WO2023015480A1 - Fan-out chip package structure and preparation method - Google Patents

Fan-out chip package structure and preparation method Download PDF

Info

Publication number
WO2023015480A1
WO2023015480A1 PCT/CN2021/112021 CN2021112021W WO2023015480A1 WO 2023015480 A1 WO2023015480 A1 WO 2023015480A1 CN 2021112021 W CN2021112021 W CN 2021112021W WO 2023015480 A1 WO2023015480 A1 WO 2023015480A1
Authority
WO
WIPO (PCT)
Prior art keywords
chip
redistribution layer
fan
packaging structure
out packaging
Prior art date
Application number
PCT/CN2021/112021
Other languages
French (fr)
Chinese (zh)
Inventor
蔡崇宣
赵南
洪瑞斌
Original Assignee
华为技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 华为技术有限公司 filed Critical 华为技术有限公司
Priority to CN202180097862.9A priority Critical patent/CN117242555A/en
Priority to PCT/CN2021/112021 priority patent/WO2023015480A1/en
Publication of WO2023015480A1 publication Critical patent/WO2023015480A1/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/44Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container

Definitions

  • the embodiments of the present application relate to the technical field of semiconductor packaging, and in particular to a fan-out chip packaging structure and manufacturing method.
  • the hardware supporting applications such as 5G applications and artificial intelligence needs to have high-speed computing, low latency, multi-bandwidth and system integration. Function.
  • Substrate-less packaging structures include Fan-in Wafer Level Package and Fan-out Package. Compared with the fan-in packaging structure, the fan-out packaging structure can provide more I/O connection points and become the mainstream direction.
  • the fan-out packaging structure and preparation method provided in the present application can improve the reliability of the packaged chip.
  • the embodiment of the present application provides a fan-out packaging structure
  • the fan-out packaging structure includes: a first chip and a first redistribution layer; the first surface of the first chip is provided with a plurality of conductive pillars , the first chip is disposed on the first surface of the first redistribution layer through the plurality of conductive pillars; the gaps between the plurality of conductive pillars are filled with insulating material, and the insulating material is disposed on the first Between the first surface of the chip and the first surface of the first redistribution layer, the orthographic projection of the insulating material to the first chip is located within the boundary range of the first chip, and the orthographic projection of the There is a predetermined distance between the boundary and the boundary of the first chip; the side of the first chip and the part of the first surface of the first chip not covered by the insulating material and the plurality of conductive pillars, Wrapped by the molding material deposited on the first surface of the first redistribution layer.
  • multiple first chips can be packaged in the same package, and the multiple first chips can be arranged in parallel and spaced apart in the package.
  • the plurality of first chips refer to chips manufactured by using a synchronous process and packaged in a same package.
  • the plurality of first chips may be different types of chips.
  • one of the first chips may be a processor, and the other first chip may be a transistor.
  • the orthographic projection of the insulating material to the first chip is set within the boundary range of the first chip, and the boundary of the orthographic projection has a preset distance from the boundary of the first chip, so that the first chip of the first chip No insulating material is deposited on the part of the surface close to the edge of the first chip, and this part is exposed during the packaging process.
  • the plastic packaging material can wrap the sides and corners of the first chip in the plastic packaging material, and the thickness of the plastic packaging material between every two first chips can be increased so that every two first chips
  • the area between the chips provides support and protection, preventing the area between every two first chips from breaking along the thickness direction of the first chips, thereby improving the reliability of chip packaging.
  • the insulating material provided in the embodiment of the present application may be an organic polymer material, including but not limited to: polyimide, polybenzoxazole, benzocyclobutene, or epoxy molding compound.
  • the molding material provided in the embodiment of the present application may be one or a combination of epoxy resin, polyethylene, polypropylene, polyolefin, polyamide, and polyimide.
  • the surface of the plurality of conductive pillars in contact with the first redistribution layer is located at the same surface as the surface of the insulating material in contact with the first redistribution layer. level.
  • the fan-out packaging structure provided in the embodiment of the present application may be various types of packaging structures.
  • the fan-out packaging structure is wafer-level chip-scale packaging.
  • the molding material also covers a second surface of the first chip opposite to the first surface.
  • the wafer-level chip size package may also include building a package-on-package structure.
  • the fan-out packaging structure further includes a second chip; the second chip is disposed on a side of the first chip away from the first redistribution layer.
  • the fan-out packaging structure is a package-on-package structure
  • the fan-out packaging structure further includes a second redistribution layer, and the second redistribution layer is disposed on the molding material away from all One side of the first chip; the second chip is disposed on a side of the second redistribution layer away from the first redistribution layer through a plurality of pads.
  • the fan-out packaging structure is a package-on-package structure
  • the area of the molding material away from the first chip is provided with a connection between the first rewiring layer and the second rewiring layer.
  • the second chip is connected to the first chip through the second redistribution layer, the through holes and the first redistribution layer.
  • the fan-out package structure is a board-level chip size package.
  • the fan-out packaging structure further includes a printed circuit board; the second surface of the redistribution layer is disposed on the first surface of the printed circuit board through the plurality of bumps.
  • the fan-out packaging structure is a board-level chip size packaging structure
  • the fan-out packaging structure further includes a heat sink; the heat sink is arranged on the first on the second surface of the chip.
  • the first redistribution layer provided by the embodiment of the present application includes at least one layer of patterned conductive lines and an insulating material for isolating the patterned conductive lines.
  • the first redistribution layer is also provided with via holes , the via hole is filled with conductive material, and the first chip passes through the conductive circuit on the first redistribution layer and the via hole provided on the first redistribution layer, and is formed by the first redistribution layer of the first redistribution layer.
  • the surface leads to the second surface to communicate with the plurality of bumps.
  • the second redistribution layer provided by the embodiment of the present application includes at least one layer of patterned conductive lines and an insulating material for isolating the patterned conductive lines.
  • the second redistribution layer is also provided with via holes , the via hole is filled with conductive material, and the second chip passes through the conductive circuit on the second redistribution layer, the via hole provided on the second redistribution layer, the via hole and the first redistribution layer layer, communicated with the first chip.
  • an embodiment of the present application provides an electronic device, where the electronic device includes the fan-out packaging structure described in the first aspect.
  • the chip packaged by the fan-out packaging structure may include but not limited to: System on chip (System on chip), memory (Memory), discrete device, application processing chip (Application Processor, AP), micro-electromechanical system (Micro-Electro- Mechanical System, MEMS), microwave radio frequency chip, application specific integrated circuit (Application Specific Integrated Circuit, referred to as ASIC) and other chips.
  • the above-mentioned application processing chip or application-specific integrated circuit may be a central processing unit (Central Processing Unit, CPU), an image processor (Graphics Processing Unit, GPU), an artificial intelligence processor, for example, a neural network processor (Network Processing Unit, NPU), etc.
  • the memory may be a cache memory (cache), a random access memory (Random Access Memory, RAM), a read-only memory (Read Only Memory, ROM), or other memory.
  • Discrete devices may include, but are not limited to, eg, field effect transistors, bipolar transistors, integrated operational amplifiers, and the like, for example.
  • the electronic device may also be an integrated circuit product, wherein, in addition to the fan-out packaging structure described in the embodiment of the present application, the integrated circuit product may also include other integrated circuits, so that the fan-out package structure shown in the embodiment of the present application The type package structure cooperates with other integrated circuits to realize various circuit functions.
  • an embodiment of the present application provides a method for preparing a fan-out packaging structure, the preparation method comprising: forming a plurality of conductive pillars on the first surface of the first chip; depositing an insulating material, the insulating material fills the gaps of the plurality of conductive columns, the orthographic projection of the insulating material to the first chip is located within the boundary range of the first chip, and the boundary of the orthographic projection is in line with the The boundary of the first chip has a preset distance; a plastic encapsulation material is formed on the first chip, and the plastic encapsulation material wraps the side of the first chip and the exposed part of the first surface of the first chip ; forming a first redistribution layer on the plane formed by the plurality of conductive pillars, the insulating material and the molding material.
  • the molding material further wraps a second surface of the first chip opposite to the first surface.
  • the preparation method further includes: forming a second redistribution layer on a side of the molding material away from the first redistribution layer; A plurality of welding pads are formed on the side of the wiring layer away from the plastic encapsulation material; the second chip is arranged on the second rewiring layer through the plurality of welding pads.
  • the preparation method further includes: opening a hole for connecting the first redistribution layer and the second redistribution layer in a region of the molding material far away from the chip; Through holes: the second chip communicates with the first chip through the first redistribution layer, the through holes and the second redistribution layer.
  • Fig. 2 is a top view of the fan-out packaging structure shown in Fig. 1 provided by the embodiment of the present application after being cut along AA';
  • FIG. 4 is a top view of the fan-out packaging structure shown in FIG. 3 after the redistribution layer is removed;
  • FIG. 8 is a flowchart of a method for preparing the fan-out packaging structure shown in FIG. 1 provided in the embodiment of the present application;
  • FIGS. 9A-9G are schematic diagrams of various structures during the preparation process of the fan-out packaging structure shown in FIG. 1 .
  • FIG. 1 is a schematic structural diagram of a fan-out packaging structure provided by an embodiment of the present application.
  • a fan-out package structure 100 includes a chip 10 , a chip 11 , a redistribution layer 20 , a plurality of conductive pillars 30 and a plurality of conductive pillars 31 .
  • the chip 10 includes opposite surfaces S1 and S2, and a plurality of lead terminals are formed on the surface S1. Multiple leads on the chip 10 are connected to the chip 11, the common power supply and the common ground through the conductive pillar 30 and the redistribution layer 20.
  • the chip 11 includes opposite surfaces S3 and S4, and a plurality of lead terminals are formed on the surface S3.
  • the insulating material 40 is deposited on the surface S1 of the chip 10 and the surface S3 of the chip 11 respectively.
  • the height of the insulating material 40 is the same as that of the conductive pillars 30 and the conductive pillars 31 .
  • the first orthographic projection of the insulating material 40 deposited on the surface S1 of the chip 10 to the surface S1 of the chip 10 is located within the boundary range of the chip 10, and the boundary of the first orthographic projection and the boundary of the chip 10 have a first predetermined relationship.
  • a plastic encapsulation material 50 is also included.
  • the molding material may include, for example, one or more combinations of epoxy resin (Epoxy Molding Compound, EMC), polyethylene, polypropylene, polyolefin, polyamide, and polyimide.
  • EMC epoxy Molding Compound
  • the plastic encapsulation material 50 wraps the parts of the chip 10 and the chip 11 that are not covered by the insulating material 40 , the conductive pillars 30 and the conductive pillars 31 .
  • the insulating material 40 is usually used to completely cover the surface S1 of the chip 10 and the surface S3 of the chip 11, and the surface S2 and the side surfaces of the chip 10 are wrapped by the plastic packaging material 50. Wrap the surface S4 and the side of the chip 11, as shown in Figure 3 and Figure 4,
  • Figure 3 is a schematic diagram of the fan-out packaging structure in the traditional technology
  • Figure 4 is the fan-out packaging structure shown in Figure 3 with heavy The top view after the wiring layer 20.
  • the redistribution layer 20 may include at least one patterned conductive circuit and an insulating material for isolating the patterned conductive circuit.
  • the conductive material used to form the patterned conductive circuit may be metal, such as A combination of one or more of copper (Cu), silver (Ag), aluminum (Al) and other metals, the conductive material used to form patterned conductive lines can also be button tin oxide (ITO), graphite, graphene etc.; the insulating material can be an inorganic insulating material or an organic insulating material, etc.
  • the redistribution layer 20 may also be provided with vias (Via), which may include but not limited to: through holes or buried holes.
  • the lead-out end of the chip 10 is led from the surface D1 of the redistribution layer 20 to the surface D2 through the conductive lines on the redistribution layer 20 and the via holes provided on the redistribution layer 20, thereby communicating with a part of the bumps 60; the lead out of the chip 11
  • the end is led from the surface D1 to the surface D2 of the redistribution layer 20 through the conductive lines on the redistribution layer 20 and the via holes provided on the redistribution layer 20 , so as to communicate with another part of the bump 60 .
  • the chip 10 and the chip 20 can also be connected through the lines on the redistribution layer 20 , so as to realize the signal communication between the chip 10 and the chip 20 .
  • the redistribution layer 70 is disposed on the molding compound 50 .
  • a plurality of pads (Pad) 71 are also arranged on the redistribution layer 70 , and the leads of the chip 12 are soldered to the pads 71 , so that the leads of the chip 12 are led out to the surface of the redistribution layer 70 .
  • the molding compound 50 is also provided with a plurality of through holes 51 penetrating through the upper surface and the lower surface of the molding material 50, and the through holes 51 are filled with conductive materials. The through holes 51 are used for The redistribution layer 20 and the redistribution layer 70 are connected.
  • the lead-out end of the chip 12 is led to the surface D1 of the redistribution layer 20 through the conductive circuit on the redistribution layer 70 and the through hole 51, and then communicates with the chip 10 and the chip 11 through the conductive circuit provided on the redistribution layer 20 to realize the chip. 12 and the signal exchange between the chip 10 and the chip 11.
  • one chip is stacked on the chip 10 and the chip 11;
  • the chips are communicated with each other through a through hole provided on the insulating layer, which is not specifically limited in this embodiment of the present application.
  • the fan-out package structure shown in Figure 1 and Figure 5 is Fan Out-Wafer Level Chip Scale Package (FO-WLCSP, Fan Out-Wafe Level Chip Scale Package).
  • the fan-out packaging structure shown in the embodiment of the present application may also be a Fan Out-Panel Level Package (FO-PLP, Fan Out-Panel Level Package).
  • the board-level package may be a Flip Chip Ball Grid Array (FCBGA, Flip Chip Ball Grid Array).
  • FIG. 6 is a schematic structural diagram of a fan-out board-level package 300 provided by an embodiment of the present application. In FIG.
  • the fan-out board-level package 300 includes a printed circuit board (PCB, Print Circuit Board) 80 in addition to the fan-out package structure 100 shown in FIG. 1 .
  • the PCB 80 may include multiple wiring layers.
  • the surface P1 of the PCB 80 , the surface P2 opposite to the surface P1 , and the intermediate wiring layer between the surface P1 and the surface P2 are all provided with patterned conductive lines.
  • the PCB 80 is also provided with vias (Via), which may include but not limited to: through holes or buried holes.
  • the conductive lines on the surface P1 of the PCB 80 , the conductive lines on the intermediate wiring layer and the conductive lines on the surface P2 can be connected through via holes.
  • the fan-out board-level packaging structure provided in the embodiment of the present application may further include a heat sink 90 .
  • a heat sink 90 At this time, neither the surface S2 of the chip 10 nor the surface S4 of the chip 11 is provided with the plastic encapsulation material 50, the surface S2 of the chip 10 and the surface S4 of the chip 11 are coated with a heat dissipation material, and no fan-out package is provided on the PCB 80
  • the area of the structure 100 may also be coated with a heat dissipation material 91 , and the heat dissipation sheet 90 is mounted on the surface S2 of the chip 10 , the surface S4 of the chip 11 and the surface P1 of the PCB through the heat dissipation material 91 .
  • the chip 10 and the chip 11 can dissipate heat through the heat sink.
  • the heat sink 90 can also provide physical protection for the fan-out packaging structure 100 .
  • the embodiment of the present application also includes an electronic device, where the electronic device includes the fan-out packaging structure shown in the above-mentioned embodiments.
  • the chip packaged by the fan-out packaging structure may include but not limited to: System on chip (System on chip), memory (Memory), discrete device, application processing chip (Application Processor, AP), micro-electromechanical system (Micro-Electro- Mechanical System, MEMS), microwave radio frequency chip, application specific integrated circuit (Application Specific Integrated Circuit, referred to as ASIC) and other chips.
  • the above-mentioned application processing chip or application-specific integrated circuit may be a central processing unit (Central Processing Unit, CPU), an image processor (Graphics Processing Unit, GPU), an artificial intelligence processor, for example, a neural network processor (Network Processing Unit, NPU), etc.
  • the memory may be a cache memory (cache), a random access memory (Random Access Memory, RAM), a read-only memory (Read Only Memory, ROM), or other memory.
  • Discrete devices may include, but are not limited to, eg, field effect transistors, bipolar transistors, integrated operational amplifiers, and the like, for example. For example, when the fan-out packaging structure shown in FIG. 1 or FIG.
  • the chip 10 and the chip 11 packaged in the fan-out packaging structure can be application processing chips and discrete devices respectively;
  • the chips 10 and 11 packaged in the fan-out packaging structure may be application processing chips and discrete devices respectively, and the chip 12 may be a memory.
  • the electronic device may also be an integrated circuit product, wherein, in addition to the fan-out packaging structure described in the embodiment of the present application, the integrated circuit product may also include other integrated circuits, so that the fan-out package structure shown in the embodiment of the present application The type package structure cooperates with other integrated circuits to realize various circuit functions.
  • Step 801 forming conductive pillars 30 at the leading end of the chip 10 to be packaged, and forming conductive pillars 31 at the leading end of the chip 11 to be packaged.
  • the process of forming the conductive pillar 30 at the lead-out end of the chip 10 is the same as the process of forming the conductive pillar 31 at the lead-out end of the chip 11 .
  • This step will be described below by taking the process of forming the conductive pillar 30 at the leading end of the chip 10 as an example.
  • a metal material is deposited on the surface S1 of the chip 10 by vapor deposition (such as physical vapor deposition or chemical vapor deposition).
  • the metal material may include, but is not limited to: materials such as copper, aluminum, silver, gold, or metal alloy materials.
  • a photoresist is deposited on the surface of the metal material.
  • a mask is used to etch the part of the metal material that does not cover the leading end of the chip 10 , so as to form the conductive pillar 30 on the surface S1 of the chip 10 , as shown in FIG. 9A .
  • the aforementioned etching of the metal material may be performed by dry etching or wet etching.
  • the copper material when wet etching is used, the copper material can be etched with an etching solution such as ferric chloride etching solution or hydrochloric acid-copper chloride etching solution.
  • an etching solution such as ferric chloride etching solution or hydrochloric acid-copper chloride etching solution.
  • Step 802 deposit insulating material 40 on the surface S1 of the chip 10 and the surface S3 of the chip 11 respectively.
  • an insulating material 40 may be deposited on the surface S1 of the chip 10 .
  • the thickness of the insulating material 40 deposited is higher than the height of the conductive pillar 30 . Therefore, the insulating material 40 deposited on the surface S1 of the chip 10 also wraps the conductive pillars 30 . Then, deposit a photoresist on the insulating material 40 , and use a mask to etch the insulating material 40 at the boundary, so that the position on the surface S1 of the chip 10 at a preset distance from the edge of the chip 10 is exposed.
  • the insulating material 40 can be deposited on the surface S3 of the chip 11 using the same process. Likewise, a position on the surface S3 of the chip 11 at a preset distance from the edge of the chip 11 is exposed. The resulting structure after this step is shown in Figure 9B.
  • Step 803 flip-chip chip 10 and chip 11 on carrier b.
  • the resulting structure after this step is shown in Figure 9C.
  • the material of the carrier b may include, but not limited to: silicon material, glass material, or a mixture of the two materials, etc., and the carrier b may have a wafer-level or board-level size.
  • the bonding glue a may be firstly coated on the surface of the carrier b. Then, the chips 10 and 11 are pasted side by side and spaced apart on the carrier b. Wherein, the insulating material 40 deposited on the chip 10 is in contact with the bonding glue, and the exposed surface S2 of the chip 10 is arranged on the side away from the carrier b; the insulating material 40 deposited on the chip 11 is in contact with the bonding glue a, and the chip 11 The exposed surface S4 is located on the side away from the carrier b.
  • Step 804 deposit molding material on the surface of the carrier b, the surface S2 of the chip 11 and the surface S4 of the chip 12 .
  • the resulting structure after this step is shown in Figure 9D.
  • the parts of the surface S2, the side surfaces and the surface S1 of the chip 10 that are not covered by the insulating material 40 are all wrapped by the plastic encapsulation material 50; Parts are all wrapped by plastic sealing material 50 .
  • the plastic encapsulation material 50 is also filled between the chip 10 and the chip 11 .
  • Step 805 removing the carrier b from the chips 10 and 11 .
  • the structure after removing the carrier b is shown in FIG. 9E .
  • step 806 the bonding paste a is etched away.
  • the sides of the conductive pillars 30 , the conductive pillars 31 and the insulating material 40 away from the chip 10 and the chip 11 are all exposed.
  • Step 807 forming the redistribution layer 20 on the exposed surface of the conductive pillars 30 , the conductive pillars 31 , the insulating material 40 and the molding material 50 .
  • Step 808 forming a plurality of pads 21 on the side of the redistribution layer 20 away from the chip 10 and the chip 11 .
  • the package structure after the pads 21 are provided is shown in FIG. 9G .
  • the conductive pillar 30 and the conductive pillar 31 are respectively connected to the pad 21 through the multi-layer wiring layer and the via hole on the redistribution layer 20 .
  • the material of the pad 21 may be copper, aluminum, gold or mixed metal materials.
  • Step 809 forming bumps on a plurality of pads 21 .
  • the bumps may be tin bumps.
  • the fan-out wafer level packaging structure as shown in FIG. 1 can be formed.
  • step 810 the PCB is first prepared using standard techniques.
  • the PCB is double-sided wiring, and multiple intermediate wiring layers are arranged between the two sides of the PCB.
  • the wiring layers are connected through via holes.
  • step 811 pre-solder the ball grid array on the surface P2 of the PCB, and the material of the ball grid array may be tin.
  • step 812 mount the bump 60 on the fan-out packaging structure 100 shown in FIG. 1 on the surface P1 of the PCB.
  • Step 813 etching the molding material 50 above the chip 10 and the chip 11 to expose the crystal backs of the chip 10 and the chip 11 .
  • Step 815 deposit heat dissipating material on the exposed crystal backs of the chip 10 and the chip 11 , and on the area of the PCB where no chip is placed.
  • Step 816 mount the heat sink 90 on the surface of the chip 10 with the heat dissipation material 91 , the surface of the chip 11 and the surface of the PCB.
  • the board-level packaging structure 300 prepared through steps 810 to 816 is shown in FIG. 7 .

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

Embodiments of the present application provide a fan-out package structure and a preparation method. The fan-out package structure comprises a first chip and a first redistribution layer; a first surface of the first chip is provided with a plurality of conductive pillars, and the first chip is disposed on a first surface of the first redistribution layer by means of the plurality of conductive pillars; gaps of the plurality of conductive pillars are filled with an insulating material, the insulating material is disposed between the first surface of the first chip and the first surface of the first redistribution layer, and the orthographic projection of the insulating material to the first chip is located at the boundary range of the first chip, and the boundary of the orthographic projection has a preset distance from the boundary of the first chip; the side of the first chip and the part of the first surface of the first chip that is not covered by the insulating material and the plurality of conductive pillars are wrapped by a plastic package material deposited on the first surface of the first redistribution layer. Thus, support and protection can be provided for the edge area of the first chip, avoiding delamination or fracture of the first chip, thereby improving the reliability of the chip.

Description

扇出型芯片封装结构和制备方法Fan-out chip packaging structure and manufacturing method 技术领域technical field
本申请实施例涉及半导体封装技术领域,尤其涉及一种扇出型芯片封装结构和制备方法。The embodiments of the present application relate to the technical field of semiconductor packaging, and in particular to a fan-out chip packaging structure and manufacturing method.
背景技术Background technique
随着通信、人工智能等技术的发展,大量的数据流动与转移的需求越来越大,支持诸如5G应用、人工智能等应用的硬件需要具有高速计算、低延时、多带宽以及系统集成等功能。为了满足硬件设备的功能需求,业界提出采用无载板封装结构将多个芯片封装在一起来提高封装芯片的电学性能。无载板封装结构包括扇入型封装结构(Fan-in Wafer Level Package)和扇出型封装结构(Fan-out Package)等。与扇入型封装结构相比,扇出型封装结构可以提供更多的I/O连接点数量,成为主流方向。With the development of communication, artificial intelligence and other technologies, the demand for a large amount of data flow and transfer is increasing. The hardware supporting applications such as 5G applications and artificial intelligence needs to have high-speed computing, low latency, multi-bandwidth and system integration. Function. In order to meet the functional requirements of hardware devices, the industry proposes to use a substrate-less packaging structure to package multiple chips together to improve the electrical performance of the packaged chips. Substrate-less packaging structures include Fan-in Wafer Level Package and Fan-out Package. Compared with the fan-in packaging structure, the fan-out packaging structure can provide more I/O connection points and become the mainstream direction.
当前扇出型封装结构中,需要将待封装的多个芯片放置在带有临时键合胶的载板上进行晶圆重构。晶圆重构过程中或者可靠性测试时通常引起芯片翘曲,导致每两个芯片之间应力较大的区域产生脱层或断裂,由于每两个芯片之间应力较大的区域设置有用于连通多个芯片的线路,该区域断裂导致线路断裂,从而导致芯片之间的连接失效,进而导致芯片功能失效。由此,如何提高封装芯片的可靠性成为需要解决的问题。In the current fan-out packaging structure, it is necessary to place multiple chips to be packaged on a carrier with temporary bonding glue for wafer reconfiguration. Chip warpage is usually caused during wafer reconfiguration or reliability testing, resulting in delamination or fracture in the area with greater stress between each two chips. Since the area with greater stress between each two chips is provided with For the circuit connecting multiple chips, the fracture of this area will cause the circuit to break, which will lead to the failure of the connection between the chips, and then lead to the failure of the function of the chip. Therefore, how to improve the reliability of the packaged chip becomes a problem to be solved.
发明内容Contents of the invention
本申请提供的扇出型封装结构和制备方法,可以提高所封装的芯片的可靠性。The fan-out packaging structure and preparation method provided in the present application can improve the reliability of the packaged chip.
为达到上述目的,本申请采用如下技术方案:In order to achieve the above object, the application adopts the following technical solutions:
第一方面,本申请实施例提供一种扇出型封装结构,该扇出型封装结构包括:第一芯片和第一重布线层;所述第一芯片的第一表面设置有多个导电柱,所述第一芯片通过所述多个导电柱设置于所述第一重布线层的第一表面;所述多个导电柱的间隙填充有绝缘材料,所述绝缘材料设置于所述第一芯片的第一表面与所述第一重布线层的第一表面之间,所述绝缘材料向所述第一芯片的正投影位于所述第一芯片的边界范围内,且所述正投影的边界与所述第一芯片的边界具有预设距离;所述第一芯片的侧边、以及所述第一芯片的第一表面未被所述绝缘材料和所述多个导电柱覆盖的部分,被沉积于所述第一重布线层第一表面的塑封材料包裹。In the first aspect, the embodiment of the present application provides a fan-out packaging structure, the fan-out packaging structure includes: a first chip and a first redistribution layer; the first surface of the first chip is provided with a plurality of conductive pillars , the first chip is disposed on the first surface of the first redistribution layer through the plurality of conductive pillars; the gaps between the plurality of conductive pillars are filled with insulating material, and the insulating material is disposed on the first Between the first surface of the chip and the first surface of the first redistribution layer, the orthographic projection of the insulating material to the first chip is located within the boundary range of the first chip, and the orthographic projection of the There is a predetermined distance between the boundary and the boundary of the first chip; the side of the first chip and the part of the first surface of the first chip not covered by the insulating material and the plurality of conductive pillars, Wrapped by the molding material deposited on the first surface of the first redistribution layer.
本申请实施例提供的扇出型封装结构,在同一个封装体内可以封装多个第一芯片,该多个第一芯片在封装体内可以平行间隔设置。需要说明的是,该多个第一芯片是指采用同步的工艺制程制作出来的、封装在同一个封装体中的芯片。该多个第一芯片可以是不同类型的芯片。例如,其中一个第一芯片可以是处理器,另外一个第一芯片可以是晶体管。In the fan-out packaging structure provided by the embodiment of the present application, multiple first chips can be packaged in the same package, and the multiple first chips can be arranged in parallel and spaced apart in the package. It should be noted that, the plurality of first chips refer to chips manufactured by using a synchronous process and packaged in a same package. The plurality of first chips may be different types of chips. For example, one of the first chips may be a processor, and the other first chip may be a transistor.
本申请实施例通过将绝缘材料向第一芯片的正投影设置于第一芯片的边界范围内,且该正投影的边界与第一芯片的边界具有预设距离,可以使得第一芯片的第一表面靠第一芯片边缘的部分不沉积绝缘材料,在封装过程中将该部分暴露出来。在第一芯片外部设置塑封材料时,塑封材料可以将第一芯片的侧边以及边角包裹在塑封材料中,可以增加每两个第一芯片之间的塑封材料的厚度,以为每两个第一芯片之间的区域提供支撑和保护,避免每两个第一芯片之间的区域沿第一芯片厚度方向断裂,提高芯片封装的可靠性。In the embodiment of the present application, the orthographic projection of the insulating material to the first chip is set within the boundary range of the first chip, and the boundary of the orthographic projection has a preset distance from the boundary of the first chip, so that the first chip of the first chip No insulating material is deposited on the part of the surface close to the edge of the first chip, and this part is exposed during the packaging process. When the plastic packaging material is arranged outside the first chip, the plastic packaging material can wrap the sides and corners of the first chip in the plastic packaging material, and the thickness of the plastic packaging material between every two first chips can be increased so that every two first chips The area between the chips provides support and protection, preventing the area between every two first chips from breaking along the thickness direction of the first chips, thereby improving the reliability of chip packaging.
本申请实施例提供的绝缘材料,可以是有机聚合物材料,包括但不限于:聚酰亚胺、聚苯并唑、苯并环丁烯、或者环氧成型模料等。The insulating material provided in the embodiment of the present application may be an organic polymer material, including but not limited to: polyimide, polybenzoxazole, benzocyclobutene, or epoxy molding compound.
本申请实施例提供的塑封材料,可以是环氧树脂、聚乙烯、聚丙烯、聚烯烃、聚酰胺、聚亚氨酣中的一种或多种的组合。The molding material provided in the embodiment of the present application may be one or a combination of epoxy resin, polyethylene, polypropylene, polyolefin, polyamide, and polyimide.
基于第一方面,在一种可能的实现方式中,所述多个导电柱与所述第一重布线层接触的表面,与所述绝缘材料与所述第一重布线层接触的表面位于同一水平面。Based on the first aspect, in a possible implementation manner, the surface of the plurality of conductive pillars in contact with the first redistribution layer is located at the same surface as the surface of the insulating material in contact with the first redistribution layer. level.
通过将多个导电柱的表面与绝缘材料的表面设置于同一水平面上,可以使得导电柱的表面和绝缘材料的表面所形成的平面更加平滑,从而更加有利于实现后续的制程工艺。By arranging the surfaces of the plurality of conductive columns and the surface of the insulating material on the same level, the plane formed by the surfaces of the conductive columns and the surface of the insulating material can be made smoother, which is more conducive to the realization of subsequent manufacturing processes.
基于第一方面,在一种可能的实现方式中,所述第一重布线层中与第一表面相对的第二表面设置有多个凸块,所述第一芯片的引出端通过所述多个导电柱和所述第一重布线层与所述多个凸块中的至少部分凸块连通。Based on the first aspect, in a possible implementation manner, the second surface of the first redistribution layer opposite to the first surface is provided with a plurality of bumps, and the lead-out end of the first chip passes through the plurality of bumps. A conductive pillar and the first redistribution layer communicate with at least some of the plurality of bumps.
本申请实施例提供的扇出型封装结构可以为多种类型的封装结构。The fan-out packaging structure provided in the embodiment of the present application may be various types of packaging structures.
在第一种可能的封装结构中,所述扇出型封装结构为晶圆级芯片尺寸封装。在该可能的实现方式中,所述塑封材料还覆盖所述第一芯片中与第一表面相对的第二表面。In a first possible packaging structure, the fan-out packaging structure is wafer-level chip-scale packaging. In this possible implementation manner, the molding material also covers a second surface of the first chip opposite to the first surface.
进一步的,所述晶圆级芯片尺寸封装还可以包括构装堆叠封装结构。在该可能的实现方式中,所述扇出型封装结构还包括第二芯片;所述第二芯片设置于所述第一芯片之上、远离所述第一重布线层的一侧。Further, the wafer-level chip size package may also include building a package-on-package structure. In this possible implementation manner, the fan-out packaging structure further includes a second chip; the second chip is disposed on a side of the first chip away from the first redistribution layer.
在所述扇出型封装结构为构装堆叠封装结构的情况下,所述扇出型封装结构还包括第二重布线层,所述第二重布线层设置于所述塑封材料之上远离所述第一芯片的一侧;所述第二芯片通过多个焊盘设置于所述第二重布线层远离所述第一重布线层的一侧。In the case that the fan-out packaging structure is a package-on-package structure, the fan-out packaging structure further includes a second redistribution layer, and the second redistribution layer is disposed on the molding material away from all One side of the first chip; the second chip is disposed on a side of the second redistribution layer away from the first redistribution layer through a plurality of pads.
在所述扇出型封装结构为构装堆叠封装结构的情况下,进一步的,所述塑封材料远离所述第一芯片的区域开设有连通所述第一重布线层和所述第二重布线层的通孔;所述第二芯片通过所述第二重布线层、所述通孔以及所述第一重布线层与所述第一芯片连接。In the case that the fan-out packaging structure is a package-on-package structure, further, the area of the molding material away from the first chip is provided with a connection between the first rewiring layer and the second rewiring layer. through holes in layers; the second chip is connected to the first chip through the second redistribution layer, the through holes and the first redistribution layer.
在第二种可能的封装结构中,所述扇出型封装结构为板级芯片尺寸封装。在该可能的实现方式中,所述扇出型封装结构还包括印刷电路板;所述重布线层的第二表面通过所述多个凸块设置于所述印刷电路板的第一表面。In a second possible package structure, the fan-out package structure is a board-level chip size package. In this possible implementation manner, the fan-out packaging structure further includes a printed circuit board; the second surface of the redistribution layer is disposed on the first surface of the printed circuit board through the plurality of bumps.
在所述扇出型封装结构为板级芯片尺寸封装结构的情况下,在一种可能的实现方式中,所述扇出型封装结构还包括散热片;所述散热片设置于所述第一芯片的第二表面之上。In the case where the fan-out packaging structure is a board-level chip size packaging structure, in a possible implementation manner, the fan-out packaging structure further includes a heat sink; the heat sink is arranged on the first on the second surface of the chip.
基于第一方面,本申请实施例提供的第一重布线层,包括至少一层图案化的导电线路以及隔离图案化导电线路的绝缘材料,此外,所述第一重布线层还设置有过孔,过孔 填充有导电材料,所述第一芯片通过所述第一重布线层上的导电线路以及所述第一重布线层上设置的过孔,由所述第一重布线层的第一表面引至第二表面,以与所述多个凸块连通。Based on the first aspect, the first redistribution layer provided by the embodiment of the present application includes at least one layer of patterned conductive lines and an insulating material for isolating the patterned conductive lines. In addition, the first redistribution layer is also provided with via holes , the via hole is filled with conductive material, and the first chip passes through the conductive circuit on the first redistribution layer and the via hole provided on the first redistribution layer, and is formed by the first redistribution layer of the first redistribution layer. The surface leads to the second surface to communicate with the plurality of bumps.
基于第一方面,本申请实施例提供的第二重布线层,包括至少一层图案化的导电线路以及隔离图案化导电线路的绝缘材料,此外,所述第二重布线层还设置有过孔,过孔填充有导电材料,所述第二芯片通过所述第二重布线层上的导电线路、所述第二重布线层上设置的过孔、所述通孔以及所述第一重布线层,与所述第一芯片连通。Based on the first aspect, the second redistribution layer provided by the embodiment of the present application includes at least one layer of patterned conductive lines and an insulating material for isolating the patterned conductive lines. In addition, the second redistribution layer is also provided with via holes , the via hole is filled with conductive material, and the second chip passes through the conductive circuit on the second redistribution layer, the via hole provided on the second redistribution layer, the via hole and the first redistribution layer layer, communicated with the first chip.
第二方面,本申请实施例提供一种电子设备,该电子设备包括如第一方面所述的扇出型封装结构。In a second aspect, an embodiment of the present application provides an electronic device, where the electronic device includes the fan-out packaging structure described in the first aspect.
该扇出型封装结构所封装的芯片可以包括但不限于:片上系统(System on chip)、存储器(Memory)、分立器件、应用处理芯片(Application Processor,AP)、微机电系统(Micro-Electro-Mechanical System,MEMS)、微波射频芯片、专用集成电路(ApplicationSpecific Integrated Circuit,简称ASIC)等芯片。上述应用处理芯片或专用集成电路在具体应用中可以是中央处理器(Central Processing Unit,CPU)、图像处理器(Graphics Processing Unit,GPU)、人工智能处理器,例如,神经网络处理器(Network Processing Unit,NPU)等。存储器可以是高速缓冲存储器(cache)、随机存取存储器(Random Access Memory,RAM)、只读存储器(Read Only Memory,ROM)或其他存储器。分立器件例如可以包括但不限于例如场效应晶体管、双极性晶体管、集成运算放大器等。电子设备也可以为集成电路产品,其中,该集成电路产品中除了包括本申请实施例所述的扇出型封装结构外,还可以包括其他集成电路,从而使得本申请实施例所示的扇出型封装结构与其他集成电路之间相互配合,以实现各种电路功能。The chip packaged by the fan-out packaging structure may include but not limited to: System on chip (System on chip), memory (Memory), discrete device, application processing chip (Application Processor, AP), micro-electromechanical system (Micro-Electro- Mechanical System, MEMS), microwave radio frequency chip, application specific integrated circuit (Application Specific Integrated Circuit, referred to as ASIC) and other chips. The above-mentioned application processing chip or application-specific integrated circuit may be a central processing unit (Central Processing Unit, CPU), an image processor (Graphics Processing Unit, GPU), an artificial intelligence processor, for example, a neural network processor (Network Processing Unit, NPU), etc. The memory may be a cache memory (cache), a random access memory (Random Access Memory, RAM), a read-only memory (Read Only Memory, ROM), or other memory. Discrete devices may include, but are not limited to, eg, field effect transistors, bipolar transistors, integrated operational amplifiers, and the like, for example. The electronic device may also be an integrated circuit product, wherein, in addition to the fan-out packaging structure described in the embodiment of the present application, the integrated circuit product may also include other integrated circuits, so that the fan-out package structure shown in the embodiment of the present application The type package structure cooperates with other integrated circuits to realize various circuit functions.
第三方面,本申请实施例提供一种扇出型封装结构的制备方法,该制备方法包括:在第一芯片的第一表面形成多个导电柱;在所述第一芯片的第一表面沉积绝缘材料,所述绝缘材料填充所述多个导电柱的间隙,所述绝缘材料向所述第一芯片的正投影位于所述第一芯片的边界范围内,且所述正投影的边界与所述第一芯片的边界具有预设距离;在所述第一芯片上形成塑封材料,所述塑封材料包裹所述第一芯片的侧边、以及所述第一芯片的第一表面暴露出的部分;在所述多个导电柱、所述绝缘材料和所述塑封材料形成的平面之上形成第一重布线层。In a third aspect, an embodiment of the present application provides a method for preparing a fan-out packaging structure, the preparation method comprising: forming a plurality of conductive pillars on the first surface of the first chip; depositing an insulating material, the insulating material fills the gaps of the plurality of conductive columns, the orthographic projection of the insulating material to the first chip is located within the boundary range of the first chip, and the boundary of the orthographic projection is in line with the The boundary of the first chip has a preset distance; a plastic encapsulation material is formed on the first chip, and the plastic encapsulation material wraps the side of the first chip and the exposed part of the first surface of the first chip ; forming a first redistribution layer on the plane formed by the plurality of conductive pillars, the insulating material and the molding material.
基于第三方面,在一种可能的实现方式中,所述塑封材料还包裹所述第一芯片中与第一表面相对的第二表面。Based on the third aspect, in a possible implementation manner, the molding material further wraps a second surface of the first chip opposite to the first surface.
基于第三方面,在一种可能的实现方式中,所述制备方法还包括:在所述塑封材料远离所述第一重布线层的一侧形成第二重布线层;在所述第二重布线层远离塑封材料的一侧形成多个焊盘;将第二芯片通过所述多个焊盘设置于所述第二重布线层之上。Based on the third aspect, in a possible implementation manner, the preparation method further includes: forming a second redistribution layer on a side of the molding material away from the first redistribution layer; A plurality of welding pads are formed on the side of the wiring layer away from the plastic encapsulation material; the second chip is arranged on the second rewiring layer through the plurality of welding pads.
基于第三方面,在一种可能的实现方式中,所述制备方法还包括:在所述塑封材料远离芯片的区域开设用于连通所述第一重布线层和所述第二重布线层的通孔;所述第二芯片通过所述第一重布线层、所述通孔以及所述第二重布线层与所述第一芯片连通。Based on the third aspect, in a possible implementation manner, the preparation method further includes: opening a hole for connecting the first redistribution layer and the second redistribution layer in a region of the molding material far away from the chip; Through holes: the second chip communicates with the first chip through the first redistribution layer, the through holes and the second redistribution layer.
附图说明Description of drawings
为了更清楚地说明本申请实施例的技术方案,下面将对本申请实施例的描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments of the present application. Obviously, the accompanying drawings in the following description are only some embodiments of the present application , for those skilled in the art, other drawings can also be obtained according to these drawings without paying creative labor.
图1是本申请实施例提供的扇出型封装结构的一个结构示意图;FIG. 1 is a schematic structural diagram of a fan-out packaging structure provided by an embodiment of the present application;
图2是本申请实施例提供的如图1所示的扇出型封装结构沿AA’剖开后的俯视图;Fig. 2 is a top view of the fan-out packaging structure shown in Fig. 1 provided by the embodiment of the present application after being cut along AA';
图3是传统技术中的扇出型封装结构的结构示意图;FIG. 3 is a schematic structural diagram of a fan-out packaging structure in the conventional technology;
图4是如图3所示的扇出型封装结构移除重布线层之后的俯视图;FIG. 4 is a top view of the fan-out packaging structure shown in FIG. 3 after the redistribution layer is removed;
图5是本申请实施例提供的扇出型封装结构的又一个结构示意图;FIG. 5 is another structural schematic diagram of the fan-out packaging structure provided by the embodiment of the present application;
图6是本申请实施例提供的扇出型封装结构的又一个结构示意图;FIG. 6 is another structural schematic diagram of the fan-out packaging structure provided by the embodiment of the present application;
图7是本申请实施例提供的扇出型封装结构的又一个结构示意图;FIG. 7 is another structural schematic diagram of the fan-out packaging structure provided by the embodiment of the present application;
图8是本申请实施例提供的如图1所示的扇出型封装结构的制备方法流程图;FIG. 8 is a flowchart of a method for preparing the fan-out packaging structure shown in FIG. 1 provided in the embodiment of the present application;
图9A-图9G是如图1所示的扇出型封装结构制备过程中的各结构示意图。FIGS. 9A-9G are schematic diagrams of various structures during the preparation process of the fan-out packaging structure shown in FIG. 1 .
具体实施方式Detailed ways
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例是本申请一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The following will clearly and completely describe the technical solutions in the embodiments of the present application with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.
本文所提及的"第一"、"第二"以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。同样,"一个"或者"一"等类似词语也不表示数量限制,而是表示存在至少一个。"First", "second" and similar words mentioned herein do not indicate any order, quantity or importance, but are only used to distinguish different components. Likewise, words like "a" or "one" do not denote a limitation in number, but indicate that there is at least one.
在本申请实施例中,“示例性的”或者“例如”等词用于表示例子、例证或说明。本申请实施例中被描述为“示例性的”或者“例如”的任何实施例或设计方案不应被解释为比其它实施例或设计方案更优选或更具优势。确切而言,使用“示例性的”或者“例如”等词旨在以具体方式呈现相关概念。在本申请实施例的描述中,除非另有说明,“多个”的含义是指两个或两个以上。例如,多个芯片是指两个或两个以上的芯片。In the embodiments of the present application, words such as "exemplary" or "for example" are used to represent examples, illustrations or descriptions. Any embodiment or design scheme described as "exemplary" or "for example" in the embodiments of the present application shall not be interpreted as being more preferred or more advantageous than other embodiments or design schemes. Rather, the use of words such as "exemplary" or "such as" is intended to present related concepts in a concrete manner. In the description of the embodiments of the present application, unless otherwise specified, "plurality" means two or more. For example, a plurality of chips refers to two or more chips.
本申请实施例提供的扇出型封装结构,可以在同一封装体内封装多个芯片。该多个芯片可以水平间隔设置,每一个芯片均通过设置于芯片之上的导电柱和重布线层与其余芯片、公共电源以及公共地连接,以实现多个芯片之间的信号交流。本申请实施例中所述的芯片可以为裸芯片(Die),也可以是裸芯片与其他芯片或部件(有源器件或无源器件等)通过简单封装后形成的芯片,还可以是经过封装之后形成的芯片封装结构,此处不作限定。下面以同一个封装体内包括两个水平设置的芯片为例,结合图1,对本申请实施例中所述的扇出型封装结构进行描述。The fan-out packaging structure provided in the embodiment of the present application can package multiple chips in the same package. The multiple chips can be arranged at intervals horizontally, and each chip is connected to other chips, a common power supply and a common ground through a conductive column and a redistribution layer arranged on the chip, so as to realize signal exchange between the multiple chips. The chip described in the embodiment of the present application may be a bare chip (Die), or a chip formed by simple packaging of a bare chip and other chips or components (active devices or passive devices, etc.), or may be packaged The subsequent chip packaging structure is not limited here. Taking two horizontally arranged chips in the same package as an example, the fan-out package structure described in the embodiment of the present application will be described below with reference to FIG. 1 .
请参考图1,图1是本申请实施例提供的扇出型封装结构的一个结构示意图。在图1中,扇出型封装结构100包括芯片10、芯片11、重布线层20、多个导电柱30和多个导电柱31。芯片10包括相对的表面S1和表面S2,表面S1上形成有多个引出端。芯片 10上的多个引出端通过导电柱30和重布线层20,与芯片11、公共电源以及公共地连接。芯片11包括相对的表面S3和表面S4,表面S3上形成有多个引出端。芯片11上的多个引出端通过导电柱31和重布线层20,与芯片10、公共电源以及公共地连接。多个导电柱30设置于芯片10和布线层20之间,芯片10的引出端通过多个导电柱30被引出至重布线层20的表面D1;多个导电柱31设置于芯片11和布线层20之间,芯片11的引出端通过多个导电柱31被引出至重布线层20的表面D1。需要说明的是,芯片10的表面S1上的引出端和芯片11的表面S3上的引出端可以是焊盘、微凸点(micro-bump)和铜柱凸点(Cu pillar)中的一项。Please refer to FIG. 1 . FIG. 1 is a schematic structural diagram of a fan-out packaging structure provided by an embodiment of the present application. In FIG. 1 , a fan-out package structure 100 includes a chip 10 , a chip 11 , a redistribution layer 20 , a plurality of conductive pillars 30 and a plurality of conductive pillars 31 . The chip 10 includes opposite surfaces S1 and S2, and a plurality of lead terminals are formed on the surface S1. Multiple leads on the chip 10 are connected to the chip 11, the common power supply and the common ground through the conductive pillar 30 and the redistribution layer 20. The chip 11 includes opposite surfaces S3 and S4, and a plurality of lead terminals are formed on the surface S3. Multiple leads on the chip 11 are connected to the chip 10 , the common power supply and the common ground through the conductive pillar 31 and the redistribution layer 20 . A plurality of conductive pillars 30 are arranged between the chip 10 and the wiring layer 20, and the leads of the chip 10 are drawn out to the surface D1 of the rewiring layer 20 through the plurality of conductive pillars 30; a plurality of conductive pillars 31 are arranged between the chip 11 and the wiring layer 20 , the leading end of the chip 11 is led out to the surface D1 of the redistribution layer 20 through a plurality of conductive pillars 31 . It should be noted that the leads on the surface S1 of the chip 10 and the leads on the surface S3 of the chip 11 can be one of pads, micro-bumps and copper pillar bumps (Cu pillar) .
导电柱30的数目可以与芯片10的引出端的数目相同,也即每一个芯片10的引出端均设置有一个导电柱30;导电柱31的数目可以与芯片11的引出端的数目相同,也即每一个芯片11的引出端均设置有一个导电柱31。导电柱30和导电柱31可以是金属材料形成的金属柱,比如铜柱(copper pillar)、铝柱、银柱或者钯柱等,也可以是其他导电材料形成的柱状体,本申请实施例对此不做限定。多个导电柱30之间形成有间隙,同样多个导电柱31之间形成有间隙。该多个导电柱30的间隙以及多个导电柱31的间隙均填充有绝缘材料40,该绝缘材料40可以为有机聚合物材料。该有机聚合物材料可以包括但不限于:聚酰亚胺(PI,Polyimide)、聚苯并唑(ploybenzoxazole,PBO)、苯并环丁烯(BCB)、或者环氧成型模料(Epoxy Molding Compound,EMC)等。The number of conductive pillars 30 can be the same as the number of lead ends of the chip 10, that is, each lead end of the chip 10 is provided with a conductive pillar 30; the number of conductive pillars 31 can be the same as the number of lead ends of the chip 11, that is, every Each lead-out end of a chip 11 is provided with a conductive post 31 . The conductive pillars 30 and the conductive pillars 31 can be metal pillars formed of metal materials, such as copper pillars, aluminum pillars, silver pillars or palladium pillars, etc., and can also be pillars formed of other conductive materials. This is not limited. Gaps are formed between the plurality of conductive columns 30 , and gaps are also formed between the plurality of conductive columns 31 . The gaps between the plurality of conductive pillars 30 and the gaps between the plurality of conductive pillars 31 are filled with an insulating material 40 , and the insulating material 40 may be an organic polymer material. The organic polymer material may include but not limited to: polyimide (PI, Polyimide), polybenzoxazole (ploybenzoxazole, PBO), benzocyclobutene (BCB), or epoxy molding compound (Epoxy Molding Compound , EMC) etc.
绝缘材料40分别沉积于芯片10的表面S1以及芯片11的表面S3。沿如图1所示的方向x,也即芯片的厚度方向,绝缘材料40的高度分别与导电柱30和导电柱31的高度相同。此外,沉积于芯片10的表面S1的绝缘材料40,向芯片10的表面S1的第一正投影位于芯片10的边界范围内,且该第一正投影的边界与芯片10的边界具有第一预设距离;沉积于芯片11的表面S3的绝缘材料40,向芯片11的表面S3的第二正投影位于芯片11的边界范围内,且该第二正投影的边界与芯片11的边界同样具有第二预设距离。上述第一预设距离和第二预设距离可以相同,也可以不同,根据应用场景的需要设置。如图2所示,图2为如图1所示的扇出型封装结构100沿AA’剖开后的俯视图。从图2中可以看出,芯片10的表面S1靠近芯片10边缘的区域A1未沉积绝缘材料40,芯片11的表面S3靠近芯片11边缘的区域A2未沉积绝缘材料40。从而,扇出型封装结构300在未设置塑封材料之前,芯片10和芯片11的侧边、芯片10的表面S1靠近边缘的部分以及芯片20的表面S3靠近边缘的部分均裸露出来。The insulating material 40 is deposited on the surface S1 of the chip 10 and the surface S3 of the chip 11 respectively. Along the direction x shown in FIG. 1 , that is, the thickness direction of the chip, the height of the insulating material 40 is the same as that of the conductive pillars 30 and the conductive pillars 31 . In addition, the first orthographic projection of the insulating material 40 deposited on the surface S1 of the chip 10 to the surface S1 of the chip 10 is located within the boundary range of the chip 10, and the boundary of the first orthographic projection and the boundary of the chip 10 have a first predetermined relationship. Suppose the distance; the insulating material 40 deposited on the surface S3 of the chip 11, the second orthographic projection to the surface S3 of the chip 11 is located within the boundary range of the chip 11, and the boundary of the second orthographic projection and the boundary of the chip 11 have the same Two preset distances. The above-mentioned first preset distance and second preset distance may be the same or different, and are set according to the requirements of the application scenario. As shown in FIG. 2 , FIG. 2 is a top view of the fan-out packaging structure 100 shown in FIG. 1 cut along AA'. It can be seen from FIG. 2 that no insulating material 40 is deposited on the area A1 near the edge of the chip 10 on the surface S1 of the chip 10 , and no insulating material 40 is deposited on the area A2 near the edge of the chip 11 on the surface S3 of the chip 11 . Therefore, in the fan-out packaging structure 300 , before the molding compound is provided, the sides of the chip 10 and the chip 11 , the portion of the surface S1 of the chip 10 near the edge, and the portion of the surface S3 of the chip 20 near the edge are all exposed.
如图1所示的扇出型封装结构中,还包括塑封材料50。该塑封材料例如可以包括环氧树脂(Epoxy Molding Compound,EMC)、聚乙烯、聚丙烯、聚烯烃、聚酰胺、聚亚氨酣中的一种或多种的组合。扇出型封装结构100沉积塑封材料50后,塑封材料50包裹芯片10和芯片11中、未被绝缘材料40、导电柱30和导电柱31覆盖的部分。In the fan-out packaging structure shown in FIG. 1 , a plastic encapsulation material 50 is also included. The molding material may include, for example, one or more combinations of epoxy resin (Epoxy Molding Compound, EMC), polyethylene, polypropylene, polyolefin, polyamide, and polyimide. After the plastic encapsulation material 50 is deposited in the fan-out packaging structure 100 , the plastic encapsulation material 50 wraps the parts of the chip 10 and the chip 11 that are not covered by the insulating material 40 , the conductive pillars 30 and the conductive pillars 31 .
传统扇出型先芯片(Chip-First)封装技术中,通常将绝缘材料40完全覆盖芯片10的表面S1和芯片11的表面S3,塑封材料50包裹芯片10的表面S2和侧面,塑封材料50还包裹芯片11的表面S4和侧面,如图3和图4所示,图3为传统技术中扇出型封装结构的一个示意图,图4为如图3所示的扇出型封装结构移除重布线层20之后的俯视图。在包括多芯片的扇出型封装结构中,每两个芯片之间的区域具有较大的应力。当采 用图3所示的封装结构时,由于工艺制程中蚀刻等工艺步骤的影响,塑封材料50的边缘比较薄弱,也即塑封材料50中设置于芯片10和芯片11之间的部分比较薄弱。薄弱的塑封材料50不足以支撑芯片10和芯片11中间区域的应力,导致芯片10和芯片11之间的区域沿x方向断裂。从图3中可以看出,当芯片10和芯片11之间的区域沿x方向断裂时,重布线层20的H区域也有可能断裂。由于重布线层20的H区域设置有用于连通芯片10和芯片11、以及将芯片10和芯片11与公共电源和公共地连接的导电线路,布线层20的H区域断裂导致导电线路断裂,从而导致芯片之间的连接、芯片与公共电源之间的连接或者芯片与公共地之间的连接失效,进而导致芯片功能失效。In the traditional fan-out chip-first (Chip-First) packaging technology, the insulating material 40 is usually used to completely cover the surface S1 of the chip 10 and the surface S3 of the chip 11, and the surface S2 and the side surfaces of the chip 10 are wrapped by the plastic packaging material 50. Wrap the surface S4 and the side of the chip 11, as shown in Figure 3 and Figure 4, Figure 3 is a schematic diagram of the fan-out packaging structure in the traditional technology, Figure 4 is the fan-out packaging structure shown in Figure 3 with heavy The top view after the wiring layer 20. In a fan-out packaging structure including multiple chips, the area between every two chips has relatively large stress. When the packaging structure shown in FIG. 3 is adopted, due to the influence of etching and other process steps in the process, the edge of the molding material 50 is relatively weak, that is, the part of the molding material 50 disposed between the chip 10 and the chip 11 is relatively weak. The weak plastic encapsulation material 50 is not enough to support the stress in the middle area of the chip 10 and the chip 11 , causing the area between the chip 10 and the chip 11 to fracture along the x direction. It can be seen from FIG. 3 that when the area between the chip 10 and the chip 11 is broken along the x direction, the H area of the redistribution layer 20 may also be broken. Since the H area of the rewiring layer 20 is provided with conductive lines for connecting the chip 10 and the chip 11, and connecting the chip 10 and the chip 11 with the common power supply and the common ground, the break of the H area of the wiring layer 20 causes the breakage of the conductive line, thereby causing The connection between the chips, the connection between the chip and the public power supply, or the connection between the chip and the common ground fails, which leads to the failure of the function of the chip.
本申请实施例在芯片10的表面S1靠近芯片10边缘的部分、以及芯片11的表面S3靠近芯片11边缘的部分不沉积绝缘材料40,在封装过程中将该部分暴露出来。在芯片1外部设置塑封材料50时,塑封材料50可以将芯片10以及芯片11的侧边以及边角包裹在塑封材料50中,从而可以增加芯片10和芯片11之间的塑封材料50的厚度,以为芯片10和芯片11之间的区域提供支撑和保护,避免芯片10和芯片11之间的区域沿x方向断裂,提高芯片封装的可靠性。In this embodiment of the present application, no insulating material 40 is deposited on the part of the surface S1 of the chip 10 near the edge of the chip 10 and the part of the surface S3 of the chip 11 near the edge of the chip 11 , and these parts are exposed during the packaging process. When the plastic packaging material 50 is arranged outside the chip 1, the plastic packaging material 50 can wrap the sides and corners of the chip 10 and the chip 11 in the plastic packaging material 50, thereby increasing the thickness of the plastic packaging material 50 between the chip 10 and the chip 11, Provide support and protection for the area between the chip 10 and the chip 11, prevent the area between the chip 10 and the chip 11 from breaking along the x direction, and improve the reliability of the chip package.
请继续参考图1,在图1中,重布线层20可以包括至少一层图案化的导电线路以及隔离图案化导电线路的绝缘材料,用于形成图案化导电线路的导电材料可以是金属,如铜(Cu)、银(Ag)、铝(Al)等金属中的一种或多种的组合,用于形成图案化导电线路的导电材料还可以是氧化钮锡(ITO)、石墨、石墨烯等;绝缘材料可以是无机绝缘材料或有机绝缘材料等。重布线层20还可以设置有过孔(Via),该过孔可以包括但不限于:通孔或埋孔等。过孔中可以填充有导电材料。此外,在重布线层20的表面D2还设置有焊盘(Pad)21,每一个焊盘21上设置有多个凸块60,该凸块60的材料可以包括但不限于:锡材料或者锡银混合材料等。芯片10的引出端通过重布线层20上的导电线路以及重布线层20上设置的过孔,由重布线层20的表面D1引至表面D2,从而与一部分凸块60连通;芯片11的引出端通过重布线层20上的导电线路以及重布线层20上设置的过孔,由重布线层20的表面D1引至表面D2,从而与另一部分凸块60连通。芯片10和芯片20之间还可以通过重布线层20上的线路连接,从而实现芯片10和芯片20之间的信号交流。Please continue to refer to FIG. 1. In FIG. 1, the redistribution layer 20 may include at least one patterned conductive circuit and an insulating material for isolating the patterned conductive circuit. The conductive material used to form the patterned conductive circuit may be metal, such as A combination of one or more of copper (Cu), silver (Ag), aluminum (Al) and other metals, the conductive material used to form patterned conductive lines can also be button tin oxide (ITO), graphite, graphene etc.; the insulating material can be an inorganic insulating material or an organic insulating material, etc. The redistribution layer 20 may also be provided with vias (Via), which may include but not limited to: through holes or buried holes. The vias may be filled with conductive material. In addition, pads (Pad) 21 are also provided on the surface D2 of the redistribution layer 20, and a plurality of bumps 60 are arranged on each pad 21. The material of the bumps 60 may include but not limited to: tin material or tin Silver mixed materials, etc. The lead-out end of the chip 10 is led from the surface D1 of the redistribution layer 20 to the surface D2 through the conductive lines on the redistribution layer 20 and the via holes provided on the redistribution layer 20, thereby communicating with a part of the bumps 60; the lead out of the chip 11 The end is led from the surface D1 to the surface D2 of the redistribution layer 20 through the conductive lines on the redistribution layer 20 and the via holes provided on the redistribution layer 20 , so as to communicate with another part of the bump 60 . The chip 10 and the chip 20 can also be connected through the lines on the redistribution layer 20 , so as to realize the signal communication between the chip 10 and the chip 20 .
如图1所示的扇出型封装结构100中,示出了同一个封装体内封装有两个平行间隔设置的芯片。本申请实施例所述的扇出型封装结构还可以是扇出型构装堆叠(FO-PoP,Fan Out-Package on Package)封装结构。请参考图5,图5是本申请实施例提供的扇出型封装结构200的一个示意图。在图5中,扇出型封装结构200除了包括水平间隔设置的芯片10和芯片11之外,还包括芯片12。沿如图5所示的方向x,芯片12设置于芯片10和芯片11之上。具体的,扇出型封装结构200在包括如图1所示的扇出型封装结构100的基础上,还包括重布线层70。重布线层70可以包括至少一层图案化的导电线路以及隔离图案化导电线路的绝缘材料,用于形成图案化导电线路的导电材料可以是金属,如铜(Cu)、银(Ag)、铝(Al)等金属中的一种或多种的组合,用于形成图案化导电线路的导电材料还可以是氧化钮锡(ITO)、石墨、石墨烯等;绝缘材料可以是无机绝缘材料或有机绝缘材料等。重布线层70设置于塑封材料50之上。重布线层70之上还设置 有多个焊盘(Pad)71,芯片12的引出端与焊盘71焊接在一起,从而芯片12的引出端被引出至重布线层70的表面。此外,沿图5所示的方向x,塑封材料50上还设置有多个贯穿塑封材料50的上表面和下表面的通孔51,通孔51中灌注有导电材料,该通孔51用于连通重布线层20以及重布线层70。芯片12的引出端通过重布线层70上的导电线路以及通孔51引至重布线层20的表面D1,然后通过重布线层20上所设置的导电线路与芯片10和芯片11连通,实现芯片12与芯片10以及芯片11之间的信号交流。In the fan-out packaging structure 100 shown in FIG. 1 , it is shown that two parallel and spaced chips are packaged in the same package. The fan-out package structure described in the embodiment of the present application may also be a fan-out package stack (FO-PoP, Fan Out-Package on Package) package structure. Please refer to FIG. 5 , which is a schematic diagram of a fan-out packaging structure 200 provided by an embodiment of the present application. In FIG. 5 , the fan-out packaging structure 200 includes not only the chips 10 and 11 arranged horizontally apart, but also the chip 12 . Along the direction x shown in FIG. 5 , the chip 12 is disposed on the chip 10 and the chip 11 . Specifically, the fan-out packaging structure 200 further includes a redistribution layer 70 on the basis of the fan-out packaging structure 100 shown in FIG. 1 . The redistribution layer 70 can include at least one layer of patterned conductive lines and an insulating material that isolates the patterned conductive lines. The conductive material used to form the patterned conductive lines can be metal, such as copper (Cu), silver (Ag), aluminum A combination of one or more of metals such as (Al), the conductive material used to form patterned conductive lines can also be button tin oxide (ITO), graphite, graphene, etc.; the insulating material can be an inorganic insulating material or an organic insulating materials, etc. The redistribution layer 70 is disposed on the molding compound 50 . A plurality of pads (Pad) 71 are also arranged on the redistribution layer 70 , and the leads of the chip 12 are soldered to the pads 71 , so that the leads of the chip 12 are led out to the surface of the redistribution layer 70 . In addition, along the direction x shown in FIG. 5 , the molding compound 50 is also provided with a plurality of through holes 51 penetrating through the upper surface and the lower surface of the molding material 50, and the through holes 51 are filled with conductive materials. The through holes 51 are used for The redistribution layer 20 and the redistribution layer 70 are connected. The lead-out end of the chip 12 is led to the surface D1 of the redistribution layer 20 through the conductive circuit on the redistribution layer 70 and the through hole 51, and then communicates with the chip 10 and the chip 11 through the conductive circuit provided on the redistribution layer 20 to realize the chip. 12 and the signal exchange between the chip 10 and the chip 11.
图4所示的扇出型封装结构中,在芯片10和芯片11之上堆叠有一个芯片;在其他可能的实现方式中,在芯片10和芯片11之上可以依次堆叠更多个芯片,各芯片之间通过设置于绝缘层上的通孔连通,本申请实施例对此不做具体限定。In the fan-out package structure shown in FIG. 4 , one chip is stacked on the chip 10 and the chip 11; The chips are communicated with each other through a through hole provided on the insulating layer, which is not specifically limited in this embodiment of the present application.
图1和图5所示的扇出型封装结构为扇出型晶圆级芯片尺寸封装(FO-WLCSP,Fan Out-Wafe Level Chip Scale Package)。本申请实施例所示的扇出型封装结构也可以是扇出型板级封装(FO-PLP,Fan Out-Panel Level Package)。具体的,该板级封装可以为倒装芯片球栅阵列(FCBGA,Flip Chip Ball Grid Array)。请参考图6,图6是本申请实施例提供的扇出型板级封装300的一个结构示意图。在图6中,扇出型板级封装300除了包括图1所示的扇出型封装结构100外,还包括印刷电路板(PCB,Print Circuit Board)80。该PCB80可以包括多层布线层。PCB80的表面P1、与表面P1相对的表面P2以及位于表面P1和表面P2之间的中间布线层均设置有图案化的导电线路。PCB80还设置有过孔(Via),该过孔可以包括但不限于:通孔或埋孔等。PCB80的表面P1的导电线路、中间布线层上的导电线路以及表面P2的导电线路可以通过过孔连通。此外,PCB80的表面P2还设置有球栅阵列81。扇出型封装结构100通过凸块60装贴于PCB80的表面P1,进而扇出型封装结构100中所封装的芯片10的引出端以及芯片11的引出端通过凸块60引至PCB80的表面P2上的球栅阵列81。The fan-out package structure shown in Figure 1 and Figure 5 is Fan Out-Wafer Level Chip Scale Package (FO-WLCSP, Fan Out-Wafe Level Chip Scale Package). The fan-out packaging structure shown in the embodiment of the present application may also be a Fan Out-Panel Level Package (FO-PLP, Fan Out-Panel Level Package). Specifically, the board-level package may be a Flip Chip Ball Grid Array (FCBGA, Flip Chip Ball Grid Array). Please refer to FIG. 6 , which is a schematic structural diagram of a fan-out board-level package 300 provided by an embodiment of the present application. In FIG. 6 , the fan-out board-level package 300 includes a printed circuit board (PCB, Print Circuit Board) 80 in addition to the fan-out package structure 100 shown in FIG. 1 . The PCB 80 may include multiple wiring layers. The surface P1 of the PCB 80 , the surface P2 opposite to the surface P1 , and the intermediate wiring layer between the surface P1 and the surface P2 are all provided with patterned conductive lines. The PCB 80 is also provided with vias (Via), which may include but not limited to: through holes or buried holes. The conductive lines on the surface P1 of the PCB 80 , the conductive lines on the intermediate wiring layer and the conductive lines on the surface P2 can be connected through via holes. In addition, the surface P2 of the PCB 80 is also provided with a ball grid array 81 . The fan-out packaging structure 100 is attached to the surface P1 of the PCB 80 through the bumps 60, and then the leads of the chip 10 and the lead-out ends of the chips 11 packaged in the fan-out packaging structure 100 are led to the surface P2 of the PCB 80 through the bumps 60. Ball grid array 81 on.
进一步的,在图6所示的扇出型板级封装结构300的基础上,本申请实施例提供的扇出型板级封装结构还可以包括散热片90。此时,芯片10的表面S2和芯片11的表面S4之上均不设置塑封材料50,芯片10的表面S2和芯片11的表面S4之上涂布有散热材料,PCB80上未设置扇出型封装结构100的区域也可以涂布散热材料91,散热片90通过散热材料91贴装在芯片10的表面S2、芯片11的表面S4以及PCB的表面P1。芯片10和芯片11在工作过程中,可以通过散热片散热。此外,散热片90还可以为扇出型封装结构100提供物理保护。Further, on the basis of the fan-out board-level packaging structure 300 shown in FIG. 6 , the fan-out board-level packaging structure provided in the embodiment of the present application may further include a heat sink 90 . At this time, neither the surface S2 of the chip 10 nor the surface S4 of the chip 11 is provided with the plastic encapsulation material 50, the surface S2 of the chip 10 and the surface S4 of the chip 11 are coated with a heat dissipation material, and no fan-out package is provided on the PCB 80 The area of the structure 100 may also be coated with a heat dissipation material 91 , and the heat dissipation sheet 90 is mounted on the surface S2 of the chip 10 , the surface S4 of the chip 11 and the surface P1 of the PCB through the heat dissipation material 91 . During the working process, the chip 10 and the chip 11 can dissipate heat through the heat sink. In addition, the heat sink 90 can also provide physical protection for the fan-out packaging structure 100 .
本申请实施例还包括一种电子设备,该电子设备包括如上所述的各实施例所示的扇出型封装结构。该扇出型封装结构所封装的芯片可以包括但不限于:片上系统(System on chip)、存储器(Memory)、分立器件、应用处理芯片(Application Processor,AP)、微机电系统(Micro-Electro-Mechanical System,MEMS)、微波射频芯片、专用集成电路(ApplicationSpecific Integrated Circuit,简称ASIC)等芯片。上述应用处理芯片或专用集成电路在具体应用中可以是中央处理器(Central Processing Unit,CPU)、图像处理器(Graphics Processing Unit,GPU)、人工智能处理器,例如,神经网络处理器(Network Processing Unit,NPU)等。存储器可以是高速缓冲存储器(cache)、随机存取存储器(Random Access Memory,RAM)、只读存储器(Read Only Memory,ROM)或其他存储器。 分立器件例如可以包括但不限于例如场效应晶体管、双极性晶体管、集成运算放大器等。例如,当采用图1或图6所示的扇出型封装结构时,扇出型封装结构中所封装的芯片10和芯片11可以分别为应用处理芯片和分立器件;再例如,当采用图5所示的扇出型封装结构时,扇出型封装结构中所封装的芯片10和芯片11可以分别为应用处理芯片和分立器件,芯片12可以为存储器。电子设备也可以为集成电路产品,其中,该集成电路产品中除了包括本申请实施例所述的扇出型封装结构外,还可以包括其他集成电路,从而使得本申请实施例所示的扇出型封装结构与其他集成电路之间相互配合,以实现各种电路功能。The embodiment of the present application also includes an electronic device, where the electronic device includes the fan-out packaging structure shown in the above-mentioned embodiments. The chip packaged by the fan-out packaging structure may include but not limited to: System on chip (System on chip), memory (Memory), discrete device, application processing chip (Application Processor, AP), micro-electromechanical system (Micro-Electro- Mechanical System, MEMS), microwave radio frequency chip, application specific integrated circuit (Application Specific Integrated Circuit, referred to as ASIC) and other chips. The above-mentioned application processing chip or application-specific integrated circuit may be a central processing unit (Central Processing Unit, CPU), an image processor (Graphics Processing Unit, GPU), an artificial intelligence processor, for example, a neural network processor (Network Processing Unit, NPU), etc. The memory may be a cache memory (cache), a random access memory (Random Access Memory, RAM), a read-only memory (Read Only Memory, ROM), or other memory. Discrete devices may include, but are not limited to, eg, field effect transistors, bipolar transistors, integrated operational amplifiers, and the like, for example. For example, when the fan-out packaging structure shown in FIG. 1 or FIG. 6 is adopted, the chip 10 and the chip 11 packaged in the fan-out packaging structure can be application processing chips and discrete devices respectively; In the fan-out packaging structure shown, the chips 10 and 11 packaged in the fan-out packaging structure may be application processing chips and discrete devices respectively, and the chip 12 may be a memory. The electronic device may also be an integrated circuit product, wherein, in addition to the fan-out packaging structure described in the embodiment of the present application, the integrated circuit product may also include other integrated circuits, so that the fan-out package structure shown in the embodiment of the present application The type package structure cooperates with other integrated circuits to realize various circuit functions.
基于如上各实施例所述的扇出型封装结构,本申请实施例还提供一种用于制备扇出型封装结构的方法,下面以制备出的扇出型封装结构的结构如图1所示为例,结合图8所示的流程800,对制备扇出型封装结构的工艺流程进行详细描述。该工艺流程800包括如下步骤:Based on the fan-out packaging structure described in the above embodiments, the embodiment of the present application also provides a method for preparing a fan-out packaging structure. The structure of the prepared fan-out packaging structure is shown in Figure 1 below As an example, with reference to the process 800 shown in FIG. 8 , the process flow of preparing the fan-out packaging structure will be described in detail. The process flow 800 includes the following steps:
步骤801,在待封装的芯片10的引出端形成导电柱30,在待封装的芯片11的引出端形成导电柱31。 Step 801 , forming conductive pillars 30 at the leading end of the chip 10 to be packaged, and forming conductive pillars 31 at the leading end of the chip 11 to be packaged.
本申请实施例中,在芯片10的引出端形成导电柱30的工艺制程与在芯片11的引出端形成导电柱31的工艺制程相同。下面以在芯片10的引出端形成导电柱30的工艺制程为例,对本步骤进行描述。In the embodiment of the present application, the process of forming the conductive pillar 30 at the lead-out end of the chip 10 is the same as the process of forming the conductive pillar 31 at the lead-out end of the chip 11 . This step will be described below by taking the process of forming the conductive pillar 30 at the leading end of the chip 10 as an example.
假设芯片10的表面S1形成有引出端。首先,利用气相沉积(例如物理气相沉积或者化学气相沉积)的方法在芯片10的表面S1沉积金属材料。该金属材料可以包括但不限于:铜、铝、银、金等材料或者金属的合金材料等。接着,在金属材料的表面沉积光刻胶。然后,利用掩模板刻蚀金属材料中、未覆盖芯片10的引出端的部分,从而在芯片10的表面S1上形成导电柱30,如图9A所示。上述对金属材料的刻蚀可以采用干法刻蚀或者湿法刻蚀。以芯片10所沉积的金属材料为铜材料为例,当采用湿法刻蚀时,可以采用氯化铁蚀刻液或者盐酸-氯化铜蚀刻液等蚀刻液对铜材料蚀刻。Assume that the surface S1 of the chip 10 is formed with leads. Firstly, a metal material is deposited on the surface S1 of the chip 10 by vapor deposition (such as physical vapor deposition or chemical vapor deposition). The metal material may include, but is not limited to: materials such as copper, aluminum, silver, gold, or metal alloy materials. Next, a photoresist is deposited on the surface of the metal material. Then, a mask is used to etch the part of the metal material that does not cover the leading end of the chip 10 , so as to form the conductive pillar 30 on the surface S1 of the chip 10 , as shown in FIG. 9A . The aforementioned etching of the metal material may be performed by dry etching or wet etching. Taking the metal material deposited on the chip 10 as copper material as an example, when wet etching is used, the copper material can be etched with an etching solution such as ferric chloride etching solution or hydrochloric acid-copper chloride etching solution.
为了对芯片10进行更好的保护,对金属材料刻蚀时避免将芯片10部分刻蚀以影响芯片10的电气性能,在一种可能的实现方式中,在芯片10的表面S1沉积金属材料之前,可以首先在芯片10的表面S1沉积不同于上述金属材料的另外一种金属材料以形成阻挡层。该阻挡层的刻蚀速度慢于金属材料的刻蚀速度。例如,金属材料为铜材料时,形成阻挡层的材料例如可以为钛材料。需要说明的是,当芯片10上形成有阻挡层时,步骤801中对金属材料刻蚀后,还需要对暴露出的阻挡层进行进一步刻蚀。In order to better protect the chip 10, when etching the metal material, avoid partially etching the chip 10 to affect the electrical performance of the chip 10. In a possible implementation, before depositing the metal material on the surface S1 of the chip 10 Alternatively, another metal material different from the above metal material may be deposited on the surface S1 of the chip 10 to form a barrier layer. The etching speed of the barrier layer is slower than that of the metal material. For example, when the metal material is copper material, the material forming the barrier layer may be titanium material, for example. It should be noted that, when the barrier layer is formed on the chip 10 , after the metal material is etched in step 801 , the exposed barrier layer needs to be further etched.
在芯片11的引出端形成导电柱31的工艺制程具体参考在芯片10的引出端形成导电柱30的工艺制程,不再赘述。For the process of forming the conductive pillar 31 at the lead-out end of the chip 11 , please refer to the process of forming the conductive pillar 30 at the lead-out end of the chip 10 , which will not be repeated here.
步骤802,在芯片10的表面S1和芯片11的表面S3分别沉积绝缘材料40。 Step 802 , deposit insulating material 40 on the surface S1 of the chip 10 and the surface S3 of the chip 11 respectively.
在芯片10的引出端形成导电柱30后,可以在芯片10的表面S1沉积绝缘材料40。沿绝缘材料40的沉积方向,绝缘材料40沉积的厚度高于导电柱30的高度。从而,沉积在芯片10的表面S1的绝缘材料40同样将导电柱30包裹。然后,在绝缘材料40之上沉积光刻胶,利用掩模版对位于边界处的绝缘材料40刻蚀,使得芯片10的表面S1上、距离芯片10的边缘预设距离处的位置暴露出来。在芯片11的引出端形成导电柱31 后,可以采用同样的工艺制程在芯片11的表面S3沉积绝缘材料40。同样,芯片11的表面S3上、距离芯片11的边缘预设距离处的位置暴露出来。该步骤后所形成的结构如图9B所示。After the conductive pillars 30 are formed at the leads of the chip 10 , an insulating material 40 may be deposited on the surface S1 of the chip 10 . Along the deposition direction of the insulating material 40 , the thickness of the insulating material 40 deposited is higher than the height of the conductive pillar 30 . Therefore, the insulating material 40 deposited on the surface S1 of the chip 10 also wraps the conductive pillars 30 . Then, deposit a photoresist on the insulating material 40 , and use a mask to etch the insulating material 40 at the boundary, so that the position on the surface S1 of the chip 10 at a preset distance from the edge of the chip 10 is exposed. After the conductive pillars 31 are formed at the leads of the chip 11 , the insulating material 40 can be deposited on the surface S3 of the chip 11 using the same process. Likewise, a position on the surface S3 of the chip 11 at a preset distance from the edge of the chip 11 is exposed. The resulting structure after this step is shown in Figure 9B.
步骤803,将芯片10和芯片11倒装在载板b上。该步骤后所形成的结构如图9C所示。 Step 803, flip-chip chip 10 and chip 11 on carrier b. The resulting structure after this step is shown in Figure 9C.
载板b的材料可以包括但不限于:硅材料、玻璃材料或者二者混合材料等,载板b可以是晶圆级或板级的尺寸。The material of the carrier b may include, but not limited to: silicon material, glass material, or a mixture of the two materials, etc., and the carrier b may have a wafer-level or board-level size.
在一种可能的实现方式中,在芯片10所沉积的有机聚合物40的表面涂布键合胶a,将芯片10中涂布有键合胶a的一面贴装在载板b上。同样,在芯片11所沉积的有机聚合物40的表面涂布键合胶a,将芯片11中涂布有键合胶a的一面贴装在载板b上。其中,芯片10和芯片11在载板b上并排间隔设置。In a possible implementation manner, the bonding glue a is coated on the surface of the deposited organic polymer 40 of the chip 10 , and the side of the chip 10 coated with the bonding glue a is mounted on the carrier b. Similarly, the bonding glue a is coated on the surface of the deposited organic polymer 40 of the chip 11 , and the side of the chip 11 coated with the bonding glue a is mounted on the carrier b. Wherein, the chip 10 and the chip 11 are arranged side by side and spaced apart on the carrier b.
在另一种可能的实现方式中,可以首先在载板b的表面涂布键合胶a。然后,将芯片10和芯片11并排间隔粘贴在载板b上。其中,芯片10上沉积的绝缘材料40与键合胶接触,芯片10裸露在外面的表面S2设置于远离载板b的一侧;芯片11上沉积的绝缘材料40与键合胶a接触,芯片11裸露在外面的表面S4设置于远离载板b的一侧。In another possible implementation manner, the bonding glue a may be firstly coated on the surface of the carrier b. Then, the chips 10 and 11 are pasted side by side and spaced apart on the carrier b. Wherein, the insulating material 40 deposited on the chip 10 is in contact with the bonding glue, and the exposed surface S2 of the chip 10 is arranged on the side away from the carrier b; the insulating material 40 deposited on the chip 11 is in contact with the bonding glue a, and the chip 11 The exposed surface S4 is located on the side away from the carrier b.
步骤804,在载板b的表面、芯片11的表面S2和芯片12的表面S4沉积塑封材料。该步骤后所形成的结构如图9D所示。 Step 804 , deposit molding material on the surface of the carrier b, the surface S2 of the chip 11 and the surface S4 of the chip 12 . The resulting structure after this step is shown in Figure 9D.
从图9D中可以看出,芯片10的表面S2、侧面以及表面S1未被绝缘材料40覆盖的部分均被塑封材料50包裹;芯片11的表面S4、侧面以及表面S3未被绝缘材料40覆盖的部分均被塑封材料50包裹。同样,芯片10和芯片11之间也填充有塑封材料50。从而,可以增加芯片10和芯片11之间的塑封材料50的厚度,以为芯片10和芯片11之间的区域提供支撑和保护,避免芯片10和芯片11之间的区域沿x方向断裂,提高芯片封装的可靠性。As can be seen from FIG. 9D , the parts of the surface S2, the side surfaces and the surface S1 of the chip 10 that are not covered by the insulating material 40 are all wrapped by the plastic encapsulation material 50; Parts are all wrapped by plastic sealing material 50 . Similarly, the plastic encapsulation material 50 is also filled between the chip 10 and the chip 11 . Thereby, the thickness of the molding material 50 between the chip 10 and the chip 11 can be increased to provide support and protection for the area between the chip 10 and the chip 11, avoiding the fracture of the area between the chip 10 and the chip 11 along the x direction, and improving the performance of the chip. package reliability.
步骤805,将载板b从芯片10和芯片11上移除。载板b移除后的结构如图9E所示。 Step 805 , removing the carrier b from the chips 10 and 11 . The structure after removing the carrier b is shown in FIG. 9E .
步骤806,对封装结构中设置有键合胶的一侧进行平坦化处理,以暴露出导电柱30和导电柱31。封装结构平坦化处理后形成的结构如图9F所示。 Step 806 , planarize the side of the packaging structure where the bonding glue is disposed, so as to expose the conductive pillars 30 and the conductive pillars 31 . The structure formed after the package structure planarization process is shown in FIG. 9F .
经过步骤806后,键合胶a被刻蚀掉。导电柱30、导电柱31以及绝缘材料40远离芯片10和芯片11的一侧均暴露出来。After step 806, the bonding paste a is etched away. The sides of the conductive pillars 30 , the conductive pillars 31 and the insulating material 40 away from the chip 10 and the chip 11 are all exposed.
步骤807,在暴露出的导电柱30、导电柱31、绝缘材料40以及塑封材料50所形成的表面上形成重布线层20。 Step 807 , forming the redistribution layer 20 on the exposed surface of the conductive pillars 30 , the conductive pillars 31 , the insulating material 40 and the molding material 50 .
该步骤中,可以采用光刻、显影、刻蚀等标准工艺,在暴露出的导电柱30、导电柱31、绝缘材料40以及塑封材料50所形成的表面上制备重布线层20。重布线层20为双面布线、且在重布线层20的两面之间还设置有多层中间布线层。各布线层之间通过过孔连通。In this step, the rewiring layer 20 can be prepared on the surface formed by the exposed conductive pillars 30 , conductive pillars 31 , insulating material 40 and molding material 50 by using standard processes such as photolithography, developing, and etching. The redistribution layer 20 is double-sided wiring, and multiple layers of intermediate wiring layers are provided between the two sides of the redistribution layer 20 . The wiring layers are connected through via holes.
步骤808,在重布线层20远离芯片10和芯片11的一侧形成多个焊盘21。设置焊盘21后的封装结构如图9G所示。 Step 808 , forming a plurality of pads 21 on the side of the redistribution layer 20 away from the chip 10 and the chip 11 . The package structure after the pads 21 are provided is shown in FIG. 9G .
经过步骤808,导电柱30和导电柱31分别通过重布线层20上的多层布线层以及过孔与焊盘21连接。上述焊盘21的材料可以为铜、铝、金或者混合金属材料等。After step 808 , the conductive pillar 30 and the conductive pillar 31 are respectively connected to the pad 21 through the multi-layer wiring layer and the via hole on the redistribution layer 20 . The material of the pad 21 may be copper, aluminum, gold or mixed metal materials.
步骤809,在多个焊盘21上形成凸块。该凸块可以为锡凸块。 Step 809 , forming bumps on a plurality of pads 21 . The bumps may be tin bumps.
经过步骤801-步骤809,即可形成如图1所示的扇出型晶圆级封装结构。After steps 801 to 809, the fan-out wafer level packaging structure as shown in FIG. 1 can be formed.
进一步的,在图1所示的扇出型晶圆级封装结构的基础上,还可以进一步对扇出型晶圆级封装结构进行板级封装。当需要进行板级封装时,还可以包括步骤810-步骤816。步骤810,首先利用标准工艺制备出PCB。该PCB为双面布线、且在该PCB的两面之间还设置有多层中间布线层。各布线层之间通过过孔连通。步骤811,在PCB的表面P2预先焊接球栅阵列,该球栅阵列的材料可以为锡。步骤812,将图1所示的扇出型封装结构100上的凸块60装贴于PCB的表面P1。从而,扇出型封装结构100中所封装的芯片10和芯片11的引出端通过凸块60引至PCB的表面P2上的球栅阵列。步骤813,刻蚀芯片10和芯片11之上的塑封材料50,以露出芯片10和芯片11的晶背。步骤815,在芯片10和芯片11暴露出的晶背之上、以及PCB未设置芯片的区域沉积散热材料。步骤816,将散热片90贴装在带有散热材料91的芯片10的表面、芯片11的表面以及PCB的表面。经过步骤810-步骤816所制备出的板级封装结构300如图7所示。Further, on the basis of the fan-out wafer-level packaging structure shown in FIG. 1 , board-level packaging can be further performed on the fan-out wafer-level packaging structure. When board-level packaging is required, steps 810 to 816 may also be included. In step 810, the PCB is first prepared using standard techniques. The PCB is double-sided wiring, and multiple intermediate wiring layers are arranged between the two sides of the PCB. The wiring layers are connected through via holes. In step 811 , pre-solder the ball grid array on the surface P2 of the PCB, and the material of the ball grid array may be tin. Step 812 , mount the bump 60 on the fan-out packaging structure 100 shown in FIG. 1 on the surface P1 of the PCB. Therefore, the leads of the chips 10 and 11 packaged in the fan-out packaging structure 100 are led to the ball grid array on the surface P2 of the PCB through the bumps 60 . Step 813 , etching the molding material 50 above the chip 10 and the chip 11 to expose the crystal backs of the chip 10 and the chip 11 . Step 815 , deposit heat dissipating material on the exposed crystal backs of the chip 10 and the chip 11 , and on the area of the PCB where no chip is placed. Step 816 , mount the heat sink 90 on the surface of the chip 10 with the heat dissipation material 91 , the surface of the chip 11 and the surface of the PCB. The board-level packaging structure 300 prepared through steps 810 to 816 is shown in FIG. 7 .
最后应说明的是:以上各实施例仅用以说明本申请的技术方案,而非对其限制;尽管参照前述各实施例对本申请进行了详细的说明,本领域的普通技术人员应当理解:其依然可以对前述各实施例所记载的技术方案进行修改,或者对其中部分或者全部技术特征进行等同替换;而这些修改或者替换,并不使相应技术方案的本质脱离本申请各实施例技术方案的范围。Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, and are not intended to limit it; although the application has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: It is still possible to modify the technical solutions described in the foregoing embodiments, or perform equivalent replacements for some or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the technical solutions of the various embodiments of the present application. scope.

Claims (14)

  1. 一种扇出型封装结构,其特征在于,包括第一芯片和第一重布线层;A fan-out packaging structure, characterized in that it includes a first chip and a first redistribution layer;
    所述第一芯片的第一表面设置有多个导电柱,所述第一芯片通过所述多个导电柱设置于所述第一重布线层的第一表面;The first surface of the first chip is provided with a plurality of conductive pillars, and the first chip is arranged on the first surface of the first redistribution layer through the plurality of conductive pillars;
    所述多个导电柱的间隙填充有绝缘材料,所述绝缘材料设置于所述第一芯片的第一表面与所述第一重布线层的第一表面之间,所述绝缘材料向所述第一芯片的正投影位于所述第一芯片的边界范围内,且所述正投影的边界与所述第一芯片的边界具有预设距离;The gaps of the plurality of conductive pillars are filled with an insulating material, the insulating material is disposed between the first surface of the first chip and the first surface of the first redistribution layer, and the insulating material faces the The orthographic projection of the first chip is located within the boundary range of the first chip, and the boundary of the orthographic projection has a preset distance from the boundary of the first chip;
    所述第一芯片的侧边、以及所述第一芯片的第一表面未被所述绝缘材料和所述多个导电柱覆盖的部分,被沉积于所述第一重布线层第一表面的塑封材料包裹。The side of the first chip and the portion of the first surface of the first chip not covered by the insulating material and the plurality of conductive pillars are deposited on the first surface of the first redistribution layer Wrapped in plastic wrap.
  2. 根据权利要求1所述的扇出型封装结构,其特征在于,所述多个导电柱与所述第一重布线层接触的表面,与所述绝缘材料与所述第一重布线层接触的表面平齐。The fan-out packaging structure according to claim 1, wherein the surface of the plurality of conductive pillars in contact with the first redistribution layer is the same as the surface of the insulating material in contact with the first redistribution layer. The surface is even.
  3. 根据权利要求1或2所述的扇出型封装结构,其特征在于,所述第一重布线层中与第一表面相对的第二表面设置有多个凸块,所述第一芯片的引出端通过所述多个导电柱和所述第一重布线层与所述多个凸块中的至少部分凸块连通。The fan-out packaging structure according to claim 1 or 2, wherein a plurality of bumps are provided on the second surface of the first redistribution layer opposite to the first surface, and the leads of the first chip The terminal communicates with at least some of the plurality of bumps through the plurality of conductive pillars and the first redistribution layer.
  4. 根据权利要求1-3任一项所述的扇出型封装结构,其特征在于,所述塑封材料还覆盖所述第一芯片中与第一表面相对的第二表面。The fan-out packaging structure according to any one of claims 1-3, characterized in that the plastic encapsulation material also covers a second surface of the first chip opposite to the first surface.
  5. 根据权利要求4所述的扇出型封装结构,其特征在于,所述扇出型封装结构还包括第二芯片;The fan-out packaging structure according to claim 4, wherein the fan-out packaging structure further comprises a second chip;
    所述第二芯片设置于所述第一芯片之上、远离所述第一重布线层的一侧。The second chip is disposed on a side of the first chip away from the first redistribution layer.
  6. 根据权利要求5所述的扇出型封装结构,其特征在于,所述扇出型封装结构还包括第二重布线层,所述第二重布线层设置于所述塑封材料之上远离所述第一芯片的一侧;The fan-out packaging structure according to claim 5, characterized in that, the fan-out packaging structure further comprises a second redistribution layer, and the second redistribution layer is disposed on the molding material away from the one side of the first chip;
    所述第二芯片通过多个焊盘设置于所述第二重布线层上远离所述第一重布线层的一侧。The second chip is disposed on a side of the second redistribution layer away from the first redistribution layer through a plurality of pads.
  7. 根据权利要求6所述的扇出型封装结构,其特征在于,所述塑封材料远离所述第一芯片的区域开设有连通所述第一重布线层和所述第二重布线层的通孔;The fan-out packaging structure according to claim 6, wherein a through hole connecting the first redistribution layer and the second redistribution layer is opened in a region of the molding material far away from the first chip ;
    所述第二芯片通过所述第二重布线层、所述通孔以及所述第一重布线层与所述第一芯片连接。The second chip is connected to the first chip through the second redistribution layer, the through hole and the first redistribution layer.
  8. 根据权利要求3所述的扇出型封装结构,其特征在于,所述扇出型封装结构还包括印刷电路板;The fan-out packaging structure according to claim 3, wherein the fan-out packaging structure further comprises a printed circuit board;
    所述第一重布线层的第二表面通过所述多个凸块设置于所述印刷电路板的表面。The second surface of the first redistribution layer is disposed on the surface of the printed circuit board through the plurality of bumps.
  9. 根据权利要求1-3任一项所述的扇出型封装结构,其特征在于,所述扇出型封装结构还包括散热片;The fan-out packaging structure according to any one of claims 1-3, wherein the fan-out packaging structure further comprises a heat sink;
    所述散热片设置于所述第一芯片的第二表面之上。The heat sink is disposed on the second surface of the first chip.
  10. 一种电子设备,其特征在于,包括如权利要求1-9任一项所述的扇出型封装结构。An electronic device, characterized by comprising the fan-out packaging structure according to any one of claims 1-9.
  11. 一种扇出型封装结构的制备方法,其特征在于,所述制备方法包括:A preparation method of a fan-out packaging structure, characterized in that the preparation method comprises:
    在第一芯片的第一表面形成多个导电柱;forming a plurality of conductive pillars on the first surface of the first chip;
    在所述第一芯片的第一表面沉积绝缘材料,所述绝缘材料填充所述多个导电柱的间隙,所述绝缘材料向所述第一芯片的正投影位于所述第一芯片的边界范围内,且所述正投影的边界与所述第一芯片的边界具有预设距离;An insulating material is deposited on the first surface of the first chip, the insulating material fills the gaps of the plurality of conductive pillars, and the orthographic projection of the insulating material to the first chip is located within the boundary range of the first chip , and the boundary of the orthographic projection has a preset distance from the boundary of the first chip;
    在所述第一芯片上形成塑封材料,所述塑封材料包裹所述第一芯片的侧边、以及所述第一芯片的第一表面暴露出的部分;forming a molding material on the first chip, the molding material wrapping the side of the first chip and the exposed part of the first surface of the first chip;
    在所述多个导电柱、所述绝缘材料和所述塑封材料形成的平面之上形成第一重布线层。A first redistribution layer is formed on the plane formed by the plurality of conductive pillars, the insulating material and the molding material.
  12. 根据权利要求11所述的制备方法,其特征在于,所述塑封材料还包裹所述第一芯片中与第一表面相对的第二表面。The preparation method according to claim 11, wherein the plastic encapsulation material further wraps the second surface of the first chip opposite to the first surface.
  13. 根据权利要求12所述的制备方法,其特征在于,所述制备方法还包括:The preparation method according to claim 12, wherein the preparation method further comprises:
    在所述塑封材料远离所述第一重布线层的一侧形成第二重布线层;forming a second redistribution layer on a side of the molding material away from the first redistribution layer;
    在所述第二重布线层远离所述塑封材料的一侧形成多个焊盘;forming a plurality of pads on a side of the second redistribution layer away from the molding material;
    将第二芯片通过所述多个焊盘设置于所述第二重布线层之上。The second chip is disposed on the second redistribution layer through the plurality of bonding pads.
  14. 根据权利要求13所述的制备方法,其特征在于,所述制备方法还包括:The preparation method according to claim 13, wherein the preparation method further comprises:
    在所述塑封材料远离芯片的区域开设用于连通所述第一重布线层和所述第二重布线层的通孔;opening a via hole for connecting the first redistribution layer and the second redistribution layer in a region where the molding material is away from the chip;
    所述第二芯片通过所述第一重布线层、所述通孔以及所述第二重布线层与所述第一芯片连通。The second chip communicates with the first chip through the first redistribution layer, the through hole and the second redistribution layer.
PCT/CN2021/112021 2021-08-11 2021-08-11 Fan-out chip package structure and preparation method WO2023015480A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202180097862.9A CN117242555A (en) 2021-08-11 2021-08-11 Fan-out chip packaging structure and preparation method
PCT/CN2021/112021 WO2023015480A1 (en) 2021-08-11 2021-08-11 Fan-out chip package structure and preparation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2021/112021 WO2023015480A1 (en) 2021-08-11 2021-08-11 Fan-out chip package structure and preparation method

Publications (1)

Publication Number Publication Date
WO2023015480A1 true WO2023015480A1 (en) 2023-02-16

Family

ID=85200433

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2021/112021 WO2023015480A1 (en) 2021-08-11 2021-08-11 Fan-out chip package structure and preparation method

Country Status (2)

Country Link
CN (1) CN117242555A (en)
WO (1) WO2023015480A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116169037A (en) * 2023-04-24 2023-05-26 长电集成电路(绍兴)有限公司 Preparation method of chip packaging structure

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030189243A1 (en) * 2002-04-04 2003-10-09 Tongbi Jiang Microelectronic package with reduced underfill and methods for forming such packages
CN105489516A (en) * 2016-01-22 2016-04-13 中芯长电半导体(江阴)有限公司 Packaging method of fan-out type chip, and packaging structure
CN107408541A (en) * 2015-03-04 2017-11-28 苹果公司 System in package is fanned out to overlapping shelf structure and technological process
CN109560068A (en) * 2017-09-25 2019-04-02 力成科技股份有限公司 Encapsulating structure and chip structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030189243A1 (en) * 2002-04-04 2003-10-09 Tongbi Jiang Microelectronic package with reduced underfill and methods for forming such packages
CN107408541A (en) * 2015-03-04 2017-11-28 苹果公司 System in package is fanned out to overlapping shelf structure and technological process
CN105489516A (en) * 2016-01-22 2016-04-13 中芯长电半导体(江阴)有限公司 Packaging method of fan-out type chip, and packaging structure
CN109560068A (en) * 2017-09-25 2019-04-02 力成科技股份有限公司 Encapsulating structure and chip structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116169037A (en) * 2023-04-24 2023-05-26 长电集成电路(绍兴)有限公司 Preparation method of chip packaging structure
CN116169037B (en) * 2023-04-24 2023-08-04 长电集成电路(绍兴)有限公司 Preparation method of chip packaging structure

Also Published As

Publication number Publication date
CN117242555A (en) 2023-12-15

Similar Documents

Publication Publication Date Title
TWI702663B (en) Semiconductor device and manufacturing method thereof
KR102127796B1 (en) Semiconductor package and method
TWI644402B (en) Semiconductor package and method of forming same
KR101763019B1 (en) Smd, ipd, and/or wire mount in a package
US20130062761A1 (en) Packaging Methods and Structures for Semiconductor Devices
TWI544599B (en) Fabrication method of package structure
CN111883481A (en) 3D package structure and forming method thereof
TWI789881B (en) Package structure and methods of manufacturing the same
US20220367211A1 (en) Semiconductor Device and Methods of Manufacture
US20230386866A1 (en) Semiconductor Package and Method of Forming Thereof
TW202218081A (en) Semiconductor device and manufacturing method thereof
TW202310299A (en) Semiconductor structure, device and forming method thereof
WO2023015480A1 (en) Fan-out chip package structure and preparation method
CN113314505A (en) Semiconductor package and method of manufacturing the same
US20240170355A1 (en) Electronic package and manufacturing method thereof
US20240047420A1 (en) Electronic package and manufacturing method thereof, and electronic structure and manufacturing method thereof
TW202046456A (en) Electronic package and manufacturing method thereof
TWI766192B (en) Electronic package and method for manufacturing the same
TWI705547B (en) Chip package structure and manufacturing method thereof
TWI851040B (en) Package, package structure, and method of forming integrated circuit package
TWI853533B (en) Package structure and manufacturing method thereof
CN218996710U (en) Semiconductor package
TWI796726B (en) Electronic package and manufacturing method thereof
US20240194553A1 (en) Semiconductor package and method for manufacturing the same
US12113004B2 (en) Electronic package and manufacturing method thereof

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21953107

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 202180097862.9

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21953107

Country of ref document: EP

Kind code of ref document: A1