WO2022243015A1 - Système de mesure et procédé de mesure de la forme de surface d'un élément optique - Google Patents

Système de mesure et procédé de mesure de la forme de surface d'un élément optique Download PDF

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Publication number
WO2022243015A1
WO2022243015A1 PCT/EP2022/061610 EP2022061610W WO2022243015A1 WO 2022243015 A1 WO2022243015 A1 WO 2022243015A1 EP 2022061610 W EP2022061610 W EP 2022061610W WO 2022243015 A1 WO2022243015 A1 WO 2022243015A1
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Prior art keywords
wave
diffractive element
optical
optical element
measuring arrangement
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PCT/EP2022/061610
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German (de)
English (en)
Inventor
Steffen Siegler
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Carl Zeiss Smt Gmbh
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Publication of WO2022243015A1 publication Critical patent/WO2022243015A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G01B9/02039—Shaping the wavefront, e.g. generating a spherical wavefront by matching the wavefront with a particular object surface shape
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/30—Grating as beam-splitter

Definitions

  • the invention relates to a measuring arrangement and a method for measuring the surface shape of an optical element.
  • Microlithography is used to produce microstructured components, such as integrated circuits or LCDs, for example.
  • the microlithographic process is carried out in what is known as a projection exposure system, which has an illumination device and a projection lens.
  • a projection exposure system which has an illumination device and a projection lens.
  • NA image-side numerical aperture
  • NA image-side numerical aperture
  • CGH computer-generated holograms
  • FIG. 8 A conventional structure of an interferometric measuring arrangement for measuring the surface shape of an optical element in the form of an EUV mirror is described below with reference to FIG. 8 .
  • the illumination radiation generated by a light source (not shown) and emerging from the exit surface of an optical waveguide 801 emerges as an input wave with a spherical wavefront, passes through a beam splitter 802 and then, via a deflection mirror 810, strikes a diffractive element in the form of a CGH 803.
  • the CGH has a complex coding in the form of superimposed diffractive structure patterns to generate different output waves.
  • the publications F With regard to the complex coding, the publications F.
  • Simon et al "Quasi-absolute measurement of aspheres with a combined diffractive optical element as reference", APPLIED OPTICS Vol. 45. No. 34, 2006, pp. 8606-8612, H. Liu et al: "Redistribution of output weighting coefficients for complex multiplexed phase-diffractive elements", OPTICS EXPRESS Vol. 19, 2004, pp. 4347-4352 and E. Carcole et al: "Derivation of weighting coefficients for multiplexed phase-diffractive elements", OPTICS LETTERS Vol. 23, 1995, pp. 2360-2362.
  • deflection mirror 810 is fundamentally advantageous both from the standpoint of installation space and for enabling measurement of the relevant optical element or mirror 804 in the installed position.
  • the reference wave reflected at the reference mirror 805 is successively compared with the test wave reflected by the mirror 804 or with one of the calibration mirrors S1, S2 or S3 reflected calibration waves brought to interference.
  • the beams reflected by the reference mirror 805 on the one hand and the beams reflected by the mirror 804 or one of the calibration mirrors S1, S2 or S3 on the other hand hit the beam splitter 802 again via the deflection mirror 810, are reflected by it and arrive via an eyepiece mirror 806 an interferometer camera 807 designed as a CCD camera, for example.
  • the interferometer camera 807 records an interferogram generated by the interfering waves, from which the actual shape of the optical surface of the mirror 804 is determined via an evaluation device (not shown).
  • phase part actually to be determined contains other phase parts in addition to the phase part actually to be determined (corresponding to the surface shape or pas of the test object). having.
  • phase parts include, among other things, polarization-induced phase components, e.g. due to various influences on the state of polarization occurring in the respective optical system, which falsify the results obtained during the Passe determination. Compensation or targeted elimination of such polarization-induced phase components requires knowledge of them that is as precise as possible.
  • polarization measurements that can be carried out for this purpose are complex and can in turn be subject to errors.
  • the causes of the aforementioned, undesired influencing of the state of polarization are, in particular, the stress birefringence occurring both in the substrate of the CGH 803 and in the beam splitter 802, as well as the polarization effect of the coating on the deflection mirror 810.
  • the said influencing the state of polarization Effects are all the more serious in that an undesired coupling between the polarization effect of the diffractive structure of the CGH 803 on the one hand and the polarization effect of the coating of the deflection mirror 810 and the stress birefringence occurring in the beam splitter 802 and in the substrate of the CGH 803 on the other hand causes an additional phase component.
  • Another undesired contribution to interference with regard to the interferogram phase used in the interferogram measurement for the pass determination results from disturbing reflections occurring on the CGH 803 and in particular from the fact that the light impinging on the CGH 803 both on its structured side and is reflected on its unstructured side, with the result that double reflections reach both the mirror 804, which is to be characterized with regard to its surface shape, and the reference mirror 805, and ultimately deliver an error contribution in the intensity signal of the interferometer camera 807.
  • FIG. 9a-9b show schematic representations to illustrate possible interfering light paths which can occur within a CGH operated in transmission according to FIG diffractive CGH structures are designated.
  • a first possible interfering light path for electromagnetic radiation incident into the CGH from its unstructured side results from the fact that the diffraction orders generated by the CGH structure 911 in reflection are reflected from the structured side of the CGH back to its unstructured side . From this unstructured side, the radiation is again directed to the structured side via total internal reflection and there in turn is deflected back against the original direction of incidence for the diffraction orders generated in reflection, which leads to an unwanted interference contribution on the interferometer camera.
  • interference contributions can also result for the diffraction orders generated by the CGH in transmission from the fact that in the further beam path at the mirror to be measured (in Fig. 9b with "930"), at the reference mirror or Non-vertical reflections occur on one of the calibration mirrors, whereby the corresponding stray light components can also reach the CGH up to the interferometer camera in the opposite direction to the original direction of incidence.
  • Said interference contributions to the interferogram phase finally measured lead to an erroneous determination of the surface of the mirror to be measured and thus also to a surface treatment that may be based thereon.
  • a measuring arrangement according to the invention for measuring the surface shape of an optical element has:
  • At least one diffractive element wherein a measurement of the upper surface shape of at least one partial surface of the optical element by interferometric superimposition of one generated by the diffractive element from the electromagnetic radiation and onto the optical Element steered test wave and a reference wave is feasible;
  • an interferometer camera for capturing an interferogram generated by interferometric superimposition of test wave and reference wave
  • the at least one diffractive element is a computer-generated hologram (CGH), which has a complex coding with voneinan the different CGH structures to provide the test wave and at least one other wave; and
  • CGH computer-generated hologram
  • the diffractive element is net angeord in the optical beam path in such a way that it generates the test wave in reflection.
  • the invention is based in particular on the concept of designing the structure of the measuring arrangement in a measuring arrangement for interferometric measurement of the surface shape of an optical element (e.g. an EUV mirror for microlithography) using a diffractive element or CGH such that said diffractive element or CGH is operated in reflection.
  • an optical element e.g. an EUV mirror for microlithography
  • This configuration has the advantageous result that the light impinging on the diffractive element or CGH, which according to diffraction at the diffractive element designed in reflection corresponding to the diffraction orders occurring in reflection to the reference mirror on the one hand and the mirror to be measured or a the calibration mirror, on the other hand, does not pass through the substrate of the diffractive element or CGH's and is therefore no longer influenced in its state of polarization by, for example, stress birefringence within this substrate. Furthermore, there are no longer any back reflections on the unstructured side of the diffractive element or CGH for this light, so that the error contribution described at the outset due to undesired double reflections reaching the interferometer camera and other interference reflections is avoided.
  • the reduction of reflections on the diffractive element or CGH made possible according to the invention also has the advantageous result that a “reflex ORing” that is usually required (ie carrying out the intensity measurements with two different CGHs with slight differences in terms of the generation structures used for calibration shafts) can be omitted, which in turn can significantly reduce the measurement effort ultimately required.
  • Another significant advantage of the concept according to the invention is that the functionality of the deflection mirror 810 present in the conventional structure of FIG of the coating on said deflection mirror 810, but also the unavoidable and undesired phase component in conventional design due to the aforementioned coupling of the polarization effect of said coating on deflection mirror 810 with the likewise partially unknown polarization effect of diffractive element 803 or CGFI's .
  • the invention is based, among other things, on the knowledge that, through a suitable design of the diffractive element or CGH, as described in more detail below, it is possible to achieve similarly good diffraction efficiencies for a CGH operated in reflection as for a CGH operated in transmission. Furthermore, with a suitable design of the CGH, it can be ensured that the part which is undesired in the structure according to the invention and is diffracted (and thus “transmitted”) into the CGH has comparatively extremely low diffraction efficiencies.
  • a further optical component is arranged in the optical beam path between the light source and the diffractive element, which directs electromagnetic radiation coming from the light source to the diffractive element.
  • this optical component is arranged in the optical beam path in such a way that it directs electromagnetic radiation coming from the light source to the diffractive element in reflection.
  • this configuration has the advantage that with regard to this component, the incident light directed to the diffractive element or CGH does not see the substrate of the relevant optical component and is therefore not exposed to stress birefringence or an associated undesired influence on the polarization state. As a result, there is also no undesired phase component due to the coupling of such a polarization effect with the polarization effect in the diffractive element or CGH.
  • the stress birefringence in the optical component leads above all to a retarding effect in the waves coming from the CGH and deflected by the optical component onto the camera. As can be shown in simulations or on the basis of analytical calculations, this retarding effect is offset by the formation of interference on camera gone to a large extent.
  • the design of the optical component in reflection that guides the electromagnetic radiation to the diffractive element or CGH has the advantage that a spherical wave impinging on said component can be guided to the diffractive element or CGH as a likewise spherical wave, with the result that that this spherical wave remains a spherical wave upon reflection at the diffractive element or CGH in the zeroth order of diffraction and can be used as a calibration wave in connection with a spherical calibration mirror and thus the complexity of the diffractive element or CGH's can be significantly reduced.
  • this optical component is a beam splitter.
  • this optical component is another diffractive element, in particular another computer-generated hologram (CGH).
  • CGH computer-generated hologram
  • the further diffractive element converts electromagnetic radiation impinging in the optical beam path into a plane wave.
  • This configuration is particularly advantageous in that, on the one hand, the optics required for imaging on the interferometer camera can be simplified in their structure (e.g. without an eyepiece mirror otherwise used to generate the plane wave impinging on the interferometer camera), and also - with a Use of additional optical compo nents such as an eyepiece mirror associated - unwanted optical aberrations or polarization effects can be avoided. In addition, there is no need for error-prone production, testing and coating of such an optical component. According to one embodiment, no optical element is arranged in the optical beam path between this further diffractive element and the interferometer camera.
  • the optical element whose surface shape is to be measured is a mirror, in particular a mirror designed for operation under EUV conditions.
  • the optical element has a surface shape in the form of an asphere or a free-form surface.
  • the diffractive element also generates the reference wave in reflection.
  • the reference wave can also be generated in reflection from a Fizeau element.
  • the diffractive element for generating the reference wave has a further coding designed according to a Littrow grating.
  • the reference wave travels back on the light path of the input wave impinging on the diffractive element.
  • the reference wave can also be guided via a reference element that is separate from the diffractive element, as described below (doing without a coding designed according to a Littrow grating).
  • the invention also relates to a method for measuring the surface shape of an optical element in an interferometric test arrangement, the method having the following steps:
  • the diffractive element is operated in reflection.
  • the method also has the step of carrying out further interferogram measurement series on a plurality of calibration mirrors to determine calibration corrections by superimposing a calibration wave generated by diffraction of electromagnetic radiation on the at least one diffractive element and reflected on the respective calibration mirror a reference wave not reflected at the optical element.
  • a wave generated by the diffractive element in the zeroth order of diffraction is used as a calibration wave.
  • At least two interferogram measurements are carried out on the optical element and/or on at least one calibration mirror, which measurements differ from one another with regard to the state of polarization of the electromagnetic radiation.
  • Figure 1 is a schematic representation to explain what is possible
  • FIG. 2 shows a schematic illustration to explain the structure of a measuring arrangement in a further embodiment with a changed position of a beam splitter located in the optical beam path compared to FIG. 1;
  • FIG. 3 shows a schematic illustration for explaining the structure of a measuring arrangement in a further embodiment with a further CGFI present instead of the beam splitter from FIG. 1 or FIG. 2;
  • FIG. 4 shows a schematic illustration for explaining the structure of a measuring arrangement in a further embodiment with a configuration of the additional CGH that has changed in comparison to FIG. 3;
  • FIG. 5 shows a schematic illustration for explaining the structure of a measuring arrangement in a further embodiment in comparison to FIG. 4, the configuration of the additional CGFT is again modified;
  • FIG. 6a shows a schematic illustration to explain the possible structure of a CGFI designed for operation in reflection
  • FIG. 6b-6e diagrams with simulation results to clarify the mode of operation of the CGFI of FIG. 6a;
  • FIG. 7 shows a schematic illustration for explaining the structure of a measuring arrangement in a further embodiment, which is implemented in a Fizeau arrangement
  • FIG. 8 shows a schematic illustration for explaining a conventional structure of a measuring arrangement for measuring the surface shape of an optical element
  • FIG. 9a-9b schematic representations to illustrate stray light paths occurring within a CGFI operated in transmission.
  • FIG. 10 shows a schematic representation of a projection exposure system designed for operation in the EUV.
  • an illumination device in a projection exposure system 1010 designed for EUV has a field facet mirror 1003 and a pupil facet mirror 1004 .
  • a first telescope mirror 1005 and a second telescope mirror 1006 are arranged.
  • a deflecting mirror 1007 is arranged below in the light path, which deflects the radiation striking it onto an object field in the object plane of a projection lens comprising six mirrors 1021-1026.
  • a reflective structure-bearing mask 1031 is arranged on a mask table 1030, which is imaged with the aid of the projection lens in an image plane in which a substrate 1041 coated with a light-sensitive layer (photoresist) is located on a wafer table 1040.
  • the surface shape of the optical element measured in a measuring arrangement according to the invention described below can be, for example, any mirror of the projection exposure system 1010.
  • FIG. 1 shows a schematic illustration to explain a possible structure of an interferometric measuring arrangement for measuring the surface shape of an optical element in the form of a mirror.
  • the illumination radiation generated by a light source (not shown) and emerging from the exit surface of an optical waveguide 101 emerges as an input wave with, for example, a spherical wavefront, runs through a beam splitter 102 and then strikes a diffractive optical element in the form of a complex encoded CGH 103.
  • the reference wave reflected on the reference mirror 105 is successively combined with the test wave reflected by the mirror 104 or with one of the calibration waves reflected by the respective calibration mirror S1, S2 or S3 brought to interference.
  • the beams reflected by the reference mirror 105 on the one hand and the beams reflected by the mirror 104 or one of the calibration mirrors S1, S2 or S3 on the other hand hit the beam splitter 102 again, are reflected by it and reach a CCD camera, for example, via an eyepiece mirror 106 designed interferometer camera 107.
  • the interferometer camera 107 captures an interferogram generated by the interfering waves, from which the actual shape of the optical surface of the mirror 104 is determined via an evaluation device (not shown).
  • reference mirror 105 is successively axially displaced (indicated by the double arrow in Fig. 1) in a process also known as “phase shifting”, while a correspondingly large number of intensity measurements are carried out for different axial positions of reference mirror 105 , like that that from the typically sinusoidal modulation obtained in the intensity signal of the interferometer camera 107, the value of the interferogram phase can then be determined relative to a respectively defined reference line as the phase zero point or phase reference.
  • FIG. 2 shows a schematic illustration for explaining the structure of an interferometric measuring arrangement according to a further embodiment, with components that are analogous or essentially functionally the same as in FIG. 1 being denoted by reference numbers increased by “100”.
  • the measuring arrangement according to FIG. 2 differs from that from FIG. 1 in that the electromagnetic radiation coming from the light source or the optical waveguide 201 is directed via the beam splitter 202 in reflection to the diffractive element or CGH 203 . Due to the reflection at the beam splitter 202, the electromagnetic radiation impinging on the diffractive element or CGH 203 does not pass through the actual (volume) material of the beam splitter 202 and is therefore not subject to the stress birefringence that would otherwise occur in this material or one associated with it undesired th influence of the polarization state exposed.
  • a light wave impinging on the beam splitter 202 as a spherical input wave from the optical waveguide 201 can also be directed as a spherical wave onto the diffractive element or CGH 203 and thus in the further beam path as a calibration wave in connection with a spherical calibration mirror S1, S2 or S3 can be used with a corresponding simplification of the CGH structure or reduction in its complexity.
  • FIG. 3 shows a schematic illustration for explaining the structure of an interferometric measuring arrangement in a further embodiment, with components that are analogous or essentially functionally the same as in FIG. 2 being denoted by reference numbers increased by “100”.
  • the measuring arrangement according to Fig. 3 differs from that of Fig. 2 in particular in that (without a beam splitter 202) another diffractive element or CGFI 308 is used to directing incoming electromagnetic radiation in reflection to the diffractive element or CGH 303 and on the other hand also realizing the corresponding imaging beam path for deflecting the electromagnetic radiation returning from said diffractive element or CGH 303 to the interferometer camera 307 . Due to the fact that the further diffractive element or CGH 308 is again operated in reflection, an undesired polarization effect due to stress birefringence in the associated CGH substrate is avoided analogously to the embodiment of FIG. In addition to this, there is now also no polarization effect due to layers on the two upper surfaces of the beam splitter.
  • the CGH can be designed in such a way that the waves deflected to the eyepiece mirror are spherical waves, which means that an aspheric mirror can be dispensed with for the eyepiece mirror and a spherical mirror can be used which is easier to coat, to be manufactured, checked and adjusted.
  • the diffractive element or CGH 308 can be designed as a simply coded diffractive structure (whereby the illumination radiation directed to the optical element to be measured or to the reference or calibration mirror is reflected in the zeroth diffraction order and the imaging radiation directed to the interferometer camera 307 is reflected in the first diffraction order) .
  • the diffractive element or CGH 308 can have auxiliary structures used for adjustment.
  • FIG. 4 shows a schematic illustration for explaining the structure of an interferometric measuring arrangement according to a further embodiment, with components that are analogous to FIG. 3 or have essentially the same function as those in FIG. 3 and are denoted by reference numbers increased by “100”.
  • the interferometric measuring arrangement according to FIG. 4 differs from that of FIG it converts the electromagnetic radiation incident from the (first) diffractive element or CGFI 403 into a plane wave.
  • the entire imaging beam path is realized solely via said diffractive elements or CGFIs 403, 408, with additional optical elements such as e.g. Testing and adjustment of such optical elements can be avoided.
  • additional optical elements such as e.g. Testing and adjustment of such optical elements can be avoided.
  • error localization is simplified.
  • FIG. 5 shows a schematic illustration for explaining the structure of an interferometric measuring arrangement according to a further embodiment, components analogous to FIG. 4 or essentially having the same function being denoted by reference numbers increased by “100”.
  • the interferometric measuring arrangement according to FIG. 5 advantageously differs from that of FIG. to the (first) diffractive element or CGFI 503 and can be used there again in the zeroth order of diffraction as a spherical calibration wave and that it impinges from the (first) diffractive element or CGFI 503 converts electromagnetic radiation into a plane wave, which then travels to the interferometer camera 507.
  • a diaphragm is now provided in the optical beam path not only between the CGHs 503 and 508, but also in the intermediate focus of the illumination before entry into the actual measurement arrangement.
  • the invention makes use of the knowledge that, despite the fact that (dielectric) CGHs typically have high diffraction efficiencies in transmission and comparatively by a factor of the order of 10-30 suppressed diffraction efficiencies in reflection, it is The design of the CGH succeeds in achieving sufficiently good diffraction efficiencies even for operation in reflection.
  • FIG. 6a shows a purely schematic illustration to explain the possible structure of a CGH 600 designed for operation in reflection, with its mode of operation being described using the diagrams in FIGS. 6b-6e. Investigations have shown that, for example, the additional use of a dielectric layer system or a metallic layer system can significantly increase the diffraction orders present in reflection.
  • the CGH 600 has a multiple layer system 630 between a CGH substrate 610 and a diffractive structure 620, which is only indicated. Without the invention being limited to this, both the CGH substrate 610 and the diffractive structure 620 are each made of quartz (S1O2).
  • the multi-layer system 630 has (likewise without the invention being limited thereto) an alternating arrangement of layer stacks each consisting of a TiO 2 layer and an SiO 2 layer.
  • FIGS. 6b-6e show simulation results to illustrate the effect of the multilayer system 630 both in terms of the diffraction efficiency achieved for the (+1)th diffraction order in reflection as a function of the line or stripe density (FIGS. 6b and 6d) and also with regard to the phase sensitivity resulting for the (+1)th diffraction order in reflection (FIGS. 6c and 6e).
  • FIG. 7 shows a schematic illustration to explain the structure of an interferometric measurement arrangement according to FIG such a Fizeau arrangement, components that are analogous or essentially functionally the same as in FIG. 5 being denoted by reference numerals increased by “200”.
  • the CGFI 703 is operated in reflection analogously to the above-described embodiments and generates a total of four output waves from the input wave according to its complex coding, of which one output wave is applied as a test wave to the surface of the optical element or
  • the CGFI 703 generates three further output waves as calibration waves from the input wave in accordance with its complex coding, the wave front of which is each adapted to one of three calibration mirrors S1, S2 and S3.
  • an interferogram is generated between a reference wave reflected on the “Fizeau plate” 711 and a test wave reflected on the mirror 704 whose surface shape is to be characterized, or one of the waves reflected by the respective calibration mirror S1, S2 and S3 generated reflected calibration waves.

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  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
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  • Geometry (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

L'invention se rapporte à un système de mesure et à un procédé de mesure de la forme de surface d'un élément optique, comportant une source de lumière permettant de produire un rayonnement électromagnétique, au moins un élément diffractif, une mesure de la forme de surface d'au moins une zone partielle de l'élément optique pouvant être mise en œuvre par superposition interférométrique d'une onde de test, qui a été produite par l'élément diffractif à partir du rayonnement électromagnétique et qui a été dirigée vers l'élément optique, et d'une onde de référence, et une caméra interférométrique (107, 207, 307, 407, 507, 707) permettant de capturer un interférogramme produit par la superposition interférométrique de l'onde de test et de l'onde de référence, ledit au moins un élément diffractif étant un hologramme généré par ordinateur (CGH) (103, 203, 303, 403, 503, 703) qui présente un codage complexe comprenant différentes structures CGH afin de fournir l'onde de test et au moins une autre onde, et l'élément diffractif étant disposé dans le chemin de faisceau optique de façon à produire l'onde de test en réflexion.
PCT/EP2022/061610 2021-05-21 2022-04-29 Système de mesure et procédé de mesure de la forme de surface d'un élément optique WO2022243015A1 (fr)

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DE102021205202.9A DE102021205202A1 (de) 2021-05-21 2021-05-21 Messanordnung und Verfahren zur Vermessung der Oberflächenform eines optischen Elements
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