WO2023035378A1

WO2023035378A1 - Atomic layer deposition device

Info

Publication number: WO2023035378A1
Application number: PCT/CN2021/126863
Authority: WO
Inventors: 陈蓉; 弋戈; 刘潇; 邵华晨; 向俊任; 李嘉伟
Original assignee: 华中科技大学; 华中科技大学无锡研究院
Priority date: 2021-09-13
Filing date: 2021-10-28
Publication date: 2023-03-16
Also published as: CN113774358B; CN113774358A

Abstract

An atomic layer deposition device, comprising a reaction container (120), wherein a reaction chamber (121) is formed inside the reaction container (120); an air intake assembly, which comprises an air intake member (200), wherein the air intake member (200) is connected to the reaction container (120), and the air intake member (200) is provided with an air inlet (211) capable of being in communication with the reaction chamber (121); a discharging assembly, which comprises a discharging plug (400) and a discharging pipe (300), wherein the discharging pipe (300) is connected to the reaction container (120), the discharging plug (400) is arranged inside the discharging pipe (300) and is located below a discharging port (250), which is in communication with the reaction chamber (121), and a discharging channel (320) for allowing powder to flow out is formed between the discharging plug (400) and the discharging pipe (300); and a driving member, which is connected to the discharging plug (400), and is used for driving the discharging plug (400) to move in a vertical direction, so as to make the discharging plug (400) be in contact with or be separated from the discharging port (250). The deposition device can smoothly discharge the powder and reduce blockage of the discharging port.

Description

ALD

technical field

The present application relates to the technical field of atomic layer deposition, in particular to an atomic layer deposition device.

Background technique

Atomic layer deposition is an ultra-thin film preparation technology, through which substances can be plated layer by layer on the surface of a substrate in the form of a single atomic film. The thickness of the film formed during atomic layer deposition is very small, reaching the nanometer level, and the consistency is good, so it is widely used in the fields of micro-nano electronic devices and solar cells. During atomic layer deposition, the precursor is usually passed into the reaction chamber, and when it passes through the reaction chamber, it is wrapped on the surface of the powder to complete the deposition and coating. After the deposition is completed, the gate valve at the outlet is opened to take out the powder. However, powder often enters the gate valve, causing the gate valve to fail, unable to discharge smoothly, and the discharge port is blocked.

Contents of the invention

Based on this, an aspect of the present application proposes an atomic layer deposition device, comprising:

A reaction vessel, the inside of which forms a reaction cavity;

an air intake assembly, the air intake assembly includes an air intake piece, the air intake piece is connected to the reaction vessel, and the air intake piece is provided with an air inlet capable of communicating with the reaction chamber;

A discharge assembly, the discharge assembly includes a discharge plug and a discharge pipe, the discharge pipe is connected to the reaction vessel, the discharge plug is arranged inside the discharge pipe, the discharge plug Located below the discharge port communicating with the reaction chamber, a discharge channel for the powder to flow out is formed between the discharge plug and the discharge pipe; and

A driving part, the driving part is connected with the discharge plug, and the driving part is used to drive the discharge plug to move vertically, so that the discharge plug contacts or separates from the discharge port.

In one of the embodiments, the discharge plug can be driven into the discharge port to block the discharge port under the drive of the driving member, and the discharge plug includes a plug for blocking the discharge port. The blanking surface of the material opening is a conical surface, and the radial dimension of the blanking surface gradually increases from top to bottom.

In one of the embodiments, the discharge port is arranged on the air inlet part, the discharge pipe is arranged inside the air inlet part, the discharge pipe is connected with the air inlet part, and the An air inlet passage for gas to flow in is formed between the discharge pipe and the air inlet member, and the air inlet passage communicates with the air inlet.

In one of the embodiments, the air intake assembly further includes a wind cap, the wind cap is connected to the air inlet, and an air supply port is arranged on the wind cap; Open and communicate with the reaction chamber; when the air intake in the air inlet channel stops, the air supply port is closed.

In one of the embodiments, the air cap includes an inner tube, an outer tube and a blocking member, the outer tube is arranged at intervals outside the inner tube, and the blocking member is located between the inner tube and the outer tube , the barrier is in contact with the outer tube, and the barrier is supported by the inner tube, the bottom of the inner tube communicates with the air inlet, and the top of the inner tube is provided with a through hole, so The side wall of the outer tube is provided with the air supply port; when the air intake is stopped in the air intake channel, the stopper contacts the top of the inner tube to block the through hole, and the stopper blocks The air supply port: when the intake air enters the air intake channel, the blocking member is pushed by the gas to separate from the through hole, and the blocking member is separated from the air supply port.

In one of the embodiments, the air cap includes an inner tube and an outer tube, the outer tube is sleeved on the outside of the inner tube and supported by the inner tube, the bottom of the inner tube is connected to the air inlet connected, the top of the inner tube is provided with a through hole; when the intake air is stopped in the air intake channel, the outer tube contacts the top of the inner tube to block the through hole, and the outer tube The bottom is in contact with the air intake piece; when the intake air enters the air intake channel, the outer tube is pushed by the gas to separate from the through hole, and the outer tube is separated from the air intake piece, and the outer tube is separated from the air intake piece. A gap between the tube and the air intake piece forms the air delivery port.

In one of the embodiments, the air intake assembly includes a plurality of air caps, one of the air caps is installed on the top of the discharge plug, and the rest of the air caps are installed on the air intake member, the The inner cavity of the discharge plug is hollow and the side wall is provided with a first notch communicating with the inner cavity, and the side wall of the discharge pipe is provided with a second notch; The first notch communicates with the second notch, and part of the gas in the air intake channel flows through the second notch, the first notch and the inner cavity in turn, enters the wind cap, and passes through the air supply channel. The air port flows into the reaction chamber; when the discharge plug moves to separate from the discharge port for discharge, the first notch and the second notch are staggered.

In one of the embodiments, the inner surface of the side wall of the discharge pipe is provided with a protrusion, and the protrusion is abutted against the outer surface of the side wall of the discharge plug, and the second notch runs through the The side wall of the bump and the discharge pipe;

Alternatively, a protrusion is provided on the outer surface of the side wall of the discharge plug, and the protrusion is pressed against the inner surface of the side wall of the discharge pipe, and the second notch passes through the protrusion and the inner surface of the discharge pipe. Describe the side wall of the discharge plug.

In one of the embodiments, it also includes a transmission assembly connected between the driving member and the discharge plug, the driving member includes a knob, the transmission assembly includes a gear and a rack, the knob and the The gears are connected by connecting rods, the gears are meshed with the racks, the racks are connected with the discharge plug, the gears and the racks are both arranged inside the air intake member, and the knob located on the outside of the air intake.

In one of the embodiments, the atomic layer deposition apparatus further includes a discharge tank, a first suction pipe, a second suction pipe, and a suction pump communicating with the first suction pipe and the second suction pipe, The discharge tank is communicated with the discharge channel, when the air intake channel is fed in, the first air extraction pipe is communicated with the reaction chamber, and the discharge plug moves to the When separating and discharging, the second suction pipe communicates with the discharge tank.

The details of one or more embodiments of the application are set forth in the accompanying drawings and the description below. Other features, objects and advantages of the present application will be apparent from the description, drawings and claims.

Description of drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings that need to be used in the description of the embodiments or the prior art. Obviously, the accompanying drawings in the following description are only These are some embodiments of the present application. Those skilled in the art can also obtain the drawings of other embodiments according to these drawings without creative work.

FIG. 1 is a schematic diagram of the overall structure of an atomic layer deposition apparatus in an embodiment of the present application.

FIG. 2 is a partial structural schematic diagram of the atomic layer deposition device in FIG. 1 .

FIG. 3 is a schematic structural diagram of the connection between the lower end region of the reaction vessel and the gas inlet part of the atomic layer deposition apparatus in FIG. 1 .

FIG. 4 is a cross-sectional view of the components shown in FIG. 3 .

FIG. 5 is an exploded view of the air inlet, outlet plug, and outlet pipe of the atomic layer deposition device in FIG. 1 .

FIG. 6 is a schematic structural diagram of a discharge pipe of the atomic layer deposition device in FIG. 1 .

FIG. 7 is a schematic structural diagram of the wind cap of the atomic layer deposition apparatus in FIG. 1 .

FIG. 8 is a cross-sectional view of the wind cap of the atomic layer deposition apparatus in FIG. 1 .

Reference signs:

Rack 110, reaction vessel 120, reaction chamber 121;

Air inlet 200, upper part 210 of air inlet, air inlet 211, lower part 220 of air inlet, flat plate 221, sleeve 222, air inlet passage 230, inlet pipe connection 240, discharge port 250, blocking surface 251;

Discharge pipe 300, bump 310, second notch 311, discharge channel 320;

Discharge plug 400, blanking surface 410, first notch 420, extension rod 430, guide rod 440;

Wind cap 500, inner pipe 510, through hole 511, outer pipe 520, air supply port 521, blocking member 530, top plate 531, side plate 532;

Knob 610, gear 620, rack 630, connecting rod 640;

Storage tank 711, feed pipe 712, discharge tank 721, first connecting pipe 722, second connecting pipe 723, storage tank 724, operation box 725;

First heater 811, second heater 812, first vibrating rod 821, second vibrating rod 822;

An air extraction pump 910 , a first air extraction pipe 921 , a second air extraction pipe 922 , a first valve 931 , a second valve 932 , and a third valve 933 .

Detailed ways

In order to make the above-mentioned purpose, features and advantages of the present application more obvious and understandable, the specific implementation manners of the present application will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the application. However, the present application can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the application and simplifying the description, rather than indicating or implying the referred device or Elements must have certain orientations, be constructed and operate in certain orientations, and thus should not be construed as limiting the application.

In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be interpreted as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In the description of the present application, "plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.

In this application, terms such as "installation", "connection", "connection" and "fixation" should be interpreted in a broad sense, for example, it can be a fixed connection or a detachable connection, unless otherwise clearly specified and limited. , or integrated; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components or the interaction relationship between two components, unless otherwise specified limit. Those of ordinary skill in the art can understand the specific meanings of the above terms in this application according to specific situations.

In the present application, unless otherwise clearly specified and limited, a first feature being "on" or "under" a second feature may mean that the first and second features are in direct contact, or that the first and second features are indirect through an intermediary. touch. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.

It should be noted that when an element is referred to as being "fixed on" or "disposed on" another element, it can be directly on the other element or there can also be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions are for the purpose of illustration only and are not intended to represent the only embodiment.

Referring to Figures 1 to 5, an atomic layer deposition device provided by an embodiment of the present application includes a reaction vessel 120, an inlet assembly, a discharge assembly, and a drive member. The interior of the reaction vessel 120 is hollow to form a reaction chamber 121, and the atomic layer The deposited substrate (ie, the powder to be coated) may be placed in the reaction chamber 121 . The air intake assembly includes an air intake piece 200, which is connected to the reaction vessel 120. The air intake piece 200 is provided with an air intake port 211 that can communicate with the reaction chamber 121, and the gaseous precursor can flow in through the air intake piece 200. The gas inlet 211 further flows into the reaction chamber 121 to react with the powder to be coated in the reaction chamber 121 . The discharge assembly includes a discharge plug 400 and a discharge pipe 300, the discharge pipe 300 is connected to the reaction vessel 120, the discharge plug 400 is arranged inside the discharge pipe 300, the discharge port 250 communicates with the reaction chamber 121, and the discharge The plug 400 is located below the discharge port 250, and the gap between the discharge plug 400 and the discharge pipe 300 forms a discharge channel 320 for the powder to flow out. The driving part is connected with the discharge plug 400 , and the driving part can drive the discharge plug 400 to move vertically, so that the discharge plug 400 contacts or separates from the discharge port 250 . Since the discharge plug 400 is located below the discharge port 250, when the discharge plug 400 moves upward, it will be close to the discharge port 250 and contact with the discharge port 250, and the discharge port 250 is covered by the discharge plug 400. Blocked, unable to discharge; when the discharge plug 400 moves downward, it will be away from the discharge port 250 and separated from the discharge port 250. At this time, the discharge port 250 is no longer blocked, and the deposition after the deposition is completed The powder can be discharged from the reaction chamber 121 through the discharge port 250 and flow out through the discharge channel 320 to realize discharge.

In the existing structure, a flapper valve is generally used to control the discharge, and a flapper valve is installed on the discharge pipeline. The valve plate of the flapper valve is located in the discharge pipeline and is perpendicular to the axial direction of the discharge pipeline. The valve plate will The discharge pipe is separated, and the powder above the valve plate cannot flow downward. The valve plate moves horizontally, and the feeding direction is vertically downward. When the flapper valve is operated to move the valve plate and no longer separate the discharge pipeline into upper and lower parts, the upper and lower parts of the discharge pipeline are connected, and the discharge can be carried out at this time. However, when the flapper valve is operated for discharge, the powder accumulated above the valve plate will slide horizontally with the valve plate in its guide rail, which is very easy to block the guide rail, so that the valve plate cannot move in place, and the upper and lower parts of the discharge pipeline cannot be completely closed. Connected, so it is easy to cause discharge blockage. The flapper valve is therefore extremely vulnerable to damage and needs to be replaced frequently at a higher cost. However, in this solution, since the movement direction and the discharge direction of the discharge plug 400 are both downward during discharge, even if a small amount of powder is accumulated on the top of the discharge plug 400, when the discharge plug 400 moves downward to open the discharge When the material opening is 250, these powders will not block the forward path of the discharge plug 400, and the discharge plug 400 can move down relatively smoothly, so the material can be discharged relatively smoothly, and the discharge port 250 is not easy to be blocked. In addition, after the flapper valve is replaced, there is no need to replace it frequently due to frequent failures of the flapper valve, and the cost is reduced.

Referring to Fig. 1 and Fig. 2, the overall structure of the device is briefly described first. In some embodiments, the atomic layer deposition apparatus includes a frame 110 , and components such as the reaction vessel 120 , the storage tank 711 and the discharge tank 721 are installed on the frame 110 . The aforesaid inlet components and discharge components are all arranged below the reaction vessel 120. The storage tank 711 is disposed above the reaction vessel 120 , and the two are connected by a feed pipe 712 . The feed pipe 712 is provided with valves and other components, and the connection and disconnection between the storage tank 711 and the reaction chamber 121 are realized through valve switches. When the valve is opened, the storage tank 711 is communicated with the reaction chamber 121, and the powder in the storage tank 711 can flow into the reaction chamber 121 from the feed pipe 712; when the valve is closed, the storage tank 711 is separated from the reaction chamber 121, The powder in the storage tank 711 cannot flow into the reaction cavity 121 .

In some embodiments, a first heater 811 is provided outside the storage tank 711 for heating and drying the powder stored in the storage tank 711 to remove moisture therein. The storage tank 711 is also connected with a dewatering pipe, and the dewatering pipe is connected with a water pump, so that the evaporated water vapor can be sucked away through the dewatering pipe. Of course, a filter screen needs to be set at the joint between the water removal pipe and the storage tank 711 to ensure that only water vapor is sucked away and the powder is still stored in the storage tank 711. A second heater 812 is provided outside the reaction vessel 120 for heating the reaction chamber 121 to reach the required temperature for deposition.

The inlet pipe connection part 240 provided on the inlet part 200 is connected to the inlet pipe, and the precursor gas can flow from the inlet pipe into the inlet channel 230 in the inlet part 200 . During deposition, the gas flows into the gas inlet channel 230 , flows out from the gas inlet 211 , and directly enters the reaction chamber 121 , or enters the reaction chamber 121 through other components connected with the gas inlet member 200 . The first exhaust pipe 921 is connected to the top of the reaction vessel 120 , and the air pump 910 can extract the gas in the reaction chamber 121 through the first exhaust pipe 921 . As mentioned above, the gas inlet component and the discharge component are all disposed under the reaction vessel 120 , so the gas enters from the bottom of the reaction chamber 121 and flows out from the top of the reaction chamber 121 . When the gas enters the reaction chamber 121 from below, it will blow up the powder to be coated accumulated at the bottom of the reaction chamber 121, so that the powder to be coated in the reaction chamber 121 will float up, and the upward impact force of the gas and the powder itself The downward gravity acts at the same time, making the powder roll up and down, breaking up some agglomerated powder, so that it can fully contact with the gas and complete the deposition. The reaction vessel 120 includes three areas: upper, middle, and lower. Preferably, in some embodiments, the lower area of the reaction chamber 121 is in the shape of a cone with a large top and a small bottom. Therefore, in this area, the closer to the upper position, the gas flow pressure The smaller it is, the smaller the impact force on the powder is, which is conducive to the powder falling back down to the area with greater impact force and being blown upward again, which is conducive to aggravating the up and down tumbling of the powder and making the powder more dispersed , more fully contact with the gas and complete the deposition.

Preferably, in some embodiments, a first vibrating rod 821 is provided on the outside of the storage tank 711, through the vibration of the first vibrating rod 821, the powder in the storage tank 711 can be agglomerated and dispersed to disperse them , more fully contact with the gas and complete the deposition. Similarly, the outside of the reaction vessel 120 is provided with a second vibrating rod 822, through the vibration of the second vibrating rod 822, the powder in the reaction vessel 120 can be agglomerated and scattered, so that it can be more fully in contact with the gas and Complete deposition.

Referring to Fig. 3 to Fig. 5, the structure of the discharge position will be described. Preferably, in some embodiments, the outlet plug 400 can be driven into the outlet 250 by the driving member, so as to block the outlet 250 . Specifically, the discharge plug 400 extends into the discharge port 250 , and the discharge surface 410 on the discharge plug 400 interferes with the side wall of the discharge port 250 , that is, the blocking surface 251 , thereby closing the discharge port 250 . Of course, in some other embodiments, if the outlet plug 400 does not extend into the outlet 250 , it may be blocked under the outlet 250 . When the discharge plug 400 protrudes into the discharge port 250 for sealing, preferably, in some embodiments, the discharge surface 410 is conical, and the radial dimension of the discharge surface 410 gradually increases from top to bottom. If the discharge surface 410 is a conical surface, when the discharge port 250 moves downward to switch to the open state, the powder will fall down along the conical surface and enter the discharge channel 320, and will not accumulate on the top of the discharge plug 400 . Preferably, the plugging surface 251 is set as a tapered surface matching the blanking surface 410, so that the plugging surface 251 and the blanking surface 410 are completely attached, and such setting can enhance the sealing performance of the plugging at the discharge port 250, when When the discharge plug 400 moves, the shape matching between the blocking surface 251 and the discharge surface 410 can also guide the discharge plug 400 .

3 to 5, in some embodiments, the discharge port 250 is arranged on the air inlet 200, the discharge pipe 300 is arranged inside the air inlet 200, the discharge pipe 300 is connected with the air inlet 200, and the outlet An air intake channel 230 for gas inflow is formed between the material tube 300 and the air intake member 200 , and the air intake channel 230 communicates with the air intake port 211 . Specifically, the intake piece 200 includes a lower portion 220 of the intake piece and an upper portion 210 of the intake piece, which are fixedly connected. A cavity is formed inside. The protruding part of the upper part 210 of the air inlet protrudes into the reaction cavity 121 , and the discharge port 250 and the air inlet 211 are both arranged on the top of the upper part 210 of the air inlet. The outlet pipe 300 is fixedly connected to the upper part 210 of the air inlet, so as to realize the connection with the reaction vessel 120 . The lower part 220 of the air intake part includes a flat plate 221 and a sleeve 222 which are integrally formed as one part, and the flat plate 221 and the upper part 210 of the air intake part are connected by threaded fasteners. The air intake pipe connecting portion 240 is connected to the flat plate 221 , and a hole communicating with the air intake passage 230 is provided at the joint of the air intake pipe connecting portion 240 on the plate 221 . The gas enters the air intake passage 230 from the air intake pipe connecting portion 240 through the hole on the plate 221 , and then reaches the air intake 211 . In the above-mentioned embodiment, the discharge port 250 is arranged on the intake member 200, the intake passage 230 is formed between the discharge pipe 300 and the intake member 200, and the discharge passage is formed between the discharge pipe 300 and the discharge plug 400 320, that is, the discharge assembly and the intake assembly are integrated together, the structure is relatively compact, and the overall structure is relatively simple.

In some embodiments, the intake assembly further includes a wind cap 500, the wind cap 500 is connected to the air inlet 211, and the wind cap 500 is provided with an air supply port 521; 121 communicates; when the air intake in the air intake channel 230 stops, the air delivery port 521 is closed. Specifically, the air cap 500 is installed at the air inlet 211, and the air cap 500 is located in the reaction chamber 121. When the air is fed into the air inlet passage 230, the gas can enter the air cap 500 from the air inlet 211, and flow into the reaction chamber from the air supply port 521. Inside the body 121. When the air intake in the air inlet channel 230 is stopped, the air supply port 521 is closed, and the powder in the reaction chamber 121 will not enter the air cap 500 from the air supply port 521, and will not cause the air cap 500 to be blocked.

Specifically, referring to FIG. 4 , FIG. 7 and FIG. 8 , in some embodiments, the wind cap 500 includes an inner tube 510 , an outer tube 520 and a blocking member 530 , the outer tube 520 is arranged at intervals outside the inner tube 510 , and the blocking member 530 is located Between the inner tube 510 and the outer tube 520, the blocking member 530 is in contact with the outer tube 520, and the blocking member 530 is supported by the inner tube 510, the bottom of the inner tube 510 communicates with the air inlet 211, and the top of the inner tube 510 is provided with a through hole 511, the side wall of the outer tube 520 is provided with an air supply port 521; when the intake air is stopped in the air intake channel 230, the stopper 530 contacts the top of the inner tube 510 to block the through hole 511, and the stopper 530 blocks the air supply port 521; When the intake passage 230 receives air, the blocking member 530 is pushed by the gas to separate from the through hole 511 , and the blocking member 530 is separated from the air delivery port 521 . Specifically, the inner tube 510 is fixedly connected to the outer tube 520, both of which are hollow inside. The blocking member 530 includes a top plate 531 and a side plate 532 , the outer wall of the side plate 532 is in contact with the side wall of the outer tube 520 , and there is a gap between the inner wall of the side plate 532 and the inner tube 510 . The air outlet 521 is disposed on the side wall of the outer tube 520 near the lower end. When the air intake in the air intake channel 230 stops, the blocking member 530 will fall on the inner tube 510 under its own gravity, and the top plate 531 is supported by the top of the inner tube 510, so the through hole 511 provided on the top of the inner tube 510 Blocked by the top plate 531 , the through hole 511 is blocked. At the same time, the blocking member 530 will block the air supply port 521 to prevent powder from entering the outer tube 520 from the air supply port 521 . When the air is fed into the air intake channel 230, after the gas enters the inner tube 510, it flows out from the through hole 511 on the top, and the blocking member 530 is lifted upwards so that it no longer blocks the air delivery port 521. At this time, the gas from the through hole The gas flowing out of 511 will flow downward from the top of the inner tube 510 and the top plate 531 , and flow into the reaction chamber 121 from the gas delivery port 521 .

Or, in some other embodiments, the air cap includes an inner tube and an outer tube, the outer tube is sleeved on the outside of the inner tube and supported by the inner tube, the bottom of the inner tube communicates with the air inlet 211, and the top of the inner tube is provided with a hole; when the air intake in the air intake channel 230 is stopped, the outer tube contacts the top of the inner tube to block the through hole, and the bottom of the outer tube contacts the air intake part 200; when the air intake in the air intake channel 230, the outer tube is The gas is pushed to separate from the through hole, and the outer tube is separated from the air intake part 200 , and the gap between the outer tube and the air intake part 200 forms an air delivery port. Specifically, the connection structure and installation position between the wind cap and the air inlet 200 are the same as those of the previous embodiment, the difference is that no blocking element is provided in this embodiment, and the outer tube is directly used as the blocking element, and the outer tube The structure of is similar to that of the barrier. When the intake air is stopped in the air intake channel 230, the outer tube will fall on the inner tube under its own gravity, and the bottom end of the outer tube is in contact with the air intake part 200, and there is no gap between the two, which can inhibit the air intake. The powder enters the outer tube. When air is fed into the air intake channel 230, after the gas enters the inner tube, it flows out from the through hole at the top, and the outer tube is lifted up so that it no longer blocks the through hole, and the bottom end of the outer tube is in contact with the air intake. The part 200 is separated, and there is a gap between the two. At this time, the gas flowing out from the through hole will flow downward from between the inner tube and the outer tube, and flow into the reaction chamber from the gap between the bottom end of the outer tube and the gas inlet part 200 Inside the body 121.

Referring to Fig. 4 to Fig. 6, in some embodiments, the air intake assembly includes a plurality of air caps 500, wherein one air cap 500 is installed on the top of the discharge plug 400, and the remaining air caps 500 are installed on the air inlet part 200, and the discharge plug The inner cavity of 400 is hollow and the side wall is provided with a first gap 420 communicating with the inner cavity, and the side wall of the discharge pipe 300 is provided with a second gap 311 passing through the side wall; A notch 420 communicates with the second notch 311, and part of the gas in the air inlet passage 230 flows through the second notch 311, the first notch 420 and the inner cavity to enter the air cap 500, and flows into the reaction chamber 121 through the air supply port 521; When the plug 400 is moved to separate from the discharge port 250 to discharge, the first notch 420 and the second notch 311 are staggered. The structures of the plurality of wind caps 500 are the same, which have been described in the foregoing embodiments, and will not be repeated here. Specifically, among the plurality of wind caps 500, one of them is fixed on the top of the discharge plug 400, and protrudes upwards from the discharge port 250 into the reaction chamber 121; the remaining multiple wind caps 500 surround the discharge plug evenly in a ring shape The outside of the hood 500 mounted on the top of the 400. Correspondingly, the aforementioned discharge port 250 is located at the central area of the top end of the upper part 210 of the intake member, and a plurality of intake ports 211 are evenly distributed around the discharge port 250 in a ring shape. When the intake air enters the air intake channel 230, part of the gas can flow into the corresponding wind cap 500 from the multiple annularly distributed air inlets 211, and then flow into the reaction chamber 121; part of the gas can flow into the discharge pipe from the second gap 311 300, and flow into the inside of the discharge plug 400 from the first gap 420 communicating with the second gap 311, and then flow upward in the inner cavity of the discharge plug 400 into the inner tube of the corresponding wind cap 500, and from the top of the wind cap 500 The provided air supply port 521 flows out into the reaction chamber 121 . When the deposition is completed and discharge is required, the discharge plug 400 moves downward to open the discharge port 250 , and the first notch 420 also moves relative to the second notch 311 , so that the first notch 420 and the second notch 311 are staggered. In the above embodiment, by setting the inside of the discharge plug 400 hollow, and installing the wind cap 500 on its top, through the communication between the first notch 420 and the second notch 311, part of the gas is released from the multiple vents installed on the air inlet 200. Two air caps 500 arranged in a ring enter the outer ring area of the reaction chamber 121, and part of the gas flows into the central area of the reaction chamber 121 from the air cap 500 installed on the discharge plug 400, so that it enters each area in the reaction chamber 121. The gas distribution is more uniform, and the powder accumulated in each area can be blown up and covered as much as possible.

In some embodiments, a protrusion 310 is provided on the inner surface of the side wall of the discharge pipe 300, and the protrusion 310 abuts against the outer surface of the side wall of the discharge plug 400, and the second notch 311 runs through the protrusion 310 and the outlet. The side wall of the material tube 300. Specifically, the sidewall of the protrusion 310 has an arc surface so that it can be attached to the outer surface of the sidewall of the discharge plug 400 . When the intake air is in the air inlet channel 230, there is no need to discharge the material at this time, and the discharge plug 400 is blocked in the discharge port 250. At this time, the positions of the first notch 420 and the second notch 311 are aligned, and there is a gap between the two. Connected, the gas can flow into the cavity of the discharge plug 400 . When the deposition is completed and the material needs to be discharged, the discharge plug 400 moves downwards and separates from the discharge port 250. During the movement, the first notch 420 also moves down and gradually staggers from the second notch 311. cannot be connected. At this time, the first notch 420 is attached to the area below the second notch 311 on the protrusion 310, so as to seal the first notch 420, so that the powder flows from the discharge port 250 between the discharge pipe 300 and the upper part 210 of the inlet member. When the discharge channel 320 in between is bypassed, the position of the bump 310 is bypassed, and the powder is discharged downward from both sides, so that the powder will not flow into the inner cavity of the discharge plug 400 from the first gap 420 .

Alternatively, in some embodiments, a protrusion 310 is provided on the outer surface of the side wall of the discharge plug 400, the protrusion 310 is against the inner surface of the side wall of the discharge pipe 300, and the second notch 311 runs through the protrusion 310 and the side wall of the discharge plug 400. This embodiment is similar to the previous embodiment, except that the protrusion 310 is arranged on the outer surface of the side wall of the discharge plug 400 , and the cooperation between the two notches is similar to the previous embodiment, and will not be repeated here.

3 to 5, in some embodiments, the driving member and the discharge plug 400 are connected through a transmission assembly, the driving member includes a knob 610, the transmission assembly includes a gear 620 and a rack 630, and the knob 610 and the gear 620 are connected through The rod 640 is connected, the gear 620 meshes with the rack 630 , the rack 630 is connected with the discharge plug 400 , the gear 620 and the rack 630 are both arranged inside the air inlet 200 , and the knob 610 is located outside the air inlet 200 . Specifically, the knob 610 is fixedly connected to the connecting rod 640, and the connecting rod 640 is fixedly connected to the gear 620. Both the gear 620 and the rack 630 are located in the sleeve 222 of the lower part 220 of the air intake part, and one end of the connecting rod 640 extends from the sleeve 222. Out to the outside and fixedly connected with the knob 610. The rack 630 is fixedly connected to the discharge plug 400 through the extension rod 430 . When the knob 610 is turned, the gear 620 turns accordingly, and the rack 630 moves vertically, thereby driving the discharge plug 400 to move. Of course, the knob 610 can also be a motor or a rotating cylinder, and the gear 620 is driven to rotate through such components, without manually rotating the knob 610 . Preferably, the extension rod 430 is further connected with a guide rod 440 , the guide rod 440 is in the shape of a cross, and the guide rod 440 and the extension rod 430 can be integrally formed as one part. The outer end of the guide rod 440 is attached to the inner wall of the sleeve 222, which can play a certain guiding role. In addition, as mentioned above, the protrusion 310 is attached to the outer surface of the side wall of the discharge plug 400, so when the discharge plug 400 moves, the protrusion 310 can guide the discharge plug 400, so that the discharge plug 400 400 moves to move more smoothly. Preferably, the number of bumps 310 can also be increased. For example, a bump is added radially on the opposite side of the existing bump 310. The added bump is solid, and there is no need to set a gap on it. Fitting with the outer surface of the side wall of the discharge plug 400, the movement of the discharge plug 400 can be guided by the two protrusions, which can make the moving process more stable. Of course, the number of bumps can also be three, four or other options.

2 and 5, in some embodiments, the atomic layer deposition apparatus further includes a discharge tank 721, a first exhaust pipe 921, a second exhaust pipe 922, and the first exhaust pipe 921, the second exhaust pipe 922 The connected air pump 910, the discharge tank 721 is connected with the discharge channel 320, when the air intake channel 230 is fed in, the first suction pipe 921 is connected with the reaction chamber 121, and the discharge plug 400 is moved to separate from the discharge port 250 While discharging, the second air extraction pipe 922 communicates with the discharge tank 721 . Specifically, one end of the first suction pipe 921 is connected to the suction pump 910 , and the other end is connected to the top of the reaction vessel 120 , and a first valve 931 is provided on the first suction pipe 921 . One end of the second air extraction pipe 922 is connected to the first air extraction pipe 921 , and the connection between the two is connected, and the other end is connected to the discharge tank 721 . The second air extraction pipe 922 is provided with a second valve 932 . During deposition, the first valve 931 can be opened, and the second valve 932 can be closed, and the excess gas in the reaction chamber 121 can be drawn upwards by the pump 910, that is, the gas flows in from the bottom of the reaction chamber 121 and flows out from the top. The powder is fluidized so that the powder is in a suspended state. Of course, a filter screen needs to be installed at the connection between the first air extraction pipe 921 and the reaction vessel 120, so as to prevent the powder in the reaction chamber 121 from being also extracted during the air extraction. When the material needs to be discharged after the deposition, the second valve 932 can be opened, and the first valve 931 can be closed, and the suction pump 910 can absorb the negative pressure of the discharge tank 721, so that the powder in the reaction chamber 121 can be absorbed under the action of gravity and adsorption force. It flows downward, and flows into the discharge tank 721 from the first connecting pipe 722 between the bottom end of the reaction vessel 120 and the discharge tank 721 . Of course, a filter screen is also required at the connection between the second air extraction pipe 922 and the discharge tank 721, so as to prevent the powder in the discharge tank 721 from being drawn out when the negative pressure adsorption accelerates the discharge. When discharging, the gravity of the powder itself and the additional adsorption force act together to accelerate the flow of the powder out of the reaction chamber 121, and there is less powder residue in the reaction chamber 121, and the discharging is more thorough. Referring to Fig. 1 and Fig. 2, preferably, a storage tank 724 is also provided below the discharge tank 721, and the storage tank 724 and the discharge tank 721 are connected through a second connecting pipe 723, and the storage tank 724 is arranged in the operation box 725 , the operation box 725 is provided with a slot for the operator's arm to extend into the operation box 725 inside. After discharging, the third valve 933 on the second connecting pipe 723 can be opened to connect the second connecting pipe 723 with the outside world, thereby restoring the atmospheric pressure, and the powder falls into the storage tank 724 from the second connecting pipe 723 . The operation box 725 is filled with nitrogen gas, and the operator can put his hand into the operation box 725 from the slot hole on the operation box 725, and cover the cover of the storage tank 724. Because of the protection of nitrogen gas, the obtained product can be prevented from being polluted by external impurities. powder.

The following is a brief introduction to the process of atomic layer deposition using this device. First, put the powder to be coated into the storage tank 711, heat and dry the powder through the first heater 811 outside the storage tank 711, and at the same time turn on the water pump to suck away the evaporated water vapor through the water removal pipe. While the powder is drying, close the second valve 932 and the third valve 933, open the first valve 931 and the air pump 910, and at the same time, feed nitrogen gas into the intake pipe connected to the intake pipe connection part 240, and the nitrogen gas enters the reaction chamber 121 Flow upwards, and finally flow into the first suction pipe 921 from the top to be sucked away, and the reaction chamber 121 is cleaned by nitrogen to remove impurities; Heating to make it reach the temperature range required for deposition, for example, heating to 150°C. After the preparatory work is completed, open the valve on the feeding pipe 712, open the first vibrating rod 821 and the second vibrating rod 822 at the same time, the first vibrating rod 821 makes the powder in the storage tank 711 flow downward while being vibrated and dispersed. In the reaction chamber 121 , the second vibrating rod 822 further vibrates and disperses the powder entering the reaction chamber 121 to more fully contact with the gas. The powder is in a suspended state of rolling up and down in the reaction chamber 121 , and the nitrogen gas cleans the powder to remove impurities. The cleaned nitrogen gas entrains the impurities and flows from the top of the reaction vessel 120 into the first exhaust pipe 921 . After the nitrogen gas is passed in for a period of time, the first precursor is passed into the nitrogen flow path, and the nitrogen gas flows into the reaction chamber 121 together with the first precursor. During the upward flow in the reaction chamber 121, the first precursor React with the powder and cover the surface of the powder. The excess first precursor flows into the first exhaust pipe 921 from the top of the reaction vessel 120 together with the nitrogen gas. After a period of time, stop feeding the first precursor into the nitrogen flow path, and the nitrogen gas continues to flow into the reaction chamber 121, and the nitrogen gas cleans the powder coated with the first precursor to remove excess first precursor on its surface. After the cleaning is completed, the second precursor is introduced into the nitrogen flow path, and the nitrogen envelops the second precursor and flows into the reaction chamber 121. During the upward flow in the reaction chamber 121, the second precursor reacts with the powder, Coated on the surface of the powder to complete the single layer deposition. The excess second precursor flows into the first exhaust pipe 921 from the top of the reaction vessel 120 together with the nitrogen gas. After a period of time, stop feeding the second precursor into the nitrogen flow path, and the nitrogen gas continues to flow into the reaction chamber 121, and the nitrogen gas cleans the deposited powder to remove excess second precursor on its surface. After a period of time, the first valve 931 is closed, the second valve 932 is opened, the air extraction path of the air pump 910 is switched to the second air extraction pipe 922, and the discharge plug 400 is moved down by rotating the knob 610, and the discharge port 250 is opened. The deposited powder flows downward into the discharge tank 721 under the action of gravity and the adsorption force exerted by the air pump 910 . After the powder enters the discharge tank 721 completely, the second valve 932 is closed, the third valve 933 is opened, and the powder falls into the storage tank 724 downward. Then put your hand into the operation box 725, cover the lid of the storage tank 724, and take it out of the operation box 725. The process of single-layer deposition has been described in the above-mentioned embodiments. To perform multi-layer deposition, it is only necessary to repeatedly feed the gas.

Since the storage tank 711 is set separately from the reaction vessel 120, the drying and deposition coating of the powder can be performed separately, which is beneficial to improve the production efficiency. If there are multiple batches of powder to be deposited, the above process is the deposition process of the first batch of powder. When the first batch of powder is deposited, the second batch of powder is added to the storage tank 711 for heating and drying in advance. After the first batch of powder is deposited and discharged, the knob 610 is rotated to move the discharge plug 400 upward to seal Block the discharge port 250, close the second valve 932 and the third valve 933, open the first valve 931, the air pump 910 is always running without closing, after the valve switching is completed, the reaction chamber 121 can be pumped again, and then the first valve The second batch of powder is passed into the reaction chamber 121 to deposit the second batch of powder. In the above process, you only need to switch the corresponding valve and switch the suction pipe connected to the suction pump 910 to quickly enter the deposition of the next batch. The operation is very simple, and the device continues to run, and the interval between two batches is short. Higher production efficiency.

It should be noted that, in the above process, the method of introducing the first precursor or the second precursor into the nitrogen flow path is: let the nitrogen flow through the source bottle storing the precursor, so as to bring out the nitrogen stored in the source bottle. Precursor. The precursor that needs to be supplied in the reaction chamber 121 is gas, but the precursor is mainly liquid in the storage state, and there is also a small amount of gasified gas, that is, a gas-liquid mixture in the storage state. When the nitrogen gas passes through the source bottle, it will engulf the gaseous precursor in the source bottle, and the two will mix and flow out of the source bottle, and flow into the reaction chamber 121 . In some embodiments, the aforementioned first precursor is trimethylaluminum, and the second precursor is deionized water. Preferably, a dilution tank is provided, the volume of the dilution tank is greater than the volume of the source bottle storing trimethylaluminum, the source bottle communicates with the dilution tank, the gaseous trimethylaluminum in the source bottle can overflow and flow into the dilution tank, nitrogen flow After diluting the tank, the trimethylaluminum in it is brought out. Trimethylaluminum is flammable and explosive. Since the volume of the dilution tank is larger than the volume of the source bottle storing trimethylaluminum, the amount of trimethylaluminum per unit volume in the dilution tank is less, which can improve safety and prevent accidents. Excessive methylaluminum can explode or burn.

The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.

The above-mentioned embodiments only represent several implementation modes of the present application, and the description thereof is relatively specific and detailed, but it should not be construed as limiting the scope of the patent for the invention. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the scope of protection of the patent application should be based on the appended claims.

Claims

Atomic layer deposition equipment, including:

A reaction vessel, the inside of which forms a reaction cavity;

an air intake assembly, the air intake assembly includes an air intake piece, the air intake piece is connected to the reaction vessel, and the air intake piece is provided with an air inlet capable of communicating with the reaction chamber;

A discharge assembly, the discharge assembly includes a discharge plug and a discharge pipe, the discharge pipe is connected to the reaction vessel, the discharge plug is arranged inside the discharge pipe, the discharge plug Located below the discharge port communicating with the reaction chamber, a discharge channel for the powder to flow out is formed between the discharge plug and the discharge pipe; and

A driving part, the driving part is connected with the discharge plug, and the driving part is used to drive the discharge plug to move vertically, so that the discharge plug contacts or separates from the discharge port.
The atomic layer deposition apparatus according to claim 1, wherein the discharge plug can be driven into the discharge port by the driving member to block the discharge port, and the discharge plug includes A blanking surface for blocking the discharge port, the blanking surface is a conical surface, and the radial dimension of the blanking surface gradually increases from top to bottom.
The atomic layer deposition apparatus according to claim 1, wherein, the discharge port is arranged on the air inlet, the discharge pipe is arranged inside the air inlet, and the discharge pipe is connected to the air inlet. The air inlet part is connected, and an air inlet passage for gas inflow is formed between the discharge pipe and the air inlet member, and the air inlet passage communicates with the air inlet.
The atomic layer deposition apparatus according to claim 3, wherein the air intake assembly further comprises a wind cap, the wind cap is connected to the air inlet, and the air inlet is provided on the wind cap; When the air is inflated, the air supply port is opened and communicated with the reaction chamber; when the air intake in the air intake channel stops, the air supply port is closed.
The atomic layer deposition apparatus according to claim 4, wherein the air cap comprises an inner tube, an outer tube, and a barrier, the outer tube is arranged at intervals outside the inner tube, and the barrier is located on the inner tube between the outer tube and the outer tube, the barrier is in contact with the outer tube, and the barrier is supported by the inner tube, the bottom of the inner tube communicates with the air inlet, and the inner tube The top is provided with a through hole, and the side wall of the outer tube is provided with the air supply port; when the air intake is stopped in the air intake passage, the blocking member contacts the top of the inner tube to block the through hole , and the blocking member blocks the air supply port; when the intake air enters the air intake channel, the blocking member is pushed by the gas to separate from the through hole, and the blocking member is separated from the air supply port.
The atomic layer deposition apparatus according to claim 4, wherein the air cap comprises an inner tube and an outer tube, the outer tube is sheathed on the outside of the inner tube and supported by the inner tube, and the inner tube is The bottom is in communication with the air inlet, and the top of the inner pipe is provided with a through hole; when the air intake in the air inlet passage stops, the outer pipe contacts the top of the inner pipe to block the through hole , and the bottom of the outer tube is in contact with the air intake piece; when the intake air enters the air intake channel, the outer tube is pushed by the gas to separate from the through hole, and the outer tube and the inlet The air part is separated, and the gap between the outer tube and the air inlet part forms the air delivery port.
The atomic layer deposition apparatus according to claim 4, wherein the air intake assembly comprises a plurality of air caps, one of the air caps is installed on the top of the discharge plug, and the rest of the air caps are installed on the On the air inlet part, the inner cavity of the discharge plug is hollow and the side wall is provided with a first gap communicating with the inner cavity, and the side wall of the discharge pipe is provided with a second gap; When the intake air is in the channel, the first notch communicates with the second notch, and part of the gas in the intake channel flows through the second notch, the first notch and the inner cavity to enter the wind cap, and flow into the reaction chamber through the air supply port; when the discharge plug moves to separate from the discharge port for discharge, the first gap and the second gap are staggered.
The atomic layer deposition apparatus according to claim 7, wherein a bump is provided on the inner surface of the side wall of the discharge pipe, and the bump is pressed against the outer surface of the side wall of the discharge plug, The second notch runs through the protrusion and the side wall of the discharge pipe;

Alternatively, a protrusion is provided on the outer surface of the side wall of the discharge plug, and the protrusion is pressed against the inner surface of the side wall of the discharge pipe, and the second notch passes through the protrusion and the inner surface of the discharge pipe. Describe the side wall of the discharge plug.
The atomic layer deposition apparatus according to claim 3, further comprising a transmission assembly connected between the driving member and the discharge plug, the driving member includes a knob, and the transmission assembly includes a gear and a rack , the knob is connected to the gear through a connecting rod, the gear is meshed with the rack, the rack is connected to the discharge plug, and both the gear and the rack are arranged at the inlet the inside of the intake piece and the knob is on the outside of the intake piece.
The atomic layer deposition device according to claim 1, wherein the atomic layer deposition device further comprises a discharge tank, a first suction pipe, a second suction pipe, and the first suction pipe and the second suction pipe An air suction pump with all air pipes connected, the discharge tank communicates with the discharge channel, when the intake air enters the air intake channel, the first air suction pipe communicates with the reaction chamber, and the discharge plug moves When the material is separated from the discharge port and discharged, the second suction pipe communicates with the discharge tank.