WO2023063301A1 - Method for producing fluorinated aromatic compound - Google Patents

Method for producing fluorinated aromatic compound Download PDF

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WO2023063301A1
WO2023063301A1 PCT/JP2022/037838 JP2022037838W WO2023063301A1 WO 2023063301 A1 WO2023063301 A1 WO 2023063301A1 JP 2022037838 W JP2022037838 W JP 2022037838W WO 2023063301 A1 WO2023063301 A1 WO 2023063301A1
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general formula
group
compound represented
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integer
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PCT/JP2022/037838
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French (fr)
Japanese (ja)
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友亮 江藤
新吾 中村
隆行 松永
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ダイキン工業株式会社
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00Preparation of halogenated hydrocarbons
    • C07C17/093Preparation of halogenated hydrocarbons by replacement by halogens
    • C07C17/20Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms
    • C07C17/21Preparation of halogenated hydrocarbons by replacement by halogens of halogen atoms by other halogen atoms with simultaneous increase of the number of halogen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/02Monocyclic aromatic halogenated hydrocarbons
    • C07C25/13Monocyclic aromatic halogenated hydrocarbons containing fluorine
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09K3/00Materials not provided for elsewhere
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Definitions

  • the present disclosure relates to a method for producing a fluorine-containing aromatic compound.
  • a fluorine-containing aromatic compound typified by perfluorotoluene, which is expected as a next-generation etching gas
  • a fluorine-containing aromatic compound typified by perfluorotoluene
  • perfluorotoluene which is expected as a next-generation etching gas
  • 1 to 5% by mass of tetrakis(diethylamino)phosphonium salt is used as a catalyst. It is known to carry out the fluorination of halogenated aromatic compounds with ⁇ 1.4 equivalents of an alkali metal or alkaline earth metal fluoride (see US Pat.
  • An object of the present disclosure is to provide a novel method capable of efficiently producing a fluorine-containing aromatic compound.
  • the present disclosure includes the following configurations.
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 1-6.
  • n1 represents an integer of 1-6. However, when n ⁇ n1 and n is an integer of 2-6, n1 represents an integer of 2-6.
  • R 1 , X 1 and n are the same as above.
  • a compound represented by A production method comprising a step of reacting with a metal fluoride and fluorinating two or more X 1 when n is an integer of 2 or more to produce a compound represented by the general formula (1). .
  • Section 2. The production method according to Item 1, wherein the fluorination is performed in a system having a water content of 700 ppm by mass or less.
  • Section 3 The production method according to claim 1 or 2, wherein said n is an integer of 3-6.
  • Item 4. The production method according to any one of Items 1 to 3, wherein the metal fluoride is an alkali metal or alkaline earth metal fluoride.
  • a composition comprising difluorobenzotrifluoride and at least one halogenated fluorobenzotrifluoride selected from the group consisting of chlorofluorobenzotrifluoride, bromofluorobenzotrifluoride and iodofluorobenzotrifluoride.
  • the content of the difluorobenzotrifluoride is 60.0 to 99.9 mol% and the content of the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol% based on the total amount of the composition being 100 mol%. 6.
  • Item 7. The composition according to Item 5 or 6, which is used as a solvent for organic synthesis, an agricultural chemical intermediate, or a pharmaceutical intermediate.
  • Item 9 The content of the pentafluorobenzotrifluoride is 60.0 to 99.9 mol% and the content of the halogenated fluorobenzotrifluoride is 0.1 to 40.9 mol% based on the total amount of the composition being 100 mol%.
  • Item 9 The composition according to Item 8, which is 0 mol%.
  • Item 10 The composition according to item 8 or 9, which is used as an etching gas or a cleaning gas.
  • selectivity means the ratio (mol%) of the total molar amount of the target compound contained in the outflow gas to the total molar amount of compounds other than the raw material compounds in the outflow gas from the reactor outlet. do.
  • the conversion rate refers to the ratio (mol%) of the total molar amount of compounds other than the raw material compound contained in the outflow gas from the reactor outlet to the molar amount of the raw material compound supplied to the reactor. means.
  • yield means the ratio (mol%) of the total molar amount of the target compound contained in the outflow gas from the reactor outlet to the molar amount of the raw material compound supplied to the reactor.
  • Patent Document 1 using 1 to 5% by mass of tetrakis(diethylamino)phosphonium salt as a catalyst, 1.2 to 1.4 equivalents of alkali metal or alkaline earth metal fluoride (especially potassium fluoride) , describes the fluorination of halogenated aromatic compounds. There is a need for new methods by which aromatic compounds can be produced.
  • a manufacturing method according to a first aspect of the present disclosure includes: General formula (1):
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 1-6.
  • n1 represents an integer of 1-6. However, when n ⁇ n1 and n is an integer of 2-6, n1 represents an integer of 2-6.
  • R 1 , X 1 and n are the same as above.
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 1-6.
  • the hydrocarbon group represented by R 1 is not particularly limited, and examples thereof include an alkyl group, an aryl group and the like, and groups formed by any combination thereof (eg, an aralkyl group, an alkylaryl group, alkylaralkyl group) and the like.
  • the alkyl group as the hydrocarbon group represented by R 1 may be linear, branched or cyclic (preferably linear or branched, more preferably linear ) are included.
  • the number of carbon atoms in the alkyl group is not particularly limited, and the conversion rate of the reaction, the selectivity of the compound represented by general formula (1), the general formula (1) From the viewpoint of the yield of the represented compound, for example, 1 to 20 is preferable, 3 to 15 is more preferable, and 5 to 10 is even more preferable.
  • the number of carbon atoms in the alkyl group is not particularly limited, and the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1) etc., for example, 3 to 8 are preferable, and 4 to 7 are more preferable.
  • alkyl group examples include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group and neopentyl group. , n-hexyl group, 3-methylpentyl group, n-heptyl group, n-octyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and the like.
  • the aryl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1) From the viewpoint of yield and the like of the compound represented by, those having 6 to 20 carbon atoms are preferable, those having 6 to 12 carbon atoms are more preferable, and those having 6 to 10 carbon atoms are even more preferable.
  • the aryl group can be either monocyclic or polycyclic (eg, bicyclic, tricyclic, etc.), but is preferably monocyclic.
  • aryl group examples include phenyl, naphthyl, biphenyl, pentalenyl, indenyl, anthranyl, tetracenyl, pentacenyl, pyrenyl, perylenyl, fluorenyl, and phenanthryl groups. be done.
  • the aralkyl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the From the viewpoint of the yield of the compound represented by, for example, hydrogen atoms (eg, 1 to 3, preferably 1 and an aralkyl group in which one hydrogen atom) is substituted by the above aryl group.
  • hydrogen atoms eg, 1 to 3, preferably 1 and an aralkyl group in which one hydrogen atom
  • aralkyl group examples include a benzyl group and a phenethyl group.
  • the alkylaryl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1 ), for example, the hydrogen atoms (for example, 1 to 3, preferably 1 hydrogen atom) of the aryl group are linear or branched and have 1 to 6 carbon atoms. (preferably 1 to 2) alkylaryl groups substituted with alkyl groups, and the like.
  • alkylaryl group examples include a tolyl group and a xylyl group.
  • the alkylaralkyl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1 ), for example, hydrogen atoms on the aromatic ring of the aralkyl group (eg, 1 to 3, preferably 1 hydrogen atom) are linear or branched carbon Examples thereof include alkylaralkyl groups substituted with alkyl groups of number 1 to 6 (preferably 1 to 2).
  • examples of the substituent of the hydrocarbon group represented by R 1 include an alkoxy group and a halogen atom.
  • the number of substituents is not particularly limited, and is preferably 0 to 6, more preferably 0 to 3, even more preferably 0 to 1.
  • the alkoxy group as a substituent of the hydrocarbon group is not particularly limited, and may be linear or branched optionally substituted with a halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.) or the like.
  • a (preferably linear) alkoxy group having 1 to 8, preferably 1 to 5, more preferably 1 to 3 carbon atoms can be mentioned.
  • the number of substituents is not particularly limited, and is preferably 0 to 6, more preferably 0 to 3, even more preferably 0 to 1.
  • optionally substituted alkoxy groups include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy, per A fluoromethoxy group, a perfluoroethoxy group, and the like can be mentioned.
  • the halogen atom as a substituent of the above hydrocarbon group is not particularly limited, and examples thereof include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • the perfluoroalkyl group represented by R 1 means an alkyl group in which all hydrogen atoms are substituted with fluorine atoms.
  • Any of linear, branched and cyclic perfluoroalkyl groups can be adopted. Among them, a straight-chain perfluoroalkyl group is preferable from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), and the like.
  • the number of carbon atoms in the perfluoroalkyl group is not particularly limited, but it is 1 to 5 are preferred, 1 to 4 are more preferred, and 1 to 3 are even more preferred from the viewpoint of ratio and the like.
  • perfluoroalkyl groups include a trifluoromethyl group, a pentafluoroethyl group, a heptafluoropropyl group, and the like.
  • the halogen atom other than the fluorine atom represented by X 1 is not particularly limited, and includes a chlorine atom, a bromine atom, an iodine atom and the like.
  • the substitution number n of X 1 is not particularly limited, the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the compound represented by the general formula (1) 1 to 6 is preferable, and 2 to 6, 3 to 6, 4 to 6, 5 to 6, etc. can also be used.
  • R 1 and X 1 are the same as above.
  • n represents an integer of 3-6.
  • It is a compound represented by
  • a known or commercially available product can be used as the compound represented by the above general formula (2).
  • the compounds represented by the general formula (2) can be used alone, or two or more of them can be used in combination.
  • X 1 which are halogen atoms other than fluorine
  • n in the general formula (2) is an integer of 2 or more
  • two or more (especially all) of them are fluorinated compounds are selectively synthesized.
  • R 1 remains unreacted even after fluorination with a metal fluoride in the presence of a specific phosphonium salt.
  • the reaction of the first aspect of the present disclosure is either a batch type in which the raw materials are charged into the reactor at once, or a flow type in which the product is withdrawn from the reactor while continuously supplying the raw materials into the reactor. method can also be adopted. Since the reaction of the present disclosure is not a very fast reaction, it is preferred to adopt a batch mode.
  • the phosphonium salt used in the production method of the first aspect of the present disclosure is a phosphonium salt having one or more alkyl groups.
  • This phosphonium salt has, for example, general formula (3):
  • R 3 , R 4 , R 5 and R 6 are the same or different and represent a hydrocarbon group. However, at least one of R 3 , R 4 , R 5 and R 6 is an alkyl group. Y represents a counter anion. ] Phosphonium salts represented by
  • R 3 , R 4 , R 5 and R 6 include those mentioned above. The same applies to the type and number of substituents.
  • R 3 , R 4 , R 5 and R 6 are preferably sites where carbon atoms are bonded to the central phosphorus atom.
  • the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., R 3 , R 4 , R 5 and R 6 at least one (1, 2, 3 or 4) of is an alkyl group.
  • R 3 , R 4 , R 5 and R 6 are alkyl groups is preferred.
  • at least one (1, 2, 3 or 4) of R 3 , R 4 , R 5 and R 6 has 1 to 20 carbon atoms, preferably 3 to 15 carbon atoms, more preferably 4 to 12, more preferably 5 to 10 alkyl groups are preferred.
  • the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc. are particularly improved, It is also possible to particularly reduce the amount of impurities produced.
  • the counter anion represented by Y is not particularly limited, and various anions can be employed. ⁇ ), bromide ion (Br ⁇ ), iodide ion (I ⁇ ), etc.), tetrafluoroborate ion (BF 4 ⁇ ), hydrogen sulfate ion (HSO 4 ⁇ ), acetate ion (CH 3 COO ⁇ ), hexa Fluorophosphate ion (PF 6 ⁇ ) and the like are included.
  • phosphonium salts known or commercially available products can be used. Moreover, the above phosphonium salts can be used alone, or two or more of them can be used in combination.
  • the amount of the phosphonium salt used is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by general formula (1), the general formula (1) From the viewpoint of the yield of the compound represented by the general formula (2), relative to 1 mol of the compound represented by the general formula (2), preferably 0.01 to 10 mol, more preferably 0.1 to 5 mol, 1 to 2.5 mol is more preferred.
  • the metal fluoride is not particularly limited as long as it can fluorinate halogen atoms other than fluorine in the compound represented by the general formula (2). From the viewpoint of the selectivity of the compound represented by (1), the yield of the compound represented by the general formula (1), etc., alkali metal or alkaline earth metal fluorides are preferable, and alkali metal fluorides are more preferable. Therefore, examples of metals constituting metal fluorides include alkali metals such as lithium, sodium, potassium and cesium; alkaline earth metals such as magnesium, calcium and barium. These metals can be used alone or in combination of two or more.
  • metal fluorides that meet these conditions include alkali metal fluorides such as lithium fluoride, sodium fluoride, potassium fluoride, and cesium fluoride; magnesium fluoride, calcium fluoride, and barium fluoride. and alkaline earth metal fluorides such as Among them, lithium fluoride, sodium fluoride, fluoride Alkali metal fluorides such as potassium and cesium fluoride are preferred, and potassium fluoride is more preferred.
  • metal fluorides known or commercially available products can be used. Moreover, said metal fluoride can also be used individually and can also be used in combination of 2 or more types.
  • the amount of metal fluoride used is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by general formula (1), the general formula (1 ), relative to 1 mol of the compound represented by the general formula (2), is preferably 0.01 to 30 mol, more preferably 0.1 to 20 mol, 1 ⁇ 15 moles is more preferred.
  • the total amount within the above range.
  • solvent used in the production method in the production method of the first aspect of the present disclosure is particularly capable of dissolving the compound represented by the general formula (2), phosphonium salt, metal fluoride, etc., and , the conversion of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., a solvent containing a nitrogen-containing organic compound, preferably nitrogen Use containing polar solvents.
  • solvents examples include amide compounds (N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,4,5,6-tetrahydropyrimidinone, hexamethylphosphoric triamide, etc.), amine compounds (triethylamine, 1-methylpyrrolidine, etc.), pyridine compounds (pyridine, methylpyridine, etc.), quinoline compounds (quinoline, methylquinoline, etc.), and the like.
  • amide compounds N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,
  • amide compounds, pyridine compounds and the like are preferable from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), and the like.
  • N,N-dimethylformamide, N,N-diethylformamide, N,N-diisopropylformamide, N-methyl-2 -pyrrolidone, pyridine and the like are more preferred, and N,N-dimethylformamide, N-methyl-2-pyrrolidone, pyridine and the like are particularly preferred
  • solvents known or commercially available products can be used. Moreover, these solvents can be used alone or in combination of two or more.
  • the amount of solvent used is not particularly limited as long as it is the amount of solvent, and it can be an excess amount. From the viewpoint of the yield of the compound represented by the general formula (2), it is preferably 80 to 10000 parts by mass, more preferably 100 to 1000 parts by mass, and 150 to 800 parts by mass. is more preferred.
  • reaction temperature can be a mild condition, the conversion rate of the reaction, the yield of the compound represented by the general formula (1), From the viewpoints of easy improvement of selectivity and the like and easy reduction of by-products, the temperature is generally preferably 0 to 400°C, more preferably 25 to 300°C, and even more preferably 50 to 200°C.
  • reaction time of the reaction of the first aspect of the present disclosure (maintenance time at the highest temperature) can be set to the extent that the reaction progresses sufficiently, and the conversion rate of the reaction, the general formula (1 ), the yield of the compound represented by general formula (1), etc., the time is preferably 1 minute to 48 hours, more preferably 5 minutes to 24 hours.
  • reaction pressure of the reaction of the first aspect of the present disclosure is the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the compound represented by the general formula (1) -2 to 2 MPa, more preferably -1 to 1 MPa, and even more preferably -0.5 to 0.5 MPa from the viewpoint of the yield of .
  • pressure is assumed to be gauge pressure unless otherwise specified.
  • the reactor for reacting the compound represented by the general formula (2) with the metal fluoride has the shape and structure as long as it can withstand the above temperature and pressure. It is not particularly limited. Examples of reactors include vertical reactors, horizontal reactors, multitubular reactors, and the like. Examples of materials for the reactor include glass, stainless steel, iron, nickel, and iron-nickel alloys.
  • Examples of the inert gas include nitrogen, helium, argon, and the like. Among these inert gases, nitrogen is preferable from the viewpoint of cost reduction.
  • the amount of water in the system depends on the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1). From the viewpoint of rate, etc., it is preferably 700 mass ppm or less, more preferably 0.1 to 650 mass ppm, still more preferably 1 to 600 mass ppm, and particularly preferably 10 to 500 mass ppm.
  • the amount of water in the system is contained in the reaction system, with the total amount of the reagents used in the reaction (the compound represented by the general formula (2), phosphonium salt, metal fluoride, solvent, etc.) being 100% by mass. means the total amount of water.
  • water can be added to the reaction system to adjust the amount of water in the system. In the present disclosure, the water content in the system is measured with a Karl Fischer moisture meter.
  • the compound represented by the general formula (1) can be obtained by performing a purification treatment according to a conventional method as necessary.
  • Target compound (general formula (1))
  • the target compound thus produced has the general formula (1):
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 1-6.
  • n1 represents an integer of 1-6. However, when n ⁇ n1 and n is an integer of 2-6, n1 represents an integer of 2-6.
  • R 1 , X 1 and n are as described above. However, since the number of X 1 in general formula (1) is nn1, n ⁇ n1 is necessarily satisfied. Also, when n is an integer of 2 or more, it is preferable that two or more X 1 are fluorinated.
  • the compound represented by general formula (1) which is the target compound produced in the present disclosure, is specifically
  • Part 2 Method for producing fluorine-containing aromatic compound
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 3-6.
  • n1 represents an integer of 2-6. However, n ⁇ n1.
  • R 1 , X 1 and n are the same as above.
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 3-6.
  • It is a compound represented by
  • the hydrocarbon group and perfluoroalkyl group represented by R 1 and the halogen atom other than the fluorine atom represented by X 1 include the above "(1-1) starting compound (general formula (2) )” can be adopted for the hydrocarbon group and perfluoroalkyl group represented by R 1 and the halogen atom other than the fluorine atom represented by X 1 .
  • Preferred types and specific examples are also the same.
  • n which is the number of substitutions of X 1 , is the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1A), the yield of the compound represented by the general formula (1A), etc. from the point of view, it is 3 to 6, and may be 4 to 6, 5 to 6, and the like.
  • the phosphonium salt can adopt the description of "(1-3) phosphonium salt" above. Preferred types and specific examples are also the same.
  • the metal fluoride can adopt the description of "(1-4) metal fluoride" above. Preferred types and specific examples are also the same.
  • the solvent can adopt the description of "(2-2) Solvent” above. Preferred types and specific examples are also the same.
  • reaction temperature can adopt the description of "(1-6) Reaction temperature” above.
  • a preferable range is also the same.
  • reaction time can adopt the description of "(1-7) reaction time” above.
  • a preferable range is also the same.
  • reaction pressure can adopt the description of "(1-8) Reaction pressure" above. Preferred types and specific examples are also the same.
  • examples of reactions can adopt the description of "(1-9) Examples of reactions" above. Preferred types and specific examples are also the same.
  • the solvent used in the production method in the second aspect of the present disclosure is not particularly limited, but in particular, the compound represented by the general formula (2A), phosphonium salt, metal fluoride, etc. are dissolved.
  • a polar organic solvent is preferable from the viewpoint of excellent conversion of the reaction, selectivity of the compound represented by the general formula (1A), yield of the compound represented by the general formula (1A), and the like.
  • solvents examples include amide compounds (N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,4,5,6-tetrahydropyrimidinone, hexamethylphosphoric triamide, etc.), amine compounds (triethylamine, 1-methylpyrrolidine, etc.), pyridine compounds (pyridine, methylpyridine, etc.), quinoline compounds (quinoline, methylquinoline, etc.), and the like.
  • amide compounds N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,
  • amide compounds, pyridine compounds and the like are preferable from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1A), the yield of the compound represented by the general formula (1A), and the like.
  • N,N-dimethylformamide, N,N-diethylformamide, N,N-diisopropylformamide, N-methyl-2 -pyrrolidone, pyridine and the like are more preferred
  • N,N-dimethylformamide, N-methyl-2-pyrrolidone, pyridine and the like are more preferred,
  • solvents known or commercially available products can be used. Moreover, these solvents can be used alone or in combination of two or more.
  • the amount of solvent used is not particularly limited as long as it is the amount of solvent, and can be an excess amount. From the viewpoint of the yield of the compound represented by the general formula (2A), it is preferably 80 to 10000 parts by mass, more preferably 100 to 1000 parts by mass, and 150 to 800 parts by mass. is more preferred.
  • Target compound (2-4)
  • the target compound thus produced has the general formula (1A):
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 3-6.
  • n1 represents an integer of 2-6. However, n ⁇ n1.
  • R 1 , X 1 and n1 are as described above. However, since the number of X 1 in general formula (1) is nn1, n ⁇ n1 is necessarily satisfied.
  • Part 3 Method for producing fluorine-containing aromatic compound (Part 3)
  • the production method according to the third aspect of the present disclosure comprises general formula (1):
  • R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group.
  • X 1 is the same or different and represents a halogen atom other than a fluorine atom.
  • n represents an integer of 1-6.
  • n1 represents an integer of 1-6. However, when n ⁇ n1 and n is an integer of 2-6, n1 represents an integer of 2-6.
  • R 1 , X 1 and n are the same as above.
  • the metal fluoride can adopt the description of "(1-4) metal fluoride" above. Preferred types and specific examples are also the same.
  • the solvent can adopt the description of "(2-3) solvent” above. Preferred types and specific examples are also the same.
  • reaction temperature can adopt the description of "(1-6) Reaction temperature” above.
  • a preferable range is also the same.
  • reaction time can adopt the description of "(1-7) reaction time” above.
  • a preferable range is also the same.
  • reaction pressure can adopt the description of "(1-8) Reaction pressure" above. Preferred types and specific examples are also the same.
  • examples of reactions can adopt the description of "(1-9) Examples of reactions" above. Preferred types and specific examples are also the same.
  • the compound represented by general formula (1) which is the target compound
  • the phosphonium salt used in the third aspect of the present disclosure is a phosphonium salt having one or more alkyl groups with 3 or more carbon atoms.
  • This phosphonium salt has, for example, general formula (3A):
  • R 3a , R 4a , R 5a and R 6a are the same or different and represent a hydrocarbon group. However, at least one of R 3a , R 4a , R 5a and R 6a is an alkyl group having 3 or more carbon atoms. Y represents a counter anion. ] Phosphonium salts represented by
  • R 3a , R 4a , R 5a and R 6a include those mentioned above. The same applies to the type and number of substituents. It should be noted that R 3a , R 4a , R 5a and R 6a are preferably sites where carbon atoms are bonded to the central phosphorus atom.
  • R 3a , R 4a , R 5a and R 6a At least one of (1, 2, 3 or 4) is an alkyl group having 3 or more carbon atoms.
  • R 3a , R 4a , R 5a and R 6a are alkyl groups is preferred.
  • at least one (1, 2, 3 or 4) of R 3a , R 4a , R 5a and R 6a has 3 or more carbon atoms, preferably 4 to 20, more preferably 5 to 15 is an alkyl group of
  • the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc. are particularly improved, The production of impurities can be particularly reduced.
  • phosphonium salts known or commercially available products can be used. Moreover, the above phosphonium salts can be used alone, or two or more of them can be used in combination.
  • the amount of the phosphonium salt used is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1) From the viewpoint of the yield of the compound represented by the general formula (2), it is preferably 0.01 to 10 mol, more preferably 0.1 to 5 mol, 1 to 2.5 Molar is more preferred. When using a plurality of phosphonium salts, it is preferable to adjust the total amount within the above range.
  • Composition (Part 1) As described above, the compound represented by general formula (1) can be obtained. Difluorobenzotrifluoride and one of X 1 in general formula (2) in the form of a composition containing at least one halogenated fluorobenzotrifluoride selected from the group consisting of chlorofluorobenzotrifluoride, bromofluorobenzotrifluoride and iodofluorobenzotrifluoride as a partially fluorinated compound sometimes obtained.
  • Difluorobenzotrifluoride as the compound represented by the general formula (1) is not particularly limited, but 2,3-difluorobenzotrifluoride, 2,4-difluorobenzotrifluoride, 2,6-difluorobenzotrifluoride etc. These difluorobenzotrifluorides can be used alone or in combination of two or more.
  • Halogenated fluorobenzotrifluoride as a compound in which only part of X 1 in general formula (2) is fluorinated is not particularly limited, but 2-chloro-3-fluorobenzotrifluoride, 2-chloro-4 -fluorobenzotrifluoride, 2-chloro-6-fluorobenzotrifluoride, 3-chloro-2-fluorobenzotrifluoride, 4-chloro-2-fluorobenzotrifluoride, 6-chloro-2-fluorobenzotrifluoride, 2-bromo-3-fluorobenzotrifluoride, 2-bromo-4-fluorobenzotrifluoride, 2-bromo-6-fluorobenzotrifluoride, 3-bromo-2-fluorobenzotrifluoride, 4-bromo-2- fluorobenzotrifluoride, 6-bromo-2-fluorobenzotrifluoride, 2-iodo-3-fluorobenzotrifluoride, 2-iodo-4-fluorobenzotrifluoride, 2-io
  • the content of difluorobenzotrifluoride is 60.0 to 99.9 mol %, 65.0 to 99.5 mol %, 70 .0 to 99.0 mol%, 75.0 to 98.5 mol%, 80.0 to 98.0 mol%, 85.0 to 97.5 mol%, 90.0 to 97.0 mol%, etc. It is also possible to
  • the total amount of the composition of the present disclosure according to the first aspect is 100 mol%
  • the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol%, 0.5 to 35.0 mol%, 1.0 to 30.0 mol%, 1.5 to 25.0 mol%, 2.0 to 20.0 mol%, 2.5 to 15.0 mol%, 3.0 to 10.0 mol%, etc. It is also possible to
  • composition of the present disclosure according to such a first aspect can be effectively used for various applications such as organic synthesis solvents, agricultural chemical intermediates, and pharmaceutical intermediates.
  • composition (Part 2) As described above, the compound represented by the general formula (1) can be obtained.
  • Pentafluorobenzotrifluoride and X 1 in the general formula (2) Partially fluorinated compounds such as chlorotetrafluorobenzotrifluoride, bromotetrafluorobenzotrifluoride, iodotetrafluorobenzotrifluoride, dichlorotrifluorobenzotrifluoride, dibromotrifluorobenzotrifluoride, diiodotrifluorobenzo selected from the group consisting of trifluoride, trichlorodifluorobenzotrifluoride, tribromodifluorobenzotrifluoride, triiododifluorobenzotrifluoride, tetrachlorofluorobenzotrifluoride, tetrabromofluorobenzotrifluoride, and tetraiodofluorobenzotrifluoride It may also be obtained in the form of a composition comprising at
  • Pentafluorobenzotrifluoride as the compound represented by general formula (1) is not particularly limited, but includes 2,3,4,5,6-pentafluorobenzotrifluoride. Pentafluorobenzotrifluoride can be used alone or in combination of two or more.
  • Halogenated fluorobenzotrifluoride any isotope can be employed as the halogenated fluorobenzotrifluoride as the compound in which only a part of X 1 in the general formula (2) is fluorinated.
  • Halogenated fluorobenzotrifluorides can be used alone or in combination of two or more.
  • the content of pentafluorobenzotrifluoride is 60.0 to 99.9 mol%, 65.0 to 99.5 mol%, 70.0 to 99.0 mol%, 75.0 to 98.5 mol%, 80.0 to 98.0 mol%, 85.0 to 97.5 mol%, 90.0 to 97.0 mol%, etc. It is also possible to
  • the total amount of the composition of the present disclosure according to the second aspect is 100 mol%
  • the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol%, 0.5 to 35.0 mol%, 1.0 to 30.0 mol%, 1.5 to 25.0 mol%, 2.0 to 20.0 mol%, 2.5 to 15.0 mol%, 3.0 to 10.0 mol%, etc. It is also possible to
  • composition of the present disclosure according to such a second aspect can be effectively used for various uses such as etching gas and cleaning gas.
  • the phosphonium salts used in Table 1 are as follows.
  • the product 2,4-2F-BTF means 2,4-difluorobenzotrifluoride
  • 2,4-Cl-F-BTF means 2-chloro-4-fluorobenzo It means trifluoride and/or 4-chloro-2-fluorobenzotrifluoride
  • selectivity for 2,4-Cl-F-BTF means total selectivity for 2-chloro-4-fluorobenzotrifluoride and 4-chloro-2-fluorobenzotrifluoride.
  • Examples 8-13 instead of 2,4-dichlorobenzotrifluoride, the substrates shown in Tables 2-4 (0.005 mol) and phosphonium salts shown in Tables 2-4 (0.0014 mol) were used, except that Examples 1-7 were used. A similar reaction was performed.
  • the substrate 2,3-2Cl-BTF means 2,3-dichlorobenzotrifluoride
  • 2,6-2Cl-BTF means 2,6-dichlorobenzotrifluoride
  • 5Cl-BTF means 2,3,4,5,6-pentachlorobenzotrifluoride.
  • the product 2,3-2F-BTF means 2,3-difluorobenzotrifluoride
  • 2,3-Cl-F-BTF means 2-chloro-3- means fluorobenzotrifluoride and/or 3-chloro-2-fluorobenzotrifluoride
  • 2,6-2F-BTF means 2,6-difluorobenzotrifluoride
  • 2,6-Cl-F- BTF means 2-chloro-6-fluorobenzotrifluoride
  • 5F-BTF means 2,3,4,5,6-pentafluorobenzotrifluoride
  • 4F,1Cl-BTF means chlorotetra means fluorobenzotrifluoride (including all isotopes)
  • 3F,2Cl-BTF means dichlorotrifluorobenzotrifluoride (including all isotopes)
  • the selectivity for 2,3-Cl-F-BTF means the total selectivity for 2-chloro-3-fluorobenzotrifluoride and 3-chloro-2-fluorobenzotrifluoride.
  • 4F,1Cl-BTF refers to the total isotopic selectivity of chlorotetrafluorobenzotrifluoride
  • the selectivity of 3F,2Cl-BTF is the total isotopic selectivity of dichlorotrifluorobenzotrifluoride.
  • selectivity for 2F,3Cl-BTF means total selectivity for trichlorodifluorobenzotrifluoride
  • selectivity for 1F,4Cl-BTF means total selectivity for tetrachlorofluorobenzotrifluoride. do.

Abstract

Provided is a method for producing a compound represented by general formula (1) [wherein R1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group; X1's may be the same as or different from each other and independently represent a halogen atom other than a fluorine atom; and n represents an integer of 1 to 6 and n1 represents an integer of 1 to 6, wherein n ≥ n1 and n1 represents an integer of 2 to 6 when n represents an integer of 2 to 6], the method comprising a step for reacting a compound represented by general formula (2) [wherein R1, X1 and n are as mentioned above] with a metal fluoride in a solvent comprising a nitrogenated organic compound in the presence of a phosphonium salt having at least one alkyl group to produce the compound represented by general formula (1), in which, when n represents an integer of 2 or more, at least two X1's are fluorinated in the reaction. The production method is a novel method whereby a fluorinated aromatic compound can be produced with high efficiency.

Description

フッ素含有芳香族化合物の製造方法Method for producing fluorine-containing aromatic compound
 本開示は、フッ素含有芳香族化合物の製造方法に関する。 The present disclosure relates to a method for producing a fluorine-containing aromatic compound.
 次世代エッチングガス等として期待されるパーフルオロトルエンに代表されるフッ素含有芳香族化合物の製造方法としては、例えば、1~5質量%のテトラキス(ジエチルアミノ)ホスホニウム塩を触媒として用いて、1.2~1.4当量のアルカリ金属又はアルカリ土類金属のフッ化物により、ハロゲン化芳香族化合物のフッ素化を行うことが知られている(特許文献1参照)。 As a method for producing a fluorine-containing aromatic compound typified by perfluorotoluene, which is expected as a next-generation etching gas, for example, 1 to 5% by mass of tetrakis(diethylamino)phosphonium salt is used as a catalyst. It is known to carry out the fluorination of halogenated aromatic compounds with ˜1.4 equivalents of an alkali metal or alkaline earth metal fluoride (see US Pat.
ロシア国特許公告第2157800号Russian Patent Publication No. 2157800
 本開示は、フッ素含有芳香族化合物を効率よく製造することができる新規な方法を提供することを目的とする。 An object of the present disclosure is to provide a novel method capable of efficiently producing a fluorine-containing aromatic compound.
 本開示は、以下の構成を包含する。 The present disclosure includes the following configurations.
 項1.一般式(1): Section 1. General formula (1):
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは1~6の整数を示す。n1は1~6の整数を示す。ただし、n≧n1であり、且つ、nが2~6の整数である場合、n1は2~6の整数を示す。]
で表される化合物の製造方法であって、
窒素含有有機化合物を含む溶媒中で、
アルキル基を1個以上有するホスホニウム塩の存在下に、
一般式(2):
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 1-6. n1 represents an integer of 1-6. However, when n≧n1 and n is an integer of 2-6, n1 represents an integer of 2-6. ]
A method for producing a compound represented by
in a solvent containing a nitrogen-containing organic compound,
In the presence of a phosphonium salt having one or more alkyl groups,
General formula (2):
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
[式中、R、X及びnは前記に同じである。]
で表される化合物と、
金属フッ化物とを反応させ、nが2以上の整数である場合は2個以上のXをフッ素化させて、上記一般式(1)で表される化合物を生成させる工程
を備える、製造方法。
[In the formula, R 1 , X 1 and n are the same as above. ]
A compound represented by
A production method comprising a step of reacting with a metal fluoride and fluorinating two or more X 1 when n is an integer of 2 or more to produce a compound represented by the general formula (1). .
 項2.水分量が700質量ppm以下である系中で前記フッ素化を行う、項1に記載の製造方法。 Section 2. Item 2. The production method according to Item 1, wherein the fluorination is performed in a system having a water content of 700 ppm by mass or less.
 項3.前記nが3~6の整数である、請求項1又は2に記載の製造方法。 Section 3. The production method according to claim 1 or 2, wherein said n is an integer of 3-6.
 項4.前記金属フッ化物が、アルカリ金属又はアルカリ土類金属のフッ化物である、項1~3のいずれか1項に記載の製造方法。 Item 4. Item 4. The production method according to any one of Items 1 to 3, wherein the metal fluoride is an alkali metal or alkaline earth metal fluoride.
 項5.ジフルオロベンゾトリフルオリドと、クロロフルオロベンゾトリフルオリド、ブロモフルオロベンゾトリフルオリド及びヨードフルオロベンゾトリフルオリドよりなる群から選ばれる少なくとも1種のハロゲン化フルオロベンゾトリフルオリドとを含有する、組成物。 Item 5. A composition comprising difluorobenzotrifluoride and at least one halogenated fluorobenzotrifluoride selected from the group consisting of chlorofluorobenzotrifluoride, bromofluorobenzotrifluoride and iodofluorobenzotrifluoride.
 項6.前記組成物の総量を100モル%として、前記ジフルオロベンゾトリフルオリドの含有量が60.0~99.9モル%であり、前記ハロゲン化フルオロベンゾトリフルオリドの含有量が0.1~40.0モル%である、項5に記載の組成物。 Item 6. The content of the difluorobenzotrifluoride is 60.0 to 99.9 mol% and the content of the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol% based on the total amount of the composition being 100 mol%. 6. The composition according to Item 5, which is mol %.
 項7.有機合成用溶媒、農薬中間体又は医薬中間体として用いられる、項5又は6に記載の組成物。 Item 7. Item 7. The composition according to Item 5 or 6, which is used as a solvent for organic synthesis, an agricultural chemical intermediate, or a pharmaceutical intermediate.
 項8.ペンタフルオロベンゾトリフルオリドと、クロロテトラフルオロベンゾトリフルオリド、ブロモテトラフルオロベンゾトリフルオリド、ヨードテトラフルオロベンゾトリフルオリド、ジクロロトリフルオロベンゾトリフルオリド、ジブロモトリフルオロベンゾトリフルオリド、ジヨードトリフルオロベンゾトリフルオリド、トリクロロジフルオロベンゾトリフルオリド、トリブロモジフルオロベンゾトリフルオリド、トリヨードジフルオロベンゾトリフルオリド、テトラクロロフルオロベンゾトリフルオリド、テトラブロモフルオロベンゾトリフルオリド、及びテトラヨードフルオロベンゾトリフルオリドよりなる群から選ばれる少なくとも1種のハロゲン化フルオロベンゾトリフルオリドとを含有する、組成物。 Item 8. pentafluorobenzotrifluoride, chlorotetrafluorobenzotrifluoride, bromotetrafluorobenzotrifluoride, iodotetrafluorobenzotrifluoride, dichlorotrifluorobenzotrifluoride, dibromotrifluorobenzotrifluoride, diiodotrifluorobenzotrifluoride, at least one selected from the group consisting of trichlorodifluorobenzotrifluoride, tribromodifluorobenzotrifluoride, triiododifluorobenzotrifluoride, tetrachlorofluorobenzotrifluoride, tetrabromofluorobenzotrifluoride, and tetraiodofluorobenzotrifluoride and a halogenated fluorobenzotrifluoride.
 項9.前記組成物の総量を100モル%として、前記ペンタフルオロベンゾトリフルオリドの含有量が60.0~99.9モル%であり、前記ハロゲン化フルオロベンゾトリフルオリドの含有量が0.1~40.0モル%である、項8に記載の組成物。 Item 9. The content of the pentafluorobenzotrifluoride is 60.0 to 99.9 mol% and the content of the halogenated fluorobenzotrifluoride is 0.1 to 40.9 mol% based on the total amount of the composition being 100 mol%. Item 9. The composition according to Item 8, which is 0 mol%.
 項10.エッチングガス又はクリーニングガスとして用いられる、項8又は9に記載の組成物。 Item 10. Item 10. The composition according to item 8 or 9, which is used as an etching gas or a cleaning gas.
 本開示によれば、フッ素含有芳香族化合物を効率よく製造することができる新規な方法を提供することができる。 According to the present disclosure, it is possible to provide a novel method capable of efficiently producing fluorine-containing aromatic compounds.
 本明細書において、「含有」は、「含む(comprise)」、「実質的にのみからなる(consist essentially of)」、及び「のみからなる(consist of)」のいずれも包含する概念である。 As used herein, "contain" is a concept that includes all of "comprise", "consist essentially of", and "consist of".
 また、本明細書において、数値範囲を「A~B」で示す場合、A以上B以下を意味する。 Also, in this specification, when a numerical range is indicated by "A to B", it means from A to B.
 本開示において、「選択率」とは、反応器出口からの流出ガスにおける原料化合物以外の化合物の合計モル量に対する、当該流出ガスに含まれる目的化合物の合計モル量の割合(モル%)を意味する。 In the present disclosure, "selectivity" means the ratio (mol%) of the total molar amount of the target compound contained in the outflow gas to the total molar amount of compounds other than the raw material compounds in the outflow gas from the reactor outlet. do.
 本開示において、「転化率」とは、反応器に供給される原料化合物のモル量に対する、反応器出口からの流出ガスに含まれる原料化合物以外の化合物の合計モル量の割合(モル%)を意味する。 In the present disclosure, the "conversion rate" refers to the ratio (mol%) of the total molar amount of compounds other than the raw material compound contained in the outflow gas from the reactor outlet to the molar amount of the raw material compound supplied to the reactor. means.
 本開示において、「収率」とは、反応器に供給される原料化合物のモル量に対する、反応器出口からの流出ガスに含まれる目的化合物の合計モル量の割合(モル%)を意味する。 In the present disclosure, "yield" means the ratio (mol%) of the total molar amount of the target compound contained in the outflow gas from the reactor outlet to the molar amount of the raw material compound supplied to the reactor.
 特許文献1には、1~5質量%のテトラキス(ジエチルアミノ)ホスホニウム塩を触媒として用いて、1.2~1.4当量のアルカリ金属又はアルカリ土類金属のフッ化物(特にフッ化カリウム)により、ハロゲン化芳香族化合物のフッ素化を行うことが記載されているが、このうち、テトラキス(ジエチルアミノ)ホスホニウム塩は市販されておらず、合成コストがかかるため実用的な方法ではないため、フッ素含有芳香族化合物を製造することができる新規な方法が求められている。 In Patent Document 1, using 1 to 5% by mass of tetrakis(diethylamino)phosphonium salt as a catalyst, 1.2 to 1.4 equivalents of alkali metal or alkaline earth metal fluoride (especially potassium fluoride) , describes the fluorination of halogenated aromatic compounds. There is a need for new methods by which aromatic compounds can be produced.
 本開示によれば、アルキル基を1個以上有するホスホニウム塩の存在下に、特定のハロゲン化芳香族化合物と金属フッ化物とを反応させる方法において、所望の反応条件(特定の溶媒を使用したり、系中の水分量を特定範囲に調整したり、特定の基質を採用したり、特定のホスホニウム塩を採用したりすること)により、ハロゲン化芳香族化合物中のフッ素以外のハロゲン原子を全てフッ素化させてフッ素含有芳香族化合物を効率よく製造することができ、特に、高転化率、高選択率、高収率でフッ素含有芳香族化合物を製造することができる。 According to the present disclosure, in the method of reacting a specific halogenated aromatic compound with a metal fluoride in the presence of a phosphonium salt having one or more alkyl groups, desired reaction conditions (using a specific solvent or , adjusting the amount of water in the system to a specific range, adopting a specific substrate, or using a specific phosphonium salt), all halogen atoms other than fluorine in the halogenated aromatic compound are replaced by fluorine Fluorine-containing aromatic compounds can be efficiently produced by conversion, and in particular, fluorine-containing aromatic compounds can be produced with high conversion, high selectivity, and high yield.
 1.フッ素含有芳香族化合物の製造方法(その1)
 本開示の第1の態様に係る製造方法は、
一般式(1):
1. Method for producing fluorine-containing aromatic compound (part 1)
A manufacturing method according to a first aspect of the present disclosure includes:
General formula (1):
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは1~6の整数を示す。n1は1~6の整数を示す。ただし、n≧n1であり、且つ、nが2~6の整数である場合、n1は2~6の整数を示す。]
で表される化合物の製造方法であって、
窒素含有有機化合物を含む溶媒中で、
アルキル基を1個以上有するホスホニウム塩の存在下に、
一般式(2):
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 1-6. n1 represents an integer of 1-6. However, when n≧n1 and n is an integer of 2-6, n1 represents an integer of 2-6. ]
A method for producing a compound represented by
in a solvent containing a nitrogen-containing organic compound,
In the presence of a phosphonium salt having one or more alkyl groups,
General formula (2):
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
[式中、R、X及びnは前記に同じである。]
で表される化合物と、
金属フッ化物とを反応させ、nが2以上の整数である場合は2個以上のXをフッ素化させて、上記一般式(1)で表される化合物を生成させる工程
を備える。
[In the formula, R 1 , X 1 and n are the same as above. ]
A compound represented by
A step of reacting with a metal fluoride and fluorinating two or more X 1 when n is an integer of 2 or more to produce a compound represented by the general formula (1).
 (1-1)出発化合物(一般式(2))
 本開示の第1の態様の製造方法において、一般式(2)で表される化合物は、一般式(2):
(1-1) starting compound (general formula (2))
In the production method of the first aspect of the present disclosure, the compound represented by general formula (2) is represented by general formula (2):
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは1~6の整数を示す。]
で表される化合物である。
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 1-6. ]
It is a compound represented by
 一般式(2)において、Rで示される炭化水素基としては、特に制限されず、例えばアルキル基、アリール基等、さらにはこれらが任意に組み合わされてなる基(例えば、アラルキル基、アルキルアリール基、アルキルアラルキル基)等が挙げられる。 In general formula (2), the hydrocarbon group represented by R 1 is not particularly limited, and examples thereof include an alkyl group, an aryl group and the like, and groups formed by any combination thereof (eg, an aralkyl group, an alkylaryl group, alkylaralkyl group) and the like.
 一般式(2)において、Rで示される炭化水素基としてのアルキル基には、直鎖状、分岐鎖状、又は環状(好ましくは直鎖状又は分枝鎖状、より好ましくは直鎖状)のいずれのものも包含される。該アルキル基(直鎖状又は分枝鎖状の場合)の炭素数は、特に制限されず、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、例えば1~20が好ましく、3~15がより好ましく、5~10がさらに好ましい。該アルキル基(環状の場合)の炭素数は、特に制限されず、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、例えば、3~8が好ましく、4~7がより好ましい。 In general formula (2), the alkyl group as the hydrocarbon group represented by R 1 may be linear, branched or cyclic (preferably linear or branched, more preferably linear ) are included. The number of carbon atoms in the alkyl group (in the case of linear or branched chain) is not particularly limited, and the conversion rate of the reaction, the selectivity of the compound represented by general formula (1), the general formula (1) From the viewpoint of the yield of the represented compound, for example, 1 to 20 is preferable, 3 to 15 is more preferable, and 5 to 10 is even more preferable. The number of carbon atoms in the alkyl group (in the case of cyclic) is not particularly limited, and the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1) etc., for example, 3 to 8 are preferable, and 4 to 7 are more preferable.
 該アルキル基の具体例としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、n-ペンチル基、ネオペンチル基、n-ヘキシル基、3-メチルペンチル基、n-ヘプチル基、n-オクチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基等が挙げられる。 Specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group and neopentyl group. , n-hexyl group, 3-methylpentyl group, n-heptyl group, n-octyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group and the like.
 一般式(2)において、Rで示される炭化水素基としてのアリール基は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、炭素数が6~20のものが好ましく、6~12のものがより好ましく、6~10のものがさらに好ましい。該アリール基は、単環式又は多環式(例えば2環式、3環式等)のいずれでも有り得るが、好ましくは単環式である。 In the general formula (2), the aryl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1) From the viewpoint of yield and the like of the compound represented by, those having 6 to 20 carbon atoms are preferable, those having 6 to 12 carbon atoms are more preferable, and those having 6 to 10 carbon atoms are even more preferable. The aryl group can be either monocyclic or polycyclic (eg, bicyclic, tricyclic, etc.), but is preferably monocyclic.
 該アリール基としては、具体的には、例えばフェニル基、ナフチル基、ビフェニル基、ペンタレニル基、インデニル基、アントラニル基、テトラセニル基、ペンタセニル基、ピレニル基、ペリレニル基、フルオレニル基、フェナントリル基等が挙げられる。 Specific examples of the aryl group include phenyl, naphthyl, biphenyl, pentalenyl, indenyl, anthranyl, tetracenyl, pentacenyl, pyrenyl, perylenyl, fluorenyl, and phenanthryl groups. be done.
 一般式(2)において、Rで示される炭化水素基としてのアラルキル基は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、例えば直鎖状又は分岐鎖状の炭素数1~6(好ましくは1~3)のアルキル基の水素原子(例えば1~3つ、好ましくは1つの水素原子)が上記アリール基に置換されてなるアラルキル基等が挙げられる。 In the general formula (2), the aralkyl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the From the viewpoint of the yield of the compound represented by, for example, hydrogen atoms (eg, 1 to 3, preferably 1 and an aralkyl group in which one hydrogen atom) is substituted by the above aryl group.
 該アラルキル基としては、具体的には、例えばベンジル基、フェネチル基等が挙げられる。 Specific examples of the aralkyl group include a benzyl group and a phenethyl group.
 一般式(2)において、Rで示される炭化水素基としてのアルキルアリール基は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、例えば上記アリール基の水素原子(例えば1~3つ、好ましくは1つの水素原子)が、直鎖状又は分岐鎖状の炭素数1~6(好ましくは1~2)のアルキル基に置換されてなるアルキルアリール基等が挙げられる。 In the general formula (2), the alkylaryl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1 ), for example, the hydrogen atoms (for example, 1 to 3, preferably 1 hydrogen atom) of the aryl group are linear or branched and have 1 to 6 carbon atoms. (preferably 1 to 2) alkylaryl groups substituted with alkyl groups, and the like.
 該アルキルアリール基としては、具体的には、例えばトリル基、キシリル基等が挙げられる。 Specific examples of the alkylaryl group include a tolyl group and a xylyl group.
 一般式(2)において、Rで示される炭化水素基としてのアルキルアラルキル基は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、例えば上記アラルキル基の芳香環上の水素原子(例えば1~3つ、好ましくは1つの水素原子)が、直鎖状又は分岐鎖状の炭素数1~6(好ましくは1~2)のアルキル基に置換されてなるアルキルアラルキル基等が挙げられる。 In the general formula (2), the alkylaralkyl group as the hydrocarbon group represented by R 1 is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1 ), for example, hydrogen atoms on the aromatic ring of the aralkyl group (eg, 1 to 3, preferably 1 hydrogen atom) are linear or branched carbon Examples thereof include alkylaralkyl groups substituted with alkyl groups of number 1 to 6 (preferably 1 to 2).
 一般式(2)において、Rで示される炭化水素基の置換基としては、例えばアルコキシ基、ハロゲン原子等が挙げられる。該置換基の数としては、特に制限されず、例えば0~6個が好ましく、0~3個がより好ましく、0~1個がさらに好ましい。 In general formula (2), examples of the substituent of the hydrocarbon group represented by R 1 include an alkoxy group and a halogen atom. The number of substituents is not particularly limited, and is preferably 0 to 6, more preferably 0 to 3, even more preferably 0 to 1.
 上記炭化水素基の置換基としてのアルコキシ基としては、特に制限はなく、ハロゲン原子(フッ素原子、塩素原子、臭素原子、ヨウ素原子等)等で置換されていてもよい直鎖状又は分岐鎖状(好ましくは直鎖状)の炭素数1~8、好ましくは1~5、より好ましくは1~3のアルコキシ基が挙げられる。置換基の数は特に制限はなく、例えば0~6個が好ましく、0~3個がより好ましく、0~1個がさらに好ましい。 The alkoxy group as a substituent of the hydrocarbon group is not particularly limited, and may be linear or branched optionally substituted with a halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.) or the like. A (preferably linear) alkoxy group having 1 to 8, preferably 1 to 5, more preferably 1 to 3 carbon atoms can be mentioned. The number of substituents is not particularly limited, and is preferably 0 to 6, more preferably 0 to 3, even more preferably 0 to 1.
 このような置換されていてもよいアルコキシ基としては、例えば、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、イソブトキシ基、sec-ブトキシ基、tert-ブトキシ基、パーフルオロメトキシ基、パーフルオロエトキシ基等が挙げられる。 Examples of such optionally substituted alkoxy groups include methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy, per A fluoromethoxy group, a perfluoroethoxy group, and the like can be mentioned.
 上記炭化水素基の置換基としてのハロゲン原子としては、特に制限は無く、例えばフッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 The halogen atom as a substituent of the above hydrocarbon group is not particularly limited, and examples thereof include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
 一般式(2)において、Rで示されるパーフルオロアルキル基は、全ての水素原子がフッ素原子で置換されたアルキル基を意味する。 In general formula (2), the perfluoroalkyl group represented by R 1 means an alkyl group in which all hydrogen atoms are substituted with fluorine atoms.
 パーフルオロアルキル基は、直鎖状、分岐鎖状及び環状のいずれも採用することができる。なかでも、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、直鎖状パーフルオロアルキル基が好ましい。 Any of linear, branched and cyclic perfluoroalkyl groups can be adopted. Among them, a straight-chain perfluoroalkyl group is preferable from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), and the like.
 このパーフルオロアルキル基の炭素数は、特に制限されるわけではないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、1~5が好ましく、1~4がより好ましく、1~3がさらに好ましい。 The number of carbon atoms in the perfluoroalkyl group is not particularly limited, but it is 1 to 5 are preferred, 1 to 4 are more preferred, and 1 to 3 are even more preferred from the viewpoint of ratio and the like.
 このようなパーフルオロアルキル基としては、具体的には、トリフルオロメチル基、ペンタクルオロエチル基、ヘプタフルオロプロピル基等が挙げられる。 Specific examples of such perfluoroalkyl groups include a trifluoromethyl group, a pentafluoroethyl group, a heptafluoropropyl group, and the like.
 一般式(2)において、Xで示されるフッ素原子以外のハロゲン原子としては、特に制限はなく、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 In the general formula (2), the halogen atom other than the fluorine atom represented by X 1 is not particularly limited, and includes a chlorine atom, a bromine atom, an iodine atom and the like.
 一般式(2)において、Xの置換数であるnは特に制限はなく、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、1~6が好ましく、2~6、3~6、4~6、5~6等とすることもできる。 In the general formula (2), the substitution number n of X 1 is not particularly limited, the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the compound represented by the general formula (1) 1 to 6 is preferable, and 2 to 6, 3 to 6, 4 to 6, 5 to 6, etc. can also be used.
 なお、Xの置換数であるnが3~6である場合、一般式(2)で表される化合物は、一般式(2A): When n, the number of substitutions of X, is 3 to 6, the compound represented by general formula (2) is represented by general formula (2A):
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
[式中、R及びXは前記に同じである。nは3~6の整数を示す。]
で表される化合物である。
[In the formula, R 1 and X 1 are the same as above. n represents an integer of 3-6. ]
It is a compound represented by
 上記のような条件を満たす一般式(2)で表される化合物としては、具体的には、 Specifically, the compound represented by general formula (2) that satisfies the above conditions is
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
等が挙げられる。 etc.
 上記の一般式(2)で表される化合物は、公知又は市販品を用いることができる。また、上記の一般式(2)で表される化合物は、単独で用いることもでき、2種以上を組合せて用いることもできる。 A known or commercially available product can be used as the compound represented by the above general formula (2). Moreover, the compounds represented by the general formula (2) can be used alone, or two or more of them can be used in combination.
 (1-2)反応
 本開示の反応では、上記した一般式(2)で表される化合物において、フッ素以外のハロゲン原子であるXが、特定のホスホニウム塩の存在下において金属フッ化物によるフッ素化によって、フッ素原子に置換され、上記した一般式(1)で表される化合物が生成される。
(1-2) Reaction In the reaction of the present disclosure, in the compound represented by the above general formula (2), X 1 , which is a halogen atom other than fluorine, is converted to fluorine by a metal fluoride in the presence of a specific phosphonium salt. By chemical conversion, the compound represented by the above general formula (1) is produced by substituting with a fluorine atom.
 この際、フッ素以外のハロゲン原子であるXが複数ある場合、つまり、一般式(2)におけるnが2以上の整数である場合は、そのうち2個以上(特に全て)がフッ素化された化合物が選択的に合成される。 At this time, when there are a plurality of X 1 which are halogen atoms other than fluorine, that is, when n in the general formula (2) is an integer of 2 or more, two or more (especially all) of them are fluorinated compounds are selectively synthesized.
 一方、上記した一般式(2)で表される化合物において、Rは、特定のホスホニウム塩の存在下において金属フッ化物によるフッ素化によっても反応することなく残存する。 On the other hand, in the compound represented by the general formula (2), R 1 remains unreacted even after fluorination with a metal fluoride in the presence of a specific phosphonium salt.
 この結果、一般式(1)で表される化合物が得られる。 As a result, a compound represented by general formula (1) is obtained.
 この本開示の第1の態様の反応は、反応器中に原料を一括して仕込むバッチ式と、原料を反応器中に連続して供給しながら生成物を反応器から抜き出す流通式のいずれの方式でも採用できる。本開示の反応はそれほど速い反応ではないため、バッチ式を採用することが好ましい。 The reaction of the first aspect of the present disclosure is either a batch type in which the raw materials are charged into the reactor at once, or a flow type in which the product is withdrawn from the reactor while continuously supplying the raw materials into the reactor. method can also be adopted. Since the reaction of the present disclosure is not a very fast reaction, it is preferred to adopt a batch mode.
 (1-3)ホスホニウム塩
 本開示の第1の態様の製造方法で使用するホスホニウム塩は、アルキル基を1個以上有するホスホニウム塩である。
(1-3) Phosphonium salt The phosphonium salt used in the production method of the first aspect of the present disclosure is a phosphonium salt having one or more alkyl groups.
 このホスホニウム塩は、例えば、一般式(3): This phosphonium salt has, for example, general formula (3):
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
[式中、R、R、R及びRは同一又は異なって、炭化水素基を示す。ただし、R、R、R及びRのうち少なくとも1つはアルキル基である。Yは対アニオンを示す。]
で表されるホスホニウム塩が挙げられる。
[In the formula, R 3 , R 4 , R 5 and R 6 are the same or different and represent a hydrocarbon group. However, at least one of R 3 , R 4 , R 5 and R 6 is an alkyl group. Y represents a counter anion. ]
Phosphonium salts represented by
 一般式(3)において、R、R、R及びRで示される炭化水素基としては、上記したものが挙げられる。置換基の種類及び数も同様である。なお、R、R、R及びRは、中央部のリン原子とは炭素原子が結合する部位であることが好ましい。 In general formula (3), the hydrocarbon groups represented by R 3 , R 4 , R 5 and R 6 include those mentioned above. The same applies to the type and number of substituents. R 3 , R 4 , R 5 and R 6 are preferably sites where carbon atoms are bonded to the central phosphorus atom.
 ただし、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、R、R、R及びRのうち少なくとも1つ(1つ、2つ、3つ又は4つ)はアルキル基である。 However, from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., R 3 , R 4 , R 5 and R 6 at least one (1, 2, 3 or 4) of is an alkyl group.
 また、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、R、R、R及びRとしては、アルキル基が好ましい。なかでも、R、R、R及びRのうち少なくとも1つ(1つ、2つ、3つ又は4つ)は炭素数1~20、好ましくは3~15、より好ましくは4~12、さらに好ましくは5~10のアルキル基が好ましい。特に、ホスホニウム塩が有するアルキル基の炭素数を多くすることで、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等を特に向上させ、不純物の生成量を特に低減することも可能である。 From the viewpoint of the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., R 3 , R 4 , R 5 and R 6 are alkyl groups is preferred. Among them, at least one (1, 2, 3 or 4) of R 3 , R 4 , R 5 and R 6 has 1 to 20 carbon atoms, preferably 3 to 15 carbon atoms, more preferably 4 to 12, more preferably 5 to 10 alkyl groups are preferred. In particular, by increasing the number of carbon atoms in the alkyl group of the phosphonium salt, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc. are particularly improved, It is also possible to particularly reduce the amount of impurities produced.
 一般式(3)において、Yで示される対アニオンとしては、特に制限はなく、様々なアニオンを採用することができ、例えば、ハロゲン化物イオン(フッ化物イオン(F)、塩化物イオン(Cl)、臭化物イオン(Br)、ヨウ化物イオン(I)等)、テトラフルオロホウ酸イオン(BF )、硫酸水素イオン(HSO )、酢酸イオン(CHCOO)、ヘキサフルオロリン酸イオン(PF )等が挙げられる。 In the general formula ( 3 ), the counter anion represented by Y is not particularly limited, and various anions can be employed. ), bromide ion (Br ), iodide ion (I ), etc.), tetrafluoroborate ion (BF 4 ), hydrogen sulfate ion (HSO 4 ), acetate ion (CH 3 COO ), hexa Fluorophosphate ion (PF 6 ) and the like are included.
 以上のような条件を満たす一般式(3)で表される化合物としては、具体的には、 Specifically, as a compound represented by general formula (3) that satisfies the above conditions,
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
等が挙げられる。 etc.
 これらのホスホニウム塩は、公知又は市販品を用いることができる。また、上記のホスホニウム塩は、単独で用いることもでき、2種以上を組合せて用いることもできる。 For these phosphonium salts, known or commercially available products can be used. Moreover, the above phosphonium salts can be used alone, or two or more of them can be used in combination.
 本開示の第1の態様の製造方法における反応において、ホスホニウム塩の使用量は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、一般式(2)で表される化合物1モルに対して、0.01~10モルが好ましく、0.1~5モルがより好ましく、1~2.5モルがさらに好ましい。なお、ホスホニウム塩を複数使用する場合は、その合計量を上記範囲内となるように調整することが好ましい。 In the reaction in the production method of the first aspect of the present disclosure, the amount of the phosphonium salt used is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by general formula (1), the general formula (1) From the viewpoint of the yield of the compound represented by the general formula (2), relative to 1 mol of the compound represented by the general formula (2), preferably 0.01 to 10 mol, more preferably 0.1 to 5 mol, 1 to 2.5 mol is more preferred. When using a plurality of phosphonium salts, it is preferable to adjust the total amount within the above range.
 (1-4)金属フッ化物
 金属フッ化物としては一般式(2)で表される化合物におけるフッ素以外のハロゲン原子をフッ素化できるものであれば特に制限はないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、アルカリ金属又はアルカリ土類金属のフッ化物が好ましく、アルカリ金属のフッ化物がより好ましい
 このため、金属フッ化物を構成する金属としては、例えば、リチウム、ナトリウム、カリウム、セシウム等のアルカリ金属;マグネシウム、カルシウム、バリウム等のアルカリ土類金属等が挙げられる。これらの金属は、単独で用いることもでき、2種以上を組合せて用いることもできる。
(1-4) Metal Fluoride The metal fluoride is not particularly limited as long as it can fluorinate halogen atoms other than fluorine in the compound represented by the general formula (2). From the viewpoint of the selectivity of the compound represented by (1), the yield of the compound represented by the general formula (1), etc., alkali metal or alkaline earth metal fluorides are preferable, and alkali metal fluorides are more preferable. Therefore, examples of metals constituting metal fluorides include alkali metals such as lithium, sodium, potassium and cesium; alkaline earth metals such as magnesium, calcium and barium. These metals can be used alone or in combination of two or more.
 このような条件を満たす金属フッ化物としては、具体的には、フッ化リチウム、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属フッ化物;フッ化マグネシウム、フッ化カルシウム、フッ化バリウム等のアルカリ土類金属フッ化物等が挙げられる。なかでも、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、フッ化リチウム、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属フッ化物が好ましく、フッ化カリウムがより好ましい。 Examples of metal fluorides that meet these conditions include alkali metal fluorides such as lithium fluoride, sodium fluoride, potassium fluoride, and cesium fluoride; magnesium fluoride, calcium fluoride, and barium fluoride. and alkaline earth metal fluorides such as Among them, lithium fluoride, sodium fluoride, fluoride Alkali metal fluorides such as potassium and cesium fluoride are preferred, and potassium fluoride is more preferred.
 これらの金属フッ化物は、公知又は市販品を用いることができる。また、上記の金属フッ化物は、単独で用いることもでき、2種以上を組合せて用いることもできる。 For these metal fluorides, known or commercially available products can be used. Moreover, said metal fluoride can also be used individually and can also be used in combination of 2 or more types.
 本開示の第1の態様の製造方法における反応において、金属フッ化物の使用量は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、一般式(2)で表される化合物1モルに対して、0.01~30モルが好ましく、0.1~20モルがより好ましく、1~15モルがさらに好ましい。なお、金属フッ化物を複数使用する場合は、その合計量を上記範囲内となるように調整することが好ましい。 In the reaction in the production method of the first aspect of the present disclosure, the amount of metal fluoride used is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by general formula (1), the general formula (1 ), relative to 1 mol of the compound represented by the general formula (2), is preferably 0.01 to 30 mol, more preferably 0.1 to 20 mol, 1 ~15 moles is more preferred. When using a plurality of metal fluorides, it is preferable to adjust the total amount within the above range.
 (1-5)溶媒
 本開示の第1の態様の製造方法における製造方法で使用する溶媒は、特に、一般式(2)で表される化合物、ホスホニウム塩、金属フッ化物等を溶解させ、また、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等に優れる観点から、窒素含有有機化合物を含む溶媒、好ましくは窒素含有極性溶媒を使用する。このような溶媒としては、例えば、アミド化合物(N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジイソプロピルホルムアミド、N-メチル-2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、1,3-ジメチル-3,4,5,6-テトラヒドロピリミジノン、ヘキサメチルリン酸トリアミド等)、アミン化合物(トリエチルアミン、1-メチルピロリジン等)、ピリジン化合物(ピリジン、メチルピリジン等)、キノリン化合物(キノリン、メチルキノリン等)等が挙げられる。なかでも、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、アミド化合物、ピリジン化合物等が好ましく、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジイソプロピルホルムアミド、N-メチル-2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、1,3-ジメチル-3,4,5,6-テトラヒドロピリミジノン、ヘキサメチルリン酸トリアミド、ピリジン、メチルピリジン等がより好ましく、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジイソプロピルホルムアミド、N-メチル-2-ピロリドン、ピリジン等がさらに好ましく、N,N-ジメチルホルムアミド、N-メチル-2-ピロリドン、ピリジン等が特に好ましい。
(1-5) Solvent The solvent used in the production method in the production method of the first aspect of the present disclosure is particularly capable of dissolving the compound represented by the general formula (2), phosphonium salt, metal fluoride, etc., and , the conversion of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., a solvent containing a nitrogen-containing organic compound, preferably nitrogen Use containing polar solvents. Examples of such solvents include amide compounds (N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,4,5,6-tetrahydropyrimidinone, hexamethylphosphoric triamide, etc.), amine compounds (triethylamine, 1-methylpyrrolidine, etc.), pyridine compounds (pyridine, methylpyridine, etc.), quinoline compounds (quinoline, methylquinoline, etc.), and the like. Among them, amide compounds, pyridine compounds and the like are preferable from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), and the like. , N-dimethylformamide, N,N-diethylformamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,4, More preferred are 5,6-tetrahydropyrimidinone, hexamethylphosphoric acid triamide, pyridine, methylpyridine and the like, N,N-dimethylformamide, N,N-diethylformamide, N,N-diisopropylformamide, N-methyl-2 -pyrrolidone, pyridine and the like are more preferred, and N,N-dimethylformamide, N-methyl-2-pyrrolidone, pyridine and the like are particularly preferred.
 これらの溶媒は、公知又は市販品を使用することができる。また、これらの溶媒は、単独で用いることもでき、2種以上を組合せて用いることもできる。 For these solvents, known or commercially available products can be used. Moreover, these solvents can be used alone or in combination of two or more.
 溶媒の使用量は、溶媒量であれば特に制限はなく、過剰量とすることができ、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、一般式(2)で表される化合物100質量部に対して、80~10000質量部が好ましく、100~1000質量部がより好ましく、150~800質量部がさらに好ましい。 The amount of solvent used is not particularly limited as long as it is the amount of solvent, and it can be an excess amount. From the viewpoint of the yield of the compound represented by the general formula (2), it is preferably 80 to 10000 parts by mass, more preferably 100 to 1000 parts by mass, and 150 to 800 parts by mass. is more preferred.
 (1-6)反応温度
 本開示の第1の態様の反応では、反応温度は、温和な条件とすることができ、反応の転化率、一般式(1)で表される化合物の収率、選択率等を向上させやすく、副生成物を低減しやすい観点から、通常0~400℃が好ましく、25~300℃がより好ましく、50~200℃がさらに好ましい。
(1-6) Reaction temperature In the reaction of the first aspect of the present disclosure, the reaction temperature can be a mild condition, the conversion rate of the reaction, the yield of the compound represented by the general formula (1), From the viewpoints of easy improvement of selectivity and the like and easy reduction of by-products, the temperature is generally preferably 0 to 400°C, more preferably 25 to 300°C, and even more preferably 50 to 200°C.
 (1-7)反応時間
 本開示の第1の態様の反応の反応時間(最高到達温度における維持時間)は反応が十分に進行する程度とすることができ、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、1分~48時間が好ましく、5分~24時間がより好ましい。
(1-7) Reaction time The reaction time of the reaction of the first aspect of the present disclosure (maintenance time at the highest temperature) can be set to the extent that the reaction progresses sufficiently, and the conversion rate of the reaction, the general formula (1 ), the yield of the compound represented by general formula (1), etc., the time is preferably 1 minute to 48 hours, more preferably 5 minutes to 24 hours.
 (1-8)反応圧力
 本開示の第1の態様の反応の反応圧力は、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、-2~2MPaが好ましく、-1~1MPaがより好ましく、-0.5~0.5MPaがさらに好ましい。なお、本開示において、圧力については特に表記が無い場合はゲージ圧とする。
(1-8) Reaction pressure The reaction pressure of the reaction of the first aspect of the present disclosure is the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the compound represented by the general formula (1) -2 to 2 MPa, more preferably -1 to 1 MPa, and even more preferably -0.5 to 0.5 MPa from the viewpoint of the yield of . In addition, in the present disclosure, pressure is assumed to be gauge pressure unless otherwise specified.
 本開示の第1の態様の反応において、一般式(2)で表される化合物と金属フッ化物とを反応させる反応器としては、上記温度及び圧力に耐え得るものであれば、形状及び構造は特に限定されない。反応器としては、例えば、縦型反応器、横型反応器、多管型反応器等が挙げられる。反応器の材質としては、例えば、ガラス、ステンレス、鉄、ニッケル、鉄ニッケル合金等が挙げられる。 In the reaction of the first aspect of the present disclosure, the reactor for reacting the compound represented by the general formula (2) with the metal fluoride has the shape and structure as long as it can withstand the above temperature and pressure. It is not particularly limited. Examples of reactors include vertical reactors, horizontal reactors, multitubular reactors, and the like. Examples of materials for the reactor include glass, stainless steel, iron, nickel, and iron-nickel alloys.
 (1-9)反応の例示
 本開示の第1の態様における反応を行う際の雰囲気については、一般式(2)で表される化合物、ホスホニウム塩及び金属フッ化物の劣化を抑制する点から、不活性ガス雰囲気下が好ましい。
(1-9) Exemplification of Reaction Regarding the atmosphere when performing the reaction in the first aspect of the present disclosure, from the viewpoint of suppressing the deterioration of the compound represented by the general formula (2), the phosphonium salt and the metal fluoride, An inert gas atmosphere is preferred.
 当該不活性ガスは、窒素、ヘリウム、アルゴン等が挙げられる。これらの不活性ガスのなかでも、コストを抑える観点から、窒素が好ましい。 Examples of the inert gas include nitrogen, helium, argon, and the like. Among these inert gases, nitrogen is preferable from the viewpoint of cost reduction.
 本開示の第1の態様の製造方法では、系中の水分量は、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、700質量ppm以下が好ましく、0.1~650質量ppmがより好ましく、1~600質量ppmがさらに好ましく、10~500質量ppmが特に好ましい。なお、系中の水分量は、反応に使用した試薬(一般式(2)で表される化合物、ホスホニウム塩、金属フッ化物、溶媒等)の総量を100質量%として、反応系中に含まれる水分の合計量を意味する。また、系中の水分量を調整するため、反応系中に水を添加することも可能である。なお、本開示において、系中の水分量は、カールフィッシャー水分計により測定する。 In the production method of the first aspect of the present disclosure, the amount of water in the system depends on the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1). From the viewpoint of rate, etc., it is preferably 700 mass ppm or less, more preferably 0.1 to 650 mass ppm, still more preferably 1 to 600 mass ppm, and particularly preferably 10 to 500 mass ppm. The amount of water in the system is contained in the reaction system, with the total amount of the reagents used in the reaction (the compound represented by the general formula (2), phosphonium salt, metal fluoride, solvent, etc.) being 100% by mass. means the total amount of water. Also, water can be added to the reaction system to adjust the amount of water in the system. In the present disclosure, the water content in the system is measured with a Karl Fischer moisture meter.
 反応終了後は、必要に応じて常法にしたがって精製処理を行い、一般式(1)で表される化合物を得ることができる。 After completion of the reaction, the compound represented by the general formula (1) can be obtained by performing a purification treatment according to a conventional method as necessary.
 (1-10)目的化合物(一般式(1))
 このようにして生成される目的化合物は、一般式(1):
(1-10) Target compound (general formula (1))
The target compound thus produced has the general formula (1):
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは1~6の整数を示す。n1は1~6の整数を示す。ただし、n≧n1であり、且つ、nが2~6の整数である場合、n1は2~6の整数を示す。]
で表される化合物である。
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 1-6. n1 represents an integer of 1-6. However, when n≧n1 and n is an integer of 2-6, n1 represents an integer of 2-6. ]
It is a compound represented by
 一般式(1)において、R、X及びnは前記したとおりである。ただし、一般式(1)におけるXの数がn-n1個であるため、必然的にn≧n1である。また、nが2以上の整数である場合は2個以上のXがフッ素化されることが好ましいため、nが2~6の整数である場合、n1は2~6の整数を示す。 In general formula (1), R 1 , X 1 and n are as described above. However, since the number of X 1 in general formula (1) is nn1, n≧n1 is necessarily satisfied. Also, when n is an integer of 2 or more, it is preferable that two or more X 1 are fluorinated.
 つまり、本開示で生成される目的化合物である一般式(1)で表される化合物は、具体的には、 Specifically, the compound represented by general formula (1), which is the target compound produced in the present disclosure, is specifically
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
等が挙げられる。 etc.
 2.フッ素含有芳香族化合物の製造方法(その2)
 本開示の第2の態様に係る製造方法は、一般式(1A):
2. Method for producing fluorine-containing aromatic compound (Part 2)
The production method according to the second aspect of the present disclosure comprises general formula (1A):
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは3~6の整数を示す。n1は2~6の整数を示す。ただし、n≧n1である。]
で表される化合物の製造方法であって、
アルキル基を1個以上有するホスホニウム塩の存在下に、
一般式(2A):
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 3-6. n1 represents an integer of 2-6. However, n≧n1. ]
A method for producing a compound represented by
In the presence of a phosphonium salt having one or more alkyl groups,
General formula (2A):
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
[式中、R、X及びnは前記に同じである。]
で表される化合物と、
金属フッ化物とを反応させ、2個以上のXをフッ素化させて、上記一般式(1A)で表される化合物を生成させる工程
を備える。
[In the formula, R 1 , X 1 and n are the same as above. ]
A compound represented by
A step of reacting with a metal fluoride to fluorinate two or more X1 's to produce a compound represented by the general formula (1A).
 (2-1)出発化合物(一般式(2A))
 本開示の第2の態様において、一般式(2A)で表される化合物は、一般式(2A):
(2-1) starting compound (general formula (2A))
In the second aspect of the present disclosure, the compound represented by general formula (2A) has general formula (2A):
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは3~6の整数を示す。]
で表される化合物である。
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 3-6. ]
It is a compound represented by
 一般式(2A)において、Rで示される炭化水素基及びパーフルオロアルキル基、Xで示されるフッ素原子以外のハロゲン原子としては、上記「(1-1)出発化合物(一般式(2))」におけるRで示される炭化水素基及びパーフルオロアルキル基、Xで示されるフッ素原子以外のハロゲン原子の説明を採用できる。好ましい種類及び具体例も同様である。 In general formula (2A), the hydrocarbon group and perfluoroalkyl group represented by R 1 and the halogen atom other than the fluorine atom represented by X 1 include the above "(1-1) starting compound (general formula (2) )” can be adopted for the hydrocarbon group and perfluoroalkyl group represented by R 1 and the halogen atom other than the fluorine atom represented by X 1 . Preferred types and specific examples are also the same.
 一般式(2A)において、Xの置換数であるnは、反応の転化率、一般式(1A)で表される化合物の選択率、一般式(1A)で表される化合物の収率等の観点から、3~6であり、4~6、5~6等とすることもできる。 In the general formula (2A), n, which is the number of substitutions of X 1 , is the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1A), the yield of the compound represented by the general formula (1A), etc. from the point of view, it is 3 to 6, and may be 4 to 6, 5 to 6, and the like.
 上記のような条件を満たす一般式(2A)で表される化合物としては、具体的には、 Specifically, as a compound represented by general formula (2A) that satisfies the above conditions,
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
等が挙げられる。 etc.
 (2-2)反応、ホスホニウム塩、金属フッ化物、溶媒、反応温度、反応時間、反応圧力及び反応の例示
 本開示の第2の態様における反応は、上記「(1-2)反応」の説明を採用できる。
(2-2) Reaction, Phosphonium Salt, Metal Fluoride, Solvent, Reaction Temperature, Reaction Time, Reaction Pressure and Exemplification of Reaction can be adopted.
 本開示の第2の態様において、ホスホニウム塩は、上記「(1-3)ホスホニウム塩」の説明を採用できる。好ましい種類及び具体例も同様である。 In the second aspect of the present disclosure, the phosphonium salt can adopt the description of "(1-3) phosphonium salt" above. Preferred types and specific examples are also the same.
 本開示の第2の態様において、金属フッ化物は、上記「(1-4)金属フッ化物」の説明を採用できる。好ましい種類及び具体例も同様である。 In the second aspect of the present disclosure, the metal fluoride can adopt the description of "(1-4) metal fluoride" above. Preferred types and specific examples are also the same.
 本開示の第2の態様において、溶媒は、上記「(2-2)溶媒」の説明を採用できる。好ましい種類及び具体例も同様である。 In the second aspect of the present disclosure, the solvent can adopt the description of "(2-2) Solvent" above. Preferred types and specific examples are also the same.
 本開示の第2の態様において、反応温度は、上記「(1-6)反応温度」の説明を採用できる。好ましい範囲も同様である。 In the second aspect of the present disclosure, the reaction temperature can adopt the description of "(1-6) Reaction temperature" above. A preferable range is also the same.
 本開示の第2の態様において、反応時間は、上記「(1-7)反応時間」の説明を採用できる。好ましい範囲も同様である。 In the second aspect of the present disclosure, the reaction time can adopt the description of "(1-7) reaction time" above. A preferable range is also the same.
 本開示の第2の態様において、反応圧力は、上記「(1-8)反応圧力」の説明を採用できる。好ましい種類及び具体例も同様である。 In the second aspect of the present disclosure, the reaction pressure can adopt the description of "(1-8) Reaction pressure" above. Preferred types and specific examples are also the same.
 本開示の第2の態様において、反応の例示は、上記「(1-9)反応の例示」の説明を採用できる。好ましい種類及び具体例も同様である。 In the second aspect of the present disclosure, examples of reactions can adopt the description of "(1-9) Examples of reactions" above. Preferred types and specific examples are also the same.
 (2-3)溶媒
 本開示の第2の態様における製造方法で使用する溶媒としては、特に制限されないが、特に、一般式(2A)で表される化合物、ホスホニウム塩、金属フッ化物等を溶解させ、また、反応の転化率、一般式(1A)で表される化合物の選択率、一般式(1A)で表される化合物の収率等に優れる観点から極性有機溶媒が好ましい。また、一般式(2A)で表される化合物、ホスホニウム塩、金属フッ化物等を溶解させ、また、反応の転化率、一般式(1A)で表される化合物の選択率、一般式(1A)で表される化合物の収率等に優れる観点から、窒素含有有機化合物を含む溶媒、好ましくは窒素含有極性溶媒がより好ましい。このような溶媒としては、例えば、アミド化合物(N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジイソプロピルホルムアミド、N-メチル-2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、1,3-ジメチル-3,4,5,6-テトラヒドロピリミジノン、ヘキサメチルリン酸トリアミド等)、アミン化合物(トリエチルアミン、1-メチルピロリジン等)、ピリジン化合物(ピリジン、メチルピリジン等)、キノリン化合物(キノリン、メチルキノリン等)等が挙げられる。なかでも、反応の転化率、一般式(1A)で表される化合物の選択率、一般式(1A)で表される化合物の収率等の観点から、アミド化合物、ピリジン化合物等が好ましく、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジイソプロピルホルムアミド、N-メチル-2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、1,3-ジメチル-3,4,5,6-テトラヒドロピリミジノン、ヘキサメチルリン酸トリアミド、ピリジン、メチルピリジン等がより好ましく、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジイソプロピルホルムアミド、N-メチル-2-ピロリドン、ピリジン等がさらに好ましく、N,N-ジメチルホルムアミド、N-メチル-2-ピロリドン、ピリジン等が特に好ましい。
(2-3) Solvent The solvent used in the production method in the second aspect of the present disclosure is not particularly limited, but in particular, the compound represented by the general formula (2A), phosphonium salt, metal fluoride, etc. are dissolved. In addition, a polar organic solvent is preferable from the viewpoint of excellent conversion of the reaction, selectivity of the compound represented by the general formula (1A), yield of the compound represented by the general formula (1A), and the like. Further, the compound represented by the general formula (2A), a phosphonium salt, a metal fluoride, etc. are dissolved, and the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1A), the general formula (1A) A solvent containing a nitrogen-containing organic compound, preferably a nitrogen-containing polar solvent, is more preferable from the viewpoint of excellent yield of the compound represented by. Examples of such solvents include amide compounds (N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,4,5,6-tetrahydropyrimidinone, hexamethylphosphoric triamide, etc.), amine compounds (triethylamine, 1-methylpyrrolidine, etc.), pyridine compounds (pyridine, methylpyridine, etc.), quinoline compounds (quinoline, methylquinoline, etc.), and the like. Among them, amide compounds, pyridine compounds and the like are preferable from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1A), the yield of the compound represented by the general formula (1A), and the like. , N-dimethylformamide, N,N-diethylformamide, N,N-diisopropylformamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3,4, More preferred are 5,6-tetrahydropyrimidinone, hexamethylphosphoric acid triamide, pyridine, methylpyridine and the like, N,N-dimethylformamide, N,N-diethylformamide, N,N-diisopropylformamide, N-methyl-2 -pyrrolidone, pyridine and the like are more preferred, and N,N-dimethylformamide, N-methyl-2-pyrrolidone, pyridine and the like are particularly preferred.
 これらの溶媒は、公知又は市販品を使用することができる。また、これらの溶媒は、単独で用いることもでき、2種以上を組合せて用いることもできる。 For these solvents, known or commercially available products can be used. Moreover, these solvents can be used alone or in combination of two or more.
 溶媒の使用量は、溶媒量であれば特に制限はなく、過剰量とすることができ、反応の転化率、一般式(1A)で表される化合物の選択率、一般式(1A)で表される化合物の収率等の観点から、一般式(2A)で表される化合物100質量部に対して、80~10000質量部が好ましく、100~1000質量部がより好ましく、150~800質量部がさらに好ましい。 The amount of solvent used is not particularly limited as long as it is the amount of solvent, and can be an excess amount. From the viewpoint of the yield of the compound represented by the general formula (2A), it is preferably 80 to 10000 parts by mass, more preferably 100 to 1000 parts by mass, and 150 to 800 parts by mass. is more preferred.
 (2-4)目的化合物(一般式(1A))
 このようにして生成される目的化合物は、一般式(1A):
(2-4) Target compound (general formula (1A))
The target compound thus produced has the general formula (1A):
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは3~6の整数を示す。n1は2~6の整数を示す。ただし、n≧n1である。]
で表される化合物である。
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 3-6. n1 represents an integer of 2-6. However, n≧n1. ]
It is a compound represented by
 一般式(1A)において、R、X及びn1は前記したとおりである。ただし、一般式(1)におけるXの数がn-n1個であるため、必然的にn≧n1である。 In general formula (1A), R 1 , X 1 and n1 are as described above. However, since the number of X 1 in general formula (1) is nn1, n≧n1 is necessarily satisfied.
 つまり、本開示で生成される目的化合物である一般式(1A)で表される化合物は、具体的には、 Specifically, the compound represented by general formula (1A), which is the target compound produced in the present disclosure, is specifically
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
等が挙げられる。 etc.
 3.フッ素含有芳香族化合物の製造方法(その3)
 本開示の第3の態様に係る製造方法は、一般式(1):
3. Method for producing fluorine-containing aromatic compound (Part 3)
The production method according to the third aspect of the present disclosure comprises general formula (1):
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
[式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは1~6の整数を示す。n1は1~6の整数を示す。ただし、n≧n1であり、且つ、nが2~6の整数である場合、n1は2~6の整数を示す。]
で表される化合物の製造方法であって、
炭素数3以上のアルキル基を1個以上有するホスホニウム塩の存在下に、
一般式(2):
[In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 1-6. n1 represents an integer of 1-6. However, when n≧n1 and n is an integer of 2-6, n1 represents an integer of 2-6. ]
A method for producing a compound represented by
In the presence of a phosphonium salt having one or more alkyl groups having 3 or more carbon atoms,
General formula (2):
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
[式中、R、X及びnは前記に同じである。]
で表される化合物と、
金属フッ化物とを反応させ、nが2以上の整数である場合は2個以上のXをフッ素化させて、上記一般式(1)で表される化合物を生成させる工程
を備える。
[In the formula, R 1 , X 1 and n are the same as above. ]
A compound represented by
A step of reacting with a metal fluoride and fluorinating two or more X 1 when n is an integer of 2 or more to produce a compound represented by the general formula (1).
 (3-1)出発化合物(一般式(2))、反応、金属フッ化物、溶媒、反応温度、反応時間、反応圧力及び目的化合物
 本開示の第3の態様において、出発化合物である一般式(2)で表される化合物は、上記「(1-1)出発化合物(一般式(2))」の説明を採用できる。好ましい種類及び具体例も同様である。
(3-1) Starting compound (general formula (2)), reaction, metal fluoride, solvent, reaction temperature, reaction time, reaction pressure and target compound In the third aspect of the present disclosure, the starting compound of the general formula ( For the compound represented by 2), the description of the above “(1-1) starting compound (general formula (2))” can be adopted. Preferred types and specific examples are also the same.
 本開示の第3の態様における反応は、上記「(1-2)反応」の説明を採用できる。 For the reaction in the third aspect of the present disclosure, the explanation of "(1-2) reaction" above can be adopted.
 本開示の第3の態様において、金属フッ化物は、上記「(1-4)金属フッ化物」の説明を採用できる。好ましい種類及び具体例も同様である。 In the third aspect of the present disclosure, the metal fluoride can adopt the description of "(1-4) metal fluoride" above. Preferred types and specific examples are also the same.
 本開示の第3の態様において、溶媒は、上記「(2-3)溶媒」の説明を採用できる。好ましい種類及び具体例も同様である。 In the third aspect of the present disclosure, the solvent can adopt the description of "(2-3) solvent" above. Preferred types and specific examples are also the same.
 本開示の第3の態様において、反応温度は、上記「(1-6)反応温度」の説明を採用できる。好ましい範囲も同様である。 In the third aspect of the present disclosure, the reaction temperature can adopt the description of "(1-6) Reaction temperature" above. A preferable range is also the same.
 本開示の第3の態様において、反応時間は、上記「(1-7)反応時間」の説明を採用できる。好ましい範囲も同様である。 In the third aspect of the present disclosure, the reaction time can adopt the description of "(1-7) reaction time" above. A preferable range is also the same.
 本開示の第3の態様において、反応圧力は、上記「(1-8)反応圧力」の説明を採用できる。好ましい種類及び具体例も同様である。 In the third aspect of the present disclosure, the reaction pressure can adopt the description of "(1-8) Reaction pressure" above. Preferred types and specific examples are also the same.
 本開示の第3の態様において、反応の例示は、上記「(1-9)反応の例示」の説明を採用できる。好ましい種類及び具体例も同様である。 In the third aspect of the present disclosure, examples of reactions can adopt the description of "(1-9) Examples of reactions" above. Preferred types and specific examples are also the same.
 本開示の第3の態様において、目的化合物である一般式(1)で表される化合物は、上記「(1-10)目的化合物(一般式(1))」の説明を採用できる。好ましい種類及び具体例も同様である。 In the third aspect of the present disclosure, the compound represented by general formula (1), which is the target compound, can adopt the description of "(1-10) target compound (general formula (1))" above. Preferred types and specific examples are also the same.
 (3-2)ホスホニウム塩
 本開示の第3の態様で使用するホスホニウム塩は、炭素数3以上のアルキル基を1個以上有するホスホニウム塩である。
(3-2) Phosphonium salt The phosphonium salt used in the third aspect of the present disclosure is a phosphonium salt having one or more alkyl groups with 3 or more carbon atoms.
 このホスホニウム塩は、例えば、一般式(3A): This phosphonium salt has, for example, general formula (3A):
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
[式中、R3a、R4a、R5a及びR6aは同一又は異なって、炭化水素基を示す。ただし、R3a、R4a、R5a及びR6aのうち少なくとも1つは炭素数3以上のアルキル基である。Yは対アニオンを示す。]
で表されるホスホニウム塩が挙げられる。
[In the formula, R 3a , R 4a , R 5a and R 6a are the same or different and represent a hydrocarbon group. However, at least one of R 3a , R 4a , R 5a and R 6a is an alkyl group having 3 or more carbon atoms. Y represents a counter anion. ]
Phosphonium salts represented by
 一般式(3A)において、R3a、R4a、R5a及びR6aで示される炭化水素基としては、上記したものが挙げられる。置換基の種類及び数も同様である。なお、R3a、R4a、R5a及びR6aは、中央部のリン原子とは炭素原子が結合する部位であることが好ましい。 In general formula (3A), the hydrocarbon groups represented by R 3a , R 4a , R 5a and R 6a include those mentioned above. The same applies to the type and number of substituents. It should be noted that R 3a , R 4a , R 5a and R 6a are preferably sites where carbon atoms are bonded to the central phosphorus atom.
 ただし、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、R3a、R4a、R5a及びR6aのうち少なくとも1つ(1つ、2つ、3つ又は4つ)は炭素数3以上のアルキル基である。 However, from the viewpoint of the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., R 3a , R 4a , R 5a and R 6a At least one of (1, 2, 3 or 4) is an alkyl group having 3 or more carbon atoms.
 また、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、R3a、R4a、R5a及びR6aとしては、アルキル基が好ましい。なかでも、R3a、R4a、R5a及びR6aのうち少なくとも1つ(1つ、2つ、3つ又は4つ)は炭素数3以上、好ましくは4~20、より好ましくは5~15のアルキル基である。特に、ホスホニウム塩が有するアルキル基の炭素数を多くすることで、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等を特に向上させ、不純物の生成量を特に低減することができる。 Further, from the viewpoint of the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc., R 3a , R 4a , R 5a and R 6a are alkyl groups is preferred. Among them, at least one (1, 2, 3 or 4) of R 3a , R 4a , R 5a and R 6a has 3 or more carbon atoms, preferably 4 to 20, more preferably 5 to 15 is an alkyl group of In particular, by increasing the number of carbon atoms in the alkyl group of the phosphonium salt, the selectivity of the compound represented by the general formula (1), the yield of the compound represented by the general formula (1), etc. are particularly improved, The production of impurities can be particularly reduced.
 一般式(3A)において、Yで示される対アニオンとしては、上記したものを採用できる。 As the counter anion represented by Y in the general formula (3A), those described above can be employed.
 以上のような条件を満たす一般式(3A)で表される化合物としては、具体的には、 Specifically, the compound represented by general formula (3A) that satisfies the above conditions is
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
等が挙げられる。 etc.
 これらのホスホニウム塩は、公知又は市販品を用いることができる。また、上記のホスホニウム塩は、単独で用いることもでき、2種以上を組合せて用いることもできる。 For these phosphonium salts, known or commercially available products can be used. Moreover, the above phosphonium salts can be used alone, or two or more of them can be used in combination.
 本開示の第3の態様における反応において、ホスホニウム塩の使用量は、特に制限されないが、反応の転化率、一般式(1)で表される化合物の選択率、一般式(1)で表される化合物の収率等の観点から、一般式(2)で表される化合物1モルに対して、0.01~10モルが好ましく、0.1~5モルがより好ましく、1~2.5モルがさらに好ましい。なお、ホスホニウム塩を複数使用する場合は、その合計量を上記範囲内となるように調整することが好ましい。 In the reaction in the third aspect of the present disclosure, the amount of the phosphonium salt used is not particularly limited, but the conversion rate of the reaction, the selectivity of the compound represented by the general formula (1), the general formula (1) From the viewpoint of the yield of the compound represented by the general formula (2), it is preferably 0.01 to 10 mol, more preferably 0.1 to 5 mol, 1 to 2.5 Molar is more preferred. When using a plurality of phosphonium salts, it is preferable to adjust the total amount within the above range.
 4.組成物(その1)
 以上のようにして、一般式(1)で表される化合物を得ることができるが、一般式(1)で表される化合物としてジフルオロベンゾトリフルオリドと、一般式(2)におけるXの一部のみがフッ素化された化合物としてクロロフルオロベンゾトリフルオリド、ブロモフルオロベンゾトリフルオリド及びヨードフルオロベンゾトリフルオリドよりなる群から選ばれる少なくとも1種のハロゲン化フルオロベンゾトリフルオリドとを含む組成物の形で得られることもある。
4. Composition (Part 1)
As described above, the compound represented by general formula (1) can be obtained. Difluorobenzotrifluoride and one of X 1 in general formula (2) in the form of a composition containing at least one halogenated fluorobenzotrifluoride selected from the group consisting of chlorofluorobenzotrifluoride, bromofluorobenzotrifluoride and iodofluorobenzotrifluoride as a partially fluorinated compound sometimes obtained.
 一般式(1)で表される化合物としてジフルオロベンゾトリフルオリドとしては、特に制限はないが、2,3-ジフルオロベンゾトリフルオリド、2,4-ジフルオロベンゾトリフルオリド、2,6-ジフルオロベンゾトリフルオリド等が挙げられる。これらジフルオロベンゾトリフルオリドは、単独で用いることもでき、2種以上を組合せて用いることもできる。 Difluorobenzotrifluoride as the compound represented by the general formula (1) is not particularly limited, but 2,3-difluorobenzotrifluoride, 2,4-difluorobenzotrifluoride, 2,6-difluorobenzotrifluoride etc. These difluorobenzotrifluorides can be used alone or in combination of two or more.
 一般式(2)におけるXの一部のみがフッ素化された化合物としてハロゲン化フルオロベンゾトリフルオリドとしては、特に制限はないが、2-クロロ-3-フルオロベンゾトリフルオリド、2-クロロ-4-フルオロベンゾトリフルオリド、2-クロロ-6-フルオロベンゾトリフルオリド、3-クロロ-2-フルオロベンゾトリフルオリド、4-クロロ-2-フルオロベンゾトリフルオリド、6-クロロ-2-フルオロベンゾトリフルオリド、2-ブロモ-3-フルオロベンゾトリフルオリド、2-ブロモ-4-フルオロベンゾトリフルオリド、2-ブロモ-6-フルオロベンゾトリフルオリド、3-ブロモ-2-フルオロベンゾトリフルオリド、4-ブロモ-2-フルオロベンゾトリフルオリド、6-ブロモ-2-フルオロベンゾトリフルオリド、2-ヨード-3-フルオロベンゾトリフルオリド、2-ヨード-4-フルオロベンゾトリフルオリド、2-ヨード-6-フルオロベンゾトリフルオリド、3-ヨード-2-フルオロベンゾトリフルオリド、4-ヨード-2-フルオロベンゾトリフルオリド、6-ヨード-2-フルオロベンゾトリフルオリド等が挙げられる。これらハロゲン化フルオロベンゾトリフルオリドは、単独で用いることもでき、2種以上を組合せて用いることもできる。 Halogenated fluorobenzotrifluoride as a compound in which only part of X 1 in general formula (2) is fluorinated is not particularly limited, but 2-chloro-3-fluorobenzotrifluoride, 2-chloro-4 -fluorobenzotrifluoride, 2-chloro-6-fluorobenzotrifluoride, 3-chloro-2-fluorobenzotrifluoride, 4-chloro-2-fluorobenzotrifluoride, 6-chloro-2-fluorobenzotrifluoride, 2-bromo-3-fluorobenzotrifluoride, 2-bromo-4-fluorobenzotrifluoride, 2-bromo-6-fluorobenzotrifluoride, 3-bromo-2-fluorobenzotrifluoride, 4-bromo-2- fluorobenzotrifluoride, 6-bromo-2-fluorobenzotrifluoride, 2-iodo-3-fluorobenzotrifluoride, 2-iodo-4-fluorobenzotrifluoride, 2-iodo-6-fluorobenzotrifluoride, 3 -iodo-2-fluorobenzotrifluoride, 4-iodo-2-fluorobenzotrifluoride, 6-iodo-2-fluorobenzotrifluoride and the like. These halogenated fluorobenzotrifluorides can be used alone or in combination of two or more.
 第1の態様に係る本開示の組成物の総量を100モル%として、ジフルオロベンゾトリフルオリドの含有量は60.0~99.9モル%であり、65.0~99.5モル%、70.0~99.0モル%、75.0~98.5モル%、80.0~98.0モル%、85.0~97.5モル%、90.0~97.0モル%等とすることも可能である。 Taking the total amount of the composition of the present disclosure according to the first aspect as 100 mol %, the content of difluorobenzotrifluoride is 60.0 to 99.9 mol %, 65.0 to 99.5 mol %, 70 .0 to 99.0 mol%, 75.0 to 98.5 mol%, 80.0 to 98.0 mol%, 85.0 to 97.5 mol%, 90.0 to 97.0 mol%, etc. It is also possible to
 また、第1の態様に係る本開示の組成物の総量を100モル%として、ハロゲン化フルオロベンゾトリフルオリドは0.1~40.0モル%であり、0.5~35.0モル%、1.0~30.0モル%、1.5~25.0モル%、2.0~20.0モル%、2.5~15.0モル%、3.0~10.0モル%等とすることも可能である。 Further, the total amount of the composition of the present disclosure according to the first aspect is 100 mol%, the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol%, 0.5 to 35.0 mol%, 1.0 to 30.0 mol%, 1.5 to 25.0 mol%, 2.0 to 20.0 mol%, 2.5 to 15.0 mol%, 3.0 to 10.0 mol%, etc. It is also possible to
 このような第1の態様に係る本開示の組成物は、有機合成用溶媒、農薬中間体、医薬中間体等の各種用途に有効利用できる。 The composition of the present disclosure according to such a first aspect can be effectively used for various applications such as organic synthesis solvents, agricultural chemical intermediates, and pharmaceutical intermediates.
 5.組成物(その2)
 以上のようにして、一般式(1)で表される化合物を得ることができるが、一般式(1)で表される化合物としてペンタフルオロベンゾトリフルオリドと、一般式(2)におけるXの一部のみがフッ素化された化合物としてクロロテトラフルオロベンゾトリフルオリド、ブロモテトラフルオロベンゾトリフルオリド、ヨードテトラフルオロベンゾトリフルオリド、ジクロロトリフルオロベンゾトリフルオリド、ジブロモトリフルオロベンゾトリフルオリド、ジヨードトリフルオロベンゾトリフルオリド、トリクロロジフルオロベンゾトリフルオリド、トリブロモジフルオロベンゾトリフルオリド、トリヨードジフルオロベンゾトリフルオリド、テトラクロロフルオロベンゾトリフルオリド、テトラブロモフルオロベンゾトリフルオリド、及びテトラヨードフルオロベンゾトリフルオリドよりなる群から選ばれる少なくとも1種のハロゲン化フルオロベンゾトリフルオリドとを含む組成物の形で得られることもある。
5. Composition (Part 2)
As described above, the compound represented by the general formula (1) can be obtained. Pentafluorobenzotrifluoride and X 1 in the general formula (2) Partially fluorinated compounds such as chlorotetrafluorobenzotrifluoride, bromotetrafluorobenzotrifluoride, iodotetrafluorobenzotrifluoride, dichlorotrifluorobenzotrifluoride, dibromotrifluorobenzotrifluoride, diiodotrifluorobenzo selected from the group consisting of trifluoride, trichlorodifluorobenzotrifluoride, tribromodifluorobenzotrifluoride, triiododifluorobenzotrifluoride, tetrachlorofluorobenzotrifluoride, tetrabromofluorobenzotrifluoride, and tetraiodofluorobenzotrifluoride It may also be obtained in the form of a composition comprising at least one halogenated fluorobenzotrifluoride.
 一般式(1)で表される化合物としてペンタフルオロベンゾトリフルオリドとしては、特に制限はないが、2,3,4,5,6-ペンタフルオロベンゾトリフルオリドが挙げられる。ペンタフルオロベンゾトリフルオリドは、単独で用いることもでき、2種以上を組合せて用いることもできる。 Pentafluorobenzotrifluoride as the compound represented by general formula (1) is not particularly limited, but includes 2,3,4,5,6-pentafluorobenzotrifluoride. Pentafluorobenzotrifluoride can be used alone or in combination of two or more.
 一般式(2)におけるXの一部のみがフッ素化された化合物としてハロゲン化フルオロベンゾトリフルオリドとしては、同位体をいずれも採用できる。ハロゲン化フルオロベンゾトリフルオリドは、単独で用いることもでき、2種以上を組合せて用いることもできる。 Any isotope can be employed as the halogenated fluorobenzotrifluoride as the compound in which only a part of X 1 in the general formula (2) is fluorinated. Halogenated fluorobenzotrifluorides can be used alone or in combination of two or more.
 第2の態様に係る本開示の組成物の総量を100モル%として、ペンタフルオロベンゾトリフルオリドの含有量は60.0~99.9モル%であり、65.0~99.5モル%、70.0~99.0モル%、75.0~98.5モル%、80.0~98.0モル%、85.0~97.5モル%、90.0~97.0モル%等とすることも可能である。 Taking the total amount of the composition of the present disclosure according to the second aspect as 100 mol%, the content of pentafluorobenzotrifluoride is 60.0 to 99.9 mol%, 65.0 to 99.5 mol%, 70.0 to 99.0 mol%, 75.0 to 98.5 mol%, 80.0 to 98.0 mol%, 85.0 to 97.5 mol%, 90.0 to 97.0 mol%, etc. It is also possible to
 また、第2の態様に係る本開示の組成物の総量を100モル%として、ハロゲン化フルオロベンゾトリフルオリドは0.1~40.0モル%であり、0.5~35.0モル%、1.0~30.0モル%、1.5~25.0モル%、2.0~20.0モル%、2.5~15.0モル%、3.0~10.0モル%等とすることも可能である。 Further, the total amount of the composition of the present disclosure according to the second aspect is 100 mol%, the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol%, 0.5 to 35.0 mol%, 1.0 to 30.0 mol%, 1.5 to 25.0 mol%, 2.0 to 20.0 mol%, 2.5 to 15.0 mol%, 3.0 to 10.0 mol%, etc. It is also possible to
 このような第2の態様に係る本開示の組成物は、エッチングガス、クリーニングガス等の各種用途に有効利用できる。 The composition of the present disclosure according to such a second aspect can be effectively used for various uses such as etching gas and cleaning gas.
 以上、本開示の実施形態を説明したが、特許請求の範囲の趣旨及び範囲から逸脱することなく、形態や詳細の多様な変更が可能である。 Although the embodiments of the present disclosure have been described above, various changes in form and details are possible without departing from the spirit and scope of the claims.
 以下に実施例を示し、本開示の特徴を明確にする。本開示はこれら実施例に限定されるものではない。 Examples are shown below to clarify the features of the present disclosure. The disclosure is not limited to these examples.
 なお、各実施例及び比較例において、水分量は、反応開始時において、カールフィッシャー水分計により測定した。 In addition, in each example and comparative example, the water content was measured with a Karl Fischer moisture meter at the start of the reaction.
 実施例1~7及び比較例1~3
 オートクレーブに、2,4-ジクロロベンゾトリフルオリド(1g,0.005mol)、フッ化カリウム(0.8g,0.014mol)、溶媒(N-メチル-2-ピロリドン(NMP)又はスルホラン)4.5mL、及び表1に示すホスホニウム塩(0.0014mol)を添加し、蓋をして200℃に加熱し24時間反応を進行させた。
Examples 1-7 and Comparative Examples 1-3
In an autoclave, 2,4-dichlorobenzotrifluoride (1 g, 0.005 mol), potassium fluoride (0.8 g, 0.014 mol), solvent (N-methyl-2-pyrrolidone (NMP) or sulfolane) 4.5 mL , and a phosphonium salt (0.0014 mol) shown in Table 1 were added, covered, heated to 200° C., and the reaction was allowed to proceed for 24 hours.
 反応終了後、ガスクロマトグラフィー、GCMS(ガスクロマトグラフィー質量分析法)にて質量分析を行い、NMR(核磁気共鳴)を用いて構造解析を行った。 After the reaction was completed, mass spectrometry was performed by gas chromatography and GCMS (gas chromatography mass spectrometry), and structural analysis was performed using NMR (nuclear magnetic resonance).
 質量分析及び構造解析の結果から、目的物として2,4-ジフルオロベンゾトリフルオリドが生成したことが確認できた。 From the results of mass spectrometry and structural analysis, it was confirmed that 2,4-difluorobenzotrifluoride was produced as the target product.
 結果を表1に示す。 The results are shown in Table 1.
 なお、表1において、使用したホスホニウム塩は、以下のとおりである。 The phosphonium salts used in Table 1 are as follows.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 また、表1において、生成物である2,4-2F-BTFは、2,4-ジフルオロベンゾトリフルオリドを意味し、2,4-Cl-F-BTFは、2-クロロ-4-フルオロベンゾトリフルオリド及び/又は4-クロロ-2-フルオロベンゾトリフルオリドを意味する。表1において、2,4-Cl-F-BTFの選択率は、2-クロロ-4-フルオロベンゾトリフルオリド及び4-クロロ-2-フルオロベンゾトリフルオリドの合計選択率を意味する。 In Table 1, the product 2,4-2F-BTF means 2,4-difluorobenzotrifluoride, and 2,4-Cl-F-BTF means 2-chloro-4-fluorobenzo It means trifluoride and/or 4-chloro-2-fluorobenzotrifluoride. In Table 1, selectivity for 2,4-Cl-F-BTF means total selectivity for 2-chloro-4-fluorobenzotrifluoride and 4-chloro-2-fluorobenzotrifluoride.
Figure JPOXMLDOC01-appb-T000032
Figure JPOXMLDOC01-appb-T000032
 実施例8~13
 2,4-ジクロロベンゾトリフルオリドの代わりに、表2~4に示す基質(0.005mol)及び表2~4に示すホスホニウム塩(0.0014mol)を用いた以外は、実施例1~7と同様に反応を行った。
Examples 8-13
Instead of 2,4-dichlorobenzotrifluoride, the substrates shown in Tables 2-4 (0.005 mol) and phosphonium salts shown in Tables 2-4 (0.0014 mol) were used, except that Examples 1-7 were used. A similar reaction was performed.
  質量分析及び構造解析の結果から、目的物としてジフルオロベンゾトリフルオリド又はペンタフルオロベンゾトリフルオリドが生成したことが確認できた。 From the results of mass spectrometry and structural analysis, it was confirmed that difluorobenzotrifluoride or pentafluorobenzotrifluoride was produced as the target product.
 結果を表2~4に示す。 The results are shown in Tables 2-4.
 また、表2~4において、基質である2,3-2Cl-BTFは、2,3-ジクロロベンゾトリフルオリドを意味し、2,6-2Cl-BTFは、2,6-ジクロロベンゾトリフルオリドを意味し、5Cl-BTFは、2,3,4,5,6-ペンタクロロベンゾトリフルオリドを意味する。 In Tables 2 to 4, the substrate 2,3-2Cl-BTF means 2,3-dichlorobenzotrifluoride, and 2,6-2Cl-BTF means 2,6-dichlorobenzotrifluoride. 5Cl-BTF means 2,3,4,5,6-pentachlorobenzotrifluoride.
 また、表2~4において、使用したホスホニウム塩は、以下のとおりである。 In addition, in Tables 2 to 4, the phosphonium salts used are as follows.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 また、表2~4において、生成物である2,3-2F-BTFは、2,3-ジフルオロベンゾトリフルオリドを意味し、2,3-Cl-F-BTFは、2-クロロ-3-フルオロベンゾトリフルオリド及び/又は3-クロロ-2-フルオロベンゾトリフルオリドを意味し、2,6-2F-BTFは、2,6-ジフルオロベンゾトリフルオリドを意味し、2,6-Cl-F-BTFは、2-クロロ-6-フルオロベンゾトリフルオリドを意味し、5F-BTFは、2,3,4,5,6-ペンタフルオロベンゾトリフルオリドを意味し、4F,1Cl-BTFは、クロロテトラフルオロベンゾトリフルオリド(同位体をいずれも含む)を意味し、3F,2Cl-BTFは、ジクロロトリフルオロベンゾトリフルオリド(同位体をいずれも含む)を意味し、2F,3Cl-BTFは、トリクロロジフルオロベンゾトリフルオリド(同位体をいずれも含む)を意味し、1F,4Cl-BTFは、テトラクロロフルオロベンゾトリフルオリド(同位体をいずれも含む)を意味する。なお、表2~4において、2,3-Cl-F-BTFの選択率は、2-クロロ-3-フルオロベンゾトリフルオリド及び3-クロロ-2-フルオロベンゾトリフルオリドの合計選択率を意味し、4F,1Cl-BTFの選択率は、クロロテトラフルオロベンゾトリフルオリドの同位体の合計選択率を意味し、3F,2Cl-BTFの選択率は、ジクロロトリフルオロベンゾトリフルオリドの同位体の合計選択率を意味し、2F,3Cl-BTFの選択率は、トリクロロジフルオロベンゾトリフルオリドの合計選択率を意味し、1F,4Cl-BTFの選択率は、テトラクロロフルオロベンゾトリフルオリドの合計選択率を意味する。 Further, in Tables 2 to 4, the product 2,3-2F-BTF means 2,3-difluorobenzotrifluoride, and 2,3-Cl-F-BTF means 2-chloro-3- means fluorobenzotrifluoride and/or 3-chloro-2-fluorobenzotrifluoride, 2,6-2F-BTF means 2,6-difluorobenzotrifluoride, 2,6-Cl-F- BTF means 2-chloro-6-fluorobenzotrifluoride, 5F-BTF means 2,3,4,5,6-pentafluorobenzotrifluoride, 4F,1Cl-BTF means chlorotetra means fluorobenzotrifluoride (including all isotopes), 3F,2Cl-BTF means dichlorotrifluorobenzotrifluoride (including all isotopes), 2F,3Cl-BTF means trichlorodifluoro 1F,4Cl-BTF means tetrachlorofluorobenzotrifluoride (including all isotopes). In Tables 2 to 4, the selectivity for 2,3-Cl-F-BTF means the total selectivity for 2-chloro-3-fluorobenzotrifluoride and 3-chloro-2-fluorobenzotrifluoride. , 4F,1Cl-BTF refers to the total isotopic selectivity of chlorotetrafluorobenzotrifluoride, and the selectivity of 3F,2Cl-BTF is the total isotopic selectivity of dichlorotrifluorobenzotrifluoride. selectivity for 2F,3Cl-BTF means total selectivity for trichlorodifluorobenzotrifluoride, selectivity for 1F,4Cl-BTF means total selectivity for tetrachlorofluorobenzotrifluoride. do.
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000036

Claims (10)

  1. 一般式(1):
    Figure JPOXMLDOC01-appb-C000001
    [式中、Rは水素原子、水酸基、フッ素原子、シアノ基、ニトロ基、炭化水素基又はパーフルオロアルキル基を示す。Xは同一又は異なって、フッ素原子以外のハロゲン原子を示す。nは1~6の整数を示す。n1は1~6の整数を示す。ただし、n≧n1であり、且つ、nが2~6の整数である場合、n1は2~6の整数を示す。]
    で表される化合物の製造方法であって、
    窒素含有有機化合物を含む溶媒中で、
    アルキル基を1個以上有するホスホニウム塩の存在下に、
    一般式(2):
    Figure JPOXMLDOC01-appb-C000002
    [式中、R、X及びnは前記に同じである。]
    で表される化合物と、
    金属フッ化物とを反応させ、nが2以上の整数である場合は2個以上のXをフッ素化させて、上記一般式(1)で表される化合物を生成させる工程
    を備える、製造方法。
    General formula (1):
    Figure JPOXMLDOC01-appb-C000001
    [In the formula, R 1 represents a hydrogen atom, a hydroxyl group, a fluorine atom, a cyano group, a nitro group, a hydrocarbon group or a perfluoroalkyl group. X 1 is the same or different and represents a halogen atom other than a fluorine atom. n represents an integer of 1-6. n1 represents an integer of 1-6. However, when n≧n1 and n is an integer of 2-6, n1 represents an integer of 2-6. ]
    A method for producing a compound represented by
    in a solvent containing a nitrogen-containing organic compound,
    In the presence of a phosphonium salt having one or more alkyl groups,
    General formula (2):
    Figure JPOXMLDOC01-appb-C000002
    [In the formula, R 1 , X 1 and n are the same as above. ]
    A compound represented by
    A production method comprising a step of reacting with a metal fluoride and fluorinating two or more X 1 when n is an integer of 2 or more to produce a compound represented by the general formula (1). .
  2. 水分量が700質量ppm以下である系中で前記フッ素化を行う、請求項1に記載の製造方法。 2. The production method according to claim 1, wherein the fluorination is performed in a system having a water content of 700 ppm by mass or less.
  3. 前記nが3~6の整数である、請求項1又は2に記載の製造方法。 The production method according to claim 1 or 2, wherein said n is an integer of 3-6.
  4. 前記金属フッ化物が、アルカリ金属又はアルカリ土類金属のフッ化物である、請求項1~3のいずれか1項に記載の製造方法。 The production method according to any one of claims 1 to 3, wherein the metal fluoride is an alkali metal or alkaline earth metal fluoride.
  5. ジフルオロベンゾトリフルオリドと、クロロフルオロベンゾトリフルオリド、ブロモフルオロベンゾトリフルオリド及びヨードフルオロベンゾトリフルオリドよりなる群から選ばれる少なくとも1種のハロゲン化フルオロベンゾトリフルオリドとを含有する、組成物。 A composition comprising difluorobenzotrifluoride and at least one halogenated fluorobenzotrifluoride selected from the group consisting of chlorofluorobenzotrifluoride, bromofluorobenzotrifluoride and iodofluorobenzotrifluoride.
  6. 前記組成物の総量を100モル%として、前記ジフルオロベンゾトリフルオリドの含有量が60.0~99.9モル%であり、前記ハロゲン化フルオロベンゾトリフルオリドの含有量が0.1~40.0モル%である、請求項5に記載の組成物。 The content of the difluorobenzotrifluoride is 60.0 to 99.9 mol% and the content of the halogenated fluorobenzotrifluoride is 0.1 to 40.0 mol% based on the total amount of the composition being 100 mol%. 6. The composition of claim 5 in mol %.
  7. 有機合成用溶媒、農薬中間体又は医薬中間体として用いられる、請求項5又は6に記載の組成物。 7. The composition according to claim 5 or 6, which is used as a solvent for organic synthesis, an agricultural chemical intermediate or a pharmaceutical intermediate.
  8. ペンタフルオロベンゾトリフルオリドと、クロロテトラフルオロベンゾトリフルオリド、ブロモテトラフルオロベンゾトリフルオリド、ヨードテトラフルオロベンゾトリフルオリド、ジクロロトリフルオロベンゾトリフルオリド、ジブロモトリフルオロベンゾトリフルオリド、ジヨードトリフルオロベンゾトリフルオリド、トリクロロジフルオロベンゾトリフルオリド、トリブロモジフルオロベンゾトリフルオリド、トリヨードジフルオロベンゾトリフルオリド、テトラクロロフルオロベンゾトリフルオリド、テトラブロモフルオロベンゾトリフルオリド、及びテトラヨードフルオロベンゾトリフルオリドよりなる群から選ばれる少なくとも1種のハロゲン化フルオロベンゾトリフルオリドとを含有する、組成物。 pentafluorobenzotrifluoride, chlorotetrafluorobenzotrifluoride, bromotetrafluorobenzotrifluoride, iodotetrafluorobenzotrifluoride, dichlorotrifluorobenzotrifluoride, dibromotrifluorobenzotrifluoride, diiodotrifluorobenzotrifluoride, at least one selected from the group consisting of trichlorodifluorobenzotrifluoride, tribromodifluorobenzotrifluoride, triiododifluorobenzotrifluoride, tetrachlorofluorobenzotrifluoride, tetrabromofluorobenzotrifluoride, and tetraiodofluorobenzotrifluoride and a halogenated fluorobenzotrifluoride.
  9. 前記組成物の総量を100モル%として、前記ペンタフルオロベンゾトリフルオリドの含有量が60.0~99.9モル%であり、前記ハロゲン化フルオロベンゾトリフルオリドの含有量が0.1~40.0モル%である、請求項8に記載の組成物。 The content of the pentafluorobenzotrifluoride is 60.0 to 99.9 mol% and the content of the halogenated fluorobenzotrifluoride is 0.1 to 40.9 mol% based on the total amount of the composition being 100 mol%. 9. The composition of claim 8, which is 0 mol %.
  10. エッチングガス又はクリーニングガスとして用いられる、項8又は9に記載の組成物。 Item 10. The composition according to item 8 or 9, which is used as an etching gas or a cleaning gas.
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