WO2023056632A1 - Image sensor and electronic device - Google Patents

Image sensor and electronic device Download PDF

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Publication number
WO2023056632A1
WO2023056632A1 PCT/CN2021/122861 CN2021122861W WO2023056632A1 WO 2023056632 A1 WO2023056632 A1 WO 2023056632A1 CN 2021122861 W CN2021122861 W CN 2021122861W WO 2023056632 A1 WO2023056632 A1 WO 2023056632A1
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Prior art keywords
nano
image sensor
antenna
dielectric layer
pixel structure
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PCT/CN2021/122861
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French (fr)
Chinese (zh)
Inventor
文龙
陈沁�
刘永俊
杨亮
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华为技术有限公司
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Priority to PCT/CN2021/122861 priority Critical patent/WO2023056632A1/en
Priority to CN202180099862.2A priority patent/CN117561602A/en
Publication of WO2023056632A1 publication Critical patent/WO2023056632A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures

Definitions

  • the present application relates to the field of electronic technology, in particular to an image sensor and electronic equipment.
  • Image sensors which convert light signals into electrical signals, are one of the core parts of mobile phone cameras. Image sensors can take advantage of the particle nature of light, allowing photons to excite free electrons in semiconductors to generate electrical signals.
  • an image sensor in order to detect multiple colors of light, usually sets a corresponding color filter above the pixel structure, so that the pixel can only detect the light passed through the filter.
  • this will Most of the light is filtered out by the filter, reducing the photosensitivity.
  • the crosstalk problem will also increase with the size reduction, hindering the reduction of the pixel size.
  • Embodiments of the present application provide an image sensor and an electronic device.
  • the embodiment of the present application can increase the photosensitive intensity, maintain low crosstalk and wide photosensitive angle, and can also realize super-resolution small-sized pixels.
  • an embodiment of the present application provides an image sensor, including at least two pixel structures, the at least two pixel structures are respectively used to absorb two types of incident light with different characteristics, and each of the pixel structures includes a metal layer , a first dielectric layer and a first dielectric layer, the first dielectric layer is located on one side of the metal layer, and the first dielectric layer includes a photosensitive material.
  • the nano-antenna layer is located on the side of the first dielectric layer away from the metal layer, and the nano-antenna layer includes one or more nano-antennas, and each of the nano-antennas is used to absorb a waveband or a polarization incident light.
  • the thickness of the first medium layer is less than one-fifth of the minimum wavelength of the incident light absorbed by the pixel structure, and at least one side length of the pixel structure is less than the maximum wavelength of the incident light absorbed by the pixel structure. wavelength.
  • the nano-antenna layer can select incident light with different characteristics, and can enhance the absorption of incident light.
  • the first medium layer can photoelectrically convert incident light absorbed by the nano-antenna layer to output electrical signals.
  • the metal layer can enhance the absorption of incident light by the nano-antenna layer.
  • the photosensitive material of the embodiment of the present application can be used for photoelectric conversion.
  • the image sensor of the embodiment of the present application can absorb two kinds of incident light with different characteristics, and the thickness of the first medium layer is set to be less than one-fifth of the minimum wavelength of the incident light absorbed by the pixel structure, and the pixel structure
  • the length of at least one side of the nano-antenna is set to be smaller than the maximum wavelength of the absorbed light, so that the light-splitting effect of the nano-antenna can be realized, the photosensitive intensity can be increased, the crosstalk is kept low and the photosensitive angle is wide, and super-resolution small-sized pixels can also be realized. .
  • the two incident lights with different characteristics are incident lights with two different polarizations. Based on such a design, the image sensor can absorb incident light of different polarizations, thereby increasing the absorption rate of the incident light.
  • the one or more nano-antennas are dipole antennas, and the extension directions of the dipole antennas in the at least two pixel structures are different; or the one or more nano-antennas are For the helical antenna, the rotation directions of the helical antennas in the at least two pixel structures are different.
  • the nano-antennas can be used in various ways, and the antenna polarization directions of the nano-antennas in the two pixel structures are different, which can increase the absorption rate of light with different polarizations and improve the light utilization rate.
  • the two incident lights with different characteristics are incident lights of two different wavelength bands. Based on such a design, the image sensor can absorb incident light of different wavelength bands to increase the absorption rate of incident light.
  • the pixel structure further includes a second dielectric layer, the second dielectric layer is located between the nano-antenna layer and the first dielectric layer, and the second dielectric layer includes a non-photosensitive material .
  • the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer, and reduce the loss of light absorbed by the nano-antenna.
  • the thickness of the second dielectric layer is smaller than the thickness of the first dielectric layer. Based on such a design, the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer, and reduce the loss of light absorbed by the nano-antenna.
  • the thickness of the second dielectric layer is 10%-70% of the thickness of the first dielectric layer.
  • the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer, and reduce the loss of light absorbed by the nano-antenna.
  • the at least two pixel structures are adjacent.
  • the nano-antennas can be used in various ways, and the antenna polarization directions of the nano-antennas in two adjacent pixel structures are different, which can increase the absorption rate of light with different polarizations and improve the light utilization rate.
  • the image sensor further includes one or more first electrode lines, the one or more first electrode lines are in contact with the upper surface of the first dielectric layer, and the one or more The multiple first electrode lines are used to receive electrical signals output by the at least two pixel structures, and the electrical signals are used to obtain an image.
  • the output signals of each pixel structure can be transmitted through the electrode lines, so as to obtain the output of the image sensor.
  • the one or more first electrode lines are in contact with the upper surface of the first dielectric layer, and the first electrode lines are electrically connected to the nanoantennas in the same row or column.
  • the output signals of each pixel structure can be transmitted through the electrode lines, so as to obtain the output of the image sensor.
  • the first electrode wire is electrically connected to the center of the nano-antenna.
  • the first electrode wire in the embodiment of the present application may be integrally formed with the nano-antenna.
  • the output signal of each photosensitive pixel can be transmitted through the electrode line, so as to obtain the output of the image sensor.
  • the output signals of each pixel structure can be transmitted through the electrode lines, so as to obtain the output of the image sensor.
  • the image sensor further includes one or more second electrode lines, the one or more second electrode lines are in contact with the lower surface of the first dielectric layer, and the one or more second electrode lines are in contact with the lower surface of the first dielectric layer.
  • the multiple second electrode lines are used to receive electrical signals output by the at least two pixel structures, and the electrical signals are used to obtain an image.
  • the image sensor includes a plurality of pixel structure sets arranged periodically, and the pixel structure set includes the at least two pixel structures; at least one side length of the pixel structure set is less than or equal to the half of the minimum wavelength of incident light absorbed by the at least two pixel structures.
  • the pixel structures in the pixel structure set may include three pixel structures arranged in a line, and the three pixel structures are respectively three pixel structures for absorbing red light, green light and blue light.
  • the pixel structures in the pixel structure set may also include four pixel structures arranged in a square shape, and the four pixel structures may be used to absorb red light, green light, green light and blue light respectively.
  • an embodiment of the present application further provides an electronic device, where the electronic device includes the above-mentioned image sensor.
  • the image sensor of the embodiment of the present application can absorb two types of incident light with different characteristics, and the thickness of the first medium layer is set to be smaller than the incident light absorbed by the pixel structure One-fifth of the minimum wavelength of the pixel structure, and at least one side length of the pixel structure is set to be smaller than the maximum wavelength of the absorbed light, so that the light-splitting effect of the nano-antenna can be realized, the photosensitive intensity can be increased, and the crosstalk and The wider light-sensitive angle can also realize super-resolution small-size pixels.
  • the image sensor can realize high-efficiency ultra-thin light-sensing, and can support flexible, curved and other devices.
  • FIG. 1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application.
  • FIG. 2 is a schematic structural diagram of a camera provided by an embodiment of the present application.
  • FIG. 3 is a schematic structural diagram of an image sensor provided by an embodiment of the present application.
  • FIG. 4 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
  • FIG. 5 is another structural schematic diagram of an image sensor according to an embodiment of the present application.
  • FIG. 6 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
  • Fig. 7a and Fig. 7b are schematic structural diagrams of the nano-antenna according to the embodiment of the present application.
  • FIG. 8a and FIG. 8b are structural schematic diagrams of a pixel structure set according to an embodiment of the present application.
  • FIG. 9 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
  • FIG. 10 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
  • FIG. 11 is another structural schematic diagram of the nano-antenna according to the embodiment of the present application.
  • FIG. 12 is another structural schematic diagram of the nano-antenna according to the embodiment of the present application.
  • FIG. 13 is another structural schematic diagram of the nano-antenna according to the embodiment of the present application.
  • 14a-14c are application state diagrams of the image sensor of the embodiment of the present application.
  • Proximity light sensor 180G is Proximity light sensor 180G
  • Image sensors can take advantage of the particle nature of light, allowing photons to excite free electrons in semiconductors to generate electrical signals. It can be understood that in some scenarios, the pixels of the image sensor only detect the light transmitted by the filter, resulting in weak light sensitivity.
  • silicon nanowire antennas can be placed on the photosensitive layer of the image sensor, so that there is no need to set color filters above the pixel structure, because nanowires with different diameters There may be different resonant responses to light of different colors, whereby only light of the corresponding color is received.
  • silicon nanowire antenna due to the large aspect ratio of the silicon nanowire antenna, it is difficult to manufacture, and its large specific surface area causes extremely serious surface recombination effects, and the conversion efficiency of absorbed photons into electrons is usually low, resulting in low quantum efficiency and affecting Photosensitivity.
  • the image sensor can use the metasurface instead of the filter to adjust the phase of the incident light, so that the light of different colors is deflected to the pixel positions of different colors.
  • the metasurface since the metasurface is sensitive to the angle of the incident light, the angle difference is large, and the severe spatial crosstalk leads to a large change in the back-end demosaic algorithm, and multi-wavelength multiplexing will also lead to low light splitting efficiency.
  • the metasurface Both the light-splitting ability and the quality of the pixel depend on the arrangement of a sufficient number of phase structure units in space, and the pixel size cannot be too small.
  • the embodiments of the present application provide a pixel structure, an image sensor, and an electronic device.
  • the embodiments of the present application can effectively improve the light-sensing ability of the pixel, and can maintain low crosstalk and a wide light-sensing angle without introducing angle Problems such as deviation, crosstalk, and manufacturing difficulty are too great, and it is also possible to achieve super-resolution small-size pixels and improve product competitiveness.
  • the pixel structure provided by the embodiments of the present application can be applied to electronic devices with a camera function such as mobile phones, tablet computers, and wearable devices, and the embodiments of the present application do not impose any restrictions on the specific types of electronic devices.
  • FIG. 1 shows a schematic structural diagram of an electronic device 100 .
  • the electronic device 100 may include a processor 110, an external memory interface 120, an internal memory 121, a universal serial bus (universal serial bus, USB) interface 130, a charging management module 140, a power management module 141, a battery 142, an antenna 1, Antenna 2, mobile communication module 150, wireless communication module 160, audio module 170, speaker 170A, receiver 170B, microphone 170C, earphone jack 170D, sensor module 180, button 190, motor 191, indicator 192, camera 193, display screen 194 , and a subscriber identification module (subscriber identification module, SIM) card interface 195, etc.
  • SIM subscriber identification module
  • the sensor module 180 may include a pressure sensor 180A, a gyroscope sensor 180B, a pressure sensor 180C, a magnetic sensor 180D, an acceleration sensor 180E, a distance sensor 180F, a proximity light sensor 180G, a fingerprint sensor 180H, a temperature sensor 180J, a touch sensor 180K, an ambient light sensor 180L, bone conduction sensor 180M, and the like.
  • the structure illustrated in the embodiment of the present application does not constitute a specific limitation on the electronic device 100 .
  • the electronic device 100 may include more or fewer components than shown in the illustration, or combine some components, or separate some components, or arrange different components.
  • the illustrated components can be realized in hardware, software or a combination of software and hardware.
  • the processor 110 communicates with the camera 193 through a CSI interface to realize the shooting function of the electronic device 100 .
  • the electronic device 100 can realize the shooting function through the ISP, the camera 193 , the video codec, the GPU, the display screen 194 , and the application processor.
  • the ISP is used for processing the data fed back by the camera 193 .
  • the ISP when taking a picture, open the shutter, the light is transmitted to the photosensitive element of the camera through the lens, and the light signal is converted into an electrical signal, and the photosensitive element of the camera transmits the electrical signal to the ISP for processing, and converts it into an image visible to the naked eye.
  • ISP can also perform algorithm optimization on image noise, brightness, and skin color. ISP can also optimize the exposure, color temperature and other parameters of the shooting scene.
  • the ISP may be set in the camera 193 .
  • the camera 193 is used to capture still images or video.
  • the object generates an optical image through the lens and projects it to the photosensitive element.
  • the photosensitive element may be a charge coupled device (charge coupled device, CCD) or a complementary metal-oxide-semiconductor (complementary metal-oxide-semiconductor, CMOS) phototransistor.
  • CCD charge coupled device
  • CMOS complementary metal-oxide-semiconductor
  • the photosensitive element converts light signals into electrical signals, and then transmits the electrical signals to the ISP for conversion into digital image signals.
  • the ISP outputs the digital image signal to the DSP for processing.
  • the DSP converts digital image signals into image signals in standard RGB, YUV and other formats.
  • the electronic device 100 may include 1 or N cameras 193 , where N is a positive integer greater than 1.
  • the electronic device 100 may also be a detector, such as a spectral detector, which may be used for analyzing the material properties of an object, and the electronic device 100 may also include a photodetector, which is used for sensing the environment.
  • a detector such as a spectral detector, which may be used for analyzing the material properties of an object
  • a photodetector which is used for sensing the environment.
  • FIG. 2 is a schematic structural diagram of a camera 200 provided by an embodiment of the present application.
  • the camera 200 can be set in the electronic device 100 shown in FIG. 1 to realize the function of the camera 193 .
  • the camera 200 in this embodiment may include a lens 201, an aperture 202, an image sensor 203, an analog preprocessor 204, an analog-to-digital sensor 205, a digital signal processor 206, a system controller 207, a data bus 208, memory 209, display 210, etc.
  • the structure illustrated in the embodiment of the present application does not constitute a specific limitation on the camera 200 .
  • the camera 200 may include more or fewer components than shown in the illustration, or combine certain components, or separate certain components, or arrange different components.
  • the illustrated components can be realized in hardware, software or a combination of software and hardware.
  • the functions of the camera 200 include the functions of existing cameras, and are not limited to functions such as taking pictures or taking videos.
  • the lens 201 is a device for imaging an object on a sensor, and plays a role of light collection, and may be composed of several lenses.
  • the aperture 202 is a device for controlling the light passing through the lens to the sensor. In addition to controlling the amount of light passing through, the aperture 202 also has the function of controlling the depth of field. Depth of field refers to the front and rear distance range of the subject measured by imaging that can obtain clear images in front of the camera lens. The larger the aperture, the smaller the depth of field.
  • the image sensor 203 is a device for receiving light passing through the lens and converting these light signals into electrical signals.
  • the image sensor 203 is composed of a pixel structure integrated with a nano-antenna and a metal-dielectric-metal sensor.
  • the electrical signal generated by the image sensor 203 is an analog direct current signal
  • the analog preprocessor 204 performs preprocessing on the analog direct current signal, and the preprocessing includes noise reduction processing, correction processing, and compensation processing.
  • the analog-to-digital converter 205 is used to convert the preprocessed analog DC signal into a digital signal.
  • the digital signal is sent to the digital signal processor 206 for processing.
  • the system controller 207 controls the aperture 202 , the image sensor 203 , the analog pre-processor 204 and the analog-to-digital converter 205 .
  • the processed digital signal is transmitted to the memory 209 or the display 210 via the data bus 208 .
  • the storage 209 may be a photo storage such as a gallery of the electronic device 100 shown in FIG. 1
  • the display 210 may be the display screen 194 shown in FIG. 1 .
  • FIG. 3 is a schematic structural diagram of an image sensor according to an embodiment of the present application.
  • the image sensor may be the image sensor 203 in FIG. 2 , and may implement all functions of the image sensor 203 .
  • the image sensor 203 may be a pixel array, and may include multiple pixel structures, and the dotted lines represent pixel structures not shown. Since there is a nano-antenna layer in each pixel structure, the nano-antenna layer includes one or more nano-antennas, and the response of the nano-antenna to light may depend on the proportional relationship between the size of the nano-antenna and the wavelength of light.
  • each pixel structure does not need to set up a filter structure, relying on the selectivity of the nano-antenna to the light wavelength, it can realize the absorption of light of different colors. It can be seen that, if the image sensor includes nano-antennas of L sizes, the image sensor can absorb light of L different wavelengths, where L can be an integer greater than or equal to 3.
  • an antenna is a device that can convert alternating current and electromagnetic waves into each other, light can be regarded as electromagnetic waves, and a nanoantenna is an optical antenna at the nanometer scale.
  • the image sensor 203 may include at least two pixel structures 10 .
  • the at least two pixel structures can be used to absorb two types of incident light with different characteristics.
  • the at least two pixel structures 10 can be used to absorb incident light of different polarizations respectively.
  • the at least two pixel structures 10 may be used to absorb incident light of different wavelength bands respectively.
  • the pixel structure 10 in this embodiment may include a nano-antenna layer 12 , a first dielectric layer 14 and a metal layer 16 .
  • the nano-antenna layer 12 can be arranged on the top layer of the entire pixel structure 10, the metal layer 16 can be arranged on the bottom layer of the entire pixel structure 10, and the first dielectric layer 14 can be arranged on the middle layer of the entire pixel structure 10. , that is, the first dielectric layer 14 may be disposed between the nano-antenna layer 12 and the metal layer 16 .
  • the nano-antenna layer 12 can select incident light with different characteristics, and can enhance the absorption of incident light.
  • the first dielectric layer 14 may be located on one side of the metal layer 16, and the first dielectric layer 14 may include a photosensitive material for photoelectric conversion.
  • the first dielectric layer 14 can be made of photosensitive material, and the first dielectric layer 14 can convert the incident light absorbed by the nano-antenna layer 12 to photoelectric conversion to output an electrical signal.
  • the metal layer 16 can enhance the absorption of incident light by the nano-antenna layer 12 .
  • the plasmonic effect can refer to that in a solid system with a certain carrier concentration (such as a metal, a semiconductor with a certain carrier concentration, etc.), due to the Coulomb interaction between carriers , so that the fluctuation of the carrier concentration in one place in the space will cause the oscillation of the carrier concentration in other places.
  • This kind of meta-excitation which is characterized by the oscillation of carrier concentration, is called the plasmon effect.
  • the part of the incident light that resonates with the nano-antenna layer 12 is absorbed by the nano-antenna layer 12 and forms a plasmon signal on the surface, and the plasmon signal can pass through the
  • the first dielectric layer 14 converts electrical signals to be output through electrode lines.
  • the nano-antenna layer 12 may include one or more nano-antennas 121 .
  • each of the pixel structures 10 may include one or more nano-antennas 121 for resonating light of a specific wavelength or polarization to generate plasmon signals, and different pixel structures may resonate for different incident light , the difference may refer to a different wavelength band of incident light or a different resonance direction, the plasmon signal is used to convert into an electrical signal, and then the electrical signal may be output from the electrode line in contact with the pixel structure. It can be understood that if a nano-antenna 121 is set in a pixel structure 10, the nano-antenna 121 can be designed to be larger in size; 121 can be designed to be smaller in size.
  • the nano-antenna 121 may be made of a metal material, for example, the nano-antenna 121 may be any one of metal materials such as gold, silver, copper, and aluminum. It can be understood that the size of the nano-antenna 121 may correspond to a specific optical band, so that the nano-antenna 121 can absorb light of a wavelength within the optical band.
  • the first dielectric layer 14 includes a material capable of photoelectric conversion, for example, the first dielectric layer 14 may include a dielectric material with specific parameters. It can be understood that, in some implementation manners, the dielectric material may be silicon, indium gallium arsenic, or the like.
  • the metal layer 16 can be made of aluminum.
  • the metal layer 16 can also be made of noble metals such as gold, silver, platinum, etc., so as to have a better conductive effect.
  • the metal layer 16 between each pixel structure may not be connected.
  • the metal layers 16 of a column or a row of pixel structures may be connected together.
  • the first electrode lines 122 may be connected to each pixel structure 10 in the same column or row.
  • the second electrode lines 123 may be connected to each pixel structure 10 in the same column or row.
  • the first electrode lines 122 may be in contact with the upper surface of the first dielectric layer 12
  • the second electrode lines 123 may be in contact with the lower surface of the first dielectric layer 14 .
  • the first electrode lines 122 can transmit the electrical signals of the pixel structures in the same row or column to the image processing unit for image processing.
  • the second electrode lines 123 can transmit the electrical signals of the pixel structures in the same row or column to the image processing unit for image processing. This electrical signal is used to obtain an image. Therefore, in the embodiment of the present application, the output signals of each pixel structure can be transmitted through the first electrode lines 122 and the second electrode lines 123 , so as to obtain the output of the image sensor.
  • FIG. 5 is a schematic diagram of an image sensor provided by another embodiment of the present application.
  • the pixel structure 10 may further include a second dielectric layer 18, so The second dielectric layer 18 may be located between the first dielectric layer 14 and the nano-antenna layer 12 .
  • the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer 12 , and reduce the loss of light absorbed by the nano-antenna.
  • the second dielectric layer 18 may be thinner than the first dielectric layer 14, and the dielectric material of the second dielectric layer 18 may be different from that of the first dielectric layer 14.
  • the dielectric material that is, the second dielectric layer 18 may not have photosensitive ability, and in a possible implementation manner, the second dielectric layer 18 may be made of a non-photosensitive material.
  • the material of the second dielectric layer 18 may be silicon dioxide, and the thickness of the second dielectric layer may be 10%-70% of the first dielectric layer 14 .
  • each pixel structure may include more than two medium layers, wherein the lowest layer is the first medium layer 14 with a photosensitive function, and the remaining medium layers are non-photosensitive medium layers .
  • FIG. 6 is a schematic diagram of an image sensor provided by another embodiment of the present application.
  • each of the pixel structures may be a metal-dielectric-metal structure. It can be understood that the size of the nano-antenna in this embodiment may be positively correlated with the received light wavelength. Thus, the shape and size of the nano-antenna can be set according to the absorbed light wavelength band.
  • the image sensor in the embodiment of the present application will be described by taking three pixel structures 10 a , 10 b , and 10 c as examples.
  • the pixel structure 10a may include a nano-antenna layer 12a, a first dielectric layer 14a and a metal layer 16a.
  • the uppermost layer of the pixel structure 10a is the nano-antenna layer 12a
  • the middle layer of the pixel structure 10a is the first dielectric layer 14a
  • the lowermost layer of the pixel structure 10a is the metal layer 16a.
  • the length of the nano-antennas in the nano-antenna layer 12a can be the first length, therefore, the nano-antenna layer 12a can receive incident light with a light wavelength of ⁇ 1.
  • the pixel structure 10b may include a nano-antenna layer 12b, a first dielectric layer 14b and a metal layer 16b.
  • the uppermost layer of the pixel structure 10b is the nano-antenna layer 12b
  • the middle layer of the pixel structure 10b is the first dielectric layer 14b
  • the lowermost layer of the pixel structure 10b is the metal layer 16b.
  • the length of the nano-antenna in the nano-antenna layer 12b can be the second length, therefore, the nano-antenna layer 12b can receive incident light with a light wavelength of ⁇ 2.
  • the pixel structure 10c may include a nano-antenna layer 12c, a first dielectric layer 14c and a metal layer 16c.
  • the uppermost layer of the pixel structure 10c is the nano-antenna layer 12c
  • the middle layer of the pixel structure 10c is the first dielectric layer 14c
  • the lowermost layer of the pixel structure 10c is the metal layer 16c.
  • the length of the nano-antenna in the nano-antenna layer 12a can be the third length, therefore, the nano-antenna layer 12c can receive incident light with a light wavelength of ⁇ 3.
  • the nano-antenna layer 12a can receive 650nm red light. If the nano-antenna in the nano-antenna layer 12b has a length of 250nm, the nano-antenna layer 12b can receive 560nm green light. If the length of the nano-antenna in the nano-antenna layer 12c is 200nm, the nano-antenna layer 12b can receive 450nm blue light.
  • the incident light can be strongly coupled by the pixel structure of the embodiment of the present application. Since the nano-antenna can be selective to the light band, light of different colors can enter the corresponding pixel structure 10 for photoelectric conversion.
  • the metal-dielectric-metal structure in this embodiment can achieve a strong coupling effect, which can fully absorb incident light.
  • the incident light will be absorbed by the corresponding pixel structure of the resonant nano-antenna. Therefore, the photosensitive intensity of the image sensor in the embodiment of the present application is greatly improved. Under the scene, the photosensitive intensity of the image sensor in the embodiment of the present application can be increased by more than 100%.
  • the shape of the nanoantenna can have an effect on the width of the photosensitive band.
  • the bowtie-shaped nanoantenna shown in FIG. 7a can realize a wider photosensitive wavelength band than the stick-shaped nanoantenna shown in FIG. 7b. Therefore, when manufacturing the pixel structure, the nano-antenna can be filled with a transparent material (such as silicon dioxide), so that no air will remain around the nano-antenna, thereby making the structure more stable.
  • a transparent material such as silicon dioxide
  • the thickness of the first dielectric layer 14 in each pixel structure may be less than one-fifth of the wavelength of the light to be sensed, thereby achieving a stronger nanocoupling effect, That is, the absorption of light can be further enhanced.
  • different pixel structures may have the same thickness, that is, the thickness of the first dielectric layer 14 is less than one-fifth of the minimum wavelength of light sensitive to all pixel structures.
  • At least one side length of each pixel structure may be smaller than the maximum wavelength of light sensed by all the pixel structures, thereby realizing the light splitting effect of the pixel structures.
  • the side length of the pixel structure may refer to the width or length of the pixel structure.
  • the nanoantenna layer 12 of different wavelength bands can form a plasmon resonance mode, so that the incident light of the corresponding wavelength band can be locally coupled to the corresponding pixel area.
  • the size of the pixel structure in the embodiments of the present application can be very small.
  • the length of at least one side of the pixel structure can be smaller than the wavelength of light, thereby realizing super-diffraction and super-resolution Small pixel size.
  • the nano-antenna may include a material capable of generating plasmon signals with light, at least one nano-antenna is used to resonate with incident light to generate a plasmon signal, and the plasmon signal is used for Generate electrical signals. Therefore, in the embodiment of the present application, the resonance of the incident light can be realized through the plasmon effect of the smaller nano-antenna and the incident light, and the nano-antenna can absorb the incident light through resonance to improve the utilization of the incident light. efficiency, and on the basis that the nano-antenna absorbs more incident light, it can reduce the crosstalk of incident light in each band.
  • the image sensor 203 may include a plurality of pixel structure sets arranged periodically.
  • the set of pixel structures may include at least two pixel structures. It can be understood that the length of at least one side of the set of pixel structures is less than or equal to half of the minimum wavelength of incident light absorbed by the at least two pixel structures.
  • the pixel structure set 20 may include linearly arranged pixel structures 10a, 10b, 10c, and the pixel structures 10a, 10b, 10c may be used to absorb red light, green light and blue light respectively.
  • the wavelength of red light is 600 nanometers
  • the wavelength of green light is 500 nanometers
  • the wavelength of blue light is 400 nanometers.
  • the length of the pixel structure 10a may be d1
  • the length of the pixel structure 10b may be d2
  • the length of the pixel structure 10c may be d3
  • the widths of the pixel structures 10a, 10b, and 10c are all d4.
  • the length of the pixel structures 10a, 10b, 10c is d1+d2+d3, because the blue light sensitive to the pixel structures 10a, 10b, 10c is the minimum wavelength, that is, d1+d2+d3 ⁇ 100nm, and d4 ⁇ 100nm.
  • the set of pixel structures 20 may include pixel structures 10a, 10b, 10c, and 10d, and the pixel structures 10a, 10b, 10c, and 10d may be arranged in a "field" shape,
  • the pixel structures 10a, 10b, 10c, 10d can be used to absorb red light, green light, green light and blue light respectively.
  • the length of the pixel structure 10a may be d1, the length of the pixel structure 10b may be d2, the length of the pixel structure 10c may be d1, the length of the pixel structure 10d may be d2, and the width of the pixel structure 10a may be d3,
  • the width of the pixel structure 10b may be d4, the width of the pixel structure 10c may be d3, and the width of the pixel structure 10d may be d4, that is, d1+d2 ⁇ 100nm, and d3+d4 ⁇ 100nm.
  • a nano-antenna may be disposed on the pixel structure. In some other embodiments, for a pixel structure with a short photosensitive wavelength, since the size of the nano-antenna is also small, multiple nano-antennas may be arranged on the pixel structure.
  • the image sensor in the embodiment of the present application is described by taking four pixel structures 10 a , 10 b , 10 c , and 10 d as examples.
  • the pixel structure 10a may be provided with a nano-antenna 121a.
  • the pixel structure 10b may be provided with a nano-antenna 121b.
  • the pixel structure 10c may be provided with a nano-antenna 121c.
  • the pixel structure 10d may be provided with four nano-antennas 121d, 121e, 121f, 121g.
  • the size of the nano-antenna 121b may be the same as that of the nano-antenna 121c.
  • the size of the nano-antenna 121b and the nano-antenna 121c may be smaller than that of the nano-antenna 121a.
  • the dimensions of the nano-antennas 121d, 121e, 121f, and 121g may all be the same.
  • the nanoantennas 121d, 121e, 121f, 121g may be smaller in size than the nanoantenna 121b and the nanoantenna 121c. It can be understood that, in a possible implementation manner, when the pixel structure includes a nano-antenna, the pixel structure has a maximum photosensitive wavelength.
  • the connection between the electrode wire and the pixel structure can be achieved by fusing the electrode wire with the nano-antenna.
  • the first electrode line 122 can be in contact with the upper surface of the first dielectric layer 14, and the first electrode line 122 can be connected to the nano-antennas 121 in the same row or column. 122 may be electrically connected to the nano-antenna 121 .
  • the first electrode wire 122 may be electrically connected to the center of the nano-antenna 121 .
  • the first electrode wire 122 and the nano-antenna 121 may be integrally formed. It can be understood that, in an embodiment, the material of the first electrode wire 122 may be the same material as that of the nano-antenna 121 . In another embodiment, the first electrode line 122 may be a transparent electrode material.
  • the nano-antenna can have polarization resonance characteristics, and different antennas can sense different polarized light.
  • the polarization direction of the dipole antenna is linear polarization, which is consistent with the extension direction of the antenna
  • the polarization direction of the helical antenna is circular polarization.
  • the direction of polarization coincides with the direction of rotation of the antenna.
  • the absorption of the incident light by the nano-antenna will be improved.
  • the nano-antenna when the nano-antenna has a shape with polarization characteristics, the nano-antenna can detect the polarization characteristics of the incident light, that is, the shape of the nano-antenna can be determined according to the polarization characteristics of the incident light that needs to be absorbed. accomplish.
  • the nano-antenna can adopt a bow-tie shape antenna, that is, the nano-antenna is a dipole antenna, and the extension directions of the dipole antennas of the two pixel structures are different, and one of the pixel structures (for example, pixel structure 10a)
  • the polarization directions of the nanoantennas of the pixel structure 10a and the nanoantennas of another pixel structure (such as pixel structure 10b) are different, as shown in FIG.
  • the nano-antenna is a dipole antenna
  • the extension directions of the dipole antennas in two adjacent pixel structures are different.
  • the nano-antenna can be a helical antenna, and the rotation directions of the helical antennas in the two pixel structures are different.
  • the nanoantennas of the pixel structure 10a and the nanoantennas of the pixel structure 10a rotate in different directions.
  • the nanoantennas of the pixel structure 10a rotate clockwise, and the antennas of the pixel structure 10b rotate counterclockwise.
  • the nano-antenna is a helical antenna
  • the rotation directions of the helical antennas in two adjacent pixel structures are different.
  • the nano-antenna can adopt a square-shaped antenna or a circular-shaped antenna.
  • the pixel structure in this scenario has no polarization characteristics, and thus will not absorb incident light with polarization characteristics.
  • the image sensor 203 in the embodiment of the present application is described by taking four pixel structures 10a, 10b, 10c, and 10d as examples.
  • the pixel structure 10a in this scenario can resonate the incident light with transverse polarization, and the pixel structure 10a can absorb the incident light with transverse polarization.
  • the pixel structure 10b can generate resonance to the left obliquely polarized incident light, and the pixel structure 10b can absorb the left obliquely polarized incident light.
  • the pixel structure 10c can generate resonance to the longitudinally polarized incident light, and the pixel structure 10c can absorb the longitudinally polarized incident light.
  • the pixel structure 10d can generate resonance for the incident light with right oblique polarization, and the pixel structure 10d can absorb the incident light with right oblique polarization.
  • the image sensor in the embodiment of the present application is described by taking nine pixel structures 10a, 10b, 10c, 10d, 10e, 10f, 10g, 10h, and 10i as examples.
  • the pixel structure 10a can absorb red light
  • the pixel structure 10b can absorb purple light
  • the pixel structure 10c can absorb blue light
  • the pixel structure 10d can absorb transversely polarized red light
  • the pixel structure 10e can absorb vertically polarized green light
  • the pixel structure 10f can absorb transversely polarized green light
  • the pixel structure 10g can absorb transversely polarized orange light
  • the pixel structure 10h can absorb longitudinally polarized yellow light
  • the pixel Structure 10i can absorb longitudinally polarized green light.
  • FIG. 14c In a possible scenario, as shown in FIG. 14c , four pixel structures 10a, 10b, 10c, and 10d are taken as examples to illustrate the image sensor in the embodiment of the present application.
  • the pixel structure 10a can absorb green light with transverse polarization
  • the pixel structure 10b can absorb blue light with left oblique polarization
  • the pixel structure 10c can absorb red light with right oblique polarization
  • the pixel structure 10d can absorb Green light with longitudinal polarization.
  • the light-sensing ability of the pixel can be effectively improved through the light-splitting effect of the nano-antenna, and the light-sensing ability of the pixel can be effectively improved, and the crosstalk and wide light-sensing angle can be maintained without introducing angle deviation and crosstalk And problems such as too much difficulty in manufacturing.
  • the pixel structure can realize high-efficiency ultra-thin light-sensing, support flexible and curved devices, and improve product competitiveness.

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Abstract

Embodiments of the present application disclose an image sensor and an electronic device. The image sensor comprises at least two pixel structures, the at least two pixel structures being used to absorb two types of incident light having different characteristics, respectively. Each pixel structure comprises a metal layer, a first dielectric layer and a nano-antenna layer, the first dielectric layer being located at one side of the metal layer, the first dielectric layer comprises a photosensitive material, the nano-antenna layer the located at a side of the first dielectric layer distant from the metal layer, and a thickness of the first dielectric layer being less than one-fifth of the minimum wavelength of incident light in the wavelength band absorbed by the pixel structure. At least one side length of the pixel structure is smaller than the maximum wavelength of incident light absorbed by the pixel structure. Using embodiments of the present application, a light sensitivity of a pixel can be effectively increased. Furthermore, low crosstalk and wide photosensitive angle can be maintained, and a super-resolution small pixel can also be attained.

Description

图像传感器和电子设备Image Sensors and Electronics 技术领域technical field
本申请涉及电子技术领域,尤其涉及一种图像传感器和电子设备。The present application relates to the field of electronic technology, in particular to an image sensor and electronic equipment.
背景技术Background technique
图像传感器能够将光信号转换为电信号,是手机相机的核心部分之一。图像传感器可以利用光的粒子性,让光子激发半导体中的自由电子,从而产生电信号。Image sensors, which convert light signals into electrical signals, are one of the core parts of mobile phone cameras. Image sensors can take advantage of the particle nature of light, allowing photons to excite free electrons in semiconductors to generate electrical signals.
在一些场景下,例如图像传感器为了检测多种颜色的光,通常会在像素结构的上方设置对应的颜色滤片,从而使得该像素只会检测滤片所透过的光,然而,这样将会使得大部分的光被滤片所滤掉,降低了感光能力。此外串扰问题也会随着尺寸缩小而增大,阻碍像素尺寸的缩小。In some scenarios, for example, in order to detect multiple colors of light, an image sensor usually sets a corresponding color filter above the pixel structure, so that the pixel can only detect the light passed through the filter. However, this will Most of the light is filtered out by the filter, reducing the photosensitivity. In addition, the crosstalk problem will also increase with the size reduction, hindering the reduction of the pixel size.
发明内容Contents of the invention
本申请的实施例提供一种图像传感器和电子设备,本申请实施例可以增加感光强度,并且可以保持较低串扰和较广的感光角度,并且还可以实现超分辨率的小尺寸像素。Embodiments of the present application provide an image sensor and an electronic device. The embodiment of the present application can increase the photosensitive intensity, maintain low crosstalk and wide photosensitive angle, and can also realize super-resolution small-sized pixels.
第一方面,本申请的实施例提供一种图像传感器,包括至少两个像素结构,所述至少两个像素结构分别用于吸收两种不同特性的入射光,每个所述像素结构包括金属层、第一介质层和第一介质层,第一介质层位于所述金属层的一侧,所述第一介质层包括感光材料。所述纳米天线层位于所述第一介质层远离所述金属层的一侧,所述纳米天线层包括一个或多个纳米天线,每个所述纳米天线用于吸收一个波段或者一种偏振的入射光。其中,所述第一介质层的厚度小于所述像素结构所吸收的入射光的最小波长的五分之一,所述像素结构的至少一个边长小于所述像素结构所吸收的入射光的最大波长。其中,所述纳米天线层可以对不同特性的入射光进行选择,可以增强入射光的吸收。所述第一介质层可以将所述纳米天线层吸收的入射光进行光电转换,以输出电信号。所述金属层可以增强所述纳米天线层对入射光的吸收作用。本申请的实施例的所述感光材料可以用于进行光电转换。In the first aspect, an embodiment of the present application provides an image sensor, including at least two pixel structures, the at least two pixel structures are respectively used to absorb two types of incident light with different characteristics, and each of the pixel structures includes a metal layer , a first dielectric layer and a first dielectric layer, the first dielectric layer is located on one side of the metal layer, and the first dielectric layer includes a photosensitive material. The nano-antenna layer is located on the side of the first dielectric layer away from the metal layer, and the nano-antenna layer includes one or more nano-antennas, and each of the nano-antennas is used to absorb a waveband or a polarization incident light. Wherein, the thickness of the first medium layer is less than one-fifth of the minimum wavelength of the incident light absorbed by the pixel structure, and at least one side length of the pixel structure is less than the maximum wavelength of the incident light absorbed by the pixel structure. wavelength. Wherein, the nano-antenna layer can select incident light with different characteristics, and can enhance the absorption of incident light. The first medium layer can photoelectrically convert incident light absorbed by the nano-antenna layer to output electrical signals. The metal layer can enhance the absorption of incident light by the nano-antenna layer. The photosensitive material of the embodiment of the present application can be used for photoelectric conversion.
本申请的实施例的图像传感器可以吸收两种不同特性的入射光,并且将第一介质层的厚度设置为小于像素结构所吸收的入射光的最小波长的五分之一,并且还将像素结构的至少一个边长设置为小于所吸收光的最大波长,进而可以实现纳米天线的分光作用,可以增加感光强度,保持较低串扰和较广的感光角度,还可以实现超分辨率的小尺寸像素。The image sensor of the embodiment of the present application can absorb two kinds of incident light with different characteristics, and the thickness of the first medium layer is set to be less than one-fifth of the minimum wavelength of the incident light absorbed by the pixel structure, and the pixel structure The length of at least one side of the nano-antenna is set to be smaller than the maximum wavelength of the absorbed light, so that the light-splitting effect of the nano-antenna can be realized, the photosensitive intensity can be increased, the crosstalk is kept low and the photosensitive angle is wide, and super-resolution small-sized pixels can also be realized. .
在一种可能的设计中,所述两种不同特性的入射光为两种不同偏振的入射 光。基于这样的设计,所述图像传感器可以吸收不同偏振的入射光,提升入射光的吸收率。In a possible design, the two incident lights with different characteristics are incident lights with two different polarizations. Based on such a design, the image sensor can absorb incident light of different polarizations, thereby increasing the absorption rate of the incident light.
在一种可能的设计中,所述一个或多个纳米天线为偶极子天线,所述至少两个像素结构中的偶极子天线的延伸方向不同;或者所述一个或多个纳米天线为螺旋天线,所述至少两个像素结构中的螺旋天线的旋转方向不同。本申请的实施例中,纳米天线可以采用多种方式,且两个像素结构中纳米天线的天线偏振方向不相同,可以提高对不同偏振的光的吸收率,提高光利用率。In a possible design, the one or more nano-antennas are dipole antennas, and the extension directions of the dipole antennas in the at least two pixel structures are different; or the one or more nano-antennas are For the helical antenna, the rotation directions of the helical antennas in the at least two pixel structures are different. In the embodiments of the present application, the nano-antennas can be used in various ways, and the antenna polarization directions of the nano-antennas in the two pixel structures are different, which can increase the absorption rate of light with different polarizations and improve the light utilization rate.
在一种可能的设计中,所述两种不同特性的入射光为两个不同波段的入射光。基于这样的设计,所述图像传感器可以吸收不同波段的入射光,提升入射光的吸收率。In a possible design, the two incident lights with different characteristics are incident lights of two different wavelength bands. Based on such a design, the image sensor can absorb incident light of different wavelength bands to increase the absorption rate of incident light.
在一种可能的设计中所述像素结构还包括第二介质层,所述第二介质层位于所述纳米天线层与所述第一介质层之间,所述第二介质层包括非感光材料。基于这样的设计,本申请实施例可以增强感光强度,进一步增强所述纳米天线层对光的吸收率,并且降低纳米天线吸收光的损耗。In a possible design, the pixel structure further includes a second dielectric layer, the second dielectric layer is located between the nano-antenna layer and the first dielectric layer, and the second dielectric layer includes a non-photosensitive material . Based on such a design, the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer, and reduce the loss of light absorbed by the nano-antenna.
在一种可能的设计中,所述第二介质层的厚度小于所述第一介质层的厚度。基于这样的设计,本申请实施例可以增强感光强度,进一步增强所述纳米天线层对光的吸收率,并且可以降低纳米天线吸收光的损耗。In a possible design, the thickness of the second dielectric layer is smaller than the thickness of the first dielectric layer. Based on such a design, the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer, and reduce the loss of light absorbed by the nano-antenna.
在一种可能的设计中所述第二介质层的厚度为所述第一介质层的厚度的10%-70%。本申请实施例可以增强感光强度,进一步增强所述纳米天线层对光的吸收率,并且降低纳米天线吸收光的损耗。In a possible design, the thickness of the second dielectric layer is 10%-70% of the thickness of the first dielectric layer. The embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer, and reduce the loss of light absorbed by the nano-antenna.
在一种可能的设计中,所述至少两个像素结构相邻。本申请的实施例中,纳米天线可以采用多种方式,且相邻两个像素结构中纳米天线的天线偏振方向不相同,可以提高对不同偏振的光的吸收率,提高光利用率。In a possible design, the at least two pixel structures are adjacent. In the embodiments of the present application, the nano-antennas can be used in various ways, and the antenna polarization directions of the nano-antennas in two adjacent pixel structures are different, which can increase the absorption rate of light with different polarizations and improve the light utilization rate.
在一种可能的设计中,所述图像传感器还包括一个或多个第一电极线,所述一个或多个第一电极线与所述第一介质层的上表面相接触,所述一个或多个第一电极线用于接收所述至少两个像素结构输出的电信号,所述电信号用于得到图像。本申请实施方式中,可以通过电极线来传输各个像素结构的输出信号,从而得到图像传感器的输出。In a possible design, the image sensor further includes one or more first electrode lines, the one or more first electrode lines are in contact with the upper surface of the first dielectric layer, and the one or more The multiple first electrode lines are used to receive electrical signals output by the at least two pixel structures, and the electrical signals are used to obtain an image. In the embodiments of the present application, the output signals of each pixel structure can be transmitted through the electrode lines, so as to obtain the output of the image sensor.
在一种可能的设计中,所述一个或多个第一电极线与所述第一介质层的上表面接触,所述第一电极线电连接同一行或同一列的纳米天线。本申请实施方式中,可以通过电极线来传输各个像素结构的输出信号,从而得到图像传感器的输出。In a possible design, the one or more first electrode lines are in contact with the upper surface of the first dielectric layer, and the first electrode lines are electrically connected to the nanoantennas in the same row or column. In the embodiments of the present application, the output signals of each pixel structure can be transmitted through the electrode lines, so as to obtain the output of the image sensor.
在一种可能的设计中,所述第一电极线电连接于所述纳米天线的中心位置。本申请实施例中的所述第一电极线可以与所述纳米天线一体成型。本申请实施方式中,可以通过电极线来传输各个感光像素的输出信号,从而得到图像传感器的输出。本申请实施方式中,可以通过电极线来传输各个像素结构的输出信号,从而得到图像传感器的输出。In a possible design, the first electrode wire is electrically connected to the center of the nano-antenna. The first electrode wire in the embodiment of the present application may be integrally formed with the nano-antenna. In the embodiment of the present application, the output signal of each photosensitive pixel can be transmitted through the electrode line, so as to obtain the output of the image sensor. In the embodiments of the present application, the output signals of each pixel structure can be transmitted through the electrode lines, so as to obtain the output of the image sensor.
在一种可能的设计中,所述图像传感器还包括一个或多个第二电极线,所述一个或多个第二电极线与所述第一介质层的下表面相接触,所述一个或多个 第二电极线用于接收所述至少两个像素结构输出的电信号,所述电信号用于得到图像。In a possible design, the image sensor further includes one or more second electrode lines, the one or more second electrode lines are in contact with the lower surface of the first dielectric layer, and the one or more second electrode lines are in contact with the lower surface of the first dielectric layer. The multiple second electrode lines are used to receive electrical signals output by the at least two pixel structures, and the electrical signals are used to obtain an image.
在一种可能的设计中,所述图像传感器包括周期排列的多个像素结构集合,所述像素结构集合包括所述至少两个像素结构;所述像素结构集合的至少一个边长小于或等于所述至少两个像素结构所吸收的入射光的最小波长的一半。例如,该像素结构集合中的像素结构可以包括直线排列的三个像素结构,该三个像素结构分别是用于吸收红光、绿光和蓝光的三个像素结构。该像素结构集合中的像素结构还可以包括呈田字型排列的四个像素结构,该四个像素结构可以分别用于吸收红光、绿光、绿光和蓝光。In a possible design, the image sensor includes a plurality of pixel structure sets arranged periodically, and the pixel structure set includes the at least two pixel structures; at least one side length of the pixel structure set is less than or equal to the half of the minimum wavelength of incident light absorbed by the at least two pixel structures. For example, the pixel structures in the pixel structure set may include three pixel structures arranged in a line, and the three pixel structures are respectively three pixel structures for absorbing red light, green light and blue light. The pixel structures in the pixel structure set may also include four pixel structures arranged in a square shape, and the four pixel structures may be used to absorb red light, green light, green light and blue light respectively.
第二方面,本申请的实施例还提供一种电子设备,所述电子设备包括上述所述的图像传感器。In a second aspect, an embodiment of the present application further provides an electronic device, where the electronic device includes the above-mentioned image sensor.
采用本申请实施例的图像传感器和电子设备,本申请的实施例的图像传感器可以吸收两种不同特性的入射光,并且将第一介质层的厚度设置为小于所述像素结构所吸收的入射光的最小波长的五分之一,并且还将所述像素结构的至少一个边长设置为小于所吸收光的最大波长,进而可以实现纳米天线的分光作用,可以增加感光强度,保持较低串扰和较广的感光角度,还可以实现超分辨率的小尺寸像素。本申请实施例中,所述图像传感器可以实现高效率的超薄感光,可以支持柔性、弯曲等器件。Using the image sensor and electronic device of the embodiment of the present application, the image sensor of the embodiment of the present application can absorb two types of incident light with different characteristics, and the thickness of the first medium layer is set to be smaller than the incident light absorbed by the pixel structure One-fifth of the minimum wavelength of the pixel structure, and at least one side length of the pixel structure is set to be smaller than the maximum wavelength of the absorbed light, so that the light-splitting effect of the nano-antenna can be realized, the photosensitive intensity can be increased, and the crosstalk and The wider light-sensitive angle can also realize super-resolution small-size pixels. In the embodiment of the present application, the image sensor can realize high-efficiency ultra-thin light-sensing, and can support flexible, curved and other devices.
附图说明Description of drawings
图1是本申请实施例提供的一种电子设备的结构示意图。FIG. 1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application.
图2是本申请实施例提供的一种相机的结构示意图。FIG. 2 is a schematic structural diagram of a camera provided by an embodiment of the present application.
图3是本申请实施例提供的一种图像传感器的结构示意图。FIG. 3 is a schematic structural diagram of an image sensor provided by an embodiment of the present application.
图4是本申请实施例的图像传感器的另一结构示意图。FIG. 4 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
图5是本申请实施例的图像传感器的另一结构示意图。FIG. 5 is another structural schematic diagram of an image sensor according to an embodiment of the present application.
图6是本申请实施例的图像传感器的另一结构示意图。FIG. 6 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
图7a和图7b是本申请实施例的纳米天线的结构示意图。Fig. 7a and Fig. 7b are schematic structural diagrams of the nano-antenna according to the embodiment of the present application.
图8a和图8b是本申请实施例的像素结构集合的结构示意图。FIG. 8a and FIG. 8b are structural schematic diagrams of a pixel structure set according to an embodiment of the present application.
图9是本申请实施例的图像传感器的另一结构示意图。FIG. 9 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
图10是本申请实施例的图像传感器的另一结构示意图。FIG. 10 is another schematic structural diagram of an image sensor according to an embodiment of the present application.
图11为本申请实施例的纳米天线的另一结构示意图。FIG. 11 is another structural schematic diagram of the nano-antenna according to the embodiment of the present application.
图12为本申请实施例的纳米天线的另一结构示意图。FIG. 12 is another structural schematic diagram of the nano-antenna according to the embodiment of the present application.
图13为本申请实施例的纳米天线的另一结构示意图。FIG. 13 is another structural schematic diagram of the nano-antenna according to the embodiment of the present application.
图14a-14c是本申请实施例的图像传感器的应用状态图。14a-14c are application state diagrams of the image sensor of the embodiment of the present application.
主要元件符号说明Description of main component symbols
电子设备                           100Electronic equipment 100
处理器                             110Processor 110
外部存储器接口                    120 External Memory Interface 120
内部存储器                        121 Internal memory 121
USB接口                           130USB interface 130
充电管理模块                      140Charging Management Module 140
电源管理模块                      141Power Management Module 141
电池                              142Battery 142
天线                              1、2Antenna 1, 2
移动通信模块                      150 Mobile communication module 150
无线通信模块                      160Wireless communication module 160
音频模块                          170 Audio module 170
扬声器                            170A Speaker 170A
受话器                            170B Receiver 170B
麦克风                            170C Microphone 170C
耳机接口                          170D Headphone Jack 170D
传感器模块                        180Sensor Module 180
压力传感器                        180APressure sensor 180A
陀螺仪传感器                      180BGyro Sensor 180B
气压传感器                        180CBarometric pressure sensor
磁传感器                          180DMagnetic sensor 180D
加速度传感器                      180EAcceleration sensor 180E
距离传感器                        180FDistance sensor 180F
接近光传感器                      180GProximity light sensor 180G
指纹传感器                        180HFingerprint sensor 180H
温度传感器                        180JTemperature sensor 180J
触摸传感器                        180KTouch Sensor 180K
环境光传感器                      180LAmbient Light Sensor 180L
骨传导传感器                      180MBone conduction sensor 180M
按键                              190Buttons 190
马达                              191Motor 191
指示器                            192Indicators 192
摄像头                            193Camera 193
显示屏                            194Display Screen 194
SIM卡接口                         195 SIM card interface 195
相机                              200Camera 200
镜头                              201Lens 201
光圈                              202 Aperture 202
图像传感器                        203 Image sensor 203
模拟预处理器                      204 Analog Preprocessor 204
模数传感器                        205 Modulus sensor 205
数字信号处理器                      206Digital Signal Processor 206
系统控制器                          207System Controller 207
数据总线                            208Data bus 208
存储器                              209 Memory 209
显示器                              210 Display 210
像素结构                            10、10a、10b、10c、10d、10e、10f、 Pixel Structure 10, 10a, 10b, 10c, 10d, 10e, 10f,
                                    10g、10h、10i                                                                    
纳米天线层                          12、12a、12b、12c Nano antenna layer 12, 12a, 12b, 12c
纳米天线                            121、121b、121c、121d、121e、121f、 Nano Antennas 121, 121b, 121c, 121d, 121e, 121f,
                                    121g                                                             
第一电极线                          122The first electrode wire 122
第二电极线                          123 Second electrode wire 123
第一介质层                          14、14a、14b、14cThe first dielectric layer 14, 14a, 14b, 14c
金属层                              16、16a、16b、16c Metal layer 16, 16a, 16b, 16c
第二介质层                          18 Second Dielectric Layer 18
像素结构集合                        20Collection of Pixel Structures 20
如下具体实施方式将结合上述附图进一步详细说明本申请。The following specific embodiments will further describe the present application in detail in conjunction with the above-mentioned drawings.
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of them.
本申请实施例中,“第一”、“第二”等词汇,仅用于区别不同的对象,不能理解为指示或暗示相对重要性,也不能理解为指示或暗示顺序。例如,第一应用、第二应用等是用于区别不同的应用,而不是用于描述应用的特定顺序,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个该特征。在本申请实施例的描述中,“示例性的”或者“例如”等词用于表示作例子、例证或说明。在本申请实施例中被描述为“示例性的”或者“例如”的任何实施例或设计方案不应被解释为比其它实施例或设计方案更优选或更具优势。确切而言,使用“示例性的”或者“例如”等词旨在以具体方式呈现相关概念。In the embodiment of the present application, terms such as "first" and "second" are only used to distinguish different objects, and cannot be understood as indicating or implying relative importance, nor can they be understood as indicating or implying order. For example, the first application, the second application, etc. are used to distinguish different applications, rather than to describe the specific order of applications, and the features defined as "first" and "second" may explicitly or implicitly include one or More of this feature. In the description of the embodiments of the present application, words such as "exemplary" or "for example" are used as examples, illustrations or descriptions. Any embodiment or design solution described as "exemplary" or "for example" in the embodiments of the present application shall not be construed as being more preferred or more advantageous than other embodiments or design solutions. Rather, the use of words such as "exemplary" or "such as" is intended to present related concepts in a concrete manner.
随着电子工业的快速发展,多色图像传感器在消费产品和自动驾驶等领域应用越来越广泛。图像传感器可以利用光的粒子性,让光子激发半导体中的自由电子,从而产生电信号。可以理解,一些场景下的图像传感器的像素只会检测滤片所透过的光,导致其感光能力较弱。With the rapid development of the electronics industry, multi-color image sensors are increasingly used in consumer products and autonomous driving. Image sensors can take advantage of the particle nature of light, allowing photons to excite free electrons in semiconductors to generate electrical signals. It can be understood that in some scenarios, the pixels of the image sensor only detect the light transmitted by the filter, resulting in weak light sensitivity.
为了应对上述感光能力弱的情况,在一种可能的场景中,图像传感器的感光层的上面可以设置硅纳米线天线,这样不需要在像素结构的上方设置颜色滤 片,由于不同直径的纳米线对不同颜色的光可以有不同的谐振响应,由此只会接收对应颜色的光。上述场景中,由于硅纳米线天线的深宽比较大,制造难度高,而且其大比表面积造成极为严重的表面复合效应,吸收的光子转换为电子的效率通常较低,造成量子效率低,影响感光能力。In order to cope with the above-mentioned weak photosensitive ability, in a possible scenario, silicon nanowire antennas can be placed on the photosensitive layer of the image sensor, so that there is no need to set color filters above the pixel structure, because nanowires with different diameters There may be different resonant responses to light of different colors, whereby only light of the corresponding color is received. In the above scenario, due to the large aspect ratio of the silicon nanowire antenna, it is difficult to manufacture, and its large specific surface area causes extremely serious surface recombination effects, and the conversion efficiency of absorbed photons into electrons is usually low, resulting in low quantum efficiency and affecting Photosensitivity.
在另一种可能的场景下,图像传感器可以利用替代滤片的超表面对入射光进行相位调控,以使得不同颜色的光偏折到不同颜色的像素位置。上述场景中,由于超表面对于入射光的角度敏感,角度差异性较大,严重的空间串扰导致后端解马赛克算法改动大,并且多波长复用也将会导致分光效率较低,另外超表面的分光能力与质量均依赖于空间内足够数目相位结构单元的排布,像素尺寸不能太小。In another possible scenario, the image sensor can use the metasurface instead of the filter to adjust the phase of the incident light, so that the light of different colors is deflected to the pixel positions of different colors. In the above scenario, since the metasurface is sensitive to the angle of the incident light, the angle difference is large, and the severe spatial crosstalk leads to a large change in the back-end demosaic algorithm, and multi-wavelength multiplexing will also lead to low light splitting efficiency. In addition, the metasurface Both the light-splitting ability and the quality of the pixel depend on the arrangement of a sufficient number of phase structure units in space, and the pixel size cannot be too small.
为此,本申请的实施例提供一种像素结构、图像传感器和电子设备,本申请的实施例可以有效提高像素的感光能力,并且可以保持较低串扰和较广的感光角度,不会引入角度偏差、串扰以及制造难度太大等问题,并且还可以能实现超分辨率的小尺寸像素,提升产品竞争力。To this end, the embodiments of the present application provide a pixel structure, an image sensor, and an electronic device. The embodiments of the present application can effectively improve the light-sensing ability of the pixel, and can maintain low crosstalk and a wide light-sensing angle without introducing angle Problems such as deviation, crosstalk, and manufacturing difficulty are too great, and it is also possible to achieve super-resolution small-size pixels and improve product competitiveness.
可以理解,本申请实施例提供的像素结构可以应用手机、平板电脑、可穿戴设备等具有拍照功能的电子设备上,本申请实施例对电子设备的具体类型不作任何限制。It can be understood that the pixel structure provided by the embodiments of the present application can be applied to electronic devices with a camera function such as mobile phones, tablet computers, and wearable devices, and the embodiments of the present application do not impose any restrictions on the specific types of electronic devices.
示例性的,图1示出了电子设备100的结构示意图。Exemplarily, FIG. 1 shows a schematic structural diagram of an electronic device 100 .
所述电子设备100可以包括处理器110、外部存储器接口120、内部存储器121、通用串行总线(universal serial bus,USB)接口130、充电管理模块140、电源管理模块141、电池142、天线1、天线2、移动通信模块150、无线通信模块160、音频模块170、扬声器170A、受话器170B、麦克风170C、耳机接口170D、传感器模块180、按键190、马达191、指示器192、摄像头193、显示屏194、以及用户标识模块(subscriber identification module,SIM)卡接口195等。其中传感器模块180可以包括压力传感器180A、陀螺仪传感器180B、压传感器180C、磁传感器180D、加速度传感器180E、距离传感器180F、接近光传感器180G、指纹传感器180H、温度传感器180J、触摸传感器180K、环境光传感器180L、骨传导传感器180M等。The electronic device 100 may include a processor 110, an external memory interface 120, an internal memory 121, a universal serial bus (universal serial bus, USB) interface 130, a charging management module 140, a power management module 141, a battery 142, an antenna 1, Antenna 2, mobile communication module 150, wireless communication module 160, audio module 170, speaker 170A, receiver 170B, microphone 170C, earphone jack 170D, sensor module 180, button 190, motor 191, indicator 192, camera 193, display screen 194 , and a subscriber identification module (subscriber identification module, SIM) card interface 195, etc. The sensor module 180 may include a pressure sensor 180A, a gyroscope sensor 180B, a pressure sensor 180C, a magnetic sensor 180D, an acceleration sensor 180E, a distance sensor 180F, a proximity light sensor 180G, a fingerprint sensor 180H, a temperature sensor 180J, a touch sensor 180K, an ambient light sensor 180L, bone conduction sensor 180M, and the like.
可以理解的是,本申请实施例示意的结构并不构成对所述电子设备100的具体限定。在本申请另一些实施例中,所述电子设备100可以包括比图示更多或更少的部件,或者组合某些部件,或者拆分某些部件,或者不同的部件布置。图示的部件可以以硬件,软件或软件和硬件的组合实现。It can be understood that, the structure illustrated in the embodiment of the present application does not constitute a specific limitation on the electronic device 100 . In other embodiments of the present application, the electronic device 100 may include more or fewer components than shown in the illustration, or combine some components, or separate some components, or arrange different components. The illustrated components can be realized in hardware, software or a combination of software and hardware.
在一些实施例中,所述处理器110和所述摄像头193通过CSI接口通信,实现电子设备100的拍摄功能。所述电子设备100可以通过ISP、摄像头193、视频编解码器、GPU、显示屏194以及应用处理器等实现拍摄功能。ISP用于处理摄像头193反馈的数据。In some embodiments, the processor 110 communicates with the camera 193 through a CSI interface to realize the shooting function of the electronic device 100 . The electronic device 100 can realize the shooting function through the ISP, the camera 193 , the video codec, the GPU, the display screen 194 , and the application processor. The ISP is used for processing the data fed back by the camera 193 .
例如,拍照时,打开快门,光线通过镜头被传递到摄像头感光元件上,光信号转换为电信号,摄像头感光元件将所述电信号传递给ISP处理,转化为肉眼可见的图像。ISP还可以对图像的噪点,亮度,肤色进行算法优化。ISP还可 以对拍摄场景的曝光,色温等参数优化。在一些实施例中,所述ISP可以设置在所述摄像头193中。所述摄像头193用于捕获静态图像或视频。物体通过镜头生成光学图像投射到感光元件。For example, when taking a picture, open the shutter, the light is transmitted to the photosensitive element of the camera through the lens, and the light signal is converted into an electrical signal, and the photosensitive element of the camera transmits the electrical signal to the ISP for processing, and converts it into an image visible to the naked eye. ISP can also perform algorithm optimization on image noise, brightness, and skin color. ISP can also optimize the exposure, color temperature and other parameters of the shooting scene. In some embodiments, the ISP may be set in the camera 193 . The camera 193 is used to capture still images or video. The object generates an optical image through the lens and projects it to the photosensitive element.
可以理解,所述感光元件可以是电荷耦合器件(charge coupled device,CCD)或互补金属氧化物半导体(complementary metal-oxide-semiconductor,CMOS)光电晶体管。所述感光元件把光信号转换成电信号,之后将电信号传递给ISP转换成数字图像信号。所述ISP将数字图像信号输出到DSP加工处理。所述DSP将数字图像信号转换成标准的RGB,YUV等格式的图像信号。在一些实施例中,所述电子设备100可以包括1个或N个摄像头193,N为大于1的正整数。It can be understood that the photosensitive element may be a charge coupled device (charge coupled device, CCD) or a complementary metal-oxide-semiconductor (complementary metal-oxide-semiconductor, CMOS) phototransistor. The photosensitive element converts light signals into electrical signals, and then transmits the electrical signals to the ISP for conversion into digital image signals. The ISP outputs the digital image signal to the DSP for processing. The DSP converts digital image signals into image signals in standard RGB, YUV and other formats. In some embodiments, the electronic device 100 may include 1 or N cameras 193 , where N is a positive integer greater than 1.
可以理解,所述电子设备100还可以探测器,例如光谱探测器,可以用于物体材料特性的分析,电子设备100还可以包括光电探测器,用于对环境进行感光作用。It can be understood that the electronic device 100 may also be a detector, such as a spectral detector, which may be used for analyzing the material properties of an object, and the electronic device 100 may also include a photodetector, which is used for sensing the environment.
图2是本申请的一个实施例提供的一种相机200的结构示意图。所述相机200可以设置于图1所示的所述电子设备100中,以实现所述摄像头193的功能。可以理解,本实施例中的所述相机200可以包括镜头201、光圈202、图像传感器203、模拟预处理器204、模数传感器205、数字信号处理器206、系统控制器207、数据总线208、存储器209、显示器210等。可以理解,本申请实施例示意的结构并不构成对所述相机200的具体限定。在本申请的另一些实施例中,所述相机200可以包括比图示更多或更少的部件,或者组合某些部件,或者拆分某些部件,或者不同的部件布置。图示的部件可以以硬件,软件或软件和硬件的组合实现。FIG. 2 is a schematic structural diagram of a camera 200 provided by an embodiment of the present application. The camera 200 can be set in the electronic device 100 shown in FIG. 1 to realize the function of the camera 193 . It can be understood that the camera 200 in this embodiment may include a lens 201, an aperture 202, an image sensor 203, an analog preprocessor 204, an analog-to-digital sensor 205, a digital signal processor 206, a system controller 207, a data bus 208, memory 209, display 210, etc. It can be understood that the structure illustrated in the embodiment of the present application does not constitute a specific limitation on the camera 200 . In other embodiments of the present application, the camera 200 may include more or fewer components than shown in the illustration, or combine certain components, or separate certain components, or arrange different components. The illustrated components can be realized in hardware, software or a combination of software and hardware.
还应该理解,本申请实施例示意的结构并不构成对所述相机200的功能的具体限定。所述相机200的功能包括可以实现现有相机的功能,并不局限于拍照或拍视频等功能。所述镜头201是将拍摄物体在传感器上成像的器件,起到聚光的作用,可以由几片透镜组成。所述光圈202是控制通过镜头到达传感器的光线的装置,除了控制通光量,所述光圈202还有控制景深的功能。景深是指在相机镜头前能够取得清晰图像的成像所测得的被摄物体前后距离范围,其中,光圈越大,景深越小。所述图像传感器203是用来接收通过镜头的光线,并且将这些光信号转变为电信号的装置。It should also be understood that the structure illustrated in the embodiment of the present application does not constitute a specific limitation on the functions of the camera 200 . The functions of the camera 200 include the functions of existing cameras, and are not limited to functions such as taking pictures or taking videos. The lens 201 is a device for imaging an object on a sensor, and plays a role of light collection, and may be composed of several lenses. The aperture 202 is a device for controlling the light passing through the lens to the sensor. In addition to controlling the amount of light passing through, the aperture 202 also has the function of controlling the depth of field. Depth of field refers to the front and rear distance range of the subject measured by imaging that can obtain clear images in front of the camera lens. The larger the aperture, the smaller the depth of field. The image sensor 203 is a device for receiving light passing through the lens and converting these light signals into electrical signals.
在本申请实施例中,所述图像传感器203是由纳米天线和金属-介质-金属传感器集成的像素结构组成。所述图像传感器203生成的电信号为模拟直流电信号,所述模拟预处理器204将模拟直流电信号进行预处理,该预处理包括降噪处理、修正处理和补偿处理等。所述模数转换器205用于将预处理后的模拟直流电信号转变为数字信号。数字信号传入所述数字信号处理器206中进行处理。所述系统控制器207对所述光圈202、所述图像传感器203、所述模拟预处理器204和所述模数转换器205起控制作用。处理后的数字信号经数据总线208传输到所述存储器209或所述显示器210中。作为示例而非限定,该存储器209可以是图1所示的所述电子设备100的照片存储器例如图库等,所述显示器210可以是图1所示的显示屏194等。In the embodiment of the present application, the image sensor 203 is composed of a pixel structure integrated with a nano-antenna and a metal-dielectric-metal sensor. The electrical signal generated by the image sensor 203 is an analog direct current signal, and the analog preprocessor 204 performs preprocessing on the analog direct current signal, and the preprocessing includes noise reduction processing, correction processing, and compensation processing. The analog-to-digital converter 205 is used to convert the preprocessed analog DC signal into a digital signal. The digital signal is sent to the digital signal processor 206 for processing. The system controller 207 controls the aperture 202 , the image sensor 203 , the analog pre-processor 204 and the analog-to-digital converter 205 . The processed digital signal is transmitted to the memory 209 or the display 210 via the data bus 208 . As an example but not a limitation, the storage 209 may be a photo storage such as a gallery of the electronic device 100 shown in FIG. 1 , and the display 210 may be the display screen 194 shown in FIG. 1 .
图3是本申请的一个实施例的图像传感器的结构示意图。该图像传感器可以是图2中的图像传感器203,并且可以实现图像传感器203的一切功能。该图像传感器203可以是一个像素阵列,可以包括多个像素结构,虚线表示没有画出的像素结构。由于每个像素结构中具有纳米天线层,纳米天线层包括一个或多个纳米天线,该纳米天线对光的响应可以依赖于纳米天线尺寸和光波长的比例关系。FIG. 3 is a schematic structural diagram of an image sensor according to an embodiment of the present application. The image sensor may be the image sensor 203 in FIG. 2 , and may implement all functions of the image sensor 203 . The image sensor 203 may be a pixel array, and may include multiple pixel structures, and the dotted lines represent pixel structures not shown. Since there is a nano-antenna layer in each pixel structure, the nano-antenna layer includes one or more nano-antennas, and the response of the nano-antenna to light may depend on the proportional relationship between the size of the nano-antenna and the wavelength of light.
因此每个像素结构不需设置滤光结构,依靠纳米天线对光波长的选择性,即可实现对不同颜色的光的吸收。由此可知,该图像传感器中包含L种尺寸的纳米天线,则该图像传感器可以实现对L种不同波长的光的吸收,其中,L可以为大于或等于3的整数。Therefore, each pixel structure does not need to set up a filter structure, relying on the selectivity of the nano-antenna to the light wavelength, it can realize the absorption of light of different colors. It can be seen that, if the image sensor includes nano-antennas of L sizes, the image sensor can absorb light of L different wavelengths, where L can be an integer greater than or equal to 3.
可以理解,天线是一种可以将交流电和电磁波相互转换的器件,光可以被视为电磁波,纳米天线是纳米尺度的光学天线。It can be understood that an antenna is a device that can convert alternating current and electromagnetic waves into each other, light can be regarded as electromagnetic waves, and a nanoantenna is an optical antenna at the nanometer scale.
请参阅图4,图4为本申请的一个实施例提供的图像传感器的示意图。可以理解,所述图像传感器203可以包括至少两个像素结构10。其中,所述至少两个像素结构可以用于吸收两种不同特性的入射光。例如,该至少两个像素结构10可以分别用于吸收不同偏振的入射光。或者,所述至少两个像素结构10可以分别用于吸收不同波段的入射光。Please refer to FIG. 4 , which is a schematic diagram of an image sensor provided by an embodiment of the present application. It can be understood that the image sensor 203 may include at least two pixel structures 10 . Wherein, the at least two pixel structures can be used to absorb two types of incident light with different characteristics. For example, the at least two pixel structures 10 can be used to absorb incident light of different polarizations respectively. Alternatively, the at least two pixel structures 10 may be used to absorb incident light of different wavelength bands respectively.
具体到本申请的实现过程中,如图4所示,本实施例中的所述像素结构10可以包括纳米天线层12、第一介质层14和金属层16。Specifically in the implementation process of the present application, as shown in FIG. 4 , the pixel structure 10 in this embodiment may include a nano-antenna layer 12 , a first dielectric layer 14 and a metal layer 16 .
所述纳米天线层12可以设置在整个像素结构10的最上层,所述金属层16可以设置在整个像素结构10的最底层,所述第一介质层14可以设置在整个像素结构10的中间层,即所述第一介质层14可以设置在所述纳米天线层12与所述金属层16之间。The nano-antenna layer 12 can be arranged on the top layer of the entire pixel structure 10, the metal layer 16 can be arranged on the bottom layer of the entire pixel structure 10, and the first dielectric layer 14 can be arranged on the middle layer of the entire pixel structure 10. , that is, the first dielectric layer 14 may be disposed between the nano-antenna layer 12 and the metal layer 16 .
具体地,所述纳米天线层12可以对不同特性的入射光进行选择,可以增强入射光的吸收。所述第一介质层14可以位于所述金属层16的一侧,所述第一介质层14可以包括用于光电转换的感光材料,在一种可能的实现方式中,所述第一介质层14可以由感光材料制成,所述第一介质层14可以将所述纳米天线层12吸收的入射光进行光电转换,以输出电信号。所述金属层16可以增强所述纳米天线层12对入射光的吸收作用。Specifically, the nano-antenna layer 12 can select incident light with different characteristics, and can enhance the absorption of incident light. The first dielectric layer 14 may be located on one side of the metal layer 16, and the first dielectric layer 14 may include a photosensitive material for photoelectric conversion. In a possible implementation, the first dielectric layer 14 can be made of photosensitive material, and the first dielectric layer 14 can convert the incident light absorbed by the nano-antenna layer 12 to photoelectric conversion to output an electrical signal. The metal layer 16 can enhance the absorption of incident light by the nano-antenna layer 12 .
由于纳米天线表面的等离激元效应,对应波段的入射光可以在纳米天线附近很小的区域实现聚焦。可以理解,所述的等离激元效应可以是指在具有一定载流子浓度的固体系统中(如金属、具有一定载流子浓度的半导体等),由于载流子之间的库仑相互作用,使得空间中一处载流子浓度的涨落,引起其他地方载流子浓度的振荡。这种以载流子浓度的振荡为基本特征的元激发,称为等离激元效应。Due to the plasmon effect on the surface of the nanoantenna, the incident light of the corresponding wavelength band can be focused in a small area near the nanoantenna. It can be understood that the plasmonic effect can refer to that in a solid system with a certain carrier concentration (such as a metal, a semiconductor with a certain carrier concentration, etc.), due to the Coulomb interaction between carriers , so that the fluctuation of the carrier concentration in one place in the space will cause the oscillation of the carrier concentration in other places. This kind of meta-excitation, which is characterized by the oscillation of carrier concentration, is called the plasmon effect.
本申请实施方式中,入射光中与所述纳米天线层12产生谐振的部分,被所述纳米天线层12吸收并在表面形成等离激元信号,所述等离激元信号可以通过所述第一介质层14转换为电信号,从而经电极线输出。具体地,所述纳米天线层12可以包括一个或者多个纳米天线121。即,每一所述像素结构10可以包括 一个或者多个纳米天线121,用于对特定波长或者特定偏振的光产生谐振生成等离激元信号,不同的像素结构可以对不同的入射光产生谐振,该不同可以是指入射光的波段不同或者谐振方向不同,该等离激元信号用于转换为电信号,然后可以从与像素结构接触的电极线输出该电信号。可以理解,若一个像素结构10中设置一个纳米天线121,该纳米天线121可以设计为尺寸较大,若一个像素结构10中设置多个纳米天线121(例如4个纳米天线),则该纳米天线121可以设计为尺寸较小。In the embodiment of the present application, the part of the incident light that resonates with the nano-antenna layer 12 is absorbed by the nano-antenna layer 12 and forms a plasmon signal on the surface, and the plasmon signal can pass through the The first dielectric layer 14 converts electrical signals to be output through electrode lines. Specifically, the nano-antenna layer 12 may include one or more nano-antennas 121 . That is, each of the pixel structures 10 may include one or more nano-antennas 121 for resonating light of a specific wavelength or polarization to generate plasmon signals, and different pixel structures may resonate for different incident light , the difference may refer to a different wavelength band of incident light or a different resonance direction, the plasmon signal is used to convert into an electrical signal, and then the electrical signal may be output from the electrode line in contact with the pixel structure. It can be understood that if a nano-antenna 121 is set in a pixel structure 10, the nano-antenna 121 can be designed to be larger in size; 121 can be designed to be smaller in size.
在一种实现方式中,所述纳米天线121可以由金属材料制成,例如所述纳米天线121可以是金、银、铜、铝等金属材料中的任意一种。可以理解,所述纳米天线121的尺寸可以对应特定的光波段,由此所述纳米天线121可以吸收该光波段内波长的光。In an implementation manner, the nano-antenna 121 may be made of a metal material, for example, the nano-antenna 121 may be any one of metal materials such as gold, silver, copper, and aluminum. It can be understood that the size of the nano-antenna 121 may correspond to a specific optical band, so that the nano-antenna 121 can absorb light of a wavelength within the optical band.
在一些可能的实现方式中,所述第一介质层14包括可以实现光电转换的材料,例如,所述第一介质层14可以包括具有特定参数的介质材料。可以理解,在一些实现方式中,该介质材料可以是硅、铟镓砷等。In some possible implementation manners, the first dielectric layer 14 includes a material capable of photoelectric conversion, for example, the first dielectric layer 14 may include a dielectric material with specific parameters. It can be understood that, in some implementation manners, the dielectric material may be silicon, indium gallium arsenic, or the like.
可以理解,所述金属层16可以由铝制成。可选地,所述金属层16还可以由金、银、铂等贵金属制成,由此可以具有更好的导电效果。在一些实施例中,每一个像素结构之间的金属层16可以不相连。在另一些可能的实施例中,一列或者一行的像素结构的金属层16可以连接在一起。It can be understood that the metal layer 16 can be made of aluminum. Optionally, the metal layer 16 can also be made of noble metals such as gold, silver, platinum, etc., so as to have a better conductive effect. In some embodiments, the metal layer 16 between each pixel structure may not be connected. In some other possible embodiments, the metal layers 16 of a column or a row of pixel structures may be connected together.
在所述纳米天线层12中,第一电极线122可以与同一列或者同一行的每个像素结构10相连接。第二电极线123可以与同一列或者同一行的每个像素结构10相连接。具体地,所述第一电极线122可以与所述第一介质层12的上表面相接触,所述第二电极线123可以与所述第一介质层14的下表面相接触。基于这样的设计,所述第一电极线122可以将同一行或者同一列的像素结构的电信号传输给图像处理单元进行图像处理。所述第二电极线123可以将同一行或者同一列的像素结构的电信号传输给图像处理单元进行图像处理。该电信号用于得到图像。因此,本申请实施方式中,可以通过第一电极线122和第二电极线123来传输各个像素结构的输出信号,从而得到图像传感器的输出。In the nano-antenna layer 12, the first electrode lines 122 may be connected to each pixel structure 10 in the same column or row. The second electrode lines 123 may be connected to each pixel structure 10 in the same column or row. Specifically, the first electrode lines 122 may be in contact with the upper surface of the first dielectric layer 12 , and the second electrode lines 123 may be in contact with the lower surface of the first dielectric layer 14 . Based on such a design, the first electrode lines 122 can transmit the electrical signals of the pixel structures in the same row or column to the image processing unit for image processing. The second electrode lines 123 can transmit the electrical signals of the pixel structures in the same row or column to the image processing unit for image processing. This electrical signal is used to obtain an image. Therefore, in the embodiment of the present application, the output signals of each pixel structure can be transmitted through the first electrode lines 122 and the second electrode lines 123 , so as to obtain the output of the image sensor.
请参阅图5,图5为本申请的另一个实施例提供的图像传感器的示意图。Please refer to FIG. 5 , which is a schematic diagram of an image sensor provided by another embodiment of the present application.
可以理解,图5示出的像素结构的实施例与图4示出的图像传感器的实施例的区别在于,如图5所示,所述像素结构10还可以进一步包括第二介质层18,所述第二介质层18可以位于所述第一介质层14与所述纳米天线层12之间。基于这样的设计,本申请实施例可以增强感光强度,进一步增强所述纳米天线层12对光的吸收率,并且降低纳米天线吸收光的损耗。It can be understood that the difference between the embodiment of the pixel structure shown in FIG. 5 and the embodiment of the image sensor shown in FIG. 4 is that, as shown in FIG. 5 , the pixel structure 10 may further include a second dielectric layer 18, so The second dielectric layer 18 may be located between the first dielectric layer 14 and the nano-antenna layer 12 . Based on such a design, the embodiment of the present application can enhance the photosensitive intensity, further enhance the light absorption rate of the nano-antenna layer 12 , and reduce the loss of light absorbed by the nano-antenna.
在具体的实现过程中,所述第二介质层18相较于所述第一介质层14可以更薄,并且所述第二介质层18的介质材料可以不同于所述第一介质层14的介质材,即所述第二介质层18可以不具有感光能力,在一种可能的实现方式中,所述第二介质层18可以由非感光材料制成。在一种可能的实现方式中,所述第二介质层18的材料可以为二氧化硅,所述第二介质层的厚度可以是所述第一介质层14的10%~70%。可以理解,在其他可能的实现方式中,每一所述像素结 构可以包括两个以上的介质层,其中最下层的是具有感光作用的第一介质层14,其余的介质层为非感光介质层。In a specific implementation process, the second dielectric layer 18 may be thinner than the first dielectric layer 14, and the dielectric material of the second dielectric layer 18 may be different from that of the first dielectric layer 14. The dielectric material, that is, the second dielectric layer 18 may not have photosensitive ability, and in a possible implementation manner, the second dielectric layer 18 may be made of a non-photosensitive material. In a possible implementation manner, the material of the second dielectric layer 18 may be silicon dioxide, and the thickness of the second dielectric layer may be 10%-70% of the first dielectric layer 14 . It can be understood that, in other possible implementation manners, each pixel structure may include more than two medium layers, wherein the lowest layer is the first medium layer 14 with a photosensitive function, and the remaining medium layers are non-photosensitive medium layers .
请参阅图6,图6为本申请的另一个实施例提供的图像传感器的示意图。Please refer to FIG. 6 , which is a schematic diagram of an image sensor provided by another embodiment of the present application.
本申请的实施例中,每一个所述像素结构均可以为金属-介质-金属结构。可以理解,本实施例中的所述纳米天线的尺寸可以与接收的光波长之间正相关。由此,该纳米天线的形状和尺寸可以根据所吸收的光波段来进行设定。In the embodiments of the present application, each of the pixel structures may be a metal-dielectric-metal structure. It can be understood that the size of the nano-antenna in this embodiment may be positively correlated with the received light wavelength. Thus, the shape and size of the nano-antenna can be set according to the absorbed light wavelength band.
如图5所示,以三个像素结构10a、10b、10c为例对本申请实施例中的图像传感器进行说明。As shown in FIG. 5 , the image sensor in the embodiment of the present application will be described by taking three pixel structures 10 a , 10 b , and 10 c as examples.
具体地,所述像素结构10a可以包括纳米天线层12a、第一介质层14a以及金属层16a。所述像素结构10a的最上层为纳米天线层12a,所述像素结构10a的中间层为所述第一介质层14a,所述像素结构10a的最下层是所述金属层16a。可以理解,所述纳米天线层12a中的纳米天线长度可以为第一长度,因此,所述纳米天线层12a可以接收光波长为λ1的入射光。Specifically, the pixel structure 10a may include a nano-antenna layer 12a, a first dielectric layer 14a and a metal layer 16a. The uppermost layer of the pixel structure 10a is the nano-antenna layer 12a, the middle layer of the pixel structure 10a is the first dielectric layer 14a, and the lowermost layer of the pixel structure 10a is the metal layer 16a. It can be understood that the length of the nano-antennas in the nano-antenna layer 12a can be the first length, therefore, the nano-antenna layer 12a can receive incident light with a light wavelength of λ1.
所述像素结构10b可以包括纳米天线层12b、第一介质层14b以及金属层16b。所述像素结构10b的最上层为纳米天线层12b,所述像素结构10b的中间层为所述第一介质层14b,所述像素结构10b的最下层是所述金属层16b。可以理解,所述纳米天线层12b中的纳米天线长度可以为第二长度,因此,所述纳米天线层12b可以接收光波长为λ2的入射光。The pixel structure 10b may include a nano-antenna layer 12b, a first dielectric layer 14b and a metal layer 16b. The uppermost layer of the pixel structure 10b is the nano-antenna layer 12b, the middle layer of the pixel structure 10b is the first dielectric layer 14b, and the lowermost layer of the pixel structure 10b is the metal layer 16b. It can be understood that the length of the nano-antenna in the nano-antenna layer 12b can be the second length, therefore, the nano-antenna layer 12b can receive incident light with a light wavelength of λ2.
所述像素结构10c可以包括纳米天线层12c、第一介质层14c以及金属层16c。所述像素结构10c的最上层为纳米天线层12c,所述像素结构10c的中间层为所述第一介质层14c,所述像素结构10c的最下层是所述金属层16c。可以理解,所述纳米天线层12a中的纳米天线长度可以为第三长度,因此,所述纳米天线层12c可以接收光波长为λ3的入射光。The pixel structure 10c may include a nano-antenna layer 12c, a first dielectric layer 14c and a metal layer 16c. The uppermost layer of the pixel structure 10c is the nano-antenna layer 12c, the middle layer of the pixel structure 10c is the first dielectric layer 14c, and the lowermost layer of the pixel structure 10c is the metal layer 16c. It can be understood that the length of the nano-antenna in the nano-antenna layer 12a can be the third length, therefore, the nano-antenna layer 12c can receive incident light with a light wavelength of λ3.
举例说明,若所述纳米天线层12a中的纳米天线长度为290nm,则所述纳米天线层12a可以接收650nm红光。若所述纳米天线层12b中的纳米天线的长度为250nm,则所述纳米天线层12b可以接收560nm绿光。若所述纳米天线层12c中的纳米天线长度为200nm,则所述纳米天线层12b可以接收450nm蓝光。For example, if the nano-antenna in the nano-antenna layer 12a has a length of 290nm, the nano-antenna layer 12a can receive 650nm red light. If the nano-antenna in the nano-antenna layer 12b has a length of 250nm, the nano-antenna layer 12b can receive 560nm green light. If the length of the nano-antenna in the nano-antenna layer 12c is 200nm, the nano-antenna layer 12b can receive 450nm blue light.
基于这样的设计,入射光可以受到本申请实施例的像素结构的强烈耦合作用,由于纳米天线可以对光波段具有选择性,不同颜色的光可以进入对应的像素结构10进行光电转换。Based on such a design, the incident light can be strongly coupled by the pixel structure of the embodiment of the present application. Since the nano-antenna can be selective to the light band, light of different colors can enter the corresponding pixel structure 10 for photoelectric conversion.
更进一步,本实施例中的金属-介质-金属的结构可以实现强烈耦合作用,可以使得入射光被充分吸收。同时,由于纳米天线的波长选择性聚光作用,入射光会被谐振的纳米天线的对应的像素结构所吸收,由此,本申请实施例的图像传感器的感光强度具有很大的提升,在一些场景下,本申请实施例中的图像传感器的感光强度可以提升100%以上。Furthermore, the metal-dielectric-metal structure in this embodiment can achieve a strong coupling effect, which can fully absorb incident light. At the same time, due to the wavelength-selective concentrating effect of the nano-antenna, the incident light will be absorbed by the corresponding pixel structure of the resonant nano-antenna. Therefore, the photosensitive intensity of the image sensor in the embodiment of the present application is greatly improved. Under the scene, the photosensitive intensity of the image sensor in the embodiment of the present application can be increased by more than 100%.
可以理解,纳米天线的形状可以对感光波段的宽度有影响。举例说明,图7a所示的领结形纳米天线比图7b所示的棍形纳米天线可以实现更宽的感光波段。因此,在制造所述像素结构时,可以使用透明材料(例如二氧化硅)对纳米天线进行填充,这样可以使得纳米天线的周围不会留有空气,进而使得结构 更加稳定。It is understood that the shape of the nanoantenna can have an effect on the width of the photosensitive band. For example, the bowtie-shaped nanoantenna shown in FIG. 7a can realize a wider photosensitive wavelength band than the stick-shaped nanoantenna shown in FIG. 7b. Therefore, when manufacturing the pixel structure, the nano-antenna can be filled with a transparent material (such as silicon dioxide), so that no air will remain around the nano-antenna, thereby making the structure more stable.
在本申请一种可能的实现方式中,每个所述像素结构中的所述第一介质层14的厚度可以小于所感光波长的五分之一,由此可以实现更加强烈的纳米耦合作用,即可以进一步增强光的吸收。在一些场景下,不同像素结构的厚度可以相同,即所述第一介质层14的厚度小于所有像素结构所感光波长的最小波长的五分之一。In a possible implementation of the present application, the thickness of the first dielectric layer 14 in each pixel structure may be less than one-fifth of the wavelength of the light to be sensed, thereby achieving a stronger nanocoupling effect, That is, the absorption of light can be further enhanced. In some scenarios, different pixel structures may have the same thickness, that is, the thickness of the first dielectric layer 14 is less than one-fifth of the minimum wavelength of light sensitive to all pixel structures.
在本申请一种可能的实现方式中,每一个所述像素结构的至少一个边长可以小于所有像素结构所感光的最大波长,由此可以实现所述像素结构的分光作用。其中,该像素结构的边长可以是指该像素结构的宽或者长。具体地,在亚波长尺寸下,由于共振机制,不同波段的所述纳米天线层12可以形成等离子共振模式,从而可以将对应波段的入射光耦合局域到对应的像素区域。基于这样的设计,本申请实施例中的像素结构的尺寸可以很小,例如,在一些实施例中,所述像素结构的至少一个边长可以小于光波长,从而实现超衍射以及超分辨率的小像素尺寸。In a possible implementation manner of the present application, at least one side length of each pixel structure may be smaller than the maximum wavelength of light sensed by all the pixel structures, thereby realizing the light splitting effect of the pixel structures. Wherein, the side length of the pixel structure may refer to the width or length of the pixel structure. Specifically, at the sub-wavelength size, due to the resonance mechanism, the nanoantenna layer 12 of different wavelength bands can form a plasmon resonance mode, so that the incident light of the corresponding wavelength band can be locally coupled to the corresponding pixel area. Based on such a design, the size of the pixel structure in the embodiments of the present application can be very small. For example, in some embodiments, the length of at least one side of the pixel structure can be smaller than the wavelength of light, thereby realizing super-diffraction and super-resolution Small pixel size.
在一种可能的实施方式中,纳米天线可以包括能与光产生等离激元信号的材料,至少一个纳米天线用于针对入射光产生谐振生成等离激元信号,等离激元信号用于生成电信号。因此,本申请实施方式中,可以通过体积较小的纳米天线与入射光的等离激元效应,实现对入射光的谐振,纳米天线可以通过谐振实现对入射光的吸收,提高入射光的利用率,并且在纳米天线吸收更多的入射光的基础上,可以降低各个波段的入射光的串扰。In a possible implementation manner, the nano-antenna may include a material capable of generating plasmon signals with light, at least one nano-antenna is used to resonate with incident light to generate a plasmon signal, and the plasmon signal is used for Generate electrical signals. Therefore, in the embodiment of the present application, the resonance of the incident light can be realized through the plasmon effect of the smaller nano-antenna and the incident light, and the nano-antenna can absorb the incident light through resonance to improve the utilization of the incident light. efficiency, and on the basis that the nano-antenna absorbs more incident light, it can reduce the crosstalk of incident light in each band.
可以理解,在一些可能的实现方式中,所述图像传感器203可以包括周期排列的多个像素结构集合。所述像素结构集合可以包括至少两个像素结构。可以理解,所述像素结构集合的至少一个边长小于或等于所述至少两个像素结构所吸收的入射光的最小波长的一半。It can be understood that, in some possible implementation manners, the image sensor 203 may include a plurality of pixel structure sets arranged periodically. The set of pixel structures may include at least two pixel structures. It can be understood that the length of at least one side of the set of pixel structures is less than or equal to half of the minimum wavelength of incident light absorbed by the at least two pixel structures.
如图8a所示,像素结构集合20可以包括直线排列的像素结构10a、10b、10c,该像素结构10a、10b、10c可以分别用于吸收红光、绿光和蓝光。其中,红光波长为600纳米,绿光波长为500纳米,蓝光波长为400纳米。例如,该像素结构10a的长度可以为d1,该像素结构10b的长度可以为d2,该像素结构10c的长度可以为d3,该像素结构10a、10b、10c的宽度均为d4。该像素结构10a、10b、10c的长度为d1+d2+d3,由于该像素结构10a、10b、10c感光的蓝光为最小波长,即d1+d2+d3<100nm,并且d4<100nm。As shown in Fig. 8a, the pixel structure set 20 may include linearly arranged pixel structures 10a, 10b, 10c, and the pixel structures 10a, 10b, 10c may be used to absorb red light, green light and blue light respectively. Among them, the wavelength of red light is 600 nanometers, the wavelength of green light is 500 nanometers, and the wavelength of blue light is 400 nanometers. For example, the length of the pixel structure 10a may be d1, the length of the pixel structure 10b may be d2, the length of the pixel structure 10c may be d3, and the widths of the pixel structures 10a, 10b, and 10c are all d4. The length of the pixel structures 10a, 10b, 10c is d1+d2+d3, because the blue light sensitive to the pixel structures 10a, 10b, 10c is the minimum wavelength, that is, d1+d2+d3<100nm, and d4<100nm.
在另外一种场景下,如图8b所示,所述像素结构集合20可以包括像素结构10a、10b、10c、10d,该像素结构10a、10b、10c、10d可以呈“田”字型排列,该像素结构10a、10b、10c、10d可以分别用于吸收红光、绿光、绿光和蓝光。该像素结构10a的长度可以为d1,该像素结构10b的长度可以为d2,该像素结构10c的长度可以为d1,该像素结构10d的长度可以为d2,该像素结构10a的宽度可以为d3,该像素结构10b的宽度可以为d4,该像素结构10c的宽度可以为d3,该像素结构10d的宽度可以为d4,即d1+d2<100nm,并且d3+d4<100nm。In another scenario, as shown in FIG. 8b, the set of pixel structures 20 may include pixel structures 10a, 10b, 10c, and 10d, and the pixel structures 10a, 10b, 10c, and 10d may be arranged in a "field" shape, The pixel structures 10a, 10b, 10c, 10d can be used to absorb red light, green light, green light and blue light respectively. The length of the pixel structure 10a may be d1, the length of the pixel structure 10b may be d2, the length of the pixel structure 10c may be d1, the length of the pixel structure 10d may be d2, and the width of the pixel structure 10a may be d3, The width of the pixel structure 10b may be d4, the width of the pixel structure 10c may be d3, and the width of the pixel structure 10d may be d4, that is, d1+d2<100nm, and d3+d4<100nm.
在一些实施例中,所述像素结构上可以设置一个纳米天线。在另一些实施 例中,对于感光波长短的像素结构,由于纳米天线尺寸也较小,所述像素结构上可以设置有多个纳米天线。In some embodiments, a nano-antenna may be disposed on the pixel structure. In some other embodiments, for a pixel structure with a short photosensitive wavelength, since the size of the nano-antenna is also small, multiple nano-antennas may be arranged on the pixel structure.
如图9所示,以四个像素结构10a、10b、10c、10d为例对本申请实施例中的图像传感器进行说明。本实施例中,所述像素结构10a可以设置一个纳米天线121a。所述像素结构10b可以设置一个纳米天线121b。所述像素结构10c可以设置一个纳米天线121c。所述像素结构10d可以设置四个纳米天线121d、121e、121f、121g。其中,所述纳米天线121b的尺寸可以与所述纳米天线121c的尺寸相同。所述纳米天线121b和所述纳米天线121c的尺寸可以小于所述纳米天线121a的尺寸。所述纳米天线121d、121e、121f、121g的尺寸均可以相同。所述纳米天线121d、121e、121f、121g可以小于所述纳米天线121b和所述纳米天线121c的尺寸。可以理解,在一种可能的实现方式中,当所述像素结构包括一个纳米天线时,该像素结构具有最大的感光波长。As shown in FIG. 9 , the image sensor in the embodiment of the present application is described by taking four pixel structures 10 a , 10 b , 10 c , and 10 d as examples. In this embodiment, the pixel structure 10a may be provided with a nano-antenna 121a. The pixel structure 10b may be provided with a nano-antenna 121b. The pixel structure 10c may be provided with a nano-antenna 121c. The pixel structure 10d may be provided with four nano-antennas 121d, 121e, 121f, 121g. Wherein, the size of the nano-antenna 121b may be the same as that of the nano-antenna 121c. The size of the nano-antenna 121b and the nano-antenna 121c may be smaller than that of the nano-antenna 121a. The dimensions of the nano-antennas 121d, 121e, 121f, and 121g may all be the same. The nanoantennas 121d, 121e, 121f, 121g may be smaller in size than the nanoantenna 121b and the nanoantenna 121c. It can be understood that, in a possible implementation manner, when the pixel structure includes a nano-antenna, the pixel structure has a maximum photosensitive wavelength.
在一个实施例中,可以采用电极线与纳米天线融合的方式,来实现电极线与像素结构的连接。如图10所示,该第一电极线122可以与所述第一介质层14的上表面接触,并且该第一电极线122可以连接同一行或同一列的纳米天线121,该第一电极线122可以电连接于所述纳米天线121。可选地,所述第一电极线122可以电连接于所述纳米天线121的中心位置。在一种可能的实现方式中,所述第一电极线122与所述纳米天线121之间可以一体成型。可以理解,在一种实施例中,该第一电极线122的材料可以是与纳米天线121相同的材料。在另一种实施例中,该第一电极线122可以是透明电极材料。In one embodiment, the connection between the electrode wire and the pixel structure can be achieved by fusing the electrode wire with the nano-antenna. As shown in Figure 10, the first electrode line 122 can be in contact with the upper surface of the first dielectric layer 14, and the first electrode line 122 can be connected to the nano-antennas 121 in the same row or column. 122 may be electrically connected to the nano-antenna 121 . Optionally, the first electrode wire 122 may be electrically connected to the center of the nano-antenna 121 . In a possible implementation manner, the first electrode wire 122 and the nano-antenna 121 may be integrally formed. It can be understood that, in an embodiment, the material of the first electrode wire 122 may be the same material as that of the nano-antenna 121 . In another embodiment, the first electrode line 122 may be a transparent electrode material.
可以理解,纳米天线可以具有偏振谐振特性,可以实现不同天线对不同偏振光进行感应,如偶极子天线的偏振方向为线偏振,与天线的延伸方向一致,螺旋天线的偏振方向为圆偏振,偏振方向与天线的旋转方向一致。通常,当入射光的偏振方向与纳米天线的偏振方向一致时,将提高纳米天线对入射光的吸收。It can be understood that the nano-antenna can have polarization resonance characteristics, and different antennas can sense different polarized light. For example, the polarization direction of the dipole antenna is linear polarization, which is consistent with the extension direction of the antenna, and the polarization direction of the helical antenna is circular polarization. The direction of polarization coincides with the direction of rotation of the antenna. Generally, when the polarization direction of the incident light is consistent with that of the nano-antenna, the absorption of the incident light by the nano-antenna will be improved.
在本申请的一个实施例中,当纳米天线带有偏振特性的形状时,该纳米天线可以实现对入射光的偏振特性进行探测,即纳米天线的形状可以根据所需要吸收入射光的偏振特性来实现。In one embodiment of the present application, when the nano-antenna has a shape with polarization characteristics, the nano-antenna can detect the polarization characteristics of the incident light, that is, the shape of the nano-antenna can be determined according to the polarization characteristics of the incident light that needs to be absorbed. accomplish.
例如,如图11所示,纳米天线可以采用领结形状天线,即该纳米天线为偶极子天线,两个像素结构的偶极子天线的延伸方向不同,其中一个像素结构(例如像素结构10a)的纳米天线和另一个像素结构(例如像素结构10b)的纳米天线的偏振方向不相同,如图11中所示出的像素结构10a的纳米天线和像素结构10b纳米天线的偏振方向互相垂直。在另一种可能的实现方式中,若所述纳米天线采用偶极子天线,则相邻的两个像素结构中的偶极子天线的延伸方向不同。For example, as shown in Figure 11, the nano-antenna can adopt a bow-tie shape antenna, that is, the nano-antenna is a dipole antenna, and the extension directions of the dipole antennas of the two pixel structures are different, and one of the pixel structures (for example, pixel structure 10a) The polarization directions of the nanoantennas of the pixel structure 10a and the nanoantennas of another pixel structure (such as pixel structure 10b) are different, as shown in FIG. In another possible implementation manner, if the nano-antenna is a dipole antenna, the extension directions of the dipole antennas in two adjacent pixel structures are different.
例如,如图12所示,纳米天线可以采用螺旋天线,两个像素结构中的螺旋天线的旋转方向不同。例如像素结构10a的纳米天线和像素结构10a的纳米天线的旋转方向不相同,如该像素结构10a的纳米天线采用顺时针旋转方向,该像素结构10b天线可以采用逆时针旋转方向。在另一种可能的实现方式中,若所述纳米天线采用螺旋天线,则相邻的两个像素结构中的螺旋天线的旋转方向 不同。如图13所示,该纳米天线可以采用正方形状天线或者圆形状天线。该场景下的像素结构没有偏振特性,进而不会吸收具有偏振特性的入射光。For example, as shown in FIG. 12 , the nano-antenna can be a helical antenna, and the rotation directions of the helical antennas in the two pixel structures are different. For example, the nanoantennas of the pixel structure 10a and the nanoantennas of the pixel structure 10a rotate in different directions. For example, the nanoantennas of the pixel structure 10a rotate clockwise, and the antennas of the pixel structure 10b rotate counterclockwise. In another possible implementation, if the nano-antenna is a helical antenna, the rotation directions of the helical antennas in two adjacent pixel structures are different. As shown in FIG. 13 , the nano-antenna can adopt a square-shaped antenna or a circular-shaped antenna. The pixel structure in this scenario has no polarization characteristics, and thus will not absorb incident light with polarization characteristics.
在一种可能的场景下,如图14a所示,以四个像素结构10a、10b、10c、10d为例对本申请实施例中的图像传感器203进行说明。In a possible scenario, as shown in FIG. 14a , the image sensor 203 in the embodiment of the present application is described by taking four pixel structures 10a, 10b, 10c, and 10d as examples.
该场景下的像素结构10a可以对横向偏振的入射光产生谐振,该像素结构10a可以吸收横向偏振的入射光。该像素结构10b可以对左斜偏振的入射光产生谐振,像素结构10b可以吸收左斜偏振的入射光。该像素结构10c可以对纵向偏振的入射光产生谐振,该像素结构10c可以吸收纵向偏振的入射光。该像素结构10d可以对右斜偏振的入射光产生谐振,像素结构10d可以吸收右斜偏振的入射光。The pixel structure 10a in this scenario can resonate the incident light with transverse polarization, and the pixel structure 10a can absorb the incident light with transverse polarization. The pixel structure 10b can generate resonance to the left obliquely polarized incident light, and the pixel structure 10b can absorb the left obliquely polarized incident light. The pixel structure 10c can generate resonance to the longitudinally polarized incident light, and the pixel structure 10c can absorb the longitudinally polarized incident light. The pixel structure 10d can generate resonance for the incident light with right oblique polarization, and the pixel structure 10d can absorb the incident light with right oblique polarization.
在另一种可能的场景下,如图14b所示,以九个像素结构10a、10b、10c、10d、10e、10f、10g、10h、10i为例对本申请实施例中的图像传感器进行说明。In another possible scenario, as shown in FIG. 14b , the image sensor in the embodiment of the present application is described by taking nine pixel structures 10a, 10b, 10c, 10d, 10e, 10f, 10g, 10h, and 10i as examples.
该场景下的所述像素结构10a可以吸收红光,所述像素结构10b可以吸收紫光,所述像素结构10c可以吸收蓝光,所述像素结构10d可以吸收横向偏振的红光,所述像素结构10e可以吸收纵向偏振的绿光,所述像素结构10f可以吸收横向偏振的绿光,所述像素结构10g可以吸收横向偏振的橙光,所述像素结构10h可以吸收纵向偏振的黄光,所述像素结构10i可以吸收纵向偏振的绿光。In this scene, the pixel structure 10a can absorb red light, the pixel structure 10b can absorb purple light, the pixel structure 10c can absorb blue light, the pixel structure 10d can absorb transversely polarized red light, and the pixel structure 10e can absorb vertically polarized green light, the pixel structure 10f can absorb transversely polarized green light, the pixel structure 10g can absorb transversely polarized orange light, and the pixel structure 10h can absorb longitudinally polarized yellow light, the pixel Structure 10i can absorb longitudinally polarized green light.
在一种可能的场景下,如图14c所示,以四个像素结构10a、10b、10c、10d为例对本申请实施例中的图像传感器进行说明。In a possible scenario, as shown in FIG. 14c , four pixel structures 10a, 10b, 10c, and 10d are taken as examples to illustrate the image sensor in the embodiment of the present application.
该场景下的所述像素结构10a可以吸收横向偏振的绿光,所述像素结构10b可以左斜偏振的蓝光,所述像素结构10c可以吸收右斜偏振的红光,所述像素结构10d可以吸收纵向偏振的绿光。In this scenario, the pixel structure 10a can absorb green light with transverse polarization, the pixel structure 10b can absorb blue light with left oblique polarization, the pixel structure 10c can absorb red light with right oblique polarization, and the pixel structure 10d can absorb Green light with longitudinal polarization.
采用本申请实施例的像素结构、图像传感器和电子设备,通过纳米天线的分光作用,可以有效提高像素的感光能力,并且可以保持较低串扰和较广的感光角度,不会引入角度偏差、串扰以及制造难度太大等问题。By adopting the pixel structure, image sensor and electronic device of the embodiment of the present application, the light-sensing ability of the pixel can be effectively improved through the light-splitting effect of the nano-antenna, and the light-sensing ability of the pixel can be effectively improved, and the crosstalk and wide light-sensing angle can be maintained without introducing angle deviation and crosstalk And problems such as too much difficulty in manufacturing.
本实施例中,所述像素结构可以实现高效率的超薄感光,可以支持柔性、弯曲等器件,提升产品竞争力。In this embodiment, the pixel structure can realize high-efficiency ultra-thin light-sensing, support flexible and curved devices, and improve product competitiveness.
本技术领域的普通技术人员应当认识到,以上的实施方式仅是用来说明本申请,而并非用作为对本申请的限定,只要在本申请的实质精神范围之内,对以上实施方式所作的适当改变和变化都落在本申请要求保护的范围之内。Those of ordinary skill in the art should recognize that the above embodiments are only used to illustrate the present application, rather than to limit the present application. Alterations and variations are within the scope of the claims of this application.

Claims (14)

  1. 一种图像传感器(203),其特征在于,包括至少两个像素结构(10),所述至少两个像素结构(10)分别用于吸收两种不同特性的入射光,每个所述像素结构(10)包括:An image sensor (203), characterized in that it comprises at least two pixel structures (10), the at least two pixel structures (10) are respectively used to absorb two types of incident light with different characteristics, and each of the pixel structures (10) including:
    金属层(16);metal layer (16);
    第一介质层(14),所述第一介质层(14)位于所述金属层(16)的一侧,所述第一介质层(14)包括感光材料;A first dielectric layer (14), the first dielectric layer (14) is located on one side of the metal layer (16), and the first dielectric layer (14) includes a photosensitive material;
    纳米天线层(12),所述纳米天线层(12)位于所述第一介质层(14)远离所述金属层(16)的一侧,所述纳米天线层(12)包括一个或多个纳米天线(121);A nano-antenna layer (12), the nano-antenna layer (12) is located on the side of the first dielectric layer (14) away from the metal layer (16), and the nano-antenna layer (12) includes one or more nano antenna (121);
    其中,所述第一介质层(14)的厚度小于所述像素结构(10)所吸收的入射光的最小波长的五分之一,所述像素结构(10)的至少一个边长小于所述像素结构(10)所吸收的入射光的最大波长。Wherein, the thickness of the first dielectric layer (14) is less than one-fifth of the minimum wavelength of the incident light absorbed by the pixel structure (10), and at least one side length of the pixel structure (10) is less than the The maximum wavelength of incident light absorbed by the pixel structure (10).
  2. 根据权利要求1所述的图像传感器(203),其特征在于,The image sensor (203) according to claim 1, characterized in that,
    所述两种不同特性的入射光为两种不同偏振的入射光。The two incident lights with different characteristics are incident lights with two different polarizations.
  3. 根据权利要求2所述的图像传感器(203),其特征在于,The image sensor (203) according to claim 2, characterized in that,
    所述一个或多个纳米天线(121)为偶极子天线,所述至少两个像素结构(10)中的偶极子天线的延伸方向不同;或者The one or more nano-antennas (121) are dipole antennas, and the extension directions of the dipole antennas in the at least two pixel structures (10) are different; or
    所述一个或多个纳米天线(121)为螺旋天线,所述至少两个像素结构(10)中的螺旋天线的旋转方向不同。The one or more nano-antennas (121) are helical antennas, and the rotation directions of the helical antennas in the at least two pixel structures (10) are different.
  4. 根据权利要求1-3任意一项所述的图像传感器(203),其特征在于,The image sensor (203) according to any one of claims 1-3, characterized in that,
    所述两种不同特性的入射光为两个不同波段的入射光。The incident light of the two different characteristics is the incident light of two different wavebands.
  5. 根据权利要求1-4任意一项所述的图像传感器(203),其特征在于,The image sensor (203) according to any one of claims 1-4, characterized in that,
    所述像素结构(10)还包括第二介质层(18),所述第二介质层(18)位于所述纳米天线层(12)与所述第一介质层(14)之间;The pixel structure (10) also includes a second dielectric layer (18), and the second dielectric layer (18) is located between the nano-antenna layer (12) and the first dielectric layer (14);
    所述第二介质层(18)包括非感光材料。The second medium layer (18) includes non-photosensitive material.
  6. 根据权利要求5所述的图像传感器(203),其特征在于,The image sensor (203) according to claim 5, characterized in that,
    所述第二介质层(18)的厚度小于所述第一介质层(14)的厚度。The thickness of the second dielectric layer (18) is smaller than the thickness of the first dielectric layer (14).
  7. 根据权利要求6所述的图像传感器(203),其特征在于,The image sensor (203) according to claim 6, characterized in that,
    所述第二介质层(18)的厚度为所述第一介质层(14)的厚度的10%-70%。The thickness of the second dielectric layer (18) is 10%-70% of the thickness of the first dielectric layer (14).
  8. 根据权利要求1-7任意一项所述的图像传感器(203),其特征在于,The image sensor (203) according to any one of claims 1-7, characterized in that,
    所述至少两个像素结构(10)相邻。The at least two pixel structures (10) are adjacent.
  9. 根据权利要求1-8任意一项所述的图像传感器(203),其特征在于,The image sensor (203) according to any one of claims 1-8, characterized in that,
    所述图像传感器(203)还包括一个或多个第一电极线(122),所述一个或多个第一电极线(122)与所述第一介质层(14)的上表面相接触,所述一个或多个第一电极线(122)用于接收所述至少两个像素结构(10)输出的电信号,所述电信号用于得到图像。The image sensor (203) also includes one or more first electrode lines (122), and the one or more first electrode lines (122) are in contact with the upper surface of the first dielectric layer (14), The one or more first electrode lines (122) are used to receive electrical signals output by the at least two pixel structures (10), and the electrical signals are used to obtain an image.
  10. 根据权利要求9所述的图像传感器(203),其特征在于,The image sensor (203) according to claim 9, characterized in that,
    所述一个或多个第一电极线(122)与所述第一介质层(14)的上表面接触,所述第一电极线(122)电连接同一行或同一列的纳米天线(121)。The one or more first electrode lines (122) are in contact with the upper surface of the first dielectric layer (14), and the first electrode lines (122) are electrically connected to the nano-antennas (121) in the same row or column .
  11. 根据权利要求10所述的图像传感器(203),其特征在于,The image sensor (203) according to claim 10, characterized in that,
    所述第一电极线(122)电连接于所述纳米天线(121)的中心位置。The first electrode line (122) is electrically connected to the center of the nano-antenna (121).
  12. 根据权利要求1-11任意一项所述的图像传感器(203),其特征在于,The image sensor (203) according to any one of claims 1-11, characterized in that,
    所述图像传感器(203)还包括一个或多个第二电极线(123),所述一个或多个第二电极线(123)与所述第一介质层(14)的下表面相接触,所述一个或多个第二电极线(123)用于接收所述至少两个像素结构(10)输出的电信号,所述电信号用于得到图像。The image sensor (203) also includes one or more second electrode lines (123), and the one or more second electrode lines (123) are in contact with the lower surface of the first dielectric layer (14), The one or more second electrode lines (123) are used to receive electrical signals output by the at least two pixel structures (10), and the electrical signals are used to obtain an image.
  13. 根据权利要求1-12任意一项所述的图像传感器(203),其特征在于,The image sensor (203) according to any one of claims 1-12, characterized in that,
    所述图像传感器(203)包括周期排列的多个像素结构集合(20),所述像素结构集合(20)包括所述至少两个像素结构(10);The image sensor (203) includes a plurality of pixel structure sets (20) arranged periodically, and the pixel structure set (20) includes the at least two pixel structures (10);
    所述像素结构集合(20)的至少一个边长小于或等于所述至少两个像素结构(10)所吸收的入射光的最小波长的一半。At least one side length of the pixel structure set (20) is less than or equal to half of the minimum wavelength of incident light absorbed by the at least two pixel structures (10).
  14. 一种电子设备(100),其特征在于,包括权利要求1-13任意一项所述的图像传感器(203)。An electronic device (100), characterized by comprising the image sensor (203) according to any one of claims 1-13.
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