteristic information of the currently transmitted pallet 500 can be searched from the pallet information library pre-stored in the controller. After the corresponding transmission parameters are found, the transmission device 600 can be controlled to transmit the pallet 500 according to the transmission parameters. . Based on this, automatic searching and switching of transmission parameters can be realized to ensure the accuracy of transmission parameters and further ensure transmission accuracy.
在上述第二种情况下,可以在托盘信息库中建立托盘500的信息档案。如图5所示,具体过程如下:In the above second case, an information file of the pallet 500 can be established in the pallet information library. As shown in Figure 5, the specific process is as follows:
首先进行传输条件的检查,当满足传输测试条件时,将托盘500放置于片盒400上,并进行精确定位,在托盘500放置无问题的情况下,记录当前托盘500的特征信息,如尺寸等;记录完成后,按照传输装置600工位校准方法对工艺腔室300各工位进行校准;记录校准完成后的工位值。校准完成后,传输装置600携带托盘500经过工艺腔室300,AWC传感器记录传输装置600携带托盘500经过工艺腔室300时的示教中心(即,校准后的托盘500的圆心),完成AWC标定,从而形成当前传输的托盘500的信息档案。调试过程覆盖所需要使用的多种不同规格的托盘500,从而对多个不同规格的托盘500建立传输用的托盘信息库。First, check the transmission conditions. When the transmission test conditions are met, place the tray 500 on the cassette 400 and perform precise positioning. If there is no problem with the placement of the tray 500, record the characteristic information of the current tray 500, such as size, etc. ; After the recording is completed, calibrate each station of the process chamber 300 according to the station calibration method of the transmission device 600 ; record the station value after the calibration is completed. After the calibration is completed, the transfer device 600 carries the tray 500 through the process chamber 300, and the AWC sensor records the teaching center (that is, the center of the tray 500 after calibration) when the transfer device 600 carries the tray 500 through the process chamber 300, and the AWC calibration is completed , so as to form an information file of the currently transported tray 500 . The commissioning process covers multiple pallets 500 of different specifications that need to be used, so that a pallet information library for transmission is established for multiple pallets 500 of different specifications.
可以理解的是,当前传输的托盘500的特征信息不存在于托盘信息库中时,可以提示该托盘500无法进行传输,需要开腔调试建立该托盘500的特 征信息以及传输参数。一些实施例中,可以按照上述传输装置600调试的流程进行工位校准和AWC标定,待标定完成后,即可存储相对应的传输参数至托盘信息库中,其中包括工位参数和AWC传感器参数,从而,在托盘信息库中形成当前传输的托盘500的信息档案,以便于后续传输该种规格的托盘500时调用。It can be understood that when the characteristic information of the currently transmitted pallet 500 does not exist in the pallet information database, it may prompt that the pallet 500 cannot be transmitted, and that the characteristic information and transmission parameters of the pallet 500 need to be established for open cavity debugging. In some embodiments, station calibration and AWC calibration can be performed according to the above-mentioned debugging process of the transmission device 600. After the calibration is completed, the corresponding transmission parameters can be stored in the pallet information library, including station parameters and AWC sensor parameters. , and thus, an information file of the currently transported pallet 500 is formed in the pallet information library, so as to be invoked when the pallet 500 of this specification is subsequently transported.
基于上述设置,将托盘500的特征信息存储至托盘信息库中,也即,在托盘信息库中建立托盘500的信息档案,如此,在后续需要传输该种规格的托盘500时,可以直接从托盘信息库中调用,从而无需开腔进行各工位校准和AWC标定,进而提高了托盘500的传输效率。Based on the above settings, the feature information of the pallet 500 is stored in the pallet information database, that is, the information file of the pallet 500 is established in the pallet information database, so that when the pallet 500 of this specification needs to be transmitted in the future, it can be directly obtained from the pallet. Invoking from the information library, there is no need to open a cavity for each station calibration and AWC calibration, thereby improving the transmission efficiency of the pallet 500 .
可选地,传输参数可以包括托盘500的尺寸和该尺寸的托盘500对应的工位参数,基于此,在传输某种尺寸的托盘500时,可以从托盘信息库中调用与该尺寸的托盘500相对应的工位参数,从而可以按照该工位参数将托盘500传输至对应的工位。Optionally, the transmission parameters may include the size of the pallet 500 and the station parameters corresponding to the pallet 500 of this size. Based on this, when a pallet 500 of a certain size is transmitted, the pallet 500 with the size can be called from the pallet information library. Corresponding station parameters, so that the tray 500 can be transferred to the corresponding station according to the station parameters.
其中,工位参数可以包括工位伸缩值、工位旋转值、工位高位值和工位低位值,根据这些参数值可以确定托盘500的具体传输位置,从而可以保证托盘500的传输精度。Wherein, the station parameters may include station stretching value, station rotation value, station high position value and station low position value, according to these parameter values, the specific transmission position of the pallet 500 can be determined, thereby ensuring the transmission accuracy of the pallet 500 .
此处需要说明的是,上述工位伸缩值、工位旋转值、工位高位值和工位低位值均可以理解为与托盘500的传输工位相关的参数,基于这些参数值可以确定托盘500的传输方式。It should be noted here that the above-mentioned station expansion and contraction value, station rotation value, station high position value and station low position value can all be understood as parameters related to the transmission station of the pallet 500, based on these parameter values, the pallet 500 can be determined the transmission method.
可选地,传输腔室200与工艺腔室300的交接处设有两个晶圆自动对心的AWC(Active Wafer Centering,晶圆自动定心)传感器,即,第一AWC传感器810和第二AWC传感器820,两个AWC传感器的连线与托盘500的传输路径垂直,且两个AWC传感器各自距离垂足的距离不等。容易理解,将托盘500的传输路径视为一条直线,该直线位于两个AWC传感器之间,且与两个AWC传感器的连线相互垂直,两个AWC传感器的连线包括第一线 段和第二线段,其中,第一线段为其中一个AWC传感器与该直线相交的垂线,第二线段为另一个AWC传感器与该直线相交的垂线,两个垂线与该直线的交点即为垂足。并且,第一线段与第二线段的长度不等,即,两个AWC传感器各自距离垂足的距离不等。Optionally, two wafer automatic centering AWC (Active Wafer Centering, wafer automatic centering) sensors are provided at the junction of the transfer chamber 200 and the process chamber 300, that is, the first AWC sensor 810 and the second AWC sensor 810. For the AWC sensor 820 , the connection line of the two AWC sensors is perpendicular to the conveying path of the tray 500 , and the distances between the two AWC sensors and the vertical feet are different. It is easy to understand that the transmission path of the tray 500 is regarded as a straight line, which is located between two AWC sensors and is perpendicular to the connection line of the two AWC sensors. The connection line of the two AWC sensors includes the first line segment and the second line segment. Two line segments, where the first line segment is the vertical line where one AWC sensor intersects the line, the second line segment is the vertical line where the other AWC sensor intersects the line, and the intersection point of the two perpendicular lines and the line is the vertical line. foot. Moreover, the lengths of the first line segment and the second line segment are not equal, that is, the distances between the two AWC sensors and the vertical feet are not equal.
可选地,传输参数还包括:该尺寸的托盘500对应的AWC传感器参数,其中,AWC传感器参数包括:第一AWC传感器810前端触发延迟时间、第一AWC传感器810后端触发延时时间、第二AWC传感器820前端触发延迟时间和第二AWC传感器820后端触发延迟时间。Optionally, the transmission parameters also include: AWC sensor parameters corresponding to the pallet 500 of this size, wherein the AWC sensor parameters include: the front-end trigger delay time of the first AWC sensor 810, the rear-end trigger delay time of the first AWC sensor 810, the second The front-end trigger delay time of the second AWC sensor 820 and the rear-end trigger delay time of the second AWC sensor 820 .
基于上述设置,在传输装置600传输托盘500的过程中,会经过每个AWC传感器两次,总共四次,通过四次经过AWC传感器时传输装置600的位置可以计算出当前传输托盘500的圆心,从而实现传输装置600的AWC标定。基于此,可以按照上述传输装置600的AWC标定方法对工艺腔室300中的传输工位进行示教,确定传输装置600的示教中心。实际运动过程中,在传输装置600携带托盘500经过AWC传感器时的实际中心与示教中心存在偏差的情况下,当传输装置600运动到工艺腔室300时,传输装置600可以根据偏差进行补偿,以确保托盘500在工艺腔室300中位置的一致性。Based on the above settings, in the process of transporting the tray 500 by the transport device 600, each AWC sensor will pass through twice, a total of four times, and the position of the transport device 600 when passing the AWC sensor four times can calculate the center of the current transport tray 500, In this way, the AWC calibration of the transmission device 600 is realized. Based on this, the transfer station in the process chamber 300 can be taught according to the above-mentioned AWC calibration method of the transfer device 600 , and the teaching center of the transfer device 600 can be determined. During the actual movement, when there is a deviation between the actual center and the teaching center when the transfer device 600 carries the tray 500 through the AWC sensor, when the transfer device 600 moves to the process chamber 300, the transfer device 600 can compensate according to the deviation, To ensure the consistency of the position of the tray 500 in the process chamber 300 .
本申请实施例中,托盘500的传输参数可以包括托盘编号、托盘尺寸、对应的工位参数和对应的AWC传感器参数,具体详见下表。In the embodiment of the present application, the transmission parameters of the pallet 500 may include the pallet number, pallet size, corresponding station parameters and corresponding AWC sensor parameters, see the following table for details.
Figure PCTCN2022126076-appb-000001
Figure PCTCN2022126076-appb-000001
Figure PCTCN2022126076-appb-000002
Figure PCTCN2022126076-appb-000002
可选地,图像识别装置700可以是条形码识别传感器,相应地,特征图像可以是条形码510。如此,在传输装置600携带托盘500由装载腔室100向传输腔室200移动时,条形码识别传感器可以对托盘500上的条形码510进行识别,从而确定托盘500的特征信息。当然,图像识别装置700还可以采用其他构件,对应的特征图像也可以采用其他形式,本申请实施例中对于图像识别装置700以及特征图像的具体形式不作具体限定。Optionally, the image recognition device 700 may be a barcode recognition sensor, and correspondingly, the characteristic image may be the barcode 510 . In this way, when the transfer device 600 carries the tray 500 and moves from the loading chamber 100 to the transfer chamber 200 , the barcode recognition sensor can recognize the barcode 510 on the tray 500 to determine the characteristic information of the tray 500 . Of course, the image recognition device 700 can also use other components, and the corresponding feature images can also take other forms, and the specific forms of the image recognition device 700 and feature images are not specifically limited in this embodiment of the application.
为了能够调用不同规格的托盘500的特征信息以及对应的传输参数,并将传输参数应用至传输装置600,使传输装置600能够精准、快捷地传输托盘500,本申请实施例中,在托盘信息库中存储多种不同规格的托盘500的特征信息以及对应的传输参数。In order to be able to call the characteristic information of pallets 500 of different specifications and the corresponding transmission parameters, and apply the transmission parameters to the transmission device 600, so that the transmission device 600 can accurately and quickly transmit the pallet 500, in the embodiment of the present application, in the pallet information database The feature information and corresponding transmission parameters of pallets 500 of various specifications are stored in the storage.
例如,某种规格的托盘500,其具有对应的托盘500尺寸和对应的传输参数。当需要传输该种型号的托盘500时,可以从托盘信息库中直接调用托盘500的特征信息以及与该特征信息对应的传输参数,其中包括托盘500的尺寸、与该尺寸对应的工位参数,以及与该尺寸对应的AWC传感器参数,从而控制传输装置600根据上述各种传输参数传输托盘500,无需重新输入传输参数,提高了传输效率,保证了传输精度。For example, a pallet 500 of a certain specification has a corresponding size of the pallet 500 and a corresponding transmission parameter. When it is necessary to transmit the pallet 500 of this type, the characteristic information of the pallet 500 and the transmission parameters corresponding to the characteristic information can be directly called from the pallet information library, including the size of the pallet 500 and the station parameters corresponding to the size, And the AWC sensor parameters corresponding to the size, so as to control the transfer device 600 to transfer the tray 500 according to the above-mentioned various transfer parameters, without re-inputting the transfer parameters, improving the transfer efficiency and ensuring the transfer accuracy.
本申请实施例还公开了一种托盘500,该托盘500应用于上述半导体工艺设备中,其中,托盘500的顶面上设置特征图像,该特征图像可以被图像识别装置700识别,且特征图像包括托盘500的特征信息。The embodiment of the present application also discloses a tray 500, which is applied to the above-mentioned semiconductor process equipment, wherein a characteristic image is set on the top surface of the tray 500, the characteristic image can be recognized by the image recognition device 700, and the characteristic image includes Characteristic information of the tray 500 .
可选地,特征图像可以是条形码510,相应地,图像识别装置700可以 采用条形码识别传感器。不同规格的托盘500具有不同形式的条形码510,具体如图3所示。Optionally, the feature image may be a barcode 510, and accordingly, the image recognition device 700 may use a barcode recognition sensor. Pallets 500 of different specifications have barcodes 510 in different forms, as shown in FIG. 3 .
为了实现对托盘500的定位,一些实施例中,在托盘500上设置至少两个定位孔,至少两个定位孔用于一一对应地与设置于片盒400上的至少两个定位销410配合,限制托盘500在片盒400中的位置,使托盘500轮廓上沿托盘500传输方向距传输腔室200最远的点位于一预设位置处。In order to realize the positioning of the tray 500, in some embodiments, at least two positioning holes are provided on the tray 500, and the at least two positioning holes are used to cooperate with at least two positioning pins 410 provided on the cassette 400 one by one. , restricting the position of the tray 500 in the cassette 400 so that the point on the outline of the tray 500 along the transport direction of the tray 500 that is farthest from the transport chamber 200 is located at a preset position.
在放置托盘500时,将托盘500上的定位孔与片盒400上的定位销410对应配合,如此,通过片盒400可以对托盘500起到承载作用,通过定位销410与定位孔的配合可以实现对托盘500的精确定位,从而保证托盘500在片盒400上的位置精度,进而保证托盘500在装载腔室100中的初始位置的精度。When placing the tray 500, the positioning hole on the tray 500 is matched with the positioning pin 410 on the film box 400, so that the tray 500 can be loaded by the film box 400, and the cooperation of the positioning pin 410 and the positioning hole can Accurate positioning of the tray 500 is achieved, thereby ensuring the accuracy of the position of the tray 500 on the cassette 400 , thereby ensuring the accuracy of the initial position of the tray 500 in the loading chamber 100 .
可选地,托盘500上设置两个定位孔,相应地,片盒400上设置两个定位销410,且托盘500上的两个定位孔对称设置在传输方向的两侧,也即,两个定位孔的连线与传输方向垂直,如此,可以覆盖工艺要求的多种不同尺寸的托盘500。不同尺寸的托盘500上的两个定位孔的位置不同,两个定位孔的位置的设置方式需要满足使不同尺寸的托盘500有规律的放置,以便于传输装置600拾取,例如基于定位孔不同尺寸的托盘500放置在片盒400上后,不同尺寸的托盘500轮廓上沿托盘500传输方向距传输腔室200最远的点均位于一预设位置处,即不同尺寸的托盘500轮廓在这个预设位置处相切,这个预设位置可以根据片盒400的结构和尺寸灵活的设置。Optionally, two positioning holes are set on the tray 500, correspondingly, two positioning pins 410 are set on the cassette 400, and the two positioning holes on the tray 500 are symmetrically set on both sides of the transport direction, that is, two The connection line of the positioning holes is perpendicular to the conveying direction, so that the trays 500 of various sizes required by the process can be covered. The positions of the two positioning holes on the trays 500 of different sizes are different, and the setting method of the positions of the two positioning holes needs to satisfy the regular placement of the trays 500 of different sizes so that the transfer device 600 can pick them up, for example, based on the different sizes of the positioning holes After the trays 500 of different sizes are placed on the cassette 400, the points on the contours of the trays 500 of different sizes along the conveying direction of the trays 500 that are farthest from the transfer chamber 200 are located at a preset position, that is, the contours of the trays 500 of different sizes are located at a preset position. The preset position is tangent, and the preset position can be flexibly set according to the structure and size of the cassette 400 .
可选地,托盘500的厚度可以为4mm-6mm,且定位销410的高度设计为1.5mm,直径设计为4mm。相应地,托盘500上设置的定位孔的深度可以为2mm,直径为6mm,以保证定位销410能够穿入定位孔中。基于上述设置,通过至少两个定位孔一一对应地与至少两个定位销410的配合,可以确保托盘500放置在片盒400上位置的唯一性,以保证不同尺寸的托盘500在 装载腔室100中的位置精度。Optionally, the thickness of the tray 500 may be 4mm-6mm, and the height of the positioning pin 410 is designed to be 1.5mm, and the diameter is designed to be 4mm. Correspondingly, the positioning hole provided on the tray 500 may have a depth of 2mm and a diameter of 6mm, so as to ensure that the positioning pin 410 can penetrate into the positioning hole. Based on the above-mentioned settings, through the one-to-one matching of at least two positioning holes with at least two positioning pins 410, the uniqueness of the position where the tray 500 is placed on the cassette 400 can be ensured, so that trays 500 of different sizes can be placed in the loading chamber. Positional accuracy in 100's.
参考图2,本申请实施例还公开了一种片盒400,该片盒400用于承载托盘500。其中,片盒400包括多个承载位,每个承载位均包括相对设置的第一支撑块420和第二支撑块430,第一支撑块420和第二支撑块430上分别设有至少一个定位销410,用于一一对应地与托盘500上的至少两个定位孔配合,限制托盘500在片盒400中的位置,使托盘500轮廓上沿托盘500传输方向距传输腔室200最远的点位于一预设位置处。Referring to FIG. 2 , the embodiment of the present application also discloses a chip box 400 for carrying a tray 500 . Wherein, the chip box 400 includes a plurality of bearing positions, and each bearing position includes a first supporting block 420 and a second supporting block 430 which are arranged oppositely, and at least one positioning bracket is respectively arranged on the first supporting block 420 and the second supporting block 430. The pins 410 are used to cooperate with at least two positioning holes on the tray 500 one by one, to limit the position of the tray 500 in the cassette 400, so that the outline of the tray 500 is farthest from the transfer chamber 200 along the transfer direction of the tray 500 The point is located at a preset position.
可选地,片盒400可以包括顶板、底板、第一侧板和第二侧板,其中,顶板和底板平行设置,且两者之间形成一定间距,第一侧板和第二侧板均连接在顶板和底板之间,且第一侧板和第二侧板间隔设置。为了承载多个托盘500,在第一侧板的朝向第二侧板的侧面设有多个第一支撑块420,多个第一支撑块420沿垂直于顶板的方向间隔设置,如此,相邻两个第一支撑块420之间形成用于容纳托盘500局部的第一卡槽,同样地,相邻两个第二支撑块430之间形成用于容纳托盘500局部的第二卡槽,且多个第一卡槽与多个第二卡槽一一对应设置,从而,对应设置的第一卡槽和第二卡槽形成用于承载托盘500的承载位。Optionally, the chip box 400 may include a top board, a bottom board, a first side board and a second side board, wherein the top board and the bottom board are arranged in parallel with a certain distance between them, and the first side board and the second side board are both It is connected between the top board and the bottom board, and the first side board and the second side board are arranged at intervals. In order to carry multiple trays 500, a plurality of first support blocks 420 are provided on the side of the first side plate facing the second side plate, and the plurality of first support blocks 420 are arranged at intervals along the direction perpendicular to the top plate, so that adjacent A first slot for accommodating a part of the tray 500 is formed between two first support blocks 420 , similarly, a second slot for accommodating a part of the tray 500 is formed between two adjacent second support blocks 430 , and A plurality of first card slots is provided in one-to-one correspondence with a plurality of second card slots, so that the correspondingly arranged first card slots and second card slots form a bearing position for carrying the tray 500 .
此外,同一片盒400可以兼容多种不同尺寸的托盘500,在设计片盒400时,将片盒400的尺寸按照最大托盘500的尺寸设计。基于此,在将托盘500放置于片盒400后,将托盘500的边缘与片盒400一侧的边缘相抵,从而可以通过片盒400对不同尺寸的托盘500进行精确定位,以保证托盘500在装载腔室100中的位置精度。In addition, the same cassette 400 can be compatible with multiple pallets 500 of different sizes. When designing the cassette 400 , the size of the cassette 400 is designed according to the size of the largest pallet 500 . Based on this, after the tray 500 is placed in the film box 400, the edge of the tray 500 is pressed against the edge of one side of the film box 400, so that the trays 500 of different sizes can be accurately positioned by the film box 400 to ensure that the tray 500 Positional accuracy in the load chamber 100 .
为了实现对托盘500的定位,可以在片盒400和托盘500上分别设置定位结构。一些实施例中,在对应设置的第一支撑块420上设置至少一个定位销410,在第二支撑块430上设置至少一个定位销410,且在托盘500上设置至少两个定位孔。如此,在托盘500承载于片盒400时,定位孔与定位销410 一一对应配合,此时,可以对托盘500轮廓上沿传输方向距离传输腔室200最远的点的位置确定,从而可以对片盒400中的托盘500进行精确定位。In order to realize the positioning of the tray 500 , positioning structures may be provided on the cassette 400 and the tray 500 respectively. In some embodiments, at least one positioning pin 410 is provided on the corresponding first support block 420 , at least one positioning pin 410 is provided on the second support block 430 , and at least two positioning holes are provided on the tray 500 . In this way, when the tray 500 is loaded on the cassette 400, the positioning holes and the positioning pins 410 are in one-to-one correspondence. At this time, the position of the point on the outline of the tray 500 along the transport direction farthest from the transport chamber 200 can be determined, so that Precise positioning of the tray 500 in the cassette 400 is performed.
本申请实施例提供的半导体工艺设备中,托盘的传输方式如图4所示,具体包括:In the semiconductor process equipment provided in the embodiment of the present application, the transmission mode of the tray is shown in Figure 4, which specifically includes:
通过相互配合的定位销410和定位孔对承载于片盒400上的托盘500进行定位;传输装置600携带托盘500从装载腔室100向传输腔室200移动;在移动过程中,图像识别装置700识别托盘500上的图像特征,并根据图像特征确定托盘500的特征信息;控制器获取托盘500的特征信息后将该特征信息与托盘信息库中存有的特征信息进行比对,判断托盘信息库中是否存有与当前传输的托盘500的特征信息相同的特征信息;在托盘信息库中存有与当前传输的托盘500的特征信息相同的特征信息的情况下,判断当前传输的托盘500的特征信息与上一次传输的托盘500的特征信息是否一致;当当前传输的托盘500的特征信息与上一次传输的托盘500的特征信息一致时,直接采用当前的传输参数传输托盘500;当当前传输的托盘500的特征信息与上一次传输的托盘500的特征信息不一致时,再从托盘信息库中查找与当前传输的托盘500的特征信息相对应的传输参数,并控制传输装置600根据该传输参数传输托盘500;在托盘信息库中不存在当前传输的托盘500的特征信息的情况下,在托盘信息库中建立当前托盘500的信息档案,以便于调用该规格的托盘500的特征信息和传输参数。The tray 500 carried on the film box 400 is positioned by the positioning pin 410 and the positioning hole that cooperate with each other; the transfer device 600 carries the tray 500 to move from the loading chamber 100 to the transfer chamber 200; during the movement, the image recognition device 700 Recognize the image features on the tray 500, and determine the feature information of the tray 500 according to the image features; after the controller obtains the feature information of the tray 500, compares the feature information with the feature information stored in the tray information database, and judges the pallet information database. Whether there is the same feature information as the feature information of the currently transported tray 500 in the pallet information library; if there is the same feature information as the currently transported tray 500 in the tray information library, determine the feature of the currently transported tray 500 Whether the information is consistent with the characteristic information of the pallet 500 transmitted last time; when the characteristic information of the pallet 500 transmitted currently is consistent with the characteristic information of the pallet 500 transmitted last time, the current transmission parameters are directly used to transmit the pallet 500; when the currently transmitted When the characteristic information of the pallet 500 is inconsistent with the characteristic information of the last transmitted pallet 500, the transmission parameter corresponding to the characteristic information of the currently transmitted pallet 500 is searched from the pallet information database, and the transmission device 600 is controlled to transmit according to the transmission parameter. Pallet 500: In the case that there is no characteristic information of the currently transmitted pallet 500 in the pallet information database, an information file of the current pallet 500 is established in the pallet information database, so as to call the characteristic information and transmission parameters of the pallet 500 of this specification.
综上所述,本申请实施例中,实现了不同规格的托盘500的精确定位,并实现了托盘500的自动识别,在切换不同规格的托盘500时,自动调用传输装置600的特征信息和对应的传输参数,并根据对应的传输参数传输托盘500,以确保不同规格的托盘500的精确、高效传输。In summary, in the embodiment of the present application, the precise positioning of trays 500 of different specifications is realized, and the automatic identification of trays 500 is realized. When switching trays 500 of different specifications, the characteristic information and corresponding information of the transmission device 600 are automatically called transfer parameters, and transfer the pallet 500 according to the corresponding transfer parameter, so as to ensure the accurate and efficient transfer of the pallet 500 of different specifications.
上面结合附图对本申请的实施例进行了描述,但是本申请并不局限于上述的具体实施方式,上述的具体实施方式仅仅是示意性的,而不是限制性的, 本领域的普通技术人员在本申请的启示下,在不脱离本申请宗旨和权利要求所保护的范围情况下,还可做出很多形式,均属于本申请的保护之内。The embodiments of the present application have been described above in conjunction with the accompanying drawings, but the present application is not limited to the above-mentioned specific embodiments, which are only illustrative and not restrictive. Those of ordinary skill in the art will Under the inspiration of this application, without departing from the purpose of this application and the scope of protection of the claims, many forms can also be made, all of which belong to the protection of this application.

Claims (10)

  1. 一种半导体工艺设备,包括工艺腔室、传输腔室和装载腔室,所述工艺腔室用于执行半导体工艺,所述装载腔室用于容置片盒,所述片盒用于承载托盘,所述传输腔室中设置有传输装置,所述传输装置用于在所述工艺腔室和所述装载腔室之间传输所述托盘,其特征在于,A semiconductor process equipment comprising a process chamber for performing a semiconductor process, a transfer chamber and a loading chamber for accommodating wafer cassettes for carrying trays , the transfer chamber is provided with a transfer device, the transfer device is used to transfer the tray between the process chamber and the loading chamber, characterized in that,
    所述装载腔室和所述传输腔室的交接处设置有图像识别装置,所述图像识别装置用于在所述传输装置携带所述托盘由所述装载腔室向所述传输腔室移动的过程中,识别所述托盘上的预设的特征图像,确定所述托盘的特征信息;An image recognition device is provided at the junction of the loading chamber and the transfer chamber, and the image recognition device is used for carrying the tray on the transfer device and moving from the loading chamber to the transfer chamber During the process, the preset characteristic image on the pallet is identified, and the characteristic information of the pallet is determined;
    所述半导体工艺设备还包括控制器,所述控制器用于获取所述特征信息,从预设的托盘信息库中查找与所述特征信息对应的传输参数,控制所述传输装置根据所述传输参数传输所述托盘。The semiconductor process equipment further includes a controller, the controller is used to obtain the characteristic information, search for the transmission parameters corresponding to the characteristic information from the preset pallet information library, and control the transmission device according to the transmission parameters Transport the pallet.
  2. 根据权利要求1所述的半导体工艺设备,其特征在于,所述控制器还用于获取所述特征信息,与所述托盘信息库中的预存的特征信息比对,判断所述托盘信息库中是否存有与获取的所述特征信息相同的特征信息;在所述托盘信息库中存有与获取的所述特征信息相同的特征信息的情况下,判断所述特征信息与上一次传输的托盘的特征信息是否一致;当所述特征信息与上一次传输的托盘的特征信息一致时,直接采用当前的传输参数传输所述托盘;当所述特征信息与上一次传输的托盘的特征信息不一致时,再从所述托盘信息库中查找与所述特征信息对应的传输参数,控制所述传输装置根据所述传输参数传输所述托盘。The semiconductor process equipment according to claim 1, wherein the controller is further configured to obtain the feature information, compare it with the pre-stored feature information in the tray information library, and determine whether the information in the tray information library is Whether there is the same feature information as the acquired feature information; if there is the same feature information as the acquired feature information in the pallet information library, it is judged that the feature information is the same as the last transmitted pallet Whether the characteristic information of the pallet is consistent; when the characteristic information is consistent with the characteristic information of the last transmitted pallet, directly use the current transmission parameters to transmit the pallet; when the characteristic information is inconsistent with the characteristic information of the last transmitted pallet , and then look up the transmission parameters corresponding to the characteristic information from the pallet information database, and control the transmission device to transmit the pallet according to the transmission parameters.
  3. 根据权利要求1或2所述的半导体工艺设备,其特征在于,所述传输参数包括:所述托盘的尺寸和该尺寸的所述托盘对应的工位参数,所述工位参数包括工位伸缩值、工位旋转值、工位高位值和工位低位值。The semiconductor process equipment according to claim 1 or 2, wherein the transmission parameters include: the size of the tray and the station parameters corresponding to the tray of this size, and the station parameters include station expansion and contraction value, station rotation value, station high value, and station low value.
  4. 根据权利要求3所述的半导体工艺设备,其特征在于,所述传输腔室与所述工艺腔室的交接处设有两个晶圆自动对心的AWC传感器,两个所述AWC传感器的连线与所述托盘的传输路径垂直,且两个所述AWC传感器各自距离垂足的距离不等。The semiconductor process equipment according to claim 3, wherein two AWC sensors for automatic wafer centering are provided at the junction of the transfer chamber and the process chamber, and the connection of the two AWC sensors is The line is perpendicular to the transport path of the pallet, and the two AWC sensors are at different distances from the vertical feet.
  5. 根据权利要求4所述的半导体工艺设备,其特征在于,所述传输参数还包括:该尺寸的所述托盘对应的AWC传感器参数,所述AWC传感器参数包括第一AWC传感器前端触发延迟时间、第一AWC传感器后端触发延迟时间、第二AWC传感器前端触发延迟时间和第二AWC传感器后端触发延迟时间。The semiconductor process equipment according to claim 4, wherein the transmission parameters further include: AWC sensor parameters corresponding to the tray of the size, the AWC sensor parameters include the trigger delay time of the front end of the first AWC sensor, the second A rear-end trigger delay time of an AWC sensor, a second AWC sensor front-end trigger delay time, and a second AWC sensor rear-end trigger delay time.
  6. 根据权利要求1所述的半导体工艺设备,其特征在于,所述图像识别装置为条形码识别传感器,所述特征图像为条形码。The semiconductor process equipment according to claim 1, wherein the image recognition device is a barcode recognition sensor, and the characteristic image is a barcode.
  7. 一种托盘,用于权利要求1-6任一项所述的半导体工艺设备中,其特征在于,所述托盘的顶面上设置有特征图像,所述特征图像可被图像识别装置识别,所述特征图像包括所述托盘的特征信息。A tray used in the semiconductor process equipment according to any one of claims 1-6, characterized in that a characteristic image is provided on the top surface of the tray, and the characteristic image can be recognized by an image recognition device, so The feature image includes feature information of the tray.
  8. 根据权利要求7所述的托盘,其特征在于,所述特征图像为条形码。The tray according to claim 7, wherein the characteristic image is a barcode.
  9. 根据权利要求7所述的托盘,其特征在于,所述托盘上还设置有至少两个定位孔,至少两个所述定位孔用于一一对应地与设置于片盒上的至少两个定位销配合,限制所述托盘在所述片盒中的位置,使所述托盘轮廓上沿所述托盘传输方向距所述传输腔室最远的点位于一预设位置处。The tray according to claim 7, wherein at least two positioning holes are provided on the tray, and at least two positioning holes are used for one-to-one correspondence with at least two positioning holes provided on the cassette. The pin cooperates to limit the position of the tray in the cassette so that the point on the outline of the tray that is farthest from the transfer chamber along the tray transfer direction is at a predetermined position.
  10. 一种片盒,用于承载如权利要求7-9任一项所述的托盘,其特征在 于,所述片盒包括多个承载位,每个所述承载位均包括相对设置的第一支撑块和第二支撑块,所述第一支撑块和所述第二支撑块上分别设有至少一个定位销,用于一一对应地与所述托盘上的至少两个定位孔配合,限制所述托盘在所述片盒中的位置,使所述托盘轮廓上沿所述托盘传输方向距所述传输腔室最远的点位于一预设位置处。A film box for carrying the tray according to any one of claims 7-9, characterized in that the film box includes a plurality of bearing positions, and each of the bearing positions includes a first supporting position oppositely arranged block and a second support block, the first support block and the second support block are respectively provided with at least one positioning pin, which is used to match with at least two positioning holes on the tray one by one, so as to limit the The position of the tray in the cassette is such that the point on the contour of the tray that is farthest from the transfer chamber along the transfer direction of the tray is located at a predetermined position.
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