WO2023026932A1 - Composition, cured object, and method for producing cured object - Google Patents

Composition, cured object, and method for producing cured object Download PDF

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WO2023026932A1
WO2023026932A1 PCT/JP2022/031113 JP2022031113W WO2023026932A1 WO 2023026932 A1 WO2023026932 A1 WO 2023026932A1 JP 2022031113 W JP2022031113 W JP 2022031113W WO 2023026932 A1 WO2023026932 A1 WO 2023026932A1
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carbon atoms
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alkyl group
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有希子 金原
哲千 中屋敷
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株式会社Adeka
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/96Esters of carbonic or haloformic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/07Aldehydes; Ketones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3432Six-membered rings
    • C08K5/3435Piperidines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/34Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds

Definitions

  • the present invention relates to a composition, a cured product, and a method for producing the cured product.
  • Patent Document 1 When producing films, molded articles, etc. using a curable composition, in order to improve durability such as light resistance and heat resistance of the cured product, the curable composition is stabilized by adding an ultraviolet absorber. A method is known (Patent Document 1).
  • UV absorber even when the above-described UV absorber is added, it may not be possible to obtain a cured product with sufficient durability.
  • the ultraviolet absorber absorbs the light irradiated for photocuring, and the decomposition of the photopolymerization initiator may be inhibited, resulting in poor curing. be.
  • the action as an ultraviolet absorber is inactivated in the composition before curing, and a latent additive such as a latent ultraviolet absorber that can be activated after curing is added. known to use.
  • the present invention has been made in view of the above problems, and provides a curable composition capable of producing a cured product having sufficient durability, and having good sensitivity and easy production of a cured product.
  • the main purpose is to
  • the present inventors have found that a compound in which a phenolic hydroxyl group is protected by a protective group and acts as an ultraviolet absorber after elimination of the protective group, and a hindered amine as a light stabilizer. By using both compounds together, it is found that a cured product having sufficient durability can be obtained, and a curable composition with good sensitivity and easy production of a cured product can be obtained, and the present invention has been completed. reached.
  • the present invention is a composition comprising compound A represented by the following general formula (A1), (A2) or (A3), and compound B, which is a hindered amine compound having 3 or less hindered amine structures.
  • R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, a group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or -O-R 9 , wherein at least one of R 1 and R 2 is -O-R 9 , R 3 and R 4 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to 4 carbon atoms.
  • R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms.
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group
  • R 1 ' and R 2 ' are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms, , an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ' and R 2 ' is —OR is 9 ; R 5 and R 6 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms, R
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group
  • R 1 ′′ and R 2 ′′ are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 6 to 20 carbon atoms, aryl group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ′′ and R 2 ′′ is —OR is 9 ; R 7 and R 8 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atom atom
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or a combination of these 2 optionally substituted with a valent group
  • R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, aryl group, heterocyclic ring-containing group, alkenyl
  • the present invention relates to a composition, a cured product thereof, and a method for producing the cured product.
  • the composition, cured product, and method for producing the cured product of the present invention are described in detail below.
  • composition of the present invention is characterized by comprising a compound A represented by the following general formula (A1), (A2) or (A3), and a compound B which is a hindered amine compound having 3 or less hindered amine structures. and
  • Compound A is a compound represented by the following general formula (A1), (A2) or (A3).
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group
  • the halogen atom represented by ) includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, and the like.
  • the alkyl group having 1 to 40 carbon atoms represented by R 1 etc. includes methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl, tert-amyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, tert - octyl, adamantyl and the like.
  • Examples of the aryl group having 6 to 20 carbon atoms represented by R 1 etc. include phenyl, naphthyl, anthracenyl and the like.
  • Examples of the arylalkyl group having 7 to 20 carbon atoms represented by R 1 etc. include benzyl, fluorenyl, indenyl and 9-fluorenylmethyl groups.
  • the heterocyclic ring-containing group having 2 to 20 carbon atoms represented by R 1 etc. includes pyridyl, pyrimidyl, pyridazyl, piperidyl, pyranyl, pyrazolyl, triazyl, pyrrolyl, quinolyl, isoquinolyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl, benzothiophenyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, 2-pyrrolidinon-1-yl, 2-piperidon-1-yl, 2,4 -dioxyimidazolidin-3-yl, 2,4-dioxyoxazolidin-3-yl and the like.
  • the alkyl group having 1 to 20 carbon atoms represented by R 9 satisfies the predetermined number of carbon atoms among the groups exemplified as the alkyl group having 1 to 40 carbon atoms represented by R 1 etc. things are mentioned.
  • alkenyl groups having 2 to 20 carbon atoms represented by R 9 include vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl and 2-octenyl. be done.
  • the aryl group having 6 to 20 carbon atoms, the arylalkyl group having 7 to 20 carbon atoms, and the heterocyclic ring-containing group having 2 to 20 carbon atoms represented by R 9 are represented by R 1 and the like. It is the same as an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, and a heterocyclic ring-containing group having 2 to 20 carbon atoms.
  • Examples of the trialkylsilyl group represented by R 9 include trimethylsilyl, triethylsilyl, ethyldimethylsilyl and the like.
  • Examples of the alkyl group having 1 to 8 carbon atoms represented by R′ include those satisfying a predetermined number of carbon atoms among the groups exemplified as the alkyl group represented by R 1 and the like.
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or a combination of these 2 may be substituted with a valent group.
  • the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group have a structure in which the methylene group in these groups is substituted with the divalent group.
  • the group of is also included. However, the number of carbon atoms in each group after replacement is 1 or more.
  • the group in which the methylene group at the end of the alkyl group is substituted with -O- includes methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso-butyloxy, amyloxy, iso -amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyloxy, tert-heptyl oxy, 1-octyloxy, iso-octyloxy, tert-octyloxy and the like.
  • the number of carbon atoms defines the number of carbon atoms in the group before the substitution.
  • the 1 to 40 carbon atoms means that the methylene group in the alkyl group is the above divalent group. It refers to the number of carbon atoms before being substituted with and does not refer to the number of carbon atoms after being substituted.
  • a methyloxy group corresponds to a group in which a methylene group in an ethyl group is replaced with -O-.
  • the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent. Having a substituent means that a hydrogen atom in the group is replaced with a substituent. That is, in the present invention, the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group have a structure in which a hydrogen atom in these groups is substituted with a substituent described below. A group is also included.
  • substituents examples include ethylenically unsaturated groups such as vinyl, allyl, acryl, and methacryl; halogen atoms such as fluorine, chlorine, bromine, and iodine; acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, and phenylcarbonyl.
  • Acyl groups such as (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, oxaloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl, carbamoyl; acetyloxy, benzoyloxy, etc.
  • the number of carbon atoms in a group defines the number of carbon atoms in the group after the substitution when the hydrogen atoms in the group are substituted.
  • the 1 to 40 carbon atoms refers to the number of carbon atoms after the hydrogen atom is substituted, and the hydrogen atom is substituted. It does not refer to the number of carbon atoms before
  • Compound A represented by the general formula (A1) when m1 is 2, has a structure in which two specific groups are bonded via a divalent atom or a linking group represented by X b1 or a direct bond. and when m1 is 3 to 10, it has a structure in which m1 specific groups are linked via an m1-valent atom or a linking group represented by Xb1 . The m1 specific groups are the same or different from each other. Further, the compound A represented by the general formula (A2), when m2 is 2, has a structure in which two specific groups are bonded by a divalent atom or a linking group represented by X b2 or a direct bond.
  • m2 When m2 is 3 to 10, it has a structure in which m2 specific groups are linked by an m2-valent atom or a linking group represented by X b2 .
  • the m2 specific groups may be the same or different.
  • X b1 and X b2 may be collectively referred to as X
  • m1 and m2 may be collectively referred to as m.
  • the atom or linking group represented by X includes a nitrogen atom, an oxygen atom, a sulfur atom, a phosphorus atom, a group represented by (II-a) or (II-b) below, —CO—, —NR 10 - and m-valent aliphatic hydrocarbon groups having 1 to 120 carbon atoms, aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms.
  • R 10 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic ring-containing group having 2 to 35 carbon atoms;
  • the methylene group in the group hydrocarbon group, aromatic ring-containing hydrocarbon group and heterocyclic ring-containing group is -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO -O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO -, -NH-CO-O-, -NH-CO-O-, -NR 11 -, -S-S-, -SO 2 - or a nitrogen atom or a combination thereof, the aromatic The aromatic ring in the ring-containing hydrocarbon
  • the m-valent aliphatic hydrocarbon group having 1 to 120 carbon atoms represented by X includes an alkyl group having 1 to 120 carbon atoms, a cycloalkyl group having 3 to 120 carbon atoms and a cycloalkyl group having 4 to 120 carbon atoms.
  • a group obtained by removing m ⁇ 1 hydrogen atoms from the cycloalkylalkyl group of 120 and the like can be mentioned.
  • the alkyl group having 1 to 120 carbon atoms may be linear or branched.
  • Straight chain alkyl groups include methyl, ethyl, propyl, butyl, iso-amyl, tert-amyl, hexyl, heptyl and octyl.
  • Branched alkyl groups include iso-propyl, sec-butyl, tert-butyl, iso-butyl, iso-pentyl, tert-pentyl, 2-hexyl, 3-hexyl, 2-heptyl, 3-heptyl and iso-heptyl.
  • tert-heptyl iso-octyl, tert-octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, hebrotadecyl, octadecyl and the like.
  • Cycloalkyl groups having 3 to 120 carbon atoms include saturated monocyclic alkyl groups having 3 to 120 carbon atoms, saturated polycyclic alkyl groups having 3 to 120 carbon atoms, and hydrogen atoms in the rings of these groups. Examples include groups having 4 to 120 carbon atoms in which one or more atoms are substituted with an alkyl group.
  • the saturated monocyclic alkyl groups include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl and cyclodecyl.
  • Examples of the saturated polycyclic alkyl groups include adamantyl, decahydronaphthyl, octahydropentalene and bicyclo[1.1.1]pentanyl.
  • Examples of the alkyl group substituting the hydrogen atom in the ring of the saturated monocyclic or saturated polycyclic alkyl group include the groups exemplified as the alkyl group having 1 to 120 carbon atoms. Bornyl etc. are mentioned as a group by which 1 or more of the hydrogen atoms in the ring of the saturated polycyclic alkyl group were substituted by the alkyl group.
  • a cycloalkylalkyl group having 4 to 120 carbon atoms means a group having 4 to 120 carbon atoms in which a hydrogen atom of an alkyl group is substituted with a cycloalkyl group.
  • a cycloalkyl group in a cycloalkylalkyl group may be monocyclic or polycyclic.
  • Cycloalkylalkyl groups having 4 to 120 carbon atoms in which the cycloalkyl group is monocyclic include cyclopropylmethyl, 2-cyclobutylethyl, 3-cyclopentylpropyl, 4-cyclohexylbutyl, cycloheptylmethyl, cyclooctylmethyl, 2-cyclononylethyl, 2-cyclodecylethyl and the like.
  • the polycyclic cycloalkylalkyl groups having 4 to 20 carbon atoms include 3-3-adamantylpropyl and decahydronaphthylpropyl.
  • the m-valent aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms represented by X is a hydrocarbon group containing an aromatic hydrocarbon ring and not containing a heterocyclic ring, and an aliphatic hydrocarbon group. may have.
  • aromatic hydrocarbon ring-containing groups include groups obtained by removing m ⁇ 1 hydrogen atoms from aryl groups having 6 to 35 carbon atoms and arylalkyl groups having 7 to 35 carbon atoms.
  • the aryl group having 6 to 35 carbon atoms may have a monocyclic structure, a condensed ring structure, or two aromatic hydrocarbon rings linked together.
  • Examples of the aryl group having a condensed ring structure having 6 to 35 carbon atoms include hydrocarbon-type aromatic condensed ring groups having a structure in which two or more aromatic hydrocarbon rings are condensed and having 7 to 35 carbon atoms. .
  • Examples of monocyclic aryl groups having 6 to 35 carbon atoms include phenyl, tolyl, xylyl, ethylphenyl, 2,4,6-trimethylphenyl and the like.
  • Hydrocarbon type aromatic condensed ring groups having 7 to 20 carbon atoms include naphthyl, anthracenyl, phenanthryl, pyrenyl, fluorenyl and indenofluorenyl.
  • the aryl group in which two aromatic hydrocarbon rings are linked may be one in which two monocyclic aromatic hydrocarbon rings are linked. It may be one in which an aromatic hydrocarbon ring having a condensed ring structure is linked to an aromatic hydrocarbon ring having a condensed ring structure.
  • a linking group that links two aromatic hydrocarbon rings includes a single bond, a sulfide group (--S--), a carbonyl group, and the like.
  • the aryl group in which two monocyclic aromatic hydrocarbon rings are linked includes biphenyl, diphenylsulfide, benzoylphenyl and the like.
  • An arylalkyl group having 7 to 35 carbon atoms is a group in which one or more hydrogen atoms in an alkyl group are substituted with an aryl group.
  • Arylalkyl groups having 7 to 35 carbon atoms include benzyl, fluorenyl, indenyl, 9-fluorenylmethyl, ⁇ -methylbenzyl, ⁇ , ⁇ -dimethylbenzyl, phenylethyl and naphthylpropyl groups.
  • the m-valent heterocyclic ring-containing group having 2 to 35 carbon atoms represented by X includes a heterocyclic group having 2 to 10 carbon atoms and one or more hydrogen atoms in the m-valent hydrocarbon group. Examples thereof include groups having 3 to 35 carbon atoms substituted with the heterocyclic group having 2 to 10 carbon atoms.
  • a heterocyclic group having 2 to 10 carbon atoms is a group obtained by removing one hydrogen atom from a heterocyclic compound.
  • the heterocyclic group may have a monocyclic structure or a condensed ring structure.
  • Examples of the heterocyclic group having a condensed ring structure having 2 to 10 carbon atoms include a heterocyclic ring-containing condensed ring group having a structure in which a heterocyclic ring and a heterocyclic ring or a hydrocarbon ring are condensed and having 3 to 10 carbon atoms. be done.
  • heterocyclic groups include pyridyl, quinolyl, thiazolyl, tetrahydrofuranyl, dioxolanyl, tetrahydropyranyl, methylthiophenyl, hexylthiophenyl, benzothiophenyl, pyrrolyl, pyrrolidinyl, imidazolyl, imidazolidinyl, imidazolinyl, pyrazolyl, pyrazolidinyl, piperidinyl.
  • the heterocyclic group may have a substituent, and examples of the substituent include a halogen atom, a cyano group, a nitro group, a hydroxyl group, an amino group, a carboxy group, a methacryloyl group, an acryloyl group, an epoxy group, a vinyl group, and a vinyl ether. groups, mercapto groups and isocyanate groups.
  • heterocyclic group in the group having 3 to 35 carbon atoms in which one or more hydrogen atoms in the hydrocarbon group are substituted with the above heterocyclic group having 2 to 10 carbon atoms The groups exemplified as the heterocyclic group can be mentioned.
  • m-valent hydrocarbon group among the groups exemplified as the aliphatic hydrocarbon group having 1 to 120 carbon atoms and the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, the number of carbon atoms is from 1 to A group obtained by removing m ⁇ 1 hydrogen atoms from 25 can be mentioned.
  • the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 10 and R 11 the aliphatic hydrocarbon group having 1 to 120 carbon atoms was exemplified in the explanation of the group represented by X. Among the groups, those having a predetermined number of carbon atoms are included.
  • the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by R 10 and R 11 the carbon atom
  • the same groups as exemplified as aromatic ring-containing hydrocarbon groups of 6 to 35 carbon atoms and heterocyclic ring-containing groups of 2 to 35 carbon atoms can be mentioned.
  • the atom represented by X includes an oxygen atom and a sulfur atom
  • the linking group includes an alkylene group such as methylene, ethylene, propylene, butylene, and butyldiyl; methylene in the alkylene group; groups substituted with -O-, -S-, -CO-O-, -O-CO-; diol residues such as ethanediol, propanediol, butanediol, pentanediol, hexanediol; ethanedithiol, Dithiol residues such as propanedithiol, butanedithiol, pentanedithiol, hexanedithiol; phenylene, arylene groups such as naphthylene; catechol, bifunctional phenol residues such as bisphenol; 2,4,8,10-tetraoxaspiro [5, 5] undecane; pyridine
  • the atom represented by X includes a nitrogen atom and a phosphorus atom, and the linking group includes alkylidine such as propylidine and 1,1,3-butylidine; phenyl-1,3, 5-trimethylene; isocyanuric ring, triazine ring, etc.;
  • examples of the linking group represented by X include groups represented by the following general formula (1).
  • examples of the linking group represented by X include groups represented by the following general formula (2).
  • the linking group represented by X includes groups represented by the following general formula (3).
  • the linking group represented by X includes a group represented by the following general formula (4).
  • the linking group represented by X includes groups represented by the following general formula (5).
  • Y 1 is a single bond, —CR 55 R 56 —, —NR 57 —, a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, 6 to 35 carbon atoms, An aromatic ring-containing hydrocarbon group or a heterocyclic ring-containing group having 2 to 35 carbon atoms, or a divalent group represented by the following general formulas (1-1) to (1-3), wherein the carbon atom
  • the methylene group in the aliphatic hydrocarbon group of 1 to 35, the aromatic ring-containing hydrocarbon group of 6 to 35 carbon atoms and the heterocyclic ring-containing group of 2 to 35 carbon atoms is -O-, -S-, -CO-, -CO-O-, -O-CO- or -NH- or a combination thereof
  • R 55 and R 56 represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 20 carbon atoms or an arylal
  • R 59 represents a hydrogen atom, a phenyl group which may have a substituent, or a cycloalkyl group having 3 to 10 carbon atoms
  • R 60 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms or a halogen atom, and the alkyl group, alkoxy group and alkenyl group are substituents; may have c1 is an integer from 0 to 5, * means that the * portion is attached to the adjacent group.
  • R 61 and R 62 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an oxy group, an arylthio group having 6 to 20 carbon atoms, an arylalkenyl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms, or a halogen atom; and the methylene group in the alkyl group and arylalkyl group may be substituted with an unsaturated bond, -O- or -S-, adjacent R 61 may form a ring, c2 represents a number from 0 to 4, c3 represents a number from 0 to 8, c4 represents a number from 0 to 4, c5 represents a number from 0 to 4, The sum of the numbers of c4 and c
  • Y 11 is a trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a represents a heterocycle-containing group
  • Z 1 , Z 2 and Z 3 are each independently a direct bond, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO 2 -, -SS-, - SO—, >NR 62 , >PR 62 , an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic ring-containing group having 2 to 35 carbon atoms; represent, R 62 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic ring-containing group having 2 to 35 carbon atoms;
  • Y 12 is a carbon atom, a tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or 2 carbon atoms represents a heterocyclic ring-containing group of up to 35, and among the aliphatic hydrocarbon group having 1 to 35 carbon atoms, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms
  • the methylene group of -CO-O-, -O-, -O-CO-, -NH-CO-, -NH- or -CO-NH- may be substituted
  • Z 1 to Z 4 are each independently a group in the same range as the groups represented by Z 1 to Z 3 in the general formula (2), * is a * moiety and means to bond with the adjacent group.
  • Y 13 is a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a represents a heterocyclic ring-containing group, and a methylene group in the aliphatic hydrocarbon group having 2 to 35 carbon atoms, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms is optionally substituted with -CO-O-, -O-, -O-CO-, -NH-CO-, -NH- or -CO-NH-, Z 1 to Z 5 are each independently a group in the same range as the groups represented by Z 1 to Z 3 in the general formula (2), * is a * moiety and means to bond with the adjacent group. )
  • Y 14 is a hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a represents a heterocyclic ring-containing group, and is a methylene group in the aliphatic hydrocarbon group having 2 to 35 carbon atoms, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic ring-containing group having 2 to 35 carbon atoms is optionally substituted with -CO-O-, -O-, -O-CO-, -NH-CO-, -NH- or -CO-NH-, Z 1 to Z 6 are each independently a group in the same range as the groups represented by Z 1 to Z 3 in the general formula (2), * is a * moiety and means to bond with the adjacent group. )
  • the divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 1 in the general formula (1) includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • group hydrocarbon groups those having a predetermined number of carbon atoms can be mentioned.
  • the group represented by the above X Examples include the same groups as those exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description.
  • the alkyl group having 1 to 8 carbon atoms represented by R 55 and R 56 in the general formula (1) is exemplified as an alkyl group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups described above, those having a predetermined number of carbon atoms can be mentioned.
  • the aryl group having 6 to 20 carbon atoms and the arylalkyl group having 7 to 20 carbon atoms represented by R 55 and R 56 in the general formula (1) Among the groups exemplified as the aryl group having 6 to 35 carbon atoms and the arylalkyl group having 7 to 35 carbon atoms, those satisfying the predetermined number of carbon atoms can be mentioned.
  • the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 57 and R 58 in the general formula (1) includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • group hydrocarbon groups those having a predetermined number of carbon atoms can be mentioned.
  • the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by R 57 and R 58 in the general formula (1) are represented by the above X and the same groups as those exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description of the group.
  • the cycloalkyl group having 3 to 10 carbon atoms represented by R 59 in the general formula (1-1) the cycloalkyl group having 3 to 120 carbon atoms in the description of the group represented by X Among the exemplified groups, those having a predetermined number of carbon atoms are included.
  • the alkyl group having 1 to 10 carbon atoms represented by R 60 in the general formula (1-1) is exemplified as the alkyl group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups, those having a predetermined number of carbon atoms are included.
  • the alkoxy group having 1 to 10 carbon atoms represented by R 60 in the general formula (1-1) includes methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso- butyloxy, amyloxy, iso-amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyl oxy, tert-heptyloxy, 1-octyloxy, iso-octyloxy, tert-octyloxy and the like.
  • the alkenyl group having 2 to 10 carbon atoms represented by R 60 in the general formula (1-1) includes vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2 -pentenyl, 2-octenyl and the like.
  • Examples of the halogen atom represented by R 60 in the general formula (1-1) include fluorine atom, chlorine atom, bromine atom and iodine atom.
  • the heterocyclic ring-containing group having 2 to 20 carbon atoms includes an alkyl group having 1 to 120 carbon atoms, an aryl group having 6 to 35 carbon atoms, and an aryl group having 7 to 35 carbon atoms in the description of the group represented by X.
  • the groups exemplified as the arylalkyl group and the heterocyclic ring-containing group having 2 to 35 carbon atoms those satisfying a predetermined number of carbon atoms can be mentioned.
  • Examples of the aryloxy group having 6 to 20 carbon atoms represented by R 61 and R 62 in the general formula (1-3) include phenyloxy, naphthyloxy, 2-methylphenyloxy, 3-methylphenyloxy, 4-methylphenyloxy, 4-vinylphenyldioxy, 3-iso-propylphenyloxy, 4-iso-propylphenyloxy, 4-butylphenyloxy, 4-tert-butylphenyloxy, 4-hexylphenyloxy, 4-cyclohexylphenyloxy, 4-octylphenyloxy, 4-(2-ethylhexyl)phenyloxy, 2,3-dimethylphenyloxy, 2,4-dimethylphenyloxy, 2,5-dimethylphenyloxy, 2,6- dimethylphenyloxy, 3,4-dimethylphenyloxy, 3,5-dimethylphenyloxy, 2,4-di-tert-butylphenyloxy,
  • the oxygen atom of the aryloxy group having 6 to 20 carbon atoms is substituted with a sulfur atom. and the like.
  • the oxygen atom of the aryloxy group having 6 to 20 carbon atoms is vinyl or allyl.
  • halogen atoms represented by R 61 and R 62 in the general formula (1-3) include the same halogen atoms as those represented by R 60 in the general formula (1-1).
  • Examples of the ring that may be formed by adjacent R 61 groups in the general formula (1-3) include a cyclopentene ring, a cyclohexene ring and a benzene ring.
  • the trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 11 in the general formula (2) includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • trivalent groups obtained by removing two hydrogen atoms from the groups exemplified as group hydrocarbon groups trivalent groups having a predetermined number of carbon atoms can be mentioned.
  • the trivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 11 in the general formula (2) are represented by the above X trivalent groups obtained by removing two hydrogen atoms from the groups exemplified as aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the groups.
  • the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Z 1 , Z 2 and Z 3 in the general formula (2) includes Among divalent groups obtained by removing one hydrogen atom from the groups exemplified as the 120 aliphatic hydrocarbon groups, divalent groups having a predetermined number of carbon atoms can be mentioned.
  • the above X A divalent group obtained by removing one hydrogen atom from the groups exemplified as aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the group represented by mentioned.
  • the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 62 in the general formula (2) is an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • the groups exemplified as the groups those having a predetermined number of carbon atoms can be mentioned.
  • the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by R 62 in the general formula (2) the group represented by the above X Examples include the same groups as those exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description.
  • the tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 12 includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • tetravalent groups obtained by removing three hydrogen atoms from the groups exemplified as group hydrocarbon groups those satisfying a predetermined number of carbon atoms can be mentioned.
  • the tetravalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 12 are represented by the above X tetravalent groups obtained by removing three hydrogen atoms from the groups exemplified as the aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and the heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the groups.
  • the pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 13 includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • pentavalent groups obtained by removing four hydrogen atoms from the groups exemplified as group hydrocarbon groups those satisfying a predetermined number of carbon atoms can be mentioned.
  • the pentavalent C 6-35 aromatic ring-containing hydrocarbon group and the C 2-35 heterocyclic ring-containing group represented by Y 13 are represented by the above X and a pentavalent group obtained by removing four hydrogen atoms from the groups exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description of the group.
  • the hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 14 includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X.
  • hexavalent groups obtained by removing five hydrogen atoms from the groups exemplified as group hydrocarbon groups those satisfying a predetermined number of carbon atoms can be mentioned.
  • the hexavalent C 6-35 aromatic ring-containing hydrocarbon group and the C 2-35 heterocyclic ring-containing group represented by Y 14 are represented by the above X hexavalent groups obtained by removing five hydrogen atoms from the groups exemplified as aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the groups.
  • the aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group, heterocyclic ring-containing group, alkoxy group, alkenyl group, aryloxy group, arylthio group and arylalkenyl group may have a substituent. Having a substituent means that a hydrogen atom in the group is replaced with a substituent. That is, in the present invention, the aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group, heterocyclic ring-containing group, alkoxy group, alkenyl group, aryloxy group, arylthio group and arylalkenyl group include hydrogen A group having a structure in which an atom is substituted with a substituent described below is also included.
  • substituents examples include the substituents exemplified in the description of the group represented by R 1 and the like.
  • Compound A used in the present invention is a compound represented by the general formula (A1), (A2) or (A3).
  • the compound A can show ultraviolet absorption ability by removing R 9 protecting the phenolic hydroxyl group by heating. Therefore, the composition of the present invention containing the compound A can produce a cured product excellent in durability, ie, light resistance.
  • the amount added In order to further increase the durability of the cured product using compound A, the amount added must be increased, but the increased amount may reduce the development speed of the photocurable composition.
  • durability can be imparted without increasing the amount of compound A, and the development speed of the photocurable composition can be maintained.
  • Conventional ultraviolet absorbers when added to the polymerization system, absorb the light irradiated for photocuring, thereby inhibiting the decomposition of the photopolymerization initiator, thereby inhibiting the curing of the photocurable composition, Decrease sensitivity.
  • compound A has a low absorbability of light irradiated for photocuring during polymerization, so inhibition of decomposition of the photopolymerization initiator is suppressed, and curing of the photocurable composition is inhibited. Because it does not, the decrease in sensitivity can be suppressed. Furthermore, compound A can maintain good sensitivity even when used in combination with compound B as a photostabilizer.
  • a UV absorber having a phenolic hydroxyl group tends to aggregate in the composition due to the influence of the phenolic hydroxyl group, and it is difficult to increase the amount added to the composition.
  • Compound A has a structure in which the phenolic hydroxyl group is protected by R9 , and is therefore excellent in dispersion stability in the composition. As a result, the compound A can be easily added to the composition and easily dispersed in the cured product, compared with conventional UV absorbers having a phenolic hydroxyl group, and its function can be fully realized. can be demonstrated in
  • the amount of light transmitted along the thickness direction of the composition is greatly reduced, for example, the adhesion between the cured product and the substrate is reduced, and curing It causes a problem that the object is easily peeled off from the base material.
  • the absorption of light irradiated during curing can be suppressed by using compound A as described above, and as a result, a cured product in which peeling from the substrate is suppressed can be obtained.
  • the composition of the present invention contains, as a resin component, a component such as a photosensitive resin whose solubility in an alkaline developer changes upon irradiation with light, the ability to absorb irradiated light is low for developing photosensitivity. , it becomes possible to stably express the photosensitivity. Accordingly, the composition of the present invention can be a photosensitive composition that provides a cured product with excellent photosensitivity and excellent durability.
  • the compound A has a structure in which a phenolic hydroxyl group is protected by a protecting group R9 , and can be rendered to have ultraviolet absorbing ability by elimination of the protecting group R9 .
  • Having ultraviolet absorption ability means being able to absorb light in the wavelength range of 250 nm or more and 450 nm or less.
  • the maximum absorption wavelength after elimination of the protecting group R 9 is in the wavelength range of 250 nm or more and 600 nm or less, preferably 250 nm or more and 400 nm or less, more preferably 260 nm or more and 390 nm or less, particularly It is preferably 280 nm or more and 380 nm or less. This is because the composition of the present invention facilitates production of a durable cured product.
  • a compound dissolved in a solvent such as chloroform at a concentration of 0.01 g/L is used as an evaluation sample, and this is placed in a quartz cell (optical path length 10 mm, thickness 1 .25 mm) and measure the absorbance using an absorptiometer (for example, U-3900 (manufactured by Hitachi High-Tech Science)).
  • a quartz cell optical path length 10 mm, thickness 1 .25 mm
  • an absorptiometer for example, U-3900 (manufactured by Hitachi High-Tech Science)
  • the compound A can have a maximum absorption wavelength in the wavelength range of 250 nm or more and 600 nm or less on the shorter wavelength side than the compound after elimination of the protecting group R9 .
  • the difference between the maximum absorption wavelength of the compound A and the maximum absorption wavelength of the compound after elimination of the protective group R9 can be 1 nm or more, preferably 1 nm or more and 100 nm or less, and particularly 1 nm or more and 50 nm. The following are preferred. This is because when the difference in the maximum absorption wavelength is within the above range, the compound A is excellent in the effect of suppressing curing inhibition.
  • the protecting group R9 of the compound A can be released by heating.
  • the temperature at which the protecting group R 9 contained in the compound A is eliminated may be 100° C. or higher and 300° C. or lower, preferably 120° C. or higher and 250° C. or lower, particularly 150° C. or higher and 230° C. or lower. Preferably. This is because the above temperature facilitates the production of a durable cured product of the composition.
  • the detachment temperature of the protective group can be measured, for example, as the temperature at which the first weight loss begins in the weight change measured using a STA (simultaneous differential thermogravimetric analyzer).
  • STA semiconductor differential thermogravimetric analyzer
  • 10 mg of compound A is filled in a measurement container, the measurement temperature range is 30° C. to 350° C., and the temperature increase rate is 10° C./min.
  • STA7000 manufactured by Hitachi High-Tech Science Co., Ltd.
  • STA7000 manufactured by Hitachi High-Tech Science Co., Ltd.
  • At least one of R 1 and R 2 in the general formula (A1) is —OR 9 .
  • one of R 1 and R 2 is - OR 9 is preferred.
  • both R 1 and R 2 are preferably —OR 9 .
  • the other is a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms.
  • an arylalkyl group having 7 to 20 carbon atoms or a heterocyclic ring-containing group having 2 to 20 carbon atoms more preferably a hydrogen atom or an alkyl group having 1 to 40 carbon atoms, particularly a hydrogen atom or carbon
  • An alkyl group having 1 to 5 atoms is preferable, and a hydrogen atom and an unsubstituted alkyl group having 1 to 5 carbon atoms are particularly preferable. This is because the compound A has a large change in ultraviolet absorption ability and can suppress the occurrence of curing inhibition.
  • R 1 and R 2 described above also apply to R 1 ′ and R 2 ′ in the general formula (A2) and R 1 ′′ and R 2 ′′ in the general formula (A3).
  • R 9 is preferably an alkyl group having 1 to 20 carbon atoms or an alkenyl group having 2 to 20 carbon atoms, more preferably an alkyl group having 1 to 20 carbon atoms, particularly carbon An alkyl group having 1 to 8 atoms is preferred. This is because the compound A has a large change in ultraviolet absorption ability. Moreover, the composition of the present invention facilitates the production of a durable cured product.
  • R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 carbon atoms.
  • -20 heterocyclic ring-containing groups in which the methylene group at the end on the oxygen atom side is substituted with -CO-O-, i.e., -CO-O- is bonded to the end on the oxygen atom side It is preferable that there is
  • an alkyl group having 1 to 20 carbon atoms or an alkenyl group having 2 to 20 carbon atoms in which the methylene group at the terminal on the oxygen atom side is substituted with —CO—O—.
  • the alkyl group having 1 to 20 carbon atoms or the alkenyl group having 2 to 20 carbon atoms in which the methylene group at the end on the oxygen atom side is substituted with —CO—O— means “*—CO—O—R 300 " is a group.
  • * represents a bond with an oxygen atom
  • R 300 represents an alkyl group having 1 to 19 carbon atoms or an alkenyl group having 2 to 19 carbon atoms.
  • R 9 is preferably an alkyl group having 1 to 20 carbon atoms in which the terminal methylene group on the oxygen atom side is substituted with —CO—O—, particularly the terminal methylene group on the oxygen atom side is — It is preferably an alkyl group having 1 to 8 carbon atoms substituted with CO-O-, and among these, particularly the terminal methylene group on the oxygen atom side is substituted with -CO-O-. It is preferably an alkyl group having 1 to 8 carbon atoms that is not Preferably. This is because R9 can be easily eliminated from the compound A by heating, for example, to form a phenolic hydroxyl group. As a result, the composition of the present invention can be easily produced into a durable cured product. Examples of those having an alkyl group in which the methylene group at the end on the oxygen atom side is substituted with --CO--O-- include compounds represented by formula (A1-1) described later.
  • R 3 , R 4 , R 5 , R 6 , R 7 and R 8 in the general formulas (A1), (A2) and (A3) are each independently a halogen atom or an alkyl having 1 to 40 carbon atoms is preferably an unsubstituted alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms having an ethylenically unsaturated group as a substituent, and a methylene group at the end an alkyl group having 1 to 40 carbon atoms (alkoxy group having 1 to 40 carbon atoms) substituted with -O-, and a methylene group having 1 to 40 carbon atoms substituted with -O-CO-
  • alkyl groups unsubstituted alkoxy groups with 1 to 10 carbon atoms, alkoxy groups with 1 to 10 carbon atoms with ethylenically unsaturated groups as substituents, and methylene groups in the groups are - an unsubstituted alkyl group having 1 to 10 carbon atoms substituted with O-CO-, or an unsubstituted carbon atom in which a methylene group in the group is substituted with -O-CO- An alkoxy group of number 1 to 10 is preferred.
  • R 4 in the general formula (A1) is preferably an unsubstituted alkyl group having 1 to 20 carbon atoms, and an unsubstituted alkyl group having 3 to 15 carbon atoms. and preferably an unsubstituted alkyl group having 5 to 12 carbon atoms. R 4 is also preferably an unsubstituted alkoxy group having 1 to 10 carbon atoms.
  • R 5 and R 6 in the general formula (A2) are preferably unsubstituted alkoxy groups having 1 to 10 carbon atoms.
  • R 5 and R 6 are also preferably unsubstituted alkyl groups having 1 to 10 carbon atoms, and are preferably unsubstituted alkyl groups having 1 to 5 carbon atoms. more preferred.
  • R 7 in the general formula (A3) is preferably an unsubstituted alkyl group having 1 to 10 carbon atoms.
  • R 7 is preferably an unsubstituted alkoxy group having 1 to 15 carbon atoms, more preferably an unsubstituted alkoxy group having 2 to 10 carbon atoms.
  • composition of the present invention facilitates production of a durable cured product.
  • the bonding position of R 4 may be any bondable position, but is preferably ortho or para to the bonding position of —OR 9 .
  • the bonding position of R 5 may be any bondable position, but is preferably the meta position with respect to the bonding position of —OR 9 .
  • the binding position of R 6 may be any binding position, but is preferably the meta position with respect to the binding position of --OR 9 .
  • the bonding position of R 7 may be any bondable position, but is preferably ortho or meta with respect to the bonding position of —OR 9 .
  • a1 in the general formula (A1) is an integer of 0 to 4, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 to 1.
  • a2 in the general formula (A1) is an integer of 0 to 2, preferably 1 to 2 from the viewpoint of solubility. This is because the composition facilitates production of a cured product having durability and good sensitivity.
  • m1 in the general formula (A1) is an integer of 1 to 10, but from the viewpoint of obtaining a curable composition having good sensitivity and easy production of a cured product having excellent durability, 1 An integer of up to 5 is preferred, and an integer of 1-2 is particularly preferred.
  • a3 in the general formula (A2) is an integer of 0 to 4, and a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 to 1.
  • a4 in the general formula (A2) is an integer of 0 to 3, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 2, particularly preferably 1 to 2.
  • m2 in the general formula (A2) is an integer of 1 to 10, but from the viewpoint of obtaining a curable composition having good sensitivity and easy production of a cured product having excellent durability, 1 An integer of up to 5 is preferred, and an integer of 1-2 is particularly preferred.
  • a5 in the general formula (A3) is an integer of 0 to 3, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 2, particularly preferably an integer of 1 to 2.
  • a6 in the general formula (A3) is an integer of 0 to 3-m3, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained; It is preferably 0 or 2 from the viewpoint of ease of synthesis.
  • m3 in the general formula (A3) is an integer of 1 to 3, from the viewpoint that a curable composition having good sensitivity and easy production of a cured product having excellent durability can be obtained. , 1 or 3.
  • the linking group represented by X b1 in the general formula (A1) and X b2 in the general formula (A2) is m1 in the general formula (A1) and m1 in the general formula (A2)
  • m2(m) is 2, it is preferably an aliphatic hydrocarbon group having 1 to 120 carbon atoms, more preferably an alkylene group or diol residue having 1 to 10 carbon atoms. It is more preferably an alkylene group having 1 to 5 carbon atoms such as methylene group of number 1, and particularly preferably an alkylene group having 1 to 3 carbon atoms. This is because a curable composition that facilitates production of a cured product having excellent durability can be obtained, and synthesis is easy.
  • the linking group represented by X is also preferably a substituent represented by the following general formula (101) or (102) or a group selected from Group 1 below.
  • the linking group represented by X is preferably a group selected from the following group 2 when (2) m is 3, and (3) a group selected from the following group 3 when m is 4.
  • Y 111 and Y 115 each independently represent an optionally substituted aliphatic hydrocarbon group having 1 to 8 carbon atoms
  • Y 112 and Y 114 are each independently -O-, -CO-, -CO-O-, -O-CO-, -NR 13 -, -CO-NR 13 - or -NR 13 -CO- represents the group represented
  • R 13 represents a hydrogen atom or an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent
  • Y 113 is —CR 14 R 15 —, —NR 16 —, an optionally substituted divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, optionally having a substituent represents an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a substituent represented by the following general formula (103)
  • R 14 and R 15 each independently represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6
  • Y 111 , Y 115 , R 13 , Y 113 and R 16 are —COO; -, -O-, -OCO-, -NHCO-, -NH- or -CONH- may be substituted, * represents a binding site.
  • Y 119 and Y 120 each independently represent an optionally substituted aliphatic hydrocarbon group having 1 to 8 carbon atoms, * represents a binding site.
  • Y 116 and Y 118 each independently represent —NR 17 — or an aliphatic hydrocarbon group having 1 to 8 carbon atoms
  • the methylene group in the aliphatic hydrocarbon group may be substituted with an oxygen atom
  • Y 117 is a direct bond, —O—, —S—, —SO 2 —, —CR 18 R 19 — or represented by general formula (1-1), (1-2) or (1-3) above.
  • R 17 represents a hydrogen atom or an optionally substituted aliphatic hydrocarbon group having 1 to 35 carbon atoms
  • R 18 and R 19 each independently represent a hydrogen atom or an optionally substituted halogen atom alkyl group having 1 to 8 carbon atoms
  • * represents a binding site.
  • R 31 is a hydrogen atom, an optionally substituted aliphatic hydrocarbon group having 1 to 35 carbon atoms, an optionally substituted aromatic group having 6 to 35 carbon atoms, represents a ring-containing hydrocarbon group or an optionally substituted heterocyclic ring-containing group having 2 to 35 carbon atoms, * represents a binding site.
  • R 32 is the same group as R 57 in the general formula (1), and when there are two or more in the group, they may be the same or different, and Z 11 is the ) represents a group in the same range as the group represented by Z 1 to Z 3 in * represents a binding site.
  • R 32 is the same group as R 57 in the general formula (1), and when there are two or more in the group, they may be the same or different, and Z 11 is the same as R 57 in the general formula (2 ) represents a group in the same range as the group represented by Z 1 to Z 3 in * represents a binding site.
  • Z 10 , Z 11 , Z 12 , Z 13 and Z 14 represent groups in the same range as the groups represented by Z 1 to Z 3 in the general formula (2), * represents a binding site.
  • Z 10 , Z 11 , Z 12 , Z 13 , Z 14 and Z 15 represent groups in the same range as the groups represented by Z 1 to Z 3 in the general formula (2), * represents a binding site.
  • aliphatic hydrocarbon group having 1 to 8 carbon atoms represented by Y 111 , Y 115 , Y 116 , Y 118 , Y 119 and Y 120 , Y 1 etc.
  • the aliphatic hydrocarbon groups having 1 to 35 carbon atoms which may have a divalent substituent represented by those satisfying a predetermined number of carbon atoms can be mentioned.
  • Y 111 and Y 115 may be the same or different.
  • Y 116 and Y 118 in the above formula (102) and Y 119 and Y 120 in the above formula (103) may be the same or different.
  • an optionally substituted divalent C 1-35 aliphatic hydrocarbon group represented by Y 113 an optionally substituted divalent C 6-35
  • a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent represented by Y 1 etc., optionally having a substituent
  • the groups exemplified as the bivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms can be mentioned.
  • an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms which may have a substituent and a number of carbon atoms which may have a substituent
  • the groups exemplified as heterocyclic ring-containing groups of 2 to 35 can be mentioned.
  • the alkyl group having 1 to 8 carbon atoms, the aryl group having 6 to 20 carbon atoms and the arylalkyl group having 7 to 20 carbon atoms represented by R 14 , R 15 , R 18 and R 19 are R 1 Among the groups exemplified as alkyl groups having 1 to 40 carbon atoms, aryl groups having 6 to 20 carbon atoms and arylalkyl groups having 7 to 20 carbon atoms represented by etc., those satisfying a predetermined number of carbon atoms mentioned.
  • a plurality of Z 11 in each formula of Groups 2 and 3, Z 10 to Z 14 in each formula of Group 4, and Z 10 to Z 15 in each formula of Group 5 may be the same, can be different.
  • the bonding position of the linking group represented by X to the benzene ring may be any bondable position within the benzene ring .
  • a meta position is preferred. This is because the composition of the present invention facilitates production of a durable cured product.
  • compound A examples include compounds described in International Publication No. 2014/021023, such as the compounds represented below.
  • the compound A may contain a phenolic hydroxyl group that is not protected by a protecting group R9 , but the number of phenolic hydroxyl groups contained in the compound A is preferably 2 or less, and is 0. is preferred. This is because the compound A can suppress the occurrence of curing inhibition.
  • the molecular weight of the compound A can be set according to the use of the compound A and the like.
  • the molecular weight can be 250 or more and 5000 or less, can be 300 or more and 2500 or less, or can be 350 or more and 1500 or less.
  • the molecular weight can be represented by a weight average molecular weight (Mw).
  • the weight average molecular weight (Mw) can be obtained as a standard polystyrene conversion value by gel permeation chromatography (GPC).
  • the method for producing compound A is not particularly limited as long as it is a method for obtaining a compound having a desired structure, and examples thereof include the method described in International Publication No. 2014/021023.
  • Compound B used in the present invention is a hindered amine compound having 3 or less hindered amine structures.
  • a hindered amine compound is a compound having at least one 2,2,6,6-tetraalkylpiperidyl group having a secondary amine or tertiary amine at the 4-position in the molecule.
  • the compound B is preferably a compound represented by the following general formula (B1) or (B2). This is because the composition of the present invention provides a cured product having good sensitivity and excellent durability.
  • R 95 represents a hydrogen atom, an alkyl group having 1 to 30 carbon atoms or an alkoxy group having 1 to 30 carbon atoms
  • R 96 represents a residue or a carbonate group obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid
  • n1 represents an integer of 1-3. However, n1 is 2 when R96 is a carbonate group.
  • R 97 represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms
  • R 98 represents an alkenylcarbonyl group.
  • the alkyl group having 1 to 30 carbon atoms represented by R 95 and R 97 the alkyl group having 1 to 40 carbon atoms represented by R 1 etc. in the general formulas (A1) to (A3) Among the groups exemplified as , those having a predetermined number of carbon atoms can be mentioned.
  • Examples of the alkoxy group having 1 to 30 carbon atoms represented by R 95 include groups in which an oxygen atom is bonded to the terminal of the alkyl group having 1 to 30 carbon atoms.
  • the "mono- to trivalent organic carboxylic acid" in the "residue obtained by removing a hydrogen atom from the carboxy group of a mono- to trivalent organic carboxylic acid” represented by R 96 is 1 having 2 to 20 carbon atoms. to trivalent organic carboxylic acids.
  • monovalent organic carboxylic acids include acetic acid, propionic acid, acrylic acid, butyric acid, isobutyric acid, methacrylic acid, valeric acid, caproic acid, caprylic acid, neodecanoic acid, 2-ethylhexyl acid, pelargonic acid, Undecanoic acid, lauric acid, tridecanoic acid, myristic acid, palmitic acid, isostearic acid, stearic acid, 12-hydroxystearic acid, oleic acid, elaidic acid, linoleic acid, linolenic acid, nitrilotriacetic acid, thioglycolic acid, octylmethylcaptopropionate acid, benzoic acid, toluic acid, tert-butylbenzoic acid, salicylic acid, 3,5-di-tert-butyl-hydroxyphenylbenzoic acid and 3,5-di-tert-butyl
  • Divalent organic carboxylic acids include malonic acid, succinic acid, glutaric acid, adipic acid, azelaic acid, sebacic acid, decanedicarboxylic acid, dodecanedicarboxylic acid, thiodipropionic acid, phthalic acid, isophthalic acid and terephthalic acid. mentioned.
  • Trivalent organic carboxylic acids include tricarballylic acid, butanetricarboxylic acid, butenetricarboxylic acid and 1,3,5-pentanetricarboxylic acid.
  • R 95 in the general formula (B1) is preferably a hydrogen atom, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms. This is because the composition provides a cured product having good sensitivity and excellent durability.
  • R 96 is a residue obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid
  • R 95 is preferably an alkyl group having 1 to 6 carbon atoms, and 1 carbon atom.
  • An alkyl group having 1 to 3 carbon atoms is more preferable, an alkyl group having 1 to 2 carbon atoms is more preferable, a methyl group or an ethyl group is still more preferable, and a methyl group is most preferable.
  • R 95 is preferably an alkoxy group having 5 to 12 carbon atoms, more preferably an alkoxy group having 10 to 12 carbon atoms, such as decyloxy, undecyloxy or dodecyloxy, most preferably undecyloxy.
  • R 96 in the general formula (B1) is a residue obtained by removing a hydrogen atom from the carboxy group of adipic acid, azelaic acid, or sebacic acid, or a carbonate group, from the viewpoint of cost, ease of production, and effect of improving light resistance. More preferably, it is a residue obtained by removing a hydrogen atom from the carboxy group of sebacic acid, or a carbonate group.
  • n1 in the general formula (B1) is preferably 1 to 3, more preferably 1 to 2, from the viewpoint of a composition capable of producing a cured product having good sensitivity and excellent durability.
  • n1 is 2 when R 96 is a carbonate group.
  • Specific examples of the compound represented by the general formula (B1) include the following compounds.
  • R 97 in the general formula (B2) is preferably a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. This is because the composition provides a cured product having good sensitivity and excellent durability.
  • the alkenylcarbonyl group represented by R 98 in the general formula (B2) includes acryloyl, methacryloyl, 3-butenecarbonyl, 2-methyl-3-butenecarbonyl and the like.
  • R 98 is preferably acryloyl or methacryloyl, more preferably methacryloyl, from the viewpoints of cost, ease of production, and effect of improving light resistance.
  • Specific examples of the compound represented by the general formula (B2) include the following compounds.
  • the method for synthesizing the compound represented by the general formula (B1) or (B2) is not particularly limited, and it can be synthesized by a method in ordinary organic synthesis.
  • a purification method distillation, recrystallization, reprecipitation, a method using a filtering agent/adsorbent, or the like can be appropriately used.
  • most of the commercially available products at low cost are mixtures, which may be used singly or as a mixture, and can be used regardless of the production method, composition, melting point, acid value, and the like.
  • composition (I) Contents of Compound A and Compound B The composition of the present invention contains the compound A and the compound B described above. As the content of the compound A, the composition is excellent in sensitivity, as long as it is possible to produce a cured product having the desired durability, 0.01 per 100 parts by mass of the solid content of the composition It can be from 0.05 parts by mass to 20 parts by mass, more preferably from 0.1 parts by mass to 15 parts by mass, and particularly 0.5 parts by mass. It is preferably at least 10 parts by mass. This is because the composition containing the compound A in such an amount can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
  • solid content means the sum total of all the components other than a solvent.
  • the content is based on mass unless otherwise specified.
  • the lower limit of the content of the compound A is 100 mass of the solid content of the composition, from the viewpoint of exhibiting sufficient ultraviolet absorption ability. It is preferably 0.6 parts by mass or more, more preferably 0.8 parts by mass or more, and particularly preferably 2 parts by mass or more. This is because by setting the lower limit of the content in this way, it is possible to provide a sufficient ultraviolet absorbing ability even in the case of a thin film member.
  • the content of the compound A varies depending on the content of the solvent and the like, but it can be 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. This is because the above content allows the compound A to be stably dispersed in the composition.
  • the composition containing the compound A in such an amount makes it possible to produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of the cured product.
  • the content of the compound A is sufficient as long as the composition is excellent in sensitivity and capable of producing a cured product having the desired durability. It can be from 15 parts by mass to 85 parts by mass, and more preferably from 40 parts by mass to 90 parts by mass. This is because the composition containing the compound A in such an amount can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
  • the content of the compound B is not particularly limited as long as the composition can produce a cured product having excellent sensitivity and desired durability. It can be from 0.005 parts by mass to 10 parts by mass, more preferably from 0.1 parts by mass to 8 parts by mass, and particularly 0.5 parts by mass. It is preferably at least 6 parts by mass and no more than 6 parts by mass. This is because the composition containing the compound B in such an amount can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
  • the content of the compound B varies depending on the content of the solvent and the like, but it can be 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. This is because the above content allows the compound B to be stably dispersed in the composition.
  • the composition containing compound B in such an amount can produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of the cured product.
  • the total content of the compound A and the compound B is sufficient as long as the composition is excellent in sensitivity and can produce a cured product having the desired durability.
  • it can be 0.01 to 25 parts by mass, preferably 0.05 to 20 parts by mass, and more preferably 0.1 to 15 parts by mass. In particular, it is preferably 1 part by mass or more and 10 parts by mass or less. This is because the composition containing the compound A and the compound B in such amounts can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
  • the lower limit of the content of the compound A and the compound B is the lower limit of the content of the composition from the viewpoint that the compound A can exhibit sufficient ultraviolet absorption ability. It is preferably 1.5 parts by mass or more, more preferably 1.8 parts by mass or more, and particularly preferably 3 parts by mass or more based on 100 parts by mass of the solid content.
  • the total content of the compound A and the compound B varies depending on the content of the solvent, etc., but can be 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. This is because the compound A and the compound B can be stably dispersed in the composition when the content is as described above. Moreover, the composition containing the compound A and the compound B in such amounts can produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of the cured product.
  • the composition of the present invention may contain a resin component.
  • the resin component can be one that can hold the compound A and the compound B, and is appropriately set according to the use of the composition, etc., but a polymerizable compound having a polymerizable group, Examples thereof include polymers having no polymerizable group.
  • a polymerizable compound is included. This is because the composition can more effectively exhibit the effect of facilitating the production of a cured product. Specifically, by containing the compound A which absorbs little irradiated light, the composition can more effectively exhibit the effect of facilitating the production of a cured product.
  • the said composition can be used as a photocurable composition, a thermosetting composition, etc. by including a polymerizable compound as said resin component.
  • the polymerizable compound should be capable of forming a polymer, and is usually a compound having a polymerizable group.
  • Such polymerizable compounds can be classified according to the type of polymerizable group, that is, the type of polymerization reaction, and include radically polymerizable compounds, cationically polymerizable compounds and anionically polymerizable compounds.
  • the composition of the invention preferably contains a radically polymerizable compound. This is because the composition can more effectively exhibit the effect of facilitating the production of a cured product. Specifically, since the composition contains the compound B in which the scavenging action of radicals is suppressed, the effect of facilitating the production of a cured product can be more effectively exhibited.
  • the radically polymerizable compound may have one or more radically polymerizable polymerizable groups, and may have two or more radically polymerizable groups.
  • the radically polymerizable polymerizable group include ethylenically unsaturated bond-containing groups such as (meth)acryloyl groups and vinyl groups.
  • (Meth)acryloyl is used to include acryloyl and methacryloyl, and (meth)acrylate is used to include acrylate and methacrylate.
  • the radical polymerizable compound is usually used together with a radical polymerization initiator.
  • the radically polymerizable compound may be a compound having an acid value or a compound having no acid value.
  • Compounds having an acid value include compounds having a carboxyl group. Since the composition contains a compound having an acid value as the radically polymerizable compound, the solubility of the light-irradiated portion in an alkaline developer decreases. Therefore, the composition can be used as a photosensitive composition whose solubility in a solvent such as an alkaline developer changes before and after light irradiation. More specifically, the composition can be used as a negative photosensitive composition by containing a compound having an acid value.
  • the alkaline developer those commonly used as alkaline developers such as tetramethylammonium hydroxide (TMAH) aqueous solution and potassium hydroxide aqueous solution can be used.
  • compounds having an ethylenically unsaturated bond and an acid value include (meth)acrylic acid, ⁇ -chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hymic Acid, crotonic acid, isocrotonic acid, vinylacetic acid, allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, mono[2-(meth)acryloyloxyethyl] succinate, mono[2-(meth)acryloyloxy phthalate ethyl], ⁇ -carboxypolycaprolactone mono(meth)acrylate, polymer mono(meth)acrylate, hydroxyethyl(meth)acrylate/malate, hydroxypropyl(meth)acrylate/malate having carboxy group and hydroxyl group at both ends such as mono(meth)acrylate , dicyclopentadiene maleate or unsaturated
  • R 41 is a direct bond, an alkylidene group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, —O—, —S—, —SO 2 —, —SS— , -SO-, -CO-, -OCO- or a substituent represented by the general formulas (1-1) to (1-3),
  • R 41 , R 42 , R 43 and R 44 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or represents a halogen atom, d represents an integer of 0 to 10;
  • alkyl group having 1 to 5 carbon atoms examples include methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl and tert-amyl. .
  • alkoxy group having 1 to 8 carbon atoms examples include methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso-butyloxy, amyloxy, iso-amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyloxy, tert-heptyloxy, 1-octyloxy, iso-octyl oxy, tert-octyloxy and the like.
  • alkenyl group having 2 to 5 carbon atoms examples include vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl and 2-pentenyl.
  • alkylidene group having 1 to 4 carbon atoms examples include methylidene, ethylidene, propylidene and butylidene.
  • Examples of the alicyclic hydrocarbon group include cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl and the like.
  • the alkyl group, alkoxy group, alkenyl group, alkylidene group, alicyclic hydrocarbon group, etc. may have a substituent.
  • the content of the compound having an acid value can be appropriately set according to the use of the composition, etc., and can be 10 parts by mass or more and 90 parts by mass or less in 100 parts by mass of the resin component, and can be 15 parts by mass or more. It is preferably 85 parts by mass or less, and particularly preferably 20 parts by mass or more and 80 parts by mass or less. This is because when the content is within the above range, the composition can be used as a negative photosensitive composition with excellent sensitivity.
  • compounds having an ethylenically unsaturated bond and not having an acid value include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, (meth) ) glycidyl acrylate, compound no. A1 to No.
  • A4 methyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, n-octyl (meth) acrylate, ( isooctyl (meth)acrylate, isononyl (meth)acrylate, stearyl (meth)acrylate, lauryl (meth)acrylate, methoxyethyl (meth)acrylate, dimethylaminomethyl (meth)acrylate, dimethyl (meth)acrylate aminoethyl, aminopropyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, ethoxyethyl (meth)acrylate, poly(ethoxy)ethyl (meth)acrylate, butoxyethoxyethyl (meth)acrylate, (meth)acrylate ) e
  • vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether and allyl glycidyl ether; unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; indene, 1 -Indenes such as methylindene; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; Polymer molecules such as polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate and polysiloxane Macromonomers having a mono(meth)acryloyl group at the chain end; (meth)acrylonitrile, ethylene, propylene, butylene, vinyl chloride, other vinyl compounds such as vinyl acetate, polymethyl methacrylate macromonomer, polystyrene macromonomer, etc.
  • (Meth)acrylic acid copolymers reacted with isocyanate compounds having unsaturated bonds such as MOI and AOI, vinyl chloride, vinylidene chloride, divinyl succinate, Diallyl phthalate, triallyl phosphate, triallyl isocyanurate, vinyl thioether, vinylimidazole, vinyloxazoline, vinylcarbazole, vinylpyrrolidone, vinylpyridine, hydroxyl group-containing vinyl monomers and vinyl urethane compounds of polyisocyanate compounds, hydroxyl group-containing vinyl monomers and reaction products of vinyl epoxy compounds of polyepoxy compounds, hydroxyl group-containing polyfunctional acrylates such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate, and polyfunctional isocyanates such as tolylene diisocyanate and hexamethylene diisocyanate.
  • isocyanate compounds having unsaturated bonds such as MOI and AOI, vinyl chloride, vinyliden
  • the number of radically polymerizable groups contained in the compound having no acid value may be 1 or more, preferably 2 or more and 10 or less, and preferably 3 or more and 8 or less.
  • the compound having no acid value may be a mixture of compounds having different numbers of polymerizable groups. This is because the composition facilitates adjustment of the curing speed and the hardness of the cured product.
  • the compound having no acid value is, for example, a mixture of a compound having 3 polymerizable groups and a compound having 4 polymerizable groups, a compound having 5 polymerizable groups and 6 polymerizable groups. can be a mixture of compounds of
  • the content of the compound having no acid value can be appropriately set according to the use of the composition, etc., but it can be 10 parts by mass or more and 90 parts by mass or less in 100 parts by mass of the resin component, and 15 parts by mass. It is preferably from 20 parts by mass to 85 parts by mass, and particularly preferably from 20 parts by mass to 80 parts by mass. This is because when the content is within the above range, the composition can be used as a negative composition with excellent sensitivity.
  • the radically polymerizable compound can be used alone or in combination of two or more.
  • a compound having an ethylenically unsaturated bond and an acid value and a compound having an ethylenically unsaturated bond and having no acid value can be used in combination.
  • two or more radically polymerizable compounds are used in combination, they may be pre-copolymerized and used as a copolymer.
  • the cationically polymerizable compound may be a compound having one or more cationically polymerizable groups.
  • the cationic polymerizable group include cyclic ether groups such as epoxy groups and oxetane groups, vinyl ether groups, and the like. That is, examples of cationic polymerizable compounds include cyclic ether compounds such as epoxy compounds and oxetane compounds, and vinyl ether compounds.
  • the cationic polymerizable compound is usually used together with a cationic polymerization initiator.
  • the epoxy compounds include methyl glycidyl ether, 2-ethylhexyl glycidyl ether, butyl glycidyl ether, decyl glycidyl ether, C 12 -C 13 mixed alkyl glycidyl ether, phenyl-2-methyl glycidyl ether, cetyl glycidyl ether, stearyl glycidyl ether, p-sec-butylphenyl glycidyl ether, p-tert-butylphenyl glycidyl ether, glycidyl methacrylate, isopropyl glycidyl ether, allyl glycidyl ether, ethyl glycidyl ether, 2-methyloctyl glycidyl ether, phenyl glycidyl ether, 4-n-butylphenyl glycidyl
  • Epoxidized polyolefin can also be used as the epoxy compound.
  • An epoxidized polyolefin is a polyolefin obtained by modifying a polyolefin with an epoxy group-containing monomer to introduce an epoxy group. It can be produced by copolymerizing ethylene or an ⁇ -olefin having 3 to 20 carbon atoms, an epoxy group-containing monomer, and optionally other monomers by either a copolymerization method or a grafting method. Ethylene or ⁇ -olefins having 3 to 20 carbon atoms, epoxy group-containing monomers and other monomers may be polymerized singly or in combination with other monomers.
  • the double bond of non-conjugated polybutadiene having a hydroxyl group at the end can be epoxidized by the peracetic acid method, and one having a hydroxyl group in the molecule may be used.
  • hydroxyl groups can be urethanized with isocyanate, and epoxy groups can be introduced by reacting a primary hydroxyl group-containing epoxy compound.
  • Examples of the ethylene or ⁇ -olefin having 3 to 20 carbon atoms include ethylene, propylene, butylene, isobutylene, 1,3-butadiene, 1,4-butadiene, 1,3-pentadiene, 2,3-dimethyl-1,3 -butadiene, piperylene, 3-butyl-1,3-octadiene and isoprene.
  • Examples of the epoxy group-containing monomers include glycidyl esters of ⁇ , ⁇ -unsaturated acids, vinylbenzyl glycidyl ethers and allyl glycidyl ethers.
  • Examples of glycidyl esters of ⁇ , ⁇ -unsaturated acids include glycidyl acrylate, glycidyl methacrylate and glycidyl ethacrylate, with glycidyl methacrylate being particularly preferred.
  • Examples of the other monomers include unsaturated aliphatic hydrocarbons such as vinyl chloride, vinylidene chloride, vinylidene fluoride and tetrafluoroethylene; (meth)acrylic acid, ⁇ -chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, Fumaric acid, hymic acid, crotonic acid, isocrotonic acid, vinylacetic acid, allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, mono[2-(meth)acryloyloxyethyl] succinate, mono[2-(meth)phthalate ) acryloyloxyethyl], ⁇ -carboxypolycaprolactone mono(meth)acrylate, polymer mono(meth)acrylate having a carboxy group and a hydroxyl group at both ends, hydroxyethyl (meth)acrylate malate, hydroxypropyl (meth)acrylate ) Unsatur
  • styrene 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyltoluene, vinylbenzoic acid, vinylphenol, vinylsulfonic acid, 4-vinylbenzenesulfone unsaturated aromatic compounds such as acids, vinylbenzyl methyl ether and vinylnaphthalene; unsaturated ketones such as methyl vinyl ketone; unsaturated amine compounds such as vinylamine, allylamine, N-vinylpyrrolidone and vinylpiperidine; allyl alcohol and crotyl alcohol.
  • vinyl alcohols such as; vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether and isobutyl vinyl ether; Unsaturated imides such as phenylmaleimide and N-cyclohexylmaleimide; indenes such as indene and 1-methylindene; polymer molecules such as polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate and polysiloxane Macromonomers having a mono(meth)acryloyl group at the chain end; vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate, vinyl thioether, vinylimidazole, vinyloxazoline , vinylcarbazole, vinylpyrrolidone, vinylpyridine, vinyl urethane compounds of hydroxyl group-containing vinyl monomers and polyisocyanate compounds,
  • Epolead PB3600 Epolead PB4700 (manufactured by Daicel); BF-1000, FC-3000 (manufactured by ADEKA); Bondfast 2C, Bondfast E, Bondfast CG5001.
  • oxetane compound examples include 3,7-bis(3-oxetanyl)-5-oxa-nonane, 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene, 1,2-bis[( 3-ethyl-3-oxetanylmethoxy)methyl]ethane, 1,3-bis[(3-ethyl-3-oxetanylmethoxy)methyl]propane, ethylene glycol bis(3-ethyl-3-oxetanylmethyl)ether, triethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether, 1,4-bis(3-ethyl-3-oxetanylmethoxy)butane, 1,6 -bis(3-ethyl-3-oxetanylmethoxy)hex
  • vinyl ether compound examples include diethylene glycol monovinyl ether, triethylene glycol divinyl ether, n-dodecyl vinyl ether, cyclohexyl vinyl ether, 2-ethylhexyl vinyl ether, 2-chloroethyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, triethylene glycol vinyl ether, and 2-hydroxyethyl.
  • the anionically polymerizable compound may be any compound having one or more anionically polymerizable groups.
  • the anionic polymerizable group include an epoxy group, a lactone group, and a (meth)acrylic group. That is, examples of the anionically polymerizable compound include epoxy compounds, lactone compounds, compounds having a (meth)acrylic group, and the like. Examples of the lactone compound include ⁇ -propiolactone and ⁇ -caprolactone.
  • the anionically polymerizable compound is usually used together with an anionic polymerization initiator.
  • the epoxy compound the epoxy compounds exemplified as the cationic polymerizable compound can be used.
  • the compound having a (meth)acrylic group those exemplified as the radically polymerizable compound can be used.
  • the cationically polymerizable compound and the anionically polymerizable compound can be used alone or in combination of two or more.
  • the molecular weight of the polymerizable compound is appropriately set depending on the use of the composition, etc., and can be 50 or more, and can be 50 or more and 3,000 or less.
  • the molecular weight is represented by a weight average molecular weight (Mw).
  • the content of the polymerizable compound as long as the composition can be used as a curable composition, the compound A, the compound B and 1 part by mass in a total of 100 parts by mass of the polymerizable compound 99 parts by mass or less, preferably 50 parts by mass or more and 99 parts by mass or less, and particularly preferably 80 parts by mass or more and 99 parts by mass or less.
  • the content is in the above range, the composition is easy to use as a curable composition, and the effect of improving durability such as light resistance and heat resistance of the curable composition. can be more effectively exhibited.
  • the polymer does not have a polymerizable group.
  • any polymer containing a repeating structure may be used, and examples thereof include photosensitive resins having photosensitivity and non-photosensitive resins having no photosensitivity.
  • the composition of the present invention can be used as a photosensitive composition by containing a photosensitive resin as a resin component.
  • the photosensitive resin has photosensitivity. For example, it is used together with an acid generator, and dissolves in a developer by the action of an acid such as cleavage of a chemical bond such as an ester group or an acetal group.
  • an acid such as cleavage of a chemical bond such as an ester group or an acetal group.
  • Examples include positive resins that change in the direction of increasing properties. Since the composition contains a positive resin as a resin component, the solubility of the light-irradiated portion in an alkaline developer is increased. Therefore, the composition can be used as a photosensitive composition whose solubility in a solvent such as an alkaline developer changes before and after light irradiation, more specifically as a positive composition.
  • a polymer obtained by introducing an acid-labile group capable of controlling alkali dissolution can be used as the positive resin.
  • Such polymers include polyhydroxystyrene and its derivatives; polyacrylic acid and its derivatives; polymethacrylic acid and its derivatives; hydroxystyrene, acrylic acid, methacrylic acid and their derivatives.
  • Copolymer 2 or more copolymers selected from hydroxystyrene, styrene and their derivatives; 3 or more copolymers selected from cycloolefin and its derivatives, maleic anhydride, and acrylic acid and its derivatives Coalescing; three or more copolymers selected from cycloolefins and derivatives thereof, maleimide, and acrylic acid and derivatives thereof; polynorbornene; one or more high molecular weight polymers selected from the group consisting of metathesis ring-opening polymers etc.
  • Examples of the acid-labile group include a tertiary alkyl group, a trialkylsilyl group, an oxoalkyl group, an aryl group-substituted alkyl group, a heteroalicyclic group such as a tetrahydropyran-2-yl group, a tertiary alkylcarbonyl group, a tertiary An alkylcarbonylalkyl group, an alkyloxycarbonyl group, and the like can be mentioned.
  • positive resin examples include resins described in JP-A-2003-192665, claim 3 of JP-A-2004-323704, and JP-A-10-10733.
  • a known acid generator can be used as the acid generator used together with the positive resin.
  • Specific examples of the acid generator include a photocationic polymerization initiator and a thermal cationic polymerization initiator, which will be described later.
  • Non-photosensitive resin is not photosensitive, and may be polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, poly(meth)acrylic acid, styrene-( meth) acrylic acid copolymer, (meth) acrylic acid-methyl methacrylate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS resin, nylon 6, nylon 66, nylon 12, urethane resin, polycarbonate polyvinyl butyral, cellulose ester, polyacrylamide, saturated polyester, phenol resin, phenoxy resin, polyamideimide resin, polyamic acid resin, epoxy resin and the like. Polymers of the above polymerizable compounds can also be used as the non-photosensitive resin.
  • the weight-average molecular weight (Mw) of the polymer is appropriately set depending on the use of the composition, etc., and can be 1500 or more, and can be 1500 or more and 300000 or less. can do.
  • the content of the resin component is appropriately set according to the application of the composition, etc., and is 1 part by mass or more and 99 parts by mass or less per 100 parts by mass of the solid content. It is preferably 10 parts by mass or more and 95 parts by mass or less, and particularly preferably 15 parts by mass or more and 90 parts by mass or less. This is because the composition can stably retain the compound A and the compound B when the content is within the above range.
  • the content of the resin component can be 1 part by mass or more and 99 parts by mass or less in a total of 100 parts by mass of the compound A, the compound B and the resin component, and is 30 parts by mass or more and 99 parts by mass or less. It is preferably 50 parts by mass or more and 99 parts by mass or less. This is because the composition can stably retain the compound A and the compound B when the content is within the above range. Moreover, it is because the effect of improving durability, such as light resistance, and favorable sensitivity of a curable composition can be exhibited more effectively.
  • the total content of the resin component, the compound A and the compound B can be 1 part by mass or more in 100 parts by mass of the composition, and more preferably 10 parts by mass or more and 90 parts by mass or less.
  • composition can produce a cured product having excellent durability, and has good sensitivity, thereby facilitating production of the cured product.
  • the type of the resin component may be only one type, or may be a combination of two or more types.
  • the resin component may contain either one of the polymerizable compound and the polymer, or both.
  • the content of the polymerizable compound can be appropriately set according to the application of the composition, etc. It can be 1 part by mass or more and 99 parts by mass or less.
  • composition of the present invention may optionally contain other components in addition to the compound A, the compound B and the resin component.
  • the other components include polymerization initiators, colorants, solvents, chain transfer agents, sensitizers, surfactants, silane coupling agents, melamine compounds, acid catalysts, base catalysts, and the like.
  • the polymerization initiator is included as a curable component and is usually used together with a polymerizable compound.
  • the polymerization initiator may be any one as long as it can polymerize the polymerizable compound.
  • a polymerization initiator and the like are included.
  • the polymerization initiator is preferably a photopolymerization initiator from the viewpoint of effectively exhibiting the effect that even when the composition contains compound A and compound B, the composition can be easily cured.
  • the photopolymerization initiator may be one capable of polymerizing a polymerizable compound by receiving light irradiation, and may be a photoradical polymerization initiator, a photocationic polymerization initiator, or a photoanion polymerization initiator. agents and the like.
  • the photo-radical polymerization initiator is not particularly limited as long as it generates radicals upon irradiation with light, and conventionally known compounds can be used.
  • the radical photopolymerization initiator acetophenone-based compounds, benzyl-based compounds, benzophenone-based compounds, thioxanthone-based compounds, oxime ester-based compounds, and the like can be preferably exemplified.
  • acetophenone compounds include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4′-isopropyl-2-hydroxy-2-methylpropiophenone, 2-hydroxymethyl-2 -methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethan-1-one, p-dimethylaminoacetophenone, p-tertiarybutyldichloroacetophenone, p-tertiarybutyltrichloroacetophenone, p-azidobenzal Acetophenone, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropanone-1,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) -butanone-1, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl
  • benzyl-based compounds examples include benzyl and the like.
  • benzophenone-based compounds examples include benzophenone, methyl o-benzoylbenzoate, Michler's ketone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone and 4-benzoyl-4'-methyldiphenyl sulfide.
  • thioxanthone-based compounds examples include thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, and 2,4-diethylthioxanthone.
  • oxime ester compound a compound represented by the following general formula (IV) is particularly exemplified because of its good sensitivity and heat resistance.
  • R 71 and R 72 are each independently a hydrogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, group or a heterocyclic ring-containing group having 2 to 20 carbon atoms
  • R 73 and R 74 each independently represent a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, -R 75 , -OR 76 , -SR 77 , -NR 78 R 79 , -COR 80 , -SOR 81 , —SO 2 R 82 or —CONR 83 R 84 , wherein R 73 and R 74 may combine with each other to form a ring, R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 81 , R
  • oxime ester compounds examples include ethanone-1-[9-ethyl-6-(2-methylbenzoyl-9H-carbazol-3-yl]-1-(O-acetyloxime), 1-[9-ethyl- 6-benzoyl-9H-carbazol-3-yl-octan-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-ethane-1 -one oxime-O-benzoate, 1-[9-n-butyl-6-(2-ethylbenzoyl)-9H-carbazol-3-yl]-ethan-1-one oxime-O-benzoate, ethanone-1-[9 -ethyl-6-(2-methyl-4-tetrahydrofuranylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime), ethanone-1-[9-
  • an indole oxime ester compound having an indole structure can also be used.
  • indole-based oxime ester compounds include oxime ester compounds represented by the following general formula (V) described in International Publication No. 2017/051680.
  • R 201 and R 202 each independently represent -R 211 , -OR 211 , -COR 211 , -SR 211 , -CONR 212 R 213 or -CN;
  • R 211 , R 212 and R 213 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a carbon atom represents a heterocyclic ring-containing group of numbers 2 to 20,
  • the hydrogen atoms of the groups represented by R 211 , R 212 and R 213 are further represented by -R 221 , -OR 221 , -COR 221 , -SR 221 , -NR 222 R 223 , -CONR 222 R 223 , -NR 222 OR 223 , —NCOR 222 OCOR 223 , —NR 222 COR 221
  • R 211 , R 212 , R 213 , R 221 , R 222 , R 223 and R 224 may have branched side chains and may be cyclic alkyl
  • R 203 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms.
  • alkyl portion of the group represented by R 203 may have branched side chains and may be cyclic alkyl, and R 203 and R 207 and R 203 and R 208 together are each may form a ring
  • R 203 1 to 20 carbon atoms represented by R 203 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 221 , R 222 , R 223 and R 224 in the general formula (V) , an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a heterocyclic ring-containing group having 2 to 20 carbon atoms, R Among the groups exemplified as 1, etc., those having a predetermined number of carbon atoms can be mentioned.
  • radical polymerization initiators include phosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis(cyclopentadienyl)-bis[2,6-difluoro-3-(pyr-1 -yl)] and titanocene compounds such as titanium.
  • radical polymerization initiators include Adeka Optomer N-1414, N-1717, N-1919, Adeka Arkles NCI-831, NCI-930 (manufactured by ADEKA), IRGACURE184, IRGACURE369, IRGACURE651, IRGACURE907, and IRGACURE OXE. 01, IRGACURE OXE 02, OXE 03, OXE 04, IRGACURE784 (manufactured by BASF), TR-PBG-304, TR-PBG-305, TR-PBG-309 and TR-PBG-314 (manufactured by Tronly), etc. be done.
  • One or more of these photoradical polymerization initiators can be blended and used according to the desired performance.
  • photocationic polymerization initiator one that generates an acid upon exposure to light can be used, and known photocationic polymerization initiators can be used.
  • photocationic polymerization initiator include known compounds such as onium salt compounds, sulfone compounds, sulfonate ester compounds, quinonediazide compounds, sulfonimide compounds, and diazomethane compounds.
  • photoanionic polymerization initiator those that generate a base upon exposure to light can be used, and known photoanionic polymerization initiators can be used.
  • photoanionic polymerization initiator include acetophenone O-aroyloxime and nifedipine.
  • Thermal polymerization initiator may be one capable of polymerizing a polymerizable compound by heating, and examples thereof include radical polymerization initiators, cationic polymerization initiators, anionic polymerization initiators, and the like. .
  • thermal radical polymerization initiator those that generate radicals by heating can be used, and known thermal radical polymerization initiators can be used.
  • Preferred examples of the thermal radical polymerization initiator include azo compounds, peroxides and persulfates.
  • azo compounds examples include 2,2'-azobisisobutyronitrile, 2,2'-azobis(methyl isobutyrate), 2,2'-azobis-2,4-dimethylvaleronitrile, 1,1' -azobis(1-acetoxy-1-phenylethane) and the like.
  • peroxides examples include benzoyl peroxide, di-t-butylbenzoyl peroxide, t-butylperoxypivalate and di(4-t-butylcyclohexyl)peroxydicarbonate.
  • persulfate examples include persulfates such as ammonium persulfate, sodium persulfate and potassium persulfate.
  • thermal cationic polymerization initiator those that generate cationic species or Lewis acids by heating can be used, and known thermal cationic polymerization initiators can be used.
  • the thermal cationic polymerization initiator include salts such as sulfonium salts, thiophenium salts, thiolanium salts, benzylammonium, pyridinium salts and hydrazinium salts; polyalkylpolyamines such as diethylenetriamine, triethylenetriamine and tetraethylenepentamine; alicyclic polyamines such as 1,2-diaminocyclohexane, 1,4-diamino-3,6-diethylcyclohexane and isophoronediamine; aromatic polyamines such as m-xylylenediamine, diaminodiphenylmethane and diaminodiphenylsulfone reaction of the polyamines with various epoxy resins such as glycidyl ethers
  • Polyvalent carboxylic acids oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, dodecanedioic acid, 2-methylsuccinic acid, 2-methyladipic acid, 3- Aliphatic dicarboxylic acids such as methyladipic acid, 3-methylpentanedioic acid, 2-methyloctanedioic acid, 3,8-dimethyldecanedioic acid, 3,7-dimethyldecanedioic acid, hydrogenated dimer acid and dimer acid; Aromatic dicarboxylic acids such as phthalic acid, terephthalic acid, isophthalic acid and naphthalene dicarboxylic acid; Alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid; Tricarboxylic acids such as trimellitic acid, trimesic acid and trimers such as
  • thermal cationic polymerization initiator such as Adeka Opton CP-77, Adeka Opton CP-66 (manufactured by ADEKA), CI-2639, CI-2624 (manufactured by Nippon Soda Co., Ltd.), and San-Aid SI-60L. , San-Aid SI-80L, San-Aid SI-100L (manufactured by Sanshin Chemical Industry Co., Ltd.), and the like.
  • thermal anionic polymerization initiator those that generate a base by heat can be used, and known thermal anionic polymerization initiators can be used.
  • the anionic polymerization initiator include aliphatic amine-based compounds, aromatic amine-based compounds, secondary or tertiary amine-based compounds, imidazole-based compounds, polymercaptan-based compounds, and boron trifluoride-amine complexes. , dicyandiamide, organic acid hydrazides, and the like can be used.
  • the content of the polymerization initiator may be any one that can impart desired curability and photosensitivity, and is 0.1 parts by mass or more and 30 parts by mass in 100 parts by mass of solid content parts by mass or less, preferably 0.3 parts by mass or more and 10 parts by mass or less. This is because when the content is within the above range, the composition has good sensitivity and can be easily produced into a cured product.
  • the content of the polymerization initiator may be any one that can impart desired curability and photosensitivity, and may be 0.001 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the polymerizable compound. It is preferably 0.01 to 10 parts by mass, and preferably 0.1 to 5 parts by mass. This is because when the content is within the above range, the composition has good sensitivity and can be easily produced into a cured product.
  • the colorant may be any one that can impart desired coloration to the cured product, and includes dyes and pigments.
  • the dye compounds having absorption at 380 to 1200 nm can be used, and azo compounds, anthraquinone compounds, indigoid compounds, triarylmethane compounds, xanthene compounds, alizarin compounds, acridine compounds, stilbene compounds, thiazole compounds, naphthol compounds, Quinoline compounds, nitro compounds, indamine compounds, oxazine compounds, phthalocyanine compounds, cyanine compounds, diimmonium compounds, cyanoethenyl compounds, dicyanostyrene compounds, rhodamine compounds, perylene compounds, polyenenaphtlactam compounds, coumarin compounds, squarylium compounds, croconium compounds, spiropyran compounds , spirooxazine compounds, merocyanine compounds, oxonol compounds, styryl
  • pigments inorganic pigments and organic pigments can be used, and nitroso compounds, nitro compounds, azo compounds, diazo compounds, xanthene compounds, quinoline compounds, anthraquinone compounds, coumarin compounds, phthalocyanine compounds, isoindolinone compounds, and isoindoline compounds.
  • pigments can also be used as the inorganic pigments or organic pigments. 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109; Pigment Green Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 22, 24, 56, 60, 61, 62, 64; Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 50 and the like.
  • the content of the coloring agent can be 0.01 parts by mass or more and 50 parts by mass or less per 100 parts by mass of the solid content of the composition.
  • Solvent Any solvent can be used as long as it is capable of dissolving or dispersing the above components, such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone, and 2-heptanone.
  • ether solvents such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, dipropylene glycol dimethyl ether; methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate , n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, ester solvents such as texanol; ethylene glycol monomethyl ether, cellosolve solvents such as ethylene glycol monoethyl ether; methanol, ethanol, iso- or n-propanol, Alcoholic solvents such as iso- or n-butanol, amyl alcohol, diacetone alcohol; ethylene glycol monomethyl acetate, ethylene glycol monoethyl acetate, propylene glycol-1-monomethyl ether-2
  • the content of the solvent can be appropriately set according to the use of the composition, etc., but preferably the amount of components (solid content) other than the solvent in the composition is 1% by mass or more and 99% by mass or less. In particular, it is preferably 10% by mass or more and 90% by mass or less, and particularly preferably 30% by mass or more and 70% by mass or less. This is because when the content is within the above range, the composition is excellent in coatability and the like.
  • chain transfer agent and sensitizer any one can be used as long as it can adjust the sensitivity and the like of the composition, and sulfur atom-containing compounds are generally used.
  • sulfur atom-containing compounds are generally used.
  • Surfactant those capable of improving the dispersion stability and coatability of the composition can be used.
  • Surfactants anionic surfactants such as higher fatty acid alkali salts, alkylsulfonates and alkylsulfates, cationic surfactants such as higher amine halides and quaternary ammonium salts, polyethylene glycol alkyl ethers, polyethylene Surfactants such as nonionic surfactants such as glycol fatty acid esters, sorbitan fatty acid esters and fatty acid monoglycerides, amphoteric surfactants and silicone surfactants can be used, and these may be used in combination.
  • the silane coupling agent is a silane compound having a reactive group that chemically bonds with an inorganic material such as glass and a reactive group that chemically bonds with an organic material such as a synthetic resin. A material capable of improving adhesion and the like can be used.
  • the silane coupling agent include silane coupling agents manufactured by Shin-Etsu Chemical Co., Ltd. Among them, silane coupling agents having an isocyanate group, a methacryloyl group, an epoxy group, such as KBE-9007, KBM-502, and KBE-403, are preferred. used for
  • Melamine compound As the melamine compound, those capable of improving curability can be used, and nitrogen such as (poly)methylolmelamine, (poly)methylolglycoluril, (poly)methylolbenzoguanamine, (poly)methylolurea, etc.
  • nitrogen such as (poly)methylolmelamine, (poly)methylolglycoluril, (poly)methylolbenzoguanamine, (poly)methylolurea, etc.
  • Compounds in which all or part (at least two) of the active methylol groups (CH 2 OH groups) in the compound are alkyl-etherified.
  • the alkyl group constituting the alkyl ether includes a methyl group, an ethyl group and a butyl group, which may be the same or different.
  • methylol groups that are not alkyl-etherified may be self-condensed within one molecule, or may be condensed between two molecules to form an oligomer component.
  • hexamethoxymethylmelamine, hexabutoxymethylmelamine, tetramethoxymethylglycoluril, tetrabutoxymethylglycoluril and the like can be used.
  • alkyl-etherified melamine such as hexamethoxymethylmelamine and hexabutoxymethylmelamine are preferred.
  • Acid Catalyst and Base Catalyst are capable of promoting elimination of the protective group R9 of the phenolic hydroxyl group of compound A.
  • the composition contains an acid catalyst or a base catalyst, it becomes possible to eliminate the protective group R9 in the compound A at a lower temperature than when the composition does not contain an acid catalyst or a base catalyst. .
  • the acid catalyst examples include inorganic acids such as hydrochloric acid, phosphoric acid and sulfuric acid; organic acids such as formic acid, acetic acid, oxalic acid, citric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid and monoisopropyl phosphate. mentioned.
  • the base catalyst examples include inorganic bases such as sodium hydroxide, potassium hydroxide, lithium hydroxide, and ammonia; amine compounds (organic bases) such as trimethylamine, triethylamine, monoethanolamine, and diethanolamine.
  • the content of the acid catalyst and the base catalyst is appropriately set according to the type of each and the desired desorption temperature, etc. parts or more and 10 parts by mass or less.
  • composition further includes, as the other components, p-anisole, hydroquinone, pyrocatechol, t-butylcatechol, a thermal polymerization inhibitor such as phenothiazine; a plasticizer; an adhesion promoter; Filler; antifoaming agent; leveling agent; surface conditioner; Additives such as ultraviolet absorbers; dispersing aids; aggregation inhibitors; catalysts; effect accelerators; cross-linking agents;
  • the total content of the other components may be 30 parts by mass or less per 100 parts by mass of the solid content of the composition.
  • the composition contains a phenolic antioxidant and an ultraviolet absorber in addition to the compound A and the compound B to the extent that a cured product having desired durability can be obtained and the cured product can be easily produced. Although it may be present, it is preferably not substantially included.
  • substantially free means that it is 1 part by mass or less in 100 parts by mass of the solid content of the composition, preferably 0.01 part by mass or less, and 0.005 part by mass or less. is more preferably 0.001 parts by mass or less, and particularly preferably 0.0001 parts by mass or less.
  • the content of the phenolic antioxidant and the ultraviolet absorber is preferably 1 part by mass or less with respect to a total of 100 parts by mass of the compound A and the compound B, and may be 0.01 part by mass or less. It is more preferably 0.005 parts by mass or less, particularly preferably 0.001 parts by mass or less, and most preferably 0.0001 parts by mass or less. This is because it becomes possible to obtain a cured product having excellent durability.
  • Examples of the ultraviolet absorber include ultraviolet absorbers having a phenolic hydroxyl group. Specifically, 2-hydroxybenzophenones, 2-(2′-hydroxyphenyl)benzotriazoles, benzoates, triaryltriazines, etc. described in JP-A-2017-008221, JP-A-2002-97224 benzotriazole-based UV absorbers, benzophenone-based UV absorbers, and the like described in .
  • phenolic antioxidant examples include those commonly used as antioxidants having a phenolic hydroxyl group. Specifically, JP-A-6-179798, JP-A-11-71355, phenol-based antioxidants described in JP-A-2002-97224, etc., alkyl substitution described in JP-A-7-109380 Examples include phenolic antioxidants.
  • the viscosity of the composition can be 200 mPa ⁇ s or less, and can be 1 mPa ⁇ s or more and 200 mPa ⁇ s or less, from the viewpoint of having coatability. This is because the composition is excellent in coatability.
  • the viscosity refers to a value measured at 25° C. using a rotational viscometer (such as Physica MCR301 manufactured by Anton Paar) according to JIS Z 8803:2011.
  • the method for producing the composition may be any method as long as it is possible to blend the respective components in the desired content, and may be a method of adding and mixing the respective components at the same time, while sequentially adding the respective components. A method of mixing may also be used.
  • the composition may be a mixture of compound A and compound B, and may further contain a solvent if necessary.
  • the total content of compound A and compound B varies depending on the content of the solvent and the like, but it is preferably 0.01 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition, It is more preferably 0.05 parts by mass or more and 15 parts by mass or less, and particularly preferably 0.1 parts by mass or more and 10 parts by mass or less.
  • the compound A and the compound B can be stably dispersed in the composition when the content is as described above.
  • a composition containing compound A and compound B in such amounts can produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of a cured product.
  • the composition may contain the compound A, the compound B and the resin component, and may further contain other components as necessary.
  • compositions include thermosetting paints, photocurable paints or varnishes, thermosetting adhesives, photocurable adhesives, printed circuit boards, color televisions, PC monitors, personal digital assistants, digital cameras and the like.
  • Color filters for liquid crystal display panels color filters for CCD image sensors, photo spacers, black column spacers, electrode materials for plasma display panels, touch panels, touch sensors, powder coatings, printing inks, printing plates, adhesives, dental Compositions, resins for stereolithography, gel coats, photoresists for electronics, electroplating resists, etching resists, both liquid and dry films, solder resists, for making color filters for various display applications or plasma displays.
  • the application is not limited to applications that require durability when used as a product, and can be suitably used for members that are exposed to ultraviolet irradiation during the manufacturing process.
  • the member that is irradiated with ultraviolet rays or the like in the manufacturing process include members that are irradiated with ultraviolet rays or the like in order to improve surface wettability, adhesion, or the like.
  • Examples of members that require improved wettability, improved adhesion, and the like include members that are laminated with other members. Color filters, photo spacers, brightness enhancement plates, light guide plates, TFT substrates, alignment films, liquid crystal layers, insulating films, acoustic elements such as speakers, and imaging devices Examples include members that require surface modification and prevention of member deterioration during the manufacturing process, such as lenses, keypads, and magnetic heads for HDDs.
  • Examples of members that require surface modification and prevention of member deterioration during the manufacturing process include members that are laminated with other members via an adhesive, and members that are coated with other members with paint or the like.
  • it can be used as a structural member for various purposes such as transportation equipment such as interior and exterior members of automobiles and aircraft, home appliances such as refrigerators and washing machines, and housing building materials.
  • the exposed base material may be subjected to ultraviolet irradiation or the like in order to modify the surface of the exposed base material.
  • ultraviolet irradiation or the like it can also be preferably used for members that are used together with members that require surface modification or the like in the manufacturing process. Examples of the applications include plastic films, glass, silicon wafers, various engineering plastics, optical lenses, metal surfaces, plating, ceramics, and members used together with members requiring surface cleaning and surface modification such as molds. be done.
  • compound A and compound B are preferably used in the production of thin film members from the viewpoint that their addition amount can be easily increased due to their excellent dispersion stability.
  • the thin film member can be a member having a film thickness of 100 ⁇ m or less, preferably 50 ⁇ m or less, particularly preferably 20 ⁇ m or less.
  • the cured product of the present invention is characterized by being a cured product of the above composition containing a polymerizable compound. More specifically, the cured product of the present invention is a cured product of a composition containing the compound A, the compound B and the polymerizable compound. Since the above-described composition is used, the cured product has good sensitivity, is easy to produce, and has excellent durability.
  • composition used for the cured product contains the compound A, the compound B and the polymerizable compound, but may contain components other than the compound A, the compound B and the polymerizable compound. .
  • it may contain a resin component other than the polymerizable compound, other components, and the like. The contents of each of these components are as described in the section "A. Composition".
  • the cured product may be a cured product of the composition, and the protective group (that is, R 9 ) in the compound A contained in the cured product may or may not be eliminated. is preferably eliminated. This is because the cured product has excellent durability.
  • the cured product usually contains at least a compound in which the protective group is eliminated from the compound A.
  • the cured product can contain a compound derived from the protecting group that has been eliminated from the compound A.
  • the cured product usually contains an unreacted polymerizable compound.
  • the residual rate of the polymerizable compound contained in the cured product is appropriately set according to the application of the cured product, etc., but is preferably 10 parts by mass or less with respect to 100 parts by mass of the cured product. It is more preferably 1 part by mass or less.
  • the cured product may be substantially solvent-free.
  • the content of the solvent contained in the cured product is preferably 1 part by mass or less, and preferably 0.5 part by mass or less per 100 parts by mass of the cured product.
  • the elastic modulus of the cured product is usually higher than that of the composition, and can be 10 ⁇ 3 MPa or more, and can be 10 MPa or more. This is because the cured product can stably retain the compound A, the compound B, and the like with the above elastic modulus.
  • the upper limit of the elastic modulus can be appropriately set depending on the intended use of the cured product, and can be, for example, 10 6 MPa or less.
  • the elastic modulus refers to the compression elastic modulus, and is a value measured at 23° C. according to JIS K 7181. For example, a cubic test piece with a side length of 6 mm is prepared or cut out as a measurement sample, and measurement can be performed at a test speed of 1 ⁇ 0.2 mm/min according to JIS K 7181.
  • the shape of the cured product in plan view can be appropriately set according to the intended use of the cured product, and can be, for example, a pattern such as a dot shape or a line shape.
  • the thickness of the cured product can be appropriately set according to the use of the cured product, and the compound A and the compound B have excellent dispersion stability, so that the amount added can be easily increased.
  • the method for producing the cured product is not particularly limited as long as it is a method capable of forming the cured product of the composition into a desired shape.
  • a production method the production method described in the section "C. Production method of cured product” described later can be mentioned, so the explanation here is omitted.
  • the method for producing a cured product of the present invention is characterized by having a step of forming a cured product of the composition described above. More specifically, the method for producing a cured product of the present invention has a step of forming a cured product of a composition containing the compound A, the compound B and the polymerizable compound.
  • the production method facilitates the production of a cured product by using the composition described above. Moreover, a cured product having excellent durability can be easily obtained by performing a step of removing the protecting group R9 contained in the compound A after the above step.
  • Step of Forming Cured Product is a step of molding and curing the composition described above.
  • the method for forming the cured product of the composition may be any method as long as it is capable of forming a cured product having a desired shape, and varies depending on the components contained in the composition.
  • the composition contains a photopolymerization initiator as a polymerization initiator together with a polymerizable compound, the composition formed as a coating film on a substrate is irradiated with light to polymerize. and a method of polymerizing a chemical compound.
  • the wavelength of the light to be irradiated can be 300 nm to 450 nm, depending on the type of photopolymerization initiator.
  • Light sources include ultra-high pressure mercury, mercury vapor arc, carbon arc, xenon arc, and the like. Laser light may also be used, and for example, one containing light with a wavelength of 340 to 430 nm can be used.
  • a light source for laser light a laser that emits light in the visible to infrared region, such as an argon ion laser, a helium neon laser, a YAG laser, and a semiconductor laser, can be used. When these laser beams are used, the composition may contain a sensitizing dye that absorbs light in the visible to infrared region.
  • the composition contains a thermal polymerization initiator as a polymerization initiator together with a polymerizable compound
  • the composition formed as a coating film on a substrate is subjected to heat treatment to polymerize. and a method of polymerizing a chemical compound.
  • the heating temperature is preferably a temperature that can suppress the elimination of the protective group from compound A, and can be 60°C or higher, preferably 100°C or higher and 300°C or lower.
  • the heating temperature can be the temperature of the coating surface of the composition.
  • the heating time can be about 10 seconds to 3 hours.
  • the step of forming the cured product may include only one method, or may include two or more methods.
  • composition used in the step of forming the cured product contains the compound A, the compound B and the polymerizable compound, and contains components other than the compound A, the compound B and the polymerizable compound. There may be. For example, it may contain a resin component other than the polymerizable compound, other components, and the like. The contents of each of these components are as described in the section "A. Composition”.
  • Step of Removing Protecting Group The production method may include a step of removing the protecting group R 9 contained in the compound A after the step of forming the cured product. By including such steps, a cured product having excellent durability can be easily obtained.
  • the method for removing the protecting group R 9 contained in the compound A may be any method as long as the protecting group can be stably removed, and examples thereof include a method of heat-treating the cured product.
  • the heating temperature may be any temperature at which the protecting group R9 is eliminated.
  • the heating temperature can be set to the desorption temperature observed when the protecting group R9 alone is used, or lower.
  • the heating temperature can be 50°C or higher and 250°C or lower, preferably 60°C or higher and 200°C or lower, and particularly preferably 80°C or higher and 200°C or lower. This is because the deterioration of the resin component and the like, the deterioration of the substrate supporting the cured product, and the like can be suppressed at the heating temperature.
  • the temperature of the cured product can be the temperature of the surface of the cured product.
  • the production method may optionally include other steps in addition to the step of forming the cured product and the step of removing the protective group.
  • Examples of the other steps include a step of applying the composition onto a substrate.
  • known methods such as spin coater, roll coater, bar coater, die coater, curtain coater, various types of printing, and dipping can be used.
  • the base material can be appropriately selected according to the intended use of the cured product, and examples thereof include soda glass, quartz glass, semiconductor substrates, metals, paper, plastics, and the like.
  • the cured product may be peeled off from the base material, or may be transferred from the base material to another adherend.
  • the present invention includes the following aspects.
  • R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, a group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or -O-R 9 , wherein at least one of R 1 and R 2 is -O-R 9 , R 3 and R 4 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to 4 carbon atoms.
  • R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms.
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group
  • R 1 ' and R 2 ' are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms, , an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ' and R 2 ' is —OR is 9 ; R 5 and R 6 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms, R
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group
  • R 1 ′′ and R 2 ′′ are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 6 to 20 carbon atoms, aryl group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ′′ and R 2 ′′ is —OR is 9 ; R 7 and R 8 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aryl group having 7 to 20 carbon atoms.
  • R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms.
  • the methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO—S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P ⁇ O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group, R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group
  • R 95 represents a hydrogen atom, an alkyl group having 1 to 30 carbon atoms or an alkoxy group having 1 to 30 carbon atoms
  • R 96 represents a residue or a carbonate group obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid
  • n1 represents an integer of 1-3. However, n1 is 2 when R96 is a carbonate group.
  • R 97 represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms
  • R 98 represents an alkenylcarbonyl group.
  • composition according to any one of [1] to [4], comprising a polymerizable compound comprising a polymerizable compound.
  • a method for producing a cured product comprising the step of forming a cured product of the composition according to [5].
  • the present invention is not limited to the above embodiments.
  • the above embodiment is an example, and any device that has substantially the same configuration as the technical idea described in the claims of the present invention and achieves the same effect is the present invention. It is included in the technical scope of the invention.
  • the phenol compound used was a compound in which two —COO-tert-butyl groups in A1-1 below were substituted with hydrogen atoms.
  • Examples 1 to 9 and Comparative Examples 1 to 8 Compound A, a hindered amine compound, an ultraviolet absorber, a polymerizable compound having an acid value, a polymerizable compound having no acid value, a photopolymerization initiator, a colorant dispersant, a dye, and a silane cup according to the formulations shown in Table 2 below.
  • a composition was obtained by blending a ring agent, a leveling agent, and a solvent.
  • compound A, compound B (or ultraviolet absorber) and solvent were mixed to prepare composition a.
  • compound A and compound B (or ultraviolet absorber) was adjusted to 0.1 parts by mass or more and 10 parts by mass or less per 100 parts by mass of composition a. Thereafter, components other than these were further blended to obtain a composition having the composition shown in Table 2. In addition, the following materials were used for each component. In addition, the compounding quantity in a table
  • A'-1 compound represented by the following formula (A'-1)
  • A'-2 compound represented by the following formula (A'-2)
  • A'-3 represented by the following formula (A'-3)
  • A'-4 a compound represented by the following formula (A'-4)
  • C-1 Radically polymerizable compound (Lipoxy SPC-1000 manufactured by Showa Denko Co., Ltd., solid content 29% by mass PGMEA solution)
  • C-2 Radically polymerizable compound (Showa Denko Lipoxy SPC-3000, solid content 42.4% by mass PGMEA solution)
  • E-1 A compound represented by the following formula (E1) (oxime ester photoradical polymerization initiator)
  • F-1 NPCF-52417 (manufactured by Nippon Pigment Co., Ltd., PGMEA solution with a solid content of 21.2% by mass)
  • F-2 NPCF-60001 (manufactured by Nippon Pigment Co., Ltd., PGMEA solution with a solid content of 19.0% by mass)
  • F-3 a compound represented by the following formula (F3)
  • compositions prepared in Examples and Comparative Examples were evaluated. Table 2 shows the results.
  • each composition of Examples and Comparative Examples was spin-coated on a glass substrate (500 rpm, 7 seconds) to form a coating film having a thickness of 2.2 ⁇ m after drying (after pre-baking).
  • pre-baking was performed at 90° C. for 120 seconds, and further exposure was performed using a high-pressure mercury lamp as a light source (accumulated light quantity: 150 mJ/cm 2 ) to obtain a cured product.
  • post-baking was performed at 230° C. for 30 minutes to obtain an evaluation sample.
  • the resulting evaluation sample was subjected to a light resistance test for 160 hours using SUNTEST XXL+ manufactured by ATLAS.
  • the Eab * values before and after the test were obtained using a color difference meter, the Eab* value change ( ⁇ Eab * ) before and after the test was calculated, and the light resistance was evaluated according to the following criteria.
  • the results are shown in Table 2 below.
  • a smaller ⁇ Eab * that is, a light resistance evaluation of “A”, indicates that the cured product has excellent light resistance.
  • Photolithography sensitivity
  • a coating film was formed in the same manner as in “1. 300 ⁇ m, exposure amount 40 mJ/cm 2 ). After development using a 0.04% by mass KOH aqueous solution as a developer, the film was thoroughly washed with water and post-baked at 230° C. for 30 minutes using a clean oven to fix the pattern. The obtained pattern was observed with an optical microscope, and the line width of the portion corresponding to the mask opening was measured and evaluated according to the following criteria. The results are shown in Table 2 below. If the difference with respect to the set line width is smaller, that is, if the photolithographic property is "A", it can be judged that the line width is controlled and the sensitivity is good.
  • A The line width is within the range of ⁇ 2.5 ⁇ m based on the mask opening of 30 ⁇ m.
  • B The line width exceeds ⁇ 2.5 ⁇ m based on the mask opening of 30 ⁇ m.
  • - Deposits were present in the composition and could not be evaluated.
  • compositions of Examples had better results in both light resistance and photolithography than the compositions of Comparative Examples, and were superior in durability and sensitivity.
  • compositions of Examples could be sufficiently cured with inhibition of curing being suppressed, and it was found that the production of cured products was easy.

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Abstract

A purpose of the present invention is to provide a curable composition from which cured objects having sufficient durability can be produced and which has excellent sensitivity to facilitate production of such cured objects. This composition comprises: a compound A which is a benzotriazole-, benzophenone-, or triazine-based ultraviolet absorber having a structure in which a phenolic hydroxyl group has been protected by a protective group; and a hindered amine compound B which has up to three hindered amine structures. The phenolic hydroxyl group has preferably been protected by a C1-C20 alkyloxycarbonyl group.

Description

組成物、硬化物及び硬化物の製造方法COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING CURED PRODUCT
 本発明は、組成物、硬化物及び硬化物の製造方法に関するものである。 The present invention relates to a composition, a cured product, and a method for producing the cured product.
 硬化性組成物を用いてフィルム及び成形体等を製造する際、硬化物の耐光性や耐熱性等の耐久性を向上させるために、硬化性組成物に紫外線吸収剤を添加して安定化させる方法が知られている(特許文献1)。 When producing films, molded articles, etc. using a curable composition, in order to improve durability such as light resistance and heat resistance of the cured product, the curable composition is stabilized by adding an ultraviolet absorber. A method is known (Patent Document 1).
US20160016919 A1US20160016919 A1
 しかしながら、上述の紫外線吸収剤を添加した場合でも十分な耐久性を有する硬化物を得ることができない場合がある。例えば、紫外線吸収剤を光硬化性組成物に添加すると、光硬化のために照射された光を紫外線吸収剤が吸収してしまい、光重合開始剤の分解が阻害されて硬化不良を生じる場合がある。 However, even when the above-described UV absorber is added, it may not be possible to obtain a cured product with sufficient durability. For example, when an ultraviolet absorber is added to a photocurable composition, the ultraviolet absorber absorbs the light irradiated for photocuring, and the decomposition of the photopolymerization initiator may be inhibited, resulting in poor curing. be.
 このような問題に対して、硬化前の組成物中では紫外線吸収剤としての作用が不活性化されており、硬化後に活性化することが可能な潜在性紫外線吸収剤等の潜在性添加剤を用いることが知られている。 In order to solve such problems, the action as an ultraviolet absorber is inactivated in the composition before curing, and a latent additive such as a latent ultraviolet absorber that can be activated after curing is added. known to use.
 しかしながら、潜在性紫外線吸収剤を用いた場合でも、十分な耐久性を有する硬化物を得ることができない場合及び硬化物の製造が困難な場合がある。これらの場合、潜在性紫外線吸収剤と、光安定剤とを併用する方法はあるが、感度の点で改良の余地があった。 However, even when a latent UV absorber is used, there are cases in which a cured product with sufficient durability cannot be obtained or production of a cured product is difficult. In these cases, there is a method of using a latent ultraviolet absorber and a light stabilizer in combination, but there is room for improvement in terms of sensitivity.
 本発明は、前記問題点に鑑みてなされたものであり、十分な耐久性を有する硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易な硬化性組成物を提供することを主目的とする。 The present invention has been made in view of the above problems, and provides a curable composition capable of producing a cured product having sufficient durability, and having good sensitivity and easy production of a cured product. The main purpose is to
 本発明者らは、前記課題を解決するために鋭意検討を行った結果、フェノール性水酸基が保護基により保護され、保護基の脱離後に紫外線吸収剤として作用する化合物及び光安定剤としてのヒンダードアミン化合物の両者を併用することにより、十分な耐久性を有する硬化物を得られること、及び感度が良好で硬化物の製造が容易な硬化性組成物が得られることを見出し、本発明を完成させるに至った。 As a result of intensive investigations to solve the above problems, the present inventors have found that a compound in which a phenolic hydroxyl group is protected by a protective group and acts as an ultraviolet absorber after elimination of the protective group, and a hindered amine as a light stabilizer. By using both compounds together, it is found that a cured product having sufficient durability can be obtained, and a curable composition with good sensitivity and easy production of a cured product can be obtained, and the present invention has been completed. reached.
 本発明は、下記一般式(A1)、(A2)又は(A3)で表される化合物Aと、ヒンダードアミン構造の数が3以下のヒンダードアミン化合物である化合物Bと、を含む組成物である。 The present invention is a composition comprising compound A represented by the following general formula (A1), (A2) or (A3), and compound B, which is a hindered amine compound having 3 or less hindered amine structures.
Figure JPOXMLDOC01-appb-C000006
(式中、R及びRは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R及びRの少なくとも一方が-O-Rであり、
 R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m1は、1~10の整数を表し、
 a1は、0~4の整数を表し、
 a2は、0~2の整数を表し、
 Xb1は、m1が1の場合には存在せず、m1が2の場合には直接結合又はm1価の原子若しくは連結基を表し、m1が3~10の場合はm1価の原子又は連結基を表す。)
Figure JPOXMLDOC01-appb-C000006
(wherein R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, a group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or -O-R 9 , wherein at least one of R 1 and R 2 is -O-R 9 ,
R 3 and R 4 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to 4 carbon atoms. represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 3 's and a plurality of R 4 's may combine to form a benzene ring or a naphthalene ring,
Multiple R 3 and multiple R 4 may be the same or different,
m1 represents an integer from 1 to 10,
a1 represents an integer from 0 to 4,
a2 represents an integer of 0 to 2,
X b1 is absent when m1 is 1, represents a direct bond or m1-valent atom or linking group when m1 is 2, and m1-valent atom or linking group when m1 is 3 to 10 represents )
Figure JPOXMLDOC01-appb-C000007
(式中、R’及びR’は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R’及びR’の少なくとも一方が-O-Rであり、
 R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m2は、1~10の整数を表し、
 a3は、0~4の整数を表し、
 a4は、0~3の整数を表し、
 Xb2は、m2が1の場合には存在せず、m2が2の場合には直接結合又はm2価の原子若しくは連結基を表し、m2が3~10の場合はm2価の原子又は連結基を表す。)
Figure JPOXMLDOC01-appb-C000007
(wherein R 1 ' and R 2 ' are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms, , an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ' and R 2 ' is —OR is 9 ;
R 5 and R 6 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 5 's and a plurality of R 6 's may combine to form a benzene ring or a naphthalene ring,
Multiple R 5 and multiple R 6 may be the same or different,
m2 represents an integer from 1 to 10,
a3 represents an integer from 0 to 4,
a4 represents an integer from 0 to 3,
X b2 is absent when m2 is 1, represents a direct bond or an m2-valent atom or linking group when m2 is 2, and m2-valent atom or linking group when m2 is 3 to 10 represents )
Figure JPOXMLDOC01-appb-C000008
(式中、R”及びR”は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R”及びR”の少なくとも一方が-O-Rであり、
 R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m3は、1~3の整数を表し、
 a5は、0~3の整数を表し、
 a6は、0~3-m3の整数を表す。)
Figure JPOXMLDOC01-appb-C000008
(wherein R 1 ″ and R 2 ″ are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 6 to 20 carbon atoms, aryl group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ″ and R 2 ″ is —OR is 9 ;
R 7 and R 8 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or a combination of these 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 7 and a plurality of R 8 may be bonded to form a benzene ring or a naphthalene ring,
Multiple R 7 and multiple R 8 may be the same or different,
m3 represents an integer of 1 to 3,
a5 represents an integer from 0 to 3,
a6 represents an integer from 0 to 3-m3. )
 本発明によれば、十分な耐久性を有する硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易な硬化性組成物を提供することができる。 According to the present invention, it is possible to provide a curable composition from which a cured product having sufficient durability can be produced, and which has good sensitivity and which facilitates the production of a cured product.
 本発明は、組成物、その硬化物及び硬化物の製造方法に関するものである。
 以下、本発明の組成物、硬化物及び硬化物の製造方法について詳細に説明する。
TECHNICAL FIELD The present invention relates to a composition, a cured product thereof, and a method for producing the cured product.
The composition, cured product, and method for producing the cured product of the present invention are described in detail below.
A.組成物
 まず、本発明の組成物について説明する。
 本発明の組成物は、下記一般式(A1)、(A2)又は(A3)で表される化合物Aと、ヒンダードアミン構造の数が3以下のヒンダードアミン化合物である化合物Bと、を含むことを特徴とするものである。
A. Composition First, the composition of the present invention will be described.
The composition of the present invention is characterized by comprising a compound A represented by the following general formula (A1), (A2) or (A3), and a compound B which is a hindered amine compound having 3 or less hindered amine structures. and
1.化合物A
 前記化合物Aは、下記一般式(A1)、(A2)又は(A3)で表される化合物である。
1. Compound A
The compound A is a compound represented by the following general formula (A1), (A2) or (A3).
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 前記一般式(A1)、(A2)及び(A3)中、R、R、R’、R’、R”及びR”は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、
 R及びRの少なくとも一方が-O-Rであり、
 R’及びR’の少なくとも一方が-O-Rであり、
 R”及びR”の少なくとも一方が-O-Rであり、
 R、R、R、R、R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士、複数のR同士、複数のR同士、複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR、複数のR、複数のR、複数のR、複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m1及びm2は、それぞれ独立に、1~10の整数を表し、
 m3は、1~3の整数を表し、
 a1は、0~4の整数を表し、
 a2は、0~2の整数を表し、
 a3は、0~4の整数を表し、
 a4は、0~3の整数を表し、
 a5は、0~3の整数を表し、
 a6は、0~3-m3の整数を表し、
 Xb1は、m1が1の場合には存在せず、m1が2の場合には直接結合又はm1価の原子若しくは連結基を表し、m1が3~10の場合はm1価の原子又は連結基を表し、
 Xb2は、m2が1の場合には存在せず、m2が2の場合には直接結合又はm2価の原子若しくは連結基を表し、m2が3~10の場合はm2価の原子又は連結基を表す。
In general formulas (A1), (A2) and (A3), R 1 , R 2 , R 1 ', R 2 ', R 1 '' and R 2 '' are each independently a hydrogen atom, a halogen atom, a cyano group, hydroxyl group, nitro group, carboxy group, alkyl group having 1 to 40 carbon atoms, aryl group having 6 to 20 carbon atoms, arylalkyl group having 7 to 20 carbon atoms, heterocyclic ring having 2 to 20 carbon atoms containing group or —O—R 9 ,
at least one of R 1 and R 2 is —O—R 9 ;
at least one of R 1 ' and R 2 ' is -O-R 9 ;
at least one of R 1 ″ and R 2 ″ is —O—R 9 ;
R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are each independently a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, and the number of carbon atoms represents an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 3 's, a plurality of R 4 's, a plurality of R 5 's, a plurality of R 6 's and a plurality of R 7 's may be bonded together to form a benzene ring or a naphthalene ring,
the plurality of R 3 , the plurality of R 4 , the plurality of R 5 , the plurality of R 6 , the plurality of R 7 and the plurality of R 8 may be the same or different;
m1 and m2 each independently represent an integer of 1 to 10,
m3 represents an integer of 1 to 3,
a1 represents an integer from 0 to 4,
a2 represents an integer of 0 to 2,
a3 represents an integer from 0 to 4,
a4 represents an integer from 0 to 3,
a5 represents an integer of 0 to 3,
a6 represents an integer from 0 to 3-m3,
X b1 is absent when m1 is 1, represents a direct bond or m1-valent atom or linking group when m1 is 2, and m1-valent atom or linking group when m1 is 3 to 10 represents
X b2 is absent when m2 is 1, represents a direct bond or an m2-valent atom or linking group when m2 is 2, and m2-valent atom or linking group when m2 is 3 to 10 represents
 前記R、R、R’、R’、R”、R”、R、R、R、R、R及びR(以下、これらをまとめてR等と称する場合がある。)で表されるハロゲン原子としては、フッ素原子、塩素原子、臭素原子及びヨウ素原子等が挙げられる。 R 1 , R 2 , R 1 ', R 2 ' , R 1 '', R 2 '', R 3 , R 4 , R 5 , R 6 , R 7 and R 8 (hereinafter collectively referred to as R 1 etc.) The halogen atom represented by ) includes a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, and the like.
 前記R等で表される炭素原子数1~40のアルキル基としては、メチル、エチル、プロピル、iso-プロピル、ブチル、sec-ブチル、tert-ブチル、iso-ブチル、アミル、iso-アミル、tert-アミル、シクロペンチル、ヘキシル、2-ヘキシル、3-ヘキシル、シクロヘキシル、4-メチルシクロヘキシル、ヘプチル、2-ヘプチル、3-ヘプチル、iso-ヘプチル、tert-ヘプチル、1-オクチル、iso-オクチル、tert-オクチル、アダマンチル等が挙げられる。 The alkyl group having 1 to 40 carbon atoms represented by R 1 etc. includes methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl, tert-amyl, cyclopentyl, hexyl, 2-hexyl, 3-hexyl, cyclohexyl, 4-methylcyclohexyl, heptyl, 2-heptyl, 3-heptyl, iso-heptyl, tert-heptyl, 1-octyl, iso-octyl, tert - octyl, adamantyl and the like.
 前記R等で表される炭素原子数6~20のアリール基としては、フェニル、ナフチル、アントラセニル等が挙げられる。 Examples of the aryl group having 6 to 20 carbon atoms represented by R 1 etc. include phenyl, naphthyl, anthracenyl and the like.
 前記R等で表される炭素原子数7~20のアリールアルキル基としては、ベンジル、フルオレニル、インデニル、9-フルオレニルメチル基等が挙げられる。 Examples of the arylalkyl group having 7 to 20 carbon atoms represented by R 1 etc. include benzyl, fluorenyl, indenyl and 9-fluorenylmethyl groups.
 前記R等で表される炭素原子数2~20の複素環含有基としては、ピリジル、ピリミジル、ピリダジル、ピペリジル、ピラニル、ピラゾリル、トリアジル、ピロリル、キノリル、イソキノリル、イミダゾリル、ベンゾイミダゾリル、トリアゾリル、フリル、フラニル、ベンゾフラニル、チエニル、チオフェニル、ベンゾチオフェニル、チアジアゾリル、チアゾリル、ベンゾチアゾリル、オキサゾリル、ベンゾオキサゾリル、イソチアゾリル、イソオキサゾリル、インドリル、2-ピロリジノン-1-イル、2-ピペリドン-1-イル、2,4-ジオキシイミダゾリジン-3-イル、2,4-ジオキシオキサゾリジン-3-イル等が挙げられる。 The heterocyclic ring-containing group having 2 to 20 carbon atoms represented by R 1 etc. includes pyridyl, pyrimidyl, pyridazyl, piperidyl, pyranyl, pyrazolyl, triazyl, pyrrolyl, quinolyl, isoquinolyl, imidazolyl, benzimidazolyl, triazolyl, furyl, furanyl, benzofuranyl, thienyl, thiophenyl, benzothiophenyl, thiadiazolyl, thiazolyl, benzothiazolyl, oxazolyl, benzoxazolyl, isothiazolyl, isoxazolyl, indolyl, 2-pyrrolidinon-1-yl, 2-piperidon-1-yl, 2,4 -dioxyimidazolidin-3-yl, 2,4-dioxyoxazolidin-3-yl and the like.
 前記Rで表される炭素原子数1~20のアルキル基としては、前記R等で表される炭素原子数1~40のアルキル基として例示した基のうち、所定の炭素原子数を満たすものが挙げられる。 The alkyl group having 1 to 20 carbon atoms represented by R 9 satisfies the predetermined number of carbon atoms among the groups exemplified as the alkyl group having 1 to 40 carbon atoms represented by R 1 etc. things are mentioned.
 前記Rで表される炭素原子数2~20のアルケニル基としては、ビニル、アリル、1-プロペニル、イソプロペニル、2-ブテニル、1,3-ブタジエニル、2-ペンテニル、2-オクテニル等が挙げられる。 Examples of alkenyl groups having 2 to 20 carbon atoms represented by R 9 include vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl and 2-octenyl. be done.
 前記Rで表される炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、及び炭素原子数2~20の複素環含有基は、前記R等で表される炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、及び炭素原子数2~20の複素環含有基と同じである。 The aryl group having 6 to 20 carbon atoms, the arylalkyl group having 7 to 20 carbon atoms, and the heterocyclic ring-containing group having 2 to 20 carbon atoms represented by R 9 are represented by R 1 and the like. It is the same as an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, and a heterocyclic ring-containing group having 2 to 20 carbon atoms.
 前記Rで表されるトリアルキルシリル基としては、トリメチルシリル、トリエチルシリル、エチルジメチルシリル等が挙げられる。
 前記R’で表される炭素原子数1~8のアルキル基としては、R等で表されるアルキル基として例示した基のうち、所定の炭素原子数を満たすものが挙げられる。
Examples of the trialkylsilyl group represented by R 9 include trimethylsilyl, triethylsilyl, ethyldimethylsilyl and the like.
Examples of the alkyl group having 1 to 8 carbon atoms represented by R′ include those satisfying a predetermined number of carbon atoms among the groups exemplified as the alkyl group represented by R 1 and the like.
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよい。すなわち、本発明において、前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基には、これらの基中のメチレン基が前記2価の基で置換された構造の基も含まれる。但し、置き換わり後の各基の炭素原子数は1以上である。 The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or a combination of these 2 may be substituted with a valent group. That is, in the present invention, the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group have a structure in which the methylene group in these groups is substituted with the divalent group. The group of is also included. However, the number of carbon atoms in each group after replacement is 1 or more.
 例えば、前記アルキル基の端部のメチレン基が-O-で置換された基としては、メチルオキシ、エチルオキシ、iso-プロピルオキシ、ブチルオキシ、sec-ブチルオキシ、tert-ブチルオキシ、iso-ブチルオキシ、アミルオキシ、iso-アミルオキシ、tert-アミルオキシ、ヘキシルオキシ、2-ヘキシルオキシ、3-ヘキシルオキシ、シクロヘキシルオキシ、4-メチルシクロヘキシルオキシ、ヘプチルオキシ、2-ヘプチルオキシ、3-ヘプチルオキシ、iso-ヘプチルオキシ、tert-ヘプチルオキシ、1-オクチルオキシ、iso-オクチルオキシ、tert-オクチルオキシ等が挙げられる。 For example, the group in which the methylene group at the end of the alkyl group is substituted with -O- includes methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso-butyloxy, amyloxy, iso -amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyloxy, tert-heptyl oxy, 1-octyloxy, iso-octyloxy, tert-octyloxy and the like.
 本発明において、所定の炭素原子数の基中のメチレン基が2価の基で置換されている場合の炭素原子数は、その置換前の基の炭素原子数を規定する。例えば、炭素原子数1~40のアルキル基中のメチレン基が前記2価の基で置換された基の場合、炭素原子数1~40とは、アルキル基中のメチレン基が前記2価の基で置換される前の炭素原子数を指し、置換された後の炭素原子数を指すのではない。例えば、メチルオキシ基は、エチル基中のメチレン基が-O-で置換された基に相当する。 In the present invention, when a methylene group in a group having a predetermined number of carbon atoms is substituted with a divalent group, the number of carbon atoms defines the number of carbon atoms in the group before the substitution. For example, in the case of a group in which the methylene group in the alkyl group having 1 to 40 carbon atoms is substituted with the above divalent group, the 1 to 40 carbon atoms means that the methylene group in the alkyl group is the above divalent group. It refers to the number of carbon atoms before being substituted with and does not refer to the number of carbon atoms after being substituted. For example, a methyloxy group corresponds to a group in which a methylene group in an ethyl group is replaced with -O-.
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は、置換基を有していてもよい。置換基を有するとは、基中の水素原子が置換基で置換されていることを意味する。すなわち、本発明において、前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基には、これらの基中の水素原子が後述する置換基で置換された構造の基も含まれる。 The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent. Having a substituent means that a hydrogen atom in the group is replaced with a substituent. That is, in the present invention, the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group have a structure in which a hydrogen atom in these groups is substituted with a substituent described below. A group is also included.
 前記置換基としては、ビニル、アリル、アクリル、メタクリル等のエチレン性不飽和基;フッ素、塩素、臭素、ヨウ素等のハロゲン原子;アセチル、2-クロロアセチル、プロピオニル、オクタノイル、アクリロイル、メタクリロイル、フェニルカルボニル(ベンゾイル)、フタロイル、4-トリフルオロメチルベンゾイル、ピバロイル、サリチロイル、オキザロイル、ステアロイル、メトキシカルボニル、エトキシカルボニル、t-ブトキシカルボニル、n-オクタデシルオキシカルボニル、カルバモイル等のアシル基;アセチルオキシ、ベンゾイルオキシ等のアシルオキシ基;アミノ、エチルアミノ、ジメチルアミノ、ジエチルアミノ、ブチルアミノ、シクロペンチルアミノ、2-エチルヘキシルアミノ、ドデシルアミノ、アニリノ、クロロフェニルアミノ、トルイジノ、アニシジノ、N-メチル-アニリノ、ジフェニルアミノ,ナフチルアミノ、2-ピリジルアミノ、メトキシカルボニルアミノ、フェノキシカルボニルアミノ、アセチルアミノ、ベンゾイルアミノ、ホルミルアミノ、ピバロイルアミノ、ラウロイルアミノ、カルバモイルアミノ、N,N-ジメチルアミノカルボニルアミノ、N,N-ジエチルアミノカルボニルアミノ、モルホリノカルボニルアミノ、メトキシカルボニルアミノ、エトキシカルボニルアミノ、t-ブトキシカルボニルアミノ、n-オクタデシルオキシカルボニルアミノ、N-メチル-メトキシカルボニルアミノ、フェノキシカルボニルアミノ、スルファモイルアミノ、N,N-ジメチルアミノスルホニルアミノ、メチルスルホニルアミノ、ブチルスルホニルアミノ、フェニルスルホニルアミノ等の置換アミノ基;スルホンアミド基、スルホニル基、カルボキシル基、シアノ基、スルホ基、水酸基、ニトロ基、メルカプト基、イミド基、カルバモイル基、スルホンアミド基、ホスホン酸基、リン酸基又はカルボキシル基、スルホ基、ホスホン酸基、リン酸基の塩等が挙げられる。 Examples of the substituent include ethylenically unsaturated groups such as vinyl, allyl, acryl, and methacryl; halogen atoms such as fluorine, chlorine, bromine, and iodine; acetyl, 2-chloroacetyl, propionyl, octanoyl, acryloyl, methacryloyl, and phenylcarbonyl. Acyl groups such as (benzoyl), phthaloyl, 4-trifluoromethylbenzoyl, pivaloyl, salicyloyl, oxaloyl, stearoyl, methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl, n-octadecyloxycarbonyl, carbamoyl; acetyloxy, benzoyloxy, etc. acyloxy groups of; -pyridylamino, methoxycarbonylamino, phenoxycarbonylamino, acetylamino, benzoylamino, formylamino, pivaloylamino, lauroylamino, carbamoylamino, N,N-dimethylaminocarbonylamino, N,N-diethylaminocarbonylamino, morpholinocarbonylamino, methoxy carbonylamino, ethoxycarbonylamino, t-butoxycarbonylamino, n-octadecyloxycarbonylamino, N-methyl-methoxycarbonylamino, phenoxycarbonylamino, sulfamoylamino, N,N-dimethylaminosulfonylamino, methylsulfonylamino, Substituted amino groups such as butylsulfonylamino and phenylsulfonylamino; sulfonamide group, sulfonyl group, carboxyl group, cyano group, sulfo group, hydroxyl group, nitro group, mercapto group, imide group, carbamoyl group, sulfonamide group, phosphonic acid group , a phosphate group or a carboxyl group, a sulfo group, a phosphonic acid group, a salt of a phosphate group, and the like.
 本発明において、基の炭素原子数は、基中の水素原子が置換基で置換されている場合、その置換後の基の炭素原子数を規定する。例えば、前記炭素原子数1~40のアルキル基の水素原子が置換されている場合、炭素原子数1~40とは、水素原子が置換された後の炭素原子数を指し、水素原子が置換される前の炭素原子数を指すのではない。 In the present invention, the number of carbon atoms in a group defines the number of carbon atoms in the group after the substitution when the hydrogen atoms in the group are substituted. For example, when the hydrogen atom of the alkyl group having 1 to 40 carbon atoms is substituted, the 1 to 40 carbon atoms refers to the number of carbon atoms after the hydrogen atom is substituted, and the hydrogen atom is substituted. It does not refer to the number of carbon atoms before
 前記一般式(A1)で表される化合物Aは、m1が2の場合、Xb1で表される2価の原子若しくは連結基又は直接結合により、2個の特定の基が結合した構造を有し、m1が3~10の場合、Xb1で表されるm1価の原子又は連結基により、m1個の特定の基が結合した構造を有する。このm1個の特定の基は、互いに同じであるか又は異なる。
 また、前記一般式(A2)で表される化合物Aは、m2が2の場合、Xb2で表される2価の原子若しくは連結基又は直接結合により、2個の特定の基が結合した構造を有し、m2が3~10の場合、Xb2で表されるm2価の原子又は連結基によりm2個の特定の基が結合した構造を有する。このm2個の特定の基は、互いに同じであってもよく異なっていてもよい。
 以下、前記Xb1及びXb2をまとめてXと称する場合があり、前記m1及びm2をまとめてmと称する場合がある。
Compound A represented by the general formula (A1), when m1 is 2, has a structure in which two specific groups are bonded via a divalent atom or a linking group represented by X b1 or a direct bond. and when m1 is 3 to 10, it has a structure in which m1 specific groups are linked via an m1-valent atom or a linking group represented by Xb1 . The m1 specific groups are the same or different from each other.
Further, the compound A represented by the general formula (A2), when m2 is 2, has a structure in which two specific groups are bonded by a divalent atom or a linking group represented by X b2 or a direct bond. When m2 is 3 to 10, it has a structure in which m2 specific groups are linked by an m2-valent atom or a linking group represented by X b2 . The m2 specific groups may be the same or different.
Hereinafter, X b1 and X b2 may be collectively referred to as X, and m1 and m2 may be collectively referred to as m.
 前記Xで表される原子又は連結基としては、窒素原子、酸素原子、硫黄原子、リン原子、下記(II-a)若しくは(II-b)で表される基、-CO-、-NR10-及びm価の炭素原子数1~120の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基若しくは炭素原子数2~35の複素環含有基が挙げられる。
 R10は、水素原子、炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、該脂肪族炭化水素基、芳香環含有炭化水素基及び複素環含有基中のメチレン基は、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NH-CO-O-、-NR11-、-S-S-、-SO-若しくは窒素原子又はこれらの組み合わせで置換されていてもよく、前記芳香環含有炭化水素基における芳香環又は複素環含有基における複素環は、他の環と縮合していてもよい。
 R11は、水素原子、炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表す。
The atom or linking group represented by X includes a nitrogen atom, an oxygen atom, a sulfur atom, a phosphorus atom, a group represented by (II-a) or (II-b) below, —CO—, —NR 10 - and m-valent aliphatic hydrocarbon groups having 1 to 120 carbon atoms, aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms.
R 10 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic ring-containing group having 2 to 35 carbon atoms; The methylene group in the group hydrocarbon group, aromatic ring-containing hydrocarbon group and heterocyclic ring-containing group is -O-, -S-, -CO-, -O-CO-, -CO-O-, -O-CO -O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO-S-, -CO-NH-, -NH-CO -, -NH-CO-O-, -NH-CO-O-, -NR 11 -, -S-S-, -SO 2 - or a nitrogen atom or a combination thereof, the aromatic The aromatic ring in the ring-containing hydrocarbon group or the heterocyclic ring in the heterocyclic ring-containing group may be condensed with another ring.
R 11 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic ring-containing group having 2 to 35 carbon atoms.
Figure JPOXMLDOC01-appb-C000012
(*は、*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000012
(* means that the * portion is attached to the adjacent group.)
 前記Xで表されるm価の炭素原子数1~120の脂肪族炭化水素基としては、炭素原子数1~120のアルキル基、炭素原子数3~120のシクロアルキル基及び炭素原子数4~120のシクロアルキルアルキル基等から水素原子をm-1個除いた基が挙げられる。 The m-valent aliphatic hydrocarbon group having 1 to 120 carbon atoms represented by X includes an alkyl group having 1 to 120 carbon atoms, a cycloalkyl group having 3 to 120 carbon atoms and a cycloalkyl group having 4 to 120 carbon atoms. A group obtained by removing m−1 hydrogen atoms from the cycloalkylalkyl group of 120 and the like can be mentioned.
 炭素原子数1~120のアルキル基は、直鎖状であってもよく、分岐状であってもよい。直鎖のアルキル基としては、メチル、エチル、プロピル、ブチル、iso-アミル、tert-アミル、ヘキシル、ヘプチル及びオクチルが挙げられる。分岐のアルキル基としては、iso-プロピル、sec-ブチル、tert-ブチル、iso-ブチル、iso-ペンチル、tert-ペンチル、2-ヘキシル、3-ヘキシル、2-ヘプチル、3-ヘプチル、iso-ヘプチル、tert-ヘプチル、iso-オクチル、tert-オクチル、2-エチルヘキシル、ノニル、イソノニル、デシル、ドデシル、トリデシル、テトラデシル、ペンタデシル、ヘキサデシル、へブロタデシル、オクタデシル等が挙げられる。 The alkyl group having 1 to 120 carbon atoms may be linear or branched. Straight chain alkyl groups include methyl, ethyl, propyl, butyl, iso-amyl, tert-amyl, hexyl, heptyl and octyl. Branched alkyl groups include iso-propyl, sec-butyl, tert-butyl, iso-butyl, iso-pentyl, tert-pentyl, 2-hexyl, 3-hexyl, 2-heptyl, 3-heptyl and iso-heptyl. , tert-heptyl, iso-octyl, tert-octyl, 2-ethylhexyl, nonyl, isononyl, decyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, hebrotadecyl, octadecyl and the like.
 炭素原子数3~120のシクロアルキル基としては、炭素原子数3~120の飽和単環式アルキル基、炭素原子数3~120の飽和多環式アルキル基、及びこれらの基の環中の水素原子の1つ以上がアルキル基で置換された炭素原子数4~120の基が挙げられる。前記飽和単環式アルキル基としては、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル、シクロノニル及びシクロデシル等が挙げられる。前記飽和多環式アルキル基としては、アダマンチル、デカハイドロナフチル、オクタヒドロペンタレン及びビシクロ[1.1.1]ペンタニル等が挙げられる。飽和単環式又は飽和多環式アルキル基の環中の水素原子を置換するアルキル基としては、前記炭素原子数1~120のアルキル基として例示した基が挙げられる。飽和多環式アルキル基の環中の水素原子の1つ以上が、アルキル基で置換された基としては、ボルニル等が挙げられる。 Cycloalkyl groups having 3 to 120 carbon atoms include saturated monocyclic alkyl groups having 3 to 120 carbon atoms, saturated polycyclic alkyl groups having 3 to 120 carbon atoms, and hydrogen atoms in the rings of these groups. Examples include groups having 4 to 120 carbon atoms in which one or more atoms are substituted with an alkyl group. The saturated monocyclic alkyl groups include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl and cyclodecyl. Examples of the saturated polycyclic alkyl groups include adamantyl, decahydronaphthyl, octahydropentalene and bicyclo[1.1.1]pentanyl. Examples of the alkyl group substituting the hydrogen atom in the ring of the saturated monocyclic or saturated polycyclic alkyl group include the groups exemplified as the alkyl group having 1 to 120 carbon atoms. Bornyl etc. are mentioned as a group by which 1 or more of the hydrogen atoms in the ring of the saturated polycyclic alkyl group were substituted by the alkyl group.
 炭素原子数4~120のシクロアルキルアルキル基とは、アルキル基の水素原子が、シクロアルキル基で置換された炭素原子数4~120の基を意味する。シクロアルキルアルキル基中のシクロアルキル基は単環であってもよく、多環であってもよい。シクロアルキル基が単環である炭素原子数4~120のシクロアルキルアルキル基としては、シクロプロピルメチル、2-シクロブチルエチル、3-シクロペンチルプロピル、4-シクロヘキシルブチル、シクロヘプチルメチル、シクロオクチルメチル、2-シクロノニルエチル及び2-シクロデシルエチル等が挙げられる。シクロアルキル基が多環である炭素原子数4~20のシクロアルキルアルキル基としては、3-3-アダマンチルプロピル及びデカハイドロナフチルプロピル等が挙げられる。 A cycloalkylalkyl group having 4 to 120 carbon atoms means a group having 4 to 120 carbon atoms in which a hydrogen atom of an alkyl group is substituted with a cycloalkyl group. A cycloalkyl group in a cycloalkylalkyl group may be monocyclic or polycyclic. Cycloalkylalkyl groups having 4 to 120 carbon atoms in which the cycloalkyl group is monocyclic include cyclopropylmethyl, 2-cyclobutylethyl, 3-cyclopentylpropyl, 4-cyclohexylbutyl, cycloheptylmethyl, cyclooctylmethyl, 2-cyclononylethyl, 2-cyclodecylethyl and the like. The polycyclic cycloalkylalkyl groups having 4 to 20 carbon atoms include 3-3-adamantylpropyl and decahydronaphthylpropyl.
 前記Xで表されるm価の炭素原子数6~35の芳香族炭化水素環含有基は、芳香族炭化水素環を含み、複素環を含まない炭化水素基であり、脂肪族炭化水素基を有していてもよい。芳香族炭化水素環含有基としては、炭素原子数6~35のアリール基及び炭素原子数7~35のアリールアルキル基から水素原子をm-1個除いた基が挙げられる。 The m-valent aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms represented by X is a hydrocarbon group containing an aromatic hydrocarbon ring and not containing a heterocyclic ring, and an aliphatic hydrocarbon group. may have. Examples of aromatic hydrocarbon ring-containing groups include groups obtained by removing m−1 hydrogen atoms from aryl groups having 6 to 35 carbon atoms and arylalkyl groups having 7 to 35 carbon atoms.
 炭素原子数6~35のアリール基は、単環構造であってもよく、縮合環構造であってもよく、更に2つの芳香族炭化水素環が連結したものであってもよい。炭素原子数6~35の縮合環構造のアリール基としては、2つ以上の芳香族炭化水素環が縮合した構造である炭素原子数7~35の炭化水素型芳香族縮合環基等が挙げられる。 The aryl group having 6 to 35 carbon atoms may have a monocyclic structure, a condensed ring structure, or two aromatic hydrocarbon rings linked together. Examples of the aryl group having a condensed ring structure having 6 to 35 carbon atoms include hydrocarbon-type aromatic condensed ring groups having a structure in which two or more aromatic hydrocarbon rings are condensed and having 7 to 35 carbon atoms. .
 炭素原子数6~35の単環構造のアリール基としては、フェニル、トリル、キシリル、エチルフェニル、2,4,6-トリメチルフェニル等が挙げられる。炭素原子数7~20の炭化水素型芳香族縮合環基としては、ナフチル、アントラセニル、フェナントリル、ピレニル、フルオレニル及びインデノフルオレニル等が挙げられる。 Examples of monocyclic aryl groups having 6 to 35 carbon atoms include phenyl, tolyl, xylyl, ethylphenyl, 2,4,6-trimethylphenyl and the like. Hydrocarbon type aromatic condensed ring groups having 7 to 20 carbon atoms include naphthyl, anthracenyl, phenanthryl, pyrenyl, fluorenyl and indenofluorenyl.
 2つの芳香族炭化水素環が連結したアリール基は、2つの単環構造の芳香族炭化水素環が連結したものであってもよく、単環構造の芳香族炭化水素環と縮合環構造の芳香族炭化水素環とが連結したものであってもよく、縮合環構造の芳香族炭化水素環と縮合環構造の芳香族炭化水素環とが連結したものであってもよい。
 2つの芳香族炭化水素環を連結する連結基としては、単結合、スルフィド基(-S-)及びカルボニル基等が挙げられる。
 2つの単環構造の芳香族炭化水素環が連結したアリール基としては、ビフェニル、ジフェニルスルフィド、ベンゾイルフェニル等が挙げられる。
The aryl group in which two aromatic hydrocarbon rings are linked may be one in which two monocyclic aromatic hydrocarbon rings are linked. It may be one in which an aromatic hydrocarbon ring having a condensed ring structure is linked to an aromatic hydrocarbon ring having a condensed ring structure.
A linking group that links two aromatic hydrocarbon rings includes a single bond, a sulfide group (--S--), a carbonyl group, and the like.
The aryl group in which two monocyclic aromatic hydrocarbon rings are linked includes biphenyl, diphenylsulfide, benzoylphenyl and the like.
 炭素原子数7~35のアリールアルキル基は、アルキル基中の水素原子の1つ以上がアリール基で置換された基である。炭素原子数7~35のアリールアルキル基としては、ベンジル、フルオレニル、インデニル、9-フルオレニルメチル、α-メチルベンジル、α,α-ジメチルベンジル、フェニルエチル及びナフチルプロピル基等が挙げられる。 An arylalkyl group having 7 to 35 carbon atoms is a group in which one or more hydrogen atoms in an alkyl group are substituted with an aryl group. Arylalkyl groups having 7 to 35 carbon atoms include benzyl, fluorenyl, indenyl, 9-fluorenylmethyl, α-methylbenzyl, α,α-dimethylbenzyl, phenylethyl and naphthylpropyl groups.
 前記Xで表されるm価の炭素原子数2~35の複素環含有基としては、炭素原子数2~10の複素環基、及びm価の炭化水素基中の水素原子の1つ以上が前記炭素原子数2~10の複素環基で置換された炭素原子数3~35の基が挙げられる。 The m-valent heterocyclic ring-containing group having 2 to 35 carbon atoms represented by X includes a heterocyclic group having 2 to 10 carbon atoms and one or more hydrogen atoms in the m-valent hydrocarbon group. Examples thereof include groups having 3 to 35 carbon atoms substituted with the heterocyclic group having 2 to 10 carbon atoms.
 炭素原子数2~10の複素環基は、複素環式化合物から水素原子を1つ除いた基である。複素環基は、単環構造であってもよく、縮合環構造であってもよい。炭素原子数2~10の縮合環構造の複素環基としては、複素環と、複素環又は炭化水素環とが縮合した構造である炭素原子数3~10の複素環含有縮合環基等が挙げられる。具体的な複素環基としては、ピリジル、キノリル、チアゾリル、テトラヒドロフラニル、ジオキソラニル、テトラヒドロピラニル、メチルチオフェニル、ヘキシルチオフェニル、ベンゾチオフェニル、ピロリル、ピロリジニル、イミダゾリル、イミダゾリジニル、イミダゾリニル、ピラゾリル、ピラゾリジニル、ピペリジニル、ピペラジニル、ピリミジニ、フリル、チエニル、ベンゾオキサゾール-2-イル、チアゾリル、イソチアゾリ、オキサゾリル、イソオキサゾリル、モルホルニル等が挙げられる。
 複素環基は置換基を有していてもよく、該置換基としては、ハロゲン原子、シアノ基、ニトロ基、水酸基、アミノ基、カルボキシ基、メタクリロイル基、アクリロイル基、エポキシ基、ビニル基、ビニルエーテル基、メルカプト基及びイソシアネート基等が挙げられる。
A heterocyclic group having 2 to 10 carbon atoms is a group obtained by removing one hydrogen atom from a heterocyclic compound. The heterocyclic group may have a monocyclic structure or a condensed ring structure. Examples of the heterocyclic group having a condensed ring structure having 2 to 10 carbon atoms include a heterocyclic ring-containing condensed ring group having a structure in which a heterocyclic ring and a heterocyclic ring or a hydrocarbon ring are condensed and having 3 to 10 carbon atoms. be done. Exemplary heterocyclic groups include pyridyl, quinolyl, thiazolyl, tetrahydrofuranyl, dioxolanyl, tetrahydropyranyl, methylthiophenyl, hexylthiophenyl, benzothiophenyl, pyrrolyl, pyrrolidinyl, imidazolyl, imidazolidinyl, imidazolinyl, pyrazolyl, pyrazolidinyl, piperidinyl. , piperazinyl, pyrimidini, furyl, thienyl, benzoxazol-2-yl, thiazolyl, isothiazolyl, oxazolyl, isoxazolyl, morphonyl and the like.
The heterocyclic group may have a substituent, and examples of the substituent include a halogen atom, a cyano group, a nitro group, a hydroxyl group, an amino group, a carboxy group, a methacryloyl group, an acryloyl group, an epoxy group, a vinyl group, and a vinyl ether. groups, mercapto groups and isocyanate groups.
 炭化水素基中の水素原子の1つ以上が前記炭素原子数2~10の複素環基で置換された炭素原子数3~35の基における複素環基としては、前記炭素原子数2~10の複素環基として例示した基が挙げられる。m価の炭化水素基としては、前記炭素原子数1~120の脂肪族炭化水素基及び前記炭素原子数6~35の芳香族炭化水素環含有基として例示した基のうち炭素原子数が1~25であるものから水素原子をm-1個除いた基が挙げられる。 As the heterocyclic group in the group having 3 to 35 carbon atoms in which one or more hydrogen atoms in the hydrocarbon group are substituted with the above heterocyclic group having 2 to 10 carbon atoms, The groups exemplified as the heterocyclic group can be mentioned. As the m-valent hydrocarbon group, among the groups exemplified as the aliphatic hydrocarbon group having 1 to 120 carbon atoms and the aromatic hydrocarbon ring-containing group having 6 to 35 carbon atoms, the number of carbon atoms is from 1 to A group obtained by removing m−1 hydrogen atoms from 25 can be mentioned.
 前記R10及びR11で表される炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。
 前記R10及びR11で表される炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基と同じ基が挙げられる。
As the aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 10 and R 11 , the aliphatic hydrocarbon group having 1 to 120 carbon atoms was exemplified in the explanation of the group represented by X. Among the groups, those having a predetermined number of carbon atoms are included.
As the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by R 10 and R 11 , the carbon atom The same groups as exemplified as aromatic ring-containing hydrocarbon groups of 6 to 35 carbon atoms and heterocyclic ring-containing groups of 2 to 35 carbon atoms can be mentioned.
 mが2の場合、前記Xで表される原子としては、酸素原子及び硫黄原子が挙げられ、連結基としては、メチレン、エチレン、プロピレン、ブチレン、ブチルジイル等のアルキレン基;前記アルキレン基中のメチレン基が-O-、-S-、-CO-O-、-O-CO-に置換された基;エタンジオール、プロパンジオール、ブタンジオール、ペンタンジオール、ヘキサンジオール等のジオール残基;エタンジチオール、プロパンジチオール、ブタンジチオール、ペンタンジチオール、ヘキサンジチオール等のジチオール残基;フェニレン、ナフチレン等のアリーレン基;カテコール、ビスフェノール等の二官能フェノール残基;2,4,8,10-テトラオキサスピロ[5,5]ウンデカン;ピリジン環、ピリミジン環、ピペリジン環、ピペラジン環、トリアジン環、フラン環、チオフェン環及びインドール環等、及びこれらの基に後述する置換基が置換した基等が挙げられる。 When m is 2, the atom represented by X includes an oxygen atom and a sulfur atom, and the linking group includes an alkylene group such as methylene, ethylene, propylene, butylene, and butyldiyl; methylene in the alkylene group; groups substituted with -O-, -S-, -CO-O-, -O-CO-; diol residues such as ethanediol, propanediol, butanediol, pentanediol, hexanediol; ethanedithiol, Dithiol residues such as propanedithiol, butanedithiol, pentanedithiol, hexanedithiol; phenylene, arylene groups such as naphthylene; catechol, bifunctional phenol residues such as bisphenol; 2,4,8,10-tetraoxaspiro [5, 5] undecane; pyridine ring, pyrimidine ring, piperidine ring, piperazine ring, triazine ring, furan ring, thiophene ring, indole ring, etc., and groups obtained by substituting these groups with substituents described later.
 mが3の場合、前記Xで表される原子としては、窒素原子及びリン原子が挙げられ、連結基としては、プロピリジン、1,1,3-ブチリジン等のアルキリジン;フェニル-1,3,5-トリメチレン;イソシアヌル環及びトリアジン環等、及びこれらの基に後述する置換基が置換した基等が挙げられる。 When m is 3, the atom represented by X includes a nitrogen atom and a phosphorus atom, and the linking group includes alkylidine such as propylidine and 1,1,3-butylidine; phenyl-1,3, 5-trimethylene; isocyanuric ring, triazine ring, etc.;
 mが2の場合、前記Xで表される連結基として下記一般式(1)で表される基が挙げられる。
 mが3の場合、前記Xで表される連結基として下記一般式(2)で表される基が挙げられる。
 mが4の場合、前記Xで表される連結基として下記一般式(3)で表される基が挙げられる。
 mが5の場合、前記Xで表される連結基として下記一般式(4)で表される基が挙げられる。
 mが6の場合、前記Xで表される連結基として下記一般式(5)で表される基が挙げられる。
When m is 2, examples of the linking group represented by X include groups represented by the following general formula (1).
When m is 3, examples of the linking group represented by X include groups represented by the following general formula (2).
When m is 4, the linking group represented by X includes groups represented by the following general formula (3).
When m is 5, the linking group represented by X includes a group represented by the following general formula (4).
When m is 6, the linking group represented by X includes groups represented by the following general formula (5).
Figure JPOXMLDOC01-appb-C000013
(前記一般式(1)中、Yは、単結合、-CR5556-、-NR57-、2価の炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基若しくは炭素原子数2~35の複素環含有基、又は、下記一般式(1-1)~(1-3)で表される2価の基を表し、該炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基中のメチレン基は、-O-、-S-、-CO-、-CO-O-、-O-CO-若しくは-NH-又はこれらの組み合わせで置換されていてもよく、
 R55及びR56は、水素原子、炭素原子数1~8のアルキル基、炭素原子数6~20のアリール基又は炭素原子数7~20のアリールアルキル基を表し、
 Z及びZは、それぞれ独立に、直接結合、-O-、-S-、>CO、-CO-O-、-O-CO-、-SO-、-SS-、-SO-、>NR58又は>PR58を表し、
 R57及びR58は、水素原子、炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、
 *は、*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000013
(In the general formula (1), Y 1 is a single bond, —CR 55 R 56 —, —NR 57 —, a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, 6 to 35 carbon atoms, An aromatic ring-containing hydrocarbon group or a heterocyclic ring-containing group having 2 to 35 carbon atoms, or a divalent group represented by the following general formulas (1-1) to (1-3), wherein the carbon atom The methylene group in the aliphatic hydrocarbon group of 1 to 35, the aromatic ring-containing hydrocarbon group of 6 to 35 carbon atoms and the heterocyclic ring-containing group of 2 to 35 carbon atoms is -O-, -S-, -CO-, -CO-O-, -O-CO- or -NH- or a combination thereof,
R 55 and R 56 represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 20 carbon atoms or an arylalkyl group having 7 to 20 carbon atoms;
Z 1 and Z 2 are each independently a direct bond, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO 2 -, -SS-, -SO-, >NR 58 or >PR 58 ,
R 57 and R 58 represent a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic ring-containing group having 2 to 35 carbon atoms. ,
* means that the * portion is attached to the adjacent group. )
Figure JPOXMLDOC01-appb-C000014
(前記一般式(1-1)中、R59は水素原子、置換基を有している場合があるフェニル基、又は炭素原子数3~10のシクロアルキル基を表し、
 R60は炭素原子数1~10のアルキル基、炭素原子数1~10のアルコキシ基、炭素原子数2~10のアルケニル基又はハロゲン原子を表し、前記アルキル基、アルコキシ基及びアルケニル基は置換基を有している場合があり、
 c1は0~5の整数であり、
 *は、*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000014
(In general formula (1-1) above, R 59 represents a hydrogen atom, a phenyl group which may have a substituent, or a cycloalkyl group having 3 to 10 carbon atoms,
R 60 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms or a halogen atom, and the alkyl group, alkoxy group and alkenyl group are substituents; may have
c1 is an integer from 0 to 5,
* means that the * portion is attached to the adjacent group. )
Figure JPOXMLDOC01-appb-C000015
(前記一般式(1-2)中、*は、*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000015
(In the general formula (1-2), * means that the * portion is bonded to the adjacent group.)
Figure JPOXMLDOC01-appb-C000016
(前記一般式(1-3)中、R61及びR62は、それぞれ独立に、炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数6~20のアリールオキシ基、炭素原子数6~20のアリールチオ基、炭素原子数6~20のアリールアルケニル基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はハロゲン原子を表し、該アルキル基及びアリールアルキル基中のメチレン基は不飽和結合、-O-又は-S-に置換されていてもよく、
 R61は、隣接するR61同士で環を形成していてもよく、
 c2は0~4の数を表し、
 c3は0~8の数を表し、
 c4は0~4の数を表し、
 c5は0~4の数を表し、
 c4とc5の数の合計は2~4であり、
 *は、*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000016
(In general formula (1-3), R 61 and R 62 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an oxy group, an arylthio group having 6 to 20 carbon atoms, an arylalkenyl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms, or a halogen atom; and the methylene group in the alkyl group and arylalkyl group may be substituted with an unsaturated bond, -O- or -S-,
adjacent R 61 may form a ring,
c2 represents a number from 0 to 4,
c3 represents a number from 0 to 8,
c4 represents a number from 0 to 4,
c5 represents a number from 0 to 4,
The sum of the numbers of c4 and c5 is 2 to 4,
* means that the * portion is attached to the adjacent group. )
Figure JPOXMLDOC01-appb-C000017
(前記一般式(2)中、Y11は、3価の炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、
 Z、Z及びZは、それぞれ独立に、直接結合、-O-、-S-、>CO、-CO-O-、-O-CO-、-SO-、-SS-、-SO-、>NR62、>PR62、炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、
 R62は、水素原子、炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、該脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基中のメチレン基は、炭素-炭素二重結合、-O-、-CO-、-O-CO-、-CO-O-又は-SO-に置換されていてもよく、
 *は*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000017
(In the general formula (2), Y 11 is a trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a represents a heterocycle-containing group,
Z 1 , Z 2 and Z 3 are each independently a direct bond, -O-, -S-, >CO, -CO-O-, -O-CO-, -SO 2 -, -SS-, - SO—, >NR 62 , >PR 62 , an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a heterocyclic ring-containing group having 2 to 35 carbon atoms; represent,
R 62 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a heterocyclic ring-containing group having 2 to 35 carbon atoms; A methylene group in a group hydrocarbon group, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and a heterocyclic ring-containing group having 2 to 35 carbon atoms is a carbon-carbon double bond, -O-, -CO- , -O-CO-, -CO-O- or -SO 2 -,
* is a * moiety and means to bond with the adjacent group. )
Figure JPOXMLDOC01-appb-C000018
(前記一般式(3)中、Y12は、炭素原子又は4価の炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基若しくは炭素原子数2~35の複素環含有基を表し、該炭素原子数1~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基中のメチレン基は、-CO-O-、-O-、-O-CO-、-NH-CO-、-NH-又は-CO-NH-に置換されていてもよく、
 Z~Zは、それぞれ独立に、前記一般式(2)におけるZ~Zで表される基と同じ範囲の基であり、
 *は*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000018
(In the general formula (3), Y 12 is a carbon atom, a tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or 2 carbon atoms represents a heterocyclic ring-containing group of up to 35, and among the aliphatic hydrocarbon group having 1 to 35 carbon atoms, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms The methylene group of -CO-O-, -O-, -O-CO-, -NH-CO-, -NH- or -CO-NH- may be substituted,
Z 1 to Z 4 are each independently a group in the same range as the groups represented by Z 1 to Z 3 in the general formula (2),
* is a * moiety and means to bond with the adjacent group. )
Figure JPOXMLDOC01-appb-C000019
(前記一般式(4)中、Y13は、5価の炭素原子数2~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、該炭素原子数2~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基中のメチレン基は、-CO-O-、-O-、-O-CO-、-NH-CO-、-NH-又は-CO-NH-に置換されていてもよく、
 Z~Zは、それぞれ独立に、前記一般式(2)におけるZ~Zで表される基と同じ範囲の基であり、
 *は*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000019
(In the general formula (4), Y 13 is a pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a represents a heterocyclic ring-containing group, and a methylene group in the aliphatic hydrocarbon group having 2 to 35 carbon atoms, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms is optionally substituted with -CO-O-, -O-, -O-CO-, -NH-CO-, -NH- or -CO-NH-,
Z 1 to Z 5 are each independently a group in the same range as the groups represented by Z 1 to Z 3 in the general formula (2),
* is a * moiety and means to bond with the adjacent group. )
Figure JPOXMLDOC01-appb-C000020
(前記一般式(5)中、Y14は、6価の炭素原子数2~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基又は炭素原子数2~35の複素環含有基を表し、該炭素原子数2~35の脂肪族炭化水素基、炭素原子数6~35の芳香環含有炭化水素基若しくは炭素原子数2~35の複素環含有基中のメチレン基は、-CO-O-、-O-、-O-CO-、-NH-CO-、-NH-又は-CO-NH-に置換されていてもよく、
 Z~Zは、それぞれ独立に、前記一般式(2)におけるZ~Zで表される基と同じ範囲の基であり、
 *は*部分で、隣接する基と結合することを意味する。)
Figure JPOXMLDOC01-appb-C000020
(In the general formula (5), Y 14 is a hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms, or a represents a heterocyclic ring-containing group, and is a methylene group in the aliphatic hydrocarbon group having 2 to 35 carbon atoms, the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or the heterocyclic ring-containing group having 2 to 35 carbon atoms is optionally substituted with -CO-O-, -O-, -O-CO-, -NH-CO-, -NH- or -CO-NH-,
Z 1 to Z 6 are each independently a group in the same range as the groups represented by Z 1 to Z 3 in the general formula (2),
* is a * moiety and means to bond with the adjacent group. )
 前記一般式(1)中のYで表される2価の炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(1)中のYで表される炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基と同じ基が挙げられる。
The divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 1 in the general formula (1) includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups exemplified as group hydrocarbon groups, those having a predetermined number of carbon atoms can be mentioned.
As the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 1 in the general formula (1), the group represented by the above X Examples include the same groups as those exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description.
 前記一般式(1)中のR55及びR56で表される炭素原子数1~8のアルキル基としては、前記Xで表される基の説明において炭素原子数1~120のアルキル基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(1)中のR55及びR56で表される炭素原子数6~20のアリール基及び炭素原子数7~20のアリールアルキル基としては、前記Xで表される基の説明において炭素原子数6~35のアリール基及び炭素原子数7~35のアリールアルキル基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。
The alkyl group having 1 to 8 carbon atoms represented by R 55 and R 56 in the general formula (1) is exemplified as an alkyl group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups described above, those having a predetermined number of carbon atoms can be mentioned.
As the aryl group having 6 to 20 carbon atoms and the arylalkyl group having 7 to 20 carbon atoms represented by R 55 and R 56 in the general formula (1), Among the groups exemplified as the aryl group having 6 to 35 carbon atoms and the arylalkyl group having 7 to 35 carbon atoms, those satisfying the predetermined number of carbon atoms can be mentioned.
 前記一般式(1)中のR57及びR58で表される炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(1)中のR57及びR58で表される炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基と同じ基が挙げられる。
The aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 57 and R 58 in the general formula (1) includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups exemplified as group hydrocarbon groups, those having a predetermined number of carbon atoms can be mentioned.
The aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by R 57 and R 58 in the general formula (1) are represented by the above X and the same groups as those exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description of the group.
 前記一般式(1-1)中のR59で表される炭素原子数3~10のシクロアルキル基としては、前記Xで表される基の説明において炭素原子数3~120のシクロアルキル基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。 As the cycloalkyl group having 3 to 10 carbon atoms represented by R 59 in the general formula (1-1), the cycloalkyl group having 3 to 120 carbon atoms in the description of the group represented by X Among the exemplified groups, those having a predetermined number of carbon atoms are included.
 前記一般式(1-1)中のR60で表される炭素原子数1~10のアルキル基としては、前記Xで表される基の説明において炭素原子数1~120のアルキル基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。 The alkyl group having 1 to 10 carbon atoms represented by R 60 in the general formula (1-1) is exemplified as the alkyl group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups, those having a predetermined number of carbon atoms are included.
 前記一般式(1-1)中のR60で表される炭素原子数1~10のアルコキシ基としては、メチルオキシ、エチルオキシ、iso-プロピルオキシ、ブチルオキシ、sec-ブチルオキシ、tert-ブチルオキシ、iso-ブチルオキシ、アミルオキシ、iso-アミルオキシ、tert-アミルオキシ、ヘキシルオキシ、2-ヘキシルオキシ、3-ヘキシルオキシ、シクロヘキシルオキシ、4-メチルシクロヘキシルオキシ、ヘプチルオキシ、2-ヘプチルオキシ、3-ヘプチルオキシ、iso-ヘプチルオキシ、tert-ヘプチルオキシ、1-オクチルオキシ、iso-オクチルオキシ、tert-オクチルオキシ等が挙げられる。 The alkoxy group having 1 to 10 carbon atoms represented by R 60 in the general formula (1-1) includes methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso- butyloxy, amyloxy, iso-amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyl oxy, tert-heptyloxy, 1-octyloxy, iso-octyloxy, tert-octyloxy and the like.
 前記一般式(1-1)中のR60で表される炭素原子数2~10のアルケニル基としては、ビニル、アリル、1-プロペニル、イソプロペニル、2-ブテニル、1,3-ブタジエニル、2-ペンテニル、2-オクテニル等が挙げられる。 The alkenyl group having 2 to 10 carbon atoms represented by R 60 in the general formula (1-1) includes vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2 -pentenyl, 2-octenyl and the like.
 前記一般式(1-1)中のR60で表されるハロゲン原子としては、フッ素原子、塩素原子、臭素原子及びヨウ素原子等が挙げられる。 Examples of the halogen atom represented by R 60 in the general formula (1-1) include fluorine atom, chlorine atom, bromine atom and iodine atom.
 前記一般式(1-3)中のR61及びR62で表される炭素原子数1~10のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基及び炭素原子数2~20の複素環含有基としては、前記Xで表される基の説明において炭素原子数1~120のアルキル基、炭素原子数6~35のアリール基、炭素原子数7~35のアリールアルキル基及び炭素原子数2~35の複素環含有基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。 an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms represented by R 61 and R 62 in the general formula (1-3); The heterocyclic ring-containing group having 2 to 20 carbon atoms includes an alkyl group having 1 to 120 carbon atoms, an aryl group having 6 to 35 carbon atoms, and an aryl group having 7 to 35 carbon atoms in the description of the group represented by X. Among the groups exemplified as the arylalkyl group and the heterocyclic ring-containing group having 2 to 35 carbon atoms, those satisfying a predetermined number of carbon atoms can be mentioned.
 前記一般式(1-3)中のR61及びR62で表される炭素原子数6~20のアリールオキシ基としては、フェニルオキシ、ナフチルオキシ、2-メチルフェニルオキシ、3-メチルフェニルオキシ、4-メチルフェニルオキシ、4-ビニルフェニル二オキシ、3-iso-プロピルフェニルオキシ、4-iso-プロピルフェニルオキシ、4-ブチルフェニルオキシ、4-tert-ブチルフェニルオキシ、4-へキシルフェニルオキシ、4-シクロヘキシルフェニルオキシ、4-オクチルフェニルオキシ、4-(2-エチルヘキシル)フェニルオキシ、2,3-ジメチルフェニルオキシ、2,4-ジメチルフェニルオキシ、2,5-ジメチルフェニルオキシ、2,6-ジメチルフェニルオキシ、3,4-ジメチルフェニルオキシ、3,5-ジメチルフェニルオキシ、2,4-ジ-tert-ブチルフェニルオキシ、2,5-ジ-tert-ブチルフェニルオキシ、2,6-ジ-tert-ブチルフェニルオキシ、2,4-ジーtert-ペンチルフェニルオキシ、2,5-tert-アミルフェニルオキシ、4-シクロへキシルフェニルオキシ、2,4,5-トリメチルフェニルオキシ、フェロセニルオキシ等が挙げられる。 Examples of the aryloxy group having 6 to 20 carbon atoms represented by R 61 and R 62 in the general formula (1-3) include phenyloxy, naphthyloxy, 2-methylphenyloxy, 3-methylphenyloxy, 4-methylphenyloxy, 4-vinylphenyldioxy, 3-iso-propylphenyloxy, 4-iso-propylphenyloxy, 4-butylphenyloxy, 4-tert-butylphenyloxy, 4-hexylphenyloxy, 4-cyclohexylphenyloxy, 4-octylphenyloxy, 4-(2-ethylhexyl)phenyloxy, 2,3-dimethylphenyloxy, 2,4-dimethylphenyloxy, 2,5-dimethylphenyloxy, 2,6- dimethylphenyloxy, 3,4-dimethylphenyloxy, 3,5-dimethylphenyloxy, 2,4-di-tert-butylphenyloxy, 2,5-di-tert-butylphenyloxy, 2,6-di- tert-butylphenyloxy, 2,4-di-tert-pentylphenyloxy, 2,5-tert-amylphenyloxy, 4-cyclohexylphenyloxy, 2,4,5-trimethylphenyloxy, ferrocenyloxy, etc. is mentioned.
 前記一般式(1-3)中のR61及びR62で表される炭素原子数6~20のアリールチオ基としては、前記炭素原子数6~20のアリールオキシ基の酸素原子を硫黄原子に置換した基等が挙げられる。 As the arylthio group having 6 to 20 carbon atoms represented by R 61 and R 62 in the general formula (1-3), the oxygen atom of the aryloxy group having 6 to 20 carbon atoms is substituted with a sulfur atom. and the like.
 前記一般式(1-3)中のR61及びR62で表される炭素原子数6~20のアリールアルケニル基としては、前記炭素原子数6~20のアリールオキシ基の酸素原子をビニル、アリル、1-プロペニル、イソプロペニル、2-ブテニル、1,3-ブタジエニル、2-ペンテニル、2-オクテニル等のアルケニル基で置換した基等が挙げられる。 As the arylalkenyl group having 6 to 20 carbon atoms represented by R 61 and R 62 in the general formula (1-3), the oxygen atom of the aryloxy group having 6 to 20 carbon atoms is vinyl or allyl. , 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl, 2-pentenyl, 2-octenyl and other alkenyl-substituted groups.
 前記一般式(1-3)中のR61及びR62で表されるハロゲン原子としては、前記一般式(1-1)中のR60で表されるハロゲン原子と同じものが挙げられる。 The halogen atoms represented by R 61 and R 62 in the general formula (1-3) include the same halogen atoms as those represented by R 60 in the general formula (1-1).
 前記一般式(1-3)中の隣接するR61同士が形成していてもよい環としてはシクロペンテン環、シクロヘキセン環及びベンゼン環等が挙げられる。 Examples of the ring that may be formed by adjacent R 61 groups in the general formula (1-3) include a cyclopentene ring, a cyclohexene ring and a benzene ring.
 前記一般式(2)中のY11で表される3価の炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基から水素原子を2つ除いた3価の基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(2)中のY11で表される3価の炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基から水素原子を2つ除いた3価の基が挙げられる。
The trivalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 11 in the general formula (2) includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among trivalent groups obtained by removing two hydrogen atoms from the groups exemplified as group hydrocarbon groups, trivalent groups having a predetermined number of carbon atoms can be mentioned.
The trivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 11 in the general formula (2) are represented by the above X trivalent groups obtained by removing two hydrogen atoms from the groups exemplified as aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the groups.
 前記一般式(2)中のZ、Z及びZで表される炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基から水素原子を1つ除いた2価の基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(2)中のZ、Z及びZで表される炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基から水素原子を1つ除いた2価の基が挙げられる。
The aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Z 1 , Z 2 and Z 3 in the general formula (2) includes Among divalent groups obtained by removing one hydrogen atom from the groups exemplified as the 120 aliphatic hydrocarbon groups, divalent groups having a predetermined number of carbon atoms can be mentioned.
As the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Z 1 , Z 2 and Z 3 in the general formula (2), the above X A divalent group obtained by removing one hydrogen atom from the groups exemplified as aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the group represented by mentioned.
 前記一般式(2)中のR62で表される炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(2)中のR62で表される炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基と同じ基が挙げられる。
The aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 62 in the general formula (2) is an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among the groups exemplified as the groups, those having a predetermined number of carbon atoms can be mentioned.
As the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by R 62 in the general formula (2), the group represented by the above X Examples include the same groups as those exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description.
 前記一般式(3)中、Y12で表される4価の炭素原子数1~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基から水素原子を3つ除いた4価の基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(3)中、Y12で表される4価の炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基から水素原子を3つ除いた4価の基が挙げられる。
In the general formula (3), the tetravalent aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by Y 12 includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among tetravalent groups obtained by removing three hydrogen atoms from the groups exemplified as group hydrocarbon groups, those satisfying a predetermined number of carbon atoms can be mentioned.
In the general formula (3), the tetravalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms represented by Y 12 are represented by the above X tetravalent groups obtained by removing three hydrogen atoms from the groups exemplified as the aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and the heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the groups.
 前記一般式(4)中、Y13で表される5価の炭素原子数2~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基から水素原子を4つ除いた5価の基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(4)中、Y13で表される5価の炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基から水素原子を4つ除いた5価の基が挙げられる。
In the general formula (4), the pentavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 13 includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among pentavalent groups obtained by removing four hydrogen atoms from the groups exemplified as group hydrocarbon groups, those satisfying a predetermined number of carbon atoms can be mentioned.
In the general formula (4), the pentavalent C 6-35 aromatic ring-containing hydrocarbon group and the C 2-35 heterocyclic ring-containing group represented by Y 13 are represented by the above X and a pentavalent group obtained by removing four hydrogen atoms from the groups exemplified as the aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms and the heterocyclic ring-containing group having 2 to 35 carbon atoms in the description of the group.
 前記一般式(5)中、Y14で表される6価の炭素原子数2~35の脂肪族炭化水素基としては、前記Xで表される基の説明において炭素原子数1~120の脂肪族炭化水素基として例示した基から水素原子を5つ除いた6価の基のうち所定の炭素原子数を満たすものが挙げられる。
 前記一般式(5)中、Y14で表される6価の炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基としては、前記Xで表される基の説明において炭素原子数6~35の芳香環含有炭化水素基及び炭素原子数2~35の複素環含有基として例示した基から水素原子を5つ除いた6価の基が挙げられる。
In the general formula (5), the hexavalent aliphatic hydrocarbon group having 2 to 35 carbon atoms represented by Y 14 includes an aliphatic hydrocarbon group having 1 to 120 carbon atoms in the description of the group represented by X. Among hexavalent groups obtained by removing five hydrogen atoms from the groups exemplified as group hydrocarbon groups, those satisfying a predetermined number of carbon atoms can be mentioned.
In the general formula (5), the hexavalent C 6-35 aromatic ring-containing hydrocarbon group and the C 2-35 heterocyclic ring-containing group represented by Y 14 are represented by the above X hexavalent groups obtained by removing five hydrogen atoms from the groups exemplified as aromatic ring-containing hydrocarbon groups having 6 to 35 carbon atoms and heterocyclic ring-containing groups having 2 to 35 carbon atoms in the description of the groups.
 前記脂肪族炭化水素基、芳香環含有炭化水素基、複素環含有基、アルコキシ基、アルケニル基、アリールオキシ基、アリールチオ基及びアリールアルケニル基は、置換基を有していてもよい。置換基を有するとは、基中の水素原子が置換基で置換されていることを意味する。すなわち、本発明において、前記脂肪族炭化水素基、芳香環含有炭化水素基、複素環含有基、アルコキシ基、アルケニル基、アリールオキシ基、アリールチオ基及びアリールアルケニル基には、これらの基中の水素原子が後述する置換基で置換された構造の基も含まれる。 The aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group, heterocyclic ring-containing group, alkoxy group, alkenyl group, aryloxy group, arylthio group and arylalkenyl group may have a substituent. Having a substituent means that a hydrogen atom in the group is replaced with a substituent. That is, in the present invention, the aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group, heterocyclic ring-containing group, alkoxy group, alkenyl group, aryloxy group, arylthio group and arylalkenyl group include hydrogen A group having a structure in which an atom is substituted with a substituent described below is also included.
 前記置換基としては、前記R等で表される基の説明において例示した置換基が挙げられる。 Examples of the substituent include the substituents exemplified in the description of the group represented by R 1 and the like.
 本発明で用いる化合物Aは、前記一般式(A1)、(A2)又は(A3)で表される化合物である。
 前記化合物Aは、後述するように、加熱によりフェノール性水酸基を保護しているRが脱離することで、紫外線吸収能を示すことができる。このため、前記化合物Aを含む本発明の組成物は、耐久性、すなわち耐光性に優れた硬化物を製造できる。
 化合物Aを用いて、より硬化物の耐久性を上げるためには、添加量の増量が必要であるが、増量することで光硬化性組成物の現像速度が低下する場合がある。本発明においては、化合物Aと化合物Bとを併用することで、化合物Aを増量することなく、耐久性を付与させることができ、光硬化性組成物の現像速度を維持できる。
 従来の紫外線吸収剤は、重合系内に添加すると、光硬化のために照射された光を吸収するため光重合開始剤の分解を阻害し、これにより光硬化性組成物の硬化を阻害し、感度を低下させる。これに対し、化合物Aは、重合の際には光硬化のために照射された光の吸収能が低いため光重合開始剤の分解阻害が抑制されており、光硬化性組成物の硬化を阻害しないため感度の低下を抑えられる。さらに、化合物Aは、光安定化剤としての化合物Bとの併用時にも良好な感度を維持できる。
Compound A used in the present invention is a compound represented by the general formula (A1), (A2) or (A3).
As will be described later, the compound A can show ultraviolet absorption ability by removing R 9 protecting the phenolic hydroxyl group by heating. Therefore, the composition of the present invention containing the compound A can produce a cured product excellent in durability, ie, light resistance.
In order to further increase the durability of the cured product using compound A, the amount added must be increased, but the increased amount may reduce the development speed of the photocurable composition. In the present invention, by using compound A and compound B together, durability can be imparted without increasing the amount of compound A, and the development speed of the photocurable composition can be maintained.
Conventional ultraviolet absorbers, when added to the polymerization system, absorb the light irradiated for photocuring, thereby inhibiting the decomposition of the photopolymerization initiator, thereby inhibiting the curing of the photocurable composition, Decrease sensitivity. On the other hand, compound A has a low absorbability of light irradiated for photocuring during polymerization, so inhibition of decomposition of the photopolymerization initiator is suppressed, and curing of the photocurable composition is inhibited. Because it does not, the decrease in sensitivity can be suppressed. Furthermore, compound A can maintain good sensitivity even when used in combination with compound B as a photostabilizer.
 フェノール性水酸基を有する紫外線吸収剤は、フェノール性水酸基の影響により、組成物中で凝集しやすく、組成物に対する添加量の増量が困難であるとともに、凝集することでその機能を十分に発揮できない。これに対して、化合物Aは、フェノール性水酸基がRにより保護された構造を有することで組成物中での分散安定性に優れる。その結果、化合物Aは、従来のフェノール性水酸基を有する紫外線吸収剤と比較して、組成物に対する添加量の増量が容易であるとともに硬化物内に分散させることが容易であり、その機能を十分に発揮できる。 A UV absorber having a phenolic hydroxyl group tends to aggregate in the composition due to the influence of the phenolic hydroxyl group, and it is difficult to increase the amount added to the composition. On the other hand, Compound A has a structure in which the phenolic hydroxyl group is protected by R9 , and is therefore excellent in dispersion stability in the composition. As a result, the compound A can be easily added to the composition and easily dispersed in the cured product, compared with conventional UV absorbers having a phenolic hydroxyl group, and its function can be fully realized. can be demonstrated in
 さらに、上述のように、化合物Aは、Rによりフェノール性水酸基が保護されていることで光硬化性組成物の硬化阻害の発生を抑制できるため、本発明の組成物は、硬化物の製造が容易なものとなる。 Furthermore, as described above, since the phenolic hydroxyl group of compound A is protected by R 9 , it is possible to suppress the occurrence of curing inhibition of the photocurable composition. becomes easier.
 フェノール系紫外線吸収剤を化合物Bと組み合わせた場合では、組成物の厚み方向に沿って光の透過量が大きく低下することで、例えば、硬化物及び基材の間の密着力が低下し、硬化物が基材から剥離しやすくなるといった不具合を生じる。しかし、本発明においては、化合物Aを用いることで上述のように硬化時に照射される光の吸収を抑制できる結果、基材との剥離が抑制された硬化物を得ることができる。 When a phenolic UV absorber is combined with compound B, the amount of light transmitted along the thickness direction of the composition is greatly reduced, for example, the adhesion between the cured product and the substrate is reduced, and curing It causes a problem that the object is easily peeled off from the base material. However, in the present invention, the absorption of light irradiated during curing can be suppressed by using compound A as described above, and as a result, a cured product in which peeling from the substrate is suppressed can be obtained.
 さらに、本発明の組成物は、樹脂成分として感光性樹脂等の光照射によりアルカリ現像液に対する溶解性が変化する成分を含む場合、感光性発現のために照射される光の吸収能が低いため、感光性を安定的に発現可能となる。このようなことから、本発明の組成物は、感光性に優れ、耐久性に優れた硬化物が得られる感光性組成物とすることができる。 Furthermore, when the composition of the present invention contains, as a resin component, a component such as a photosensitive resin whose solubility in an alkaline developer changes upon irradiation with light, the ability to absorb irradiated light is low for developing photosensitivity. , it becomes possible to stably express the photosensitivity. Accordingly, the composition of the present invention can be a photosensitive composition that provides a cured product with excellent photosensitivity and excellent durability.
 前記化合物Aは、フェノール性水酸基が保護基Rにより保護された構造を有しており、保護基Rの脱離により、紫外線吸収能を有するものとすることができる。紫外線吸収能を有するとは、波長250nm以上450nm以下の範囲の光を吸収できることをいう。本発明においては、保護基Rの脱離後の最大吸収波長が、波長250nm以上600nm以内の範囲で、250nm以上400nm以下であることが好ましく、260nm以上390nm以下であることがより好ましく、特に280nm以上380nm以下であることが好ましい。本発明の組成物は、耐久性を有する硬化物の製造が容易なものとなるからである。 The compound A has a structure in which a phenolic hydroxyl group is protected by a protecting group R9 , and can be rendered to have ultraviolet absorbing ability by elimination of the protecting group R9 . Having ultraviolet absorption ability means being able to absorb light in the wavelength range of 250 nm or more and 450 nm or less. In the present invention, the maximum absorption wavelength after elimination of the protecting group R 9 is in the wavelength range of 250 nm or more and 600 nm or less, preferably 250 nm or more and 400 nm or less, more preferably 260 nm or more and 390 nm or less, particularly It is preferably 280 nm or more and 380 nm or less. This is because the composition of the present invention facilitates production of a durable cured product.
 最大吸収波長の測定方法としては、例えばクロロホルム等の溶媒中に0.01g/Lの濃度となるように化合物を溶解したものを評価用サンプルとし、これを、石英セル(光路長10mm、厚み1.25mm)に充填して吸光光度計(例えば、U-3900(日立ハイテクサイエンス社製))を用いて吸光度を測定する方法が挙げられる。 As a method for measuring the maximum absorption wavelength, for example, a compound dissolved in a solvent such as chloroform at a concentration of 0.01 g/L is used as an evaluation sample, and this is placed in a quartz cell (optical path length 10 mm, thickness 1 .25 mm) and measure the absorbance using an absorptiometer (for example, U-3900 (manufactured by Hitachi High-Tech Science)).
 前記化合物Aは、波長250nm以上600nm以下の範囲での最大吸収波長を、前記保護基Rの脱離後の化合物と比較して短波長側とすることができる。
 前記化合物Aの最大吸収波長と、保護基Rの脱離後の化合物との最大吸収波長の差は、1nm以上とすることができ、1nm以上100nm以下であることが好ましく、特に1nm以上50nm以下であることが好ましい。最大吸収波長の差が前記範囲であることで、前記化合物Aは、硬化阻害抑制効果に優れたものとなるからである。
The compound A can have a maximum absorption wavelength in the wavelength range of 250 nm or more and 600 nm or less on the shorter wavelength side than the compound after elimination of the protecting group R9 .
The difference between the maximum absorption wavelength of the compound A and the maximum absorption wavelength of the compound after elimination of the protective group R9 can be 1 nm or more, preferably 1 nm or more and 100 nm or less, and particularly 1 nm or more and 50 nm. The following are preferred. This is because when the difference in the maximum absorption wavelength is within the above range, the compound A is excellent in the effect of suppressing curing inhibition.
 前記化合物Aは、加熱により保護基Rが脱離するものとすることができる。
 前記化合物Aに含まれる保護基Rが脱離する温度としては、100℃以上300℃以下とすることができ、120℃以上250℃以下であることが好ましく、特に150℃以上230℃以下であることが好ましい。前記温度であることで、前記組成物は、耐久性を有する硬化物の製造が容易なものとなるからである。
The protecting group R9 of the compound A can be released by heating.
The temperature at which the protecting group R 9 contained in the compound A is eliminated may be 100° C. or higher and 300° C. or lower, preferably 120° C. or higher and 250° C. or lower, particularly 150° C. or higher and 230° C. or lower. Preferably. This is because the above temperature facilitates the production of a durable cured product of the composition.
 保護基の脱離温度は、例えば、STA(示差熱熱重量同時測定装置)を用いて測定した重量変化における第1重量減少の開始温度として測定することができる。測定条件は、測定容器に化合物Aを10mg充填して、測定温度範囲:30℃~350℃、昇温速度:10℃/minとすることができる。示差熱熱重量同時測定装置としては、STA7000((株)日立ハイテクサイエンス社製)等が挙げられる。 The detachment temperature of the protective group can be measured, for example, as the temperature at which the first weight loss begins in the weight change measured using a STA (simultaneous differential thermogravimetric analyzer). As for the measurement conditions, 10 mg of compound A is filled in a measurement container, the measurement temperature range is 30° C. to 350° C., and the temperature increase rate is 10° C./min. STA7000 (manufactured by Hitachi High-Tech Science Co., Ltd.) and the like can be used as the simultaneous differential thermal thermogravimetric measurement device.
 前記一般式(A1)中のR及びRの少なくとも一方は-O-Rである。
 十分な耐久性を有する硬化物を製造可能であり、かつ、感度に優れた硬化性組成物が得られ、さらに合成が容易である観点からは、R及びRのいずれか一方が、-O-Rであることが好ましい。
 また、紫外線吸収能の変化を大きいものとする観点からは、R及びRの両者が-O-Rであることが好ましい。
 前記R及びRは、一方のみが-O-Rである場合、他方は水素原子、水酸基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基であることが好ましく、なかでも水素原子又は炭素原子数1~40のアルキル基であることが好ましく、特に水素原子又は炭素原子数1~5のアルキル基であることが好ましく、なかでも特に水素原子、無置換の炭素原子数1~5のアルキル基であることが好ましい。前記化合物Aは、紫外線吸収能の変化が大きいものとなり、硬化阻害の発生が抑制できるからである。
At least one of R 1 and R 2 in the general formula (A1) is —OR 9 .
From the viewpoint of being able to produce a cured product having sufficient durability, obtaining a curable composition with excellent sensitivity, and being easy to synthesize, one of R 1 and R 2 is - OR 9 is preferred.
Also, from the viewpoint of increasing the change in the ultraviolet absorbability, both R 1 and R 2 are preferably —OR 9 .
When only one of R 1 and R 2 is —OR 9 , the other is a hydrogen atom, a hydroxyl group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms. It is preferably an arylalkyl group having 7 to 20 carbon atoms or a heterocyclic ring-containing group having 2 to 20 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 40 carbon atoms, particularly a hydrogen atom or carbon An alkyl group having 1 to 5 atoms is preferable, and a hydrogen atom and an unsubstituted alkyl group having 1 to 5 carbon atoms are particularly preferable. This is because the compound A has a large change in ultraviolet absorption ability and can suppress the occurrence of curing inhibition.
 上述したR及びRについての事項は、前記一般式(A2)中のR’及びR’、並びに前記一般式(A3)中のR”及びR”についても当てはまる。 The matters regarding R 1 and R 2 described above also apply to R 1 ′ and R 2 ′ in the general formula (A2) and R 1 ″ and R 2 ″ in the general formula (A3).
 前記Rは、炭素原子数1~20のアルキル基又は炭素原子数2~20のアルケニル基であることが好ましく、なかでも、炭素原子数1~20のアルキル基であることが好ましく、特に炭素原子数1~8のアルキル基であることが好ましい。前記化合物Aは、紫外線吸収能の変化が大きいものとなるからである。また、本発明の組成物は、耐久性を有する硬化物の製造が容易なものとなるからである。 R 9 is preferably an alkyl group having 1 to 20 carbon atoms or an alkenyl group having 2 to 20 carbon atoms, more preferably an alkyl group having 1 to 20 carbon atoms, particularly carbon An alkyl group having 1 to 8 atoms is preferred. This is because the compound A has a large change in ultraviolet absorption ability. Moreover, the composition of the present invention facilitates the production of a durable cured product.
 前記Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基である場合に、酸素原子側の末端のメチレン基が-CO-O-に置換されているもの、すなわち、酸素原子側の末端に-CO-O-が結合しているものであることが好ましい。 R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 carbon atoms. -20 heterocyclic ring-containing groups in which the methylene group at the end on the oxygen atom side is substituted with -CO-O-, i.e., -CO-O- is bonded to the end on the oxygen atom side It is preferable that there is
 より具体的には、酸素原子側の末端のメチレン基が-CO-O-に置換されている、炭素原子数1~20のアルキル基又は炭素原子数2~20のアルケニル基であることが好ましい。
 酸素原子側の末端のメチレン基が-CO-O-に置換されている、炭素原子数1~20のアルキル基又は炭素原子数2~20のアルケニル基とは、「*-CO-O-R300」で表される基である。前記式中、*は酸素原子との結合手を示し、R300は炭素原子数1~19のアルキル基又は炭素原子数2~19のアルケニル基を示す。
More specifically, it is preferably an alkyl group having 1 to 20 carbon atoms or an alkenyl group having 2 to 20 carbon atoms, in which the methylene group at the terminal on the oxygen atom side is substituted with —CO—O—. .
The alkyl group having 1 to 20 carbon atoms or the alkenyl group having 2 to 20 carbon atoms in which the methylene group at the end on the oxygen atom side is substituted with —CO—O— means “*—CO—O—R 300 " is a group. In the above formula, * represents a bond with an oxygen atom, and R 300 represents an alkyl group having 1 to 19 carbon atoms or an alkenyl group having 2 to 19 carbon atoms.
 前記Rは、酸素原子側の末端のメチレン基が-CO-O-に置換されている炭素原子数1~20のアルキル基であることが好ましく、特に酸素原子側の末端のメチレン基が-CO-O-に置換されている炭素原子数1~8のアルキル基であることが好ましく、なかでも特に酸素原子側の末端のメチレン基が-CO-O-に置換されている置換基を有していない炭素原子数1~8のアルキル基であることが好ましく、なかでもCO-O-Cで表される基であることが好ましく、特に-CO-O-tert-ブチル基であることが好ましい。前記化合物Aは、例えば加熱により、容易にRが脱離してフェノール性水酸基を生成できるからである。またその結果、本発明の組成物は、耐久性を有する硬化物の製造が容易なものとなるからである。
 なお、酸素原子側の末端のメチレン基が-CO-O-に置換されているアルキル基を有するものとしては、後述する式(A1-1)で表される化合物等が挙げられる。
R 9 is preferably an alkyl group having 1 to 20 carbon atoms in which the terminal methylene group on the oxygen atom side is substituted with —CO—O—, particularly the terminal methylene group on the oxygen atom side is — It is preferably an alkyl group having 1 to 8 carbon atoms substituted with CO-O-, and among these, particularly the terminal methylene group on the oxygen atom side is substituted with -CO-O-. It is preferably an alkyl group having 1 to 8 carbon atoms that is not Preferably. This is because R9 can be easily eliminated from the compound A by heating, for example, to form a phenolic hydroxyl group. As a result, the composition of the present invention can be easily produced into a durable cured product.
Examples of those having an alkyl group in which the methylene group at the end on the oxygen atom side is substituted with --CO--O-- include compounds represented by formula (A1-1) described later.
 前記一般式(A1)、(A2)及び(A3)中のR、R、R、R、R及びRは、それぞれ独立に、ハロゲン原子又は炭素原子数1~40のアルキル基であることが好ましく、置換基を有していない炭素原子数1~40のアルキル基、エチレン性不飽和基を置換基として有する炭素原子数1~40のアルキル基、端部のメチレン基が-O-に置換された炭素原子数1~40のアルキル基(炭素原子数1~40のアルコキシ基)、基中のメチレン基が-O-CO-に置換された炭素原子数1~40のアルキル基、又は端部のメチレン基が-O-に置換され、且つ、基中のその他のメチレン基が-O-CO-に置換された炭素原子数1~40のアルキル基(炭素原子数1~40のアルコキシ基)であることがより好ましく、置換基を有していない炭素原子数1~20のアルキル基、置換基を有していない炭素原子数1~20のアルコキシ基、エチレン性不飽和基を置換基として有する炭素原子数1~20のアルコキシ基、基中のメチレン基が-O-CO-に置換された置換基を有していない炭素原子数1~20のアルキル基、又は基中のメチレン基が-O-CO-に置換された置換基を有していない炭素原子数1~20のアルコキシ基であることがさらに好ましく、特に置換基を有していない炭素原子数1~10のアルキル基、置換基を有していない炭素原子数1~10のアルコキシ基、エチレン性不飽和基を置換基として有する炭素原子数1~10のアルコキシ基、基中のメチレン基が-O-CO-に置換された置換基を有していない炭素原子数1~10のアルキル基、又は基中のメチレン基が-O-CO-に置換された置換基を有していない炭素原子数1~10のアルコキシ基であることが好ましい。 R 3 , R 4 , R 5 , R 6 , R 7 and R 8 in the general formulas (A1), (A2) and (A3) are each independently a halogen atom or an alkyl having 1 to 40 carbon atoms is preferably an unsubstituted alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms having an ethylenically unsaturated group as a substituent, and a methylene group at the end an alkyl group having 1 to 40 carbon atoms (alkoxy group having 1 to 40 carbon atoms) substituted with -O-, and a methylene group having 1 to 40 carbon atoms substituted with -O-CO- An alkyl group, or an alkyl group having 1 to 40 carbon atoms (1 carbon atom to 40 alkoxy group), an unsubstituted alkyl group having 1 to 20 carbon atoms, an unsubstituted alkoxy group having 1 to 20 carbon atoms, an ethylenically unsaturated an alkoxy group having 1 to 20 carbon atoms having a saturated group as a substituent, an alkyl group having 1 to 20 carbon atoms having no substituents in which the methylene group in the group is substituted with -O-CO-, or It is more preferably an unsubstituted alkoxy group having 1 to 20 carbon atoms in which the methylene group in the group is substituted with —O—CO—, particularly an unsubstituted 1 carbon atom group. -10 alkyl groups, unsubstituted alkoxy groups with 1 to 10 carbon atoms, alkoxy groups with 1 to 10 carbon atoms with ethylenically unsaturated groups as substituents, and methylene groups in the groups are - an unsubstituted alkyl group having 1 to 10 carbon atoms substituted with O-CO-, or an unsubstituted carbon atom in which a methylene group in the group is substituted with -O-CO- An alkoxy group of number 1 to 10 is preferred.
 前記一般式(A1)中のRは、置換基を有していない炭素原子数1~20のアルキル基であることが好ましく、置換基を有していない炭素原子数3~15のアルキル基であることがより好ましく、置換基を有していない炭素原子数5~12のアルキル基であることが好ましい。
 また前記Rは、置換基を有していない炭素原子数1~10のアルコキシ基であることも好ましい。
R 4 in the general formula (A1) is preferably an unsubstituted alkyl group having 1 to 20 carbon atoms, and an unsubstituted alkyl group having 3 to 15 carbon atoms. and preferably an unsubstituted alkyl group having 5 to 12 carbon atoms.
R 4 is also preferably an unsubstituted alkoxy group having 1 to 10 carbon atoms.
 前記一般式(A2)中のR及びRは、置換基を有していない炭素原子数1~10のアルコキシ基であることが好ましい。
 前記R及びRは、置換基を有していない炭素原子数1~10のアルキル基であることも好ましく、置換基を有していない炭素原子数1~5のアルキル基であることがより好ましい。
R 5 and R 6 in the general formula (A2) are preferably unsubstituted alkoxy groups having 1 to 10 carbon atoms.
R 5 and R 6 are also preferably unsubstituted alkyl groups having 1 to 10 carbon atoms, and are preferably unsubstituted alkyl groups having 1 to 5 carbon atoms. more preferred.
 前記一般式(A3)中のRは、置換基を有していない炭素原子数1~10のアルキル基であることが好ましい。
 前記Rは、置換基を有していない炭素原子数1~15のアルコキシ基であることも好ましく、置換基を有していない炭素原子数2~10のアルコキシ基であることがより好ましい。
R 7 in the general formula (A3) is preferably an unsubstituted alkyl group having 1 to 10 carbon atoms.
R 7 is preferably an unsubstituted alkoxy group having 1 to 15 carbon atoms, more preferably an unsubstituted alkoxy group having 2 to 10 carbon atoms.
 前記R、R、R、R、R及びRが上述の基であることで、本発明の組成物は、耐久性を有する硬化物の製造が容易なものとなる。 When R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are the groups described above, the composition of the present invention facilitates production of a durable cured product.
 前記Rの結合位置は、結合し得るいずれの位置であってもよいが、-O-Rの結合位置に対して、オルト位又はパラ位であることが好ましい。
 前記Rの結合位置は、結合し得るいずれの位置であってもよいが、-O-Rの結合位置に対して、メタ位であることが好ましい。
 前記Rの結合位置は、結合し得るいずれの位置であってもよいが、-O-Rの結合位置に対して、メタ位であることが好ましい。
 前記Rの結合位置は、結合し得るいずれの位置であってもよいが、-O-Rの結合位置に対して、オルト位又はメタ位であることが好ましい。
The bonding position of R 4 may be any bondable position, but is preferably ortho or para to the bonding position of —OR 9 .
The bonding position of R 5 may be any bondable position, but is preferably the meta position with respect to the bonding position of —OR 9 .
The binding position of R 6 may be any binding position, but is preferably the meta position with respect to the binding position of --OR 9 .
The bonding position of R 7 may be any bondable position, but is preferably ortho or meta with respect to the bonding position of —OR 9 .
 前記一般式(A1)中のa1は、0~4の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られ、さらに合成が容易である観点から、0~3の整数であることが好ましく、0~2の整数であることがより好ましく、特に0~1であることが好ましい。
 前記一般式(A1)中のa2は、0~2の整数であるが、溶解性の観点から、1~2であることが好ましい。前記組成物は、耐久性及び良好な感度を有する硬化物の製造が容易なものとなるからである。
 前記一般式(A1)中のm1は、1~10の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られる観点から、1~5の整数であることが好ましく、特に1~2の整数であることが好ましい。
a1 in the general formula (A1) is an integer of 0 to 4, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 to 1.
a2 in the general formula (A1) is an integer of 0 to 2, preferably 1 to 2 from the viewpoint of solubility. This is because the composition facilitates production of a cured product having durability and good sensitivity.
m1 in the general formula (A1) is an integer of 1 to 10, but from the viewpoint of obtaining a curable composition having good sensitivity and easy production of a cured product having excellent durability, 1 An integer of up to 5 is preferred, and an integer of 1-2 is particularly preferred.
 前記一般式(A2)中のa3は、0~4の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られ、さらに合成が容易である観点から、0~3の整数であることが好ましく、0~2の整数であることがより好ましく、特に0~1であることが好ましい。
 前記一般式(A2)中のa4は、0~3の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られ、さらに合成が容易である観点から、0~2の整数であることが好ましく、特に1~2であることが好ましい。
 前記一般式(A2)中のm2は、1~10の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られる観点から、1~5の整数であることが好ましく、特に1~2の整数であることが好ましい。
a3 in the general formula (A2) is an integer of 0 to 4, and a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and particularly preferably 0 to 1.
a4 in the general formula (A2) is an integer of 0 to 3, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 2, particularly preferably 1 to 2.
m2 in the general formula (A2) is an integer of 1 to 10, but from the viewpoint of obtaining a curable composition having good sensitivity and easy production of a cured product having excellent durability, 1 An integer of up to 5 is preferred, and an integer of 1-2 is particularly preferred.
 前記一般式(A3)中のa5は、0~3の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られ、さらに合成が容易である観点から、0~2の整数であることが好ましく、特に1~2の整数であることが好ましい。
 前記一般式(A3)中のa6は、0~3-m3の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られ、さらに合成が容易である観点から、0又は2であることが好ましい。
 前記一般式(A3)中のm3は、1~3の整数であるが、良好な感度を有し、耐久性に優れた硬化物の製造が容易な硬化性組成物が得られるとの観点から、1又は3であることが好ましい。
a5 in the general formula (A3) is an integer of 0 to 3, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained, and further synthesis is possible. From the viewpoint of easiness, it is preferably an integer of 0 to 2, particularly preferably an integer of 1 to 2.
a6 in the general formula (A3) is an integer of 0 to 3-m3, but a curable composition having good sensitivity and easy production of a cured product having excellent durability is obtained; It is preferably 0 or 2 from the viewpoint of ease of synthesis.
m3 in the general formula (A3) is an integer of 1 to 3, from the viewpoint that a curable composition having good sensitivity and easy production of a cured product having excellent durability can be obtained. , 1 or 3.
 前記一般式(A1)中のXb1及び前記一般式(A2)中のXb2(X)で表される連結基は、前記一般式(A1)中のm1及び前記一般式(A2)中のm2(m)が2である場合、炭素原子数1~120の脂肪族炭化水素基であることが好ましく、炭素原子数1~10のアルキレン基又はジオール残基であることがより好ましく、炭素原子数1のメチレン基等の炭素原子数1~5のアルキレン基であることがさらに好ましく、特に炭素原子数1~3のアルキレン基であることが好ましい。耐久性に優れた硬化物の製造が容易な硬化性組成物が得られ、さらに合成が容易だからである。 The linking group represented by X b1 in the general formula (A1) and X b2 in the general formula (A2) (X) is m1 in the general formula (A1) and m1 in the general formula (A2) When m2(m) is 2, it is preferably an aliphatic hydrocarbon group having 1 to 120 carbon atoms, more preferably an alkylene group or diol residue having 1 to 10 carbon atoms. It is more preferably an alkylene group having 1 to 5 carbon atoms such as methylene group of number 1, and particularly preferably an alkylene group having 1 to 3 carbon atoms. This is because a curable composition that facilitates production of a cured product having excellent durability can be obtained, and synthesis is easy.
 前記Xで表される連結基は、(1)mが2のとき、下記一般式(101)若しくは(102)で表される置換基又は下記群1から選ばれる基であることも好ましい。また前記Xで表される連結基は、(2)mが3のとき、下記群2から選ばれる基であることが好ましく、(3)mが4のとき、下記群3から選ばれる基であることが好ましく、(4)mが5のとき、下記群4から選ばれる基であることが好ましく、(5)mが6のとき、下記群5から選ばれる基であることが好ましい。耐久性及び良好な感度を有する硬化物の製造が容易な硬化性組成物が得られ、さらに原料の入手や製造が容易だからである。 (1) When m is 2, the linking group represented by X is also preferably a substituent represented by the following general formula (101) or (102) or a group selected from Group 1 below. The linking group represented by X is preferably a group selected from the following group 2 when (2) m is 3, and (3) a group selected from the following group 3 when m is 4. (4) when m is 5, it is preferably a group selected from Group 4 below; and (5) when m is 6, it is preferably a group selected from Group 5 below. This is because a curable composition that can be easily produced into a cured product having durability and good sensitivity can be obtained, and raw materials can be easily obtained and produced.
Figure JPOXMLDOC01-appb-C000021
(式中、Y111及びY115は、それぞれ独立に、置換基を有していてもよい炭素原子数1~8の脂肪族炭化水素基を表し、
 Y112及びY114は、それぞれ独立に、-O-、-CO-、-CO-O-、-O-CO-、-NR13-、-CO-NR13-又は-NR13-CO-で表される基を表し、
 R13は、水素原子又は置換基を有している場合がある炭素原子数1~35の脂肪族炭化水素基を表し、
 Y113は、-CR1415-、-NR16-、置換基を有していてもよい2価の炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい炭素原子数6~35の芳香環含有炭化水素基又は下記一般式(103)で表される置換基を表し、
 R14及びR15は、それぞれ独立に、水素原子、炭素原子数1~8のアルキル基、炭素原子数6~20のアリール基又は炭素原子数7~20のアリールアルキル基を表し、
 R16は、水素原子、置換基を有していてもよい炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい炭素原子数6~35の芳香環含有炭化水素基又は置換基を有していてもよい炭素原子数2~35の複素環含有基を表し、
 Y111、Y115、R13、Y113及びR16で表される脂肪族炭化水素基、芳香環含有炭化水素基及び複素環含有基中のメチレン基の1つ又は2つ以上は、-COO-、-O-、-OCO-、-NHCO-、-NH-又は-CONH-に置換されていてもよく、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000021
(Wherein, Y 111 and Y 115 each independently represent an optionally substituted aliphatic hydrocarbon group having 1 to 8 carbon atoms,
Y 112 and Y 114 are each independently -O-, -CO-, -CO-O-, -O-CO-, -NR 13 -, -CO-NR 13 - or -NR 13 -CO- represents the group represented,
R 13 represents a hydrogen atom or an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent;
Y 113 is —CR 14 R 15 —, —NR 16 —, an optionally substituted divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms, optionally having a substituent represents an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms or a substituent represented by the following general formula (103),
R 14 and R 15 each independently represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group having 6 to 20 carbon atoms or an arylalkyl group having 7 to 20 carbon atoms;
R 16 is a hydrogen atom, an optionally substituted aliphatic hydrocarbon group having 1 to 35 carbon atoms, or an optionally substituted aromatic ring-containing hydrocarbon having 6 to 35 carbon atoms. represents a heterocyclic ring-containing group having 2 to 35 carbon atoms which may have a group or a substituent,
one or more of the methylene groups in the aliphatic hydrocarbon group, aromatic ring-containing hydrocarbon group and heterocyclic ring-containing group represented by Y 111 , Y 115 , R 13 , Y 113 and R 16 are —COO; -, -O-, -OCO-, -NHCO-, -NH- or -CONH- may be substituted,
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000022
(式中、Y119及びY120は、それぞれ独立に、置換基を有していてもよい炭素原子数1~8の脂肪族炭化水素基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000022
(Wherein, Y 119 and Y 120 each independently represent an optionally substituted aliphatic hydrocarbon group having 1 to 8 carbon atoms,
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000023
(式中、Y116及びY118は、それぞれ独立に、-NR17-又は炭素原子数1~8の脂肪族炭化水素基を表し、
 前記脂肪族炭化水素基中メチレン基は、酸素原子に置換されていてもよく、
 Y117は、直接結合、-O-、-S-、-SO-、-CR1819-又は上述の一般式(1-1)、(1-2)若しくは(1-3)で表されるいずれかの置換基を表し、
 R17は、水素原子又は置換基を有していてもよい炭素原子数1~35の脂肪族炭化水素基を表し、
 R18及びR19は、それぞれ独立に、水素原子又はハロゲン原子で置換されていてもよい炭素原子数1~8のアルキル基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000023
(wherein Y 116 and Y 118 each independently represent —NR 17 — or an aliphatic hydrocarbon group having 1 to 8 carbon atoms,
The methylene group in the aliphatic hydrocarbon group may be substituted with an oxygen atom,
Y 117 is a direct bond, —O—, —S—, —SO 2 —, —CR 18 R 19 — or represented by general formula (1-1), (1-2) or (1-3) above. represents any substituent that is
R 17 represents a hydrogen atom or an optionally substituted aliphatic hydrocarbon group having 1 to 35 carbon atoms,
R 18 and R 19 each independently represent a hydrogen atom or an optionally substituted halogen atom alkyl group having 1 to 8 carbon atoms,
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000024
(式中、R31は、水素原子、置換基を有していてもよい炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい炭素原子数6~35の芳香環含有炭化水素基又は置換基を有していてもよい炭素原子数2~35の複素環含有基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000024
(wherein R 31 is a hydrogen atom, an optionally substituted aliphatic hydrocarbon group having 1 to 35 carbon atoms, an optionally substituted aromatic group having 6 to 35 carbon atoms, represents a ring-containing hydrocarbon group or an optionally substituted heterocyclic ring-containing group having 2 to 35 carbon atoms,
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000025
(式中、R32は、前記一般式(1)におけるR57と同じ基であり、基中に二つ以上ある場合、同じである場合も異なる場合もあり、Z11は前記一般式(2)におけるZ~Zで表される基と同じ範囲の基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000025
(Wherein, R 32 is the same group as R 57 in the general formula (1), and when there are two or more in the group, they may be the same or different, and Z 11 is the ) represents a group in the same range as the group represented by Z 1 to Z 3 in
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000026
(式中、R32は、前記一般式(1)におけるR57と同じ基であり、基中に二つ以上ある場合、同じである場合も異なる場合もあり、Z11は前記一般式(2)におけるZ~Zで表される基と同じ範囲の基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000026
(Wherein, R 32 is the same group as R 57 in the general formula (1), and when there are two or more in the group, they may be the same or different, and Z 11 is the same as R 57 in the general formula (2 ) represents a group in the same range as the group represented by Z 1 to Z 3 in
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000027
(式中、Z10、Z11、Z12、Z13及びZ14は前記一般式(2)におけるZ~Zで表される基と同じ範囲の基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000027
(Wherein, Z 10 , Z 11 , Z 12 , Z 13 and Z 14 represent groups in the same range as the groups represented by Z 1 to Z 3 in the general formula (2),
* represents a binding site. )
Figure JPOXMLDOC01-appb-C000028
(前記式中、Z10、Z11、Z12、Z13、Z14及びZ15は前記一般式(2)におけるZ~Zで表される基と同じ範囲の基を表し、
 *は、結合箇所を表す。)
Figure JPOXMLDOC01-appb-C000028
(In the above formula, Z 10 , Z 11 , Z 12 , Z 13 , Z 14 and Z 15 represent groups in the same range as the groups represented by Z 1 to Z 3 in the general formula (2),
* represents a binding site. )
 なお、Y111、Y115、Y116、Y118、Y119及びY120で表される置換基を有していてもよい炭素原子数1~8の脂肪族炭化水素基としては、Y等で表される2価の置換基を有していてもよい炭素原子数1~35の脂肪族炭化水素基として例示した基のうち、所定の炭素原子数を満たすものが挙げられる。 As the optionally substituted aliphatic hydrocarbon group having 1 to 8 carbon atoms represented by Y 111 , Y 115 , Y 116 , Y 118 , Y 119 and Y 120 , Y 1 etc. Among the groups exemplified as the aliphatic hydrocarbon groups having 1 to 35 carbon atoms which may have a divalent substituent represented by , those satisfying a predetermined number of carbon atoms can be mentioned.
 前記式(101)において、Y111及びY115は、同一であっても、異なるものであってもよい。
 前記式(102)におけるY116及びY118も、前記式(103)におけるY119及びY120も、同様に、同一であっても、異なるものであってもよい。
In formula (101), Y 111 and Y 115 may be the same or different.
Similarly, Y 116 and Y 118 in the above formula (102) and Y 119 and Y 120 in the above formula (103) may be the same or different.
 Y113で表される置換基を有していてもよい2価の炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい2価の炭素原子数6~35の芳香環含有炭化水素基としては、Y等で表される置換基を有していてもよい2価の炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい2価の炭素原子数6~35の芳香環含有炭化水素基として例示した基が挙げられる。 an optionally substituted divalent C 1-35 aliphatic hydrocarbon group represented by Y 113 , an optionally substituted divalent C 6-35 As the aromatic ring-containing hydrocarbon group, a divalent aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent represented by Y 1 etc., optionally having a substituent The groups exemplified as the bivalent aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms can be mentioned.
 R13、R16、R17及びR31で表される置換基を有していてもよい炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい炭素原子数6~35の芳香環含有炭化水素基及び置換基を有していてもよい炭素原子数2~35の複素環含有基としては、R53及びR54等で表される置換基を有していてもよい炭素原子数1~35の脂肪族炭化水素基、置換基を有していてもよい炭素原子数6~35の芳香環含有炭化水素基及び置換基を有していてもよい炭素原子数2~35の複素環含有基として例示した基が挙げられる。 an optionally substituted aliphatic hydrocarbon group having 1 to 35 carbon atoms represented by R 13 , R 16 , R 17 and R 31 , and an optionally substituted carbon atom number of 6 -35 aromatic ring-containing hydrocarbon groups and optionally substituted heterocyclic ring-containing groups having 2 to 35 carbon atoms, having substituents represented by R 53 and R 54 etc. an aliphatic hydrocarbon group having 1 to 35 carbon atoms which may have a substituent, an aromatic ring-containing hydrocarbon group having 6 to 35 carbon atoms which may have a substituent and a number of carbon atoms which may have a substituent The groups exemplified as heterocyclic ring-containing groups of 2 to 35 can be mentioned.
 R14、R15、R18及びR19で表される炭素原子数1~8のアルキル基、炭素原子数6~20のアリール基及び炭素原子数7~20のアリールアルキル基としては、R等で表される炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基及び炭素原子数7~20のアリールアルキル基として例示した基のうち所定の炭素原子数を満たすものが挙げられる。 The alkyl group having 1 to 8 carbon atoms, the aryl group having 6 to 20 carbon atoms and the arylalkyl group having 7 to 20 carbon atoms represented by R 14 , R 15 , R 18 and R 19 are R 1 Among the groups exemplified as alkyl groups having 1 to 40 carbon atoms, aryl groups having 6 to 20 carbon atoms and arylalkyl groups having 7 to 20 carbon atoms represented by etc., those satisfying a predetermined number of carbon atoms mentioned.
 前記群2及び群3の各式中の複数のZ11、前記群4の各式中のZ10~Z14及び前記群5の各式中のZ10~Z15は、それぞれ同一でもよく、異なってもよい。 A plurality of Z 11 in each formula of Groups 2 and 3, Z 10 to Z 14 in each formula of Group 4, and Z 10 to Z 15 in each formula of Group 5 may be the same, can be different.
 前記Xで表される連結基のベンゼン環との結合位置としては、ベンゼン環内の結合し得るいずれの位置であってもよいが、-O-Rの結合位置に対して、オルト位又はメタ位であることが好ましい。本発明の組成物は、耐久性を有する硬化物の製造が容易なものとなるからである。 The bonding position of the linking group represented by X to the benzene ring may be any bondable position within the benzene ring . A meta position is preferred. This is because the composition of the present invention facilitates production of a durable cured product.
 前記一般式(A1)中のXb1は、m1=2のとき、2価の炭素原子数1~10の脂肪族炭化水素基であることが好ましく、2価の炭素原子数1~5の脂肪族炭化水素基であることがより好ましく、特に2価の炭素原子数1~2の脂肪族炭化水素基であることが好ましい。 X b1 in the general formula (A1) is preferably a divalent aliphatic hydrocarbon group having 1 to 10 carbon atoms when m1=2, and a divalent aliphatic hydrocarbon group having 1 to 5 carbon atoms A group hydrocarbon group is more preferred, and a divalent aliphatic hydrocarbon group having 1 to 2 carbon atoms is particularly preferred.
 前記化合物Aの具体例としては、下記で表される化合物のように、国際公開第2014/021023号に記載された化合物等が挙げられる。 Specific examples of the compound A include compounds described in International Publication No. 2014/021023, such as the compounds represented below.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 前記化合物Aは、保護基Rにより保護されていないフェノール性水酸基を含むものであってもよいが、前記化合物Aに含まれるフェノール性水酸基の数は2以下であることが好ましく、0であることが好ましい。前記化合物Aは、硬化阻害の発生を抑制できるものとなるからである。 The compound A may contain a phenolic hydroxyl group that is not protected by a protecting group R9 , but the number of phenolic hydroxyl groups contained in the compound A is preferably 2 or less, and is 0. is preferred. This is because the compound A can suppress the occurrence of curing inhibition.
 前記化合物Aの分子量は、化合物Aの用途等に応じて設定することができる。
 前記分子量は、250以上5000以下とすることができ、300以上2500以下とすることができ、350以上1500以下とすることができる。
 なお、前記分子量は、化合物Aがその構造として繰り返し構造を含む重合体である場合には、重量平均分子量(Mw)で表すことができる。
 重量平均分子量(Mw)は、ゲル・パーミエーション・クロマトグラフィー(GPC)により、標準ポリスチレン換算値として求めることができる。例えば、東ソー(株)製のHLC-8120GPCを用い、溶出溶剤を0.01モル/リットルの臭化リチウムを添加したN-メチルピロリドンとし、校正曲線用ポリスチレンスタンダードをMw377400、210500、96000、50400、20650、10850、5460、2930、1300、580(以上、Polymer Laboratories社製 Easi PS-2シリーズ)及びMw1090000(東ソー(株)製)とし、測定カラムをTSK-GEL ALPHA-M×2本(東ソー(株)製)として測定することができる。測定温度は40℃、流速は1.0mL/分とすることができる。
The molecular weight of the compound A can be set according to the use of the compound A and the like.
The molecular weight can be 250 or more and 5000 or less, can be 300 or more and 2500 or less, or can be 350 or more and 1500 or less.
In addition, when the compound A is a polymer containing a repeating structure as its structure, the molecular weight can be represented by a weight average molecular weight (Mw).
The weight average molecular weight (Mw) can be obtained as a standard polystyrene conversion value by gel permeation chromatography (GPC). For example, using HLC-8120GPC manufactured by Tosoh Corporation, N-methylpyrrolidone added with 0.01 mol/liter lithium bromide as the elution solvent, and polystyrene standards for the calibration curve Mw 377400, 210500, 96000, 50400, 20650, 10850, 5460, 2930, 1300, 580 (Easi PS-2 series manufactured by Polymer Laboratories) and Mw1090000 (manufactured by Tosoh Corporation), and the measurement column is TSK-GEL ALPHA-M × 2 (Tosoh ( Co., Ltd.) can be measured. The measurement temperature can be 40° C. and the flow rate can be 1.0 mL/min.
 前記化合物Aの製造方法としては、所望の構造の化合物が得られる方法であれば特に限定されないが、例えば、国際公開第2014/021023号に記載の方法と同様の方法が挙げられる。 The method for producing compound A is not particularly limited as long as it is a method for obtaining a compound having a desired structure, and examples thereof include the method described in International Publication No. 2014/021023.
2.化合物B
 本発明で用いる化合物Bは、ヒンダードアミン構造の数が3以下のヒンダードアミン化合物である。
 ヒンダードアミン化合物とは、4-位に2級アミン又は3級アミンを有する2,2,6,6-テトラアルキルピペリジル基を分子中に少なくとも1個有する化合物である。
2. Compound B
Compound B used in the present invention is a hindered amine compound having 3 or less hindered amine structures.
A hindered amine compound is a compound having at least one 2,2,6,6-tetraalkylpiperidyl group having a secondary amine or tertiary amine at the 4-position in the molecule.
 前記化合物Bとしては、下記一般式(B1)又は(B2)で表される化合物が好ましい。本発明の組成物が、感度が良好で、耐久性に優れた硬化物が得られるものとなるからである。 The compound B is preferably a compound represented by the following general formula (B1) or (B2). This is because the composition of the present invention provides a cured product having good sensitivity and excellent durability.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 前記一般式(B1)中、R95は、水素原子、炭素原子数1~30のアルキル基又は炭素原子数1~30のアルコキシ基を表し、
 R96は、1~3価の有機カルボン酸のカルボキシ基から水素原子を除いた残基又はカーボネート基を表し、
 n1は、1~3の整数を表す。
 ただし、R96がカーボネート基の場合、n1は2である。
In the general formula (B1), R 95 represents a hydrogen atom, an alkyl group having 1 to 30 carbon atoms or an alkoxy group having 1 to 30 carbon atoms,
R 96 represents a residue or a carbonate group obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid,
n1 represents an integer of 1-3.
However, n1 is 2 when R96 is a carbonate group.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 前記一般式(B2)中、R97は水素原子又は炭素原子数1~30のアルキル基を表し、R98はアルケニルカルボニル基を表す。 In general formula (B2), R 97 represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms, and R 98 represents an alkenylcarbonyl group.
 前記R95及びR97で表される炭素原子数1~30のアルキル基としては、前記一般式(A1)~(A3)中のR等で表される炭素原子数1~40のアルキル基として例示した基のうち、所定の炭素原子数を満たすものが挙げられる。 As the alkyl group having 1 to 30 carbon atoms represented by R 95 and R 97 , the alkyl group having 1 to 40 carbon atoms represented by R 1 etc. in the general formulas (A1) to (A3) Among the groups exemplified as , those having a predetermined number of carbon atoms can be mentioned.
 前記R95で表される炭素原子数1~30のアルコキシ基としては、前記炭素原子数1~30のアルキル基の末端に酸素原子が結合した基が挙げられる。 Examples of the alkoxy group having 1 to 30 carbon atoms represented by R 95 include groups in which an oxygen atom is bonded to the terminal of the alkyl group having 1 to 30 carbon atoms.
 R96で表される「1~3価の有機カルボン酸のカルボキシ基から水素原子を除いた残基」における「1~3価の有機カルボン酸」としては、炭素原子数2~20である1~3価の有機カルボン酸が挙げられる。具体的には、1価の有機カルボン酸としては、酢酸、プロピオン酸、アクリル酸、酪酸、イソ酪酸、メタクリル酸、吉草酸、カプロン酸、カプリル酸、ネオデカン酸、2-エチルヘキシル酸、ペラルゴン酸、ウンデカン酸、ラウリン酸、トリデカン酸、ミリスチン酸、パルミチン酸、イソステアリン酸、ステアリン酸、12-ヒドロキシステアリン酸、オレイン酸、エライジン酸、リノール酸、リノレン酸、ニトリロトリ酢酸、チオグリコール酸、オクチルメチルカプトプロピオン酸、安息香酸、トルイル酸、第三ブチル安息香酸、サリチル酸、3,5-ジ第三ブチル-ヒドロキシフェニル安息香酸及び3,5-ジ第三ブチル-4-ヒドロキシフェニルプロピオン酸等が挙げられる。2価の有機カルボン酸としては、マロン酸、コハク酸、グルタル酸、アジピン酸、アゼライン酸、セバシン酸、デカンジカルボン酸、ドデカンジカルボン酸、チオジプロピオン酸、フタル酸、イソフタル酸及びテレフタル酸等が挙げられる。3価の有機カルボン酸としては、トリカルバリル酸、ブタントリカルボン酸、ブテントリカルボン酸及び1,3,5-ペンタントリカルボン酸等が挙げられる。 The "mono- to trivalent organic carboxylic acid" in the "residue obtained by removing a hydrogen atom from the carboxy group of a mono- to trivalent organic carboxylic acid" represented by R 96 is 1 having 2 to 20 carbon atoms. to trivalent organic carboxylic acids. Specifically, monovalent organic carboxylic acids include acetic acid, propionic acid, acrylic acid, butyric acid, isobutyric acid, methacrylic acid, valeric acid, caproic acid, caprylic acid, neodecanoic acid, 2-ethylhexyl acid, pelargonic acid, Undecanoic acid, lauric acid, tridecanoic acid, myristic acid, palmitic acid, isostearic acid, stearic acid, 12-hydroxystearic acid, oleic acid, elaidic acid, linoleic acid, linolenic acid, nitrilotriacetic acid, thioglycolic acid, octylmethylcaptopropionate acid, benzoic acid, toluic acid, tert-butylbenzoic acid, salicylic acid, 3,5-di-tert-butyl-hydroxyphenylbenzoic acid and 3,5-di-tert-butyl-4-hydroxyphenylpropionic acid. Divalent organic carboxylic acids include malonic acid, succinic acid, glutaric acid, adipic acid, azelaic acid, sebacic acid, decanedicarboxylic acid, dodecanedicarboxylic acid, thiodipropionic acid, phthalic acid, isophthalic acid and terephthalic acid. mentioned. Trivalent organic carboxylic acids include tricarballylic acid, butanetricarboxylic acid, butenetricarboxylic acid and 1,3,5-pentanetricarboxylic acid.
 前記一般式(B1)中のR95は、水素原子、炭素原子数1~12のアルキル基又は炭素原子数1~12のアルコキシ基であることが好ましい。前記組成物が、感度が良好で、耐久性に優れた硬化物が得られるものとなるからである。
 前記R96が1~3価の有機カルボン酸のカルボキシ基から水素原子を除いた残基の場合、前記R95は、炭素原子数1~6のアルキル基であることが好ましく、炭素原子数1~3のアルキル基であることがより好ましく、炭素原子数1~2のアルキル基であることが一層好ましく、メチル基又はエチル基であることがより一層好ましく、メチル基であることが最も好ましい。前記組成物が、感度が良好で、耐久性に優れた硬化物が得られるものとなるからである。
 前記R96がカーボネート基の場合、前記R95は、炭素原子数5~12のアルコキシ基であることが好ましく、炭素原子数10~12のアルコキシ基であることがより好ましく、デシルオキシ、ウンデシルオキシ又はドデシルオキシであることが一層好ましく、ウンデシルオキシであることが最も好ましい。
R 95 in the general formula (B1) is preferably a hydrogen atom, an alkyl group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms. This is because the composition provides a cured product having good sensitivity and excellent durability.
When R 96 is a residue obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid, R 95 is preferably an alkyl group having 1 to 6 carbon atoms, and 1 carbon atom. An alkyl group having 1 to 3 carbon atoms is more preferable, an alkyl group having 1 to 2 carbon atoms is more preferable, a methyl group or an ethyl group is still more preferable, and a methyl group is most preferable. This is because the composition provides a cured product having good sensitivity and excellent durability.
When R 96 is a carbonate group, R 95 is preferably an alkoxy group having 5 to 12 carbon atoms, more preferably an alkoxy group having 10 to 12 carbon atoms, such as decyloxy, undecyloxy or dodecyloxy, most preferably undecyloxy.
 前記一般式(B1)中のR96は、コスト、製造容易性及び耐光性改善効果の観点から、アジピン酸、アゼライン酸若しくはセバシン酸のカルボキシ基から水素原子を除いた残基又はカーボネート基であることが好ましく、セバシン酸のカルボキシ基から水素原子を除いた残基又はカーボネート基であることがより好ましい。 R 96 in the general formula (B1) is a residue obtained by removing a hydrogen atom from the carboxy group of adipic acid, azelaic acid, or sebacic acid, or a carbonate group, from the viewpoint of cost, ease of production, and effect of improving light resistance. More preferably, it is a residue obtained by removing a hydrogen atom from the carboxy group of sebacic acid, or a carbonate group.
 前記一般式(B1)中のn1は、感度が良好で、耐久性に優れた硬化物を製造できる組成物となる観点から、1~3であることが好ましく、1~2であることがより好ましく、2であることが最も好ましい。なお、前記R96がカーボネート基の場合、n1は2である。 n1 in the general formula (B1) is preferably 1 to 3, more preferably 1 to 2, from the viewpoint of a composition capable of producing a cured product having good sensitivity and excellent durability. Preferably, two is most preferred. n1 is 2 when R 96 is a carbonate group.
 前記一般式(B1)で表される化合物の具体例としては、以下の化合物が挙げられる。 Specific examples of the compound represented by the general formula (B1) include the following compounds.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 前記一般式(B2)中のR97は、水素原子、又は炭素原子数1~12のアルキル基であることが好ましい。前記組成物が、前記組成物が、感度が良好で、耐久性に優れた硬化物が得られるものとなるからである。 R 97 in the general formula (B2) is preferably a hydrogen atom or an alkyl group having 1 to 12 carbon atoms. This is because the composition provides a cured product having good sensitivity and excellent durability.
 前記一般式(B2)中のR98で表されるアルケニルカルボニル基としては、アクリロイル、メタクリロイル、3-ブテンカルボニル、2-メチル-3-ブテンカルボニル等が挙げられる。前記R98は、コスト、製造容易性及び耐光性改善効果の面から、アクリロイル又はメタクリロイルであることが好ましく、メタクリロイルであることがより好ましい。 The alkenylcarbonyl group represented by R 98 in the general formula (B2) includes acryloyl, methacryloyl, 3-butenecarbonyl, 2-methyl-3-butenecarbonyl and the like. R 98 is preferably acryloyl or methacryloyl, more preferably methacryloyl, from the viewpoints of cost, ease of production, and effect of improving light resistance.
 前記一般式(B2)で表される化合物の具体例としては、以下の化合物が挙げられる。 Specific examples of the compound represented by the general formula (B2) include the following compounds.
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 前記一般式(B1)又は(B2)で表される化合物の合成方法は特に制限されず、通常の有機合成における手法により合成可能である。また、精製方法としては、蒸留、再結晶、再沈、ろ過剤・吸着剤を用いる方法等を適宜使用することができる。更に、通常市販される安価に入手可能なものは混合物であることが多く、単独で用いても混合物で用いてもよく、製造方法、組成、融点、酸価等によらず利用できる。 The method for synthesizing the compound represented by the general formula (B1) or (B2) is not particularly limited, and it can be synthesized by a method in ordinary organic synthesis. In addition, as a purification method, distillation, recrystallization, reprecipitation, a method using a filtering agent/adsorbent, or the like can be appropriately used. Furthermore, most of the commercially available products at low cost are mixtures, which may be used singly or as a mixture, and can be used regardless of the production method, composition, melting point, acid value, and the like.
 前記一般式(B1)又は(B2)で表される化合物としては、市販品を用いることもでき、アデカスタブ LA-72、LA-77Y、LA―81、LA-82、LA-87及びLA-40MP(ADEKA社製)等が挙げられる。 As the compounds represented by the general formula (B1) or (B2), commercially available products can also be used, such as Adekastab LA-72, LA-77Y, LA-81, LA-82, LA-87 and LA-40MP (manufactured by ADEKA) and the like.
3.組成物
(I)化合物Aと化合物Bの含有量
 本発明の組成物は、前記化合物Aと前記化合物Bとを含むものである。
 前記化合物Aの含有量としては、前記組成物が、感度に優れ、所望の耐久性を有する硬化物を製造可能なものであればよく、前記組成物の固形分100質量部中に0.01質量部以上25質量部以下とすることができ、0.05質量部以上20質量部以下であることが好ましく、0.1質量部以上15質量部以下であることがより好ましく、特に0.5質量部以上10質量部以下であることが好ましい。化合物Aをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。また、上述の含有量であることで、前記化合物Aを組成物中に安定に分散可能だからである。
 なお、固形分とは、溶剤以外のすべての成分の合計を意味する。また、本発明において、特に断りがない場合には、含有量は質量基準である。
3. Composition (I) Contents of Compound A and Compound B The composition of the present invention contains the compound A and the compound B described above.
As the content of the compound A, the composition is excellent in sensitivity, as long as it is possible to produce a cured product having the desired durability, 0.01 per 100 parts by mass of the solid content of the composition It can be from 0.05 parts by mass to 20 parts by mass, more preferably from 0.1 parts by mass to 15 parts by mass, and particularly 0.5 parts by mass. It is preferably at least 10 parts by mass. This is because the composition containing the compound A in such an amount can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product. Moreover, it is because the said compound A can be stably disperse|distributed in a composition with the above-mentioned content.
In addition, solid content means the sum total of all the components other than a solvent. Moreover, in the present invention, the content is based on mass unless otherwise specified.
 紫外線吸収剤は通常、用いられる部材の膜厚が薄いほど、その含有量の増加が求められる。したがって、前記組成物の硬化物を薄膜部材に用いた場合でも、十分な紫外線吸収能を発揮できるものとする観点からは、前記化合物Aの含有量の下限は、前記組成物の固形分100質量部中に0.6質量部以上であることが好ましく、0.8質量部以上であることがより好ましく、特に2質量部以上であることが好ましい。含有量の下限をこのようにすることで、薄膜部材である場合でも十分な紫外線吸収能を付与できるからである。 Generally, the thinner the film thickness of the member used, the higher the content of the ultraviolet absorber is required. Therefore, even when the cured product of the composition is used for a thin film member, the lower limit of the content of the compound A is 100 mass of the solid content of the composition, from the viewpoint of exhibiting sufficient ultraviolet absorption ability. It is preferably 0.6 parts by mass or more, more preferably 0.8 parts by mass or more, and particularly preferably 2 parts by mass or more. This is because by setting the lower limit of the content in this way, it is possible to provide a sufficient ultraviolet absorbing ability even in the case of a thin film member.
 前記化合物Aの含有量としては、溶剤等の含有量によって異なるものであるが、前記組成物100質量部中に0.001質量部以上20質量部以下とすることができる。上述の含有量であることで、前記化合物Aを組成物中に安定に分散可能だからである。また、化合物Aをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。 The content of the compound A varies depending on the content of the solvent and the like, but it can be 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. This is because the above content allows the compound A to be stably dispersed in the composition. In addition, the composition containing the compound A in such an amount makes it possible to produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of the cured product.
 前記化合物Aの含有量は、前記組成物が、感度に優れ、所望の耐久性を有する硬化物を製造可能なものであればよく、前記化合物A及び前記化合物Bの合計100質量部中に1質量部以上99質量部以下とすることができ、15質量部以上85質量部以下であることが好ましく、特に40質量部以上90質量部以下であることが好ましい。化合物Aをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。 The content of the compound A is sufficient as long as the composition is excellent in sensitivity and capable of producing a cured product having the desired durability. It can be from 15 parts by mass to 85 parts by mass, and more preferably from 40 parts by mass to 90 parts by mass. This is because the composition containing the compound A in such an amount can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
 前記化合物Bの含有量としては、前記組成物が、感度に優れ、所望の耐久性を有する硬化物を製造可能なものであればよく、前記組成物の固形分100質量部中に0.001質量部以上20質量部以下とすることができ、0.005質量部以上10質量部以下であることが好ましく、0.1質量部以上8質量部以下であることがより好ましく、特に0.5質量部以上6質量部以下であることが好ましい。化合物Bをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。 The content of the compound B is not particularly limited as long as the composition can produce a cured product having excellent sensitivity and desired durability. It can be from 0.005 parts by mass to 10 parts by mass, more preferably from 0.1 parts by mass to 8 parts by mass, and particularly 0.5 parts by mass. It is preferably at least 6 parts by mass and no more than 6 parts by mass. This is because the composition containing the compound B in such an amount can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
 前記化合物Bの含有量としては、溶剤等の含有量によって異なるものであるが、前記組成物100質量部中に0.001質量部以上20質量部以下とすることができる。上述の含有量であることで、前記化合物Bを組成物中に安定に分散可能だからである。また、化合物Bをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。 The content of the compound B varies depending on the content of the solvent and the like, but it can be 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. This is because the above content allows the compound B to be stably dispersed in the composition. In addition, the composition containing compound B in such an amount can produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of the cured product.
 前記化合物A及び前記化合物Bの合計の含有量は、前記組成物が、感度に優れ、所望の耐久性を有する硬化物を製造可能なものであればよく、組成物の固形分100質量部に対して0.01質量部以上25質量部以下とすることができ、0.05量部以上20質量部以下であることが好ましく、0.1質量部以上15質量部以下であることがより好ましく、特に1質量部以上10質量部以下であることが好ましい。化合物A及び化合物Bをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。 The total content of the compound A and the compound B is sufficient as long as the composition is excellent in sensitivity and can produce a cured product having the desired durability. On the other hand, it can be 0.01 to 25 parts by mass, preferably 0.05 to 20 parts by mass, and more preferably 0.1 to 15 parts by mass. In particular, it is preferably 1 part by mass or more and 10 parts by mass or less. This is because the composition containing the compound A and the compound B in such amounts can produce a cured product having excellent durability, and has good sensitivity to facilitate production of the cured product.
 前記組成物の硬化物を薄膜部材に用いた場合でも、化合物Aが十分な紫外線吸収能を発揮できるものとする観点からは、前記化合物A及び化合物Bの含有量の下限は、前記組成物の固形分100質量部中に1.5質量部以上であることが好ましく、1.8質量部以上であることがより好ましく、特に3質量部以上であることが好ましい。含有量の下限をこのようにすることで、薄膜部材である場合にも化合物Aが十分な紫外線吸収能を付与できるからである。 Even when the cured product of the composition is used for a thin film member, the lower limit of the content of the compound A and the compound B is the lower limit of the content of the composition from the viewpoint that the compound A can exhibit sufficient ultraviolet absorption ability. It is preferably 1.5 parts by mass or more, more preferably 1.8 parts by mass or more, and particularly preferably 3 parts by mass or more based on 100 parts by mass of the solid content. By setting the lower limit of the content in this manner, the compound A can impart sufficient ultraviolet absorption ability even in the case of a thin film member.
 前記化合物A及び前記化合物Bの合計の含有量は、溶剤等の含有量によって異なるものであるが、前記組成物100質量部中に0.001質量部以上20質量部以下とすることができる。上述の含有量であることで、前記化合物A及び前記化合物Bを組成物中に安定に分散可能だからである。また化合物A及び化合物Bをこのような量で含有する前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。 The total content of the compound A and the compound B varies depending on the content of the solvent, etc., but can be 0.001 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition. This is because the compound A and the compound B can be stably dispersed in the composition when the content is as described above. Moreover, the composition containing the compound A and the compound B in such amounts can produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of the cured product.
(II)樹脂成分
 本発明の組成物は、樹脂成分を含むことができる。
 前記樹脂成分としては、前記化合物A及び前記化合物Bを保持できるものとすることができ、前記組成物の用途等に応じて適宜設定されるものであるが、重合性基を有する重合性化合物、重合性基を有しない重合体等が挙げられる。本発明においては、重合性化合物を含むことが好ましい。前記組成物は、硬化物の製造が容易であるとの効果をより効果的に発揮できるからである。具体的には、照射された光の吸収が少ない化合物Aを含むことで、前記組成物が硬化物の製造が容易なものとなるとの効果をより効果的に発揮できるからである。また、前記樹脂成分として重合性化合物を含むことにより、前記組成物は、光硬化性組成物及び熱硬化性組成物等として用いることができるからである。
(II) Resin Component The composition of the present invention may contain a resin component.
The resin component can be one that can hold the compound A and the compound B, and is appropriately set according to the use of the composition, etc., but a polymerizable compound having a polymerizable group, Examples thereof include polymers having no polymerizable group. In the present invention, it is preferred that a polymerizable compound is included. This is because the composition can more effectively exhibit the effect of facilitating the production of a cured product. Specifically, by containing the compound A which absorbs little irradiated light, the composition can more effectively exhibit the effect of facilitating the production of a cured product. Moreover, it is because the said composition can be used as a photocurable composition, a thermosetting composition, etc. by including a polymerizable compound as said resin component.
(1)重合性化合物
 前記重合性化合物は、重合体を形成可能なものであればよく、通常、重合性基を有する化合物である。このような重合性化合物は、重合性基の種類、すなわち、重合反応の種類により分類でき、ラジカル重合性化合物、カチオン重合性化合物及びアニオン重合性化合物等が挙げられる。
 本発明の組成物は、ラジカル重合性化合物を含むことが好ましい。前記組成物は、硬化物の製造が容易であるとの効果をより効果的に発揮できるからである。具体的には、前記組成物は、ラジカルの補足作用が抑制された化合物Bを含むことで、硬化物の製造が容易であるとの効果をより効果的に発揮できるからである。
(1) Polymerizable compound The polymerizable compound should be capable of forming a polymer, and is usually a compound having a polymerizable group. Such polymerizable compounds can be classified according to the type of polymerizable group, that is, the type of polymerization reaction, and include radically polymerizable compounds, cationically polymerizable compounds and anionically polymerizable compounds.
The composition of the invention preferably contains a radically polymerizable compound. This is because the composition can more effectively exhibit the effect of facilitating the production of a cured product. Specifically, since the composition contains the compound B in which the scavenging action of radicals is suppressed, the effect of facilitating the production of a cured product can be more effectively exhibited.
(a)ラジカル重合性化合物
 前記ラジカル重合性化合物は、ラジカル重合可能な重合性基を1以上有するものであればよく、2以上有するものであってもよい。
 ラジカル重合可能な重合性基としては、(メタ)アクリロイル基、ビニル基等のエチレン性不飽和結合含有基が挙げられる。なお、(メタ)アクリロイルは、アクリロイル及びメタクリロイルを含む意味で用い、(メタ)アクリレートは、アクリレート及びメタクリレートを含む意味で用いる。
 前記ラジカル重合性化合物は、通常、ラジカル重合開始剤と共に用いられる。
(a) Radically polymerizable compound The radically polymerizable compound may have one or more radically polymerizable polymerizable groups, and may have two or more radically polymerizable groups.
Examples of the radically polymerizable polymerizable group include ethylenically unsaturated bond-containing groups such as (meth)acryloyl groups and vinyl groups. (Meth)acryloyl is used to include acryloyl and methacryloyl, and (meth)acrylate is used to include acrylate and methacrylate.
The radical polymerizable compound is usually used together with a radical polymerization initiator.
 前記ラジカル重合性化合物は、酸価を有する化合物であってもよく、酸価を有しない化合物であってもよい。酸価を有する化合物としては、カルボキシル基を有する化合物等が挙げられる。
 前記組成物は、ラジカル重合性化合物として酸価を有する化合物を含むことにより、光照射部位のアルカリ現像液への溶解性が低下する。このため、前記組成物は、アルカリ現像液等の溶媒への溶解性が光照射前後で変化する感光性組成物として用いることができる。より具体的には、前記組成物は、酸価を有する化合物を含むことで、ネガ型感光性組成物として用いることができる。
 アルカリ現像液としては、テトラメチルアンモニウムヒドロキシド(TMAH)水溶液や、水酸化カリウム水溶液等のアルカリ現像液として一般的に使用されているものを用いることができる。
The radically polymerizable compound may be a compound having an acid value or a compound having no acid value. Compounds having an acid value include compounds having a carboxyl group.
Since the composition contains a compound having an acid value as the radically polymerizable compound, the solubility of the light-irradiated portion in an alkaline developer decreases. Therefore, the composition can be used as a photosensitive composition whose solubility in a solvent such as an alkaline developer changes before and after light irradiation. More specifically, the composition can be used as a negative photosensitive composition by containing a compound having an acid value.
As the alkaline developer, those commonly used as alkaline developers such as tetramethylammonium hydroxide (TMAH) aqueous solution and potassium hydroxide aqueous solution can be used.
 前記ラジカル重合性化合物のうち、エチレン性不飽和結合を有し、酸価を有する化合物としては、(メタ)アクリル酸、α-クロルアクリル酸、イタコン酸、マレイン酸、シトラコン酸、フマル酸、ハイミック酸、クロトン酸、イソクロトン酸、ビニル酢酸、アリル酢酸、桂皮酸、ソルビン酸、メサコン酸、コハク酸モノ[2-(メタ)アクリロイロキシエチル]、フタル酸モノ[2-(メタ)アクリロイロキシエチル]、ω-カルボキシポリカプロラクトンモノ(メタ)アクリレート等の両末端にカルボキシ基と水酸基とを有するポリマーのモノ(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート・マレート、ヒドロキシプロピル(メタ)アクリレート・マレート、ジシクロペンタジエン・マレート或いは1個のカルボキシル基と2個以上の(メタ)アクリロイル基とを有する多官能(メタ)アクリレート等の不飽和多塩基酸;フェノール及び/又はクレゾールノボラックエポキシ樹脂、ビフェニル骨格、ナフタレン骨格を有するノボラックエポキシ樹脂、ビスフェノールAノボラック型エポキシ化合物、ジシクロペンタジエンノボラック型エポキシ化合物等のノボラック型エポキシ化合物、多官能エポキシ基を有するポリフェニルメタン型エポキシ樹脂、下記一般式(III)で表されるエポキシ化合物等のエポキシ樹脂のエポキシ基に不飽和一塩基酸を作用させた樹脂、下記一般式(III)で表されるエポキシ化合物等のエポキシ樹脂のエポキシ基に不飽和一塩基酸を作用させ、更に多塩基酸無水物を作用させて得られた樹脂、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールペンタアクリレート等の水酸基含有多官能アクリレートと無水コハク酸、無水フタル酸、テトラヒドロ無水フタル酸等の二塩基酸無水物の反応物である酸価を有する多官能アクリレート等が挙げられる。 Among the radically polymerizable compounds, compounds having an ethylenically unsaturated bond and an acid value include (meth)acrylic acid, α-chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, fumaric acid, hymic Acid, crotonic acid, isocrotonic acid, vinylacetic acid, allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, mono[2-(meth)acryloyloxyethyl] succinate, mono[2-(meth)acryloyloxy phthalate ethyl], ω-carboxypolycaprolactone mono(meth)acrylate, polymer mono(meth)acrylate, hydroxyethyl(meth)acrylate/malate, hydroxypropyl(meth)acrylate/malate having carboxy group and hydroxyl group at both ends such as mono(meth)acrylate , dicyclopentadiene maleate or unsaturated polybasic acid such as polyfunctional (meth)acrylate having one carboxyl group and two or more (meth)acryloyl groups; phenol and/or cresol novolac epoxy resin, biphenyl skeleton , a novolak epoxy resin having a naphthalene skeleton, a bisphenol A novolak type epoxy compound, a novolac type epoxy compound such as a dicyclopentadiene novolak type epoxy compound, a polyphenylmethane type epoxy resin having a polyfunctional epoxy group, represented by the following general formula (III) A resin obtained by reacting an epoxy group of an epoxy resin such as an epoxy compound represented by an unsaturated monobasic acid with an unsaturated monobasic acid, and an unsaturated monobasic acid to an epoxy group of an epoxy resin such as an epoxy compound represented by the following general formula (III) Resin obtained by further acting with polybasic acid anhydride, hydroxyl group-containing polyfunctional acrylate such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate, and succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, etc. Examples include polyfunctional acrylates having an acid value that are reactants of dibasic acid anhydrides.
Figure JPOXMLDOC01-appb-C000034
(式中、X41は直接結合、炭素原子数1~4のアルキリデン基、炭素原子数3~20の脂環式炭化水素基、-O-、-S-、-SO-、-SS-、-SO-、-CO-、-OCO-又は前記一般式(1-1)~(1-3)で表される置換基を表し、
 R41、R42、R43及びR44は、それぞれ独立に、水素原子、炭素原子数1~5のアルキル基、炭素原子数1~8のアルコキシ基、炭素原子数2~5のアルケニル基又はハロゲン原子を表し、
 dは0~10の整数を表す。)
Figure JPOXMLDOC01-appb-C000034
(Wherein, X 41 is a direct bond, an alkylidene group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, —O—, —S—, —SO 2 —, —SS— , -SO-, -CO-, -OCO- or a substituent represented by the general formulas (1-1) to (1-3),
R 41 , R 42 , R 43 and R 44 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or represents a halogen atom,
d represents an integer of 0 to 10; )
 前記炭素原子数1~5のアルキル基としては、メチル、エチル、プロピル、iso-プロピル、ブチル、sec-ブチル、tert-ブチル、iso-ブチル、アミル、iso-アミル及びtert-アミル等が挙げられる。 Examples of the alkyl group having 1 to 5 carbon atoms include methyl, ethyl, propyl, iso-propyl, butyl, sec-butyl, tert-butyl, iso-butyl, amyl, iso-amyl and tert-amyl. .
 前記炭素原子数1~8のアルコキシ基としては、メチルオキシ、エチルオキシ、iso-プロピルオキシ、ブチルオキシ、sec-ブチルオキシ、tert-ブチルオキシ、iso-ブチルオキシ、アミルオキシ、iso-アミルオキシ、tert-アミルオキシ、ヘキシルオキシ、2-ヘキシルオキシ、3-ヘキシルオキシ、シクロヘキシルオキシ、4-メチルシクロヘキシルオキシ、ヘプチルオキシ、2-ヘプチルオキシ、3-ヘプチルオキシ、iso-ヘプチルオキシ、tert-ヘプチルオキシ、1-オクチルオキシ、iso-オクチルオキシ、tert-オクチルオキシ等が挙げられる。 Examples of the alkoxy group having 1 to 8 carbon atoms include methyloxy, ethyloxy, iso-propyloxy, butyloxy, sec-butyloxy, tert-butyloxy, iso-butyloxy, amyloxy, iso-amyloxy, tert-amyloxy, hexyloxy, 2-hexyloxy, 3-hexyloxy, cyclohexyloxy, 4-methylcyclohexyloxy, heptyloxy, 2-heptyloxy, 3-heptyloxy, iso-heptyloxy, tert-heptyloxy, 1-octyloxy, iso-octyl oxy, tert-octyloxy and the like.
 前記炭素原子数2~5のアルケニル基としては、ビニル、アリル、1-プロペニル、イソプロペニル、2-ブテニル、1,3-ブタジエニル及び2-ペンテニル等が挙げられる。 Examples of the alkenyl group having 2 to 5 carbon atoms include vinyl, allyl, 1-propenyl, isopropenyl, 2-butenyl, 1,3-butadienyl and 2-pentenyl.
 前記炭素原子数1~4のアルキリデン基としては、メチリデン、エチリデン、プロピリデン、ブチリデン等が挙げられる。 Examples of the alkylidene group having 1 to 4 carbon atoms include methylidene, ethylidene, propylidene and butylidene.
 前記脂環式炭化水素基としては、シクロプロピル、シクロペンチル、シクロヘキシル、シクロヘプチル等が挙げられる。
 なお、前記アルキル基、アルコキシ基、アルケニル基、アルキリデン基、脂環式炭化水素基等は、置換基を有していてもよい。
Examples of the alicyclic hydrocarbon group include cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl and the like.
The alkyl group, alkoxy group, alkenyl group, alkylidene group, alicyclic hydrocarbon group, etc. may have a substituent.
 前記酸価を有する化合物の含有量は、前記組成物の用途等に応じて適宜設定できるが、樹脂成分100質量部中に10質量部以上90質量部以下とすることができ、15質量部以上85質量部以下であることが好ましく、特に20質量部以上80質量部以下であることが好ましい。前記含有量が上述の範囲であることで、前記組成物は、感度に優れたネガ型感光性組成物として用いることができるからである。 The content of the compound having an acid value can be appropriately set according to the use of the composition, etc., and can be 10 parts by mass or more and 90 parts by mass or less in 100 parts by mass of the resin component, and can be 15 parts by mass or more. It is preferably 85 parts by mass or less, and particularly preferably 20 parts by mass or more and 80 parts by mass or less. This is because when the content is within the above range, the composition can be used as a negative photosensitive composition with excellent sensitivity.
 前記ラジカル重合性化合物のうち、エチレン性不飽和結合を有し、酸価を有しない化合物としては、(メタ)アクリル酸-2-ヒドロキシエチル、(メタ)アクリル酸-2-ヒドロキシプロピル、(メタ)アクリル酸グリシジル、下記化合物No.A1~No.A4、(メタ)アクリル酸メチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸-t-ブチル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸イソノニル、(メタ)アクリル酸ステアリル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸メトキシエチル、(メタ)アクリル酸ジメチルアミノメチル、(メタ)アクリル酸ジメチルアミノエチル、(メタ)アクリル酸アミノプロピル、(メタ)アクリル酸ジメチルアミノプロピル、(メタ)アクリル酸エトキシエチル、(メタ)アクリル酸ポリ(エトキシ)エチル、(メタ)アクリル酸ブトキシエトキシエチル、(メタ)アクリル酸エチルヘキシル、(メタ)アクリル酸フェノキシエチル、(メタ)アクリル酸テトラヒドロフリル、(メタ)アクリル酸ビニル、(メタ)アクリル酸アリル、(メタ)アクリル酸ベンジル、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリシクロデカンジメチロールジ(メタ)アクリレート、トリ[(メタ)アクリロイルエチル]イソシアヌレート、ポリエステル(メタ)アクリレートオリゴマー等の不飽和一塩基酸及び多価アルコール又は多価フェノールのエステル;(メタ)アクリル酸亜鉛、(メタ)アクリル酸マグネシウム等の不飽和多塩基酸の金属塩;マレイン酸無水物、イタコン酸無水物、シトラコン酸無水物、メチルテトラヒドロ無水フタル酸、テトラヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物、トリアルキルテトラヒドロ無水フタル酸-無水マレイン酸付加物、ドデセニル無水コハク酸、無水メチルハイミック酸等の不飽和多塩基酸の酸無水物;(メタ)アクリルアミド、メチレンビス-(メタ)アクリルアミド、ジエチレントリアミントリス(メタ)アクリルアミド、キシリレンビス(メタ)アクリルアミド、α-クロロアクリルアミド、N-2-ヒドロキシエチル(メタ)アクリルアミド等の不飽和一塩基酸及び多価アミンのアミド;アクロレイン等の不飽和アルデヒド;(メタ)アクリロニトリル、α-クロロアクリロニトリル、シアン化ビニリデン、シアン化アリル等の不飽和ニトリル;スチレン、4-メチルスチレン、4-エチルスチレン、4-メトキシスチレン、4-ヒドロキシスチレン、4-クロロスチレン、ジビニルベンゼン、ビニルトルエン、ビニル安息香酸、ビニルフェノール、ビニルスルホン酸、4-ビニルベンゼンスルホン酸、ビニルベンジルメチルエーテル、ビニルベンジルグリシジルエーテル等の不飽和芳香族化合物;メチルビニルケトン等の不飽和ケトン;ビニルアミン、アリルアミン、N-ビニルピロリドン、ビニルピペリジン等の不飽和アミン化合物;ビニルメチルエーテル、ビニルエチルエーテル、n-ブチルビニルエーテル、イソブチルビニルエーテル、アリルグリシジルエーテル等のビニルエーテル;マレイミド、N-フェニルマレイミド、N-シクロヘキシルマレイミド等の不飽和イミド類;インデン、1-メチルインデン等のインデン類;1,3-ブタジエン、イソプレン、クロロプレン等の脂肪族共役ジエン類;ポリスチレン、ポリメチル(メタ)アクリレート、ポリ-n-ブチル(メタ)アクリレート、ポリシロキサン等の重合体分子鎖の末端にモノ(メタ)アクリロイル基を有するマクロモノマー類;(メタ)アクリロニトリル、エチレン、プロピレン、ブチレン、塩化ビニル、酢酸ビニル等のその他のビニル化合物、及びポリメチルメタクリレートマクロモノマー、ポリスチレンマクロモノマー等のマクロモノマー類、トリシクロデカン骨格のモノメタクリレート、N-フェニルマレイミド、メタクリロイルオキシメチル-3-エチルオキセタン等と、(メタ)アクリル酸との共重合体及びこれらに昭和電工(株)社製カレンズMOI、AOIのような不飽和結合を有するイソシアネート化合物を反応させた(メタ)アクリル酸の共重合体や、ビニルクロリド、ビニリデンクロリド、ジビニルスクシナート、ジアリルフタラート、トリアリルホスファート、トリアリルイソシアヌラート、ビニルチオエーテル、ビニルイミダゾール、ビニルオキサゾリン、ビニルカルバゾール、ビニルピロリドン、ビニルピリジン、水酸基含有ビニルモノマー及びポリイソシアネート化合物のビニルウレタン化合物、水酸基含有ビニルモノマー及びポリエポキシ化合物のビニルエポキシ化合物、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールペンタアクリレート等の水酸基含有多官能アクリレートとトリレンジイソシアネート、ヘキサメチレンジイソシアネート等の多官能イソシアネートの反応物等が挙げられる。 Among the radically polymerizable compounds, compounds having an ethylenically unsaturated bond and not having an acid value include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, (meth) ) glycidyl acrylate, compound no. A1 to No. A4, methyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, n-octyl (meth) acrylate, ( isooctyl (meth)acrylate, isononyl (meth)acrylate, stearyl (meth)acrylate, lauryl (meth)acrylate, methoxyethyl (meth)acrylate, dimethylaminomethyl (meth)acrylate, dimethyl (meth)acrylate aminoethyl, aminopropyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, ethoxyethyl (meth)acrylate, poly(ethoxy)ethyl (meth)acrylate, butoxyethoxyethyl (meth)acrylate, (meth)acrylate ) ethylhexyl acrylate, phenoxyethyl (meth)acrylate, tetrahydrofuryl (meth)acrylate, vinyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, ethylene glycol di(meth)acrylate, Diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, trimethylolethane tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, pentaerythritol tetra(meth)acrylate, Unsaturated monobasic acids and polyhydric alcohols or polyhydric alcohols such as pentaerythritol tri(meth)acrylate, tricyclodecanedimethylol di(meth)acrylate, tri[(meth)acryloylethyl]isocyanurate, polyester (meth)acrylate oligomers Esters of phenol; metal salts of unsaturated polybasic acids such as zinc (meth)acrylate and magnesium (meth)acrylate; maleic anhydride, itaconic anhydride, citraconic anhydride, methyltetrahydrophthalic anhydride, tetrahydro Phthalic anhydride, trialkyltetrahydrophthalic anhydride, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-anhydride Acid anhydrides of unsaturated polybasic acids such as leic acid adducts, dodecenyl succinic anhydride, and methylhimic anhydride; (meth)acrylamide, methylenebis-(meth)acrylamide, diethylenetriamine tris(meth)acrylamide, xylylenebis(meth) Amides of unsaturated monobasic acids and polyvalent amines such as acrylamide, α-chloroacrylamide, N-2-hydroxyethyl (meth)acrylamide; unsaturated aldehydes such as acrolein; (meth)acrylonitrile, α-chloroacrylonitrile, cyanide Unsaturated nitriles such as vinylidene and allyl cyanide; styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyltoluene, vinylbenzoic acid, vinylphenol , vinylsulfonic acid, 4-vinylbenzenesulfonic acid, vinylbenzyl methyl ether, vinylbenzyl glycidyl ether and other unsaturated aromatic compounds; methyl vinyl ketone and other unsaturated ketones; vinylamine, allylamine, N-vinylpyrrolidone, vinylpiperidine, etc. vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether, isobutyl vinyl ether and allyl glycidyl ether; unsaturated imides such as maleimide, N-phenylmaleimide and N-cyclohexylmaleimide; indene, 1 -Indenes such as methylindene; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; Polymer molecules such as polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate and polysiloxane Macromonomers having a mono(meth)acryloyl group at the chain end; (meth)acrylonitrile, ethylene, propylene, butylene, vinyl chloride, other vinyl compounds such as vinyl acetate, polymethyl methacrylate macromonomer, polystyrene macromonomer, etc. macromonomers, monomethacrylate having a tricyclodecane skeleton, N-phenylmaleimide, methacryloyloxymethyl-3-ethyloxetane, etc., and a copolymer of (meth)acrylic acid, and Showa Denko K.K. (Meth)acrylic acid copolymers reacted with isocyanate compounds having unsaturated bonds such as MOI and AOI, vinyl chloride, vinylidene chloride, divinyl succinate, Diallyl phthalate, triallyl phosphate, triallyl isocyanurate, vinyl thioether, vinylimidazole, vinyloxazoline, vinylcarbazole, vinylpyrrolidone, vinylpyridine, hydroxyl group-containing vinyl monomers and vinyl urethane compounds of polyisocyanate compounds, hydroxyl group-containing vinyl monomers and reaction products of vinyl epoxy compounds of polyepoxy compounds, hydroxyl group-containing polyfunctional acrylates such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate, and polyfunctional isocyanates such as tolylene diisocyanate and hexamethylene diisocyanate.
 前記酸価を有しない化合物に含まれるラジカル重合可能な重合性基の数は、1以上であればよいが、2以上10以下であることが好ましく、3以上8以下であることが好ましい。 The number of radically polymerizable groups contained in the compound having no acid value may be 1 or more, preferably 2 or more and 10 or less, and preferably 3 or more and 8 or less.
 前記酸価を有しない化合物は、重合性基の数が異なる化合物の混合物であってもよい。前記組成物は、硬化速度及び硬化物の硬度の調整等が容易となるからである。前記酸価を有しない化合物は、例えば、重合性基の数が3の化合物及び重合性基の数が4の化合物の混合物、重合性基の数が5の化合物及び重合性基の数が6の化合物の混合物等とすることができる。 The compound having no acid value may be a mixture of compounds having different numbers of polymerizable groups. This is because the composition facilitates adjustment of the curing speed and the hardness of the cured product. The compound having no acid value is, for example, a mixture of a compound having 3 polymerizable groups and a compound having 4 polymerizable groups, a compound having 5 polymerizable groups and 6 polymerizable groups. can be a mixture of compounds of
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 前記酸価を有しない化合物の含有量としては、前記組成物の用途等に応じて適宜設定できるが、樹脂成分100質量部中に10質量部以上90質量部以下とすることができ、15質量部以上85質量部以下であることが好ましく、特に20質量部以上80質量部以下であることが好ましい。前記含有量が上述の範囲であることで、前記組成物は、感度に優れたネガ型組成物として用いることができるからである。 The content of the compound having no acid value can be appropriately set according to the use of the composition, etc., but it can be 10 parts by mass or more and 90 parts by mass or less in 100 parts by mass of the resin component, and 15 parts by mass. It is preferably from 20 parts by mass to 85 parts by mass, and particularly preferably from 20 parts by mass to 80 parts by mass. This is because when the content is within the above range, the composition can be used as a negative composition with excellent sensitivity.
 前記ラジカル重合性化合物は、単独で又は2種以上を混合して使用することができる。また、ラジカル重合性化合物は、エチレン性不飽和結合を有し、酸価を有する化合物及びエチレン性不飽和結合を有し、酸価を有しない化合物を組み合わせて使用することができる。ラジカル重合性化合物は、2種以上を混合して使用する場合には、それらを予め共重合して共重合体として使用してもよい。 The radically polymerizable compound can be used alone or in combination of two or more. Moreover, as the radically polymerizable compound, a compound having an ethylenically unsaturated bond and an acid value and a compound having an ethylenically unsaturated bond and having no acid value can be used in combination. When two or more radically polymerizable compounds are used in combination, they may be pre-copolymerized and used as a copolymer.
(b)カチオン重合性化合物及びアニオン重合性化合物
 前記カチオン重合性化合物は、カチオン重合可能な重合性基を1以上有する化合物であればよい。カチオン重合可能な重合性基としては、エポキシ基及びオキセタン基等の環状エーテル基並びにビニルエーテル基等が挙げられる。すなわち、カチオン重合性化合物としては、エポキシ化合物及びオキセタン化合物等の環状エーテル化合物並びにビニルエーテル化合物等が挙げられる。
 前記カチオン重合性化合物は、通常、カチオン重合開始剤と共に用いられる。
(b) Cationically Polymerizable Compound and Anionically Polymerizable Compound The cationically polymerizable compound may be a compound having one or more cationically polymerizable groups. Examples of the cationic polymerizable group include cyclic ether groups such as epoxy groups and oxetane groups, vinyl ether groups, and the like. That is, examples of cationic polymerizable compounds include cyclic ether compounds such as epoxy compounds and oxetane compounds, and vinyl ether compounds.
The cationic polymerizable compound is usually used together with a cationic polymerization initiator.
 前記エポキシ化合物としては、メチルグリシジルエーテル、2-エチルヘキシルグリシジルエーテル、ブチルグリシジルエーテル、デシルグリシジルエーテル、C12~C13混合アルキルグリシジルエーテル、フェニル-2-メチルグリシジルエーテル、セチルグリシジルエーテル、ステアリルグリシジルエーテル、p-sec-ブチルフェニルグリシジルエーテル、p-tert-ブチルフェニルグリシジルエーテル、グリシジルメタクリレート、イソプロピルグリシジルエーテル、アリルグリシジルエーテル、エチルグリシジルエーテル、2-メチルオクチルグリシジルエーテル、フェニルグリシジルエーテル、4-n-ブチルフェニルグリシジルエーテル、4-フェニルフェノールグリシジルエーテル、クレジルグリシジルエーテル、ジブロモクレジルグリシジルエーテル、デシルグリシジルエーテル、メトキシポリエチレングリコールモノグリシジルエーテル、エトキシポリエチレングリコールモノグリシジルエーテル、ブトキシポリエチレングリコールモノグリシジルエーテル、フェノキシポリエチレングリコールモノグリシジルエーテル、ジブロモフェニルグリシジルエーテル、1,4-ブタンジオールジグリシジルエーテル、1,5-ペンタンジオールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,1,2,2-テトラキス(グリシジルオキシフェニル)エタン及びペンタエリスリトールテトラグリシジルエーテル等のグリシジルエーテル化物;グリシジルアセテート、グリシジルステアレート等のグリシジルエステル類;2-(3,4-エポキシシクロヘキシル-5,5-スピロ-3,4-エポキシ)シクロヘキサン-メタジオキサン、メチレンビス(3,4-エポキシシクロヘキサン)、プロパン-2,2-ジイル-ビス(3,4-エポキシシクロヘキサン)、2,2-ビス(3,4-エポキシシクロヘキシル)プロパン、エチレンビス(3,4-エポキシシクロヘキサンカルボキシレート)、ビス(3,4-エポキシシクロヘキシルメチル)アジペート、3,4-エポキシシクロヘキシルメチル  3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-1-メチルシクロヘキシル  3,4-エポキシ-1-メチルヘキサンカルボキシレート、6-メチル-3,4-エポキシシクロヘキシルメチル  6-メチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-3-メチルシクロヘキシルメチル 3,4-エポキシ-3-メチルシクロヘキサンカルボキシレート、3,4-エポキシ-5-メチルシクロヘキシルメチル 3,4-エポキシ-5-メチルシクロヘキサンカルボキシレート、1-エポキシエチル-3,4-エポキシシクロヘキサン、1,2-エポキシ-2-エポキシエチルシクロヘキサン、ジシクロペンタジエンジエポキサイド、3,4-エポキシ-6-メチルシクロヘキシルカルボキシレート、α-ピネンオキシド、スチレンオキシド、シクロヘキセンオキサイド及びシクロペンテンオキサイド等のエポキシシクロアルキル型化合物及びN-グリシジルフタルイミド等が挙げられる。 The epoxy compounds include methyl glycidyl ether, 2-ethylhexyl glycidyl ether, butyl glycidyl ether, decyl glycidyl ether, C 12 -C 13 mixed alkyl glycidyl ether, phenyl-2-methyl glycidyl ether, cetyl glycidyl ether, stearyl glycidyl ether, p-sec-butylphenyl glycidyl ether, p-tert-butylphenyl glycidyl ether, glycidyl methacrylate, isopropyl glycidyl ether, allyl glycidyl ether, ethyl glycidyl ether, 2-methyloctyl glycidyl ether, phenyl glycidyl ether, 4-n-butylphenyl glycidyl ether, 4-phenylphenol glycidyl ether, cresyl glycidyl ether, dibromocresyl glycidyl ether, decyl glycidyl ether, methoxypolyethylene glycol monoglycidyl ether, ethoxypolyethylene glycol monoglycidyl ether, butoxypolyethylene glycol monoglycidyl ether, phenoxypolyethylene glycol monoglycidyl ether glycidyl ether, dibromophenyl glycidyl ether, 1,4-butanediol diglycidyl ether, 1,5-pentanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,1,2 , 2-tetrakis(glycidyloxyphenyl)ethane and pentaerythritol tetraglycidyl ether; glycidyl esters such as glycidyl acetate and glycidyl stearate; 2-(3,4-epoxycyclohexyl-5,5-spiro- 3,4-epoxy)cyclohexane-methodioxane, methylenebis(3,4-epoxycyclohexane), propane-2,2-diyl-bis(3,4-epoxycyclohexane), 2,2-bis(3,4-epoxy cyclohexyl)propane, ethylenebis(3,4-epoxycyclohexanecarboxylate), bis(3,4-epoxycyclohexylmethyl)adipate, 3,4-epoxycyclohexylmethyl 3,4-epoxycyclohexanecarboxylate, 3,4-epoxy -1-methylcyclohexyl 3,4-epoxy-1-methylhexanecarboxylate, 6-methyl-3,4-epoxycyclohexyl Methyl 6-methyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-3-methylcyclohexylmethyl 3,4-epoxy-3-methylcyclohexanecarboxylate, 3,4-epoxy-5-methylcyclohexylmethyl 3 ,4-epoxy-5-methylcyclohexanecarboxylate, 1-epoxyethyl-3,4-epoxycyclohexane, 1,2-epoxy-2-epoxyethylcyclohexane, dicyclopentadiene diepoxide, 3,4-epoxy-6- Epoxycycloalkyl compounds such as methylcyclohexyl carboxylate, α-pinene oxide, styrene oxide, cyclohexene oxide and cyclopentene oxide, and N-glycidyl phthalimide.
 また前記エポキシ化合物としては、エポキシ化ポリオレフィンを用いることもできる。エポキシ化ポリオレフィンとは、ポリオレフィンをエポキシ基含有単量体で変性して、エポキシ基を導入したポリオレフィンである。エチレン又は炭素数3~20のα-オレフィン、エポキシ基含有単量体、及び必要に応じて他のモノマーを、共重合法及びグラフト法のいずれかにより共重合させることによって製造することができる。エチレン又は炭素数3~20のα-オレフィン、エポキシ基含有単量体及び他のモノマーは、それぞれ単独で重合させてもよく、他の単量体と複数で重合させてもよい。また、末端に水酸基を有する非共役のポリブタジエンの二重結合を、過酢酸法によりエポキシ化して得ることもでき、分子内に水酸基を持つものを使用してもよい。また、水酸基をイソシアネートでウレタン化し、ここに1級水酸基含有エポキシ化合物を反応させてエポキシ基を導入することもできる。 Epoxidized polyolefin can also be used as the epoxy compound. An epoxidized polyolefin is a polyolefin obtained by modifying a polyolefin with an epoxy group-containing monomer to introduce an epoxy group. It can be produced by copolymerizing ethylene or an α-olefin having 3 to 20 carbon atoms, an epoxy group-containing monomer, and optionally other monomers by either a copolymerization method or a grafting method. Ethylene or α-olefins having 3 to 20 carbon atoms, epoxy group-containing monomers and other monomers may be polymerized singly or in combination with other monomers. Moreover, the double bond of non-conjugated polybutadiene having a hydroxyl group at the end can be epoxidized by the peracetic acid method, and one having a hydroxyl group in the molecule may be used. Alternatively, hydroxyl groups can be urethanized with isocyanate, and epoxy groups can be introduced by reacting a primary hydroxyl group-containing epoxy compound.
 前記エチレン又は炭素数3~20のα-オレフィンとしては、エチレン、プロピレン、ブチレン、イソブチレン、1,3-ブタジエン、1,4-ブタジエン、1,3-ペンタジエン、2,3-ジメチル-1,3-ブタジエン、ピペリレン、3-ブチル-1,3-オクタジエン及びイソプレン等が挙げられる。 Examples of the ethylene or α-olefin having 3 to 20 carbon atoms include ethylene, propylene, butylene, isobutylene, 1,3-butadiene, 1,4-butadiene, 1,3-pentadiene, 2,3-dimethyl-1,3 -butadiene, piperylene, 3-butyl-1,3-octadiene and isoprene.
 前記エポキシ基含有単量体としては、たとえばα,β-不飽和酸のグリシジルエステル、ビニルベンジルグリシジルエーテル及びアリルグリシジルエーテル等が挙げられる。α,β-不飽和酸のグリシジルエステルとしては、具体的にはアクリル酸グリシジル、メタクリル酸グリシジル及びエタクリル酸グリシジル等が挙げられ、特にメタクリル酸グリシジルが好ましい。 Examples of the epoxy group-containing monomers include glycidyl esters of α,β-unsaturated acids, vinylbenzyl glycidyl ethers and allyl glycidyl ethers. Examples of glycidyl esters of α,β-unsaturated acids include glycidyl acrylate, glycidyl methacrylate and glycidyl ethacrylate, with glycidyl methacrylate being particularly preferred.
 前記他のモノマーとしては、塩化ビニル、塩化ビニリデン、フッ化ビニリデン及びテトラフルオロエチレン等の不飽和脂肪族炭化水素;(メタ)アクリル酸、α-クロルアクリル酸、イタコン酸、マレイン酸、シトラコン酸、フマル酸、ハイミック酸、クロトン酸、イソクロトン酸、ビニル酢酸、アリル酢酸、桂皮酸、ソルビン酸、メサコン酸、コハク酸モノ[2-(メタ)アクリロイロキシエチル]、フタル酸モノ[2-(メタ)アクリロイロキシエチル]、ω-カルボキシポリカプロラクトンモノ(メタ)アクリレート等の両末端にカルボキシ基と水酸基とを有するポリマーのモノ(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート・マレート、ヒドロキシプロピル(メタ)アクリレート・マレート、ジシクロペンタジエン・マレート及び1個のカルボキシル基と2個以上の(メタ)アクリロイル基とを有する多官能(メタ)アクリレート等の不飽和多塩基酸;(メタ)アクリル酸-2-ヒドロキシエチル、(メタ)アクリル酸-2-ヒドロキシプロピル、(メタ)アクリル酸メチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸-t-ブチル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸イソノニル、(メタ)アクリル酸ステアリル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸メトキシエチル、(メタ)アクリル酸ジメチルアミノメチル、(メタ)アクリル酸ジメチルアミノエチル、(メタ)アクリル酸アミノプロピル、(メタ)アクリル酸ジメチルアミノプロピル、(メタ)アクリル酸エトキシエチル、(メタ)アクリル酸ポリ(エトキシ)エチル、(メタ)アクリル酸ブトキシエトキシエチル、(メタ)アクリル酸エチルヘキシル、(メタ)アクリル酸フェノキシエチル、(メタ)アクリル酸テトラヒドロフリル、(メタ)アクリル酸ビニル、(メタ)アクリル酸アリル、(メタ)アクリル酸ベンジル、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、トリエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリシクロデカンジメチロールジ(メタ)アクリレート、トリ[(メタ)アクリロイルエチル]イソシアヌレート及びポリエステル(メタ)アクリレートオリゴマー等の不飽和一塩基酸及び多価アルコール又は多価フェノールのエステル;(メタ)アクリル酸亜鉛、(メタ)アクリル酸マグネシウム等の不飽和多塩基酸の金属塩;マレイン酸無水物、イタコン酸無水物、シトラコン酸無水物、メチルテトラヒドロ無水フタル酸、テトラヒドロ無水フタル酸、トリアルキルテトラヒドロ無水フタル酸、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物、トリアルキルテトラヒドロ無水フタル酸-無水マレイン酸付加物、ドデセニル無水コハク酸及び無水メチルハイミック酸等の不飽和多塩基酸の酸無水物;(メタ)アクリルアミド、メチレンビス-(メタ)アクリルアミド、ジエチレントリアミントリス(メタ)アクリルアミド、キシリレンビス(メタ)アクリルアミド、α-クロロアクリルアミド、N-2-ヒドロキシエチル(メタ)アクリルアミド等の不飽和一塩基酸及び多価アミンのアミド;アクロレイン等の不飽和アルデヒド;(メタ)アクリロニトリル、α-クロロアクリロニトリル、シアン化ビニリデン、シアン化アリル等の不飽和ニトリル;スチレン、4-メチルスチレン、4-エチルスチレン、4-メトキシスチレン、4-ヒドロキシスチレン、4-クロロスチレン、ジビニルベンゼン、ビニルトルエン、ビニル安息香酸、ビニルフェノール、ビニルスルホン酸、4-ビニルベンゼンスルホン酸、ビニルベンジルメチルエーテル及びビニルナフタレン等の不飽和芳香族化合物;メチルビニルケトン等の不飽和ケトン;ビニルアミン、アリルアミン、N-ビニルピロリドン及びビニルピペリジン等の不飽和アミン化合物;アリルアルコール及びクロチルアルコール等のビニルアルコール;ビニルメチルエーテル、ビニルエチルエーテル、n-ブチルビニルエーテル及びイソブチルビニルエーテル等のビニルエーテル;マレイミド、N-フェニルマレイミド及びN-シクロヘキシルマレイミド等の不飽和イミド類;インデン及び1-メチルインデン等のインデン類;ポリスチレン、ポリメチル(メタ)アクリレート、ポリ-n-ブチル(メタ)アクリレート及びポリシロキサン等の重合体分子鎖の末端にモノ(メタ)アクリロイル基を有するマクロモノマー類;ビニルクロリド、ビニリデンクロリド、ジビニルスクシナート、ジアリルフタラート、トリアリルホスファート、トリアリルイソシアヌラート、ビニルチオエーテル、ビニルイミダゾール、ビニルオキサゾリン、ビニルカルバゾール、ビニルピロリドン、ビニルピリジン、水酸基含有ビニルモノマー及びポリイソシアネート化合物のビニルウレタン化合物、水酸基含有ビニルモノマー及びポリエポキシ化合物のビニルエポキシ化合物、ペンタエリスリトールトリアクリレート及びジペンタエリスリトールペンタアクリレート等の水酸基含有多官能アクリレート;トリレンジイソシアネート及びヘキサメチレンジイソシアネート等の多官能イソシアネートの反応物;ペンタエリスリトールトリアクリレート及びジペンタエリスリトールペンタアクリレート等の水酸基含有多官能アクリレートと無水コハク酸、無水フタル酸及びテトラヒドロ無水フタル酸等の二塩基酸無水物の反応物である酸価を有する多官能アクリレートが挙げられる。 Examples of the other monomers include unsaturated aliphatic hydrocarbons such as vinyl chloride, vinylidene chloride, vinylidene fluoride and tetrafluoroethylene; (meth)acrylic acid, α-chloroacrylic acid, itaconic acid, maleic acid, citraconic acid, Fumaric acid, hymic acid, crotonic acid, isocrotonic acid, vinylacetic acid, allylacetic acid, cinnamic acid, sorbic acid, mesaconic acid, mono[2-(meth)acryloyloxyethyl] succinate, mono[2-(meth)phthalate ) acryloyloxyethyl], ω-carboxypolycaprolactone mono(meth)acrylate, polymer mono(meth)acrylate having a carboxy group and a hydroxyl group at both ends, hydroxyethyl (meth)acrylate malate, hydroxypropyl (meth)acrylate ) Unsaturated polybasic acids such as acrylate maleate, dicyclopentadiene maleate and polyfunctional (meth)acrylates having one carboxyl group and two or more (meth)acryloyl groups; (meth)acrylic acid-2 -hydroxyethyl, -2-hydroxypropyl (meth)acrylate, methyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, -t-butyl (meth)acrylate, (meth)acrylic Cyclohexyl acid, n-octyl (meth)acrylate, isooctyl (meth)acrylate, isononyl (meth)acrylate, stearyl (meth)acrylate, lauryl (meth)acrylate, methoxyethyl (meth)acrylate, (meth)acrylate ) dimethylaminomethyl acrylate, dimethylaminoethyl (meth)acrylate, aminopropyl (meth)acrylate, dimethylaminopropyl (meth)acrylate, ethoxyethyl (meth)acrylate, poly(ethoxy) (meth)acrylate Ethyl, butoxyethoxyethyl (meth)acrylate, ethylhexyl (meth)acrylate, phenoxyethyl (meth)acrylate, tetrahydrofuryl (meth)acrylate, vinyl (meth)acrylate, allyl (meth)acrylate, (meth)acrylate ) benzyl acrylate, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, 1,4-butane diol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, trimethylo tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, tri Esters of unsaturated monobasic acids and polyhydric alcohols or polyhydric phenols such as cyclodecanedimethylol di(meth)acrylate, tri[(meth)acryloylethyl]isocyanurate and polyester (meth)acrylate oligomers; (meth)acrylic acid Metal salts of unsaturated polybasic acids such as zinc and magnesium (meth)acrylate; maleic anhydride, itaconic anhydride, citraconic anhydride, methyltetrahydrophthalic anhydride, tetrahydrophthalic anhydride, trialkyltetrahydrophthalic anhydride acid, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, trialkyltetrahydrophthalic anhydride-maleic anhydride adduct, dodecenyl succinic anhydride and Acid anhydrides of unsaturated polybasic acids such as methylhymic anhydride; (meth)acrylamide, methylenebis-(meth)acrylamide, diethylenetriaminetris(meth)acrylamide, xylylenebis(meth)acrylamide, α-chloroacrylamide, N-2 - amides of unsaturated monobasic acids and polyamines such as hydroxyethyl (meth)acrylamide; unsaturated aldehydes such as acrolein; unsaturated nitriles such as (meth)acrylonitrile, α-chloroacrylonitrile, vinylidene cyanide, allyl cyanide. ; styrene, 4-methylstyrene, 4-ethylstyrene, 4-methoxystyrene, 4-hydroxystyrene, 4-chlorostyrene, divinylbenzene, vinyltoluene, vinylbenzoic acid, vinylphenol, vinylsulfonic acid, 4-vinylbenzenesulfone unsaturated aromatic compounds such as acids, vinylbenzyl methyl ether and vinylnaphthalene; unsaturated ketones such as methyl vinyl ketone; unsaturated amine compounds such as vinylamine, allylamine, N-vinylpyrrolidone and vinylpiperidine; allyl alcohol and crotyl alcohol. vinyl alcohols such as; vinyl ethers such as vinyl methyl ether, vinyl ethyl ether, n-butyl vinyl ether and isobutyl vinyl ether; Unsaturated imides such as phenylmaleimide and N-cyclohexylmaleimide; indenes such as indene and 1-methylindene; polymer molecules such as polystyrene, polymethyl (meth)acrylate, poly-n-butyl (meth)acrylate and polysiloxane Macromonomers having a mono(meth)acryloyl group at the chain end; vinyl chloride, vinylidene chloride, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate, vinyl thioether, vinylimidazole, vinyloxazoline , vinylcarbazole, vinylpyrrolidone, vinylpyridine, vinyl urethane compounds of hydroxyl group-containing vinyl monomers and polyisocyanate compounds, vinyl epoxy compounds of hydroxyl group-containing vinyl monomers and polyepoxy compounds, hydroxyl group-containing compounds such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate Polyfunctional acrylates; reactants of polyfunctional isocyanates such as tolylene diisocyanate and hexamethylene diisocyanate; hydroxyl group-containing polyfunctional acrylates such as pentaerythritol triacrylate and dipentaerythritol pentaacrylate and succinic anhydride, phthalic anhydride and tetrahydrophthalic anhydride polyfunctional acrylate having an acid value that is a reactant of a dibasic acid anhydride such as
 前記エポキシ化ポリオレフィンとしては、市販品を用いることもでき、エポリードPB3600、エポリードPB4700(ダイセル社製);BF-1000、FC-3000(ADEKA社製);ボンドファースト2C、ボンドファーストE、ボンドファーストCG5001、ボンドファーストCG5004、ボンドファースト2B、ボンドファースト7B、ボンドファースト7L、ボンドファースト7M、ボンドファーストVC40(住友化学社製);JP-100、JP-200(日本曹達社製);Poly bd R-45HT、Poly bd R-15HT(出光興産社製)及びRicon657(アルケマ社製)等が挙げられる。 As the epoxidized polyolefin, commercial products can also be used, such as Epolead PB3600, Epolead PB4700 (manufactured by Daicel); BF-1000, FC-3000 (manufactured by ADEKA); Bondfast 2C, Bondfast E, Bondfast CG5001. , Bond First CG5004, Bond First 2B, Bond First 7B, Bond First 7L, Bond First 7M, Bond First VC40 (manufactured by Sumitomo Chemical Co., Ltd.); JP-100, JP-200 (manufactured by Nippon Soda Co., Ltd.); Poly bd R-45HT , Poly bd R-15HT (manufactured by Idemitsu Kosan) and Ricon 657 (manufactured by Arkema).
 耐熱性が良好なことから、前記エポキシ化合物としては、カルド骨格を有する化合物を使用することがより好ましい。 It is more preferable to use a compound having a cardo skeleton as the epoxy compound because of its good heat resistance.
 前記オキセタン化合物としては、3,7-ビス(3-オキセタニル)-5-オキサ-ノナン、1,4-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]ベンゼン、1,2-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]エタン、1,3-ビス[(3-エチル-3-オキセタニルメトキシ)メチル]プロパン、エチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、トリエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、テトラエチレングリコールビス(3-エチル-3-オキセタニルメチル)エーテル、1,4-ビス(3-エチル-3-オキセタニルメトキシ)ブタン、1,6-ビス(3-エチル-3-オキセタニルメトキシ)ヘキサン、3-エチル-3-[(フェノキシ)メチル]オキセタン、3-エチル-3-(ヘキシロキシメチル)オキセタン、3-エチル-3-(2-エチルヘキシロキシメチル)オキセタン、3-エチル-3-(ヒドロキシメチル)オキセタン及び3-エチル-3-(クロロメチル)オキセタン等が挙げられる。 Examples of the oxetane compound include 3,7-bis(3-oxetanyl)-5-oxa-nonane, 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene, 1,2-bis[( 3-ethyl-3-oxetanylmethoxy)methyl]ethane, 1,3-bis[(3-ethyl-3-oxetanylmethoxy)methyl]propane, ethylene glycol bis(3-ethyl-3-oxetanylmethyl)ether, triethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether, tetraethylene glycol bis(3-ethyl-3-oxetanylmethyl) ether, 1,4-bis(3-ethyl-3-oxetanylmethoxy)butane, 1,6 -bis(3-ethyl-3-oxetanylmethoxy)hexane, 3-ethyl-3-[(phenoxy)methyl]oxetane, 3-ethyl-3-(hexyloxymethyl)oxetane, 3-ethyl-3-(2- ethylhexyloxymethyl)oxetane, 3-ethyl-3-(hydroxymethyl)oxetane, 3-ethyl-3-(chloromethyl)oxetane and the like.
 前記ビニルエーテル化合物としては、ジエチレングリコールモノビニルエーテル、トリエチレングリコールジビニルエーテル、n-ドデシルビニルエーテル、シクロヘキシルビニルエーテル、2-エチルヘキシルビニルエーテル、2-クロロエチルビニルエーテル、エチルビニルエーテル、イソブチルビニルエーテル、トリエチレングリコールビニルエーテル、2-ヒドロキシエチルビニルエーテル、4-ヒドロキシブチルビニルエーテル、1,6-シクロヘキサンジメタノールモノビニルエーテル、エチレングリコールジビニルエーテル、1,4-ブタンジオールジビニルエーテル及び1,6-シクロヘキサンジメタノールジビニルエーテル等が挙げられる。 Examples of the vinyl ether compound include diethylene glycol monovinyl ether, triethylene glycol divinyl ether, n-dodecyl vinyl ether, cyclohexyl vinyl ether, 2-ethylhexyl vinyl ether, 2-chloroethyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether, triethylene glycol vinyl ether, and 2-hydroxyethyl. vinyl ether, 4-hydroxybutyl vinyl ether, 1,6-cyclohexanedimethanol monovinyl ether, ethylene glycol divinyl ether, 1,4-butanediol divinyl ether, 1,6-cyclohexanedimethanol divinyl ether and the like.
 前記アニオン重合性化合物としては、アニオン重合可能な重合性基を1以上有するものであればよい。
 前記アニオン重合可能な重合性基としては、エポキシ基、ラクトン基、(メタ)アクリル基等が挙げられる。すなわち、前記アニオン重合性化合物としては、エポキシ化合物、ラクトン化合物、(メタ)アクリル基を有する化合物等が挙げられる。前記ラクトン化合物としては、β-プロピオラクトン、ε-カプロラクトン等が挙げられる。
 前記アニオン重合性化合物は、通常、アニオン重合開始剤と共に用いられる。
 なお、エポキシ化合物については、前記カチオン重合性化合物として例示したエポキシ化合物を用いることができる。また、(メタ)アクリル基を有する化合物としては、前記ラジカル重合性化合物として例示したものを用いることができる。
The anionically polymerizable compound may be any compound having one or more anionically polymerizable groups.
Examples of the anionic polymerizable group include an epoxy group, a lactone group, and a (meth)acrylic group. That is, examples of the anionically polymerizable compound include epoxy compounds, lactone compounds, compounds having a (meth)acrylic group, and the like. Examples of the lactone compound include β-propiolactone and ε-caprolactone.
The anionically polymerizable compound is usually used together with an anionic polymerization initiator.
As for the epoxy compound, the epoxy compounds exemplified as the cationic polymerizable compound can be used. As the compound having a (meth)acrylic group, those exemplified as the radically polymerizable compound can be used.
 前記カチオン重合性化合物及びアニオン重合性化合物は、それぞれ単独で又は2種以上を混合して使用することができる。 The cationically polymerizable compound and the anionically polymerizable compound can be used alone or in combination of two or more.
(c)その他
 前記重合性化合物の分子量は、前記組成物の用途等に応じて適宜設定されるものであるが、50以上とすることができ、50以上3000以下とすることができる。
 なお、前記分子量は、重合性化合物がその構造として繰り返し構造を含む重合体である場合には、重量平均分子量(Mw)で表すものとする。
(c) Others The molecular weight of the polymerizable compound is appropriately set depending on the use of the composition, etc., and can be 50 or more, and can be 50 or more and 3,000 or less.
In addition, when the polymerizable compound is a polymer containing a repeating structure as its structure, the molecular weight is represented by a weight average molecular weight (Mw).
 前記重合性化合物の含有量は、前記組成物を硬化性組成物として使用可能となるものであればよいが、前記化合物A、前記化合物B及び重合性化合物の合計100質量部中に1質量部以上99質量部以下とすることができ、50質量部以上99質量部以下であることが好ましく、特に80質量部以上99質量部以下であることが好ましい。前記含有量が上述の範囲であることにより、前記組成物は、硬化性組成物としての使用が容易であり、また、硬化性組成物の耐光性や耐熱性等の耐久性を向上するとの効果をより効果的に発揮できるからである。 The content of the polymerizable compound, as long as the composition can be used as a curable composition, the compound A, the compound B and 1 part by mass in a total of 100 parts by mass of the polymerizable compound 99 parts by mass or less, preferably 50 parts by mass or more and 99 parts by mass or less, and particularly preferably 80 parts by mass or more and 99 parts by mass or less. When the content is in the above range, the composition is easy to use as a curable composition, and the effect of improving durability such as light resistance and heat resistance of the curable composition. can be more effectively exhibited.
(2)重合体
 前記重合体は、重合性基を有しないものである。このような重合体としては、繰り返し構造を含むものであればよく、感光性を有する感光性樹脂、感光性を有しない非感光性樹脂等が挙げられる。
 本発明の組成物は、樹脂成分として感光性樹脂を含むことにより、感光性組成物として用いることができる。
(2) Polymer The polymer does not have a polymerizable group. As such a polymer, any polymer containing a repeating structure may be used, and examples thereof include photosensitive resins having photosensitivity and non-photosensitive resins having no photosensitivity.
The composition of the present invention can be used as a photosensitive composition by containing a photosensitive resin as a resin component.
(a)感光性樹脂
 前記感光性樹脂は、感光性を有するものであり、例えば、酸発生剤と共に用いられ、酸の作用でエステル基又はアセタール基等の化学結合の切断等、現像液に対する溶解性が増加する方向に変化するポジ型樹脂が挙げられる。
 前記組成物は、樹脂成分としてポジ型樹脂を含むことにより、光照射部位のアルカリ現像液への溶解性が増加する。このため、前記組成物は、アルカリ現像液等の溶媒への溶解性が光照射前後で変化する感光性組成物として、より具体的には、ポジ型組成物として用いることができる。
(a) Photosensitive resin The photosensitive resin has photosensitivity. For example, it is used together with an acid generator, and dissolves in a developer by the action of an acid such as cleavage of a chemical bond such as an ester group or an acetal group. Examples include positive resins that change in the direction of increasing properties.
Since the composition contains a positive resin as a resin component, the solubility of the light-irradiated portion in an alkaline developer is increased. Therefore, the composition can be used as a photosensitive composition whose solubility in a solvent such as an alkaline developer changes before and after light irradiation, more specifically as a positive composition.
 前記ポジ型樹脂としては、重合体にアルカリ溶解制御能を有する酸不安定基を導入したものを用いることができる。このような重合体としては、ポリヒドロキシスチレン及びその誘導体;ポリアクリル酸及びその誘導体;ポリメタクリル酸及びその誘導体;ヒドロキシスチレン、アクリル酸、メタクリル酸及びそれらの誘導体から選ばれ形成される2以上の共重合体;ヒドロキシスチレン、スチレン及びそれらの誘導体から選ばれ形成される2以上の共重合体;シクロオレフィン及びその誘導体、無水マレイン酸、並びに、アクリル酸及びその誘導体から選ばれる3以上の共重合体;シクロオレフィン及びその誘導体、マレイミド、並びに、アクリル酸及びその誘導体から選ばれる3以上の共重合体;ポリノルボルネン;メタセシス開環重合体からなる一群から選択される1種以上の高分子重合体等が挙げられる。
 前記酸不安定基としては、三級アルキル基、トリアルキルシリル基、オキソアルキル基、アリール基置換アルキル基、テトラヒドロピラン-2-イル基等の複素脂環基、三級アルキルカルボニル基、三級アルキルカルボニルアルキル基、アルキルオキシカルボニル基等が挙げられる。
As the positive resin, a polymer obtained by introducing an acid-labile group capable of controlling alkali dissolution can be used. Such polymers include polyhydroxystyrene and its derivatives; polyacrylic acid and its derivatives; polymethacrylic acid and its derivatives; hydroxystyrene, acrylic acid, methacrylic acid and their derivatives. Copolymer; 2 or more copolymers selected from hydroxystyrene, styrene and their derivatives; 3 or more copolymers selected from cycloolefin and its derivatives, maleic anhydride, and acrylic acid and its derivatives Coalescing; three or more copolymers selected from cycloolefins and derivatives thereof, maleimide, and acrylic acid and derivatives thereof; polynorbornene; one or more high molecular weight polymers selected from the group consisting of metathesis ring-opening polymers etc.
Examples of the acid-labile group include a tertiary alkyl group, a trialkylsilyl group, an oxoalkyl group, an aryl group-substituted alkyl group, a heteroalicyclic group such as a tetrahydropyran-2-yl group, a tertiary alkylcarbonyl group, a tertiary An alkylcarbonylalkyl group, an alkyloxycarbonyl group, and the like can be mentioned.
 前記ポジ型樹脂の詳細な具体例としては、特開2003-192665号公報、特開2004-323704号公報の請求項3、特開平10-10733号公報等に記載の樹脂が挙げられる。 Detailed specific examples of the positive resin include resins described in JP-A-2003-192665, claim 3 of JP-A-2004-323704, and JP-A-10-10733.
 前記ポジ型樹脂と共に用いられる酸発生剤としては、公知の酸発生剤を用いることができる。前記酸発生剤としては、具体的には、後述する光カチオン重合開始剤、熱カチオン重合開始剤等が挙げられる。 A known acid generator can be used as the acid generator used together with the positive resin. Specific examples of the acid generator include a photocationic polymerization initiator and a thermal cationic polymerization initiator, which will be described later.
(b)非感光性樹脂
 前記非感光性樹脂は、感光性を有しないものであればよく、ポリスチレン、ポリメチルメタクリレート、メチルメタクリレート-エチルアクリレート共重合体、ポリ(メタ)アクリル酸、スチレン-(メタ)アクリル酸共重合体、(メタ)アクリル酸-メチルメタクリレート共重合体、エチレン-塩化ビニル共重合体、エチレン-ビニル共重合体、ポリ塩化ビニル樹脂、ABS樹脂、ナイロン6、ナイロン66、ナイロン12、ウレタン樹脂、ポリカーボネートポリビニルブチラール、セルロースエステル、ポリアクリルアミド、飽和ポリエステル、フェノール樹脂、フェノキシ樹脂、ポリアミドイミド樹脂、ポリアミック酸樹脂、エポキシ樹脂等が挙げられる。
 前記非感光性樹脂は、上述の重合性化合物の重合物も用いることができる。
(b) Non-photosensitive resin The non-photosensitive resin is not photosensitive, and may be polystyrene, polymethyl methacrylate, methyl methacrylate-ethyl acrylate copolymer, poly(meth)acrylic acid, styrene-( meth) acrylic acid copolymer, (meth) acrylic acid-methyl methacrylate copolymer, ethylene-vinyl chloride copolymer, ethylene-vinyl copolymer, polyvinyl chloride resin, ABS resin, nylon 6, nylon 66, nylon 12, urethane resin, polycarbonate polyvinyl butyral, cellulose ester, polyacrylamide, saturated polyester, phenol resin, phenoxy resin, polyamideimide resin, polyamic acid resin, epoxy resin and the like.
Polymers of the above polymerizable compounds can also be used as the non-photosensitive resin.
(c)重合体の分子量
 前記重合体の重量平均分子量(Mw)は、前記組成物の用途等に応じて適宜設定されるものであるが、1500以上とすることができ、1500以上300000以下とすることができる。
(c) Molecular weight of the polymer The weight-average molecular weight (Mw) of the polymer is appropriately set depending on the use of the composition, etc., and can be 1500 or more, and can be 1500 or more and 300000 or less. can do.
(3)樹脂成分の含有量
 前記樹脂成分の含有量は、前記組成物の用途等に応じて適宜設定されるものであり、固形分100質量部中に1質量部以上99質量部以下とすることができ、10質量部以上95質量部以下であることが好ましく、特に15質量部以上90質量部以下であることが好ましい。前記含有量が上述の範囲であることにより、前記組成物は、前記化合物A及び化合物Bを安定的に保持可能だからである。
(3) Content of resin component The content of the resin component is appropriately set according to the application of the composition, etc., and is 1 part by mass or more and 99 parts by mass or less per 100 parts by mass of the solid content. It is preferably 10 parts by mass or more and 95 parts by mass or less, and particularly preferably 15 parts by mass or more and 90 parts by mass or less. This is because the composition can stably retain the compound A and the compound B when the content is within the above range.
 前記樹脂成分の含有量は、前記化合物A、前記化合物B及び前記樹脂成分の合計100質量部中に1質量部以上99質量部以下とすることができ、30質量部以上99質量部以下であることが好ましく、特に50質量部以上99質量部以下であることが好ましい。前記含有量が上述の範囲であることにより、前記組成物は、前記化合物A及び化合物Bを安定的に保持可能だからである。また、硬化性組成物の耐光性等の耐久性及び良好な感度を向上するとの効果をより効果的に発揮できるからである。
 前記樹脂成分、前記化合物A及び前記化合物Bの合計の含有量は、前記組成物100質量部中に1質量部以上とすることができ、10質量部以上90質量部以下であることがより好ましく、13質量部以上80質量部以下であることがさらに好ましく、特に15質量部以上60質量部以下であることが好ましい。前記組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。
The content of the resin component can be 1 part by mass or more and 99 parts by mass or less in a total of 100 parts by mass of the compound A, the compound B and the resin component, and is 30 parts by mass or more and 99 parts by mass or less. It is preferably 50 parts by mass or more and 99 parts by mass or less. This is because the composition can stably retain the compound A and the compound B when the content is within the above range. Moreover, it is because the effect of improving durability, such as light resistance, and favorable sensitivity of a curable composition can be exhibited more effectively.
The total content of the resin component, the compound A and the compound B can be 1 part by mass or more in 100 parts by mass of the composition, and more preferably 10 parts by mass or more and 90 parts by mass or less. , more preferably 13 parts by mass or more and 80 parts by mass or less, and particularly preferably 15 parts by mass or more and 60 parts by mass or less. This is because the composition can produce a cured product having excellent durability, and has good sensitivity, thereby facilitating production of the cured product.
 前記樹脂成分の種類は、1種類のみであってもよく、2種類以上の組み合わせであってもよい。前記樹脂成分は、重合性化合物及び前記重合体のいずれか一方のみを含むもの又は両者を含むものとすることができる。前記樹脂成分が重合性化合物及び重合体の両者を含む場合、前記重合性化合物の含有量は、前記組成物の用途等に応じて適宜設定することができるが、重合性化合物及び重合体100質量部に対して、1質量部以上99質量部以下とすることができる。 The type of the resin component may be only one type, or may be a combination of two or more types. The resin component may contain either one of the polymerizable compound and the polymer, or both. When the resin component contains both a polymerizable compound and a polymer, the content of the polymerizable compound can be appropriately set according to the application of the composition, etc. It can be 1 part by mass or more and 99 parts by mass or less.
(III)その他の成分
 本発明の組成物は、前記化合物A、前記化合物B及び前記樹脂成分以外にも、必要に応じてその他の成分を含むことができる。
 前記その他の成分としては、重合開始剤、着色剤、溶剤、連鎖移動剤、増感剤、界面活性剤、シランカップリング剤、メラミン化合物、酸触媒、塩基触媒等が挙げられる。
(III) Other Components The composition of the present invention may optionally contain other components in addition to the compound A, the compound B and the resin component.
Examples of the other components include polymerization initiators, colorants, solvents, chain transfer agents, sensitizers, surfactants, silane coupling agents, melamine compounds, acid catalysts, base catalysts, and the like.
(1)重合開始剤
 前記重合開始剤は、硬化性成分として含まれるものであり、通常、重合性化合物等と共に用いられるものである。
 前記重合開始剤としては、重合性化合物を重合可能なものであればよく、光照射を受けることにより重合性化合物を重合可能な光重合開始剤、加熱することにより重合性化合物を重合可能な熱重合開始剤等が挙げられる。
 前記重合開始剤は、前記組成物が、化合物A及び化合物Bを含む場合でも容易に硬化できるとの効果を効果的に発揮する観点からは、光重合開始剤であることが好ましい。
(1) Polymerization Initiator The polymerization initiator is included as a curable component and is usually used together with a polymerizable compound.
The polymerization initiator may be any one as long as it can polymerize the polymerizable compound. A polymerization initiator and the like are included.
The polymerization initiator is preferably a photopolymerization initiator from the viewpoint of effectively exhibiting the effect that even when the composition contains compound A and compound B, the composition can be easily cured.
(a)光重合開始剤
 前記光重合開始剤としては、光照射を受けることにより重合性化合物を重合可能なものであればよく、光ラジカル重合開始剤、光カチオン重合開始剤、光アニオン重合開始剤等が挙げられる。
(a) Photopolymerization Initiator The photopolymerization initiator may be one capable of polymerizing a polymerizable compound by receiving light irradiation, and may be a photoradical polymerization initiator, a photocationic polymerization initiator, or a photoanion polymerization initiator. agents and the like.
 前記光ラジカル重合開始剤としては、光照射によりラジカルを発生するものであれば特に制限されず従来既知の化合物を用いることができる。
 前記光ラジカル重合開始剤としては、アセトフェノン系化合物、ベンジル系化合物、ベンゾフェノン系化合物、チオキサントン系化合物及びオキシムエステル系化合物等を好ましいものとして例示することができる。
The photo-radical polymerization initiator is not particularly limited as long as it generates radicals upon irradiation with light, and conventionally known compounds can be used.
As the radical photopolymerization initiator, acetophenone-based compounds, benzyl-based compounds, benzophenone-based compounds, thioxanthone-based compounds, oxime ester-based compounds, and the like can be preferably exemplified.
 前記アセトフェノン系化合物としては、ジエトキシアセトフェノン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、4’-イソプロピル-2-ヒドロキシ-2-メチルプロピオフェノン、2-ヒドロキシメチル-2-メチルプロピオフェノン、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、p-ジメチルアミノアセトフェノン、p-ターシャリブチルジクロロアセトフェノン、p-ターシャリブチルトリクロロアセトフェノン、p-アジドベンザルアセトフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルフォリノプロパノン-1、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタノン-1、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾイン-n-ブチルエーテル、ベンゾインイソブチルエーテル及び1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン等が挙げられる。 Examples of the acetophenone compounds include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4′-isopropyl-2-hydroxy-2-methylpropiophenone, 2-hydroxymethyl-2 -methylpropiophenone, 2,2-dimethoxy-1,2-diphenylethan-1-one, p-dimethylaminoacetophenone, p-tertiarybutyldichloroacetophenone, p-tertiarybutyltrichloroacetophenone, p-azidobenzal Acetophenone, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropanone-1,2-benzyl-2-dimethylamino-1-(4-morpholinophenyl) -butanone-1, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether and 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2- and methyl-1-propan-1-one.
 前記ベンジル系化合物としては、ベンジル等が挙げられる。 Examples of the benzyl-based compounds include benzyl and the like.
 前記ベンゾフェノン系化合物としては、ベンゾフェノン、o-ベンゾイル安息香酸メチル、ミヒラーケトン、4,4’-ビスジエチルアミノベンゾフェノン、4,4’-ジクロロベンゾフェノン及び4-ベンゾイル-4’-メチルジフェニルスルフィド等が挙げられる。 Examples of the benzophenone-based compounds include benzophenone, methyl o-benzoylbenzoate, Michler's ketone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone and 4-benzoyl-4'-methyldiphenyl sulfide.
 前記チオキサントン系化合物としては、チオキサントン、2-メチルチオキサントン、2-エチルチオキサントン、2-クロロチオキサントン、2-イソプロピルチオキサントン、2,4-ジエチルチオキサントン等が挙げられる。 Examples of the thioxanthone-based compounds include thioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone, and 2,4-diethylthioxanthone.
 前記オキシムエステル系化合物としては、感度及び耐熱性が良好なことから特に、下記一般式(IV)で表される化合物が挙げられる。 As the oxime ester compound, a compound represented by the following general formula (IV) is particularly exemplified because of its good sensitivity and heat resistance.
Figure JPOXMLDOC01-appb-C000036
(式中、R71及びR72は、それぞれ独立に、水素原子、シアノ基、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 R73及びR74は、それぞれ独立に、ハロゲン原子、ニトロ基、シアノ基、水酸基、カルボキシル基、-R75、-OR76、-SR77、-NR7879、-COR80、-SOR81、-SO82又は-CONR8384を表し、R73及びR74は、互いに結合して環を形成している場合があり、
 R75、R76、R77、R78、R79、R80、R81、R82、R83及びR84は、それぞれ独立に、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Xは、酸素原子、硫黄原子、セレン原子、-CR8586-、-CO-、-NR87-又は-PR88-を表し、
 Xは、単結合又は-CO-を表し、
 R85、R86、R87及びR88は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~20のアリール基又は炭素原子数7~20のアリールアルキル基を表し、
 前記各アルキル基又はアリールアルキル基は、ハロゲン原子、ニトロ基、シアノ基、水酸基、カルボキシル基又は複素環含有基で置換されている場合があり、
 前記各アルキル基又はアリールアルキル基中のメチレン基は、-O-で置き換えられている場合があり、
 R73及びR74は、それぞれ独立に、隣接するどちらかのベンゼン環と一緒になって環を形成している場合があり、
 e1は、0~4の整数を表し、
 e2は、0~5の整数を表す。)
Figure JPOXMLDOC01-appb-C000036
(wherein R 71 and R 72 are each independently a hydrogen atom, a cyano group, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 73 and R 74 each independently represent a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, -R 75 , -OR 76 , -SR 77 , -NR 78 R 79 , -COR 80 , -SOR 81 , —SO 2 R 82 or —CONR 83 R 84 , wherein R 73 and R 74 may combine with each other to form a ring,
R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 81 , R 82 , R 83 and R 84 each independently represent an alkyl group having 1 to 20 carbon atoms, 6 to represents an aryl group of 30, an arylalkyl group of 7 to 30 carbon atoms or a heterocyclic ring-containing group of 2 to 20 carbon atoms,
X 3 represents an oxygen atom, a sulfur atom, a selenium atom, -CR 85 R 86 -, -CO-, -NR 87 - or -PR 88 -;
X 4 represents a single bond or -CO-,
R 85 , R 86 , R 87 and R 88 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms or an arylalkyl group having 7 to 20 carbon atoms represents
each alkyl group or arylalkyl group may be substituted with a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, or a heterocyclic ring-containing group;
the methylene group in each alkyl group or arylalkyl group may be replaced with -O-,
R 73 and R 74 may each independently form a ring together with either adjacent benzene ring,
e1 represents an integer from 0 to 4,
e2 represents an integer from 0 to 5; )
 前記一般式(IV)中のR71、R72、R75、R76、R77、R78、R79、R80、R85、R86、R87及びR88で表される炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基並びにこれらの置換基としては、前記「1.化合物A」の項にR等として例示した基のうち、所定の炭素原子数を満たすものが挙げられる。 Number of carbon atoms represented by R 71 , R 72 , R 75 , R 76 , R 77 , R 78 , R 79 , R 80 , R 85 , R 86 , R 87 and R 88 in general formula (IV) Alkyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, arylalkyl groups having 7 to 30 carbon atoms, heterocyclic ring-containing groups having 2 to 20 carbon atoms, and substituents thereof include the above "1 Among the groups exemplified as R 1 , etc. in the section of “Compound A”, those having a predetermined number of carbon atoms can be mentioned.
 前記オキシムエステル系化合物としては、エタノン-1-〔9-エチル-6-(2-メチルベンゾイル-9H-カルバゾール-3-イル〕-1-(O-アセチルオキシム)、1-〔9-エチル-6-ベンゾイル-9H-カルバゾール-3-イル-オクタン-1-オンオキシム-O-アセテート、1-〔9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル〕-エタン-1-オンオキシム-O-ベンゾエート、1-〔9-n-ブチル-6-(2-エチルベンゾイル)-9H-カルバゾール-3-イル〕-エタン-1-オンオキシム-O-ベンゾエート、エタノン-1-〔9-エチル-6-(2-メチル-4-テトラヒドロフラニルベンゾイル)-9H-カルバゾール-3-イル〕-1-(O-アセチルオキシム)、エタノン-1-〔9-エチル-6-(2-メチル-4-テトラヒドロピラニルベンゾイル)-9H-カルバゾール-3-イル〕-1-(O-アセチルオキシム)、エタノン-1-〔9-エチル-6-(2-メチル-5-テトラヒドロフラニルベンゾイル)-9H-カルバゾール-3-イル〕-1-(O-アセチルオキシム)、エタノン-1-〔9-エチル-6-{2-メチル-4-(2,2-ジメチル-1,3-ジオキソラニル)メトキシベンゾイル}-9H-カルバゾール-3-イル〕-1-(O-アセチルオキシム)、エタノン-1-〔9-エチル-6-(2-メチル-4-テトラヒドロフラニルメトキシベンゾイル)-9H-カルバゾール-3-イル〕-1-(O-アセチルオキシム)等のカルバゾール構造を有するカルバゾール系オキシムエステル化合物が挙げられる。 Examples of the oxime ester compounds include ethanone-1-[9-ethyl-6-(2-methylbenzoyl-9H-carbazol-3-yl]-1-(O-acetyloxime), 1-[9-ethyl- 6-benzoyl-9H-carbazol-3-yl-octan-1-one oxime-O-acetate, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-ethane-1 -one oxime-O-benzoate, 1-[9-n-butyl-6-(2-ethylbenzoyl)-9H-carbazol-3-yl]-ethan-1-one oxime-O-benzoate, ethanone-1-[9 -ethyl-6-(2-methyl-4-tetrahydrofuranylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime), ethanone-1-[9-ethyl-6-(2-methyl -4-tetrahydropyranylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime), ethanone-1-[9-ethyl-6-(2-methyl-5-tetrahydrofuranylbenzoyl)- 9H-carbazol-3-yl]-1-(O-acetyloxime), ethanone-1-[9-ethyl-6-{2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)methoxy Benzoyl}-9H-carbazol-3-yl]-1-(O-acetyloxime), ethanone-1-[9-ethyl-6-(2-methyl-4-tetrahydrofuranylmethoxybenzoyl)-9H-carbazole-3 -yl]-1-(O-acetyloxime) and other carbazole-based oxime ester compounds having a carbazole structure.
 前記オキシムエステル系化合物としては、インドール構造を有するインドール系オキシムエステル化合物を用いることもできる。
 インドール系オキシムエステル化合物としては、国際公開第2017/051680号に記載される下記一般式(V)で表されるオキシムエステル化合物等が挙げられる。
As the oxime ester compound, an indole oxime ester compound having an indole structure can also be used.
Examples of indole-based oxime ester compounds include oxime ester compounds represented by the following general formula (V) described in International Publication No. 2017/051680.
Figure JPOXMLDOC01-appb-C000037
(式中、R201及びR202は、それぞれ独立に、-R211、-OR211、-COR211、-SR211、-CONR212213又は-CNを表し、
 R211、R212及びR213は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 R211、R212及びR213で表される基の水素原子は、更に-R221、-OR221、-COR221、-SR221、-NR222223、-CONR222223、-NR222OR223、-NCOR222OCOR223、-NR222COR221、-OCOR221、-COOR221、-SCOR221、-OCSR221、-COSR221、-CSOR221、水酸基、ニトロ基、-CN、ハロゲン原子、又は-COOR221で置換されている場合があり、
 R221、R222及びR223は、それぞれ独立に、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 R221、R222及びR223で表される基の水素原子は、更に水酸基、ニトロ基、-CN、ハロゲン原子、水酸基又はカルボキシル基で置換されていてもよく、
 R211、R212、R213、R221、R222及びR223で表される基のアルキレン部分のメチレン基は、-O-、-S-、-COO-、-OCO-、-OCOO-、-CONR224-、-NR224-、-NR224CO-、-NR224COO-、-OCONR224-、-SCO-、-COS-、-OCS-又は-SCOO-に置換されていてもよく、
 R224は、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 R211、R212、R213、R221、R222、R223及びR224で表される基のアルキル部分は、分岐側鎖がある場合があり、環状アルキルである場合があり、
 R203は、水素原子、炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、R203で表される基のアルキル部分は、分岐側鎖がある場合があり、環状アルキルである場合があり、また、R203とR207及びR203とR208はそれぞれ一緒になって環を形成している場合があり、
 R203で表される基の水素原子は、更に-R221、-OR221、-COR221、-SR221、-NR222223、-CONR222223、-NR222OR223、-NCOR222OCOR223、-NR222COR221、-OCOR221、-COOR221、-SCOR221、-OCSR221、-COSR221、-CSOR221、水酸基、ニトロ基、-CN、ハロゲン原子、又は-COOR221で置換されている場合があり、
 R204、R205、R206及びR207は、それぞれ独立に、-R211、-OR211、-SR211、-COR214、-CONR215216、-NR212COR211、-OCOR211、-COOR214、-SCOR211、-OCSR211、-COSR214、-CSOR211、水酸基、-CN又はハロゲン原子を表し、R204とR205、R205とR206及びR206とR207はそれぞれ一緒になって環を形成している場合があり、
 R204、R205、R206及びR207で表される基の水素原子は、更に-R221、-OR221、-COR221、-SR221、-NR222223、-CONR222223、-NR222OR223、-NCOR222OCOR223、-NR222COR221、-OCOR221、-COOR221、-SCOR221、-OCSR221、-COSR221、-CSOR221、水酸基、ニトロ基、-CN、ハロゲン原子又はCOOR221で置換されている場合があり、
 R214、R215及びR216は、水素原子又は炭素原子数1~20のアルキル基を表し、
 R214、R215及びR216で表される基のアルキル部分は、分岐側鎖がある場合があり、環状アルキルである場合があり、
 R208は、-R211、-OR211、-SR211、-COR211、-CONR212213、-NR212COR211、-OCOR211、-COOR211、-SCOR211、-OCSR211、-COSR211、-CSOR211、水酸基、-CN又はハロゲン原子を表し、
 n1は、0又は1を表す。)
Figure JPOXMLDOC01-appb-C000037
(wherein R 201 and R 202 each independently represent -R 211 , -OR 211 , -COR 211 , -SR 211 , -CONR 212 R 213 or -CN;
R 211 , R 212 and R 213 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a carbon atom represents a heterocyclic ring-containing group of numbers 2 to 20,
The hydrogen atoms of the groups represented by R 211 , R 212 and R 213 are further represented by -R 221 , -OR 221 , -COR 221 , -SR 221 , -NR 222 R 223 , -CONR 222 R 223 , -NR 222 OR 223 , —NCOR 222 OCOR 223 , —NR 222 COR 221 , —OCOR 221 , —COOR 221 , —SCOR 221 , —OCSR 221 , —COSR 221 , —CSOR 221 , hydroxyl group, nitro group, —CN, halogen atom, or may be substituted with -COOR 221 ,
R 221 , R 222 and R 223 are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a carbon atom represents a heterocyclic ring-containing group of numbers 2 to 20,
hydrogen atoms of the groups represented by R 221 , R 222 and R 223 may be further substituted with a hydroxyl group, a nitro group, —CN, a halogen atom, a hydroxyl group or a carboxyl group;
The methylene groups in the alkylene portions of the groups represented by R 211 , R 212 , R 213 , R 221 , R 222 and R 223 are -O-, -S-, -COO-, -OCO-, -OCOO-, optionally substituted with -CONR 224 -, -NR 224 -, -NR 224 CO-, -NR 224 COO-, -OCONR 224 -, -SCO-, -COS-, -OCS- or -SCOO-,
R 224 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms. represent,
The alkyl portion of the groups represented by R 211 , R 212 , R 213 , R 221 , R 222 , R 223 and R 224 may have branched side chains and may be cyclic alkyl,
R 203 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic ring-containing group having 2 to 20 carbon atoms. wherein the alkyl portion of the group represented by R 203 may have branched side chains and may be cyclic alkyl, and R 203 and R 207 and R 203 and R 208 together are each may form a ring,
The hydrogen atoms of the group represented by R 203 are further represented by —R 221 , —OR 221 , —COR 221 , —SR 221 , —NR 222 R 223 , —CONR 222 R 223 , —NR 222 OR 223 , —NCOR 222 substituted with OCOR 223 , —NR 222 COR 221 , —OCOR 221 , —COOR 221 , —SCOR 221 , —OCSR 221 , —COSR 221 , —CSOR 221 , hydroxyl group, nitro group, —CN, halogen atom, or —COOR 221 may have been
R 204 , R 205 , R 206 and R 207 are each independently -R 211 , -OR 211 , -SR 211 , -COR 214 , -CONR 215 R 216 , -NR 212 COR 211 , -OCOR 211 , - COOR 214 , —SCOR 211 , —OCSR 211 , —COSR 214 , —CSOR 211 , hydroxyl group, —CN or halogen atom, wherein R 204 and R 205 , R 205 and R 206 and R 206 and R 207 are each may form a ring,
The hydrogen atoms of the groups represented by R 204 , R 205 , R 206 and R 207 are further represented by -R 221 , -OR 221 , -COR 221 , -SR 221 , -NR 222 R 223 , -CONR 222 R 223 , —NR 222 OR 223 , —NCOR 222 OCOR 223 , —NR 222 COR 221 , —OCOR 221 , —COOR 221 , —SCOR 221 , —OCSR 221 , —COSR 221 , —CSOR 221 , hydroxyl group, nitro group, —CN, may be substituted with a halogen atom or COOR 221 ,
R 214 , R 215 and R 216 represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms,
The alkyl portion of the groups represented by R 214 , R 215 and R 216 may have branched side chains and may be cyclic alkyl,
R 208 is -R 211 , -OR 211 , -SR 211 , -COR 211 , -CONR 212 R 213 , -NR 212 COR 211 , -OCOR 211 , -COOR 211 , -SCOR 211 , -OCSR 211 , -COSR 211 , —CSOR 211 , a hydroxyl group, —CN or a halogen atom;
n1 represents 0 or 1; )
 前記一般式(V)中のR203、R211、R212、R213、R214、R215、R216、R221、R222、R223及びR224で表される炭素原子数1~20のアルキル基、炭素原子数6~30のアリール基、炭素原子数7~30のアリールアルキル基又は炭素原子数2~20の複素環含有基としては、前記「1.化合物A」の項にR等として例示した基のうち、所定の炭素原子数を満たすものが挙げられる。 1 to 20 carbon atoms represented by R 203 , R 211 , R 212 , R 213 , R 214 , R 215 , R 216 , R 221 , R 222 , R 223 and R 224 in the general formula (V) , an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms or a heterocyclic ring-containing group having 2 to 20 carbon atoms, R Among the groups exemplified as 1, etc., those having a predetermined number of carbon atoms can be mentioned.
 その他のラジカル重合開始剤としては、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイド等のホスフィンオキサイド系化合物及びビス(シクロペンタジエニル)-ビス[2,6-ジフルオロ-3-(ピル-1-イル)]チタニウム等のチタノセン系化合物等が挙げられる。 Other radical polymerization initiators include phosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide and bis(cyclopentadienyl)-bis[2,6-difluoro-3-(pyr-1 -yl)] and titanocene compounds such as titanium.
 市販のラジカル重合開始剤としては、アデカオプトマーN-1414、N-1717、N-1919、アデカアークルズNCI-831、NCI-930(ADEKA社製)、IRGACURE184、IRGACURE369、IRGACURE651、IRGACURE907、IRGACURE OXE 01、IRGACURE OXE 02、OXE 03、OXE 04、IRGACURE784(BASF社製)、TR-PBG-304、TR-PBG-305、TR-PBG-309及びTR-PBG-314(Tronly社製)等が挙げられる。 Commercially available radical polymerization initiators include Adeka Optomer N-1414, N-1717, N-1919, Adeka Arkles NCI-831, NCI-930 (manufactured by ADEKA), IRGACURE184, IRGACURE369, IRGACURE651, IRGACURE907, and IRGACURE OXE. 01, IRGACURE OXE 02, OXE 03, OXE 04, IRGACURE784 (manufactured by BASF), TR-PBG-304, TR-PBG-305, TR-PBG-309 and TR-PBG-314 (manufactured by Tronly), etc. be done.
 これらの光ラジカル重合開始剤は1種あるいは2種以上のものを所望の性能に応じて配合して使用することができる。 One or more of these photoradical polymerization initiators can be blended and used according to the desired performance.
 前記光カチオン重合開始剤としては、光により酸を発生するものを用いることができ、光カチオン重合開始剤として公知のものを用いることができる。
 前記光カチオン重合開始剤としては、オニウム塩化合物、スルホン化合物、スルホン酸エステル化合物、キノンジアジド化合物、スルホンイミド化合物、ジアゾメタン化合物等の公知の化合物が挙げられる。
As the photocationic polymerization initiator, one that generates an acid upon exposure to light can be used, and known photocationic polymerization initiators can be used.
Examples of the photocationic polymerization initiator include known compounds such as onium salt compounds, sulfone compounds, sulfonate ester compounds, quinonediazide compounds, sulfonimide compounds, and diazomethane compounds.
 前記光アニオン重合開始剤としては、光により塩基を発生するものを用いることができ、光アニオン重合開始剤として公知のものを用いることができる。
 前記光アニオン重合開始剤としては、アセトフェノンO-アロイルオキシム(acetophenone O-aroyloxime)、ニフェジピン(nifedipine)等が挙げられる。
As the photoanionic polymerization initiator, those that generate a base upon exposure to light can be used, and known photoanionic polymerization initiators can be used.
Examples of the photoanionic polymerization initiator include acetophenone O-aroyloxime and nifedipine.
(b)熱重合開始剤
 前記熱重合開始剤としては、加熱することにより重合性化合物を重合可能なものであればよく、ラジカル重合開始剤、カチオン重合開始剤、アニオン重合開始剤等を挙げられる。
(b) Thermal polymerization initiator The thermal polymerization initiator may be one capable of polymerizing a polymerizable compound by heating, and examples thereof include radical polymerization initiators, cationic polymerization initiators, anionic polymerization initiators, and the like. .
 前記熱ラジカル重合開始剤としては、加熱によりラジカルを発生するものを用いることができ、熱ラジカル重合開始剤として公知のものを用いることができる。
 前記熱ラジカル重合開始剤としては、アゾ系化合物、過酸化物及び過硫酸塩等を好ましいものとして例示することができる。
As the thermal radical polymerization initiator, those that generate radicals by heating can be used, and known thermal radical polymerization initiators can be used.
Preferred examples of the thermal radical polymerization initiator include azo compounds, peroxides and persulfates.
 前記アゾ系化合物としては、2,2’-アゾビスイソブチロニトリル、2,2’-アゾビス(メチルイソブチレ-ト)、2,2’-アゾビス-2,4-ジメチルバレロニトリル、1,1’-アゾビス(1-アセトキシ-1-フェニルエタン)等が挙げられる。 Examples of the azo compounds include 2,2'-azobisisobutyronitrile, 2,2'-azobis(methyl isobutyrate), 2,2'-azobis-2,4-dimethylvaleronitrile, 1,1' -azobis(1-acetoxy-1-phenylethane) and the like.
 過酸化物としては、ベンゾイルパーオキサイド、ジ-t-ブチルベンゾイルパーオキサイド、t-ブチルパーオキシピバレート及びジ(4-t-ブチルシクロヘキシル)パーオキシジカーボネート等が挙げられる。 Examples of peroxides include benzoyl peroxide, di-t-butylbenzoyl peroxide, t-butylperoxypivalate and di(4-t-butylcyclohexyl)peroxydicarbonate.
 前記過硫酸塩としては、過硫酸アンモニウム、過硫酸ナトリウム及び過硫酸カリウム等の過硫酸塩等が挙げられる。 Examples of the persulfate include persulfates such as ammonium persulfate, sodium persulfate and potassium persulfate.
 前記熱カチオン重合開始剤としては、加熱によりカチオン種又はルイス酸を発生するものを用いることができ、熱カチオン重合開始剤として公知のものを用いることができる。
 前記熱カチオン重合開始剤としては、具体的には、スルホニウム塩、チオフェニウム塩、チオラニウム塩、ベンジルアンモニウム、ピリジニウム塩及びヒドラジニウム塩等の塩;ジエチレントリアミン、トリエチレントリアミン及びテトラエチレンペンタミン等のポリアルキルポリアミン類;1,2-ジアミノシクロヘキサン、1,4-ジアミノ-3,6-ジエチルシクロヘキサン及びイソホロンジアミン等の脂環式ポリアミン類;m-キシリレンジアミン、ジアミノジフェニルメタン及びジアミノジフェニルスルホン等の芳香族ポリアミン類;前記ポリアミン類と、フェニルグリシジルエーテル、ブチルグリシジルエーテル、ビスフェノールA-ジグリシジルエーテル及びビスフェノールF-ジグリシジルエーテル等のグリシジルエーテル類又はカルボン酸のグリシジルエステル類等の各種エポキシ樹脂とを常法によって反応させることによって製造されるポリエポキシ付加変性物;前記有機ポリアミン類と、フタル酸、イソフタル酸及びダイマー酸等のカルボン酸類とを常法によって反応させることによって製造されるアミド化変性物;前記ポリアミン類とホルムアルデヒド等のアルデヒド類及びフェノール、クレゾール、キシレノール、第三ブチルフェノール及びレゾルシン等の核に少なくとも一個のアルデヒド化反応性場所を有するフェノール類とを常法によって反応させることによって製造されるマンニッヒ化変性物;多価カルボン酸(シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、ドデカン二酸、2-メチルコハク酸、2-メチルアジピン酸、3-メチルアジピン酸、3-メチルペンタン二酸、2-メチルオクタン二酸、3,8-ジメチルデカン二酸、3,7-ジメチルデカン二酸、水添ダイマー酸及びダイマー酸等の脂肪族ジカルボン酸類;フタル酸、テレフタル酸、イソフタル酸及びナフタレンジカルボン酸等の芳香族ジカルボン酸類;シクロヘキサンジカルボン酸等の脂環式ジカルボン酸類;トリメリット酸、トリメシン酸及びひまし油脂肪酸等の三量体等のトリカルボン酸類;ピロメリット酸等のテトラカルボン酸類等)の酸無水物;ジシアンジアミド、イミダゾール類、カルボン酸エステル、スルホン酸エステル及びアミンイミド等が挙げられる。
As the thermal cationic polymerization initiator, those that generate cationic species or Lewis acids by heating can be used, and known thermal cationic polymerization initiators can be used.
Specific examples of the thermal cationic polymerization initiator include salts such as sulfonium salts, thiophenium salts, thiolanium salts, benzylammonium, pyridinium salts and hydrazinium salts; polyalkylpolyamines such as diethylenetriamine, triethylenetriamine and tetraethylenepentamine; alicyclic polyamines such as 1,2-diaminocyclohexane, 1,4-diamino-3,6-diethylcyclohexane and isophoronediamine; aromatic polyamines such as m-xylylenediamine, diaminodiphenylmethane and diaminodiphenylsulfone reaction of the polyamines with various epoxy resins such as glycidyl ethers such as phenylglycidyl ether, butyl glycidyl ether, bisphenol A-diglycidyl ether and bisphenol F-diglycidyl ether or glycidyl esters of carboxylic acid by a conventional method; Polyepoxy addition-modified products produced by reacting; Amidation-modified products produced by reacting the organic polyamines with carboxylic acids such as phthalic acid, isophthalic acid and dimer acid in a conventional manner; and aldehydes such as formaldehyde and phenols having at least one aldehyde-reactive site in the nucleus such as phenol, cresol, xylenol, tertiary-butylphenol and resorcinol in a conventional manner. ; Polyvalent carboxylic acids (oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, dodecanedioic acid, 2-methylsuccinic acid, 2-methyladipic acid, 3- Aliphatic dicarboxylic acids such as methyladipic acid, 3-methylpentanedioic acid, 2-methyloctanedioic acid, 3,8-dimethyldecanedioic acid, 3,7-dimethyldecanedioic acid, hydrogenated dimer acid and dimer acid; Aromatic dicarboxylic acids such as phthalic acid, terephthalic acid, isophthalic acid and naphthalene dicarboxylic acid; Alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid; Tricarboxylic acids such as trimellitic acid, trimesic acid and trimers such as castor oil fatty acid; acid anhydrides of tetracarboxylic acids such as mellitic acid; dicyandiamide, imidazoles, carboxylic acid esters, sulfonic acid esters and amineimides.
 前記熱カチオン重合開始剤としては、市販品を用いることもでき、アデカオプトンCP-77、アデカオプトンCP-66(ADEKA社製)、CI-2639、CI-2624(日本曹達社製)、サンエイドSI-60L、サンエイドSI-80L、サンエイドSI-100L(三新化学工業社製)等が挙げられる。 Commercially available products can be used as the thermal cationic polymerization initiator, such as Adeka Opton CP-77, Adeka Opton CP-66 (manufactured by ADEKA), CI-2639, CI-2624 (manufactured by Nippon Soda Co., Ltd.), and San-Aid SI-60L. , San-Aid SI-80L, San-Aid SI-100L (manufactured by Sanshin Chemical Industry Co., Ltd.), and the like.
 前記熱アニオン重合開始剤としては、熱により塩基を発生するものを用いることができ、熱アニオン重合開始剤として公知のものを用いることができる。
 前記アニオン重合開始剤としては、具体的には、脂肪族アミン系化合物、芳香族アミン系化合物、二級又は三級アミン系化合物、イミダゾール系化合物、ポリメルカプタン系化合物、三フッ化ホウ素-アミン錯体、ジシアンジアミド、有機酸ヒドラジッド等を用いることができる。
As the thermal anionic polymerization initiator, those that generate a base by heat can be used, and known thermal anionic polymerization initiators can be used.
Specific examples of the anionic polymerization initiator include aliphatic amine-based compounds, aromatic amine-based compounds, secondary or tertiary amine-based compounds, imidazole-based compounds, polymercaptan-based compounds, and boron trifluoride-amine complexes. , dicyandiamide, organic acid hydrazides, and the like can be used.
(c)重合開始剤の含有量
 前記重合開始剤の含有量としては、所望の硬化性や感光性を付与できるものであればよく、固形分100質量部中に0.1質量部以上30質量部以下とすることができ、0.3質量部以上10質量部以下であることが好ましい。前記含有量であることで、前記組成物は、感度が良好で硬化物の製造が容易なものとなるからである。
(c) Content of polymerization initiator The content of the polymerization initiator may be any one that can impart desired curability and photosensitivity, and is 0.1 parts by mass or more and 30 parts by mass in 100 parts by mass of solid content parts by mass or less, preferably 0.3 parts by mass or more and 10 parts by mass or less. This is because when the content is within the above range, the composition has good sensitivity and can be easily produced into a cured product.
 前記重合開始剤の含有量としては、所望の硬化性や感光性を付与できるものであればよく、重合性化合物100質量部に対して、0.001質量部以上20質量部以下とすることができ、0.01質量部以上10質量部以下であることが好ましく、0.1質量部以上5質量部以下であることが好ましい。前記含有量であることで、前記組成物は、感度が良好で硬化物の製造が容易なものとなるからである。 The content of the polymerization initiator may be any one that can impart desired curability and photosensitivity, and may be 0.001 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the polymerizable compound. It is preferably 0.01 to 10 parts by mass, and preferably 0.1 to 5 parts by mass. This is because when the content is within the above range, the composition has good sensitivity and can be easily produced into a cured product.
(2)着色剤
 前記着色剤としては、硬化物に所望の着色を付与できるものであればよく、染料及び顔料が挙げられる。
 染料としては、380~1200nmに吸収を有する化合物を用いることができ、アゾ化合物、アントラキノン化合物、インジゴイド化合物、トリアリールメタン化合物、キサンテン化合物、アリザリン化合物、アクリジン化合物、スチルベン化合物、チアゾール化合物、ナフトール化合物、キノリン化合物、ニトロ化合物、インダミン化合物、オキサジン化合物、フタロシアニン化合物、シアニン化合物、ジインモニウム化合物、シアノエテニル化合物、ジシアノスチレン化合物、ローダミン化合物、ペリレン化合物、ポリエンナフトラクタム化合物、クマリン化合物、スクアリリウム化合物、クロコニウム化合物、スピロピラン化合物、スピロオキサジン化合物、メロシアニン化合物、オキソノール化合物、スチリル化合物、ピリリウム化合物、ローダニン化合物、オキサゾロン化合物、フタルイミド化合物、シンノリン化合物、ナフトキノン化合物、アザアントラキノン化合物、ポルフィリン化合物、アザポルフィリン化合物、ピロメテン化合物、キナクリドン化合物、ジケトピロロピロール化合物、インジゴ化合物、アクリジン化合物、アジン化合物、アゾメチン化合物、アニリン化合物、キナクリドン化合物、キノフタロン化合物、キノンイミン化合物、イリジウム錯体化合物、ユーロピウム錯体化合物等の染料等が挙げられ、これらは複数を混合して用いてもよい。
(2) Colorant The colorant may be any one that can impart desired coloration to the cured product, and includes dyes and pigments.
As the dye, compounds having absorption at 380 to 1200 nm can be used, and azo compounds, anthraquinone compounds, indigoid compounds, triarylmethane compounds, xanthene compounds, alizarin compounds, acridine compounds, stilbene compounds, thiazole compounds, naphthol compounds, Quinoline compounds, nitro compounds, indamine compounds, oxazine compounds, phthalocyanine compounds, cyanine compounds, diimmonium compounds, cyanoethenyl compounds, dicyanostyrene compounds, rhodamine compounds, perylene compounds, polyenenaphtlactam compounds, coumarin compounds, squarylium compounds, croconium compounds, spiropyran compounds , spirooxazine compounds, merocyanine compounds, oxonol compounds, styryl compounds, pyrylium compounds, rhodanine compounds, oxazolone compounds, phthalimide compounds, cinnoline compounds, naphthoquinone compounds, azaanthraquinone compounds, porphyrin compounds, azaporphyrin compounds, pyrromethene compounds, quinacridone compounds, di Examples include dyes such as ketopyrrolopyrrole compounds, indigo compounds, acridine compounds, azine compounds, azomethine compounds, aniline compounds, quinacridone compounds, quinophthalone compounds, quinoneimine compounds, iridium complex compounds, europium complex compounds, and the like, and these are mixed. may be used.
 顔料としては、無機顔料及び有機顔料を用いることができ、ニトロソ化合物、ニトロ化合物、アゾ化合物、ジアゾ化合物、キサンテン化合物、キノリン化合物、アントラキノン化合物、クマリン化合物、フタロシアニン化合物、イソインドリノン化合物、イソインドリン化合物、キナクリドン化合物、アンタンスロン化合物、ペリノン化合物、ペリレン化合物、ジケトピロロピロール化合物、チオインジゴ化合物、ジオキサジン化合物、トリフェニルメタン化合物、キノフタロン化合物、ナフタレンテトラカルボン酸;アゾ染料、シアニン染料の金属錯体化合物;レーキ顔料;ファーネス法、チャンネル法、サーマル法によって得られるカーボンブラック、或いはアセチレンブラック、ケッチェンブラック又はランプブラック等のカーボンブラック;前記カーボンブラックをエポキシ樹脂で調整、被覆したもの、前記カーボンブラックを予め溶媒中で樹脂により分散処理し、20~200mg/gの樹脂を吸着させたもの、前記カーボンブラックを酸性又はアルカリ性表面処理したもの、平均粒径が8nm以上でDBP吸油量が90ml/100g以下のもの、950℃における揮発分中のCO、COから算出した全酸素量が、カーボンブラックの表面積100m当たり9mg以上であるもの;黒鉛、黒鉛化カーボンブラック、活性炭、炭素繊維、カーボンナノチューブ、カーボンマイクロコイル、カーボンナノホーン、カーボンエアロゲル、フラーレン;アニリンブラック、ピグメントブラック7、チタンブラック;疎水性樹脂、酸化クロム緑、ミロリブルー、コバルト緑、コバルト青、マンガン系、フェロシアン化物、リン酸塩群青、紺青、ウルトラマリン、セルリアンブルー、ピリジアン、エメラルドグリーン、硫酸鉛、黄色鉛、亜鉛黄、べんがら(赤色酸化鉄(III))、カドミウム赤、合成鉄黒、アンバー等の無機含量又は有機顔料を用いることができる。これらの顔料は複数を混合して用いることができる。 As pigments, inorganic pigments and organic pigments can be used, and nitroso compounds, nitro compounds, azo compounds, diazo compounds, xanthene compounds, quinoline compounds, anthraquinone compounds, coumarin compounds, phthalocyanine compounds, isoindolinone compounds, and isoindoline compounds. , quinacridone compounds, anthurone compounds, perinone compounds, perylene compounds, diketopyrrolopyrrole compounds, thioindigo compounds, dioxazine compounds, triphenylmethane compounds, quinophthalone compounds, naphthalenetetracarboxylic acids; azo dyes, metal complex compounds of cyanine dyes; lake pigments Carbon black obtained by furnace method, channel method, thermal method, or carbon black such as acetylene black, ketjen black or lamp black; The carbon black prepared and coated with an epoxy resin, the carbon black in a solvent in advance 20 to 200 mg/g of resin is adsorbed by dispersion treatment with a resin, the carbon black is subjected to acid or alkaline surface treatment, the average particle size is 8 nm or more and the DBP oil absorption is 90 ml / 100 g or less, Graphite, graphitized carbon black, activated carbon, carbon fiber, carbon nanotubes, carbon microcoils, in which the total oxygen content calculated from CO and CO2 in the volatile matter at 950°C is 9 mg or more per 100 m 2 of carbon black surface area. , Carbon nanohorn, Carbon airgel, Fullerene; Aniline black, Pigment black 7, Titanium black; Hydrophobic resin, Chromium oxide green, Miloli blue, Cobalt green, Cobalt blue, Manganese series, Ferrocyanide, Phosphate ultramarine blue, Prussian blue, Ultra Inorganic content or organic pigments such as marine, cerulean blue, pyridian, emerald green, lead sulfate, yellow lead, zinc yellow, red iron oxide (iron(III) oxide red), cadmium red, synthetic iron black, amber and the like can be used. A plurality of these pigments can be mixed and used.
 前記無機顔料又は有機顔料としては、市販の顔料を用いることもでき、ピグメントレッド1、2、3、9、10、14、17、22、23、31、38、41、48、49、88、90、97、112、119、122、123、144、149、166、168、169、170、171、177、179、180、184、185、192、200、202、209、215、216、217、220、223、224、226、227、228、240、254;ピグメントオレンジ13、31、34、36、38、43、46、48、49、51、52、55、59、60、61、62、64、65、71;ピグメントイエロー1、3、12、13、14、16、17、20、24、55、60、73、81、83、86、93、95、97、98、100、109、110、113、114、117、120、125、126、127、129、137、138、139、147、148、150、151、152、153、154、166、168、175、180、185;ピグメントグリーン7、10、36;ピグメントブルー15、15:1、15:2、15:3、15:4、15:5、15:6、22、24、56、60、61、62、64;ピグメントバイオレット1、19、23、27、29、30、32、37、40、50等が挙げられる。 Commercially available pigments can also be used as the inorganic pigments or organic pigments. 90, 97, 112, 119, 122, 123, 144, 149, 166, 168, 169, 170, 171, 177, 179, 180, 184, 185, 192, 200, 202, 209, 215, 216, 217, Pigment Orange 13, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, Pigment Yellow 1, 3, 12, 13, 14, 16, 17, 20, 24, 55, 60, 73, 81, 83, 86, 93, 95, 97, 98, 100, 109; Pigment Green Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:5, 15:6, 22, 24, 56, 60, 61, 62, 64; Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 50 and the like.
 前記着色剤の含有量は、組成物の固形分100質量部中に0.01質量部以上50質量部以下とすることができる。 The content of the coloring agent can be 0.01 parts by mass or more and 50 parts by mass or less per 100 parts by mass of the solid content of the composition.
(3)溶剤
 前記溶剤としては、前記の各成分を溶解又は分散し得るものであればよく、メチルエチルケトン、メチルアミルケトン、ジエチルケトン、アセトン、メチルイソプロピルケトン、メチルイソブチルケトン、シクロヘキサノン、2-ヘプタノン等のケトン類;エチルエーテル、ジオキサン、テトラヒドロフラン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、ジプロピレングリコールジメチルエーテル等のエーテル系溶媒;酢酸メチル、酢酸エチル、酢酸-n-プロピル、酢酸イソプロピル、酢酸n-ブチル、酢酸シクロヘキシル、乳酸エチル、コハク酸ジメチル、テキサノール等のエステル系溶媒;エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル等のセロソルブ系溶媒;メタノール、エタノール、イソ-又はn-プロパノール、イソ-又はn-ブタノール、アミルアルコール、ジアセトンアルコール等のアルコール系溶媒;エチレングリコールモノメチルアセテート、エチレングリコールモノエチルアセテート、プロピレングリコール-1-モノメチルエーテル-2-アセテート(PGMEA)、ジプロピレングリコールモノメチルエーテルアセテート、3-メトキシブチルアセテート、エトキシエチルプロピオネート、1-t-ブトキシ-2-プロパノール、3-メトキシブチルアセテート、シクロヘキサノールアセテート等のエーテルエステル系溶媒;ベンゼン、トルエン、キシレン等のBTX系溶媒;ヘキサン、ヘプタン、オクタン、シクロヘキサン等の脂肪族炭化水素系溶媒;テレピン油、D-リモネン、ピネン等のテルペン系炭化水素油;ミネラルスピリット、スワゾール#310(コスモ松山石油(株))、ソルベッソ#100(エクソン化学(株))等のパラフィン系溶媒;四塩化炭素、クロロホルム、トリクロロエチレン、塩化メチレン、1,2-ジクロロエタン等のハロゲン化脂肪族炭化水素系溶媒;クロロベンゼン等のハロゲン化芳香族炭化水素系溶媒;カルビトール系溶媒、アニリン、トリエチルアミン、ピリジン、酢酸、アセトニトリル、二硫化炭素、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチルピロリドン、ジメチルスルホキシド、水等が挙げられ、これらの溶媒は1種又は2種以上の混合溶媒として使用することができる。
(3) Solvent Any solvent can be used as long as it is capable of dissolving or dispersing the above components, such as methyl ethyl ketone, methyl amyl ketone, diethyl ketone, acetone, methyl isopropyl ketone, methyl isobutyl ketone, cyclohexanone, and 2-heptanone. ketones; ether solvents such as ethyl ether, dioxane, tetrahydrofuran, 1,2-dimethoxyethane, 1,2-diethoxyethane, dipropylene glycol dimethyl ether; methyl acetate, ethyl acetate, n-propyl acetate, isopropyl acetate , n-butyl acetate, cyclohexyl acetate, ethyl lactate, dimethyl succinate, ester solvents such as texanol; ethylene glycol monomethyl ether, cellosolve solvents such as ethylene glycol monoethyl ether; methanol, ethanol, iso- or n-propanol, Alcoholic solvents such as iso- or n-butanol, amyl alcohol, diacetone alcohol; ethylene glycol monomethyl acetate, ethylene glycol monoethyl acetate, propylene glycol-1-monomethyl ether-2-acetate (PGMEA), dipropylene glycol monomethyl ether Ether ester solvents such as acetate, 3-methoxybutyl acetate, ethoxyethyl propionate, 1-t-butoxy-2-propanol, 3-methoxybutyl acetate and cyclohexanol acetate; BTX solvents such as benzene, toluene and xylene Aliphatic hydrocarbon solvents such as hexane, heptane, octane, and cyclohexane; Terpene hydrocarbon oils such as turpentine oil, D-limonene, and pinene; Mineral spirit, Swasol #310 (Cosmo Matsuyama Oil Co., Ltd.), Solvesso # Paraffinic solvents such as 100 (Exxon Chemical Co., Ltd.); Halogenated aliphatic hydrocarbon solvents such as carbon tetrachloride, chloroform, trichlorethylene, methylene chloride, 1,2-dichloroethane; Halogenated aromatic hydrocarbons such as chlorobenzene system solvent; carbitol solvent, aniline, triethylamine, pyridine, acetic acid, acetonitrile, carbon disulfide, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethylsulfoxide, water, etc. These solvents can be used singly or as a mixed solvent of two or more.
 溶剤の含有量は、前記組成物の用途等に応じて適宜設定することができるが、好ましくは前記組成物中の溶剤以外の成分(固形分)の量が1質量%以上99質量%以下となる量であり、なかでも、10質量%以上90質量%以下であることが好ましく、特に、30質量%以上70質量%以下となる量であることが好ましい。前記含有量が上述の範囲であることで、前記組成物は、塗工性等に優れたものとなるからである。 The content of the solvent can be appropriately set according to the use of the composition, etc., but preferably the amount of components (solid content) other than the solvent in the composition is 1% by mass or more and 99% by mass or less. In particular, it is preferably 10% by mass or more and 90% by mass or less, and particularly preferably 30% by mass or more and 70% by mass or less. This is because when the content is within the above range, the composition is excellent in coatability and the like.
(4)連鎖移動剤及び増感剤
 前記連鎖移動剤、増感剤としては、前記組成物の感度等を調整できるものであればよく、一般的に硫黄原子含有化合物が用いられる。例えば、チオグリコール酸、チオリンゴ酸、チオサリチル酸、2-メルカプトプロピオン酸、3-メルカプトプロピオン酸、3-メルカプト酪酸、N-(2-メルカプトプロピオニル)グリシン、2-メルカプトニコチン酸、3-[N-(2-メルカプトエチル)カルバモイル]プロピオン酸、3-[N-(2-メルカプトエチル)アミノ]プロピオン酸、N-(3-メルカプトプロピオニル)アラニン、2-メルカプトエタンスルホン酸、3-メルカプトプロパンスルホン酸、4-メルカプトブタンスルホン酸、ドデシル(4-メチルチオ)フェニルエーテル、2-メルカプトエタノール、3-メルカプト-1,2-プロパンジオール、1-メルカプト-2-プロパノール、3-メルカプト-2-ブタノール、メルカプトフェノール、2-メルカプトエチルアミン、2-メルカプトイミダゾール、2-メルカプトベンゾイミダゾール、2-メルカプト-3-ピリジノール、2-メルカプトベンゾチアゾール、メルカプト酢酸、トリメチロールプロパントリス(3-メルカプトプロピオネート)、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)等のメルカプト化合物、該メルカプト化合物を酸化して得られるジスルフィド化合物、ヨード酢酸、ヨードプロピオン酸、2-ヨードエタノール、2-ヨードエタンスルホン酸、3-ヨードプロパンスルホン酸等のヨード化アルキル化合物、トリメチロールプロパントリス(3-メルカプトイソブチレート)、ブタンジオールビス(3-メルカプトイソブチレート)、ヘキサンジチオール、デカンジチオール、1,4-ジメチルメルカプトベンゼン、ブタンジオールビスチオプロピオネート、ブタンジオールビスチオグリコレート、エチレングリコールビスチオグリコレート、トリメチロールプロパントリスチオグリコレート、ブタンジオールビスチオプロピオネート、トリメチロールプロパントリスチオプロピオネート、トリメチロールプロパントリスチオグリコレート、ペンタエリスリトールテトラキスチオプロピオネート、ペンタエリスリトールテトラキスチオグリコレート、トリスヒドロキシエチルトリスチオプロピオネート、下記化合物No.C1、トリメルカプトプロピオン酸トリス(2-ヒドロキシエチル)イソシアヌレート等の脂肪族多官能チオール化合物、昭和電工社製カレンズMT BD1、PE1、NR1等が挙げられる。
(4) Chain Transfer Agent and Sensitizer As the chain transfer agent and sensitizer, any one can be used as long as it can adjust the sensitivity and the like of the composition, and sulfur atom-containing compounds are generally used. For example, thioglycolic acid, thiomalic acid, thiosalicylic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, N-(2-mercaptopropionyl)glycine, 2-mercaptonicotinic acid, 3-[N- (2-mercaptoethyl)carbamoyl]propionic acid, 3-[N-(2-mercaptoethyl)amino]propionic acid, N-(3-mercaptopropionyl)alanine, 2-mercaptoethanesulfonic acid, 3-mercaptopropanesulfonic acid , 4-mercaptobutanesulfonic acid, dodecyl (4-methylthio) phenyl ether, 2-mercaptoethanol, 3-mercapto-1,2-propanediol, 1-mercapto-2-propanol, 3-mercapto-2-butanol, mercapto Phenol, 2-mercaptoethylamine, 2-mercaptoimidazole, 2-mercaptobenzimidazole, 2-mercapto-3-pyridinol, 2-mercaptobenzothiazole, mercaptoacetic acid, trimethylolpropane tris (3-mercaptopropionate), pentaerythritol Mercapto compounds such as tetrakis(3-mercaptopropionate), disulfide compounds obtained by oxidation of the mercapto compounds, iodoacetic acid, iodopropionic acid, 2-iodoethanol, 2-iodoethanesulfonic acid, 3-iodopropanesulfone Iodinated alkyl compounds such as acids, trimethylolpropane tris (3-mercaptoisobutyrate), butanediol bis (3-mercaptoisobutyrate), hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butanediol bis Thiopropionate, butanediol bisthioglycolate, ethylene glycol bisthioglycolate, trimethylolpropane tristhioglycolate, butanediol bisthiopropionate, trimethylolpropane tristhiopropionate, trimethylolpropane tristhioglycolate pentaerythritol tetrakisthiopropionate, pentaerythritol tetrakisthioglycolate, trishydroxyethyl tristhiopropionate, compound no. Aliphatic polyfunctional thiol compounds such as C1 and trimercaptopropionate tris(2-hydroxyethyl)isocyanurate, Showa Denko Karenz MT BD1, PE1, NR1 and the like.
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
(5)界面活性剤
 前記界面活性剤としては、組成物の分散安定性、塗工性等を改善できるものを用いることができ、パーフルオロアルキルリン酸エステル、パーフルオロアルキルカルボン酸塩等のフッ素界面活性剤、高級脂肪酸アルカリ塩、アルキルスルホン酸塩、アルキル硫酸塩等のアニオン系界面活性剤、高級アミンハロゲン酸塩、第四級アンモニウム塩等のカチオン系界面活性剤、ポリエチレングリコールアルキルエーテル、ポリエチレングリコール脂肪酸エステル、ソルビタン脂肪酸エステル、脂肪酸モノグリセリド等の非イオン界面活性剤、両性界面活性剤、シリコーン系界面活性剤等の界面活性剤を用いることができ、これらは組み合わせて用いてもよい。
(5) Surfactant As the surfactant, those capable of improving the dispersion stability and coatability of the composition can be used. Surfactants, anionic surfactants such as higher fatty acid alkali salts, alkylsulfonates and alkylsulfates, cationic surfactants such as higher amine halides and quaternary ammonium salts, polyethylene glycol alkyl ethers, polyethylene Surfactants such as nonionic surfactants such as glycol fatty acid esters, sorbitan fatty acid esters and fatty acid monoglycerides, amphoteric surfactants and silicone surfactants can be used, and these may be used in combination.
(6)シランカップリング剤
 前記シランカップリング剤は、ガラスなどの無機材料と化学結合する反応基と、合成樹脂などの有機材料と化学結合する反応基とを有するシラン化合物であり、硬化物の密着性等を改善できるものを用いることができる。シランカップリング剤としては、信越化学社製シランカップリング剤が挙げられ、その中でもKBE-9007、KBM-502、KBE-403等、イソシアネート基、メタクリロイル基、エポキシ基を有するシランカップリング剤が好適に用いられる。
(6) Silane coupling agent The silane coupling agent is a silane compound having a reactive group that chemically bonds with an inorganic material such as glass and a reactive group that chemically bonds with an organic material such as a synthetic resin. A material capable of improving adhesion and the like can be used. Examples of the silane coupling agent include silane coupling agents manufactured by Shin-Etsu Chemical Co., Ltd. Among them, silane coupling agents having an isocyanate group, a methacryloyl group, an epoxy group, such as KBE-9007, KBM-502, and KBE-403, are preferred. used for
(7)メラミン化合物
 前記メラミン化合物としては、硬化性を改善できるものを用いることができ、(ポリ)メチロールメラミン、(ポリ)メチロールグリコールウリル、(ポリ)メチロールベンゾグアナミン、(ポリ)メチロールウレア等の窒素化合物中の活性メチロール基(CHOH基)の全部又は一部(少なくとも2つ)がアルキルエーテル化された化合物が挙げられる。ここで、アルキルエーテルを構成するアルキル基としては、メチル基、エチル基又はブチル基が挙げられ、互いに同一である場合があるし、異なる場合がある。また、アルキルエーテル化されていないメチロール基は、一分子内で自己縮合していてもよく、二分子間で縮合して、その結果オリゴマー成分が形成されていてもよい。具体的には、ヘキサメトキシメチルメラミン、ヘキサブトキシメチルメラミン、テトラメトキシメチルグリコールウリル、テトラブトキシメチルグリコールウリル等を用いることができる。これらのなかでも、ヘキサメトキシメチルメラミン、ヘキサブトキシメチルメラミン等のアルキルエーテル化されたメラミンが好ましい。
(7) Melamine compound As the melamine compound, those capable of improving curability can be used, and nitrogen such as (poly)methylolmelamine, (poly)methylolglycoluril, (poly)methylolbenzoguanamine, (poly)methylolurea, etc. Compounds in which all or part (at least two) of the active methylol groups (CH 2 OH groups) in the compound are alkyl-etherified. Here, the alkyl group constituting the alkyl ether includes a methyl group, an ethyl group and a butyl group, which may be the same or different. In addition, methylol groups that are not alkyl-etherified may be self-condensed within one molecule, or may be condensed between two molecules to form an oligomer component. Specifically, hexamethoxymethylmelamine, hexabutoxymethylmelamine, tetramethoxymethylglycoluril, tetrabutoxymethylglycoluril and the like can be used. Among these, alkyl-etherified melamine such as hexamethoxymethylmelamine and hexabutoxymethylmelamine are preferred.
(8)酸触媒及び塩基触媒
 酸触媒及び塩基触媒は、化合物Aが有するフェノール性水酸基の保護基Rの脱離を促進可能なものである。
 前記組成物が酸触媒又は塩基触媒を含むことで、酸触媒及び塩基触媒を含まない場合と比較して、より低温で、前記化合物A中の保護基Rを脱離することが可能となる。
(8) Acid Catalyst and Base Catalyst The acid catalyst and base catalyst are capable of promoting elimination of the protective group R9 of the phenolic hydroxyl group of compound A.
When the composition contains an acid catalyst or a base catalyst, it becomes possible to eliminate the protective group R9 in the compound A at a lower temperature than when the composition does not contain an acid catalyst or a base catalyst. .
 前記酸触媒としては、塩酸、リン酸、硫酸等の無機酸類;ギ酸、酢酸、シュウ酸、クエン酸、メタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸、リン酸モノイソプロピル等の有機酸類が挙げられる。 Examples of the acid catalyst include inorganic acids such as hydrochloric acid, phosphoric acid and sulfuric acid; organic acids such as formic acid, acetic acid, oxalic acid, citric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid and monoisopropyl phosphate. mentioned.
 前記塩基触媒としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、アンモニア等の無機塩基類;トリメチルアミン、トリエチルアミン、モノエタノールアミン、ジエタノールアミン等のアミン化合物(有機塩基)類等が挙げられる。 Examples of the base catalyst include inorganic bases such as sodium hydroxide, potassium hydroxide, lithium hydroxide, and ammonia; amine compounds (organic bases) such as trimethylamine, triethylamine, monoethanolamine, and diethanolamine.
 前記酸触媒及び塩基触媒の含有量は、それぞれの種類及び所望の脱離温度等に応じて適宜設定されるものであるが、化合物A及び化合物Bの合計100質量部に対して0.1質量部以上10質量部以下とすることができる。 The content of the acid catalyst and the base catalyst is appropriately set according to the type of each and the desired desorption temperature, etc. parts or more and 10 parts by mass or less.
(9)その他
 前記組成物は、前記その他の成分として、更に必要に応じて、p-アニソール、ハイドロキノン、ピロカテコール、t-ブチルカテコール、フェノチアジン等の熱重合抑制剤;可塑剤;接着促進剤;充填剤;消泡剤;レベリング剤;表面調整剤;フェノール系酸化防止剤、ホスファイト系酸化防止剤、チオエーテル系酸化防止剤等の上述の化合物B以外の酸化防止剤;上述の化合物A以外の紫外線吸収剤;分散助剤;凝集防止剤;触媒;効果促進剤;架橋剤;増粘剤等の添加剤を含むことができる。
 前記その他の成分の合計の含有量は、前記組成物の固形分100質量部中に30質量部以下とすることができる。
(9) Others The composition further includes, as the other components, p-anisole, hydroquinone, pyrocatechol, t-butylcatechol, a thermal polymerization inhibitor such as phenothiazine; a plasticizer; an adhesion promoter; Filler; antifoaming agent; leveling agent; surface conditioner; Additives such as ultraviolet absorbers; dispersing aids; aggregation inhibitors; catalysts; effect accelerators; cross-linking agents;
The total content of the other components may be 30 parts by mass or less per 100 parts by mass of the solid content of the composition.
 前記組成物は、所望の耐久性を有する硬化物を得ることができ、硬化物を容易に製造できる範囲で、化合物A及び化合物B以外に、フェノール系酸化防止剤及び紫外線吸収剤を含むものであってもよいが、実質的に含まないことが好ましい。
 ここで、実質的に含まないとは、組成物の固形分100質量部中に1質量部以下であることを意味し、0.01質量部以下であることが好ましく、0.005質量部以下であることがより好ましく、0.001質量部以下であることがさらに好ましく、特に0.0001質量部以下であることが好ましい。
The composition contains a phenolic antioxidant and an ultraviolet absorber in addition to the compound A and the compound B to the extent that a cured product having desired durability can be obtained and the cured product can be easily produced. Although it may be present, it is preferably not substantially included.
Here, "substantially free" means that it is 1 part by mass or less in 100 parts by mass of the solid content of the composition, preferably 0.01 part by mass or less, and 0.005 part by mass or less. is more preferably 0.001 parts by mass or less, and particularly preferably 0.0001 parts by mass or less.
 前記フェノール系酸化防止剤及び紫外線吸収剤の含有量としては、前記化合物A及び化合物Bの合計100質量部に対して1質量部以下であることが好ましく、0.01質量部以下であることがより好ましく、0.005質量部以下であることがさらに好ましく、0.001質量部以下であることが特に好ましく、0.0001質量部以下であることが最も好ましい。耐久性に優れた硬化物を得ることが可能となるからである。 The content of the phenolic antioxidant and the ultraviolet absorber is preferably 1 part by mass or less with respect to a total of 100 parts by mass of the compound A and the compound B, and may be 0.01 part by mass or less. It is more preferably 0.005 parts by mass or less, particularly preferably 0.001 parts by mass or less, and most preferably 0.0001 parts by mass or less. This is because it becomes possible to obtain a cured product having excellent durability.
 前記紫外線吸収剤としては、フェノール性水酸基を有する紫外線吸収剤を挙げられる。具体的には、特開2017-008221号公報に記載の2-ヒドロキシベンゾフェノン類、2-(2’-ヒドロキシフェニル)ベンゾトリアゾール類、ベンゾエート類、トリアリールトリアジン類等、特開2002-97224号公報に記載のベンゾトリアゾール系紫外線吸収剤、ベンゾフェノン系紫外線吸収剤等が挙げられる。 Examples of the ultraviolet absorber include ultraviolet absorbers having a phenolic hydroxyl group. Specifically, 2-hydroxybenzophenones, 2-(2′-hydroxyphenyl)benzotriazoles, benzoates, triaryltriazines, etc. described in JP-A-2017-008221, JP-A-2002-97224 benzotriazole-based UV absorbers, benzophenone-based UV absorbers, and the like described in .
 前記フェノール系酸化防止剤としては、フェノール性水酸基を有する酸化防止剤として一般的に用いられるものが挙げられる。具体的には、特開平6-179798号公報、特開平11-71355号公報、特開2002-97224号公報等に記載のフェノール系酸化防止剤、特開平7-109380号公報に記載のアルキル置換フェノール系酸化防止剤等が挙げられる。 Examples of the phenolic antioxidant include those commonly used as antioxidants having a phenolic hydroxyl group. Specifically, JP-A-6-179798, JP-A-11-71355, phenol-based antioxidants described in JP-A-2002-97224, etc., alkyl substitution described in JP-A-7-109380 Examples include phenolic antioxidants.
(IV)組成物
 前記組成物の粘度は、塗工性を有するものとする観点からは、200mPa・s以下とすることができ、1mPa・s以上200mPa・s以下とすることができる。前記組成物は、塗工性に優れるからである。
 前記粘度は、JIS Z 8803:2011に準じて、回転式粘度計(例えば、アントンパール社製、Physica MCR301等)を用いて25℃で測定される値のことを指す。
(IV) Composition The viscosity of the composition can be 200 mPa·s or less, and can be 1 mPa·s or more and 200 mPa·s or less, from the viewpoint of having coatability. This is because the composition is excellent in coatability.
The viscosity refers to a value measured at 25° C. using a rotational viscometer (such as Physica MCR301 manufactured by Anton Paar) according to JIS Z 8803:2011.
 前記組成物の製造方法は、前記各成分を所望の含有量で配合可能な方法であればよく、前記各成分を同時に添加して混合する方法であってもよく、各成分を順次添加しながら混合する方法であってもよい。 The method for producing the composition may be any method as long as it is possible to blend the respective components in the desired content, and may be a method of adding and mixing the respective components at the same time, while sequentially adding the respective components. A method of mixing may also be used.
 前記組成物は、化合物A及び化合物Bを混合したものであってもよく、更に必要に応じて溶剤を含むものであってもよい。この場合、化合物A及び化合物Bの合計の含有量は、溶剤等の含有量によって異なるものであるが、組成物100質量部中に0.01質量部以上20質量部以下であることが好ましく、0.05質量部以上15質量部以下であることがより好ましく、特に0.1質量部以上10質量部以下であることが好ましい。上述の含有量であることで、化合物A及び化合物Bを組成物中に安定に分散可能だからである。化合物A及び化合物Bをこのような量で含有する組成物は、耐久性に優れた硬化物を製造可能であり、かつ、感度が良好で硬化物の製造が容易となるからである。
 また、上述の通り、組成物は、化合物A、化合物B及び樹脂成分を含むものであってもよく、更に必要に応じてその他の成分を含むものであってもよい。
The composition may be a mixture of compound A and compound B, and may further contain a solvent if necessary. In this case, the total content of compound A and compound B varies depending on the content of the solvent and the like, but it is preferably 0.01 parts by mass or more and 20 parts by mass or less in 100 parts by mass of the composition, It is more preferably 0.05 parts by mass or more and 15 parts by mass or less, and particularly preferably 0.1 parts by mass or more and 10 parts by mass or less. This is because the compound A and the compound B can be stably dispersed in the composition when the content is as described above. This is because a composition containing compound A and compound B in such amounts can produce a cured product having excellent durability, and has good sensitivity, which facilitates the production of a cured product.
Moreover, as described above, the composition may contain the compound A, the compound B and the resin component, and may further contain other components as necessary.
 前記組成物の用途は、熱硬化性塗料、光硬化性塗料或いはワニス、熱硬化性接着剤、光硬化性接着剤、プリント基板、或いはカラーテレビ、PCモニタ、携帯情報端末、デジタルカメラ等のカラー表示の液晶表示パネルにおけるカラーフィルタ、CCDイメージセンサのカラーフィルタ、フォトスペーサ、ブラックカラムスペーサ、プラズマ表示パネル用の電極材料、タッチパネル、タッチセンサー、粉末コーティング、印刷インク、印刷版、接着剤、歯科用組成物、光造形用樹脂、ゲルコート、電子工学用のフォトレジスト、電気メッキレジスト、エッチングレジスト、液状及び乾燥膜の双方、はんだレジスト、種々の表示用途用のカラーフィルタを製造するための或いはプラズマ表示パネル、電気発光表示装置、及びLCDの製造工程において構造を形成するためのレジスト、電気及び電子部品を封入するための組成物、ソルダーレジスト、磁気記録材料、微小機械部品、導波路、光スイッチ、めっき用マスク、エッチングマスク、カラー試験系、ガラス繊維ケーブルコーティング、スクリーン印刷用ステンシル、ステレオリトグラフィによって三次元物体を製造するための材料、ホログラフィ記録用材料、画像記録材料、微細電子回路、脱色材料、画像記録材料のための脱色材料、マイクロカプセルを使用する画像記録材料用の脱色材料、印刷配線板用フォトレジスト材料、UV及び可視レーザー直接画像系用のフォトレジスト材料、プリント回路基板の逐次積層における誘電体層形成に使用するフォトレジスト材料、3D実装用フォトレジスト材料或いは保護膜等の各種の用途に使用することができ、その用途に特に制限はない。 Applications of the composition include thermosetting paints, photocurable paints or varnishes, thermosetting adhesives, photocurable adhesives, printed circuit boards, color televisions, PC monitors, personal digital assistants, digital cameras and the like. Color filters for liquid crystal display panels, color filters for CCD image sensors, photo spacers, black column spacers, electrode materials for plasma display panels, touch panels, touch sensors, powder coatings, printing inks, printing plates, adhesives, dental Compositions, resins for stereolithography, gel coats, photoresists for electronics, electroplating resists, etching resists, both liquid and dry films, solder resists, for making color filters for various display applications or plasma displays. Resists for forming structures in the manufacturing process of panels, electroluminescent displays and LCDs, compositions for encapsulating electrical and electronic components, solder resists, magnetic recording materials, micromechanical components, waveguides, optical switches, Plating masks, etching masks, color test systems, fiberglass cable coatings, screen printing stencils, materials for producing three-dimensional objects by stereolithography, holographic recording materials, image recording materials, microelectronic circuits, bleaching materials , decolorizing materials for image recording materials, decolorizing materials for image recording materials using microcapsules, photoresist materials for printed wiring boards, photoresist materials for UV and visible laser direct imaging systems, sequential lamination of printed circuit boards It can be used for various applications such as a photoresist material used for forming a dielectric layer in , a photoresist material for 3D packaging, or a protective film, and there is no particular limitation on the application.
 また、前記用途としては、製品としての使用時等に耐久性が要求される用途に限定されず、製造過程において紫外線照射等を受ける部材にも好適に用いることができる。製造過程において紫外線照射等を受ける部材としては、表面の濡れ性向上、密着性向上等の表面改質を図るために、紫外線等の照射を受ける部材が挙げられる。 In addition, the application is not limited to applications that require durability when used as a product, and can be suitably used for members that are exposed to ultraviolet irradiation during the manufacturing process. Examples of the member that is irradiated with ultraviolet rays or the like in the manufacturing process include members that are irradiated with ultraviolet rays or the like in order to improve surface wettability, adhesion, or the like.
 上述の濡れ性向上、密着性向上等が要求される部材としては、他の部材と積層される部材を挙げることができ、例えば、プラズマ表示パネル、有機エレクトロルミネッセンス表示装置、液晶表示装置等の各種画像表示、タッチパネル等の各種センサ、回路基板等を構成する部材としてカラーフィルタ、フォトスペーサ、輝度向上板、導光板、TFT基板、配向膜、液晶層、絶縁膜、スピーカーなどの音響素子、撮像用レンズ、キーパッド、HDD用磁気ヘッドなどの製造過程での表面改質や部材の劣化防止が要求される部材が挙げられる。 Examples of members that require improved wettability, improved adhesion, and the like include members that are laminated with other members. Color filters, photo spacers, brightness enhancement plates, light guide plates, TFT substrates, alignment films, liquid crystal layers, insulating films, acoustic elements such as speakers, and imaging devices Examples include members that require surface modification and prevention of member deterioration during the manufacturing process, such as lenses, keypads, and magnetic heads for HDDs.
 上述の製造過程での表面改質や部材の劣化防止が要求される部材としては、接着剤を介して他の部材と積層される部材、塗料等により他の部材により被覆される部材も挙げることができ、例えば、自動車、航空機の内外装部材等の運搬機器、冷蔵庫、洗濯機等の家電製品、住宅建材等の各種用途の構成部材が挙げられる。 Examples of members that require surface modification and prevention of member deterioration during the manufacturing process include members that are laminated with other members via an adhesive, and members that are coated with other members with paint or the like. For example, it can be used as a structural member for various purposes such as transportation equipment such as interior and exterior members of automobiles and aircraft, home appliances such as refrigerators and washing machines, and housing building materials.
 また、基材上にパターン状の部材を形成した後、露出する基材の表面改質等のために基材と共に前記部材に対して紫外線照射等を実施する場合がある。前記用途としては、このような製造過程において表面改質等が要求される部材と共に用いられる部材にも好ましく用いることができる。前記用途としては、プラスチックフィルムやガラス、シリコンウエハー、各種エンジニアリングプラスチック、光学レンズ、金属表面、めっき、セラミック、金型などの表面洗浄や表面改質などが要求される部材と共に用いられる部材等が挙げられる。 In addition, after forming a patterned member on the base material, the exposed base material may be subjected to ultraviolet irradiation or the like in order to modify the surface of the exposed base material. As for the above applications, it can also be preferably used for members that are used together with members that require surface modification or the like in the manufacturing process. Examples of the applications include plastic films, glass, silicon wafers, various engineering plastics, optical lenses, metal surfaces, plating, ceramics, and members used together with members requiring surface cleaning and surface modification such as molds. be done.
 前記用途としては、なかでも、化合物A及び化合物Bは分散安定性に優れることで、その添加量の増加が容易であるとの観点からは、薄膜部材の製造に用いられることが好ましい。薄膜部材は、膜厚が100μm以下の部材とすることができ、50μm以下であることが好ましく、特に20μm以下であることが好ましい。 Among the above-mentioned uses, compound A and compound B are preferably used in the production of thin film members from the viewpoint that their addition amount can be easily increased due to their excellent dispersion stability. The thin film member can be a member having a film thickness of 100 μm or less, preferably 50 μm or less, particularly preferably 20 μm or less.
B.硬化物
 次に、本発明の硬化物について説明する。
 本発明の硬化物は、上述の組成物のうち、重合性化合物を含む組成物の硬化物であることを特徴とするものである。より具体的には、本発明の硬化物は、前記化合物A、前記化合物B及び前記重合性化合物を含む組成物の硬化物である。
 前記硬化物は、上述の組成物を用いているため感度が良好で製造が容易であり、耐久性に優れるものである。
B. Cured Product Next, the cured product of the present invention will be described.
The cured product of the present invention is characterized by being a cured product of the above composition containing a polymerizable compound. More specifically, the cured product of the present invention is a cured product of a composition containing the compound A, the compound B and the polymerizable compound.
Since the above-described composition is used, the cured product has good sensitivity, is easy to produce, and has excellent durability.
 前記硬化物に用いる前記組成物は、前記化合物A、前記化合物B及び前記重合性化合物を含むものであるが、前記化合物A、前記化合物B及び前記重合性化合物以外の成分を含むものであってもよい。例えば、重合性化合物以外の樹脂成分及びその他の成分等を含むことができる。これらの各成分の内容については、前記「A.組成物」の項に記載した通りである。 The composition used for the cured product contains the compound A, the compound B and the polymerizable compound, but may contain components other than the compound A, the compound B and the polymerizable compound. . For example, it may contain a resin component other than the polymerizable compound, other components, and the like. The contents of each of these components are as described in the section "A. Composition".
 前記硬化物は、前記組成物の硬化物であればよく、硬化物に含まれる前記化合物A中の保護基(すなわち、R)は、脱離していてもよく、脱離していなくてもよいが、脱離していることが好ましい。前記硬化物は、優れた耐久性有するものとなるからである。
 なお、保護基が脱離している場合、前記硬化物は、通常、化合物Aから保護基が脱離した化合物を少なくとも有する。また、保護基が脱離している場合、前記硬化物は、化合物Aから脱離した保護基に由来する化合物を含有できる。
The cured product may be a cured product of the composition, and the protective group (that is, R 9 ) in the compound A contained in the cured product may or may not be eliminated. is preferably eliminated. This is because the cured product has excellent durability.
In addition, when the protective group is eliminated, the cured product usually contains at least a compound in which the protective group is eliminated from the compound A. Moreover, when the protecting group has been eliminated, the cured product can contain a compound derived from the protecting group that has been eliminated from the compound A.
 前記硬化物は、通常、未反応の重合性化合物を含むものである。
 前記硬化物に含まれる重合性化合物の残存率としては、硬化物の用途等に応じて適宜設定されるものであるが、硬化物100質量部に対して10質量部以下であることが好ましく、1質量部以下であることがより好ましい。
The cured product usually contains an unreacted polymerizable compound.
The residual rate of the polymerizable compound contained in the cured product is appropriately set according to the application of the cured product, etc., but is preferably 10 parts by mass or less with respect to 100 parts by mass of the cured product. It is more preferably 1 part by mass or less.
 前記硬化物は、溶剤を実質的に含まないものとすることができる。
 前記硬化物に含まれる溶剤の含有量は、硬化物100質量部中に1質量部以下であることが好ましく、0.5質量部以下であることが好ましい。
The cured product may be substantially solvent-free.
The content of the solvent contained in the cured product is preferably 1 part by mass or less, and preferably 0.5 part by mass or less per 100 parts by mass of the cured product.
 前記硬化物の弾性率は、通常、前記組成物より高いものであり、10-3MPa以上とすることができ、10MPa以上とすることができる。前記弾性率であることで、前記硬化物は、安定的に化合物A及び化合物B等を保持できるからである。
 前記弾性率の上限については、硬化物の用途等に応じて適宜設定できるが、例えば、10MPa以下とすることができる。
 前記弾性率は、圧縮弾性率をいうものであり、JIS K 7181に準拠して、23℃で、測定した値である。例えば、一辺の長さが6mmの立方体の試験片を作成又は切り出したものを測定サンプルとして、JIS K 7181に準じ、試験速度1±0.2mm/分の条件で測定することができる。
The elastic modulus of the cured product is usually higher than that of the composition, and can be 10 −3 MPa or more, and can be 10 MPa or more. This is because the cured product can stably retain the compound A, the compound B, and the like with the above elastic modulus.
The upper limit of the elastic modulus can be appropriately set depending on the intended use of the cured product, and can be, for example, 10 6 MPa or less.
The elastic modulus refers to the compression elastic modulus, and is a value measured at 23° C. according to JIS K 7181. For example, a cubic test piece with a side length of 6 mm is prepared or cut out as a measurement sample, and measurement can be performed at a test speed of 1±0.2 mm/min according to JIS K 7181.
 前記硬化物の平面視形状は、前記硬化物の用途等に応じて適宜設定することができ、例えば、ドット状、ライン状等のパターン状とすることができる。
 前記硬化物の厚みは、前記硬化物の用途等に応じて適宜設定することができ、化合物A及び化合物Bは分散安定性に優れることで、その添加量の増加が容易であるとの観点からは、薄膜であることが好ましく、0.1μm以上100μm以下とすることができ、50μm以下であることが好ましく、20μm以下であることがより好ましく、特に10μm以下であることが好ましい。
The shape of the cured product in plan view can be appropriately set according to the intended use of the cured product, and can be, for example, a pattern such as a dot shape or a line shape.
The thickness of the cured product can be appropriately set according to the use of the cured product, and the compound A and the compound B have excellent dispersion stability, so that the amount added can be easily increased. is preferably a thin film, and can be 0.1 μm or more and 100 μm or less, preferably 50 μm or less, more preferably 20 μm or less, and particularly preferably 10 μm or less.
 前記硬化物の用途等については、前記「A.組成物」の項に記載した通りである。 The use of the cured product is as described in the section "A. Composition" above.
 前記硬化物の製造方法としては、前記組成物の硬化物を所望の形状となるように形成できる方法であれば特に限定されるものではない。
 このような製造方法としては、後述する「C.硬化物の製造方法」の項に記載の製造方法が挙げられるため、ここでの説明は省略する。
The method for producing the cured product is not particularly limited as long as it is a method capable of forming the cured product of the composition into a desired shape.
As such a production method, the production method described in the section "C. Production method of cured product" described later can be mentioned, so the explanation here is omitted.
C.硬化物の製造方法
 次に、本発明の硬化物の製造方法について説明する。
 本発明の硬化物の製造方法は、上述の組成物の硬化物を形成する工程を有することを特徴とするものである。より具体的には、本発明の硬化物の製造方法は、前記化合物A、前記化合物B及び前記重合性化合物を含む組成物の硬化物を形成する工程を有するものである。
C. Method for Producing Cured Product Next, the method for producing the cured product of the present invention will be described.
The method for producing a cured product of the present invention is characterized by having a step of forming a cured product of the composition described above. More specifically, the method for producing a cured product of the present invention has a step of forming a cured product of a composition containing the compound A, the compound B and the polymerizable compound.
 前記製造方法は、上述の組成物を用いることにより、硬化物の製造が容易となる。また、前記工程の後に、前記化合物Aに含まれる保護基Rを脱離する工程を実施することで、優れた耐久性を有する硬化物を容易に得ることができる。 The production method facilitates the production of a cured product by using the composition described above. Moreover, a cured product having excellent durability can be easily obtained by performing a step of removing the protecting group R9 contained in the compound A after the above step.
1.硬化物を形成する工程
 前記硬化物を形成する工程は、上述の組成物を成形して硬化する工程である。
 前記組成物の硬化物を形成する方法は、所望の形状の硬化物を形成可能な方法であればよく、組成物に含まれる成分に応じて異なるものである。
1. Step of Forming Cured Product The step of forming the cured product is a step of molding and curing the composition described above.
The method for forming the cured product of the composition may be any method as long as it is capable of forming a cured product having a desired shape, and varies depending on the components contained in the composition.
 前記硬化物を形成する方法としては、組成物が重合性化合物と共に重合開始剤として光重合開始剤を含む場合には、基板上に塗膜として形成した組成物に対して光照射を行い、重合性化合物を重合する方法が挙げられる。 As a method for forming the cured product, when the composition contains a photopolymerization initiator as a polymerization initiator together with a polymerizable compound, the composition formed as a coating film on a substrate is irradiated with light to polymerize. and a method of polymerizing a chemical compound.
 照射する光の波長は、光重合開始剤の種類にもよるが、300nm~450nmとすることができる。光源としては、超高圧水銀、水銀蒸気アーク、カーボンアーク、キセノンアーク等が挙げられる。またレーザー光を用いてもよく、例えば、波長340~430nmの光を含むものを用いることができる。レーザー光の光源としては、アルゴンイオンレーザー、ヘリウムネオンレーザー、YAGレーザー、及び半導体レーザー等の可視から赤外領域の光を発するものを用いることができる。なお、これらのレーザー光を使用する場合には、前記組成物は、可視から赤外の当該領域の光を吸収する増感色素を含んでいてもよい。 The wavelength of the light to be irradiated can be 300 nm to 450 nm, depending on the type of photopolymerization initiator. Light sources include ultra-high pressure mercury, mercury vapor arc, carbon arc, xenon arc, and the like. Laser light may also be used, and for example, one containing light with a wavelength of 340 to 430 nm can be used. As a light source for laser light, a laser that emits light in the visible to infrared region, such as an argon ion laser, a helium neon laser, a YAG laser, and a semiconductor laser, can be used. When these laser beams are used, the composition may contain a sensitizing dye that absorbs light in the visible to infrared region.
 前記硬化物を形成する方法としては、組成物が重合性化合物と共に重合開始剤として熱重合開始剤を含む場合には、基板上に塗膜として形成した組成物に対して加熱処理を行い、重合性化合物を重合する方法が挙げられる。 As a method for forming the cured product, when the composition contains a thermal polymerization initiator as a polymerization initiator together with a polymerizable compound, the composition formed as a coating film on a substrate is subjected to heat treatment to polymerize. and a method of polymerizing a chemical compound.
 加熱温度は、化合物Aからの保護基の脱離を抑制できる温度であることが好ましく、60℃以上、好ましくは100℃以上300℃以下とすることができる。なお、加熱温度は、組成物の塗膜表面の温度とすることができる。加熱時間としては、10秒~3時間程度とすることができる。 The heating temperature is preferably a temperature that can suppress the elimination of the protective group from compound A, and can be 60°C or higher, preferably 100°C or higher and 300°C or lower. The heating temperature can be the temperature of the coating surface of the composition. The heating time can be about 10 seconds to 3 hours.
 前記硬化物を形成する工程は、1種類の方法のみを含むものであってもよく、2種類以上の方法を含むものであってもよい。 The step of forming the cured product may include only one method, or may include two or more methods.
 前記硬化物を形成する工程に用いる前記組成物は、前記化合物A、前記化合物B及び前記重合性化合物を含むものであるが、前記化合物A、前記化合物B及び前記重合性化合物以外の成分を含むものであってもよい。例えば、重合性化合物以外の樹脂成分及びその他の成分等を含むことができる。これらの各成分の内容については、前記「A.組成物」の項に記載した通りである。 The composition used in the step of forming the cured product contains the compound A, the compound B and the polymerizable compound, and contains components other than the compound A, the compound B and the polymerizable compound. There may be. For example, it may contain a resin component other than the polymerizable compound, other components, and the like. The contents of each of these components are as described in the section "A. Composition".
2.保護基を脱離する工程
 前記製造方法は、前記硬化物を形成する工程の後に、前記化合物Aに含まれる保護基Rを脱離する工程を含むものであってもよい。このような工程を含むことで、優れた耐久性を有する硬化物を容易に得ることができる。
2. Step of Removing Protecting Group The production method may include a step of removing the protecting group R 9 contained in the compound A after the step of forming the cured product. By including such steps, a cured product having excellent durability can be easily obtained.
 前記化合物Aに含まれる保護基Rを脱離する方法としては、前記保護基を安定的に脱離できる方法であればよく、例えば、前記硬化物に対して加熱処理する方法が挙げられる。加熱温度としては、保護基Rが脱離する温度であればよい。また、加熱温度は、前記組成物が酸触媒、塩基触媒等を含む場合には、保護基R単独の場合に観察される脱離温度以下とすることができる。 The method for removing the protecting group R 9 contained in the compound A may be any method as long as the protecting group can be stably removed, and examples thereof include a method of heat-treating the cured product. The heating temperature may be any temperature at which the protecting group R9 is eliminated. In addition, when the composition contains an acid catalyst, a base catalyst, or the like, the heating temperature can be set to the desorption temperature observed when the protecting group R9 alone is used, or lower.
 前記加熱温度は、50℃以上250℃以下とすることができ、60℃以上200℃以下であることが好ましく、特に80℃以上200℃以下であることが好ましい。前記加熱温度であることで、樹脂成分等の劣化、硬化物を支持する基材の劣化等を抑制できるからである。なお、前記硬化物の温度は、硬化物表面の温度とすることができる。 The heating temperature can be 50°C or higher and 250°C or lower, preferably 60°C or higher and 200°C or lower, and particularly preferably 80°C or higher and 200°C or lower. This is because the deterioration of the resin component and the like, the deterioration of the substrate supporting the cured product, and the like can be suppressed at the heating temperature. The temperature of the cured product can be the temperature of the surface of the cured product.
3.その他の工程
 前記製造方法は、硬化物を形成する工程及び保護基を脱離する工程以外に、必要に応じてその他の工程を含むものであってもよい。
 前記その他の工程としては、前記組成物を基材上に塗布する工程等が挙げられる。組成物を塗布する方法としては、スピンコーター、ロールコーター、バーコーター、ダイコーター、カーテンコーター、各種の印刷、浸漬等の公知の方法を用いることができる。前記基材としては、硬化物の用途等に応じて適宜設定することができ、ソーダガラス、石英ガラス、半導体基板、金属、紙、プラスチック等を含むものが挙げられる。また、前記硬化物は、基材上で形成された後、基材から剥離して用いても、基材から他の被着体に転写して用いてもよい。
3. Other Steps The production method may optionally include other steps in addition to the step of forming the cured product and the step of removing the protective group.
Examples of the other steps include a step of applying the composition onto a substrate. As a method for applying the composition, known methods such as spin coater, roll coater, bar coater, die coater, curtain coater, various types of printing, and dipping can be used. The base material can be appropriately selected according to the intended use of the cured product, and examples thereof include soda glass, quartz glass, semiconductor substrates, metals, paper, plastics, and the like. Moreover, after the cured product is formed on the base material, the cured product may be peeled off from the base material, or may be transferred from the base material to another adherend.
4.その他
 前記製造方法により製造される硬化物及び用途等については、前記「B.硬化物」の項に記載した通りである。
4. Others The cured product produced by the above-mentioned production method, its use, etc. are as described in the section "B. Cured product".
 本発明においては、以下の態様が挙げられる。 The present invention includes the following aspects.
[1]
 下記一般式(A1)、(A2)又は(A3)で表される化合物Aと、
 ヒンダードアミン構造の数が3以下のヒンダードアミン化合物である化合物Bと、を含む組成物。
[1]
a compound A represented by the following general formula (A1), (A2) or (A3);
and a compound B which is a hindered amine compound having 3 or less hindered amine structures.
Figure JPOXMLDOC01-appb-C000039
(式中、R及びRは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R及びRの少なくとも一方が-O-Rであり、
 R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m1は、1~10の整数を表し、
 a1は、0~4の整数を表し、
 a2は、0~2の整数を表し、
 Xb1は、m1が1の場合には存在せず、m1が2の場合には直接結合又はm1価の原子若しくは連結基を表し、m1が3~10の場合はm1価の原子又は連結基を表す。)
Figure JPOXMLDOC01-appb-C000039
(wherein R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, a group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or -O-R 9 , wherein at least one of R 1 and R 2 is -O-R 9 ,
R 3 and R 4 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to 4 carbon atoms. represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 3 's and a plurality of R 4 's may combine to form a benzene ring or a naphthalene ring,
Multiple R 3 and multiple R 4 may be the same or different,
m1 represents an integer from 1 to 10,
a1 represents an integer from 0 to 4,
a2 represents an integer of 0 to 2,
X b1 is absent when m1 is 1, represents a direct bond or m1-valent atom or linking group when m1 is 2, and m1-valent atom or linking group when m1 is 3 to 10 represents )
Figure JPOXMLDOC01-appb-C000040
(式中、R’及びR’は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R’及びR’の少なくとも一方が-O-Rであり、
 R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m2は、1~10の整数を表し、
 a3は、0~4の整数を表し、
 a4は、0~3の整数を表し、
 Xb2は、m2が1の場合には存在せず、m2が2の場合には直接結合又はm2価の原子若しくは連結基を表し、m2が3~10の場合はm2価の原子又は連結基を表す。)
Figure JPOXMLDOC01-appb-C000040
(wherein R 1 ' and R 2 ' are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms, , an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ' and R 2 ' is —OR is 9 ;
R 5 and R 6 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 5 's and a plurality of R 6 's may combine to form a benzene ring or a naphthalene ring,
Multiple R 5 and multiple R 6 may be the same or different,
m2 represents an integer from 1 to 10,
a3 represents an integer from 0 to 4,
a4 represents an integer from 0 to 3,
X b2 is absent when m2 is 1, represents a direct bond or an m2-valent atom or linking group when m2 is 2, and m2-valent atom or linking group when m2 is 3 to 10 represents )
Figure JPOXMLDOC01-appb-C000041
(式中、R”及びR”は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R”及びR”の少なくとも一方が-O-Rであり、
 R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
 Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
 R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
 前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
 複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
 複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
 m3は、1~3の整数を表し、
 a5は、0~3の整数を表し、
 a6は、0~3-m3の整数を表す。)
Figure JPOXMLDOC01-appb-C000041
(wherein R 1 ″ and R 2 ″ are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 6 to 20 carbon atoms, aryl group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ″ and R 2 ″ is —OR is 9 ;
R 7 and R 8 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aryl group having 7 to 20 carbon atoms. represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
A plurality of R 7 may be bonded to each other to form a benzene ring or a naphthalene ring,
Multiple R 7 and multiple R 8 may be the same or different,
m3 represents an integer of 1 to 3,
a5 represents an integer of 0 to 3,
a6 represents an integer from 0 to 3-m3. )
[2]
 前記化合物Bが、下記一般式(B1)又は(B2)で表される化合物である、[1]に記載の組成物。
[2]
The composition according to [1], wherein the compound B is a compound represented by the following general formula (B1) or (B2).
Figure JPOXMLDOC01-appb-C000042
(式中、R95は、水素原子、炭素原子数1~30のアルキル基又は炭素原子数1~30のアルコキシ基を表し、
 R96は、1~3価の有機カルボン酸のカルボキシ基から水素原子を除いた残基又はカーボネート基を表し、
 n1は、1~3の整数を表す。
 ただし、R96がカーボネート基の場合、n1は2である。)
Figure JPOXMLDOC01-appb-C000042
(Wherein, R 95 represents a hydrogen atom, an alkyl group having 1 to 30 carbon atoms or an alkoxy group having 1 to 30 carbon atoms,
R 96 represents a residue or a carbonate group obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid,
n1 represents an integer of 1-3.
However, n1 is 2 when R96 is a carbonate group. )
Figure JPOXMLDOC01-appb-C000043
(式中、R97は水素原子又は炭素原子数1~30のアルキル基を表し、R98はアルケニルカルボニル基を表す。)
Figure JPOXMLDOC01-appb-C000043
(Wherein, R 97 represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms, and R 98 represents an alkenylcarbonyl group.)
[3]
 Rが、酸素原子側の末端のメチレン基が-CO-O-に置換された炭素原子数1~20のアルキル基である、[1]又は[2]に記載の組成物。
[3]
The composition according to [1] or [2], wherein R 9 is an alkyl group having 1 to 20 carbon atoms in which the terminal methylene group on the oxygen atom side is substituted with —CO—O—.
[4]
 前記化合物Aの含有量が、前記化合物A及び前記化合物Bの合計100質量部に対して、40質量部以上90質量部以下である、[1]~[3]のいずれかに記載の組成物。
[4]
The composition according to any one of [1] to [3], wherein the content of the compound A is 40 parts by mass or more and 90 parts by mass or less with respect to a total of 100 parts by mass of the compound A and the compound B. .
[5]
 重合性化合物を含む、[1]~[4]のいずれかに記載の組成物。
[5]
The composition according to any one of [1] to [4], comprising a polymerizable compound.
[6]
 [5]に記載の組成物の硬化物。
[6]
A cured product of the composition according to [5].
[7]
 [5]に記載の組成物の硬化物を形成する工程を有する、硬化物の製造方法。
[7]
A method for producing a cured product, comprising the step of forming a cured product of the composition according to [5].
 本発明は、前記実施形態に限定されるものではない。前記実施形態は、例示であり、本発明の特許請求の範囲に記載された技術的思想と実質的に同一な構成を有し、同様な作用効果を奏するものは、いかなるものであっても本発明の技術的範囲に包含される。 The present invention is not limited to the above embodiments. The above embodiment is an example, and any device that has substantially the same configuration as the technical idea described in the claims of the present invention and achieves the same effect is the present invention. It is included in the technical scope of the invention.
 以下、実施例等を挙げて本発明をさらに詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 The present invention will be described in more detail below with reference to examples, etc., but the present invention is not limited to these examples.
[製造例A1-1]
 フェノール化合物0.01mol、二炭酸ジ-tert-ブチル0.05mol及びピリジン30gを混合し、窒素雰囲気下、室温で4-ジメチルアミノピリジン0.025molを加え、60℃で3時間撹拌した。室温まで冷却後、反応液をイオン交換水150gに注ぎ、クロロホルム200gを加えて油水分離を行った。有機層を無水硫酸ナトリウムで乾燥後、溶媒を留去し、残渣にメタノール100gを加えて晶析を行った。得られた白色粉状結晶を60℃で3時間減圧乾燥させ、目的物(下記式(A1-1)で表される化合物)を得た。得られた白色粉状結晶が目的物であることはH-NMRにて確認した。結果を下記表1に示す。なお、用いたフェノール化合物は、下記A1-1における2つの-COO-tert-ブチル基が水素原子に置換された化合物であった。
[Production Example A1-1]
0.01 mol of a phenol compound, 0.05 mol of di-tert-butyl dicarbonate and 30 g of pyridine were mixed, 0.025 mol of 4-dimethylaminopyridine was added at room temperature under a nitrogen atmosphere, and the mixture was stirred at 60° C. for 3 hours. After cooling to room temperature, the reaction solution was poured into 150 g of ion-exchanged water, and 200 g of chloroform was added for oil-water separation. After the organic layer was dried over anhydrous sodium sulfate, the solvent was distilled off, and 100 g of methanol was added to the residue for crystallization. The obtained white powdery crystals were dried under reduced pressure at 60° C. for 3 hours to obtain the desired product (compound represented by the following formula (A1-1)). It was confirmed by 1 H-NMR that the resulting white powdery crystals were the desired product. The results are shown in Table 1 below. The phenol compound used was a compound in which two —COO-tert-butyl groups in A1-1 below were substituted with hydrogen atoms.
[製造例A2-1、A3-1、A3-2]
 フェノール化合物として、下記A2-1、A3-1、A3-2にそれぞれ対応したフェノール化合物を用いた以外は、製造例A1-1と同様にして、下記式(A2-1)、(A3-1)、及び(A3-2)で表される化合物を合成した。得られた白色粉状結晶が目的物であることはH-NMRにて確認した。結果を下記表1に示す。
[Production Examples A2-1, A3-1, A3-2]
As the phenol compound, the following formulas (A2-1) and (A3-1) were prepared in the same manner as in Production Example A1-1 except that phenol compounds corresponding to A2-1, A3-1 and A3-2 below were used. ), and compounds represented by (A3-2) were synthesized. It was confirmed by 1 H-NMR that the resulting white powdery crystals were the desired product. The results are shown in Table 1 below.
Figure JPOXMLDOC01-appb-C000044
 
Figure JPOXMLDOC01-appb-C000044
 
Figure JPOXMLDOC01-appb-T000045
Figure JPOXMLDOC01-appb-T000045
[実施例1~9及び比較例1~8]
 下記表2に記載の配合に従って、化合物A、ヒンダードアミン化合物、紫外線吸収剤、酸価を有する重合性化合物、酸価を有しない重合性化合物、光重合開始剤、色材分散剤、染料、シランカップリング剤、レベリング剤、及び溶剤を配合して組成物を得た。
 各実施例及び比較例において、まず、化合物A、化合物B(又は紫外線吸収剤)及び溶剤を混合して組成物aを作製した。化合物A及び化合物B(又は紫外線吸収剤)の含有量は、組成物aを100質量部中に0.1質量部以上10質量部以下となるようにした。その後、更にこれら以外の成分を配合し、表2の配合の組成物を得た。
 また、各成分は以下の材料を用いた。
 なお、表中の配合量は、各成分の質量部を表すものである。
[Examples 1 to 9 and Comparative Examples 1 to 8]
Compound A, a hindered amine compound, an ultraviolet absorber, a polymerizable compound having an acid value, a polymerizable compound having no acid value, a photopolymerization initiator, a colorant dispersant, a dye, and a silane cup according to the formulations shown in Table 2 below. A composition was obtained by blending a ring agent, a leveling agent, and a solvent.
In each example and comparative example, first, compound A, compound B (or ultraviolet absorber) and solvent were mixed to prepare composition a. The content of compound A and compound B (or ultraviolet absorber) was adjusted to 0.1 parts by mass or more and 10 parts by mass or less per 100 parts by mass of composition a. Thereafter, components other than these were further blended to obtain a composition having the composition shown in Table 2.
In addition, the following materials were used for each component.
In addition, the compounding quantity in a table|surface represents the mass part of each component.
(化合物A)
A1-1:前記式(A1-1)で表される化合物
A2-1:前記式(A2-1)で表される化合物
A3-1:前記式(A3-1)で表される化合物
A3-2:前記式(A3-2)で表される化合物
(Compound A)
A1-1: Compound A2-1 represented by the above formula (A1-1): Compound A3-1 represented by the above formula (A2-1): Compound A3- represented by the above formula (A3-1) 2: a compound represented by the formula (A3-2)
(紫外線吸収剤)
A’-1:下記式(A’-1)で表される化合物
A’-2:下記式(A’-2)で表される化合物
A’-3:下記式(A’-3)で表される化合物
A’-4:下記式(A’-4)で表される化合物
(Ultraviolet absorber)
A'-1: compound represented by the following formula (A'-1) A'-2: compound represented by the following formula (A'-2) A'-3: represented by the following formula (A'-3) Represented compound A'-4: a compound represented by the following formula (A'-4)
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
(化合物B)
B1-1:下記式(B1-1)で表される化合物
B1-2:下記式(B1-2)で表される化合物
B1-3:下記式(B1-3)で表される化合物
B2-1:下記式(B2-1)で表される化合物
B3-1:下記式(B3-1)で表される化合物
(Compound B)
B1-1: compound B1-2 represented by the following formula (B1-1): compound B1-3 represented by the following formula (B1-2): compound B2- represented by the following formula (B1-3) 1: Compound B3-1 represented by the following formula (B2-1): Compound represented by the following formula (B3-1)
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
(酸価を有する重合性化合物)
C-1:ラジカル重合性化合物(昭和電工社製リポキシSPC-1000、固形分29質量%PGMEA溶液)
C-2:ラジカル重合性化合物(昭和電工社製リポキシSPC-3000、固形分42.4質量%PGMEA溶液)
(Polymerizable compound having an acid value)
C-1: Radically polymerizable compound (Lipoxy SPC-1000 manufactured by Showa Denko Co., Ltd., solid content 29% by mass PGMEA solution)
C-2: Radically polymerizable compound (Showa Denko Lipoxy SPC-3000, solid content 42.4% by mass PGMEA solution)
(酸価を有しない重合性化合物)
C-3:ラジカル重合性化合物(日本化薬社製カヤラッドDPHA、ジペンタエリスリトール ペンタ及びヘキサアクリレートの混合物)
(Polymerizable compound having no acid value)
C-3: Radically polymerizable compound (Kayarad DPHA manufactured by Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol penta and hexaacrylate)
(光重合開始剤)
E-1:下記式(E1)で表される化合物(オキシムエステル系光ラジカル重合開始剤)
(Photoinitiator)
E-1: A compound represented by the following formula (E1) (oxime ester photoradical polymerization initiator)
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
(着色剤)
F-1:NPCF-52417(日本ピグメント社製、固形分21.2質量%のPGMEA溶液)
F-2:NPCF-60001(日本ピグメント社製、固形分19.0質量%のPGMEA溶液)
F-3:下記式(F3)で表される化合物
(coloring agent)
F-1: NPCF-52417 (manufactured by Nippon Pigment Co., Ltd., PGMEA solution with a solid content of 21.2% by mass)
F-2: NPCF-60001 (manufactured by Nippon Pigment Co., Ltd., PGMEA solution with a solid content of 19.0% by mass)
F-3: a compound represented by the following formula (F3)
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
(シランカップリング剤)
G-1:信越化学工業社製シランカップリング剤KBE-403
(レベリング剤)
G-2:F554(DIC社製、固形分1質量%のPGMEA溶液)
(溶剤)
H-1:PGMEA
(Silane coupling agent)
G-1: Shin-Etsu Chemical Co., Ltd. silane coupling agent KBE-403
(leveling agent)
G-2: F554 (manufactured by DIC, PGMEA solution with a solid content of 1% by mass)
(solvent)
H-1: PGMEA
 前記実施例及び比較例の評価を以下の方法に従って行った。 The above examples and comparative examples were evaluated according to the following methods.
1.耐光性
 各実施例及び比較例で調製した組成物の評価を行った。結果を表2に示す。
 まず、実施例及び比較例の各組成物を、ガラス基板上にスピンコートし(500rpm、7秒間)、乾燥後(プリベーク後)の膜厚が2.2μmとなる塗膜を形成した。次いで、ホットプレートを用いて、90℃で120秒間プリベークを行い、さらに光源として高圧水銀ランプを用いて露光(積算光量で150mJ/cm)し、硬化物を得た。次いで、オーブンを用いて、230℃で30分ポストベークを行い、評価用サンプルを得た。
 得られた評価用サンプルについて、ATLAS製SUNTEST XXL+を用いて160時間の耐光性試験を実施した。色差計を用いて試験前後のEab値を求め、試験前後のEab*値変化(ΔEab)を算出し、以下の基準で耐光性評価を行った。結果を下記表2に示す。
 ΔEabが小さいほど、すなわち耐光性評価が「A」であると、硬化物は、耐光性に優れることを示す。
 
  A:ΔEabが10未満
  B:ΔEabが10以上
  -:組成物中に析出物があり、評価ができなかった。
 
1. Light Resistance The compositions prepared in Examples and Comparative Examples were evaluated. Table 2 shows the results.
First, each composition of Examples and Comparative Examples was spin-coated on a glass substrate (500 rpm, 7 seconds) to form a coating film having a thickness of 2.2 μm after drying (after pre-baking). Then, using a hot plate, pre-baking was performed at 90° C. for 120 seconds, and further exposure was performed using a high-pressure mercury lamp as a light source (accumulated light quantity: 150 mJ/cm 2 ) to obtain a cured product. Then, using an oven, post-baking was performed at 230° C. for 30 minutes to obtain an evaluation sample.
The resulting evaluation sample was subjected to a light resistance test for 160 hours using SUNTEST XXL+ manufactured by ATLAS. The Eab * values before and after the test were obtained using a color difference meter, the Eab* value change (ΔEab * ) before and after the test was calculated, and the light resistance was evaluated according to the following criteria. The results are shown in Table 2 below.
A smaller ΔEab * , that is, a light resistance evaluation of “A”, indicates that the cured product has excellent light resistance.

A: ΔEab * is less than 10 B: ΔEab * is 10 or more -: Deposits were present in the composition and could not be evaluated.
2.フォトリソ性(感度)
 「1.耐光性」と同様にして塗膜を形成し、90℃で120秒間プリベークを行った後、光源として高圧水銀ランプを用いてフォトマスク(マスク開口30μm)を介して露光した(露光ギャップ300μm、露光量40mJ/cm)。現像液として0.04質量%KOH水溶液を用いて現像した後、よく水洗し、クリーンオーブンを用いて230℃で30分ポストベークを行い、パターンを定着させた。得られたパターンを光学顕微鏡で観察し、マスク開口に対応する部分の線幅を測定し、以下の基準で評価した。結果を下記表2に示す。
 設定線幅に対する差が小さいほど、すなわちフォトリソ性が「A」であると、線幅が制御されており、感度が良好であると判断できる。
 
  A:マスク開口30μmを基準として、線幅が±2.5μmの範囲内である。
  B:マスク開口30μmを基準として、線幅が±2.5μmを超える。
  -:組成物中に析出物があり、評価ができなかった。
 
2. Photolithography (sensitivity)
A coating film was formed in the same manner as in “1. 300 μm, exposure amount 40 mJ/cm 2 ). After development using a 0.04% by mass KOH aqueous solution as a developer, the film was thoroughly washed with water and post-baked at 230° C. for 30 minutes using a clean oven to fix the pattern. The obtained pattern was observed with an optical microscope, and the line width of the portion corresponding to the mask opening was measured and evaluated according to the following criteria. The results are shown in Table 2 below.
If the difference with respect to the set line width is smaller, that is, if the photolithographic property is "A", it can be judged that the line width is controlled and the sensitivity is good.

A: The line width is within the range of ±2.5 μm based on the mask opening of 30 μm.
B: The line width exceeds ±2.5 μm based on the mask opening of 30 μm.
-: Deposits were present in the composition and could not be evaluated.
Figure JPOXMLDOC01-appb-T000051
Figure JPOXMLDOC01-appb-T000051
 表2より、実施例の組成物は、比較例の組成物に比べて、耐光性及びフォトリソ性の両者が良好な結果であり、耐久性及び感度に優れることが確認できた。また、実施例の組成物は、硬化阻害の発生が抑制され十分に硬化できることが確認でき、硬化物の製造が容易であることがわかった。 From Table 2, it was confirmed that the compositions of Examples had better results in both light resistance and photolithography than the compositions of Comparative Examples, and were superior in durability and sensitivity. In addition, it was confirmed that the compositions of Examples could be sufficiently cured with inhibition of curing being suppressed, and it was found that the production of cured products was easy.

Claims (7)

  1.  下記一般式(A1)、(A2)又は(A3)で表される化合物Aと、
     ヒンダードアミン構造の数が3以下のヒンダードアミン化合物である化合物Bと、を含む組成物。
    Figure JPOXMLDOC01-appb-C000001
    (式中、R及びRは、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R及びRの少なくとも一方が-O-Rであり、
     R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
     Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
     前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
     R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
     前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
     複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
     複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
     m1は、1~10の整数を表し、
     a1は、0~4の整数を表し、
     a2は、0~2の整数を表し、
     Xb1は、m1が1の場合には存在せず、m1が2の場合には直接結合又はm1価の原子若しくは連結基を表し、m1が3~10の場合はm1価の原子又は連結基を表す。)
    Figure JPOXMLDOC01-appb-C000002
    (式中、R’及びR’は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R’及びR’の少なくとも一方が-O-Rであり、
     R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
     Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
     前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
     R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
     前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
     複数のR同士及び複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
     複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
     m2は、1~10の整数を表し、
     a3は、0~4の整数を表し、
     a4は、0~3の整数を表し、
     Xb2は、m2が1の場合には存在せず、m2が2の場合には直接結合又はm2価の原子若しくは連結基を表し、m2が3~10の場合はm2価の原子又は連結基を表す。)
    Figure JPOXMLDOC01-appb-C000003
    (式中、R”及びR”は、それぞれ独立に、水素原子、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又は-O-Rを表し、R”及びR”の少なくとも一方が-O-Rであり、
     R及びRは、それぞれ独立に、ハロゲン原子、シアノ基、水酸基、ニトロ基、カルボキシ基、炭素原子数1~40のアルキル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基又は炭素原子数2~20の複素環含有基を表し、
     Rは、炭素原子数1~20のアルキル基、炭素原子数2~20のアルケニル基、炭素原子数6~20のアリール基、炭素原子数7~20のアリールアルキル基、炭素原子数2~20の複素環含有基又はトリアルキルシリル基を表し、
     前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基中のメチレン基は、炭素-炭素二重結合、-O-、-S-、-CO-、-O-CO-、-CO-O-、-O-CO-O-、-O-CO-O-、-S-CO-、-CO-S-、-S-CO-O-、-O-CO-S-、-CO-NH-、-NH-CO-、-NH-CO-O-、-NR’-、>P=O、-S-S-若しくは-SO-又はこれらを組み合わせた2価の基で置換されていてもよく、
     R’は、水素原子又は炭素原子数1~8のアルキル基を表し、
     前記アルキル基、アリール基、アリールアルキル基、複素環含有基、アルケニル基及びトリアルキルシリル基は置換基を有していてもよく、
     複数のR同士は、それぞれ結合してベンゼン環又はナフタレン環を形成していてもよく、
     複数のR及び複数のRは、それぞれ同じでも異なっていてもよく、
     m3は、1~3の整数を表し、
     a5は、0~3の整数を表し、
     a6は、0~3-m3の整数を表す。)
    a compound A represented by the following general formula (A1), (A2) or (A3);
    and a compound B which is a hindered amine compound having 3 or less hindered amine structures.
    Figure JPOXMLDOC01-appb-C000001
    (wherein R 1 and R 2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, a group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or -O-R 9 , wherein at least one of R 1 and R 2 is -O-R 9 ,
    R 3 and R 4 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to 4 carbon atoms. represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
    R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
    The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
    R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
    The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
    A plurality of R 3 's and a plurality of R 4 's may combine to form a benzene ring or a naphthalene ring,
    Multiple R 3 and multiple R 4 may be the same or different,
    m1 represents an integer from 1 to 10,
    a1 represents an integer from 0 to 4,
    a2 represents an integer of 0 to 2,
    X b1 is absent when m1 is 1, represents a direct bond or m1-valent atom or linking group when m1 is 2, and m1-valent atom or linking group when m1 is 3 to 10 represents )
    Figure JPOXMLDOC01-appb-C000002
    (wherein R 1 ' and R 2 ' are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 1 to 40 carbon atoms, , an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ' and R 2 ' is —OR is 9 ;
    R 5 and R 6 each independently represent a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
    R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
    The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or combinations thereof 2 optionally substituted with a valent group,
    R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
    The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
    A plurality of R 5 's and a plurality of R 6 's may combine to form a benzene ring or a naphthalene ring,
    Multiple R 5 and multiple R 6 may be the same or different,
    m2 represents an integer from 1 to 10,
    a3 represents an integer from 0 to 4,
    a4 represents an integer from 0 to 3,
    X b2 is absent when m2 is 1, represents a direct bond or an m2-valent atom or linking group when m2 is 2, and m2-valent atom or linking group when m2 is 3 to 10 represents )
    Figure JPOXMLDOC01-appb-C000003
    (wherein R 1 ″ and R 2 ″ are each independently a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an alkyl group having 6 to 20 carbon atoms, aryl group, an arylalkyl group having 7 to 20 carbon atoms, a heterocyclic ring-containing group having 2 to 20 carbon atoms or —OR 9 , wherein at least one of R 1 ″ and R 2 ″ is —OR is 9 ;
    R 7 and R 8 each independently represents a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxy group, an alkyl group having 1 to 40 carbon atoms, an aryl group having 6 to 20 carbon atoms, or 7 to represents a 20 arylalkyl group or a heterocyclic ring-containing group having 2 to 20 carbon atoms,
    R 9 is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, an arylalkyl group having 7 to 20 carbon atoms, or 2 to 2 carbon atoms. 20 represents a heterocycle-containing group or a trialkylsilyl group,
    The methylene group in the alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group is a carbon-carbon double bond, -O-, -S-, -CO-, -O -CO-, -CO-O-, -O-CO-O-, -O-CO-O-, -S-CO-, -CO-S-, -S-CO-O-, -O-CO —S—, —CO—NH—, —NH—CO—, —NH—CO—O—, —NR′—, >P═O, —S—S— or —SO 2 — or a combination of these 2 optionally substituted with a valent group,
    R' represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms,
    The alkyl group, aryl group, arylalkyl group, heterocyclic ring-containing group, alkenyl group and trialkylsilyl group may have a substituent,
    A plurality of R 7 may be bonded to each other to form a benzene ring or a naphthalene ring,
    Multiple R 7 and multiple R 8 may be the same or different,
    m3 represents an integer of 1 to 3,
    a5 represents an integer of 0 to 3,
    a6 represents an integer from 0 to 3-m3. )
  2.  前記化合物Bが、下記一般式(B1)又は(B2)で表される化合物である、請求項1に記載の組成物。
    Figure JPOXMLDOC01-appb-C000004
    (式中、R95は、水素原子、炭素原子数1~30のアルキル基又は炭素原子数1~30のアルコキシ基を表し、
     R96は、1~3価の有機カルボン酸のカルボキシ基から水素原子を除いた残基又はカーボネート基を表し、
     n1は、1~3の整数を表す。
     ただし、R96がカーボネート基の場合、n1は2である。)
    Figure JPOXMLDOC01-appb-C000005
    (式中、R97は水素原子又は炭素原子数1~30のアルキル基を表し、R98はアルケニルカルボニル基を表す。)
    2. The composition according to claim 1, wherein said compound B is a compound represented by the following general formula (B1) or (B2).
    Figure JPOXMLDOC01-appb-C000004
    (Wherein, R 95 represents a hydrogen atom, an alkyl group having 1 to 30 carbon atoms or an alkoxy group having 1 to 30 carbon atoms,
    R 96 represents a residue or a carbonate group obtained by removing a hydrogen atom from the carboxy group of a monovalent to trivalent organic carboxylic acid,
    n1 represents an integer of 1-3.
    However, n1 is 2 when R96 is a carbonate group. )
    Figure JPOXMLDOC01-appb-C000005
    (Wherein, R 97 represents a hydrogen atom or an alkyl group having 1 to 30 carbon atoms, and R 98 represents an alkenylcarbonyl group.)
  3.  Rが、酸素原子側の末端のメチレン基が-CO-O-に置換された炭素原子数1~20のアルキル基である、請求項1に記載の組成物。 The composition according to claim 1, wherein R 9 is an alkyl group having 1 to 20 carbon atoms in which the terminal methylene group on the oxygen atom side is substituted with -CO-O-.
  4.  前記化合物Aの含有量が、前記化合物A及び前記化合物Bの合計100質量部に対して、40質量部以上90質量部以下である、請求項1に記載の組成物。 The composition according to claim 1, wherein the content of said compound A is 40 parts by mass or more and 90 parts by mass or less with respect to a total of 100 parts by mass of said compound A and said compound B.
  5.  重合性化合物を含む、請求項1~4のいずれか1項に記載の組成物。 The composition according to any one of claims 1 to 4, which contains a polymerizable compound.
  6.  請求項5に記載の組成物の硬化物。 A cured product of the composition according to claim 5.
  7.  請求項5に記載の組成物の硬化物を形成する工程を有する、硬化物の製造方法。
     
     
    A method for producing a cured product, comprising the step of forming a cured product of the composition according to claim 5.

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235856A (en) * 2000-02-23 2001-08-31 Fuji Photo Film Co Ltd Photosensitive resin composition and image forming method
CN101671457A (en) * 2009-09-29 2010-03-17 苏州福斯特光伏材料有限公司 Ethene-vinyl acetate composition and application thereof
JP2020070436A (en) * 2018-10-25 2020-05-07 株式会社Adeka Composition, solder resist composition, cured product and method for manufacturing cured product

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235856A (en) * 2000-02-23 2001-08-31 Fuji Photo Film Co Ltd Photosensitive resin composition and image forming method
CN101671457A (en) * 2009-09-29 2010-03-17 苏州福斯特光伏材料有限公司 Ethene-vinyl acetate composition and application thereof
JP2020070436A (en) * 2018-10-25 2020-05-07 株式会社Adeka Composition, solder resist composition, cured product and method for manufacturing cured product

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