WO2022264196A1 - Cutting tool - Google Patents

Cutting tool Download PDF

Info

Publication number
WO2022264196A1
WO2022264196A1 PCT/JP2021/022457 JP2021022457W WO2022264196A1 WO 2022264196 A1 WO2022264196 A1 WO 2022264196A1 JP 2021022457 W JP2021022457 W JP 2021022457W WO 2022264196 A1 WO2022264196 A1 WO 2022264196A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
less
crystal grains
cutting tool
coating
Prior art date
Application number
PCT/JP2021/022457
Other languages
French (fr)
Japanese (ja)
Inventor
史佳 小林
アノンサック パサート
保樹 城戸
皓祐 冨永
Original Assignee
住友電工ハードメタル株式会社
住友電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電工ハードメタル株式会社, 住友電気工業株式会社 filed Critical 住友電工ハードメタル株式会社
Priority to PCT/JP2021/022457 priority Critical patent/WO2022264196A1/en
Publication of WO2022264196A1 publication Critical patent/WO2022264196A1/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23BTURNING; BORING
    • B23B27/00Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
    • B23B27/14Cutting tools of which the bits or tips or cutting inserts are of special material

Definitions

  • the present disclosure relates to cutting tools.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2016-30319 (Patent Document 1)).
  • a cutting tool of the present disclosure comprises a substrate and a coating disposed on the substrate,
  • the coating comprises a first layer, the first layer includes a plurality of grains;
  • the grains consist of Al x Ti 1-x C y N 1-y ,
  • the x is greater than 0.65 and less than 0.95,
  • the y is 0 or more and less than 0.1,
  • the average aspect ratio of the crystal grains is 3.0 or less,
  • the grains comprise grains having a cubic structure,
  • the area ratio occupied by the crystal grains having the cubic system structure is 90% or more,
  • the average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate and the coating,
  • the thickness of the first layer is 2 ⁇ m or more and 20 ⁇ m or less.
  • FIG. 1 is a perspective view illustrating one aspect of the cutting tool of the present disclosure
  • FIG. 2 is a sectional view taken along line II-II of FIG.
  • FIG. 3 is a schematic cross-sectional view illustrating one aspect of the cutting tool of the present disclosure.
  • FIG. 4 is a schematic cross-sectional view illustrating another aspect of the cutting tool of the present disclosure.
  • FIG. 5 is a schematic cross-sectional view further illustrating another aspect of the cutting tool of the present disclosure.
  • FIG. 6 is an example of an IPF map created in one aspect of the cutting tool of the present disclosure;
  • FIG. 7 is an example of a crystal phase map created in one aspect of the cutting tool of the present disclosure.
  • FIG. 8 is an example of a schematic cross-sectional view of a cutting tool of the present disclosure.
  • FIG. 9 is a schematic cross-sectional view of a CVD apparatus used to manufacture cutting tools of the present disclosure.
  • Patent Document 1 discloses a cutting tool in which a coating layer having a predetermined layer thickness includes an AlTiCN layer, and the AlTiCN layer is formed to have a columnar structure in the thickness direction.
  • a cutting tool of the present disclosure comprises a substrate and a coating disposed on the substrate,
  • the coating comprises a first layer, the first layer includes a plurality of grains;
  • the grains consist of Al x Ti 1-x C y N 1-y ,
  • the x is greater than 0.65 and less than 0.95,
  • the y is 0 or more and less than 0.1,
  • the average aspect ratio of the crystal grains is 3.0 or less,
  • the grains comprise grains having a cubic structure,
  • the area ratio occupied by crystal grains having a cubic system structure is 90% or more,
  • the average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate and the coating,
  • the thickness of the first layer is 2 ⁇ m or more and 20 ⁇ m or less.
  • the cutting tool of the present disclosure can have a long tool life, especially in high-speed cutting under wet conditions of alloy steel.
  • the crystal grains include first crystal grains,
  • the inclination angle of the ⁇ 111> direction of the first crystal grains with respect to the normal direction of the surface of the coating is 0° or more and 10° or less, and the first number ratio of the first crystal grains to the crystal grains is 15% or more, and the first number ratio is preferably measured in a cross section along the normal line of the interface between the substrate and the coating. This further improves the wear resistance of the cutting tool.
  • the compressive residual stress of the first layer is preferably 1.0 GPa or more and less than 4.5 GPa. This further improves the thermal crack resistance of the cutting tool.
  • the hardness of the first layer is preferably 30 GPa or more and 40 GPa or less. This further improves the wear resistance of the cutting tool.
  • a compound or the like when represented by a chemical formula, it shall include any conventionally known atomic ratio unless the atomic ratio is particularly limited, and should not necessarily be limited only to those within the stoichiometric range.
  • AlTiCN the ratio of the number of atoms constituting AlTiCN includes all conventionally known atomic ratios.
  • the cutting tool 1 is A cutting tool 1 comprising a substrate 10 and a coating 14 disposed on the substrate 10,
  • the coating 14 comprises a first layer 11,
  • the first layer 11 includes a plurality of crystal grains,
  • the grains consist of Al x Ti 1-x C y N 1-y ,
  • the x is greater than 0.65 and less than 0.95,
  • the y is 0 or more and less than 0.1,
  • the average aspect ratio of the crystal grains is 3.0 or less
  • the grains comprise grains having a cubic structure,
  • the area ratio occupied by the crystal grains having the cubic system structure is 90% or more,
  • the average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate 10 and the coating 14,
  • the thickness of the first layer 11 is 2 ⁇ m or more and 20 ⁇ m or less.
  • the cutting tool of the present disclosure can provide a cutting tool with a long tool life, especially in high-speed cutting of alloy steel under wet conditions. The reason is presumed as follows.
  • the area ratio of crystal grains having a cubic crystal structure is 90% or more, so the first layer has high hardness and the cutting tool has excellent wear resistance.
  • wear resistance means resistance to abrasion of the coating when used for cutting.
  • the average aspect ratio of the crystal grains is 3.0 or less, so that the grain boundaries of the crystal grains in the first layer are prevented from extending in the film thickness direction. can. Therefore, in the first layer, cracks in the film thickness direction can be suppressed from growing linearly, so the cutting tool of the present embodiment can be used for high-speed cutting of alloy steel under wet conditions can also have excellent thermal crack resistance at the rake face.
  • thermal crack resistance means resistance to cracking of the cutting edge during cutting in which the cutting edge becomes hot.
  • the cutting tool according to the present embodiment can have a long tool life by improving wear resistance and thermal crack resistance.
  • cutting tools examples include drills, end mills, indexable cutting inserts for drills, indexable cutting inserts for end mills, indexable cutting inserts for milling, indexable cutting inserts for turning, and metal saws. , gear cutting tools, reamers, taps, and the like.
  • FIG. 1 is a perspective view illustrating one aspect of the cutting tool 1 of the present disclosure.
  • FIG. 2 is a cross-sectional view taken along line II--II of FIG.
  • the cutting tool 1 having such a shape is used as an indexable cutting tip such as an indexable cutting tip for turning.
  • the cutting tool 1 includes a rake face 1a, a flank face 1b, and a cutting edge portion 1c connecting the rake face 1a and the flank face 1b.
  • the base material is a cemented carbide (for example, a tungsten carbide (WC)-based cemented carbide, a cemented carbide containing Co in addition to WC, a carbonitride such as Cr, Ti, Ta, Nb in addition to WC).
  • Cemented carbide etc. cermet (mainly composed of TiC, TiN, TiCN etc.), high speed steel, ceramics (TiC, SiC, SiN, AlN, Al 2 O 3 etc.), cubic type nitriding It preferably contains one selected from the group consisting of a boron sintered body (cBN sintered body) and a diamond sintered body.
  • cemented carbide especially WC-based cemented carbide
  • cermet especially TiCN-based cermet
  • the effect of the present embodiment is exhibited even if such a cemented carbide contains free carbon or an abnormal phase called ⁇ phase in the structure.
  • the base material used in this embodiment may have a modified surface.
  • a ⁇ -free layer may be formed on the surface, or in the case of a cBN sintered body, a surface-hardened layer may be formed. Even if the surface is modified in this way, The effect of this embodiment is shown.
  • the substrate may or may not have a chip breaker. included.
  • the shape of the cutting edge is sharp edge (the ridge where the rake face and flank face intersect), honing (sharp edge rounded), negative land (chamfered shape), and a combination of honing and negative land. includes any shape.
  • FIG. 3 is a schematic cross-sectional view illustrating one aspect of the cutting tool of the present disclosure.
  • FIG. 4 is a schematic cross-sectional view illustrating another aspect of the cutting tool of the present disclosure.
  • FIG. 5 is a schematic cross-sectional view further illustrating another aspect of the cutting tool of the present disclosure.
  • the coating 14 according to this embodiment includes a first layer 11 (FIGS. 3-5).
  • the “coating” has the effect of improving various properties such as peeling resistance, chipping resistance, and wear resistance of cutting tools by covering at least a portion of the base material (for example, a portion of the rake face). have.
  • the coating 14 preferably covers the entire surface of the substrate 10 . However, it would not be outside the scope of the present embodiment if a portion of the base material 10 were not covered with the coating 14 or the composition of the coating 14 was partially different.
  • the thickness of the coating is preferably 2 ⁇ m or more and 25 ⁇ m or less, more preferably 2 ⁇ m or more and 15 ⁇ m or less, and even more preferably 3 ⁇ m or more and 12 ⁇ m or less.
  • the thickness of the coating means the sum of the thicknesses of the layers constituting the coating. Examples of the "layer constituting the coating” include the first layer and other layers described later as layers other than the first layer.
  • the thickness of the coating is, for example, using a transmission electron microscope (TEM), measuring any 10 points in a cross-sectional sample parallel to the normal direction of the surface of the substrate, and the average of the thickness of the measured 10 points It can be obtained by taking the value.
  • TEM transmission electron microscope
  • Examples of the cross-sectional sample include a sample obtained by slicing the cross-section of the cutting tool with an ion slicer. The same is true when measuring the thickness of each of the first layer and the other layer.
  • Examples of transmission electron microscopes include JEM-2100F (trade name) manufactured by JEOL Ltd.
  • the coating includes a first layer.
  • a plurality of the first layers may be provided as long as the effects of the cutting tool are maintained.
  • the coating may further include an intermediate layer (another layer) provided between the two first layers.
  • the first layer includes a plurality of crystal grains.
  • the first layer may be composed only of the crystal grains, or may contain other components.
  • Other components include TiN, TiC, Al 2 O 3 , TiCN, TiCNO, TiBN, and the like.
  • the first layer covers the entire surface of the substrate. However, it would not depart from the scope of this embodiment if a portion of the first layer were not covered by the first layer.
  • crystal grain The crystal grains according to this embodiment consist of Al x Ti 1-x C y N 1-y .
  • the crystal grains are composed of Al x Ti 1-x CyN 1-y
  • the above x is more than 0.65 and less than 0.95. This allows the cutting tool to have excellent heat resistance. Moreover, the above x is preferably more than 0.7 and less than 0.95, more preferably more than 0.75 and less than 0.95, and even more preferably more than 0.80 and less than 0.90.
  • y is 0 or more and less than 0.1.
  • y is preferably 0 or more and less than 0.08, more preferably 0 or more and less than 0.06, and still more preferably 0 or more and less than 0.05.
  • the lower limit of y can be 0.01 or more and 0.02 or more.
  • the crystal grains are made of Al x Ti 1-x C y N 1-y , the x is more than 0.65 and less than 0.95, and the y is 0 or more and less than 0.1, It can be confirmed by using an EDX (Energy Dispersive X-ray spectroscopy) device attached to SEM or TEM. Specifically, first, a cutting tool is cut at an arbitrary position in the film thickness direction to prepare a sample including a cross section of the film. Next, for the first layer in the coating, 5 2 ⁇ m ⁇ 2 ⁇ m rectangular measurement fields are arbitrarily selected and analyzed.
  • the midpoint of the diagonal line of the rectangle passes through the midpoint in the thickness direction of the first layer (the midpoint in the thickness direction between S1 or S2, which will be described later, and S3, which will be described later), and A pair of two opposite sides of the rectangle are parallel to S3, which will be described later.
  • the composition of the crystal grains can be determined by specifying x and y indicating the atomic ratio of each element contained in an arbitrary measurement region and obtaining the average value of each of x and y. .
  • the average aspect ratio of the crystal grains is 3.0 or less. As a result, it is possible to suppress the grain boundaries of the crystal grains from extending in the film thickness direction in the first layer. Therefore, in the first layer, cracks in the film thickness direction can be prevented from linearly propagating, so that the cutting tool can have excellent thermal crack resistance.
  • the lower limit of the average aspect ratio is preferably 1.0 or more. In terms of manufacturing, the lower limit of the average aspect ratio can be 1.2 or more and 1.4 or more.
  • the upper limit of the average aspect ratio is preferably 2.5 or less, more preferably 2.0 or less, and even more preferably 1.8 or less.
  • the average aspect ratio is preferably 1.0 or more and 3.0 or less, more preferably 1.0 or more and 2.5 or less, and further preferably 1.0 or more and 2.0 or less. preferable.
  • the average aspect ratio of the grains is measured in a cross section along the normal to the interface between the substrate and the coating. Specific measurement methods are as follows (A1) to (A5).
  • the cutting tool sample is embedded in epoxy resin and then polished. Using a cross-section polisher (manufactured by JEOL), the polished cutting tool is cut under conditions of 6 kV and 6 hours, and then finished under conditions of 1.5 kV and 1 hour. The cut is made in a direction along the normal to the surface of the cutting tool. The normal to the surface of the cutting tool and the normal to the interface between the substrate and the coating are substantially parallel. Thus, the cutting provides a cross section along the normal to the interface between the substrate and the coating of the first layer.
  • the cutting described above can be performed at any part of the cutting tool, regardless of whether it is the rake face or the flank, as long as it is performed at a position 0.1 mm or more away from the cutting edge in a direction parallel to the cutting tool surface.
  • data collection is performed on the above cross section, at least from the surface S1 of the first layer or the interface S2 on the surface side of the first layer to the interface S3 on the substrate side. (the length including the entire thickness of the first layer) ⁇ 10 ⁇ m (the length in the direction parallel to the interface S3 of the substrate side of the first layer) (observation area).
  • CI Dilation method single interpolation
  • IPF map Inverse Pole Tigre map
  • a crystal grain boundary is defined as a case where the misorientation angle between adjacent measurement points is 15° or more.
  • the IPF map shows the shape of each grain and the orientation of each grain by color coding.
  • An example of the IPF map created for the cutting tool of this embodiment is shown in FIG.
  • the area shown in black in FIG. 6 indicates that CI ⁇ 0.1.
  • the areas shown in black in FIG. 6 mean areas where the shape of each crystal grain is not recognized by executing the cleanup process.
  • the left side of the paper is the surface side of the cutting tool, and the right side of the paper is the substrate side of the cutting tool.
  • (A4) As shown in the schematic cross-sectional view of FIG. 8, on the IPF map, first, the surface S1 of the first layer 11 or the interface S2 on the surface side of the first layer 11 and the substrate side and the interface S3 are set by a setting method to be described later. Next, a first imaginary line L1 passing through a point 0.3 ⁇ m away from S3 toward S1 or S2 and parallel to S3 is set. Next, the length including all from S1 or S2 to L1 (the length in the film thickness direction of the first layer 11) ⁇ 10 ⁇ m (the direction parallel to the interface S3 on the substrate 10 side of the first layer 11 length) measurement area.
  • the setting method of S1, S2, and S3 is as follows.
  • S1 When the surface of the first layer is a smooth surface, the smooth surface is set as S1. Further, when the surface of the first layer has an uneven shape, first, on the IPF map, it passes through at least one point on the surface of the first layer and is parallel to the interface between the coating and the substrate. and a virtual line VL1 (not shown) having the longest distance from the interface between the coating and the substrate, passing through at least one point on the surface of the first layer, and parallel to the interface between the coating and the substrate and a virtual line VL2 (not shown) having the shortest distance from the interface between the film and the base material.
  • a straight line whose distance from VL1 is equal to the distance from VL2 and which is parallel to the interface between the film and the substrate is set as the position of S1.
  • the smooth surface and the uneven shape are obtained by recognizing the smooth surface or the uneven shape on the SEM image of the same field of view as the IPF map, and then recognizing the smooth surface or the uneven shape. It can be recognized by superimposing the SEM image and the IPF map.
  • the SEM image is obtained by using the FE-SEM.
  • S2 A line analysis is performed in the thickness direction of the film with an arbitrary point on the surface of the film as a base point. The line analysis is performed by EDX (Energy Dispersive X-ray Spectroscopy) with SEM.
  • the beam diameter is 0.9 nm
  • the scanning interval is 0.1 ⁇ m
  • the acceleration voltage is 15 kV.
  • the ratio of the number of atoms of the metal element specific to the first layer for example, Ti element when the upper layer in contact with the first layer is Al 2 O 3
  • the first layer shows the maximum value. Identify points. Next, of the points indicating the half value of the maximum value, a point P1 (not shown) located on the surface side with the point indicating the maximum value as a base point and closest to the point indicating the maximum value is specified.
  • any other point on the surface of the coating is selected, and in the same way, the metal element peculiar to the first layer in the first layer (for example, the upper layer in contact with the first layer is an Al 2 O 3 layer In the case of Ti element), among the points that indicate the half value of the maximum value of the ratio of the number of atoms of Ti element), the point that is located on the surface side with the point that indicates the maximum value as the base point and is the closest point to the point that indicates the maximum value Identify P2 (not shown).
  • a straight line connecting P1 and P2 is set as the position of S2 on the IPF map.
  • S3 A line analysis is performed in the thickness direction of the coating with an arbitrary point on the coating surface as a base point.
  • the line analysis is performed by EDX (Energy Dispersive X-ray Spectroscopy) with SEM.
  • the beam diameter is 0.9 nm
  • the scanning interval is 0.1 ⁇ m
  • the acceleration voltage is 15 kV.
  • the point indicating the maximum value of the ratio of the number of atoms of the metal element peculiar to the first layer in the first layer identify.
  • a point P3 (not shown) located on the substrate side with the point indicating the maximum value as a base point and closest to the point indicating the maximum value is specified. .
  • any other point on the surface of the coating is selected, and in the same way, the metal element peculiar to the first layer in the first layer (for example, the lower layer in contact with the first layer is a TiN layer of the points showing the half-maximum value of the ratio of the number of atoms of Al element), the point P4 is located on the substrate side with the point showing the maximum value as a base point, and is closest to the point showing the maximum value. (not shown).
  • a straight line connecting P3 and P4 is set as the position of S3 on the IPF map.
  • the aspect ratio is measured for each of all the crystal grains contained in the above measurement area, and the average value thereof is calculated.
  • the aspect ratio is defined as a value obtained by dividing the maximum diameter a of a crystal grain by the minor diameter b of a crystal grain.
  • the average value of the aspect ratios corresponds to the "average aspect ratio of crystal grains”.
  • the crystal grains include crystal grains having a cubic system structure.
  • the area ratio of crystal grains having a cubic system structure is 90% or more. This allows the first layer to have high hardness and the cutting tool to have excellent wear resistance.
  • the lower limit of the area ratio is preferably 92% or more, more preferably 95% or more, and even more preferably 98% or more.
  • the upper limit of the area ratio is preferably 100% or less. Moreover, from the viewpoint of manufacturing, the upper limit of the area ratio can be 99.5% or less and 99% or less.
  • the area ratio is preferably 90% or more and 100% or less, more preferably 95% or more and 100% or less, and even more preferably 98% or more and 100% or less.
  • (B4) Calculate the percentage of the area of the cubic crystal grains to the area of the entire crystal system shown in the above measurement area. This percentage corresponds to "the area ratio occupied by crystal grains having a cubic system structure in the first layer".
  • the entire region where the crystal system is shown means “the region where the crystal system cannot be determined from the measurement region”.
  • the crystal grains include first crystal grains, the inclination angle of the ⁇ 111> direction of the first crystal grains with respect to the normal direction of the surface of the coating is 0° or more and 10° or less, and the crystal grains are ,
  • the first number ratio of the first crystal grains is preferably 15% or more.
  • the lower limit of the first number ratio is preferably 20% or more, more preferably 25% or more, and even more preferably 30% or more.
  • the upper limit of the first number ratio is preferably 70% or less, more preferably 60% or less, and even more preferably 50% or less. Further, the first number ratio is more preferably 15% or more and 70% or less, and even more preferably 20% or more and 50% or less.
  • the first number ratio is measured in a cross section along the normal line of the interface between the substrate and the coating. Specific measurement methods are as follows (C1) to (C2).
  • the compressive residual stress of the first layer is preferably 1.0 GPa or more and less than 4.5 GPa. As a result, the propagation of cracks generated during cutting can be suppressed, so that the thermal crack resistance of the cutting tool can be further improved.
  • the lower limit of the compressive residual stress is preferably 1.0 GPa or more, more preferably 2.0 GPa or more, and even more preferably 2.5 GPa or more.
  • the upper limit of the compressive residual stress is preferably less than 4.5 GPa.
  • the upper limit of the compressive residual stress can be less than 4.0 GPa and less than 3.5 GPa.
  • the compressive residual stress is more preferably 2.0 GPa or more and less than 4.5 GPa, and even more preferably 2.5 GPa or more and less than 4.5 GPa.
  • the compressive residual stress can be obtained by, for example, the 2 ⁇ -sin2 ⁇ method (lateral tilt method) using X-rays. Measurement conditions are as follows. For example, an average value of compressive residual stresses at arbitrary three or more points within 5 mm from the honing position of the rake face of the cutting tool toward the center position of the tool is obtained. (Measurement condition) X-ray output: 8.04keV X-ray source: Radiation measurement plane: (200) plane Detector: Flat panel Condensing size: 1.5 mm ⁇ 0.5 mm Scan axis: 2 ⁇ / ⁇ Scan mode: CONTINUOUS
  • the hardness of the first layer is preferably 30 GPa or more and 40 GPa or less. This can further improve the wear resistance of the cutting tool.
  • the lower limit of the hardness is preferably 30 GPa or more, more preferably 31 GPa or more, and even more preferably 32 GPa or more.
  • the upper limit of the hardness is preferably 40 GPa or less, more preferably 39 GPa or less, and even more preferably 38 GPa or less. Further, the hardness is more preferably 31 GPa or more and 40 GPa or less, and even more preferably 32 GPa or more and 39 GPa or less.
  • the hardness is measured by a method conforming to ISO14577, and the measurement load is 10 mN (1 g).
  • the thickness of the first layer according to this embodiment is 2 ⁇ m or more and 20 ⁇ m or less. This can improve the wear resistance of the cutting tool. Also, the lower limit of the thickness of the first layer is preferably 3 ⁇ m or more, more preferably 4 ⁇ m or more, and even more preferably 5 ⁇ m or more. The upper limit of the thickness of the first layer is preferably 12 ⁇ m or less, more preferably 10 ⁇ m or less, and even more preferably 8 ⁇ m or less. The thickness of the first layer is preferably 2 ⁇ m or more and 12 ⁇ m or less, more preferably 2 ⁇ m or more and 10 ⁇ m or less, and even more preferably 3 ⁇ m or more and 10 ⁇ m or less.
  • the coating may further include the other layers as long as the effects of the present embodiment are not impaired.
  • examples of the other layers include an underlying layer 12, a surface layer 13, and the like.
  • the underlayer 12 is arranged between the substrate 10 and the first layer 11 .
  • a TiN layer can be used as the underlying layer.
  • the average thickness of the underlayer is preferably 0.1 ⁇ m or more and 20 ⁇ m or less. According to this, the coating can have excellent wear resistance and chipping resistance. Further, the average thickness of the underlayer is more preferably 0.3 ⁇ m or more and 8 ⁇ m or less, and further preferably 0.5 ⁇ m or more and 5 ⁇ m or less.
  • the surface layer 13 preferably contains, for example, Ti (titanium) carbide, nitride, or boride as a main component.
  • the surface layer 13 is the layer located closest to the surface of the coating 14 . However, it may not be formed at the cutting edge.
  • the surface layer is arranged, for example, directly above the first layer.
  • Consists mainly of Ti carbide, nitride, or boride means containing 90% by mass or more of Ti carbide, nitride, or boride. Moreover, it means that it preferably consists of any one of carbide, nitride and boride of Ti except for inevitable impurities.
  • Ti carbides nitrides, and carbonitrides
  • the surface layer mainly from Ti nitrides (that is, compounds represented by TiN).
  • TiN has the clearest color (exhibits a gold color), so it has the advantage of facilitating identification of the corners of the cutting tip after use for cutting (identification of used portions).
  • the surface layer preferably consists of a TiN layer.
  • the surface layer preferably has an average thickness of 0.05 ⁇ m or more and 1 ⁇ m or less. According to this, the adhesion between the surface layer and the adjacent layer is improved.
  • the average thickness of the surface layer is more preferably 0.1 ⁇ m or more and 0.8 ⁇ m or less, and even more preferably 0.2 ⁇ m or more and 0.6 ⁇ m or less.
  • the method for manufacturing a cutting tool includes: A first step of preparing the base material (hereinafter sometimes simply referred to as "first step”); and a second step of forming the coating on the substrate using a chemical vapor deposition (CVD) method (hereinafter, sometimes simply referred to as the “second step”).
  • first step A first step of preparing the base material
  • second step a second step of forming the coating on the substrate using a chemical vapor deposition (CVD) method
  • CVD chemical vapor deposition
  • an aluminum halide gas, a titanium halide gas, an ammonia gas, and a hydrogen gas are jetted onto the substrate in an atmosphere of 650° C. or more and 900° C. or less and 0.1 kPa or more and 30 kPa or less.
  • the manufacturing method can further include a third step (hereinafter sometimes simply referred to as "third step") of subjecting the film obtained in the second step to a blasting treatment.
  • a substrate is prepared in the first step.
  • a cemented carbide substrate is prepared as the substrate.
  • the cemented carbide substrate may be a commercially available product or may be produced by a general powder metallurgy method.
  • a mixed powder is obtained by mixing WC powder and Co powder with a ball mill or the like. After drying the mixed powder, it is molded into a predetermined shape (eg, SEET13T3AGSN-G, etc.) to obtain a molded body. Further, by sintering the molded body, a WC—Co-based cemented carbide (sintered body) is obtained.
  • the sintered body is subjected to a predetermined cutting edge processing such as honing treatment to produce a base material made of a WC—Co based cemented carbide.
  • a predetermined cutting edge processing such as honing treatment to produce a base material made of a WC—Co based cemented carbide.
  • any substrate other than those described above can be prepared as long as it is a conventionally known substrate of this type.
  • ⁇ Second step step of forming a coating on the substrate>
  • a CVD method is used to form a coating including the first layer on the substrate.
  • an aluminum halide gas, a titanium halide gas, an ammonia gas hereinafter these gases are collectively referred to as "raw material gases"
  • a carrier gas are heated at 650° C. to 900° C.
  • a coating including the first layer is formed by jetting onto the substrate in an atmosphere of 1 kPa or more and 30 kPa or less. Thereby, the cutting tool of this embodiment is obtained.
  • This step can be performed using, for example, a CVD apparatus described below.
  • FIG. 9 shows a schematic cross-sectional view of an example of a CVD apparatus 50 used for manufacturing the cutting tool of this embodiment.
  • the CVD apparatus 50 includes a substrate setting jig 52 for setting the substrate 10, and a reaction vessel 53 made of heat-resistant alloy steel and containing the substrate setting jig 52. .
  • a temperature controller 54 for controlling the temperature inside the reaction vessel 53 is provided around the reaction vessel 53 .
  • the substrate 10 is preferably placed on projections provided on the substrate setting jig 52 .
  • a gas introduction pipe 55 extends vertically in the space inside the reaction container 53, and is provided rotatably about the vertical direction.
  • the gas introduction pipe 55 is provided with a plurality of through holes for ejecting gas to the tool substrate. In the present embodiment, it is preferable to keep a sufficient distance between the through-hole for ejecting the gas and the substrate 10 . By doing so, it is possible to prevent turbulence from occurring.
  • reaction container 53 is provided with a gas exhaust pipe 56 for discharging the internal gas to the outside. It is discharged outside the reaction container 53 .
  • the inside of the reaction vessel 53 has an atmosphere of 650° C. to 900° C. (preferably 700° C. to 770° C.) and 0.1 kPa to 30 kPa (preferably 0.2 kPa to 5.0 kPa). Since the gas introduction pipe 55 has a plurality of through-holes, the introduced gas is jetted into the reaction vessel 53 from different through-holes. At this time, the gas introduction pipe 55 is rotating at a rotational speed of 2 to 4 rpm, for example, about the above-mentioned axis as indicated by the rotation arrow inside. This makes it possible to jet evenly onto the substrate.
  • Halide gases of aluminum include, for example, aluminum chloride gas (AlCl 3 gas, Al 2 Cl 6 gas). Preferably AlCl 3 gas is used.
  • the concentration (% by volume) of the halide gas of aluminum is 0.1% by volume or more based on the total volume of all gases introduced into the reaction vessel (hereinafter also referred to as "total volume of introduced gas")1 It is preferably 0.0% by volume or less, more preferably 0.2% by volume or more and 0.8% by volume or less.
  • Titanium halide gases include, for example, titanium (IV) chloride gas ( TiCl4 gas), titanium chloride ( III ) gas (TiCl3 gas), and the like. Titanium (IV) chloride gas is preferably used.
  • the concentration (% by volume) of the titanium halide gas is preferably 0.05% by volume or more and 0.3% by volume or less, based on the total volume of the introduced gas, and 0.1% by volume or more and 0.2% by volume. % or less.
  • the concentration (% by volume) of ammonia gas is preferably 0.2% by volume or more and 3.0% by volume or less, and 0.5% by volume or more and 2.0% by volume or less, based on the total volume of the introduced gas. It is more preferable to have
  • Ethylene gas (C 2 H 4 ) can be used in addition to the raw material gas.
  • the concentration (% by volume) of ethylene gas is preferably 0% by volume or more and 0.3% by volume or less based on the total volume of the introduced gas.
  • carrier gases examples include argon gas and hydrogen gas. Hydrogen gas is preferably used.
  • the gas concentration (% by volume) of the carrier gas is preferably 90% by volume or more and 99% by volume or less, more preferably 95% or more and 99% or less, based on the total volume of the introduced gas.
  • the total flow rate of the introduced gas is changed by changing the flow rate of the carrier gas under the following conditions.
  • the average aspect ratio of the crystal grains can be made 3.0 or less. The reason for this is presumed to be as follows.
  • the flow rate of the entire introduced gas is changed by changing the flow rate of the carrier gas during film formation.
  • the raw material gas is less likely to be adsorbed on specific crystal planes, making it difficult for crystal grains to grow in a columnar shape, presumably reducing the aspect ratio of crystal grains.
  • the present inventors have newly discovered that the average aspect ratio of crystal grains can be made 3.0 or less by changing the total gas flow rate of the introduced gas.
  • the total gas flow rate introduced into the reaction vessel can be, for example, as follows.
  • total gas flow rate refers to the total volumetric flow rate of the gas introduced into the CVD furnace per unit time, assuming that the gas under standard conditions (0° C., 1 atm) is an ideal gas.
  • Flow rate (average) 100 L/min
  • Flow rate (range of change) 80 to 120 L/min Period: 5 to 15 minutes (Over 15 minutes, the aspect ratio tends to increase.)
  • the flow rate of the carrier gas in the introduced gas can be, for example, as follows. Flow rate (average): 98% by volume Flow rate (range of change): 97 to 99% by volume Cycle: 5-15 minutes
  • the second step can include a step of forming other layers such as a base layer and a surface layer in addition to the step of forming the first layer.
  • Other layers can be formed by conventional methods.
  • ⁇ Third step step of blasting>
  • the coating is subjected to blasting.
  • the blasting conditions include the following conditions.
  • a desired compressive residual stress can be imparted to the coating by performing blasting. (Conditions for blasting)
  • Media Alumina particles, 500g
  • Rotation speed 60rpm
  • ⁇ Other processes> In the manufacturing method according to the present embodiment, in addition to the steps described above, a surface treatment step and the like may be performed as appropriate.
  • ⁇ Manufacturing cutting tools Sample no. 1 to 18, the composition consists of 2.0 wt% TaC, 1.0 wt% NbC, 10.0 wt% Co and the balance WC (including inevitable impurities), and , a cemented carbide cutting tip (manufactured by Sumitomo Electric Hardmetal Co., Ltd.) having a shape of SEET13T3AGSN-G was prepared as a base material (first step).
  • a film was formed on the surface of the base material (second step). Specifically, using the CVD method, the conditions for forming the underlayer described in Table 1, the conditions for forming the first layer described in Table 2, and the surface described in Table 3 were applied to the entire surface of the base material. The second step was performed according to the layer formation conditions.
  • sample No. 1 having the configuration shown in Tables 5 and 6 was obtained. 1-18 cutting tools were made.
  • 1 cutting tool 1a rake face, 1b flank face, 1c cutting edge portion, 10 base material, 11 first layer, 12 base layer, 13 surface layer, 14 coating, 50 CVD device, 52 base material setting jig, 53 reaction Container, 54 temperature control device, 55 gas introduction pipe, 56 gas exhaust pipe, 57 gas exhaust port, S1 first layer surface, S2 first layer surface side interface, S3 substrate side interface, L1 second 1 virtual line

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

A cutting tool provided with a substrate and a coating provided on the substrate, wherein: the coating includes a first layer; the first layer contains multiple crystal grains; the crystal grains comprise AlxTi1-xCyN1-y, where x is greater than 0.65 and less than 0.95, y is 0 or more and less than 0.1; the average aspect ratio of the crystal grains is 3.0 or less; the crystal grains include crystal grains having a cubic crystal structure; in the first layer, the surface area ratio of the crystal grains having a cubic crystal structure is 90% or higher; the average aspect ratio and the surface area ratio are measured at a cross section along the normal line from the interface between the substrate and the coating; and the thickness of the first layer is 2-20 μm.

Description

切削工具Cutting tools
 本開示は、切削工具に関する。 The present disclosure relates to cutting tools.
 従来から、基材上に被膜を形成した切削工具が、鋼及び鋳物等の切削加工に用いられている(特開2016-30319号公報(特許文献1))。 Conventionally, cutting tools in which a film is formed on a base material have been used for cutting steel, castings, and the like (Japanese Patent Application Laid-Open No. 2016-30319 (Patent Document 1)).
特開2016-30319号公報JP 2016-30319 A
 本開示の切削工具は、基材と、該基材上に配置された被膜と、を備える切削工具であって、
 該被膜は、第1の層を含み、
 該第1の層は、複数の結晶粒を含み、
 該結晶粒は、AlTi1-x1-yからなり、
 該xは、0.65超0.95未満であり、
 該yは、0以上0.1未満であり、
 該結晶粒の平均アスペクト比は、3.0以下であり、
 該結晶粒は、立方晶系構造を有する結晶粒を含み、
 該第1の層において、該立方晶系構造を有する結晶粒が占める面積比率は、90%以上であり、
 該平均アスペクト比および該面積比率は、該基材と該被膜との界面の法線に沿った断面で測定され、
 該第1の層の厚みは、2μm以上20μm以下である。
A cutting tool of the present disclosure comprises a substrate and a coating disposed on the substrate,
The coating comprises a first layer,
the first layer includes a plurality of grains;
The grains consist of Al x Ti 1-x C y N 1-y ,
The x is greater than 0.65 and less than 0.95,
The y is 0 or more and less than 0.1,
The average aspect ratio of the crystal grains is 3.0 or less,
The grains comprise grains having a cubic structure,
In the first layer, the area ratio occupied by the crystal grains having the cubic system structure is 90% or more,
The average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate and the coating,
The thickness of the first layer is 2 μm or more and 20 μm or less.
図1は、本開示の切削工具の一態様を例示する斜視図である。1 is a perspective view illustrating one aspect of the cutting tool of the present disclosure; FIG. 図2は、図1のII-II線断面図である。FIG. 2 is a sectional view taken along line II-II of FIG. 図3は、本開示の切削工具の一態様を例示する模式断面図である。FIG. 3 is a schematic cross-sectional view illustrating one aspect of the cutting tool of the present disclosure. 図4は、本開示の切削工具の他の態様を例示する模式断面図である。FIG. 4 is a schematic cross-sectional view illustrating another aspect of the cutting tool of the present disclosure. 図5は、本開示の切削工具の他の態様を更に例示する模式断面図である。FIG. 5 is a schematic cross-sectional view further illustrating another aspect of the cutting tool of the present disclosure. 図6は、本開示の切削工具の一態様において作成されたIPFマップの一例である。FIG. 6 is an example of an IPF map created in one aspect of the cutting tool of the present disclosure; 図7は、本開示の切削工具の一態様において作成された結晶相マップの一例である。FIG. 7 is an example of a crystal phase map created in one aspect of the cutting tool of the present disclosure. 図8は、本開示の切削工具の模式断面図の一例である。FIG. 8 is an example of a schematic cross-sectional view of a cutting tool of the present disclosure. 図9は、本開示の切削工具の製造に用いられるCVD装置の模式的な断面図である。FIG. 9 is a schematic cross-sectional view of a CVD apparatus used to manufacture cutting tools of the present disclosure.
 [本開示が解決しようとする課題]
 従来から、加工熱による被削材の塑性変形を防ぐ目的で、切削油を用いた湿式条件下での切削加工が実行されている。また、近年、加工時間の短縮を目的として、切削速度の高速化が求められている。湿式条件下での切削加工を高速で実行すると、切削加工により生じる加工熱に起因して、切削工具の被膜において亀裂(熱亀裂)が発生し易い傾向にあるため、切削工具の工具寿命が短くなる場合がある。例えば、合金鋼の被削材に対して、湿式条件下での切削加工を高速で実行すると、切削工具のすくい面において、熱亀裂と切り屑の擦過に起因する摩耗とが複合した損傷が発生し易いため、切削工具の工具寿命が短縮される傾向にある。
[Problems to be Solved by the Present Disclosure]
Conventionally, cutting is performed under wet conditions using cutting oil for the purpose of preventing plastic deformation of a work material due to processing heat. Also, in recent years, there has been a demand for a higher cutting speed for the purpose of shortening the machining time. When cutting is performed at high speed under wet conditions, cracks (thermal cracks) tend to occur in the coating of the cutting tool due to the processing heat generated by the cutting process, so the tool life of the cutting tool is shortened. may become. For example, when cutting an alloy steel work material at high speed under wet conditions, the rake face of the cutting tool experiences a combination of thermal cracking and abrasion caused by chip abrasion. This tends to shorten the tool life of cutting tools.
 特許文献1は、所定の層厚を有する被覆層がAlTiCN層を含み、且つ、当該AlTiCN層が膜厚方向に柱状構造をなして形成された切削工具を開示する。このような構成を有することにより、切削工具の耐摩耗性が向上することが期待される。しかしながら、近年の切削速度の高速化に伴い、湿式条件下での高速切削においても、切削工具の工具寿命を更に長くすることが求められている。 Patent Document 1 discloses a cutting tool in which a coating layer having a predetermined layer thickness includes an AlTiCN layer, and the AlTiCN layer is formed to have a columnar structure in the thickness direction. By having such a configuration, it is expected that the wear resistance of the cutting tool is improved. However, with the recent increase in cutting speed, it is required to further extend the tool life of cutting tools even in high-speed cutting under wet conditions.
 [本開示の効果]
 本開示によれば、特に合金鋼の湿式条件下での高速切削においても、長い工具寿命を有する切削工具を提供することが可能である。
[Effect of the present disclosure]
According to the present disclosure, it is possible to provide cutting tools with long tool life, especially in high speed cutting under wet conditions of alloy steels.
 [本開示の実施形態の説明]
 最初に本開示の実施態様を列記して説明する。
 (1)本開示の切削工具は、基材と、該基材上に配置された被膜と、を備える切削工具であって、
 該被膜は、第1の層を含み、
 該第1の層は、複数の結晶粒を含み、
 該結晶粒は、AlTi1-x1-yからなり、
 該xは、0.65超0.95未満であり、
 該yは、0以上0.1未満であり、
 該結晶粒の平均アスペクト比は、3.0以下であり、
 該結晶粒は、立方晶系構造を有する結晶粒を含み、
 該第1の層において、立方晶系構造を有する結晶粒が占める面積比率は、90%以上であり、
 該平均アスペクト比および該面積比率は、該基材と該被膜との界面の法線に沿った断面で測定され、
 該第1の層の厚みは、2μm以上20μm以下である。
[Description of Embodiments of the Present Disclosure]
First, the embodiments of the present disclosure are listed and described.
(1) A cutting tool of the present disclosure comprises a substrate and a coating disposed on the substrate,
The coating comprises a first layer,
the first layer includes a plurality of grains;
The grains consist of Al x Ti 1-x C y N 1-y ,
The x is greater than 0.65 and less than 0.95,
The y is 0 or more and less than 0.1,
The average aspect ratio of the crystal grains is 3.0 or less,
The grains comprise grains having a cubic structure,
In the first layer, the area ratio occupied by crystal grains having a cubic system structure is 90% or more,
The average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate and the coating,
The thickness of the first layer is 2 μm or more and 20 μm or less.
 本開示の切削工具は、特に合金鋼の湿式条件下での高速切削においても、長い工具寿命を有することができる。 The cutting tool of the present disclosure can have a long tool life, especially in high-speed cutting under wet conditions of alloy steel.
 (2)該結晶粒は、第1結晶粒を含み、
 該被膜の表面の法線方向に対する該第1結晶粒の<111>方向の傾斜角は、0°以上10°以下であり、該結晶粒に対し、該第1結晶粒が占める第1個数比率は、15%以上であり、該第1個数比率は、該基材と該被膜との界面の法線に沿った断面で測定されることが好ましい。これによって、切削工具の耐摩耗性が更に向上する。
(2) the crystal grains include first crystal grains,
The inclination angle of the <111> direction of the first crystal grains with respect to the normal direction of the surface of the coating is 0° or more and 10° or less, and the first number ratio of the first crystal grains to the crystal grains is 15% or more, and the first number ratio is preferably measured in a cross section along the normal line of the interface between the substrate and the coating. This further improves the wear resistance of the cutting tool.
 (3)該第1の層の圧縮残留応力は、1.0GPa以上4.5GPa未満であることが好ましい。これによって、切削工具の耐熱亀裂性が更に向上する。 (3) The compressive residual stress of the first layer is preferably 1.0 GPa or more and less than 4.5 GPa. This further improves the thermal crack resistance of the cutting tool.
 (4)該第1の層の硬度は、30GPa以上40GPa以下であることが好ましい。これによって、切削工具の耐摩耗性が更に向上する。 (4) The hardness of the first layer is preferably 30 GPa or more and 40 GPa or less. This further improves the wear resistance of the cutting tool.
 [本開示の実施形態の詳細]
 本開示の一実施形態(以下、「本実施形態」とも記す。)の切削工具の具体例を、以下に図面を参照しつつ説明する。本開示の図面において、同一の参照符号は、同一部分または相当部分を表すものである。また、長さ、幅、厚さ、深さなどの寸法関係は図面の明瞭化と簡略化のために適宜変更されており、必ずしも実際の寸法関係を表すものではない。
[Details of the embodiment of the present disclosure]
A specific example of a cutting tool according to one embodiment of the present disclosure (hereinafter also referred to as "this embodiment") will be described below with reference to the drawings. In the drawings of this disclosure, the same reference numerals represent the same or equivalent parts. Also, dimensional relationships such as length, width, thickness, and depth are appropriately changed for clarity and simplification of the drawings, and do not necessarily represent actual dimensional relationships.
 本明細書において「A~B」という形式の表記は、範囲の上限下限(すなわちA以上B以下)を意味し、Aにおいて単位の記載がなく、Bにおいてのみ単位が記載されている場合、Aの単位とBの単位とは同じである。 In this specification, the notation of the form "A to B" means the upper and lower limits of the range (that is, from A to B). and the unit of B are the same.
 本明細書において化合物などを化学式で表す場合、原子比を特に限定しないときは従来公知のあらゆる原子比を含むものとし、必ずしも化学量論的範囲のもののみに限定されるべきではない。たとえば「AlTiCN」と記載されている場合、AlTiCNを構成する原子数の比には、従来公知のあらゆる原子比が含まれる。 In the present specification, when a compound or the like is represented by a chemical formula, it shall include any conventionally known atomic ratio unless the atomic ratio is particularly limited, and should not necessarily be limited only to those within the stoichiometric range. For example, when "AlTiCN" is described, the ratio of the number of atoms constituting AlTiCN includes all conventionally known atomic ratios.
 本明細書中の結晶学的記載においては、個別面を()、集合方位を<>でそれぞれ示している。 In the crystallographic descriptions in this specification, individual planes are indicated by (), and aggregate orientations are indicated by <>.
 [実施形態1:切削工具]
 図3に示される様に、本実施形態に係る切削工具1は、
 基材10と、該基材10上に配置された被膜14と、を備える切削工具1であって、
 該被膜14は、第1の層11を含み、
 該第1の層11は、複数の結晶粒を含み、
 該結晶粒は、AlTi1-x1-yからなり、
 該xは、0.65超0.95未満であり、
 該yは、0以上0.1未満であり、
 該結晶粒の平均アスペクト比は、3.0以下であり、
 該結晶粒は、立方晶系構造を有する結晶粒を含み、
 該第1の層11において、該立方晶系構造を有する結晶粒が占める面積比率は、90%以上であり、
 該平均アスペクト比および該面積比率は、該基材10と該被膜14との界面の法線に沿った断面で測定され、
 該第1の層11の厚みは、2μm以上20μm以下である。
[Embodiment 1: Cutting tool]
As shown in FIG. 3, the cutting tool 1 according to this embodiment is
A cutting tool 1 comprising a substrate 10 and a coating 14 disposed on the substrate 10,
The coating 14 comprises a first layer 11,
The first layer 11 includes a plurality of crystal grains,
The grains consist of Al x Ti 1-x C y N 1-y ,
The x is greater than 0.65 and less than 0.95,
The y is 0 or more and less than 0.1,
The average aspect ratio of the crystal grains is 3.0 or less,
The grains comprise grains having a cubic structure,
In the first layer 11, the area ratio occupied by the crystal grains having the cubic system structure is 90% or more,
The average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate 10 and the coating 14,
The thickness of the first layer 11 is 2 μm or more and 20 μm or less.
 本開示の切削工具は、特に合金鋼の湿式条件下での高速切削においても、長い工具寿命を有する切削工具を提供することが可能である。その理由は、以下の通りと推察される。 The cutting tool of the present disclosure can provide a cutting tool with a long tool life, especially in high-speed cutting of alloy steel under wet conditions. The reason is presumed as follows.
 (a)上記第1の層において、立方晶構造を有する結晶粒が占める面積比率は、90%以上であるため、第1の層は高い硬度を有し、切削工具は優れた耐摩耗性を有することができる。なお、ここで、「耐摩耗性」とは、切削加工に用いた場合被膜が摩耗することに対する耐性を意味する。 (a) In the first layer, the area ratio of crystal grains having a cubic crystal structure is 90% or more, so the first layer has high hardness and the cutting tool has excellent wear resistance. can have Here, "wear resistance" means resistance to abrasion of the coating when used for cutting.
 (b)上記(a)の通り、AlTi1-x1-yからなる結晶粒のうち、立方晶系構造を有する結晶粒の割合が90%以上である場合、このような切削工具は、耐摩耗性に優れる。しかしながら、そのような場合、結晶粒が膜厚方向に柱状構造をなして形成されやすい。このため、このような切削工具では、上記結晶粒の粒界が膜厚方向に延伸するため、該切削工具を合金鋼の湿式条件下での高速切削に用いた場合、膜厚方向に対する亀裂に弱く、すくい面での熱亀裂が生じやすい傾向にある。その為、切削加工により発生する加工熱に起因して、切削工具における被膜の熱亀裂を生じやすくなるため、このような結晶粒を被膜に含む切削工具は、耐熱亀裂性に劣る場合がある。 (b) As in (a) above, when the proportion of crystal grains having a cubic system structure among the crystal grains made of Al x Ti 1-x C y N 1-y is 90% or more, such Cutting tools have excellent wear resistance. However, in such a case, crystal grains are likely to form a columnar structure in the film thickness direction. Therefore, in such a cutting tool, the grain boundaries of the crystal grains extend in the film thickness direction. It is weak and prone to thermal cracking on the rake face. Therefore, thermal cracking of the coating of the cutting tool is likely to occur due to processing heat generated by cutting, and therefore, the cutting tool containing such crystal grains in the coating may be inferior in thermal crack resistance.
 しかし、本実施形態の切削工具では上記結晶粒の平均アスペクト比は、3.0以下であることによって、上記第1の層において、上記結晶粒の粒界が膜厚方向に延伸することを抑制できる。そのため、上記第1の層において、膜厚方向の亀裂が直線的に進展することを抑制できることから、本実施形態の切削工具は、合金鋼の湿式条件下での高速切削加工に用いた場合においても、すくい面における優れた耐熱亀裂性を有することができる。なお、ここで、「耐熱亀裂性」とは、刃先部が高温になる切削加工における刃先部の亀裂発生に対する耐性を意味する。 However, in the cutting tool of the present embodiment, the average aspect ratio of the crystal grains is 3.0 or less, so that the grain boundaries of the crystal grains in the first layer are prevented from extending in the film thickness direction. can. Therefore, in the first layer, cracks in the film thickness direction can be suppressed from growing linearly, so the cutting tool of the present embodiment can be used for high-speed cutting of alloy steel under wet conditions can also have excellent thermal crack resistance at the rake face. Here, the term "thermal crack resistance" means resistance to cracking of the cutting edge during cutting in which the cutting edge becomes hot.
 すなわち、本実施形態に係る切削工具は、耐摩耗性とともに、耐熱亀裂性を向上させることにより、長い工具寿命を有することができる。 That is, the cutting tool according to the present embodiment can have a long tool life by improving wear resistance and thermal crack resistance.
 本実施形態に係る切削工具は、例えば、ドリル、エンドミル、ドリル用刃先交換型切削チップ、エンドミル用刃先交換型切削チップ、フライス加工用刃先交換型切削チップ、旋削加工用刃先交換型切削チップ、メタルソー、歯切工具、リーマ、タップ等であり得る。 Examples of cutting tools according to the present embodiment include drills, end mills, indexable cutting inserts for drills, indexable cutting inserts for end mills, indexable cutting inserts for milling, indexable cutting inserts for turning, and metal saws. , gear cutting tools, reamers, taps, and the like.
 図1は、本開示の切削工具1の一態様を例示する斜視図である。図2は図1のII-II線断面図である。このような形状の切削工具1は、旋削加工用刃先交換型切削チップ等の刃先交換型切削チップとして用いられる。上記切削工具1は、すくい面1aと、逃げ面1bと、すくい面1aと逃げ面1bとを繋ぐ刃先部1cとを含む。 FIG. 1 is a perspective view illustrating one aspect of the cutting tool 1 of the present disclosure. FIG. 2 is a cross-sectional view taken along line II--II of FIG. The cutting tool 1 having such a shape is used as an indexable cutting tip such as an indexable cutting tip for turning. The cutting tool 1 includes a rake face 1a, a flank face 1b, and a cutting edge portion 1c connecting the rake face 1a and the flank face 1b.
 <基材>
 本実施形態の基材は、この種の基材として従来公知のものであればいずれのものも使用することができる。例えば、上記基材は、超硬合金(例えば、炭化タングステン(WC)基超硬合金、WCの他にCoを含む超硬合金、WCの他にCr、Ti、Ta、Nb等の炭窒化物を添加した超硬合金等)、サーメット(TiC、TiN、TiCN等を主成分とするもの)、高速度鋼、セラミックス(TiC、SiC、SiN、AlN、Al等)、立方晶型窒化硼素焼結体(cBN焼結体)及びダイヤモンド焼結体からなる群から選ばれる1種を含むことが好ましい。
<Base material>
Any conventionally known base material of this type can be used as the base material of the present embodiment. For example, the base material is a cemented carbide (for example, a tungsten carbide (WC)-based cemented carbide, a cemented carbide containing Co in addition to WC, a carbonitride such as Cr, Ti, Ta, Nb in addition to WC). Cemented carbide etc.), cermet (mainly composed of TiC, TiN, TiCN etc.), high speed steel, ceramics (TiC, SiC, SiN, AlN, Al 2 O 3 etc.), cubic type nitriding It preferably contains one selected from the group consisting of a boron sintered body (cBN sintered body) and a diamond sintered body.
 これらの各種基材の中でも、特に超硬合金(特にWC基超硬合金)、サーメット(特にTiCN基サーメット)を選択することが好ましい。その理由は、これらの基材が特に高温における硬度と強度とのバランスに優れ、上記用途の切削工具の基材として優れた特性を有するためである。 Among these various base materials, it is particularly preferable to select cemented carbide (especially WC-based cemented carbide) and cermet (especially TiCN-based cermet). The reason for this is that these base materials have an excellent balance of hardness and strength, particularly at high temperatures, and have excellent properties as base materials for cutting tools for the above applications.
 基材として超硬合金を使用する場合、そのような超硬合金は、組織中に遊離炭素又はη相と呼ばれる異常相を含んでいても本実施形態の効果は示される。なお、本実施形態で用いる基材は、その表面が改質されたものであっても差し支えない。例えば、超硬合金の場合はその表面に脱β層が形成されていたり、cBN焼結体の場合には表面硬化層が形成されていてもよく、このように表面が改質されていても本実施形態の効果は示される。 When a cemented carbide is used as the base material, the effect of the present embodiment is exhibited even if such a cemented carbide contains free carbon or an abnormal phase called η phase in the structure. In addition, the base material used in this embodiment may have a modified surface. For example, in the case of cemented carbide, a β-free layer may be formed on the surface, or in the case of a cBN sintered body, a surface-hardened layer may be formed. Even if the surface is modified in this way, The effect of this embodiment is shown.
 上記切削工具が、刃先交換型切削チップ(旋削加工用刃先交換型切削チップ、フライス加工用刃先交換型切削チップ等)である場合、基材は、チップブレーカーを有するものも、有さないものも含まれる。刃先部の形状は、シャープエッジ(すくい面と逃げ面とが交差する稜)、ホーニング(シャープエッジに対してアールを付与した形状)、ネガランド(面取りをした形状)、ホーニングとネガランドを組み合わせた形状の中で、いずれの形状も含まれる。 When the cutting tool is an indexable cutting insert (an indexable cutting insert for turning, an indexable cutting insert for milling, etc.), the substrate may or may not have a chip breaker. included. The shape of the cutting edge is sharp edge (the ridge where the rake face and flank face intersect), honing (sharp edge rounded), negative land (chamfered shape), and a combination of honing and negative land. includes any shape.
 <被膜>
 図3は、本開示の切削工具の一態様を例示する模式断面図である。図4は、本開示の切削工具の他の態様を例示する模式断面図である。図5は、本開示の切削工具の他の態様を更に例示する模式断面図である。本実施形態に係る被膜14は、第1の層11を含む(図3~図5)。「被膜」は、上記基材の少なくとも一部(例えば、すくい面の一部)を被覆することで、切削工具における耐剥離性、耐欠損性、耐摩耗性等の諸特性を向上させる作用を有するものである。上記被膜14は、上記基材10の全面を被覆することが好ましい。しかしながら、上記基材10の一部が上記被膜14で被覆されていなかったり被膜14の構成が部分的に異なっていたりしていたとしても本実施形態の範囲を逸脱するものではない。
<Coating>
FIG. 3 is a schematic cross-sectional view illustrating one aspect of the cutting tool of the present disclosure. FIG. 4 is a schematic cross-sectional view illustrating another aspect of the cutting tool of the present disclosure. FIG. 5 is a schematic cross-sectional view further illustrating another aspect of the cutting tool of the present disclosure. The coating 14 according to this embodiment includes a first layer 11 (FIGS. 3-5). The “coating” has the effect of improving various properties such as peeling resistance, chipping resistance, and wear resistance of cutting tools by covering at least a portion of the base material (for example, a portion of the rake face). have. The coating 14 preferably covers the entire surface of the substrate 10 . However, it would not be outside the scope of the present embodiment if a portion of the base material 10 were not covered with the coating 14 or the composition of the coating 14 was partially different.
 上記被膜の厚みは、2μm以上25μm以下であることが好ましく、2μm以上15μm以下であることがより好ましく、3μm以上12μm以下であることが更に好ましい。ここで、被膜の厚みとは、被膜を構成する層それぞれの厚みの総和を意味する。「被膜を構成する層」としては、例えば、上記第1の層と、上記第1の層以外の層として後述する他の層とが挙げられる。上記被膜の厚みは、例えば、透過型電子顕微鏡(TEM)を用いて、基材の表面の法線方向に平行な断面サンプルにおける任意の10点を測定し、測定された10点の厚みの平均値をとることで求めることが可能である。上記断面サンプルとしては、例えば、イオンスライサ装置で上記切削工具の断面を薄片化したサンプルが挙げられる。上記第1の層、上記他の層のそれぞれの厚みを測定する場合も同様である。透過型電子顕微鏡としては、例えば、日本電子株式会社製のJEM-2100F(商品名)が挙げられる。 The thickness of the coating is preferably 2 µm or more and 25 µm or less, more preferably 2 µm or more and 15 µm or less, and even more preferably 3 µm or more and 12 µm or less. Here, the thickness of the coating means the sum of the thicknesses of the layers constituting the coating. Examples of the "layer constituting the coating" include the first layer and other layers described later as layers other than the first layer. The thickness of the coating is, for example, using a transmission electron microscope (TEM), measuring any 10 points in a cross-sectional sample parallel to the normal direction of the surface of the substrate, and the average of the thickness of the measured 10 points It can be obtained by taking the value. Examples of the cross-sectional sample include a sample obtained by slicing the cross-section of the cutting tool with an ion slicer. The same is true when measuring the thickness of each of the first layer and the other layer. Examples of transmission electron microscopes include JEM-2100F (trade name) manufactured by JEOL Ltd.
 上記被膜は、第1の層を含む。また、本実施形態の一側面において、上記切削工具が奏する効果を維持する限り、上記第1の層は複数設けられていてもよい。例えば、上記被膜が上記第1の層を2層含む場合、上記被膜は両第1の層の間に設けられている中間層(他の層)を更に備えていてもよい。 The coating includes a first layer. Moreover, in one aspect of the present embodiment, a plurality of the first layers may be provided as long as the effects of the cutting tool are maintained. For example, when the coating includes two first layers, the coating may further include an intermediate layer (another layer) provided between the two first layers.
 (第1の層)
 本実施形態に係る第1の層は、複数の結晶粒を含む。上記第1の層は、上記結晶粒のみで構成されていてもよく、他の成分を含んでいても良い。上記他の成分として、TiN、TiC、Al、TiCN、TiCNO、TiBNなどが挙げられる。また、上記第1の層は、上記基材の全面を被覆することがより好ましい。しかしながら、上記第1の層の一部が上記第1の層で被覆されていなかったとしても本実施形態の範囲を逸脱するものではない。
(first layer)
The first layer according to this embodiment includes a plurality of crystal grains. The first layer may be composed only of the crystal grains, or may contain other components. Other components include TiN, TiC, Al 2 O 3 , TiCN, TiCNO, TiBN, and the like. Moreover, it is more preferable that the first layer covers the entire surface of the substrate. However, it would not depart from the scope of this embodiment if a portion of the first layer were not covered by the first layer.
 (結晶粒)
 本実施形態に係る結晶粒は、AlTi1-x1-yからなる。ここで、「結晶粒は、AlTi1-x1-yからなる」とは、AlTi1-x1-yのみからなる態様に限られず、本開示の効果が奏される限りにおいて、AlTi1-x1-yとともにAlTi1-x1-y以外の成分を含む態様をも包含する概念である。
(crystal grain)
The crystal grains according to this embodiment consist of Al x Ti 1-x C y N 1-y . Here, "the crystal grains are composed of Al x Ti 1-x CyN 1-y " is not limited to the mode composed only of Al x Ti 1-x CyN 1-y , and the effects of the present disclosure As long as the above is achieved, it is a concept that includes an aspect including components other than Al x Ti 1 - x CyN 1-y together with Al x Ti 1-x CyN 1-y .
 上記xは、0.65超0.95未満である。これによって、切削工具が優れた耐熱性を有することができる。また、上記xは、0.7超0.95未満であることが好ましく、0.75超0.95未満であることがより好ましく、0.80超0.90未満であることが更に好ましい。 The above x is more than 0.65 and less than 0.95. This allows the cutting tool to have excellent heat resistance. Moreover, the above x is preferably more than 0.7 and less than 0.95, more preferably more than 0.75 and less than 0.95, and even more preferably more than 0.80 and less than 0.90.
 上記yは、0以上0.1未満である。上記結晶粒における炭素の含有量が0≦y<0.1の範囲で微量であるとき、潤滑性が向上することで耐摩耗性が向上する。一方、yが上記の範囲を逸脱すると、耐欠損性および耐チッピング性が逆に低下するため好ましくない。また、上記yは、0以上0.08未満であることが好ましく、0以上0.06未満であることがより好ましく、0以上0.05未満であることが更に好ましい。また、製造上の観点から、上記yの下限は、0.01以上、0.02以上とすることができる。 The above y is 0 or more and less than 0.1. When the content of carbon in the crystal grains is very small in the range of 0≦y<0.1, lubricity is improved, thereby improving wear resistance. On the other hand, if y deviates from the above range, the chipping resistance and chipping resistance are lowered, which is not preferable. In addition, y is preferably 0 or more and less than 0.08, more preferably 0 or more and less than 0.06, and still more preferably 0 or more and less than 0.05. Also, from the manufacturing point of view, the lower limit of y can be 0.01 or more and 0.02 or more.
 上記結晶粒が、AlTi1-x1-yからなり、上記xが、0.65超0.95未満であり、上記yが、0以上0.1未満であることは、SEMまたはTEM付帯のEDX(Energy Dispersive X-ray spectroscopy)装置を用いることにより、確認することができる。具体的には、まず、切削工具の任意の位置を膜厚方向に切断し、被膜の断面を含む試料を作製する。次に、被膜における第1の層に関し、2μm×2μmの矩形の測定視野を任意に5箇所選択し、この領域を分析する。ここで、当該矩形における対角線の中点が、第1の層の厚み方向の中点(後述するS1又は後述するS2と、後述するS3との間における厚み方向の中点)を通り、且つ、当該矩形の相対する1組の2辺は、後述するS3に平行である。これによって、任意の測定領域に含まれる各元素の原子比を示すxおよびyを特定し、当該xおよび当該yのそれぞれの平均値を求めることにより、上記結晶粒の組成を決定することができる。 The crystal grains are made of Al x Ti 1-x C y N 1-y , the x is more than 0.65 and less than 0.95, and the y is 0 or more and less than 0.1, It can be confirmed by using an EDX (Energy Dispersive X-ray spectroscopy) device attached to SEM or TEM. Specifically, first, a cutting tool is cut at an arbitrary position in the film thickness direction to prepare a sample including a cross section of the film. Next, for the first layer in the coating, 5 2 μm×2 μm rectangular measurement fields are arbitrarily selected and analyzed. Here, the midpoint of the diagonal line of the rectangle passes through the midpoint in the thickness direction of the first layer (the midpoint in the thickness direction between S1 or S2, which will be described later, and S3, which will be described later), and A pair of two opposite sides of the rectangle are parallel to S3, which will be described later. Thereby, the composition of the crystal grains can be determined by specifying x and y indicating the atomic ratio of each element contained in an arbitrary measurement region and obtaining the average value of each of x and y. .
 (結晶粒の平均アスペクト比)
 上記結晶粒の平均アスペクト比は、3.0以下である。これによって、上記第1の層において、上記結晶粒の粒界が膜厚方向に延伸することを抑制できる。そのため、上記第1の層において、膜厚方向の亀裂が直線的に進展することを抑制できることから、切削工具は優れた耐熱亀裂性を有することができる。上記平均アスペクト比の下限は、1.0以上であることが好ましい。また、製造上の観点から、上記平均アスペクト比の下限は、1.2以上、1.4以上とすることができる。また、上記平均アスペクト比の上限は、2.5以下であることが好ましく、2.0以下であることがより好ましく、1.8以下であることが更に好ましい。また、上記平均アスペクト比は、1.0以上3.0以下であることが好ましく、1.0以上2.5以下であることがより好ましく、1.0以上2.0以下であることが更に好ましい。
(Average aspect ratio of crystal grains)
The average aspect ratio of the crystal grains is 3.0 or less. As a result, it is possible to suppress the grain boundaries of the crystal grains from extending in the film thickness direction in the first layer. Therefore, in the first layer, cracks in the film thickness direction can be prevented from linearly propagating, so that the cutting tool can have excellent thermal crack resistance. The lower limit of the average aspect ratio is preferably 1.0 or more. In terms of manufacturing, the lower limit of the average aspect ratio can be 1.2 or more and 1.4 or more. The upper limit of the average aspect ratio is preferably 2.5 or less, more preferably 2.0 or less, and even more preferably 1.8 or less. In addition, the average aspect ratio is preferably 1.0 or more and 3.0 or less, more preferably 1.0 or more and 2.5 or less, and further preferably 1.0 or more and 2.0 or less. preferable.
 <結晶粒の平均アスペクト比の測定方法>
 上記結晶粒の平均アスペクト比は、上記基材と上記被膜との界面の法線に沿った断面で測定される。具体的な測定方法は、以下(A1)~(A5)の通りである。
<Method for measuring the average aspect ratio of crystal grains>
The average aspect ratio of the grains is measured in a cross section along the normal to the interface between the substrate and the coating. Specific measurement methods are as follows (A1) to (A5).
 (A1)切削工具サンプルをエポキシ樹脂に埋込んだ後、研磨する。研磨された切削工具を、クロスセクションポリッシャ装置(JEOL社製)を用い、6kV、6時間の条件で切断した後、1.5kV、1時間の条件で仕上げ加工する。切断は、切削工具の表面の法線に沿う方向で行う。切削工具の表面の法線と、基材と被膜との界面の法線とは、略平行である。よって、上記の切断により、上記第1の層の基材と被膜との界面の法線に沿った断面が得られる。 (A1) The cutting tool sample is embedded in epoxy resin and then polished. Using a cross-section polisher (manufactured by JEOL), the polished cutting tool is cut under conditions of 6 kV and 6 hours, and then finished under conditions of 1.5 kV and 1 hour. The cut is made in a direction along the normal to the surface of the cutting tool. The normal to the surface of the cutting tool and the normal to the interface between the substrate and the coating are substantially parallel. Thus, the cutting provides a cross section along the normal to the interface between the substrate and the coating of the first layer.
 上述の切断は、刃先部から切削工具表面に平行な方向に0.1mm以上離れた位置で実行される限り、すくい面、逃げ面を問わず、切削工具の任意の部位で行なうことができる。 The cutting described above can be performed at any part of the cutting tool, regardless of whether it is the rake face or the flank, as long as it is performed at a position 0.1 mm or more away from the cutting edge in a direction parallel to the cutting tool surface.
(A2)上記断面に対して、電子線後方散乱回折装置(EBSD装置)を備えた電界放出型走査型電子顕微鏡(FE-SEM)(製品名:「SUPRA35VP」、Carl Zeiss社製)を用いて、以下の測定条件でEBSD解析を行う。
 (測定条件)
 加速電圧:15kV
 照射電流:60μm(HC有り)
 Exp :Long 0.03s
 Binning:8×8
 WD:15mm
 Tilt:70°
 BKD:Background Substraction、
Dynamic Background、
Normalize Intensity
 撮影倍率:20000倍
 粒界定義:15°以上
(A2) Using a field emission scanning electron microscope (FE-SEM) (product name: "SUPRA35VP", manufactured by Carl Zeiss) equipped with an electron beam backscatter diffraction device (EBSD device) for the above cross section , EBSD analysis is performed under the following measurement conditions.
(Measurement condition)
Accelerating voltage: 15 kV
Irradiation current: 60 μm (with HC)
Exp: Long 0.03s
Binning: 8x8
WD: 15mm
Tilt: 70°
BKD: Background Subtraction;
dynamic background,
Normalize Intensity
Magnification: 20000 times Grain boundary definition: 15° or more
 またEBSD解析に関し、データ収集は、上記断面上であって、少なくとも、第1の層の表面S1、又は、第1の層の表面側の界面S2から、基材側の界面S3までの全てを含む長さ(第1の層の厚み全体を含む長さ)×10μm(第1の層の基材側の界面S3に平行な方向の長さ)の面領域(観察領域)について行なう。 Regarding EBSD analysis, data collection is performed on the above cross section, at least from the surface S1 of the first layer or the interface S2 on the surface side of the first layer to the interface S3 on the substrate side. (the length including the entire thickness of the first layer)×10 μm (the length in the direction parallel to the interface S3 of the substrate side of the first layer) (observation area).
 なお、EBSD解析により収集されたデータについて、CI Dilation法(single Interation)とGrain CI Standardizationとで、CI>0.1を満たすデータのみを認識することにより、クリーンアップ処理を実行する。CI値は、Voting法により算出する。具体的には、CI=(V1-V2)/Videal(V1、2:1、2番目の解、Videal:理想解)により求められる。 For the data collected by EBSD analysis, cleanup processing is performed by recognizing only data that satisfies CI > 0.1 by the CI Dilation method (single interpolation) and Grain CI Standardization. The CI value is calculated by the Voting method. Specifically, CI=(V1−V2)/Video (V1, 2:1, second solution, Video: ideal solution).
 (A3)上記EBSD解析結果を、市販のソフトウェア(商品名:「OIM7.1」、株式会社TSLソリューションズ製)を用いて分析し、IPFマップ(Inverse Pole Tigre map:逆極点図方位マップ)を作成する。該IPFマップの作成においては、隣接する測定点の方位差角が15°以上の場合を結晶粒界と定義する。該IPFマップには、各結晶粒の形状が示され、及び各結晶粒の配向が色分けして示される。本実施形態の切削工具において作成された上記IPFマップの一例を図6に示す。なお、図6において黒色で示される領域は、上記CI≦0.1であることを示す。すなわち、図6において黒色で示される領域は、上記クリーンアップ処理を実行することにより、各結晶粒の形状が認識されない領域を意味する。また、図6において、紙面に向かって左側が切削工具の表面側であり、紙面に向かって右側が切削工具の基材側である。 (A3) The above EBSD analysis results are analyzed using commercially available software (trade name: "OIM7.1", manufactured by TSL Solutions Co., Ltd.) to create an IPF map (Inverse Pole Tigre map). do. In creating the IPF map, a crystal grain boundary is defined as a case where the misorientation angle between adjacent measurement points is 15° or more. The IPF map shows the shape of each grain and the orientation of each grain by color coding. An example of the IPF map created for the cutting tool of this embodiment is shown in FIG. In addition, the area shown in black in FIG. 6 indicates that CI≦0.1. In other words, the areas shown in black in FIG. 6 mean areas where the shape of each crystal grain is not recognized by executing the cleanup process. In FIG. 6, the left side of the paper is the surface side of the cutting tool, and the right side of the paper is the substrate side of the cutting tool.
 (A4)図8の模式断面図に示される様に、上記IPFマップ上で、先ず、第1の層11の表面S1、又は、第1の層11の表面側の界面S2と、基材側の界面S3とを後述の設定方法により設定する。次に、S3からS1又はS2側に0.3μm離れた地点を通り、且つ、S3に対して平行な第1仮想線L1を設定する。次に、S1又はS2から、L1までの全てを含む長さ(第1の層11の膜厚方向の長さ)×10μm(第1の層11の基材10側の界面S3に平行な方向の長さ)の測定領域を設定する。なお、上記IPFマップにおいて、S1、S2、及びS3の設定方法は以下の通りである。
 (S1、S2、及びS3の設定方法)
S1:第1の層の表面が平滑面である場合は、当該平滑面をS1として設定する。また、第1の層の表面が凸凹形状を有する場合は、先ず、上記IPFマップ上で、第1の層の表面の少なくとも一点を通過し、且つ、被膜と基材との界面に平行であり、且つ、被膜と基材との界面からの距離が最も長い仮想線VL1(図示せず)と、第1の層の表面の少なくとも一点を通過し、且つ、被膜と基材との界面に平行であり、且つ、被膜と基材との界面からの距離が最も短い仮想線VL2(図示せず)とを設定する。次いで、上記VL1からの距離と上記VL2からの距離とが等しく、且つ、被膜と基材との界面に平行な直線をS1の位置として設定する。なお、上記IPFマップにおいて上記平滑面および上記凹凸形状は、上記IPFマップと同じ視野のSEM画像上で上記平滑面または上記凹凸形状を認識した後、上記平滑面または上記凹凸形状が認識された上記SEM画像と上記IPFマップとを重ね合わせることにより認識することができる。上記SEM画像は、上記FE-SEMを用いることにより得られる。
S2:被膜表面の任意の1点を基点として、被膜の厚み方向にライン分析を行う。上記ライン分析は、SEM付帯のEDX(エネルギー分散型X線分光法:Energy Dispersive X-ray Spectroscopy)により実行される。また、上記ライン分析において、ビーム径は0.9nmとし、スキャン間隔は0.1μmとし、加速電圧は15kVとする。これにより、第1の層における第1の層特有の金属元素(例えば、第1の層に接する上側の層がAlである場合、Ti元素)の原子数の割合の極大値を示す点を特定する。次いで、当該極大値の半値を示す点のうち、当該極大値を示す点を基点として表面側に位置し、且つ、当該極大値を示す点に最も近い点P1(図示せず)を特定する。次いで、被膜表面の任意の他の1点を選択し、同様にして、第1の層における第1の層特有の金属元素(例えば、第1の層に接する上側の層がAl層である場合、Ti元素)の原子数の割合の極大値の半値を示す点のうち、当該極大値を示す点を基点として表面側に位置し、且つ、当該極大値を示す点に最も近い点P2(図示せず)を特定する。次いで、当該P1と当該P2とを結ぶ直線を、上記IPFマップ上におけるS2の位置として設定する。
S3:被膜表面の任意の1点を基点として、被膜の厚み方向にライン分析を行う。上記ライン分析は、SEM付帯のEDX(エネルギー分散型X線分光法:Energy Dispersive X-ray Spectroscopy)により実行される。また、上記ライン分析において、ビーム径は0.9nmとし、スキャン間隔は0.1μmとし、加速電圧は15kVとする。これにより、第1の層における第1の層特有の金属元素(例えば、第1の層に接する下側の層がTiN層である場合、Al元素)の原子数の割合の極大値を示す点を特定する。次いで、当該極大値の半値を示す点のうち、当該極大値を示す点を基点として基材側に位置し、且つ、当該極大値を示す点に最も近い点P3(図示せず)を特定する。次いで、被膜表面の任意の他の1点を選択し、同様にして、第1の層における第1の層特有の金属元素(例えば、第1の層に接する下側の層がTiN層である場合、Al元素)の原子数の割合の極大値の半値を示す点のうち、当該極大値を示す点を基点として基材側に位置し、且つ、当該極大値を示す点に最も近い点P4(図示せず)を特定する。次いで、当該P3と当該P4とを結ぶ直線を、上記IPFマップ上におけるS3の位置として設定する。
(A4) As shown in the schematic cross-sectional view of FIG. 8, on the IPF map, first, the surface S1 of the first layer 11 or the interface S2 on the surface side of the first layer 11 and the substrate side and the interface S3 are set by a setting method to be described later. Next, a first imaginary line L1 passing through a point 0.3 μm away from S3 toward S1 or S2 and parallel to S3 is set. Next, the length including all from S1 or S2 to L1 (the length in the film thickness direction of the first layer 11) × 10 µm (the direction parallel to the interface S3 on the substrate 10 side of the first layer 11 length) measurement area. In addition, in the IPF map, the setting method of S1, S2, and S3 is as follows.
(How to set S1, S2, and S3)
S1: When the surface of the first layer is a smooth surface, the smooth surface is set as S1. Further, when the surface of the first layer has an uneven shape, first, on the IPF map, it passes through at least one point on the surface of the first layer and is parallel to the interface between the coating and the substrate. and a virtual line VL1 (not shown) having the longest distance from the interface between the coating and the substrate, passing through at least one point on the surface of the first layer, and parallel to the interface between the coating and the substrate and a virtual line VL2 (not shown) having the shortest distance from the interface between the film and the base material. Next, a straight line whose distance from VL1 is equal to the distance from VL2 and which is parallel to the interface between the film and the substrate is set as the position of S1. In the IPF map, the smooth surface and the uneven shape are obtained by recognizing the smooth surface or the uneven shape on the SEM image of the same field of view as the IPF map, and then recognizing the smooth surface or the uneven shape. It can be recognized by superimposing the SEM image and the IPF map. The SEM image is obtained by using the FE-SEM.
S2: A line analysis is performed in the thickness direction of the film with an arbitrary point on the surface of the film as a base point. The line analysis is performed by EDX (Energy Dispersive X-ray Spectroscopy) with SEM. In the above line analysis, the beam diameter is 0.9 nm, the scanning interval is 0.1 μm, and the acceleration voltage is 15 kV. As a result, the ratio of the number of atoms of the metal element specific to the first layer (for example, Ti element when the upper layer in contact with the first layer is Al 2 O 3 ) in the first layer shows the maximum value. Identify points. Next, of the points indicating the half value of the maximum value, a point P1 (not shown) located on the surface side with the point indicating the maximum value as a base point and closest to the point indicating the maximum value is specified. Next, any other point on the surface of the coating is selected, and in the same way, the metal element peculiar to the first layer in the first layer (for example, the upper layer in contact with the first layer is an Al 2 O 3 layer In the case of Ti element), among the points that indicate the half value of the maximum value of the ratio of the number of atoms of Ti element), the point that is located on the surface side with the point that indicates the maximum value as the base point and is the closest point to the point that indicates the maximum value Identify P2 (not shown). Next, a straight line connecting P1 and P2 is set as the position of S2 on the IPF map.
S3: A line analysis is performed in the thickness direction of the coating with an arbitrary point on the coating surface as a base point. The line analysis is performed by EDX (Energy Dispersive X-ray Spectroscopy) with SEM. In the above line analysis, the beam diameter is 0.9 nm, the scanning interval is 0.1 μm, and the acceleration voltage is 15 kV. As a result, the point indicating the maximum value of the ratio of the number of atoms of the metal element peculiar to the first layer in the first layer (for example, Al element when the lower layer in contact with the first layer is a TiN layer) identify. Next, among the points indicating the half value of the maximum value, a point P3 (not shown) located on the substrate side with the point indicating the maximum value as a base point and closest to the point indicating the maximum value is specified. . Next, any other point on the surface of the coating is selected, and in the same way, the metal element peculiar to the first layer in the first layer (for example, the lower layer in contact with the first layer is a TiN layer of the points showing the half-maximum value of the ratio of the number of atoms of Al element), the point P4 is located on the substrate side with the point showing the maximum value as a base point, and is closest to the point showing the maximum value. (not shown). Next, a straight line connecting P3 and P4 is set as the position of S3 on the IPF map.
 (A5)上記の測定領域に含まれる全結晶粒のそれぞれについてアスペクト比を測定し、これらの平均値を算出する。ここで、結晶粒の内、上記S1、S2及びL1のいずれかを跨ぐ結晶粒は、測定から除外する。本明細書において、アスペクト比とは、結晶粒の最大径aを結晶粒の短径bで除した値と定義する。結晶粒の最大径aは、結晶粒の最外周のピクセルの座標位置を(x,y)及び(x,y)として、計算式「d=(x-x+(y-y」で表されるdの値のうち、一の結晶粒における(x,y)及び(x,y)の全ての組み合わせにより求められるdの最大値と定義する。結晶粒の短径bは、計算式「b=A(結晶粒の粒子面積)/πa」により算出される数値である。該アスペクト比の平均値が、「結晶粒の平均アスペクト比」に該当する。 (A5) The aspect ratio is measured for each of all the crystal grains contained in the above measurement area, and the average value thereof is calculated. Here, among the crystal grains, crystal grains straddling any one of S1, S2 and L1 are excluded from the measurement. In this specification, the aspect ratio is defined as a value obtained by dividing the maximum diameter a of a crystal grain by the minor diameter b of a crystal grain. The maximum diameter a of the crystal grain is calculated by the formula “d 2 = (x i −x j ) 2 where the coordinate positions of the pixels on the outermost periphery of the crystal grain are (x i , y i ) and (x j , y j ). +(y i −y j ) 2 ”, the maximum value of d obtained from all combinations of (x i , y i ) and (x j , y j ) in one crystal grain defined as a value. The short diameter b of the crystal grain is a numerical value calculated by the formula “b=A (particle area of the crystal grain)/πa”. The average value of the aspect ratios corresponds to the "average aspect ratio of crystal grains".
 同一の切削工具において、異なる測定範囲を任意に選択し、該測定範囲において上記の測定を行っても同様の結果が得られることが確認されている。 It has been confirmed that the same results can be obtained by arbitrarily selecting a different measurement range for the same cutting tool and performing the above measurements in that measurement range.
 (立方晶系構造を有する結晶粒が占める面積比率)
 上記結晶粒は、立方晶系構造を有する結晶粒を含む。また、上記第1の層において、立方晶系構造を有する結晶粒が占める面積比率は、90%以上である。これによって、第1の層は高い硬度を有し、切削工具は優れた耐摩耗性を有することができる。上記面積比率の下限は、92%以上であることが好ましく、95%以上であることがより好ましく、98%以上であることが更に好ましい。また、上記面積比率の上限は、100%以下であることが好ましい。また、製造上の観点から、上記面積比率の上限は、99.5%以下、99%以下とすることができる。また、上記面積比率は、90%以上100%以下であることが好ましく、95%以上100%以下であることがより好ましく、98%以上100%以下であることが更に好ましい。
(Area ratio occupied by crystal grains having a cubic system structure)
The crystal grains include crystal grains having a cubic system structure. Further, in the first layer, the area ratio of crystal grains having a cubic system structure is 90% or more. This allows the first layer to have high hardness and the cutting tool to have excellent wear resistance. The lower limit of the area ratio is preferably 92% or more, more preferably 95% or more, and even more preferably 98% or more. Moreover, the upper limit of the area ratio is preferably 100% or less. Moreover, from the viewpoint of manufacturing, the upper limit of the area ratio can be 99.5% or less and 99% or less. The area ratio is preferably 90% or more and 100% or less, more preferably 95% or more and 100% or less, and even more preferably 98% or more and 100% or less.
 <立方晶系構造を有する結晶粒が占める面積比率の測定方法>
 第1の層において、立方晶系構造を有する結晶粒が占める面積比率は、上記基材と上記被膜との界面の法線に沿った断面で測定される。具体的な測定方法は、以下(B1)~(B4)の通りである。
<Method for measuring area ratio occupied by crystal grains having a cubic structure>
In the first layer, the area ratio occupied by grains having a cubic structure is measured in a cross section along the normal to the interface between the substrate and the coating. Specific measurement methods are as follows (B1) to (B4).
 (B1)上記「結晶粒の平均アスペクト比の測定方法」に記載の(A1)及び(A2)と同一の手順で、切削工具の断面に対してEBSD解析を行う。 (B1) Perform EBSD analysis on the cross section of the cutting tool in the same procedure as (A1) and (A2) described in the above "Method for measuring the average aspect ratio of crystal grains".
 (B2)上記EBSD解析結果を、市販のソフトウェア(商品名:「OIM7.1」、株式会社TSLソリューションズ製)を用いて分析し、結晶相(Phase)マップを作成する。該結晶相マップには、図7で示される様に、各結晶粒の結晶系が色分けして示される。本実施形態では、主に立方晶系及び六方晶系が示される。なお、図7において黒色で示される領域は、上記CI≦0.1であることを示す。すなわち、図7において黒色で示される領域は、上記クリーンアップ処理を実行することにより、各結晶粒の結晶系が認識されない領域を意味する。また、図7において、紙面に向かって左側が切削工具の表面側であり、紙面に向かって右側が切削工具の基材側である。 (B2) The above EBSD analysis results are analyzed using commercially available software (trade name: "OIM7.1", manufactured by TSL Solutions Co., Ltd.) to create a crystalline phase map. In the crystal phase map, as shown in FIG. 7, the crystal system of each crystal grain is indicated by different colors. In this embodiment, mainly cubic and hexagonal systems are shown. In addition, the area shown in black in FIG. 7 indicates that CI≦0.1. In other words, the areas shown in black in FIG. 7 mean areas where the crystal system of each crystal grain is not recognized by executing the cleanup process. In FIG. 7, the left side of the paper is the surface side of the cutting tool, and the right side of the paper is the substrate side of the cutting tool.
 (B3)上記結晶相マップ上で、上記(A4)と同一の測定領域を設定する。 (B3) Set the same measurement region as in (A4) above on the crystal phase map.
 (B4)上記の測定領域において、結晶系の示される全領域の面積に対する立方晶系の結晶粒の面積の百分率を算出する。該百分率が、「第1の層において、立方晶系構造を有する結晶粒が占める面積比率」に該当する。ここで、「結晶系の示される全領域」とは、「測定領域から結晶系を判定不能な領域」を意味する。 (B4) Calculate the percentage of the area of the cubic crystal grains to the area of the entire crystal system shown in the above measurement area. This percentage corresponds to "the area ratio occupied by crystal grains having a cubic system structure in the first layer". Here, "the entire region where the crystal system is shown" means "the region where the crystal system cannot be determined from the measurement region".
 同一の切削工具において、異なる測定範囲を任意に選択し、該測定範囲において上記の測定を行っても同様の結果が得られることが確認されている。 It has been confirmed that the same results can be obtained by arbitrarily selecting a different measurement range for the same cutting tool and performing the above measurements in that measurement range.
 (第1個数比率)
 上記結晶粒は、第1結晶粒を含み、上記被膜の表面の法線方向に対する前記第1結晶粒の<111>方向の傾斜角は、0°以上10°以下であり、上記結晶粒に対し、上記第1結晶粒が占める第1個数比率は、15%以上であることが好ましい。これによって、第1結晶粒の成長方向が当該第1結晶粒の<111>方向に配向する傾向にあることに起因して、第1の層の硬度が上昇するため、切削工具の耐摩耗性を更に向上することができる。上記第1個数比率の下限は、20%以上であることが好ましく、25%以上であることがより好ましく、30%以上であることが更に好ましい。また、上記第1個数比率の上限は、70%以下であることが好ましく、60%以下であることがより好ましく、50%以下であることが更に好ましい。また、上記第1個数比率は、15%以上70%以下であることがより好ましく、20%以上50%以下であることが更に好ましい。
(First number ratio)
The crystal grains include first crystal grains, the inclination angle of the <111> direction of the first crystal grains with respect to the normal direction of the surface of the coating is 0° or more and 10° or less, and the crystal grains are , The first number ratio of the first crystal grains is preferably 15% or more. As a result, since the growth direction of the first crystal grains tends to be oriented in the <111> direction of the first crystal grains, the hardness of the first layer increases, so the wear resistance of the cutting tool can be further improved. The lower limit of the first number ratio is preferably 20% or more, more preferably 25% or more, and even more preferably 30% or more. Also, the upper limit of the first number ratio is preferably 70% or less, more preferably 60% or less, and even more preferably 50% or less. Further, the first number ratio is more preferably 15% or more and 70% or less, and even more preferably 20% or more and 50% or less.
 <第1個数比率の測定方法>
 上記第1個数比率は、上記基材と上記被膜との界面の法線に沿った断面で測定される。具体的な測定方法は、以下(C1)~(C2)の通りである。
<Method for measuring the first number ratio>
The first number ratio is measured in a cross section along the normal line of the interface between the substrate and the coating. Specific measurement methods are as follows (C1) to (C2).
 (C1)上記「結晶粒の平均アスペクト比の測定方法」に記載の(A1)及び(A2)と同一の手順で、切削工具の断面に対してEBSD解析を行う。 (C1) Perform EBSD analysis on the cross section of the cutting tool in the same procedure as (A1) and (A2) described in the above "Method for measuring the average aspect ratio of crystal grains".
 (C2)上記EBSD解析結果を、市販のソフトウェア(商品名:「OIM7.1」、株式会社TSLソリューションズ製)を用いて分析し、当該ソフトウェア上で各ピクセルごとの<111>方向の傾斜角についてCrystal Directionのヒストグラムを出力し、その累積割合を読み取ることにより、上記第1個数比率を求める。 (C2) The above EBSD analysis results are analyzed using commercially available software (trade name: "OIM7.1", manufactured by TSL Solutions Co., Ltd.), and the tilt angle in the <111> direction for each pixel on the software The first number ratio is obtained by outputting a histogram of Crystal Direction and reading the cumulative ratio.
 (第1の層の圧縮残留応力)
 第1の層の圧縮残留応力は、1.0GPa以上4.5GPa未満であることが好ましい。これによって、切削加工時に発生する亀裂の進展を抑制できるため、切削工具の耐熱亀裂性を更に向上することができる。上記圧縮残留応力の下限は、1.0GPa以上であることが好ましく、2.0GPa以上であることがより好ましく、2.5GPa以上であることが更に好ましい。また、上記圧縮残留応力の上限は、4.5GPa未満であることが好ましい。また、製造上の観点から、上記圧縮残留応力の上限は、4.0GPa未満、3.5GPa未満とすることができる。また、上記圧縮残留応力は、2.0GPa以上4.5GPa未満であることがより好ましく、2.5GPa以上4.5GPa未満であることが更に好ましい。
(Compressive residual stress of the first layer)
The compressive residual stress of the first layer is preferably 1.0 GPa or more and less than 4.5 GPa. As a result, the propagation of cracks generated during cutting can be suppressed, so that the thermal crack resistance of the cutting tool can be further improved. The lower limit of the compressive residual stress is preferably 1.0 GPa or more, more preferably 2.0 GPa or more, and even more preferably 2.5 GPa or more. Moreover, the upper limit of the compressive residual stress is preferably less than 4.5 GPa. Moreover, from the viewpoint of manufacturing, the upper limit of the compressive residual stress can be less than 4.0 GPa and less than 3.5 GPa. Further, the compressive residual stress is more preferably 2.0 GPa or more and less than 4.5 GPa, and even more preferably 2.5 GPa or more and less than 4.5 GPa.
 <第1の層の圧縮残留応力の測定方法>
 上記圧縮残留応力は、例えば、X線を用いた2θ-sin2 ψ法(側傾法)によって求めることができる。測定条件は下記のとおりである。なお、例えば、切削工具のすくい面のホーニング位置から工具の中心位置に向かって5mm以内の任意の3点以上の位置における圧縮残留応力の平均値を求める。
 (測定条件)
X線出力:8.04keV
X線源:放射光
測定面:(200)面
検出器:フラットパネル
集光サイズ:1.5mm×0.5mm
スキャン軸:2θ/θ
スキャンモード:CONTINUOUS
<Method for Measuring Compressive Residual Stress of First Layer>
The compressive residual stress can be obtained by, for example, the 2θ-sin2 ψ method (lateral tilt method) using X-rays. Measurement conditions are as follows. For example, an average value of compressive residual stresses at arbitrary three or more points within 5 mm from the honing position of the rake face of the cutting tool toward the center position of the tool is obtained.
(Measurement condition)
X-ray output: 8.04keV
X-ray source: Radiation measurement plane: (200) plane Detector: Flat panel Condensing size: 1.5 mm × 0.5 mm
Scan axis: 2θ/θ
Scan mode: CONTINUOUS
 (第1の層の硬度)
 第1の層の硬度は、30GPa以上40GPa以下であることが好ましい。これによって、切削工具の耐摩耗性を更に向上することができる。上記硬度の下限は、30GPa以上であることが好ましく、31GPa以上であることがより好ましく、32GPa以上であることが更に好ましい。また、上記硬度の上限は、40GPa以下であることが好ましく、39GPa以下であることがより好ましく、38GPa以下であることが更に好ましい。また、上記硬度は、31GPa以上40GPa以下であることがより好ましく、32GPa以上39GPa以下であることが更に好ましい。
(Hardness of first layer)
The hardness of the first layer is preferably 30 GPa or more and 40 GPa or less. This can further improve the wear resistance of the cutting tool. The lower limit of the hardness is preferably 30 GPa or more, more preferably 31 GPa or more, and even more preferably 32 GPa or more. The upper limit of the hardness is preferably 40 GPa or less, more preferably 39 GPa or less, and even more preferably 38 GPa or less. Further, the hardness is more preferably 31 GPa or more and 40 GPa or less, and even more preferably 32 GPa or more and 39 GPa or less.
 <第1の層の硬度の測定方法>
 上記硬度の測定は、ISO14577に準拠した方法で行い、測定荷重は10mN(1g)とする。
<Method for Measuring Hardness of First Layer>
The hardness is measured by a method conforming to ISO14577, and the measurement load is 10 mN (1 g).
 (第1の層の厚み)
 本実施形態に係る第1の層の厚みは、2μm以上20μm以下である。これによって、切削工具の耐摩耗性を高めることができる。また、上記第1の層の厚みの下限は、3μm以上であることが好ましく、4μm以上であることがより好ましく、5μm以上であることが更に好ましい。また、上記第1の層の厚みの上限は、12μm以下であることが好ましく、10μm以下であることがより好ましく、8μm以下であることが更に好ましい。また、上記第1の層の厚みは、2μm以上12μm以下であることが好ましく、2μm以上10μm以下であることがより好ましく、3μm以上10μm以下であることが更に好ましい。
(Thickness of first layer)
The thickness of the first layer according to this embodiment is 2 μm or more and 20 μm or less. This can improve the wear resistance of the cutting tool. Also, the lower limit of the thickness of the first layer is preferably 3 μm or more, more preferably 4 μm or more, and even more preferably 5 μm or more. The upper limit of the thickness of the first layer is preferably 12 μm or less, more preferably 10 μm or less, and even more preferably 8 μm or less. The thickness of the first layer is preferably 2 μm or more and 12 μm or less, more preferably 2 μm or more and 10 μm or less, and even more preferably 3 μm or more and 10 μm or less.
 (他の層)
 本実施形態の効果を損なわない限り、上記被膜は、上記他の層を更に含んでいてもよい。図4および図5に示されるように、上記他の層としては、例えば、下地層12、表面層13等が挙げられる。
(other layers)
The coating may further include the other layers as long as the effects of the present embodiment are not impaired. As shown in FIGS. 4 and 5, examples of the other layers include an underlying layer 12, a surface layer 13, and the like.
 (下地層)
 下地層12は、基材10と第1の層11との間に配置される。下地層としては、例えば、TiN層を挙げることができる。下地層の平均厚みは、0.1μm以上20μm以下であることが好ましい。これによると、被膜は優れた耐摩耗性及び耐欠損性を有することができる。また、下地層の平均厚みは、0.3μm以上8μm以下であることがより好ましく、0.5μm以上5μm以下であることが更に好ましい。
(Underlayer)
The underlayer 12 is arranged between the substrate 10 and the first layer 11 . For example, a TiN layer can be used as the underlying layer. The average thickness of the underlayer is preferably 0.1 μm or more and 20 μm or less. According to this, the coating can have excellent wear resistance and chipping resistance. Further, the average thickness of the underlayer is more preferably 0.3 μm or more and 8 μm or less, and further preferably 0.5 μm or more and 5 μm or less.
 (表面層)
 表面層13としては、例えば、Ti(チタン)の炭化物、窒化物または硼化物のいずれかを主成分とすることが好ましい。表面層13は、被膜14において最も表面側に配置される層である。ただし、刃先部においては形成されない場合もある。表面層は、例えば、第1の層の直上に配置される。
(Surface layer)
The surface layer 13 preferably contains, for example, Ti (titanium) carbide, nitride, or boride as a main component. The surface layer 13 is the layer located closest to the surface of the coating 14 . However, it may not be formed at the cutting edge. The surface layer is arranged, for example, directly above the first layer.
 「Tiの炭化物、窒化物または硼化物のいずれかを主成分とする」とは、Tiの炭化物、窒化物および硼化物のいずれかを90質量%以上含むことを意味する。また、好ましくは不可避不純物を除きTiの炭化物、窒化物および硼化物のいずれかからなることを意味する。 "Consists mainly of Ti carbide, nitride, or boride" means containing 90% by mass or more of Ti carbide, nitride, or boride. Moreover, it means that it preferably consists of any one of carbide, nitride and boride of Ti except for inevitable impurities.
 Tiの炭化物、窒化物および炭窒化物のいずれかのうち、特に好ましいのはTiの窒化物(すなわちTiNで表される化合物)を主成分として表面層を構成することである。TiNはこれらの化合物のうち色彩が最も明瞭(金色を呈する)であるため、切削使用後の切削チップのコーナー識別(使用済み部位の識別)が容易であるという利点がある。表面層はTiN層からなることが好ましい。 Among Ti carbides, nitrides, and carbonitrides, it is particularly preferable to form the surface layer mainly from Ti nitrides (that is, compounds represented by TiN). Among these compounds, TiN has the clearest color (exhibits a gold color), so it has the advantage of facilitating identification of the corners of the cutting tip after use for cutting (identification of used portions). The surface layer preferably consists of a TiN layer.
 表面層は、平均厚みが0.05μm以上1μm以下であることが好ましい。これによると、表面層と、隣接する層との密着性が向上する。表面層の平均厚みは、0.1μm以上0.8μm以下であることがより好ましく、0.2μm以上0.6μm以下であることが更に好ましい。 The surface layer preferably has an average thickness of 0.05 µm or more and 1 µm or less. According to this, the adhesion between the surface layer and the adjacent layer is improved. The average thickness of the surface layer is more preferably 0.1 μm or more and 0.8 μm or less, and even more preferably 0.2 μm or more and 0.6 μm or less.
 [実施形態2:切削工具の製造方法]
 本実施形態に係る切削工具の製造方法は、
 上記基材を準備する第1工程(以下、単に「第1工程」という場合がある。)と、
 化学気相蒸着(CVD)法を用いて、上記基材上に上記被膜を形成する第2工程(以下、単に「第2工程」という場合がある。)と、を含む。
 上記第2工程は、アルミニウムのハロゲン化物ガス、チタンのハロゲン化物ガス、アンモニアガスおよび水素ガスを、650℃以上900℃以下、且つ、0.1kPa以上30kPa以下の雰囲気において、上記基材上に噴出することを含む。該製造方法は、更に、第2工程により得られた被膜に対してブラスト処理を行う第3工程(以下、単に「第3工程」という場合がある。)を含むことができる。
[Embodiment 2: Manufacturing method of cutting tool]
The method for manufacturing a cutting tool according to this embodiment includes:
A first step of preparing the base material (hereinafter sometimes simply referred to as "first step");
and a second step of forming the coating on the substrate using a chemical vapor deposition (CVD) method (hereinafter, sometimes simply referred to as the “second step”).
In the second step, an aluminum halide gas, a titanium halide gas, an ammonia gas, and a hydrogen gas are jetted onto the substrate in an atmosphere of 650° C. or more and 900° C. or less and 0.1 kPa or more and 30 kPa or less. including doing The manufacturing method can further include a third step (hereinafter sometimes simply referred to as "third step") of subjecting the film obtained in the second step to a blasting treatment.
 <第1工程:基材を準備する工程>
 第1工程では基材を準備する。例えば、基材として超硬合金基材が準備される。超硬合金基材は、市販品を用いてもよく、一般的な粉末冶金法で製造してもよい。一般的な粉末冶金法で製造する場合、例えば、ボールミル等によってWC粉末とCo粉末等とを混合して混合粉末を得る。該混合粉末を乾燥した後、所定の形状(例えば、SEET13T3AGSN-G等)に成形して成形体を得る。さらに該成形体を焼結することにより、WC-Co系超硬合金(焼結体)を得る。次いで該焼結体に対して、ホーニング処理等の所定の刃先加工を施すことにより、WC-Co系超硬合金からなる基材を製造することができる。第1工程では、上記以外の基材であっても、この種の基材として従来公知の基材であればいずれも準備可能である。
<First Step: Step of Preparing Base Material>
A substrate is prepared in the first step. For example, a cemented carbide substrate is prepared as the substrate. The cemented carbide substrate may be a commercially available product or may be produced by a general powder metallurgy method. When manufacturing by a general powder metallurgy method, for example, a mixed powder is obtained by mixing WC powder and Co powder with a ball mill or the like. After drying the mixed powder, it is molded into a predetermined shape (eg, SEET13T3AGSN-G, etc.) to obtain a molded body. Further, by sintering the molded body, a WC—Co-based cemented carbide (sintered body) is obtained. Then, the sintered body is subjected to a predetermined cutting edge processing such as honing treatment to produce a base material made of a WC—Co based cemented carbide. In the first step, any substrate other than those described above can be prepared as long as it is a conventionally known substrate of this type.
 <第2工程:基材上に被膜を形成する工程>
 第2工程では、CVD法を用いて、基材上に第1の層を含む被膜を形成する。具体的には、アルミニウムのハロゲン化物ガス、チタンのハロゲン化物ガス、アンモニアガス(以下、これらのガスをまとめて「原料ガス」とも記す。)およびキャリアガスを、650℃以上900℃以下且つ0.1kPa以上30kPa以下の雰囲気において上記基材に噴出することにより第1の層を含む被膜が形成される。これにより、本実施形態の切削工具が得られる。この工程は、例えば以下に説明するCVD装置を用いて行うことができる。
<Second step: step of forming a coating on the substrate>
In the second step, a CVD method is used to form a coating including the first layer on the substrate. Specifically, an aluminum halide gas, a titanium halide gas, an ammonia gas (hereinafter these gases are collectively referred to as "raw material gases"), and a carrier gas are heated at 650° C. to 900° C. A coating including the first layer is formed by jetting onto the substrate in an atmosphere of 1 kPa or more and 30 kPa or less. Thereby, the cutting tool of this embodiment is obtained. This step can be performed using, for example, a CVD apparatus described below.
 (CVD装置)
 図9に、本実施形態の切削工具の製造に用いられるCVD装置50の一例の模式的な断面図を示す。図9に示すように、CVD装置50は、基材10を設置するための基材セット治具52と、基材セット治具52を内包する耐熱合金鋼製の反応容器53とを備えている。また、反応容器53の周囲には、反応容器53内の温度を制御するための調温装置54が設けられている。本実施形態において、基材10は、基材セット治具52に備えられている突起物の上に設置することが好ましい。このように設置することで、すくい面、逃げ面及び刃先部それぞれに均一に成膜することができる。
(CVD equipment)
FIG. 9 shows a schematic cross-sectional view of an example of a CVD apparatus 50 used for manufacturing the cutting tool of this embodiment. As shown in FIG. 9, the CVD apparatus 50 includes a substrate setting jig 52 for setting the substrate 10, and a reaction vessel 53 made of heat-resistant alloy steel and containing the substrate setting jig 52. . A temperature controller 54 for controlling the temperature inside the reaction vessel 53 is provided around the reaction vessel 53 . In this embodiment, the substrate 10 is preferably placed on projections provided on the substrate setting jig 52 . By installing in this way, it is possible to form a uniform film on each of the rake face, the flank face, and the cutting edge.
 反応容器53には、ガス導入管55が反応容器53の内部の空間を鉛直方向に延在し、当該鉛直方向を軸に回転可能に設けられている。ガス導入管55にはガスを工具基材へ噴出させるための複数の貫通孔が設けられている。本実施形態において、上述のガスを噴出させるための当該貫通孔と基材10との間隔は十分にとることが好ましい。このようにすることで、乱流が発生することを防ぐことができる。 In the reaction container 53, a gas introduction pipe 55 extends vertically in the space inside the reaction container 53, and is provided rotatably about the vertical direction. The gas introduction pipe 55 is provided with a plurality of through holes for ejecting gas to the tool substrate. In the present embodiment, it is preferable to keep a sufficient distance between the through-hole for ejecting the gas and the substrate 10 . By doing so, it is possible to prevent turbulence from occurring.
 さらに、反応容器53には内部のガスを外部に排気するためのガス排気管56が設けられており、反応容器53の内部のガスは、ガス排気管56を通過して、ガス排気口57から反応容器53の外部に排出される。 Furthermore, the reaction container 53 is provided with a gas exhaust pipe 56 for discharging the internal gas to the outside. It is discharged outside the reaction container 53 .
 反応容器53内は、650℃以上900℃以下(好ましくは700℃以上770℃以下)且つ0.1kPa以上30kPa以下(好ましくは0.2kPa以上5.0kPa以下)の雰囲気とする。ガス導入管55には複数の貫通孔が開いているため、導入されたガスは、それぞれ異なる貫通孔から反応容器53内に噴出される。このときガス導入管55は、中の回転矢印が示すように上述の軸を中心として、例えば、2~4rpmの回転速度で回転している。これによって、基材に対して均等に噴出することができる。 The inside of the reaction vessel 53 has an atmosphere of 650° C. to 900° C. (preferably 700° C. to 770° C.) and 0.1 kPa to 30 kPa (preferably 0.2 kPa to 5.0 kPa). Since the gas introduction pipe 55 has a plurality of through-holes, the introduced gas is jetted into the reaction vessel 53 from different through-holes. At this time, the gas introduction pipe 55 is rotating at a rotational speed of 2 to 4 rpm, for example, about the above-mentioned axis as indicated by the rotation arrow inside. This makes it possible to jet evenly onto the substrate.
 アルミニウムのハロゲン化物ガスとしては、例えば、塩化アルミニウムガス(AlClガス、AlClガス)等が挙げられる。好ましくは、AlClガスが用いられる。アルミニウムのハロゲン化物ガスの濃度(体積%)は、反応容器内に導入される全てのガスの合計体積(以下、「導入ガスの全体積」とも記す)を基準として、0.1体積%以上1.0体積%以下であることが好ましく、0.2体積%以上0.8体積%以下であることがより好ましい。 Halide gases of aluminum include, for example, aluminum chloride gas (AlCl 3 gas, Al 2 Cl 6 gas). Preferably AlCl 3 gas is used. The concentration (% by volume) of the halide gas of aluminum is 0.1% by volume or more based on the total volume of all gases introduced into the reaction vessel (hereinafter also referred to as "total volume of introduced gas")1 It is preferably 0.0% by volume or less, more preferably 0.2% by volume or more and 0.8% by volume or less.
 チタンのハロゲン化物ガスとしては、例えば、塩化チタン(IV)ガス(TiClガス)、塩化チタン(III)ガス(TiClガス)等が挙げられる。好ましくは、塩化チタン(IV)ガスが用いられる。チタンのハロゲン化物ガスの濃度(体積%)は、導入ガスの全体積を基準として、0.05体積%以上0.3体積%以下であることが好ましく、0.1体積%以上0.2体積%以下であることがより好ましい。 Titanium halide gases include, for example, titanium (IV) chloride gas ( TiCl4 gas), titanium chloride ( III ) gas (TiCl3 gas), and the like. Titanium (IV) chloride gas is preferably used. The concentration (% by volume) of the titanium halide gas is preferably 0.05% by volume or more and 0.3% by volume or less, based on the total volume of the introduced gas, and 0.1% by volume or more and 0.2% by volume. % or less.
 アンモニアガスの濃度(体積%)は、導入ガスの全体積を基準として、0.2体積%以上3.0体積%以下であることが好ましく、0.5体積%以上2.0体積%以下であることがより好ましい。 The concentration (% by volume) of ammonia gas is preferably 0.2% by volume or more and 3.0% by volume or less, and 0.5% by volume or more and 2.0% by volume or less, based on the total volume of the introduced gas. It is more preferable to have
 上記原料ガスに加えて、エチレンガス(C)を用いることができる。エチレンガスの濃度(体積%)は、導入ガスの全体積を基準として、0体積%以上0.3体積%以下であることが好ましい。 Ethylene gas (C 2 H 4 ) can be used in addition to the raw material gas. The concentration (% by volume) of ethylene gas is preferably 0% by volume or more and 0.3% by volume or less based on the total volume of the introduced gas.
 キャリアガスとしては、例えばアルゴンガス、水素ガスなどが挙げられる。好ましくは、水素ガスが用いられる。キャリアガスのガス濃度(体積%)は導入ガスの全体積を基準として、90体積%以上99体積%以下であることが好ましく、95%以上99%以下であることがより好ましい。 Examples of carrier gases include argon gas and hydrogen gas. Hydrogen gas is preferably used. The gas concentration (% by volume) of the carrier gas is preferably 90% by volume or more and 99% by volume or less, more preferably 95% or more and 99% or less, based on the total volume of the introduced gas.
 第2工程において、以下の条件でキャリアガスの流量を変化させることにより、導入ガスの総ガス流量を変化させる。これによると、結晶粒の平均アスペクト比を3.0以下とすることができる。この理由は以下の通りと推察される。 In the second step, the total flow rate of the introduced gas is changed by changing the flow rate of the carrier gas under the following conditions. According to this, the average aspect ratio of the crystal grains can be made 3.0 or less. The reason for this is presumed to be as follows.
 CVD法によるAlTiCN膜の成膜では、ガス流速が一定であると、特定の結晶面に吸着する確率が高いため柱状に成長しやすくなる。一方、本実施形態では、成膜中にキャリアガスの流量を変化させることにより、導入ガス全体の流速を変化させる。これにより、原料ガスが特定の結晶面に吸着する確率が低くなり、結晶粒が柱状に成長しにくくなるため、結晶粒のアスペクト比が小さくなると推察される。導入ガスの総ガス流量を変化させることにより、結晶粒の平均アスペクト比を3.0以下にできることは、本発明者らが新たに見出したものである。 In the deposition of the AlTiCN film by the CVD method, if the gas flow rate is constant, the probability of adsorption to a specific crystal plane is high, so it tends to grow in a columnar shape. On the other hand, in the present embodiment, the flow rate of the entire introduced gas is changed by changing the flow rate of the carrier gas during film formation. As a result, the raw material gas is less likely to be adsorbed on specific crystal planes, making it difficult for crystal grains to grow in a columnar shape, presumably reducing the aspect ratio of crystal grains. The present inventors have newly discovered that the average aspect ratio of crystal grains can be made 3.0 or less by changing the total gas flow rate of the introduced gas.
 なお、従来は、AlTiCN膜を高真空下で成膜するため、圧力制御するのが困難であった。そのため、ガス流速を一定にすることが一般的であった。仮に、AlTiCN膜の成膜中にガス流速を変化させ圧力変動が大きい場合には、AlTiCN膜中に欠陥が生成しやすいなどの不都合が生じると考えられていた。従って、AlTiCN膜の成膜中にガス流速を変化させるという本実施形態に特有の方法は、当業者が採用しないものであった。 Conventionally, since the AlTiCN film is formed under high vacuum, it was difficult to control the pressure. Therefore, it was common to keep the gas flow velocity constant. If the gas flow velocity is changed during the formation of the AlTiCN film and the pressure fluctuation is large, it has been thought that defects such as defects tend to occur in the AlTiCN film. Therefore, the method of changing the gas flow rate during the deposition of the AlTiCN film, which is unique to this embodiment, was not adopted by those skilled in the art.
 第2工程において、反応容器内に導入される総ガス流量は、例えば、以下の通りとすることができる。ここで「総ガス流量」とは、標準状態(0℃、1気圧)における気体を理想気体とし、単位時間当たりにCVD炉に導入されたガスの全容積流量を示す。
流量(平均):100L/分
流量(変化の範囲):80~120L/分
周期:5~15分(15分を超えると、アスペクト比が大きくなる傾向がある。)
 総ガス流量を上記の範囲とする場合、導入ガス中のキャリアガスの流量は、例えば、以下の通りとすることができる。
流量(平均):98体積%
流量(変化の範囲):97~99体積%
周期:5~15分
In the second step, the total gas flow rate introduced into the reaction vessel can be, for example, as follows. Here, the term "total gas flow rate" refers to the total volumetric flow rate of the gas introduced into the CVD furnace per unit time, assuming that the gas under standard conditions (0° C., 1 atm) is an ideal gas.
Flow rate (average): 100 L/min Flow rate (range of change): 80 to 120 L/min Period: 5 to 15 minutes (Over 15 minutes, the aspect ratio tends to increase.)
When the total gas flow rate is within the above range, the flow rate of the carrier gas in the introduced gas can be, for example, as follows.
Flow rate (average): 98% by volume
Flow rate (range of change): 97 to 99% by volume
Cycle: 5-15 minutes
 上記第2工程は、第1の層を形成する工程に加えて、下地層及び表面層などの他の層を形成する工程を含むことができる。他の層は、従来の方法によって形成することができる。 The second step can include a step of forming other layers such as a base layer and a surface layer in addition to the step of forming the first layer. Other layers can be formed by conventional methods.
 <第3工程:ブラスト処理をする工程>
 本工程では、上記被膜にブラスト処理を実施する。上記ブラスト処理の条件としては例えば、以下の条件が挙げられる。ブラスト処理を実施することで上記被膜に、所望の圧縮残留応力を付与することができる。
 (ブラスト処理の条件)
 メディア:アルミナ粒子、500g
 投射角度:45°
 投射距離:30~100mm
 投射時間:2~8秒
 投射圧 :0.1~0.3MPa
 回転速度:60rpm
<Third step: step of blasting>
In this step, the coating is subjected to blasting. Examples of the blasting conditions include the following conditions. A desired compressive residual stress can be imparted to the coating by performing blasting.
(Conditions for blasting)
Media: Alumina particles, 500g
Projection angle: 45°
Projection distance: 30-100mm
Projection time: 2 to 8 seconds Projection pressure: 0.1 to 0.3 MPa
Rotation speed: 60rpm
 <その他の工程>
 本実施形態に係る製造方法では、上述した工程の他にも、表面処理する工程等を適宜行ってもよい。
<Other processes>
In the manufacturing method according to the present embodiment, in addition to the steps described above, a surface treatment step and the like may be performed as appropriate.
 本実施の形態を実施例によりさらに具体的に説明する。ただし、これらの実施例により本実施の形態が限定されるものではない。 The present embodiment will be described more specifically with examples. However, this embodiment is not limited by these examples.
 ≪切削工具の作製≫
 試料No.1~18の切削工具を作製するため、配合組成が2.0wt%のTaC、1.0wt%のNbC、10.0wt%のCoおよび残部のWCからなり(但し、不可避不純物を含む)、且つ、形状がSEET13T3AGSN-Gである超硬合金製切削チップ(住友電工ハードメタル株式会社製)を基材として準備した(第1工程)。
≪Manufacturing cutting tools≫
Sample no. 1 to 18, the composition consists of 2.0 wt% TaC, 1.0 wt% NbC, 10.0 wt% Co and the balance WC (including inevitable impurities), and , a cemented carbide cutting tip (manufactured by Sumitomo Electric Hardmetal Co., Ltd.) having a shape of SEET13T3AGSN-G was prepared as a base material (first step).
 次に、上記基材に対して、その表面に被膜を形成した(第2工程)。具体的には、CVD法を用いて、基材の全面に対し、表1に記載した下地層の形成条件、表2に記載した第1の層の形成条件、および、表3に記載した表面層の形成条件により、上記第2工程を実行した。 Next, a film was formed on the surface of the base material (second step). Specifically, using the CVD method, the conditions for forming the underlayer described in Table 1, the conditions for forming the first layer described in Table 2, and the surface described in Table 3 were applied to the entire surface of the base material. The second step was performed according to the layer formation conditions.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 さらに、試料No.1~16、及び18の切削工具を作製するため、上記のように被膜を形成後、表4に記載したブラスト処理の条件により、第3工程を実行した。 Furthermore, sample No. In order to produce cutting tools Nos. 1 to 16 and 18, the third step was performed under the blasting conditions described in Table 4 after the coating was formed as described above.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 以上の工程を実行することにより、表5および表6に示した構成を有する試料No.1~18の切削工具を作製した。 By executing the above steps, sample No. 1 having the configuration shown in Tables 5 and 6 was obtained. 1-18 cutting tools were made.
 ≪切削工具の特性評価≫
 上述のようにして作製した試料No.1~18の切削工具を用いて、以下のように、切削工具の各特性を評価した。なお、試料No.1~8、11~13、17、18の切削工具は実施例に対応し、試料No.9、10、14~16の切削工具は比較例に対応する。
≪Characteristic evaluation of cutting tools≫
Sample No. prepared as described above. Using cutting tools Nos. 1 to 18, each characteristic of the cutting tools was evaluated as follows. In addition, sample no. Cutting tools 1 to 8, 11 to 13, 17 and 18 correspond to the examples, and sample No. Cutting tools 9, 10, 14-16 correspond to comparative examples.
 <被膜等の厚みの測定>
 試料No.1~試料No.18の切削工具について、被膜、当該被膜を構成する層である第1の層、下地層、及び表面層のそれぞれの厚みを、実施の形態1に記載の方法により求めた。得られた結果をそれぞれ表5及び表6の「第1の層の厚み(μm)」の項、表5の「下地層の厚み(μm)」の項、表5の「表面層の厚み(μm)」の項に記す。
<Measurement of thickness of coating>
Sample no. 1 to sample No. For 18 cutting tools, the thickness of each of the coating, the first layer that constitutes the coating, the base layer, and the surface layer was obtained by the method described in the first embodiment. The obtained results are shown in Tables 5 and 6 for "thickness of first layer (μm)", in Table 5 for "thickness of base layer (μm)", and in Table 5 for "thickness of surface layer (μm)". μm)”.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 <x(平均値)及びy(平均値)の測定>
 試料No.1~試料No.18の切削工具について、x(平均値)及びy(平均値)を、実施形態1に記載の方法により求めた。得られた結果をそれぞれ表5及び表6の「AlTi1-x1-y」の「x(平均値)」及び「y(平均値)」の項に記す。
<Measurement of x (average value) and y (average value)>
Sample no. 1 to sample No. For 18 cutting tools, x (average value) and y (average value) were obtained by the method described in the first embodiment. The obtained results are shown in the “x (average value)” and “y (average value)” sections of “Al x Ti 1-x C y N 1-y ” in Tables 5 and 6, respectively.
 <結晶粒の平均アスペクト比の測定>
 試料No.1~試料No.18の切削工具について、結晶粒の平均アスペクト比を、実施形態1に記載の方法により求めた。得られた結果をそれぞれ表6の「結晶粒の平均アスペクト比」の項に記す。
<Measurement of average aspect ratio of crystal grains>
Sample no. 1 to sample No. For 18 cutting tools, the average aspect ratio of grains was obtained by the method described in the first embodiment. The obtained results are shown in Table 6, "Average Aspect Ratio of Crystal Grains".
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
 <面積比率の測定>
 試料No.1~試料No.18の切削工具について、第1の層において立方晶構造を有する結晶粒が占める面積比率を、実施形態1に記載の方法により求めた。得られた結果をそれぞれ表6の「面積比率(%)」の項に記す。
<Measurement of area ratio>
Sample no. 1 to sample No. For 18 cutting tools, the area ratio occupied by crystal grains having a cubic crystal structure in the first layer was obtained by the method described in the first embodiment. The obtained results are shown in Table 6, "Area ratio (%)".
 <第1個数比率の測定>
 試料No.1~試料No.18の切削工具について、第1個数比率を、実施形態1に記載の方法により求めた。得られた結果を表6の「第1個数比率(%)」の項に記す。
<Measurement of the first number ratio>
Sample no. 1 to sample No. For 18 cutting tools, the first number ratio was obtained by the method described in the first embodiment. The obtained results are shown in Table 6, "first number ratio (%)".
 <残留応力の測定>
 試料No.1~試料No.18の切削工具について、第1の層の残留応力を、実施形態1に記載の方法により求めた。得られた結果をそれぞれ表6の「残留応力(GPa)」の項に記す。なお、表6の「残留応力(GPa)」の項における「圧縮」の記載は、残留応力が「圧縮残留応力」であることを意味する。また、表6の「残留応力(GPa)」の項における「引張」の記載は、残留応力が「引張残留応力」であることを意味する。
<Measurement of residual stress>
Sample no. 1 to sample No. For 18 cutting tools, the residual stress of the first layer was determined by the method described in the first embodiment. The obtained results are shown in Table 6, "Residual stress (GPa)". The description of "compression" in the "residual stress (GPa)" section of Table 6 means that the residual stress is "compressive residual stress". In addition, the description of "tensile" in the section of "residual stress (GPa)" in Table 6 means that the residual stress is "tensile residual stress".
 <硬度の測定>
 試料No.1~試料No.18の切削工具について、第1の層の硬度を、実施形態1に記載の方法により求めた。得られた結果をそれぞれ表6の「硬度(GPa)」の項に記す。
<Measurement of hardness>
Sample no. 1 to sample No. The hardness of the first layer was determined by the method described in Embodiment 1 for 18 cutting tools. The obtained results are shown in Table 6, "Hardness (GPa)".
 ≪切削試験≫
 得られた切削工具を用いて、以下に示す切削条件にて切削加工を行った。切削距離300mmを1パスとし、1パスごとに損傷を確認し、熱亀裂およびすくい面摩耗により工具が欠損に達するまでのパス数を評価した。その結果を、表6の「切削試験(パス)」の項に記す。なお、ここで「欠損」とは、最大逃げ面摩耗量が0.4mm以上となることを意味する。また、工具が欠損に達するまでのパス数が20パス以上であることは、耐熱亀裂性と耐摩耗性とが良好であることを意味する。すなわち、当該パス数が20パス以上であることは、長い工具寿命を有することを意味する。
 (切削条件)
 被削材  :SCM435ブロック材(300mm×80mm)
 切削速度 :300m/min
 送り量  :0.2mm/t
 切込み量 :2.0mm
 湿式/乾式:湿式
 当該切削条件は、合金鋼の湿式条件下での高速切削に該当する。
≪Cutting test≫
Using the obtained cutting tool, cutting was performed under the following cutting conditions. A cutting distance of 300 mm was set as one pass, and damage was confirmed for each pass, and the number of passes until the tool reached chipping due to thermal cracks and rake face wear was evaluated. The results are shown in Table 6, "Cutting Test (Pass)". Here, the term "loss" means that the maximum flank wear amount is 0.4 mm or more. Moreover, the fact that the number of passes until the tool reaches chipping is 20 or more means that the thermal crack resistance and wear resistance are good. That is, 20 passes or more means that the tool has a long tool life.
(Cutting conditions)
Work material: SCM435 block material (300mm x 80mm)
Cutting speed: 300m/min
Feed rate: 0.2mm/t
Depth of cut: 2.0 mm
Wet/Dry: Wet The cutting conditions correspond to high speed cutting of alloy steel under wet conditions.
 <結果>
 表6の結果から、実施例に係る試料No.1~8、11~13、17、18の切削工具は、湿式条件下での高速切削において、比較例に係る試料No.9、10、14~16の切削工具に比して優れた耐熱亀裂性と優れた耐摩耗性とを有することが分かった。よって、実施例に係る試料No.1~8、11~13、17、18の切削工具は、特に合金鋼の湿式条件下での高速切削においても、長い工具寿命を有することが分かった。
<Results>
From the results of Table 6, sample No. according to the example. Cutting tools 1 to 8, 11 to 13, 17, and 18 were superior to sample No. 1 according to the comparative example in high-speed cutting under wet conditions. It was found to have superior thermal crack resistance and superior wear resistance compared to 9, 10, 14-16 cutting tools. Therefore, sample no. Cutting tools of 1-8, 11-13, 17, 18 were found to have long tool life, especially in high speed cutting under wet conditions of alloy steels.
 以上のように本開示の実施の形態および実施例について説明を行なったが、上述の各実施の形態および実施例の構成を適宜組み合わせたり、様々に変形することも当初から予定している。 Although the embodiments and examples of the present disclosure have been described as above, it is planned from the beginning to appropriately combine the configurations of the above-described embodiments and examples and to modify them in various ways.
 今回開示された実施の形態および実施例はすべての点で例示であって、制限的なものではないと考えられるべきである。本発明の範囲は上記した実施の形態および実施例ではなく請求の範囲によって示され、請求の範囲と均等の意味、および範囲内でのすべての変更が含まれることが意図される。 It should be considered that the embodiments and examples disclosed this time are illustrative in all respects and not restrictive. The scope of the present invention is indicated by the scope of the claims rather than the above-described embodiments and examples, and is intended to include meanings equivalent to the scope of the claims and all modifications within the scope.
 1 切削工具、1a すくい面、1b 逃げ面、1c 刃先部、10 基材、11 第1の層、12 下地層、13 表面層、14 被膜、50 CVD装置、52 基材セット治具、53 反応容器、54 調温装置、55 ガス導入管、56 ガス排気管、57 ガス排気口、S1 第1の層の表面、S2 第1の層の表面側の界面、S3 基材側の界面、L1 第1仮想線 1 cutting tool, 1a rake face, 1b flank face, 1c cutting edge portion, 10 base material, 11 first layer, 12 base layer, 13 surface layer, 14 coating, 50 CVD device, 52 base material setting jig, 53 reaction Container, 54 temperature control device, 55 gas introduction pipe, 56 gas exhaust pipe, 57 gas exhaust port, S1 first layer surface, S2 first layer surface side interface, S3 substrate side interface, L1 second 1 virtual line

Claims (4)

  1.  基材と、前記基材上に配置された被膜と、を備える切削工具であって、
     前記被膜は、第1の層を含み、
     前記第1の層は、複数の結晶粒を含み、
     前記結晶粒は、AlTi1-x1-yからなり、
     前記xは、0.65超0.95未満であり、
     前記yは、0以上0.1未満であり、
     前記結晶粒の平均アスペクト比は、3.0以下であり、
     前記結晶粒は、立方晶系構造を有する結晶粒を含み、
     前記第1の層において、前記立方晶系構造を有する結晶粒が占める面積比率は、90%以上であり、
     前記平均アスペクト比および前記面積比率は、前記基材と前記被膜との界面の法線に沿った断面で測定され、
     前記第1の層の厚みは、2μm以上20μm以下である、切削工具。
    A cutting tool comprising a substrate and a coating disposed on the substrate,
    The coating comprises a first layer,
    The first layer includes a plurality of crystal grains,
    The crystal grains are made of Al x Ti 1-x C y N 1-y ,
    The x is more than 0.65 and less than 0.95,
    The y is 0 or more and less than 0.1,
    The average aspect ratio of the crystal grains is 3.0 or less,
    The crystal grains include crystal grains having a cubic structure,
    In the first layer, the area ratio occupied by the crystal grains having the cubic system structure is 90% or more,
    The average aspect ratio and the area ratio are measured in a cross section along the normal of the interface between the substrate and the coating,
    The cutting tool, wherein the first layer has a thickness of 2 μm or more and 20 μm or less.
  2.  前記結晶粒は、第1結晶粒を含み、
     前記被膜の表面の法線方向に対する前記第1結晶粒の<111>方向の傾斜角は、0°以上10°以下であり、
     前記結晶粒に対し、前記第1結晶粒が占める第1個数比率は、15%以上であり、
     前記第1個数比率は、前記基材と前記被膜との界面の法線に沿った断面で測定される、請求項1に記載の切削工具。
    The crystal grains include first crystal grains,
    The inclination angle of the <111> direction of the first crystal grains with respect to the normal direction of the surface of the coating is 0° or more and 10° or less,
    A first number ratio of the first crystal grains to the crystal grains is 15% or more,
    2. The cutting tool according to claim 1, wherein said first number ratio is measured in a cross section along a normal line of an interface between said substrate and said coating.
  3.  前記第1の層の圧縮残留応力は、1.0GPa以上4.5GPa未満である、請求項1または請求項2に記載の切削工具。 The cutting tool according to claim 1 or 2, wherein the compressive residual stress of the first layer is 1.0 GPa or more and less than 4.5 GPa.
  4.  前記第1の層の硬度は、30GPa以上40GPa以下である、請求項1から請求項3のいずれか1項に記載の切削工具。 The cutting tool according to any one of claims 1 to 3, wherein the hardness of the first layer is 30 GPa or more and 40 GPa or less.
PCT/JP2021/022457 2021-06-14 2021-06-14 Cutting tool WO2022264196A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/022457 WO2022264196A1 (en) 2021-06-14 2021-06-14 Cutting tool

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/022457 WO2022264196A1 (en) 2021-06-14 2021-06-14 Cutting tool

Publications (1)

Publication Number Publication Date
WO2022264196A1 true WO2022264196A1 (en) 2022-12-22

Family

ID=84525748

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2021/022457 WO2022264196A1 (en) 2021-06-14 2021-06-14 Cutting tool

Country Status (1)

Country Link
WO (1) WO2022264196A1 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014210333A (en) * 2013-04-01 2014-11-13 三菱マテリアル株式会社 Surface-coated cutting tool with hard coated layer exerting excellent chipping resistance
JP2017508632A (en) * 2014-03-11 2017-03-30 バルター アクチェンゲゼルシャフト TiAlCN layer with layered structure
JP2017080883A (en) * 2015-10-30 2017-05-18 三菱マテリアル株式会社 Surface coated cutting tool having hard coating layer exhibiting excellent chipping resistance
WO2017175400A1 (en) * 2016-04-08 2017-10-12 住友電工ハードメタル株式会社 Surface-coated cutting tool and method for producing same
JP2017189847A (en) * 2016-04-14 2017-10-19 住友電工ハードメタル株式会社 Surface-coated cutting tool and manufacturing method therefor
JP2019010705A (en) * 2017-06-30 2019-01-24 三菱マテリアル株式会社 Surface-coated cutting tool of which hard coating layer exhibits excellent chipping resistance, thermal crack resistance and oxidation resistance
JP2019162709A (en) * 2018-03-20 2019-09-26 三菱マテリアル株式会社 Surface-coated cutting tool having hard coating layer exerting excellent chipping resistance
JP2020055097A (en) * 2018-09-28 2020-04-09 三菱マテリアル株式会社 Surface-coated cutting tool with hard coating layer exhibiting excellent chipping resistance

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014210333A (en) * 2013-04-01 2014-11-13 三菱マテリアル株式会社 Surface-coated cutting tool with hard coated layer exerting excellent chipping resistance
JP2017508632A (en) * 2014-03-11 2017-03-30 バルター アクチェンゲゼルシャフト TiAlCN layer with layered structure
JP2017080883A (en) * 2015-10-30 2017-05-18 三菱マテリアル株式会社 Surface coated cutting tool having hard coating layer exhibiting excellent chipping resistance
WO2017175400A1 (en) * 2016-04-08 2017-10-12 住友電工ハードメタル株式会社 Surface-coated cutting tool and method for producing same
JP2017189847A (en) * 2016-04-14 2017-10-19 住友電工ハードメタル株式会社 Surface-coated cutting tool and manufacturing method therefor
JP2019010705A (en) * 2017-06-30 2019-01-24 三菱マテリアル株式会社 Surface-coated cutting tool of which hard coating layer exhibits excellent chipping resistance, thermal crack resistance and oxidation resistance
JP2019162709A (en) * 2018-03-20 2019-09-26 三菱マテリアル株式会社 Surface-coated cutting tool having hard coating layer exerting excellent chipping resistance
JP2020055097A (en) * 2018-09-28 2020-04-09 三菱マテリアル株式会社 Surface-coated cutting tool with hard coating layer exhibiting excellent chipping resistance

Similar Documents

Publication Publication Date Title
EP3441167B1 (en) Surface-coated cutting tool and method for producing same
EP3444052B1 (en) Surface-coated cutting tool and manufacturing method therefor
JP6973699B2 (en) Surface coating cutting tool and its manufacturing method
EP2791387B1 (en) Method of manufacturing a coated cutting tool.
EP3008225B1 (en) Coated cutting tool
JP6045010B1 (en) Surface-coated cutting tool and manufacturing method thereof
WO2017175400A1 (en) Surface-coated cutting tool and method for producing same
EP3590638B1 (en) Surface-coated cutting tool and method for manufacturing the same
WO2020170572A1 (en) Cutting tool
WO2022264196A1 (en) Cutting tool
JP7124236B1 (en) Cutting tools
JP6834111B1 (en) Cutting tools
JP6889451B2 (en) Cutting tools
WO2022264198A1 (en) Cutting tool
JP2021122876A (en) Surface-coated cutting tool
JP6750789B1 (en) Cutting tools
JP6840927B1 (en) Cutting tools
WO2023144867A1 (en) Cutting tool and method for manufacturing same
JPWO2020213258A1 (en) Cutting tools
JPWO2019181133A1 (en) Surface-coated cutting tool and manufacturing method thereof
JPWO2019181134A1 (en) Surface-coated cutting tool and manufacturing method thereof
JPWO2019181135A1 (en) Surface-coated cutting tool and manufacturing method thereof

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21945876

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE