WO2023004907A1 - Substrate having sanding surface and preparation method therefor, and tin-plated board/chrome-plated board - Google Patents

Substrate having sanding surface and preparation method therefor, and tin-plated board/chrome-plated board Download PDF

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Publication number
WO2023004907A1
WO2023004907A1 PCT/CN2021/114194 CN2021114194W WO2023004907A1 WO 2023004907 A1 WO2023004907 A1 WO 2023004907A1 CN 2021114194 W CN2021114194 W CN 2021114194W WO 2023004907 A1 WO2023004907 A1 WO 2023004907A1
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Prior art keywords
work roll
substrate
roll
roughness
concentration
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PCT/CN2021/114194
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French (fr)
Chinese (zh)
Inventor
黄久贵
俞炜
郭宏
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江苏沙钢集团有限公司
江苏省沙钢钢铁研究院有限公司
张家港扬子江冷轧板有限公司
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Priority to KR1020237029818A priority Critical patent/KR20230170643A/en
Publication of WO2023004907A1 publication Critical patent/WO2023004907A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • B21B1/227Surface roughening or texturing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/08Deposition of black chromium, e.g. hexavalent chromium, CrVI
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment
    • C25D5/505After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00Electrolytic coating other than with metals
    • C25D9/04Electrolytic coating other than with metals with inorganic materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/38Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
    • B21B2001/386Plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B2265/00Forming parameters
    • B21B2265/12Rolling load or rolling pressure; roll force
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B2267/00Roll parameters
    • B21B2267/10Roughness of roll surface

Definitions

  • the invention relates to the technical field of metal material processing, in particular to a substrate with a sanded surface, a preparation method thereof, and a tin-plated plate/chrome-plated plate.
  • Tin-plated/chrome-plated sheets are widely used in beverage packaging. Usually, steel billets are hot-rolled into strips of about 2.0mm in steel plants, and then undergo processes such as acid rolling, annealing, smoothing, tin/chrome plating, and passivation. Finally, it is made into a tin plate/chrome plate, and then it is made into a can body through iron printing and can making processes, which is used to hold various beverages. Since the content contained is acidic, high-protein and other substances, it is required that the tin plate/chrome plate products have high corrosion resistance.
  • the surface morphology of the tin plate/chrome plate selected for necking cans (attachment 1) or easy open end (attachment 2) is R1 (fine stone surface), and the roughness Ra is controlled between 0.29 and 0.55 ⁇ m , the texture of the board surface is stone-like, with a general sense of drawing (visually similar to thin and shallow scratches), and it presents a lighter graininess under strong light.
  • the necked cans or easy-open ends made of such tin-plated/chrome-plated plates is easily corroded by the contents and cannot meet the requirements of corrosion resistance.
  • the technical problem to be solved by the present invention is to provide a tin-plated/chrome-plated sheet from which necked cans or easy-open lids have good corrosion resistance so that they will not be corroded by the contents.
  • the present invention provides the following technical solutions:
  • the first aspect of the present invention provides a method for preparing a substrate with a sanded surface, comprising the following steps:
  • a screed machine comprising a first frame and a second frame
  • the first frame includes a first work roll and a third work roll oppositely arranged
  • the second frame includes a second work roll and a fourth work roll oppositely arranged
  • the first work roll and the second work roll are located on the same side, the first work roll and the second work roll are used to contact the first surface of the substrate and form the sanding surface, wherein:
  • the first work roll is an electric spark textured roll
  • the second work roll is a ground smooth roll
  • the roughness of the surface of the first work roll is 1.6-2.2 ⁇ m
  • the roughness of the surface of the second work roll is The degree is 0.35 ⁇ 0.75 ⁇ m
  • the base plate to be cold-rolled is sent into the tempering machine, and the base plate is sequentially passed between the first work roll and the third work roll, between the second work roll and the fourth work roll, so that the The sanded surface is formed on the first surface of the substrate.
  • the rolling force of the first stand is 3500-4500 kN
  • the rolling force of the second stand is 3500-4000 kN.
  • the roll changing period of the first work roll and the second work roll is 120 ⁇ 20km, and the rolling tonnage is 150 ⁇ 30t.
  • both the third work roll and the fourth work roll are ground smooth rolls, and the surface roughness of the first work roll is 1.8 ⁇ 0.2 ⁇ m,
  • the roughness of the surface of the second work roll is 0.70 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the third work roll is 0.70 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the fourth work roll is 0.40 ⁇ 0.05 ⁇ m
  • the The rolling force of the first stand is 3500 ⁇ 100kN
  • the rolling force of the second stand is 3500 ⁇ 100kN.
  • the third work roll is an EDM textured roll
  • the fourth work roll is a ground smooth roll
  • the surface of the first work roll is The roughness of the surface of the second work roll is 2.0 ⁇ 0.2 ⁇ m
  • the roughness of the surface of the second work roll is 0.40 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the third work roll is 1.2 ⁇ 0.2 ⁇ m
  • the roughness of the surface of the fourth work roll The rolling force of the first stand is 0.40 ⁇ 0.05 ⁇ m
  • the rolling force of the first stand is 4000 ⁇ 100kN
  • the rolling force of the second stand is 3500 ⁇ 100kN.
  • a fine stone surface is formed on the second surface.
  • the third work roll is an EDM textured roll
  • the fourth work roll is a ground smooth roll
  • the surface of the first work roll is The roughness of the surface of the second work roll is 2.0 ⁇ 0.2 ⁇ m
  • the roughness of the surface of the second work roll is 0.40 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the third work roll is 1.5 ⁇ 0.2 ⁇ m
  • the roughness of the surface of the fourth work roll The thickness is 0.70 ⁇ 0.05 ⁇ m
  • the rolling force of the first stand is 4500 ⁇ 100kN
  • the rolling force of the second stand is 4000 ⁇ 100kN.
  • a rough stony finish is formed on the second surface.
  • the second aspect of the present invention provides a substrate with a sanded surface prepared by using the preparation method described in the first aspect, one side of the substrate is a sanded surface, the other side is a non-sanded surface, and the sanded surface Consisting of dot-like concave-convex bottoming lines and silky lines on part of the bottoming lines, the distribution of the bottoming lines and the silky lines makes the roughness of the sanding surface 0.50-0.80 ⁇ m .
  • the material of the base plate is MR type, L type or D type original plate steel.
  • non-sanding surface is a smooth surface, a fine stone texture surface, a coarse stone texture surface, a silver surface, a rough silver surface or a matte surface.
  • the third aspect of the present invention provides a tinned plate, which is obtained by electroplating metal tin on the surface of the substrate described in the second aspect and reflowing.
  • the concentration of divalent tin in the electroplating solution is 20-25g/L
  • the concentration of methanesulfonic acid is 30-50mL/L
  • the concentration of antioxidant is 35-60mL/L
  • the concentration of additives The concentration is 20-30mL/L; during the electroplating process, the temperature of the electroplating solution is controlled to be 38-45°C, and the current density is 22-28A/mm 2 .
  • the reflow setting temperature is 260-290°C
  • the reflow feedback temperature is 255-295°C
  • the reflow power ratio is 30%-50%.
  • one side of the substrate is a sanded surface, and the other side is a fine stone textured surface.
  • the fourth aspect of the present invention provides a chrome-plated plate, which is obtained by electroplating metal chromium and chromium oxide on the surface of the substrate as described in the second aspect.
  • the concentration of chromic anhydride in the electroplating solution is 140-160g/L, and the concentration of ammonium fluoride is 3-4g/L; during the electroplating process, the temperature of the electroplating solution is controlled to be 36-40°C, The current density is 50-80A/mm 2 , the concentration of chromic anhydride in the first recovery tank is ⁇ 50g/L, and the concentration of chromic anhydride in the second recovery tank is ⁇ 40g/L.
  • the concentration of chromic anhydride in the electroplating solution is 60-70g/L, the concentration of ammonium fluoride is 1-2g/L, and the concentration of sodium hydroxide is 8-10g/L; , controlling the temperature of the electroplating solution to be 31-35°C, the current density to be 9-22A/mm 2 , and the weight of the formed chromium oxide layer to be 8-15g/m 2 .
  • one side of the substrate is a sanded surface, and the other side is a fine stone textured surface.
  • the fifth aspect of the present invention provides a necked tank, the necked tank is prepared from the tin-plated or chrome-plated plate.
  • the sixth aspect of the present invention provides an easy-open end, the easy-open end is prepared from the tin-plated sheet.
  • the present invention creatively proposes a new treatment process for tin-plated/chrome-plated substrates, so that the substrate has two different surfaces inside and outside, and a new surface morphology is produced on the inner surface used to form the inner wall of the tank ——Sanded surface, the roughness of which is 0.50-0.80 ⁇ m, and the microscopic appearance includes dot-like concave-convex grounding lines and silky lines on some of the grounding lines. Substrates with such a sanded surface can be more evenly distributed on the surface of the substrate during tin or chrome plating.
  • the coating at the necked part and the pre-scribed film is not easily damaged, has good corrosion resistance, and will not be corroded by the contents.
  • the outer surface used to form the outer wall of the tank can retain the original surface morphology, so that the tin-plated/chrome-plated substrate produced by the present invention can retain the existing tank packages when forming various tank packages. visual characteristics, thereby avoiding the marketing cost caused by switching to new can packaging products, so that the substrate of the present invention has stronger universality.
  • the present invention improves the existing tin-plating and chrome-plating processes.
  • the new electroplating process improves the compactness of the tin-plated layer and the chrome-plated layer and the uniformity of the alloy layer coverage, reduces the depth of the pores, so that the coating can be The substrate is better protected, and the corrosion resistance of the substrate is further improved.
  • Fig. 1 is the structural representation of necking tank
  • Fig. 2 is a schematic structural view of the easy-open end
  • Figure 3 is the surface texture of the R1 surface under the microscope
  • Figure 4 is the surface texture of the Rs surface under the microscope
  • Fig. 5 is a schematic diagram of wire drawing lines on R1 surface (a) and Rs surface (b);
  • Fig. 6 is when adopting existing tinning process (a) and tinning process (b) of the present invention, the surface topography figure of tin layer on the substrate;
  • Fig. 7 is when adopting existing reflow process (a, b, c) and tin plating process (d, e, f) of the present invention, the surface topography figure of alloy layer on the substrate;
  • Fig. 8 is the surface topography figure of the metal chromium layer that adopts electroplating metal chromium process of the present invention to obtain;
  • Fig. 9 is an integrated surface topography diagram of a metal chromium layer and a chromium oxide layer obtained by the electroplating chromium oxide process of the present invention.
  • the surface morphology of the tin plate/chrome plate selected for the necking can (accompanying drawing 1) or the easy-open end (accompanying drawing 2) is R1 (fine stone surface), and the roughness Ra is controlled between 0.29 and 0.55 ⁇ m, the texture of the surface of the board is stone-like, with a general feeling of drawing (visually similar to thin and shallow scratches), and it presents a lighter grainy feeling under strong light.
  • the necked cans or easy-open lids made of such tin-plated/chrome-plated plates are easily corroded by the contents at the necked or pre-scribed areas during use, which cannot meet the corrosion resistance requirements.
  • the inventors found that the main reason why the constriction or the pre-scribing film is easily corroded by the content is the surface morphology of the tin/chrome-plated substrate. Since the content surface of the substrate in the prior art is the fine stone texture surface R1, its surface has a brushed appearance. The presence of wire drawing causes obvious height difference on the surface of the substrate. As shown in Figure 3, when observed under a microscope, the wire drawing part shows serious unevenness, which is generally distributed on the surface of the substrate like ravines.
  • the amount of tin plating on the protruding part of the substrate will be greater than that on the concave part, thus hindering the tin plating. uniform deposition.
  • the tin deposited on the substrate will melt and flow. When it flows to the recessed part, the recessed part will hinder the further flow of the tin melt, thereby hindering the leveling of the tin after melting, and finally affecting Alloy layer formation.
  • metal chromium is electroplated on the surface of the substrate, the pores on the surface of the coating are less, but in the form of deep pits, which is mainly due to the body-centered cubic structure of the electroplated metal chromium layer, which is formed by the preferred orientation of the crystal lattice as the current density changes; and
  • the current efficiency of chromium plating is generally 20% to 25%, and the side reaction is hydrogen evolution reaction, which increases the pores of the metal chromium layer along the longitudinal direction.
  • the longitudinal pores are further deepened, so that the deposition of metallic chromium at the bottom of the wire-drawing groove is further reduced during the electrochrome plating process.
  • the chromium oxide layer has a network and layered structure, and as the degree of gully increases, its protection to the metal chromium layer is further reduced, resulting in a decrease in the corrosion resistance of the chrome-plated plate.
  • the substrate surface morphology of tin plate/chrome plate has B (bright surface), R1 (fine stone surface), R2 (coarse stone surface), S1 (silver surface), S2 ( Coarse silver surface), M (matte surface), the appearance specifications and standards of each product are shown in Table 1.
  • Table 1 The appearance specifications and standards of existing tinplate/chrome plate products
  • a sanded surface As shown in Figure 4, when observed under a microscope, the surface of this Rs has a dot-shaped concave-convex texture and silky lines located on part of the texture, the texture and the silk The distribution of the shaped lines makes the roughness of the sanded surface 0.50-0.80 ⁇ m.
  • the surface of Rs When observed under normal light, the surface of Rs has a grainy feel, which is relatively fine, and there is a slight brushing feeling under strong light. The gloss of the board surface is slightly light silver, and the reflectivity is poor.
  • the wire drawing lines on the Rs surface of the present invention are shorter and shallower, thereby reducing the degree of wire drawing (scratching), and eliminating the deposition and reflow of electroplated tin due to substrate grooves caused by wire drawing.
  • the impact of tin leveling in the process so that the surface of the substrate is evenly covered with tin layer and alloy layer; and because tin has good ductility, it finally increases the corrosion resistance of the deformation zone in the process of can making and lid.
  • the invention provides a method for preparing a substrate with a sanded surface, which specifically includes the following steps:
  • the tempering machine includes a first frame and a second frame, the first frame includes a first work roll and a third work roll oppositely arranged, the second frame including a second work roll and a fourth work roll oppositely arranged, the first work roll and the second work roll are located on the same side, and the first work roll and the second work roll are used to contact the first surface of the substrate And form the sanded surface, wherein:
  • the first work roll is an electric spark textured roll
  • the second work roll is a ground smooth roll
  • the roughness of the surface of the first work roll is 1.6-2.2 ⁇ m
  • the roughness of the surface of the second work roll is The degree is 0.35 ⁇ 0.75 ⁇ m
  • the EDM texturing roll is a roll prepared by the EDM texturing (EDT) technology, which produces pit-shaped burrs on the surface of the roll based on the principle of EDM, and can be formed on the surface of the substrate by rolling the EDM texturing roll. granular morphology.
  • the ground smooth roll is formed on the surface of the roll based on the grinding process. Through the rolling of the ground smooth roll, a wire-like morphology can be formed on the surface of the substrate.
  • the topography and roughness of the surface of the first work roll and the second work roll under the action of the external rolling force, the topography and roughness of the roll surface are printed on the surface of the substrate, thereby The surface of the substrate forms the sanded surface topography.
  • the rolling force applied by the first stand to the first work roll is 3500-4500 kN
  • the rolling force applied by the second stand to the second work roll is 3500-4000 kN.
  • the first work roll and the second work roll need to be replaced after being used for a certain period of time, and whether they need to be replaced can be determined according to the roll change cycle or rolling tonnage.
  • the roll change cycle refers to the total length of the base material rolled by the work rolls
  • the rolling tonnage refers to the total weight of the base material rolled by the work rolls. For example, if the roll changing period is 120km, it means that the line will be stopped and changed after the work roll reaches 120km of substrate. Similarly, the rolling tonnage is 150 tons, which means that the line will be stopped and replaced after the work roll reaches 150 tons of substrate. roll.
  • the roll changing cycle of the first work roll and the second work roll is preferably 120 ⁇ 20km, and the rolling tonnage is preferably 150 ⁇ 30t.
  • the inventor abandoned the traditional double-sided R1 surface manufacturing process, and adopted a new type of differentiated surface morphology control.
  • the outer surface of the tank still adopts the original R1 surface, and the inner surface adopts the Rs surface of the present invention, thereby obtaining a differentiated shape.
  • differential shape control Rs content surface/R1 outer surface
  • the substrate with the Rs/R1 differential morphology can be used to prepare necked cans or easy-open lids after tin plating, and can be used to prepare necked cans after chrome plating.
  • the above-mentioned base plate can adopt the base plate material commonly used in the can making industry, preferably MR-type, L-type or D-type raw plate steel.
  • the substrate with the above Rs/R1 differential morphology can be prepared by controlling the types, surface roughness and rolling force of the third work roll and the fourth work roll.
  • the third work roll is controlled to be an EDM textured roll
  • the fourth work roll is a ground smooth roll
  • the surface roughness of the first work roll is 2.0 ⁇ 0.2 ⁇ m
  • the second work roll is The roughness of the roll surface is 0.40 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the third work roll is 1.2 ⁇ 0.2 ⁇ m
  • the roughness of the surface of the fourth work roll is 0.40 ⁇ 0.05 ⁇ m
  • the The rolling force is 4000 ⁇ 100kN
  • the rolling force of the second stand is 3500 ⁇ 100kN.
  • substrates with differentiated morphologies on the second surface can be obtained, such as Rs/B substrates, Rs/R2 substrates, and the like.
  • the method for preparing the above-mentioned Rs/B substrate is: control the third work roll and the fourth work roll to be ground smooth rolls, the surface roughness of the first work roll is 1.8 ⁇ 0.2 ⁇ m, and the second work roll
  • the roughness of the roll surface is 0.70 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the third work roll is 0.70 ⁇ 0.05 ⁇ m
  • the roughness of the surface of the fourth work roll is 0.40 ⁇ 0.05 ⁇ m
  • the The rolling force is 3500 ⁇ 100kN
  • the rolling force of the second stand is 3500 ⁇ 100kN
  • the bright surface (B) is formed on the second surface of the substrate after being cold-rolled by a temper mill.
  • the method for preparing the above-mentioned Rs/R2 substrate is: controlling the third work roll to be an EDM textured roll, the fourth work roll to be a ground smooth roll, and the surface roughness of the first work roll to be 2.0 ⁇ 0.2 ⁇ m, the roughness of the surface of the second work roll is 0.40 ⁇ 0.05 ⁇ m, the roughness of the surface of the third work roll is 1.5 ⁇ 0.2 ⁇ m, the roughness of the surface of the fourth work roll is 0.70 ⁇ 0.05 ⁇ m,
  • the rolling force of the first stand is 4500 ⁇ 100kN, and the rolling force of the second stand is 4000 ⁇ 100kN. After the substrate is cold-rolled by a temper mill, rough stones are formed on its second surface. Textured surface (R2).
  • Table 2 shows in detail the roll matching schemes for preparing the above-mentioned substrates with different morphologies.
  • the present invention further studies the tin plating and reflow process of the substrate.
  • the inventor improved the existing tinning process and provided a new tinning process, as shown in Table 4.
  • the concentration of divalent tin in the electroplating solution is 15-25g/L
  • the concentration of methanesulfonic acid is 30-50mL/L
  • the concentration of antioxidant is 35-60mL/L
  • the concentration of additives is 25 ⁇ 30mL/L.
  • the temperature of the electroplating solution is controlled to be 38-45° C.
  • the current density is 22-28 A/mm 2 .
  • the concentration of divalent tin in the electroplating solution is 20g/L to control the concentration of divalent tin in the electroplating solution
  • the concentration of methanesulfonic acid is 40mL/L
  • the concentration of antioxidant is 45mL/L
  • the concentration of additive is 25mL/L.
  • the temperature was 42°C and the current density was 25A/mm 2 .
  • the above-mentioned antioxidants can be selected from commonly used oxidants in the field, including but not limited to one or more of phenol, hydroquinone, resorcinol, and catechol.
  • the antioxidant used is QUAKERTIN TM TPMW AOX antioxidant of Quaker Chemical.
  • the above-mentioned additives may be additives commonly used in the art, including but not limited to one or more of surfactants and grain refiners.
  • the additive used is Quake Chemical's QUAKERTIN TM Additive additive.
  • the surface morphology of the tin layer on the substrate is shown in Figure 6(b). It can be seen from the figure that the grains of the tin layer are fine and compact, and the gap between grains is small, which can better protect the substrate and improve the corrosion resistance of the substrate.
  • the tin layer is melted and flowed through a reflow process to obtain an alloy layer, thereby improving the uniformity of the tin layer.
  • Table 5 shows the existing electrolytic tin plating reflow process parameters.
  • the alloy layer formed by the existing reflow process has relatively fine grains, so the corrosion resistance is also poor.
  • the present invention also improves the reflow process, as shown in Table 6.
  • the height of the reflow box used is 3.5-5.5m
  • the reflow setting temperature is 260-290°C
  • the reflow feedback temperature is 255-295°C
  • the reflow power ratio is 30%-50%.
  • the height of the reflow box used is 4.5m
  • the set reflow temperature is 270°C
  • the reflow feedback temperature is 275°C
  • the reflow power ratio is 40%.
  • the present invention also studies the chrome plating process of the substrate.
  • the metal chromium layer produces deep pit-shaped pores along the longitudinal direction. Therefore, improving the density of grains and reducing the depth of pores in the process of metal chromium deposition are important measures to improve the corrosion resistance of chromium-plated plates.
  • the present invention improves the process of electroplating metal chromium, as shown in Table 8.
  • electroplating metal chromium control the concentration of chromic anhydride in the electroplating solution to be 140-160g/L, the concentration of ammonium fluoride to be 3-4g/L, the concentration of chromic anhydride in the first recovery tank to be ⁇ 50g/L, and the second recovery
  • concentration of chromic anhydride in the tank is ⁇ 40g/L; during the electroplating process, the temperature of the electroplating solution is controlled to be 33-43°C, and the current density is 25-100A/mm 2 .
  • the concentration of chromic anhydride in the control electroplating solution is 150g/L
  • the concentration of ammonium fluoride is 3.5g/L
  • the concentration of chromic anhydride in the first recovery tank is 30g/L
  • the second recovery tank The concentration of internal chromic anhydride is 10g/L; during the electroplating process, the temperature of the electroplating solution is controlled at 38°C, and the current density is 65A/mm 2 .
  • the surface morphology of the obtained metal chromium layer is shown in FIG. 8 . It can be seen from the figure that a shallow and dense metal chromium layer with deep pits can be obtained through the above electroplating process. The metal chromium layer with this shape can better protect the substrate and improve its corrosion resistance.
  • the present invention improves the electroplating chromium oxide process, as shown in Table 10.
  • the concentration of chromic anhydride in the electroplating solution is 60-70g/L
  • the concentration of ammonium fluoride is 1-2g/L
  • the concentration of sodium hydroxide is 6-12g/L
  • the temperature of the liquid is 27-37°C
  • the current density is 9-22A/mm 2
  • the weight of the formed chromium oxide layer is 8-15g/m 2 .
  • the concentration of chromic anhydride in the electroplating solution is 65g/L, the concentration of ammonium fluoride is 1.5g/L, and the concentration of sodium hydroxide is 9g/L;
  • the temperature is 32°C, the current density is 19A/mm 2 , and the weight of the formed chromium oxide layer is ⁇ 10g/m 2 .
  • the integrated surface morphology of the obtained metal chromium layer and chromium oxide layer is shown in FIG. 9 . It can be seen from the figure that according to the chromium oxide electroplating process of the present invention, a dense reticular chromium oxide layer can be obtained, which is beneficial to improving the corrosion resistance of the chrome-plated plate.
  • the present invention provides a new surface topography Rs of tin-plated/chrome-plated substrates, the substrate with this surface topography has a more uniform coating distribution during the electroplating process, so that it can be used in the preparation of necking tanks/easy During the process of opening the cap, the coating at the neck and pre-scribing film is not easy to deform and crack, thus improving the corrosion resistance of the neck can/easy-open end.
  • the present invention also improves the tin plating and chrome plating process, improves the compactness of the plating layer, and thus can also improve the corrosion resistance of the necked can/easy-open end.

Abstract

A preparation method for a substrate having a sanding surface. The preparation method comprises: providing a flattening mill, which comprises a first rack and a second rack, wherein the first rack comprises a first working roll and a third working roll which are arranged opposite each other, the second rack comprises a second working roll and a fourth working roll which are arranged opposite each other, the first working roll and the second working roll are located on the same side, the first working roll is an electric spark texturing roll, the second working roll is a grinding and polishing roll, the roughness of a surface of the first working roll is 1.6-2.2 μm, and the roughness of a surface of the second working roll is 0.35-0.75 μm; and making the substrate sequentially pass between the first working roll and the third working roll and between the second working roll and the fourth working roll, so as to form a sanding surface on a first surface of the substrate. After the substrate having the sanding surface is subjected to tin plating or chromium plating, when the substrate is processed into a necking tank or an easy-to-open cap, coatings at a necking position and a pre-scribing film are not prone to being damaged, such that the corrosion resistance of same is good.

Description

带砂光面的基板,其制备方法以及镀锡板/镀铬板Substrate with sanded surface, method for its preparation and tinplate/chromeplate 技术领域technical field
本发明涉及金属材料加工技术领域,具体涉及一种带砂光面的基板,其制备方法以及镀锡板/镀铬板。The invention relates to the technical field of metal material processing, in particular to a substrate with a sanded surface, a preparation method thereof, and a tin-plated plate/chrome-plated plate.
背景技术Background technique
镀锡板/镀铬板广泛应用于饮料包装,通常是在钢铁厂由钢坯经过热轧轧制成2.0mm左右的带钢,接着经过酸轧、退火、平整、镀锡/镀铬、钝化等工艺后,制成镀锡板/镀铬板,再经过印铁、制罐工序制成罐体,用于盛装各类饮料。由于所盛装内容物为酸性、高蛋白等物质,因此需要镀锡板/镀铬板产品具备高耐蚀性能。Tin-plated/chrome-plated sheets are widely used in beverage packaging. Usually, steel billets are hot-rolled into strips of about 2.0mm in steel plants, and then undergo processes such as acid rolling, annealing, smoothing, tin/chrome plating, and passivation. Finally, it is made into a tin plate/chrome plate, and then it is made into a can body through iron printing and can making processes, which is used to hold various beverages. Since the content contained is acidic, high-protein and other substances, it is required that the tin plate/chrome plate products have high corrosion resistance.
目前,缩颈罐(附图1)或易开盖(附图2)选用的镀锡板/镀铬板表面形貌为R1(细石纹面),粗糙度Ra控制在0.29~0.55μm之间,板面纹理呈石纹状,拉丝感一般(目视类似细、浅短划伤),在强光照射下呈现较轻的颗粒感。但是,由这种镀锡板/镀铬板制成的缩颈罐或易开盖在使用过程中,缩颈处或预划膜处(易开盖成型后需要在目标打开部位预先划膜,引导盖开启方向)易被内容物腐蚀,无法满足耐腐蚀的要求。At present, the surface morphology of the tin plate/chrome plate selected for necking cans (attachment 1) or easy open end (attachment 2) is R1 (fine stone surface), and the roughness Ra is controlled between 0.29 and 0.55 μm , the texture of the board surface is stone-like, with a general sense of drawing (visually similar to thin and shallow scratches), and it presents a lighter graininess under strong light. However, during the use of the necked cans or easy-open ends made of such tin-plated/chrome-plated plates, the necked area or the pre-scored film (after the easy-opened The opening direction of the cover) is easily corroded by the contents and cannot meet the requirements of corrosion resistance.
发明内容Contents of the invention
本发明要解决的技术问题是提供一种镀锡板/镀铬板,由该镀锡板/镀铬板制备的缩颈罐或易开盖具有良好的耐腐蚀性,从而不会被内容物腐蚀。The technical problem to be solved by the present invention is to provide a tin-plated/chrome-plated sheet from which necked cans or easy-open lids have good corrosion resistance so that they will not be corroded by the contents.
为了解决上述技术问题,本发明提供了如下的技术方案:In order to solve the problems of the technologies described above, the present invention provides the following technical solutions:
本发明第一方面提供了一种带砂光面的基板的制备方法,包括以下步骤:The first aspect of the present invention provides a method for preparing a substrate with a sanded surface, comprising the following steps:
提供一平整机,所述平整机包括第一机架和第二机架,providing a screed machine comprising a first frame and a second frame,
所述第一机架包括相对设置的第一工作辊和第三工作辊,所述第二机架包括相对设置的第二工作辊和第四工作辊,The first frame includes a first work roll and a third work roll oppositely arranged, and the second frame includes a second work roll and a fourth work roll oppositely arranged,
所述第一工作辊和第二工作辊位于同一侧,该第一工作辊和第二工作辊用以与所述基板的第一表面接触并形成所述砂光面,其中:The first work roll and the second work roll are located on the same side, the first work roll and the second work roll are used to contact the first surface of the substrate and form the sanding surface, wherein:
所述第一工作辊为电火花毛化轧辊,所述第二工作辊为磨削光辊;所述第一工作辊表面的粗糙度为1.6~2.2μm,所述第二工作辊表面的粗糙度为0.35~0.75μm;The first work roll is an electric spark textured roll, and the second work roll is a ground smooth roll; the roughness of the surface of the first work roll is 1.6-2.2 μm, and the roughness of the surface of the second work roll is The degree is 0.35~0.75μm;
将待冷轧的基板送入所述平整机中,使所述基板依次于第一工作辊和第三工作辊之间、第二工作辊和第四工作辊之间通过,从而在所述基板的第一表面上形成所述砂光面。The base plate to be cold-rolled is sent into the tempering machine, and the base plate is sequentially passed between the first work roll and the third work roll, between the second work roll and the fourth work roll, so that the The sanded surface is formed on the first surface of the substrate.
进一步地,所述第一机架的轧制力为3500~4500kN,第二机架的轧制力为3500~4000kN。Further, the rolling force of the first stand is 3500-4500 kN, and the rolling force of the second stand is 3500-4000 kN.
进一步地,所述第一工作辊和第二工作辊的换辊周期为120±20km,轧制吨位为150±30t。Further, the roll changing period of the first work roll and the second work roll is 120±20km, and the rolling tonnage is 150±30t.
进一步地,当所述基板的第二表面为光亮面时,所述第三工作辊和第四工作辊均为磨削光辊,所述第一工作辊表面的粗糙度为1.8±0.2μm,所述第二工作辊表面的粗糙度为0.70±0.05μm,所述第三工作辊表面的粗糙度为0.70±0.05μm,所述第四工作辊表面的粗糙度为0.40±0.05μm,所述第一机架的轧制力为3500±100kN,所述第二机架的轧制力为3500±100kN,所述基板经过平整机冷轧后,在其第二表面上形成光亮面。Further, when the second surface of the substrate is a bright surface, both the third work roll and the fourth work roll are ground smooth rolls, and the surface roughness of the first work roll is 1.8±0.2 μm, The roughness of the surface of the second work roll is 0.70±0.05 μm, the roughness of the surface of the third work roll is 0.70±0.05 μm, the roughness of the surface of the fourth work roll is 0.40±0.05 μm, the The rolling force of the first stand is 3500±100kN, and the rolling force of the second stand is 3500±100kN. After the substrate is cold-rolled by a temper mill, a bright surface is formed on the second surface.
进一步地,当所述基板的第二表面为细石纹面时,所述第三工作辊为电火花毛化轧辊,所述第四工作辊为磨削光辊,所述第一工作辊表面的粗糙度为2.0±0.2μm,所述第二工作辊表面的粗糙度为0.40±0.05μm,所述第三工作辊表面的粗糙度为1.2±0.2μm,所述第四工作辊表面的粗糙度为0.40±0.05μm,所述第一机架的轧制力为4000±100kN,所述第二机架的轧制力为3500±100kN,所述基板经过平整机冷轧后,在其第二表面上形成细石纹面。Further, when the second surface of the substrate is a fine stone surface, the third work roll is an EDM textured roll, the fourth work roll is a ground smooth roll, and the surface of the first work roll is The roughness of the surface of the second work roll is 2.0±0.2μm, the roughness of the surface of the second work roll is 0.40±0.05μm, the roughness of the surface of the third work roll is 1.2±0.2μm, the roughness of the surface of the fourth work roll The rolling force of the first stand is 0.40±0.05μm, the rolling force of the first stand is 4000±100kN, and the rolling force of the second stand is 3500±100kN. A fine stone surface is formed on the second surface.
进一步地,当所述基板的第二表面为粗石纹面时,所述第三工作辊为电火花毛化轧辊,所述第四工作辊为磨削光辊,所述第一工作辊表面的粗糙度为2.0±0.2μm,所述第二工作辊表面的粗糙度为0.40±0.05μm,所述第三工作辊表面的粗糙度为1.5±0.2μm,所述第四工作辊表面的粗糙度为0.70±0.05μm,所述第一机架的轧制力为4500±100kN,所述第二机架的轧制力为4000±100kN,所述基板经过平整机冷轧后,在其第二表面上形成粗石纹面。Further, when the second surface of the substrate is a rough stone surface, the third work roll is an EDM textured roll, the fourth work roll is a ground smooth roll, and the surface of the first work roll is The roughness of the surface of the second work roll is 2.0±0.2μm, the roughness of the surface of the second work roll is 0.40±0.05μm, the roughness of the surface of the third work roll is 1.5±0.2μm, the roughness of the surface of the fourth work roll The thickness is 0.70±0.05μm, the rolling force of the first stand is 4500±100kN, and the rolling force of the second stand is 4000±100kN. A rough stony finish is formed on the second surface.
本发明第二方面提供了一种使用第一方面所述的制备方法制得的带砂光面的基板,所述基板一面为砂光面,另一面为非砂光面,所述砂光面包括呈点状凹凸的打底纹路和位于部分所述打底纹路上的丝状线条,所述打底纹路和所述丝状线条的分布使得所述砂光面的粗糙度为0.50~0.80μm。The second aspect of the present invention provides a substrate with a sanded surface prepared by using the preparation method described in the first aspect, one side of the substrate is a sanded surface, the other side is a non-sanded surface, and the sanded surface Consisting of dot-like concave-convex bottoming lines and silky lines on part of the bottoming lines, the distribution of the bottoming lines and the silky lines makes the roughness of the sanding surface 0.50-0.80 μm .
进一步地,所述基板的材质为MR型、L型或D型原板钢。Further, the material of the base plate is MR type, L type or D type original plate steel.
进一步地,所述非砂光面为光面、细石纹面、粗石纹面、银色表面、粗银色表面或无光面。Further, the non-sanding surface is a smooth surface, a fine stone texture surface, a coarse stone texture surface, a silver surface, a rough silver surface or a matte surface.
本发明第三方面提供了一种镀锡板,所述镀锡板是在第二方面所述的基板表面电镀金属锡和软熔后得到的。The third aspect of the present invention provides a tinned plate, which is obtained by electroplating metal tin on the surface of the substrate described in the second aspect and reflowing.
进一步地,电镀金属锡时,电镀液中二价锡的浓度为20~25g/L,甲基磺酸的浓度为30~50mL/L,抗氧剂的浓度为35~60mL/L,添加剂的浓度为20~30mL/L;在电镀过程中,控制电镀液的温度为38~45℃,电流密度为22~28A/mm 2Further, when electroplating metal tin, the concentration of divalent tin in the electroplating solution is 20-25g/L, the concentration of methanesulfonic acid is 30-50mL/L, the concentration of antioxidant is 35-60mL/L, and the concentration of additives The concentration is 20-30mL/L; during the electroplating process, the temperature of the electroplating solution is controlled to be 38-45°C, and the current density is 22-28A/mm 2 .
进一步地,软熔时,软熔设定温度为260~290℃,软熔反馈温度为255~295℃,软熔功率占比为30%~50%。Further, during reflow, the reflow setting temperature is 260-290°C, the reflow feedback temperature is 255-295°C, and the reflow power ratio is 30%-50%.
进一步地,所述基板的一面为砂光面,另一面为细石纹面。Further, one side of the substrate is a sanded surface, and the other side is a fine stone textured surface.
本发明第四方面提供了一种镀铬板,所述镀铬板是在第二方面所述的基板表面电镀金属铬和氧化铬后得到的。The fourth aspect of the present invention provides a chrome-plated plate, which is obtained by electroplating metal chromium and chromium oxide on the surface of the substrate as described in the second aspect.
进一步地,电镀金属铬时,电镀液中铬酸酐的浓度为140~160g/L,氟化铵的浓度为3~4g/L;在电镀过程中,控制电镀液的温度为36~40℃,电流密度为50~80A/mm 2,第一回收槽内铬酸酐的浓度≤50g/L,第二回收槽内铬酸酐的浓度≤40g/L。 Further, when electroplating metal chromium, the concentration of chromic anhydride in the electroplating solution is 140-160g/L, and the concentration of ammonium fluoride is 3-4g/L; during the electroplating process, the temperature of the electroplating solution is controlled to be 36-40°C, The current density is 50-80A/mm 2 , the concentration of chromic anhydride in the first recovery tank is ≤50g/L, and the concentration of chromic anhydride in the second recovery tank is ≤40g/L.
进一步地,电镀氧化铬时,电镀液中铬酸酐的浓度为60~70g/L,氟化铵的浓度为1~2g/L,氢氧化钠的浓度为8~10g/L;在电镀过程中,控制电镀液的温度为31~35℃,电流密度为9~22A/mm 2,生成的氧化铬层的重量为8~15g/m 2Further, when electroplating chromium oxide, the concentration of chromic anhydride in the electroplating solution is 60-70g/L, the concentration of ammonium fluoride is 1-2g/L, and the concentration of sodium hydroxide is 8-10g/L; , controlling the temperature of the electroplating solution to be 31-35°C, the current density to be 9-22A/mm 2 , and the weight of the formed chromium oxide layer to be 8-15g/m 2 .
进一步地,所述基板的一面为砂光面,另一面为细石纹面。Further, one side of the substrate is a sanded surface, and the other side is a fine stone textured surface.
本发明第五方面提供了一种缩颈罐,所述缩颈罐是由所述的镀锡板或镀铬板制备而成的。The fifth aspect of the present invention provides a necked tank, the necked tank is prepared from the tin-plated or chrome-plated plate.
本发明第六方面提供了一种易开盖,所述易开盖是由所述的镀锡板制备而成的。The sixth aspect of the present invention provides an easy-open end, the easy-open end is prepared from the tin-plated sheet.
与现有技术相比,本发明的有益效果在于:Compared with prior art, the beneficial effect of the present invention is:
1.本发明创造性的提出了一种镀锡/镀铬基板的全新处理工艺,使得基板具有内外两种不同的表面,且在用于形成罐体内壁的内表面上制作一种新的表面形貌——砂光面,其粗糙度 为0.50~0.80μm,微观形貌包括呈点状凹凸的打底纹路和位于部分打底纹路上的丝状线条。带有这种砂光面的基板在镀锡或镀铬过程中,镀层能够更加均匀地分布于基板的表面。因此,得到的镀锡板/镀铬板在加工成缩颈罐或易开盖时,缩颈处和预划膜处的镀层不易被破坏,具有良好的耐蚀性,不会被内容物腐蚀。而用于形成罐体外壁的外表面,则可以保留原先的表面形貌,使得本发明制作得到的镀锡/镀铬基板在制作形成各种罐体包装品时,能够保留现有罐体包装品的视觉特征,从而避免切换新罐体包装品带来的营销成本,使得本发明的基板具有更强的普适性。1. The present invention creatively proposes a new treatment process for tin-plated/chrome-plated substrates, so that the substrate has two different surfaces inside and outside, and a new surface morphology is produced on the inner surface used to form the inner wall of the tank ——Sanded surface, the roughness of which is 0.50-0.80 μm, and the microscopic appearance includes dot-like concave-convex grounding lines and silky lines on some of the grounding lines. Substrates with such a sanded surface can be more evenly distributed on the surface of the substrate during tin or chrome plating. Therefore, when the obtained tin-plated/chrome-plated plate is processed into a necked can or an easy-open end, the coating at the necked part and the pre-scribed film is not easily damaged, has good corrosion resistance, and will not be corroded by the contents. The outer surface used to form the outer wall of the tank can retain the original surface morphology, so that the tin-plated/chrome-plated substrate produced by the present invention can retain the existing tank packages when forming various tank packages. visual characteristics, thereby avoiding the marketing cost caused by switching to new can packaging products, so that the substrate of the present invention has stronger universality.
2.本发明对现有的镀锡和镀铬工艺进行了改进,新的电镀工艺提高了镀锡层和镀铬层的致密性和合金层覆盖的均匀性,减小了孔隙深度,从而使得镀层能够更好地保护基板,进一步地提高了基板的耐腐蚀性。2. The present invention improves the existing tin-plating and chrome-plating processes. The new electroplating process improves the compactness of the tin-plated layer and the chrome-plated layer and the uniformity of the alloy layer coverage, reduces the depth of the pores, so that the coating can be The substrate is better protected, and the corrosion resistance of the substrate is further improved.
附图说明Description of drawings
图1为缩颈罐的结构示意图;Fig. 1 is the structural representation of necking tank;
图2是易开盖的结构示意图;Fig. 2 is a schematic structural view of the easy-open end;
图3是R1面在显微镜下的板面纹理;Figure 3 is the surface texture of the R1 surface under the microscope;
图4是Rs面在显微镜下的板面纹理;Figure 4 is the surface texture of the Rs surface under the microscope;
图5是R1表面(a)和Rs表面(b)的拉丝纹路示意图;Fig. 5 is a schematic diagram of wire drawing lines on R1 surface (a) and Rs surface (b);
图6是采用现有的镀锡工艺(a)和本发明的镀锡工艺(b)时,基板上锡层的表面形貌图;Fig. 6 is when adopting existing tinning process (a) and tinning process (b) of the present invention, the surface topography figure of tin layer on the substrate;
图7是采用现有的软熔工艺(a,b,c)和本发明的镀锡工艺(d,e,f)时,基板上合金层的表面形貌图;Fig. 7 is when adopting existing reflow process (a, b, c) and tin plating process (d, e, f) of the present invention, the surface topography figure of alloy layer on the substrate;
图8是采用本发明的电镀金属铬工艺得到的金属铬层的表面形貌图;Fig. 8 is the surface topography figure of the metal chromium layer that adopts electroplating metal chromium process of the present invention to obtain;
图9是采用本发明的电镀氧化铬工艺得到的金属铬层和氧化铬层的一体表面形貌图。Fig. 9 is an integrated surface topography diagram of a metal chromium layer and a chromium oxide layer obtained by the electroplating chromium oxide process of the present invention.
具体实施方式Detailed ways
下面结合附图和具体实施例对本发明作进一步说明,以使本领域的技术人员可以更好地理解本发明并能予以实施,但所举实施例不作为对本发明的限定。The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments, so that those skilled in the art can better understand the present invention and implement it, but the examples given are not intended to limit the present invention.
除非另有定义,本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人 员通常理解的含义相同。本发明的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本发明。本文所使用的术语“及/或”包括一个或多个相关的所列项目的任意的和所有的组合。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this invention belongs. The terms used in the description of the present invention are only for the purpose of describing specific embodiments, and are not intended to limit the present invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
如背景技术所述,目前,缩颈罐(附图1)或易开盖(附图2)选用的镀锡板/镀铬板的表面形貌为R1(细石纹面),粗糙度Ra控制在0.29~0.55μm之间,板面纹理呈石纹状,拉丝感一般(目视类似细、浅短划伤),在强光照射下呈现较轻的颗粒感。但是,由这种镀锡板/镀铬板制成的缩颈罐或易开盖在使用过程中,缩颈处或预划膜处易被内容物腐蚀,无法满足耐腐蚀的要求。As described in the background technology, at present, the surface morphology of the tin plate/chrome plate selected for the necking can (accompanying drawing 1) or the easy-open end (accompanying drawing 2) is R1 (fine stone surface), and the roughness Ra is controlled Between 0.29 and 0.55 μm, the texture of the surface of the board is stone-like, with a general feeling of drawing (visually similar to thin and shallow scratches), and it presents a lighter grainy feeling under strong light. However, the necked cans or easy-open lids made of such tin-plated/chrome-plated plates are easily corroded by the contents at the necked or pre-scribed areas during use, which cannot meet the corrosion resistance requirements.
发明人经过长期研究发现,造成缩颈处或预划膜处易被内容物腐蚀的主要原因是镀锡/镀铬基板的表面形貌。由于现有技术中基板的内容物面为细石纹面R1,其表面具有拉丝的形貌。拉丝的存在造成基板表面呈明显的高低差,如附图3所示,在显微镜下观察时,拉丝部位显示出严重的高低不平,犹如沟壑一般分布在基板的表面。After long-term research, the inventors found that the main reason why the constriction or the pre-scribing film is easily corroded by the content is the surface morphology of the tin/chrome-plated substrate. Since the content surface of the substrate in the prior art is the fine stone texture surface R1, its surface has a brushed appearance. The presence of wire drawing causes obvious height difference on the surface of the substrate. As shown in Figure 3, when observed under a microscope, the wire drawing part shows serious unevenness, which is generally distributed on the surface of the substrate like ravines.
以镀锡板为例,当在这种基板上电镀锡时,在锡沉积量一定的情况下,由于拉丝的存在,基板上突出部位的镀锡量会大于凹下去的部位,从而阻碍了锡的均匀沉积。在软熔过程中,基板上沉积的锡会熔融并流动,当流动至凹下去的部位后,凹下去的部位将阻碍锡熔体的进一步的流动,进而阻碍锡熔融后的流平,最终影响合金层的形成。因此,在细石纹面上电镀锡时,锡层的分布不均匀,拉丝部位的含锡量明显较少。这就导致在制罐或制盖的过程中,由于缩颈形变或盖预划膜过程中,拉丝部位本身较少的锡层进一步被破坏,使得拉丝部位的基材无锡层防护,直接暴露在外部,造成拉丝部位的耐蚀性急剧下降。Taking the tin plate as an example, when tin is electroplated on this substrate, under the condition of a certain amount of tin deposition, due to the existence of wire drawing, the amount of tin plating on the protruding part of the substrate will be greater than that on the concave part, thus hindering the tin plating. uniform deposition. During the reflow process, the tin deposited on the substrate will melt and flow. When it flows to the recessed part, the recessed part will hinder the further flow of the tin melt, thereby hindering the leveling of the tin after melting, and finally affecting Alloy layer formation. Therefore, when tin is electroplated on the surface of fine stone texture, the distribution of tin layer is uneven, and the tin content of the drawing part is obviously less. This leads to further damage to the less tin layer in the drawing part itself due to necking deformation or the pre-scribing process of the cover in the process of making cans or lids, so that the base material of the drawing part has no tin layer protection and is directly exposed to Externally, the corrosion resistance of the drawing part will drop sharply.
在镀铬板中也存在同样的情况。在基板表面电镀金属铬时,镀层表面的孔隙较少,但呈深坑型,这主要是由于电镀金属铬层为体心立方结构,随着电流密度的改变晶格择优取向生长形成的;且镀铬的电流效率一般为20%~25%,副反应为析氢反应,从而增加了金属铬层沿纵向产生孔隙。加之由于基材的细石纹面上沿纵向拉丝状划伤的存在,造成纵向孔隙的进一步加深,使得电镀铬的过程中拉丝沟壑底部金属铬的沉积进一步减少。而氧化铬层为网状、层状结构,随着沟壑程度的加剧,其对金属铬层的保护也进一步降低,从而造成镀铬板耐腐蚀性的下降。The same situation exists in the chrome plate. When metal chromium is electroplated on the surface of the substrate, the pores on the surface of the coating are less, but in the form of deep pits, which is mainly due to the body-centered cubic structure of the electroplated metal chromium layer, which is formed by the preferred orientation of the crystal lattice as the current density changes; and The current efficiency of chromium plating is generally 20% to 25%, and the side reaction is hydrogen evolution reaction, which increases the pores of the metal chromium layer along the longitudinal direction. In addition, due to the existence of wire-like scratches along the longitudinal direction on the fine stone surface of the substrate, the longitudinal pores are further deepened, so that the deposition of metallic chromium at the bottom of the wire-drawing groove is further reduced during the electrochrome plating process. The chromium oxide layer has a network and layered structure, and as the degree of gully increases, its protection to the metal chromium layer is further reduced, resulting in a decrease in the corrosion resistance of the chrome-plated plate.
目前,在制罐行业中,镀锡板/镀铬板的基板表面形貌有B(光面),R1(细石纹面),R2(粗石纹面),S1(银色表面),S2(粗银色表面),M(无光面),各产品形貌规范及标准如表1所示。At present, in the canning industry, the substrate surface morphology of tin plate/chrome plate has B (bright surface), R1 (fine stone surface), R2 (coarse stone surface), S1 (silver surface), S2 ( Coarse silver surface), M (matte surface), the appearance specifications and standards of each product are shown in Table 1.
表1现有镀锡板/镀铬板产品的形貌规范及标准Table 1 The appearance specifications and standards of existing tinplate/chrome plate products
Figure PCTCN2021114194-appb-000001
Figure PCTCN2021114194-appb-000001
发明人发现,上述表面形貌均不适合作为罐、盖材料的内表面。为了克服现有技术中的镀锡板/镀铬板易腐蚀的问题,发明人研究设计出了一种新的镀锡/镀铬基板的表面形貌,定义为砂光面,以Rs表示。如附图4所示,在显微镜下观察时,这种Rs表面上具有呈点状凹凸的打底纹路和位于部分所述打底纹路上的丝状线条,所述打底纹路和所述丝状线条的分布使得所述砂光面的粗糙度为0.50~0.80μm。在常光下观察时,Rs表面存在颗粒感,较细腻,强光照射下存在轻微拉丝感,板面光泽度略呈浅银色,反光性较差。如附图5所示,与R1面相比,本发明Rs面的拉丝纹路短而浅,从而降低了拉丝(划伤)的程度,消除了由于拉丝造成的基板沟壑对电镀锡的沉积与软熔过程中锡的流平的影响,从而使得基板表面均匀覆盖锡层与合金层;并且由于锡具备良好的延展性,最终增加制罐、盖过程中形变区的耐蚀性。The inventors found that none of the above surface topography is suitable as the inner surface of cans and lid materials. In order to overcome the problem that the tin-plated/chrome-plated plate in the prior art is easy to corrode, the inventor researched and designed a new surface morphology of the tin-plated/chrome-plated substrate, which is defined as a sanded surface and represented by Rs. As shown in Figure 4, when observed under a microscope, the surface of this Rs has a dot-shaped concave-convex texture and silky lines located on part of the texture, the texture and the silk The distribution of the shaped lines makes the roughness of the sanded surface 0.50-0.80 μm. When observed under normal light, the surface of Rs has a grainy feel, which is relatively fine, and there is a slight brushing feeling under strong light. The gloss of the board surface is slightly light silver, and the reflectivity is poor. As shown in Figure 5, compared with the R1 surface, the wire drawing lines on the Rs surface of the present invention are shorter and shallower, thereby reducing the degree of wire drawing (scratching), and eliminating the deposition and reflow of electroplated tin due to substrate grooves caused by wire drawing The impact of tin leveling in the process, so that the surface of the substrate is evenly covered with tin layer and alloy layer; and because tin has good ductility, it finally increases the corrosion resistance of the deformation zone in the process of can making and lid.
本发明提供了带砂光面的基板的制备方法,具体包括以下步骤:The invention provides a method for preparing a substrate with a sanded surface, which specifically includes the following steps:
(1)提供一平整机,所述平整机包括第一机架和第二机架,所述第一机架包括相对设置的第一工作辊和第三工作辊,所述第二机架包括相对设置的第二工作辊和第四工作辊,所述第一工作辊和第二工作辊位于同一侧,该第一工作辊和第二工作辊用以与所述基板的第一表面接触并形成所述砂光面,其中:(1) Provide a tempering machine, the tempering machine includes a first frame and a second frame, the first frame includes a first work roll and a third work roll oppositely arranged, the second frame including a second work roll and a fourth work roll oppositely arranged, the first work roll and the second work roll are located on the same side, and the first work roll and the second work roll are used to contact the first surface of the substrate And form the sanded surface, wherein:
所述第一工作辊为电火花毛化轧辊,所述第二工作辊为磨削光辊;所述第一工作辊表面的粗糙度为1.6~2.2μm,所述第二工作辊表面的粗糙度为0.35~0.75μm;The first work roll is an electric spark textured roll, and the second work roll is a ground smooth roll; the roughness of the surface of the first work roll is 1.6-2.2 μm, and the roughness of the surface of the second work roll is The degree is 0.35~0.75μm;
(2)将待冷轧的基板送入所述平整机中,使所述基板依次于第一工作辊和第三工作辊之间、第二工作辊和第四工作辊之间通过,从而在所述基板的第一表面上形成所述砂光面。(2) Send the base plate to be cold-rolled into the tempering machine, so that the base plate passes between the first work roll and the third work roll, between the second work roll and the fourth work roll, thereby The sanded surface is formed on the first surface of the substrate.
电火花毛化辊是采用电火花毛化(EDT)技术制备的轧辊,其基于电火花放电原理在轧辊表面产生凹坑状的毛刺,通过电火花毛化辊的轧制,能够在基板表面形成颗粒状的形貌。磨削光辊是基于磨削工艺在轧辊表面形成,通过磨削光辊的轧制,能够在基板表面形成拉丝状的形貌。本发明中,通过控制第一工作辊和第二工作辊表面的形貌和粗糙度,在外加轧制力的作用下,辊面的形貌和粗糙度被印制在基板的表面,从而在基板表面形成了所述砂光面形貌。优选地,第一机架向第一工作辊施加的轧制力为3500~4500kN,第二机架向第二工作辊施加的轧制力为3500~4000kN。The EDM texturing roll is a roll prepared by the EDM texturing (EDT) technology, which produces pit-shaped burrs on the surface of the roll based on the principle of EDM, and can be formed on the surface of the substrate by rolling the EDM texturing roll. granular morphology. The ground smooth roll is formed on the surface of the roll based on the grinding process. Through the rolling of the ground smooth roll, a wire-like morphology can be formed on the surface of the substrate. In the present invention, by controlling the topography and roughness of the surface of the first work roll and the second work roll, under the action of the external rolling force, the topography and roughness of the roll surface are printed on the surface of the substrate, thereby The surface of the substrate forms the sanded surface topography. Preferably, the rolling force applied by the first stand to the first work roll is 3500-4500 kN, and the rolling force applied by the second stand to the second work roll is 3500-4000 kN.
第一工作辊和第二工作辊在使用一定的时间后需要更换,是否需要更换可根据换辊周期或轧制吨位确定。其中换辊周期指的是工作辊轧制的基材的总长度,而轧制吨位指的是工作辊轧制的基材的总重量。例如换辊周期是120km,就是指工作辊轧到120km基材后就要停线换辊,同样的,轧制吨位为150吨,就是指工作辊轧到150吨基材后就要停线换辊。本发明中,所述第一工作辊和第二工作辊的换辊周期优选为120±20km,轧制吨位优选为150±30t。The first work roll and the second work roll need to be replaced after being used for a certain period of time, and whether they need to be replaced can be determined according to the roll change cycle or rolling tonnage. The roll change cycle refers to the total length of the base material rolled by the work rolls, and the rolling tonnage refers to the total weight of the base material rolled by the work rolls. For example, if the roll changing period is 120km, it means that the line will be stopped and changed after the work roll reaches 120km of substrate. Similarly, the rolling tonnage is 150 tons, which means that the line will be stopped and replaced after the work roll reaches 150 tons of substrate. roll. In the present invention, the roll changing cycle of the first work roll and the second work roll is preferably 120±20km, and the rolling tonnage is preferably 150±30t.
此外,发明人舍弃了传统双面R1面的生产制造工艺,采用新型差异化表面形貌控制,罐体外表面依旧采取原R1面,内表面采取本发明的Rs面,从而得到一种差异化形貌的基板Rs/R1。通过差异化形貌控制(Rs内容物面/R1外表面),提高基板在电镀过程中镀层覆盖的致密性和均匀性,使得板材在胀缩时不易变形破裂,从而提高了罐体内部的耐腐蚀性能,同时保证了罐体外部的可视性。这种Rs/R1差异化形貌的基板通过镀锡后,可用于制备缩颈罐或易开盖,镀铬后可用于制备缩颈罐。In addition, the inventor abandoned the traditional double-sided R1 surface manufacturing process, and adopted a new type of differentiated surface morphology control. The outer surface of the tank still adopts the original R1 surface, and the inner surface adopts the Rs surface of the present invention, thereby obtaining a differentiated shape. The appearance of the substrate Rs/R1. Through differential shape control (Rs content surface/R1 outer surface), the density and uniformity of the coating coverage of the substrate during the electroplating process are improved, so that the plate is not easy to deform and crack during expansion and contraction, thereby improving the resistance of the tank inside. Corrosion performance while maintaining visibility to the outside of the tank. The substrate with the Rs/R1 differential morphology can be used to prepare necked cans or easy-open lids after tin plating, and can be used to prepare necked cans after chrome plating.
上述基板可采用制罐行业常用的基板材质,优选为MR型、L型或D型原板钢。The above-mentioned base plate can adopt the base plate material commonly used in the can making industry, preferably MR-type, L-type or D-type raw plate steel.
上述Rs/R1差异化形貌的基板可通过控制第三工作辊、第四工作辊的种类和表面粗糙度以及轧制力来制备得到。具体的,控制所述第三工作辊为电火花毛化轧辊,所述第四工作辊为磨削光辊,所述第一工作辊表面的粗糙度为2.0±0.2μm,所述第二工作辊表面的粗糙度为0.40±0.05μm,所述第三工作辊表面的粗糙度为1.2±0.2μm,所述第四工作辊表面的粗糙度为0.40±0.05μm,所述第一机架的轧制力为4000±100kN,所述第二机架的轧制力为3500±100kN, 所述基板经过平整机冷轧后,在其第二表面上形成细石纹面(R1)。The substrate with the above Rs/R1 differential morphology can be prepared by controlling the types, surface roughness and rolling force of the third work roll and the fourth work roll. Specifically, the third work roll is controlled to be an EDM textured roll, the fourth work roll is a ground smooth roll, the surface roughness of the first work roll is 2.0±0.2 μm, and the second work roll is The roughness of the roll surface is 0.40±0.05 μm, the roughness of the surface of the third work roll is 1.2±0.2 μm, the roughness of the surface of the fourth work roll is 0.40±0.05 μm, and the The rolling force is 4000±100kN, and the rolling force of the second stand is 3500±100kN. After the substrate is cold-rolled by a temper mill, a fine stone surface (R1) is formed on the second surface of the substrate.
通过同样的方法,能够得到第二表面为其他形貌的差异化形貌的基板,如Rs/B基板、Rs/R2基板等。Through the same method, substrates with differentiated morphologies on the second surface can be obtained, such as Rs/B substrates, Rs/R2 substrates, and the like.
制备上述Rs/B基板的方法为:控制所述第三工作辊和第四工作辊均为磨削光辊,所述第一工作辊表面的粗糙度为1.8±0.2μm,所述第二工作辊表面的粗糙度为0.70±0.05μm,所述第三工作辊表面的粗糙度为0.70±0.05μm,所述第四工作辊表面的粗糙度为0.40±0.05μm,所述第一机架的轧制力为3500±100kN,所述第二机架的轧制力为3500±100kN,所述基板经过平整机冷轧后,在其第二表面上形成光亮面(B)。The method for preparing the above-mentioned Rs/B substrate is: control the third work roll and the fourth work roll to be ground smooth rolls, the surface roughness of the first work roll is 1.8±0.2 μm, and the second work roll The roughness of the roll surface is 0.70±0.05 μm, the roughness of the surface of the third work roll is 0.70±0.05 μm, the roughness of the surface of the fourth work roll is 0.40±0.05 μm, and the The rolling force is 3500±100kN, the rolling force of the second stand is 3500±100kN, and the bright surface (B) is formed on the second surface of the substrate after being cold-rolled by a temper mill.
制备上述Rs/R2基板的方法为:控制所述第三工作辊为电火花毛化轧辊,所述第四工作辊为磨削光辊,所述第一工作辊表面的粗糙度为2.0±0.2μm,所述第二工作辊表面的粗糙度为0.40±0.05μm,所述第三工作辊表面的粗糙度为1.5±0.2μm,所述第四工作辊表面的粗糙度为0.70±0.05μm,所述第一机架的轧制力为4500±100kN,所述第二机架的轧制力为4000±100kN,所述基板经过平整机冷轧后,在其第二表面上形成粗石纹面(R2)。The method for preparing the above-mentioned Rs/R2 substrate is: controlling the third work roll to be an EDM textured roll, the fourth work roll to be a ground smooth roll, and the surface roughness of the first work roll to be 2.0±0.2 μm, the roughness of the surface of the second work roll is 0.40±0.05 μm, the roughness of the surface of the third work roll is 1.5±0.2 μm, the roughness of the surface of the fourth work roll is 0.70±0.05 μm, The rolling force of the first stand is 4500±100kN, and the rolling force of the second stand is 4000±100kN. After the substrate is cold-rolled by a temper mill, rough stones are formed on its second surface. Textured surface (R2).
表2详细地示出了制备上述几种差异化形貌的基板的配辊方案。Table 2 shows in detail the roll matching schemes for preparing the above-mentioned substrates with different morphologies.
表2差异化形貌的金属基板的平整机配辊方案Table 2 Roll matching scheme of the tempering machine for metal substrates with differentiated morphology
Figure PCTCN2021114194-appb-000002
Figure PCTCN2021114194-appb-000002
当然,根据下游用户的不同需求,也可采用同样的方法制备出其他几种差异化形貌的基板Rs/S1、Rs/S2s、Rs/M,具体方法在此不再赘述。Of course, according to the different needs of downstream users, the same method can also be used to prepare other substrates Rs/S1, Rs/S2s, and Rs/M with different shapes, and the specific methods will not be repeated here.
除了基板的表面形貌之外,电镀工艺对于镀锡板/镀铬板的耐腐蚀性能的影响同样也不可忽视。因此,本发明进一步对基板的电镀锡及软熔工艺进行了研究。In addition to the surface morphology of the substrate, the influence of the electroplating process on the corrosion resistance of tin-plated/chrome-plated plates cannot be ignored. Therefore, the present invention further studies the tin plating and reflow process of the substrate.
表3现有的电镀锡工艺参数Table 3 Existing tinning process parameters
Figure PCTCN2021114194-appb-000003
Figure PCTCN2021114194-appb-000003
通过显微镜观察镀锡板表面发现,采用现有的电镀锡工艺,锡层与合金层并不是全部致密地覆盖在基板的表面,如图6(a)所示,锡层的晶粒粗大、疏松,晶粒与晶粒间间隙大,这会导致镀锡板的耐腐蚀性差。因此,为了提高镀锡板耐腐蚀性能,提高锡层的致密性与合金层的覆盖性为首要方法。Observing the surface of the tinplate through a microscope, it is found that the tin layer and the alloy layer are not all densely covered on the surface of the substrate by using the existing tin plating process. As shown in Figure 6(a), the grains of the tin layer are coarse and loose. , The gap between grains and grains is large, which will lead to poor corrosion resistance of tinplate. Therefore, in order to improve the corrosion resistance of tinplate, improving the density of the tin layer and the coverage of the alloy layer is the primary method.
发明人对现有的电镀锡工艺进行了改进,提供了一种新的电镀锡工艺,具体如表4所示。电镀金属锡时,电镀液中二价锡的浓度为15~25g/L,甲基磺酸的浓度为30~50mL/L,抗氧剂的浓度为35~60mL/L,添加剂的浓度为25~30mL/L。在电镀过程中,控制电镀液的温度为38~45℃,电流密度为22~28A/mm 2。优选地,控制电镀液中二价锡的浓度为20g/L,甲基磺酸的浓度为40mL/L,抗氧剂的浓度为45mL/L,添加剂的浓度为25mL/L,控制电镀液的温度为42℃,电流密度为25A/mm 2The inventor improved the existing tinning process and provided a new tinning process, as shown in Table 4. When electroplating metal tin, the concentration of divalent tin in the electroplating solution is 15-25g/L, the concentration of methanesulfonic acid is 30-50mL/L, the concentration of antioxidant is 35-60mL/L, and the concentration of additives is 25 ~30mL/L. During the electroplating process, the temperature of the electroplating solution is controlled to be 38-45° C., and the current density is 22-28 A/mm 2 . Preferably, it is 20g/L to control the concentration of divalent tin in the electroplating solution, the concentration of methanesulfonic acid is 40mL/L, the concentration of antioxidant is 45mL/L, and the concentration of additive is 25mL/L. The temperature was 42°C and the current density was 25A/mm 2 .
需要指出的是,上述抗氧剂可选用本领域常用的氧化剂,包括但不限于苯酚、对苯二酚、间苯二酚、邻苯二酚中的一种或多种。本发明中,所使用的抗氧剂为奎克化学QUAKERTIN TM TPMW AOX抗氧剂。上述添加剂可选用本领域常用的添加剂,包括但不限于表面活性剂、晶粒细化剂中的一种或多种。本发明中,所使用的添加剂为奎克化学QUAKERTIN TM Additive添加剂。 It should be pointed out that the above-mentioned antioxidants can be selected from commonly used oxidants in the field, including but not limited to one or more of phenol, hydroquinone, resorcinol, and catechol. In the present invention, the antioxidant used is QUAKERTIN TM TPMW AOX antioxidant of Quaker Chemical. The above-mentioned additives may be additives commonly used in the art, including but not limited to one or more of surfactants and grain refiners. In the present invention, the additive used is Quake Chemical's QUAKERTIN Additive additive.
表4本发明的电镀锡工艺参数Table 4 Electrotin plating process parameter of the present invention
Figure PCTCN2021114194-appb-000004
Figure PCTCN2021114194-appb-000004
采用本发明的改进型电镀工艺进行镀锡,基板上锡层的表面形貌如图6(b)所示。从图中可以看出,锡层的晶粒细致、紧密,晶粒与晶粒间间隙小,能够更好地保护基板,提高基板的耐腐蚀性。Using the improved electroplating process of the present invention for tin plating, the surface morphology of the tin layer on the substrate is shown in Figure 6(b). It can be seen from the figure that the grains of the tin layer are fine and compact, and the gap between grains is small, which can better protect the substrate and improve the corrosion resistance of the substrate.
在电镀锡后,通过软熔工艺使得锡层熔融、流动,得到合金层,从而能够提高镀锡层的均匀性。表5示出了现有的电镀锡软熔工艺参数。After electroplating tin, the tin layer is melted and flowed through a reflow process to obtain an alloy layer, thereby improving the uniformity of the tin layer. Table 5 shows the existing electrolytic tin plating reflow process parameters.
表5现有的电镀锡软熔工艺参数Table 5 Existing tin reflow process parameters
项目project 软熔箱高度(m)Soft melting tank height (m) 软熔设定温度(℃)Reflow set temperature (℃) 软熔反馈温度(℃)Reflow feedback temperature (℃) 软熔功率占比(%)Reflow power ratio (%)
目标范围target range 6-86-8 280-300280-300 280-310280-310 40-7040-70
控制目标Control objectives 6.56.5 290290 295295 5050
如图7(a)~(c)所示,采用现有的软熔工艺,形成的合金层晶粒比较细小,因此耐蚀性也较差。As shown in Figure 7(a)-(c), the alloy layer formed by the existing reflow process has relatively fine grains, so the corrosion resistance is also poor.
本发明对于软熔工艺也进行了改进,具体如表6所示。软熔时,使用的软熔箱高度为3.5~5.5m,软熔设定温度为260~290℃,软熔反馈温度为255~295℃,软熔功率占比为30%~50%。优选地,使用的软熔箱高度为4.5m,软熔设定温度为270℃,软熔反馈温度为275℃,软熔功率占比为40%。The present invention also improves the reflow process, as shown in Table 6. During reflow, the height of the reflow box used is 3.5-5.5m, the reflow setting temperature is 260-290°C, the reflow feedback temperature is 255-295°C, and the reflow power ratio is 30%-50%. Preferably, the height of the reflow box used is 4.5m, the set reflow temperature is 270°C, the reflow feedback temperature is 275°C, and the reflow power ratio is 40%.
表6本发明的软熔工艺参数Table 6 The reflow process parameter of the present invention
项目project 软熔箱高度(m)Soft melting tank height (m) 软熔设定温度(℃)Reflow set temperature (℃) 软熔反馈温度(℃)Reflow feedback temperature (℃) 软熔功率占比(%)Reflow power ratio (%)
目标范围target range 3.5-5.53.5-5.5 260-290260-290 255-295255-295 30-5030-50
控制目标Control objectives 4.54.5 270270 275275 4040
采用本发明的软熔工艺,得到的合金层的表面形貌如图7(d)~(f)所示。从图中可以看出,合金层晶粒粗大、呈柱状,且连续性较好,因此耐蚀性也更好。Using the reflow process of the present invention, the surface morphology of the obtained alloy layer is shown in Figure 7(d)-(f). It can be seen from the figure that the grains of the alloy layer are coarse, columnar, and have good continuity, so the corrosion resistance is also better.
进一步地,本发明还对基板的镀铬工艺进行了研究。Further, the present invention also studies the chrome plating process of the substrate.
如前所述,采用现有的工艺(如表7所示)电镀金属铬时,由于晶格的择优取向生长以及镀铬工艺本身的特性(电流效率低,一般为20%~25%,副反应为析氢反应),使金属铬层沿纵向产生呈深坑型的孔隙。因此提高金属铬沉积过程中晶粒的致密性、降低孔隙深度,是提高镀铬板耐蚀性的重要措施。As previously mentioned, when adopting the existing technology (as shown in Table 7) to electroplate metal chromium, due to the preferred orientation growth of the crystal lattice and the characteristics of the chromium plating process itself (the current efficiency is low, generally 20% to 25%, side reactions For the hydrogen evolution reaction), the metal chromium layer produces deep pit-shaped pores along the longitudinal direction. Therefore, improving the density of grains and reducing the depth of pores in the process of metal chromium deposition are important measures to improve the corrosion resistance of chromium-plated plates.
表7现有的电镀金属铬工艺参数Table 7 Existing Process Parameters for Electroplating Metal Chromium
Figure PCTCN2021114194-appb-000005
Figure PCTCN2021114194-appb-000005
本发明对电镀金属铬的工艺进行了改进,如表8所示。电镀金属铬时,控制电镀液中铬酸酐的浓度为140~160g/L,氟化铵的浓度为3~4g/L,第一回收槽内铬酸酐的浓度为≤50g/L, 第二回收槽内铬酸酐的浓度≤40g/L;在电镀过程中,控制电镀液的温度为33~43℃,电流密度为25~100A/mm 2。优选地,电镀金属铬时,控制电镀液中铬酸酐的浓度为150g/L,氟化铵的浓度为3.5g/L,第一回收槽内铬酸酐的浓度为30g/L,第二回收槽内铬酸酐的浓度10g/L;在电镀过程中,控制电镀液的温度为38℃,电流密度为65A/mm 2The present invention improves the process of electroplating metal chromium, as shown in Table 8. When electroplating metal chromium, control the concentration of chromic anhydride in the electroplating solution to be 140-160g/L, the concentration of ammonium fluoride to be 3-4g/L, the concentration of chromic anhydride in the first recovery tank to be ≤50g/L, and the second recovery The concentration of chromic anhydride in the tank is ≤40g/L; during the electroplating process, the temperature of the electroplating solution is controlled to be 33-43°C, and the current density is 25-100A/mm 2 . Preferably, when electroplating metal chromium, the concentration of chromic anhydride in the control electroplating solution is 150g/L, the concentration of ammonium fluoride is 3.5g/L, the concentration of chromic anhydride in the first recovery tank is 30g/L, the second recovery tank The concentration of internal chromic anhydride is 10g/L; during the electroplating process, the temperature of the electroplating solution is controlled at 38°C, and the current density is 65A/mm 2 .
表8本发明的电镀金属铬工艺参数Electroplating metal chromium process parameter of the present invention of table 8
Figure PCTCN2021114194-appb-000006
Figure PCTCN2021114194-appb-000006
采用上述的电镀金属铬工艺,得到的金属铬层的表面形貌如图8所示。从图中可以看出,通过上述电镀工艺可以得到深坑深度浅且致密的金属铬层,这种形貌的金属铬层能够更好地保护基板,提高其耐腐蚀性。Using the above metal chromium electroplating process, the surface morphology of the obtained metal chromium layer is shown in FIG. 8 . It can be seen from the figure that a shallow and dense metal chromium layer with deep pits can be obtained through the above electroplating process. The metal chromium layer with this shape can better protect the substrate and improve its corrosion resistance.
在电镀铬过程中,由于金属铬与氧化铬之间的作用是相互的,即在沉积金属铬的同时氧化铬也随之产生,在沉积氧化铬的同时金属铬也会随之产生,互相交织在一起。如表9所示,采用现有的工艺在电镀氧化铬时,生成的氧化铬层的主要成分为Cr 2O 3、CrOOH、Cr(OH) 3,表面孔隙扁平、细小。其为网状、层状结构,主要起到封闭金属铬层的微小孔隙的作用。因此提高氧化铬层网状结构的致密性,也可以提高镀铬板的耐蚀性。 In the process of electroplating chromium, since the interaction between metal chromium and chromium oxide is mutual, that is, when metal chromium is deposited, chromium oxide is also produced, and when chromium oxide is deposited, metal chromium will also be produced, interweaving each other. together. As shown in Table 9, when using the existing process to electroplate chromium oxide, the main components of the formed chromium oxide layer are Cr 2 O 3 , CrOOH, Cr(OH) 3 , and the pores on the surface are flat and fine. It has a network and layered structure, which mainly plays the role of sealing the tiny pores of the metal chromium layer. Therefore, improving the density of the network structure of the chromium oxide layer can also improve the corrosion resistance of the chrome-plated plate.
表9现有的电镀氧化铬工艺参数Table 9 Existing process parameters for electroplating chromium oxide
Figure PCTCN2021114194-appb-000007
Figure PCTCN2021114194-appb-000007
为提高氧化铬层网状结构的致密性,本发明对电镀氧化铬工艺进行了改进,如表10所示。电镀氧化铬时,电镀液中铬酸酐的浓度为60~70g/L,氟化铵的浓度为1~2g/L,氢氧化钠的浓度为6~12g/L;在电镀过程中,控制电镀液的温度为27~37℃,电流密度为9~22A/mm 2,生成的氧化铬层的重量为8~15g/m 2。优选地,电镀氧化铬时,电镀液中铬酸酐的浓度为65g/L,氟化铵的浓度为1.5g/L,氢氧化钠的浓度为9g/L;在电镀过程中,控制电镀液的温度为32℃,电流密度为19A/mm 2,生成的氧化铬层的重量≥10g/m 2In order to improve the compactness of the network structure of the chromium oxide layer, the present invention improves the electroplating chromium oxide process, as shown in Table 10. When electroplating chromium oxide, the concentration of chromic anhydride in the electroplating solution is 60-70g/L, the concentration of ammonium fluoride is 1-2g/L, and the concentration of sodium hydroxide is 6-12g/L; The temperature of the liquid is 27-37°C, the current density is 9-22A/mm 2 , and the weight of the formed chromium oxide layer is 8-15g/m 2 . Preferably, when electroplating chromium oxide, the concentration of chromic anhydride in the electroplating solution is 65g/L, the concentration of ammonium fluoride is 1.5g/L, and the concentration of sodium hydroxide is 9g/L; The temperature is 32°C, the current density is 19A/mm 2 , and the weight of the formed chromium oxide layer is ≥10g/m 2 .
表10本发明的电镀氧化铬工艺参数Table 10 Electroplating chromium oxide process parameters of the present invention
Figure PCTCN2021114194-appb-000008
Figure PCTCN2021114194-appb-000008
采用上述的电镀氧化铬工艺,得到的金属铬层和氧化铬层的一体表面形貌如图9所示。从图中可以看出,按照本发明的氧化铬电镀工艺,可以得到致密的网状氧化铬层,从而有利于提高镀铬板的耐腐蚀性能。Using the above-mentioned electroplating chromium oxide process, the integrated surface morphology of the obtained metal chromium layer and chromium oxide layer is shown in FIG. 9 . It can be seen from the figure that according to the chromium oxide electroplating process of the present invention, a dense reticular chromium oxide layer can be obtained, which is beneficial to improving the corrosion resistance of the chrome-plated plate.
综上,本发明提供了一种新的镀锡/镀铬基板的表面形貌Rs,具有这种表面形貌的基板在电镀过程中,镀层的分布更加均匀,使得其在制备缩颈罐/易开盖的过程中,缩颈处和预划膜处的镀层不易变形破裂,从而提高了缩颈罐/易开盖的耐蚀性。另外,本发明还对镀锡和镀铬工艺进行了改进,提高了镀层的致密性,从而也能够提高缩颈罐/易开盖的耐蚀性。In summary, the present invention provides a new surface topography Rs of tin-plated/chrome-plated substrates, the substrate with this surface topography has a more uniform coating distribution during the electroplating process, so that it can be used in the preparation of necking tanks/easy During the process of opening the cap, the coating at the neck and pre-scribing film is not easy to deform and crack, thus improving the corrosion resistance of the neck can/easy-open end. In addition, the present invention also improves the tin plating and chrome plating process, improves the compactness of the plating layer, and thus can also improve the corrosion resistance of the necked can/easy-open end.
以上所述实施例仅是为充分说明本发明而所举的较佳的实施例,本发明的保护范围不限于此。本技术领域的技术人员在本发明基础上所作的等同替代或变换,均在本发明的保护范围之内。本发明的保护范围以权利要求书为准。The above-mentioned embodiments are only preferred embodiments for fully illustrating the present invention, and the protection scope of the present invention is not limited thereto. Equivalent substitutions or transformations made by those skilled in the art on the basis of the present invention are all within the protection scope of the present invention. The protection scope of the present invention shall be determined by the claims.

Claims (20)

  1. 一种带砂光面的基板的制备方法,其特征在于,包括以下步骤:A method for preparing a substrate with a sanded surface, comprising the following steps:
    提供一平整机,所述平整机包括第一机架和第二机架,providing a screed machine comprising a first frame and a second frame,
    所述第一机架包括相对设置的第一工作辊和第三工作辊,所述第二机架包括相对设置的第二工作辊和第四工作辊,The first frame includes a first work roll and a third work roll oppositely arranged, and the second frame includes a second work roll and a fourth work roll oppositely arranged,
    所述第一工作辊和第二工作辊位于同一侧,该第一工作辊和第二工作辊用以与所述基板的第一表面接触并形成所述砂光面,其中:The first work roll and the second work roll are located on the same side, the first work roll and the second work roll are used to contact the first surface of the substrate and form the sanding surface, wherein:
    所述第一工作辊为电火花毛化轧辊,所述第二工作辊为磨削光辊;所述第一工作辊表面的粗糙度为1.6~2.2μm,所述第二工作辊表面的粗糙度为0.35~0.75μm;The first work roll is an electric spark textured roll, and the second work roll is a ground smooth roll; the roughness of the surface of the first work roll is 1.6-2.2 μm, and the roughness of the surface of the second work roll is The degree is 0.35~0.75μm;
    将待冷轧的基板送入所述平整机中,使所述基板依次于第一工作辊和第三工作辊之间、第二工作辊和第四工作辊之间通过,从而在所述基板的第一表面上形成所述砂光面。The base plate to be cold-rolled is sent into the tempering machine, and the base plate is sequentially passed between the first work roll and the third work roll, between the second work roll and the fourth work roll, so that the The sanded surface is formed on the first surface of the substrate.
  2. 根据权利要求1所述的一种带砂光面的基板的制备方法,其特征在于,所述第一机架的轧制力为3500~4500kN,所述第二机架的轧制力为3500~4000kN。The method for preparing a substrate with a sanded surface according to claim 1, wherein the rolling force of the first stand is 3500-4500 kN, and the rolling force of the second stand is 3500 kN ~4000kN.
  3. 根据权利要求1所述的一种带砂光面的基板的制备方法,其特征在于,所述第一工作辊和第二工作辊的换辊周期为120±20km,轧制吨位为150±30t。A method for preparing a substrate with a sanded surface according to claim 1, wherein the roll changing cycle of the first work roll and the second work roll is 120±20km, and the rolling tonnage is 150±30t .
  4. 根据权利要求1所述的一种带砂光面的基板的制备方法,其特征在于,当所述基板的第二表面为光亮面时,所述第三工作辊和第四工作辊均为磨削光辊,所述第一工作辊表面的粗糙度为1.8±0.2μm,所述第二工作辊表面的粗糙度为0.70±0.05μm,所述第三工作辊表面的粗糙度为0.70±0.05μm,所述第四工作辊表面的粗糙度为0.40±0.05μm,所述第一机架的轧制力为3500±100kN,所述第二机架的轧制力为3500±100kN;所述基板经过平整机冷轧后,在其第二表面上形成光亮面。The method for preparing a substrate with a sanded surface according to claim 1, wherein when the second surface of the substrate is a bright surface, the third work roll and the fourth work roll are both abrasive Paving rolls, the roughness of the surface of the first work roll is 1.8±0.2 μm, the roughness of the surface of the second work roll is 0.70±0.05 μm, and the roughness of the surface of the third work roll is 0.70±0.05 μm, the surface roughness of the fourth work roll is 0.40±0.05μm, the rolling force of the first stand is 3500±100kN, and the rolling force of the second stand is 3500±100kN; After the substrate is cold-rolled in a temper mill, a bright surface is formed on the second surface.
  5. 根据权利要求1所述的一种带砂光面的基板的制备方法,其特征在于,当所述基板的第二表面为细石纹面时,所述第三工作辊为电火花毛化轧辊,所述第四工作辊为磨削光辊,所述第一工作辊表面的粗糙度为2.0±0.2μm,所述第二工作辊表面的粗糙度为0.40±0.05μm,所述第三工作辊表面的粗糙度为1.2±0.2μm,所述第四工作辊表面的粗糙度为0.40±0.05μm, 所述第一机架的轧制力为4000±100kN,所述第二机架的轧制力为3500±100kN;所述基板经过平整机冷轧后,在其第二表面上形成细石纹面。The method for preparing a substrate with a sanded surface according to claim 1, wherein when the second surface of the substrate is a fine stone grain surface, the third work roll is an EDM texturing roll , the fourth work roll is a ground smooth roll, the roughness of the surface of the first work roll is 2.0±0.2 μm, the roughness of the surface of the second work roll is 0.40±0.05 μm, and the surface roughness of the third work roll The roughness of the roll surface is 1.2±0.2 μm, the roughness of the fourth working roll surface is 0.40±0.05 μm, the rolling force of the first stand is 4000±100kN, the rolling force of the second stand The braking force is 3500±100kN; after the substrate is cold-rolled in a temper mill, a fine stone surface is formed on the second surface.
  6. 根据权利要求1所述的一种带砂光面的基板的制备方法,其特征在于,当所述基板的第二表面为粗石纹面时,所述第三工作辊为电火花毛化轧辊,所述第四工作辊为磨削光辊,所述第一工作辊表面的粗糙度为2.0±0.2μm,所述第二工作辊表面的粗糙度为0.40±0.05μm,所述第三工作辊表面的粗糙度为1.5±0.2μm,所述第四工作辊表面的粗糙度为0.70±0.05μm,所述第一机架的轧制力为4500±100kN,所述第二机架的轧制力为4000±100kN;所述基板经过平整机冷轧后,在其第二表面上形成粗石纹面。The method for preparing a substrate with a sanded surface according to claim 1, wherein when the second surface of the substrate is a rough stone surface, the third work roll is an EDM texturing roll , the fourth work roll is a ground smooth roll, the roughness of the surface of the first work roll is 2.0±0.2 μm, the roughness of the surface of the second work roll is 0.40±0.05 μm, and the surface roughness of the third work roll The roughness of the roll surface is 1.5±0.2μm, the roughness of the fourth work roll surface is 0.70±0.05μm, the rolling force of the first stand is 4500±100kN, the rolling force of the second stand The braking force is 4000±100kN; after the substrate is cold-rolled in a temper mill, a rough stone surface is formed on the second surface.
  7. 一种使用权利要求1-6任意一项所述的制备方法制得的带砂光面的基板,其特征在于,所述基板一面为砂光面,另一面为非砂光面,所述砂光面包括呈点状凹凸的打底纹路和位于部分所述打底纹路上的丝状线条,所述打底纹路和所述丝状线条的分布使得所述砂光面的粗糙度为0.50~0.80μm。A substrate with a sanded surface prepared using the preparation method described in any one of claims 1-6, wherein one side of the substrate is a sanded surface, and the other side is a non-sanded surface, and the sanded surface The smooth surface includes dot-shaped concave-convex grounding lines and filamentary lines located on part of the grounding lines. The distribution of the grounding lines and the silky lines makes the roughness of the sanding surface 0.50- 0.80 μm.
  8. 根据权利要求7所述的带砂光面的基板,其特征在于,所述基板的材质为MR型、L型或D型原板钢。The substrate with a sanded surface according to claim 7, wherein the material of the substrate is MR type, L type or D type original plate steel.
  9. 根据权利要求7所述的带砂光面的基板,其特征在于,所述非砂光面为光面、细石纹面、粗石纹面、银色表面、粗银色表面或无光面。The substrate with a sanded surface according to claim 7, wherein the non-sanded surface is a smooth surface, a fine stone surface, a coarse stone surface, a silver surface, a rough silver surface or a matte surface.
  10. 一种镀锡板,其特征在于,所述镀锡板是在权利要求7所述的基板表面电镀金属锡和软熔后得到的。A tin plate, characterized in that the tin plate is obtained by electroplating metal tin on the surface of the substrate according to claim 7 and reflowing.
  11. 根据权利要求10所述的一种镀锡板,其特征在于,电镀金属锡时,电镀液中二价锡的浓度为20~25g/L,甲基磺酸的浓度为30~50mL/L,抗氧剂的浓度为35~60mL/L,添加剂的浓度为20~30mL/L;在电镀过程中,控制电镀液的温度为38~45℃,电流密度为22~28A/mm 2A tinplate according to claim 10, characterized in that, when electroplating metal tin, the concentration of divalent tin in the electroplating solution is 20-25g/L, and the concentration of methanesulfonic acid is 30-50mL/L, The concentration of the antioxidant is 35-60mL/L, and the concentration of the additive is 20-30mL/L; during the electroplating process, the temperature of the electroplating solution is controlled at 38-45°C, and the current density is 22-28A/mm 2 .
  12. 根据权利要求10所述的一种镀锡板,其特征在于,软熔时,软熔设定温度为260~290℃,软熔反馈温度为255~295℃,软熔功率占比为30%~50%。A tinplate according to claim 10, characterized in that, during reflow, the reflow setting temperature is 260-290°C, the reflow feedback temperature is 255-295°C, and the reflow power ratio is 30% ~50%.
  13. 根据权利要求10~12任意一项所述的一种镀锡板,其特征在于,所述基板的一面为砂光面,另一面为细石纹面。The tinplate according to any one of claims 10-12, characterized in that one side of the substrate is a sanded surface, and the other side is a fine stone surface.
  14. 一种镀铬板,其特征在于,所述镀铬板是在权利要求7所述的基板表面电镀金属铬和 氧化铬后得到的。A kind of chrome-plated plate, is characterized in that, described chrome-plated plate obtains after electroplating metal chromium and chromium oxide on the surface of the substrate according to claim 7.
  15. 根据权利要求14所述的一种镀铬板,其特征在于,电镀金属铬时,电镀液中铬酸酐的浓度为140~160g/L,氟化铵的浓度为3~4g/L;在电镀过程中,控制电镀液的温度为36~40℃,电流密度为50~80A/mm 2,第一回收槽内铬酸酐的浓度≤50g/L,第二回收槽内铬酸酐的浓度≤40g/L。 A chrome-plated sheet according to claim 14, characterized in that, when metal chromium is electroplated, the concentration of chromic anhydride in the electroplating solution is 140-160 g/L, and the concentration of ammonium fluoride is 3-4 g/L; In the process, the temperature of the electroplating solution is controlled at 36-40°C, the current density is 50-80A/mm 2 , the concentration of chromic anhydride in the first recovery tank is ≤50g/L, and the concentration of chromic anhydride in the second recovery tank is ≤40g/L .
  16. 根据权利要求14所述的一种镀铬板,其特征在于,电镀氧化铬时,电镀液中铬酸酐的浓度为60~70g/L,氟化铵的浓度为1~2g/L,氢氧化钠的浓度为8~10g/L;在电镀过程中,控制电镀液的温度为31~35℃,电流密度为9~22A/mm 2,生成的氧化铬层的重量为8~15g/m 2A chrome-plated sheet according to claim 14, characterized in that, when electroplating chromium oxide, the concentration of chromic anhydride in the electroplating solution is 60-70 g/L, the concentration of ammonium fluoride is 1-2 g/L, and the concentration of sodium hydroxide The concentration of the chromium oxide is 8-10g/L; during the electroplating process, the temperature of the electroplating solution is controlled at 31-35°C, the current density is 9-22A/mm 2 , and the weight of the formed chromium oxide layer is 8-15g/m 2 .
  17. 根据权利要求14~16任意一项所述的一种镀铬板,其特征在于,所述基板的一面为砂光面,另一面为细石纹面。A chrome-plated sheet according to any one of claims 14-16, characterized in that one side of the substrate is a sanded surface, and the other side is a fine stone textured surface.
  18. 一种缩颈罐,其特征在于,所述缩颈罐是由权利要求13所述的镀锡板制备而成的。A necking tank, characterized in that the necking tank is prepared from the tin plate according to claim 13.
  19. 一种缩颈罐,其特征在于,所述缩颈罐是由权利要求17所述的镀铬板制备而成的。A necking tank, characterized in that the necking tank is prepared from the chrome-plated plate according to claim 17.
  20. 一种易开盖,其特征在于,所述易开盖是由权利要求13所述的镀锡板制备而成的。An easy-open end, characterized in that the easy-open end is prepared from the tin-plated sheet according to claim 13.
PCT/CN2021/114194 2021-07-28 2021-08-24 Substrate having sanding surface and preparation method therefor, and tin-plated board/chrome-plated board WO2023004907A1 (en)

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